TWI895699B - Cache device and operation method thereof - Google Patents
Cache device and operation method thereofInfo
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Abstract
Description
本發明是有關於一種記憶體裝置,且特別是有關於一種快取裝置。The present invention relates to a memory device, and more particularly to a cache device.
動態隨機存取記憶體(DRAM)對於電腦階層架構是一重要的記憶體裝置,其具有可以提供快速存取速度、隨機存取特徵、高密度等等的特性。但是,在大數據領域,DRAM和處理器之間的頻寬、資料流通率(data throughput)、延遲(latency)可能會成為計算效能的瓶頸。Dynamic random access memory (DRAM) is a crucial memory device in computer hierarchical architecture, offering fast access speeds, random access characteristics, and high density. However, in the big data space, the bandwidth, data throughput, and latency between DRAM and processors can become bottlenecks in computing performance.
DRAM元件的獨立性特徵(standalone feature)帶來高密度與低成本的好處,但是DRAM元件與處理器之間的距離也造成效能瓶頸。The standalone feature of DRAM components brings the advantages of high density and low cost, but the distance between DRAM components and processors also creates a performance bottleneck.
因此,在此技術領域會有快速、低延遲和高密度記憶體的需求。但是,DRAM元件的製程與先進邏輯製成並不相容。此外,以SRAM來提供大記憶體容量也是相當昂貴。嵌入式DRAM或新穎的L3/L4快取在此領域一直是關注的焦點。Therefore, there is a demand for fast, low-latency, and high-density memory in this technology space. However, the manufacturing process for DRAM components is incompatible with advanced logic. Furthermore, using SRAM to provide large memory capacities is also quite expensive. Embedded DRAM or the emerging L3/L4 cache have been the focus of attention in this field.
基於上述說明,根據本發明實施方式,提供一種快取裝置,其包括第一電晶體、反相器與第二電晶體。第一電晶體具有控制端、第一端與第二端,其中第一電晶體的第一端耦接到輸入電壓,第一電晶體的所述第二端耦接到儲存節點。反相器具有輸入端與輸出端,其中輸入端耦接到儲存節點。第二電晶體具有控制端、第一端與第二端,其中第二電晶體的第一端耦接反相器的輸出端,第二電晶體的第二端用以輸出讀取電壓。Based on the above description, according to an embodiment of the present invention, a cache device is provided, comprising a first transistor, an inverter, and a second transistor. The first transistor has a control terminal, a first terminal, and a second terminal, wherein the first terminal of the first transistor is coupled to an input voltage, and the second terminal of the first transistor is coupled to a storage node. The inverter has an input terminal and an output terminal, wherein the input terminal is coupled to the storage node. The second transistor has a control terminal, a first terminal, and a second terminal, wherein the first terminal of the second transistor is coupled to the output terminal of the inverter, and the second terminal of the second transistor is used to output a read voltage.
根據本發明另一實施方式,提供一種快取裝置的操作方法。快取裝置包括第一電晶體、反相器與第二電晶體。第一電晶體具有控制端、第一端與第二端,其中第一端耦接到輸入電壓,第二端耦接到儲存節點。反相器具有輸入端與輸出端,其中輸入端耦接到儲存節點。第二電晶體具有控制端、第一端與第二端,其中第一端耦接反相器的輸出端,第二端用以輸出讀取電壓。快取裝置的操作方法包括:在寫入期間,將第一電晶體導通,且將第二電晶體關閉,使輸入電壓儲存於儲存節點;在讀取期間,將第一電晶體關閉,且將第二電晶體導通,經由第二電晶體的第二端將反相器的輸出端的電壓輸出作為輸出電壓。According to another embodiment of the present invention, a method for operating a cache device is provided. The cache device includes a first transistor, an inverter, and a second transistor. The first transistor has a control terminal, a first terminal, and a second terminal, wherein the first terminal is coupled to an input voltage and the second terminal is coupled to a storage node. The inverter has an input terminal and an output terminal, wherein the input terminal is coupled to the storage node. The second transistor has a control terminal, a first terminal, and a second terminal, wherein the first terminal is coupled to the output terminal of the inverter and the second terminal is used to output a read voltage. The operating method of the cache device includes: during a write period, turning on the first transistor and turning off the second transistor so that the input voltage is stored in the storage node; during a read period, turning off the first transistor and turning on the second transistor so that the voltage at the output end of the inverter is output as the output voltage through the second end of the second transistor.
