TWI645158B - Three dimensional measuring device - Google Patents
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Abstract
一種三維量測裝置,包含:光源、分光器、反射器、感測器、成像系統。此三維量測裝置對應一干涉量測面。分光器傾斜第一角度,反射器傾斜第二角度,感測器傾斜第三角度,且干涉量測面傾斜第四角度。A three-dimensional measuring device comprises: a light source, a beam splitter, a reflector, a sensor, and an imaging system. The three-dimensional measuring device corresponds to an interference measuring surface. The beam splitter is tilted by a first angle, the reflector is tilted by a second angle, the sensor is tilted by a third angle, and the interference measuring surface is tilted by a fourth angle.
Description
[0001] 本發明係關於三維量測裝置,特別是關於以光學量測待測物的表面三維輪廓的裝置。[0001] The present invention relates to a three-dimensional measuring device, and more particularly to a device for optically measuring a three-dimensional contour of a surface of a test object.
[0002] 不論傳統產業的加工製造或是高科技半導體製程,表面三維輪廓的拍攝與量測的需求與日俱增。除了精準度之外,檢速更是各家設備商考量的重點,因為搭載著高精準度且能夠速測的儀器設備代表品質保證及產率。 [0003] 表面三維輪廓量測技術有許多種類,各自有不同的原理,例如立體感測器、雷射光切斷法、色散共焦感測器、白光干涉儀等,其高度量測範圍與解析度各有所不同。白光干涉儀相對於其它技術,在量測上不受限表面材料及起伏,且其高度解析度取決於白光干涉儀或裝載待測物的載台的高度位移精準度,但卻有不可忽視的缺點,如量測視野範圍太小以及量測速度太慢等,故這是一般白光干涉儀難以使用在線上(In-line)檢測機台上的主要原因。 [0004] 圖1為傳統的白光干涉儀1001的結構的光路圖,其中光路1000以粗直線表示。參照圖1,此傳統的白光干涉儀1001包含光源1002、分光器1003、反射鏡1004、感測器1005及成像系統1006。此傳統的白光干涉儀1001具有對應的干涉量測面1012(此干涉量測面1012為虛擬面,以虛線表示),光源1002發出的光經分光器1003分別發生透射與反射至反射鏡1004與待測物1007,於待測物1007的表面的高度與此干涉量測面1012一致處所產生的反射光與從反射鏡1004的反射光在對應的感測器1005的像素測得最大干涉強度。為了調整干涉量測面1012以確認待測物1007的表面的不同高度,必須垂直(z方向)移動傳統的白光干涉儀1001或裝載待測物1007的載台。讓干涉量測面1012垂直移動掃描而得到待測物1007的此處的水平(x-y方向,於圖1中y方向平行於入紙面方向)位置的表面的高度分布後,才能移動往下一個水平位置。 [0005] 例如,對於12吋(直徑約300mm)晶圓,若以搭配物鏡之傳統的白光干涉儀1001進行全區域量測,量測之視野範圍假設為25mm,需要在很多個不同水平位置進行垂直移動掃描量測才能做完整的晶圓的表面高度分布量測。且傳統的白光干涉儀1001的高度解析度由傳統的白光干涉儀1001或載台的高度位移精準度決定,要達成高的高度解析度所需的成本很高。又,傳統的白光干涉儀1001需配合顯微鏡系統使用,因而成本高。[0002] Regardless of the manufacturing or manufacturing of high-tech semiconductors in the traditional industry, the demand for the measurement and measurement of the three-dimensional contour of the surface is increasing. In addition to accuracy, speed detection is the focus of consideration by various equipment manufacturers, because the equipment with high precision and fast measurement represents quality assurance and productivity. [0003] There are many types of surface three-dimensional contour measurement techniques, each having different principles, such as stereo sensor, laser light cutting method, dispersion confocal sensor, white light interferometer, etc., and its height measurement range and resolution Degrees vary. Compared with other technologies, the white light interferometer does not limit the surface material and undulation in measurement, and its height resolution depends on the height displacement accuracy of the white light interferometer or the stage on which the object to be tested is loaded, but it cannot be ignored. Disadvantages, such as measuring the field of view is too small and the measurement speed is too slow, so this is the main reason why the general white light interferometer is difficult to use on the in-line inspection machine. 1 is an optical path diagram of a structure of a conventional white light interferometer 1001 in which an optical path 1000 is indicated by a thick line. Referring to FIG. 1, the conventional white light interferometer 1001 includes a light source 1002, a beam splitter 1003, a mirror 1004, a sensor 1005, and an imaging system 1006. The conventional white light interferometer 1001 has a corresponding interference measuring surface 1012 (the interference measuring surface 1012 is a virtual surface, indicated by a broken line), and the light emitted by the light source 1002 is transmitted and reflected by the beam splitter 1003 to the mirror 1004, respectively. The object to be tested 1007 measures the maximum interference intensity of the reflected light generated at the height of the surface of the object to be tested 1007 coincident with the interference measurement surface 1012 and the reflected light from the mirror 1004 at the pixel of the corresponding sensor 1005. In order to adjust the interference measurement surface 1012 to confirm different heights of the surface of the object to be tested 1007, the conventional white light interferometer 1001 or the stage on which the object to be tested 1007 is loaded must be moved vertically (z direction). The interference measurement surface 1012 is vertically moved and scanned to obtain the height distribution of the surface of the object 1007 (the xy direction, the y direction is parallel to the paper entrance direction in FIG. 1), and then moves to the next level. position. [0005] For example, for a 12-inch (about 300 mm diameter) wafer, if the conventional white light interferometer 1001 with a objective lens is used for the whole area measurement, the field of view of the measurement is assumed to be 25 mm, which needs to be performed at a plurality of different horizontal positions. Vertical movement scan measurements allow for complete wafer surface height distribution measurements. Moreover, the high resolution of the conventional white light interferometer 1001 is determined by the high displacement accuracy of the conventional white light interferometer 1001 or the stage, and the cost required to achieve high altitude resolution is high. Moreover, the conventional white light interferometer 1001 needs to be used in conjunction with a microscope system, and thus is costly.
