TWI688635B - DUV photomask protective film aluminum frame adhesive treatment method - Google Patents
DUV photomask protective film aluminum frame adhesive treatment method Download PDFInfo
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- TWI688635B TWI688635B TW107108457A TW107108457A TWI688635B TW I688635 B TWI688635 B TW I688635B TW 107108457 A TW107108457 A TW 107108457A TW 107108457 A TW107108457 A TW 107108457A TW I688635 B TWI688635 B TW I688635B
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- aluminum frame
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- photosensitive pressure
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- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title claims abstract description 88
- 229910052782 aluminium Inorganic materials 0.000 title claims abstract description 88
- 239000000853 adhesive Substances 0.000 title claims abstract description 34
- 230000001070 adhesive effect Effects 0.000 title claims abstract description 34
- 238000000034 method Methods 0.000 title claims abstract description 25
- 230000001681 protective effect Effects 0.000 title claims abstract description 21
- 239000004820 Pressure-sensitive adhesive Substances 0.000 claims abstract description 69
- 239000000758 substrate Substances 0.000 claims abstract description 27
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 20
- 239000010408 film Substances 0.000 claims description 26
- 229920000642 polymer Polymers 0.000 claims description 8
- 239000010409 thin film Substances 0.000 claims description 7
- 239000010453 quartz Substances 0.000 claims description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- 238000007493 shaping process Methods 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 11
- 238000003672 processing method Methods 0.000 description 6
- 239000007788 liquid Substances 0.000 description 5
- 239000000428 dust Substances 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 239000012943 hotmelt Substances 0.000 description 1
- 239000004816 latex Substances 0.000 description 1
- 229920000126 latex Polymers 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 235000012149 noodles Nutrition 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
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- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
一種DUV光罩保護膜鋁框黏膠處理方法,係於鋁框貼合在光罩的一表面上塗佈一層光敏壓敏膠,該光敏壓敏膠具有低黏度特性,塗佈於鋁框表面時,可以將鋁框的凹凸不平表面填塞補滿,使光敏壓敏膠與鋁框表面為面對面的接觸,再將有一離型劑層的透光平坦基板表面覆蓋於光敏壓敏膠上,使離型劑與光敏壓敏膠接觸,然後,將一紫外線光由基板未設置離型劑的另一表面曝曬該光敏壓敏膠,將光敏壓敏膠高分子化,再將該平坦基板與高分子壓敏膠分離,即可得到一表面平坦的膠面。 A DUV photomask protective film aluminum frame adhesive treatment method is to apply a layer of photosensitive pressure sensitive adhesive on the surface of the aluminum mask attached to the aluminum frame. The photosensitive pressure sensitive adhesive has low viscosity characteristics and is coated on the surface of the aluminum frame At the time, the uneven surface of the aluminum frame can be filled and filled, so that the photosensitive pressure-sensitive adhesive and the surface of the aluminum frame are in face-to-face contact, and then the light-transmitting flat substrate surface with a release agent layer is covered on the photosensitive pressure-sensitive adhesive, so that The release agent is in contact with the photosensitive pressure-sensitive adhesive, and then an ultraviolet light is exposed to the photosensitive pressure-sensitive adhesive from the other surface of the substrate without the release agent, the photosensitive pressure-sensitive adhesive is polymerized, and then the flat substrate and the high After the molecular pressure sensitive adhesive is separated, an adhesive surface with a flat surface can be obtained.
Description
本發明是有關一種DUV光罩保護膜鋁框黏膠處理方法,特別是一種藉由液體狀的光敏壓敏膠將鋁框凹凸表面填塞補滿,再將光敏壓敏膠表面平坦化並進行高分子化,使鋁框壓合於光罩時,該光罩可平均受力,不會造成變形。 The invention relates to an aluminum frame adhesive treatment method for a DUV photomask protective film, in particular to fill up the uneven surface of the aluminum frame with liquid photosensitive pressure-sensitive adhesive, and then flatten the surface of the photosensitive pressure-sensitive adhesive Molecularization, when the aluminum frame is pressed against the photomask, the photomask can be evenly stressed without causing deformation.