圖1是根據本發明實施例所例示的一種快取陣列架構是意圖。如圖1所示,快取陣列10包括多個排成陣列架構的快取裝置100。快取陣列10包括多條寫入字元線WWL0~WWLi、多條寫入位元線WBL0~WBLj、多條讀取字元線RWL0~RWLi、多條讀取位元線RBL0~RBLj。在此,寫入與讀取字元線以3條(i=3)為例,寫入與讀取位元線以2條(j=2)為例,但在實施上不以此為限。FIG1 is a schematic diagram illustrating a cache array architecture according to an embodiment of the present invention. As shown in FIG1 , cache array 10 includes a plurality of cache devices 100 arranged in an array configuration. Cache array 10 comprises a plurality of write word lines WWL0-WWLi, a plurality of write bit lines WBL0-WBLj, a plurality of read word lines RWL0-RWLi, and a plurality of read bit lines RBL0-RBLj. Here, three write and read word lines (i=3) and two write and read bit lines (j=2) are used as examples, but this is not limiting.
此外,每個快取裝置100是設置在各寫入字元線WWLi與寫入位元線WBLj之交叉位置,以及各讀取字元線RWLi與讀取位元線RBLj之交叉位置。換句話說,在對各快取裝置100進行資料寫入時,是將對應的寫入字元線WWLi與寫入位元線WBLj施加寫入偏壓,而相應的讀取字元線RWLi與讀取位元線RBLj則不選取(禁能)。還有,在對各快取裝置100進行資料讀取時,是將對應的讀取字元線WWLi與讀取位元線WBLj施加讀取偏壓,而相應的寫入字元線WWLi與寫入位元線RBLj則不選取(禁能)。Furthermore, each cache device 100 is located at the intersection of each write word line WWLi and write bit line WBLj, and at the intersection of each read word line RWLi and read bit line RBLj. In other words, when writing data to each cache device 100, a write bias is applied to the corresponding write word line WWLi and write bit line WBLj, while the corresponding read word line RWLi and read bit line RBLj are deselected (disabled). Furthermore, when reading data from each cache device 100, a read bias is applied to the corresponding read word line WWLi and read bit line WBLj, while the corresponding write word line WWLi and write bit line RBLj are deselected (disabled).
根據本發明實施例,快取裝置100是由電晶體所構成且不使用電容器,例如以4T0C的架構來設置快取裝置100。快取裝置100的具體架構以下會進一步說明。在此架構下,快取裝置100例如是一個6端元件,其中2端耦接到寫入操作用的寫入字元線WWLi和寫入位元線WBLj,2端耦接至讀取操作用的讀取字元線RWLi和讀取位元線RBLj,2端則是耦接到電壓源V DD’和V SS’ (後述,提供電壓給快取裝置100中的反相器)。 According to an embodiment of the present invention, cache device 100 is constructed using transistors and does not utilize capacitors. For example, cache device 100 is configured using a 4TOC architecture. The specific architecture of cache device 100 will be further described below. In this architecture, cache device 100 is, for example, a six-terminal device, two of which are coupled to write word lines WWLi and write bit lines WBLj for write operations, two of which are coupled to read word lines RWLi and read bit lines RBLj for read operations, and two of which are coupled to voltage sources VDD ' and VSS ' (which, as described later, provide voltages for inverters within cache device 100).
在一個實施例中,快取陣列10的字元線WLi (包括寫入字元線WWLi與讀取字元線RWLi)與位元線BLi (包括寫入位元線WBLi與讀取位元線RBLj)可以設置成彼此正交的方式來進行陣列布局設計。In one embodiment, the word lines WLi (including write word lines WWLi and read word lines RWLi) and bit lines BLi (including write bit lines WBLi and read bit lines RBLj) of the cache array 10 can be arranged to be orthogonal to each other to perform array layout design.
