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TWI636161B - Production method of dark colored chromium based electrodeposits and trivalent chromium electrolyte - Google Patents

Production method of dark colored chromium based electrodeposits and trivalent chromium electrolyte Download PDF

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TWI636161B
TWI636161B TW106113202A TW106113202A TWI636161B TW I636161 B TWI636161 B TW I636161B TW 106113202 A TW106113202 A TW 106113202A TW 106113202 A TW106113202 A TW 106113202A TW I636161 B TWI636161 B TW I636161B
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trivalent chromium
electrolyte
amino acid
chromium
amino acids
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TW201738412A (en
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原昌宏
西山達也
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麥克達米德尖端股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/04Electroplating: Baths therefor from solutions of chromium
    • C25D3/10Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/04Electroplating: Baths therefor from solutions of chromium
    • C25D3/06Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium

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  • Chemical Kinetics & Catalysis (AREA)
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  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

一種包含三價鉻離子及胺基酸的水性三價鉻電解質,其允許在電鍍於基材上的三價鉻塗層中產生深色色澤。於本文中所描述的胺基酸包含一陽離子側鏈且係至少基本上無硫。該胺基酸的陽離子側鏈進一步包含氮。當使用在三價鉻電解質中時,這些胺基酸允許製造出明顯較深色的三價鉻沈積物。該三價鉻電解質係使用在一使用電沈積於基材上製造出具有想要的深色色澤之三價鉻塗層的方法中。 An aqueous trivalent chromium electrolyte containing trivalent chromium ions and amino acids, which allows a dark color to be produced in a trivalent chromium coating plated on a substrate. The amino acids described herein include a cationic side chain and are at least substantially free of sulfur. The cationic side chain of the amino acid further contains nitrogen. When used in trivalent chromium electrolytes, these amino acids allow the production of significantly darker trivalent chromium deposits. The trivalent chromium electrolyte is used in a method for producing a trivalent chromium coating having a desired dark color using electrodeposition on a substrate.

Description

基於深色鉻之電沈積物之製造方法及三價鉻電解質 Manufacturing method of dark chromium-based electrodeposition and trivalent chromium electrolyte

本發明普遍關於一種藉由電沈積製造深色鉻塗層之組成物及方法。 The present invention generally relates to a composition and method for manufacturing a dark chromium coating by electrodeposition.

鉻已經使用作為裝飾塗層有許多年且具有許多應用。為了裝飾的目的,鉻通常以厚度典型少於1微米的薄塗層施加在鎳塗層上。鉻提供一硬的耐磨耗層,且由於鉻層相關於下層鎳沈積物係陰極,其亦獲得優良的腐蝕性能。因此,下層鎳在腐蝕電池中變成陽極會優先受腐蝕而留下鉻層未被腐蝕。 Chromium has been used as a decorative coating for many years and has many applications. For decorative purposes, chromium is usually applied on nickel coatings as a thin coating, typically less than 1 micron thick. Chromium provides a hard, abrasion-resistant layer, and because the chromium layer is related to the underlying nickel deposit system cathode, it also obtains excellent corrosion performance. Therefore, the lower layer of nickel that becomes the anode in a corroded battery is preferentially corroded, leaving the chromium layer uncorroded.

典型來說,這些薄裝飾鉻層係藉由從典型包含鉻酸之以六價鉻為主的電解質進行電沈積而施加。從這些電解質所獲得的鉻沈積物基本上係純鉻且具有均勻及不變的顏色。在該塗層頂端形成薄氧化物層提供非常熟知的藍/白色外觀。除了由於與鉻酸相關的嚴重健康及環境危害要使用替代的電解質之動機外,市場亦對具有較深色澤的塗層有需求。 Typically, these thin decorative chromium layers are applied by electrodeposition from a hexavalent chromium-based electrolyte that typically contains chromic acid. The chromium deposits obtained from these electrolytes are essentially pure chromium and have a uniform and constant color. The formation of a thin oxide layer on top of this coating provides a very well-known blue / white appearance. In addition to the motivation to use alternative electrolytes due to the serious health and environmental hazards associated with chromic acid, there is also a need in the market for coatings with darker shades.

