US20020005579A1 - Semiconductor apparatus and frame used for fabricating the same - Google Patents
Semiconductor apparatus and frame used for fabricating the same Download PDFInfo
- Publication number
- US20020005579A1 US20020005579A1 US09/276,118 US27611899A US2002005579A1 US 20020005579 A1 US20020005579 A1 US 20020005579A1 US 27611899 A US27611899 A US 27611899A US 2002005579 A1 US2002005579 A1 US 2002005579A1
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- Prior art keywords
- semiconductor chip
- heat
- radiation member
- semiconductor
- semiconductor apparatus
- Prior art date
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Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 121
- 238000009413 insulation Methods 0.000 claims abstract description 23
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 5
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 239000010949 copper Substances 0.000 claims description 5
- 230000005855 radiation Effects 0.000 claims description 3
- 239000000853 adhesive Substances 0.000 claims 4
- 230000001070 adhesive effect Effects 0.000 claims 4
- 239000010410 layer Substances 0.000 description 25
- 239000011347 resin Substances 0.000 description 17
- 229920005989 resin Polymers 0.000 description 17
- 238000000465 moulding Methods 0.000 description 15
- 238000000034 method Methods 0.000 description 13
- 239000000758 substrate Substances 0.000 description 12
- 230000008569 process Effects 0.000 description 10
- 239000012790 adhesive layer Substances 0.000 description 4
- 238000013021 overheating Methods 0.000 description 4
- 239000004020 conductor Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 238000004382 potting Methods 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1531—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
- H01L2924/15311—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
Definitions
- the present invention relates to a semiconductor apparatus, and more particularly to a heat-radiating mechanism for a semiconductor package.
- a conventional semiconductor apparatus is described in Japanese Patent Laying Open Kokai No. H6-78574.
- the conventional semiconductor apparatus includes a package substrate, a semiconductor chip mounted on a surface of the package substrate, an elastic layer and a wiring pattern.
- the elastic layer is made of insulating material and is formed to surround the semiconductor chip.
- a film including the wiring pattern and a base film is formed on the semiconductor chip and the elastic layer.
- the wiring pattern includes leads connected at one ends to the semiconductor chip and at the other ends to outer terminals, which are provided on the elastic layer.
- the semiconductor chip is provided in an opening of the elastic layer, and is molded with resin by potting process.
- the semiconductor chip is arranged between the package substrate and the molding resin, so that heat generated in the semiconductor chip is not radiated enough. As a result, the semiconductor chip is over heated, and therefore, performance and reliability of the semiconductor chip may be deteriorated.
- an object of the present invention is to provide a semiconductor apparatus in which a semiconductor chip is prevented from over heating.
- Another object of the present invention is to provide a frame, used for fabricating a semiconductor apparatus, in which a semiconductor chip is prevented from over heating.
- a semiconductor apparatus includes an insulation tape which is provided with a device hole therein; and a semiconductor chip which is mounted in the device hole of the insulation tape and is provided at a first surface with electrode pads.
- the semiconductor apparatus also includes a wiring pattern which comprises leads connected at one ends to the electrode pads; and a heat-radiation member which is provided on the first surface of the semiconductor chip so that heat generated in the semiconductor chip is radiated outwardly via the heat-radiation member.
- a frame includes an insulation tape which is provided with a device hole, in which a semiconductor chip is mounted; and a wiring pattern which includes leads connected at one ends to electrode pads, provided on a first surface of the semiconductor chip.
- the frame also includes a heat-radiation member which is provided on the first surface of the semiconductor chip so that heat generated in the semiconductor chip is outwardly radiated via the heat-radiation member.
- FIG. 1A is a plane view illustrating a conventional semiconductor apparatus in a condition before a resin molding process.
- FIG. 1B is a cross-sectional view illustrating the conventional semiconductor apparatus, shown in FIG. 1A, in a condition after the resin molding process.
- FIG. 2A is a plane view illustrating a semiconductor apparatus, according to a first preferred embodiment of the present invention, in a condition before a resin molding process.
- FIG. 2B is a cross-sectional view illustrating the semiconductor apparatus, shown in FIG. 2A, in a condition after the resin molding process.