依據目前的半導體元件製造技術,半導體元件的電路圖案是透過微影(lithography)製程將電路圖案轉印至矽晶圓的表面,具體而言是利用特定波長的光源投射通過光罩(photomask)的方式,將電路圖案轉印至矽晶圓的表面。 According to the current semiconductor device manufacturing technology, the circuit pattern of the semiconductor device is transferred to the surface of the silicon wafer through a lithography process, specifically, a light source of a specific wavelength is projected through a photomask Way, the circuit pattern is transferred to the surface of the silicon wafer.
而一般光罩表面會設置有一鋁框,而該光罩表面與該鋁框之間會以黏接劑相黏,而該鋁框則覆蓋有一層光罩保護薄膜,由於近年來IC線寬朝向微細化發展,因此對於光罩表面的平坦度要求也越來越嚴格。 Generally, an aluminum frame is provided on the surface of the photomask, and an adhesive is adhered between the surface of the photomask and the aluminum frame, and the aluminum frame is covered with a mask protection film. With the development of miniaturization, the requirements for the flatness of the surface of the reticle are becoming more and more strict.
另外,當鋁框結合於該光罩表面上時,若是該鋁框與該光罩表面結合之底膠表面不平坦,當將保護膜鋁框黏貼到光罩上時,因受力之不同,將會導致該光罩表面之平坦度產生變化,而平坦度產生變化將會使光罩表面上的圖案形狀會產生變化,影響後續的多層光罩曝光準確度或重疊度。 In addition, when the aluminum frame is bonded to the surface of the photomask, if the surface of the primer bonding the aluminum frame and the surface of the photomask is not flat, when the protective film aluminum frame is pasted to the photomask, due to different forces, This will cause the flatness of the reticle surface to change, and the change in the flatness will cause the pattern shape on the reticle surface to change, affecting the subsequent exposure accuracy or overlapping degree of the multi-layer reticle.
如圖1所示,係習知鋁框塗佈黏膠示意圖,主要是在鋁框100上塗佈一層熱熔壓敏膠101或矽高分子溶液或壓克力高分子乳膠,當膠冷卻或溶液揮
發後,再用一極平坦之石英基板壓在膠上,即可在鋁框100上形成一條表面平整的壓敏膠(Pressure sensitive adhesive)101,該壓敏膠101可用來黏貼到光罩上,而鋁框100的另一端表面結合有一層薄膜102,該薄膜102是用來保護光罩不受微塵之影響曝光。
As shown in FIG. 1, it is a schematic diagram of conventional aluminum frame coating adhesive, which is mainly to coat a layer of hot-melt pressure-sensitive adhesive 101 or silicon polymer solution or acrylic polymer latex on the
但由於鋁框100表面通常都是經過陽極氧化處理,使鋁框100表面具有無數的凹凸面,而習知採用的壓敏膠101都為高分子膠,眾所皆知,高分子膠的黏稠度高,並無法將鋁框100凹凸表面填塞補滿,使壓敏膠101與鋁框100的結合表面為凸點接觸,凹面會形成一空洞;當該壓敏膠100壓在光罩上時,必須在鋁框100上施加一朝向光罩103的壓力,才能將鋁框100黏固於光罩上,但由於壓敏膠101與鋁框100的結合面為點對點的接觸,當施加壓力時,會造成凸出接觸面及凹下空洞面的受壓不平均,導致光罩103表面因受力不均而產生些微變形,然而這樣些微變形會使光罩103表面上的圖案形狀產生扭曲變化,影響曝光良率,故上述傳統的平坦化處理仍是有缺陷存在。
However, since the surface of the
因此,若能夠於設計出一種讓膠與鋁框為面對面的接觸,使光罩平均受力,將能夠避免該光罩表面上的圖案形狀產生扭曲變化之情況發生,如此本發明應為一最佳解決方案。 Therefore, if it is possible to design a face-to-face contact between the glue and the aluminum frame to make the photomask evenly stressed, the pattern shape on the surface of the photomask can be prevented from being distorted, so the present invention should be the most Best solution.