[0006] 本發明的一實施方式的一例子可為一種三維量測裝置,包含:光源;分光器,分光器相對於水平方向傾斜第一角度;反射器,反射器的表面對應參考面,參考面相對於垂直方向傾斜第二角度;感測器,感測器的表面對應成像面,成像面相對於水平方向傾斜第三角度或與水平方向平行;成像系統,成像系統位於分光器和感測器之間,其中,三維量測裝置具有干涉量測面,干涉量測面相對於水平方向傾斜第四角度,其中,於水平方向分光器在光源及參考面之間,且於垂直方向分光器在成像面及干涉量測面之間,其中,分光器上的任意點到參考面的在水平方向的距離等於分光器上的此點到干涉量測面的在垂直方向的距離,其中,當進行量測時,三維量測裝置往待測物照射的光平行於垂直方向。 [0007] 本發明的一實施方式的一例子可為一種三維量測裝置,其中,相對於水平方向傾斜或平行的第三角度的成像面透過成像系統會有一對應的相對於水平方向傾斜或平行的物面,成像面與物面符合莎姆定律(Scheimpflug Principle),且調整成像面的第三角度來使物面與傾斜的干涉量測面一致。 [0008] 本發明的一實施方式的一例子可為一種三維量測裝置,其中,反射器的表面使得從光源發出且穿透分光器的光在照射反射器時能有部分反射光平行於從光源發出且穿透分光器的光。 [0009] 本發明的一實施方式的一例子可為一種三維量測裝置,其中,當進行量測時,若待測物的表面的高度與干涉量測面一致,感測器測得最大干涉強度。 [0010] 本發明的一實施方式的一例子可為一種三維量測裝置,其中,感測器係面感測器,面感測器包含像素陣列,其中,干涉量測面包含對應像素陣列的對應列的多個量測線,傾斜的干涉量測面可視為判斷不同高度的量測線的組合,其中,當進行量測時,若待測物的表面的高度與量測線一致,感測器的像素陣列中的對應的像素測得最大干涉強度。 [0011] 本發明的一實施方式的一例子可為一種三維量測裝置,其中,反射器及感測器可轉動,使得第二角度及第三角度可依第四角度的需求而調整。 [0012] 本發明的一實施方式的一例子可為一種三維量測裝置,其中,當進行量測時,三維量測裝置或裝有待測物的載台水平移動而可得到不同水平位置上的待測物的表面的高度。 [0013] 本發明的一實施方式的一例子可為一種三維量測裝置,其中,當進行量測時,三維量測裝置或裝有待測物的載台可連續移動而一次量測待測物的整個表面。 [0014] 本發明的一實施方式的一例子可為一種三維量測裝置,其中,成像系統至少包含以下的其中之一:反射鏡組、透射鏡組、或由反射鏡和透射鏡組成的鏡組。 [0015] 本發明的一實施方式的一例子可為一種三維量測裝置,其中,反射器的表面為階梯狀。 [0016] 如此,本發明至少具有以下的有利功效的一者或多者。因本發明的三維量測裝置具有傾斜的干涉量測面,因此,不像傳統的白光干涉儀必須垂直移動三維量測裝置或載台而只能分次量測,本發明只需水平移動三維量測裝置或載台即可進行量測,且因此可進行連續的量測,而不需要分次量測額外要求的精準定位系統。又,即使本發明的三維量測裝置的干涉量測面是傾斜的,本發明的三維量測裝置往待測物照射的光仍平行於垂直方向,因此不會有陰影或暗角的問題。再者,本發明的三維量測裝置的高度解析度可由像素數及干涉量測面的傾斜角決定,要達成高的高度解析度很容易且成本低。又,本發明的三維量測裝置不一定要用顯微鏡系統,且亦可使用照相機系統所用的大尺寸感測器、或視野更廣、不同種類與倍率的鏡頭,甚至成像系統可使用遠心系統,其建置成本可較低且建置方式較多元。因為本發明的不受限成像系統可為反射鏡組、透射鏡組、或由反射鏡和透射鏡組成的鏡組系統,透射鏡組例如常見的各類鏡頭通常設計給可見光,而使用反射鏡組的光源適用範圍更廣,因此本發明的三維量測裝置用的光源可使用可見光或不可見光。An example of an embodiment of the present invention may be a three-dimensional measuring device, comprising: a light source; a beam splitter, the beam splitter is inclined at a first angle with respect to a horizontal direction; and the reflector, the surface of the reflector corresponds to a reference surface, reference The surface is inclined by a second angle with respect to the vertical direction; the sensor, the surface of the sensor corresponds to the imaging surface, the imaging surface is inclined by a third angle or parallel to the horizontal direction; the imaging system, the imaging system is located in the beam splitter and the sensor The three-dimensional measuring device has an interference measuring surface, and the interference measuring surface is inclined by a fourth angle with respect to the horizontal direction, wherein the horizontal splitter is between the light source and the reference surface, and the vertical splitter is on the imaging surface And between the interferometric measuring surfaces, wherein the distance from the arbitrary point on the spectroscope to the reference plane in the horizontal direction is equal to the distance in the vertical direction from the point on the spectroscope to the interferometric measuring surface, wherein when measuring At the time, the light irradiated by the three-dimensional measuring device toward the object to be tested is parallel to the vertical direction. An example of an embodiment of the present invention may be a three-dimensional measuring device, wherein an imaging surface of a third angle that is inclined or parallel with respect to a horizontal direction passes through the imaging system and has a corresponding tilt or parallel with respect to the horizontal direction. The object surface, the imaging surface and the object surface conform to the Scheimpflug Principle, and adjust the third angle of the imaging surface to make the object surface coincide with the oblique interference measurement surface. An example of an embodiment of the present invention may be a three-dimensional measuring device, wherein a surface of the reflector is such that light emitted from the light source and penetrating the beam splitter can partially reflect light parallel to the light when the reflector is illuminated. Light emitted by the light source and penetrating the beam splitter. An example of an embodiment of the present invention may be a three-dimensional measuring device, wherein when measuring, if the height of the surface of the object to be tested coincides with the interference measuring surface, the sensor measures the maximum interference. strength. [0010] An example of an embodiment of the present invention may be a three-dimensional measuring device, wherein the sensor is a surface sensor, the surface sensor includes a pixel array, wherein the interference measuring surface includes a corresponding pixel array For the plurality of measurement lines of the corresponding column, the inclined interference measurement surface can be regarded as a combination of the measurement lines for determining different heights, wherein when the measurement is performed, if the height of the surface of the object to be tested is consistent with the measurement line, the sense The corresponding pixel in the pixel array of the detector measures the maximum interference intensity. [0011] An example of an embodiment of the present invention may be a three-dimensional measuring device, wherein the reflector and the sensor are rotatable such that the second angle and the third angle are adjustable according to the requirements of the fourth angle. [0012] An example of an embodiment of the present invention may be a three-dimensional measuring device, wherein when the measurement is performed, the three-dimensional measuring device or the stage loaded with the object to be tested is horizontally moved to obtain different horizontal positions. The height of the surface of the object to be tested. [0013] An example of an