TWI833179B - Nitriding treatment method for steel components - Google Patents
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- TWI833179B TWI833179B TW111109394A TW111109394A TWI833179B TW I833179 B TWI833179 B TW I833179B TW 111109394 A TW111109394 A TW 111109394A TW 111109394 A TW111109394 A TW 111109394A TW I833179 B TWI833179 B TW I833179B
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- 238000005121 nitriding Methods 0.000 title claims abstract description 578
- 229910000831 Steel Inorganic materials 0.000 title claims abstract description 50
- 238000000034 method Methods 0.000 title claims abstract description 50
- 239000010959 steel Substances 0.000 title claims abstract description 50
- -1 nitride compound Chemical class 0.000 claims abstract description 14
- 239000002244 precipitate Substances 0.000 claims abstract description 3
- 239000007789 gas Substances 0.000 claims description 331
- 238000010438 heat treatment Methods 0.000 claims description 93
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 8
- 230000008569 process Effects 0.000 claims description 8
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- 238000005452 bending Methods 0.000 abstract description 14
- 238000005260 corrosion Methods 0.000 abstract description 14
- 230000007797 corrosion Effects 0.000 abstract description 14
- 230000000052 comparative effect Effects 0.000 description 48
- 238000012545 processing Methods 0.000 description 21
- 150000001875 compounds Chemical class 0.000 description 17
- 238000001816 cooling Methods 0.000 description 17
- 238000010586 diagram Methods 0.000 description 11
- 238000001556 precipitation Methods 0.000 description 10
- 238000004821 distillation Methods 0.000 description 8
- 230000003247 decreasing effect Effects 0.000 description 7
- 239000002436 steel type Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 238000012546 transfer Methods 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 238000005255 carburizing Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 229910001566 austenite Inorganic materials 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000005256 carbonitriding Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 229910001337 iron nitride Inorganic materials 0.000 description 2
- 229910000851 Alloy steel Inorganic materials 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- YYXHRUSBEPGBCD-UHFFFAOYSA-N azanylidyneiron Chemical compound [N].[Fe] YYXHRUSBEPGBCD-UHFFFAOYSA-N 0.000 description 1
- 239000010962 carbon steel Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910017464 nitrogen compound Inorganic materials 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000010407 vacuum cleaning Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
- C23C8/24—Nitriding
- C23C8/26—Nitriding of ferrous surfaces
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- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
- C21D1/06—Surface hardening
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
- C21D1/74—Methods of treatment in inert gas, controlled atmosphere, vacuum or pulverulent material
- C21D1/76—Adjusting the composition of the atmosphere
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D9/00—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor
- C21D9/32—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor for gear wheels, worm wheels, or the like
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/34—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases more than one element being applied in more than one step
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/80—After-treatment
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
Abstract
本發明之課題在於提供一種氮化處理方法,其於在500℃~590℃之溫度範圍內實施之氮化處理中,能夠使γ'相良好地析出於氮化化合物層,進而能夠實現較高之耐點蝕性及彎曲疲勞強度。 本發明係一種具備至少3個階段之氮化處理步驟之鋼構件之氮化處理方法,第1氮化處理步驟至第3氮化處理步驟於500℃~590℃之溫度下實施。第1氮化處理步驟之第1氮化勢為0.10~1.00之範圍內之值,第2氮化處理步驟之第2氮化勢高於第1氮化勢,且為0.30~10.00之範圍內之值,第3氮化處理步驟之第3氮化勢低於第2氮化勢,且為0.26~0.60之範圍內之值。 The object of the present invention is to provide a nitriding treatment method that can successfully precipitate the γ' phase in the nitride compound layer during the nitriding treatment carried out in the temperature range of 500°C to 590°C, thereby achieving higher Pitting corrosion resistance and bending fatigue strength. The present invention is a nitriding treatment method for steel components with at least three nitriding treatment steps. The first to third nitriding treatment steps are carried out at a temperature of 500°C to 590°C. The first nitriding potential in the first nitriding step is a value in the range of 0.10 to 1.00, and the second nitriding potential in the second nitriding step is higher than the first nitriding potential and is in the range of 0.30 to 10.00. The value of , the third nitriding potential of the third nitriding treatment step is lower than the second nitriding potential, and is a value in the range of 0.26 to 0.60.
Description
本發明係關於一種具備至少3個階段之氮化處理步驟之鋼構件之氮化處理方法。The present invention relates to a nitriding treatment method for steel components having at least three stages of nitriding treatment steps.
對汽車用變速機所使用之齒輪等鋼構件要求較高之耐點蝕性及彎曲疲勞強度。為響應此種要求,作為強化齒輪等鋼構件之方法,已知有滲碳處理或氮化處理。Steel components such as gears used in automobile transmissions require high pitting corrosion resistance and bending fatigue strength. In response to such demands, carburizing treatment or nitriding treatment is known as a method of strengthening steel members such as gears.
例如,專利文獻1中揭示有:為提昇鋼構件之耐點蝕性或彎曲疲勞強度,藉由氮化處理而於鋼構件之表面生成以γ'相為主成分之鐵氮化合物層較為有效。For example, Patent Document 1 discloses that in order to improve the pitting corrosion resistance or bending fatigue strength of steel members, it is effective to form an iron-nitrogen compound layer containing the γ' phase as the main component on the surface of the steel member through nitriding treatment.
又,專利文獻2中揭示有一種生成較高γ'比率(0.7以上)之氮化化合物層之氮化處理方法。具體而言,記載有一種使用NH 3氣體及AX氣體這兩種氣體於570℃~600℃之溫度下所實施之3個階段之氣體氮化處理。更具體而言,於570℃~600℃之溫度下,第1氮化處理步驟中之氮化勢採用0.1~0.25,第2氮化處理步驟中之氮化勢採用1.0~2.0,第3氮化處理步驟中之氮化勢採用0.25。 [先前技術文獻] [專利文獻] Furthermore, Patent Document 2 discloses a nitriding treatment method for forming a nitride compound layer with a high γ' ratio (0.7 or more). Specifically, a three-stage gas nitriding process using two gases, NH 3 gas and AX gas, at a temperature of 570° C. to 600° C. is described. More specifically, at a temperature of 570°C to 600°C, the nitriding potential in the first nitriding step is 0.1 to 0.25, the nitriding potential in the second nitriding step is 1.0 to 2.0, and the nitriding potential in the third nitriding step is 1.0 to 2.0. The nitridation potential in the chemical treatment step is 0.25. [Prior art documents] [Patent documents]
[專利文獻1]日本專利特願2012-095035號公報 [專利文獻2]日本專利第6755106號公報 [Patent Document 1] Japanese Patent Application No. 2012-095035 [Patent Document 2] Japanese Patent No. 6755106
[發明所欲解決之問題][The problem that the invention aims to solve]
本案發明者於對專利文獻2所揭示之氮化處理方法進行反覆深入研究中發現:於500℃~590℃之溫度範圍內,使第3氮化處理步驟中之氮化勢大於0.25者使γ'相析出於氮化化合物層之效果較高。The inventor of this case conducted repeated and in-depth research on the nitriding treatment method disclosed in Patent Document 2 and found that in the temperature range of 500°C to 590°C, making the nitriding potential in the third nitriding step greater than 0.25 makes γ 'The effect of phase precipitation in the nitride compound layer is high.
根據本案發明者,γ'相析出於氮化化合物層之作用(反應)受氮化勢及爐內溫度兩者之影響,於500℃~590℃之溫度範圍內,若將第3氮化處理步驟中之氮化勢設為0.25以下,則有亦析出硬度低於γ'相之α相,從而耐點蝕性或彎曲疲勞強度不足之情形。According to the inventor of this case, the effect (reaction) of γ' phase precipitation in the nitrided compound layer is affected by both the nitriding potential and the temperature in the furnace. In the temperature range of 500°C to 590°C, if the third nitriding treatment is If the nitriding potential in the step is set to 0.25 or less, an α phase with a lower hardness than the γ' phase may also precipitate, resulting in insufficient pitting corrosion resistance or bending fatigue strength.
本發明係基於以上見解而發明者。本發明之目的在於提供一種氮化處理方法,其於在500℃~590℃之溫度範圍內實施之氮化處理中,能夠使γ'相良好地析出於氮化化合物層,進而能夠實現較高之耐點蝕性及彎曲疲勞強度。 [解決問題之技術手段] The present invention was invented based on the above findings. The object of the present invention is to provide a nitriding treatment method, which can enable the γ' phase to be well precipitated in the nitride compound layer during the nitriding treatment carried out in the temperature range of 500°C to 590°C, thereby achieving higher Pitting corrosion resistance and bending fatigue strength. [Technical means to solve problems]
本發明係一種氮化處理方法,其特徵在於: 其係具備至少3個階段之氮化處理步驟之鋼構件之氮化處理方法,具備: 第1氮化處理步驟,其係於第1氮化勢之氮化氣體氛圍中對鋼構件進行氮化處理; 第2氮化處理步驟,其係於上述第1氮化處理步驟之後,於高於上述第1氮化勢之第2氮化勢之氮化氣體氛圍中對上述鋼構件進一步進行氮化處理;及 第3氮化處理步驟,其係於上述第2氮化處理步驟之後,於低於上述第2氮化勢之第3氮化勢之氮化氣體氛圍中對上述鋼構件進一步進行氮化處理; 上述第1氮化處理步驟於500℃~590℃之溫度下實施, 上述第2氮化處理步驟亦於500℃~590℃之溫度下實施, 上述第3氮化處理步驟亦於500℃~590℃之溫度下實施, 上述第1氮化勢為0.10~1.00之範圍內之值, 上述第2氮化勢為0.30~10.00之範圍內之值, 上述第3氮化勢為0.26~0.60之範圍內之值, 於上述第2氮化處理步驟中,生成γ'相、ε相、或γ'相與ε相混合存在之氮化化合物層,且 於上述第3氮化處理步驟中,γ'相析出於上述氮化化合物層。 The invention is a nitriding treatment method, which is characterized by: It is a nitriding treatment method for steel components with at least three stages of nitriding treatment steps, including: The first nitriding treatment step involves nitriding the steel component in a nitriding gas atmosphere of the first nitriding potential; a second nitriding treatment step, which is to further nitriding the steel member in a nitriding gas atmosphere with a second nitriding potential higher than the first nitriding potential after the above-mentioned first nitriding step; and a third nitriding step, which is to further nitriding the steel member in a nitriding gas atmosphere with a third nitriding potential lower than the second nitriding potential after the above-mentioned second nitriding step; The above-mentioned first nitriding step is carried out at a temperature of 500°C to 590°C. The above-mentioned second nitriding step is also carried out at a temperature of 500°C to 590°C. The above-mentioned third nitriding step is also carried out at a temperature of 500°C to 590°C. The above-mentioned first nitriding potential is a value in the range of 0.10 to 1.00, The above-mentioned second nitriding potential is a value in the range of 0.30 to 10.00, The above third nitriding potential is a value in the range of 0.26 to 0.60, In the above second nitriding step, a nitrided compound layer in which the γ' phase, the ε phase, or the γ' phase and the ε phase are mixed is generated, and In the above-mentioned third nitriding treatment step, the γ′ phase is precipitated in the above-mentioned nitride compound layer.
根據本發明,於在500℃~590℃之溫度下實施之第3氮化處理步驟中,藉由將第3氮化勢設為0.26~0.60之範圍內之值,能夠抑制硬度低於γ'相之α相之析出,從而使γ'相良好地析出於氮化化合物層,能夠實現較高之耐點蝕性及彎曲疲勞強度。According to the present invention, in the third nitriding step performed at a temperature of 500°C to 590°C, by setting the third nitriding potential to a value in the range of 0.26 to 0.60, the hardness can be suppressed from being lower than γ' The precipitation of the α phase allows the γ' phase to be well precipitated in the nitride compound layer, which can achieve higher pitting corrosion resistance and bending fatigue strength.
