TWI874015B - Package structure and manufacturing method thereof - Google Patents
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本發明涉及電子元件封裝技術領域,具體涉及一種封裝結構及其製備方法。 The present invention relates to the field of electronic component packaging technology, and specifically to a packaging structure and a preparation method thereof.
隨著半導體業的迅速發展,封裝技術的應用範圍日益廣泛,封裝形式更趨多樣化。其中,覆晶技術(Flip-Chip),也稱“倒晶封裝”或“倒晶封裝法”,其既是一種晶片互連技術,也是一種較為理想的晶片粘接技術。 With the rapid development of the semiconductor industry, the application scope of packaging technology is becoming increasingly wide, and the packaging forms are becoming more diverse. Among them, flip-chip technology, also known as "flip chip packaging" or "flip chip packaging method", is both a chip interconnection technology and a more ideal chip bonding technology.
在對基板與晶粒進行連接時,先前技术通常是先將錫膏塗在基板與晶粒的焊盤上,然後藉由回流焊的方式加熱錫膏,使錫膏熔化並在固化後連接基板與晶粒。然而,此種連接方式晶粒相對於基板的偏移量較小,無法滿足一些場景中晶粒高精准度封裝的要求。 When connecting the substrate and the die, the previous technology usually first applies solder paste to the pads of the substrate and the die, and then heats the solder paste by reflow soldering to melt the solder paste and connect the substrate and the die after solidification. However, this connection method has a small offset of the die relative to the substrate, which cannot meet the requirements of high-precision die packaging in some scenarios.
鑒於以上內容,有必要提出一種封裝結構及其製備方法,以提高晶粒與基板的封裝精度。 In view of the above, it is necessary to propose a packaging structure and its preparation method to improve the packaging accuracy of the die and substrate.
第一方面,本發明實施例提供一種封裝結構,包括晶粒、基板及第一焊接部,所述晶粒上設有第一焊盤,所述基板上設有與所述第一焊盤對應的第二焊盤,所述第一焊接部連接於所述第一焊盤與所述第二焊盤之間,所述晶粒 上還設有與所述第一焊盤間隔設置的第一輔助焊盤,所述基板上還設有與所述第二焊盤間隔設置的第二輔助焊盤,所述封裝結構還包括第二焊接部,所述第二輔助焊盤與所述第一輔助焊盤對應設置,所述第二焊接部連接於所述第一輔助焊盤與所述第二輔助焊盤之間;所述第一輔助焊盤設於所述晶粒上的第一預設位置,與所述晶粒上除了所述第一預設位置外的其他位置相比,所述第一預設位置與所述晶粒的重心之間的距離最長。 In a first aspect, an embodiment of the present invention provides a packaging structure, including a die, a substrate, and a first welding portion, wherein the die is provided with a first welding pad, the substrate is provided with a second welding pad corresponding to the first welding pad, the first welding portion is connected between the first welding pad and the second welding pad, the die is further provided with a first auxiliary welding pad spaced apart from the first welding pad, the substrate is further provided with a second auxiliary welding pad spaced apart from the second welding pad, Auxiliary pad, the package structure further includes a second welding portion, the second auxiliary pad is arranged corresponding to the first auxiliary pad, and the second welding portion is connected between the first auxiliary pad and the second auxiliary pad; the first auxiliary pad is arranged at a first preset position on the die, and compared with other positions on the die except the first preset position, the distance between the first preset position and the center of gravity of the die is the longest.
