TWI899641B - Multi-chip module - Google Patents
Multi-chip moduleInfo
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- TWI899641B TWI899641B TW112135440A TW112135440A TWI899641B TW I899641 B TWI899641 B TW I899641B TW 112135440 A TW112135440 A TW 112135440A TW 112135440 A TW112135440 A TW 112135440A TW I899641 B TWI899641 B TW I899641B
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Abstract
Description
本發明係關於光數據通訊。 This invention relates to optical data communications.
光數據通訊系統係藉由調制雷射光對數化數據圖案編碼而操作。經調制的雷射光自發送節點傳輸通過光數據網路而到達接收節點。到達接收節點之經調制的雷射光受到去調制而獲得原始之數位數據圖案。因此,光數據通訊系統之實施與操作係取決於具有可靠與有效率的雷射光源及光處理系統。又,一般期望光數據通訊系統之雷射光源與光處理裝置可具有最小形式要件且可被設計得在成本與耗能上盡可能地有效率。本發明係於此背景下產生。 Optical data communication systems operate by encoding digital data patterns using modulated laser light. The modulated laser light is transmitted from a transmitting node through an optical data network to a receiving node. Upon reaching the receiving node, the modulated laser light is demodulated to obtain the original digital data pattern. Therefore, the implementation and operation of optical data communication systems depend on reliable and efficient laser light sources and optical processing systems. Furthermore, it is generally desirable that the laser light sources and optical processing devices of optical data communication systems have minimal form factors and be designed to be as cost- and energy-efficient as possible. The present invention was developed in this context.
在一例示性的實施例中,揭露一種插入件裝置。該插入件裝置包含一基板,該基板包含用以接收一雷射源晶片的一雷射源晶片界面區域。該基板亦包含用以接收一矽光子晶片的一矽光子晶片界面區域。該基板亦包含用以接收一光放大器模組的一光放大器模組界面區域。一光纖對插入件連接區域係形成於該基板內。該插入件裝置亦包含一第一組光傳輸結構,該第一組光傳輸結構係形成於該基板內以在該雷射源晶片與該矽光子晶片係與該基板交界時將該雷射源晶片光連接至該矽光子晶片。該插入件裝置亦包含一第二組光傳輸結構,該第二組光傳輸結構係形成於該基板內以在該矽光子晶片與該光放大器模 組係與該基板交界時將該矽光子晶片光連接至該光放大器模組。該插入件裝置亦包含一第三組光傳輸結構,該第三組光傳輸結構係形成於該基板內以在該光放大器模組係與該基板交界時將該光放大器模組連接至該光纖對插入件連接區域。 In one exemplary embodiment, an interposer device is disclosed. The interposer device includes a substrate having a laser source chip interface region for receiving a laser source chip. The substrate also includes a silicon photonics chip interface region for receiving a silicon photonics chip. The substrate also includes an optical amplifier module interface region for receiving an optical amplifier module. An optical fiber to interposer connection region is formed within the substrate. The interposer device also includes a first set of optical transmission structures formed within the substrate to optically connect the laser source chip to the silicon photonics chip when the laser source chip and the silicon photonics chip are interfaced with the substrate. The interposer device also includes a second set of optical transmission structures formed within the substrate for optically connecting the silicon photonics chip to the optical amplifier module when the silicon photonics chip and the optical amplifier module are interfaced with the substrate. The interposer device also includes a third set of optical transmission structures formed within the substrate for optically connecting the optical amplifier module to the fiber-to-interposer connection region when the optical amplifier module is interfaced with the substrate.
在一例示性的實施例中,揭露一種多晶片模組。該多晶片模組包含一插入件裝置。該多晶片模組亦包含連接至該插入件裝置的一雷射源晶片。該多晶片模組亦包含連接至該插入件裝置的一矽光子晶片。該多晶片模組亦包含連接至該插入件裝置的一光放大器模組。該插入件裝置包含用以將該雷射源晶片光連接至該矽光子晶片的一第一組光傳輸結構。該插入件裝置亦包含用以將該矽光子晶片光連接至該光放大器模組的一第二組光傳輸結構。該插入件裝置亦包含用以將該光放大器模組光連接至形成在該插入件裝置內之一光纖對插入件連接區域的一第三組光傳輸結構。 In an exemplary embodiment, a multi-chip module is disclosed. The multi-chip module includes an interposer device. The multi-chip module also includes a laser source chip connected to the interposer device. The multi-chip module also includes a silicon photonics chip connected to the interposer device. The multi-chip module also includes an optical amplifier module connected to the interposer device. The interposer device includes a first set of optical transmission structures for optically connecting the laser source chip to the silicon photonics chip. The interposer device also includes a second set of optical transmission structures for optically connecting the silicon photonics chip to the optical amplifier module. The interposer device also includes a third set of optical transmission structures for optically connecting the optical amplifier module to a fiber-to-interposer connection region formed within the interposer device.
在一例示性的實施例中,揭露一種機械傳輸套圈。該機械傳輸套圈包含一上半構件,該上半構件包含一上對準鑰。該機械傳輸套圈亦包含一下半構件,該下半構件包含一下對準鑰。該上對準鑰與該下對準鑰係用以適配在一起以對該上半構件與該下半構件提供對準與適配。該上半構件與該下半構件中的每一者係用以接收在該上半構件與該下半構件之間之一插入件裝置的一外緣部,俾以當該上半構件係適配至該下半構件時,使在該插入件裝置之該外緣部之一邊緣處暴露的一光導在該上半構件與該下半構件之間的一位置處受到暴露。 In an exemplary embodiment, a mechanical transmission ferrule is disclosed. The mechanical transmission ferrule includes an upper half, the upper half including an upper alignment key. The mechanical transmission ferrule also includes a lower half, the lower half including a lower alignment key. The upper alignment key and the lower alignment key are adapted to mate together to align and mate the upper and lower half. Each of the upper and lower halfs is adapted to receive an outer edge of an insert device between the upper and lower halfs, such that when the upper half is mated to the lower half, a light guide exposed at an edge of the outer edge of the insert device is exposed at a location between the upper and lower halfs.
在一例示性的實施例中,揭露一種多晶片模組的製造方法。該方法包含提供一插入件裝置。該方法亦包含將一雷射源晶片連接至該插入件裝置。該方法亦包含將一矽光子晶片連接至該插入件裝置。該方法亦包含將一光放大器模組連接至該插入件裝置。該插入件裝置包含將該雷射源晶片光連接至該矽 光子晶片的一第一組光傳輸結構。該插入件裝置亦包含將該矽光子晶片光連接至該光放大器模組的一第二組光傳輸結構。該插入件裝置亦包含將該光放大器模組光連接至形成在該插入件裝置內之一光纖對插入件連接區域的一第三組光傳輸結構。 In an exemplary embodiment, a method for manufacturing a multi-chip module is disclosed. The method includes providing an interposer device. The method also includes connecting a laser source chip to the interposer device. The method also includes connecting a silicon photonics chip to the interposer device. The method also includes connecting an optical amplifier module to the interposer device. The interposer device includes a first set of optical transmission structures optically connecting the laser source chip to the silicon photonics chip. The interposer device also includes a second set of optical transmission structures optically connecting the silicon photonics chip to the optical amplifier module. The interposer device also includes a third set of optical transmission structures optically connecting the optical amplifier module to a fiber-to-interposer connection region formed within the interposer device.
100A:雷射模組 100A: Laser Module
100B:雷射模組 100B: Laser Module
100C:雷射模組 100C: Laser Module
100D:雷射模組 100D: Laser Module
100E:雷射模組 100E: Laser Module
100F:雷射模組 100F: Laser Module
102:雷射源 102: Laser Source
102A:雷射源 102A: Laser Source
103-1至103-N:雷射 103-1 to 103-N: Laser
104-1至104-N:光輸出接口 104-1 to 104-N: Optical output interface
105:光導 105: Light Guide
107:光編排模組 107: Optical Orchestration Module
107A:光編排模組 107A: Optical Orchestration Module
107B:光編排模組 107B: Optical Orchestration Module
107C:光編排模組 107C: Optical Orchestration Module
106-1至106-N:線 106-1 to 106-N: Line
108-1至108-N:光輸入接口 108-1 to 108-N: Optical input interface
109-1至109-M:光輸出接口 109-1 to 109-M: Optical output interface
110:基板 110:Substrate
111:構件 111: Components
200:PLC 200:PLC
201-1至201-N:雷射光束 201-1 to 201-N: Laser beam
301:光導 301: Light Guide
303-1至303-N:光放大器模組 303-1 to 303-N: Optical amplifier modules
303:光放大模組 303: Optical Amplifier Module
303A:光放大模組 303A: Optical Amplifier Module
304-1至304-M:光輸入接口 304-1 to 304-M: Optical input interface
305-1至305-M:光放大器 305-1 to 305-M: Optical Amplifiers
306-1至306-M:光輸出接口 306-1 to 306-M: Optical output interface
307:構件 307: Components
401:構件 401: Component
501-1至501-M:線 501-1 to 501-M: Line
503:PLC 503:PLC
601:PLC 601:PLC
701:波長結合器 701: Wavelength combiner
703:光導 703: Light Guide
705:寬頻功率分割器 705: Wideband Power Divider
801:陣列式的波導 801: Arrayed waveguides
803:光導 803: Light Guide
805:寬頻功率分割器 805: Wideband Power Divider
901:階梯光柵 901: Step Grating
903:光導 903: Light Guide
905:寬頻功率分割器 905: Wideband Power Divider
1001:蝶形波導網路 1001:Butterfly waveguide network
1021:基板 1021:Substrate
1022:磊晶層 1022: Epitaxial layer
1023:磊晶層 1023: Epitaxial layer
1024:磊晶層 1024: Epitaxial layer
1025:平坦化層 1025: Planarization layer
1026:導電內連線結構 1026: Conductive interconnect structure
1027:部分 1027: Partial
1101:星形耦合器 1101: Star Coupler
1201:諧振環陣列 1201: Harmonic Ring Array
1203:諧振環 1203: Harmony Ring
1701:操作 1701: Operation
1703:操作 1703: Operation
1705:操作 1705: Operation
1801:插入件裝置 1801: Insert device
1801A:插入件裝置 1801A: Insert device
1801B:插入件裝置 1801B: Insert device
1801C:插入件裝置 1801C: Insert device
1803:矽光子晶粒/晶片 1803: Silicon Photonic Die/Chip
1805A至1805D:晶粒/晶片 1805A to 1805D: Die/Wafer
1901:極化旋轉器 1901: Polarization Rotator
1903:光纖對插入件連接件 1903: Fiber optic to insert connector
1905:光導結構 1905: Light-guiding structure
1907:光導結構 1907: Light-guiding structure
1909-1至1909-N:光導結構 1909-1 to 1909-N: Light-guiding structures
1911:光導 1911: Light Guide
1913:光導 1913: Light Guide
1915-1至1915-N:光導 1915-1 to 1915-N: Light Guide
2100:空腔/凹陷 2100: Cavity/Depression
2101:光導 2101: Light Guide
2103:側突出物 2103: Side protrusions
2103A:側突出物 2103A: Side protrusions
2103B:側突出物 2103B: Side protrusions
2201:晶粒/晶片 2201: Die/Chip
2301:上半部 2301: Upper half
2303:下半部 2303: Lower half
2305:對準鑰 2305: Alignment Key
2307:部分孔 2307: Partial hole
2309:部分孔 2309: Partial hole
2311:拉耳(tab) 2311: Tab
2313:光導 2313: Light Guide
2601:插入件裝置 2601: Insert device
2701:操作 2701: Operation
2703:操作 2703: Operation
2705:操作 2705: Operation
2707:操作 2707: Operation
AMWL-1至AMWL-M:多波長雷射輸出 AMWL-1 to AMWL-M: Multi-wavelength laser output
MWL-1至MWL-M:多波長雷射輸出 MWL-1 to MWL-M: Multi-wavelength laser output
R1至RN:諧振環列 R1 to RN : Resonance ring series
圖1A顯示根據本發明之某些實施例之一雷射模組的結構圖。 Figure 1A shows a structural diagram of a laser module according to certain embodiments of the present invention.
圖1B顯示根據本發明之某些實施例之圖1A之雷射模組的側面圖。 FIG1B shows a side view of the laser module of FIG1A according to certain embodiments of the present invention.
圖1C顯示根據本發明之某些實施例之圖1A之雷射模組的側面圖,其中光導不存在。 Figure 1C shows a side view of the laser module of Figure 1A according to certain embodiments of the present invention, wherein the light guide is not present.
圖1D顯示根據本發明之某些實施例之圖1C之雷射模組結構的側面圖,其中雷射源與光編排模組之間的空的空間係被一構件覆蓋及/或密封。 FIG1D shows a side view of the laser module structure of FIG1C according to certain embodiments of the present invention, wherein the empty space between the laser source and the light arrangement module is covered and/or sealed by a component.
圖1E顯示根據本發明之某些實施例之圖1A之雷射模組的側面圖,其中光導不存在且雷射源與光編排模組係以並排接觸方式配置。 FIG1E shows a side view of the laser module of FIG1A according to certain embodiments of the present invention, wherein the light guide is absent and the laser source and the light-orchestrating module are arranged in side-by-side contact.
圖1F顯示根據本發明之某些實施例之圖1A之雷射模組的側面圖,其中光導不存在且雷射源與光編排模組係以垂直重疊接觸方式配置。 FIG1F shows a side view of the laser module of FIG1A according to certain embodiments of the present invention, wherein the light guide is absent and the laser source and the light-organizing module are arranged in vertically overlapping contact.
圖1G顯示根據本發明之某些實施例之圖1F之雷射模組結構的側面圖,其中光編排模組係延伸橫跨雷射源俾使光編排模組為雷射源在雷射模組內的設置提供物理支撐。 FIG1G shows a side view of the laser module structure of FIG1F according to certain embodiments of the present invention, wherein the light orchestration module extends across the laser source so that the light orchestration module provides physical support for the placement of the laser source within the laser module.
圖2A顯示根據本發明之某些實施例之一雷射模組的結構圖。 Figure 2A shows a structural diagram of a laser module according to certain embodiments of the present invention.
圖2B顯示根據本發明之某些實施例之PLC的側面圖。 Figure 2B shows a side view of a PLC according to certain embodiments of the present invention.
圖3A顯示根據本發明之某些實施例之一雷射模組的結構圖,雷射模組包含雷射源、光編排模組及光放大模組。 Figure 3A shows a structural diagram of a laser module according to certain embodiments of the present invention. The laser module includes a laser source, a light arrangement module, and a light amplification module.
圖3B顯示根據本發明之某些實施例之圖3A之雷射模組的側面圖,其中光導105存在且光導301存在。 FIG3B shows a side view of the laser module of FIG3A according to certain embodiments of the present invention, wherein light guide 105 is present and light guide 301 is present.
圖3C顯示根據本發明之某些實施例之圖3A之雷射模組的側面圖,其中光導105存在且光導301不存在。 FIG3C shows a side view of the laser module of FIG3A according to certain embodiments of the present invention, wherein light guide 105 is present and light guide 301 is absent.
圖3D顯示根據本發明之某些實施例之圖3C之雷射模組結構的側面圖,其中光編排模組與光放大模組之間的空的空間係被一構件覆蓋及/或密封。 FIG3D shows a side view of the laser module structure of FIG3C according to certain embodiments of the present invention, wherein the empty space between the optical arrangement module and the optical amplification module is covered and/or sealed by a component.
圖3E顯示根據本發明之某些實施例之圖3A之雷射模組的側面圖,其中光導105存在且光導301不存在且光編排模組與光放大模組係以並排接觸方式配置。 FIG3E shows a side view of the laser module of FIG3A according to certain embodiments of the present invention, wherein light guide 105 is present and light guide 301 is absent, and the optical arrangement module and the optical amplification module are arranged in a side-by-side contact manner.
圖3F顯示根據本發明之某些實施例之圖3A之雷射模組的側面圖,其中光導不存在且光編排模組與光放大模組係以垂直重疊接觸方式配置。 FIG3F shows a side view of the laser module of FIG3A according to certain embodiments of the present invention, wherein the light guide is absent and the optical arrangement module and the optical amplification module are arranged in a vertically overlapping contact manner.
圖3G顯示根據本發明之某些實施例之圖3F之雷射模組結構的側面圖,其中光放大模組係延伸橫跨光編排模組、光導及電射源俾使光放大模組為光編排模組、光導及雷射源中的每一者在雷射模組內的設置提供物理支撐。 FIG3G shows a side view of the laser module structure of FIG3F according to certain embodiments of the present invention, wherein the optical amplification module extends across the optical arrangement module, the light guide, and the laser source so that the optical amplification module provides physical support for the arrangement of each of the optical arrangement module, the light guide, and the laser source within the laser module.
圖3H顯示根據本發明之某些實施例之圖3B之雷射模組結構之修改的側面圖,其中光導不存在。 Figure 3H shows a side view of a modification of the laser module structure of Figure 3B according to certain embodiments of the present invention, in which the light guide is absent.
圖3I顯示根據本發明之某些實施例之圖3C之雷射模組結構之修改的側面圖,其中光導不存在。 Figure 3I shows a side view of a modification of the laser module structure of Figure 3C according to certain embodiments of the present invention, in which the light guide is not present.
圖3J顯示根據本發明之某些實施例之圖3E之雷射模組結構之修改的側面圖,其中光導不存在。 Figure 3J shows a side view of a modification of the laser module structure of Figure 3E according to certain embodiments of the present invention, in which the light guide is absent.
圖3K顯示根據本發明之某些實施例之圖3F之雷射模組結構之修改的側面圖,其中光導不存在。 Figure 3K shows a side view of a modification of the laser module structure of Figure 3F according to certain embodiments of the present invention, in which the light guide is absent.
圖3L顯示根據本發明之某些實施例之圖3G之雷射模組結構之修改的側面圖,其中光導不存在。 Figure 3L shows a side view of a modification of the laser module structure of Figure 3G according to certain embodiments of the present invention, in which the light guide is absent.
圖3M顯示根據本發明之某些實施例之圖3B之雷射模組結構之修改的側面圖,其中雷射源與光編排模組係以並排接觸方式配置。 FIG3M shows a side view of a modification of the laser module structure of FIG3B according to certain embodiments of the present invention, wherein the laser source and the light-orchestrating module are arranged in side-by-side contact.
圖3N顯示根據本發明之某些實施例之圖3C之雷射模組結構之修改的側面圖,其中雷射源與光編排模組係以並排接觸方式配置。 Figure 3N shows a side view of a modification of the laser module structure of Figure 3C according to certain embodiments of the present invention, wherein the laser source and the light-orchestrating module are arranged in side-by-side contact.
圖3O顯示根據本發明之某些實施例之圖3E之雷射模組結構之修改的側面圖,其中雷射源與光編排模組係以並排接觸方式配置。 FIG3O shows a side view of a modification of the laser module structure of FIG3E according to certain embodiments of the present invention, wherein the laser source and the light-orchestrating module are arranged in side-by-side contact.
圖3P顯示根據本發明之某些實施例之圖3F之雷射模組結構之修改的側面圖,其中雷射源與光編排模組係以並排接觸方式配置。 Figure 3P shows a side view of a modification of the laser module structure of Figure 3F according to certain embodiments of the present invention, wherein the laser source and the light-organizing module are arranged in side-by-side contact.
圖3Q顯示根據本發明之某些實施例之圖3G之雷射模組結構之修改的側面圖,其中雷射源與光編排模組係以並排接觸方式配置。 Figure 3Q shows a side view of a modification of the laser module structure of Figure 3G according to certain embodiments of the present invention, wherein the laser source and the light-orchestrating module are arranged in side-by-side contact.
圖3R顯示根據本發明之某些實施例之圖3B之雷射模組結構之修改的側面圖,其中雷射源與光編排模組係以垂直重疊接觸方式配置。 FIG3R shows a side view of a modification of the laser module structure of FIG3B according to certain embodiments of the present invention, wherein the laser source and the light-organizing module are arranged in a vertically overlapping contact manner.
圖3S顯示根據本發明之某些實施例之圖3R之雷射模組結構之修改的側面圖,其中光編排模組延伸橫跨雷射源、光導及光放大模組。 FIG3S shows a side view of a modification of the laser module structure of FIG3R according to certain embodiments of the present invention, wherein the light-marshalling module extends across the laser source, light guide, and light-amplifying module.
圖3T顯示根據本發明之某些實施例之圖3R之雷射模組結構之修改的側面圖,其中光導不存在。 Figure 3T shows a side view of a modification of the laser module structure of Figure 3R according to certain embodiments of the present invention, in which the light guide is not present.
圖3U顯示根據本發明之某些實施例之圖3S之雷射模組結構之修改的側面圖,其中光導不存在。 Figure 3U shows a side view of a modification of the laser module structure of Figure 3S according to certain embodiments of the present invention, in which the light guide is absent.
圖3V顯示根據本發明之某些實施例之圖3T之雷射模組結構之修改的側面圖,其中光導不存在且光編排模組與光放大模組係以並排接觸方式配置。 FIG3V shows a side view of a modification of the laser module structure of FIG3T according to certain embodiments of the present invention, wherein the light guide is absent and the optical arrangement module and the optical amplification module are arranged in a side-by-side contact manner.
圖3W顯示根據本發明之某些實施例之圖3S之雷射模組結構之修改的側面圖,其中光導不存在且光編排模組與光放大模組係以並排接觸方式配置。 FIG3W shows a side view of a modification of the laser module structure of FIG3S according to certain embodiments of the present invention, wherein the light guide is absent and the light arrangement module and the light amplification module are arranged in a side-by-side contact manner.
圖3X顯示根據本發明之某些實施例之圖3R之雷射模組結構之修改的側面圖,其中光導不存在且光編排模組與光放大模組係以垂直重疊接觸方式配置。 FIG3X shows a side view of a modification of the laser module structure of FIG3R according to certain embodiments of the present invention, wherein the light guide is absent and the optical arrangement module and the optical amplification module are arranged in a vertically overlapping contact manner.
圖3Y顯示根據本發明之某些實施例之圖3X之雷射模組結構之修改的側面圖,其中光編排模組係延伸橫跨雷射源與光放大模組俾使光編排模組為雷射源與光放大模組中的每一者在雷射模組內的設置提供物理支撐。 FIG3Y shows a side view of a modification of the laser module structure of FIG3X according to certain embodiments of the present invention, wherein the light orchestration module extends across the laser source and the light amplification module so that the light orchestration module provides physical support for the placement of each of the laser source and the light amplification module within the laser module.
圖4A顯示根據本發明之某些實施例之一雷射模組的結構圖。 Figure 4A shows a structural diagram of a laser module according to certain embodiments of the present invention.
圖4B顯示根據本發明之某些實施例之圖4A之雷射模組結構的側面圖。 FIG4B shows a side view of the laser module structure of FIG4A according to certain embodiments of the present invention.
圖4C顯示根據本發明之某些實施例之圖4B之雷射模組的側面圖,其中光導不存在。 Figure 4C shows a side view of the laser module of Figure 4B according to certain embodiments of the present invention, wherein the light guide is not present.
圖4D顯示根據本發明之某些實施例之圖4C之雷射模組結構的側面圖,其中PLC與光放大模組之間的空的空間係被一構件覆蓋及/或密封。 FIG4D shows a side view of the laser module structure of FIG4C according to certain embodiments of the present invention, wherein the empty space between the PLC and the optical amplifier module is covered and/or sealed by a component.
圖4E顯示根據本發明之某些實施例之圖4A之雷射模組的側面圖,其中光導不存在且PLC與光放大模組係以並排接觸方式配置。 FIG4E shows a side view of the laser module of FIG4A according to certain embodiments of the present invention, wherein the light guide is absent and the PLC and the optical amplifier module are arranged in a side-by-side contact configuration.
圖5A顯示根據本發明之某些實施例之一雷射模組之結構圖,其中光編排模組與光放大模組係共同在一相同的PLC中實施。 Figure 5A shows a structural diagram of a laser module according to certain embodiments of the present invention, in which the optical arrangement module and the optical amplification module are implemented together in the same PLC.
圖5B顯示根據本發明之某些實施例之圖5A之雷射模組結構的側面圖。 FIG5B shows a side view of the laser module structure of FIG5A according to certain embodiments of the present invention.
圖5C顯示根據本發明之某些實施例之圖5B之雷射模組結構的側面圖,其中光導不存在。 FIG5C shows a side view of the laser module structure of FIG5B according to certain embodiments of the present invention, wherein the light guide is not present.
圖5D顯示根據本發明之某些實施例之圖5C之雷射模組結構的側面圖,其中雷射源與PLC之間的空的空間係被一構件覆蓋及/或密封。 FIG5D shows a side view of the laser module structure of FIG5C according to certain embodiments of the present invention, wherein the empty space between the laser source and the PLC is covered and/or sealed by a member.
圖5E顯示根據本發明之某些實施例之圖5A之雷射模組的側面圖,其中光導不存在且雷射源與PLC係以並排接觸方式配置。 Figure 5E shows a side view of the laser module of Figure 5A according to certain embodiments of the present invention, wherein the light guide is absent and the laser source and PLC are arranged in side-by-side contact.
圖6A顯示根據本發明之某些實施例之一雷射模組之結構圖,其中雷射源、光編排模組及放大模組係共同在一相同的PLC中實施。 Figure 6A shows a structural diagram of a laser module according to certain embodiments of the present invention, wherein the laser source, light arrangement module, and amplification module are implemented together in the same PLC.
圖6B顯示根據本發明之某些實施例之圖6A之雷射模組結構的側面圖。 FIG6B shows a side view of the laser module structure of FIG6A according to certain embodiments of the present invention.
圖7顯示根據本發明之某些實施例之光編排模組的一例示性實施例,其包含Nx1(極化維持)波長結合器與1xM(極化維持)寬頻功率分割器。 FIG7 shows an exemplary embodiment of an optical orchestration module according to certain embodiments of the present invention, which includes an Nx1 (polarization-maintaining) wavelength combiner and a 1xM (polarization-maintaining) broadband power divider.
圖8顯示根據本發明之某些實施例之光編排模組的一例示性實施例,其包含陣列式的波導及寬頻功率分割器。 FIG8 shows an exemplary embodiment of an optical orchestration module according to certain embodiments of the present invention, which includes an array of waveguides and a broadband power divider.
圖9顯示根據本發明之某些實施例之光編排模組的一例示性實施例,其包含階梯光柵及寬頻功率分割器。 FIG9 shows an exemplary embodiment of an optical orchestration module according to certain embodiments of the present invention, which includes a step grating and a broadband power divider.
圖10顯示根據本發明之某些實施例之光編排模組的一例示性實施例,其包含蝶形波導網路。 FIG10 shows an exemplary embodiment of an optical orchestration module according to certain embodiments of the present invention, which includes a butterfly waveguide network.
圖11顯示根據本發明之某些實施例之光編排模組的一例示性實施例,其包含星形耦合器。 FIG11 shows an exemplary embodiment of an optical orchestration module according to certain embodiments of the present invention, which includes a star coupler.
圖12A顯示根據本發明之某些實施例之光編排模組的一例示性實施例,其包含諧振環陣列。 FIG12A shows an exemplary embodiment of an optical orchestration module according to certain embodiments of the present invention, which includes a resonant ring array.
圖12B顯示根據本發明之諧振環陣列的詳細圖示。 FIG12B shows a detailed diagram of a resonant ring array according to the present invention.
圖13顯示根據本發明之某些實施例之PLC上之圖6A之雷射模組的一例示性實施例,其中施用編排模組以包含陣列式的波導及寬頻功率分割器。 FIG13 shows an exemplary embodiment of the laser module of FIG6A on a PLC according to certain embodiments of the present invention, wherein the module is arranged to include an array of waveguides and a broadband power divider.
圖14顯示根據本發明之某些實施例之PLC上之圖6A之雷射模組的一例示性實施例,其中施用編排模組以包含階梯光柵與寬頻功率分割器。 FIG14 shows an exemplary embodiment of the laser module of FIG6A on a PLC according to certain embodiments of the present invention, wherein an arrangement module is employed to include a step grating and a broadband power divider.
圖15顯示根據本發明之某些實施例之PLC上之圖6A之雷射模組的一例示性實施例,其中施用編排模組以包含蝶形波導網路。 FIG15 shows an exemplary embodiment of the laser module of FIG6A on a PLC according to certain embodiments of the present invention, wherein the module is arranged to include a butterfly waveguide network.
圖16顯示根據本發明之某些實施例之PLC上之圖6A之雷射模組的一例示性實施例,其中施用編排模組以包含星形耦合器。 FIG16 shows an exemplary embodiment of the laser module of FIG6A on a PLC according to certain embodiments of the present invention, wherein the module is arranged to include a star coupler.
圖17顯示根據本發明之某些實施例之一雷射模組操作方法的流程圖。 Figure 17 shows a flow chart of a laser module operating method according to certain embodiments of the present invention.
圖18A顯示根據本發明之某些實施例之一例示性插入件裝置,其中基板及波導的功能係加以結合。 FIG18A shows an exemplary interposer device according to certain embodiments of the present invention, in which the functions of the substrate and the waveguide are combined.
圖18B顯示根據本發明之某些實施例之插入件裝置的上結構圖以例示將晶粒/晶片相對於插入件裝置設置的彈性。 FIG18B shows a top view of an interposer device according to certain embodiments of the present invention to illustrate the flexibility of positioning the die/chip relative to the interposer device.
圖19顯示根據本發明之某些實施例之插入件裝置的平面方塊示圖,插入件裝置係作為MCM整合產品的一部分。 FIG19 shows a planar block diagram of an interposer device according to certain embodiments of the present invention, the interposer device being part of an MCM integrated product.
圖20A顯示根據本發明之某些實施例之插入件裝置的垂直橫剖面方塊圖,插入件裝置係作為MCM整合產品的一部分。 FIG20A shows a vertical cross-sectional block diagram of an interposer device according to certain embodiments of the present invention, the interposer device being part of an MCM integrated product.
圖20B顯示根據本發明之某些實施例之插入件裝置的另一垂直橫剖面方塊圖,插入件裝置係作為MCM整合產品的一部分。 FIG20B shows another vertical cross-sectional block diagram of an interposer device according to certain embodiments of the present invention, the interposer device being part of an MCM integrated product.
圖20C顯示根據本發明之某些實施例之插入件裝置的另一垂直橫剖面方塊圖,插入件裝置係作為MCM整合產品的一部分。 FIG20C shows another vertical cross-sectional block diagram of an interposer device according to certain embodiments of the present invention, the interposer device being part of an MCM integrated product.
圖21顯示根據本發明之某些實施例之一例示性插入件裝置之上表面的等角視圖。 Figure 21 shows an isometric view of the top surface of an exemplary insert device according to certain embodiments of the present invention.
圖22顯示根據本發明之某些例示性實施例之圖21之例示性插入件裝置,其在空腔/凹陷內設有晶粒/晶片。 FIG. 22 shows the exemplary interposer device of FIG. 21 with a die/chip disposed within a cavity/recess according to certain exemplary embodiments of the present invention.
