US20010021790A1 - Process for producing sulfonylimide compound - Google Patents
Process for producing sulfonylimide compound Download PDFInfo
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- US20010021790A1 US20010021790A1 US09/773,648 US77364801A US2001021790A1 US 20010021790 A1 US20010021790 A1 US 20010021790A1 US 77364801 A US77364801 A US 77364801A US 2001021790 A1 US2001021790 A1 US 2001021790A1
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- sulfonylimide
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- -1 sulfonylimide compound Chemical class 0.000 title claims abstract description 28
- 238000000034 method Methods 0.000 title claims abstract description 20
- 229910052700 potassium Inorganic materials 0.000 claims abstract description 18
- 229910052744 lithium Inorganic materials 0.000 claims abstract description 17
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims abstract description 13
- 229910052792 caesium Inorganic materials 0.000 claims abstract description 13
- 230000000737 periodic effect Effects 0.000 claims abstract description 13
- 229910052708 sodium Inorganic materials 0.000 claims abstract description 13
- 229910006080 SO2X Inorganic materials 0.000 claims abstract description 12
- 150000002222 fluorine compounds Chemical class 0.000 claims abstract description 12
- 229910052783 alkali metal Inorganic materials 0.000 claims abstract description 11
- 150000001340 alkali metals Chemical class 0.000 claims abstract description 11
- 150000001875 compounds Chemical class 0.000 claims abstract description 10
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 claims abstract description 10
- 150000003863 ammonium salts Chemical class 0.000 claims abstract description 9
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 4
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 4
- 125000004991 fluoroalkenyl group Chemical group 0.000 claims abstract description 4
- 125000003709 fluoroalkyl group Chemical group 0.000 claims abstract description 4
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 4
- 150000002367 halogens Chemical class 0.000 claims abstract description 4
- 229940124530 sulfonamide Drugs 0.000 claims description 7
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 claims description 6
- FDDDEECHVMSUSB-UHFFFAOYSA-N sulfanilamide Chemical compound NC1=CC=C(S(N)(=O)=O)C=C1 FDDDEECHVMSUSB-UHFFFAOYSA-N 0.000 claims description 6
- 229910006074 SO2NH2 Inorganic materials 0.000 claims description 5
- KVBCYCWRDBDGBG-UHFFFAOYSA-N azane;dihydrofluoride Chemical compound [NH4+].F.[F-] KVBCYCWRDBDGBG-UHFFFAOYSA-N 0.000 claims description 2
- 238000006243 chemical reaction Methods 0.000 abstract description 29
- 125000005010 perfluoroalkyl group Chemical group 0.000 abstract description 2
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 18
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 15
- 238000003756 stirring Methods 0.000 description 13
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 239000000706 filtrate Substances 0.000 description 12
- 238000001914 filtration Methods 0.000 description 12
- 239000011698 potassium fluoride Substances 0.000 description 11
- 239000000243 solution Substances 0.000 description 11
- GRGCWBWNLSTIEN-UHFFFAOYSA-N trifluoromethanesulfonyl chloride Chemical compound FC(F)(F)S(Cl)(=O)=O GRGCWBWNLSTIEN-UHFFFAOYSA-N 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 10
- 239000002253 acid Substances 0.000 description 9
- 125000005463 sulfonylimide group Chemical group 0.000 description 9
- SLVAEVYIJHDKRO-UHFFFAOYSA-N trifluoromethanesulfonyl fluoride Chemical compound FC(F)(F)S(F)(=O)=O SLVAEVYIJHDKRO-UHFFFAOYSA-N 0.000 description 9
- 239000000203 mixture Substances 0.000 description 8
- 239000011734 sodium Substances 0.000 description 8
- 239000011591 potassium Substances 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 6
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 6
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 210000003739 neck Anatomy 0.000 description 6
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 6
- XJHCXCQVJFPJIK-UHFFFAOYSA-M cesium fluoride Substances [F-].[Cs+] XJHCXCQVJFPJIK-UHFFFAOYSA-M 0.000 description 5
- 239000003792 electrolyte Substances 0.000 description 5
- 235000003270 potassium fluoride Nutrition 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 4
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- 229910013406 LiN(SO2CF3)2 Inorganic materials 0.000 description 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 235000011089 carbon dioxide Nutrition 0.000 description 4
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 4
- XGZVUEUWXADBQD-UHFFFAOYSA-L lithium carbonate Chemical compound [Li+].[Li+].[O-]C([O-])=O XGZVUEUWXADBQD-UHFFFAOYSA-L 0.000 description 4
- 229910052808 lithium carbonate Inorganic materials 0.000 description 4
- QSZMZKBZAYQGRS-UHFFFAOYSA-N lithium;bis(trifluoromethylsulfonyl)azanide Chemical compound [Li+].FC(F)(F)S(=O)(=O)[N-]S(=O)(=O)C(F)(F)F QSZMZKBZAYQGRS-UHFFFAOYSA-N 0.000 description 4
