TWI745865B - Substrate processing device and component manufacturing method - Google Patents

Abstract

The exposure apparatus EX is to form a predetermined pattern on the substrate P while conveying the long substrate P in the longitudinal direction, and includes: a cylindrical reel DR, a support substrate P; a main body frame 21 as a first support member, and The first optical table 23, which pivotally supports the cylindrical reel DR; the drawing device 11, is arranged opposite to the rotating reel DR via the substrate P, and forms a pattern on the substrate P; the second optical table 25 as the second supporting member, Holding drawing device 11; rotating mechanism 24 to rotatably connect the first optical table 23 and the second optical table 25; scale parts GPa, GPb to measure the position change of the cylindrical reel DR; and the encoder read head EN1 , EN2, check the scale of GPa, GPb of the scale.

Description

Substrate processing device and component manufacturing method

The present invention relates to a substrate processing device, a method for adjusting the substrate processing device, a component manufacturing system, and a component manufacturing method.

Conventionally, as a substrate processing apparatus, a proximity-type pattern exposure apparatus is known, which includes an exposure roller for conveying a sheet-like workpiece (substrate), a mask arranged on the upper part of the exposure roller, and a multi-faceted rotation of light from an exposure light source. The mirror scans and irradiates the illumination part of the exposure mask (see, for example, Patent Document 1). This pattern exposure device exposes the mask pattern of the mask on the workpiece by conveying the sheet-shaped workpiece with the exposure roller while irradiating the mask with light from the illuminating unit. Although the pattern exposure apparatus described in Patent Document 1 winds the workpiece around the exposure drum and transports it, there is a possibility that the arrangement relationship between the photomask and the workpiece may be changed due to the influence of vibration caused by the rotation of the exposure drum. In this case, the arrangement relationship between the workpiece and the photomask wound around the exposure drum will be displaced from the predetermined arrangement relationship suitable for exposure, so it is difficult for the photomask pattern of the photomask to be accurately exposed to the workpiece.

Patent Document 1: Japanese Patent Application Publication No. 2007-72171

According to the first aspect of the present invention, a substrate processing apparatus is provided, which conveys a long sheet substrate in the longitudinal direction, and sequentially forms a predetermined pattern on the sheet substrate, and includes: a cylindrical reel with A cylindrical outer peripheral surface with a certain radius from the center line extending in the direction intersecting the longitudinal direction, and a part of the outer peripheral surface supports the sheet substrate; the first supporting member supports the cylindrical reel shaft to form It can rotate around the center line; the pattern forming device is arranged opposite to the part supporting the sheet substrate on the outer peripheral surface of the cylindrical reel, and forms the pattern on the sheet substrate; the second supporting member holds the pattern Forming device; a connecting mechanism that connects the relative arrangement relationship between the aforementioned cylindrical reel and the aforementioned pattern forming device so as to be adjustable; a reference member, which rotates around the aforementioned centerline together with the aforementioned cylindrical reel, is provided for measuring the aforementioned cylindrical reel The index of the rotation direction of the drum or the position change in the direction of the center line; and the first detection device is provided on the second support member, and detects the index of the reference member to detect the direction of rotation of the cylindrical drum or the direction of the center line The location changes.

According to the second aspect of the present invention, there is provided a method for adjusting a substrate processing apparatus having a cylindrical outer peripheral surface with a certain radius from the center line supporting a sheet substrate and being supported by a first supporting member around the aforementioned center A wire-rotating cylindrical reel, and a pattern forming device that is supported by a second support member to form a predetermined pattern on the sheet substrate supported by the cylindrical reel, and the adjustment method includes: arranging on the second support A pair of read heads on the component side reads the actions of a pair of scale parts of the encoders for rotation measurement arranged on both sides of the center line of the cylindrical reel; from the detection results of the aforementioned pair of read heads Calculate the deviation of the aforementioned cylindrical reel and the aforementioned pattern forming device from the predetermined relative arrangement relationship; and adjust the coupling of the aforementioned first support member and the aforementioned second support member in a way to reduce the aforementioned deviation The movement of the link mechanism capable of relative displacement.

According to the third aspect of the present invention, there is provided a method for adjusting a substrate processing apparatus having a cylindrical outer peripheral surface with a certain radius from the center line supporting a sheet substrate and being supported by a first supporting member around the aforementioned center A wire-rotating cylindrical reel, and a pattern forming device that is supported by a second support member to form a predetermined pattern on the sheet substrate supported by the cylindrical reel, and the adjustment method includes: arranging on the second support A pair of read heads on the component side reads the actions of a pair of scale parts of the encoders for rotation measurement arranged on both sides of the center line of the cylindrical reel; from the detection results of the aforementioned pair of read heads Calculate the deviation of the aforementioned cylindrical reel and the aforementioned pattern forming device from the predetermined relative arrangement relationship; and reflect the aforementioned deviation, and adjust the aforementioned pattern forming device on the sheet substrate with respect to the aforementioned cylindrical reel The movement of the spatial position of the patterned area.

According to the fourth aspect of the present invention, there is provided a device manufacturing system including the substrate processing apparatus of the first aspect of the present invention.

According to the fifth aspect of the present invention, there is provided a device manufacturing method, wherein the pattern forming device of the first aspect of the present invention is an exposure device that irradiates the sheet substrate with light energy corresponding to the shape of the predetermined pattern; and includes: The action of conveying the sheet substrate with the photosensitive functional layer formed on the surface in the longitudinal direction while being supported by a part of the cylindrical roll; the sheet substrate is supported by the cylindrical roll toward the sheet substrate The action of partially irradiating light energy from the exposure device; and the action of processing the irradiated sheet substrate to form a layer corresponding to the shape of a predetermined pattern on the sheet substrate.

According to the sixth aspect of the present invention, there is provided a substrate processing apparatus that sequentially forms a predetermined pattern on the sheet substrate while conveying a long sheet substrate in the longitudinal direction, and includes: a first support member, A shaft-supported cylindrical reel, which has a cylindrical outer peripheral surface with a certain radius from the center line extending in the direction intersecting the longitudinal direction, and can support the sheet-like shape by a part of the outer peripheral surface The substrate rotates around the center line on one side; the second supporting member arranges and holds a plurality of pattern forming parts in the width direction of the sheet substrate. The portion of the outer peripheral surface of the reel that supports the sheet substrate is arranged to face each other; the first rotation mechanism can adjust the first support member and the second support member in order to adjust the inclination of the pattern to be formed on the sheet substrate The relative angular relationship of the supporting members; the reference member, which rotates around the centerline together with the cylindrical drum, is provided with an index for measuring the rotation direction of the cylindrical drum or the position change in the centerline direction; and the first detection The device is provided on the second support member side, detects the index of the reference member to detect the position change of the rotation direction of the cylindrical drum, and detects the relative angle change between the first support member and the second support member.

The form (embodiment) for implementing the present invention will be described in detail with reference to the drawings. Of course, the present invention is not limited to the content described in the following embodiments. In addition, the constituent elements described below include those that can be easily imagined by a person having ordinary knowledge in the technical field to which the invention belongs, and those that are substantially the same. In addition, the constituent elements described below can be combined as appropriate. In addition, various omissions, substitutions, or changes of constituent elements can be made without departing from the scope of the present invention.

[First Embodiment] FIG. 1 is a diagram showing the overall configuration of the exposure apparatus (substrate processing apparatus) of the first embodiment. The substrate processing apparatus of the first embodiment is an exposure apparatus EX that applies exposure processing to a substrate P, and the exposure device EX is incorporated in a component manufacturing system 1 that applies various processing to the exposed substrate P to manufacture components. First, the component manufacturing system 1 will be described.

＜Component manufacturing system＞ The component manufacturing system 1 is a production line (flexible display manufacturing line) that manufactures flexible displays as components. Flexible displays, such as organic EL displays. In this component manufacturing system 1, the substrate P is sent out from a supply reel (not shown) in which a flexible substrate P is rolled into a cylindrical shape, and after various processes are continuously applied to the sent substrate P, the The processed substrate P is wound as a flexible element on a so-called roll-to-roll (Ro11"to"Ro11) method of a reel for recycling (not shown). In the component manufacturing system 1 of the first embodiment, the film-like sheet substrate P is sent out from the supply reel, and the substrate P sent out from the supply reel passes through the processing device U1, the exposure device EX, and the processing device U2 in this order After that, it is wound on a reel for recycling. Here, the substrate P to be processed by the component manufacturing system 1 will be described.

The substrate P is a foil made of a metal or alloy such as a resin film, stainless steel, and the like. The material of the resin film includes, for example, polyethylene resin, polypropylene resin, polyester resin, ethylene vinyl copolymer resin, polyvinyl chloride resin, cellulose resin, polyamide resin, polyimide resin, and polycarbonate. Ester resin, polystyrene resin, polyvinyl alcohol resin and other materials one or more than two kinds.

For the substrate P, it is better to select, for example, the thermal expansion coefficient is not significant, and the amount of deformation due to heat during various treatments performed on the substrate P can be substantially ignored. The coefficient of thermal expansion can be set to be smaller than the threshold value corresponding to the processing temperature by, for example, mixing inorganic fillers in the resin film. The inorganic filler may be, for example, titanium oxide, zinc oxide, aluminum oxide, silicon oxide, and the like. In addition, the substrate P may be a single layer of ultra-thin glass with a thickness of about 100 μm manufactured by a float method or the like, or a laminate of the above-mentioned resin film, foil, etc., bonded to this ultra-thin glass.

The substrate P configured in this manner is wound into a roll shape to become a supply roll, and this supply roll is mounted in the component manufacturing system 1. The component manufacturing system 1 equipped with a supply reel repeatedly performs various processes for manufacturing components on the substrate P sent from the supply reel in the longitudinal direction. Therefore, the processed substrate P becomes a state in which a plurality of components are connected. In other words, the substrate P sent out from the supply reel is a multi-sided substrate. In addition, the substrate P may have its surface modified and activated in advance by a predetermined pretreatment, or may have a fine partition structure (concave-convex structure) formed on the surface for precise patterning.

The processed substrate P is wound into a roll shape to be recovered as a recovery roll. The recycling reel is installed in a cutting device not shown. A cutting device equipped with a reel for recycling, divides (cuts) the processed substrate P into individual components, and then becomes a plurality of components. The size of the substrate P, for example, the size in the width direction (the direction of the short side) is about 10 cm to 2 m, and the size in the length direction (the direction of the long strip) is 10 m or more. In addition, the size of the substrate P is not limited to the above-mentioned size.

Next, the component manufacturing system 1 will be described with reference to FIG. 1. The component manufacturing system 1 includes a processing device U1, an exposure device EX, and a processing device U2. In addition, Fig. 1 is an orthogonal coordinate system in which the X direction, the Y direction, and the Z direction are orthogonal. The X direction is the direction from the processing device U1 to the processing device U2 via the exposure device EX in the horizontal plane. The Y direction is the direction orthogonal to the X direction in the horizontal plane, and is the width direction of the substrate P. The Z direction is the direction orthogonal to the X direction and the Y direction (vertical direction).

The processing device U1 is a pre-process (pre-processing) for the substrate P subjected to the exposure processing by the exposure device EX. The processing device U1 sends the pre-processed substrate P to the exposure device EX. At this time, the substrate P sent to the exposure device EX is a substrate (photosensitive substrate) P on which a photosensitive functional layer (photosensitive layer) is formed.

Here, the photosensitive functional layer is coated on the substrate P as a solution, and dried to become a layer (film). The typical photosensitive functional layer has a photoresist, but as a material that is not needed after development, there is a liquid-philic and modified photosensitive silane coupling agent (SAM) in the part irradiated by ultraviolet rays, or irradiated by ultraviolet rays. The part of it exposes the photosensitive reduction material of the plating reduction base and so on. When a photosensitive silane coupling agent material is used as a photosensitive functional layer, the pattern part exposed by ultraviolet rays on the substrate P is changed from liquid repellent to lyophilic, so conductive ink is selectively coated on the lyophilic part (Ink containing conductive nano particles such as silver or copper) to form a pattern layer. When a photosensitive reducing material is used as a photosensitive functional layer, since the plating reducing base is exposed on the pattern portion of the substrate P exposed by ultraviolet rays, immediately after exposure, the substrate P is immersed in an electroless plating solution containing palladium ions, etc. For a certain period of time, a patterned layer of palladium is formed (precipitated).

The exposure device EX draws a pattern such as a circuit or wiring for a display on the substrate P supplied from the processing device U1. The details will be described later. This exposure device EX exposes the substrate P by scanning the multiple drawing lines LL1 to LL5 obtained by scanning each of the multiple drawing light beams LB in a predetermined scanning direction.

The processing device U2 performs post-processing (post-processing) on the substrate P after exposure processing by the exposure device EX. The substrate P subjected to the exposure processing in the exposure device EX is sent to the processing device U2. The processing device U2 forms a pattern layer of electronic components on the substrate P by applying a predetermined processing to the substrate P that has been exposed.

＜Exposure equipment (substrate processing equipment)＞ Next, the exposure apparatus EX will be described with reference to FIGS. 1 to 9. Fig. 2 is a perspective view showing the configuration of the main parts of the exposure apparatus of Fig. 1. Fig. 3 is a diagram showing the arrangement relationship between the alignment microscope and the drawing line on the substrate. FIG. 4 is a diagram showing the structure of the rotating reel and the drawing device of the exposure device of FIG. 1. FIG. Fig. 5 is a plan view showing the configuration of the main parts of the exposure apparatus of Fig. 1. FIG. 6 is a perspective view showing the structure of a branch optical system of the exposure device of FIG. 1. FIG. FIG. 7 is a diagram showing the arrangement relationship of a plurality of scanners of the exposure device of FIG. 1. FIG. Fig. 8 is a perspective view showing the arrangement relationship between the alignment microscope and the drawing line on the substrate and the encoder read head. Fig. 9 is a perspective view showing the surface structure of the rotating reel of the exposure device of Fig. 1.

As shown in Fig. 1, the exposure device EX is an exposure device that does not use a mask, a so-called maskless drawing exposure device, which scans the drawing light beam LB in a predetermined scanning direction while conveying the substrate P in the conveying direction. According to this, the surface of the substrate P is drawn to form a predetermined pattern on the substrate P.

