US20040137830A1 - Lapping method and lapping machine - Google Patents
Lapping method and lapping machine Download PDFInfo
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- US20040137830A1 US20040137830A1 US10/742,924 US74292403A US2004137830A1 US 20040137830 A1 US20040137830 A1 US 20040137830A1 US 74292403 A US74292403 A US 74292403A US 2004137830 A1 US2004137830 A1 US 2004137830A1
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- Prior art keywords
- lapping
- board
- vibration
- longitudinal
- boards
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- 238000000034 method Methods 0.000 title claims abstract description 40
- 239000006061 abrasive grain Substances 0.000 claims abstract description 29
- 230000003213 activating effect Effects 0.000 claims abstract description 11
- 230000000750 progressive effect Effects 0.000 claims description 59
- 239000002002 slurry Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229910001245 Sb alloy Inorganic materials 0.000 description 1
- 239000002140 antimony alloy Substances 0.000 description 1
- GVFOJDIFWSDNOY-UHFFFAOYSA-N antimony tin Chemical compound [Sn].[Sb] GVFOJDIFWSDNOY-UHFFFAOYSA-N 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000013013 elastic material Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000004006 olive oil Substances 0.000 description 1
- 235000008390 olive oil Nutrition 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 239000007779 soft material Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/12—Lapping plates for working plane surfaces
- B24B37/14—Lapping plates for working plane surfaces characterised by the composition or properties of the plate materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
- B24B1/04—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes subjecting the grinding or polishing tools, the abrading or polishing medium or work to vibration, e.g. grinding with ultrasonic frequency
Definitions
- This invention relates to a lapping method and a lapping device.
- the invention relates to a method and machine favorably employable for lapping objects having a relative large size.
- the lapping machine is generally employed for lapping accurately a surface of an object such as a silicon substrate to be employed for manufacturing an integrated circuit or an alumina-titanium carbide substrate to be employed for manufacturing a magnetic head.
- FIG. 1 is a front view of a typical structure of the conventionally employed lapping machine
- FIG. 2 is a top view of the lapping machine of FIG. 1.
- the lapping machine of FIGS. 1 and 2 comprises a lapping board 13 which is fixed to an axis of rotation 12 of a motor 11 , a abrasive grain-supplying means 15 which supplies a slurry 14 containing abrasive grains on the surface of the lapping board 13 , and disc means 17 for rotatably supporting an object 16 to be lapped.
- the object 16 is temporarily attached to the supporting means 17 via wax or the like.
- the supporting means 17 is supported on its circumferential side with a pair of rollers 20 .
- Each roller 20 is rotatably supported by a roller-supporting means 23 which is arranged on the top of a pole 22 standing on a base board 21 .
- the lapping board 13 rotates in the direction indicated by the arrow 19 (see FIG. 2) by activating the motor 11 . With the rotation of the lapping board 13 , the supporting means 17 holding the object 16 rotates under guidance with the pair of rollers 20 .
- the abrasive grain slurry 14 is dropwise supplied from the abrasive grain-supplying means 15 .
- Abrasive grains generally are diamond grains, alumina grains, or silica grains.
- the abrasive grain slurry 14 is moved toward the object 16 and supplied between the lapping board 13 and the object 16 by the rotation of the lapping board 13 .
- the lapping board 13 temporarily holds abrasive grains between the object 16 and the board 13 .
- the lapping board 13 is generally made of relatively soft material such as tin, as compared with the abrasive grains.
- a lapping board made of tin is slightly deformed on its surface to temporarily hold the abrasive grains.
- the lapping board 13 and the object to be lapped 16 are independently rotated with the intervening abrasive grains, the under-surface of the object 16 is polished.
- the polishing using abrasive grains is generally named “lapping”.
- Japanese Patent Provisional Publication No. 11-320376 describes an improvement of the lapping machine which has means for adjusting conditions of contact between the lapping board and the object to be lapped.
- the conventional lapping machine is favorably employed for lapping an object having a relatively small size. If an object having a large size such as silicon substrate of 12 inches is to be lapped in a lapping machine or a number of objects are lapped simultaneously in one lapping machine, it is required that the lapping machine employs a large sized lapping board and a high-powered motor. It is known that the horizontal accuracy on the surface of the lapping board should be less than 100 ⁇ m, if the object is lapped with a high accuracy. Apparently, it is not easy to manufacture a large sized lapping board with a high horizontal accuracy. Accordingly, it is not easy to lap a large-sized object with a high accuracy using the conventional lapping machine. If a large-sized lapping board can be manufacture, its manufacturing cost is very high.
- the present invention resides in a method for lapping an object which comprises preparing a lapping machine comprising at least one longitudinal or circular lapping board equipped with a ultrasonic oscillation-applying device which applies elliptical vibration to the lapping board and a supporting means arranged adjacently to the lapping board; placing the object on the lapping board via abrasive grains and further on the supporting means; and activating the ultrasonic oscillation-applying device to apply elliptical vibration to the lapping board whereby the object is caused to rotate on an axis thereof and lapped.
- This lapping method is named a first lapping method in the specification.
- the supporting means is a longitudinal or circular lapping board equipped with a ultrasonic oscillation-applying device which applies single-mode vibration to the lapping board and the object is placed on the supporting means via abrasive grains.
- the elliptical vibration is a vibration of progressive wave travelling along the longitudinal or circular lapping board.
- the elliptical vibration is a vibration of standing wave occurring along the longitudinal or circular lapping board.
- the present invention further resides in a method for lapping an object which comprises preparing a lapping machine comprising a pair of longitudinal lapping boards equipped with a ultrasonic oscillation-applying device which applies elliptical vibration to the lapping board arranged in parallel; placing the object on the lapping boards via abrasive grains; and activating the ultrasonic oscillation-applying device to apply elliptical vibration to the lapping boards whereby the object is caused to rotate on an axis thereof and lapped.
- This lapping method is named a second lapping method in the specification.
- An auxiliary lapping board equipped with a ultrasonic oscillation-applying device which applies elliptical or single-mode vibration to the auxiliary lapping board is arranged between the pair of the lapping boards, and the object is further lapped on the auxiliary lapping board.
- the elliptical vibration is a vibration of progressive wave travelling along the longitudinal lapping board.
- the elliptical vibration is a vibration of standing wave occurring along the longitudinal lapping board.
- the present invention furthermore resides in a method for lapping an object which comprises preparing a lapping machine comprising a pair of circular lapping boards equipped with a ultrasonic oscillation-applying device which applies elliptical vibration to the lapping board arranged coaxially; placing the object on the lapping boards via abrasive grains; and activating the ultrasonic oscillation-applying device to apply elliptical vibration to the lapping boards whereby the object is caused to rotate on an axis thereof and lapped.
- This lapping method is named a third lapping method in the specification.
- the elliptical vibration is a vibration of progressive wave travelling along the circular lapping board.
- the elliptical vibration is a vibration of standing wave occurring along the circular lapping board.
- the present invention furthermore resides in a lapping machine comprising at least one longitudinal or circular lapping board equipped with a ultrasonic oscillation-applying device which applies elliptical vibration to the lapping board and a supporting means arranged adjacently to the lapping board.
- This lapping machine is named a first lapping machine in the specification.
- Means for guiding an object to be lapped is further comprised.
- the supporting means is a longitudinal or circular lapping board equipped with a ultrasonic oscillation-applying device which applies single-mode vibration to the lapping board.
- the present invention furthermore resides in a lapping machine comprising a pair of longitudinal lapping boards equipped with a ultrasonic oscillation-applying device which applies elliptical vibration to the lapping board arranged in parallel.
- This lapping machine is named a second lapping machine in the specification.
- Means for guiding an object to be lapped is further comprised.
- An auxiliary lapping board equipped with a ultrasonic oscillation-applying device which applies elliptical or single-mode vibration to the auxiliary lapping board is arranged between the pair of the lapping boards.
- the present invention furthermore resides in a lapping machine comprising a pair of circular lapping boards equipped with a ultrasonic oscillation-applying device which applies elliptical vibration to the lapping board arranged coaxially.
- This lapping machine is named a third lapping machine in the specification.
- Means for guiding an object to be lapped is further comprised.
- FIG. 1 is a front view of a conventional lapping machine.
- FIG. 2 is a top view of the machine of FIG. 1.
- FIG. 3 is schematic view of an example of the lapping machine according to the invention.
- FIG. 4 is a section view taken along the line I-I of FIG. 3 which illustrates the structure of the rotation-guiding means and the object to be lapped.
- FIG. 5 is a view illustrating the progressive wave of elliptical vibration travelling on the longitudinal lapping board.
- FIG. 6 is a schematic view of another example of the lapping machine according to the invention.
- FIG. 7 is a section view taken along the line II-II of FIG. 6 which illustrates the structure of the rotation-guiding means and the object to be lapped.
- FIGS. 8 to 11 are top views showing various lapping machines according to the invention.
