TWI722542B - Method and apparatus for performing auto-exposure control in depth sensing system including projector - Google Patents
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本發明係有關於一種深度感測系統,特別有關於一種深度感測系統內的自動曝光控制裝置與自動曝光控制方法。 The present invention relates to a depth sensing system, and more particularly to an automatic exposure control device and automatic exposure control method in the depth sensing system.
於主動式深度感測中,利用具有已知圖案的光線於一程序中照亮一場景或物體之此光線通常被稱為「結構光」。被投射至場景之具有圖案的光線的結構可用於將此場景之深度資訊進行編碼。一旦於一感測器所捕獲或擷取的一訊框中找到此光線的圖案,即可重建立體的場景。此已知的被投射的光線圖案與被解碼的光線圖案之間的關係可被用於推導出所擷取的場景的深度資訊。 In active depth sensing, the light that uses light with a known pattern to illuminate a scene or object in a program is usually called "structured light." The structure of the patterned light projected onto the scene can be used to encode the depth information of the scene. Once the light pattern is found in a frame captured or captured by a sensor, a three-dimensional scene can be reconstructed. The known relationship between the projected light pattern and the decoded light pattern can be used to derive the depth information of the captured scene.
對於此深度感測技術,投射光線的強度為必要的,並且可能影響到整個深度感測系統的功率耗損或所感測到的深度資訊的準確度。因此,需要一種應用於深度感測系統內的適當的自動曝光控制。 For this depth sensing technology, the intensity of the projected light is necessary, and may affect the power consumption of the entire depth sensing system or the accuracy of the sensed depth information. Therefore, there is a need for an appropriate automatic exposure control applied in the depth sensing system.
本發明的一目的在於提供應用於深度感測系統內的自動曝光控制方 法與裝置。本發明藉由估計一場景之照明條件以取得對於深度感測系統內之投影器之合理的自動曝光與功率控制以及/或設定深度感測系統內之感測裝置。為了能快速估計照明條件,本發明利用像素合併技術自感測裝置讀出信號,以取得具有較低解析度的參考訊框,其可有效地降低功率耗損與計算負擔。此外,本發明利用於不同照明條件下所擷取之參考訊框以分析場景之環境光之強度以及投影器之光源之既定強度的差異,藉此決定出驅動投影器之光源之適當功率。為了取得準確的照明條件估計結果,本發明利用興趣區(region of interest,ROI)決定程序排除無意義或或者將阻礙該場景之照明條件之估計的資訊。藉由適當且準確地執行自動曝光(auto-exposure,AE)控制,深度感測系統可取得該場景更準確的深度資訊,並且避免功率耗損。 An object of the present invention is to provide an automatic exposure control method used in a depth sensing system Method and device. The present invention obtains reasonable automatic exposure and power control of the projector in the depth sensing system by estimating the lighting conditions of a scene and/or setting the sensing device in the depth sensing system. In order to quickly estimate the lighting conditions, the present invention uses pixel binning technology to read out signals from the sensing device to obtain a reference frame with a lower resolution, which can effectively reduce power consumption and computational burden. In addition, the present invention utilizes reference frames captured under different lighting conditions to analyze the difference between the intensity of the ambient light of the scene and the predetermined intensity of the light source of the projector, thereby determining the appropriate power of the light source for driving the projector. In order to obtain accurate lighting condition estimation results, the present invention uses a region of interest (ROI) determination procedure to eliminate information that is meaningless or that would hinder the estimation of the lighting conditions of the scene. By appropriately and accurately performing auto-exposure (AE) control, the depth sensing system can obtain more accurate depth information of the scene and avoid power consumption.
本發明的至少一實施例提供一種於包含一投影器之一深度感測系統中執行自動曝光控制的方法,包括:根據不同照明條件擷取一場景之一第一參考訊框以及一第二參考訊框;計算該第一參考訊框之複數第一區塊所對應之複數第一區塊平均值以及計算該第二參考訊框之複數第二區塊所對應之複數第二區塊平均值;根據該等第一區塊平均值以及該等第二區塊平均值計算複數區塊平均值的差值;根據該等第一區塊平均值、該等第二區塊平均值以及該等區塊平均值的差值自該等第一區塊決定複數第一興趣區(ROI)區塊以及自該等第二區塊決定複數第二ROI區塊;以及根據該等第一ROI區塊所對應之複數區塊平均值與該等第二ROI區塊所對應之複數區塊平均值調整該投影器之一光源的功率。 At least one embodiment of the present invention provides a method for performing automatic exposure control in a depth sensing system including a projector, including: capturing a first reference frame of a scene and a second reference according to different lighting conditions Frame; Calculate the average value of the first blocks corresponding to the plurality of first blocks of the first reference frame and calculate the average value of the second blocks corresponding to the plurality of second blocks of the second reference frame ; According to the first block average value and the second block average value to calculate the difference of the complex block average value; according to the first block average value, the second block average value and the The difference between the average values of the blocks determines a plurality of first region of interest (ROI) blocks from the first blocks and a plurality of second ROI blocks from the second blocks; and according to the first ROI blocks The average value of the corresponding complex blocks and the average value of the complex blocks corresponding to the second ROI blocks adjust the power of a light source of the projector.
