TWI506755B - Light-emitting diode with positioning structure - Google Patents
Light-emitting diode with positioning structure Download PDFInfo
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- TWI506755B TWI506755B TW102134884A TW102134884A TWI506755B TW I506755 B TWI506755 B TW I506755B TW 102134884 A TW102134884 A TW 102134884A TW 102134884 A TW102134884 A TW 102134884A TW I506755 B TWI506755 B TW I506755B
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- emitting diode
- light
- alignment
- positioning structure
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- 239000000758 substrate Substances 0.000 claims description 19
- 238000005520 cutting process Methods 0.000 claims description 7
- 239000013078 crystal Substances 0.000 claims description 5
- 239000004065 semiconductor Substances 0.000 description 29
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 3
- PFNQVRZLDWYSCW-UHFFFAOYSA-N (fluoren-9-ylideneamino) n-naphthalen-1-ylcarbamate Chemical compound C12=CC=CC=C2C2=CC=CC=C2C1=NOC(=O)NC1=CC=CC2=CC=CC=C12 PFNQVRZLDWYSCW-UHFFFAOYSA-N 0.000 description 2
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 description 2
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 2
- GPXJNWSHGFTCBW-UHFFFAOYSA-N Indium phosphide Chemical compound [In]#P GPXJNWSHGFTCBW-UHFFFAOYSA-N 0.000 description 2
- FTWRSWRBSVXQPI-UHFFFAOYSA-N alumanylidynearsane;gallanylidynearsane Chemical compound [As]#[Al].[As]#[Ga] FTWRSWRBSVXQPI-UHFFFAOYSA-N 0.000 description 2
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 1
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- RNQKDQAVIXDKAG-UHFFFAOYSA-N aluminum gallium Chemical compound [Al].[Ga] RNQKDQAVIXDKAG-UHFFFAOYSA-N 0.000 description 1
- AJGDITRVXRPLBY-UHFFFAOYSA-N aluminum indium Chemical compound [Al].[In] AJGDITRVXRPLBY-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- HZXMRANICFIONG-UHFFFAOYSA-N gallium phosphide Chemical compound [Ga]#P HZXMRANICFIONG-UHFFFAOYSA-N 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Led Device Packages (AREA)
Description
本發明是有關於一種發光二極體,且特別是有關於一種具有定位結構的發光二極體。The present invention relates to a light-emitting diode, and more particularly to a light-emitting diode having a positioning structure.
傳統上,在形成磊晶層於成長基板前,光罩需要與成長基板上的對位結構對位。然而,對位結構係形成於發光二極體結構的定義區域內,導致單一化後的發光二極體結構只能以無效報廢。Conventionally, the photomask needs to be aligned with the alignment structure on the growth substrate before the epitaxial layer is formed on the growth substrate. However, the alignment structure is formed in a defined region of the structure of the light-emitting diode, resulting in the singularity of the light-emitting diode structure can only be invalidated.
本發明係有關於一種具有定位結構的發光二極體,可改善面積無效區的問題,降低報廢成本。The invention relates to a light-emitting diode with a positioning structure, which can improve the problem of the area ineffective area and reduce the scrapping cost.
根據本發明之一實施例,提出一種具有定位結構的發光二極體。發光二極體包括基板、數個發光二極體晶粒、數條切割道及至少一定位結構。發光二極體晶粒,該些發光二極體晶粒設置於該基板上。切割道區隔此些發光二極體晶粒。定位結構設置基板上且位於此些切割道的交會處。According to an embodiment of the invention, a light emitting diode having a positioning structure is proposed. The light emitting diode comprises a substrate, a plurality of light emitting diode grains, a plurality of cutting tracks and at least one positioning structure. Light-emitting diode crystal grains, wherein the light-emitting diode crystal grains are disposed on the substrate. The dicing streets are separated by such luminescent diode grains. The positioning structure is disposed on the substrate and at the intersection of the cutting lanes.
為了對本發明之上述及其他方面有更佳的瞭解,下 文特舉較佳實施例,並配合所附圖式,作詳細說明如下:In order to better understand the above and other aspects of the present invention, The preferred embodiment is described in detail with reference to the accompanying drawings.
