US20030070920A1 - Electrode for use in a capacitor - Google Patents
Electrode for use in a capacitor Download PDFInfo
- Publication number
- US20030070920A1 US20030070920A1 US10/277,533 US27753302A US2003070920A1 US 20030070920 A1 US20030070920 A1 US 20030070920A1 US 27753302 A US27753302 A US 27753302A US 2003070920 A1 US2003070920 A1 US 2003070920A1
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- United States
- Prior art keywords
- ruthenium
- substrate
- precursor
- iii
- solution
- Prior art date
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- Abandoned
Links
- 239000003990 capacitor Substances 0.000 title abstract description 32
- 239000000758 substrate Substances 0.000 claims abstract description 77
- 238000000576 coating method Methods 0.000 claims abstract description 40
- 239000011248 coating agent Substances 0.000 claims abstract description 34
- 239000002243 precursor Substances 0.000 claims abstract description 33
- 229910052707 ruthenium Inorganic materials 0.000 claims abstract description 32
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims abstract description 31
- 150000004820 halides Chemical class 0.000 claims abstract description 7
- 239000000243 solution Substances 0.000 claims description 30
- 238000000034 method Methods 0.000 claims description 27
- 239000002904 solvent Substances 0.000 claims description 16
- 239000002184 metal Substances 0.000 claims description 14
- 150000001875 compounds Chemical class 0.000 claims description 13
- 229910052751 metal Inorganic materials 0.000 claims description 13
- 230000008021 deposition Effects 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 11
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 10
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 10
- 229910052715 tantalum Inorganic materials 0.000 claims description 9
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 8
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 8
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 8
- 238000005507 spraying Methods 0.000 claims description 8
- 150000003839 salts Chemical class 0.000 claims description 7
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 6
- 229910052719 titanium Inorganic materials 0.000 claims description 6
- 239000010936 titanium Substances 0.000 claims description 6
- PZLUXLXSZCSBND-UHFFFAOYSA-K C(C)(=O)[O-].N(=O)[Ru+3].C(C)(=O)[O-].C(C)(=O)[O-] Chemical compound C(C)(=O)[O-].N(=O)[Ru+3].C(C)(=O)[O-].C(C)(=O)[O-] PZLUXLXSZCSBND-UHFFFAOYSA-K 0.000 claims description 5
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 5
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 5
- 229910052735 hafnium Inorganic materials 0.000 claims description 5
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 5
- 229910052750 molybdenum Inorganic materials 0.000 claims description 5
- 239000011733 molybdenum Substances 0.000 claims description 5
- 229910052759 nickel Inorganic materials 0.000 claims description 5
- 239000010955 niobium Substances 0.000 claims description 5
- 229910052758 niobium Inorganic materials 0.000 claims description 5
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 5
- ICSRHFHFSPRLNA-UHFFFAOYSA-H nitroxyl anion ruthenium(4+) trisulfate Chemical compound S(=O)(=O)([O-])[O-].N(=O)[Ru+3].S(=O)(=O)([O-])[O-].S(=O)(=O)([O-])[O-].N(=O)[Ru+3] ICSRHFHFSPRLNA-UHFFFAOYSA-H 0.000 claims description 5
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 5
- 229910052721 tungsten Inorganic materials 0.000 claims description 5
- 239000010937 tungsten Substances 0.000 claims description 5
- 229910052720 vanadium Inorganic materials 0.000 claims description 5
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 claims description 5
- 229910052726 zirconium Inorganic materials 0.000 claims description 5
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 4
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 4
- WOSOOWIGVAKGOC-UHFFFAOYSA-N azanylidyneoxidanium;ruthenium(2+);trinitrate Chemical group [Ru+2].[O+]#N.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O WOSOOWIGVAKGOC-UHFFFAOYSA-N 0.000 claims description 4
- 229910017052 cobalt Inorganic materials 0.000 claims description 4
- 239000010941 cobalt Substances 0.000 claims description 4
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 239000010931 gold Substances 0.000 claims description 4
- 229910052742 iron Inorganic materials 0.000 claims description 4
- 229910052763 palladium Inorganic materials 0.000 claims description 4
- 229910052697 platinum Inorganic materials 0.000 claims description 4
- BPEVHDGLPIIAGH-UHFFFAOYSA-N ruthenium(3+) Chemical compound [Ru+3] BPEVHDGLPIIAGH-UHFFFAOYSA-N 0.000 claims description 4
- 229910052709 silver Inorganic materials 0.000 claims description 4
- 239000004332 silver Substances 0.000 claims description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 3
- 229910002651 NO3 Inorganic materials 0.000 claims description 3
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 claims description 3
- 239000007864 aqueous solution Substances 0.000 claims description 3
- 238000000889 atomisation Methods 0.000 claims description 3
- 238000005422 blasting Methods 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 238000007598 dipping method Methods 0.000 claims description 3
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims description 3
- 238000010422 painting Methods 0.000 claims description 3
- 238000010345 tape casting Methods 0.000 claims description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 claims description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 2
- 230000001680 brushing effect Effects 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 239000011651 chromium Substances 0.000 claims description 2
- 229910052741 iridium Inorganic materials 0.000 claims description 2
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052762 osmium Inorganic materials 0.000 claims description 2
