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TWI874015B - Package structure and manufacturing method thereof - Google Patents

Package structure and manufacturing method thereof Download PDF

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Publication number
TWI874015B
TWI874015B TW112146501A TW112146501A TWI874015B TW I874015 B TWI874015 B TW I874015B TW 112146501 A TW112146501 A TW 112146501A TW 112146501 A TW112146501 A TW 112146501A TW I874015 B TWI874015 B TW I874015B
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pad
auxiliary
die
substrate
welding
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TW112146501A
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Chinese (zh)
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TW202524701A (en
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梁遠廷
劉忠武
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大陸商榮諭科技(成都)有限公司
榮創能源科技股份有限公司
榮諭科技股份有限公司
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Priority to TW112146501A priority Critical patent/TWI874015B/en
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Abstract

A package structure comprises a die, a substrate and a first soldering section, the die has a first soldering pad provided thereon, the substrate has a second soldering pad provided thereon, and the first soldering section is connected between the first soldering pad and the second soldering pad. The die further comprises a first auxiliary soldering pad provided thereon, the substrate further comprises a second auxiliary soldering pad provided thereon, and the package structure further comprises a second soldering section which is connected between the first auxiliary soldering pad and the second auxiliary soldering pad. The first auxiliary soldering pad is located at a first pre-set position on the die, where the distance between the first pre-set position and the center of gravity of the die is the longest compared to other positions on the die other than the first pre-set position. The present package structure improves self-alignment between the die and the substrate, thus the packaging accuracy of the die and the substrate can be improved. The present invention also discloses a manufacturing method of the package structure.

Description

封裝結構及其製備方法 Packaging structure and preparation method thereof

本發明涉及電子元件封裝技術領域,具體涉及一種封裝結構及其製備方法。 The present invention relates to the field of electronic component packaging technology, and specifically to a packaging structure and a preparation method thereof.

隨著半導體業的迅速發展,封裝技術的應用範圍日益廣泛,封裝形式更趨多樣化。其中,覆晶技術(Flip-Chip),也稱“倒晶封裝”或“倒晶封裝法”,其既是一種晶片互連技術,也是一種較為理想的晶片粘接技術。 With the rapid development of the semiconductor industry, the application scope of packaging technology is becoming increasingly wide, and the packaging forms are becoming more diverse. Among them, flip-chip technology, also known as "flip chip packaging" or "flip chip packaging method", is both a chip interconnection technology and a more ideal chip bonding technology.

在對基板與晶粒進行連接時,先前技术通常是先將錫膏塗在基板與晶粒的焊盤上,然後藉由回流焊的方式加熱錫膏,使錫膏熔化並在固化後連接基板與晶粒。然而,此種連接方式晶粒相對於基板的偏移量較小,無法滿足一些場景中晶粒高精准度封裝的要求。 When connecting the substrate and the die, the previous technology usually first applies solder paste to the pads of the substrate and the die, and then heats the solder paste by reflow soldering to melt the solder paste and connect the substrate and the die after solidification. However, this connection method has a small offset of the die relative to the substrate, which cannot meet the requirements of high-precision die packaging in some scenarios.

鑒於以上內容,有必要提出一種封裝結構及其製備方法,以提高晶粒與基板的封裝精度。 In view of the above, it is necessary to propose a packaging structure and its preparation method to improve the packaging accuracy of the die and substrate.

第一方面,本發明實施例提供一種封裝結構,包括晶粒、基板及第一焊接部,所述晶粒上設有第一焊盤,所述基板上設有與所述第一焊盤對應的第二焊盤,所述第一焊接部連接於所述第一焊盤與所述第二焊盤之間,所述晶粒 上還設有與所述第一焊盤間隔設置的第一輔助焊盤,所述基板上還設有與所述第二焊盤間隔設置的第二輔助焊盤,所述封裝結構還包括第二焊接部,所述第二輔助焊盤與所述第一輔助焊盤對應設置,所述第二焊接部連接於所述第一輔助焊盤與所述第二輔助焊盤之間;所述第一輔助焊盤設於所述晶粒上的第一預設位置,與所述晶粒上除了所述第一預設位置外的其他位置相比,所述第一預設位置與所述晶粒的重心之間的距離最長。 In a first aspect, an embodiment of the present invention provides a packaging structure, including a die, a substrate, and a first welding portion, wherein the die is provided with a first welding pad, the substrate is provided with a second welding pad corresponding to the first welding pad, the first welding portion is connected between the first welding pad and the second welding pad, the die is further provided with a first auxiliary welding pad spaced apart from the first welding pad, the substrate is further provided with a second auxiliary welding pad spaced apart from the second welding pad, Auxiliary pad, the package structure further includes a second welding portion, the second auxiliary pad is arranged corresponding to the first auxiliary pad, and the second welding portion is connected between the first auxiliary pad and the second auxiliary pad; the first auxiliary pad is arranged at a first preset position on the die, and compared with other positions on the die except the first preset position, the distance between the first preset position and the center of gravity of the die is the longest.

上述的封裝結構中,藉由在晶粒上設置與第一焊盤間隔設置的第一輔助焊盤,以及在基板上設置與第二焊盤間隔且與第一輔助焊盤對應的第二輔助焊盤,在藉由回流焊對基板與晶粒進行焊接時,第一輔助焊盤與第二輔助焊盤之間、以及第一焊盤與第二焊盤之間的焊料會熔化,即第一焊接部與第二焊接部會熔化,而熔化的第一焊接部與第二焊接部能夠分別作用於第一焊盤與第一輔助焊盤以帶動晶粒相對於基板轉動,直至第一焊盤對準於第二焊盤。由於第一輔助焊盤設於晶粒上的第一預設位置,且與晶粒上除了第一預設位置外的其他位置相比,第一預設位置與所述晶粒的重心之間的距離最長,故,位於第一預設位置的第一輔助焊盤能夠為晶粒相對於基板轉動提供最大的旋轉力矩,從而提高晶粒與基板之間的自對準能力,進而提高晶粒與基板的封裝精度,在一定程度上亦可擴展晶粒的封裝使用場景。 In the above-mentioned packaging structure, a first auxiliary pad is arranged on the die at a spacing with the first pad, and a second auxiliary pad is arranged on the substrate at a spacing with the second pad and corresponding to the first auxiliary pad. When the substrate and the die are soldered by reflow soldering, the solder between the first auxiliary pad and the second auxiliary pad and between the first pad and the second pad will melt, that is, the first soldering portion and the second soldering portion will melt, and the melted first soldering portion and the second soldering portion can act on the first soldering pad and the first auxiliary soldering pad respectively to drive the die to rotate relative to the substrate until the first soldering pad is aligned with the second soldering pad. Since the first auxiliary pad is located at the first preset position on the die, and compared with other positions on the die except the first preset position, the distance between the first preset position and the center of gravity of the die is the longest, the first auxiliary pad located at the first preset position can provide the maximum rotational torque for the die to rotate relative to the substrate, thereby improving the self-alignment ability between the die and the substrate, and further improving the packaging accuracy of the die and the substrate, and to a certain extent, it can also expand the packaging use scenarios of the die.