- FIG. 3 is a cross-sectional view illustrating a semiconductor apparatus, according to a second preferred embodiment of the present invention.
- FIG. 4A is a plane view illustrating a semiconductor apparatus, according to a third preferred embodiment of the present invention, in a condition before a resin molding process.
- FIG. 4B is a cross-sectional view illustrating the semiconductor apparatus, shown in FIG. 4A, in a condition after the resin molding.
- FIG. 5A is a plane view illustrating a semiconductor apparatus, according to a fourth preferred embodiment of the present invention, in a condition before a resin molding process.
- FIG. 5B is a cross-sectional view illustrating the semiconductor apparatus, shown in FIG. 5A, in a condition after the resin molding process.
- FIG. 6 is a plane view illustrating a semiconductor apparatus according to a fifth preferred embodiment of the present invention.
- FIGS. 1A and 1B depict a conventional semiconductor apparatus in conditions before and after resin molding process, respectively.
- Such a conventional semiconductor apparatus is described in Japanese Patent Laying Open Kokai No. H6-78574.
- the conventional semiconductor apparatus includes a package substrate 21 , a semiconductor chip 22 , an elastic layer 23 and a wiring pattern 25 .
- the semiconductor chip 22 is mounted on a surface of the package substrate 21 .
- the elastic layer 23 is made of insulating material and is formed to surround the semiconductor chip 22 .
- a film, including the wiring pattern and a base film 26 is formed on the semiconductor chip 22 and the elastic layer 23 .
- the wiring pattern 25 includes leads connected at one ends to connecting portions of the semiconductor chip 22 and at the other ends to outer terminals 24 , which are provided on the elastic layer 23 .
- the base film 26 is shaped to be square to cover the elastic layer 23 .
- the semiconductor chip 22 provided in an opening of the elastic layer 23 is molded with resin 27 using a potting equipment.
- the semiconductor chip 22 is arranged between the package substrate 21 and the molding resin 27 , so that heat generated in the semiconductor chip is not radiated enough. As a result, the semiconductor chip 22 is over heated, and therefore, performance and reliability of the semiconductor chip 22 may be deteriorated.
- a semiconductor chip generates much heat at a surface on which electrodes are formed. According to the above mentioned conventional semiconductor apparatus, the surface is covered with the molding resin 27 , therefore heat can not be radiated well. On the other hand, heat generated in the semiconductor chip 22 can be radiated through itself, however, enough heat can not be transferred to the substrate 21 .
- FIGS. 2A and 2B show a TCP (Tape Carrier Package) type of semiconductor apparatus, according to a first preferred embodiment of the present invention.
- TCP means a package fabricated using TAB (Tape Automated Bonding) technology, including a T-BGA (Tape Ball Grid Allay). That is, the invention is applicable to semiconductor apparatus fabricated using BGA (Ball Grid Allay) technique.
- An insulation tape 101 is made of material having electrical insulation characteristic, such as polyimide, and is shaped to be square.
- the insulation tape 101 is provided with a device hole 104 in which a semiconductor chip 103 is mounted.
- the insulation tape 101 is provided at a surface with a wiring pattern 102 made of conductive material, such as copper.
- the wiring pattern 102 includes leads extending perpendicular to each side of the device hole 104 . One ends of the leads are connected via bumps 106 to electrode pads of the semiconductor chip 103 , and the other ends are connected to outer terminals 110 .
- a heat-radiation pattern 105 is provided on a surface 103 a of the semiconductor chip 103 where the electrode pads are arranged on.
- the heat-radiation pattern 105 is shaped to be square and is in contact with the surface 103 a with an adhesive layer 107 .
- the heat-radiation pattern 105 is provided at each corner with a support member 106 a , which extend outwardly. Each support member 105 a is connected to the insulation tape 101 .
- the insulation tape 101 , the wiring pattern 102 and the heat-radiation pattern 105 form a frame.
- the wiring pattern 102 and the heat-radiation pattern 105 are integrally made of conductive material, such as copper.
- the frame is used for TAB (Tape Automated Bonding).
- TAB Tunnel Automated Bonding
- two-layer structure or three-layer structure can be used.
- the two-layer structure includes an insulation tape and a conductive layer.
