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TWI863912B - Machinability improvement film, laminated machinability improvement film and method of using machinability improvement film - Google Patents

Machinability improvement film, laminated machinability improvement film and method of using machinability improvement film Download PDF

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TWI863912B
TWI863912B TW108118430A TW108118430A TWI863912B TW I863912 B TWI863912 B TW I863912B TW 108118430 A TW108118430 A TW 108118430A TW 108118430 A TW108118430 A TW 108118430A TW I863912 B TWI863912 B TW I863912B
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machinability
film
active energy
enhancing
energy ray
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TW202010808A (en
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小鯖翔
高橋洋一
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日商琳得科股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F265/00Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • C08F265/04Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
    • C08F265/06Polymerisation of acrylate or methacrylate esters on to polymers thereof
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/22Plastics; Metallised plastics
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/40Adhesives in the form of films or foils characterised by release liners
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J9/00Adhesives characterised by their physical nature or the effects produced, e.g. glue sticks
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2333/00Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
    • C08J2333/04Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
    • C08J2333/06Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/30Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
    • C09J2301/312Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/40Additional features of adhesives in the form of films or foils characterized by the presence of essential components
    • C09J2301/416Additional features of adhesives in the form of films or foils characterized by the presence of essential components use of irradiation

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Materials Engineering (AREA)
  • Laminated Bodies (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Polarising Elements (AREA)
  • Adhesive Tapes (AREA)

Abstract

Provided is a machinability improvement film and the like which acquire an excellent cutting ability and an excellent durability by bonding a resin plate, a functional film and the like via a machinability improvement layer. A machinability improvement film and the like, comprises an active energy lay-curable machinability improvement layer for bonding to a resin plate, which is formed by laminating on a predetermined substrate, wherein, in a machinability improvement layer in state of being bonded to the resin plate, a storage modulus(M2) after irradiation of an active energy lay is a value of 0.2 MPa or more and an adhesion(P2) after irradiation of an active energy lay is a value of 10 N/25mm or more.

Description

機械加工性提升薄膜、積層體及機械加工性提升薄膜之使用方法Machinability-enhancing film, laminate, and method of using the machinability-enhancing film

本發明有關機械加工性提升薄膜、積層體(貼附機械加工性提升薄膜之樹脂板)及機械加工性提升薄膜之使用方法。 尤其有關製造觸控面板或液晶顯示裝置等之際所用之切削性及耐久性等優異之機械加工性提升薄膜、積層體及此等機械加工性提升薄膜之使用方法。The present invention relates to a film for improving machinability, a laminate (resin sheet with a film for improving machinability attached thereto), and a method for using the film for improving machinability. In particular, the present invention relates to a film for improving machinability, a laminate, and a method for using the film for improving machinability with excellent cutting properties and durability used in manufacturing touch panels or liquid crystal display devices.

以往,提案有以抑制因光干涉所致之干涉條紋發生且可容易更換加飾薄膜為目的之觸控面板(例如參考專利文獻1)。 更具體而言,係一種觸控面板裝置,其特徵係具有接受觸控輸入之操作區域與不接受觸控輸入之非操作區域的觸控面板,且於前述加飾薄模之對應於前述操作區域之下面形成有凹凸。In the past, a touch panel has been proposed for the purpose of suppressing the occurrence of interference fringes caused by light interference and for easily replacing a decorative film (for example, see Patent Document 1). More specifically, it is a touch panel device, which is characterized by having an operating area that accepts touch input and a non-operating area that does not accept touch input, and a concave-convex surface is formed on the bottom of the decorative film corresponding to the operating area.

又,提案有適於於觸控面板或液晶顯示裝置等中,使具有凹凸之一對光學構件彼此接著之黏著薄片(例如參考專利文獻2)。 更具體而言,係一種黏著薄片,其具備藉由包含使含有基底聚合物(A)、至少具有1個聚合性不飽和基之單體(B)、熱交聯劑(C)、聚合起始劑(D)與溶劑(E)之黏著組成物藉由加熱而半硬化之黏著劑的黏著劑層(X)。In addition, there is proposed an adhesive sheet suitable for bonding a pair of optical components having concave and convex surfaces to each other in a touch panel or a liquid crystal display device (for example, refer to patent document 2). More specifically, it is an adhesive sheet having an adhesive layer (X) of an adhesive that is semi-hardened by heating an adhesive composition containing a base polymer (A), a monomer (B) having at least one polymerizable unsaturated group, a thermal crosslinking agent (C), a polymerization initiator (D) and a solvent (E).

又再者,提案有於衝壓加工時,不易滲出黏著劑,且於切斷面之黏著劑滲出附著少,處理時不易產生糊汙染或糊缺損之光學構件(例如參考專利文獻3)。 更具體而言,係於衝壓加工時,於其切斷面之附著於黏著劑以外之部分的黏著劑面積為黏著層的面積之20%以下的光學構件。 [先前技術文獻] [專利文獻]Furthermore, it is proposed that during the punching process, the adhesive is not easy to seep out, and the adhesive seepage and adhesion on the cross-section is small, and it is not easy to produce paste contamination or paste defects during handling (for example, refer to patent document 3). More specifically, during the punching process, the area of the adhesive on the cross-section other than the adhesive is less than 20% of the area of the adhesive layer. [Prior art document] [Patent document]

[專利文獻1] 日本特開2018-5698號公報(申請專利範圍等) [專利文獻2] WO2013-61938號公報(申請專利範圍等) [專利文獻3] 日本特開2001-235626號公報(申請專利範圍等)[Patent Document 1] Japanese Patent Application No. 2018-5698 (patent application scope, etc.) [Patent Document 2] WO2013-61938 (patent application scope, etc.) [Patent Document 3] Japanese Patent Application No. 2001-235626 (patent application scope, etc.)

[發明欲解決之課題][Problems to be solved by the invention]

然而,專利文獻1所揭示之觸控面板裝置具備特定之外裝單元(板金/接著層/加飾薄膜),此等外裝單元係將板金及接著層分別加工為特定形狀後予以積層而製造。因此,為了獲得該外裝單元,有製造步驟多的困難點。 此外,接著層係設計為可容易地更換加飾薄膜,及關於黏著力由於未有任何考慮,故供於耐久條件(例如85℃,85%RH,500小時等)時,於接著界面因發生隆起或剝落而使接著劑層自加飾薄膜剝離,亦見到缺乏耐久性之問題。However, the touch panel device disclosed in Patent Document 1 has a specific exterior unit (sheet metal/adhesive layer/decorative film), and these exterior units are manufactured by processing the sheet metal and the adhesive layer into specific shapes and then laminating them. Therefore, there are many manufacturing steps to obtain the exterior unit. In addition, the adhesive layer is designed to easily replace the decorative film, and there is no consideration about the adhesion. Therefore, when it is subjected to durable conditions (such as 85°C, 85%RH, 500 hours, etc.), the adhesive layer is peeled off from the decorative film due to bulging or peeling at the adhesive interface, and the problem of lack of durability is also seen.

又,專利文獻2中揭示之黏著薄片,僅考慮具有凹凸之一對光學構件彼此之接著,及至將黏著薄片夾於光學構件彼此之間,並切削加工成特定形狀則完全未予考慮。 因此,由於完全未考慮黏著劑層之儲存彈性模數之值,故亦見到黏著薄片缺乏切削性的問題。Furthermore, the adhesive sheet disclosed in Patent Document 2 only considers the bonding of a pair of optical components having concave and convex surfaces, and does not consider the sandwiching of the adhesive sheet between the optical components and cutting into a specific shape. Therefore, since the storage elastic modulus value of the adhesive layer is not considered at all, the problem of the adhesive sheet's lack of cutting performance is also seen.

又再者,專利文獻3中揭示之光學構件具體而言,並未記載於衝壓加工時,將其切斷面之附著於黏著劑以外之部分的黏著劑面積設為黏著層的面積之20%以下的控制方法,見到缺乏實用性之問題。Furthermore, the optical component disclosed in Patent Document 3 specifically does not describe a method for controlling the adhesive area of the cross-section other than the adhesive to be less than 20% of the adhesive layer area during the punching process, which shows a problem of lack of practicality.

因此,本發明人等鑒於如以上情事而積極努力之結果,發現藉由將貼附於樹脂板之具備於特定基材上積層而成之活性能量線硬化性的機械加工性提升層的機械加工性提升薄膜之活性能量線照射後之機械加工性提升層之儲存彈性模數(M2)為設為特定值以上,即使於使用切削裝置等,以包含樹脂板枝狀態,切削特定基材之一的功能性薄膜等及機械加工性提升層時,可獲得切削加工之機械加工性提升層之缺損或伸長之發生受到抑制,加工後之切削面良好之優異機械加工處理性(切削性)。 進而發現,藉由將活性能量線照射後之機械加工性提升層之黏著力(P2)為設為特定值以上,即使於包含樹脂板之狀態,將特定基材之一的功能性薄膜等及機械加工性提升層供於嚴苛耐久條件(例如85℃,85%RH,500小時之濕熱環境條件)時,亦可抑制隆起或剝落等之發生,亦發揮優異之耐久性。 亦即,本發明人等發現可解決上述切削性的問題並且亦解決耐久性的問題,因而完成本發明。 因此,本發明之目的在於提供獲得與觸控面板或液晶顯示裝置等之樹脂板一起與特定基板一起進行機械加工處理(切削處理)時之優異機械加工特性(切削性)及供於耐久條件時之優異耐久性之機械加工性提升薄膜、將此等機械加工性提升薄膜貼附於樹脂板而成之積層體、及此等機械加工性提升薄膜之有效使用方法。 [用以解決課題之手段]Therefore, the inventors of the present invention have made active efforts in view of the above situation and found that by setting the storage elastic modulus (M2) of the machinability enhancing layer of the machinability enhancing layer attached to the resin board and having the machinability enhancing layer laminated on the specific substrate with active energy ray curing properties to a specific value or above, even when a cutting device is used to cut the functional film and the machinability enhancing layer of one of the specific substrates in the state of the resin board, the occurrence of defects or elongation of the machinability enhancing layer during cutting can be suppressed, and the cutting surface after processing has excellent machinability (machinability). Furthermore, it was found that by setting the adhesion (P2) of the machinability enhancement layer after irradiation with active energy rays to a specific value or more, even when a functional film or the like of one of the specific substrates and the machinability enhancement layer are subjected to severe durability conditions (e.g., 85°C, 85%RH, 500 hours of hot and humid environment conditions) in a state including a resin sheet, the occurrence of bulges or peeling can be suppressed, and excellent durability can be exhibited. That is, the inventors of the present invention found that the above-mentioned machinability problem can be solved and the durability problem can also be solved, thereby completing the present invention. Therefore, the purpose of the present invention is to provide a film for improving machinability that has excellent machining properties (machinability) when machining (cutting) with a resin plate of a touch panel or liquid crystal display device and a specific substrate, and excellent durability when subjected to durable conditions, a laminate formed by attaching such a film for improving machinability to a resin plate, and an effective method for using such a film for improving machinability. [Means for solving the problem]

依據本發明,提供機械加工性提升薄膜,其特徵係貼附於樹脂板,具備由積層於特定基材所成之活性能量線硬化性的機械加工性提升層之機械加工性提升薄膜,就對樹脂板貼附之狀態的機械加工性提升層而言,活性能量線照射後之儲存彈性模數(M2)為0.2MPa以上之值,活性能量線照射後之黏著力(P2)為10N/25mm以上之值,而可解決上述問題。 亦即,如此構成機械加工性提升薄膜,藉由將貼附於樹脂板之狀態的活性能量線照射後之機械加工性提升層的儲存彈性模數(M2)設為特定值以上,於包含樹脂板之狀態,同時切削機械加工性提升薄膜時,可獲得切削加工之機械加工性提升層之缺損或伸長之發生受到抑制,加工後之切削面良好之優異切削性。 又,藉由將活性能量線照射後之機械加工性提升層的黏著力(P2)設為特定值以上,即使對於樹脂板貼附機械加工性提升層之狀態,時濕耐久試驗(例如85℃,85%RH,500小時等)時,亦不發生氣泡或隆起剝落,而可發揮優異之耐久性。According to the present invention, a machinability-enhancing film is provided, which is characterized by being attached to a resin board and having an active energy ray-curable machinability-enhancing layer formed by laminating on a specific substrate. For the machinability-enhancing layer attached to the resin board, the storage elastic modulus (M2) after active energy ray irradiation is a value of 0.2MPa or more, and the adhesive force (P2) after active energy ray irradiation is a value of 10N/25mm or more, which can solve the above-mentioned problem. That is, by configuring the machinability enhancing film in this way, by setting the storage elastic modulus (M2) of the machinability enhancing layer after being irradiated with active energy rays in the state of being attached to the resin board to a specific value or more, when the machinability enhancing film is cut while including the resin board, the occurrence of defects or elongation of the machinability enhancing layer during cutting can be suppressed, and the cutting surface after processing has excellent cutting properties. In addition, by setting the adhesion (P2) of the machinability enhancing layer after being irradiated with active energy rays to a specific value or more, even in the state of the machinability enhancing layer attached to the resin board, no bubbles or bulges or peeling occur during the time-humidity durability test (e.g., 85°C, 85%RH, 500 hours, etc.), and excellent durability can be exerted.

又,構成本發明之機械加工性提升薄膜時,作為特定基材,較好包含功能性薄膜或剝離薄膜。 藉由如此包含功能性薄膜或剝離薄膜,可使機械加工性提升薄膜之處理性良好,提高與樹脂板之貼合性。 藉此,可抑制因貼合錯誤所致之積層體外觀不良發生,可防止起因於於積層界面夾帶空氣引起之耐久性降低。 又,作為特定基材,亦更好包含功能性薄膜及剝離薄膜兩者。Furthermore, when the machinability-enhancing film of the present invention is constituted, it is preferable to include a functional film or a release film as a specific substrate. By including a functional film or a release film in this way, the machinability-enhancing film can be handled well and the adhesion with the resin sheet can be improved. Thereby, the appearance of the laminated body due to bonding errors can be suppressed, and the durability reduction caused by air entrapment at the laminate interface can be prevented. Furthermore, as a specific substrate, it is also preferable to include both a functional film and a release film.

又,構成本發明之機械加工性提升薄膜時,較好活性能量線照射後之機械加工性提升層之凝膠分率(G2)為60%以上之值。 藉由如此控制機械加工性提升層之凝膠分率(G2),可獲得更良好的切削性等。 此外,由於活性能量線照射後之機械加工性提升層之凝集力成為適度,亦有助於耐久性提升。Furthermore, when the machinability-enhancing film of the present invention is constructed, the gel fraction (G2) of the machinability-enhancing layer after active energy ray irradiation is preferably 60% or more. By controlling the gel fraction (G2) of the machinability-enhancing layer in this way, better cutting properties can be obtained. In addition, since the cohesion of the machinability-enhancing layer after active energy ray irradiation becomes appropriate, it also helps to improve durability.

又,構成本發明之機械加工性提升薄膜時,較好活性能量線照射前之機械加工性提升層的儲存彈性模數(M1)為0.01~1MPa之範圍內之值。 藉由如此控制活性能量線照射前之機械加工性提升層的儲存彈性模數(M1),成為與樹脂板之貼合性優異者,可防止起因於貼合時夾帶空氣引起之耐久性降低。Furthermore, when the machinability enhancing film of the present invention is constructed, the storage elastic modulus (M1) of the machinability enhancing layer before active energy ray irradiation is preferably within the range of 0.01 to 1 MPa. By controlling the storage elastic modulus (M1) of the machinability enhancing layer before active energy ray irradiation in this way, the film has excellent adhesion to the resin sheet, and the durability reduction caused by air entrapment during bonding can be prevented.

又,構成本發明之機械加工性提升薄膜時,較好活性能量線照射後之機械加工性提升層的儲存彈性模數(M2)為0.2~3MPa之範圍內之值。 藉由如此控制活性能量線照射後之機械加工性提升層的儲存彈性模數(M2),機械加工性提升層成為具有適度凝集力者,故除了發揮良好切削性以外,成為進而易兼具耐久性者。Furthermore, when the machinability-enhancing film of the present invention is constructed, the storage elastic modulus (M2) of the machinability-enhancing layer after active energy ray irradiation is preferably within the range of 0.2 to 3 MPa. By controlling the storage elastic modulus (M2) of the machinability-enhancing layer after active energy ray irradiation in this way, the machinability-enhancing layer becomes one with appropriate cohesion, so in addition to exhibiting good machinability, it becomes one that is easy to have durability.

又,構成本發明之機械加工性提升薄膜時,較好將活性能量線照射前之機械加工性提升層的儲存彈性模數設為M1,將活性能量線照射後之機械加工性提升層的儲存彈性模數設為M2時,使M2/M1×100表示之數值(儲存彈性模數增加率)為320~30000%之範圍內之值。 藉由如此將儲存彈性模數之增加率(%)控制在特定範圍內之值,易於兼具機械加工性提升層於硬化前之良好貼合與硬化後之適度凝集力,進而可獲得良好之切削性及耐久性。 又,硬化前良好貼合時,由於硬化後與貼合界面之密著性亦提高,故與其效果相輔,而處於容易控制切削處理時之機械加工性提升層之缺損或伸長的傾向。Furthermore, when constructing the machinability-enhancing film of the present invention, it is preferred to set the storage elastic modulus of the machinability-enhancing layer before active energy ray irradiation to M1, and the storage elastic modulus of the machinability-enhancing layer after active energy ray irradiation to M2, so that the value represented by M2/M1×100 (storage elastic modulus increase rate) is within the range of 320 to 30000%. By controlling the increase rate (%) of the storage elastic modulus within a specific range, it is easy to achieve both good adhesion of the machinability-enhancing layer before curing and moderate cohesion after curing, thereby obtaining good machinability and durability. Furthermore, when the bonding is good before curing, the adhesion at the bonding interface is also improved after curing, so that the defect or elongation of the machinability-enhancing layer during cutting can be easily controlled in combination with the effect.

又,構成本發明之機械加工性提升薄膜時,較好使機械加工性提升層之厚度成為3~40μm之範圍內之值。 藉由如此控制機械加工性提升薄膜之機械加工性提升層之厚度,容易將活性能量線照射前後之依據JIS Z 0237:2000測定之對玻璃的180°剝離黏著力(以下有時簡稱為黏著力)調整於期望範圍內之值,成為發揮良好耐久性者。 又,由於為比較薄的厚度,故易有助於所得積層體的輕量化。Furthermore, when the machinability-enhancing film of the present invention is constructed, it is preferable to make the thickness of the machinability-enhancing layer a value within the range of 3 to 40 μm. By controlling the thickness of the machinability-enhancing layer of the machinability-enhancing film in this way, it is easy to adjust the 180° peeling adhesion to glass measured in accordance with JIS Z 0237:2000 before and after active energy ray irradiation (hereinafter sometimes referred to as adhesion) to a value within the desired range, thereby achieving good durability. In addition, since it is a relatively thin thickness, it is easy to contribute to the weight reduction of the obtained laminate.

又,本發明之其他態樣係一種積層體,其特徵係將上述任一機械加工性提升薄膜貼附於樹脂板而成。 依據此等積層體,由於樹脂板與以往之金屬框架等相比加工性更優異,故於各種機器中使用之各種功能性薄膜可透過機械加工性提升層貼合於樹脂板之狀態進行精度良好地切削處理。 又,由於樹脂板比以往之金屬框架等更為輕量,故應用該積層體之機器亦可輕量化。In addition, another aspect of the present invention is a laminate, which is characterized by attaching any of the above-mentioned machinability-enhancing films to a resin plate. According to such laminates, since resin plates have better machinability than conventional metal frames, various functional films used in various machines can be cut with good precision by attaching the machinability-enhancing layer to the resin plate. In addition, since resin plates are lighter than conventional metal frames, the machine using the laminate can also be made lighter.

又,構成本發明之積層體時,較好樹脂板係光學用樹脂板。 依據包含此等光學用樹脂板之積層體,容易應用於光學領域之機器,例如於觸控面板或液晶顯示裝置等之光學零件中,具有光學特性並且亦可能輕量化。Furthermore, when constituting the laminate of the present invention, the resin sheet is preferably an optical resin sheet. Laminated bodies including such optical resin sheets can be easily applied to optical devices, such as optical parts of touch panels or liquid crystal display devices, and have optical properties and can also be lightweight.

又,本發明之又其他態樣係上述任一機械加工性提升薄膜之使用方法,其特徵係包含下述步驟(1)~(4): (1)於作為特定基材之功能性薄膜表面,塗佈包含活性能量線硬化性成分之組成物,藉由加熱處理,作成具備活性能量線硬化性之機械加工性提升層的機械加工性提升薄膜之步驟, (2)將所得機械加工性提升薄膜貼附於樹脂板之步驟, (3)自樹脂板或特定基材側照射活性能量線,使機械加工性提升層中之活性能量線硬化性成分硬化,作成硬化後之機械加工性提升層之步驟, (4)對包含硬化後之機械加工性提升層及樹脂板的積層體,實施特定之機械加工處理之步驟。 藉由使用此等機械加工性提升薄膜,可應用於觸控面板或液晶顯示裝置等之光學零件等,可簡便地製造透過機械加工性提升層之附功能性薄膜之樹脂板。亦即,藉由一次切削處理,可容易獲得具有期望形狀之積層體。再者,由於切削處理中並無機械加工性提升層之缺損或伸長,故而加工後之切削面為良好,所得積層體成為具有優異外觀品質者。進而,所得積層體由於耐久性優異,故亦可應用於在嚴苛環境下使用之光學零件(例如車載用觸控面板或液晶顯示裝置等)。In addition, another aspect of the present invention is a method for using any of the above-mentioned machinability-enhancing films, which is characterized by comprising the following steps (1) to (4): (1) coating a composition containing an active energy ray-hardening component on the surface of a functional film as a specific substrate, and preparing a machinability-enhancing film having a machinability-enhancing layer with active energy ray hardening properties by heat treatment, (2) attaching the obtained machinability-enhancing film to a resin board, (3) irradiating active energy rays from the resin board or the specific substrate side to harden the active energy ray-hardening component in the machinability-enhancing layer to prepare a hardened machinability-enhancing layer, (4) performing a specific machining treatment on a laminate comprising the hardened machinability-enhancing layer and the resin board. By using such machinability-enhanced films, it is possible to apply them to optical parts such as touch panels or liquid crystal display devices, and resin plates with functional films attached through the machinability-enhanced layer can be easily manufactured. That is, a laminate having a desired shape can be easily obtained through a single cutting process. Furthermore, since there is no damage or elongation of the machinability-enhanced layer during the cutting process, the cutting surface after processing is good, and the obtained laminate has excellent appearance quality. Furthermore, since the obtained laminate has excellent durability, it can also be applied to optical parts used in harsh environments (such as automotive touch panels or liquid crystal display devices, etc.).

本發明之實施形態,如圖1(a)~(b)所例示般,係貼附於樹脂板12之具備活性能量線硬化性之機械加工性提升層14及特定基材16(功能性薄膜)而成之機械加工性提升薄膜18,或使用此等機械加工性提升薄膜18而成之積層體,進而為機械加工性提升薄膜18之使用方法。 因此,本實施形態之機械加工性提升薄膜18之特徵係以對於樹脂板12積層之狀態的機械加工性提升層14之活性能量線照射後之儲存彈性模數(M2)為0.2MPa以上之值,活性能量線照射後之黏著力(P2)為10N/25mm以上之值。 以下,一邊參考適當圖式,一邊對機械加工性提升薄膜18以每構成要件具體說明。 又,圖1(a)係例示積層機械加工性提升薄膜18而成之由樹脂板12構成之積層體10之態樣,圖1(b)係另一積層體10之一態樣,係例示於機械加工性提升層14之一部分具有特定空間14a之觸控面板(但省略電性配線等)之一例。The embodiment of the present invention, as shown in FIG. 1(a) to (b), is a machinability enhancement film 18 formed by a machinability enhancement layer 14 having active energy ray curability and a specific substrate 16 (functional film) attached to a resin plate 12, or a laminate formed using such a machinability enhancement film 18, and further a method of using the machinability enhancement film 18. Therefore, the machinability enhancement film 18 of the present embodiment is characterized in that the storage elastic modulus (M2) of the machinability enhancement layer 14 laminated on the resin plate 12 after active energy ray irradiation is 0.2 MPa or more, and the adhesive force (P2) after active energy ray irradiation is 10 N/25 mm or more. The following will specifically describe the machinability-enhancing film 18 for each component with reference to appropriate figures. In addition, FIG. 1(a) is an example of a laminate 10 composed of a resin sheet 12 on which the machinability-enhancing film 18 is laminated, and FIG. 1(b) is an example of another laminate 10, which is an example of a touch panel having a specific space 14a in a portion of the machinability-enhancing layer 14 (but electrical wiring, etc. are omitted).