接著說明快取裝置100的架構。圖2是根據本發明實施例所例示的一種快取裝置。如圖2所示,本發明的快取裝置100是由第一電晶體M1、反相器INV與第二電晶體M2所構成。快取裝置100最少可由4個電晶體所構成,並且不需要電容器來作為儲存單元。Next, the architecture of cache device 100 is described. Figure 2 illustrates a cache device according to an embodiment of the present invention. As shown in Figure 2, cache device 100 of the present invention is composed of a first transistor M1, an inverter INV, and a second transistor M2. Cache device 100 can be composed of at least four transistors and does not require capacitors as storage units.
如圖2所示,第一電晶體M1,具有控制端(如圖2所示之第一電晶體M1的閘極)、第一端與第二端(如源極/汲極端)。第一電晶體M1的第一端耦接到輸入電壓。第一電晶體M1的第二端耦接到儲存節點SN。根據本發明一實施例,第一電晶體M1是以低漏電流電晶體來實施。利用低漏電流電晶體M1,可以增加儲存節點SN保持資料的保持時間。低漏電流電晶體M1可以採用低漏電流CMOS電晶體、低漏電流IGZO(銦鎵鋅氧)電晶體或者其他同等的電晶體。低漏電流電晶體M1的基底則耦接到第二電源電壓V SS’。 As shown in Figure 2, the first transistor M1 has a control end (such as the gate of the first transistor M1 shown in Figure 2), a first end and a second end (such as the source/drain end). The first end of the first transistor M1 is coupled to the input voltage. The second end of the first transistor M1 is coupled to the storage node SN. According to one embodiment of the present invention, the first transistor M1 is implemented as a low-leakage transistor. By using the low-leakage transistor M1, the retention time of the data of the storage node SN can be increased. The low-leakage transistor M1 can adopt a low-leakage CMOS transistor, a low-leakage IGZO (indium gallium zinc oxide) transistor or other equivalent transistors. The base of the low-leakage transistor M1 is coupled to the second power supply voltage V SS '.
反相器INV可作為緩衝器,用以對快取裝置100之輸入電壓VDD或GND進行緩衝。反相器INV具有輸入端IN與輸出端OUT。反相器INV的輸入端IN耦接到儲存節點SN。作為一個反相器INV的例子,如圖2所示,反相器INV可以由第三電晶體M3和第四電晶體M4彼此串接而構成。第三電晶體M3例如是PMOS電晶體,其控制端(如圖2所示之第三電晶體M3的閘極)耦接到反相器INV的輸入端IN(或儲存節點SN),第一端耦接第一電源電壓V DD’,第二端耦接到反相器INV的輸出端OUT。第三電晶體M3的基底則耦接到第一電源電壓V DD’。第四電晶體M4例如是NMOS電晶體,其控制端(如圖2所示之第四電晶體M4的閘極)耦接到反相器INV的輸入端IN(或儲存節點SN),第一端耦接到反相器INV的輸出端OUT,第二端耦接到第二電源電壓V SS’。第四電晶體M4的基底則耦接到第二電源電壓V SS’。 The inverter INV can be used as a buffer to buffer the input voltage VDD or GND of the cache device 100. The inverter INV has an input terminal IN and an output terminal OUT. The input terminal IN of the inverter INV is coupled to the storage node SN. As an example of an inverter INV, as shown in FIG2 , the inverter INV can be composed of a third transistor M3 and a fourth transistor M4 connected in series. The third transistor M3 is, for example, a PMOS transistor, whose control terminal (such as the gate of the third transistor M3 shown in FIG2 ) is coupled to the input terminal IN of the inverter INV (or the storage node SN), a first terminal is coupled to the first power supply voltage V DD ', and a second terminal is coupled to the output terminal OUT of the inverter INV. The substrate of the third transistor M3 is coupled to the first power supply voltage V DD '. The fourth transistor M4 is, for example, an NMOS transistor. Its control terminal (e.g., the gate of the fourth transistor M4 shown in FIG2 ) is coupled to the input terminal IN of the inverter INV (or the storage node SN). A first terminal is coupled to the output terminal OUT of the inverter INV. A second terminal is coupled to the second power supply voltage V SS ′. The substrate of the fourth transistor M4 is coupled to the second power supply voltage V SS ′.