- the three-layer structure includes an adhesive layer between the insulation tape and the conductive layer.
- a metal layer is formed on an insulation tape by chemical plating or sputtering technique.
- a resist layer is patterned on the metal layer by photolithography technique.
- the wiring pattern and the heat-radiation pattern of copper are formed by electrolytic plating using the resist layer as a mask.
- the room surrounding the semiconductor chip 103 in the device hole 104 is filled up with a molding resin 108 .
- the wiring pattern 102 is covered at the portions extending into the device hole 104 with the molding resin 108 .
- the heat-radiation pattern 105 is also covered with the molding resin 108 .
- An insulating layer 109 is provided at the portions of the wiring pattern 102 , connected to the insulation tape 101 .
- the insulating layer 109 is not provided at the portions where the outer terminals 110 are connected.
- the outer terminals 110 are connected to a wiring pattern of a substrate, not shown.
- Outer circuitry on the substrate are connected to the inner circuitry of the semiconductor chip 103 via the outer terminals 110 , the wiring pattern 102 and the bumps 106 .
- the semiconductor chip 103 is exposed at the other (upper) surface, so that heat generated in the semiconductor chip 103 is directly radiated from the upper surface, as shown in FIG. 2B. Heat generated in the semiconductor chip 103 is radiated through the heat-radiation pattern 105 to the air and to the substrate. Consequently, heat of the semiconductor chip 103 is well radiated to outside, and therefore over heating of the semiconductor chip can be prevented.
- FIG. 3 shows a semiconductor apparatus according to a second preferred embodiment of the present invention.
- the same or corresponding components to the first preferred embodiment shown in FIGS. 2A and 2B are represented by the same reference numerals; and the same description is not repeated to avoid redundant explanation.
- outer terminals 111 are connected to a heat-radiation pattern 105 .
- the heat-radiation pattern 105 is covered at the bottom surface with an insulation layer 109 except for the region where the outer terminals 111 are provided.
- the outer terminals 111 are connected to a substrate (not shown) in the same manner as outer terminals 110 .
- Heat generated in a semiconductor chip 103 is transferred through the heat-radiation pattern 105 and the outer terminals 111 to the substrate.
- the heat radiation rate of the semiconductor chip 103 is greater than the first preferred embodiment, shown in FIGS. 2A and 2B.
- FIGS. 4A and 4B show a semiconductor apparatus according to a third preferred embodiment of the present invention.
- the same or corresponding components to the first and second preferred embodiments, shown in FIGS. 2A, 2B and 3 are represented by the same reference numerals; and the same description is not repeated to avoid redundant explanation.
- a heat-radiation pattern 105 is provided with round openings 105 b, through which a gas generated from an adhesive layer 107 travels outwardly.
- the gas is radiated out of the heat-radiation pattern 105 .
- undesirable force is not applied between the semiconductor chip 103 and the heat-radiation pattern 105 , and therefore, those elements are prevented from being broken.
- FIGS. 5A and 5B show a semiconductor apparatus according to a fourth preferred embodiment of the present invention.
- FIGS. 6A and 5B the same or corresponding components to the first to third preferred embodiments, shown in FIGS. 2A, 2B, 3 , 4 A and 4 B are represented by the same reference numerals; and the same description is not repeated to avoid redundant explanation.
- a heat-radiation pattern 105 includes a radiating portion 105 c and connecting portions 105 d.
- the radiating portion 105 c is designed to be in contact with the center of a surface 103 a of the semiconductor chip 103 .
- the connecting portions 105 d extend from the radiating portion 105 c outwardly in the same manner as leads of the wiring pattern 102 .
- the connecting portions 105 d are electrically connected at one ends to electrode pads of the semiconductor chip 103 via bumps 106 .
- the electrodes of the semiconductor chip 103 connected to the connecting portions 105 d are supply electrodes or ground electrodes, which do not change in voltage. If the connecting portions 105 d are connected to supply electrodes or ground electrodes of the semiconductor chip 103 , the heat-radiation pattern 105 can be used as a common plane, so that the voltage level can be stable. And therefore, margin to outer noise can be increased.
- FIG. 6 shows a semiconductor apparatus according to a fifth preferred embodiment of the present invention.
