TWI823325B - Optical lens assembly, imaging apparatus and electronic device - Google Patents
Optical lens assembly, imaging apparatus and electronic device Download PDFInfo
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本揭示內容是有關於一種光學鏡頭及取像裝置,且特別是有關於一種應用在電子裝置上且具有高反射效果的光學鏡頭及取像裝置。 The present disclosure relates to an optical lens and an image capturing device, and in particular, to an optical lens and an image capturing device that are used in electronic devices and have a high reflective effect.
傳統反射元件的反射鍍膜容易因膜層的材料配置不當或環境因素,而導致膜裂缺陷之問題,且反射鍍膜不論是在可見光區域或是紅外線區域,其反射效率均不足,無法達到符合需求的反射效果,因此亟需發展具有特定膜層組合配置的技術來克服上述問題。 The reflective coating of traditional reflective elements is prone to film crack defects due to improper material configuration of the film layer or environmental factors. Moreover, the reflection efficiency of the reflective coating is insufficient in both the visible light region and the infrared region, and cannot meet the requirements. Reflection effect, so there is an urgent need to develop technology with specific film layer combination configurations to overcome the above problems.
本揭示內容提供的光學鏡頭、取像裝置及電子裝置,透過配置具有高反射效果的膜層組合,具有優異高效率反射光線的轉折光線路徑之能力,更可以有效避免反射鍍膜產生膜裂問題。 The optical lens, imaging device and electronic device provided in this disclosure have the ability to turn the light path of reflected light with excellent and high efficiency by configuring a combination of film layers with high reflective effects, and can effectively avoid the problem of film cracks in the reflective coating.
依據本揭示內容一實施方式提供一種光學鏡頭,其 包含至少二光學鏡片以及至少一反射元件。反射元件由塑膠材料所製成,反射元件包含一反射鍍膜及一基材,反射鍍膜位於基材的一表面。反射鍍膜包含不同材質的至少三膜層,其中三膜層分別由第一材料、第二材料及第三材料所製成,第一材料主要包含銀,第二材料主要包含鈦,第三材料主要包含鉻氧化物,且第一材料及第二材料製成的膜層位於第三材料製成的膜層與基材之間。反射鍍膜於波長800nm至1000nm的平均反射率為R80100,其滿足下列條件:97.5%R80100。 According to an embodiment of the present disclosure, an optical lens is provided, which includes at least two optical lenses and at least one reflective element. The reflective element is made of plastic material. The reflective element includes a reflective coating and a base material. The reflective coating is located on a surface of the base material. The reflective coating includes at least three film layers of different materials. The three film layers are respectively made of a first material, a second material and a third material. The first material mainly includes silver, the second material mainly includes titanium, and the third material mainly includes titanium. It contains chromium oxide, and the film layer made of the first material and the second material is located between the film layer made of the third material and the substrate. The average reflectance of the reflective coating at wavelengths from 800nm to 1000nm is R80100, which meets the following conditions: 97.5% R80100.
依據前述實施方式的光學鏡頭,第二材料製成的膜層可以位於第三材料及第一材料製成的膜層之間。 According to the optical lens of the aforementioned embodiment, the film layer made of the second material may be located between the film layer made of the third material and the first material.
依據前述實施方式的光學鏡頭,反射鍍膜更可以包含由一第四材料所製成的一膜層,第四材料主要包含矽化合物,且第三材料製成的膜層可以位於第四材料及第一材料製成的膜層之間。 According to the optical lens of the aforementioned embodiment, the reflective coating may further include a film layer made of a fourth material. The fourth material mainly includes a silicon compound, and the film layer made of the third material may be located between the fourth material and the third material. between layers of film made of a material.
依據前述實施方式的光學鏡頭,反射鍍膜更可以包含由一第五材料所製成的一膜層,第五材料主要包含金屬氧化物,且第五材料製成的膜層可以位於第一材料製成的膜層與基材之間。 According to the optical lens of the aforementioned embodiment, the reflective coating may further include a film layer made of a fifth material. The fifth material mainly includes metal oxide, and the film layer made of the fifth material may be located on the first material. between the formed film layer and the substrate.
依據前述實施方式的光學鏡頭,反射鍍膜於波長400nm至1000nm的平均反射率為R40100,其可以滿足下列條件:98.0%R40100。 According to the optical lens of the aforementioned embodiment, the average reflectance of the reflective coating at wavelengths from 400nm to 1000nm is R40100, which can meet the following conditions: 98.0% R40100.
依據前述實施方式的光學鏡頭,反射鍍膜於波長850nm的反射率為R85,其可以滿足下列條件:98.0%≤ R85。According to the optical lens of the aforementioned embodiment, the reflectivity of the reflective coating at a wavelength of 850 nm is R85, which can meet the following conditions: 98.0% ≤ R85.
依據前述實施方式的光學鏡頭,反射鍍膜的總層數為tLs,其可以滿足下列條件:4 ≤ tLs。According to the optical lens of the aforementioned embodiment, the total number of reflective coating layers is tLs, which can satisfy the following conditions: 4 ≤ tLs.
依據前述實施方式的光學鏡頭,反射元件可以位於光學鏡頭的物側或像側。According to the optical lens of the aforementioned embodiment, the reflective element may be located on the object side or the image side of the optical lens.
依據前述實施方式的光學鏡頭,反射元件可以位於至少二光學鏡片之間。According to the optical lens of the aforementioned embodiment, the reflective element may be located between at least two optical lenses.
依據前述實施方式的光學鏡頭,反射元件可以為一稜鏡或一反射鏡。According to the optical lens of the aforementioned embodiment, the reflective element may be a lens or a reflective mirror.
依據前述實施方式的光學鏡頭,反射元件可水平移動地或可旋轉地設置於光學鏡頭的像側。According to the optical lens of the aforementioned embodiment, the reflective element is disposed on the image side of the optical lens in a horizontally movable or rotatable manner.
依據本揭示內容一實施方式提供一種取像裝置,其包含如前述實施方式的光學鏡頭以及一電子感光元件,且電子感光元件設置於光學鏡頭的一成像面。According to one embodiment of the present disclosure, an imaging device is provided, which includes the optical lens of the aforementioned embodiment and an electronic photosensitive element, and the electronic photosensitive element is disposed on an imaging surface of the optical lens.
依據本揭示內容一實施方式提供一種電子裝置,其為一行動裝置,且電子裝置包含如前述實施方式的取像裝置。According to an embodiment of the present disclosure, an electronic device is provided, which is a mobile device, and the electronic device includes the imaging device as in the foregoing embodiment.
當R80100滿足上述條件時,可以具有優異的反射近紅外線效果。When R80100 meets the above conditions, it can have excellent near-infrared reflection effect.
本揭示內容提供一種光學鏡頭,其包含至少二光學鏡片以及至少一反射元件。反射元件由塑膠材料所製成,反射元件包含一反射鍍膜及一基材,反射鍍膜位於基材的一表面。反射鍍膜包含不同材質的至少三膜層,其中三膜層分別由第一材料、第二材料及第三材料所製成,第一材料主要包含銀,第二材料主要包含鈦,第三材料主要包含鉻氧化物,且第一材料及第二材料製成的膜層位於第三材料製成的膜層與基材之間。 The present disclosure provides an optical lens, which includes at least two optical lenses and at least one reflective element. The reflective element is made of plastic material. The reflective element includes a reflective coating and a base material. The reflective coating is located on a surface of the base material. The reflective coating includes at least three film layers of different materials. The three film layers are respectively made of a first material, a second material and a third material. The first material mainly includes silver, the second material mainly includes titanium, and the third material mainly includes titanium. It contains chromium oxide, and the film layer made of the first material and the second material is located between the film layer made of the third material and the substrate.
