TWI537674B - Mask mask film, mask mask and mask mask the use of the box - Google Patents
Mask mask film, mask mask and mask mask the use of the box Download PDFInfo
- Publication number
- TWI537674B TWI537674B TW103143952A TW103143952A TWI537674B TW I537674 B TWI537674 B TW I537674B TW 103143952 A TW103143952 A TW 103143952A TW 103143952 A TW103143952 A TW 103143952A TW I537674 B TWI537674 B TW I537674B
- Authority
- TW
- Taiwan
- Prior art keywords
- reticle
- film
- mask
- frame
- cover
- Prior art date
Links
- 239000010408 film Substances 0.000 claims description 279
- 239000013039 cover film Substances 0.000 claims description 41
- 239000000463 material Substances 0.000 claims description 38
- 230000001681 protective effect Effects 0.000 claims description 31
- 238000000034 method Methods 0.000 claims description 25
- 238000005452 bending Methods 0.000 claims description 12
- 229910052782 aluminium Inorganic materials 0.000 claims description 10
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 10
- 229910045601 alloy Inorganic materials 0.000 claims description 8
- 239000000956 alloy Substances 0.000 claims description 8
- 238000007789 sealing Methods 0.000 claims description 7
- 238000012545 processing Methods 0.000 claims description 3
- 239000000853 adhesive Substances 0.000 description 44
- 230000001070 adhesive effect Effects 0.000 description 43
- 230000037303 wrinkles Effects 0.000 description 24
- 238000011156 evaluation Methods 0.000 description 19
- 229920000642 polymer Polymers 0.000 description 17
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 16
- 230000015572 biosynthetic process Effects 0.000 description 12
- 230000000694 effects Effects 0.000 description 12
- 238000007689 inspection Methods 0.000 description 11
- 239000000758 substrate Substances 0.000 description 11
- 238000005259 measurement Methods 0.000 description 10
- 239000000243 solution Substances 0.000 description 9
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- 239000011737 fluorine Substances 0.000 description 8
- 229910052731 fluorine Inorganic materials 0.000 description 8
- 239000011521 glass Substances 0.000 description 8
- 238000004528 spin coating Methods 0.000 description 8
- 229910000838 Al alloy Inorganic materials 0.000 description 7
- 230000008859 change Effects 0.000 description 7
- 238000011161 development Methods 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 6
- 229920001971 elastomer Polymers 0.000 description 6
- -1 or the like Substances 0.000 description 6
- 239000003513 alkali Substances 0.000 description 5
- 239000004973 liquid crystal related substance Substances 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- 239000004831 Hot glue Substances 0.000 description 4
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 4
- 229910001315 Tool steel Inorganic materials 0.000 description 4
- 229920002678 cellulose Chemical class 0.000 description 4
- 238000004043 dyeing Methods 0.000 description 4
- 239000006260 foam Substances 0.000 description 4
- 239000011777 magnesium Substances 0.000 description 4
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 4
- 229920006357 Algoflon Polymers 0.000 description 3
- 229920008347 Cellulose acetate propionate Polymers 0.000 description 3
- 239000004809 Teflon Substances 0.000 description 3
- 229920006362 Teflon® Polymers 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 229920006217 cellulose acetate butyrate Polymers 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 229910052749 magnesium Inorganic materials 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
- 239000005020 polyethylene terephthalate Substances 0.000 description 3
- 229920002098 polyfluorene Polymers 0.000 description 3
- 229920000915 polyvinyl chloride Polymers 0.000 description 3
- 239000004800 polyvinyl chloride Substances 0.000 description 3
- 239000005361 soda-lime glass Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 239000000020 Nitrocellulose Substances 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 2
