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TWI883213B - Polarizing film with adhesive layer, image display panel, method for manufacturing image display panel, and adhesive layer - Google Patents

Polarizing film with adhesive layer, image display panel, method for manufacturing image display panel, and adhesive layer Download PDF

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TWI883213B
TWI883213B TW110122774A TW110122774A TWI883213B TW I883213 B TWI883213 B TW I883213B TW 110122774 A TW110122774 A TW 110122774A TW 110122774 A TW110122774 A TW 110122774A TW I883213 B TWI883213 B TW I883213B
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adhesive layer
layer
compound
polarizing film
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TW202206862A (en
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小野寬大
木村智之
外山雄祐
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日商日東電工股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L71/00Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02Non-macromolecular additives
    • C09J11/06Non-macromolecular additives organic
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J171/00Adhesives based on polyethers obtained by reactions forming an ether link in the main chain; Adhesives based on derivatives of such polymers
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/02Details
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/30Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
    • C09J2301/312Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature

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  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Nonlinear Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Polarising Elements (AREA)
  • Liquid Crystal (AREA)
  • Adhesive Tapes (AREA)

Abstract

本發明提供一種附黏著劑層之偏光薄膜,其具備的黏著劑層即便是在貼合於導電層上時,亦可維持預熱後之重工性,同時具有於高溫環境下的耐久性。本發明之附黏著劑層之偏光薄膜具備偏光薄膜以及由黏著劑組成物形成的黏著劑層。黏著劑組成物含有具酸基或酸酐基之化合物(C)及聚醚化合物(D)。針對黏著劑層,接著力P85 在10.0N/25mm以下,且接著力P105 大於10.0N/25mm。The present invention provides a polarizing film with an adhesive layer, wherein the adhesive layer can maintain the reworkability after preheating even when attached to a conductive layer, and has durability in a high temperature environment. The polarizing film with an adhesive layer of the present invention has a polarizing film and an adhesive layer formed by an adhesive composition. The adhesive composition contains a compound (C) having an acid group or anhydride group and a polyether compound (D). For the adhesive layer, the adhesion P 85 is less than 10.0N/25mm, and the adhesion P 105 is greater than 10.0N/25mm.

Description

附黏著劑層之偏光薄膜、影像顯示面板、影像顯示面板之製造方法及黏著劑層Polarizing film with adhesive layer, image display panel, method for manufacturing image display panel, and adhesive layer 發明領域 Invention Field

本發明涉及附黏著劑層之偏光薄膜、影像顯示面板、影像顯示面板之製造方法及黏著劑層。 The present invention relates to a polarizing film with an adhesive layer, an image display panel, a method for manufacturing an image display panel, and an adhesive layer.

背景技術 Background technology

液晶顯示裝置等影像顯示裝置所具備的影像顯示面板,例如具有偏光薄膜已透過黏著劑層貼合於透明基板之結構。於透明基板表面,為了防止影像顯示裝置帶電,有時會設置有含氧化銦錫(ITO)等金屬氧化物之導電層。當透明基板表面設置有導電層時,在影像顯示面板中,黏著劑層通常會與導電層直接相接。 The image display panel of an image display device such as a liquid crystal display device has a structure in which a polarizing film is attached to a transparent substrate through an adhesive layer. On the surface of the transparent substrate, in order to prevent the image display device from being charged, a conductive layer containing metal oxides such as indium tin oxide (ITO) is sometimes provided. When a conductive layer is provided on the surface of the transparent substrate, in the image display panel, the adhesive layer is usually directly connected to the conductive layer.

在製造影像顯示面板時,舉例言之,已具備黏著劑層及偏光薄膜的附黏著劑層之偏光薄膜會貼合於透明基板上。此時,有時會發生附黏著劑層之偏光薄膜之貼合位置偏離或者異物混入附黏著劑層之偏光薄膜與透明基板間的問題。在此情形下,為了提升影像顯示面板之生產性,宜將附黏著劑層之偏光薄膜自透明基板剝下並且將構件再利用。因此,附黏著劑層之偏光薄膜會要求能輕易地自透明基板剝離。本說明書中,有時會將附黏著劑層之偏光薄膜對透明基板或導電層的剝離容易度,表現為「黏著劑層之重工性」。 When manufacturing an image display panel, for example, a polarizing film with an adhesive layer that already has an adhesive layer and a polarizing film is attached to a transparent substrate. At this time, there may be a problem that the attachment position of the polarizing film with an adhesive layer deviates or foreign matter is mixed between the polarizing film with an adhesive layer and the transparent substrate. In this case, in order to improve the productivity of the image display panel, it is advisable to peel the polarizing film with an adhesive layer from the transparent substrate and reuse the component. Therefore, the polarizing film with an adhesive layer is required to be easily peeled off from the transparent substrate. In this manual, the ease of peeling off the polarizing film with adhesive layer from the transparent substrate or conductive layer is sometimes expressed as "the workability of the adhesive layer".

先前技術文獻 Prior art literature 專利文獻 Patent Literature

專利文獻1:日本專利第6071459號公報 Patent document 1: Japanese Patent No. 6071459

發明概要 Summary of invention

當偏光薄膜之水分量大時,若於高溫環境下(例如溫度高於95℃之環境下)使用影像顯示裝置,便會有影像顯示裝置之光學特性降低之傾向(例如專利文獻1)。當偏光薄膜中的偏光件含有聚乙烯醇時,於高溫環境下的光學特性之降低會特別明顯。因此,當設想於高溫環境下使用影像顯示裝置時,例如影像顯示裝置使用作為車載用顯示器時,必須在已將附黏著劑層之偏光薄膜貼合於透明基板之階段,將附黏著劑層之偏光薄膜於70℃~95℃左右之溫度下進行加熱處理(預熱),以事先減少偏光薄膜之水分量。 When the moisture content of the polarizing film is high, if the image display device is used in a high temperature environment (for example, an environment with a temperature higher than 95°C), the optical properties of the image display device tend to decrease (for example, Patent Document 1). When the polarizer in the polarizing film contains polyvinyl alcohol, the decrease in optical properties in a high temperature environment will be particularly obvious. Therefore, when it is envisioned to use the image display device in a high temperature environment, for example, when the image display device is used as a vehicle-mounted display, the polarizing film with an adhesive layer must be heated (preheated) at a temperature of about 70°C to 95°C at the stage where the polarizing film with an adhesive layer is attached to the transparent substrate to reduce the moisture content of the polarizing film in advance.

不過,藉由該預熱,有時偏光薄膜或透明基板會破損。因此,要求即使於預熱後亦可維持黏著劑層之重工性,而可自透明基板剝離附黏著劑層之偏光薄膜。然而,附黏著劑層之偏光薄膜中的黏著劑層通常會調整其組成,以於高溫環境下提升接著性。因此,當進行上述預熱時,會有黏著劑層之接著性提升而黏著劑層之重工性降低之傾向。依據發明人等之探討,當黏著劑層與導電層、尤其是ITO層直接相接時,重工性之降低明顯。 However, the polarizing film or the transparent substrate may be damaged by the preheating. Therefore, it is required that the adhesive layer can maintain its reproducibility even after preheating, and the polarizing film with the adhesive layer attached can be peeled off from the transparent substrate. However, the adhesive layer in the polarizing film with the adhesive layer attached usually adjusts its composition to improve the adhesion in a high temperature environment. Therefore, when the above-mentioned preheating is performed, there is a tendency that the adhesion of the adhesive layer is improved and the reproducibility of the adhesive layer is reduced. According to the research of the inventors, when the adhesive layer is directly connected to the conductive layer, especially the ITO layer, the reproducibility is significantly reduced.

依據發明人等之探討,若於黏著劑層中過量添加能提升黏著劑層重工性之化合物,可能可以抑制因預熱所導致的黏著劑層重工性之降低。然而,在此情形下,會有於高溫環境下黏著劑層之耐久性大幅降低之傾向。 According to the research of the inventors, if an excessive amount of a compound that can enhance the reusability of the adhesive layer is added to the adhesive layer, it may be possible to suppress the decrease in the reusability of the adhesive layer caused by preheating. However, in this case, there is a tendency for the durability of the adhesive layer to be greatly reduced in a high temperature environment.

故,本發明之目的在於提供一種附黏著劑層之偏光薄膜,其具備的黏著劑層即便是在貼合於導電層上時,亦可維持預熱後之重工性,同時具有於高溫環境下的耐久性。 Therefore, the purpose of the present invention is to provide a polarizing film with an adhesive layer, the adhesive layer of which can maintain the reworkability after preheating even when attached to the conductive layer, and has durability in a high temperature environment.

本發明提供一種附黏著劑層之偏光薄膜,其具備偏光薄膜以及由黏著劑組 成物形成的黏著劑層,且前述黏著劑組成物含有具酸基或酸酐基之化合物(C)及聚醚化合物(D),針對前述黏著劑層,利用下述試驗1求得之接著力P85在10.0N/25mm以下,且利用下述試驗2求得之接著力P105大於10.0N/25mm。 The present invention provides a polarizing film with an adhesive layer, which comprises a polarizing film and an adhesive layer formed by an adhesive composition, wherein the adhesive composition contains a compound (C) having an acid group or anhydride group and a polyether compound (D), and the adhesive layer has an adhesive force P 85 obtained by the following test 1 of less than 10.0 N/25 mm, and an adhesive force P 105 obtained by the following test 2 of greater than 10.0 N/25 mm.

試驗1:針對已貼合於附氧化銦錫層之玻璃之氧化銦錫層上的黏著劑層,於85℃下進行5小時加熱處理。測定在剝離速度300mm/min及剝離角度90°下用以將前述黏著劑層自前述氧化銦錫層剝下所需之力(接著力P85)。 Test 1: The adhesive layer on the indium tin layer attached to the indium tin layer was heat treated at 85°C for 5 hours. The force required to peel the adhesive layer from the indium tin layer at a peeling speed of 300 mm/min and a peeling angle of 90° was measured (bonding force P 85 ).

試驗2:針對已貼合於附氧化銦錫層之玻璃之氧化銦錫層上的黏著劑層,於105℃下進行24小時加熱處理。測定在剝離速度300mm/min及剝離角度90°下用以將前述黏著劑層自前述氧化銦錫層剝下所需之力(接著力P105)。 Test 2: The adhesive layer on the indium tin layer attached to the indium tin layer was heat treated at 105°C for 24 hours. The force required to peel the adhesive layer from the indium tin layer at a peeling speed of 300 mm/min and a peeling angle of 90° was measured (bonding force P 105 ).

再者,本發明提供一種影像顯示面板,其具備:上述附黏著劑層之偏光薄膜;含金屬氧化物之導電層;及透明基板;前述黏著劑層與前述導電層直接相接。 Furthermore, the present invention provides an image display panel, which comprises: the polarizing film with the above-mentioned adhesive layer; a conductive layer containing a metal oxide; and a transparent substrate; the above-mentioned adhesive layer is directly connected to the above-mentioned conductive layer.

再者,本發明提供一種影像顯示面板之製造方法,其係製造上述影像顯示面板之方法,包括:在已將前述附黏著劑層之偏光薄膜貼合於前述導電層之狀態下,針對前述黏著劑層,於70℃~95℃下進行第1加熱處理。 Furthermore, the present invention provides a method for manufacturing an image display panel, which is a method for manufacturing the above-mentioned image display panel, comprising: after the polarizing film with the above-mentioned adhesive layer is attached to the above-mentioned conductive layer, the above-mentioned adhesive layer is subjected to a first heating treatment at 70°C to 95°C.

再者,本發明提供一種黏著劑層,其係由黏著劑組成物所形成,且前述黏著劑組成物含有具酸基或酸酐基之化合物(C)及聚醚化合物(D),利用下述試驗1求得之接著力P85在10.0N/25mm以下,且利用下述試驗2求得之接著力P105大於10.0N/25mm。 Furthermore, the present invention provides an adhesive layer, which is formed by an adhesive composition, and the aforementioned adhesive composition contains a compound (C) having an acid group or anhydride group and a polyether compound (D), and the adhesion force P85 obtained by the following test 1 is less than 10.0N/25mm, and the adhesion force P105 obtained by the following test 2 is greater than 10.0N/25mm.

試驗1:針對已貼合於附氧化銦錫層之玻璃之氧化銦錫層上的黏著劑層,於85℃下進行5小時加熱處理。測定在剝離速度300mm/min及剝離角度90°下用以將前述黏著劑層自前述氧化銦錫層剝下所需之力(接著力P85)。 Test 1: The adhesive layer on the indium tin layer attached to the indium tin layer was heat treated at 85°C for 5 hours. The force required to peel the adhesive layer from the indium tin layer at a peeling speed of 300 mm/min and a peeling angle of 90° was measured (bonding force P 85 ).

試驗2:針對已貼合於附氧化銦錫層之玻璃之氧化銦錫層上的黏著劑層,於105℃下進行24小時加熱處理。測定在剝離速度300mm/min及剝離角度90°下用以 將前述黏著劑層自前述氧化銦錫層剝下所需之力(接著力P105)。 Test 2: The adhesive layer on the indium tin layer attached to the indium tin layer was heat treated at 105°C for 24 hours. The force required to peel the adhesive layer from the indium tin layer at a peeling speed of 300 mm/min and a peeling angle of 90° was measured (bonding force P 105 ).

依據本發明,可提供一種附黏著劑層之偏光薄膜,其具備的黏著劑層即便是在貼合於導電層上時,亦可維持預熱後之重工性,同時具有於高溫環境下的耐久性。 According to the present invention, a polarizing film with an adhesive layer can be provided, wherein the adhesive layer can maintain the reworkability after preheating even when attached to the conductive layer, and has durability in a high temperature environment.

1,1a,1b:黏著劑層 1,1a,1b: Adhesive layer

2,2a,2b:偏光薄膜 2,2a,2b: Polarizing film

3:導電層 3: Conductive layer

4,6:透明基板 4,6:Transparent substrate

5:液晶層 5: Liquid crystal layer

10,10a,10b:附黏著劑層之偏光薄膜 10,10a,10b: Polarizing film with adhesive layer

11:第1層 11: Layer 1

12:第2層 12: Layer 2

13:第3層 13: Layer 3

20:液晶單元 20: Liquid crystal unit

100,110:影像顯示面板 100,110: Image display panel

圖1為本發明一實施形態的附黏著劑層之偏光薄膜之截面圖。 Figure 1 is a cross-sectional view of a polarizing film with an adhesive layer in one embodiment of the present invention.

圖2為用以說明附黏著劑層之偏光薄膜中所含黏著劑層之特性之圖。 Figure 2 is a diagram used to illustrate the characteristics of the adhesive layer contained in the polarizing film with an adhesive layer.

圖3為本發明一實施形態的影像顯示面板之截面圖。 Figure 3 is a cross-sectional view of an image display panel in an embodiment of the present invention.

圖4為顯示影像顯示面板之變形例之截面圖。 FIG4 is a cross-sectional view of a variation of an image display panel.

用以實施發明之形態 The form used to implement the invention

以下,說明本發明之詳情,惟以下說明並非將本發明限制在特定實施形態之意。 The following describes the details of the present invention, but the following description is not intended to limit the present invention to a specific implementation form.

(附黏著劑層之偏光薄膜之實施形態) (Implementation form of polarizing film with adhesive layer)

如圖1所示,本實施形態之附黏著劑層之偏光薄膜10具備黏著劑層1及偏光薄膜2。黏著劑層1例如與偏光薄膜2直接相接。黏著劑層1之表面例如朝附黏著劑層之偏光薄膜10之外部露出。 As shown in FIG. 1 , the polarizing film 10 with an adhesive layer of the present embodiment includes an adhesive layer 1 and a polarizing film 2. The adhesive layer 1 is, for example, directly in contact with the polarizing film 2. The surface of the adhesive layer 1 is, for example, exposed to the outside of the polarizing film 10 with an adhesive layer.

附黏著劑層之偏光薄膜10中,針對黏著劑層1,利用試驗1求得之接著力P85在10.0N/25mm以下,利用試驗2求得之接著力P105則大於10.0N/25mm。 In the polarizing film 10 with an adhesive layer, for the adhesive layer 1, the adhesive force P 85 obtained by test 1 is less than 10.0 N/25 mm, and the adhesive force P 105 obtained by test 2 is greater than 10.0 N/25 mm.

試驗1是利用以下方法來進行。首先,將附黏著劑層之偏光薄膜10切出長150mm×寬25mm之薄長方形狀作成試驗片。接著,準備附氧化銦錫(ITO)層之玻璃。附ITO層之玻璃例如具有無鹼玻璃以及與無鹼玻璃相接的ITO層。無鹼玻璃為實質上不含鹼性成分(鹼金屬氧化物)的玻璃,詳而言之,玻璃中鹼性成 分之重量比率例如為1000ppm以下,進而為500ppm以下。無鹼玻璃例如為板狀,並具有0.5mm以上之厚度。ITO層例如實質上僅由非結晶性(非晶質)之ITO構成。不過,ITO層亦可含有ITO以外的不純物。ITO層例如可藉由濺鍍法等物理堆積法,形成於無鹼玻璃之表面上。 Test 1 was conducted using the following method. First, the polarizing film 10 with an adhesive layer was cut into a thin rectangular shape of 150 mm in length and 25 mm in width to prepare a test piece. Next, a glass with an indium tin oxide (ITO) layer was prepared. The glass with the ITO layer, for example, has alkali-free glass and an ITO layer in contact with the alkali-free glass. Alkali-free glass is glass that does not substantially contain alkaline components (alkaline metal oxides). Specifically, the weight ratio of alkaline components in the glass is, for example, less than 1000 ppm, and further, less than 500 ppm. The alkali-free glass is, for example, in the form of a plate and has a thickness of more than 0.5 mm. The ITO layer, for example, is substantially composed of only non-crystalline (amorphous) ITO. However, the ITO layer may also contain impurities other than ITO. The ITO layer can be formed on the surface of alkali-free glass by physical deposition methods such as sputtering.

接著,利用黏著劑層1,將試驗片貼合於附ITO層之玻璃的ITO層表面。試驗片於ITO層上的貼合例如使用積層機來進行,並且以氣泡不會混入ITO層與黏著劑層1間之方式實施。在已貼合試驗片後,收納於50℃及5氣壓(絕對壓力)之高壓釜內15分鐘,使ITO層與黏著劑層1之接合均質化,並且使黏著劑層1密著於ITO層。接著,針對試驗片(黏著劑層1),於85℃之大氣壓環境氣體下進行5小時加熱處理。隨後將試驗片放置於室溫(例如23℃)之環境氣體下,使試驗片之溫度降低至室溫。在剝離速度300mm/min及剝離角度90°下將試驗片自ITO層剝下(測定長度80mm)。此時,以1次/0.5s之間隔測定用以將試驗片自ITO層剝下所需之力。將所獲得測定值之平均值界定為接著力P85Next, the test piece is bonded to the ITO layer surface of the glass with the ITO layer using the adhesive layer 1. The bonding of the test piece to the ITO layer is performed using, for example, a laminating machine, and is performed in a manner that prevents bubbles from being mixed between the ITO layer and the adhesive layer 1. After the test piece has been bonded, it is placed in an autoclave at 50°C and 5 atmospheres (absolute pressure) for 15 minutes to homogenize the bonding between the ITO layer and the adhesive layer 1, and to make the adhesive layer 1 closely adhere to the ITO layer. Next, the test piece (adhesive layer 1) is subjected to a heat treatment for 5 hours in an atmospheric pressure environment at 85°C. Then, place the test piece in an ambient atmosphere at room temperature (e.g., 23°C) to lower the temperature of the test piece to room temperature. Peel the test piece off the ITO layer at a peeling speed of 300 mm/min and a peeling angle of 90° (measured length 80 mm). At this time, measure the force required to peel the test piece off the ITO layer at intervals of 1 time/0.5 s. The average value of the measured values is defined as the adhesion force P 85 .

於高壓釜內使ITO層與黏著劑層1之接合均質化後的加熱處理,是在105℃之大氣壓環境氣體下進行24小時,除此之外,試驗2可藉由與試驗1相同的方法來進行。 Test 2 can be performed in the same manner as Test 1 except that the heat treatment after homogenization of the bonding between the ITO layer and the adhesive layer 1 is performed in an autoclave under atmospheric pressure for 24 hours at 105°C.

依據發明人等之探討,當接著力P85在10.0N/25mm以下時,會有預熱後可充分維持黏著劑層1之重工性之傾向。接著力P85宜為9.0N/25mm以下,較佳為8.0N/25mm以下,更佳為7.0N/25mm以下,尤佳為6.0N/25mm以下。從實用上之觀點來看,接著力P85之下限值例如為3.0N/25mm。 According to the research of the inventors, when the adhesion force P 85 is below 10.0N/25mm, the heavy workability of the adhesive layer 1 tends to be fully maintained after preheating. The adhesion force P 85 is preferably below 9.0N/25mm, more preferably below 8.0N/25mm, more preferably below 7.0N/25mm, and even more preferably below 6.0N/25mm. From a practical point of view, the lower limit of the adhesion force P 85 is, for example, 3.0N/25mm.

依據發明人等之探討,當接著力P105大於10.0N/25mm時,黏著劑層1會有於高溫環境下具有充分耐久性之傾向。接著力P105宜為11.0N/25mm以上,較佳為12.0N/25mm以上,更佳為13.0N/25mm以上,尤佳為14.0N/25mm以上。接著力P105之上限值並無特殊限制,例如為30.0N/25mm。 According to the inventors' research, when the adhesion force P 105 is greater than 10.0 N/25 mm, the adhesive layer 1 tends to have sufficient durability in a high temperature environment. The adhesion force P 105 is preferably greater than 11.0 N/25 mm, more preferably greater than 12.0 N/25 mm, more preferably greater than 13.0 N/25 mm, and even more preferably greater than 14.0 N/25 mm. There is no particular upper limit on the adhesion force P 105 , for example, 30.0 N/25 mm.

再者,附黏著劑層之偏光薄膜10中,針對黏著劑層1,利用試驗3求得之接著力P0可為10.0N/25mm以下。除了於高壓釜內使ITO層與黏著劑層1之接合均質化後不進行加熱處理外,試驗3可藉由與試驗1相同的方法來進行。接著力P0宜為9.0N/25mm以下,較佳為8.0N/25mm以下,更佳為7.0N/25mm以下,尤佳為6.0N/25mm以下。從實用上之觀點來看,接著力P0之下限值例如為3.0N/25mm。 Furthermore, in the polarizing film 10 with an adhesive layer, the adhesive layer 1 can have an adhesive force P0 obtained by test 3 of 10.0 N/25 mm or less. Test 3 can be performed in the same manner as test 1, except that the ITO layer and the adhesive layer 1 are homogenized in an autoclave and then not subjected to a heat treatment. The adhesive force P0 is preferably 9.0 N/25 mm or less, more preferably 8.0 N/25 mm or less, more preferably 7.0 N/25 mm or less, and even more preferably 6.0 N/25 mm or less. From a practical point of view, the lower limit of the adhesive force P0 is, for example, 3.0 N/25 mm.

[黏著劑層] [Adhesive layer]

黏著劑層1係由黏著劑組成物所形成。黏著劑組成物含有具酸基或酸酐基之化合物(C)及聚醚化合物(D),更含有例如基礎聚合物。「基礎聚合物」例如為黏著劑組成物中以重量為基準含有最多的聚合物,作為有助於黏著劑層1之黏著性的成分而發揮機能。 The adhesive layer 1 is formed by an adhesive composition. The adhesive composition contains a compound (C) having an acid group or anhydride group and a polyether compound (D), and further contains, for example, a base polymer. The "base polymer" is, for example, the polymer that contains the most by weight in the adhesive composition, and functions as a component that contributes to the adhesiveness of the adhesive layer 1.

<化合物(C)> <Compound (C)>

化合物(C)例如為低分子化合物或低聚物。化合物(C)所具有的酸基例如為羧基或巰基,較佳為羧基。化合物(C)之酸基亦可為藉由使酸酐基水解而產生的基。酸酐基之具體例可舉例琥珀酸酐基、酞酸酐基、馬來酸酐基等羧酸酐基,較佳為琥珀酸酐基。化合物(C)中酸基之含有率與酸酐基之含有率之合計值並無特殊限制,例如為5.0wt%~50wt%,較佳為8.3wt%~40wt%。 Compound (C) is, for example, a low molecular weight compound or an oligomer. The acid group possessed by compound (C) is, for example, a carboxyl group or an oxalyl group, preferably a carboxyl group. The acid group of compound (C) may also be a group generated by hydrolyzing an acid anhydride group. Specific examples of the acid anhydride group include carboxylic anhydride groups such as succinic anhydride group, phthalic anhydride group, and maleic anhydride group, preferably a succinic anhydride group. The total value of the content of the acid group and the content of the acid anhydride group in compound (C) is not particularly limited, for example, 5.0wt%~50wt%, preferably 8.3wt%~40wt%.

化合物(C)亦可含有矽原子,更可含有與矽原子鍵結的水解性基(h1)。水解性基(h1)例如可藉由水解反應及/或縮合反應而形成矽氧烷鍵。水解性基(h1)可舉例如:鹵素原子、烷氧基、醯氧基、烯氧基、胺甲醯基、胺基、胺氧基、酮肟基等。當水解性基(h1)具有碳原子時,其碳數例如為10以下,較佳為6以下,更佳為4以下。尤其是以碳數4以下的烷氧基或烯氧基為佳,且以甲氧基或乙氧基尤佳。化合物(C)中水解性基(h1)之含有率例如為10wt%以上,較佳為13wt%~50wt%,更佳為13wt%~49wt%。 Compound (C) may also contain silicon atoms, and may further contain hydrolyzable groups (h1) bonded to silicon atoms. The hydrolyzable groups (h1) may, for example, form siloxane bonds by hydrolysis reaction and/or condensation reaction. Examples of hydrolyzable groups (h1) include halogen atoms, alkoxy groups, acyloxy groups, alkenyloxy groups, aminoformyl groups, amino groups, aminooxy groups, ketoxime groups, etc. When the hydrolyzable group (h1) has carbon atoms, its carbon number is, for example, 10 or less, preferably 6 or less, and more preferably 4 or less. In particular, alkoxy or alkenyloxy groups with a carbon number of 4 or less are preferred, and methoxy or ethoxy groups are particularly preferred. The content of the hydrolyzable group (h1) in compound (C) is, for example, 10wt% or more, preferably 13wt%~50wt%, and more preferably 13wt%~49wt%.

化合物(C)亦可含有酸基、酸酐基及水解性基(h1)以外的其他官能基,惟以不含為佳。作為一例,化合物(C)不含聚醚基。 Compound (C) may also contain other functional groups besides acid groups, acid anhydride groups and hydrolyzable groups (h1), but it is preferred that they do not contain any. As an example, compound (C) does not contain a polyether group.

化合物(C)例如含有選自於由具酸基或酸酐基之烷氧基矽烷化合物(S1)、具酸基或酸酐基之有機聚矽氧烷化合物(S2)及該等之水解縮合物所構成群組中之至少1種,較佳為含有有機聚矽氧烷化合物(S2)。 Compound (C) contains, for example, at least one selected from the group consisting of an alkoxysilane compound (S1) having an acid group or an acid anhydride group, an organic polysiloxane compound (S2) having an acid group or an acid anhydride group, and hydrolyzed condensates thereof, preferably an organic polysiloxane compound (S2).

烷氧基矽烷化合物(S1)例如以下述式(1)表示。 The alkoxysilane compound (S1) is represented by the following formula (1), for example.

R1R2 aSi(OR3)3-a (1) R 1 R 2 a Si(OR 3 ) 3-a (1)

式(1)中,R1為具酸基或酸酐基之碳數1~20之有機基。該有機基可為直鏈狀,亦可為支鏈狀,也可以是環狀。R2相互獨立,為氫原子或鹵素原子可取代的碳數1~20之一價烴基。R3相互獨立,為碳數1~10之烷基,較佳為甲基或乙基。a為0或1。 In formula (1), R1 is an organic group with 1 to 20 carbon atoms and an acid group or an acid anhydride group. The organic group may be linear, branched, or cyclic. R2 is independent of each other and is a monovalent hydrocarbon group with 1 to 20 carbon atoms that may be substituted by a hydrogen atom or a halogen atom. R3 is independent of each other and is an alkyl group with 1 to 10 carbon atoms, preferably a methyl group or an ethyl group. a is 0 or 1.

從烷氧基矽烷化合物(S1)之取得容易性之觀點來看,R1宜為下述式(2)所示有機基。 From the viewpoint of easy availability of the alkoxysilane compound (S1), R1 is preferably an organic group represented by the following formula (2).