- the same or corresponding components to the first to fourth preferred embodiments, shown in FIGS. 2A, 2B, 3 , 4 A, 4 B, 5 A and 5 B are represented by the same reference numerals; and the same description is not repeated to avoid redundant explanation.
- a heat-radiation pattern 105 includes a radiating portion 105 c and connecting portions 105 d .
- Each pair of the connecting portions 105 d are arranged at the both sides of a micro-stream line (high-speed signal line) 102 a in the leads 102 .
- the connecting portions 105 d are connected to supply electrodes or ground electrodes, so that the connecting portions 105 d function as a barrier which prevents cross-influence between the adjacent two signal lines.
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Wire Bonding (AREA)
- Lead Frames For Integrated Circuits (AREA)
Abstract
Description
- This application claims the priority of Application No. H10-232127, filed Aug. 18, 1998 in Japan, the subject matter of which is incorporated herein by reference.
- The present invention relates to a semiconductor apparatus, and more particularly to a heat-radiating mechanism for a semiconductor package.
- A conventional semiconductor apparatus is described in Japanese Patent Laying Open Kokai No. H6-78574. The conventional semiconductor apparatus includes a package substrate, a semiconductor chip mounted on a surface of the package substrate, an elastic layer and a wiring pattern. The elastic layer is made of insulating material and is formed to surround the semiconductor chip. A film including the wiring pattern and a base film is formed on the semiconductor chip and the elastic layer. The wiring pattern includes leads connected at one ends to the semiconductor chip and at the other ends to outer terminals, which are provided on the elastic layer. The semiconductor chip is provided in an opening of the elastic layer, and is molded with resin by potting process.
- In the above described conventional semiconductor apparatus, the semiconductor chip is arranged between the package substrate and the molding resin, so that heat generated in the semiconductor chip is not radiated enough. As a result, the semiconductor chip is over heated, and therefore, performance and reliability of the semiconductor chip may be deteriorated.
- Accordingly, an object of the present invention is to provide a semiconductor apparatus in which a semiconductor chip is prevented from over heating.
- Another object of the present invention is to provide a frame, used for fabricating a semiconductor apparatus, in which a semiconductor chip is prevented from over heating.
- Additional objects, advantages and novel features of the present invention will be set forth in part in the description that follows, and in part will become apparent to those skilled in the art upon examination of the following or may be learned by practice of the invention. The objects and advantages of the invention may be realized and attained by means of the instrumentalities and combinations particularly pointed out in the appended claims.
- According to a first aspect of the present invention, a semiconductor apparatus includes an insulation tape which is provided with a device hole therein; and a semiconductor chip which is mounted in the device hole of the insulation tape and is provided at a first surface with electrode pads. The semiconductor apparatus also includes a wiring pattern which comprises leads connected at one ends to the electrode pads; and a heat-radiation member which is provided on the first surface of the semiconductor chip so that heat generated in the semiconductor chip is radiated outwardly via the heat-radiation member.
- According to a second aspect of the present invention, a frame includes an insulation tape which is provided with a device hole, in which a semiconductor chip is mounted; and a wiring pattern which includes leads connected at one ends to electrode pads, provided on a first surface of the semiconductor chip. The frame also includes a heat-radiation member which is provided on the first surface of the semiconductor chip so that heat generated in the semiconductor chip is outwardly radiated via the heat-radiation member.
- As described above, according to the present invention, heat generated in the semiconductor chip is radiated through the heat-radiation member. As a result, the heat-radiation rate of the semiconductor chip is increased, and therefore, the semiconductor chip is prevented from over heating.
- FIG. 1A is a plane view illustrating a conventional semiconductor apparatus in a condition before a resin molding process.
- FIG. 1B is a cross-sectional view illustrating the conventional semiconductor apparatus, shown in FIG. 1A, in a condition after the resin molding process.
- FIG. 2A is a plane view illustrating a semiconductor apparatus, according to a first preferred embodiment of the present invention, in a condition before a resin molding process.
- FIG. 2B is a cross-sectional view illustrating the semiconductor apparatus, shown in FIG. 2A, in a condition after the resin molding process.
- FIG. 3 is a cross-sectional view illustrating a semiconductor apparatus, according to a second preferred embodiment of the present invention.
