TWI888991B - Array objective lens module calibration equipment and calibration method thereof - Google Patents
Array objective lens module calibration equipment and calibration method thereof Download PDFInfo
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Abstract
Description
本發明是有關於一種光學校準設備,且特別是有關於一種陣列式透鏡模組校準設備及其校準方法。The present invention relates to an optical calibration device, and in particular to an array lens module calibration device and a calibration method thereof.
在未來的市場需求中,隨著先進封裝晶片的廣泛應用,高算力元件逐漸成為市場主流,而若單一晶片檢測面積較大,則無法使用多台設備進行同步檢測加速。因此,提供快速且精準的3D型貌檢測,是本領域發展的主要目標之一。In the future market demand, with the widespread application of advanced packaged chips, high computing power components are gradually becoming the mainstream of the market. If the inspection area of a single chip is large, it is impossible to use multiple devices for synchronous inspection acceleration. Therefore, providing fast and accurate 3D appearance inspection is one of the main goals of the development of this field.
在目前,可使用白光干涉達到奈米級精度檢測,但傳統白光干涉檢測的速度將受限。在採用多鏡頭檢測的方案中,也需搭配多個額外部件才能進行掃描,故不符合設備建置成本。除此之外,採用多鏡頭架構必須確保各元件的共面度一致,才可滿足白光同調長度規格小於或等於10微米,進而實現同動掃描。然而,透鏡受限於既有光學夾持機構加工精度不足,導致共面度遠大於10微米,因此無法實現同動掃描,難以陣列化擴大視野。換句話說,在目前的發展中,檢測速度遇到瓶頸,無法用於線上檢測。At present, white light interferometry can be used to achieve nano-level precision detection, but the speed of traditional white light interferometry detection will be limited. In the solution using multi-lens detection, multiple additional components are also required for scanning, so it is not in line with the equipment construction cost. In addition, the use of a multi-lens architecture must ensure that the coplanarity of each component is consistent in order to meet the white light coherence length specification of less than or equal to 10 microns, thereby achieving simultaneous scanning. However, the lens is limited by the insufficient processing accuracy of the existing optical clamping mechanism, resulting in a coplanarity far greater than 10 microns, so simultaneous scanning cannot be achieved, and it is difficult to expand the field of view in an array. In other words, in the current development, the detection speed has encountered a bottleneck and cannot be used for online detection.
本發明提供一種陣列式透鏡模組校準設備及其校準方法,可調整陣列式透鏡模組中多個透鏡組的共面度。The present invention provides an array lens module calibration device and a calibration method thereof, which can adjust the coplanarity of multiple lens groups in the array lens module.
本發明提供一種陣列式透鏡模組校準設備,包括承載平台、視覺定位模組、雷射對位模組、景深量測模組以及共面度調整模組。承載平台用以承載陣列式透鏡模組。陣列式透鏡模組具有光軸,並包括基板、配置於基板的多個鏡框以及分別配置於多個鏡框內的多個透鏡組。視覺定位模組用以提供視覺定位光束至陣列式透鏡模組,並對陣列式透鏡模組的外觀進行取像以獲得外觀資訊。雷射對位模組用以提供校準雷射光束通過陣列式透鏡模組的校準通孔及多個透鏡組後成像,以獲得對位資訊。景深量測模組用以對多個透鏡組進行景深取像以獲得多個透鏡組的景深資訊。共面度調整模組用以依據外觀資訊、對位資訊及景深資訊調整多個鏡框分別與基板在平行於光軸的光軸方向上的相對位置。The present invention provides an array lens module calibration device, including a supporting platform, a visual positioning module, a laser alignment module, a depth of field measurement module and a coplanarity adjustment module. The supporting platform is used to support the array lens module. The array lens module has an optical axis, and includes a substrate, a plurality of lens frames arranged on the substrate, and a plurality of lens groups respectively arranged in the plurality of lens frames. The visual positioning module is used to provide a visual positioning beam to the array lens module, and to capture the appearance of the array lens module to obtain appearance information. The laser alignment module is used to provide a calibration laser beam to pass through the calibration through hole of the array lens module and the plurality of lens groups to form an image to obtain alignment information. The depth-of-field measurement module is used to perform depth-of-field imaging on a plurality of lens groups to obtain depth-of-field information of the plurality of lens groups. The coplanarity adjustment module is used to adjust the relative positions of the plurality of lens frames and the substrate in the direction of the optical axis parallel to the optical axis according to the appearance information, the alignment information and the depth-of-field information.