embodiment of the present invention may be a three-dimensional measuring device, wherein when measuring, the three-dimensional measuring device or the stage equipped with the object to be tested can be continuously moved and measured once. The entire surface of the object. [0014] An example of an embodiment of the present invention may be a three-dimensional measuring device, wherein the imaging system includes at least one of: a mirror group, a transmission mirror group, or a mirror composed of a mirror and a transmission mirror. group. [0015] An example of an embodiment of the present invention may be a three-dimensional measuring device in which the surface of the reflector is stepped. [0016] As such, the present invention has at least one or more of the following advantageous effects. Since the three-dimensional measuring device of the present invention has a tilting interference measuring surface, unlike the conventional white light interferometer, the three-dimensional measuring device or the stage must be vertically moved and can only be measured in stages, and the present invention only needs to move the three-dimensionally horizontally. The measuring device or the stage can be measured and thus a continuous measurement can be carried out without the need to measure the additional precise positioning system in a fractional manner. Further, even if the interference measuring surface of the three-dimensional measuring device of the present invention is inclined, the light irradiated to the object to be tested by the three-dimensional measuring device of the present invention is still parallel to the vertical direction, so that there is no problem of shadow or vignetting. Furthermore, the height resolution of the three-dimensional measuring device of the present invention can be determined by the number of pixels and the tilt angle of the interference measuring surface, and it is easy and low in cost to achieve high altitude resolution. Moreover, the three-dimensional measuring device of the present invention does not have to use a microscope system, and can also use a large-sized sensor used in a camera system, or a lens with a wider field of view, different types and magnifications, and even an imaging system can use a telecentric system. The cost of construction can be lower and the construction method is more diverse. Since the unrestricted imaging system of the present invention may be a mirror group, a transmission mirror group, or a mirror system consisting of a mirror and a transmission mirror, a transmission mirror group such as a common type of lens is usually designed for visible light, and a mirror is used. The light source of the group is more widely applicable, and therefore the light source for the three-dimensional measuring device of the present invention can use visible light or invisible light.
[0018] 以下,參照圖式對本發明的實施方式、實施例及例子進行說明。需要注意的是,本發明的實施方式、實施例及例子的詳細內容可變換為不同的形式而不脫離本發明的整體的範疇,故本發明不應僅單純限定於以下所述的實施方式、實施例及例子中,而應是亦包含不超出本發明的整體的範疇的合理的變化,且本發明的實施方式、實施例及例子可任意地合理組合。 [0019] 以下,參照圖2A、圖2B、圖2C、圖3A、圖3B、圖3C、圖4A、圖4B、圖4C、圖4D及圖4E詳細說明本發明的實施方式。 [0020] 圖2A為本發明的一實施方式的一例的三維量測裝置2001的結構的光路圖,其中光路2000以粗直線表示。參照圖2A,本發明的一實施方式的一個例子可為一種三維量測裝置2001,包含:光源2002、分光器2003、反射器2004、感測器2005、成像系統2006。分光器2003相對於水平方向(x-y方向,於圖2A中y方向平行於入紙面方向,且於圖2A中示意地顯示以相對於x方向傾斜的例子)傾斜第一角度θ1。反射器2004的表面對應參考面2010(此參考面2010為虛擬面,以虛線表示),參考面2010相對於垂直方向(z方向)傾斜第二角度θ2。感測器2005的表面對應成像面2011(此成像面2011為虛擬面,以虛線表示),成像面2011相對於水平方向傾斜第三角度θ3或與水平方向平行。成像系統2006位於分光器2003和感測器2005之間,其中,三維量測裝置2001具有干涉量測面2012(此干涉量測面2012為虛擬面,以虛線表示,其指當待測物於干涉量測面2012處,感測器2005得到對應的最大干涉強度),干涉量測面2012相對於水平方向傾斜第四角度θ4。於水平方向分光器2003在光源2002及參考面2010之間,且於垂直方向分光器2003在成像面2011及干涉量測面2012之間。分光器2003上的任意點到參考面2010的在水平方向的距離d1等於分光器2003上的此點到干涉量測面2012的在垂直方向的距離d2。當進行量測時,三維量測裝置2001往待測物照射的光平行於垂直方向。 [0021] 注意,此圖2A僅為示意性的光路圖,光路圖包含成像、照明與干涉系統的光路,實際的光路圖可能依這三個系統的不同型式而調整。或是,當其它光學元件額外設置於光路間時,光路會有所不同。只要符合本發明的精神的光路設置,皆落入本發明的範圍。於本發明的一個例子,甚至成像系統2006及用於干涉的分光器2003的位置亦可隨需要而設置於光路間的其它位置。 [0022] 本發明的一實施方式的一例子可為一種三維量測裝置2001,其中,反射器2004及感測器2005可轉動,使得第二角度θ2及第三角度θ3可依第四角度θ4的需求而調整。如此,可調整高度的量測範圍及解析度,並同時得到清楚的表面成像與干涉強度。 [0023] 本發明的一實施方式的一例子可為一種三維量測裝置2001,其中,當進行量測時,若待測物的表面的高度與干涉量測面2012一致,感測器2005測得最大干涉強度。亦即,若「從光源2002發出的光透射分光器2003到達反射器2004,接著在反射器2004反射後到達分光器2003,且再由分光器2003反射後到達感測器2005的光程」等於「從光源2002發出的光在分光器2003反射後到達干涉量測面2012,而此處的干涉量測面2012與待測物此處的表面一致,接著從待測物此處的表面反射到達分光器2003,且再透射分光器2003到達感測器2005的光程」時,感測器2005測得最大干涉強度。 [0024] 圖2B為圖2A的三維量測裝置2001的一例的進一步說明的光路圖,其各元件編號與圖2A相同,為了避免過度複雜造成混淆,部分重複的元件不再標示。本發明的一實施方式的一例子的三維量測裝置2001中,成像面2011因成像系統2006會對應一物面2013(此物面2013為虛擬面,以虛線表示,於圖2B顯示物面2013與干涉量測面2012一致的一例),亦即當待測物在物面2013上時,於成像面2011會得到最清楚的成像。本發明的一實施方式的一例子可為一種三維量測裝置2001,其中,第三角度θ3與第四角度θ4的設置使得成像面2011與物面2013符合莎姆定律(Scheimpflug Principle)且物面2013與干涉量測面2012重合,如此,最大干涉強度之處與成像最清楚之處一致,因而可在得到最清楚的量測表面成像的同時得到最大干涉強度。 [0025] 圖2C為圖2A的三維量測裝置2001的一例的進一步說明的光路圖,其各元件編號與圖2A相同,為了避免過度複雜造成混淆,部分重複的元件不再標示。本發明的一實施方式的一例子可為一種三維量測裝置2001,當成像系統2006及感測器2005提供足夠的景深時,成像面2011的傾斜可與理想有差異,或是沒有傾斜,仍可獲得成像,但需犧牲部分的成像品質。亦即,此時物面2013與干涉量測面2012不重合,故最大干涉強度之處與成像最清楚之處不一致,當成像系統2006及感測器2005提供足夠的景深時,雖需犧牲部分的成像品質,感測器2005仍可看到最大干涉的成像。圖2C為當成像面2011沒有傾斜時,亦即當成像面2011與水平方向平行時的一個例子。此時物面2013與干涉量測面2012不重合,故需由成像系統2006及感測器2005提供足夠的景深以達成高度量測。 [0026] 參照圖2A,本發明的一實施方式的一例子可為一種三維量測裝置2001,其中,成像系統2006例如可至少包含以下的其中之一:反射鏡組、透射鏡組、或由反射鏡和透射鏡組成的鏡組。本發明的一實施方式的一例子,光源2002的光譜寬幅影響發生干涉的範圍。當干涉範圍窄,三維量測裝置2001可以更準確判斷物體表面高度位置。 [0027] 圖3A為圖2A的三維量測裝置2001的一例的進一步說明圖,其各元件編號與圖2A相同,為了避免過度複雜造成混淆,部分重複的元件不再標示。圖3B為圖3A的三維量測裝置2001的感測器2005的一例的進一步說明圖。圖3C為圖3A的三維量測裝置2001的反射器2004的一例的進一步說明圖。 [0028] 參照圖3A及圖3B,本發明的一實施方式的一例子可為一種三維量測裝置2001,其中,感測器2005係面感測器3005,面感測器3005包含像素陣列,其中,干涉量測面2012包含對應像素陣列的對應列的用於量測不同高度的多個量測線3012(此量測線3012為平行於入紙面方向的虛擬的線,在圖3A的截面中僅為一點,以圓圈及點表示),其中,當進行量測時,若待測物的表面的高度與量測線3012一致,感測器2005的像素陣列2025中的對應的像素Px測得最大干涉強度。