TWI704045B - Mold cleaning device and method, resin molding device, and resin molded product manufacturing method - Google Patents
Mold cleaning device and method, resin molding device, and resin molded product manufacturing method Download PDFInfo
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- 238000004140 cleaning Methods 0.000 title claims abstract description 127
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/70—Maintenance
- B29C33/72—Cleaning
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/56—Coatings, e.g. enameled or galvanised; Releasing, lubricating or separating agents
- B29C33/58—Applying the releasing agents
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
- B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
- B29C2035/0838—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using laser
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
Abstract
本發明提供一種即便在已使成形模升溫至可進行樹脂成形的溫度的狀態下,也可以抑制由熱所產生的影響並使用的成形模清潔裝置及方法、樹脂成形裝置以及樹脂成形品製造方法。成形模清潔裝置為去除附著在構成成形模的上模及與上模相向的下模的至少任一者的表面上的附著物的裝置,包括:雷射光源,設置在上模與下模之間的空間外,射出雷射光束;雷射光束反射機構,具有反射鏡、及使反射鏡在所述空間中的第一位置與所述空間外的第二位置之間移動的XY平臺,以當反射鏡位於第一位置上時由反射鏡反射的雷射光束照射至上模或下模的表面上的方式,設定反射鏡的方向;以及雷射光束移動部,設置在所述空間外,使雷射光束相對於位於第一位置上時的反射鏡移動。The present invention provides a molding die cleaning device and method, a resin molding device, and a resin molding product manufacturing method that can suppress the influence of heat and use it even in a state where the molding die has been heated to a temperature at which resin molding can be performed . The forming mold cleaning device is a device that removes attachments on the surface of at least one of the upper mold constituting the forming mold and the lower mold facing the upper mold, and includes: a laser light source, which is set between the upper mold and the lower mold The laser beam is emitted outside the space between the two; the laser beam reflection mechanism has a reflector and an XY platform that moves the reflector between a first position in the space and a second position outside the space to When the reflector is in the first position, the laser beam reflected by the reflector is irradiated on the surface of the upper mold or the lower mold, and the direction of the reflector is set; and the laser beam moving part is arranged outside the space so that The laser beam moves relative to the mirror when it is in the first position.
Description
本發明涉及一種成形模清潔裝置及方法、樹脂成形裝置、以及樹脂成形品製造方法。The present invention relates to a molding die cleaning device and method, a resin molding device, and a resin molded product manufacturing method.
若在樹脂成形裝置中使用成形模進行樹脂成形,則在取出成形品後樹脂也略微附著在成形模的表面上而殘留,在利用相同的成形模重複進行樹脂成形的期間內附著物逐漸地增加。若在此種附著物已附著在成形模的表面上的狀態下進行樹脂成形,則存在附著物的形狀被轉印至樹脂成形品上的可能性。If a molding die is used for resin molding in a resin molding device, the resin slightly adheres to the surface of the molding die and remains after the molded product is taken out. The deposits gradually increase while the resin molding is repeated with the same molding die. . If resin molding is performed in a state where such an attached matter has adhered to the surface of the molding die, there is a possibility that the shape of the attached matter will be transferred to the resin molded product.
因此,定期地進行暫時停止樹脂成形品的製造,去除成形模的附著物的清潔。在專利文獻1中記載有如下的裝置:在構成成形模的上模與下模之間的空間內配置雷射光源,一邊使雷射光源沿著下模的上表面(或上模的下表面)移動一邊對下模(上模)照射雷射光束,由此進行將附著物從下模(上模)上剝離的處理。
[現有技術文獻]
[專利文獻]Therefore, the production of the resin molded product is temporarily stopped at regular intervals, and the cleaning is performed to remove the adhesion of the molding die.
[專利文獻1]日本專利特開2008-149705號公報[Patent Document 1] Japanese Patent Laid-Open No. 2008-149705
[發明所要解決的問題][The problem to be solved by the invention]
在樹脂成形時,為了使樹脂熔融等,必須使成形模升溫至例如180℃左右的溫度。在專利文獻1中記載的裝置中,若在已使成形模升溫的狀態下進行清潔,則由於將雷射光源或使其移動的移動裝置配置在成形模的附近(例如上模與下模的中間)來使用,因此存在因配置所述雷射光源或移動裝置的空間的熱、或來自成形模的輻射熱等熱,而產生雷射光的照射位置等的精度惡化等不良情況的擔憂。若為了避免此種不良情況而在將成形模暫時冷卻後進行清潔,則存在如下的擔憂:產生包含清潔後為了樹脂成形而再次使成形模升溫並達到穩定的溫度為止的時間在內的等待時間,在樹脂成形步驟中的產距時間(takt time)延長,樹脂成形品的製造效率下降。During resin molding, in order to melt the resin or the like, the temperature of the molding die must be raised to a temperature of, for example, about 180°C. In the device described in
本發明欲解決的問題在於提供一種即便在已使成形模升溫至可進行樹脂成形的溫度的狀態下,也可以抑制由熱所產生的影響並使用的成形模清潔裝置及方法、樹脂成形裝置、以及樹脂成形品製造方法。 [解決問題的技術手段]The problem to be solved by the present invention is to provide a molding die cleaning device and method, a resin molding device, and a resin molding device that can suppress the influence of heat and use it even in a state where the molding die has been heated to a temperature at which resin molding can be performed. And the method of manufacturing resin molded products. [Technical means to solve the problem]
本發明的成形模清潔裝置是去除附著在構成成形模的第一模及與該第一模相向的第二模的至少任一者的表面上的附著物的裝置,其特徵在於,包括: a)雷射光源,設置在所述第一模與所述第二模之間的空間外,射出所述雷射光束; b)雷射光束反射機構,具有反射鏡及反射鏡移動機構,所述反射鏡移動機構使該反射鏡在所述空間中的第一位置與所述空間外的第二位置之間移動,所述雷射光束反射機構以當該反射鏡位於所述第一位置上時由該反射鏡反射的雷射光束照射至所述第一模或所述第二模的表面上的方式,設定該反射鏡的方向;以及 c)雷射光束移動機構,設置在所述空間外,使所述雷射光束相對於位於所述第一位置上時的所述反射鏡移動。The forming mold cleaning device of the present invention is a device that removes adherents attached to the surface of at least any one of the first mold constituting the forming mold and the second mold facing the first mold, and is characterized in that it includes: a) A laser light source, which is arranged outside the space between the first mold and the second mold to emit the laser beam; b) The laser beam reflecting mechanism has a reflecting mirror and a reflecting mirror moving mechanism. The reflecting mirror moving mechanism moves the reflecting mirror between a first position in the space and a second position outside the space, so The laser beam reflection mechanism sets the reflection in such a manner that the laser beam reflected by the mirror irradiates the surface of the first mold or the second mold when the mirror is located at the first position The direction of the mirror; and c) The laser beam moving mechanism is arranged outside the space to move the laser beam relative to the reflector when it is at the first position.
本發明的成形模清潔方法是去除附著在構成成形模的第一模及與該第一模相向的第二模的至少任一者的表面上的附著物的方法,其特徵在於: 在所述第一模與所述第二模之間的空間中配置反射鏡, 從設置在所述空間外的雷射光源射出雷射光束,並一邊通過設置在所述空間外的雷射光束移動機構來使該雷射光束相對於所述反射鏡移動,一邊將該雷射光束照射至所述反射鏡上,且 將由所述反射鏡所反射的所述雷射光束照射至所述第一模或所述第二模上。The forming mold cleaning method of the present invention is a method for removing the adherents attached to the surface of at least one of the first mold constituting the forming mold and the second mold facing the first mold, and is characterized in that: Disposing a mirror in the space between the first mold and the second mold, A laser beam is emitted from a laser light source installed outside the space, and the laser beam is moved relative to the mirror by a laser beam moving mechanism installed outside the space while the laser beam The light beam irradiates the mirror, and The laser beam reflected by the mirror is irradiated onto the first mold or the second mold.
本發明的樹脂成形裝置的特徵在於包括:所述成形模、及所述成形模清潔裝置。The resin molding apparatus of the present invention is characterized by including the molding die and the molding die cleaning device.
本發明的樹脂成形品製造方法的特徵在於:在實施所述成形模清潔方法後,使用所述成形模製造樹脂成形品。 [發明的效果]The method for manufacturing a resin molded product of the present invention is characterized in that after the molding die cleaning method is implemented, the molding die is used to manufacture a resin molded product. [Effects of the invention]
根據本發明,即便在已使成形模升溫至可進行樹脂成形的溫度的狀態下,也可以抑制由熱所產生的影響並使用。According to the present invention, even in a state where the temperature of the forming mold has been raised to a temperature at which resin molding can be performed, the influence of heat can be suppressed and used.
在本發明的成形模清潔裝置中,當在暫時停止樹脂成形後對成形模進行通過照射雷射光束而進行的處理(在成形模清潔裝置中進行清潔)時,通過反射鏡移動機構來使反射鏡移動至作為第一模與第二模之間的空間中的第一位置上後,利用設置在該空間外的雷射光源對所述反射鏡照射雷射光束。由此,雷射光束由反射鏡反射而照射至第一模或第二模的表面上。此處,通過設置在所述空間外的雷射光束移動機構來使雷射光束相對於反射鏡移動,由此照射至第一模或第二模的表面上的雷射光束的光點在所述表面上移動。由此,對第一模或第二模的表面的固定的範圍內照射雷射光束。由此,對第一模或第二模實施去除(清潔)附著在這些模的表面上的附著物等處理。在成形模的處理結束後,使反射鏡移動至作為所述空間外的第二位置上後,再次開始樹脂成形。In the molding die cleaning device of the present invention, when the molding die is processed by irradiating a laser beam (cleaning in the molding die cleaning device) after the resin molding is temporarily stopped, the mirror moving mechanism is used to make the reflection After the mirror is moved to the first position in the space between the first mold and the second mold, a laser light source arranged outside the space is used to irradiate the mirror with a laser beam. Thus, the laser beam is reflected by the mirror and irradiated on the surface of the first mold or the second mold. Here, the laser beam is moved relative to the reflector by the laser beam moving mechanism provided outside the space, so that the spot of the laser beam irradiated on the surface of the first mold or the second mold is at all Move on the surface. Thus, the laser beam is irradiated within a fixed range of the surface of the first mold or the second mold. As a result, the first mold or the second mold is subjected to treatments such as removing (cleaning) deposits attached to the surfaces of these molds. After the processing of the molding die is completed, the mirror is moved to the second position outside the space, and then the resin molding is restarted.