- LUYQYZLEHLTPBH-UHFFFAOYSA-N perfluorobutanesulfonyl fluoride Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)S(F)(=O)=O LUYQYZLEHLTPBH-UHFFFAOYSA-N 0.000 description 4
- 150000003512 tertiary amines Chemical class 0.000 description 4
- KAKQVSNHTBLJCH-UHFFFAOYSA-N trifluoromethanesulfonimidic acid Chemical compound NS(=O)(=O)C(F)(F)F KAKQVSNHTBLJCH-UHFFFAOYSA-N 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 235000013024 sodium fluoride Nutrition 0.000 description 3
- 239000011775 sodium fluoride Substances 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 3
- ZXMGHDIOOHOAAE-UHFFFAOYSA-N 1,1,1-trifluoro-n-(trifluoromethylsulfonyl)methanesulfonamide Chemical compound FC(F)(F)S(=O)(=O)NS(=O)(=O)C(F)(F)F ZXMGHDIOOHOAAE-UHFFFAOYSA-N 0.000 description 2
- JUZCVRZJGRPWJZ-UHFFFAOYSA-N 1,1,2,2,2-pentafluoroethanesulfonyl fluoride Chemical compound FC(F)(F)C(F)(F)S(F)(=O)=O JUZCVRZJGRPWJZ-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002736 metal compounds Chemical class 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- OBTWBSRJZRCYQV-UHFFFAOYSA-N sulfuryl difluoride Chemical compound FS(F)(=O)=O OBTWBSRJZRCYQV-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- TUFKXBSYCAKZAV-UHFFFAOYSA-N C.C.F Chemical compound C.C.F TUFKXBSYCAKZAV-UHFFFAOYSA-N 0.000 description 1
- OZKVSEHUYLUEAW-UHFFFAOYSA-N CO[Na].C[Si](C)(C)N([Na])S(=O)(=O)C(F)(F)F.C[Si](C)(C)N[Si](C)(C)C.Cl.FC(F)(F)N([Na])C(F)(F)F.NS(=O)(=O)C(F)(F)F.O=S(=O)(F)C(F)(F)F.O=S(=O)(N[Na])C(F)(F)F.O=S=O.O=S=O Chemical compound CO[Na].C[Si](C)(C)N([Na])S(=O)(=O)C(F)(F)F.C[Si](C)(C)N[Si](C)(C)C.Cl.FC(F)(F)N([Na])C(F)(F)F.NS(=O)(=O)C(F)(F)F.O=S(=O)(F)C(F)(F)F.O=S(=O)(N[Na])C(F)(F)F.O=S=O.O=S=O OZKVSEHUYLUEAW-UHFFFAOYSA-N 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- LDDQLRUQCUTJBB-UHFFFAOYSA-N ammonium fluoride Chemical compound [NH4+].[F-] LDDQLRUQCUTJBB-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
- JHRWWRDRBPCWTF-OLQVQODUSA-N captafol Chemical compound C1C=CC[C@H]2C(=O)N(SC(Cl)(Cl)C(Cl)Cl)C(=O)[C@H]21 JHRWWRDRBPCWTF-OLQVQODUSA-N 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 229910052730 francium Inorganic materials 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 239000012442 inert solvent Substances 0.000 description 1
- 229910017053 inorganic salt Inorganic materials 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 239000011968 lewis acid catalyst Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002826 nitrites Chemical class 0.000 description 1
- 229910000069 nitrogen hydride Inorganic materials 0.000 description 1
- 238000005580 one pot reaction Methods 0.000 description 1
- 150000003109 potassium Chemical class 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000001694 spray drying Methods 0.000 description 1
- 150000003456 sulfonamides Chemical class 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000010189 synthetic method Methods 0.000 description 1
- 125000001889 triflyl group Chemical group FC(F)(F)S(*)(=O)=O 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C303/00—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides
- C07C303/36—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of amides of sulfonic acids
- C07C303/38—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of amides of sulfonic acids by reaction of ammonia or amines with sulfonic acids, or with esters, anhydrides, or halides thereof
Definitions
- the present invention relates to a process for producing a sulfonylimide compound represented by the formula:
- Sulfonylimide compounds are safe as a solute of a battery electrolyte and battery electrolyte that uses the sulfonylimide compound as a solute has a high energy density and exhibits high conductivity.
- the sulfonylimide compounds are regarded as a promising solute of a battery electrolyte.
- the sulfonylimide compounds are useful as a Lewis acid catalyst and an ionic conduction agent.
- the sulfonylimide compounds represented by the formula (I) MN(SO 2 R f 1 )(SO 2 R f 2 ) may be synthesized by the process proposed by D. D. Desmarteau et al. in INORGANIC CHEMISTORY VOL. 23, No. 23, P3720-3723 (1984).
- M represents any one of Li, Na, K and Cs among alkali metals of group Ia in the periodic table.
- R f 1 and R f 2 which may be the same or different, respectively represent any one of a straight chain or branched compound of a fluoroalkyl, perfluoroalkyl, fluoroallyl and fluoroalkenyl group having 1 to 12 carbon atoms (the same hereafter).
- the present invention comprises a reaction of at least one of the sulfonyl halogenides represented by the formula (II) R f SO 2 X with anhydrous ammonium or an ammonium salt in the presence of fluorine compounds represented by the formula (III) MF.
- M represents any one of Li, Na, K and Cs among alkali metals of group Ia in the periodic table
- X represents either F or Cl among halogen elements of VIIb group in the periodic table.
- R f in the above-described formula (II) represents the same or identical group as R f 1 or R f 2 in the formula (I).