在本發明的一實施例中,上述的承載平台包括夾具,夾具用以夾持固定陣列式透鏡模組。In one embodiment of the present invention, the above-mentioned supporting platform includes a clamp, and the clamp is used to clamp and fix the array lens module.
在本發明的一實施例中,上述的視覺定位模組包括同軸光源、遠心鏡頭以及視覺定位接收元件。同軸光源提供視覺定位光束。遠心鏡頭配置於視覺定位接收元件與陣列式透鏡模組之間。視覺定位接收元件用以接收來自陣列式透鏡模組的視覺定位光束。In one embodiment of the present invention, the visual positioning module comprises a coaxial light source, a telecentric lens and a visual positioning receiving element. The coaxial light source provides a visual positioning beam. The telecentric lens is disposed between the visual positioning receiving element and the array lens module. The visual positioning receiving element is used to receive the visual positioning beam from the array lens module.
在本發明的一實施例中,上述的校準雷射光束為偏軸雷射光束。In one embodiment of the present invention, the calibration laser beam is an off-axis laser beam.
在本發明的一實施例中,上述的雷射對位模組包括偏軸雷射光源以及雷射對位接收元件。校準雷射光束為偏軸雷射光束。偏軸雷射光源用以提供校準雷射光束傳遞通過校準通孔及多個透鏡組。雷射對位接收元件用以接收來自陣列式透鏡模組的校準雷射光束。In one embodiment of the present invention, the laser alignment module includes an off-axis laser light source and a laser alignment receiving element. The calibration laser beam is an off-axis laser beam. The off-axis laser light source is used to provide the calibration laser beam to pass through the calibration through hole and multiple lens groups. The laser alignment receiving element is used to receive the calibration laser beam from the array lens module.
在本發明的一實施例中,上述的校準通孔位於多個鏡框的對稱中心。In one embodiment of the present invention, the calibration through holes are located at the symmetrical centers of the plurality of lens frames.
在本發明的一實施例中,上述的景深量測模組包括陣列光源以及景深量測取像元件。陣列光源用以提供景深量測光束傳遞至陣列式透鏡模組的多個透鏡組。景深量測取像元件用以接收來自陣列式透鏡模組的景深量測光束以對陣列式透鏡模組進行取像。In one embodiment of the present invention, the depth measurement module includes an array light source and a depth measurement imaging element. The array light source is used to provide a depth measurement beam to be transmitted to multiple lens groups of the array lens module. The depth measurement imaging element is used to receive the depth measurement beam from the array lens module to capture an image of the array lens module.
在本發明的一實施例中,上述的共面度調整模組包括至少一機械手臂,用以依據外觀資訊、對位資訊及景深資訊調整陣列式透鏡模組的多個鏡框。In an embodiment of the present invention, the coplanarity adjustment module includes at least one robot arm for adjusting a plurality of lens frames of the array lens module according to appearance information, alignment information and depth of field information.
在本發明的一實施例中,上述的各鏡框與基板的相對位置依據多個鏡框的旋轉角度而改變。In one embodiment of the present invention, the relative positions of the lens frames and the substrate are changed according to the rotation angles of the lens frames.
本發明另提供一種陣列式透鏡模組校準設備的校準方法,包括提供陣列式透鏡模組校準設備,陣列式透鏡模組校準設備包括承載平台、視覺定位模組、雷射對位模組、景深量測模組以及共面度調整模組的步驟;提供陣列式透鏡模組至承載平台,陣列式透鏡模組包括基板、配置於基板的多個鏡框以及分別配置於多個鏡框內的多個透鏡組的步驟;提供膠體至基板與多個鏡框之間的步驟;提供視覺定位光束至陣列式透鏡模組,並對陣列式透鏡模組的外觀進行取像以獲得外觀資訊的步驟;提供校準雷射光束通過陣列式透鏡模組的校準通孔及多個透鏡組後成像,以獲得對位資訊的步驟;對多個透鏡組進行景深取像以獲得景深資訊的步驟;依據外觀資訊、對位資訊及景深資訊調整多個鏡框分別與基板在平行於光軸的光軸方向上的相對位置的步驟;以及固化膠體以固定多個鏡框在基板上的位置的步驟。The present invention also provides a calibration method for an array lens module calibration device, including the steps of providing an array lens module calibration device, wherein the array lens module calibration device includes a supporting platform, a visual positioning module, a laser alignment module, a depth of field measurement module, and a coplanarity adjustment module; providing an array lens module to the supporting platform, wherein the array lens module includes a substrate, a plurality of lens frames disposed on the substrate, and a plurality of lens groups respectively disposed in the plurality of lens frames; providing a colloid between the substrate and the plurality of lens frames; providing a visual positioning module; and providing a colloid between the substrate and the plurality of lens frames. The invention relates to a method for producing a laser beam to an array lens module and capturing an appearance of the array lens module to obtain appearance information; a method for providing a calibration laser beam to pass through a calibration through hole of the array lens module and multiple lens groups to form an image to obtain alignment information; a method for capturing depth of field of multiple lens groups to obtain depth of field information; a method for adjusting the relative positions of multiple lens frames and a substrate in an optical axis direction parallel to the optical axis according to the appearance information, alignment information and depth of field information; and a method for curing a colloid to fix the positions of the multiple lens frames on the substrate.