在此,第一電源電壓V DD’是大於第二電源電壓V SS’。第一電源電壓V DD’則是略小於第一系統電源電壓V DD,而第二電源電壓V SS’則可以大致與第二系統電源電壓V SS(接地)相等。 Here, the first power voltage V DD ′ is greater than the second power voltage V SS ′. The first power voltage V DD ′ is slightly less than the first system power voltage V DD , while the second power voltage V SS ′ can be substantially equal to the second system power voltage V SS (ground).
第二電晶體M2例如是NMOS電晶體。第二電晶體M2具有控制端(如圖2所示的第二電晶體M2的閘極)、第一端與第二端(如源極/汲極端)。第二電晶體M2的第一端耦接反相器INV的輸出端OUT。第二電晶體M2的第二端用以輸出讀取電壓。此外,第一電晶體M1與第二電晶體M2的基底則耦接到第二電源電壓V SS’。 The second transistor M2 is, for example, an NMOS transistor. The second transistor M2 has a control terminal (e.g., the gate of the second transistor M2 shown in FIG2 ), a first terminal, and a second terminal (e.g., a source/drain terminal). The first terminal of the second transistor M2 is coupled to the output terminal OUT of the inverter INV. The second terminal of the second transistor M2 is used to output a read voltage. Furthermore, the substrates of the first transistor M1 and the second transistor M2 are coupled to the second power supply voltage V SS ′.
根據本發明實施例,第一電晶體M1是作為寫入電晶體。第一電晶體M1的閘極耦接至寫入字元線WWL,且第一電晶體M1的第一端耦接至寫入位元線WBL,以施加輸入電壓。此外,第二電晶體M2作為讀取(存取)電晶體。第二電晶體M2的閘極耦接至讀取字元線RWL,且第二電晶體M2的第二端耦接至讀取位元線RBL,由此輸出讀取電壓。根據本發明實施例,相較於一般6個電晶體的SRAM快取,本實施例只需要4個電晶體,而且不需要電容器,故可以進一步減少面積成本。此外,本發明的快取裝置100例如是4T0C之類DRAM架構,因此快取裝置100可以滿足相容於CMOS邏輯操作以及速度要求。According to an embodiment of the present invention, the first transistor M1 serves as a write transistor. The gate of the first transistor M1 is coupled to the write word line WWL, and the first end of the first transistor M1 is coupled to the write bit line WBL to apply an input voltage. In addition, the second transistor M2 serves as a read (access) transistor. The gate of the second transistor M2 is coupled to the read word line RWL, and the second end of the second transistor M2 is coupled to the read bit line RBL, thereby outputting a read voltage. According to an embodiment of the present invention, compared to a typical SRAM cache that uses six transistors, this embodiment only requires four transistors and does not require a capacitor, thereby further reducing area cost. In addition, the cache device 100 of the present invention is a DRAM architecture such as 4TOC, so the cache device 100 can meet the requirements of CMOS logic operation and speed.
此外,本發明的快取裝置100可以用來取代處理器或控制器中的L3/L4 SRAM快取記憶體。In addition, the cache device 100 of the present invention can be used to replace the L3/L4 SRAM cache memory in a processor or controller.
接著,進一步說明快取裝置100的操作。以下的說明是針對如圖1所示的快取陣列10的某一個快取裝置100進行說明。Next, the operation of the cache device 100 will be further described. The following description is directed to a cache device 100 in the cache array 10 shown in FIG1 .