圖23A至23F顯示根據本發明之某些實施例之用以連接至插入件裝置的一整合性MT套圈。 Figures 23A to 23F illustrate an integrated MT ferrule for connection to an interposer device according to certain embodiments of the present invention.
圖24顯示根據本發明之某些實施例之貫穿雷射源之例示性垂直橫剖面。 FIG24 shows an exemplary vertical cross-section of a through-laser source according to certain embodiments of the present invention.
圖25顯示根據本發明之某些實施例之在蝕刻平坦化層以顯露部分磊晶層(第三光子層)後圖24的垂橫剖面圖。 FIG25 shows a vertical cross-sectional view of FIG24 after etching the planarization layer to expose a portion of the epitaxial layer (third photonic layer) according to certain embodiments of the present invention.
圖26顯示根據本發明之某些實施例之覆晶連接至插入件裝置之圖25之雷射源的垂直橫剖面圖。 FIG26 shows a vertical cross-sectional view of the laser source of FIG25 flip-chip connected to an interposer device according to certain embodiments of the present invention.
圖27顯示根據本發明之某些實施例之一多晶片模組(MCM)製造方法的流程圖。 Figure 27 shows a flow chart of a multi-chip module (MCM) manufacturing method according to certain embodiments of the present invention.
在下列的說明中列舉出許多特定細節以提供對本發明的全面瞭解。然而應明白,熟知本發明領域技術者可在缺乏部分或所有此些特定細節的情況下實施本發明。在其他情況中,不詳細說明已知的處理操作以免不必要地模糊本發明。 In the following description, numerous specific details are set forth to provide a thorough understanding of the present invention. However, it should be understood that one skilled in the art may practice the present invention without some or all of these specific details. In other instances, well-known processing operations are not described in detail to avoid unnecessarily obscuring the present invention.
文中揭露雷射模組的各種實施例及相關的方法。設計及配置雷射模組,使其供給具有一或多波長的雷射光。應瞭解,文中所用之「波長」一詞係指電磁輻射的波長。又,文中所用之「光」一詞係指落在光數據通訊系統可使用之電磁譜之一部分內的電磁輻射。在某些實施例中,電磁譜的一部分包含波長範圍自約1100奈米延伸至約1565奈米(涵蓋電磁譜之O-頻段至C-頻段且包含端點)之波長的光。然而應瞭解,文中所指之電磁譜的一部分可包含波長小於1100奈米或大於1565奈米之的光,只要經由光之調制/去調制編碼、傳輸及解編數位數據之光數據通訊系統能使用此類光。在某些實施例中,在光數據通訊 系統中所用的光具有電磁譜之近紅外紅部分中的波長。又,文中所用之「雷射光束」一詞係指雷射裝置所產生之光束。應瞭解,可限制雷射光束使其在光導如(但不限於)光纖平面光波電路(PLC)內之光導中傳播。在某些實施例中,雷射光束為極化的。又,在某些實施例中,一特定雷射光束之光具有單一波長,其中單一波長可指實質上一波長或可指光數據通訊系統可識別及處理之彷彿可視為是單一波的窄頻波長。 Various embodiments of laser modules and related methods are disclosed herein. The laser modules are designed and configured to provide laser light having one or more wavelengths. It should be understood that the term "wavelength" as used herein refers to the wavelength of electromagnetic radiation. Furthermore, the term "light" as used herein refers to electromagnetic radiation that falls within a portion of the electromagnetic spectrum that can be used by optical data communication systems. In some embodiments, the portion of the electromagnetic spectrum includes light having wavelengths extending from approximately 1100 nanometers to approximately 1565 nanometers (covering the O-band to the C-band of the electromagnetic spectrum, inclusive). However, it should be understood that the portion of the electromagnetic spectrum referred to herein may include light having wavelengths less than 1100 nanometers or greater than 1565 nanometers, as long as such light can be used in optical data communication systems that encode, transmit, and decode digital data via optical modulation/demodulation. In some embodiments, the light used in the optical data communication system has a wavelength in the near-infrared portion of the electromagnetic spectrum. Furthermore, the term "laser beam" as used herein refers to a beam generated by a laser device. It should be understood that the laser beam can be confined to propagate within an optical waveguide, such as, but not limited to, a lightguide within a fiber optic planar lightwave circuit (PLC). In some embodiments, the laser beam is polarized. Furthermore, in some embodiments, the light of a particular laser beam has a single wavelength, where the single wavelength may refer to substantially one wavelength or may refer to a narrow band of wavelengths that can be recognized and processed by an optical data communication system as if it were a single wavelength.
圖1A顯示根據本發明之某些實施例之雷射模組100A的結構圖。雷射模組100A包含雷射源102及光編排模組107。雷射源102係用以產生及輸出複數雷射光束,即,(N)雷射光束。複數雷射光束彼此具有不同波長(λ1-λN),其中不同波長(λ1-λN)對一光數據通訊系統而是是可分辨的。在某些實施例中,雷射源102包含用以分別產生複數(N)雷射光束的複數雷射103-1至103-N,其中雷射103-1至103-N中的每一者分別產生及輸出不同波長(λ1-λN)中之一對應波長的雷射光束。複數雷射103-1至103-N所產生之每一雷射光束分別被提供至雷射源102之各個光輸出接口104-1至104-N以自雷射源102傳輸。在某些實施例中,複數雷射103-1至103-N中的每一者皆為用以產生不同波長(λ1-λN)中之一特定波長處之雷射光的一分佈回饋雷射。在某些實施例中,雷射源102可被定義為一分離的元件如一分離的晶片。然而在其他實施例中,雷射源102可被整合於除了雷射源102外尚包含其他元件之一晶片上之平面光波電路(PLC)內。 FIG1A shows a block diagram of a laser module 100A according to certain embodiments of the present invention. Laser module 100A includes a laser source 102 and an optical orchestration module 107. Laser source 102 is configured to generate and output a plurality of laser beams, i.e., (N) laser beams. The plurality of laser beams have different wavelengths (λ1-λN), wherein the different wavelengths (λ1-λN) are distinguishable by an optical data communication system. In certain embodiments, laser source 102 includes a plurality of lasers 103-1 to 103-N configured to respectively generate a plurality of (N) laser beams, wherein each of lasers 103-1 to 103-N generates and outputs a laser beam having a wavelength corresponding to one of the different wavelengths (λ1-λN). Each laser beam generated by the plurality of lasers 103-1 to 103-N is provided to optical output interfaces 104-1 to 104-N of the laser source 102 for transmission from the laser source 102. In some embodiments, each of the plurality of lasers 103-1 to 103-N is a distributed feedback laser configured to generate laser light at a specific wavelength among different wavelengths (λ1-λN). In some embodiments, the laser source 102 may be defined as a separate component, such as a separate chip. However, in other embodiments, the laser source 102 may be integrated into a planar lightwave circuit (PLC) on a chip that includes other components in addition to the laser source 102.
在圖1A之例示性實施例中,雷射源102被定義為附接至基板110如電子封裝基板的一分離元件。在各種實施例中,基板110可為有機基板或陶瓷基板、或其上可安裝電子裝置及/光電裝置及/或光導及/或光纖(複數光纖)/光纖帶(複數光纖帶)之基本上任何其他類型的基板。例如,在某些實施例中,基板110可為磷化銦(III-V)基板。或在另一實例中,基板110可為Al2O3結構。應瞭 解,在各種實施例中,雷射源102可實質上利用任何已知的電子封裝處理如覆晶接合附接/安裝至基板110,電子封裝處理可選擇性地包含在雷射源102與基板110之間設置球柵陣列(BGA)、凸塊、焊料、底填料及/或其他成分(複數成分)且包含接合技術如質量回流、熱壓接合(TCB)、或實質上任何其他適合的接合技術。在各種實施例中,基板110可為矽、矽插入件裝置、玻璃、或其他適合的基板。 In the exemplary embodiment of FIG1A , laser source 102 is defined as a discrete component attached to substrate 110 , such as an electronic package substrate. In various embodiments, substrate 110 can be an organic substrate, a ceramic substrate, or substantially any other type of substrate on which electronic devices and/or optoelectronic devices and/or light guides and/or optical fibers/fiber ribbons can be mounted. For example, in some embodiments, substrate 110 can be an indium (III-V) phosphide substrate. Alternatively, in another example, substrate 110 can be an Al 2 O 3 structure. It should be understood that in various embodiments, the laser source 102 can be attached/mounted to the substrate 110 using substantially any known electronic packaging process, such as flip-chip bonding, which can optionally include placing a ball grid array (BGA), bumps, solder, underfill, and/or other component(s) between the laser source 102 and the substrate 110 and including bonding techniques such as mass reflow, thermal compression bonding (TCB), or substantially any other suitable bonding technique. In various embodiments, the substrate 110 can be silicon, a silicon interposer device, glass, or other suitable substrate.
光編排模組107係用以在光編排模組107之複數對應光輸入接口108-1至108-N處接收來自雷射源102之具有不同波長(λ1-λN)的複數雷射光束。光編排模組107係亦用以將複數雷射光束中之每一光束的一部分分配至光編排模組107之複數光輸出接口109-1至109-M中的每一者,其中(M)為光編排模組107之光輸出接口的數目。光編排模組107操作以分配複數雷射光束,俾使複數雷射光束之所有不同波長(λ1-λN)被提供至光編排模組107之複數光輸出接口109-1至109-M中的每一者。因此應瞭解,如圖1A中所示,光編排模組107操作以將具有不同波長(λ1-λN)之複數雷射光束的光提供至光編排模組107之光輸出接口109-1至109-M的每一者。以此方式,對於雷射模組100A而言,光編排模組107之光輸出接口109-1至109-M中的每一者提供複數多波長雷射輸出MWL-1至MWL-M中的一對應者。 Optical orchestration module 107 is configured to receive a plurality of laser beams having different wavelengths (λ1-λN) from laser source 102 at a plurality of corresponding optical input interfaces 108-1 to 108-N of optical orchestration module 107. Optical orchestration module 107 is also configured to distribute a portion of each of the plurality of laser beams to each of the plurality of optical output interfaces 109-1 to 109-M of optical orchestration module 107, where (M) is the number of optical output interfaces of optical orchestration module 107. Optical orchestration module 107 distributes the plurality of laser beams such that all of the different wavelengths (λ1-λN) of the plurality of laser beams are provided to each of the plurality of optical output interfaces 109-1 to 109-M of optical orchestration module 107. As shown in FIG1A , light orchestration module 107 operates to provide multiple laser beams having different wavelengths (λ1-λN) to each of optical output interfaces 109-1 through 109-M of light orchestration module 107. Thus, for laser module 100A, each of optical output interfaces 109-1 through 109-M of light orchestration module 107 provides a corresponding one of the multiple multi-wavelength laser outputs MWL-1 through MWL-M.
在某些實施例中,光編排模組107係用以維持光編排模組107之複數光輸入接口108-1至108-N與光編排模組107之複數光輸出接口109-1至109-M之間之複數雷射光束中之每一光束的極化。又,在某些實施例中,光編排模組107之配置俾使光編排模組107之複數光輸出接口109-1至109-M中的每一者接收複數雷射光束中任何一特定光束之五倍內的類似光學功率量。換言之,在某些實施例中,光編排模組107提供給光輸出接口109-1至109-M中之一特定接口之特定波長(即不同波長(λ1-λN)中之一波長)之光的量係等於五倍之內 光編排模組107提供給光輸出接口109-1至109-M中之其他接口之特定波長之光的量。應瞭解,上述之五倍為一例示性實施例。在其他實施例中,可將上述之五倍改變為兩倍、三倍、四倍或六倍等或介於或小於或大於之任何其他值。應瞭解,光編排模組107可用以控制光編排模組107之光輸出接口109-1至109-M中每一者提供之特定波長之光的量,因此可用以控制光編排模組107之光輸出接口109-1至109-M中每一者提供之特定波長之光之量的均勻度。 In some embodiments, the optical arrangement module 107 is configured to maintain polarization of each of the plurality of laser beams between the plurality of optical input interfaces 108-1 to 108-N of the optical arrangement module 107 and the plurality of optical output interfaces 109-1 to 109-M of the optical arrangement module 107. Furthermore, in some embodiments, the optical arrangement module 107 is configured such that each of the plurality of optical output interfaces 109-1 to 109-M of the optical arrangement module 107 receives a similar optical power within five times that of any particular beam in the plurality of laser beams. In other words, in some embodiments, the amount of light of a specific wavelength (i.e., one of the different wavelengths (λ1-λN)) provided by optical orchestration module 107 to a specific one of optical output interfaces 109-1 through 109-M is equal to or less than five times the amount of light of a specific wavelength provided by optical orchestration module 107 to the other optical output interfaces 109-1 through 109-M. It should be understood that the aforementioned five times is an exemplary embodiment. In other embodiments, the aforementioned five times can be changed to two, three, four, six, or any other value in between, less than, or greater than this value. It should be understood that the optical orchestration module 107 can be used to control the amount of light of a specific wavelength provided by each of the optical output interfaces 109-1 through 109-M of the optical orchestration module 107, and therefore can be used to control the uniformity of the amount of light of a specific wavelength provided by each of the optical output interfaces 109-1 through 109-M of the optical orchestration module 107.
在圖1A的例示性實施例中,光編排模組107被定義為附接至基板110的分離元件。因此應瞭解,在雷射模組100A的例示性實施例中,雷射源102與光編排模組107為實體分離的元件。應瞭解,在各種實施例中,光編排模組107可實質上利用任何已知的電子封裝處理附接/安裝至基板110。又,在某些實施例中,光編排模組107被配置為非電子元件如被動元件且可利用不涉及在光編排模組107與基板110間建立電接觸的技術如利用環氧樹脂或其他類型的黏著材料附接/安裝至基板110。在某些實施例中,光編排模組107可整合至包含除了光編排模組107外之其他元件之晶片上的PLC內,而非被定義為一分離元件。在某些實施例中,光編排模組107與雷射源102兩者可在一相同的PLC內實施。 In the exemplary embodiment of FIG1A , light orchestration module 107 is defined as a separate component attached to substrate 110. Therefore, it should be understood that in the exemplary embodiment of laser module 100A, laser source 102 and light orchestration module 107 are physically separate components. It should be understood that, in various embodiments, light orchestration module 107 can be attached/mounted to substrate 110 using substantially any known electronic packaging process. Furthermore, in some embodiments, light orchestration module 107 is configured as a non-electronic component, such as a passive component, and can be attached/mounted to substrate 110 using techniques that do not involve establishing electrical contact between light orchestration module 107 and substrate 110, such as using epoxy or other types of adhesive materials. In some embodiments, light orchestration module 107 may be integrated into a PLC on a chip that includes other components besides light orchestration module 107, rather than being defined as a separate component. In some embodiments, both light orchestration module 107 and laser source 102 may be implemented in the same PLC.
雷射源102係與光編排模組107對準以引導自雷射源102之光輸出104-1至104-N傳輸的複數雷射光束分別進入光編排模組107之光輸入接口108-1至108-N的對應者。在某些實施例中,光編排模組107係與雷射源102分離。在某些實施例中,光編排模組107係與雷射源102接觸。又,在某些實施例中,光編排模組107的一部分與雷射源102的一部分在位置上重疊。在圖1A所示之雷射模組100A之例示性實施例中,光編排模組107係與雷射源102分離且光導105係位於雷射源102與光編排模組107之間。光導105係用以將來自雷射 源102的複數雷射光束引導至光編排模組107之複數光輸入接口108-1至108-N的對應者,如線106-1至106-N所示。 Laser source 102 is aligned with optical orchestration module 107 to guide multiple laser beams transmitted from optical outputs 104-1 to 104-N of laser source 102 into corresponding optical input interfaces 108-1 to 108-N of optical orchestration module 107. In some embodiments, optical orchestration module 107 is separate from laser source 102. In some embodiments, optical orchestration module 107 is in contact with laser source 102. Furthermore, in some embodiments, a portion of optical orchestration module 107 overlaps with a portion of laser source 102. In the exemplary embodiment of laser module 100A shown in FIG1A , optical orchestration module 107 is separate from laser source 102, and light guide 105 is located between laser source 102 and optical orchestration module 107. Light guide 105 is used to guide the plurality of laser beams from laser source 102 to corresponding ones of the plurality of optical input interfaces 108-1 to 108-N of optical orchestration module 107, as indicated by lines 106-1 to 106-N.
在各種實施例中,光導105實質上可由任何材料所形成,只要光能經由此材料自光導105上之入口位置傳輸到光導105之出口位置。例如,在各種實施例中,光導105尤其可由玻璃、SiN、SiO2、氧化鍺及/或二氧化矽所形成。在某些實施例中,光導105係用以維持雷射源102與光編排模組107之間之複數雷射光束的極化。在某些實施例中,光導105包含(N)光傳輸通道,其中每一光傳輸通道係自雷射源102之光輸出接口104-1至104-N中的一對應者延伸至光編排模組107之光輸入接口108-1至108-N的一對應者。在某些實施例中,光導105之(N)光傳輸通道中的每一通道在垂直雷射光束傳播方向(即如圖1A所示垂直於x方向)的平面上有實質上矩形的橫剖面,其作用在於在雷射源102傳播至光編排模組107時維持雷射光束的極化。 In various embodiments, light guide 105 can be formed from virtually any material as long as light energy can be transmitted from an entrance location on light guide 105 to an exit location thereof. For example, in various embodiments, light guide 105 can be formed from glass, SiN, SiO 2 , germanium oxide, and/or silicon dioxide, among others. In some embodiments, light guide 105 is used to maintain polarization of a plurality of laser beams between laser source 102 and light orchestration module 107. In some embodiments, light guide 105 includes (N) optical transmission channels, each of which extends from a corresponding one of optical output interfaces 104 - 1 to 104 -N of laser source 102 to a corresponding one of optical input interfaces 108 - 1 to 108 -N of light orchestration module 107. In some embodiments, each of the (N) light transmission channels of the light guide 105 has a substantially rectangular cross-section in a plane perpendicular to the propagation direction of the laser beam (i.e., perpendicular to the x-direction as shown in FIG. 1A ). This serves to maintain the polarization of the laser beam as it propagates from the laser source 102 to the light orchestration module 107.
在圖1A之例示性實施例中,光導105被定義為附接至基板110的分離元件。因此應瞭解,在雷射模組100A的例示性實施例中,雷射源102、光導105及光編排模組107為實體分離的元件。應瞭解,在各種實施例中,光導105可實質上利用任何已知的電子封裝處理附接/安裝至基板110。又,在某些實施例中,光導105被配置為非電子元件如被動元件且可利用不涉及在光導105與基板110間建立電接觸的技術如利用環氧樹脂或其他類型的黏著材料附接/安裝至基板110。在某些實施例中,光導105可整合至包含除了光導105外之其他元件之晶片上的PLC內,而非被定義為一分離元件。在某些實施例中,雷射源102、光導105及光編排模組107可在一相同的PLC內實施。 In the exemplary embodiment of FIG1A , light guide 105 is defined as a separate component attached to substrate 110. Therefore, it should be understood that in the exemplary embodiment of laser module 100A, laser source 102, light guide 105, and light orchestration module 107 are physically separate components. It should be understood that, in various embodiments, light guide 105 can be attached/mounted to substrate 110 using substantially any known electronic packaging process. Furthermore, in some embodiments, light guide 105 is configured as a non-electronic component, such as a passive component, and can be attached/mounted to substrate 110 using techniques that do not involve establishing electrical contact between light guide 105 and substrate 110, such as using epoxy or other types of adhesive materials. In some embodiments, light guide 105 may be integrated into a PLC on a chip that includes other components besides light guide 105, rather than being defined as a separate component. In some embodiments, laser source 102, light guide 105, and light orchestration module 107 may be implemented within the same PLC.
在某些實施例中,雷射模組100A包含設置在雷射源102鄰近的熱分散元件。熱分散元件係用以分散複數雷射103-1至103-N的熱輸出以在複數雷射103-1至103-N之間提供溫度相依之波長漂移的實質均勻度。在某些實施例 中,熱分散元件係包含於雷射源102內。在某些實施例中,熱分散元件係包含於基板110內。在某些實施例中,熱分散元件之形成有別於雷射源102、光編排模組107及基板110每一者。在某些實施例中,熱分散元件係包含於光編排模組107內且光編排模組107之熱分散元件部分係與雷射源102實體重疊。在某些實施例中,熱分散元件係包含於光導105內且光導105之熱分散元件部分係與雷射源102實體重疊。在各種實施例中,熱分散元件係由導熱材料如金屬材料形成。在某些實施例中,熱分散元件可包含用以使熱自複數雷射103-1至103-N主動傳輸離開的元件如熱電冷卻元件。又,在某些實施例中,熱分散元件係形成具有充分的大質量俾以具有將熱自雷射源102之複數雷射103-1至103-N發散之熱沉的功能。 In some embodiments, laser module 100A includes a heat-distribution element positioned adjacent to laser source 102. The heat-distribution element is used to distribute the heat output of the plurality of lasers 103-1 through 103-N, thereby providing substantial uniformity in temperature-dependent wavelength shifts across the plurality of lasers 103-1 through 103-N. In some embodiments, the heat-distribution element is included within laser source 102. In some embodiments, the heat-distribution element is included within substrate 110. In some embodiments, the heat-distribution element is formed separately from each of laser source 102, light-orchestrating module 107, and substrate 110. In some embodiments, the heat-distribution element is included within light-orchestrating module 107, and a portion of the heat-distribution element of light-orchestrating module 107 physically overlaps with laser source 102. In some embodiments, a heat dissipation element is included within the light guide 105, and the heat dissipation element portion of the light guide 105 is physically overlapped with the laser source 102. In various embodiments, the heat dissipation element is formed from a thermally conductive material, such as a metal. In some embodiments, the heat dissipation element may include an element, such as a thermoelectric cooling element, for actively transferring heat away from the plurality of lasers 103-1 to 103-N. Furthermore, in some embodiments, the heat dissipation element is formed with a sufficiently large mass to function as a heat sink to dissipate heat from the plurality of lasers 103-1 to 103-N of the laser source 102.
圖1B顯示根據本發明之某些實施例之雷射模組100A的側面圖,其中光導105存在。在圖1B之實施例中,雷射源102及光編排模組107係以實質上共平面之方式設置於基板110上俾使雷射源102之光輸出接口104-1至104-N係分別與光編排模組107的光輸入接口108-1至108-N水平對準,俾以在雷射源102之光輸出接口104-1至104-N處或在光編排模組107之光輸入接口108-1至108-N處不需要轉動雷射光束。 FIG1B shows a side view of a laser module 100A according to certain embodiments of the present invention, wherein light guide 105 is present. In the embodiment of FIG1B , laser source 102 and light orchestration module 107 are disposed on substrate 110 in a substantially coplanar manner such that optical output interfaces 104-1 through 104-N of laser source 102 are horizontally aligned with optical input interfaces 108-1 through 108-N of light orchestration module 107, respectively. This eliminates the need for laser beam rotation at optical output interfaces 104-1 through 104-N of laser source 102 or at optical input interfaces 108-1 through 108-N of light orchestration module 107.
圖1C顯示根據本發明之某些實施例之雷射模組100A的側面圖,其中光導105不存在。在圖1C之實施例中,雷射源102及光編排模組107係以實質上共平面之方式設置於基板110上俾使雷射源102之光輸出接口104-1至104-N係分別與光編排模組107之光輸入接口108-1至108-N水平對準,俾以在雷射源102之光輸出接口104-1至104-N處或在光編排模組107之光輸入接口108-1至108-N處不需要轉動雷射光束。在圖1C之實施例中,雷射源102之光輸出接口104-1至104-N與光編排模組107之光輸入接口108-1至108-N之間存 在空的空間。因此在圖1C之實施例中,自雷射源102輸出之雷射光束行經通過雷射源102與光編排模組107間之空的空間的各別直線路徑。 FIG1C shows a side view of a laser module 100A according to certain embodiments of the present invention, wherein light guide 105 is absent. In the embodiment of FIG1C , laser source 102 and light orchestration module 107 are disposed on substrate 110 in a substantially coplanar manner such that optical output interfaces 104-1 through 104-N of laser source 102 are horizontally aligned with optical input interfaces 108-1 through 108-N of light orchestration module 107, respectively. This eliminates the need for laser beam rotation at optical output interfaces 104-1 through 104-N of laser source 102 or at optical input interfaces 108-1 through 108-N of light orchestration module 107. In the embodiment of Figure 1C , empty space exists between the optical output interfaces 104-1 to 104-N of the laser source 102 and the optical input interfaces 108-1 to 108-N of the optical orchestration module 107. Therefore, in the embodiment of Figure 1C , the laser beams output from the laser source 102 travel along respective straight paths through the empty space between the laser source 102 and the optical orchestration module 107.
圖1D顯示根據本發明之某些實施例之圖1C之雷射模組100A結構的側面圖,其中雷射源102與光編排模組107之間的空的空間係被一構件111覆蓋及/或密封。在各種實施例中,構件111可為在封裝期間設置之另一晶片、或在封裝期間設置之另一材料、或可為雷射源102的一整合部件、或可為光編排模組107的一整合部件。 FIG1D shows a side view of the laser module 100A structure of FIG1C according to certain embodiments of the present invention, wherein the space between the laser source 102 and the light orchestration module 107 is covered and/or sealed by a component 111. In various embodiments, component 111 may be another chip or another material provided during packaging, or may be an integral component of the laser source 102 or the light orchestration module 107.
圖1E顯示根據本發明之某些實施例之雷射模組100A的側面圖,其中光導105不存在且雷射源102與光編排模組107係以並排接觸方式配置。在圖1E之例示性雷射模組100A的結構中,雷射源102及光編排模組107係以實質上共平面之方式設置於基板110上,俾使雷射源102之光輸出接口104-1至104-N係分別與光編排模組107之光輸入接口108-1至108-N水平對準,俾以在雷射源102之光輸出接口104-1至104-N處或在光編排模組107之光輸入接口108-1至108-N處不需要轉動雷射光束。 FIG1E shows a side view of a laser module 100A according to certain embodiments of the present invention, wherein light guide 105 is absent and laser source 102 and light orchestration module 107 are arranged in side-by-side contact. In the exemplary laser module 100A structure of FIG1E , laser source 102 and light orchestration module 107 are disposed on substrate 110 in a substantially coplanar manner, such that optical output interfaces 104-1 through 104-N of laser source 102 are horizontally aligned with optical input interfaces 108-1 through 108-N of light orchestration module 107, respectively. This eliminates the need for laser beam rotation at optical output interfaces 104-1 through 104-N of laser source 102 or optical input interfaces 108-1 through 108-N of light orchestration module 107.
圖1F顯示根據本發明之某些實施例之雷射模組100A的側面圖,其中光導105不存在且雷射源102與光編排模組107係以垂直重疊接觸方式配置。在圖1F之例示性雷射模組100A的結構中,基板110係用以支撐雷射源102及光編排模組107兩者。在圖1F之例示性雷射模組100A的結構中,雷射源102之光輸出接口104-1至104-N係分別與光編排模組107之光輸入接口108-1至108-N垂直對準,俾以在雷射源102之光輸出接口104-1至104-N處及在光編排模組107之光輸入接口108-1至108-N處完成雷射光束的轉動。圖1G顯示根據本發明之某些實施例之圖1F之雷射模組100A之結構的側面圖,其中光編排模組107係延伸橫跨雷射源102俾使光編排模組107為雷射源102在雷射模組100A內的設置提供物理支撐。在圖1G之例示性雷射模組100A的結構中,若光編排 模組107之形成具有足以物理支撐其本身及雷射源102的充分機械強度,則可省略基板110。 FIG1F shows a side view of a laser module 100A according to certain embodiments of the present invention, wherein the light guide 105 is absent and the laser source 102 and the light-orchestrating module 107 are arranged in a vertically overlapping contact configuration. In the exemplary laser module 100A structure of FIG1F , the substrate 110 is used to support both the laser source 102 and the light-orchestrating module 107. In the exemplary laser module 100A structure of FIG1F , the optical output interfaces 104-1 to 104-N of the laser source 102 are vertically aligned with the optical input interfaces 108-1 to 108-N of the optical orchestration module 107, respectively, to achieve rotation of the laser beam at the optical output interfaces 104-1 to 104-N of the laser source 102 and at the optical input interfaces 108-1 to 108-N of the optical orchestration module 107. FIG1G shows a side view of the structure of the laser module 100A of FIG1F according to certain embodiments of the present invention, wherein the optical orchestration module 107 extends across the laser source 102 so that the optical orchestration module 107 provides physical support for the placement of the laser source 102 within the laser module 100A. In the structure of the exemplary laser module 100A of FIG1G , substrate 110 can be omitted if light orchestration module 107 is formed with sufficient mechanical strength to physically support itself and laser source 102.
圖2A顯示根據本發明之某些實施例之雷射模組100B的結構圖。雷射模組100B包含在一相同之PLC 200內實施的雷射源102A及光編排模組107A。雷射源102A之功能基本上與上面針對雷射模組100A所述之雷射源102的功能相同。光編排模組107A之功能基本上與上面針對雷射模組100A所述之光編排模組107的功能相同。圖2B顯示根據本發明之某些實施例之PLC 200的側面圖。在PLC 200中,雷射源102A與光編排模組107A係以彼此整合的方式實施,俾以在毋須使複數雷射103-1至103-N所產生之雷射光束201-1至201-N分別通過光輸出接口與光輸入接口的情況下將雷射光束201-1至201-N引導至光編排模組107A中。又,在PLC 200中,由於雷射源102A與光編排模組107A間的光學整合,故不需要分離的光導105。 FIG2A illustrates a block diagram of a laser module 100B according to certain embodiments of the present invention. Laser module 100B includes a laser source 102A and a light orchestration module 107A implemented within the same PLC 200. The functionality of laser source 102A is substantially the same as that of laser source 102 described above for laser module 100A. The functionality of light orchestration module 107A is substantially the same as that of light orchestration module 107 described above for laser module 100A. FIG2B illustrates a side view of PLC 200 according to certain embodiments of the present invention. In PLC 200, laser source 102A and optical orchestration module 107A are integrated with each other, allowing laser beams 201-1 to 201-N generated by multiple lasers 103-1 to 103-N to be guided to optical orchestration module 107A without having to pass through optical output and optical input interfaces, respectively. Furthermore, in PLC 200, the optical integration between laser source 102A and optical orchestration module 107A eliminates the need for a separate light guide 105.