於本發明中,上述第1氮化處理步驟、第2氮化處理步驟及上述第3氮化處理步驟例如於同一分批型熱處理爐內按順序實施, 於上述第1氮化處理步驟中,使用NH 3氣體及AX氣體這兩種氣體,將其等之總流量設為固定並一面改變其等各自之導入量,藉此進行控制以使該第1氮化處理步驟中之氮化勢成為上述第1氮化勢, 於上述第2氮化處理步驟中,使用NH 3氣體、AX氣體及N 2氣體這3種氣體,將其等之總流量設為固定並一面改變NH 3氣體及AX氣體各自之導入量,藉此進行控制以使該第2氮化處理步驟中之氮化勢成為上述第2氮化勢, 於上述第3氮化處理步驟中,使用NH 3氣體及AX氣體這兩種氣體,將其等之總流量設為固定並一面改變其等各自之導入量,藉此進行控制以使該第3氮化處理步驟中之氮化勢成為上述第3氮化勢。 In the present invention, the above-mentioned first nitriding step, the second nitriding step and the above-mentioned third nitriding step are performed sequentially in the same batch-type heat treatment furnace, for example. In the above-mentioned first nitriding step, Two gases, NH 3 gas and AX gas, are used, and the total flow rate of them is fixed while changing the introduction amount of each of them, thereby controlling so that the nitriding potential in the first nitriding step becomes In the above-mentioned first nitriding process, in the above-mentioned second nitriding treatment step, three gases, namely NH 3 gas, AX gas and N 2 gas, are used, and the total flow rate of the gases is fixed while changing the NH 3 gas and AX gas. The introduction amount of each gas is controlled so that the nitriding potential in the second nitriding step becomes the above-mentioned second nitriding potential. In the above-mentioned third nitriding step, NH 3 gas and AX gas are used. The two gases are controlled so that the nitriding potential in the third nitriding treatment step becomes the third nitriding potential by setting the total flow rate of the two gases to be fixed and changing the introduction amounts of the respective gases.
於此種控制形態中,第1氮化處理步驟於500℃~590℃之溫度下實施,第2氮化處理步驟亦於500℃~590℃之溫度下實施,第3氮化處理步驟亦於500℃~590℃之溫度下實施,第1氮化勢為0.10~1.00之範圍內之值,第2氮化勢高於第1氮化勢,為0.30~10.00之範圍內之值,第3氮化勢低於第2氮化勢,為0.26~0.60之範圍內之值,以此為特徵之本發明之有效性得到證實。In this control mode, the first nitriding step is carried out at a temperature of 500°C to 590°C, the second nitriding step is also carried out at a temperature of 500°C to 590°C, and the third nitriding step is also carried out at a temperature of 500°C to 590°C. When implemented at a temperature of 500°C to 590°C, the first nitriding potential is in the range of 0.10 to 1.00, the second nitriding potential is higher than the first nitriding potential, and is in the range of 0.30 to 10.00, and the third The nitriding potential is lower than the second nitriding potential and is a value in the range of 0.26 to 0.60. The effectiveness of the present invention characterized by this was confirmed.
或者,於本發明中,上述第1氮化處理步驟、第2氮化處理步驟及上述第3氮化處理步驟例如於同一單室型熱處理爐內按順序實施, 於上述第1氮化處理步驟中,使用NH 3氣體及AX氣體這兩種氣體,將其等之總流量設為固定並一面改變其等各自之導入量,藉此進行控制以使該第1氮化處理步驟中之氮化勢成為上述第1氮化勢, 於上述第2氮化處理步驟中,使用NH 3氣體、AX氣體及N 2氣體這3種氣體,將其等之總流量設為固定並一面改變NH 3氣體及AX氣體各自之導入量,藉此進行控制以使該第2氮化處理步驟中之氮化勢成為上述第2氮化勢, 於上述第3氮化處理步驟中,使用NH 3氣體及AX氣體這兩種氣體,將其等之總流量設為固定並一面改變其等各自之導入量,藉此進行控制以使該第3氮化處理步驟中之氮化勢成為上述第3氮化勢。 Alternatively, in the present invention, the above-mentioned first nitriding step, the second nitriding step and the above-mentioned third nitriding step are performed sequentially in the same single-chamber heat treatment furnace, for example, in the above-mentioned first nitriding step In this method, two gases, NH 3 gas and AX gas, are used, and the total flow rate of the gases is fixed while changing the respective introduction amounts thereof, thereby controlling the nitriding in the first nitriding treatment step. The potential becomes the above-mentioned first nitriding potential. In the above-mentioned second nitriding treatment step, three gases, namely NH 3 gas, AX gas and N 2 gas, are used, and the total flow rate of them is fixed while changing the NH 3 gas. and AX gas, thereby controlling the nitriding potential in the second nitriding step to become the above-mentioned second nitriding potential. In the above-mentioned third nitriding step, NH 3 gas and AX are used These two gases are controlled so that the nitriding potential in the third nitriding treatment step becomes the above-mentioned third nitriding potential by setting the total flow rate of the two gases to be fixed and changing the introduction amounts of the respective gases. .
於此種控制形態中,同樣地,第1氮化處理步驟於500℃~590℃之溫度下實施,第2氮化處理步驟亦於500℃~590℃之溫度下實施,第3氮化處理步驟亦於500℃~590℃之溫度下實施,第1氮化勢為0.10~1.00之範圍內之值,第2氮化勢高於第1氮化勢,為0.30~10.00之範圍內之值,第3氮化勢低於第2氮化勢,為0.26~0.60之範圍內之值,以此為特徵之本發明之有效性得到證實。In this control mode, similarly, the first nitriding step is carried out at a temperature of 500°C to 590°C, the second nitriding step is also carried out at a temperature of 500°C to 590°C, and the third nitriding step is carried out at a temperature of 500°C to 590°C. The step is also carried out at a temperature of 500°C to 590°C. The first nitriding potential is a value in the range of 0.10 to 1.00. The second nitriding potential is higher than the first nitriding potential and is a value in the range of 0.30 to 10.00. , the third nitriding potential is lower than the second nitriding potential and is a value in the range of 0.26 to 0.60. The effectiveness of the present invention characterized by this is confirmed.
或者,於本發明中,上述第1氮化處理步驟、第2氮化處理步驟及上述第3氮化處理步驟例如於同一分批型熱處理爐內按順序實施, 於上述第1氮化處理步驟中,使用NH 3氣體及AX氣體這兩種氣體,將其等之總流量設為固定並一面改變其等各自之導入量,藉此進行控制以使該第1氮化處理步驟中之氮化勢成為上述第1氮化勢, 於上述第2氮化處理步驟中,亦使用NH 3氣體及AX氣體這兩種氣體,將其等之總流量設為固定並一面改變其等各自之導入量,藉此進行控制以使該第2氮化處理步驟中之氮化勢成為上述第2氮化勢, 於上述第3氮化處理步驟中,亦使用NH 3氣體及AX氣體這兩種氣體,將其等之總流量設為固定並一面改變其等各自之導入量,藉此進行控制以使該第3氮化處理步驟中之氮化勢成為上述第3氮化勢。 Alternatively, in the present invention, the above-mentioned first nitriding step, the second nitriding step and the above-mentioned third nitriding step are performed sequentially in the same batch-type heat treatment furnace, for example, in the above-mentioned first nitriding step In this method, two gases, NH 3 gas and AX gas, are used, and the total flow rate of the gases is fixed while changing the respective introduction amounts thereof, thereby controlling the nitriding in the first nitriding treatment step. The potential becomes the above-mentioned first nitriding potential. In the above-mentioned second nitriding treatment step, two gases, NH 3 gas and AX gas, are also used. The total flow rate of them is fixed and the respective introduction amounts of them are changed. , thereby controlling the nitriding potential in the second nitriding step to become the above-mentioned second nitriding potential. In the above-mentioned third nitriding step, two gases, NH 3 gas and AX gas, are also used, The total flow rate is fixed and the respective introduction amounts are changed, thereby controlling the nitriding potential in the third nitriding treatment step to become the third nitriding potential.
於此種控制形態中,同樣地,第1氮化處理步驟於500℃~590℃之溫度下實施,第2氮化處理步驟亦於500℃~590℃之溫度下實施,第3氮化處理步驟亦於500℃~590℃之溫度下實施,第1氮化勢為0.10~1.00之範圍內之值,第2氮化勢高於第1氮化勢,為0.30~10.00之範圍內之值,第3氮化勢低於第2氮化勢,為0.26~0.60之範圍內之值,以此為特徵之本發明之有效性得到證實。In this control mode, similarly, the first nitriding step is carried out at a temperature of 500°C to 590°C, the second nitriding step is also carried out at a temperature of 500°C to 590°C, and the third nitriding step is carried out at a temperature of 500°C to 590°C. The step is also carried out at a temperature of 500°C to 590°C. The first nitriding potential is a value in the range of 0.10 to 1.00. The second nitriding potential is higher than the first nitriding potential and is a value in the range of 0.30 to 10.00. , the third nitriding potential is lower than the second nitriding potential and is a value in the range of 0.26 to 0.60. The effectiveness of the present invention characterized by this is confirmed.
或者,於本發明中,上述第1氮化處理步驟、第2氮化處理步驟及上述第3氮化處理步驟例如於同一單室型熱處理爐內按順序實施, 於上述第1氮化處理步驟中,使用NH 3氣體及AX氣體這兩種氣體,將其等之總流量設為固定並一面改變其等各自之導入量,藉此進行控制以使該第1氮化處理步驟中之氮化勢成為上述第1氮化勢, 於上述第2氮化處理步驟中,亦使用NH 3氣體及AX氣體這兩種氣體,將其等之總流量設為固定並一面改變其等各自之導入量,藉此進行控制以使該第2氮化處理步驟中之氮化勢成為上述第2氮化勢, 於上述第3氮化處理步驟中,亦使用NH 3氣體及AX氣體這兩種氣體,將其等之總流量設為固定並一面改變其等各自之導入量,藉此進行控制以使該第3氮化處理步驟中之氮化勢成為上述第3氮化勢。 Alternatively, in the present invention, the above-mentioned first nitriding step, the second nitriding step and the above-mentioned third nitriding step are performed sequentially in the same single-chamber heat treatment furnace, for example, in the above-mentioned first nitriding step In this method, two gases, NH 3 gas and AX gas, are used, and the total flow rate of the gases is fixed while changing the respective introduction amounts thereof, thereby controlling the nitriding in the first nitriding treatment step. The potential becomes the above-mentioned first nitriding potential. In the above-mentioned second nitriding treatment step, two gases, NH 3 gas and AX gas, are also used. The total flow rate of them is fixed and the respective introduction amounts of them are changed. , thereby controlling the nitriding potential in the second nitriding step to become the above-mentioned second nitriding potential. In the above-mentioned third nitriding step, two gases, NH 3 gas and AX gas, are also used, The total flow rate is fixed and the respective introduction amounts are changed, thereby controlling the nitriding potential in the third nitriding treatment step to become the third nitriding potential.
於此種控制形態中,同樣地,第1氮化處理步驟於500℃~590℃之溫度下實施,第2氮化處理步驟亦於500℃~590℃之溫度下實施,第3氮化處理步驟亦於500℃~590℃之溫度下實施,第1氮化勢為0.10~1.00之範圍內之值,第2氮化勢高於第1氮化勢,為0.30~10.00之範圍內之值,第3氮化勢低於第2氮化勢,為0.26~0.60之範圍內之值,以此為特徵之本發明之有效性得到證實。In this control mode, similarly, the first nitriding step is carried out at a temperature of 500°C to 590°C, the second nitriding step is also carried out at a temperature of 500°C to 590°C, and the third nitriding step is carried out at a temperature of 500°C to 590°C. The step is also carried out at a temperature of 500°C to 590°C. The first nitriding potential is a value in the range of 0.10 to 1.00. The second nitriding potential is higher than the first nitriding potential and is a value in the range of 0.30 to 10.00. , the third nitriding potential is lower than the second nitriding potential and is a value in the range of 0.26 to 0.60. The effectiveness of the present invention characterized by this is confirmed.
或者,於本發明中,上述第1氮化處理步驟、第2氮化處理步驟及上述第3氮化處理步驟例如於同一單室型熱處理爐內按順序實施, 於上述第1氮化處理步驟中,使用NH 3氣體及AX氣體這兩種氣體,將其等之一之導入量設為固定並一面改變另一者之導入量,藉此進行控制以使該第1氮化處理步驟中之氮化勢成為上述第1氮化勢, 於上述第2氮化處理步驟中,亦使用NH 3氣體及AX氣體這兩種氣體,將其等之一之導入量設為固定並一面改變另一者之導入量,藉此進行控制以使該第2氮化處理步驟中之氮化勢成為上述第2氮化勢, 於上述第3氮化處理步驟中,亦使用NH 3氣體及AX氣體這兩種氣體,將其等之一之導入量設為固定並一面改變另一者之導入量,藉此進行控制以使該第3氮化處理步驟中之氮化勢成為上述第3氮化勢。 Alternatively, in the present invention, the above-mentioned first nitriding step, the second nitriding step and the above-mentioned third nitriding step are performed sequentially in the same single-chamber heat treatment furnace, for example, in the above-mentioned first nitriding step In this method, two gases, NH 3 gas and AX gas, are used, and the amount of introduction of one of them is fixed while changing the amount of introduction of the other, thereby controlling so that the amount of introduction in the first nitriding treatment step is The nitriding potential becomes the above-mentioned first nitriding potential. In the above-mentioned second nitriding treatment step, two gases, NH 3 gas and AX gas, are also used. The amount of introduction of one of them is fixed while changing the amount of the other. The introduction amount of the gas is controlled so that the nitriding potential in the second nitriding step becomes the above-mentioned second nitriding potential. In the above-mentioned third nitriding step, NH 3 gas and AX gas are also used. The two gases are controlled so that the nitriding potential in the third nitriding treatment step becomes the above-mentioned third nitriding potential by setting the introduction amount of one of them to be fixed and changing the introduction amount of the other. .