本發明的至少一實施例提供一種用於包含一投影器之一深度感測系統中用以執行自動曝光控制的裝置,包括:一感測裝置、一區塊平均值計算單元、一區塊平均差值計算單元、一興趣區(ROI)決定單元以及一AE控制單元。感測裝置用以根據不同照明條件擷取一場景之一第一參考訊框以及一第二參考訊框。區塊平均值計算單元用以計算第一參考訊框之複數第一區塊所對應之複數 第一區塊平均值以及計算第二參考訊框之複數第二區塊所對應之複數第二區塊平均值。區塊平均差值計算單元用以根據第一區塊平均值以及第二區塊平均值計算複數區塊平均值的差值。興趣區(ROI)決定單元用以根據第一區塊平均值、第二區塊平均值以及區塊平均值的差值自第一區塊決定複數第一ROI區塊以及自第二區塊決定複數第二ROI區塊。AE控制單元用以根據第一ROI區塊所對應之複數區塊平均值與第二ROI區塊所對應之複數區塊平均值調整該投影器之一光源的功率。 At least one embodiment of the present invention provides a device for performing automatic exposure control in a depth sensing system including a projector, including: a sensing device, a block average calculation unit, and a block average Difference calculation unit, a region of interest (ROI) determination unit and an AE control unit. The sensing device is used for capturing a first reference frame and a second reference frame of a scene according to different lighting conditions. The block average calculation unit is used to calculate the complex number corresponding to the first block of the first reference frame The average value of the first block and the average value of the plurality of second blocks corresponding to the plurality of second blocks of the second reference frame are calculated. The block average difference calculation unit is used for calculating the difference between the plurality of block averages according to the first block average value and the second block average value. The region of interest (ROI) determining unit is used to determine the plurality of first ROI blocks and the second block from the first block according to the difference between the first block average value, the second block average value, and the block average value A plurality of second ROI blocks. The AE control unit is used for adjusting the power of a light source of the projector according to the average value of the plurality of blocks corresponding to the first ROI block and the average value of the plurality of blocks corresponding to the second ROI block.
10:深度感測系統 10: Depth sensing system
12:投影器 12: Projector
14:感測裝置 14: Sensing device
15:讀出電路 15: readout circuit
16:處理電路 16: processing circuit
18:深度解碼電路 18: Depth decoding circuit
20:感測器 20: Sensor
100:AE控制裝置 100: AE control device
120:區塊平均值計算單元 120: Block average calculation unit
140:區塊平均差值計算單元 140: Block average difference calculation unit
160:ROI決定單元 160: ROI decision unit
180:AE控制單元 180: AE control unit
B11-B112:第一區塊 B11-B112: The first block
B21-B212:第二區塊 B21-B212: The second block
D1-D12:區塊平均值的差值 D1-D12: The difference between the average value of the block
M21-M212、M11-M112:區塊平均值 M21-M212, M11-M112: block average
RF1:第一參考訊框 RF1: The first reference frame
RF2:第二參考訊框 RF2: Second reference frame
第1圖係顯示根據本發明之一實施例所述之具有自動曝光控制裝置之一深度感測系統之方塊圖。 FIG. 1 shows a block diagram of a depth sensing system with an automatic exposure control device according to an embodiment of the present invention.
第2圖係顯示根據本發明之一實施例所述之如何計算區塊平均值、區塊平均值的差值以及其關係之示意圖。 Fig. 2 is a schematic diagram showing how to calculate the block average value, the difference between the block average value, and the relationship according to an embodiment of the present invention.
第3圖係顯示根據本發明之一實施例所述之如何決定一場景之照明條件之示意圖。 Figure 3 is a schematic diagram showing how to determine the lighting conditions of a scene according to an embodiment of the present invention.
第4圖係顯示根據本發明之一實施例所述之自動曝光控制裝置之操作流程圖。 Figure 4 is a flowchart showing the operation of the automatic exposure control device according to an embodiment of the present invention.
在下文中,描述了許多具體細節以提供對本發明實施例的透徹理解。然而,本領域技術人員仍將理解如何在缺少一個或多個具體細節或依賴於其他方法、元件或材料的情況下實施本發明。在其他情況下,未詳細示出或描述公知的結構、材料或操作,以避免模糊本發明的主要概念。 In the following, many specific details are described to provide a thorough understanding of the embodiments of the present invention. However, those skilled in the art will still understand how to implement the present invention without one or more specific details or relying on other methods, elements or materials. In other cases, well-known structures, materials, or operations are not shown or described in detail to avoid obscuring the main concept of the present invention.