根據本發明的成形模清潔裝置,即便是已使第一模或第二模升溫的狀態,由於雷射光源及雷射光束移動機構設置在該空間外,因此也可以抑制所述雷射光源及雷射光束移動機構受到的由該空間內的熱或者來自第一模或第二模的輻射熱等熱所產生的影響。另一方面,反射鏡雖然配置在所述空間內,但比雷射光源及雷射光束移動機構更難以受到熱的影響。因這些理由,本發明的成形模清潔裝置即便在已使成形模升溫至可進行樹脂成形的溫度的狀態下,也可以抑制由熱所產生的影響並使用。According to the forming mold cleaning device of the present invention, even in a state where the first mold or the second mold is heated, the laser light source and the laser beam moving mechanism are arranged outside the space, so that the laser light source and the laser beam moving mechanism can be suppressed. The laser beam moving mechanism is affected by heat in the space or radiant heat from the first or second mode. On the other hand, although the reflecting mirror is arranged in the space, it is less affected by heat than the laser light source and the laser beam moving mechanism. For these reasons, the molding die cleaning device of the present invention can be used while suppressing the influence of heat even in a state where the temperature of the molding die has been raised to a temperature at which resin molding can be performed.
在本發明的成形模清潔裝置中,優選所述雷射光束移動機構是振鏡掃描頭(galvano scan head)。振鏡掃描頭是通過使用一個利用一轉動軸進行轉動的鏡、或將轉動軸的傾斜度不同的兩個鏡組合使用,而使雷射光束朝一個方向或不同的兩個方向移動的裝置。由此,可使照射至第一模或第二模的表面上的雷射光束的光點呈一維狀或二維狀地移動。振鏡掃描頭可使雷射光束的光點高速地移動,因此可縮短處理時間。另外,在使雷射光束的光點移動時無需使振鏡掃描頭自身相對於成形模移動,因此可使設置空間變小。In the forming mold cleaning device of the present invention, it is preferable that the laser beam moving mechanism is a galvano scan head. The galvanometer scanning head is a device that moves the laser beam in one direction or two different directions by using a mirror that rotates by a rotating shaft or a combination of two mirrors with different inclination of the rotating shaft. Thereby, the spot of the laser beam irradiated on the surface of the first mold or the second mold can be moved one-dimensionally or two-dimensionally. The galvanometer scanning head can move the spot of the laser beam at high speed, thus shortening the processing time. In addition, there is no need to move the galvanometer scan head itself relative to the forming mold when moving the spot of the laser beam, so the installation space can be reduced.
本發明的成形模清潔裝置可采用還具有變更反射鏡的方向的反射方向變更機構這一結構。或者,本發明的成形模清潔裝置也可以采用如下的結構:所述反射鏡包含方向互不相同的第一反射鏡與第二反射鏡,所述雷射光束反射機構還包括對被照射所述雷射光束的反射鏡進行切換的鏡切換機構。在任一種情況下,均可變更雷射光束射入第一模或第二模中的角度。例如,當雷射光束朝向某一方向照射至第一模中時,在第一模的構成模腔的壁面與其雷射光束平行的情況下,通過變更入射角,可容易地對其壁面照射雷射光束。The molding die cleaning device of the present invention can be configured to further include a reflection direction changing mechanism that changes the direction of the mirror. Alternatively, the forming mold cleaning device of the present invention may also adopt the following structure: the reflecting mirror includes a first reflecting mirror and a second reflecting mirror having different directions, and the laser beam reflecting mechanism further includes A mirror switching mechanism that switches the mirror of the laser beam. In either case, the angle at which the laser beam enters the first or second mode can be changed. For example, when the laser beam is irradiated into the first mold in a certain direction, when the wall surface of the cavity constituting the first mold is parallel to the laser beam, the wall surface of the laser beam can be easily irradiated by changing the angle of incidence. Shot beam.
本發明的成形模清潔裝置可采用如下的結構,所述結構還包括:一對第一轉動軸體及第二轉動軸體,與所述反射鏡的兩側部連接;以及轉動軸體保持工具,在軸方向上可動地保持所述第一轉動軸體及所述第二轉動軸體的至少一者。由此,即便因樹脂成形時所生成的熱而導致在成形模的處理時反射鏡進行熱膨脹、或因使反射鏡移動至第二位置上時的溫度下降而導致反射鏡進行收縮,由於被轉動軸體保持工具保持的轉動軸體在軸方向上移動,而容許反射鏡在軸方向上膨脹或收縮,因此也可以抑制反射鏡的變形。另外,可以將第一轉動軸體與第二轉動軸體兩者分別在軸方向上可動地保持在轉動軸體保持工具上,也可以將第一轉動軸體與第二轉動軸體的另一者(容許環繞轉動軸進行轉動)固定在軸方向上。The forming mold cleaning device of the present invention may adopt the following structure, the structure further comprising: a pair of first rotating shafts and second rotating shafts connected to both sides of the reflecting mirror; and rotating shaft holding tools , Movably holding at least one of the first rotating shaft body and the second rotating shaft body in the axial direction. As a result, even if the heat generated during resin molding causes the mirror to thermally expand during the processing of the molding die, or the temperature drops when the mirror is moved to the second position, the mirror shrinks and is rotated. The rotating shaft held by the shaft holding tool moves in the axial direction, and allows the mirror to expand or contract in the axial direction, so that the deformation of the mirror can also be suppressed. In addition, both the first rotating shaft and the second rotating shaft may be held on the rotating shaft holding tool movably in the axial direction, or the other of the first rotating shaft and the second rotating shaft may be Those (allowing rotation around the axis of rotation) are fixed in the direction of the axis.
本發明的成形模清潔裝置是去除附著在對表面的至少一部分施加了塗層的所述成形模上的附著物的裝置,理想的是所述雷射光源及所述雷射光束移動機構是以如下的照射強度將雷射光束照射至所述成形模上者,所述照射強度是在所述附著物上生成了等離子體後可將該等離子體加熱至所述附著物氣化的溫度以上的溫度的照射強度,且為比對所述塗層造成損傷的照射強度低的照射強度。The forming mold cleaning device of the present invention is a device that removes the attachments attached to the forming mold coated on at least a part of the surface. It is desirable that the laser light source and the laser beam moving mechanism are The following irradiation intensity irradiates the laser beam to the forming mold, and the irradiation intensity is such that after plasma is generated on the attachment, the plasma can be heated to a temperature above the vaporization temperature of the attachment The irradiation intensity of temperature is lower than the irradiation intensity that damages the coating.
由此,附著物的至少一部分,其被加熱至所述附著物氣化的溫度以上的溫度而氣化,並被從成形模的表面上去除。另一方面,在多數情況下,對成形模的表面施加了包含鉻等的塗層(另外,在本發明中,成形模的塗層的材料並無特別限定),在去除附著物時必須抑制此塗層損傷。為了獲得關於雷射光束對成形模的塗層造成的損害的知識,本發明者通過觀察成形模的表面來調查附著物的形成過程的結果,已明確附著物最初呈點狀地附著,其後逐漸地接近覆蓋成形模的模腔面的大致整個面的皮膜狀的形狀(在圖1(a)、圖1(b)、圖1(c)、圖1(d)及圖1(e)的電子顯微鏡照片中,附加符號A來表示附著物)。因此,當在附著物為點狀的階段照射了雷射光束時,由於存在點狀或面積未充分地擴大的附著物的間隙(附著物未附著的部分),因此雷射光束直接照射至塗層上,由此存在對塗層造成損害的擔憂。因此,通過以比對塗層造成損傷的照射強度低的照射強度將雷射光束照射至成形模上,可抑制塗層受到的損害。As a result, at least a part of the attached matter is heated to a temperature higher than the temperature at which the attached matter is vaporized and vaporized, and is removed from the surface of the forming mold. On the other hand, in most cases, a coating containing chromium or the like is applied to the surface of the forming mold (in addition, in the present invention, the material of the coating of the forming mold is not particularly limited), and it is necessary to suppress the removal of deposits. This coating is damaged. In order to obtain knowledge about the damage caused by the laser beam to the coating of the forming mold, the inventors observed the surface of the forming mold to investigate the formation process of the deposits. It was found that the deposits first adhered in dots, and then Gradually approach the film-like shape covering almost the entire surface of the cavity surface of the molding die (in Figure 1(a), Figure 1(b), Figure 1(c), Figure 1(d)) and Figure 1(e) In the electron micrograph of, the symbol A is added to indicate attachment). Therefore, when the laser beam is irradiated at the stage where the attachment is dotted, there is a gap (the part where the attachment is not attached) of the dot or the area is not sufficiently enlarged, so the laser beam is directly irradiated to the coating. On the layer, there is therefore a concern about damage to the coating. Therefore, by irradiating the laser beam to the forming mold with an irradiation intensity lower than the irradiation intensity that causes damage to the coating, damage to the coating can be suppressed.
此處,照射至成形模上的雷射光束的照射強度可通過以調整從雷射光源中射出的雷射光束的強度及利用雷射光束移動機構的雷射光束的移動速度,例如每一秒的掃描雷射光功率密度變成2 W/cm2~15 W/cm2,的方式來決定。“每一秒的掃描雷射光功率密度”由在單位時間(單位:sec(秒))內照射至單位面積(單位:cm2)上的雷射光的能量(單位:J(焦耳)=Wsec(瓦秒))來定義,其單位由J/(cm2sec)=Wsec/(cm2sec),即W/cm2來表示。此每一秒的掃描雷射光功率密度可通過如下方式來求出:使進行照射的雷射光束的平均輸出功率除以根據在一秒內雷射光束的光點相對於成形模進行相對移動的距離和所述光點的寬度所導出的面積與單個光點(照射至移動前的初始位置上的部分)的面積的和(換言之,每一秒的掃描雷射光功率密度是在一秒內雷射光束一邊移動一邊照射的部分中的每單位面積的輸出功率)。Here, the intensity of the laser beam irradiated on the forming mold can be adjusted to adjust the intensity of the laser beam emitted from the laser light source and the moving speed of the laser beam using the laser beam moving mechanism, for example, every second The power density of the scanning laser becomes 2 W/cm2~15 W/cm2. "Scanning laser light power density per second" is defined by the energy (unit: J (joule) = Wsec (watts) of laser light irradiated to a unit area (unit: cm2) in a unit time (unit: sec (second)) Second)), and the unit is represented by J/(cm2sec)=Wsec/(cm2sec), that is, W/cm2. The scanning laser light power density per second can be obtained by the following method: dividing the average output power of the irradiated laser beam by the relative movement of the laser beam spot relative to the forming mold in one second The sum of the area derived from the distance and the width of the light spot and the area of a single light spot (the part irradiated to the initial position before movement) (in other words, the power density of the scanning laser light per second is the laser light power density in one second). The output power per unit area in the part irradiated while the beam is moving).
在將每一秒的掃描雷射光功率密度設為2 W/cm2~15 W/cm2的情況下,理想的是雷射光源射出每一個脈衝的雷射光能量密度(laser fluence)為0.04 J/cm2~0.7 J/cm2的脈衝雷射光束。另外,在將每一秒的掃描雷射光功率密度設為2 W/cm2~15 W/cm2的情況下,理想的是將鄰接脈衝雷射光束的重疊率(後述)設為85%以上。通過采用所述任一者或兩者的結構,可在已附著在成形模的表面上的附著物上生成等離子體,並將等離子體加熱至各種種類的附著物氣化的溫度以上的溫度。When the power density of the scanning laser light per second is set to 2 W/cm2~15 W/cm2, it is ideal that the laser light energy density (laser fluence) of each pulse emitted by the laser light source is 0.04 J/cm2 ~0.7 J/cm2 pulsed laser beam. In addition, when the power density of the scanning laser light per second is 2 W/cm 2 to 15 W/cm 2, it is desirable to set the overlap rate of adjacent pulsed laser beams (described later) to 85% or more. By adopting either or both of the above-mentioned structures, plasma can be generated on the deposits that have adhered to the surface of the forming mold, and the plasma can be heated to a temperature higher than the temperature at which various kinds of deposits are vaporized.