- FIG. 4A is a plane view illustrating a semiconductor apparatus, according to a third preferred embodiment of the present invention, in a condition before a resin molding process.
- FIG. 4B is a cross-sectional view illustrating the semiconductor apparatus, shown in FIG. 4A, in a condition after the resin molding.
- FIG. 5A is a plane view illustrating a semiconductor apparatus, according to a fourth preferred embodiment of the present invention, in a condition before a resin molding process.
- FIG. 5B is a cross-sectional view illustrating the semiconductor apparatus, shown in FIG. 5A, in a condition after the resin molding process.
- FIG. 6 is a plane view illustrating a semiconductor apparatus according to a fifth preferred embodiment of the present invention.
- For better understanding of the present invention, a conventional technology is first described. FIGS. 1A and 1B depict a conventional semiconductor apparatus in conditions before and after resin molding process, respectively. Such a conventional semiconductor apparatus is described in Japanese Patent Laying Open Kokai No. H6-78574.
- The conventional semiconductor apparatus includes a
package substrate 21, asemiconductor chip 22, anelastic layer 23 and awiring pattern 25. Thesemiconductor chip 22 is mounted on a surface of thepackage substrate 21. Theelastic layer 23 is made of insulating material and is formed to surround thesemiconductor chip 22. A film, including the wiring pattern and abase film 26, is formed on thesemiconductor chip 22 and theelastic layer 23. Thewiring pattern 25 includes leads connected at one ends to connecting portions of thesemiconductor chip 22 and at the other ends toouter terminals 24, which are provided on theelastic layer 23. Thebase film 26 is shaped to be square to cover theelastic layer 23. Thesemiconductor chip 22 provided in an opening of theelastic layer 23 is molded withresin 27 using a potting equipment. - In the above described conventional semiconductor apparatus, the
semiconductor chip 22 is arranged between thepackage substrate 21 and themolding resin 27, so that heat generated in the semiconductor chip is not radiated enough. As a result, thesemiconductor chip 22 is over heated, and therefore, performance and reliability of thesemiconductor chip 22 may be deteriorated. In general, a semiconductor chip generates much heat at a surface on which electrodes are formed. According to the above mentioned conventional semiconductor apparatus, the surface is covered with themolding resin 27, therefore heat can not be radiated well. On the other hand, heat generated in thesemiconductor chip 22 can be radiated through itself, however, enough heat can not be transferred to thesubstrate 21. - FIGS. 2A and 2B show a TCP (Tape Carrier Package) type of semiconductor apparatus, according to a first preferred embodiment of the present invention. In this application, TCP means a package fabricated using TAB (Tape Automated Bonding) technology, including a T-BGA (Tape Ball Grid Allay). That is, the invention is applicable to semiconductor apparatus fabricated using BGA (Ball Grid Allay) technique.
- An
insulation tape 101 is made of material having electrical insulation characteristic, such as polyimide, and is shaped to be square. Theinsulation tape 101 is provided with adevice hole 104 in which asemiconductor chip 103 is mounted. Theinsulation tape 101 is provided at a surface with awiring pattern 102 made of conductive material, such as copper. - The
wiring pattern 102 includes leads extending perpendicular to each side of thedevice hole 104. One ends of the leads are connected viabumps 106 to electrode pads of thesemiconductor chip 103, and the other ends are connected toouter terminals 110. - A heat-
radiation pattern 105 is provided on asurface 103 a of thesemiconductor chip 103 where the electrode pads are arranged on. The heat-radiation pattern 105 is shaped to be square and is in contact with thesurface 103 a with anadhesive layer 107. The heat-radiation pattern 105 is provided at each corner with a support member 106 a, which extend outwardly. Eachsupport member 105 a is connected to theinsulation tape 101. - The
insulation tape 101, thewiring pattern 102 and the heat-radiation pattern 105 form a frame. Thewiring pattern 102 and the heat-radiation pattern 105 are integrally made of conductive material, such as copper. The frame is used for TAB (Tape Automated Bonding). For fabricating the frame, two-layer structure or three-layer structure can be used. The two-layer structure includes an insulation tape and a conductive layer. The three-layer structure includes an adhesive layer between the insulation tape and the conductive layer. - When the two-layer structure is applied to the first preferred embodiment of the present invention, a metal layer is formed on an insulation tape by chemical plating or sputtering technique. Next, a resist layer is patterned on the metal layer by photolithography technique. Then, the wiring pattern and the heat-radiation pattern of copper are formed by electrolytic plating using the resist layer as a mask.