100‧‧‧發光二極體100‧‧‧Lighting diode
110‧‧‧基板110‧‧‧Substrate
110u‧‧‧上表面110u‧‧‧ upper surface
120‧‧‧發光二極體晶粒120‧‧‧Light-emitting diode grains
121‧‧‧第一型半導體磊晶層121‧‧‧First type semiconductor epitaxial layer
122‧‧‧發光層122‧‧‧Lighting layer
123‧‧‧第二型半導體磊晶層123‧‧‧Second type semiconductor epitaxial layer
130‧‧‧切割道130‧‧‧ cutting road
140‧‧‧定位結構140‧‧‧ Positioning structure
141‧‧‧對位結構141‧‧‧ alignment structure
1411‧‧‧第一直線結構1411‧‧‧First straight line structure
1412‧‧‧第二直線結構1412‧‧‧Second straight line structure
142‧‧‧對位錨點142‧‧‧ alignment anchor
1421‧‧‧第一對位錨點1421‧‧‧First match anchor
1422‧‧‧第二對位錨點1422‧‧‧Second match anchor
1423‧‧‧第三對位錨點1423‧‧‧ third match anchor
1424‧‧‧第四對位錨點1424‧‧‧ fourth match anchor
143‧‧‧辨識記號143‧‧‧ Identification marks
144‧‧‧向性記號144‧‧‧ sexuality
1441‧‧‧第一向性記號1441‧‧‧First Signature
1442‧‧‧第二向性記號1442‧‧‧Secondary mark
1443‧‧‧第三向性記號1443‧‧‧Third-direction mark
1444‧‧‧第四向性記號1444‧‧‧4th directional mark
H1、H2‧‧‧高度H1, H2‧‧‧ height
第1A圖繪示依照本發明一實施例之具有定位結構之發光二極體的俯視圖。FIG. 1A is a top plan view of a light emitting diode having a positioning structure according to an embodiment of the invention.
第1B圖繪示第1A圖中沿方向1B-1B’的剖視圖。Fig. 1B is a cross-sectional view taken along line 1B-1B' in Fig. 1A.
第1C圖繪示第1A圖之定位結構之放大圖。FIG. 1C is an enlarged view showing the positioning structure of FIG. 1A.
第2圖繪示依照本發明另一實施例定位結構之俯視圖。2 is a top plan view of a positioning structure in accordance with another embodiment of the present invention.
請參照第1A及1B圖,第1A圖繪示依照本發明一實施例之具有定位結構之發光二極體的俯視圖,而第1B圖繪示第1A圖中沿方向1B-1B’的剖視圖。發光二極體100包括基板110、數個發光二極體晶粒120、數條切割道130及至少一定位結構140。Referring to FIGS. 1A and 1B, FIG. 1A is a plan view of a light-emitting diode having a positioning structure according to an embodiment of the present invention, and FIG. 1B is a cross-sectional view taken along line 1B-1B' of FIG. 1A. The light emitting diode 100 includes a substrate 110, a plurality of light emitting diode dies 120, a plurality of dicing streets 130, and at least one positioning structure 140.
發光二極體晶粒120形成於基板110之上表面110u上。切割道130區隔此些發光二極體晶粒120,亦即,發光二極體晶粒120透過切割道130而彼此隔離。在後續切割製程中,刀具經過切割道130而完全分離此些發光二極體晶粒120。發光二極體晶粒120包括依序形成於基板110之上表面110u的第一型半導體磊晶層121、發光層122及第二型半導體磊晶層123,其中發光層122位於第一型半導體磊晶層121與第二型半導體磊晶層123之間。The light emitting diode die 120 is formed on the upper surface 110u of the substrate 110. The dicing streets 130 are spaced apart from the luminescent diode dies 120, that is, the luminescent diode dies 120 are isolated from each other by the dicing streets 130. In a subsequent cutting process, the tool passes through the scribe line 130 to completely separate the light emitting diode dies 120. The light emitting diode die 120 includes a first type semiconductor epitaxial layer 121, a light emitting layer 122, and a second type semiconductor epitaxial layer 123 sequentially formed on the upper surface 110u of the substrate 110, wherein the light emitting layer 122 is located in the first type semiconductor The epitaxial layer 121 is between the epitaxial layer 121 and the second type semiconductor epitaxial layer 123.