Figure 110122774-A0305-12-0007-1
Figure 110122774-A0305-12-0007-1

式(2)中,A為直鏈狀或支鏈狀之碳數2~10之伸烷基或伸烯基,且以直鏈狀或支鏈狀之碳數2~6之伸烷基為佳。A之具體例為伸乙基、丙-1,3-二基等。 In formula (2), A is a linear or branched alkylene group or alkenylene group with 2 to 10 carbon atoms, and preferably a linear or branched alkylene group with 2 to 6 carbon atoms. Specific examples of A are ethylene group, propane-1,3-diyl, etc.

烷氧基矽烷化合物(S1)可舉例如:2-三甲氧基矽基乙基琥珀酸酐、3-三甲氧基矽基丙基琥珀酸酐(信越化學工業公司製,商品名「X-12-967C」)、3-三乙氧基矽基丙基琥珀酸酐、3-甲基二乙氧基矽基丙基琥珀酸酐、1-羧-3-三乙氧 基矽基丙基琥珀酸酐等。 Examples of the alkoxysilane compound (S1) include 2-trimethoxysilylethyl succinic anhydride, 3-trimethoxysilylpropyl succinic anhydride (manufactured by Shin-Etsu Chemical Co., Ltd., trade name "X-12-967C"), 3-triethoxysilylpropyl succinic anhydride, 3-methyldiethoxysilylpropyl succinic anhydride, 1-carboxy-3-triethoxysilylpropyl succinic anhydride, etc.

有機聚矽氧烷化合物(S2)為具有矽氧烷鍵的化合物,例如含有下述式(3)所示矽氧烷單元(U1)。有機聚矽氧烷化合物(S2)更可含有下述式(4)所示矽氧烷單元(U2)。 The organic polysiloxane compound (S2) is a compound having a siloxane bond, and for example contains a siloxane unit (U1) represented by the following formula (3). The organic polysiloxane compound (S2) may further contain a siloxane unit (U2) represented by the following formula (4).

Figure 110122774-A0305-12-0008-2
Figure 110122774-A0305-12-0008-2

Figure 110122774-A0305-12-0008-3
Figure 110122774-A0305-12-0008-3

式(3)中,X為具酸基或酸酐基之有機基,且以式(2)所示有機基為佳。式(3)及式(4)中,R4相互獨立,為氫原子、碳數1~10之烷氧基或鹵素原子可取代的碳數1~20之一價烴基。R4之烷氧基宜為甲氧基或乙氧基。R4之烴基例如為甲基。 In formula (3), X is an organic group having an acid group or an acid anhydride group, and preferably an organic group represented by formula (2). In formula (3) and formula (4), R 4 is independent of each other and is a hydrogen atom, an alkoxy group having 1 to 10 carbon atoms, or a monovalent alkyl group having 1 to 20 carbon atoms which may be substituted by a halogen atom. The alkoxy group of R 4 is preferably a methoxy group or an ethoxy group. The alkyl group of R 4 is, for example, a methyl group.

有機聚矽氧烷化合物(S2)中所含矽氧烷單元(U1)之數量並無特殊限制,例如為1~100,較佳為1~50,更佳為1~20。有機聚矽氧烷化合物(S2)中所含矽氧烷單元(U2)之數量並無特殊限制,例如為0~100,較佳為0~50,更佳為0~20。有機聚矽氧烷化合物(S2)宜含有至少1個矽氧烷單元(U2)。 The amount of siloxane units (U1) contained in the organic polysiloxane compound (S2) is not particularly limited, for example, 1 to 100, preferably 1 to 50, and more preferably 1 to 20. The amount of siloxane units (U2) contained in the organic polysiloxane compound (S2) is not particularly limited, for example, 0 to 100, preferably 0 to 50, and more preferably 0 to 20. The organic polysiloxane compound (S2) preferably contains at least 1 siloxane unit (U2).

有機聚矽氧烷化合物(S2)亦可具有以下結構:於下述式(5)所示烷氧基矽烷或其部分水解縮合物中所含O-Si鍵間,已插入至少1個矽氧烷單元(U1)。 於O-Si鍵間亦可插入矽氧烷單元(U1)及矽氧烷單元(U2)兩者。於複數個O-Si鍵中,亦可於一部分之O-Si鍵間插入矽氧烷單元(U1),於其他O-Si鍵間則插入矽氧烷單元(U2)。 The organic polysiloxane compound (S2) may also have the following structure: at least one siloxane unit (U1) is inserted between the O-Si bonds contained in the alkoxysilane or its partial hydrolyzed condensate represented by the following formula (5). Both the siloxane unit (U1) and the siloxane unit (U2) may be inserted between the O-Si bonds. Among a plurality of O-Si bonds, the siloxane unit (U1) may be inserted between some of the O-Si bonds, and the siloxane unit (U2) may be inserted between the other O-Si bonds.

R5 nSi(OR6)3-n (5) R 5 n Si(OR 6 ) 3-n (5)

式(5)中,R5相互獨立,為氫原子或鹵素原子可取代的碳數1~20之一價烴基。R6相互獨立,為碳數1~10之烷基。n為0或1。 In formula (5), R 5 is independent of each other and is a monovalent alkyl group having 1 to 20 carbon atoms which may be substituted by a hydrogen atom or a halogen atom. R 6 is independent of each other and is an alkyl group having 1 to 10 carbon atoms. n is 0 or 1.

式(5)所示烷氧基矽烷或其部分水解縮合物可舉例如:四甲氧基矽烷、甲基三甲氧基矽烷、四乙氧基矽烷、甲基三乙氧基矽烷、及該等烷氧基矽烷中1種或2種以上已部分水解縮合的化合物。 The alkoxysilane or its partially hydrolyzed condensate represented by formula (5) can be exemplified by tetramethoxysilane, methyltrimethoxysilane, tetraethoxysilane, methyltriethoxysilane, and compounds in which one or more of these alkoxysilanes have been partially hydrolyzed and condensed.

有機聚矽氧烷化合物(S2)例如可利用日本特開2013-129809號公報、日本特開2013-129691號公報等中記載的公知製造方法來製作。 The organic polysiloxane compound (S2) can be produced by a known production method described in, for example, Japanese Patent Publication No. 2013-129809 and Japanese Patent Publication No. 2013-129691.

化合物(C)只要具酸基或酸酐基,便不限於上述烷氧基矽烷化合物(S1)及有機聚矽氧烷化合物(S2)。化合物(C)亦可含有具酸基或酸酐基之(甲基)丙烯酸系低聚物(B)。(甲基)丙烯酸系低聚物(B)例如含有源自(甲基)丙烯酸烷基酯的結構單元作為主成分,同時含有源自具酸基或酸酐基之(甲基)丙烯酸酯的結構單元。本說明書中,「(甲基)丙烯酸酯」意指丙烯酸酯及/或甲基丙烯酸酯。「主成分」意指聚合物中以重量為基準含有最多的結構單元。 As long as the compound (C) has an acid group or an anhydride group, it is not limited to the above-mentioned alkoxysilane compound (S1) and organic polysiloxane compound (S2). The compound (C) may also contain a (meth)acrylic oligomer (B) having an acid group or an anhydride group. For example, the (meth)acrylic oligomer (B) contains a structural unit derived from an alkyl (meth)acrylate as a main component, and also contains a structural unit derived from a (meth)acrylate having an acid group or an anhydride group. In this specification, "(meth)acrylate" means acrylate and/or methacrylate. "Main component" means the structural unit containing the most by weight in the polymer.

構成(甲基)丙烯酸系低聚物(B)的(甲基)丙烯酸烷基酯可舉例如:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸二級丁酯、(甲基)丙烯酸三級丁酯、(甲基)丙烯酸戊酯、(甲基)丙烯酸異戊酯、(甲基)丙烯酸己酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸庚酯、(甲基)丙烯酸辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸壬酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸癸酯、(甲基)丙烯酸異癸酯、(甲基)丙烯酸十一酯、(甲基)丙烯酸十二酯等。具酸基之(甲基)丙烯酸酯可舉 例:(甲基)丙烯酸、(甲基)丙烯酸羧乙酯、(甲基)丙烯酸羧戊酯等含羧基之(甲基)丙烯酸酯。 Examples of the alkyl (meth)acrylate constituting the (meth)acrylic oligomer (B) include methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, isopropyl (meth)acrylate, butyl (meth)acrylate, isobutyl (meth)acrylate, dibutyl (meth)acrylate, tertiary butyl (meth)acrylate, pentyl (meth)acrylate, isopentyl (meth)acrylate, hexyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, heptyl (meth)acrylate, octyl (meth)acrylate, isooctyl (meth)acrylate, nonyl (meth)acrylate, isononyl (meth)acrylate, decyl (meth)acrylate, isodecyl (meth)acrylate, undecyl (meth)acrylate, and dodecyl (meth)acrylate. Examples of (meth)acrylates with acid groups include (meth)acrylic acid, carboxyethyl (meth)acrylate, carboxypentyl (meth)acrylate, and other (meth)acrylates containing carboxyl groups.

構成(甲基)丙烯酸系低聚物(B)的其他單體可舉例如:如(甲基)丙烯酸環己酯、(甲基)丙烯酸異莰酯、(甲基)丙烯酸二環戊烷基酯般的(甲基)丙烯酸與脂環族醇之酯;如(甲基)丙烯酸苯酯、(甲基)丙烯酸苄酯般的(甲基)丙烯酸芳基酯;獲得自萜烯化合物衍生物醇的(甲基)丙烯酸酯;如(甲基)丙烯酸甲氧基乙酯、(甲基)丙烯酸苯氧基乙酯般的含醚鍵之(甲基)丙烯酸烷基酯等。此種(甲基)丙烯酸酯可單獨或組合2種以上來使用。構成(甲基)丙烯酸系低聚物(B)的單體亦可使用構成後述(甲基)丙烯酸系聚合物(A)的單體。 Other monomers constituting the (meth)acrylic acid oligomer (B) include, for example, esters of (meth)acrylic acid and alicyclic alcohols such as cyclohexyl (meth)acrylate, isoborneol (meth)acrylate, and dicyclopentyl (meth)acrylate; aryl (meth)acrylates such as phenyl (meth)acrylate and benzyl (meth)acrylate; (meth)acrylates obtained from terpene compound derivative alcohols; ether-bonded alkyl (meth)acrylates such as methoxyethyl (meth)acrylate and phenoxyethyl (meth)acrylate. Such (meth)acrylates can be used alone or in combination of two or more. The monomers constituting the (meth)acrylic acid oligomer (B) can also be monomers constituting the (meth)acrylic acid polymer (A) described later.

(甲基)丙烯酸系低聚物(B)之聚合方法與後述(甲基)丙烯酸系聚合物(A)相同,可舉例溶液聚合、乳化聚合、塊狀聚合、乳化聚合、利用熱或活性能量線照射之聚合(熱聚合、活性能量線聚合)等。其中,從透明性、耐水性、成本等觀點來看,又以溶液聚合、活性能量線聚合為佳。所製得(甲基)丙烯酸系低聚物(B)可為無規共聚物、嵌段共聚物、接枝共聚物等中任一者。 The polymerization method of (meth)acrylic acid oligomer (B) is the same as that of (meth)acrylic acid polymer (A) described below, and examples thereof include solution polymerization, emulsion polymerization, block polymerization, emulsion polymerization, polymerization using heat or active energy ray irradiation (thermal polymerization, active energy ray polymerization), etc. Among them, solution polymerization and active energy ray polymerization are preferred from the perspectives of transparency, water resistance, cost, etc. The obtained (meth)acrylic acid oligomer (B) may be any of a random copolymer, a block copolymer, a graft copolymer, etc.

從提升黏著劑層1之耐久性、耐腐蝕性及重工性之觀點來看,黏著劑組成物中化合物(C)之含量相對於後述基礎聚合物100重量份宜為0.05~10重量份,較佳為3重量份以下,更佳為2重量份以下,尤佳為1重量份以下,最佳為0.6重量份以下。化合物(C)之含量,相對於基礎聚合物100重量份,較佳為0.1重量份以上,更佳為0.2重量份以上,尤佳為0.4重量份以上。 From the perspective of improving the durability, corrosion resistance and heavy workability of the adhesive layer 1, the content of the compound (C) in the adhesive composition is preferably 0.05 to 10 parts by weight, preferably 3 parts by weight or less, more preferably 2 parts by weight or less, particularly preferably 1 part by weight or less, and most preferably 0.6 parts by weight or less, relative to 100 parts by weight of the base polymer. The content of the compound (C) is preferably 0.1 parts by weight or more, more preferably 0.2 parts by weight or more, and particularly preferably 0.4 parts by weight or more relative to 100 parts by weight of the base polymer.

化合物(C)之重量平均分子量並無特殊限制,例如為10000以下,較佳為8000以下,更佳為5000以下,再更佳為3000以下,尤佳為1500以下。化合物(C)之重量平均分子量之下限值並無特殊限制,例如為100。 The weight average molecular weight of compound (C) is not particularly limited, for example, it is less than 10,000, preferably less than 8,000, more preferably less than 5,000, still more preferably less than 3,000, and particularly preferably less than 1,500. The lower limit of the weight average molecular weight of compound (C) is not particularly limited, for example, it is 100.

化合物(C)可源自酸基而具有低酸度常數pKa。化合物(C)之pKa(尤其是第一酸度常數)例如為12以下,較佳為11以下,更佳為8以下,再更佳為6以 下,尤佳為5以下。化合物(C)之pKa之下限值並無特殊限制,例如為1。本說明書中,pKa是在25℃的水中之值。 Compound (C) may be derived from an acid group and have a low acidity constant pKa. The pKa (especially the first acidity constant) of compound (C) is, for example, 12 or less, preferably 11 or less, more preferably 8 or less, still more preferably 6 or less, and particularly preferably 5 or less. The lower limit of the pKa of compound (C) is not particularly limited, and is, for example, 1. In this specification, pKa is the value in water at 25°C.

<聚醚化合物(D)> <Polyether compound (D)>

聚醚化合物(D)為具有聚醚骨架的化合物。聚醚骨架可為直鏈狀,亦可為支鏈狀。聚醚化合物(D)所具有的聚醚骨架例如含有下述式(6)所示氧化烯單元(U3)。 The polyether compound (D) is a compound having a polyether skeleton. The polyether skeleton may be a linear chain or a branched chain. The polyether skeleton possessed by the polyether compound (D) contains, for example, an oxyalkylene unit (U3) represented by the following formula (6).

Figure 110122774-A0305-12-0011-4
Figure 110122774-A0305-12-0011-4

式(6)中,R7為碳數1~10之直鏈狀或支鏈狀之伸烷基。R7之碳數宜為2~6,更佳為3。聚醚化合物(D)可含有1種或2種以上的氧化烯單元(U3)。聚醚化合物(D)可為無規共聚物,亦可為嵌段共聚物。氧化烯單元(U3)之具體例可舉例:氧乙烯基、氧丙烯基、氧丁烯基等。從材料製造容易度、材料穩定性等觀點來看,氧化烯單元(U3)宜為氧丙烯基(尤其是-CH2CH(CH3)O-)。 In formula (6), R7 is a linear or branched alkylene group having 1 to 10 carbon atoms. The carbon number of R7 is preferably 2 to 6, more preferably 3. The polyether compound (D) may contain one or more oxyalkylene units (U3). The polyether compound (D) may be a random copolymer or a block copolymer. Specific examples of the oxyalkylene unit (U3) include oxyethylene, oxypropylene, oxybutylene, etc. From the viewpoint of ease of material production and material stability, the oxyalkylene unit (U3) is preferably oxypropylene (especially -CH2CH ( CH3 )O-).

聚醚化合物(D)亦可含有矽原子,更可含有與矽原子鍵結的水解性基(h2)。水解性基(h2)例如可藉由水解反應及/或縮合反應而形成矽氧烷鍵。水解性基(h2)可舉例如:鹵素原子、烷氧基、醯氧基、烯氧基、胺甲醯基、胺基、胺氧基、酮肟基等。當水解性基(h2)具有碳原子時,其碳數例如為10以下,較佳為6以下,更佳為4以下。尤其是以碳數4以下的烷氧基或烯氧基為佳,且以甲氧基或乙氧基尤佳。聚醚化合物(D)中水解性基(h2)之含有率例如為14wt%以下,較佳為小於13wt%,更佳為小於10wt%。水解性基(h2)之含有率之下限值並無特殊限制,例如為2.0wt%,亦可為2.5wt%,也可以是3.0wt%。視情況之不同,水解性基(h2)之含有率亦可為2.0wt%以下。 The polyether compound (D) may also contain silicon atoms, and may further contain hydrolyzable groups (h2) bonded to silicon atoms. The hydrolyzable groups (h2) may, for example, form siloxane bonds by hydrolysis reaction and/or condensation reaction. Examples of the hydrolyzable groups (h2) include halogen atoms, alkoxy groups, acyloxy groups, alkenyloxy groups, aminoformyl groups, amino groups, aminooxy groups, ketoxime groups, and the like. When the hydrolyzable group (h2) has carbon atoms, its carbon number is, for example, 10 or less, preferably 6 or less, and more preferably 4 or less. In particular, alkoxy or alkenyloxy groups having a carbon number of 4 or less are preferred, and methoxy or ethoxy groups are particularly preferred. The content of the hydrolyzable groups (h2) in the polyether compound (D) is, for example, 14 wt% or less, preferably less than 13 wt%, and more preferably less than 10 wt%. There is no special limit on the lower limit of the content of the hydrolyzable group (h2), for example, 2.0wt%, 2.5wt%, or 3.0wt%. Depending on the situation, the content of the hydrolyzable group (h2) may be less than 2.0wt%.

與矽原子鍵結的水解性基(h2)例如位於聚醚化合物(D)之末端。作 為一例,聚醚化合物(D)於至少一個末端具有下述式(7)所示反應性矽基(b)。 The hydrolyzable group (h2) bonded to the silicon atom is, for example, located at the end of the polyether compound (D). As an example, the polyether compound (D) has a reactive silicon group (b) represented by the following formula (7) at at least one end.

-SiR8 aM3-a (7) -SiR 8 a M 3-a (7)

式(7)中,R8相互獨立,為可具有取代基之碳數1~20之一價有機基。R8宜為直鏈狀或支鏈狀之碳數1~8之烷基、碳數1~8之氟烷基或苯基,更佳為碳數1~6之烷基,且以甲基尤佳。當聚醚化合物(D)中存在有複數個R8時,複數個R8可互為相同,亦可不同。M相互獨立,為羥基或水解性基(h2)。當聚醚化合物(D)中存在有複數個M時,複數個M可互為相同,亦可不同。a為0~2之整數。 In formula (7), R8 is independent of each other and is a monovalent organic group having 1 to 20 carbon atoms which may have a substituent. R8 is preferably a linear or branched alkyl group having 1 to 8 carbon atoms, a fluoroalkyl group having 1 to 8 carbon atoms or a phenyl group, more preferably an alkyl group having 1 to 6 carbon atoms, and most preferably a methyl group. When a plurality of R8 are present in the polyether compound (D), the plurality of R8 may be the same as or different from each other. M is independent of each other and is a hydroxyl group or a hydrolyzable group (h2). When a plurality of M are present in the polyether compound (D), the plurality of M may be the same as or different from each other. a is an integer of 0 to 2.

聚醚化合物(D)例如於其末端具有每一分子至少1個的反應性矽基(b)。當聚醚化合物(D)為直鏈狀時,聚醚化合物(D)可於其末端具有1個或2個反應性矽基(b),較佳為具有2個反應性矽基(b)。當聚醚化合物(D)為支鏈狀時,聚醚化合物(D)則於主鏈末端或側鏈末端具有至少1個反應性矽基(b)。反應性矽基(b)之數量可因應聚醚化合物(D)之末端數適當調整,較佳為2個以上,亦可為3個以上。 For example, the polyether compound (D) has at least one reactive silyl group (b) per molecule at its end. When the polyether compound (D) is in a linear chain, the polyether compound (D) may have one or two reactive silyl groups (b) at its end, preferably two reactive silyl groups (b). When the polyether compound (D) is in a branched chain, the polyether compound (D) has at least one reactive silyl group (b) at the end of the main chain or the end of the side chain. The number of reactive silyl groups (b) can be appropriately adjusted according to the number of ends of the polyether compound (D), preferably more than two, and may be more than three.

聚醚化合物(D)宜於其分子末端之至少一部分具有反應性矽基(b),且於該分子中具有至少1個、較佳為1.1~5個、更佳為1.1~3個反應性矽基(b)。 The polyether compound (D) preferably has a reactive silicon group (b) at least at a portion of its molecular ends, and has at least 1, preferably 1.1 to 5, and more preferably 1.1 to 3 reactive silicon groups (b) in the molecule.

反應性矽基(b)宜為下述式(8)所示烷氧基矽基(b1)或下述式(9)所示烷氧基矽基(b2)。 The reactive silyl group (b) is preferably an alkoxysilyl group (b1) represented by the following formula (8) or an alkoxysilyl group (b2) represented by the following formula (9).

Figure 110122774-A0305-12-0012-5
Figure 110122774-A0305-12-0012-5

[化學式6]

Figure 110122774-A0305-12-0013-6
[Chemical formula 6]
Figure 110122774-A0305-12-0013-6

式(8)及式(9)中,R9、R10及R11各自相互獨立,為碳數1~6之一價烴基,可舉例如:直鏈狀或支鏈狀之碳數1~6之烷基、直鏈狀或支鏈狀之碳數2~6之烯基、碳數5~6之環烷基、苯基等。式(8)及式(9)中的-OR9、-OR10及-OR11之具體例可舉例:甲氧基、乙氧基、丙氧基、丙烯氧基、苯氧基等,較佳為甲氧基、乙氧基,尤其是以甲氧基為佳。 In formula (8) and formula (9), R 9 , R 10 and R 11 are each independent of each other and are monovalent hydrocarbon groups having 1 to 6 carbon atoms, such as linear or branched alkyl groups having 1 to 6 carbon atoms, linear or branched alkenyl groups having 2 to 6 carbon atoms, cycloalkyl groups having 5 to 6 carbon atoms, phenyl groups, etc. Specific examples of -OR 9 , -OR 10 and -OR 11 in formula (8) and formula (9) include methoxy groups, ethoxy groups, propoxy groups, propenyloxy groups, phenoxy groups, etc., preferably methoxy groups and ethoxy groups, and particularly preferably methoxy groups.

聚醚化合物(D)宜除了反應性矽基(b)外,主鏈實質上由聚醚骨架構成。不過,聚醚化合物(D)之主鏈亦可含有少量其他化學結構。其他化學結構可舉例如:源自用以形成氧化烯單元(U3)之引發劑的化學結構、及聚醚骨架與反應性矽基(b)之連結基等。聚醚化合物(D)中氧化烯單元(U3)之含有率宜為50重量%以上,更佳為80重量%以上。 The polyether compound (D) preferably has a main chain substantially composed of a polyether skeleton in addition to the reactive silyl group (b). However, the main chain of the polyether compound (D) may also contain a small amount of other chemical structures. Other chemical structures may include, for example, the chemical structure of the initiator used to form the oxyalkylene unit (U3), and the linking group between the polyether skeleton and the reactive silyl group (b). The content of the oxyalkylene unit (U3) in the polyether compound (D) is preferably 50% by weight or more, and more preferably 80% by weight or more.

聚醚化合物(D)例如以下述式(10)表示。 The polyether compound (D) is represented by the following formula (10), for example.

R12 aM3-aSi-X-Y-(AO)n-Z (10) R 12 a M 3-a Si-XY-(AO) n -Z (10)

式(10)中,R12相互獨立,為可具有取代基之碳數1~20之一價有機基。M相互獨立,為羥基或水解性基(h2)。a為0~2之整數。AO為直鏈狀或支鏈狀之碳數1~10之氧化烯基。n表示氧化烯基之平均加成莫耳數,為1~1700。X為直鏈狀或支鏈狀之碳數1~20之伸烷基。Y為醚鍵、酯鍵、胺甲酸乙酯鍵或碳酸酯鍵。Z為氫原子、碳數1~10之一價烴基、下述式(11)所示基或下述式(12)所示基。 In formula (10), R 12 is independent of each other and is a monovalent organic group having 1 to 20 carbon atoms which may have a substituent. M is independent of each other and is a hydroxyl group or a hydrolyzable group (h2). a is an integer of 0 to 2. AO is a linear or branched oxyalkylene group having 1 to 10 carbon atoms. n represents the average added molar number of the oxyalkylene group and is 1 to 1700. X is a linear or branched alkylene group having 1 to 20 carbon atoms. Y is an ether bond, an ester bond, a urethane bond or a carbonate bond. Z is a hydrogen atom, a monovalent hydrocarbon group having 1 to 10 carbon atoms, a group represented by the following formula (11) or a group represented by the following formula (12).

-Y1-X-SiR12 aM3-a (11) -Y 1 -X-SiR 12 a M 3-a (11)

-Q{-(OA)n-Y-X-SiR12 aM3-a}m (12) -Q{-(OA) n -YX-SiR 12 a M 3-a } m (12)

式(11)中,R12、M及X與式(10)相同。Y1為單鍵、-CO-鍵、-CONH-鍵或-COO-鍵。式(12)中,R12、M、X、Y及n與式(10)相同。OA與式(10)之AO相 同。Q為二價以上碳數1~10之烴基。m為Q之烴基價數減1之值。 In formula (11), R 12 , M and X are the same as those in formula (10). Y 1 is a single bond, a -CO- bond, a -CONH- bond or a -COO- bond. In formula (12), R 12 , M, X, Y and n are the same as those in formula (10). OA is the same as AO in formula (10). Q is a divalent or higher alkyl group having 1 to 10 carbon atoms. m is the alkyl group valence of Q minus 1.

式(10)中的X為直鏈狀或支鏈狀之碳數1~20之伸烷基。伸烷基之碳數宜為2~10,更佳為3。 X in formula (10) is a linear or branched alkylene group with 1 to 20 carbon atoms. The alkylene group preferably has 2 to 10 carbon atoms, more preferably 3 carbon atoms.

式(10)中的Y為聚醚骨架末端之氧化烯基與羥基反應所形成的鍵結,較佳為醚鍵或胺甲酸乙酯鍵,更佳為胺甲酸乙酯鍵。 Y in formula (10) is a bond formed by the reaction of the oxyalkylene group at the end of the polyether skeleton and the hydroxyl group, preferably an ether bond or a urethane bond, more preferably a urethane bond.

Z例如源自在合成氧化烯聚合物時的引發劑,即羥基化合物,且前述氧化烯聚合物為製作式(10)所示聚醚化合物(D)時所使用。Z例如為氫原子或一價之碳數1~10之烴基。此時,式(10)所示聚醚化合物(D)於其末端具有1個反應性矽基(b)。當Z為氫原子時,相當於羥基化合物使用了與氧化烯聚合物相同的構造單元之情形。當Z為一價之碳數1~10之烴基時,則相當於使用了具有1個羥基的羥基化合物之情形。 Z is derived from, for example, an initiator used in the synthesis of an oxyalkylene polymer, i.e., a hydroxyl compound, and the aforementioned oxyalkylene polymer is used in the preparation of the polyether compound (D) represented by formula (10). Z is, for example, a hydrogen atom or a monovalent carbonyl group having 1 to 10 carbon atoms. In this case, the polyether compound (D) represented by formula (10) has a reactive silicon group (b) at its end. When Z is a hydrogen atom, it is equivalent to the case where the hydroxyl compound uses the same structural unit as the oxyalkylene polymer. When Z is a monovalent carbonyl group having 1 to 10 carbon atoms, it is equivalent to the case where a hydroxyl compound having 1 hydroxyl group is used.

另一方面,當Z以式(11)或式(12)表示時,聚醚化合物(D)於其末端具有複數個反應性矽基(b)。當Z以式(11)表示時,相當於羥基化合物使用了與氧化烯聚合物相同的構造單元之情形。當Z以式(12)表示時,則相當於使用了不同於氧化烯聚合物之構造單元且具有2個羥基的羥基化合物之情形。另,式(11)之Y1與式(10)之Y相同,為聚醚骨架末端之氧化烯基與羥基反應所形成的鍵結。 On the other hand, when Z is represented by formula (11) or formula (12), the polyether compound (D) has a plurality of reactive silyl groups (b) at its terminal. When Z is represented by formula (11), it is equivalent to the case where the hydroxyl compound uses the same structural unit as the oxyalkylene polymer. When Z is represented by formula (12), it is equivalent to the case where a hydroxyl compound having two hydroxyl groups and a structural unit different from that of the oxyalkylene polymer is used. In addition, Y1 in formula (11) is the same as Y in formula (10), and is a bond formed by the reaction of the oxyalkylene group at the terminal of the polyether skeleton with the hydroxyl group.

從重工性之觀點來看,聚醚化合物(D)宜以下述式(13)、式(14)或式(15)表示。 From the viewpoint of heavy workability, the polyether compound (D) is preferably represented by the following formula (13), formula (14) or formula (15).