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 claims description 2
- 238000001020 plasma etching Methods 0.000 claims description 2
- 229910052703 rhodium Inorganic materials 0.000 claims description 2
- 239000010948 rhodium Substances 0.000 claims description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 2
- 238000007790 scraping Methods 0.000 claims description 2
- 229910001220 stainless steel Inorganic materials 0.000 claims description 2
- 239000010935 stainless steel Substances 0.000 claims description 2
- 229910052725 zinc Inorganic materials 0.000 claims description 2
- 239000011701 zinc Substances 0.000 claims description 2
- 239000002253 acid Substances 0.000 claims 1
- 239000003125 aqueous solvent Substances 0.000 claims 1
- 239000002245 particle Substances 0.000 claims 1
- 239000003153 chemical reaction reagent Substances 0.000 abstract description 20
- 239000000463 material Substances 0.000 abstract description 13
- 238000005137 deposition process Methods 0.000 abstract description 4
- 239000000460 chlorine Substances 0.000 abstract description 3
- 229910052801 chlorine Inorganic materials 0.000 abstract description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 abstract description 2
- 238000000151 deposition Methods 0.000 description 10
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 10
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 9
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- -1 ammonium hexachlororuthenium(III) Chemical compound 0.000 description 6
- 239000003792 electrolyte Substances 0.000 description 6
- 150000002500 ions Chemical class 0.000 description 6
- 239000011888 foil Substances 0.000 description 5
- 150000002739 metals Chemical class 0.000 description 4
- YLPJWCDYYXQCIP-UHFFFAOYSA-N nitroso nitrate;ruthenium Chemical compound [Ru].[O-][N+](=O)ON=O YLPJWCDYYXQCIP-UHFFFAOYSA-N 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 229910001092 metal group alloy Inorganic materials 0.000 description 3
- 229910017604 nitric acid Inorganic materials 0.000 description 3
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 3
- 229910001936 tantalum oxide Inorganic materials 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 150000001242 acetic acid derivatives Chemical class 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000004146 energy storage Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 229910001867 inorganic solvent Inorganic materials 0.000 description 2
- 239000003049 inorganic solvent Substances 0.000 description 2
- 150000002823 nitrates Chemical class 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- SWLVFNYSXGMGBS-UHFFFAOYSA-N ammonium bromide Chemical compound [NH4+].[Br-] SWLVFNYSXGMGBS-UHFFFAOYSA-N 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 239000013536 elastomeric material Substances 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 239000012457 nonaqueous media Substances 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- DKNJHLHLMWHWOI-UHFFFAOYSA-L ruthenium(2+);sulfate Chemical compound [Ru+2].[O-]S([O-])(=O)=O DKNJHLHLMWHWOI-UHFFFAOYSA-L 0.000 description 1
- OJLCQGGSMYKWEK-UHFFFAOYSA-K ruthenium(3+);triacetate Chemical compound [Ru+3].CC([O-])=O.CC([O-])=O.CC([O-])=O OJLCQGGSMYKWEK-UHFFFAOYSA-K 0.000 description 1
- BIXNGBXQRRXPLM-UHFFFAOYSA-K ruthenium(3+);trichloride;hydrate Chemical compound O.Cl[Ru](Cl)Cl BIXNGBXQRRXPLM-UHFFFAOYSA-K 0.000 description 1
- GTCKPGDAPXUISX-UHFFFAOYSA-N ruthenium(3+);trinitrate Chemical compound [Ru+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O GTCKPGDAPXUISX-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- UDKRLEXYBPHRQF-UHFFFAOYSA-K trichlorotantalum Chemical compound Cl[Ta](Cl)Cl UDKRLEXYBPHRQF-UHFFFAOYSA-K 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
Definitions
- the present invention generally relates to coating a substrate with a ruthenium-containing oxide compound. More particularly, the present invention relates to a metallic foil provided with a ruthenium oxide or a ruthenium-containing oxide for use in a capacitor, and the like.
- a capacitor electrode generally includes a substrate of a conductive metal such as titanium or tantalum provided with a ruthenium oxide coating or a ruthenium-containing oxide coating.
- a ruthenium oxide cathode the coating is formed on the substrate by dissolving a ruthenium-containing halide precursor in a solvent.
- a ruthenium-containing halide precursor typically used precursors include ruthenium(III) chloride hydrate and ammonium hexachlororuthenium(III).
- the present invention describes the deposition of a ruthenium oxide compound or a ruthenium-containing oxide compound, or a precursor thereof, onto a conductive substrate.
- the reagent solution is substantially devoid of halides to prevent contamination of the counter electrode when the coated substrate is used as an electrode in an electrical energy storage device, such as a capacitor.
- the substrate is preferably heated during the deposition process and supports the coating as it is solidified or, in the case of a precursor, converted to a solidified product compound.
- FIG. 1 is a schematic of a unipolar electrode configuration for use in an electrochemical capacitor.
- FIG. 2 is a schematic of a bipolar electrode configuration for use in an electrochemical capacitor.
- FIG. 3 is a schematic of a hybrid capacitor according to the present invention.
- FIG. 4 is a schematic of a spirally wound configuration for use in an electrochemical capacitor.
- the first step in the process includes providing a solution of reagents.
- the reagent solution preferably contains ions in substantially the ratio needed to form the desired coating. These ions are preferably available in solution in water-soluble form such as in water-soluble salts of nitrates, acetates, and sulfates. However, salts including nitrates, acetates and sulfates that are soluble in other solvents such as organic and inorganic solvents may be used.