第一型半導體磊晶層121例如是P型半導體層,而第二型半導體磊晶層123則為N型半導體層;或是,第一型半導體磊晶層121是N型半導體層,而第二型半導體磊晶層123則為P型半導體層。其中,P型半導體層例如是摻雜硼(B)、銦(In)、鎵(Ga)或鋁(Al)等三價元素之氮基半導體層,而N型半導體層例如是摻雜磷(P)、銻(Ti)、砷(As)等五價元素之氮基半導體層。發光層122可以是三五族二元素化合物半導體(例如是砷化鎵(GaAs)、磷化銦(InP)、磷化鎵(GaP)、氮化鎵(GaN))、三五族多元素化合物半導體(例如是砷化鋁鎵(AlGaAs)、磷砷化鎵(GaAsP)、磷化鋁鎵銦(AlGaInP)、砷化鋁銦鎵(AlInGaAs))或二六族二元素化合物半導體(例如是硒化鎘(CdSe)、硫化鎘(CdS)、硒化鋅(ZnSe))。The first type semiconductor epitaxial layer 121 is, for example, a P type semiconductor layer, and the second type semiconductor epitaxial layer 123 is an N type semiconductor layer; or the first type semiconductor epitaxial layer 121 is an N type semiconductor layer, and the first type The two-type semiconductor epitaxial layer 123 is a P-type semiconductor layer. Wherein, the P-type semiconductor layer is, for example, a nitrogen-based semiconductor layer doped with a trivalent element such as boron (B), indium (In), gallium (Ga) or aluminum (Al), and the N-type semiconductor layer is, for example, doped with phosphorus ( A nitrogen-based semiconductor layer of a pentavalent element such as P), ruthenium (Ti), or arsenic (As). The light-emitting layer 122 may be a three-five-group two-element compound semiconductor (for example, gallium arsenide (GaAs), indium phosphide (InP), gallium phosphide (GaP), gallium nitride (GaN)), and a tri-five multi-element compound. Semiconductor (for example, aluminum gallium arsenide (AlGaAs), gallium arsenide (GaAsP), aluminum gallium indium phosphide (AlGaInP), aluminum indium gallium arsenide (AlInGaAs)) or a group of two or six elemental compound semiconductors (for example, selenium) Cadmium (CdSe), cadmium sulfide (CdS), zinc selenide (ZnSe).
定位結構140用以與光罩(未繪示)對位。在光罩與發光二極體對位過程中,步進機驅動發光二極體100使其定位結構140與光罩上的定位結構(未繪示)對位,進而使光罩相對基板110定位於一曝光位置,以精確地形成第一型半導體磊晶層121、發光層122及第二型半導體磊晶層123於基板110的預定區域上。The positioning structure 140 is used to align with a photomask (not shown). During the alignment of the reticle and the illuminating diode, the stepper drives the illuminating diode 100 to align the positioning structure 140 with the positioning structure (not shown) on the reticle, thereby positioning the reticle relative to the substrate 110. The first type semiconductor epitaxial layer 121, the light emitting layer 122, and the second type semiconductor epitaxial layer 123 are formed on a predetermined region of the substrate 110 at an exposure position.
定位結構140形成於基板110之上表面110u上且位於此些切割道130的交會處。在後續切割製程中,刀具可切除掉定位結構140。由於定位結構140位於切割道130而不佔用發光二極體晶粒120的區域,故可改善面積無效區的問題,降低報廢成本。The positioning structure 140 is formed on the upper surface 110u of the substrate 110 and located at the intersection of the dicing streets 130. In a subsequent cutting process, the tool can cut away the positioning structure 140. Since the positioning structure 140 is located on the dicing street 130 without occupying the area of the illuminating diode die 120, the problem of the area ineffective area can be improved, and the scrapping cost can be reduced.
此外,定位結構140與發光二極體晶粒120可於同 一製程中形成,因而形成與發光二極體晶粒120相同磊晶層的結構,且定位結構140的高度H1與發光二極體晶粒120的高度H2大致上相同。詳細來說,定位結構140也包括第一型半導體磊晶層121、發光層122及第二型半導體磊晶層123,其中發光層122位於第一型半導體磊晶層121與第二型半導體磊晶層123之間。In addition, the positioning structure 140 and the LED die 120 can be the same The structure is formed in one process, thereby forming the same epitaxial layer as the light-emitting diode die 120, and the height H1 of the positioning structure 140 is substantially the same as the height H2 of the light-emitting diode die 120. In detail, the positioning structure 140 also includes a first type semiconductor epitaxial layer 121, a light emitting layer 122, and a second type semiconductor epitaxial layer 123, wherein the light emitting layer 122 is located in the first type semiconductor epitaxial layer 121 and the second type semiconductor stripe Between the layers 123.