- FIG. 12 is a schematic view showing a lapping machine according to the invention.
- FIG. 13 is a partially cutaway schematic view showing assembly of a lapping machine of the invention.
- FIG. 14 is a view explaining a mechanism producing an elliptical vibration of standing wave occurring along the longitudinal lapping board.
- FIG. 3 a representative construction of the second lapping machine of the invention is schematically illustrated.
- the lapping machine of FIG. 3 comprises a pair of longitudinal lapping boards 31 , 32 which are equipped with a ultrasonic oscillation-applying device and arranged in parallel.
- the ultrasonic oscillation-applying device is capable of applying elliptical vibration to the lapping board.
- the lapping boards 31 , 32 can be made of tin or tin-antimony alloy.
- the ultrasonic oscillation-applying device capable of applying elliptical vibration to the lapping board 31 comprises a pair of Langevin vibrators 41 a, 41 b
- the ultrasonic oscillation-applying device capable of applying elliptical vibration to the lapping board 32 comprises a pair of Langevin vibrators 42 a, 42 b.
- the Langevin vibrator 42 a comprises a piezoelectric transducer 43 a, a supporting frame 44 , and another piezoelectric transducer 43 b which are combined between a pair of metallic blocks 45 a, 45 b and bolted on each other.
- the Langevin vibrators 41 a, 41 b, and 42 b have the same structure as that of the Langevin vibrator 42 a.
- Each of the metallic blocks 45 a, 45 b is, for instance, made of alminum metal.
- the lapping machine of FIG. 3 has a rotation-guiding means 33 which assists a rotation of an object to be lapped on its axis.
- the rotation-guiding means 33 comprises an object-holding means 33 a and an arm 33 c which are connected via a bearing 33 b. An object to be lapped is held on the object-holding means 33 a on the lapping board side.
- the object 40 is attached to the object-holding means 33 a in such manner that the object 40 is rotatable on its axis by the aid of a bearing 33 of the rotation-guiding means 33 .
- the object 40 is attached temporarily to the object-holding means 33 a, for instance, via wax.
- the lapping machine of FIG. 3 is equipped with a pair of abrasive grain-supplying means 36 which supply a slurry of abrasive grains between the object 40 and the lapping boards 31 , 32 .
- the abrasive grains are generally supplied onto the lapping boards in the form of a slurry.
- Representative examples of the abrasive grains include grains of diamond, alumina, and silica.
- pipe lines and pump system for supplying the abrasive grains to the abrasive grain-supplying means 36 and a frame for fixing the abrasive grain-supplying means 36 to the base board 30 are not shown.
- the abrasive grains can be placed on the lapping boards prior to start of the lapping procedure.
- a lubricant such as olive oil is preferably supplied onto the lapping board on which the abrasive grains are placed.
- the lapping procedure corresponding to the aforementioned second lapping method are described below using the lapping machined illustrated in FIGS. 3 and 4.
- the object 40 is placed on the longitudinal lapping boards 31 , 32 via abrasive grains; and activating the ultrasonic oscillation-applying device to apply elliptical vibration to the lapping boards 31 , 32 , whereby the object is caused to rotate on an axis thereof and lapped.
- each of the lapping boards 31 , 32 is provided with a progressive wave of elliptical vibration which is generated the ultrasonic oscillation-applying device.
- Each of the arrows 31 a, 32 b indicates the direction of progressive wave travelling on each lapping board.
- the ultrasonic oscillation-applying devices attached to lapping boards are preferably set to apply progressive waves of an elliptical vibration of opposite directions to the lapping boards.
- the object 40 on the lapping boards 31 , 32 on which the progressive waves of elliptical vibration are travelled receives moments directed reversely to the progressing waves. Accordingly, the object 40 rotates on its axis in the direction of allow 34 .
- the object 40 is lapped in the course of the rotation on the lapping boards 31 , 32 . Details of mechanism to apply the progressive wave of elliptical vibration to the longitudinal lapping board are described hereinafter.
- the longitudinal lapping board preferably has a rounded edge 39 so as to smoothly rotate the object 40 on the lapping boards 31 , 32 .
- the lapping machine of the invention can be employed for lapping an object of large size, with no use of a large sized lapping disc board.
- a plurality of objects can be lapped simultaneously on the lapping boards of the invention, by placing the objects along the longitudinal lapping boards.
- the lapping machine of the invention preferably comprises a linear driving means for moving the object to be lapped along the longitudinal lapping boards, whereby obviate occurrence of uneven wear on the surface of the lapping boards.
- the lapping machined of FIG. 3 has a voice coil motor 37 as the linear driving means.
- the voice coil motor 37 is fixed to a supporting means 35 standing on the base board 30 and has a driving axis connected to the arm 33 c of the rotation-guiding means 33 .
- the object 40 under rotation is alternately moved forward and backward on the longitudinal lapping boards 31 , 32 so that the lapping boards are kept from occurrence of uneven wear on their surfaces.
- the mechanism for applying a progressive wave of elliptical vibration to the longitudinal lapping board is explained by referring to FIG. 5.
- the longitudinal lapping board 51 of FIG. 5 is equipped with Langevin vibrator 52 a, 52 b which generates an elliptical vibration.
- the progressive wave of elliptical vibration can be applied to the lapping board 51 in the following manner.
- the alternating current source 53 applies an alternating voltage to the Langevin vibrator 52 a
- the Langevin vibrator 52 a generates ultrasonic wave and applies the ultrasonic wave to the longitudinal lapping board 51 , whereby the lapping board 51 vibrates in the depth direction.
- the vibration applied to the lapping board 51 is transmitted to the Langevin vibrator 52 b and converted into an electric energy in the vibrator 52 b.
- the electric energy is then consumed in the resistance 54 and coil 55 .
- the vibration applied to the lapping board 51 by the Langevin vibrator 52 a does not produce a standing wave in the longitudinal direction of the lapping board 51 , but produces a progressive wave of elliptical vibration which has a depth vibration component and a vibration component in the longitudinal direction.
- the arrow 51 a shown in FIG. 5 indicates the direction of the progressive wave of elliptical vibration transmitting on the lapping board 51 . If a progressive wave of elliptical vibration advancing in the opposite direction is desired, the alternating current source is connected to the Langevin vibrator 52 b, while the resistance and coil are connected to the Langevin vibrator 52 a.
- the longitudinal lapping board preferably has a length not less than twice, more preferably not less than three times, the width of the board, so that the progressive wave of elliptical vibration is smoothly transmitted in the longitudinal direction.
- the mechanism for applying the progressive wave of elliptical vibration to the longitudinal board is the same as that for applying an progressive wave of elliptical vibration to a stator of a surface wave type ultrasonic linear motor.
- the longitudinal lapping board 51 corresponds to a stator of a surface wave type ultrasonic linear motor, while the object to be lapped corresponds to a slider of the surface wave type ultrasonic linear motor. More details for applying a progressive wave of elliptical vibration to a longitudinal board are seen in “Piezoelectric/Electrostrictive Actuators” (Morikita Publishing, 1996, pages 183-186).
- FIG. 6 schematically illustrates another example of the second lapping machine of the invention employing a pair of longitudinal lapping boards.
- the lapping machine of FIG. 6 comprises a pair of longitudinal lapping boards 31 , 32 and four Langevin vibrators, which are the same as those of lapping machined of FIG. 3.
- the lapping machine of FIG. 6 further comprises a rotation-guiding means consisting of a pair of bar magnets 64 a, 64 b.
- the “S” and “N” shown in the bar magnets 64 a, 64 b indicate poles of respective bar magnets.
- the object-holding means 63 has an object to be lapped, on its lapping board side.
- FIG. 7 is a section view of a combination of the object 40 to be lapped and the object-holding means 63 taken along the line II-II in FIG. 6.
- the object-holding means 63 comprises a stainless steel disc 63 a and a ring-shaped magnet 63 b placed around the disc 63 a.
- the “S” and “N” shown in the ring-shaped magnets 63 b indicate poles in the magnet 63 b.
- Each of the bar magnets 64 a, 64 b repels the ring-shaped magnet 63 b of the object-holding means 63 . Therefore, the rotation of the object 40 (which is attached to the object-holding means 63 ) on its axis is assisted by the bar magnets 64 a, 64 b.
- the bar magnets 64 a, 64 b further function to define the movement of the object-holding means 63 so that the object 40 attached to the object-holding means 63 can move only along the longitudinal lapping board.
- the lapping machine of FIG. 6 further comprises a pair of magnetic contact switches 65 a, 65 b arranged on either ends of the longitudinal lapping boards 31 , 32 .
- the magnetic contact switches 65 a, 65 b detects the position of the object-holding means 63 when it becomes into contact with the switches 65 a, 65 b.
- the object 40 can be not only rotated on its axis but also moves alternately forward and backward along the longitudinal lapping boards 31 , 32 by adjusting the directions of the progressive waves of elliptical vibration applied to the lapping boards.