Z0-A2-O-(A1O)n-Z1 (13) Z 0 -A 2 -O-(A 1 O) n -Z 1 (13)

Z0-A2-NHCOO-(A1O)n-Z2 (14) Z 0 -A 2 -NHCOO-(A 1 O) n -Z 2 (14)

Z3-O-(A1O)n-CH{-CH2-(A1O)n-Z3}2 (15) Z 3 -O-(A 1 O) n -CH{-CH 2 -(A 1 O) n -Z 3 } 2 (15)

式(13)~(15)中,Z0為式(8)或式(9)所示烷氧基矽基。A1O為碳數2~6之氧化烯基,較佳為氧丙烯基。A1O之氧化烯基可為直鏈狀,亦可為支鏈狀。n表示A1O之平均加成莫耳數,為1~1700。式(13)及式(14)之A2為碳數2~6之伸烷基, 較佳為伸丙基。A2之伸烷基可為直鏈狀,亦可為支鏈狀。式(13)之Z1為氫原子或-A2-Z0。式(14)之Z2為氫原子或-CONH-A2-Z0。式(15)之Z3為氫原子或-A2-Z0,且至少1個Z3為-A2-Z0In formula (13) to (15), Z0 is an alkoxysilyl group represented by formula (8) or (9). A1O is an oxyalkylene group having 2 to 6 carbon atoms, preferably an oxypropylene group. The oxyalkylene group of A1O may be a linear chain or a branched chain. n represents the average addition molar number of A1O , which is 1 to 1700. A2 in formula (13) and formula (14) is an alkylene group having 2 to 6 carbon atoms, preferably an alkylene group. The alkylene group of A2 may be a linear chain or a branched chain. Z1 in formula (13) is a hydrogen atom or -A2- Z0 . Z2 in formula (14) is a hydrogen atom or -CONH- A2 - Z0 . In formula (15), Z 3 is a hydrogen atom or -A 2 -Z 0 , and at least one Z 3 is -A 2 -Z 0 .

式(14)所示化合物例如宜為下述式(16)所示化合物。 The compound represented by formula (14) is preferably, for example, a compound represented by the following formula (16).

Figure 110122774-A0305-12-0015-7
Figure 110122774-A0305-12-0015-7

式(16)中,R9、R10及R11各自相互獨立,為碳數1~6之一價烴基。n表示氧丙烯基之平均加成莫耳數,為1~1700。Z21為氫原子或下述式(17)所示三烷氧基矽基。 In formula (16), R 9 , R 10 and R 11 are each independent of each other and are monovalent hydrocarbon groups having 1 to 6 carbon atoms. n represents the average number of moles of oxypropylene groups added and is 1 to 1700. Z 21 is a hydrogen atom or a trialkoxysilyl group represented by the following formula (17).

Figure 110122774-A0305-12-0015-8
Figure 110122774-A0305-12-0015-8

式(17)中,R9、R10及R11與式(16)相同。 In the formula (17), R 9 , R 10 and R 11 are the same as those in the formula (16).

從重工性之觀點來看,聚醚化合物(D)之數量平均分子量宜為300~100000。數量平均分子量宜為500以上,進而為1000以上,進而為2000以上,進而為3000以上,進而為4000以上,進而為5000以上,並且宜為50000以下,進而為40000以下,進而為30000以下,進而為20000以下,進而為10000以下。上述式(10)~(16)之n(聚醚骨架中氧化烯基之平均加成莫耳數)例如可適當調整為聚醚化合物(D)之數量平均分子量在上述範圍內。當聚醚化合物(D)之數量平均分子量在1000以上時,上述n通常為10~1700。 From the viewpoint of heavy workability, the number average molecular weight of the polyether compound (D) is preferably 300 to 100,000. The number average molecular weight is preferably 500 or more, further 1,000 or more, further 2,000 or more, further 3,000 or more, further 4,000 or more, further 5,000 or more, and preferably 50,000 or less, further 40,000 or less, further 30,000 or less, further 20,000 or less, further 10,000 or less. n (the average added molar number of oxyalkylene groups in the polyether skeleton) in the above formulas (10) to (16) can be appropriately adjusted, for example, so that the number average molecular weight of the polyether compound (D) is within the above range. When the number average molecular weight of the polyether compound (D) is 1,000 or more, the above n is usually 10 to 1,700.

聚醚化合物(D)之Mw(重量平均分子量)/Mn(數量平均分子量)宜為3.0以下,更佳為1.6以下,尤佳為1.5以下。為了製得Mw/Mn小的聚醚化合物(D),宜利用以下方法:使用下述複合金屬氰化物錯合物作為催化劑,並於引發劑存在下,使環狀醚聚合而製得氧化烯聚合物,針對該氧化烯聚合物,令其末端改質而導入反應性矽基。 The Mw (weight average molecular weight)/Mn (number average molecular weight) of the polyether compound (D) is preferably less than 3.0, more preferably less than 1.6, and particularly preferably less than 1.5. In order to obtain a polyether compound (D) with a small Mw/Mn, the following method is preferably used: using the following composite metal cyanide complex as a catalyst, and in the presence of an initiator, polymerizing a cyclic ether to obtain an oxyalkylene polymer, and modifying the terminal of the oxyalkylene polymer to introduce a reactive silicon group.

聚醚化合物(D)例如可依下述來製造:使用於分子末端具有官能基的氧化烯聚合物作為原料,並透過伸烷基等有機基,使反應性矽基鍵結於該分子末端。使用作為原料的氧化烯聚合物,宜為在催化劑及引發劑存在下使環狀醚開環聚合而製得於末端具有羥基的聚合物。 The polyether compound (D) can be produced, for example, as follows: an oxyalkylene polymer having a functional group at the molecular end is used as a raw material, and a reactive silicon group is bonded to the molecular end through an organic group such as an alkylene group. The oxyalkylene polymer used as a raw material is preferably a polymer having a hydroxyl group at the terminal obtained by ring-opening polymerization of a cyclic ether in the presence of a catalyst and an initiator.

上述引發劑可使用具有每一分子1個以上之活性氫原子的化合物,例如具有每一分子1個以上之羥基的羥基化合物等。引發劑可舉例如:乙二醇、丙二醇、二丙二醇、丁二醇、六亞甲二醇、氫化雙酚A、新戊二醇、聚丁二烯二醇、二乙二醇、三乙二醇、聚乙二醇、烯丙醇、甲基烯丙醇、丙三醇、三羥甲基甲烷、三羥甲基丙烷、新戊四醇及該等之環氧烷加成物等羥基化合物等。引發劑可為1種或2種以上。 The above-mentioned initiator can use a compound having more than one active hydrogen atom per molecule, such as a hydroxy compound having more than one hydroxy group per molecule. Examples of the initiator include: ethylene glycol, propylene glycol, dipropylene glycol, butylene glycol, hexamethylene glycol, hydrogenated bisphenol A, neopentyl glycol, polybutadiene glycol, diethylene glycol, triethylene glycol, polyethylene glycol, allyl alcohol, methyl allyl alcohol, glycerol, trihydroxymethylmethane, trihydroxymethylpropane, neopentyltrol and hydroxy compounds such as alkylene oxide adducts thereof. The initiator can be one or more than two.

在引發劑存在下使環狀醚開環聚合時,可使用聚合催化劑。聚合催化劑例如可例示:氫氧化鉀、甲氧鉀等鉀化合物、氫氧化銫等銫化合物等鹼金屬化合物;複合金屬氰化物錯合物;金屬卟啉錯合物;具P=N鍵之化合物等。 When a cyclic ether is subjected to ring-opening polymerization in the presence of an initiator, a polymerization catalyst can be used. Examples of polymerization catalysts include: alkali metal compounds such as potassium hydroxide and potassium methoxide, cesium compounds such as cesium hydroxide, complex metal cyanide complexes, metal porphyrin complexes, compounds with a P=N bond, etc.

聚醚化合物(D)中的聚醚骨架(聚氧化烯鏈),宜由已藉由碳數2~6之環氧烷之開環聚合而形成的氧化烯單元所構成,更為理想的是由已藉由選自於由環氧乙烷、環氧丙烷及環氧丁烷所構成群組中至少1種以上環氧烷之開環聚合而形成的氧化烯單元所構成,尤其理想的是由已藉由環氧丙烷之開環聚合而形成的氧化烯單元所構成。當聚氧化烯鏈由2種以上的氧化烯單元構成時,2種以上的氧化烯單元之排列法可為塊狀,亦可為無規狀。 The polyether skeleton (polyoxyalkylene chain) in the polyether compound (D) is preferably composed of oxyalkylene units formed by ring-opening polymerization of alkylene oxides having 2 to 6 carbon atoms, more preferably composed of oxyalkylene units formed by ring-opening polymerization of at least one oxyalkylene oxide selected from the group consisting of ethylene oxide, propylene oxide and butylene oxide, and particularly preferably composed of oxyalkylene units formed by ring-opening polymerization of propylene oxide. When the polyoxyalkylene chain is composed of two or more oxyalkylene units, the arrangement of the two or more oxyalkylene units may be block-shaped or random.

上述式(14)所示聚醚化合物(D)例如可依下述製得:針對具有聚氧化烯鏈與羥基的聚合物,使用具有反應性矽基(b)及異氰酸酯基的化合物進行胺甲酸乙酯化反應。式(14)所示聚醚化合物(D)亦可利用以下方法製得:於具有不飽和基的氧化烯聚合物、例如以烯丙醇作為引發劑使環氧烷聚合而製得烯丙基末端聚氧丙烯單醇的不飽和基上,加成氫矽烷或巰基矽烷而於分子末端導入反應性矽基(b)。 The polyether compound (D) represented by the above formula (14) can be prepared, for example, by the following method: for a polymer having a polyoxyalkylene chain and a hydroxyl group, a compound having a reactive silyl group (b) and an isocyanate group is used to carry out a urethanization reaction. The polyether compound (D) represented by the formula (14) can also be prepared by the following method: on an oxyalkylene polymer having an unsaturated group, for example, an allyl-terminated polyoxypropylene monol obtained by polymerizing epoxide using allyl alcohol as an initiator, a hydrosilane or a silyl group is added to the unsaturated group to introduce a reactive silyl group (b) at the molecular end.

於在引發劑存在下使環狀醚開環聚合而製得羥基末端氧化烯聚合物的末端基導入反應性矽基(b)之方法並無特殊限制,通常宜為於末端基更透過有機基連結反應性矽基的下述(a)~(c)之方法。 There is no particular limitation on the method of introducing a reactive silyl group (b) into the terminal group of a hydroxyl-terminated oxyalkylene polymer obtained by ring-opening polymerization of a cyclic ether in the presence of an initiator. Generally, the following methods (a) to (c) are preferably used, wherein the terminal group is further linked to the reactive silyl group via an organic group.

(a)於具有羥基的氧化烯聚合物之末端導入不飽和基後,使反應性矽基(b)鍵結於該不飽和基的方法。 (a) A method of introducing an unsaturated group into the terminal of an oxyalkylene polymer having a hydroxyl group and then bonding a reactive silicon group (b) to the unsaturated group.

該方法更可例示以下2種方法(a-1)及(a-2)。 This method can be further exemplified by the following two methods (a-1) and (a-2).

(a-1)在鉑化合物等催化劑存在下,使矽氫基化合物與上述不飽和基反應,使用所謂矽氫化反應的方法。 (a-1) A method of so-called silylation reaction in which a silane compound is reacted with the above-mentioned unsaturated group in the presence of a catalyst such as a platinum compound.

(a-2)使巰基矽烷化合物與不飽和基反應的方法。 (a-2) A method of reacting a silane compound with an unsaturated group.

(a-2)之巰基矽烷化合物可舉例如:3-巰丙基三甲氧基矽烷、3-巰丙基三乙氧基矽烷、3-巰丙基三異丙烯氧基矽烷、3-巰丙基甲基二甲氧基矽烷、3-巰丙基二甲基單甲氧基矽烷、3-巰丙基甲基二乙氧基矽烷等。 Examples of the silane compound (a-2) include 3-butyltrimethoxysilane, 3-butyltriethoxysilane, 3-butyltriisopropenyloxysilane, 3-butylmethyldimethoxysilane, 3-butyldimethylmonomethoxysilane, 3-butylmethyldiethoxysilane, etc.

使不飽和基與巰基反應時,可使用被用作自由基聚合引發劑的自由基產生劑等化合物,亦可依照期望不使用自由基聚合引發劑而利用放射線或熱來進行反應。自由基聚合引發劑可舉例如過氧化物系、偶氮系及氧化還原系聚合引發劑以及金屬化合物催化劑等,具體而言,可舉例:2,2’-偶氮雙異丁腈、2,2’-偶氮雙-2-甲基丁腈、過氧化苯甲醯、過氧三級烷基酯、過氧化乙醯及過氧碳酸二異丙酯等。使用自由基聚合引發劑使不飽和基與巰基反應時的反應條件依照聚 合引發劑之分解溫度(半衰期溫度)而有所不同,例如宜於20~200℃、較佳為50~150℃之反應溫度下,進行數小時~數十小時反應。 When the unsaturated group and the alkyl group are reacted, a compound such as a free radical generator used as a free radical polymerization initiator may be used, or the reaction may be carried out using radiation or heat without using a free radical polymerization initiator as desired. Examples of free radical polymerization initiators include peroxide-based, azo-based, and redox-based polymerization initiators and metal compound catalysts, and specifically, examples include 2,2'-azobisisobutyronitrile, 2,2'-azobis-2-methylbutyronitrile, benzoyl peroxide, tertiary alkyl peroxide, acetyl peroxide, and diisopropyl peroxycarbonate. The reaction conditions when using free radical polymerization initiators to make unsaturated groups react with hydroxyl groups vary according to the decomposition temperature (half-life temperature) of the polymerization initiator. For example, the reaction temperature is preferably 20~200℃, preferably 50~150℃, and the reaction is carried out for several hours to dozens of hours.

於氧化烯聚合物之末端導入不飽和基的方法可舉例以下方法:使反應劑與氧化烯聚合物反應,而該反應劑具有能利用醚鍵、酯鍵、胺甲酸乙酯鍵或碳酸酯鍵等與氧化烯聚合物之末端羥基連結的官能基以及不飽和基。亦可利用以下方法:在引發劑存在下令環狀醚聚合時,使烯丙基環氧丙基醚等含不飽和基之環氧化合物共聚合,藉此於氧化烯聚合物之末端之至少一部分導入不飽和基。 The method of introducing an unsaturated group at the end of an oxyalkylene polymer may be exemplified by the following method: reacting a reactant with an oxyalkylene polymer, wherein the reactant has a functional group that can be linked to the terminal hydroxyl group of the oxyalkylene polymer by an ether bond, an ester bond, a urethane bond, or a carbonate bond, and an unsaturated group. The following method may also be used: when polymerizing a cyclic ether in the presence of an initiator, copolymerizing an epoxy compound containing an unsaturated group such as allyl epoxypropyl ether, thereby introducing an unsaturated group at least partially at the end of the oxyalkylene polymer.

矽氫化反應宜於60~120℃之溫度下進行。一般而言,以數小時以內的反應時間矽氫化反應即可充分進行。 The silicification reaction is preferably carried out at a temperature of 60~120℃. Generally speaking, the silicification reaction can be fully carried out within a few hours.

(b)使末端具有羥基的氧化烯聚合物與具有反應性矽基(b)的異氰酸酯矽烷化合物反應的方法。 (b) A method of reacting an oxyalkylene polymer having a hydroxyl group at the end with an isocyanate silane compound having a reactive silyl group (b).

異氰酸酯矽烷化合物可例示:1-異氰酸酯甲基三甲氧基矽烷、1-異氰酸酯甲基三乙氧基矽烷、1-異氰酸酯丙基三甲氧基矽烷、1-異氰酸酯丙基三乙氧基矽烷、3-異氰酸酯丙基三甲氧基矽烷、3-異氰酸酯丙基三乙氧基矽烷、1-異氰酸酯甲基甲基二甲氧基矽烷、1-異氰酸酯甲基二甲基單甲氧基矽烷、1-異氰酸酯甲基甲基二乙氧基矽烷、1-異氰酸酯丙基甲基二甲氧基矽烷、1-異氰酸酯丙基二甲基單甲氧基矽烷、1-異氰酸酯丙基甲基二乙氧基矽烷、3-異氰酸酯丙基甲基二甲氧基矽烷、3-異氰酸酯丙基二甲基單甲氧基矽烷及3-異氰酸酯丙基甲基二乙氧基矽烷等異氰酸酯矽烷系化合物。其中,更佳為3-異氰酸酯丙基三甲氧基矽烷、1-異氰酸酯甲基甲基二甲氧基矽烷,尤佳為3-異氰酸酯丙基三甲氧基矽烷。 Examples of the isocyanate silane compound include 1-isocyanate methyl trimethoxy silane, 1-isocyanate methyl triethoxy silane, 1-isocyanate propyl trimethoxy silane, 1-isocyanate propyl triethoxy silane, 3-isocyanate propyl trimethoxy silane, 3-isocyanate propyl triethoxy silane, 1-isocyanate methyl methyl dimethoxy silane, 1-isocyanate methyl dimethyl monomethoxy silane, Isocyanate silane compounds such as silane, 1-isocyanate methyl methyl diethoxy silane, 1-isocyanate propyl methyl dimethoxy silane, 1-isocyanate propyl dimethyl monomethoxy silane, 1-isocyanate propyl methyl diethoxy silane, 3-isocyanate propyl methyl dimethoxy silane, 3-isocyanate propyl dimethyl monomethoxy silane and 3-isocyanate propyl methyl diethoxy silane. Among them, 3-isocyanate propyl trimethoxy silane and 1-isocyanate methyl methyl dimethoxy silane are more preferred, and 3-isocyanate propyl trimethoxy silane is particularly preferred.

氧化烯聚合物與異氰酸酯矽烷化合物之反應,宜設為異氰酸酯矽烷化合物之異氰酸酯基(NCO)相對於氧化烯聚合物之羥基(OH)之莫耳比為NCO/OH=0.80~1.05來進行。該方法之製造步驟數少,因此可大幅縮短步驟時間, 而且於製造步驟途中附帶產生的不純物亦少,因此亦無需精製等煩雜之操作。更為理想的NCO基與OH基之莫耳比為NCO/OH=0.85~1.00。當NCO之比率低時,會產生殘存的OH基與反應性矽基之反應等,因而有儲存穩定性降低之情形。在此情形下,宜重新與異氰酸酯矽烷化合物或單異氰酸酯化合物反應,消耗過剩的OH基,藉此調整為預定矽化率。 The reaction of the oxyalkylene polymer and the isocyanate silane compound is preferably carried out at a molar ratio of the isocyanate group (NCO) of the isocyanate silane compound to the hydroxyl group (OH) of the oxyalkylene polymer of NCO/OH=0.80~1.05. This method has a small number of manufacturing steps, so the step time can be greatly shortened. In addition, there are few impurities produced during the manufacturing steps, so there is no need for complicated operations such as purification. The more ideal molar ratio of NCO group to OH group is NCO/OH=0.85~1.00. When the NCO ratio is low, the residual OH group will react with the reactive silane group, thereby reducing the storage stability. In this case, it is advisable to re-react with an isocyanate silane compound or a monoisocyanate compound to consume the excess OH groups and thereby adjust to the predetermined silicidation rate.

使氧化烯聚合物之羥基與上述異氰酸酯矽烷化合物反應時,亦可使用公知胺甲酸乙酯化反應催化劑。依照胺甲酸乙酯化反應催化劑之有無使用及使用量之不同,反應溫度及反應完結前所需反應時間會不同,氧化烯聚合物與異氰酸酯矽烷化合物之反應例如宜於20~200℃、較佳為50~150℃之溫度下進行數小時。 When the hydroxyl group of the oxyalkylene polymer reacts with the above-mentioned isocyanate silane compound, a known urethanization catalyst can also be used. Depending on whether the urethanization catalyst is used and the amount used, the reaction temperature and the reaction time required before the reaction is completed will be different. The reaction of the oxyalkylene polymer and the isocyanate silane compound is preferably carried out at a temperature of 20~200℃, preferably 50~150℃ for several hours.

(c)在異氰酸酯基過剩之條件下,使聚異氰酸酯化合物對分子末端具有羥基的氧化烯聚合物反應,製造出末端之至少一部分具有異氰酸酯基的氧化烯聚合物,再使具官能基之矽化合物對該異氰酸酯基反應的方法。 (c) A method of reacting a polyisocyanate compound with an oxyalkylene polymer having a hydroxyl group at the molecular end under the condition of excess isocyanate groups to produce an oxyalkylene polymer having an isocyanate group at at least a portion of the terminal, and then reacting a silicon compound having a functional group with the isocyanate group.

矽化合物之官能基為選自於由羥基、羧基、巰基、一級胺基及二級胺基所構成群組中至少1種含活性氫的基。矽化合物可例示:N-苯基-3-胺丙基三甲氧基矽烷、3-胺丙基三甲氧基矽烷、3-胺丙基三乙氧基矽烷、N-苯基-3-胺丙基甲基二甲氧基矽烷、3-胺丙基甲基二甲氧基矽烷、3-胺丙基甲基二乙氧基矽烷等胺基矽烷系化合物;3-巰丙基三甲氧基矽烷、3-巰丙基甲基二甲氧基矽烷等巰基矽烷系化合物。使氧化烯聚合物與上述矽化合物反應時,亦可使用公知胺甲酸乙酯化反應催化劑。依照胺甲酸乙酯化反應催化劑之有無使用及使用量之不同,反應溫度及反應完結前所需反應時間會不同,上述反應例如宜於20~200℃、較佳為50~150℃之溫度下進行數小時反應。 The functional group of the silicon compound is at least one group containing active hydrogen selected from the group consisting of hydroxyl, carboxyl, butyl, primary amine and secondary amine. Examples of the silicon compound include aminosilane compounds such as N-phenyl-3-aminopropyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, N-phenyl-3-aminopropylmethyldimethoxysilane, 3-aminopropylmethyldimethoxysilane, 3-aminopropylmethyldiethoxysilane; and butylsilane compounds such as 3-butyltrimethoxysilane and 3-butylmethyldimethoxysilane. When reacting the oxyalkylene polymer with the above silicon compound, a known urethanization catalyst may also be used. Depending on whether or not a catalyst is used in the urethanization reaction and the amount used, the reaction temperature and the reaction time required for the reaction to be completed will be different. For example, the above reaction is preferably carried out at a temperature of 20-200°C, preferably 50-150°C, for several hours.

聚醚化合物(D)之具體例可舉例:鐘化(KANEKA)公司製之MS聚合物S203、S303、S810;SILYL EST250、EST280;SAT10、SAT200、SAT220、 SAT350、SAT400、旭硝子公司製之EXCESTAR S2410、S2420、S3430等。 Specific examples of polyether compounds (D) include: MS polymers S203, S303, S810 manufactured by KANEKA Corporation; SILYL EST250, EST280; SAT10, SAT200, SAT220, SAT350, SAT400; EXCESTAR S2410, S2420, S3430 manufactured by Asahi Glass Co., Ltd., etc.

黏著劑組成物中聚醚化合物(D)之含量相對於基礎聚合物100重量份宜為0.001~20重量份。藉由令該含量在0.001重量份以上,會有黏著劑層1之重工性充分提升之傾向。聚醚化合物(D)之含量宜為0.01重量份以上,且更宜為0.02重量份以上,進而為0.1重量份以上,進而為0.5重量份以上。當聚醚化合物(D)之含量在20重量份以下時,黏著劑層1具有充分之耐濕性,在可靠性試驗等中不易產生剝落。聚醚化合物(D)之含量宜為10重量份以下,且更宜為5重量份以下,進而為3重量份以下。聚醚化合物(D)之含量亦可為1重量份以下,進而為0.5重量份以下。 The content of the polyether compound (D) in the adhesive composition is preferably 0.001 to 20 parts by weight relative to 100 parts by weight of the base polymer. By making the content above 0.001 parts by weight, there is a tendency that the workability of the adhesive layer 1 is sufficiently improved. The content of the polyether compound (D) is preferably above 0.01 parts by weight, and more preferably above 0.02 parts by weight, further above 0.1 parts by weight, and further above 0.5 parts by weight. When the content of the polyether compound (D) is below 20 parts by weight, the adhesive layer 1 has sufficient moisture resistance and is not prone to peeling in reliability tests, etc. The content of the polyether compound (D) is preferably below 10 parts by weight, and more preferably below 5 parts by weight, and further below 3 parts by weight. The content of the polyether compound (D) may also be below 1 part by weight, and further below 0.5 parts by weight.

<黏著劑> <Adhesive>

黏著劑組成物中所含黏著劑可舉例如:橡膠系黏著劑、丙烯酸系黏著劑、聚矽氧系黏著劑、胺甲酸乙酯系黏著劑、乙烯基烷基醚系黏著劑、聚乙烯基吡咯啶酮系黏著劑、聚丙烯醯胺系黏著劑、纖維素系黏著劑等。從光學透明性優異、具有適度潤濕性、凝集性、接著性等黏著特性而且耐候性、耐熱性等優異之觀點來看,黏著劑宜為丙烯酸系黏著劑。 Adhesives contained in the adhesive composition include, for example, rubber adhesives, acrylic adhesives, silicone adhesives, urethane adhesives, vinyl alkyl ether adhesives, polyvinyl pyrrolidone adhesives, polyacrylamide adhesives, cellulose adhesives, etc. From the perspective of excellent optical transparency, moderate wettability, cohesion, adhesion and other adhesive properties, as well as excellent weather resistance and heat resistance, the adhesive is preferably an acrylic adhesive.

含有丙烯酸系黏著劑的黏著劑組成物含有(甲基)丙烯酸系聚合物(A)作為基礎聚合物。(甲基)丙烯酸系聚合物(A)例如含有源自(甲基)丙烯酸烷基酯的結構單元作為主成分。 The adhesive composition containing an acrylic adhesive contains a (meth)acrylic polymer (A) as a base polymer. The (meth)acrylic polymer (A) contains, for example, a structural unit derived from an alkyl (meth)acrylate as a main component.

<(甲基)丙烯酸系聚合物(A)> <(Meth)acrylic acid polymer (A)>

用以形成(甲基)丙烯酸系聚合物(A)之主骨架的(甲基)丙烯酸烷基酯中所含烷基之碳數並無特殊限制,例如為1~18。該烷基可為直鏈狀,亦可為支鏈狀,也可以是環狀。烷基可舉例如:甲基、乙基、丙基、異丙基、丁基、異丁基、戊基、己基、環己基、庚基、2-乙基己基、異辛基、壬基、癸基、異癸基、十二基、異肉豆蔻基、月桂基、十三基、十五基、十六基、十七基、十八基等。(甲基)丙烯 酸烷基酯可單獨或組合使用。烷基之平均碳數宜為3~9。 The carbon number of the alkyl group contained in the (meth)acrylic acid alkyl ester used to form the main skeleton of the (meth)acrylic polymer (A) is not particularly limited, and is, for example, 1 to 18. The alkyl group may be a straight chain, a branched chain, or a ring. Examples of the alkyl group include: methyl, ethyl, propyl, isopropyl, butyl, isobutyl, pentyl, hexyl, cyclohexyl, heptyl, 2-ethylhexyl, isooctyl, nonyl, decyl, isodecyl, dodecyl, isomyristyl, lauryl, tridecyl, pentadecyl, hexadecyl, heptadecanyl, octadecyl, etc. (meth)acrylic acid alkyl esters may be used alone or in combination. The average carbon number of the alkyl group is preferably 3 to 9.

構成(甲基)丙烯酸系聚合物(A)的單體,除了(甲基)丙烯酸烷基酯外,還可舉例選自於由含芳香環之(甲基)丙烯酸酯、含醯胺基之單體、含羧基之單體及含羥基之單體所構成群組中1種以上的共聚單體。共聚單體可單獨或組合使用。(甲基)丙烯酸系聚合物(A)宜具有起因於含羧基之單體等共聚單體的酸基。具酸基之(甲基)丙烯酸系聚合物(A)適於維持預熱後黏著劑層1之重工性。 The monomers constituting the (meth)acrylic acid polymer (A) may be, in addition to (meth)acrylic acid alkyl esters, one or more copolymer monomers selected from the group consisting of aromatic ring-containing (meth)acrylic acid esters, amide-containing monomers, carboxyl-containing monomers, and hydroxyl-containing monomers. The copolymer monomers may be used alone or in combination. The (meth)acrylic acid polymer (A) preferably has an acid group derived from a copolymer monomer such as a carboxyl-containing monomer. The (meth)acrylic acid polymer (A) having an acid group is suitable for maintaining the heavy workability of the adhesive layer 1 after preheating.