在某些實施例中,雷射源102產生在不同波長(λ1-λN)下具有充分功率的複數雷射光束俾使多波長雷射輸出MWL-1至MWL-M自光編排模組107/107A輸出並具有用於光數據通訊中的充分功率。然而在某些實施例中,由於雷射源102輸出功率之限制及/或由於光導105及/或光編排模組107中之光學損失,自光編排模組107/107A輸出的多波長雷射輸出MWL-1至MWL-M不具有用於光數據通訊中的充分功率。因此在某些實施例中,自光編排模組107/107A輸出的多波長雷射輸出MWL-1至MWL-M在用於光數據通訊前需要被光學放大。多波長雷射輸出MWL-1至MWL-M中的每一者可利用光放大器光學放大。在各種實施例中,光放大器可直接在雷射模組內實施。 In some embodiments, laser source 102 generates multiple laser beams at different wavelengths (λ1-λN) with sufficient power so that the multi-wavelength laser outputs MWL-1 through MWL-M output from optical orchestration module 107/107A have sufficient power for use in optical data communication. However, in some embodiments, due to output power limitations of laser source 102 and/or optical losses in light guide 105 and/or optical orchestration module 107, the multi-wavelength laser outputs MWL-1 through MWL-M output from optical orchestration module 107/107A do not have sufficient power for use in optical data communication. Therefore, in some embodiments, the multi-wavelength laser outputs MWL-1 through MWL-M output from optical orchestration module 107/107A need to be optically amplified before use in optical data communication. Each of the multi-wavelength laser outputs MWL-1 through MWL-M can be optically amplified using an optical amplifier. In various embodiments, the optical amplifier can be implemented directly within the laser module.
圖3A顯示根據本發明之某些實施例之雷射模組100C的結構圖,雷射模組100C包含雷射源102、光編排模組107及光放大模組303。雷射源102之配置基本上與上面針對雷射模組100A所述者相同。又,光編排模組107之配 置基本上與上面針對雷射模組100A所述者相同。又,在某些實施例中,雷射模組100C可包含位於雷射源102與光編排模組107之間的光導105,其中光導105之配置方式係與前面針對雷射模組100A所述之方式相同。 Figure 3A shows the structure of a laser module 100C according to certain embodiments of the present invention. Laser module 100C includes a laser source 102, a light-orchestrating module 107, and an optical amplifier module 303. The configuration of laser source 102 is substantially the same as that described above for laser module 100A. Furthermore, the configuration of light-orchestrating module 107 is substantially the same as that described above for laser module 100A. Furthermore, in certain embodiments, laser module 100C may include a light guide 105 located between laser source 102 and light-orchestrating module 107, with the configuration of light guide 105 being the same as that described above for laser module 100A.
光放大模組303係用以在光放大模組303之複數對應光輸入接口304-1至304-M處接收來自光編排模組107之複數對應光輸出接口109-1至109-M複數接收多波長雷射輸出MWL-1至MWL-M。光放大模組303包含複數光放大器305-1至305-M分別用以放大在光放大模組303之複數光輸入接口304-1至304-M處接收的複數多波長雷射輸出MWL-1至MWL-M。在各種實施例中,複數光放大器305-1至305-M尤其可被定義為一或多個半導體光放大器、摻雜鉺/鐿之光纖放大器、拉曼放大器。光放大器305-1至305-M係配置且光學連接以分別對光放大模組303之複數光輸出接口306-1至306-M提供複數多波長雷射輸出AMWL-1至AMWL-M的經放大版本。以此方式,對於雷射模組100C而言,光放大模組303之光輸出接口306-1至306-M中的每一者提供複數經放大之多波長雷射輸出AMWL-1至AMWL-M中的一對應者。在某些實施例中,光放大模組303係用以維持光放大模組303之複數光輸入接口304-1至304-M與光放大模組303之複數光輸出接口306-1至306-M之間之複數雷射光束中之每一光束的極化。 Optical amplifier module 303 is configured to receive, at corresponding optical input interfaces 304-1 to 304-M of optical amplifier module 303, a plurality of received multi-wavelength laser outputs MWL-1 to MWL-M from corresponding optical output interfaces 109-1 to 109-M of optical orchestration module 107. Optical amplifier module 303 includes a plurality of optical amplifiers 305-1 to 305-M, each configured to amplify the plurality of multi-wavelength laser outputs MWL-1 to MWL-M received at the plurality of optical input interfaces 304-1 to 304-M of optical amplifier module 303. In various embodiments, the plurality of optical amplifiers 305-1 to 305-M may be defined as one or more semiconductor optical amplifiers, gerbium/fermium doped fiber amplifiers, or Raman amplifiers. Optical amplifiers 305-1 through 305-M are configured and optically connected to provide amplified versions of the plurality of multi-wavelength laser outputs AMWL-1 through AMWL-M to the plurality of optical output interfaces 306-1 through 306-M of the optical amplifier module 303, respectively. In this manner, for the laser module 100C, each of the optical output interfaces 306-1 through 306-M of the optical amplifier module 303 provides a corresponding one of the plurality of amplified multi-wavelength laser outputs AMWL-1 through AMWL-M. In certain embodiments, the optical amplifier module 303 is configured to maintain the polarization of each of the plurality of laser beams between the plurality of optical input interfaces 304-1 through 304-M of the optical amplifier module 303 and the plurality of optical output interfaces 306-1 through 306-M of the optical amplifier module 303.
在圖3A之例示性實施例中,光放大模組303被定義為附接至基板110的分離元件。因此應瞭解,在雷射模組100C的例示性實施例中,雷射源102、光編排模組107及光放大模組303為實體分離的元件。應瞭解,在各種實施例中,光放大模組303可實質上利用任何已知的電子封裝處理如覆晶接合附接/安裝至基板110,電子封裝處理可選擇性地包含在光放大模組303與基板110之間設置球柵陣列(BGA)、凸塊、焊料、底填料及/或其他成分(複數成分)且包含接合技術如質量回流、熱壓接合(TCB)、或實質上任何其他適合的接合技術。 In the exemplary embodiment of FIG. 3A , the optical amplifier module 303 is defined as a separate component attached to the substrate 110 . Therefore, it should be understood that in the exemplary embodiment of the laser module 100C, the laser source 102 , the optical orchestration module 107 , and the optical amplifier module 303 are physically separate components. It should be understood that in various embodiments, the optical amplifier module 303 can be attached/mounted to the substrate 110 using substantially any known electronic packaging process, such as flip-chip bonding. The electronic packaging process may optionally include placing a ball grid array (BGA), bumps, solder, underfill, and/or other component(s) between the optical amplifier module 303 and the substrate 110 and including bonding techniques such as mass reflow, thermal compression bonding (TCB), or substantially any other suitable bonding technique.
光編排模組107係與光放大模組303對準以引導多波長雷射輸出MWL-1至MWL-M進入光放大模組303之光輸入接口304-1至304-M中的對應者。在某些實施例中,光放大模組303係與光編排模組107分離。在某些實施例中,光放大模組303係與光編排模組107接觸。又,在某些實施例中,光放大模組303的一部分係與光編排模組107之一部分及/或雷射源102的一部分重疊。在雷射模組100C的例示性實施例中,如圖3A中所示,光放大模組303之位置係與光編排模組107分離且光導301係位於光編排模組107與光放大模組303之間。光導301係用以將來自光編排模組107之複數多波長雷射輸出MWL-1至MWL-M引導至光放大模組303之複數光輸入接口304-1至304-M中的對應者中。 Optical orchestration module 107 is aligned with optical amplifier module 303 to guide multi-wavelength laser outputs MWL-1 to MWL-M into corresponding optical input interfaces 304-1 to 304-M of optical amplifier module 303. In some embodiments, optical amplifier module 303 is separate from optical orchestration module 107. In some embodiments, optical amplifier module 303 is in contact with optical orchestration module 107. Furthermore, in some embodiments, a portion of optical amplifier module 303 overlaps with a portion of optical orchestration module 107 and/or a portion of laser source 102. In an exemplary embodiment of laser module 100C, as shown in FIG3A , optical amplifier module 303 is positioned separate from optical orchestration module 107, and light guide 301 is located between optical orchestration module 107 and optical amplifier module 303. The light guide 301 is used to guide the multiple multi-wavelength laser outputs MWL-1 to MWL-M from the optical arrangement module 107 to the corresponding ones of the multiple optical input interfaces 304-1 to 304-M of the optical amplification module 303.
在各種實施例中,光導301實質上可由任何材料所形成,只要光能經由此材料自光導301上之入口位置傳輸到光導301之出口位置。例如,在各種實施例中,光導301尤其可由玻璃、SiN、SiO2、氧化鍺及/或二氧化矽所形成。在某些實施例中,光導301係用以維持光編排模組107與光放大模組303之間之複數多波長雷射輸出MWL-1至MWL-M的極化。在某些實施例中,光導301包含(M)光傳輸通道,其中每一光傳輸通道係自光編排模組107之光輸出接口109-1至109-M中的一對應者延伸至光放大模組303之光輸入接口304-1至304-M的一對應者。在某些實施例中,光導301之(M)光傳輸通道中的每一通道在垂直多波長雷射輸出之傳播方向(即如圖3A所示垂直於x方向)的平面上有實質上矩形的橫剖面,其作用在於在多波長雷射輸出自光編排模組107傳播至光放大模組303時維持多波長雷射輸出的極化。 In various embodiments, light guide 301 can be formed from virtually any material as long as light energy can be transmitted from an entrance location on light guide 301 to an exit location thereof. For example, in various embodiments, light guide 301 can be formed from glass, SiN, SiO 2 , germanium oxide, and/or silicon dioxide. In some embodiments, light guide 301 is used to maintain polarization of a plurality of multi-wavelength laser outputs MWL-1 to MWL-M between optical orchestration module 107 and optical amplifier module 303. In some embodiments, light guide 301 includes (M) optical transmission channels, each of which extends from a corresponding one of optical output interfaces 109-1 to 109-M of optical orchestration module 107 to a corresponding one of optical input interfaces 304-1 to 304-M of optical amplifier module 303. In some embodiments, each of the (M) optical transmission channels of the light guide 301 has a substantially rectangular cross-section in a plane perpendicular to the propagation direction of the multi-wavelength laser output (i.e., perpendicular to the x-direction as shown in FIG. 3A ). This serves to maintain the polarization of the multi-wavelength laser output as it propagates from the optical orchestration module 107 to the optical amplification module 303.
在圖3A之例示性實施例中,光導301被定義為附接至基板110的分離元件。因此應瞭解,在雷射模組100C的例示性實施例中,雷射源102、光導105、光編排模組107、光導301及光放大模組303為實體分離的元件。應 瞭解,在各種實施例中,光導301可實質上利用任何已知的電子封裝處理附接/安裝至基板110。又,在某些實施例中,光導301被配置為非電子元件如被動元件且可利用不涉及在光導301與基板110間建立電接觸的技術如利用環氧樹脂或其他類型的黏著材料附接/安裝至基板110。在某些實施例中,光導301可整合至包含除了光導301外之其他元件之晶片上的PLC內,而非被定義為一分離元件。在某些實施例中,雷射源102、光導105、光編排模組107、光導301及光放大模組303中的兩或更多者可在一相同的PLC內實施。 In the exemplary embodiment of FIG3A , light guide 301 is defined as a separate component attached to substrate 110. Therefore, it should be understood that in the exemplary embodiment of laser module 100C, laser source 102, light guide 105, light orchestration module 107, light guide 301, and optical amplification module 303 are physically separate components. It should be understood that, in various embodiments, light guide 301 can be attached/mounted to substrate 110 using virtually any known electronic packaging process. Furthermore, in some embodiments, light guide 301 is configured as a non-electronic component, such as a passive component, and can be attached/mounted to substrate 110 using techniques that do not involve establishing electrical contact between light guide 301 and substrate 110, such as using epoxy or other types of adhesive materials. In some embodiments, light guide 301 may be integrated into a PLC on a chip that includes other components besides light guide 301, rather than being defined as a separate component. In some embodiments, two or more of laser source 102, light guide 105, optical orchestration module 107, light guide 301, and optical amplification module 303 may be implemented within the same PLC.
圖3B顯示根據本發明之某些實施例之雷射模組100C的側面圖,其中光導105存在且光導301存在。在圖3B之實施例中,雷射源102與光編排模組107與光放大模組303係以實質上共平面之方式設置於基板110上,俾使雷射源102之光輸出接口104-1至104-N係分別與光編排模組107之光輸入接口108-1至108-N水平對準且俾使光編排模組107之光輸出接口109-1至109-M分別與光放大模組303之光輸入接口304-1至304-M水平對準。以此方式,在圖3B之例示性實施例中,在雷射源102之光輸出接口104-1至104-N處或在光編排模組107之光輸入接口108-1至108-N處或在光編排模組107之光輸出接口109-1至109-M處或在光放大模組303之光輸入接口304-1至304-M處不需要轉動雷射光束。 FIG3B shows a side view of a laser module 100C according to certain embodiments of the present invention, wherein light guide 105 and light guide 301 are present. In the embodiment of FIG3B , laser source 102, optical arrangement module 107, and optical amplifier module 303 are arranged on substrate 110 in a substantially coplanar manner, such that optical output interfaces 104-1 to 104-N of laser source 102 are horizontally aligned with optical input interfaces 108-1 to 108-N of optical arrangement module 107, respectively, and optical output interfaces 109-1 to 109-M of optical arrangement module 107 are horizontally aligned with optical input interfaces 304-1 to 304-M of optical amplifier module 303, respectively. In this way, in the exemplary embodiment of FIG. 3B , there is no need to rotate the laser beam at the optical output interfaces 104-1 to 104-N of the laser source 102, or at the optical input interfaces 108-1 to 108-N of the optical orchestration module 107, or at the optical output interfaces 109-1 to 109-M of the optical orchestration module 107, or at the optical input interfaces 304-1 to 304-M of the optical amplification module 303.
圖3C顯示根據本發明之某些實施例之雷射模組100C的側面圖,其中光導105存在且光導301不存在。在圖3C之實施例中,雷射源102與光編排模組107與光放大模組303係以實質上共平面之方式設置於基板110上,俾使雷射源102之光輸出接口104-1至104-N係分別與光編排模組107之光輸入接口108-1至108-N水平對準且俾使光編排模組107之光輸出接口109-1至109-M分別與光放大模組303之光輸入接口304-1至304-M水平對準。以此方式,在圖3C之例示性實施例中,在雷射源102之光輸出接口104-1至104-N處或在光編 排模組107之光輸入接口108-1至108-N處或在光編排模組107之光輸出接口109-1至109-M處或在光放大模組303之光輸入接口304-1至304-M處不需要轉動雷射光束。在圖3C之實施例中,在光編排模組107之光輸出接口109-1至109-M與光放大模組303之光輸入接口304-1至304-M之間存在一空的空間。因此在圖3C之實施例中,多波長雷射輸出MWL-1至MWL-M行經通過光編排模組107與光放大模組303間之空的空間的各別直線路徑。圖3D顯示根據本發明之某些實施例之圖3C之雷射模組100C之結構的側面圖,其中光編排模組107與光放大模組103之間的空的空間係被一構件307覆蓋及/或密封。在各種實施例中,構件307可為在封裝期間設置之另一晶片、或在封裝期間設置之另一材料、或可為雷射源光導105的一整合部件、或光放大模組303的一整合部件。 FIG3C shows a side view of a laser module 100C according to certain embodiments of the present invention, wherein light guide 105 is present and light guide 301 is absent. In the embodiment of FIG3C , laser source 102, optical arrangement module 107, and optical amplifier module 303 are disposed on substrate 110 in a substantially coplanar manner, such that optical output interfaces 104-1 to 104-N of laser source 102 are horizontally aligned with optical input interfaces 108-1 to 108-N of optical arrangement module 107, respectively, and optical output interfaces 109-1 to 109-M of optical arrangement module 107 are horizontally aligned with optical input interfaces 304-1 to 304-M of optical amplifier module 303, respectively. In this way, in the exemplary embodiment of FIG3C , no laser beam rotation is required at the optical output interfaces 104-1 to 104-N of the laser source 102, at the optical input interfaces 108-1 to 108-N of the optical orchestration module 107, at the optical output interfaces 109-1 to 109-M of the optical orchestration module 107, or at the optical input interfaces 304-1 to 304-M of the optical amplification module 303. In the embodiment of FIG3C , an empty space exists between the optical output interfaces 109-1 to 109-M of the optical orchestration module 107 and the optical input interfaces 304-1 to 304-M of the optical amplification module 303. Therefore, in the embodiment of FIG3C , the multi-wavelength laser outputs MWL-1 to MWL-M traverse respective straight paths through the empty space between the optical orchestration module 107 and the optical amplifier module 303. FIG3D shows a side view of the structure of the laser module 100C of FIG3C according to certain embodiments of the present invention, wherein the empty space between the optical orchestration module 107 and the optical amplifier module 103 is covered and/or sealed by a component 307. In various embodiments, component 307 can be another chip or another material provided during packaging, or can be an integral component of the laser source light guide 105 or an integral component of the optical amplifier module 303.
圖3E顯示根據本發明之某些實施例之雷射模組100C的側面圖,其中光導105存在且光導301不存在且光編排模組107與光放大模組303係以並排接觸方式配置。在圖3E之例示性雷射模組100C的結構中,光編排模組107與光放大模組303係以實質上共平面之方式設置於基板110上,俾使光編排模組107之光輸出接口109-1至109-M分別與光放大模組303之光輸入接口304-1至304-M水平對準,俾以在光編排模組107之光輸出接口109-1至109-M處或在光放大模組303之光輸入接口304-1至304-M處不需要轉動雷射光束。 FIG3E shows a side view of a laser module 100C according to certain embodiments of the present invention, wherein light guide 105 is present and light guide 301 is absent, and optical arrangement module 107 and optical amplifier module 303 are arranged in a side-by-side contact configuration. In the exemplary laser module 100C structure of FIG3E , optical arrangement module 107 and optical amplifier module 303 are disposed on substrate 110 in a substantially coplanar manner, such that optical output interfaces 109-1 to 109-M of optical arrangement module 107 are horizontally aligned with optical input interfaces 304-1 to 304-M of optical amplifier module 303, respectively. This eliminates the need for laser beam rotation at optical output interfaces 109-1 to 109-M of optical arrangement module 107 or at optical input interfaces 304-1 to 304-M of optical amplifier module 303.
圖3F顯示根據本發明之某些實施例之雷射模組100C的側面圖,其中光導301不存在且光編排模組107與光放大模組303係以垂直重疊接觸方式配置。在圖3F之例示性雷射模組100C的結構中,基板110係用以支撐雷射源102、光導105、光編排模組107及光放大模組303中的每一者。在圖3F之例示性雷射模組100C的結構中,光編排模組107之光輸出接口109-1至109-M係分別與光放大模組303之光輸入接口304-1至304-M垂直對準,俾以在光編排模組 107之光輸出接口109-1至109-M處及在光放大模組303之光輸入接口304-1至304-M處完成雷射光束之轉動。 FIG3F shows a side view of a laser module 100C according to certain embodiments of the present invention, wherein light guide 301 is absent and light-orchestrating module 107 and optical amplification module 303 are arranged in a vertically overlapping contact configuration. In the exemplary laser module 100C structure of FIG3F , substrate 110 is used to support each of laser source 102, light guide 105, light-orchestrating module 107, and optical amplification module 303. In the exemplary laser module 100C structure of Figure 3F , the optical output interfaces 109-1 through 109-M of the optical arrangement module 107 are vertically aligned with the optical input interfaces 304-1 through 304-M of the optical amplification module 303, respectively. This allows for rotation of the laser beam at the optical output interfaces 109-1 through 109-M of the optical arrangement module 107 and at the optical input interfaces 304-1 through 304-M of the optical amplification module 303.
圖3G顯示根據本發明之某些實施例之圖3F之雷射模組100C之結構的側面圖,其中光放大模組303係延伸橫跨光編排模組107、光導105及電射源102俾使光放大模組303為光編排模組107、光導105及雷射源102中的每一者在雷射模組100C內的設置提供物理支撐。在圖3G之例示性雷射模組100C的結構中,若光放大模組303之形成具有足以物理支撐其本身及光編排模組107、光導105及雷射源102每一者的充分機械強度,則可省略基板110。 FIG3G shows a side view of the structure of the laser module 100C of FIG3F according to certain embodiments of the present invention, in which the optical amplifier module 303 extends across the optical orchestration module 107, the light guide 105, and the laser source 102, so that the optical amplifier module 303 provides physical support for each of the optical orchestration module 107, the light guide 105, and the laser source 102 within the laser module 100C. In the exemplary laser module 100C structure of FIG3G , if the optical amplifier module 303 is formed with sufficient mechanical strength to physically support itself and each of the optical orchestration module 107, the light guide 105, and the laser source 102, the substrate 110 may be omitted.
圖3H顯示根據本發明之某些實施例之圖3B之雷射模組100C之結構之修改的側面圖,其中光導105不存在。以此方式,圖3H之雷射模組100C的結構表現出圖3B之雷射模組100C之修改以具有相關於上述之圖1C之雷射模組100A之缺乏光導105的特徵。 FIG3H shows a side view of a modification of the structure of the laser module 100C of FIG3B according to certain embodiments of the present invention, wherein the light guide 105 is absent. In this manner, the structure of the laser module 100C of FIG3H represents a modification of the laser module 100C of FIG3B to have features associated with the laser module 100A of FIG1C described above, which lacks the light guide 105.
圖3I顯示根據本發明之某些實施例之圖3C之雷射模組100C之結構之修改的側面圖,其中光導105不存在。以此方式,圖3I之雷射模組100C的結構表現出圖3C之雷射模組100C之修改以具有相關於上述之圖1C之雷射模組100A之缺乏光導105的特徵。 FIG3I shows a side view of a modification of the structure of the laser module 100C of FIG3C according to certain embodiments of the present invention, wherein the light guide 105 is absent. In this manner, the structure of the laser module 100C of FIG3I represents a modification of the laser module 100C of FIG3C to have features associated with the laser module 100A of FIG1C described above, which lacks the light guide 105.
圖3J顯示根據本發明之某些實施例之圖3E之雷射模組100C之結構之修改的側面圖,其中光導105不存在。以此方式,圖3J之雷射模組100C的結構表現出圖3E之雷射模組100C之修改以具有相關於上述之圖1C之雷射模組100A之缺乏光導105的特徵。 FIG3J shows a side view of a modification of the structure of the laser module 100C of FIG3E according to certain embodiments of the present invention, wherein the light guide 105 is absent. In this manner, the structure of the laser module 100C of FIG3J represents a modification of the laser module 100C of FIG3E to have features associated with the laser module 100A of FIG1C described above, which lacks the light guide 105.
圖3K顯示根據本發明之某些實施例之圖3F之雷射模組100C之結構之修改的側面圖,其中光導105不存在。以此方式,圖3K之雷射模組100C的結構表現出圖3F之雷射模組100C之修改以具有相關於上述之圖1C之雷射模組100A之缺乏光導105的特徵。 FIG3K shows a side view of a modification of the structure of the laser module 100C of FIG3F according to certain embodiments of the present invention, wherein the light guide 105 is absent. In this manner, the structure of the laser module 100C of FIG3K represents a modification of the laser module 100C of FIG3F to have features associated with the laser module 100A of FIG1C described above, which lacks the light guide 105.
圖3L顯示根據本發明之某些實施例之圖3G之雷射模組100C之結構之修改的側面圖,其中光導105不存在。以此方式,圖3L之雷射模組100C的結構表現出圖3G之雷射模組100C之修改以具有相關於上述之圖1C之雷射模組100A之缺乏光導105的特徵。 FIG3L shows a side view of a modification of the structure of the laser module 100C of FIG3G according to certain embodiments of the present invention, wherein the light guide 105 is absent. In this manner, the structure of the laser module 100C of FIG3L represents a modification of the laser module 100C of FIG3G to have features associated with the laser module 100A of FIG1C described above, which lacks the light guide 105.
圖3M顯示根據本發明之某些實施例之圖3B之雷射模組100C之結構之修改的側面圖,其中雷射源102與光編排模組107係以並排接觸方式配置。以此方式,圖3M之雷射模組100C的結構表現出圖3B之雷射模組100C之修改以具有相關於上述之圖1E之雷射模組100A之雷射源102與光編排模組107以並排接觸方式設置的特徵。 FIG3M shows a side view of a modification of the structure of the laser module 100C of FIG3B according to certain embodiments of the present invention, in which the laser source 102 and the light-orchestrating module 107 are arranged in a side-by-side contact arrangement. Thus, the structure of the laser module 100C of FIG3M represents a modification of the laser module 100C of FIG3B to incorporate the features of the laser module 100A of FIG1E described above, in which the laser source 102 and the light-orchestrating module 107 are arranged in a side-by-side contact arrangement.
圖3N顯示根據本發明之某些實施例之圖3C之雷射模組之結構之修改的側面圖,其中雷射源102與光編排模組107係以並排接觸方式配置。以此方式,圖3N之雷射模組100C的結構表現出圖3C之雷射模組100C之修改以具有相關於上述之圖1E之雷射模組100A之雷射源102與光編排模組107以並排接觸方式設置的特徵。 FIG3N shows a side view of a modification of the structure of the laser module of FIG3C according to certain embodiments of the present invention, in which the laser source 102 and the light-orchestrating module 107 are arranged in a side-by-side contact arrangement. Thus, the structure of the laser module 100C of FIG3N represents a modification of the laser module 100C of FIG3C to incorporate the features of the laser module 100A of FIG1E described above, in which the laser source 102 and the light-orchestrating module 107 are arranged in a side-by-side contact arrangement.
圖3O顯示根據本發明之某些實施例之圖3E之雷射模組100C之結構之修改的側面圖,其中雷射源102與光編排模組107係以並排接觸方式配置。以此方式,圖3O之雷射模組100C的結構表現出圖3E之雷射模組100C之修改以具有相關於上述之圖1E之雷射模組100A之雷射源102與光編排模組107以並排接觸方式設置的特徵。 FIG3O shows a side view of a modification of the structure of the laser module 100C of FIG3E according to certain embodiments of the present invention, in which the laser source 102 and the light-orchestrating module 107 are arranged in a side-by-side contact arrangement. In this manner, the structure of the laser module 100C of FIG3O represents a modification of the laser module 100C of FIG3E to incorporate the features of the laser module 100A of FIG1E described above, in which the laser source 102 and the light-orchestrating module 107 are arranged in a side-by-side contact arrangement.
圖3P顯示根據本發明之某些實施例之圖3F之雷射模組100C之結構之修改的側面圖,其中雷射源102與光編排模組107係以並排接觸方式配置。以此方式,圖3P之雷射模組100C的結構表現出圖3F之雷射模組100C之修改以具有相關於上述之圖1E之雷射模組100A之雷射源102與光編排模組107以並排接觸方式設置的特徵。 FIG3P shows a side view of a modification of the structure of the laser module 100C of FIG3F according to certain embodiments of the present invention, in which the laser source 102 and the light-scheduling module 107 are arranged in a side-by-side contact arrangement. Thus, the structure of the laser module 100C of FIG3P represents a modification of the laser module 100C of FIG3F to incorporate the features of the laser module 100A of FIG1E described above, in which the laser source 102 and the light-scheduling module 107 are arranged in a side-by-side contact arrangement.
圖3Q顯示根據本發明之某些實施例之圖3G之雷射模組100C之結構之修改的側面圖,其中雷射源102與光編排模組107係以並排接觸方式配置。以此方式,圖3Q之雷射模組100C的結構表現出圖3G之雷射模組100C之修改以具有相關於上述之圖1E之雷射模組100A之雷射源102與光編排模組107以並排接觸方式設置的特徵。 FIG3Q shows a side view of a modification of the structure of the laser module 100C of FIG3G according to certain embodiments of the present invention, in which the laser source 102 and the light-orchestrating module 107 are arranged in a side-by-side contact arrangement. In this manner, the structure of the laser module 100C of FIG3Q represents a modification of the laser module 100C of FIG3G to incorporate the features of the laser module 100A of FIG1E described above, in which the laser source 102 and the light-orchestrating module 107 are arranged in a side-by-side contact arrangement.
圖3R顯示根據本發明之某些實施例之圖3B之雷射模組100C之結構之修改的側面圖,其中雷射源102與光編排模組107係以垂直重疊接觸方式配置。以此方式,圖3R之雷射模組100C的結構表現出圖3B之雷射模組100C之修改以具有相關於上述之圖1F之雷射模組100A之雷射源102與光編排模組107以垂直重疊接觸方式設置的特徵。 FIG3R shows a side view of a modification of the structure of the laser module 100C of FIG3B according to certain embodiments of the present invention, in which the laser source 102 and the light-scheduling module 107 are arranged in vertically overlapping contact. In this manner, the structure of the laser module 100C of FIG3R represents a modification of the laser module 100C of FIG3B to incorporate the features of the laser module 100A of FIG1F described above, in which the laser source 102 and the light-scheduling module 107 are arranged in vertically overlapping contact.
圖3S顯示根據本發明之某些實施例之圖3R之雷射模組100C之結構之修改的側面圖,其中光編排模組107延伸橫跨雷射源102、光導301及光放大模組303。在圖3S之雷射模組100C之結構中,光編排模組107提供設置雷射源102、光導301及光放大模組303的物理支撐。在圖1S之例示性雷射模組100C的結構中,若光編排模組107之形成具有足以物理支撐其本身及雷射源102、光導301及光放大模組303每一者的充分機械強度,則可省略基板110。 FIG3S shows a side view of a modification of the structure of laser module 100C of FIG3R according to certain embodiments of the present invention, in which light orchestration module 107 extends across laser source 102, light guide 301, and optical amplifier module 303. In the structure of laser module 100C of FIG3S , light orchestration module 107 provides physical support for the laser source 102, light guide 301, and optical amplifier module 303. In the exemplary laser module 100C structure of FIG1S , substrate 110 may be omitted if light orchestration module 107 is formed with sufficient mechanical strength to physically support itself and each of laser source 102, light guide 301, and optical amplifier module 303.
圖3T顯示根據本發明之某些實施例之圖3R之雷射模組300C之結構之修改的側面圖,其中光導301不存在。以此方式,圖3T之雷射模組100C的結構表現出圖3R之雷射模組100C之修改以具有相關於上述之圖3C之雷射模組100A之缺乏光導301的特徵。 FIG3T shows a side view of a modification of the structure of the laser module 300C of FIG3R according to certain embodiments of the present invention, wherein the light guide 301 is absent. In this manner, the structure of the laser module 100C of FIG3T represents a modification of the laser module 100C of FIG3R to have features associated with the laser module 100A of FIG3C described above, which lacks the light guide 301.
圖3U顯示根據本發明之某些實施例之圖3S之雷射模組100C之結構之修改的側面圖,其中光導301不存在。以此方式,圖3U之雷射模組100C的結構表現出圖3S之雷射模組100C之修改以具有相關於上述之圖3C之雷射模組100A之缺乏光導301的特徵。 FIG3U shows a side view of a modification of the structure of the laser module 100C of FIG3S according to certain embodiments of the present invention, wherein the light guide 301 is absent. In this manner, the structure of the laser module 100C of FIG3U represents a modification of the laser module 100C of FIG3S to have features associated with the laser module 100A of FIG3C described above, which lacks the light guide 301.