- sulfonylimide compound represented by the formula (I) MN(SO 2 R f 1 ) (SO 2 R f 2 ) can be produced in the mild conditions that anhydrous ammonium is not always used and in only one-step reaction by reacting a sulfonylamide represented by the formula (IV) R f SO 2 NH 2 , at least one of the sulfonyl halogenides represented by the formula (II) R f SO 2 X, and fluorine compound represented by the formula (III)MF with each other.
- Li, Na, K, Rb, Cs and Fr exist as the alkali metals of Ia group in the periodic table.
- these metals especially any one of Li, Na, K and Cs is selected and used. Therefore, in the case of these metals, the fluorine compounds that are used are LiF, NaF, KF (as KF, any one of calcine-dried KF (cd KF) and spray-dried KF (sd KF) produced by a spray drying method may be used) and CsF
- Li, Na, K, and Cs are preferred among alkali metals of group Ia in the periodic table is that they are relatively cheap and suitable to produce sulfonylimide compounds industrially easily, at a low cost and in an efficient manner.
- K is prominent for the above property among Li, Na, K, and Cs.
- the sulfonylimide compound can be produced by using an ammonium salt.
- an ammonium salt in this case, it is desirable to use ammonium fluoride or ammonium hydrogendifluoride.
- the object compounds which has been produced in multi-steps in the prior art can be produced in one step by introducing a fluorine compound represented by the formula (III) MF, at least one of the sulfonyl halogenides represented by the formula (II) R f SO 2 X, and anhydrous ammonia or an ammonium salt into an inert solvent and reacting the mixture as shown by the following formula 2, 3, 4, and 5.
- a sulfonylamide containing the R f 1 group which is produced by a known process shown below is reacted with at least one of the sulfonyl halogenides having a desired R f 2 group.
- a sulfonylimide compound with the R f 1 group and the R f 2 group are respectively constituted of an objective group can be thereby produced.
- R f 1 and R f 2 are the same or different.
- One mol of an ammonium salt, 2 mol of at least one of the sulfonyl halogenides represented by the formula (II) R f SO 2 X and 7 mol of a fluorine compound represented by the formula (III) MF are introduced into a reactor, and the mixture is reacted in a solvent.
- any solvent can be used without particular limitations as far as it is inert to the reaction materials.
- ethers such as diethyl ether and tetrahydrofuran
- halogenated hydrocarbons such as dichloromethane and dichloroethane
- hydrocarbons such as benzene, heptane and hexane and nitrites such as acetonitrile
- nitrites such as acetonitrile
- a sulfonylimide compound obtained by these production methods is made into an acid by using concentrated sulfuric acid and the acid is distilled to thereby synthesize a sulfonylimidic acid [HN(SO 2 R f 1 )(SO 2 R f 2 )].
- This acid can be further reacted with a compound selected from hydroxides, oxides, carbonates and acetates of metals corresponding to this acid.
- fluorine compounds represented by the formula (III) MF to be used in the synthesis of a sulfonylimide compound can be compounded and used.
- a flask with four necks was charged with 150 ml of acetonitrile, 23.4 g of potassium fluoride and 20 g of trifluoromethylsulfonylamide CF 3 SO 2 NH 2 .
- the reactor was soaked in a 40° C. hot water bath, and 25.1 g of trifluoromethylsulfonyl fluoride CF 3 SO 2 F was introduced with sufficient stirring.
- the reaction solution was subjected to filtration, and the filtrate was concentrated under reduced pressure to obtain potassium bistrifluoromethylsulfonylimide KN(SO 2 CF 3 ) 2 in an amount of 42.7 g.
- the yield was 99%.
- a flask with four necks was charged with 1 liter of methylene chloride, 10 g of ammonium fluoride and 78.4 g of potassium fluoride.
- the reactor was soaked in a 40° C. hot water bath, and 82.1 g of trifluoromethylsulfonyl fluoride CF 3 SO 2 F was introduced while stirring sufficiently.
- the reaction solution was subjected to filtration, and the filtrate was concentrated under reduced pressure to obtain 81.5 g of potassium bistrifluoromethylsulfonylimide KN(SO 2 CF 3 ) 2 .
- the yield was 95%.
- a flask with four necks was charged with 200 ml of acetonitrile, 12 g of perfluorobuthylsulfonyl fluoride C 4 F 9 SO 2 F, 15.0 g of cesium fluoride, and 0.73 g of ammonium fluoride, and the mixture was heated 50° C. and sufficiently stirred to react.
- the reaction solution was subjected to filtration, and the filtrate was concentrated under reduced pressure to obtain 12.5 g of cesium bisperfluorobuthylsulfonylimide CsN(SO 2 C 4 F 9 ) 2 .
- the yield was 89.3%.
- a flask with four necks was charged with 150 ml of acetonitrile, 31.2 g of potassium fluoride, and 10 g of trifluoromethylsulfonylamide CF 3 SO 2 NH 2 were added.
- the reactor was soaked in a 40° C. water bath, and 11.3 g of trifluoromethylsulfonyl chloride CF 3 SO 2 Cl was introduced while stirring sufficiently.
- the reaction solution was subjected to filtration, and the filtrate was concentrated under reduced pressure to obtain 21.4 g of potassium bistrifluoromethylsulfonylimide KN(SO 2 CF 3 ) 2 .
- the yield was 96%.