首先,針對快取裝置100的寫入操作進行說明。如圖2所示,在寫入操作時,對選取的快取裝置100的讀取字元線RWL和讀取位元線RBL施加不選取偏壓,由此使與讀取字元線RWL和讀取位元線RBL耦接的讀取電晶體(即,第二電晶體)M2為關閉。此外,對選取的快取裝置100的寫入字元線WWL和寫入位元線WBL施加寫入偏壓,由此使與寫入字元線WWL和寫入位元線WBL耦接的寫入電晶體(即,第一電晶體)M1為導通(ON)。例如,在寫入字元線WWL施加寫入電壓使寫入電晶體M1導通,並且在寫入位元線WBL施加系統電源電壓VDD或接地電壓GND (或V SS)。此時,因為寫入電晶體M1為導通,通過在寫入位元線WBL施加系統電源電壓V DD或接地電壓GND (或V SS),儲存節點SN的電壓成為V DD或GND。 First, the write operation of cache device 100 will be described. As shown in Figure 2, during a write operation, a deselect bias is applied to the read word line RWL and read bit line RBL of the selected cache device 100, thereby turning off the read transistor (i.e., the second transistor) M2 coupled to the read word line RWL and read bit line RBL. Furthermore, a write bias is applied to the write word line WWL and write bit line WBL of the selected cache device 100, thereby turning on the write transistor (i.e., the first transistor) M1 coupled to the write word line WWL and write bit line WBL. For example, a write voltage is applied to write word line WWL, turning on write transistor M1. System power voltage VDD or ground voltage GND (or VSS ) is also applied to write bit line WBL. Since write transistor M1 is on, the voltage at storage node SN becomes VDD or GND due to the system power voltage VDD or ground voltage GND (or VSS ) applied to write bit line WBL.
之後,將寫入電晶體M1關閉(OFF)。此時,儲存節點SN的電壓可以保持在VDD或GND。Afterwards, the write transistor M1 is turned OFF. At this time, the voltage of the storage node SN can be maintained at VDD or GND.
接著說明快取裝置100的讀取操作。圖3例示根據本發明實施例之快取裝置的儲存電壓與輸出電壓的關係圖。在快取裝置100的資料保持時間(retention time)內,可以對快取裝置100所儲存的資料進行讀取。在讀取操作時,將讀取電晶體M2導通,如在讀取字元線RWL施加選取電壓。另外,在讀取操作,寫入電晶體M1為關閉。當讀取電晶體M2導通,讀取位元線RBL的電壓可以被拉升到V DD’或V SS’ (GND),其端視儲存節點SN所保持的電壓為何。 Next, the read operation of the cache device 100 is described. FIG3 illustrates a diagram showing the relationship between the storage voltage and the output voltage of the cache device according to an embodiment of the present invention. During the data retention time of the cache device 100, the data stored in the cache device 100 can be read. During the read operation, the read transistor M2 is turned on, such as applying a select voltage to the read word line RWL. In addition, during the read operation, the write transistor M1 is turned off. When the read transistor M2 is turned on, the voltage of the read bit line RBL can be pulled up to V DD ' or V SS ' (GND), depending on the voltage maintained by the storage node SN.
同時參考圖2與圖3,假設第三電晶體M3和第四電晶體M4之臨界電壓分別為Vtp和Vtn。對於反相器INV之第三電晶體M3,如果施加在其閘極的電壓(儲存節點SN的電壓)小於VDD’+Vtp (其中臨界電壓Vtp為負值),則第三電晶體M3會導通。例如,對寫入位元線WBL施加第二電源電壓V SS’ (GND),使儲存節點SN的電壓變成電壓V SS’ (GND,V SS),儲存節點SN的電壓小於V DD’+Vtp。在此情況下,反相器INV的輸出端OUT會成為第一電源電壓V DD’。故在讀取期間,當讀取電晶體M2導通,讀取位元線RBL的電壓會被拉升到電壓V DD’。由此,可以從快取裝置100讀出電壓V DD’。換句話說,當輸入電壓(儲存節點SN的電壓)小於V DD’+Vtp,可以輸出電壓V DD’。 Referring to Figures 2 and 3 , assuming the threshold voltages of the third transistor M3 and the fourth transistor M4 are Vtp and Vtn, respectively, the third transistor M3 of the inverter INV turns on if the voltage applied to its gate (the voltage of the storage node SN) is less than VDD' + Vtp (where the threshold voltage Vtp is negative). For example, applying the second power supply voltage VSS ' (GND) to the write bit line WBL causes the voltage of the storage node SN to become VSS ' (GND, VSS ), which is less than VDD ' + Vtp. In this case, the output terminal OUT of the inverter INV becomes the first power supply voltage V DD '. Therefore, during the read period, when the read transistor M2 is turned on, the voltage of the read bit line RBL is pulled up to the voltage V DD '. As a result, the voltage V DD ' can be read from the cache device 100. In other words, when the input voltage (the voltage of the storage node SN) is less than V DD '+Vtp, the output voltage V DD ' can be output.