面感測器3005例如可為長方形或正方形的二維像素陣列。 [0029] 參照圖3A,本發明的高度解析度h1受像素數影響,其中,像素數=感測器尺寸s1/像素尺寸s2,當像素數越多,高度解析度h1越小,即高度解析度越高。又,本發明的高度量測範圍h2受第四角度θ4(請參照圖2A)影響,當第四角度θ4越大,高度量測範圍h2越大。而本發明的高度解析度h1亦受第四角度θ4影響,當第四角度θ4越小,高度解析度h1越小,即高度解析度越高。如此,由像素數、傾斜角的調整即可得到想要的高度解析度h1及高度量測範圍h2。 [0030] 參照圖3A及圖3C,本發明的一實施方式的一例子可為一種三維量測裝置2001,其中,反射器2004的表面使得從光源2002發出且穿透分光器2003的光在照射反射器2004時能有部分反射光平行於從光源2002發出且穿透分光器2003的光。 [0031] 參照圖3C,本發明的一實施方式的一例子可為一種三維量測裝置2001,其中,反射器2004的表面為階梯狀,使得對於反射器2004的表面的入射光與反射光平行。本發明的一實施方式的一例子,反射器2004的表面具有閃耀光柵(Blazed grating)結構。 [0032] 本發明的一實施方式的一例子可為一種三維量測裝置2001,其中,反射器2004可更換,可依第二角度θ2的範圍的不同而使用具有不同結構的表面,如此,可得到更好的反射效果。於一例子,反射器2004可依第四角度θ4的範圍的需求不同而使用具有不同結構的表面,如此,干涉量測面2012得以與物面2013一致。 [0033] 圖4A、圖4B及圖4C為當進行量測時的圖2A的三維量測裝置2001的一例的示意說明圖。圖4D為待測物4007的表面的高度分布的量測結果的一例的示意圖。圖4E為干涉強度I對光程差D的一例的圖。其各元件編號與圖2A及圖3A相同,為了避免過度複雜造成混淆,部分重複的元件不再標示。 [0034] 參照圖4A、圖4B、圖4C及圖4D,本發明的一實施方式的一例子可為一種三維量測裝置2001,其中,當進行量測時,三維量測裝置2001或裝有待測物4007的載台水平移動而可得到不同水平位置上的待測物4007的表面的高度。參照圖4A,水平移動來讓像素P1至P6進行量測,當三維量測裝置2001與待測物4007的水平位置移動到圖4A的情況,高度與干涉量測面2012的量測線3012一致處的待測物4007的表面處,只會在對應的像素P1測得最大干涉強度,而像素P2、P3、P4、P5及P6在此表面處測得的干涉強度非最大,故可得待測物4007的此處表面的高度為由像素P1對應的高度H1。注意,像素Px對應的方式會依成像系統2006而不同,於此所示的為成像系統2006使光路上下左右顛倒的一例。參照圖4B,當三維量測裝置2001與待測物4007的水平位置移動到圖4B的情況,高度與干涉量測面2012的量測線3012一致處的待測物4007的表面處,只會在對應的像素P3測得最大干涉強度,而像素P1、P2、P4、P5及P6在此表面處測得的干涉強度非最大,故可得待測物4007的此處表面的高度為由像素P3對應的高度H3。參照圖4C,當三維量測裝置2001與待測物的水平位置移動到圖4C的情況,於待測物4007的表面的高度與干涉量測面2012的量測線3012一致的三處,這三個表面位置會分別在對應的像素P1、P2及P3測得最大干涉強度,故可得待測物4007的此三處表面的高度為由像素P1、P2及P3對應的高度H1、H2及H3。參照圖4D,分析每個位置測得最大干涉強度對應的像素所對應的高度H1、H2、H3、H4,即可建立每個位置的高度分布,而得到待測物4007表面的三維形貌。 [0035] 於圖4E中,橫軸為光程差D且縱軸為干涉強度I。於此,定義光程差D等於「從光源2002發出的光透射分光器2003到達反射器2004,接著在反射器2004反射後到達分光器2003,且再由分光器2003反射後到達感測器2005的光程」減去「從光源2002發出的光在分光器2003反射後到達待測物4007表面的特定處,接著從待測物4007此特定處的表面反射到達分光器2003,且再透射分光器2003到達感測器2005的光程」,亦即,光程差D等於「從分光器2003到干涉量測面2012的距離」減去「從分光器2003到待測物4007的表面的特定處的距離」。干涉圖案強度的變化隨光程差D的不同有所不同,當光程差D為0時,干涉強度I有最大的干涉強度發生。 [0036] 本發明的一實施方式的一例子可為一種三維量測裝置2001,其中,當進行量測時,三維量測裝置2001或裝有待測物4007的載台可連續移動而一次量測待測物4007的整個表面。例如,可連續移動而一次量測完整的晶圓的表面。 [0037] 如此,本發明的以上的實施方式的例子的一者或多者至少具有以下的有利功效的一者或多者。因本發明的三維量測裝置2001具有傾斜的干涉量測面2012,因此,不像傳統的白光干涉儀必須垂直移動三維量測裝置或載台而只能分次量測,本發明只需水平移動三維量測裝置2001或載台即可進行量測,且因此可進行連續的量測,而不需要分次量測額外要求的精準定位系統。又,即使本發明的三維量測裝置2001的干涉量測面2012是傾斜的,本發明的三維量測裝置2001往待測物照射的光仍平行於垂直方向,因此不會有陰影或暗角的問題。再者,本發明的三維量測裝置2001的高度解析度h1可由像素數及干涉量測面2012的傾斜角決定,要達成小的高度解析度h1很容易且成本低。又,本發明的三維量測裝置2001不一定要用顯微鏡系統,且亦可使用照相機系統所用的大尺寸感測器、或視野更廣、不同種類與倍率的鏡頭,甚至是成像系統可使用遠心系統,其建置成本可較低且建置方式較多元。因為本發明的三維量測裝置2001不受限成像系統2006可為反射鏡組、透射鏡組、或由反射鏡和透射鏡組成的鏡組系統,透射鏡組例如常見的各類鏡頭通常設計給可見光,而使用反射鏡組的光源適用範圍更廣,因此本發明的三維量測裝置2001用的光源2002可使用可見光或不可見光。[0018] Hereinafter, embodiments, examples, and examples of the present invention will be described with reference to the drawings. It is to be noted that the details of the embodiments, examples, and examples of the present invention can be changed to different forms without departing from the scope of the invention as a whole. The embodiment and the examples are intended to include a reasonable change without departing from the scope of the invention, and the embodiments, examples and examples of the invention may be arbitrarily combined as appropriate. [0019] Hereinafter, embodiments of the present invention will be described in detail with reference to FIGS. 2A, 2B, 2C, 3A, 3B, 3C, 4A, 4B, 4C, 4D, and 4E. 2A is an optical path diagram showing a configuration of a three-dimensional measuring device 2001 according to an embodiment of the present invention, in which the optical path 2000 is indicated by a thick line. Referring to FIG. 2A, an example of an embodiment of the present invention may be a three-dimensional measuring device 2001, including: a light source 2002, a beam splitter 2003, a reflector 2004, a sensor 2005, and an imaging system 2006. The spectroscope 2003 is inclined at a first angle θ1 with respect to the horizontal direction (the x-y direction, the y direction is parallel to the paper-input direction in FIG. 2A, and the example of tilting with respect to the x direction is schematically shown in FIG. 2A). The surface of the reflector 2004 corresponds to the reference plane 2010 (this reference plane 2010 is a virtual plane, indicated by a broken line), and the reference plane 2010 is inclined by a second angle θ2 with respect to the vertical direction (z direction). The surface of the sensor 2005 corresponds to the imaging surface 2011 (this imaging surface 2011 is a virtual surface, indicated by a broken line), and the imaging surface 2011 is inclined by a third angle θ3 with respect to the horizontal direction or parallel to the horizontal direction. The imaging system 2006 is located between the beam splitter 2003 and the sensor 2005, wherein the three-dimensional measuring device 2001 has an interference measuring surface 2012 (this interference measuring surface 2012 is a virtual surface, indicated by a broken line, which refers to when the object to be tested is At the interference measurement surface 2012, the sensor 2005 obtains a corresponding maximum interference intensity), and the interference measurement surface 2012 is inclined by a fourth angle θ4 with respect to the horizontal direction. The horizontal direction beam splitter 2003 is between the light source 2002 and the reference plane 2010, and the vertical direction beam splitter 2003 is between the imaging plane 2011 and the interference measurement plane 2012. The distance d1 in the horizontal direction from any point on the spectroscope 2003 to the reference plane 2010 is equal to the distance d2 from the point on the beam splitter 2003 to the interference measurement plane 2012 in the vertical direction. When the measurement is performed, the light irradiated