1.樹脂板 (1)種類 作為圖1(a)等所示之樹脂板12的種類,並未特別限制,但習知之透明或半透明樹脂板由於機械加工性良好故可較好地使用。1. Resin board (1) Type The type of the resin board 12 shown in FIG. 1(a) is not particularly limited, but a known transparent or translucent resin board can be preferably used because of its good machinability.

作為此等樹脂板,可舉例為例如聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯、聚萘二甲酸乙二酯等之聚酯樹脂板、聚乙烯樹脂板、聚丙烯樹脂板、二乙醯纖維素樹脂板、三乙醯纖維素樹脂板、乙醯纖維素縮丁醛樹脂板、聚氯乙烯樹脂板、聚偏氯乙烯樹脂板、聚乙烯醇樹脂板、乙烯-乙酸乙烯酯共聚物樹脂板、聚苯乙烯樹脂板、聚碳酸酯樹脂板、聚甲基戊烯樹脂板、聚碸樹脂板、聚醚醚酮樹脂板、聚醚碸樹脂板、聚醚醯亞胺樹脂板、聚醯亞胺樹脂板、氟樹脂板、聚醯胺樹脂板、丙烯酸樹脂板、降冰片烯系樹脂板、環烯烴樹脂板等。Examples of such resin sheets include polyester resin sheets such as polyethylene terephthalate, polybutylene terephthalate, and polyethylene naphthalate, polyethylene resin sheets, polypropylene resin sheets, diacetyl cellulose resin sheets, triacetyl cellulose resin sheets, acetyl cellulose butyral resin sheets, polyvinyl chloride resin sheets, polyvinylidene chloride resin sheets, polyvinyl alcohol resin sheets, and polyvinyl alcohol resin sheets. Resin board, ethylene-vinyl acetate copolymer resin board, polystyrene resin board, polycarbonate resin board, polymethylpentene resin board, polysulfone resin board, polyetheretherketone resin board, polyethersulfone resin board, polyetherimide resin board, polyimide resin board, fluororesin board, polyamide resin board, acrylic resin board, norbornene series resin board, cycloolefin resin board, etc.

該等中,基於光學特性或耐熱性良好,尺寸安定性亦優異,較好為聚酯樹脂板、聚碳酸酯樹脂板、聚甲基戊烯樹脂板、聚碸樹脂板、丙烯酸樹脂板、聚醚醚酮樹脂板、聚醯亞胺樹脂板、降冰片烯系樹脂板、環烯烴樹脂板中之至少一者。 且,基於透明性或機械強鍍、柔軟性、加工性、耐候性,進而經濟性亦優異,尤其更好為丙烯酸樹脂板(MMA樹脂板等)或聚碳酸酯樹脂板。Among them, at least one of polyester resin sheet, polycarbonate resin sheet, polymethylpentene resin sheet, polyester resin sheet, acrylic resin sheet, polyetheretherketone resin sheet, polyimide resin sheet, norbornene resin sheet, and cycloolefin resin sheet is preferred due to good optical properties or heat resistance and excellent dimensional stability. Moreover, acrylic resin sheet (MMA resin sheet, etc.) or polycarbonate resin sheet is particularly preferred due to excellent transparency or mechanical strength, flexibility, processability, weather resistance, and economical performance.

(2)厚度 圖1(a)等所示之樹脂板12的厚度通常較好為200~10000μm之範圍內之值。 其理由為該樹脂板厚度若為未達200μm之值,則有樹脂板之強度降低,包含樹脂板之觸控面板等之配置固定性降低之情況之故。 另一方面,該樹脂板厚度若為超過10000μm之值,則有難以透過機械加工性提升層使樹脂板與作為特定基材之功能性薄膜等一起同時進行機械加工處理之情況之故。 因此,樹脂板厚度更好設為500~5000μm範圍內之值,又更好設為700~2000μm範圍內之值。(2) Thickness The thickness of the resin sheet 12 shown in FIG. 1(a) is usually preferably within the range of 200 to 10,000 μm. The reason is that if the thickness of the resin sheet is less than 200 μm, the strength of the resin sheet is reduced, and the fixity of the configuration of the touch panel, etc., including the resin sheet, is reduced. On the other hand, if the thickness of the resin sheet exceeds 10,000 μm, it is difficult to perform mechanical processing on the resin sheet and the functional film, etc., which is a specific substrate, through the machinability enhancement layer. Therefore, the thickness of the resin sheet is preferably within the range of 500 to 5,000 μm, and more preferably within the range of 700 to 2,000 μm.

(3)光學特性 關於樹脂板之光學特性,較好為具有可於觸控面板或液晶顯示裝置等之用途中使用之程度的透明性。 具體而言,樹脂板之可見光透過率若過度低,則良率顯著降低,有可使用之構成材料種類過度受限制之情況。 因此,作為樹脂板之可見光透過率的下限,較好設為60%以上之值,更好設為75%以上之值,又更好設為85%以上之值。 另一方面,樹脂板之可見光透過率的上限,通常為100%以下,較好設為99.9%以下之值,更好設為99%以下之值,又更好設為98%以下之值。(3) Optical properties Regarding the optical properties of the resin sheet, it is preferred that the sheet have a degree of transparency that allows it to be used in applications such as touch panels or liquid crystal display devices. Specifically, if the visible light transmittance of the resin sheet is too low, the yield rate will be significantly reduced, and the types of constituent materials that can be used may be excessively limited. Therefore, the lower limit of the visible light transmittance of the resin sheet is preferably set to a value of 60% or more, more preferably a value of 75% or more, and more preferably a value of 85% or more. On the other hand, the upper limit of the visible light transmittance of the resin sheet is usually 100% or less, preferably 99.9% or less, more preferably 99% or less, and more preferably 98% or less.

(4)添加劑 樹脂板中,為了改良耐久性、物理特性、機械特性等,亦較好調配抗氧化劑、水解防止劑、紫外線吸收劑、無機填料、有機填料、無機纖維、有機纖維、導電性材料、電絕緣性材料、金屬離子捕捉劑、輕量化劑、填充劑、研磨劑、著色劑、黏度調整劑等中之至少一種習知添加劑。 因此,於樹脂板中調配該等習知添加劑時,其調配量雖亦根據其添加劑種類而定,但通常相對於樹脂板全體量(100重量%),較好設為0.1~30重量%之範圍內之值,更好為0.5~20重量%之範圍內之值,又更好為1~10重量%之範圍內之值。(4) Additives In order to improve the durability, physical properties, mechanical properties, etc., it is also better to mix at least one known additive such as antioxidant, hydrolysis inhibitor, ultraviolet absorber, inorganic filler, organic filler, inorganic fiber, organic fiber, conductive material, electrical insulating material, metal ion scavenger, lightweight agent, filler, abrasive, colorant, viscosity adjuster, etc. into the resin board. Therefore, when these known additives are mixed in the resin board, the mixing amount depends on the type of additive, but is usually preferably set to a value in the range of 0.1 to 30 weight %, more preferably 0.5 to 20 weight %, and even more preferably 1 to 10 weight %, relative to the total amount of the resin board (100 weight %).

2.機械加工性提升層 本實施形態之機械加工性提升層14可藉由使源自用以形成機械加工性提升層之組成物的樹脂層13加熱處理進行熱交聯而獲得,該組成物係以作為主劑(A)之(甲基)丙烯酸酯共聚物、熱硬化性成分(B)及活性能量線硬化性成分(C)為必須成分。 亦即,該機械加工性提升層14係藉由作為主劑(A)之(甲基)丙烯酸酯共聚物、由熱硬化性成分(B)構成之交聯構造及未硬化之活性能量線硬化性成分(C)而構成。藉由對該機械加工性提升層14照射活性能量線而硬化,可獲得硬化後之機械加工性提升層14’。2. Machinability-enhancing layer The machinability-enhancing layer 14 of the present embodiment can be obtained by heat-treating the resin layer 13 derived from the composition for forming the machinability-enhancing layer to perform thermal crosslinking, wherein the composition has a (meth)acrylate copolymer as a main agent (A), a thermosetting component (B), and an active energy ray-curing component (C) as essential components. That is, the machinability-enhancing layer 14 is composed of a (meth)acrylate copolymer as a main agent (A), a crosslinked structure composed of the thermosetting component (B), and an uncured active energy ray-curing component (C). The machinability-enhancing layer 14 is cured by irradiating the machinability-enhancing layer 14 with active energy rays to obtain a cured machinability-enhancing layer 14'.

又,本說明書中,「(甲基)丙烯酸酯」意指丙烯酸酯及甲基丙烯酸酯兩者,以下包含其他類似用與亦同樣。 以下,針對構成機械加工性提升層14之各成分具體說明。In addition, in this specification, "(meth)acrylate" means both acrylate and methacrylate, and the same applies to other similar terms included below. Below, each component constituting the machinability enhancement layer 14 is specifically described.

(1)主劑(A) 作為構成機械加工性提升層14之主劑(A)的種類,並未特別限制。 然而,例如基於取得容易性、與後述之活性能量線硬化性成分(C)均一混合容易性,較好以源自特定(甲基)丙烯酸酯單體成分之(甲基)丙烯酸酯共聚物為主劑(A)。(1) Main agent (A) The type of the main agent (A) constituting the machinability-enhancing layer 14 is not particularly limited. However, for example, based on the ease of obtaining and the ease of uniform mixing with the active energy ray-curable component (C) described later, it is preferred to use a (meth)acrylate copolymer derived from a specific (meth)acrylate monomer component as the main agent (A).

該主劑於(甲基)丙烯酸酯共聚物時,作為構成該共聚物之單體單位,較好含有與熱硬化性成分(B)反應之分子內具有反應性基之單體(含反應性官能基之單體)與(甲基)丙烯酸烷酯。 其理由為源自含反應性基之單體的反應性基與熱硬化性成分(B)反應,形成交聯構造(三維網眼構造),藉此可獲得被膜強度比較高的機械加工性提升層之故。When the main agent is a (meth)acrylate copolymer, it is preferable that the monomer units constituting the copolymer contain a monomer having a reactive group in the molecule (a monomer containing a reactive functional group) that reacts with the thermosetting component (B) and an alkyl (meth)acrylate. The reason is that the reactive group of the monomer containing a reactive group reacts with the thermosetting component (B) to form a cross-linked structure (three-dimensional mesh structure), thereby obtaining a mechanical processing improvement layer with relatively high film strength.

(1)-1 單體1(含反應性官能基之單體) 構成作為主劑(A)之(甲基)丙烯酸酯聚合物之一部分的含反應性基之單體,可舉例為分子內具有羥基之單體(以下有時亦稱為含羥基之單體)、分子內具有羧基之單體(以下有時亦稱為含羧基之單體)、分子內具有胺基之單體(以下有時亦稱為含胺基之單體)等。 該等中,基於與熱硬化性成分(B)之反應性優異,對被黏著體之不良影響較少之觀點,較好為含羥基之單體,且即使(甲基)丙烯酸酯共聚物之重量平均分子量比較低,基於發揮期望凝集力之觀點,亦較好為含羧基之單體。(1)-1 Monomer 1 (monomer containing reactive functional groups) The monomer containing reactive groups that constitutes a part of the (meth)acrylate polymer as the main agent (A) may be, for example, a monomer having a hydroxyl group in the molecule (hereinafter sometimes referred to as a hydroxyl group-containing monomer), a monomer having a carboxyl group in the molecule (hereinafter sometimes referred to as a carboxyl group-containing monomer), a monomer having an amino group in the molecule (hereinafter sometimes referred to as an amino group-containing monomer), etc. Among these, monomers containing hydroxyl groups are preferred from the viewpoint of excellent reactivity with the thermosetting component (B) and less adverse effects on the adherend, and even if the weight average molecular weight of the (meth)acrylate copolymer is relatively low, monomers containing carboxyl groups are preferred from the viewpoint of exerting the desired cohesive force.

作為含羥基之單體種類,舉例為例如(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸3-羥基丙酯、(甲基)丙烯酸2-羥基丁酯、(甲基)丙烯酸3-羥基丁酯、(甲基)丙烯酸4-羥基丁酯等之(甲基)丙烯酸羥基烷酯等。 該等中,基於所得(甲基)丙烯酸酯共聚物中之羥基與熱硬化性成分(B)之反應性及與其他單體之共聚合性之觀點,較好為(甲基)丙烯酸2-羥基乙酯及(甲基)丙烯酸4-羥基丁酯,更好為甲基丙烯酸2-羥基乙酯、丙烯酸2-羥基乙酯及丙烯酸4-羥基丁酯。該等可單獨使用,亦可組合2種以上使用。Examples of monomers containing a hydroxyl group include hydroxyalkyl (meth)acrylates such as 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 3-hydroxypropyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, 3-hydroxybutyl (meth)acrylate, and 4-hydroxybutyl (meth)acrylate. Among them, 2-hydroxyethyl (meth)acrylate and 4-hydroxybutyl (meth)acrylate are preferred, and 2-hydroxyethyl methacrylate, 2-hydroxyethyl acrylate, and 4-hydroxybutyl acrylate are more preferred, based on the reactivity of the hydroxyl group in the obtained (meth)acrylate copolymer with the thermosetting component (B) and the copolymerizability with other monomers. These may be used alone or in combination of two or more.

又,作為單體單位之含羥基之單體的調配量,相對於單體全體量(100重量%,以下同樣),較好含有1重量%以上,更好含有10重量%以上,又更好含有15重量%以上。 再者,該含羥基之單體調配量,相對於單體全體,較好含有50重量%以下,更好含有40重量%以下,又更好含有30重量%以下。 亦即,(甲基)丙烯酸酯共聚物藉由以特定範圍含有含羥基之單體作為單體成分,而與熱硬化性成分(B)較好地容易反應,形成良好交聯構造。其結果,所得機械加工性提升層之被膜強度比較高,機械加工性提升層之儲存彈性模數易滿足期望值,而成為具有良好切削性者。Furthermore, the amount of the hydroxyl-containing monomer as a monomer unit is preferably 1% by weight or more, more preferably 10% by weight or more, and more preferably 15% by weight or more relative to the total amount of the monomer (100% by weight, the same below). Furthermore, the amount of the hydroxyl-containing monomer is preferably 50% by weight or less, more preferably 40% by weight or less, and more preferably 30% by weight or less relative to the total amount of the monomer. That is, the (meth)acrylate copolymer reacts more easily with the thermosetting component (B) to form a good crosslinking structure by containing a hydroxyl-containing monomer as a monomer component in a specific range. As a result, the film strength of the obtained machinability-enhancing layer is relatively high, and the storage elastic modulus of the machinability-enhancing layer easily meets the expected value, thereby becoming a layer with good cutting properties.

作為含羧基之單體舉例為例如丙烯酸、甲基丙烯酸、巴豆酸、馬來酸、依康酸、檸糠酸等之乙烯性不飽和羧酸。 該等中,基於所得(甲基)丙烯酸酯共聚物中之羧基與熱硬化性成分(B)之反應性及與其他單體之共聚合性之觀點,較好為丙烯酸。該等可單獨使用,亦可組合2種以上使用。 而且,作為單體單位包含含羧基之單體時,(甲基)丙烯酸酯共聚物較好相對於單體全體量,含有1重量%以上,特佳含有5重量%以上,更好含有8重量%以上。 再者,(甲基)丙烯酸酯共聚物較好含有30重量%以下之含羧基之單體作為構成該聚合物之單體單位,更好含有20重量%以下,又更好含有15重量%以下。 亦即,藉由以特定範圍含有含羧基之單體作為單體單位,而與熱硬化性成分(B)較好地容易反應,形成良好交聯構造。 其結果,所得機械加工性提升層之被膜強度比較高,機械加工性提升層之儲存彈性模數易滿足期望值,而成為具有良好切削性者。Examples of carboxyl-containing monomers include ethylenically unsaturated carboxylic acids such as acrylic acid, methacrylic acid, crotonic acid, maleic acid, itaconic acid, furoic acid, etc. Among them, acrylic acid is preferred from the viewpoint of the reactivity of the carboxyl group in the obtained (meth)acrylate copolymer with the thermosetting component (B) and the copolymerizability with other monomers. These can be used alone or in combination of two or more. Moreover, when the carboxyl-containing monomer is included as a monomer unit, the (meth)acrylate copolymer preferably contains 1% by weight or more, particularly preferably 5% by weight or more, and more preferably 8% by weight or more relative to the total amount of the monomer. Furthermore, the (meth)acrylate copolymer preferably contains 30% by weight or less of the carboxyl-containing monomer as a monomer unit constituting the polymer, more preferably 20% by weight or less, and even more preferably 15% by weight or less. That is, by containing carboxyl-containing monomers as monomer units within a specific range, it reacts more easily with the thermosetting component (B) to form a good cross-linking structure. As a result, the film strength of the obtained machinability-enhancing layer is relatively high, and the storage elastic modulus of the machinability-enhancing layer is easy to meet the expected value, and it becomes a layer with good machinability.

又,作為單體單位,較好為包含微量之含羧基之單體或亦較好完全不包含。 其理由為由於羧基為酸成分,故藉由不含有含羧基之單體,於黏著劑之貼附對象存在有因酸而產生缺陷者例如摻錫之氧化銦(ITO)等之透明導電膜或金屬膜等之情況,亦可抑制因酸所致之該等缺陷(腐蝕、電阻值變化等)之故。 但,於不會產生此等缺陷之程度,亦容許含有特定量之含羧基之單體。 具體而言,(甲基)丙烯酸酯共聚物中,作為單體單位,容許以5重量%以下,較好1重量%以下,更好0.1重量%以下之量含有含羧基之單體。In addition, as a monomer unit, it is better to include a trace amount of carboxyl-containing monomers or not include them at all. The reason is that since carboxyl groups are acid components, by not including carboxyl-containing monomers, when there are defects caused by acid in the adhesive attachment object, such as transparent conductive films such as tin-doped indium oxide (ITO) or metal films, such defects caused by acid (corrosion, resistance value change, etc.) can be suppressed. However, it is also allowed to contain a specific amount of carboxyl-containing monomers to the extent that such defects will not be generated. Specifically, in the (meth)acrylate copolymer, as a monomer unit, it is allowed to contain carboxyl-containing monomers in an amount of 5% by weight or less, preferably 1% by weight or less, and more preferably 0.1% by weight or less.

又,作為含胺基之單體,舉例為例如(甲基)丙烯酸胺基乙酯、(甲基)丙烯酸正丁胺基乙酯等。 該等可單獨使用,亦可組合2種以上使用。In addition, examples of monomers containing an amino group include aminoethyl (meth)acrylate, n-butylaminoethyl (meth)acrylate, etc. These monomers can be used alone or in combination of two or more.

(1)-2 單體2((甲基)丙烯酸烷酯單體) 作為主劑(A)之(甲基)丙烯酸酯共聚物較好含有烷基之碳數為1~20之(甲基)丙烯酸烷酯作為構成該共聚物之單體單位。 藉此,可使機械加工性提升層展現更好的黏著性。 又,基於可更好展現黏著性之觀點,碳數為1~20之(甲基)丙烯酸烷酯較好為直鏈或分支鏈之構造。(1)-2 Monomer 2 ((meth)acrylate alkyl ester monomer) The (meth)acrylate copolymer as the main agent (A) preferably contains a (meth)acrylate alkyl ester having an alkyl group with a carbon number of 1 to 20 as a monomer unit constituting the copolymer. Thereby, the machinability-enhancing layer can exhibit better adhesion. In addition, from the viewpoint of exhibiting better adhesion, the (meth)acrylate alkyl ester having a carbon number of 1 to 20 is preferably a straight chain or branched chain structure.

作為碳數為1~20之(甲基)丙烯酸烷酯較好為作為均聚物之玻璃轉移溫度(Tg)未達0℃(以下有時稱為低Tg丙烯酸烷酯)。 其理由為藉由含有該低Tg丙烯酸烷酯作為構成單體單位,所得之機械加工性提升層之黏著性可更為提高之故。The (meth) alkyl acrylate having a carbon number of 1 to 20 preferably has a glass transition temperature (Tg) of less than 0°C as a homopolymer (hereinafter sometimes referred to as a low-Tg alkyl acrylate). The reason is that by containing the low-Tg alkyl acrylate as a constituent monomer unit, the adhesion of the obtained machinability-enhancing layer can be further improved.

此處,作為低Tg丙烯酸烷酯可較好地舉例例如丙烯酸正丁酯(Tg:-55℃)、丙烯酸正辛酯(Tg:-65℃)、丙烯酸異辛酯(Tg:-58℃)、丙烯酸2-乙基己酯(Tg:-70℃)、丙烯酸異壬酯(Tg:-58℃)、丙烯酸異癸酯(Tg:-60℃)、甲基丙烯酸異癸酯(Tg:-41℃)、甲基丙烯酸正月桂酯(Tg:-65℃)、丙烯酸十三烷酯(Tg:-55℃)、甲基丙烯酸十三烷酯(Tg:-40℃)等之至少一者。 該等中,基於更有效地提高黏著性之觀點,作為低Tg丙烯酸烷酯更好為均聚物之Tg為-25℃以下者,又更好為 -50℃以下者。 具體而言,特佳為丙烯酸正丁酯及丙烯酸2-乙基己酯。Here, as the low Tg alkyl acrylate, at least one of n-butyl acrylate (Tg: -55°C), n-octyl acrylate (Tg: -65°C), isooctyl acrylate (Tg: -58°C), 2-ethylhexyl acrylate (Tg: -70°C), isononyl acrylate (Tg: -58°C), isodecyl acrylate (Tg: -60°C), isodecyl methacrylate (Tg: -41°C), n-lauryl methacrylate (Tg: -65°C), tridecyl acrylate (Tg: -55°C), tridecyl methacrylate (Tg: -40°C) and the like can be preferably cited. Among them, from the viewpoint of more effectively improving adhesion, the low Tg alkyl acrylate is preferably a homopolymer having a Tg of -25°C or less, and more preferably a homopolymer having a Tg of -50°C or less. Specifically, n-butyl acrylate and 2-ethylhexyl acrylate are particularly preferred.

又,(甲基)丙烯酸酯共聚物較好以作為下限值含有30重量%以上,尤其較好含有40重量%以上,又更好含有50重量%以上之低Tg丙烯酸烷酯作為構成該聚合物之單體單位。 其理由為若如此調配該低Tg丙烯酸烷酯,則可提高所得機械加工性提升層之黏著性,可為對樹脂板之貼合性更優異者之故。 又,(甲基)丙烯酸酯共聚物較好以作為上限值含有99重量%以下,尤其較好含有90重量%以下,又更好含有80重量%以下之低Tg丙烯酸烷酯作為構成該聚合物之單體單位。 其理由為若如此調配該低Tg丙烯酸烷酯,則可於(甲基)丙烯酸酯聚合物中導入適當量之其他單體成分(尤其是含反應官能基之單體)之故。In addition, the (meth)acrylate copolymer preferably contains 30% by weight or more, particularly preferably 40% by weight or more, and more preferably 50% by weight or more of low Tg alkyl acrylate as a monomer unit constituting the polymer as a lower limit. The reason is that if the low Tg alkyl acrylate is formulated in this way, the adhesion of the obtained machinability-enhancing layer can be improved, and the adhesion to the resin board can be better. In addition, the (meth)acrylate copolymer preferably contains 99% by weight or less, particularly preferably 90% by weight or less, and more preferably 80% by weight or less of low Tg alkyl acrylate as a monomer unit constituting the polymer as an upper limit. The reason is that if the low Tg alkyl acrylate is formulated in this way, an appropriate amount of other monomer components (especially monomers containing reactive functional groups) can be introduced into the (meth)acrylate polymer.

