TWI873083B - A catalyst and a process for the production of ethylenically unsaturated carboxylic acids or esters - Google Patents
A catalyst and a process for the production of ethylenically unsaturated carboxylic acids or esters Download PDFInfo
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本發明係關於經改質之二氧化矽催化劑載體、合併經改質二氧化矽載體的催化劑及一種製造乙烯性不飽和羧酸或酯,尤其α,β不飽和羧酸或酯,更尤其丙烯酸或酯,諸如(烷基)丙烯酸或(烷基)丙烯酸烷酯,尤其(甲基)丙烯酸或(甲基)丙烯酸烷基酯,諸如甲基丙烯酸(MA)及甲基丙烯酸甲酯(MMA)的方法,其藉由使羧酸或酯與甲醛或其來源(諸如二甲氧甲烷)在該等催化劑存在下縮合,尤其藉由使丙酸或其烷基酯(諸如丙酸甲酯)與甲醛或其來源在該等經改質二氧化矽載體催化金屬催化劑存在下縮合。本發明因此尤其與甲基丙烯酸(MAA)及甲基丙烯酸甲酯(MMA)之製造有關。 The present invention relates to a modified silica catalyst carrier, a catalyst incorporating a modified silica carrier and a method for producing ethylenically unsaturated carboxylic acids or esters, especially α,β unsaturated carboxylic acids or esters, more especially acrylic acids or esters, such as (alkyl)acrylic acids or (alkyl)acrylic acid alkyl esters, especially (meth)acrylic acids or (meth)acrylic acid alkyl esters, such as methacrylic acid (MA) and methyl methacrylate (MMA), by condensing the carboxylic acids or esters with formaldehyde or a source thereof, such as dimethoxymethane, in the presence of such catalysts, especially by condensing propionic acid or its alkyl esters, such as methyl propionate, with formaldehyde or a source thereof in the presence of such modified silica carrier catalytic metal catalysts. The present invention is therefore particularly relevant to the production of methacrylic acid (MAA) and methyl methacrylate (MMA).
如上所述,該等不飽和酸或酯可藉由羧酸或酯之反應製得且適合之羧酸或酯係式R3-CH2-COOR4之烷酸(或酯),其中R3及R4各自獨立地為丙烯酸化合物之技術中已知之適合取代基,諸如氫或烷基,尤其含有例如1至4個碳原子之低碳烷基。因此,舉例而言,甲基丙烯酸或其烷基酯,尤其甲基丙烯酸甲酯可藉由丙酸或對應烷基酯(例如丙酸甲酯)與作為亞甲基源之甲醛根據反應序次1之催化反應來製得。 As mentioned above, the unsaturated acids or esters can be prepared by the reaction of carboxylic acids or esters and suitable carboxylic acids or esters are alkanoic acids (or esters) of the formula R3 - CH2 - COOR4 , wherein R3 and R4 are each independently a suitable substituent known in the art of acrylic acid compounds, such as hydrogen or an alkyl group, especially a lower alkyl group containing, for example, 1 to 4 carbon atoms. Thus, for example, methacrylic acid or its alkyl esters, especially methyl methacrylate, can be prepared by the catalytic reaction of propionic acid or the corresponding alkyl ester (e.g. methyl propionate) with formaldehyde as a methylene source according to reaction sequence 1.
R3-CH2-COOR4+HCHO------->R3-CH(CH2OH)-COOR4 R 3 -CH 2 -COOR 4 +HCHO------->R 3 -CH(CH 2 OH)-COOR 4
及 and
R3-CH(CH2OH)-COOR4------->R3-C(:CH2)-COOR4+H2O R 3 -CH(CH 2 OH)-COOR 4 ------->R 3 -C(:CH 2 )-COOR 4 +H 2 O
序次1 Sequence 1
反應序次1之一實例為反應序次2 An example of reaction sequence 1 is reaction sequence 2
CH3-CH2-COOR4+HCHO------->CH3-CH(CH2OH)-COOR4n CH 3 -CH 2 -COOR 4 +HCHO------->CH 3 -CH(CH 2 OH)-COOR 4 n
CH3-CH(CH2OH)-COOR4------->CH3-C(:CH2)-COOR4+H2O CH 3 -CH(CH 2 OH)-COOR 4 ------->CH 3 -C(:CH 2 )-COOR 4 +H 2 O
序次2 Sequence 2
上文反應序次典型地在高溫,通常在250-400℃範圍內之高溫下使用酸/鹼催化劑進行。在所需產物係酯之情況下,反應典型地在相關醇存在下進行以便經由酯水解使對應酸之形成減到最少。此外,為方便起見,常常需要引入甲醛,其呈甲醛與甲醇之錯合物形式。因此,為製造甲基丙烯酸甲酯,饋送至催化劑之反應混合物一般將由丙酸甲酯、甲醇、甲醛及水組成。 The above reaction sequence is typically carried out at high temperature, usually in the range of 250-400°C, using an acid/base catalyst. In the case where the desired product is an ester, the reaction is typically carried out in the presence of the relevant alcohol in order to minimize the formation of the corresponding acid by ester hydrolysis. In addition, for convenience, it is often necessary to introduce formaldehyde in the form of a complex of formaldehyde and methanol. Therefore, for the production of methyl methacrylate, the reaction mixture fed to the catalyst will generally consist of methyl propionate, methanol, formaldehyde and water.
MMA之已知製造方法為使用甲醛將丙酸甲酯(MEP)催化轉化為MMA。用於此之已知催化劑為併入載體(例如二氧化矽)之銫催化劑。 The known method for producing MMA is to use formaldehyde to catalytically convert methyl propionate (MEP) into MMA. The known catalyst used for this is a cesium catalyst incorporated into a carrier such as silicon dioxide.
WO1999/52628揭示用於藉由縮合丙酸或對應烷基酯製造α,β不飽和羧酸或酯之催化劑,其中該催化劑包含浸漬有至少一種改質劑元素之摻雜鹼金屬之二氧化矽,其中該改質劑元素係選自由以下組成之群:硼、鋁、鎂、鋯及鉿,較佳鋯及/或鋁及/或硼且鹼金屬選自鉀、銣或銫,較佳銫。 WO1999/52628 discloses a catalyst for producing α,β unsaturated carboxylic acids or esters by condensing propionic acid or the corresponding alkyl esters, wherein the catalyst comprises alkali metal-doped silicon dioxide impregnated with at least one modifier element, wherein the modifier element is selected from the group consisting of boron, aluminum, magnesium, zirconium and bismuth, preferably zirconium and/or aluminum and/or boron, and the alkali metal is selected from potassium, bismuth or caesium, preferably caesium.
WO2003/026795揭示用於醇醛縮合(包括藉由縮合丙酸或丙酸酯製造α,β不飽和羧酸)、烯烴聚合、脫水、羥基化及異構化之催化劑,其中該催化劑包含浸漬有催化金屬之二氧化矽-金屬水凝膠,其中水凝膠之金屬係選自 由以下組成之群:鋯、鈦、鋁及鐵,較佳鋯,且催化金屬係選自由以下組成之群:鹼金屬及鹼土金屬,較佳銫。 WO2003/026795 discloses a catalyst for aldol condensation (including the production of α,β unsaturated carboxylic acids by condensing propionic acid or propionic acid esters), olefin polymerization, dehydration, hydroxylation and isomerization, wherein the catalyst comprises a silica-metal hydrogel impregnated with a catalytic metal, wherein the metal of the hydrogel is selected from the group consisting of zirconium, titanium, aluminum and iron, preferably zirconium, and the catalytic metal is selected from the group consisting of alkali metals and alkaline earth metals, preferably cesium.
本發明人現已發現,當至少一定比例之改質劑金屬併入或存在於呈具有總計至多兩種鋯及/或鉿原子之金屬物種形式之載體中時,包含某些金屬改質之二氧化矽載體且含有催化金屬之催化劑在亞甲基源(諸如甲醛)與羧酸或烷基酯(諸如丙酸甲酯)之縮合中提供高水準之選擇性。 The inventors have now discovered that catalysts comprising certain metal-modified silica supports and containing catalytic metals provide high levels of selectivity in the condensation of methylene sources such as formaldehyde and carboxylic acids or alkyl esters such as methyl propionate when at least a certain proportion of the modifier metal is incorporated into or present in a support in the form of a metal species having a total of up to two zirconium and/or bismuth atoms.
自Yung-Jin Hu等人,J.Am.Chem.Soc.第135卷,2013,第14240頁已知,鋯能夠在溶液中形成大團簇。Zr-18團簇係典型的。 It is known from Yung-Jin Hu et al., J.Am.Chem.Soc. Vol. 135, 2013, p. 14240 that zirconium can form large clusters in solution. Zr-18 clusters are typical.
然而,本發明人已意外地發現,當經改質二氧化矽載體包含在改質開始時衍生自單體及/或二聚改質劑金屬陽離子源(諸如其化合物)之氧化鋯及/或氧化鉿部分,而非該等較大團簇時,已發現催化金屬與經改質載體之結合的改善及其後對藉由對應酸或酯與亞甲基源(諸如甲醛)之縮合製造不飽和羧酸或酯的較高選擇性。此外,本發明人已發現,提供此等高選擇性之經改質二氧化矽載體在沈積/吸附於二氧化矽之表面上之後含有單體或二聚改質劑金屬原子。 However, the inventors have surprisingly discovered that when the modified silica support contains zirconia and/or bismuth oxide moieties derived from monomeric and/or dimeric modifier metal cation sources (such as compounds thereof) at the beginning of the modification, rather than such larger clusters, an improvement in the binding of the catalytic metal to the modified support and a subsequent higher selectivity for the production of unsaturated carboxylic acids or esters by condensation of the corresponding acids or esters with a methylene source (such as formaldehyde) has been found. In addition, the inventors have discovered that the modified silica support that provides such high selectivity contains monomeric or dimeric modifier metal atoms after deposition/adsorption on the surface of the silica.
又另外,本發明人已發現,當使用該等經改質二氧化矽載體時,已發現催化劑表面燒結速率遲延且在縮合反應期間發生催化反應之表面區域之損失減少。 Still further, the inventors have discovered that when such modified silica supports are used, the catalyst surface sintering rate has been found to be retarded and the loss of surface area where catalytic reactions occur during the condensation reaction is reduced.
因此,包含該等經改質二氧化矽載體且含有催化金屬之催化劑係顯著有效之催化劑,其用於藉由對應酸或酯與亞甲基源(諸如甲醛)之縮合製造α,β乙烯性不飽和羧酸或酯,其提供數種優勢,諸如高水準之選擇性及/或減少之催化劑表面之燒結。 Therefore, catalysts comprising such modified silica supports and containing catalytic metals are remarkably effective catalysts for the production of α,β ethylenically unsaturated carboxylic acids or esters by condensation of the corresponding acids or esters with a methylene source such as formaldehyde, which offer several advantages such as high levels of selectivity and/or reduced sintering of the catalyst surface.
因此,根據本發明之第一態樣,提供催化劑,其包含經改質二氧化矽載體,包含改質劑金屬之經改質二氧化矽載體;及位於經改質二氧化矽載體上之催化金屬,其中該改質劑金屬選自鋯及/或鉿中之一或多者,其特徵在於至少一定比例,典型地至少25%之該改質劑金屬呈具有總計至多2種改質劑金屬原子之改質劑金屬部分的形式存在。 Therefore, according to a first aspect of the present invention, a catalyst is provided, which comprises a modified silica carrier, a modified silica carrier comprising a modifier metal; and a catalytic metal located on the modified silica carrier, wherein the modifier metal is selected from one or more of zirconium and/or arsenic, and is characterized in that at least a certain proportion, typically at least 25%, of the modifier metal is present in the form of a modifier metal portion having a total of at most 2 modifier metal atoms.
根據本發明之另一態樣,提供催化劑,其包含經改質二氧化矽載體,包含改質劑金屬之經改質二氧化矽載體;及位於經改質二氧化矽載體上之催化金屬,其中該改質劑金屬選自鋯及/或鉿中之一或多者,其特徵在於至少一定比例,典型地至少25%之該改質劑金屬呈衍生自單體及/或二聚改質劑金屬陽離子源之改質劑金屬部分的形式存在。 According to another aspect of the present invention, a catalyst is provided, which comprises a modified silica carrier, a modified silica carrier comprising a modifier metal; and a catalytic metal located on the modified silica carrier, wherein the modifier metal is selected from one or more of zirconium and/or arsenic, and is characterized in that at least a certain proportion, typically at least 25%, of the modifier metal is present in the form of a modifier metal portion derived from a monomeric and/or dimerized modifier metal cation source.
單體及/或二聚改質劑金屬作為單體及/或二聚鋯或鉿改質劑金屬陽離子源(諸如其化合物)在溶液中接觸二氧化矽載體以使該改質劑金屬吸附於載體上從而形成改質劑金屬部分。適合來源可為呈溶解狀態之改質劑金屬之錯合物,更典型地配位體錯合物。 A monomeric and/or dimeric modifier metal is contacted with a silica support in solution as a source of monomeric and/or dimeric zirconium or ebonite modifier metal cations (such as a compound thereof) to adsorb the modifier metal on the support to form a modifier metal moiety. A suitable source may be a complex of the modifier metal in a dissolved state, more typically a ligand complex.
根據本發明之第二態樣,提供用於催化劑之經改質二氧化矽載體,其包含二氧化矽載體及改質劑金屬其中該改質劑金屬選自鋯及/或鉿中之一或多者,其特徵在於至少一定比例,典型地至少25%之該改質劑金屬呈具有總計至 多2種改質劑金屬原子之改質劑金屬部分的形式存在。 According to a second aspect of the present invention, a modified silica carrier for a catalyst is provided, comprising a silica carrier and a modifier metal, wherein the modifier metal is selected from one or more of zirconium and/or arsenic, and is characterized in that at least a certain proportion, typically at least 25%, of the modifier metal is present in the form of a modifier metal portion having a total of at most 2 modifier metal atoms.
根據本發明之第三態樣,提供用於催化劑之經改質二氧化矽載體,其包含二氧化矽載體及改質劑金屬其中該改質劑金屬選自鋯及/或鉿中之一或多者,其特徵在於至少一定比例,典型地至少25%之該改質劑金屬呈在改質開始時衍生自單體及/或二聚改質劑金屬陽離子源之改質劑金屬部分的形式存在。 According to a third aspect of the present invention, a modified silica carrier for a catalyst is provided, comprising a silica carrier and a modifier metal, wherein the modifier metal is selected from one or more of zirconium and/or arsenic, and is characterized in that at least a certain proportion, typically at least 25%, of the modifier metal is present in the form of a modifier metal portion derived from a monomeric and/or dimerized modifier metal cation source at the beginning of the modification.
本文中之經改質二氧化矽載體係藉由改質劑金屬改質。典型地,改質劑金屬係吸附於二氧化矽載體表面上之被吸附物。被吸附物可化學吸附或物理吸附於二氧化矽載體表面上,典型地其化學吸附於其上。改質劑金屬部分一般為改質劑金屬氧化物部分。 The modified silica carrier herein is modified by a modifier metal. Typically, the modifier metal is an adsorbate adsorbed on the surface of the silica carrier. The adsorbate can be chemically adsorbed or physically adsorbed on the surface of the silica carrier, typically it is chemically adsorbed thereon. The modifier metal portion is generally a modifier metal oxide portion.
二氧化矽載體一般呈矽膠形式,更典型地呈乾凝膠或水凝膠形式。 The silica carrier is generally in the form of a silica gel, more typically in the form of a xerogel or a hydrogel.
典型地,改質劑金屬吸附於矽膠載體表面上。因此,典型地,該改質劑金屬呈金屬氧化物部分形式存在於經改質二氧化矽凝膠載體表面上。 Typically, the modifier metal is adsorbed on the surface of the silica support. Thus, typically, the modifier metal is present as a metal oxide moiety on the surface of the modified silica gel support.
可替代地,改質劑金屬可以共凝膠形式存在於載體中。在此類情況下,經改質二氧化矽載體為二氧化矽-金屬氧化物凝膠,其典型地包含氧化鋯及/或氧化鉿部分。 Alternatively, the modifier metal may be present in the carrier in the form of a co-gel. In such cases, the modified silica carrier is a silica-metal oxide gel, which typically contains zirconia and/or einsteinium oxide moieties.
典型地,改質劑金屬以減少燒結及改善催化劑選擇性之有效量存在於經改質二氧化矽載體中。典型地,經改質二氧化矽載體中之至少30%、諸如至少35%、更佳至少40%、諸如至少45%,最適當地至少50%、諸如至少55%、例如至少60%或65%、且最佳至少70%,諸如至少75%或80%、更典型地至少85%、最典型地至少90%、尤其至少95%之改質劑金屬呈具有總計1及/或2 種金屬原子之部分形式,尤其呈具有總計1種金屬原子之部分形式或在經改質二氧化矽形成開始時以該等含量衍生自單體及/或二聚金屬化合物。 Typically, the modifier metal is present in the modified silica support in an effective amount to reduce sintering and improve catalyst selectivity. Typically, at least 30%, such as at least 35%, more preferably at least 40%, such as at least 45%, most suitably at least 50 %, such as at least 55%, for example at least 60% or 65%, and most preferably at least 70%, such as at least 75% or 80%, more typically at least 85%, most typically at least 90%, especially at least 95% of the modifier metal in the modified silica support is in the form of a moiety with a total of 1 and/or 2 metal atoms, especially in the form of a moiety with a total of 1 metal atom or is derived from monomeric and/or dimeric metal compounds at such contents at the beginning of the formation of the modified silica.
為避免疑問,具有總計1種金屬原子之改質劑金屬部分考慮為單體的且具有總計2種金屬原子之改質劑金屬部分為二聚的。在尤其較佳之具體實例中,諸如至少35%、更佳至少40%、諸如至少45%,最適當地至少50%、諸如至少55%、例如至少60%或65%、且最佳至少70%,諸如至少75%或80%、更典型地至少85%、最典型地至少90%、尤其至少95%之改質劑金屬呈單體金屬部分存在,或在任何情況下典型地在改質開始時衍生自具有該等水準之改質劑金屬作為單體化合物之鋯及/或鉿化合物。一般而言,二氧化矽上之改質劑金屬部分係改質劑金屬氧化物部分。 For the avoidance of doubt, modifier metal moieties having a total of 1 metal atom are considered to be monomeric and modifier metal moieties having a total of 2 metal atoms are dimeric. In particularly preferred embodiments, at least 35%, more preferably at least 40%, such as at least 45%, most suitably at least 50 %, such as at least 55%, for example at least 60% or 65%, and most preferably at least 70%, such as at least 75% or 80%, more typically at least 85%, most typically at least 90%, especially at least 95% of the modifier metal is present as a monomeric metal moiety, or in any case is typically derived from a zirconium and/or bismuth compound having such levels of modifier metal as a monomeric compound at the start of modification. Generally speaking, the modifier metal moiety on silicon dioxide is a modifier metal oxide moiety.
意外地發現分散於整個載體(諸如水凝膠載體)中之大於2種金屬原子之鋯及/或鉿之團簇降低對藉由對應酸或酯與亞甲基源(諸如甲醛)之縮合製造α,β乙烯性不飽和羧酸或酯的反應選擇性。亦意外地發現,該等大團簇相對於具有2種或1種金屬原子之改質劑金屬之團簇增加經改質二氧化矽顆粒之燒結,從而在活性變得難以接受地低之前減少降低強度且減少催化劑壽命之表面區域。另外,視改質劑金屬團簇之性質而定,選擇性常常較低。 Clusters of zirconium and/or arsenic larger than 2 metal atoms dispersed throughout a support such as a hydrogel support have been unexpectedly found to reduce the selectivity of the reaction to produce α,β ethylenically unsaturated carboxylic acids or esters by condensation of the corresponding acid or ester with a methylene source such as formaldehyde. It has also been unexpectedly found that such large clusters increase sintering of the modified silica particles relative to clusters of the modifier metal having 2 or 1 metal atoms, thereby reducing the surface area that reduces strength and reduces catalyst life before activity becomes unacceptably low. Additionally, selectivity is often lower depending on the nature of the modifier metal clusters.
典型地,改質劑金屬以實質上均質之方式分散於整個載體中。 Typically, the modifier metal is dispersed in a substantially homogeneous manner throughout the carrier.
典型地,經改質二氧化矽載體為乾凝膠。凝膠亦可為水凝膠或氣凝膠。 Typically, the modified silica carrier is a xerogel. The gel can also be a hydrogel or an aerogel.
凝膠亦可為二氧化矽-氧化鋯及或二氧化矽-氧化鉿共凝膠。矽膠可藉由熟習凝膠形成之技術者已知之各種技術中的任一者,諸如本文中所提及之技術形成。典型地,經改質二氧化矽凝膠係藉由適合之吸附反應製得。使相關金屬化合物(諸如鋯及/或鉿化合物)吸附於矽膠(諸如二氧化矽乾凝膠)以形成具有相關改質劑金屬部分之經改質二氧化矽凝膠為適合之技術。 The gel may also be a silica-zirconia and/or silica-bezobium co-gel. The silica gel may be formed by any of a variety of techniques known to those skilled in the art of gel formation, such as those mentioned herein. Typically, the modified silica gel is prepared by a suitable adsorption reaction. A suitable technique is to adsorb a relevant metal compound (such as a zirconium and/or bezobium compound) onto a silica gel (such as a silica dry gel) to form a modified silica gel having a relevant modifier metal portion.
用於製備二氧化矽凝膠之方法為此項技術中所熟知且一些該等方法描述於The Chemistry of Silica:Solubility,Polymerisation,Colloid and Surface Properties and Biochemistry of Silica,Ralph K Iler編,1979,John Wiley and Sons Inc.,ISBN 0-471-02404-X及其中的參考文獻中。 Methods for preparing silica gels are well known in the art and some of these methods are described in The Chemistry of Silica: Solubility, Polymerisation, Colloid and Surface Properties and Biochemistry of Silica, Ralph K Iler, ed., 1979, John Wiley and Sons Inc., ISBN 0-471-02404-X and references therein.