在本發明的一實施例中,上述的視覺定位模組包括同軸光源、遠心鏡頭以及視覺定位接收元件,且提供視覺定位光束至陣列式透鏡模組以獲得外觀資訊的方法包括:以同軸光源提供視覺定位光束至陣列式透鏡模組的步驟;以及以視覺定位接收元件接收來自陣列式透鏡模組的視覺定位光束以獲得外觀資訊的步驟。In one embodiment of the present invention, the above-mentioned visual positioning module includes a coaxial light source, a telecentric lens and a visual positioning receiving element, and the method of providing a visual positioning beam to an array lens module to obtain appearance information includes: a step of providing a visual positioning beam to the array lens module with a coaxial light source; and a step of receiving the visual positioning beam from the array lens module with a visual positioning receiving element to obtain appearance information.
在本發明的一實施例中,上述的雷射對位模組包括偏軸雷射光源以及雷射對位接收元件,且提供校準雷射光束至陣列式透鏡模組以獲得對位資訊的方法包括:以偏軸雷射光源提供校準雷射光束傳遞通過陣列式透鏡模組的校準通孔,校準通孔位於多個鏡框的對稱中心的步驟;以及以雷射對位接收元件接收來自陣列式透鏡模組的校準雷射光束的步驟。In one embodiment of the present invention, the above-mentioned laser alignment module includes an off-axis laser light source and a laser alignment receiving element, and a method for providing a calibration laser beam to an array lens module to obtain alignment information includes: a step of using an off-axis laser light source to provide a calibration laser beam to pass through a calibration through hole of the array lens module, wherein the calibration through hole is located at the symmetrical center of a plurality of lens frames; and a step of using a laser alignment receiving element to receive the calibration laser beam from the array lens module.
在本發明的一實施例中,上述的景深量測模組包括陣列光源以及景深量測取像元件,且提供景深量測光束至陣列式透鏡模組以獲得景深資訊的方法包括:以陣列光源提供景深量測光束傳遞通過陣列式透鏡模組的多個透鏡組的步驟;以及以景深量測取像元件接收來自陣列式透鏡模組的景深量測光束以對陣列式透鏡模組進行取像的步驟。In one embodiment of the present invention, the above-mentioned depth of field measurement module includes an array light source and a depth of field measurement imaging element, and a method for providing a depth of field measurement beam to an array lens module to obtain depth of field information includes: a step of providing a depth of field measurement beam through multiple lens groups of the array lens module by the array light source; and a step of receiving the depth of field measurement beam from the array lens module by the depth of field measurement imaging element to capture an image of the array lens module.
在本發明的一實施例中,上述的共面度調整模組包括至少一機械手臂,且依據外觀資訊、對位資訊及景深資訊調整多個鏡框分別與基板在光軸方向上的相對位置的方法包括:依據外觀資訊、對位資訊及景深資訊調整各個鏡框與基板的相對旋轉角度的步驟。In one embodiment of the present invention, the above-mentioned coplanarity adjustment module includes at least one robot arm, and the method of adjusting the relative positions of multiple lens frames and the substrate in the optical axis direction according to appearance information, alignment information and depth of field information includes: adjusting the relative rotation angle of each lens frame and the substrate according to the appearance information, alignment information and depth of field information.
在本發明的一實施例中,上述的陣列式透鏡模組校準設備的校準方法還包括:重複提供校準雷射光束至陣列式透鏡模組以更新對位資訊的步驟;重複提供景深量測光束至陣列式透鏡模組以獲得景深資訊的步驟;以及依據更新後的對位資訊及景深資訊調整多個鏡框分別與基板在光軸方向上的相對位置的步驟。In one embodiment of the present invention, the calibration method of the above-mentioned array lens module calibration device also includes: repeatedly providing a calibration laser beam to the array lens module to update the alignment information; repeatedly providing a depth of field measurement beam to the array lens module to obtain the depth of field information; and adjusting the relative positions of multiple lens frames and the substrate in the optical axis direction according to the updated alignment information and depth of field information.