第二方面,本發明實施例還提供了一種封裝結構的製備方法,該方法包括以下步驟:蝕刻晶粒以於所述晶粒上形成第一焊盤及與所述第一焊盤間隔設置的第一輔助焊盤,其中所述第一輔助焊盤形成於所述晶粒上的第一預設位置,與所述晶粒上除了所述第一預設位置外的其他位置相比,所述第一預設位置與所述晶粒的重心之間的距離最長;蝕刻基板以於所述基板上形成第二焊盤及與所述第二焊盤間隔設置的第二輔助焊盤;塗覆焊料於所述第二焊盤及第二輔助焊盤上;將所述晶粒蓋設於所述基板,並使所述第一焊盤對位於所述第二 焊盤且貼附於所述第二焊盤上的所述焊料,以及使所述第一輔助焊盤對位於所述第二輔助焊盤且貼附於所述第二輔助焊盤上的所述焊料;加熱所述焊料以使所述第一焊盤與所述第二焊盤之間的所述焊料熔化,並使所述第一輔助焊盤與所述第二輔助焊盤之間的所述焊料熔化,熔化的所述焊料能夠作用於所述第一焊盤與所述第一輔助焊盤以帶動所述晶粒相對於所述基板轉動,直至所述第一焊盤對準於所述第二焊盤。 In a second aspect, an embodiment of the present invention further provides a method for preparing a packaging structure, the method comprising the following steps: etching a crystal grain to form a first pad and a first auxiliary pad spaced apart from the first pad on the crystal grain, wherein the first auxiliary pad is formed at a first preset position on the crystal grain, and compared with other positions on the crystal grain except the first preset position, the distance between the first preset position and the center of gravity of the crystal grain is the longest; etching a substrate to form a second pad and a second auxiliary pad spaced apart from the second pad on the substrate; coating the second pad and the second auxiliary pad with solder; The crystal grain is covered on the substrate, and the first pad is aligned with the second pad and attached to the solder on the second pad, and the first auxiliary pad is aligned with the second auxiliary pad and attached to the solder on the second auxiliary pad; the solder is heated to melt the solder between the first pad and the second pad, and the solder between the first auxiliary pad and the second auxiliary pad is melted, and the melted solder can act on the first pad and the first auxiliary pad to drive the crystal grain to rotate relative to the substrate until the first pad is aligned with the second pad.

上述的封裝結構的製備方法,先藉由蝕刻晶粒以於晶粒上形成第一焊盤及與第一焊盤間隔設置的第一輔助焊盤;然後蝕刻基板以於基板上形成第二焊盤及與第二焊盤間隔設置的第二輔助焊盤;接著塗覆焊料於第二焊盤及第二輔助焊盤上;之後將晶粒蓋設於基板,並使第一焊盤對位於第二焊盤且貼附於第二焊盤上的焊料,以及使第一輔助焊盤對位於第二輔助焊盤且貼附於第二輔助焊盤上的焊料;最後加熱焊料以使第一焊盤與第二焊盤之間的焊料熔化,並使第一輔助焊盤與第二輔助焊盤之間的焊料熔化,熔化的焊料能夠作用於第一焊盤與第一輔助焊盤以帶動晶粒相對於基板轉動,直至第一焊盤對準於第二焊盤。由於第一輔助焊盤形成於晶粒上的第一預設位置,且與晶粒上除了第一預設位置外的其他位置相比,第一預設位置與所述晶粒的重心之間的距離最長,故,位於第一預設位置的第一輔助焊盤能夠為晶粒相對於基板轉動提供最大的旋轉力矩,從而提高晶粒與基板之間的自對準能力,進而提高晶粒與基板的封裝精度,在一定程度上亦可擴展晶粒的封裝使用場景。 The method for preparing the package structure is as follows: first, a first pad and a first auxiliary pad spaced apart from the first pad are formed on the die by etching the die; then, a second pad and a second auxiliary pad spaced apart from the second pad are formed on the substrate by etching the substrate; then, solder is coated on the second pad and the second auxiliary pad; then, the die is covered on the substrate, and the first pad is aligned with the second pad and attached to the second pad. The solder on the auxiliary pad and the solder that makes the first auxiliary pad align with the second auxiliary pad and adheres to the second auxiliary pad; finally, the solder is heated to melt the solder between the first pad and the second pad, and the solder between the first auxiliary pad and the second auxiliary pad is melted, and the molten solder can act on the first pad and the first auxiliary pad to drive the die to rotate relative to the substrate until the first pad is aligned with the second pad. Since the first auxiliary pad is formed at the first preset position on the die, and compared with other positions on the die except the first preset position, the distance between the first preset position and the center of gravity of the die is the longest, the first auxiliary pad located at the first preset position can provide the maximum rotational torque for the die to rotate relative to the substrate, thereby improving the self-alignment ability between the die and the substrate, and further improving the packaging accuracy of the die and the substrate, and to a certain extent, it can also expand the packaging use scenarios of the die.

100:封裝結構 100:Packaging structure

10:晶粒 10: Grain

11:第一預設位置 11: First default position

12,22:其他位置 12, 22: Other locations

20:基板 20: Substrate

21:第二預設位置 21: Second default position

30:第一焊接部 30: First welding section

40:第二焊接部 40: Second welding section

50:第一焊盤 50: First pad

60:第一輔助焊盤 60: First auxiliary pad

70:第二焊盤 70: Second pad

80:第二輔助焊盤 80: Second auxiliary pad

O1,O2,O3,O4:重心 O 1 , O 2 , O 3 , O 4 : center of gravity

圖1係本發明一實施例提出的封裝結構的結構示意圖。 Figure 1 is a schematic diagram of the packaging structure proposed in one embodiment of the present invention.

圖2係圖1所示封裝結構沿II-II線的剖面結構示意圖。 Figure 2 is a schematic diagram of the cross-sectional structure of the package structure shown in Figure 1 along line II-II.

圖3係本發明一實施例提出的封裝結構的晶粒、第一焊盤及第一輔助焊盤的結構示意圖。 FIG3 is a schematic diagram of the structure of the die, the first pad and the first auxiliary pad of the package structure proposed in one embodiment of the present invention.

圖4係本發明另一實施例提出的封裝結構的晶粒、第一焊盤及第一輔助焊盤的結構示意圖。 FIG4 is a schematic diagram of the structure of the die, the first pad and the first auxiliary pad of the package structure proposed in another embodiment of the present invention.