As shown in FIG. 1, the exposure apparatus EX includes a drawing device 11, a substrate transport mechanism 12, alignment microscopes AM1, AM2, and a control device 16. The drawing device 11 has a plurality of drawing modules UW1 to UW5, and the plurality of drawing modules UW1 to UW5 draw a predetermined pattern on a part of the substrate P conveyed by the substrate conveying mechanism 12. The substrate transport mechanism 12 transports the substrate P transported from the processing device U1 of the previous process to the processing device U2 of the subsequent process at a predetermined speed. The alignment microscopes AM1 and AM2 are used to perform relative positional alignment between the pattern to be drawn on the substrate P and the substrate P, and to detect alignment marks formed on the substrate P in advance. The control device 16 controls each part of the exposure device EX to make each part perform processing. The control device 16 may be a part or all of a higher-level control device of the control element manufacturing system 1. In addition, the control device 16 may be a device different from the upper control device controlled by the upper control device. The control device 16 includes, for example, a computer.

Moreover, the exposure apparatus EX is equipped with the apparatus frame 13 (refer FIG. 2) which supports the drawing apparatus 11 and the board|substrate conveying mechanism 12, and the rotation position detection mechanism (refer FIG. 4 and FIG. 8) 14. Furthermore, a light source device CNT that emits laser light (pulsed light) as the drawing light beam LB is provided in the exposure device EX. This exposure device EX guides the drawing light beam LB emitted from the light source device CNT in the drawing device 11 and projects it on the substrate P conveyed by the substrate conveying mechanism 12.

As shown in Fig. 1, the exposure device EX is housed in the temperature control room EVC. The greenhouse EVC is installed on the setting surface E of the manufacturing plant through passive or active anti-vibration units SU1 and SU2. The anti-vibration units SU1 and SU2 are installed on the installation surface E to reduce the vibration from the installation surface E. The greenhouse EVC keeps the interior at a predetermined temperature, thereby suppressing the change in the shape of the substrate P that is transported inside due to the temperature.

Next, the substrate transport mechanism 12 of the exposure apparatus EX will be described with reference to FIG. 1. The substrate transport mechanism 12 has an edge position controller EPC, a drive roller DR4, a tension adjustment roller RT1, a rotating reel (cylindrical reel) DR, a tension adjustment roller RT2, and a drive roller in order from the upstream side in the transport direction of the substrate P DR6, and drive roller DR7.

The edge position controller EPC adjusts the position of the substrate P transported from the processing unit U1 in the width direction. The edge position controller EPC uses the width direction end (edge) position of the substrate P sent from the processing unit U1 to be within the range of ± tens of μm to tens of μm relative to the target position, so that the substrate P is in the width Move in the direction to correct the position of the substrate P in the width direction.

The driving roller DR4 rotates while clamping the front and back sides of the substrate P conveyed from the edge position controller EPC, and sends the substrate P to the downstream side in the conveying direction to convey the substrate P to the rotating reel DR. The rotating reel DR, while supporting the part of the pattern on the substrate P to be exposed in a cylindrical shape, rotates around the rotation center line X2 around the rotation center line AX2 extending in the Y direction, thereby conveying the substrate P. In order to make the rotating drum DR rotate around the rotating center line AX2, shaft parts Sf2 coaxial with the rotating center line AX2 are provided on both sides of the rotating drum DR. This shaft portion Sf2 is given a rotational torque from a driving source (motor or reduction gear mechanism, etc.) not shown. In addition, the surface extending in the Z direction passing through the rotation center line AX2 is the center surface p3. The two sets of tension adjusting rollers RT1 and RT2 apply a predetermined tension to the substrate P wound and supported by the rotating reel DR. The two sets of drive rollers DR6 and DR7 are arranged at a predetermined interval in the conveying direction of the substrate P, and a predetermined slack DL is given to the substrate P after exposure. The upstream side of the substrate P that is clamped and transported by the driving roller DR6 rotates, and the downstream side of the substrate P that is clamped and transported by the driving roller DR7 rotates, thereby transporting the substrate P to the processing device U2. At this time, since the substrate P is given a slack DL, it can absorb the change in the conveying speed of the substrate P on the downstream side of the driving roller DR6 in the conveying direction, and isolate the influence of the exposure processing of the substrate P due to the change in the conveying speed.

Therefore, the substrate transport mechanism 12 can adjust the position of the substrate P transported from the processing apparatus U1 in the width direction by the edge position controller EPC. The substrate transport mechanism 12 transports the substrate P whose position in the width direction has been adjusted to the tension adjustment roller RT1 by the driving roller DR4, and transports the substrate P passing the tension adjustment roller RT1 to the rotating reel DR. The substrate transport mechanism 12 rotates the rotating drum DR, thereby transferring the substrate P supported by the rotating drum DR to the tension adjustment drum RT2. The substrate transport mechanism 12 transports the substrate P transported to the tension adjustment roller RT2 to the driving roller DR6, and transports the substrate P transported to the driving roller DR6 to the driving roller DR7. Next, the substrate transport mechanism 12 uses the drive roller DR6 and the drive roller DR7 to transport the substrate P to the processing apparatus U2 while imparting slack DL to the substrate P.

Next, referring to Fig. 2, the device frame 13 of the exposure device EX will be described. In Fig. 2, the X direction, the Y direction and the Z direction are an orthogonal orthogonal coordinate system, which is the same orthogonal coordinate system as in Fig. 1. The exposure apparatus EX is equipped with the drawing apparatus 11 shown in FIG. 1 and the apparatus frame 13 which supports the rotating reel DR of the board|substrate conveying mechanism 12.

The device frame 13 shown in FIG. 2 has a main body frame 21, a three-point seat (support mechanism) 22, a first optical table 23, a rotating mechanism 24, and a second optical table 25 in this order from the lower side in the Z direction. The main body frame 21 is installed on the installation surface E through the anti-vibration units SU1 and SU2. The main body frame 21 rotatably supports the rotating drum DR and the tension adjustment drums RT1 (not shown) and RT2. The first optical table 23 is provided on the upper side of the rotating reel DR in the vertical direction, and is provided on the main body frame 21 through the three-point seat 22. The three-point seat 22 supports the first optical table 23 with three supporting points 22a, and the position of each supporting point 22a in the Z direction can be adjusted. Therefore, the three-point seat 22 can adjust the tilt of the platform surface of the first optical platform 23 relative to the horizontal plane to a predetermined tilt. In addition, when the device frame 13 is assembled, the position between the main body frame 21 and the three-point seat 22 can be adjusted in the X direction and the Y direction in the XY plane. On the other hand, after the device frame 13 is assembled, the body frame 21 and the three-point seat 22 are in a fixed state (rigid state). As described above, the main body frame 21 and the first optical table 23 connected by the three-point base 22 function as a first supporting member.

The second optical table 25 is provided on the upper side of the first optical table 23 in the vertical direction, and the transmission rotating mechanism 24 is provided on the first optical table 23. The second optical table 25 has a table surface parallel to the table surface of the first optical table 23. The second optical table 25 is provided with a plurality of drawing modules UW1 to UW5 of the drawing device 11. The rotating mechanism 24 is capable of setting the table surfaces of the first optical table 23 and the second optical table 25 substantially parallel with respect to the first optical table 23 with a predetermined rotation axis I extending in the vertical direction as the center. The second optical table 25 rotates. The rotation axis I extends in the vertical direction in the center plane p3 and passes through a predetermined point (refer to FIG. 3) wound on the surface of the substrate P of the rotating reel DR (the drawing surface curved along the circumferential surface). The rotation mechanism 24 rotates the second optical table 25 with respect to the first optical table 23 to adjust the position of the plurality of drawing modules UW1 to UW5 relative to the substrate P wound on the rotating reel DR.

Next, the light source device CNT will be described with reference to FIGS. 1 and 5. The light source device CNT is arranged on the body frame 21 of the device frame 13. The light source device CNT emits laser light as a drawing beam LB projected on the substrate p. The light source device CNT has a light source that emits light in a predetermined wavelength band suitable for exposure of the photosensitive functional layer on the substrate P and is set to light in the ultraviolet region with strong photoactivity. As a light source, for example, a laser light source that emits YAG's third-order harmonic laser light (wavelength 355nm) can be used, or the seed light from the infrared wavelength region of a semiconductor laser light source can be amplified by a fiber amplifier and then converted by wavelength. Components (crystal components that generate harmonics, etc.) and fiber-amplified laser light sources that emit laser light in the ultraviolet wavelength region below 400nm. In this case, the emitted ultraviolet laser light can be continuously oscillated, or it can be a pulsed laser light whose emission time per pulse is less than tens of milliseconds and oscillates at a frequency above 100MHz. In addition, as a light source, for example, a mercury lamp with a bright line in the ultraviolet region (g-line, h-line, i-line, etc.) can also be used, and a laser diode with an oscillation peak in the ultraviolet region with a wavelength below 450nm , Light-emitting diodes (LED) and other solid-state light sources, or KrF excimer laser light (wavelength 248nm), ArF excimer laser light (wavelength 193nm), XeCl excimer laser light ( Gas laser light source with a wavelength of 308nm).

Here, the drawing light beam LB emitted from the light source device CNT is incident on the polarization beam splitter PBS described later. In order for the drawing light beam LB to suppress energy loss due to the separation of the drawing light beam LB by the polarization beam splitter PBS, it is preferable that the incident drawing light beam LB be a light beam that is substantially totally reflected by the polarization beam splitter PBS. The polarization beam splitter PBS reflects the linearly polarized light beam that becomes S-polarized light, and transmits the linearly polarized light beam that becomes P-polarized light. Therefore, for the light source device CNT, it is preferable that the drawing light beam LB incident on the polarizing beam splitter PBS becomes the laser light of the linearly polarized (S-polarized) light beam. In addition, since the laser light has a high energy density, the illuminance of the light beam projected on the substrate P can be appropriately ensured.

Next, the drawing device 11 of the exposure device EX will be described. The drawing device 11 is a so-called multi-beam drawing device 11 using a plurality of drawing modules UW1 to UW5. This drawing device 11 divides the drawing light beam LB emitted from the light source device CNT into a plurality of lines, and divides the branched drawing light beams LB into a plurality of lines (for example, 5 in the first embodiment) on the substrate P. LL1 ~ LL5 are scanned separately. Next, the drawing device 11 joins the patterns drawn on the substrate P by each of the plurality of drawing lines LL1 to LL5 in the width direction of the substrate P. First, referring to FIG. 3, a plurality of drawing lines LL1 to LL5 formed on the substrate P by scanning a plurality of drawing light beams LB by the drawing device 11 will be described.

As shown in FIG. 3, a plurality of drawing lines LL1 to LL5 are arranged in two rows in the circumferential direction of the rotating drum DR with the center plane p3 interposed therebetween. On the substrate P on the upstream side in the rotation direction, odd-numbered first drawing lines LL1, third drawing lines LL3, and fifth drawing lines LL5 are arranged. On the substrate P on the downstream side in the rotation direction, an even-numbered second drawing line LL2 and a fourth drawing line LL4 are arranged.

The drawing lines LL1 to LL5 are formed in the width direction (Y direction) of the substrate P, that is, along the rotation center line AX2 of the rotating drum DR, and are shorter than the length of the substrate P in the width direction. Strictly speaking, each of the drawing lines LL1 to LL5 is a method that minimizes the joining error of the pattern obtained by the plurality of drawing lines LL1 to LL5 when the substrate P is transported at the reference speed by the substrate transport mechanism 12, and the reel is relatively rotated The rotation center line AX2 of DR is inclined by a predetermined angle.

The odd-numbered first drawing line LL1, third drawing line LL3, and fifth drawing line LL5 are arranged at a predetermined interval in the extending direction (axial direction) of the rotation center line AX2 of the rotating reel DR. In addition, the even-numbered second drawing line LL2 and the fourth drawing line LL4 are arranged at a predetermined interval in the axial direction of the rotating drum DR. At this time, the second drawing line LL2 is arranged between the first drawing line LL1 and the third drawing line LL3 in the axial direction. Similarly, the third drawing line LL3 is arranged between the second drawing line LL2 and the fourth drawing line LL4 in the axial direction. The fourth drawing line LL4 is arranged between the third drawing line LL3 and the fifth drawing line LL5 in the axial direction. In addition, the first to fifth drawing lines LL1 to LL5 are arranged so as to cover the full width of the exposure area A7 drawn on the substrate P in the width direction (axial direction).

The scanning direction of the drawing light beam LB scanned along the odd-numbered first drawing line LL1, the third drawing line LL3, and the fifth drawing line LL5 is a one-dimensional direction and the same direction. In addition, the scanning direction of the drawing light beam LB scanned along the even-numbered second drawing line LL2 and the fourth drawing line LL4 is a one-dimensional direction and the same direction. At this time, the scanning direction of the drawing light beam LB scanned along the odd-numbered drawing lines LL1, LL3, LL5 and the scanning direction of the drawing light beam LB scanned along the even-numbered drawing lines LL2, LL4 are opposite directions. Therefore, from the perspective of the conveying direction of the substrate P, the drawing start positions of the odd-numbered drawing lines LL1, LL3, and LL5 are adjacent to the drawing end positions of the even-numbered drawing lines LL2 and LL4. Similarly, the odd-numbered drawing lines LL1, The drawing end positions of LL3 and LL5 are adjacent to the drawing start positions of even-numbered drawing lines LL2 and LL4.

Next, the drawing device 11 will be described with reference to FIGS. 4 to 7. The drawing device 11 has the above-mentioned multiple drawing modules UW1 to UW5, a beam distribution optical system SL that splits the drawing light beam LB from the light source device CNT to the multiple drawing modules UW1 to UW5, and a calibration for calibration Detection Department 31.

The light beam distribution optical system SL divides the drawing light beam LB emitted from the light source device CNT into a plurality of light beams, and directs the branched drawing light beams LB to the plural drawing modules UW1 to UW5, respectively. The beam distribution optical system SL has a first optical system 41 that splits the drawing light beam LB emitted from the light source device CNT into two, a second optical system 42 that is irradiated by the drawing light beam LB by one of the branches of the first optical system 41, and The third optical system 43 irradiated by another drawing light beam LB branched from the first optical system 41. In addition, the light beam distribution optical system SL includes an XY halving adjustment mechanism 44 and an XY halving adjustment mechanism 45. In the light beam distribution optical system SL, a part of the light source device CNT side is disposed on the main body frame 21, and on the other hand, another part of the drawing modules UW1 to UW5 is disposed on the second optical table 25.

The first optical system 41 has a 1/2 wave plate 51, a polarizer 52, a beam diffuser 53, a first reflector 54, a first relay lens 55, a second relay lens 56, and a second reflector 57. The third reflecting mirror 58, the fourth reflecting mirror 59, and the first beam splitter 60.