基於上述,在本發明的陣列式透鏡模組校準設備及其校準方法中,陣列式透鏡模組校準設備包括承載平台、視覺定位模組、雷射對位模組、景深量測模組以及共面度調整模組。其中,視覺定位模組提供視覺定位光束至陣列式透鏡模組以獲得外觀資訊,雷射對位模組提供校準雷射光束至陣列式透鏡模組以獲得對位資訊,景深量測模組提供景深量測光束至陣列式透鏡模組以獲得景深資訊。如此一來,可藉由外觀資訊、對位資訊及景深資訊獲得陣列式透鏡模組上不同結構的所在位置、校準雷射光束所反射回的光斑位置及陣列式透鏡模組中各透鏡組的景深範圍,進而對陣列式透鏡模組進行光學校準,調整陣列式透鏡模組中多個透鏡組分別與基板在光軸方向上的相對位置,以提升陣列式透鏡模組中多個透鏡組的共面度。Based on the above, in the array lens module calibration device and the calibration method thereof of the present invention, the array lens module calibration device includes a supporting platform, a visual positioning module, a laser alignment module, a depth of field measurement module and a coplanarity adjustment module. Among them, the visual positioning module provides a visual positioning beam to the array lens module to obtain appearance information, the laser alignment module provides a calibration laser beam to the array lens module to obtain alignment information, and the depth of field measurement module provides a depth of field measurement beam to the array lens module to obtain depth of field information. In this way, the positions of different structures on the array lens module, the positions of the light spots reflected by the calibration laser beam, and the depth of field range of each lens group in the array lens module can be obtained through appearance information, alignment information, and depth of field information, and then the array lens module can be optically calibrated to adjust the relative positions of multiple lens groups in the array lens module and the substrate in the optical axis direction to improve the coplanarity of multiple lens groups in the array lens module.
為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。In order to make the above features and advantages of the present invention more clearly understood, embodiments are specifically cited below and described in detail with reference to the accompanying drawings.
圖1為本發明一實施例的陣列式透鏡模組校準設備的示意圖。本實施例提出一種陣列式透鏡模組校準設備200,包括承載平台210、視覺定位模組220、雷射對位模組230、景深量測模組240以及共面度調整模組250。陣列式透鏡模組校準設備200用以對陣列式透鏡模組100進行校準,以使陣列式透鏡模組100應用於光學干涉顯微系統中,例如是白光干涉顯微鏡(white light Interferenc microscope),利用光干涉原理來顯示待測元件的表面或內部結構,可應用於快速且精準度兼具的3D立體量測。FIG1 is a schematic diagram of an array lens module calibration device of an embodiment of the present invention. This embodiment provides an array lens
承載平台210用以承載陣列式透鏡模組100。在本實施例中,承載平台210包括夾具212,用以夾持固定陣列式透鏡模組100。The supporting