於此種控制形態中,同樣地,第1氮化處理步驟於500℃~590℃之溫度下實施,第2氮化處理步驟亦於500℃~590℃之溫度下實施,第3氮化處理步驟亦於500℃~590℃之溫度下實施,第1氮化勢為0.10~1.00之範圍內之值,第2氮化勢高於第1氮化勢,為0.30~10.00之範圍內之值,第3氮化勢低於第2氮化勢,為0.26~0.60之範圍內之值,以此為特徵之本發明之有效性得到證實。In this control mode, similarly, the first nitriding step is carried out at a temperature of 500°C to 590°C, the second nitriding step is also carried out at a temperature of 500°C to 590°C, and the third nitriding step is carried out at a temperature of 500°C to 590°C. The step is also carried out at a temperature of 500°C to 590°C. The first nitriding potential is a value in the range of 0.10 to 1.00. The second nitriding potential is higher than the first nitriding potential and is a value in the range of 0.30 to 10.00. , the third nitriding potential is lower than the second nitriding potential and is a value in the range of 0.26 to 0.60. The effectiveness of the present invention characterized by this is confirmed.
或者,於本發明中,上述第1氮化處理步驟、第2氮化處理步驟及上述第3氮化處理步驟例如於同一單室型熱處理爐內按順序實施, 於上述第1氮化處理步驟中,使用NH 3氣體及AX氣體這兩種氣體,將NH 3氣體及AX氣體之一之導入量設為固定並一面改變另一者之導入量,藉此進行控制以使該第1氮化處理步驟中之氮化勢成為上述第1氮化勢, 於上述第2氮化處理步驟中,使用NH 3氣體、AX氣體及N 2氣體這3種氣體,將NH 3氣體及AX氣體之一之導入量設為固定並一面改變另一者之導入量,藉此進行控制以使該第2氮化處理步驟中之氮化勢成為上述第2氮化勢, 於上述第3氮化處理步驟中,使用NH 3氣體及AX氣體這兩種氣體,將NH 3氣體及AX氣體之一之導入量設為固定並一面改變另一者之導入量,藉此進行控制以使該第3氮化處理步驟中之氮化勢成為上述第3氮化勢。 Alternatively, in the present invention, the above-mentioned first nitriding step, the second nitriding step and the above-mentioned third nitriding step are performed sequentially in the same single-chamber heat treatment furnace, for example, in the above-mentioned first nitriding step In this method, two gases, NH 3 gas and AX gas, are used, and the introduction amount of one of the NH 3 gas and AX gas is fixed while changing the introduction amount of the other, thereby controlling so that the first nitriding The nitriding potential in the treatment step becomes the first nitriding potential. In the second nitriding treatment step, three gases, namely NH 3 gas, AX gas and N 2 gas, are used. One of the NH 3 gas and the AX gas is The amount of introduction of one is fixed and the amount of introduction of the other is changed while controlling it so that the nitriding potential in the second nitriding step becomes the above-mentioned second nitriding potential, and in the above-mentioned third nitriding step In this method, two gases, NH 3 gas and AX gas, are used, and the amount of introduction of one of NH 3 gas and AX gas is fixed while changing the amount of introduction of the other, thereby controlling so that the third nitriding The nitriding potential in the processing step becomes the above-mentioned third nitriding potential.
於此種控制形態中,同樣地,第1氮化處理步驟於500℃~590℃之溫度下實施,第2氮化處理步驟亦於500℃~590℃之溫度下實施,第3氮化處理步驟亦於500℃~590℃之溫度下實施,第1氮化勢為0.10~1.00之範圍內之值,第2氮化勢高於第1氮化勢,為0.30~10.00之範圍內之值,第3氮化勢低於第2氮化勢,為0.26~0.60之範圍內之值,以此為特徵之本發明之有效性得到證實。In this control mode, similarly, the first nitriding step is carried out at a temperature of 500°C to 590°C, the second nitriding step is also carried out at a temperature of 500°C to 590°C, and the third nitriding step is carried out at a temperature of 500°C to 590°C. The step is also carried out at a temperature of 500°C to 590°C. The first nitriding potential is a value in the range of 0.10 to 1.00. The second nitriding potential is higher than the first nitriding potential and is a value in the range of 0.30 to 10.00. , the third nitriding potential is lower than the second nitriding potential and is a value in the range of 0.26 to 0.60. The effectiveness of the present invention characterized by this is confirmed.
再者,所謂單室型熱處理爐係不具備如分批型熱處理爐(參照圖1)般與加熱室不同之冷卻室,僅於1室內進行加熱及冷卻之熱處理爐,一般為坑式爐(參照圖3)或橫置式爐(參照圖5)。Furthermore, the so-called single-chamber heat treatment furnace does not have a cooling chamber that is different from the heating chamber like the batch-type heat treatment furnace (see Figure 1). It only performs heating and cooling in one chamber. It is generally a pit furnace ( (Refer to Figure 3) or horizontal furnace (Refer to Figure 5).
又,於以上各發明中,上述第3氮化處理步驟之時間較佳為60分鐘以上。根據本案發明者之見解,藉由將第3氮化處理步驟之時間設為60分鐘以上,將充分達成伴隨氮化勢之變更之爐內氣體氛圍之轉換,且不會損害提高γ'率之效果。 [發明之效果] Furthermore, in each of the above inventions, the time of the third nitriding step is preferably 60 minutes or more. According to the inventor's opinion, by setting the time of the third nitriding step to more than 60 minutes, the conversion of the gas atmosphere in the furnace accompanying the change of the nitriding potential will be fully achieved without impairing the improvement of the γ' rate. Effect. [Effects of the invention]
根據本發明,於在500℃~590℃之溫度下實施之第3氮化處理步驟中,藉由將第3氮化勢設為0.26~0.60之範圍內之值,能夠抑制硬度低於γ'相之α相之析出,從而使γ'相良好地析出於氮化化合物層,能夠實現較高之耐點蝕性及彎曲疲勞強度。According to the present invention, in the third nitriding step performed at a temperature of 500°C to 590°C, by setting the third nitriding potential to a value in the range of 0.26 to 0.60, the hardness can be suppressed from being lower than γ' The precipitation of the α phase allows the γ' phase to be well precipitated in the nitride compound layer, which can achieve higher pitting corrosion resistance and bending fatigue strength.
[被處理體(工件)之例] 被處理體(工件)為鋼構件。具體而言,係自動變速機所使用之齒輪等包含機械構造用碳鋼鋼材或機械構造用合金鋼鋼材之鋼構件。例如,圓筒狀環齒輪或有底圓筒狀環齒輪於搭載於複數段治具上並平放於盒體(後述)內之狀態下進行氮化處理。 [Example of object to be processed (workpiece)] The object to be processed (workpiece) is a steel member. Specifically, they are steel members including carbon steel for mechanical structure or alloy steel for mechanical structure, such as gears used in automatic transmissions. For example, a cylindrical ring gear or a bottomed cylindrical ring gear is nitrided in a state where it is mounted on a plurality of jig and laid flat in a box (described later).
對於鋼構件,較佳為於氮化處理之前實施用以去除污垢或油之預洗。預洗例如較佳為藉由用烴系洗淨液使油等溶解置換並蒸發來進行脫脂乾燥之真空清洗,用鹼系洗淨液進行脫脂處理之鹼洗等。For steel members, it is preferable to perform pre-washing to remove dirt or oil before nitriding. For example, pre-washing is preferably vacuum cleaning in which oil and the like are dissolved, replaced, and evaporated using a hydrocarbon-based cleaning solution to perform degreasing and drying, and alkali washing in which degreasing treatment is performed using an alkali-based cleaning solution.
[分批型熱處理爐之構成例] 圖1係本發明之氮化處理方法所使用之分批型熱處理爐1之構成概略圖。 [Configuration example of batch type heat treatment furnace] Figure 1 is a schematic diagram of the structure of a batch-type heat treatment furnace 1 used in the nitriding treatment method of the present invention.
如圖1所示,分批型熱處理爐1具備搬入部10、加熱室11、搬送室12、及搬出輸送器13。搬入部10上放置有盒體20,該盒體20內收納有作為被處理體(工件)之鋼構件。處理重量最大總計700 kg。As shown in FIG. 1 , the batch-type heat treatment furnace 1 includes a carry-in part 10 , a heating chamber 11 , a transfer chamber 12 , and a carry-out conveyor 13 . A box 20 is placed on the loading part 10, and a steel member serving as an object to be processed (workpiece) is accommodated in the box 20. Handling weight up to 700 kg total.
加熱室11之入口側(圖1中左側)安裝有具有開閉自如之門21之入口罩22。加熱室11為蒸餾罐構造,藉由用加熱器(未圖示)加熱蒸餾罐外周部來將爐內溫度控制為特定溫度。並且,用於氮化處理之複數種氣體被以後述之方式控制並導入至加熱室11內。An entrance cover 22 having an openable and closable door 21 is installed on the entrance side of the heating chamber 11 (left side in FIG. 1 ). The heating chamber 11 has a retort structure, and the furnace temperature is controlled to a specific temperature by heating the outer peripheral portion of the retort with a heater (not shown). Furthermore, a plurality of gases used for the nitriding process are controlled in a manner described below and introduced into the heating chamber 11 .
又,加熱室11之天花板上安裝有風扇26,其攪拌導入至加熱室11內之氣體,使鋼構件之加熱溫度均一化。並且,加熱室11之出口側(圖1中右側)安裝有開閉自如之中間門27。In addition, a fan 26 is installed on the ceiling of the heating chamber 11 to stir the gas introduced into the heating chamber 11 to uniformize the heating temperature of the steel member. Furthermore, a freely openable and closable intermediate door 27 is installed on the exit side of the heating chamber 11 (right side in FIG. 1 ).
搬送室12中設置有使收納有鋼構件之盒體20升降之升降機30。搬送室12之下部設置有儲存冷卻用油31之冷卻室(油槽)32。並且,於搬送室12之出口側(圖1中右側)安裝有具有開閉自如之門35之出口罩36。The transfer chamber 12 is provided with an elevator 30 for raising and lowering the box 20 housing the steel members. A cooling chamber (oil tank) 32 for storing cooling oil 31 is provided in the lower part of the transfer chamber 12 . Furthermore, an exit cover 36 having an openable and closable door 35 is installed on the exit side of the transfer chamber 12 (right side in FIG. 1 ).
再者,可採用將加熱室11及搬送室12設為同一空間之處理室,並藉由氣體來對熱處理後之鋼構件進行氣冷之構成。又,亦可將加熱室11分為2或3個,於2或3個加熱室中進行後述3個階段之氮化處理步驟。Furthermore, the heating chamber 11 and the transfer chamber 12 may be configured as a treatment chamber in the same space, and the steel member after heat treatment may be air-cooled with gas. Alternatively, the heating chamber 11 may be divided into two or three heating chambers, and the three-stage nitriding process described below may be performed in the two or three heating chambers.
[分批型熱處理爐之動作例] 於如上所述之構成之熱處理爐1中,利用推進器等將收納有鋼構件之盒體20自搬入部10搬入至加熱室11內。並且,於鋼構件(收納有其之盒體20)被搬入至加熱室11內之後,向加熱室11內導入處理氣體,用加熱器將該處理氣體加熱至特定溫度,進而一面用風扇26(例如以1500 rpm旋轉)進行攪拌,一面進行搬入至加熱室11內之鋼構件之氮化處理。 [Operation example of batch type heat treatment furnace] In the heat treatment furnace 1 configured as described above, the box 20 accommodating the steel member is carried into the heating chamber 11 from the carrying part 10 using a propeller or the like. Then, after the steel member (the box 20 containing it) is carried into the heating chamber 11, the processing gas is introduced into the heating chamber 11, and the processing gas is heated to a specific temperature with a heater, while the fan 26 ( For example, rotating at 1500 rpm) while stirring, the steel member carried into the heating chamber 11 is nitrided.
圖2係使用圖1之熱處理爐1之本發明之氮化處理方法之一實施方式之步驟圖。FIG. 2 is a step diagram of one embodiment of the nitriding treatment method of the present invention using the heat treatment furnace 1 of FIG. 1 .
於圖2之例中,於裝入鋼構件(工件)之前,將加熱室11內預先加熱至550℃。又,於該加熱步驟時,以70(L/min)之固定流量導入N 2氣體,且以90(L/min)之固定流量導入NH 3氣體。總流量為70+90=160(L/min)。 In the example of FIG. 2 , before installing the steel member (workpiece), the heating chamber 11 is preheated to 550°C. Moreover, during this heating step, N 2 gas was introduced at a fixed flow rate of 70 (L/min), and NH 3 gas was introduced at a fixed flow rate of 90 (L/min). The total flow rate is 70+90=160(L/min).