上述的封裝結構中,藉由在晶粒上設置與第一焊盤間隔設置的第一輔助焊盤,以及在基板上設置與第二焊盤間隔且與第一輔助焊盤對應的第二輔助焊盤,在藉由回流焊對基板與晶粒進行焊接時,第一輔助焊盤與第二輔助焊盤之間、以及第一焊盤與第二焊盤之間的焊料會熔化,即第一焊接部與第二焊接部會熔化,而熔化的第一焊接部與第二焊接部能夠分別作用於第一焊盤與第一輔助焊盤以帶動晶粒相對於基板轉動,直至第一焊盤對準於第二焊盤。由於第一輔助焊盤設於晶粒上的第一預設位置,且與晶粒上除了第一預設位置外的其他位置相比,第一預設位置與所述晶粒的重心之間的距離最長,故,位於第一預設位置的第一輔助焊盤能夠為晶粒相對於基板轉動提供最大的旋轉力矩,從而提高晶粒與基板之間的自對準能力,進而提高晶粒與基板的封裝精度,在一定程度上亦可擴展晶粒的封裝使用場景。 In the above-mentioned packaging structure, a first auxiliary pad is arranged on the die at a spacing with the first pad, and a second auxiliary pad is arranged on the substrate at a spacing with the second pad and corresponding to the first auxiliary pad. When the substrate and the die are soldered by reflow soldering, the solder between the first auxiliary pad and the second auxiliary pad and between the first pad and the second pad will melt, that is, the first soldering portion and the second soldering portion will melt, and the melted first soldering portion and the second soldering portion can act on the first soldering pad and the first auxiliary soldering pad respectively to drive the die to rotate relative to the substrate until the first soldering pad is aligned with the second soldering pad. Since the first auxiliary pad is located at the first preset position on the die, and compared with other positions on the die except the first preset position, the distance between the first preset position and the center of gravity of the die is the longest, the first auxiliary pad located at the first preset position can provide the maximum rotational torque for the die to rotate relative to the substrate, thereby improving the self-alignment ability between the die and the substrate, and further improving the packaging accuracy of the die and the substrate, and to a certain extent, it can also expand the packaging use scenarios of the die.
第二方面,本發明實施例還提供了一種封裝結構的製備方法,該方法包括以下步驟:蝕刻晶粒以於所述晶粒上形成第一焊盤及與所述第一焊盤間隔設置的第一輔助焊盤,其中所述第一輔助焊盤形成於所述晶粒上的第一預設位置,與所述晶粒上除了所述第一預設位置外的其他位置相比,所述第一預設位置與所述晶粒的重心之間的距離最長;蝕刻基板以於所述基板上形成第二焊盤及與所述第二焊盤間隔設置的第二輔助焊盤;塗覆焊料於所述第二焊盤及第二輔助焊盤上;將所述晶粒蓋設於所述基板,並使所述第一焊盤對位於所述第二 焊盤且貼附於所述第二焊盤上的所述焊料,以及使所述第一輔助焊盤對位於所述第二輔助焊盤且貼附於所述第二輔助焊盤上的所述焊料;加熱所述焊料以使所述第一焊盤與所述第二焊盤之間的所述焊料熔化,並使所述第一輔助焊盤與所述第二輔助焊盤之間的所述焊料熔化,熔化的所述焊料能夠作用於所述第一焊盤與所述第一輔助焊盤以帶動所述晶粒相對於所述基板轉動,直至所述第一焊盤對準於所述第二焊盤。 In a second aspect, an embodiment of the present invention further provides a method for preparing a packaging structure, the method comprising the following steps: etching a crystal grain to form a first pad and a first auxiliary pad spaced apart from the first pad on the crystal grain, wherein the first auxiliary pad is formed at a first preset position on the crystal grain, and compared with other positions on the crystal grain except the first preset position, the distance between the first preset position and the center of gravity of the crystal grain is the longest; etching a substrate to form a second pad and a second auxiliary pad spaced apart from the second pad on the substrate; coating the second pad and the second auxiliary pad with solder; The crystal grain is covered on the substrate, and the first pad is aligned with the second pad and attached to the solder on the second pad, and the first auxiliary pad is aligned with the second auxiliary pad and attached to the solder on the second auxiliary pad; the solder is heated to melt the solder between the first pad and the second pad, and the solder between the first auxiliary pad and the second auxiliary pad is melted, and the melted solder can act on the first pad and the first auxiliary pad to drive the crystal grain to rotate relative to the substrate until the first pad is aligned with the second pad.
