TWI826037B - Imprint forming method for uv optical film - Google Patents

Abstract

The present invention provides an imprint forming method for an UV optical film, which includes: manufacturing an imprinting stamp that is formed by coating a photoresist layer onto an outer surface of a carrier and then irradiating an UV exposure light onto the photoresist layer through a mask or interference so as to form an unit pattern layer; using the imprinting stamp to one-by-one stamp on areas of an UV optical film, such that each of the areas is formed as a patterned area by having an unit pattern, and any two of the patterned areas adjacent to each other have a gap therebetween that is less than or equal to 10 μm; and using an UV curing light to one-by-one solidify the patterned areas of the UV optical film after being stamped by the imprinting stamp.

Description

Imprint forming method of UV optical film

The present invention relates to a forming method of an optical film, and in particular to an imprint forming method of an ultraviolet optical film.

Most of the existing optical film forming methods use rolling methods, but the above-mentioned rolling methods have their limitations (for example, the patterned roller used for rolling is difficult to adjust or modify, thus causing the patterned roller's graphics to be distorted or Defects are difficult to eliminate). Therefore, the inventor believed that the above-mentioned defects could be improved, so he devoted himself to research and applied scientific principles, and finally proposed an invention that is reasonably designed and effectively improves the above-mentioned defects.

Embodiments of the present invention provide an imprint forming method for ultraviolet optical films, which can effectively improve defects that may occur in existing optical film forming methods.

An embodiment of the present invention discloses an imprint forming method of an ultraviolet optical film, which includes: performing a stamp manufacturing step: manufacturing an imprint stamp, and the manufacturing process includes: coating a photoresist layer on the outer surface of a carrier; and An exposed ultraviolet ray is irradiated on the photoresist layer through a mask or interference, so that the photoresist layer forms a unit pattern layer; wherein the unit pattern layer and the carrier together form the imprint stamp; Implementation An embossing step: Use the embossing stamp to emboss multiple areas of an ultraviolet optical film one by one, so that each area is embossed to form a unit pattern to form a patterned area; wherein, A gap of no more than 10 microns (μm) is retained between any two adjacent patterned areas; and a curing step is performed: irradiating and curing the embossed stamps one by one with a curing ultraviolet ray. a plurality of the patterned areas of the ultraviolet optical film.

In summary, the imprint forming method of the ultraviolet optical film disclosed in the embodiment of the present invention adopts a method that is different from the roll forming method to achieve rapid formation of multiple patterned areas of the ultraviolet optical film. Forming, and if the unit pattern in the patterned area is distorted, the imprint forming method of the ultraviolet optical film is also conducive to immediate adjustment to achieve the effect of fine-tuning or repairing the patterned area.

In order to further understand the characteristics and technical content of the present invention, please refer to the following detailed description and drawings of the present invention. However, these descriptions and drawings are only used to illustrate the present invention and do not make any reference to the protection scope of the present invention. limit.

The following is a specific example to illustrate the implementation of the "imprint forming method of ultraviolet optical film" disclosed in the present invention. Those skilled in the art can understand the advantages and effects of the present invention from the content disclosed in this specification. The present invention can be implemented or applied through other different specific embodiments, and various details in this specification can also be modified and changed based on different viewpoints and applications without departing from the concept of the present invention. In addition, the drawings of the present invention are only simple schematic illustrations and are not depictions based on actual dimensions, as is stated in advance. The following embodiments will further describe the relevant technical content of the present invention in detail, but the disclosed content is not intended to limit the scope of the present invention.

It should be understood that although terms such as “first”, “second” and “third” may be used herein to describe various elements or signals, these elements or signals should not be limited by these terms. These terms are primarily used to distinguish one component from another component or one signal from another signal. In addition, the term "or" used in this article shall include any one or combination of more of the associated listed items depending on the actual situation.

[Example 1]

Please refer to FIG. 1 to FIG. 7 , which is Embodiment 1 of the present invention. This embodiment discloses an imprint forming method of ultraviolet optical film and an optical film forming equipment 100. For ease of understanding, the optical film forming equipment 100 will be introduced first, and then the imprint forming method of the ultraviolet optical film will be described.