by the three-dimensional measuring device 2001 toward the object to be tested is parallel to the vertical direction. [0021] Note that this FIG. 2A is only a schematic optical path diagram, and the optical path diagram includes optical paths of imaging, illumination, and interference systems, and the actual optical path diagram may be adjusted according to different types of the three systems. Or, when other optical components are additionally placed between the optical paths, the optical path will be different. It is within the scope of the invention to provide an optical path arrangement that conforms to the spirit of the present invention. In one example of the present invention, even the position of imaging system 2006 and beam splitter 2003 for interference may be placed at other locations between the optical paths as needed. [0022] An example of an embodiment of the present invention may be a three-dimensional measuring device 2001, wherein the reflector 2004 and the sensor 2005 are rotatable such that the second angle θ2 and the third angle θ3 are according to the fourth angle θ4 Adjusted for the needs. In this way, the measurement range and resolution of the height can be adjusted, and at the same time, clear surface imaging and interference intensity can be obtained. An example of an embodiment of the present invention may be a three-dimensional measuring device 2001, wherein when the measurement is performed, if the height of the surface of the object to be tested coincides with the interference measuring surface 2012, the sensor 2005 measures The maximum interference intensity is obtained. That is, if "the light transmitted from the light source 2002 passes through the beam splitter 2003 to the reflector 2004, then reaches the beam splitter 2003 after being reflected by the reflector 2004, and is reflected by the beam splitter 2003 and reaches the optical path of the sensor 2005" equals "The light emitted from the light source 2002 is reflected by the beam splitter 2003 and reaches the interference measuring surface 2012, where the interference measuring surface 2012 coincides with the surface of the object to be tested, and then reaches from the surface of the object to be tested. When the beam splitter 2003, and the re-transmission beam splitter 2003 reaches the optical path of the sensor 2005, the sensor 2005 measures the maximum interference intensity. 2B is an optical path diagram further illustrating an example of the three-dimensional measuring device 2001 of FIG. 2A, the component numbers of which are the same as those of FIG. 2A, and partially repeated components are not labeled to avoid confusion due to excessive complexity. In the three-dimensional measuring device 2001 of an example of an embodiment of the present invention, the imaging surface 2011 corresponds to an object surface 2013 by the imaging system 2006 (this object surface 2013 is a virtual surface, indicated by a broken line, and the object surface 2013 is shown in FIG. 2B). An example consistent with the interference measurement surface 2012, that is, when the object to be tested is on the object surface 2013, the most clear imaging is obtained on the imaging surface 2011. An example of an embodiment of the present invention may be a three-dimensional measuring device 2001, wherein the third angle θ3 and the fourth angle θ4 are set such that the imaging surface 2011 and the object surface 2013 conform to the Scheimpflug Principle and the object surface 2013 coincides with the interferometric measuring surface 2012. Thus, the maximum interference intensity is consistent with the most obvious imaging, so that the maximum interference intensity can be obtained while obtaining the most clear measurement surface imaging. 2C is a light path diagram further illustrating an example of the three-dimensional measuring device 2001 of FIG. 2A, the component numbers of which are the same as those of FIG. 2A, and partially repeated components are not labeled to avoid confusion due to excessive complexity. An example of an embodiment of the present invention may be a three-dimensional measuring device 2001. When the imaging system 2006 and the sensor 2005 provide sufficient depth of field, the tilt of the imaging surface 2011 may be different from the ideal, or may not be tilted. Imaging is available, but some of the imaging quality is sacrificed. That is, at this time, the object surface 2013 does not coincide with the interference measurement surface 2012, so the maximum interference intensity is inconsistent with the most obvious image. When the imaging system 2006 and the sensor 2005 provide sufficient depth of field, the sacrifice portion is required. The imaging quality, sensor 2005 can still see the imaging of maximum interference. 2C is an example when the imaging plane 2011 is not tilted, that is, when the imaging plane 2011 is parallel to the horizontal direction. At this time, the object surface 2013 does not coincide with the interference measurement surface 2012, so it is necessary to provide sufficient depth of field by the imaging system 2006 and the sensor 2005 to achieve height measurement. Referring to FIG. 2A, an example of an embodiment of the present invention may be a three-dimensional measuring device 2001, wherein the imaging system 2006 may include, for example, at least one of the following: a mirror group, a transmission lens group, or A mirror consisting of a mirror and a mirror. In an example of an embodiment of the present invention, the spectral width of the light source 2002 affects the range in which interference occurs. When the interference range is narrow, the three-dimensional measuring device 2001 can more accurately determine the height position of the surface of the object. 