TWI855786B - Memory device and pre-charge method - Google Patents
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本發明是有關於一種記憶體裝置及其預充電方法。 The present invention relates to a memory device and a pre-charging method thereof.
隨著記憶體裝置的儲存密度增加,如何得到較好的讀取視窗(read window)也愈來愈重要。寫入干擾(program disturbance)是影響讀取視窗的一個因子。寫入電壓過大、在禁止晶胞(inhibit cell)處的升壓通道(boosting channel)不夠,或者是,升壓通道的突然下降(abrupt slope)都有可能使得讀取視窗變小,進而影響到記憶體裝置的性能。 As the storage density of memory devices increases, how to obtain a better read window becomes increasingly important. Program disturbance is a factor that affects the read window. Excessive write voltage, insufficient boosting channel at the inhibit cell, or abrupt slope of the boosting channel may reduce the read window, thereby affecting the performance of the memory device.
通道電位的突然下降有可能會造成熱載子注入(hot carrier injection,HE)效應,進而導致較小的讀取視窗。以目前的預充電方法來看,對於待預充電字元線施加相同電壓。如果在相鄰的預充電導通字元線與預充電關閉字元線之間的電壓差過大的話,則會導致熱載子注入效應,進而導致較小的讀取視窗。 The sudden drop in channel potential may cause hot carrier injection (HE) effect, resulting in a smaller read window. In the current pre-charge method, the same voltage is applied to the word lines to be pre-charged. If the voltage difference between the adjacent pre-charged on word lines and pre-charged off word lines is too large, it will cause hot carrier injection effect, resulting in a smaller read window.
第1圖顯示習知技術的熱載子注入效應。在第1圖中,CSL代表共同源極線(common source line),GSL代表整體源極線(global source line)、SSL代表串選擇線(string select line),BL代表位元線。如第1圖所示,在預充電階段,關閉字元 線WL0、WL4、WL5…;以及,導通字元線WL1、WL2與WL3,在此,例如,施加至字元線WL0、WL4、WL5…的關閉電壓為0V,而施加至字元線WL1、WL2與WL3的導通電壓為4.5V。在此假設,字元線WL0-WL3皆為抹除狀態(eR)(具有最低臨界電壓),而字元線WL4、WL5則為狀態G(具有最高臨界電壓)。則在字元線WL3與WL4之交界處,由於電壓差是4.5-0=4.5V,此大電壓差將導致熱載子注入效應,進而縮小讀取視窗,造成程式化干擾,影響記憶體裝置的性能。 FIG. 1 shows the hot carrier injection effect of the prior art. In FIG. 1, CSL represents a common source line, GSL represents a global source line, SSL represents a string select line, and BL represents a bit line. As shown in FIG. 1, in the precharge stage, the word lines WL0, WL4, WL5, ... are turned off; and the word lines WL1, WL2, and WL3 are turned on. Here, for example, the turn-off voltage applied to the word lines WL0, WL4, WL5, ... is 0V, and the turn-on voltage applied to the word lines WL1, WL2, and WL3 is 4.5V. In this assumption, word lines WL0-WL3 are all in the erase state (eR) (with the lowest critical voltage), while word lines WL4 and WL5 are in state G (with the highest critical voltage). At the junction of word lines WL3 and WL4, the voltage difference is 4.5-0=4.5V. This large voltage difference will lead to hot carrier injection effect, thereby reducing the read window, causing programming interference, and affecting the performance of the memory device.
故而,業界努力避免熱載子注入效應,以得到較好的讀取視窗,進而增加記憶體裝置的性能。 Therefore, the industry strives to avoid the hot carrier injection effect to obtain a better read window and thus increase the performance of memory devices.
根據本案一方面,提出一種記憶體裝置的預充電方法,包括:施加獨立控制的複數個預充電電壓至複數個導通字元線,該些預充電電壓從複數個參考預充電電壓中選擇;以及施加複數個關閉電壓至複數個關閉字元線,其中,於一既定方向上,該些導通字元線之一目標導通字元線係相鄰於該些關閉字元線之一下一相鄰目標關閉字元線;以及從該目標導通字元線往該下一相鄰目標關閉字元線之一電壓差小於一既定參考電壓差。 According to one aspect of the present invention, a precharging method for a memory device is provided, comprising: applying a plurality of independently controlled precharging voltages to a plurality of on word lines, the precharging voltages being selected from a plurality of reference precharging voltages; and applying a plurality of off voltages to a plurality of off word lines, wherein, in a given direction, a target on word line of the on word lines is adjacent to a next adjacent target off word line of the off word lines; and a voltage difference from the target on word line to the next adjacent target off word line is less than a given reference voltage difference.