又,(甲基)丙烯酸酯聚合物亦較好併用作為均聚物之玻璃轉移溫度(Tg)超過0℃之單體(以下有時稱高Tg丙烯酸烷酯)作為單體單位。 其理由為可對所得機械加工性提升層賦予適度凝集力,機械加工性提升層之儲存彈性模數容易滿足期望值,且可提高切削性之故。In addition, (meth)acrylate polymers are also preferably used in combination with monomers having a glass transition temperature (Tg) of more than 0°C as homopolymers (hereinafter sometimes referred to as high-Tg alkyl acrylates) as monomer units. The reason is that appropriate cohesion can be imparted to the obtained machinability-enhancing layer, the storage elastic modulus of the machinability-enhancing layer can easily meet the expected value, and the machinability can be improved.

但,本文記載之高Tg丙烯酸烷酯係將後述之聚有脂環式構造之單體及含氮單體除外者。 作為此等高Tg丙烯酸烷酯可較好地舉例例如丙烯酸甲酯(Tg:10℃)、甲基丙烯酸甲酯(Tg:105℃)、甲基丙烯酸乙酯(Tg:65℃)、甲基丙烯酸正丁酯(Tg:20℃)、甲基丙烯酸異丁酯(Tg:48℃)、甲基丙烯酸第三丁酯(Tg:107℃)、丙烯酸正硬脂酯(Tg:30℃)、甲基丙烯酸正硬脂酯(Tg:38℃)之丙烯酸系單體、乙酸乙烯酯(Tg:32℃)、苯乙烯(Tg:30℃)等之至少一者。 該等中,基於可對機械加工性提升層賦予適度凝集力,可展現期望之儲存彈性模數之觀點,作為高Tg丙烯酸烷酯特佳為甲基丙烯酸甲酯。However, the high Tg alkyl acrylates described in this article exclude the monomers with alicyclic structures and nitrogen-containing monomers described later. As such high Tg alkyl acrylates, preferably, at least one of methyl acrylate (Tg: 10°C), methyl methacrylate (Tg: 105°C), ethyl methacrylate (Tg: 65°C), n-butyl methacrylate (Tg: 20°C), isobutyl methacrylate (Tg: 48°C), tert-butyl methacrylate (Tg: 107°C), n-stearyl acrylate (Tg: 30°C), n-stearyl methacrylate (Tg: 38°C), vinyl acetate (Tg: 32°C), styrene (Tg: 30°C), etc. can be cited. Among these, methyl methacrylate is particularly preferred as the high Tg alkyl acrylate from the viewpoint of providing a suitable cohesive force to the machinability-enhancing layer and exhibiting a desired storage elastic modulus.

亦即,(甲基)丙烯酸酯聚合物含有上述高Tg丙烯酸烷酯作為構成該聚合物之單體單位時,該高Tg丙烯酸烷酯相對於單體成分之全體量更好含有1重量%以上,又更好含有3重量%以上。 且,(甲基)丙烯酸酯聚合物較好含有20重量%以下,更好含有12重量%以下,又更好含有8重量%以下之該高Tg丙烯酸烷酯作為構成該聚合物之單體單位。 其理由為藉由使高Tg丙烯酸烷酯與低Tg丙烯酸烷酯一起以成為上述量之方式併用,所得機械加工性提升層可展現適當黏著力及凝集力,黏著力及儲存彈性模數容易滿足期望值,容易發揮切削性及耐久性之故。That is, when the (meth)acrylate polymer contains the above-mentioned high Tg alkyl acrylate as a monomer unit constituting the polymer, the high Tg alkyl acrylate is preferably contained in an amount of 1% by weight or more, and more preferably in an amount of 3% by weight or more, relative to the total amount of the monomer component. Moreover, the (meth)acrylate polymer preferably contains 20% by weight or less, more preferably 12% by weight or less, and more preferably 8% by weight or less of the high Tg alkyl acrylate as a monomer unit constituting the polymer. The reason is that by using the high Tg alkyl acrylate and the low Tg alkyl acrylate together in the above-mentioned amount, the obtained machinability-enhancing layer can exhibit appropriate adhesion and cohesion, and the adhesion and storage elastic modulus are easy to meet the expected values, and it is easy to exert cutting properties and durability.

(1)-3 單體3(含脂環式構造之單體) 作為主劑(A)之(甲基)丙烯酸酯共聚物較好含有分子內具有脂環式構造之單體(含脂環式構造之單體)作為構成該聚合物之單體單位。 其理由為含脂環式構造之單體分子係構造上體積較大,故藉由使其存在於共聚物中,推定為可擴大聚合物彼此之間隔。其結果,所得機械加工性提升層可成為柔軟性優異者之故。 因此,藉由使(甲基)丙烯酸酯共聚物含有含脂環式構造之單體作為構成該聚合物之單體單位,而可使組成物交聯,而使所得機械加工性提升層成為對樹脂板之貼合性優異者。(1)-3 Monomer 3 (monomer containing alicyclic structure) The (meth)acrylate copolymer as the main agent (A) preferably contains a monomer having an alicyclic structure in the molecule (monomer containing alicyclic structure) as a monomer unit constituting the polymer. The reason is that the monomer molecule containing alicyclic structure is structurally large, so by having it exist in the copolymer, it is presumed that the interval between polymers can be expanded. As a result, the obtained machinability-enhanced layer can be excellent in flexibility. Therefore, by making the (meth)acrylate copolymer contain a monomer containing alicyclic structure as a monomer unit constituting the polymer, the composition can be crosslinked, and the obtained machinability-enhanced layer can be excellent in adhesion to the resin board.

又,含脂環式構造之單體中之脂環式構造之碳環可為飽和構造者,亦可一部分具有不飽和鍵者。 且此等脂環式構造可為單環之脂環式構造,亦可為雙環、三環等之多環脂環式構造。 基於使所得(甲基)丙烯酸酯共聚物中之聚合物彼此之間隔擴大,有效地發揮機械加工性提升層之柔軟性之觀點,上述脂環式構造較好為多環的脂環式構造(多環構造)。 進而,基於(甲基)丙烯酸酯共聚物與其他成分之相溶性良好,上述之多環構造特佳為雙環至四環。In addition, the carbon ring of the alicyclic structure in the monomer containing the alicyclic structure may be a saturated structure or may have unsaturated bonds in part. And these alicyclic structures may be monocyclic alicyclic structures or polycyclic alicyclic structures such as bicyclic and tricyclic. Based on the viewpoint of expanding the interval between polymers in the obtained (meth)acrylate copolymer and effectively exerting the flexibility of the machinability-enhancing layer, the above-mentioned alicyclic structure is preferably a polycyclic alicyclic structure (polycyclic structure). Furthermore, based on the good compatibility between the (meth)acrylate copolymer and other components, the above-mentioned polycyclic structure is particularly preferably bicyclic to tetracyclic.

且,與上述同樣基於有效發揮黏著劑之柔軟性之觀點,脂環式構造之碳數(意指形成環的部分的全部碳數,於複數環獨立存在時,意指其合計碳數)通常較好為5以上,更好為7以上。 另一方面,脂環式構造之碳數上限並未特別限制,但與上述同樣基於相溶性之觀點,較好為15以下,更好為10以下。Moreover, similarly to the above, from the viewpoint of effectively exerting the softness of the adhesive, the carbon number of the alicyclic structure (meaning the total carbon number of the part forming the ring, and when multiple rings exist independently, it means the total carbon number) is usually preferably 5 or more, and more preferably 7 or more. On the other hand, the upper limit of the carbon number of the alicyclic structure is not particularly limited, but similarly to the above, from the viewpoint of compatibility, it is preferably 15 or less, and more preferably 10 or less.

因此,作為含脂環式構造之單體中所含之脂環式構造可舉例例如環己基骨架、二環戊二烯骨架、金剛烷骨架、異冰片基骨架、環烷骨架(環庚烷骨架、環辛烷骨架、環壬烷骨架、環癸烷骨架、環十一烷骨架、環十二烷骨架等)、環烯骨架(環庚烯骨架、環辛烯骨架)、降冰片烯骨架、降冰片二烯骨架、立方烷(cubane)骨架、籃烷(basketane)骨架、房烷(housane)骨架、螺骨架等之至少一者。Therefore, as the alicyclic structure contained in the monomer containing an alicyclic structure, examples include at least one of a cyclohexyl skeleton, a dicyclopentadiene skeleton, an adamantane skeleton, an isobornyl skeleton, a cycloalkane skeleton (cycloheptane skeleton, cyclooctane skeleton, cyclononane skeleton, cyclodecane skeleton, cycloundecane skeleton, cyclododecane skeleton, etc.), a cycloene skeleton (cycloheptene skeleton, cyclooctene skeleton), a norbornene skeleton, a norbornadiene skeleton, a cubane skeleton, a basketane skeleton, a housane skeleton, a spiro skeleton, etc.

而且,該等中,基於獲得更優異耐久性之觀點,較好為包含二環戊二烯骨架(脂環式構造的碳數:10)、金剛烷骨架(脂環式構造的碳數:10)或異冰片基骨架(脂環式構造的碳數:7)者,更好為包含異冰片基骨架者。 因此,作為上述含脂環式構造之單體較好為含上述骨架之(甲基)丙烯酸酯單體。具體而言,舉例為(甲基)丙烯酸環己酯、(甲基)丙烯酸二環戊酯、(甲基)丙烯酸金剛烷酯、(甲基)丙烯酸異冰片酯、(甲基)丙烯酸二環戊烯酯、(甲基)丙烯酸二環戊烯基氧基乙酯等之至少一者。 此外,該等中,基於獲得更優異耐久性之觀點,較好為(甲基)丙烯酸二環戊酯、(甲基)丙烯酸金剛烷酯或(甲基)丙烯酸異冰片酯,更好為(甲基)丙烯酸異冰片酯,特佳為丙烯酸異冰片酯。Moreover, among them, from the viewpoint of obtaining better durability, it is preferred to contain a dicyclopentadiene skeleton (alicyclic carbon number: 10), an adamantane skeleton (alicyclic carbon number: 10) or an isobornyl skeleton (alicyclic carbon number: 7), and it is more preferred to contain an isobornyl skeleton. Therefore, as the above-mentioned monomer containing an alicyclic structure, it is preferred to be a (meth)acrylate monomer containing the above-mentioned skeleton. Specifically, it is exemplified by at least one of cyclohexyl (meth)acrylate, dicyclopentyl (meth)acrylate, adamantane (meth)acrylate, isobornyl (meth)acrylate, dicyclopentenyl (meth)acrylate, dicyclopentenyloxyethyl (meth)acrylate, etc. Among them, from the viewpoint of obtaining better durability, dicyclopentyl (meth)acrylate, adamantyl (meth)acrylate or isobornyl (meth)acrylate is preferred, isobornyl (meth)acrylate is more preferred, and isobornyl acrylate is particularly preferred.

又,(甲基)丙烯酸酯共聚物較好相對於單體全體量含有1重量%以上,更好含有4重量%以上,又更好含有8重量%以上之含脂環式構造之單體作為構成該共聚物之單體單位。 同樣,(甲基)丙烯酸酯共聚物較好含有40重量%以下,更好含有30重量%以下,又更好含有24重量%以下之含脂環式構造之單體作為構成該共聚物之單體單位,於成為耐久性更優異之觀點中,特佳為含有18重量%以下。 藉由如此使含脂環式構造之單體之含量為上述範圍內,所得機械加工性提升層之柔軟性變良好,成為對樹脂板之貼合性更優異者,更容易滿足期望之黏著力值,容易發揮切削性及耐久性之故。In addition, the (meth)acrylate copolymer preferably contains 1% by weight or more, more preferably 4% by weight or more, and more preferably 8% by weight or more of monomers containing a lipid ring structure as monomer units constituting the copolymer relative to the total amount of monomers. Similarly, the (meth)acrylate copolymer preferably contains 40% by weight or less, more preferably 30% by weight or less, and more preferably 24% by weight or less of monomers containing a lipid ring structure as monomer units constituting the copolymer, and in terms of achieving better durability, it is particularly preferred to contain 18% by weight or less. By making the content of the monomer containing a lipid ring structure within the above range, the resulting machinability-enhancing layer has better flexibility, better adhesion to the resin board, and is more likely to meet the desired adhesion value, and easy to exert cutting properties and durability.

(1)-4 單體4(含氮原子之單體) 作為主劑(A)之(甲基)丙烯酸酯共聚物較好含有分子內具有氮原子之單體(含氮原子之單體)作為構成該聚合物之單體單位。 又,作為含反應性官能基之單體所例示之含胺基之單體自該含氮原子之單體中除外。藉由於共聚物中存在含氮原子之單體作為構成單位,可促進丙烯酸酯共聚物與熱硬化性成分(B)之反應性,可對機械加工性提升層賦予極性,可提高機械加工性提升層之凝集力。(1)-4 Monomer 4 (nitrogen-containing monomer) The (meth)acrylate copolymer as the main agent (A) preferably contains a monomer having a nitrogen atom in the molecule (nitrogen-containing monomer) as a monomer unit constituting the polymer. In addition, the amine-containing monomer exemplified as a monomer containing a reactive functional group is excluded from the nitrogen-containing monomer. By the presence of a nitrogen-containing monomer as a constituent unit in the copolymer, the reactivity of the acrylate copolymer and the thermosetting component (B) can be promoted, polarity can be imparted to the machinability-enhancing layer, and the cohesion of the machinability-enhancing layer can be improved.

作為上述含氮原子之單體舉例為具有3級胺基之單體、具有醯胺基之單體、具有含氮雜環脂單體等。該等中,較好為具有含氮雜環之單體。 作為該具有含氮雜環之單體舉例為例如N-(甲基)丙烯醯基嗎啉、N-乙烯基-2-吡咯啶酮、N-(甲基)丙烯醯基吡咯啶酮、N-(甲基)丙烯醯基哌啶、N-(甲基)丙烯醯基吡咯啶、N-(甲基)丙烯醯基氮丙啶、(甲基)丙烯酸氮丙啶基乙酯、2-乙烯基吡啶、4-乙烯基吡啶、2-乙烯基吡嗪、1-乙烯基咪唑、N-乙烯基咔唑、N-乙烯基鄰苯二甲醯亞胺等之至少一者。 而且,該等中,基於獲得更優異黏著力之觀點,可說較好為N-(甲基)丙烯醯基嗎啉,更好為N-丙烯醯基嗎啉。Examples of the above-mentioned nitrogen-containing monomers include monomers having tertiary amine groups, monomers having amide groups, and nitrogen-containing heterocyclic monomers. Among them, monomers having nitrogen-containing heterocyclic monomers are preferred. Examples of the monomers having nitrogen-containing heterocyclic monomers include at least one of N-(methyl)acryloyl morpholine, N-vinyl-2-pyrrolidone, N-(methyl)acryloyl pyrrolidone, N-(methyl)acryloyl piperidine, N-(methyl)acryloyl pyrrolidine, N-(methyl)acryloyl aziridine, (methyl)acrylic acid aziridine ethyl ester, 2-vinyl pyridine, 4-vinyl pyridine, 2-vinyl pyrazine, 1-vinylimidazole, N-vinyl carbazole, and N-vinyl phthalimide. Among them, N-(meth)acryloylmorpholine is preferred, and N-acryloylmorpholine is more preferred, from the viewpoint of obtaining a better adhesive force.

又,作為上述之具有含氮雜環之單體以外之含氮原子之單體,可舉例為例如(甲基)丙烯醯胺、N-甲基(甲基)丙烯醯胺、N-羥甲基(甲基)丙烯醯胺、N-第三丁基(甲基)丙烯醯胺、N,N-二甲基(甲基)丙烯醯胺、N,N-乙基(甲基)丙烯醯胺、N,N-二甲基胺基丙基(甲基)丙烯醯胺、N-異丙基(甲基)丙烯醯胺、N-苯基(甲基)丙烯醯胺、二甲胺基丙基(甲基)丙烯醯胺、N-乙烯基己內醯胺、(甲基)丙烯酸二甲胺基乙酯等之至少一者。In addition, as a nitrogen-containing monomer other than the above-mentioned monomer having a nitrogen-containing heterocyclic ring, there can be exemplified at least one of (meth)acrylamide, N-methyl(meth)acrylamide, N-hydroxymethyl(meth)acrylamide, N-tert-butyl(meth)acrylamide, N,N-dimethyl(meth)acrylamide, N,N-ethyl(meth)acrylamide, N,N-dimethylaminopropyl(meth)acrylamide, N-isopropyl(meth)acrylamide, N-phenyl(meth)acrylamide, dimethylaminopropyl(meth)acrylamide, N-vinylcaprolactam, dimethylaminoethyl(meth)acrylate, and the like.

而且,(甲基)丙烯酸酯共聚物較好相對於單體成分全體,含有1重量%以上,更好含有2重量%以上,又更好含有4重量%以上之含氮原子之單體。 且,(甲基)丙烯酸酯共聚物較好含有40重量%以下,更好含有30重量%以下,又更好含有20重量%以下之含氮原子之單體作為構成該共聚物之單體單位,基於成為耐久性更優異者,特佳為含有10重量%以下。 此係因為如此藉由使含氮原子之單體含量落於上述範圍內,所得機械加工性提升層之凝集力有效提升,容易滿足期望之儲存彈性模數之值,可成為耐久性更優異者之故。Moreover, the (meth)acrylate copolymer preferably contains 1% by weight or more, more preferably 2% by weight or more, and more preferably 4% by weight or more of nitrogen-containing monomers relative to the total monomer components. Moreover, the (meth)acrylate copolymer preferably contains 40% by weight or less, more preferably 30% by weight or less, and more preferably 20% by weight or less of nitrogen-containing monomers as monomer units constituting the copolymer, and preferably contains 10% by weight or less in order to achieve better durability. This is because by making the content of nitrogen-containing monomers fall within the above range, the cohesive force of the obtained machinability-enhancing layer is effectively improved, and it is easy to meet the desired storage elastic modulus value, which can achieve better durability.

(1)-5 單體5(其他單體) 作為主劑(A)之(甲基)丙烯酸酯共聚物根據需要,較好含有與上述單體成分不同的其他單體作為構成該聚合物之單體單位。 作為此等其他單體,較好為不含具有反應性之官能基的單體。 亦即,可舉例為例如(甲基)丙烯酸甲氧基乙酯、(甲基)丙烯酸乙氧基乙酯等之(甲基)丙烯酸烷氧基烷酯、乙酸乙烯酯、苯乙烯等。該等可單獨使用,亦可組合2種以上併用。 又,(甲基)丙烯酸酯共聚物之聚合態樣可為無規共聚物,亦可為嵌段共聚物。(1)-5 Monomer 5 (other monomers) The (meth)acrylate copolymer as the main agent (A) preferably contains other monomers different from the above-mentioned monomer components as monomer units constituting the polymer as needed. Such other monomers are preferably monomers that do not contain reactive functional groups. That is, examples include (meth)acrylate alkoxyalkyl esters such as methoxyethyl (meth)acrylate and ethoxyethyl (meth)acrylate, vinyl acetate, styrene, etc. These monomers may be used alone or in combination of two or more. In addition, the polymerization state of the (meth)acrylate copolymer may be a random copolymer or a block copolymer.

(1)-6 重量平均分子量 構成機械加工性提升層14之主劑(A)為(甲基)丙烯酸酯共聚物時,其重量平均分子量(Mw)較好設為5萬~250萬之範圍內之值。 其理由為(甲基)丙烯酸酯共聚物之重量平均分子量設為未達5萬之值時,有凝集力降低,自樹脂板剝離,接著性顯著降低之情況之故。 另一方面,(甲基)丙烯酸酯共聚物之重量平均分子量設為超過250萬之值時,處理變困難,有對樹脂板之貼合性降低之情況之故。 因此,(甲基)丙烯酸酯共聚物之重量平均分子量更好設為10萬~180萬之範圍的值,特佳設為20萬~120萬之範圍的值,又更好為30萬~80萬之範圍的值。 又,機械加工性提升層之主劑的重量平均分子量可藉由GPC(凝膠滲透層析儀),與預先作成之對於標準聚苯乙烯粒子之校正線進行對比而求得。(1)-6 Weight average molecular weight When the main agent (A) constituting the machinability-enhancing layer 14 is a (meth)acrylate copolymer, its weight average molecular weight (Mw) is preferably set to a value in the range of 50,000 to 2.5 million. The reason is that when the weight average molecular weight of the (meth)acrylate copolymer is set to a value below 50,000, the cohesive force is reduced, the copolymer peels off from the resin sheet, and the adhesion is significantly reduced. On the other hand, when the weight average molecular weight of the (meth)acrylate copolymer is set to a value exceeding 2.5 million, the handling becomes difficult, and the adhesion to the resin sheet is reduced. Therefore, the weight average molecular weight of the (meth)acrylate copolymer is preferably set to a value in the range of 100,000 to 1.8 million, particularly preferably set to a value in the range of 200,000 to 1.2 million, and more preferably set to a value in the range of 300,000 to 800,000. The weight average molecular weight of the main agent of the machinability improving layer can be determined by comparing it with a pre-prepared calibration curve for standard polystyrene particles using GPC (gel permeation chromatography).

(1)-7 (甲基)丙烯酸酯共聚物之聚合 作為主劑(A)之(甲基)丙烯酸酯共聚物可藉由使構成該聚合物之單體的混合物藉通常之自由基聚合法聚合而製造。 該(甲基)丙烯酸酯共聚物之聚合可使用聚合起始劑藉由溶液聚合法等進行。 作為聚合溶劑舉例為例如乙酸乙酯、乙酸正丁酯、乙酸異丁酯、甲苯、丙酮、己烷、甲基乙基酮等,亦可併用2種以上。(1)-7 Polymerization of (meth)acrylate copolymer The (meth)acrylate copolymer as the main agent (A) can be produced by polymerizing a mixture of monomers constituting the polymer by a conventional free radical polymerization method. The polymerization of the (meth)acrylate copolymer can be carried out by a solution polymerization method or the like using a polymerization initiator. Examples of polymerization solvents include ethyl acetate, n-butyl acetate, isobutyl acetate, toluene, acetone, hexane, methyl ethyl ketone, etc., and two or more kinds may be used in combination.

作為(甲基)丙烯酸酯共聚物聚合時之聚合起始劑舉例為偶氮系化合物、有機過氧化物等,亦可併用2種以上。 更具體而言,作為偶氮系化合物,舉例為例如2,2’-偶氮雙異丁腈、2,2’-偶氮雙(2-甲基丁腈)、1,1’-偶氮雙(環己基-1-甲腈)、2,2’-偶氮雙(2,4-二甲基戊腈)、2,2’-偶氮雙(2,4-二甲基-4-甲氧基戊腈)、2,2’-偶氮雙(2-甲基丙酸)二甲酯、4,4’-偶氮雙(4-氰基戊酸)、2,2’-偶氮雙(2-羥基甲基丙腈)、2,2’-偶氮雙[2-(2-咪唑啉-2-基)丙烷]等。Examples of polymerization initiators for the polymerization of (meth)acrylate copolymers include azo compounds, organic peroxides, etc., and two or more types may be used in combination. More specifically, examples of azo compounds include 2,2'-azobisisobutyronitrile, 2,2'-azobis(2-methylbutyronitrile), 1,1'-azobis(cyclohexyl-1-carbonitrile), 2,2'-azobis(2,4-dimethylvaleronitrile), 2,2'-azobis(2,4-dimethyl-4-methoxyvaleronitrile), 2,2'-azobis(2-methylpropionic acid)dimethyl ester, 4,4'-azobis(4-cyanovaleric acid), 2,2'-azobis(2-hydroxymethylpropionitrile), and 2,2'-azobis[2-(2-imidazolin-2-yl)propane].