在整個說明書中對「一個實施例」、「一實施例」、「一個範例」或「一 範例」的引用意味著結合該實施例或範例所描述的特定特徵、結構或特性係包括於本發明之多個實施例的至少一個實施例中。因此,貫穿本說明書在各個地方出現的短語「在一個實施例中」、「在一實施例中」、「在一個範例中」或「在一範例中」不一定都指到相同的實施例或範例。此外,特定特徵、結構或特性可以在一個或多個實施例或範例中以任何合適的組合和/或子組合進行結合。 Throughout the specification, reference to “one embodiment”, “one embodiment”, “one example” or “one The reference to "example" means that a specific feature, structure, or characteristic described in conjunction with the embodiment or example is included in at least one of the multiple embodiments of the present invention. Therefore, the phrases "in one embodiment," "in an embodiment," "in an example," or "in an example" appearing in various places throughout this specification do not necessarily all refer to the same embodiment. Or example. In addition, specific features, structures or characteristics can be combined in any suitable combination and/or sub-combination in one or more embodiments or examples.
第1圖係顯示根據本發明之一實施例所述之具有自動曝光(auto-exposure,縮寫為AE)控制裝置100(以下稱為AE控制裝置100)之一深度感測系統10之方塊圖。深度感測系統10可包括一投影器12、一感測裝置14與一處理電路16。一般而言,投影器12可用以將具有一已知圖案之光線投射至一場景或一物體上。感測裝置14可用以擷取此場景或物體的影像畫面或訊框。處理電路16可用以執行有關於像素合併(pixel-binning)以及/或降低取樣頻率(down-sampling)等處理的運算。此外,深度感測系統10也可包括一深度解碼電路18,其可用以解碼已被編碼於已知圖案內的深度資訊。特別地,深度解碼電路18根據具有已知圖案被投射於其上之場景或物體的訊框解碼深度資訊。於一實施例中,投影器12具有一光源,其可用以發射紅外線,而感測裝置14可感測紅外線。
FIG. 1 shows a block diagram of a
AE控制裝置100可至少控制用以驅動投影器12之功率(例如,由光源所投射出來的光的強度)、以及感測裝置14之感測器20的曝光時間。
The
AE控制裝置100可包括一區塊平均值計算單元120、一區塊平均差值計算單元140、一興趣區(region of interest,縮寫為ROI)決定單元160以及一AE控制單元180。區塊平均值計算單元120用以計算由感測裝置14對於一場景所擷取之複數個參考訊框的複數個區塊的平均值。區塊平均差值計算單元140用以根據兩個不同的參考訊框所計算出的區塊平均值計算其區塊平均值的差值。ROI決定
單元160可用以自參考訊框的區塊中決定出興趣區的區塊。AE控制單元180用以決定場景的照明條件,並且對應地對深度感測系統10執行AE控制。
The
為了為一場景確定驅動投影器12之光源的適當功率以及/或感測器20的適當曝光時間,AE控制單元180首先需要於周圍的光線(即,環境光)下收集一場景的照明條件之資訊。因此,AE控制單元180請求感測裝置14於無主動光源投射至一場景時擷取此場景之一第一參考訊框RF1。此時,投影器12之光源被關閉,並且感測裝置14於僅有環境光之情況下擷取此場景之第一參考訊框RF1。接著,AE控制單元180請求感測裝置14於有主動光源投射至此場景時擷取此場景之一第二參考訊框RF2。此時,投影器12之光源被開啟,並且以某一強度檔位被驅動。此光源將光線投射至該場景,並且感測裝置14於具備有環境光以及主動光源之情況下對應地擷取此場景的第二參考訊框RF2。
In order to determine the appropriate power of the light source driving the
典型地,感測裝置14之感測器20可感測光線,並且感測裝置14之一讀出電路15可自感測器20的各像素讀出信號作為感測資料。然而,為了節省計算負擔與功率耗損,感測資料可以像素合併的方式被讀出,用以將感測器20的多個像素的信號結合成單一個信號。特別地,處理電路16可對讀出電路15所讀出之信號執行像素合併的操作,用以將多個像素的信號結合成單一個信號。對應地,降低取樣頻率的程序亦可由處理電路16對讀出的信號執行,以降低資料量。即,感測器20上的多個像素的資料會被合併,因而得到一個具有較感測器20所提供之原始解析度更低解析度的訊框。舉例而言,感測器20可輸出原始解析度為960x960像素的訊框。透過像素合併的操作(2x像素合併),可得到解析度為480x480像素的訊框。透過降低取樣頻率的程序(4x列降低取樣頻率),可得到解析度為480x120像素的訊框。值得注意的是,於本發明之不同實施例中,上述的像素合併的尺度因數與降低取樣頻率的尺度因數可有所不同。另一方面,若
無需過度擔憂功率耗損,則亦可省略像素合併與降低取樣頻率的其中一者。
Typically, the
深度感測系統10的AE控制裝置100可根據經由處理電路16執行像素合併與降低取樣頻率操作過的資料分析照明條件。然而,由於像素合併與降低取樣頻率的處理會導致失去深度資訊,進而影響深度感測的準確度,因此深度感測系統10的深度解碼電路18並不會根據經像素合併與降低取樣頻率處理過的資料進行深度解碼操作。
The
一旦第一參考訊框RF1與第二參考訊框RF2被擷取了,其像素資料會被傳送至區塊平均值計算單元120。如第2圖所示,區塊平均值計算單元120將第一參考訊框RF1與第二參考訊框RF2切分為複數個第一區塊B11-B112與複數個第二區塊B21-B212。值得注意的是,本發明並未限制參考訊框所切分的區塊數量。根據本發明之多種實施例,第一參考訊框RF1與第二參考訊框RF2可被切分為更多或更少個區塊。 Once the first reference frame RF1 and the second reference frame RF2 are captured, their pixel data will be sent to the block average calculation unit 120. As shown in Figure 2, the block average calculation unit 120 divides the first reference frame RF1 and the second reference frame RF2 into a plurality of first blocks B11-B112 and a plurality of second blocks B21-B212 . It should be noted that the present invention does not limit the number of blocks divided by the reference frame. According to various embodiments of the present invention, the first reference frame RF1 and the second reference frame RF2 can be divided into more or less blocks.