此處,“重疊率”由在生成等離子體的空間中,一個脈衝雷射光束所占的體積之中,與鄰接地生成的脈衝雷射光束互相重疊的部分的體積的比例來定義。若鄰接的兩個脈衝雷射光束平行,則重疊率可由生成等離子體的空間中的任意的位置上的一個脈衝雷射光束的和其垂直的剖面之中,與鄰接地生成的脈衝雷射光束的和其垂直的剖面互相重疊的部分的面積的比例來求出。重疊率的倒數相當於照射至同一部位上的脈衝雷射光束的次數。另外,假如不使脈衝雷射光束移動,則重疊率變成100%,但在本發明中使脈衝雷射光束移動,因此重疊率未滿100%。Here, the "overlap ratio" is defined by the ratio of the volume of the portion of the space where the plasma is generated that overlaps with the adjacently generated pulsed laser beam among the volume occupied by one pulsed laser beam. If two adjacent pulsed laser beams are parallel, the overlap ratio can be determined by a pulsed laser beam at an arbitrary position in the plasma generating space and a cross-section perpendicular to the pulsed laser beam. The ratio of the area of the overlapped part of the vertical cross-section is calculated. The reciprocal of the overlap ratio corresponds to the number of pulse laser beams irradiated to the same part. In addition, if the pulse laser beam is not moved, the overlap rate becomes 100%, but in the present invention, the pulse laser beam is moved, so the overlap rate is less than 100%.
在本發明的成形模清潔裝置中,理想的是所述雷射光束移動機構是如下的機構:使所述雷射光束相對於所述成形模在第一方向上往返移動,並且每當使該雷射光束在所述第一方向上進行單程移動時,在垂直於該第一方向的第二方向上,使該雷射光束僅移動該雷射光束照射至所述成形模上的光點的單個範圍;且在所述雷射光束移動機構與所述成形模之間,還包括遮蔽所述第一方向上的往返移動的兩端的所述光點的單個範圍的部分的遮蔽部。由此,在所述兩端中,當雷射光束在第二方向上移動時,遮蔽部遮蔽與所述兩端以外的位置相比過度地照射的雷射光束,因此能夠以更高的均勻性對成形模的表面進行清潔。In the forming mold cleaning device of the present invention, it is desirable that the laser beam moving mechanism is a mechanism that makes the laser beam move back and forth in the first direction relative to the forming mold, and whenever the laser beam is moved When the laser beam moves in a single pass in the first direction, in a second direction perpendicular to the first direction, the laser beam is only moved by the laser beam irradiated to the light spot on the forming mold A single range; and between the laser beam moving mechanism and the forming die, it further includes a shielding portion that shields a portion of the single range of the light spot at both ends of the reciprocating movement in the first direction. Thus, in the two ends, when the laser beam moves in the second direction, the shielding section shields the laser beam that is excessively irradiated compared to the positions other than the two ends, so that it can be more uniform It can clean the surface of the forming mold.
到此為止,對本發明的成形模清潔裝置進行了說明,但成形模清潔方法、樹脂成形裝置、以及樹脂成形品製造方法也取得相同的作用·效果。Up to this point, the molding die cleaning device of the present invention has been described, but the molding die cleaning method, the resin molding apparatus, and the resin molded product manufacturing method also achieve the same actions and effects.
以下,一邊參照圖2~圖23(d),一邊對本發明的成形模清潔裝置及方法、樹脂成形裝置、以及樹脂成形品製造方法的更具體的實施方式進行說明。Hereinafter, with reference to FIGS. 2 to 23(d), more specific embodiments of the molding die cleaning apparatus and method, the resin molding apparatus, and the resin molded product manufacturing method of the present invention will be described.
(1)本實施方式的成形模清潔裝置及樹脂成形裝置的結構
如圖2所示,本實施方式的成形模清潔裝置10是本實施方式的樹脂成形裝置1的構成元件的一部分。樹脂成形裝置1同時具有成形模清潔裝置10與樹脂成形部20。(1) The structure of the mold cleaning device and the resin molding device of this embodiment
As shown in FIG. 2, the molding
首先,對樹脂成形部20的結構進行說明。在本實施方式中,樹脂成形部20是進行轉送(轉注)成形的裝置,包括:基座211;四根(在圖2中僅表示兩根)系杆(tie bar)212,立設在基座211上;可動台板221,以可上下移動的方式保持在系杆212上;固定台板222,固定在系杆212的上端;以及曲柄連杆(toggle link)213,設置在基座211上,使可動台板221上下移動。在可動台板221的上表面與固定台板222的下表面之間,配置有將上模(第一模)251與下模(第二模)252相向地設置的成形模25。First, the structure of the resin molded
圖3中將成形模25及其附近放大表示。在上模251的下表面上,朝上方並列形成有兩個模腔C,在下模252的上表面上,也朝下方並列形成有兩個模腔C。在上模251的下表面、下模252的上表面、以及包圍各模腔C的上模251及下模252的面上施加了氮化鉻制的塗層CT。在塗層CT中,也可以使用硬鉻等其他材料來代替氮化鉻。在本實施方式中,將模腔設為長方體狀,但也可以對應於將要製造的樹脂成形品的形狀而設為圓柱狀等形狀。In FIG. 3, the molding die 25 and its vicinity are enlarged and shown. On the lower surface of the
位於下模252的兩個模腔C的周圍的下模252的上表面分別可載置引線框架L。另外,也可以在下模252的上表面上載置基板等來代替引線框架L。The upper surface of the
在下模252的兩個模腔C之間,設置有收容樹脂材料的料筒2521及從料筒2521擠出樹脂材料的柱塞2522。另外,下模252的兩個模腔C分別通過作為如後述那樣進行了軟化或熔融的樹脂材料穿過的通道的流道(runner)2523而與料筒2521連接。在上模251的兩個模腔C之間且在與料筒2521相向的位置上設置有剔除塊(cull block)2511。上模251的兩個模腔C分別通過流道2513而與剔除塊2511的正下方的空間連接。Between the two cavities C of the
另外,樹脂成形部20具有使上模251及下模252升溫而在樹脂成形時將引線框架L及樹脂材料維持成規定的溫度的加熱板253。在加熱板253中內置有加熱器2531。加熱器2531例如可使用筒形加熱器(cartridge heater)。In addition, the
成形模清潔裝置10具有雷射光源11、雷射光束移動部(雷射光束移動機構)12、反射鏡13、XY平臺14、及XY平臺驅動器15。The molding die
雷射光源11是射出脈衝雷射光的光源。在本實施方式中,雷射光源11射出的脈衝雷射光因後述的理由,而將每一個脈衝的雷射光能量密度設為0.04 J/cm2~0.7 J/cm2的範圍內,將每一秒的掃描雷射光功率密度設為2 W/cm2~15 W/cm2的範圍內,將脈衝寬度設為1 nsec~200 nsec的範圍內,將脈衝重複頻率設為300 kHz~10 MHz的範圍內。另外,在本實施方式中,雷射光源11使用如下者:以在與光束垂直的剖面中的形狀(光束光點)變成正方形的方式成形,並且射出從所述剖面的中央至端部為止具有大致相等的禮帽(top hat)型的照射強度分布的脈衝雷射光束。另外,光束光點的形狀也可以是長方形、圓形、圓環狀等正方形以外的形狀。此處,光束光點的範圍(尺寸)由1/e2法(86%法)來定義。光點尺寸可通過奧菲爾(Ophir)公司、或相干(Coherent)公司製造的相機式光束質量分析儀(beam profiler)來測定。另外,可使用奧菲爾公司、或相干公司製造的功率計,求出雷射光束的平均輸出功率,並根據光點尺寸及雷射光束的平均輸出功率來求出每一秒的掃描雷射光功率密度。每一個脈衝的雷射光能量密度是使所述雷射光束的平均輸出功率除以脈衝重複頻率所得的值。脈衝寬度可使用安捷倫科技(Agilent Technologies)公司製造的示波器來測定。另外,雷射光束的平均輸出功率可通過“雷射光束的平均輸出功率[W]=脈衝能量[J]×脈衝重複頻率[Hz]”的式子來求出。The