上述的封裝結構的製備方法,先藉由蝕刻晶粒以於晶粒上形成第一焊盤及與第一焊盤間隔設置的第一輔助焊盤;然後蝕刻基板以於基板上形成第二焊盤及與第二焊盤間隔設置的第二輔助焊盤;接著塗覆焊料於第二焊盤及第二輔助焊盤上;之後將晶粒蓋設於基板,並使第一焊盤對位於第二焊盤且貼附於第二焊盤上的焊料,以及使第一輔助焊盤對位於第二輔助焊盤且貼附於第二輔助焊盤上的焊料;最後加熱焊料以使第一焊盤與第二焊盤之間的焊料熔化,並使第一輔助焊盤與第二輔助焊盤之間的焊料熔化,熔化的焊料能夠作用於第一焊盤與第一輔助焊盤以帶動晶粒相對於基板轉動,直至第一焊盤對準於第二焊盤。由於第一輔助焊盤形成於晶粒上的第一預設位置,且與晶粒上除了第一預設位置外的其他位置相比,第一預設位置與所述晶粒的重心之間的距離最長,故,位於第一預設位置的第一輔助焊盤能夠為晶粒相對於基板轉動提供最大的旋轉力矩,從而提高晶粒與基板之間的自對準能力,進而提高晶粒與基板的封裝精度,在一定程度上亦可擴展晶粒的封裝使用場景。 The method for preparing the package structure is as follows: first, a first pad and a first auxiliary pad spaced apart from the first pad are formed on the die by etching the die; then, a second pad and a second auxiliary pad spaced apart from the second pad are formed on the substrate by etching the substrate; then, solder is coated on the second pad and the second auxiliary pad; then, the die is covered on the substrate, and the first pad is aligned with the second pad and attached to the second pad. The solder on the auxiliary pad and the solder that makes the first auxiliary pad align with the second auxiliary pad and adheres to the second auxiliary pad; finally, the solder is heated to melt the solder between the first pad and the second pad, and the solder between the first auxiliary pad and the second auxiliary pad is melted, and the molten solder can act on the first pad and the first auxiliary pad to drive the die to rotate relative to the substrate until the first pad is aligned with the second pad. Since the first auxiliary pad is formed at the first preset position on the die, and compared with other positions on the die except the first preset position, the distance between the first preset position and the center of gravity of the die is the longest, the first auxiliary pad located at the first preset position can provide the maximum rotational torque for the die to rotate relative to the substrate, thereby improving the self-alignment ability between the die and the substrate, and further improving the packaging accuracy of the die and the substrate, and to a certain extent, it can also expand the packaging use scenarios of the die.
100:封裝結構 100:Packaging structure
10:晶粒 10: Grain
11:第一預設位置 11: First default position
12,22:其他位置 12, 22: Other locations
20:基板 20: Substrate
21:第二預設位置 21: Second default position
30:第一焊接部 30: First welding section
40:第二焊接部 40: Second welding section
50:第一焊盤 50: First pad
60:第一輔助焊盤 60: First auxiliary pad
70:第二焊盤 70: Second pad
80:第二輔助焊盤 80: Second auxiliary pad
O1,O2,O3,O4:重心 O 1 , O 2 , O 3 , O 4 : center of gravity
圖1係本發明一實施例提出的封裝結構的結構示意圖。 Figure 1 is a schematic diagram of the packaging structure proposed in one embodiment of the present invention.
圖2係圖1所示封裝結構沿II-II線的剖面結構示意圖。 Figure 2 is a schematic diagram of the cross-sectional structure of the package structure shown in Figure 1 along line II-II.
圖3係本發明一實施例提出的封裝結構的晶粒、第一焊盤及第一輔助焊盤的結構示意圖。 FIG3 is a schematic diagram of the structure of the die, the first pad and the first auxiliary pad of the package structure proposed in one embodiment of the present invention.