藉由從以三價鉻為主的電解質,進行電沉積鉻塗層,可獲得一初始溶液,其提供來自鉻電解質之較深色澤的沈積物。由於這些電解質的沈積機制本質,所 產生的鉻塗層比從六價電解質所產生者較不純。此係由於會在該塗層內共沈積其它元素。這些共沈積的元素最常見為鐵、硫及碳或其組合。藉由調整基於三價鉻方法的電解質調配物來最大化因併入這些共沈積元素所產生之沈積物的暗度,可獲得一相當深色澤的塗層。 By performing electrodeposition of a chromium coating from an electrolyte mainly composed of trivalent chromium, an initial solution can be obtained that provides a darker-colored deposit from the chromium electrolyte. Due to the nature of the deposition mechanism of these electrolytes, The resulting chromium coating is less pure than that produced from a hexavalent electrolyte. This is due to the co-deposition of other elements within the coating. These co-deposited elements are most commonly iron, sulfur, and carbon or a combination thereof. By adjusting the electrolyte formulation based on the trivalent chromium method to maximize the darkness of the deposits resulting from the incorporation of these co-deposition elements, a fairly dark coating can be obtained.

雖然由三價鉻電解質所提供之塗層典型會產生比六價鉻電解質沈積物更深色澤的沈積物,從先述技藝所產生的塗層仍然不夠深色而無法滿足市場需求及對製造出較深色的鉻基塗層存在有需求。本發明之目標為提供一種製造這些塗層的方法。 Although the coating provided by the trivalent chromium electrolyte typically produces darker-colored deposits than the hexavalent chromium electrolyte deposits, the coatings produced from the previously described techniques are still not sufficiently dark to meet market demand and produce deeper manufacturing There is a need for colored chromium-based coatings. It is an object of the present invention to provide a method for manufacturing these coatings.

本發明的目的之一為提供一種能在基材上提供深色鉻沈積物的三價鉻電鍍電解質。 An object of the present invention is to provide a trivalent chromium electroplating electrolyte capable of providing a dark chromium deposit on a substrate.

本發明的目的之一為在該三價鉻電解質中提供一種胺基酸,其能於所產生的三價鉻沈積物中產生深色澤。 One of the objectives of the present invention is to provide an amino acid in the trivalent chromium electrolyte, which can produce a dark color in the trivalent chromium deposits produced.

本發明的另一個目標為在該三價鉻電解質中提供一種具有含氮側鏈之胺基酸。 Another object of the present invention is to provide an amino acid having a nitrogen-containing side chain in the trivalent chromium electrolyte.

本發明的另一個目標為在該三價鉻電解質中提供一種不含硫的胺基酸以於基材上提供較深色澤的鉻沈積物。 Another object of the present invention is to provide a sulfur-free amino acid in the trivalent chromium electrolyte to provide a darker-colored chromium deposit on the substrate.

本發明的更另一個目標為在基材上提供一具有比先述技藝三價鉻電鍍電解質深色澤的沈積物,此可使用含有所選擇的胺基酸之三價鉻電解質達成。 Yet another object of the present invention is to provide a deposit having a darker color on the substrate than the trivalent chromium electroplating electrolyte of the aforementioned technique, which can be achieved using a trivalent chromium electrolyte containing a selected amino acid.

本發明的又另一個目標為提供一種在鎳沈積物上電鍍具有深色澤的三價鉻沈積物之方法。 Yet another object of the present invention is to provide a method for electroplating a trivalent chromium deposit having a dark color on a nickel deposit.

在一個具體實例中,提供一種用於三價鉻電解質的組成物,其包含:i)三價鉻離子;ii)一或多種能將該三價鉻離子維持在溶液中之錯合劑;及iii)一或多種胺基酸,其中該胺基酸包括一含氮的陽離子側鏈及其中該陽離子側鏈係至少基本上無硫;及其中該電解質係實質上無六價鉻鹽。在另一個具體實例中,提供一種用以在基材上製造深色鉻沈積物的方法,其步驟包括:i)提供一基於三價鉻的電解質,其包含:a)三價鉻離子;b)一或多種能將該三價鉻離子維持在溶液中之錯合劑;及c)一或多種胺基酸,其中該胺基酸包括一含氮的陽離子側鏈及其中該陽離子側鏈係至少基本上無硫;及其中該電解質係實質上無六價鉻鹽;及ii)使用該基於三價鉻的電解質在該基材上電沈積一深色鉻沈積物。 In a specific example, a composition for a trivalent chromium electrolyte is provided, comprising: i) trivalent chromium ions; ii) one or more complexing agents capable of maintaining the trivalent chromium ions in a solution; and iii ) One or more amino acids, wherein the amino acid comprises a nitrogen-containing cationic side chain and wherein the cationic side chain system is at least substantially free of sulfur; and wherein the electrolyte system is substantially free of hexavalent chromium salts. In another specific example, a method for manufacturing a dark chromium deposit on a substrate is provided, the steps of which include: i) providing a trivalent chromium-based electrolyte comprising: a) trivalent chromium ions; b ) One or more complexing agents capable of maintaining the trivalent chromium ion in solution; and c) one or more amino acids, wherein the amino acid includes a nitrogen-containing cationic side chain and the cationic side chain system thereof is at least Substantially free of sulfur; and wherein the electrolyte is substantially free of hexavalent chromium salts; and ii) using the trivalent chromium-based electrolyte to electrodeposit a dark chromium deposit on the substrate.