- a flask with four necks was charged with 200 ml of methylene chloride, 10 g of ammonium fluoride, and 110 g of potassium fluoride.
- the reactor was soaked in a 40° C. water bath, and 91.0 g of trifluoromethylsulfonyl chloride CF 3 SO 2 Cl was introduced while stirring sufficiently.
- the reaction solution was subjected to filtration, and the filtrate was concentrated under reduced pressure to obtain 81.0 g of potassium bistrifluoromethylsulfonylimide KN(SO 2 CF 3 ) 2 .
- the yield was 94%.
- the production process of the present invention has such an effect that sulfonylimide compounds useful as lithium battery electrolytes and organic synthetic catalysts are produced industrially easily at a low cost in an efficient manner.
- the production process according to the present invention has such an effect that by reacting a sulfonylamide, a sulfonyl fluoride and a fluorine compound with each other, a sulfonylimide compound useful as lithium battery electrolytes and organic synthtic catalysts is produced under a mild condition that anhydrous ammonia is not always used, and in one stage. Also, a specific reactor (autoclave) is not required unlike the case that uses anhydrous ammonia.
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
A process for producing sulfonylimide compound is represented by the formula (I) MN(SO2Rf 1) (SO2Rf 2) industrially easily at a low cost in an efficient manner comprising reactions of at least one sulfonyl halogenides represented by the formula (II) RfSO2X with anhydrous ammonia or an ammonium salt in the presence of a fluorine compound represented by the formula (III) MF, in which X represents either F or Cl among halogen elements of VIIb group in the periodic table, and M represents any one of Li, Na, K and Cs among alkali metals of group Ia in the periodic table, Rf 1 and Rf 2, which may be the same or different, respectively represent any one of a straight chain or branched compound of a fluoroalkyl, perfluoroalkyl, fluoroallyl or fluoroalkenyl group having 1 to 12 carbon atoms, and Rf in the formula (II) represents the same group as Rf 1 or Rf 2 in the formula (I).
Description
- 1. Technical field of the Invention
- The present invention relates to a process for producing a sulfonylimide compound represented by the formula:
- MN(SO2Rf 1)(SO2Rf 2)
- 2. Description of Prior Art
- Sulfonylimide compounds are safe as a solute of a battery electrolyte and battery electrolyte that uses the sulfonylimide compound as a solute has a high energy density and exhibits high conductivity. Hence, the sulfonylimide compounds are regarded as a promising solute of a battery electrolyte. Also, the sulfonylimide compounds are useful as a Lewis acid catalyst and an ionic conduction agent.
- The sulfonylimide compounds represented by the formula (I) MN(SO 2Rf 1)(SO2Rf 2) may be synthesized by the process proposed by D. D. Desmarteau et al. in INORGANIC CHEMISTORY VOL. 23, No. 23, P3720-3723 (1984).
- In this synthetic method, as shown by the following formula, trifluoromethylsulfonyl fluoride is reacted with ammonium, the resulting product is treated using hydrochloric acid to produce trifluoromethylsulfonylamide, which is then reacted with sodium methylate and then with hexamethyldisilazane, and the resulting product is reacted with trifluoromethylsulfonyl fluoride, thus obtaining an imide sodium salt.
- However, this process involves multi-reaction steps and hence takes longer. Also, expensive hexamethyldisilazane must be used to obtain an intermediate, and the yield is as low as about 50%.
- In the above-described formula (I), M represents any one of Li, Na, K and Cs among alkali metals of group Ia in the periodic table. R f 1 and Rf 2, which may be the same or different, respectively represent any one of a straight chain or branched compound of a fluoroalkyl, perfluoroalkyl, fluoroallyl and fluoroalkenyl group having 1 to 12 carbon atoms (the same hereafter).
- In the Japanese Patent Application National Publication No. Hei3-501860, a method is disclosed in which a silazane metal compound is reacted with a perfluorosulfonyl halide compound to obtain an imide compound. In the Japanese Patent Application National Publication No. Hei4-501118, a method is disclosed in which an ionic nitride is reacted with a halogenated sulfonic acid to obtain in imide compound.
- However, the silazane metal compound and the ionic nitride used in each of the above prior art are expensive, and hence the above methods are not an economical production method.
- Also, in the Japanese Patent Application Laid-Open(Kokai) No. Hei8-81436, a method is disclosed in which anhydrous ammonia or a sulfonylamide and a sulfonyl fluoride are reacted with a tertiary amine or a heterocyclic amine, and the reaction product is further reacted with, for instance, a hydroxide containing an alkali metal and an alkali earth metal to produce imide salts.
- In this method, because the product in the first stage is generated as an amine salt, it must be further reacted with an inorganic salt. Also, since a tertiary amine or a heterocyclic amine is used in the reaction, problems concerning work environment caused by the odor and disposal of the amine occur. Moreover, because the anhydrous ammonia is always used, an autoclave as the reactor and a low temperature cooling unit are required. This method is, therefore, unsuitable for mass-production.
- As outlined above, the prior art involves a long reaction step and uses expensive raw materials, and it is hence hard to say that these methods in prior art are industrially acceptable methods.