又,作為有機過氧化物舉例為例如過氧化苯甲醯、過氧苯甲酸第三丁酯、枯基過氧化氫、過氧二碳酸二異丙酯、過氧二碳酸二-正丙酯、過氧二碳酸二(2-乙氧基乙酯)、過氧新癸酸第三丁酯、過氧戊酸第三丁酯、(3,5,5-三甲基己醯基)過氧化物、二丙醯基過氧化物、二乙醯基過氧化物等。 又,上述聚合步驟中,藉由調配2-巰基乙醇等之鏈轉移劑,可將所得聚合物之重量平均分子量調節於期望值。Examples of organic peroxides include benzoyl peroxide, t-butyl perbenzoate, cumyl hydroperoxide, diisopropyl peroxydicarbonate, di-n-propyl peroxydicarbonate, di(2-ethoxyethyl) peroxydicarbonate, t-butyl peroxyneodecanoate, t-butyl peroxyvalerate, (3,5,5-trimethylhexyl) peroxide, dipropionyl peroxide, diacetyl peroxide, etc. In addition, in the above polymerization step, the weight average molecular weight of the obtained polymer can be adjusted to a desired value by mixing a chain transfer agent such as 2-hydroxyethanol.

(2)熱硬化性成分(B) 含有熱硬化性成分(B)之組成物加熱時,該熱硬化性成分(B)與作為主劑(A)之(甲基)丙烯酸酯共聚物進行交聯反應,形成交聯構造(三維網眼構造)。藉此,可獲得被模強度比較高的機械加工性提升層。 作為此等熱硬化性成分(B)之種類,若為可與主劑(A)(例如(甲基)丙烯酸酯共聚物)反應者即可,較好若為與導入於組成物之主劑(A)而成之反應性基(例如羥基或羧基等)反應者即可。 因此,作為熱硬化性成分(B)舉例為例如異氰酸酯系交聯劑、環氧系交聯劑、胺系交聯劑、三聚氰胺系交聯劑、氮丙啶系交聯劑、聯胺系交聯劑、醛系交聯劑、噁唑啉系交聯劑、金屬烷氧化物系交聯劑、金屬螯合劑系交聯劑、金屬鹽系交聯劑、銨鹽系交聯劑等之至少一者。 該等熱硬化性成分(B)種類,只要根據主劑(A)所具有的反應性基的反應性選擇即可。 例如,主劑(A)具有之反應性基為羥基時,較好調配與羥基之反應性優異之異氰酸酯系交聯劑。 又,主劑(A)具有之反應性基為羧基時,較好使用與羧基之反應性優異之環氧系交聯劑。 且,熱硬化性成分(B)可單獨使用1種,或可組合2種以上使用。(2) Thermosetting component (B) When a composition containing a thermosetting component (B) is heated, the thermosetting component (B) undergoes a crosslinking reaction with the (meth)acrylate copolymer as the main agent (A) to form a crosslinked structure (three-dimensional mesh structure). This allows a layer with improved machinability and relatively high mold strength to be obtained. The type of such thermosetting component (B) may be any one that reacts with the main agent (A) (e.g., a (meth)acrylate copolymer), and preferably any one that reacts with a reactive group (e.g., a hydroxyl group or a carboxyl group, etc.) introduced into the main agent (A) of the composition. Therefore, the thermosetting component (B) is exemplified by at least one of an isocyanate crosslinking agent, an epoxy crosslinking agent, an amine crosslinking agent, a melamine crosslinking agent, an aziridine crosslinking agent, a diamine crosslinking agent, an aldehyde crosslinking agent, an oxazoline crosslinking agent, a metal alkoxide crosslinking agent, a metal chelate crosslinking agent, a metal salt crosslinking agent, an ammonium salt crosslinking agent, etc. The type of the thermosetting component (B) can be selected according to the reactivity of the reactive group possessed by the main agent (A). For example, when the reactive group possessed by the main agent (A) is a hydroxyl group, it is better to prepare an isocyanate crosslinking agent having excellent reactivity with the hydroxyl group. Furthermore, when the reactive group of the main agent (A) is a carboxyl group, it is better to use an epoxy-based crosslinking agent that has excellent reactivity with the carboxyl group. Moreover, the thermosetting component (B) can be used alone or in combination of two or more.

又,異氰酸酯系交聯劑較好係至少包含聚異氰酸酯化合物者。 此處,作為聚異氰酸酯化合物舉例為例如甲苯二異氰酸酯、二苯基甲烷二異氰酸酯、二甲苯二異氰酸酯等之芳香族聚異氰酸酯,六亞甲基二異氰酸酯等之脂肪族聚異氰酸酯、異佛酮二異氰酸酯、氫化二苯基甲烷二異氰酸酯等之脂環式聚異氰酸酯等,及該等之縮脲體、異氰脲酸酯體,進而為與乙二醇、丙二醇、新戊二醇、三羥甲基丙烷、蓖麻油等之低分子含活性氫的化合物之反應物的加成體等。該等中,基於與羥基之反應性之觀點,較好為三羥甲基丙烷改質之芳香族聚異氰酸酯,尤其較好為三羥甲基丙烷改質甲苯二異氰酸酯及三羥甲基丙烷改質二甲苯二異氰酸酯之至少一者。In addition, the isocyanate crosslinking agent preferably contains at least a polyisocyanate compound. Here, examples of the polyisocyanate compound include aromatic polyisocyanates such as toluene diisocyanate, diphenylmethane diisocyanate, and xylene diisocyanate, aliphatic polyisocyanates such as hexamethylene diisocyanate, alicyclic polyisocyanates such as isophorone diisocyanate and hydrogenated diphenylmethane diisocyanate, and urea bodies and isocyanurate bodies thereof, and adducts of reaction products with low molecular weight active hydrogen-containing compounds such as ethylene glycol, propylene glycol, neopentyl glycol, trihydroxymethylpropane, and castor oil. Among them, trihydroxymethylpropane-modified aromatic polyisocyanates are preferred from the viewpoint of reactivity with hydroxyl groups, and at least one of trihydroxymethylpropane-modified toluene diisocyanate and trihydroxymethylpropane-modified xylene diisocyanate is particularly preferred.

又,作為環氧系交聯劑舉例為例如1,3-雙(N,N-二縮水甘油基胺基甲基)環己烷、N,N,N’,N’-四縮水甘油基-間-二甲苯二胺、乙二醇二縮水甘油醚、1,6-己二醇二縮水甘油醚、三羥甲基丙烷二縮水甘油醚、二縮水甘油基苯胺、二縮水甘油基胺等之至少一者。 該等中,基於與羧基之反應性的觀點,特佳為1,3-雙(N,N-二縮水甘油基胺基甲基)環己烷。In addition, examples of epoxy crosslinking agents include at least one of 1,3-bis(N,N-diglycidylaminomethyl)cyclohexane, N,N,N',N'-tetraglycidyl-m-xylene diamine, ethylene glycol diglycidyl ether, 1,6-hexanediol diglycidyl ether, trihydroxymethylpropane diglycidyl ether, diglycidyl aniline, and diglycidyl amine. Among them, 1,3-bis(N,N-diglycidylaminomethyl)cyclohexane is particularly preferred from the viewpoint of reactivity with carboxyl groups.

且,熱硬化性成分(B)之調配量,相對於主劑(A) 100重量份,較好設為0.05~10重量份之範圍內的值。 其理由為該熱硬化性成分(B)之調配量設為未達0.05質量份之值時,與導入至主劑的羥基或羧基的反應性顯著降低,所得機械加工性提升層無法獲得期望凝集力,有無法發揮特定黏著性之故。其結果,有使機械加工性提升層自樹脂板剝離,接著性顯著降低之情況。 另一方面,該熱硬化性成分(B)之調配量設為超過10質量份之值時,與導入於主劑(A)之羥基或羧基過度反應,而有使機械加工性提升層之凝集力過於變高,而黏著性顯著降低之情況。 因此,相對於主劑(A) 100重量份,熱硬化性成分(B)之調配量更好設為0.1~5重量份的範圍內之值,又更好設為0.3~1重量份的範圍內之值。Furthermore, the amount of the thermosetting component (B) is preferably set to a value within the range of 0.05 to 10 parts by weight relative to 100 parts by weight of the main agent (A). The reason is that when the amount of the thermosetting component (B) is set to a value less than 0.05 parts by weight, the reactivity with the hydroxyl group or carboxyl group introduced into the main agent is significantly reduced, and the resulting machinability-enhancing layer cannot obtain the desired cohesive force and cannot exert specific adhesiveness. As a result, there is a case where the machinability-enhancing layer is peeled off from the resin sheet and the adhesion is significantly reduced. On the other hand, when the amount of the thermosetting component (B) is set to a value exceeding 10 parts by weight, the thermosetting component (B) reacts excessively with the hydroxyl group or carboxyl group introduced into the main agent (A), and the cohesive force of the machinability-enhancing layer becomes too high, and the adhesion is significantly reduced. Therefore, the amount of the thermosetting component (B) is preferably set to a value within the range of 0.1 to 5 parts by weight, and more preferably within the range of 0.3 to 1 part by weight, relative to 100 parts by weight of the main agent (A).

(3)活性能量線硬化性成分(C) 本實施形態之機械加工性提升層較好含有性能量線硬化性成分(C)。 如此機械加工性提升層貼附於被黏著體(樹脂板)後,照射活性能量線時,以後述之光聚合起始劑(D)的開裂為開端,促進活性能量線硬化性成分(C)之聚合。 該經聚合之活性能量線硬化性成分(C)推定係纏繞至由主劑(A)及熱硬化性成分(B)之熱交聯形成之交聯構造(三維網眼構造)者。 因此,具有此等高次元構造的機械加工性提升層容易滿足期望之黏著力值,成為在高溫高濕條件下之耐久性優異者,同時容易滿足期望之儲存彈性模數之值,成為切削性優異者。(3) Active energy ray-hardening component (C) The machinability-enhancing layer of this embodiment preferably contains an active energy ray-hardening component (C). After the machinability-enhancing layer is attached to the adherend (resin sheet), when the active energy ray is irradiated, the polymerization of the active energy ray-hardening component (C) is promoted starting from the cracking of the photopolymerization initiator (D) described later. The polymerized active energy ray-hardening component (C) is presumed to be entangled in the crosslinked structure (three-dimensional mesh structure) formed by the thermal crosslinking of the main agent (A) and the thermosetting component (B). Therefore, the machinability-enhancing layer having such a high-dimensional structure can easily meet the desired adhesion value, and has excellent durability under high temperature and high humidity conditions, and can also easily meet the desired storage elastic modulus value, and has excellent machinability.

此處,作為活性能量線硬化性成分(C),若為藉由照射活性能量線而產生硬化反應,獲得上述效果之成分,則未特別限制。 又,活性能量線硬化性成分(C)可為單體、寡聚物或聚合物之任一者,亦可為該等之混合物。 該等中,較好為與主劑(A)等之相溶性優異的重量平均分子量未達1,000之多官能丙烯酸酯系單體。Here, the active energy ray-curable component (C) is not particularly limited as long as it is a component that produces a curing reaction by irradiating active energy rays to obtain the above-mentioned effect. In addition, the active energy ray-curable component (C) may be any of a monomer, an oligomer or a polymer, or a mixture thereof. Among them, a multifunctional acrylate monomer having a weight average molecular weight of less than 1,000 and having excellent compatibility with the main agent (A) is preferred.

更具體而言,作為重量平均分子量未達1,000之多官能丙烯酸酯系單體,較好為具有2~6個反應性官能基之丙烯酸酯系單體。 此處,作為具有2個反應性官能基之丙烯酸酯系單體舉例為例如1,4-丁二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯、新戊二醇己二酸酯二(甲基)丙烯酸酯、羥基戊酸新戊二醇二(甲基)丙烯酸酯、二環戊基二(甲基)丙烯酸酯、己內酯改質二環戊烯基二(甲基)丙烯酸酯、環氧乙烷改質磷酸二(甲基)丙烯酸酯、二(丙烯醯氧基乙基)異氰脲酸酯、烯丙基化環己基二(甲基)丙烯酸酯、乙氧化雙酚A二丙烯酸酯、9,9-雙[4-(2-丙烯醯氧基乙氧基)苯基]茀等之至少一種。More specifically, as a multifunctional acrylate monomer having a weight average molecular weight of less than 1,000, it is preferably an acrylate monomer having 2 to 6 reactive functional groups. Here, examples of the acrylate monomer having two reactive functional groups include at least one of 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, neopentyl glycol di(meth)acrylate, polyethylene glycol di(meth)acrylate, neopentyl glycol adipate di(meth)acrylate, hydroxyvaleric acid neopentyl glycol di(meth)acrylate, dicyclopentyl di(meth)acrylate, caprolactone-modified dicyclopentenyl di(meth)acrylate, ethylene oxide-modified phosphoric acid di(meth)acrylate, di(acryloyloxyethyl) isocyanurate, allyl cyclohexyl di(meth)acrylate, ethoxylated bisphenol A diacrylate, and 9,9-bis[4-(2-acryloyloxyethoxy)phenyl]fluorene.

又,作為具有3個反應性官能基之丙烯酸酯系單體舉例為例如三羥甲基丙烷三(甲基)丙烯酸酯、二季戊四醇三(甲基)丙烯酸酯、丙酸改質二季戊四醇三(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、環氧丙烷改質三羥甲基丙烷三(甲基)丙烯酸酯、三(丙烯醯氧基乙基)異氰脲酸酯、ε-己內酯改質三-(2-(甲基)丙烯醯氧基乙基)異氰脲酸酯等之至少一者。In addition, examples of the acrylate monomer having three reactive functional groups include at least one of trihydroxymethylpropane tri(meth)acrylate, dipentaerythritol tri(meth)acrylate, propionic acid-modified dipentaerythritol tri(meth)acrylate, pentaerythritol tri(meth)acrylate, propylene oxide-modified trihydroxymethylpropane tri(meth)acrylate, tris(acryloyloxyethyl)isocyanurate, and ε-caprolactone-modified tris-(2-(meth)acryloyloxyethyl)isocyanurate.

再者,作為具有4個反應性官能基之丙烯酸酯系單體舉例為二甘油四(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯等。 作為具有5個反應性官能基之丙烯酸酯系單體舉例為丙酸改質二季戊四醇五(甲基)丙烯酸酯等之至少一者。 作為具有6個反應性官能基之丙烯酸酯系單體舉例為二季戊四醇六(甲基)丙烯酸酯、己內酯改質二季戊四醇六(甲基)丙烯酸酯等之至少一者。Furthermore, examples of acrylate monomers having four reactive functional groups include diglycerol tetra(meth)acrylate and pentaerythritol tetra(meth)acrylate. Examples of acrylate monomers having five reactive functional groups include at least one of propionic acid-modified dipentaerythritol penta(meth)acrylate. Examples of acrylate monomers having six reactive functional groups include at least one of dipentaerythritol hexa(meth)acrylate and caprolactone-modified dipentaerythritol hexa(meth)acrylate.

該等中,基於機械加工性提升層之耐久性之觀點,特佳為具有3~6個反應性官能基之丙烯酸酯系單體。 具體而言,特佳為三羥甲基丙烷三丙烯酸酯、二季戊四醇六丙烯酸酯、ε-己內酯改質三-(2-(甲基)丙烯醯氧基乙基)異氰脲酸酯。Among them, from the viewpoint of improving the durability of the machinability-enhancing layer, acrylate monomers having 3 to 6 reactive functional groups are particularly preferred. Specifically, trihydroxymethylpropane triacrylate, dipentaerythritol hexaacrylate, and ε-caprolactone-modified tri-(2-(methyl)acryloyloxyethyl) isocyanurate are particularly preferred.

又,作為活性能量線硬化性成分(C)亦較好使用活性能量線硬化型之丙烯酸酯系寡聚物。 作為此等丙烯酸酯系寡聚物之例,舉例為聚酯丙烯酸酯系、環氧丙烯酸酯系、胺基甲酸酯丙烯酸酯系、聚醚丙烯酸酯系、聚丁二烯丙烯酸酯系、聚矽氧丙烯酸酯系等之至少一者。 而且,此等丙烯酸酯系寡聚物之重量平均分子量較好為50000以下,更好為500~50000,又更好為3000~40000。In addition, it is also preferable to use an active energy ray-curable acrylate oligomer as the active energy ray-curable component (C). Examples of such acrylate oligomers include at least one of polyester acrylate, epoxy acrylate, urethane acrylate, polyether acrylate, polybutadiene acrylate, and polysilicone acrylate. Moreover, the weight average molecular weight of such acrylate oligomers is preferably 50,000 or less, more preferably 500 to 50,000, and even more preferably 3,000 to 40,000.

又,作為活性能量線硬化性成分(C)亦較好使用於側鏈導入有具有(甲基)丙烯醯基之基的加成丙烯酸酯系聚合物。 此等加成丙烯酸酯系聚合物可藉由使用(甲基)丙烯酸酯與分子內具有交聯性官能基之單體的共聚物,於該共聚物之交聯性官能基之一部分與具有與(甲基)丙烯醯基及交聯性官能基反應之基的化合物反應而獲得。 上述之加成丙烯酸酯系聚合物之重量平均分子量較好為5萬~90萬左右,更好為10萬~50萬左右。Furthermore, as the active energy ray-hardening component (C), it is also preferable to use an addition acrylate polymer having a (meth)acrylic group introduced into the side chain. Such addition acrylate polymers can be obtained by using a copolymer of (meth)acrylic acid ester and a monomer having a crosslinking functional group in the molecule, and reacting a part of the crosslinking functional group of the copolymer with a compound having a group that reacts with the (meth)acrylic group and the crosslinking functional group. The weight average molecular weight of the above-mentioned addition acrylate polymer is preferably about 50,000 to 900,000, and more preferably about 100,000 to 500,000.

本實施形態中,活性能量線硬化性成分(C)較好使用前述之多官能丙烯酸酯系單體,但亦可自多官能丙烯酸酯系單體、丙烯酸酯系寡聚物及加成丙烯酸酯系聚合物中選擇1種使用,亦可組合2種以上使用,亦可組合使用該等成分與其他活性能量線硬化性成分。In this embodiment, the active energy ray-hardening component (C) preferably uses the aforementioned multifunctional acrylate monomer, but one type may be selected from multifunctional acrylate monomers, acrylate oligomers and addition acrylate polymers, or two or more types may be used in combination, or these components may be used in combination with other active energy ray-hardening components.

而且,活性能量線硬化性成分(C)之調配量通常相對於主劑(A) 100重量份,較好設為1~50重量份之範圍內之值。 其理由係該活性能量線硬化性成分(C)之調配量設為未達1重量份之值時,缺乏反應性,有無法獲得良好機械加工處理性之情況之故。 另一方面,該活性能量線硬化性成分(C)之調配量設為超過50重量份時,相反地無法控制反應性,會與主劑(A)過度反應,使交聯構造過於緻密,使黏著力降低而有無法獲得良好耐久性之情況之故。 因此,該活性能量線硬化性成分(C)之調配量下限,相對於主劑(A) 100重量份,較好設為3重量份以上,特佳設為6重量份以上,更好設為10重量份以上。 另一方面,該活性能量線硬化性成分(C)之調配量上限,較好設為30重量份以下,特佳設為20重量份以下,更好設為13重量份以下。Furthermore, the amount of the active energy ray curable component (C) is preferably set to a value within the range of 1 to 50 parts by weight relative to 100 parts by weight of the main agent (A). The reason is that when the amount of the active energy ray curable component (C) is set to a value less than 1 part by weight, it lacks reactivity and may not be able to obtain good mechanical processing properties. On the other hand, when the amount of the active energy ray curable component (C) is set to more than 50 parts by weight, the reactivity cannot be controlled, and it will react excessively with the main agent (A), making the cross-linked structure too dense, reducing the adhesion, and may not be able to obtain good durability. Therefore, the lower limit of the amount of the active energy ray curable component (C) is preferably set to 3 parts by weight or more, particularly preferably 6 parts by weight or more, and more preferably 10 parts by weight or more, relative to 100 parts by weight of the main agent (A). On the other hand, the upper limit of the amount of the active energy ray curable component (C) is preferably set to 30 parts by weight or less, particularly preferably 20 parts by weight or less, and more preferably 13 parts by weight or less.

(4)光聚合起始劑(D) 由於藉由活性能量線之照射,可使活性能量線硬化性成分(C)有效地硬化,故較好依期望含有光聚合起始劑(D)。(4) Photopolymerization initiator (D) Since the active energy ray-curable component (C) can be effectively cured by irradiation with active energy rays, it is preferable to contain a photopolymerization initiator (D) as desired.

作為此等光聚合起始劑(D),舉例為苯偶因、苯偶因甲醚、苯偶因乙醚、苯偶因異丙醚、苯偶因正丁醚、苯偶因異丁醚、二苯甲酮、二甲胺基苯乙酮、2,2-二甲氧基-2-苯基苯乙酮、2,2-二乙氧基-2-苯基苯乙酮、2-羥基-2-甲基-1-苯基丙烷-1-酮、1-羥基環己基苯基酮、2-甲基-1-[4-(甲硫基)苯基]-2-嗎啉基-丙烷-1-酮、4-(2-羥基乙氧基)苯基-2-(羥基-2-丙基)酮、二苯甲酮、對-苯基二苯甲酮、4,4’-二乙胺基二苯甲酮、二氯二苯甲酮、2-甲基蒽醌、2-乙基蒽醌、2-第三丁基蒽醌、2-胺基蒽醌、2-甲基噻噸酮、2-乙基噻噸酮、2-氯噻噸酮、2,4-二甲基噻噸酮、2,4-二乙基噻噸酮、苄基二甲基縮醛、苯乙酮二甲基縮醛、對-二甲胺基苯甲酸酯、2,4,6-三甲基苯甲醯基-二苯基氧化膦、雙(2,4,6-三甲基苯甲醯基)-苯基氧化膦等之至少一者。Examples of the photopolymerization initiator (D) include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin n-butyl ether, benzoin isobutyl ether, benzophenone, dimethylaminoacetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2,2-diethoxy-2-phenylacetophenone, 2-hydroxy-2-methyl-1-phenylpropane-1-one, 1-hydroxycyclohexylphenyl ketone, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinyl-propane-1-one, 4-(2-hydroxyethoxy)phenyl-2-(hydroxy-2-propyl) At least one of benzophenone, benzophenone, p-phenylbenzophenone, 4,4'-diethylaminobenzophenone, dichlorobenzophenone, 2-methylanthraquinone, 2-ethylanthraquinone, 2-tert-butylanthraquinone, 2-aminoanthraquinone, 2-methylthiazonone, 2-ethylthiazonone, 2-chlorothiazonone, 2,4-dimethylthiazonone, 2,4-diethylthiazonone, benzyl dimethyl acetal, acetophenone dimethyl acetal, p-dimethylaminobenzoate, 2,4,6-trimethylbenzyl-diphenylphosphine oxide, bis(2,4,6-trimethylbenzyl)-phenylphosphine oxide, and the like.

