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TWI704045B - Mold cleaning device and method, resin molding device, and resin molded product manufacturing method - Google Patents

Mold cleaning device and method, resin molding device, and resin molded product manufacturing method Download PDF

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Publication number
TWI704045B
TWI704045B TW108123099A TW108123099A TWI704045B TW I704045 B TWI704045 B TW I704045B TW 108123099 A TW108123099 A TW 108123099A TW 108123099 A TW108123099 A TW 108123099A TW I704045 B TWI704045 B TW I704045B
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laser beam
mold
mirror
cleaning device
forming mold
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TW108123099A
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Chinese (zh)
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TW202005775A (en
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岡本純
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日商Towa股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00Moulds or cores; Details thereof or accessories therefor
    • B29C33/70Maintenance
    • B29C33/72Cleaning
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00Moulds or cores; Details thereof or accessories therefor
    • B29C33/56Coatings, e.g. enameled or galvanised; Releasing, lubricating or separating agents
    • B29C33/58Applying the releasing agents
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/08Mirrors
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0805Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
    • B29C2035/0838Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using laser

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)

Abstract

本發明提供一種即便在已使成形模升溫至可進行樹脂成形的溫度的狀態下,也可以抑制由熱所產生的影響並使用的成形模清潔裝置及方法、樹脂成形裝置以及樹脂成形品製造方法。成形模清潔裝置為去除附著在構成成形模的上模及與上模相向的下模的至少任一者的表面上的附著物的裝置,包括:雷射光源,設置在上模與下模之間的空間外,射出雷射光束;雷射光束反射機構,具有反射鏡、及使反射鏡在所述空間中的第一位置與所述空間外的第二位置之間移動的XY平臺,以當反射鏡位於第一位置上時由反射鏡反射的雷射光束照射至上模或下模的表面上的方式,設定反射鏡的方向;以及雷射光束移動部,設置在所述空間外,使雷射光束相對於位於第一位置上時的反射鏡移動。The present invention provides a molding die cleaning device and method, a resin molding device, and a resin molding product manufacturing method that can suppress the influence of heat and use it even in a state where the molding die has been heated to a temperature at which resin molding can be performed . The forming mold cleaning device is a device that removes attachments on the surface of at least one of the upper mold constituting the forming mold and the lower mold facing the upper mold, and includes: a laser light source, which is set between the upper mold and the lower mold The laser beam is emitted outside the space between the two; the laser beam reflection mechanism has a reflector and an XY platform that moves the reflector between a first position in the space and a second position outside the space to When the reflector is in the first position, the laser beam reflected by the reflector is irradiated on the surface of the upper mold or the lower mold, and the direction of the reflector is set; and the laser beam moving part is arranged outside the space so that The laser beam moves relative to the mirror when it is in the first position.

Description

成形模清潔裝置及方法、樹脂成形裝置以及樹脂成形品製造方法Mold cleaning device and method, resin molding device, and resin molded product manufacturing method

本發明涉及一種成形模清潔裝置及方法、樹脂成形裝置、以及樹脂成形品製造方法。The present invention relates to a molding die cleaning device and method, a resin molding device, and a resin molded product manufacturing method.

若在樹脂成形裝置中使用成形模進行樹脂成形,則在取出成形品後樹脂也略微附著在成形模的表面上而殘留,在利用相同的成形模重複進行樹脂成形的期間內附著物逐漸地增加。若在此種附著物已附著在成形模的表面上的狀態下進行樹脂成形,則存在附著物的形狀被轉印至樹脂成形品上的可能性。If a molding die is used for resin molding in a resin molding device, the resin slightly adheres to the surface of the molding die and remains after the molded product is taken out. The deposits gradually increase while the resin molding is repeated with the same molding die. . If resin molding is performed in a state where such an attached matter has adhered to the surface of the molding die, there is a possibility that the shape of the attached matter will be transferred to the resin molded product.

因此,定期地進行暫時停止樹脂成形品的製造,去除成形模的附著物的清潔。在專利文獻1中記載有如下的裝置:在構成成形模的上模與下模之間的空間內配置雷射光源,一邊使雷射光源沿著下模的上表面(或上模的下表面)移動一邊對下模(上模)照射雷射光束,由此進行將附著物從下模(上模)上剝離的處理。 [現有技術文獻] [專利文獻]Therefore, the production of the resin molded product is temporarily stopped at regular intervals, and the cleaning is performed to remove the adhesion of the molding die. Patent Document 1 describes a device in which a laser light source is arranged in the space between the upper mold and the lower mold constituting the forming mold, and the laser light source is aligned along the upper surface of the lower mold (or the lower surface of the upper mold). ) While moving, the lower mold (upper mold) is irradiated with a laser beam to peel off the attached matter from the lower mold (upper mold). [Prior Art Literature] [Patent Literature]

[專利文獻1]日本專利特開2008-149705號公報[Patent Document 1] Japanese Patent Laid-Open No. 2008-149705

[發明所要解決的問題][The problem to be solved by the invention]

在樹脂成形時,為了使樹脂熔融等,必須使成形模升溫至例如180℃左右的溫度。在專利文獻1中記載的裝置中,若在已使成形模升溫的狀態下進行清潔,則由於將雷射光源或使其移動的移動裝置配置在成形模的附近(例如上模與下模的中間)來使用,因此存在因配置所述雷射光源或移動裝置的空間的熱、或來自成形模的輻射熱等熱,而產生雷射光的照射位置等的精度惡化等不良情況的擔憂。若為了避免此種不良情況而在將成形模暫時冷卻後進行清潔,則存在如下的擔憂:產生包含清潔後為了樹脂成形而再次使成形模升溫並達到穩定的溫度為止的時間在內的等待時間,在樹脂成形步驟中的產距時間(takt time)延長,樹脂成形品的製造效率下降。During resin molding, in order to melt the resin or the like, the temperature of the molding die must be raised to a temperature of, for example, about 180°C. In the device described in Patent Document 1, if cleaning is performed in a state where the temperature of the forming mold has been raised, the laser light source or the moving device for moving it is arranged near the forming mold (for example, the upper and lower molds The middle) is used. Therefore, there is a concern that the accuracy of the irradiation position of the laser light will deteriorate due to heat such as heat in the space where the laser light source or moving device is arranged, or radiant heat from the molding die. If the mold is temporarily cooled and then cleaned in order to avoid such inconveniences, there is a concern that there will be a waiting time including the time until the mold is heated again for resin molding after cleaning to reach a stable temperature. , The takt time in the resin molding step is prolonged, and the manufacturing efficiency of resin molded products decreases.

本發明欲解決的問題在於提供一種即便在已使成形模升溫至可進行樹脂成形的溫度的狀態下,也可以抑制由熱所產生的影響並使用的成形模清潔裝置及方法、樹脂成形裝置、以及樹脂成形品製造方法。 [解決問題的技術手段]The problem to be solved by the present invention is to provide a molding die cleaning device and method, a resin molding device, and a resin molding device that can suppress the influence of heat and use it even in a state where the molding die has been heated to a temperature at which resin molding can be performed. And the method of manufacturing resin molded products. [Technical means to solve the problem]

本發明的成形模清潔裝置是去除附著在構成成形模的第一模及與該第一模相向的第二模的至少任一者的表面上的附著物的裝置,其特徵在於,包括: a)雷射光源,設置在所述第一模與所述第二模之間的空間外,射出所述雷射光束; b)雷射光束反射機構,具有反射鏡及反射鏡移動機構,所述反射鏡移動機構使該反射鏡在所述空間中的第一位置與所述空間外的第二位置之間移動,所述雷射光束反射機構以當該反射鏡位於所述第一位置上時由該反射鏡反射的雷射光束照射至所述第一模或所述第二模的表面上的方式,設定該反射鏡的方向;以及 c)雷射光束移動機構,設置在所述空間外,使所述雷射光束相對於位於所述第一位置上時的所述反射鏡移動。The forming mold cleaning device of the present invention is a device that removes adherents attached to the surface of at least any one of the first mold constituting the forming mold and the second mold facing the first mold, and is characterized in that it includes: a) A laser light source, which is arranged outside the space between the first mold and the second mold to emit the laser beam; b) The laser beam reflecting mechanism has a reflecting mirror and a reflecting mirror moving mechanism. The reflecting mirror moving mechanism moves the reflecting mirror between a first position in the space and a second position outside the space, so The laser beam reflection mechanism sets the reflection in such a manner that the laser beam reflected by the mirror irradiates the surface of the first mold or the second mold when the mirror is located at the first position The direction of the mirror; and c) The laser beam moving mechanism is arranged outside the space to move the laser beam relative to the reflector when it is at the first position.

本發明的成形模清潔方法是去除附著在構成成形模的第一模及與該第一模相向的第二模的至少任一者的表面上的附著物的方法,其特徵在於: 在所述第一模與所述第二模之間的空間中配置反射鏡, 從設置在所述空間外的雷射光源射出雷射光束,並一邊通過設置在所述空間外的雷射光束移動機構來使該雷射光束相對於所述反射鏡移動,一邊將該雷射光束照射至所述反射鏡上,且 將由所述反射鏡所反射的所述雷射光束照射至所述第一模或所述第二模上。The forming mold cleaning method of the present invention is a method for removing the adherents attached to the surface of at least one of the first mold constituting the forming mold and the second mold facing the first mold, and is characterized in that: Disposing a mirror in the space between the first mold and the second mold, A laser beam is emitted from a laser light source installed outside the space, and the laser beam is moved relative to the mirror by a laser beam moving mechanism installed outside the space while the laser beam The light beam irradiates the mirror, and The laser beam reflected by the mirror is irradiated onto the first mold or the second mold.

本發明的樹脂成形裝置的特徵在於包括:所述成形模、及所述成形模清潔裝置。The resin molding apparatus of the present invention is characterized by including the molding die and the molding die cleaning device.

本發明的樹脂成形品製造方法的特徵在於:在實施所述成形模清潔方法後,使用所述成形模製造樹脂成形品。 [發明的效果]The method for manufacturing a resin molded product of the present invention is characterized in that after the molding die cleaning method is implemented, the molding die is used to manufacture a resin molded product. [Effects of the invention]

根據本發明,即便在已使成形模升溫至可進行樹脂成形的溫度的狀態下,也可以抑制由熱所產生的影響並使用。According to the present invention, even in a state where the temperature of the forming mold has been raised to a temperature at which resin molding can be performed, the influence of heat can be suppressed and used.

在本發明的成形模清潔裝置中,當在暫時停止樹脂成形後對成形模進行通過照射雷射光束而進行的處理(在成形模清潔裝置中進行清潔)時,通過反射鏡移動機構來使反射鏡移動至作為第一模與第二模之間的空間中的第一位置上後,利用設置在該空間外的雷射光源對所述反射鏡照射雷射光束。由此,雷射光束由反射鏡反射而照射至第一模或第二模的表面上。此處,通過設置在所述空間外的雷射光束移動機構來使雷射光束相對於反射鏡移動,由此照射至第一模或第二模的表面上的雷射光束的光點在所述表面上移動。由此,對第一模或第二模的表面的固定的範圍內照射雷射光束。由此,對第一模或第二模實施去除(清潔)附著在這些模的表面上的附著物等處理。在成形模的處理結束後,使反射鏡移動至作為所述空間外的第二位置上後,再次開始樹脂成形。In the molding die cleaning device of the present invention, when the molding die is processed by irradiating a laser beam (cleaning in the molding die cleaning device) after the resin molding is temporarily stopped, the mirror moving mechanism is used to make the reflection After the mirror is moved to the first position in the space between the first mold and the second mold, a laser light source arranged outside the space is used to irradiate the mirror with a laser beam. Thus, the laser beam is reflected by the mirror and irradiated on the surface of the first mold or the second mold. Here, the laser beam is moved relative to the reflector by the laser beam moving mechanism provided outside the space, so that the spot of the laser beam irradiated on the surface of the first mold or the second mold is at all Move on the surface. Thus, the laser beam is irradiated within a fixed range of the surface of the first mold or the second mold. As a result, the first mold or the second mold is subjected to treatments such as removing (cleaning) deposits attached to the surfaces of these molds. After the processing of the molding die is completed, the mirror is moved to the second position outside the space, and then the resin molding is restarted.

根據本發明的成形模清潔裝置,即便是已使第一模或第二模升溫的狀態,由於雷射光源及雷射光束移動機構設置在該空間外,因此也可以抑制所述雷射光源及雷射光束移動機構受到的由該空間內的熱或者來自第一模或第二模的輻射熱等熱所產生的影響。另一方面,反射鏡雖然配置在所述空間內,但比雷射光源及雷射光束移動機構更難以受到熱的影響。因這些理由,本發明的成形模清潔裝置即便在已使成形模升溫至可進行樹脂成形的溫度的狀態下,也可以抑制由熱所產生的影響並使用。According to the forming mold cleaning device of the present invention, even in a state where the first mold or the second mold is heated, the laser light source and the laser beam moving mechanism are arranged outside the space, so that the laser light source and the laser beam moving mechanism can be suppressed. The laser beam moving mechanism is affected by heat in the space or radiant heat from the first or second mode. On the other hand, although the reflecting mirror is arranged in the space, it is less affected by heat than the laser light source and the laser beam moving mechanism. For these reasons, the molding die cleaning device of the present invention can be used while suppressing the influence of heat even in a state where the temperature of the molding die has been raised to a temperature at which resin molding can be performed.

在本發明的成形模清潔裝置中,優選所述雷射光束移動機構是振鏡掃描頭(galvano scan head)。振鏡掃描頭是通過使用一個利用一轉動軸進行轉動的鏡、或將轉動軸的傾斜度不同的兩個鏡組合使用,而使雷射光束朝一個方向或不同的兩個方向移動的裝置。由此,可使照射至第一模或第二模的表面上的雷射光束的光點呈一維狀或二維狀地移動。振鏡掃描頭可使雷射光束的光點高速地移動,因此可縮短處理時間。另外,在使雷射光束的光點移動時無需使振鏡掃描頭自身相對於成形模移動,因此可使設置空間變小。In the forming mold cleaning device of the present invention, it is preferable that the laser beam moving mechanism is a galvano scan head. The galvanometer scanning head is a device that moves the laser beam in one direction or two different directions by using a mirror that rotates by a rotating shaft or a combination of two mirrors with different inclination of the rotating shaft. Thereby, the spot of the laser beam irradiated on the surface of the first mold or the second mold can be moved one-dimensionally or two-dimensionally. The galvanometer scanning head can move the spot of the laser beam at high speed, thus shortening the processing time. In addition, there is no need to move the galvanometer scan head itself relative to the forming mold when moving the spot of the laser beam, so the installation space can be reduced.

本發明的成形模清潔裝置可采用還具有變更反射鏡的方向的反射方向變更機構這一結構。或者,本發明的成形模清潔裝置也可以采用如下的結構:所述反射鏡包含方向互不相同的第一反射鏡與第二反射鏡,所述雷射光束反射機構還包括對被照射所述雷射光束的反射鏡進行切換的鏡切換機構。在任一種情況下,均可變更雷射光束射入第一模或第二模中的角度。例如,當雷射光束朝向某一方向照射至第一模中時,在第一模的構成模腔的壁面與其雷射光束平行的情況下,通過變更入射角,可容易地對其壁面照射雷射光束。The molding die cleaning device of the present invention can be configured to further include a reflection direction changing mechanism that changes the direction of the mirror. Alternatively, the forming mold cleaning device of the present invention may also adopt the following structure: the reflecting mirror includes a first reflecting mirror and a second reflecting mirror having different directions, and the laser beam reflecting mechanism further includes A mirror switching mechanism that switches the mirror of the laser beam. In either case, the angle at which the laser beam enters the first or second mode can be changed. For example, when the laser beam is irradiated into the first mold in a certain direction, when the wall surface of the cavity constituting the first mold is parallel to the laser beam, the wall surface of the laser beam can be easily irradiated by changing the angle of incidence. Shot beam.

本發明的成形模清潔裝置可采用如下的結構,所述結構還包括:一對第一轉動軸體及第二轉動軸體,與所述反射鏡的兩側部連接;以及轉動軸體保持工具,在軸方向上可動地保持所述第一轉動軸體及所述第二轉動軸體的至少一者。由此,即便因樹脂成形時所生成的熱而導致在成形模的處理時反射鏡進行熱膨脹、或因使反射鏡移動至第二位置上時的溫度下降而導致反射鏡進行收縮,由於被轉動軸體保持工具保持的轉動軸體在軸方向上移動,而容許反射鏡在軸方向上膨脹或收縮,因此也可以抑制反射鏡的變形。另外,可以將第一轉動軸體與第二轉動軸體兩者分別在軸方向上可動地保持在轉動軸體保持工具上,也可以將第一轉動軸體與第二轉動軸體的另一者(容許環繞轉動軸進行轉動)固定在軸方向上。The forming mold cleaning device of the present invention may adopt the following structure, the structure further comprising: a pair of first rotating shafts and second rotating shafts connected to both sides of the reflecting mirror; and rotating shaft holding tools , Movably holding at least one of the first rotating shaft body and the second rotating shaft body in the axial direction. As a result, even if the heat generated during resin molding causes the mirror to thermally expand during the processing of the molding die, or the temperature drops when the mirror is moved to the second position, the mirror shrinks and is rotated. The rotating shaft held by the shaft holding tool moves in the axial direction, and allows the mirror to expand or contract in the axial direction, so that the deformation of the mirror can also be suppressed. In addition, both the first rotating shaft and the second rotating shaft may be held on the rotating shaft holding tool movably in the axial direction, or the other of the first rotating shaft and the second rotating shaft may be Those (allowing rotation around the axis of rotation) are fixed in the direction of the axis.