雷射光束移動部12具有振鏡掃描頭121與透鏡122(參照圖4(a)及圖4(b))。振鏡掃描頭121使從雷射光源11導入的脈衝雷射光束B以在X方向(圖2的與紙面垂直的方向)上重複往返移動(圖4(a)),並且也在Z方向(圖2的縱向)上移動(圖4(b))的方式射出。在本實施方式中,以重疊率變成85%以上的方式設定利用雷射光束移動部12的脈衝雷射光束的移動速度。在所述移動時,存在光點尺寸根據脈衝雷射光束B的移動範圍的大小而在中心位置附近與端部附近變化的可能性,若如此變化,則照射強度根據位置而變化。因此,理想的是通過使透鏡122采用遠心透鏡(telecentric lens)或照射深度足夠長的透鏡,而抑制由位置所引起的光點尺寸的變化。另外,在圖4(a)及圖4(b)所示的例子中,在振鏡掃描頭121的後段配置透鏡122,但也可以在振鏡掃描頭121的前段配置具有多片透鏡的電動式光束直徑可變透鏡(省略圖示),也可以並用透鏡122與電動式光束直徑可變透鏡。在使用電動式光束直徑可變透鏡的情況下,通過使光束直徑對照所述重複往返移動而變化,可使成形模25的表面上的光點尺寸變成大致固定。The laser
反射鏡13是反射脈衝雷射光束B的鏡,在X方向上具有比雷射光束移動部12使脈衝雷射光束B往返移動的範圍大的寬度。例如可將包含合成石英玻璃(熔融二氧化矽)的鏡用於反射鏡13。另外,也可以在反射鏡13的表面上施加包含金屬膜的塗層。作為此種塗層,只要從金制的塗層、銀制的塗層、鋁制的塗層、電介質多層膜等中選擇最合適者即可。The
如圖5所示,反射鏡13的X方向的一端由第一握持工具131L握持,另一端由第二握持工具131R握持。在第一握持工具131L、第二握持工具131R上分別設置有在X方向上延長的第一轉動軸體132L、第二轉動軸體132R。第一轉動軸體132L插通在軸承133L中。另外,第二轉動軸體132R插通在轉動軸體可動保持工具133R中。轉動軸體可動保持工具133R也可以是軸承。另外,在圖5中,在立體圖中,將穿過第一轉動軸體132L及第二轉動軸體132R的Z方向的剖面合並表示,並且關於反射鏡13,以實線來表示與所述剖面相比Y方向的裏側,以虛線來表示跟前側(即,在所述虛線的部分中也存在反射鏡13)。As shown in FIG. 5, one end of the
如在圖6(a)中放大表示那樣,在與軸承133L相比轉動軸方向的外側(X方向上反射鏡13的相反側)的第一轉動軸體132L的表面上,設置有繞轉動軸一圈的槽1321L。第一固定工具135L嵌入槽1321L中。另外,第一固定工具135L只要從槽1321L延伸出即可,外徑比軸承133L小。軸承133L通過第一轉動軸體132L由以其直徑不同的方式形成的段差與第一固定工具135L在軸方向上夾持的方式,並容許第一轉動軸體132L環繞X方向的轉動軸進行轉動,且經由軸承133L而以在與所述轉動軸平行的方向上幾乎不移動的方式限制第一轉動軸體132L。軸承133L被軸承保持部134L與從反射鏡13來看設置在所述軸承保持部134L的外側的軸承固定工具137L夾持而得到固定。As shown in enlargement in FIG. 6(a), on the surface of the first
另外,如在圖6(b)中放大表示那樣,在與轉動軸體可動保持工具133R相比轉動軸方向的外側的第二轉動軸體132R的表面上設置有槽1321R。第二固定工具135R嵌入槽1321R中。另外,第二固定工具135R無需遍及槽1321R的整體來設置。轉動軸體可動保持工具133R通過第二轉動軸體132R由以其直徑不同的方式形成的段差與第二固定工具135R在軸方向上夾持的方式,而在軸方向上固定與第二轉動軸體132R的位置關係,並以容許第二轉動軸體132R環繞X方向的轉動軸進行轉動的方式保持所述第二轉動軸體132R。轉動軸體可動保持工具133R由外側保持工具134R保持,且相對於所述外側保持工具134R,可與第二轉動軸體132R一同在軸方向上移動。圖6(c)中表示與圖6(b)的情況相比反射鏡13膨脹,伴隨於此,第二轉動軸體132R及轉動軸體可動保持工具133R已朝反射鏡13的相反側移動的狀態的例子。通過第二轉動軸體132R及轉動軸體可動保持工具133R如所述那樣進行移動,可抑制施加至反射鏡13中的負荷,而抑制反射鏡13的變形。當反射鏡13進行收縮時,第二轉動軸體132R及轉動軸體可動保持工具133R朝相反方向移動,由此可抑制反射鏡13的變形。另外,也可以將使轉動軸體可動保持工具133R、外側保持工具134R及第二固定工具135R合並而成者看作轉動軸體可動保持工具。In addition, as shown in an enlarged view in FIG. 6( b ), a groove 1321R is provided on the surface of the second
此處,通過第一固定工具135L以及由軸承保持部134L及軸承固定工具137L固定的軸承133L,以在與轉動軸平行的方向上幾乎不移動的方式限制一對轉動軸體中的一者(第一轉動軸體132L),但也可以通過轉動軸體可動保持工具及夾具,使兩個轉動軸體在與轉動軸平行的方向上,在固定的範圍內可動。Here, by the
如圖7(a)所示,第一握持工具131L與第二握持工具131R在反射鏡13的背面側(圖5中所示的反射鏡13的背後側),通過兩根軸138(圖5中省略圖示)來連結。軸138固定在第一握持工具131L上,相對於此,經由滑動軸承(襯套)139而安裝在第二握持工具131R上。軸138除具有減少反射鏡13轉動時在反射鏡13中產生的扭轉等負荷的作用以外,具有在組裝時,使第一轉動軸體132L與第二轉動軸體132R的旋轉軸中心對準的作用。圖7(b)中表示與圖7(a)的情況相比反射鏡13膨脹,且伴隨於此,第二握持工具131R已朝反射鏡13的相反側移動的狀態的例子。通過第二握持工具131R如所述那樣進行移動,可抑制施加至反射鏡13中的負荷,而抑制反射鏡13的變形。當反射鏡13進行收縮時,第二握持工具131R朝相反方向移動,由此可抑制反射鏡13的變形。As shown in Fig. 7(a), the
在反射鏡13中,進而經由例如齒輪、或滑輪及傳送帶等動力傳遞機構(省略圖示)而連接有使該反射鏡13環繞轉動軸進行旋轉的馬達(反射方向變更機構)136(參照圖2)。動力傳遞機構通常對軸承保持部134L或外側保持工具134R的至少一者發揮作用。從動力傳遞機構傳遞至軸承保持部134L及外側保持工具134R的一者中的動力經由反射鏡13而傳遞至另一者中。此時,軸138以減少施加至反射鏡13中的扭轉等負荷的方式工作,因此即便在反射鏡13的厚度不足夠厚的情況下,也可以抑制變形。當通過馬達136而使反射鏡13的反射面向下且相對於Y軸傾斜了45°時,脈衝雷射光束B垂直地照射至下模252的表面上。另外,當反射鏡13的反射面向上且相對於Y軸傾斜了45°時,脈衝雷射光束B垂直地照射至上模251的表面上。另一方面,當反射鏡13的反射面向下或向上且以45°以外的角度相對於Y軸進行了傾斜時,脈衝雷射光束B以相對於下模252或上模251的表面傾斜的角度進行照射。The
雷射光源11、雷射光束移動部12及反射鏡13安裝在XY平臺14上。XY平臺14通過XY平臺驅動器15的控制,而使所述雷射光源11、雷射光束移動部12及反射鏡13一邊維持所述三個構成元件的相對的位置關係,一邊在X方向及Y方向上移動。在清潔時,反射鏡13等通過此XY平臺14,而在X方向及Y方向上分別在比上模251及下模252的X方向及Y方向的寬度略大的範圍內移動。與此同時,XY平臺14也具有使成形模清潔裝置10的位置以如下方式在Y方向上移動的功能:在清潔時將反射鏡13配置在位於上模251與下模252之間的空間內的使用位置(圖8(a))上,在樹脂成形時將包含反射鏡13的成形模清潔裝置10的整體配置在作為所述空間外的位置的待機位置(圖8(b))上。The
XY平臺14為了一邊維持雷射光源11、雷射光束移動部12及反射鏡13的相對的位置關係,一邊使雷射光源11、雷射光束移動部12及反射鏡13在X方向上移動,如圖9所示,也可以通過在Y方向上延長的連結棒141來將雷射光源11及雷射光束移動部12與反射鏡13連結。此處,雷射光源11及雷射光束移動部12載置在底座112上,且將連結棒141固定在此底座112上。在反射鏡13側,將連結棒141固定在軸承保持部134L及外側保持工具134R上。在這些軸承保持部134L及外側保持工具134R中,設置有在與第一轉動軸體132L及第二轉動軸體132R相同的方向上延長的孔(未圖示),反射鏡13及作為其附屬品的軸承保持部134L或外側保持工具134R沿著插通在此孔中的引導棒142而在Y方向上移動。通過此種結構,可僅通過一個動力源(未圖示)來使在Y方向上分開配置的雷射光源11及雷射光束移動部12與反射鏡13在X方向上移動。通過如所述那樣減少動力源的數量,而抑制動力源從成形模受到的由熱所產生的影響,因此也可以減少對所述動力源進行冷卻的冷卻機構(未圖示)的數量。In order to maintain the relative positional relationship of the
另外,當上模251與下模252的X方向的寬度比利用雷射光束移動部12的脈衝雷射光束B的往返移動的範圍小時,也可以使用僅使所述三個構成元件在Y方向上移動的機構來代替XY平臺14及XY平臺驅動器15。或者,也可以不必維持雷射光源11及雷射光束移動部12與反射鏡13的Y方向的相對的位置關係,而僅使反射鏡13在Y方向上移動。另外,如圖10所示,當使用X方向的寬度比成形模25的X方向上的雷射光束的照射範圍大的反射鏡13W時,只要僅使雷射光源11及雷射光束移動部12在Y方向上移動即可,無需使反射鏡13W在X方向上移動。In addition, when the width of the
成形模清潔裝置10除所述各構成元件以外,也可以具有在上模251及下模252之間的空間內抽吸氣體並朝樹脂成形裝置1外排出的氣化附著物去除部(省略圖示)。在此情況下,也可以在氣化附著物去除部中進而設置氣化附著物捕獲過濾器(省略圖示)。In addition to the above-mentioned components, the molding
(2)本實施方式的成形模清潔裝置及樹脂成形裝置的動作、以及本實施方式的成形模清潔方法及樹脂成形品製造方法對本實施方式的成形模清潔裝置10及樹脂成形裝置1的動作、以及本實施方式的成形模清潔方法及樹脂成形品製造方法進行說明。以下,首先對由樹脂成形裝置1中的樹脂成形部20所進行(除成形模的清潔的動作以外)的樹脂成形時的動作進行說明,其次對樹脂成形裝置1中的成形模清潔裝置10的動作進行說明。所述成形模清潔裝置10的動作相當於本發明的成形模清潔方法的實施方式。另外,將樹脂成形部20的動作與成形模清潔裝置10的動作組合而成者相當於本發明的樹脂成形品製造方法的實施方式。(2) The actions of the molding die cleaning device and resin molding apparatus of this embodiment, and the actions of the molding die cleaning method and resin molded product manufacturing method of this embodiment to the molding
(2-1)由樹脂成形部20所進行的樹脂成形時的動作