- the progressive waves of elliptical vibration advancing in the same directions are applied to both of the lapping boards 31 , 32 , the object 40 to be lapped linearly moves in the direction opposite to the directions of the progressive waves. If such linear movement of the object 40 is periodically caused on the lapping boards, troublesome uneven wear of the surfaces of the lapping boards can be obviated.
- the lapping of the object can be done with periodical linear movement along the longitudinal lapping boards in the below-mentioned manner.
- the object 40 is lapped under rotation on its axis on the lapping boards 31 , 32 , by applying progressive waves of elliptical vibration advancing opposite directions on the lapping boards.
- progressive waves of elliptical vibrations advancing in the same directions (such as the direction indicated by the arrow 31 a) are applied to the lapping boards 31 , 32 , to move the object 40 to advance towards the magnetic contact switch 65 b. If the lapping of the object 40 under rotation and the movement of the object along the longitudinal lapping boards are periodically repeated, the object 40 reaches the ends of the longitudinal lapping boards. The position of the object 40 is then detected by the magnetic contact switch 65 b.
- the object 40 moves forward and backward periodically along the lapping boards 31 , 32 .
- FIGS. 8 and 9 are a top view of the first lapping machine to be used for performing the first lapping method.
- two longitudinal boards 81 , 82 and the object 40 to be lapped only are shown.
- the progressive wave of elliptical vibration is applied only to the longitudinal board 82 .
- the longitudinal board 81 may serve only to support the object 40 .
- the rate of rotation and rate of movement can be controlled by adjusting the amplitude of vibration of the progressive wave of elliptical vibration applied to the lapping board 82 .
- the amplitude of vibration of the progressive wave can be adjusted by varying the amplitude of vibration and the frequency of alternating voltage applied to the Langevin vibrator.
- the longitudinal board 81 shown in FIGS. 8 and 9 serves to assist the rotation and movement of the object 40 . It is preferred to apply a single mode vibration to the longitudinal board 81 so that the object can rotate and move on the longitudinal board 81 .
- the vibration can be of a vertical mode, a slide mode, a flexural mode, a longitudinal mode, or a spread mode.
- the single mode vibration consists of a vibration according to one of these modes.
- the single mode vibration of vertical mode can be given to the longitudinal board 81 by applying simultaneously an alternating voltage to each of two Langevin vibrators attached to the longitudinal board 81 . Since the vibrations given by the Langevin vibrators are not absorbed by any of the generators, no progressive wave of elliptical vibration cannot be produced, and a standing wave of a vertical mode is produced in the longitudinal board 81 .
- the single mode vibration can be applied to the longitudinal board 81 by other means than the Langevin vibrator.
- a piezoelectric transducer capable of emitting a single mode vibration is attached to the longitudinal board 81 on the underside to apply a single mode vibration to the longitudinal board.
- a slurry containing abrasive grains can be supplied onto the longitudinal board 81 so that the longitudinal board 81 can serve as a lapping board.
- the object 40 can be lapped not only on the lapping board 82 but also on the longitudinal board 81 .
- the longitudinal board 81 can be replaced with a simple supporting means having a slidable or rotatable head.
- FIG. 10 is a top view of an example of the second lapping machine according to the invention.
- a pair of longitudinal lapping boards 81 , 82 and an object 40 to be lapped are shown.
- FIG. 10 when progressive waves of elliptical vibration 81 a, 82 b are applied to the lapping boards 81 , 82 , respectively, the object 40 is rotated in the direction indicated by the arrow 70 a and lapped because the object 40 receives moments of power supplied in the directions indicated by the arrows 83 b, 84 a. If the amplitude of the progressive wave 81 a is set to a value larger than the amplitude of the progressive wave 82 b, the object 40 moves in the direction indicated by the arrow 83 b along the longitudinal lapping board while rotating on its axis.
- FIG. 11 illustrates a top view of a variation of the second lapping machine according to the invention.
- the lapping machine of FIG. 11 is the same as that of FIG. 10 except that an auxiliary longitudinal lapping board 83 is arranged between the lapping boards 81 , 82 . It is preferred to apply a single mode vibration to the auxiliary lapping board 83 , so that the object 40 can be more evenly lapped.
- the lapping machine of FIG. 11 can rotate the object 40 on its axis, while moving the object 40 in an optionally determined direction.
- FIG. 12 is a schematic view of the third lapping machine according to the invention.
- the lapping machine of FIG. 12 comprises two coaxially arranged-circular lapping boards 91 , 92 , each of which is equipped with a circular ultrasonic transducer 95 , 96 capable of generating an elliptical vibration.
- the circular piezoelectric transducers 95 , 96 are fixed on the base board 90 via a supporting pad of elastic material.
- the lapping machine of FIG. 12 further comprises an object-guiding means composed of a object-holding means 33 a, a bearing 33 b, and an arm 44 c.
- the object to be lapped is attached to the object-holding means on the underside.
- the arm 33 is connected to a motor 97 which moves the object-holding means along the circular lapping boards 91 , 92 .
- the third lapping method of the invention is described below, with reference to the lapping machine of FIG. 12.
- the object is placed on the circular lapping boards 91 , 92 via abrasive grains, and lapped while rotating on its axis by activating the piezoelectric transducers to apply elliptical vibration to the lapping boards.
- the piezoelectric transducers 95 , 96 are activated to apply a progressive wave of elliptical vibration to each of the circular lapping boards 91 , 92 .
- the arrows 91 a, 92 a indicate the direction of progressive waves of elliptical vibration travelling on the circular lapping boards.
- the object then receives moments indicated by the arrows 93 b, 94 b by the travelling of the progressive waves.
- the contact surface area between the object and the lapping board 92 is larger than the contact surface area between the object and the lapping board 91 .
- the object receives a moment from the progressive wave travelling on the outer lapping board 92 which is larger than a moment from the progressive wave travelling on the inner lapping board 91 .
- the object rotates on its axis in the direction indicated by the arrow 34 and is lapped on both of the inner and outer lapping boards 91 , 92 . It is preferred that the object to be lapped is moved along the circular lapping boards 91 , 92 by means of the object-guiding means.
- the object-guiding means of FIG. 12 can be replaced with a set of coaxially arranged circular magnets, which can function in the same manner as the magnetic bars arranged in parallel in FIG. 6.
- Each of the circular piezoelectric transducers 95 , 96 attached respectively to the circular lapping boards 91 , 92 comprises a circular piezoelectric ceramic element and a pair of electrode each of which is attached to each surface of the piezoelectric ceramic element.
- the electrode attached on one surface of the electrode is divided into two electrode areas which are separated from each other.
- each circular piezoelectric transducer can generate ultrasonic vibrations from the two areas along the circular lapping board by applying an alternating voltage between each of the two separated electrodes and the electrode attached to other side.
- a progressive wave of elliptical vibration is generated and travels along the circular lapping board.
- the circular lapping board preferably has a length not less than twice, more preferably not less than three timer, the width of the board, so that the progressive wave of elliptical vibration is smoothly transmitted in the circular direction.
- the mechanism for applying the progressive wave of elliptical vibration to the circular board is the same as that for applying a progressive wave of elliptical vibration to a stator of a surface wave type ultrasonic rotary motor.
- the circular lapping board 51 corresponds to a stator of a surface wave type ultrasonic rotary motor
- the object to be lapped corresponds to a slider of the surface wave type ultrasonic rotary motor. More details for applying a progressive wave of elliptical vibration to a circular board are described in “Piezoelectric/Electrostrictive Actuators” (Morikita Publishing, 1996, pages 187-192).
- FIG. 13 is a partially cutaway view indicating an assembly of an example of the third lapping machine according to the invention.
- the lapping machine of FIG. 13 comprises two coaxially arranged-circular lapping boards 91 , 92 , each of which is equipped with a circular ultrasonic transducer capable of generating an elliptical vibration.
- the lapping machined of FIG. 13 further comprises two coaxially arranged-circular lapping boards 101 , 102 , each of which is equipped with a circular ultrasonic transducer capable of generating an elliptical vibration on the upper side.
- Each of the three objects 40 is supported by three rollers 103 which enable the object to rotate on its axis.
- the rollers 103 are fixed to a metal disc 104 which is connected rotatably to a rotating axis 105 of a motor (not shown).
- Each of the three objects 40 rotates not only on its axis but also moves along the circular lapping boards by activating the motor.
- Each of the three objects 40 in FIG. 13 receives moments from the progressive wave of elliptical vibrations travelling on the circular lapping boards 91 , 92 and further from the progressive wave of elliptical vibrations travelling on the circular lapping boards 101 , 102 , and is lapped on both of the upper surface and lower surface.
- the standing wave of elliptical vibration can be applied to the longitudinal or circular lapping board in the longitudinal or circular direction.
- the mechanism for applying the standing wave of elliptical vibration to the longitudinal lapping board is described below.