本發明的成形模清潔裝置是去除附著在對表面的至少一部分施加了塗層的所述成形模上的附著物的裝置,理想的是所述雷射光源及所述雷射光束移動機構是以如下的照射強度將雷射光束照射至所述成形模上者,所述照射強度是在所述附著物上生成了等離子體後可將該等離子體加熱至所述附著物氣化的溫度以上的溫度的照射強度,且為比對所述塗層造成損傷的照射強度低的照射強度。The forming mold cleaning device of the present invention is a device that removes the attachments attached to the forming mold coated on at least a part of the surface. It is desirable that the laser light source and the laser beam moving mechanism are The following irradiation intensity irradiates the laser beam to the forming mold, and the irradiation intensity is such that after plasma is generated on the attachment, the plasma can be heated to a temperature above the vaporization temperature of the attachment The irradiation intensity of temperature is lower than the irradiation intensity that damages the coating.

由此,附著物的至少一部分,其被加熱至所述附著物氣化的溫度以上的溫度而氣化,並被從成形模的表面上去除。另一方面,在多數情況下,對成形模的表面施加了包含鉻等的塗層(另外,在本發明中,成形模的塗層的材料並無特別限定),在去除附著物時必須抑制此塗層損傷。為了獲得關於雷射光束對成形模的塗層造成的損害的知識,本發明者通過觀察成形模的表面來調查附著物的形成過程的結果,已明確附著物最初呈點狀地附著,其後逐漸地接近覆蓋成形模的模腔面的大致整個面的皮膜狀的形狀(在圖1(a)、圖1(b)、圖1(c)、圖1(d)及圖1(e)的電子顯微鏡照片中,附加符號A來表示附著物)。因此,當在附著物為點狀的階段照射了雷射光束時,由於存在點狀或面積未充分地擴大的附著物的間隙(附著物未附著的部分),因此雷射光束直接照射至塗層上,由此存在對塗層造成損害的擔憂。因此,通過以比對塗層造成損傷的照射強度低的照射強度將雷射光束照射至成形模上,可抑制塗層受到的損害。As a result, at least a part of the attached matter is heated to a temperature higher than the temperature at which the attached matter is vaporized and vaporized, and is removed from the surface of the forming mold. On the other hand, in most cases, a coating containing chromium or the like is applied to the surface of the forming mold (in addition, in the present invention, the material of the coating of the forming mold is not particularly limited), and it is necessary to suppress the removal of deposits. This coating is damaged. In order to obtain knowledge about the damage caused by the laser beam to the coating of the forming mold, the inventors observed the surface of the forming mold to investigate the formation process of the deposits. It was found that the deposits first adhered in dots, and then Gradually approach the film-like shape covering almost the entire surface of the cavity surface of the molding die (in Figure 1(a), Figure 1(b), Figure 1(c), Figure 1(d)) and Figure 1(e) In the electron micrograph of, the symbol A is added to indicate attachment). Therefore, when the laser beam is irradiated at the stage where the attachment is dotted, there is a gap (the part where the attachment is not attached) of the dot or the area is not sufficiently enlarged, so the laser beam is directly irradiated to the coating. On the layer, there is therefore a concern about damage to the coating. Therefore, by irradiating the laser beam to the forming mold with an irradiation intensity lower than the irradiation intensity that causes damage to the coating, damage to the coating can be suppressed.

此處,照射至成形模上的雷射光束的照射強度可通過以調整從雷射光源中射出的雷射光束的強度及利用雷射光束移動機構的雷射光束的移動速度,例如每一秒的掃描雷射光功率密度變成2 W/cm2~15 W/cm2,的方式來決定。“每一秒的掃描雷射光功率密度”由在單位時間(單位:sec(秒))內照射至單位面積(單位:cm2)上的雷射光的能量(單位:J(焦耳)=Wsec(瓦秒))來定義,其單位由J/(cm2sec)=Wsec/(cm2sec),即W/cm2來表示。此每一秒的掃描雷射光功率密度可通過如下方式來求出:使進行照射的雷射光束的平均輸出功率除以根據在一秒內雷射光束的光點相對於成形模進行相對移動的距離和所述光點的寬度所導出的面積與單個光點(照射至移動前的初始位置上的部分)的面積的和(換言之,每一秒的掃描雷射光功率密度是在一秒內雷射光束一邊移動一邊照射的部分中的每單位面積的輸出功率)。Here, the intensity of the laser beam irradiated on the forming mold can be adjusted to adjust the intensity of the laser beam emitted from the laser light source and the moving speed of the laser beam using the laser beam moving mechanism, for example, every second The power density of the scanning laser becomes 2 W/cm2~15 W/cm2. "Scanning laser light power density per second" is defined by the energy (unit: J (joule) = Wsec (watts) of laser light irradiated to a unit area (unit: cm2) in a unit time (unit: sec (second)) Second)), and the unit is represented by J/(cm2sec)=Wsec/(cm2sec), that is, W/cm2. The scanning laser light power density per second can be obtained by the following method: dividing the average output power of the irradiated laser beam by the relative movement of the laser beam spot relative to the forming mold in one second The sum of the area derived from the distance and the width of the light spot and the area of a single light spot (the part irradiated to the initial position before movement) (in other words, the power density of the scanning laser light per second is the laser light power density in one second). The output power per unit area in the part irradiated while the beam is moving).

在將每一秒的掃描雷射光功率密度設為2 W/cm2~15 W/cm2的情況下,理想的是雷射光源射出每一個脈衝的雷射光能量密度(laser fluence)為0.04 J/cm2~0.7 J/cm2的脈衝雷射光束。另外,在將每一秒的掃描雷射光功率密度設為2 W/cm2~15 W/cm2的情況下,理想的是將鄰接脈衝雷射光束的重疊率(後述)設為85%以上。通過采用所述任一者或兩者的結構,可在已附著在成形模的表面上的附著物上生成等離子體,並將等離子體加熱至各種種類的附著物氣化的溫度以上的溫度。When the power density of the scanning laser light per second is set to 2 W/cm2~15 W/cm2, it is ideal that the laser light energy density (laser fluence) of each pulse emitted by the laser light source is 0.04 J/cm2 ~0.7 J/cm2 pulsed laser beam. In addition, when the power density of the scanning laser light per second is 2 W/cm 2 to 15 W/cm 2, it is desirable to set the overlap rate of adjacent pulsed laser beams (described later) to 85% or more. By adopting either or both of the above-mentioned structures, plasma can be generated on the deposits that have adhered to the surface of the forming mold, and the plasma can be heated to a temperature higher than the temperature at which various kinds of deposits are vaporized.

此處,“重疊率”由在生成等離子體的空間中,一個脈衝雷射光束所占的體積之中,與鄰接地生成的脈衝雷射光束互相重疊的部分的體積的比例來定義。若鄰接的兩個脈衝雷射光束平行,則重疊率可由生成等離子體的空間中的任意的位置上的一個脈衝雷射光束的和其垂直的剖面之中,與鄰接地生成的脈衝雷射光束的和其垂直的剖面互相重疊的部分的面積的比例來求出。重疊率的倒數相當於照射至同一部位上的脈衝雷射光束的次數。另外,假如不使脈衝雷射光束移動,則重疊率變成100%,但在本發明中使脈衝雷射光束移動,因此重疊率未滿100%。Here, the "overlap ratio" is defined by the ratio of the volume of the portion of the space where the plasma is generated that overlaps with the adjacently generated pulsed laser beam among the volume occupied by one pulsed laser beam. If two adjacent pulsed laser beams are parallel, the overlap ratio can be determined by a pulsed laser beam at an arbitrary position in the plasma generating space and a cross-section perpendicular to the pulsed laser beam. The ratio of the area of the overlapped part of the vertical cross-section is calculated. The reciprocal of the overlap ratio corresponds to the number of pulse laser beams irradiated to the same part. In addition, if the pulse laser beam is not moved, the overlap rate becomes 100%, but in the present invention, the pulse laser beam is moved, so the overlap rate is less than 100%.

在本發明的成形模清潔裝置中,理想的是所述雷射光束移動機構是如下的機構:使所述雷射光束相對於所述成形模在第一方向上往返移動,並且每當使該雷射光束在所述第一方向上進行單程移動時,在垂直於該第一方向的第二方向上,使該雷射光束僅移動該雷射光束照射至所述成形模上的光點的單個範圍;且在所述雷射光束移動機構與所述成形模之間,還包括遮蔽所述第一方向上的往返移動的兩端的所述光點的單個範圍的部分的遮蔽部。由此,在所述兩端中,當雷射光束在第二方向上移動時,遮蔽部遮蔽與所述兩端以外的位置相比過度地照射的雷射光束,因此能夠以更高的均勻性對成形模的表面進行清潔。In the forming mold cleaning device of the present invention, it is desirable that the laser beam moving mechanism is a mechanism that makes the laser beam move back and forth in the first direction relative to the forming mold, and whenever the laser beam is moved When the laser beam moves in a single pass in the first direction, in a second direction perpendicular to the first direction, the laser beam is only moved by the laser beam irradiated to the light spot on the forming mold A single range; and between the laser beam moving mechanism and the forming die, it further includes a shielding portion that shields a portion of the single range of the light spot at both ends of the reciprocating movement in the first direction. Thus, in the two ends, when the laser beam moves in the second direction, the shielding section shields the laser beam that is excessively irradiated compared to the positions other than the two ends, so that it can be more uniform It can clean the surface of the forming mold.

到此為止,對本發明的成形模清潔裝置進行了說明,但成形模清潔方法、樹脂成形裝置、以及樹脂成形品製造方法也取得相同的作用·效果。Up to this point, the molding die cleaning device of the present invention has been described, but the molding die cleaning method, the resin molding apparatus, and the resin molded product manufacturing method also achieve the same actions and effects.

以下,一邊參照圖2~圖23(d),一邊對本發明的成形模清潔裝置及方法、樹脂成形裝置、以及樹脂成形品製造方法的更具體的實施方式進行說明。Hereinafter, with reference to FIGS. 2 to 23(d), more specific embodiments of the molding die cleaning apparatus and method, the resin molding apparatus, and the resin molded product manufacturing method of the present invention will be described.

(1)本實施方式的成形模清潔裝置及樹脂成形裝置的結構 如圖2所示,本實施方式的成形模清潔裝置10是本實施方式的樹脂成形裝置1的構成元件的一部分。樹脂成形裝置1同時具有成形模清潔裝置10與樹脂成形部20。(1) The structure of the mold cleaning device and the resin molding device of this embodiment As shown in FIG. 2, the molding die cleaning device 10 of this embodiment is a part of the constituent elements of the resin molding device 1 of this embodiment. The resin molding apparatus 1 has a molding die cleaning device 10 and a resin molding part 20 at the same time.

首先,對樹脂成形部20的結構進行說明。在本實施方式中,樹脂成形部20是進行轉送(轉注)成形的裝置,包括:基座211;四根(在圖2中僅表示兩根)系杆(tie bar)212,立設在基座211上;可動台板221,以可上下移動的方式保持在系杆212上;固定台板222,固定在系杆212的上端;以及曲柄連杆(toggle link)213,設置在基座211上,使可動台板221上下移動。在可動台板221的上表面與固定台板222的下表面之間,配置有將上模(第一模)251與下模(第二模)252相向地設置的成形模25。First, the structure of the resin molded part 20 is demonstrated. In this embodiment, the resin molding part 20 is a device for transferring (transferring) molding, and includes: a base 211; four (only two are shown in FIG. 2) tie bars 212, which are erected on the base The movable platen 221 is held on the tie rod 212 in a movable manner up and down; the fixed platen 222 is fixed on the upper end of the tie rod 212; and the toggle link 213 is set on the base 211 Up, the movable table 221 is moved up and down. Between the upper surface of the movable platen 221 and the lower surface of the fixed platen 222, there is arranged a forming mold 25 in which an upper mold (first mold) 251 and a lower mold (second mold) 252 are opposed to each other.

圖3中將成形模25及其附近放大表示。在上模251的下表面上,朝上方並列形成有兩個模腔C,在下模252的上表面上,也朝下方並列形成有兩個模腔C。在上模251的下表面、下模252的上表面、以及包圍各模腔C的上模251及下模252的面上施加了氮化鉻制的塗層CT。在塗層CT中,也可以使用硬鉻等其他材料來代替氮化鉻。在本實施方式中,將模腔設為長方體狀,但也可以對應於將要製造的樹脂成形品的形狀而設為圓柱狀等形狀。In FIG. 3, the molding die 25 and its vicinity are enlarged and shown. On the lower surface of the upper mold 251, two cavities C are formed side by side upward, and on the upper surface of the lower mold 252, two cavities C are formed side by side downward. Coating CT made of chromium nitride is applied to the lower surface of the upper mold 251, the upper surface of the lower mold 252, and the surfaces of the upper mold 251 and the lower mold 252 surrounding each cavity C. In coating CT, other materials such as hard chromium can also be used instead of chromium nitride. In the present embodiment, the cavity is made into a rectangular parallelepiped shape, but it may be made into a shape such as a column according to the shape of the resin molded product to be manufactured.

位於下模252的兩個模腔C的周圍的下模252的上表面分別可載置引線框架L。另外,也可以在下模252的上表面上載置基板等來代替引線框架L。The upper surface of the lower mold 252 located around the two cavities C of the lower mold 252 can respectively mount the lead frame L. In addition, instead of the lead frame L, a substrate or the like may be placed on the upper surface of the lower mold 252.

在下模252的兩個模腔C之間,設置有收容樹脂材料的料筒2521及從料筒2521擠出樹脂材料的柱塞2522。另外,下模252的兩個模腔C分別通過作為如後述那樣進行了軟化或熔融的樹脂材料穿過的通道的流道(runner)2523而與料筒2521連接。在上模251的兩個模腔C之間且在與料筒2521相向的位置上設置有剔除塊(cull block)2511。上模251的兩個模腔C分別通過流道2513而與剔除塊2511的正下方的空間連接。Between the two cavities C of the lower mold 252, a cylinder 2521 for accommodating a resin material and a plunger 2522 for extruding the resin material from the cylinder 2521 are provided. In addition, the two cavities C of the lower mold 252 are respectively connected to the cylinder 2521 through runners 2523 as passages through which the softened or melted resin material passes as described later. A cull block 2511 is provided between the two cavities C of the upper mold 251 and at a position opposite to the barrel 2521. The two cavities C of the upper mold 251 are connected to the space directly below the rejection block 2511 through the runner 2513 respectively.

另外,樹脂成形部20具有使上模251及下模252升溫而在樹脂成形時將引線框架L及樹脂材料維持成規定的溫度的加熱板253。在加熱板253中內置有加熱器2531。加熱器2531例如可使用筒形加熱器(cartridge heater)。In addition, the resin molding unit 20 has a heating plate 253 that raises the temperature of the upper mold 251 and the lower mold 252 to maintain the lead frame L and the resin material at a predetermined temperature during resin molding. A heater 2531 is built in the heating plate 253. For the heater 2531, a cartridge heater can be used, for example.

成形模清潔裝置10具有雷射光源11、雷射光束移動部(雷射光束移動機構)12、反射鏡13、XY平臺14、及XY平臺驅動器15。The molding die cleaning device 10 includes a laser light source 11, a laser beam moving part (laser beam moving mechanism) 12, a mirror 13, an XY stage 14, and an XY stage driver 15.

雷射光源11是射出脈衝雷射光的光源。在本實施方式中,雷射光源11射出的脈衝雷射光因後述的理由,而將每一個脈衝的雷射光能量密度設為0.04 J/cm2~0.7 J/cm2的範圍內,將每一秒的掃描雷射光功率密度設為2 W/cm2~15 W/cm2的範圍內,將脈衝寬度設為1 nsec~200 nsec的範圍內,將脈衝重複頻率設為300 kHz~10 MHz的範圍內。另外,在本實施方式中,雷射光源11使用如下者:以在與光束垂直的剖面中的形狀(光束光點)變成正方形的方式成形,並且射出從所述剖面的中央至端部為止具有大致相等的禮帽(top hat)型的照射強度分布的脈衝雷射光束。另外,光束光點的形狀也可以是長方形、圓形、圓環狀等正方形以外的形狀。此處,光束光點的範圍(尺寸)由1/e2法(86%法)來定義。光點尺寸可通過奧菲爾(Ophir)公司、或相干(Coherent)公司製造的相機式光束質量分析儀(beam profiler)來測定。另外,可使用奧菲爾公司、或相干公司製造的功率計,求出雷射光束的平均輸出功率,並根據光點尺寸及雷射光束的平均輸出功率來求出每一秒的掃描雷射光功率密度。每一個脈衝的雷射光能量密度是使所述雷射光束的平均輸出功率除以脈衝重複頻率所得的值。脈衝寬度可使用安捷倫科技(Agilent Technologies)公司製造的示波器來測定。另外,雷射光束的平均輸出功率可通過“雷射光束的平均輸出功率[W]=脈衝能量[J]×脈衝重複頻率[Hz]”的式子來求出。The laser light source 11 is a light source that emits pulsed laser light. In this embodiment, the pulsed laser light emitted by the laser light source 11 has the energy density of the laser light per pulse within the range of 0.04 J/cm2 to 0.7 J/cm2 for reasons described later, and the The power density of the scanning laser is set in the range of 2 W/cm2 to 15 W/cm2, the pulse width is set in the range of 1 nsec to 200 nsec, and the pulse repetition frequency is set in the range of 300 kHz to 10 MHz. In addition, in this embodiment, the laser light source 11 is shaped such that the shape (beam spot) in the cross section perpendicular to the beam becomes square, and the laser light source 11 emits light from the center to the end of the cross section. A pulsed laser beam with an approximately equal top hat-type irradiation intensity distribution. In addition, the shape of the beam spot may be a shape other than a square such as a rectangle, a circle, and an annular shape. Here, the range (size) of the beam spot is defined by the 1/e2 method (86% method). The spot size can be measured by a camera-type beam profiler manufactured by Ophir Company or Coherent Company. In addition, you can use a power meter manufactured by Orpheus or Coherent to obtain the average output power of the laser beam, and obtain the scanning laser light per second based on the spot size and the average output power of the laser beam Power density. The laser light energy density of each pulse is the value obtained by dividing the average output power of the laser beam by the pulse repetition frequency. The pulse width can be measured using an oscilloscope manufactured by Agilent Technologies. In addition, the average output power of the laser beam can be calculated by the formula "average output power of the laser beam [W] = pulse energy [J] × pulse repetition frequency [Hz]".