圖1描出多種胺基酸種類。 Figure 1 depicts various amino acid species.

本案發明人已驚人地發現將經選擇之包括含氮側鏈的胺基酸併入三價鉻電解質中會產生一實質上比從缺乏這些化合物的相同電解質所獲得之那些還深色的塗層。額外的是,在本發明中有用的胺基酸係至少基本上無硫。基本上無硫意謂著除了可以污染物型式發生在此化合物中之微量外,不存在有任何濃度的硫。當將經選擇的胺基酸加入已經藉由併入諸如硫、鐵、碳或其組合的其它元素來最佳化以製造出深色塗層之電解質時,可獲得最深色的塗層。 The inventors of this case have surprisingly discovered that the incorporation of an amino acid selected to include nitrogen-containing side chains into a trivalent chromium electrolyte results in a coating that is substantially darker than those obtained from the same electrolyte lacking these compounds . Additionally, the amino acids useful in the present invention are at least substantially free of sulfur. Substantially sulfur-free means that there is no sulfur at any concentration other than the trace amount that can occur in this compound as a contaminant. The darkest coating can be obtained when a selected amino acid is added to an electrolyte that has been optimized to incorporate a darker coating by incorporating other elements such as sulfur, iron, carbon, or a combination thereof.

已經由Ward等人在美國專利案號4,107,004中及由Barnes等人在美國專利案號4,157,945中描述出於三價鉻電鍍浴中使用胺基酸作為錯合劑,其描述出使用甘胺酸作為錯合劑。Barclay等人之美國專利案號4,161,432描述出使用甘胺酸、天冬胺酸、精胺酸及組胺酸作為錯合劑。Barclay等人的美國專利案號4,448,648及美國專利案號4,448,649二者描述出使用天冬胺酸作為錯合劑。這些專利每篇的標的其全文於此以參考方式併入本文。這些專利全部聚焦在製造出淡顏色之塗層及未提供改變所製造的沈積物之顏色或與不同胺基酸相關之沈積物顏色變化。 The use of amino acids as complexing agents in trivalent chromium plating baths has been described by Ward et al. In U.S. Patent No. 4,107,004 and by Barnes et al. In U.S. Patent No. 4,157,945, which describes the use of glycine as a fault mixture. U.S. Patent No. 4,161,432 to Barclay et al. Describes the use of glycine, aspartic acid, arginine, and histidine as complexing agents. Both US Patent No. 4,448,648 and US Patent No. 4,448,649 to Barclay et al. Describe the use of aspartic acid as a complexing agent. The subject matter of each of these patents is incorporated herein by reference in its entirety. These patents all focus on the production of light-colored coatings and do not provide changes in the color of the deposited deposits or those associated with different amino acids.

胺基酸分成數個群組,如顯示在圖1中。甲硫胺酸及半胱胺酸(及胱胺酸)胺基酸在其側鏈中包括二價硫。先前已經由Schulz等人在WO 2012/150198A1之實施例中揭示出於三價鉻浴中使用這些含硫化合物作為 深色劑,其全文藉此以參考之方式併入本文。此經了解係存在於該化合物中的硫之作用,因為如與從六價鉻電解質製造之更純的沈積物比較,已知硫會在三價鉻沈積物中造成較深的色澤。 Amino acids are divided into several groups, as shown in FIG. 1. Methionine and cysteine (and cystine) amino acids include divalent sulfur in their side chains. The use of these sulfur compounds as trivalent chromium baths has been previously disclosed by Schulz et al in the examples of WO 2012 / 150198A1 as Darkening agents, the entire contents of which are hereby incorporated herein by reference. This is understood to be the effect of sulfur present in this compound, because sulfur is known to cause a deeper coloration in trivalent chromium deposits as compared to purer deposits made from hexavalent chromium electrolytes.

本發明之發明人已驚人地發現包括選自於具有含氮陽離子側鏈群的那些無硫胺基酸能具有想要的以均勻方式深色化該沈積物之效應。由於在側鏈中存在有含氮(胺)官能基,該側鏈於大部分可商業購得的三價鉻電鍍浴之正常pH條件下(pH 2.5-4.0)係陽離子。 The inventors of the present invention have surprisingly discovered that thiamine-free acids including those selected from groups having nitrogen-containing cation side chains can have the desired effect of darkening the deposit in a uniform manner. Due to the presence of nitrogen-containing (amine) functional groups in the side chain, the side chain is a cation under normal pH conditions (pH 2.5-4.0) of most commercially available trivalent chromium plating baths.