- The room surrounding the
semiconductor chip 103 in thedevice hole 104 is filled up with amolding resin 108. Thewiring pattern 102 is covered at the portions extending into thedevice hole 104 with themolding resin 108. The heat-radiation pattern 105 is also covered with themolding resin 108. An insulatinglayer 109 is provided at the portions of thewiring pattern 102, connected to theinsulation tape 101. The insulatinglayer 109 is not provided at the portions where theouter terminals 110 are connected. - In the above described semiconductor apparatus according to the first preferred embodiment of the present invention, when fabrication, the
outer terminals 110 are connected to a wiring pattern of a substrate, not shown. Outer circuitry on the substrate are connected to the inner circuitry of thesemiconductor chip 103 via theouter terminals 110, thewiring pattern 102 and thebumps 106. - The
semiconductor chip 103 is exposed at the other (upper) surface, so that heat generated in thesemiconductor chip 103 is directly radiated from the upper surface, as shown in FIG. 2B. Heat generated in thesemiconductor chip 103 is radiated through the heat-radiation pattern 105 to the air and to the substrate. Consequently, heat of thesemiconductor chip 103 is well radiated to outside, and therefore over heating of the semiconductor chip can be prevented. - FIG. 3 shows a semiconductor apparatus according to a second preferred embodiment of the present invention. In FIG. 3, the same or corresponding components to the first preferred embodiment shown in FIGS. 2A and 2B are represented by the same reference numerals; and the same description is not repeated to avoid redundant explanation.
- In the semiconductor apparatus according to the second preferred embodiment, shown in FIG. 3, outer terminals 111 are connected to a heat-
radiation pattern 105. The heat-radiation pattern 105 is covered at the bottom surface with aninsulation layer 109 except for the region where the outer terminals 111 are provided. In mounting process, the outer terminals 111 are connected to a substrate (not shown) in the same manner asouter terminals 110. - Heat generated in a
semiconductor chip 103 is transferred through the heat-radiation pattern 105 and the outer terminals 111 to the substrate. Thus, in the second preferred embodiment, the heat radiation rate of thesemiconductor chip 103 is greater than the first preferred embodiment, shown in FIGS. 2A and 2B. - FIGS. 4A and 4B show a semiconductor apparatus according to a third preferred embodiment of the present invention. In FIGS. 4A and 4B, the same or corresponding components to the first and second preferred embodiments, shown in FIGS. 2A, 2B and 3 are represented by the same reference numerals; and the same description is not repeated to avoid redundant explanation.
- In the third preferred embodiment, shown in FIGS. 4A and 4B, a heat-
radiation pattern 105 is provided withround openings 105 b, through which a gas generated from anadhesive layer 107 travels outwardly. As a result, when moisture or water contained in theadhesive layer 107 is gasified by heat of thesemiconductor chip 103, the gas is radiated out of the heat-radiation pattern 105. Thus, undesirable force is not applied between thesemiconductor chip 103 and the heat-radiation pattern 105, and therefore, those elements are prevented from being broken. - FIGS. 5A and 5B show a semiconductor apparatus according to a fourth preferred embodiment of the present invention. In FIGS. 6A and 5B, the same or corresponding components to the first to third preferred embodiments, shown in FIGS. 2A, 2B, 3, 4A and 4B are represented by the same reference numerals; and the same description is not repeated to avoid redundant explanation.