- In the Japanese Patent Application Laid-Open (Kokai) No. Hei8-81436, anhydrous ammonia, a perfluoroalkylsulfonyl fluoride and a tertiary amine are reacted with each other. To obtain an imide salt, at least two steps are required; and in the reaction, a tertiary amine or a heterocyclic amine is used, causing possibility of pollution of work environment derived from the odor and the like. Further, the product must be reacted with an alkali metal or the like in an aqueous solution in the second step, and at this time, it is necessary to dispose the amine which is freed and distilled together with water, causing increased production costs.
- It is an object of the present invention to solve these various problems and to produce a sulfonylimide compound industrially easily at a low cost in an efficient manner.
- The inventors of the present application have made earnest studies to accomplish the above object and as a result found that a sulfonylimide compound (represented by the formula (I) MN(SO 2Rf 1) (SO2Rf 2)) which is free from the foregoing problems can be produced industrially easily at a low cost in an efficient manner.
- More specifically, the present invention comprises a reaction of at least one of the sulfonyl halogenides represented by the formula (II) R fSO2X with anhydrous ammonium or an ammonium salt in the presence of fluorine compounds represented by the formula (III) MF.
- In the above-described formulas (I) and (II), M represents any one of Li, Na, K and Cs among alkali metals of group Ia in the periodic table, and X represents either F or Cl among halogen elements of VIIb group in the periodic table. Also, R f in the above-described formula (II) represents the same or identical group as Rf 1 or Rf 2 in the formula (I).
- The inventors have also found that sulfonylimide compound represented by the formula (I) MN(SO 2Rf 1) (SO2Rf 2) can be produced in the mild conditions that anhydrous ammonium is not always used and in only one-step reaction by reacting a sulfonylamide represented by the formula (IV) RfSO2NH2, at least one of the sulfonyl halogenides represented by the formula (II) RfSO2X, and fluorine compound represented by the formula (III)MF with each other.
- Li, Na, K, Rb, Cs and Fr exist as the alkali metals of Ia group in the periodic table. Among these metals, especially any one of Li, Na, K and Cs is selected and used. Therefore, in the case of these metals, the fluorine compounds that are used are LiF, NaF, KF (as KF, any one of calcine-dried KF (cd KF) and spray-dried KF (sd KF) produced by a spray drying method may be used) and CsF
- The reason why Li, Na, K, and Cs are preferred among alkali metals of group Ia in the periodic table is that they are relatively cheap and suitable to produce sulfonylimide compounds industrially easily, at a low cost and in an efficient manner. Especially, K is prominent for the above property among Li, Na, K, and Cs.
- In the present invention, on the other hand, the sulfonylimide compound can be produced by using an ammonium salt. As the ammonium salt in this case, it is desirable to use ammonium fluoride or ammonium hydrogendifluoride. These of either one of these compounds has the advantage that a specific reactor (autoclave) is not required.
- CF 3SO2Cl among sulfonyl halogenides represented by the formula (II) RfSO2X, which is sold on the market as a reagent, can be usually handled as liquid because its boiling point is 30° C., relatively high among these kinds of compounds.
- Although “sulfonylimide” and “sulfonylamide” in the present specification should be expressed formally as “sulfonimide” and “sulfonamide”, respectively, both are handled as the same significance.
- The embodiment of the present invention will be hereinafter explained in detail.
- The object compounds which has been produced in multi-steps in the prior art can be produced in one step by introducing a fluorine compound represented by the formula (III) MF, at least one of the sulfonyl halogenides represented by the formula (II) R fSO2X, and anhydrous ammonia or an ammonium salt into an inert solvent and reacting the mixture as shown by the following formula 2, 3, 4, and 5.
- This is due to the basicity of the fluorine compound represented by the formula (III) MF.
- (1) In the case where R f 1 and Rf 2 in the formula (I) MN(SO2Rf 1) (SO2Rf 2) are the same or equal to each other:
- NH3+2RfSO2X+6MF→MN(SO2Rf)2+3MFHF+2MX Reaction Formula 2
- One mol of anhydrous ammonium, 2 mol of at least one of the sulfonyl halogenides represented by the formula (II) R fSO2X and 6 mol of a fluorine compound represented by the formula (III) MF are introduced into a reactor and the mixture is reacted in a solvent.
- After completion of the reaction, 2 mol of the by-produced MX and 3 moles of hydrogendifluoride salt MFHF are removed by filtration, and the filtrate is concentrated. The sulfonylimide compound represented by the formula (I) MN(SO 2Rf)2 can be thereby produced.
- (2) In the case where R f 1 and Rf 2 in the formula (I) MN(SO2Rf 1)(SO2Rf 2) are different from each other:
- A sulfonylamide containing the R f 1 group which is produced by a known process shown below is reacted with at least one of the sulfonyl halogenides having a desired Rf 2 group. A sulfonylimide compound with the Rf 1 group and the Rf 2 group are respectively constituted of an objective group can be thereby produced.
- (3) In the case of using an ammonium salt:
- (Rf 1SO2X)(Rf 2SO2X)+7MF+NH4F→MN(SO2Rf 1)(SO2Rf 2)+4MFHF+2MX Reaction Formula 5
- wherein R f 1 and Rf 2 are the same or different.
- One mol of an ammonium salt, 2 mol of at least one of the sulfonyl halogenides represented by the formula (II) R fSO2X and 7 mol of a fluorine compound represented by the formula (III) MF are introduced into a reactor, and the mixture is reacted in a solvent.