在本發明中有用的胺基酸包括例如精胺酸、組胺酸、離胺酸及其組合。已發現這些胺基酸將產生明顯加深的三價鉻沈積物。額外的是,色胺酸雖然未列在圖1中之包含正電荷群的胺基酸下,其具有含氮側鏈且亦發現其具有提高的加深效應。雖然不意欲由理論界限,從此結果亦相信色胺酸的側鏈在三價鉻電鍍浴之正常pH條件下係陽離子。 Amino acids useful in the present invention include, for example, arginine, histidine, lysine, and combinations thereof. These amino acids have been found to produce significantly deeper trivalent chromium deposits. In addition, although tryptophan is not listed under the amino group containing a positive charge group in FIG. 1, it has a nitrogen-containing side chain and it has also been found to have an enhanced deepening effect. Although not intended to be bound by theory, from this result it is also believed that the side chains of tryptophan are cationic under the normal pH conditions of a trivalent chromium plating bath.

在該三價鉻電解質中的較佳胺基酸之有效濃度範圍較佳為在約1克/升至約50克/升間,及更佳為在約2克/升至約20克/升間。在該三價鉻電解質中之胺基酸濃度最佳為在約5克/升至約10克/升間。 The effective concentration range of the preferred amino acid in the trivalent chromium electrolyte is preferably between about 1 g / l to about 50 g / l, and more preferably between about 2 g / l to about 20 g / l between. The amino acid concentration in the trivalent chromium electrolyte is preferably between about 5 g / l and about 10 g / l.

當使用本文所描述的電解質溶液進行電鍍時,典型使用惰性陽極,諸如碳陽極。亦可使用其它惰性陽極,諸如鉑化的鈦、鉑、塗佈氧化銥的鈦或塗佈氧化鉭的鈦。 When electroplating is performed using the electrolyte solution described herein, an inert anode such as a carbon anode is typically used. Other inert anodes can also be used, such as platinized titanium, platinum, titanium coated with iridium oxide, or titanium coated with tantalum oxide.

該基於三價鉻的電解質之溫度範圍在40℃至60℃,最佳為約50℃。該電解質的pH範圍係約2至約5,最佳為約3.5。在電鍍期間所使用的電流範圍係約1安培至約10安培,最佳為約4安培。在基材電鍍期間不需要攪動該三價鉻電解質。 The temperature of the trivalent chromium-based electrolyte ranges from 40 ° C to 60 ° C, and preferably about 50 ° C. The pH range of the electrolyte is about 2 to about 5, and most preferably about 3.5. The current range used during plating ranges from about 1 amp to about 10 amps, most preferably about 4 amps. This trivalent chromium electrolyte does not need to be agitated during substrate plating.

如於本文中所使用,用語”約”指為可測量的值,諸如參數、或濃度、或其類似值,且意謂著包括特別敘述的值之+/-15%或較少的變化,較佳為+/-10%或較少的變化,更佳為+/-5%或較少的變化及最佳為+/-0.1%或較少的變化,如於本文中所描述的發明係合適於在此變化的範圍內進行。再者,亦要了解的是,修飾字”約”所指示出之值其自身係於本文中特別揭示出。 As used herein, the term "about" refers to a measurable value, such as a parameter, or concentration, or a similar value, and means a change that includes +/- 15% or less of a specifically recited value, Preferably +/- 10% or less change, more preferably +/- 5% or less change and most preferably +/- 0.1% or less change, as described in the invention It is suitable to carry out within the scope of this change. Furthermore, it should also be understood that the value indicated by the modifier "about" itself is specifically disclosed herein.

在較佳具體實例中,該基材包含沈積於下層基材上的鎳及電鍍在該鎳沈積物上之鉻。 In a preferred embodiment, the substrate comprises nickel deposited on an underlying substrate and chromium plated on the nickel deposit.

為了闡明本發明的範圍,使用Konica Minolta CM2600d分光光度計,根據L*a*b*色空間系統,藉由測量L*值來決定多種沈積物之”明度”值。該色空間系統提供一定量值(L*),其可使用來比較由多種胺基酸添加劑組合所獲得的深色化程度。L*值愈高,沈積物愈淡色;及L*值愈低,沈積物愈深色。L*值0係黑色及L* 100係白色。本發明想要較低的L*值。 To clarify the scope of the present invention, a Konica Minolta CM2600d spectrophotometer is used to determine the "brightness" values of various deposits by measuring the L * value according to the L * a * b * color space system. This color space system provides a magnitude (L *) that can be used to compare the degree of darkening obtained from a combination of various amino acid additives. The higher the L * value, the lighter the sediment; and the lower the L * value, the darker the sediment. L * value 0 is black and L * 100 is white. The present invention wants lower L * values.