It should be noted that the imprint forming method of the ultraviolet optical film is implemented by the optical film forming equipment 100 in this embodiment, but the invention is not limited thereto. For example, in other embodiments not shown in the present invention, the imprint forming method of the ultraviolet optical film can also be implemented by other equipment.

In this embodiment, as shown in Figures 1 and 2, the optical film forming equipment 100 includes an embossing stamp 1, a curing light source 2 configured corresponding to the embossing stamp 1, and a light source 2 connected to the embossing stamp. 1, a displacement mechanism 3 of the curing light source 2, and a workbench 4 carrying the displacement mechanism 3. In this embodiment, the embossing stamp 1 and the displacement mechanism 3 are described as being matched with the curing light source 2, but the invention is not limited thereto. For example, in other embodiments not shown in the present invention, the embossing stamp 1 and the displacement mechanism 3 can also be jointly defined as an optical film embossing device, which can be used separately (such as: sales ) or it is used by other components.

The embossed stamp 1 includes a carrier 11 and a unit pattern layer 12 formed on the carrier 11 , and the unit pattern layer 12 is formed on the outer surface of the carrier 11 through ultraviolet exposure and development. Furthermore, the embossing stamp 1 and the curing light source 2 are both installed on the displacement mechanism 3, so that the embossing stamp 1 and the curing light source 2 can be independently moved through the displacement mechanism 3. Move along a height direction H, a lateral movement direction W, and a longitudinal movement direction L that are orthogonal to each other.

The above is a brief structural description of the optical film forming equipment 100. Next, the imprint forming method of the ultraviolet optical film implemented by the optical film forming equipment 100 will be introduced, but the present invention is not limited thereto. In this embodiment, the imprinting and forming method of the ultraviolet optical film mainly includes a stamp manufacturing step S110, an imprinting step S120, and a curing step S130.

The stamp manufacturing step S110: As shown in Figures 1 and 2, the embossed stamp 1 is manufactured, and the manufacturing process of the embossed stamp 1 includes coating a photoresist layer 12a on the outer surface of the carrier 11 ; and irradiate the photoresist layer 12a with an exposure ultraviolet UV through the mask M or interference, so that the photoresist layer 12a constitutes the unit pattern layer 12. That is to say, the unit pattern layer 12 and the carrier 11 together constitute the embossed stamp 1 in this embodiment.

It should be noted that the carrier 11 is a glass carrier or a silicone carrier in this embodiment, but is not limited thereto. Furthermore, the stamp manufacturing step S110 in this embodiment does not use any nickel metal material; that is to say, any manufacturing step using nickel metal is not the stamp manufacturing step S110 in this embodiment.

The imprinting step S120: As shown in Figure 1, Figure 3 and Figure 4, the imprint stamp 1 is imprinted on multiple areas 201 of an ultraviolet optical film 200 one by one, so that each area 201 is imprinted to form a unit pattern to form a patterned area 202; wherein, a gap 203 of no more than 10 microns (μm) remains between any two adjacent patterned areas 202.

Furthermore, when the optical film forming equipment 100 is used, the optical film forming equipment 100 can use the displacement mechanism 3 to drive the embossing stamps 1 to imprint on multiple portions of the ultraviolet optical film 200 one by one. on the regions 201 so that each of the regions 201 is imprinted into the patterned region 202 . Wherein, the gap 203 between any two adjacent patterned areas 202 (or any two adjacent multiple areas 201) can be retained and maintained at no more than 10 microns by the displacement mechanism 3. size to meet more pattern forming requirements.

The curing step S130: As shown in FIG. 1, FIG. 4 and FIG. 5, a curing ultraviolet ray 21 is used to irradiate and cure the plurality of ultraviolet optical films 200 embossed by the embossed stamp 1 one by one. The patterned area 202. In order to prevent the unit pattern layer 12 of the embossed stamp 1 from being damaged by the curing ultraviolet rays, the preset exposure wavelength of the exposure ultraviolet rays is preferably within the predetermined wavelength of the curing ultraviolet rays 21 . It is assumed that it is outside the photocuring wavelength band, but the present invention is not limited thereto.

In this embodiment, the predetermined exposure wavelength may be at least less than 100 nanometers compared to the predetermined photocuring wavelength band. For example, the preset exposure wavelength can be between 190 nanometers (nm) and 250 nanometers, and the preset photocuring wavelength band is preferably between 350 nanometers and 410 nanometers, but this is not the case. is limited.