藉此,本揭示內容的光學鏡頭所配置的反射元件具 有高反射效果的膜層組合,且具有優異高效率反射光線的轉折光線路徑之能力,更可以有效避免反射鍍膜產生膜裂問題。 Therefore, the reflective element configured in the optical lens of the present disclosure has The film combination has a high reflective effect and has the ability to turn the light path of reflected light with excellent high efficiency. It can also effectively avoid the problem of film cracks in the reflective coating.
反射鍍膜於波長800nm至1000nm的平均反射率為R80100,其滿足下列條件:95.0%R80100,藉此,可以具有優異的反射近紅外線效果。再者,其可滿足下列條件:95.5%R80100;96.0%R80100;96.5%R80100;97.0%R80100;97.5%R80100;98.0%R80100;或98.25%R80100。 The average reflectance of the reflective coating at wavelengths from 800nm to 1000nm is R80100, which meets the following conditions: 95.0% R80100, thereby, can have excellent near-infrared reflection effect. Furthermore, it satisfies the following conditions: 95.5% R80100;96.0% R80100;96.5% R80100;97.0% R80100;97.5% R80100;98.0% R80100; or 98.25% R80100.
第二材料製成的膜層可位於第三材料及第一材料製成的膜層之間,藉此,可以有效保護第一材料製成的膜層,以避免氧化並避免膜裂。 The film layer made of the second material can be located between the film layer made of the third material and the first material, thereby effectively protecting the film layer made of the first material from oxidation and film cracking.
反射鍍膜可更包含由第四材料所製成的一膜層,第四材料主要包含矽化合物,例如,可以為矽氧化物或矽氮化物等,且第三材料製成的膜層可以位於第四材料及第一材料製成的膜層之間,有助於提供更有效的膜層抗刮保護效果與抗氧化效果。 The reflective coating may further include a film layer made of a fourth material. The fourth material mainly includes a silicon compound, for example, it may be silicon oxide or silicon nitride, and the film layer made of the third material may be located on the third material. The film layers made of the four materials and the first material help to provide a more effective anti-scratch protection effect and anti-oxidation effect of the film layer.
反射鍍膜可更包含由第五材料所製成的一膜層,第五材料主要包含金屬氧化物,且第五材料製成的膜層可以位於第一材料製成的膜層與基材之間,有助於提升第一材料製成的膜層與基材之間的黏附效果。 The reflective coating may further include a film layer made of a fifth material. The fifth material mainly includes metal oxide, and the film layer made of the fifth material may be located between the film layer made of the first material and the substrate. , which helps to improve the adhesion effect between the film layer made of the first material and the substrate.
反射鍍膜於波長850nm的反射率為R85,其可滿足下列條件:95.0%R85,藉此,可以具有優異的反射近紅外線效果。再者,其可滿足下列條件:95.5%R85;96.0% ≤ R85;96.5% ≤ R85;97.0% ≤ R85;97.5% ≤ R85;98.0% ≤ R85;或98.2% ≤ R85。The reflectivity of the reflective coating at a wavelength of 850nm is R85, which can meet the following conditions: 95.0% R85, thereby, can have excellent near-infrared reflection effect. Furthermore, it satisfies the following conditions: 95.5% R85; 96.0% ≤ R85; 96.5% ≤ R85; 97.0% ≤ R85; 97.5% ≤ R85; 98.0% ≤ R85; or 98.2% ≤ R85.
反射鍍膜於波長400 nm至1000 nm的平均反射率為R40100,其可滿足下列條件:95.0% ≤ R40100,藉此,可以具有優異的反射可見光與近紅外線效果。再者,其可滿足下列條件:95.5% ≤ R40100;96.0% ≤ R40100;96.5% ≤ R40100;97.0% ≤ R40100;或98.0% ≤ R40100。The average reflectance of the reflective coating at wavelengths from 400 nm to 1000 nm is R40100, which can meet the following conditions: 95.0% ≤ R40100, thereby having excellent visible light and near-infrared reflection effects. Furthermore, it can meet the following conditions: 95.5% ≤ R40100; 96.0% ≤ R40100; 96.5% ≤ R40100; 97.0% ≤ R40100; or 98.0% ≤ R40100.
反射鍍膜的總層數為tLs,其可滿足下列條件:4 ≤ tLs,藉由完整的膜層組合,可以發揮保護與避免膜裂效果。The total number of layers of reflective coating is tLs, which can meet the following conditions: 4 ≤ tLs. Through the complete combination of film layers, the effect of protection and film cracking can be exerted.
反射元件可為具有轉折光路功能的元件,如稜鏡(Prism)或反射鏡(Mirror),藉由將反射鍍膜配置在適當的反射元件上,可以具有高成本效益。The reflective element can be an element with the function of turning the light path, such as a prism or a mirror. By arranging the reflective coating on the appropriate reflective element, it can be cost-effective.
反射元件可位於光學鏡頭的物側或像側,藉由適當位置的反射元件配置,有助於終端產品微型化。The reflective element can be located on the object side or the image side of the optical lens. By arranging the reflective element in an appropriate position, it helps to miniaturize the end product.
反射元件可位於所述光學鏡片之間,藉由適當位置的反射元件配置,有助於終端產品微型化。Reflective elements can be located between the optical lenses. By arranging reflective elements at appropriate positions, it can contribute to the miniaturization of end products.
反射元件可呈可水平移動地或可旋轉地設置於光學鏡頭的像側,藉此,反射元件可以達到對焦與防手震效果。The reflective element can be horizontally movable or rotatably disposed on the image side of the optical lens, whereby the reflective element can achieve focusing and anti-shake effects.
反射鍍膜於波長380 nm至1050 nm的平均反射率為R38105,其可滿足下列條件:95.0% ≤ R38105;95.5% ≤ R38105;96.0% ≤ R38105;96.5% ≤ R38105;或97.0% ≤ R38105。藉此,可以具有優異的反射可見光效果。The average reflectance of the reflective coating at wavelengths from 380 nm to 1050 nm is R38105, which can meet the following conditions: 95.0% ≤ R38105; 95.5% ≤ R38105; 96.0% ≤ R38105; 96.5% ≤ R38105; or 97.0% ≤ R38105. Thereby, excellent visible light reflection effect can be achieved.
反射鍍膜於波長400 nm至500 nm的平均反射率為R4050,其可滿足下列條件:94.0% ≤ R4050;94.5% ≤ R4050;或95.0% ≤ R4050。藉此,可以具有優異的反射可見光效果。The average reflectance of the reflective coating at a wavelength of 400 nm to 500 nm is R4050, which can meet the following conditions: 94.0% ≤ R4050; 94.5% ≤ R4050; or 95.0% ≤ R4050. Thereby, excellent visible light reflection effect can be achieved.
反射鍍膜於波長400 nm至600 nm的平均反射率為R4060,其可滿足下列條件:95.0% ≤ R4060;95.5% ≤ R4060;或96.0% ≤ R4060。藉此,可以具有優異的反射可見光效果。The average reflectance of the reflective coating at wavelengths from 400 nm to 600 nm is R4060, which can meet the following conditions: 95.0% ≤ R4060; 95.5% ≤ R4060; or 96.0% ≤ R4060. Thereby, excellent visible light reflection effect can be achieved.