The drawing light beam LB emitted from the light source device CNT in the +X direction is irradiated on the 1/2 wave plate 51. The 1/2 wave plate 51 is rotatable within the irradiation surface of the drawing light beam LB. The drawing light beam LB irradiated on the 1/2 wave plate 51 has a polarization direction corresponding to a predetermined polarization direction corresponding to the rotation amount of the 1/2 wave plate 51. The drawing light beam LB passing through the 1/2 wave plate 51 irradiates a polarizer (polarization beam splitter) 52. The polarizer 52 transmits the drawing light beam LB in the predetermined polarization direction, and on the other hand reflects the drawing light beam LB outside the predetermined polarization direction in the +Y direction. Therefore, the drawing light beam LB reflected by the polarizer 52 passes through the 1/2 wave plate 51, so it can be rotated by the 1/2 wave plate 51 and the polarizer 52 by the cooperation of the 1/2 wave plate 51. The amount corresponds to the intensity of the beam. In other words, by rotating the 1/2 wave plate 51 to change the polarization direction of the drawing light beam LB, the beam intensity of the drawing light beam LB reflected by the polarizer 52 can be adjusted.

The drawing light beam LB that has passed through the polarizer 52 irradiates the diffuser 53. The diffuser 53 absorbs the drawing light beam LB, and prevents the drawing light beam LB irradiated on the diffuser 53 from leaking to the outside. The drawing light beam LB reflected in the +Y direction by the polarizer 52 is irradiated on the first reflecting mirror 54. The drawing light beam LB irradiated on the first mirror 54 is reflected in the +X direction by the first mirror 54 and irradiated on the second mirror 57 via the first relay lens 55 and the second relay lens 56. The drawing light beam LB irradiated on the second mirror 57 is reflected in the −Y direction by the second mirror 57 and irradiated on the third mirror 58. The drawing light beam LB irradiated on the third mirror 58 is reflected in the −Z direction by the third mirror 58 and irradiated on the fourth mirror 59. The drawing light beam LB irradiated on the fourth mirror 59 is reflected in the +Y direction by the fourth mirror 59 and irradiated on the first beam splitter 60. A part of the drawing light beam LB irradiated on the first beam splitter 60 is reflected in the −X direction and irradiated on the second optical system 42, and the other part is transmitted and irradiated on the third optical system 43.

The third mirror 58 and the fourth mirror 59 are arranged at a predetermined interval on the rotation axis I of the rotation mechanism 24. In addition, the structure up to the light source device CNT including the third mirror 58 (the upper side in the Z direction in FIG. 4, surrounded by a two-dot chain line) is provided on the main body frame 21 side to include the fourth mirror 59 The plurality of drawing modules UW1 to UW5 (the part surrounded by a two-dot chain line on the lower side in the Z direction in FIG. 4) is arranged on the second optical table 25 side. Therefore, even if the second optical table 25 is rotated relative to the first optical table 23 by the rotation mechanism 24, the third mirror 58 and the fourth mirror 59 are provided on the rotation axis I, so the optical path of the drawing beam LB is not changed. . Therefore, even if the second optical table 25 is rotated with respect to the first optical table 23 by the rotation mechanism 24, the drawing light beam LB emitted from the light source device CNT provided on the side of the main body frame 21 can be guided very appropriately to the second optical table 23. A plurality of drawing modules UW1 to UW5 on the side of the optical platform 25.

The second optical system 42 divides the drawing light beam LB of one of the branches of the first optical system 41 to guide the odd-numbered drawing modules UW1, UW3, UW5 to be described later. The second optical system 42 has a fifth mirror 61, a second beam splitter 62, a third beam splitter 63, and a sixth mirror 64.

The first beam splitter 60 in the first optical system 41 is reflected by the drawing light beam LB in the −X direction, and irradiates the fifth mirror 61. The drawing light beam LB irradiated on the fifth mirror 61 is reflected in the −Y direction by the fifth mirror 61 and irradiated on the second beam splitter 62. The drawing light beam LB irradiated on the second beam splitter 62 is partially reflected and irradiated on the odd-numbered drawing module UW5 (refer to FIG. 5 ). The drawing light beam LB irradiated on the second beam splitter 62 is partially penetrated and irradiated on the third beam splitter 63. A part of the drawing light beam LB irradiated on the third beam splitter 63 is reflected and irradiated on the odd-numbered drawing module UW3 (refer to FIG. 5). The drawing light beam LB irradiated on the third beam splitter 63 is partially penetrated and irradiated on the sixth mirror 64. The drawing light beam LB irradiated on the sixth mirror 64 is reflected by the sixth mirror 64 and irradiated on the odd-numbered drawing module UW1 (refer to FIG. 5 ). In addition, in the second optical system 42, the drawing light beams LB irradiated on the odd-numbered drawing modules UW1, UW3, and UW5 are slightly inclined with respect to the -Z direction (Z axis).

The third optical system 43 branches the drawing light beam LB of the other side of the first optical system 41 to branch to the even-numbered drawing modules UW2 and UW4 described later. The third optical system 43 has a seventh mirror 71, an eighth mirror 72, a fourth beam splitter 73, and a ninth mirror 74.

The drawing light beam LB transmitted in the Y direction by the first beam splitter 60 of the first optical system 41 irradiates the seventh mirror 71. The drawing light beam LB irradiated on the seventh mirror 71 is reflected in the X direction by the seventh mirror 71 and irradiated on the eighth mirror 72. The drawing light beam LB irradiated on the eighth mirror 72 is reflected in the −Y direction by the eighth mirror 72 and irradiated on the fourth beam splitter 73. A part of the drawing light beam LB irradiated on the fourth beam splitter 73 is reflected and irradiated on the even-numbered drawing module UW4 (refer to FIG. 5). The drawing light beam LB irradiated on the fourth beam splitter 73 is partially penetrated and irradiated on the ninth mirror 74. The drawing light beam LB irradiated on the ninth mirror 74 is reflected by the ninth mirror 74 and irradiated on the even-numbered drawing module UW2. In addition, in the third optical system 43, the drawing light beam LB irradiated on the even-numbered drawing modules UW2 and UW4 is also slightly inclined with respect to the -Z direction (Z axis).

As described above, in the light beam distribution optical system SL, the drawing light beam LB from the light source device CNT is divided into a plurality of drawing modules UW1 to UW5 toward the drawing modules UW1 to UW5. At this time, the reflectance (transmittance) of the first beam splitter 60, the second beam splitter 62, the third beam splitter 63, and the fourth beam splitter 73 are adjusted to be appropriate depending on the number of branches of the drawing light beam LB The reflectivity of, so that the beam intensity of the drawing light beam LB irradiated on the plurality of drawing modules UW1 to UW5 is the same intensity.

The XY bisection adjustment mechanism 44 is arranged between the second relay lens 56 and the second mirror 57. The XY bisection adjustment mechanism 44 can adjust all the drawing lines LL1 to LL5 formed on the substrate P to move slightly within the drawing surface of the substrate P. The XY bisection adjustment mechanism 44 is composed of a transparent parallel plate glass that can be tilted in the XZ plane of FIG. 6 and a transparent parallel plate glass that can be tilted in the YZ plane of FIG. 6. By adjusting the respective inclination amounts of the two parallel plate glasses, the drawing lines LL1 to LL5 formed on the substrate P can be slightly displaced in the X direction or the Z direction.

The XY bisection adjustment mechanism 45 is arranged between the seventh mirror 71 and the eighth mirror 72. The XY bisection adjustment mechanism 45 can adjust the even-numbered second drawing line LL2 and the fourth drawing line LL4 among the drawing lines LL1 to LL5 formed on the substrate P to move slightly within the drawing surface of the substrate P. The XY bisection adjustment mechanism 45 is the same as the XY bisection adjustment mechanism 44. It is composed of a transparent parallel plate glass that can be tilted in the XZ plane of FIG. 6 and a transparent parallel plate glass that can be tilted in the YZ plane of FIG. 6 . By adjusting the inclination of the two parallel plate glasses, the drawing lines LL2 and LL4 formed on the substrate P can be slightly displaced in the X direction or the Z direction.

Next, referring to FIG. 4, FIG. 5, and FIG. 7, a plurality of drawing modules UW1 to UW5 will be described. The multiple drawing modules UW1～UW5 are set corresponding to the multiple drawing lines LL1～LL5. The multiple drawing light beams LB branched by the light beam distribution optical system SL irradiate the multiple drawing modules UW1 to UW5, respectively. Each drawing module UW1 to UW5 directs a plurality of drawing light beams LB to each drawing line LL1 to LL5, respectively. That is, the first drawing module UW1 guides the drawing light beam LB to the first drawing line LL1, and similarly, the second to fifth drawing modules UW2 to UW5 guide the drawing light beam LB to the second to fifth drawing lines LL2. ~LL5. As shown in FIG. 4 (and FIG. 1), a plurality of drawing modules UW1 to UW5 are arranged in two rows in the circumferential direction of the rotating drum DR with the center plane p3 interposed therebetween. A plurality of drawing modules UW1 to UW5 are arranged on the side where the first, third, and fifth drawing lines LL1, LL3, LL5 are sandwiched between the center plane p3 (the -X direction side in Fig. 5), and the first drawing module UW1 is arranged , The third drawing module UW3 and the fifth drawing module UW5. The first drawing module UW1, the third drawing module UW3, and the fifth drawing module UW5 are arranged at a predetermined interval in the Y direction. In addition, a plurality of drawing modules UW1 to UW5 are arranged on the side where the second and fourth drawing lines LL2 and LL4 are arranged sandwiching the center plane p3 (the +X direction side in FIG. 5), and the second drawing module UW2 and the fourth drawing are arranged Module UW4. The second drawing module UW2 and the fourth drawing module UW4 are arranged at a predetermined interval in the Y direction. At this time, the second drawing module UW2 is arranged in the Y direction between the first drawing module UW1 and the third drawing module UW3. Similarly, the third drawing module UW3 is arranged between the second drawing module UW2 and the fourth drawing module UW4 in the Y direction. The fourth drawing module UW4 is arranged in the Y direction between the third drawing module UW3 and the fifth drawing module UW5. 4, the first drawing module UW1, the third drawing module UW3, the fifth drawing module UW5, the second drawing module UW2, and the fourth drawing module UW4, viewed from the Y direction, are The center plane p3 is centrally symmetrically arranged.

Next, each drawing module UW1 to UW5 will be described with reference to FIG. 4. In addition, since the drawing modules UW1 to UW5 have the same configuration, the first drawing module UW1 (hereinafter, simply referred to as drawing module UW1) will be described as an example.

The drawing module UW1 shown in FIG. 4 scans the drawing beam LB along the drawing line LL1 (first drawing line LL1), and is equipped with a light deflector 81, a polarization beam splitter PBS, a quarter wave plate 82, and a scanner 83 , Bending mirror 84, telecentric f-theta lens system 85, and optical member 86 for Y magnification correction. In addition, a calibration detection system 31 is provided adjacent to the deflection beam splitter PBS.

The optical deflector 81 uses, for example, an acousto-optic modulator (AOM: AcoustIic "Optic" Modulator). The light deflector 81 is switched ON/OFF by the control device 16 to switch the projection/non-projection of the drawing light beam LB to the substrate P at a high speed. Specifically, the drawing light beam LB from the light beam distribution optical system SL passes through the relay lens 91 of the second optical system 42 and irradiates the light deflector 81 slightly obliquely with respect to the -Z direction. When the light deflector 81 is switched to OFF, the drawing light beam LB advances straight in an oblique state, and is shielded by the light shielding plate 92 provided after passing through the light deflector 81. On the other hand, when the light deflector 81 is switched to ON, the drawing light beam LB incident on the light deflector 81 becomes a primary diffracted light beam and deflects in the -Z direction, is emitted from the light deflector 81 and incident on the light deflector The polarizing beam splitter PBS in the Z direction of the device 81. Therefore, when the light deflector 81 is switched ON, the drawing light beam LB is projected on the substrate P, and when the light deflector 81 is switched off, the drawing light beam LB is placed in a non-projected state on the substrate P.

The polarization beam splitter PBS reflects the drawing light beam LB irradiated from the light deflector 81 through the relay lens 93. On the other hand, the polarizing beam splitter PBS cooperates with the quarter-wave plate 82 provided between the polarizing beam splitter PBS and the scanner 83 to penetrate the substrate P( Or the reflected light generated by the outer peripheral surface of the rotating reel DR. That is, the linearly polarized laser light of the drawing light beam LB that is irradiated to the polarizing beam splitter PBS from the light deflector 81 is S-polarized light is reflected by the polarizing beam splitter PBS. In addition, the drawing light beam LB reflected by the polarization beam splitter PBS irradiates the substrate P through the quarter-wave plate 82, and then passes through the quarter-wave plate 82 from the substrate P again, thereby becoming a linearly polarized light beam of P polarization. Shoot light. Therefore, the reflected light generated from the substrate P (or the outer peripheral surface of the rotating drum DR) and irradiated on the polarizing beam splitter PBS penetrates the polarizing beam splitter PBS. In addition, the reflected light transmitted through the polarizing beam splitter PBS is irradiated to the calibration detection system 31 through the relay lens 94. On the other hand, the drawing light beam LB reflected by the polarization beam splitter PBS passes through the quarter wave plate 82 and enters the scanner 83.

As shown in FIGS. 4 and 7, the scanner 83 has a mirror 96, a rotating polygon mirror 97, and an origin detector 98. The drawing light beam LB passing through the quarter wave plate 82 is irradiated to the reflecting mirror 96 through the relay lens 95. The drawing light beam LB reflected by the reflecting mirror 96 irradiates the rotating polygon mirror 97. The rotating polygon mirror 97 includes a rotating shaft 97a extending in the Z direction, and a plurality of reflecting surfaces (for example, eight surfaces) 97b formed around the rotating shaft 97a. The rotating polygon mirror 97 rotates in a predetermined rotation direction with the rotation axis 97a as the center, so that the reflection angle of the drawing light beam LB irradiated on the reflecting surface 97b is continuously changed, thereby causing the reflected drawing light beam LB to travel along the substrate P The drawing line LL1 is scanned. The drawing light beam LB reflected by the rotating polygon mirror 97 irradiates the bending mirror 84. The origin detector 98 detects the origin of the drawing light beam LB scanned along the drawing line LL1 of the substrate P. The origin detector 98 is arranged on the opposite side of the reflecting mirror 96 via the drawing light beam LB reflected on each reflecting surface 97b. Therefore, the origin detector 98 detects the drawing light beam LB irradiated in front of the f-θ lens system 85. That is, the origin detector 98 detects the passage of the drawing light beam LB just before the drawing start position of the drawing line LL1 irradiated on the substrate P.