本發明係一種DUV光罩保護膜鋁框黏膠處理方法,其方法為:取一鋁框,該鋁框頂面為凹凸表面,將該鋁框放置在一治具之一框形定位空間中,該定位空間係由二相對應的圍牆所形成,該圍牆高於鋁框的高度,使鋁框頂面與圍牆之間具有一高度差;於鋁框頂面上塗佈一層與該圍牆頂面接近切齊,且 為單分子低黏性的一液態狀光敏壓敏膠,該光敏壓敏膠滲入該鋁框的凹凸表面中,將凹凸表面填塞補滿,並受到該圍牆擋持塑形;取一透光基板,該透光基板具有一極平坦的表面,於該極平坦表面上有一極平坦的離型劑層,將該透光基板的離型劑層覆蓋於該治具的圍牆頂面並同時壓抵於該光敏壓敏膠的表面,使離型劑層與該光敏壓敏膠相接觸,致使該光敏壓敏膠形成一具有平坦的膠面;取一紫外線燈,將紫外線燈置於未設置該離型劑層的該透光基板另一側,使紫外線燈所產生的紫外線光會朝該光敏壓敏膠曝曬,使該光敏壓敏膠經由曝曬後,轉換成高分子非硬化的壓敏膠,而具有高黏性;藉由離型劑層的設置,使透光基板輕易自壓敏膠表面移除,致使該光敏壓敏膠的膠面形成為一極平坦的表面,同時將鋁框移出治具;取一薄膜層,該薄膜層結合在鋁框未設置該壓敏膠的另一表面上,該薄膜可避免微塵掉落在光罩上。 The invention relates to a method for processing an aluminum frame adhesive of a DUV photomask protective film. The method is as follows: an aluminum frame is taken, the top surface of the aluminum frame is an uneven surface, and the aluminum frame is placed in a frame-shaped positioning space of a jig , The positioning space is formed by two corresponding surrounding walls, the surrounding walls are higher than the height of the aluminum frame, so that there is a height difference between the top surface of the aluminum frame and the surrounding wall; a layer is coated on the top surface of the aluminum frame and the top of the surrounding wall Noodles are close to cut, and It is a single-molecule low-viscosity liquid photosensitive pressure-sensitive adhesive. The photosensitive pressure-sensitive adhesive penetrates into the concave-convex surface of the aluminum frame, fills the concave-convex surface, and is shaped by the surrounding wall; take a transparent substrate The light-transmitting substrate has an extremely flat surface, and an extremely flat release agent layer is formed on the extremely flat surface. The release agent layer of the light-transmitting substrate covers the top surface of the surrounding wall of the jig and simultaneously presses against On the surface of the photosensitive pressure-sensitive adhesive, the release agent layer is brought into contact with the photosensitive pressure-sensitive adhesive, so that the photosensitive pressure-sensitive adhesive forms a flat adhesive surface; take an ultraviolet lamp, and place the ultraviolet lamp in the unset The other side of the light-transmitting substrate of the release agent layer exposes the ultraviolet light generated by the ultraviolet lamp toward the photosensitive pressure-sensitive adhesive, and the photosensitive pressure-sensitive adhesive is converted into a polymer non-hardened pressure-sensitive adhesive after exposure , And has high viscosity; by setting the release agent layer, the transparent substrate can be easily removed from the surface of the pressure-sensitive adhesive, so that the adhesive surface of the photosensitive pressure-sensitive adhesive is formed into an extremely flat surface, and the aluminum frame Remove the jig; take a thin film layer, the thin film layer is bonded to the other surface of the aluminum frame where the pressure-sensitive adhesive is not provided, the thin film can prevent fine dust from falling on the photomask.
於一較佳實施例中,其中該透光基板係為石英基板。 In a preferred embodiment, the transparent substrate is a quartz substrate.