含芳香環之(甲基)丙烯酸酯是在其結構中含有芳香環結構且含有(甲基)丙烯醯基的化合物。芳香環可舉例如:苯環、萘環、聯苯環等。含芳香環之(甲基)丙烯酸酯具有調整因偏光薄膜2等光學薄膜之收縮使得應力施加於黏著劑層1時產生的相位差之效果,可抑制因光學薄膜之收縮而產生的漏光。 Aromatic ring-containing (meth)acrylate is a compound containing an aromatic ring structure and a (meth)acryloyl group in its structure. Examples of aromatic rings include benzene rings, naphthalene rings, biphenyl rings, etc. Aromatic ring-containing (meth)acrylate has the effect of adjusting the phase difference generated when stress is applied to the adhesive layer 1 due to the contraction of optical films such as polarizing films 2, and can suppress light leakage caused by the contraction of optical films.

含芳香環之(甲基)丙烯酸酯可舉例如:(甲基)丙烯酸苄酯、(甲基)丙烯酸苯酯、鄰苯基苯酚(甲基)丙烯酸酯、(甲基)丙烯酸苯氧酯、(甲基)丙烯酸苯氧基乙酯、(甲基)丙烯酸苯氧基丙酯、苯氧基二乙二醇(甲基)丙烯酸酯、環氧乙烷改質壬基酚(甲基)丙烯酸酯、環氧乙烷改質甲酚(甲基)丙烯酸酯、苯酚環氧乙烷改質(甲基)丙烯酸酯、(甲基)丙烯酸2-羥-3-苯氧基丙酯、(甲基)丙烯酸甲氧基苄酯、(甲基)丙烯酸氯苄酯、(甲基)丙烯酸甲苯酯、聚苯乙烯(甲基)丙烯酸酯等具有苯環者;羥乙基化β-萘酚丙烯酸酯、(甲基)丙烯酸2-萘基乙酯、丙烯酸2-萘氧基乙酯、(甲基)丙烯酸2-(4-甲氧基-1-萘氧基)乙酯等具有萘環者;(甲基)丙烯酸聯苯酯等具有聯苯環者等。該等之中,從提升黏著劑層1之黏著特性或耐久性之觀點來看,又以(甲基)丙烯酸苄酯、(甲基)丙烯酸苯氧基乙酯為佳。 Examples of the (meth)acrylate containing an aromatic ring include benzyl (meth)acrylate, phenyl (meth)acrylate, o-phenylphenol (meth)acrylate, phenoxy (meth)acrylate, phenoxyethyl (meth)acrylate, phenoxypropyl (meth)acrylate, phenoxydiethylene glycol (meth)acrylate, ethylene oxide modified nonylphenol (meth)acrylate, ethylene oxide modified cresol (meth)acrylate, phenol ethylene oxide modified (meth)acrylate, Those having a benzene ring, such as 2-hydroxy-3-phenoxypropyl (meth)acrylate, methoxybenzyl (meth)acrylate, benzyl (meth)acrylate chloride, toluene (meth)acrylate, polystyrene (meth)acrylate, etc.; those having a naphthyl ring, such as hydroxyethylated β-naphthol acrylate, 2-naphthylethyl (meth)acrylate, 2-naphthyloxyethyl acrylate, 2-(4-methoxy-1-naphthyloxy)ethyl (meth)acrylate, etc.; those having a biphenyl ring, such as biphenyl (meth)acrylate, etc. Among them, benzyl (meth)acrylate and phenoxyethyl (meth)acrylate are preferred from the viewpoint of improving the adhesive properties or durability of the adhesive layer 1.

含醯胺基之單體是在其結構中含有醯胺基且含有(甲基)丙烯醯基、乙烯基等聚合性不飽和雙鍵的化合物。含醯胺基之單體可舉例如:(甲基)丙烯醯胺、N,N-二甲基(甲基)丙烯醯胺、N,N-二乙基(甲基)丙烯醯胺、N-異丙基丙烯醯胺、N-甲基(甲基)丙烯醯胺、N-丁基(甲基)丙烯醯胺、N-己基(甲基)丙烯醯 胺、N-羥甲基(甲基)丙烯醯胺、N-羥甲-N-丙烷(甲基)丙烯醯胺、胺甲基(甲基)丙烯醯胺、胺乙基(甲基)丙烯醯胺、巰甲基(甲基)丙烯醯胺、巰乙基(甲基)丙烯醯胺等丙烯醯胺系單體;N-(甲基)丙烯醯基

Figure 110122774-A0305-12-0022-11
啉、N-(甲基)丙烯醯基哌啶、N-(甲基)丙烯醯基吡咯啶等N-丙烯醯基雜環單體;N-乙烯基吡咯啶酮、N-乙烯基-ε-己內醯胺等含N-乙烯基之內醯胺系單體等。該等之中,從提升黏著劑層1對導電層之耐久性之觀點來看,又以含N-乙烯基之內醯胺系單體為佳。 The amide group-containing monomer is a compound having an amide group and a polymerizable unsaturated double bond such as a (meth)acryl group or a vinyl group in its structure. Examples of the amide group-containing monomer include (meth)acrylamide, N,N-dimethyl(meth)acrylamide, N,N-diethyl(meth)acrylamide, N-isopropylacrylamide, N-methyl(meth)acrylamide, N-butyl(meth)acrylamide, N-hexyl(meth)acrylamide, N-hydroxymethyl(meth)acrylamide, N-hydroxymethyl-N-propane(meth)acrylamide, aminomethyl(meth)acrylamide, aminoethyl(meth)acrylamide, ethylmethyl(meth)acrylamide, ethylethyl(meth)acrylamide and the like acrylamide monomers; N-(meth)acrylamide
Figure 110122774-A0305-12-0022-11
N-(methyl)acrylpiperidine, N-(methyl)acrylpyrrolidine and other N-acryl heterocyclic monomers; N-vinylpyrrolidone, N-vinyl-ε-caprolactam and other N-vinyl lactam monomers, etc. Among them, from the perspective of improving the durability of the adhesive layer 1 to the conductive layer, the N-vinyl lactam monomer is preferred.

含羧基之單體是在其結構中含有羧基且含有(甲基)丙烯醯基、乙烯基等聚合性不飽和雙鍵的化合物。含羧基之單體可舉例如:(甲基)丙烯酸、(甲基)丙烯酸羧乙酯、(甲基)丙烯酸羧戊酯、伊康酸、馬來酸、延胡索酸、巴豆酸等。該等之中,從共聚性、價格及提升黏著劑層1之黏著特性之觀點來看,又以丙烯酸為佳。 The carboxyl-containing monomer is a compound containing a carboxyl group and a polymerizable unsaturated double bond such as a (meth)acrylic acid group and a vinyl group in its structure. Examples of the carboxyl-containing monomer include (meth)acrylic acid, carboxyethyl (meth)acrylate, carboxypentyl (meth)acrylate, itaconic acid, maleic acid, fumaric acid, crotonic acid, etc. Among them, acrylic acid is preferred from the perspective of copolymerizability, price, and improving the adhesive properties of the adhesive layer 1.

含羥基之單體是在其結構中含有羥基且含有(甲基)丙烯醯基、乙烯基等聚合性不飽和雙鍵的化合物。含羥基之單體可舉例如:(甲基)丙烯酸2-羥乙酯、(甲基)丙烯酸3-羥丙酯、(甲基)丙烯酸4-羥丁酯、(甲基)丙烯酸6-羥己酯、(甲基)丙烯酸8-羥辛酯、(甲基)丙烯酸10-羥癸酯、(甲基)丙烯酸12-羥月桂酯等(甲基)丙烯酸羥烷基酯;(4-羥甲基環己基)-甲基丙烯酸酯等。該等之中,從提升黏著劑層1之耐久性之觀點來看,又以(甲基)丙烯酸2-羥乙酯、(甲基)丙烯酸4-羥丁酯為佳,更佳為(甲基)丙烯酸4-羥丁酯。 A hydroxyl-containing monomer is a compound containing a hydroxyl group in its structure and a polymerizable unsaturated double bond such as a (meth)acryl group or a vinyl group. Examples of hydroxyl-containing monomers include hydroxyalkyl (meth)acrylates such as 2-hydroxyethyl (meth)acrylate, 3-hydroxypropyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, 6-hydroxyhexyl (meth)acrylate, 8-hydroxyoctyl (meth)acrylate, 10-hydroxydecyl (meth)acrylate, and 12-hydroxylauryl (meth)acrylate; (4-hydroxymethylcyclohexyl)-methacrylate, and the like. Among them, from the perspective of improving the durability of the adhesive layer 1, 2-hydroxyethyl (meth)acrylate and 4-hydroxybutyl (meth)acrylate are preferred, and 4-hydroxybutyl (meth)acrylate is more preferred.

共聚單體會成為與交聯劑之反應點。含羧基之單體及含羥基之單體富含與分子間交聯劑之反應性,因此宜用來提升黏著劑層1之凝集性或耐熱性。含羧基之單體在兼顧耐久性與重工性方面較佳,含羥基之單體則在提升重工性方面較佳。 The copolymer monomer will become a reaction point with the crosslinking agent. Carboxyl-containing monomers and hydroxyl-containing monomers are rich in reactivity with intermolecular crosslinking agents, so they are suitable for improving the cohesion or heat resistance of the adhesive layer 1. Carboxyl-containing monomers are better in terms of both durability and workability, while hydroxyl-containing monomers are better in terms of improving workability.

從提升黏著劑層1之接著性之觀點來看,(甲基)丙烯酸烷基酯相對於形成(甲基)丙烯酸系聚合物(A)之總單體成分之比率宜為50重量%以上。 From the perspective of improving the adhesion of the adhesive layer 1, the ratio of the (meth)acrylate alkyl ester to the total monomer components forming the (meth)acrylic polymer (A) is preferably 50% by weight or more.

當使用含芳香環之(甲基)丙烯酸酯作為單體成分時,從提升黏著劑層1之耐久性之觀點來看,含芳香環之(甲基)丙烯酸酯相對於形成(甲基)丙烯酸系聚合物(A)之總單體成分之比率宜為3~25重量%,較佳為22重量%以下,更佳為20重量%以下。該比率更宜為8重量%以上,且以12重量%以上更佳。藉由將含芳香環之(甲基)丙烯酸酯之共聚合率調整為上述範圍內,可抑制因光學薄膜之收縮所導致的漏光,而有能提升黏著劑層1之重工性之傾向。 When using an aromatic ring-containing (meth)acrylate as a monomer component, from the perspective of improving the durability of the adhesive layer 1, the ratio of the aromatic ring-containing (meth)acrylate to the total monomer components forming the (meth)acrylic polymer (A) is preferably 3 to 25% by weight, preferably 22% by weight or less, and more preferably 20% by weight or less. The ratio is more preferably 8% by weight or more, and more preferably 12% by weight or more. By adjusting the copolymerization rate of the aromatic ring-containing (meth)acrylate to the above range, light leakage caused by the shrinkage of the optical film can be suppressed, and there is a tendency to improve the workability of the adhesive layer 1.

當使用含羥基之單體作為單體成分時,從提升黏著劑層1之黏著特性、耐久性之觀點來看,含羥基之單體相對於形成(甲基)丙烯酸系聚合物(A)之總單體成分之比率宜為0.01~10重量%,較佳為5重量%以下,更佳為2重量%以下,尤佳為1重量%以下。該比率更宜為0.03重量%以上,且以0.05重量%以上更佳。藉由將含羥基之單體之共聚合率調整為上述範圍內,黏著劑層1中可使黏著劑充分交聯,並且抑制黏著劑變硬,從而有能提升黏著劑層1之耐久性之傾向。 When a hydroxyl-containing monomer is used as a monomer component, from the perspective of improving the adhesive properties and durability of the adhesive layer 1, the ratio of the hydroxyl-containing monomer to the total monomer components forming the (meth)acrylic polymer (A) is preferably 0.01-10% by weight, preferably 5% by weight or less, more preferably 2% by weight or less, and particularly preferably 1% by weight or less. The ratio is more preferably 0.03% by weight or more, and more preferably 0.05% by weight or more. By adjusting the copolymerization rate of the hydroxyl-containing monomer to the above range, the adhesive can be fully crosslinked in the adhesive layer 1, and the adhesive is inhibited from hardening, thereby tending to improve the durability of the adhesive layer 1.

單體成分除了(甲基)丙烯酸烷基酯及上述共聚單體外,以改善黏著劑層1之接著性、耐熱性為目的,還可使用具有含(甲基)丙烯醯基或乙烯基等不飽和雙鍵之聚合性官能基的其他共聚單體。其他共聚單體可單獨或組合使用。 In addition to the (meth)acrylic acid alkyl ester and the above-mentioned copolymer monomers, other copolymer monomers having polymerizable functional groups containing unsaturated double bonds such as (meth)acrylic acid or vinyl groups may be used as monomer components for the purpose of improving the adhesion and heat resistance of the adhesive layer 1. Other copolymer monomers may be used alone or in combination.

其他共聚單體可舉例如:馬來酸酐、伊康酸酐等含酸酐基之單體;丙烯酸之己內酯加成物;烯丙基磺酸、2-(甲基)丙烯醯胺-2-甲基丙磺酸、(甲基)丙烯醯胺丙磺酸、(甲基)丙烯酸磺丙酯等含磺酸基之單體;2-羥乙基丙烯醯基磷酸酯等含磷酸基之單體;(甲基)丙烯酸胺乙酯、(甲基)丙烯酸N,N-二甲基胺乙酯、(甲基)丙烯酸三級丁基胺乙酯等(甲基)丙烯酸烷基胺基烷基酯;(甲基)丙烯酸甲氧基乙酯、(甲基)丙烯酸乙氧基乙酯等(甲基)丙烯酸烷氧基烷基酯;N-(甲基)丙烯醯基氧基亞甲基琥珀醯亞胺、N-(甲基)丙烯醯基-6-氧基六亞甲基琥珀醯亞胺、N-(甲基)丙烯醯基-8-氧基伸辛基琥珀醯亞胺等琥珀醯亞胺系單體;N-環己基馬來醯亞胺、N-異丙基馬來醯亞胺、N-月桂基馬來醯亞胺、N-苯基馬來醯亞胺等馬來醯 亞胺系單體;N-甲基伊康醯亞胺、N-乙基伊康醯亞胺、N-丁基伊康醯亞胺、N-辛基伊康醯亞胺、N-2-乙基己基伊康醯亞胺、N-環己基伊康醯亞胺、N-月桂基伊康醯亞胺等伊康醯亞胺系單體;乙酸乙烯酯、丙酸乙烯酯等乙烯基系單體;丙烯腈、甲基丙烯腈等氰基丙烯酸酯系單體;(甲基)丙烯酸環氧丙酯等含環氧基之(甲基)丙烯酸酯;聚乙二醇(甲基)丙烯酸酯、聚丙二醇(甲基)丙烯酸酯、甲氧基乙二醇(甲基)丙烯酸酯、甲氧基聚丙二醇(甲基)丙烯酸酯等二醇系(甲基)丙烯酸酯;(甲基)丙烯酸四氫糠酯、氟(甲基)丙烯酸酯、聚矽氧(甲基)丙烯酸酯、丙烯酸2-甲氧基乙酯等(甲基)丙烯酸酯單體;3-丙烯醯氧基丙基三乙氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、4-乙烯基丁基三甲氧基矽烷、4-乙烯基丁基三乙氧基矽烷、8-乙烯基辛基三甲氧基矽烷、8-乙烯基辛基三乙氧基矽烷、10-甲基丙烯醯基氧基癸基三甲氧基矽烷、10-丙烯醯基氧基癸基三甲氧基矽烷、10-甲基丙烯醯基氧基癸基三乙氧基矽烷、10-丙烯醯基氧基癸基三乙氧基矽烷等含矽原子之矽烷系單體等。 Other copolymer monomers include, for example, monomers containing anhydride groups such as maleic anhydride and itaconic anhydride; caprolactone adducts of acrylic acid; monomers containing sulfonic acid groups such as allyl sulfonic acid, 2-(meth)acrylamide-2-methylpropanesulfonic acid, (meth)acrylamidepropanesulfonic acid, and sulfopropyl (meth)acrylate; monomers containing phosphate groups such as 2-hydroxyethylacryl phosphate; (meth)acrylic acid aminoethyl esters such as (meth)acrylic acid N,N-dimethylaminoethyl ester and (meth)acrylic acid tertiary butylaminoethyl ester; (meth)acrylic acid methoxyethyl ester and (meth)acrylic acid ethoxyethyl ester; esters, etc.; succinimide monomers such as N-(meth)acryloxymethylenesuccinimide, N-(meth)acryl-6-oxyhexamethylenesuccinimide, N-(meth)acryl-8-oxyoctylsuccinimide, etc.; maleimide monomers such as N-cyclohexylmaleimide, N-isopropylmaleimide, N-laurylmaleimide, N-phenylmaleimide, etc.; N-methyliconimide, N-ethyliconimide, N-butyliconimide, N-octyliconimide, N-2-ethylhexyliconimide , N-cyclohexylicarboxyliconimide, N-lauryliconimide and other icarboxyliconimide monomers; vinyl acetate, vinyl propionate and other vinyl monomers; acrylonitrile, methacrylonitrile and other cyanoacrylate monomers; epoxy group-containing (meth)acrylates such as glycidyl (meth)acrylate; polyethylene glycol (meth)acrylate, polypropylene glycol (meth)acrylate, methoxyethylene glycol (meth)acrylate, methoxypolypropylene glycol (meth)acrylate and other glycol (meth)acrylates; tetrahydrofurfuryl (meth)acrylate, fluoro (meth)acrylate, polysilicone (meth)acrylate, propylene glycol (meth)acrylate and other (meth)acrylates; (Meth)acrylate monomers such as 2-methoxyethyl acrylate; silane monomers containing silicon atoms such as 3-acryloxypropyl triethoxysilane, vinyl trimethoxysilane, vinyl triethoxysilane, 4-vinyl butyl trimethoxysilane, 4-vinyl butyl triethoxysilane, 8-vinyl octyl trimethoxysilane, 8-vinyl octyl triethoxysilane, 10-methacryloxy decyl trimethoxysilane, 10-acryloxy decyl trimethoxysilane, 10-methacryloxy decyl triethoxysilane, 10-acryloxy decyl triethoxysilane, etc.

再者,其他共聚單體可舉例如:三丙二醇二(甲基)丙烯酸酯、四乙二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、雙酚A二環氧丙基醚二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、新戊四醇三(甲基)丙烯酸酯、新戊四醇四(甲基)丙烯酸酯、二新戊四醇五(甲基)丙烯酸酯、二新戊四醇六(甲基)丙烯酸酯、己內酯改質二新戊四醇六(甲基)丙烯酸酯等具有2個以上不飽和雙鍵的多官能性單體。 Furthermore, other copolymer monomers include, for example, tripropylene glycol di(meth)acrylate, tetraethylene glycol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, bisphenol A diglycidyl ether di(meth)acrylate, neopentyl glycol di(meth)acrylate, trihydroxymethylpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, caprolactone-modified dipentaerythritol hexa(meth)acrylate, and other multifunctional monomers having two or more unsaturated double bonds.

當使用其他共聚單體作為單體成分時,其他共聚單體相對於形成(甲基)丙烯酸系聚合物(A)之總單體成分之比率宜為10重量%以下,較佳為7重量%以下,更佳為5重量%以下。 When other copolymers are used as monomer components, the ratio of other copolymers to the total monomer components forming the (meth)acrylic polymer (A) is preferably 10% by weight or less, preferably 7% by weight or less, and more preferably 5% by weight or less.

<(甲基)丙烯酸系聚合物(A)之製造方法> <Method for producing (meth)acrylic acid polymer (A)>

(甲基)丙烯酸系聚合物(A)可利用溶液聚合、電子射線或UV等放射線聚合、 塊狀聚合、乳化聚合等各種自由基聚合等公知聚合方法來製作。所製得(甲基)丙烯酸系聚合物(A)可為無規共聚物、嵌段共聚物、接枝共聚物等中任一者。 The (meth)acrylic polymer (A) can be produced by known polymerization methods such as solution polymerization, electron beam or UV radiation polymerization, block polymerization, emulsion polymerization and other free radical polymerization. The produced (meth)acrylic polymer (A) can be any of a random copolymer, a block copolymer, a graft copolymer and the like.

溶液聚合中,聚合溶劑例如可使用乙酸乙酯、甲苯等。溶液聚合例如於氮氣等惰性氣體氣流下加入聚合引發劑,通常在50~70℃左右且5~30小時左右之反應條件下進行。 In solution polymerization, the polymerization solvent may be ethyl acetate, toluene, etc. Solution polymerization is carried out under reaction conditions of about 50-70°C and about 5-30 hours by adding a polymerization initiator under an inert gas flow such as nitrogen.

用於自由基聚合的聚合引發劑、鏈轉移劑、乳化劑等並無特殊限制,可適當選用。(甲基)丙烯酸系聚合物(A)之重量平均分子量可藉由聚合引發劑、鏈轉移劑之使用量、反應條件等進行控制。因此,聚合引發劑及鏈轉移劑可因應其組成適當調整其使用量。 The polymerization initiator, chain transfer agent, emulsifier, etc. used for free radical polymerization are not particularly limited and can be appropriately selected. The weight average molecular weight of the (meth)acrylic polymer (A) can be controlled by the amount of polymerization initiator and chain transfer agent used, reaction conditions, etc. Therefore, the amount of polymerization initiator and chain transfer agent used can be appropriately adjusted according to their composition.

聚合引發劑可舉例如:2,2’-偶氮雙異丁腈、2,2’-偶氮雙(2-甲脒基丙烷)二鹽酸鹽、2,2’-偶氮雙[2-(5-甲-2-咪唑啉-2-基)丙烷]二鹽酸鹽、2,2’-偶氮雙(2-甲基丙脒)二硫酸鹽、2,2’-偶氮雙(N,N’-二亞甲基異丁基脒)、2,2’-偶氮雙[N-(2-羧乙基)-2-甲基丙脒]水合物(和光純藥公司製,VA-057)等偶氮系引發劑;過硫酸鉀、過硫酸銨等過硫酸鹽;過氧二碳酸二(2-乙基己)酯、過氧二碳酸二(4-三級丁基環己)酯、過氧二碳酸二-二級丁酯、過氧新癸酸三級丁酯、過氧三甲基乙酸三級己酯、過氧三甲基乙酸三級丁酯、過氧化二月桂醯、過氧化二正辛醯、過氧-2-乙己酸1,1,3,3-四甲基丁酯、過氧化二(4-甲基苯甲醯)、過氧化二苯甲醯、過氧異丁酸三級丁酯、1,1-二(三級己過氧)環己烷、氫過氧化三級丁基、過氧化氫等過氧化物系引發劑;過硫酸鹽與亞硫酸氫鈉之組合、過氧化物與抗壞血酸鈉之組合等組合有過氧化物與還原劑的氧化還原系引發劑等,惟不限於該等。 Examples of polymerization initiators include 2,2'-azobisisobutyronitrile, 2,2'-azobis(2-carboxamidinopropane) dihydrochloride, 2,2'-azobis[2-(5-methyl-2-imidazolin-2-yl)propane] dihydrochloride, 2,2'-azobis(2-methylpropionamidine) disulfate, 2,2'-azobis(N Azo initiators such as 2,2'-azobis[N-(2-carboxyethyl)-2-methylpropionamidine] hydrate (Wako Pure Chemical Industries, Ltd., VA-057); persulfates such as potassium persulfate and ammonium persulfate; di(2-ethylhexyl) peroxydicarbonate, di(4-tert-butyl) peroxydicarbonate Peroxide initiators such as cyclohexyl) ester, di-butyl peroxydicarbonate, tertiary butyl peroxyneodecanoate, tertiary hexyl peroxytrimethylacetate, tertiary butyl peroxytrimethylacetate, dilauryl peroxide, di-n-octyl peroxide, 1,1,3,3-tetramethylbutyl peroxy-2-ethylhexanoate, di(4-methylbenzoyl) peroxide, dibenzoyl peroxide, tertiary butyl peroxyisobutyrate, 1,1-di(tertiary hexylperoxy)cyclohexane, tertiary butyl hydroperoxide, hydrogen peroxide, etc.; redox initiators in which peroxide and a reducing agent are combined, such as a combination of persulfate and sodium bisulfite, a combination of peroxide and sodium ascorbate, etc., but are not limited to the above.

聚合引發劑可單獨或組合使用,整體使用量相對於單體成分100重量份宜為0.005~1重量份左右,更佳為0.01~0.5重量份左右。 The polymerization initiator can be used alone or in combination. The total usage is preferably about 0.005 to 1 part by weight, and more preferably about 0.01 to 0.5 part by weight, relative to 100 parts by weight of the monomer component.

鏈轉移劑可舉例如:月桂硫醇、環氧丙硫醇、巰乙酸、2-巰乙醇、硫乙醇酸、硫乙醇酸2-乙基己酯、2,3-二巰-1-丙醇等。鏈轉移劑可單獨使用,亦 可混用2種以上,整體使用量相對於單體成分100重量份在0.1重量份左右以下。 Chain transfer agents include, for example, lauryl mercaptan, glycidyl mercaptan, ethylene glycol, 2-ethylhexyl thioglycolate, 2,3-diethylene-1-propanol, etc. Chain transfer agents can be used alone or in combination of two or more. The total amount used is less than 0.1 parts by weight relative to 100 parts by weight of the monomer component.

用於乳化聚合時的乳化劑可舉例如:月桂硫酸鈉、月桂硫酸銨、十二基苯磺酸鈉、聚氧乙烯烷基醚硫酸銨、聚氧乙烯烷基苯基醚硫酸鈉等陰離子系乳化劑;聚氧乙烯烷基醚、聚氧乙烯烷基苯基醚、聚氧乙烯脂肪酸酯、聚氧乙烯-聚氧丙烯嵌段聚合物等非離子系乳化劑等。乳化劑可單獨或組合使用。 Emulsifiers used in emulsion polymerization include, for example, anionic emulsifiers such as sodium lauryl sulfate, ammonium lauryl sulfate, sodium dodecylbenzene sulfonate, polyoxyethylene alkyl ether ammonium sulfate, polyoxyethylene alkyl phenyl ether sodium sulfate, and nonionic emulsifiers such as polyoxyethylene alkyl ether, polyoxyethylene alkyl phenyl ether, polyoxyethylene fatty acid ester, polyoxyethylene-polyoxypropylene block polymer, etc. Emulsifiers can be used alone or in combination.

具反應性之乳化劑可舉例已導入丙烯基、烯丙醚基等自由基聚合性官能基的乳化劑。該乳化劑之具體例包括:AQUALON HS-10、HS-20、KH-10、BC-05、BC-10、BC-20(以上皆為第一工業製藥公司製)、ADEKA REASOAP SE10N(艾迪科(ADEKA)公司製)等。具反應性之乳化劑於聚合後會攝入聚合物鏈,並且提升耐水性,因此較為理想。乳化劑之使用量相對於單體成分之總量100重量份宜為0.3~5重量份,從聚合穩定性或機械穩定性來看,更宜為0.5~1重量份。 Reactive emulsifiers include emulsifiers that have been introduced with free radical polymerizable functional groups such as propylene and allyl ether groups. Specific examples of such emulsifiers include: AQUALON HS-10, HS-20, KH-10, BC-05, BC-10, BC-20 (all manufactured by Daiichi Kogyo Seiyaku Co., Ltd.), ADEKA REASOAP SE10N (manufactured by ADEKA Corporation), etc. Reactive emulsifiers are more ideal because they will be incorporated into the polymer chain after polymerization and improve water resistance. The amount of emulsifier used is preferably 0.3 to 5 parts by weight relative to the total amount of 100 parts by weight of the monomer components, and is more preferably 0.5 to 1 part by weight in terms of polymerization stability or mechanical stability.

放射線聚合是藉由對單體成分照射電子射線、UV等放射線而進行聚合,並製造(甲基)丙烯酸系聚合物(A)。當利用電子射線進行放射線聚合時,毋須特別使單體成分含有光聚合引發劑。當利用UV進行放射線聚合時,出於可縮短聚合時間之優點等,可使單體成分含有光聚合引發劑。光聚合引發劑可單獨或組合使用。 Radiation polymerization is to polymerize the monomer components by irradiating them with radiation such as electron rays, UV rays, etc., and to produce a (meth)acrylic polymer (A). When radiation polymerization is performed using electron rays, it is not necessary to specifically make the monomer components contain a photopolymerization initiator. When radiation polymerization is performed using UV, the monomer components may contain a photopolymerization initiator for the advantage of shortening the polymerization time. Photopolymerization initiators may be used alone or in combination.