該等中,作為活性能量線併用紫外線時,較好含有於紫外線吸收波長區域外亦具有吸收波長之光聚合起始劑(D),其中更好含有比紫外線區域更長波長側(380nm以上)具有吸收波長之光聚合起始劑(D),特佳含有於380nm~410nm之波長區域具有吸收波長之光聚合起始劑(D),具體而言,較好含有2,4,6-三甲基苯甲醯基-二苯基氧化膦或雙(2,4,6-三甲基苯甲醯基)-苯基氧化膦等。 其理由如下。 由於具備觸控面板之移動電子機器等大多於屋外使用,故其構成構件會有因紫外線影響而劣化之問題。 為了解決該問題,有如下方法:藉由將具有紫外線吸收性能之構件(紫外線遮蔽構件)組裝於電子機器內,而抑制因紫外線影響之劣化。 藉由如此於電子機器內組裝紫外線遮蔽構件,於自紫外線遮蔽構件側照射紫外線之情況下,若於機械加工性提升層中使用於紫外線吸收波長區域外不具有吸收波長之光聚合起始劑(D),則紫外線因紫外線遮蔽材構件之遮蔽,而無法使機械加工性提升層硬化。 若反過來說,於此等情況下,若於機械加工性提升層中使用於紫外線吸收波長區域外亦具有吸收波長之光聚合起始劑(D),則可利用紫外線吸收波長區域外之波長而充分硬化之故。Among them, when ultraviolet rays are used as active energy rays, it is better to contain a photopolymerization initiator (D) having an absorption wavelength outside the ultraviolet absorption wavelength region, and it is more preferable to contain a photopolymerization initiator (D) having an absorption wavelength on the longer wavelength side (380nm or more) than the ultraviolet region, and it is particularly preferable to contain a photopolymerization initiator (D) having an absorption wavelength in the wavelength region of 380nm to 410nm. Specifically, it is better to contain 2,4,6-trimethylbenzyl-diphenylphosphine oxide or bis(2,4,6-trimethylbenzyl)-phenylphosphine oxide. The reason is as follows. Since mobile electronic devices with touch panels are mostly used outdoors, their components may be degraded by ultraviolet rays. To solve this problem, there is a method of suppressing deterioration due to ultraviolet light by assembling a component having ultraviolet light absorption performance (ultraviolet light shielding component) in an electronic device. By assembling the ultraviolet light shielding component in the electronic device, when ultraviolet light is irradiated from the ultraviolet light shielding component side, if a photopolymerization initiator (D) that does not have an absorption wavelength outside the ultraviolet light absorption wavelength region is used in the machinability improvement layer, the ultraviolet light cannot be cured due to the shielding of the ultraviolet light shielding material component. On the other hand, in such a case, if a photopolymerization initiator (D) that has an absorption wavelength outside the ultraviolet light absorption wavelength region is used in the machinability improvement layer, the ultraviolet light can be fully cured by utilizing the wavelength outside the ultraviolet light absorption wavelength region.

而且,作為光聚合起始劑(D)之調配量,相對於活性能量線硬化性成分(C) 100重量份,較好設為0.5~25重量份之範圍內之值,更好設為2~20重量份之範圍內之值,又更好設為5~15重量份之範圍內之值。The amount of the photopolymerization initiator (D) is preferably 0.5 to 25 parts by weight, more preferably 2 to 20 parts by weight, and even more preferably 5 to 15 parts by weight, based on 100 parts by weight of the active energy ray-curable component (C).

(5)矽烷偶合劑(E) 用以形成機械加工性提升層之組成物亦較好進而含有矽烷偶合劑(E)。 藉此,於被黏著體包含玻璃構件或樹脂構件時,機械加工性提升層與被黏著體之密著性提高之故。 因此,含有矽烷偶合劑(E)之機械加工性提升層成為在高溫高濕條件下之耐久性更優異者。(5) Silane coupling agent (E) The composition used to form the machinability enhancing layer preferably further contains a silane coupling agent (E). Therefore, when the adherend includes a glass component or a resin component, the adhesion between the machinability enhancing layer and the adherend is improved. Therefore, the machinability enhancing layer containing a silane coupling agent (E) becomes more durable under high temperature and high humidity conditions.

此處,作為矽烷偶合劑(E)之種類,為分子內具有至少1個烷氧基矽烷基之有機矽化合物,較好為具有光透過性者。 作為此等矽烷偶合劑(E),舉例為例如乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、甲基丙烯醯氧基丙基三甲氧基矽烷等之含聚合性不飽和基之矽化合物;3-縮水甘油氧基丙基三甲氧基矽烷、2-(3,4-環氧基環己基)乙基三甲氧基矽烷等之具有環氧基構造之矽化合物;3-巰基丙基三甲氧基矽烷、3-巰基丙基三乙氧基矽烷、3-巰基丙基二甲氧基甲基矽烷等之含巰基之矽化合物;3-胺基丙基三甲氧基矽烷、N-(2-胺基乙基)-3-胺基丙基三甲氧基矽烷、N-(2-胺基乙基)-3-胺基丙基甲基二甲氧基矽烷等之含胺基之矽化合物;3-氯丙基三甲氧基矽烷、3-異氰酸酯基丙基三乙氧基矽烷或該等之至少一者,與甲基三乙氧基矽烷、乙基三乙氧基矽烷、甲基三甲氧基矽烷、乙基三甲氧基矽烷等之含烷基之矽化合物之縮合物等。該等可單獨使用1種,亦可組合2種以上使用。Here, the type of silane coupling agent (E) is an organic silicon compound having at least one alkoxysilyl group in the molecule, preferably one having light transmittance. Examples of such silane coupling agents (E) include silicon compounds containing polymerizable unsaturated groups such as vinyltrimethoxysilane, vinyltriethoxysilane, and methacryloxypropyltrimethoxysilane; silicon compounds having an epoxy structure such as 3-glycidyloxypropyltrimethoxysilane and 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane; silicon compounds containing olefins such as 3-butylpropyltrimethoxysilane, 3-butylpropyltriethoxysilane, and 3-butylpropyldimethoxymethylsilane; silane compounds containing amino groups; silane compounds containing amino groups such as 3-aminopropyltrimethoxysilane, N-(2-aminoethyl)-3-aminopropyltrimethoxysilane, and N-(2-aminoethyl)-3-aminopropylmethyldimethoxysilane; condensates of 3-chloropropyltrimethoxysilane, 3-isocyanatepropyltriethoxysilane, or at least one of these and methyltriethoxysilane, ethyltriethoxysilane, methyltrimethoxysilane, and ethyltrimethoxysilane. These compounds may be used alone or in combination of two or more.

又,矽烷偶合劑(E)之調配量,相對於主劑(A) 100重量份,通常較好設為0.01~5重量份之範圍內之值。 其理由為該矽烷偶合劑(E)之調配量若設為未達0.01重量份之值,則有不易獲得調配效果之情況之故。 另一方面,該矽烷偶合劑(E)之調配量若設為超過5重量份之值,則有起因於該矽烷偶合劑(E),使導入於主劑(A)之羥基或羧基與熱硬化性成分(B)過度反應,而使黏著性顯著降低之情況之故。 因此,矽烷偶合劑(E)之調配量,相對於主劑(A) 100重量份,較好設為0.1~3重量份之範圍內之值,更好設為0.2~1重量份之範圍內之值。In addition, the amount of the silane coupling agent (E) is preferably set within the range of 0.01 to 5 parts by weight relative to 100 parts by weight of the main agent (A). The reason is that if the amount of the silane coupling agent (E) is set to a value less than 0.01 parts by weight, the effect of the compounding may not be easily obtained. On the other hand, if the amount of the silane coupling agent (E) is set to a value exceeding 5 parts by weight, the hydroxyl group or carboxyl group introduced into the main agent (A) may react excessively with the thermosetting component (B) due to the silane coupling agent (E), thereby significantly reducing the adhesion. Therefore, the amount of the silane coupling agent (E) is preferably set to a value within the range of 0.1 to 3 parts by weight, and more preferably set to a value within the range of 0.2 to 1 part by weight, relative to 100 parts by weight of the main agent (A).

(6)添加劑 為了進一步改良機械加工性提升層之機械加工性提升性或機械特性等,除上述矽烷偶合劑(E)以外,亦較好調配無機填料、有機填料、無機纖維、有機纖維、導電性材料、電絕緣性材料、金屬離子捕捉劑、輕量化劑、增黏劑、填充劑、研磨劑、著色劑、抗氧化劑、水解防止劑、紫外線吸收劑等之至少一種習知添加劑。 因此,調配該等習知添加劑時,其調配量通常相對於主劑(A)全體量(100重量%),較好設為0.1~50重量%之範圍內之值,更好設為0.5~30重量%之範圍內之值。(6) Additives In order to further improve the machinability or mechanical properties of the machinability enhancing layer, in addition to the above-mentioned silane coupling agent (E), it is also preferred to formulate at least one known additive such as inorganic filler, organic filler, inorganic fiber, organic fiber, conductive material, electrical insulating material, metal ion scavenger, lightweight agent, thickener, filler, abrasive, colorant, antioxidant, hydrolysis inhibitor, ultraviolet absorber, etc. Therefore, when these conventional additives are added, their amount is usually preferably set to a value within the range of 0.1 to 50 wt %, and more preferably set to a value within the range of 0.5 to 30 wt %, relative to the total amount (100 wt %) of the main agent (A).

(7)厚度 機械加工性提升層之厚度較好設為3~40μm之範圍內之值。 其理由為該機械加工性提升層之厚度若設為未達3μm之值,則無法展現期望黏著性,有對樹脂板之貼合性或耐久性惡化之傾向之故。 另一方面,該機械加工性提升層之厚度若設為超過40μm之值,則有切削性惡化之情況,或於活性能量線照射前後之黏著力等難以調整至期望範圍內之值的情況之故。 因此,機械加工性提升層之厚度更好設為8~30μm之範圍內之值,又更好設為10~20μm之範圍內之值。(7) Thickness The thickness of the machinability enhancing layer is preferably set to a value within the range of 3 to 40 μm. The reason is that if the thickness of the machinability enhancing layer is set to a value less than 3 μm, the desired adhesion cannot be exhibited, and there is a tendency for the adhesion or durability to the resin board to deteriorate. On the other hand, if the thickness of the machinability enhancing layer is set to a value exceeding 40 μm, there is a possibility that the cutting performance deteriorates, or it is difficult to adjust the adhesion before and after the active energy ray irradiation to a value within the desired range. Therefore, the thickness of the machinability enhancing layer is preferably set to a value within the range of 8 to 30 μm, and more preferably set to a value within the range of 10 to 20 μm.

3.特定基材 特定基材種類並未特別限制,但通常典型上為功能性薄膜或剝離薄膜。3. Specific substrate The type of specific substrate is not particularly limited, but it is typically a functional film or a release film.

特定基材為功能性薄膜時,作為其種類,舉例為觸控面板中之加飾薄膜、液晶顯示裝置中之偏向薄膜、相位差薄膜、光擴散薄膜、光控制薄膜、防眩性薄膜、光觸媒性薄膜、紫外線遮蔽薄膜、隔熱性薄膜、抗靜電薄膜、導電性薄膜、半鏡面薄膜、硬塗層薄膜、裝飾薄膜、全息薄膜等之至少一者。 上述各種功能性薄膜係於表面或內部具備用以於PET薄膜、PEN薄膜、丙烯酸薄膜、聚碳酸酯薄膜、或TAC薄膜等之表面賦予各種功能(加飾性、光偏光性、光相位性、光擴散性、光控制性、防眩性、紫外線遮蔽、隔熱性、抗靜電性、導電性、半鏡面性、硬塗層性、裝飾性、全息性等)之功能層,該等可根據目的適當選擇。When the specific substrate is a functional film, its type is, for example, at least one of a decorative film in a touch panel, a deflection film in a liquid crystal display device, a phase difference film, a light diffusion film, a light control film, an anti-glare film, a photocatalytic film, an ultraviolet shielding film, a heat-insulating film, an antistatic film, a conductive film, a semi-mirror film, a hard coating film, a decorative film, a holographic film, etc. The above-mentioned various functional films have functional layers on the surface or inside for imparting various functions (decoration, light polarization, light phase, light diffusion, light control, anti-glare, UV shielding, heat insulation, anti-static, conductivity, semi-mirror, hard coating, decoration, holography, etc.) to the surface of PET film, PEN film, acrylic film, polycarbonate film, or TAC film, etc., and they can be appropriately selected according to the purpose.

作為特定基材之功能性薄膜厚度,係考慮用途或光透過率等而決定,但較好設為10~300μm之範圍的值。 其理由為功能性薄膜厚度若設為未達10μm之值,則有機械強度或耐久性顯著降低之情況之故。 另一方面,功能性薄膜厚度若設為超過300μm之值,則於觸控面板等中使用時,有感度降低,活性能量線之透過性顯著降低之情況之故。 因此功能性薄膜厚度較好設為20~250μm之範圍的值,更好設為30~200μm之範圍的值。The thickness of the functional film as a specific substrate is determined in consideration of the application and light transmittance, but is preferably set to a value in the range of 10 to 300 μm. The reason is that if the thickness of the functional film is set to a value less than 10 μm, the mechanical strength and durability may be significantly reduced. On the other hand, if the thickness of the functional film is set to a value exceeding 300 μm, when used in a touch panel, the sensitivity may be reduced and the transmittance of the active energy line may be significantly reduced. Therefore, the thickness of the functional film is preferably set to a value in the range of 20 to 250 μm, and more preferably to a value in the range of 30 to 200 μm.

特定基材為剝離薄膜時,作為其種類,舉例為具有剝離面之聚酯薄膜(PET薄膜等)、烯烴薄膜、丙烯酸薄膜、胺基甲酸酯薄膜、聚碳酸酯薄膜、TAC薄膜、氟薄膜、聚醯亞胺薄膜等之至少一者。 又,本說明書中所謂剝離面包含施以剝離處理之面及即使未施以剝離處理亦顯示剝離性之面的任一者。When the specific substrate is a release film, its type is, for example, at least one of a polyester film (PET film, etc.), an olefin film, an acrylic film, a urethane film, a polycarbonate film, a TAC film, a fluorine film, a polyimide film, etc. having a release surface. In addition, the release surface in this specification includes any one of a surface subjected to a release treatment and a surface showing release properties even without a release treatment.

作為特定基材之剝離薄膜厚度,係考慮用途或光透過率等而決定,但較好設為10~300μm之範圍的值。 其理由為剝離薄膜厚度若設為未達10μm之值,則有機械強度或耐久性顯著降低之情況之故。 另一方面,剝離薄膜厚度若設為超過300μm之值,則有難以捲繞為捲筒狀而處理變困難之情況之故。 因此剝離薄膜厚度較好設為20~250μm之範圍的值,更好設為30~200μm之範圍的值。The thickness of the release film as a specific substrate is determined in consideration of the application and light transmittance, but is preferably set to a value in the range of 10 to 300 μm. The reason is that if the thickness of the release film is set to a value less than 10 μm, the mechanical strength and durability may be significantly reduced. On the other hand, if the thickness of the release film is set to a value exceeding 300 μm, it may be difficult to wind it into a roll shape and handle it. Therefore, the thickness of the release film is preferably set to a value in the range of 20 to 250 μm, and more preferably set to a value in the range of 30 to 200 μm.

作為特定基材(功能性薄膜或剝離薄膜等)之光學特性,較好具有作為觸控面板或液晶顯示裝置等用途之適當透明性。 亦即,作為樹脂板之可見光透過率的下限,較好設為60%以上之值,更好設為75%以上之值,又更好設為85%以上之值。 又,樹脂板之可見光透過率的上限,較好設為100%以下,更好設為99.9%以下之值,又更好設為99%以下之值,再更好設為98%以下之值。As the optical property of a specific substrate (functional film or release film, etc.), it is preferred to have appropriate transparency for use as a touch panel or liquid crystal display device. That is, as the lower limit of the visible light transmittance of the resin plate, it is preferably set to a value of 60% or more, more preferably to a value of 75% or more, and more preferably to a value of 85% or more. In addition, the upper limit of the visible light transmittance of the resin plate is preferably set to a value of 100% or less, more preferably to a value of 99.9% or less, more preferably to a value of 99% or less, and more preferably to a value of 98% or less.

4.機械加工性提升層之諸特性 (1)活性能量線照射前之儲存彈性模數(M1) 本實施形態之該機械加工性提升層較好活性能量線照射前之儲存彈性模數(M1)設為0.01~1MPa之範圍內之值。 其理由為藉由將該儲存彈性模數(M1)控制於特定範圍,可使活性能量線照射前之機械加工性提升層的柔軟性成為適度者,可使對樹脂板的貼合性成為良好者之故。 因此,活性能量線照射前之儲存彈性模數(M1)較好設為0.04~0.20MPa之範圍內之值,進而基於活性能量線照射後之耐久性與切削性容易兼具,更好設為0.07~0.08MPa之範圍內之值。 又,於未特別指明之情況下,本說明書中,意指相當於溫度25℃之儲存彈性模數(M1、M2)者(以下亦相同)。4. Properties of the machinability enhancing layer (1) Storage elastic modulus (M1) before active energy ray irradiation The machinability enhancing layer of this embodiment preferably has a storage elastic modulus (M1) before active energy ray irradiation within a range of 0.01 to 1 MPa. The reason is that by controlling the storage elastic modulus (M1) within a specific range, the flexibility of the machinability enhancing layer before active energy ray irradiation can be made appropriate, and the adhesion to the resin board can be made good. Therefore, the storage elastic modulus (M1) before active energy ray irradiation is preferably set to a value within the range of 0.04 to 0.20 MPa, and further, based on the ease of achieving both durability and machinability after active energy ray irradiation, it is more preferably set to a value within the range of 0.07 to 0.08 MPa. In addition, unless otherwise specified, in this specification, it means the storage elastic modulus (M1, M2) equivalent to a temperature of 25°C (the same applies hereinafter).

(2)活性能量線照射後之儲存彈性模數(M2) 本實施形態之該機械加工性提升層之特徵為活性能量線照射後之儲存彈性模數(M2)設為0.20MPa以上之值。 其理由為藉由將該儲存彈性模數(M2)控制於0.20MPa以上之值,於將機械加工性提升薄膜貼附於樹脂板之狀態下使用切削裝置進行切削時,可抑制源自機械加工性提升層之缺損、滲出之發生,而獲得良好切削性之故。 因此,該儲存彈性模數(M2)之下限較好設為0.22MPa以上之值,更好設為0.25MPa以上之值,又更好設為0.30 MPa以上之值。 另一方面,上述儲存彈性模數(M2)過度變大時,有耐久性降低之情況。 因此,該儲存彈性模數(M2)之上限較好設為5MPa以下之值,更好設為2MPa以下之值,特佳設為1MPa以下之值,又更好設為0.6MPa以下之值。(2) Storage elastic modulus (M2) after active energy ray irradiation The characteristic of the machinability enhancing layer of this embodiment is that the storage elastic modulus (M2) after active energy ray irradiation is set to a value of 0.20 MPa or more. The reason is that by controlling the storage elastic modulus (M2) to a value of 0.20 MPa or more, when the machinability enhancing film is attached to the resin plate and cut using a cutting device, the occurrence of defects and seepage from the machinability enhancing layer can be suppressed, thereby obtaining good cutting performance. Therefore, the lower limit of the storage elastic modulus (M2) is preferably set to a value of 0.22 MPa or more, more preferably set to a value of 0.25 MPa or more, and more preferably set to a value of 0.30 MPa or more. On the other hand, when the storage elastic modulus (M2) becomes excessively large, durability may be reduced. Therefore, the upper limit of the storage elastic modulus (M2) is preferably set to a value below 5MPa, more preferably to a value below 2MPa, particularly preferably to a value below 1MPa, and even more preferably to a value below 0.6MPa.

此處,參考圖2,說明活性能量線照射後之機械加工性提升層的儲存彈性模數(M2)與切削性之關係。 圖2係基於根據後述實施例及比較例之評價結果,於橫軸採用活性能量線照射後之機械加工性提升層的儲存彈性模數(M2)(MPa)之值,於縱軸採取切削性評價(相對值)之值。 又,切削性評價(相對值)之值,於後述實施例及比較例之切削性評價中,將◎設為5分,○設為3分、△設為1分、×設為0分而算出之相對數值。 由圖2可了解該儲存彈性模數(M2)之值未達0.2MPa時,切削性評價(相對值)的值為0分,但若為0.20MPa以上,則切削性評價(相對值)的值有變大之傾向。 而且,可了解該儲存彈性模數(M2)之值若落於0.25~0.3MPa左右,則切削性評價(相對值)的值會變更大成為3~5分左右,進而於0.3MPa以上時,切削性評價(相對值)的值成為最高的5分。 因此,由圖2可理解,藉由將活性能量線照射後之儲存彈性模數(M2)之值設為較小的0.2MPa以上,可獲得比較良好的切削性,進而該值變越大,切削性越良好。Here, referring to FIG. 2, the relationship between the storage elastic modulus (M2) and machinability of the machinability improvement layer after active energy ray irradiation is described. FIG. 2 is based on the evaluation results of the embodiment and comparative example described later, with the value of the storage elastic modulus (M2) (MPa) of the machinability improvement layer after active energy ray irradiation on the horizontal axis and the value of the machinability evaluation (relative value) on the vertical axis. In addition, the value of the machinability evaluation (relative value) is a relative value calculated by setting ◎ to 5 points, ○ to 3 points, △ to 1 point, and × to 0 points in the machinability evaluation of the embodiment and comparative example described later. As can be seen from FIG. 2, when the value of the storage elastic modulus (M2) is less than 0.2MPa, the value of the machinability evaluation (relative value) is 0 points, but when it is 0.20MPa or more, the value of the machinability evaluation (relative value) tends to increase. Furthermore, it can be seen that when the value of the storage elastic modulus (M2) falls between 0.25 and 0.3MPa, the value of the machinability evaluation (relative value) increases to about 3 to 5 points, and when it is above 0.3MPa, the value of the machinability evaluation (relative value) becomes the highest 5 points. Therefore, it can be seen from FIG. 2 that by setting the value of the storage elastic modulus (M2) after active energy ray irradiation to a relatively small value of 0.2MPa or more, relatively good machinability can be obtained, and the larger the value, the better the machinability.

(3)儲存彈性模數之增加率(M2/M1×100) 本實施形態之該機械加工性提升層之活性能量線照射後之儲存彈性模數(M2)相對於活性能量線照射前之儲存彈性模數(M1)的增加率(M2/M1×100)通常較好設為320~30000%的範圍內之值。 其理由為藉由將前述儲存彈性模數之增加率(%)控制於特定範圍內之值,容易使活性能量線照射前之對樹脂板的貼合性與活性能量線照射前後之耐久性及切削性兼備之故。 因此,儲存彈性模數的增加率更好設為350~10000%的範圍內之值,又更好設為380~1000%的範圍內之值。(3) Increase rate of storage elastic modulus (M2/M1×100) The increase rate (M2/M1×100) of the storage elastic modulus (M2) of the machinability enhancement layer of this embodiment after active energy ray irradiation relative to the storage elastic modulus (M1) before active energy ray irradiation is usually preferably set to a value within the range of 320 to 30000%. The reason is that by controlling the increase rate (%) of the aforementioned storage elastic modulus to a value within a specific range, it is easy to achieve both adhesion to the resin board before active energy ray irradiation and durability and machinability before and after active energy ray irradiation. Therefore, the increase rate of the storage elastic modulus is more preferably set to a value within the range of 350 to 10000%, and more preferably set to a value within the range of 380 to 1000%.