圖3V顯示根據本發明之某些實施例之圖3T之雷射模組100C之結構之修改的側面圖,其中光導301不存在且光編排模組107與光放大模組303係以並排接觸方式配置。以此方式,圖3V之雷射模組100C的結構表現出圖3T之雷射模組100C之修改以具有相關於上述之圖3E之雷射模組100A之缺乏光導301的特徵及光編排模組107與光放大模組303以並排接觸方式設置的特徵。 FIG3V shows a side view of a modification of the structure of the laser module 100C of FIG3T according to certain embodiments of the present invention, wherein the light guide 301 is absent and the light-orchestrating module 107 and the optical amplifier module 303 are arranged in a side-by-side contact arrangement. In this manner, the structure of the laser module 100C of FIG3V represents a modification of the laser module 100C of FIG3T to incorporate the aforementioned features of the laser module 100A of FIG3E , such as the absence of the light guide 301 and the side-by-side contact arrangement of the light-orchestrating module 107 and the optical amplifier module 303.
圖3W顯示根據本發明之某些實施例之圖3S之雷射模組100C之結構之修改的側面圖,其中光導301不存在且光編排模組107與光放大模組303係以並排接觸方式配置。以此方式,圖3W之雷射模組100C之結構表現出圖3S之雷射模組100C之修改以具有相關於上述之圖3E之雷射模組100A之缺乏光導301的特徵及光編排模組107與光放大模組303以並排接觸方式設置的特徵。 FIG3W shows a side view of a modification of the structure of the laser module 100C of FIG3S according to certain embodiments of the present invention, wherein the light guide 301 is absent and the light-orchestrating module 107 and the optical amplifier module 303 are arranged in a side-by-side contact arrangement. In this manner, the structure of the laser module 100C of FIG3W represents a modification of the laser module 100C of FIG3S to incorporate the aforementioned features of the laser module 100A of FIG3E , such as the absence of the light guide 301 and the side-by-side contact arrangement of the light-orchestrating module 107 and the optical amplifier module 303.
圖3X顯示根據本發明之某些實施例之圖3R之雷射模組100C之結構之修改的側面圖,其中光導301不存在且光編排模組107與光放大模組303係以垂直重疊接觸方式配置。以此方式,圖3X之雷射模組100C的結構表現出圖3R之雷射模組100C之修改以具有相關於上述之圖3F之雷射模組100A之缺乏光導301的特徵及光編排模組107與光放大模組303以垂直重疊接觸方式設置的特徵。 FIG3X shows a side view of a modification of the structure of the laser module 100C of FIG3R according to certain embodiments of the present invention, wherein the light guide 301 is absent and the light-orchestrating module 107 and the optical amplifying module 303 are arranged in vertically overlapping contact. In this manner, the structure of the laser module 100C of FIG3X represents a modification of the laser module 100C of FIG3R to incorporate the aforementioned features of the laser module 100A of FIG3F , such as the absence of the light guide 301 and the arrangement of the light-orchestrating module 107 and the optical amplifying module 303 in vertically overlapping contact.
圖3Y顯示根據本發明之某些實施例之圖3X之雷射模組100C之結構之修改的側面圖,其中光編排模組107係延伸橫跨雷射源102與光放大模組303俾使光編排模組107為雷射源102與光放大模組303中的每一者在雷射模組100C內的設置提供物理支撐。在圖3Y之例示性雷射模組100C的結構中,若光編排模組107之形成具有足以物理支撐其本身及雷射源102及光放大模組303每一者的充分機械強度,則可省略基板110。 FIG3Y shows a side view of a modification of the structure of the laser module 100C of FIG3X according to certain embodiments of the present invention, in which the light orchestration module 107 extends across the laser source 102 and the optical amplifier module 303 so that the light orchestration module 107 provides physical support for each of the laser source 102 and the optical amplifier module 303 within the laser module 100C. In the exemplary laser module 100C structure of FIG3Y , the substrate 110 may be omitted if the light orchestration module 107 is formed with sufficient mechanical strength to physically support itself and each of the laser source 102 and the optical amplifier module 303.
圖4A顯示根據本發明之某些實施例之雷射模組100D的結構圖。雷射模組100D包含如針對圖2A所述在一相同之PLC 200內實施之雷射源102A 及光編排模組107A。雷射模組100D亦包含如針對圖3A所述之光導301及光放大模組303。在某些實施例中,PLC 200、光導301及光放大模組303係設置於基板110上。應瞭解,雷射模組100D之配置俾使其將來自PLC 200內之光編排模組107A之光輸出接口109-1至109-M之複數多波長雷射輸出MWL-1至MWL-M分別引導至光放大模組303之複數光輸入接口304-1至304-M的對應者中。 Figure 4A illustrates the structure of a laser module 100D according to certain embodiments of the present invention. Laser module 100D includes a laser source 102A and a light orchestration module 107A implemented within the same PLC 200 as described in Figure 2A . Laser module 100D also includes a light guide 301 and an optical amplifier module 303 as described in Figure 3A . In certain embodiments, PLC 200, light guide 301, and optical amplifier module 303 are disposed on substrate 110. It should be understood that the laser module 100D is configured to direct the plurality of multi-wavelength laser outputs MWL-1 to MWL-M from the optical output interfaces 109-1 to 109-M of the optical orchestration module 107A within the PLC 200 to the corresponding plurality of optical input interfaces 304-1 to 304-M of the optical amplifier module 303, respectively.
圖4B顯示根據本發明之某些實施例之圖4A之雷射模組100D之結構的側面圖。在圖4B之雷射模組100D的結構中,PLC 200與光放大模組303係以實質上共平面之方式設置於基板110上俾使光編排模組107A之光輸出接口109-1至109-M分別與光放大模組303之光輸入接口304-1至304-M水平對準,俾以在光編排模組107A之光輸出接口109-1至109-M處或在光放大模組303之光輸入接口304-1至304-M處不需要轉動雷射光束。 FIG4B shows a side view of the structure of the laser module 100D of FIG4A according to certain embodiments of the present invention. In the structure of the laser module 100D of FIG4B , the PLC 200 and the optical amplifier module 303 are disposed on the substrate 110 in a substantially coplanar manner so that the optical output interfaces 109-1 to 109-M of the optical arrangement module 107A are horizontally aligned with the optical input interfaces 304-1 to 304-M of the optical amplifier module 303, respectively. This eliminates the need to rotate the laser beam at the optical output interfaces 109-1 to 109-M of the optical arrangement module 107A or at the optical input interfaces 304-1 to 304-M of the optical amplifier module 303.
圖4C顯示根據本發明之某些實施例之圖4B之雷射模組100D之的側面圖,其中光導301不存在。在圖4C之實施例中,PLC 200與光放大模組303係以實質上共平面之方式設置於基板110上俾使光編排模組107A之光輸出接口109-1至109-M分別與光放大模組303之光輸入接口304-1至304-M水平對準,俾以在光編排模組107A之光輸出接口109-1至109-M處或在光放大模組303之光輸入接口304-1至304-M處不需要轉動雷射光束。在圖4C之實施例中,光編排模組107A之光輸出接口109-1至109-M與光放大模組303之光輸入接口304-1至304-M之間存在一空的空間。因此在圖4C之實施例中,自PLC 200輸出之雷射光束行經通過PLC 200與光放大模組303間之空的空間的各別直線路徑。圖4D顯示根據本發明之某些實施例之圖4C之雷射模組100D之結構的側面圖,其中PLC 200與光放大模組303之間的空的空間係被構件401覆蓋及/或密封。在各種實施例中,構件401可為在封裝期間設置之另一晶片、或在封裝 期間設置之另一材料、或可為PLC 200的一整合部件、或光放大模組303的一整合部件。 FIG4C shows a side view of the laser module 100D of FIG4B according to certain embodiments of the present invention, wherein the light guide 301 is absent. In the embodiment of FIG4C , the PLC 200 and the optical amplifier module 303 are arranged on the substrate 110 in a substantially coplanar manner so that the optical output interfaces 109-1 to 109-M of the optical arrangement module 107A are horizontally aligned with the optical input interfaces 304-1 to 304-M of the optical amplifier module 303, respectively. This eliminates the need to rotate the laser beam at the optical output interfaces 109-1 to 109-M of the optical arrangement module 107A or at the optical input interfaces 304-1 to 304-M of the optical amplifier module 303. In the embodiment of FIG4C , an empty space exists between the optical output interfaces 109-1 to 109-M of the optical orchestration module 107A and the optical input interfaces 304-1 to 304-M of the optical amplifier module 303. Therefore, in the embodiment of FIG4C , the laser beams output from the PLC 200 travel along respective straight paths through the empty space between the PLC 200 and the optical amplifier module 303. FIG4D shows a side view of the structure of the laser module 100D of FIG4C according to certain embodiments of the present invention, in which the empty space between the PLC 200 and the optical amplifier module 303 is covered and/or sealed by a component 401. In various embodiments, component 401 may be another chip or material incorporated during packaging, or may be an integrated component of PLC 200 or optical amplifier module 303.
圖4E顯示根據本發明之某些實施例之圖4A之雷射模組100D的側面圖,其中光導301不存在且PLC 200與光放大模組303係以並排接觸方式配置。在圖4E之實施例中,PLC 200與光放大模組303係以實質上共平面之方式設置於基板110上俾使光編排模組107A之光輸出接口109-1至109-M分別與光放大模組303之光輸入接口304-1至304-M水平對準,俾以在光編排模組107A之光輸出接口109-1至109-M處或在光放大模組303之光輸入接口304-1至304-M處不需要轉動雷射光束。 Figure 4E shows a side view of the laser module 100D of Figure 4A according to certain embodiments of the present invention, wherein light guide 301 is absent and PLC 200 and optical amplifier module 303 are arranged in a side-by-side contact configuration. In the embodiment of Figure 4E , PLC 200 and optical amplifier module 303 are disposed on substrate 110 in a substantially coplanar manner such that the optical output interfaces 109-1 to 109-M of optical orchestration module 107A are horizontally aligned with the optical input interfaces 304-1 to 304-M of optical amplifier module 303, respectively. This eliminates the need for laser beam rotation at the optical output interfaces 109-1 to 109-M of optical orchestration module 107A or at the optical input interfaces 304-1 to 304-M of optical amplifier module 303.
圖5A顯示根據本發明之某些實施例之雷射模組100E之結構圖,其中光編排模組107B與光放大模組303A係共同在一相同的PLC 503中實施。光編排模組107B之功能係實質上與上面針對雷射模組100A所述之光編排模組107的功能相同。光放大模組303A之功能係實質上與上面針對雷射模組100C所述之光放大模組303的功能相同。在PLC 503中,光編排模組107B與光放大模組303A係以彼此整合的方式實施,俾以在光編排模組107B所提供之複數多波長雷射輸出MWL-1至MWL-M不需行經光輸出接口與光輸入接口(分別由線501-1至501-M所示)的情況下被引導進入光放大模組303A中。又,在PLC 503中,由於光編排模組107B與光放大模組303A之間的光學整合,因此不需要分離的光導301。在雷射模組100E的某些實施例中,雷射源102、光導105及PLC 503係設置於基板110上。應瞭解,雷射模組100E之配置俾使來自雷射源102之光輸出接口104-1至104-N的複數雷射光束被引導至PLC 503內之光編排模組107之複數光輸入接口108-1至108-NB中的對應者。 FIG5A illustrates a block diagram of a laser module 100E according to certain embodiments of the present invention, wherein optical orchestration module 107B and optical amplifier module 303A are implemented together in the same PLC 503. The functions of optical orchestration module 107B are substantially the same as those of optical orchestration module 107 described above for laser module 100A. The functions of optical amplifier module 303A are substantially the same as those of optical amplifier module 303 described above for laser module 100C. In PLC 503, optical orchestration module 107B and optical amplifier module 303A are integrated with each other, allowing the multiple multi-wavelength laser outputs MWL-1 to MWL-M provided by optical orchestration module 107B to be directed into optical amplifier module 303A without passing through an optical output interface and an optical input interface (represented by lines 501-1 to 501-M, respectively). Furthermore, in PLC 503, the optical integration between optical orchestration module 107B and optical amplifier module 303A eliminates the need for a separate light guide 301. In certain embodiments of laser module 100E, laser source 102, light guide 105, and PLC 503 are disposed on substrate 110. It should be understood that the laser module 100E is configured so that the plurality of laser beams from the optical output interfaces 104-1 to 104-N of the laser source 102 are directed to corresponding ones of the plurality of optical input interfaces 108-1 to 108-NB of the optical arrangement module 107 within the PLC 503.
圖5B顯示根據本發明之某些實施例之圖5A之雷射模組100E之結構的側面圖。在圖5B之雷射模組100E的結構中,PLC 503與雷射源102係以 實質上共平面之方式設置於基板110上俾使雷射源102之光輸出接口104-1至104-N係分別與光編排模組107B之光輸入接口108-1至108-N水平對準,俾以在雷射源102之光輸出接口104-1至104-N處或在光編排模組107之光輸入接口108-1至108-N處不需要轉動雷射光束。 FIG5B shows a side view of the structure of the laser module 100E of FIG5A according to certain embodiments of the present invention. In the structure of the laser module 100E of FIG5B , the PLC 503 and the laser source 102 are disposed on the substrate 110 in a substantially coplanar manner so that the optical output interfaces 104-1 to 104-N of the laser source 102 are horizontally aligned with the optical input interfaces 108-1 to 108-N of the optical orchestration module 107B, respectively. This eliminates the need to rotate the laser beam at the optical output interfaces 104-1 to 104-N of the laser source 102 or at the optical input interfaces 108-1 to 108-N of the optical orchestration module 107B.
圖5C顯示根據本發明之某些實施例之圖5B之雷射模組100E之結構的側面圖,其中光導105不存在。在圖5C之實施例中,PLC 503與雷射源102係以實質上共平面之方式設置於基板110上俾使雷射源102之光輸出接口104-1至104-N係分別與光編排模組107B之光輸入接口108-1至108-N水平對準,俾以在雷射源102之光輸出接口104-1至104-N處或在光編排模組107之光輸入接口108-1至108-N處不需要轉動雷射光束。在圖5C之實施例中,雷射源102之光輸出接口104-1至104-N與光編排模組107之光輸入接口108-1至108-N之間存在空的空間。因此在圖5C之實施例中,自雷射源102輸出之雷射光束行經通過雷射源102與PLC 503間之空的空間的各別直線路徑。圖5D顯示根據本發明之某些實施例之圖5C之雷射模組100E之結構的側面圖,其中雷射源102與PLC 503之間的空的空間係被構件505覆蓋及/或密封。在各種實施例中,構件505可為在封裝期間設置之另一晶片、或在封裝期間設置之另一材料、或可為PLC 503的一整合部件、或可為雷射源102的一整合部件。 FIG5C shows a side view of the structure of laser module 100E of FIG5B according to certain embodiments of the present invention, wherein light guide 105 is absent. In the embodiment of FIG5C , PLC 503 and laser source 102 are disposed on substrate 110 in a substantially coplanar manner such that optical output interfaces 104-1 to 104-N of laser source 102 are horizontally aligned with optical input interfaces 108-1 to 108-N of optical orchestration module 107B, respectively. This eliminates the need for laser beam rotation at optical output interfaces 104-1 to 104-N of laser source 102 or optical input interfaces 108-1 to 108-N of optical orchestration module 107. In the embodiment of FIG5C , an empty space exists between the optical output interfaces 104-1 to 104-N of the laser source 102 and the optical input interfaces 108-1 to 108-N of the optical orchestration module 107. Therefore, in the embodiment of FIG5C , the laser beams output from the laser source 102 travel along respective straight paths through the empty space between the laser source 102 and the PLC 503. FIG5D shows a side view of the structure of the laser module 100E of FIG5C , according to certain embodiments of the present invention, in which the empty space between the laser source 102 and the PLC 503 is covered and/or sealed by a member 505. In various embodiments, component 505 may be another chip provided during packaging, or another material provided during packaging, or may be an integral component of PLC 503, or may be an integral component of laser source 102.
圖5E顯示根據本發明之某些實施例之雷射模組100E的側面圖,其中光導105不存在且雷射源102與PLC 503係以並排接觸方式配置。在圖5E之實施例中,雷射源102與PLC 503係以實質上共平面之方式設置於基板110上,俾使雷射源102之光輸出接口104-1至104-N係分別與光編排模組107B之光輸入接口108-1至108-N水平對準,俾以在雷射源102之光輸出接口104-1至104-N處或在光編排模組107之光輸入接口108-1至108-N處不需要轉動雷射光束。 Figure 5E shows a side view of a laser module 100E according to certain embodiments of the present invention, wherein the light guide 105 is absent and the laser source 102 and the PLC 503 are arranged in a side-by-side contact configuration. In the embodiment of Figure 5E , the laser source 102 and the PLC 503 are disposed on the substrate 110 in a substantially coplanar manner, such that the optical output interfaces 104-1 to 104-N of the laser source 102 are horizontally aligned with the optical input interfaces 108-1 to 108-N of the optical orchestration module 107B, respectively. This eliminates the need for laser beam rotation at the optical output interfaces 104-1 to 104-N of the laser source 102 or at the optical input interfaces 108-1 to 108-N of the optical orchestration module 107.
圖6A顯示根據本發明之某些實施例之雷射模組100F之結構圖,其中雷射源102A、光編排模組107C及放大模組303A係共同在一相同的PLC 601中實施。雷射源102A之功能係實質上與上面針對雷射模組100A所述之雷射源102的功能相同。光編排模組107C之功能係實質上與上面針對雷射模組100A所述之光編排模組107的功能相同。光放大模組303A之功能係實質上與上面針對雷射模組100C所述之光放大模組303的功能相同。在PLC 601中,雷射源102A與光編排模組107C係以彼此整合的方式實施,俾以在複數雷射103-1至103-N所產生之雷射光束201-1至201-N不需分別行經光輸出接口與光輸入接口的情況下被引導進入光編排模組107C中。又,在PLC 601中,由於雷射源102A與光編排模組107C之間的光學整合,因此不需要分離的光導105。又,在PLC 601中,光編排模組107C與光放大模組303A係以彼此整合的方式實施,俾以在光編排模組107C所提供之複數多波長雷射輸出MWL-1至MWL-M不需行經光輸出接口與光輸入接口(分別由線501-1至501-M所示)的情況下被引導進入光放大模組303A中。又,在PLC 601中,由於光編排模組107C與光放大模組303A之間的光學整合,因此不需要分離的光導301。圖6B顯示根據本發明之某些實施例之圖6A之雷射模組100F之結構的側面圖。 FIG6A illustrates a block diagram of a laser module 100F according to certain embodiments of the present invention, wherein a laser source 102A, an optical orchestration module 107C, and an amplifier module 303A are implemented together in a common PLC 601. The functionality of the laser source 102A is substantially the same as that of the laser source 102 described above for the laser module 100A. The functionality of the optical orchestration module 107C is substantially the same as that of the optical orchestration module 107 described above for the laser module 100A. The functionality of the optical amplifier module 303A is substantially the same as that of the optical amplifier module 303 described above for the laser module 100C. In PLC 601, laser source 102A and optical orchestration module 107C are integrated with each other, allowing laser beams 201-1 to 201-N generated by multiple lasers 103-1 to 103-N to be guided into optical orchestration module 107C without having to pass through optical output and input interfaces, respectively. Furthermore, in PLC 601, due to the optical integration between laser source 102A and optical orchestration module 107C, a separate light guide 105 is not required. Furthermore, in PLC 601, optical orchestration module 107C and optical amplifier module 303A are integrated with each other, allowing the multiple multi-wavelength laser outputs MWL-1 to MWL-M provided by optical orchestration module 107C to be directed into optical amplifier module 303A without passing through an optical output interface and an optical input interface (represented by lines 501-1 to 501-M, respectively). Furthermore, in PLC 601, due to the optical integration between optical orchestration module 107C and optical amplifier module 303A, a separate light guide 301 is not required. Figure 6B shows a side view of the structure of laser module 100F of Figure 6A according to certain embodiments of the present invention.
應瞭解,提供文中所揭露之雷射源102/102A、光導105/301、光編排模組107/107A/107B/107C及光放大模組303/303A中之每一者的幾何圖示用以例示性地簡單說明本發明。在各種實施例中,雷射源102/102A、光導105/301、光編排模組107/107A/107B/107C及光放大模組303/303A中的每一者可具有形成期望形狀與尺寸之光電裝置所需之實質上任何幾何形狀。在某些實施例中,雷射源102/102A、光導105/301、光編排模組107/107A/107B/107C及光放大模組303/303A中的一或多者可配置具有實質上平面的幾何形狀。在某些實施例中,雷射源102/102A、光導105/301、光編排模組107/107A/107B/107C及光放大模 組303/303A中的一或多者可配置具有三維變化的幾何形狀即非簡單矩形棱鏡的形狀。又,應瞭解,在各種實施例中,雷射源102/102A、光導105/301、光編排模組107/107A/107B/107C及光放大模組303/303A中的每一者在相關之座標系統的任何參考方向即在笛卡兒坐標系的x方向、y方向及z方向中可具有不同的量測到尺寸。 It should be understood that the geometric diagrams of each of the laser source 102/102A, light guide 105/301, optical orchestration module 107/107A/107B/107C, and optical amplifier module 303/303A disclosed herein are provided for illustrative purposes to simply illustrate the present invention. In various embodiments, each of the laser source 102/102A, light guide 105/301, optical orchestration module 107/107A/107B/107C, and optical amplifier module 303/303A can have substantially any geometric shape required to form an optoelectronic device of a desired shape and size. In some embodiments, one or more of the laser sources 102/102A, light guides 105/301, optical orchestration modules 107/107A/107B/107C, and optical amplification modules 303/303A may be configured to have a substantially planar geometry. In some embodiments, one or more of the laser sources 102/102A, light guides 105/301, optical orchestration modules 107/107A/107B/107C, and optical amplification modules 303/303A may be configured to have a three-dimensionally varying geometry, i.e., a shape other than a simple rectangular prism. Furthermore, it should be understood that in various embodiments, each of the laser source 102/102A, the light guide 105/301, the optical orchestration module 107/107A/107B/107C, and the optical amplification module 303/303A may have different measurable dimensions in any reference direction of the associated coordinate system, i.e., in the x-, y-, and z-directions of the Cartesian coordinate system.
圖7顯示根據本發明之某些實施例之光編排模組107/107A/107B/107C的一例示性實施例,其包含Nx1(極化維持)波長結合器701與1xM(極化維持)寬頻功率分割器705。波長結合器701係用以將在光輸入接口108-1至108-N處接收到的複數雷射光束結合成為一多波長雷射光束,多波長雷射光束係自波長結合器701經由光導703傳輸至寬頻功率分割器705。寬頻功率分割器705係用以將多波長雷射光束之總功率的複數部分分配至光編排模組107/107A/107B/107C之複數光輸出接口109-1至109-M中的每一者。 FIG7 illustrates an exemplary embodiment of an optical orchestration module 107 / 107A / 107B / 107C according to certain embodiments of the present invention, comprising an Nx1 (polarization-maintaining) wavelength combiner 701 and a 1xM (polarization-maintaining) broadband power divider 705. Wavelength combiner 701 is configured to combine multiple laser beams received at optical input interfaces 108-1 to 108-N into a multi-wavelength laser beam. The multi-wavelength laser beam is then transmitted from wavelength combiner 701 to broadband power divider 705 via optical waveguide 703. The broadband power divider 705 is used to distribute multiple portions of the total power of the multi-wavelength laser beam to each of the multiple optical output interfaces 109-1 to 109-M of the optical orchestration module 107/107A/107B/107C.
圖8顯示根據本發明之某些實施例之光編排模組107/107A/107B/107C的一例示性實施例,其包含陣列式的波導801及寬頻功率分割器805。在圖8的實例中,陣列式的波導801為16對1之陣列式波導。然而應瞭解,在各種實施例中,陣列式的波導801可用以接收任何數目(N)之光輸入。又,在圖8的實例中,寬頻功率分割器805為1對16之16寬頻功率分割器。然而應瞭解,在各種實施例中,寬頻功率分割器805可用以輸出任何數目(M)之光輸出。陣列式的波導801係用以將光輸入接口108-1至108-16處接收到的複數雷射光束結合成為一多波長雷射光束,多波長雷射光束係自陣列式的波導801經由光導803傳輸至寬頻功率分割器805。寬頻功率分割器805係用以將多波長雷射光束之總功率的複數部分分配至光編排模組107/107A/107B/107C之複數光輸出接口109-1至109-16中的每一者。 FIG8 illustrates an exemplary embodiment of an optical orchestration module 107/107A/107B/107C according to certain embodiments of the present invention, comprising an array of waveguides 801 and a broadband power divider 805. In the example of FIG8 , the array of waveguides 801 is a 16-to-1 array of waveguides. However, it should be understood that, in various embodiments, the array of waveguides 801 can be configured to receive any number (N) of optical inputs. Furthermore, in the example of FIG8 , the broadband power divider 805 is a 16-to-16 broadband power divider. However, it should be understood that, in various embodiments, the broadband power divider 805 can be configured to output any number (M) of optical outputs. Waveguide array 801 is used to combine multiple laser beams received at optical input interfaces 108-1 to 108-16 into a multi-wavelength laser beam. The multi-wavelength laser beam is then transmitted from waveguide array 801 via optical guide 803 to broadband power divider 805. Broadband power divider 805 distributes multiple portions of the total power of the multi-wavelength laser beam to each of the multiple optical output interfaces 109-1 to 109-16 of optical orchestration modules 107/107A/107B/107C.
圖9顯示根據本發明之某些實施例之光編排模組107/107A/107B/107C的一例示性實施例,其包含階梯光柵901及寬頻功率分割器905。在圖8之實例中,階梯光柵901為16對1的光柵。然而應瞭解,在各種實施例中,階梯光柵901可用以接收任何數目(N)之光輸入。又,在圖9之實例中,寬頻功率分割器905為1對16之寬頻功率分割器。然而應瞭解,在各種實施例中,寬頻功率分割器905可用以輸出任何數目(M)之光輸出。階梯光柵901係用以將光輸入接口108-1至108-16處接收到的複數雷射光束結合成為一多波長雷射光束,多波長雷射光束係自階梯光柵901經由光導903傳輸至寬頻功率分割器905。寬頻功率分割器905係用以將多波長雷射光束之總功率的複數部分分配至光編排模組107/107A/107B/107C之複數光輸出接口109-1至109-16中的每一者。 FIG9 shows an exemplary embodiment of an optical orchestration module 107/107A/107B/107C according to certain embodiments of the present invention, which includes a step grating 901 and a broadband power divider 905. In the example of FIG8 , the step grating 901 is a 16-to-1 grating. However, it should be understood that in various embodiments, the step grating 901 can be used to receive any number (N) of optical inputs. Furthermore, in the example of FIG9 , the broadband power divider 905 is a 1-to-16 broadband power divider. However, it should be understood that in various embodiments, the broadband power divider 905 can be used to output any number (M) of optical outputs. Step grating 901 is used to combine multiple laser beams received at optical input interfaces 108-1 to 108-16 into a multi-wavelength laser beam. The multi-wavelength laser beam is transmitted from step grating 901 via light guide 903 to broadband power divider 905. Broadband power divider 905 is used to distribute multiple portions of the total power of the multi-wavelength laser beam to each of the multiple optical output interfaces 109-1 to 109-16 of optical orchestration modules 107/107A/107B/107C.
圖10顯示根據本發明之某些實施例之光編排模組107/107A/107B/107C的一例示性實施例,其包含蝶形波導網路1001。在圖10之實例中,蝶形波導網路1001為16輸入對16輸出之網路。然而應瞭解,在各種實施例中,蝶形波導網路1001可用以接收任何數目(N)之光輸入且提供任何數目(M)之光輸出。蝶形波導網路1001係用以自光輸入接口108-1至108-N接收(N)雷射光束並將(N)雷射光束中之每一者的複數部分分配至光編排模組107/107A/107B/107C之(M)光輸出接口的每一者。 FIG10 illustrates an exemplary embodiment of an optical orchestration module 107/107A/107B/107C according to certain embodiments of the present invention, which includes a butterfly waveguide network 1001. In the example of FIG10 , butterfly waveguide network 1001 is a 16-input, 16-output network. However, it should be understood that in various embodiments, butterfly waveguide network 1001 can be configured to receive any number (N) of optical inputs and provide any number (M) of optical outputs. Butterfly waveguide network 1001 is configured to receive (N) laser beams from optical input interfaces 108-1 through 108-N and distribute multiple portions of each of the (N) laser beams to each of the (M) optical output interfaces of optical orchestration module 107/107A/107B/107C.
圖11顯示根據本發明之某些實施例之光編排模組107/107A/107B/107C的一例示性實施例,其包含星形耦合器1101。在圖11的實例中,星形耦合器1101為16輸入對16輸出之星形耦合器。然而應瞭解,在各種實施例中,星形耦合器1101可用以接收任何數目(N)之光輸入且提供任何數目(M)之光輸出。星形耦合器1101係用以自光輸入接口108-1至108-N接收(N)雷 射光束並將(N)雷射光束中之每一者的複數部分分配至光編排模組107/107A/107B/107C之(M)光輸出接口的每一者。 FIG11 illustrates an exemplary embodiment of an optical orchestration module 107/107A/107B/107C according to certain embodiments of the present invention, which includes a star coupler 1101. In the example of FIG11 , star coupler 1101 is a 16-input to 16-output star coupler. However, it should be understood that in various embodiments, star coupler 1101 can be configured to receive any number (N) of optical inputs and provide any number (M) of optical outputs. Star coupler 1101 is configured to receive (N) laser beams from optical input interfaces 108-1 through 108-N and distribute multiple portions of each of the (N) laser beams to each of the (M) optical output interfaces of optical orchestration module 107/107A/107B/107C.
圖12A顯示根據本發明之某些實施例之光編排模組107/107A/107B/107C的一例示性實施例,其包含諧振環陣列1201。在圖12A之實例中,諧振環陣列1201為16輸入對16輸出之諧振環陣列。然而應瞭解,在各種實施例中,諧振環陣列1201可用以接收任何數目(N)之光輸入且提供任何數目(M)之光輸出。諧振環陣列1201係用以自光輸入接口108-1至108-N接收(N)雷射光束並將(N)雷射光束中之每一者的複數部分分配至光編排模組107/107A/107B/107C之(M)光輸出接口的每一者。 FIG12A illustrates an exemplary embodiment of an optical orchestration module 107/107A/107B/107C according to certain embodiments of the present invention, which includes a resonant ring array 1201. In the example of FIG12A , the resonant ring array 1201 is a 16-input to 16-output resonant ring array. However, it should be understood that in various embodiments, the resonant ring array 1201 can be configured to receive any number (N) of optical inputs and provide any number (M) of optical outputs. The resonant ring array 1201 is used to receive (N) laser beams from the optical input interfaces 108-1 to 108-N and distribute multiple portions of each of the (N) laser beams to each of the (M) optical output interfaces of the optical orchestration modules 107/107A/107B/107C.