3A is a further explanatory diagram of an example of the three-dimensional measuring device 2001 of FIG. 2A, wherein the component numbers are the same as those of FIG. 2A, and partially repeated components are not labeled to avoid confusion due to excessive complexity. FIG. 3B is a further explanatory diagram of an example of the sensor 2005 of the three-dimensional measuring device 2001 of FIG. 3A. FIG. 3C is a further explanatory diagram of an example of the reflector 2004 of the three-dimensional measuring device 2001 of FIG. 3A. [0028] Referring to FIG. 3A and FIG. 3B, an example of an embodiment of the present invention may be a three-dimensional measuring device 2001, wherein the sensor 2005 is a surface sensor 3005, and the surface sensor 3005 includes a pixel array. The interference measurement surface 2012 includes a plurality of measurement lines 3012 for measuring different heights corresponding to corresponding columns of the pixel array (this measurement line 3012 is a virtual line parallel to the paper-feeding direction, and the cross section in FIG. 3A Only one point is represented by a circle and a dot), wherein when the measurement is performed, if the height of the surface of the object to be tested coincides with the measurement line 3012, the corresponding pixel Px in the pixel array 2025 of the sensor 2005 is measured. The maximum interference intensity is obtained. The surface sensor 3005 can be, for example, a rectangular or square two-dimensional array of pixels. Referring to FIG. 3A, the height resolution h1 of the present invention is affected by the number of pixels, wherein the number of pixels=the sensor size s1/the pixel size s2, and the larger the number of pixels, the smaller the height resolution h1, that is, the height resolution. The higher the degree. Further, the height measurement range h2 of the present invention is affected by the fourth angle θ4 (please refer to FIG. 2A), and the height measurement range h2 is larger as the fourth angle θ4 is larger. The height resolution h1 of the present invention is also affected by the fourth angle θ4. When the fourth angle θ4 is smaller, the height resolution h1 is smaller, that is, the height resolution is higher. Thus, the desired height resolution h1 and height measurement range h2 can be obtained by adjusting the number of pixels and the tilt angle. 3A and 3C, an example of an embodiment of the present invention may be a three-dimensional measuring device 2001, wherein the surface of the reflector 2004 causes light emitted from the light source 2002 and penetrating the beam splitter 2003 to be illuminated. The reflector 2004 can have partially reflected light parallel to the light emitted from the source 2002 and penetrating the beam splitter 2003. Referring to FIG. 3C, an example of an embodiment of the present invention may be a three-dimensional measuring device 2001, wherein the surface of the reflector 2004 is stepped such that incident light to the surface of the reflector 2004 is parallel to the reflected light. . In an embodiment of an embodiment of the invention, the surface of the reflector 2004 has a Blazed grating structure. [0032] An example of an embodiment of the present invention may be a three-dimensional measuring device 2001, wherein the reflector 2004 is replaceable, and a surface having a different structure may be used depending on a range of the second angle θ2. Get better reflection. In one example, the reflector 2004 may use surfaces having different configurations depending on the requirements of the range of the fourth angle θ4, such that the interference measurement surface 2012 is consistent with the object plane 2013. 4A, 4B, and 4C are schematic explanatory views of an example of the three-dimensional measuring device 2001 of FIG. 2A when the measurement is performed. FIG. 4D is a schematic diagram showing an example of measurement results of the height distribution of the surface of the test object 4007. 4E is a view showing an example of the interference intensity I versus the optical path difference D. The component numbers are the same as those of FIG. 2A and FIG. 3A. In order to avoid confusion due to excessive complexity, partially repeated components are no longer labeled. 4A, 4B, 4C, and 4D, an example of an embodiment of the present invention may be a three-dimensional measuring device 2001, wherein when measuring, the three-dimensional measuring device 2001 or The stage of the object to be tested 4007 is horizontally moved to obtain the height of the surface of the object to be tested 4007 at different horizontal positions. Referring to FIG. 4A, the pixels P1 to P6 are horizontally moved to measure, and when the horizontal position of the three-dimensional measuring device 2001 and the object to be tested 4007 is moved to the case of FIG. 4A, the height is consistent with the measuring line 3012 of the interference measuring surface 2012. At the surface of the object to be tested 4007, only the maximum interference intensity is measured at the corresponding pixel P1, and the interference intensity measured at the surface of the pixels P2, P3, P4, P5 and P6 is not the largest, so it can be obtained The height of the surface of the object 4007 here is the height H1 corresponding to the pixel P1. Note that the manner in which the pixels Px correspond will vary depending on the imaging system 2006, and the example shown here is an example in which the imaging system 2006 