The drawing light beam LB irradiated on the bending mirror 84 from the scanner 83 is reflected by the bending mirror 84 and irradiated on the f-θ lens system 85. The f-theta lens system 85 includes a telecentric f-theta lens, and the drawing light beam LB reflected from the rotating polygon mirror 97 after passing through the bending mirror 84 is vertically projected on the drawing surface of the substrate P. At this time, the reflecting surface 97b of the rotating polygon mirror 97 and the drawing surface of the substrate P are optically conjugated in the sub-scanning direction (the length direction of the substrate P) orthogonal to the drawing line LL1, and the rotating polygon A cylindrical lens (not shown) is arranged in the optical path of the drawing light beam LB of the mirror 97 and the optical path of the drawing light beam LB emitted from the f-θ lens system 85, respectively, and is also provided with a cooperating f-θ lens system 85 Correction of optical face tangle error (optical face tangle error).

As shown in FIG. 7, the plurality of scanners 83 in the plurality of drawing modules UW1 to UW5 are symmetrical with respect to the center plane p3. A plurality of scanners 83, and the three scanners 83 corresponding to the drawing modules UW1, UW3, UW5 are arranged on the upstream side of the rotation direction of the rotating drum DR (the -X direction side in Fig. 7), and the drawing module UW2 The two scanners 83 corresponding to UW4 are arranged on the downstream side of the rotation direction of the rotating drum DR (+X direction side in Fig. 7). The three scanners 83 on the upstream side and the two scanners 83 on the downstream side are arranged to face each other across the center plane p3. At this time, the scanners 83 arranged on the upstream side and the scanners 83 arranged on the downstream side are configured to be 180° point-symmetrical with the rotation axis I as the center. Therefore, after the three rotating polygon mirrors 97 on the upstream side rotate to the left (counterclockwise in the XY plane) and irradiate the rotating polygon mirror 97 with the drawing beam LB, the drawing beam LB reflected by the rotating polygon mirror 97 is from The drawing start position is scanned in a predetermined scanning direction (for example, the +Y direction in Fig. 7) toward the drawing end position. On the other hand, after the two rotating polygon mirrors 97 on the downstream side rotate to the left while irradiating the rotating polygon mirror 97 with the drawing light beam LB, the drawing light beam LB reflected by the rotating polygon mirror 97 moves from the drawing start position to the drawing end The position is scanned in a scanning direction (for example, the -Y direction in FIG. 7) opposite to the three rotating polygon mirrors 97 on the upstream side.

Here, when viewed in the XZ plane of FIG. 4, the axis of the drawing light beam LB reaching the substrate P from the odd-numbered drawing modules UW1, UW3, UW5 is in the same direction as the installation azimuth line Le1. That is to say, the azimuth line Le1 is set to connect the odd-numbered drawing lines LL1, LL3, LL5 and the rotation center line AX2 in the XZ plane. Similarly, when viewed in the XZ plane of FIG. 4, the axis of the drawing light beam LB reaching the substrate P from the even-numbered drawing modules UW2 and UW4 is in the same direction as the setting azimuth line Le2. In other words, the azimuth line Le2 is set, and in the XZ plane, it is a line connecting the even-numbered drawing lines LL2, LL4 and the rotation center line AX2.

The optical member 86 for Y magnification correction is arranged between the f-θ lens system 85 and the substrate P. The optical member 86 for Y magnification correction slightly enlarges or reduces the size in the Y direction of the drawing lines LL1 to LL5 formed by the drawing modules UW1 to UW5.

In the drawing device 11 configured in this way, the control device 16 controls each part to draw a predetermined pattern on the substrate P. That is to say, the control device 16 uses the CAD (Computer "Aided" Design) information (for example, dot matrix format) of the pattern to be drawn on the substrate P during the scanning direction of the drawing light beam LB projected on the substrate P The ON/OFF modulation of the light deflector 81 is performed to deflect the drawing light beam LB so as to draw a pattern on the light sensing layer of the substrate P. In addition, the control device 16 synchronizes the scanning direction of the drawing light beam LB scanned along the drawing line LL1 with the movement of the substrate P in the conveying direction by the rotation of the rotating reel DR, so as to correspond to the drawing line LL1 in the exposure area A7 Partially depict the established pattern.

At this time, the size (dot diameter) of the drawing light beam LB projected from each drawing module UW1 to UW5 on the substrate P is set to D (μm), and the scanning speed along the drawing line LL1 to LL5 of the drawing light beam LB is set to When it is V (μm/sec), when the light source device CNT is a pulsed laser light source, the light-emitting repetition period T (sec) of the pulsed light is set to the relationship of T<D/V.

Next, referring to FIGS. 3 and 8, the alignment microscopes AM1 and AM2 will be described. The alignment microscopes AM1 and AM2 detect alignment marks formed on the substrate P in advance, or fiducial marks and fiducial patterns formed on the rotating reel DR. Hereinafter, the alignment mark of the substrate P and the fiducial mark and fiducial pattern of the rotating reel DR are simply referred to as marks. The alignment microscopes AM1 and AM2 are used to align (align) the position of the substrate P and a predetermined pattern drawn on the substrate P, or to align the rotating reel DR and the drawing device 11.

The alignment microscopes AM1 and AM2 are arranged on the upstream side of the rotation direction of the rotating drum DR compared to the drawing lines LL1 to LL5 formed by the drawing device 11. In addition, the alignment microscope AM1 is arranged on the upstream side of the rotation direction of the rotating reel DR than the alignment microscope AM2.

The alignment microscopes AM1 and AM2 are the object lens system GA that is used as the detection probe by projecting illumination light on the substrate P or the rotating reel DR and entering the mark The marked image (bright-field image, dark-field image, fluorescent image, etc.) is composed of a photographic system such as GD that is taken by a two-dimensional CCD, CMOS, etc. In addition, the illuminating light for alignment is light in a wavelength band that has little sensitivity to the light-sensitive layer on the substrate P, for example, light with a wavelength of about 500-800 nm.

The alignment microscope AM1 is arranged in a row in the Y direction (the width direction of the substrate P) with a plurality (for example, 3). Similarly, there are a plurality of alignment microscopes AM2 arranged in a row in the Y direction (the width direction of the substrate P) (for example, three). That is, there are six alignment microscopes AM1 and AM2 in total.

In FIG. 3, for ease of understanding, the arrangement of each pair of objective lens systems GA1 to GA3 of three alignment microscopes AM1 in each pair of objective lens systems GA of 6 alignment microscopes AM1 and AM2 is shown. The three pairs of objective lenses of the alignment microscope AM1 are GA1～GA3. The observation areas Vw1～Vw3 on the substrate P (or the outer peripheral surface of the rotating reel DR), as shown in Figure 3, are parallel to the rotation center line AX2 The Y direction is arranged at a predetermined interval. As shown in FIG. 8, the optical axes La1 to La3 of the pairs of objective lenses GA1 to GA3 passing through the centers of the observation regions Vw1 to Vw3 are all parallel to the XZ plane. Similarly, each pair of objective lens of the three alignment microscope AM2 is GA on the observation area Vw4～Vw6 on the substrate P (or the outer peripheral surface of the rotating drum DR), as shown in Fig. 3, in parallel with the rotation center line AX2 The Y direction is arranged at a predetermined interval. As shown in FIG. 8, the optical axes La4 to La6 of the pair of objective lenses GA passing through the centers of the observation areas Vw4 to Vw6 are also parallel to the XZ plane. The observation areas Vw1 to Vw3 and the observation areas Vw4 to Vw6 are arranged at predetermined intervals in the direction of rotation of the rotating drum DR.

The observation areas Vw1 to Vw6 of the marks by the alignment microscopes AM1 and AM2 are set on the substrate P and the rotating drum DR, for example, set in a range of 200 μm diagonal. Here, the optical axis La1 to La3 of the alignment microscope AM1, that is, the optical axis La1 to La3 of the objective lens system GA, are set to be aligned with the installation azimuth line extending from the rotation center line AX2 in the radial direction of the rotating drum DR Le3 is in the same direction. In other words, the azimuth line Le3 is set, and when observed in the XZ plane of FIG. 4, it is a line connecting the observation areas Vw1 to Vw3 of the alignment microscope AM1 and the rotation center line AX2. Similarly, the optical axis La4~La6 of the alignment microscope AM2, that is, the optical axis La4~La6 of the objective lens system GA, are set to be aligned with the azimuth line extending from the rotation center line AX2 in the radial direction of the rotating drum DR Le4 is in the same direction. In other words, the azimuth line Le4 is set, and when observed in the XZ plane of FIG. 4, it is a line connecting the observation area Vw4 to Vw6 of the alignment microscope AM2 and the rotation center line AX2. At this time, the alignment microscope AM1 is arranged on the upstream side of the rotation direction of the rotating drum DR compared with the alignment microscope AM2, so the angle formed by the center plane p3 and the installation azimuth line Le3 is greater than the center plane p3 and the installation azimuth line The angle formed by Le4 is large.

On the substrate P, as shown in FIG. 3, the exposure areas A7 drawn by each of the five drawing lines LL1 to LL5 are arranged at a predetermined interval in the X direction. Around the exposure area A7 on the substrate P, there are a plurality of alignment marks Ks1 to Ks3 (hereinafter referred to as marks) for position alignment, for example, formed in a cross shape.

In FIG. 3, the mark Ks1 is arranged at a certain interval in the X direction in the -Y side peripheral area of the exposure area A7, and the mark Ks3 is arranged at a certain interval in the X direction in the +Y side peripheral area of the exposure area A7. Furthermore, the mark Ks2 is set in the center of the Y direction in the blank area between two adjacent exposure areas A7 in the X direction.

The mark Ks1 is to be captured in the observation area Vw1 of the objective lens system GA1 of the alignment microscope AM1 and the observation area Vw4 of the objective lens GA1 of the alignment microscope AM2 in order during the transportation of the substrate P The way to form. In addition, the mark Ks3 is designed to be within the observation area Vw3 of the objective lens GA3 of the alignment microscope AM1 and the observation area Vw6 of the objective lens GA of the alignment microscope AM2, which can be followed during the transportation of the substrate P The way of order capture is formed. Further, the mark Ks2 is used to be respectively in the observation area Vw2 of the objective lens GA2 of the alignment microscope AM1 and the observation area Vw5 of the objective lens GA of the alignment microscope AM2, during the transportation of the substrate P Formed by sequential capture.

Therefore, the three alignment microscopes AM1 and AM2 on both sides of the Y direction of the rotating reel DR in the three alignment microscopes AM1 and AM2 can observe or detect the marks Ks1 and Ks3 formed on both sides of the width direction of the substrate P at any time. In addition, the three alignment microscopes AM1 and AM2 in the center of the Y-direction of the rotating reel DR among the three alignment microscopes AM1 and AM2 can observe or detect the blank parts formed between the exposure areas A7 drawn on the substrate P at any time, etc. The mark Ks2.

Here, the exposure device EX uses the so-called multi-beam type drawing device 11, so in order to draw the plural patterns drawn on the substrate P with the drawing lines LL1 to LL5 of the plural drawing modules UW1 to UW5 in the Y direction. Proper bonding is necessary to keep the bonding accuracy of the multiple drawing modules UW1 to UW5 within the allowable range. In addition, the relative arrangement relationship (or the amount of error relative to the design arrangement interval) of the observation areas Vw1 to Vw6 of the respective drawing lines LL1 to LL5 of the alignment microscopes AM1 and AM2 to the plurality of drawing modules UW1 to UW5 is called The reference line, the relative configuration relationship or the amount of error must be accurately calculated by the reference line management. In order to perform this baseline management, calibration is also necessary.

In the calibration for confirming the bonding accuracy of a plurality of drawing modules UW1～UW5, and the calibration for the reference line management of the alignment microscopes AM1 and AM2, at least one of the outer peripheral surfaces of the rotating reel DR of the support substrate P must be set Set fiducial marks or fiducial patterns on the part. Therefore, as shown in FIG. 9, in the exposure apparatus EX, the rotating reel DR provided with the reference mark or the reference pattern on the outer peripheral surface is used.

The rotating reel DR is formed with scale parts GPa and GPb which constitute a part of the rotation position detection mechanism 14 described later, on both ends of the outer peripheral surface thereof. In addition, the rotating reel DR has narrow restriction bands CLa and CLb formed by concave grooves or convex edges on the inside of the scale parts GPa and GPb. The Y-direction width of the substrate P is set to be smaller than the Y-direction interval of the two restriction belts CLa and CLb. The substrate P is closely attached to the outer peripheral surface of the rotating drum DR to restrict the inner region sandwiched by the belts CLa and CLb. Be supported.

The rotating reel DR is provided with a plurality of line patterns RL1 inclined at +45 degrees with respect to the rotation center line AX2 on the outer peripheral surface sandwiched by the restriction bands CLa and CLb Each line pattern RL2 is a grid-like reference pattern (which can also be used as a reference mark) RMP repeatedly engraved with a certain pitch (period) Pf1 and Pf2.

The reference pattern RMP is an oblique pattern (oblique grid pattern) that is uniform across the entire surface in order to avoid changes in friction or tension of the substrate P at the contact portion between the substrate P and the outer peripheral surface of the rotating reel DR. In addition, the line patterns RL1 and RL2 do not necessarily have to be inclined at 45 degrees, and the line pattern RL1 may be made parallel to the Y axis, and the line pattern RL2 may be made into a vertical and horizontal grid pattern parallel to the X axis. Moreover, it is not necessary to make the line patterns RL1 and RL2 cross at 90 degrees, and the rectangular area enclosed by the two adjacent line patterns RL1 and the adjacent two line patterns RL2 can be made into a square (or rectangle). The angle of the rhombus other than) crosses the line patterns RL1 and RL2.

Next, the rotation position detection mechanism 14 will be described with reference to FIGS. 3, 4, and 8. As shown in FIG. 8, the rotation position detection mechanism 14 optically detects the rotation position of the rotating reel DR, and can be applied to an encoder system using, for example, a rotary encoder. The rotation position detection mechanism 14 has scale parts (indicators) GPa and GPb provided at both ends of the rotating drum DR, and a plurality of encoder reading heads (read heads) EN1, which are opposed to each of the scale parts GPa and GPb. EN2, EN3, EN4. In Figures 4 and 8, although only the four encoder heads EN1, EN2, EN3, and EN4 facing the scale part GPa are shown, the scale part GPB also has the same oppositely arranged encoder heads EN1. EN2, EN3, EN4 (refer to Figure 10).

The scale parts GPa and GPb are respectively formed in a ring shape in the circumferential direction of the outer peripheral surface of the rotating drum DR. The scales of the scale parts GPa and GPb are diffracted grids in which concave or convex grid lines are engraved at a certain pitch (for example, 20 μm) in the circumferential direction of the outer peripheral surface of the rotating drum DR, forming an incremental scale. Therefore, the scale parts GPa and GPb rotate integrally with the rotating drum DR around the rotation center line AX2.