使用圖11(a)及圖11(b),對通過樹脂成形部20來製造樹脂成形品時的動作進行說明。當製造樹脂成形品時,事先通過XY平臺14來使成形模清潔裝置10的整體移動至待機位置(圖8(b))上。如所述那樣,待機位置是上模251與下模252之間的空間外的位置,成形模清潔裝置10不會妨礙製造樹脂成形品時的樹脂成形部20的動作。(2-1) Actions during resin molding by the
首先,使可動台板221下降,由此變成使上模251與下模252上下分離的開模的狀態(圖11(a))。在此狀態下,將在上表面及下表面上安裝有電子零件的引線框架L以使所述電子零件與模腔C的橫向的位置對準的方式,載置在下模252的上表面上。另外,利用未圖示的樹脂材料供給機構將板狀的樹脂材料P供給至料筒2521內。樹脂材料P例如為含有熱硬化性樹脂(環氧系樹脂等)的複合材料。在樹脂材料P中,也可以包含蠟(高級脂肪酸酯等)、硬化促進劑(磷系催化劑、氨基系催化劑等)、偶聯劑、著色劑、阻燃劑、阻燃助劑等。樹脂材料供給機構是在以前的樹脂成形裝置中廣泛使用者,而省略詳細的說明。樹脂材料P內的熱硬化性樹脂通過從加熱板253供給的熱而在料筒2521內軟化或熔融。上模251也通過加熱板253而變成已升溫至規定的溫度的狀態。First, by lowering the
在料筒2521內的熱硬化性樹脂軟化或熔融後,通過曲柄連杆213來使可動台板221上升(圖11(b))。由此,可動台板221上的下模252經由引線框架L而抵接在上模251上並按壓所述上模251,由於上模251被固定在固定台板222上,因此成形模25被合模。在此狀態下使柱塞2522上升,由此將料筒2521內的樹脂材料P經由流道2513及流道2523而供給至上模251及下模252的模腔C中。若經過規定時間,則樹脂材料P內的熱硬化性樹脂硬化,可獲得引線框架L上樹脂成形後的樹脂成形品。其後,通過曲柄連杆213來使可動台板221下降,由此將成形模25開模,並從成形模25上卸下樹脂成形品。After the thermosetting resin in the
通過重複進行到此為止的動作,可製造許多樹脂成形品。但是,在重複進行樹脂成形品的製造的期間內,樹脂材料P中所含有的熱硬化性樹脂或填料等的一部分逐漸地附著在成形模25的表面上。因此,每製造規定個數的樹脂成形品、或每規定時間,使成形模清潔裝置10如以下所述那樣進行動作,由此對成形模25的表面進行清潔。By repeating the operations so far, many resin molded products can be manufactured. However, during the repeated production of the resin molded product, a part of the thermosetting resin or filler contained in the resin material P gradually adheres to the surface of the molding die 25. Therefore, every time a predetermined number of resin molded products are manufactured or every predetermined time, the molding
(2-2)成形模清潔裝置10的動作
首先,在成形模25已開模的狀態下,通過XY平臺14來使成形模清潔裝置10移動至使用位置(圖8(a))上,即以將反射鏡13配置在上模251與下模252之間的方式使成形模清潔裝置10移動(參照圖2)。此時,反射鏡13的反射面可以是向上及向下的任一種狀態,在前者的情況下首先對上模251進行清潔,在後者的情況下首先對下模252進行清潔。以下,將此時間點的反射鏡13為如圖2及圖4(b)中由實線所示那樣反射面向下的情況作為例子進行說明。附著在成形模25上的附著物含有樹脂材料P、基板或引線框架中所包含的任一種材料·成分。另外,存在附著物也附著在分模面(上模251的下表面及下模252的上表面)或流道等樹脂通道上的情況,而存在這些附著物阻礙連續成形的擔憂。(2-2) Action of the forming
在此狀態下,雷射光源11以所述脈衝重複頻率射出具有所述每一個脈衝的雷射光能量密度及脈衝寬度的脈衝雷射光束B。由此,脈衝雷射光束B由反射鏡13反射90°後照射至下模252的表面上。此時,雷射光束移動部12如在圖4(a)的平面圖及圖4(b)的側面圖中概念性地表示那樣,使脈衝雷射光束B在X方向上在規定範圍(圖4(a)中的XL與XR之間的範圍)內重複往返移動,且每當在X方向上進行一次單程移動時,在Z方向上使脈衝雷射光束B的光點BS單個單個地在規定範圍(圖4(b)中的ZT與ZB之間的範圍)內移動。由此,在下模252的表面上,首先,脈衝雷射光束B的光點在X方向上僅移動所述規定範圍(圖4(a))。其後,若脈衝雷射光束B在Z方向上僅移動光點BS的單個範圍,則脈衝雷射光束B由反射鏡13反射90°後在下模252的表面上產生的光點BS在Y方向上僅移動光點的單個範圍(圖4(b))。由此,下模252的表面上的光點BS重複如下的鋸齒形的移動:在X方向上進行單程移動,繼而在Y方向上僅移動光點BS的單個範圍,然後在X方向上朝與剛才相反的方向移動(圖12)。In this state, the
通過光點BS如所述那樣呈鋸齒形地移動,脈衝雷射光束B照射至下模252的表面的一部分或全部的範圍內。此處,在脈衝雷射光束B僅照射至下模252的表面的一部分上的情況下,在利用一次的鋸齒形移動的脈衝雷射光束B的照射結束後,XY平臺14使反射鏡13移動至下模252的表面中的尚未照射到脈衝雷射光束B的區域上。另外,在搭載了具有足夠的可動距離的電動光束直徑可變透鏡的情況下,可通過內部的透鏡來調整光點尺寸,因此也可以將雷射光束移動部12設為僅包含XY平臺14的結構。而且,通過與所述相同的方法,使脈衝雷射光束B一邊進行鋸齒形移動一邊照射至該區域中。通過重複以上的動作,而對下模252的整個表面照射脈衝雷射光束B。在圖13中,以細實線來例示下模252的表面上的脈衝雷射光束B的鋸齒形的軌跡,並且以粗虛線來例示利用一次的鋸齒形移動的脈衝雷射光束B的照射區域的邊界。As the light spot BS moves in a zigzag shape as described above, the pulsed laser beam B is irradiated to a part or all of the surface of the
其後,使反射鏡13轉動,由此將反射面從向下切換成向上。而且,與下模252的情況同樣地,也對上模251的表面照射脈衝雷射光束B。Thereafter, the reflecting
在本實施方式的成形模清潔裝置10中,將每一個脈衝的雷射光能量密度為0.04 J/cm2~0.7 J/cm2的範圍內的脈衝雷射光束B照射至成形模25(上模251及下模252)的表面上,由此在成形模25的表面上生成等離子體PL(圖14(a))。等離子體PL的產生源並無特別限定,但通過將脈衝雷射光束B照射至附著物上,附著物AG的表面附近變成高溫·高壓狀態,而可產生等離子體PL。而且,使具有與所述相同的雷射光能量密度的脈衝雷射光束B以重疊率變成85%以上的方式移動,由此所述脈衝雷射光束B對等離子體PL中的同一部位照射六次以上,由此將等離子體PL加熱至可使在通常的樹脂成形中附著在成形模25的表面上的附著物A含有的樹脂氣化的溫度為止(圖14(b))。由此,成形模25的表面上的附著物A的至少一部分氣化,並被從所述表面上去除。此時,來自由等離子體PL進行了加熱的塗層CT的傳熱、由放射(輻射)所產生的熱也可以從塗層CT側作用於附著物AG上。另外,在脈衝雷射光束B移動的範圍中的X方向的兩端部,即未滿一個脈衝雷射光束B的X方向的寬度(例如,在重疊率為85%的情況下為所述寬度的17/20)的部分中,脈衝雷射光束B照射的次數可能未滿六次,但通常所述寬度足夠小,在其周圍受到了加熱的等離子體PL流入所述部分中,因此不會成為問題。當成形模清潔裝置10具有氣化附著物去除裝置時,從成形模25的表面附近抽吸去除已氣化的附著物AG。In the forming
在如所述那樣上模251及下模252通過加熱板253而升溫的狀態下,上模251與下模252之間的空間可能變成高溫。但是,在本實施方式的成形模清潔裝置10中,將容易因熱而受到不良影響的雷射光源11及雷射光束移動部12配置在所述空間外,並且反射鏡13雖然配置在所述空間內,但比雷射光源11及雷射光束移動部12更不易因熱而受到影響。因此,本實施方式的成形模清潔裝置10即便在如所述那樣的高溫下也可以使用。In the state where the
反射鏡13因配置在所述空間內而進行熱膨脹。但是,由於容許第二轉動軸體132R在與轉動軸平行的方向上,移動至第二握持工具131R抵接在外側保持工具134R上為止,因此可抑制反射鏡13因熱膨脹而變形。另外,軸138伴隨反射鏡13的熱膨脹而在滑動軸承139中滑動,由此在軸方向上移動,因此可對反射鏡13施加力來抑制使反射鏡13變形。進而,當在成形模清潔裝置10的結束後使反射鏡13朝所述空間外退出時,反射鏡13伴隨溫度的下降而進行收縮,但此時,由於容許第二轉動軸體132R在與轉動軸平行的方向上移動,因此也可以抑制反射鏡13的變形。The reflecting
進而,在本實施方式的成形模清潔裝置10中,如所述那樣通過在產生了等離子體PL後對所述等離子體PL進行加熱,並利用其熱使附著物A的至少一部分氣化這一工藝來去除附著物A,由此與通過將照射強度(雷射光能量密度、雷射光功率密度)更大的雷射光束直接照射至附著物A上來去除附著物A的情況相比,可抑制對成形模25的塗層CT造成的損害。Furthermore, in the forming
在使用使脈衝雷射光束振蕩的雷射光源11及雷射光束移動部12的情況下,為了更確實地從成形模25的表面上去除附著物,且進一步抑制包含氮化鉻或硬鉻等的塗層受到的損害,理想的是脈衝寬度為50 nsec~120 nsec,每一個脈衝的雷射光能量密度為0.1 J/cm2~0.6 J/cm2,重疊率為90%以上,每一秒的掃描雷射光功率密度為3 W/cm2~11 W/cm2。In the case of using the
另外,在使用使脈衝雷射光束振蕩的雷射光源11及雷射光束移動部12的情況下,為了更確實地從成形模的表面上去除附著物,且進一步抑制包含氮化鉻或硬鉻等的塗層受到的損害,也可以采用如下的結構:所述脈衝寬度為50 nsec~120 nsec,所述每一個脈衝的雷射光能量密度為0.04 J/cm2~0.1 J/cm2,所述重疊率為98%以上,每一秒的掃描雷射光功率密度為5 W/cm2~11 W/cm2。In addition, in the case of using the
(3)成形模清潔裝置的另一實施方式
以下,對本發明的成形模清潔裝置的另一實施方式進行說明。
圖15(a)及圖15(b)中所示的結構是脈衝雷射光束B的光點BS以所述圖12中所示的路徑在上模251的下表面或下模252的上表面上移動的情況,在所述路徑的X方向(即光點BS往返運動的方向。相當於所述第一方向)的兩端即雷射光束移動部12與上模251或下模252之間,可設置僅以光點BS的單個範圍的寬度遮蔽脈衝雷射光束B的遮蔽部17(圖15(a)中由粗實線表示者)。另外,遮蔽部17也可以同時設置在雷射光束移動部12與上模251之間、及雷射光束移動部12與下模252之間。(3) Another embodiment of forming mold cleaning device
Hereinafter, another embodiment of the mold cleaning device of the present invention will be described.