- the substrate preferably consists of a conductive metal such as titanium, molybdenum, tantalum, niobium, cobalt, nickel, stainless steel, tungsten, platinum, palladium, gold, silver, copper, chromium, vanadium, aluminum, zirconium, hafnium, zinc and iron, and the like, and mixtures and alloys thereof.
- a conductive metal such as titanium, molybdenum, tantalum, niobium, cobalt, nickel, stainless steel, tungsten, platinum, palladium, gold, silver, copper, chromium, vanadium, aluminum, zirconium, hafnium, zinc and iron, and the like, and mixtures and alloys thereof.
- ruthenium-containing oxide coatings rely mostly upon mechanical bonding to the substrate surface. It is, therefore, critical that the substrate surface to be coated is properly prepared to ensure coating quality. For one, substrate surface cleanliness is very important in all coating systems, especially in ultrasonically deposited spray coatings. In that respect, it is required that the substrate surface remain uncontaminated by lubricants from handling equipment or body oils from hands and the like. Substrate cleaning includes chemical means such as conventional degreasing treatments using aqueous and non-aqueous solutions, as are well known to those skilled in the art. Plasma cleaning is also contemplated by the scope of the present invention.
- the electrical conductivity of the substrate is improved prior to coating.
- Metal and metal alloys have a native oxide present on their surface. This is a resistive layer and hence, if the material is to be used as a substrate for a capacitor electrode, the oxide is preferably removed or made electrically conductive prior to deposition of a pseudocapacitive coating thereon.
- various techniques can be employed. One is shown and described in U.S. Pat. No. 5,098,485 to Evans, the disclosure of which is hereby incorporated by reference.
- a preferred method for improving the conductivity of the substrate includes depositing a minor amount of a metal or metals from Groups IA, IVA and VIIIA of the Periodic Table of Elements onto the substrate.
- a metal or metals from Groups IA, IVA and VIIIA of the Periodic Table of Elements
- Aluminum, manganese, nickel and copper are also suitable for this purpose.
- the deposited metal is then “intermixed” with the substrate material by, for example, a high-energy ion beam or a laser beam directed towards the deposited surface.
- These substrate-treating processes are performed at relatively low temperatures to prevent substrate degradation and deformation. Additionally, these treating processes can be used to passivate the substrate from further chemical reaction while still providing adequate electrical conductivity.
- the substrate may be roughened by chemical means, for example, by contacting the substrate with hydrofluoric acid and/or hydrochloric acid containing ammonium bromide and methanol and the like, by plasma etching, and by mechanical means such as scraping, machining, wire brushing, rough threading, grit blasting, a combination of rough threading then grit blasting and abrading such as by contacting the substrate with Scotch-BriteTM abrasive sheets manufactured by 3M.
- the reagent solution preferably contains ions in substantially the stoichiometric ratio needed to form the desired coating.
- the ions are present in the reagent solution as either a water-soluble salt or as one that is soluble in organic and inorganic solvents such as isopropyl alcohol and nitric acid, and mixtures thereof.
- a preferred reagent precursor for a ruthenium oxide coating is a ruthenium nitrate, ruthenium acetate, or ruthenium sulfate, or an organic salt.
- suitable precursors include the water-soluble salts of ruthenium(III) nitrosyl nitrate, nitrosyl ruthenium(III) acetate, and nitrosyl ruthenium(III) sulfate.
- Alcohol soluble salts include nitrosyl ruthenium(III) acetate, nitrosyl ruthenium(III) sulfate and ruthenium(III) 2,4-pentanedionate.
- Ruthenium oxide can be coated on the substrate without having to go through the precursor step.
- the porous coating may also include a second or more metals.
- the second metal is in the form of an oxide, a nitrate, acetate or a sulfate, and is not essential to the intended use of the coated foil as a capacitor electrode, and the like.
- the second metal is selected from one or more of the group consisting of tantalum, titanium, nickel, iridium, platinum, palladium, gold, silver, cobalt, molybdenum, manganese, tungsten, iron, zirconium, hafnium, rhodium, vanadium, osmium and niobium.
- the porous coating product includes oxides of ruthenium and tantalum.
- the reagent solution is preferably at a concentration of from about 0.01 to about 1,000 grams of the reagent compounds per liter of the reagent solution. In one embodiment of the present invention, it is preferred that the reagent solution has a concentration of from about 1 to about 300 grams per liter and, more preferably, from about 5 to about 60 grams per liter.
- Suitable methods for contacting the substrate with the reagent solution include dipping, painting, doctor-blading, pressurized air atomization spraying, or aerosolized spraying of the material onto the substrate.
- Sol-gel deposition is another suitable coating method.
- U.S. Pat. Nos. 5,894,403 to Shah et al., 5,920,455 to Shah et al., 6,224,985 to Shah et al., and 6,468,605 to Shah et al. all of which are assigned to the assignee of the present invention and incorporated herein by reference.
- the substrate is heated at a temperature sufficient to instantaneously evaporate or otherwise drive off the solvent from the deposited ruthenium-containing reagent solution.
- the coated substrate is subsequently heated to convert the precursor to the desired ruthenium oxide.
- the solvent is evaporated from the substrate almost instantaneously with contact of the reagent solution, resulting in the deposition of a relatively thin film oxide coating.
- the substrate is preferably heated to a temperature of from about 70° C.