The substrate P is located inside the scale parts GPa and GPb avoiding both ends of the rotating drum DR, that is, it is wound inside the restriction belts CLa and CLb. If a strict arrangement relationship is required, set the outer peripheral surface of the scale parts GPa and GPb to be the same surface as the outer peripheral surface of the substrate P wound on the rotating reel DR (the same radius from the center line AX2). In order to achieve this, the outer peripheral surface of the scale parts GPa and GPb and the outer peripheral surface for substrate winding of the rotating reel DR can be made to have the thickness of the substrate P higher in the radial direction. Therefore, the outer peripheral surfaces of the scale portions GPa and GPb formed on the rotating reel DR can be set to have substantially the same radius as the outer peripheral surface of the substrate P. Therefore, the encoder read heads EN1, EN2, EN3, and EN4 can detect the scale parts GPa and GPb in the same radial direction as the drawing surface of the substrate P wound on the rotating reel DR, reducing the measurement position and processing position due to rotation Abbe error caused by the difference of the diameter direction of the system.

The encoder reading heads EN1, EN2, EN3, EN4, viewed from the rotation center line AX2, are respectively arranged around the scale parts GPa and GPb, at different positions in the circumferential direction of the rotating drum DR. The encoder reading heads EN1, EN2, EN3, and EN4 are connected to the control device 16. Encoder reading heads EN1, EN2, EN3, EN4 project measuring beams toward the scale GPa and GPb, and perform photoelectric detection of the reflected beam (diffracted light) to detect changes in the circumferential position of the corresponding scale GPa and GPb The signal (for example, a 2-phase signal with a phase difference of 90 degrees) is output to the control device 16. The control device 16 interpolates the detection signals (2-phase signals) from the encoder reading heads EN1～EN4 with a counter circuit not shown for digital processing, that is, it can measure the rotating roll with sub-micron resolution. The angular change of the drum DR, that is, the circumferential position change of the outer peripheral surface of the rotating drum DR measured at the respective setting positions of the encoder reading heads EN1 to EN4. At this time, the control device 16 may also measure the transport speed of the substrate P on the rotating drum DR or the amount of movement in the circumferential direction from the angle change of the rotating drum DR.

In addition, as shown in FIGS. 4 and 8, the encoder read head EN1 is arranged on the set azimuth line Le1. The azimuth line Le1 is set in the XZ plane to connect the projection area (reading position) of the measuring beam of the encoder read head EN1 to the scale part GPa (GPb) and the rotation center line AX2. Also, as described above, the azimuth line Le1 is set to be in the XZ plane, and the line connecting the drawing lines LL1, LL3, LL5 and the rotation center line AX2. It can be seen from the above that the line connecting the reading position of the encoder head EN1 and the rotation center line AX2 and the line connecting the drawing lines LL1, LL3, LL5 and the rotation center line AX2 are the same azimuth line.

Similarly, as shown in Fig. 4 and Fig. 8, the encoder read head EN2 is arranged on the setting azimuth line Le2. The azimuth line Le2 is set in the XZ plane to connect the projection area of the measuring beam of the encoder read head EN2 to the scale part GPa (GPb) and the rotation center line AX2. In addition, as described above, the azimuth line Le2 is set to be in the XZ plane, and the line connecting the drawing lines LL2, LL4 and the rotation center line AX2. It can be seen from the above that the line connecting the reading position of the encoder head EN2 and the rotation center line AX2 is the same azimuth line as the line connecting the drawing lines LL2, LL4 and the rotation center line AX2.

In addition, as shown in Figs. 4 and 8, the encoder read head EN3 is arranged on the set azimuth line Le3. The azimuth line Le3 is set in the XZ plane to connect the projection area of the measuring beam of the encoder read head EN3 to the scale part GPa (GPb) and the line of the rotation center line AX2. In addition, as described above, the azimuth line Le3 is set in the XZ plane to connect the alignment microscope AM1 to the observation area Vw1 to Vw3 of the substrate P and the rotation center line AX2. It can be seen from the above that the line connecting the reading position of the encoder head EN3 and the rotation center line AX2, and the line connecting the observation area Vw1 to Vw3 of the alignment microscope AM1 and the rotation center line AX2 are the same azimuth line.

Similarly, as shown in Fig. 4 and Fig. 8, the encoder read head EN4 is arranged on the set azimuth line Le4. The azimuth line Le4 is set in the XZ plane to connect the projection area of the measuring beam of the encoder read head EN4 to the scale part GPa (GPb) and the rotation center line AX2. In addition, as described above, the azimuth line Le4 is set in the XZ plane, and connects the alignment microscope AM2 to the observation area Vw4 to Vw6 of the substrate P and the rotation center line AX2. It can be seen from the above that the line connecting the reading position of the encoder head EN4 and the rotation center line AX2, and the line connecting the observation area Vw4 to Vw6 of the alignment microscope AM2 and the rotation center line AX2 are the same azimuth line.

When the setting orientation of the encoder reading head EN1, EN2, EN3, EN4 (the angle direction in the XZ plane centered on the rotation center line AX2) is represented by the setting orientation line Le1, Le2, Le3, Le4, as shown in the figure As shown in 4, a plurality of drawing modules UW1 to UW5 and encoder reading heads EN1 and EN2 are arranged so that the azimuth lines Le1 and Le2 are set at an angle of ±θ° relative to the center plane p3.

Here, the control device 16 detects the rotation angle position of the scale part (rotating reel DR) GPa, GPb with the encoder read heads EN1 and EN2, and specifies the moving position of the substrate P based on the detected rotation angle position. Perform drawing control of odd-numbered and even-numbered drawing modules UW1～UW5. That is to say, the control device 16 performs ON/OFF modulation of the light deflector 81 according to the CAD information of the pattern to be drawn on the substrate P during the scanning direction of the drawing light beam LB projected on the substrate P, but also The timing of the ON/OFF modulation using the light deflector 81 can be performed according to the detected rotation angle position (movement position of the substrate P), so that the pattern can be drawn on the light sensing layer of the substrate P with good accuracy.

In addition, the control device 16 can detect the alignment marks Ks1～Ks3 on the substrate P by storing the alignment microscopes AM1 and AM2, and use the encoder reading heads EN3 and EN4 to detect the scale parts GPa, GPb (rotating reel DR). ), the corresponding relationship between the positions of the alignment marks Ks1～Ks3 on the substrate P and the rotation angle position of the rotating reel DR can be obtained. Similarly, the control device 16 stores the alignment microscopes AM1 and AM2 to detect the reference pattern RMP on the rotating reel DR with the encoder reading heads EN3 and EN4 to detect the scale part GPa, GPb (rotating reel DR) By rotating the angle position, the corresponding relationship between the position of the reference pattern RMP on the rotating reel DR and the rotating angle position of the rotating reel DR can be obtained. As mentioned above, aligning the microscopes AM1 and AM2 can accurately measure the rotation angle position (or circumferential position) of the rotating reel DR at the moment when the mark is sampled in the observation area Vw1～Vw6. The exposure device EX, based on the measurement result, performs the alignment (alignment) of the substrate P and the predetermined pattern drawn on the substrate P, or the calibration of the rotating reel DR and the drawing device 11.

In addition, the multi-beam type exposure device EX is a point light that scans the drawing beam LB along a plurality of drawing lines LL1 to LL5 on the substrate P while conveying the substrate P in the conveying direction (longitudinal direction) by the rotating reel DR. . Here, although the substrate P is wound around a part of the outer peripheral surface of the rotating reel DR to be transported, it may be affected by vibration caused by the rotation of the rotating reel DR, which causes the rotating reel DR to interact with the second optical table 25 The configuration relationship is displaced relative to the ground. As the displacement of the arrangement relationship between the rotating reel DR and the second optical table 25, for example, there is a case where the rotating reel DR and the rotation center line AX2 are inclined with respect to the Y direction in the XY plane. In this case, due to the positional displacement of the rotating reel DR, the relative arrangement relationship between the substrate P wound on the rotating reel DR and the drawing device 11 provided on the second optical table 25 changes from a predetermined exposure suitable for exposure The relative arrangement relationship (initial setting state) displacement. Therefore, in the exposure apparatus EX of the first embodiment, in order to measure the relative arrangement relationship between the rotating reel DR and the drawing device 11, the encoder heads EN1 to EN4 are installed as shown in FIG. 10.

Fig. 10 is a top view showing the configuration of the encoder read head of the exposure device of Fig. 1; As shown in FIG. 10, the encoder heads (first detection devices) EN1 and EN2 are mounted on the second optical table 25 through the mounting member 100. On the other hand, the encoder heads (second detection devices) EN3 and EN4 are mounted on the main body frame 21 through the mounting member 101, and the alignment microscopes AM1 and AM2 are also mounted on the main body frame 21. Encoder reading heads EN1 and EN2 are provided with a pair corresponding to a pair of scale parts GPa and GPb provided on both sides of the rotation center line AX2 of the rotating drum DR. Therefore, a pair of encoder heads EN1 and EN2 detect the respective rotational positions of the scale parts GPa and GPb.

In addition, a rotation amount measuring device 105 for measuring the rotation amount of the rotation mechanism 24 is provided between the first optical table 23 and the second optical table 25. The rotation amount measuring device 105 uses, for example, a linear encoder, and is arranged on the far side from the rotation axis I so that the direction of linear motion is along the circumferential direction of the rotation axis I. The control device 16 detects the amount of rotation of the second optical table 25 relative to the first optical table 23 based on the slight amount of movement in the circumferential direction of the rotation axis I detected by the rotation amount measuring device 105. In addition, the rotation mechanism 24 includes a driving unit 106, and the driving unit 106 is driven and controlled by the control device 16 to rotate the second optical table 25. At this time, the control device 16 performs drive control of the drive unit 106 to rotate the second optical table 25 so that the rotation amount detected by the rotation amount measuring device 105 becomes a predetermined rotation amount.

FIG. 11 is a plan view illustrating a situation in which the rotating reel DR and the drawing device 11 (especially the second optical table 25) relatively slightly rotate in the XY plane in the configuration of FIG. 10. As shown in FIG. 11, the rotation center line AX2 of the rotating reel DR extends in the Y direction. When the rotation center line AX2 is correctly parallel to the Y axis of the stationary coordinate system XYZ, the rotation center line AX2 is located at the reference position. _{Here, in the XY plane, the rotation center line AX2 is inclined by a predetermined angle θ z} from the reference position due to the influence of ground vibration or vibration from a driving source in the device. In addition, in Fig. 11, the displacement of the left rotation is set to +θ _z , and the displacement of the right rotation is set to -θ _z . In the XY plane, if the rotation center line AX2 is inclined by a predetermined angle from the reference position, the rotating drum DR will move in a predetermined direction (for example, the -X direction in Fig. 11) at one end of the axis direction. On the other hand, the rotating drum The other end of the drum DR in the axial direction will move in a direction opposite to one end of the rotating drum DR (for example, the +X direction in Fig. 11).

Therefore, a pair of encoder heads EN1 and EN2 are inclined by a predetermined angle θ _z from the reference position by the rotation center line AX2, and will be at the rotational position detected by the encoder heads EN1 and EN2 on the GPa side of the scale part ( The movement position of the scale part GPa) and the rotation position (movement position of the scale part GPb) detected by the encoder read heads EN1 and EN2 on the side of the scale part GPb have a difference corresponding to the _{angle θ z. Therefore, the control device 16 can detect the inclination angle θ z} of the rotation center line AX2 of the rotating reel DR in the XY plane based on the rotation position detected by the pair of encoder read heads EN1 and EN2. Specifically, when the count value (movement position of the scale GPa) counted by the counting circuit corresponding to the encoder head EN1 on the scale part GPa side is set to CD1a, it will be compared with the encoder head EN1 on the scale part GPb side. When the count value of the corresponding counting circuit (the moving position of the ruler GPb) is set to CD1b, the difference between the count value CD1a and the count value CD1b is set every time the rotating reel DR (scale part GPa, GPb) rotates a certain angle or every time It is calculated one by one at a certain time, and the change of the difference value is monitored, so that the tilt change (angle θ _z ) of the rotation center line AX2 of the rotating drum DR in the XY plane can be measured. The same applies to a pair of encoder head EN2. As long as the count value (movement position of the ruler GPa) counted by the counting circuit corresponding to the encoder head EN2 on the GPa side of the scale part is set to CD2a, it will be compared with the scale part. The count value (movement position of the ruler GPb) of the counter circuit count corresponding to the encoder read head EN2 on the GPb side is set to CD2b, and the change of the difference value is monitored.

In addition, when measuring the tilt change (angle θ _z ), the pair of encoder read heads EN1 and the pair of encoder read heads EN2 are symmetrically arranged in the X direction across the center plane p3 as shown in the previous figure 4 Therefore, it is also possible to monitor the change of the count value CD1a of the encoder read head EN1 opposite to the scale part GPa and the count value CD2b of the encoder read head EN2 opposite to the scale part GPb, or the change of the difference value with the scale part GPa The difference between the counter value CD2a of the opposite encoder head EN2 and the counter value CD1b of the encoder head EN1 opposite to the scale part GPb.

Here, the control device 16 corrects the position of the drawing device 11 relative to the substrate P based on the detection results of the alignment microscopes AM1 and AM2 in order to appropriately draw the substrate P conveyed by the rotating reel DR by the drawing device 11 . In other words, the control device 16 detects the shape of the substrate P or the deformation of the element pattern (base pattern) area formed on the substrate P based on the positions of the marks Ks1 to Ks3 detected by the alignment microscopes AM1 and AM2. _{Calculate the relative correction rotation amount θ 2} corresponding to the detected deformation state (especially tilt, etc.). In addition, the correction rotation amount θ ₂ is the angle from the reference line extending in the X direction. In addition, in Fig. 11, the displacement of the left rotation is set to +θ ₂ , and the displacement of the right rotation is set to -θ ₂ . Next, the control device 16, according to the obtained rotation amount of the correction drive control unit 24 of the rotary mechanism 106 θ _2, thereby correcting relative positional relationship between the second optical bench 25 of the rotary drum DR.

At this time, the control means 16, the correction according to the relative rotation amount of the obtained ₂ θ rotation mechanism 24 (the second optical table 25) from an initial position after the rotation correction, since the encoder head EN1, EN2 will rotate, _{The inclination θ z} of the rotation center line AX2 measured after the rotation correction cannot be considered, that is, it becomes meaningless. _{Therefore, the control device 16 considers the inclination θ z} of the rotation center line AX2 measured in advance (or immediately before), and rotates the rotation mechanism 24 according to the corrected rotation amount θ _2.