(4)活性能量線照射前之凝膠分率(G1) 本實施形態之該機械加工性提升層之活性能量線照射前之凝膠分率(G1)通常較好設為40~78%之範圍內之值。 其理由為藉由將該凝膠分率(G1)控制於特定範圍內之值,可使對樹脂板之貼合性良好之故。 更具體而言,該凝膠分率(G1)未達40%時,因機械加工性提升層之凝集力不足,而有機械加工性提升薄膜之處理性變差之情況。 另一方面,上述凝膠分率(G1)為超過78%之值時,機械加工性提升層過於硬化,而使對樹脂板之貼合性惡化,伴隨此有耐久性惡化之情況。 因此,該凝膠分率(G1)更好設為50~76%之範圍內之值,又更好設為60~72%之範圍內之值。 又,該凝膠分率(G1)之測定方法於後述實施例中詳細說明。(4) Gel fraction (G1) before active energy ray irradiation The gel fraction (G1) of the machinability enhancing layer of this embodiment before active energy ray irradiation is usually preferably set to a value within the range of 40 to 78%. The reason is that by controlling the gel fraction (G1) within a specific range, the adhesion to the resin board can be improved. More specifically, when the gel fraction (G1) is less than 40%, the cohesion of the machinability enhancing layer is insufficient, and the handling property of the machinability enhancing film may deteriorate. On the other hand, when the gel fraction (G1) is a value exceeding 78%, the machinability enhancement layer is over-hardened, and the adhesion to the resin board is deteriorated, and the durability is deteriorated. Therefore, the gel fraction (G1) is preferably set to a value within the range of 50 to 76%, and more preferably set to a value within the range of 60 to 72%. In addition, the method for determining the gel fraction (G1) is described in detail in the following embodiments.

(5)活性能量線照射後之凝膠分率(G2) 本實施形態之該機械加工性提升層之活性能量線照射後之凝膠分率(G2)較好設為60%以上之值。 其理由為將該凝膠分率(G2)控制於未達60%之值時,有切削性顯著降低,發生黏著劑殘留之情況之故。 因此,該凝膠分率(G2)之下限更好設為70%以上之值,特佳設為75%以上之值,又更好設為77%以上之值。 又,該凝膠分率(G2)之上限值並未特別限制,可為100%,但基於切削性與耐久性兼具之觀點,較好為95%以下,特佳為90%以下。 又,該凝膠分率(G2)之測定方法於後述實施例中詳細說明。(5) Gel fraction (G2) after active energy ray irradiation The gel fraction (G2) of the machinability-enhancing layer of the present embodiment after active energy ray irradiation is preferably set to a value of 60% or more. The reason is that when the gel fraction (G2) is controlled to a value below 60%, the machinability is significantly reduced and adhesive residues may occur. Therefore, the lower limit of the gel fraction (G2) is preferably set to a value of 70% or more, particularly preferably to a value of 75% or more, and even more preferably to a value of 77% or more. In addition, the upper limit of the gel fraction (G2) is not particularly limited and may be 100%, but from the viewpoint of both machinability and durability, it is preferably 95% or less, particularly preferably 90% or less. In addition, the method for measuring the gel fraction (G2) is described in detail in the examples described later.

(6)凝膠分率之增加率(G2/G1×100) 本實施形態之該機械加工性提升層之活性能量線照射後之凝膠分率(G2)相對於活性能量線照射前之凝膠分率(G1)之增加率(=G2/G1×100)通常較好設為110~250%之範圍內之值。 其理由係藉由將該凝膠分率之增加率控制在特定範圍內之值,可使活性能量線照射前之對樹脂板的貼合性成為較佳者,並且活性能量線照射後容易兼具耐久性及切削性之故。 更具體而言,該凝膠分率之增加率若為未達110%之值,則有切削性降低,發生機械加工性提升層之缺損,耐久性降低之情況。 另一方面,該凝膠分率之增加率若為超過250%之值,則有機械加工性提升層變脆而歸列之情況。 因此,該凝膠分率之增加率更好設為114~200%之範圍內之值,又更好設為120~160%之範圍內之值,特佳設為128~140%之範圍內之值。(6) Increase rate of gel fraction (G2/G1×100) The increase rate of the gel fraction (G2) of the machinability enhancement layer after active energy ray irradiation relative to the gel fraction (G1) before active energy ray irradiation (=G2/G1×100) of the present embodiment is usually preferably set to a value within the range of 110 to 250%. The reason is that by controlling the increase rate of the gel fraction within a specific range, the adhesion to the resin board before active energy ray irradiation can be made better, and it is easy to have both durability and machinability after active energy ray irradiation. More specifically, if the increase rate of the gel fraction is a value less than 110%, the machinability is reduced, the machinability enhancement layer is damaged, and the durability is reduced. On the other hand, if the increase rate of the gel fraction exceeds 250%, the machinability-enhanced layer may become brittle and classified. Therefore, the increase rate of the gel fraction is preferably set to a value within the range of 114 to 200%, more preferably within the range of 120 to 160%, and particularly preferably within the range of 128 to 140%.

(7)活性能量線照射前之黏著力(P1) 本實施形態之該機械加工性提升層之活性能量線照射前之黏著力(P1)較好設為1~60N/25mm之範圍內之值。 其理由為藉由將該黏著力(P1)控制於特定範圍內之值,而對於樹脂板之密著性變良好之故。 該黏著力(P1)若未達1N/25mm,首先,對樹脂板之貼合變困難,即使考貼合亦有機械加工性提升層自樹脂板剝離而容易產生不良之情況。 另一方面,該黏著力(P1)若超過60N/25mm之值之情況,有處理性變差之情況。 因此,該黏著力(P1)更好設為8~40N/25mm之範圍內之值,又更好設為15~30N/25mm之值。 又,該黏著力(P1)可於活性能量線照射前根據JIS Z0237:2009藉由180度剝除法測定,但更具體之測定方法如後述實施例所示。(7) Adhesion before active energy ray irradiation (P1) The adhesion (P1) of the machinability enhancement layer of this embodiment before active energy ray irradiation is preferably set to a value within the range of 1 to 60 N/25 mm. The reason is that by controlling the adhesion (P1) within a specific range, the adhesion to the resin board becomes better. If the adhesion (P1) is less than 1 N/25 mm, first, it becomes difficult to bond to the resin board, and even if bonding is attempted, the machinability enhancement layer may peel off from the resin board and easily cause defects. On the other hand, if the adhesion (P1) exceeds 60 N/25 mm, the handling property may deteriorate. Therefore, the adhesive force (P1) is preferably set to a value within the range of 8 to 40 N/25 mm, and more preferably set to a value of 15 to 30 N/25 mm. In addition, the adhesive force (P1) can be measured by the 180-degree peeling method according to JIS Z0237:2009 before active energy ray irradiation, but a more specific measurement method is shown in the following embodiment.

(8)活性能量線照射後之黏著力(P2) 本實施形態之該機械加工性提升層之特徵係活性能量線照射後之黏著力(P2)設為10N/25mm以上之值。 其理由為藉由將該黏著力(P2)控制於10N/25mm以上之值,而成為密著性良好者,並發揮優異之耐久性之故。 因此,該黏著力(P2)之下限值較好設為15N/25mm以上之值,更好設為20N/25mm以上之值,又更好設為24N/25mm以上之值。 另一方面,該黏著力(P2)之上限值較好設為200N/25mm以下之值,更好設為120N/25mm以下之值,又更好設為60N/25mm以下之值,特佳設為40N/25mm以下之值。 又,關於該黏著力(P2)可於活性能量線照射後,根據JIS Z0237:2009藉由180度剝除法測定,但更具體之測定方法如後述實施例所示。(8) Adhesion after active energy ray irradiation (P2) The characteristic of the machinability-enhancing layer of this embodiment is that the adhesion (P2) after active energy ray irradiation is set to a value of 10N/25mm or more. The reason is that by controlling the adhesion (P2) to a value of 10N/25mm or more, the adhesion is good and excellent durability is exhibited. Therefore, the lower limit of the adhesion (P2) is preferably set to a value of 15N/25mm or more, more preferably to a value of 20N/25mm or more, and more preferably to a value of 24N/25mm or more. On the other hand, the upper limit of the adhesive force (P2) is preferably set to a value below 200N/25mm, more preferably set to a value below 120N/25mm, more preferably set to a value below 60N/25mm, and particularly preferably set to a value below 40N/25mm. In addition, the adhesive force (P2) can be measured by the 180-degree peeling method according to JIS Z0237:2009 after irradiation with active energy rays, but a more specific measurement method is shown in the following embodiment.

(9)黏著力之增加率(P2/P1×100) 本實施形態之該機械加工性提升層之活性能量線照射後之黏著力(P2)相對於活性能量線照射前之黏著力(P1)之增加率(=P2/P1×100)較好設為80~300%之值。 其理由係藉由將該黏著力之增加率控制在特定範圍內之值,可使活性能量線照射前之對樹脂板的貼合性成與活性能量線照射後之耐久性更容易兼具之故。 因此,該黏著力(P2)之增加率更好設為100~200%之範圍內之值,更好設為120~140%之範圍內之值。(9) Increase rate of adhesive force (P2/P1×100) The increase rate of the adhesive force (P2) of the machinability enhancement layer of this embodiment after active energy ray irradiation relative to the adhesive force (P1) before active energy ray irradiation (=P2/P1×100) is preferably set to a value of 80 to 300%. The reason is that by controlling the increase rate of the adhesive force within a specific range, it is easier to achieve both the adhesion to the resin board before active energy ray irradiation and the durability after active energy ray irradiation. Therefore, the increase rate of the adhesive force (P2) is preferably set to a value within the range of 100 to 200%, and more preferably to a value within the range of 120 to 140%.

(10)最大應力(S2) 本實施形態之該機械加工性提升層於測定活性能量線照射後之拉伸應力時之最大應力(S2)通常較好設為1.5N/mm2 以上之值。 其理由為藉由將該最大應力(S2)設為1.5N/mm2 以上之值,有機械加工時抑制機械加工性提升層之缺損的傾向,且切削性變良好之故。 因此,該最大應力(S2)更好設為2.0N/mm2 以上之值,基於與耐久性並具之觀點,更好設為2.5N/mm2 以上之值。 另一方面,該最大應力(S2)之上限值並未特別限定,但基於兼具耐久性與切削性之觀點,較好設為20N/mm2 以下之值,更好設為10N/mm2 以下之值,特佳設為4N/mm2 以下之值。(10) Maximum stress (S2) The maximum stress (S2) of the machinability-enhancing layer of this embodiment when measuring the tensile stress after active energy ray irradiation is usually preferably set to a value of 1.5 N/mm 2 or more. The reason is that by setting the maximum stress (S2) to a value of 1.5 N/mm 2 or more, there is a tendency to suppress the damage of the machinability-enhancing layer during machining, and the machinability becomes good. Therefore, the maximum stress (S2) is more preferably set to a value of 2.0 N/mm 2 or more, and from the viewpoint of durability, it is more preferably set to a value of 2.5 N/mm 2 or more. On the other hand, the upper limit of the maximum stress (S2) is not particularly limited, but based on the viewpoint of both durability and machinability, it is preferably set to a value below 20N/ mm2 , more preferably to a value below 10N/mm2, and particularly preferably to a value below 4N/ mm2 .

(11) 100%伸長時應力(E2) 本實施形態之該機械加工性提升層於活性能量線照射後之100%伸長時之應力(E2)通常較好設為10N/mm2 以下之值。 其理由為藉由將該100%伸長時之應力(E2)設為10N/mm2 以下之值,有機械加工時之機械加工性提升層難以伸長之傾向,可獲得切削後機械加工性提升層不滲出之切削面,進而成為切削性良好者之故。 因此,該100%伸長時應力(E2)之上限值更好設為6N/mm2 以下之值,基於與耐久性並具之觀點,更好設為1N/mm2 以下之值。 另一方面,該100%伸長時應力(E2)之下限值並未特別限定,但基於兼具耐久性與切削性之觀點,較好設為0.1N/mm2 以上之值,更好設為0.4N/mm2 以上之值,特佳設為0.7N/mm2 以上之值。(11) Stress at 100% elongation (E2) The stress at 100% elongation (E2) of the machinability-enhancing layer of this embodiment after irradiation with active energy rays is usually preferably set to a value of 10N/ mm2 or less. The reason is that by setting the stress at 100% elongation (E2) to a value of 10N/mm2 or less, the machinability-enhancing layer tends to be difficult to elongate during machining, and a cutting surface in which the machinability-enhancing layer does not ooze out after cutting can be obtained, thereby achieving good machinability. Therefore, the upper limit value of the stress at 100% elongation (E2) is preferably set to a value of 6N/mm2 or less , and from the viewpoint of durability, it is more preferably set to a value of 1N/mm2 or less . On the other hand, the lower limit of the stress at 100% elongation (E2) is not particularly limited, but from the perspective of both durability and machinability, it is preferably set to a value of 0.1 N/mm 2 or more, more preferably set to a value of 0.4 N/mm 2 or more, and particularly preferably set to a value of 0.7 N/mm 2 or more.

5.積層體 使用本實施形態之該機械加工性提升薄膜的積層體,若係由如圖1(a)等所示之積層機械加工性薄膜18而成之樹脂板12所構成的積層體,則並未特別限制。 因此,各種機器中使用之各種功能性薄膜透過機械加工性提升層與樹脂板一起進行精度良好地機械加工處理(切削處理),可容易製造為附樹脂板之功能性薄膜等之積層體。 以下,具體說明該積層體。5. Laminated body The laminated body using the machinability-enhanced film of the present embodiment is not particularly limited as long as it is a laminated body composed of a resin plate 12 formed by laminating a machinability-enhanced film 18 as shown in FIG. 1(a) and the like. Therefore, various functional films used in various machines can be easily manufactured into laminated bodies such as functional films attached to resin plates by machining (cutting) the machinability-enhanced layer and the resin plate with good precision. The laminated body is described in detail below.

(1)活性能量線硬化前之積層體 活性能量線硬化前之積層體係如圖1(a)、圖3(c)、圖4(d)、圖5(d)等所示,將作為特定基材16之功能性薄膜與機械加工性提升薄膜18與樹脂板12依序積層而成之積層體10。 又,關於圖3~5之內容,作為後述之機械加工性提升薄膜的使用方法具體說明。(1) Laminated body before active energy ray curing The laminated body before active energy ray curing is a laminated body 10 formed by laminating a functional film as a specific substrate 16, a machinability-enhancing film 18, and a resin plate 12 in sequence, as shown in FIG. 1(a), FIG. 3(c), FIG. 4(d), and FIG. 5(d). In addition, the contents of FIG. 3 to FIG. 5 are used as a specific explanation of the method of using the machinability-enhancing film described later.

(2)活性能量線照射硬化後之積層體 活性能量線硬化後之積層體係藉由自前述活性能量線硬化前之積層體的特定基材16或樹脂板12側照射活性能量線,可使機械加工性提升層14變成硬化後之機械加工性提升層14’。 亦即,係如圖3(d)及圖3(e)、圖4(e)及圖4(f)、圖5(e)及圖5(f)所示,將作為特定基材16之功能性薄膜與硬化後之機械加工性提升層14’與樹脂板12依序積層而成之積層體10’。(2) Laminated body after active energy ray irradiation and curing The laminated body after active energy ray curing is formed by irradiating the laminated body before active energy ray curing with active energy ray from the specific substrate 16 or the resin plate 12 side, so that the machinability enhancing layer 14 is changed into the machinability enhancing layer 14' after curing. That is, as shown in Figs. 3(d) and 3(e), Figs. 4(e) and 4(f), and Figs. 5(e) and 5(f), the functional film as the specific substrate 16, the machinability enhancing layer 14' after curing, and the resin plate 12 are sequentially laminated to form a laminated body 10'.

硬化後之機械加工性提升層14’係上述機械加工性提升薄膜18所具有之機械加工性提升層14藉由活性能量線照射而硬化者。 本實施形態中,該硬化後之機械加工性提升層14’係由具有由作為主劑(A)之(甲基)丙烯酸酯共聚物與熱硬化性成分(B)所構成之交聯構造,並且含有使活性能量線硬化成分(C)聚合並硬化之構造(聚合構造)之黏著劑所成。 該聚合構造推定為對由作為主劑(A)之(甲基)丙烯酸酯共聚物與熱硬化性成分(B)所構成之交聯構造進行纏繞者。 藉由具有複數三維構造纏繞之構造,硬化後之機械加工性提升層14’成為具有高的凝集力者,成為容易滿足期望之黏著力及儲存彈性率之值者。 因此,硬化後之機械加工性提升層14’發揮優異之切削性,並且成為耐久性亦優異者。The cured machinability enhancing layer 14' is the machinability enhancing layer 14 of the machinability enhancing film 18 that is cured by irradiation with active energy rays. In the present embodiment, the cured machinability enhancing layer 14' is formed by an adhesive having a crosslinked structure composed of a (meth)acrylate copolymer as a main agent (A) and a thermosetting component (B), and containing a structure (polymerized structure) that polymerizes and cures the active energy ray curing component (C). The polymerized structure is presumed to be a structure that entangles the crosslinked structure composed of a (meth)acrylate copolymer as a main agent (A) and a thermosetting component (B). By having a structure in which multiple three-dimensional structures are intertwined, the machinability-enhancing layer 14' after hardening becomes one with high cohesion, and becomes one that easily satisfies the desired values of adhesion and storage elasticity. Therefore, the machinability-enhancing layer 14' after hardening exhibits excellent cutting performance and also becomes one with excellent durability.

又,只要可獲得本發明之效果,則硬化後之機械加工性提升層14’中亦可包含即使照射活性能量線亦不開裂之光聚合起始劑(D)。 本實施形態中,硬化後之機械加工性提升層14’中,光聚合起始劑之殘餘量較好為0.1質量%以下,更好為0.01質量%以下。Furthermore, as long as the effect of the present invention can be obtained, the cured machinability enhancing layer 14' may also contain a photopolymerization initiator (D) that does not crack even when irradiated with active energy rays. In this embodiment, the residual amount of the photopolymerization initiator in the cured machinability enhancing layer 14' is preferably 0.1% by mass or less, and more preferably 0.01% by mass or less.

6.使用方法 作為機械加工性提升薄膜18之使用方法,係如圖3(a)~(e)所示,較好包含下述步驟(1)~(4)。 (1)於作為特定基材16之功能性薄膜表面,塗佈包含活性能量線硬化性成分之組成物(源自用以形成機械加工性提升層之組成物的樹脂層13),藉由加熱處理,作成具備活性能量線硬化性之機械加工性提升層14的機械加工性提升薄膜18之步驟, (2)將所得機械加工性提升薄膜18貼附於樹脂板12之步驟, (3)自樹脂板12或特定基材16側照射活性能量線,使機械加工性提升層14中之活性能量線硬化性成分硬化,作成硬化後之機械加工性提升層14’之步驟, (4)對包含硬化後之機械加工性提升層14’及樹脂板12的積層體10’,實施特定之機械加工處理之步驟。 以下,參考適當圖式,具體說明機械加工性提升薄膜18之使用方法。6. Method of use The method of using the machinability enhancing film 18 is as shown in Fig. 3(a) to (e), and preferably includes the following steps (1) to (4). (1) A composition containing an active energy ray-hardening component (derived from a resin layer 13 of a composition for forming a machinability enhancing layer) is applied to the surface of a functional film as a specific substrate 16, and a machinability enhancing film 18 having a machinability enhancing layer 14 having active energy ray hardening properties is prepared by heat treatment. (2) The obtained machinability enhancing film 18 is attached to The step of: (1) irradiating the resin plate 12 with active energy rays from the side of the resin plate 12 or the specific substrate 16 to harden the active energy ray-hardening component in the machinability enhancing layer 14 to form a hardened machinability enhancing layer 14'; (2) performing a specific machining treatment on the laminate 10' including the hardened machinability enhancing layer 14' and the resin plate 12. The following describes the method of using the machinability enhancing film 18 in detail with reference to appropriate figures.

6-1:步驟(1)-1 步驟(1)-1係用以形成機械加工性提升層之組成物的準備步驟。 因此,圖3(a)所示之源自用以形成機械加工性提升層之組成物的樹脂層13係由包含以作為主劑(A)之(甲基)丙烯酸酯共聚物、熱硬化性成分(B)與活性能量線硬化性成分(C)作為主成分的組成物所構成。 該組成物可根據需要包含光聚合起始劑(D)、矽烷偶合劑(E)及有機溶劑等,藉由將該等均一混合,可獲得用以成為上述樹脂層13之塗佈液。6-1: Step (1)-1 Step (1)-1 is a step of preparing a composition for forming a machinability-enhancing layer. Therefore, the resin layer 13 derived from the composition for forming a machinability-enhancing layer shown in FIG. 3(a) is composed of a composition including a (meth)acrylate copolymer as a main agent (A), a thermosetting component (B), and an active energy ray-curing component (C) as main components. The composition may include a photopolymerization initiator (D), a silane coupling agent (E), and an organic solvent as required, and by uniformly mixing these, a coating liquid for forming the above-mentioned resin layer 13 can be obtained.

6-2:步驟(1)-2 步驟(1)-2係包含前述特定組成物之塗佈液的塗佈步驟。 因此,如圖3(a)所示,於特定基材16(功能性薄膜等)之表面塗佈前述組成物之塗佈液,獲得特定基材16與源自用以形成機械加工性提升層之組成物的樹脂層13積層而成之積層物。 作為塗佈塗佈液之方法並未特別限制,可以習知方法進行。 例如例示有棒塗佈法、刮刀塗佈法、輥塗佈法、刮板塗佈法、模嘴塗佈法、凹版塗佈法等。 接著,如圖3(b)所示,實施特定加熱處理(H),使主劑(A)所含之官能基與熱硬化性成分(B)進行熱交聯反應,成為活性能量線硬化性之機械加工性提升層14,獲得機械加工性提升薄膜18。 該加熱處理(H)亦可兼使前述組成物之塗佈液中所含之溶劑等飛散去除。 此時,具體而言,加熱處理(H)之加熱溫度較好為50~150℃,更好為70~120℃。 又,加熱時間較好為10秒~10分鐘,更好為50秒~2分鐘。 進而,加熱處理後,較好設有於常溫(例如23℃,50%RH)為1~2週左右之養生期間。 藉由此等加熱處理(及養生),透過熱硬化性成分(B)使(甲基)丙烯酸酯共聚物良好交聯,形成交聯構造。 亦即,經過此等步驟,獲得使源自用以形成機械加工性提升層之組成物的樹脂層13熱交聯而成之機械加工性提升層14,成為機械加工性提升薄膜18。 又,用以形成機械加工性提升層之組成物中含有之其他成分(活性能量線硬化性成分(C)、光聚合起始劑(D)、矽烷偶合劑(E)等)於熱交聯前後之含量及性質等並未變化。6-2: Step (1)-2 Step (1)-2 is a step of applying the coating liquid of the aforementioned specific composition. Therefore, as shown in FIG. 3(a), the coating liquid of the aforementioned composition is applied to the surface of a specific substrate 16 (functional film, etc.), and a laminated product is obtained in which the specific substrate 16 and the resin layer 13 derived from the composition for forming the machinability-enhancing layer are laminated. The method for applying the coating liquid is not particularly limited, and it can be carried out by a known method. For example, rod coating, scraper coating, roller coating, blade coating, die nozzle coating, gravure coating, etc. are exemplified. Next, as shown in FIG. 3( b ), a specific heat treatment (H) is performed to allow the functional groups contained in the main agent (A) to undergo a thermal crosslinking reaction with the thermosetting component (B) to form an active energy ray-curable machinability-enhancing layer 14, thereby obtaining a machinability-enhancing film 18. The heat treatment (H) can also simultaneously remove the solvent contained in the coating liquid of the aforementioned composition. At this time, specifically, the heating temperature of the heat treatment (H) is preferably 50 to 150°C, more preferably 70 to 120°C. In addition, the heating time is preferably 10 seconds to 10 minutes, more preferably 50 seconds to 2 minutes. Furthermore, after the heat treatment, it is preferred to provide a curing period of about 1 to 2 weeks at room temperature (e.g., 23°C, 50%RH). By such heat treatment (and curing), the (meth)acrylate copolymer is well crosslinked through the heat-curable component (B) to form a crosslinked structure. That is, after these steps, the machinability-enhancing layer 14 is obtained by thermally crosslinking the resin layer 13 derived from the composition for forming the machinability-enhancing layer, and becomes the machinability-enhancing film 18. In addition, the content and properties of other components (active energy line curable component (C), photopolymerization initiator (D), silane coupling agent (E), etc.) contained in the composition for forming the machinability-enhancing layer do not change before and after the thermal crosslinking.