用於製備二氧化矽-氧化鋯共凝膠之方法為此項技術中已知的且一些該等方法描述於US 5,069,816、Bosman等人見於J Catalysis第148卷(1994)第660頁中及Monros等人見於J Materials Science第28卷,(1993),第5832頁中。 Methods for preparing silica-zirconia cogels are known in the art and some of these methods are described in US 5,069,816, Bosman et al., J Catalysis, Vol. 148 (1994), p. 660, and Monros et al., J Materials Science, Vol. 28, (1993), p. 5832.
現將參考隨附實例及圖式描述本發明之具體實例,在圖式中:圖1展示經Zr改質之二氧化矽實施例5之HRTEM圖像;圖2展示經Zr改質之二氧化矽實施例7之HRTEM圖像;圖3展示經Zr改質之二氧化矽實施例14之HRTEM圖像;圖4展示經Zr改質之二氧化矽實施例15之HRTEM圖像;圖5展示經Zr改質之二氧化矽實施例17之HRTEM圖像;且圖6展示經Zr改質之二氧化矽實施例18之HRTEM圖像。 Specific examples of the present invention will now be described with reference to the accompanying examples and drawings, in which: FIG1 shows an HRTEM image of Zr-modified silicon dioxide Example 5; FIG2 shows an HRTEM image of Zr-modified silicon dioxide Example 7; FIG3 shows an HRTEM image of Zr-modified silicon dioxide Example 14; FIG4 shows an HRTEM image of Zr-modified silicon dioxide Example 15; FIG5 shows an HRTEM image of Zr-modified silicon dioxide Example 17; and FIG6 shows an HRTEM image of Zr-modified silicon dioxide Example 18.
圖7展示在實施例20至實施例74中製備之催化劑之MMA+MAA選擇性(%)相對於催化劑活性;圖8展示在實施例75至實施例79中製備之混合單體/三聚體催化劑之催化劑選擇性;且圖9展示如藉由實施例81中所描述之高級老化測試所測定之催化劑燒結常數。 FIG. 7 shows the MMA+MAA selectivity (%) relative to catalyst activity for the catalysts prepared in Examples 20 to 74; FIG. 8 shows the catalyst selectivity for the mixed monomer/trimer catalysts prepared in Examples 75 to 79; and FIG. 9 shows the catalyst sintering constants as determined by the advanced aging test described in Example 81.
在較佳具體實例中,經改質二氧化矽載體並非藉由共同膠凝形成,亦即並非藉由共同膠凝形成之二氧化矽-氧化鋯、二氧化矽-氧化鉿或二氧化矽-氧化鋯/氧化鉿,諸如藉由使矽酸鈉溶液與改質劑金屬錯合物在硫酸溶液中混合形成。 In preferred embodiments, the modified silica support is not formed by co-gelling, i.e., is not silica-zirconia, silica-bezoarsinia, or silica-zirconia/bezoarsinia formed by co-gelling, such as by mixing a sodium silicate solution with a modifier metal complex in a sulfuric acid solution.
在該等具體實例中,鋯及/或鉿典型地作為被吸附物合併於二氧化矽載體表面上。 In these embodiments, zirconium and/or einsteinium are typically incorporated as adsorbates on the surface of the silica support.
較佳地,根據本發明之任何態樣之經改質二氧化矽載體催化劑及經改質二氧化矽載體可實質上不含、可基本上不含或可完全不含氟。氟可由於不可避免之環境污染以痕量存在。藉由「實質上不含」,吾等意謂指代含有小於百萬分之1000份(ppm)氟之催化劑及載體。藉由「基本上不含」吾等意謂指代含有小於約100ppm氟之催化劑及載體且藉由「完全不含」吾等意謂指代含有小於十億分之200份(ppb)氟之催化劑。 Preferably, the modified silica carrier catalyst and modified silica carrier according to any aspect of the present invention may be substantially free, essentially free, or completely free of fluorine. Fluorine may be present in trace amounts due to unavoidable environmental contamination. By "substantially free", we mean catalysts and carriers containing less than 1000 parts per million (ppm) of fluorine. By "substantially free" we mean catalysts and carriers containing less than about 100 ppm of fluorine and by "completely free" we mean catalysts containing less than 200 parts per billion (ppb) of fluorine.
有利地,當至少一部分併入至本發明之上文態樣之經改質二氧化矽中的改質劑金屬在經改質二氧化矽形成開始時衍生自單體及/或二聚改質劑金屬陽離子源時,已發現在α,β乙烯性不飽和羧酸或酯製造期間,反應選擇性提高且/或催化劑表面之燒結速率降低。 Advantageously, when at least a portion of the modifier metal incorporated into the modified silica of the above aspects of the invention is derived from a source of monomeric and/or dimerized modifier metal cations at the beginning of the formation of the modified silica, it has been found that during the production of α,β ethylenically unsaturated carboxylic acids or esters, the reaction selectivity is increased and/or the sintering rate of the catalyst surface is reduced.
根據本發明之經改質二氧化矽載體中之金屬及金屬氧化物部分係關於鋯及/或鉿以及氧化鋯及/或氧化鉿,而非二氧化矽。 The metal and metal oxide components of the modified silicon dioxide carrier according to the present invention are related to zirconium and/or einsteinium and zirconium oxide and/or einsteinium oxide, rather than silicon dioxide.
較佳地,存在於經改質二氧化矽或催化劑中之改質劑金屬之含量可為至多7.6×10-2mol/mol二氧化矽、更佳至多5.9×10-2mol/mo1二氧化矽、最佳至多3.5×10-2mol/mol二氧化矽。典型地,該等金屬之含量在0.067×10-2與7.3×10-2mol/mol二氧化矽之間,更佳地在0.13×10-2與5.7×10-2mol/mol二氧化矽之間且最佳地在0.2×10-2與3.5×10-2mol/mol二氧化矽之間。典型地,所存在改質劑金屬之含量為至少0.1×10-2mol/mol二氧化矽、更佳地至少0.15×10-2 mol/mol二氧化矽及最佳至少0.25×10-2mol/mol二氧化矽。 Preferably, the content of the modifier metal present in the modified silica or catalyst may be up to 7.6× 10-2 mol/mol silica, more preferably up to 5.9× 10-2 mol/mol silica, and most preferably up to 3.5× 10-2 mol/mol silica. Typically, the content of these metals is between 0.067× 10-2 and 7.3× 10-2 mol/mol silica, more preferably between 0.13× 10-2 and 5.7× 10-2 mol/mol silica, and most preferably between 0.2× 10-2 and 3.5× 10-2 mol/mol silica. Typically, the modifier metal is present in an amount of at least 0.1 x 10-2 mol/mol silica, more preferably at least 0.15 x 10-2 mol/mol silica and most preferably at least 0.25 x 10-2 mol/mol silica.
較佳地,當鋯為改質劑金屬時,鋯金屬之含量可為經改質二氧化矽載體之至多10% w/w、更佳至多8% w/w、最佳至多5.5% w/w。典型地,鋯金屬之含量在經改質二氧化矽載體之0.1-10% w/w之間,更佳在0.2-8% w/w之間且最佳在0.3-5% w/w之間。典型地,鋯金屬之含量為經改質二氧化矽載體之至少0.5%w/w,諸如0.8%w/w,更典型地至少1.0% w/w,最典型地至少1.5%w/w。 Preferably, when zirconium is the modifier metal, the content of zirconium metal may be up to 10% w/w, more preferably up to 8% w/w, and most preferably up to 5.5% w/w of the modified silica carrier. Typically, the content of zirconium metal is between 0.1-10% w/w of the modified silica carrier, more preferably between 0.2-8% w/w and most preferably between 0.3-5% w/w. Typically, the content of zirconium metal is at least 0.5% w/w of the modified silica carrier, such as 0.8% w/w, more typically at least 1.0% w/w, and most typically at least 1.5% w/w.
較佳地,鉿金屬之含量可為經改質二氧化矽載體之至多20% w/w、更佳至多16% w/w、最佳至多10% w/w。典型地,鉿金屬之含量在經改質二氧化矽載體之0.2-20% w/w之間,更佳在0.4-16% w/w之間且最佳在0.6-10% w/w之間。典型地,鉿金屬之含量為經改質二氧化矽載體之至少1.0%w/w、更典型地2.0% w/w、最典型地至少3.0%w/w。 Preferably, the content of cobium metal may be up to 20% w/w, more preferably up to 16% w/w, and most preferably up to 10% w/w of the modified silica carrier. Typically, the content of cobium metal is between 0.2-20% w/w of the modified silica carrier, more preferably between 0.4-16% w/w and most preferably between 0.6-10% w/w. Typically, the content of cobium metal is at least 1.0% w/w, more typically 2.0% w/w, and most typically at least 3.0% w/w of the modified silica carrier.
二氧化矽-氧化鋯載體之二氧化矽組分可典型地形成經改質載體之86.5-99.9wt%,更典型地其89.2-99.7wt%、最典型地93.2-99.6wt%。 The silica component of the silica-zirconia carrier may typically form 86.5-99.9 wt % of the modified carrier, more typically 89.2-99.7 wt %, and most typically 93.2-99.6 wt %.
二氧化矽-氧化鉿載體之二氧化矽組分典型地形成經改質載體之76.4-99.8wt%、更典型地其81.1-99.5wt%、最典型地88.2-99.3wt%。 The silica component of the silica-arsenic oxide carrier typically forms 76.4-99.8 wt %, more typically 81.1-99.5 wt %, and most typically 88.2-99.3 wt % of the modified carrier.
藉由如本文所用之術語「至多2種金屬原子」或類似者意謂1及/或2種金屬原子。較佳地,根據本發明之任何態樣之經改質二氧化矽載體及催化劑包含金屬部分,典型地具有至多2種金屬原子及最佳1種金屬原子之金屬氧化物部分。因此,應瞭解,該等部分為單體或二聚金屬部分。 By the term "up to 2 metal atoms" or the like as used herein is meant 1 and/or 2 metal atoms. Preferably, the modified silica support and catalyst according to any aspect of the present invention comprises a metal moiety, typically a metal oxide moiety having up to 2 metal atoms and optimally 1 metal atom. It is therefore understood that such moieties are monomeric or dimeric metal moieties.
較佳地,催化金屬可為一或多種鹼金屬。催化金屬為除鋯或鉿以外之金屬。適合之鹼金屬可選自鉀、銣及銫,適當地銣及銫。銫為最佳之催化金屬。 Preferably, the catalytic metal may be one or more alkali metals. The catalytic metal is a metal other than zirconium or arsenic. Suitable alkali metals may be selected from potassium, arsenic and caesium, preferably arsenic and caesium. Caesium is the best catalytic metal.
適當地,諸如銫之催化金屬可呈至少1mol/100(矽+金屬(鋯 及/或鉿))mol、更佳地至少1.5mol/100(矽+金屬)mol、最佳地至少2mol/100(矽+金屬)mol之含量存在於催化劑中。催化金屬之含量可為催化劑中之至多10mol/100(矽+金屬)mol、更佳地至多7.5mol/100(矽+金屬)mol、最佳地催化劑中之至多5mol/100(矽+金屬)mol。 Suitably, the catalytic metal such as cesium may be present in the catalyst in an amount of at least 1 mol/100 (silicon + metal (zirconia and/or arsenic)) mol, more preferably at least 1.5 mol/100 (silicon + metal) mol, and most preferably at least 2 mol/100 (silicon + metal) mol. The amount of the catalytic metal may be at most 10 mol/100 (silicon + metal) mol in the catalyst, more preferably at most 7.5 mol/100 (silicon + metal) mol, and most preferably at most 5 mol/100 (silicon + metal) mol in the catalyst.
較佳地,催化金屬在催化劑中之含量在催化劑中之1-10mol/100(矽+金屬)mol、更佳地2-8mol/100(矽+金屬)mol、最佳地2.5-6mol/100(矽+金屬)mol範圍內。 Preferably, the content of the catalytic metal in the catalyst is in the range of 1-10 mol/100 (silicon + metal) mol, more preferably 2-8 mol/100 (silicon + metal) mol, and most preferably 2.5-6 mol/100 (silicon + metal) mol.
除非指明為相反的,否則催化劑中之鹼金屬量或鹼金屬係關於鹼金屬離子且並非鹽。 Unless otherwise indicated, the amount of alkali metal or alkali metal in the catalyst refers to the alkali metal ion and not the salt.
可替代地,催化劑可具有在催化劑中之1至22wt%、更佳地4至18wt%、最佳地5-13wt%範圍內之催化金屬的wt%。此等量將適用於全部鹼金屬,但尤其適用於銫。 Alternatively, the catalyst may have a wt% of the catalytic metal in the catalyst in the range of 1 to 22 wt%, more preferably 4 to 18 wt%, most preferably 5-13 wt%. Such amounts would apply to all alkali metals, but particularly to cesium.
催化劑可包含任何適合重量比之催化鹼金屬:鋯及/或鉿金屬。然而,典型地,銫:鋯之重量比在催化劑中在2:1至10:1、更佳2.5:1至9:1、最佳地3:1至8:1範圍內,銫:鉿之重量比在催化劑中在1:1至5:1、更佳1.25:1至4.5:1、最佳地1.5:1至4:1範圍內,銣:鋯之重量比在催化劑中在1.2:1至8:1、更佳1.5:1至6:1、最佳2:1至5:1範圍內,銣:鉿之重量比在催化劑中在0.6:1至4:1、更佳0.75:1至3:1、最佳1:1至2.5:1範圍內。因此,催化劑中之催化金屬:改質劑金屬莫耳比典型地為至少1.4或1.5:1,較佳地,其在1.4至2.7:1範圍內,諸如1.5至2.1:1,尤其1.5至2.0:1,典型地就此而言,改質劑金屬為鋯且催化金屬為銫。一般而言,本文中,催化金屬之量超過中和改質劑金屬所需之量。 The catalyst may comprise any suitable weight ratio of catalytic base metal: zirconium and/or cobalt metal. Typically, however, the weight ratio of cesium:zirconium in the catalyst is in the range of 2:1 to 10:1, more preferably 2.5:1 to 9:1, and most preferably 3:1 to 8:1, the weight ratio of cesium:arbium in the catalyst is in the range of 1:1 to 5:1, more preferably 1.25:1 to 4.5:1, and most preferably 1.5:1 to 4:1, the weight ratio of zirconium:zirconium in the catalyst is in the range of 1.2:1 to 8:1, more preferably 1.5:1 to 6:1, and most preferably 2:1 to 5:1, and the weight ratio of zirconium:arbium in the catalyst is in the range of 0.6:1 to 4:1, more preferably 0.75:1 to 3:1, and most preferably 1:1 to 2.5:1. Thus, the catalytic metal:modifier metal molar ratio in the catalyst is typically at least 1.4 or 1.5:1, preferably it is in the range of 1.4 to 2.7:1, such as 1.5 to 2.1:1, especially 1.5 to 2.0:1, typically in this regard, the modifier metal is zirconium and the catalytic metal is cesium. Generally speaking, the amount of catalytic metal in this context exceeds the amount required to neutralize the modifier metal.
較佳地,催化金屬在0.5-7.0mol/mol改質劑金屬、更佳地1.0-6.0mol/mol、最佳地1.5-5.0mol/mol改質劑金屬範圍內存在。 Preferably, the catalytic metal is present in the range of 0.5-7.0 mol/mol modifier metal, more preferably 1.0-6.0 mol/mol, and most preferably 1.5-5.0 mol/mol modifier metal.
適當地,催化金屬可藉由此項技術中已知之任何方法併入至經 改質二氧化矽載體中,諸如利用催化金屬進行浸漬、共同膠凝或氣相沈積。 Suitably, the catalytic metal may be incorporated into the modified silica support by any method known in the art, such as by impregnation, co-gelation or vapor deposition of the catalytic metal.
如本文所用之術語「浸漬」包括添加溶解於溶劑中之催化金屬以製備溶液,將該溶液添加於乾凝膠或氣凝膠,使得溶液吸收於該乾凝膠或氣凝膠內之空隙中。 As used herein, the term "impregnation" includes adding a catalytic metal dissolved in a solvent to prepare a solution, adding the solution to a xerogel or an aerogel, and allowing the solution to be absorbed into the voids within the xerogel or the aerogel.
典型地,本發明之催化劑可呈任何適合之形式。典型的具體實例呈離散粒子形式。典型地,在使用中,催化劑呈催化劑固定床形式。可替代地,催化劑可呈催化劑之流化床形式。另一替代方案為整體式反應器。 Typically, the catalyst of the present invention may be in any suitable form. A typical embodiment is in the form of discrete particles. Typically, in use, the catalyst is in the form of a fixed bed of catalyst. Alternatively, the catalyst may be in the form of a fluidized bed of catalyst. Another alternative is a monolithic reactor.
在催化劑呈固定床形式之情況下,期望將載體催化劑形成為藉由粒化或擠壓製備之顆粒、聚集體或塑形單元(例如球形、圓柱形、環形、鞍狀、星形、多瓣形),其典型地具有在1至10mm範圍內之最大及最小尺寸,更佳地具有大於2mm,諸如大於2.5或3mm之平均尺寸。催化劑呈其他形式亦為有效的,例如呈具有如所指示之相同尺寸之粉末或小珠粒形式。在使用呈流化床形式之催化劑情況下,期望催化劑顆粒具有在10-500gm、較佳20-200gm、最佳20-100gm範圍內之最大及最小尺寸。 In the case of a fixed bed of catalyst, it is desirable to form the supported catalyst into particles, aggregates or shaped units (e.g., spheres, cylinders, rings, saddles, stars, multi-petals) prepared by granulation or extrusion, typically having maximum and minimum dimensions in the range of 1 to 10 mm, more preferably having an average dimension greater than 2 mm, such as greater than 2.5 or 3 mm. The catalyst is also effective in other forms, such as in the form of powders or small beads of the same size as indicated. In the case of using a catalyst in the form of a fluidized bed, it is desirable that the catalyst particles have maximum and minimum dimensions in the range of 10-500 gm, preferably 20-200 gm, and most preferably 20-100 gm.
催化金屬在催化劑中之含量(以原子數/100個原子(矽+鋯及/或鉿)或wt%為單位)可藉由合適的取樣及取該等樣品之平均值來測定。典型地,將獲取特定催化劑批次之5-10個樣品且例如藉由XRF、原子吸收光譜法、中子活化分析、離子耦合電漿質譜分析(ion coupled plasma mass spectrometry;ICPMS)或離子耦合電漿原子發射光譜法(ion coupled plasma atomic emission spectroscope;ICPAES)測定鹼金屬含量及對其取平均值。 The content of catalytic metals in the catalyst (in atoms/100 atoms (silicon + zirconium and/or euryl) or wt%) can be determined by appropriate sampling and averaging of the samples. Typically, 5-10 samples of a particular catalyst batch are obtained and the base metal content is determined and averaged, for example, by XRF, atomic absorption spectroscopy, neutron activation analysis, ion coupled plasma mass spectrometry (ICPMS) or ion coupled plasma atomic emission spectroscope (ICPAES).
催化劑/載體中之特定類型之金屬氧化物的含量係藉由XRF、原子吸收光譜法、中子活化分析或離子耦合電漿質譜分析(ICPMS)分析測定。 The content of specific types of metal oxides in the catalyst/support is determined by XRF, atomic absorption spectroscopy, neutron activation analysis or ion coupled plasma mass spectrometry (ICPMS) analysis.
根據本發明之任何態樣之經改質二氧化矽載體催化劑的典型的平均表面積在20-600m2/g、更佳30-450m2/g及最佳35-350m2/g範圍內,如藉由 B.E.T.多點法,使用Micromeritics Tristar 3000表面積及孔隙度分析儀所量測。用於檢查儀器效能之參考材料可為由Micromeritics供應,表面積為30.6m2/g(+/-0.75m2/g)之碳黑粉末(部件號00416833-00)。 The typical average surface area of the modified silica supported catalyst according to any aspect of the present invention is in the range of 20-600 m2 /g, more preferably 30-450 m2 /g and most preferably 35-350 m2 /g, as measured by BET multipoint method using Micromeritics Tristar 3000 surface area and porosity analyzer. A reference material for checking the performance of the instrument can be carbon black powder (Part No. 00416833-00) supplied by Micromeritics with a surface area of 30.6 m2 /g (+/-0.75 m2 /g).
若催化劑材料為多孔的,則其典型地為中孔與大孔之組合,平均孔徑在2與1000nm之間,更佳地在3與500nm之間,最佳地在5與250nm之間。大孔尺寸(大於50nm)可藉由注汞孔隙率測定法,使用NIST標準測定,而使用在77K下利用液氮之Barrett-Joyner-Halenda(BJH)分析方法測定中孔(2-50nm)之孔隙尺寸。平均孔徑為空隙體積相對於孔隙尺寸分佈之空隙體積加權平均值。 If the catalyst material is porous, it is typically a combination of mesopores and macropores with an average pore size between 2 and 1000 nm, more preferably between 3 and 500 nm, and most preferably between 5 and 250 nm. Macropore size (greater than 50 nm) can be determined by mercury infusion porosimetry using NIST standards, while mesopores (2-50 nm) are determined using the Barrett-Joyner-Halenda (BJH) analysis method using liquid nitrogen at 77 K. The average pore size is the void volume weighted average of the void volume relative to the pore size distribution.