使用於本文中所描述之電解質來電沈積三價鉻所製造的深色澤塗層較佳為其根據L*a*b*色空間系統進行測量,具有L*值係小於典型產生淡色塗層的三價鉻沈積物及已經最大化所產生的沈積物之暗度的那些。 The dark-colored coatings produced by the electrolytic deposition of trivalent chromium using the electrolyte described herein are preferably measured according to the L * a * b * color space system, and have an L * value that is less than that of a typical light-colored coating. Valence chromium deposits and those that have maximized the darkness of the resulting deposits.

該基於三價鉻的電解質可包括硫氰酸鹽離子。該硫氰酸鹽離子隨處可顯現的濃度係約0.2克/升至最高約5.0克/升。 The trivalent chromium-based electrolyte may include a thiocyanate ion. The concentration of the thiocyanate ion that can be developed everywhere is about 0.2 g / liter to a maximum of about 5.0 g / liter.

於本文中顯現之基於三價鉻的電解質係至少實質上無六價鉻鹽,其中在該電解質中藉由普通測量技術無可偵測到的Cr(VI)離子。 The trivalent chromium-based electrolytes presented herein are at least substantially free of hexavalent chromium salts, where no Cr (VI) ions are detectable in the electrolyte by ordinary measurement techniques.

該三價鉻電解質包含三價鉻離子來源、一或多種能將該三價鉻離子維持在溶液中之錯合劑(錯合試劑)、及經選擇如於本文中所描述的胺基酸。與使用相同電解質但沒有此胺基酸者比較,該胺基酸已在電鍍沈積物中提供較深的色澤。 The trivalent chromium electrolyte includes a source of trivalent chromium ions, one or more complexing agents (complexing agents) capable of maintaining the trivalent chromium ions in solution, and an amino acid selected as described herein. Compared to those using the same electrolyte without this amino acid, this amino acid has provided a deeper color in the electroplated deposits.

使用作為標準的三價鉻電解質係一種經設計用以製造出淡色鉻沈積物之電解質。該電解質及電鍍方法係基於Deeman的美國專利案號4,473,448。此專利其全文藉此以參考方式併入本文。 The trivalent chromium electrolyte used as the standard is an electrolyte designed to make light-colored chromium deposits. The electrolyte and plating method are based on U.S. Patent No. 4,473,448 to Deeman. This patent is hereby incorporated by reference in its entirety.

額外的是,亦基於Barclay等人的美國專利案號4,161,432,以一經調配能製造出深色沈積物之三價鉻電解質溶液為主來提供發明實施例。在該電解質組成物中所使用的胺基酸係天冬胺酸。此參考其全文藉此以參考方式併入本文。 In addition, based on US Patent No. 4,161,432 of Barclay et al., A trivalent chromium electrolyte solution capable of producing dark deposits is mainly provided to provide embodiments of the invention. The amino acid used in this electrolyte composition is aspartic acid. This reference is hereby incorporated by reference in its entirety.

下列非為限制的實施例闡明本發之有效性。全部實施例係藉由將三價鉻沈積物電鍍到Hull電池面板上進行製備。該Hull電池面板先前已經電鍍上10微米的明亮鎳沈積物,然後將其放置在含有欲測試的三價鉻電解質之Hull電池中。對該三價鉻電鍍步驟來說,其條 件係如在表1中所顯示。不管欲測試的組成物,用於三價鉻電鍍的條件皆保持一致。 The following non-limiting examples illustrate the effectiveness of the invention. All examples were prepared by electroplating trivalent chromium deposits onto Hull battery panels. The Hull battery panel has previously been plated with 10 micron bright nickel deposits and then placed in a Hull battery containing the trivalent chromium electrolyte to be tested. For this trivalent chromium plating step, its condition The pieces are as shown in Table 1. Regardless of the composition to be tested, the conditions used for trivalent chromium plating remain the same.

在全部情況中,於該Hull電池面板之與電流密度係每平方公寸8安培相應的位置處測量該三價鉻沈積物之明度或L*值,其中該電流密度係鉻電鍍的典型正常工作範圍。 In all cases, the brightness or L * value of the trivalent chromium deposit was measured at a position corresponding to the current density of 8 Amperes per square inch of the Hull battery panel, where the current density is a typical normal operation of chromium plating range.