光聚合引發劑只要能夠引發光聚合,即無特殊限制,可使用通常所使用的光聚合引發劑。光聚合引發劑例如可使用苯偶姻醚系、苯乙酮系、α-酮醇系、光活性肟系、苯偶姻系、二苯乙二酮系、二苯基酮系、縮酮系、9-氧硫

Figure 110122774-A0305-12-0026-13
(thioxanthone)系等。光聚合引發劑之使用量相對於單體成分100重量份為0.05~1.5重量份,較佳為0.1~1重量份。光聚合引發劑可單獨或組合使用。 The photopolymerization initiator is not particularly limited as long as it can initiate photopolymerization, and commonly used photopolymerization initiators can be used. For example, benzoin ether-based, acetophenone-based, α-ketol-based, photoactive oxime-based, benzoin-based, diphenylethylene-based, diphenyl ketone-based, ketal-based, 9-oxysulfur-based,
Figure 110122774-A0305-12-0026-13
(thioxanthone) series, etc. The amount of the photopolymerization initiator used is 0.05 to 1.5 parts by weight, preferably 0.1 to 1 part by weight, relative to 100 parts by weight of the monomer component. The photopolymerization initiator can be used alone or in combination.

(甲基)丙烯酸系聚合物(A)之重量平均分子量通常為100萬~250萬。若考慮耐久性、尤其是耐熱性,則(甲基)丙烯酸系聚合物(A)之重量平均分子量宜為120萬~200萬。重量平均分子量在100萬以上,從耐熱性方面來看是較為理想 的。若重量平均分子量在250萬以下,則黏著劑不易變硬而有不易產生剝落之傾向。意指分子量分佈的重量平均分子量(Mw)/數量平均分子量(Mn)宜為1.8~10,較佳為1.8~7,更佳為1.8~5。分子量分佈(Mw/Mn)在10以下,從耐久性方面來看是較為理想的。重量平均分子量、分子量分佈(Mw/Mn)是利用GPC(凝膠滲透層析術)來測定,從已依照聚苯乙烯換算而算出的值求得。 The weight average molecular weight of the (meth)acrylic polymer (A) is usually 1 million to 2.5 million. If durability, especially heat resistance, is taken into consideration, the weight average molecular weight of the (meth)acrylic polymer (A) is preferably 1.2 million to 2 million. A weight average molecular weight of 1 million or more is more ideal from the perspective of heat resistance. If the weight average molecular weight is less than 2.5 million, the adhesive is less likely to harden and tends to be less likely to peel off. The weight average molecular weight (Mw)/number average molecular weight (Mn) of the molecular weight distribution is preferably 1.8 to 10, preferably 1.8 to 7, and more preferably 1.8 to 5. A molecular weight distribution (Mw/Mn) of less than 10 is more ideal from the perspective of durability. The weight average molecular weight and molecular weight distribution (Mw/Mn) are measured by GPC (gel permeation chromatography) and obtained from the values calculated based on polystyrene conversion.

<矽烷耦合劑> <Silane coupling agent>

黏著劑組成物除了化合物(C)及聚醚化合物(D)外,更可含有矽烷耦合劑(E)。矽烷耦合劑(E)例如可具有酸基及酸酐基以外的反應性官能基。反應性官能基例如宜為選自於由環氧基、胺基、異氰酸酯基、三聚異氰酸酯基、乙烯基、苯乙烯基、乙醯乙醯基、脲基、硫脲基、(甲基)丙烯醯基及雜環基所構成群組中之至少1種。矽烷耦合劑(E)可單獨或組合使用。 In addition to the compound (C) and the polyether compound (D), the adhesive composition may further contain a silane coupling agent (E). The silane coupling agent (E) may have a reactive functional group other than an acid group and an anhydride group. The reactive functional group is preferably at least one selected from the group consisting of an epoxy group, an amine group, an isocyanate group, a triisocyanate group, a vinyl group, a styrene group, an acetyl group, a urea group, a thiourea group, a (meth)acryl group and a heterocyclic group. The silane coupling agent (E) may be used alone or in combination.

矽烷耦合劑(E)可舉例如:3-環氧丙氧基丙基三甲氧基矽烷、3-環氧丙氧基丙基三乙氧基矽烷、3-環氧丙氧基丙基甲基二乙氧基矽烷、2-(3,4-環氧環己基)乙基三甲氧基矽烷等含環氧基之矽烷耦合劑;3-胺丙基三甲氧基矽烷、N-2-(胺乙基)-3-胺丙基甲基二甲氧基矽烷、3-三乙氧基矽基-N-(1,3-二甲基亞丁基)丙胺、N-苯基-γ-胺丙基三甲氧基矽烷等含胺基之矽烷耦合劑;3-異氰酸酯丙基三乙氧基矽烷等含異氰酸酯基之矽烷耦合劑;乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷等含乙烯基之矽烷耦合劑;對苯乙烯基三甲氧基矽烷等含苯乙烯基之矽烷耦合劑;3-丙烯醯氧基丙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基三乙氧基矽烷等含(甲基)丙烯醯基之矽烷耦合劑等。該等之中,又以含環氧基之矽烷耦合劑為佳。 The silane coupling agent (E) may include, for example, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyltriethoxysilane, 3-glycidoxypropylmethyldiethoxysilane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane and other silane coupling agents containing epoxy groups; 3-aminopropyltrimethoxysilane, N-2-(aminoethyl)-3-aminopropylmethyldimethoxysilane, 3-triethoxysilyl-N-(1,3-dimethylbutylene)propylamine, N ... -phenyl-γ-aminopropyl trimethoxysilane and other amino group-containing silane coupling agents; 3-isocyanate propyl triethoxysilane and other isocyanate group-containing silane coupling agents; vinyl trimethoxy silane, vinyl triethoxy silane and other vinyl group-containing silane coupling agents; p-phenylene trimethoxy silane and other styrene group-containing silane coupling agents; 3-acryloxypropyl trimethoxy silane, 3-methacryloxypropyl triethoxy silane and other (meth)acryl group-containing silane coupling agents, etc. Among them, epoxy group-containing silane coupling agents are preferred.

矽烷耦合劑(E)亦可使用於分子內具有複數個烷氧基矽基的矽烷耦合劑(低聚物型矽烷耦合劑)。低聚物型矽烷耦合劑之具體例可舉例:信越化學公司製含環氧基之低聚物型矽烷耦合劑,商品名「X-41-1053」、「X-41-1059A」、 「X-41-1056」、「X-40-2651」等。低聚物型矽烷耦合劑不易揮發,而且具有複數個烷氧基矽基,因此可有效提升黏著劑層1之耐久性,故而較佳。 Silane coupling agent (E) can also be used in silane coupling agents having multiple alkoxy silane groups in the molecule (oligomer silane coupling agent). Specific examples of oligomer silane coupling agents include: oligomer silane coupling agents containing epoxy groups manufactured by Shin-Etsu Chemical Co., Ltd., with trade names such as "X-41-1053", "X-41-1059A", "X-41-1056", "X-40-2651", etc. Oligomer silane coupling agents are not easy to volatilize, and have multiple alkoxy silane groups, so they can effectively improve the durability of the adhesive layer 1, so they are better.

當黏著劑組成物含有矽烷耦合劑(E)時,黏著劑組成物中矽烷耦合劑(E)之含量相對於基礎聚合物100重量份宜為0.001~5重量份,較佳為1重量份以下,更佳為0.6重量份以下。矽烷耦合劑(E)之含量相對於基礎聚合物100重量份更宜為0.01重量份以上,且以0.05重量份以上更佳,以0.1重量份以上尤佳。藉由適度調節矽烷耦合劑(E)之含量,而有能提升黏著劑層1之耐久性之傾向。 When the adhesive composition contains a silane coupling agent (E), the content of the silane coupling agent (E) in the adhesive composition is preferably 0.001 to 5 parts by weight relative to 100 parts by weight of the base polymer, preferably less than 1 part by weight, and more preferably less than 0.6 parts by weight. The content of the silane coupling agent (E) relative to 100 parts by weight of the base polymer is more preferably 0.01 parts by weight or more, and more preferably 0.05 parts by weight or more, and even more preferably 0.1 parts by weight or more. By appropriately adjusting the content of the silane coupling agent (E), the durability of the adhesive layer 1 tends to be improved.

當黏著劑組成物含有矽烷耦合劑(E)時,從提升黏著劑層1之耐久性之觀點來看,化合物(C)與矽烷耦合劑(E)之重量比(化合物(C)/矽烷耦合劑(E))宜為0.1以上,較佳為0.5以上,更佳為1以上,而且宜為50以下,較佳為15以下,更佳為5以下。 When the adhesive composition contains a silane coupling agent (E), from the perspective of improving the durability of the adhesive layer 1, the weight ratio of the compound (C) to the silane coupling agent (E) (compound (C)/silane coupling agent (E)) is preferably 0.1 or more, preferably 0.5 or more, more preferably 1 or more, and preferably 50 or less, preferably 15 or less, and more preferably 5 or less.

<交聯劑> <Crosslinking agent>

黏著劑組成物更可含有交聯劑。交聯劑可使用有機系交聯劑、多官能性金屬螯合物等。有機系交聯劑可舉例如:異氰酸酯系交聯劑、過氧化物系交聯劑、環氧系交聯劑、亞胺系交聯劑等。多官能性金屬螯合物為多價金屬原子與有機化合物共價鍵結或配位鍵結之物。多價金屬原子可舉例:Al、Cr、Zr、Co、Cu、Fe、Ni、V、Zn、In、Ca、Mg、Mn、Y、Ce、Sr、Ba、Mo、La、Sn、Ti等。共價鍵結或配位鍵結的有機化合物例如含有氧原子等,較佳可舉例烷基酯、醇化合物、羧酸化合物、醚化合物、酮化合物等。交聯劑可單獨或組合使用。 The adhesive composition may further contain a crosslinking agent. The crosslinking agent may be an organic crosslinking agent, a multifunctional metal chelate, etc. Examples of organic crosslinking agents include isocyanate crosslinking agents, peroxide crosslinking agents, epoxy crosslinking agents, and imine crosslinking agents. Multifunctional metal chelates are covalently bonded or coordinately bonded polyvalent metal atoms and organic compounds. Examples of polyvalent metal atoms include Al, Cr, Zr, Co, Cu, Fe, Ni, V, Zn, In, Ca, Mg, Mn, Y, Ce, Sr, Ba, Mo, La, Sn, and Ti. Covalently bonded or coordinately bonded organic compounds include, for example, oxygen atoms, and preferably, alkyl esters, alcohol compounds, carboxylic acid compounds, ether compounds, and ketone compounds. Crosslinking agents can be used alone or in combination.

交聯劑宜為異氰酸酯系交聯劑及/或過氧化物系交聯劑,更佳為併用異氰酸酯系交聯劑與過氧化物系交聯劑。 The crosslinking agent is preferably an isocyanate crosslinking agent and/or a peroxide crosslinking agent, and more preferably, an isocyanate crosslinking agent and a peroxide crosslinking agent are used together.

異氰酸酯系交聯劑可使用具有至少2個異氰酸酯基(包含已利用封端劑或多聚物化等暫時保護異氰酸酯的異氰酸酯再生型官能基)的化合物。譬如,可使用一般用於胺甲酸乙酯化反應的公知脂肪族聚異氰酸酯、脂環族聚異氰酸 酯、芳香族聚異氰酸酯等。 Isocyanate crosslinking agents may be compounds having at least two isocyanate groups (including isocyanate regeneration functional groups that have been temporarily protected by blocking agents or polymerization). For example, well-known aliphatic polyisocyanates, alicyclic polyisocyanates, aromatic polyisocyanates, etc., which are generally used for urethanization reactions, may be used.

脂肪族聚異氰酸酯可舉例如:三亞甲基二異氰酸酯、四亞甲基二異氰酸酯、六亞甲基二異氰酸酯、五亞甲基二異氰酸酯、1,2-伸丙基二異氰酸酯、1,3-伸丁基二異氰酸酯、十二亞甲基二異氰酸酯、2,4,4-三甲基六亞甲基二異氰酸酯等。 Aliphatic polyisocyanates include, for example, trimethylene diisocyanate, tetramethylene diisocyanate, hexamethylene diisocyanate, pentamethylene diisocyanate, 1,2-propyl diisocyanate, 1,3-butyl diisocyanate, dodecamethylene diisocyanate, 2,4,4-trimethylhexamethylene diisocyanate, etc.

脂環族異氰酸酯可舉例如:1,3-環戊烯二異氰酸酯、1,3-環己烷二異氰酸酯、1,4-環己烷二異氰酸酯、異佛酮二異氰酸酯、加氫二苯甲烷二異氰酸酯、加氫伸茬基二異氰酸酯、加氫二異氰酸甲苯酯、加氫四甲基伸茬基二異氰酸酯等。 Examples of alicyclic isocyanates include: 1,3-cyclopentene diisocyanate, 1,3-cyclohexane diisocyanate, 1,4-cyclohexane diisocyanate, isophorone diisocyanate, diphenylmethane diisocyanate, diisocyanate, toluene diisocyanate, tetramethylol diisocyanate, etc.

芳香族二異氰酸酯可舉例如:二異氰酸伸苯酯、2,4-二異氰酸甲苯酯、2,6-二異氰酸甲苯酯、2,2’-二苯甲烷二異氰酸酯、4,4’-二苯甲烷二異氰酸酯、4,4’-甲苯胺二異氰酸酯、4,4’-二苯基醚二異氰酸酯、4,4’-二苯基二異氰酸酯、1,5-萘二異氰酸酯、伸茬基二異氰酸酯等。 Aromatic diisocyanates include, for example, phenyl diisocyanate, 2,4-toluene diisocyanate, 2,6-toluene diisocyanate, 2,2'-diphenylmethane diisocyanate, 4,4'-diphenylmethane diisocyanate, 4,4'-toluidine diisocyanate, 4,4'-diphenyl ether diisocyanate, 4,4'-diphenyl diisocyanate, 1,5-naphthalene diisocyanate, stubyl diisocyanate, etc.

異氰酸酯系交聯劑可舉例:上述二異氰酸酯之多聚物(二聚物、三聚物、五聚物等)、與三羥甲基丙烷等多元醇反應的胺甲酸乙酯改質物、脲改質物、縮二脲改質物、脲甲酸酯改質物、三聚異氰酸酯改質物、碳二亞胺改質物等。 Examples of isocyanate crosslinking agents include: polymers (dimers, trimers, pentamers, etc.) of the above-mentioned diisocyanates, urethane modified products reacted with polyols such as trihydroxymethylpropane, urea modified products, biuret modified products, allophanate modified products, isocyanurate modified products, carbodiimide modified products, etc.

異氰酸酯系交聯劑之市售品可舉例如:東曹(TOSOH)公司製之商品名「Millionate MT」、「Millionate MTL」、「Millionate MR-200」、「Millionate MR-400」、「Coronate L」、「Coronate HL」、「Coronate HX」、三井化學公司製之商品名「TAKENATE D-110N」、「TAKENATE D-120N」、「TAKENATE D-140N」、「TAKENATE D-160N」、「TAKENATE D-165N」、「TAKENATE D-170HN」、「TAKENATE D-178N」、「TAKENATE500」、「TAKENATE600」等。 Examples of commercially available isocyanate crosslinking agents include: Tosoh Corporation’s products “Millionate MT”, “Millionate MTL”, “Millionate MR-200”, “Millionate MR-400”, “Coronate L”, “Coronate HL”, “Coronate HX”, and Mitsui Chemicals’ products “TAKENATE D-110N”, “TAKENATE D-120N”, “TAKENATE D-140N”, “TAKENATE D-160N”, “TAKENATE D-165N”, “TAKENATE D-170HN”, “TAKENATE D-178N”, “TAKENATE500”, “TAKENATE600”, etc.

異氰酸酯系交聯劑宜為芳香族聚異氰酸酯及其改質物的芳香族聚 異氰酸酯系化合物、脂肪族聚異氰酸酯及其改質物的脂肪族聚異氰酸酯系化合物。芳香族聚異氰酸酯系化合物之交聯速度與適用期之平衡佳而適合使用。芳香族聚異氰酸酯系化合物尤其是以二異氰酸甲苯酯及其改質物為佳。 Isocyanate crosslinking agents are preferably aromatic polyisocyanates and their modified aromatic polyisocyanate compounds, aliphatic polyisocyanates and their modified aliphatic polyisocyanate compounds. Aromatic polyisocyanate compounds have a good balance between crosslinking speed and pot life and are suitable for use. Among aromatic polyisocyanate compounds, toluene diisocyanate and its modified products are particularly preferred.

作為過氧化物,只要是經加熱或光照射會產生自由基活性種而使黏著劑組成物之基礎聚合物(例如(甲基)丙烯酸系聚合物(A))進行交聯者,即可適當使用,惟考慮到作業性或穩定性,宜使用1分鐘半衰期溫度為80℃~160℃的過氧化物,更佳為使用90℃~140℃的過氧化物。 As peroxides, any peroxide that generates free radical active species upon heating or light irradiation to crosslink the base polymer of the adhesive composition (e.g., (meth)acrylic polymer (A)) can be used appropriately. However, in consideration of workability or stability, peroxides with a half-life temperature of 80°C to 160°C per minute are preferred, and peroxides with a half-life temperature of 90°C to 140°C are more preferred.

過氧化物可舉例如:過氧二碳酸二(2-乙基己)酯(1分鐘半衰期溫度:90.6℃)、過氧二碳酸二(4-三級丁基環己)酯(1分鐘半衰期溫度:92.1℃)、過氧二碳酸二-二級丁酯(1分鐘半衰期溫度:92.4℃)、過氧新癸酸三級丁酯(1分鐘半衰期溫度:103.5℃)、過氧三甲基乙酸三級己酯(1分鐘半衰期溫度:109.1℃)、過氧三甲基乙酸三級丁酯(1分鐘半衰期溫度:110.3℃)、過氧化二月桂醯(1分鐘半衰期溫度:116.4℃)、過氧化二正辛醯(1分鐘半衰期溫度:117.4℃)、過氧-2-乙己酸1,1,3,3-四甲基丁酯(1分鐘半衰期溫度:124.3℃)、過氧化二(4-甲基苯甲醯)(1分鐘半衰期溫度:128.2℃)、過氧化二苯甲醯(1分鐘半衰期溫度:130.0℃)、過氧異丁酸三級丁酯(1分鐘半衰期溫度:136.1℃)、1,1-二(三級己過氧)環己烷(1分鐘半衰期溫度:149.2℃)等。其中,尤其是從交聯反應效率優異來看,可舉例過氧二碳酸二(4-三級丁基環己)酯(1分鐘半衰期溫度:92.1℃)、過氧化二月桂醯(1分鐘半衰期溫度:116.4℃)、過氧化二苯甲醯(1分鐘半衰期溫度:130.0℃)等。 Peroxides include, for example, di(2-ethylhexyl) peroxydicarbonate (1 minute half-life temperature: 90.6°C), di(4-tert-butylcyclohexyl) peroxydicarbonate (1 minute half-life temperature: 92.1°C), di-di-butyl peroxydicarbonate (1 minute half-life temperature: 92.4°C), tri-butyl peroxyneodecanoate (1 minute half-life temperature: 103.5°C), tri-hexyl peroxypivalate (1 minute half-life temperature: 109.1°C), tri-butyl peroxypivalate (1 minute half-life temperature: 110.3°C), dilauryl peroxide (1 Half-life temperature of 1 minute: 116.4℃), dioctyl peroxide (half-life temperature of 1 minute: 117.4℃), 1,1,3,3-tetramethylbutyl peroxy-2-ethylhexanoate (half-life temperature of 1 minute: 124.3℃), di(4-methylbenzoyl) peroxide (half-life temperature of 1 minute: 128.2℃), dibenzoyl peroxide (half-life temperature of 1 minute: 130.0℃), tertiary butyl peroxyisobutyrate (half-life temperature of 1 minute: 136.1℃), 1,1-di(tertiary hexylperoxy)cyclohexane (half-life temperature of 1 minute: 149.2℃), etc. Among them, in terms of excellent crosslinking reaction efficiency, examples include di(4-tert-butylcyclohexyl) peroxydicarbonate (1 minute half-life temperature: 92.1°C), dilauryl peroxide (1 minute half-life temperature: 116.4°C), and dibenzoyl peroxide (1 minute half-life temperature: 130.0°C).

過氧化物之半衰期是表示過氧化物分解速度的指標,意指過氧化物之殘存量變成一半為止的時間。有關用以於任意時間內達到半衰期的分解溫度、或是於任意溫度下的半衰期時間,係記載於製造商型錄等,例如記載於日本油脂公司之「有機過氧化物型錄第9版(2003年5月)」等。 The half-life of peroxide is an indicator of the decomposition rate of peroxide, which means the time until the residual amount of peroxide becomes half. The decomposition temperature used to reach the half-life within a certain time, or the half-life time at a certain temperature, is recorded in the manufacturer's catalog, such as the "Organic Peroxide Catalog 9th Edition (May 2003)" of NOF Corporation.

當黏著劑組成物中摻合有交聯劑時,交聯劑之摻合量相對於基礎 聚合物100重量份宜為0.01~3重量份,較佳為0.02~2重量份,更佳為0.03~1重量份。當交聯劑之摻合量在0.01重量份以上時,黏著劑層1會充分交聯而有耐久性或黏著特性提升之傾向。另一方面,當交聯劑之摻合量在3重量份以下時,黏著劑層1會變硬而有能抑制耐久性降低之傾向。 When a crosslinking agent is blended into the adhesive composition, the blending amount of the crosslinking agent is preferably 0.01 to 3 parts by weight, preferably 0.02 to 2 parts by weight, and more preferably 0.03 to 1 part by weight relative to 100 parts by weight of the base polymer. When the blending amount of the crosslinking agent is more than 0.01 parts by weight, the adhesive layer 1 will be fully crosslinked and tend to have improved durability or adhesive properties. On the other hand, when the blending amount of the crosslinking agent is less than 3 parts by weight, the adhesive layer 1 will become hard and tend to suppress the decrease in durability.

當黏著劑組成物中摻合有異氰酸酯系交聯劑時,異氰酸酯系交聯劑之摻合量相對於基礎聚合物100重量份宜為0.01~2重量份,較佳為0.02~2重量份,更佳為0.05~1.5重量份。當異氰酸酯系交聯劑之摻合量在上述範圍內時,黏著劑層1之凝集力會提升而有抑制在耐久性試驗中剝離之傾向。 When an isocyanate crosslinking agent is blended into the adhesive composition, the blending amount of the isocyanate crosslinking agent is preferably 0.01 to 2 parts by weight, preferably 0.02 to 2 parts by weight, and more preferably 0.05 to 1.5 parts by weight relative to 100 parts by weight of the base polymer. When the blending amount of the isocyanate crosslinking agent is within the above range, the cohesive force of the adhesive layer 1 will be enhanced and the tendency to peel off in the durability test will be suppressed.

當黏著劑組成物中摻合有過氧化物時,過氧化物之摻合量相對於基礎聚合物100重量份宜為0.01~2重量份,較佳為0.04~1.5重量份,更佳為0.05~1重量份。當過氧化物之摻合量在上述範圍內時,可輕易地調整黏著劑層1之加工性、交聯穩定性等。 When peroxide is mixed in the adhesive composition, the amount of peroxide mixed is preferably 0.01 to 2 parts by weight, preferably 0.04 to 1.5 parts by weight, and more preferably 0.05 to 1 part by weight relative to 100 parts by weight of the base polymer. When the amount of peroxide mixed is within the above range, the processability, crosslinking stability, etc. of the adhesive layer 1 can be easily adjusted.

<其他成分> <Other ingredients>

黏著劑組成物更可含有離子性化合物。離子性化合物並無特殊限制,可適當使用本領域中所用之物。離子性化合物可舉例如日本特開2015-4861號公報中記載之物,其等之中又以(全氟烷基磺醯基)醯亞胺鋰鹽為佳,更佳為雙(三氟甲磺醯基醯亞胺)鋰。離子性化合物之摻合量並無特殊限制,可設定在無損本發明效果的範圍內,譬如,相對於基礎聚合物100重量份,宜為10重量份以下,較佳為5重量份以下,更佳為3重量份以下,尤佳為1重量份以下。 The adhesive composition may further contain an ionic compound. There is no particular limitation on the ionic compound, and those used in the field may be used appropriately. Examples of the ionic compound include those described in Japanese Patent Publication No. 2015-4861, among which (perfluoroalkylsulfonyl)imide lithium salt is preferred, and bis(trifluoromethanesulfonylimide) lithium is more preferred. There is no particular limitation on the amount of the ionic compound blended, and it may be set within a range that does not impair the effect of the invention, for example, relative to 100 parts by weight of the base polymer, it is preferably 10 parts by weight or less, preferably 5 parts by weight or less, more preferably 3 parts by weight or less, and particularly preferably 1 part by weight or less.

黏著劑組成物亦可含有其他公知添加劑,例如可因應使用用途適當添加著色劑、顏料等粉體、染料、界面活性劑、塑化劑、賦黏劑、表面潤滑劑、調平劑、軟化劑、抗氧化劑、抗老化劑、光穩定劑、紫外線吸收劑、聚合抑制劑、無機或有機填充劑、金屬粉、粒子狀、箔狀物等。再者,亦可在可控制之範圍內,採用已加入還原劑的氧化還原系。該等添加劑宜相對於基礎聚合物100重量份, 在5重量份以下、進而為3重量份以下、進而為1重量份以下之範圍內使用。 The adhesive composition may also contain other known additives, such as colorants, pigment powders, dyes, surfactants, plasticizers, adhesives, surface lubricants, levelers, softeners, antioxidants, anti-aging agents, light stabilizers, ultraviolet absorbers, polymerization inhibitors, inorganic or organic fillers, metal powders, particles, foils, etc., according to the application. Furthermore, a redox system with a reducing agent added may be used within a controllable range. Such additives are preferably used in an amount of less than 5 parts by weight, further less than 3 parts by weight, and further less than 1 part by weight relative to 100 parts by weight of the base polymer.

<黏著劑層之製造方法> <Manufacturing method of adhesive layer>

由黏著劑組成物形成黏著劑層1時,宜調整交聯劑整體相對於黏著劑組成物的添加量,同時充分考慮交聯處理溫度或交聯處理時間之影響。 When the adhesive layer 1 is formed from the adhesive composition, it is advisable to adjust the overall amount of the crosslinking agent added relative to the adhesive composition, while fully considering the effect of the crosslinking treatment temperature or crosslinking treatment time.

依照使用的交聯劑之不同,交聯處理溫度或交聯處理時間可適當調整。交聯處理溫度宜為170℃以下。所述交聯處理可於黏著劑層1乾燥步驟時的溫度下進行,亦可於乾燥步驟後另外設置交聯處理步驟來進行。有關交聯處理時間,可以考慮生產性或作業性進行設定,通常為0.2~20分鐘左右,較佳為0.5~10分鐘左右。 Depending on the crosslinking agent used, the crosslinking treatment temperature or crosslinking treatment time can be appropriately adjusted. The crosslinking treatment temperature is preferably below 170°C. The crosslinking treatment can be performed at the temperature of the adhesive layer 1 during the drying step, or a crosslinking treatment step can be set after the drying step. The crosslinking treatment time can be set in consideration of productivity or workability, usually about 0.2 to 20 minutes, preferably about 0.5 to 10 minutes.

黏著劑層1之形成方法並無特殊限制,可為以下方法:於各種基材上塗佈黏著劑組成物,並利用熱烘箱等乾燥器進行乾燥使溶劑等揮發,視需要施行交聯處理而形成黏著劑層1,並將該黏著劑層1轉印至偏光薄膜2上;亦可為於偏光薄膜2上直接塗佈黏著劑組成物而形成黏著劑層1的方法。 The method for forming the adhesive layer 1 is not particularly limited, and may be the following method: applying an adhesive composition on various substrates, and drying it in a dryer such as a hot oven to volatilize the solvent, and performing a crosslinking treatment as needed to form the adhesive layer 1, and transferring the adhesive layer 1 to the polarizing film 2; or directly applying the adhesive composition on the polarizing film 2 to form the adhesive layer 1.

基材並無特殊限制,可舉例如脫模薄膜、透明樹脂薄膜基材等各種基材。 There is no particular limitation on the substrate, and examples thereof include various substrates such as release films and transparent resin film substrates.

對基材或偏光薄膜2塗佈黏著劑組成物的方法可使用各種方法。具體而言,可舉例如:噴注式塗佈機、輥塗、接觸輥塗佈、凹版塗佈、反向塗佈、輥刷、噴塗、浸漬輥塗佈、棒塗、刮刀塗佈、氣刀塗佈、簾塗、模唇塗佈、利用模具塗佈機等的擠出塗佈法等方法。 Various methods can be used to apply the adhesive composition to the substrate or polarizing film 2. Specifically, for example, there can be cited: injection coating machine, roller coating, contact roller coating, gravure coating, reverse coating, roller brush, spray coating, dip roller coating, rod coating, scraper coating, air knife coating, curtain coating, die lip coating, extrusion coating using a die coating machine, etc.