繼而,將鋼構件(工件)裝入加熱室11內。此時,打開門21,藉此如圖2所示,加熱室11內之溫度暫時降低。其後,關閉門21,將加熱室11內之溫度再次加熱至550℃。Next, the steel member (workpiece) is loaded into the heating chamber 11 . At this time, the door 21 is opened, thereby temporarily lowering the temperature in the heating chamber 11 as shown in FIG. 2 . Thereafter, the door 21 is closed, and the temperature in the heating chamber 11 is heated to 550°C again.
於此種鋼構件裝入中,於圖2之例中,以160(L/min)之固定流量導入NH 3氣體。總流量亦為160(L/min)。 In the installation of such steel members, in the example of Figure 2, NH 3 gas is introduced at a fixed flow rate of 160 (L/min). The total flow rate is also 160 (L/min).
其後,實施3個階段之氮化處理步驟(後述實施例1-7)。具體而言,首先,例如採用0.30(0.10~1.00)之值作為第1氮化勢,於550℃之溫度下實施第1氮化處理步驟。Thereafter, a three-stage nitriding treatment step was performed (Examples 1-7 to be described later). Specifically, first, for example, a value of 0.30 (0.10 to 1.00) is used as the first nitriding potential, and the first nitriding step is performed at a temperature of 550°C.
已知氮化勢K N係利用NH 3氣體之分壓P(NH 3)及H 2氣體之分壓P(H 2),以下式表示。 K N=P(NH 3)/P(H 2) 3/2 It is known that the nitriding potential K N is expressed by the following formula using the partial pressure P(NH 3 ) of the NH 3 gas and the partial pressure P(H 2 ) of the H 2 gas. K N =P(NH 3 )/P(H 2 ) 3/2
於第1氮化處理步驟中以如下方式對處理氣體之導入量進行反饋控制:測定加熱室11內之NH 3氣體之分壓P(NH 3)或H 2氣體之分壓P(H 2),使根據該測定值所運算之氮化勢之值處於目標之第1氮化勢之附近範圍內。 In the first nitriding step, the introduction amount of the processing gas is feedback controlled in the following manner: the partial pressure P (NH 3 ) of the NH 3 gas or the partial pressure P (H 2 ) of the H 2 gas in the heating chamber 11 is measured. , so that the value of the nitriding potential calculated based on the measured value is within the vicinity of the target first nitriding potential.
於圖2之例中,利用導熱度式H 2感測器(未圖示)測定加熱室11內之H 2氣體之分壓P(H 2),一面線上分析該測定值(根據該測定值運算氮化勢)一面對處理氣體之導入量進行反饋控制。具體而言,對NH 3氣體及AX氣體於合計流量160(L/min)之條件下各自增減。 In the example of FIG. 2 , a thermal conductivity type H 2 sensor (not shown) is used to measure the partial pressure P (H 2 ) of the H 2 gas in the heating chamber 11, and the measured value is analyzed on a line (according to the measured value Calculate the nitriding potential) and perform feedback control on the introduction amount of the processing gas. Specifically, the NH 3 gas and the AX gas were increased or decreased respectively under the condition that the total flow rate was 160 (L/min).
於圖2之例中,此種第1氮化處理步驟實施60分鐘。藉此,鋼構件表面不形成化合物層或不形成ε相主體之化合物層,故而減少不利於γ'相形成之表面碳量,另一方面,能夠使氮有效率地擴散至內部。In the example of Figure 2, this first nitriding step is performed for 60 minutes. Thereby, no compound layer or a compound layer that is the main body of the ε phase is formed on the surface of the steel component, thereby reducing the amount of surface carbon that is not conducive to the formation of the γ' phase. On the other hand, nitrogen can be efficiently diffused into the interior.
接著,例如採用2.00(0.30~10.00)之值作為第2氮化勢,於550℃之溫度下實施第2氮化處理步驟。Next, for example, a value of 2.00 (0.30-10.00) is used as the second nitriding potential, and the second nitriding step is performed at a temperature of 550°C.
於第2氮化處理步驟中亦以如下方式對處理氣體之導入量進行反饋控制:測定加熱室11內之NH 3氣體之分壓P(NH 3)或H 2氣體之分壓P(H 2),使根據該測定值所運算之氮化勢之值處於目標之第2氮化勢之附近範圍內。 In the second nitriding step, the introduction amount of the processing gas is also feedback controlled in the following manner: measuring the partial pressure P (NH 3 ) of the NH 3 gas or the partial pressure P (H 2 ) of the H 2 gas in the heating chamber 11 ), so that the value of the nitriding potential calculated based on the measured value is within the vicinity of the target second nitriding potential.
於圖2之例中,利用導熱度式H 2感測器(未圖示)測定加熱室11內之H 2氣體之分壓P(H 2),一面線上分析該測定值(根據該測定值運算氮化勢)一面對處理氣體之導入量進行反饋控制。具體而言,以70(L/min)之固定流量導入N 2氣體,另一方面,對NH 3氣體及AX氣體於合計流量90(L/min)之條件下各自增減。總流量維持於70+90=160(L/min)。 In the example of FIG. 2 , a thermal conductivity type H 2 sensor (not shown) is used to measure the partial pressure P (H 2 ) of the H 2 gas in the heating chamber 11, and the measured value is analyzed on a line (according to the measured value Calculate the nitriding potential) and perform feedback control on the introduction amount of the processing gas. Specifically, N 2 gas was introduced at a fixed flow rate of 70 (L/min), while NH 3 gas and AX gas were each increased or decreased under the condition of a total flow rate of 90 (L/min). The total flow rate is maintained at 70+90=160 (L/min).
於圖2之例中,此種第2氮化處理步驟實施200分鐘。藉此,於鋼構件生成γ'相、ε相、或γ'相與ε相混合存在之氮化化合物層。In the example of Figure 2, this second nitriding step is performed for 200 minutes. Thereby, a nitride compound layer in which the γ' phase, the ε phase, or the γ' phase and the ε phase are mixed is generated on the steel member.
接著,例如採用0.30(0.26~0.60)之值作為第3氮化勢,於550℃之溫度下實施第3氮化處理步驟。Next, for example, a value of 0.30 (0.26-0.60) is used as the third nitriding potential, and the third nitriding step is performed at a temperature of 550°C.
於第3氮化處理步驟中亦以如下方式對處理氣體之導入量進行反饋控制:測定加熱室11內之NH 3氣體之分壓P(NH 3)或H 2氣體之分壓P(H 2),使根據該測定值所運算之氮化勢之值處於目標之第3氮化勢之附近範圍內。 In the third nitriding step, the introduction amount of the processing gas is also feedback controlled in the following manner: measuring the partial pressure P (NH 3 ) of the NH 3 gas or the partial pressure P (H 2 ) of the H 2 gas in the heating chamber 11 ), so that the value of the nitriding potential calculated based on the measured value is within the vicinity of the target third nitriding potential.
於圖2之例中,利用導熱度式H 2感測器(未圖示)測定加熱室11內之H 2氣體之分壓P(H 2),一面線上分析該測定值(根據該測定值運算氮化勢)一面對處理氣體之導入量進行反饋控制。具體而言,對NH 3氣體及AX氣體於合計流量160(L/min)之條件下各自增減。 In the example of FIG. 2 , a thermal conductivity type H 2 sensor (not shown) is used to measure the partial pressure P (H 2 ) of the H 2 gas in the heating chamber 11, and the measured value is analyzed on a line (according to the measured value Calculate the nitriding potential) and perform feedback control on the introduction amount of the processing gas. Specifically, the NH 3 gas and the AX gas were increased or decreased respectively under the condition that the total flow rate was 160 (L/min).
於圖2之例中,此種第3氮化處理步驟實施60分鐘。藉此,將γ'相析出於氮化化合物層。In the example of Figure 2, this third nitriding step is performed for 60 minutes. Thereby, the γ' phase is precipitated in the nitride compound layer.
第3氮化處理步驟結束後,進行冷卻步驟。於圖2之例中,冷卻步驟進行15分鐘(帶攪拌機之油槽,於油中(100℃)保持15分鐘)。冷卻步驟結束後,將收納有鋼構件之盒體20搬出至搬出輸送器13。After the third nitriding step is completed, a cooling step is performed. In the example of Figure 2, the cooling step is carried out for 15 minutes (oil tank with stirrer, kept in oil (100°C) for 15 minutes). After the cooling step is completed, the box 20 containing the steel members is carried out to the unloading conveyor 13 .
[坑式熱處理爐之構成例] 圖3係本發明之氮化處理方法所使用之坑式熱處理爐201之構成概略圖。 [Configuration example of pit type heat treatment furnace] FIG. 3 is a schematic diagram of the structure of a pit heat treatment furnace 201 used in the nitriding treatment method of the present invention.
如圖3所示,坑式熱處理爐201具備有底筒狀之爐壁211及爐蓋212。As shown in FIG. 3 , the pit heat treatment furnace 201 includes a bottomed cylindrical furnace wall 211 and a furnace cover 212 .
爐蓋212之下側(內側)設置有風扇213,該風扇213之旋轉軸貫通爐蓋212,與設置於爐蓋212之上側(外側)之風扇馬達214連接。A fan 213 is provided on the lower side (inside) of the furnace cover 212. The rotating shaft of the fan 213 passes through the furnace cover 212 and is connected to the fan motor 214 provided on the upper side (outside) of the furnace cover 212.
爐壁211之內側設置有蒸餾罐221,該蒸餾罐221之更內側設置有氣體引導筒222。藉由用加熱器(未圖示)加熱蒸餾罐221之外周部來將爐內(蒸餾罐221內)之溫度控制為特定溫度。並且,氣體引導筒222內放置有盒體20,該盒體20內收納有作為被處理體(工件)之鋼構件。處理重量最大總計700 kg。A distillation tank 221 is provided inside the furnace wall 211, and a gas guide tube 222 is provided further inside the distillation tank 221. The temperature in the furnace (inside the distillation tank 221 ) is controlled to a specific temperature by heating the outer peripheral portion of the distillation tank 221 with a heater (not shown). Furthermore, a box body 20 is placed in the gas guide tube 222, and a steel member serving as a target object (workpiece) to be processed is accommodated in the box body 20. Handling weight up to 700 kg total.
又,用於氮化處理之複數種氣體一面被以後述之方式控制一面導入至蒸餾罐221內。進而,蒸餾罐221之外周部亦具有利用鼓風機(未圖示)進行冷卻之功能,冷卻時,藉由降低蒸餾罐221本身之溫度來冷卻爐內之工件(爐內冷卻)。In addition, a plurality of gases used for the nitriding process are introduced into the distillation tank 221 while being controlled in a manner described below. Furthermore, the outer peripheral portion of the retort 221 also has a cooling function using a blower (not shown). During cooling, the temperature of the retort 221 itself is lowered to cool the workpiece in the furnace (in-furnace cooling).
[坑式熱處理爐之動作例] 於如上所述之構成之熱處理爐201中,打開爐蓋212,將收納有鋼構件之盒體20搬入至氣體引導筒222內。並且,於鋼構件(收納有其之盒體20)被搬入至氣體引導筒222內之後,向蒸餾罐221內導入處理氣體,用加熱器將該處理氣體加熱至特定溫度,進而一面用風扇213(例如以1500 rpm旋轉)進行攪拌,一面進行搬入至氣體引導筒222內之鋼構件之氮化處理。 [Operation example of pit type heat treatment furnace] In the heat treatment furnace 201 configured as above, the furnace lid 212 is opened, and the box 20 housing the steel member is moved into the gas guide tube 222 . Then, after the steel member (the box 20 containing it) is carried into the gas guide tube 222, the processing gas is introduced into the distillation tank 221, and the processing gas is heated to a specific temperature with a heater, and the fan 213 is used to heat the processing gas. While stirring (for example, rotating at 1500 rpm), the steel member carried into the gas guide tube 222 is nitrided.
圖4係使用圖3之熱處理爐201之本發明之氮化處理方法之一實施方式之步驟圖。FIG. 4 is a step diagram of one embodiment of the nitriding treatment method of the present invention using the heat treatment furnace 201 of FIG. 3 .
於圖4之例中,於將鋼構件(工件)裝入氣體引導筒222內之後,將蒸餾罐221內加熱至550℃。於該加熱步驟之前半程,以40(L/min)之固定流量導入N 2氣體,於該加熱步驟之後半程,以40(L/min)之固定流量導入NH 3氣體。 In the example of FIG. 4 , after the steel member (workpiece) is installed into the gas guide tube 222 , the inside of the distillation tank 221 is heated to 550°C. In the first half of the heating step, N 2 gas was introduced at a fixed flow rate of 40 (L/min), and in the second half of the heating step, NH 3 gas was introduced at a fixed flow rate of 40 (L/min).