雷射光束移動部12具有振鏡掃描頭121與透鏡122(參照圖4(a)及圖4(b))。振鏡掃描頭121使從雷射光源11導入的脈衝雷射光束B以在X方向(圖2的與紙面垂直的方向)上重複往返移動(圖4(a)),並且也在Z方向(圖2的縱向)上移動(圖4(b))的方式射出。在本實施方式中,以重疊率變成85%以上的方式設定利用雷射光束移動部12的脈衝雷射光束的移動速度。在所述移動時,存在光點尺寸根據脈衝雷射光束B的移動範圍的大小而在中心位置附近與端部附近變化的可能性,若如此變化,則照射強度根據位置而變化。因此,理想的是通過使透鏡122采用遠心透鏡(telecentric lens)或照射深度足夠長的透鏡,而抑制由位置所引起的光點尺寸的變化。另外,在圖4(a)及圖4(b)所示的例子中,在振鏡掃描頭121的後段配置透鏡122,但也可以在振鏡掃描頭121的前段配置具有多片透鏡的電動式光束直徑可變透鏡(省略圖示),也可以並用透鏡122與電動式光束直徑可變透鏡。在使用電動式光束直徑可變透鏡的情況下,通過使光束直徑對照所述重複往返移動而變化,可使成形模25的表面上的光點尺寸變成大致固定。The laser beam moving unit 12 has a galvanometer scanning head 121 and a lens 122 (refer to FIGS. 4(a) and 4(b)). The galvanometer scanning head 121 causes the pulsed laser beam B introduced from the laser light source 11 to repeatedly move back and forth in the X direction (the direction perpendicular to the paper surface in FIG. 2) (FIG. 4(a)), and also in the Z direction ( The longitudinal direction of Fig. 2) moves upwards (Fig. 4(b)). In this embodiment, the moving speed of the pulsed laser beam by the laser beam moving part 12 is set so that the overlap ratio becomes 85% or more. During the movement, there is a possibility that the spot size changes in the vicinity of the center position and the vicinity of the end depending on the size of the movement range of the pulsed laser beam B. If this changes, the irradiation intensity changes depending on the position. Therefore, it is desirable to use a telecentric lens or a lens with a sufficiently long irradiation depth as the lens 122 to suppress the change in the spot size caused by the position. In addition, in the example shown in Figs. 4(a) and 4(b), the lens 122 is arranged at the rear stage of the galvanometer scanning head 121, but a motorized lens with multiple lenses may be arranged at the front stage of the galvanometer scanning head 121. A variable beam diameter lens (not shown) may be used in combination with the lens 122 and a motorized variable beam diameter lens. In the case of using a motorized variable beam diameter lens, by changing the beam diameter according to the repeated reciprocating movement, the spot size on the surface of the forming mold 25 can be made substantially constant.

反射鏡13是反射脈衝雷射光束B的鏡,在X方向上具有比雷射光束移動部12使脈衝雷射光束B往返移動的範圍大的寬度。例如可將包含合成石英玻璃(熔融二氧化矽)的鏡用於反射鏡13。另外,也可以在反射鏡13的表面上施加包含金屬膜的塗層。作為此種塗層,只要從金制的塗層、銀制的塗層、鋁制的塗層、電介質多層膜等中選擇最合適者即可。The mirror 13 is a mirror that reflects the pulsed laser beam B, and has a wider width in the X direction than the range in which the laser beam moving unit 12 moves the pulsed laser beam B back and forth. For example, a mirror containing synthetic quartz glass (fused silica) can be used for the mirror 13. In addition, a coating containing a metal film may be applied on the surface of the mirror 13. As such a coating, the most suitable one may be selected from among gold coatings, silver coatings, aluminum coatings, and dielectric multilayer films.

如圖5所示,反射鏡13的X方向的一端由第一握持工具131L握持,另一端由第二握持工具131R握持。在第一握持工具131L、第二握持工具131R上分別設置有在X方向上延長的第一轉動軸體132L、第二轉動軸體132R。第一轉動軸體132L插通在軸承133L中。另外,第二轉動軸體132R插通在轉動軸體可動保持工具133R中。轉動軸體可動保持工具133R也可以是軸承。另外,在圖5中,在立體圖中,將穿過第一轉動軸體132L及第二轉動軸體132R的Z方向的剖面合並表示,並且關於反射鏡13,以實線來表示與所述剖面相比Y方向的裏側,以虛線來表示跟前側(即,在所述虛線的部分中也存在反射鏡13)。As shown in FIG. 5, one end of the mirror 13 in the X direction is held by the first holding tool 131L, and the other end is held by the second holding tool 131R. The first holding tool 131L and the second holding tool 131R are respectively provided with a first rotating shaft body 132L and a second rotating shaft body 132R extending in the X direction. The first rotating shaft body 132L is inserted through the bearing 133L. In addition, the second rotating shaft body 132R is inserted into the rotating shaft body movable holding tool 133R. The movable shaft holding tool 133R may be a bearing. In addition, in FIG. 5, in the perspective view, a cross section in the Z direction passing through the first rotation shaft 132L and the second rotation shaft 132R is combined and shown, and the mirror 13 is shown with a solid line as the cross section. Compared to the back side in the Y direction, the front side is indicated by a dotted line (that is, the mirror 13 is also present in the dotted line).

如在圖6(a)中放大表示那樣,在與軸承133L相比轉動軸方向的外側(X方向上反射鏡13的相反側)的第一轉動軸體132L的表面上,設置有繞轉動軸一圈的槽1321L。第一固定工具135L嵌入槽1321L中。另外,第一固定工具135L只要從槽1321L延伸出即可,外徑比軸承133L小。軸承133L通過第一轉動軸體132L由以其直徑不同的方式形成的段差與第一固定工具135L在軸方向上夾持的方式,並容許第一轉動軸體132L環繞X方向的轉動軸進行轉動,且經由軸承133L而以在與所述轉動軸平行的方向上幾乎不移動的方式限制第一轉動軸體132L。軸承133L被軸承保持部134L與從反射鏡13來看設置在所述軸承保持部134L的外側的軸承固定工具137L夾持而得到固定。As shown in enlargement in FIG. 6(a), on the surface of the first rotation shaft body 132L on the outer side of the rotation axis direction (opposite side of the mirror 13 in the X direction) than the bearing 133L, a rotation axis A circle of grooves 1321L. The first fixing tool 135L is inserted into the groove 1321L. In addition, the first fixing tool 135L only needs to extend from the groove 1321L, and the outer diameter is smaller than that of the bearing 133L. The bearing 133L is clamped in the axial direction of the first fixed tool 135L by the step difference formed by the diameter of the first rotating shaft 132L, and allows the first rotating shaft 132L to rotate around the axis of rotation in the X direction. , And via the bearing 133L, the first rotating shaft body 132L is restricted so as to hardly move in the direction parallel to the rotating shaft. The bearing 133L is clamped and fixed by the bearing holding portion 134L and a bearing fixing tool 137L provided on the outside of the bearing holding portion 134L as viewed from the mirror 13.

另外,如在圖6(b)中放大表示那樣,在與轉動軸體可動保持工具133R相比轉動軸方向的外側的第二轉動軸體132R的表面上設置有槽1321R。第二固定工具135R嵌入槽1321R中。另外,第二固定工具135R無需遍及槽1321R的整體來設置。轉動軸體可動保持工具133R通過第二轉動軸體132R由以其直徑不同的方式形成的段差與第二固定工具135R在軸方向上夾持的方式,而在軸方向上固定與第二轉動軸體132R的位置關係,並以容許第二轉動軸體132R環繞X方向的轉動軸進行轉動的方式保持所述第二轉動軸體132R。轉動軸體可動保持工具133R由外側保持工具134R保持,且相對於所述外側保持工具134R,可與第二轉動軸體132R一同在軸方向上移動。圖6(c)中表示與圖6(b)的情況相比反射鏡13膨脹,伴隨於此,第二轉動軸體132R及轉動軸體可動保持工具133R已朝反射鏡13的相反側移動的狀態的例子。通過第二轉動軸體132R及轉動軸體可動保持工具133R如所述那樣進行移動,可抑制施加至反射鏡13中的負荷,而抑制反射鏡13的變形。當反射鏡13進行收縮時,第二轉動軸體132R及轉動軸體可動保持工具133R朝相反方向移動,由此可抑制反射鏡13的變形。另外,也可以將使轉動軸體可動保持工具133R、外側保持工具134R及第二固定工具135R合並而成者看作轉動軸體可動保持工具。In addition, as shown in an enlarged view in FIG. 6( b ), a groove 1321R is provided on the surface of the second rotating shaft 132R on the outer side of the rotating shaft direction than the rotating shaft movable holding tool 133R. The second fixing tool 135R is inserted into the groove 1321R. In addition, the second fixing tool 135R does not need to be provided throughout the entire groove 1321R. The rotating shaft movable holding tool 133R is clamped in the axial direction by the second rotating shaft 132R with the second fixed tool 135R formed by the difference in its diameter, and fixed to the second rotating shaft in the axial direction. The positional relationship of the body 132R is maintained in a manner that allows the second rotation shaft 132R to rotate around the rotation axis in the X direction. The rotating shaft movable holding tool 133R is held by the outer holding tool 134R, and can move in the axial direction together with the second rotating shaft 132R relative to the outer holding tool 134R. Fig. 6(c) shows that the mirror 13 expands compared to the case of Fig. 6(b). Accompanying this, the second rotating shaft 132R and the rotating shaft movable holding tool 133R have moved to the opposite side of the mirror 13 Examples of status. By moving the second rotation shaft 132R and the movable holding tool 133R of the rotation shaft as described above, the load applied to the mirror 13 can be suppressed, and the deformation of the mirror 13 can be suppressed. When the mirror 13 shrinks, the second rotation shaft 132R and the rotation shaft movable holding tool 133R move in opposite directions, thereby suppressing the deformation of the mirror 13. In addition, a combination of the rotating shaft movable holding tool 133R, the outer holding tool 134R, and the second fixed tool 135R may be regarded as the rotating shaft movable holding tool.

此處,通過第一固定工具135L以及由軸承保持部134L及軸承固定工具137L固定的軸承133L,以在與轉動軸平行的方向上幾乎不移動的方式限制一對轉動軸體中的一者(第一轉動軸體132L),但也可以通過轉動軸體可動保持工具及夾具,使兩個轉動軸體在與轉動軸平行的方向上,在固定的範圍內可動。Here, by the first fixing tool 135L and the bearing 133L fixed by the bearing holding portion 134L and the bearing fixing tool 137L, one of the pair of rotating shaft bodies is restricted so as to hardly move in the direction parallel to the rotating shaft ( The first rotating shaft body 132L), but it is also possible to move the tools and jigs through the rotating shaft body, so that the two rotating shaft bodies are movable within a fixed range in a direction parallel to the rotating shaft.

如圖7(a)所示,第一握持工具131L與第二握持工具131R在反射鏡13的背面側(圖5中所示的反射鏡13的背後側),通過兩根軸138(圖5中省略圖示)來連結。軸138固定在第一握持工具131L上,相對於此,經由滑動軸承(襯套)139而安裝在第二握持工具131R上。軸138除具有減少反射鏡13轉動時在反射鏡13中產生的扭轉等負荷的作用以外,具有在組裝時,使第一轉動軸體132L與第二轉動軸體132R的旋轉軸中心對準的作用。圖7(b)中表示與圖7(a)的情況相比反射鏡13膨脹,且伴隨於此,第二握持工具131R已朝反射鏡13的相反側移動的狀態的例子。通過第二握持工具131R如所述那樣進行移動,可抑制施加至反射鏡13中的負荷,而抑制反射鏡13的變形。當反射鏡13進行收縮時,第二握持工具131R朝相反方向移動,由此可抑制反射鏡13的變形。As shown in Fig. 7(a), the first holding tool 131L and the second holding tool 131R are on the back side of the mirror 13 (the back side of the mirror 13 shown in Fig. 5) and pass through two shafts 138 ( (Illustration omitted in Figure 5) to link. The shaft 138 is fixed to the first holding tool 131L, and on the other hand, is mounted to the second holding tool 131R via a sliding bearing (bush) 139. The shaft 138 has the function of reducing the load such as torsion generated in the mirror 13 when the mirror 13 rotates, and has the function of aligning the rotation axis centers of the first rotating shaft body 132L and the second rotating shaft body 132R during assembly. effect. FIG. 7( b) shows an example of a state in which the mirror 13 expands compared to the case of FIG. 7( a ), and accompanying this, the second holding tool 131R has moved to the opposite side of the mirror 13. By moving the second holding tool 131R as described above, it is possible to suppress the load applied to the mirror 13 and suppress the deformation of the mirror 13. When the mirror 13 shrinks, the second holding tool 131R moves in the opposite direction, thereby suppressing the deformation of the mirror 13.

在反射鏡13中,進而經由例如齒輪、或滑輪及傳送帶等動力傳遞機構(省略圖示)而連接有使該反射鏡13環繞轉動軸進行旋轉的馬達(反射方向變更機構)136(參照圖2)。動力傳遞機構通常對軸承保持部134L或外側保持工具134R的至少一者發揮作用。從動力傳遞機構傳遞至軸承保持部134L及外側保持工具134R的一者中的動力經由反射鏡13而傳遞至另一者中。此時,軸138以減少施加至反射鏡13中的扭轉等負荷的方式工作,因此即便在反射鏡13的厚度不足夠厚的情況下,也可以抑制變形。當通過馬達136而使反射鏡13的反射面向下且相對於Y軸傾斜了45°時,脈衝雷射光束B垂直地照射至下模252的表面上。另外,當反射鏡13的反射面向上且相對於Y軸傾斜了45°時,脈衝雷射光束B垂直地照射至上模251的表面上。另一方面,當反射鏡13的反射面向下或向上且以45°以外的角度相對於Y軸進行了傾斜時,脈衝雷射光束B以相對於下模252或上模251的表面傾斜的角度進行照射。The mirror 13 is further connected to a motor (reflection direction changing mechanism) 136 that rotates the mirror 13 around the axis of rotation via a power transmission mechanism (not shown) such as gears, pulleys, and conveyor belts (see FIG. 2 ). The power transmission mechanism normally acts on at least one of the bearing holding portion 134L or the outer holding tool 134R. The power transmitted from the power transmission mechanism to one of the bearing holder 134L and the outer holding tool 134R is transmitted to the other through the mirror 13. At this time, the shaft 138 operates to reduce the load such as torsion applied to the mirror 13, so even if the thickness of the mirror 13 is not sufficiently thick, deformation can be suppressed. When the reflecting surface of the mirror 13 is tilted by 45° with respect to the Y axis by the motor 136, the pulsed laser beam B is vertically irradiated on the surface of the lower mold 252. In addition, when the reflecting surface of the reflecting mirror 13 is upward and inclined by 45° with respect to the Y axis, the pulsed laser beam B is irradiated on the surface of the upper mold 251 vertically. On the other hand, when the reflecting surface of the mirror 13 is downward or upward and is inclined with respect to the Y axis at an angle other than 45°, the pulse laser beam B is inclined at an angle relative to the surface of the lower mold 252 or the upper mold 251 Perform irradiation.

雷射光源11、雷射光束移動部12及反射鏡13安裝在XY平臺14上。XY平臺14通過XY平臺驅動器15的控制,而使所述雷射光源11、雷射光束移動部12及反射鏡13一邊維持所述三個構成元件的相對的位置關係,一邊在X方向及Y方向上移動。在清潔時,反射鏡13等通過此XY平臺14,而在X方向及Y方向上分別在比上模251及下模252的X方向及Y方向的寬度略大的範圍內移動。與此同時,XY平臺14也具有使成形模清潔裝置10的位置以如下方式在Y方向上移動的功能:在清潔時將反射鏡13配置在位於上模251與下模252之間的空間內的使用位置(圖8(a))上,在樹脂成形時將包含反射鏡13的成形模清潔裝置10的整體配置在作為所述空間外的位置的待機位置(圖8(b))上。The laser light source 11, the laser beam moving part 12 and the reflecting mirror 13 are installed on the XY platform 14. The XY stage 14 is controlled by the XY stage driver 15 so that the laser light source 11, the laser beam moving part 12, and the mirror 13 maintain the relative positional relationship of the three constituent elements while moving in the X direction and Y direction. Move in the direction. During cleaning, the mirror 13 and the like pass through the XY stage 14 to move in the X direction and the Y direction in a range slightly larger than the widths of the upper mold 251 and the lower mold 252 in the X direction and Y direction, respectively. At the same time, the XY stage 14 also has a function of moving the position of the forming mold cleaning device 10 in the Y direction as follows: the mirror 13 is arranged in the space between the upper mold 251 and the lower mold 252 during cleaning In the use position (FIG. 8(a)), the entire mold cleaning device 10 including the mirror 13 is arranged in the standby position (FIG. 8(b)) which is a position outside the space during resin molding.