The structure shown in FIGS. 15(a) and 15(b) is that the spot BS of the pulsed laser beam B is on the lower surface of the
若如所述實施方式那樣不設置遮蔽部17且在使從雷射光源11中的脈衝雷射光束B的射出持續的狀態下使光點BS在Y方向(相當於所述第二方向)上移動,則根據光點BS的移動的速度,以比其他部分多的脈衝數對設置所述遮蔽部17的部分照射脈衝雷射光束B。例如,成為照射的起點的部分或X方向的移動與Y方向的移動進行切換的部分與其以外的部分相比,有時存在被照射脈衝雷射光束B的次數不同的部位。另外,設置所述遮蔽部17的部分也可以是如所述那樣被照射脈衝雷射光束B的次數可能未滿六次的位置。相對於此,在X方向的兩端的光點BS的單個範圍,通過遮蔽部17來遮蔽脈衝雷射光束B,並利用穿過了未進行所述遮蔽的部分的脈衝雷射光束B進行清潔,由此可進一步提高清潔處理的均勻性。If the shielding
也可以在使光點BS在Y方向上移動的期間內,停止從雷射光源11中的脈衝雷射光束B的射出來代替使用遮蔽部17。另外,也可以變更脈衝雷射光束的移動的速度,並對應於此變更每一個脈衝的雷射光能量密度及/或重複頻率。例如,使雷射光束更快地移動,對應於此使每一個脈衝的雷射光能量密度變大及/或使重複頻率變大,由此可擴大在相同的時間內可照射脈衝雷射光束的區域。Instead of using the
光點BS除如圖12或圖13所示那樣呈鋸齒狀地移動以外,例如也可以如圖16(a)所示那樣重複如下的動作:在X方向上進行單程移動(圖中的細實線的路徑)後,停止從雷射光源11中的脈衝雷射光束B的射出,然後一邊在X方向上回到最初的位置一邊在Y方向上僅移動光點BS的單個範圍(圖中的細虛線的路徑),進而在X方向上進行單程移動。或者,也可以如圖16(b)那樣,通過一次的鋸齒形移動(或圖16(a)的單程重複移動),而(不如所述那樣分成多個照射區域)對清潔對象的整體照射脈衝雷射光束B。In addition to moving the light spot BS in a zigzag pattern as shown in Fig. 12 or Fig. 13, for example, as shown in Fig. 16(a), the following action may be repeated: one-way movement in the X direction (fine solid in the figure) Line path), stop the emission of the pulsed laser beam B from the
為了使反射鏡13在X方向上移動,如圖17所示,也可以使用具有X方向導軌181、X方向傳送帶182、傳送帶安裝構件183、X方向馬達184、X方向滑輪185、馬達塊186、滑輪塊187、及Y方向導軌188的X方向移動機構18。X方向導軌181是在上模251的正下方或下模252的正上方,以橫貫這些模的方式在X方向上延長的導軌。X方向傳送帶182與X方向導軌181大致平行地延長,通過傳送帶安裝構件183而安裝有反射鏡13的軸承保持部134L或外側保持工具134R。安裝在X方向傳送帶182上的軸承保持部134L或外側保持工具134R由X方向導軌181支撐。X方向馬達184被收容在馬達塊186內,馬達塊186被固定在X方向導軌181的一端。另外,X方向滑輪185被收容在滑輪塊187內,滑輪塊187被固定在X方向導軌181的另一端。X方向傳送帶182挂在X方向馬達184及X方向滑輪185上。馬達塊186被載置在Y方向導軌188上,Y方向導軌188以外的X方向移動機構18的各構成元件可沿著Y方向導軌188在Y方向上移動。In order to move the
在此X方向移動機構18中,X方向滑輪185伴隨X方向馬達184的旋轉而旋轉,由此X方向傳送帶182在X方向上移動,由此經由軸承保持部134L或外側保持工具134R而安裝在X方向傳送帶182上的反射鏡13在X方向上移動。根據此X方向移動機構18,X方向馬達184與上模251及下模252相比配置在X方向的外側,因此可抑制來自上模251及下模252的熱對X方向馬達184造成的影響。另外,為了使雷射光源11及雷射光束移動部12在X方向上移動,也可以使用與X方向移動機構18相同者。In this X-direction moving
圖18中表示本發明的成形模清潔裝置的另一實施方式。此實施方式的成形模清潔裝置10A具有與所述成形模清潔裝置10相同的雷射光源11、雷射光束移動部12、XY平臺14、及XY平臺驅動器15。在圖18中,XY平臺14及XY平臺驅動器15省略圖示。另外,成形模清潔裝置10A具有第一反射鏡13X及第二反射鏡13Y來代替所述成形模清潔裝置10中的反射鏡13。進而,成形模清潔裝置10A包括包含光路切換鏡161與光路切換鏡移動部162的鏡切換部(鏡切換機構)16。Fig. 18 shows another embodiment of the mold cleaning device of the present invention. The forming
第一反射鏡13X可通過在X方向上延長的轉動軸而轉動,且配置在從雷射光束移動部12中射出的脈衝雷射光束B的光路上。第二反射鏡13Y具有使第一反射鏡13X環繞Z軸轉動了90°的結構,可通過在Y方向上延長的轉動軸而轉動,且配置在從雷射光束移動部12中射出的脈衝雷射光束B的光路的側方。The first reflecting
光路切換鏡161的反射面與Z軸平行,且朝向相對於從雷射光束移動部12中射出的脈衝雷射光束B傾斜了45°的方向。光路切換鏡移動部162是使光路切換鏡161在從雷射光束移動部12中射出的脈衝雷射光束B的光路外(側方)與光路內之間移動者。The reflection surface of the optical
對成形模清潔裝置10A的動作進行說明。首先,在通過光路切換鏡移動部162而已將光路切換鏡161配置在脈衝雷射光束B的光路外的狀態下,使第一反射鏡13X的反射面向下且相對於XZ平面僅傾斜45°。而且,與所述成形模清潔裝置10的情況同樣地,從雷射光源11中射出脈衝雷射光束B後通過雷射光束移動部12來使其在X方向上往返移動、及在Y方向上移動。由此,脈衝雷射光束B由第一反射鏡13X反射後照射至下模252的表面上。此處,第一反射鏡13X的反射面相對於XZ平面傾斜45°,因此脈衝雷射光束B垂直地射入下模252的上表面中。但是,若如此射入,則難以對例如面向模腔C的側面那樣,下模252中的與上表面垂直的面照射脈衝雷射光束B。因此,在到此為止的動作結束後,可使第一反射鏡13X的反射面的角度從45°變更成其以外的大小,而對下模252的與X方向平行的側面照射脈衝雷射光束B。The operation of the
繼而,在使第一反射鏡13X的反射面向上且相對於XZ平面僅傾斜45°後,通過雷射光束移動部12來使脈衝雷射光束B在X方向上往返移動、及在Y方向上移動,由此使脈衝雷射光束B照射至上模251的表面上。此時,也可以在將第一反射鏡13X的反射面的角度設為45°來進行操作後,將所述角度變更成45°以外的大小,由此對上模251的與X方向平行的側面照射脈衝雷射光束B。Then, after making the reflection surface of the
但是,即便通過到此為止的動作,也無法對下模252及上模251中的與Y方向平行的側面照射脈衝雷射光束B。因此,光路切換鏡移動部162使光路切換鏡161移動至從雷射光束移動部12中射出的脈衝雷射光束B的光路內。而且,使第二反射鏡13Y的反射面向下且將與XZ平面形成的角度設為45°以外的大小,從雷射光源11中射出脈衝雷射光束B後通過雷射光束移動部12來使其在X方向上往返移動、及在Y方向上移動,由此可對下模252的與Y方向平行的側面照射脈衝雷射光束B。進而,在搭載了電動光束直徑可變透鏡的情況下,通過電動來使內置的透鏡移動,由此可對準所述第二反射鏡13Y的角度來調整光點尺寸。也可以對上模251進行此處所述的各操作。However, even through the operations so far, the side surfaces parallel to the Y direction of the
如以上那樣,根據成形模清潔裝置10A,也可以對下模252及上模251中的與X方向及Y方向平行的側面照射脈衝雷射光束B,而可更確實地對下模252及上模251進行清潔。As described above, according to the molding
在圖19(a-1)至圖19(b)中,表示作為本發明的成形模清潔裝置的又一實施方式的成形模清潔裝置10B。此實施方式的成形模清潔裝置10B具有與所述成形模清潔裝置10相同的雷射光源11、雷射光束移動部12、XY平臺14、及XY平臺驅動器15。在圖19(a-1)至圖19(b)中,XY平臺14及XY平臺驅動器15省略圖示。另外,成形模清潔裝置10B具有第一反射鏡13A及第二反射鏡13B來代替所述成形模清潔裝置10中的反射鏡13。進而,成形模清潔裝置10B包括鏡切換部(鏡切換機構)16A。In Figs. 19(a-1) to 19(b), a forming
第一反射鏡13A如所述那樣通過鏡切換部16A而環繞Z方向的軸進行轉動,並且也可以通過XY平面上的轉動軸而進行轉動,且配置在從雷射光束移動部12中射出的脈衝雷射光束B的光路上。第二反射鏡13B可通過在Y方向上延長的轉動軸而進行轉動,且配置在從雷射光束移動部12中射出的脈衝雷射光束B的光路的側方。鏡切換部16A設置在第一反射鏡13A的下側,以使第一反射鏡13A環繞Z方向的軸進行轉動的方式沿著圓環狀的導軌來構成。The
對成形模清潔裝置10B的動作進行說明。首先,通過鏡切換部16A,以第一反射鏡13A的反射面與XY平面的交線變得與X軸平行的方式設定第一反射鏡13A的方向(圖19(a))。在此狀態下,與所述成形模清潔裝置10A中的第一反射鏡13X同樣地,通過在X方向上延長的轉動軸來使第一反射鏡13A轉動,在使第一反射鏡13A的反射面向下且相對於XZ平面僅傾斜45°的狀態、使第一反射鏡13A的反射面向下且以45°以外的角度相對於XZ平面傾斜的狀態、使第一反射鏡13A的反射面向上且相對於XZ平面僅傾斜45°的狀態、使第一反射鏡13A的反射面向上且以45°以外的角度相對於XZ平面傾斜的狀態這四種狀態下,分別對第一反射鏡13A照射脈衝雷射光束B。由此,脈衝雷射光束B可由第一反射鏡13A反射,而照射至包含與XZ平面大致平行的側面的下模252或上模251的表面上。當使反射面向下來將脈衝雷射光束B照射至下模252上時,由第一反射鏡13A反射的脈衝雷射光束B穿過鏡切換部16A的比圓環狀的導軌更內側的中空部。The operation of the
繼而,以反射面變成與XY面垂直的方式使第一反射鏡13A直立,鏡切換部16A以使所述反射面相對於XZ平面朝向45°的方向的方式,使第一反射鏡13A環繞Z軸進行轉動(圖19(b))。在此狀態下,照射至第一反射鏡13A中的脈衝雷射光束B由第一反射鏡13A反射後射入第二反射鏡13B中。而且,使第二反射鏡13B的反射面向下且將與XZ平面形成的角度設為45°以外的大小,從雷射光源11中射出脈衝雷射光束B後通過雷射光束移動部12來使脈衝雷射光束B在X方向上往返移動、及在Y方向上移動,由此可對下模252的與Y方向平行的側面照射脈衝雷射光束B。進而,在搭載了電動光束直徑可變透鏡的情況下,通過電動來使內置的透鏡移動,由此能夠以變成與由第一反射鏡13A反射時相同的光點尺寸的方式,對準由第二反射鏡13B反射時的光路及所述第二反射鏡13B的角度來調整光點尺寸。也可以對上模251進行此處所述的各操作。Then, the
如以上那樣,成形模清潔裝置10B也與成形模清潔裝置10A同樣地,也可以對下模252及上模251中的XZ平面及與XZ平面大致平行的側面照射脈衝雷射光束B,而可更確實地對下模252及上模251進行清潔。As described above, the forming
圖20中表示包括多組樹脂成形部20、及一組成形模清潔裝置10的樹脂成形單元30的結構。此樹脂成形單元30具有一台材料接收組件31、多台成形組件32、一台排出組件33、及一台成形模清潔裝置待機組件34。材料接收組件31是用於從外部接收板狀的樹脂材料P、及引線框架L並朝成形組件32中送出的裝置,且具有引線框架接收部311及樹脂片供給部312。一台成形組件32具有一台所述實施方式的樹脂成形裝置1中的樹脂成形部20。在圖20中表示了三台成形組件32,但在樹脂成形單元30中可設置任意的台數的成形組件32。另外,即便在組裝完樹脂成形單元30而開始使用後,也可以增減成形組件32。排出組件33是從成形組件32搬入由成形組件32所製造的樹脂成形品並加以保持者,且具有樹脂成形品保持部331。成形模清潔裝置待機組件34是在不使用成形模清潔裝置10時收容成形模清潔裝置10者。FIG. 20 shows the structure of a
搬送裝置35是沿著設置在樹脂成形單元30內的搬送導軌,將基板或樹脂材料從材料接收組件31搬入成形組件32中,並且將已成形的樹脂成形品從成形組件32搬出至排出組件33中的裝置。另外,搬送裝置35也具有如下的的功能:當在某一成形組件32中進行成形模的清潔時,將成形模清潔裝置10搬入所述成形組件32中(圖21),並且在所述成形模的清潔完成後將成形模清潔裝置10從所述成形組件32中搬出。The conveying
此樹脂成形單元30可在多個成形組件32中同時製造樹脂成形品,因此適合於大量生產樹脂成形品。此時,在從將基板安裝在成形模上至製作樹脂成形品後搬出為止的期間內需要相應的時間,因此通過在利用某一成形組件32製造樹脂成形品的時間內,將成形對象物安裝在其他成形組件32上、或從其他成形模中搬出樹脂成形品,而可提高樹脂成形品的製造效率,並且可抑制搬送裝置所需要的成本。進而,也可以在多台成形組件32中共用成形模清潔裝置10。This
在所述樹脂成形單元30中,使用與其他組件並排配置在同一列中的成形模清潔裝置待機組件34,但也可以如圖22中所示的樹脂成形單元30A那樣,使用沿著其他組件排列的列延長的成形模清潔裝置收容·移動組件34A來代替成形模清潔裝置待機組件34。樹脂成形單元30A中的材料接收組件31、成形組件32、及排出組件33的結構與樹脂成形單元30的情況相同。成形模清潔裝置收容·移動組件34A收容成形模清潔裝置10,並且在內部具有使成形模清潔裝置10在其他組件排列的列的方向上移動的成形模清潔裝置移動部35A。若從各成形組件32的樹脂成形部20來看,則成形模清潔裝置收容·移動組件34A及其內部的成形模清潔裝置移動部35A設置在搬送裝置35的相反側。樹脂成形單元30A的動作除將成形模清潔裝置10搬入成形組件32中及從成形組件32中搬出時使用成形模清潔裝置移動部35A這一點以外,與樹脂成形單元30相同。In the
本發明並不限定於所述各實施方式,可在本發明的主旨的範圍內進行進一步的各種變形。The present invention is not limited to the above-mentioned embodiments, and various further modifications can be made within the scope of the gist of the present invention.