其後,實施3個階段之氮化處理步驟(後述實施例5-7)。具體而言,首先,例如採用0.30(0.10~1.00)之值作為第1氮化勢,於550℃之溫度下實施第1氮化處理步驟。Thereafter, a three-stage nitriding treatment step was performed (Examples 5-7 to be described later). Specifically, first, for example, a value of 0.30 (0.10 to 1.00) is used as the first nitriding potential, and the first nitriding step is performed at a temperature of 550°C.
如上所述,已知氮化勢K N係利用NH 3氣體之分壓P(NH 3)及H 2氣體之分壓P(H 2),以下式表示。 K N=P(NH 3)/P(H 2) 3/2 As mentioned above, it is known that the nitriding potential K N is expressed by the following formula using the partial pressure P(NH 3 ) of the NH 3 gas and the partial pressure P(H 2 ) of the H 2 gas. K N =P(NH 3 )/P(H 2 ) 3/2
於第1氮化處理步驟中以如下方式對處理氣體之導入量進行反饋控制:測定氣體引導筒222內之NH 3氣體之分壓P(NH 3)或H 2氣體之分壓P(H 2)(亦可測定排氣內之NH 3氣體之分壓P(NH 3)或H 2氣體之分壓P(H 2)),使根據該測定值所運算之氮化勢之值處於目標之第1氮化勢之附近範圍內。 In the first nitriding treatment step, feedback control is performed on the introduction amount of the processing gas in the following manner: measuring the partial pressure P (NH 3 ) of the NH 3 gas or the partial pressure P (H 2 ) of the H 2 gas in the gas guide tube 222 ) (You can also measure the partial pressure P (NH 3 ) of the NH 3 gas or the partial pressure P (H 2 ) of the H 2 gas in the exhaust gas, so that the value of the nitriding potential calculated based on the measured value is within the target. Within the vicinity of the first nitriding potential.
於圖4之例中,利用導熱度式H 2感測器(未圖示)測定氣體引導筒222內之H 2氣體之分壓P(H 2),一面線上分析該測定值(根據該測定值運算氮化勢)一面對處理氣體之導入量進行反饋控制。具體而言,以50(L/min)之固定流量導入AX氣體,另一方面,增減NH 3氣體。總流量亦會發生變動。 In the example of FIG. 4 , a thermal conductivity H 2 sensor (not shown) is used to measure the partial pressure P (H 2 ) of the H 2 gas in the gas guide tube 222 , and the measured value is analyzed on a line (according to this measurement The value calculation nitriding potential) performs feedback control on the introduction amount of the processing gas. Specifically, AX gas was introduced at a fixed flow rate of 50 (L/min), and NH 3 gas was increased or decreased. Total traffic will also change.
於圖4之例中,此種第1氮化處理步驟實施60分鐘。藉此,鋼構件表面不形成化合物層或不形成ε相主體之化合物層,故而減少不利於γ'相形成之表面碳量,另一方面,能夠使氮有效率地擴散至內部。In the example of Figure 4, this first nitriding step is performed for 60 minutes. Thereby, no compound layer or a compound layer that is the main body of the ε phase is formed on the surface of the steel component, thereby reducing the amount of surface carbon that is not conducive to the formation of the γ' phase. On the other hand, nitrogen can be efficiently diffused into the interior.
接著,例如採用0.50(0.30~10.00)之值作為第2氮化勢,於550℃之溫度下實施第2氮化處理步驟。Next, for example, a value of 0.50 (0.30-10.00) is used as the second nitriding potential, and the second nitriding step is performed at a temperature of 550°C.
於第2氮化處理步驟中亦以如下方式對處理氣體之導入量進行反饋控制:測定氣體引導筒222內之NH 3氣體之分壓P(NH 3)或H 2氣體之分壓P(H 2),使根據該測定值所運算之氮化勢之值處於目標之第2氮化勢之附近範圍內。 In the second nitriding step, the introduction amount of the processing gas is also feedback controlled in the following manner: measuring the partial pressure P( NH3 ) of the NH 3 gas or the partial pressure P(H) of the H 2 gas in the gas guide tube 222 2 ), so that the value of the nitriding potential calculated based on the measured value is within the vicinity of the target second nitriding potential.
於圖4之例中,利用導熱度式H 2感測器(未圖示)測定氣體引導筒222內之H 2氣體之分壓P(H 2),一面線上分析該測定值(根據該測定值運算氮化勢)一面對處理氣體之導入量進行反饋控制。具體而言,以50(L/min)之固定流量導入AX氣體,另一方面,增減NH 3氣體。總流量亦會發生變動。 In the example of FIG. 4 , a thermal conductivity H 2 sensor (not shown) is used to measure the partial pressure P (H 2 ) of the H 2 gas in the gas guide tube 222 , and the measured value is analyzed on a line (according to this measurement The value calculation nitriding potential) performs feedback control on the introduction amount of the processing gas. Specifically, AX gas was introduced at a fixed flow rate of 50 (L/min), and NH 3 gas was increased or decreased. Total traffic will also change.
於圖4之例中,此種第2氮化處理步驟實施200分鐘。藉此,於鋼構件生成γ'相、ε相、或γ'相與ε相混合存在之氮化化合物層。In the example of Figure 4, this second nitriding step is performed for 200 minutes. Thereby, a nitride compound layer in which the γ' phase, the ε phase, or the γ' phase and the ε phase are mixed is generated on the steel member.
接著,例如採用0.30(0.26~0.60)之值作為第3氮化勢,於550℃之溫度下實施第3氮化處理步驟。Next, for example, a value of 0.30 (0.26-0.60) is used as the third nitriding potential, and the third nitriding step is performed at a temperature of 550°C.
於第3氮化處理步驟中亦以如下方式對處理氣體之導入量進行反饋控制:測定加熱室11內之NH 3氣體之分壓P(NH 3)或H 2氣體之分壓P(H 2),使根據該測定值所運算之氮化勢之值處於目標之第3氮化勢之附近範圍內。 In the third nitriding step, the introduction amount of the processing gas is also feedback controlled in the following manner: measuring the partial pressure P (NH 3 ) of the NH 3 gas or the partial pressure P (H 2 ) of the H 2 gas in the heating chamber 11 ), so that the value of the nitriding potential calculated based on the measured value is within the vicinity of the target third nitriding potential.
於圖4之例中,利用導熱度式H 2感測器(未圖示)測定氣體引導筒222內之H 2氣體之分壓P(H 2),一面線上分析該測定值(根據該測定值運算氮化勢)一面對處理氣體之導入量進行反饋控制。具體而言,以50(L/min)之固定流量導入AX氣體,另一方面,增減NH 3氣體。總流量亦會發生變動。 In the example of FIG. 4 , a thermal conductivity H 2 sensor (not shown) is used to measure the partial pressure P (H 2 ) of the H 2 gas in the gas guide tube 222 , and the measured value is analyzed on a line (according to this measurement The value calculation nitriding potential) performs feedback control on the introduction amount of the processing gas. Specifically, AX gas was introduced at a fixed flow rate of 50 (L/min), and NH 3 gas was increased or decreased. Total traffic will also change.
於圖4之例中,此種第3氮化處理步驟實施60分鐘。藉此,將γ'相析出於氮化化合物層。In the example of Figure 4, this third nitriding step is performed for 60 minutes. Thereby, the γ' phase is precipitated in the nitride compound layer.
第3氮化處理步驟結束後,進行冷卻步驟。於圖4之例中,冷卻步驟之前半程(至400℃左右為止)進行與第3氮化處理步驟同樣之處理氣體導入量之控制。即,以50(L/min)之固定流量導入AX氣體,另一方面,增減NH 3氣體。於冷卻步驟之後半程(400℃~100℃左右),以20(L/min)之固定流量導入N 2氣體。冷卻步驟結束後,打開爐蓋212,將收納有鋼構件之盒體20自氣體引導筒222搬出。 After the third nitriding step is completed, a cooling step is performed. In the example of FIG. 4 , the same process gas introduction amount control as in the third nitriding step is performed in the first half of the cooling step (until approximately 400° C.). That is, AX gas is introduced at a fixed flow rate of 50 (L/min), and NH 3 gas is increased or decreased. In the second half of the cooling step (around 400°C to 100°C), N 2 gas was introduced at a fixed flow rate of 20 (L/min). After the cooling step is completed, the furnace cover 212 is opened, and the box 20 containing the steel components is moved out of the gas guide tube 222 .
[橫置式熱處理爐之構成例] 圖5係本發明之氮化處理方法所使用之橫置式熱處理爐之構成概略圖。 [Configuration example of horizontal heat treatment furnace] Figure 5 is a schematic diagram of the structure of a horizontal heat treatment furnace used in the nitriding treatment method of the present invention.
橫置式熱處理爐基本上係將坑式熱處理爐橫置而成之爐,但亦可採用如下構成:如圖5所示,將風扇213及風扇馬達214設置於與爐蓋212相對向之爐壁211之壁面上,而非爐蓋212上。The horizontal heat treatment furnace is basically a pit-type heat treatment furnace placed horizontally, but it can also adopt the following structure: as shown in Figure 5, the fan 213 and the fan motor 214 are arranged on the furnace wall opposite to the furnace cover 212. 211 on the wall, not on the furnace cover 212.
橫置式熱處理爐之其他之構成與使用圖3所說明之坑式熱處理爐之構成大致相同。The other structures of the horizontal heat treatment furnace are substantially the same as those of the pit heat treatment furnace explained using Figure 3 .
[橫置式熱處理爐之動作例] 於橫置式熱處理爐中亦打開爐蓋212,將收納有鋼構件之盒體20搬入至氣體引導筒222內。並且,於鋼構件(收納有其之盒體20)被搬入至氣體引導筒222內之後,向蒸餾罐211內導入處理氣體,用加熱器將該處理氣體加熱至特定溫度,進而一面用風扇213(例如以1500 rpm旋轉)進行攪拌,一面進行搬入至氣體引導筒222內之鋼構件之氮化處理。 [Operation example of horizontal heat treatment furnace] In the horizontal heat treatment furnace, the furnace cover 212 is also opened, and the box 20 containing the steel components is moved into the gas guide tube 222. Then, after the steel member (the box 20 containing it) is carried into the gas guide tube 222 , the processing gas is introduced into the retort 211 , and the processing gas is heated to a specific temperature with a heater, while the fan 213 is used to heat the processing gas. While stirring (for example, rotating at 1500 rpm), the steel member carried into the gas guide tube 222 is nitrided.
圖4之步驟圖於使用橫置式熱處理爐之情形時亦有效。具體而言,可進行加熱步驟(於前半程與後半程中氣體導入之形態不同)、第1氮化處理步驟、第2氮化處理步驟、第3氮化處理步驟、及冷卻步驟(於前半段與後半階段中氣體導入之形態不同)。冷卻步驟結束後,打開爐蓋212,將收納有鋼構件之盒體20自氣體引導筒222搬出。The step diagram in Figure 4 is also valid when using a horizontal heat treatment furnace. Specifically, a heating step (the form of gas introduction is different in the first half and the second half), a first nitriding step, a second nitriding step, a third nitriding step, and a cooling step (in the first half) can be performed. The shape of gas introduction is different between the first stage and the second half stage). After the cooling step is completed, the furnace cover 212 is opened, and the box 20 containing the steel components is moved out of the gas guide tube 222 .
[效果之總結] 根據如上所述之本發明之實施方式,使用分批型熱處理爐或使用單室型熱處理爐,均能夠獲得於表面具有以γ'相為主成分之氮化鐵化合物層之氮化鋼構件。 [Summary of effects] According to the embodiment of the present invention as described above, it is possible to obtain a nitrided steel member having an iron nitride compound layer containing the γ' phase as the main component on the surface using either a batch-type heat treatment furnace or a single-chamber heat treatment furnace.
藉由各實施方式而獲得之鋼構件由於在內部形成有氮擴散層及氮化物而得到強化,並且於表面形成有富γ'相之氮化鐵化合物層,故而能夠實現充分之耐點蝕性及彎曲疲勞強度。The steel member obtained by each embodiment is strengthened by the formation of a nitrogen diffusion layer and nitride inside, and a γ' phase-rich iron nitride compound layer is formed on the surface, so that sufficient pitting corrosion resistance can be achieved and bending fatigue strength.