上述乾燥條件(溫度、時間)並無特殊限制,可依照黏著劑組成物之組成、濃度等適當設定,例如為80~170℃左右、較佳為90~200℃,且為1~60分鐘、較佳為2~30分鐘。乾燥後可以視需要施行交聯處理,其條件如上述。 The above drying conditions (temperature, time) are not particularly limited and can be appropriately set according to the composition and concentration of the adhesive composition, for example, about 80~170℃, preferably 90~200℃, and 1~60 minutes, preferably 2~30 minutes. After drying, crosslinking treatment can be performed as needed, and the conditions are as mentioned above.

黏著劑層1之厚度(乾燥後)例如宜為5~100μm,較佳為7~70μm,更佳為10~50μm。若黏著劑層1之厚度在5μm以上,對被黏著體的密著性會提 升而有於加濕條件下具有充分耐久性之傾向。另一方面,當黏著劑層之厚度在100μm以下時,於形成黏著劑層1時的黏著劑組成物乾燥時可充分乾燥,能抑制氣泡殘存或者黏著劑層1產生厚度不均,而有不易產生外觀上的問題之傾向。 The thickness of the adhesive layer 1 (after drying) is preferably 5 to 100 μm, preferably 7 to 70 μm, and more preferably 10 to 50 μm. If the thickness of the adhesive layer 1 is above 5 μm, the adhesion to the adherend will be improved and it tends to have sufficient durability under humidified conditions. On the other hand, when the thickness of the adhesive layer is below 100 μm, the adhesive composition can be dried sufficiently when forming the adhesive layer 1, which can suppress the remaining bubbles or uneven thickness of the adhesive layer 1, and it tends to be less likely to cause appearance problems.

脫模薄膜之構成材料可舉例如:聚乙烯、聚丙烯、聚對苯二甲酸乙二酯、聚酯薄膜等樹脂薄膜、紙、布、不織布等多孔質材料、網狀物、發泡片、金屬箔及該等之積層體等。從表面平滑性優異之觀點來看,脫模薄膜適合使用樹脂薄膜。樹脂薄膜可舉例如:聚乙烯薄膜、聚丙烯薄膜、聚丁烯薄膜、聚丁二烯薄膜、聚甲基戊烯薄膜、聚氯乙烯薄膜、氯乙烯共聚物薄膜、聚對苯二甲酸乙二酯薄膜、聚對苯二甲酸丁二酯薄膜、聚胺甲酸乙酯薄膜、乙烯-乙酸乙烯酯共聚物薄膜等。 The constituent materials of the release film include, for example, resin films such as polyethylene, polypropylene, polyethylene terephthalate, polyester film, porous materials such as paper, cloth, non-woven fabric, mesh, foam sheet, metal foil, and laminates thereof. From the perspective of excellent surface smoothness, the release film is suitable for using resin film. Examples of the resin film include, for example, polyethylene film, polypropylene film, polybutylene film, polybutadiene film, polymethylpentene film, polyvinyl chloride film, vinyl chloride copolymer film, polyethylene terephthalate film, polybutylene terephthalate film, polyurethane film, ethylene-vinyl acetate copolymer film, etc.

脫模薄膜之厚度通常為5~200μm,較佳為5~100μm左右。視需要,亦可對脫模薄膜施行利用聚矽氧系、氟系、長鏈烷基系、脂肪酸醯胺系等脫模劑、矽粉等來進行的脫模處理及防汙處理、或是塗佈型、捏合型、蒸鍍型等抗靜電處理。尤其是藉由對脫模薄膜之表面適當施行聚矽氧處理、長鏈烷基處理、氟處理等剝離處理,可進一步提高自黏著劑層1剝離的剝離性。 The thickness of the release film is usually 5~200μm, preferably about 5~100μm. If necessary, the release film can also be subjected to release treatment and anti-fouling treatment using release agents such as polysiloxane, fluorine, long-chain alkyl, fatty acid amide, silicon powder, etc., or anti-static treatment such as coating, kneading, and evaporation. In particular, by appropriately performing a release treatment such as polysiloxane treatment, long-chain alkyl treatment, and fluorine treatment on the surface of the release film, the release property of the self-adhesive layer 1 can be further improved.

透明樹脂薄膜基材並無特殊限制,可使用具有透明性的各種樹脂薄膜。該樹脂薄膜由1層薄膜所形成。譬如,其材料可舉例:聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯等聚酯系樹脂、乙酸酯系樹脂、聚醚碸系樹脂、聚碳酸酯系樹脂、聚醯胺系樹脂、聚醯亞胺系樹脂、聚烯烴系樹脂、(甲基)丙烯酸系樹脂、聚氯乙烯系樹脂、聚二氯亞乙烯系樹脂、聚苯乙烯系樹脂、聚乙烯醇系樹脂、聚芳酯系樹脂、聚伸苯硫醚系樹脂等。該等之中尤其理想的是聚酯系樹脂、聚醯亞胺系樹脂及聚醚碸系樹脂。薄膜基材之厚度宜為15~200μm。 There is no particular limitation on the transparent resin film substrate, and various transparent resin films can be used. The resin film is formed by one layer of film. For example, the material can include polyester resins such as polyethylene terephthalate and polyethylene naphthalate, acetate resins, polyether sulfide resins, polycarbonate resins, polyamide resins, polyimide resins, polyolefin resins, (meth) acrylic resins, polyvinyl chloride resins, polyvinylidene chloride resins, polystyrene resins, polyvinyl alcohol resins, polyarylate resins, polyphenylene sulfide resins, etc. Among them, polyester resins, polyimide resins and polyether sulfide resins are particularly desirable. The thickness of the film substrate should be 15~200μm.

[偏光薄膜] [Polarizing film]

偏光薄膜2是含有偏光件及透明保護薄膜的積層體。透明保護薄膜例如與層 狀偏光件之主面(具有最大面積的表面)相接而配置。偏光件亦可配置於2個透明保護薄膜間。 The polarizing film 2 is a laminate containing a polarizer and a transparent protective film. The transparent protective film is arranged, for example, in contact with the main surface (surface with the largest area) of the layered polarizer. The polarizer can also be arranged between two transparent protective films.

偏光件並無特殊限制,可使用各種偏光件。偏光件可舉例如:使聚乙烯醇系薄膜、部分縮甲醛化聚乙烯醇系薄膜、乙烯-乙酸乙烯酯共聚物系部分皂化薄膜等親水性高分子薄膜吸附碘或二色性染料之二色性物質並且經單軸延伸者;聚乙烯醇之脫水處理物、聚氯乙烯之脫鹽酸處理物等多烯系定向薄膜等。該等之中,又以由聚乙烯醇系薄膜與碘等二色性物質構成的偏光件為佳,更佳為含有碘及/或碘離子的碘系偏光件。偏光件之厚度並無特殊限制,一般為5~80μm左右。 There is no special restriction on the polarizer, and various polarizers can be used. Examples of polarizers include: hydrophilic polymer films such as polyvinyl alcohol films, partially formalized polyvinyl alcohol films, and partially saponified films of ethylene-vinyl acetate copolymers adsorbing dichroic substances such as iodine or dichroic dyes and uniaxially stretched; polyolefin-based oriented films such as dehydrated polyvinyl alcohol and dehydrogenated polyvinyl chloride. Among them, the polarizer composed of polyvinyl alcohol films and dichroic substances such as iodine is preferred, and the iodine-based polarizer containing iodine and/or iodine ions is more preferred. There is no special restriction on the thickness of the polarizer, which is generally about 5~80μm.

若為聚乙烯醇系薄膜,於高溫環境下,聚乙烯醇因脫水反應而多烯化,從而有薄膜之光學特性降低之情形。多烯化在偏光薄膜2之水分量多時會有明顯發生之傾向。因此,當偏光件使用聚乙烯醇系薄膜時,用以事先減少偏光薄膜2之水分量的預熱尤其重要。 If it is a polyvinyl alcohol film, in a high temperature environment, polyvinyl alcohol will be polyene-degraded due to dehydration reaction, thereby reducing the optical properties of the film. Polyene-degradation tends to occur significantly when the water content of the polarizing film 2 is high. Therefore, when the polarizing element uses a polyvinyl alcohol film, preheating to reduce the water content of the polarizing film 2 in advance is particularly important.

將聚乙烯醇系薄膜用碘染色並經單軸延伸的偏光件例如可依下述來製作:藉由將聚乙烯醇浸漬於碘水溶液中而進行染色,並延伸成原長的3~7倍。視需要,亦可將聚乙烯醇浸漬於含有硼酸、硫酸鋅、氯化鋅等的碘化鉀等水溶液中。更可視需要在染色前將聚乙烯醇系薄膜浸漬於水中進行水洗。藉由水洗聚乙烯醇系薄膜,可洗淨聚乙烯醇系薄膜表面的汙垢或抗結塊劑,除此之外,也有使聚乙烯醇系薄膜膨潤從而抑制染色不均等的產生之效果。聚乙烯醇系薄膜之延伸可於用碘染色後進行,亦可一邊染色一邊進行,也可以在用碘染色之前進行。延伸可於硼酸、碘化鉀等水溶液或水浴中進行。 The polarizer of the polyvinyl alcohol film dyed with iodine and uniaxially stretched can be made as follows: dyeing is performed by immersing the polyvinyl alcohol in an iodine aqueous solution and stretching it to 3 to 7 times the original length. If necessary, the polyvinyl alcohol can also be immersed in an aqueous solution of potassium iodide containing boric acid, zinc sulfate, zinc chloride, etc. If necessary, the polyvinyl alcohol film can be immersed in water and washed before dyeing. By washing the polyvinyl alcohol film with water, the dirt or anti-caking agent on the surface of the polyvinyl alcohol film can be washed away. In addition, it also has the effect of swelling the polyvinyl alcohol film and thus suppressing the occurrence of uneven dyeing. The stretching of the polyvinyl alcohol film can be performed after dyeing with iodine, while dyeing, or before dyeing with iodine. The stretching can be performed in an aqueous solution or water bath of boric acid, potassium iodide, etc.

偏光件亦可使用厚度在10μm以下的薄型偏光件。就薄型化之觀點而言,偏光件之厚度宜為1~7μm。此種薄型偏光件之厚度不均少、視辨性優異而且尺寸變化少,因此耐久性優異,再者,在謀求偏光薄膜2之薄型化方面較 為理想。 The polarizer may also be a thin polarizer with a thickness of less than 10μm. From the perspective of thinness, the thickness of the polarizer is preferably 1~7μm. Such a thin polarizer has less uneven thickness, excellent visibility and less dimensional change, so it has excellent durability. Furthermore, it is more ideal in terms of seeking to thin the polarizing film 2.

薄型偏光件代表上可舉例:日本特開昭51-069644號公報、日本特開2000-338329號公報、國際公開第2010/100917號、日本專利第4751481號公報、日本特開2012-073563號公報中記載的薄型偏光膜。該等薄型偏光膜可藉由包含以下步驟的製法製得:將聚乙烯醇系樹脂(以下,亦稱作PVA系樹脂)層與延伸用樹脂基材以積層體狀態進行延伸的步驟;及染色步驟。若為該製法,由於PVA系樹脂層受到延伸用樹脂基材支持,因此,即使PVA系樹脂層較薄,亦可抑制因延伸所導致的斷裂等不良狀況。 Representative examples of thin polarizers include thin polarizing films described in Japanese Patent Publication No. 51-069644, Japanese Patent Publication No. 2000-338329, International Publication No. 2010/100917, Japanese Patent Publication No. 4751481, and Japanese Patent Publication No. 2012-073563. These thin polarizing films can be produced by a method comprising the following steps: a step of extending a polyvinyl alcohol resin (hereinafter, also referred to as a PVA resin) layer and an extending resin substrate in a laminated state; and a dyeing step. According to this manufacturing method, since the PVA resin layer is supported by the stretching resin substrate, even if the PVA resin layer is thin, defects such as breakage caused by stretching can be suppressed.

於包含以積層體狀態進行延伸的步驟及染色步驟的製法中,從可延伸成高倍率且可提升偏光性能之觀點來看,又以國際公開第2010/100917號、日本專利第4751481號、日本特開2012-073563號公報中記載的製法為佳,該製法包含於硼酸水溶液中進行延伸的步驟,尤其是以日本專利第4751481號公報或日本特開2012-073563號公報中記載的製法為佳,該製法包含於硼酸水溶液中進行延伸前輔助性地進行空中延伸的步驟。 In the method including the step of stretching in a laminate state and the step of dyeing, from the viewpoint of being able to stretch to a high ratio and improving polarization performance, the method described in International Publication No. 2010/100917, Japanese Patent No. 4751481, and Japanese Patent Publication No. 2012-073563 is preferred, and the method includes the step of stretching in a boric acid aqueous solution, and in particular, the method described in Japanese Patent No. 4751481 or Japanese Patent Publication No. 2012-073563 is preferred, and the method includes the step of auxiliary air stretching before stretching in a boric acid aqueous solution.

形成設置於偏光件之單面或兩面上的透明保護薄膜之材料,例如可使用透明性、機械強度、熱穩定性、水分阻斷性、各向同性等優異之熱塑性樹脂。此種熱塑性樹脂之具體例可舉例:三醋酸纖維素等纖維素樹脂、聚酯樹脂、聚醚碸樹脂、聚碸樹脂、聚碳酸酯樹脂、聚醯胺樹脂、聚醯亞胺樹脂、聚烯烴樹脂、(甲基)丙烯酸樹脂、環狀聚烯烴樹脂(降莰烯系樹脂)、聚芳酯樹脂、聚苯乙烯樹脂、聚乙烯醇樹脂及該等之混合物。透明保護薄膜之材料亦可為(甲基)丙烯酸系、胺甲酸乙酯系、丙烯酸胺甲酸乙酯系、環氧系、聚矽氧系等熱硬化性樹脂或紫外線硬化型樹脂。當偏光薄膜2具有2個透明保護薄膜時,2個透明保護薄膜之材料可互為相同,亦可不同。譬如,可透過接著劑,對偏光件之一主面貼合已由熱塑性樹脂構成的透明保護薄膜,並且對偏光件之另一主面貼合已由熱硬化 性樹脂或紫外線硬化型樹脂構成的透明保護薄膜。透明保護薄膜可含有1種以上任意之添加劑。添加劑可舉例如:紫外線吸收劑、抗氧化劑、滑劑、塑化劑、脫模劑、抗著色劑、阻燃劑、成核劑、抗靜電劑、顏料、著色劑等。透明保護薄膜中熱塑性樹脂之含有率宜為50~100重量%,較佳為50~99重量%,更佳為60~98重量%,尤佳為70~97重量%。當透明保護薄膜中熱塑性樹脂之含有率在50重量%以上時,會有能充分顯現熱塑性樹脂原有的高透明性等之傾向。 The material for forming the transparent protective film disposed on one or both sides of the polarizer may be, for example, a thermoplastic resin having excellent transparency, mechanical strength, thermal stability, moisture barrier property, isotropy, etc. Specific examples of such thermoplastic resins include cellulose resins such as cellulose triacetate, polyester resins, polyether sulphate resins, polysulphate resins, polycarbonate resins, polyamide resins, polyimide resins, polyolefin resins, (meth)acrylic resins, cyclic polyolefin resins (norbornene resins), polyarylate resins, polystyrene resins, polyvinyl alcohol resins, and mixtures thereof. The material of the transparent protective film may also be a thermosetting resin or UV-curing resin such as (meth) acrylic acid, urethane, acrylic urethane, epoxy, or silicone. When the polarizing film 2 has two transparent protective films, the materials of the two transparent protective films may be the same or different. For example, a transparent protective film made of a thermoplastic resin may be attached to one main surface of the polarizer through an adhesive, and a transparent protective film made of a thermosetting resin or UV-curing resin may be attached to the other main surface of the polarizer. The transparent protective film may contain one or more arbitrary additives. Additives include, for example, ultraviolet absorbers, antioxidants, lubricants, plasticizers, mold release agents, anti-coloring agents, flame retardants, nucleating agents, antistatic agents, pigments, coloring agents, etc. The content of thermoplastic resin in the transparent protective film is preferably 50-100% by weight, preferably 50-99% by weight, more preferably 60-98% by weight, and particularly preferably 70-97% by weight. When the content of thermoplastic resin in the transparent protective film is above 50% by weight, the original high transparency of the thermoplastic resin tends to be fully manifested.

透明保護薄膜之厚度可適當決定,一般從強度或處理性等作業性、薄膜性等觀點來看,為10~200μm左右。 The thickness of the transparent protective film can be appropriately determined. Generally, it is about 10~200μm from the perspective of workability such as strength or handling, and film properties.

偏光薄膜2中所含至少1個透明保護薄膜之透濕度宜為300g/m2.24h以上,較佳為500g/m2.24h以上,更佳為800g/m2.24h以上。當透明保護薄膜之透濕度高時,可藉由預熱輕易地減少偏光薄膜2之水分量。另一方面,若透明保護薄膜之透濕度過高,便會有偏光薄膜2之加濕耐久性降低之情形。因此,透明保護薄膜之透濕度宜為1600g/m2.24h以下,更佳為1300g/m2.24h以下。另,透濕度是根據JIS Z0208之透濕度試驗(杯式法)測得之值,且為在40℃、90%之相對濕度差之下於24小時內透過面積1m2之試料的水蒸氣重量。 The moisture permeability of at least one transparent protective film contained in the polarizing film 2 is preferably 300 g/m 2 . 24 h or more, preferably 500 g/m 2 . 24 h or more, and more preferably 800 g/m 2 . 24 h or more. When the moisture permeability of the transparent protective film is high, the moisture content of the polarizing film 2 can be easily reduced by preheating. On the other hand, if the moisture permeability of the transparent protective film is too high, the humidification durability of the polarizing film 2 will be reduced. Therefore, the moisture permeability of the transparent protective film is preferably 1600 g/m 2 . 24 h or less, and more preferably 1300 g/m 2 . 24 h or less. In addition, moisture permeability is the value measured according to the moisture permeability test (cup method) of JIS Z0208, and is the weight of water vapor that passes through a sample area of 1m2 within 24 hours at 40℃ and a relative humidity difference of 90%.

偏光件與透明保護薄膜通常會透過水系接著劑等密著。水系接著劑可例示:異氰酸酯系接著劑、聚乙烯醇系接著劑、明膠系接著劑、乙烯基系乳膠系、水系聚胺甲酸乙酯、水系聚酯等。上述接著劑以外的其他接著劑可舉例紫外線硬化型接著劑、電子射線硬化型接著劑等。電子射線硬化型偏光薄膜用接著劑對各種透明保護薄膜顯示適當之接著性。接著劑亦可含有金屬化合物填料。 Polarizers and transparent protective films are usually adhered to each other through water-based adhesives. Examples of water-based adhesives include isocyanate adhesives, polyvinyl alcohol adhesives, gelatin adhesives, vinyl latex adhesives, water-based polyurethane, and water-based polyester. Other adhesives other than the above adhesives include UV-curable adhesives and electron beam-curable adhesives. Electron beam-curable polarizing film adhesives show appropriate adhesion to various transparent protective films. Adhesives may also contain metal compound fillers.

偏光薄膜2中,亦可於偏光件上形成相位差薄膜等以取代透明保護薄膜。於透明保護薄膜上亦可進一步設置其他透明保護薄膜或設置相位差薄膜等等。 In the polarizing film 2, a phase difference film can also be formed on the polarizing element to replace the transparent protective film. Other transparent protective films or phase difference films can also be further provided on the transparent protective film.

針對透明保護薄膜,亦可在與接著偏光件之表面相對向的表面設 置硬塗層,亦可施行以抗反射、抗黏著、擴散、防眩等為目的之處理。 For the transparent protective film, a hard coating layer can be provided on the surface opposite to the surface connected to the polarizer, and treatments for the purpose of anti-reflection, anti-adhesion, diffusion, anti-glare, etc. can also be performed.

[其他構件] [Other components]

附黏著劑層之偏光薄膜10更可具備偏光薄膜2以外的其他光學薄膜。其他光學薄膜可舉例如反射板、反透射板、相位差薄膜、視角補償薄膜、增亮薄膜等用於液晶顯示裝置的薄膜。相位差薄膜例如包含1/2波長板、1/4波長板等。附黏著劑層之偏光薄膜10亦可具備該等1種或2種以上的其他光學薄膜。 The polarizing film 10 with an adhesive layer may also have other optical films other than the polarizing film 2. Other optical films include reflective plates, reflective plates, phase difference films, viewing angle compensation films, brightness enhancement films, and other films used in liquid crystal display devices. Phase difference films include, for example, 1/2 wavelength plates, 1/4 wavelength plates, and the like. The polarizing film 10 with an adhesive layer may also have one or more of these other optical films.

附黏著劑層之偏光薄膜10更可具備位於偏光薄膜2與黏著劑層1間的錨固層。形成錨固層的材料並無特殊限制,可舉例如各種聚合物類、金屬氧化物之溶膠、二氧化矽溶膠等。該等之中,尤其宜使用聚合物類。聚合物類之使用形態可為溶劑可溶型、水分散型、水溶解型中任一者。 The polarizing film 10 with an adhesive layer may further include an anchoring layer between the polarizing film 2 and the adhesive layer 1. The material forming the anchoring layer is not particularly limited, and examples thereof include various polymers, metal oxide sols, silica sols, etc. Among these, polymers are particularly suitable. The polymers may be used in any of the solvent-soluble, water-dispersible, and water-soluble forms.

上述聚合物類可舉例如:聚胺甲酸乙酯系樹脂、聚酯系樹脂、丙烯酸系樹脂、聚醚系樹脂、纖維素系樹脂、聚乙烯醇系樹脂、聚乙烯基吡咯啶酮、聚苯乙烯系樹脂等。 Examples of the above-mentioned polymers include polyurethane resins, polyester resins, acrylic resins, polyether resins, cellulose resins, polyvinyl alcohol resins, polyvinyl pyrrolidone, polystyrene resins, etc.

當附黏著劑層之偏光薄膜10的黏著劑層1露出時,直到供實際使用為止,可利用脫模薄膜(分離膜)來保護黏著劑層1。脫模薄膜可舉例前述之物。製作黏著劑層1時,當使用脫模薄膜作為基材時,藉由貼合脫模薄膜上的黏著劑層1與偏光薄膜2,可使用該脫模薄膜作為附黏著劑層之偏光薄膜10的黏著劑層1之脫模薄膜,在步驟面上可簡化。 When the adhesive layer 1 of the polarizing film 10 with an adhesive layer is exposed, a release film (separation film) can be used to protect the adhesive layer 1 until it is actually used. The release film can be exemplified by the aforementioned material. When making the adhesive layer 1, when the release film is used as a substrate, by laminating the adhesive layer 1 on the release film and the polarizing film 2, the release film can be used as the release film of the adhesive layer 1 of the polarizing film 10 with an adhesive layer, which can simplify the steps.

[黏著劑層之特性] [Characteristics of the adhesive layer]

附黏著劑層之偏光薄膜10的黏著劑層1,即便是在貼合於導電層上時,亦可維持預熱後之重工性,同時具有於高溫環境下的耐久性,接著,針對其理由,與思索機制一同來說明。 The adhesive layer 1 of the polarizing film 10 with an adhesive layer can maintain the reworkability after preheating even when attached to the conductive layer, and has durability in a high temperature environment. Next, the reason and the thinking mechanism are explained.

由黏著劑組成物形成黏著劑層1後,黏著劑層1中,化合物(C)之酸酐基會藉由空氣中的水分而水解,藉此變化成酸基。另一方面,在含有ITO等金 屬氧化物的導電層之表面,不僅是羥基,還存在有羥基以羥離子之形式脫離而產生的金屬陽離子。如圖2所示,當已利用黏著劑層1將附黏著劑層之偏光薄膜10貼合於導電層3時,化合物(C)之酸基會藉由與存在於導電層3表面附近的羥離子之中和反應而去質子化。藉此生成的陰離子會與導電層3表面的金屬陽離子形成離子鍵。即,於化合物(C)之酸基與導電層3之間產生酸鹼反應。藉此可推斷,化合物(C)於導電層3之表面上偏析,黏著劑層1中可形成含化合物(C)之第1層11。 After the adhesive layer 1 is formed from the adhesive composition, the anhydride groups of the compound (C) in the adhesive layer 1 are hydrolyzed by the moisture in the air and are converted into acid groups. On the other hand, on the surface of the conductive layer containing metal oxides such as ITO, there are not only hydroxyl groups but also metal cations generated by the hydroxyl groups being released in the form of hydroxyl ions. As shown in FIG2 , when the polarizing film 10 with the adhesive layer attached is attached to the conductive layer 3 using the adhesive layer 1, the acid groups of the compound (C) are deprotonated by neutralization reaction with the hydroxyl ions existing near the surface of the conductive layer 3. The anions thus generated form ionic bonds with the metal cations on the surface of the conductive layer 3. That is, an acid-base reaction occurs between the acid group of the compound (C) and the conductive layer 3. It can be inferred that the compound (C) is segregated on the surface of the conductive layer 3, and the first layer 11 containing the compound (C) can be formed in the adhesive layer 1.

在形成第1層11後,於第1層11之表面上會有聚醚化合物(D)偏析之傾向。因此,黏著劑層1中,於第1層11上可形成含聚醚化合物(D)之第2層12。另,當黏著劑層1不含化合物(C)時,聚醚化合物(D)於導電層3之表面上幾乎不會偏析。因此,第1層11可視為將導電層3之表面改質而使聚醚化合物(D)容易偏析的表面改質層。 After the first layer 11 is formed, the polyether compound (D) tends to segregate on the surface of the first layer 11. Therefore, in the adhesive layer 1, the second layer 12 containing the polyether compound (D) can be formed on the first layer 11. In addition, when the adhesive layer 1 does not contain the compound (C), the polyether compound (D) hardly segregates on the surface of the conductive layer 3. Therefore, the first layer 11 can be regarded as a surface modification layer that modifies the surface of the conductive layer 3 and makes the polyether compound (D) easily segregate.

如此可推斷,藉由利用黏著劑層1將附黏著劑層之偏光薄膜10貼合於導電層3,黏著劑層1中可形成第1層11及第2層12。藉由形成第1層11及第2層12,黏著劑層1中可進一步形成例如主要含有黏著劑的第3層13。第1層11、第2層12及第3層13於積層方向上依序排列。 Thus, it can be inferred that by using the adhesive layer 1 to bond the polarizing film 10 with the adhesive layer to the conductive layer 3, the first layer 11 and the second layer 12 can be formed in the adhesive layer 1. By forming the first layer 11 and the second layer 12, the third layer 13 mainly containing the adhesive can be further formed in the adhesive layer 1. The first layer 11, the second layer 12, and the third layer 13 are arranged in order in the stacking direction.

在進行預熱前,第1層11及第2層12之凝集力會小於第3層13。因此,在進行預熱前,可藉由在第1層11或第2層12之凝集破壞,將附黏著劑層之偏光薄膜10輕易地自導電層3剝離。 Before preheating, the cohesion of the first layer 11 and the second layer 12 is smaller than that of the third layer 13. Therefore, before preheating, the polarizing film 10 with the adhesive layer can be easily peeled off from the conductive layer 3 by destroying the cohesion of the first layer 11 or the second layer 12.

當例如於70℃~95℃左右之溫度下進行預熱時,藉由化合物(C)之反應等,會有第1層11之凝集力大幅增加之傾向。第1層11之凝集力之增加在化合物(C)含有水解性基(h1)時會特別明顯。另一方面,相較於第1層11,第2層12之凝集力不易增加。因此,在進行預熱後,可藉由在第2層12或第1層11與第2層12之界面之凝集破壞,將附黏著劑層之偏光薄膜10輕易地自導電層3剝離。即,第2層12作為在預熱後確保黏著劑層1之重工性之層體而發揮機能。 When preheating is performed at a temperature of about 70°C to 95°C, for example, the cohesive force of the first layer 11 tends to increase significantly due to the reaction of the compound (C). The increase in the cohesive force of the first layer 11 is particularly significant when the compound (C) contains a hydrolyzable group (h1). On the other hand, the cohesive force of the second layer 12 is less likely to increase than that of the first layer 11. Therefore, after preheating, the polarizing film 10 with the adhesive layer can be easily peeled off from the conductive layer 3 by destroying the cohesion at the second layer 12 or at the interface between the first layer 11 and the second layer 12. That is, the second layer 12 functions as a layer that ensures the heavy workability of the adhesive layer 1 after preheating.

再者,當黏著劑層1配置於溫度高於95℃之環境下時,藉由聚醚化合物(D)之反應等,會有第2層12之凝集力大幅增加之傾向。第2層12之凝集力之增加在聚醚化合物(D)含有水解性基(h2)時會特別明顯。藉此,黏著劑層1與導電層3之接著力大幅增加而有黏著劑層1之耐久性提升之傾向。 Furthermore, when the adhesive layer 1 is placed in an environment with a temperature higher than 95°C, the cohesive force of the second layer 12 tends to be greatly increased due to the reaction of the polyether compound (D). The increase in the cohesive force of the second layer 12 is particularly significant when the polyether compound (D) contains a hydrolyzable group (h2). As a result, the adhesion between the adhesive layer 1 and the conductive layer 3 is greatly increased, and the durability of the adhesive layer 1 tends to be improved.