- the substrate is heated to a temperature of from about 100° C. to about 300° C. to instantaneously evaporate the water from the deposited reagent mixture.
- the reagent material is then heated to a temperature sufficient to convert the deposited precursor to a highly porous, high surface area ruthenium-containing oxide.
- typical heating times range from about one-half hour to about six hours.
- the oxide precursor coated substrate is heated to a temperature of about 100° C. to 300° C., preferably about 250° C. for about one hour, followed by a further heating at a temperature of about 250° C. to 400° C., preferably about 300° C. for about two hours.
- a further heating at a temperature of about 100° C. to about 500° C., preferably about 400° C. for about two hours and fifteen minutes immediately follows this.
- the temperature is slowly and steadily ramped up, for example, at about 1° C./minute, preferably about 6° C./min. until the temperature reaches about 400° C. where it is maintained for a time sufficient to convert the precursor to its final product material.
- the substrate is maintained at a temperature sufficient to, for all intents and purposes, instantaneously convert the precursor to a porous, high surface area ruthenium-containing oxide coating on the substrate. More particularly, as the precursor reagent solution is deposited onto the substrate, the substrate is at a temperature of about 100° C. to about 500° C., preferably at least about 200° C., and more preferably about 350° C. to instantaneously convert the precursor to the oxide coating.
- the substrate is ramped down or cooled to ambient temperature, maintained at the heated deposition temperature to enhanced bonding strength, or varied according to a specific profile. In general, it is preferred to conduct the heating steps while contacting the substrate with air or an oxygen-containing gas.
- the resulting ruthenium-containing oxide coating have a thickness of from about a hundred Angstroms to about 0.1 millimeters or more.
- the porous coating has an internal surface area of about 10 m 2 /gram to about 1,500 m 2 /gram.
- the thickness of the substrate is typically in the range of about 0.001 millimeters to about 2 millimeter and preferably about 0.1 millimeters.
- the thickness of the coating on the substrate is determined by means well known to those skilled in the art.
- the temperature of the substrate affects the crystal structure and coating adhesion strength. Higher heating temperatures result in increased intermingling of the deposited reagent materials with the surface ions of the substrate, thereby affecting bonding strength.
- An ultrasonically coated substrate according to the present invention is useful as an electrode in various types of electrochemical capacitors including unipolar and bipolar designs, and capacitors having a spirally wound configuration.
- FIG. 1 there is shown a schematic representation of a typical unipolar electrochemical capacitor 10 having spaced apart electrodes 12 and 14 .
- One of the electrodes, for example, electrode 12 serves as the cathode electrode and comprises a coating 16 A of a ruthenium-containing oxide material provided on a conductive plate 18 A according to the present invention.
- a porous ruthenium oxide film is provided on a tantalum plate 18 A. The relative thicknesses of the plate 18 A and the coating 16 A thereon are distorted for illustrative purposes.
- the plate is about 0.01 millimeters to about 1 millimeter in thickness and the ruthenium-containing oxide coating 16 A is in the range of about a few hundred Angstroms to about 0.1 millimeters thick.
- the other electrode 14 serves as the anode and is of a ruthenium-containing oxide material 16 B contacted to a conductive substrate 18 B, as in electrode 12 .
- An ion permeable membrane 20 serving as a separator separates the cathode electrode 12 and the anode electrode 14 from each other.
- the electrodes 12 and 14 are maintained in the spaced apart relationship shown by opposed insulating members 22 and 24 such as of an elastomeric material contacting end portions of the plates 18 A, 18 B.
- the end plate portions typically are not coated with a ruthenium-containing oxide material.
- An electrolyte (not shown), which may be any of the conventional electrolytes used in electrolytic capacitors, such as a solution of sulfuric acid, potassium hydroxide, or an ammonium salt, is provided between and in contact with the cathode and anode electrodes 12 and 14 .
- Electrodes 12 and 14 are attached to the electrodes 12 and 14 before, during, or after assembly of the capacitor.
- the thusly-constructed unipolar capacitor configuration is housed in a suitable casing (not shown), or the conductive plates along with the insulating members can serve as the capacitor housing.
- FIG. 2 is a schematic representation of a typical bipolar electrochemical capacitor 30 comprising a plurality of capacitor units 32 arranged and interconnected serially.
- Each unit 32 includes a bipolar conductive substrate 34 having ruthenium-containing oxide coatings 36 and 38 provided on its opposite sides. Again, the thickness of the porous coatings 36 and 38 is distorted for illustrative purposes.
- the units 32 are then assembled into the bipolar capacitor configuration on opposite sides of an intermediate separator 40 . Elastomeric insulating members 42 and 44 are provided to maintain the units 32 in their spaced apart relationship.
- a plurality of individual electrochemical capacitor units 32 is interconnected in series to provide the bipolar configuration.
- the serial arrangement of units 32 is completed at the terminal ends thereof by end plates (not shown), as is well known to those skilled in the art.
- An electrolyte 44 is provided between and in contact with the coatings 36 , 38 of the capacitor 30 .
- FIG. 3 shows a schematic representation of an electrolytic capacitor 50 having spaced apart cathode electrodes 52 , 54 , each comprising a ruthenium-containing oxide coating 52 A, 54 A provided on a conductive plate 52 B, 54 B according to the present invention.