比較例1Comparative Example 1

表2提供使用基於Deeman的美國專利案號4,473,448之電解質作為標準(1),與多種經加入係非有效深色劑的胺基酸所測量之L*值。 Table 2 provides L * values measured using Deeman based U.S. Patent No. 4,473,448 as the standard (1) and various amino acids added as non-effective darkening agents.

如可從表2提出的結果看見,當與沒有加入胺基酸的三價鉻電解質比較時,所測試的胺基酸並無在L*值上產生任何明顯減低。L*值的平均減低係1.17%。 As can be seen from the results presented in Table 2, the amino acids tested did not produce any significant reduction in the L * value when compared to trivalent chromium electrolytes without the addition of amino acids. The average reduction in L * values was 1.17%.

實施例1Example 1

表3提供當將本文所描述的胺基酸加入基於Deeman的美國專利案號4,473,448之電解質時所獲得的L*值。使用與上述比較例相同的標準(1)電解質。如先前提到,此電解質典型產生淡色三價鉻沈積物。 Table 3 provides the L * values obtained when the amino acids described herein were added to an electrolyte based on US Patent No. 4,473,448 to Deeman. The same standard (1) electrolyte as in the above comparative example was used. As mentioned previously, this electrolyte typically produces light-colored trivalent chromium deposits.

於此情況中,使用本發明的精胺酸及組胺酸實施例之L*值的平均減低係12.7%。此係可容易地由眼睛看見的顯著差異。加入精胺酸、組胺酸或離胺酸遍及整體沈積物提供均勻顏色。加入色胺酸提供戲劇般效應,但是會產生非常不平坦及有條紋的沈積物,其雖然明顯較深但商業上無法接受。 In this case, the average reduction in the L * value of the examples using the arginine and histidine of the present invention is 12.7%. This line is a significant difference that can be easily seen by the eyes. Adding arginine, histidine, or lysine provides uniform color throughout the entire deposit. The addition of tryptophan provides a dramatic effect, but results in very uneven and streaky deposits, which, although significantly deeper, are commercially unacceptable.

實施例2Example 2

表4提供當將本發明之胺基酸加入基於Barclay等人的美國專利案號4,161,432之電解質時所獲得的L*值。將此電解質使用作為標準(2),與在加入胺基酸後之L*值比較。如先前提到,使用此電解質方法所產生的沈積物係先前已調配能提供深色的三價鉻沈積物。 Table 4 provides the L * values obtained when the amino acids of the present invention were added to an electrolyte based on US Patent No. 4,161,432 based on Barclay et al. This electrolyte was used as standard (2) and compared with the L * value after the amino acid was added. As mentioned previously, the deposits produced using this electrolyte method have previously been formulated to provide dark trivalent chromium deposits.

於此情況中,L*值的平均減低係15.02%。此係非常值得注意的顏色差異。雖然基於Barclay等人的美國專利案號4,161,432之電解質自然產生一深色沈積物,可藉由加入如於本文中所描述的胺基酸來增加該沈積物暗度。 In this case, the average reduction in L * value was 15.02%. This series is very noteworthy for color differences. Although electrolytes based on Barclay et al. US Patent No. 4,161,432 naturally produce a dark deposit, the darkness of the deposit can be increased by adding an amino acid as described herein.

如已由於本文顯現出的實施例顯示出,本發明人已驚人地發現可從包含如於本文所描述之胺基酸的三價鉻電解質獲得較深色澤之沈積物。當該有效胺基酸不包括硫,但是存在有含陽離子氮側鏈時,結果出乎意料,其允許在使用本發明的三價鉻電解質獲得之沈積物中具有較深的色澤。 As has been shown by the examples presented herein, the inventors have surprisingly discovered that darker-colored deposits can be obtained from a trivalent chromium electrolyte containing an amino acid as described herein. When this effective amino acid does not include sulfur, but a cationic nitrogen-containing side chain is present, the result is unexpected, which allows a deeper color in the deposits obtained using the trivalent chromium electrolyte of the present invention.

亦應該了解的是,下列申請專利範圍意欲涵蓋本發明如於本文中所描述的全部上位及特定特徵,及文字上落於此之間之本發明的範圍之全部陳述。 It should also be understood that the following patent application scope is intended to cover all the general and specific features of the invention as described herein, and all statements of the scope of the invention that fall literally between them.