- the longitudinal lapping board 131 is equipped a pair of piezoelectric transducers 132 a, 132 b which generate a depth sliding mode vibration and a piezoelectric transducer 133 which generates a vertical mode vibration on the lower surface.
- the piezoelectric transducer 133 is supported by a longitudinal board 134 which is fixed to the tops of supporting poles 135 standing on the base board (not shown).
- Each of the arrows 136 a, 136 b, 137 shown in FIG. 14 indicates a polarizing direction of the piezoelectric ceramic element attached to each piezoelectric transducer. On either surface of the piezoelectric ceramic element, an electrode (not shown) for applying an alternating voltage is placed.
- the lapping board 131 is given simultaneously a depth sliding mode vibration and a vertical mode vibration. Then, a standing wave of elliptical vibration comprising a vibration in the depth direction and a vibration in the longitudinal direction is produced on the lapping board 131 .
- the combination of vibration modes of the piezoelectric transducers attached to the lower side of the longitudinal lapping board 131 is not limited to the combination of the sliding mode vibration and the vertical mode vibration.
- any combination of a vibration mode having a component vibrating in the depth direction of the lapping board and a vibration having a component vibrating in the longitudinal direction of the lapping board, such as a combination of a flexural mode vibration and a vertical mode vibration can be utilized.
- the mechanism for applying the standing wave of elliptical vibration to the longitudinal board is the same as that for applying a standing wave of elliptical vibration to a stator of a complex transducer type ultrasonic linear motor.
- the longitudinal lapping board 131 corresponds to a stator of a complex transducer type ultrasonic linear motor
- the object to be lapped corresponds to a slider of the complex transducer type ultrasonic linear motor. More details for applying a standing wave of elliptical vibration to a longitudinal board are described in “Ultrasonic Engineering” (Corona Co., Ltd., 1999, page 287).
- a standing wave of elliptical vibration can be applied to a circular lapping board by placing a combination of a piezoelectric transducer generating a sliding mode vibration and a piezoelectric transducer generating a vertical mode vibration on the lower surface of the circular lapping board.
- the mechanism for applying the standing wave of elliptical vibration to the circular board is the same as that for applying a standing wave of elliptical vibration to a stator of a complex transducer type ultrasonic rotary motor.
- the circular lapping board corresponds to a stator of a complex transducer type ultrasonic rotary motor
- the object to be lapped corresponds to a slider of the complex transducer type ultrasonic rotary motor. More details for applying a standing wave of elliptical vibration to a circular board are described in “Ultrasonic Engineering” (Corona Co., Ltd., 1999, pages 291-292).
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
An object such as an electronic device can be favorably lapped by a method composed of preparing a lapping machine having a longitudinal or circular lapping board equipped with a ultrasonic oscillation-applying device which applies elliptical vibration to the lapping board and a supporting means arranged adjacently to the lapping board; placing the object on the lapping board via abrasive grains and further on the supporting means; and activating the ultrasonic oscillation-applying device to apply elliptical vibration to the lapping board whereby the object is caused to rotate on an axis thereof and lapped.
Description
- This invention relates to a lapping method and a lapping device. In particular, the invention relates to a method and machine favorably employable for lapping objects having a relative large size.
- The lapping machine is generally employed for lapping accurately a surface of an object such as a silicon substrate to be employed for manufacturing an integrated circuit or an alumina-titanium carbide substrate to be employed for manufacturing a magnetic head.
- FIG. 1 is a front view of a typical structure of the conventionally employed lapping machine, and FIG. 2 is a top view of the lapping machine of FIG. 1. The lapping machine of FIGS. 1 and 2 comprises a
lapping board 13 which is fixed to an axis ofrotation 12 of amotor 11, a abrasive grain-supplying means 15 which supplies aslurry 14 containing abrasive grains on the surface of thelapping board 13, and disc means 17 for rotatably supporting anobject 16 to be lapped. - The
object 16 is temporarily attached to the supportingmeans 17 via wax or the like. The supportingmeans 17 is supported on its circumferential side with a pair ofrollers 20. Eachroller 20 is rotatably supported by a roller-supportingmeans 23 which is arranged on the top of apole 22 standing on abase board 21. - The
lapping board 13 rotates in the direction indicated by the arrow 19 (see FIG. 2) by activating themotor 11. With the rotation of thelapping board 13, the supportingmeans 17 holding theobject 16 rotates under guidance with the pair ofrollers 20. - On the surface of the
lapping board 13, theabrasive grain slurry 14 is dropwise supplied from the abrasive grain-supplying means 15. Abrasive grains generally are diamond grains, alumina grains, or silica grains. Theabrasive grain slurry 14 is moved toward theobject 16 and supplied between thelapping board 13 and theobject 16 by the rotation of thelapping board 13. - The
lapping board 13 temporarily holds abrasive grains between theobject 16 and theboard 13. Thus, thelapping board 13 is generally made of relatively soft material such as tin, as compared with the abrasive grains. For instance, a lapping board made of tin is slightly deformed on its surface to temporarily hold the abrasive grains. - When the
lapping board 13 and the object to be lapped 16 are independently rotated with the intervening abrasive grains, the under-surface of theobject 16 is polished. The polishing using abrasive grains is generally named “lapping”. - Japanese Patent Provisional Publication No. 11-320376 describes an improvement of the lapping machine which has means for adjusting conditions of contact between the lapping board and the object to be lapped.
- The conventional lapping machine is favorably employed for lapping an object having a relatively small size. If an object having a large size such as silicon substrate of 12 inches is to be lapped in a lapping machine or a number of objects are lapped simultaneously in one lapping machine, it is required that the lapping machine employs a large sized lapping board and a high-powered motor. It is known that the horizontal accuracy on the surface of the lapping board should be less than 100 μm, if the object is lapped with a high accuracy. Apparently, it is not easy to manufacture a large sized lapping board with a high horizontal accuracy. Accordingly, it is not easy to lap a large-sized object with a high accuracy using the conventional lapping machine. If a large-sized lapping board can be manufacture, its manufacturing cost is very high.
- Accordingly, it is an object of the invention to provide a method particularly favorable for lapping a large-sized object with a high accuracy.
- The present invention resides in a method for lapping an object which comprises preparing a lapping machine comprising at least one longitudinal or circular lapping board equipped with a ultrasonic oscillation-applying device which applies elliptical vibration to the lapping board and a supporting means arranged adjacently to the lapping board; placing the object on the lapping board via abrasive grains and further on the supporting means; and activating the ultrasonic oscillation-applying device to apply elliptical vibration to the lapping board whereby the object is caused to rotate on an axis thereof and lapped. This lapping method is named a first lapping method in the specification.
- In the first lapping method, the following embodiments are preferred.
- (1) The rotation of the object is guided by a rotation-guiding means attached to the lapping machine.
- (2) The supporting means is a longitudinal or circular lapping board equipped with a ultrasonic oscillation-applying device which applies single-mode vibration to the lapping board and the object is placed on the supporting means via abrasive grains.
- (3) The elliptical vibration is a vibration of progressive wave travelling along the longitudinal or circular lapping board.
- (4) The elliptical vibration is a vibration of standing wave occurring along the longitudinal or circular lapping board.
- The present invention further resides in a method for lapping an object which comprises preparing a lapping machine comprising a pair of longitudinal lapping boards equipped with a ultrasonic oscillation-applying device which applies elliptical vibration to the lapping board arranged in parallel; placing the object on the lapping boards via abrasive grains; and activating the ultrasonic oscillation-applying device to apply elliptical vibration to the lapping boards whereby the object is caused to rotate on an axis thereof and lapped. This lapping method is named a second lapping method in the specification.
- In the second lapping method, the following embodiments are preferred.
- (1) The rotation of the object is guided by a rotation-guiding means attached to the lapping machine.
- (2) An auxiliary lapping board equipped with a ultrasonic oscillation-applying device which applies elliptical or single-mode vibration to the auxiliary lapping board is arranged between the pair of the lapping boards, and the object is further lapped on the auxiliary lapping board.
- (3) The elliptical vibration is a vibration of progressive wave travelling along the longitudinal lapping board.
- (4) The elliptical vibration is a vibration of standing wave occurring along the longitudinal lapping board.
- The present invention furthermore resides in a method for lapping an object which comprises preparing a lapping machine comprising a pair of circular lapping boards equipped with a ultrasonic oscillation-applying device which applies elliptical vibration to the lapping board arranged coaxially; placing the object on the lapping boards via abrasive grains; and activating the ultrasonic oscillation-applying device to apply elliptical vibration to the lapping boards whereby the object is caused to rotate on an axis thereof and lapped. This lapping method is named a third lapping method in the specification.
- In the third lapping method, the following embodiments are preferred.
- (1) The object is further moved along the circular lapping boards.
- (2) The elliptical vibration is a vibration of progressive wave travelling along the circular lapping board.