催化劑顆粒之平均孔隙體積可為小於0.1cm3/g但一般在0.1-5cm3/g範圍內,如藉由流體(諸如水)攝取所量測。然而,具有極低孔隙度之微孔催化劑並非最佳的,因為其可抑制試劑穿過催化劑之移動且更佳之平均孔隙體積在0.2-2.0cm3/g之間。孔隙體積可可替代地藉由77K下之氮吸附及汞壓孔率測定法之組合量測。如在表面積量測情況下使用Micromeritics TriStar表面積及孔隙度分析儀測定孔隙體積且採用相同標準。 The average pore volume of the catalyst particles may be less than 0.1 cm3 /g but is generally in the range of 0.1-5 cm3 /g as measured by uptake by a fluid such as water. However, microporous catalysts with very low porosity are not optimal as they may inhibit the migration of reagents through the catalyst and a more preferred average pore volume is between 0.2-2.0 cm3 /g. Pore volume may alternatively be measured by a combination of nitrogen adsorption and mercury intrusion porosimetry at 77K. Pore volume is measured using a Micromeritics TriStar surface area and porosity analyzer as in the case of surface area measurements and the same standards are employed.
在本發明中,已發現控制改質劑金屬部分之尺寸意外地有利。然而,為獲得最大益處,有必要控制相鄰改質劑金屬部分之鄰近度,因為改質劑金屬部分可以其他方式彼此組合且因此增加改質劑金屬部分之尺寸。 In the present invention, it has been discovered that controlling the size of the modifier metal portions is unexpectedly beneficial. However, to obtain the maximum benefit, it is necessary to control the proximity of adjacent modifier metal portions, because the modifier metal portions may otherwise combine with each other and thus increase the size of the modifier metal portions.
因此,根據本發明之第四態樣,提供製造經改質二氧化矽載體之方法,其包含以下步驟:提供具有矽烷醇基團之二氧化矽載體;使二氧化矽載體與單體及/或二聚改質劑金屬化合物接觸,使得改質劑金屬經由與矽烷醇基團反應吸附於二氧化矽載體之表面上。 Therefore, according to the fourth aspect of the present invention, a method for manufacturing a modified silica carrier is provided, which comprises the following steps: providing a silica carrier having a silanol group; contacting the silica carrier with a monomer and/or dimerized modifier metal compound, so that the modifier metal is adsorbed on the surface of the silica carrier by reacting with the silanol group.
典型地,改質劑金屬選自鋯或鉿。 Typically, the modifier metal is selected from zirconium or arsenic.
較佳地,吸附之改質劑金屬陽離子彼此充分間隔開以實質上防止其低聚合,更佳地其與相鄰改質劑金屬陽離子三聚合。 Preferably, the adsorbed modifier metal cations are sufficiently spaced apart from one another to substantially prevent their oligomerization, and more preferably they trimerize with adjacent modifier metal cations.
典型地,在接觸步驟中接觸二氧化矽載體之至少25%、更典型地至少30%、諸如至少35%、更佳地至少40%、諸如至少45%、最適當地至少50%、諸如至少55%、例如至少60%或65%、且最佳至少70%、諸如至少75%或80%、更典型地至少85%、最典型地至少90%、尤其至少95%之該等改質劑金屬為單體或二聚改質劑金屬。因此,至少25%、更典型地至少30%、諸如至少35%、更佳至少40%、諸如至少45%、最適當地至少50%、諸如至少55%、例如至少60%或65%、且最佳至少70%、諸如至少75%或80%、更典型地至少85%、最典型地至少90%、尤其至少95%之吸附於二氧化矽載體上之改質劑金屬呈具有總計至多2種改質劑金屬原子之改質劑金屬部分的形式存在。 Typically, at least 25%, more typically at least 30%, such as at least 35%, more preferably at least 40%, such as at least 45%, most suitably at least 50 %, such as at least 55%, for example at least 60% or 65%, and most preferably at least 70%, such as at least 75% or 80%, more typically at least 85%, most typically at least 90%, especially at least 95% of the modifier metal contacting the silica support in the contacting step is a monomeric or dimeric modifier metal. Thus, at least 25%, more typically at least 30%, such as at least 35%, more preferably at least 40%, such as at least 45%, most suitably at least 50 %, such as at least 55%, for example at least 60% or 65%, and most preferably at least 70%, such as at least 75% or 80%, more typically at least 85%, most typically at least 90%, especially at least 95% of the modifier metal adsorbed on the silica support is present in the form of a modifier metal moiety having a total of at most 2 modifier metal atoms.
根據本發明之另一態樣,提供製造根據本文中之態樣中之任一者的經改質二氧化矽載體之方法,其包含以下步驟:提供具有矽烷醇基團之二氧化矽載體;用單體及/或二聚改質劑金屬化合物處理該二氧化矽載體,使得改質劑金屬經由與矽烷醇基團反應吸附於該二氧化矽載體之表面上,其中該等吸附之改質劑金屬原子彼此充分間隔開以實質上防止其與相鄰的改質劑金屬原子低聚合,更佳地彼此充分間隔開以實質上防止其與相鄰的改質劑金屬原子三聚合。 According to another aspect of the present invention, a method for manufacturing a modified silica carrier according to any of the aspects herein is provided, comprising the following steps: providing a silica carrier having a silanol group; treating the silica carrier with a monomer and/or a dimerized modifier metal compound so that the modifier metal is adsorbed on the surface of the silica carrier by reacting with the silanol group, wherein the adsorbed modifier metal atoms are sufficiently spaced apart from each other to substantially prevent oligomerization with adjacent modifier metal atoms, and more preferably are sufficiently spaced apart from each other to substantially prevent trimerization with adjacent modifier metal atoms.
較佳地,改質劑金屬原子之間隔藉由來實現:a)降低該二氧化矽載體上之矽烷醇基團之濃度及/或b)在處理該二氧化矽載體之前將足夠尺寸之穩定配位體連接至該改質劑金屬。 Preferably, spacing of modifier metal atoms is achieved by: a) reducing the concentration of silanol groups on the silica support and/or b) attaching stabilizing ligands of sufficient size to the modifier metal prior to treating the silica support.
根據又另一態樣,提供製造催化劑之方法,其包含以下步驟:- i.提供具有經分離矽烷醇基團之二氧化矽載體及視情況處理該載體以提供呈<2.5個基團/平方奈米之含量的經分離矽烷醇基團(-SiOH);ii.使該視情況處理之二氧化矽載體與單體鋯或鉿改質劑金屬化合物接觸以使該改質劑金屬吸附於該載體上,典型地吸附於至少25%之該等經分離矽烷醇基團;iii.視情況,移除該等改質劑金屬化合物之任何溶劑或液體載劑;iv.煅燒該經改質二氧化矽,歷經足以將吸附於表面上之該單體鋯或鉿化合物轉化為鋯或鉿之氧化物或氫氧化物之時間及溫度;v.用催化鹼金屬處理該經煅燒之改質二氧化矽以用該催化金屬浸漬該經改質二氧化矽從而形成該催化劑及視情況煅燒該催化劑。 According to yet another aspect, a method for producing a catalyst is provided, comprising the following steps:- i. providing a silica carrier having isolated silanol groups and optionally treating the carrier to provide isolated silanol groups (-SiOH) at a content of <2.5 groups/nm2; ii. contacting the optionally treated silica carrier with a monomeric zirconium or bismuth modifier metal compound to adsorb the modifier metal on the carrier, typically adsorbing at least 25% of the modifier metal on the carrier; said separated silanol groups; iii. removing any solvent or liquid carrier of said modifier metal compounds as appropriate; iv. calcining said modified silicon dioxide for a time and temperature sufficient to convert said monomeric zirconium or bismuth compound adsorbed on the surface into an oxide or hydroxide of zirconium or bismuth; v. treating said calcined modified silicon dioxide with a catalytic base metal to impregnate said modified silicon dioxide with said catalytic metal to form said catalyst and calcining said catalyst as appropriate.
根據本發明之另外其他態樣,提供製造用於催化劑之經改質二氧化矽載體之方法,其包含以下步驟:-i.提供具有經分離矽烷醇基團之二氧化矽載體及視情況處理該載體以提供呈<2.5個基團/平方奈米之含量的經分離矽烷醇基團(-SiOH);ii.使該視情況處理之二氧化矽載體與單體鋯或鉿改質劑金屬化合物接觸以使該改質劑金屬吸附於該載體上,典型地吸附於至少25%之該等經分離矽烷醇基團;iii.視情況,移除該等改質劑金屬化合物之任何溶劑或液體載劑;iv.視情況煅燒該經改質載體,歷經足以將吸附於表面上之該單體鋯或鉿化合物轉化為鋯或鉿之氧化物或氫氧化物之時間及溫度以為催化劑浸漬做準備。 According to another aspect of the present invention, a method for manufacturing a modified silica carrier for a catalyst is provided, comprising the following steps: i. providing a silica carrier having isolated silanol groups and optionally treating the carrier to provide isolated silanol groups (-SiOH) with a content of <2.5 groups/nm2; ii. compounding the optionally treated silica carrier with a monomeric zirconium or ebonite modifier metal; iii. optionally, removing any solvent or liquid carrier for the modifier metal compounds; iv. optionally, calcining the modified carrier for a time and temperature sufficient to convert the monomeric zirconium or benzene compounds adsorbed on the surface to oxides or hydroxides of zirconium or benzene in preparation for catalyst impregnation.
較佳地,在藉由煅燒處理、化學脫水或其他適合之方法利用改質劑金屬化合物處理之前,降低矽烷醇基團濃度。 Preferably, the concentration of silanol groups is reduced prior to treatment with a modifier metal compound by calcination, chemical dehydration or other suitable method.
較佳地,本文中之改質劑金屬陽離子源為該改質劑金屬之化合 物溶液,使得化合物在與載體接觸以吸附於載體上時呈溶解狀態。 Preferably, the modifier metal cation source in this article is a compound solution of the modifier metal, so that the compound is in a dissolved state when it contacts the carrier to be adsorbed on the carrier.
典型地,該溶液之溶劑不為水。 Typically, the solvent of the solution is not water.
典型地,溶劑為脂族醇,典型地選自C1-C6烷醇,諸如甲醇、乙醇、丙醇、異丙醇、丁醇、戊醇及己醇,更典型地甲醇、乙醇或丙醇。 Typically, the solvent is an aliphatic alcohol, typically selected from C 1 -C 6 alkanols such as methanol, ethanol, propanol, isopropanol, butanol, pentanol and hexanol, more typically methanol, ethanol or propanol.
有利地,吸附之改質劑金屬與相鄰的改質劑金屬陽離子之鄰近度可藉由接觸步驟中之該改質劑金屬之濃度及以下各者來控制:-a)二氧化矽載體上之矽烷醇基團之濃度及/或b)連接至該改質劑金屬陽離子之任何穩定配位體的尺寸。 Advantageously, the proximity of the adsorbed modifier metal to adjacent modifier metal cations can be controlled by the concentration of the modifier metal in the contacting step and by: - a) the concentration of silanol groups on the silica support and/or b) the size of any stabilizing ligands attached to the modifier metal cations.
在吸附之前二氧化矽載體上之矽烷醇基團濃度較佳藉由煅燒或如熟習此項技術者已知之其他適合方法控制。鑑別方法包括例如L T Zhuravlev,見於「Colloids and Surfaces:Physicochemical and Engineering Aspects,第173卷,第1-38頁,2000」,其描述可在矽膠表面上共存之四種不同形式之矽烷醇:孤立矽烷醇、對位矽烷醇、鄰位矽烷醇及內部矽烷醇。此等可藉由紅外光譜分析鑑別為在3730-3750cm-1處之窄吸收峰,而其他矽烷醇顯示為在3460與3715cm-1之間的寬峰(參見「The Surface Properties of Silicas,Andre P Legrand,john Wiley及Sons編,1998(ISBN 0-471-95332-6)第147-234頁」)。 The concentration of silanol groups on the silica support prior to adsorption is preferably controlled by calcination or other suitable methods known to those skilled in the art. Identification methods include, for example, LT Zhuravlev, in "Colloids and Surfaces: Physicochemical and Engineering Aspects, Vol. 173, pp. 1-38, 2000", which describes four different forms of silanols that can coexist on the surface of silica gels: isolated silanols, para-silanols, ortho-silanols, and internal silanols. These can be identified by infrared spectroscopy analysis as narrow absorption peaks at 3730-3750 cm -1 , while other silanols show broad peaks between 3460 and 3715 cm -1 (see "The Surface Properties of Silicas, Andre P Legrand, John Wiley and Sons, 1998 (ISBN 0-471-95332-6) pp. 147-234").
穩定配位體意謂與改質劑金屬配位且未由於金屬吸附於二氧化矽表面上移除。因此,在用改質劑金屬處理二氧化矽表面之前,穩定配位體典型地與溶液中之改質劑金屬配位。為避免疑問,穩定配位體典型地在改質劑金屬之吸附以後藉由二氧化矽表面之處理移除。 A stabilizing ligand is meant to be coordinated to the modifier metal and not removed by adsorption of the metal onto the silica surface. Thus, the stabilizing ligand is typically coordinated to the modifier metal in solution prior to treating the silica surface with the modifier metal. For the avoidance of doubt, the stabilizing ligand is typically removed by treatment of the silica surface after adsorption of the modifier metal.
穩定配位體之尺寸可有效使改質劑金屬間隔開以防止其組合。 The size of the stabilizing ligands can effectively space the modifier metals to prevent them from combining.
根據本發明之其他態樣,提供製造催化劑或用於如申請專利範圍所述之一或多種催化劑之經改質二氧化矽載體的方法。 According to other aspects of the present invention, a method for manufacturing a catalyst or a modified silica carrier for one or more catalysts as described in the scope of the patent application is provided.
本文中之適合配位體可為穩定配位體,其視情況選自含有能夠 與鋯或鉿原子形成5或6員環之氧或氮原子之具有非共用電子對的分子。實例包括二酮、二亞胺、二胺、二醇、二羧酸或其衍生物,諸如酯,或具有兩種不同的該等官能基且在任一情況下具有各別N或O及由2個或3個原子分離之N或O原子從而形成5或6員環之分子。實例包括戊烷-2,4-二酮;3-側氧基丁酸與含有1至4個碳原子之脂族醇之酯,諸如3-側氧基丁酸乙基酯、3-側氧基丁酸丙基酯、3-側氧基丁酸異丙基酯、3-側氧基丁酸正丁基酯、3-側氧基丁酸第三丁基酯;庚烷-3,5-二酮;2,2,6,6,-四甲基-3,5-庚二酮;1,2-乙二醇;1,2-丙二醇;1,3-丙二醇;1,3-丁二醇;1,2-丁二醇;1,2-二胺基乙烷;乙醇胺;1,2-二胺-1,1,2,2-四甲酸酯;2,3-二羥基-1,4-丁二酸酯;2,4-二羥基-1,5-戊二酸酯;1,2-二羥基苯-3-5-二磺酸酯之鹽;二伸乙三胺五乙酸;氮基三乙酸;N-羥基乙基伸乙基二胺三乙酸;N-羥基乙基亞胺基乙酸;N,N-二羥基乙基甘胺酸;草酸及其鹽。最佳的為戊烷-2,4-二酮、庚烷-3,5-二酮、2,2,6,6,-四甲基-3,5-庚二酮、3-側氧基丁酸乙基酯及3-側氧基丁酸第三丁基酯。相比於較大配位體,具有例如總計小於10個碳及/或雜原子之較小雙齒配位體能夠形成小錯合物,其可允許較高濃度沈積於二氧化矽之表面上。因此,本文中之改質劑金屬陽離子源可呈鋯及/或鉿與該等較小配位體,較佳地與至少一種該配位體之錯合物的形式。該等化合物可包括不穩定配位體,諸如溶劑配位體(例如在醇溶劑中),烷氧化物配位體,諸如乙醇鹽或丙醇鹽等。 Suitable ligands herein may be stable ligands selected from molecules with unshared electron pairs containing oxygen or nitrogen atoms capable of forming a 5- or 6-membered ring with a zirconium or arsenic atom, as the case may be. Examples include diketones, diimines, diamines, diols, dicarboxylic acids or derivatives thereof, such as esters, or molecules having two different such functional groups and in either case with respective N or O atoms separated by 2 or 3 atoms to form a 5- or 6-membered ring. Examples include pentane-2,4-dione; esters of 3-oxobutyric acid and aliphatic alcohols containing 1 to 4 carbon atoms, such as ethyl 3-oxobutyrate, propyl 3-oxobutyrate, isopropyl 3-oxobutyrate, n-butyl 3-oxobutyrate, tert-butyl 3-oxobutyrate; heptane-3,5-dione; 2,2,6,6,-tetramethyl-3,5-heptanedione; 1,2-ethanediol; 1,2-propylene glycol; 1,3-propylene glycol; 1,3-butylene glycol; diols; 1,2-butanediol; 1,2-diaminoethane; ethanolamine; 1,2-diamine-1,1,2,2-tetracarboxylate; 2,3-dihydroxy-1,4-succinate; 2,4-dihydroxy-1,5-pentanedioate; salts of 1,2-dihydroxybenzene-3-5-disulfonate; diethylenetriaminepentaacetic acid; nitrilotriacetic acid; N-hydroxyethylethylenediaminetriacetic acid; N-hydroxyethylimidoacetic acid; N,N-dihydroxyethylglycine; oxalic acid and its salts. The most preferred are pentane-2,4-dione, heptane-3,5-dione, 2,2,6,6,-tetramethyl-3,5-heptanedione, 3-hydroxybutyric acid ethyl ester and 3-hydroxybutyric acid tert-butyl ester. Compared to larger ligands, smaller bidentate ligands having, for example, less than 10 carbon and/or heteroatoms in total are able to form small complexes, which can allow for higher concentration deposition on the surface of the silicon dioxide. Therefore, the modifier metal cation source herein can be in the form of a complex of zirconium and/or einsteinium with such smaller ligands, preferably with at least one of such ligands. Such compounds can include unstable ligands, such as solvent ligands (e.g., in alcohol solvents), alkoxide ligands, such as ethoxides or propoxides, etc.
經較佳分離之矽烷醇基團之濃度確定改質劑金屬吸附之位置之最大數目。藉由控制此濃度,可有效測定吸附之改質劑金屬之鄰近度,因為矽烷醇位置之分佈一般將為均質的。用於製造根據本發明之經改質二氧化矽載體之矽烷醇濃度可低於2.5個基團/平方奈米、更典型地小於1.5個基團/平方奈米、最典型地小於0.8個基團/平方奈米。用於製造經改質二氧化矽載體之矽烷醇濃度之適合範圍可為0.1-2.5個矽烷醇基團/平方奈米、更佳0.15-1.0個矽烷醇基團 矽烷醇基團平方奈米、最佳地0.2-0.7個矽烷醇基團/平方奈米。 The concentration of the better separated silanol groups determines the maximum number of sites where the modifier metal is adsorbed. By controlling this concentration, the proximity of the adsorbed modifier metal can be effectively determined, since the distribution of the silanol sites will generally be homogeneous. The silanol concentration used to make the modified silica support according to the present invention can be less than 2.5 groups/nm2, more typically less than 1.5 groups/nm2, and most typically less than 0.8 groups/nm2. The suitable range of silanol concentration for making modified silica carriers may be 0.1-2.5 silanol groups/square nanometer, more preferably 0.15-1.0 silanol groups/square nanometer, and most preferably 0.2-0.7 silanol groups/square nanometer.
一般呈陽離子形式之改質劑金屬之濃度應設定在一定含量下,該含量防止在載體表面上雙層之大量形成,該形成將導致改質劑金屬發生金屬相互作用。另外,亦應避免填充初始單層中之間隙以防止與相鄰的強烈吸附之改質劑金屬相互作用,該填充可導致對遠離矽烷醇位置之改質劑金屬之微弱吸附。本發明之改質劑金屬之典型的濃度範圍可如本文中所闡述。 Generally, the concentration of the modifier metal in the cationic form should be set at a level that prevents the formation of a large double layer on the support surface, which would result in metallic interactions of the modifier metal. In addition, filling of gaps in the initial monolayer should be avoided to prevent interactions with adjacent strongly adsorbed modifier metals, which could result in weak adsorption of modifier metals away from silanol sites. Typical concentration ranges for the modifier metals of the present invention can be as described herein.
典型地,改質劑金屬化合物中之至少30%、諸如至少35%、更佳至少40%、諸如至少45%、最適當地至少50%、諸如至少55%、例如至少60%或65%、且最佳至少70%、諸如至少75%或80%、更典型地至少85%、最典型地至少90%、尤其至少95%之改質劑金屬在其源與載體接觸以使該等化合物吸附於載體上時為二聚及/或單體改質劑金屬化合物,更典型地為單體的。 Typically, at least 30%, such as at least 35%, more preferably at least 40%, such as at least 45%, most suitably at least 50% , such as at least 55%, for example at least 60% or 65%, and most preferably at least 70%, such as at least 75% or 80%, more typically at least 85%, most typically at least 90%, especially at least 95% of the modifier metal in the modifier metal compound is a dimeric and/or monomeric modifier metal compound, more typically monomeric, when its source is contacted with the support so that these compounds are adsorbed on the support.
根據本發明之另一態樣,提供製造催化劑之方法,該催化劑包含經改質二氧化矽載體,包含改質劑金屬之經改質二氧化矽載體;以及位於經改質二氧化矽載體上之催化金屬,其中該改質劑金屬選自鋯及/或鉿中之一或多者,其特徵在於至少一定比例,典型地至少25%之該改質劑金屬呈單體改質劑金屬部分之形式存在,該方法包含以下步驟:-處理二氧化矽載體以提供呈<2.5個基團/平方奈米之含量的經分離矽烷醇基團(-SiOH);使經處理載體與單體鋯或鉿單體改質劑金屬化合物反應以實現其與至少 25%之該等經分離矽烷醇基團的結合;視情況,移除任何溶劑或液體載劑;煅燒該經改質二氧化矽,歷經足以將吸附於表面上之單體鋯或鉿化合物轉化為鋯或鉿之氧化物或氫氧化物之時間及溫度;用催化鹼金屬處理該經煅燒之改質二氧化矽以用催化金屬浸漬經改質二氧化矽。 According to another aspect of the present invention, a method for preparing a catalyst is provided, the catalyst comprising a modified silica carrier, a modified silica carrier comprising a modifier metal; and a catalytic metal on the modified silica carrier, wherein the modifier metal is selected from one or more of zirconium and/or arsenic, and is characterized in that at least a certain proportion, typically at least 25%, of the modifier metal is present in the form of a monomeric modifier metal portion, the method comprising the steps of: treating the silica carrier to provide a catalyst having a molar ratio of <2.5 groups/square nanometers; 100% of the isolated silanol groups (-SiOH) are present on the treated carrier; reacting the treated carrier with a monomeric zirconium or benzene monomeric modifier metal compound to achieve its bonding with at least 25% of the isolated silanol groups; removing any solvent or liquid carrier as appropriate; calcining the modified silicon dioxide for a time and temperature sufficient to convert the monomeric zirconium or benzene compounds adsorbed on the surface into oxides or hydroxides of zirconium or benzene; treating the calcined modified silicon dioxide with a catalytic base metal to impregnate the modified silicon dioxide with the catalytic metal.