由於第一區塊B11-B11N與第二區塊B21-B21N為空間上相同,因此各第一區塊B11-B11N與第二區塊B21-B21N之一者相關聯。舉例而言,如第2圖所示,第一區塊B11與第二區塊B21相關聯,第一區塊B12與第二區塊B22相關聯,第一區塊B13與第二區塊B23相關聯,以此類推。典型地,各第一區塊與第二區塊具有相同的大小(例如,包含m乘以n個像素)。 Since the first blocks B11-B11N and the second blocks B21-B21N are spatially identical, each of the first blocks B11-B11N is associated with one of the second blocks B21-B21N. For example, as shown in Figure 2, the first block B11 is associated with the second block B21, the first block B12 is associated with the second block B22, and the first block B13 is associated with the second block B23. Correlation, and so on. Typically, each first block and second block have the same size (for example, including m times n pixels).
區塊平均值計算單元120根據一個第一區塊所包含之像素的感測值,為各個第一區塊B11-B112計算其區塊平均值。此外,區塊平均值計算單元120根據一個第二區塊所包含之像素的感測值,為各個第二區塊B21-B212計算其區塊平均值。當第一區塊B11-B112隸屬於於僅有環境光之情況下擷取之第一參考訊框RF1,而第二區塊B21-B212隸屬於於具備有環境光以及主動光源之情況下對應擷取之第二參考訊框RF2,第一區塊B11-B112所對應的區塊平均值
M11-M112與第二區塊B21-B212所對應的區塊平均值M21-M212將不相同。在第一區塊B11-B112所對應的區塊平均值M11-M112與第二區塊B21-B212所對應的區塊平均值M21-M212被計算出來後,區塊平均差值計算單元140將計算出第一區塊的區塊平均值與其所相關聯之第二區塊的區塊平均值的區塊平均值差值。舉例而言,區塊平均差值計算單元140將計算出第一區塊B11之區塊平均值M11與第二區塊B21之區塊平均值M21之間的平均值差值D1、第一區塊B12之區塊平均值M12與第二區塊B22之區塊平均值M22之間的平均值差值D2...第一區塊B112之區塊平均值M112與第二區塊B212之區塊平均值M212之間的平均值差值D12等。
The block average calculation unit 120 calculates the block average for each first block B11-B112 according to the sensing value of the pixels included in a first block. In addition, the block average calculation unit 120 calculates the block average for each second block B21-B212 according to the sensing value of the pixels included in a second block. When the first block B11-B112 belongs to the first reference frame RF1 captured with only ambient light, and the second block B21-B212 belongs to the corresponding situation with ambient light and active light source The captured second reference frame RF2, the average value of the blocks corresponding to the first blocks B11-B112
The block average values M21-M212 corresponding to M11-M112 and the second block B21-B212 will be different. After the block average value M11-M112 corresponding to the first block B11-B112 and the block average value M21-M212 corresponding to the second block B21-B212 are calculated, the block average
於第一區塊B11-B112所對應的區塊平均值M11-M112、第二區塊B21-B212所對應的區塊平均值M21-M212以及區塊平均值的差值D1-D12被計算出來後,可執行興趣區(ROI)的決定程序。執行ROI決定程序的目的為排除那些區塊平均值為無意義的區塊或者將阻礙估計該場景之照明條件的區塊。舉例而言,若一區塊與場景內之一低/高反射率的物體或者與場景內之遠處相關聯,由於此區塊無法適當地反映出此場景的照明條件,此區塊將被排除。類似地,若一區塊與過度曝光或曝光不足之一物體或一部分場景相關聯,由於此區塊亦無法適當地反映出此場景的照明條件,此區塊也將被排除。舉例而言,當一第一區塊所對應的區塊平均值高於一平均值閥值時,於決定第一ROI區塊以及第二ROI區塊時可排除此區塊平均值所對應之第一區塊以及相關聯之第二區塊。 The block average value M11-M112 corresponding to the first block B11-B112, the block average value M21-M212 corresponding to the second block B21-B212, and the difference D1-D12 of the block average value are calculated After that, the procedure for determining the region of interest (ROI) can be executed. The purpose of performing the ROI determination procedure is to exclude those blocks whose average value is meaningless or blocks that will hinder the estimation of the lighting conditions of the scene. For example, if a block is associated with a low/high-reflectivity object in the scene or the distance in the scene, since this block cannot properly reflect the lighting conditions of the scene, the block will be exclude. Similarly, if a block is associated with an over-exposed or under-exposed object or part of the scene, this block will also be excluded because the block cannot properly reflect the lighting conditions of the scene. For example, when the average value of the block corresponding to a first block is higher than an average threshold value, when determining the first ROI block and the second ROI block, the average value corresponding to this block can be excluded The first block and the associated second block.
