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TWM292783U - Pellicle with absorption function - Google Patents

Pellicle with absorption function

Info

Publication number
TWM292783U
TWM292783U TW94205449U TW94205449U TWM292783U TW M292783 U TWM292783 U TW M292783U TW 94205449 U TW94205449 U TW 94205449U TW 94205449 U TW94205449 U TW 94205449U TW M292783 U TWM292783 U TW M292783U
Authority
TW
Taiwan
Prior art keywords
pellicle
absorption function
absorption
function
Prior art date
Application number
TW94205449U
Other languages
Chinese (zh)
Inventor
Jia-Ling Li
Original Assignee
Jia-Ling Li
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jia-Ling Li filed Critical Jia-Ling Li
Priority to TW94205449U priority Critical patent/TWM292783U/en
Publication of TWM292783U publication Critical patent/TWM292783U/en

Links

TW94205449U 2005-04-08 2005-04-08 Pellicle with absorption function TWM292783U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW94205449U TWM292783U (en) 2005-04-08 2005-04-08 Pellicle with absorption function

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW94205449U TWM292783U (en) 2005-04-08 2005-04-08 Pellicle with absorption function

Publications (1)

Publication Number Publication Date
TWM292783U true TWM292783U (en) 2006-06-21

Family

ID=37704033

Family Applications (1)

Application Number Title Priority Date Filing Date
TW94205449U TWM292783U (en) 2005-04-08 2005-04-08 Pellicle with absorption function

Country Status (1)

Country Link
TW (1) TWM292783U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9310673B2 (en) 2011-05-18 2016-04-12 Asahi Kasei E-Materials Corporation Pellicle, pressure-sensitive adhesive for pellicle, photomask with pellicle, and method for manufacturing semiconductor device
CN112305854A (en) * 2019-07-31 2021-02-02 台湾积体电路制造股份有限公司 Lithography apparatus, method for mounting photomask protective film, and wafer manufacturing method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9310673B2 (en) 2011-05-18 2016-04-12 Asahi Kasei E-Materials Corporation Pellicle, pressure-sensitive adhesive for pellicle, photomask with pellicle, and method for manufacturing semiconductor device
CN112305854A (en) * 2019-07-31 2021-02-02 台湾积体电路制造股份有限公司 Lithography apparatus, method for mounting photomask protective film, and wafer manufacturing method
US12253797B2 (en) 2019-07-31 2025-03-18 Taiwan Semiconductor Manufacturing Co., Ltd. Pellicle design for mask application

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Legal Events

Date Code Title Description
MM4K Annulment or lapse of a utility model due to non-payment of fees