有利地,藉由提供較少量之經分離矽烷醇位置及藉由將單體鋯或鉿物種結合於此等位置,提供催化劑載體,其導致催化劑之選擇性提高、燒結速率降低及催化劑之老化更佳。 Advantageously, by providing a smaller number of isolated silanol sites and by incorporating monomeric zirconium or bismuth species at these sites, a catalyst support is provided which results in increased catalyst selectivity, reduced sintering rate, and better catalyst aging.
處理二氧化矽以提供指定含量之經分離矽烷醇基團之適合方法為煅燒。然而,其他技術,諸如水熱處理或化學脫水亦為可能的。US5583085教示在胺鹼存在下用碳酸二甲酯或二碳酸伸乙基酯使二氧化矽化學脫水。US4357451及US4308172教示利用SOCl2氯化,之後利用H2或ROH脫氯,之後乾燥氛圍中之氧氣進行化學脫水。藉由熱處理進行化學脫水可對0.7/平方奈米之最小值提供至多100%之矽烷醇移除。因此在一些實例中,化學脫水可為矽烷醇基團控制提供更多範疇。 A suitable method for treating silica to provide a specified content of separated silanol groups is calcination. However, other techniques, such as hydrothermal treatment or chemical dehydration are also possible. US5583085 teaches chemical dehydration of silica with dimethyl carbonate or ethyl dicarbonate in the presence of an amine base. US4357451 and US4308172 teach chlorination with SOCl2 , followed by dechlorination with H2 or ROH, followed by chemical dehydration with oxygen in a dry atmosphere. Chemical dehydration by heat treatment can provide up to 100% silanol removal for a minimum of 0.7/nm2. Therefore, in some examples, chemical dehydration can provide more scope for silanol group control.
術語孤立矽烷醇(又稱為單一矽烷醇)為此項技術中所熟知且該等基團與鄰位或對位或內部矽烷醇區分。用於測定孤立矽烷醇之發生率之適合方法包括表面敏感紅外光譜分析及1H NMR或31Si NMR。 The term isolated silanols (also called monosilanols) is well known in the art and these groups are distinguished from ortho or para or endo silanols. Suitable methods for determining the occurrence of isolated silanols include surface sensitive infrared spectroscopy and 1 H NMR or 31 Si NMR.
根據本發明之第五態樣,提供製造根據本發明之任何先前態樣之催化劑的方法,其包含以下步驟:形成根據任何前述態樣之經改質二氧化矽,及使經改質二氧化矽載體與含有催化金屬之溶液接觸以利用催化金屬浸漬經改質二氧化矽。 According to the fifth aspect of the present invention, a method for manufacturing a catalyst according to any previous aspect of the present invention is provided, which comprises the following steps: forming modified silicon dioxide according to any of the previous aspects, and contacting the modified silicon dioxide carrier with a solution containing a catalytic metal to impregnate the modified silicon dioxide with the catalytic metal.
較佳地,在用改質劑金屬陽離子源處理之前,乾燥或煅燒二氧 化矽載體。所形成之經改質二氧化矽可與先前乾燥或煅燒是否在添加催化金屬之前乾燥或煅燒無關。 Preferably, the silica support is dried or calcined prior to treatment with the modifier metal cation source. The modified silica formed may be independent of whether the prior drying or calcination was performed prior to the addition of the catalytic metal.
在用改質劑金屬處理之前,二氧化矽可呈凝膠形式。在改質開始時凝膠可呈水凝膠、乾凝膠或氣凝膠形式。 The silica may be in the form of a gel before treatment with the modifier metal. The gel may be in the form of a hydrogel, xerogel or aerogel at the start of the modification.
二氧化矽載體可為乾凝膠、水凝膠或氣凝膠。較佳地,二氧化矽載體為乾凝膠。 The silica carrier may be a xerogel, a hydrogel or an aerogel. Preferably, the silica carrier is a xerogel.
二氧化矽載體可藉由熟習載體形成之技術者已知之各種技術中的任一者利用金屬陽離子源處理。可以使改質劑金屬分散於整個二氧化矽載體之方式使二氧化矽載體與金屬陽離子源接觸。典型地,鋯及/或鉿可均質地分散於整個二氧化矽載體中。較佳地,改質劑金屬藉由吸附分散於整個二氧化矽載體中。 The silica support may be treated with a metal cation source by any of a variety of techniques known to those skilled in the art of support formation. The silica support may be contacted with the metal cation source in such a manner that the modifier metal is dispersed throughout the silica support. Typically, the zirconium and/or eum may be homogeneously dispersed throughout the silica support. Preferably, the modifier metal is dispersed throughout the silica support by adsorption.
如本文所用之與改質劑金屬相關之術語「吸附」或類似者意謂藉由金屬陽離子源與二氧化矽載體之相互作用,典型地藉由化學吸附將改質劑金屬合併於二氧化矽載體表面上。 As used herein, the term "adsorption" or the like in connection with a modifier metal means the incorporation of the modifier metal onto the surface of the silica support, typically by chemical adsorption, through the interaction of a metal cation source with the silica support.
典型地,將改質劑添加於二氧化矽載體涉及以下步驟:使金屬陽離子源吸附於二氧化矽載體上以形成有機金屬錯合物及煅燒錯合物以將有機金屬錯合物轉化為金屬氧化物部分。典型地,因此改質劑金屬均質分散於整個二氧化矽載體中。典型地,鋯及/或鉿分散於整個二氧化矽載體中。 Typically, adding the modifier to the silica support involves the steps of adsorbing a metal cation source on the silica support to form an organometallic complex and calcining the complex to convert the organometallic complex to a metal oxide portion. Typically, the modifier metal is thus homogeneously dispersed throughout the silica support. Typically, zirconium and/or einsteinium are dispersed throughout the silica support.
本文中之適合金屬陽離子源之實例包括有機錯合物,諸如鋯(戊烷-2,4-二酮)4、鋯(3-側氧基丁酸乙基酯)4、鋯(庚烷-3,5-二酮)4、鋯(2,2,6,6-四甲基庚烷-3,5-二酮)4、鋯(丙醇鹽)(戊烷-2-3-二酮)3、鋯(丙醇鹽)3(2,2,6,6-四甲基-3,5-庚二酮)(鋯(丁基)3(3-側氧基丁酸第三丁基酯)、鋯(Ot-丁基)2(3-側氧基丁酸第三丁基酯)2及金屬鹽,諸如過氯酸鋯、硝酸氧鋯及氯氧化鋯。典型地,以有機錯合物形式提供金屬陽離子源。 Examples of suitable metal cation sources herein include organic complexes such as zirconium (pentane-2,4-dione) 4 , zirconium (ethyl 3-oxobutyrate) 4 , zirconium (heptane-3,5-dione) 4 , zirconium (2,2,6,6-tetramethylheptane-3,5-dione) 4 , zirconium (propoxide salt) (pentane-2-3-dione) 3 , zirconium (propoxide salt) 3 (2,2,6,6-tetramethyl-3,5-heptanedione) (zirconia (butyl) 3 (tert-butyl 3-oxobutyrate), zirconium (Ot-butyl) 2 (tert-butyl 3-oxobutyrate) 2 and metal salts such as zirconium perchlorate, zirconium nitrate and zirconium oxychloride. Typically, the metal cation source is provided in the form of an organic complex.
典型地,使改質劑金屬與二氧化矽載體在溶液中接觸。較佳地,將金屬陽離子源提供於其中金屬陽離子源可溶之任何溶劑中。適合溶劑之實例包括水或醇。較佳之溶劑為醇,諸如甲醇、乙醇、丙醇、異丙醇、丁醇、戊醇及己醇。 Typically, the modifier metal is contacted with the silica carrier in solution. Preferably, the metal cation source is provided in any solvent in which the metal cation source is soluble. Examples of suitable solvents include water or alcohols. Preferred solvents are alcohols such as methanol, ethanol, propanol, isopropanol, butanol, pentanol, and hexanol.
較佳地,以金屬鹽形式向該醇溶液中之二氧化矽添加金屬陽離子源。 Preferably, the metal cation source is added to the silicon dioxide in the alcohol solution in the form of a metal salt.
在一個具體實例中,以以下中之一或多者之溶液形式將金屬陽離子源提供於甲醇、乙醇、異丙醇、丙醇、丁醇、異丁醇或2-丁醇中之一者:乙醯基丙酮酸鋯(IV)(鋯,四(2,4-戊二酮基O,O'))、鋯(庚烷-3,5-二酮)4、鋯(2,2,6,6-四甲基-3,5-庚二酮)4、3-側氧基丁酸乙基酯鋯(IV)、3-側氧基丁酸第三丁基酯鋯(IV)或3-側氧基丁酸異丙基酯鋯(IV)。 In one embodiment, the metal cation source is provided in one of methanol, ethanol, isopropanol, propanol, butanol, isobutanol or 2-butanol as a solution of one or more of the following: zirconium(IV) acetylacetonate (zirconia,tetrakis(2,4-pentanedione O,O')), zirconium(heptane-3,5-dione) 4 , zirconium(2,2,6,6-tetramethyl-3,5-heptanedione) 4 , zirconium(IV) ethyl 3-oxobutyrate, zirconium(IV) tert-butyl 3-oxobutyrate or zirconium(IV) isopropyl 3-oxobutyrate.
較佳地,在改質劑金屬吸附於二氧化矽載體上之後,藉由蒸發移除溶劑。 Preferably, after the modifier metal is adsorbed on the silica support, the solvent is removed by evaporation.
視情況,煅燒經改質二氧化矽載體以自經改質載體移除任何配位體或其他有機物。 Optionally, the modified silica support is calcined to remove any ligands or other organics from the modified support.
熟練人員應理解,可藉由任何適合手段將催化金屬添加於經改質二氧化矽。典型地,為製造經改質二氧化矽催化劑,使經改質二氧化矽與催化金屬接觸。 A skilled person will appreciate that the catalytic metal may be added to the modified silica by any suitable means. Typically, to produce a modified silica catalyst, the modified silica is contacted with the catalytic metal.
典型地,為製造催化劑,使經改質二氧化矽載體與含有催化金屬(諸如銫,呈催化金屬之鹽及鹼形式)之酸性、中性或鹼性水溶液接觸。可替代地,可使載體與催化金屬鹽之水混溶性溶液在有機溶劑中接觸。較佳之溶劑為醇,諸如甲醇、乙醇、丙醇及異丙醇,較佳甲醇。最佳之溶劑為甲醇。最佳地,以甲醇中之鹽溶液形式添加催化金屬。可在溶液中含有低含量之水,典型地至多20vol%。 Typically, to make the catalyst, the modified silica support is contacted with an acidic, neutral or alkaline aqueous solution containing the catalytic metal (such as cesium, in the form of a salt or base of the catalytic metal). Alternatively, the support may be contacted with a water-miscible solution of a catalytic metal salt in an organic solvent. Preferred solvents are alcohols such as methanol, ethanol, propanol and isopropanol, preferably methanol. The best solvent is methanol. Optimally, the catalytic metal is added as a salt solution in methanol. Low levels of water may be present in the solution, typically up to 20 vol%.
典型地,在此催化劑生產製程之階段期間溫度、接觸時間及pH值之條件允許利用催化金屬浸漬經改質二氧化矽載體以形成經改質二氧化矽載體催化劑。 Typically, the conditions of temperature, contact time and pH during this stage of the catalyst production process allow the modified silica support to be impregnated with the catalytic metal to form a modified silica supported catalyst.
此步驟之溫度之典型條件在5-95℃、更典型地10-80℃之間及最典型地在20-70℃之間。此步驟之溫度可為至少5℃、更典型地至少10℃、最典型地至少20℃。 Typical conditions for the temperature of this step are between 5-95°C, more typically between 10-80°C and most typically between 20-70°C. The temperature of this step may be at least 5°C, more typically at least 10°C, most typically at least 20°C.
此步驟之經改質載體與含有催化金屬之溶液之間的典型的接觸時間可在0.05-48小時之間、更典型地在0.1-24小時之間、最典型地在0.5-18小時之間。接觸時間可為至少0.05小時、更典型地至少0.1小時、最典型地至少0.5小時。 The typical contact time between the modified carrier and the solution containing the catalytic metal in this step may be between 0.05-48 hours, more typically between 0.1-24 hours, and most typically between 0.5-18 hours. The contact time may be at least 0.05 hours, more typically at least 0.1 hours, and most typically at least 0.5 hours.
此步驟之催化金屬鹽溶液之濃度視大量因素而定,包括催化金屬化合物之溶解限度、經改質二氧化矽載體之孔隙度、催化金屬在載體上之所需負載及添加方法,包括用於浸漬載體之液體之量,pH值及催化金屬化合物之選擇。溶液中之濃度最佳藉由實驗測定。 The concentration of the catalytic metal salt solution in this step depends on a number of factors, including the solubility limit of the catalytic metal compound, the porosity of the modified silica carrier, the desired loading of the catalytic metal on the carrier and the method of addition, including the amount of liquid used to impregnate the carrier, the pH value and the choice of catalytic metal compound. The concentration in the solution is best determined experimentally.
用於催化金屬合併之催化金屬之適合鹽一般可選自由以下組成之群中之一或多者:甲酸鹽、乙酸鹽、丙酸鹽、碳酸氫鹽、氯化物、硝酸鹽、氫氧化物及碳酸鹽,更典型地氫氧化物、乙酸鹽或碳酸鹽及最典型地氫氧化物及/或碳酸鹽。在浸漬期間可藉由添加氨以及金屬化合物或藉由使用合適的催化金屬化合物,諸如甲酸鹽、碳酸鹽、乙酸鹽或氫氧化物,更佳地氫氧化物或碳酸鹽來控制pH值,在所有情況下其單獨、呈組合形式或連同合適羧酸一起。在用以實現令人滿意之吸附之浸漬結束時,最重要的係將pH值控制在較佳範圍內。最典型地,可使用鹽之鹼溶液併入此等鹽。若鹽自身並非鹼性,則可添加適合鹼,諸如氫氧化銨。因為氫氧化物鹽本質上為鹼性,所以可適宜地製備上述鹽中之一或多者與特定催化金屬(諸如銫)之氫氧化物鹽的混合物。 Suitable salts of the catalytic metal used to catalyze the metal incorporation may generally be selected from one or more of the group consisting of formates, acetates, propionates, bicarbonates, chlorides, nitrates, hydroxides and carbonates, more typically hydroxides, acetates or carbonates and most typically hydroxides and/or carbonates. The pH may be controlled during the impregnation by adding ammonia and the metal compound or by using a suitable catalytic metal compound, such as formates, carbonates, acetates or hydroxides, more preferably hydroxides or carbonates, in all cases alone, in combination or together with a suitable carboxylic acid. It is most important to control the pH within a preferred range at the end of the impregnation to achieve satisfactory adsorption. Most typically, these salts may be incorporated using alkaline solutions of the salts. If the salts themselves are not alkaline, a suitable base such as ammonium hydroxide may be added. Since hydroxide salts are alkaline in nature, a mixture of one or more of the above salts with a hydroxide salt of a particular catalytic metal such as cesium may be suitably prepared.
熟練人員應理解,可藉由任何適合手段將本發明之催化金屬添加於經改質二氧化矽載體。在視情況使用適合之水性鹽及隨後乾燥表面塗佈之載體將化合物沈積於載體上之後,可典型地藉由煅燒將催化劑固定於載體上。 The skilled person will appreciate that the catalytic metal of the present invention may be added to the modified silica support by any suitable means. After depositing the compound on the support using a suitable aqueous salt and subsequent drying of the surface-coated support as appropriate, the catalyst may be fixed to the support typically by calcination.
一般而言,經改質二氧化矽載體之乾燥藉由熟練人員已知之合適方法來達成,諸如在乾燥單元或烘箱中達成。 In general, drying of the modified silica support is achieved by suitable methods known to the skilled person, such as in a drying unit or an oven.
典型地,催化劑含有在0.01-25% w/w之間的水,更典型地0.1-15% w/w水及最典型地在0.5%-5.0 w/w之間的水。 Typically, the catalyst contains between 0.01-25% w/w water, more typically 0.1-15% w/w water and most typically between 0.5 %-5.0 w/w water.
視情況,可乾燥或煅燒含有催化金屬之經改質二氧化矽載體催化劑,煅燒製程為熟習此項技術者所熟知。 The modified silica-supported catalyst containing the catalytic metal may be dried or calcined as appropriate, the calcination process being well known to those skilled in the art.
在某些情況下,可能有必要在添加催化金屬之前,在200-1000℃、更典型地300-800℃、最典型地350-600℃下煅燒由改質階段形成之載體。在由改質階段形成之載體之較佳煅燒中,溫度為至少375℃,諸如400℃或450℃。煅燒氛圍應典型地含有一些氧氣,適當地1-30%氧氣及最適當地2-20%氧氣以使有機殘餘物以二氧化碳及水形式移除。煅燒時間可典型地在0.01與100小時之間,適當地為0.5-40小時,最適當地1-24小時。應將諸如乾凝膠材料之煅燒載體冷卻至合適溫度以用於浸漬。催化活性金屬之添加可藉由針對未經煅燒之材料所描述之方法進行或可藉由用於浸漬催化劑載體(諸如乾凝膠載體)之任何其他常規方法進行,諸如使用除水以外之溶劑,諸如醇,適當地甲醇、乙醇、丙醇或異丙醇或使用微濕含浸法,在該方法中,僅向乾凝膠載體添加足夠溶液以填充乾凝膠載體之孔隙。在此情況下,可計算催化活性金屬之濃度以便將目標量之催化活性金屬引入乾凝膠載體材料而非藉由先前所描述之方法提供過量之較低濃度的溶液。催化活性金屬之添加可利用此項技術中已知之任何較佳之方法。煅燒技術在有機錯合物用作鋯及/或鉿源之情況下為尤其有利的,因為可能有必要在用銫浸漬之前修改後續催化劑製備工序以便移除至少一部分有機錯 合鹽。有利地,已發現經改質載體之煅燒降低催化金屬:改質劑金屬比及因此所需之催化金屬。此出乎意料且提供本發明之另一改善。 In some cases it may be necessary to calcine the support formed from the reforming stage at 200-1000°C, more typically 300-800°C, most typically 350-600°C, prior to adding the catalytic metal. In a preferred calcination of the support formed from the reforming stage, the temperature is at least 375°C, such as 400°C or 450°C. The calcining atmosphere should typically contain some oxygen, suitably 1-30% oxygen and most suitably 2-20% oxygen to allow organic residues to be removed in the form of carbon dioxide and water. The calcination time may typically be between 0.01 and 100 hours, suitably 0.5-40 hours, most suitably 1-24 hours. The calcined support, such as a xerogel material, should be cooled to a suitable temperature for impregnation. The addition of the catalytically active metal may be carried out by the methods described for the uncalcined material or may be carried out by any other conventional method for impregnating catalyst supports, such as xerogel supports, such as using a solvent other than water, such as an alcohol, suitably methanol, ethanol, propanol or isopropanol or using a slightly wet impregnation method in which only enough solution is added to the xerogel support to fill the pores of the xerogel support. In this case, the concentration of the catalytically active metal may be calculated so as to introduce a target amount of the catalytically active metal into the xerogel support material rather than providing an excess of a lower concentration solution by the methods previously described. The addition of the catalytically active metal may utilize any preferred method known in the art. The calcination technique is particularly advantageous where an organic complex is used as the zirconium and/or bismuth source, as it may be necessary to modify the subsequent catalyst preparation process prior to impregnation with cesium to remove at least a portion of the organic complex salt. Advantageously, calcination of the modified support has been found to reduce the catalytic metal:modifier metal ratio and therefore the catalytic metal required. This is unexpected and provides another improvement of the present invention.
根據本發明之第六態樣,提供製造乙烯性不飽和羧酸或酯,典型地α,β乙烯性不飽和羧酸或酯之方法,其包含以下步驟:使甲醛或其適合來源與羧酸或酯在催化劑存在下及視情況在醇存在下接觸,其中催化劑如本文中定義之本發明之第一態樣或其他態樣中之任一者。 According to the sixth aspect of the present invention, a method for producing ethylenically unsaturated carboxylic acids or esters, typically α,β ethylenically unsaturated carboxylic acids or esters, is provided, which comprises the following steps: contacting formaldehyde or a suitable source thereof with a carboxylic acid or ester in the presence of a catalyst and optionally in the presence of an alcohol, wherein the catalyst is any one of the first aspect or other aspects of the present invention as defined herein.