- the counter electrode or anode 56 is intermediate the cathodes 52 , 54 with separators 58 , 60 preventing contact between the electrodes.
- the anode 56 is of a conventional sintered metal, preferably in a porous form.
- Suitable anode metals are selected from the group consisting of titanium, aluminum, niobium, zirconium, hafnium, tungsten, molybdenum, vanadium, silicon, germanium and tantalum contacted to a terminal pin 62 .
- FIG. 4 is a schematic drawing of another embodiment of a jellyroll-configured capacitor 70 , which can be manufactured by any one of the processes according to the present invention.
- Capacitor 70 has a plurality of capacitor units 72 , each comprising a conductive substrate provided with a ruthenium-containing oxide coating 74 , 76 on the opposed sides thereof. The coatings are separated from immediately adjacent cells by an intermediate separator 78 . This structure is then wound in a jellyroll fashion and housed in a suitable casing. Leads are contacted to the anode and cathode electrodes and the capacitor is activated by an electrolyte in the customary manner.
- a precursor solution was prepared by dissolving 2.72 grams of ruthenium nitrosyl nitrate in a solvent that consisted of 100 cc of deionized water. If needed, a minor amount, i.e. about 5 cc of nitric acid is used to completely solubilize the precursor. The solution was stirred until the ruthenium nitrosyl nitrate was completely dissolved.
- the foil was heated to a temperature of 350° C.
- the solvent evaporated and a ruthenium nitrosyl nitrate film was created on the surface of the foil.
- the foil temperature of 350° C. was sufficient to convert the ruthenium nitrosyl nitrate to ruthenium oxide substantially instantaneously as the deposition occurred.
- the film was allowed to remain on the heater block for half an hour in order to ensure that the entire nitrate had converted to the oxide.
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Abstract
Description
- The present application is a continuation-in-part of U.S. application Ser. No. 09/808,582, now U.S. Pat. No. 6,468,605 to Shah et al., which is a divisional of U.S. Pat. No. 6,224,985 to Shah et al., which is a divisional of U.S. Pat. No. 5,920,455 to Shah et al.
- 1. Field of the Invention
- The present invention generally relates to coating a substrate with a ruthenium-containing oxide compound. More particularly, the present invention relates to a metallic foil provided with a ruthenium oxide or a ruthenium-containing oxide for use in a capacitor, and the like.
- 2. Prior Art
- Whether an anode or a cathode in an electrochemical capacitor or the cathode in an electrolytic capacitor, a capacitor electrode generally includes a substrate of a conductive metal such as titanium or tantalum provided with a ruthenium oxide coating or a ruthenium-containing oxide coating. In the case of a ruthenium oxide cathode, the coating is formed on the substrate by dissolving a ruthenium-containing halide precursor in a solvent. Typically used precursors include ruthenium(III) chloride hydrate and ammonium hexachlororuthenium(III).
- The problem with ruthenium halide precursors is that when the resulting electrode is coupled with a tantalum anode, the halide, for example chlorine, leaches into the electrolyte and slowly attacks the tantalum oxide (TaO 5) of the anode to form tantalum chloride (TaCl3). And, chlorine contaminated tantalum oxide has a higher leakage current and lower capacitance than a tantalum oxide coated component which is not so contaminated. Higher leakage currents and lower capacitance result in longer charge times and lower charge/discharge efficiency, and for that reason is undesirable, especially when the electrical energy storage device is a capacitor.
- The present invention describes the deposition of a ruthenium oxide compound or a ruthenium-containing oxide compound, or a precursor thereof, onto a conductive substrate. The reagent solution is substantially devoid of halides to prevent contamination of the counter electrode when the coated substrate is used as an electrode in an electrical energy storage device, such as a capacitor. The substrate is preferably heated during the deposition process and supports the coating as it is solidified or, in the case of a precursor, converted to a solidified product compound.
- These and other aspects of the present invention will become more apparent to those skilled in the art by reference to the following description and the appended drawings.
- FIG. 1 is a schematic of a unipolar electrode configuration for use in an electrochemical capacitor.
- FIG. 2 is a schematic of a bipolar electrode configuration for use in an electrochemical capacitor.
- FIG. 3 is a schematic of a hybrid capacitor according to the present invention.
- FIG. 4 is a schematic of a spirally wound configuration for use in an electrochemical capacitor.
- The first step in the process includes providing a solution of reagents. The reagent solution preferably contains ions in substantially the ratio needed to form the desired coating. These ions are preferably available in solution in water-soluble form such as in water-soluble salts of nitrates, acetates, and sulfates. However, salts including nitrates, acetates and sulfates that are soluble in other solvents such as organic and inorganic solvents may be used.
- The substrate preferably consists of a conductive metal such as titanium, molybdenum, tantalum, niobium, cobalt, nickel, stainless steel, tungsten, platinum, palladium, gold, silver, copper, chromium, vanadium, aluminum, zirconium, hafnium, zinc and iron, and the like, and mixtures and alloys thereof.
- Regardless of the material of substrate, ruthenium-containing oxide coatings rely mostly upon mechanical bonding to the substrate surface. It is, therefore, critical that the substrate surface to be coated is properly prepared to ensure coating quality. For one, substrate surface cleanliness is very important in all coating systems, especially in ultrasonically deposited spray coatings. In that respect, it is required that the substrate surface remain uncontaminated by lubricants from handling equipment or body oils from hands and the like. Substrate cleaning includes chemical means such as conventional degreasing treatments using aqueous and non-aqueous solutions, as are well known to those skilled in the art. Plasma cleaning is also contemplated by the scope of the present invention.