Specifically, the control device 16 makes the relative correction rotation amount θ ₂ measured based on the detection results of the alignment microscopes AM1 and AM2 become zero, that is, "θ _2- θ _z (=0°)" becomes zero. In this way, the rotation mechanism 24 is rotated while measuring the rotation amount of the rotation mechanism 24 by the rotation amount measuring device 105.

In this way, the control device 16 obtains the offset information from the predetermined relative arrangement relationship between the rotating reel DR and the second optical table 25 based on the detection results of the pair of encoder read heads EN1 and EN2, that is, in the XY plane The inclination of the rotation center line AX2 (the inclination of the rotating reel DR in the XY plane) θ _{z is the corrected rotation amount θ 2} corresponding to the inclination of the substrate P in the XY plane obtained by the alignment microscopes AM1 and AM2 The drive unit 106 of the rotation mechanism 24 is controlled in a way to reduce the deviation _{of the inclination θ z} from the rotation center line AX2, that is, to maintain a predetermined relative arrangement relationship.

Next, the adjustment method of the exposure apparatus EX will be described with reference to FIG. 12. Fig. 12 is a flowchart related to the adjustment method of the exposure apparatus of the first embodiment. When the control device 16 corrects the arrangement relationship between the rotating reel DR and the second optical table 25 by the rotation mechanism 24 in order to properly draw the substrate P by the drawing device 11, it first obtains the results detected by the alignment microscopes AM1 and AM2. The detection result (the inclination of the element pattern area on the substrate P, etc.) (step S1). _{The control device 16 obtains the correction rotation amount θ 2} to be adjusted by the rotation mechanism 24 based on the detection result detected by the alignment microscopes AM1 and AM2 (step S2). _{Thereafter, the control device 16 obtains information related to the tilt θ z from} the comparison of the detection results of the pair of encoder read heads EN1 and EN2 (step S3). _{The control device 16 obtains the inclination θ z of} the rotation center line AX2 based on the respective rotation angle positions (count values CD1a, CD1b, CD2a, CD2b) of the scale parts GPa and GPb detected by the pair of encoder heads EN1 and EN2 (Step S4). Next, the control device 16 performs feedback control on the rotation mechanism 24, etc., in such a way that the deviation of the obtained correction rotation amount θ ₂ and the inclination θ _z of the rotation center line AX2, that is, "θ _2- θ _{z "becomes zero.} Rotate it (step S5). In addition, after this step S5, the control device 16 is again based on the respective rotation angle positions (count values CD1a, CD1b, CD2a, CD2b) of the scale parts GPa and GPb detected by a pair of encoder read heads EN1 and EN2, at appropriate time intervals to obtain the rotation of the center line AX2 of the new inclination θ _'z. Next, when the apparatus due to vibration or the like so that the new tilt θ 'when _z changes, the new system to maintain the inclination θ' _z embodiment of the rotating mechanism 24 performs feedback control.

In the first embodiment above, since the encoder heads EN1 and EN2 are mounted on the second optical table 25, the exposure device EX can calculate the rotation in the XY plane based on the detection results of the encoder heads EN1 and EN2 _{The offset information (the inclination θ z of the} rotation center line AX2) of the reel DR and the second optical table 25 from the predetermined relative arrangement relationship. Then, the exposure device EX can correct the relative arrangement relationship between the rotating reel DR and the second optical table 25 based on the obtained offset information. Therefore, even if the position of the rotating drum DR is displaced due to the vibration caused by the rotation of the rotating drum DR, the exposure device EX can maintain the predetermined relative arrangement relationship between the rotating drum DR and the second optical table 25. Therefore, the drawing by the drawing device 11 can be performed on the substrate P with good accuracy.

Furthermore, in the first embodiment, the encoder heads EN1 and EN2 can be provided on the installation direction lines Le1 and Le2. Therefore, the direction connecting the encoder head EN1 and the rotation center line AX2 and the direction connecting the odd-numbered drawing lines LL1, LL3, LL5 and the rotation center line AX2 can be made the same direction. Similarly, the direction connecting the encoder head EN2 and the rotation center line AX2 and the direction connecting the even-numbered drawing lines LL2, LL4 and the rotation center line AX2 can be made the same direction. Therefore, the arrangement relationship between the encoder heads EN1 and EN2 and the drawing lines LL1 to LL5 can be matched. Therefore, even if the position of the rotating reel DR is displaced, the encoder read heads EN1 and EN2 can be used to measure the arrangement relationship of the drawing lines LL1 to LL5 relative to the rotating reel DR with good accuracy. The measurement of the impact.

In addition, in the first embodiment, the encoder heads EN3 and EN4 can be attached to the main body frame 21. Therefore, the exposure device EX can measure the marks Ks1 to Ks3 by the alignment microscopes AM1 and AM2 based on the detection results of the encoder heads EN3 and EN4, using the body frame 21 (bearing part of the rotating reel DR) as a static reference. . _{Next, the exposure apparatus EX can obtain the relative correction rotation amount θ 2} to be corrected by the rotation mechanism 24 based on the detection results of the alignment microscopes AM1 and AM2. Therefore, the exposure apparatus EX can precisely correct the arrangement of the rotating reel DR and the second optical table 25 based on the deviation between _{the obtained correction rotation amount θ 2 and the inclination θ z} of the rotation center line AX2 as offset information relation.

Furthermore, in the first embodiment, the encoder heads EN3 and EN4 can be provided on the installation orientation lines Le3 and Le4. Therefore, the direction connecting the encoder head EN3 and the rotation center line AX2 and the direction connecting the observation areas Vw1 to Vw3 and the rotation center line AX2 can be made the same direction. In addition, the direction connecting the encoder head EN4 and the rotation center line AX2 and the direction connecting the observation areas Vw4 to Vw6 and the rotation center line AX2 can be made the same direction. Therefore, the arrangement relationship between the encoder heads EN3 and EN4 and the observation areas Vw1 to Vw6 can be aligned. Therefore, even if the position of the rotating reel DR is displaced, the encoder read heads EN3 and EN4 can be used to measure the arrangement relationship of the observation area Vw1 to Vw6 relative to the rotating reel DR with good accuracy. The measurement of the impact.

In addition, in the first embodiment, by rotating the second optical table 25 with respect to the first optical table 23 by the rotation mechanism 24, the arrangement relationship between the rotating reel DR and the second optical table 25 can be corrected. Therefore, the exposure device EX can correct the drawing lines LL1 to LL5 formed by the drawing device 11 provided on the second optical table 25 to an appropriate position with respect to the substrate P wound on the rotating reel DR, and therefore can correct with good accuracy The drawing of the substrate P by the drawing device 11 is performed.

Further, in the first embodiment, although in practice to obtain a correction of the rotation amount θ ₂ after the steps S1 and S2, for the implementation of the offset information obtaining step S3 and the step S4, the configuration is not limited thereto. Information may also be performed in parallel offset of the step S3 and the step for obtaining the correction for obtaining a rotation amount θ ₂ of Step S1 and Step S2 and for obtaining offset information in step S3 and the step S4, the implementation may after S4, the implementation of step ₂ of S1 and S2 to obtain a correction amount of rotation θ.

[Second Embodiment] Next, the exposure apparatus EX of the second embodiment will be described with reference to FIG. 13. Fig. 13 is a perspective view showing the arrangement of the main parts of the exposure apparatus of the second embodiment. In addition, in the second embodiment, in order to avoid overlapping descriptions with the first embodiment, only the differences from the first embodiment will be described, and the same components as in the first embodiment are given the same symbols as those in the first embodiment. Be explained. In the exposure apparatus EX of the first embodiment, as the displacement of the arrangement relationship between the rotating reel DR and the second optical table 25, it is explained that the rotation center line AX2 of the rotating reel DR in the XY plane is relative to the X direction (reference position). ) Inclined situation. In the exposure apparatus EX of the second embodiment, as the displacement of the arrangement relationship between the rotating reel DR and the second optical table 25, the rotation center line AX2 of the rotating reel DR in the YZ plane is explained relative to the Y direction (reference position) Inclined situation.

As shown in FIG. 13, the three-point seat 22 functions as a connecting mechanism that connects the main body frame 21 with the first optical table 23 and the second optical table 25. Here, in the first embodiment, the main body frame 21 and the first optical table 23 connected through the three-point base 22 function as the first supporting member, and the second optical table 25 functions as the second supporting member to rotate The mechanism 24 functions as a linking mechanism. In the second embodiment, the main body frame 21 is made to function as the first supporting member, and the first optical table 23 and the second optical table 25 connected through the rotating mechanism 24 function as the second supporting member, so that the three-point seat 22 Give full play to the function of the linking organization.

The three-point seat 22 includes a driving part 110 with a motor or a piezoelectric element. The driving part 110 is driven and controlled by the control device 16 to independently adjust the length (height) in the Z direction of each support point 22a, thereby adjusting the relative The first optical platform 23 of the main body frame 21 is inclined. Here, the rotation center line AX2 extends in the Y direction, and the position of the rotation center line AX2 extending in the Y direction is taken as the reference position. In the YZ plane, the rotation center line AX2 as the reference position is inclined by a predetermined angle from the reference position due to the influence of vibration caused by the rotation. After the rotation center line AX2 is inclined by a predetermined angle from the reference position, the rotating drum DR will move in a predetermined direction (for example, the -Z direction in Figure 13) at one end of the axis, and the rotating drum DR will be at the other end of the axis. The part will move relative to the direction opposite to one end of the rotating drum DR (for example, the +Z direction in Fig. 13).

Therefore, when a pair of encoder heads EN1 and EN2 are installed on the side of the second optical table 25 (or the first optical table 23), the rotation center line AX2 is inclined by a predetermined angle in the YZ plane from the reference position, And it can be detected by the encoder heads EN1 and EN2 on the GPa side of the scale part (counting values CD1a, CD2a) and the encoder heads EN1 and EN2 on the GPb side of the scale part ( The count values CD1b, CD2b) have a difference. Therefore, the control device 16 can detect the inclination change of the rotation center line AX2 of the rotating reel DR in the YZ plane in the YZ plane based on the rotation angle positions detected by the pair of encoder read heads EN1 and EN2. However, the information of the rotation angle position detected by the encoders EN1 and EN2 on the GPa side of the scale section or the encoder read heads EN1 and EN2 on the side of the scale section GPb is shifted in the Z direction of the rotation center line AX2 (rotating reel DR) It has almost no sensitivity, and is a structure that has sensitivity to displacement in the X direction of the rotation center line AX2 (rotating reel DR) as in the first embodiment.

Therefore, in the second embodiment, one of the pair of encoder read heads EN3 and EN4 directions arranged in the setting positions of the alignment microscopes AM1 and AM2 shown in FIG. 4, FIG. 8, FIG. 10, and FIG. 11 is used. Measure the displacement of both ends of the rotation center line AX2 (rotating reel DR) in the Z direction. Therefore, as shown in Figures 10 and 11, the encoder read heads EN3 and EN4 mounted on the main body frame 21 can be mounted on the first optical table 23 or the second optical table 25, according to which they are opposed to the scale part GPa The position of the rotation angle detected by a pair of encoder read heads EN3 and EN4 (corresponding to the count value CD3a, CD4a of the counting circuit) and the rotation angle detected by a pair of encoder read heads EN3, EN4 opposite to the scale part GPb The position (corresponding to the count value CD3b and CD4b of the counting circuit) is used to detect the inclination of the rotation center line AX2 of the rotating reel DR in the YZ plane relative to the rotation center line AX2 of the reference position.

Next, the control device 16 obtains from the predetermined relative arrangement relationship between the rotating reel DR and the second optical table 25 based on the detection results of the pair of encoder heads EN3 and EN4 (counting values CD3a, CD3b, CD4a, and CD4b) The offset information is the inclination of the rotation center line AX2 in the YZ plane, and the driving part 110 of the three-point seat 22 is controlled by the method of reducing the inclination of the rotation center line AX2 obtained, that is, maintaining the predetermined relative arrangement relationship. , Correct the tilt of the entire second optical table 25.

As described above, in the second embodiment, by mounting the encoder read heads EN3, EN4 (or encoder read heads EN1, EN2) on the second optical table 25, according to the encoder read head EN3, EN4 (or encoder read head EN1, EN2) detection results (the difference of the rotation angle position), obtain the offset information (the displacement in the Z direction and the displacement in the YZ Tilt within the plane). Then, the exposure device EX can correct the relative arrangement relationship between the rotating reel DR and the second optical table 25 based on the obtained offset information. Therefore, the exposure apparatus EX can maintain the predetermined relative arrangement relationship between the rotating reel DR and the second optical table 25 even if the position of the rotating reel DR is displaced due to the influence of vibration, etc., so that the substrate P can be accurately applied to the substrate P. Make an exposure.

[Third Embodiment] Next, the exposure apparatus EX according to the third embodiment will be described with reference to FIG. 14. Fig. 14 is a perspective view showing the arrangement of the main parts of the exposure apparatus of the third embodiment. In addition, in the third embodiment, in the same manner, in order to avoid overlapping descriptions with the first and second embodiments, only the differences from the first and second embodiments will be described, and the same configuration as that of the first and second embodiments will be explained. The elements are described with the same reference numerals as in the first and second embodiments. In the exposure apparatus EX of the first and second embodiments, the position of the drawing apparatus 11 side (the second support member side) is displaced by the rotation mechanism 24 and the three-point base 22. In the exposure apparatus EX of the third embodiment, the X-moving mechanism 121 and the Z-moving mechanism 122 displace the positions of both ends of the rotating reel DR (rotation center axis AX2) in the X direction and the Z direction.

As shown in FIG. 14, the rotating reel DR is provided with shaft portions Sf2 on both sides in the axial direction, and each shaft portion Sf2 is rotatably supported by the main body frame 21 through a bearing 123. The bearings 123 on both sides are respectively provided with an X moving mechanism 121 and a Z moving mechanism 122 adjacent to each other. Each X moving mechanism 121 and each Z moving mechanism 122 can move the bearing 123 in the X direction and the Z direction (fine movement).

Here, in the third embodiment, the bearing 123 functions as a first support member, the device frame 13 functions as a second support member, and each X moving mechanism 121 and each Z moving mechanism 122 function as a connecting mechanism.

A pair of X moving mechanisms 121 on both sides can move a pair of bearings 123 on both sides in the X direction to fine-tune the inclination of the rotation center line AX2 of the rotating drum DR and the X direction position in the XY plane. Here, the rotation center line AX2 extends in the Y direction similarly to the first embodiment, and the position of the rotation center line AX2 extending in the Y direction is used as a reference position. In the XY plane, when the rotation center line AX2 as the reference position is tilted from the reference position by a predetermined angle due to the influence of vibrations, etc., the rotation reel DR can be corrected by adjusting the drive amount of the X moving mechanism 121 on either side. Tilt in the XY plane.