又,與滲碳或滲碳氮化處理相比較,本發明之氮化處理係於奧氏體變態溫度以下之處理,故而應變量較小。又,由於可省略於滲碳或滲碳氮化處理中為必須步驟之淬火步驟,故而應變不均量亦較小。其結果,能夠獲得高強度且低應變之氮化鋼構件。In addition, compared with carburizing or carbonitriding, the nitriding treatment of the present invention is a treatment below the austenite transformation temperature, so the amount of strain is smaller. In addition, since the quenching step, which is a necessary step in carburizing or carbonitriding, can be omitted, the amount of strain unevenness is also small. As a result, a high-strength and low-strain nitrided steel member can be obtained.
[對本發明之溫度範圍之補充] 於本發明中,各氮化處理步驟之溫度設為500℃~590℃。據說於氮化處理中溫度較高者生產性較佳。但是,根據本案發明者之檢證,若高於590℃,則硬化量減少,且於表面形成奧氏體層,故而將590℃設為上限為佳。另一方面,根據本案發明者之檢證,若氮化處理溫度低於500℃,則氮化化合物層之形成速度變慢,於成本方面不佳,故而將500℃設為下限為佳。 [Supplement to the temperature range of the present invention] In the present invention, the temperature of each nitriding step is set to 500°C to 590°C. It is said that the higher the temperature in the nitriding treatment, the better the productivity. However, according to the inspection of the inventor of this case, if it is higher than 590°C, the amount of hardening decreases and an austenite layer is formed on the surface, so it is better to set 590°C as the upper limit. On the other hand, according to the examination of the present inventor, if the nitriding treatment temperature is lower than 500°C, the formation speed of the nitride compound layer becomes slow, which is unfavorable in terms of cost. Therefore, it is better to set 500°C as the lower limit.
又,第2氮化處理步驟之溫度與第3氮化處理步驟之溫度之差較小者能夠減小鋼構件(工件)之溫度不均,從而能夠抑制鋼構件(工件)之氮化品質不均。具體而言,兩氮化處理步驟之溫度差較佳為控制於50℃以內,進而較佳為控制於30℃以內。In addition, the temperature difference between the second nitriding step and the third nitriding step is smaller, which can reduce the temperature unevenness of the steel member (workpiece), thereby suppressing the nitriding quality of the steel member (workpiece). all. Specifically, the temperature difference between the two nitriding steps is preferably controlled within 50°C, and further preferably, controlled within 30°C.
[實施例1-1~1-14、比較例1-1~1-8] 對於複數個圓筒狀環齒輪(鋼種可不同),使用分批型熱處理爐1,按照作為圖6示出之表1中之條件實施3個階段之氮化處理。 [Examples 1-1 to 1-14, Comparative Examples 1-1 to 1-8] For a plurality of cylindrical ring gears (the steel types may be different), a batch-type heat treatment furnace 1 is used, and three-stage nitriding treatment is performed according to the conditions in Table 1 shown in FIG. 6 .
於實施例1-1~1-14、比較例1-1~1-8中,第1氮化處理步驟至第3氮化處理步驟係於同一分批型熱處理爐1內按順序實施。In Examples 1-1 to 1-14 and Comparative Examples 1-1 to 1-8, the first to third nitriding steps are performed sequentially in the same batch-type heat treatment furnace 1 .
又,於實施例1-1~1-14、比較例1-1~1-8之第1氮化處理步驟中,使用NH 3氣體及AX氣體這兩種氣體,將其等之總流量設為固定並一面改變其等各自之導入量,藉此進行控制以使第1氮化處理步驟中之氮化勢成為目標之第1氮化勢(K N)。 Furthermore, in the first nitriding treatment steps of Examples 1-1 to 1-14 and Comparative Examples 1-1 to 1-8, two gases, NH 3 gas and AX gas, were used, and the total flow rate was set to By fixing and changing their respective introduction amounts, control is performed so that the nitriding potential in the first nitriding treatment step becomes the target first nitriding potential (K N ).
又,於實施例1-1~1-14、比較例1-1~1-8之第2氮化處理步驟中,使用NH 3氣體、AX氣體及N 2氣體這3種氣體,將其等之總流量設為固定並一面改變NH 3氣體及AX氣體各自之導入量,藉此進行控制以使第1氮化處理步驟中之氮化勢成為目標之第1氮化勢(K N)。 In addition, in the second nitriding treatment step of Examples 1-1 to 1-14 and Comparative Examples 1-1 to 1-8, three gases, namely NH 3 gas, AX gas and N 2 gas, were used. The total flow rate is fixed and the introduction amounts of NH 3 gas and AX gas are changed while controlling so that the nitriding potential in the first nitriding treatment step becomes the target first nitriding potential (K N ).
又,於實施例1-1~1-14、比較例1-1~1-8之第3氮化處理步驟中,使用NH 3氣體及AX氣體這兩種氣體,將其等之總流量設為固定並一面改變其等各自之導入量,藉此進行控制以使第2氮化處理步驟中之氮化勢成為目標之第2氮化勢(K N)。 Moreover, in the third nitriding treatment step of Examples 1-1 to 1-14 and Comparative Examples 1-1 to 1-8, two gases, NH 3 gas and AX gas, were used, and the total flow rate was set to By fixing and changing their respective introduction amounts, control is performed so that the nitriding potential in the second nitriding treatment step becomes the target second nitriding potential (K N ).
於實施例1-1~1-14、比較例1-1~1-8中,於第1氮化處理步驟至第3氮化處理步驟前後實施使用圖2所說明之各步驟。In Examples 1-1 to 1-14 and Comparative Examples 1-1 to 1-8, each step described using FIG. 2 was performed before and after the first nitriding step to the third nitriding step.
於表1中,相之鑑定方法係基於X射線繞射圖樣而進行,該X射線繞射圖樣係自鋼材表面起進行利用2θ-θ掃描法之X射線繞射測定(Rigaku製造之MiniFlex600,Cu管,40 kV-15 mA)而得。In Table 1, the phase identification method is based on the X-ray diffraction pattern measured from the steel surface using the 2θ-θ scanning method (MiniFlex600 manufactured by Rigaku, Cu tube, 40 kV-15 mA).
又,於表1中,化合物層厚度係將經氮化處理之鋼材於深度方向上切斷,根據剖面之組織觀察結果測定表面化合物層之厚度。富γ'相之化合物層厚度較佳為2~20 μm。若未達2 μm,則過薄從而疲勞強度之提昇不足,另一方面,若超過20 μm,則作為疲勞裂痕起點之化合物層之多孔層變厚從而疲勞強度下降。Moreover, in Table 1, the thickness of the compound layer is measured by cutting the nitrided steel material in the depth direction and measuring the thickness of the surface compound layer based on the observation results of the structure of the cross section. The thickness of the γ' phase-rich compound layer is preferably 2 to 20 μm. If it is less than 2 μm, it is too thin and the improvement in fatigue strength is insufficient. On the other hand, if it exceeds 20 μm, the porous layer of the compound layer that is the starting point of fatigue cracks becomes thicker and the fatigue strength decreases.
根據表1所示之結果可知,藉由實施例1-1~1-14,本發明之有效性得到證實,本發明之特徵在於:於在分批爐中使用上述3種氣體之控制形態中,第1氮化處理步驟於500℃~590℃之溫度下實施,第2氮化處理步驟亦於500℃~590℃之溫度下實施,第3氮化處理步驟亦於500℃~590℃之溫度下實施,第1氮化勢為0.10~1.00之範圍內之值,第2氮化勢高於第1氮化勢,為0.30~10.00之範圍內之值,第3氮化勢低於第2氮化勢,為0.26~0.60之範圍內之值。From the results shown in Table 1, it can be seen that the effectiveness of the present invention has been confirmed through Examples 1-1 to 1-14. The feature of the present invention is that in the control form of using the above three gases in a batch furnace , the first nitriding step is carried out at a temperature of 500°C to 590°C, the second nitriding step is also carried out at a temperature of 500°C to 590°C, and the third nitriding step is also carried out at a temperature of 500°C to 590°C. When implemented at a certain temperature, the first nitriding potential is in the range of 0.10 to 1.00, the second nitriding potential is higher than the first nitriding potential and is in the range of 0.30 to 10.00, and the third nitriding potential is lower than the first nitriding potential. 2Nitridation potential is a value in the range of 0.26 to 0.60.
另一方面,藉由比較例1-1~1-8證實了:於500℃~590℃之溫度範圍內,若將第3氮化處理步驟中之氮化勢設為0.25以下,則亦析出硬度低於γ'相之α相,從而耐點蝕性或彎曲疲勞強度不足。On the other hand, it was confirmed from Comparative Examples 1-1 to 1-8 that if the nitriding potential in the third nitriding step is set to 0.25 or less in the temperature range of 500°C to 590°C, precipitation will also occur. The hardness of the α phase is lower than that of the γ' phase, resulting in insufficient pitting corrosion resistance or bending fatigue strength.
[實施例2-1~2-14、比較例2-1~2-8] 對於複數個圓筒狀環齒輪(鋼種可不同),使用坑式熱處理爐201,按照作為圖7示出之表2中之條件實施3個階段之氮化處理。 [Examples 2-1 to 2-14, Comparative Examples 2-1 to 2-8] For a plurality of cylindrical ring gears (the steel types may be different), a pit type heat treatment furnace 201 is used, and three stages of nitriding treatment are performed according to the conditions in Table 2 shown in FIG. 7 .
於實施例2-1~2-14、比較例2-1~2-8中,第1氮化處理步驟至第3氮化處理步驟係於同一坑式熱處理爐201內按順序實施。In Examples 2-1 to 2-14 and Comparative Examples 2-1 to 2-8, the first to third nitriding steps are performed sequentially in the same pit heat treatment furnace 201 .
又,於實施例2-1~2-14、比較例2-1~2-8之第1氮化處理步驟中,使用NH 3氣體及AX氣體這兩種氣體,將其等之總流量設為固定並一面改變其等各自之導入量,藉此進行控制以使第1氮化處理步驟中之氮化勢成為目標之第1氮化勢(K N)。 In addition, in the first nitriding treatment steps of Examples 2-1 to 2-14 and Comparative Examples 2-1 to 2-8, two gases, NH 3 gas and AX gas, were used, and the total flow rate was set to By fixing and changing their respective introduction amounts, control is performed so that the nitriding potential in the first nitriding treatment step becomes the target first nitriding potential (K N ).
又,於實施例2-1~2-14、比較例2-1~2-8之第2氮化處理步驟中,使用NH 3氣體、AX氣體及N 2氣體這3種氣體,將其等之總流量設為固定並一面改變NH 3氣體及AX氣體各自之導入量,藉此進行控制以使第1氮化處理步驟中之氮化勢成為目標之第1氮化勢(K N)。 In addition, in the second nitriding treatment step of Examples 2-1 to 2-14 and Comparative Examples 2-1 to 2-8, three gases, namely NH 3 gas, AX gas and N 2 gas, were used. The total flow rate is fixed and the introduction amounts of NH 3 gas and AX gas are changed while controlling so that the nitriding potential in the first nitriding treatment step becomes the target first nitriding potential (K N ).
又,於實施例2-1~2-14、比較例2-1~2-8之第3氮化處理步驟中,使用NH 3氣體及AX氣體這兩種氣體,將其等之總流量設為固定並一面改變其等各自之導入量,藉此進行控制以使第2氮化處理步驟中之氮化勢成為目標之第2氮化勢(K N)。 Furthermore, in the third nitriding treatment step of Examples 2-1 to 2-14 and Comparative Examples 2-1 to 2-8, two gases, NH 3 gas and AX gas, were used, and the total flow rate was set to By fixing and changing their respective introduction amounts, control is performed so that the nitriding potential in the second nitriding treatment step becomes the target second nitriding potential (K N ).
於實施例2-1~2-14、比較例2-1~2-8中,於第1氮化處理步驟至第3氮化處理步驟前後實施使用圖4所說明之各步驟。In Examples 2-1 to 2-14 and Comparative Examples 2-1 to 2-8, each step described using FIG. 4 was performed before and after the first nitriding step to the third nitriding step.
表2中之相之鑑定方法及化合物層厚度以與表1中之該等相同之方式判定。The phase identification methods and compound layer thicknesses in Table 2 were determined in the same manner as those in Table 1.
根據表2所示之結果可知,藉由實施例2-1~2-14,本發明之有效性得到證實,本發明之特徵在於:於在坑式爐中使用上述3種氣體之控制形態中,第1氮化處理步驟於500℃~590℃之溫度下實施,第2氮化處理步驟亦於500℃~590℃之溫度下實施,第3氮化處理步驟亦於500℃~590℃之溫度下實施,第1氮化勢為0.10~1.00之範圍內之值,第2氮化勢高於第1氮化勢,為0.30~10.00之範圍內之值,第3氮化勢低於第2氮化勢,為0.26~0.60之範圍內之值。From the results shown in Table 2, it can be seen that the effectiveness of the present invention has been confirmed through Examples 2-1 to 2-14. The feature of the present invention is that in the control form of using the above three gases in a pit furnace , the first nitriding step is carried out at a temperature of 500°C to 590°C, the second nitriding step is also carried out at a temperature of 500°C to 590°C, and the third nitriding step is also carried out at a temperature of 500°C to 590°C. When implemented at a certain temperature, the first nitriding potential is in the range of 0.10 to 1.00, the second nitriding potential is higher than the first nitriding potential and is in the range of 0.30 to 10.00, and the third nitriding potential is lower than the first nitriding potential. 2Nitridation potential is a value in the range of 0.26 to 0.60.