Furthermore, when the optical film forming equipment 100 is used, the curing light source 2 can be used to emit the curing ultraviolet 21 whose wavelength falls within the preset light curing band, and through the displacement mechanism 3 To drive the curing light source 2 so that the curing light source 2 moves along the plurality of patterned areas 202 embossed by the embossed stamp 1, and emits the curing ultraviolet ray 21 to irradiate and cure one by one. .

It should be noted that, in this embodiment, the imprinting step S120 and the curing step S130 are explained by partially overlapping the execution time course (that is, when the Nth region 201 of the ultraviolet optical film 200 When being imprinted, the N-1th patterned area 202 may be cured, and N is a positive integer greater than 1), but the present invention is not limited thereto. For example, the curing step S130 may also be performed after the plurality of areas 201 of the ultraviolet optical film 200 are imprinted into a plurality of patterned areas 202, thereby curing multiple areas 202 at the same time. The patterned area 202 is described.

Accordingly, the imprint forming method of the ultraviolet optical film disclosed in this embodiment adopts a method different from roll forming to realize the formation of the plurality of patterned areas 202 of the ultraviolet optical film 200. Rapid prototyping, and if the unit pattern in the patterned area 202 is distorted, the imprint forming method of the ultraviolet optical film is also conducive to immediate adjustment to fine-tune or repair the patterned area 202 Effect (this situation may not occur, but this imprinting forming method has the function of fine-tuning or repairing).

Furthermore, as shown in FIGS. 1 and 6 , if the unit pattern formed in any of the patterned areas 202 of the ultraviolet optical film 200 is distorted, it can be In the curing step S130, an optical proximity correction (OPC) operation is performed based on the unit pattern of at least one of the patterned areas 202 to adjust the intensity distribution of the curing ultraviolet ray 21 (as shown in Figure 6 : Strengthen the outer curing strength of the curing ultraviolet ray 21), and then continuously irradiate and cure the patterned area 202 of the ultraviolet optical film 200 imprinted by the imprinting stamp 1, so as to achieve fine-tuning or repair. The effect of the patterned area 202.

That is to say, when the optical film forming apparatus 100 is used, the curing light source 2 can perform the optical proximity correction operation through the shape of at least one of the patterned areas 202 to adjust the light emitted by the curing light source 2 . The intensity distribution of the curing ultraviolet ray 21 is used to achieve the effect of fine-tuning or repairing the patterned area 202.

In addition, as shown in FIGS. 1 and 7 , if the unit pattern formed in any of the patterned areas 202 of the ultraviolet optical film 200 is distorted, the unit pattern can also be changed by changing the patterned area 202 of the ultraviolet optical film 200 . Describe the embossed stamp 1 to improve this situation. That is to say, after the curing step S130, an optical proximity correction operation is performed according to the unit pattern of at least one of the patterned areas 202 to implement a correction stamp manufacturing step S140 to manufacture a correction embossing stamp 1 ', and then use the corrected embossed stamp 1' to continue the previously described embossing step S120 and the curing step S130 (not shown).

Furthermore, the manufacturing process of the correction embossing stamp 1' includes: coating another photoresist layer 12a' on the outer surface of another carrier 11'; adjusting the exposure ultraviolet rays through the optical proximity correction operation UV intensity distribution (as shown in Figure 7: strengthening the outer exposure intensity of the exposed ultraviolet ray UV); and using the adjusted exposure ultraviolet ray UV to form a predetermined light shape through the mask M or interference, and then irradiate the The other photoresist layer 12a' is formed into a modified unit pattern layer 12'. Wherein, the corrected unit pattern layer 12' and the other carrier 11' together constitute the corrected embossed stamp 1'.