於一較佳實施例中,其中該使鋁框頂面與圍牆之間具有一高度差,該高度差為0.2mm~0.8mm,相對控制該壓敏膠厚度為0.2mm~0.8mm。 In a preferred embodiment, there is a height difference between the top surface of the aluminum frame and the surrounding wall, the height difference is 0.2 mm to 0.8 mm, and the thickness of the pressure sensitive adhesive is relatively controlled to be 0.2 mm to 0.8 mm.
於一較佳實施例中,其中該紫外線光的曝曬時間為5分鐘。 In a preferred embodiment, the exposure time of the ultraviolet light is 5 minutes.
100:鋁框 100: aluminum frame
101:壓敏膠 101: pressure sensitive adhesive
102:薄膜 102: film
103:光罩 103: Mask
1:鋁框 1: Aluminum frame
11:凹凸表面 11: uneven surface
2:光敏壓敏膠 2: photosensitive pressure sensitive adhesive
2’:壓敏膠 2’: Pressure sensitive adhesive
3:透光基板 3: Translucent substrate
4:離型劑層 4: Release agent layer
5:光罩 5: Mask
6:薄膜層 6: Film layer
7:紫外線燈 7: UV lamp
71:紫外線光 71: Ultraviolet light
8:治具 8: Fixture
81:定位空間 81: positioning space
82:圍牆 82: fence
h:高度差 h: height difference
[第1圖]係習知保護膜框架示意圖。 [Figure 1] is a schematic diagram of a conventional protective film frame.
[第2A圖]係本發明DUV光罩保護膜鋁框黏膠處理方法之實施處理結構示意圖。 [Figure 2A] This is a schematic diagram of the implementation of the treatment method of the aluminum frame adhesive treatment method of the DUV mask protective film of the present invention.
[第2B圖]係本發明DUV光罩保護膜鋁框黏膠處理方法之實施處理結構示意圖。 [Figure 2B] This is a schematic diagram of the implementation of the treatment method of the aluminum frame adhesive treatment method of the DUV mask protective film of the present invention.
[第2C圖]係本發明DUV光罩保護膜鋁框黏膠處理方法之實施處理結構示意圖。 [Figure 2C] This is a schematic diagram of the implementation of the processing method of the aluminum frame adhesive treatment method of the DUV mask protective film of the present invention.
[第2D圖]係本發明DUV光罩保護膜鋁框黏膠處理方法之實施處理結構示意圖。 [Figure 2D] It is a schematic diagram of the implementation of the processing method of the aluminum frame adhesive treatment method of the DUV mask protective film of the present invention.
[第2E圖]係本發明DUV光罩保護膜鋁框黏膠處理方法之實施處理結構示意圖。 [Figure 2E] This is a schematic diagram of the implementation of the processing method of the aluminum frame adhesive treatment method of the DUV mask protective film of the present invention.
[第2F圖]係本發明DUV光罩保護膜鋁框黏膠處理方法之實施處理結構示意圖。 [Fig. 2F] It is a schematic diagram of the implementation processing structure of the aluminum frame adhesive processing method of the DUV mask protective film of the present invention.
[第2G圖]係本發明DUV光罩保護膜鋁框黏膠處理方法之實施處理結構示意圖。 [Figure 2G] This is a schematic diagram of the implementation of the processing method of the aluminum frame adhesive treatment method of the DUV mask protective film of the present invention.
[第2H圖]係本發明DUV光罩保護膜鋁框黏膠處理方法之實施處理結構示意圖。 [Figure 2H] This is a schematic diagram of the implementation of the processing method of the aluminum frame adhesive treatment method of the DUV mask protective film of the present invention.
[第3圖]係本發明DUV光罩保護膜鋁框黏膠處理方法之與光罩結合結構示意圖。 [Figure 3] This is a schematic view of the structure of the combination of the DUV photomask protective film aluminum frame adhesive treatment method of the present invention and the photomask.
有關於本發明其他技術內容、特點與功效,在以下配合參考圖式之較佳實施例的詳細說明中,將可清楚的呈現。 Regarding other technical contents, features and effects of the present invention, it will be clearly presented in the following detailed description of the preferred embodiments with reference to the drawings.