另一方面,藉由比較例2-1~2-8證實了:於500℃~590℃之溫度範圍內,若將第2氮化處理步驟中之氮化勢設為0.25以下,則亦析出硬度低於γ'相之α相,從而耐點蝕性或彎曲疲勞強度不足。On the other hand, it was confirmed from Comparative Examples 2-1 to 2-8 that if the nitriding potential in the second nitriding step is set to 0.25 or less in the temperature range of 500°C to 590°C, precipitation will also occur. The hardness of the α phase is lower than that of the γ' phase, resulting in insufficient pitting corrosion resistance or bending fatigue strength.
[實施例3-1~3-14、比較例3-1~3-8] 對於複數個圓筒狀環齒輪(鋼種可不同),使用分批型熱處理爐1,按照作為圖8示出之表3中之條件實施3個階段之氮化處理。 [Examples 3-1 to 3-14, Comparative Examples 3-1 to 3-8] For a plurality of cylindrical ring gears (the steel types may be different), a batch-type heat treatment furnace 1 is used, and three-stage nitriding treatment is performed according to the conditions in Table 3 shown in FIG. 8 .
於實施例3-1~3-14、比較例3-1~3-8中,第1氮化處理步驟及第2氮化處理步驟係於同一分批型熱處理爐1內按順序實施。In Examples 3-1 to 3-14 and Comparative Examples 3-1 to 3-8, the first nitriding step and the second nitriding step were performed sequentially in the same batch-type heat treatment furnace 1 .
又,於實施例3-1~3-14、比較例3-1~3-8之第1氮化處理步驟中,使用NH 3氣體及AX氣體這兩種氣體,將其等之總流量設為固定並一面改變其等各自之導入量,藉此進行控制以使第1氮化處理步驟中之氮化勢成為目標之第1氮化勢(K N)。 Furthermore, in the first nitriding treatment steps of Examples 3-1 to 3-14 and Comparative Examples 3-1 to 3-8, two gases, NH 3 gas and AX gas, were used, and the total flow rate was set to By fixing and changing their respective introduction amounts, control is performed so that the nitriding potential in the first nitriding treatment step becomes the target first nitriding potential (K N ).
又,於實施例3-1~3-14、比較例3-1~3-8之第2氮化處理步驟中,亦使用NH 3氣體及AX氣體這兩種氣體,將其等之總流量設為固定並一面改變其等各自之導入量,藉此進行控制以使第1氮化處理步驟中之氮化勢成為目標之第1氮化勢(K N)。 In addition, in the second nitriding treatment step of Examples 3-1 to 3-14 and Comparative Examples 3-1 to 3-8, two gases, NH 3 gas and AX gas, were also used, and their total flow rates were equal to By setting the respective introduction amounts to be fixed and varying, the nitriding potential in the first nitriding treatment step is controlled so that the nitriding potential becomes the target first nitriding potential (K N ).
又,於實施例3-1~3-14、比較例3-1~3-8之第3氮化處理步驟中,亦使用NH 3氣體及AX氣體這兩種氣體,將其等之總流量設為固定並一面改變其等各自之導入量,藉此進行控制以使第2氮化處理步驟中之氮化勢成為目標之第2氮化勢(K N)。 In addition, in the third nitriding treatment step of Examples 3-1 to 3-14 and Comparative Examples 3-1 to 3-8, two gases, NH 3 gas and AX gas, were also used, and their total flow rates were equal to By setting them as fixed and changing their respective introduction amounts, the nitriding potential in the second nitriding treatment step is controlled so that the nitriding potential becomes the target second nitriding potential (K N ).
於實施例3-1~3-14、比較例3-1~3-8中,於第1氮化處理步驟至第3氮化處理步驟前後實施使用圖2所說明之各步驟。In Examples 3-1 to 3-14 and Comparative Examples 3-1 to 3-8, each step described using FIG. 2 was performed before and after the first nitriding step to the third nitriding step.
表3中之相之鑑定方法及化合物層厚度以與表1及表2中之該等相同之方式判定。The phase identification methods and compound layer thicknesses in Table 3 were determined in the same manner as those in Tables 1 and 2.
根據表3所示之結果可知,藉由實施例3-1~3-14,本發明之有效性得到證實,本發明之特徵在於:於在分批爐中使用上述兩種氣體之控制形態中,第1氮化處理步驟於500℃~590℃之溫度下實施,第2氮化處理步驟亦於500℃~590℃之溫度下實施,第3氮化處理步驟亦於500℃~590℃之溫度下實施,第1氮化勢為0.10~1.00之範圍內之值,第2氮化勢高於第1氮化勢,為0.30~10.00之範圍內之值,第3氮化勢低於第2氮化勢,為0.26~0.60之範圍內之值。From the results shown in Table 3, it can be seen that the effectiveness of the present invention has been confirmed through Examples 3-1 to 3-14. The feature of the present invention is that in the control form of using the above two gases in a batch furnace , the first nitriding step is carried out at a temperature of 500°C to 590°C, the second nitriding step is also carried out at a temperature of 500°C to 590°C, and the third nitriding step is also carried out at a temperature of 500°C to 590°C. When implemented at a certain temperature, the first nitriding potential is in the range of 0.10 to 1.00, the second nitriding potential is higher than the first nitriding potential and is in the range of 0.30 to 10.00, and the third nitriding potential is lower than the first nitriding potential. 2Nitridation potential is a value in the range of 0.26 to 0.60.
另一方面,藉由比較例3-1~3-8證實了:於500℃~590℃之溫度範圍內,若將第2氮化處理步驟中之氮化勢設為0.25以下,則亦析出硬度低於γ'相之α相,從而耐點蝕性或彎曲疲勞強度不足。On the other hand, it was confirmed from Comparative Examples 3-1 to 3-8 that if the nitriding potential in the second nitriding step is set to 0.25 or less in the temperature range of 500°C to 590°C, precipitation will also occur. The hardness of the α phase is lower than that of the γ' phase, resulting in insufficient pitting corrosion resistance or bending fatigue strength.
[實施例4-1~4-14、比較例4-1~4-8] 對於複數個圓筒狀環齒輪(鋼種可不同),使用坑式熱處理爐201,按照作為圖9示出之表4中之條件實施3個階段之氮化處理。 [Examples 4-1 to 4-14, Comparative Examples 4-1 to 4-8] For a plurality of cylindrical ring gears (the steel types may be different), a pit-type heat treatment furnace 201 is used, and three stages of nitriding treatment are performed according to the conditions in Table 4 shown in FIG. 9 .
於實施例4-1~4-14、比較例4-1~4-8中,第1氮化處理步驟至第3氮化處理步驟係於同一坑式熱處理爐201內按順序實施。In Examples 4-1 to 4-14 and Comparative Examples 4-1 to 4-8, the first to third nitriding steps are performed sequentially in the same pit heat treatment furnace 201.
又,於實施例4-1~4-14、比較例4-1~4-8之第1氮化處理步驟中,使用NH 3氣體及AX氣體這兩種氣體,將其等之總流量設為固定並一面改變其等各自之導入量,藉此進行控制以使第1氮化處理步驟中之氮化勢成為目標之第1氮化勢(K N)。 Furthermore, in the first nitriding treatment steps of Examples 4-1 to 4-14 and Comparative Examples 4-1 to 4-8, two gases, NH 3 gas and AX gas, were used, and the total flow rate was set to By fixing and changing their respective introduction amounts, control is performed so that the nitriding potential in the first nitriding treatment step becomes the target first nitriding potential (K N ).
又,於實施例4-1~4-14、比較例4-1~4-8之第2氮化處理步驟中,亦使用NH 3氣體及AX氣體這兩種氣體,將其等之總流量設為固定並一面改變其等各自之導入量,藉此進行控制以使第1氮化處理步驟中之氮化勢成為目標之第1氮化勢(K N)。 In addition, in the second nitriding treatment step of Examples 4-1 to 4-14 and Comparative Examples 4-1 to 4-8, two gases, NH 3 gas and AX gas, were also used, and their total flow rates were equal to By setting the respective introduction amounts to be fixed and varying, the nitriding potential in the first nitriding treatment step is controlled so that the nitriding potential becomes the target first nitriding potential (K N ).
又,於實施例4-1~4-14、比較例4-1~4-8之第3氮化處理步驟中,亦使用NH 3氣體及AX氣體這兩種氣體,將其等之總流量設為固定並一面改變其等各自之導入量,藉此進行控制以使第2氮化處理步驟中之氮化勢成為目標之第2氮化勢(K N)。 In addition, in the third nitriding treatment step of Examples 4-1 to 4-14 and Comparative Examples 4-1 to 4-8, two gases, NH 3 gas and AX gas, were also used, and their total flow rates were equal to By setting them as fixed and changing their respective introduction amounts, the nitriding potential in the second nitriding treatment step is controlled so that the nitriding potential becomes the target second nitriding potential (K N ).
於實施例4-1~4-14、比較例4-1~4-8中,於第1氮化處理步驟至第3氮化處理步驟前後實施使用圖4所說明之各步驟。In Examples 4-1 to 4-14 and Comparative Examples 4-1 to 4-8, each step described using FIG. 4 was performed before and after the first nitriding step to the third nitriding step.
表4中之相之鑑定方法及化合物層厚度以與表1至表3中之該等相同之方式判定。The phase identification methods and compound layer thicknesses in Table 4 were determined in the same manner as those in Tables 1 to 3.
根據表4所示之結果可知,藉由實施例4-1~4-14,本發明之有效性得到證實,本發明之特徵在於:於在坑式爐中使用上述兩種氣體之控制形態中,第1氮化處理步驟於500℃~590℃之溫度下實施,第2氮化處理步驟亦於500℃~590℃之溫度下實施,第3氮化處理步驟亦於500℃~590℃之溫度下實施,第1氮化勢為0.10~1.00之範圍內之值,第2氮化勢高於第1氮化勢,為0.30~10.00之範圍內之值,第3氮化勢低於第2氮化勢,為0.26~0.60之範圍內之值。From the results shown in Table 4, it can be seen that the effectiveness of the present invention has been confirmed through Examples 4-1 to 4-14. The feature of the present invention is that in the control form of using the above two gases in a pit furnace , the first nitriding step is carried out at a temperature of 500°C to 590°C, the second nitriding step is also carried out at a temperature of 500°C to 590°C, and the third nitriding step is also carried out at a temperature of 500°C to 590°C. When implemented at a certain temperature, the first nitriding potential is in the range of 0.10 to 1.00, the second nitriding potential is higher than the first nitriding potential and is in the range of 0.30 to 10.00, and the third nitriding potential is lower than the first nitriding potential. 2Nitridation potential is a value in the range of 0.26 to 0.60.
另一方面,藉由比較例4-1~4-8證實了:於500℃~590℃之溫度範圍內,若將第2氮化處理步驟中之氮化勢設為0.25以下,則亦析出硬度低於γ'相之α相,從而耐點蝕性或彎曲疲勞強度不足。On the other hand, it was confirmed from Comparative Examples 4-1 to 4-8 that if the nitriding potential in the second nitriding step is set to 0.25 or less in the temperature range of 500°C to 590°C, precipitation will also occur. The hardness of the α phase is lower than that of the γ' phase, resulting in insufficient pitting corrosion resistance or bending fatigue strength.
[實施例5-1~5-14、比較例5-1~5-8] 對於複數個圓筒狀環齒輪(鋼種可不同),使用坑式熱處理爐201,按照作為圖10示出之表5中之條件實施3個階段之氮化處理。 [Examples 5-1 to 5-14, Comparative Examples 5-1 to 5-8] For a plurality of cylindrical ring gears (the steel types may be different), a pit type heat treatment furnace 201 is used, and three stages of nitriding treatment are performed according to the conditions in Table 5 shown in FIG. 10 .
於實施例5-1~5-14、比較例5-1~5-8中,第1氮化處理步驟至第3氮化處理步驟係於同一坑式熱處理爐201內按順序實施。In Examples 5-1 to 5-14 and Comparative Examples 5-1 to 5-8, the first to third nitriding steps are performed sequentially in the same pit heat treatment furnace 201.