圖5係本發明又一實施例提出的封裝結構的晶粒、第一焊盤及第一輔助焊盤的結構示意圖。 FIG5 is a schematic diagram of the structure of the die, the first pad and the first auxiliary pad of the package structure proposed in another embodiment of the present invention.

圖6係本發明一實施例提出的封裝結構的基板的部分結構、第二輔助焊盤及第二焊盤的結構示意圖。 FIG6 is a schematic diagram of the partial structure of the substrate, the second auxiliary pad and the second pad of the package structure proposed in one embodiment of the present invention.

圖7係本發明另一實施例提出的封裝結構的基板的部分結構、第二輔助焊盤及第二焊盤的結構示意圖。 FIG7 is a schematic diagram of the structure of a partial substrate, a second auxiliary pad, and a second pad of a package structure proposed in another embodiment of the present invention.

圖8係本發明又一實施例提出的封裝結構的基板的部分結構、第二輔助焊盤及第二焊盤的結構示意圖。 FIG8 is a schematic diagram of the structure of a partial substrate, a second auxiliary pad, and a second pad of a packaging structure proposed in another embodiment of the present invention.

圖9係本發明的一實施例提出的一種封裝結構的製備方法的流程圖。 FIG9 is a flow chart of a method for preparing a packaging structure proposed in an embodiment of the present invention.

下面詳細描述本發明的實施方式,所述實施方式的示例於附圖中示出,其中自始至終相同或類似的標號表示相同或類似的元件或具有相同或類似功能的元件。下面藉由參考附圖描述的實施方式係示例性的,僅用於解釋本發明,而不能理解為對本發明的限制。 The embodiments of the present invention are described in detail below. Examples of the embodiments are shown in the attached drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the attached drawings are exemplary and are only used to explain the present invention, and cannot be understood as limiting the present invention.

下面參照附圖,對本發明的具體實施方式作進一步的詳細描述。 The specific implementation of the present invention is further described in detail below with reference to the attached drawings.

請參見圖1與圖2,本發明實施例提出了一種封裝結構100,包括晶粒10、基板20、第一焊接部30及第二焊接部40。 Please refer to FIG. 1 and FIG. 2 , the embodiment of the present invention proposes a packaging structure 100, including a die 10, a substrate 20, a first welding portion 30 and a second welding portion 40.

晶粒10上設有第一焊盤50與第一輔助焊盤60,第一輔助焊盤60與第一焊盤50間隔設置。基板20上設有第二焊盤70與第二輔助焊盤80,第二輔助焊盤 80與第二焊盤70間隔設置,第二焊盤70與第一焊盤50對應設置,第一焊接部30連接於第一焊盤50與第二焊盤70之間,第二輔助焊盤80與第一輔助焊盤60對應設置,第二焊接部40連接於第一輔助焊盤60與第二輔助焊盤80之間。請一併參見圖3,第一輔助焊盤60設於晶粒10上的第一預設位置11,與晶粒10上除了第一預設位置11(圖中對應虛線框與晶粒10的兩個側邊圍合的區域位置)外的其他位置(例如圖3中舉例示出的其他位置12,圖中對應虛線框與晶粒10的一個側邊圍合的區域位置)的第一輔助焊盤60相比,第一預設位置11上的第一輔助焊盤60與晶粒10的重心O1之間的距離最長。可以理解,圖3中的其他位置12僅為其中一個區別於第一預設位置11的不同位置的示例,並不作本實施例中具體位置的限制,並且第一預設位置11是作為一個整體來看待,即第一預設位置11這個整體上的元件相比於晶粒10上的其他位置上設置的元件,與晶粒10的重心O1之間的距離最長。 The die 10 is provided with a first pad 50 and a first auxiliary pad 60, and the first auxiliary pad 60 is spaced apart from the first pad 50. The substrate 20 is provided with a second pad 70 and a second auxiliary pad 80, and the second auxiliary pad 80 is spaced apart from the second pad 70, and the second pad 70 is disposed corresponding to the first pad 50, the first welding portion 30 is connected between the first pad 50 and the second pad 70, the second auxiliary pad 80 is disposed corresponding to the first auxiliary pad 60, and the second welding portion 40 is connected between the first auxiliary pad 60 and the second auxiliary pad 80. Please refer to FIG. 3 , the first auxiliary pad 60 is disposed at the first preset position 11 on the die 10. Compared with the first auxiliary pad 60 at other positions on the die 10 (such as other positions 12 shown as an example in FIG. 3 , corresponding to the area enclosed by the dotted frame and one side of the die 10), except for the first preset position 11 (the area enclosed by the dotted frame and two sides of the die 10 in the figure), the distance between the first auxiliary pad 60 at the first preset position 11 and the center of gravity O1 of the die 10 is the longest. It can be understood that the other positions 12 in FIG. 3 are merely examples of positions different from the first preset position 11, and are not intended to limit the specific positions in this embodiment. Moreover, the first preset position 11 is viewed as a whole, that is, the components at the first preset position 11 as a whole are at the longest distance from the center of gravity O1 of the die 10 compared to the components arranged at other positions on the die 10.

上述的封裝結構100,藉由在晶粒10上設置與第一焊盤50間隔設置的第一輔助焊盤60,以及在基板20上設置與第二焊盤70間隔且與第一輔助焊盤60對應的第二輔助焊盤80,在藉由回流焊對基板20與晶粒10進行焊接時,第一輔助焊盤60與第二輔助焊盤80之間、以及第一焊盤50與第二焊盤70之間的焊料會熔化,即第一焊接部30與第二焊接部40會熔化,而熔化的第一焊接部30與第二焊接部40能夠分別作用於第一焊盤50與第一輔助焊盤60以帶動晶粒10相對於基板20轉動,直至第一焊盤50對準於第二焊盤70。由於第一輔助焊盤60設於晶粒10上的第一預設位置11,且與晶粒10上除了第一預設位置11外的其他位置的第一輔助焊盤60相比,第一預設位置11的第一輔助焊盤60與晶粒10的重心O1之間的距離最長,故,位於第一預設位置11的第一輔助焊盤60能夠為晶粒10相對於基板20轉動提供最大的旋轉力矩,從而提高晶粒10與基板20之間的自對準能力, 進而提高晶粒10與基板20的封裝精度,在一定程度上亦可擴展晶粒10的封裝使用場景。 The package structure 100 is provided with a first auxiliary pad 60 spaced apart from the first pad 50 on the die 10, and a second auxiliary pad 80 spaced apart from the second pad 70 and corresponding to the first auxiliary pad 60 on the substrate 20. When the substrate 20 and the die 10 are soldered by reflow soldering, the first auxiliary pad 60 and the second auxiliary pad 80 are soldered together. The solder between the first pad 50 and the second pad 70 will melt, that is, the first soldering portion 30 and the second soldering portion 40 will melt, and the melted first soldering portion 30 and the second soldering portion 40 can act on the first pad 50 and the first auxiliary pad 60 respectively to drive the die 10 to rotate relative to the substrate 20 until the first pad 50 is aligned with the second pad 70. Since the first auxiliary pad 60 is disposed at the first preset position 11 on the die 10, and compared with the first auxiliary pads 60 at other positions on the die 10 except the first preset position 11, the distance between the first auxiliary pad 60 at the first preset position 11 and the center of gravity O1 of the die 10 is the longest, the first auxiliary pad 60 located at the first preset position 11 can provide the maximum rotational torque for the die 10 to rotate relative to the substrate 20, thereby improving the self-alignment capability between the die 10 and the substrate 20, and further improving the packaging accuracy of the die 10 and the substrate 20, and to a certain extent, it can also expand the packaging use scenarios of the die 10.