此外,對於反相器INV之第四電晶體M4,如果施加在其閘極的電壓(儲存節點SN的電壓)大於Vtn,則第四電晶體M4會導通。例如,對寫入位元線WBL施加第一電源電壓V DD’,使儲存節點SN的電壓變成電壓V DD’,儲存節點SN的電壓V DD’大於Vtn。在此情況下,反相器INV的輸出端OUT會成為第二電源電壓V SS’(GND)。故在讀取期間,當讀取電晶體M2導通,讀取位元線RBL的電壓會被拉降到電壓V SS’。由此,可以從快取裝置100讀出電壓V SS’。換句話說,當輸入電壓(儲存節點SN的電壓)大於Vtn,可以輸出電壓V SS’。 Furthermore, if the voltage applied to the gate of the fourth transistor M4 of the inverter INV (the voltage of the storage node SN) is greater than Vtn, the fourth transistor M4 turns on. For example, applying the first power supply voltage VDD ' to the write bit line WBL causes the voltage of the storage node SN to become VDD ', which is greater than Vtn . In this case, the output terminal OUT of the inverter INV becomes the second power supply voltage VSS ' (GND). Therefore, during the read operation, when the read transistor M2 turns on, the voltage of the read bit line RBL is pulled down to VSS '. Thus, the voltage V SS ′ can be read from the cache device 100. In other words, when the input voltage (the voltage of the storage node SN) is greater than Vtn, the voltage V SS ′ can be output.
此外,當輸入電壓(儲存節點SN的電壓)在電壓V DD’+Vtp與電壓Vtn之間,則快取裝置100的輸出為浮置狀態。此外,施加在反相器INV之第三電晶體M3的第一電源電壓V DD’需要小於電壓|Vtp|+Vtn,以使從第一電源電壓V DD’經電晶體M3、M4到第二電源電壓V SS’的電流路徑被關閉。此外,第一電源電壓V DD’可以小於第一系統電源電壓VDD,以確保可以滿足V DD’ < |Vtp|+Vtn的關係可以成立。此外,儲存節點SN的電壓可以大於第一電源電壓V DD’,例如第一系統電源電壓V DD,以獲得更長的保持時間。 Furthermore, when the input voltage (the voltage of storage node SN) is between VDD '+Vtp and Vtn, the output of cache device 100 is in a floating state. Furthermore, the first power supply voltage VDD ' applied to the third transistor M3 of inverter INV must be less than |Vtp|+Vtn to close the current path from the first power supply voltage VDD ' through transistors M3 and M4 to the second power supply voltage VSS '. Furthermore, the first power supply voltage VDD ' can be less than the first system power supply voltage VDD to ensure that the relationship VDD '< |Vtp|+Vtn holds. In addition, the voltage of the storage node SN may be greater than the first power voltage V DD ′, such as the first system power voltage V DD , to obtain a longer retention time.
圖4繪示根據本發明實施例之快取裝置的儲存節點電壓與時間的示意圖。如圖4所示,縱座標代表儲存節點SN的電壓,橫坐標代表時間,t0表示快取裝置100之資料寫入結束的時間點,te表示快取裝置100之儲存資料的保持時間結束的時間點。FIG4 illustrates a schematic diagram of storage node voltage versus time for a cache device according to an embodiment of the present invention. As shown in FIG4 , the vertical axis represents the voltage of storage node SN, and the horizontal axis represents time. t0 represents the time when data writing to cache device 100 is completed, and te represents the time when the retention period for stored data in cache device 100 expires.