圖12B顯示根據本發明之諧振環陣列1201的詳細圖示。諧振環陣列1201包含複數諧振環列R1至RN,其數目等於分別在(N)光輸入接口108-1至108-N處所接收之複數雷射光束的數目(N)。每一諧振環列R1至RN包含複數諧振環1203,其數目等於光編排模組107/107A/107B/107C之複數光輸出接口109-1至109-M的數目(M)。每一諧振環列R1至RN係用以接收複數雷射光束中的一不同光束作為對應的輸入雷射光束。因此,每一諧振環列R1至RN接收雷射源102/102A所接收之(N)雷射光束之波長(λ1-λN)中的一不同波長。又,為何此原因,諧振環列R1至RN中之一特定諧振環列的每一諧振環1203可針對特定諧振環列欲接收之特定雷射光束波長的操作而加以最佳化。又,因此不同諧振環列R1至RN之諧振環1203可針對不同雷射光束波長之操作而加以最佳化。一特定諧振環列R1至RN中的每一諧振環1203係用以將該特定諧振環列之對應輸入雷射光束的一部分重新引導至光編排模組107/107A/107B/107C之複數光輸出接口109-1至109-M中的一不同者(如箭頭1205所示)。在某些實施例中,一特定諧振環列R1至RN的諧振環1203係用以連續方式接收該特定諧振環列的對應輸入雷射光束,其中相對於雷射源102/102A之該特定諧振環列之連續設置的諧振 環1203係用以逐步重新引導該特定諧振環列之對應輸入雷射光束的較大部分。以此方式,一特定諧振環列R1至RN的諧振環1203將實質相同量的雷射光提供至光編排模組107/107A/107B/107C之光輸出接口109-1至109-M中的每一者。 FIG12B shows a detailed diagram of a resonant ring array 1201 according to the present invention. Resonant ring array 1201 includes a plurality of resonant ring arrays R1 through RN , whose number is equal to the number (N) of the plurality of laser beams received at the (N) optical input interfaces 108-1 through 108-N, respectively. Each resonant ring array R1 through RN includes a plurality of resonant rings 1203, whose number is equal to the number (M) of the plurality of optical output interfaces 109-1 through 109-M of the optical orchestration module 107/107A/107B/107C. Each resonant ring array R1 through RN is configured to receive a different one of the plurality of laser beams as a corresponding input laser beam. Therefore, each resonant ring array R1 through RN receives a different wavelength among the (N) wavelengths (λ1-λN) of the laser beam received by the laser source 102/102A. Furthermore, for this reason, each resonant ring 1203 in a particular resonant ring array R1 through RN can be optimized for operation with the specific laser beam wavelength that the particular resonant ring array is intended to receive. Furthermore, the resonant rings 1203 in different resonant ring arrays R1 through RN can be optimized for operation with different laser beam wavelengths. Each resonant ring 1203 in a particular resonant ring array R1 to RN is used to redirect a portion of the corresponding input laser beam of the particular resonant ring array to a different one of the plurality of optical output interfaces 109-1 to 109-M of the optical orchestration module 107/107A/107B/107C (as indicated by arrow 1205). In some embodiments, the resonant rings 1203 of a particular resonant ring array R1 to RN are configured to sequentially receive the input laser beam corresponding to the particular resonant ring array. The resonant rings 1203 disposed sequentially relative to the particular resonant ring array of the laser source 102/102A are configured to progressively redirect a larger portion of the input laser beam corresponding to the particular resonant ring array. In this manner, the resonant rings 1203 of a particular resonant ring array R1 to RN provide substantially the same amount of laser light to each of the optical output interfaces 109-1 to 109-M of the optical orchestration modules 107/107A/107B/107C.
圖13顯示根據本發明之某些實施例之PLC 601上之雷射模組100F的一例示性實施例,其中施用編排模組107C以包含陣列式的波導801及寬頻功率分割器805。圖14顯示根據本發明之某些實施例之PLC 601上之雷射模組100F的一例示性實施例,其中施用編排模組107C以包含階梯光柵901與寬頻功率分割器905。圖15顯示根據本發明之某些實施例之PLC 601上之雷射模組100F的一例示性實施例,其中施用編排模組107C以包含蝶形波導網路1001。圖16顯示根據本發明之某些實施例之PLC 601上雷射模組100F的一例示性實施例,其中施用編排模組107C以包含星形耦合器1101。 FIG13 illustrates an exemplary embodiment of a laser module 100F on a PLC 601 according to certain embodiments of the present invention, wherein an arrangement module 107C is employed to include an array of waveguides 801 and a broadband power divider 805. FIG14 illustrates an exemplary embodiment of a laser module 100F on a PLC 601 according to certain embodiments of the present invention, wherein an arrangement module 107C is employed to include a step grating 901 and a broadband power divider 905. FIG15 illustrates an exemplary embodiment of a laser module 100F on a PLC 601 according to certain embodiments of the present invention, wherein an arrangement module 107C is employed to include a butterfly waveguide network 1001. FIG16 shows an exemplary embodiment of a laser module 100F on a PLC 601 according to certain embodiments of the present invention, wherein an arrangement module 107C is implemented to include a star coupler 1101.
圖17顯示根據本發明之某些實施例之雷射模組100A-100F之操作方法的流程圖。方法包含操作1701,操作雷射源以產生及輸出複數雷射光束,其中複數雷射光束相對於彼此具有不同波長。複數雷射光束的不同波長對光數據通訊系統而言是可加以辨識的。方法亦包含操作1703,將複數雷射光束之每一光束的一部分分配至雷射模組100A-100F之複數光輸出接口的每一者。操作1703之實施俾使複數雷射光束之所有不同波長係提供至雷射模組100A-100F之複數光輸出接口的每一者。在某些實施例中,方法選擇性地包含操作1705,放大被分配至雷射模組100A-100F之複數光輸出接口的雷射光。在某些實施例中,操作1701係由雷射源102/102A實施,操作1703係由光編排模組107/107A/107B/107C實施,操作1705係由光放大模組303/303A實施。在某些實施例中,雷射源102/102A、光編排模組107/107A/107B/107C及光放大模組303/303A中的任兩或更多者以實體分離元件的方式操作。又,在某些實施例中, 雷射源102/102A、光編排模組107/107A/107B/107C及光放大模組303/303A中的任兩或更多者係設置於共同基板110上及/或相同的PLC中。 FIG17 is a flow chart illustrating a method for operating a laser module 100A-100F according to certain embodiments of the present invention. The method includes operation 1701, operating a laser source to generate and output a plurality of laser beams, wherein the plurality of laser beams have different wavelengths relative to each other. The different wavelengths of the plurality of laser beams are recognizable to the optical data communication system. The method also includes operation 1703, distributing a portion of each of the plurality of laser beams to each of the plurality of optical output interfaces of the laser module 100A-100F. Operation 1703 is performed so that all different wavelengths of the plurality of laser beams are provided to each of the plurality of optical output interfaces of the laser module 100A-100F. In certain embodiments, the method optionally includes operation 1705, amplifying the laser light distributed to the plurality of optical output interfaces of the laser module 100A-100F. In some embodiments, operation 1701 is performed by laser source 102/102A, operation 1703 is performed by optical orchestration module 107/107A/107B/107C, and operation 1705 is performed by optical amplifier module 303/303A. In some embodiments, any two or more of laser source 102/102A, optical orchestration module 107/107A/107B/107C, and optical amplifier module 303/303A operate as physically separate components. Furthermore, in some embodiments, any two or more of laser source 102/102A, optical orchestration module 107/107A/107B/107C, and optical amplifier module 303/303A are disposed on a common substrate 110 and/or within the same PLC.
在某些實施例中,方法包含將來自雷射源102/102A的複數雷射光束引導至光編排模組107/107A/107B/107C中。在某些實施例中,複數雷射光束係自雷射源102/102A受到引導通過一空的空間並自空的空間受到引導而至光編排模組107/107A/107B/107C中。在某些實施例中,方法包含經由光導105傳輸複數雷射光束以將複數雷射光束自雷射源102/102A引導至光編排模組107/107A/107B/107C中。在某些實施例中,方法包含經由一或多個光學垂直耦合裝置傳輸複數雷射光束以將複數雷射光束自雷射源102/102A引導至光編排模組107/107A/107B/107C中。在某些實施例中,方法包含當複數雷射光束之複數部分被分配至雷射模組100A-100F之複數光輸出接口中之每一者時維持複數雷射光束的極化。 In some embodiments, the method includes directing a plurality of laser beams from laser source 102/102A into light orchestration module 107/107A/107B/107C. In some embodiments, the plurality of laser beams are directed from laser source 102/102A through an empty space and from the empty space into light orchestration module 107/107A/107B/107C. In some embodiments, the method includes transmitting the plurality of laser beams through light guide 105 to direct the plurality of laser beams from laser source 102/102A into light orchestration module 107/107A/107B/107C. In some embodiments, the method includes transmitting the plurality of laser beams through one or more optical vertical coupling devices to direct the plurality of laser beams from the laser source 102/102A to the optical orchestration module 107/107A/107B/107C. In some embodiments, the method includes maintaining polarization of the plurality of laser beams as the plurality of portions of the plurality of laser beams are distributed to each of the plurality of optical output interfaces of the laser modules 100A-100F.
在某些實施例中,複數雷射光束的每一者係利用一各別的分佈回饋雷射所產生。在某些實施例中,方法包含控制不同分佈回饋雷射的溫度俾以在不同分佈回饋雷射之間提供溫度相依之波長漂移的實質均勻度。又,在某些實施例中,方法包含控制複數雷射光束之每一光束之部分分配至雷射模組100A-100F之複數光輸出接口之每一者的分配,俾使複數光輸出接口之每一者接收在特定倍數內之複數雷射光束之任何特定光束之光學功率的類似量。在某些實施例中,特定倍數為五倍。在某些實施例中,特定倍數為一倍、兩倍、三倍、四倍、六倍或任何此些倍數之間的任何倍數。 In some embodiments, each of the plurality of laser beams is generated using a respective distributed feedback laser. In some embodiments, the method includes controlling the temperature of the different distributed feedback lasers to provide substantial uniformity of temperature-dependent wavelength shifts across the different distributed feedback lasers. Furthermore, in some embodiments, the method includes controlling the allocation of a portion of each of the plurality of laser beams to each of the plurality of optical output interfaces of the laser modules 100A-100F so that each of the plurality of optical output interfaces receives a similar amount of optical power within a specific multiple of the plurality of laser beams. In some embodiments, the specific multiple is five times. In some embodiments, the specific multiple is one, two, three, four, six, or any multiple in between.
更應瞭解,本發明亦包含文中所揭露之雷射模組100A-100F中之每一者的製造方法。又,雷射模組100A-100F的此些製造方法可實質上包含用以製造半導體裝置及用以製造與一或多個半導體裝置交界之元件/基板的任何已知已建立的處理及/或技術。 It should be further understood that the present invention also encompasses methods for fabricating each of the laser modules 100A-100F disclosed herein. Furthermore, these methods for fabricating the laser modules 100A-100F may include substantially any known and established processes and/or techniques for fabricating semiconductor devices and for fabricating components/substrates interfacing with one or more semiconductor devices.
在某些實施例中,雷射模組100A-100F被設計用以供給具有一或多個波長的雷射光。可將雷射模組100A-100F安排為數個主要元件,其包含:一雷射源102/102A,包含複數雷射如雷射二極體,每一雷射產生雷射源102/102A所輸出之複數波長的一子組合;一光編排模組107/107A/107B/107C,其提供組合器、耦合器及/或分割器網路(CCSN),其輸入為來自雷射源102/102A之輸出波長;一光放大器模組303/303A,包含複數光放大器,光放大器操作以增加雷射模組100A-100F所輸出之光學功率的量但可能是以噪訊比為代價;一光纖耦合陣列,係連接以將光帶出雷射模組100A-100F;光導105、301(可包含耦合器、反射表面及/或透鏡)以引導、準直及/或耦合光來/往光編排模組107/107A/107B/107C、來自雷射源102/102A、來/往光纖耦合陣列、及來/往光放大器模組303/303A;一熱分散元件如導熱基板,將雷射源102/102A內的所有雷射熱鏈結在一起(如銅將所有雷射二極體附接在一起)以最少化雷射二極體之間的溫度差異,其中在某些實施例中,熱分散元件可為上面建構有及/或附接有雷射源102/102A、光編排模組107/107A/107B/107C及光放大器模組303/303A的相同基板110。 In some embodiments, laser modules 100A-100F are designed to provide laser light having one or more wavelengths. The laser modules 100A-100F can be arranged into several main components, including: a laser source 102/102A, comprising a plurality of lasers such as laser diodes, each laser generating a subset of the plurality of wavelengths output by the laser source 102/102A; an optical arrangement module 107/107A/107B/107C, which provides a combiner, coupler, and/or splitter network (CCSN) whose input is the output wavelength from the laser source 102/102A; an optical amplifier module 303/303A, comprising a plurality of optical amplifiers, which operate to increase the amount of optical power output by the laser modules 100A-100F, but possibly at the expense of signal-to-noise ratio; an optical fiber coupling array connected to carry light out of the laser modules 100A-100F; and a light guide 100. 5. 301 (which may include couplers, reflective surfaces and/or lenses) to guide, collimate and/or couple light to/from the optical arrangement module 107/107A/107B/107C, from the laser source 102/102A, to/from the fiber coupling array, and to/from the optical amplifier module 303/303A; a heat dissipation element such as a thermally conductive substrate to dissipate heat within the laser source 102/102A. All laser diodes are thermally linked together (e.g., copper is used to bond all laser diodes together) to minimize temperature differences between the laser diodes. In some embodiments, the thermal dissipation element can be the same substrate 110 on which the laser sources 102/102A, optical orchestration modules 107/107A/107B/107C, and optical amplifier modules 303/303A are constructed and/or attached.
在各種實施例中,光編排模組107/107A/107B/107C可以數種方式建構,包含利用分散元件或建構為一整合裝置如平面光波電路(PLC)。光編排模組107/107A/107B/107C的各種實施例可包含下列特徵:一PLC結構,其提供針對傳播通過光編排模組107/107A/107B/107C之光維持其極化的優點。 In various embodiments, optical orchestration modules 107/107A/107B/107C can be implemented in a number of ways, including using discrete components or as an integrated device such as a planar lightwave circuit (PLC). Various embodiments of optical orchestration modules 107/107A/107B/107C may include the following features: a PLC structure that provides the advantage of maintaining polarization of light propagating through optical orchestration modules 107/107A/107B/107C.
一PLC結構,其中雷射源102/102A及/或光放大器模組303/303A可利用光編排模組107/107A/107B/107C的相同基板構建-其中光編排模組 107/107A/107B/107C的基板支撐雷射源102/102A的建構(如特定的III-V或IV族基板)。 A PLC structure in which laser sources 102/102A and/or optical amplifier modules 303/303A can be constructed using the same substrate as optical orchestration modules 107/107A/107B/107C—where the substrate of optical orchestration modules 107/107A/107B/107C supports the construction of laser sources 102/102A (e.g., a specific III-V or IV substrate).
一PLC結構,其中雷射源102/102A及/或光放大器模組303/303A可藉由例如覆晶接合而附接至光編排模組107/107A/107B/107C。 A PLC structure in which the laser source 102/102A and/or the optical amplifier module 303/303A can be attached to the optical orchestration module 107/107A/107B/107C by, for example, flip-chip bonding.
一PLC結構,其中雷射源102/102A可將光耦合至PLC中的結構及耦合來自PLC中之結構的光-其中光編排模組107/107A/107B/107C可包含雷射源102/102A之雷射腔及/或一或多個光導,輸出雷射光係自雷射腔及/或光導耦合至耦合裝置中/耦合通過耦合裝置。 A PLC structure, wherein a laser source 102/102A can couple light into and out of structures within the PLC - wherein the light orchestration module 107/107A/107B/107C can include a laser cavity and/or one or more light guides of the laser source 102/102A, and output laser light is coupled from the laser cavity and/or light guides into/through a coupling device.
一PLC結構,其中光放大模組303/303A可將光耦合至PLC中的結構且可耦合來自PLC中的結構-其中光編排模組107/107A/107B/107C可提供一或多個光導,光放大器的輸入與輸出光係經由例如適合的耦合裝置自光導而耦合至放大器及自放大器耦合,耦合裝置尤其包含光柵耦合器、邊緣耦合器及漸耦合式波導。 A PLC structure, wherein the optical amplifier module 303/303A can couple light to and from structures within the PLC. The optical orchestration module 107/107A/107B/107C can provide one or more light guides. The input and output light of the optical amplifier is coupled to and from the amplifier via suitable coupling devices, such as grating couplers, edge couplers, and gradient-coupled waveguides.
在某些實施例中,玻璃基板可能不具有充分的熱導性以對雷射源102/102A提供熱耦合。在此類實施例中,在低折射率包層材料(埋入氧化物或深溝槽層)亦為導熱性或並未太厚的條件下,玻璃基板(如使用矽光子元件)可用以提供熱導性。或者,III-V基板如GaAs或InP亦具有高導熱性且可類似地作為雷射源102/102A之熱耦合適當材料。 In some embodiments, a glass substrate may not have sufficient thermal conductivity to provide thermal coupling to the laser source 102/102A. In such embodiments, a glass substrate (e.g., as used in silicon photonics devices) can be used to provide thermal conductivity, provided that the low-refractive-index cladding material (buried oxide or deep trench layer) is also thermally conductive or not too thick. Alternatively, III-V substrates such as GaAs or InP also have high thermal conductivity and can similarly serve as suitable materials for thermal coupling to the laser source 102/102A.
在各種實施例中,光編排模組107/107A/107B/107C有多種可能的配置,其尤其包含者:光編排模組107/107A/107B/107C可被建構為扇入、扇出的N對N對稱星形耦合器,其不但組合N波長亦將功率分割為N份。 In various embodiments, optical orchestration modules 107/107A/107B/107C can have multiple possible configurations, including, among other things, that optical orchestration modules 107/107A/107B/107C can be configured as fan-in, fan-out N-to-N symmetrical star couplers, which not only combine N wavelengths but also split the power into N parts.
光編排模組107/107A/107B/107C可被建構為扇入、扇出的N對M不對稱星形耦合器,其不但組合N波長亦將功率分割為M份。 Optical orchestration modules 107/107A/107B/107C can be constructed as fan-in/fan-out N-to-M asymmetric star couplers, combining N wavelengths and splitting the power into M parts.
光編排模組107/107A/107B/107C可利用N/2*log2N的2x2分割器/耦合器被建構為N對N星形耦合器。此類結構以最直觀的實施方式加總在(2n-1)的波導交叉中之自n=1至log2N-1者。 The optical arrangement modules 107/107A/107B/107C can be constructed as N-to-N star couplers using 2x2 splitters/couplers of N/2*log 2 N. In the most straightforward implementation, such a structure sums the number of waveguide crossings from n=1 to log 2 N-1 in (2n-1).
光編排模組107/107A/107B/107C可被建構為1對N分割器以反向方式使用。此結構輸出總輸出雷射功率的1/2N並放棄剩餘者。 Optical orchestration modules 107/107A/107B/107C can be configured as a 1-to-N splitter for reverse operation. This structure outputs 1/2N of the total laser output power and discards the remainder.
光編排模組107/107A/107B/107C可被建構為陣列式的波導(AWG)加上分割器。 The optical orchestration module 107/107A/107B/107C can be constructed as an array of waveguides (AWG) plus a splitter.
在某些實施例中,光放大器模組303/303A係用以增加雷射模組100C-100F之輸出功率。在某些實施例中,光放大器模組303/303A可包含下列特徵:光放大器可具有多種形式例如尤其是半導體光放大器、摻雜鉺/鐿之光纖放大器、拉曼放大器。 In some embodiments, optical amplifier module 303/303A is used to increase the output power of laser modules 100C-100F. In some embodiments, optical amplifier module 303/303A may include the following features: The optical amplifier may have various forms, such as, in particular, a semiconductor optical amplifier, a geron/ferromagnetic doped fiber amplifier, or a Raman amplifier.
光放大器可用以放大單一波長或複數波長之輸入光。 Optical amplifiers can be used to amplify input light of a single wavelength or multiple wavelengths.
當放大複數波長時,每一光放大器可具有充分的光頻寬以放大所有的輸入波長。 When amplifying multiple wavelengths, each optical amplifier can have sufficient optical bandwidth to amplify all input wavelengths.
若波長之頻寬足以超過獨立光放大器的頻寬,則使用複數光放大器以放大所有波長,且每一光放大器僅放大落在其放大頻寬內的波長子組合。在此情況中,可將光放大器添加至光編排模組107/107A/107B/107C內的中間點且將每一光放大器之輸入定義為具有該光放大器所放大之波長的子組合。 If the wavelength bandwidth is sufficient to exceed the bandwidth of a single optical amplifier, multiple optical amplifiers can be used to amplify all wavelengths, with each amplifier amplifying only a subset of wavelengths within its amplification bandwidth. In this case, optical amplifiers can be added at intermediate points within optical orchestration modules 107/107A/107B/107C, and the input of each amplifier can be defined to contain the subset of wavelengths amplified by that amplifier.
在某些實施例中,插入件裝置可用以提供基板110及一或多個光學元件(尤其例如是波導105與301及編排模組107、107A、107B、107C)的組合功能。在某些實施例中,插入件裝置係於整合性矽光子元件內及/或III-V光子致能之多晶片模組(MCM)內、系統級封裝(SiP)內、異質整合產品內。圖18A顯示根據本發明之某些實施例之例示性插入件裝置1801,其中基板110及波導105 與301的功能係加以結合。在圖18A的實例中,插入件裝置1801具有基板110的功用且包含波導105與301。雷射源102係與插入件裝置1801交界。又,光放大模組303係與插入件裝置1801交界。 In some embodiments, an interposer device can be used to provide the combined functionality of substrate 110 and one or more optical components (particularly, waveguides 105 and 301 and orchestration modules 107, 107A, 107B, and 107C). In some embodiments, the interposer device is implemented within an integrated silicon photonics device and/or a III-V photonics-enabled multi-chip module (MCM), a system-in-package (SiP), or a heterogeneous integrated product. FIG18A illustrates an exemplary interposer device 1801 according to some embodiments of the present invention, in which the functionality of substrate 110 and waveguides 105 and 301 is combined. In the example of FIG18A, interposer device 1801 performs the functions of substrate 110 and includes waveguides 105 and 301. Laser source 102 interfaces with interposer device 1801. Furthermore, the optical amplifier module 303 interfaces with the insert device 1801.
矽光子晶粒/晶片1803亦與插入件裝置1801交界。在某些實施例中,能施行與矽光子晶粒/晶片1803相同功能的另一裝置可取代矽光子晶粒/晶片1803。在某些實施例中,矽光子晶粒/晶片1803係用以在多於一側上具有光學界面。又,矽光子晶粒/晶片1803可用以在複數側的任何組合上具有光學界面。然而在某些實施例中,矽光子晶粒/晶片1803係用以僅在一側上具有光學界面。在某些實施例中,矽光子晶粒/晶片1803為CMOS驅動晶粒而所需的矽光子裝置係形成於插入件裝置1801內。在此些實施例中,矽光子晶粒/晶片1803係用來作為CMOS驅動器晶片,驅動/交界形成在插入件裝置1801內的矽光子裝置。 Silicon photonics die/chip 1803 also interfaces with interposer device 1801. In some embodiments, another device capable of performing the same function as silicon photonics die/chip 1803 may replace silicon photonics die/chip 1803. In some embodiments, silicon photonics die/chip 1803 is configured to have optical interfaces on more than one side. Furthermore, silicon photonics die/chip 1803 may be configured to have optical interfaces on any combination of multiple sides. However, in some embodiments, silicon photonics die/chip 1803 is configured to have an optical interface on only one side. In some embodiments, silicon photonics die/chip 1803 is a CMOS driver die, and the required silicon photonic devices are formed within interposer device 1801. In these embodiments, the silicon photonics die/chip 1803 is used as a CMOS driver chip to drive/interface the silicon photonics device formed within the interposer device 1801.
在某些實施例中,插入件裝置1801組合局部金屬繞線和貫穿矽通孔(TSV)與光子元件。又應瞭解,插入件裝置1801包含能在插入件裝置1801內致使產生各種光學裝置的光導,光學裝置尤其例如是光耦合器(複數光耦合器)、光分割器(複數光分割器)、光導(複數光導)、光學陣列式的波導(複數光學陣列式的波導)(AWG)、光學星形耦合器(複數光學星形耦合器)。例如,參考圖3A,在某些實施例中,波導105與301及基板110可一起整合在相同的插入件裝置內且可利用相同的組件、材料、製造處理等形成。又應瞭解,基本上可將一或多個光學裝置或其部件(複數部件)中的任何一或多者與基板110整合以形成插入件裝置。例如參考圖3A,在某些實施例中,光導105可與基板110整合在插入件裝置內,其中光導301被配置為與插入件裝置交界的分離結構。 In some embodiments, interposer device 1801 combines local metal routing and through-silicon vias (TSVs) with photonic components. It should also be understood that interposer device 1801 includes light guides that can enable the creation of various optical devices within interposer device 1801, such as optical couplers, optical splitters, light guides, optical array waveguides (AWGs), and optical star couplers. For example, referring to FIG. 3A , in some embodiments, waveguides 105 and 301 and substrate 110 can be integrated together within the same interposer device and formed using the same components, materials, and manufacturing processes. It should also be understood that essentially any one or more optical devices or their components (or components) may be integrated with substrate 110 to form an interposer device. For example, referring to FIG. 3A , in some embodiments, light guide 105 may be integrated with substrate 110 within an interposer device, where light guide 301 is configured as a separate structure that interfaces with the interposer device.
在某些實施例中,插入件裝置1801除了基板110及波導105與301中的一或多者外亦可包含矽光子晶粒/晶片1803。例如,在某些實施例中,插入件裝置可配置為包含一或多個光導或其他類型之光學裝置的大矽光子晶粒/ 晶片1803。在某些實施例中,波導105與301、基板110及矽光子晶粒/晶片1803可形成在相同的插入件裝置內且可利用相同的組件、材料、製造處理等形成。在各種實施例中,可自矽、玻璃及/或其他適合的光電裝置材料製造插入件裝置。在某些實施例中,可利用矽、氧化物(複數氧化物)、聚合物(複數聚合物)、氮化矽(複數氮化矽)及/或適合形成光導之任何其他材料將光導結構形成於插入件裝置內。 In some embodiments, interposer device 1801 may include a silicon photonics die/chip 1803 in addition to substrate 110 and one or more of waveguides 105 and 301. For example, in some embodiments, interposer device 1801 may be configured as a large silicon photonics die/chip 1803 containing one or more lightguides or other types of optical devices. In some embodiments, waveguides 105 and 301, substrate 110, and silicon photonics die/chip 1803 may be formed within the same interposer device and may utilize the same components, materials, and manufacturing processes. In various embodiments, the interposer device may be fabricated from silicon, glass, and/or other suitable optoelectronic device materials. In some embodiments, the light guide structure may be formed within the interposer device using silicon, oxide(s), polymer(s), silicon nitride(s), and/or any other material suitable for forming a light guide.
圖18B顯示根據本發明之某些實施例之插入件裝置1801的上結構圖以例示將晶粒/晶片1805A-1805D相對於插入件裝置1801設置的彈性。晶粒/晶片1805A-1805D可為任何電子及/或光電裝置。應瞭解,顯示四顆晶粒/晶片1805A-1805D作為說明用的實例。在各種實施例中,可將一或多顆晶粒/晶片(複數晶片)(如1805A-1805D)以實質上任何必要的配置方式設置於插入件裝置1801內的實質上任何位置處。又應瞭解,若有需要可將多晶粒/晶片(如1805A-1805D)設置在插入件裝置上。在某些實施例中,多晶粒/晶片(如1805A-1805D)係以實質上對稱方式的配置設置在插入件裝置上之插入件裝置的總面積內。然而應瞭解,在某些實施例中,多晶粒/晶片(如1805A-1805D)係以非對稱的配置方式設置在插入件裝置上之插入件裝置的總面積內。 FIG18B shows a top view of an interposer device 1801 according to certain embodiments of the present invention to illustrate the flexibility of positioning dies/chips 1805A-1805D relative to the interposer device 1801. Dies/chips 1805A-1805D can be any electronic and/or optoelectronic devices. It should be understood that four dies/chips 1805A-1805D are shown as an illustrative example. In various embodiments, one or more dies/chips (e.g., 1805A-1805D) can be positioned substantially anywhere within the interposer device 1801 in substantially any desired configuration. It should also be understood that multiple dies/chips (e.g., 1805A-1805D) can be positioned on the interposer device if desired. In some embodiments, multiple dies/chips (e.g., 1805A-1805D) are disposed on an interposer device in a substantially symmetrical configuration within the total area of the interposer device. However, it should be understood that in some embodiments, multiple dies/chips (e.g., 1805A-1805D) are disposed on an interposer device in an asymmetrical configuration within the total area of the interposer device.
插入件裝置如1801可包含所需之局部繞線之金屬結構及/或貫穿玻璃通孔(TGV)以提供晶粒/晶片(複數晶粒/晶片)及/或其他與插入件裝置交界之其他電子裝置之間的電連接。在某些實施例中,可藉著利用覆晶連接技術及/或接合連接技術及/或實質上任何其他類型之晶粒/晶片連接技術將晶粒/晶片(複數晶粒/晶片)附接至插入件裝置以使晶粒/晶片(複數晶粒/晶片)電連接至插入件裝置內的導電結構。又,在各種實施例中,與晶粒/晶片(複數晶粒/晶片)內之光導結構交界的插入件裝置可邊緣耦合(尾耦合)及/或垂直耦合至插入件裝置內的光學結構。 Interposer devices such as 1801 may include locally routed metal structures and/or through-glass vias (TGVs) as needed to provide electrical connections between the die/chip(s) and/or other electronic devices interfacing with the interposer device. In some embodiments, the die/chip(s) may be attached to the interposer device using flip-chip bonding and/or bond bonding and/or virtually any other type of die/chip connection technology to electrically connect the die/chip(s) to conductive structures within the interposer device. Furthermore, in various embodiments, the interposer device interfacing with light-guiding structures within the die/chip(s) may be edge-coupled (tail-coupled) and/or vertically coupled to optical structures within the interposer device.
圖19顯示根據本發明之某些實施例之插入件裝置1801A的平面方塊示圖,插入件裝置1801A係作為MCM整合產品的一部分。插入件裝置1801A包含電子特徵/結構以及光學特徵/結構。在各種實施例中,插入件裝置1801A尤其可由矽、玻璃、陶瓷、環氧化物複合材料(複數環氧化物複合材料)、聚合物(複數聚合物)及其組合所形成。插入件裝置1801A具有光學座與電插入件的功能且包含/支撐整合光子元件如星形耦合器1101。應瞭解,星形耦合器1101係以例示方式顯示於圖19中。在各種實施例中,圖19的星形耦合器1101可實質上被任何其他適合類型的光子裝置如光分割器之蝴蝶網路、階梯光柵中的一或多者及/或任何其他適合的光子電路如文中針對編排模組107、107A、107B、107C所述的光子電路所取代。 FIG19 shows a planar block diagram of an insert device 1801A according to certain embodiments of the present invention, as part of an integrated MCM product. Insert device 1801A includes electronic features/structures and optical features/structures. In various embodiments, insert device 1801A may be formed from, among other materials, silicon, glass, ceramic, epoxy composite(s), polymer(s), and combinations thereof. Insert device 1801A functions as both an optical mount and an electrical insert and includes/supports an integrated photonic component, such as a star coupler 1101. It should be understood that star coupler 1101 is shown in FIG19 by way of example. In various embodiments, the star coupler 1101 of FIG. 19 can be replaced by any other suitable type of photonic device, such as one or more of a butterfly network of optical splitters, a step grating, and/or any other suitable photonic circuit, such as the photonic circuits described herein with respect to the orchestration modules 107, 107A, 107B, and 107C.