有利地,亦已發現包含如本文所定義之經改質二氧化矽且含有催化金屬之催化劑為顯著有效之催化劑,其用於藉由使對應酸或酯與亞甲基源(諸如甲醛)之縮合製造α,β乙烯性不飽和羧酸或酯,從而具有減少之催化劑表面燒結、改善之選擇性及提供高催化劑表面積。詳言之,當使用單體及/或二聚改質劑金屬部分時及/或當在用催化金屬處理之前煅燒經改質二氧化矽載體時發現改進之特性。此外,使用某些金屬錯合物藉由吸附將改質劑金屬合併於載體上提供適宜之單體及/或二聚改質劑金屬部分的來源。此類來源亦允許控制改質劑金屬之性質及提供改質劑金屬部分之更加均勻之分佈。 Advantageously, catalysts comprising modified silica as defined herein and containing a catalytic metal have also been found to be remarkably effective catalysts for making α,β ethylenically unsaturated carboxylic acids or esters by condensation of the corresponding acid or ester with a methylene source such as formaldehyde, thereby having reduced catalyst surface sintering, improved selectivity and providing a high catalyst surface area. In particular, improved properties are found when monomeric and/or dimerized modifier metal moieties are used and/or when the modified silica support is calcined prior to treatment with the catalytic metal. In addition, the use of certain metal complexes to incorporate the modifier metal on the support by adsorption provides a suitable source of monomeric and/or dimerized modifier metal moieties. Such sources also allow control over the properties of the modifier metal and provide a more uniform distribution of the modifier metal fraction.
與本發明之第四態樣之甲醛相關的術語「其適合來源」意謂游離甲醛可在反應條件下自來源原位形成或來源可在反應條件下充當游離甲醛之等效物,例如其可形成與甲醛相同之反應中間產物使得發生等效反應。 The term "a suitable source thereof" in relation to the formaldehyde of the fourth aspect of the present invention means that free formaldehyde can be formed in situ from the source under the reaction conditions or the source can act as an equivalent of free formaldehyde under the reaction conditions, for example, it can form the same reaction intermediate as formaldehyde so that an equivalent reaction occurs.
甲醛之適合來源可為式(I)化合物:
其中R5及R6獨立地選自C1-C12烴或H,X為O,n為1至100之整數,且m為1。 wherein R 5 and R 6 are independently selected from C 1 -C 12 hydrocarbon or H, X is O, n is an integer from 1 to 100, and m is 1.
典型地,R5及R6獨立地選自如本文所定義之C1-C12烷基、烯基或芳基,或H,更適當地C1-C10烷基或H,最適當地C1-C6烷基或H,尤其甲基或 H。典型地,n為1至10,更適當地1至5,尤其1-3之整數。 Typically, R5 and R6 are independently selected from C1 - C12 alkyl, alkenyl or aryl as defined herein, or H, more suitably C1 - C10 alkyl or H, most suitably C1-C6 alkyl or H, especially methyl or H. Typically, n is an integer from 1 to 10, more suitably 1 to 5, especially 1-3.
然而,可使用甲醛之其他來源,包括三噁烷。 However, other sources of formaldehyde may be used, including trioxane.
因此,甲醛之適合來源亦包括可提供甲醛來源之任何平衡組合物。該等平衡組合物之實例包括但不限於二甲氧甲烷、三噁烷、聚甲醛R1-O-(CH2-O)i-R2(其中R1及/或R2為烷基或氫,i=1至100)、多聚甲醛、福馬林(甲醛、甲醇、水)及其他平衡組合物,諸如甲醛、甲醇及丙酸甲酯之混合物。 Therefore, suitable sources of formaldehyde also include any equilibrium combination that can provide a source of formaldehyde. Examples of such equilibrium combinations include but are not limited to dimethoxymethane, trioxane, polyoxymethylene R1 -O-( CH2 -O) i - R2 (wherein R1 and/or R2 are alkyl or hydrogen, i=1 to 100), paraformaldehyde, formalin (formaldehyde, methanol, water) and other equilibrium combinations, such as a mixture of formaldehyde, methanol and methyl propionate.
聚甲醛為甲醛與甲醇之高級甲縮醛或半甲縮醛CH3-O-(CH2-O)i-CH3(「甲縮醛-i」)或CH3-O-(CH2-O)rH(半甲縮醛-i),其中i=1至100,適當地1-5,尤其1-3,或具有至少一個非甲基末端基之其他聚甲醛。因此,甲醛之來源亦可為式R31-O-(CH2-O-)iR32之聚甲醛,其中R31及R32可為相同或不同基團且至少一者選自C1-C10烷基,例如R31=異丁基且R32=甲基。 The polyoxymethylene is a higher formaldehyde or hemiformaldehyde of formaldehyde and methanol, CH 3 —O—(CH 2 —O) i —CH 3 (“formaldehyde-i”) or CH 3 —O—(CH 2 —O) r H (hemiformaldehyde-i), wherein i=1 to 100, suitably 1-5, especially 1-3, or other polyoxymethylenes having at least one non-methyl terminal group. Thus, the source of formaldehyde may also be a polyoxymethylene of the formula R 31 —O—(CH 2 —O—) iR 32 , wherein R 31 and R 32 may be the same or different groups and at least one is selected from C 1 -C 10 alkyl, for example R 31 = isobutyl and R 32 = methyl.
一般而言,甲醛之適合來源選自二甲氧甲烷、甲醛及甲醇之低級半甲縮醛CH3-O-(CH2-O)i-H(其中i=1-3)、福馬林或包含甲醛、甲醇及丙酸甲酯之混合物。 Generally, suitable sources of formaldehyde are selected from dimethoxymethane, lower hemiformals of formaldehyde and methanol CH 3 —O—(CH 2 —O) i —H (where i=1-3), formalin, or a mixture comprising formaldehyde, methanol, and methyl propionate.
典型地,術語福馬林意謂比值為25至65重量%:0.01至25重量%:25至70重量%之甲醛:甲醇:水之混合物。更典型地,術語福馬林意謂比值為30至60重量%:0.03至20重量%:35至60重量%之甲醛:甲醇:水之混合物。最典型地,術語福馬林意謂比值為35至55重量%:0.05至18重量%:42至53重量%之甲醛:甲醇:水之混合物。 Typically, the term formalin means a mixture of formaldehyde:methanol:water in the ratio of 25 to 65 wt %:0.01 to 25 wt %:25 to 70 wt %. More typically, the term formalin means a mixture of formaldehyde:methanol:water in the ratio of 30 to 60 wt %:0.03 to 20 wt %:35 to 60 wt %. Most typically, the term formalin means a mixture of formaldehyde:methanol:water in the ratio of 35 to 55 wt %:0.05 to 18 wt %:42 to 53 wt %.
典型地,包含甲醛、甲醇及丙酸甲酯之混合物含有少於5重量%水。更適當地,包含甲醛、甲醇及丙酸甲酯之混合物含有少於1重量%水。最適當地,包含甲醛、甲醇及丙酸甲酯之混合物含有0.1至0.5重量%水。 Typically, the mixture comprising formaldehyde, methanol and methyl propionate contains less than 5% by weight of water. More suitably, the mixture comprising formaldehyde, methanol and methyl propionate contains less than 1% by weight of water. Most suitably, the mixture comprising formaldehyde, methanol and methyl propionate contains 0.1 to 0.5% by weight of water.
根據本發明之第七態樣,提供一種製備乙烯性不飽和酸或酯之方法,其包含使式R1-CH2-COOR3之烷酸或酯與甲醛或如下文所定義之式(I)
之甲醛之適合來源:
其中R5為甲基且R6為H;X為O;m為1;且n為1與20之間的任何值或此等之任何混合物;在根據本發明之任何態樣之催化劑存在下,及視情況在烷醇存在下接觸;其中R1為氫或具有1至12個、更適當地1至8個、最適當地1至4個碳原子之烷基且R3亦可獨立地為氫或具有1至12個、更適當地1至8個、最適當地1至4個碳原子之烷基。 wherein R5 is methyl and R6 is H; X is O; m is 1; and n is any value between 1 and 20 or any mixture thereof; in the presence of a catalyst according to any aspect of the present invention, and optionally in the presence of an alkanol; wherein R1 is hydrogen or an alkyl group having 1 to 12, more preferably 1 to 8, most preferably 1 to 4 carbon atoms and R3 may also independently be hydrogen or an alkyl group having 1 to 12, more preferably 1 to 8, most preferably 1 to 4 carbon atoms.
因此,本發明人已發現,具有呈根據本發明之金屬氧化物部分形式之鋯及/或鉿能夠出人意料地改善對用以形成乙烯性不飽和羧酸之亞甲基源(諸如甲醛)與羧酸或烷基酯(諸如丙酸甲酯)之縮合的選擇性。另外,在縮合反應期間催化劑表面之燒結速率顯著且意外地降低。 Thus, the inventors have discovered that having zirconium and/or arsenic in the form of a metal oxide moiety according to the invention can unexpectedly improve the selectivity for the condensation of a methylene source such as formaldehyde with a carboxylic acid or an alkyl ester such as methyl propionate to form an ethylenically unsaturated carboxylic acid. In addition, the sintering rate of the catalyst surface during the condensation reaction is significantly and unexpectedly reduced.
因此,已發現本發明之催化劑對一個特定方法尤其有利,該方法為在甲醇存在下用以製備MMA之甲醛與丙酸甲酯之縮合。 Thus, it has been found that the catalyst of the invention is particularly advantageous for a specific process, namely the condensation of formaldehyde and methyl propionate in the presence of methanol for the preparation of MMA.
在製造MMA之情況下,使催化劑典型地與包含甲醛、甲醇及丙酸甲酯之混合物接觸。 In the case of making MMA, the catalyst is typically contacted with a mixture comprising formaldehyde, methanol and methyl propionate.
本發明之第六或第七態樣之方法尤其適用於製造丙烯酸及烷基丙烯酸及其烷基酯,以及經亞甲基取代之內酯。適合之經亞甲基取代之內酯包括分別來自戊內酯及γ-丁內酯之2-亞甲基戊內酯及2-亞甲基γ-丁內酯。適合之(烷基)丙烯酸及其酯為(C0-8烷基)丙烯酸或(C0-8烷基)丙烯酸烷基酯,典型地來自其對應烷酸或酯與亞甲基源(諸如甲醛)在催化劑存在下之反應,適當地甲基 丙烯酸、丙烯酸、甲基丙烯酸甲酯、丙烯酸乙酯或丙烯酸丁酯之製備,更適當地,分別來自丙酸或丙酸甲酯之甲基丙烯酸或尤其甲基丙烯酸甲酯(MMA)。因此,在甲基丙烯酸甲酯或甲基丙烯酸之製造中,式R1-CH2-COOR3之較佳酯或酸分別為丙酸甲酯或丙酸且較佳之烷醇因此為甲醇。然而,應瞭解,在其他乙烯性不飽和酸或酯之製造中,較佳之烷醇或酸將不同。 The method of the sixth or seventh aspect of the invention is particularly suitable for the preparation of acrylic acid and alkyl acrylic acid and its alkyl esters, and methylene-substituted lactones. Suitable methylene-substituted lactones include 2-methylene valerolactone and 2-methylene γ-butyrolactone, respectively, derived from valerolactone and γ-butyrolactone. Suitable (alkyl) acrylic acid and its esters are (C 0-8 alkyl) acrylic acid or (C 0-8 alkyl) acrylic acid alkyl esters, typically derived from the reaction of the corresponding alkanoic acid or ester with a methylene source (such as formaldehyde) in the presence of a catalyst, suitably methacrylic acid, acrylic acid, methyl methacrylate, ethyl acrylate or butyl acrylate, more suitably methacrylic acid or especially methyl methacrylate (MMA) derived from propionic acid or methyl propionate, respectively. Thus, in the production of methyl methacrylate or methacrylic acid, the preferred ester or acid of formula R1 - CH2 - COOR3 is methyl propionate or propionic acid, respectively, and the preferred alkanol is therefore methanol. However, it will be appreciated that in the production of other ethylenically unsaturated acids or esters, the preferred alkanol or acid will be different.
本發明之反應可為分批或連續反應。 The reaction of the present invention can be a batch or continuous reaction.
本發明之第六或第七態樣之方法中之溫度及錶壓的典型條件為在100℃與400℃之間、更佳地200℃與375℃之間、最佳地275℃與360℃之間;且/或在0.001MPa與1MPa之間、更佳地在0.03MPa與0.5MPa之間、最佳地在0.03MPa與0.3MPa之間。在催化劑存在下反應物之典型的滯留時間在0.1與300秒之間、更佳地在1-100秒之間、最佳地在2-50秒之間、尤其在3-30秒之間。 Typical conditions of temperature and gauge pressure in the method of the sixth or seventh aspect of the present invention are between 100°C and 400°C, preferably between 200°C and 375°C, and optimally between 275°C and 360°C; and/or between 0.001MPa and 1MPa, preferably between 0.03MPa and 0.5MPa, and optimally between 0.03MPa and 0.3MPa. The typical residence time of the reactants in the presence of a catalyst is between 0.1 and 300 seconds, preferably between 1-100 seconds, optimally between 2-50 seconds, and especially between 3-30 seconds.
用於製造本發明中之產品之方法的催化劑量並非至關重要且將藉由採用該催化劑之方法之實踐性確定。然而,一般將選擇催化劑之量以實現產品之最佳選擇性及產率以及操作之可接受溫度。然而,熟練人員將瞭解,催化劑之最小量應足以引起反應物之有效的催化劑表面接觸。另外,熟練人員將理解,相對於反應物之催化劑之量實際上不存在上限但在實踐中此可另外受所需接觸時間及/或經濟考慮控制。 The amount of catalyst used in the process of making the products of the present invention is not critical and will be determined by the practicality of the process employing the catalyst. However, the amount of catalyst will generally be selected to achieve the best selectivity and yield of the product and an acceptable temperature for operation. However, the skilled person will understand that the minimum amount of catalyst should be sufficient to cause effective catalyst surface contact of the reactants. In addition, the skilled person will understand that there is actually no upper limit to the amount of catalyst relative to the reactants but in practice this may be additionally controlled by the required contact time and/or economic considerations.
本發明之第六或第七態樣之方法中的試劑之相對量可在廣泛限度內變化但一般甲醛或其適合來源與羧酸或酯之莫耳比在20:1至1:20、更適當地5:1至1:15範圍內。最佳比值將視甲醛形式及催化劑自甲醛物種釋放甲醛之能力而定。因此,其中R31O-(CH2-O)iR32中之R31及R32中之一或兩者為H的高反應性甲醛物質需要相對較低之比值,典型地,在此情況下,甲醛或其適合來源與羧酸或酯之莫耳比在1:1至1:9範圍內。在R31及R32均並非H之情況下,如例如在CH3O-CH2-OCH3中或在三噁烷中,較高之比值為最佳的,典型地為6:1至1:3。 The relative amounts of the reagents in the methods of the sixth or seventh aspects of the invention may vary within wide limits but generally the molar ratio of formaldehyde or a suitable source thereof to the carboxylic acid or ester is in the range of 20:1 to 1:20, more preferably 5:1 to 1:15. The optimum ratio will depend on the formaldehyde form and the ability of the catalyst to release formaldehyde from the formaldehyde species. Thus, highly reactive formaldehyde species wherein one or both of R 31 and R 32 in R 31 O-(CH 2 -O) i R 32 are H require relatively low ratios, typically in this case the molar ratio of formaldehyde or a suitable source thereof to the carboxylic acid or ester is in the range of 1:1 to 1:9. In the case where both R 31 and R 32 are other than H, such as for example in CH 3 O—CH 2 —OCH 3 or in trioxane, higher ratios are optimal, typically 6:1 to 1:3.
如上所述,由於甲醛來源,水亦可存在於反應混合物中。視甲醛來源而定,可能有必要在催化之前自其移除一部分或全部水。維持水含量低於甲醛來源中之水含量對產品之催化效率及/或後續純化可為有利的。反應器中少於10莫耳%之水為較佳的,更適當地少於5莫耳%、最適當地少於2莫耳%。 As mentioned above, water may also be present in the reaction mixture due to the formaldehyde source. Depending on the formaldehyde source, it may be necessary to remove some or all of the water therefrom prior to catalysis. Maintaining the water content below that in the formaldehyde source may be beneficial for catalytic efficiency and/or subsequent purification of the product. Less than 10 mol% water in the reactor is preferred, more preferably less than 5 mol%, most preferably less than 2 mol%.
醇與酸或酯之莫耳比典型地在20:1至1:20、較佳地10:1至1:10、最佳地5:1至1:5範圍內,例如為1:1.5。然而,最佳之比值將視饋送至反應物中之催化劑之水量加反應所產生之量而定,使得醇與反應中之全部水之較佳莫耳比將為至少1:1且更佳為至少2:1。 The molar ratio of alcohol to acid or ester is typically in the range of 20:1 to 1:20, preferably 10:1 to 1:10, and most preferably 5:1 to 1:5, for example 1:1.5. However, the optimal ratio will depend on the amount of water in the catalyst fed to the reactants plus the amount produced by the reaction, so that the preferred molar ratio of alcohol to all water in the reaction will be at least 1:1 and more preferably at least 2:1.
可獨立地在混合之後或之前將第六或第七態樣之試劑饋送至反應器且反應製程可為連續的或分批的。然而,典型地,使用連續製程。 The sixth or seventh state of the reagents may be fed to the reactor independently after or before mixing and the reaction process may be continuous or batch. However, typically, a continuous process is used.
典型地,在反應物呈氣相時進行本發明之第六或第七態樣之方法。 Typically, the method of the sixth or seventh aspect of the present invention is carried out when the reactants are in the gas phase.
在另一態樣中,本發明擴展至製造根據本文中相關態樣中之任一者之乙烯性不飽和羧酸或酯的方法,其包含以下步驟:首先製造根據本文中相關態樣中之任一者之催化劑。 In another embodiment, the present invention extends to a method for producing an ethylenically unsaturated carboxylic acid or ester according to any of the related embodiments herein, which comprises the following steps: first, producing a catalyst according to any of the related embodiments herein.
除非另外規定,否則術語「烷基」在本文中使用時意謂C1至C12烷基且包括甲基、乙基、乙烯基、丙基、丙烯基、丁基、丁烯基、戊基、戊烯基、己基、己烯基及庚基,典型地,烷基選自甲基、乙基、丙基、丁基、戊基及己基,更典型地甲基。除非另外規定,否則烷基在存在足夠數目個碳原子時可為直鏈或分支鏈,為環狀、非環狀或部分環狀/非環狀,未經取代、經選自以下之一或多個取代基取代或封端:鹵基、氰基、硝基、-OR19、-OC(O)R20、-C(O)R21、-C(O)OR22、-NR23R24、-C(O)NR25R26、-SR29、-C(O)SR30、- C(S)NR27R28、未經取代或經取代之芳基、或未經取代或經取代之Het,其中R19至R30在本文中且一般在本文中各自獨立地表示氫、鹵基、未經取代或經取代之芳基或未經取代或經取代之烷基,或就R21而言鹵基、硝基、氰基及氨基且/或間雜有一或多個(典型地少於4個)氧、硫、矽原子,或矽烷基或二烷基矽基團,或其混合物。典型地,烷基未經取代,典型地為線性且典型地為飽和的。 Unless otherwise specified, the term "alkyl" as used herein means C1 to C12 alkyl and includes methyl, ethyl, vinyl, propyl, propenyl, butyl, butenyl, pentyl, pentenyl, hexyl, hexenyl and heptyl, typically, the alkyl is selected from methyl, ethyl, propyl, butyl, pentyl and hexyl, more typically methyl. Unless otherwise specified, an alkyl group may be straight or branched, cyclic, acyclic or partially cyclic/acyclic, unsubstituted, substituted or terminated with one or more substituents selected from the group consisting of halogen, cyano, nitro, -OR19 , -OC(O) R20 , -C(O) R21 , -C(O) OR22, -NR23R24 , -C(O) NR25R26 , -SR29 , -C (O) SR30 , -C(S ) NR27R28 , unsubstituted or substituted aryl, or unsubstituted or substituted Het, wherein R19 to R 30 herein and generally herein each independently represents hydrogen, halogen, unsubstituted or substituted aryl or unsubstituted or substituted alkyl, or in the case of R 21 halogen, nitro, cyano and amino and/or interspersed with one or more (typically less than 4) oxygen, sulfur, silicon atoms, or silane or dialkylsilane groups, or mixtures thereof. Typically, the alkyl group is unsubstituted, typically linear and typically saturated.
術語「烯基」應理解為上文之「烷基」,不同之處在於其中至少一個碳-碳鍵為不飽和的且因此術語係關於C2至C12烯基。 The term "alkenyl" is to be understood as "alkyl" above, with the difference that at least one carbon-carbon bond is unsaturated and the term therefore relates to C2 to C12 alkenyl.
術語「烷基(alk)」或類似者在無相反資訊存在下應視為與「烷基」之以上定義一致,不同之處在於「C0烷基」意謂未經烷基取代。 The term "alkyl" or the like, unless otherwise indicated, should be construed as being consistent with the above definition of "alkyl", except that " C0 alkyl" means not substituted by an alkyl group.
術語「芳基」在本文中使用時包括五至十員、典型地五至八員碳環芳族基或假芳族基,諸如苯基、環戊二烯基及茚基陰離子以及萘基,該等基團可未經取代或經選自以下之一或多個取代基取代:未經取代或經取代之芳基、烷基(該基團自身可如本文所定義未經取代或經取代或封端)、Het(該基團自身可如本文所定義未經取代或經取代或封端)、鹵基、氰基、硝基、OR19、OC(O)R20、C(O)R21、C(O)OR22、NR23R24、C(O)NR25R26、SR29、C(O)SR30或C(S)NR27R28,其中R19至R30各自獨立地表示氫、未經取代或經取代之芳基或烷基(該烷基自身可如本文所定義未經取代或經取代或封端)、或就R21而言鹵基、硝基、氰基或氨基。 The term "aryl" as used herein includes five to ten membered, typically five to eight membered carbon ring aromatic or pseudoaromatic groups such as phenyl, cyclopentadienyl and indenyl anions and naphthyl, which groups may be unsubstituted or substituted with one or more substituents selected from the group consisting of unsubstituted or substituted aryl, alkyl (which group itself may be unsubstituted or substituted or terminated as defined herein), Het (which group itself may be unsubstituted or substituted or terminated as defined herein), halogen, cyano, nitro, OR19, OC(O) R20 , C(O) R21 , C(O) OR22 , NR23R24 , C(O) NR25R26 , SR29 , C(O) SR30 or C(S) NR27R28 , wherein R19 to R20 are substituted or terminated . R 30 each independently represents hydrogen, unsubstituted or substituted aryl or alkyl (which alkyl itself may be unsubstituted or substituted or end-capped as defined herein), or, in the case of R 21 , halogen, nitro, cyano or amino.