reverses the light path up and down. Referring to FIG. 4B, when the horizontal position of the three-dimensional measuring device 2001 and the object to be tested 4007 is moved to the case of FIG. 4B, the height is only at the surface of the object to be tested 4007 at which the measuring line 3012 of the interference measuring surface 2012 coincides. The maximum interference intensity is measured at the corresponding pixel P3, and the interference intensity measured at the surface of the pixels P1, P2, P4, P5, and P6 is not the largest, so that the height of the surface of the object to be tested 4007 is determined by the pixel. The height H3 corresponding to P3. Referring to FIG. 4C, when the horizontal position of the three-dimensional measuring device 2001 and the object to be tested is moved to the case of FIG. 4C, the height of the surface of the object to be tested 4007 is coincident with the measuring line 3012 of the interference measuring surface 2012, which The three surface positions respectively measure the maximum interference intensity at the corresponding pixels P1, P2, and P3, so that the heights of the three surfaces of the object to be tested 4007 are the heights H1 and H2 corresponding to the pixels P1, P2, and P3. H3. Referring to FIG. 4D, the heights H1, H2, H3, and H4 corresponding to the pixels corresponding to the maximum interference intensity measured at each position are analyzed, and the height distribution of each position is established, and the three-dimensional shape of the surface of the object to be tested 4007 is obtained. [0035] In FIG. 4E, the horizontal axis represents the optical path difference D and the vertical axis represents the interference intensity I. Here, the optical path difference D is defined to be equal to "the light transmitted from the light source 2002 passes through the beam splitter 2003 to the reflector 2004, then reaches the beam splitter 2003 after being reflected by the reflector 2004, and is reflected by the beam splitter 2003 to reach the sensor 2005. Subtracting "the light emitted from the light source 2002 reaches the specific surface of the surface of the object to be tested 4007 after being reflected by the spectroscope 2003, and then reflects from the surface of the object to be tested 4007 to the spectroscope 2003, and transmits the spectroscopic light again. The device 2003 reaches the optical path of the sensor 2005, that is, the optical path difference D is equal to "the distance from the spectroscope 2003 to the interference measuring surface 2012" minus the "specificity from the spectroscope 2003 to the surface of the object to be tested 4007". The distance." The change in the intensity of the interference pattern varies depending on the optical path difference D. When the optical path difference D is 0, the interference intensity I has the largest interference intensity. An example of an embodiment of the present invention may be a three-dimensional measuring device 2001, wherein when the measurement is performed, the three-dimensional measuring device 2001 or the stage containing the object to be tested 4007 can be continuously moved while being measured. The entire surface of the test object 4007 is measured. For example, the surface of a complete wafer can be measured in one continuous motion. [0037] As such, one or more of the examples of the above embodiments of the present invention have at least one or more of the following advantageous effects. Since the three-dimensional measuring device 2001 of the present invention has a tilted interference measuring surface 2012, unlike the conventional white light interferometer, which has to vertically move the three-dimensional measuring device or the stage and can only measure in fractions, the present invention only needs to be horizontal. The mobile three-dimensional measuring device 2001 or the stage can be measured, and thus continuous measurement can be performed without the need to measure the additional required precise positioning system in stages. Moreover, even if the interference measuring surface 2012 of the three-dimensional measuring device 2001 of the present invention is inclined, the light irradiated by the three-dimensional measuring device 2001 of the present invention toward the object to be tested is still parallel to the vertical direction, so that there is no shadow or a vignetting angle. The problem. Furthermore, the height resolution h1 of the three-dimensional measuring device 2001 of the present invention can be determined by the number of pixels and the tilt angle of the interference measuring surface 2012, and it is easy and low in cost to achieve a small height resolution h1. Moreover, the three-dimensional measuring device 2001 of the present invention does not have to use a microscope system, and can also use a large-sized sensor used in a camera system, or a lens with a wider field of view, different types and magnifications, or even an imaging system can use telecentricity. The system can be built at a lower cost and more diverse. Since the three-dimensional measuring device 2001 of the present invention is not limited to the imaging system 2006, which may be a mirror group, a transmission mirror group, or a mirror system composed of a mirror and a transmission mirror, a transmission lens group such as a common type of lens is usually designed for Visible light, while the light source using the mirror group has a wider range of applications, so the light source 2002 for the three-dimensional measuring device 2001 of the present invention can use visible light or invisible light.