- After completion of the reaction, 2 mol of the by-produced MX and 4 mol of the by-produced hydrogendifluoride MFHF are removed by filtration, and then the filtrate is concentrated. The sulfonylimide compound represented by the formula (I) MN(SO 2Rf 1) (SO2Rf 2) can be thereby produced.
- These reactions can occur in a temperature range between about −30° C. and 200° C. At a temperature less than this range, the reaction rate is very low whereas at the temperature exceeding the above range, decomposition of the compounds, solvent and product to be used arises. A more preferable temperature range for the reactions is between 0° C. and 100° C.
- As to the solvent, any solvent can be used without particular limitations as far as it is inert to the reaction materials. For example, ethers such as diethyl ether and tetrahydrofuran, halogenated hydrocarbons such as dichloromethane and dichloroethane, hydrocarbons such as benzene, heptane and hexane and nitrites such as acetonitrile can be used.
- In order to produce various sulfonylimide compounds other than those described above, a sulfonylimide compound obtained by these production methods is made into an acid by using concentrated sulfuric acid and the acid is distilled to thereby synthesize a sulfonylimidic acid [HN(SO 2Rf 1)(SO2Rf 2)]. This acid can be further reacted with a compound selected from hydroxides, oxides, carbonates and acetates of metals corresponding to this acid.
- In this case, fluorine compounds represented by the formula (III) MF to be used in the synthesis of a sulfonylimide compound can be compounded and used.
- The present invention will be described in more detail by way of examples, which, of course, do not limit the present invention.
- A flask with four necks was charged with 150 ml of acetonitrile, 23.4 g of potassium fluoride and 20 g of trifluoromethylsulfonylamide CF 3SO2NH2. The reactor was soaked in a 40° C. hot water bath, and 25.1 g of trifluoromethylsulfonyl fluoride CF3SO2F was introduced with sufficient stirring. The reaction solution was subjected to filtration, and the filtrate was concentrated under reduced pressure to obtain potassium bistrifluoromethylsulfonylimide KN(SO2CF3)2 in an amount of 42.7 g. The yield was 99%.
- Next, 42.7 g of this potassium bistrifluoromethylsulfonylimide was added in a flask that was charged with 60 ml of concentrated sulfuric acid, and the mixture was dissolved under heat. Under reduced pressure, 34.6 g of bistrifluoromethylsulfonylimidic acid HN(SO 2CF3)2 was distilled by distillation. The yield was 92%.
- Then, 34.6 g of the resulting bistrifluoromethylsulfonylimidic acid was dissolved in pure water and reacted with 4.5 g of lithium carbonate. Excess lithium carbonate was removed by filtration, and the filtrate was concentrated to obtain 34.6 g of lithium bistrifluoromethylsulfonylimide LiN(SO 2CF3)2. The yield was 98%.
- An autoclave made of stainless was charged with 200 ml of acetonitrile and 68.3 g of potassium fluoride. The reactor was cooled to −60° C. in a dry ice/methanol bath, and 5 g of anhydrous ammonia was introduced.
- In succession, 90.0 g of trifluoromethylsulfonyl fluoride CF 3SO2F was introduced, and the temperature of the mixture was returned to ambient temperature with sufficient stirring. After that, the reactor was soaked in a 40° C. hot water bath, and the reaction was completed while stirring sufficiently. The reaction solution was subjected to filtration, and the filtrate was concentrated under reduced pressure to obtain 88.2 g of potassium bistrifluoromethylsulfonylimide KN(SO2CF3)2. The yield was 95%.
- A flask with four necks was charged with 1 liter of methylene chloride, 10 g of ammonium fluoride and 78.4 g of potassium fluoride. The reactor was soaked in a 40° C. hot water bath, and 82.1 g of trifluoromethylsulfonyl fluoride CF 3SO2F was introduced while stirring sufficiently. The reaction solution was subjected to filtration, and the filtrate was concentrated under reduced pressure to obtain 81.5 g of potassium bistrifluoromethylsulfonylimide KN(SO2CF3)2. The yield was 95%.
- A flask was charged with 300 ml of DMF (dimethylformamide), 30 g of perfluorobutylsulfonyl fluoride C 4F9SO2F, 15.1 g of trifluoromethylsulfonylamide CF3SO2NH2 and 13 g of sodium fluoride, and the mixure was heated to 100° C. and sufficiently stirred to react. The reaction solution was subjected to filtration, and the filtrate was concentrated under reduced pressure to obtain 35.1 g of sodium perfluorobutylsulfonyl-trifluoromethylsulfonylimide NaN(SO2C4F9)(SO2CF3). The yield was 78.0%.
- A flask with four necks was charged with 200 ml of acetonitrile, 12 g of perfluorobuthylsulfonyl fluoride C 4F9SO2F, 15.0 g of cesium fluoride, and 0.73 g of ammonium fluoride, and the mixture was heated 50° C. and sufficiently stirred to react. The reaction solution was subjected to filtration, and the filtrate was concentrated under reduced pressure to obtain 12.5 g of cesium bisperfluorobuthylsulfonylimide CsN(SO2C4F9)2. The yield was 89.3%.
- An autoclave made of stainless was charged with 100 ml of dichloromethane, 100 ml of DMF (dimethylformamide) and 30.5 g of lithium fluoride. The reactor was cooled to −60° C. in a dry ice/ methanol bath, and 5 g of anhydrous ammonia was introduced.