圖2為本發明一實施例的陣列式透鏡模組的上視示意圖。圖3為圖2的陣列式透鏡模組沿A-A’線的剖面示意圖。請參考圖2及圖3。在本實施例中,陣列式透鏡模組100具有光軸,並包括基板110、配置於基板110的多個鏡框120以及分別配置於多個鏡框120內的多個透鏡組130。舉例而言,基板110包括多個容置通孔112以及校準通孔114,校準通孔114位於多個鏡框120的對稱中心。多個鏡框120分別配置於多個容置通孔112中,且各鏡框120包括至少一調整孔122,分別位於多個透鏡組130的周圍。多個透鏡組130分別配置於多個鏡框120內,各透鏡組130包括至少一透鏡132。其中,各容置通孔112包括內螺紋結構B1,而各鏡框120包括外螺紋結構B2,內螺紋結構B1與外螺紋結構B2彼此適配。FIG2 is a top view schematic diagram of an array lens module of an embodiment of the present invention. FIG3 is a cross-sectional schematic diagram of the array lens module of FIG2 along line A-A'. Please refer to FIG2 and FIG3. In this embodiment, the
請繼續參考圖1。視覺定位模組220用以提供視覺定位光束L1至陣列式透鏡模組100,並對陣列式透鏡模組100進行取像以獲得外觀資訊。在本實施例中,外觀資訊例如包括陣列式透鏡模組100的各鏡框120、調整孔122及校準通孔114等結構的位置。詳細而言,視覺定位模組220包括同軸光源222、遠心鏡頭224以及視覺定位接收元件226。同軸光源222用以提供視覺定位光束L1至陣列式透鏡模組100。遠心鏡頭224配置於視覺定位接收元件226與陣列式透鏡模組100之間。當視覺定位模組220對陣列式透鏡模組100進行取像時,視覺定位接收元件226用以接收來自陣列式透鏡模組100的視覺定位光束L1以獲得外觀資訊,並藉此將不同透鏡組130在成像面上的成像調整匯聚成一點。如此一來,可藉由視覺定位模組220獲得陣列式透鏡模組100結構的所在位置,以利其他部件對陣列式透鏡模組100精準地分別對透鏡組130進行校準。Please continue to refer to Figure 1. The
雷射對位模組230用以提供校準雷射光束L2通過陣列式透鏡模組100的校準通孔114及多個透鏡組130後成像,以獲得對位資訊。在本實施例中,對位資訊例如為校準雷射光束L2通過陣列式透鏡模組100後的光斑位置。詳細而言,雷射對位模組230包括偏軸雷射光源232以及雷射對位接收元件234,且於陣列式透鏡模組100遠離雷射對位模組230的一側例如配置有反射平面(未顯示),用以將光束反射回雷射對位模組230後成像,但本發明並不限於此。反射平面例如為各透鏡組130內部的反射結構或額外於外部配置的反射元件,本發明亦不限於此。其中,偏軸雷射光源232用以提供校準雷射光束L2傳遞通過陣列式透鏡模組100的校準通孔114及多個透鏡組130,校準雷射光束L2為平行於光軸的平行光束,且校準雷射光束L2為偏軸雷射光束。當校準雷射光束L2朝下傳遞通過校準通孔114及多個透鏡組130後,會藉由反射平面反射朝上傳遞,而雷射對位接收元件234用以接收來自陣列式透鏡模組100的校準雷射光束L2進行成像,進而獲得對位資訊。由於校準通孔114位於多個鏡框120的對稱中心,因此可定義通過校準通孔114的校準雷射光束L2經反射平面反射後於雷射對位接收元件234的成像位置為零點。藉由計算零點位置與各自通過不同透鏡組130的校準雷射光束L2經反射平面反射後於雷射對位接收元件234的成像位置的距離,可計算得出各透鏡組130的聚焦點位置。如此一來,可藉由雷射對位模組230提供校準雷射光束L2通過對陣列式透鏡模組100後所反射回的光斑位置距離,對陣列式透鏡模組100進行光學校準,例如是調整各個透鏡組130,使通過不同透鏡組130及校準通孔114所反射的校準雷射光束L2的成像重疊成一點以完成校準,以提升陣列式透鏡模組100中多個透鏡組130的共面度。The
景深量測模組240用以對多個透鏡組130進行景深取像以獲得景深資訊。在本實施例中,景深資訊例如為陣列式透鏡模組100中各透鏡組130的景深範圍。詳細而言,景深量測模組240包括陣列光源242以及景深量測取像元件(未顯示)。陣列光源242用以提供景深量測光束L3傳遞通過陣列式透鏡模組100的多個透鏡組130。景深量測取像元件用以接收來自陣列式透鏡模組100的景深量測光束L3,進而獲得陣列式透鏡模組100中各透鏡組130的景深資訊。舉例而言,可在各透鏡組130中配置具有特定圖案的參考光學件,以在景深量測模組240的景深量測取像元件對各透鏡組130取像時顯示出上述特定圖案,進而藉由圖案的清晰度判定景深位置。如此一來,可藉由景深量測模組240提供景深量測光束L3量測陣列式透鏡模組100中各透鏡組130的景深範圍,進而可對陣列式透鏡模組100進行光學校準以使各透鏡組130的清晰度保持一致,以提升陣列式透鏡模組100中多個透鏡組130的共面度。然而,上述具有特定圖案的參考光學件也可以是獨立地設置於透鏡組130外,且在此配置下,景深量測模組240的景深量測取像元件對各透鏡組130取像時同樣可顯示出上述特定圖案,以判斷景深位置,因此具有特定圖案的參考光學件不限於設置在透鏡組內。The depth-of-
