US10707076B2 - Nanostructure composite material and manufacturing method thereof - Google Patents
Nanostructure composite material and manufacturing method thereof Download PDFInfo
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- US10707076B2 US10707076B2 US15/879,608 US201815879608A US10707076B2 US 10707076 B2 US10707076 B2 US 10707076B2 US 201815879608 A US201815879608 A US 201815879608A US 10707076 B2 US10707076 B2 US 10707076B2
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- nanostructure
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- zinc oxide
- inorganic
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- 239000002086 nanomaterial Substances 0.000 title claims abstract description 95
- 239000002131 composite material Substances 0.000 title claims abstract description 48
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 19
- 238000000034 method Methods 0.000 claims abstract description 24
- 239000011368 organic material Substances 0.000 claims abstract description 20
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 47
- 239000000203 mixture Substances 0.000 claims description 15
- 239000011787 zinc oxide Substances 0.000 claims description 11
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 claims description 9
- 238000002156 mixing Methods 0.000 claims description 8
- 239000002071 nanotube Substances 0.000 claims description 8
- 239000008367 deionised water Substances 0.000 claims description 7
- 229910021641 deionized water Inorganic materials 0.000 claims description 7
- 239000007788 liquid Substances 0.000 claims description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 6
- 239000000725 suspension Substances 0.000 claims description 6
- ONDPHDOFVYQSGI-UHFFFAOYSA-N zinc nitrate Chemical compound [Zn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O ONDPHDOFVYQSGI-UHFFFAOYSA-N 0.000 claims description 6
- 150000002894 organic compounds Chemical class 0.000 claims description 4
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 claims description 3
- 238000004140 cleaning Methods 0.000 claims description 3
- 239000003960 organic solvent Substances 0.000 claims description 3
- 239000004246 zinc acetate Substances 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 claims description 2
- 238000000576 coating method Methods 0.000 claims description 2
- 238000003756 stirring Methods 0.000 claims description 2
- 239000011147 inorganic material Substances 0.000 abstract 2
- 229910010272 inorganic material Inorganic materials 0.000 abstract 2
- 239000000463 material Substances 0.000 description 8
- 230000005611 electricity Effects 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- 239000002918 waste heat Substances 0.000 description 3
- 229910002665 PbTe Inorganic materials 0.000 description 2
- -1 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000002210 silicon-based material Substances 0.000 description 2
- OCGWQDWYSQAFTO-UHFFFAOYSA-N tellanylidenelead Chemical compound [Pb]=[Te] OCGWQDWYSQAFTO-UHFFFAOYSA-N 0.000 description 2
- 238000004378 air conditioning Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 238000005057 refrigeration Methods 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02587—Structure
- H01L21/0259—Microstructure
- H01L21/02606—Nanotubes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02172—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02551—Group 12/16 materials
- H01L21/02554—Oxides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02587—Structure
- H01L21/0259—Microstructure
- H01L21/02603—Nanowires
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02623—Liquid deposition
- H01L21/02628—Liquid deposition using solutions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02636—Selective deposition, e.g. simultaneous growth of mono- and non-monocrystalline semiconductor materials
- H01L21/02639—Preparation of substrate for selective deposition
- H01L21/02645—Seed materials
-
- H01L35/16—
-
- H01L35/26—
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
- H10N10/80—Constructional details
- H10N10/85—Thermoelectric active materials
- H10N10/851—Thermoelectric active materials comprising inorganic compositions
- H10N10/852—Thermoelectric active materials comprising inorganic compositions comprising tellurium, selenium or sulfur
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
- H10N10/80—Constructional details
- H10N10/85—Thermoelectric active materials
- H10N10/857—Thermoelectric active materials comprising compositions changing continuously or discontinuously inside the material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02656—Special treatments
- H01L21/02664—Aftertreatments
Definitions
- the invention relates to a composite material, and more particularly to a nanostructure composite material and a method for manufacturing the nanostructure composite material that can enhance thermoelectric properties effective.
- thermoelectric materials enable direct energy conversion between heat and electricity by utilizing internal electron flows, not by any mechanical resort. Namely, the thermoelectric materials are capable of generating electricity and removing heat. Thus, the thermoelectric materials are widely applied to recover waste heat and/or in the field of refrigeration and air conditioning.
- thermoelectric components can be used to converse the waste heat into electricity.
- both energy consumption and environment burden can be reduced.
- a topic of providing a material that can effectively promote thermoelectric properties is definitely urgent to the skill in the art.
- thermoelectric properties can be enhanced and the volume can be light and thin, and that can be applicable to various wearable devices.
- the method for manufacturing a nanostructure composite material includes a step of preparing an inorganic nanostructure, and a step of embedding an organic material to the inorganic nanostructure son as to form a nanostructure composite material.