XY平臺14為了一邊維持雷射光源11、雷射光束移動部12及反射鏡13的相對的位置關係,一邊使雷射光源11、雷射光束移動部12及反射鏡13在X方向上移動,如圖9所示,也可以通過在Y方向上延長的連結棒141來將雷射光源11及雷射光束移動部12與反射鏡13連結。此處,雷射光源11及雷射光束移動部12載置在底座112上,且將連結棒141固定在此底座112上。在反射鏡13側,將連結棒141固定在軸承保持部134L及外側保持工具134R上。在這些軸承保持部134L及外側保持工具134R中,設置有在與第一轉動軸體132L及第二轉動軸體132R相同的方向上延長的孔(未圖示),反射鏡13及作為其附屬品的軸承保持部134L或外側保持工具134R沿著插通在此孔中的引導棒142而在Y方向上移動。通過此種結構,可僅通過一個動力源(未圖示)來使在Y方向上分開配置的雷射光源11及雷射光束移動部12與反射鏡13在X方向上移動。通過如所述那樣減少動力源的數量,而抑制動力源從成形模受到的由熱所產生的影響,因此也可以減少對所述動力源進行冷卻的冷卻機構(未圖示)的數量。In order to maintain the relative positional relationship of the laser light source 11, the laser beam moving part 12, and the reflecting mirror 13, the XY stage 14 moves the laser light source 11, the laser beam moving part 12, and the reflecting mirror 13 in the X direction. As shown in FIG. 9, the laser light source 11 and the laser beam moving part 12 may be connected to the reflecting mirror 13 by a connecting rod 141 extending in the Y direction. Here, the laser light source 11 and the laser beam moving part 12 are placed on the base 112, and the connecting rod 141 is fixed on the base 112. On the mirror 13 side, the connecting rod 141 is fixed to the bearing holding portion 134L and the outer holding tool 134R. In the bearing holding portion 134L and the outer holding tool 134R, there are provided holes (not shown) extending in the same direction as the first rotating shaft body 132L and the second rotating shaft body 132R, the mirror 13 and its accessories. The bearing holding portion 134L or the outer holding tool 134R of the product moves in the Y direction along the guide rod 142 inserted in this hole. With this structure, the laser light source 11, the laser beam moving part 12, and the mirror 13 that are separately arranged in the Y direction can be moved in the X direction by only one power source (not shown). By reducing the number of power sources as described above, the influence of heat that the power sources receive from the forming die is suppressed, and therefore the number of cooling mechanisms (not shown) for cooling the power sources can also be reduced.

另外,當上模251與下模252的X方向的寬度比利用雷射光束移動部12的脈衝雷射光束B的往返移動的範圍小時,也可以使用僅使所述三個構成元件在Y方向上移動的機構來代替XY平臺14及XY平臺驅動器15。或者,也可以不必維持雷射光源11及雷射光束移動部12與反射鏡13的Y方向的相對的位置關係,而僅使反射鏡13在Y方向上移動。另外,如圖10所示,當使用X方向的寬度比成形模25的X方向上的雷射光束的照射範圍大的反射鏡13W時,只要僅使雷射光源11及雷射光束移動部12在Y方向上移動即可,無需使反射鏡13W在X方向上移動。In addition, when the width of the upper mold 251 and the lower mold 252 in the X direction is smaller than the range of the reciprocating movement of the pulsed laser beam B by the laser beam moving part 12, it is also possible to use only the three components in the Y direction. The upward movement mechanism replaces the XY stage 14 and the XY stage driver 15. Alternatively, it is not necessary to maintain the relative positional relationship between the laser light source 11 and the laser beam moving portion 12 and the reflecting mirror 13 in the Y direction, and only the reflecting mirror 13 may be moved in the Y direction. In addition, as shown in FIG. 10, when using a mirror 13W whose width in the X direction is larger than the irradiation range of the laser beam in the X direction of the molding die 25, only the laser light source 11 and the laser beam moving part 12 are required. It is sufficient to move in the Y direction, and there is no need to move the mirror 13W in the X direction.

成形模清潔裝置10除所述各構成元件以外,也可以具有在上模251及下模252之間的空間內抽吸氣體並朝樹脂成形裝置1外排出的氣化附著物去除部(省略圖示)。在此情況下,也可以在氣化附著物去除部中進而設置氣化附著物捕獲過濾器(省略圖示)。In addition to the above-mentioned components, the molding die cleaning device 10 may also have a vaporized deposit removing portion (illustration omitted) that sucks gas in the space between the upper mold 251 and the lower mold 252 and discharges it to the outside of the resin molding device 1 Show). In this case, a vaporization deposit capture filter (not shown) may be further provided in the vaporization deposit removal part.

(2)本實施方式的成形模清潔裝置及樹脂成形裝置的動作、以及本實施方式的成形模清潔方法及樹脂成形品製造方法對本實施方式的成形模清潔裝置10及樹脂成形裝置1的動作、以及本實施方式的成形模清潔方法及樹脂成形品製造方法進行說明。以下,首先對由樹脂成形裝置1中的樹脂成形部20所進行(除成形模的清潔的動作以外)的樹脂成形時的動作進行說明,其次對樹脂成形裝置1中的成形模清潔裝置10的動作進行說明。所述成形模清潔裝置10的動作相當於本發明的成形模清潔方法的實施方式。另外,將樹脂成形部20的動作與成形模清潔裝置10的動作組合而成者相當於本發明的樹脂成形品製造方法的實施方式。(2) The actions of the molding die cleaning device and resin molding apparatus of this embodiment, and the actions of the molding die cleaning method and resin molded product manufacturing method of this embodiment to the molding die cleaning device 10 and resin molding device 1 of this embodiment, And the mold cleaning method and the resin molded product manufacturing method of this embodiment are demonstrated. Hereinafter, first, the operation of the resin molding unit 20 in the resin molding apparatus 1 (except for the cleaning of the molding die) during resin molding will be described, and secondly, the operation of the molding die cleaning device 10 in the resin molding apparatus 1 will be described. The action is explained. The operation of the forming mold cleaning device 10 corresponds to the embodiment of the forming mold cleaning method of the present invention. In addition, the combination of the operation of the resin molding part 20 and the operation of the mold cleaning device 10 corresponds to an embodiment of the resin molded product manufacturing method of the present invention.

(2-1)由樹脂成形部20所進行的樹脂成形時的動作 使用圖11(a)及圖11(b),對通過樹脂成形部20來製造樹脂成形品時的動作進行說明。當製造樹脂成形品時,事先通過XY平臺14來使成形模清潔裝置10的整體移動至待機位置(圖8(b))上。如所述那樣,待機位置是上模251與下模252之間的空間外的位置,成形模清潔裝置10不會妨礙製造樹脂成形品時的樹脂成形部20的動作。(2-1) Actions during resin molding by the resin molding section 20 Using FIGS. 11( a) and 11 (b ), the operation when a resin molded product is manufactured by the resin molding part 20 will be described. When manufacturing a resin molded product, the entire mold cleaning device 10 is moved to the standby position (FIG. 8( b )) by the XY stage 14 in advance. As described above, the standby position is a position outside the space between the upper mold 251 and the lower mold 252, and the mold cleaning device 10 does not interfere with the operation of the resin molded part 20 when the resin molded product is manufactured.

首先,使可動台板221下降,由此變成使上模251與下模252上下分離的開模的狀態(圖11(a))。在此狀態下,將在上表面及下表面上安裝有電子零件的引線框架L以使所述電子零件與模腔C的橫向的位置對準的方式,載置在下模252的上表面上。另外,利用未圖示的樹脂材料供給機構將板狀的樹脂材料P供給至料筒2521內。樹脂材料P例如為含有熱硬化性樹脂(環氧系樹脂等)的複合材料。在樹脂材料P中,也可以包含蠟(高級脂肪酸酯等)、硬化促進劑(磷系催化劑、氨基系催化劑等)、偶聯劑、著色劑、阻燃劑、阻燃助劑等。樹脂材料供給機構是在以前的樹脂成形裝置中廣泛使用者,而省略詳細的說明。樹脂材料P內的熱硬化性樹脂通過從加熱板253供給的熱而在料筒2521內軟化或熔融。上模251也通過加熱板253而變成已升溫至規定的溫度的狀態。First, by lowering the movable platen 221, the upper mold 251 and the lower mold 252 are separated from the upper and lower molds in an open state (FIG. 11(a)). In this state, the lead frame L with electronic components mounted on the upper and lower surfaces is placed on the upper surface of the lower mold 252 in such a manner that the electronic components are aligned with the lateral position of the cavity C. In addition, the plate-shaped resin material P is supplied into the cylinder 2521 by a resin material supply mechanism not shown. The resin material P is a composite material containing thermosetting resin (epoxy resin etc.), for example. The resin material P may also contain wax (higher fatty acid esters, etc.), hardening accelerators (phosphorus-based catalysts, amino-based catalysts, etc.), coupling agents, colorants, flame retardants, flame retardant auxiliary agents, and the like. The resin material supply mechanism is widely used in conventional resin molding apparatuses, and detailed description is omitted. The thermosetting resin in the resin material P is softened or melted in the cylinder 2521 by the heat supplied from the heating plate 253. The upper mold 251 is also heated to a predetermined temperature by the heating plate 253.

在料筒2521內的熱硬化性樹脂軟化或熔融後,通過曲柄連杆213來使可動台板221上升(圖11(b))。由此,可動台板221上的下模252經由引線框架L而抵接在上模251上並按壓所述上模251,由於上模251被固定在固定台板222上,因此成形模25被合模。在此狀態下使柱塞2522上升,由此將料筒2521內的樹脂材料P經由流道2513及流道2523而供給至上模251及下模252的模腔C中。若經過規定時間,則樹脂材料P內的熱硬化性樹脂硬化,可獲得引線框架L上樹脂成形後的樹脂成形品。其後,通過曲柄連杆213來使可動台板221下降,由此將成形模25開模,並從成形模25上卸下樹脂成形品。After the thermosetting resin in the cylinder 2521 is softened or melted, the movable platen 221 is raised by the crank connecting rod 213 (FIG. 11( b )). Thereby, the lower mold 252 on the movable platen 221 abuts against the upper mold 251 via the lead frame L and presses the upper mold 251. Since the upper mold 251 is fixed to the fixed platen 222, the forming mold 25 is Clamping. By raising the plunger 2522 in this state, the resin material P in the cylinder 2521 is supplied to the cavities C of the upper mold 251 and the lower mold 252 via the runner 2513 and the runner 2523. After a predetermined time has elapsed, the thermosetting resin in the resin material P is cured, and a resin molded product after resin molding on the lead frame L can be obtained. After that, the movable platen 221 is lowered by the crank connecting rod 213 to open the mold 25 and remove the resin molded product from the mold 25.

通過重複進行到此為止的動作,可製造許多樹脂成形品。但是,在重複進行樹脂成形品的製造的期間內,樹脂材料P中所含有的熱硬化性樹脂或填料等的一部分逐漸地附著在成形模25的表面上。因此,每製造規定個數的樹脂成形品、或每規定時間,使成形模清潔裝置10如以下所述那樣進行動作,由此對成形模25的表面進行清潔。By repeating the operations so far, many resin molded products can be manufactured. However, during the repeated production of the resin molded product, a part of the thermosetting resin or filler contained in the resin material P gradually adheres to the surface of the molding die 25. Therefore, every time a predetermined number of resin molded products are manufactured or every predetermined time, the molding die cleaning device 10 is operated as described below, thereby cleaning the surface of the molding die 25.

(2-2)成形模清潔裝置10的動作 首先,在成形模25已開模的狀態下,通過XY平臺14來使成形模清潔裝置10移動至使用位置(圖8(a))上,即以將反射鏡13配置在上模251與下模252之間的方式使成形模清潔裝置10移動(參照圖2)。此時,反射鏡13的反射面可以是向上及向下的任一種狀態,在前者的情況下首先對上模251進行清潔,在後者的情況下首先對下模252進行清潔。以下,將此時間點的反射鏡13為如圖2及圖4(b)中由實線所示那樣反射面向下的情況作為例子進行說明。附著在成形模25上的附著物含有樹脂材料P、基板或引線框架中所包含的任一種材料·成分。另外,存在附著物也附著在分模面(上模251的下表面及下模252的上表面)或流道等樹脂通道上的情況,而存在這些附著物阻礙連續成形的擔憂。(2-2) Action of the forming mold cleaning device 10 First, in the state that the forming mold 25 has been opened, the XY stage 14 is used to move the forming mold cleaning device 10 to the use position (Figure 8(a)), that is, the mirror 13 is arranged on the upper mold 251 and the lower mold. The pattern between the molds 252 moves the forming mold cleaning device 10 (refer to FIG. 2 ). At this time, the reflecting surface of the reflecting mirror 13 can be either upward or downward. In the former case, the upper mold 251 is cleaned first, and in the latter case, the lower mold 252 is cleaned first. Hereinafter, a case where the reflecting mirror 13 at this time point has the reflecting surface downward as indicated by the solid line in FIGS. 2 and 4(b) will be described as an example. The deposit attached to the mold 25 contains any one of the materials and components contained in the resin material P, the substrate, or the lead frame. In addition, deposits may also adhere to the parting surface (the lower surface of the upper mold 251 and the upper surface of the lower mold 252) or resin channels such as runners, and these deposits may hinder continuous molding.

在此狀態下,雷射光源11以所述脈衝重複頻率射出具有所述每一個脈衝的雷射光能量密度及脈衝寬度的脈衝雷射光束B。由此,脈衝雷射光束B由反射鏡13反射90°後照射至下模252的表面上。此時,雷射光束移動部12如在圖4(a)的平面圖及圖4(b)的側面圖中概念性地表示那樣,使脈衝雷射光束B在X方向上在規定範圍(圖4(a)中的XL與XR之間的範圍)內重複往返移動,且每當在X方向上進行一次單程移動時,在Z方向上使脈衝雷射光束B的光點BS單個單個地在規定範圍(圖4(b)中的ZT與ZB之間的範圍)內移動。由此,在下模252的表面上,首先,脈衝雷射光束B的光點在X方向上僅移動所述規定範圍(圖4(a))。其後,若脈衝雷射光束B在Z方向上僅移動光點BS的單個範圍,則脈衝雷射光束B由反射鏡13反射90°後在下模252的表面上產生的光點BS在Y方向上僅移動光點的單個範圍(圖4(b))。由此,下模252的表面上的光點BS重複如下的鋸齒形的移動:在X方向上進行單程移動,繼而在Y方向上僅移動光點BS的單個範圍,然後在X方向上朝與剛才相反的方向移動(圖12)。In this state, the laser light source 11 emits a pulsed laser beam B having the laser light energy density and pulse width of each pulse at the pulse repetition frequency. Thus, the pulsed laser beam B is reflected by the reflector 13 by 90° and irradiated on the surface of the lower mold 252. At this time, the laser beam moving unit 12, as conceptually shown in the plan view of FIG. 4(a) and the side view of FIG. 4(b), causes the pulsed laser beam B to be within a predetermined range in the X direction (FIG. 4 (A) The range between XL and XR) repeats the reciprocating movement, and every time a one-way movement is performed in the X direction, the spot BS of the pulsed laser beam B is individually specified in the Z direction Move within the range (the range between ZT and ZB in Figure 4(b)). Thus, on the surface of the lower mold 252, first, the spot of the pulsed laser beam B moves only the predetermined range in the X direction (FIG. 4(a)). Thereafter, if the pulsed laser beam B moves only a single range of the spot BS in the Z direction, the pulsed laser beam B is reflected by the mirror 13 by 90°, and the spot BS generated on the surface of the lower mold 252 is in the Y direction Only a single range of light spots are moved on (Figure 4(b)). Thus, the light spot BS on the surface of the lower mold 252 repeats the following zigzag movement: a single-pass movement is performed in the X direction, and then only a single range of the light spot BS is moved in the Y direction, and then in the X direction toward and Move in the opposite direction just now (Figure 12).