晶粒10為晶圓經過減薄切割後沒有進行封裝的單顆裸晶片,例如發光二極體晶粒10。基板20的材質為環氧樹脂敷銅電路板(PCB)、聚醯亞胺(PI)敷銅電路板、柔性電路板(FPC)或聚對苯二甲酸乙二醇酯(PET)電路板。第一焊接部30與第二焊接部40均為固化後的錫、銀、銦或錫合金。例如,第一焊接部30與第二焊接部40的材質均為錫。 The die 10 is a single bare chip that has not been packaged after the wafer has been thinned and cut, such as a light-emitting diode die 10. The material of the substrate 20 is an epoxy copper-clad circuit board (PCB), a polyimide (PI) copper-clad circuit board, a flexible circuit board (FPC) or a polyethylene terephthalate (PET) circuit board. The first welding portion 30 and the second welding portion 40 are both solidified tin, silver, indium or tin alloy. For example, the material of the first welding portion 30 and the second welding portion 40 is tin.

請參見圖2與圖3,晶粒10為方形結構。第一焊盤50為複數個,例如13個,在複數個第一焊盤50中,其中一個第一焊盤50位於晶粒10的中心區域,剩餘的複數個第一焊盤50圍設於位於晶粒10的中心區域的第一焊盤50的周側,其中,位於晶粒10的中心區域的第一焊盤50的底面面積較大,而剩餘的複數個第一焊盤50的底面面積均相等。 Please refer to FIG. 2 and FIG. 3 , the die 10 is a square structure. There are a plurality of first pads 50, for example, 13. Among the plurality of first pads 50, one first pad 50 is located in the central area of the die 10, and the remaining plurality of first pads 50 are arranged around the first pad 50 located in the central area of the die 10, wherein the bottom surface area of the first pad 50 located in the central area of the die 10 is larger, and the bottom surface areas of the remaining plurality of first pads 50 are equal.

第一焊盤50的材質為金、銅、銀、鋁及錫中的一種。如此,能夠保證第一焊盤50的導電性能與連接效果。 The material of the first solder pad 50 is one of gold, copper, silver, aluminum and tin. In this way, the electrical conductivity and connection effect of the first solder pad 50 can be guaranteed.

在本實施例中,第一輔助焊盤60為四個,且分別設於晶粒10的四個角落處。如此,第一輔助焊盤60在晶粒10上的分佈較為均勻,焊料熔化時能夠為晶粒10相對於基板20轉動提供較為一致的作用力。 In this embodiment, there are four first auxiliary pads 60, which are respectively arranged at the four corners of the die 10. In this way, the first auxiliary pads 60 are distributed more evenly on the die 10, and when the solder melts, it can provide a more consistent force for the die 10 to rotate relative to the substrate 20.

第一輔助焊盤60的材質為金、銅、銀、鋁及錫中的一種。如此,能夠保證第一輔助焊盤60的導電性能與連接效果。 The material of the first auxiliary pad 60 is one of gold, copper, silver, aluminum and tin. In this way, the conductive performance and connection effect of the first auxiliary pad 60 can be guaranteed.

第一焊盤50與第一輔助焊盤60相對於晶粒10表面的高度相等。如此,能夠保證焊接後晶粒10表面的平面度。 The first pad 50 and the first auxiliary pad 60 are at the same height relative to the surface of the die 10. In this way, the flatness of the surface of the die 10 after welding can be guaranteed.

第一焊盤50與第一輔助焊盤60的材質相同。如此,能夠在晶粒10上同時製作第一焊盤50與第一輔助焊盤60,第一焊盤50與第一輔助焊盤60的製作耗時短,效率高。 The first pad 50 and the first auxiliary pad 60 are made of the same material. In this way, the first pad 50 and the first auxiliary pad 60 can be made on the die 10 at the same time, and the production of the first pad 50 and the first auxiliary pad 60 is time-saving and efficient.

第一輔助焊盤60的形狀為矩形。第一輔助焊盤60的面積L1與第一焊盤50的面積L2的比值範圍為0.01-5。如此,能夠確保輔助焊盤面積提供足夠的旋轉力矩,但又不會過大而佔用晶粒10表面空間。 The shape of the first auxiliary pad 60 is rectangular. The ratio of the area L1 of the first auxiliary pad 60 to the area L2 of the first pad 50 is in the range of 0.01-5. In this way, it can be ensured that the area of the auxiliary pad provides sufficient rotation torque, but is not too large to occupy the surface space of the die 10.

請參見圖4,第一輔助焊盤60的形狀為長條形,其中位於晶粒10的對角方向上的兩個相對角落的至少兩個第一輔助焊盤60的重心O3與位於晶粒10的中心區域的第一焊盤50的重心O1均在一條直線上。例如,位於晶粒10的對角方向上的兩個相對角落的第一輔助焊盤60為兩個。如此,能夠使得焊接時晶粒10角落處的第一輔助焊盤60可以提供最大的旋轉力矩。 Please refer to FIG. 4 , the first auxiliary pad 60 is in the shape of a long strip, wherein the center of gravity O 3 of at least two first auxiliary pads 60 located at two opposite corners in the diagonal direction of the die 10 and the center of gravity O 1 of the first pad 50 located in the central area of the die 10 are all on a straight line. For example, there are two first auxiliary pads 60 located at two opposite corners in the diagonal direction of the die 10. In this way, the first auxiliary pads 60 at the corners of the die 10 can provide the maximum rotational torque during welding.