圖4係本發明另一實施例提出的封裝結構的晶粒、第一焊盤及第一輔助焊盤的結構示意圖。 FIG4 is a schematic diagram of the structure of the die, the first pad and the first auxiliary pad of the package structure proposed in another embodiment of the present invention.
圖5係本發明又一實施例提出的封裝結構的晶粒、第一焊盤及第一輔助焊盤的結構示意圖。 FIG5 is a schematic diagram of the structure of the die, the first pad and the first auxiliary pad of the package structure proposed in another embodiment of the present invention.
圖6係本發明一實施例提出的封裝結構的基板的部分結構、第二輔助焊盤及第二焊盤的結構示意圖。 FIG6 is a schematic diagram of the partial structure of the substrate, the second auxiliary pad and the second pad of the package structure proposed in one embodiment of the present invention.
圖7係本發明另一實施例提出的封裝結構的基板的部分結構、第二輔助焊盤及第二焊盤的結構示意圖。 FIG7 is a schematic diagram of the structure of a partial substrate, a second auxiliary pad, and a second pad of a package structure proposed in another embodiment of the present invention.
圖8係本發明又一實施例提出的封裝結構的基板的部分結構、第二輔助焊盤及第二焊盤的結構示意圖。 FIG8 is a schematic diagram of the structure of a partial substrate, a second auxiliary pad, and a second pad of a packaging structure proposed in another embodiment of the present invention.
圖9係本發明的一實施例提出的一種封裝結構的製備方法的流程圖。 FIG9 is a flow chart of a method for preparing a packaging structure proposed in an embodiment of the present invention.
下面詳細描述本發明的實施方式,所述實施方式的示例於附圖中示出,其中自始至終相同或類似的標號表示相同或類似的元件或具有相同或類似功能的元件。下面藉由參考附圖描述的實施方式係示例性的,僅用於解釋本發明,而不能理解為對本發明的限制。 The embodiments of the present invention are described in detail below. Examples of the embodiments are shown in the attached drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the attached drawings are exemplary and are only used to explain the present invention, and cannot be understood as limiting the present invention.
下面參照附圖,對本發明的具體實施方式作進一步的詳細描述。 The specific implementation of the present invention is further described in detail below with reference to the attached drawings.