定位結構140的數量可以是一個以上。當定位結構140的數量係二個時,可降低發光二極體100與光罩(未繪示)對位後在旋轉角度上的誤差。The number of positioning structures 140 may be one or more. When the number of the positioning structures 140 is two, the error in the rotation angle after the alignment of the LEDs 100 with the reticle (not shown) can be reduced.
請參照第1C圖,其繪示第1A圖之定位結構之放大圖。各定位結構140包括對位結構141、數個對位錨點142及辨識記號143。Please refer to FIG. 1C, which shows an enlarged view of the positioning structure of FIG. 1A. Each positioning structure 140 includes a registration structure 141, a plurality of alignment anchors 142, and an identification mark 143.
本實施例中,對位結構141包括第一直線結構1411及第二直線結構1412。第二直線結構1412與第一直線結構1411相交而構成一交叉結構,此結構可提升發光二極體100與光罩的對位精準度。第二直線結構1412與第一直線結構1411可正交或斜交。本實施例中,第二直線結構1412與第一直線結構1411正交而形成十字結構。相較於斜交,正交之第二直線結構1412與第一直線結構1411更可提升發光二極體100與光罩的對位精準度。另一實施例中,對位結構141之直線結構的數量不限於二個,其亦可包括二個以上的直線結構。In this embodiment, the alignment structure 141 includes a first linear structure 1411 and a second linear structure 1412. The second straight line structure 1412 intersects with the first straight line structure 1411 to form a cross structure, which improves the alignment accuracy of the light emitting diode 100 and the reticle. The second linear structure 1412 can be orthogonal or oblique to the first linear structure 1411. In this embodiment, the second linear structure 1412 is orthogonal to the first linear structure 1411 to form a cross structure. Compared with the skew, the orthogonal second linear structure 1412 and the first linear structure 1411 can improve the alignment accuracy of the LED and the reticle. In another embodiment, the number of linear structures of the alignment structure 141 is not limited to two, and may include two or more linear structures.
各對位錨點142設置於對位結構141之端部。透過 對位錨點142與光罩上之定位結構的雙重確認,更可提升發光二極體100與光罩的對位精準度。進一步地說,透過對位錨點142的形狀辨識,可影像上灰階變異程度,減少對位上的誤判。本實施例中,對位錨點142包括第一對位錨點1421、第二對位錨點1422、第三對位錨點1423及第四對位錨點1424,其中第一對位錨點1421與第二對位錨點1422分別形成於第一直線結構1411的相對二端,而第三對位錨點1423與第四對位錨點1424分別形成於第二直線結構1412的相對二端。第一對位錨點1421、第二對位錨點1422、第三對位錨點1423與第四對位錨點1424之任一者的形狀為封閉環狀或數字,其中環形例如是圓形、橢圓形或多邊形。Each of the alignment anchors 142 is disposed at an end of the alignment structure 141. Through The double confirmation of the alignment anchor 142 and the positioning structure on the reticle can improve the alignment accuracy of the illuminating diode 100 and the reticle. Further, through the shape recognition of the alignment anchor 142, the degree of grayscale variation can be imaged, and the misjudgment in the alignment is reduced. In this embodiment, the align anchor point 142 includes a first align anchor point 1421, a second align anchor point 1422, a third align anchor point 1423, and a fourth align anchor point 1424, wherein the first align anchor point 1421 and second alignment anchors 1422 are respectively formed at opposite ends of the first linear structure 1411, and third alignment anchors 1423 and fourth alignment anchors 1424 are respectively formed at opposite ends of the second linear structure 1412. The shape of any one of the first registration anchor 1421, the second alignment anchor 1422, the third alignment anchor 1423, and the fourth alignment anchor 1424 is a closed loop or a number, wherein the ring is, for example, a circle , oval or polygonal.