當在儲存節點SN上所保持的電壓一開始為第一系統電源電壓V DD,亦即在快取裝置100之寫入期間,對寫入位元線WBL施加第一系統電源電壓V DD。在時間點t0,當資料寫入結束後,儲存節點SN上所保持的電壓V DD便開始從電壓V DD放電到電壓V SS’。在放電期間,當儲存節點SN的電壓到達臨界電壓Vtn時,反相器INV的第四電晶體M4會被關閉,則輸出電壓變成電壓V SS’ (GND)。當儲存節點SN的電壓小於臨界電壓Vtn時,此將導致快取裝置100的保持失效,輸出電壓變成浮置。 The voltage held at storage node SN is initially at the first system power voltage V DD . That is, during the write phase of cache device 100, the first system power voltage V DD is applied to write bit line WBL. At time t0, after data writing is complete, the voltage V DD held at storage node SN begins to discharge from V DD to V SS '. During the discharge phase, when the voltage at storage node SN reaches the threshold voltage Vtn, the fourth transistor M4 of inverter INV is turned off, and the output voltage becomes V SS ' (GND). When the voltage of the storage node SN is less than the critical voltage Vtn, the cache device 100 will fail to retain data and the output voltage will become floating.
此外,當在儲存節點SN上所保持的電壓一開始為第二系統電源電壓V SS’ (GND),儲存節點SN的電壓會保持在GND,而且反相器INV的第三電晶體M3會被導通,第四電晶體M4會被關閉。此時的輸出電壓會變成電壓V DD’。 Furthermore, when the voltage held at storage node SN is initially at the second system power supply voltage V SS '(GND), the voltage at storage node SN remains at GND, and the third transistor M3 of inverter INV is turned on, while the fourth transistor M4 is turned off. At this point, the output voltage becomes V DD '.
圖5繪示根據本發明實施例的快取裝置的布局示意圖。圖5是採用鰭狀式場效電晶體(FinFET)的布局示意圖。圖5的(a)例示出快取記憶體之單位記憶胞20(即相應於圖2之快取裝置100)的3個電晶體M2、M3與M4 (參考圖2)。此外,圖5的(b)例示出快取裝置100的低漏電流電晶體M1可以在後段製程(back end of line,BEOL)採用IGZO電晶體(即電晶體M1)。IGZO電晶體可以通過另一個介層窗(via)結構來與儲存節點SN連接。在此例子中,本發明的快取裝置100的布局面積僅需要3個電晶體,而另外一個是在BEOL製程完成。因此,與6T的SRAM快取記憶體相比,單位記憶胞20的面積大小可以進一步減少。FIG5 is a schematic diagram of the layout of a cache device according to an embodiment of the present invention. FIG5 is a schematic diagram of a layout using a fin field-effect transistor (FinFET). FIG5(a) illustrates three transistors M2, M3, and M4 (refer to FIG2) of a unit memory cell 20 of a cache memory (i.e., corresponding to the cache device 100 of FIG2). In addition, FIG5(b) illustrates that the low leakage transistor M1 of the cache device 100 can use an IGZO transistor (i.e., transistor M1) in the back end of line (BEOL) process. The IGZO transistor can be connected to the storage node SN through another via structure. In this example, the layout area of the cache device 100 of the present invention only requires three transistors, and the other one is completed in the BEOL process. Therefore, compared with a 6T SRAM cache memory, the area size of the unit memory cell 20 can be further reduced.
圖6繪示根據本發明另一實施例的快取裝置的布局示意圖。圖6所示的布局架構是採用平面電晶體的架構。在此架構下,可以將快取裝置100的4個電晶體(M1~M4)全部形成在一平面上。此外,也可以在平面上形成3個電晶體(M2~M4),另外一個低漏電流電晶體M1 (如使用IGZO電晶體)以BEOL製程完成。在此情況下,飄移層比SRAM記憶體小20%。因此,與6T的SRAM快取記憶體相比,單位記憶胞22的面積大小可以進一步減少。FIG6 shows a schematic diagram of the layout of a cache device according to another embodiment of the present invention. The layout architecture shown in FIG6 is an architecture using planar transistors. Under this architecture, all four transistors (M1 to M4) of the cache device 100 can be formed on a single plane. In addition, three transistors (M2 to M4) can also be formed on a plane, and another low-leakage current transistor M1 (such as an IGZO transistor) can be completed using a BEOL process. In this case, the floating layer is 20% smaller than the SRAM memory. Therefore, compared with a 6T SRAM cache memory, the area size of the unit memory cell 22 can be further reduced.