Claims (24)

一種三價鉻電解質,其包含:i)三價鉻離子;ii)一種以上能將該三價鉻離子維持在溶液中之錯合劑;及iii)一種以上胺基酸,其中該胺基酸包括含氮的陽離子側鏈,且其中該陽離子側鏈係至少基本上無硫;及其中該電解質係實質上無六價鉻鹽;其中該電解質能製造具有L*值等於或小於78.47之沈積物,其中該L*值係根據L*a*b*色空間系統所測量。A trivalent chromium electrolyte comprising: i) trivalent chromium ions; ii) more than one complexing agent capable of maintaining the trivalent chromium ions in a solution; and iii) more than one amino acid, wherein the amino acid includes A nitrogen-containing cationic side chain, and wherein the cationic side chain system is at least substantially free of sulfur; and wherein the electrolyte system is substantially free of a hexavalent chromium salt; wherein the electrolyte can produce a deposit having an L * value equal to or less than 78.47 The L * value is measured according to the L * a * b * color space system. 如請求項1之三價鉻電解質,其中該一種以上胺基酸係選自於由下列所組成之群:精胺酸、組胺酸、離胺酸、色胺酸及其組合。The trivalent chromium electrolyte according to claim 1, wherein the one or more amino acids are selected from the group consisting of arginine, histidine, lysine, tryptophan, and combinations thereof. 如請求項1之三價鉻電解質,其中該胺基酸的總濃度係在1克/升至50克/升間。The trivalent chromium electrolyte according to claim 1, wherein the total concentration of the amino acid is between 1 g / L and 50 g / L. 如請求項3之三價鉻電解質,其中該胺基酸的總濃度係在2克/升至20克/升間。The trivalent chromium electrolyte according to claim 3, wherein the total concentration of the amino acid is between 2 g / L and 20 g / L. 如請求項4之三價鉻電解質,其中該胺基酸的總濃度係在5克/升至10克/升間。The trivalent chromium electrolyte according to claim 4, wherein the total concentration of the amino acid is between 5 g / l and 10 g / l. 如請求項1之三價鉻電解質,其中該三價鉻電鍍電解質包括硫氰酸鹽離子。The trivalent chromium electrolyte of claim 1, wherein the trivalent chromium plating electrolyte includes a thiocyanate ion. 如請求項6之三價鉻電解質,其中該硫氰酸鹽離子所存在的濃度係在0.2克/升至5克/升間。The trivalent chromium electrolyte according to claim 6, wherein the thiocyanate ion is present at a concentration between 0.2 g / L and 5 g / L. 如請求項2之三價鉻電解質,其中該胺基酸包含組胺酸。The trivalent chromium electrolyte of claim 2, wherein the amino acid comprises histidine. 如請求項2之三價鉻電解質,其中該胺基酸包含精胺酸。The trivalent chromium electrolyte of claim 2, wherein the amino acid comprises arginine. 如請求項2之三價鉻電解質,其中該胺基酸包含組胺酸與精胺酸的混合物。The trivalent chromium electrolyte of claim 2, wherein the amino acid comprises a mixture of histidine and arginine. 一種在基材上製造深色鉻沈積物的方法,其步驟包括:i)提供一種基於三價鉻的電解質,其包含:a)三價鉻離子;b)一種以上能將該三價鉻離子維持在溶液中的錯合劑;及c)一種以上胺基酸,其中該胺基酸包括含氮的陽離子側鏈,且其中該陽離子側鏈係至少基本上無硫;及其中該電解質係實質上無六價鉻鹽;及ii)使用該基於三價鉻的電解質在基材上電沈積深色鉻沈積物;及其中該深色鉻沈積物具有等於或小於78.47之L*值,其中該L*值係根據L*a*b*色空間系統所測量。A method for manufacturing a dark chromium deposit on a substrate, the steps include: i) providing a trivalent chromium-based electrolyte comprising: a) trivalent chromium ions; b) more than one kind of trivalent chromium ions A complexing agent maintained in solution; and c) more than one amino acid, wherein the amino acid includes a nitrogen-containing cationic side chain, and wherein the cationic side chain system is at least substantially free of sulfur; and wherein the electrolyte system is substantially No hexavalent chromium salt; and ii) electrodepositing a dark chromium deposit on a substrate using the trivalent chromium-based electrolyte; and wherein the dark chromium deposit has an L * value equal to or less than 78.47, wherein the L * Values are measured according to the L * a * b * color space system. 如請求項11之方法,其中該一種以上胺基酸係選自於由下列所組成之群:精胺酸、組胺酸、離胺酸、色胺酸及其組合。The method of claim 11, wherein the one or more amino acids are selected from the group consisting of arginine, histidine, lysine, tryptophan, and combinations thereof. 如請求項11之方法,其中該胺基酸的總濃度係在1克/升至50克/升間。The method of claim 11, wherein the total concentration of the amino acid is between 1 g / liter and 50 g / liter. 如請求項13之方法,其中該胺基酸的總濃度係在2克/升至20克/升間。The method of claim 13, wherein the total concentration of the amino acid is between 2 g / L and 20 g / L. 如請求項14之方法,其中該胺基酸的總濃度係在5克/升至10克/升間。The method of claim 14, wherein the total concentration of the amino acid is between 5 g / l and 10 g / l. 如請求項11之方法,其中該基於三價鉻的電解質進一步包含硫氰酸鹽離子。The method of claim 11, wherein the trivalent chromium-based electrolyte further comprises a thiocyanate ion. 如請求項16之方法,其中該硫氰酸鹽離子所存在的濃度係在0.2克/升至5克/升間。The method of claim 16, wherein the thiocyanate ion is present at a concentration between 0.2 g / L and 5 g / L. 如請求項12之方法,其中該一種以上胺基酸包含組胺酸。The method of claim 12, wherein the one or more amino acids comprise histidine. 如請求項12之方法,其中該一種以上胺基酸包含精胺酸。The method of claim 12, wherein the one or more amino acids comprise arginine. 如請求項12之方法,其中該一種以上胺基酸包含組胺酸與精胺酸的混合物。The method of claim 12, wherein the one or more amino acids comprise a mixture of histidine and arginine. 如請求項11之方法,其中該在基材上製造的鉻塗層係根據L*a*b*色空間系統測量,而具有L*值係低於由不包含該一種以上胺基酸的相同三價鉻電解質所製造之三價鉻沈積物。The method of claim 11, wherein the chrome coating manufactured on the substrate is measured according to the L * a * b * color space system, and having an L * value is lower than that of the same by not including the one or more amino acids. Trivalent chromium deposits made from trivalent chromium electrolytes. 如請求項11之方法,其中該基材包含在該基材上的鎳沈積物及鍍在該鎳沈積物上的三價鉻。The method of claim 11, wherein the substrate comprises a nickel deposit on the substrate and trivalent chromium plated on the nickel deposit. 如請求項11之方法,其中該三價鉻電解質的pH係在2.0至5.0間。The method according to claim 11, wherein the pH of the trivalent chromium electrolyte is between 2.0 and 5.0. 如請求項23之方法,其中該三價鉻電解質的pH係3.5。The method of claim 23, wherein the pH of the trivalent chromium electrolyte is 3.5.
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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4062737A (en) * 1974-12-11 1977-12-13 International Business Machines Corporation Electrodeposition of chromium
US6004448A (en) * 1995-06-06 1999-12-21 Atotech Usa, Inc. Deposition of chromium oxides from a trivalent chromium solution containing a complexing agent for a buffer