- XECAHXYUAAWDEL-UHFFFAOYSA-N acrylonitrile butadiene styrene Chemical compound C=CC=C.C=CC#N.C=CC1=CC=CC=C1 XECAHXYUAAWDEL-UHFFFAOYSA-N 0.000 description 2
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 2
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 239000001913 cellulose Chemical class 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000004040 coloring Methods 0.000 description 2
- 238000001723 curing Methods 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000010410 dusting Methods 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 229920002313 fluoropolymer Polymers 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 229920001220 nitrocellulos Polymers 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000012856 packing Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 229920001897 terpolymer Polymers 0.000 description 2
- 238000004506 ultrasonic cleaning Methods 0.000 description 2
- RLLPVAHGXHCWKJ-IEBWSBKVSA-N (3-phenoxyphenyl)methyl (1s,3s)-3-(2,2-dichloroethenyl)-2,2-dimethylcyclopropane-1-carboxylate Chemical compound CC1(C)[C@H](C=C(Cl)Cl)[C@@H]1C(=O)OCC1=CC=CC(OC=2C=CC=CC=2)=C1 RLLPVAHGXHCWKJ-IEBWSBKVSA-N 0.000 description 1
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000002313 adhesive film Substances 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- OYLGJCQECKOTOL-UHFFFAOYSA-L barium fluoride Chemical compound [F-].[F-].[Ba+2] OYLGJCQECKOTOL-UHFFFAOYSA-L 0.000 description 1
- 229910001632 barium fluoride Inorganic materials 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 229910001634 calcium fluoride Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000010962 carbon steel Substances 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000000635 electron micrograph Methods 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012943 hotmelt Substances 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 150000002505 iron Chemical class 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 239000010687 lubricating oil Substances 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008235388 | 2008-09-12 | ||
| JP2008235599 | 2008-09-12 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201510638A TW201510638A (zh) | 2015-03-16 |
| TWI537674B true TWI537674B (zh) | 2016-06-11 |
Family
ID=42005247
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW098130810A TWI497197B (zh) | 2008-09-12 | 2009-09-11 | Mask mask film, mask mask and mask mask the use of the box |
| TW103143952A TWI537674B (zh) | 2008-09-12 | 2009-09-11 | Mask mask film, mask mask and mask mask the use of the box |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW098130810A TWI497197B (zh) | 2008-09-12 | 2009-09-11 | Mask mask film, mask mask and mask mask the use of the box |
Country Status (5)
| Country | Link |
|---|---|
| JP (2) | JP4886070B2 (ja) |
| KR (2) | KR101287700B1 (ja) |
| CN (2) | CN102944973B (ja) |
| TW (2) | TWI497197B (ja) |
| WO (1) | WO2010029997A1 (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI797380B (zh) * | 2018-09-12 | 2023-04-01 | 美商福昌公司 | 用於平板顯示器光罩之護膜 |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI579145B (zh) * | 2010-04-13 | 2017-04-21 | 旭化成電子材料股份有限公司 | Self-supporting film, self-supporting structure, self-supporting film manufacturing method and protective film |
| JP5411200B2 (ja) * | 2011-04-26 | 2014-02-12 | 信越化学工業株式会社 | リソグラフィ用ペリクル |
| JP5746662B2 (ja) * | 2012-05-11 | 2015-07-08 | 信越化学工業株式会社 | ペリクルフレーム |
| JP5822401B2 (ja) * | 2012-12-25 | 2015-11-24 | 信越化学工業株式会社 | リソグラフィ用ペリクル |
| JP6008784B2 (ja) * | 2013-04-15 | 2016-10-19 | 信越化学工業株式会社 | ペリクルフレーム及びその製作方法とペリクル |
| JP6293041B2 (ja) * | 2014-12-01 | 2018-03-14 | 信越化学工業株式会社 | ペリクルフレームおよびこれを用いたペリクル |
| JP6491472B2 (ja) * | 2014-12-25 | 2019-03-27 | 日本特殊陶業株式会社 | ペリクル枠およびペリクル枠の製造方法 |
| TWI576657B (zh) * | 2014-12-25 | 2017-04-01 | 台灣積體電路製造股份有限公司 | 光罩清潔設備以及光罩清潔方法 |
| JP6460778B2 (ja) * | 2014-12-25 | 2019-01-30 | 日本特殊陶業株式会社 | ペリクル枠およびペリクル枠の製造方法 |