術語「鹵基」在本文中使用時意謂氯、溴、碘或氟基團,典型地氯或氟。 The term "halogen" as used herein means a chloro, bromo, iodo or fluoro group, typically chloro or fluoro.
術語「Het」在本文中使用時包括四至十二員、典型地四至十員環系統,該等環含有一或多個選自氮、氧、硫之雜原子以及其混合物,且該等環不含、含有一或多個雙鍵或性質上可為非芳族、部分芳族或全芳族的。環系統可為單環、雙環或稠合的。本文中所鑑別之各「Het」基團可未經取代或經 一或多個選自以下之取代基取代:鹵基、氰基、硝基、側氧基、烷基(該烷基自身可如本文所定義未經取代或經取代或封端)、-OR19、-OC(O)R20、-C(O)R21、-C(O)OR22、-N(R23)R24、-C(O)N(R25)R26、-SR29、-C(O)SR30或-C(S)N(R27)R28,其中R19至R30各自獨立地表示氫、未經取代或經取代之芳基或烷基(該烷基自身可如本文所定義未經取代或經取代或封端)、或就R21而言鹵基、硝基、氨基或氰基。術語「Het」因此包括諸如以下之基團:視情況經取代之氮雜環丁基、吡咯啶基、咪唑基、吲哚基、呋喃基、噁唑基、異噁唑基、噁二唑基、噻唑基、噻二唑基、三唑基、噁三唑基、噻三唑基、噠嗪基、嗎啉基、嘧啶基、吡嗪基、喹啉基、異喹啉基、哌啶基、吡唑基及哌嗪基。Het處之取代可在Het環之碳原子處或在適當時在雜原子中之一或多者處。 The term "Het" as used herein includes four to twelve, typically four to ten membered ring systems containing one or more heteroatoms selected from nitrogen, oxygen, sulfur and mixtures thereof, and which do not contain, contain one or more double bonds or may be non-aromatic, partially aromatic or fully aromatic in nature. The ring system may be monocyclic, bicyclic or fused. Each "Het" group identified herein may be unsubstituted or substituted with one or more substituents selected from the group consisting of halogen, cyano, nitro, pendooxy, alkyl (which alkyl itself may be unsubstituted or substituted or blocked as defined herein), -OR19 , -OC(O) R20 , -C(O) R21 , -C(O)OR22, -N( R23 ) R24 , -C(O)N( R25 ) R26 , -SR29 , -C(O) SR30 , or -C(S)N( R27 ) R28 , wherein R19 to R30 each independently represents hydrogen, unsubstituted or substituted aryl or alkyl (which alkyl itself may be unsubstituted or substituted or blocked as defined herein), or with respect to R 21 for halogen, nitro, amino or cyano. The term "Het" therefore includes radicals such as optionally substituted azacyclobutyl, pyrrolidinyl, imidazolyl, indolyl, furanyl, oxazolyl, isoxazolyl, oxadiazolyl, thiazolyl, thiadiazolyl, triazolyl, oxatriazolyl, thiatriazolyl, oxazinyl, morpholinyl, pyrimidinyl, pyrazinyl, quinolinyl, isoquinolinyl, piperidinyl, pyrazolyl and piperazinyl. The substitution at Het may be at a carbon atom of the Het ring or, where appropriate, at one or more of the heteroatoms.
「Het」基團亦可呈N氧化物形式。 The "Het" group can also be in the form of an N-oxide.
用於本發明之第四及第五態樣之催化反應的適合之視情況選用之醇可選自:C1-C30烷醇,包括芳基醇,其可視情況經一或多個選自如本文所定義之以下各者之取代基取代:烷基、芳基、Het、鹵基、氰基、硝基、OR19、OC(O)R20、C(O)R21、C(O)OR22、NR23R24、C(O)NR25R26、C(S)NR27R28、SR29或C(O)SR30。極其較佳之烷醇為C1-C8烷醇,諸如甲醇、乙醇、丙醇、異丙醇、異丁醇、第三丁基醇、苯酚、正丁醇及氯辛醯基醇,尤其甲醇。儘管單烷醇為最佳的,但亦可利用聚烷醇,其典型地選自二辛醇,諸如二醇、三醇、四醇及糖。典型地,該等多烷醇選自1,2-乙二醇、1,3-丙二醇、丙三醇、1,2,4丁三醇、2-(羥甲基)-1,3-丙二醇、1,2,6三羥基己烷、季戊四醇、1,1,1三(羥甲基)乙烷、甘露糖、轉肽酶、半乳糖及其他糖。較佳之糖包括蔗糖、果糖及葡萄糖。尤其較佳之烷醇為甲醇及乙醇。最佳之烷醇為甲醇。醇量並非至關重要。一般而言,所使用之量超過待酯化之基質之量。因此,醇亦可充當反應溶劑,儘管視需要亦可使用分離或其他溶劑。 Suitable optional alcohols for the catalytic reaction of the fourth and fifth aspects of the invention may be selected from: C1 - C30 alkanols, including aryl alcohols, which may be optionally substituted with one or more substituents selected from the following as defined herein : alkyl, aryl, Het, halogen, cyano, nitro, OR19, OC(O) R20 , C(O) R21 , C(O) OR22 , NR23R24 , C(O) NR25R26 , C(S) NR27R28 , SR29 or C( O ) SR30 . The most preferred alkanols are C 1 -C 8 alkanols such as methanol, ethanol, propanol, isopropanol, isobutanol, tert-butyl alcohol, phenol, n-butyl alcohol and chlorooctyl alcohol, especially methanol. Although monoalkanols are the most preferred, polyalkanols can also be used, which are typically selected from dioctanols such as diols, triols, tetraols and sugars. Typically, the polyalkanols are selected from 1,2-ethanediol, 1,3-propylene glycol, glycerol, 1,2,4-butanetriol, 2-(hydroxymethyl)-1,3-propanediol, 1,2,6-trihydroxyhexane, pentaerythritol, 1,1,1-tri(hydroxymethyl)ethane, mannose, transpeptidase, galactose and other sugars. Preferred sugars include sucrose, fructose and glucose. Particularly preferred alkanols are methanol and ethanol. The most preferred alkanol is methanol. The amount of alcohol is not critical. Generally, the amount used exceeds the amount of substrate to be esterified. Thus, the alcohol may also serve as the reaction solvent, although a separation or other solvent may be used as desired.
術語老化描述於例如專利申請案WO 2009/003722中。老化之一般原則描述於The Chemistry of Silica:Solubility,Polymerisation,Colloid and Surface Properties and Biochemistry of Silica:Ralph K Iler編,1979,John Wiley and Sons Inc.,ISBN 0-471-02404-X,第358-364頁中。若進行此階段,則隨後另外洗滌水凝膠以移除老化過程中所用之任何材料且使溶液達到正確的pH值以根據針對催化活性金屬之鹽選擇添加催化活性金屬。 The term ageing is described, for example, in patent application WO 2009/003722. The general principles of ageing are described in The Chemistry of Silica: Solubility, Polymerisation, Colloid and Surface Properties and Biochemistry of Silica: Ralph K Iler, ed., 1979, John Wiley and Sons Inc., ISBN 0-471-02404-X, pp. 358-364. If this stage is carried out, the hydrogel is then additionally washed to remove any material used in the ageing process and to bring the solution to the correct pH for the addition of the catalytically active metal, depending on the choice of salt for the catalytically active metal.
儘管本發明之任何態樣或其任何較佳或視情況選用之特徵的金屬、金屬氧化物及金屬氧化物部分可分別為鋯或鉿及氧化鋯或氧化鉿,但其典型地為鋯及氧化鋯及氧化鋯之部分。 Although the metal, metal oxide and metal oxide portion of any aspect of the invention or any preferred or optional feature thereof may be zirconium or einsteinium and zirconium oxide or einsteinium oxide, respectively, they are typically zirconium and zirconium oxide and portions of zirconium oxide.
如本文所用之術語「凝膠」亦為熟練人員已知,但若有疑問可視為其中分散流體之固體網路。一般而言,凝膠為其中分散流體之聚合物網路。共凝膠為用於指示超過一種原始化合物/部分併入至聚合物網中之術語,其通常為二氧化矽及金屬氧化物或鹽,諸如氧化鋯。因此,本文中之共同膠凝意謂共凝膠之形成。 The term "gel" as used herein is also known to the skilled person, but in case of doubt it can be considered as a solid network in which a fluid is dispersed. In general, a gel is a polymer network in which a fluid is dispersed. Cogel is a term used to indicate the incorporation of more than one original compound/moiety into the polymer network, which are usually silica and a metal oxide or salt, such as zirconia. Therefore, cogelation herein means the formation of a cogel.
凝膠因此為已凝結之溶膠。水凝膠因此為如本文所定義之凝膠,其中流體為水。乾凝膠為已經乾燥以移除流體之凝膠。氣凝膠為其中流體經氣體置換之凝膠且因此不進行與乾凝膠相同之收縮。 A gel is therefore a sol that has set. A hydrogel is therefore a gel as defined herein in which the fluid is water. A xerogel is a gel that has been dried to remove the fluid. An aerogel is a gel in which the fluid has been replaced by a gas and therefore does not undergo the same contraction as a xerogel.
術語開始在本文中意謂經改質二氧化矽之形成的起點。 The term start in this article means the starting point of the formation of modified silicon dioxide.
如本文相對於金屬所用之術語「部分」用以指代改質劑金屬在經改質載體上之形式。儘管改質劑金屬一般形成網路之部分,但改質劑金屬將在二氧化矽基質上呈離散殘餘物形式。應參考總計至多兩個金屬原子或類似者以指代其殘餘物之單體及/或二聚形式。適當地,在本文中本發明之態樣中,已發現具有呈單體殘餘物形式之部分為有利的。因此,術語至多2種改質劑金屬原子或類似者在本文中意謂總計1及/或2種改質劑金屬原子。在本文中,1至2種 改質劑金屬原子為較佳的,尤其較佳的為在該等部分中總計1種及/或2種鋯原子,最尤其地在該等部分中1種鋯原子。 The term "portion" as used herein with respect to a metal is used to refer to the form of the modifier metal on the modified support. Although the modifier metal generally forms part of the network, the modifier metal will be in the form of a discrete residue on the silicon dioxide matrix. Reference should be made to a total of up to two metal atoms or the like to refer to the monomeric and/or dimeric form of its residues. Appropriately, in the present invention herein, it has been found to be advantageous to have a portion in the form of a monomeric residue. Therefore, the term up to 2 modifier metal atoms or the like means in this article a total of 1 and/or 2 modifier metal atoms. In this context, 1 to 2 modifier metal atoms are preferred, particularly preferred is a total of 1 and/or 2 zirconium atoms in the moieties, most particularly 1 zirconium atom in the moieties.
術語單體或二聚意謂具有類單體或類二聚體形式或就二氧化矽上之殘餘物而言,亦即具有單體或二聚體殘餘物形式。 The term monomer or dimer means having a monomer-like or dimer-like form or, in the case of residues on silicon dioxide, having a monomer or dimer residue form.
改質劑金屬之百分比在本文中無單位,因為其係指金屬原子之數目/該等原子之總數。應瞭解,該等部分可呈非單體或非二聚團簇之形式,但此等團簇仍由改質劑金屬原子構成。 The percentage of modifier metal is unitless in this article because it refers to the number of metal atoms/total number of such atoms. It should be understood that such moieties may be in the form of non-monomer or non-dimeric clusters, but such clusters are still composed of modifier metal atoms.
實施例1 Implementation Example 1
將Fuji Silysia CARiACT Q10二氧化矽(Q10)在160℃下之實驗室烘箱中乾燥16小時,其後將其自烘箱移除且在儲存於乾燥器中之密封燒瓶中冷卻至室溫。此二氧化矽之表面積為333m2/g,孔隙體積為1.0ml/g,且平均孔徑為10nm,如藉由氮吸附/解吸附等溫線分析(Micromeretics Tristar II)所測定。經由TGA分析發現0.8個OH/nm2之矽烷醇數目。此二氧化矽主要由直徑範圍為2-4mm之球狀二氧化矽珠粒構成。 Fuji Silysia CARiACT Q10 silica (Q10) was dried in a laboratory oven at 160°C for 16 hours, after which it was removed from the oven and cooled to room temperature in a sealed flask stored in a desiccator. The surface area of this silica was 333 m2 /g, the pore volume was 1.0 ml/g, and the average pore size was 10 nm as determined by nitrogen adsorption/desorption isotherm analysis (Micromeretics Tristar II). A silanol number of 0.8 OH/ nm2 was found by TGA analysis. This silica was primarily composed of spherical silica beads with diameters ranging from 2-4 mm.
實施例2 Example 2
在氮氣流下於900℃下之管式爐中將Fuji Silysia CARiACT Q30 silica(Q30)煅燒5小時,加熱緩變率為5℃/min。隨後將其冷卻至室溫且儲存於乾燥器中之密封燒瓶中。此二氧化矽之表面積為112m2/g,孔隙體積為1.0ml/g,平均孔徑為30nm且主要由直徑範圍為2-4mm之球狀二氧化矽珠粒構成。 Fuji Silysia CARiACT Q30 silica (Q30) was calcined in a tubular furnace at 900°C for 5 hours under nitrogen flow with a heating ramp rate of 5°C/min. It was then cooled to room temperature and stored in a sealed flask in a desiccator. This silica has a surface area of 112 m2 /g, a pore volume of 1.0 ml/g, an average pore size of 30 nm and is mainly composed of spherical silica beads with a diameter range of 2-4 mm.
實施例3(0.92wt% Zr,Q10上之單體Zr) Example 3 (0.92wt% Zr, single Zr on Q10)
將0.542g Zr(acac)4(97%,Sigma Aldrich)溶解於11ml MeOH(99% Sigma Aldrich)中。在單獨的燒瓶中,稱取10g來自實施例1之二氧化矽。隨後在攪拌下將稱取之二氧化矽添加至Zr(acac)4溶液。持續攪拌直至全部Zr(acac)4溶液吸收於二氧化矽之孔隙體積中。在完成孔隙填充之後,在週期性攪拌下將經Zr改質之二氧化矽在密封燒瓶中保持16小時。此後,藉由過濾移除孔外溶液。在此之後為乾燥步驟,其中藉由在室溫下使氮氣流流經濕潤的經Zr改質之二氧化矽來移除孔內有機溶劑。可替代地,在減壓下在旋轉式蒸發器上移除孔內溶劑。在移除全部溶劑之後,在空氣流(1 l/min)下於500℃下之管式爐中煅燒經Zr改質之二氧化矽載體,加熱緩變率為5℃/min且最終保持5小時。在冷卻後,此獲得Zr接枝之二氧化矽載體,具有100% Zr使用效率。經由粉末能量分散X射線螢光分析(Oxford Instruments X-Supreme8000)測定經Zr改質之載體上之Zr載荷(wt%)。 0.542 g Zr(acac) 4 (97%, Sigma Aldrich) was dissolved in 11 ml MeOH (99% Sigma Aldrich). In a separate flask, 10 g of silica from Example 1 was weighed. The weighed silica was then added to the Zr(acac) 4 solution under stirring. Stirring was continued until all the Zr(acac) 4 solution was absorbed into the pore volume of the silica. After the pore filling was completed, the Zr-modified silica was kept in a sealed flask for 16 hours with periodic stirring. Thereafter, the extra-pore solution was removed by filtration. This is followed by a drying step, in which the pore organic solvent is removed by passing a stream of nitrogen through the moistened Zr-modified silica at room temperature. Alternatively, the pore solvent is removed on a rotary evaporator under reduced pressure. After all the solvent has been removed, the Zr-modified silica support is calcined in a tubular furnace at 500°C under an air flow (1 l/min) with a heating ramp rate of 5°C/min and a final hold of 5 hours. After cooling, this yields a Zr-grafted silica support with 100% Zr utilization efficiency. The Zr loading (wt %) on the Zr-modified support is determined by powder energy dispersive X-ray fluorescence analysis (Oxford Instruments X-Supreme8000).
實施例4(1.5wt% Zr,Q10上之單體Zr) Example 4 (1.5wt% Zr, single Zr on Q10)
進行如實施例3中所描述之載體改質,不同之處在於使用0.874g Zr(acac)4。 The support modification was carried out as described in Example 3, except that 0.874 g Zr(acac) 4 was used.
實施例5(2.3wt% Zr,Q10上之單體Zr) Example 5 (2.3wt% Zr, single Zr on Q10)
進行如實施例3中所描述之載體改質,不同之處在於使用1.38g Zr(acac)4且使用20ml 1-PrOH(99% Sigma Aldrich)代替MeOH。另外,在溶劑移除之前, 在整個16h老化步驟中持續攪拌。此獲得90% Zr使用效率。 The support modification was carried out as described in Example 3, except that 1.38 g Zr(acac) 4 was used and 20 ml 1-PrOH (99% Sigma Aldrich) was used instead of MeOH. In addition, stirring was continued throughout the 16 h aging step before solvent removal. This resulted in a 90% Zr utilization efficiency.
實施例6(2.7wt% Zr,Q10上之單體Zr) Example 6 (2.7wt% Zr, single Zr on Q10)
進行如實施例5中所描述之載體改質,不同之處在於使用1.67g Zr(acac)4且使用20ml MeOH(99% Sigma Aldrich)代替1-PrOH。此獲得89% Zr使用效率。 The support modification was carried out as described in Example 5, except that 1.67 g Zr(acac) 4 was used and 20 ml MeOH (99% Sigma Aldrich) was used instead of 1-PrOH. This resulted in 89% Zr utilization efficiency.
實施例7(4.2wt% Zr,Q10上之單體Zr) Example 7 (4.2wt% Zr, single Zr on Q10)
進行如實施例5中所描述之載體改質,不同之處在於使用2.56g Zr(acac)4且使用20ml甲苯(99% Sigma Aldrich)代替1-PrOH。此獲得93% Zr使用效率。 The support modification was carried out as described in Example 5, except that 2.56 g Zr(acac) 4 was used and 20 ml toluene (99% Sigma Aldrich) was used instead of 1-PrOH. This resulted in a 93% Zr utilization efficiency.
實施例8(0.7wt% Zr,Q30上之單體Zr) Example 8 (0.7wt% Zr, single Zr on Q30)
進行如實施例6中所描述之載體改質,不同之處在於使用0.43g Zr(acac)4且使用來自實施例2之二氧化矽。此獲得93% Zr使用效率。 The support modification was performed as described in Example 6, except that 0.43 g Zr(acac) 4 was used and the silicon dioxide from Example 2 was used. This resulted in a 93% Zr utilization efficiency.
實施例9(1.1wt% Zr,Q10上之單體Zr) Example 9 (1.1wt% Zr, single Zr on Q10)
進行如實施例5中所描述之載體改質,不同之處在於使用2.15g Zr(acac)4且使用20ml MeOH代替1-PrOH。此獲得47% Zr使用效率。 The support modification was carried out as described in Example 5, except that 2.15 g Zr(acac) 4 was used and 20 ml MeOH was used instead of 1-PrOH. This resulted in a 47% Zr utilization efficiency.
實施例10(2.2wt% Zr,Q10上之單體Zr) Example 10 (2.2wt% Zr, single Zr on Q10)
進行如實施例9中所描述之載體改質,不同之處在於使用20ml甲苯代替MeOH。此獲得93% Zr使用效率。 The carrier modification was carried out as described in Example 9, except that 20 ml of toluene was used instead of MeOH. This resulted in a Zr utilization efficiency of 93%.
實施例11(3.9wt% Zr,Q10上之單體Zr) Example 11 (3.9wt% Zr, single Zr on Q10)
進行如實施例5中所描述之載體改質,不同之處在於使用3.19g Zr(acac)4且 使用20ml庚烷(99% Sigma Aldrich)代替1-PrOH。此獲得86% Zr使用效率。 The support modification was carried out as described in Example 5, except that 3.19 g Zr(acac) 4 was used and 20 ml heptane (99% Sigma Aldrich) was used instead of 1-PrOH. This resulted in 86% Zr utilization efficiency.
實施例12(6.7wt% Zr,Q10上之二聚Zr) Example 12 (6.7wt% Zr, dimerized Zr on Q10)
進行如實施例5中所描述之載體改質,不同之處在於使用3.12g[Zr(OPr)3(acac)]2且使用20ml庚烷代替1-PrOH。此獲得95% Zr使用效率。 The support modification was carried out as described in Example 5, except that 3.12 g [Zr(OPr) 3 (acac)] 2 was used and 20 ml heptane was used instead of 1-PrOH. This resulted in a 95% Zr utilization efficiency.
實施例13(2.2wt% Zr,Q30上之三聚Zr)(比較) Example 13 (2.2wt% Zr, trimerized Zr on Q30) (Comparison)
進行如實施例5中所描述之載體改質,不同之處在於1.16g Zr(nOPr)4(於1-丙醇中之70wt%,Sigma Aldrich)。另外,使用10g來自實施例2之二氧化矽代替來自實施例1之二氧化矽。此獲得100% Zr使用效率。 The support modification was carried out as described in Example 5, except that 1.16 g Zr(nOPr) 4 (70 wt % in 1-propanol, Sigma Aldrich) was used. In addition, 10 g of silica from Example 2 was used instead of the silica from Example 1. This resulted in 100% Zr utilization efficiency.