6-3:步驟(2) 其次,步驟(2)係機械加工性提升薄膜對樹脂板之積層步驟。 因此,如圖3(c)所示,使樹脂板12與機械加工性提升薄膜18之機械加工性提升層14貼合而積層。 如此之樹脂板12與機械加工性提升薄膜18之貼合可使用積層機等之習知貼合方法。 藉此,可獲得活性能量線硬化性之機械加工性提升層14被夾持於特定基材(功能性薄膜等)16與樹脂板12而成之積層體10。6-3: Step (2) Next, step (2) is a step of laminating the machinability enhancing film on the resin sheet. Therefore, as shown in FIG3(c), the resin sheet 12 and the machinability enhancing layer 14 of the machinability enhancing film 18 are laminated. The lamination of the resin sheet 12 and the machinability enhancing film 18 in this way can be performed using a known lamination method such as a lamination machine. Thereby, a laminate 10 is obtained in which the active energy ray-curable machinability enhancing layer 14 is sandwiched between a specific substrate (functional film, etc.) 16 and the resin sheet 12.

6-4:步驟(3) 其次,步驟(3)係活性能量線之照射步驟。 因此,如圖3(d)所示,自特定基材16之背面側照射紫外線等之活性能量線(L)。 藉此,使機械加工性提升層14中之活性能量線硬化性成分(C)硬化,形成硬化後之機械加工性提升層14’。 亦即,可獲得硬化後之機械加工性提升層14’ 被夾持於特定基材16(功能性薄膜等)與樹脂板12而成之積層體10’。 又,圖3(d)中,自樹脂板12之背面側照射活性能量線(L),或亦可自設置特定基材16(功能性薄膜等)側,亦即自與背面側相反側照射活性能量線(L),進而亦可自樹脂板12之背面側與特定基材16(功能性薄膜等)側之兩面照射活性能量線(L)。6-4: Step (3) Next, step (3) is an active energy ray irradiation step. Therefore, as shown in FIG. 3(d), active energy rays (L) such as ultraviolet rays are irradiated from the back side of the specific substrate 16. Thereby, the active energy ray-hardening component (C) in the machinability-enhancing layer 14 is hardened to form a hardened machinability-enhancing layer 14'. That is, a laminate 10' is obtained in which the hardened machinability-enhancing layer 14' is sandwiched between the specific substrate 16 (functional film, etc.) and the resin sheet 12. In addition, in Figure 3(d), the active energy ray (L) is irradiated from the back side of the resin plate 12, or it can also be irradiated from the side where a specific substrate 16 (functional film, etc.) is set, that is, the active energy ray (L) is irradiated from the side opposite to the back side, and further, the active energy ray (L) can also be irradiated from both the back side of the resin plate 12 and the specific substrate 16 (functional film, etc.) side.

此處,所謂活性能量線係指電磁波或帶電粒子束中具有能量者,具體舉例為紫外線、電子束等。 作為本實施形態之活性能量線,較好為包含具有200~450nm波長的光之活性能量線。 為了獲得滿足上述條件之活性能量線,只要使用例如高壓水銀燈、融合H燈、氙氣燈等之可照射紫外線之光源即可。 活性能量線之照射量較好為照度50~1000mW/cm2 之範圍內之值。 光量較好為50mJ/cm2 以上,更好為80mJ/cm2 以上,又更好為為200mJ/cm2 以上。 又,光量較好為10000mJ/cm2 以下,更好為5000 mJ/cm2 以下,又更好為為2000mJ/cm2 以下。Here, the so-called active energy ray refers to electromagnetic waves or charged particle beams that have energy, and specific examples include ultraviolet rays, electron beams, etc. As the active energy ray of this embodiment, it is preferably an active energy ray containing light with a wavelength of 200 to 450 nm. In order to obtain active energy rays that meet the above conditions, it is sufficient to use a light source that can irradiate ultraviolet rays, such as a high-pressure mercury lamp, a fusion H lamp, a xenon lamp, etc. The irradiation amount of the active energy ray is preferably a value within the range of an illumination of 50 to 1000 mW/ cm2 . The light amount is preferably 50 mJ/ cm2 or more, more preferably 80 mJ/ cm2 or more, and more preferably 200 mJ/ cm2 or more. Moreover, the amount of light is preferably 10000 mJ/cm2 or less , more preferably 5000 mJ/cm2 or less , and even more preferably 2000 mJ/cm2 or less.

6-5:步驟(4) 步驟(4)係機械加工處理步驟。 因此,如圖3(e)所示,對積層有機械加工性提升層14’之樹脂板12與特定基材16(功能性薄膜等)一起進行特定之機械加工處理(例如朝箭頭A所示方向之切削處理)。 因此,由於本實施形態之機械加工性提升薄膜具有優異之切削性,故藉由一次切削處理,可容易獲得具有特定形狀之積層體。 進而,由於切削處理中機械加工性提升層並無缺損或伸長,故加工後之切削面成為良好,所得積層體成為具有優異外觀品質者。 又,所得積層體由於耐久性優異,故亦可應用於在嚴苛環境下使用之光學零件(例如車載用之觸控面板或液晶顯示裝置等)。 因此,本實施形態之機械加工性提升薄膜藉由如上述般使用,可應用於觸控面板或液晶顯示裝置等之光學零件等,可簡便地製造透過機械加工性提升層之附功能性薄膜之樹脂板。6-5: Step (4) Step (4) is a machining step. Therefore, as shown in FIG3(e), the resin sheet 12 having the machinability-enhancing layer 14' laminated thereon is subjected to a specific machining process (e.g., a cutting process in the direction indicated by arrow A) together with a specific substrate 16 (functional film, etc.). Therefore, since the machinability-enhancing film of the present embodiment has excellent machinability, a laminate having a specific shape can be easily obtained by a single cutting process. Furthermore, since the machinability-enhancing layer is not damaged or elongated during the cutting process, the cut surface after machining becomes good, and the obtained laminate becomes one having excellent appearance quality. In addition, the obtained laminate can also be applied to optical parts used in harsh environments (such as touch panels or liquid crystal display devices for vehicles, etc.) due to its excellent durability. Therefore, the machinability-enhanced film of this embodiment can be applied to optical parts such as touch panels or liquid crystal display devices by using it as described above, and a resin plate with a functional film attached through the machinability-enhanced layer can be easily manufactured.

7.其他使用方法 7-1 變化例 圖4(a)~(f)中例示之步驟,係於前述步驟(1)中,使用特定基材16’(剝離薄膜等)時之步驟例。 因此,例如使用特定基材16’(剝離薄膜等)時,如圖4(a)~(f)所例示,藉由包含下述步驟(1’)~(4’),可較好地使用於對機械加工性提升薄膜18進行機械加工處理(切削處理)。7. Other methods of use 7-1 Variations The steps illustrated in FIG. 4(a) to (f) are examples of steps when a specific substrate 16' (peel-off film, etc.) is used in the aforementioned step (1). Therefore, for example, when a specific substrate 16' (peel-off film, etc.) is used, as illustrated in FIG. 4(a) to (f), by including the following steps (1') to (4'), it can be preferably used for machining (cutting) the machinability-enhancing film 18.

(1)步驟(1’) 步驟(1’)係熱處理步驟。 因此,如圖4(a)及圖4(b)所示,係於特定基材16’(剝離薄膜等)表面塗佈源自用以形成機械加工性提升層之組成物的樹脂層13,藉由實施熱處理(H),作成包含機械加工性提升層14之機械加工性提升薄膜18’的步驟。 此處,用以形成機械加工性提升層之組成物之準備步驟及塗佈步驟係依據前述步驟(1)-1及步驟(1)-2。 又,雖未圖示,但圖4(b)中,亦可於機械加工性提升層14之一面設置特定基材16’(剝離薄膜等)。 藉由成為此等構成,直至使用前之間,可減低機械加工性提升層14受汙染之風險。(1) Step (1') Step (1') is a heat treatment step. Therefore, as shown in FIG. 4(a) and FIG. 4(b), a resin layer 13 derived from a composition for forming a machinability-enhancing layer is applied to the surface of a specific substrate 16' (peel-off film, etc.), and a machinability-enhancing film 18' including a machinability-enhancing layer 14 is prepared by heat treatment (H). Here, the preparation step and the coating step of the composition for forming a machinability-enhancing layer are based on the aforementioned step (1)-1 and step (1)-2. In addition, although not shown, in FIG. 4(b), a specific substrate 16' (peel-off film, etc.) can also be provided on one surface of the machinability enhancement layer 14. By adopting such a configuration, the risk of contamination of the machinability enhancement layer 14 can be reduced until use.

(2)步驟(2’) 其次,步驟(2’)係機械加工性提升薄膜對樹脂板之積層步驟。 亦即,如圖4(c)及圖4(d)所示,使機械加工性提升薄膜18’之機械加工性提升層14之露出面與特定基材16’(剝離薄膜等)貼合而積層。 接著,剝離特定基材16’(剝離薄膜等),積層樹脂板12。 藉此,可獲得活性能量線硬化性之機械加工性提升層14被夾持於特定基材16(功能性薄膜等)與樹脂板12而成之積層體10。(2) Step (2') Next, step (2') is a step of laminating the machinability enhancing film on the resin sheet. That is, as shown in Fig. 4(c) and Fig. 4(d), the exposed surface of the machinability enhancing layer 14 of the machinability enhancing film 18' is laminated to the specific substrate 16' (peel-off film, etc.). Then, the specific substrate 16' (peel-off film, etc.) is peeled off and the resin sheet 12 is laminated. Thus, a laminated body 10 is obtained in which the active energy ray-curable machinability enhancing layer 14 is sandwiched between the specific substrate 16 (functional film, etc.) and the resin sheet 12.

(3):步驟(3’) 其次,步驟(3’)係活性能量線之照射步驟。 因此,如圖4(e)所示,照射活性能量線(L),使機械加工性提升層14所含之活性能量線硬化性成分(C)硬化,成為機械加工性提升層14’。亦即,可獲得硬化後之機械加工性提升層14’被夾持於特定基材16(功能性薄膜等)與樹脂板12而成之積層體10’。 又,活性能量線之照射條件等係依據前述步驟(3)。(3): Step (3') Next, step (3') is an active energy ray irradiation step. Therefore, as shown in FIG4(e), the active energy ray (L) is irradiated to harden the active energy ray hardening component (C) contained in the machinability enhancing layer 14 to form the machinability enhancing layer 14'. That is, a laminate 10' is obtained in which the hardened machinability enhancing layer 14' is clamped between a specific substrate 16 (functional film, etc.) and a resin sheet 12. In addition, the irradiation conditions of the active energy ray are based on the aforementioned step (3).

(4):步驟(4’) 步驟(4’)係機械加工處理步驟。 因此,如圖4(f)所示,對積層有機械加工性提升層14’之樹脂板12與特定基材16(功能性薄膜等)一起進行特定之機械加工處理(例如朝箭頭A所示方向之切削處理)。 而且,上述步驟(1’)~(4’)中,亦與前述步驟(1)~(4)同樣,可較好地使用本實施形態之機械加工性提升薄膜。 因此,於該變化例1,亦可應用於觸控面板或液晶顯示裝置等之光學零件等,可簡便地製造透過機械加工性提升層之附功能性薄膜之樹脂板。(4): Step (4') Step (4') is a machining step. Therefore, as shown in FIG. 4(f), the resin sheet 12 having the machinability enhancing layer 14' laminated thereon is subjected to a specific machining process (e.g., cutting process in the direction indicated by arrow A) together with a specific substrate 16 (functional film, etc.). In addition, in the above steps (1') to (4'), the machinability enhancing film of the present embodiment can be preferably used as in the above steps (1) to (4). Therefore, in this variation 1, it can also be applied to optical parts such as touch panels or liquid crystal display devices, and a resin sheet with a functional film attached thereto through a machinability enhancing layer can be easily manufactured.

7-2 變化例2 圖5(a)~(f)中例示之步驟係前述之變化例1的步驟(2’)中,機械加工性提升薄膜18’的貼合順序不同的情況之步驟例。 亦即,如圖5(c)所示,將圖5(b)所示之機械加工性提升薄膜18’之機械加工性提升層14的一面與樹脂板12貼合並積層。 接著,如圖5(d)所示,係剝離特定基材16’(剝離薄膜等),積層特定基材16(功能性薄膜)之步驟。又,上述步驟(2’)以外,係依據前述變化例1。 因此,於該變化例2,亦與上述步驟(1)~(4)及前述步驟(1’)~(4’)同樣,可較好地使用本實施形態之機械加工性提升薄膜。 藉此,前述步驟(1’)~(4’)中,亦可應用於觸控面板或液晶顯示裝置等之光學零件等,可簡便地製造透過機械加工性提升層之附功能性薄膜之樹脂板。 [實施例]7-2 Variation 2 The steps illustrated in FIG. 5(a) to (f) are steps in which the bonding order of the machinability enhancement film 18' is different from that of step (2') of variation 1 described above. That is, as shown in FIG. 5(c), one side of the machinability enhancement layer 14 of the machinability enhancement film 18' shown in FIG. 5(b) is bonded to the resin sheet 12 and laminated. Next, as shown in FIG. 5(d), the specific substrate 16' (peel-off film, etc.) is peeled off and the specific substrate 16 (functional film) is laminated. In addition, except for the above step (2'), the above variation 1 is followed. Therefore, in this variation 2, the machinability-enhanced film of this embodiment can be used preferably, as in the above steps (1) to (4) and the above steps (1') to (4'). Therefore, the above steps (1') to (4') can also be applied to optical parts such as touch panels or liquid crystal display devices, and a resin plate with a functional film attached through a machinability-enhanced layer can be easily manufactured. [Example]

以下參考實施例,更詳細說明本實施形態之機械加工性提升薄膜及機械加工性提升薄膜之使用方法等。 但,本實施形態無特別理由,並非限定於該等實施例之記載者。The following reference examples will be used to explain in more detail the machinability-enhancing film of this embodiment and the method of using the machinability-enhancing film. However, this embodiment is not limited to the description of these embodiments without any special reason.

[實施例1] 1. 機械加工性提升薄膜之製作及使用 1-(1) 主劑(A)之調製 將作為單體成分的全體量設為100重量份,使丙烯酸丁酯30重量份、丙烯酸2-乙基己酯25重量份、丙烯酸異冰片酯10重量份、甲基丙烯酸甲酯5重量份、丙烯醯基嗎啉5重量份及丙烯酸2-羥基乙酯25重量份進行溶液聚合,調製作為主劑(A)之(甲基)丙烯酸酯共聚物。 所得(甲基)丙烯酸酯共聚物之重量平均分子量(Mw)藉以下所示方法測定後,為50萬。[Example 1] 1. Preparation and use of a film with improved machinability 1-(1) Preparation of main agent (A) The total amount of the monomer components was set to 100 parts by weight, and 30 parts by weight of butyl acrylate, 25 parts by weight of 2-ethylhexyl acrylate, 10 parts by weight of isobornyl acrylate, 5 parts by weight of methyl methacrylate, 5 parts by weight of acrylamide and 25 parts by weight of 2-hydroxyethyl acrylate were solution polymerized to prepare a (meth)acrylate copolymer as the main agent (A). The weight average molecular weight (Mw) of the obtained (meth)acrylate copolymer was 500,000 as measured by the method shown below.

又,該重量平均分子量(Mw)係使用凝膠滲透層析儀(GPC),於以下條件測定(GPC測定)之聚苯乙烯換算的重量平均分子量。 (測定條件) ・GPC測定裝置:TOSOH公司製,HLC-8020 ・GPC管柱(依以下順序通過):TOSOH公司製 TSK防護管柱HXL-H TSK gel GMHXL(×2) TSK gel G2000HXL ・測定溶劑:四氫呋喃 ・測定溫度:40℃The weight average molecular weight (Mw) is a weight average molecular weight in terms of polystyrene measured using a gel permeation chromatography (GPC) under the following conditions (GPC measurement). (Measurement conditions) ・GPC measurement apparatus: HLC-8020 manufactured by TOSOH ・GPC column (passed in the following order): manufactured by TOSOH TSK guard column HXL-H TSK gel GMHXL (×2) TSK gel G2000HXL ・Measurement solvent: tetrahydrofuran ・Measurement temperature: 40°C

又,表1中記載的簡寫等之細節如以下。 (主劑(A):((甲基)丙烯酸酯共聚物)) BA:丙烯酸丁酯 2EHA:丙烯酸2-乙基己酯 IBXA:丙烯酸異冰片酯 MMA:甲基丙烯酸甲酯 ACMO:N-丙烯醯基嗎啉 HEA:丙烯酸2-羥基乙酯 AA:丙烯酸 4HBA:丙烯酸4-羥基丁酯 HEMA:甲基丙烯酸2-羥基乙酯In addition, the details of the abbreviations listed in Table 1 are as follows. (Main agent (A): ((meth)acrylate copolymer)) BA: Butyl acrylate 2EHA: 2-ethylhexyl acrylate IBXA: Isobornyl acrylate MMA: Methyl methacrylate ACMO: N-acryloylmorpholine HEA: 2-hydroxyethyl acrylate AA: Acrylic acid 4HBA: 4-hydroxybutyl acrylate HEMA: 2-hydroxyethyl methacrylate

1-(2) 用以形成機械加工性提升層之組成物的調製 其次,對於作為主劑(A)之(甲基)丙烯酸酯共聚物(固體成分)100重量份,以如下比例調配作為熱硬化性成分(B)的三羥甲基丙烷改質甲苯二異氰酸酯0.3重量份、作為活性能量線硬化性成分(C)的ε-己內酯改質三(2-丙烯醯氧基乙基)異氰脲酸酯8重量份、作為光聚合起始劑(D)之2,4,6-三甲基苯甲醯基-二苯基-氧化膦0.8重量份、及作為矽烷偶合劑(E)之3-縮水甘油氧基丙基三甲氧基矽烷0.3重量份,攪拌直至均一,以甲基乙基酮稀釋,藉此獲得固體成分濃度為30重量%之塗佈溶液。1-(2) Preparation of a composition for forming a machinability-enhancing layer Next, 100 parts by weight of a (meth)acrylate copolymer (solid component) as a main agent (A) was mixed with 0.3 parts by weight of trihydroxymethylpropane-modified toluene diisocyanate as a thermosetting component (B), 8 parts by weight of ε-caprolactone-modified tris(2-acryloyloxyethyl)isocyanurate as an active energy ray-curable component (C), 0.8 parts by weight of 2,4,6-trimethylbenzyl-diphenyl-phosphine oxide as a photopolymerization initiator (D), and 0.3 parts by weight of 3-glycidyloxypropyltrimethoxysilane as a silane coupling agent (E) in the following proportions, stirred until uniform, and diluted with methyl ethyl ketone to obtain a coating solution having a solid component concentration of 30% by weight.

又,表2中記載之簡寫等之細節如以下。 (熱硬化性成分(B)) B1:三羥甲基丙烷改質甲苯二異氰酸酯 B2:三羥甲基丙烷改質二甲苯二異氰酸酯 B3:1,3-雙(N,N-二縮水甘油基胺基甲基)環己烷 (活性能量線硬化性成分(C)) C1:ε-己內酯改質三(2-丙烯醯氧基乙基)異氰脲酸酯 C2:三羥甲基丙烷三丙烯酸酯 C3:二季戊四醇六丙烯酸酯In addition, the details of the abbreviations listed in Table 2 are as follows. (Thermosetting component (B)) B1: Trihydroxymethylpropane modified toluene diisocyanate B2: Trihydroxymethylpropane modified xylene diisocyanate B3: 1,3-bis(N,N-diglycidylaminomethyl)cyclohexane (Active energy ray curing component (C)) C1: ε-caprolactone modified tris(2-acryloyloxyethyl) isocyanurate C2: Trihydroxymethylpropane triacrylate C3: Dipentaerythritol hexaacrylate

1-(3)機械加工性提升層的形成步驟 於聚對苯二甲酸乙二酯薄膜之單面經聚矽氧系剝離劑進行剝離處理之重剝離型剝離薄膜(LINTEC公司製,製品名「SP-PET752150」)之剝離處理面上,以乾燥後之厚度成為15μm之方式使用棒塗佈器塗佈所得塗佈溶液。 接著,對塗佈層於90℃加熱處理1分鐘進行熱交聯反應,形成具有由作為主劑(A)之(甲基)丙烯酸酯共聚物與熱硬化性成分(B)構成之交聯構造的機械加工性提升層。1-(3) Formation step of the machinability-enhancing layer On the peeling-treated surface of a heavy-peel release film (manufactured by LINTEC, product name "SP-PET752150"), one side of which was peeled with a silicone-based release agent, the obtained coating solution was applied using a rod coater in such a manner that the thickness after drying became 15 μm. Then, the coating layer was heat-treated at 90°C for 1 minute to perform a thermal crosslinking reaction, thereby forming a machinability-enhancing layer having a crosslinked structure composed of a (meth)acrylate copolymer as a main agent (A) and a thermosetting component (B).

其次,將上述所得之重剝離型剝離薄膜上之塗佈層,與聚對苯二甲酸乙二酯薄膜之單面經聚矽氧系剝離劑進行剝離處理之輕剝離型剝離薄膜(LINTEC公司製,製品名「SP-PET382120」),以該輕剝離型薄膜之剝離處理面與機械加工性提升層接觸之方式貼合,於23℃、50%RH之條件下養生7天,而作成由重剝離型剝離薄膜/機械加工性提升層(厚度:15μm)/輕剝離型剝離薄膜構成而成之評價用機械加工性提升薄膜。 又,機械加工性提升層之厚度係依據JIS K7130,使用定壓厚度測定器(TECLOCK公司製,製品名「PG-02」)測定之值。Next, the coating layer on the heavy-peel release film obtained above was laminated with a light-peel release film (manufactured by LINTEC, product name "SP-PET382120") of polyethylene terephthalate film with one side treated with a silicone release agent, with the release-treated surface of the light-peel release film in contact with the machinability-enhancing layer, and cured for 7 days at 23°C and 50% RH to produce an evaluation machinability-enhancing film consisting of a heavy-peel release film/machinability-enhancing layer (thickness: 15μm)/light-peel release film. The thickness of the machinability-enhancing layer is a value measured using a constant-pressure thickness gauge (manufactured by TECLOCK, product name "PG-02") in accordance with JIS K7130.

2.機械加工性提升薄膜之評價 2-(1) 活性能量線照射前之黏著力(P1)之測定 評價用機械加工性提升薄膜中,自機械加工性提升層剝離輕剝離型剝離薄膜,並貼合於具有易接著層之聚對苯二甲酸乙二酯(PET)薄膜(東洋紡公司製,製品名「PET A4300」,厚度:100μm)之易接著層,獲得重剝離型剝離薄膜/機械加工性提升層(15μm)/PET薄膜之積層體。 所得積層體切斷為25mm寬、150mm長,將其作為樣品。 於23℃、50%RH之環境下,自上述所得之樣品剝離重剝離型剝離薄片,將露出的機械加工性提升層貼附於玻璃板後,以2kg的滾筒往返1刺進行壓著。 隨後,於23℃、50%RH之條件下放置24小時後,使用拉伸試驗機(ORIENTEC公司製,TENSILON),以剝離速度300mm/min、剝離角度180度的條件測定黏著力(P1,N/25mm)。 又,此處記載以外之條件係依據JIS Z 0237:2000進行測定。結果示於表2。2. Evaluation of machinability-enhancing film 2-(1) Determination of adhesion (P1) before active energy ray irradiation In the machinability-enhancing film for evaluation, a light-peel release film was peeled off from the machinability-enhancing layer and attached to the easy-adhesion layer of a polyethylene terephthalate (PET) film (manufactured by Toyobo Co., Ltd., product name "PET A4300", thickness: 100μm) to obtain a laminate of a heavy-peel release film/machinability-enhancing layer (15μm)/PET film. The obtained laminate was cut into 25 mm wide and 150 mm long pieces and used as samples. At 23°C and 50% RH, the heavy-peel peeling sheet was peeled off from the sample obtained above, and the exposed mechanical processing improvement layer was attached to a glass plate, and then pressed with a 2kg roller with one back and forth piercing. After being placed at 23°C and 50% RH for 24 hours, the adhesion (P1, N/25mm) was measured using a tensile tester (TENSILON, manufactured by ORIENTEC) at a peeling speed of 300mm/min and a peeling angle of 180 degrees. In addition, the conditions other than those described here were measured in accordance with JIS Z 0237:2000. The results are shown in Table 2.