| KR102615131B1 (ko) * | 2015-02-03 | 2023-12-15 | 에이에스엠엘 네델란즈 비.브이. | 마스크 어셈블리 및 연관된 방법 |
| US9658526B2 (en) | 2015-06-30 | 2017-05-23 | Taiwan Semiconductor Manufacturing Company, Ltd. | Mask pellicle indicator for haze prevention |
| JP2017147292A (ja) * | 2016-02-16 | 2017-08-24 | レノボ・シンガポール・プライベート・リミテッド | 筐体用部材の製造方法 |
| JP2018049256A (ja) * | 2016-04-05 | 2018-03-29 | 旭化成株式会社 | ペリクル |
| US10007176B2 (en) | 2016-09-01 | 2018-06-26 | Taiwan Semiconductor Manufacturing Co., Ltd | Graphene pellicle for extreme ultraviolet lithography |
| JP6729233B2 (ja) * | 2016-09-20 | 2020-07-22 | 日本軽金属株式会社 | ペリクル用支持枠及びペリクル並びにその製造方法 |
| US10162258B2 (en) | 2016-12-15 | 2018-12-25 | Taiwan Semiconductor Manufacturing Co., Ltd. | Pellicle fabrication methods and structures thereof |
| TWI618975B (zh) * | 2016-12-28 | 2018-03-21 | Micro Lithography Inc | Photomask dustproof frame structure |
| JP6861596B2 (ja) * | 2017-08-07 | 2021-04-21 | 信越化学工業株式会社 | ペリクルフレーム及びペリクル |
| EP3764161A4 (en) * | 2018-03-05 | 2021-12-01 | Mitsui Chemicals, Inc. | PELLICLE, EXPOSURE MASTER, EXPOSURE DEVICE AND METHOD FOR MANUFACTURING A SEMICONDUCTOR COMPONENT |
| US11508592B2 (en) * | 2018-10-29 | 2022-11-22 | Gudeng Precision Industrial Co., Ltd | Reticle retaining system |
| JP7063962B2 (ja) * | 2020-09-23 | 2022-05-09 | 信越化学工業株式会社 | ペリクルフレーム及びペリクル |
| KR102868688B1 (ko) * | 2022-08-01 | 2025-10-13 | 주식회사 참그래핀 | 극자외선 노광공정의 포토마스크 보호용 펠리클 및 그 제조방법 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4007752B2 (ja) * | 1999-07-30 | 2007-11-14 | 旭化成エレクトロニクス株式会社 | 大型ペリクル用枠体及び大型ペリクル |
| JP4004188B2 (ja) * | 1999-07-30 | 2007-11-07 | 旭化成エレクトロニクス株式会社 | 大型ペリクル用枠体 |
| JP2001083691A (ja) * | 1999-09-13 | 2001-03-30 | Asahi Kasei Electronics Co Ltd | 無発塵ペリクル |
| JP4043232B2 (ja) * | 2001-01-26 | 2008-02-06 | 旭化成エレクトロニクス株式会社 | 大型ペリクル |
| JP4286194B2 (ja) * | 2004-08-18 | 2009-06-24 | 信越化学工業株式会社 | ペリクルフレーム、および該フレームを用いたフォトリソグラフィー用ペリクル |
| JP2006178434A (ja) * | 2004-11-25 | 2006-07-06 | Asahi Kasei Electronics Co Ltd | 大型ペリクル |
| JP2007328226A (ja) * | 2006-06-09 | 2007-12-20 | Shin Etsu Chem Co Ltd | ペリクル収納容器及びその製造方法 |
| JP2007333910A (ja) * | 2006-06-14 | 2007-12-27 | Shin Etsu Chem Co Ltd | ペリクル |
| CN101689018B (zh) * | 2007-07-06 | 2013-03-20 | 旭化成电子材料株式会社 | 大型表膜构件的框体及该框体的把持方法 |
| JP5051840B2 (ja) * | 2007-11-22 | 2012-10-17 | 信越化学工業株式会社 | ペリクル収納容器内にペリクルを保管する方法 |
-
2009
- 2009-09-11 TW TW098130810A patent/TWI497197B/zh active
- 2009-09-11 TW TW103143952A patent/TWI537674B/zh active
- 2009-09-11 JP JP2010528762A patent/JP4886070B2/ja active Active
- 2009-09-11 KR KR1020117004478A patent/KR101287700B1/ko active Active
- 2009-09-11 WO PCT/JP2009/065919 patent/WO2010029997A1/ja not_active Ceased
- 2009-09-11 CN CN201210410055.0A patent/CN102944973B/zh active Active
- 2009-09-11 CN CN200980133492.9A patent/CN102132210B/zh active Active
- 2009-09-11 KR KR1020137010747A patent/KR101390007B1/ko active Active
-
2011
- 2011-11-14 JP JP2011248866A patent/JP5284445B2/ja active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI797380B (zh) * | 2018-09-12 | 2023-04-01 | 美商福昌公司 | 用於平板顯示器光罩之護膜 |
| US12013642B2 (en) | 2018-09-12 | 2024-06-18 | Photronics, Inc. | Pellicle for flat panel display photomask |
| TWI857500B (zh) * | 2018-09-12 | 2024-10-01 | 美商福昌公司 | 製造光罩及平板顯示器之方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102944973B (zh) | 2015-01-21 |
| CN102944973A (zh) | 2013-02-27 |
| TWI497197B (zh) | 2015-08-21 |
| JP5284445B2 (ja) | 2013-09-11 |
| TW201510638A (zh) | 2015-03-16 |
| KR20110034032A (ko) | 2011-04-04 |
| JP4886070B2 (ja) | 2012-02-29 |
| KR101390007B1 (ko) | 2014-04-29 |
| KR20130049837A (ko) | 2013-05-14 |
| JPWO2010029997A1 (ja) | 2012-02-02 |
| WO2010029997A1 (ja) | 2010-03-18 |
| JP2012068667A (ja) | 2012-04-05 |
| TW201015213A (en) | 2010-04-16 |
| CN102132210B (zh) | 2013-01-23 |
| CN102132210A (zh) | 2011-07-20 |
| KR101287700B1 (ko) | 2013-07-24 |
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