[Example 2]

Please refer to FIG. 8 and FIG. 9 , which is Embodiment 2 of the present invention. Since this embodiment is similar to the above-mentioned Embodiment 1, the similarities between the two embodiments will not be described in detail. The differences between this embodiment and the above-mentioned Embodiment 1 are roughly described as follows:

In the stamp manufacturing step S110 of this embodiment, a fluorine compound layer 13 is formed on the outer surface of the unit pattern layer 12 . The fluorine compound layer 13 , the unit pattern layer 12 , and the carrier 11 together constitute the embossed stamp 1 . That is to say, the embossed stamp 1 further includes the fluorine compound layer 13 formed on the outer surface of the unit pattern layer 12, which is, for example, a polytetrafluoroethylene (PTFE) layer, but the invention is not limited thereto. Here it is.

Furthermore, in the stamp manufacturing step S110 , the fluorine compound layer 13 is completely covered on the outer surface of the unit pattern layer 12 through evaporation. Furthermore, in the curing step S130, the curing ultraviolet 21 irradiated on the embossed stamp 1 can be reflected by at least 70% by the fluorine compound layer 13, and if the embossed stamp 1 is subjected to the When the irradiation of curing ultraviolet 21 causes cracks 121 to occur on the outer surface of the unit pattern layer 12 , the outer surface with the cracks 121 can maintain its shape through the fluorine compound layer 13 .

Accordingly, the fluorine compound layer 13 can effectively join the area of the unit pattern layer 12 located next to the crack 121, so that the unit pattern layer 12 still presents a predetermined appearance, thereby avoiding the pressure. The stamp 1 is distorted when imprinting the ultraviolet optical film 200 .

As mentioned above, in view of the fact that the fluorine compound layer 13 can not only prevent the unit pattern layer 12 from being damaged by the curing ultraviolet ray 21 , but also prevent the unit pattern layer 12 from being damaged by the curing ultraviolet ray 21 . Crack 121, the fluorine compound layer 13 can still maintain the predetermined appearance and avoid distortion of the transfer pattern, so the curing ultraviolet ray 21 and the exposure ultraviolet ray UV can use the same light source according to the design requirements in this embodiment. This effectively reduces overall equipment costs.

In addition, when the embossed stamp 1 is separated from the ultraviolet optical film 200 after being embossed, the fluorine compound layer 13 can help the embossed stamp 1 and the ultraviolet optical film 200 to separate from each other. 200 to more effectively avoid the occurrence of residual glue between the two, thereby improving the accuracy of the patterned area 202 of the ultraviolet optical film 200.

[Technical effects of the embodiments of the present invention]

In summary, the imprint forming method of the ultraviolet optical film disclosed in the embodiment of the present invention adopts a method that is different from the roll forming method to achieve rapid formation of multiple patterned areas of the ultraviolet optical film. Forming, and if the unit pattern is distorted in the patterned area, the imprint forming method of the ultraviolet optical film is also conducive to immediate adjustment to achieve the effect of fine-tuning or repairing the patterned area (this This may or may not be the case, but the imprint forming method has the ability to fine-tune or repair this.)

The contents disclosed above are only preferred and feasible embodiments of the present invention, and do not limit the patent scope of the present invention. Therefore, all equivalent technical changes made by using the description and drawings of the present invention are included in the patent scope of the present invention. within.

100: Optical film forming equipment 1: Embossed stamp 11: Carrier 12a: Photoresist layer 12:Unit pattern layer 121:Crack 13:Fluorine compound layer 2: Curing light source 21: Curing UV 3: Displacement mechanism 4:Workbench 1’: Correction embossed stamp 11’: another carrier 12a’: Another photoresist layer 12’:Corrected unit pattern layer 200:UV optical film 201:Region 202:Patterned area 203: Gap M: photomask UV: Exposure to ultraviolet rays H: height direction W: traverse direction L: Longitudinal movement direction S110: Stamp manufacturing steps S120: Imprinting step S130: Curing step S140: Correction stamp manufacturing steps

Figure 1 is a schematic three-dimensional view of the optical film forming equipment according to Embodiment 1 of the present invention.

2 is a schematic diagram of the stamp manufacturing steps of the imprint forming method of the ultraviolet optical film according to Embodiment 1 of the present invention.

3 to 5 are schematic diagrams of the imprinting step and the curing step of the imprinting and forming method of the ultraviolet optical film according to Embodiment 1 of the present invention.

6 is a schematic diagram of the optical proximity correction operation in the curing step of the imprint forming method of the ultraviolet optical film according to Embodiment 1 of the present invention.