本發明從另一方面來看提供一種黏著劑層1,其係由黏著劑組成物所形成,且黏著劑組成物含有具酸基或酸酐基之化合物(C)及聚醚化合物(D),利用試驗1求得之接著力P85在10.0N/25mm以下,且利用試驗2求得之接著力P105大於10.0N/25mm。 From another aspect, the present invention provides an adhesive layer 1, which is formed by an adhesive composition, and the adhesive composition contains a compound (C) having an acid group or anhydride group and a polyether compound (D), and the adhesion force P85 obtained by test 1 is less than 10.0N/25mm, and the adhesion force P105 obtained by test 2 is greater than 10.0N/25mm.

(影像顯示面板之實施形態) (Implementation form of image display panel)

如圖3所示,本實施形態之影像顯示面板100具備附黏著劑層之偏光薄膜10、導電層3及透明基板4。導電層3及透明基板4例如為構成液晶單元20的構件。即,影像顯示面板100是具備附黏著劑層之偏光薄膜10及液晶單元20的液晶顯示面板。不過,影像顯示面板100亦可具備有機EL單元以取代液晶單元20。影像顯示面板100中,附黏著劑層之偏光薄膜10例如位於比液晶單元20更靠近視辨側。 As shown in FIG3 , the image display panel 100 of the present embodiment has a polarizing film 10 with an adhesive layer, a conductive layer 3, and a transparent substrate 4. The conductive layer 3 and the transparent substrate 4 are components constituting the liquid crystal unit 20, for example. That is, the image display panel 100 is a liquid crystal display panel having the polarizing film 10 with an adhesive layer and the liquid crystal unit 20. However, the image display panel 100 may also have an organic EL unit instead of the liquid crystal unit 20. In the image display panel 100, the polarizing film 10 with an adhesive layer is, for example, located closer to the viewing side than the liquid crystal unit 20.

附黏著劑層之偏光薄膜10、導電層3及透明基板4例如於積層方向上依序排列,而且附黏著劑層之偏光薄膜10的黏著劑層1與導電層3直接相接。換言之,附黏著劑層之偏光薄膜10利用黏著劑層1貼合於導電層3。導電層3例如與透明基板4直接相接。於導電層3與透明基板4間,亦可視需要配置有底塗層、防低聚物層等其他層。 The polarizing film 10 with an adhesive layer, the conductive layer 3 and the transparent substrate 4 are arranged in sequence in the stacking direction, and the adhesive layer 1 of the polarizing film 10 with an adhesive layer is directly connected to the conductive layer 3. In other words, the polarizing film 10 with an adhesive layer is attached to the conductive layer 3 by the adhesive layer 1. The conductive layer 3 is directly connected to the transparent substrate 4, for example. Between the conductive layer 3 and the transparent substrate 4, other layers such as a primer layer and an anti-oligomer layer may also be arranged as needed.

[黏著劑層] [Adhesive layer]

如上述,當已利用黏著劑層1將附黏著劑層之偏光薄膜10貼合於導電層3時,黏著劑層1中,可形成第1層11、第2層12及第3層13。導電層3、第1層11、第2層12及第3層13於積層方向上依序排列,且第3層13位於第2層12與偏光薄膜2間。 As described above, when the polarizing film 10 with an adhesive layer is bonded to the conductive layer 3 using the adhesive layer 1, the first layer 11, the second layer 12, and the third layer 13 can be formed in the adhesive layer 1. The conductive layer 3, the first layer 11, the second layer 12, and the third layer 13 are arranged in sequence in the stacking direction, and the third layer 13 is located between the second layer 12 and the polarizing film 2.

第1層11例如含有化合物(C)或其反應物(R1)。當化合物(C)含有水 解性基(h1)時,反應物(R1)例如為複數個化合物(C)之水解縮合物、或是化合物(C)與導電層3表面之羥基之反應物。第1層11亦可含有化合物(C)或其反應物(R1)作為主成分。 The first layer 11 contains, for example, a compound (C) or a reactant (R1) thereof. When the compound (C) contains a hydrolyzable group (h1), the reactant (R1) is, for example, a hydrolysis condensate of a plurality of compounds (C), or a reactant of the compound (C) and a hydroxyl group on the surface of the conductive layer 3. The first layer 11 may also contain the compound (C) or a reactant (R1) thereof as a main component.

第2層12例如含有聚醚化合物(D)或其反應物(R2)。當聚醚化合物(D)含有水解性基(h2)時,反應物(R2)例如為複數個聚醚化合物(D)之水解縮合物。第2層12亦可含有聚醚化合物(D)或其反應物(R2)作為主成分。 The second layer 12 contains, for example, a polyether compound (D) or its reactant (R2). When the polyether compound (D) contains a hydrolyzable group (h2), the reactant (R2) is, for example, a hydrolysis condensate of a plurality of polyether compounds (D). The second layer 12 may also contain a polyether compound (D) or its reactant (R2) as a main component.

第3層13含有(甲基)丙烯酸系聚合物(A)等基礎聚合物或其反應物(R3)。當形成黏著劑層1的黏著劑組成物含有交聯劑時,反應物(R3)例如為(甲基)丙烯酸系聚合物(A)之交聯物。第3層13亦可含有(甲基)丙烯酸系聚合物(A)或其反應物(R3)作為主成分。 The third layer 13 contains a base polymer such as a (meth)acrylic polymer (A) or a reactant (R3) thereof. When the adhesive composition forming the adhesive layer 1 contains a crosslinking agent, the reactant (R3) is, for example, a crosslinked product of the (meth)acrylic polymer (A). The third layer 13 may also contain a (meth)acrylic polymer (A) or a reactant (R3) thereof as a main component.

另,黏著劑層1具有第1層11、第2層12及第3層13,亦可利用飛行時間型二次離子質量分析法(TOF-SIMS:Time-of-Flight Secondary Ion Mass Spectrometry)等方法來確認。譬如,準備用以形成黏著劑層1的黏著劑組成物。將該黏著劑組成物塗佈於導電層3上,製作乾燥後厚度達1μm左右之塗佈膜。針對使塗佈膜乾燥而製得之膜,自其表面遍及該膜之厚度方向進行利用TOF-SIMS之分析。藉此,可確認黏著劑層1具有第1層11、第2層12及第3層13。 In addition, the adhesive layer 1 has the first layer 11, the second layer 12 and the third layer 13, which can also be confirmed by using methods such as time-of-flight secondary ion mass spectrometry (TOF-SIMS). For example, an adhesive composition for forming the adhesive layer 1 is prepared. The adhesive composition is applied to the conductive layer 3 to form a coating film with a thickness of about 1μm after drying. The film obtained by drying the coating film is analyzed by TOF-SIMS from its surface to the thickness direction of the film. In this way, it can be confirmed that the adhesive layer 1 has the first layer 11, the second layer 12 and the third layer 13.

[導電層] [Conductive layer]

導電層3只要含有金屬氧化物,即無特殊限制。金屬氧化物可舉例如含有以下金屬的氧化物:選自於由銦、錫、鋅、鎵、銻、鈦、矽、鋯、鎂、鋁、金、銀、銅、鈀及鎢所構成群組中至少1種。導電層3不僅是金屬氧化物,視需要更可含有上述群組所示之金屬。導電層3之材料例如宜使用氧化銦錫、含銻之氧化錫等。氧化銦錫意指含氧化錫之氧化銦,並稱作銦-錫複合氧化物或ITO。導電層3宜含有ITO,更佳為實質上由ITO構成。 The conductive layer 3 is not particularly limited as long as it contains metal oxides. Metal oxides may include, for example, oxides containing the following metals: at least one selected from the group consisting of indium, tin, zinc, gallium, antimony, titanium, silicon, zirconium, magnesium, aluminum, gold, silver, copper, palladium and tungsten. The conductive layer 3 is not only a metal oxide, but may also contain metals shown in the above group as needed. The material of the conductive layer 3 is preferably indium tin oxide, tin oxide containing antimony, etc. Indium tin oxide means indium oxide containing tin oxide, and is also called indium-tin composite oxide or ITO. The conductive layer 3 preferably contains ITO, and is more preferably substantially composed of ITO.

導電層3中所含ITO中,氧化銦之含有率宜為80~99重量%。ITO中 氧化錫之含有率宜為1~20重量%。ITO可具有結晶性,亦可為非結晶性(非晶質)。 The content of indium oxide in the ITO contained in the conductive layer 3 is preferably 80 to 99% by weight. The content of tin oxide in ITO is preferably 1 to 20% by weight. ITO may be crystalline or non-crystalline (amorphous).

導電層3之厚度並無特殊限制,宜為10nm以上,較佳為15~40nm,更佳為20~30nm。 The thickness of the conductive layer 3 is not particularly limited, and is preferably greater than 10 nm, preferably 15 to 40 nm, and more preferably 20 to 30 nm.

導電層3之形成方法並無特殊限制,可採用以往公知方法。具體而言,導電層3可利用真空蒸鍍法、濺鍍法、離子鍍法等來製作。該等方法可因應所需導電層3之膜厚適當選擇。 There is no special restriction on the method for forming the conductive layer 3, and a conventionally known method can be used. Specifically, the conductive layer 3 can be made by vacuum evaporation, sputtering, ion plating, etc. These methods can be appropriately selected according to the required film thickness of the conductive layer 3.

[透明基板] [Transparent substrate]

透明基板4只要是透明的基板即可,其材料並無特殊限制。透明基板4可舉例如玻璃、透明樹脂薄膜基材。透明樹脂薄膜基材可舉例上述之物。 The transparent substrate 4 can be any transparent substrate, and its material is not particularly limited. The transparent substrate 4 can be, for example, glass or a transparent resin film substrate. The transparent resin film substrate can be, for example, the above-mentioned ones.

[液晶單元] [Liquid crystal unit]

液晶單元20例如除了導電層3及透明基板4外,更具備液晶層5及透明基板6。液晶單元20中,導電層3、透明基板4、液晶層5及透明基板6於積層方向上依序排列。 For example, the liquid crystal unit 20 has a liquid crystal layer 5 and a transparent substrate 6 in addition to the conductive layer 3 and the transparent substrate 4. In the liquid crystal unit 20, the conductive layer 3, the transparent substrate 4, the liquid crystal layer 5 and the transparent substrate 6 are arranged in sequence in the stacking direction.

液晶層5並無特殊限制,例如可任意使用TN型、STN型、π型、VA型、IPS型等型式。透明基板6只要是透明的基板即可,其材料並無特殊限制。透明基板6可舉例如玻璃、透明樹脂薄膜基材。透明樹脂薄膜基材可舉例上述之物。 There is no special restriction on the liquid crystal layer 5, for example, TN type, STN type, π type, VA type, IPS type, etc. can be used arbitrarily. The transparent substrate 6 can be any transparent substrate, and its material is not particularly limited. The transparent substrate 6 can be, for example, glass or a transparent resin film substrate. The transparent resin film substrate can be, for example, the above-mentioned substances.

[其他構件] [Other components]

影像顯示面板100除了附黏著劑層之偏光薄膜10及液晶單元20外,更可具備相位差薄膜、視角補償薄膜、增亮薄膜等光學薄膜。 In addition to the polarizing film 10 with an adhesive layer and the liquid crystal unit 20, the image display panel 100 may also have optical films such as phase difference film, viewing angle compensation film, and brightness enhancement film.

[影像顯示面板之製造方法] [Manufacturing method of image display panel]

影像顯示面板100之製造方法並無特殊限制,例如包括:在已將附黏著劑層之偏光薄膜10貼合於導電層3之狀態下,針對黏著劑層1,於70℃~95℃下進行第1加熱處理。 The manufacturing method of the image display panel 100 is not particularly limited, and for example includes: after the polarizing film 10 with the adhesive layer is attached to the conductive layer 3, the adhesive layer 1 is subjected to a first heating treatment at 70°C to 95°C.

第1加熱處理相當於用以減少偏光薄膜2之水分量的預熱。第1加熱 處理之溫度宜為80℃~95℃。第1加熱處理之時間並無特殊限制,例如為1小時~5小時,較佳為3小時~5小時。 The first heat treatment is equivalent to preheating for reducing the moisture content of the polarizing film 2. The temperature of the first heat treatment is preferably 80°C to 95°C. The time of the first heat treatment is not particularly limited, for example, 1 hour to 5 hours, preferably 3 hours to 5 hours.

第1加熱處理後偏光薄膜2之水分量並無特殊限制,例如為7g/m2以下。偏光薄膜2之水分量之測定可利用專利文獻1中記載的方法。 The moisture content of the polarizing film 2 after the first heat treatment is not particularly limited, and is, for example, 7 g/m 2 or less. The moisture content of the polarizing film 2 can be measured using the method described in Patent Document 1.

影像顯示面板100之製造方法更可包括:於第1加熱處理後,針對黏著劑層1,於高於95℃之溫度下進行第2加熱處理。藉由第2加熱處理,黏著劑層1之接著力大幅增加而有黏著劑層1之耐久性提升之傾向。第2加熱處理之溫度可為100℃~150℃。第2加熱處理之時間並無特殊限制,例如為1小時~1000小時,較佳為24小時以上。 The manufacturing method of the image display panel 100 may further include: after the first heat treatment, performing a second heat treatment on the adhesive layer 1 at a temperature higher than 95°C. Through the second heat treatment, the adhesion of the adhesive layer 1 is greatly increased, and the durability of the adhesive layer 1 tends to be improved. The temperature of the second heat treatment may be 100°C to 150°C. There is no special limitation on the time of the second heat treatment, for example, 1 hour to 1000 hours, preferably more than 24 hours.

(影像顯示面板之變形例) (Variation example of image display panel)

影像顯示面板100亦可具備2個附黏著劑層之偏光薄膜10。如圖4所示,本變形例之影像顯示面板110具備2個附黏著劑層之偏光薄膜10a及10b。除了附黏著劑層之偏光薄膜10b外,影像顯示面板110之結構與影像顯示面板100之結構相同。因此,在影像顯示面板100與變形例之影像顯示面板110中共通之要素會附上相同的參照符號,有時會省略其等之說明。 The image display panel 100 may also have two polarizing films 10 with adhesive layers. As shown in FIG. 4 , the image display panel 110 of this variant has two polarizing films 10a and 10b with adhesive layers. Except for the polarizing film 10b with adhesive layers, the structure of the image display panel 110 is the same as that of the image display panel 100. Therefore, the common elements in the image display panel 100 and the image display panel 110 of the variant are attached with the same reference symbols, and their descriptions are sometimes omitted.

附黏著劑層之偏光薄膜10b會利用黏著劑層1b,貼合於液晶單元20之透明基板6。影像顯示面板110中,液晶單元20位於附黏著劑層之偏光薄膜10a及10b間,且位於比附黏著劑層之偏光薄膜10b更靠近視辨側。 The polarizing film 10b with an adhesive layer is attached to the transparent substrate 6 of the liquid crystal unit 20 by using the adhesive layer 1b. In the image display panel 110, the liquid crystal unit 20 is located between the polarizing films 10a and 10b with an adhesive layer, and is located closer to the viewing side than the polarizing film 10b with an adhesive layer.

附黏著劑層之偏光薄膜10b所具備的黏著劑層1b及偏光薄膜2b,可分別與附黏著劑層之偏光薄膜10a所具備的黏著劑層1a及偏光薄膜2a相同,亦可不同。黏著劑層1b及偏光薄膜2b亦可為以往本領域中所用之物。 The adhesive layer 1b and polarizing film 2b of the polarizing film 10b with an adhesive layer may be the same as or different from the adhesive layer 1a and polarizing film 2a of the polarizing film 10a with an adhesive layer. The adhesive layer 1b and polarizing film 2b may also be those used in the art in the past.

(影像顯示裝置之實施形態) (Implementation form of image display device)

本實施形態之影像顯示裝置例如具備影像顯示面板100及照明系統。影像顯示裝置中亦可使用影像顯示面板110以取代影像顯示面板100。影像顯示裝置中, 影像顯示面板100例如配置於比照明系統更靠近視辨側。照明系統例如具有背光源或反射板,並將光照射至影像顯示面板100。 The image display device of this embodiment, for example, has an image display panel 100 and a lighting system. The image display panel 110 can also be used in the image display device to replace the image display panel 100. In the image display device, the image display panel 100 is, for example, arranged closer to the visual recognition side than the lighting system. The lighting system, for example, has a backlight source or a reflector, and irradiates light to the image display panel 100.

影像顯示裝置可舉例如:液晶顯示裝置、電致發光(EL)顯示器、電漿顯示器(PD)、場發射顯示器(FED:Field Emission Display)等。該等影像顯示裝置可用於家電用途、車載用途、公共資訊顯示器(PID)用途等,尤其理想的是用於車載用途。 Image display devices include, for example, liquid crystal display devices, electroluminescent (EL) displays, plasma displays (PD), field emission displays (FED), etc. Such image display devices can be used for home appliances, in-vehicle applications, public information displays (PID), etc., and are particularly ideal for in-vehicle applications.

實施例 Implementation example

以下,利用實施例,更詳細說明本發明。本發明並不限於以下所示實施例。另,以下,未特別事先聲明時,「%」是表示「重量%」,「份」是表示「重量份」,「厚度」則表示「物理膜厚」。未特別事先聲明時,室內之溫度及濕度為23℃、65%RH。 The present invention is described in more detail below using examples. The present invention is not limited to the examples shown below. In addition, below, unless otherwise stated, "%" means "weight %", "parts" means "weight parts", and "thickness" means "physical film thickness". Unless otherwise stated, the indoor temperature and humidity are 23°C and 65%RH.

(丙烯酸系聚合物(A1)) (Acrylic polymer (A1))

於具備攪拌槳葉、溫度計、氮氣導入管、冷卻器的四口燒瓶中,注入含丙烯酸丁酯(BA)100重量份、丙烯酸4-羥丁酯(HBA)0.075重量份、丙烯酸(AA)5重量份之單體混合物。再者,相對於單體混合物100重量份,與乙酸乙酯100份一同注入2,2’-偶氮雙異丁腈(AIBN)0.1重量份作為聚合引發劑,一邊緩慢地攪拌,一邊導入氮氣以進行氮取代後,將燒瓶內的液溫保持在55℃左右,進行6小時聚合反應。藉此,調製出重量平均分子量240萬、Mw/Mn=4.5的丙烯酸系聚合物(A1)之溶液。 In a four-necked flask equipped with a stirring blade, a thermometer, a nitrogen inlet tube, and a cooler, a monomer mixture containing 100 parts by weight of butyl acrylate (BA), 0.075 parts by weight of 4-hydroxybutyl acrylate (HBA), and 5 parts by weight of acrylic acid (AA) was injected. Furthermore, 0.1 parts by weight of 2,2'-azobisisobutyronitrile (AIBN) was injected as a polymerization initiator together with 100 parts by weight of ethyl acetate relative to 100 parts by weight of the monomer mixture, and nitrogen was introduced while slowly stirring to replace the nitrogen. The liquid temperature in the flask was maintained at about 55°C, and the polymerization reaction was carried out for 6 hours. In this way, a solution of an acrylic polymer (A1) with a weight average molecular weight of 2.4 million and Mw/Mn=4.5 was prepared.

(丙烯酸系聚合物(A2)) (Acrylic polymer (A2))

除了如表1來變更使用的單體外,藉由與丙烯酸系聚合物(A1)相同之方法,分別調製出丙烯酸系聚合物(A2)之溶液。 Except for changing the monomers used as shown in Table 1, the solutions of acrylic polymer (A2) were prepared in the same manner as acrylic polymer (A1).

(丙烯酸系低聚物(B1)) (Acrylic oligomer (B1))

於具備攪拌槳葉、溫度計、氮氣導入管、冷卻器的四口燒瓶中,注入丙烯酸丁酯(BA)85重量份、丙烯酸(AA)15重量份、作為聚合引發劑的2,2’-偶氮雙異丁腈 0.1重量份、甲苯100重量份及α-硫甘油3.5重量份,一邊緩慢地攪拌,一邊導入氮氣以充分進行氮取代後,將燒瓶內的液溫保持在60℃左右,進行4小時聚合反應,調製出丙烯酸系低聚物(B1)之溶液。丙烯酸系低聚物(B1)之重量平均分子量為6700。 In a four-necked flask equipped with a stirring blade, a thermometer, a nitrogen inlet tube, and a cooler, 85 parts by weight of butyl acrylate (BA), 15 parts by weight of acrylic acid (AA), 0.1 parts by weight of 2,2'-azobisisobutyronitrile as a polymerization initiator, 100 parts by weight of toluene, and 3.5 parts by weight of α-thioglycerol were injected. While slowly stirring, nitrogen was introduced to fully replace the nitrogen. The liquid temperature in the flask was maintained at about 60°C, and the polymerization reaction was carried out for 4 hours to prepare a solution of acrylic oligomer (B1). The weight average molecular weight of acrylic oligomer (B1) is 6700.

(丙烯酸系低聚物(B2)) (Acrylic oligomer (B2))

除了如表1來變更使用的單體外,藉由與丙烯酸系低聚物(B1)相同之方法,調製出丙烯酸系低聚物(B2)。 Except for changing the monomers used as shown in Table 1, the acrylic oligomer (B2) was prepared by the same method as the acrylic oligomer (B1).

Figure 110122774-A0305-12-0044-9
Figure 110122774-A0305-12-0044-9

表1中的簡稱如下述。 The abbreviations in Table 1 are as follows.

BA:丙烯酸正丁酯 BA: n-butyl acrylate

HBA:丙烯酸4-羥丁酯 HBA: 4-Hydroxybutyl acrylate

AA:丙烯酸 AA: Acrylic acid

PEA:丙烯酸苯氧基乙酯 PEA: Phenoxyethyl acrylate

NVP:N-乙烯基-2-吡咯啶酮 NVP: N-vinyl-2-pyrrolidone

MEA:丙烯酸2-甲氧基乙酯 MEA: 2-methoxyethyl acrylate

(化合物(C1)) (Compound (C1))

根據日本特開2013-129809號公報之實施例1中記載的方法,製作出化合物(C1)。化合物(C1)為有機聚矽氧烷化合物,並含有上述矽氧烷單元(U1)及(U2)。矽氧烷單元(U1)中,X為丙基琥珀酸酐基,R4為甲基。矽氧烷單元(U2)中,2個R4皆為甲氧基。化合物(C1)中矽氧烷單元(U1)之含有率為27mol%。化合物(C1)中矽氧烷單元(U2)之含有率為73mol%。化合物(C1)之重量平均分子量為1000左右。 According to the method described in Example 1 of Japanese Patent Publication No. 2013-129809, compound (C1) was prepared. Compound (C1) is an organic polysiloxane compound and contains the above-mentioned siloxane units (U1) and (U2). In the siloxane unit (U1), X is a propyl succinic anhydride group and R4 is a methyl group. In the siloxane unit (U2), both R4 are methoxy groups. The content of siloxane unit (U1) in compound (C1) is 27 mol%. The content of siloxane unit (U2) in compound (C1) is 73 mol%. The weight average molecular weight of compound (C1) is about 1000.

(偏光薄膜) (Polarizing film)

[附HC之TAC薄膜] [TAC film with HC]

首先,準備以胺甲酸乙酯丙烯酸酯作為主成分的紫外線硬化型樹脂單體或低聚物已溶解於乙酸丁酯中的樹脂溶液(DIC公司製,商品名:UNIDIC17-806,固體成分濃度:80%)。接著,相對於該樹脂溶液之固體成分100份,於樹脂溶液中添加光聚合引發劑(巴斯夫(BASF)公司製,商品名:IRGACURE907)5份及調平劑(DIC公司製,商品名:GRANDIC PC4100)0.1份。其次,於該溶液中以45:55之比率加入環戊酮與丙二醇單甲基醚,使得所製得溶液之固體成分濃度達36%,藉此製作出用以形成硬塗層的材料。接著,將該材料塗佈於TAC薄膜(富士軟片(FUJIFILM)公司製之TJ40UL,原料:三醋酸纖維素系聚合物,厚度:40μm)上,使得硬化後硬塗層之厚度達7μm而形成塗膜。然後,於90℃下將塗膜乾燥1分鐘,再利用高壓水銀燈,對塗膜照射積算光量300mJ/cm2之紫外線,藉此使塗膜硬化,並形成硬塗層(HC)。藉此,製作出附HC之TAC薄膜。 First, a resin solution (DIC, trade name: UNIDIC17-806, solid content concentration: 80%) in which a UV-curable resin monomer or oligomer having urethane acrylate as the main component is dissolved in butyl acetate is prepared. Then, 5 parts of a photopolymerization initiator (BASF, trade name: IRGACURE907) and 0.1 parts of a leveling agent (DIC, trade name: GRANDIC PC4100) are added to the resin solution relative to 100 parts of the solid content of the resin solution. Next, cyclopentanone and propylene glycol monomethyl ether are added to the solution at a ratio of 45:55 so that the solid content concentration of the obtained solution reaches 36%, thereby preparing a material for forming a hard coating layer. Next, the material was coated on a TAC film (TJ40UL manufactured by FUJIFILM Corporation, raw material: cellulose triacetate polymer, thickness: 40μm) so that the thickness of the hard coating layer after curing reached 7μm to form a coating. Then, the coating was dried at 90°C for 1 minute, and then a high-pressure mercury lamp was used to irradiate the coating with ultraviolet light with an integrated light intensity of 300mJ/ cm2 , thereby curing the coating and forming a hard coating layer (HC). In this way, a TAC film with HC was produced.

[丙烯酸薄膜] [Acrylic film]

於具備攪拌裝置、溫度感測器、冷卻管、氮導入管的容量30L之釜型反應器中,注入8,000g之甲基丙烯酸甲酯(MMA)、2,000g之2-(羥甲基)丙烯酸甲酯(MHMA)、10,000g之4-甲-2-戊酮(甲基異丁基酮,MIBK)、5g之正十二硫醇,使其通氮並且升溫至105℃。在開始回流時,添加5.0g之過氧異丙基碳酸三級丁酯(KAYAKARUBON BIC-7,化藥艾克索(KAYAKU AKZO)公司製)作為聚合引發 劑,同時花費4小時滴定由10.0g之過氧異丙基碳酸三級丁酯與230g之MIBK構成的溶液,並且在回流下,於約105~120℃下進行溶液聚合,再花費4小時進行熟成。 Into a 30L autoclave reactor equipped with a stirring device, a temperature sensor, a cooling tube, and a nitrogen inlet tube, 8,000g of methyl methacrylate (MMA), 2,000g of methyl 2-(hydroxymethyl)acrylate (MHMA), 10,000g of 4-methyl-2-pentanone (methyl isobutyl ketone, MIBK), and 5g of n-dodecyl mercaptan were injected, nitrogen was passed through the reactor, and the temperature was raised to 105°C. At the beginning of reflux, 5.0 g of tertiary butyl peroxyisopropyl carbonate (KAYAKARUBON BIC-7, manufactured by KAYAKU AKZO) was added as a polymerization initiator. At the same time, a solution consisting of 10.0 g of tertiary butyl peroxyisopropyl carbonate and 230 g of MIBK was titrated for 4 hours, and solution polymerization was carried out at about 105-120°C under reflux, and then matured for another 4 hours.

於所製得聚合物溶液中加入30g之磷酸十八酯/磷酸二(十八基)酯混合物(PhoslexA-18,堺化學工業製),在回流下,於約90~120℃下進行5小時環化縮合反應。接著,將所製得聚合物溶液,以在樹脂量換算下為2.0kg/h之處理速度導入料筒溫度260℃、旋轉數100rpm、減壓度13.3~400hPa(10~300mmHg)、後通氣孔數1個、前通氣孔數4個的通氣孔式雙螺桿擠出機(φ=29.75mm、L/D=30)。於該擠出機內,與進一步的環化縮合反應一同進行去揮發。藉此,製得含內酯環之聚合物之透明丸粒。 30 g of octadecyl phosphate/dioctadecyl phosphate mixture (Phoslex A-18, manufactured by Sakai Chemical Industry) was added to the obtained polymer solution, and a cyclocondensation reaction was carried out at about 90-120°C for 5 hours under reflux. Then, the obtained polymer solution was introduced into a vented twin screw extruder (φ=29.75 mm, L/D=30) with a barrel temperature of 260°C, a rotation speed of 100 rpm, a reduced pressure of 13.3-400 hPa (10-300 mmHg), 1 rear vent hole, and 4 front vent holes at a processing speed of 2.0 kg/h in terms of resin amount. Devolatilization was carried out in the extruder together with the further cyclocondensation reaction. In this way, transparent pellets of polymers containing lactone rings are obtained.