- the nanostructure composite material includes an inorganic nanostructure and an organic material embedded to the inorganic nanostructure so as to form a nanostructure composite material.
- the inorganic nanostructure includes a plurality of nanocolumns.
- the inorganic nanostructure includes a plurality of nanotubes.
- the inorganic nanostructure includes a plurality of nanoneedles.
- the inorganic nanostructure is a Zinc oxide nanostructure
- the step of preparing the inorganic nanostructure includes a step of preparing a Zinc oxide (ZnO) seed solution, a step of coating the Zinc oxide (ZnO) seed solution onto a substrate so as to form a Zinc oxide (ZnO) seed layer, and a step of placing the Zinc oxide (ZnO) seed layer into a growth liquid so as to grow the Zinc oxide (ZnO) seed layer into the Zinc oxide nanostructure.
- the step of preparing the Zinc oxide (ZnO) seed solution includes a step of mixing a Zinc acetate, a diethylene glycol and a deionized water to form a mixture, a step of stirring and heating the mixture so as to form a base solution, and a step of processing the base solution in a centrifugal manner so as to obtain a suspension solution from an upper layer of the base solution, the suspension solution being the Zinc oxide (ZnO) seed solution.
- the step of growing the Zinc oxide (ZnO) seed layer into the Zinc oxide nanostructure includes a heating process and a cleaning process.
- the growth liquid is prepared by mixing a Zinc nitrate, a hexamethy lenetetramie (HMT) and a deionized water.
- HMT hexamethy lenetetramie
- the step of embedding the organic material to the inorganic nanostructure includes a step of mixing an organic compound and an organic solvent to form an organic mixture, and a step of placing the inorganic nanostructure into the organic mixture, so that the organic mixture is embedded to the inorganic nanostructure so as to form the nanostructure composite material, wherein the inorganic nanostructure includes Zinc oxide, PbTe, PbSnTe, PbAgTe and narrow band gap thermoelectric materials.
- the composite material includes an inorganic nanostructure and an organic material.
- the nanostructure composite material with both organic and inorganic properties is manufactured by embedding the organic material to the inorganic nanostructure in a form of nanocolumns, nanotubes or nanoneedles. By implementing a lower thermal conductivity contributed by the embedded organic material, the thermoelectric properties of the nanostructure composite material can thus be enhanced.
- the nanostructure composite material of this present invention is not prepared by layered piling up, thus the entire volume of the nanostructure composite material can be reduced, such that a light and thin composite material can be obtained. Thereupon, the thermoelectric properties of the nanostructure composite material under a low-temperature (below 600K) application environment can ensured.
- FIG. 1 is a schematic view of a preferred method for manufacturing a nanostructure composite material in accordance with the present invention
- FIG. 2A demonstrates an SEM photo that shows inorganic nanocolumns embedded by an organic material in accordance with the present invention
- FIG. 2B demonstrates an SEM photo that shows inorganic nanotubes embedded by an organic material in accordance with the present invention.
- FIG. 2C demonstrates an SEM photo that shows inorganic nanoneedles embedded by an organic material in accordance with the present invention.
- the invention disclosed herein is directed to a nanostructure composite material and a method for manufacturing the nanostructure composite material.
- numerous details are set forth in order to provide a thorough understanding of the present invention. It will be appreciated by one skilled in the art that variations of these specific details are possible while still achieving the results of the present invention. In other instance, well-known components are not described in detail in order not to unnecessarily obscure the present invention.
- the method for manufacturing a nanostructure composite material S 100 includes Step S 110 ⁇ Step S 120 as follows.
- an inorganic nanostructure is prepared.
- the inorganic nanostructure is a Zinc oxide nanostructure.
- a Zinc oxide (ZnO) seed solution is prepared.
- a Zinc acetate, a diethylene glycol and a deionized water are mixed to form a mixture.
- the mixture is then stirred and heated to form a base solution.
- the base solution is process by a centrifugal manner so as to obtain a suspension solution from an upper layer of the base solution.
- the suspension solution is the Zinc oxide (ZnO) seed solution.
- a centrifugal machine can be applied to process the base solution centrifugally.
- the inorganic nanostructure may include narrow band gap 0.15 ⁇ Eg ⁇ 0.6 thermoelectric materials such as PbTe, PbSnTe, PbAgTe, etc.
- the Zinc oxide (ZnO) seed solution is prepared, then the Zinc oxide (ZnO) seed solution is coated onto a substrate so as to form a Zinc oxide (ZnO) seed layer.
- the substrate can be a glass substrate, or a substrate made of a crystal material, an a-Silicon material, a poly-Silicon material or a sapphire material. Then, the Zinc oxide (ZnO) seed layer is placed into a growth liquid so as to grow the Zinc oxide (ZnO) seed layer to corresponding Zinc oxide nanostructures.