共面度調整模組250用以依據外觀資訊、對位資訊及景深資訊調整多個鏡框120分別與基板110在光軸方向D上的相對位置。在本實施例中,共面度調整模組250包括至少一機械手臂252,用以調整陣列式透鏡模組100的多個鏡框120。具體而言,在本實施例中,機械手臂252可依據外觀資訊對調整孔122進行調整,進而藉由內螺紋結構B1與外螺紋結構B2彼此適配調整陣列式透鏡模組100中各鏡框120的相對旋轉角度以改變在基板110中沿平行於光軸的光軸方向D的位置。換句話說,各鏡框120與基板110的相對位置依據多個鏡框120的旋轉角度而改變。值得一提的是,前述的對位資訊及景深資訊會因共面度調整模組250的調整而有所改變,因此可依據不同需求而重複取得對位資訊及景深資訊以藉由共面度調整模組250對調整陣列式透鏡模組100重複調整。如此一來,可確保陣列式透鏡模組100中多個透鏡組130的共面度達到要求。依據本實施例的設計,多個透鏡組130分別的焦平面最大距離差可藉由陣列式透鏡模組校準設備200的校準而達到小於或等於3微米的精度,相較於傳統技術具有較佳的共面度以及良好的光學效果。The coplanarity adjustment module 250 is used to adjust the relative positions of the plurality of lens frames 120 and the
圖4為本發明一實施例的陣列式透鏡模組校準設備的校準方法的步驟流程圖。請參考圖1、圖3及圖4。本實施例提供一種陣列式透鏡模組校準設備200的校準方法,至少可應用於圖1及圖2的陣列式透鏡模組校準設備200及陣列式透鏡模組100中,故以下說明以此為例。在本實施例中,首先,執行步驟S300,提供陣列式透鏡模組校準設備200。陣列式透鏡模組校準設備200包括承載平台210、視覺定位模組220、雷射對位模組230、景深量測模組240以及共面度調整模組250。接著,執行步驟S301,提供陣列式透鏡模組100至承載平台210。陣列式透鏡模組100具有光軸,並包括基板110、配置於基板110的多個鏡框120以及分別配置於多個鏡框120內的多個透鏡組130。FIG4 is a flow chart of the steps of the calibration method of the array lens module calibration device of an embodiment of the present invention. Please refer to FIG1, FIG3 and FIG4. This embodiment provides a calibration method of the array lens
接著,執行步驟S302,提供膠體至基板110與多個鏡框120之間。膠體例如為光固化膠,在提供膠體後,多個鏡框120仍可在基板110各自進行旋轉校準。Next, step S302 is performed to provide glue between the
接著,執行步驟S303,提供視覺定位光束L1至陣列式透鏡模組100,並對陣列式透鏡模組100的外觀進行取像以獲得外觀資訊。具體而言,視覺定位模組220包括同軸光源222、遠心鏡頭224以及視覺定位接收元件226。同軸光源222用以提供視覺定位光束L1至陣列式透鏡模組100。遠心鏡頭224配置於視覺定位接收元件226與陣列式透鏡模組100之間。視覺定位接收元件226用以接收來自陣列式透鏡模組100的視覺定位光束L1以獲得外觀資訊。Next, step S303 is executed to provide a visual positioning beam L1 to the
接著,執行步驟S304,提供校準雷射光束L2通過陣列式透鏡模組100的校準通孔114及多個透鏡組130後成像,以獲得對位資訊。具體而言,雷射對位模組230包括偏軸雷射光源232以及雷射對位接收元件234。其中,偏軸雷射光源232用以提供校準雷射光束L2傳遞通過陣列式透鏡模組100的校準通孔114及多個透鏡組130,校準雷射光束L2為偏軸雷射光束。當校準雷射光束L2通過校準通孔114及多個透鏡組130後,可設計藉由反射平面反射至雷射對位接收元件234,而雷射對位接收元件234用以接收來自陣列式透鏡模組100的校準雷射光束L2進行成像,進而獲得對位資訊。Then, step S304 is executed to provide a calibration laser beam L2 to pass through the calibration through
接著,執行步驟S305,對多個透鏡組130進行景深取像以獲得景深資訊。具體而言,景深量測模組240包括陣列光源242以及景深量測取像元件(未顯示)。陣列光源242用以提供景深量測光束L3傳遞通過陣列式透鏡模組100的多個透鏡組130。景深量測取像元件用以接收來自陣列式透鏡模組100的景深量測光束L3,進而獲得陣列式透鏡模組100中各透鏡組130的景深資訊。Next, step S305 is executed to perform depth-of-field imaging on the plurality of
接著,執行步驟S306,依據外觀資訊、對位資訊及景深資訊調整多個鏡框120分別與基板110在平行於光軸的光軸方向D上的相對位置。具體而言,利用共面度調整模組250中的機械手臂252依據外觀資訊、對位資訊及景深資訊對調整孔122進行調整,藉由內螺紋結構B1與外螺紋結構B2彼此適配調整陣列式透鏡模組100中各鏡框120的旋轉角度,進而改變各鏡框120在基板110中沿光軸方向D的位置,以完成對陣列式透鏡模組100的校準。Next, step S306 is performed to adjust the relative positions of the plurality of lens frames 120 and the
最後,執行步驟S307,固化膠體以固定多個鏡框120在基板110上的位置,以固定陣列式透鏡模組100中的多個透鏡組130位置。如此一來,可確保陣列式透鏡模組100中多個透鏡組130的共面度達到要求,使多個透鏡組130分別的焦平面最大距離差達到小於或等於3微米的精度。Finally, step S307 is performed to cure the glue to fix the positions of the multiple lens frames 120 on the