2-(2) 活性能量線照射後之黏著力(P2)之測定 於23℃、50%RH之環境下,自上述所得之樣品剝離重剝離型剝離薄片,將露出的機械加工性提升層貼附於玻璃板後,以2kg的滾筒往返1次進行壓著,自PET薄膜側以下述條件照射作為活性能量線之紫外線。 隨後,於23℃、50%RH之條件下放置24小時後,使用拉伸試驗機(ORIENTEC公司製,TENSILON),以剝離速度300mm/min、剝離角度180度的條件測定活性能量線照射後之黏著力(P2,N/25mm)。 又,此處記載以外之條件係依據JIS Z 0237:2000進行測定。結果示於表2。 <紫外線照射條件> ・使用高壓水銀燈 ・照度200mW/cm2 ,光量2000mJ/cm2 ・UV照度・光量計係使用EYE GRAPHICS公司製「UVPF-A1」2-(2) Measurement of Adhesion (P2) after Active Energy Ray Irradiation In an environment of 23°C and 50%RH, a heavy-peel type peeling sheet was peeled off from the sample obtained above, and the exposed mechanical processing improvement layer was attached to a glass plate. Then, it was pressed with a 2 kg roller moving back and forth once, and ultraviolet rays as active energy rays were irradiated from the PET film side under the following conditions. After being left at 23°C and 50%RH for 24 hours, the adhesion (P2, N/25mm) after active energy ray irradiation was measured using a tensile tester (TENSILON, manufactured by ORIENTEC) at a peeling speed of 300 mm/min and a peeling angle of 180 degrees. The conditions other than those described here were measured in accordance with JIS Z 0237:2000. The results are shown in Table 2. <Ultraviolet irradiation conditions> ・High-pressure mercury lamp was used. ・Illuminance: 200mW/cm 2 , light quantity: 2000mJ/cm 2・UV illuminance/light meter: "UVPF-A1" manufactured by EYE GRAPHICS

2-(3) 黏著力之增加率的計算 算出上述測定之活性能量線照射後之黏著力(P2)相對於活性能量線照射前之黏著力(P1)的增加率(=P2/P1×100,%)。結果示於表2。2-(3) Calculation of the increase rate of adhesive force The increase rate of the adhesive force (P2) after the active energy ray irradiation measured above relative to the adhesive force (P1) before the active energy ray irradiation was calculated (=P2/P1×100, %). The results are shown in Table 2.

2-(4) 活性能量線照射前之凝膠分率(G1)之測定 所得之評價用機械加工性提升薄膜中,僅將機械加工性提升層包覆於聚酯製網狀物(網眼尺寸200)中,以精密天平秤量其質量,藉由減去上述網狀物單獨質量,而算出僅機械加工性提升層之質量。將此時質量設為m1。 其次,將以上述方法製作之包覆於聚酯製網狀物之狀態的機械加工性提升層於室溫下(23℃)於乙酸乙酯中浸漬72小時。 隨後,取出包覆於聚酯製網狀物之狀態的機械加工性提升層,於溫度23℃、相對濕度50%之環境下,風乾24小時,進而於80℃烘箱中乾燥12小時。 乾燥後,以精密天平秤量其重量,藉由減去上述網狀物單獨質量,而算出僅機械加工性提升層之質量。將此時質量設為m2。 以上述算出之質量為基準,導出活性能量線照射前之機械加工性提升層之凝膠分率(G1)(=(m2/m1)×100,%)。結果示於表2。2-(4) Determination of gel fraction (G1) before active energy ray irradiation In the obtained evaluation machinability-enhancing film, only the machinability-enhancing layer was wrapped in a polyester mesh (mesh size 200), and its mass was weighed with a precision balance. By subtracting the mass of the mesh alone, the mass of only the machinability-enhancing layer was calculated. The mass at this time was set as m1. Next, the machinability-enhancing layer wrapped in a polyester mesh prepared by the above method was immersed in ethyl acetate at room temperature (23°C) for 72 hours. Then, the machinability-enhancing layer wrapped in the polyester mesh was taken out and air-dried for 24 hours at a temperature of 23°C and a relative humidity of 50%, and then dried in an oven at 80°C for 12 hours. After drying, the weight was measured with a precision balance, and the mass of the machinability-enhancing layer alone was calculated by subtracting the mass of the mesh alone. The mass at this time was set as m2. Based on the mass calculated above, the gel fraction (G1) of the machinability-enhancing layer before active energy ray irradiation was derived (=(m2/m1)×100,%). The results are shown in Table 2.

2-(5) 活性能量線照射後之凝膠分率(G2)之測定 自所得之評價用機械加工性提升薄膜剝離輕剝離型剝離薄膜,對於露出之機械加工性提升層以上述條件直接照射活性能量線,使機械加工性提升層硬化。 針對該硬化後之機械加工性提升層,與上述同樣導出活性能量線照射後之機械加工性提升層的凝膠分率(G2)。結果示於表2。2-(5) Determination of gel fraction (G2) after active energy ray irradiation The obtained evaluation machinability enhancement film peeling light peel type peeling film was directly irradiated with active energy rays under the above conditions to harden the machinability enhancement layer. The gel fraction (G2) of the machinability enhancement layer after active energy ray irradiation was derived in the same manner as above for the hardened machinability enhancement layer. The results are shown in Table 2.

2-(6) 凝膠分率之增加率的計算 算出上述導出之活性能量線照射後之凝膠分率(G2)相對於活性能量線照射前之凝膠分率(G1)的增加率(=G2/G1×100,%)。結果示於表2。2-(6) Calculation of the increase rate of gel fraction The increase rate of the gel fraction (G2) after the active energy ray irradiation relative to the gel fraction (G1) before the active energy ray irradiation was calculated (=G2/G1×100, %). The results are shown in Table 2.

2-(7) 最大應力(S2)及100%伸長時應力(E2)之測定 自所得之評價用機械加工性提升薄膜剝離輕剝離型剝離薄膜,對於露出之機械加工性提升層以上述條件直接照射活性能量線,使機械加工性提升層硬化。 僅針對該硬化後之機械加工性提升層,使用拉伸試驗機(ORIENTEC公司製,TENSILON,剝離速度200mm/min)測定最大應力(S2,N/mm2 )及100%伸長時應力(E2,N/mm2 )。 又,此處記載以外之條件係依據JIS K 7162-2:2014進行測定。結果示於表2。2-(7) Measurement of maximum stress (S2) and stress at 100% elongation (E2) The obtained evaluation machinability-enhancing film was peeled off from the light-peel release type peeling film, and the exposed machinability-enhancing layer was directly irradiated with active energy rays under the above conditions to harden the machinability-enhancing layer. The maximum stress (S2, N/mm 2 ) and stress at 100% elongation (E2, N/mm 2 ) were measured only for the hardened machinability-enhancing layer using a tensile testing machine (TENSILON manufactured by ORIENTEC, peeling speed 200 mm/ min ). The conditions other than those described here were measured in accordance with JIS K 7162-2:2014. The results are shown in Table 2.

2-(8) 活性能量線照射前之儲存彈性模數(M1)之測定 所得之評價用機械加工性提升薄膜中,僅針對機械加工性提升層,依據JIS K7244-4:1999,使用黏彈性測定裝置(TA INSTRUMENTS公司製,ARES,頻率1Hz),測定活性能量線照射前之機械加工性提升層的儲存彈性模數(M1,MPa(25℃))。結果示於表2。2-(8) Determination of storage elastic modulus (M1) before active energy ray irradiation Among the obtained machinability-enhancing films for evaluation, only the machinability-enhancing layer was measured for storage elastic modulus (M1, MPa (25°C)) before active energy ray irradiation using a viscoelasticity measuring device (ARES, manufactured by TA INSTRUMENTS, frequency 1 Hz) in accordance with JIS K7244-4:1999. The results are shown in Table 2.

2-(9) 活性能量線照射後之儲存彈性模數(M2)之測定 自所得之評價用機械加工性提升薄膜剝離輕剝離型剝離薄膜,對於露出之機械加工性提升層以上述條件直接照射活性能量線,使機械加工性提升層硬化。 僅針對該硬化後之機械加工性提升層,與上述同樣條件,測定活性能量線照射後之機械加工性提升層的儲存彈性模數(M2,MPa(25℃))。結果示於表2。2-(9) Determination of storage elastic modulus (M2) after active energy ray irradiation The obtained evaluation machinability-enhancing film was peeled off from the light-peel type peelable film, and the exposed machinability-enhancing layer was directly irradiated with active energy rays under the above conditions to harden the machinability-enhancing layer. Only for the hardened machinability-enhancing layer, the storage elastic modulus (M2, MPa (25°C)) of the machinability-enhancing layer after active energy ray irradiation was measured under the same conditions as above. The results are shown in Table 2.

2-(10) 儲存彈性模數之增加率的計算 算出上述測定之活性能量線照射後之儲存彈性模數(M2)相對於活性能量線照射前之儲存彈性模數(M1)的增加率(=M2/M1×100,%)。結果示於表2。2-(10) Calculation of the increase rate of storage elastic modulus The increase rate of the storage elastic modulus (M2) after the active energy ray irradiation measured above relative to the storage elastic modulus (M1) before the active energy ray irradiation was calculated (=M2/M1×100, %). The results are shown in Table 2.

2-(11) 切削性之評價 自所得之評價用機械加工性提升薄膜剝離輕剝離型剝離薄片,使露出之機械加工性提升層貼附於PET薄膜(100μm)。 進而,剝離重剝離型剝離薄片,使露出之機械加工性提升層貼附於PET薄膜(100μm),獲得試驗片。 以上述條件照射活性能量線,使機械加工性提升層硬化後,使用切割刀,對試驗片之一PET薄膜面於垂直方向切斷。 接著,以顯微鏡觀察切斷面,依據下述基準評價切削性。 ◎:機械加工性提升層未觀察到缺損或伸長,為良好的切削面。 ○:機械加工性提升層稍觀察到缺損或伸長,為實用上沒問題的切削面。 △:機械加工性提升層見到缺損或伸長,為實用上欠佳的切削面。 ×:機械加工性提升層見到缺損或伸長,為實用上無法使用的切削面。2-(11) Evaluation of cutting properties The obtained evaluation film for improving machinability was peeled off from a light peeling type peeling sheet, and the exposed machinability improving layer was attached to a PET film (100 μm). Furthermore, the heavy peeling type peeling sheet was peeled off, and the exposed machinability improving layer was attached to a PET film (100 μm), thereby obtaining a test piece. After irradiating the test piece with active energy rays under the above conditions to harden the machinability improving layer, a cutter was used to cut one of the PET film surfaces of the test piece in a vertical direction. The cut surface was then observed under a microscope, and the cutting properties were evaluated according to the following criteria. ◎: No defects or elongation were observed in the machinability improving layer, and the test piece was a good cutting surface. ○: Slightly observed defects or elongation in the machinability improvement layer, which is a practically acceptable cutting surface. △: Defects or elongation in the machinability improvement layer, which is a practically unsuitable cutting surface. ×: Defects or elongation in the machinability improvement layer, which is a practically unsuitable cutting surface.

2-(12) 耐久性之評價 自所得之評價用機械加工性提升薄膜剝離輕剝離型剝離薄片,使露出之機械加工性提升層貼附於積層有聚甲基丙烯酸甲酯(PMMA)與聚碳酸酯(PC)的樹脂板(厚度:1mm,含有紫外線吸收劑)之聚碳酸酯側的面上。 進而,自評價用機械加工性提升薄膜剝離重剝離型剝離薄片,使露出之機械加工性提升層貼附於作為功能性薄膜之TAC薄膜(厚度100μm),獲得試驗片。所得試驗片於50℃、0.5MPa之條件下進行高壓釜處理30分鐘後,於常壓、23℃、50%RH下放置24小時。 其次,以上述條件照射活性能量線,使機械加工性提升層硬化後,於85℃、85%RH之高溫高濕條件下保存500小時。 隨後,以目視確認機械加工性提升層與被黏著體之界面之隆起剝落,由以下基準評價耐久性。結果示於表2。 ◎:氣泡及隆起剝落均無法確認。 ○:稍發生微小氣泡,但無法確認較大氣泡或剝落。 △:發生中程度的氣泡,稍確認到較大氣泡或剝落。 ×:顯著確認到較大氣泡或隆起剝落。2-(12) Evaluation of durability The obtained evaluation film with improved machinability was peeled off from a light-peel release sheet, and the exposed machinability-enhancing layer was attached to the polycarbonate side of a resin plate (thickness: 1 mm, containing an ultraviolet absorber) on which polymethyl methacrylate (PMMA) and polycarbonate (PC) were layered. Furthermore, the evaluation film with improved machinability was peeled off from a heavy-peel release sheet, and the exposed machinability-enhancing layer was attached to a TAC film (thickness: 100 μm) as a functional film to obtain a test piece. The obtained test piece was autoclaved for 30 minutes at 50°C and 0.5MPa, and then placed at normal pressure, 23°C, and 50%RH for 24 hours. Next, the active energy beam was irradiated under the above conditions to harden the machinability-enhancing layer, and then stored at high temperature and high humidity conditions of 85°C and 85%RH for 500 hours. Then, the ridges and peeling at the interface between the machinability-enhancing layer and the adherend were visually confirmed, and the durability was evaluated according to the following criteria. The results are shown in Table 2. ◎: Neither bubbles nor ridges and peeling could be confirmed. ○: Slightly small bubbles occurred, but larger bubbles or peeling could not be confirmed. △: Moderate bubbles occurred, and larger bubbles or peeling were slightly confirmed. ×: Large bubbles or swelling and peeling were clearly observed.

[實施例2~9、比較例1~4] 除了將作為主劑(A)的(甲基)丙烯酸酯共聚物之組成及分子量、熱硬化性成分(B)之重類及調配量、活性能量線硬化性成分(C)之種類及調配量、光聚合起始劑(D)之調配量、矽烷偶合劑(E)之調配量變更如表1所示以外,與實施例1同樣,獲得機械加工性提升薄膜,進行機械加工性提升薄膜之評價。所得結果示於表2。[Examples 2 to 9, Comparative Examples 1 to 4] Except that the composition and molecular weight of the (meth)acrylate copolymer as the main agent (A), the weight and amount of the thermosetting component (B), the type and amount of the active energy ray-curing component (C), the amount of the photopolymerization initiator (D), and the amount of the silane coupling agent (E) were changed as shown in Table 1, a film with improved machinability was obtained in the same manner as in Example 1, and the film with improved machinability was evaluated. The results are shown in Table 2.

[產業上之可利用性] [Industrial Availability]

以上,如所詳述,依據本發明之機械加工性提升薄膜,藉由將貼附於特定樹脂板,進而照射活性能量線後之機械加工性提升層的儲存彈性模數(M2)設為特定值,於使用機械處理裝置,以包含樹脂板之狀態,同時切削機械加工性提升層時,可獲得良好切削性。 又,依據本發明之機械加工性提升薄膜,藉由將照射活性能量線後之機械加工性提升層的黏著力(P2)設為特定值,可獲得良好耐久性。As described above, according to the machinability enhancement film of the present invention, by setting the storage elastic modulus (M2) of the machinability enhancement layer attached to a specific resin plate and then irradiated with active energy rays to a specific value, good machinability can be obtained when the machinability enhancement layer is cut while the resin plate is included in the mechanical processing device. In addition, according to the machinability enhancement film of the present invention, by setting the adhesion (P2) of the machinability enhancement layer after irradiation with active energy rays to a specific value, good durability can be obtained.

因此,可提供具備此等機械加工性提升層之機械加工性提升薄膜、包含此等機械加工性提升層之積層體(貼附有機械加工性提升薄膜之樹脂板)及此等機械加工性提升薄膜之有效率使用方法。 因此,本發明之機械加工性提升薄膜可期待有助於觸控面板或液晶顯示裝置等中之生產效率化或高品質化。Therefore, a machinability-enhancing film having such a machinability-enhancing layer, a laminate including such a machinability-enhancing layer (resin sheet with a machinability-enhancing film attached thereto), and an efficient method for using such a machinability-enhancing film can be provided. Therefore, the machinability-enhancing film of the present invention can be expected to contribute to the improvement of production efficiency or quality in touch panels or liquid crystal display devices, etc.

10、10’:積層體 12:樹脂板 13:源自用以形成機械加工性提升層之組成物的樹脂層 14:機械加工性提升層 14’:硬化後之機械加工性提升層 14a:特定空間 16:特定基材(功能性薄膜等) 16’:特定基材(剝離薄膜等) 18、18’:機械加工性提升薄膜10, 10': Laminated body 12: Resin sheet 13: Resin layer derived from a composition for forming a machinability-enhancing layer 14: Machinability-enhancing layer 14': Machinability-enhancing layer after curing 14a: Specific space 16: Specific substrate (functional film, etc.) 16': Specific substrate (peel-off film, etc.) 18, 18': Machinability-enhancing film

圖1(a)~(b)係供於用以分別說明使用機械加工性提升薄膜所成之積層體之構成例的圖。 圖2係供於用以說明活性能量線照射後之機械加工性提升層之儲存彈性模數(MPa)與切削性(相對值)之關係的圖。 圖3(a)~(e)係供於用以說明包含熱交聯步驟之機械加工性提升薄膜之製造方法及使用該機械加工性提升薄膜之積層體之製造方法的圖。 圖4(a)~(f)係供於用以說明使用功能性薄膜作為特定基材,使用機械加工性提升薄膜而成之積層體之製作步驟及使用步驟之圖(其一)。 圖5(a)~(f)係供於用以說明使用剝離薄膜作為特定基材,使用機械加工性提升薄膜而成之另一積層體之製作步驟及使用步驟之圖(其二)。Figures 1(a) to (b) are diagrams for respectively explaining the configuration examples of a laminate formed using a machinability-enhancing film. Figure 2 is a diagram for explaining the relationship between the storage elastic modulus (MPa) and the machinability (relative value) of the machinability-enhancing layer after irradiation with active energy rays. Figures 3(a) to (e) are diagrams for explaining the method for manufacturing a machinability-enhancing film including a thermal crosslinking step and the method for manufacturing a laminate using the machinability-enhancing film. Figures 4(a) to (f) are diagrams for explaining the manufacturing steps and use steps of a laminate formed using a machinability-enhancing film using a functional film as a specific substrate (part 1). 5(a) to (f) are diagrams for explaining the manufacturing steps and use steps of another laminate formed by using a release film as a specific substrate and a machinability-enhancing film (part 2).

10:積層體 10: Layered body

12:樹脂板 12: Resin board

14:機械加工性提升層 14: Machinability improvement layer

14a:特定空間 14a: Specific space

16:特定基材(功能性薄膜等) 16: Specific substrates (functional films, etc.)

18、18’:機械加工性提升薄膜 18, 18’: Films to improve machinability

Claims (8)

一種機械加工性提升薄膜,其係貼附於樹脂板,具備由積層於特定基材所成之活性能量線硬化性之機械加工性提升層者,其特徵為使前述機械加工性提升層之厚度為3~40μm之範圍內之值,前述機械加工性提升層係由包含作為主劑(A)之(甲基)丙烯酸酯共聚物、熱硬化性成分(B)及活性能量線硬化性成分(C)之組成物所得,就對前述樹脂板貼附之狀態的前述機械加工性提升層而言,將活性能量線照射前之前述機械加工性提升層的儲存彈性模數設為M1,將活性能量線照射後之前述機械加工性提升層的儲存彈性模數設為M2時,使M2/M1×100表示之數值為320~30000%之範圍內之值,前述活性能量線照射後之儲存彈性模數為0.2MPa以上之值,且使活性能量線照射後之黏著力為10N/25mm以上之值。 A machinability enhancing film is attached to a resin plate and has an active energy ray-curable machinability enhancing layer formed by laminating on a specific substrate, wherein the thickness of the machinability enhancing layer is within a range of 3 to 40 μm, the machinability enhancing layer is obtained from a composition comprising a (meth)acrylate copolymer as a main agent (A), a thermosetting component (B) and an active energy ray-curable component (C), and the machinability enhancing layer is attached to the resin plate. For the machinability enhancement layer, the storage elastic modulus of the aforementioned machinability enhancement layer before active energy ray irradiation is set as M1, and the storage elastic modulus of the aforementioned machinability enhancement layer after active energy ray irradiation is set as M2, so that the value represented by M2/M1×100 is within the range of 320~30000%, the storage elastic modulus after active energy ray irradiation is a value of 0.2MPa or more, and the adhesive force after active energy ray irradiation is a value of 10N/25mm or more. 如請求項1之機械加工性提升薄膜,其中作為前述特定基材係包含功能性薄膜或剝離薄膜。 The machinability-enhanced film of claim 1, wherein the aforementioned specific substrate comprises a functional film or a release film. 如請求項1之機械加工性提升薄膜,其中活性能量線照射後之前述機械加工性提升層之凝膠分率為60%以上之 值。 For example, the machinability-enhanced film of claim 1, wherein the gel fraction of the aforementioned machinability-enhanced layer after irradiation with active energy rays is a value of 60% or more. 如請求項1之機械加工性提升薄膜,其中活性能量線照射前之前述機械加工性提升層的儲存彈性模數為0.01~1MPa之範圍內之值。 For example, the machinability-enhanced film of claim 1, wherein the storage elastic modulus of the machinability-enhanced layer before irradiation with active energy rays is a value within the range of 0.01 to 1 MPa. 如請求項1之機械加工性提升薄膜,其中活性能量線照射後之前述機械加工性提升層的儲存彈性模數為0.2~5MPa之範圍內之值。 For example, the machinability-enhanced film of claim 1, wherein the storage elastic modulus of the aforementioned machinability-enhanced layer after irradiation with active energy rays is a value within the range of 0.2~5MPa. 一種積層體,其特徵係將如請求項1之機械加工性提升薄膜貼附於樹脂板而成。 A laminated body characterized by attaching a machinability-enhancing film as in claim 1 to a resin board. 如請求項6之積層體,其中前述樹脂板係光學用樹脂板。 As in claim 6, the laminate, wherein the resin sheet is an optical resin sheet. 一種如請求項1之機械加工性提升薄膜之使用方法,其特徵係包含下述步驟(1)~(4):(1)於作為特定基材之功能性薄膜表面,塗佈包含活性能量線硬化性成分之組成物,藉由加熱處理,作成具備活性能量線硬化性之機械加工性提升層的機械加工性提升薄膜之步驟,(2)將前述機械加工性提升薄膜貼附於樹脂板之步驟, (3)自樹脂板或特定基材側照射活性能量線,使前述機械加工性提升層中之活性能量線硬化性成分硬化,作成硬化後之機械加工性提升層之步驟,(4)對包含硬化後之機械加工性提升層及樹脂板的積層體,實施特定之機械加工處理之步驟。A method for using a machinability-enhancing film as claimed in claim 1, characterized in that it comprises the following steps (1) to (4): (1) coating a composition containing an active energy ray-hardening component on the surface of a functional film as a specific substrate, and preparing a machinability-enhancing film having an active energy ray-hardening machinability-enhancing layer by heat treatment; (2) attaching the aforementioned machinability-enhancing film to a resin board; (3) irradiating the resin board or the specific substrate side with active energy rays to harden the active energy ray-hardening component in the aforementioned machinability-enhancing layer to prepare a hardened machinability-enhancing layer; (4) performing a specific machining treatment on a laminate comprising the hardened machinability-enhancing layer and the resin board.
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