- In succession, 100.0 g of trifluoromethylsulfonyl floride CF 3SO2F was introduced, and the temperature of the mixture was returned to ambient temperature with sufficient stirring. After that, the reactor was soaked in a 50° C. hot water bath, and the reaction was run while stirring sufficiently.
- The reaction solution was subjected to filtration, and the filtrate was concentrated under reduced pressure, but only 1.7 g of lithium bistrifluoromethylsulfonylimide LiN(SO 2CF3)2 was obtained (the yield was 2.0%).
- Although the amount and percentage yield of the product compound in this case were lower than in the case of other examples, this case is expected to be improved by further studies. Such an improved case should be indeed in the scope of the present invention.
- A flask with four necks was charged with 150 ml of acetonitrile, 31.2 g of potassium fluoride, and 10 g of trifluoromethylsulfonylamide CF 3SO2NH2 were added. The reactor was soaked in a 40° C. water bath, and 11.3 g of trifluoromethylsulfonyl chloride CF3SO2Cl was introduced while stirring sufficiently. The reaction solution was subjected to filtration, and the filtrate was concentrated under reduced pressure to obtain 21.4 g of potassium bistrifluoromethylsulfonylimide KN(SO2CF3)2. The yield was 96%.
- In succession, 21.4 g of potassium bistrifluoromethylsulfonylimide was added in a flask that was charged with 30 ml of concentrated sulfuric acid, and the mixture was dissolved under heat. And then, 15.6 g of bistrifluoromethylsulfonylimidic acid HN(SO 2CF3)2 was distilled by distillation under reduced pressure. The yield was 83%.
- The resulting 15.6 g of bistrifluoromethylsulfonylimidic acid was dissolved in the pure water and reacted with 2.1 g of lithium carbonate. Excess lithium carbonate was subjected to filtration, and the filtrate was concentrated to obtain 15.4 g of lithium bistrifluoromethylsulfonylimide LiN(SO 2CF3)2. The yield was 97%.
- A flask with four necks was charged with 200 ml of methylene chloride, 10 g of ammonium fluoride, and 110 g of potassium fluoride. The reactor was soaked in a 40° C. water bath, and 91.0 g of trifluoromethylsulfonyl chloride CF 3SO2Cl was introduced while stirring sufficiently. The reaction solution was subjected to filtration, and the filtrate was concentrated under reduced pressure to obtain 81.0 g of potassium bistrifluoromethylsulfonylimide KN(SO2CF3)2. The yield was 94%.
- A flask with four necks was charged with 5 g of ammonium fluoride, 143.6 g of cesium fluoride, and 200 ml of tetrahydrofuran. With sufficiently stirring the reactor, 22.8 g of trifluoromethylsulfonyl chloride CF 3SO2Cl was introduced, and then 27.3 g of pentafluoroethylsulfonyl fluoride C2F5SO2F was added. The reaction solution was treated in the same way as Example 2 to obtain 62 g of cesium perfluoroethylsulfonyl trifluoromethylsulfonylimide CsN(SO2C2F5) (SO2CF3). The yield was 99.2%.
- In a SUS (stainless)-made autoclave, 200 ml of methylene chloride, 300 ml of DMF (dimethylformamide), 45.6 g of lithium fluoride, and 99.0 g of trifluoromethylsulfonyl chloride CF 3SO2Cl were added. The reactor was cooled to −60° C. in a methanol/dry ice bath, and 5 g of anhydrous ammonia was introduced.
- The reaction mixture was returned to the room temperature while stirring sufficiently, and then the reactor was soaked in a 80° C. water bath, and the reaction was run while stirring sufficiently. Consequently, the reaction solution was treated in the same way as Example 2, but only 0.8 g of lithium bistrifluoromethylsulfonylimide LiN(SO 2CF3)2 was obtained (the yield was 0.9%). The amount and yield of the product were considerably lower than the cases of other Examples, however, further improvement may be expected by the future investigations. This invention naturally includes such a case.
- In a SUS (stainless)-made autoclave, 200 ml of methylene chloride, 300 ml of DMF (dimethylformamide), 74.1 g of sodium fluoride, and 49.5 g of trifluoromethylsulfonyl chloride CF 3SO2Cl were added. The reactor was cooled to −60° C. in a methanol/dry ice bath, and 5 g of anhydrous ammonia was introduced.
- Consequently, 88.8 g of perfluorobuthylsulfonyl fluoride C 4F9SO2F was added, and the reaction mixture was returned to the room temperature with stirring sufficiently. And then, the reactor was soaked in a 80° C. water bath, and the reaction was run while stirring sufficiently. Consequently, the reaction solution was treated in the same way as Example 2, to obtain 18 g of sodium perfluorobuthylsulfonyl trifluoromethylsulfonylimide NaN(SO2C4F9) (SO2CF3). The yield was 13.5%.
- It should be noted that the sulfonylimide compounds obtained in the above examples were respectively confirmed by identifying them using an infrared absorption spectrum.
- As seen from the above description, the production process of the present invention has such an effect that sulfonylimide compounds useful as lithium battery electrolytes and organic synthetic catalysts are produced industrially easily at a low cost in an efficient manner.