- (3) The elliptical vibration is a vibration of standing wave occurring along the circular lapping board.
- The present invention furthermore resides in a lapping machine comprising at least one longitudinal or circular lapping board equipped with a ultrasonic oscillation-applying device which applies elliptical vibration to the lapping board and a supporting means arranged adjacently to the lapping board.
- This lapping machine is named a first lapping machine in the specification.
- In the first lapping machine, the following embodiments are preferred.
- (1) Means for guiding an object to be lapped is further comprised.
- (2) The supporting means is a longitudinal or circular lapping board equipped with a ultrasonic oscillation-applying device which applies single-mode vibration to the lapping board.
- The present invention furthermore resides in a lapping machine comprising a pair of longitudinal lapping boards equipped with a ultrasonic oscillation-applying device which applies elliptical vibration to the lapping board arranged in parallel. This lapping machine is named a second lapping machine in the specification.
- In the second lapping machine, the following embodiments are preferred.
- (1) Means for guiding an object to be lapped is further comprised.
- (2) An auxiliary lapping board equipped with a ultrasonic oscillation-applying device which applies elliptical or single-mode vibration to the auxiliary lapping board is arranged between the pair of the lapping boards.
- The present invention furthermore resides in a lapping machine comprising a pair of circular lapping boards equipped with a ultrasonic oscillation-applying device which applies elliptical vibration to the lapping board arranged coaxially. This lapping machine is named a third lapping machine in the specification.
- In the third lapping machine, the following embodiments are preferred.
- (1) Means for guiding an object to be lapped is further comprised.
- FIG. 1 is a front view of a conventional lapping machine.
- FIG. 2 is a top view of the machine of FIG. 1.
- FIG. 3 is schematic view of an example of the lapping machine according to the invention.
- FIG. 4 is a section view taken along the line I-I of FIG. 3 which illustrates the structure of the rotation-guiding means and the object to be lapped.
- FIG. 5 is a view illustrating the progressive wave of elliptical vibration travelling on the longitudinal lapping board.
- FIG. 6 is a schematic view of another example of the lapping machine according to the invention.
- FIG. 7 is a section view taken along the line II-II of FIG. 6 which illustrates the structure of the rotation-guiding means and the object to be lapped.
- FIGS. 8 to 11 are top views showing various lapping machines according to the invention.
- FIG. 12 is a schematic view showing a lapping machine according to the invention.
- FIG. 13 is a partially cutaway schematic view showing assembly of a lapping machine of the invention.
- FIG. 14 is a view explaining a mechanism producing an elliptical vibration of standing wave occurring along the longitudinal lapping board.
- The present invention is further described by referring to the figures given in the attached drawings.
- In FIG. 3, a representative construction of the second lapping machine of the invention is schematically illustrated.
- The lapping machine of FIG. 3 comprises a pair of
31, 32 which are equipped with a ultrasonic oscillation-applying device and arranged in parallel. The ultrasonic oscillation-applying device is capable of applying elliptical vibration to the lapping board. The lappinglongitudinal lapping boards 31, 32 can be made of tin or tin-antimony alloy.boards - In FIG. 3, the ultrasonic oscillation-applying device capable of applying elliptical vibration to the lapping
board 31 comprises a pair ofLangevin vibrators 41 a, 41 b, while the ultrasonic oscillation-applying device capable of applying elliptical vibration to the lappingboard 32 comprises a pair ofLangevin vibrators 42 a, 42 b. - The Langevin vibrator 42 a comprises a piezoelectric transducer 43 a, a supporting
frame 44, and anotherpiezoelectric transducer 43 b which are combined between a pair of 45 a, 45 b and bolted on each other. The Langevin vibrators 41 a, 41 b, and 42 b have the same structure as that of the Langevin vibrator 42 a. Each of themetallic blocks 45 a, 45 b is, for instance, made of alminum metal.metallic blocks - The lapping machine of FIG. 3 has a rotation-guiding means 33 which assists a rotation of an object to be lapped on its axis. The rotation-guiding
means 33 comprises an object-holding means 33 a and anarm 33 c which are connected via abearing 33 b. An object to be lapped is held on the object-holding means 33 a on the lapping board side. - FIG. 4 of a section view of a combination of the rotation-guiding
means 33 and theobject 40 to be lapped taken along the line I-I in FIG. 3. Theobject 40 is attached to the object-holding means 33 a in such manner that theobject 40 is rotatable on its axis by the aid of abearing 33 of the rotation-guidingmeans 33. Theobject 40 is attached temporarily to the object-holding means 33 a, for instance, via wax. - The lapping machine of FIG. 3 is equipped with a pair of abrasive grain-supplying
means 36 which supply a slurry of abrasive grains between theobject 40 and the lapping 31, 32. The abrasive grains are generally supplied onto the lapping boards in the form of a slurry. Representative examples of the abrasive grains include grains of diamond, alumina, and silica. In FIG. 3, pipe lines and pump system for supplying the abrasive grains to the abrasive grain-supplyingboards means 36 and a frame for fixing the abrasive grain-supplyingmeans 36 to thebase board 30 are not shown. - The abrasive grains can be placed on the lapping boards prior to start of the lapping procedure. A lubricant such as olive oil is preferably supplied onto the lapping board on which the abrasive grains are placed.
- The lapping procedure corresponding to the aforementioned second lapping method are described below using the lapping machined illustrated in FIGS. 3 and 4. In the second lapping method, the
object 40 is placed on the 31, 32 via abrasive grains; and activating the ultrasonic oscillation-applying device to apply elliptical vibration to the lappinglongitudinal lapping boards 31, 32, whereby the object is caused to rotate on an axis thereof and lapped.boards - In the lapping machine illustrated in FIGS. 3 and 4, each of the lapping
31, 32 is provided with a progressive wave of elliptical vibration which is generated the ultrasonic oscillation-applying device. Each of theboards 31 a, 32 b indicates the direction of progressive wave travelling on each lapping board. As is shown in FIG. 3, the ultrasonic oscillation-applying devices attached to lapping boards are preferably set to apply progressive waves of an elliptical vibration of opposite directions to the lapping boards. Thearrows object 40 on the lapping 31, 32 on which the progressive waves of elliptical vibration are travelled receives moments directed reversely to the progressing waves. Accordingly, theboards object 40 rotates on its axis in the direction of allow 34. Theobject 40 is lapped in the course of the rotation on the lapping 31, 32. Details of mechanism to apply the progressive wave of elliptical vibration to the longitudinal lapping board are described hereinafter. The longitudinal lapping board preferably has a roundedboards edge 39 so as to smoothly rotate theobject 40 on the lapping 31, 32.boards - As is apparent from the above-given explanations, the lapping machine of the invention can be employed for lapping an object of large size, with no use of a large sized lapping disc board.
- A plurality of objects can be lapped simultaneously on the lapping boards of the invention, by placing the objects along the longitudinal lapping boards.
- The lapping machine of the invention preferably comprises a linear driving means for moving the object to be lapped along the longitudinal lapping boards, whereby obviate occurrence of uneven wear on the surface of the lapping boards. The lapping machined of FIG. 3 has a
voice coil motor 37 as the linear driving means. Thevoice coil motor 37 is fixed to a supporting means 35 standing on thebase board 30 and has a driving axis connected to thearm 33 c of the rotation-guidingmeans 33. In the course of lapping, theobject 40 under rotation is alternately moved forward and backward on the 31, 32 so that the lapping boards are kept from occurrence of uneven wear on their surfaces.longitudinal lapping boards - The mechanism for applying a progressive wave of elliptical vibration to the longitudinal lapping board is explained by referring to FIG. 5. The longitudinal lapping board 51 of FIG. 5 is equipped with
Langevin vibrator 52 a, 52 b which generates an elliptical vibration. The progressive wave of elliptical vibration can be applied to the lapping board 51 in the following manner. - To the Langevin vibrator 52 a is electrically connected an alternating
current source 53, while to theLangevin vibrator 52 b are electrically connected aresistance 54 and acoil 55. - When the alternating
current source 53 applies an alternating voltage to the Langevin vibrator 52 a, the Langevin vibrator 52 a generates ultrasonic wave and applies the ultrasonic wave to the longitudinal lapping board 51, whereby the lapping board 51 vibrates in the depth direction. The vibration applied to the lapping board 51 is transmitted to theLangevin vibrator 52 b and converted into an electric energy in thevibrator 52 b. The electric energy is then consumed in theresistance 54 andcoil 55. Thus, the vibration applied to the lapping board 51 by the Langevin vibrator 52 a does not produce a standing wave in the longitudinal direction of the lapping board 51, but produces a progressive wave of elliptical vibration which has a depth vibration component and a vibration component in the longitudinal direction. The arrow 51 a shown in FIG. 5 indicates the direction of the progressive wave of elliptical vibration transmitting on the lapping board 51. If a progressive wave of elliptical vibration advancing in the opposite direction is desired, the alternating current source is connected to theLangevin vibrator 52 b, while the resistance and coil are connected to the Langevin vibrator 52 a. - The longitudinal lapping board preferably has a length not less than twice, more preferably not less than three times, the width of the board, so that the progressive wave of elliptical vibration is smoothly transmitted in the longitudinal direction.