通過光點BS如所述那樣呈鋸齒形地移動,脈衝雷射光束B照射至下模252的表面的一部分或全部的範圍內。此處,在脈衝雷射光束B僅照射至下模252的表面的一部分上的情況下,在利用一次的鋸齒形移動的脈衝雷射光束B的照射結束後,XY平臺14使反射鏡13移動至下模252的表面中的尚未照射到脈衝雷射光束B的區域上。另外,在搭載了具有足夠的可動距離的電動光束直徑可變透鏡的情況下,可通過內部的透鏡來調整光點尺寸,因此也可以將雷射光束移動部12設為僅包含XY平臺14的結構。而且,通過與所述相同的方法,使脈衝雷射光束B一邊進行鋸齒形移動一邊照射至該區域中。通過重複以上的動作,而對下模252的整個表面照射脈衝雷射光束B。在圖13中,以細實線來例示下模252的表面上的脈衝雷射光束B的鋸齒形的軌跡,並且以粗虛線來例示利用一次的鋸齒形移動的脈衝雷射光束B的照射區域的邊界。As the light spot BS moves in a zigzag shape as described above, the pulsed laser beam B is irradiated to a part or all of the surface of the lower mold 252. Here, in the case where the pulse laser beam B only irradiates a part of the surface of the lower mold 252, after the irradiation of the pulse laser beam B with one zigzag movement is completed, the XY stage 14 moves the mirror 13 To the area of the surface of the lower mold 252 that has not yet been irradiated with the pulse laser beam B. In addition, when a motorized variable beam diameter lens with a sufficient movable distance is installed, the spot size can be adjusted by the internal lens. Therefore, the laser beam moving part 12 can also be set to include only the XY stage 14 structure. Furthermore, by the same method as described above, the pulsed laser beam B is irradiated to the area while moving in a zigzag shape. By repeating the above operation, the entire surface of the lower mold 252 is irradiated with the pulsed laser beam B. In FIG. 13, a thin solid line is used to illustrate the zigzag trajectory of the pulse laser beam B on the surface of the lower mold 252, and a thick dashed line is used to illustrate the irradiation area of the pulse laser beam B using one zigzag movement. Borders.

其後,使反射鏡13轉動,由此將反射面從向下切換成向上。而且,與下模252的情況同樣地,也對上模251的表面照射脈衝雷射光束B。Thereafter, the reflecting mirror 13 is rotated, thereby switching the reflecting surface from downward to upward. Furthermore, as in the case of the lower mold 252, the surface of the upper mold 251 is also irradiated with the pulsed laser beam B.

在本實施方式的成形模清潔裝置10中,將每一個脈衝的雷射光能量密度為0.04 J/cm2~0.7 J/cm2的範圍內的脈衝雷射光束B照射至成形模25(上模251及下模252)的表面上,由此在成形模25的表面上生成等離子體PL(圖14(a))。等離子體PL的產生源並無特別限定,但通過將脈衝雷射光束B照射至附著物上,附著物AG的表面附近變成高溫·高壓狀態,而可產生等離子體PL。而且,使具有與所述相同的雷射光能量密度的脈衝雷射光束B以重疊率變成85%以上的方式移動,由此所述脈衝雷射光束B對等離子體PL中的同一部位照射六次以上,由此將等離子體PL加熱至可使在通常的樹脂成形中附著在成形模25的表面上的附著物A含有的樹脂氣化的溫度為止(圖14(b))。由此,成形模25的表面上的附著物A的至少一部分氣化,並被從所述表面上去除。此時,來自由等離子體PL進行了加熱的塗層CT的傳熱、由放射(輻射)所產生的熱也可以從塗層CT側作用於附著物AG上。另外,在脈衝雷射光束B移動的範圍中的X方向的兩端部,即未滿一個脈衝雷射光束B的X方向的寬度(例如,在重疊率為85%的情況下為所述寬度的17/20)的部分中,脈衝雷射光束B照射的次數可能未滿六次,但通常所述寬度足夠小,在其周圍受到了加熱的等離子體PL流入所述部分中,因此不會成為問題。當成形模清潔裝置10具有氣化附著物去除裝置時,從成形模25的表面附近抽吸去除已氣化的附著物AG。In the forming mold cleaning device 10 of this embodiment, the pulsed laser beam B with the laser light energy density per pulse in the range of 0.04 J/cm2 to 0.7 J/cm2 is irradiated to the forming mold 25 (upper mold 251 and On the surface of the lower mold 252), plasma PL is thereby generated on the surface of the forming mold 25 (FIG. 14(a)). The source of the plasma PL is not particularly limited, but by irradiating the pulsed laser beam B on the deposit, the vicinity of the surface of the deposit AG becomes a high temperature and high pressure state, and the plasma PL can be generated. Furthermore, the pulsed laser beam B having the same laser light energy density as described above is moved so that the overlap ratio becomes 85% or more, whereby the pulsed laser beam B irradiates the same part in the plasma PL six times As described above, the plasma PL is thereby heated to a temperature at which the resin contained in the deposit A adhered to the surface of the mold 25 during normal resin molding can be vaporized (FIG. 14( b )). As a result, at least a part of the deposit A on the surface of the forming mold 25 is vaporized and removed from the surface. At this time, heat transfer from the coating CT heated by the plasma PL and heat generated by radiation (radiation) may also act on the deposit AG from the coating CT side. In addition, the both ends in the X direction in the range where the pulse laser beam B moves, that is, the width of less than one pulse laser beam B in the X direction (for example, the width when the overlap rate is 85%) 17/20), the pulse laser beam B may be irradiated less than six times, but usually the width is small enough that the plasma PL heated around it flows into the part, so it will not Become a problem. When the molding die cleaning device 10 has a vaporized deposit removing device, the vaporized deposits AG are sucked and removed from the vicinity of the surface of the molding die 25.

在如所述那樣上模251及下模252通過加熱板253而升溫的狀態下,上模251與下模252之間的空間可能變成高溫。但是,在本實施方式的成形模清潔裝置10中,將容易因熱而受到不良影響的雷射光源11及雷射光束移動部12配置在所述空間外,並且反射鏡13雖然配置在所述空間內,但比雷射光源11及雷射光束移動部12更不易因熱而受到影響。因此,本實施方式的成形模清潔裝置10即便在如所述那樣的高溫下也可以使用。In the state where the upper mold 251 and the lower mold 252 are heated by the heating plate 253 as described above, the space between the upper mold 251 and the lower mold 252 may become high temperature. However, in the molding die cleaning device 10 of this embodiment, the laser light source 11 and the laser beam moving part 12, which are easily affected by heat, are arranged outside the space, and the mirror 13 is arranged in the In the space, it is less likely to be affected by heat than the laser light source 11 and the laser beam moving part 12. Therefore, the molding die cleaning device 10 of this embodiment can be used even at a high temperature as described above.

反射鏡13因配置在所述空間內而進行熱膨脹。但是,由於容許第二轉動軸體132R在與轉動軸平行的方向上,移動至第二握持工具131R抵接在外側保持工具134R上為止,因此可抑制反射鏡13因熱膨脹而變形。另外,軸138伴隨反射鏡13的熱膨脹而在滑動軸承139中滑動,由此在軸方向上移動,因此可對反射鏡13施加力來抑制使反射鏡13變形。進而,當在成形模清潔裝置10的結束後使反射鏡13朝所述空間外退出時,反射鏡13伴隨溫度的下降而進行收縮,但此時,由於容許第二轉動軸體132R在與轉動軸平行的方向上移動,因此也可以抑制反射鏡13的變形。The reflecting mirror 13 undergoes thermal expansion due to being arranged in the space. However, since the second rotating shaft 132R is allowed to move in a direction parallel to the rotating shaft until the second holding tool 131R abuts on the outer holding tool 134R, it is possible to suppress deformation of the mirror 13 due to thermal expansion. In addition, the shaft 138 slides in the sliding bearing 139 in accordance with the thermal expansion of the mirror 13 and thus moves in the axial direction. Therefore, a force can be applied to the mirror 13 to suppress deformation of the mirror 13. Furthermore, when the mirror 13 is retracted out of the space after the molding die cleaning device 10 is completed, the mirror 13 shrinks as the temperature drops, but at this time, the second rotating shaft 132R is allowed to rotate Since the axis moves in a direction parallel to the axis, the deformation of the mirror 13 can also be suppressed.

進而,在本實施方式的成形模清潔裝置10中,如所述那樣通過在產生了等離子體PL後對所述等離子體PL進行加熱,並利用其熱使附著物A的至少一部分氣化這一工藝來去除附著物A,由此與通過將照射強度(雷射光能量密度、雷射光功率密度)更大的雷射光束直接照射至附著物A上來去除附著物A的情況相比,可抑制對成形模25的塗層CT造成的損害。Furthermore, in the forming mold cleaning device 10 of the present embodiment, after the plasma PL is generated, as described above, the plasma PL is heated, and the heat is used to vaporize at least a part of the deposit A Process to remove the attachment A, which can suppress the damage compared to the case where the attachment A is removed by directly irradiating the laser beam with a higher irradiation intensity (laser energy density, laser power density) to the attachment A. Damage caused by the coating CT of the forming mold 25.

在使用使脈衝雷射光束振蕩的雷射光源11及雷射光束移動部12的情況下,為了更確實地從成形模25的表面上去除附著物,且進一步抑制包含氮化鉻或硬鉻等的塗層受到的損害,理想的是脈衝寬度為50 nsec~120 nsec,每一個脈衝的雷射光能量密度為0.1 J/cm2~0.6 J/cm2,重疊率為90%以上,每一秒的掃描雷射光功率密度為3 W/cm2~11 W/cm2。In the case of using the laser light source 11 and the laser beam moving part 12 that oscillate a pulsed laser beam, in order to more reliably remove the deposits from the surface of the forming mold 25, and to further suppress the inclusion of chromium nitride, hard chromium, etc. The coating is damaged. Ideally, the pulse width is 50 nsec~120 nsec, the laser energy density of each pulse is 0.1 J/cm2~0.6 J/cm2, the overlap rate is more than 90%, and every second scan The laser power density is 3 W/cm2~11 W/cm2.

另外,在使用使脈衝雷射光束振蕩的雷射光源11及雷射光束移動部12的情況下,為了更確實地從成形模的表面上去除附著物,且進一步抑制包含氮化鉻或硬鉻等的塗層受到的損害,也可以采用如下的結構:所述脈衝寬度為50 nsec~120 nsec,所述每一個脈衝的雷射光能量密度為0.04 J/cm2~0.1 J/cm2,所述重疊率為98%以上,每一秒的掃描雷射光功率密度為5 W/cm2~11 W/cm2。In addition, in the case of using the laser light source 11 and the laser beam moving part 12 that oscillate the pulsed laser beam, in order to more reliably remove the deposits from the surface of the mold, and to further suppress the inclusion of chromium nitride or hard chromium The following structure can also be adopted for the damage of coatings such as: the pulse width is 50 nsec~120 nsec, the laser energy density of each pulse is 0.04 J/cm2~0.1 J/cm2, and the overlap The rate is above 98%, and the scanning laser optical power density per second is 5 W/cm2~11 W/cm2.

(3)成形模清潔裝置的另一實施方式 以下,對本發明的成形模清潔裝置的另一實施方式進行說明。 圖15(a)及圖15(b)中所示的結構是脈衝雷射光束B的光點BS以所述圖12中所示的路徑在上模251的下表面或下模252的上表面上移動的情況,在所述路徑的X方向(即光點BS往返運動的方向。相當於所述第一方向)的兩端即雷射光束移動部12與上模251或下模252之間,可設置僅以光點BS的單個範圍的寬度遮蔽脈衝雷射光束B的遮蔽部17(圖15(a)中由粗實線表示者)。另外,遮蔽部17也可以同時設置在雷射光束移動部12與上模251之間、及雷射光束移動部12與下模252之間。(3) Another embodiment of forming mold cleaning device Hereinafter, another embodiment of the mold cleaning device of the present invention will be described. The structure shown in FIGS. 15(a) and 15(b) is that the spot BS of the pulsed laser beam B is on the lower surface of the upper mold 251 or the upper surface of the lower mold 252 along the path shown in FIG. 12 In the case of upward movement, at both ends of the path in the X direction (that is, the direction in which the light spot BS moves back and forth. This corresponds to the first direction), that is, between the laser beam moving part 12 and the upper mold 251 or the lower mold 252 , A shielding portion 17 (shown by a thick solid line in FIG. 15(a)) that shields the pulse laser beam B only with the width of a single range of the light spot BS can be provided. In addition, the shielding part 17 may be provided between the laser beam moving part 12 and the upper mold 251 and between the laser beam moving part 12 and the lower mold 252 at the same time.

若如所述實施方式那樣不設置遮蔽部17且在使從雷射光源11中的脈衝雷射光束B的射出持續的狀態下使光點BS在Y方向(相當於所述第二方向)上移動,則根據光點BS的移動的速度,以比其他部分多的脈衝數對設置所述遮蔽部17的部分照射脈衝雷射光束B。例如,成為照射的起點的部分或X方向的移動與Y方向的移動進行切換的部分與其以外的部分相比,有時存在被照射脈衝雷射光束B的次數不同的部位。另外,設置所述遮蔽部17的部分也可以是如所述那樣被照射脈衝雷射光束B的次數可能未滿六次的位置。相對於此,在X方向的兩端的光點BS的單個範圍,通過遮蔽部17來遮蔽脈衝雷射光束B,並利用穿過了未進行所述遮蔽的部分的脈衝雷射光束B進行清潔,由此可進一步提高清潔處理的均勻性。If the shielding portion 17 is not provided as in the above-mentioned embodiment, and the light spot BS is in the Y direction (corresponding to the second direction) while the emission of the pulsed laser beam B from the laser light source 11 is continued When moving, according to the moving speed of the light spot BS, the portion where the shielding portion 17 is provided is irradiated with the pulsed laser beam B with a larger number of pulses than other portions. For example, the part that becomes the starting point of the irradiation or the part where the movement in the X direction and the movement in the Y direction are switched may have parts where the pulse laser beam B is irradiated with a different number of times than other parts. In addition, the portion where the shielding portion 17 is provided may be a position where the pulse laser beam B may be irradiated with less than six times as described above. On the other hand, the single range of the light spots BS at both ends of the X direction is shielded by the shielding portion 17 for the pulsed laser beam B, and cleaned by the pulsed laser beam B passing through the portion not shielded, This can further improve the uniformity of the cleaning process.

也可以在使光點BS在Y方向上移動的期間內,停止從雷射光源11中的脈衝雷射光束B的射出來代替使用遮蔽部17。另外,也可以變更脈衝雷射光束的移動的速度,並對應於此變更每一個脈衝的雷射光能量密度及/或重複頻率。例如,使雷射光束更快地移動,對應於此使每一個脈衝的雷射光能量密度變大及/或使重複頻率變大,由此可擴大在相同的時間內可照射脈衝雷射光束的區域。Instead of using the shielding unit 17, the emission of the pulsed laser beam B from the laser light source 11 may be stopped while the light spot BS is moved in the Y direction. In addition, the moving speed of the pulsed laser beam may be changed, and the laser light energy density and/or repetition frequency of each pulse may be changed accordingly. For example, to make the laser beam move faster, corresponding to this, the energy density of the laser light per pulse is increased and/or the repetition frequency is increased, thereby expanding the amount of pulsed laser beam that can be irradiated in the same time. area.

光點BS除如圖12或圖13所示那樣呈鋸齒狀地移動以外,例如也可以如圖16(a)所示那樣重複如下的動作:在X方向上進行單程移動(圖中的細實線的路徑)後,停止從雷射光源11中的脈衝雷射光束B的射出,然後一邊在X方向上回到最初的位置一邊在Y方向上僅移動光點BS的單個範圍(圖中的細虛線的路徑),進而在X方向上進行單程移動。或者,也可以如圖16(b)那樣,通過一次的鋸齒形移動(或圖16(a)的單程重複移動),而(不如所述那樣分成多個照射區域)對清潔對象的整體照射脈衝雷射光束B。In addition to moving the light spot BS in a zigzag pattern as shown in Fig. 12 or Fig. 13, for example, as shown in Fig. 16(a), the following action may be repeated: one-way movement in the X direction (fine solid in the figure) Line path), stop the emission of the pulsed laser beam B from the laser light source 11, and then move only a single range of the light spot BS in the Y direction while returning to the original position in the X direction (in the figure Thin dashed path), and then make a one-way movement in the X direction. Or, as shown in Figure 16(b), one zigzag movement (or one-way repetitive movement in Figure 16(a)) can be used (not divided into multiple irradiation areas as described) to irradiate the entire cleaning target with pulses Laser beam B.

為了使反射鏡13在X方向上移動,如圖17所示,也可以使用具有X方向導軌181、X方向傳送帶182、傳送帶安裝構件183、X方向馬達184、X方向滑輪185、馬達塊186、滑輪塊187、及Y方向導軌188的X方向移動機構18。X方向導軌181是在上模251的正下方或下模252的正上方,以橫貫這些模的方式在X方向上延長的導軌。X方向傳送帶182與X方向導軌181大致平行地延長,通過傳送帶安裝構件183而安裝有反射鏡13的軸承保持部134L或外側保持工具134R。安裝在X方向傳送帶182上的軸承保持部134L或外側保持工具134R由X方向導軌181支撐。X方向馬達184被收容在馬達塊186內,馬達塊186被固定在X方向導軌181的一端。另外,X方向滑輪185被收容在滑輪塊187內,滑輪塊187被固定在X方向導軌181的另一端。X方向傳送帶182挂在X方向馬達184及X方向滑輪185上。馬達塊186被載置在Y方向導軌188上,Y方向導軌188以外的X方向移動機構18的各構成元件可沿著Y方向導軌188在Y方向上移動。In order to move the mirror 13 in the X direction, as shown in FIG. 17, an X-direction guide rail 181, an X-direction conveyor belt 182, a conveyor belt mounting member 183, an X-direction motor 184, an X-direction pulley 185, a motor block 186, The pulley block 187 and the X-direction moving mechanism 18 of the Y-direction guide 188. The X-direction guide rail 181 is a guide rail that is directly below the upper mold 251 or directly above the lower mold 252, and extends in the X direction so as to traverse these molds. The X-direction conveyor belt 182 extends substantially parallel to the X-direction guide rail 181, and the bearing holding portion 134L of the mirror 13 or the outer holding tool 134R is attached by the conveyor attaching member 183. The bearing holding portion 134L or the outer holding tool 134R attached to the X-direction belt 182 is supported by the X-direction guide rail 181. The X-direction motor 184 is housed in a motor block 186, and the motor block 186 is fixed to one end of the X-direction guide rail 181. In addition, the X-direction pulley 185 is housed in the pulley block 187, and the pulley block 187 is fixed to the other end of the X-direction guide rail 181. The X direction conveyor belt 182 is hung on the X direction motor 184 and the X direction pulley 185. The motor block 186 is placed on the Y-direction guide rail 188, and each component of the X-direction moving mechanism 18 other than the Y-direction guide rail 188 can move in the Y direction along the Y-direction guide rail 188.