- the growth liquid is prepared at least by mixing a Zinc nitrate, a hexamethy lenetetramie (HMT) and a deionized water.
- HMT hexamethy lenetetramie
- the Zinc oxide (ZnO) seed layer and the growth liquid are placed in an oven for undergoing a heating process. Till a growth time is over, a cleaning process is performed by using the deionized water to clean and thus obtain the Zinc oxide nanostructure.
- Step S 110 is performed to prepare the inorganic nanostructure, which includes a plurality of nanocolumns.
- the inorganic nanostructure can include a plurality of nanotubes.
- a side of the nanostructure having the nanocolumns is dipped into a KCl solution, then a heating and etching process is undergone on this side to form the nanotubes.
- the inorganic nanostructure may include a plurality of nanoneedles, which are obtained by properly controlling the growth time and concentrations of involved solutions.
- Step S 120 is executed to embed an organic material to the inorganic nanostructure so as to form a nanostructure composite material.
- an organic mixture is obtained by mixing an organic compound and an organic solvent.
- the organic compound is a poly(methyl methacrylate) (PMMA).
- PMMA poly(methyl methacrylate)
- the inorganic nanostructure is placed into the organic mixture so as to have the organic mixture embedded to the inorganic nanostructure to further form the nanostructure composite material.
- FIG. 2A through FIG. 2C where FIG. 2A demonstrates an SEM photo that shows inorganic nanocolumns embedded by an organic material in accordance with the present invention
- FIG. 2B demonstrates an SEM photo that shows inorganic nanotubes embedded by an organic material in accordance with the present invention
- FIG. 2C demonstrates an SEM photo that shows inorganic nanoneedles embedded by an organic material in accordance with the present invention.
- ZT thermoelectric figure of merit
- the composite material includes an inorganic nanostructure and an organic material.
- the nanostructure composite material with both organic and inorganic properties is manufactured by embedding the organic material to the inorganic nanostructure in a form of nanocolumns, nanotubes or nanoneedles.
- the nanostructure composite material of this present invention is not prepared by layered piling up, thus the entire volume of the nanostructure composite material can be reduced, such that a light and thin composite material can be obtained. Thereupon, the thermoelectric properties of the nanostructure composite material under a low-temperature (below 600K) application environment can ensured.
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- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Composite Materials (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Abstract
Description
Claims (7)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW106136217 | 2017-10-20 | ||
| TW106136217A | 2017-10-20 | ||
| TW106136217A TW201917098A (en) | 2017-10-20 | 2017-10-20 | Nanostructure composite material and manufacturing method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| US20190122886A1 US20190122886A1 (en) | 2019-04-25 |
| US10707076B2 true US10707076B2 (en) | 2020-07-07 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US15/879,608 Active 2038-05-28 US10707076B2 (en) | 2017-10-20 | 2018-01-25 | Nanostructure composite material and manufacturing method thereof |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US10707076B2 (en) |
| TW (1) | TW201917098A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110828650B (en) * | 2019-11-27 | 2021-11-09 | 东华大学 | Organic-inorganic composite thermoelectric film and preparation method thereof |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050045876A1 (en) * | 2003-08-28 | 2005-03-03 | Ikuo Fukui | Thin-film field effect transistor and making method |
| US20060145157A1 (en) * | 2004-12-30 | 2006-07-06 | Choi Young S | TFT array substrate and fabrication method thereof |
| US20110163307A1 (en) * | 2010-01-04 | 2011-07-07 | National Taiwan University | Thin-film transistor and forming method thereof |
| US20130153860A1 (en) * | 2011-12-16 | 2013-06-20 | Samsung Electronics Co., Ltd. | Method of forming hybrid nanostructure on graphene, hybrid nanostructure, and device including the hybrid nanostructure |
-
2017
- 2017-10-20 TW TW106136217A patent/TW201917098A/en unknown
-
2018
- 2018-01-25 US US15/879,608 patent/US10707076B2/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050045876A1 (en) * | 2003-08-28 | 2005-03-03 | Ikuo Fukui | Thin-film field effect transistor and making method |
| US20060145157A1 (en) * | 2004-12-30 | 2006-07-06 | Choi Young S | TFT array substrate and fabrication method thereof |
| US20110163307A1 (en) * | 2010-01-04 | 2011-07-07 | National Taiwan University | Thin-film transistor and forming method thereof |
| US20130153860A1 (en) * | 2011-12-16 | 2013-06-20 | Samsung Electronics Co., Ltd. | Method of forming hybrid nanostructure on graphene, hybrid nanostructure, and device including the hybrid nanostructure |
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| Publication number | Publication date |
|---|---|
| US20190122886A1 (en) | 2019-04-25 |
| TW201917098A (en) | 2019-05-01 |
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