第一焊盤50與第一輔助焊盤60之間的最小間距值為A,第一焊盤50為複數個,複數個第一焊盤50中任意兩個第一焊盤50之間的間距值為B,A與B的比值範圍為0.1-3。如此,能夠保證在焊接過程中第一焊盤50與第一輔助焊盤60不會因焊料熔化而導通,從而防止晶粒10內部發生短路或是對自對準效果有不良影響。 The minimum spacing value between the first pad 50 and the first auxiliary pad 60 is A. There are multiple first pads 50, and the spacing value between any two of the multiple first pads 50 is B. The ratio of A to B is in the range of 0.1-3. In this way, it can be ensured that the first pad 50 and the first auxiliary pad 60 will not be connected due to the melting of the solder during the welding process, thereby preventing a short circuit from occurring inside the die 10 or adversely affecting the self-alignment effect.

請參見圖5,第一輔助焊盤60的形狀為圓形,為了避免晶粒10上的元件發生短路,第一輔助焊盤60與晶粒10邊緣之間的距離S1的範圍為小於或等於3mm。當第一輔助焊盤60與晶粒10邊緣之間的距離S1大於3mm時,會無法將輔助焊盤產生的旋轉力矩最大化。另外,第一輔助焊盤60與晶粒10的邊緣存在的間隙小於或等於3mm時,晶粒10切割時邊緣的第一輔助焊盤60也不容易被剝離。 Please refer to Figure 5. The shape of the first auxiliary pad 60 is circular. In order to avoid short circuit of the components on the die 10, the distance S1 between the first auxiliary pad 60 and the edge of the die 10 is less than or equal to 3mm. When the distance S1 between the first auxiliary pad 60 and the edge of the die 10 is greater than 3mm, the rotation torque generated by the auxiliary pad cannot be maximized. In addition, when the gap between the first auxiliary pad 60 and the edge of the die 10 is less than or equal to 3mm, the first auxiliary pad 60 at the edge is not easily peeled off when the die 10 is cut.

請參見圖2與圖6,圖6所示基板20為圖1中基板20的部分結構,該部分結構為方形且與晶粒10對應設置。在圖6所示的基板20中,第二焊盤70為複數個,例如13個,其中一個第二焊盤70位於基板20的中心區域,剩餘的第二焊盤70圍設於位於基板20的中心區域的第二焊盤70的周側,其中,位於基板20的中心區域的第二焊盤70的底面面積較大,而剩餘的第二焊盤70的底面面積均相等。 Please refer to FIG. 2 and FIG. 6. The substrate 20 shown in FIG. 6 is a partial structure of the substrate 20 in FIG. 1. The partial structure is square and is arranged corresponding to the die 10. In the substrate 20 shown in FIG. 6, there are a plurality of second pads 70, for example, 13, one of which is located in the central area of the substrate 20, and the remaining second pads 70 are arranged around the second pad 70 located in the central area of the substrate 20, wherein the bottom surface area of the second pad 70 located in the central area of the substrate 20 is larger, and the bottom surface areas of the remaining second pads 70 are equal.

第二焊盤70的材質為金、銅、銀、鋁及錫中的一種。如此,能夠保證第二焊盤70的導電性能與連接效果。 The material of the second solder pad 70 is one of gold, copper, silver, aluminum and tin. In this way, the electrical conductivity and connection effect of the second solder pad 70 can be guaranteed.

在本實施例中,第二輔助焊盤80為四個,且分別設於基板20的四個的角落處。如此,第二輔助焊盤80在基板20上的分佈較為均勻,以分別對位於四個第一輔助焊盤60。 In this embodiment, there are four second auxiliary pads 80, which are respectively disposed at four corners of the substrate 20. In this way, the second auxiliary pads 80 are distributed more evenly on the substrate 20, so as to correspond to the four first auxiliary pads 60 respectively.

第二輔助焊盤80的材質為金、銅、銀、鋁及錫中的一種。如此,能夠保證第二輔助焊盤80的導電性能與連接效果。 The material of the second auxiliary pad 80 is one of gold, copper, silver, aluminum and tin. In this way, the conductive performance and connection effect of the second auxiliary pad 80 can be guaranteed.

第二焊盤70與第二輔助焊盤80相對於基板20表面的高度相等。如此,能夠保證焊接後基板20表面的平面度。 The second solder pad 70 and the second auxiliary solder pad 80 are at the same height relative to the surface of the substrate 20. In this way, the flatness of the surface of the substrate 20 after soldering can be guaranteed.

第二焊盤70與第二輔助焊盤80的材質相同。如此,能夠在基板20上同時製作第二焊盤70與第二輔助焊盤80,第二焊盤70與第二輔助焊盤80的製作耗時短,效率高。 The second solder pad 70 and the second auxiliary solder pad 80 are made of the same material. In this way, the second solder pad 70 and the second auxiliary solder pad 80 can be manufactured on the substrate 20 at the same time, and the manufacturing of the second solder pad 70 and the second auxiliary solder pad 80 is time-saving and efficient.

第二輔助焊盤80設於基板20上的第二預設位置21,第二預設位置21與圖2中的第一預設位置11對應設置。 The second auxiliary solder pad 80 is disposed at a second preset position 21 on the substrate 20, and the second preset position 21 is disposed corresponding to the first preset position 11 in FIG. 2 .

在本實施例中,第二輔助焊盤80的形狀為矩形。第二輔助焊盤80的面積L3與第二焊盤70的面積L4的比值範圍為0.01-5。如此,能夠確保輔助焊盤面積提供足夠的旋轉力矩,但又不會過大而佔用晶粒10表面空間。 In this embodiment, the shape of the second auxiliary pad 80 is a rectangle. The ratio of the area L3 of the second auxiliary pad 80 to the area L4 of the second pad 70 is in the range of 0.01-5. In this way, it can be ensured that the area of the auxiliary pad provides sufficient rotational torque, but is not too large to occupy the surface space of the die 10.

請參見圖7,第二輔助焊盤80的形狀為長條形,其中位於基板20的對角方向上的兩個相對的角落的至少兩個第二輔助焊盤80的重心O4與位於基板20的中心區域的第二焊盤70的重心O2均在一條直線上。例如,位於基板20的對角方向上的兩個相對的角落的第二輔助焊盤80為兩個。如此,能夠使得焊接時晶粒10的角落處具有最大的旋轉力矩。 Please refer to FIG. 7 , the second auxiliary pad 80 is in the shape of a long strip, wherein the center of gravity O 4 of at least two second auxiliary pads 80 located at two opposite corners in the diagonal direction of the substrate 20 and the center of gravity O 2 of the second pad 70 located in the central area of the substrate 20 are all on a straight line. For example, there are two second auxiliary pads 80 located at two opposite corners in the diagonal direction of the substrate 20. In this way, the corners of the die 10 can have the maximum rotational torque during welding.