請參閱第2A~2F圖,為本發明DUV光罩保護膜鋁框黏膠處理方法之製備流程示意圖,由圖中可知,其步驟為:如第2A,2B圖所示,係取一鋁框1,該鋁框1表面為凹凸表面11,將該鋁框1放置在一治具8上,該治具8有一框形的定位空間81,該定位空間係由
二相對應的圍牆82所形成,該圍牆82高於鋁框1的高度,係將鋁框1定位於該定位空間81中,使鋁框1頂面與圍牆82之間具有一0.2mm~0.8mm的高度差h,該高度差h為0.2mm、03mm、0.4mm、0.5mm、0.6mm、0.7mm或0.8mm;請參閱第2C圖所示,於鋁框1頂面上塗佈一層液態狀的光敏壓敏膠2,該光敏壓敏膠2為單分子低黏性,使光敏壓敏膠2可滲入該鋁框1的凹凸表面11中,以將凹凸表面11填塞補滿,使光敏壓敏膠2與鋁框表面為面對面的接觸,達到平均施力及受力之目的,而該液態膠光敏壓敏膠2會與該圍牆82頂面接近切齊,並受到該圍牆82擋持塑形,使該光敏壓敏膠2在鋁框1上的厚度為0.2mm~0.8mm,其中該光敏壓敏膠的厚度為0.2mm、03mm、0.4mm、0.5mm、0.6mm、0.7mm或0.8mm;請參閱第2D圖所示,取一透光基板3,該透光基板3具有一極平坦的表面(表面平坦度為1-5μm),於該極平坦表面上均勻塗佈有一離型劑層4,該離型劑層同樣具有一平坦度為1-5μm的表面,將該透光基板3的離型劑層4覆蓋於該治具8的圍牆82頂面並同時壓抵於該光敏壓敏膠2的表面,使離型劑層4與該光敏壓敏膠2相接觸,致使該光敏壓敏膠2受到透光基板3重量的壓持,及離型劑層4平坦的表面影響,而形成一具有平坦的膠面;其中,該透光基板3係為石英基板;請參閱第2E所示,取一紫外線燈7,將該紫外線燈7置於該未設置離型劑層4的該透光基板3另一側,使該紫外線燈7產生的紫外線光71朝該光敏壓敏膠2曝曬至少5分鐘,使該光敏壓敏膠2經由曝曬後,轉換成高分子非硬化的壓敏膠2’,而具有高黏性;請參閱第2F圖所示,藉由離型劑層4的設計,使透光基板3輕易自高分子壓敏膠2’表面移除,致使該壓敏膠2’的膠面形成為一極平坦的表面,不會
受到鋁框1凹凸表11面影響,如第2G圖所示,同時將鋁框移出該治具8;請參閱第2H所示,在鋁框1未設置高分子壓敏膠2’的另一表面上結合有一薄膜層6,形成一罩蓋體,該薄膜層6可避免微塵掉落在光罩上。
Please refer to Figures 2A~2F, which is a schematic diagram of the preparation process of the aluminum frame adhesive treatment method of the DUV mask protective film of the present invention. From the figure, the steps are: as shown in Figures 2A and 2B, an aluminum frame is taken 1. The surface of the
請參閱第3圖所示,能夠將該鋁框1上的高分子光敏壓敏膠2貼合於一光罩5表面上,而該鋁框1另一表面則為該薄膜層6,以防止微塵掉落於光罩5上,由於該壓敏膠2’已將鋁框1凹凸表面11填滿,所以壓敏膠2’的與鋁框1結合膠面不會受到凹凸面影響,而有空洞,並藉由壓敏膠2’平坦的膠面,當將鋁框1上的壓敏膠2’貼合於一光罩5表面時,當鋁框1施加一壓力至該光罩5時,該光罩5每個受力點都為平均受力,而不會產生變形的情形,進而確保光罩5表面圖案不會產生變形。
Please refer to FIG. 3, the polymer photosensitive pressure-
本發明所提供之DUV光罩保護膜鋁框黏膠處理方法,與其他習用技術相互比較時,其優點如下: Compared with other conventional technologies, the DUV photomask protective film aluminum frame adhesive treatment method provided by the present invention has the following advantages:
(1)本發明採用液態光敏壓敏膠先將鋁框凹凸面填補後,使鋁框表面與光敏壓敏膠的結合面不會有任何隙縫,再將光敏壓敏膠高分子化,形成一高黏性的壓敏膠,當鋁框壓於光罩表面上時,能夠有效避免因施力不均而造成光罩表面圖案產生變化的情況發生。 (1) In the present invention, the liquid photosensitive pressure-sensitive adhesive is used to fill the uneven surface of the aluminum frame first, so that there is no gap between the surface of the aluminum frame and the photosensitive pressure-sensitive adhesive, and then the photosensitive pressure-sensitive adhesive is polymerized to form a High-viscosity pressure-sensitive adhesive, when the aluminum frame is pressed on the surface of the reticle, can effectively avoid the situation that the pattern on the surface of the reticle changes due to uneven force application.