例如,在所述實施方式中,使用每一個脈衝的雷射光能量密度處於0.04 J/cm2~0.7 J/cm2的範圍內,每一秒的掃描雷射光功率密度處於2 W/cm2~15 W/cm2的範圍內,脈衝寬度處於1 nsec~200 nsec的範圍內,脈衝重複頻率處於300 kHz~10 MHz的範圍內的脈衝雷射光束,但這些值並不限定於所述範圍內。另外,也可以使用進行連續振蕩的雷射光的光束來代替脈衝雷射光束。進而,在所述實施方式中,使用以在與光束垂直的剖面中的形狀變成正方形的方式成形,並具有禮帽型的照射強度分布的(脈衝)雷射光束,但也可以使用在所述剖面中具有圓形、圓環(環形、凹形)狀等其他形狀的雷射光束,或具有高斯型等的其他照射強度分布的雷射光束。在圖23(a)及圖23(b)中,表示剖面為圓形的雷射光束的光點及該光點移動的情況、以及在圖23(c)及圖23(d)中,表示剖面為圓環狀的雷射光束的光點及該光點移動的情況。For example, in the described embodiment, the energy density of the laser light used for each pulse is in the range of 0.04 J/cm2 to 0.7 J/cm2, and the power density of the scanning laser light per second is in the range of 2 W/cm2 to 15 W/cm2. In the range of cm2, the pulse width is in the range of 1 nsec to 200 nsec, and the pulse repetition frequency is in the range of 300 kHz to 10 MHz. However, these values are not limited to the range. In addition, a beam of laser light that oscillates continuously may be used instead of a pulsed laser beam. Furthermore, in the above-mentioned embodiment, a (pulsed) laser beam that is shaped so that the shape in a cross section perpendicular to the beam becomes square and has a top hat-shaped irradiation intensity distribution is used, but it can also be used in the cross section. Laser beams with other shapes such as circles, rings (circular, concave), or laser beams with other irradiated intensity distributions such as Gaussian. In Figs. 23(a) and 23(b), the spot of the laser beam with a circular cross-section and the movement of the spot are shown, and in Figs. 23(c) and 23(d), The spot of the laser beam with a circular cross section and the movement of the spot.
在所述實施方式中,使脈衝雷射光束以重疊率變成85%以上的方式移動,但脈衝雷射光束的移動速度並不限定於此,在使用進行連續振蕩的雷射光的光束的情況下,只要適宜設定移動速度即可。另外,在所述實施方式中,使(脈衝)雷射光束以光點在上模251或下模252的表面上呈鋸齒形地移動的方式移動,但光點的移動路徑並不限定於此。例如也可以重複如下的動作:在X方向上進行單程移動後,停止雷射光束,然後一邊在X方向上回到最初的位置一邊在Y方向上僅移動光點的單個範圍,進而在X方向上進行單程移動。In the above-mentioned embodiment, the pulsed laser beam is moved so that the overlap ratio becomes 85% or more. However, the moving speed of the pulsed laser beam is not limited to this. In the case of using a continuously oscillating laser beam , As long as the moving speed is set appropriately. In addition, in the above-mentioned embodiment, the (pulsed) laser beam is moved so that the spot moves in a zigzag pattern on the surface of the
在所述實施方式中,使用振鏡掃描頭121使脈衝雷射光束B在X方向上往返移動且在Z方向(在上模251或下模252的表面上使光點在Y方向)上移動,但作為替代,也可以通過振鏡掃描頭121來僅進行X方向的往返移動,使反射鏡13在Y方向上移動,由此在上模251或下模252的表面上使光點在Y方向移動。In the embodiment, the
1‧‧‧樹脂成形裝置 10、10A、10B‧‧‧成形模清潔裝置 11‧‧‧雷射光源 112‧‧‧底座 12‧‧‧雷射光束移動部 121‧‧‧振鏡掃描頭 122‧‧‧透鏡 13、13W‧‧‧反射鏡 13A、13X‧‧‧第一反射鏡 13B、13Y‧‧‧第二反射鏡 131L‧‧‧第一握持工具 131R‧‧‧第二握持工具 132L‧‧‧第一轉動軸體 132R‧‧‧第二轉動軸體 1321L、1321R‧‧‧槽 133L‧‧‧軸承 133R‧‧‧轉動軸體可動保持工具 134L‧‧‧軸承保持部 134R‧‧‧外側保持工具 135L‧‧‧第一固定工具 135R‧‧‧第二固定工具 136‧‧‧馬達 137L‧‧‧軸承固定工具 138‧‧‧軸 139‧‧‧滑動軸承 14‧‧‧XY平臺 141‧‧‧連結棒 142‧‧‧引導棒 15‧‧‧XY平臺驅動器 16、16A‧‧‧鏡切換部 161‧‧‧光路切換鏡 162‧‧‧光路切換鏡移動部 17‧‧‧遮蔽部 18‧‧‧X方向移動機構 181‧‧‧X方向導軌 182‧‧‧X方向傳送帶 183‧‧‧傳送帶安裝構件 184‧‧‧X方向馬達 185‧‧‧X方向滑輪 186‧‧‧馬達塊 187‧‧‧滑輪塊 188‧‧‧Y方向導軌 20‧‧‧樹脂成形部 211‧‧‧基座 212‧‧‧系杆 213‧‧‧曲柄連杆 221‧‧‧可動台板 222‧‧‧固定台板 25‧‧‧成形模 251‧‧‧上模 2511‧‧‧剔除塊 2513、2523‧‧‧流道 252‧‧‧下模 2521‧‧‧料筒 2522‧‧‧柱塞 253‧‧‧加熱板 2531‧‧‧加熱器 30、30A‧‧‧樹脂成形單元 31‧‧‧材料接收組件 311‧‧‧引線框架接收部 312‧‧‧樹脂片供給部 32‧‧‧成形組件 33‧‧‧排出組件 331‧‧‧樹脂成形品保持部 34‧‧‧成形模清潔裝置待機組件 34A‧‧‧成形模清潔裝置收容·移動組件 35‧‧‧搬送裝置 35A‧‧‧成形模清潔裝置移動部 A‧‧‧附著物 AG‧‧‧已氣化的附著物 B‧‧‧脈衝雷射光束 BS‧‧‧脈衝雷射光束的光點 C‧‧‧模腔 CT‧‧‧塗層 L‧‧‧引線框架 P‧‧‧樹脂材料 PL‧‧‧等離子體 X、Y、Z‧‧‧方向1‧‧‧Resin molding device 10, 10A, 10B‧‧‧forming mold cleaning device 11‧‧‧Laser light source 112‧‧‧Base 12‧‧‧Laser beam moving part 121‧‧‧ Galvanometer Scan Head 122‧‧‧Lens 13, 13W‧‧‧Mirror 13A、13X‧‧‧First reflector 13B, 13Y‧‧‧Second mirror 131L‧‧‧First holding tool 131R‧‧‧Second holding tool 132L‧‧‧The first rotating shaft 132R‧‧‧Second rotating shaft 1321L, 1321R‧‧‧slot 133L‧‧‧Bearing 133R‧‧‧Rotating shaft movable holding tool 134L‧‧‧Bearing retaining part 134R‧‧‧Outside holding tool 135L‧‧‧First fixing tool 135R‧‧‧Second fixing tool 136‧‧‧Motor 137L‧‧‧Bearing fixing tool 138‧‧‧Axis 139‧‧‧Sliding bearing 14‧‧‧XY platform 141‧‧‧Connecting rod 142‧‧‧Guide rod 15‧‧‧XY platform driver 16, 16A‧‧‧Mirror switching part 161‧‧‧Optical Path Switching Mirror 162‧‧‧Optical path switching mirror moving part 17‧‧‧Shield 18‧‧‧X direction moving mechanism 181‧‧‧X direction guide 182‧‧‧X direction conveyor belt 183‧‧‧Conveyor belt installation components 184‧‧‧X direction motor 185‧‧‧X direction pulley 186‧‧‧Motor block 187‧‧‧Pulley block 188‧‧‧Y direction guide 20‧‧‧Resin molding department 211‧‧‧Base 212‧‧‧Tie Rod 213‧‧‧Crank connecting rod 221‧‧‧movable platen 222‧‧‧Fixed platen 25‧‧‧Forming die 251‧‧‧Upper die 2511‧‧‧Remove block 2513、2523‧‧‧Runner 252‧‧‧Die 2521‧‧‧Barrel 2522‧‧‧Plunger 253‧‧‧heating plate 2531‧‧‧Heater 30, 30A‧‧‧Resin molding unit 31‧‧‧Material receiving assembly 311‧‧‧Lead frame receiving part 312‧‧‧Resin sheet supply department 32‧‧‧Forming components 33‧‧‧Discharge assembly 331‧‧‧Resin molded product holding part 34‧‧‧Forming die cleaning device standby component 34A‧‧‧Forming mold cleaning device containing and moving assembly 35‧‧‧Conveying device 35A‧‧‧Moving part of mold cleaning device A‧‧‧Attachment AG‧‧‧ Vaporized attachments B‧‧‧Pulse laser beam BS‧‧‧Spot of pulsed laser beam C‧‧‧Mold cavity CT‧‧‧Coating L‧‧‧Lead frame P‧‧‧Resin material PL‧‧‧plasma X, Y, Z‧‧‧direction
圖1(a)、圖1(b)、圖1(c)、圖1(d)及圖1(e)分別是對清潔後尚未進行樹脂成形的成形模,以及清潔後分別進行了200次、400次、600次及800次樹脂成形後的成形模拍攝表面所得的電子顯微鏡照片。 圖2是表示本發明的成形模清潔裝置及具有其的樹脂成形裝置的一實施方式的概略結構圖。 圖3是本實施方式的樹脂成形裝置中的成形模及其附近的放大圖。 圖4(a)及圖4(b)分別是表示利用雷射光束移動部使雷射光束移動的情況的平面圖及側面圖。 圖5是本實施方式的成形模清潔裝置中的反射鏡及其附屬部的立體及部分剖面圖。 圖6(a)是反射鏡的附屬部的部分剖面放大圖,且為表示一側的轉動軸體附近的圖、圖6(b)是表示另一側的轉動軸體附近的圖、以及圖6(c)是表示另一側的轉動軸體與圖6(b)的情況相比已朝反射鏡的相反側移動的狀態的圖。 圖7(a)是表示利用軸已將握持反射鏡的一對握持工具連接的狀態的圖、及圖7(b)是表示一側的握持工具與圖7(a)的情況相比已朝反射鏡的相反側移動的狀態的圖。 圖8(a)及圖8(b)分別是表示本實施方式的成形模清潔裝置位於使用位置及待機位置上的狀態的概略圖。 圖9是表示利用在Y方向上延長的連結棒已將雷射光源及雷射光束移動部與反射鏡連結的結構的圖。 圖10是表示使用X方向的寬度比X方向上的雷射光束的照射範圍大的反射鏡的例子的圖。 圖11(a)是本實施方式的樹脂成形裝置中的樹脂成形時的動作,且為表示將引線框架載置在下模上且已將樹脂材料供給至下模的料筒中的狀態的圖、及圖11(b)是表示將成形模合模並已將樹脂材料供給至模腔中的狀態的圖。 圖12是表示脈衝雷射光束的光點呈鋸齒狀地移動的情況的圖。 圖13是表示下模或上模的表面上的雷射光束的軌跡(細實線)、及通過雷射光束進行一次鋸齒形移動而被照射雷射光束的區域的邊界(粗虛線)的圖。 圖14(a)是表示通過對成形模照射脈衝雷射光束而在成形模的表面附近生成等離子體的狀態的概略圖,及圖14(b)是通過對等離子體重複照射脈衝雷射光束來對等離子體進行加熱,且附著物氣化的狀態的概略圖。 圖15(a)及圖15(b)分別是表示使用遮蔽部的例子的俯視圖及縱剖面圖。 圖16(a)是表示作為下模或上模的表面上的雷射光束的軌跡的另一例的在照射區域內重複進行單程移動的例、及圖16(b)是在下模或上模的整個表面上呈鋸齒狀地移動的例的圖。 圖17是表示使反射鏡在X方向上移動的X方向移動機構的例子的概略圖。 圖18是表示本發明的成形模清潔裝置的另一實施方式的平面圖。 圖19(a-1)及圖19(a-2)分別是表示本發明的成形模清潔裝置的又一實施方式的圖,且為表示使用第一反射鏡的狀態的平面圖及側面圖、以及圖19(b)是表示使用第二反射鏡的狀態的平面圖。 