第二焊盤70與第二輔助焊盤80之間的最小間距值為C,第二焊盤70為複數個,複數個第二焊盤70中任意兩個第二焊盤70之間的間距值為D,C與D的比 值範圍為0.1-3。如此,能夠保證在焊接過程中第二焊盤70與第二輔助焊盤80不會因焊料熔化而導通,從而防止基板20內部發生短路或是對自對準效果有不良影響。 The minimum spacing between the second pad 70 and the second auxiliary pad 80 is C. There are multiple second pads 70, and the spacing between any two of the multiple second pads 70 is D. The ratio of C to D is in the range of 0.1-3. In this way, it can be ensured that the second pad 70 and the second auxiliary pad 80 will not be connected due to the melting of the solder during the welding process, thereby preventing a short circuit from occurring inside the substrate 20 or adversely affecting the self-alignment effect.

請參見圖8,第二輔助焊盤80的形狀為圓形,為了避免基板20上的元件發生短路,第二輔助焊盤80與基板20邊緣之間的距離S2的範圍為小於或等於3mm。當第二輔助焊盤80與基板20邊緣之間的距離S2大於3mm時,會使得第二焊盤70與第二輔助焊盤80之間的間距過小,容易在焊接時使第二焊盤70與第二輔助焊盤80之間因焊料熔化導通而發生短路。另外,第二輔助焊盤80與基板20邊緣存在的間隙小於或等於3mm時,基板20切割時邊緣的第二輔助焊盤80不容易被剝離。 Please refer to FIG8 . The second auxiliary pad 80 is circular in shape. In order to avoid short circuit of components on the substrate 20, the distance S2 between the second auxiliary pad 80 and the edge of the substrate 20 is less than or equal to 3 mm. When the distance S2 between the second auxiliary pad 80 and the edge of the substrate 20 is greater than 3 mm, the distance between the second pad 70 and the second auxiliary pad 80 is too small, which may cause a short circuit between the second pad 70 and the second auxiliary pad 80 due to melting of the solder during welding. In addition, when the gap between the second auxiliary pad 80 and the edge of the substrate 20 is less than or equal to 3 mm, the second auxiliary pad 80 at the edge is not easily peeled off when the substrate 20 is cut.

第一輔助焊盤60(如圖3所示)的形狀與第二輔助焊盤80(如圖6所示)的形狀相同。如此,第一輔助焊盤60與第二輔助焊盤80的接觸面積較大,能夠保證第一輔助焊盤60與第二輔助焊盤80完全貼合在一起。 The shape of the first auxiliary pad 60 (as shown in FIG. 3 ) is the same as the shape of the second auxiliary pad 80 (as shown in FIG. 6 ). In this way, the contact area between the first auxiliary pad 60 and the second auxiliary pad 80 is larger, which can ensure that the first auxiliary pad 60 and the second auxiliary pad 80 are completely attached together.

第一焊盤50(如圖3所示)的形狀與第二焊盤70(如圖6所示)的形狀相同,如此,第一焊盤50與第二焊盤70的接觸面積較大,能夠保證第一焊盤50與第二焊盤70完全貼合在一起。 The shape of the first pad 50 (as shown in FIG. 3 ) is the same as the shape of the second pad 70 (as shown in FIG. 6 ). Thus, the contact area between the first pad 50 and the second pad 70 is larger, which can ensure that the first pad 50 and the second pad 70 are completely attached together.

在一些實施例中,第一輔助焊盤60可以不與晶粒10內的電路電連接,第二輔助焊盤80可以不與基板20內的電路電連接。在一些實施例中,第一輔助焊盤60亦可作為晶粒10的一個線路接點,第二輔助焊盤80亦可作為基板20的一個線路接點。 In some embodiments, the first auxiliary pad 60 may not be electrically connected to the circuit in the die 10, and the second auxiliary pad 80 may not be electrically connected to the circuit in the substrate 20. In some embodiments, the first auxiliary pad 60 may also serve as a circuit contact of the die 10, and the second auxiliary pad 80 may also serve as a circuit contact of the substrate 20.

請參見圖9,本發明實施例還提供了一種封裝結構100的製備方法,包括以下步驟: Please refer to Figure 9. The embodiment of the present invention also provides a method for preparing a packaging structure 100, comprising the following steps:

S210,蝕刻晶粒10以於晶粒10上形成第一焊盤50及與第一焊盤50間隔設置的第一輔助焊盤60,其中第一輔助焊盤60形成於晶粒10上的第一預設位置 11,與晶粒10上除了第一預設位置11外的其他位置(例如圖3中舉例示出的其他位置12)相比,第一預設位置11與晶粒10的重心O1之間的距離最長。 S210, etching the die 10 to form a first pad 50 and a first auxiliary pad 60 spaced apart from the first pad 50 on the die 10, wherein the first auxiliary pad 60 is formed at a first preset position 11 on the die 10, and compared with other positions on the die 10 except the first preset position 11 (such as other positions 12 shown as an example in FIG. 3 ), the distance between the first preset position 11 and the center of gravity O1 of the die 10 is the longest.

其中,基板20的材質為環氧樹脂敷銅電路板(PCB)、聚醯亞胺(PI)敷銅電路板、柔性電路板(FPC)或聚對苯二甲酸乙二醇酯(PET)電路板。晶粒10為晶圓經過減薄切割後沒有進行封裝的單顆裸晶片,例如發光二極體晶粒10。焊料為錫膏、銀漿、銦或錫合金,在本實施例中,焊料為錫膏。 The substrate 20 is made of a copper-coated epoxy circuit board (PCB), a copper-coated polyimide (PI) circuit board, a flexible circuit board (FPC) or a polyethylene terephthalate (PET) circuit board. The die 10 is a single bare chip that is not packaged after the wafer is thinned and cut, such as a light-emitting diode die 10. The solder is solder paste, silver paste, indium or tin alloy. In this embodiment, the solder is solder paste.

在一些實施例中,第一焊盤50與第一輔助焊盤60為同時蝕刻形成。 In some embodiments, the first pad 50 and the first auxiliary pad 60 are formed by etching simultaneously.

S220,蝕刻基板20以於基板20上形成第二焊盤70及與第二焊盤70間隔設置的第二輔助焊盤80;在一些實施例中,第二焊盤70與第二輔助焊盤80為同時蝕刻形成。 S220, etching the substrate 20 to form a second pad 70 and a second auxiliary pad 80 spaced apart from the second pad 70 on the substrate 20; in some embodiments, the second pad 70 and the second auxiliary pad 80 are formed by etching at the same time.

在一些實施例中,步驟S210與步驟S220的順序可以調換。 In some embodiments, the order of step S210 and step S220 can be swapped.

S230,塗覆焊料於第二焊盤70及第二輔助焊盤80上。 S230, coating solder on the second solder pad 70 and the second auxiliary solder pad 80.