反射鍍膜於波長400 nm至700 nm的平均反射率為R4070,其可滿足下列條件:95.0% ≤ R4070;95.5% ≤ R4070;96.0% ≤ R4070;或96.5% ≤ R4070。藉此,可以具有優異的反射可見光效果。The average reflectance of the reflective coating at wavelengths from 400 nm to 700 nm is R4070, which can meet the following conditions: 95.0% ≤ R4070; 95.5% ≤ R4070; 96.0% ≤ R4070; or 96.5% ≤ R4070. Thereby, excellent visible light reflection effect can be achieved.
反射鍍膜於波長650 nm至1050 nm的平均反射率為R65105,其可以滿足下列條件:95.0% ≤ R65105;95.5% ≤ R65105;96.0% ≤ R65105;96.5% ≤ R65105;97.0% ≤ R65105;97.5% ≤ R65105;或98.0% ≤ R65105。藉此,可以具有優異的反射近紅外線效果。The average reflectance of the reflective coating at wavelengths from 650 nm to 1050 nm is R65105, which can meet the following conditions: 95.0% ≤ R65105; 95.5% ≤ R65105; 96.0% ≤ R65105; 96.5% ≤ R65105; 97.0% ≤ R65105; 97.5% ≤ R65105; or 98.0% ≤ R65105. Thereby, it can have excellent near-infrared reflection effect.
反射鍍膜於波長700 nm至1000 nm的平均反射率為R70100,其可以滿足下列條件:95.0% ≤ R70100;95.5% ≤ R70100;96.0% ≤ R70100;96.5% ≤ R70100;97.0% ≤ R70100;97.5% ≤ R70100;98.0% ≤ R70100;或98.2% ≤ R70100。藉此,可以具有優異的反射近紅外線效果。The average reflectance of the reflective coating at wavelengths from 700 nm to 1000 nm is R70100, which can meet the following conditions: 95.0% ≤ R70100; 95.5% ≤ R70100; 96.0% ≤ R70100; 96.5% ≤ R70100; 97.0% ≤ R70100; 97.5% ≤ R70100; 98.0% ≤ R70100; or 98.2% ≤ R70100. Thereby, it can have excellent near-infrared reflection effect.
反射鍍膜於波長900 nm至1000 nm的平均反射率為R90100,其可以滿足下列條件:95.0% ≤ R90100;95.5% ≤ R90100;96.0% ≤ R90100;96.5% ≤ R90100;97.0% ≤ R90100;97.5% ≤ R90100;98.0% ≤ R90100;或98.25% ≤ R90100。藉此,可以具有優異的反射近紅外線效果。The average reflectance of the reflective coating at wavelength 900 nm to 1000 nm is R90100, which can meet the following conditions: 95.0% ≤ R90100; 95.5% ≤ R90100; 96.0% ≤ R90100; 96.5% ≤ R90100; 97.0% ≤ R90100; 97.5% ≤ R90100; 98.0% ≤ R90100; or 98.25% ≤ R90100. Thereby, it can have excellent near-infrared reflection effect.
反射鍍膜於波長450 nm的反射率為R45,其可滿足下列條件:94.0% ≤ R45;94.5% ≤ R45;95.0% ≤ R45;或95.5% ≤ R45。藉此,可以具有優異的反射可見光效果。The reflectivity of the reflective coating at a wavelength of 450 nm is R45, which can meet the following conditions: 94.0% ≤ R45; 94.5% ≤ R45; 95.0% ≤ R45; or 95.5% ≤ R45. Thereby, excellent visible light reflection effect can be achieved.
反射鍍膜於波長550 nm的反射率為R55,其可以滿足下列條件:95.0% ≤ R55;95.5% ≤ R55;96.0% ≤ R55;96.5% ≤ R55;或97.0% ≤ R55。藉此,可以具有優異的反射可見光效果。The reflectance of the reflective coating at a wavelength of 550 nm is R55, which can meet the following conditions: 95.0% ≤ R55; 95.5% ≤ R55; 96.0% ≤ R55; 96.5% ≤ R55; or 97.0% ≤ R55. Thereby, excellent visible light reflection effect can be achieved.
反射鍍膜於波長650 nm的反射率為R65,其可滿足下列條件:95.0% ≤ R65;95.5% ≤ R65;96.0% ≤ R65;96.5% ≤ R65;97.0% ≤ R65;或97.5% ≤ R65。藉此,可以具有優異的反射可見光效果。The reflectivity of the reflective coating at a wavelength of 650 nm is R65, which can meet the following conditions: 95.0% ≤ R65; 95.5% ≤ R65; 96.0% ≤ R65; 96.5% ≤ R65; 97.0% ≤ R65; or 97.5% ≤ R65. Thereby, excellent visible light reflection effect can be achieved.
反射鍍膜於波長750 nm的反射率為R75,其可滿足下列條件:95.0% ≤ R75;95.5% ≤ R75;96.0% ≤ R75;96.5% ≤ R75;97.0% ≤ R75;97.5% ≤ R75;或98.0% ≤ R75。藉此,可以具有優異的反射近紅外線效果。The reflectivity of the reflective coating at a wavelength of 750 nm is R75, which can meet the following conditions: 95.0% ≤ R75; 95.5% ≤ R75; 96.0% ≤ R75; 96.5% ≤ R75; 97.0% ≤ R75; 97.5% ≤ R75; or 98.0 % ≤ R75. Thereby, it can have excellent near-infrared reflection effect.
反射鍍膜於波長950 nm的反射率為R95,其可滿足下列條件:95.0% ≤ R95;95.5% ≤ R95;96.0% ≤ R95;96.5% ≤ R95;97.0% ≤ R95;97.5% ≤ R95;98.0% ≤ R95;或98.25% ≤ R95。藉此,可以具有優異的反射近紅外線效果。The reflectivity of the reflective coating at a wavelength of 950 nm is R95, which can meet the following conditions: 95.0% ≤ R95; 95.5% ≤ R95; 96.0% ≤ R95; 96.5% ≤ R95; 97.0% ≤ R95; 97.5% ≤ R95; 98.0% ≤ R95; or 98.25% ≤ R95. Thereby, it can have excellent near-infrared reflection effect.
反射鍍膜於波長1050 nm的反射率為R105,其可滿足下列條件:95.0% ≤ R105;95.5% ≤ R105;96.0% ≤ R105;96.5% ≤ R105;97.0% ≤ R105;97.5% ≤ R105;98.0% ≤ R105;或98.2% ≤ R105。藉此,可以具有優異的反射近紅外線效果。The reflectance of the reflective coating at a wavelength of 1050 nm is R105, which can meet the following conditions: 95.0% ≤ R105; 95.5% ≤ R105; 96.0% ≤ R105; 96.5% ≤ R105; 97.0% ≤ R105; 97.5% ≤ R105; 98.0% ≤ R105; or 98.2% ≤ R105. Thereby, it can have excellent near-infrared reflection effect.
第四材料製成的膜層厚度為Tsi,其可以滿足下列條件:10 nm ≤ Tsi ≤ 100 nm;20 nm ≤ Tsi ≤ 80 nm;或40 nm ≤ Tsi ≤ 70 nm。藉此,具保護作用。The thickness of the film layer made of the fourth material is Tsi, which can meet the following conditions: 10 nm ≤ Tsi ≤ 100 nm; 20 nm ≤ Tsi ≤ 80 nm; or 40 nm ≤ Tsi ≤ 70 nm. This has a protective effect.