7 is a schematic diagram of the correction stamp manufacturing steps of the imprint forming method of the ultraviolet optical film according to Embodiment 1 of the present invention.

Figure 8 is a schematic diagram of an embossed stamp according to Embodiment 2 of the present invention.

9 is a schematic diagram of the imprinting step and the curing step of the imprinting and forming method of the ultraviolet optical film according to Embodiment 2 of the present invention.

100: Optical film forming equipment

1: Embossed stamp

11: Carrier

12:Unit pattern layer

2: Curing light source

21: Curing UV

3: Displacement mechanism

4:Workbench

200:UV optical film

202:Patterned area

203: Gap

H: height direction

L: Longitudinal movement direction

S130: Curing step

Claims (9)

An embossing and forming method for an ultraviolet optical film, which includes: implementing a stamp manufacturing step: manufacturing an embossed stamp and the manufacturing process includes: coating a photoresist layer on the outer surface of a carrier; and exposing ultraviolet light through the light Cover or interfere and irradiate the photoresist layer, so that the photoresist layer forms a unit pattern layer; wherein the unit pattern layer and the carrier together constitute the imprint stamp; perform an imprint step: The embossing stamp is used to emboss multiple areas of an ultraviolet optical film one by one, so that each area is embossed to form a unit pattern to form a patterned area; wherein any two adjacent areas are embossed to form a unit pattern. A gap of no more than 10 microns (μm) is retained between the patterned areas; and a curing step is performed: irradiating and curing the ultraviolet optics embossed by the embossed stamp with a curing ultraviolet ray one by one. A plurality of the patterned areas of the film; wherein the preset exposure wavelength of the exposure ultraviolet light falls outside the preset photocuring wavelength band of the curing ultraviolet light, and the preset exposure wavelength is compared with the preset It is assumed that the photocuring wavelength band is at least less than 100 nanometers. The imprint forming method of an ultraviolet optical film according to claim 1, wherein in the curing step, an optical proximity correction is performed based on the unit pattern of at least one of the patterned areas. OPC) operation to adjust the intensity distribution of the curing ultraviolet light, and then continuously irradiate and cure the patterned area of the ultraviolet optical film imprinted by the imprinting stamp. The imprint forming method of an ultraviolet optical film according to claim 1, wherein after the curing step, the method according to the single pattern of at least one of the patterned areas is The pattern is used to perform an optical proximity correction operation to implement a correction stamp manufacturing step: manufacturing a correction embossing stamp and the manufacturing process includes: coating another photoresist layer on the outer surface of another carrier; passing the optical Close the correction operation to adjust the intensity distribution of the exposure ultraviolet light; and use the adjusted exposure ultraviolet light to form a predetermined light shape through a mask or interference, and then irradiate the other photoresist layer, so that the other photoresist layer A photoresist layer constitutes a corrected unit pattern layer; wherein the corrected unit pattern layer and the other carrier together form the corrected embossing stamp. The imprint forming method of an ultraviolet optical film according to claim 1, wherein in the stamp manufacturing step, a fluorine compound layer is formed on the outer surface of the unit pattern layer; wherein, the fluorine compound layer , the unit pattern layer, and the carrier together constitute the embossed stamp. The imprint forming method of an ultraviolet optical film according to claim 4, wherein in the stamp manufacturing step, the fluorine compound layer completely covers all parts of the unit pattern layer by evaporation. on the outer surface. The imprint forming method of an ultraviolet optical film according to claim 5, wherein the fluorine compound layer is further defined as a polytetrafluoroethylene (PTFE) layer. The imprint forming method of an ultraviolet optical film according to claim 4, wherein in the curing step, the imprint stamp is irradiated by the curing ultraviolet light, so that the outer surface of the unit pattern layer Cracks are generated on the surface; wherein, the outer surface on which the cracks are formed maintains its shape by the fluorine compound layer. The imprint forming method of an ultraviolet optical film according to claim 4, wherein in the curing step, at least 70% of the curing ultraviolet light irradiated on the imprint stamp is reflected by the fluorine compound layer. The imprinting and forming method of ultraviolet optical film according to claim 1, wherein the carrier of the imprinted stamp is a glass carrier or a silicone carrier, and no nickel metal material is used in the stamp manufacturing step. .

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