在此X方向移動機構18中,X方向滑輪185伴隨X方向馬達184的旋轉而旋轉,由此X方向傳送帶182在X方向上移動,由此經由軸承保持部134L或外側保持工具134R而安裝在X方向傳送帶182上的反射鏡13在X方向上移動。根據此X方向移動機構18,X方向馬達184與上模251及下模252相比配置在X方向的外側,因此可抑制來自上模251及下模252的熱對X方向馬達184造成的影響。另外,為了使雷射光源11及雷射光束移動部12在X方向上移動,也可以使用與X方向移動機構18相同者。In this X-direction moving mechanism 18, the X-direction pulley 185 rotates in accordance with the rotation of the X-direction motor 184, whereby the X-direction conveyor belt 182 moves in the X direction, thereby being mounted on the bearing holder 134L or the outer holding tool 134R. The mirror 13 on the X-direction conveyor belt 182 moves in the X direction. According to the X-direction moving mechanism 18, the X-direction motor 184 is arranged outside the upper mold 251 and the lower mold 252 in the X direction, so the influence of the heat from the upper mold 251 and the lower mold 252 on the X-direction motor 184 can be suppressed . In addition, in order to move the laser light source 11 and the laser beam moving part 12 in the X direction, the same one as the X direction moving mechanism 18 may be used.

圖18中表示本發明的成形模清潔裝置的另一實施方式。此實施方式的成形模清潔裝置10A具有與所述成形模清潔裝置10相同的雷射光源11、雷射光束移動部12、XY平臺14、及XY平臺驅動器15。在圖18中,XY平臺14及XY平臺驅動器15省略圖示。另外,成形模清潔裝置10A具有第一反射鏡13X及第二反射鏡13Y來代替所述成形模清潔裝置10中的反射鏡13。進而,成形模清潔裝置10A包括包含光路切換鏡161與光路切換鏡移動部162的鏡切換部(鏡切換機構)16。Fig. 18 shows another embodiment of the mold cleaning device of the present invention. The forming mold cleaning device 10A of this embodiment has the same laser light source 11, laser beam moving part 12, XY stage 14, and XY stage driver 15 as the forming mold cleaning device 10. In FIG. 18, illustration of the XY stage 14 and the XY stage driver 15 are omitted. In addition, the forming mold cleaning device 10A has a first reflection mirror 13X and a second reflection mirror 13Y instead of the reflection mirror 13 in the forming mold cleaning device 10. Furthermore, the molding die cleaning device 10A includes a mirror switching part (mirror switching mechanism) 16 including an optical path switching mirror 161 and an optical path switching mirror moving part 162.

第一反射鏡13X可通過在X方向上延長的轉動軸而轉動,且配置在從雷射光束移動部12中射出的脈衝雷射光束B的光路上。第二反射鏡13Y具有使第一反射鏡13X環繞Z軸轉動了90°的結構,可通過在Y方向上延長的轉動軸而轉動,且配置在從雷射光束移動部12中射出的脈衝雷射光束B的光路的側方。The first reflecting mirror 13X is rotatable by a rotation axis extending in the X direction, and is arranged on the optical path of the pulsed laser beam B emitted from the laser beam moving part 12. The second reflecting mirror 13Y has a structure in which the first reflecting mirror 13X is rotated by 90° around the Z axis, can be rotated by a rotating shaft extended in the Y direction, and is arranged in the pulsed laser emitted from the laser beam moving part 12 The side of the optical path of the light beam B.

光路切換鏡161的反射面與Z軸平行,且朝向相對於從雷射光束移動部12中射出的脈衝雷射光束B傾斜了45°的方向。光路切換鏡移動部162是使光路切換鏡161在從雷射光束移動部12中射出的脈衝雷射光束B的光路外(側方)與光路內之間移動者。The reflection surface of the optical path switching mirror 161 is parallel to the Z axis and faces a direction inclined by 45° with respect to the pulsed laser beam B emitted from the laser beam moving part 12. The optical path switching mirror moving part 162 is a device that moves the optical path switching mirror 161 between the outside (side) and inside the optical path of the pulsed laser beam B emitted from the laser beam moving part 12.

對成形模清潔裝置10A的動作進行說明。首先,在通過光路切換鏡移動部162而已將光路切換鏡161配置在脈衝雷射光束B的光路外的狀態下,使第一反射鏡13X的反射面向下且相對於XZ平面僅傾斜45°。而且,與所述成形模清潔裝置10的情況同樣地,從雷射光源11中射出脈衝雷射光束B後通過雷射光束移動部12來使其在X方向上往返移動、及在Y方向上移動。由此,脈衝雷射光束B由第一反射鏡13X反射後照射至下模252的表面上。此處,第一反射鏡13X的反射面相對於XZ平面傾斜45°,因此脈衝雷射光束B垂直地射入下模252的上表面中。但是,若如此射入,則難以對例如面向模腔C的側面那樣,下模252中的與上表面垂直的面照射脈衝雷射光束B。因此,在到此為止的動作結束後,可使第一反射鏡13X的反射面的角度從45°變更成其以外的大小,而對下模252的與X方向平行的側面照射脈衝雷射光束B。The operation of the mold cleaning device 10A will be described. First, in a state where the optical path switching mirror 161 has been arranged outside the optical path of the pulsed laser beam B by the optical path switching mirror moving part 162, the reflection surface of the first mirror 13X is tilted downward and only 45° with respect to the XZ plane. In addition, as in the case of the molding die cleaning device 10, the pulsed laser beam B is emitted from the laser light source 11 and then moved back and forth in the X direction and in the Y direction by the laser beam moving part 12 mobile. Thus, the pulsed laser beam B is reflected by the first mirror 13X and then irradiated on the surface of the lower mold 252. Here, the reflecting surface of the first reflecting mirror 13X is inclined at 45° with respect to the XZ plane, so the pulsed laser beam B is vertically incident into the upper surface of the lower mold 252. However, if it is incident in this way, it is difficult to irradiate the pulse laser beam B to the surface perpendicular to the upper surface of the lower mold 252, such as the side surface facing the cavity C. Therefore, after the operation up to this point is completed, the angle of the reflecting surface of the first mirror 13X can be changed from 45° to another size, and the side surface of the lower mold 252 parallel to the X direction can be irradiated with a pulsed laser beam B.

繼而,在使第一反射鏡13X的反射面向上且相對於XZ平面僅傾斜45°後,通過雷射光束移動部12來使脈衝雷射光束B在X方向上往返移動、及在Y方向上移動,由此使脈衝雷射光束B照射至上模251的表面上。此時,也可以在將第一反射鏡13X的反射面的角度設為45°來進行操作後,將所述角度變更成45°以外的大小,由此對上模251的與X方向平行的側面照射脈衝雷射光束B。Then, after making the reflection surface of the first mirror 13X upward and tilting only 45° with respect to the XZ plane, the pulse laser beam B is moved back and forth in the X direction and in the Y direction by the laser beam moving part 12 By moving, the pulsed laser beam B is irradiated on the surface of the upper mold 251. At this time, after the angle of the reflecting surface of the first reflecting mirror 13X is set to 45° and the operation is performed, the angle may be changed to a size other than 45°, so that the upper mold 251 is parallel to the X direction. The pulse laser beam B is irradiated from the side.

但是,即便通過到此為止的動作,也無法對下模252及上模251中的與Y方向平行的側面照射脈衝雷射光束B。因此,光路切換鏡移動部162使光路切換鏡161移動至從雷射光束移動部12中射出的脈衝雷射光束B的光路內。而且,使第二反射鏡13Y的反射面向下且將與XZ平面形成的角度設為45°以外的大小,從雷射光源11中射出脈衝雷射光束B後通過雷射光束移動部12來使其在X方向上往返移動、及在Y方向上移動,由此可對下模252的與Y方向平行的側面照射脈衝雷射光束B。進而,在搭載了電動光束直徑可變透鏡的情況下,通過電動來使內置的透鏡移動,由此可對準所述第二反射鏡13Y的角度來調整光點尺寸。也可以對上模251進行此處所述的各操作。However, even through the operations so far, the side surfaces parallel to the Y direction of the lower mold 252 and the upper mold 251 cannot be irradiated with the pulsed laser beam B. Therefore, the optical path switching mirror moving part 162 moves the optical path switching mirror 161 into the optical path of the pulsed laser beam B emitted from the laser beam moving part 12. Furthermore, with the reflection surface of the second mirror 13Y facing downward and the angle formed with the XZ plane at a size other than 45°, the pulsed laser beam B is emitted from the laser light source 11 and then passed through the laser beam moving part 12 It moves back and forth in the X direction and in the Y direction, so that the side surface of the lower mold 252 parallel to the Y direction can be irradiated with the pulsed laser beam B. Furthermore, when an electric variable beam diameter lens is mounted, the built-in lens is moved by electric power, so that the angle of the second mirror 13Y can be aligned to adjust the spot size. The operations described here can also be performed on the upper mold 251.

如以上那樣,根據成形模清潔裝置10A,也可以對下模252及上模251中的與X方向及Y方向平行的側面照射脈衝雷射光束B,而可更確實地對下模252及上模251進行清潔。As described above, according to the molding die cleaning device 10A, the side surfaces parallel to the X direction and the Y direction of the lower mold 252 and the upper mold 251 can be irradiated with the pulsed laser beam B, and the lower mold 252 and the upper mold 252 can be irradiated more reliably. The mold 251 is cleaned.

在圖19(a-1)至圖19(b)中,表示作為本發明的成形模清潔裝置的又一實施方式的成形模清潔裝置10B。此實施方式的成形模清潔裝置10B具有與所述成形模清潔裝置10相同的雷射光源11、雷射光束移動部12、XY平臺14、及XY平臺驅動器15。在圖19(a-1)至圖19(b)中,XY平臺14及XY平臺驅動器15省略圖示。另外,成形模清潔裝置10B具有第一反射鏡13A及第二反射鏡13B來代替所述成形模清潔裝置10中的反射鏡13。進而,成形模清潔裝置10B包括鏡切換部(鏡切換機構)16A。In Figs. 19(a-1) to 19(b), a forming mold cleaning device 10B as another embodiment of the forming mold cleaning device of the present invention is shown. The molding die cleaning device 10B of this embodiment has a laser light source 11, a laser beam moving part 12, an XY stage 14, and an XY stage driver 15 that are the same as those of the molding mold cleaning device 10 described above. In FIGS. 19(a-1) to 19(b), illustration of the XY stage 14 and the XY stage driver 15 are omitted. In addition, the forming mold cleaning device 10B has a first reflection mirror 13A and a second reflection mirror 13B instead of the reflection mirror 13 in the forming mold cleaning device 10. Furthermore, the forming mold cleaning device 10B includes a mirror switching unit (mirror switching mechanism) 16A.

第一反射鏡13A如所述那樣通過鏡切換部16A而環繞Z方向的軸進行轉動,並且也可以通過XY平面上的轉動軸而進行轉動,且配置在從雷射光束移動部12中射出的脈衝雷射光束B的光路上。第二反射鏡13B可通過在Y方向上延長的轉動軸而進行轉動,且配置在從雷射光束移動部12中射出的脈衝雷射光束B的光路的側方。鏡切換部16A設置在第一反射鏡13A的下側,以使第一反射鏡13A環繞Z方向的軸進行轉動的方式沿著圓環狀的導軌來構成。The first mirror 13A is rotated around the axis in the Z direction by the mirror switching unit 16A as described above, and can also be rotated by the axis of rotation on the XY plane, and is arranged in the laser beam moving unit 12 Optical path of pulse laser beam B. The second mirror 13B is rotatable by a rotation axis extended in the Y direction, and is arranged on the side of the optical path of the pulsed laser beam B emitted from the laser beam moving part 12. The mirror switching unit 16A is provided on the lower side of the first mirror 13A, and is configured along an annular guide rail such that the first mirror 13A rotates around an axis in the Z direction.

對成形模清潔裝置10B的動作進行說明。首先,通過鏡切換部16A,以第一反射鏡13A的反射面與XY平面的交線變得與X軸平行的方式設定第一反射鏡13A的方向(圖19(a))。在此狀態下,與所述成形模清潔裝置10A中的第一反射鏡13X同樣地,通過在X方向上延長的轉動軸來使第一反射鏡13A轉動,在使第一反射鏡13A的反射面向下且相對於XZ平面僅傾斜45°的狀態、使第一反射鏡13A的反射面向下且以45°以外的角度相對於XZ平面傾斜的狀態、使第一反射鏡13A的反射面向上且相對於XZ平面僅傾斜45°的狀態、使第一反射鏡13A的反射面向上且以45°以外的角度相對於XZ平面傾斜的狀態這四種狀態下,分別對第一反射鏡13A照射脈衝雷射光束B。由此,脈衝雷射光束B可由第一反射鏡13A反射,而照射至包含與XZ平面大致平行的側面的下模252或上模251的表面上。當使反射面向下來將脈衝雷射光束B照射至下模252上時,由第一反射鏡13A反射的脈衝雷射光束B穿過鏡切換部16A的比圓環狀的導軌更內側的中空部。The operation of the mold cleaning device 10B will be described. First, the mirror switching unit 16A sets the direction of the first mirror 13A so that the intersection of the reflection surface of the first mirror 13A and the XY plane becomes parallel to the X axis (FIG. 19( a )). In this state, similar to the first mirror 13X in the forming mold cleaning device 10A, the first mirror 13A is rotated by the axis of rotation extended in the X direction, and the reflection of the first mirror 13A is Face down and tilt only 45° with respect to the XZ plane, make the reflective surface of the first mirror 13A downward and tilt with respect to the XZ plane at an angle other than 45°, make the reflective surface of the first mirror 13A upward and In the state of tilting only 45° with respect to the XZ plane, the reflecting surface of the first mirror 13A is upward, and the state of tilting with respect to the XZ plane at an angle other than 45°, pulses are applied to the first mirror 13A. Laser beam B. In this way, the pulsed laser beam B can be reflected by the first mirror 13A and irradiated onto the surface of the lower mold 252 or the upper mold 251 including a side surface substantially parallel to the XZ plane. When the reflecting surface is turned down and the pulse laser beam B is irradiated onto the lower mold 252, the pulse laser beam B reflected by the first mirror 13A passes through the hollow part of the mirror switching part 16A that is more inside than the annular guide rail .

繼而,以反射面變成與XY面垂直的方式使第一反射鏡13A直立,鏡切換部16A以使所述反射面相對於XZ平面朝向45°的方向的方式,使第一反射鏡13A環繞Z軸進行轉動(圖19(b))。在此狀態下,照射至第一反射鏡13A中的脈衝雷射光束B由第一反射鏡13A反射後射入第二反射鏡13B中。而且,使第二反射鏡13B的反射面向下且將與XZ平面形成的角度設為45°以外的大小,從雷射光源11中射出脈衝雷射光束B後通過雷射光束移動部12來使脈衝雷射光束B在X方向上往返移動、及在Y方向上移動,由此可對下模252的與Y方向平行的側面照射脈衝雷射光束B。進而,在搭載了電動光束直徑可變透鏡的情況下,通過電動來使內置的透鏡移動,由此能夠以變成與由第一反射鏡13A反射時相同的光點尺寸的方式,對準由第二反射鏡13B反射時的光路及所述第二反射鏡13B的角度來調整光點尺寸。也可以對上模251進行此處所述的各操作。Then, the first mirror 13A is erected so that the reflecting surface becomes perpendicular to the XY plane, and the mirror switching section 16A makes the first reflecting mirror 13A surround the Z axis so that the reflecting surface faces 45° with respect to the XZ plane. Turn it (Figure 19(b)). In this state, the pulsed laser beam B irradiated into the first mirror 13A is reflected by the first mirror 13A and then enters the second mirror 13B. Furthermore, with the reflection surface of the second mirror 13B facing downward and the angle formed with the XZ plane at a size other than 45°, the pulsed laser beam B is emitted from the laser light source 11 and then passed through the laser beam moving part 12 The pulse laser beam B moves back and forth in the X direction and in the Y direction, so that the side surface of the lower mold 252 parallel to the Y direction can be irradiated with the pulse laser beam B. Furthermore, when a motorized variable beam diameter lens is mounted, the built-in lens can be moved by motoring, so that it can be aligned with the first mirror so that it has the same spot size as when reflected by the first mirror 13A. The light path during reflection by the second mirror 13B and the angle of the second mirror 13B are used to adjust the spot size. The operations described here can also be performed on the upper mold 251.

如以上那樣,成形模清潔裝置10B也與成形模清潔裝置10A同樣地,也可以對下模252及上模251中的XZ平面及與XZ平面大致平行的側面照射脈衝雷射光束B,而可更確實地對下模252及上模251進行清潔。As described above, the forming mold cleaning device 10B, similar to the forming mold cleaning device 10A, can also irradiate the pulse laser beam B on the XZ plane and the side surfaces substantially parallel to the XZ plane in the lower mold 252 and the upper mold 251. The lower mold 252 and the upper mold 251 are cleaned more reliably.