- It is further contemplated by the scope of the present invention that, if desired, the electrical conductivity of the substrate is improved prior to coating. Metal and metal alloys have a native oxide present on their surface. This is a resistive layer and hence, if the material is to be used as a substrate for a capacitor electrode, the oxide is preferably removed or made electrically conductive prior to deposition of a pseudocapacitive coating thereon. In order to improve the electrical conductivity of the substrate, various techniques can be employed. One is shown and described in U.S. Pat. No. 5,098,485 to Evans, the disclosure of which is hereby incorporated by reference. A preferred method for improving the conductivity of the substrate includes depositing a minor amount of a metal or metals from Groups IA, IVA and VIIIA of the Periodic Table of Elements onto the substrate. Aluminum, manganese, nickel and copper are also suitable for this purpose. The deposited metal is then “intermixed” with the substrate material by, for example, a high-energy ion beam or a laser beam directed towards the deposited surface. These substrate-treating processes are performed at relatively low temperatures to prevent substrate degradation and deformation. Additionally, these treating processes can be used to passivate the substrate from further chemical reaction while still providing adequate electrical conductivity. For additional disclosure regarding improving the electrical conductivity of the substrate prior to deposition, reference is made to U.S. patent application Ser. No. 08/847,946 entitled “Method of Improving Electrical Conductivity of Metals, Metal Alloys and Metal Oxides”, which is assigned to the present invention and incorporated herein by reference.
- Surface roughness is another critical factor to consider when properly applying a ruthenium-containing oxide coating. The substrate may be roughened by chemical means, for example, by contacting the substrate with hydrofluoric acid and/or hydrochloric acid containing ammonium bromide and methanol and the like, by plasma etching, and by mechanical means such as scraping, machining, wire brushing, rough threading, grit blasting, a combination of rough threading then grit blasting and abrading such as by contacting the substrate with Scotch-Brite™ abrasive sheets manufactured by 3M.
- The reagent solution preferably contains ions in substantially the stoichiometric ratio needed to form the desired coating. The ions are present in the reagent solution as either a water-soluble salt or as one that is soluble in organic and inorganic solvents such as isopropyl alcohol and nitric acid, and mixtures thereof. A preferred reagent precursor for a ruthenium oxide coating is a ruthenium nitrate, ruthenium acetate, or ruthenium sulfate, or an organic salt. In that respect, suitable precursors include the water-soluble salts of ruthenium(III) nitrosyl nitrate, nitrosyl ruthenium(III) acetate, and nitrosyl ruthenium(III) sulfate. Alcohol soluble salts include nitrosyl ruthenium(III) acetate, nitrosyl ruthenium(III) sulfate and ruthenium(III) 2,4-pentanedionate. Ruthenium oxide can be coated on the substrate without having to go through the precursor step.
- The porous coating may also include a second or more metals. The second metal is in the form of an oxide, a nitrate, acetate or a sulfate, and is not essential to the intended use of the coated foil as a capacitor electrode, and the like. The second metal is selected from one or more of the group consisting of tantalum, titanium, nickel, iridium, platinum, palladium, gold, silver, cobalt, molybdenum, manganese, tungsten, iron, zirconium, hafnium, rhodium, vanadium, osmium and niobium. In a preferred embodiment of the invention, the porous coating product includes oxides of ruthenium and tantalum.
- The reagent solution is preferably at a concentration of from about 0.01 to about 1,000 grams of the reagent compounds per liter of the reagent solution. In one embodiment of the present invention, it is preferred that the reagent solution has a concentration of from about 1 to about 300 grams per liter and, more preferably, from about 5 to about 60 grams per liter.
- Suitable methods for contacting the substrate with the reagent solution include dipping, painting, doctor-blading, pressurized air atomization spraying, or aerosolized spraying of the material onto the substrate. Sol-gel deposition is another suitable coating method. For additional disclosure regarding the deposition of a ruthenium-containing material on a substrate as an aerosolize spray, reference is made to U.S. Pat. Nos. 5,894,403 to Shah et al., 5,920,455 to Shah et al., 6,224,985 to Shah et al., and 6,468,605 to Shah et al., all of which are assigned to the assignee of the present invention and incorporated herein by reference.
- In one embodiment of the present invention, regardless of the deposition process the substrate is heated at a temperature sufficient to instantaneously evaporate or otherwise drive off the solvent from the deposited ruthenium-containing reagent solution. The coated substrate is subsequently heated to convert the precursor to the desired ruthenium oxide. Thus, as the substrate is being coated, it is heated to a temperature sufficient to drive off or otherwise evaporate the solvent material. Preferably the solvent is evaporated from the substrate almost instantaneously with contact of the reagent solution, resulting in the deposition of a relatively thin film oxide coating. In the case of the solvent consisting of a nonaqueous solution, for example, isopropyl alcohol and nitric acid, the substrate is preferably heated to a temperature of from about 70° C. to about 95° C., preferably about 85° C. This temperature is considered sufficient to instantaneously evaporate the solvent from the deposited reagent mixture. In the case of an aqueous solution, the substrate is heated to a temperature of from about 100° C. to about 300° C. to instantaneously evaporate the water from the deposited reagent mixture.