請參見圖1與圖2,本發明實施例提出了一種封裝結構100,包括晶粒10、基板20、第一焊接部30及第二焊接部40。
Please refer to FIG. 1 and FIG. 2 , the embodiment of the present invention proposes a
晶粒10上設有第一焊盤50與第一輔助焊盤60,第一輔助焊盤60與第一焊盤50間隔設置。基板20上設有第二焊盤70與第二輔助焊盤80,第二輔助焊盤
80與第二焊盤70間隔設置,第二焊盤70與第一焊盤50對應設置,第一焊接部30連接於第一焊盤50與第二焊盤70之間,第二輔助焊盤80與第一輔助焊盤60對應設置,第二焊接部40連接於第一輔助焊盤60與第二輔助焊盤80之間。請一併參見圖3,第一輔助焊盤60設於晶粒10上的第一預設位置11,與晶粒10上除了第一預設位置11(圖中對應虛線框與晶粒10的兩個側邊圍合的區域位置)外的其他位置(例如圖3中舉例示出的其他位置12,圖中對應虛線框與晶粒10的一個側邊圍合的區域位置)的第一輔助焊盤60相比,第一預設位置11上的第一輔助焊盤60與晶粒10的重心O1之間的距離最長。可以理解,圖3中的其他位置12僅為其中一個區別於第一預設位置11的不同位置的示例,並不作本實施例中具體位置的限制,並且第一預設位置11是作為一個整體來看待,即第一預設位置11這個整體上的元件相比於晶粒10上的其他位置上設置的元件,與晶粒10的重心O1之間的距離最長。
The die 10 is provided with a
上述的封裝結構100,藉由在晶粒10上設置與第一焊盤50間隔設置的第一輔助焊盤60,以及在基板20上設置與第二焊盤70間隔且與第一輔助焊盤60對應的第二輔助焊盤80,在藉由回流焊對基板20與晶粒10進行焊接時,第一輔助焊盤60與第二輔助焊盤80之間、以及第一焊盤50與第二焊盤70之間的焊料會熔化,即第一焊接部30與第二焊接部40會熔化,而熔化的第一焊接部30與第二焊接部40能夠分別作用於第一焊盤50與第一輔助焊盤60以帶動晶粒10相對於基板20轉動,直至第一焊盤50對準於第二焊盤70。由於第一輔助焊盤60設於晶粒10上的第一預設位置11,且與晶粒10上除了第一預設位置11外的其他位置的第一輔助焊盤60相比,第一預設位置11的第一輔助焊盤60與晶粒10的重心O1之間的距離最長,故,位於第一預設位置11的第一輔助焊盤60能夠為晶粒10相對於基板20轉動提供最大的旋轉力矩,從而提高晶粒10與基板20之間的自對準能力,
進而提高晶粒10與基板20的封裝精度,在一定程度上亦可擴展晶粒10的封裝使用場景。
The
晶粒10為晶圓經過減薄切割後沒有進行封裝的單顆裸晶片,例如發光二極體晶粒10。基板20的材質為環氧樹脂敷銅電路板(PCB)、聚醯亞胺(PI)敷銅電路板、柔性電路板(FPC)或聚對苯二甲酸乙二醇酯(PET)電路板。第一焊接部30與第二焊接部40均為固化後的錫、銀、銦或錫合金。例如,第一焊接部30與第二焊接部40的材質均為錫。
The die 10 is a single bare chip that has not been packaged after the wafer has been thinned and cut, such as a light-emitting diode die 10. The material of the
請參見圖2與圖3,晶粒10為方形結構。第一焊盤50為複數個,例如13個,在複數個第一焊盤50中,其中一個第一焊盤50位於晶粒10的中心區域,剩餘的複數個第一焊盤50圍設於位於晶粒10的中心區域的第一焊盤50的周側,其中,位於晶粒10的中心區域的第一焊盤50的底面面積較大,而剩餘的複數個第一焊盤50的底面面積均相等。
Please refer to FIG. 2 and FIG. 3 , the die 10 is a square structure. There are a plurality of
第一焊盤50的材質為金、銅、銀、鋁及錫中的一種。如此,能夠保證第一焊盤50的導電性能與連接效果。
The material of the
在本實施例中,第一輔助焊盤60為四個,且分別設於晶粒10的四個角落處。如此,第一輔助焊盤60在晶粒10上的分佈較為均勻,焊料熔化時能夠為晶粒10相對於基板20轉動提供較為一致的作用力。
In this embodiment, there are four first