圖20中表示包括多組樹脂成形部20、及一組成形模清潔裝置10的樹脂成形單元30的結構。此樹脂成形單元30具有一台材料接收組件31、多台成形組件32、一台排出組件33、及一台成形模清潔裝置待機組件34。材料接收組件31是用於從外部接收板狀的樹脂材料P、及引線框架L並朝成形組件32中送出的裝置,且具有引線框架接收部311及樹脂片供給部312。一台成形組件32具有一台所述實施方式的樹脂成形裝置1中的樹脂成形部20。在圖20中表示了三台成形組件32,但在樹脂成形單元30中可設置任意的台數的成形組件32。另外,即便在組裝完樹脂成形單元30而開始使用後,也可以增減成形組件32。排出組件33是從成形組件32搬入由成形組件32所製造的樹脂成形品並加以保持者,且具有樹脂成形品保持部331。成形模清潔裝置待機組件34是在不使用成形模清潔裝置10時收容成形模清潔裝置10者。FIG. 20 shows the structure of a resin molding unit 30 including a plurality of sets of resin molding parts 20 and a set of mold cleaning devices 10. The resin molding unit 30 has a material receiving unit 31, a plurality of molding units 32, a discharge unit 33, and a molding die cleaning device standby unit 34. The material receiving unit 31 is a device for receiving the plate-shaped resin material P and the lead frame L from the outside and sending it out to the molding unit 32, and has a lead frame receiving part 311 and a resin sheet supply part 312. One molding unit 32 has one resin molding part 20 in the resin molding apparatus 1 of the embodiment. In FIG. 20, three molding units 32 are shown, but any number of molding units 32 can be installed in the resin molding unit 30. In addition, even after the resin molding unit 30 is assembled and used, the molding unit 32 can be increased or decreased. The ejection unit 33 carries in the resin molded product manufactured by the molding unit 32 from the molding unit 32 and holds it, and has a resin molded product holding portion 331. The mold cleaning device standby assembly 34 is for storing the mold cleaning device 10 when the mold cleaning device 10 is not used.

搬送裝置35是沿著設置在樹脂成形單元30內的搬送導軌,將基板或樹脂材料從材料接收組件31搬入成形組件32中,並且將已成形的樹脂成形品從成形組件32搬出至排出組件33中的裝置。另外,搬送裝置35也具有如下的的功能:當在某一成形組件32中進行成形模的清潔時,將成形模清潔裝置10搬入所述成形組件32中(圖21),並且在所述成形模的清潔完成後將成形模清潔裝置10從所述成形組件32中搬出。The conveying device 35 moves the substrate or resin material from the material receiving unit 31 into the molding unit 32 along the conveying rail provided in the resin molding unit 30, and conveys the molded resin molded product from the molding unit 32 to the discharge unit 33 In the device. In addition, the conveying device 35 also has the following function: when cleaning the forming mold in a certain forming assembly 32, the forming mold cleaning device 10 is carried into the forming assembly 32 (FIG. 21), and in the forming assembly 32 After the cleaning of the mold is completed, the forming mold cleaning device 10 is taken out of the forming assembly 32.

此樹脂成形單元30可在多個成形組件32中同時製造樹脂成形品,因此適合於大量生產樹脂成形品。此時,在從將基板安裝在成形模上至製作樹脂成形品後搬出為止的期間內需要相應的時間,因此通過在利用某一成形組件32製造樹脂成形品的時間內,將成形對象物安裝在其他成形組件32上、或從其他成形模中搬出樹脂成形品,而可提高樹脂成形品的製造效率,並且可抑制搬送裝置所需要的成本。進而,也可以在多台成形組件32中共用成形模清潔裝置10。This resin molding unit 30 can simultaneously manufacture resin molded products in a plurality of molding modules 32, and is therefore suitable for mass production of resin molded products. In this case, it takes a certain amount of time from when the substrate is mounted on the mold to when the resin molded product is produced and then transported out. Therefore, the molded object is mounted within the time required to manufacture the resin molded product using a certain molding unit 32 By unloading the resin molded product on another molding unit 32 or from another molding die, the production efficiency of the resin molded product can be improved, and the cost required for the conveying device can be suppressed. Furthermore, the molding die cleaning device 10 may be shared among a plurality of molding units 32.

在所述樹脂成形單元30中,使用與其他組件並排配置在同一列中的成形模清潔裝置待機組件34,但也可以如圖22中所示的樹脂成形單元30A那樣,使用沿著其他組件排列的列延長的成形模清潔裝置收容·移動組件34A來代替成形模清潔裝置待機組件34。樹脂成形單元30A中的材料接收組件31、成形組件32、及排出組件33的結構與樹脂成形單元30的情況相同。成形模清潔裝置收容·移動組件34A收容成形模清潔裝置10,並且在內部具有使成形模清潔裝置10在其他組件排列的列的方向上移動的成形模清潔裝置移動部35A。若從各成形組件32的樹脂成形部20來看,則成形模清潔裝置收容·移動組件34A及其內部的成形模清潔裝置移動部35A設置在搬送裝置35的相反側。樹脂成形單元30A的動作除將成形模清潔裝置10搬入成形組件32中及從成形組件32中搬出時使用成形模清潔裝置移動部35A這一點以外,與樹脂成形單元30相同。In the resin molding unit 30, the molding die cleaning device standby module 34 arranged side by side with other components in the same row may be used. However, the resin molding unit 30A shown in FIG. The mold cleaning device accommodating/moving unit 34A with the extended row of the column replaces the mold cleaning device standby unit 34. The structure of the material receiving unit 31, the molding unit 32, and the discharge unit 33 in the resin molding unit 30A is the same as that of the resin molding unit 30. The molding die cleaning device accommodation/moving unit 34A accommodates the molding die cleaning device 10, and has a molding die cleaning device moving part 35A inside which moves the molding die cleaning device 10 in the direction of the row in which other components are arranged. From the perspective of the resin molding part 20 of each molding unit 32, the molding die cleaning device housing and moving unit 34A and the molding die cleaning device moving unit 35A inside are provided on the opposite side of the conveying device 35. The operation of the resin molding unit 30A is the same as that of the resin molding unit 30 except that the molding die cleaning device moving part 35A is used when carrying the molding die cleaning device 10 into and out of the molding assembly 32.

本發明並不限定於所述各實施方式,可在本發明的主旨的範圍內進行進一步的各種變形。The present invention is not limited to the above-mentioned embodiments, and various further modifications can be made within the scope of the gist of the present invention.

例如,在所述實施方式中,使用每一個脈衝的雷射光能量密度處於0.04 J/cm2~0.7 J/cm2的範圍內,每一秒的掃描雷射光功率密度處於2 W/cm2~15 W/cm2的範圍內,脈衝寬度處於1 nsec~200 nsec的範圍內,脈衝重複頻率處於300 kHz~10 MHz的範圍內的脈衝雷射光束,但這些值並不限定於所述範圍內。另外,也可以使用進行連續振蕩的雷射光的光束來代替脈衝雷射光束。進而,在所述實施方式中,使用以在與光束垂直的剖面中的形狀變成正方形的方式成形,並具有禮帽型的照射強度分布的(脈衝)雷射光束,但也可以使用在所述剖面中具有圓形、圓環(環形、凹形)狀等其他形狀的雷射光束,或具有高斯型等的其他照射強度分布的雷射光束。在圖23(a)及圖23(b)中,表示剖面為圓形的雷射光束的光點及該光點移動的情況、以及在圖23(c)及圖23(d)中,表示剖面為圓環狀的雷射光束的光點及該光點移動的情況。For example, in the described embodiment, the energy density of the laser light used for each pulse is in the range of 0.04 J/cm2 to 0.7 J/cm2, and the power density of the scanning laser light per second is in the range of 2 W/cm2 to 15 W/cm2. In the range of cm2, the pulse width is in the range of 1 nsec to 200 nsec, and the pulse repetition frequency is in the range of 300 kHz to 10 MHz. However, these values are not limited to the range. In addition, a beam of laser light that oscillates continuously may be used instead of a pulsed laser beam. Furthermore, in the above-mentioned embodiment, a (pulsed) laser beam that is shaped so that the shape in a cross section perpendicular to the beam becomes square and has a top hat-shaped irradiation intensity distribution is used, but it can also be used in the cross section. Laser beams with other shapes such as circles, rings (circular, concave), or laser beams with other irradiated intensity distributions such as Gaussian. In Figs. 23(a) and 23(b), the spot of the laser beam with a circular cross-section and the movement of the spot are shown, and in Figs. 23(c) and 23(d), The spot of the laser beam with a circular cross section and the movement of the spot.

在所述實施方式中,使脈衝雷射光束以重疊率變成85%以上的方式移動,但脈衝雷射光束的移動速度並不限定於此,在使用進行連續振蕩的雷射光的光束的情況下,只要適宜設定移動速度即可。另外,在所述實施方式中,使(脈衝)雷射光束以光點在上模251或下模252的表面上呈鋸齒形地移動的方式移動,但光點的移動路徑並不限定於此。例如也可以重複如下的動作:在X方向上進行單程移動後,停止雷射光束,然後一邊在X方向上回到最初的位置一邊在Y方向上僅移動光點的單個範圍,進而在X方向上進行單程移動。In the above-mentioned embodiment, the pulsed laser beam is moved so that the overlap ratio becomes 85% or more. However, the moving speed of the pulsed laser beam is not limited to this. In the case of using a continuously oscillating laser beam , As long as the moving speed is set appropriately. In addition, in the above-mentioned embodiment, the (pulsed) laser beam is moved so that the spot moves in a zigzag pattern on the surface of the upper mold 251 or the lower mold 252, but the movement path of the spot is not limited to this. . For example, you can repeat the following actions: after performing a one-way movement in the X direction, stop the laser beam, and then move only a single range of the spot in the Y direction while returning to the original position in the X direction, and then in the X direction Make a one-way move on.

在所述實施方式中,使用振鏡掃描頭121使脈衝雷射光束B在X方向上往返移動且在Z方向(在上模251或下模252的表面上使光點在Y方向)上移動,但作為替代,也可以通過振鏡掃描頭121來僅進行X方向的往返移動,使反射鏡13在Y方向上移動,由此在上模251或下模252的表面上使光點在Y方向移動。In the embodiment, the galvanometer scanning head 121 is used to move the pulsed laser beam B back and forth in the X direction and in the Z direction (the light spot is moved in the Y direction on the surface of the upper mold 251 or the lower mold 252) However, as an alternative, only the X-direction reciprocating movement can be performed by the galvanometer scanning head 121, and the mirror 13 can be moved in the Y-direction, so that the light spot on the surface of the upper mold 251 or the lower mold 252 can be in Y Move in direction.

1‧‧‧樹脂成形裝置 10、10A、10B‧‧‧成形模清潔裝置 11‧‧‧雷射光源 112‧‧‧底座 12‧‧‧雷射光束移動部 121‧‧‧振鏡掃描頭 122‧‧‧透鏡 13、13W‧‧‧反射鏡 13A、13X‧‧‧第一反射鏡 13B、13Y‧‧‧第二反射鏡 131L‧‧‧第一握持工具 131R‧‧‧第二握持工具 132L‧‧‧第一轉動軸體 132R‧‧‧第二轉動軸體 1321L、1321R‧‧‧槽 133L‧‧‧軸承 133R‧‧‧轉動軸體可動保持工具 134L‧‧‧軸承保持部 134R‧‧‧外側保持工具 135L‧‧‧第一固定工具 135R‧‧‧第二固定工具 136‧‧‧馬達 137L‧‧‧軸承固定工具 138‧‧‧軸 139‧‧‧滑動軸承 14‧‧‧XY平臺 141‧‧‧連結棒 142‧‧‧引導棒 15‧‧‧XY平臺驅動器 16、16A‧‧‧鏡切換部 161‧‧‧光路切換鏡 162‧‧‧光路切換鏡移動部 17‧‧‧遮蔽部 18‧‧‧X方向移動機構 181‧‧‧X方向導軌 182‧‧‧X方向傳送帶 183‧‧‧傳送帶安裝構件 184‧‧‧X方向馬達 185‧‧‧X方向滑輪 186‧‧‧馬達塊 187‧‧‧滑輪塊 188‧‧‧Y方向導軌 20‧‧‧樹脂成形部 211‧‧‧基座 212‧‧‧系杆 213‧‧‧曲柄連杆 221‧‧‧可動台板 222‧‧‧固定台板 25‧‧‧成形模 251‧‧‧上模 2511‧‧‧剔除塊 2513、2523‧‧‧流道 252‧‧‧下模 2521‧‧‧料筒 2522‧‧‧柱塞 253‧‧‧加熱板 2531‧‧‧加熱器 30、30A‧‧‧樹脂成形單元 31‧‧‧材料接收組件 311‧‧‧引線框架接收部 312‧‧‧樹脂片供給部 32‧‧‧成形組件 33‧‧‧排出組件 331‧‧‧樹脂成形品保持部 34‧‧‧成形模清潔裝置待機組件 34A‧‧‧成形模清潔裝置收容·移動組件 35‧‧‧搬送裝置 35A‧‧‧成形模清潔裝置移動部 A‧‧‧附著物 AG‧‧‧已氣化的附著物 B‧‧‧脈衝雷射光束 BS‧‧‧脈衝雷射光束的光點 C‧‧‧模腔 CT‧‧‧塗層 L‧‧‧引線框架 P‧‧‧樹脂材料 PL‧‧‧等離子體 X、Y、Z‧‧‧方向1‧‧‧Resin molding device 10, 10A, 10B‧‧‧forming mold cleaning device 11‧‧‧Laser light source 112‧‧‧Base 12‧‧‧Laser beam moving part 121‧‧‧ Galvanometer Scan Head 122‧‧‧Lens 13, 13W‧‧‧Mirror 13A、13X‧‧‧First reflector 13B, 13Y‧‧‧Second mirror 131L‧‧‧First holding tool 131R‧‧‧Second holding tool 132L‧‧‧The first rotating shaft 132R‧‧‧Second rotating shaft 1321L, 1321R‧‧‧slot 133L‧‧‧Bearing 133R‧‧‧Rotating shaft movable holding tool 134L‧‧‧Bearing retaining part 134R‧‧‧Outside holding tool 135L‧‧‧First fixing tool 135R‧‧‧Second fixing tool 136‧‧‧Motor 137L‧‧‧Bearing fixing tool 138‧‧‧Axis 139‧‧‧Sliding bearing 14‧‧‧XY platform 141‧‧‧Connecting rod 142‧‧‧Guide rod 15‧‧‧XY platform driver 16, 16A‧‧‧Mirror switching part 161‧‧‧Optical Path Switching Mirror 162‧‧‧Optical path switching mirror moving part 17‧‧‧Shield 18‧‧‧X direction moving mechanism 181‧‧‧X direction guide 182‧‧‧X direction conveyor belt 183‧‧‧Conveyor belt installation components 184‧‧‧X direction motor 185‧‧‧X direction pulley 186‧‧‧Motor block 187‧‧‧Pulley block 188‧‧‧Y direction guide 20‧‧‧Resin molding department 211‧‧‧Base 212‧‧‧Tie Rod 213‧‧‧Crank connecting rod 221‧‧‧movable platen 222‧‧‧Fixed platen 25‧‧‧Forming die 251‧‧‧Upper die 2511‧‧‧Remove block 2513、2523‧‧‧Runner 252‧‧‧Die 2521‧‧‧Barrel 2522‧‧‧Plunger 253‧‧‧heating plate 2531‧‧‧Heater 30, 30A‧‧‧Resin molding unit 31‧‧‧Material receiving assembly 311‧‧‧Lead frame receiving part 312‧‧‧Resin sheet supply department 32‧‧‧Forming components 33‧‧‧Discharge assembly 331‧‧‧Resin molded product holding part 34‧‧‧Forming die cleaning device standby component 34A‧‧‧Forming mold cleaning device containing and moving assembly 35‧‧‧Conveying device 35A‧‧‧Moving part of mold cleaning device A‧‧‧Attachment AG‧‧‧ Vaporized attachments B‧‧‧Pulse laser beam BS‧‧‧Spot of pulsed laser beam C‧‧‧Mold cavity CT‧‧‧Coating L‧‧‧Lead frame P‧‧‧Resin material PL‧‧‧plasma X, Y, Z‧‧‧direction