又,於實施例5-1~5-14、比較例5-1~5-8之第1氮化處理步驟中,使用NH 3氣體及AX氣體這兩種氣體,將其等之一之導入量設為固定並一面改變另一者之導入量,藉此進行控制以使第1氮化處理步驟中之氮化勢成為目標之第1氮化勢(K N)。 Furthermore, in the first nitriding treatment step of Examples 5-1 to 5-14 and Comparative Examples 5-1 to 5-8, two gases, NH 3 gas and AX gas, were used, and one of them was introduced. While the amount is fixed and the other introduced amount is changed, control is performed so that the nitriding potential in the first nitriding treatment step becomes the target first nitriding potential (K N ).
又,於實施例5-1~5-14、比較例5-1~5-8之第2氮化處理步驟中,亦使用NH 3氣體及AX氣體這兩種氣體,將其等之一之導入量設為固定並一面改變另一者之導入量,藉此進行控制以使第1氮化處理步驟中之氮化勢成為目標之第1氮化勢(K N)。 In addition, in the second nitriding treatment step of Examples 5-1 to 5-14 and Comparative Examples 5-1 to 5-8, two gases, NH 3 gas and AX gas, were also used, and one of them was used. The introduction amount is fixed and the other introduction amount is changed, thereby controlling so that the nitriding potential in the first nitriding treatment step becomes the target first nitriding potential (K N ).
又,於實施例5-1~5-14、比較例5-1~5-8之第3氮化處理步驟中,亦使用NH 3氣體及AX氣體這兩種氣體,將其等之一之導入量設為固定並一面改變另一者之導入量,藉此進行控制以使第2氮化處理步驟中之氮化勢成為目標之第2氮化勢(K N)。 In addition, in the third nitriding treatment step of Examples 5-1 to 5-14 and Comparative Examples 5-1 to 5-8, two gases, NH 3 gas and AX gas, were also used, and one of them was used. The introduction amount is fixed and the other introduction amount is changed, thereby controlling so that the nitriding potential in the second nitriding treatment step becomes the target second nitriding potential (K N ).
於實施例5-1~5-14、比較例5-1~5-8中,於第1氮化處理步驟及第2氮化處理步驟前後實施用使圖4所說明之各步驟。In Examples 5-1 to 5-14 and Comparative Examples 5-1 to 5-8, each step explained using FIG. 4 was performed before and after the first nitriding step and the second nitriding step.
表5中之相之鑑定方法及化合物層厚度以與表1至表4中之該等相同之方式判定。The phase identification methods and compound layer thicknesses in Table 5 were determined in the same manner as those in Tables 1 to 4.
根據表5所示之結果可知,藉由實施例5-1~5-14,本發明之有效性得到證實,本發明之特徵在於:於在坑式爐中使用上述兩種氣體之控制形態中,第1氮化處理步驟於500℃~590℃之溫度下實施,第2氮化處理步驟亦於500℃~590℃之溫度下實施,第3氮化處理步驟亦於500℃~590℃之溫度下實施,第1氮化勢為0.10~1.00之範圍內之值,第2氮化勢高於第1氮化勢,為0.30~10.00之範圍內之值,第3氮化勢低於第2氮化勢,為0.26~0.60之範圍內之值。From the results shown in Table 5, it can be seen that the effectiveness of the present invention has been confirmed through Examples 5-1 to 5-14. The feature of the present invention is that in the control form of using the above two gases in a pit furnace , the first nitriding step is carried out at a temperature of 500°C to 590°C, the second nitriding step is also carried out at a temperature of 500°C to 590°C, and the third nitriding step is also carried out at a temperature of 500°C to 590°C. When implemented at a certain temperature, the first nitriding potential is in the range of 0.10 to 1.00, the second nitriding potential is higher than the first nitriding potential and is in the range of 0.30 to 10.00, and the third nitriding potential is lower than the first nitriding potential. 2Nitridation potential is a value in the range of 0.26 to 0.60.
另一方面,藉由比較例5-1~5-8證實了:於500℃~590℃之溫度範圍內,若將第2氮化處理步驟中之氮化勢設為0.25以下,則亦析出硬度低於γ'相之α相,從而耐點蝕性或彎曲疲勞強度不足。On the other hand, it was confirmed from Comparative Examples 5-1 to 5-8 that if the nitriding potential in the second nitriding step is set to 0.25 or less in the temperature range of 500°C to 590°C, precipitation will also occur. The hardness of the α phase is lower than that of the γ' phase, resulting in insufficient pitting corrosion resistance or bending fatigue strength.
[實施例6-1~6-14、比較例6-1~6-8] 對於複數個圓筒狀環齒輪(鋼種可不同),使用坑式熱處理爐201,按照作為圖11示出之表6中之條件實施2個階段之氮化處理。 [Examples 6-1 to 6-14, Comparative Examples 6-1 to 6-8] For a plurality of cylindrical ring gears (the steel types may be different), a pit-type heat treatment furnace 201 is used to perform a two-stage nitriding treatment according to the conditions in Table 6 shown in FIG. 11 .
於實施例6-1~6-14、比較例6-1~6-8中,第1氮化處理步驟至第3氮化處理步驟係於同一坑式熱處理爐201內按順序實施。In Examples 6-1 to 6-14 and Comparative Examples 6-1 to 6-8, the first to third nitriding steps are performed sequentially in the same pit heat treatment furnace 201.
又,於實施例6-1~6-14、比較例6-1~6-8之第1氮化處理步驟中,使用NH 3氣體及AX氣體這兩種氣體,將NH 3氣體及AX氣體之一之導入量設為固定並一面改變另一者之導入量,藉此進行控制以使第1氮化處理步驟中之氮化勢成為目標之第1氮化勢(K N)。 Furthermore, in the first nitriding treatment steps of Examples 6-1 to 6-14 and Comparative Examples 6-1 to 6-8, two gases, NH 3 gas and AX gas, were used, and the NH 3 gas and AX gas were One of the introduced amounts is fixed and the other introduced amount is changed, thereby controlling so that the nitriding potential in the first nitriding treatment step becomes the target first nitriding potential (K N ).
又,於實施例6-1~6-14、比較例6-1~6-8之第2氮化處理步驟中,使用NH 3氣體、AX氣體及N 2氣體這3種氣體,將NH 3氣體及AX氣體之一之導入量設為固定並一面改變另一者之導入量,藉此進行控制以使第2氮化處理步驟中之氮化勢成為目標之第2氮化勢(K N)。 Furthermore, in the second nitriding step of Examples 6-1 to 6-14 and Comparative Examples 6-1 to 6-8, three gases, namely NH 3 gas, AX gas and N 2 gas, were used to convert NH 3 The introduction amount of one of the gas and AX gas is fixed while changing the introduction amount of the other, thereby controlling so that the nitriding potential in the second nitriding treatment step becomes the target second nitriding potential (K N ).
又,於實施例6-1~6-14、比較例6-1~6-8之第3氮化處理步驟中,使用NH 3氣體及AX氣體這兩種氣體,將NH 3氣體及AX氣體之一之導入量設為固定並一面改變另一者之導入量,藉此進行控制以使第1氮化處理步驟中之氮化勢成為目標之第1氮化勢(K N)。 Moreover, in the third nitriding treatment step of Examples 6-1 to 6-14 and Comparative Examples 6-1 to 6-8, two gases, NH 3 gas and AX gas, were used, and the NH 3 gas and AX gas were One of the introduced amounts is fixed and the other introduced amount is changed, thereby controlling so that the nitriding potential in the first nitriding treatment step becomes the target first nitriding potential (K N ).
於實施例6-1~6-14、比較例6-1~6-8中,於第1氮化處理步驟至第3氮化處理步驟前後實施使用圖4所說明之各步驟。In Examples 6-1 to 6-14 and Comparative Examples 6-1 to 6-8, each step explained using FIG. 4 was performed before and after the first nitriding step to the third nitriding step.
表6中之相之鑑定方法及化合物層厚度以與表1至表5中之該等相同之方式判定。The phase identification methods and compound layer thicknesses in Table 6 were determined in the same manner as those in Tables 1 to 5.
根據表6所示之結果可知,藉由實施例6-1~6-14,本發明之有效性得到證實,本發明之特徵在於:於在坑式爐中使用上述3種氣體之控制形態中,第1氮化處理步驟於500℃~590℃之溫度下實施,第2氮化處理步驟亦於500℃~590℃之溫度下實施,第3氮化處理步驟亦於500℃~590℃之溫度下實施,第1氮化勢為0.10~1.00之範圍內之值,第2氮化勢高於第1氮化勢,為0.30~10.00之範圍內之值,第3氮化勢低於第2氮化勢,為0.26~0.60之範圍內之值。From the results shown in Table 6, it can be seen that the effectiveness of the present invention was confirmed through Examples 6-1 to 6-14. The feature of the present invention is that in the control form of using the above three gases in a pit furnace , the first nitriding step is carried out at a temperature of 500°C to 590°C, the second nitriding step is also carried out at a temperature of 500°C to 590°C, and the third nitriding step is also carried out at a temperature of 500°C to 590°C. When implemented at a certain temperature, the first nitriding potential is in the range of 0.10 to 1.00, the second nitriding potential is higher than the first nitriding potential and is in the range of 0.30 to 10.00, and the third nitriding potential is lower than the first nitriding potential. 2Nitridation potential is a value in the range of 0.26 to 0.60.
另一方面,藉由比較例6-1~6-8證實了:於500℃~590℃之溫度範圍內,若將第2氮化處理步驟中之氮化勢設為0.25以下,則亦析出硬度低於γ'相之α相,從而耐點蝕性或彎曲疲勞強度不足。On the other hand, it was confirmed from Comparative Examples 6-1 to 6-8 that if the nitriding potential in the second nitriding step is set to 0.25 or less in the temperature range of 500°C to 590°C, precipitation will also occur. The hardness of the α phase is lower than that of the γ' phase, resulting in insufficient pitting corrosion resistance or bending fatigue strength.
1:熱處理爐 10:搬入部 11:加熱室 12:搬送室 13:搬出輸送器 20:盒體 21:門 22:入口罩 26:風扇 27:中間門 30:升降機 31:冷卻室(油槽) 35:門 36:出口罩 201:熱處理爐 211:爐壁 212:爐蓋 213:風扇 214:風扇馬達 221:蒸餾罐 222:氣體引導筒 1:Heat treatment furnace 10: Move-in department 11:Heating chamber 12:Transportation room 13: Move out the conveyor 20:Box body 21:door 22: Put on the mask 26:Fan 27:Middle door 30: Lift 31: Cooling room (oil tank) 35:door 36:Take out the mask 201:Heat treatment furnace 211:furnace wall 212:furnace cover 213:Fan 214:Fan motor 221:Distillation tank 222:Gas guide tube
圖1係本發明之氮化處理方法所使用之分批型熱處理爐之構成概略圖。 圖2係使用圖1之熱處理爐之本發明之氮化處理方法之一實施方式之步驟圖。 圖3係本發明之氮化處理方法所使用之坑式(單室型)熱處理爐之構成概略圖。 圖4係使用圖3之熱處理爐之本發明之氮化處理方法之一實施方式之步驟圖。 圖5係本發明之氮化處理方法所使用之橫置式(單室型)熱處理爐之構成概略圖。 圖6係表示本發明之實施例及比較例之氮化條件及處理結果之表。 圖7係表示本發明之實施例及比較例之氮化條件及處理結果之表。 圖8係表示本發明之實施例及比較例之氮化條件及處理結果之表。 圖9係表示本發明之實施例及比較例之氮化條件及處理結果之表。 圖10係表示本發明之實施例及比較例之氮化條件及處理結果之表。 圖11係表示本發明之實施例及比較例之氮化條件及處理結果之表。 Figure 1 is a schematic diagram of the structure of a batch-type heat treatment furnace used in the nitriding treatment method of the present invention. FIG. 2 is a step diagram of one embodiment of the nitriding treatment method of the present invention using the heat treatment furnace of FIG. 1 . Figure 3 is a schematic diagram of the structure of a pit-type (single-chamber type) heat treatment furnace used in the nitriding treatment method of the present invention. FIG. 4 is a step diagram of one embodiment of the nitriding treatment method of the present invention using the heat treatment furnace of FIG. 3 . Figure 5 is a schematic diagram of the structure of a horizontal (single chamber type) heat treatment furnace used in the nitriding treatment method of the present invention. FIG. 6 is a table showing nitriding conditions and treatment results of Examples and Comparative Examples of the present invention. FIG. 7 is a table showing nitriding conditions and treatment results of Examples and Comparative Examples of the present invention. FIG. 8 is a table showing nitriding conditions and treatment results of Examples and Comparative Examples of the present invention. FIG. 9 is a table showing nitriding conditions and treatment results of Examples and Comparative Examples of the present invention. FIG. 10 is a table showing nitriding conditions and treatment results of Examples and Comparative Examples of the present invention. FIG. 11 is a table showing nitriding conditions and treatment results of Examples and Comparative Examples of the present invention.
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