此外,當第一區塊B11-B112之其中一者曝光過度,第二區塊B11-B112中所對應之一區塊無可避免地亦為曝光過度。然而,當第一區塊B11-B112之其中一者並未曝光過度,第二區塊B11-B112中所對應之一區塊可能會因投影器12的功率過強而發生過度曝光。
In addition, when one of the first blocks B11-B112 is over-exposed, the corresponding one of the second blocks B11-B112 is inevitably over-exposed. However, when one of the first blocks B11-B112 is not overexposed, the corresponding one of the second blocks B11-B112 may be overexposed due to the excessive power of the
為了排除那些與場景內之一低/高反射率的物體或者與場景內之遠處相關聯的區塊,各區塊平均值的差值D1-D12會與一差值閥值做比較。這是因為那些與場景內之一低/高反射率的物體或者與場景內之遠處相關聯的區塊的區塊平均值並不會隨著照明條件變化而有顯著的改變。因此,其所對應的區塊平均值的差值會很小。若一區塊平均值差值小於差值閥值,則對應之區塊於決定ROI區塊時將會被排除。舉例而言,若第一區塊B13之區塊平均值M13與第二區塊B23之區塊平均值M23之間的區塊平均值差值D3小於差值閥值,第一區塊B13與第二區塊B23將被排除。相反地,若第一區塊B13之區塊平均值M13與第二區塊B23之區塊平均值M23之間的區塊平均值差值D3高於差值閥值,第一區塊B13與第二區塊B23會被判斷為第一ROI區塊ROIB13與第二ROI區塊ROIB23。當第一區塊B11-B112之其中一者為曝光不足時,若投影器12提供適度的照明給此場景/物體,則第二區塊B21-B212所對應的一區塊可以是適度曝光的。
In order to exclude those areas with a low/high reflectivity in the scene or blocks associated with the distance in the scene, the difference D1-D12 of the average value of each block will be compared with a difference threshold. This is because the block average of those objects with low/high reflectivity in the scene or the blocks associated with the distance in the scene will not change significantly with changes in lighting conditions. Therefore, the difference between the average values of the corresponding blocks will be very small. If the average difference of a block is less than the difference threshold, the corresponding block will be excluded when determining the ROI block. For example, if the block average difference D3 between the block average value M13 of the first block B13 and the block average value M23 of the second block B23 is less than the difference threshold, the first block B13 and The second block B23 will be excluded. Conversely, if the block average difference D3 between the block average M13 of the first block B13 and the block average M23 of the second block B23 is higher than the difference threshold, the first block B13 and The second block B23 is determined as the first ROI block ROIB13 and the second ROI block ROIB23. When one of the first blocks B11-B112 is underexposed, if the
對應地,ROI決定單元160可基於上述排除那些與場景內之一低/高反射率的物體或者與場景內之遠處相關聯的區塊的原則自第一區塊B11-B112中決定出第一ROI區塊ROIB11-ROIB1N以及自第二區塊B21-B212決定出第二ROI區塊ROIB21-ROIB2N。
Correspondingly, the
於自第一區塊B11-B112中決定出第一ROI區塊ROIB11-ROIB1N以及自第二區塊B21-B212決定出第二ROI區塊ROIB21-ROIB2N後,AE控制單元180將對應地決定第一參考訊框RF1與第二參考訊框RF2被擷取之該場景之照明條件。根據所決定之場景照明條件,AE控制單元180對投影器12以及/或感測裝置14做適當的控制。
After the first ROI block ROIB11-ROIB1N is determined from the first block B11-B112 and the second ROI block ROIB21-ROIB2N is determined from the second block B21-B212, the
為了更好的理解,請參考至第3圖,其中第3圖係顯示決定一場景之照明條件之流程。根據本發明之多種實施例,AE控制單元180可將一場景之照明
條件決定為極暗條件、極度過曝條件、部分過曝條件、曝光良好以及曝光不足條件等之其中一者。