- The reagent material is then heated to a temperature sufficient to convert the deposited precursor to a highly porous, high surface area ruthenium-containing oxide. For oxides, typical heating times range from about one-half hour to about six hours. More preferably, after spraying and solvent removal, the oxide precursor coated substrate is heated to a temperature of about 100° C. to 300° C., preferably about 250° C. for about one hour, followed by a further heating at a temperature of about 250° C. to 400° C., preferably about 300° C. for about two hours. A further heating at a temperature of about 100° C. to about 500° C., preferably about 400° C. for about two hours and fifteen minutes immediately follows this. While this three step heating protocol is preferred for converting the above described precursors to a ruthenium oxide, it is contemplated by the scope of the present invention that a two step or a four step or more heating protocol can also be used. Alternatively, the temperature is slowly and steadily ramped up, for example, at about 1° C./minute, preferably about 6° C./min. until the temperature reaches about 400° C. where it is maintained for a time sufficient to convert the precursor to its final product material.
- In another embodiment, the substrate is maintained at a temperature sufficient to, for all intents and purposes, instantaneously convert the precursor to a porous, high surface area ruthenium-containing oxide coating on the substrate. More particularly, as the precursor reagent solution is deposited onto the substrate, the substrate is at a temperature of about 100° C. to about 500° C., preferably at least about 200° C., and more preferably about 350° C. to instantaneously convert the precursor to the oxide coating.
- After deposition and conversion of the precursor to the ruthenium-containing oxide compound, whether it is instantaneous or otherwise, the substrate is ramped down or cooled to ambient temperature, maintained at the heated deposition temperature to enhanced bonding strength, or varied according to a specific profile. In general, it is preferred to conduct the heating steps while contacting the substrate with air or an oxygen-containing gas.
- It is preferred that the resulting ruthenium-containing oxide coating have a thickness of from about a hundred Angstroms to about 0.1 millimeters or more. The porous coating has an internal surface area of about 10 m 2/gram to about 1,500 m2/gram. In general, the thickness of the substrate is typically in the range of about 0.001 millimeters to about 2 millimeter and preferably about 0.1 millimeters. The thickness of the coating on the substrate is determined by means well known to those skilled in the art. Also, the temperature of the substrate affects the crystal structure and coating adhesion strength. Higher heating temperatures result in increased intermingling of the deposited reagent materials with the surface ions of the substrate, thereby affecting bonding strength.
- An ultrasonically coated substrate according to the present invention is useful as an electrode in various types of electrochemical capacitors including unipolar and bipolar designs, and capacitors having a spirally wound configuration. For example, in FIG. 1 there is shown a schematic representation of a typical unipolar
electrochemical capacitor 10 having spaced apart 12 and 14. One of the electrodes, for example,electrodes electrode 12, serves as the cathode electrode and comprises acoating 16A of a ruthenium-containing oxide material provided on aconductive plate 18A according to the present invention. For example, a porous ruthenium oxide film is provided on atantalum plate 18A. The relative thicknesses of theplate 18A and thecoating 16A thereon are distorted for illustrative purposes. As previously described, the plate is about 0.01 millimeters to about 1 millimeter in thickness and the ruthenium-containingoxide coating 16A is in the range of about a few hundred Angstroms to about 0.1 millimeters thick. Theother electrode 14 serves as the anode and is of a ruthenium-containingoxide material 16B contacted to aconductive substrate 18B, as inelectrode 12. - An ion
permeable membrane 20 serving as a separator separates thecathode electrode 12 and theanode electrode 14 from each other. The 12 and 14 are maintained in the spaced apart relationship shown by opposed insulatingelectrodes 22 and 24 such as of an elastomeric material contacting end portions of themembers 18A, 18B. The end plate portions typically are not coated with a ruthenium-containing oxide material. An electrolyte (not shown), which may be any of the conventional electrolytes used in electrolytic capacitors, such as a solution of sulfuric acid, potassium hydroxide, or an ammonium salt, is provided between and in contact with the cathode andplates 12 and 14. Leads (not shown) are attached to theanode electrodes 12 and 14 before, during, or after assembly of the capacitor. The thusly-constructed unipolar capacitor configuration is housed in a suitable casing (not shown), or the conductive plates along with the insulating members can serve as the capacitor housing.electrodes - FIG. 2 is a schematic representation of a typical bipolar
electrochemical capacitor 30 comprising a plurality ofcapacitor units 32 arranged and interconnected serially. Eachunit 32 includes a bipolarconductive substrate 34 having ruthenium-containing 36 and 38 provided on its opposite sides. Again, the thickness of theoxide coatings 36 and 38 is distorted for illustrative purposes. Theporous coatings units 32 are then assembled into the bipolar capacitor configuration on opposite sides of anintermediate separator 40. 42 and 44 are provided to maintain theElastomeric insulating members units 32 in their spaced apart relationship. As shown in the dashed lines, a plurality of individualelectrochemical capacitor units 32 is interconnected in series to provide the bipolar configuration. The serial arrangement ofunits 32 is completed at the terminal ends thereof by end plates (not shown), as is well known to those skilled in the art. Anelectrolyte 44 is provided between and in contact with the 36, 38 of thecoatings capacitor 30. - FIG. 3 shows a schematic representation of an
electrolytic capacitor 50 having spaced apart 52, 54, each comprising a ruthenium-containingcathode electrodes 52A, 54A provided on aoxide coating 52B, 54B according to the present invention. The counter electrode orconductive plate anode 56 is intermediate the 52, 54 withcathodes 58, 60 preventing contact between the electrodes. Theseparators anode 56 is of a conventional sintered metal, preferably in a porous form. Suitable anode metals are selected from the group consisting of titanium, aluminum, niobium, zirconium, hafnium, tungsten, molybdenum, vanadium, silicon, germanium and tantalum contacted to aterminal pin 62. Insulating 64, 66 contacting end portions of the cathode plates, complete themembers hybrid capacitor 50. While not shown, an electrolyte is provided to activate the 52, 54 and 56.electrodes - FIG. 4 is a schematic drawing of another embodiment of a jellyroll-configured
capacitor 70, which can be manufactured by any one of the processes according to the present invention.Capacitor 70 has a plurality ofcapacitor units 72, each comprising a conductive substrate provided with a ruthenium-containing 74, 76 on the opposed sides thereof. The coatings are separated from immediately adjacent cells by anoxide coating intermediate separator 78. This structure is then wound in a jellyroll fashion and housed in a suitable casing. Leads are contacted to the anode and cathode electrodes and the capacitor is activated by an electrolyte in the customary manner. - The following example describes the manner and process of coating a substrate according to the present invention, and they set forth the best mode contemplated by the inventors of carrying out the invention, but they are not to be construed as limiting.