圖1(a)、圖1(b)、圖1(c)、圖1(d)及圖1(e)分別是對清潔後尚未進行樹脂成形的成形模,以及清潔後分別進行了200次、400次、600次及800次樹脂成形後的成形模拍攝表面所得的電子顯微鏡照片。 圖2是表示本發明的成形模清潔裝置及具有其的樹脂成形裝置的一實施方式的概略結構圖。 圖3是本實施方式的樹脂成形裝置中的成形模及其附近的放大圖。 圖4(a)及圖4(b)分別是表示利用雷射光束移動部使雷射光束移動的情況的平面圖及側面圖。 圖5是本實施方式的成形模清潔裝置中的反射鏡及其附屬部的立體及部分剖面圖。 圖6(a)是反射鏡的附屬部的部分剖面放大圖,且為表示一側的轉動軸體附近的圖、圖6(b)是表示另一側的轉動軸體附近的圖、以及圖6(c)是表示另一側的轉動軸體與圖6(b)的情況相比已朝反射鏡的相反側移動的狀態的圖。 圖7(a)是表示利用軸已將握持反射鏡的一對握持工具連接的狀態的圖、及圖7(b)是表示一側的握持工具與圖7(a)的情況相比已朝反射鏡的相反側移動的狀態的圖。 圖8(a)及圖8(b)分別是表示本實施方式的成形模清潔裝置位於使用位置及待機位置上的狀態的概略圖。 圖9是表示利用在Y方向上延長的連結棒已將雷射光源及雷射光束移動部與反射鏡連結的結構的圖。 圖10是表示使用X方向的寬度比X方向上的雷射光束的照射範圍大的反射鏡的例子的圖。 圖11(a)是本實施方式的樹脂成形裝置中的樹脂成形時的動作,且為表示將引線框架載置在下模上且已將樹脂材料供給至下模的料筒中的狀態的圖、及圖11(b)是表示將成形模合模並已將樹脂材料供給至模腔中的狀態的圖。 圖12是表示脈衝雷射光束的光點呈鋸齒狀地移動的情況的圖。 圖13是表示下模或上模的表面上的雷射光束的軌跡(細實線)、及通過雷射光束進行一次鋸齒形移動而被照射雷射光束的區域的邊界(粗虛線)的圖。 圖14(a)是表示通過對成形模照射脈衝雷射光束而在成形模的表面附近生成等離子體的狀態的概略圖,及圖14(b)是通過對等離子體重複照射脈衝雷射光束來對等離子體進行加熱,且附著物氣化的狀態的概略圖。 圖15(a)及圖15(b)分別是表示使用遮蔽部的例子的俯視圖及縱剖面圖。 圖16(a)是表示作為下模或上模的表面上的雷射光束的軌跡的另一例的在照射區域內重複進行單程移動的例、及圖16(b)是在下模或上模的整個表面上呈鋸齒狀地移動的例的圖。 圖17是表示使反射鏡在X方向上移動的X方向移動機構的例子的概略圖。 圖18是表示本發明的成形模清潔裝置的另一實施方式的平面圖。 圖19(a-1)及圖19(a-2)分別是表示本發明的成形模清潔裝置的又一實施方式的圖,且為表示使用第一反射鏡的狀態的平面圖及側面圖、以及圖19(b)是表示使用第二反射鏡的狀態的平面圖。 圖20是表示包含成形組件等多個組件的樹脂成形單元的一例的概略結構圖。 圖21是表示在樹脂成形單元中已將成形模清潔裝置搬入一個成形組件中的狀態的概略結構圖。 圖22是表示包含多個組件的樹脂成形單元的另一例的概略結構圖。 圖23(a)及圖23(b)分別表示剖面為圓形的雷射光束的光點及該光點移動的情況、以及圖23(c)及圖23(d)分別表示剖面為圓環狀的雷射光束的光點及該光點移動的情況。Figure 1 (a), Figure 1 (b), Figure 1 (c), Figure 1 (d) and Figure 1 (e) are the molds that have not been resin molded after cleaning, and 200 times after cleaning. , 400 times, 600 times, and 800 times of resin molding after taking the surface electron micrographs of the molding die. 2 is a schematic configuration diagram showing an embodiment of the molding die cleaning device of the present invention and a resin molding device having the same. Fig. 3 is an enlarged view of a molding die and its vicinity in the resin molding apparatus of the present embodiment. 4(a) and 4(b) are respectively a plan view and a side view showing how the laser beam is moved by the laser beam moving part. FIG. 5 is a perspective and partial cross-sectional view of the reflecting mirror and its accessory parts in the molding die cleaning device of this embodiment. Figure 6 (a) is a partial cross-sectional enlarged view of the appendage of the mirror, and is a diagram showing the vicinity of the rotating shaft on one side, and Figure 6 (b) is a diagram showing the vicinity of the rotating shaft on the other side, and a diagram 6(c) is a diagram showing a state where the rotation shaft on the other side has moved to the opposite side of the mirror compared to the case of FIG. 6(b). Fig. 7(a) is a diagram showing a state in which a pair of holding tools for holding the mirror have been connected by a shaft, and Fig. 7(b) is a diagram showing the situation of the holding tool on one side and Fig. 7(a) It is a diagram showing a state that has moved to the opposite side of the mirror. FIGS. 8(a) and 8(b) are schematic diagrams showing a state in which the mold cleaning device of the present embodiment is located at the use position and the standby position, respectively. FIG. 9 is a diagram showing a structure in which a laser light source and a laser beam moving part and a reflecting mirror are connected by a connecting rod extending in the Y direction. 10 is a diagram showing an example of using a mirror whose width in the X direction is larger than the irradiation range of the laser beam in the X direction. Fig. 11(a) is the operation during resin molding in the resin molding apparatus of this embodiment, and is a diagram showing a state where the lead frame is placed on the lower mold and the resin material has been supplied to the barrel of the lower mold, and Fig. 11(b) is a diagram showing a state where the molding die is closed and the resin material has been supplied into the cavity. FIG. 12 is a diagram showing a state where the spot of the pulse laser beam moves in a zigzag shape. Fig. 13 is a diagram showing the trajectory of the laser beam on the surface of the lower mold or the upper mold (thin solid line) and the boundary (thick broken line) of the area where the laser beam is irradiated by the zigzag movement of the laser beam once . Fig. 14(a) is a schematic diagram showing a state in which plasma is generated near the surface of the forming mold by irradiating a pulsed laser beam to the forming mold, and Fig. 14(b) is a state in which plasma is repeatedly irradiated with a pulsed laser beam A schematic diagram of the state where the plasma is heated and the deposits are vaporized. 15(a) and 15(b) are respectively a plan view and a vertical sectional view showing an example in which the shielding portion is used. Figure 16(a) shows another example of the trajectory of the laser beam on the surface of the lower mold or the upper mold, which is an example of repeated one-way movement in the irradiation area, and Fig. 16(b) is in the lower mold or the upper mold A diagram showing an example of zigzag movement on the entire surface. FIG. 17 is a schematic diagram showing an example of an X-direction moving mechanism that moves a mirror in the X direction. Fig. 18 is a plan view showing another embodiment of the mold cleaning device of the present invention. 19 (a-1) and FIG. 19 (a-2) are diagrams showing still another embodiment of the molding die cleaning device of the present invention, and are a plan view and a side view showing a state in which the first mirror is used, and Fig. 19(b) is a plan view showing a state where the second mirror is used. FIG. 20 is a schematic configuration diagram showing an example of a resin molding unit including a plurality of components such as molding components. Fig. 21 is a schematic configuration diagram showing a state in which the mold cleaning device has been carried into one molding assembly in the resin molding unit. Fig. 22 is a schematic configuration diagram showing another example of a resin molding unit including a plurality of components. Figures 23(a) and 23(b) respectively show the spot of a laser beam with a circular cross-section and the movement of the spot, and Figure 23(c) and Figure 23(d) respectively show the cross-section of a circular ring The spot of the laser beam and the movement of the spot.

1‧‧‧樹脂成形裝置 1‧‧‧Resin molding device

10‧‧‧成形模清潔裝置 10‧‧‧Forming die cleaning device

11‧‧‧雷射光源 11‧‧‧Laser light source

12‧‧‧雷射光束移動部 12‧‧‧Laser beam moving part

13‧‧‧反射鏡 13‧‧‧Mirror

136‧‧‧馬達 136‧‧‧Motor

14‧‧‧XY平臺 14‧‧‧XY platform

15‧‧‧XY平臺驅動器 15‧‧‧XY platform driver

20‧‧‧樹脂成形部 20‧‧‧Resin molding department

211‧‧‧基座 211‧‧‧Base

212‧‧‧系杆 212‧‧‧Tie Rod

213‧‧‧曲柄連杆 213‧‧‧Crank connecting rod

221‧‧‧可動台板 221‧‧‧movable platen

222‧‧‧固定台板 222‧‧‧Fixed platen

25‧‧‧成形模 25‧‧‧Forming die

251‧‧‧上模 251‧‧‧Upper die

252‧‧‧下模 252‧‧‧Die

253‧‧‧加熱板 253‧‧‧heating plate

2531‧‧‧加熱器 2531‧‧‧Heater

B‧‧‧脈衝雷射光束 B‧‧‧Pulse laser beam

X、Y、Z‧‧‧方向 X, Y, Z‧‧‧direction

Claims (11)

一種成形模清潔裝置,為去除附著在構成成形模的上模及與所述上模相向的下模的至少任一者的表面上的附著物的裝置,其特徵在於,包括:雷射光源,設置在所述上模與所述下模之間的空間外,射出雷射光束;雷射光束反射機構,具有反射鏡及反射鏡移動機構,所述反射鏡移動機構使所述反射鏡在所述空間中的第一位置與所述空間外的第二位置之間移動,所述雷射光束反射機構以當所述反射鏡位於所述第一位置上時由所述反射鏡反射的所述雷射光束照射至所述上模或所述下模的表面上的方式,設定所述反射鏡的方向;以及雷射光束移動機構,設置在所述空間外,使所述雷射光束相對於位於所述第一位置上時的所述反射鏡移動,且所述雷射光束移動機構是振鏡掃描頭;所述反射鏡包含方向互不相同的第一反射鏡與第二反射鏡,所述雷射光束反射機構還包括對被照射所述雷射光束的反射鏡進行切換的鏡切換機構,所述第一反射鏡與所述第二反射鏡通過變更角度將所述雷射光束照射至所述下模的模腔的上表面、所述上模的模腔的下表面、所述下模的模腔的側面與所述上模的模腔的側面。 A forming mold cleaning device is a device for removing attachments attached to the surface of at least any one of an upper mold constituting a forming mold and a lower mold facing the upper mold, and is characterized in that it comprises: a laser light source, It is arranged outside the space between the upper mold and the lower mold to emit a laser beam; the laser beam reflecting mechanism has a reflecting mirror and a reflecting mirror moving mechanism. The reflecting mirror moving mechanism makes the reflecting mirror in the Moving between a first position in the space and a second position outside the space, and the laser beam reflecting mechanism uses the reflector reflected by the reflecting mirror when the reflecting mirror is in the first position The way the laser beam is irradiated on the surface of the upper mold or the lower mold sets the direction of the reflector; and the laser beam moving mechanism is arranged outside the space to make the laser beam relative to The mirror moves when located at the first position, and the laser beam moving mechanism is a galvanometer scanning head; the mirror includes a first mirror and a second mirror with different directions, so The laser beam reflection mechanism further includes a mirror switching mechanism for switching the mirror irradiated with the laser beam, the first mirror and the second mirror irradiate the laser beam to The upper surface of the cavity of the lower mold, the lower surface of the cavity of the upper mold, the side surface of the cavity of the lower mold, and the side surface of the cavity of the upper mold. 如申請專利範圍第1項所述的成形模清潔裝置,其特徵在於,所述雷射光束反射機構還具有變更所述反射鏡的方向的反射方向變更機構。 The forming mold cleaning device described in the first item of the patent application is characterized in that the laser beam reflection mechanism further has a reflection direction changing mechanism that changes the direction of the reflecting mirror. 如申請專利範圍第1項所述的成形模清潔裝置,其特徵在於,還包括:一對第一轉動軸體及第二轉動軸體,與所述反射鏡的兩側部連接;以及轉動軸體保持工具,在軸方向上可動地保持所述第一轉動軸體及所述第二轉動軸體的至少一者。 The forming mold cleaning device according to item 1 of the scope of patent application is characterized in that it further comprises: a pair of first rotating shaft bodies and second rotating shaft bodies connected to both sides of the reflecting mirror; and a rotating shaft The body holding tool movably holds at least one of the first rotating shaft body and the second rotating shaft body in the axial direction. 如申請專利範圍第1項所述的成形模清潔裝置,為去除附著在對表面的至少一部分施加了塗層的所述成形模上的附著物的裝置,其特徵在於,所述雷射光源及所述雷射光束移動機構是以如下的照射強度將雷射光束照射至所述成形模上者,所述照射強度是在所述附著物上生成了等離子體後能夠將所述等離子體加熱至所述附著物氣化的溫度以上的溫度的照射強度,且為比對所述塗層造成損傷的照射強度低的照射強度。 The forming mold cleaning device described in the first item of the scope of the patent application is a device that removes the attachments attached to the forming mold coated with at least a part of the surface, and is characterized in that the laser light source and The laser beam moving mechanism irradiates the laser beam to the forming mold with an irradiation intensity that can heat the plasma to a temperature after generating plasma on the attachment The irradiation intensity at a temperature equal to or higher than the temperature at which the attached matter vaporizes is lower than the irradiation intensity at which the coating is damaged. 如申請專利範圍第1項所述的成形模清潔裝置,其特徵在於,所述雷射光束移動機構是如下的機構:使所述雷射光束相對於所述成形模在第一方向上往返移動, 並且每當使所述雷射光束在所述第一方向上進行單程移動時,在垂直於所述第一方向的第二方向上,使所述雷射光束僅移動所述雷射光束照射至所述成形模上的光點的單個範圍;且在所述雷射光束移動機構與所述成形模之間,還包括遮蔽所述第一方向上的往返移動的兩端的所述光點的單個範圍的部分的遮蔽部。 The forming mold cleaning device according to the first item of the scope of patent application, wherein the laser beam moving mechanism is a mechanism that makes the laser beam move back and forth in a first direction relative to the forming mold , And whenever the laser beam is moved in the first direction in a single way, in a second direction perpendicular to the first direction, the laser beam is moved only to irradiate the laser beam to The single range of the light spot on the forming mold; and between the laser beam moving mechanism and the forming mold, it also includes a single spot that shields the light spots at both ends of the reciprocating movement in the first direction Shading part of the range. 一種成形模清潔方法,其是去除附著在構成成形模的上模及與所述上模相向的下模的至少任一者的表面上的附著物的方法,其特徵在於,在所述上模與所述下模之間的空間中配置反射鏡,從設置在所述空間外的雷射光源射出雷射光束,並一邊通過設置在所述空間外的雷射光束移動機構來使所述雷射光束相對於所述反射鏡移動,一邊將所述雷射光束照射至所述反射鏡上,所述雷射光束移動機構是振鏡掃描頭,且所述反射鏡包含方向互不相同的第一反射鏡與第二反射鏡,且對被照射所述雷射光束的反射鏡進行切換,所述第一反射鏡與所述第二反射鏡通過變更角度將所述雷射光束照射至所述下模的模腔的上表面、所述上模的模腔的下表面、所述下模的模腔的側面與所述上模的模腔的側面。 A method for cleaning a forming mold is a method of removing adherents on the surface of at least any one of an upper mold constituting a forming mold and a lower mold facing the upper mold, characterized in that the upper mold A mirror is arranged in the space between the lower mold and the laser beam is emitted from a laser light source arranged outside the space, and the laser beam is moved by a laser beam moving mechanism arranged outside the space. The laser beam moves relative to the reflector while irradiating the laser beam onto the reflector. The laser beam moving mechanism is a galvanometer scanning head, and the reflector includes a second mirror with different directions. A reflector and a second reflector, and switch the reflector irradiated with the laser beam, the first reflector and the second reflector irradiate the laser beam to the laser beam by changing the angle The upper surface of the cavity of the lower mold, the lower surface of the cavity of the upper mold, the side of the cavity of the lower mold, and the side of the cavity of the upper mold. 如申請專利範圍第6項所述的成形模清潔方法,其特徵在於, 變更所述反射鏡的方向。 The forming mold cleaning method as described in item 6 of the scope of patent application is characterized in that: Change the direction of the mirror. 如申請專利範圍第6項所述的成形模清潔方法,其特徵在於,使用與所述反射鏡的兩側部連接的一對第一轉動軸體及第二轉動軸體、以及在軸方向上可動地保持所述第一轉動軸體及所述第二轉動軸體的至少一者的轉動軸體保持工具。 The cleaning method of the forming mold as described in item 6 of the scope of patent application, characterized in that a pair of first and second rotating shafts connected to both sides of the reflector are used, and in the axial direction A rotating shaft holding tool for movably holding at least one of the first rotating shaft and the second rotating shaft. 如申請專利範圍第6項所述的成形模清潔方法,其是去除附著在對表面的至少一部分施加了塗層的所述成形模上的附著物的方法,其特徵在於,以如下的照射強度將所述雷射光束照射至所述成形模上,所述照射強度是在所述附著物上生成了等離子體後能夠將所述等離子體加熱至所述附著物氣化的溫度以上的溫度的照射強度,且為比對所述塗層造成損傷的照射強度低的照射強度。 The cleaning method for forming molds as described in item 6 of the scope of the patent application is a method of removing adherents attached to the forming mold on which at least a part of the surface is coated, and is characterized in that the irradiation intensity is as follows The laser beam is irradiated to the forming mold, and the irradiation intensity is such that after plasma is generated on the attachment, the plasma can be heated to a temperature higher than the temperature at which the attachment is vaporized The irradiation intensity is lower than the irradiation intensity that damages the coating. 一種樹脂成形裝置,其特徵在於,包括:成形模、及如申請專利範圍第1項至第5項中任一項所述的成形模清潔裝置。 A resin molding device, characterized by comprising: a molding die, and the molding die cleaning device according to any one of items 1 to 5 in the scope of the patent application. 一種樹脂成形品製造方法,其特徵在於,在實施如申請專利範圍第6項至第9項中任一項所述的成形模清潔方法後,使用所述成形模製造樹脂成形品。 A method for manufacturing a resin molded product, which is characterized in that the molding die is used to manufacture a resin molded product after the molding die cleaning method described in any one of the 6th to 9th patent applications is implemented.
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