根據本案另一方面,提出一種記憶體裝置,包括:一記憶體陣列;一驅動電路,耦接並驅動該記憶體陣列;以及一記憶體控制電路,耦接並控制該驅動電路。於一預充電階段中,於該記憶體控制電路的控制下,該驅動電路施加獨立控制的複數 個預充電電壓至該記憶體陣列的複數個導通字元線,該些預充電電壓從複數個參考預充電電壓中選擇;以及於該記憶體控制電路的控制下,該驅動電路施加複數個關閉電壓至該記憶體陣列的複數個關閉字元線。於一既定方向上,該些導通字元線之一目標導通字元線係相鄰於該些關閉字元線之一下一相鄰目標關閉字元線;以及,從該目標導通字元線往該下一相鄰目標關閉字元線之一電壓差小於一既定參考電壓差。 According to another aspect of the present invention, a memory device is provided, comprising: a memory array; a drive circuit coupled to and driving the memory array; and a memory control circuit coupled to and controlling the drive circuit. In a precharge phase, under the control of the memory control circuit, the drive circuit applies a plurality of independently controlled precharge voltages to a plurality of on word lines of the memory array, the precharge voltages being selected from a plurality of reference precharge voltages; and under the control of the memory control circuit, the drive circuit applies a plurality of off voltages to a plurality of off word lines of the memory array. In a given direction, a target on word line of the on word lines is adjacent to a next adjacent target off word line of the off word lines; and a voltage difference from the target on word line to the next adjacent target off word line is less than a given reference voltage difference.
為了對本發明之上述及其他方面有更佳的瞭解,下文特舉實施例,並配合所附圖式詳細說明如下: In order to better understand the above and other aspects of the present invention, the following is a specific example and a detailed description with the attached drawings as follows:
CSL:共同源極線 CSL: Common Source Line
GSL:整體源極線 GSL: Global Source Line
SSL:串選擇線 SSL: string selection line
BL:位元線 BL: Bit Line
WL0~WL5、WLN-4~WLN+4:字元線 WL0~WL5, WLN-4~WLN+4: character line
500:記憶體裝置 500: Memory device
510:記憶體控制電路 510: Memory control circuit
520:驅動電路 520:Drive circuit
530:記憶體陣列 530:Memory array
610、620:步驟 610, 620: Steps
第1圖顯示習知技術的熱載子注入效應。 Figure 1 shows the hot carrier injection effect of the conventional technology.
第2圖繪示根據本案一實施例的記憶體裝置之操作波形圖。 Figure 2 shows an operation waveform diagram of a memory device according to an embodiment of the present invention.
第3A圖至第3D圖顯示根據本案一實施例的預充電階段的操作示意圖。 Figures 3A to 3D show schematic diagrams of the operation of the pre-charging stage according to an embodiment of the present invention.
第4A圖至第4E圖顯示根據本案一實施例的預充電階段的操作示意圖。 Figures 4A to 4E show schematic diagrams of the operation of the pre-charging stage according to an embodiment of the present invention.
第5圖顯示根據本案一實施例的記憶體裝置的功能方塊圖。 Figure 5 shows a functional block diagram of a memory device according to an embodiment of the present invention.
第6圖顯示根據本案一實施例的記憶體裝置的預充電方法的流程圖。 Figure 6 shows a flow chart of a pre-charging method for a memory device according to an embodiment of the present invention.
本說明書的技術用語係參照本技術領域之習慣用語, 如本說明書對部分用語有加以說明或定義,該部分用語之解釋係以本說明書之說明或定義為準。本揭露之各個實施例分別具有一或多個技術特徵。在可能實施的前提下,本技術領域具有通常知識者可選擇性地實施任一實施例中部分或全部的技術特徵,或者選擇性地將這些實施例中部分或全部的技術特徵加以組合。 The technical terms in this manual refer to the customary terms in this technical field. If this manual explains or defines some terms, the interpretation of these terms shall be based on the explanation or definition in this manual. Each embodiment disclosed in this disclosure has one or more technical features. Under the premise of possible implementation, a person with ordinary knowledge in this technical field can selectively implement some or all of the technical features in any embodiment, or selectively combine some or all of the technical features in these embodiments.