In addition, a pair of Z moving mechanisms 122 on both sides can respectively move a pair of bearings 123 on both sides in the Z direction to fine-tune the inclination of the rotation center line AX2 of the rotating drum DR and the Z direction position in the YZ plane. Here, the rotation center line AX2 extends in the Y direction similarly to the second embodiment, and the position of the rotation center line AX2 extending in the Y direction is used as a reference position. In the YZ plane, when the rotation center line AX2 as the reference position is tilted by a predetermined angle from the reference position due to the influence of vibration, etc., it is possible to correct the rotation reel DR by adjusting the drive amount of the Z moving mechanism 122 on either side. Tilt in the YZ plane.

The pair of encoder heads EN1 and EN2 can measure the relative tilt error of the second optical table 25 and the rotating reel DR (rotation center line AX2) in the XY plane as described in the first embodiment. Also, in the third embodiment, similar to the second embodiment, when the encoder heads EN3, EN4 are mounted on the second optical table 25 (or the first optical table 23), a pair of encoder heads EN3, EN4 EN4 can measure the relative tilt error of the second optical table 25 and the rotating reel DR (rotation center line AX2) in the YZ plane as described in the second embodiment.

Therefore, the control device 16 obtains the predetermined relative arrangement relationship between the rotating reel DR and the second optical table 25 based on the detection results of the pair of encoder heads EN1 and EN2 (count values CD1a, CD1b, CD2a, CD2b) _{Offset information (the relative tilt θ Z} of the rotation center line AX2 in the XY plane). Furthermore, the control device 16 measures the inclination of the element pattern area on the substrate P based on the detection results of the alignment microscopes AM1 and AM2, and obtains the correction rotation amount θ _{2 of} the X moving mechanism 121. The control device 16 controls the driving amount of the X moving mechanisms 121 on both sides in such a way that the deviation between the calculated correction rotation amount θ ₂ and the inclination θ _{Z of the rotation center line AX2 is reduced, that is, a predetermined relative arrangement relationship is maintained.} Similarly, the control device 16 is based on the respective detection results of a pair of encoder reading heads EN3 and EN4 (counting values CD3a, CD3b, CD4a, CD4b), from the predetermined relative arrangement relationship between the rotating reel DR and the second optical table 25 , Obtain the offset information, that is, the inclination of the rotation center line AX2 in the YZ plane (set as θ _{X ), and reduce the obtained inclination θ X} of the rotation center line AX2, that is, maintain the predetermined relative arrangement It controls the driving amount of the Z moving mechanism 122 on both sides.

In the third embodiment above, the rotating reel DR can be rotated about an axis parallel to the Z axis by the X moving mechanism 121 in the XY plane with respect to the main body frame 21, and the Z moving mechanism 122 can be used to rotate the reel in the YZ plane. The drum DR rotates around an axis parallel to the X-axis relative to the main body frame 21, and the relative arrangement relationship between the rotating drum DR and the second optical table 25 is adjusted. Therefore, the exposure device EX can correct the drawing lines LL1 to LL5 formed by the drawing device 11 provided on the second optical table 25 to an appropriate position with respect to the substrate P wound on the rotating reel DR, and the substrate P Exposure of component patterns with good precision.

[Fourth Embodiment] Next, the exposure apparatus EX according to the fourth embodiment will be described with reference to FIG. 15. Fig. 15 is a diagram showing the configuration of the rotating reel and the drawing device of the exposure apparatus of the fourth embodiment. In addition, in the fourth embodiment, in the same manner, in order to avoid overlapping descriptions with the first to third embodiments, only the differences from the first to third embodiments will be described, and the same configuration as that of the first to third embodiments will be explained. The elements are described with the same reference numerals as in the first to third embodiments. The exposure apparatus EX of the third embodiment displaces the position of the rotating reel DR by the X moving mechanism 121 and the Z moving mechanism 122 that move the bearing 123. In the exposure apparatus EX of the fourth embodiment, the position of the rotating reel DR is displaced by the reel support frame 130 that is separate and independent from the apparatus frame 13.

As shown in FIG. 15, the reel support frame 130 has a reel rotation mechanism 131 and a reel support member 132 in this order from the lower side in the Z direction. The reel rotation mechanism 131 is installed on the installation surface E through the anti-vibration unit SU3. The reel supporting member 132 is arranged on the reel rotating mechanism 131, and supports the shaft of the rotating reel DR so as to be rotatably supported on both sides. The reel rotation mechanism 131 rotates the reel support member 132 in the XY plane with the rotation axis Ia parallel to the Z axis (intersecting the rotation center axis AX2) to adjust the rotation center line AX2 of the rotation reel DR at Tilt in the XY plane.

In addition, since the rotating reel DR is provided in the reel support frame 130 that is separate and independent from the device frame 13, this embodiment can omit the three-point holder 22 and the first optical table in the first to third embodiments. 23 and the rotating mechanism 24, only the second optical table 25 and the drawing device 11 supported by the second optical table 25 are provided on the main body frame 21. Here, in the fourth embodiment, the reel support frame 130 functions as a first support member, the device frame 13 functions as a second support member, and the reel rotation mechanism 131 functions as a connecting mechanism.

Here, the control device 16 is based on the detection results (counting values CD1a, CD1b, CD2a, CD2b) of the encoder read heads EN1 and EN2 installed on one of the second optical table 25, and detects that it extends in the Y direction relative to _{The rotation center line AX2 of the reference position, the relative tilt θ Z} between the rotating reel DR (rotation center line AX2) and the second optical table 25 in the XY plane. Furthermore, the control device 16 measures the inclination of the device pattern area on the substrate P based on the detection results of the alignment microscopes AM1 and AM2, and obtains the corrected rotation amount θ _{2 of} the reel rotation mechanism 131. The control device 16 controls the reel rotation mechanism 131 in such a way that the deviation between the calculated correction rotation amount θ ₂ and the inclination θ _{Z of the rotation center line AX2 is reduced, that is, a predetermined relative arrangement relationship is maintained.} In addition, although the pair of encoder heads EN3 and EN4 arranged in the same direction as the installation orientation of the alignment microscopes AM1 and AM2 are mounted on the second optical table 25, they may also be mounted on the reel support member 132 side.

As described above, in the fourth embodiment, since the reel support frame 130 can be rotated by the reel rotation mechanism 131 to rotate the reel DR relative to the second optical table 25, the reel DR and the second optical table can be corrected. The relative configuration relationship of the platform 25. Therefore, the exposure device EX can adjust the substrate P wound on the rotating reel DR to an appropriate position with respect to the drawing lines LL1 to LL5 formed by the drawing device 11 provided on the second optical table 25, and the substrate P can be Exposure of component patterns with good precision.

[Fifth Embodiment] Next, the exposure apparatus EX according to the fifth embodiment will be described with reference to FIG. 16. Fig. 16 is a plan view showing the arrangement of the encoder head of the exposure apparatus of the fifth embodiment. In addition, in the fifth embodiment, in the same way, in order to avoid overlapping descriptions with the first to fourth embodiments, only the differences from the first to fourth embodiments will be described, and the same configuration as that of the first to fourth embodiments will be explained. The elements are described with the same reference numerals as in the first to fourth embodiments. The exposure apparatus EX of the first embodiment uses a pair of encoder heads EN1 and EN2 to detect the tilt of the rotating reel DR. In the fifth embodiment, a pair of encoder read heads EN1, EN2 and a pair of encoder read heads EN5, EN6 detect the tilt of the rotating reel DR.

As shown in FIG. 16, the pair of encoder heads EN1 and EN2 are mounted on the second optical table 25 through the mounting member 100. In addition, a pair of encoder heads EN5 and EN6 are mounted to the main body frame 21 through the mounting member 141. Here, each encoder read head EN1 and each encoder read head EN5 are arranged adjacent to each other with a certain gap in the Y direction. In addition, the Y-direction widths of the scale parts GPa and GPb are set to be wider in such a way that each of the two encoder read head EN1 and the encoder read head EN5 adjacent in the Y direction can detect the scale parts GPa and GPb .

Here, since the rotating reel DR is installed on the main body frame 21, the control device 16 is based on the rotation angle position detected by each of a pair of encoder reading heads EN5 and EN6 (corresponding to the count value CD5a, CD5b of the counting circuit) _{, CD6a, CD6b), detect the tilt θ ZR} of the rotation center line AX2 of the rotating reel DR in the XY plane, and use the detected tilt θ _ZR as the reference position. That is, the count value CD5a of the encoder head EN5 facing the scale part GPa on one side of the rotation center axis AX2 and the encoder head facing the scale part GPb on the other side of the rotation center axis AX2 The change of the differential value of the count value CD5b of EN5, or the encoder read head facing the scale part GPa, the count value CD6a of EN6 and the encoder read head facing the scale part GPb on the other side of the rotation center axis AX2 The change of the difference value of the count value of EN6 and CD56 can measure the change of the inclination θ _ZR of the rotating reel DR in the XY plane with the main body frame 21 as a reference.

In addition, the control device 16, as in the first embodiment, obtains the rotating reel DR based on the rotation angle positions (count values CD1a, CD1b, CD2a, and CD2b) detected by the pair of encoder read heads EN1 and EN2. _{The relative tilt θ Z} with the second optical table 25 in the XY plane. _{Therefore, it is based on the inclination θ ZR} measured based on the rotation angle position detected by each of the pair of encoder read heads EN5 and EN6, and the measurement based on the rotation angle position detected by the pair of encoder read heads EN1 and EN2. By tilting θ _Z , the second optical table 25 is rotated by the rotating mechanism 24, so that the second optical table 25 and the drawing device 11 supported by the second optical table 25 can be set to have no rotation error relative to the main body frame 21 (stationary reference). However, similarly to the first embodiment, when corresponding to the tilt error of the device pattern area formed on the substrate P, the relative tilt with the device pattern area measured by the inspection results of the alignment microscopes AM1 and AM2 is added. θ ₂ corresponds to the correction amount to drive the rotating mechanism 24.

As described above, the fifth embodiment can detect the inclination θ of the rotation center line AX2 of the rotating reel DR with the main body frame 21 as a reference in the XY plane based on the rotation position detected by the pair of encoder heads EN5 and EN6 _ZR . Therefore, the control device 16 can measure the reference position of the rotation center line AX2 of the rotating reel DR, and thereby can measure the predetermined relative arrangement relationship between the rotating reel DR and the second optical table 25 with good accuracy. In particular, when performing the first exposure of the pattern for the first layer of the element pattern area drawn on the substrate P, even if the rotating reel DR is tilted in the XY plane with respect to the main body frame 21 as a static reference, it can be corrected. The pattern of the first exposure is tilted on the substrate P and transferred.

[Sixth Embodiment] Next, the exposure apparatus EX according to the sixth embodiment will be described with reference to FIG. 17. Fig. 17 is a plan view showing the arrangement of the scale disc of the exposure apparatus of the sixth embodiment. In addition, in the sixth embodiment, in the same manner, in order to avoid overlapping descriptions with the first to fifth embodiments, only the differences from the first to fifth embodiments will be described, and the same configuration as that of the first to fifth embodiments will be explained. The elements are described with the same reference numerals as in the first to fifth embodiments. The exposure apparatus EX according to the first to fifth embodiments uses scale parts GPa and GPb formed on the outer peripheral surface of the rotating drum DR to detect the rotation position of the rotating drum DR. The exposure apparatus EX of the sixth embodiment uses a high-circularity scale disc SD mounted on the rotating reel DR to detect the rotation position of the rotating reel DR.

As shown in FIG. 17, the scale disc SD has scale parts GPa and GPb engraved on the outer peripheral surface, and is fixed at the end of the rotating drum DR so as to be orthogonal to the rotation center line AX2. Therefore, the scale disk SD rotates integrally with the rotating drum DR around the rotation center line AX2. In addition, the scale disc SD is made of low thermal expansion metal, glass, ceramics, etc. as the base material. In order to improve the measurement decomposition ability, the diameter is as large as possible (for example, the diameter is more than 20cm). In Fig. 17, although the diameter of the outer circumference of the scale disc SD is shown to be smaller than the diameter of the outer circumference of the photosensitive drum DR, the diameter of the scale part GP of the scale disc SD can be set and wound on the rotating The diameter of the outer peripheral surface of the substrate P of the reel DR is the same (approximately the same), which can further reduce the so-called measurement Abbe error.

As described above, in the sixth embodiment, since different individual scale discs SD can be mounted on the rotating reel DR, the scale disc SD suitable for the rotating reel DR can be selected. In addition, as the scale disc SD, it is possible to use a mechanism (pressing screw, etc.) capable of fine-tuning the roundness at plural positions in the circumferential direction, so the eccentricity error from the rotation center axis AX2 of the scale part GP can be further reduced. Or the measurement error (cumulative error) caused by the pitch error of the ruler (diffraction grid).

In addition, in the first to sixth embodiments, although the pattern is formed on the substrate P by using the drawing device 11 for scanning spot light, it is not limited to this configuration, as long as it is a device for forming the pattern on the substrate P. For example, It can be a projection exposure system in which a flat or cylindrical photomask of a transmission type or a reflection type is used to project and expose the projection light beam from the photomask to the substrate P to form a pattern on the substrate P. Furthermore, it is also possible to replace the mask by arranging a large number of tiltable micromirrors into a matrix of digital micromirror devices (DMD), and project the light distribution corresponding to the pattern to be drawn on the non-mask of the substrate P Method of exposure device. In addition, as an apparatus for forming a pattern on the substrate P, for example, a drawing apparatus of an inkjet method that uses an ejection head that ejects droplets of ink or the like to form a pattern on the substrate P may be used. In the case of such a maskless exposure machine or inkjet drawing device, for example, as disclosed in Japanese Patent Application Publication No. 2010-091990, the light distribution corresponding to the pattern made by DMD can be projected onto the substrate P. A structure in which a plurality of exposure parts (pattern formation parts) are arranged in the width direction of the substrate P, or a composition in which a plurality of droplet application parts (pattern formation parts) equipped with ink nozzles of the inkjet method are arranged in the width direction of the substrate P , Adopt a configuration in which the entire plurality of exposure sections or the entire plurality of droplet application sections can be relatively rotated with respect to the substrate P in the XY plane.