又,插入件裝置1801A致使電子、光學及光電晶粒/晶片(複數晶粒/晶片)的覆晶連接及/或打線接合連接。在圖19的實例中,複數(N)光放大器模組303-1至303-N係與插入件裝置1801A交界,其中N可為一或多。在某些實施例中,光放大器模組303-1至303-N為藉由覆晶連接、打線接合連接、或其他類型之連接而連接至插入件裝置1801A的離散晶粒/晶片。每一光放大器模組303-1至303-N包含複數(M)光放大器305-1至305-M。在各種實施例中,每一光放大器模組303-1至303-N針對連接至光放大器模組的每一光導包含一分離的光放大器305-1至305-M中的一者,俾使數據接收用的每一光訊號係受到對應之光學放大器的放大且俾使數據傳輸用的每一光訊號受到對應之光學放大器的放大。光放大器模組303-1至303-N中的每一者係經由光導1915-1至1915-N中的一對應者而光連接至一光纖對插入件連接件1903。代表光導結構1915-1至1915-N之箭頭的方向指出光傳播通過光導結構1915-1至1915-N的方向。 Furthermore, interposer device 1801A enables flip-chip and/or wire-bonding connections of electronic, optical, and optoelectronic dies/chips (dies/chips). In the example of FIG. 19 , a plurality (N) of optical amplifier modules 303-1 through 303-N interface with interposer device 1801A, where N can be one or more. In some embodiments, optical amplifier modules 303-1 through 303-N are discrete dies/chips connected to interposer device 1801A via flip-chip connections, wire-bonding connections, or other types of connections. Each optical amplifier module 303-1 through 303-N includes a plurality (M) of optical amplifiers 305-1 through 305-M. In various embodiments, each optical amplifier module 303-1 to 303-N includes a separate optical amplifier 305-1 to 305-M for each light guide connected to the optical amplifier module, so that each optical signal for data reception is amplified by the corresponding optical amplifier, and each optical signal for data transmission is amplified by the corresponding optical amplifier. Each optical amplifier module 303-1 to 303-N is optically connected to a fiber-to-insert connector 1903 via a corresponding light guide 1915-1 to 1915-N. The direction of the arrows representing light guide structures 1915-1 to 1915-N indicates the direction of light propagation through light guide structures 1915-1 to 1915-N.
又,在圖19之實例中,雷射源102係與插入件裝置1801A交界。在某些實施例中,雷射源102為藉由覆晶連接、打線接合連接、或其他類型之 連接而連接至插入件裝置1801A的離散晶粒/晶片。雷射源102包含(N)雷射103-1至103-N。插入件裝置1801A包含光導結構1905以將來自雷射源102的雷射光引導至星形耦合器1101(或其他光子裝置)。星形耦合器1101(或其他光子裝置)係形成在插入件裝置1801A內。換言之,星形耦合器1101(或其他光子裝置)為形成為插入件裝置1801A之一部分的一光子裝置。插入件裝置1801A亦包含光導結構1907以將雷射光自星形耦合器1101(或其他光子裝置)引導至矽光子晶粒/晶片1803。光導結構1905與1907係形成於插入件裝置1801A內。代表光導結構1905與1907之箭頭的方向指出光傳播通過光導結構1905與1907的方向。在某些實施例中,矽光子晶粒/晶片1803為藉由覆晶連接、打線接合連接、或其他類型之連接而連接至插入件裝置1801A的離散晶粒/晶片。又,矽光子晶粒/晶片1803係經由光導1909-1至1909-N中的一對應組而光連接至光放大模組303-1至303-N中的每一者。代表光導結構1909-1至1909-N之箭頭的方向指出光傳播通過光導結構1909-1至1909-N的方向。在某些實施例中,插入件裝置1801A可包含用以支持MCM整合產品之光導結構(如1905、1907、1909-1至1909-N等)及對應結構佈局之最佳化的一或多個整合隔離件(複數隔離件)。在某些實施例中,整合隔離件(複數隔離件)可為整合於插入件裝置1801A內的離散隔離件。 Furthermore, in the example of FIG. 19 , laser source 102 interfaces with interposer device 1801A. In some embodiments, laser source 102 is a discrete die/chip connected to interposer device 1801A via flip-chip connections, wire bonding connections, or other types of connections. Laser source 102 includes (N) lasers 103-1 through 103-N. Interposer device 1801A includes a light-guiding structure 1905 to guide laser light from laser source 102 to star coupler 1101 (or other photonic device). Star coupler 1101 (or other photonic device) is formed within interposer device 1801A. In other words, star coupler 1101 (or other photonic device) is a photonic device formed as part of interposer device 1801A. Interposer device 1801A also includes a light-guiding structure 1907 to guide laser light from star coupler 1101 (or other photonic device) to silicon photonic die/chip 1803. Light-guiding structures 1905 and 1907 are formed within interposer device 1801A. The direction of the arrows representing light-guiding structures 1905 and 1907 indicates the direction of light propagation through light-guiding structures 1905 and 1907. In some embodiments, silicon photonic die/chip 1803 is a discrete die/chip connected to interposer device 1801A via flip-chip connections, wire bonding connections, or other types of connections. Furthermore, silicon photonics die/chip 1803 is optically connected to each of optical amplifier modules 303-1 through 303-N via a corresponding set of light guides 1909-1 through 1909-N. The arrows representing light guide structures 1909-1 through 1909-N indicate the direction of light propagation through light guide structures 1909-1 through 1909-N. In some embodiments, interposer device 1801A may include light guide structures (e.g., 1905, 1907, 1909-1 through 1909-N, etc.) to support MCM integration products and one or more integrated isolators (plural isolators) optimized for the corresponding structural layout. In some embodiments, the integrated isolator(s) may be discrete isolators integrated into the interposer device 1801A.
圖19之實例顯示一光纖對插入件連接件1903。然而應瞭解,在某些實施例中,可提供複數光纖對插入件連接件1903以接收進入插入件裝置1801A中的光訊號。在某些實施例中,光纖對插入件之連接件1903之配置可包含v-溝槽陣列,v-溝槽陣列將光纖對準至插入件裝置1801A上之點大小的轉換器。然而應瞭解,在各種實施例中,只要光纖對插入件之連接件1903能將光自一或多條光纖導引至插入件裝置1801A內的一或多條對應光纖及反之亦然,可使用光纖對插入件連接件1903的實質上任何配置。 The example of FIG. 19 shows a fiber-to-insert connector 1903. However, it should be understood that in some embodiments, a plurality of fiber-to-insert connectors 1903 may be provided to receive optical signals entering the insert device 1801A. In some embodiments, the configuration of the fiber-to-insert connector 1903 may include a v-groove array that aligns the optical fibers to the spot-sized converters on the insert device 1801A. However, it should be understood that in various embodiments, substantially any configuration of the fiber-to-insert connector 1903 may be used as long as the fiber-to-insert connector 1903 is capable of directing light from one or more optical fibers to one or more corresponding optical fibers within the insert device 1801A, and vice versa.
進入至光纖對插入件之連接件1903中的光可能不具有受到控制的極化。又,施用僅在一極化中放大的光放大器模組303-1至303-N可能是更有效率的。因此,提供複數極化旋轉器1901以自光纖對插入件之連接件區域1903接收輸入光、將輸入光的TE與TM極化兩者分割成TE極化。在各種實施例中,每一極化旋轉器1901可為接合至插入件裝置1801A的離散元件或可整合至插入件裝置1801A內。在某些實施例中,所有極化旋轉器1901為接合至插入件裝置1801A的離散元件。在某些實施例中,所有極化旋轉器1901係整合至插入件裝置1801A內。在某些實施例中,極化旋轉器1901的一部分為接合至插入件裝置1801A的離散元件而極化旋轉器1901的一部分係整合至插入件裝置1801A內。每一極化旋轉器1901係光連接至一對應的光導1911,光導1911具有輸入波導的功能將來自光纖對插入件之連接件1903的光引導至極化旋轉器1901。又,每一極化旋轉器1901係光連接至兩個對應的光導1913,光導1913具有輸出波導的功能將來自極化旋轉器1901的光引導至光放大器模組303-1至303-N中的一者,光放大器模組303-1至303-N具有放大光訊號的功能。 Light entering the fiber-pair interposer connector 1903 may not have controlled polarization. Furthermore, it may be more efficient to use optical amplifier modules 303-1 to 303-N that amplify in only one polarization. Therefore, a plurality of polarization rotators 1901 are provided to receive input light from the fiber-pair interposer connector region 1903 and split the input light's TE and TM polarizations into TE polarization. In various embodiments, each polarization rotator 1901 may be a discrete component bonded to the interposer device 1801A or may be integrated into the interposer device 1801A. In some embodiments, all polarization rotators 1901 are discrete components bonded to the interposer device 1801A. In some embodiments, all polarization rotators 1901 are integrated into interposer device 1801A. In some embodiments, a portion of polarization rotators 1901 is a discrete component bonded to interposer device 1801A, while a portion of polarization rotators 1901 is integrated into interposer device 1801A. Each polarization rotator 1901 is optically connected to a corresponding light guide 1911, which functions as an input waveguide, directing light from the fiber-to-interposer connector 1903 to the polarization rotator 1901. Furthermore, each polarization rotator 1901 is optically connected to two corresponding light guides 1913. Light guides 1913 function as output waveguides, guiding light from polarization rotator 1901 to one of optical amplifier modules 303-1 to 303-N. Optical amplifier modules 303-1 to 303-N amplify optical signals.
應瞭解,極化旋轉器1901與其對應的輸入光導1911與其對應的兩個輸出光導1913共同形成在插入件裝置1801A上/內針對每一光放大器模組303-1至303-N的一組重覆(y)次的結構。例如,考慮光纖對插入件之連接件1903支持12條光纖的連接。又,針對此實例,考慮在插入件裝置1801A上/內有兩個光放大器模組303-1與303-2。因此針對此實例,兩個光放大器模組303-1與303-2中的每一者將服務連接至光纖對插入件之連接件1903之12條光纖中的6條光纖即一半的光纖。又,在此實例中,在受到兩個光放大器模組303-1與303-2中之一特定者服務的6條光纖中,3條光纖將會用於數據傳輸(TX)而3條光纖會用於數據接收(RX)。因此在此實例中,連接以服務光放大器模組303-1的會有3(y=3)個極化旋轉器1901與其對應的輸入光導1911與其對應的輸出光導1913。 又,在此實例中,連接以服務光放大器模組303-2的會有3(y=3)個極化旋轉器1901與其對應的輸入光導1911與輸出光導1913。應瞭解,光連接至光放大器模組303-1至303-N中之一特定者之極化旋轉器1901的數目(y)可隨著連接至插入件裝置1801A之光纖連接件之數目的增加而線性增加。在各種實施例中,連接至插入件裝置1801A之光纖連接件的數目可藉著重覆光纖對插入件之連接件1903及/或藉著增加每一光纖對插入件連接件1903的光纖數目而增加。 It should be understood that polarization rotator 1901, its corresponding input light guide 1911, and its two corresponding output light guides 1913 together form a set of structures repeated (y) times for each optical amplifier module 303-1 through 303-N on/within insert device 1801A. For example, consider that fiber-pair insert connector 1903 supports the connection of 12 optical fibers. Furthermore, for this example, consider that there are two optical amplifier modules 303-1 and 303-2 on/within insert device 1801A. Therefore, for this example, each of the two optical amplifier modules 303-1 and 303-2 provides service connections to six of the 12 optical fibers, or half of the optical fibers, on fiber-pair insert connector 1903. Furthermore, in this example, of the six optical fibers serving one of the two optical amplifier modules 303-1 and 303-2, three will be used for data transmission (TX) and three for data reception (RX). Therefore, in this example, there are three (y=3) polarization rotators 1901, corresponding input lightguides 1911, and corresponding output lightguides 1913 connected to serve optical amplifier module 303-1. Furthermore, in this example, there are three (y=3) polarization rotators 1901, corresponding input lightguides 1911, and output lightguides 1913 connected to serve optical amplifier module 303-2. It should be understood that the number (y) of polarization rotators 1901 optically connected to a particular one of optical amplifier modules 303-1 to 303-N can increase linearly with the number of fiber optic connectors connected to interposer device 1801A. In various embodiments, the number of fiber optic connectors connected to interposer device 1801A can be increased by duplicating fiber-to-interposer connectors 1903 and/or by increasing the number of fibers per fiber-to-interposer connector 1903.
對於極化旋轉器1901的製造而言,當在插入件裝置1801A上形成光導結構時採用低溫處理是有利的。在此背景下,低溫處理係指低於約450℃。與前段製程(FEOL)之SOI(絕緣層上覆矽)晶圓相匹配之例示性的極化旋轉器係載於下列文獻中:"Polarization rotator-splitters and controllers in a Si 3 N 4-on-SOI integrated photonics platform,"by Sacher,Wesley D.,et al.,Optics express 22.9(2014):11167-11174(後續稱為「Sacher」),將其所有內容包含於此作為所有目的之參考。然而Sacher的極化旋轉器將極化旋轉器-分割器限制至FEOL與SOI插入件裝置的應用。為了使Sacher的極化旋轉器有更多的功能,在後段製程(BEOL)中利用低溫處理實施極化旋轉器。此作法的一挑戰為使用BEOL相匹配的薄膜。已知低溫非晶矽(a-Si及/或a-Si-H)為低衰低薄膜,如在下列文獻中所述:"Use of amorphous silicon for active photonic devices," by Della Corte,Francesco Giuseppe,and Sandro Ra,IEEE Transactions on Electron Devices 60.5(2013):1495-1505(後續稱為「Corte」),將其所有內容包含於此作為所有目的之參考。此外,文獻如下列文獻中已展示低溫及低耗損的PECVD SiNx:"Material and optical properties of low-temperature NH3-free PECVD SiNx layers for photonic applications," by Bucio,Thalía Domínguez,et al.,Journal of Physics D:Applied Physics 50.2(2016):025106(此後稱為「Bucio」),將其所有內容包含於此作為所有目的之參考。 For the fabrication of polarization rotator 1901, it is advantageous to employ low-temperature processing when forming the light-conducting structure on interposer device 1801A. In this context, low-temperature processing refers to temperatures below approximately 450°C. An exemplary polarization rotator compatible with front-end-of-line (FEOL) SOI (silicon-on-insulator) wafers is described in the following reference: "Polarization rotator-splitters and controllers in a Si 3 N 4-on-SOI integrated photonics platform," by Sacher, Wesley D., et al., Optics express 22.9 (2014): 11167-11174 (hereinafter referred to as "Sacher"), the entire contents of which are incorporated herein by reference for all purposes. However, Sacher's polarization rotator limits the application of polarization rotator-divider to FEOL and SOI interposer devices. To make Sacher's polarization rotator more versatile, the polarization rotator is implemented in the back-end of the line (BEOL) using low-temperature processing. One challenge in this approach is to use BEOL-compatible thin films. Low-temperature amorphous silicon (a-Si and/or a-Si-H) is known to be a low-loss, low-density thin film, as described in the following article: "Use of amorphous silicon for active photonic devices," by Della Corte, Francesco Giuseppe, and Sandro Ra, IEEE Transactions on Electron Devices 60.5 (2013): 1495-1505 (hereinafter referred to as "Corte"), the entire contents of which are incorporated herein by reference for all purposes. In addition, low-temperature and low-loss PECVD SiNx has been demonstrated in the following literature: "Material and optical properties of low-temperature NH3-free PECVD SiNx layers for photonic applications," by Bucio, Thalía Domínguez, et al., Journal of Physics D: Applied Physics 50.2(2016):025106 (hereinafter referred to as "Bucio"), the entire contents of which are incorporated herein by reference for all purposes.
考慮下列之例示性結構:厚度介於約200奈米(nm)至400nm之間的SiNx層,其可被圖案化及蝕刻形成O至C頻段的光導。在此SiNx光導層的下方設有一層厚度介於約50nm至約200nm的二氧化矽層。在此二氧化矽層之下方設有一層厚度介於約150nm至約300nm的a-Si-H(或a-Si)層。此a-Si-H(或a-Si)層為另一光導層且可以Sacher中所述之方式圖案化及蝕刻。在某些實施例中,a-Si-H(或a-Si)層可在SiNx層上方製造而非如上所述在其下方製造。應瞭解,上述之例示性結構的膜層能使極化旋轉器-分割器在BEOL插入件裝置流程中製造,藉此使其與高產量及低成本之插入件裝置製造目標相匹配。 Consider the following exemplary structure: a SiNx layer with a thickness between approximately 200 nanometers (nm) and 400 nm, which can be patterned and etched to form a light guide for the O to C frequency band. Beneath this SiNx light guide layer is a silicon dioxide layer with a thickness between approximately 50 nm and approximately 200 nm. Beneath this silicon dioxide layer is an a-Si-H (or a-Si) layer with a thickness between approximately 150 nm and approximately 300 nm. This a-Si-H (or a-Si) layer is another light guide layer and can be patterned and etched in the manner described in Sacher. In certain embodiments, the a-Si-H (or a-Si) layer can be fabricated above the SiNx layer rather than beneath it as described above. It will be appreciated that the exemplary structure of the film layer described above enables the polarization rotator-divider to be fabricated in a BEOL interposer device flow, thereby making it compatible with the interposer device manufacturing goals of high throughput and low cost.
圖20A顯示根據本發明之某些實施例之插入件裝置1801A的垂直橫剖面方塊圖,插入件裝置1801A係作為MCM整合產品的一部分。在圖20A的實例中,雷射源102、光放大器模組303-1至303-N及矽光子晶粒/晶片1803陷入插入件裝置1801A中。與插入件裝置1801A陷入交界的此種類型能使插入件裝置1081A內的光導與雷射源102、光放大器模組303-1至303-N及矽光子晶粒/晶片1803每一者內的光導邊緣耦合,例如前面針對圖5B所討論的狀況。又,應瞭解,雷射源102、光放大器模組303-1至303-N及矽光子晶粒/晶片1803中的任何者及插入件裝置1801A可適當地包含點大小的轉換器。鑑於晶粒/晶片(如雷射源102、光放大器模組303-1至303-N及矽光子晶粒/晶片1803)在插入件裝置1801A上的設置精準度可落在目標位置的約1微米內,包含點大小的轉換器可以是有用的。 FIG20A shows a vertical cross-sectional block diagram of an interposer device 1801A as part of an integrated MCM product, according to certain embodiments of the present invention. In the example of FIG20A , laser source 102, optical amplifier modules 303-1 through 303-N, and silicon photonics die/chip 1803 are recessed within interposer device 1801A. This type of recessed interface with interposer device 1801A enables coupling of light guides within interposer device 1801A with light guide edges within each of laser source 102, optical amplifier modules 303-1 through 303-N, and silicon photonics die/chip 1803, such as discussed above with respect to FIG5B . Furthermore, it should be understood that any of the laser source 102, optical amplifier modules 303-1 to 303-N, and silicon photonic die/chip 1803, as well as the interposer device 1801A, may suitably include a spot-size converter. The inclusion of a spot-size converter can be useful, given that the placement accuracy of the die/chip (e.g., laser source 102, optical amplifier modules 303-1 to 303-N, and silicon photonic die/chip 1803) on the interposer device 1801A can be within approximately 1 micron of the target position.
圖20B顯示根據本發明之某些實施例之插入件裝置1801A的另一垂直橫剖面方塊圖,插入件裝置1801A係作為MCM整合產品的一部分。在圖20B之實例中,雷射源102、光放大器模組303-1至303-N及矽光子晶粒/晶片1803係設置及安裝在插入件裝置1801A的上部上。與插入件裝置1801A的此種上安裝交界使插入件裝置1801A內的光導能與雷射源102、光放大器模組303-1 至303-N及矽光子晶粒/晶片1803每一者內的光導垂直耦合,例如前面針對圖3Y所討論的狀況。 FIG20B shows another vertical cross-sectional block diagram of interposer device 1801A, according to certain embodiments of the present invention, as part of an integrated MCM product. In the example of FIG20B , laser source 102, optical amplifier modules 303-1 through 303-N, and silicon photonic die/chip 1803 are positioned and mounted on top of interposer device 1801A. This top-mounted interface with interposer device 1801A enables vertical coupling of light guides within interposer device 1801A with light guides within each of laser source 102, optical amplifier modules 303-1 through 303-N, and silicon photonic die/chip 1803, as discussed previously with respect to FIG3Y .
圖20C顯示根據本發明之某些實施例之插入件裝置1801A的另一垂直橫剖面方塊圖,插入件裝置1801A係作為MCM整合產品的一部分。在圖20C的實例中,光放大器模組303-1至303-N係陷入插入件裝置1801A中以使插入件裝置1801A內的光導能與光放大器模組303-1至303-N內的光導邊緣耦合。又,在圖20C的實例中,矽光子晶粒/晶片1803係設置於插入件裝置1801A的上方上使插入件裝置1801A內的光導能與矽光子晶粒/晶片1803內的光導垂直耦合。應瞭解,在各種實施例中,插入件裝置1801A可用以在插入件裝置1801A之光導與和插入件裝置1801A交界之任何晶粒/晶片的光導之間實質上提供邊緣耦合與垂直耦合的任何組合。因此在某些實施例中,如在圖20C的實例中,某些晶粒/晶片(複數晶粒/晶片)可以陷入配置的方式與插入件裝置1801A交界而某些晶粒/晶片(複數晶粒/晶片)可以上安裝如表面安裝配置的方式與插入件裝置1801A交界。又,在某些實施例中,插入件裝置1801A的上表面及下表面可具有陷入安裝及/或表面安裝設置的一或多個交界晶粒/晶片(複數晶粒/晶片)。 FIG20C shows another vertical cross-sectional block diagram of interposer device 1801A as part of an MCM integrated product, according to certain embodiments of the present invention. In the example of FIG20C , optical amplifier modules 303-1 through 303-N are recessed within interposer device 1801A, enabling optical waveguides within interposer device 1801A to couple with the edges of optical waveguides within optical amplifier modules 303-1 through 303-N. Furthermore, in the example of FIG20C , silicon photonics die/chip 1803 is positioned above interposer device 1801A, enabling optical waveguides within interposer device 1801A to couple vertically with optical waveguides within silicon photonics die/chip 1803. It should be understood that, in various embodiments, interposer device 1801A can be configured to provide substantially any combination of edge coupling and vertical coupling between the light guides of interposer device 1801A and the light guides of any die/chips interfacing with interposer device 1801A. Thus, in some embodiments, such as the example of FIG. 20C , some die/chips may interface with interposer device 1801A in a recessed configuration, while some die/chips may interface with interposer device 1801A in a surface-mounted, such as surface-mounted, configuration. Furthermore, in some embodiments, the top and bottom surfaces of interposer device 1801A may have one or more interfacing die/chips in a recessed and/or surface-mounted configuration.
圖21顯示根據本發明之某些實施例之一例示性插入件裝置1801B之上表面的等角視圖。插入件裝置1801B包含形成在其上表面內的空腔/凹陷2100。空腔/凹陷2100係形成而接收晶粒/晶片以使晶粒/晶片光學邊緣耦合至插入件裝置1801B內的光導。每一晶粒/晶片可實質上為任何類型的晶粒/晶片,尤其包含光子晶粒/晶片、電子晶粒/晶片、矽光子晶粒/晶片。當晶粒/晶片內的光導係邊緣耦合至插入件裝置1801B內之對應光導時,將晶粒/晶片內的光導設置在插入件裝置1801B內之光導的鄰近之處是有利的,其中鄰近被認為是沿著連接光導之間之光傳播之軸小於約10微米。因此應瞭解,形成空腔/凹陷2100俾以在將晶粒/晶片放置到空腔/凹陷2100內時空腔/凹陷2100欲進行邊緣耦合之側 壁(複數側壁)係極鄰近晶粒/晶片。顯示例示性的插入件裝置1801B包含光導2101以例示光導2101在插入件裝置1801B內可具有任意繞線路徑且例示光導2101可在晶粒/晶片(複數晶粒/晶片)之多於一個邊緣處與晶粒/晶片(複數晶粒/晶片)光連接。應瞭解,每一空腔/凹陷2100可依需求具有任何尺寸、外圍形狀及深度以容納接收晶粒/晶片。又,每一空腔/凹陷2100可依需求具有均勻深度或非均勻深度即多重深度以容納接收晶粒/晶片。又,圖21之實例顯示在某些實施例中,空腔/凹陷2100中的一或多者可用以具有側突出物(或口袋)2103作為毛細底填的環氧化物儲槽。 FIG21 shows an isometric view of the top surface of an exemplary interposer device 1801B according to certain embodiments of the present invention. Interposer device 1801B includes a cavity/recess 2100 formed in its top surface. Cavity/recess 2100 is formed to receive a die/chip so that the die/chip optical edge couples to a light guide within interposer device 1801B. Each die/chip can be substantially any type of die/chip, including, in particular, a photonic die/chip, an electronic die/chip, and a silicon photonic die/chip. When the light guide within the die/chip is edge-coupled to a corresponding light guide within interposer device 1801B, it is advantageous to position the light guide within the die/chip adjacent to the light guide within interposer device 1801B, where proximity is considered to be less than approximately 10 microns along the axis of light propagation between the connected light guides. Therefore, it should be understood that cavity/recess 2100 is formed so that the sidewall(s) of cavity/recess 2100 to which edge coupling is intended is in close proximity to the die/chip when the die/chip is placed within cavity/recess 2100. An exemplary interposer device 1801B is shown including a light guide 2101 to illustrate that the light guide 2101 can have any routing path within the interposer device 1801B and that the light guide 2101 can optically connect to the die/chip(s) at more than one edge of the die/chip(s). It should be understood that each cavity/recess 2100 can have any desired size, perimeter shape, and depth to accommodate a die/chip. Furthermore, each cavity/recess 2100 can have a uniform depth or a non-uniform depth, i.e., multiple depths, to accommodate a die/chip, as desired. Furthermore, the example of FIG. 21 illustrates that, in some embodiments, one or more of the cavities/recesses 2100 can have side protrusions (or pockets) 2103 as epoxy reservoirs for capillary underfill.
圖22顯示根據本發明之某些例示性實施例之圖21之例示性插入件裝置1801B,其在空腔/凹陷2100內設有晶粒/晶片2201。圖22的顯示晶粒/晶片2201之一側上的側突出物2103A,其中空腔/凹陷2100係大於晶粒/晶片2201。環氧化物可設置於側突出物2103A內以產生環氧化物儲槽。環氧化物係設置於側突出物2103A內以不完全覆蓋晶粒/晶片2201的上部。在某些情況中,存在於晶粒/晶片2201之上部上的環氧化物可造成不利的影響如產生較高熱阻抗的路徑及/或造成應力破裂。例如,若環氧化物存在於晶粒/晶片2201的上部上且一蓋係設置於晶粒/晶片2201上方,則環氧化物可造成應力破裂。存在於側突出物2103A內的環氧化物具有填充晶粒/晶片2201與插入件裝置1801B之間之空洞的功能,空洞包含空腔/凹陷2100與晶粒/晶片2201之側壁之間的空洞。此處理被稱為毛細底填。圖22亦顯示可以如何將特定的晶粒/晶片2201設置於具有兩或更多側突出物2103B的空腔/凹陷2100內。又,圖22亦顯示可以如何將特定的晶粒/晶片2201設置於具有不同形狀之側突出物2103B的空腔/凹陷2100內。 FIG22 illustrates the exemplary interposer device 1801B of FIG21 , having a die/chip 2201 disposed within a cavity/recess 2100, according to certain exemplary embodiments of the present invention. FIG22 illustrates a side protrusion 2103A on one side of the die/chip 2201, wherein the cavity/recess 2100 is larger than the die/chip 2201. Epoxide may be disposed within the side protrusion 2103A to create an epoxy reservoir. The epoxy is disposed within the side protrusion 2103A so as not to completely cover the upper portion of the die/chip 2201. In certain cases, the presence of epoxy on the upper portion of the die/chip 2201 may have adverse effects such as creating a path of higher thermal impedance and/or causing stress cracking. For example, if epoxy is present on the top of die/chip 2201 and a cap is placed over die/chip 2201, the epoxy can cause stress fractures. The epoxy within side protrusions 2103A fills the void between die/chip 2201 and interposer device 1801B, including the void between cavity/recess 2100 and the sidewalls of die/chip 2201. This process is known as capillary underfill. Figure 22 also illustrates how a particular die/chip 2201 can be placed within a cavity/recess 2100 having two or more side protrusions 2103B. Furthermore, Figure 22 illustrates how a particular die/chip 2201 can be placed within a cavity/recess 2100 having side protrusions 2103B of different shapes.
圖23A至23F顯示根據本發明之某些實施例之用以連接至插入件裝置1801C的一整合性機械傳輸(MT)套圈。在某些實施例中,MT套圈可用來 作為光纖對插入件之連接件1903。MT套圈包含上半部2301與下半部2303。MT套圈之上半部2301與下半部2303可由矽、玻璃、塑膠或其他與週遭/界面材料化學相匹配且能夠提供所需之熱與機械效能的材料所形成。MT套圈之上半部2301與下半部2303可包含一或多個對準鑰2305以提供上半部2301與下半部2303的對準與適配。例如,在圖23A至23F之例示性MT套圈中,上半部2301上的對準鑰2305自上半部2301向外突出且具有與下半部2303之對準鑰2305互補即共形適配的形狀,對準鑰2305係以空腔/凹陷的形式形成於下半部2303內。在各種實施例中,對準鑰2305可具有各種橫剖面如三角形、矩形、圓形或其他形狀。MT套圈的上半部2301亦包含一或多個部分孔2307且MT套圈的下半部2303亦包含一或多個部分孔2309。部分孔2307與2309一起形成對準孔以提供整合式MT套圈與另一吻合MT套圈或與另一相匹配形成的連接件結構/裝置之間的對準。在某些實施例中,在形成插入件裝置1801C以容納整合式MT套圈的安裝後,插入件裝置1801C之一或多個拉耳(tab)2311結構維持不變。在某些實施例中,一或多個拉耳2311會消失。 Figures 23A through 23F illustrate an integrated mechanical transmission (MT) ferrule for connection to an interposer device 1801C, according to certain embodiments of the present invention. In certain embodiments, the MT ferrule can be used as the fiber-to-interposer connector 1903. The MT ferrule comprises an upper portion 2301 and a lower portion 2303. The upper and lower portions 2301, 2303 of the MT ferrule can be formed from silicon, glass, plastic, or other materials that are chemically compatible with the surrounding/interface materials and provide the required thermal and mechanical performance. The upper and lower portions 2301, 2303 of the MT ferrule can include one or more alignment keys 2305 to facilitate alignment and mating of the upper and lower portions 2301, 2303. For example, in the exemplary MT ferrule of Figures 23A to 23F, an alignment key 2305 on the upper portion 2301 protrudes outward from the upper portion 2301 and has a shape that complements, or conformally matches, the alignment key 2305 of the lower portion 2303. Alignment key 2305 is formed in the form of a cavity/recess within the lower portion 2303. In various embodiments, alignment key 2305 can have various cross-sectional shapes, such as triangular, rectangular, circular, or other shapes. The upper portion 2301 of the MT ferrule also includes one or more partial holes 2307, and the lower portion 2303 of the MT ferrule also includes one or more partial holes 2309. The partial holes 2307 and 2309 together form alignment holes to provide alignment between the integrated MT ferrule and another matching MT ferrule or another mating connector structure/device. In some embodiments, after the insert device 1801C is formed to accommodate the installation of the integrated MT ferrule, the structure of one or more tabs 2311 of the insert device 1801C remains unchanged. In some embodiments, one or more tabs 2311 disappear.