第一輔助焊盤60的材質為金、銅、銀、鋁及錫中的一種。如此,能夠保證第一輔助焊盤60的導電性能與連接效果。
The material of the first
第一焊盤50與第一輔助焊盤60相對於晶粒10表面的高度相等。如此,能夠保證焊接後晶粒10表面的平面度。
The
第一焊盤50與第一輔助焊盤60的材質相同。如此,能夠在晶粒10上同時製作第一焊盤50與第一輔助焊盤60,第一焊盤50與第一輔助焊盤60的製作耗時短,效率高。
The
第一輔助焊盤60的形狀為矩形。第一輔助焊盤60的面積L1與第一焊盤50的面積L2的比值範圍為0.01-5。如此,能夠確保輔助焊盤面積提供足夠的旋轉力矩,但又不會過大而佔用晶粒10表面空間。
The shape of the first
請參見圖4,第一輔助焊盤60的形狀為長條形,其中位於晶粒10的對角方向上的兩個相對角落的至少兩個第一輔助焊盤60的重心O3與位於晶粒10的中心區域的第一焊盤50的重心O1均在一條直線上。例如,位於晶粒10的對角方向上的兩個相對角落的第一輔助焊盤60為兩個。如此,能夠使得焊接時晶粒10角落處的第一輔助焊盤60可以提供最大的旋轉力矩。
Please refer to FIG. 4 , the first
第一焊盤50與第一輔助焊盤60之間的最小間距值為A,第一焊盤50為複數個,複數個第一焊盤50中任意兩個第一焊盤50之間的間距值為B,A與B的比值範圍為0.1-3。如此,能夠保證在焊接過程中第一焊盤50與第一輔助焊盤60不會因焊料熔化而導通,從而防止晶粒10內部發生短路或是對自對準效果有不良影響。
The minimum spacing value between the
請參見圖5,第一輔助焊盤60的形狀為圓形,為了避免晶粒10上的元件發生短路,第一輔助焊盤60與晶粒10邊緣之間的距離S1的範圍為小於或等於3mm。當第一輔助焊盤60與晶粒10邊緣之間的距離S1大於3mm時,會無法將輔助焊盤產生的旋轉力矩最大化。另外,第一輔助焊盤60與晶粒10的邊緣存在的間隙小於或等於3mm時,晶粒10切割時邊緣的第一輔助焊盤60也不容易被剝離。
Please refer to Figure 5. The shape of the first
請參見圖2與圖6,圖6所示基板20為圖1中基板20的部分結構,該部分結構為方形且與晶粒10對應設置。在圖6所示的基板20中,第二焊盤70為複數個,例如13個,其中一個第二焊盤70位於基板20的中心區域,剩餘的第二焊盤70圍設於位於基板20的中心區域的第二焊盤70的周側,其中,位於基板20的中心區域的第二焊盤70的底面面積較大,而剩餘的第二焊盤70的底面面積均相等。
Please refer to FIG. 2 and FIG. 6. The
第二焊盤70的材質為金、銅、銀、鋁及錫中的一種。如此,能夠保證第二焊盤70的導電性能與連接效果。
The material of the
在本實施例中,第二輔助焊盤80為四個,且分別設於基板20的四個的角落處。如此,第二輔助焊盤80在基板20上的分佈較為均勻,以分別對位於四個第一輔助焊盤60。
In this embodiment, there are four second
第二輔助焊盤80的材質為金、銅、銀、鋁及錫中的一種。如此,能夠保證第二輔助焊盤80的導電性能與連接效果。
The material of the second
第二焊盤70與第二輔助焊盤80相對於基板20表面的高度相等。如此,能夠保證焊接後基板20表面的平面度。
The
第二焊盤70與第二輔助焊盤80的材質相同。如此,能夠在基板20上同時製作第二焊盤70與第二輔助焊盤80,第二焊盤70與第二輔助焊盤80的製作耗時短,效率高。
The
第二輔助焊盤80設於基板20上的第二預設位置21,第二預設位置21與圖2中的第一預設位置11對應設置。
The second
在本實施例中,第二輔助焊盤80的形狀為矩形。第二輔助焊盤80的面積L3與第二焊盤70的面積L4的比值範圍為0.01-5。如此,能夠確保輔助焊盤面積提供足夠的旋轉力矩,但又不會過大而佔用晶粒10表面空間。
In this embodiment, the shape of the second
請參見圖7,第二輔助焊盤80的形狀為長條形,其中位於基板20的對角方向上的兩個相對的角落的至少兩個第二輔助焊盤80的重心O4與位於基板20的中心區域的第二焊盤70的重心O2均在一條直線上。例如,位於基板20的對角方向上的兩個相對的角落的第二輔助焊盤80為兩個。如此,能夠使得焊接時晶粒10的角落處具有最大的旋轉力矩。