第三材料製成的膜層厚度為Tcr,其可以滿足下列條件:5 nm ≤ Tcr ≤ 200 nm;10 nm ≤ Tcr ≤ 150 nm;或30 nm ≤ Tcr ≤ 100 nm。藉此,具保護作用與避免氧化。The thickness of the film layer made of the third material is Tcr, which can meet the following conditions: 5 nm ≤ Tcr ≤ 200 nm; 10 nm ≤ Tcr ≤ 150 nm; or 30 nm ≤ Tcr ≤ 100 nm. This provides protection and avoids oxidation.
第二材料製成的膜層厚度為Tti,其可滿足下列條件:1 nm ≤ Tti ≤ 50 nm;10 nm ≤ Tti ≤ 40 nm;或20 nm ≤ Tti ≤ 30 nm。藉此,可以避免膜裂問題。The thickness of the film layer made of the second material is Tti, which can meet the following conditions: 1 nm ≤ Tti ≤ 50 nm; 10 nm ≤ Tti ≤ 40 nm; or 20 nm ≤ Tti ≤ 30 nm. In this way, membrane cracking problems can be avoided.
第一材料製成的膜層厚度為Tag,其可滿足下列條件:50 nm ≤ Tag ≤ 250 nm;60 nm ≤ Tag ≤ 150 nm;或80 nm ≤ Tag ≤ 100 nm。藉此,可以強化反射效果。 The thickness of the film layer made of the first material is Tag, which can meet the following conditions: 50 nm ≤ Tag ≤ 250 nm; 60 nm ≤ Tag ≤ 150 nm; or 80 nm ≤ Tag ≤ 100 nm. In this way, the reflection effect can be enhanced.
第五材料製成的膜層厚度為Tmo,其可滿足下列條件:0nm<Tmo50nm;1nmTmo30nm;或Tmo25nm。藉此,可以強化膜層與基材的黏結效果。 The thickness of the film layer made of the fifth material is Tmo, which can meet the following conditions: 0nm<Tmo 50nm; 1nm Tmo 30nm; or Tmo 25nm. In this way, the bonding effect between the film layer and the substrate can be strengthened.
第四材料的折射率為N4,其可以滿足下列條件:N41.6。藉此,具保護作用。 The refractive index of the fourth material is N4, which can meet the following conditions: N4 1.6. This has a protective effect.
第三材料的折射率為N3,其可滿足下列條件:N32.0。藉此,具保護作用與避免氧化。 The refractive index of the third material is N3, which can meet the following conditions: N3 2.0. This provides protection and avoids oxidation.
第二材料的折射率為N2,其可滿足下列條件:N22.0。藉此,可以避免膜裂。 The refractive index of the second material is N2, which can meet the following conditions: N2 2.0. In this way, membrane cracks can be avoided.
第五材料的折射率為N5,其可滿足下列條件:1.6N51.7。藉此,可以強化膜層與基材的黏結效果。 The refractive index of the fifth material is N5, which can meet the following conditions: 1.6 N5 1.7. In this way, the bonding effect between the film layer and the substrate can be strengthened.
反射元件的折射率為Ns,其可滿足下列條件:Ns1.7。藉此,可以有效控制成本。 The refractive index of the reflective element is Ns, which can meet the following conditions: Ns 1.7. In this way, costs can be effectively controlled.
第一材料製成的膜層與第五材料製成的膜層的厚度比值為Tag/Tmo,其可滿足下列條件:1Tag/Tmo10;2Tag/Tmo8;或3Tag/Tmo7。藉此,可以強化膜層與基材的黏結效果與維持高反射效果。 The thickness ratio of the film layer made of the first material to the film layer made of the fifth material is Tag/Tmo, which can meet the following conditions: 1 Tag/Tmo 10;2 Tag/Tmo 8; or 3 Tag/Tmo 7. In this way, the bonding effect between the film layer and the substrate can be strengthened and the high reflective effect can be maintained.
第一材料製成的膜層與第二材料製成的膜層的厚度比值為Tag/Tti,其可滿足下列條件:1Tag/Tti10;2Tag/Tti8;或3Tag/Tti7。藉此,可以避免膜裂與強化反射效果。 The thickness ratio of the film layer made of the first material to the film layer made of the second material is Tag/Tti, which can meet the following conditions: 1 Tag/Tti 10;2 Tag/Tti 8; or 3 Tag/Tti 7. In this way, film cracks can be avoided and the reflection effect can be enhanced.
第三材料製成的膜層與第二材料製成的膜層的厚 度比值為Tcr/Tti,其可滿足下列條件:1Tcr/Tti10;1Tcr/Tti5;或1Tcr/Tti3。藉此,具保護作用與避免膜裂。 The thickness ratio of the film layer made of the third material to the film layer made of the second material is Tcr/Tti, which can meet the following conditions: 1 Tcr/Tti 10;1 Tcr/Tti 5; or 1 Tcr/Tti 3. This provides protection and prevents membrane cracks.
第三材料與第二材料製成的膜層總厚度與第一材料製成的膜層厚度的比值為(Tcr+Tti)/Tag,其可滿足下列條件:0<(Tcr+Tti)/Tag1.00;0.10(Tcr+Tti)/Tag0.80;或0.25(Tcr+Tti)/Tag0.70。藉此,具保護作用,可以避免氧化、避免膜裂與強化反射效果。 The ratio of the total thickness of the film layer made of the third material and the second material to the thickness of the film layer made of the first material is (Tcr+Tti)/Tag, which can satisfy the following conditions: 0<(Tcr+Tti)/Tag 1.00;0.10 (Tcr+Tti)/Tag 0.80; or 0.25 (Tcr+Tti)/Tag 0.70. This has a protective effect, preventing oxidation, film cracking and enhancing the reflective effect.
第四材料製成的膜層與第三材料製成的膜層的厚度比值為Tsi/Tcr,其可滿足下列條件:1Tsi/Tcr5;1Tsi/Tcr3;或1Tsi/Tcr2。藉此,具保護作用與避免氧化。 The thickness ratio of the film layer made of the fourth material to the film layer made of the third material is Tsi/Tcr, which can meet the following conditions: 1 Tsi/Tcr 5;1 Tsi/Tcr 3; or 1 Tsi/Tcr 2. This provides protection and avoids oxidation.
本揭示內容的光學鏡頭可在光學鏡片表面設置長波長濾除鍍膜,長波長濾除鍍膜係在塑膠材料表面上沉積多層薄膜,其使用物理氣相沉積法,如蒸發沉積法或濺射沉積法等,或使用化學氣相沉積法,如超高真空化學氣相沉積法、微波電漿輔助化學氣相沉積法或電漿增強化學氣相沉積法等。 The optical lens disclosed in this disclosure can be provided with a long-wavelength filter coating on the surface of the optical lens. The long-wavelength filter coating is a multi-layer film deposited on the surface of the plastic material using a physical vapor deposition method, such as evaporation deposition or sputtering deposition. etc., or use chemical vapor deposition methods, such as ultra-high vacuum chemical vapor deposition, microwave plasma-assisted chemical vapor deposition, or plasma-enhanced chemical vapor deposition.