- The mechanism for applying the progressive wave of elliptical vibration to the longitudinal board is the same as that for applying an progressive wave of elliptical vibration to a stator of a surface wave type ultrasonic linear motor. In more detail, the longitudinal lapping board 51 corresponds to a stator of a surface wave type ultrasonic linear motor, while the object to be lapped corresponds to a slider of the surface wave type ultrasonic linear motor. More details for applying a progressive wave of elliptical vibration to a longitudinal board are seen in “Piezoelectric/Electrostrictive Actuators” (Morikita Publishing, 1996, pages 183-186).
- FIG. 6 schematically illustrates another example of the second lapping machine of the invention employing a pair of longitudinal lapping boards. The lapping machine of FIG. 6 comprises a pair of
31, 32 and four Langevin vibrators, which are the same as those of lapping machined of FIG. 3.longitudinal lapping boards - The lapping machine of FIG. 6 further comprises a rotation-guiding means consisting of a pair of
bar magnets 64 a, 64 b. The “S” and “N” shown in thebar magnets 64 a, 64 b indicate poles of respective bar magnets. The object-holding means 63 has an object to be lapped, on its lapping board side. - FIG. 7 is a section view of a combination of the
object 40 to be lapped and the object-holding means 63 taken along the line II-II in FIG. 6. The object-holding means 63 comprises a stainless steel disc 63 a and a ring-shapedmagnet 63 b placed around the disc 63 a. The “S” and “N” shown in the ring-shapedmagnets 63 b indicate poles in themagnet 63 b. - Each of the
bar magnets 64 a, 64 b repels the ring-shapedmagnet 63 b of the object-holdingmeans 63. Therefore, the rotation of the object 40 (which is attached to the object-holding means 63) on its axis is assisted by thebar magnets 64 a, 64 b. Thebar magnets 64 a, 64 b further function to define the movement of the object-holding means 63 so that theobject 40 attached to the object-holding means 63 can move only along the longitudinal lapping board. - The lapping machine of FIG. 6 further comprises a pair of magnetic contact switches 65 a, 65 b arranged on either ends of the
31, 32. The magnetic contact switches 65 a, 65 b detects the position of the object-holding means 63 when it becomes into contact with thelongitudinal lapping boards switches 65 a, 65 b. - In the same manner as in the lapping machine of FIG. 3, the progressive waves of elliptical vibration indicated by the
31 a, 32 b are applied to the lappingarrows 31, 32 of FIG. 6, and theboards object 40 to be lapped which is attached to the object-holding means 63 rotates on its axis in the direction indicated by thearrow 34. - In the lapping machine of FIGS. 6 and 7, the
object 40 can be not only rotated on its axis but also moves alternately forward and backward along the 31, 32 by adjusting the directions of the progressive waves of elliptical vibration applied to the lapping boards. For instance, the progressive waves of elliptical vibration advancing in the same directions are applied to both of the lappinglongitudinal lapping boards 31, 32, theboards object 40 to be lapped linearly moves in the direction opposite to the directions of the progressive waves. If such linear movement of theobject 40 is periodically caused on the lapping boards, troublesome uneven wear of the surfaces of the lapping boards can be obviated. - The lapping of the object can be done with periodical linear movement along the longitudinal lapping boards in the below-mentioned manner.
- (1) In the first place, the
object 40 is lapped under rotation on its axis on the lapping 31, 32, by applying progressive waves of elliptical vibration advancing opposite directions on the lapping boards. At a lapse of a predetermined period of time, progressive waves of elliptical vibrations advancing in the same directions (such as the direction indicated by theboards arrow 31a) are applied to the lapping 31, 32, to move theboards object 40 to advance towards themagnetic contact switch 65 b. If the lapping of theobject 40 under rotation and the movement of the object along the longitudinal lapping boards are periodically repeated, theobject 40 reaches the ends of the longitudinal lapping boards. The position of theobject 40 is then detected by themagnetic contact switch 65 b. - (2) Subsequently, progressive waves of elliptical vibrations reversely advancing in the same directions (such as the direction indicated by the
arrow 32 b) are applied to the lapping 31, 32, to move theboards object 40 to advance towards the magnetic contact switch 65 a. At a lapse of a predetermined period of time, theobject 40 is again lapped under rotation on its axis on the lapping 31, 32, by applying progressive waves of elliptical vibration advancing opposite directions on the lapping boards. If the lapping of theboards object 40 under rotation and the movement of the object along the longitudinal lapping boards are periodically repeated, theobject 40 reaches the ends of the longitudinal lapping boards. The position of theobject 40 is then detected by the magnetic contact switch 65 a. - If the rotations and linear movements of the
object 40 are repeated, theobject 40 moves forward and backward periodically along the lapping 31, 32.boards - Each of FIGS. 8 and 9 is a top view of the first lapping machine to be used for performing the first lapping method. In FIGS. 8 and 9, two
81, 82 and thelongitudinal boards object 40 to be lapped only are shown. - In operating the lapping machine of FIG. 8 or 9, the progressive wave of elliptical vibration is applied only to the
longitudinal board 82. Thelongitudinal board 81 may serve only to support theobject 40. - As is shown in FIG. 8, when a progressive wave of elliptical vibration in the direction indicated by the
arrow 82 b is applied to the lappingboard 82, a power is given to theobject 40 by the progressive wave to move in the direction indicated by thearrow 84 a. By this power, theobject 40 rotates on its axis in the direction indicated by thearrow 70 a and is lapped, and further moves in the direction indicated by the arrow 80 a along thelongitudinal lapping board 82. - In the above-mentioned procedure, the rate of rotation and rate of movement can be controlled by adjusting the amplitude of vibration of the progressive wave of elliptical vibration applied to the lapping
board 82. The amplitude of vibration of the progressive wave can be adjusted by varying the amplitude of vibration and the frequency of alternating voltage applied to the Langevin vibrator. - In the lapping machine of FIG. 9, when a progressive wave of elliptical vibration in the direction indicated by the
arrow 82 a is applied to the lappingboard 82, a power is given to theobject 40 by the progressive wave to move in the direction indicated by thearrow 84 b. By this power, theobject 40 rotates on its axis in the direction indicated by thearrow 70 b and is lapped, and further moves in the direction indicated by thearrow 80 b along thelongitudinal lapping board 82. - The
longitudinal board 81 shown in FIGS. 8 and 9 serves to assist the rotation and movement of theobject 40. It is preferred to apply a single mode vibration to thelongitudinal board 81 so that the object can rotate and move on thelongitudinal board 81. The vibration can be of a vertical mode, a slide mode, a flexural mode, a longitudinal mode, or a spread mode. The single mode vibration consists of a vibration according to one of these modes. For instance, the single mode vibration of vertical mode can be given to thelongitudinal board 81 by applying simultaneously an alternating voltage to each of two Langevin vibrators attached to thelongitudinal board 81. Since the vibrations given by the Langevin vibrators are not absorbed by any of the generators, no progressive wave of elliptical vibration cannot be produced, and a standing wave of a vertical mode is produced in thelongitudinal board 81. - The single mode vibration can be applied to the
longitudinal board 81 by other means than the Langevin vibrator. For instance, a piezoelectric transducer capable of emitting a single mode vibration is attached to thelongitudinal board 81 on the underside to apply a single mode vibration to the longitudinal board. - A slurry containing abrasive grains can be supplied onto the
longitudinal board 81 so that thelongitudinal board 81 can serve as a lapping board. Thus, theobject 40 can be lapped not only on the lappingboard 82 but also on thelongitudinal board 81. - The
longitudinal board 81 can be replaced with a simple supporting means having a slidable or rotatable head. - FIG. 10 is a top view of an example of the second lapping machine according to the invention. In FIG. 10, there are shown a pair of
81, 82 and anlongitudinal lapping boards object 40 to be lapped. - In FIG. 10, when progressive waves of
elliptical vibration 81 a, 82 b are applied to the lapping 81, 82, respectively, theboards object 40 is rotated in the direction indicated by thearrow 70 a and lapped because theobject 40 receives moments of power supplied in the directions indicated by the 83 b, 84 a. If the amplitude of the progressive wave 81 a is set to a value larger than the amplitude of thearrows progressive wave 82 b, theobject 40 moves in the direction indicated by thearrow 83 b along the longitudinal lapping board while rotating on its axis. - On the other hand, if progressive waves of elliptical vibration advancing in the same direction (same as the progressive wave 81 a) are applied to both of the
81, 82, the object can be moved in the direction indicated by thelongitudinal lapping boards arrow 83 b along the longitudinal lapping boards in the same manner as described for the lapping machine of FIG. 6. If the amplitude of the progressive wave 81 a is set to a value larger than the amplitude of theprogressive wave 82 b, theobject 40 moves in the direction indicated by thearrow 83 b along the longitudinal lapping board while rotating on its axis. - FIG. 11 illustrates a top view of a variation of the second lapping machine according to the invention. The lapping machine of FIG. 11 is the same as that of FIG. 10 except that an auxiliary longitudinal lapping
board 83 is arranged between the lapping 81, 82. It is preferred to apply a single mode vibration to theboards auxiliary lapping board 83, so that theobject 40 can be more evenly lapped. - If a progressive wave of elliptical vibration to the