In addition, in the first to sixth embodiments, the second optical table 25 that fixes the plurality of drawing modules UW1 to UW5 constituting the drawing device 11 is rotated in the XY plane by the rotating mechanism 24, but In order to adjust each of the drawing lines LL1 to LL5 in parallel in the XY plane or to have a predetermined tilt in the XY plane, it is also possible to install each of the drawing modules UW1 to UW5 on the second optical table 25 Actuators (second rotating mechanism, driving mechanism) that individually rotate slightly in the XY plane. In this case, an individual angle measuring sensor can be installed to measure the rotation angle position (tilt amount, etc.) of each drawing module UW1 ~ UW5 (pattern forming part) relative to the second optical table 25, which can be based on a pair of Two of the inclination of the second optical table 25 in the XY plane measured by the encoder read head EN1 or EN2 and the inclination of each of the drawing modules UW1 ~ UW5 measured by the individual angle measurement sensor (second detection device) Furthermore, the inclination of each of the drawing lines LL1 to LL5 on the substrate P is adjusted. Therefore, during the period when the rotating drum DR is rotated to transport the substrate P in the longitudinal direction (X direction) at a constant speed, even if the substrate P is slightly displaced in the Y direction on the rotating drum DR, the phenomenon of meandering occurs. Here, when the conveying direction of the substrate P is slightly tilted, the tilt can also be measured successively by the alignment microscope AM1 (or AM2) to detect the position of the alignment marks Ks1 to Ks3, so that the line LL1 can be drawn according to the tilt. ~LL5 is tilted to control the respective actuators (driving mechanism) of drawing modules UW1 ~ UW5. Thereby, even when a new pattern is superimposed on the base pattern (for example, the first layer pattern) for electronic components in the exposure area A7 formed on the substrate P, a snake-like situation occurs during the conveyance of the substrate P. The exposure area A7 on the substrate P maintains the lamination accuracy well across the board.

Furthermore , in the first to sixth embodiments, the second optical table 25 supporting the drawing device 11 and the main body frame 21 supporting the rotating reel DR are provided with a micro-frame facing each other in the XY plane (or in the YZ plane). Driving mechanisms such as rotating motors (rotating mechanism 24, driving part 110 of three-point base 22, X moving mechanism 121, Z moving mechanism 122). However, it may not be electric operation of a motor, but manual operation such as the replacement of adjusting screws, micro pressure gauges, washers of different thicknesses, etc., so that the spatial arrangement relationship between the drawing device 11 and the rotating drum DR is relatively relative to each other. The connection mechanism of the second optical table 25 and the main body frame 21 is connected by means of fine adjustment. The connection mechanism with such a manually operated adjustment part, for example, when the device is assembled or during maintenance and inspection, the second optical table 25 (first optical table 23) with the drawing device 11 is removed from the main body frame 21 and again When the three-point holder 22 is installed on the main body frame 21, etc., it is useful to fine-tune the position of each of the three-point holder 22 in the XYZ direction.

＜Component manufacturing method＞ Next, a method of manufacturing the element will be described with reference to FIG. 18. Fig. 18 is a flowchart showing the device manufacturing method of each embodiment.

In the device manufacturing method shown in FIG. 18, first, the function and performance design of a display panel formed using a self-luminous device such as organic EL is performed, and the required circuit patterns and wiring patterns are designed by CAD, etc. (step S201). And prepare a supply reel on which the flexible substrate P (resin film, metal foil film, plastic, etc.) as the base material of the display panel is wound (step S202). In addition, the roll-shaped substrate P prepared in this step S202 may be one whose surface has been modified as needed, or one that has been formed in advance (for example, micro-concavities and convexities through an imprint method), or one that has been pre-laminated with light. Inductive functional film or transparent film (insulating material).

Next, a base layer composed of electrodes or wiring, insulating film, TFT (thin film semiconductor), etc., which constitute the display panel elements, is formed on the substrate P, and a light-emitting element composed of self-luminous elements such as organic EL is formed by stacking on the base plate. Layer (display pixel portion) (step S203). In this step S203, it also includes the conventional lithography process of exposing the photoresist layer using the exposure device EX described in the previous embodiments, and the substrate P coated with a photosensitive silane coupling agent instead of the photoresist. An exposure process for pattern exposure to form a water-repellent pattern on the surface, a wet process for pattern exposure of a photosensitive catalyst layer to form metal film patterns (wiring, electrodes, etc.) by electroless plating, Or use conductive ink containing silver nano-particles to draw patterns in a printing process, etc.

Next, cut the substrate P for each display panel element continuously manufactured on the long substrate P in a roll manner, or attach a protective film (environmental barrier layer) or color filter film on the surface of each display panel element, etc., Assemble components (step S204). Next, a step of checking whether the display panel element can operate normally or whether it meets the desired performance and characteristics is performed (step S205). Through the above methods, display panels (flexible displays) can be manufactured. In addition, in addition to the manufacturing of the display panel shown in Figure 18, the flexible printed circuit board required for precision wiring patterns (high-density wiring), chemical sensor sheets with semiconductor elements such as TFTs and electrode patterns for sensing, Alternatively, when a DNA wafer or the like is manufactured on the flexible substrate P, the exposure apparatus of each of the above-mentioned embodiments can also be used.

1: Component manufacturing system 11: Drawing device 12: Substrate transport mechanism 13: device frame 14: Rotation position detection mechanism 16: control device 21: Ontology frame 22: Three o'clock 23: 1st optical platform 24: Rotating mechanism 25: 2nd optical platform 31: Calibration and Testing System 44, 45: XY two equal division adjustment mechanism 51:1/2 wavelength plate 52: Polarizer 53: Diffuser 60: 1st beam splitter 62: 2nd beam splitter 63: 3rd beam splitter 73: 4th beam splitter 81: Optical deflector 82:1/4 wavelength plate 83: Scanner 84: Bending Mirror 85: f-theta lens system 86: Optical components for Y magnification correction 92: shading plate 96: mirror 97: Rotating polygon mirror 98: Origin detector 100: Encoder reading head EN1, EN2 installation components 101: Encoder reading head EN3, EN4 installation components 105: Rotation measuring device 106: The driving part of the rotating mechanism 110: The driving part of the three-point seat 121: X mobile mechanism 122: Z mobile organization 123: Bearing 130: Roll support frame 131: Reel rotating mechanism 132: Roll support member 141: Encoder reading head EN5, EN6 installation components P: substrate U1, U2: Processing device EX: Exposure device AM1, AM2: Align the microscope EVC: Adjusting the greenhouse SU1, SU2: Anti-vibration unit E: Setting surface EPC: Edge Position Controller RT1, RT2: Tension adjustment roller DR: Rotating reel AX2: Rotation centerline Sf2: Shaft p3: center plane DL: Slack UW1～UW5: Drawing module CNT: light source device LB: Delineate the beam I: Rotation axis LL1～LL5: Drawing line PBS: Polarizing beam splitter A7: Exposure area SL: beam distribution optics Le1～Le4: Set bearing line Vw1～Vw6: Observation area Ks1～Ks3: alignment mark GPa, GPb: scale part EN1～EN6: Encoder reading head SD: Ruler disc

Fig. 1 is a diagram showing the overall configuration of the exposure apparatus (substrate processing apparatus) of the first embodiment. [Fig. 2] A perspective view showing the configuration of the main parts of the exposure apparatus of Fig. 1. [Fig. [Fig. 3] A diagram showing the arrangement relationship between the alignment microscope and the drawing line on the substrate. [Fig. 4] is a diagram showing the structure of the rotating reel and the drawing device of the exposure device of Fig. 1. [Fig. [Fig. 5] A plan view showing the arrangement of the main parts of the exposure apparatus of Fig. 1. [Fig. [Fig. 6] A perspective view showing the structure of the branched optical system of the exposure device in Fig. 1. [Fig. [Fig. 7] A diagram showing the arrangement relationship of a plurality of scanners of the exposure device in Fig. 1. [Fig. [Figure 8] is a perspective view showing the arrangement relationship between the alignment microscope and the drawing line on the substrate and the encoder read head. [Fig. 9] A perspective view showing the surface structure of the rotating reel of the exposure device in Fig. 1. [Fig. [Fig. 10] A top view showing the configuration of the encoder read head of the exposure device in Fig. 1. [Fig. [Fig. 11] A plan view showing the arrangement relationship between the rotating reel of the exposure device in Fig. 1 and the drawing device. [FIG. 12] A flowchart related to the exposure apparatus adjustment method of the first embodiment is shown. Fig. 13 is a perspective view showing the arrangement of the main parts of the exposure apparatus of the second embodiment. Fig. 14 is a perspective view showing the arrangement of the main parts of the exposure apparatus of the third embodiment. [Fig. 15] is a diagram showing the configuration of the rotating reel and the drawing device of the fourth embodiment. [Fig. 16] is a plan view showing the arrangement of the encoder head of the exposure apparatus of the fifth embodiment. Fig. 17 is a plan view showing the arrangement of the scale disc of the exposure apparatus of the sixth embodiment. [Fig. 18] is a flowchart showing the device manufacturing method of the first to fifth embodiments.

11: Drawing device

13: device frame

21: Ontology frame

22: Three o'clock

22a: Support point

23: 1st optical platform

24: Rotating mechanism

25: 2nd optical platform

AX2: Rotation centerline

DR: Rotating reel

EX: Exposure device

I: Rotation axis

P: substrate

RT2: Tension adjustment roller

Sf2: Shaft

UW1~UW5: drawing module

Claims (10)

A substrate processing device, while conveying a long sheet substrate in the longitudinal direction, while sequentially forming a predetermined pattern on the aforementioned sheet substrate, the device includes: The first supporting member, which pivotally supports a rotating drum, has a cylindrical outer peripheral surface with a certain radius from the center line extending in a direction intersecting the aforementioned longitudinal direction, and can use a part of the outer peripheral surface Supporting the aforementioned sheet-like substrate while rotating around the aforementioned centerline; The second supporting member is arranged to hold a plurality of pattern forming portions in the direction of the center line. The pattern forming portion supports the sheet in the outer peripheral surface of the rotating reel in order to form the pattern on the sheet substrate Partially opposed configuration of the substrate; The first rotating mechanism can adjust the relative angle relationship between the first supporting member and the second supporting member in order to adjust the inclination of the pattern to be formed on the sheet substrate; The reference member rotates around the aforementioned centerline together with the aforementioned rotating drum, and is provided with an index for measuring the rotation direction of the aforementioned rotating drum or the position change of the aforementioned centerline direction; The first detection device is provided on the second support member side, detects the index of the reference member to detect the position change of the rotating drum in the rotation direction, and detects the relative angle change between the first support member and the second support member ； A second rotating mechanism for individually rotating each of the plurality of pattern forming portions relative to the second supporting member; and The second detection device is provided on the side of the second support member, and measures the rotation position of each of the plurality of pattern forming portions. Such as the substrate processing apparatus of claim 1, wherein: When each of the plurality of pattern forming portions is set to be No. 1, No. 2, ... from the end in the direction of the center line, The odd-numbered pattern forming part is used to form the pattern on the sheet-like substrate. The odd-numbered formation position is arranged on the upstream and downstream sides of the moving direction of the sheet substrate by the rotation of the rotating reel. One side, The even-numbered pattern forming part is used to form the pattern on the sheet-like substrate at the even-numbered formation position, which is arranged on the other of the upstream side and the downstream side in the moving direction of the sheet-like substrate. Such as the substrate processing apparatus of claim 2, wherein: The aforementioned first detection device includes: The reading head for odd numbers is set in the aforementioned way in such a way that when viewed from the extending direction of the aforementioned center line, the detection position of the index of the aforementioned reference member is approximately the same as the direction connecting the aforementioned odd number formation position and the aforementioned center line. The second supporting member; and The even-numbered read head is set in the aforementioned way so that when viewed from the extending direction of the aforementioned centerline, the detection position of the index of the aforementioned reference member is substantially consistent with the orientation connecting the aforementioned even-numbered position with the aforementioned centerline. The second supporting member. Such as the substrate processing apparatus of claim 3, which is further provided with a mark detection device including a detection probe capable of detecting a plurality of marks formed at predetermined intervals along the longitudinal direction on the sheet substrate in the observation area, and The observation area is arranged in such a way that the moving direction of the sheet substrate is more upstream than any one of the odd-numbered formation position and the even-numbered formation position. Such as the substrate processing apparatus of claim 4, wherein: The index of the aforementioned reference member is a pair of scale parts of a rotary measuring encoder which are respectively arranged on both sides of the direction of the aforementioned center line of the aforementioned rotating drum and rotating together with the aforementioned rotating drum; The aforementioned odd-numbered read head is arranged opposite to each of the aforementioned pair of scale parts, and the first encoder read head that detects the position change of the rotation direction of the scale engraved on the aforementioned scale part; The even-numbered read head is a second encoder read head that is arranged opposite to each of the pair of scale parts, and detects the position change in the rotation direction of the scale engraved on the scale part. Such as the substrate processing apparatus of claim 5, which further includes: When viewed from the extending direction of the center line of the third encoder head, the reading position of the scales of the pair of scale portions is roughly the same as the direction connecting the position of the observation area of the detection probe to the center line The uniform method is provided on the side of the first support member or the side of the second support member, and detects the position change of the scale in the rotation direction. Such as the substrate processing apparatus of any one of claims 1 to 6, wherein: Each of the plurality of pattern forming parts is a drawing module, which includes a one-dimensional repetitive scanning of the spot light of the pattern drawing beam projected on the sheet substrate in a direction substantially parallel to the center line of the rotating drum. The polygon mirror is arranged in such a manner that the pattern drawn by the drawing line formed on the sheet substrate by the scanning of the spot light is joined in the direction of the center line. Such as the substrate processing apparatus of claim 7, wherein: The second rotating mechanism includes an actuator that adjusts the sheet substrate formed on the sheet substrate by each of the drawing modules during the conveyance of the sheet substrate by the rotation of the rotating reel Delineate the inclination of each line. Such as the substrate processing apparatus of claim 8, wherein: The aforementioned second detection device is an individual angle measuring sensor that individually measures the rotation angle position of each of the aforementioned traced lines; The actuator is controlled based on the angle change detected by the second detection device and the rotation angle position measured by the individual angle measurement sensor. A device manufacturing method, wherein the pattern forming part of any one of claims 1 to 6 is an exposure device that irradiates the sheet substrate with light energy corresponding to the shape of a predetermined pattern; It also includes: the operation of transporting the sheet-like substrate with the photosensitive functional layer formed on the surface in the longitudinal direction while being partially supported by the rotating reel; An action of irradiating the light energy from the exposure device to the photosensitive functional layer of the portion of the sheet substrate supported by the rotating reel; and The operation of forming a layer corresponding to the shape of a predetermined pattern on the sheet substrate by processing the sheet substrate irradiated with the light energy.

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