第2圖繪示根據本案一實施例的記憶體裝置之操作波形圖。第2圖顯示出數個字元線WL0-WL5,但當知本案並不受限於此。在底下,以在預充電階段中,導通字元線WL1-WL3且關閉其他字元線WL0、WL4…為例做說明,但當知本案並不受限於此。在此假設,字元線WL0-WL3皆為抹除狀態(eR),而字元線WL4、WL5則為狀態G(具有最高臨界電壓)。在此假設是要程式化字元線WL2,但當知本案並不受限於此。施加至字元線WL0、WL4、WL5…的關閉電壓為0V,但當知本案並不受限於此。在底下,於預充電階段中,被導通的字元線(如WL1-WL3等)亦可稱為「導通字元線」;以及,被關閉的字元線(如WL0、WL4等)亦可稱為「關閉字元線」。在預充電階段中,共同源極線CSL與整體源極線GSL乃是導通,而串選擇線SSL為關閉,而位元線BL則依是否為禁止串而為導通(禁止串)或關閉(非禁止串)。 FIG. 2 shows an operation waveform diagram of a memory device according to an embodiment of the present invention. FIG. 2 shows several word lines WL0-WL5, but it should be noted that the present invention is not limited to this. Below, an example is given of turning on word lines WL1-WL3 and turning off other word lines WL0, WL4, etc. during the pre-charge stage, but it should be noted that the present invention is not limited to this. It is assumed here that word lines WL0-WL3 are all in the erase state (eR), while word lines WL4 and WL5 are in state G (with the highest critical voltage). It is assumed here that word line WL2 is to be programmed, but it should be noted that the present invention is not limited to this. The turn-off voltage applied to word lines WL0, WL4, WL5, etc. is 0V, but it should be noted that the present invention is not limited to this. In the following, in the pre-charge stage, the word lines that are turned on (such as WL1-WL3, etc.) can also be called "on word lines"; and the word lines that are turned off (such as WL0, WL4, etc.) can also be called "off word lines". In the pre-charge stage, the common source line CSL and the global source line GSL are turned on, and the string selection line SSL is turned off, and the bit line BL is turned on (disabled string) or off (non-disabled string) depending on whether it is a prohibited string.
如第2圖所示,於預充電階段,例如但不受限於,施加至導通的字元線WL1-WL3的預充電電壓分別為4.5V、4.5V與3V。則在字元線WL3(被導通,且具有最低臨界電壓)與 WL4(被關閉,且具有最高臨界電壓)之交界處,電壓差是3-0=3V,此電壓差較小,將減少熱載子注入效應的發生,進而降低讀取視窗的縮減情況,減少程式化干擾的影響,使得記憶體裝置的性能較不受影響。此外,於第2圖中,共同源極線CSL的電壓在字元線WL3(被導通,且具有最低臨界電壓)與WL4(被關閉,且具有最高臨界電壓)之交界處具有如階梯式的遞減。藉此,本案實施例可以減少如習知技術般的熱載子注入效應。 As shown in FIG. 2, in the pre-charge stage, for example but not limited to, the pre-charge voltages applied to the turned-on word lines WL1-WL3 are 4.5V, 4.5V and 3V respectively. At the junction of word lines WL3 (turned on and having the lowest critical voltage) and WL4 (turned off and having the highest critical voltage), the voltage difference is 3-0=3V. This smaller voltage difference will reduce the occurrence of hot carrier injection effect, thereby reducing the reduction of the read window and the impact of programming interference, so that the performance of the memory device is less affected. In addition, in FIG. 2, the voltage of the common source line CSL decreases in a step-like manner at the junction of the word line WL3 (turned on and having the lowest critical voltage) and WL4 (turned off and having the highest critical voltage). Thus, the embodiment of the present case can reduce the hot carrier injection effect as in the prior art.
於程式化階段,施加程式化電壓VPGM至字元線WL2,以及,施加通過電壓VPASS至其他字元線WL0-WL1、WL3-WL5…。在程式化階段中,共同源極線CSL乃是導通,而整體源極線GSL與串選擇線SSL為關閉,而位元線BL則依是否為禁止串而為導通(禁止串)或關閉(非禁止串)。 In the programming stage, the programming voltage VPGM is applied to the word line WL2, and the pass voltage VPASS is applied to other word lines WL0-WL1, WL3-WL5... In the programming stage, the common source line CSL is turned on, while the global source line GSL and the string selection line SSL are turned off, and the bit line BL is turned on (disabled string) or off (non-disabled string) depending on whether it is a prohibited string.
在本案其他實施例中,於預充電階段,施加至該些導通字元線的預充電電壓可以有更多種變化,並不受限於第2圖,在底下將說明一些例子,但當知本案並不受限於此。 In other embodiments of the present invention, during the pre-charging stage, the pre-charging voltage applied to the conductive word lines can have more variations and is not limited to FIG. 2. Some examples will be described below, but it should be noted that the present invention is not limited thereto.