auxiliary lapping board 83 in the direction indicated by 81 a, theobject 40 moves in thedirection 83 b, while rotating on its axis. Thus, the lapping machine of FIG. 11 can rotate theobject 40 on its axis, while moving theobject 40 in an optionally determined direction. - FIG. 12 is a schematic view of the third lapping machine according to the invention. The lapping machine of FIG. 12 comprises two coaxially arranged-
91, 92, each of which is equipped with a circularcircular lapping boards 95, 96 capable of generating an elliptical vibration. The circularultrasonic transducer 95, 96 are fixed on thepiezoelectric transducers base board 90 via a supporting pad of elastic material. - The lapping machine of FIG. 12 further comprises an object-guiding means composed of a object-holding means 33 a, a
bearing 33 b, and an arm 44 c. The object to be lapped is attached to the object-holding means on the underside. Thearm 33 is connected to amotor 97 which moves the object-holding means along the 91, 92.circular lapping boards - The third lapping method of the invention is described below, with reference to the lapping machine of FIG. 12. According to the third lapping method, the object is placed on the
91, 92 via abrasive grains, and lapped while rotating on its axis by activating the piezoelectric transducers to apply elliptical vibration to the lapping boards.circular lapping boards - In the lapping machine of FIG. 12, the
95, 96 are activated to apply a progressive wave of elliptical vibration to each of thepiezoelectric transducers 91, 92. The arrows 91 a, 92 a indicate the direction of progressive waves of elliptical vibration travelling on the circular lapping boards. The object then receives moments indicated by thecircular lapping boards 93 b, 94 b by the travelling of the progressive waves. Apparently, the contact surface area between the object and the lappingarrows board 92 is larger than the contact surface area between the object and the lappingboard 91. Accordingly, the object receives a moment from the progressive wave travelling on the outer lappingboard 92 which is larger than a moment from the progressive wave travelling on theinner lapping board 91. Thus, the object rotates on its axis in the direction indicated by thearrow 34 and is lapped on both of the inner and 91, 92. It is preferred that the object to be lapped is moved along theouter lapping boards 91, 92 by means of the object-guiding means.circular lapping boards - The object-guiding means of FIG. 12 can be replaced with a set of coaxially arranged circular magnets, which can function in the same manner as the magnetic bars arranged in parallel in FIG. 6.
- The mechanism for applying the progressive wave of elliptical vibration to the circular lapping boards is described below.
- Each of the circular
95, 96 attached respectively to thepiezoelectric transducers 91, 92 comprises a circular piezoelectric ceramic element and a pair of electrode each of which is attached to each surface of the piezoelectric ceramic element. The electrode attached on one surface of the electrode is divided into two electrode areas which are separated from each other. Thus, each circular piezoelectric transducer can generate ultrasonic vibrations from the two areas along the circular lapping board by applying an alternating voltage between each of the two separated electrodes and the electrode attached to other side. By delaying generation of ultrasonic vibration in one area from generation of ultrasonic vibration in another area, for instance, by 90°, a progressive wave of elliptical vibration is generated and travels along the circular lapping board.circular lapping boards - The circular lapping board preferably has a length not less than twice, more preferably not less than three timer, the width of the board, so that the progressive wave of elliptical vibration is smoothly transmitted in the circular direction.
- The mechanism for applying the progressive wave of elliptical vibration to the circular board is the same as that for applying a progressive wave of elliptical vibration to a stator of a surface wave type ultrasonic rotary motor. In more detail, the circular lapping board 51 corresponds to a stator of a surface wave type ultrasonic rotary motor, while the object to be lapped corresponds to a slider of the surface wave type ultrasonic rotary motor. More details for applying a progressive wave of elliptical vibration to a circular board are described in “Piezoelectric/Electrostrictive Actuators” (Morikita Publishing, 1996, pages 187-192).
- FIG. 13 is a partially cutaway view indicating an assembly of an example of the third lapping machine according to the invention. The lapping machine of FIG. 13 comprises two coaxially arranged-
91, 92, each of which is equipped with a circular ultrasonic transducer capable of generating an elliptical vibration. The lapping machined of FIG. 13 further comprises two coaxially arranged-circular lapping boards 101, 102, each of which is equipped with a circular ultrasonic transducer capable of generating an elliptical vibration on the upper side.circular lapping boards - Between a set of the
91, 92 and a set of thecircular lapping boards 101, 102, threecircular lapping boards objects 40 to be lapped are provided. The threeobjects 40 are pressed between the lower lapping boards and the upper lapping boards by means of a pressing means such as anair cylinder 108 which is attached to asupport disc 107 to which the lapping 101, 102 are fixed.boards - Each of the three
objects 40 is supported by threerollers 103 which enable the object to rotate on its axis. Therollers 103 are fixed to ametal disc 104 which is connected rotatably to arotating axis 105 of a motor (not shown). Each of the threeobjects 40 rotates not only on its axis but also moves along the circular lapping boards by activating the motor. - Each of the three
objects 40 in FIG. 13 receives moments from the progressive wave of elliptical vibrations travelling on the 91, 92 and further from the progressive wave of elliptical vibrations travelling on thecircular lapping boards 101, 102, and is lapped on both of the upper surface and lower surface.circular lapping boards - In performing the lapping method of the invention, not only the progressive wave of elliptical vibration but also a standing wave of elliptical vibration can be utilized for the desired lapping. For instance, the standing wave of elliptical vibration can be applied to the longitudinal or circular lapping board in the longitudinal or circular direction. The mechanism for applying the standing wave of elliptical vibration to the longitudinal lapping board is described below.
- In FIG. 14, the
longitudinal lapping board 131 is equipped a pair ofpiezoelectric transducers 132 a, 132 b which generate a depth sliding mode vibration and apiezoelectric transducer 133 which generates a vertical mode vibration on the lower surface. Thepiezoelectric transducer 133 is supported by alongitudinal board 134 which is fixed to the tops of supportingpoles 135 standing on the base board (not shown). - Each of the
136 a, 136 b, 137 shown in FIG. 14 indicates a polarizing direction of the piezoelectric ceramic element attached to each piezoelectric transducer. On either surface of the piezoelectric ceramic element, an electrode (not shown) for applying an alternating voltage is placed.arrows - When the
132 a, 132 b, 133 are caused to generate ultrasonic vibrations by applying an alternating voltage, the lappingpiezoelectric transducers board 131 is given simultaneously a depth sliding mode vibration and a vertical mode vibration. Then, a standing wave of elliptical vibration comprising a vibration in the depth direction and a vibration in the longitudinal direction is produced on the lappingboard 131. - When the time phase of the sliding mode vibration is in advance of the time phase of the vertical mode vibration by 90°, a standing wave of elliptical vibration rotating along the
arrow 138 is given to the lappingboard 131. Accordingly, if an object to be lapped is placed on the lappingboard 131 via abrasive grains, the object is moved in the direction indicated by the arrow 139 by a moment caused by the standing wave of elliptical vibration rotating in the direction ofarrow 138. - When the time phase of the sliding mode vibration is behind the time phase of the vertical mode vibration by 90°, a standing wave of elliptical vibration rotating reversely to the
arrow 138 is given to the lappingboard 131. Accordingly, if an object to be lapped is placed on the lappingboard 131 via abrasive grains, the object is moved in the direction reverse to the arrow 139 by a moment caused by the standing wave of elliptical vibration rotating reversely to the direction ofarrow 138. - The combination of vibration modes of the piezoelectric transducers attached to the lower side of the
longitudinal lapping board 131 is not limited to the combination of the sliding mode vibration and the vertical mode vibration. For instance, any combination of a vibration mode having a component vibrating in the depth direction of the lapping board and a vibration having a component vibrating in the longitudinal direction of the lapping board, such as a combination of a flexural mode vibration and a vertical mode vibration can be utilized. - The mechanism for applying the standing wave of elliptical vibration to the longitudinal board is the same as that for applying a standing wave of elliptical vibration to a stator of a complex transducer type ultrasonic linear motor. In more detail, the
longitudinal lapping board 131 corresponds to a stator of a complex transducer type ultrasonic linear motor, while the object to be lapped corresponds to a slider of the complex transducer type ultrasonic linear motor. More details for applying a standing wave of elliptical vibration to a longitudinal board are described in “Ultrasonic Engineering” (Corona Co., Ltd., 1999, page 287). - Similarly, a standing wave of elliptical vibration can be applied to a circular lapping board by placing a combination of a piezoelectric transducer generating a sliding mode vibration and a piezoelectric transducer generating a vertical mode vibration on the lower surface of the circular lapping board.