本揭示內容的光學鏡頭可在光學鏡片內添加吸收材料,使其具有較佳的吸收均勻性,並使各視場的色均勻度一致。光學鏡頭中的光學鏡片可具有長波長吸收材料,長波長吸收材料與光學鏡片的塑膠材料混合且均勻分布其中,長波長吸收材料須能承受射出成型過程的高溫且不會 裂解,以維持應有的長波長吸收效果。光學鏡片另可具有短波長吸收材料,短波長吸收材料與光學鏡片的塑膠材料混合且均勻分布其中,短波長吸收材料須能承受射出成型過程的高溫且不會裂解,以維持應有的短波長吸收效果。本揭示內容所定義之長波長範圍為波長500nm以上區域,短波長範圍為波長500nm以下區域。 The optical lens disclosed in this disclosure can add absorbing materials in the optical lens, so that it has better absorption uniformity and makes the color uniformity of each field of view consistent. The optical lens in the optical lens can have a long-wavelength absorbing material. The long-wavelength absorbing material is mixed with the plastic material of the optical lens and evenly distributed therein. The long-wavelength absorbing material must be able to withstand the high temperature of the injection molding process and will not Cracking to maintain the proper long wavelength absorption effect. Optical lenses can also have short-wavelength absorbing materials. The short-wavelength absorbing materials are mixed with the plastic materials of the optical lenses and evenly distributed therein. The short-wavelength absorbing materials must be able to withstand the high temperatures of the injection molding process and not crack, in order to maintain the short wavelengths they should have. absorption effect. The long wavelength range defined in this disclosure is the area with a wavelength above 500 nm, and the short wavelength range is the area with a wavelength below 500 nm.
本揭示內容的反射率數據一般為單一反射元件的數據,若反射鍍膜配置在多個反射元件或多個表面上,則反射率數據可為經過多個反射元件或多個表面後的綜合數據。 The reflectance data in this disclosure is generally the data of a single reflective element. If the reflective coating is configured on multiple reflective elements or multiple surfaces, the reflectance data can be the comprehensive data after passing through multiple reflective elements or multiple surfaces.
塑膠光學鏡片因高溫導致面型變化誤差過大,當反射鍍膜的膜層數越多,則溫度影響面型精度的狀況越明顯。藉由鏡片補正技術,能有效解決塑膠光學鏡片表面鍍膜時的溫度效應問題,有助於維持光學鏡片的鍍膜完整性與塑膠光學鏡片的高精度,為達成高品質光學鏡頭的關鍵技術。 Plastic optical lenses have excessive surface shape changes due to high temperatures. The more layers of reflective coating there are, the more obvious the effect of temperature on surface shape accuracy will be. Lens correction technology can effectively solve the problem of temperature effects when coating the surface of plastic optical lenses, helping to maintain the coating integrity of optical lenses and the high precision of plastic optical lenses, which is a key technology for achieving high-quality optical lenses.
光學鏡片補正技術可應用模流(Moldflow)分析方法、曲線擬合函數方法或波前誤差方法等,但不以此為限。其中模流分析方法是藉由模流分析找出光學鏡片表面於Z軸收縮的立體輪廓節點,轉成非球面曲線後再與原始曲線比較差異,同時考慮光學鏡片的材料收縮率與面型變形趨勢,計算得到補正值。曲線擬合函數方法是藉由量測光學鏡片表面的輪廓誤差,以函數進行曲線擬合後並配合最佳化演算法,將擬合曲線逼近量測點而得到補正值。函 數可以是指數(Exponential)或多項式(Polynomial)等,演算法可以是高斯牛頓法(Gauss Newton)、單形演算法(Simplex Algorithm)或最大陡降法(Steepest Descent Method)等。其中波前誤差方法是藉由干涉儀量測光學鏡頭的波前誤差(成像誤差)數據,以原始設計值波前誤差綜合分析製造組裝所產生的波前誤差,再經光學軟體優化得到補正值。 Optical lens correction technology can apply mold flow analysis method, curve fitting function method or wavefront error method, but is not limited to this. The mold flow analysis method is to find the three-dimensional contour nodes where the surface of the optical lens shrinks in the Z-axis through mold flow analysis, convert it into an aspherical curve, and then compare the difference with the original curve. At the same time, the material shrinkage rate and surface deformation of the optical lens are taken into consideration. trend, and the correction value is calculated. The curve fitting function method is to measure the contour error of the optical lens surface, perform curve fitting with a function, and cooperate with the optimization algorithm to approximate the fitting curve to the measurement point to obtain the correction value. letter The number can be exponential (Exponential) or polynomial (Polynomial), etc., and the algorithm can be Gauss Newton method (Gauss Newton method), simplex algorithm (Simplex Algorithm) or maximum steep descent method (Steepest Descent Method), etc. Among them, the wavefront error method uses an interferometer to measure the wavefront error (imaging error) data of the optical lens, comprehensively analyzes the wavefront error caused by manufacturing and assembly with the original design value wavefront error, and then optimizes the optical software to obtain the correction value. .
本揭示內容提供的光學鏡頭中,亦可於光路上在被攝物至成像面間選擇性設置至少一具有轉折光路功能的元件,如稜鏡或反射鏡等,以提供光學鏡頭較高彈性的空間配置,使電子裝置的輕薄化不受制於光學鏡頭的光學總長度。進一步說明,請參照第3A圖以及第3B圖,其中第3A圖繪示依照本揭示內容的光路轉折元件LF在光學鏡頭中的一種配置關係示意圖,第3B圖繪示依照本揭示內容的光路轉折元件LF在光學鏡頭中的另一種配置關係示意圖。如第3A圖以及第3B圖所示,光學鏡頭可沿光路由被攝物(未繪示)至成像面IMG,依序具有第一光軸OA1、光路轉折元件LF、第二光軸OA2與濾光元件FL,其中光路轉折元件LF係設置於被攝物與光學鏡頭的透鏡群LG之間,且光路轉折元件LF的入射面與出射面可以如第3A圖所示係呈平面,或者如第3B圖所示係呈曲面。此外,請參照第3C圖以及第3D圖,其中第3C圖繪示依照本揭示內容的二光路轉折元件LF1、LF2在光學鏡頭中的一種配置關係示意圖,第3D圖繪示依照本揭示內容的二光路轉 折元件LF1、LF2在光學鏡頭中的另一種配置關係示意圖。如第3C圖以及第3D圖所示,光學鏡頭亦可沿光路由被攝物(未繪示)至成像面IMG,依序具有第一光軸OA1、光路轉折元件LF1、第二光軸OA2、濾光元件FL、光路轉折元件LF2與第三光軸OA3,其中光路轉折元件LF1係設置於被攝物與光學鏡頭的透鏡群LG之間,光路轉折元件LF2係設置於光學鏡頭的透鏡群LG與成像面IMG之間,且光路轉折元件LF2可以如第3C圖所示係為一稜鏡,或者如第3D圖所示係為一反射鏡。此外,請參照第3E圖,其中第3E圖繪示依照本揭示內容的光路轉折元件LF在光學鏡頭中的又一種配置關係示意圖。如第3E圖所示,光學鏡頭亦可沿光路由被攝物(未繪示)至成像面IMG,依序具有第一光軸OA1、濾光元件FL、光路轉折元件LF、第二光軸OA2與第三光軸OA3,其中光路轉折元件LF係設置於光學鏡頭的透鏡群LG與成像面IMG之間,且光路可以如第3E圖所示於光路轉折元件LF內進行二次轉折。光學鏡頭亦可選擇性配置三個以上的光路轉折元件,本揭示內容不以圖式所揭露的光路轉折元件的種類、數量與位置為限。 In the optical lens provided by the present disclosure, at least one element with the function of turning the optical path, such as a lens or a mirror, can also be selectively disposed on the optical path between the subject and the imaging surface, so as to provide the optical lens with higher flexibility. The spatial configuration makes the electronic device thinner and lighter and is not limited by the total optical length of the optical lens. For further explanation, please refer to Figures 3A and 3B. Figure 3A illustrates a schematic diagram of a configuration relationship of the optical path turning element LF in an optical lens according to the present disclosure. Figure 3B illustrates the optical path turning element according to the present disclosure. Schematic diagram of another configuration relationship of element LF in an optical lens. As shown in Figures 3A and 3B, the optical lens can follow the optical path from the subject (not shown) to the imaging surface IMG, and has a first optical axis OA1, an optical path turning element LF, a second optical axis OA2 and Filter element FL, wherein the light path turning element LF is disposed between the subject and the lens group LG of the optical lens, and the incident surface