第3A圖至第3D圖顯示根據本案一實施例的預充電階段的操作示意圖。如第3A圖所示,在預充電階段,例如但不受限於,施加至導通的字元線WL1-WL3的預充電電壓分別為高參考預充電電壓HV、中參考預充電電壓MV與低參考預充電電壓LV,其中,HV>MV>LV。如第3A圖所示,則在導通字元線WL3(亦可稱為「目標導通字元線」)與下一相鄰關閉字元線WL4(亦可稱為目標關閉字元線)之交界處,電壓差是LV-0=LV, 此電壓差較小(亦即,該電壓差要小於一既定參考電壓差),將減少熱載子注入效應的發生,進而降低讀取視窗的縮減情況,減少程式化干擾的影響,使得記憶體裝置的性能較不受影響。在本案一實施例中,目標導通字元線定義為,在既定方向上,相鄰於關閉字元線的該導通字元線;以及,目標關閉字元線定義為,在既定方向上,相鄰於導通字元線的該關閉字元線。在本案一實施例中,該既定方向是從該共同源極線CSL至該位元線BL。該既定參考電壓差有關於高參考預充電電壓HV與低參考預充電電壓LV間之一電壓差。於一例子中,該既定參考電壓差等於高參考預充電電壓HV與低參考預充電電壓LV間之一電壓差。 FIG. 3A to FIG. 3D are schematic diagrams showing the operation of the pre-charge stage according to an embodiment of the present invention. As shown in FIG. 3A, in the pre-charge stage, for example but not limited to, the pre-charge voltages applied to the turned-on word lines WL1-WL3 are respectively a high reference pre-charge voltage HV, a medium reference pre-charge voltage MV and a low reference pre-charge voltage LV, wherein HV>MV>LV. As shown in Figure 3A, at the junction of the on word line WL3 (also called the "target on word line") and the next adjacent off word line WL4 (also called the target off word line), the voltage difference is LV-0=LV. This voltage difference is smaller (that is, the voltage difference is smaller than a given reference voltage difference), which will reduce the occurrence of hot carrier injection effect, thereby reducing the reduction of the read window and the impact of programming interference, making the performance of the memory device less affected. In one embodiment of the present case, the target on word line is defined as the on word line adjacent to the off word line in a given direction; and the target off word line is defined as the off word line adjacent to the on word line in a given direction. In one embodiment of the present case, the given direction is from the common source line CSL to the bit line BL. The given reference voltage difference is related to a voltage difference between a high reference pre-charge voltage HV and a low reference pre-charge voltage LV. In one example, the given reference voltage difference is equal to a voltage difference between a high reference pre-charge voltage HV and a low reference pre-charge voltage LV.
如第3B圖所示,在預充電階段,例如但不受限於,施加至導通的字元線WL1-WL3的預充電電壓分別為高參考預充電電壓HV、高參考預充電電壓HV與中參考預充電電壓MV。如第3B圖所示,則在導通字元線WL3(亦可稱為「目標導通字元線」)與下一相鄰關閉字元線WL4(亦可稱為目標關閉字元線)之交界處,電壓差是MV-0=MV,此電壓差較小,將減少熱載子注入效應的發生,進而降低讀取視窗的縮減情況,減少程式化干擾的影響,使得記憶體裝置的性能較不受影響。 As shown in FIG. 3B , in the pre-charge stage, for example but not limited to, the pre-charge voltages applied to the turned-on word lines WL1 - WL3 are respectively a high reference pre-charge voltage HV, a high reference pre-charge voltage HV, and a medium reference pre-charge voltage MV. As shown in Figure 3B, at the junction of the on word line WL3 (also called the "target on word line") and the next adjacent off word line WL4 (also called the target off word line), the voltage difference is MV-0=MV. This smaller voltage difference will reduce the occurrence of hot carrier injection effect, thereby reducing the reduction of the read window and the impact of programming interference, making the performance of the memory device less affected.
如第3C圖所示,在預充電階段,例如但不受限於,施加至導通的字元線WL1-WL3的預充電電壓分別為高參考預充電電壓HV、中參考預充電電壓MV與中參考預充電電壓MV。如第3C圖所示,則在導通字元線WL3(亦可稱為「目標導通字元 線」)與下一相鄰關閉字元線WL4(亦可稱為目標關閉字元線)之交界處,電壓差是MV-0=MV,此電壓差較小,將減少熱載子注入效應的發生,進而降低讀取視窗的縮減情況,減少程式化干擾的影響,使得記憶體裝置的性能較不受影響。 As shown in FIG. 3C , in the pre-charge stage, for example but not limited to, the pre-charge voltages applied to the turned-on word lines WL1 - WL3 are respectively a high reference pre-charge voltage HV, a medium reference pre-charge voltage MV, and a medium reference pre-charge voltage MV. As shown in Figure 3C, at the junction of the on word line WL3 (also called the "target on word line") and the next adjacent off word line WL4 (also called the target off word line), the voltage difference is MV-0=MV. The smaller the voltage difference, the less likely the hot carrier injection effect will occur, thereby reducing the reduction of the read window and the impact of programming interference, making the performance of the memory device less affected.