For a better understanding, please refer to Figure 3, where Figure 3 shows the process of determining the lighting conditions of a scene. According to various embodiments of the present invention, the
於此流程的開始,AE控制單元180檢查是否有任何ROI區塊存在。特別地,AE控制單元180將檢查是否第二ROI區塊ROIB21-ROIB2N的數量為0。如上所述,若第一參考訊框RF1的照明與第二參考訊框RF2的照明相近,ROI決定單元160所決定出來的ROI區塊數量將為0。
At the beginning of this process, the
若第二ROI區塊的數量為0,意味著此場景的照明條件為極暗或極度過曝。即,因極度過曝或極度曝光不足而導致所有的第二區塊B21-B212都被排除,因此,沒有任何第二區塊B21-B212被判斷為第二ROI區塊。 If the number of second ROI blocks is 0, it means that the lighting condition of this scene is extremely dark or extremely overexposed. That is, all the second blocks B21-B212 are excluded due to extreme overexposure or extreme underexposure. Therefore, no second block B21-B212 is judged as the second ROI block.
因此,可判定出第二ROI區塊數量為0的原因。該些第二區塊B21-B212所對應的區塊平均值的一個平均值可與一過曝閥值相比較(例如,灰階值250)以及一曝光不足閥值(例如,灰階值5)相比較,若該些第二區塊B21-B212所對應的區塊平均值的平均值低於曝光不足閥值,則可指示出該場景之照明條件為極暗條件。於此極暗條件,AE控制單元180將請求深度感測系統10顯著地提高投影器12之光源的功率,或增加感測器20的曝光時間,藉此為該場景取得更亮的照明條件。另一方面,若該些第二區塊B21-B212所對應的區塊平均值的平均值高於過曝閥值,則可指示出該場景之照明條件為極度過曝條件。於極度過曝條件之下,AE控制單元180將請求感測裝置14顯著地減少感測器20的曝光時間,以避免當投影器12之光源的功率為最低檔位時,讀取自感測器20的信號會被截短。
Therefore, the reason why the number of second ROI blocks is 0 can be determined. An average value of the block average values corresponding to the second blocks B21-B212 can be compared with an overexposure threshold (for example, a grayscale value of 250) and an underexposure threshold (for example, a grayscale value of 5). ) In comparison, if the average value of the average values of the blocks corresponding to the second blocks B21-B212 is lower than the underexposure threshold, it can indicate that the lighting conditions of the scene are extremely dark conditions. In this extremely dark condition, the
若第二ROI區塊ROIB21-ROIB2N的數量不為0(意味著並非所有第二區塊B21-B212為極暗或極度過曝),AE控制單元180將藉由取該些第一ROI區塊ROIB11-ROIB1N之區塊平均值之一平均值計算出第一ROI訊框平均值FM1,以及藉由取該些第二ROI區塊ROIB21-ROIB2N之區塊平均值之一平均值計算出第
二ROI訊框平均值FM2。
If the number of the second ROI blocks ROIB21-ROIB2N is not 0 (meaning that not all the second blocks B21-B212 are extremely dark or extremely overexposed), the
當第二ROI區塊中具有區塊平均值高於過曝閥值之區塊(即,過曝區塊)之數量高於一區塊數量閥值TH時,AE控制單元180將判斷此場景之照明條件為部分過曝條件。舉例而言,若第二ROI區塊ROIB21-ROIB2N之中有5個區塊其區塊平均值高於過曝閥值(例如,250),則過曝的第二區塊數量為5,當此數量高於區塊數量閥值TH(例如,3)時,可判斷此場景之照明條件為部分過曝條件。因此,AE控制單元180將根據第一ROI訊框平均值FM1與第二ROI訊框平均值FM2之一比值(或者可再加上一偏移量)計算一調整因數。根據計算出的調整因數,AE控制單元180請求深度感測系統10微幅降低投影器12之光源的功率,藉此為此場景取得更加平衡的照明條件。另一方面,AE控制單元180亦可根據計算出的調整因數請求深度感測系統10減少感測器20的曝光時間,藉此為此場景取得更加平衡的照明條件。
When the number of blocks with a block average value higher than the overexposure threshold in the second ROI block (ie, overexposed blocks) is higher than a block number threshold TH, the
另一方面,當第二ROI區塊中具有區塊平均值高於過曝閥值之區塊(即,過曝區塊)之數量低於區塊數量閥值TH時,AE控制單元180將判斷此場景之照明條件為曝光良好或曝光不足條件。舉例而言,若第二ROI區塊ROIB21-ROIB2N之中有2個區塊其區塊平均值高於過曝閥值(例如,250),則過曝的第二區塊數量為2,當此數量低於區塊數量閥值TH(例如,3)時,可判斷此場景之照明條件為曝光良好或曝光不足條件。