and exit surface of the light path turning element LF can be flat as shown in Figure 3A, or as shown in Figure 3A Figure 3B shows a curved surface. In addition, please refer to Figure 3C and Figure 3D. Figure 3C shows a schematic diagram of a configuration relationship of the two optical path turning elements LF1 and LF2 in the optical lens according to the present disclosure. Figure 3D shows a configuration relationship according to the present disclosure. Two light road turn Schematic diagram of another configuration relationship of folding elements LF1 and LF2 in an optical lens. As shown in Figure 3C and Figure 3D, the optical lens can also follow the optical path from the subject (not shown) to the imaging surface IMG, and have a first optical axis OA1, an optical path turning element LF1, and a second optical axis OA2 in sequence. , filter element FL, optical path turning element LF2 and third optical axis OA3, wherein the light path turning element LF1 is arranged between the subject and the lens group LG of the optical lens, and the light path turning element LF2 is arranged between the lens group of the optical lens Between LG and the imaging surface IMG, the optical path turning element LF2 can be a mirror as shown in Figure 3C, or a reflector as shown in Figure 3D. In addition, please refer to Figure 3E , which illustrates another schematic diagram of the arrangement relationship of the light path turning element LF in the optical lens according to the present disclosure. As shown in Figure 3E, the optical lens can also follow the optical path from the subject (not shown) to the imaging surface IMG, and has a first optical axis OA1, a filter element FL, an optical path turning element LF, and a second optical axis in sequence. OA2 and the third optical axis OA3, in which the optical path turning element LF is disposed between the lens group LG of the optical lens and the imaging surface IMG, and the optical path can be turned twice in the optical path turning element LF as shown in Figure 3E. The optical lens can also optionally be equipped with more than three light path turning components. The content of this disclosure is not limited to the type, quantity and position of the light path turning components disclosed in the drawings.
本揭示內容提供一種取像裝置,其包含前述的光學鏡頭以及一電子感光元件,且電子感光元件設置於光學鏡頭的一成像面。 The present disclosure provides an imaging device, which includes the aforementioned optical lens and an electronic photosensitive element, and the electronic photosensitive element is disposed on an imaging surface of the optical lens.
本揭示內容提供一種電子裝置,其為一行動裝置,且電子裝置包含前述的取像裝置。 The present disclosure provides an electronic device, which is a mobile device, and the electronic device includes the aforementioned imaging device.
本揭示內容提供一種電子裝置,其包含前述的取像裝置。藉此,可提升成像品質。較佳地,前述電子裝置皆可進一步包含控制單元、顯示單元、儲存單元、暫儲存單元或其組合。 The present disclosure provides an electronic device, which includes the aforementioned imaging device. This can improve image quality. Preferably, the aforementioned electronic devices may further include a control unit, a display unit, a storage unit, a temporary storage unit or a combination thereof.
本揭示內容提供的光學鏡頭亦可多方面應用於三維(3D)影像擷取、數位相機、行動產品、數位平板、智慧型電視、網路監控設備、體感遊戲機、行車紀錄器、倒車顯影裝置、穿戴式產品或空拍機等電子裝置中。 The optical lenses provided in this disclosure can also be used in various aspects such as three-dimensional (3D) image capture, digital cameras, mobile products, digital tablets, smart TVs, network monitoring equipment, motion sensing game consoles, driving recorders, and reverse imaging. devices, wearable products, or electronic devices such as aerial cameras.
取像裝置係為一相機模組,取像裝置包含成像鏡頭、驅動裝置組以及電子感光元件,其中成像鏡頭包含本揭示內容的光學鏡頭以及一承載光學鏡頭的鏡筒(未另標號)。取像裝置利用成像鏡頭聚光且對被攝物進行攝像並配合驅動裝置組進行影像對焦,最後成像於電子感光元件,並將影像資料輸出。 The imaging device is a camera module. The imaging device includes an imaging lens, a driving device group and an electronic photosensitive element. The imaging lens includes the optical lens of this disclosure and a lens barrel (not otherwise labeled) carrying the optical lens. The imaging device uses the imaging lens to collect light and capture the object, and cooperates with the driving device group to focus the image. Finally, the image is imaged on the electronic photosensitive element and the image data is output.
取像裝置可為廣角取像裝置、超廣角取像裝置、望遠取像裝置(可包含光路轉折元件)或TOF模組(Time-Of-Flight;飛時測距模組),但並不以此配置為限。另外,取像裝置與其他構件的連接關係可依照取像裝置的類型適應性調整,在此不另繪示及詳述。 The imaging device can be a wide-angle imaging device, an ultra-wide-angle imaging device, a telephoto imaging device (which may include an optical path turning component) or a TOF module (Time-Of-Flight; time-of-flight ranging module), but it is not based on This configuration is limited. In addition, the connection relationship between the imaging device and other components can be adjusted adaptively according to the type of the imaging device, which is not shown or described in detail here.
驅動裝置組可為自動對焦模組,其驅動方式可使用如音圈馬達、微機電系統、壓電系統、或記憶金屬等驅動系統。驅動裝置可讓光學鏡頭取得較佳的成像位置,可提供被攝物於不同物距的狀態下,皆能拍攝清晰影像。 The driving device group can be an autofocus module, and its driving method can use a driving system such as a voice coil motor, a micro-electromechanical system, a piezoelectric system, or a memory metal. The driving device allows the optical lens to achieve a better imaging position, allowing the subject to capture clear images at different object distances.
取像裝置可搭載一感光度佳及低雜訊的電子感光 元件(如CMOS、CCD)設置於光學鏡頭的成像面,可真實呈現光學鏡頭的良好成像品質。此外,取像裝置更可包含影像穩定模組,其可為加速計、陀螺儀或霍爾元件(Hall Effect Sensor)等動能感測元件,但不以此為限。藉由調整光學鏡頭不同軸向的變化以補償拍攝瞬間因晃動而產生的模糊影像,進一步提升動態以及低照度場景拍攝的成像品質,並提供例如光學防手震(Optical Image Stabilization;OIS)、電子防手震(Electronic Image Stabilization;EIS)等進階的影像補償功能。 The imaging device can be equipped with an electronic sensor with good sensitivity and low noise. Components (such as CMOS, CCD) are placed on the imaging surface of the optical lens, which can truly demonstrate the good imaging quality of the optical lens. In addition, the imaging device may further include an image stabilization module, which may be a kinetic energy sensing element such as an accelerometer, a gyroscope, or a Hall Effect Sensor, but is not limited thereto. By adjusting the changes in different axial directions of the optical lens to compensate for blurry images caused by shaking at the moment of shooting, it further improves the imaging quality of dynamic and low-light scene shooting, and provides features such as Optical Image Stabilization (OIS), electronic Advanced image compensation functions such as anti-shake (Electronic Image Stabilization; EIS).