如第3D圖所示,在預充電階段,例如但不受限於,施加至導通的字元線WL1-WL3的預充電電壓分別為高參考預充電電壓HV、低參考預充電電壓LV與中參考預充電電壓MV。如第3D圖所示,則在導通字元線WL3(亦可稱為「目標導通字元線」)與下一相鄰關閉字元線WL4(亦可稱為目標關閉字元線)之交界處,電壓差是MV-0=MV,此電壓差較小,將減少熱載子注入效應的發生,進而降低讀取視窗的縮減情況,減少程式化干擾的影響,使得記憶體裝置的性能較不受影響。 As shown in FIG. 3D , in the pre-charge stage, for example but not limited to, the pre-charge voltages applied to the turned-on word lines WL1 - WL3 are respectively a high reference pre-charge voltage HV, a low reference pre-charge voltage LV, and a medium reference pre-charge voltage MV. As shown in Figure 3D, at the junction of the on word line WL3 (also called the "target on word line") and the next adjacent off word line WL4 (also called the target off word line), the voltage difference is MV-0=MV. This smaller voltage difference will reduce the occurrence of hot carrier injection effect, thereby reducing the reduction of the read window and the impact of programming interference, making the performance of the memory device less affected.
本案也可以有其他不同的預充電電壓,為方便說明,茲整理成下表1以說明之。當然本案並不受限於此,習知此技者當可從本案實施例推知其他種的預充電電壓設定,此皆在本案精神範圍內。 This case can also have other different pre-charge voltages. For the convenience of explanation, they are organized into the following Table 1 for explanation. Of course, this case is not limited to this. Those who are familiar with this technology can infer other types of pre-charge voltage settings from the embodiments of this case, which are all within the spirit of this case.
以上表1來看,施加至目標導通字元線(如第3A圖的字元線WL3)的預充電電壓可為中參考預充電電壓MV或低參考預充電電壓LV,而施加至非目標導通字元線(如第3A圖的字元線WL1或WL2)的預充電電壓可為高參考預充電電壓HV、中參考預充電電壓MV或低參考預充電電壓LV。 From Table 1 above, the precharge voltage applied to the target conductive word line (such as word line WL3 in FIG. 3A) can be the medium reference precharge voltage MV or the low reference precharge voltage LV, and the precharge voltage applied to the non-target conductive word line (such as word line WL1 or WL2 in FIG. 3A) can be the high reference precharge voltage HV, the medium reference precharge voltage MV or the low reference precharge voltage LV.
在本案一實施例中,高參考預充電電壓HV、中參考預充電電壓MV與低參考預充電電壓LV之設定值,例如但不受限於為,2~5V、1~4V與0~3V。 In an embodiment of the present case, the setting values of the high reference pre-charge voltage HV, the medium reference pre-charge voltage MV and the low reference pre-charge voltage LV are, for example but not limited to, 2~5V, 1~4V and 0~3V.
第4A圖至第4E圖顯示根據本案一實施例的預充電階段的操作示意圖。如第4A圖所示,在預充電階段,例如但不受限於,至少有7條字元線WLN-3~WLN+3為導通,其餘字元線為關閉。施加至導通的字元線WLN-3~WLN+3的預充電電壓分別為6V、6V、5V、4V、3V、2V與2V,當知這些電壓數值只是用於舉例,本案並不受限於此。如第4A圖所示,則在導通字元線WLN+3(目標導通字元線)與下一相鄰關閉字元線WIN+4(亦即,目標關閉字元線)之交界處,電壓差是2V-0=2V,此電壓差較小,將減少熱載子注入效應的發生,進而降低讀取視窗的縮減情況,減少程式化干擾的影響,使得記憶體裝置的性能 較不受影響。 FIG. 4A to FIG. 4E are schematic diagrams showing the operation of the pre-charge stage according to an embodiment of the present invention. As shown in FIG. 4A, in the pre-charge stage, for example but not limited to, at least 7 word lines WLN-3 to WLN+3 are turned on, and the remaining word lines are turned off. The pre-charge voltages applied to the turned-on word lines WLN-3 to WLN+3 are 6V, 6V, 5V, 4V, 3V, 2V and 2V respectively. It should be noted that these voltage values are only used for examples, and the present invention is not limited thereto. As shown in Figure 4A, at the junction of the on word line WLN+3 (target on word line) and the next adjacent off word line WIN+4 (i.e., target off word line), the voltage difference is 2V-0=2V. This smaller voltage difference will reduce the occurrence of hot carrier injection effect, thereby reducing the reduction of the read window and the impact of programming interference, making the performance of the memory device less affected.