On the other hand, when the number of blocks with a block average value higher than the overexposure threshold (ie, overexposed blocks) in the second ROI block is lower than the block number threshold TH, the
為了區別曝光良好與曝光不足條件,需確認第一ROI訊框平均值FM1是否高於一最小照明強度。若第一ROI訊框平均值FM1之數值高於最小照明強度之數值,則AE控制單元180將判斷此場景之照明條件為曝光良好。鑑於此,AE控制單元180將根據第一ROI訊框平均值FM1與第二ROI訊框平均值FM2之一比值(或者可再加上一偏移量)計算一調整因數。根據計算出的調整因數,AE控制單元180請求深度感測系統10調整投影器12之光源的功率。若第一ROI訊框平均
值FM1之數值低於最小照明強度之數值,則AE控制單元180將判斷此場景之照明條件為曝光不足條件。鑑於此,AE控制單元180將根據最小照明強度之數值與第二ROI訊框平均值FM2之一比值計算一調整因數。根據計算出的調整因數,AE控制單元180請求深度感測系統10調整投影器12之光源的功率,藉此為此場景取得更亮的照明條件。
In order to distinguish between well-exposed and under-exposed conditions, it is necessary to confirm whether the average value FM1 of the first ROI frame is higher than a minimum illumination intensity. If the value of the first ROI frame average value FM1 is higher than the value of the minimum illumination intensity, the
於一實施例中,當照明條件被判定為部分過曝時,AE控制單元180將請求感測器20根據區塊過曝的程度減少曝光時間。更具體的說,決定過曝的ROI區塊數量。根據過曝的ROI區塊數量,AE控制單元180將請求感測器20根據對應之一尺度因數減少曝光時間。舉例而言,過曝的ROI區塊數量可被分類為以下等級:1x、2x、4x、8x與16x,因此,對應之用以減少曝光時間的尺度因數可分別為0.625x、0.5x、0.375x、0.25x以及0.125x。
In one embodiment, when the lighting condition is determined to be partially overexposed, the
第4圖係顯示AE控制裝置100之主要操作步驟的流程圖。此流程包含以下步驟:
Fig. 4 is a flowchart showing the main operation steps of the
步驟410:根據不同照明條件擷取一場景之一第一參考訊框以及一第二參考訊框。 Step 410: Capture a first reference frame and a second reference frame of a scene according to different lighting conditions.
步驟420:計算第一參考訊框之複數第一區塊所對應之複數第一區塊平均值以及計算第二參考訊框之複數第二區塊所對應之複數第二區塊平均值。 Step 420: Calculate the average value of the plurality of first blocks corresponding to the plurality of first blocks of the first reference frame and calculate the average value of the plurality of second blocks corresponding to the plurality of second blocks of the second reference frame.
步驟430:根據該等第一區塊平均值以及該等第二區塊平均值計算複數區塊平均值的差值。 Step 430: Calculate the difference between the average values of the plural blocks according to the average values of the first blocks and the average values of the second blocks.
步驟440:根據該等第一區塊平均值、該等第二區塊平均值以及該等區塊平均值的差值自該等第一區塊決定複數第一ROI區塊以及自該等第二區塊決定複數第二ROI區塊。 Step 440: Determine a plurality of first ROI blocks from the first blocks according to the average value of the first blocks, the average values of the second blocks, and the difference between the average values of the blocks The second block determines the plural second ROI block.
步驟450:根據該等第一ROI區塊所對應之區塊平均值與該等第二ROI區塊所對應之區塊平均值調整投影器之光源的功率。 Step 450: Adjust the power of the light source of the projector according to the average value of the blocks corresponding to the first ROI blocks and the average value of the blocks corresponding to the second ROI blocks.