電子裝置係一智慧型手機,電子裝置包含取像裝置、閃光燈模組、對焦輔助模組、影像訊號處理器(Image Signal Processor;ISP)、使用者介面以及影像軟體處理器,其中取像裝置可為前置鏡頭或後置鏡頭。當使用者透過使用者介面對被攝物進行拍攝,電子裝置利用取像裝置聚光取像,啟動閃光燈模組進行補光,並使用對焦輔助模組提供的被攝物物距資訊進行快速對焦,再加上影像訊號處理器以及影像軟體處理器進行影像最佳化處理,來進一步提升影像鏡頭所產生的影像品質。對焦輔助模組可採用紅外線或雷射對焦輔助系統來達到快速對焦,使用者介面可採用觸控螢幕或實體拍攝按鈕,配合影像處理軟體的多樣化功能進行影像拍攝以及影像處理。 The electronic device is a smart phone. The electronic device includes an imaging device, a flash module, a focus assist module, an image signal processor (ISP), a user interface and an image software processor. The imaging device can Either the front camera or the rear camera. When the user takes a picture of the subject through the user interface, the electronic device uses the imaging device to focus the light to capture the image, activates the flash module to fill in the light, and uses the subject distance information provided by the focus assist module to quickly focus. , coupled with the image signal processor and image software processor for image optimization processing, to further improve the image quality produced by the image lens. The focus assist module can use infrared or laser focus assist systems to achieve fast focusing. The user interface can use a touch screen or physical shooting button, and cooperate with the diverse functions of image processing software for image shooting and image processing.
取像裝置可對應電子裝置外側的一非圓形開口進行取像。 The imaging device can capture images corresponding to a non-circular opening on the outside of the electronic device.
根據上述說明,以下提出具體實施例予以詳細說 明。 Based on the above description, specific embodiments are provided below to explain in detail. bright.
<第一實施例> <First Embodiment>
第一實施例為一光學鏡頭,其包含二光學鏡片以及一反射元件,由光路的物側至像側依序為一第一光學鏡片、一第二光學鏡片及反射元件,各光學鏡片皆具有一物側表面朝向物側以及一像側表面朝向像側,其中反射元件由一塑膠材料所製成,反射元件包含一反射鍍膜及一基材,反射鍍膜位於基材的一表面。第一實施例中,反射鍍膜包含五膜層,所述五膜層依序由靠近空氣之一側至靠近基材之一側分別由第四材料、第三材料、第二材料、第一材料及第五材料所製成。其中,第四材料為二氧化矽(SiO2)、第三材料為鉻氧化物(CrOx)、第二材料為鈦(Ti)、第一材料為銀(Ag)且第五材料為金屬氧化物。 The first embodiment is an optical lens, which includes two optical lenses and a reflective element. From the object side to the image side of the optical path, there are a first optical lens, a second optical lens and a reflective element. Each optical lens has An object-side surface faces the object side and an image-side surface faces the image side. The reflective element is made of a plastic material. The reflective element includes a reflective coating and a substrate. The reflective coating is located on a surface of the substrate. In the first embodiment, the reflective coating includes five film layers. The five film layers are composed of a fourth material, a third material, a second material, and a first material in order from the side close to the air to the side close to the substrate. And made of the fifth material. Among them, the fourth material is silicon dioxide (SiO 2 ), the third material is chromium oxide (CrO x ), the second material is titanium (Ti), the first material is silver (Ag), and the fifth material is metal oxide. things.
比較例的反射鍍膜則包含四膜層,所述四膜層依序由靠近空氣之一側至靠近基材之一側分別由二氧化矽、鉻氧化物、鉻(Cr)及銀所製成。 The reflective coating of the comparative example includes four film layers, which are made of silicon dioxide, chromium oxide, chromium (Cr) and silver in order from the side close to the air to the side close to the substrate. .
第一實施例與比較例的反射鍍膜的詳細配置方式已列於下表一。 The detailed configuration of the reflective coatings of the first embodiment and the comparative example is listed in Table 1 below.
此外,第一實施例的反射鍍膜之各膜層的折射率與厚度等性質已列於下表二。 In addition, the refractive index, thickness and other properties of each layer of the reflective coating of the first embodiment are listed in Table 2 below.
請一併參照第1A圖及第1B圖,第1A圖為比較例的反射元件的表面品質圖,第1B圖為第一實施例的反射元件的表面品質圖。由第1A圖及第1B圖可以看出,比較例的反射元件表面產生膜裂現象,而第一實施例藉由適當地配置不同材料之膜層,使得反射元件表面保持完整且無膜裂現象。 Please refer to Figures 1A and 1B together. Figure 1A is a surface quality diagram of the reflective element of the comparative example, and Figure 1B is a surface quality diagram of the reflective element of the first embodiment. It can be seen from Figures 1A and 1B that film cracks occur on the surface of the reflective element of the comparative example, while in the first embodiment, by appropriately arranging film layers of different materials, the surface of the reflective element remains intact without film cracks. .
請一併參照表三及第2圖,第2圖為第一實施例的反射元件的反射率與波長的關係圖,而第一實施例的反射元件於不同波長下的反射率量測結果則列於下表三。 Please refer to Table 3 and Figure 2 together. Figure 2 is a graph showing the relationship between the reflectivity and wavelength of the reflective element of the first embodiment. The measurement results of the reflectivity of the reflective element of the first embodiment at different wavelengths are Listed in Table 3 below.
由上表三的結果可以得知,針對可見光及近紅外線,第一實施例的反射元件均可以有效反射不同波長的光線,且其反射效果相當優異,有助於避免反射元件上的反射鍍膜產生膜裂問題。 It can be seen from the results in Table 3 above that for visible light and near-infrared rays, the reflective element of the first embodiment can effectively reflect light of different wavelengths, and its reflection effect is quite excellent, which helps to avoid the formation of reflective coatings on the reflective elements. Membrane crack problem.
本揭示內容實施例的光學鏡頭,其亦可為包含三光學鏡片以及一反射元件,四光學鏡片以及一反射元件,五光學鏡片以及一反射元件,六光學鏡片以及一反射元件,七光學鏡片以及一反射元件,八光學鏡片以及一反射元件,九光學鏡片以及一反射元件,十光學鏡片以及一反射元件,以此類推;其亦可為包含三光學鏡片以及二反射元件,四光學鏡片以及二反射元件,五光學鏡片以及二反射元件,六光學鏡片以及二反射元件,七光學鏡片以及二反射元件,八光學鏡片以及二反射元件,九光學鏡片以及二反射元件,十光學鏡片以及二反射元件,以此類推;其亦可為包含三光學鏡片以及三反射元件,四光學鏡片以及三反射元件,五光學鏡片以及三反射元件,六光學鏡片以及三反射元件,七光學鏡片以及三反射元件,八光學鏡片以及三反射元件,九光學鏡片以及三反射元件,十光學鏡片 The optical lens according to the embodiment of the present disclosure may also include three optical lenses and a reflective element, four optical lenses and a reflective element, five optical lenses and a reflective element, six optical lenses and a reflective element, seven optical lenses and One reflective element, eight optical lenses and one reflective element, nine optical lenses and one reflective element, ten optical lenses and one reflective element, and so on; it can also include three optical lenses and two reflective elements, four optical lenses and two Reflective element, five optical lenses and two reflective elements, six optical lenses and two reflective elements, seven optical lenses and two reflective elements, eight optical lenses and two reflective elements, nine optical lenses and two reflective elements, ten optical lenses and two reflective elements , and so on; it can also include three optical lenses and three reflective elements, four optical lenses and three reflective elements, five optical lenses and three reflective elements, six optical lenses and three reflective elements, seven optical lenses and three reflective elements, Eight optical lenses and three reflective elements, nine optical lenses and three reflective elements, ten optical lenses
以及三反射元件,以此類推。 and three reflective elements, and so on.