- In the fourth preferred embodiment, shown in FIGS. 5A and 5B, a heat-
radiation pattern 105 includes a radiatingportion 105 c and connectingportions 105 d. The radiatingportion 105 c is designed to be in contact with the center of asurface 103 a of thesemiconductor chip 103. The connectingportions 105 d extend from the radiatingportion 105 c outwardly in the same manner as leads of thewiring pattern 102. - The connecting
portions 105 d are electrically connected at one ends to electrode pads of thesemiconductor chip 103 viabumps 106. Preferably, the electrodes of thesemiconductor chip 103 connected to the connectingportions 105 d are supply electrodes or ground electrodes, which do not change in voltage. If the connectingportions 105 d are connected to supply electrodes or ground electrodes of thesemiconductor chip 103, the heat-radiation pattern 105 can be used as a common plane, so that the voltage level can be stable. And therefore, margin to outer noise can be increased. - FIG. 6 shows a semiconductor apparatus according to a fifth preferred embodiment of the present invention. In FIG. 6, the same or corresponding components to the first to fourth preferred embodiments, shown in FIGS. 2A, 2B, 3, 4A, 4B, 5A and 5B are represented by the same reference numerals; and the same description is not repeated to avoid redundant explanation.
- In the fifth preferred embodiment, shown in FIG. 6, a heat-
radiation pattern 105 includes a radiatingportion 105 c and connectingportions 105 d. Each pair of the connectingportions 105 d are arranged at the both sides of a micro-stream line (high-speed signal line) 102 a in theleads 102. Preferably, the connectingportions 105 d are connected to supply electrodes or ground electrodes, so that the connectingportions 105 d function as a barrier which prevents cross-influence between the adjacent two signal lines.
Claims (20)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10-232127 | 1998-08-18 | ||
| JPH10-232127 | 1998-08-18 | ||
| JP10232127A JP2000068436A (en) | 1998-08-18 | 1998-08-18 | Semiconductor device and frame for the semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| US20020005579A1 true US20020005579A1 (en) | 2002-01-17 |
| US6437430B2 US6437430B2 (en) | 2002-08-20 |
Family
ID=16934435
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US09/276,118 Expired - Fee Related US6437430B2 (en) | 1998-08-18 | 1999-03-25 | Semiconductor apparatus and frame used for fabricating the same |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US6437430B2 (en) |
| JP (1) | JP2000068436A (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7247932B1 (en) * | 2000-05-19 | 2007-07-24 | Megica Corporation | Chip package with capacitor |
| JP4856821B2 (en) * | 2000-09-06 | 2012-01-18 | 三洋電機株式会社 | Semiconductor device |
| JP3942457B2 (en) * | 2002-02-27 | 2007-07-11 | Necエレクトロニクス株式会社 | Manufacturing method of electronic parts |
| JP4863836B2 (en) * | 2006-10-20 | 2012-01-25 | 三洋電機株式会社 | Semiconductor device |
| US8258614B2 (en) * | 2007-11-12 | 2012-09-04 | Stats Chippac Ltd. | Integrated circuit package system with package integration |
| JP5218273B2 (en) * | 2009-05-14 | 2013-06-26 | 日立電線株式会社 | Tape carrier for semiconductor device and manufacturing method thereof |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4827376A (en) * | 1987-10-05 | 1989-05-02 | Olin Corporation | Heat dissipating interconnect tape for use in tape automated bonding |
| US5414299A (en) * | 1993-09-24 | 1995-05-09 | Vlsi Technology, Inc. | Semi-conductor device interconnect package assembly for improved package performance |
| JP2531382B2 (en) * | 1994-05-26 | 1996-09-04 | 日本電気株式会社 | Ball grid array semiconductor device and manufacturing method thereof |
| JP2820645B2 (en) * | 1994-08-30 | 1998-11-05 | アナム インダストリアル カンパニー インコーポレーティド | Semiconductor lead frame |
| JPH0878574A (en) | 1994-09-08 | 1996-03-22 | Shinko Electric Ind Co Ltd | Semiconductor device and manufacturing method thereof |
| DE69523010T2 (en) * | 1994-10-04 | 2002-07-04 | Nec Corp., Tokio/Tokyo | Semiconductor package manufactured using automatic tape assembly |
| JPH08222657A (en) * | 1995-02-17 | 1996-08-30 | Hitachi Ltd | Semiconductor integrated circuit device |
-
1998
- 1998-08-18 JP JP10232127A patent/JP2000068436A/en not_active Abandoned
-
1999
- 1999-03-25 US US09/276,118 patent/US6437430B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US6437430B2 (en) | 2002-08-20 |
| JP2000068436A (en) | 2000-03-03 |
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