如圖23B中所示,上半部2301與下半部2303係安裝至插入件裝置1801C以形成整合式MT套圈。在各種實施例中,上半部2301與下半部2303可利用環氧樹脂、黏膠、焊料或任何其他適合的黏著劑而安裝至插入件裝置1801C。在MT套圈之上半部2301與下半部2303係安裝至插入件裝置1801C而形成整合式MT套圈後,整合式MT套圈具有與其他適配連接件結構/裝置例如與標準MT套圈相匹配的結構。然而應瞭解,整合式MT套圈之配置可與實質上任何其他形式的適配連接件結構/裝置相匹配,不限於與標準MT套圈一起使用。插入件裝置1801C包含複數光導2313,複數光導2313延伸至整合式MT套圈之上半部2301與下半部2303之間之位置處之插入件裝置1801C的邊緣。在某些實施例中,光導2313之設置係根據與整合式MT套圈吻合之連接件結構/ 裝置內之光纖插孔的相同節距,如標準MT套圈內之光纖插口的節距。在某些實施例中,在光導位置處插入件裝置1801C的邊緣可加以拋光。又,在某些實施例中,插入件裝置1801C可包含一或多個點大小的轉換器以與整合式MT套圈共同作業以改善光耦合。例如,在某些實施例中,此類點大小之轉換器可被配置為光導的倒斜角。 As shown in FIG23B , upper half 2301 and lower half 2303 are mounted to insert device 1801C to form an integrated MT ferrule. In various embodiments, upper half 2301 and lower half 2303 can be mounted to insert device 1801C using epoxy, glue, solder, or any other suitable adhesive. After the upper half 2301 and lower half 2303 of the MT ferrule are mounted to insert device 1801C to form the integrated MT ferrule, the integrated MT ferrule has a structure that mates with other mating connector structures/devices, such as a standard MT ferrule. However, it should be understood that the configuration of the integrated MT ferrule can mate with virtually any other type of mating connector structure/device and is not limited to use with a standard MT ferrule. Insert device 1801C includes a plurality of light guides 2313 extending to the edge of insert device 1801C between the upper and lower halves 2301 and 2303 of the integrated MT ferrule. In some embodiments, the light guides 2313 are positioned to match the pitch of the fiber optic receptacles within the connector structure/device that mates with the integrated MT ferrule, such as the pitch of fiber optic receptacles within a standard MT ferrule. In some embodiments, the edges of insert device 1801C at the locations of the light guides may be polished. Furthermore, in some embodiments, insert device 1801C may include one or more spot-size converters that work in conjunction with the integrated MT ferrule to improve optical coupling. For example, in some embodiments, such spot-size converters may be configured as chamfered corners of the light guides.
圖24顯示根據本發明之某些實施例之貫穿雷射源102之例示性垂直橫剖面。然而應瞭解,參考圖24所述之原理可應用至其他電子及/或光子裝置如光放大模組303。為了討論的目的,圖24的橫剖面顯示複數雷射103-1至103-N。然而應瞭解,在其他的電子及/或光子裝置的情況下,複數雷射103-1至103-N可為其他元件。例如,若圖24的橫剖面為光放大模組303的橫剖面而非雷射源102的橫剖面,則複數光放大器305-1至305-M可取代複數雷射103-1至103-N。圖24的垂直橫剖面顯示電子及/或光子裝置如雷射源102的基板1021。在某些實施例中,基板1021係由InP所形成。 FIG24 shows an exemplary vertical cross-section of a through-laser source 102 according to certain embodiments of the present invention. However, it should be understood that the principles described with reference to FIG24 can be applied to other electronic and/or photonic devices, such as an optical amplifier module 303. For discussion purposes, the cross-section of FIG24 shows a plurality of lasers 103-1 to 103-N. However, it should be understood that in other electronic and/or photonic devices, the plurality of lasers 103-1 to 103-N can be other components. For example, if the cross-section of FIG24 is a cross-section of an optical amplifier module 303 rather than a cross-section of a laser source 102, the plurality of optical amplifiers 305-1 to 305-M can replace the plurality of lasers 103-1 to 103-N. FIG24 is a vertical cross-section illustrating a substrate 1021 of an electronic and/or photonic device, such as a laser source 102. In some embodiments, the substrate 1021 is formed of InP.
對於III-V族的光子裝置而言,特徵部可利用各種磊晶層之(z方向)磊晶成長來定義。由於裝置的功能係取決於磊晶層的特性如組成與厚度,因此的形成磊晶層係受到極良好的控制。圖24的垂直橫剖面顯示三個例示性的磊晶層1022、1023及1024。在某些實施例中,磊晶層1022為磊晶成長所形成的第一光子層。在某些實施例中,磊晶層1022為PIN二極體的N型部分。應瞭解,PIN二極體為分佈回饋雷射(DFB)與半導體光放大器(SOA)的元件。在某些實施例中,磊晶層1023為磊晶成長所形成的第二光子層。在某些實施例中,磊晶層1023為PIN二極體的本質部分。在某些實施例中,磊晶層1024為磊晶成長所形成的第三光子層。在某些實施例中,磊晶層1024為PIN二極體的p型部分。 For III-V photonic devices, features can be defined by epitaxial growth (in the z-direction) of various epitaxial layers. Since the function of the device depends on the properties of the epitaxial layers, such as composition and thickness, the formation of the epitaxial layers is very well controlled. The vertical cross-section of Figure 24 shows three exemplary epitaxial layers 1022, 1023 and 1024. In some embodiments, epitaxial layer 1022 is the first photonic layer formed by epitaxial growth. In some embodiments, epitaxial layer 1022 is the N-type portion of a PIN diode. It should be understood that a PIN diode is a component of a distributed feedback laser (DFB) and a semiconductor optical amplifier (SOA). In some embodiments, epitaxial layer 1023 is the second photonic layer formed by epitaxial growth. In some embodiments, epitaxial layer 1023 is an intrinsic portion of a PIN diode. In some embodiments, epitaxial layer 1024 is a third photonic layer formed by epitaxial growth. In some embodiments, epitaxial layer 1024 is the p-type portion of a PIN diode.
圖24之垂直橫剖面亦顯示平坦化層1025。在各種實施例中,平坦化層1025可由苯並環丁烯(BCB)、或旋塗介電材料(SOD)、或用以形成平坦化 層之半導體製造中所用的一或多種其他材料所形成。在某些實施例中,平坦化層1025的材料係旋塗於晶圓/基板上。取決於正在沉積之平坦化層1025之材料下方的特徵部的地貌,將平坦化層1025的材料旋塗於晶圓/基板上的處理可造成形成尖峰及凹谷。此些尖峰及凹谷會造成橫跨晶圓/基板之平坦化層1025之厚度的變異。又,平坦化層1025之厚度的變異可為橫跨晶圓/基板之徑向位置的函數如平坦化層1025之厚度在晶圓/基板中央至邊緣的變異。 The vertical cross-section of Figure 24 also shows planarization layer 1025. In various embodiments, planarization layer 1025 can be formed from benzocyclobutene (BCB), spin-on dielectric (SOD), or one or more other materials used in semiconductor manufacturing to form planarization layers. In some embodiments, the material of planarization layer 1025 is spun onto the wafer/substrate. Depending on the topography of the features underlying the planarization layer 1025 material being deposited, the process of spinning the planarization layer 1025 material onto the wafer/substrate can result in peaks and valleys. These peaks and valleys cause variations in the thickness of planarization layer 1025 across the wafer/substrate. Furthermore, the variation in the thickness of the planarization layer 1025 may be a function of radial position across the wafer/substrate, such as the variation in the thickness of the planarization layer 1025 from the center to the edge of the wafer/substrate.
圖24之垂直橫剖面亦顯示裝置之導電內連線結構1026。在某些例示性實施例中,III-V裝置之導電內連線結構如1026可由Au、Ag、W、Ni及其他金屬/合金中的一或多者所形成。在圖24之實例中,導電內連線結構1026將雷射源102覆晶連接至插入件裝置。例如,導電內連線結構1026可被焊至插入件裝置上之對應導電結構。 The vertical cross-section of FIG. 24 also illustrates a conductive interconnect structure 1026 of the device. In certain exemplary embodiments, a conductive interconnect structure such as 1026 of a III-V device can be formed from one or more of Au, Ag, W, Ni, and other metals/alloys. In the example of FIG. 24 , conductive interconnect structure 1026 flip-chip connects the laser source 102 to the interposer device. For example, conductive interconnect structure 1026 can be soldered to a corresponding conductive structure on the interposer device.
圖25顯示根據本發明之某些實施例之在蝕刻平坦化層1025以顯露磊晶層1024(第三光子層)之部分1027後圖24的垂橫剖面圖。磊晶層1024之經顯現的部分1027具有「接合肩」的功能。在蝕刻平坦化層1025而顯現部分1027後,磊晶層1024之經顯現的部分1027之上表面的z方向位置係與磊晶層1024完成磊晶成長時相同。由於磊晶層1024的磊晶成長在z方向上受到良好控制(比平坦化層1025的z方向厚度有遠遠更多的控制),因此磊晶層1024之經顯現之部分1027提供了可用於覆晶操作之精準更佳z方向控制的參考結構。又,應注意,形成在雷射源102上的光導可自磊晶層1022、1023及1024所形成。因此,使用磊晶層1024之經顯現之部分1027作為覆晶連接操作中之z方向控制的參考結構能得到雷射源102之光導與插入件裝置之光導之間的更可靠光耦合。 FIG25 shows a vertical cross-sectional view of FIG24 after etching the planarization layer 1025 to expose a portion 1027 of the epitaxial layer 1024 (the third photonic layer), according to certain embodiments of the present invention. The exposed portion 1027 of the epitaxial layer 1024 functions as a "bonding shoulder." After etching the planarization layer 1025 to expose the portion 1027, the z-direction position of the top surface of the exposed portion 1027 of the epitaxial layer 1024 remains the same as it was upon completion of epitaxial growth of the epitaxial layer 1024. Because the epitaxial growth of epitaxial layer 1024 is well-controlled in the z-direction (much more so than the z-direction thickness of planarization layer 1025), the exposed portion 1027 of epitaxial layer 1024 provides a reference structure for precise and better z-direction control during a flip-chip operation. Furthermore, it should be noted that the light guide formed on laser source 102 can be formed from epitaxial layers 1022, 1023, and 1024. Therefore, using the exposed portion 1027 of epitaxial layer 1024 as a reference structure for z-direction control during a flip-chip connection operation results in more reliable optical coupling between the light guide of laser source 102 and the light guide of the interposer device.
圖26顯示根據本發明之某些實施例之覆晶連接至插入件裝置2601之圖25之雷射源102的垂直橫剖面圖。在圖26的實例中如在位置2603處所示,磊晶層1024之經顯現之部分1027係接合至插入件裝置2601之插槽/空穴內的氮 化物蝕刻停止層。在圖26的實例中,插入件裝置2601為矽插入件。插入件裝置2601之氮化物停止層及剩餘的層間介電(ILD)層可由晶圓級沉積技術例如尤其是化學汽相沉積(CVD)及/或原子層沉積(ALD)所形成。因此,能良好定義及良好控制插入件裝置2601內之氮化物蝕刻停止層及其他ILD層的精準。這成就雷射源102與插入件裝置2601之間之z方向對準的良好控制。 FIG26 shows a vertical cross-sectional view of the laser source 102 of FIG25 flip-chip-connected to an interposer device 2601, according to certain embodiments of the present invention. In the example of FIG26 , as shown at location 2603, the exposed portion 1027 of the epitaxial layer 1024 is bonded to a nitride etch stop layer within the socket/cavity of the interposer device 2601. In the example of FIG26 , the interposer device 2601 is a silicon interposer. The nitride stop layer and the remaining interlayer dielectric (ILD) layer of the interposer device 2601 can be formed using wafer-level deposition techniques, such as, in particular, chemical vapor deposition (CVD) and/or atomic layer deposition (ALD). As a result, the accuracy of the nitride etch stop layer and other ILD layers within the interposer device 2601 can be well defined and well controlled. This enables good control of the z-direction alignment between the laser source 102 and the interposer device 2601.
在某些實施例中,所揭露之插入件裝置1801/1801A/1801B/1801C包含基板。基板包含用以接收雷射源晶片102之雷射源晶片界面區域。基板亦包含用以接收矽光子晶片1803之矽光子晶片界面區域。基板亦包含用以接收光放大器模組303-1-303-N之光放大器模組界面區域。光纖對插入件連接區域係形成於基板內以包含光纖對插入件之連接件1903。第一組光傳輸結構係形成於基板內以在雷射源晶片102和矽光子晶片1803係與基板交界時將雷射源晶片102光學連接至矽光子晶片1803。第二組光傳輸結構係形成於基板內以在矽光子晶片1803和光放大器模組303-1-303-N係與基板交界時將矽光子晶片1803光學連接至光放大器模組303-1-303-N。第三組光傳輸結構係形成於基板內以在光放大器模組303-1-303-N係與基板交界時將光放大器模組303-1-303-N光學連接至光纖對插入件連接區域。 In certain embodiments, the disclosed interposer device 1801/1801A/1801B/1801C includes a substrate. The substrate includes a laser source chip interface region for receiving the laser source chip 102. The substrate also includes a silicon photonics chip interface region for receiving the silicon photonics chip 1803. The substrate also includes an optical amplifier module interface region for receiving the optical amplifier modules 303-1-303-N. A fiber-to-interposer connection region is formed within the substrate to include a fiber-to-interposer connector 1903. A first set of optical transmission structures is formed within the substrate to optically connect the laser source chip 102 to the silicon photonics chip 1803 when the laser source chip 102 and the silicon photonics chip 1803 are interfaced with the substrate. A second set of optical transmission structures is formed within the substrate to optically connect silicon photonics chip 1803 to optical amplifier modules 303-1-303-N when the silicon photonics chip 1803 and optical amplifier modules 303-1-303-N are interfaced with the substrate. A third set of optical transmission structures is formed within the substrate to optically connect optical amplifier modules 303-1-303-N to the fiber-to-interposer connection area when the optical amplifier modules 303-1-303-N are interfaced with the substrate.
在某些實施例中,第一組光傳輸結構包含形成在基板內之光編排模組。光編排模組係用以自雷射源晶片102接收具有不同波長的複數雷射光束、將複數雷射光束結合為一多波長雷射光源、並將多波長雷射光源的一部分傳輸至矽光子晶片界面區域處之複數位置的每一位置,當矽光子晶片1803係與基板交界時矽光子晶片界面區域處之複數位置係與矽光子晶片1803之對應複數雷射光之光輸入口對準。在某些實施例中,光編排模組包含Nx1相維持波長結合器701具有光連接至1xM相維持寬頻功率分割器705之光輸入的光輸出,其中N為複數雷射光束的數目而M為矽光子晶片界面區域處之該複數位置的數目,矽 光子晶片界面區域處之複數位置係與矽光子晶片1803之該對應複數雷射光之光輸入口對準。在某些實施例中,光編排模組包含具有複數光輸入及一光輸出的陣列式波導801,複數光輸入係用以接收複數雷射光束而光輸出係光連接至寬頻功率分割器805的光輸入。寬頻功率分割器805具有複數光輸出,複數光輸出係用以將光傳輸至矽光子晶片界面區域處之該複數位置,矽光子晶片界面區域處之複數位置係與矽光子晶片1803之該對應複數雷射光之光輸入口對準。 In some embodiments, the first set of optical transmission structures includes a light orchestration module formed within the substrate. The light orchestration module is configured to receive multiple laser beams having different wavelengths from the laser source chip 102, combine the multiple laser beams into a multi-wavelength laser light source, and transmit a portion of the multi-wavelength laser light source to each of a plurality of locations in the interface region of the silicon photonics chip. When the silicon photonics chip 1803 is interfaced with the substrate, the plurality of locations in the interface region of the silicon photonics chip are aligned with optical input ports of the silicon photonics chip 1803 corresponding to the plurality of laser beams. In some embodiments, the optical orchestration module includes an Nx1 phase-maintaining wavelength combiner 701 having an optical output optically connected to an optical input of a 1xM phase-maintaining broadband power divider 705, where N is the number of the plurality of laser beams and M is the number of the plurality of locations at the silicon photonics chip interface region, the plurality of locations at the silicon photonics chip interface region being aligned with the optical inputs of the corresponding plurality of laser beams of the silicon photonics chip 1803. In some embodiments, the optical orchestration module includes an array waveguide 801 having a plurality of optical inputs for receiving the plurality of laser beams and an optical output optically connected to the optical input of the broadband power divider 805. The broadband power divider 805 has a plurality of optical outputs for transmitting light to the plurality of locations in the interface region of the silicon photonics chip. The plurality of locations in the interface region of the silicon photonics chip are aligned with the optical input ports of the corresponding plurality of laser lights of the silicon photonics chip 1803.
在某些實施例中,光編排模組包含階梯光柵901具有用以接收複數雷射光束的複數光輸入。階梯光柵901具有光連接至寬頻功率分割器905之光輸入的光輸出。寬頻功率分割器905具有複數光輸出,複數光輸出係用以將光傳輸至矽光子晶片界面區域處的複數位置,矽光子晶片界面區域處之複數位置係與矽光子晶片1803之該對應複數雷射光之光輸入口對準。在某些實施例中,光編排模組包含具有複數光輸入及複數光輸出的蝶形波導網路1001,複數光輸入係用以接收複數雷射光束而複數光輸出係用以將光傳輸至矽光子晶片界面區域處的複數位置,矽光子晶片界面區域處之複數位置係與矽光子晶片1803之該對應複數雷射光之光輸入口對準。在某些實施例中,光編排模組包含具有複數光輸入與複數光輸出的星形耦合器1101,複數光輸入係用以接收複數雷射光束而複數光輸出係用以將光傳輸至矽光子晶片界面區域處的複數位置,矽光子晶片界面區域處之複數位置係與矽光子晶片1803之對應複數雷射光輸入接口對準。在某些實施例中,光編排模組包含具有複數光輸入與複數光輸出的諧振環陣列1201,複數光輸入係用以接收複數雷射光束而複數光輸出係用以將光傳輸至矽光子晶片界面區域處的複數位置,矽光子晶片界面區域處之複數位置係與矽光子晶片1803之該對應複數雷射光之光輸入口對準。 In some embodiments, the optical orchestration module includes a step grating 901 having a plurality of optical inputs for receiving a plurality of laser beams. Step grating 901 has an optical output optically connected to an optical input of a broadband power divider 905. Broadband power divider 905 has a plurality of optical outputs for transmitting light to a plurality of locations in the interface region of the silicon photonics chip. The plurality of locations in the interface region of the silicon photonics chip are aligned with the optical inputs of the corresponding plurality of laser beams of the silicon photonics chip 1803. In some embodiments, the optical orchestration module includes a butterfly waveguide network 1001 having a plurality of optical inputs and a plurality of optical outputs, wherein the plurality of optical inputs are configured to receive a plurality of laser beams, and the plurality of optical outputs are configured to transmit the light to a plurality of locations at an interface region of the silicon photonics chip. The plurality of locations at the interface region of the silicon photonics chip are aligned with the corresponding plurality of laser light input ports of the silicon photonics chip 1803. In some embodiments, the optical orchestration module includes a star coupler 1101 having a plurality of optical inputs and a plurality of optical outputs, wherein the plurality of optical inputs are configured to receive a plurality of laser beams, and the plurality of optical outputs are configured to transmit the light to a plurality of locations at an interface region of the silicon photonics chip. The plurality of locations at the interface region of the silicon photonics chip are aligned with the corresponding plurality of laser light input ports of the silicon photonics chip 1803. In some embodiments, the optical orchestration module includes a resonant ring array 1201 having a plurality of optical inputs and a plurality of optical outputs. The plurality of optical inputs are configured to receive a plurality of laser beams, while the plurality of optical outputs are configured to transmit the light to a plurality of locations in the interface region of the silicon photonics chip. The plurality of locations in the interface region of the silicon photonics chip are aligned with the optical input ports of the silicon photonics chip 1803 corresponding to the plurality of laser beams.
在某些實施例中,插入件裝置1801/1801A/1801B/1801C包含形成於基板內之局部金屬路線結構及導電通孔結構以在矽光子晶片1803和與基板交 界的另一電子裝置之間提供電連接。在某些實施例中,矽光子晶片界面區域係用以將矽光子晶片1803內之導電結構覆晶連接至基板內之對應導電結構。在某些實施例中,矽光子晶片界面區域係用以將矽光子晶片1803內之導電結構打線接合連接至基板內之對應導電結構。在某些實施例中,矽光子晶片界面區域係用以在矽光子晶片1803係與基板交界時將第一組光傳輸結構邊緣耦合至矽光子晶片1803的對應光輸入。又,矽光子晶片界面區域係用以在矽光子晶片係與基板交界時將第二組光傳輸結構邊緣耦合至矽光子晶片1803的對應光輸出。在某些實施例中,矽光子晶片界面區域係用以在矽光子晶片1803係與基板交界時將第一組光傳輸結構垂直耦合至矽光子晶片1803的對應光輸入。又,矽光子晶片界面區域係用以在矽光子晶片1803係與基板交界時將第二組光傳輸結構垂直耦合至矽光子晶片1803的對應光輸出。 In some embodiments, interposer device 1801/1801A/1801B/1801C includes local metal trace structures and conductive via structures formed within the substrate to provide electrical connections between silicon photonics chip 1803 and another electronic device interfacing with the substrate. In some embodiments, the silicon photonics chip interface region is used to flip-chip connect conductive structures within silicon photonics chip 1803 to corresponding conductive structures within the substrate. In some embodiments, the silicon photonics chip interface region is used to wire-bond conductive structures within silicon photonics chip 1803 to corresponding conductive structures within the substrate. In some embodiments, the silicon photonics chip interface region is configured to couple the edges of the first set of light-transmitting structures to the corresponding light inputs of the silicon photonics chip 1803 when the silicon photonics chip 1803 is interfaced with the substrate. Furthermore, the silicon photonics chip interface region is configured to couple the edges of the second set of light-transmitting structures to the corresponding light outputs of the silicon photonics chip 1803 when the silicon photonics chip 1803 is interfaced with the substrate. In some embodiments, the silicon photonics chip interface region is configured to vertically couple the first set of light-transmitting structures to the corresponding light inputs of the silicon photonics chip 1803 when the silicon photonics chip 1803 is interfaced with the substrate. Furthermore, the silicon photonic chip interface region is used to vertically couple the second set of light transmission structures to the corresponding light output of the silicon photonic chip 1803 when the silicon photonic chip 1803 interfaces with the substrate.
在某些實施例中,光放大器模組界面區域係用以在光放大器模組303-1-303-N係與基板交界時將第二組光傳輸結構邊緣耦合至光放大器模組303-1-303-N之對應光輸入及/或輸出。又,光放大器模組界面區域係用以在光放大器模組303-1-303-N係與基板交界時將第三組光傳輸結構邊緣耦合至光放大器模組303-1-303-N之對應光輸出及/或輸入。在某些實施例中,光放大器模組界面區域係用以在光放大器模組303-1-303-N係與基板交界時將第二組光傳輸結構垂直耦合至光放大器模組303-1-303-N之對應光輸入及/或輸出。又,光放大器模組界面區域係用以在光放大器模組303-1-303-N係與基板交界時將第三組光傳輸結構垂直耦合至光放大器模組303-1-303-N之對應光輸出及/或輸入。 In some embodiments, the optical amplifier module interface region is used to couple the edges of the second set of optical transmission structures to the corresponding optical inputs and/or outputs of the optical amplifier modules 303-1-303-N when the optical amplifier modules 303-1-303-N are interfaced with the substrate. Furthermore, the optical amplifier module interface region is used to couple the edges of the third set of optical transmission structures to the corresponding optical outputs and/or inputs of the optical amplifier modules 303-1-303-N when the optical amplifier modules 303-1-303-N are interfaced with the substrate. In some embodiments, the optical amplifier module interface region is used to vertically couple the second set of optical transmission structures to the corresponding optical inputs and/or outputs of the optical amplifier modules 303-1-303-N when the optical amplifier modules 303-1-303-N are interfaced with the substrate. Furthermore, the optical amplifier module interface region is used to vertically couple the third set of optical transmission structures to the corresponding optical outputs and/or inputs of the optical amplifier modules 303-1-303-N when the optical amplifier modules 303-1-303-N interface with the substrate.
在某些實施例中,基板係由矽、玻璃、陶瓷、環氧化物之複合材料、及聚合物中的一或多者所形成。在某些實施例中,第一組光傳輸結構係由矽、氧化物、聚合物及氮化矽中的一或多者所形成、第二組光傳輸結構係由矽、氧化物、聚合物及氮化矽中的一或多者所形成、第三組光傳輸結構係由矽、氧 化物、聚合物及氮化矽中的一或多者所形成。在某些實施例中,基板包含用以接收光放大器模組303-1-303-N的複數光放大器模組界面區域。又,第二組光傳輸結構係用以在矽光子晶片1803與複數光放大器模組303-1-303-N係與基板交界時將矽光子晶片1803光連接至複數光放大器模組303-1-303-N。又,第三組光傳輸結構係用以將複數光放大器模組303-1-303-N光連接至光纖對插入件之連接件1903區域。 In some embodiments, the substrate is formed from one or more of silicon, glass, ceramic, an epoxy composite, and a polymer. In some embodiments, the first set of optical transmission structures is formed from one or more of silicon, oxide, polymer, and silicon nitride; the second set of optical transmission structures is formed from one or more of silicon, oxide, polymer, and silicon nitride; and the third set of optical transmission structures is formed from one or more of silicon, oxide, polymer, and silicon nitride. In some embodiments, the substrate includes a plurality of optical amplifier module interface regions for receiving optical amplifier modules 303-1-303-N. Furthermore, the second set of optical transmission structures is used to optically connect silicon photonics chip 1803 to multiple optical amplifier modules 303-1-303-N when silicon photonics chip 1803 and multiple optical amplifier modules 303-1-303-N are interfaced with the substrate. Furthermore, the third set of optical transmission structures is used to optically connect multiple optical amplifier modules 303-1-303-N to the connector 1903 region of the fiber optic interposer.
在某些實施例中,雷射源晶片界面區域、矽光子晶片界面區域及光放大器模組界面區域係以實質上對稱之配置設置在基板內。在某些實施例中,雷射源晶片界面區域、矽光子晶片界面區域及光放大器模組界面區域係以非對稱配置設置在基板內。在某些實施例中,插入件裝置係整合於多晶片模組整合產品內。 In some embodiments, the laser source chip interface region, the silicon photonics chip interface region, and the optical amplifier module interface region are disposed in a substantially symmetrical configuration within the substrate. In some embodiments, the laser source chip interface region, the silicon photonics chip interface region, and the optical amplifier module interface region are disposed in an asymmetrical configuration within the substrate. In some embodiments, the interposer device is integrated into a multi-chip module integrated product.
在某些實施例中揭露多晶片模組(MCM)包含插入件裝置1801/1801A/1801B/1801C。MCM亦包含連接至插入件裝置1801/1801A/1801B/1801C的雷射源晶片102。MCM亦包含連接至插入件裝置1801/1801A/1801B/1801C的矽光子晶片1803。在某些實施例中,矽光子晶片1803為CMOS驅動晶片,用以與形成在插入件裝置1801/1801A/1801B/1801C內的矽光子裝置互動。MCM亦包含連接至插入件裝置1801/1801A/1801B/1801C的光放大器模組303-1-303-N。插入件裝置1801/1801A/1801B/1801C包含用以將雷射源晶片102光連接至矽光子晶片1803的第一組光傳輸結構(如光導1905、1907及/或光編排模組)。插入件裝置1801/1801A/1801B/1801C亦包含用以將矽光子晶片1803光連接至光放大器模組303-1-303-N的第二組光傳輸結構(如光導1909-1-1909-N)。插入件裝置1801/1801A/1801B/1801C亦包含用以將光放大器模組303-1-303-N光連接至形成在插入件裝置1801/1801A/1801B/1801C內之光纖對插入件之連接件1903區域的第三組光傳輸結構(如光導1915-1-1915-N、1911、 1913及/或極化旋轉器1901)。光纖對插入件之連接件1903係用以使複數光纖之核心光耦合至第三組光傳輸結構之對應光纖。在某些實施例中,機械傳輸套圈2301/2303係連接至插入件裝置1801/1801A/1801B/1801C。機械傳輸套圈2301/2303係用以成為光纖對插入件之連接件1903區域之框並將光纖對插入件之連接件1903區域針對複數光纖加以分度。 In some embodiments, a multi-chip module (MCM) is disclosed that includes an interposer device 1801/1801A/1801B/1801C. The MCM also includes a laser source chip 102 connected to the interposer device 1801/1801A/1801B/1801C. The MCM also includes a silicon photonics chip 1803 connected to the interposer device 1801/1801A/1801B/1801C. In some embodiments, the silicon photonics chip 1803 is a CMOS driver chip that interacts with the silicon photonic devices formed within the interposer device 1801/1801A/1801B/1801C. The MCM also includes optical amplifier modules 303-1-303-N connected to interposer devices 1801/1801A/1801B/1801C. Interposer devices 1801/1801A/1801B/1801C include a first set of optical transmission structures (e.g., light guides 1905, 1907 and/or an optical orchestration module) for optically connecting the laser source chip 102 to the silicon photonics chip 1803. Interposer devices 1801/1801A/1801B/1801C also include a second set of optical transmission structures (e.g., light guides 1909-1-1909-N) for optically connecting the silicon photonics chip 1803 to the optical amplifier modules 303-1-303-N. Interposer device 1801/1801A/1801B/1801C also includes a third set of optical transmission structures (e.g., light guides 1915-1-1915-N, 1911, 1913, and/or polarization rotator 1901) for optically connecting optical amplifier modules 303-1-303-N to a fiber-to-interposer connector 1903 region formed within interposer device 1801/1801A/1801B/1801C. Fiber-to-interposer connector 1903 couples core optical signals from a plurality of optical fibers to corresponding optical fibers within the third set of optical transmission structures. In some embodiments, the mechanical transmission ferrule 2301/2303 is connected to the insert device 1801/1801A/1801B/1801C. The mechanical transmission ferrule 2301/2303 is used to frame the fiber-to-insert connector 1903 area and index the fiber-to-insert connector 1903 area for multiple optical fibers.