如第4B圖所示,在預充電階段,例如但不受限於,至少有6條字元線WLN-3~WLN+2為導通,其餘字元線為關閉。施加至導通的字元線WLN-3~WLN+2的預充電電壓分別為6V、6V、5V、4V、3V與3V,當知這些電壓數值只是用於舉例,本案並不受限於此。如第4B圖所示,則在導通字元線WLN+2(亦即,目標導通字元線)與下一相鄰關閉字元線WLN+3(亦即,目標關閉字元線)之交界處,電壓差是3V-0=3V,此電壓差較小,將減少熱載子注入效應的發生,進而降低讀取視窗的縮減情況,減少程式化干擾的影響,使得記憶體裝置的性能較不受影響。 As shown in FIG. 4B , in the pre-charge stage, for example but not limited to, at least 6 word lines WLN-3 to WLN+2 are turned on, and the remaining word lines are turned off. The pre-charge voltages applied to the turned-on word lines WLN-3 to WLN+2 are 6V, 6V, 5V, 4V, 3V, and 3V, respectively. It should be noted that these voltage values are only used for examples, and the present invention is not limited thereto. As shown in Figure 4B, at the junction of the on word line WLN+2 (i.e., the target on word line) and the next adjacent off word line WLN+3 (i.e., the target off word line), the voltage difference is 3V-0=3V. This smaller voltage difference will reduce the occurrence of hot carrier injection effect, thereby reducing the reduction of the read window and the impact of programming interference, making the performance of the memory device less affected.
如第4C圖所示,在預充電階段,例如但不受限於,至少有4條字元線WLN-3~WLN為導通,其餘字元線為關閉。施加至導通的字元線WLN-3~WLN的預充電電壓分別為6V、6V、5V與4V,當知這些電壓數值只是用於舉例,本案並不受限於此。如第4C圖所示,則在導通字元線WLN(亦即,目標導通字元線)與下一相鄰關閉字元線WLN+1(亦即,目標關閉字元線)之交界處,電壓差是4V-0=4V,此電壓差較小,將減少熱載子注入效應的發生,進而降低讀取視窗的縮減情況,減少程式化干擾的影響,使得記憶體裝置的性能較不受影響。 As shown in FIG. 4C , in the pre-charge stage, for example but not limited to, at least four word lines WLN-3 to WLN are turned on, and the remaining word lines are turned off. The pre-charge voltages applied to the turned-on word lines WLN-3 to WLN are 6V, 6V, 5V, and 4V, respectively. It should be noted that these voltage values are only used for example, and the present invention is not limited thereto. As shown in Figure 4C, at the junction of the on word line WLN (i.e., the target on word line) and the next adjacent off word line WLN+1 (i.e., the target off word line), the voltage difference is 4V-0=4V. This smaller voltage difference will reduce the occurrence of hot carrier injection effect, thereby reducing the reduction of the read window and the impact of programming interference, making the performance of the memory device less affected.
如第4D圖所示,在預充電階段,例如但不受限於,至少有6條字元線WLN-3~WLN、WLN+2與WLN+4為導通,其餘字元線為關閉。施加至導通字元線WLN-3~WLN、WLN+2 與WLN+4的預充電電壓分別為6V、6V、5V、4V、3V與2V,當知這些電壓數值只是用於舉例,本案並不受限於此。如第4D圖所示,則在導通字元線WLN(亦即,目標導通字元線)與下一相鄰關閉字元線WLN+1(亦即,目標關閉字元線)之交界處,電壓差是4V-0=4V;在導通字元線WLN+2(亦即,目標導通字元線)與下一相鄰關閉字元線WLN+3(亦即,目標關閉字元線)之交界處,電壓差是3V-0=3V,以及,在導通字元線WLN+4(,目標導通字元線)與下一相鄰關閉字元線WLN+5(亦即,目標關閉字元線)之交界處,電壓差是2V-0=2V。此電壓差較小,將減少熱載子注入效應的發生,進而降低讀取視窗的縮減情況,減少程式化干擾的影響,使得記憶體裝置的性能較不受影響。在第4D圖中,導通字元線之間可間雜(interval)關閉字元線,此亦在本案精神範圍內。 As shown in FIG. 4D, in the pre-charge stage, for example but not limited to, at least 6 word lines WLN-3~WLN, WLN+2 and WLN+4 are turned on, and the remaining word lines are turned off. The pre-charge voltages applied to the turned-on word lines WLN-3~WLN, WLN+2 and WLN+4 are 6V, 6V, 5V, 4V, 3V and 2V respectively. It should be noted that these voltage values are only used for examples, and the present invention is not limited thereto. As shown in FIG. 4D , at the junction of the turn-on word line WLN (i.e., the target turn-on word line) and the next adjacent turn-off word line WLN+1 (i.e., the target turn-off word line), the voltage difference is 4V-0=4V; at the junction of the turn-on word line WLN+2 (i.e., the target turn-on word line) and the next adjacent turn-off word line WLN+3 (i.e., the target turn-off word line), the voltage difference is 3V-0=3V; and, at the junction of the turn-on word line WLN+4 (i.e., the target turn-on word line) and the next adjacent turn-off word line WLN+5 (i.e., the target turn-off word line), the voltage difference is 2V-0=2V. This smaller voltage difference will reduce the occurrence of hot carrier injection effect, thereby reducing the shrinkage of the read window and the impact of programming interference, making the performance of the memory device less affected. In Figure 4D, the closed word lines can be interspersed between the turned-on word lines, which is also within the spirit of the present invention.