其中,焊料的厚度可根據實際需要設置。 Among them, the thickness of the solder can be set according to actual needs.

在一些實施例中,所述方法還包括塗覆焊料於第一焊盤50及第一輔助焊盤60上。 In some embodiments, the method further includes coating solder on the first pad 50 and the first auxiliary pad 60.

S240,將晶粒10蓋設於基板20,並使第一焊盤50對位於第二焊盤70且貼附於第二焊盤70上的焊料,以及使第一輔助焊盤60對位於第二輔助焊盤80且貼附於第二輔助焊盤80上的焊料。 S240, the die 10 is covered on the substrate 20, and the first pad 50 is aligned with the second pad 70 and attached to the solder on the second pad 70, and the first auxiliary pad 60 is aligned with the second auxiliary pad 80 and attached to the solder on the second auxiliary pad 80.

S250,加熱焊料以使第一焊盤50與第二焊盤70之間的焊料熔化,並使第一輔助焊盤60與第二輔助焊盤80之間的焊料熔化,熔化的焊料能夠作用於第一焊盤50與第一輔助焊盤60以帶動晶粒10相對於基板20轉動,直至第一焊盤50對準於第二焊盤70。 S250, heating the solder to melt the solder between the first pad 50 and the second pad 70, and melt the solder between the first auxiliary pad 60 and the second auxiliary pad 80. The melted solder can act on the first pad 50 and the first auxiliary pad 60 to drive the die 10 to rotate relative to the substrate 20 until the first pad 50 is aligned with the second pad 70.

其中,第一焊盤50對準於第二焊盤70時,第一輔助焊盤60也對準於第二輔助焊盤80。 When the first pad 50 is aligned with the second pad 70, the first auxiliary pad 60 is also aligned with the second auxiliary pad 80.

其中,第一焊盤50與第二焊盤70之間的焊料熔化後會冷卻,並形成連接第一焊盤50與第二焊盤70的第一焊接部30;第一輔助焊盤60與第二輔助焊盤80之間的焊料熔化會冷卻,並形成連接第一輔助焊盤60與第二輔助焊盤80的第二焊接部40,第一焊接部30與第二焊接部40的材質相同。 Among them, the solder between the first pad 50 and the second pad 70 will cool after melting, and form a first welding part 30 connecting the first pad 50 and the second pad 70; the solder between the first auxiliary pad 60 and the second auxiliary pad 80 will cool after melting, and form a second welding part 40 connecting the first auxiliary pad 60 and the second auxiliary pad 80. The first welding part 30 and the second welding part 40 are made of the same material.

上述的封裝結構100的製備方法,先藉由蝕刻晶粒10以於晶粒10上形成第一焊盤50及與第一焊盤50間隔設置的第一輔助焊盤60;然後蝕刻基板20以於基板20上形成第二焊盤70及與第二焊盤70間隔設置的第二輔助焊盤80;接著塗覆焊料於第二焊盤70及第二輔助焊盤80上;之後將晶粒10蓋設於基板20,並使第一焊盤50對位於第二焊盤70且貼附於第二焊盤70上的焊料,以及使第一輔助焊盤60對位於第二輔助焊盤80且貼附於第二輔助焊盤80上的焊料;最後加熱焊料以使第一焊盤50與第二焊盤70之間的焊料熔化,並使第一輔助焊盤60與第二輔助焊盤80之間的焊料熔化,熔化的焊料能夠作用於第一焊盤50與第一輔助焊盤60以帶動晶粒10相對於基板20轉動,直至第一焊盤50對準於第二焊盤70。由於第一輔助焊盤60設於晶粒10上的第一預設位置11,且與晶粒10上除了第一預設位置11外的其他位置相比,第一預設位置11與晶粒10的重心之間的距離最長,故,位於第一預設位置11的第一輔助焊盤60能夠為晶粒10相對於基板20轉動提供最大的旋轉力矩,從而提高晶粒10與基板20之間的自對準能力,進而提高晶粒10與基板20的封裝精度,在一定程度上亦可擴展晶粒10的封裝使用場景。 The preparation method of the package structure 100 is as follows: first, a first pad 50 and a first auxiliary pad 60 spaced apart from the first pad 50 are formed on the die 10 by etching the die 10; then, a second pad 70 and a second auxiliary pad 80 spaced apart from the second pad 70 are formed on the substrate 20 by etching the substrate 20; then, solder is coated on the second pad 70 and the second auxiliary pad 80; then, the die 10 is covered on the substrate 20, and the first pad 50 is aligned with the second pad 70 and attached. The solder on the second pad 70 and the solder that makes the first auxiliary pad 60 aligned with the second auxiliary pad 80 and attached to the second auxiliary pad 80; finally, the solder is heated to melt the solder between the first pad 50 and the second pad 70, and melt the solder between the first auxiliary pad 60 and the second auxiliary pad 80. The molten solder can act on the first pad 50 and the first auxiliary pad 60 to drive the die 10 to rotate relative to the substrate 20 until the first pad 50 is aligned with the second pad 70. Since the first auxiliary pad 60 is located at the first preset position 11 on the die 10, and compared with other positions on the die 10 except the first preset position 11, the distance between the first preset position 11 and the center of gravity of the die 10 is the longest, the first auxiliary pad 60 located at the first preset position 11 can provide the maximum rotational torque for the die 10 to rotate relative to the substrate 20, thereby improving the self-alignment ability between the die 10 and the substrate 20, and further improving the packaging accuracy of the die 10 and the substrate 20, and to a certain extent, it can also expand the packaging use scenarios of the die 10.

最後應說明的係,以上實施例僅用以說明本發明的技術方案而非限制,儘管參照較佳實施例對本發明進行了詳細說明,本領域的普通技術人員應當理解,可對本發明的技術方案進行修改或等同替換,而不脫離本發明技術方案的精神與範圍。 Finally, it should be noted that the above embodiments are only used to illustrate the technical solution of the present invention rather than to limit it. Although the present invention is described in detail with reference to the preferred embodiments, ordinary technicians in this field should understand that the technical solution of the present invention can be modified or replaced by equivalents without departing from the spirit and scope of the technical solution of the present invention.