辨識記號143形成於基板110之上表面110u上且鄰近於對位錨點142、第一直線結構1411或第二直線結構1412。本實施例中,各對位錨點142的形狀相同,在此設計下,各定位結構140之辨識記號143的形狀或符號可不同,使各定位結構140透過辨識記號143而提供不同的定位資訊。進一步地說,當步進機搜尋到一對位結構141後,可透過辨識記號143所提供的定位資訊,驅動基板110之該對位結構141與光罩上之預設的對位結構進行對位。另一實施例中,各定位結構140的對位錨點142的形狀係相異,使各定位結構140透過相異的對位錨點142而提供不同的定位資訊;在此設計下,可選擇性地省略辨識記號143。The identification mark 143 is formed on the upper surface 110u of the substrate 110 and adjacent to the alignment anchor 142, the first linear structure 1411, or the second linear structure 1412. In this embodiment, the shape of each of the alignment anchors 142 is the same. In this design, the shape or symbol of the identification marks 143 of the positioning structures 140 may be different, so that the positioning structures 140 provide different positioning information through the identification marks 143. . Further, when the stepper searches for a pair of bit structures 141, the alignment structure provided by the identification mark 143 can be used to drive the alignment structure 141 of the substrate 110 and the preset alignment structure on the mask. Bit. In another embodiment, the shape of the alignment anchors 142 of the positioning structures 140 are different, so that the positioning structures 140 provide different positioning information through the different alignment anchors 142; The identification mark 143 is omitted.
請參照第2圖,其繪示依照本發明另一實施例定位結構之俯視圖。本實施例中,定位結構140更包括數個向性記號144,其分別鄰近第一對位錨點1421與第二對位錨點1422形成。此些向性記號144分別提供給不同光罩對位用。例如,向性記號144包括第一向性記號1441、第二向性記號1442、第三向性記號1443及第四向性記號1444,其中第一型半導體磊晶層121藉由第一光罩(未繪示)與第一向性記號1441對位而形成;發光層122藉由第二光罩(未繪示)與第二向性記號1442對位而形成,而第二型半導體磊晶層123藉由第三光罩(未繪示)與第三向性記號1443對位而形成。其它結構層可藉由第四光罩(未繪示)與第四向性記號1444對位而形成。Please refer to FIG. 2, which illustrates a top view of a positioning structure in accordance with another embodiment of the present invention. In this embodiment, the positioning structure 140 further includes a plurality of directional marks 144 formed adjacent to the first aligning anchor point 1421 and the second aligning anchor point 1422, respectively. These directional marks 144 are respectively provided for different mask alignment. For example, the directional mark 144 includes a first directional mark 1441, a second directional mark 1442, a third directional mark 1443, and a fourth directional mark 1444, wherein the first type semiconductor epitaxial layer 121 is covered by the first reticle (not shown) is formed by aligning with the first directional mark 1441; the luminescent layer 122 is formed by aligning the second reticle (not shown) with the second directional mark 1442, and the second type of semiconductor is epitaxial. The layer 123 is formed by aligning with the third directional mark 1443 by a third mask (not shown). The other structural layers may be formed by aligning with the fourth directional mark 1444 by a fourth photomask (not shown).
綜上所述,雖然本發明已以較佳實施例揭露如上,然其並非用以限定本發明。本發明所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾。因此,本發明之保護範圍當視後附之申請專利範圍所界定者為準。In conclusion, the present invention has been disclosed in the above preferred embodiments, and is not intended to limit the present invention. A person skilled in the art can make various changes and modifications without departing from the spirit and scope of the invention. Therefore, the scope of the invention is defined by the scope of the appended claims.
100‧‧‧發光二極體100‧‧‧Lighting diode
110‧‧‧基板110‧‧‧Substrate
120‧‧‧發光二極體晶粒120‧‧‧Light-emitting diode grains
130‧‧‧切割道130‧‧‧ cutting road
140‧‧‧定位結構140‧‧‧ Positioning structure
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| TW102134884A TWI506755B (en) | 2013-09-26 | 2013-09-26 | Light-emitting diode with positioning structure |
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| TW200937620A (en) * | 2008-02-14 | 2009-09-01 | Renesas Tech Corp | Semiconductor device and a method of manufacturing the same |
| TW201145412A (en) * | 2010-02-22 | 2011-12-16 | Stats Chippac Ltd | Semiconductor packaging system with an aligned interconnect and method of manufacture thereof |
| TW201243489A (en) * | 2011-04-25 | 2012-11-01 | Ultratech Inc | Phase-shift mask with assist phase regions |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| TW200937620A (en) * | 2008-02-14 | 2009-09-01 | Renesas Tech Corp | Semiconductor device and a method of manufacturing the same |
| TW201145412A (en) * | 2010-02-22 | 2011-12-16 | Stats Chippac Ltd | Semiconductor packaging system with an aligned interconnect and method of manufacture thereof |
| TW201243489A (en) * | 2011-04-25 | 2012-11-01 | Ultratech Inc | Phase-shift mask with assist phase regions |
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