如第4E圖所示,在預充電階段,例如但不受限於,至少有7條字元線WLN-3~WLN+3為導通,其餘字元線為關閉。施加至導通字元線WLN-3~WLN+3的預充電電壓分別為2~5V、2~5V、1~4V、1~4V、0~3V、0~3V與0~3V,當知這些電壓數值只是用於舉例,本案並不受限於此。如第4E圖所示,則在導通字元線WLN+3(亦即,目標導通字元線)與下一相鄰關閉字元線WLN+4(亦即,目標關閉字元線)之交界處,電壓差是(0~3V)-0=0~3V。此電壓差較小,將減少熱載子注入效應的發生,進而降低讀取視窗的縮減情況,減少程式化干擾的影響,使得記 憶體裝置的性能較不受影響。 As shown in FIG. 4E, in the pre-charge stage, for example but not limited to, at least 7 word lines WLN-3 to WLN+3 are turned on, and the remaining word lines are turned off. The pre-charge voltages applied to the turned-on word lines WLN-3 to WLN+3 are 2~5V, 2~5V, 1~4V, 1~4V, 0~3V, 0~3V and 0~3V respectively. It should be noted that these voltage values are only used for examples, and the present invention is not limited thereto. As shown in FIG. 4E, at the junction of the turned-on word line WLN+3 (i.e., the target turned-on word line) and the next adjacent turned-off word line WLN+4 (i.e., the target turned-off word line), the voltage difference is (0~3V)-0=0~3V. This smaller voltage difference will reduce the occurrence of hot carrier injection effect, thereby reducing the reduction of the reading window and the impact of programming interference, making the performance of the memory device less affected.
由上述可知,在本案一實施例中,為減少熱載子注入效應,在預充電階段中,(1)在一既定方向上,避免從導通字元線往下一相鄰關閉字元線之間的電壓差要避免過大。以第2圖、第3A至第3D圖與第4A圖至第4E圖來看,既定方向是指,從共同源極線CSL往位元線BL的方向。(2)施加至該些導通字元線的預充電電壓可以有多種不同的預充電電壓設定方式(不受限於表1所示)。 As can be seen from the above, in one embodiment of the present case, in order to reduce the hot carrier injection effect, in the pre-charge stage, (1) in a given direction, the voltage difference from the conductive word line to the next adjacent closed word line should be avoided to be too large. From Figure 2, Figures 3A to 3D, and Figures 4A to 4E, the given direction refers to the direction from the common source line CSL to the bit line BL. (2) The pre-charge voltage applied to the conductive word lines can be set in a variety of different ways (not limited to those shown in Table 1).
第5圖顯示根據本案一實施例的記憶體裝置的功能方塊圖。如第5圖所示,根據本案一實施例的記憶體裝置500包括記憶體控制電路510、驅動電路520與記憶體陣列530。記憶體控制電路510耦接並控制驅動電路520,驅動電路520耦接並驅動記憶體陣列530。在記憶體控制電路510的控制下,於預充電階段與程式化階段中,驅動電路520可輸出驅動電壓(如上圖中的預充電電壓、程式化電壓VPGM、通過電壓VPASS等)來驅動記憶體陣列530來預充電與程式化。
FIG. 5 shows a functional block diagram of a memory device according to an embodiment of the present invention. As shown in FIG. 5 , a memory device 500 according to an embodiment of the present invention includes a
第6圖顯示根據本案一實施例的記憶體裝置的預充電方法的流程圖。於步驟610中,施加獨立控制的複數個預充電電壓至複數個導通字元線,該些預充電電壓從複數個參考預充電電壓中選擇。於步驟620中,施加複數個關閉電壓至複數個關閉字元線,其中,於一既定方向上,該些導通字元線之一目標導通字元線係相鄰於該些關閉字元線之一下一相鄰目標關閉字元線; 以及,從該目標導通字元線往該下一相鄰目標關閉字元線之一電壓差小於一既定參考電壓差。 FIG. 6 shows a flow chart of a precharge method for a memory device according to an embodiment of the present invention. In step 610, a plurality of independently controlled precharge voltages are applied to a plurality of on word lines, and the precharge voltages are selected from a plurality of reference precharge voltages. In step 620, a plurality of off voltages are applied to a plurality of off word lines, wherein, in a given direction, a target on word line of the on word lines is adjacent to a next adjacent target off word line of the off word lines; and a voltage difference from the target on word line to the next adjacent target off word line is less than a given reference voltage difference.