值得一提的是,在上述的步驟中,可進一步重複部分步驟以提升校準精度。舉例而言,在本實施例中,重複提供校準雷射光束L2至陣列式透鏡模組100以更新對位資訊,以及重複提供景深量測光束L3至陣列式透鏡模組100以獲得景深資訊。最後,依據更新後的對位資訊及景深資訊調整多個鏡框120分別與基板110在光軸方向D上的相對位置。It is worth mentioning that in the above steps, some steps can be further repeated to improve the calibration accuracy. For example, in this embodiment, the calibration laser beam L2 is repeatedly provided to the
綜上所述,在本發明的陣列式透鏡模組校準設備及其校準方法中,陣列式透鏡模組校準設備包括承載平台、視覺定位模組、雷射對位模組、景深量測模組以及共面度調整模組。其中,視覺定位模組提供視覺定位光束至陣列式透鏡模組以獲得外觀資訊,雷射對位模組提供校準雷射光束至陣列式透鏡模組以獲得對位資訊,景深量測模組提供景深量測光束至陣列式透鏡模組以獲得景深資訊。如此一來,可藉由外觀資訊、對位資訊及景深資訊獲得陣列式透鏡模組上不同結構的所在位置、校準雷射光束所反射回的光斑位置及陣列式透鏡模組中各透鏡組的景深範圍,進而對陣列式透鏡模組進行光學校準,調整陣列式透鏡模組中多個透鏡組分別與基板在光軸方向上的相對位置,以提升陣列式透鏡模組中多個透鏡組的共面度。In summary, in the array lens module calibration device and the calibration method thereof of the present invention, the array lens module calibration device includes a supporting platform, a visual positioning module, a laser alignment module, a depth of field measurement module and a coplanarity adjustment module. Among them, the visual positioning module provides a visual positioning beam to the array lens module to obtain appearance information, the laser alignment module provides a calibration laser beam to the array lens module to obtain alignment information, and the depth of field measurement module provides a depth of field measurement beam to the array lens module to obtain depth of field information. In this way, the positions of different structures on the array lens module, the positions of the light spots reflected by the calibration laser beam, and the depth of field range of each lens group in the array lens module can be obtained through appearance information, alignment information, and depth of field information, and then the array lens module can be optically calibrated to adjust the relative positions of multiple lens groups in the array lens module and the substrate in the optical axis direction to improve the coplanarity of multiple lens groups in the array lens module.
雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed as above by the embodiments, they are not intended to limit the present invention. Any person with ordinary knowledge in the relevant technical field can make some changes and modifications without departing from the spirit and scope of the present invention. Therefore, the protection scope of the present invention shall be defined by the scope of the attached patent application.