Please refer to FIG. 7 , the second
第二焊盤70與第二輔助焊盤80之間的最小間距值為C,第二焊盤70為複數個,複數個第二焊盤70中任意兩個第二焊盤70之間的間距值為D,C與D的比
值範圍為0.1-3。如此,能夠保證在焊接過程中第二焊盤70與第二輔助焊盤80不會因焊料熔化而導通,從而防止基板20內部發生短路或是對自對準效果有不良影響。
The minimum spacing between the
請參見圖8,第二輔助焊盤80的形狀為圓形,為了避免基板20上的元件發生短路,第二輔助焊盤80與基板20邊緣之間的距離S2的範圍為小於或等於3mm。當第二輔助焊盤80與基板20邊緣之間的距離S2大於3mm時,會使得第二焊盤70與第二輔助焊盤80之間的間距過小,容易在焊接時使第二焊盤70與第二輔助焊盤80之間因焊料熔化導通而發生短路。另外,第二輔助焊盤80與基板20邊緣存在的間隙小於或等於3mm時,基板20切割時邊緣的第二輔助焊盤80不容易被剝離。
Please refer to FIG8 . The second
第一輔助焊盤60(如圖3所示)的形狀與第二輔助焊盤80(如圖6所示)的形狀相同。如此,第一輔助焊盤60與第二輔助焊盤80的接觸面積較大,能夠保證第一輔助焊盤60與第二輔助焊盤80完全貼合在一起。
The shape of the first auxiliary pad 60 (as shown in FIG. 3 ) is the same as the shape of the second auxiliary pad 80 (as shown in FIG. 6 ). In this way, the contact area between the first
第一焊盤50(如圖3所示)的形狀與第二焊盤70(如圖6所示)的形狀相同,如此,第一焊盤50與第二焊盤70的接觸面積較大,能夠保證第一焊盤50與第二焊盤70完全貼合在一起。
The shape of the first pad 50 (as shown in FIG. 3 ) is the same as the shape of the second pad 70 (as shown in FIG. 6 ). Thus, the contact area between the
在一些實施例中,第一輔助焊盤60可以不與晶粒10內的電路電連接,第二輔助焊盤80可以不與基板20內的電路電連接。在一些實施例中,第一輔助焊盤60亦可作為晶粒10的一個線路接點,第二輔助焊盤80亦可作為基板20的一個線路接點。
In some embodiments, the first
請參見圖9,本發明實施例還提供了一種封裝結構100的製備方法,包括以下步驟:
Please refer to Figure 9. The embodiment of the present invention also provides a method for preparing a
S210,蝕刻晶粒10以於晶粒10上形成第一焊盤50及與第一焊盤50間隔設置的第一輔助焊盤60,其中第一輔助焊盤60形成於晶粒10上的第一預設位置
11,與晶粒10上除了第一預設位置11外的其他位置(例如圖3中舉例示出的其他位置12)相比,第一預設位置11與晶粒10的重心O1之間的距離最長。
S210, etching the die 10 to form a
其中,基板20的材質為環氧樹脂敷銅電路板(PCB)、聚醯亞胺(PI)敷銅電路板、柔性電路板(FPC)或聚對苯二甲酸乙二醇酯(PET)電路板。晶粒10為晶圓經過減薄切割後沒有進行封裝的單顆裸晶片,例如發光二極體晶粒10。焊料為錫膏、銀漿、銦或錫合金,在本實施例中,焊料為錫膏。
The
在一些實施例中,第一焊盤50與第一輔助焊盤60為同時蝕刻形成。
In some embodiments, the
S220,蝕刻基板20以於基板20上形成第二焊盤70及與第二焊盤70間隔設置的第二輔助焊盤80;在一些實施例中,第二焊盤70與第二輔助焊盤80為同時蝕刻形成。
S220, etching the
在一些實施例中,步驟S210與步驟S220的順序可以調換。 In some embodiments, the order of step S210 and step S220 can be swapped.