本案上述實施例可應用於二維(2D)記憶體裝置或三維(3D)記憶體裝置中。此外,本案上述實施例可應用於單位元晶胞(SLC)記憶體裝置、多位元晶胞(MLC)記憶體裝置、三位元晶胞(TLC)記憶體裝置、四位元晶胞(QLC)記憶體裝置等之中。 The above embodiments of the present case can be applied to a two-dimensional (2D) memory device or a three-dimensional (3D) memory device. In addition, the above embodiments of the present case can be applied to a single-bit cell (SLC) memory device, a multi-bit cell (MLC) memory device, a triple-bit cell (TLC) memory device, a quad-bit cell (QLC) memory device, etc.
在本案上述實施例中,預充電方法可以改善程式化干擾,因為避免了相鄰字元線之間的大幅電壓差,以避免熱載子注入效應,進而得到較大的讀取視窗。 In the above-mentioned embodiment of the present case, the pre-charging method can improve programming interference because it avoids a large voltage difference between adjacent word lines to avoid hot carrier injection effects, thereby obtaining a larger read window.
綜上所述,雖然本發明已以實施例揭露如上,然其並非用以限定本發明。本發明所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾。因此,本發明之保護範圍當視後附之申請專利範圍所界定者為準。 In summary, although the present invention has been disclosed as above by the embodiments, it is not intended to limit the present invention. Those with common knowledge in the technical field to which the present invention belongs can make various changes and modifications without departing from the spirit and scope of the present invention. Therefore, the scope of protection of the present invention shall be subject to the scope of the patent application attached hereto.
610-620:步驟 610-620: Steps
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Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070019484A1 (en) * | 2005-07-23 | 2007-01-25 | Samsung Electronics Co., Ltd | Memory device and method for improving speed at which data is read from non-volatile memory |
| KR100763078B1 (en) * | 2006-09-04 | 2007-10-04 | 주식회사 하이닉스반도체 | How to erase NAND flash memory |
| TW200841341A (en) * | 2006-12-29 | 2008-10-16 | Sandisk Corp | Programming non-volatile memory with reduced program disturb by using different pre-charge enable voltages and non-volatile memory system |
| TW200901198A (en) * | 2007-02-07 | 2009-01-01 | Mosaid Technologies Inc | Source side asymmetrical precharge programming scheme |
| CN108335711A (en) * | 2017-01-18 | 2018-07-27 | 三星电子株式会社 | Nonvolatile semiconductor memory member, its operating method and storage device |
| TW202008367A (en) * | 2018-08-07 | 2020-02-16 | 旺宏電子股份有限公司 | Method for operating memory array |
| US11056195B1 (en) * | 2020-04-27 | 2021-07-06 | Macronix International Co., Ltd. | Nonvolatile memory device and related driving method |
-
2023
- 2023-07-21 TW TW112127332A patent/TWI855786B/en active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070019484A1 (en) * | 2005-07-23 | 2007-01-25 | Samsung Electronics Co., Ltd | Memory device and method for improving speed at which data is read from non-volatile memory |
| KR100763078B1 (en) * | 2006-09-04 | 2007-10-04 | 주식회사 하이닉스반도체 | How to erase NAND flash memory |
| TW200841341A (en) * | 2006-12-29 | 2008-10-16 | Sandisk Corp | Programming non-volatile memory with reduced program disturb by using different pre-charge enable voltages and non-volatile memory system |
| TW200901198A (en) * | 2007-02-07 | 2009-01-01 | Mosaid Technologies Inc | Source side asymmetrical precharge programming scheme |
| CN108335711A (en) * | 2017-01-18 | 2018-07-27 | 三星电子株式会社 | Nonvolatile semiconductor memory member, its operating method and storage device |
| TW202008367A (en) * | 2018-08-07 | 2020-02-16 | 旺宏電子股份有限公司 | Method for operating memory array |
| US11056195B1 (en) * | 2020-04-27 | 2021-07-06 | Macronix International Co., Ltd. | Nonvolatile memory device and related driving method |
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