基於上述說明,根據本發明實施例之快取裝置,其此用4個電晶體且無電容器(4T0C)之類DRAM架構來建構快取裝置。快取裝置可以相容於DRAM製程、邏輯操作與速度需求。此外,快取裝置更可以減少布局面積,進而可以增加記憶容量,並且減少成本。Based on the above description, the cache device according to the embodiment of the present invention utilizes a DRAM architecture similar to four transistors and no capacitors (4TOC). This cache device is compatible with DRAM process, logic operations, and speed requirements. Furthermore, the cache device can reduce layout area, thereby increasing memory capacity and reducing costs.
10:快取陣列 20、22:單位記憶胞20 100:快取裝置 M1:第一電晶體 M2:第二電晶體 M3:第三電晶體 M4:第四電晶體 INV:反相器 WWL:寫入字元線 WBL:寫入位元線 RWL:讀取字元線 RBL:讀取位元線 SN:儲存節點 IN:輸入端 OUT:輸出端 V DD’:第一電源電壓 V SS’:第二電源電壓 V DD:第一系統電源電壓 GND:接地 10: Cache array 20, 22: Unit memory cell 20 100: Cache device M1: First transistor M2: Second transistor M3: Third transistor M4: Fourth transistor INV: Inverter WWL: Write word line WBL: Write bit line RWL: Read word line RBL: Read bit line SN: Storage node IN: Input OUT: Output VDD ': First power supply voltage VSS ': Second power supply voltage VDD : First system power supply voltage GND: Ground
圖1是根據本發明實施例所例示的一種快取陣列架構是意圖。 圖2是根據本發明實施例所例示的一種快取裝置。 圖3例示根據本發明實施例之快取裝置的儲存電壓與輸出電壓的關係圖。 圖4繪示根據本發明實施例之快取裝置的儲存節點電壓與時間的示意圖。 圖5繪示根據本發明實施例的快取裝置的布局示意圖。 圖6繪示根據本發明另一實施例的快取裝置的布局示意圖。 Figure 1 is a schematic diagram illustrating a cache array architecture according to an embodiment of the present invention. Figure 2 is a schematic diagram illustrating a cache device according to an embodiment of the present invention. Figure 3 illustrates a diagram illustrating the relationship between storage voltage and output voltage of a cache device according to an embodiment of the present invention. Figure 4 is a schematic diagram illustrating the relationship between storage node voltage and time of a cache device according to an embodiment of the present invention. Figure 5 is a schematic diagram illustrating the layout of a cache device according to an embodiment of the present invention. Figure 6 is a schematic diagram illustrating the layout of a cache device according to another embodiment of the present invention.
100:快取裝置 100: Cache device
M1:第一電晶體 M1: First transistor
M2:第二電晶體 M2: Second transistor
M3:第三電晶體 M3: The third transistor
M4:第四電晶體 M4: Fourth transistor
INV:反相器 INV: Inverter
WWL:寫入字元線 WWL: Write Word Line
WBL:寫入位元線 WBL: Write Bit Line
RWL:讀取字元線 RWL: Read word line
RBL:讀取位元線 RBL: Read Bit Line
SN:儲存節點 SN: Storage Node
IN:輸入端 IN: Input terminal
OUT:輸出端 OUT: Output port
VDD’:第一電源電壓 V DD ': first power supply voltage
VSS’:第二電源電壓 V SS ': Second power supply voltage
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| TW434537B (en) * | 1999-07-22 | 2001-05-16 | Guo Jeng Bang | A two-port 6t SRAM cell circuit for low-voltage VLSI SRAM with single-bit-line simultaneous read-and-write access capability |
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