圖20是表示包含成形組件等多個組件的樹脂成形單元的一例的概略結構圖。 圖21是表示在樹脂成形單元中已將成形模清潔裝置搬入一個成形組件中的狀態的概略結構圖。 圖22是表示包含多個組件的樹脂成形單元的另一例的概略結構圖。 圖23(a)及圖23(b)分別表示剖面為圓形的雷射光束的光點及該光點移動的情況、以及圖23(c)及圖23(d)分別表示剖面為圓環狀的雷射光束的光點及該光點移動的情況。Figure 1 (a), Figure 1 (b), Figure 1 (c), Figure 1 (d) and Figure 1 (e) are the molds that have not been resin molded after cleaning, and 200 times after cleaning. , 400 times, 600 times, and 800 times of resin molding after taking the surface electron micrographs of the molding die. 2 is a schematic configuration diagram showing an embodiment of the molding die cleaning device of the present invention and a resin molding device having the same. Fig. 3 is an enlarged view of a molding die and its vicinity in the resin molding apparatus of the present embodiment. 4(a) and 4(b) are respectively a plan view and a side view showing how the laser beam is moved by the laser beam moving part. FIG. 5 is a perspective and partial cross-sectional view of the reflecting mirror and its accessory parts in the molding die cleaning device of this embodiment. Figure 6 (a) is a partial cross-sectional enlarged view of the appendage of the mirror, and is a diagram showing the vicinity of the rotating shaft on one side, and Figure 6 (b) is a diagram showing the vicinity of the rotating shaft on the other side, and a diagram 6(c) is a diagram showing a state where the rotation shaft on the other side has moved to the opposite side of the mirror compared to the case of FIG. 6(b). Fig. 7(a) is a diagram showing a state in which a pair of holding tools for holding the mirror have been connected by a shaft, and Fig. 7(b) is a diagram showing the situation of the holding tool on one side and Fig. 7(a) It is a diagram showing a state that has moved to the opposite side of the mirror. FIGS. 8(a) and 8(b) are schematic diagrams showing a state in which the mold cleaning device of the present embodiment is located at the use position and the standby position, respectively. FIG. 9 is a diagram showing a structure in which a laser light source and a laser beam moving part and a reflecting mirror are connected by a connecting rod extending in the Y direction. 10 is a diagram showing an example of using a mirror whose width in the X direction is larger than the irradiation range of the laser beam in the X direction. Fig. 11(a) is the operation during resin molding in the resin molding apparatus of this embodiment, and is a diagram showing a state where the lead frame is placed on the lower mold and the resin material has been supplied to the barrel of the lower mold, and Fig. 11(b) is a diagram showing a state where the molding die is closed and the resin material has been supplied into the cavity. FIG. 12 is a diagram showing a state where the spot of the pulse laser beam moves in a zigzag shape. Fig. 13 is a diagram showing the trajectory of the laser beam on the surface of the lower mold or the upper mold (thin solid line) and the boundary (thick broken line) of the area where the laser beam is irradiated by the zigzag movement of the laser beam once . Fig. 14(a) is a schematic diagram showing a state in which plasma is generated near the surface of the forming mold by irradiating a pulsed laser beam to the forming mold, and Fig. 14(b) is a state in which plasma is repeatedly irradiated with a pulsed laser beam A schematic diagram of the state where the plasma is heated and the deposits are vaporized. 15(a) and 15(b) are respectively a plan view and a vertical sectional view showing an example in which the shielding portion is used. Figure 16(a) shows another example of the trajectory of the laser beam on the surface of the lower mold or the upper mold, which is an example of repeated one-way movement in the irradiation area, and Fig. 16(b) is in the lower mold or the upper mold A diagram showing an example of zigzag movement on the entire surface. FIG. 17 is a schematic diagram showing an example of an X-direction moving mechanism that moves a mirror in the X direction. Fig. 18 is a plan view showing another embodiment of the mold cleaning device of the present invention. 19 (a-1) and FIG. 19 (a-2) are diagrams showing still another embodiment of the molding die cleaning device of the present invention, and are a plan view and a side view showing a state in which the first mirror is used, and Fig. 19(b) is a plan view showing a state where the second mirror is used. FIG. 20 is a schematic configuration diagram showing an example of a resin molding unit including a plurality of components such as molding components. Fig. 21 is a schematic configuration diagram showing a state in which the mold cleaning device has been carried into one molding assembly in the resin molding unit. Fig. 22 is a schematic configuration diagram showing another example of a resin molding unit including a plurality of components. Figures 23(a) and 23(b) respectively show the spot of a laser beam with a circular cross-section and the movement of the spot, and Figure 23(c) and Figure 23(d) respectively show the cross-section of a circular ring The spot of the laser beam and the movement of the spot.
1‧‧‧樹脂成形裝置 1‧‧‧Resin molding device
10‧‧‧成形模清潔裝置 10‧‧‧Forming die cleaning device
11‧‧‧雷射光源 11‧‧‧Laser light source
12‧‧‧雷射光束移動部 12‧‧‧Laser beam moving part
13‧‧‧反射鏡 13‧‧‧Mirror
136‧‧‧馬達 136‧‧‧Motor
14‧‧‧XY平臺 14‧‧‧XY platform
15‧‧‧XY平臺驅動器 15‧‧‧XY platform driver
20‧‧‧樹脂成形部 20‧‧‧Resin molding department
211‧‧‧基座 211‧‧‧Base
212‧‧‧系杆 212‧‧‧Tie Rod
213‧‧‧曲柄連杆 213‧‧‧Crank connecting rod
221‧‧‧可動台板 221‧‧‧movable platen
222‧‧‧固定台板 222‧‧‧Fixed platen
25‧‧‧成形模 25‧‧‧Forming die
251‧‧‧上模 251‧‧‧Upper die
252‧‧‧下模 252‧‧‧Die
253‧‧‧加熱板 253‧‧‧heating plate
2531‧‧‧加熱器 2531‧‧‧Heater
B‧‧‧脈衝雷射光束 B‧‧‧Pulse laser beam
X、Y、Z‧‧‧方向 X, Y, Z‧‧‧direction
Claims (11)
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| JP2018130498A JP2020006600A (en) | 2018-07-10 | 2018-07-10 | Mold cleaning device and method, resin molding apparatus, and manufacturing method of resin molded article |
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| US20250229303A1 (en) * | 2022-11-24 | 2025-07-17 | Lg Energy Solution, Ltd. | Sealing Tool Cleaning Device and Sealing Tool Cleaning Method Using the Same |
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| CN1277086A (en) * | 1999-05-26 | 2000-12-20 | 日本电气株式会社 | Cleaning apparatus and method for clean resin sealing metal mould |
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