實施例14(6.0wt% Zr,Q10上之三聚Zr)(比較) Example 14 (6.0wt% Zr, trimerized Zr on Q10) (Comparison)
進行如實施例5中所描述之載體改質,不同之處在於3.35g Zr(nOPr)4(於1-丙醇中之70wt%,Sigma Aldrich)。此獲得100% Zr使用效率。 The support modification was carried out as described in Example 5, except for 3.35 g Zr(nOPr) 4 (70 wt % in 1-propanol, Sigma Aldrich). This resulted in 100% Zr utilization efficiency.
實施例15(8.0wt% Zr,Q10上之五聚Zr)(比較) Example 15 (8.0wt% Zr, pentameric Zr on Q10) (Comparison)
進行如實施例5中所描述之載體改質,不同之處在於將2.67g乙醇鋯(IV)(97% Sigma Aldrich)以及1.77g乙酸(冰,Sigma Aldrich)溶解於20ml乙醇(無水,Sigma Aldrich)而非1-PrOH。此獲得100% Zr使用效率。 The carrier modification was carried out as described in Example 5, except that 2.67 g of zirconium (IV) ethoxide (97% Sigma Aldrich) and 1.77 g of acetic acid (ice, Sigma Aldrich) were dissolved in 20 ml of ethanol (anhydrous, Sigma Aldrich) instead of 1-PrOH. This resulted in 100% Zr utilization efficiency.
實施例16(5.4wt% Hf,Q10上之單體Hf) Example 16 (5.4wt% Hf, monomer Hf on Q10)
進行如實施例5中所描述之載體改質,不同之處在於將1.37g Hf(iOPr)4 (99% Sigma Aldrich)連同1.32g乙醯丙酮(99% Sigma Aldrich)溶解於20ml 1-PrOH中且使其混合30min,之後引入10g來自實施例1之二氧化矽。此獲得98% Hf使用效率。 The support modification was carried out as described in Example 5, except that 1.37 g Hf(iOPr) 4 (99% Sigma Aldrich) was dissolved in 20 ml 1-PrOH along with 1.32 g acetylacetone (99% Sigma Aldrich) and allowed to mix for 30 min before introducing 10 g silica from Example 1. This gave a 98% Hf utilization efficiency.
實施例17(7.8wt% Hf,Q10上之單體Hf) Example 17 (7.8wt% Hf, monomer Hf on Q10)
進行如實施例5中所描述之載體改質,不同之處在於將2.00g Hf(iOPr)4連同1.93g乙醯丙酮溶解於20ml甲苯中且使其混合30min,之後引入10g來自實施例1之二氧化矽。此獲得100% Hf使用效率。 The support modification was carried out as described in Example 5, except that 2.00 g Hf(iOPr) 4 was dissolved in 20 ml toluene together with 1.93 g acetylacetone and allowed to mix for 30 min before introducing 10 g of silica from Example 1. This resulted in 100% Hf utilization efficiency.
實施例18(11.8wt% Hf,Q10上之三聚Hf)(比較) Example 18 (11.8wt% Hf, trimerized Hf on Q10) (Comparison)
進行如實施例5中所描述之載體改質,不同之處在於將3.19g Hf(iOPr)4溶解於20ml甲苯而非1-PrOH。此獲得100% Hf使用效率。 The support modification was carried out as described in Example 5, except that 3.19 g Hf(iOPr) 4 was dissolved in 20 ml toluene instead of 1-PrOH. This resulted in 100% Hf utilization efficiency.
實施例19(單體Zr之HRTEM分析) Example 19 (HRTEM analysis of single Zr)
對所選擇之經改質二氧化矽實施例進行高分辨率穿透電子顯微術(Transmission Electron Microscopy;HRTEM)分析。為此,使用薄片切片機將經改質二氧化矽切成100-200nm厚度之顆粒。隨後將此等薄片狀顆粒安裝至銅篩上且施加抗靜電鋨蒸氣塗層。隨後使用Tecnai G2 F20(由FEI製造)在透射模式下分析安裝樣品。將電子束設定在100與300kV之間的加速電壓下,間距分辨率為1nm。藉由30pm振動膜使電子束聚焦。記錄HRTEM圖像以便在25百萬倍之放大倍數下之圖像中包括50-200個金屬奈米顆粒。對經改質二氧化矽實施例5、實施例7、實施例14、實施例15、實施例17及實施例18進行此分析。 將HRTEM圖像顯示於圖1-6中。 The selected modified silica examples were subjected to high resolution transmission electron microscopy (HRTEM) analysis. For this purpose, the modified silica was cut into particles of 100-200 nm thickness using a thin slicer. These flaky particles were then mounted on a copper screen and an antistatic silicon vapor coating was applied. The mounted samples were then analyzed in transmission mode using a Tecnai G2 F20 (manufactured by FEI). The electron beam was set at an accelerating voltage between 100 and 300 kV with a spacing resolution of 1 nm. The electron beam was focused by a 30 pm vibrating membrane. HRTEM images were recorded so that 50-200 metal nanoparticles were included in the image at a magnification of 25 million times. This analysis was performed on modified silicon dioxide Examples 5, 7, 14, 15, 17, and 18. HRTEM images are shown in Figures 1-6.
實施例20(3.2wt% Cs,0.9wt% Zr,單體Zr) Example 20 (3.2wt% Cs, 0.9wt% Zr, single Zr)
在手套箱中稱取0.458g CsOH.H2O(99.5% Sigma Aldrich)且將其溶解於20ml 9:1 v/v MeOH:H2O溶劑混合物中。在攪拌下將10g來自實施例3之經改質二氧化矽添加至CsOH溶液。將攪拌額外持續15min,其後在週期性攪拌下將樣品保持在密封燒瓶中16小時。此後,藉由過濾移除孔外溶液。在此之後為乾燥步驟,其中藉由在室溫下使氮氣流流經濕潤的經Cs/Zr改質之二氧化矽來移除孔內溶劑。可替代地,在減壓下在旋轉式蒸發器上移除孔內溶劑。在此步驟之後,將催化劑珠粒置放於110-120℃下之乾燥烘箱中且歷時16小時靜置至乾燥。在冷卻後,此獲得Cs/Zr/SiO2催化劑,具有90% Cs使用效率。經由粉末能量分散X射線螢光分析(Oxford Instruments X-Supreme8000)測定催化劑上之Cs載荷(wt%)。 0.458 g of CsOH.H 2 O (99.5% Sigma Aldrich) was weighed out in a glove box and dissolved in 20 ml of a 9:1 v/v MeOH:H 2 O solvent mixture. 10 g of the modified silica from Example 3 was added to the CsOH solution under stirring. Stirring was continued for an additional 15 min, after which the sample was kept in a sealed flask for 16 hours with periodic stirring. Thereafter, the extra-pore solution was removed by filtration. This was followed by a drying step, in which the intra-pore solvent was removed by passing a stream of nitrogen through the moistened Cs/Zr-modified silica at room temperature. Alternatively, the intra-pore solvent was removed on a rotary evaporator under reduced pressure. After this step, the catalyst beads were placed in a drying oven at 110-120°C and left to dry for 16 hours. After cooling, a Cs/Zr/ SiO2 catalyst with 90% Cs utilization efficiency was obtained. The Cs loading (wt%) on the catalyst was determined by powder energy dispersive X-ray fluorescence analysis (Oxford Instruments X-Supreme8000).
實施例21(3.7wt% Cs,0.9wt% Zr,單體Zr) Example 21 (3.7wt% Cs, 0.9wt% Zr, single Zr)
如實施例20中所描述製備催化劑,不同之處在於使用0.534g CsOH.H2O。 The catalyst was prepared as described in Example 20, except that 0.534 g CsOH.H2O was used.
實施例22(4.0wt% Cs,0.9wt% Zr,單體Zr) Example 22 (4.0wt% Cs, 0.9wt% Zr, single Zr)
如實施例20中所描述製備催化劑,不同之處在於使用0.588g CsOH.H2O。 The catalyst was prepared as described in Example 20, except that 0.588 g CsOH.H2O was used.
實施例23(4.8wt% Cs,0.9wt% Zr,單體Zr) Example 23 (4.8wt% Cs, 0.9wt% Zr, single Zr)
如實施例20中所描述製備催化劑,不同之處在於使用0.716g CsOH.H2O。 The catalyst was prepared as described in Example 20, except that 0.716 g CsOH.H2O was used.
實施例24(5.1wt% Cs,1.5wt% Zr,單體Zr) Example 24 (5.1wt% Cs, 1.5wt% Zr, single Zr)
如實施例20中所描述製備催化劑,不同之處在於使用0.754g CsOH.H2O且使用來自實施例4之經改質二氧化矽。 The catalyst was prepared as described in Example 20, except that 0.754 g CsOH.H2O was used and the modified silica from Example 4 was used.
實施例25(5.7wt% Cs,1.5wt% Zr,單體Zr) Example 25 (5.7wt% Cs, 1.5wt% Zr, single Zr)
如實施例24中所描述製備催化劑,不同之處在於使用0.852g CsOH.H2O。 The catalyst was prepared as described in Example 24, except that 0.852 g CsOH.H2O was used.
實施例26(6.7wt% Cs,1.4wt% Zr,單體Zr) Example 26 (6.7wt% Cs, 1.4wt% Zr, single Zr)
如實施例24中所描述製備催化劑,不同之處在於使用1.00g CsOH.H2O。 The catalyst was prepared as described in Example 24 except that 1.00 g of CsOH.H2O was used.
實施例27(7.7wt% Cs,1.4wt% Zr,單體Zr) Example 27 (7.7wt% Cs, 1.4wt% Zr, single Zr)
如實施例24中所描述製備催化劑,不同之處在於使用1.17g CsOH.H2O。 The catalyst was prepared as described in Example 24, except that 1.17 g CsOH.H2O was used.
實施例28(9.7wt% Cs,2.0wt% Zr,單體Zr) Example 28 (9.7wt% Cs, 2.0wt% Zr, single Zr)
如實施例20中所描述製備催化劑,不同之處在於使用1.37g CsOH.H2O且使用來自實施例5之經改質二氧化矽。另外,隨著排除過濾步驟,Cs吸附時間自16小時縮短至2小時。乾燥經改質二氧化矽載體之孔隙體積中之過量有機溶劑且獲得100%之Cs使用效率。 The catalyst was prepared as described in Example 20, except that 1.37 g CsOH.H2O was used and the modified silica from Example 5 was used. In addition, with the elimination of the filtration step, the Cs adsorption time was reduced from 16 hours to 2 hours. The excess organic solvent in the pore volume of the modified silica support was dried and 100% Cs utilization efficiency was obtained.
實施例29(10.2wt% Cs,2.0wt% Zr,單體Zr) Example 29 (10.2wt% Cs, 2.0wt% Zr, single Zr)
如實施例28中所描述製備催化劑,不同之處在於使用1.45g CsOH.H2O。 The catalyst was prepared as described in Example 28, except that 1.45 g CsOH.H2O was used.
實施例30(10.8wt% Cs,2.0wt% Zr,單體Zr) Example 30 (10.8wt% Cs, 2.0wt% Zr, single Zr)
如實施例28中所描述製備催化劑,不同之處在於使用1.54g CsOH.H2O。 The catalyst was prepared as described in Example 28, except that 1.54 g CsOH.H2O was used.
實施例31(11.3wt% Cs,2.0wt% Zr,單體Zr) Example 31 (11.3wt% Cs, 2.0wt% Zr, single Zr)
如實施例28中所描述製備催化劑,不同之處在於使用1.62g CsOH.H2O。 The catalyst was prepared as described in Example 28, except that 1.62 g CsOH.H2O was used.
實施例32(9.2wt% Cs,2.4wt% Zr,單體Zr) Example 32 (9.2wt% Cs, 2.4wt% Zr, single Zr)
如實施例20中所描述製備催化劑,不同之處在於使用1.44g CsOH.H2O且使用來自實施例6之經改質二氧化矽。 The catalyst was prepared as described in Example 20, except that 1.44 g CsOH.H2O was used and the modified silica from Example 6 was used.
實施例33(10.9wt% Cs,2.4wt% Zr,單體Zr) Example 33 (10.9wt% Cs, 2.4wt% Zr, single Zr)
如實施例32中所描述製備催化劑,不同之處在於使用1.74g CsOH.H2O。 The catalyst was prepared as described in Example 32, except that 1.74 g CsOH.H2O was used.
實施例34(13.0wt% Cs,2.3wt% Zr,單體Zr) Example 34 (13.0wt% Cs, 2.3wt% Zr, single Zr)
如實施例32中所描述製備催化劑,不同之處在於使用2.12g CsOH.H2O。 The catalyst was prepared as described in Example 32, except that 2.12 g CsOH.H2O was used.
實施例35(14.0wt% Cs,2.3wt% Zr,單體Zr) Example 35 (14.0wt% Cs, 2.3wt% Zr, single Zr)
如實施例32中所描述製備催化劑,不同之處在於使用2.30g CsOH.H2O。 The catalyst was prepared as described in Example 32, except that 2.30 g CsOH.H2O was used.
實施例36(12.3wt% Cs,3.7wt% Zr,單體Zr) Example 36 (12.3wt% Cs, 3.7wt% Zr, single Zr)
如實施例20中所描述製備催化劑,不同之處在於使用2.00g CsOH.H2O且使用來自實施例7之經改質二氧化矽。 The catalyst was prepared as described in Example 20, except that 2.00 g of CsOH.H2O was used and the modified silica from Example 7 was used.
實施例37(12.6wt% Cs,3.7wt% Zr,單體Zr) Example 37 (12.6wt% Cs, 3.7wt% Zr, single Zr)
如實施例36中所描述製備催化劑,不同之處在於使用2.05g CsOH.H2O。 The catalyst was prepared as described in Example 36 except that 2.05 g CsOH.H2O was used.
實施例38(13.9wt% Cs,3.6wt% Zr,單體Zr) Example 38 (13.9wt% Cs, 3.6wt% Zr, single Zr)
如實施例36中所描述製備催化劑,不同之處在於使用2.30g CsOH.H2O。 The catalyst was prepared as described in Example 36 except that 2.30 g CsOH.H2O was used.
實施例39(15.4wt% Cs,3.6wt% Zr,單體Zr) Example 39 (15.4wt% Cs, 3.6wt% Zr, single Zr)
如實施例36中所描述製備催化劑,不同之處在於使用2.60g CsOH.H2O。 The catalyst was prepared as described in Example 36 except that 2.60 g CsOH.H2O was used.
實施例40(2.8wt% Cs,0.7wt% Zr,單體Zr) Example 40 (2.8wt% Cs, 0.7wt% Zr, single Zr)
如實施例28中所描述製備催化劑,不同之處在於使用0.37g CsOH.H2O且使用來自實施例8之經改質二氧化矽。 The catalyst was prepared as described in Example 28, except that 0.37 g CsOH.H2O was used and the modified silica from Example 8 was used.
實施例41(3.4wt% Cs,0.7wt% Zr,單體Zr) Example 41 (3.4wt% Cs, 0.7wt% Zr, single Zr)
如實施例40中所描述製備催化劑,不同之處在於使用0.45g CsOH.H2O。 The catalyst was prepared as described in Example 40 except that 0.45 g CsOH.H2O was used.
實施例42(3.9wt% Cs,0.7wt% Zr,單體Zr) Example 42 (3.9wt% Cs, 0.7wt% Zr, single Zr)
如實施例40中所描述製備催化劑,不同之處在於使用0.51g CsOH.H2O。 The catalyst was prepared as described in Example 40 except that 0.51 g CsOH.H2O was used.
實施例43(4.1wt% Cs,1.0wt% Zr,單體Zr) Example 43 (4.1wt% Cs, 1.0wt% Zr, single Zr)
如實施例20中所描述製備催化劑,不同之處在於使用0.60g CsOH.H2O且使用來自實施例9之經改質二氧化矽。 The catalyst was prepared as described in Example 20, except that 0.60 g of CsOH.H2O was used and the modified silica from Example 9 was used.
實施例44(4.6wt% Cs,1.0wt% Zr,單體Zr) Example 44 (4.6wt% Cs, 1.0wt% Zr, single Zr)
如實施例43中所描述製備催化劑,不同之處在於使用0.68g CsOH.H2O。 The catalyst was prepared as described in Example 43, except that 0.68 g CsOH.H2O was used.
實施例45(5.5wt% Cs,1.0wt% Zr,單體Zr) Example 45 (5.5wt% Cs, 1.0wt% Zr, single Zr)
如實施例43中所描述製備催化劑,不同之處在於使用0.82g CsOH.H2O。 The catalyst was prepared as described in Example 43, except that 0.82 g CsOH.H2O was used.
實施例46(9.1wt% Cs,2.0wt% Zr,單體Zr) Example 46 (9.1wt% Cs, 2.0wt% Zr, single Zr)
如實施例20中所描述製備催化劑,不同之處在於使用1.42g CsOH.H2O且使用來自實施例10之經改質二氧化矽。 The catalyst was prepared as described in Example 20, except that 1.42 g CsOH.H2O was used and the modified silica from Example 10 was used.
實施例47(9.9wt% Cs,1.9wt% Zr,單體Zr) Example 47 (9.9wt% Cs, 1.9wt% Zr, single Zr)
如實施例46中所描述製備催化劑,不同之處在於使用1.55g CsOH.H2O。 The catalyst was prepared as described in Example 46 except that 1.55 g CsOH.H2O was used.
實施例48(13.8wt% Cs,3.3wt% Zr,單體Zr) Example 48 (13.8wt% Cs, 3.3wt% Zr, single Zr)
如實施例20中所描述製備催化劑,不同之處在於使用2.28g CsOH.H2O且使用來自實施例11之經改質二氧化矽。 The catalyst was prepared as described in Example 20, except that 2.28 g CsOH.H2O was used and the modified silica from Example 11 was used.
實施例49(15.0wt% Cs,3.3wt% Zr,單體Zr) Example 49 (15.0wt% Cs, 3.3wt% Zr, single Zr)
如實施例48中所描述製備催化劑,不同之處在於使用2.51g CsOH.H2O。 The catalyst was prepared as described in Example 48, except that 2.51 g CsOH.H2O was used.
實施例50(14.0wt% Cs,5.7wt% Zr,二聚Zr)(比較) Example 50 (14.0wt% Cs, 5.7wt% Zr, dimeric Zr) (Comparison)
如實施例20中所描述製備催化劑,不同之處在於使用2.34g CsOH.H2O且使用來自實施例12之經改質二氧化矽。 The catalyst was prepared as described in Example 20, except that 2.34 g CsOH.H2O was used and the modified silica from Example 12 was used.
實施例51(15.0wt% Cs,5.7wt% Zr,二聚Zr)(比較) Example 51 (15.0wt% Cs, 5.7wt% Zr, dimeric Zr) (Comparison)
如實施例50中所描述製備催化劑,不同之處在於使用2.54g CsOH.H2O。 The catalyst was prepared as described in Example 50, except that 2.54 g CsOH.H2O was used.
實施例52(16.1wt% Cs,5.6wt% Zr,二聚Zr)(比較) Example 52 (16.1wt% Cs, 5.6wt% Zr, dimeric Zr) (Comparison)
如實施例50中所描述製備催化劑,不同之處在於使用2.76g CsOH.H2O。 The catalyst was prepared as described in Example 50 except that 2.76 g CsOH.H2O was used.
實施例53(17.3wt% Cs,5.5wt% Zr,二聚Zr)(比較) Example 53 (17.3wt% Cs, 5.5wt% Zr, dimeric Zr) (Comparison)
如實施例50中所描述製備催化劑,不同之處在於使用3.01g CsOH.H2O。 The catalyst was prepared as described in Example 50 except that 3.01 g CsOH.H2O was used.
實施例54(6.0wt% Cs,2.1wt% Zr,三聚Zr)(比較) Example 54 (6.0wt% Cs, 2.1wt% Zr, trimerized Zr) (Comparison)
如實施例28中所描述製備催化劑,不同之處在於使用0.81g CsOH.H2O且使用來自實施例13之經改質二氧化矽。 The catalyst was prepared as described in Example 28, except that 0.81 g CsOH.H2O was used and the modified silica from Example 13 was used.
實施例55(7.7wt% Cs,2.0wt% Zr,三聚Zr)(比較) Example 55 (7.7wt% Cs, 2.0wt% Zr, trimerized Zr) (Comparison)
如實施例54中所描述製備催化劑,不同之處在於使用1.06g CsOH.H2O。 The catalyst was prepared as described in Example 54 except that 1.06 g CsOH.H2O was used.
實施例56(13.6wt% Cs,5.2wt% Zr,三聚Zr)(比較) Example 56 (13.6wt% Cs, 5.2wt% Zr, trimerized Zr) (Comparison)
如實施例28中所描述製備催化劑,不同之處在於使用2.03g CsOH.H2O且使用來自實施例14之經改質二氧化矽。 The catalyst was prepared as described in Example 28, except that 2.03 g CsOH.H2O was used and the modified silica from Example 14 was used.
實施例57(14.9wt% Cs,5.1wt% Zr,三聚Zr)(比較) Example 57 (14.9wt% Cs, 5.1wt% Zr, trimerized Zr) (Comparison)
如實施例56中所描述製備催化劑,不同之處在於使用2.26g CsOH.H2O。 The catalyst was prepared as described in Example 56, except that 2.26 g CsOH.H2O was used.
實施例58(16.1wt% Cs,5.0wt% Zr,三聚Zr)(比較) Example 58 (16.1wt% Cs, 5.0wt% Zr, trimerized Zr) (Comparison)
如實施例56中所描述製備催化劑,不同之處在於使用2.48g CsOH.H2O。 The catalyst was prepared as described in Example 56, except that 2.48 g CsOH.H2O was used.
實施例59(17.3wt% Cs,5.0wt% Zr,三聚Zr)(比較) Example 59 (17.3wt% Cs, 5.0wt% Zr, trimerized Zr) (Comparison)
如實施例56中所描述製備催化劑,不同之處在於使用2.70g CsOH.H2O。 The catalyst was prepared as described in Example 56 except that 2.70 g CsOH.H2O was used.