- Furthermore, the production process according to the present invention has such an effect that by reacting a sulfonylamide, a sulfonyl fluoride and a fluorine compound with each other, a sulfonylimide compound useful as lithium battery electrolytes and organic synthtic catalysts is produced under a mild condition that anhydrous ammonia is not always used, and in one stage. Also, a specific reactor (autoclave) is not required unlike the case that uses anhydrous ammonia.
Claims (3)
1. A process for producing a sulfonylimide compound represented by the formula (I):
MN (SO2Rf 1)(SO2Rf 2),
wherein M represents any one of Li, Na, K and Cs among alkali metals of group Ia in the periodic table, Rf 1 and Rf 2, which are the same or different and respectively represent any one of a straight chain or branched compound of a fluoroalkyl, perfluoroaklyl, fluoroallyl or fluoroalkenyl group having 1 to 12 carbon atoms, wherein the process reacts:
at least one of sulfonyl halogenides represented by the formula (II): RfSO2X, wherein Rf represents the same or identical group as Rf 1 or Rf 2 in the formula (I), and X represents either F or Cl among halogen elements of VIIb group in the periodic table, with anhydrous ammonia or an ammonium salt, and with
a fluorine compound represented by the Formula (II): MF, wherein M represents any one of Li, Na, K and Cs among alkali metals of group Ia in the periodic table.
2. A process for producing a sulfonylimide compound represented by the formula (I):
MN (SO2Rf 1)(SO2Rf 2)
wherein M represents any one of Li, Na, K and Cs among alkali metals of group Ia in the periodic table, Rf 1 and Rf 2, which are the same or different and respectively represent any one of a straight chain or branched compound of a fluoroalkyl, perfluoroaklyl, fluoroallyl or fluoroalkenyl group having 1 to 12 carbon atoms, wherein the process reacts:
a sulfonylamide represented by the formula (IV): RfSO2NH2, wherein Rf represents the same group as Rf 1 or Rf 2 in the formula (I), with
at least one of sulfonyl halogenides represented by the formula (II): RfSO2X, wherein Rf represents the same or identical group as Rf 1 or Rf 2 in the formula (I), and X represents either F or Cl among halogen elements of VIIb group in the element periodic table, and with
a fluorine compound represented by the formula (III): MF, wherein M represents any one of Li, Na, K and Cs among alkali metals of group Ia in the periodic table.
3. The process for producing a sulfonylimide compound according to , wherein an ammonium fluoride or an ammonium hydrogendifluoride is used as the ammonium salt.
claim 1
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| Application Number | Priority Date | Filing Date | Title |
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| JP2000-021578 | 2000-01-31 | ||
| JP2000021578 | 2000-01-31 | ||
| JP2001008448A JP3623452B2 (en) | 2000-01-31 | 2001-01-17 | Method for producing sulfonylimide compound |
| JP2001-008448 | 2001-01-17 |
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| US20010021790A1 true US20010021790A1 (en) | 2001-09-13 |
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| US (1) | US6452048B2 (en) |
| JP (1) | JP3623452B2 (en) |
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| US20090212743A1 (en) * | 2005-03-23 | 2009-08-27 | Rika Hagiwara | Molten Salt Composition and Use Thereof |
| US20100174113A1 (en) * | 2006-07-17 | 2010-07-08 | Institut National Polytechnique De Grenoble | Aromatic sulphonylimides, preparation thereof and use thereof as electrolyte |
| US20120088139A1 (en) * | 2010-04-27 | 2012-04-12 | Sumitomo Electric Industries, Ltd. | Electrode for molten salt battery, molten salt battery, and method for producing electrode |
| US20120100416A1 (en) * | 2010-04-16 | 2012-04-26 | Sumitomo Electric Industries, Ltd. | Molten salt battery case, and molten salt battery |
| EP2439173A4 (en) * | 2009-06-03 | 2014-06-04 | Central Glass Co Ltd | Method for producing imidic acid salt |
| US9352966B2 (en) | 2011-10-18 | 2016-05-31 | Sumitomo Electric Industries, Ltd. | Method for producing imide salt |
| US9394247B2 (en) | 2012-07-23 | 2016-07-19 | Rhodia Operations | Method for preparing a sulfonimide compound and salts thereof |
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| CN1294116C (en) * | 2001-04-04 | 2007-01-10 | 日本曹达株式会社 | Documentary material and documentaries |
| JP5084309B2 (en) * | 2007-03-14 | 2012-11-28 | 旭化成株式会社 | Method for producing sulfonimide compound |
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| US5256821A (en) * | 1988-10-05 | 1993-10-26 | Societe Nationale Elf Aquitaine | Method of synthesis of sulphonylimides |
| US5874616A (en) * | 1995-03-06 | 1999-02-23 | Minnesota Mining And Manufacturing Company | Preparation of bis (fluoroalkylenesulfonyl) imides and (fluoroalkysulfony) (fluorosulfonyl) imides |
-
2001
- 2001-01-17 JP JP2001008448A patent/JP3623452B2/en not_active Expired - Lifetime
- 2001-01-31 US US09/773,648 patent/US6452048B2/en not_active Expired - Fee Related
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Also Published As
| Publication number | Publication date |
|---|---|
| US6452048B2 (en) | 2002-09-17 |
| JP3623452B2 (en) | 2005-02-23 |
| JP2001288193A (en) | 2001-10-16 |
| CN1319589A (en) | 2001-10-31 |
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