雖然本揭示內容已以實施例揭露如上,然其並非用以限定本揭示內容,任何熟習此技藝者,在不脫離本揭示內容之精神和範圍內,當可作各種之更動與潤飾,因此本揭示內容之保護範圍當視後附之申請專利範圍所界定者為準。 Although the present disclosure has been disclosed in the form of embodiments, it is not intended to limit the disclosure. Anyone skilled in the art can make various modifications and modifications without departing from the spirit and scope of the disclosure. Therefore, this disclosure The scope of protection of the disclosed content shall be determined by the scope of the patent application attached.
R38105:反射鍍膜於波長380nm至1050nm的平均反射率 R38105: Average reflectance of reflective coating at wavelength 380nm to 1050nm
R4050:反射鍍膜於波長400nm至500nm的平均反射率 R4050: Average reflectance of reflective coating at wavelength 400nm to 500nm
R4060:反射鍍膜於波長400nm至600nm的平均反射率 R4060: Average reflectance of reflective coating at wavelength 400nm to 600nm
R4070:反射鍍膜於波長400nm至700nm的平均反射率 R4070: Average reflectance of reflective coating at wavelength 400nm to 700nm
R40100:反射鍍膜於波長400nm至1000nm的平均反射率 R40100: Average reflectance of reflective coating at wavelength 400nm to 1000nm
R65105:反射鍍膜於波長650nm至1050nm的平均反射率 R65105: Average reflectance of reflective coating at wavelength 650nm to 1050nm
R70100:反射鍍膜於波長700nm至1000nm的平均反射率 R70100: Average reflectance of reflective coating at wavelength 700nm to 1000nm
R80100:反射鍍膜於波長800nm至1000nm的平均反 射率 R80100: average reflection of reflective coating at wavelength 800nm to 1000nm emissivity
R90100:反射鍍膜於波長900nm至1000nm的平均反射率 R90100: Average reflectance of reflective coating at wavelength 900nm to 1000nm
R45:反射鍍膜於波長450nm的反射率 R45: Reflectivity of reflective coating at wavelength 450nm
R55:反射鍍膜於波長550nm的反射率 R55: Reflectivity of reflective coating at wavelength 550nm
R65:反射鍍膜於波長650nm的反射率 R65: Reflectivity of reflective coating at wavelength 650nm
R75:反射鍍膜於波長750nm的反射率 R75: Reflectivity of reflective coating at wavelength 750nm
R85:反射鍍膜於波長850nm的反射率 R85: Reflectivity of reflective coating at wavelength 850nm
R95:反射鍍膜於波長950nm的反射率 R95: Reflectivity of reflective coating at wavelength 950nm
R105:反射鍍膜於波長1050nm的反射率 R105: Reflectivity of reflective coating at wavelength 1050nm
tLs:反射鍍膜的總層數 tLs: total number of layers of reflective coating
Tsi:第四材料製成的膜層厚度 Tsi: Thickness of the film layer made of the fourth material
Tcr:第三材料製成的膜層厚度 Tcr: Thickness of film layer made of third material
Tti:第二材料製成的膜層厚度 Tti: Thickness of the film layer made of the second material
Tag:第一材料製成的膜層厚度 Tag:Thickness of the film layer made of the first material
Tmo:第五材料製成的膜層厚度 Tmo: Thickness of the film layer made of the fifth material
N4:第四材料的折射率 N4: refractive index of the fourth material
N3:第三材料的折射率 N3: refractive index of the third material
N2:第二材料的折射率 N2: refractive index of the second material
N5:第五材料的折射率 N5: refractive index of the fifth material
Ns:反射元件的折射率 Ns: refractive index of reflective element
LF,LF1,LF2:光路轉折元件 LF, LF1, LF2: optical path turning components
IMG:成像面 IMG: imaging surface
OA1:第一光軸 OA1: first optical axis
OA2:第二光軸 OA2: Second optical axis
OA3:第三光軸 OA3: The third optical axis
FL:濾光元件 FL: filter element
LG:透鏡群 LG: lens group
為讓本揭示內容之上述和其他目的、特徵、優點與實施例能更明顯易懂,所附圖式之說明如下: 第1A圖為比較例的反射元件的表面品質圖;第1B圖為第一實施例的反射元件的表面品質圖;第2圖為第一實施例的反射元件的反射率與波長的關係圖;第3A圖繪示依照本揭示內容的光路轉折元件在光學鏡頭中的一種配置關係示意圖;第3B圖繪示依照本揭示內容的光路轉折元件在光學鏡頭中的另一種配置關係示意圖;第3C圖繪示依照本揭示內容的二光路轉折元件在光學鏡頭中的一種配置關係示意圖;第3D圖繪示依照本揭示內容的二光路轉折元件在光學鏡頭中的另一種配置關係示意圖;以及第3E圖繪示依照本揭示內容的光路轉折元件在光學鏡頭中的又一種配置關係示意圖。 In order to make the above and other objects, features, advantages and embodiments of the present disclosure more obvious and understandable, the accompanying drawings are described as follows: Figure 1A is a surface quality diagram of the reflective element of the comparative example; Figure 1B is a surface quality diagram of the reflective element of the first embodiment; Figure 2 is a graph of the relationship between reflectance and wavelength of the reflective element of the first embodiment; Figure 3A shows a schematic diagram of the arrangement relationship of the light path turning element in the optical lens according to the present disclosure; Figure 3B shows another schematic diagram of the arrangement relationship of the light path turning element in the optical lens according to the present disclosure; Figure 3C A schematic diagram illustrating a configuration relationship of two optical path turning elements in an optical lens according to the present disclosure; Figure 3D shows another schematic diagram of a configuration relationship of two optical path turning elements in an optical lens according to the present disclosure; and Figure 3E This is a schematic diagram illustrating another arrangement relationship of the light path turning element in the optical lens according to the present disclosure.
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| CN202221200403.7U CN218350605U (en) | 2021-05-21 | 2022-05-18 | Optical lens, image capturing device and electronic device |
| CN202210556505.0A CN115373106A (en) | 2021-05-21 | 2022-05-18 | Optical lens, image capturing device and electronic device |
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| TW201603713A (en) * | 2014-07-22 | 2016-02-01 | Lovely Cocoa Co Ltd | Chocolate surface printing method |
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| US7901781B2 (en) * | 2007-11-23 | 2011-03-08 | Agc Flat Glass North America, Inc. | Low emissivity coating with low solar heat gain coefficient, enhanced chemical and mechanical properties and method of making the same |
| TW201603713A (en) * | 2014-07-22 | 2016-02-01 | Lovely Cocoa Co Ltd | Chocolate surface printing method |
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