10:晶粒 10: Grain

11:第一預設位置 11: First default position

12:其他位置 12: Other locations

50:第一焊盤 50: First pad

60:第一輔助焊盤 60: First auxiliary pad

O1:重心 O 1 : Center of gravity

Claims (11)

一種封裝結構,包括晶粒、基板及第一焊接部,所述晶粒上設有第一焊盤,所述基板上設有與所述第一焊盤對應的第二焊盤,所述第一焊接部連接於所述第一焊盤與所述第二焊盤之間,其改良在於,所述晶粒上還設有與所述第一焊盤間隔設置的第一輔助焊盤,所述基板上還設有與所述第二焊盤間隔設置的第二輔助焊盤,所述封裝結構還包括第二焊接部,所述第二輔助焊盤與所述第一輔助焊盤對應設置,所述第二焊接部連接於所述第一輔助焊盤與所述第二輔助焊盤之間;所述第一輔助焊盤設於所述晶粒上的第一預設位置,與所述晶粒上除了所述第一預設位置外的其他位置相比,所述第一預設位置與所述晶粒的重心之間的距離最長。 A packaging structure includes a die, a substrate and a first welding portion, wherein a first welding pad is provided on the die, a second welding pad corresponding to the first welding pad is provided on the substrate, and the first welding portion is connected between the first welding pad and the second welding pad. The improvement lies in that a first auxiliary welding pad spaced apart from the first welding pad is also provided on the die, a second auxiliary welding pad spaced apart from the second welding pad is also provided on the substrate, and the packaging structure further includes a second welding portion, the second auxiliary welding pad is provided corresponding to the first auxiliary welding pad, and the second welding portion is connected between the first auxiliary welding pad and the second auxiliary welding pad; the first auxiliary welding pad is provided at a first preset position on the die, and compared with other positions on the die except the first preset position, the distance between the first preset position and the center of gravity of the die is the longest. 如請求項1所述之封裝結構,其中,所述第二輔助焊盤設於所述基板上的第二預設位置,所述第二預設位置與所述第一預設位置對應設置。 The packaging structure as described in claim 1, wherein the second auxiliary pad is disposed at a second preset position on the substrate, and the second preset position is disposed corresponding to the first preset position. 如請求項1所述之封裝結構,其中,所述第一輔助焊盤為複數個,複數個所述第一輔助焊盤分別設於所述晶粒的角落。 The package structure as described in claim 1, wherein the first auxiliary pads are plural, and the plural first auxiliary pads are respectively arranged at the corners of the die. 如請求項3所述之封裝結構,其中,所述第一輔助焊盤的形狀為矩形、長條形或圓形,其中位於所述晶粒的對角方向上的兩個相對的角落的至少兩個所述第一輔助焊盤的重心與位於所述晶粒的中心區域的所述第一焊盤的重心均在一條直線上。 The package structure as described in claim 3, wherein the shape of the first auxiliary pad is rectangular, strip-shaped or circular, wherein the center of gravity of at least two of the first auxiliary pads located at two opposite corners in the diagonal direction of the die and the center of gravity of the first pad located in the central area of the die are both on a straight line. 如請求項1所述之封裝結構,其中,所述第一輔助焊盤與所述晶粒邊緣之間的距離範圍為小於或等於3mm。 The package structure as described in claim 1, wherein the distance between the first auxiliary pad and the edge of the die is less than or equal to 3 mm. 如請求項1所述之封裝結構,其中,所述第一輔助焊盤的面積與所述第一焊盤的面積的比值範圍為0.01-5。 The package structure as described in claim 1, wherein the ratio of the area of the first auxiliary pad to the area of the first pad is in the range of 0.01-5. 如請求項1所述之封裝結構,其中,所述第一焊盤與所述第一輔助焊盤之間的最小間距值為A,所述第一焊盤為複數個,複數個所述第一焊盤中任意兩個所述第一焊盤之間的間距值為B,A與B的比值範圍為0.1-3。 The package structure as described in claim 1, wherein the minimum spacing value between the first pad and the first auxiliary pad is A, there are plural first pads, the spacing value between any two of the plural first pads is B, and the ratio of A to B is in the range of 0.1-3. 如請求項1所述之封裝結構,其中,所述第一輔助焊盤與所述第一焊盤相對於所述晶粒表面的高度相等。 The package structure as described in claim 1, wherein the first auxiliary pad and the first pad have the same height relative to the surface of the die. 如請求項1所述之封裝結構,其中,所述第一輔助焊盤與所述第二輔助焊盤的形狀相同。 The package structure as described in claim 1, wherein the first auxiliary pad and the second auxiliary pad have the same shape. 一種封裝結構的製備方法,其改良在於,包括以下步驟:蝕刻晶粒以於所述晶粒上形成第一焊盤及與所述第一焊盤間隔設置的第一輔助焊盤,其中所述第一輔助焊盤形成於所述晶粒上的第一預設位置,與所述晶粒上除了所述第一預設位置外的其他位置相比,所述第一預設位置與所述晶粒的重心之間的距離最長;蝕刻基板以於所述基板上形成第二焊盤及與所述第二焊盤間隔設置的第二輔助焊盤;塗覆焊料於所述第二焊盤及第二輔助焊盤上;將所述晶粒蓋設於所述基板,並使所述第一焊盤對位於所述第二焊盤且貼附於所述第二焊盤上的所述焊料,以及使所述第一輔助焊盤對位於所述第二輔助焊盤且貼附於所述第二輔助焊盤上的所述焊料;加熱所述焊料以使所述第一焊盤與所述第二焊盤之間的所述焊料熔化,並使所述第一輔助焊盤與所述第二輔助焊盤之間的所述焊料熔化,熔化的所述焊料能夠作用於所述第一焊盤與所述第一輔助焊盤以帶動所述晶粒相對於所述基板轉動,直至所述第一焊盤對準於所述第二焊盤。 A method for preparing a package structure, the improvement of which is that it includes the following steps: etching a crystal grain to form a first pad and a first auxiliary pad spaced apart from the first pad on the crystal grain, wherein the first auxiliary pad is formed at a first preset position on the crystal grain, and the distance between the first preset position and the center of gravity of the crystal grain is the longest compared with other positions on the crystal grain except the first preset position; etching a substrate to form a second pad and a second auxiliary pad spaced apart from the second pad on the substrate; coating the second pad and the second auxiliary pad with solder; and covering the crystal grain on a substrate; The substrate is provided, and the first pad is aligned with the second pad and attached to the solder on the second pad, and the first auxiliary pad is aligned with the second auxiliary pad and attached to the solder on the second auxiliary pad; the solder is heated to melt the solder between the first pad and the second pad, and the solder between the first auxiliary pad and the second auxiliary pad is melted, and the melted solder can act on the first pad and the first auxiliary pad to drive the grain to rotate relative to the substrate until the first pad is aligned with the second pad. 如請求項10所述之製備方法,其中,所述第一焊盤與所述第一輔助焊盤為同時蝕刻形成,所述第二焊盤與所述第二輔助焊盤為同時蝕刻形成。 The preparation method as described in claim 10, wherein the first pad and the first auxiliary pad are formed by etching at the same time, and the second pad and the second auxiliary pad are formed by etching at the same time.
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