如以上已詳細介紹的原理與AE控制裝置100之操作,第4圖所示之各步驟的詳細說明於此省略不再贅述。
As the principle and operation of the
綜上所述,本發明提出一種深度感測系統內的自動曝光控制裝置與自動曝光控制方法。本發明藉由估計一場景之照明條件以取得對於深度感測系統內之投影器以及/或感測器之合理的自動曝光控制。為了能快速估計照明條件,本發明利用像素合併技術自感測裝置讀出信號,以取得具有較低解析度的參考訊框,其可有效地降低功率耗損與計算負擔。此外,本發明利用於不同照明條件下所擷取之參考訊框以分析場景之環境光之強度以及投影器之光源之既定強度的差異,藉此決定出驅動投影器之光源之適當功率。為了取得準確的照明條件估計結果,本發明利用ROI決定程序排除無意義或或者將阻礙該場景之照明條件之估計的資訊。藉由適當且準確地執行AE控制,深度感測系統可取得該場景更準確的深度資訊,並且避免功率耗損。 In summary, the present invention provides an automatic exposure control device and automatic exposure control method in a depth sensing system. The present invention obtains reasonable automatic exposure control for the projector and/or sensor in the depth sensing system by estimating the lighting condition of a scene. In order to quickly estimate the lighting conditions, the present invention uses pixel binning technology to read out signals from the sensing device to obtain a reference frame with a lower resolution, which can effectively reduce power consumption and computational burden. In addition, the present invention utilizes reference frames captured under different lighting conditions to analyze the difference between the intensity of the ambient light of the scene and the predetermined intensity of the light source of the projector, thereby determining the appropriate power of the light source for driving the projector. In order to obtain accurate lighting condition estimation results, the present invention uses an ROI determination procedure to eliminate information that is meaningless or that will hinder the estimation of the lighting conditions of the scene. By appropriately and accurately performing AE control, the depth sensing system can obtain more accurate depth information of the scene and avoid power consumption.
本發明之實施例可使用硬體、軟體、韌體以及其相關結合來完成。藉由適當之一指令執行系統,可使用儲存於一記憶體中之軟體或韌體來實作本發明的實施例。就硬體而言,則是可應用下列任一技術或其相關結合來完成:具有可依據資料信號執行邏輯功能之邏輯閘的一個別運算邏輯、具有合適的組合邏輯閘之一特定應用積體電路(application specific integrated circuit,縮寫為ASIC)、可程式閘陣列(programmable gate array,縮寫為PGA)或一現場可程式閘陣列(field programmable gate array,縮寫為FPGA)等。 The embodiments of the present invention can be implemented using hardware, software, firmware, and related combinations thereof. With an appropriate command execution system, software or firmware stored in a memory can be used to implement the embodiments of the present invention. As far as the hardware is concerned, it can be accomplished by applying any of the following technologies or related combinations: a specific arithmetic logic with a logic gate that can perform logic functions based on data signals, a specific application integrated with a suitable combinational logic gate Circuit (application specific integrated circuit, abbreviated as ASIC), programmable gate array (abbreviated as PGA), or a field programmable gate array (abbreviated as FPGA), etc.
流程圖中的流程與方塊圖,示出了本發明各種實施例中的系統、方法和電腦程式產品的所可能實現的結構,功能和操作。在這方面,流程圖或方塊框圖中的每個方塊可以表示程式碼的模組,片段或者是一部分,其包含用以實現指定邏輯功能的一個或多個可執行指令。另外還應注意,方塊圖和/或流程圖圖示中的每個方塊,以及方塊間的組合,可透過可執行特定功能或操作的特 定目的硬體系統(special purpose hardware-based system)來實現,或者是由特殊功能硬體與電腦指令的軟硬組合來實現。計算機程序指令也可以存儲在計算機可讀介質中,該計算機可讀介質可以指示計算機或其他可編程數據以特定方式起作用,使得存儲在計算機可讀介質中的指令產生包括指令裝置的製品,該指令裝置實現在流程圖和/或框圖塊中指定的功能/動作。 The flow and block diagrams in the flowchart show possible structures, functions, and operations of the system, method, and computer program product in various embodiments of the present invention. In this regard, each block in the flowchart or block diagram may represent a module, segment, or part of the program code, which contains one or more executable instructions for implementing specified logical functions. In addition, it should be noted that each block in the block diagram and/or flowchart illustration, as well as the combination of blocks, can be implemented through features that can perform specific functions or operations. It is realized by a special purpose hardware-based system, or it is realized by a combination of special function hardware and computer instructions. Computer program instructions can also be stored in a computer-readable medium, which can instruct a computer or other programmable data to function in a specific manner, so that the instructions stored in the computer-readable medium produce an article including the instruction means. The instruction device implements the functions/actions specified in the flowchart and/or block diagram blocks.
以上所述僅為本發明之較佳實施例,凡依本發明申請專利範圍所做之均等變化與修飾,皆應屬本發明之涵蓋範圍。 The foregoing descriptions are only preferred embodiments of the present invention, and all equivalent changes and modifications made in accordance with the scope of the patent application of the present invention should fall within the scope of the present invention.
10:深度感測系統 10: Depth sensing system
12:投影器 12: Projector
14:感測裝置 14: Sensing device
15:讀出電路 15: readout circuit
16:處理電路 16: processing circuit
18:深度解碼電路 18: Depth decoding circuit
20:感測器 20: Sensor
100:AE控制裝置 100: AE control device
120:區塊平均值計算單元 120: Block average calculation unit
140:區塊平均差值計算單元 140: Block average difference calculation unit
160:ROI決定單元 160: ROI decision unit
180:AE控制單元 180: AE control unit
Claims (11)
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