針對所製得含內酯環之聚合物進行動態TG之測定時,檢測出0.17質量%之質量減損。該含內酯環之聚合物之重量平均分子量為133,000,熔體流動速率為6.5g/10min,玻璃轉移溫度為131℃。 When the obtained lactone ring-containing polymer was subjected to dynamic TG measurement, a mass loss of 0.17 mass % was detected. The weight average molecular weight of the lactone ring-containing polymer was 133,000, the melt flow rate was 6.5 g/10 min, and the glass transition temperature was 131°C.

使用單軸擠出機(螺桿30mm φ),將所製得丸粒與丙烯腈-苯乙烯(AS)樹脂(TOYO ASAS20,東洋苯乙烯公司製)以質量比90/10進行混練擠出,藉此製得透明丸粒。所製得丸粒之玻璃轉移溫度為127℃。 The pellets were mixed and extruded with acrylonitrile-styrene (AS) resin (TOYO ASAS20, manufactured by Toyo Styrene Co., Ltd.) at a mass ratio of 90/10 using a single-screw extruder (screw 30 mm φ) to produce transparent pellets. The glass transition temperature of the pellets was 127°C.

使用50mm φ單軸擠出機,將該丸粒從寬度400mm之衣架型T型模具熔融擠出,藉此製作出厚度120μm之薄膜。針對所製得薄膜,使用雙軸延伸裝置,於150℃之溫度條件下延伸成長2.0倍及寬2.0倍,藉此製得厚度30μm之延伸薄膜(丙烯酸薄膜)。測定該延伸薄膜之光學特性時,全光線透射率為93%,面內相位差△nd為0.8nm,厚度方向相位差Rth為1.5nm。 The pellets were melt-extruded from a 400mm wide coat hanger T-die using a 50mm φ single-axis extruder to produce a 120μm thick film. The film was stretched 2.0 times in length and 2.0 times in width at 150°C using a double-axis stretching device to produce a 30μm thick stretched film (acrylic film). When the optical properties of the stretched film were measured, the total light transmittance was 93%, the in-plane phase difference △nd was 0.8nm, and the thickness direction phase difference Rth was 1.5nm.

其次,利用以下方法,製作出偏光薄膜。首先,於速度比相互不同的複數個輥間,將厚度45μm之聚乙烯醇薄膜於濃度0.3%之碘溶液(溫度30℃)中染色1分鐘,並延伸成延伸倍率達3倍。接著,將所製得延伸薄膜浸漬於硼酸濃 度4%、碘化鉀濃度10%之水溶液(溫度60℃)中0.5分鐘,並延伸成總延伸倍率達6倍。然後,藉由將延伸薄膜浸漬於含有濃度1.5%之碘化鉀的水溶液(溫度30℃)中10秒鐘而進行洗淨。隨後令延伸薄膜於50℃下乾燥4分鐘,藉此製得厚度18μm之偏光件。於所製得偏光件之一主面上,透過聚乙烯醇系接著劑貼合經皂化處理的上述附HC之TAC薄膜。此時,三醋酸纖維素薄膜會位於比硬塗層更靠近偏光件側。於偏光件之另一主面上,透過聚乙烯醇系接著劑貼合上述丙烯酸薄膜。藉此,製得偏光薄膜。 Next, a polarizing film was produced using the following method. First, a polyvinyl alcohol film with a thickness of 45 μm was dyed in a 0.3% iodine solution (temperature 30°C) for 1 minute between multiple rollers with different speed ratios, and stretched to a stretching ratio of 3 times. Then, the stretched film was immersed in an aqueous solution of 4% boric acid and 10% potassium iodide (temperature 60°C) for 0.5 minutes, and stretched to a total stretching ratio of 6 times. Then, the stretched film was washed by immersing it in an aqueous solution containing 1.5% potassium iodide (temperature 30°C) for 10 seconds. The stretched film was then dried at 50°C for 4 minutes, thereby producing a polarizing element with a thickness of 18 μm. On one main surface of the polarizer, the saponified HC-attached TAC film is bonded via a polyvinyl alcohol adhesive. At this time, the cellulose triacetate film is located closer to the polarizer side than the hard coating layer. On the other main surface of the polarizer, the acrylic film is bonded via a polyvinyl alcohol adhesive. In this way, a polarizing film is obtained.

(實施例1) (Implementation Example 1)

相對於丙烯酸系聚合物(A1)之溶液之固體成分100份,摻合化合物(C1)0.4份、聚醚化合物(D)(鐘化(KANEKA)公司製之SILYL SAT10)0.4份、雙(三氟甲磺醯基)醯亞胺鋰0.5份、異氰酸酯交聯劑(東曹(TOSOH)公司製之Coronate L,三羥甲基丙烷二異氰酸甲苯酯)1份及過氧化苯甲醯(日本油脂公司製之NYPER BMT)0.2份,調製出丙烯酸系黏著劑組成物之溶液。SILYL SAT10為上述式(13)所示化合物,A1為-CH2CH(CH3)-,A2為-C3H6-,Z1為-C3H6-Z0,反應性矽基(Z0-)為二甲氧基甲基矽基。SILYL SAT10之數量平均分子量為5000。 To 100 parts of the solid content of the solution of the acrylic polymer (A1), 0.4 parts of the blending compound (C1), 0.4 parts of the polyether compound (D) (SILYL SAT10 manufactured by Kaneka Corporation), 0.5 parts of lithium bis(trifluoromethanesulfonyl)imide, 1 part of an isocyanate crosslinking agent (Coronate L manufactured by Tosoh Corporation, trihydroxymethylpropane diisocyanate toluene) and 0.2 parts of benzoyl peroxide (NYPER BMT manufactured by NOF Corporation) were added to prepare a solution of an acrylic adhesive composition. SILYL SAT10 is a compound represented by the above formula (13), wherein A1 is -CH2CH ( CH3 )-, A2 is -C3H6- , Z1 is -C3H6 - Z0 , and the reactive silyl group ( Z0- ) is dimethoxymethylsilyl. The number average molecular weight of SILYL SAT10 is 5000.

接著,於已藉由聚矽氧系剝離劑進行處理的聚對苯二甲酸乙二酯薄膜(分離薄膜:三菱化學聚酯薄膜公司製,MRF38)之單面上,將所製得丙烯酸系黏著劑組成物之溶液塗佈成乾燥後黏著劑層之厚度達20μm。針對塗佈膜,於155℃下進行1分鐘乾燥,藉此於分離薄膜之表面形成黏著劑層。接著,將已形成於分離薄膜上的黏著劑層轉印至偏光薄膜之丙烯酸薄膜側,藉此製作出實施例1之附黏著劑層之偏光薄膜。 Next, the prepared acrylic adhesive composition solution was applied to one side of a polyethylene terephthalate film (separation film: manufactured by Mitsubishi Chemical Polyester Film Co., Ltd., MRF38) treated with a silicone release agent until the adhesive layer had a thickness of 20 μm after drying. The coated film was dried at 155°C for 1 minute to form an adhesive layer on the surface of the separation film. Next, the adhesive layer formed on the separation film was transferred to the acrylic film side of the polarizing film to produce the polarizing film with an adhesive layer of Example 1.

(實施例2~12、比較例1~3) (Examples 2 to 12, Comparative Examples 1 to 3)

除了如表2所示來變更丙烯酸系黏著劑組成物之組成外,藉由與實施例1相同的方法,製作出實施例2~12、比較例1~3之附黏著劑層之偏光薄膜。 Except for changing the composition of the acrylic adhesive composition as shown in Table 2, the polarizing films with adhesive layers of Examples 2 to 12 and Comparative Examples 1 to 3 were prepared by the same method as Example 1.

[評價] [Evaluation]

<丙烯酸系聚合物及丙烯酸系低聚物之重量平均分子量(Mw)> <Weight average molecular weight (Mw) of acrylic polymers and acrylic oligomers>

所製得丙烯酸系聚合物及丙烯酸系低聚物之重量平均分子量(Mw)是利用GPC(凝膠滲透層析術)來測定。 The weight average molecular weight (Mw) of the prepared acrylic polymer and acrylic oligomer was measured by GPC (gel permeation chromatography).

.分析裝置:東曹(TOSOH)公司製,HLC-8120GPC .Analysis device: HLC-8120GPC manufactured by TOSOH Corporation

.管柱:東曹(TOSOH)公司製,G7000HXL+GMHXL+GMHXL . Column: Made by Tosoh, G7000H XL +GMH XL +GMH XL

.管柱尺寸:各7.8mm φ×30cm 計90cm .Column size: 7.8mm φ×30cm each, 90cm in total

.管柱溫度:40℃ .Column temperature: 40℃

.流量:0.8ml/min .Flow rate: 0.8ml/min

.注入量:100μl .Injection volume: 100μl

.溶析液:四氫呋喃 . Solvent: Tetrahydrofuran

.檢測器:示差折射計(RI) .Detector: Differential Refractometer (RI)

.標準試料:聚苯乙烯 . Standard sample: polystyrene

<接著力> <Continue>

所製得黏著劑層之接著力P0、P85及P105是利用上述試驗1~3來實施。附ITO層之玻璃是藉由於厚度7mm之無鹼玻璃(康寧(CORNING)公司製,商品名「EG-XG」)上形成ITO層來製作。ITO層則利用濺鍍法來製作。ITO層中,Sn原子重量相對於Sn原子重量與In原子重量之合計值之比率(Sn比率)為3wt%。針對ITO層,使用原子力顯微鏡(AFM,布魯克(Bruker)製,Dimension3100+NanoscopeV),於下述測定條件下分析其表面。其結果,ITO層之平均表面粗糙度Ra為0.2nm,均方根粗糙度Rq為0.3nm,最大高度Rmax為2.6nm。自ITO層剝下試驗片的操作是使用拉伸試驗機(Autograph SHIMAZU AG-1 10KN)來進行。 The adhesion of the adhesive layer obtained is P 0 , P 85 and P 105 , which are implemented by the above-mentioned tests 1 to 3. The glass with ITO layer is produced by forming an ITO layer on an alkali-free glass with a thickness of 7 mm (manufactured by Corning, trade name "EG-XG"). The ITO layer is produced by sputtering. In the ITO layer, the ratio of the weight of Sn atoms to the total weight of Sn atoms and In atoms (Sn ratio) is 3 wt%. The surface of the ITO layer is analyzed under the following measurement conditions using an atomic force microscope (AFM, manufactured by Bruker, Dimension 3100+Nanoscope V). As a result, the average surface roughness Ra of the ITO layer was 0.2 nm, the root mean square roughness Rq was 0.3 nm, and the maximum height Rmax was 2.6 nm. The operation of peeling the test piece from the ITO layer was performed using a tensile testing machine (Autograph SHIMAZU AG-1 10KN).

(AFM測定條件) (AFM measurement conditions)

.測定模式:輕敲模式 .Measurement mode: tapping mode

.懸臂:Si單晶 .Cantilever: Si single crystal

.測定區域:10μm見方 .Measurement area: 10μm square

<初始重工性> <Initial reworkability>

使用於測定接著力時所使用的附ITO層之玻璃,利用以下方法,進行重工試驗。首先,將附黏著劑層之偏光薄膜切出長230mm×寬120mm之薄長方形狀作成試驗片。接著,利用黏著劑層,將試驗片貼合於附ITO層之玻璃的ITO層表面。試驗片於ITO層上的貼合是使用積層機來進行。在已貼合試驗片後,收納於50℃及5氣壓(絕對壓力)之高壓釜內15分鐘,使ITO層與黏著劑層之接合均質化,並且使黏著劑層密著於ITO層。接著,用人手從附ITO層之玻璃剝離試驗片。依上述順序反覆實施重工試驗3次,並利用下述基準,評價黏著劑層之初始重工性。 The glass with ITO layer used for measuring adhesion strength is subjected to a rework test using the following method. First, a thin rectangular shape of 230mm long and 120mm wide is cut from the polarizing film with adhesive layer to make a test piece. Then, the test piece is bonded to the surface of the ITO layer of the glass with ITO layer using the adhesive layer. The bonding of the test piece to the ITO layer is performed using a lamination machine. After the test piece has been bonded, it is placed in an autoclave at 50°C and 5 atmospheres (absolute pressure) for 15 minutes to homogenize the bond between the ITO layer and the adhesive layer and to allow the adhesive layer to adhere closely to the ITO layer. Then, the test piece is peeled off from the glass with ITO layer by hand. Repeat the rework test 3 times in the above sequence, and use the following criteria to evaluate the initial reworkability of the adhesive layer.

(評價基準) (Evaluation criteria)

A:3片皆無糊劑殘留或薄膜斷裂,可以良好地剝離。 A: All three tablets have no paste residue or film breakage and can be peeled off easily.

B:3片中的一部分因剝離使得薄膜斷裂,但可藉由再次剝離而剝下。 B: The film of one of the three pieces was broken due to peeling, but it can be peeled off by peeling again.

C:3片皆因剝離使得薄膜斷裂,但可藉由再次剝離而剝下。 C: The film of all three pieces was broken due to peeling, but it can be peeled off by peeling again.

D:3片皆有糊劑殘留、或者試著幾次剝離薄膜皆斷裂而無法剝下。 D: There is paste residue on all three pieces, or the film breaks after several attempts to peel it off and cannot be peeled off.

<預熱後之重工性> <Heavy workability after preheating>

重工試驗中,於高壓釜內使ITO層與黏著劑層之接合均質化後,於85℃之大氣壓環境氣體下進行5小時加熱處理、以及於加熱處理後將試驗片放置於室溫之環境氣體下,使試驗片之溫度降低至室溫,除此之外,藉由與上述重工性之評價相同的方法,評價黏著劑層預熱後之重工性。 In the rework test, the ITO layer and the adhesive layer were homogenized in an autoclave, and then heated for 5 hours in an atmospheric pressure environment at 85°C. After the heating treatment, the test piece was placed in an ambient air at room temperature to lower the temperature of the test piece to room temperature. In addition, the reworkability of the adhesive layer after preheating was evaluated using the same method as the above reworkability evaluation.

<耐久性> <Durability>

使用於測定接著力時所使用的附ITO層之玻璃,利用以下方法,進行耐久性試驗。首先,將附黏著劑層之偏光薄膜切出長300mm×寬220mm之薄長方形狀作成試驗片。接著,利用黏著劑層,將試驗片貼合於附ITO層之玻璃的ITO層表面。 試驗片於ITO層上的貼合是使用積層機來進行。在已貼合試驗片後,收納於50℃及0.5MPa之高壓釜內15分鐘,使ITO層與黏著劑層之接合均質化,並且使黏著劑層密著於ITO層。接著,針對試驗片,於105℃之大氣壓環境氣體下進行500小時加熱處理。用目視來觀察偏光薄膜與ITO層間的黏著劑層之外觀,並利用下述基準,評價黏著劑層之耐久性。 The glass with ITO layer used for measuring adhesion was subjected to durability test using the following method. First, the polarizing film with adhesive layer was cut into a thin rectangular shape of 300mm long and 220mm wide to make a test piece. Then, the test piece was bonded to the ITO layer surface of the glass with ITO layer using the adhesive layer. The bonding of the test piece to the ITO layer was performed using a lamination machine. After the test piece was bonded, it was placed in an autoclave at 50℃ and 0.5MPa for 15 minutes to homogenize the bonding between the ITO layer and the adhesive layer and to make the adhesive layer closely adhere to the ITO layer. Next, the test piece was heat treated for 500 hours in an atmospheric pressure environment at 105°C. The appearance of the adhesive layer between the polarizing film and the ITO layer was visually observed, and the durability of the adhesive layer was evaluated using the following criteria.

(評價基準) (Evaluation criteria)

A:完全無發泡、剝落等外觀上的變化。 A: There is absolutely no change in appearance such as foaming or peeling.

B:端部有剝落或發泡,但若非特殊用途,實用上便不成問題。 B: There is peeling or foaming at the end, but unless it is used for special purposes, it is not a practical problem.

C:端部有明顯剝落,實用上有問題。 C: There is obvious peeling at the end, which is problematic for practical use.

Figure 110122774-A0305-12-0051-10
Figure 110122774-A0305-12-0051-10

表2中的簡稱如下述。 The abbreviations in Table 2 are as follows.

A1:丙烯酸系聚合物(A1) A1: Acrylic polymer (A1)

A2:丙烯酸系聚合物(A2) A2: Acrylic polymer (A2)

B1:丙烯酸系低聚物(B1) B1: Acrylic oligomer (B1)

B2:丙烯酸系低聚物(B2) B2: Acrylic oligomer (B2)

C1:化合物(C1) C1: Compound (C1)

X-12-967C:3-三甲氧基矽基丙基琥珀酸酐(信越化學工業公司製) X-12-967C: 3-Trimethoxysilylpropyl succinic anhydride (manufactured by Shin-Etsu Chemical Co., Ltd.)

SAT10:SILYL SAT10(鐘化(KANEKA)公司製) SAT10: SILYL SAT10 (manufactured by KANEKA)

X-41-1056:含環氧基之低聚物型矽烷耦合劑(信越化學工業公司製) X-41-1056: Epoxy-containing oligomer-type silane coupling agent (manufactured by Shin-Etsu Chemical Co., Ltd.)

如由表2可知,本實施形態附黏著劑層之偏光薄膜的黏著劑層即便是在貼合於導電層上時,亦可維持預熱後之重工性,同時具有於高溫環境下的耐久性。另,化合物(C)不存在的比較例2及3中,可推斷於測定接著力P0及P85之條件下,聚醚化合物(D)的SILYL SAT10於ITO層之表面上幾乎不會偏析,另一方面,於測定接著力P105之條件下,SILYL SAT10則於ITO層之表面上偏析。依此,吾人認為比較例2及3中,接著力P105會低於接著力P85,結果,於105℃下的加熱處理後之耐久性低。 As can be seen from Table 2, the adhesive layer of the polarizing film with an adhesive layer of this embodiment can maintain the reworkability after preheating even when attached to the conductive layer, and has durability in a high temperature environment. In addition, in Comparative Examples 2 and 3 where the compound (C) does not exist, it can be inferred that under the conditions of measuring the adhesion force P 0 and P 85 , the SILYL SAT10 of the polyether compound (D) is almost not segregated on the surface of the ITO layer. On the other hand, under the conditions of measuring the adhesion force P 105 , SILYL SAT10 is segregated on the surface of the ITO layer. Based on this, it is believed that in Comparative Examples 2 and 3, the adhesion force P 105 is lower than the adhesion force P 85 , and as a result, the durability after the heat treatment at 105°C is low.

產業上之可利用性 Industrial availability

本發明之附黏著劑層之偏光薄膜可適當利用在液晶顯示裝置、電致發光(EL)顯示器、電漿顯示器(PD)、場發射顯示器(FED)等影像顯示裝置。 The polarizing film with adhesive layer of the present invention can be appropriately used in image display devices such as liquid crystal display devices, electroluminescent (EL) displays, plasma displays (PD), field emission displays (FED), etc.

1:黏著劑層 1: Adhesive layer

2:偏光薄膜 2:Polarizing film

10:附黏著劑層之偏光薄膜 10: Polarizing film with adhesive layer

Claims (18)

一種附黏著劑層之偏光薄膜,具備偏光薄膜以及由黏著劑組成物形成的黏著劑層,且前述黏著劑組成物含有基礎聚合物、具酸基或酸酐基之化合物(C)及聚醚化合物(D), 前述黏著劑組成物中,前述化合物(C)之含量相對於前述基礎聚合物100重量份,為0.4重量份以上, 針對前述黏著劑層,利用下述試驗1求得之接著力P 85在10.0N/25mm以下,且利用下述試驗2求得之接著力P 105大於10.0N/25mm: 試驗1:針對已貼合於附氧化銦錫層之玻璃之氧化銦錫層上的黏著劑層,於85℃下進行5小時加熱處理;測定在剝離速度300mm/min及剝離角度90°下用以將前述黏著劑層自前述氧化銦錫層剝下所需之力(接著力P 85); 試驗2:針對已貼合於附氧化銦錫層之玻璃之氧化銦錫層上的黏著劑層,於105℃下進行24小時加熱處理;測定在剝離速度300mm/min及剝離角度90°下用以將前述黏著劑層自前述氧化銦錫層剝下所需之力(接著力P 105)。 A polarizing film with an adhesive layer comprises a polarizing film and an adhesive layer formed of an adhesive composition, wherein the adhesive composition contains a base polymer, a compound (C) having an acid group or anhydride group, and a polyether compound (D). In the adhesive composition, the content of the compound (C) is 0.4 parts by weight or more relative to 100 parts by weight of the base polymer. For the adhesive layer, the adhesion force P 85 obtained by the following test 1 is less than 10.0 N/25 mm, and the adhesion force P 105 obtained by the following test 2 is greater than 10.0 N/25 mm: Test 1: The adhesive layer on the indium tin layer attached to the indium tin layer was heat treated at 85°C for 5 hours; the force required to peel the adhesive layer from the indium tin layer at a peeling speed of 300 mm/min and a peeling angle of 90° was measured (bonding force P 85 ); Test 2: The adhesive layer on the indium tin layer bonded to the indium tin layer was heat treated at 105°C for 24 hours; the force required to peel the adhesive layer from the indium tin layer at a peeling speed of 300 mm/min and a peeling angle of 90° was measured (bonding force P 105 ). 如請求項1之附黏著劑層之偏光薄膜,其中針對前述黏著劑層,利用下述試驗3求得之接著力P 0在10.0N/25mm以下: 試驗3:在剝離速度300mm/min及剝離角度90°下,將已貼合於附氧化銦錫層之玻璃之氧化銦錫層上的黏著劑層自前述氧化銦錫層剝下;測定此時所需之力(接著力P 0)。 A polarizing film with an adhesive layer as claimed in claim 1, wherein the adhesion force P0 of the adhesive layer is less than 10.0 N/25 mm as determined by the following test 3: Test 3: At a peeling speed of 300 mm/min and a peeling angle of 90°, the adhesive layer on the indium oxide tin layer adhered to the glass with an indium oxide tin layer is peeled off from the indium oxide tin layer; the force required at this time (adhesion force P0 ) is measured. 如請求項1或2之附黏著劑層之偏光薄膜,其中前述化合物(C)之重量平均分子量及前述聚醚化合物(D)之數量平均分子量分別在10000以下。In the polarizing film with an adhesive layer as claimed in claim 1 or 2, the weight average molecular weight of the compound (C) and the number average molecular weight of the polyether compound (D) are both less than 10,000. 如請求項1或2之附黏著劑層之偏光薄膜,其中前述酸酐基為羧酸酐基。The polarizing film with an adhesive layer as claimed in claim 1 or 2, wherein the acid anhydride group is a carboxylic acid anhydride group. 如請求項1或2之附黏著劑層之偏光薄膜,其中前述化合物(C)更具有矽原子以及與前述矽原子鍵結的水解性基。The polarizing film with an adhesive layer as claimed in claim 1 or 2, wherein the compound (C) further comprises a silicon atom and a hydrolyzable group bonded to the silicon atom. 如請求項5之附黏著劑層之偏光薄膜,其中前述化合物(C)中前述水解性基之含有率在10wt%以上。In the polarizing film with an adhesive layer as claimed in claim 5, the content of the hydrolyzable group in the compound (C) is greater than 10 wt %. 如請求項1或2之附黏著劑層之偏光薄膜,其中前述化合物(C)具有矽氧烷鍵。The polarizing film with an adhesive layer as claimed in claim 1 or 2, wherein the compound (C) has a siloxane bond. 如請求項1或2之附黏著劑層之偏光薄膜,其中前述聚醚化合物(D)更具有矽原子以及與前述矽原子鍵結的水解性基。The polarizing film with an adhesive layer as claimed in claim 1 or 2, wherein the polyether compound (D) further has a silicon atom and a hydrolyzable group bonded to the silicon atom. 如請求項8之附黏著劑層之偏光薄膜,其中前述聚醚化合物(D)中前述水解性基之含有率在14wt%以下。The polarizing film with an adhesive layer as claimed in claim 8, wherein the content of the hydrolyzable group in the polyether compound (D) is less than 14 wt %. 如請求項1或2之附黏著劑層之偏光薄膜,其中前述黏著劑組成物含有(甲基)丙烯酸系聚合物(A)作為前述基礎聚合物。The polarizing film with an adhesive layer as claimed in claim 1 or 2, wherein the adhesive composition contains a (meth)acrylic polymer (A) as the base polymer. 如請求項10之附黏著劑層之偏光薄膜,其中前述(甲基)丙烯酸系聚合物(A)具有酸基。The polarizing film with an adhesive layer as claimed in claim 10, wherein the (meth)acrylic polymer (A) has an acid group. 一種影像顯示面板,具備: 如請求項1至11中任一項之附黏著劑層之偏光薄膜; 含金屬氧化物之導電層;及 透明基板; 前述黏著劑層與前述導電層直接相接。 An image display panel comprising: A polarizing film with an adhesive layer as in any one of claims 1 to 11; A conductive layer containing a metal oxide; and A transparent substrate; The adhesive layer is directly connected to the conductive layer. 如請求項12之影像顯示面板,其中前述金屬氧化物含有氧化銦錫。An image display panel as claimed in claim 12, wherein the metal oxide contains indium tin oxide. 如請求項12或13之影像顯示面板,其中前述黏著劑層具有: 第1層,其含有前述化合物(C)或其反應物;及 第2層,其含有前述聚醚化合物(D)或其反應物; 前述導電層、前述第1層及前述第2層於積層方向上依序排列。 The image display panel of claim 12 or 13, wherein the adhesive layer comprises: A first layer containing the compound (C) or its reactant; and A second layer containing the polyether compound (D) or its reactant; The conductive layer, the first layer and the second layer are arranged in sequence in the stacking direction. 如請求項14之影像顯示面板,其中前述黏著劑層更具有第3層,該第3層含有(甲基)丙烯酸系聚合物(A)或其反應物,且前述第3層位於前述第2層與前述偏光薄膜間。As for the image display panel of claim 14, the adhesive layer further has a third layer, the third layer contains a (meth)acrylic polymer (A) or its reactant, and the third layer is located between the second layer and the polarizing film. 一種影像顯示面板之製造方法,係製造如請求項12至15中任一項之影像顯示面板之方法,包括: 在已將前述附黏著劑層之偏光薄膜貼合於前述導電層之狀態下,針對前述黏著劑層,於70℃~95℃下進行第1加熱處理。 A method for manufacturing an image display panel is a method for manufacturing an image display panel as in any one of claims 12 to 15, comprising: After the polarizing film with the adhesive layer is attached to the conductive layer, the adhesive layer is subjected to a first heating treatment at 70°C to 95°C. 如請求項16之影像顯示面板之製造方法,其更包括:於前述第1加熱處理後,針對前述黏著劑層,於高於95℃之溫度下進行第2加熱處理。The manufacturing method of the image display panel of claim 16 further comprises: after the first heat treatment, performing a second heat treatment on the adhesive layer at a temperature higher than 95°C. 一種黏著劑層,係由黏著劑組成物所形成,且前述黏著劑組成物含有基礎聚合物、具酸基或酸酐基之化合物(C)及聚醚化合物(D), 前述黏著劑組成物中,前述化合物(C)之含量相對於前述基礎聚合物100重量份,為0.4重量份以上, 利用下述試驗1求得之接著力P 85在10.0N/25mm以下,且利用下述試驗2求得之接著力P 105大於10.0N/25mm: 試驗1:針對已貼合於附氧化銦錫層之玻璃之氧化銦錫層上的黏著劑層,於85℃下進行5小時加熱處理;測定在剝離速度300mm/min及剝離角度90°下用以將前述黏著劑層自前述氧化銦錫層剝下所需之力(接著力P 85); 試驗2:針對已貼合於附氧化銦錫層之玻璃之氧化銦錫層上的黏著劑層,於105℃下進行24小時加熱處理;測定在剝離速度300mm/min及剝離角度90°下用以將前述黏著劑層自前述氧化銦錫層剝下所需之力(接著力P 105)。An adhesive layer is formed by an adhesive composition, wherein the adhesive composition contains a base polymer, a compound (C) having an acid group or anhydride group, and a polyether compound (D). In the adhesive composition, the content of the compound (C) is 0.4 parts by weight or more relative to 100 parts by weight of the base polymer. The adhesion force P 85 obtained by the following test 1 is less than 10.0 N/25 mm, and the adhesion force P 105 obtained by the following test 2 is greater than 10.0 N/25 mm: Test 1: The adhesive layer on the indium tin layer attached to the indium tin layer was heat treated at 85°C for 5 hours; the force required to peel the adhesive layer from the indium tin layer at a peeling speed of 300 mm/min and a peeling angle of 90° was measured (bonding force P 85 ); Test 2: The adhesive layer on the indium tin layer bonded to the indium tin layer was heat treated at 105°C for 24 hours; the force required to peel the adhesive layer from the indium tin layer at a peeling speed of 300 mm/min and a peeling angle of 90° was measured (bonding force P 105 ).
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