實施例60(12.3wt% Cs,7.0wt% Zr,五聚Zr)(比較) Example 60 (12.3wt% Cs, 7.0wt% Zr, pentameric Zr) (Comparison)
如實施例28中所描述製備催化劑,不同之處在於使用1.82g CsOH.H2O且使用來自實施例15之經改質二氧化矽。 The catalyst was prepared as described in Example 28, except that 1.82 g CsOH.H 2 O was used and the modified silica from Example 15 was used.
實施例61(14.0wt% Cs,6.9wt% Zr,五聚Zr)(比較) Example 61 (14.0wt% Cs, 6.9wt% Zr, pentameric Zr) (Comparison)
如實施例60中所描述製備催化劑,不同之處在於使用2.12g CsOH.H2O。 The catalyst was prepared as described in Example 60 except that 2.12 g CsOH.H2O was used.
實施例62(15.7wt% Cs,6.7wt% Zr,五聚Zr)(比較) Example 62 (15.7wt% Cs, 6.7wt% Zr, pentameric Zr) (Comparison)
如實施例60中所描述製備催化劑,不同之處在於使用2.42g CsOH.H2O。 The catalyst was prepared as described in Example 60 except that 2.42 g CsOH.H2O was used.
實施例63(18.9wt% Cs,6.5wt% Zr,五聚Zr)(比較) Example 63 (18.9wt% Cs, 6.5wt% Zr, pentameric Zr) (Comparison)
如實施例60中所描述製備催化劑,不同之處在於使用2.99g CsOH.H2O。 The catalyst was prepared as described in Example 60 except that 2.99 g CsOH.H2O was used.
實施例64(8.8wt% Cs,4.9wt% Hf,單體Hf) Example 64 (8.8wt% Cs, 4.9wt% Hf, single Hf)
如實施例28中所描述製備催化劑,不同之處在於使用1.23g CsOH.H2O且使用來自實施例16之經改質二氧化矽。 The catalyst was prepared as described in Example 28, except that 1.23 g CsOH.H2O was used and the modified silica from Example 16 was used.
實施例65(10.1wt% Cs,4.9wt% Hf,單體Hf) Example 65 (10.1wt% Cs, 4.9wt% Hf, single Hf)
如實施例64中所描述製備催化劑,不同之處在於使用1.43g CsOH.H2O。 The catalyst was prepared as described in Example 64 except that 1.43 g CsOH.H2O was used.
實施例66(11.4wt% Cs,4.8wt% Hf,單體Hf) Example 66 (11.4wt% Cs, 4.8wt% Hf, single Hf)
如實施例64中所描述製備催化劑,不同之處在於使用1.64g CsOH.H2O。 The catalyst was prepared as described in Example 64, except that 1.64 g CsOH.H2O was used.
實施例67(12.6wt% Cs,4.7wt% Hf,單體Hf) Example 67 (12.6wt% Cs, 4.7wt% Hf, single Hf)
如實施例64中所描述製備催化劑,不同之處在於使用1.84g CsOH.H2O。 The catalyst was prepared as described in Example 64, except that 1.84 g CsOH.H2O was used.
實施例68(11.1wt% Cs,6.9wt% Hf,單體Hf) Example 68 (11.1wt% Cs, 6.9wt% Hf, single Hf)
如實施例28中所描述製備催化劑,不同之處在於使用1.60g CsOH.H2O且使用來自實施例17之經改質二氧化矽。 The catalyst was prepared as described in Example 28, except that 1.60 g of CsOH.H2O was used and the modified silica from Example 17 was used.
實施例69(12.7wt% Cs,6.8wt% Hf,單體Hf) Example 69 (12.7wt% Cs, 6.8wt% Hf, single Hf)
如實施例68中所描述製備催化劑,不同之處在於使用1.86g CsOH.H2O。 The catalyst was prepared as described in Example 68 except that 1.86 g CsOH.H2O was used.
實施例70(14.3wt% Cs,6.7 wt5 Hf,單體Hf) Example 70 (14.3wt% Cs, 6.7wt5 Hf, monomer Hf)
如實施例68中所描述製備催化劑,不同之處在於使用2.14g CsOH.H2O。 The catalyst was prepared as described in Example 68 except that 2.14 g CsOH.H2O was used.
實施例71(15.8wt% Cs,6.6wt% Hf,單體Hf) Example 71 (15.8wt% Cs, 6.6wt% Hf, single Hf)
如實施例68中所描述製備催化劑,不同之處在於使用2.41g CsOH.H2O。 The catalyst was prepared as described in Example 68 except that 2.41 g CsOH.H2O was used.
實施例72(13.7wt% Cs,10.2wt% Hf,三聚Hf)(比較) Example 72 (13.7wt% Cs, 10.2wt% Hf, trimerized Hf) (Comparison)
如實施例20中所描述製備催化劑,不同之處在於使用2.28g CsOH.H2O且使用來自實施例18之經改質二氧化矽。 The catalyst was prepared as described in Example 20, except that 2.28 g of CsOH.H2O was used and the modified silica from Example 18 was used.
實施例73(14.9wt% Cs,10.0wt% Hf,三聚Hf)(比較) Example 73 (14.9wt% Cs, 10.0wt% Hf, trimerized Hf) (Comparison)
如實施例72中所描述製備催化劑,不同之處在於使用2.51g CsOH.H2O。 The catalyst was prepared as described in Example 72 except that 2.51 g CsOH.H2O was used.
實施例74(16.2wt% Cs,9.9wt% Hf,三聚Hf)(比較) Example 74 (16.2wt% Cs, 9.9wt% Hf, trimerized Hf) (Comparison)
如實施例72中所描述製備催化劑,不同之處在於使用2.77g CsOH.H2O。 The catalyst was prepared as described in Example 72 except that 2.77 g CsOH.H2O was used.
實施例75(16.0wt% Cs,3.4wt% Zr,100%單體Zr) Example 75 (16.0wt% Cs, 3.4wt% Zr, 100% monomer Zr)
如實施例20中所描述製備催化劑,不同之處在於使用2.71g CsOH.H2O且使用10g來自實施例7之經改質二氧化矽。另外,在將催化劑乾燥之後,使用研缽及研杵將其碾碎且篩分至0.1-1.0mm尺寸級分。此獲得催化劑,以wt% Zr計具有100%單體含量。 The catalyst was prepared as described in Example 20, except that 2.71 g CsOH.H2O was used and 10 g of modified silica from Example 7 was used. Additionally, after drying the catalyst, it was crushed using a mortar and pestle and sieved to a size fraction of 0.1-1.0 mm. This gave a catalyst with 100% monomer content based on wt% Zr.
實施例76(15.8Wt% Cs,3.6wt% Zr,79%單體Zr)(比較) Example 76 (15.8wt% Cs, 3.6wt% Zr, 79% monomer Zr) (Comparison)
如實施例75中所描述製備催化劑,不同之處在於使用2.67g CsOH.H2O。另外,將8.5g來自實施例7之經改質二氧化矽及1.5g來自實施例14之經改質二氧化矽用作催化劑載體。此獲得催化劑,以wt% Zr計具有79%單體含量。 The catalyst was prepared as described in Example 75, except that 2.67 g CsOH.H 2 O was used. In addition, 8.5 g of the modified silica from Example 7 and 1.5 g of the modified silica from Example 14 were used as catalyst supports. This gave a catalyst having a monomer content of 79% based on wt% Zr.
實施例77(15.4wt% Cs,3.9wt% Zr,61%單體Zr)(比較) Example 77 (15.4wt% Cs, 3.9wt% Zr, 61% monomer Zr) (Comparison)
如實施例75中所描述製備催化劑,不同之處在於使用2.60g CsOH.H2O。另外,將7g來自實施例7之經改質二氧化矽及3g來自實施例14之經改質二氧化矽用作催化劑載體。此獲得催化劑,以wt% Zr計具有61%單體含量。 The catalyst was prepared as described in Example 75, except that 2.60 g CsOH.H 2 O was used. In addition, 7 g of modified silica from Example 7 and 3 g of modified silica from Example 14 were used as catalyst supports. This gave a catalyst having a monomer content of 61% based on wt% Zr.
實施例78(15.7wt% Cs,4.4wt% Zr,31%單體Zr)(比較) Example 78 (15.7wt% Cs, 4.4wt% Zr, 31% monomer Zr) (Comparison)
如實施例75中所描述製備催化劑,不同之處在於使用2.66g CsOH.H2O。另外,將4g來自實施例7之經改質二氧化矽及6g來自實施例14之經改質二氧化矽用作催化劑載體。此獲得催化劑,以wt% Zr計具有31%單體含量。 The catalyst was prepared as described in Example 75, except that 2.66 g CsOH.H 2 O was used. In addition, 4 g of modified silica from Example 7 and 6 g of modified silica from Example 14 were used as catalyst supports. This gave a catalyst having a monomer content of 31% based on wt% Zr.
實施例79(16.9wt% Cs,5.0wt% Zr,0%單體Zr)(比較) Example 79 (16.9wt% Cs, 5.0wt% Zr, 0% monomer Zr) (Comparison)
如實施例75中所描述製備催化劑,不同之處在於使用2.92g CsOH.H2O。另外,將10g來自實施例14之經改質二氧化矽用作催化劑載體。此獲得催化劑,以wt% Zr計具有0%單體含量。 The catalyst was prepared as described in Example 75, except that 2.92 g CsOH.H 2 O was used. In addition, 10 g of modified silica from Example 14 was used as catalyst support. This gave a catalyst having 0% monomer content based on wt% Zr.
實施例80(催化效能測試) Example 80 (Catalytic performance test)
針對丙酸甲酯與甲醛在實驗室規模微反應器中之反應測試實施例20至實施例79之催化劑。為此,將3g催化劑裝載於中內部管直徑為10mm之固定床反應器。將反應器加熱至330℃且藉由進料氣化物料流進行預處理,該物料流由70wt%丙酸甲酯、20wt%甲醇、6wt%水及4wt%甲醛構成,由Gilson泵以0.032ml/min自蒸餾器進料。持續此預處理隔夜。在預處理之後,藉由Gilson泵將由75.6wt%丙酸甲酯、18.1wt%甲醇、5.7wt%甲醛及0.6wt%水構成之進料流泵送至設定在330℃下之蒸餾器,之後進料至含有催化劑之設定在330℃下之加熱反應器。反應器出口蒸氣經冷卻及濃縮,收集五個不同液體進料速率(在0.64-0.032ml/min之間)下之樣品以便獲得不同蒸氣/催化劑接觸時間之轉化率。藉由具有DB1701管柱之Shimadzu 2010氣相層析分析液體進料及濃縮之實施例反應器液體產物。自各別層析圖測定樣品組成且測定不同接觸時間下之產率及選擇性。活性定義為針對丙酸甲酯進料獲得10% MMA+MAA產率所需之接觸時間(以秒計)之倒數且經由接觸時間相對於MMA+MAA產率圖式之內插法測定。隨後使用此內插之接觸時間獲得10% MMA+MAA產率下之MMA+MAA選擇性。 The catalysts of Examples 20 to 79 were tested for the reaction of methyl propionate with formaldehyde in a laboratory-scale microreactor. For this purpose, 3 g of the catalyst were loaded in a fixed bed reactor with an internal tube diameter of 10 mm. The reactor was heated to 330° C. and pretreated by feeding a gasification stream consisting of 70 wt % methyl propionate, 20 wt % methanol, 6 wt % water and 4 wt % formaldehyde, fed from the distiller at 0.032 ml/min by a Gilson pump. This pretreatment was continued overnight. After pretreatment, a feed stream consisting of 75.6 wt% methyl propionate, 18.1 wt% methanol, 5.7 wt% formaldehyde and 0.6 wt% water was pumped to a distiller set at 330°C by a Gilson pump and then fed to a heated reactor set at 330°C containing a catalyst. The reactor outlet vapor was cooled and concentrated, and samples were collected at five different liquid feed rates (between 0.64-0.032 ml/min) to obtain conversions at different vapor/catalyst contact times. The liquid feed and concentrated Example reactor liquid product were analyzed by Shimadzu 2010 gas chromatograph with a DB1701 column. The sample composition was determined from the individual chromatograms and the yield and selectivity were determined at different contact times. Activity was defined as the reciprocal of the contact time (in seconds) required to obtain a 10% MMA+MAA yield for methyl propionate feed and was determined by interpolation of the contact time relative to the MMA+MAA yield graph. This interpolated contact time was then used to obtain the MMA+MAA selectivity at 10% MMA+MAA yield.
實施例81(加速老化測試) Example 81 (Accelerated Aging Test)
在加速老化測試中評估催化劑燒結抗性。為此,將1g催化劑裝載於U形管不鏽鋼反應器中且裝載於烘箱中。將烘箱加熱至385℃且使氮氣流(10ml/min)穿過加熱至92℃之含有水之飽和蒸餾器。此確保水分壓為0.75bara之 進料流傳遞經過加熱至385℃之催化劑上方。週期性地,使用氮吸附/解吸附等溫線分析(Micromeretics Tristar II)異位測定催化劑樣品之表面積。使用所量測之表面積值測定各催化劑之燒結速率常數且以g3.m-6.d-1描述。燒結常數愈高,催化劑之燒結抗性愈低。對實施例32、實施例38、實施例57及實施例63進行此測試。 The sintering resistance of the catalysts was evaluated in an accelerated aging test. For this, 1 g of the catalyst was loaded in a U-tube stainless steel reactor and loaded in an oven. The oven was heated to 385° C. and a nitrogen stream (10 ml/min) was passed through a saturated distiller containing water heated to 92° C. This ensured that a feed stream with a water pressure of 0.75 bara was passed over the catalyst heated to 385° C. Periodically, the surface area of the catalyst samples was determined ex situ using nitrogen adsorption/desorption isotherm analysis (Micromeretics Tristar II). The sintering rate constant of each catalyst was determined using the measured surface area values and described in g 3 .m -6 .d -1 . The higher the sintering constant, the lower the sintering resistance of the catalyst. This test was performed on Example 32, Example 38, Example 57 and Example 63.
實施例82及實施例83(比較) Example 82 and Example 83 (Comparison)
根據EP 1233330中所揭示之實驗實施例製備實施例。在此等實施例中,所採用之二氧化矽為凝膠二氧化矽,呈直徑在2-4mm範圍內之球形形式,純度超過99%,總表面積為約300-350m2/g,且孔隙體積為1.04cm3/g,其中76%之孔隙體積由直徑在7-23nm範圍內之孔隙提供。 The examples were prepared according to the experimental examples disclosed in EP 1233330. In these examples, the silica employed was gelled silica in the form of spheres with diameters in the range of 2-4 mm, with a purity of over 99%, a total surface area of about 300-350 m2 /g, and a pore volume of 1.04 cm3 /g, of which 76% was provided by pores with diameters in the range of 7-23 nm.
藉由以下製備兩種催化劑:利用足以填充載體孔隙之硝酸鋯之水溶液浸沒二氧化矽,及在旋轉式蒸發器中乾燥且隨後在120℃下之空氣烘箱中乾燥2小時。在一種情況下,(實施例25),藉由在添加溶液之前抽空載體孔隙輔助鋯溶液之浸漬。在另一情況(實施例26)中,在空氣之大氣壓下進行鋯溶液之浸漬。隨後使用碳酸銫之水溶液藉由相似程序併入銫,以得到4重量%之銫含量(以金屬表示)。隨後在450℃下於空氣中將催化劑煅燒3小時。 Two catalysts were prepared by impregnating silica with an aqueous solution of zirconium nitrate sufficient to fill the pores of the support and drying in a rotary evaporator and subsequently in an air oven at 120°C for 2 hours. In one case, (Example 25), the impregnation of the zirconium solution was assisted by evacuating the pores of the support before adding the solution. In the other case (Example 26), the impregnation of the zirconium solution was carried out under atmospheric pressure of air. Caustic was then incorporated by a similar procedure using an aqueous solution of csium carbonate to obtain a csium content of 4% by weight (expressed as metal). The catalyst was then calcined at 450°C in air for 3 hours.
在與實施例24中描述之條件相同之條件下測試催化劑。一種催化劑(實施例25)未能獲得10%產率且展示最高獲得產率(9.6%)之選擇性。 The catalysts were tested under the same conditions as described in Example 24. One catalyst (Example 25) failed to achieve 10% yield and exhibited the highest selectivity for achieving yield (9.6%).
經Zr及Hf改質之二氧化矽實施例(實施例5、實施例7、實施例14、實施例15、實施例17及實施例18)之HRTEM圖像(實施例19)展示於圖1至圖6中。就單體Zr及Hf之HRTEM圖像而言,難以清晰區分Zr或Hf顆粒且此表明在經改質二氧化矽表面上存在極小的Zr/Hf奈米顆粒。此歸因於Zr或Hf以單原子原子形式存在。就三聚Zr或Hf及五聚Zr實施例而言,可在經改質載體HRTEM圖像上清晰區分Zr或Hf團簇。此資料證實,Zr或Hf物種之溶液相核性自溶液轉移至最終催化劑調配物。 HRTEM images of the Zr and Hf modified silica examples (Example 5, Example 7, Example 14, Example 15, Example 17 and Example 18) (Example 19) are shown in Figures 1 to 6. For the HRTEM images of monomeric Zr and Hf, it is difficult to clearly distinguish the Zr or Hf particles and this indicates the presence of very small Zr/Hf nanoparticles on the surface of the modified silica. This is attributed to the presence of Zr or Hf in the form of single atoms. For the trimerized Zr or Hf and pentamerized Zr examples, Zr or Hf clusters can be clearly distinguished on the modified support HRTEM images. This data confirms that the solution phase nuclei of the Zr or Hf species are transferred from the solution to the final catalyst formulation.
自表1及表2構建之活性及選擇性資料 Activity and selectivity data constructed from Table 1 and Table 2
圖7中展示在實施例20至實施例74中製備之催化劑之MMA+MAA選擇性(%)相對於催化劑活性。自此圖式,顯而易見的係,三聚Zr及Hf以及五聚Zr在所檢測之整個活性範圍內導致較低之MMA+MAA選擇性。在相當之Zr及Cs負載量下,相比於三聚Zr催化劑,二聚Zr催化劑展示改善之選擇性。 Figure 7 shows the MMA+MAA selectivity (%) versus catalyst activity for the catalysts prepared in Examples 20 to 74. From this figure, it is apparent that trimerized Zr and Hf as well as pentamerized Zr result in lower MMA+MAA selectivity over the entire activity range tested. At equivalent Zr and Cs loadings, the dimerized Zr catalyst exhibits improved selectivity compared to the trimerized Zr catalyst.
自表3構建之活性及選擇性資料 Activity and selectivity data constructed from Table 3
圖8中展示在實施例75至實施例79中製備之混合單體/三聚體催化劑之催化劑選擇性。Zr單體含量經計算為以單體形式存在之Zr含量的%。在此等實施例中,催化劑經碾碎且篩分至0.1-1.0mm顆粒以便增加樣品均質性。自此圖式, 顯而易見的係,減少Zr單體在調配物中之量將導致MMA+MAA選擇性降低。 Figure 8 shows the catalyst selectivity of the mixed monomer/trimer catalysts prepared in Examples 75 to 79. The Zr monomer content was calculated as % of the Zr content in monomer form. In these examples, the catalyst was crushed and sieved to 0.1-1.0 mm particles to increase sample homogeneity. From this figure, it is obvious that reducing the amount of Zr monomer in the formulation will result in a decrease in MMA+MAA selectivity.
自表4構建之燒結抗性資料 Sintering resistance data constructed from Table 4
圖9中展示如藉由實施例81中所描述之高級老化測試所測定之催化劑燒結常數。自圖9,顯而易見的係,單體Zr催化劑在相當之催化劑活性下顯示較低之燒結速率。 Figure 9 shows the catalyst sintering constants as determined by the advanced aging test described in Example 81. From Figure 9, it is apparent that the monomer Zr catalyst exhibits a lower sintering rate at comparable catalyst activity.
應注意與本申請案有關之本說明書同時或在此之前申請且以本說明書對公眾檢閱開放之所有文本及文獻,且所有該等文本及文獻之內容均以引用方式併入本文中。 Attention should be paid to all texts and documents related to this application that were filed at the same time or before this specification and are open to public inspection with this specification, and the contents of all such texts and documents are incorporated into this article by reference.
本說明書中所揭示之所有特徵(包括任何隨附申請專利範圍、摘要及圖式)及/或如此揭示之任何方法或製程之所有步驟可以任何組合形式組合,此類特徵及/或步驟中之至少一些相互排斥之組合除外。 All features disclosed in this specification (including any accompanying claims, abstracts and drawings) and/or all steps of any method or process so disclosed may be combined in any combination, except for at least some mutually exclusive combinations of such features and/or steps.
除非另外明確說明,否則本說明書(包括任何隨附申請專利範圍、摘要及圖式)中所揭示之各特徵可經達成相同、等效或類似目的之替代特徵置換。因此,除非另外明確說明,否則所揭示每一特徵僅為一系列通用等效或類似特徵之一個實例。 Unless expressly stated otherwise, each feature disclosed in this specification (including any accompanying patent claims, abstracts and drawings) may be replaced by alternative features that achieve the same, equivalent or similar purpose. Therefore, unless expressly stated otherwise, each feature disclosed is only one example of a series of general equivalent or similar features.
本發明不限於前述實施例之細節。本發明延伸至本說明書(包括任何隨附申請專利範圍、摘要或圖示)中所揭示之較佳、典型或視情況選用之本發明特徵之任何新穎者、或任何新穎組合,或延伸至因此揭示之任何方法或方法之較佳、典型或視情況選用之本發明之任何新穎者、或任何新穎組合。 The present invention is not limited to the details of the aforementioned embodiments. The present invention extends to any novel features of the present invention disclosed in this specification (including any accompanying patent scope, abstract or diagram), or any novel combination thereof, or to any method disclosed thereby, or any novel features of the present invention disclosed in this specification, or any novel combinations thereof.
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