[0038][0038]
1000‧‧‧光路 1000‧‧‧Light path
1001‧‧‧傳統的白光干涉儀 1001‧‧‧Traditional white light interferometer
1002‧‧‧光源 1002‧‧‧Light source
1003‧‧‧分光器 1003‧‧‧ spectroscopy
1004‧‧‧反射鏡 1004‧‧‧Mirror
1005‧‧‧感測器 1005‧‧‧ sensor
1006‧‧‧成像系統 1006‧‧‧ imaging system
1007‧‧‧待測物 1007‧‧‧Test object
1012‧‧‧干涉量測面 1012‧‧‧Interference measuring surface
2000‧‧‧光路 2000‧‧‧Light path
2001‧‧‧三維量測裝置 2001‧‧‧3D measuring device
2002‧‧‧光源 2002‧‧‧Light source
2003‧‧‧分光器 2003‧‧‧ spectroscopy
2004‧‧‧反射器 2004‧‧‧ reflector
2005‧‧‧感測器 2005‧‧‧Sensor
2006‧‧‧成像系統 2006‧‧‧ imaging system
2010‧‧‧參考面 2010‧‧‧ reference surface
2011‧‧‧成像面 2011‧‧‧ imaging surface
2012‧‧‧干涉量測面 2012‧‧‧Interference measurement surface
2013‧‧‧物面 2013‧‧‧ ‧
3005‧‧‧面感測器 3005‧‧‧ face sensor
3012‧‧‧量測線 3012‧‧‧Measurement line
4007‧‧‧待測物 4007‧‧‧Test object
θ1‧‧‧第一角度 Θ1‧‧‧ first angle
θ2‧‧‧第二角度 Θ2‧‧‧second angle
θ3‧‧‧第三角度 Θ3‧‧‧ third angle
θ4‧‧‧第四角度 Θ4‧‧‧fourth angle
d1‧‧‧距離 D1‧‧‧ distance
d2‧‧‧距離 D2‧‧‧ distance
h1‧‧‧高度解析度 H1‧‧‧High resolution
h2‧‧‧高度量測範圍 H2‧‧‧ Height measurement range
s1‧‧‧感測器尺寸 S1‧‧‧Sensor size
s2‧‧‧像素尺寸 S2‧‧‧ pixel size
Px‧‧‧像素 Px‧‧ pixels
P1‧‧‧像素 P1‧‧ pixels
P2‧‧‧像素 P2‧‧ pixels
P3‧‧‧像素 P3‧‧ ‧ pixels
P4‧‧‧像素 P4‧‧ pixels
P5‧‧‧像素 P5‧‧ pixels
P6‧‧‧像素 P6‧‧ pixels
H1‧‧‧高度 H1‧‧‧ Height
H2‧‧‧高度 H2‧‧‧ Height
H3‧‧‧高度 H3‧‧‧ Height
H4‧‧‧高度 H4‧‧‧ Height
D‧‧‧光程差 D‧‧‧ optical path difference
I‧‧‧干涉強度 I‧‧‧ interference intensity
[0017] 圖1為傳統的白光干涉儀1001的結構的光路圖。 圖2A為本發明的一實施方式的一例的三維量測裝置2001的結構的光路圖。 圖2B為圖2A的三維量測裝置2001的一例的進一步說明的光路圖。 圖2C為圖2A的三維量測裝置2001的一例的進一步說明的光路圖。 圖3A為圖2A的三維量測裝置2001的一例的進一步說明圖。 圖3B為圖3A的三維量測裝置2001的一例的感測器2005的進一步說明圖。 圖3C為圖3A的三維量測裝置2001的反射器2004的一例的進一步說明圖。 圖4A、圖4B及圖4C為當進行量測時的圖2A的三維量測裝置2001的一例的示意說明圖。 圖4D為待測物4007的表面的高度分布的量測結果的一例的示意圖。 圖4E為干涉強度I對光程差D的一例的圖。1 is a light path diagram of a structure of a conventional white light interferometer 1001. 2A is an optical path diagram showing a configuration of a three-dimensional measuring device 2001 according to an example of an embodiment of the present invention. FIG. 2B is an optical path diagram further illustrating an example of the three-dimensional measuring device 2001 of FIG. 2A. FIG. 2C is an optical path diagram further illustrating an example of the three-dimensional measuring device 2001 of FIG. 2A. FIG. 3A is a further explanatory diagram of an example of the three-dimensional measuring device 2001 of FIG. 2A. FIG. 3B is a further explanatory diagram of the sensor 2005 of an example of the three-dimensional measuring device 2001 of FIG. 3A. FIG. 3C is a further explanatory diagram of an example of the reflector 2004 of the three-dimensional measuring device 2001 of FIG. 3A. 4A, 4B, and 4C are schematic explanatory views of an example of the three-dimensional measuring device 2001 of Fig. 2A when the measurement is performed. FIG. 4D is a schematic diagram showing an example of measurement results of the height distribution of the surface of the test object 4007. 4E is a view showing an example of the interference intensity I versus the optical path difference D.
Claims (10)
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| CN113639661A (en) * | 2021-08-11 | 2021-11-12 | 中国科学院长春光学精密机械与物理研究所 | Morphology detection system and morphology detection method |
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