在某些實施例中,雷射源晶片102係藉由覆晶連接或打線接合連接而連接至插入件裝置1801/1801A/1801B/1801C。在某些實施例中,雷射源晶片102係用以產生及輸出複數具有不同波長之雷射光束。在某些實施例中,第一組光傳輸結構包含光編排模組,光編排模組係用以自雷射源晶片102接收複數雷射光束並將複數雷射光束結合為一多波長雷射光源並將多波長雷射光源之一部分傳輸至矽光子晶片1803之複數雷射光之光輸入口之每一者。在某些實施例中,光編排模組包含具有光輸出之Nx1相維持波長結合器701,光輸出光連接至1xM相維持寬頻功率分割器705之光輸入,其中N為複數雷射光束之數目而M為矽光子晶片1803之該複數雷射光之光輸入口的數目。在某些實施例中,光編排模組包含陣列式波導801,陣列式波導801具有用以接收複數雷射光束的複數光輸入且具有光連接至寬頻功率分割器805之光輸入的光輸出。寬頻功率分割器805具有複數光輸出,複數光輸出係用以將光傳輸至矽光子晶片1803的該複數雷射光之光輸入口。 In some embodiments, laser source chip 102 is connected to interposer device 1801/1801A/1801B/1801C via flip-chip or wire bonding. In some embodiments, laser source chip 102 is configured to generate and output multiple laser beams having different wavelengths. In some embodiments, the first set of optical transmission structures includes an optical arrangement module that receives the multiple laser beams from laser source chip 102, combines the multiple laser beams into a multi-wavelength laser light source, and transmits a portion of the multi-wavelength laser light source to each of the multiple laser light input ports of silicon photonics chip 1803. In some embodiments, the optical orchestration module includes an Nx1 phase-maintaining wavelength combiner 701 having an optical output, which is optically connected to the optical input of a 1xM phase-maintaining broadband power divider 705, where N is the number of laser beams and M is the number of laser beam optical inputs of the silicon photonics chip 1803. In some embodiments, the optical orchestration module includes an arrayed waveguide 801 having a plurality of optical inputs for receiving the plurality of laser beams and an optical output optically connected to the optical input of the broadband power divider 805. The broadband power divider 805 has a plurality of optical outputs for transmitting light to the laser beam optical inputs of the silicon photonics chip 1803.
在某些實施例中,光編排模組包含階梯光柵901,階梯光柵901具有用以接收複數雷射光束的複數光輸入且具有光連接至寬頻功率分割器905之光輸入之光輸出。寬頻功率分割器905具有複數光輸出,複數光輸出係用以將光傳輸至矽光子晶片1803的該複數雷射光之光輸入口。在某些實施例中,光編排模組包含蝶形波導網路1001,蝶形波導網路1001具有用以接收複數雷射光束的複數光輸入且具有用以將光傳輸至矽光子晶片1803之該複數雷射光之光輸 入口的複數光輸出。在某些實施例中,光編排模組包含星形耦合器1101,星形耦合器1101具有用以接收複數雷射光束的複數光輸入且具有用以將光傳輸至矽光子晶片1803之該複數雷射光之光輸入口的複數光輸出。在某些實施例中,光編排模組包含諧振環陣列,諧振環陣列具有用以接收複數雷射光束的複數光輸入且具有用以將光傳輸至矽光子晶片1803之該複數雷射光之光輸入口的複數光輸出。 In some embodiments, the optical orchestration module includes a step grating 901 having a plurality of optical inputs for receiving a plurality of laser beams and an optical output optically connected to an optical input of a broadband power divider 905. Broadband power divider 905 has a plurality of optical outputs for transmitting light to the optical inputs of the plurality of laser beams of silicon photonics chip 1803. In some embodiments, the optical orchestration module includes a butterfly waveguide network 1001 having a plurality of optical inputs for receiving a plurality of laser beams and a plurality of optical outputs for transmitting light to the optical inputs of the plurality of laser beams of silicon photonics chip 1803. In some embodiments, the optical orchestration module includes a star coupler 1101 having a plurality of optical inputs for receiving a plurality of laser beams and a plurality of optical outputs for transmitting light to the optical inputs of the plurality of laser beams of the silicon photonics chip 1803. In some embodiments, the optical orchestration module includes a resonant ring array having a plurality of optical inputs for receiving a plurality of laser beams and a plurality of optical outputs for transmitting light to the optical inputs of the plurality of laser beams of the silicon photonics chip 1803.
在某些實施例中,光放大器模組303-1-303-N係藉由覆晶連接或接線接合連接而連接至插入件裝置1801/1801A/1801B/1801C。在某些實施例中,光放大器模組303-1-303-N包含複數光放大器305-1-305-M,俾使數據接收用之每一光訊號係受到光放大器305-1-305-M中之一對應者放大並俾使數據傳輸用之每一光訊號係受到光放大器305-1-305-M中之一對應者放大。在某些實施例中,插入件裝置1801/1801A/1801B/1801C包含用以使光導彼此光隔絕的整合型光隔絕器。在某些實施例中,MCM包含極化旋轉器1901,極化旋轉器1901係用以自光纖對插入件之連接件1903區域接收輸入光並將輸入光之TE與TM極化兩者分割為TE極化。極化旋轉器1901係光連接至兩個對應的光導1913,光導1913係用以將來自於極化旋轉器1901的光引導至光放大器模組303-1-303-N。在某些實施例中,極化旋轉器1901為與插入件裝置1801/1801A/1801B/1801C交界的離散元件。在某些實施例中,極化旋轉器1901係形成於插入件裝置1801/1801A/1801B/1801C內。 In some embodiments, optical amplifier modules 303-1-303-N are connected to interposer devices 1801/1801A/1801B/1801C via flip-chip or wire-bond connections. In some embodiments, optical amplifier modules 303-1-303-N include a plurality of optical amplifiers 305-1-305-M, such that each optical signal for data reception is amplified by a corresponding one of the optical amplifiers 305-1-305-M, and each optical signal for data transmission is amplified by a corresponding one of the optical amplifiers 305-1-305-M. In some embodiments, interposer devices 1801/1801A/1801B/1801C include integrated optical isolators for optically isolating light guides from one another. In some embodiments, the MCM includes a polarization rotator 1901. Polarization rotator 1901 receives input light from the fiber-pair interposer connector 1903 and splits the input light's TE and TM polarizations into TE polarization. Polarization rotator 1901 is optically connected to two corresponding light guides 1913, which guide light from polarization rotator 1901 to optical amplifier modules 303-1-303-N. In some embodiments, polarization rotator 1901 is a discrete component that interfaces with interposer devices 1801/1801A/1801B/1801C. In some embodiments, polarization rotator 1901 is formed within insert device 1801/1801A/1801B/1801C.
在某些實施例中,插入件裝置1801/1801A/1801B/1801C包含凹陷區域,雷射源晶片102係設置於凹陷區域中以使雷射源晶片102內的光導光學邊緣耦合至插入件裝置1801/1801A/1801B/1801C內之第一組光傳輸結構內的對應光導。在某些實施例中,雷射源晶片102內的光導係設置在插入件裝置1801/1801A/1801B/1801℃內之第一組光傳輸結構內之對應光導的10微米內。在 某些實施例中,凹陷區域包含側突出物,側突出物形成底填材料(如環氧化物)的儲槽以致使雷射源晶片102的毛細底填。在某些實施例中,雷射源晶片102係設置在插入件裝置1801/1801A/1801B/1801C的外表面上俾使雷射源晶片102內的光導係垂直耦合至插入件裝置1801/1801A/1801B/1801C內之第一組光傳輸結構的對應光導。 In some embodiments, the interposer device 1801/1801A/1801B/1801C includes a recessed region within which the laser source chip 102 is positioned so that the optical edge of a lightguide within the laser source chip 102 is coupled to a corresponding lightguide within the first set of light transmission structures within the interposer device 1801/1801A/1801B/1801C. In some embodiments, the lightguide within the laser source chip 102 is positioned within 10 microns of the corresponding lightguide within the first set of light transmission structures within the interposer device 1801/1801A/1801B/1801C. In some embodiments, the recessed region includes side protrusions that form a reservoir for an underfill material (e.g., epoxy) to provide a capillary underfill of the laser source chip 102. In some embodiments, the laser source chip 102 is disposed on an outer surface of the interposer device 1801/1801A/1801B/1801C such that the light guides within the laser source chip 102 are vertically coupled to corresponding light guides within the first set of light transmission structures within the interposer device 1801/1801A/1801B/1801C.
在某些實施例中,插入件裝置包含凹陷區域,光子晶片1803係設置於凹陷區域中以使光子晶片1803內的光導光學邊緣耦合至形成在插入件裝置1801/1801A/1801B/1801C內之第一組光傳輸結構與第二組光傳輸結構內的對應光導。在某些實施例中,凹陷區域包含側突出物,側突出物形成底填材料(如環氧化物)的儲槽以致使矽光子晶片1803的毛細底填。在某些實施例中,矽光子晶片1803內的光導係設置在形成在插入件裝置1801/1801A/1801B/1801C內之第一組光傳輸結構與第二組光傳輸結構內的對應光導的10微米內。在某些實施例中,矽光子晶片1803插入件裝置1801/1801A/1801B/1801C的外表面上俾使矽光子晶片1803內的光導係垂直耦合至形成在插入件裝置1801/1801A/1801B/1801C內之第一組光傳輸結構與第二組光傳輸結構內的對應光導。 In some embodiments, the interposer device includes a recessed region, and the photonics chip 1803 is disposed in the recessed region so that the optical edges of the lightguides in the photonics chip 1803 are coupled to the corresponding lightguides in the first and second sets of light-transmitting structures formed in the interposer device 1801/1801A/1801B/1801C. In some embodiments, the recessed region includes side protrusions that form a reservoir for an underfill material (e.g., epoxy) to provide a capillary underfill of the silicon photonics chip 1803. In some embodiments, the lightguides in the silicon photonics chip 1803 are disposed within 10 microns of the corresponding lightguides in the first and second sets of light-transmitting structures formed in the interposer device 1801/1801A/1801B/1801C. In some embodiments, the silicon photonics chip 1803 is formed on an outer surface of the interposer device 1801/1801A/1801B/1801C such that the light guides within the silicon photonics chip 1803 are vertically coupled to corresponding light guides within the first and second sets of light transmission structures formed within the interposer device 1801/1801A/1801B/1801C.
在某些實施例中,插入件裝置1801/1801A/1801B/1801C包含凹陷區域,光放大器模組303-1-303-N係設置於凹陷區域中以使光放大器模組303-1-303-N內的光導光學邊緣耦合至形成在插入件裝置1801/1801A/1801B/1801C內之第二組光傳輸結構與第三組光傳輸結構內的對應光導。在某些實施例中,凹陷區域包含側突出物,側突出物形成底填材料(如環氧化物)的儲槽以致使光放大器模組303-1-303-N的毛細底填。在某些實施例中,光放大器模組303-1-303-N內之光導係位於形成在插入件裝置1801/1801A/1801B/1801C內之第二組光傳輸結構與第三組光傳輸結構內的對應光導的10微米內。在某些實施例中,光放大器模組303-1-303-N係設置在插入 件裝置1801/1801A/1801B/1801C的外表面上俾使光放大器模組303-1-303-N內的光導係垂直耦合至形成在插入件裝置1801/1801A/1801B/1801C內之第二組光傳輸結構與第三組光傳輸結構內的對應光導。 In some embodiments, interposer device 1801/1801A/1801B/1801C includes a recessed region, and optical amplifier modules 303-1-303-N are disposed within the recessed region such that optical edges of lightguides within optical amplifier modules 303-1-303-N are coupled to corresponding lightguides within the second and third sets of light transmission structures formed within interposer device 1801/1801A/1801B/1801C. In some embodiments, the recessed region includes side protrusions that form a reservoir for an underfill material (e.g., epoxy) to provide a capillary underfill for optical amplifier modules 303-1-303-N. In some embodiments, the light guides within optical amplifier modules 303-1-303-N are located within 10 microns of corresponding light guides within the second and third sets of optical transmission structures within interposer devices 1801/1801A/1801B/1801C. In some embodiments, optical amplifier modules 303-1-303-N are disposed on an outer surface of interposer devices 1801/1801A/1801B/1801C such that the light guides within optical amplifier modules 303-1-303-N are vertically coupled to the corresponding light guides within the second and third sets of optical transmission structures within interposer devices 1801/1801A/1801B/1801C.
在某些實施例中,揭露一種機械傳輸(MT)套圈。MT套圈包含具有上對準鑰(2305)的上半構件(2301)。MT套圈亦包含具有下對準鑰(2305)的下半構件(2303)。上與下對準鑰(2305)係用以彼此適配以提供上半構件(2301)與下半構件(2303)的對準與適配。上半構件(2301)及下半構件(2303)中的每一者係用以接收上半構件(2301)與下半構件(2303)之間之插入件裝置1801/1801A/1801B/1801C的外緣部,俾以在上半構件(2301)適配至下半構件(2303)時使在插入件裝置1801/1801A/1801B/1801C之外緣部之邊緣處裸露的光導在上半構件(2301)與下構件(2303)之間的一位置處受到裸露。在某些實施例中,上半構件(2301)與下半構件(2303)係由矽、玻璃或塑膠所形成。在某些實施例中,上半構件(2301)包含至少一上部分孔(2307)而下半構件(2303)包含至少一下部分孔(2309)。至少一上部分孔(2307)與至少一下部分孔(2309)係用以在上半構件(2301)與下半構件(2303)適配且插入件裝置(1801/1801A/1801B/1801C)之外緣部係介於上半構件(2301)與下半構件(2303)之間時分別形成至少一完全對準孔洞(見圖23F)。至少一對準孔洞係用以提供MT套圈與另一連接器結構的對準。 In certain embodiments, a mechanical transmission (MT) ferrule is disclosed. The MT ferrule includes an upper half (2301) having an upper alignment key (2305). The MT ferrule also includes a lower half (2303) having a lower alignment key (2305). The upper and lower alignment keys (2305) are adapted to mate with each other to provide alignment and fit between the upper half (2301) and the lower half (2303). Each of the upper and lower half members 2301 and 2303 is configured to receive an outer edge of the insert device 1801/1801A/1801B/1801C between the upper and lower half members 2301 and 2303, so that when the upper and lower half members 2301 are fitted to the lower half member 2303, the light guide exposed at the edge of the outer edge of the insert device 1801/1801A/1801B/1801C is exposed at a position between the upper and lower half members 2301 and 2303. In some embodiments, the upper and lower half members 2301 and 2303 are formed of silicon, glass, or plastic. In some embodiments, the upper half (2301) includes at least one upper hole (2307) and the lower half (2303) includes at least one lower hole (2309). The at least one upper hole (2307) and the at least one lower hole (2309) are configured to form at least one fully aligned hole (see FIG. 23F ) when the upper half (2301) and the lower half (2303) are mated and the outer edge of the insert device (1801/1801A/1801B/1801C) is located between the upper half (2301) and the lower half (2303). The at least one alignment hole is configured to provide alignment between the MT ferrule and another connector structure.
圖27顯示根據本發明之某些實施例之多晶片模組(MCM)的製造方法的流程圖。方法包含操作2701,提供插入件裝置(1801/1801A/1801B/1801C)。方法亦包含操作2703,將雷射源晶片(102)連接至插入件裝置(1801/1801A/1801B/1801C)。方法亦包含操作2705,將矽光子晶片(1803)連接至插入件裝置(1801/1801A/1801B/1801C)。方法亦包含2707,將光放大器模組(303-1-303-N)連接至插入件裝置(1801/1801A/1801B/1801C)。插入件裝置(1801/1801A/1801B/1801C)包含用以將雷射源晶片(102)光連接至矽光子晶片 (1803)的第一組光傳輸結構。插入件裝置(1801/1801A/1801B/1801C)包含包含用以將矽光子晶片(1803)光連接至光放大器模組(303-1-303-N)的第二組光傳輸結構。插入件裝置(1801/1801A/1801B/1801C)包含第三組光傳輸結構,第三組光傳輸結構係用以將光放大器模組(303-1-303-N)光連接形成在插入件裝置(1801/1801A/1801B/1801C)內的光纖對插入件連接(1903)區域。在某些實施例中,方法包含用以將機械傳輸套圈(2301/2303)連接至插入件裝置(1801/1801A/1801B/1801C)俾使機械傳輸套圈(2301/2303)形成光纖對插入件之連接件(1903)區域之框且將光纖對插入件之連接件(1903)區域分度以連接至複數光纖的操作。 FIG27 is a flow chart illustrating a method for fabricating a multi-chip module (MCM) according to certain embodiments of the present invention. The method includes operation 2701, providing an interposer device (1801/1801A/1801B/1801C). The method also includes operation 2703, connecting a laser source chip (102) to the interposer device (1801/1801A/1801B/1801C). The method also includes operation 2705, connecting a silicon photonic chip (1803) to the interposer device (1801/1801A/1801B/1801C). The method also includes operation 2707, connecting an optical amplifier module (303-1-303-N) to the interposer device (1801/1801A/1801B/1801C). The interposer device (1801/1801A/1801B/1801C) includes a first set of optical transmission structures for optically connecting the laser source chip (102) to the silicon photonic chip (1803). The interposer device (1801/1801A/1801B/1801C) includes a second set of optical transmission structures for optically connecting the silicon photonic chip (1803) to the optical amplifier module (303-1-303-N). The insert device (1801/1801A/1801B/1801C) includes a third set of optical transmission structures, which are used to optically connect the optical amplifier modules (303-1-303-N) to the optical fiber to insert connection (1903) area within the insert device (1801/1801A/1801B/1801C). In some embodiments, the method includes operations for connecting a mechanical transmission ferrule (2301/2303) to an insert device (1801/1801A/1801B/1801C) such that the mechanical transmission ferrule (2301/2303) frames a fiber-to-insert connector (1903) region and indexing the fiber-to-insert connector (1903) region for connection to a plurality of optical fibers.
在某些實施例中,方法包含形成插入件裝置(1801/1801A/1801B/1801C)內之局部金屬路線結構及導電通孔結構以在矽光子晶片(1803)及與插入件裝置(1801/1801A/1801B/1801C)交界之另一電子裝置之間提供電連接。在某些實施例中,雷射源晶片(102)係藉由覆晶連接或打線接合連接而連接至插入件裝置(1801/1801A/1801B/1801C)。在某些實施例中,矽光子晶片(1803)係藉由覆晶連接或打線接合連接而連接至插入件裝置(1801/1801A/1801B/1801C)。在某些實施例中,光放大器模組(303-1-303-N)係藉由覆晶連接或打線接合連接而連接至插入件裝置(1801/1801A/1801B/1801C)。 In some embodiments, the method includes forming local metal routing structures and conductive via structures within the interposer device (1801/1801A/1801B/1801C) to provide electrical connections between the silicon photonics chip (1803) and another electronic device interfacing with the interposer device (1801/1801A/1801B/1801C). In some embodiments, the laser source chip (102) is connected to the interposer device (1801/1801A/1801B/1801C) by a flip-chip connection or a wire-bonding connection. In some embodiments, the silicon photonics chip (1803) is connected to the interposer device (1801/1801A/1801B/1801C) by a flip-chip connection or a wire-bonding connection. In some embodiments, the optical amplifier module (303-1-303-N) is connected to the interposer device (1801/1801A/1801B/1801C) via flip chip connection or wire bonding connection.
在某些實施例中,方法包含形成第一組光傳輸結構以包含光編排模組,光編排模組係用以自雷射源晶片(102)接收複數雷射光束、將複數雷射光束結合成為一多波長雷射光源、並將多波長雷射光源的一部分傳輸至矽光子晶片(1803)之複數雷射光之光輸入口中的每一者。在某些實施例中,方法包含在插入件裝置(1801/1801A/1801B/1801C)內形成整合式光隔絕件以使插入件裝置(1801/1801A/1801B/1801C)內的光導彼此隔絕。在某些實施例中,方法包含光連接光纖對插入件之連接件(1903)區域與光放大器模組(303-1-303-N)之間的極化 旋轉器(1901)。極化旋轉器(1901)係用以自光纖對插入件之連接件(1903)區域接收光輸入並將輸入光的TE與TM極化兩者分割為TE極化。極化旋轉器(1901)係光連接至兩個對應的光導(1913),光導(1913)係用以將來自極化旋轉器(1901)的光引導至光放大器模組(303-1-303-N)。在某些實施例中,極化旋轉器(1901)為與插入件裝置(1801/1801A/1801B/1801C)交界的離散元件。在某些實施例中,極化旋轉器(1901)係形成於插入件裝置(1801/1801A/1801B/1801C)內。 In some embodiments, the method includes forming a first set of optical transmission structures to include an optical arrangement module configured to receive a plurality of laser beams from a laser source chip (102), combine the plurality of laser beams into a multi-wavelength laser light source, and transmit a portion of the multi-wavelength laser light source to each of the plurality of laser light input ports of a silicon photonics chip (1803). In some embodiments, the method includes forming an integrated optical isolator within the interposer device (1801/1801A/1801B/1801C) to isolate light guides within the interposer device (1801/1801A/1801B/1801C) from each other. In some embodiments, the method includes optically connecting a polarization rotator (1901) between a connector (1903) region of an optical fiber pair insert and an optical amplifier module (303-1-303-N). The polarization rotator (1901) is configured to receive light input from the connector (1903) region of the optical fiber pair insert and split the TE and TM polarizations of the input light into TE polarization. The polarization rotator (1901) is optically connected to two corresponding light guides (1913), which are configured to guide light from the polarization rotator (1901) to the optical amplifier module (303-1-303-N). In some embodiments, the polarization rotator (1901) is a discrete component that interfaces with the insert device (1801/1801A/1801B/1801C). In some embodiments, the polarization rotator (1901) is formed within the insert device (1801/1801A/1801B/1801C).
在某些實施例中,方法包含在插入件裝置(1801/1801A/1801B/1801C)內形成凹陷區域以接收雷射源晶片(102)。在某些實施例中,凹陷區域係用以使雷射源晶片(102)內的光導光學邊緣耦合至第一組光傳輸結構內的對應光導。在某些實施例中,將雷射源晶片(102)連接至插入件裝置(1801/1801A/1801B/1801C)包含將雷射源晶片(102)設置於形成在插入件裝置(1801/1801A/1801B/1801C)內之第一組光傳輸結構內之對應光導的10微米內。在某些實施例中,凹陷區域係形成而包含側突出物,側突出物形成底填材料(如環氧化物)的儲槽以致使雷射源晶片(102)的毛細底填。在某些實施例中,將雷射源晶片(102)連接至插入件裝置(1801/1801A/1801B/1801C)包含將雷射源晶片(102)設置在插入件裝置(1801/1801A/1801B/1801C)的外表面上俾使雷射源晶片(102)內的光導係垂直耦合至第一組光傳輸結構的對應光導。 In some embodiments, the method includes forming a recessed region in an interposer device (1801/1801A/1801B/1801C) to receive a laser source chip (102). In some embodiments, the recessed region is configured to couple an optical edge of a light guide in the laser source chip (102) to a corresponding light guide in a first set of light transmission structures. In some embodiments, connecting the laser source chip (102) to the interposer device (1801/1801A/1801B/1801C) includes positioning the laser source chip (102) within 10 microns of a corresponding light guide in the first set of light transmission structures formed in the interposer device (1801/1801A/1801B/1801C). In some embodiments, the recessed area is formed to include side protrusions, the side protrusions forming a reservoir for an underfill material (e.g., epoxy) to provide a fine underfill of the laser source chip (102). In some embodiments, connecting the laser source chip (102) to the interposer device (1801/1801A/1801B/1801C) includes positioning the laser source chip (102) on an outer surface of the interposer device (1801/1801A/1801B/1801C) such that a light guide within the laser source chip (102) is vertically coupled to a corresponding light guide of the first set of light transmission structures.
在某些實施例中,方法包含在插入件裝置(1801/1801A/1801B/1801C)內形成凹陷區域以接收矽光子晶片(1803)。在某些實施例中,凹陷區域係用以使矽光子晶片(1803)內的光導光學邊緣耦合至形成在插入件裝置(1801/1801A/1801B/1801C)內之第一組光傳輸結構與第二組光傳輸結構內的對應光導。在某些實施例中,將矽光子晶片(1803)連接至插入件裝置(1801/1801A/1801B/1801C)包含將矽光子晶片(102)設置在形成在插入件裝置(1801/1801A/1801B/1801C)內之第一組光傳輸結構與第二組光傳輸結構內的對 應光導的10微米內。在某些實施例中,凹陷區域係形成而包含側突出物,側突出物形成底填材料(如環氧化物)的儲槽以致使矽光子晶片(1803)的毛細底填。在某些實施例中,將矽光子晶片(1803)連接至插入件裝置(1801/1801A/1801B/1801C)包含將矽光子晶片(1803)設置在插入件裝置(1801/1801A/1801B/1801C)的外表面上俾使矽光子晶片(1803)內的光導係垂直耦合至形成在插入件裝置(1801/1801A/1801B/1801C)內之第一組光傳輸結構與第二組光傳輸結構內的對應光導。 In some embodiments, the method includes forming a recessed region in an interposer device (1801/1801A/1801B/1801C) to receive a silicon photonics chip (1803). In some embodiments, the recessed region is configured to couple optical edges of light guides in the silicon photonics chip (1803) to corresponding light guides in a first set of light transmission structures and a second set of light transmission structures formed in the interposer device (1801/1801A/1801B/1801C). In some embodiments, connecting the silicon photonics chip (1803) to the interposer device (1801/1801A/1801B/1801C) includes positioning the silicon photonics chip (102) within 10 microns of corresponding light guides within a first set of light transmission structures and a second set of light transmission structures formed within the interposer device (1801/1801A/1801B/1801C). In some embodiments, a recessed region is formed to include side protrusions, the side protrusions forming a reservoir for an underfill material (e.g., epoxy) to provide a capillary underfill of the silicon photonics chip (1803). In some embodiments, connecting the silicon photonics chip (1803) to the interposer device (1801/1801A/1801B/1801C) includes positioning the silicon photonics chip (1803) on an outer surface of the interposer device (1801/1801A/1801B/1801C) such that light guides within the silicon photonics chip (1803) are vertically coupled to corresponding light guides within a first set of light transmission structures and a second set of light transmission structures formed within the interposer device (1801/1801A/1801B/1801C).
在某些實施例中,方法包含在插入件裝置(1801/1801A/1801B/1801C)內形成凹陷區域以接收光放大器模組(303-1-303-N)。在某些實施例中,凹陷區域係用以使光放大器模組(303-1-303-N)內的光導光學邊緣耦合至形成在插入件裝置(1801/1801A/1801B/1801C)內之第二組光傳輸結構與第三組光傳輸結構內的對應光導。在某些實施例中,將光放大器模組(303-1-303-N)連接至插入件裝置(1801/1801A/1801B/1801C)包含將光放大器模組(303-1-303-N)設置在插入件裝置(1801/1801A/1801B/1801C)內之第二組光傳輸結構與第三組光傳輸結構內的對應光導的10微米內。在某些實施例中,凹陷區域係形成而包含側突出物,側突出物形成底填材料(如環氧化物)的儲槽以致使光放大器模組(303-1-303-N)的毛細底填。在某些實施例中,將光放大器模組(303-1-303-N)連接至插入件裝置(1801/1801A/1801B/1801C)包含將光放大器模組(303-1-303-N)設置在插入件裝置(1801/1801A/1801B/1801C)的外表面上俾使光放大器模組(303-1-303-N)內的光導係垂直耦合至形成在插入件裝置(1801/1801A/1801B/1801C)內之第二組光傳輸結構與第三組光傳輸結構內的對應光導。 In some embodiments, the method includes forming a recessed region in the interposer device (1801/1801A/1801B/1801C) to receive the optical amplifier module (303-1-303-N). In some embodiments, the recessed region is configured to couple optical edges of light guides in the optical amplifier module (303-1-303-N) to corresponding light guides in the second and third sets of light transmission structures formed in the interposer device (1801/1801A/1801B/1801C). In some embodiments, connecting the optical amplifier module (303-1-303-N) to the interposer device (1801/1801A/1801B/1801C) includes positioning the optical amplifier module (303-1-303-N) within 10 microns of corresponding light guides within the second set of optical transmission structures and the third set of optical transmission structures within the interposer device (1801/1801A/1801B/1801C). In some embodiments, a recessed region is formed to include side protrusions, the side protrusions forming a reservoir for an underfill material (e.g., epoxy) to provide a capillary underfill of the optical amplifier module (303-1-303-N). In some embodiments, connecting the optical amplifier module (303-1-303-N) to the interposer device (1801/1801A/1801B/1801C) includes positioning the optical amplifier module (303-1-303-N) on an outer surface of the interposer device (1801/1801A/1801B/1801C) such that a light guide within the optical amplifier module (303-1-303-N) is vertically coupled to corresponding light guides within a second set of optical transmission structures and a third set of optical transmission structures formed within the interposer device (1801/1801A/1801B/1801C).
前面的實施例內容係提供用於例示及說明。其並非意在窮盡或限制本發明。一特定實施例之獨立元件或特徵大致上並不限於此特定實施例,而 是即便在文中未特別顯示或說明的狀況下仍可應用、互換、使用於其他選定的實施例中。其亦可以許多方式變化之。此類變化不會被視為是脫離本發明,所有此類修改意在被包含於本發明之範疇內。 The foregoing embodiments are provided for purposes of illustration and description. They are not intended to be exhaustive or to limit the present invention. Individual elements or features of a particular embodiment are generally not limited to that particular embodiment and may be applied, interchangeable, or used in other selected embodiments, even if not specifically shown or described herein. They may also be modified in many ways. Such variations are not to be considered a departure from the present invention, and all such modifications are intended to be included within the scope of the present invention.
雖然前面已詳細地說明本發明以提供全面瞭解,但應瞭解,仍可實施某些變化與修改。因此,本發明之實施例應被視為是說明性而非限制性且本發明不應被限制至文中所提供的特定細節而是在本發明實施例的範疇與等效物內可進行修改。 Although the present invention has been described in detail to provide a thorough understanding, it should be understood that certain variations and modifications are possible. Therefore, the present embodiments should be considered as illustrative rather than restrictive, and the present invention should not be limited to the specific details provided herein, but rather may be modified within the scope and equivalents of the present embodiments.
2701:操作 2703:操作 2705:操作 2707:操作 2701: Operation 2703: Operation 2705: Operation 2707: Operation
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| US62/589,520 | 2017-11-21 | ||
| US16/194,250 US10749603B2 (en) | 2016-07-14 | 2018-11-16 | Laser module for optical data communication system within silicon interposer |
| US16/194,250 | 2018-11-16 |
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