100:陣列式透鏡模組 110:基板 112:容置通孔 114:校準通孔 120:鏡框 122:調整孔 130:透鏡組 132:透鏡 200:陣列式透鏡模組校準設備 210:承載平台 212:夾具 220:視覺定位模組 222:同軸光源 224:遠心鏡頭 226:視覺定位接收元件 230:雷射對位模組 232:偏軸雷射光源 234:雷射對位接收元件 240:景深量測模組 242:陣列光源 250:共面度調整模組 252:機械手臂 B1:內螺紋結構 B2:外螺紋結構 D:光軸方向 L1:視覺定位光束 L2:校準雷射光束 L3:景深量測光束 100: Array lens module 110: Substrate 112: Accommodation through hole 114: Calibration through hole 120: Lens frame 122: Adjustment hole 130: Lens assembly 132: Lens 200: Array lens module calibration equipment 210: Carrying platform 212: Clamp 220: Visual positioning module 222: Coaxial light source 224: Telecentric lens 226: Visual positioning receiving element 230: Laser alignment module 232: Off-axis laser light source 234: Laser alignment receiving element 240: Depth of field measurement module 242: Array light source 250: Coplanarity adjustment module 252: Robotic arm B1: Internal thread structure B2: External thread structure D: Optical axis direction L1: Visual positioning beam L2: Calibration laser beam L3: Depth of field measurement beam
圖1為本發明一實施例的陣列式透鏡模組校準設備的示意圖。 圖2為本發明一實施例的陣列式透鏡模組的上視示意圖。 圖3為圖2的陣列式透鏡模組沿A-A’線的剖面示意圖。 圖4為本發明一實施例的陣列式透鏡模組校準設備的校準方法的步驟流程圖。 FIG1 is a schematic diagram of an array lens module calibration device of an embodiment of the present invention. FIG2 is a schematic diagram of an array lens module of an embodiment of the present invention from above. FIG3 is a schematic diagram of a cross section of the array lens module of FIG2 along line A-A’. FIG4 is a flow chart of the steps of a calibration method of an array lens module calibration device of an embodiment of the present invention.
100:陣列式透鏡模組 100: Array lens module
200:陣列式透鏡模組校準設備 200: Array lens module calibration equipment
210:承載平台 210: Loading platform
212:夾具 212: Clamp
220:視覺定位模組 220: Visual positioning module
222:同軸光源 222: Coaxial light source
224:遠心鏡頭 224: Telecentric lens
226:視覺定位接收元件 226: Visual positioning receiving element
230:雷射對位模組 230: Laser alignment module
232:偏軸雷射光源 232: Off-axis laser light source
234:雷射對位接收元件 234: Laser alignment receiving element
240:景深量測模組 240: Depth of field measurement module
242:陣列光源 242: Array light source
250:共面度調整模組 250: Coplanarity adjustment module
252:機械手臂 252:Robotic Arm
L1:視覺定位光束 L1: Visual positioning beam
L2:校準雷射光束 L2: Calibration laser beam
L3:景深量測光束 L3: Depth of field measurement beam
Claims (15)
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| US18/391,629 US20240310241A1 (en) | 2023-03-17 | 2023-12-20 | Array lens module calibration equipment and calibration method thereof |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202363452701P | 2023-03-17 | 2023-03-17 | |
| US63/452,701 | 2023-03-17 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW202438970A TW202438970A (en) | 2024-10-01 |
| TWI888991B true TWI888991B (en) | 2025-07-01 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW112142751A TWI888991B (en) | 2023-03-17 | 2023-11-07 | Array objective lens module calibration equipment and calibration method thereof |
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| Country | Link |
|---|---|
| CN (2) | CN118671952A (en) |
| TW (1) | TWI888991B (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6611380B2 (en) * | 2001-12-21 | 2003-08-26 | Eastman Kodak Company | System and method for calibration of display system with linear array modulator |
| US9201241B2 (en) * | 2012-01-20 | 2015-12-01 | Imec | Calibration of micro-mirror arrays |
| CN105379245B (en) * | 2013-07-05 | 2018-08-07 | 柯尼卡美能达株式会社 | Compound eye imaging device |
| CN114114705A (en) * | 2021-11-25 | 2022-03-01 | 无锡奥普特自动化技术有限公司 | Full-automatic FAC (focal Fac) bably-bonded lens group collimation system |
-
2023
- 2023-11-07 TW TW112142751A patent/TWI888991B/en active
- 2023-12-12 CN CN202311705405.0A patent/CN118671952A/en active Pending
- 2023-12-19 CN CN202311768220.4A patent/CN118670687A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6611380B2 (en) * | 2001-12-21 | 2003-08-26 | Eastman Kodak Company | System and method for calibration of display system with linear array modulator |
| US9201241B2 (en) * | 2012-01-20 | 2015-12-01 | Imec | Calibration of micro-mirror arrays |
| CN105379245B (en) * | 2013-07-05 | 2018-08-07 | 柯尼卡美能达株式会社 | Compound eye imaging device |
| CN114114705A (en) * | 2021-11-25 | 2022-03-01 | 无锡奥普特自动化技术有限公司 | Full-automatic FAC (focal Fac) bably-bonded lens group collimation system |
Also Published As
| Publication number | Publication date |
|---|---|
| CN118670687A (en) | 2024-09-20 |
| CN118671952A (en) | 2024-09-20 |
| TW202438966A (en) | 2024-10-01 |
| TW202438970A (en) | 2024-10-01 |
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