- A precursor solution was prepared by dissolving 2.72 grams of ruthenium nitrosyl nitrate in a solvent that consisted of 100 cc of deionized water. If needed, a minor amount, i.e. about 5 cc of nitric acid is used to completely solubilize the precursor. The solution was stirred until the ruthenium nitrosyl nitrate was completely dissolved.
- A tantalum foil, 0.002″ thick, which was cleaned with appropriate cleaning solutions and mounted on the temperature controlled substrate holder, served as the substrate. The foil was heated to a temperature of 350° C. As the reagent solution was deposited on the heated substrate, the solvent evaporated and a ruthenium nitrosyl nitrate film was created on the surface of the foil. The foil temperature of 350° C. was sufficient to convert the ruthenium nitrosyl nitrate to ruthenium oxide substantially instantaneously as the deposition occurred. On completion of the deposition process, the film was allowed to remain on the heater block for half an hour in order to ensure that the entire nitrate had converted to the oxide.
- It is appreciated that various modifications to the inventive concepts described herein may be apparent to those skilled in the art without departing from the spirit and the scope of the present invention defined by the hereinafter appended claims.
Claims (20)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/277,533 US20030070920A1 (en) | 1997-05-01 | 2002-10-22 | Electrode for use in a capacitor |
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/847,219 US5920455A (en) | 1997-05-01 | 1997-05-01 | One step ultrasonically coated substrate for use in a capacitor |
| US09/304,706 US6224985B1 (en) | 1997-05-01 | 1999-05-04 | One step ultrasonically coated substrate for use in a capacitor |
| US09/808,582 US6468605B2 (en) | 1997-05-01 | 2001-03-14 | Method for providing a one step ultrasonically coated substrate |
| US10/277,533 US20030070920A1 (en) | 1997-05-01 | 2002-10-22 | Electrode for use in a capacitor |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US09/808,582 Continuation-In-Part US6468605B2 (en) | 1997-05-01 | 2001-03-14 | Method for providing a one step ultrasonically coated substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US20030070920A1 true US20030070920A1 (en) | 2003-04-17 |
Family
ID=27405046
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US10/277,533 Abandoned US20030070920A1 (en) | 1997-05-01 | 2002-10-22 | Electrode for use in a capacitor |
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| Country | Link |
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| US (1) | US20030070920A1 (en) |
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| US20060154416A1 (en) * | 2003-08-18 | 2006-07-13 | Seitz Keith W | Method of pad printing in the manufacture of capacitors |
| US20060290589A1 (en) * | 2005-06-24 | 2006-12-28 | Enxnet, Inc. | Passive Resonant Reflector |
| US20080007894A1 (en) * | 2003-08-18 | 2008-01-10 | Greatbatch Ltd. | Poly (Alkylene) Carbonates As Binders In The Manufacture Of Valve Metal Anodes For Electrolytic Capacitors |
| US20080013257A1 (en) * | 2004-08-18 | 2008-01-17 | Greatbatch Ltd. | Poly(Alkylene) Carbonates As Binders In The Manufacture Of Valve Metal Anodes For Electrolytic Capacitors |
| EP1508907A3 (en) * | 2003-08-18 | 2009-04-29 | Greatbatch Ltd. | Pad printing method for a capacitor electrode |
| US20100302713A1 (en) * | 2009-05-29 | 2010-12-02 | Avx Corporation | Refractory Metal Paste for Solid Electrolytic Capacitors |
| US20100302712A1 (en) * | 2009-05-29 | 2010-12-02 | Avx Corporation | Solid Electrolytic Capacitor with Facedown Terminations |
| US20100302710A1 (en) * | 2009-05-29 | 2010-12-02 | Avx Corporation | Anode for an Electrolytic Capacitor that Contains Individual Components Connected by a Refractory Metal Paste |
| US8385052B2 (en) | 2008-12-10 | 2013-02-26 | Avx Corporation | Electrochemical capacitor containing ruthenium oxide electrodes |
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