- The mechanism for applying the standing wave of elliptical vibration to the circular board is the same as that for applying a standing wave of elliptical vibration to a stator of a complex transducer type ultrasonic rotary motor. In more detail, the circular lapping board corresponds to a stator of a complex transducer type ultrasonic rotary motor, while the object to be lapped corresponds to a slider of the complex transducer type ultrasonic rotary motor. More details for applying a standing wave of elliptical vibration to a circular board are described in “Ultrasonic Engineering” (Corona Co., Ltd., 1999, pages 291-292).
- There are no limitations of number of the longitudinal or circular lapping boards placed in one lapping machine of the invention. Thus, one, two or more lapping boards can be placed in one lapping machine.
Claims (22)
1. A method for lapping an object which comprises preparing a lapping machine comprising at least one longitudinal or circular lapping board equipped with a ultrasonic oscillation-applying device which applies elliptical vibration to the lapping board and a supporting means arranged adjacently to the lapping board; placing the object on the lapping board via abrasive grains and further on the supporting means; and activating the ultrasonic oscillation-applying device to apply elliptical vibration to the lapping board whereby the object is caused to rotate on an axis thereof and lapped.
2. The method of claim 1 , wherein the rotation of the object is guided by a rotation-guiding means attached to the lapping machine.
3. The method of claim 1 , wherein the supporting means is a longitudinal or circular lapping board equipped with a ultrasonic oscillation-applying device which applies single-mode vibration to the lapping board and the object is placed on the supporting means via abrasive grains.
4. The method of claim 1 , wherein the elliptical vibration is a vibration of progressive wave travelling along the longitudinal or circular lapping board.
5. The method of claim 1 , wherein the elliptical vibration is a vibration of standing wave occurring along the longitudinal or circular lapping board.
6. A method for lapping an object which comprises preparing a lapping machine comprising a pair of longitudinal lapping boards equipped with a ultrasonic oscillation-applying device which applies elliptical vibration to the lapping board arranged in parallel; placing the object on the lapping boards via abrasive grains; and activating the ultrasonic oscillation-applying device to apply elliptical vibration to the lapping boards whereby the object is caused to rotate on an axis thereof and lapped.
7. The method of claim 6 , wherein the rotation of the object is guided by a rotation-guiding means attached to the lapping machine.
8. The method of claim 6 , wherein an auxiliary lapping board equipped with a ultrasonic oscillation-applying device which applies elliptical or single-mode vibration to the auxiliary lapping board is arranged between the pair of the lapping boards, and the object is further lapped on the auxiliary lapping board.
9. The method of claim 6 , wherein the elliptical vibration is a vibration of progressive wave travelling along the longitudinal lapping board.
10. The method of claim 6 , wherein the elliptical vibration is a vibration of standing wave occurring along the longitudinal lapping board.
11. A method for lapping an object which comprises preparing a lapping machine comprising a pair of circular lapping boards equipped with a ultrasonic oscillation-applying device which applies elliptical vibration to the lapping board arranged coaxially; placing the object on the lapping boards via abrasive grains; and activating the ultrasonic oscillation-applying device to apply elliptical vibration to the lapping boards whereby the object is caused to rotate on an axis thereof and lapped.
12. The method of claim 11 , wherein the object is further moved along the circular lapping boards.
13. The method of claim 11 , wherein the elliptical vibration is a vibration of progressive wave travelling along the circular lapping board.
14. The method of claim 11 , wherein the elliptical vibration is a vibration of standing wave occurring along the circular lapping board.
15. A lapping machine comprising at least one longitudinal or circular lapping board equipped with a ultrasonic oscillation-applying device which applies elliptical vibration to the lapping board and a supporting means arranged adjacently to the lapping board.
16. The lapping machine of claim 15 which further comprises means for guiding an object to be lapped.
17. The lapping machine of claim 15 , wherein the supporting means is a longitudinal or circular lapping board equipped with a ultrasonic oscillation-applying device which applies single-mode vibration to the lapping board.
18. A lapping machine comprising a pair of longitudinal lapping boards equipped with a ultrasonic oscillation-applying device which applies elliptical vibration to the lapping board arranged in parallel.
19. The lapping machine of claim 18 which further comprises means for guiding an object to be lapped.
20. The lapping machine of claim 18 which further comprises an auxiliary lapping board equipped with a ultrasonic oscillation-applying device which applies elliptical or single-mode vibration to the auxiliary lapping board arranged between the pair of the lapping boards.
21. A lapping machine comprising a pair of circular lapping boards equipped with a ultrasonic oscillation-applying device which applies elliptical vibration to the lapping board arranged coaxially.
22. The lapping machine of claim 21 which further comprises means for guiding an object to be lapped.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002383466 | 2002-12-24 | ||
| JP2002-383466 | 2002-12-24 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US20040137830A1 true US20040137830A1 (en) | 2004-07-15 |
Family
ID=32708745
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US10/742,924 Abandoned US20040137830A1 (en) | 2002-12-24 | 2003-12-23 | Lapping method and lapping machine |
Country Status (1)
| Country | Link |
|---|---|
| US (1) | US20040137830A1 (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040237414A1 (en) * | 2003-05-26 | 2004-12-02 | Kazumasa Ohnishi | Manufacture of lapping board |
| US20070122546A1 (en) * | 2005-11-25 | 2007-05-31 | Mort Cohen | Texturing pads and slurry for magnetic heads |
| US20070202777A1 (en) * | 2004-03-31 | 2007-08-30 | Japan Science And Technology Agency | Linearly Advancing Polishing Method And Apparatus |
| US20080318498A1 (en) * | 2005-12-22 | 2008-12-25 | Aktiebolaget Skf | Vibration Device for a Super Finishing Apparatus and an Attachment Tool Comprising the Vibration Device |
| CN101947749A (en) * | 2010-09-14 | 2011-01-19 | 西安理工大学 | Numerical control machine tool capable of grinding two sides of plane by dislocation self-rotation and ultrasonic vibration |
| CN103042444A (en) * | 2012-12-24 | 2013-04-17 | 镇江大有硬质材料有限公司 | Artificial diamond compact cutter grinding method |
| CN103042440A (en) * | 2012-12-24 | 2013-04-17 | 镇江大有硬质材料有限公司 | Artificial diamond compact lathe tool grinding device |
| CN104669074A (en) * | 2015-03-13 | 2015-06-03 | 江西农业大学 | Variable track-ultrasonic elliptic vibration type auxiliary consolidation abrasive polishing machine |
| TWI802224B (en) * | 2022-01-14 | 2023-05-11 | 國立臺北科技大學 | Flange device using voice coil motor and contact control method thereof |
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| US5099614A (en) * | 1986-09-01 | 1992-03-31 | Speedfam Co., Ltd. | Flat lapping machine with sizing mechanism |
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| US7717769B2 (en) | 2003-05-26 | 2010-05-18 | Kazumasa Ohnishi | Manufacture of lapping board |
| US7303599B2 (en) * | 2003-05-26 | 2007-12-04 | Kazumasa Ohnishi | Manufacture of lapping board |
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| US20070202777A1 (en) * | 2004-03-31 | 2007-08-30 | Japan Science And Technology Agency | Linearly Advancing Polishing Method And Apparatus |
| US20070122546A1 (en) * | 2005-11-25 | 2007-05-31 | Mort Cohen | Texturing pads and slurry for magnetic heads |
| US20080318498A1 (en) * | 2005-12-22 | 2008-12-25 | Aktiebolaget Skf | Vibration Device for a Super Finishing Apparatus and an Attachment Tool Comprising the Vibration Device |
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| CN101947749A (en) * | 2010-09-14 | 2011-01-19 | 西安理工大学 | Numerical control machine tool capable of grinding two sides of plane by dislocation self-rotation and ultrasonic vibration |
| CN103042444A (en) * | 2012-12-24 | 2013-04-17 | 镇江大有硬质材料有限公司 | Artificial diamond compact cutter grinding method |
| CN103042440A (en) * | 2012-12-24 | 2013-04-17 | 镇江大有硬质材料有限公司 | Artificial diamond compact lathe tool grinding device |
| CN104669074A (en) * | 2015-03-13 | 2015-06-03 | 江西农业大学 | Variable track-ultrasonic elliptic vibration type auxiliary consolidation abrasive polishing machine |
| TWI802224B (en) * | 2022-01-14 | 2023-05-11 | 國立臺北科技大學 | Flange device using voice coil motor and contact control method thereof |
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| STCB | Information on status: application discontinuation |
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