(2)本發明可有效提升光罩在微影(lithography)製程中的良率。 (2) The present invention can effectively improve the yield of the photomask in the lithography process.
本發明已透過上述之實施例揭露如上,然其並非用以限定本發明,任何熟悉此一技術領域具有通常知識者,在瞭解本發明前述的技術特徵及實施例,並在不脫離本發明之精神和範圍內,不可作些許之更動與潤飾,因此本發明之專利保護範圍須視本說明書所附之請求項所界定者為準。 The present invention has been disclosed as above through the above embodiments, but it is not intended to limit the present invention. Anyone who is familiar with this technical field and has general knowledge should understand the foregoing technical features and embodiments of the present invention without departing from the scope of the present invention. No changes or modifications can be made within the spirit and scope, so the patent protection scope of the present invention shall be subject to the definition as defined in the claims attached to this specification.
1:鋁框 1: Aluminum frame
11:凹凸表面 11: uneven surface
2’:壓敏膠 2’: Pressure sensitive adhesive
6:薄膜層 6: Film layer
Claims (4)
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| TW107108457A TWI688635B (en) | 2018-03-13 | 2018-03-13 | DUV photomask protective film aluminum frame adhesive treatment method |
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| TW107108457A TWI688635B (en) | 2018-03-13 | 2018-03-13 | DUV photomask protective film aluminum frame adhesive treatment method |
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| TWI688635B true TWI688635B (en) | 2020-03-21 |
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| US20020181092A1 (en) * | 2001-05-30 | 2002-12-05 | Micro Lithography, Inc. | Antistatic optical pellicle |
| US20030022073A1 (en) * | 2001-07-26 | 2003-01-30 | Micro Lithography, Inc. | Fluoropolymer-coated photomasks for photolithography |
| US20030020894A1 (en) * | 2001-07-26 | 2003-01-30 | Micro Lithography, Inc. | Removable Optical pellicle |
| US20040043302A1 (en) * | 2002-08-27 | 2004-03-04 | Micro Lithography, Inc. | Vent for an optical pellicle system |
| US20140255827A1 (en) * | 2013-03-08 | 2014-09-11 | Micro Lithography, Inc. | Pellicles with reduced particulates |
| TWI556055B (en) * | 2014-08-12 | 2016-11-01 | Micro Lithography Inc | A mask protective film module and manufacturing method thereof |
| TWI571698B (en) * | 2015-12-23 | 2017-02-21 | Micro Lithography Inc | Method for manufacturing EUV mask inorganic protective film module |
| TWI612369B (en) * | 2016-12-28 | 2018-01-21 | Micro Lithography Inc | EUV reticle inorganic protective film assembly manufacturing method |
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|---|---|---|---|---|
| US20020181092A1 (en) * | 2001-05-30 | 2002-12-05 | Micro Lithography, Inc. | Antistatic optical pellicle |
| US20030022073A1 (en) * | 2001-07-26 | 2003-01-30 | Micro Lithography, Inc. | Fluoropolymer-coated photomasks for photolithography |
| US20030020894A1 (en) * | 2001-07-26 | 2003-01-30 | Micro Lithography, Inc. | Removable Optical pellicle |
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