S230,塗覆焊料於第二焊盤70及第二輔助焊盤80上。
S230, coating solder on the
其中,焊料的厚度可根據實際需要設置。 Among them, the thickness of the solder can be set according to actual needs.
在一些實施例中,所述方法還包括塗覆焊料於第一焊盤50及第一輔助焊盤60上。
In some embodiments, the method further includes coating solder on the
S240,將晶粒10蓋設於基板20,並使第一焊盤50對位於第二焊盤70且貼附於第二焊盤70上的焊料,以及使第一輔助焊盤60對位於第二輔助焊盤80且貼附於第二輔助焊盤80上的焊料。
S240, the
S250,加熱焊料以使第一焊盤50與第二焊盤70之間的焊料熔化,並使第一輔助焊盤60與第二輔助焊盤80之間的焊料熔化,熔化的焊料能夠作用於第一焊盤50與第一輔助焊盤60以帶動晶粒10相對於基板20轉動,直至第一焊盤50對準於第二焊盤70。
S250, heating the solder to melt the solder between the
其中,第一焊盤50對準於第二焊盤70時,第一輔助焊盤60也對準於第二輔助焊盤80。
When the
其中,第一焊盤50與第二焊盤70之間的焊料熔化後會冷卻,並形成連接第一焊盤50與第二焊盤70的第一焊接部30;第一輔助焊盤60與第二輔助焊盤80之間的焊料熔化會冷卻,並形成連接第一輔助焊盤60與第二輔助焊盤80的第二焊接部40,第一焊接部30與第二焊接部40的材質相同。
Among them, the solder between the
上述的封裝結構100的製備方法,先藉由蝕刻晶粒10以於晶粒10上形成第一焊盤50及與第一焊盤50間隔設置的第一輔助焊盤60;然後蝕刻基板20以於基板20上形成第二焊盤70及與第二焊盤70間隔設置的第二輔助焊盤80;接著塗覆焊料於第二焊盤70及第二輔助焊盤80上;之後將晶粒10蓋設於基板20,並使第一焊盤50對位於第二焊盤70且貼附於第二焊盤70上的焊料,以及使第一輔助焊盤60對位於第二輔助焊盤80且貼附於第二輔助焊盤80上的焊料;最後加熱焊料以使第一焊盤50與第二焊盤70之間的焊料熔化,並使第一輔助焊盤60與第二輔助焊盤80之間的焊料熔化,熔化的焊料能夠作用於第一焊盤50與第一輔助焊盤60以帶動晶粒10相對於基板20轉動,直至第一焊盤50對準於第二焊盤70。由於第一輔助焊盤60設於晶粒10上的第一預設位置11,且與晶粒10上除了第一預設位置11外的其他位置相比,第一預設位置11與晶粒10的重心之間的距離最長,故,位於第一預設位置11的第一輔助焊盤60能夠為晶粒10相對於基板20轉動提供最大的旋轉力矩,從而提高晶粒10與基板20之間的自對準能力,進而提高晶粒10與基板20的封裝精度,在一定程度上亦可擴展晶粒10的封裝使用場景。
The preparation method of the
最後應說明的係,以上實施例僅用以說明本發明的技術方案而非限制,儘管參照較佳實施例對本發明進行了詳細說明,本領域的普通技術人員應當理解,可對本發明的技術方案進行修改或等同替換,而不脫離本發明技術方案的精神與範圍。 Finally, it should be noted that the above embodiments are only used to illustrate the technical solution of the present invention rather than to limit it. Although the present invention is described in detail with reference to the preferred embodiments, ordinary technicians in this field should understand that the technical solution of the present invention can be modified or replaced by equivalents without departing from the spirit and scope of the technical solution of the present invention.
10:晶粒 10: Grain
11:第一預設位置 11: First default position
12:其他位置 12: Other locations
50:第一焊盤 50: First pad
60:第一輔助焊盤 60: First auxiliary pad
O1:重心 O 1 : Center of gravity
Claims (11)
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