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4107004A (en) 1975-03-26 1978-08-15 International Lead Zinc Research Organization, Inc. Trivalent chromium electroplating baths and method
US4161432A (en) * 1975-12-03 1979-07-17 International Business Machines Corporation Electroplating chromium and its alloys
GB1596995A (en) * 1977-06-14 1981-09-03 Ibm Electroplating chromium and its alloys
GB1552263A (en) 1977-03-04 1979-09-12 Bnf Metals Tech Centre Trivalent chromium plating baths
KR810001075B1 (en) * 1978-05-31 1981-09-11 제이 에이취 그레이디 "Chrome or Chromium Alloy Electric Plating Solution"
GB2093861B (en) 1981-02-09 1984-08-22 Canning Materials W Ltd Bath for electrodeposition of chromium
GB2110242B (en) 1981-11-18 1985-06-12 Ibm Electroplating chromium
GB2109817B (en) * 1981-11-18 1985-07-03 Ibm Electrodeposition of chromium
US6468672B1 (en) * 2000-06-29 2002-10-22 Lacks Enterprises, Inc. Decorative chrome electroplate on plastics
US9765437B2 (en) * 2009-03-24 2017-09-19 Roderick D. Herdman Chromium alloy coating with enhanced resistance to corrosion in calcium chloride environments
US8273235B2 (en) * 2010-11-05 2012-09-25 Roshan V Chapaneri Dark colored chromium based electrodeposits
PT2886683T (en) 2011-05-03 2020-03-26 Atotech Deutschland Gmbh Electroplating bath and method for producing dark chromium layers
JP6055611B2 (en) * 2012-05-22 2016-12-27 日本化学工業株式会社 Chrome plating and chrome plating film
KR20150123794A (en) * 2013-01-10 2015-11-04 코벤트야 인크. Apparatus and method of maintaining trivalent chromium bath plating efficiency

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4062737A (en) * 1974-12-11 1977-12-13 International Business Machines Corporation Electrodeposition of chromium
US6004448A (en) * 1995-06-06 1999-12-21 Atotech Usa, Inc. Deposition of chromium oxides from a trivalent chromium solution containing a complexing agent for a buffer

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