TWI588500B - Semiconductor device measurement method - Google Patents
Semiconductor device measurement method Download PDFInfo
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- TWI588500B TWI588500B TW105102364A TW105102364A TWI588500B TW I588500 B TWI588500 B TW I588500B TW 105102364 A TW105102364 A TW 105102364A TW 105102364 A TW105102364 A TW 105102364A TW I588500 B TWI588500 B TW I588500B
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- 239000004065 semiconductor Substances 0.000 title claims description 197
- 238000000691 measurement method Methods 0.000 title description 4
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- 239000010409 thin film Substances 0.000 claims 1
- 239000000523 sample Substances 0.000 description 24
- 238000009529 body temperature measurement Methods 0.000 description 20
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/26—Testing of individual semiconductor devices
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/26—Testing of individual semiconductor devices
- G01R31/2601—Apparatus or methods therefor
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Testing Of Individual Semiconductor Devices (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Dicing (AREA)
Description
本發明有關於一種半導體裝置量測方法且,更特別地,係有關於一種測量被貼附到一薄片上之半導體裝置之電氣特性的半導體裝置量測方法。 The present invention relates to a semiconductor device measurement method and, more particularly, to a semiconductor device measurement method for measuring electrical characteristics of a semiconductor device attached to a sheet.
一半導體裝置是藉由使用一個比一半導體晶圓之尺寸大的環形框架來被測量。一具有一比該環形框架之內周緣大之圓形形狀的黏貼薄片是被固定到該環形框架,而該半導體晶圓是被貼附到該薄片上。貼附到該薄片上的該半導體晶圓是藉一切割裝置來被分割成數個半導體裝置。一半導體測試裝置的接觸元件是電氣連接到該數個分割半導體裝置的電極,而該數個半導體裝置的電氣特性是被一次測量。這半導體裝置測量方法是在日本專利早期公開第2007-178132號案中被揭示。 A semiconductor device is measured by using an annular frame that is larger than the size of a semiconductor wafer. An adhesive sheet having a circular shape larger than the inner circumference of the annular frame is fixed to the annular frame, and the semiconductor wafer is attached to the sheet. The semiconductor wafer attached to the wafer is divided into a plurality of semiconductor devices by a cutting device. A contact element of a semiconductor test device is an electrode electrically connected to the plurality of divided semiconductor devices, and electrical characteristics of the plurality of semiconductor devices are measured at one time. This semiconductor device measuring method is disclosed in Japanese Patent Laid-Open Publication No. 2007-178132.
一半導體裝置的電氣特性根據該半導體裝置的使用環境是理想地在一處於比室溫高之溫度,例如,125℃,之高溫測量環境中被測量。在這情況中,供數個半導體裝 置用的一高溫測量環境必須藉由把一在它上面貼附有該數個半導體裝置的薄片置於一加熱板的放置表面上,並且加熱該薄片。如果這是被執行的話,然而,該薄片是因熱而膨脹及鬆弛,而貼附到該薄片上之該數個半導體裝置的位置與附著角度是改變。因此,該半導體測試裝置的接觸元件無法再接觸該等半導體裝置的電極,而且不再可能同時測量該數個半導體裝置的電氣特性。這造成了數個半導體裝置的電氣特性無法有效地在一高溫測量環境中被測量的問題。 The electrical characteristics of a semiconductor device are desirably measured in a high temperature measurement environment at a temperature higher than room temperature, for example, 125 ° C, depending on the environment in which the semiconductor device is used. In this case, for several semiconductor packages A high temperature measurement environment is employed by placing a sheet on which a plurality of semiconductor devices are attached, on a placement surface of a heating plate, and heating the sheet. If this is performed, however, the sheet is expanded and slackened by heat, and the position and attachment angle of the plurality of semiconductor devices attached to the sheet are changed. Therefore, the contact elements of the semiconductor test device are no longer able to contact the electrodes of the semiconductor devices, and it is no longer possible to simultaneously measure the electrical characteristics of the plurality of semiconductor devices. This causes the problem that the electrical characteristics of several semiconductor devices cannot be effectively measured in a high temperature measurement environment.
本發明之目的是為提供一種能夠在一高溫測量環境中有效地測量數個半導體裝置之電氣特性的半導體裝置測量方法。 SUMMARY OF THE INVENTION It is an object of the present invention to provide a semiconductor device measurement method capable of efficiently measuring electrical characteristics of a plurality of semiconductor devices in a high temperature measurement environment.
為了達成上述目的,本發明之半導體裝置測量方法包括把一當在被加熱之後被冷卻時收縮的薄片貼附到一環狀框架上的一薄片貼附步驟、把一在其中有數個半導體裝置以矩陣形式形成之骨料貼附到該薄片之表面上的一骨料貼附步驟、藉由切割被貼附到該薄片之表面上之骨料來切割該數個半導體裝置的一切割步驟、把該在它上面是貼附有該數個分割半導體裝置之薄片放置在一加熱裝置之放置表面上的一放置步驟、以該加熱裝置把貼附在該薄片上之該數個分割半導體裝置加熱的一加熱步驟、當該數個分割半導體裝置被加熱時測量該數個分割半導體裝置之電氣 特性的一量測步驟、及在該薄片貼附步驟之後且在該放置步驟之前加熱該薄片而然後冷卻該薄片的一預加熱步驟。 In order to achieve the above object, a semiconductor device measuring method of the present invention includes a sheet attaching step of attaching a sheet which is shrunk when being cooled after being heated to an annular frame, and a plurality of semiconductor devices therein a step of attaching aggregates formed in a matrix form to the surface of the sheet, a cutting step of cutting the plurality of semiconductor devices by cutting the aggregate attached to the surface of the sheet, The step of placing thereon a sheet on which the plurality of divided semiconductor devices are attached is placed on a placement surface of a heating device, and the heating device heats the plurality of divided semiconductor devices attached to the sheet a heating step of measuring electrical of the plurality of divided semiconductor devices when the plurality of divided semiconductor devices are heated A measuring step of the characteristic, and a preheating step of heating the sheet after the sheet attaching step and before the placing step and then cooling the sheet.
被貼附在該框架上的薄片是被加熱及在那之後被冷卻,所以該薄片是在無鬆弛之下膨脹。即使當一高溫量測環境是藉由在這狀態下把該薄片放置在該加熱裝置的放置表面上且由該加熱裝置加熱該薄片來被產生時,該薄片之因熱而起的膨脹能夠被抑制。據此,被貼附在該薄片上之該數個半導體裝置的位置與角度不被改變而是被維持。這使得要在高溫量測環境下有效地量測該數個半導體裝置的電氣特性是有可能的。 The sheet attached to the frame is heated and cooled after that, so the sheet expands without slack. Even when a high-temperature measurement environment is produced by placing the sheet on the placement surface of the heating device in this state and heating the sheet by the heating device, the expansion of the sheet due to heat can be inhibition. According to this, the positions and angles of the plurality of semiconductor devices attached to the sheet are not changed but are maintained. This makes it possible to efficiently measure the electrical characteristics of the plurality of semiconductor devices in a high temperature measurement environment.
1‧‧‧半導體裝置量測系統 1‧‧‧Semiconductor device measurement system
2‧‧‧自動薄片貼附裝置 2‧‧‧Automatic sheet attachment device
3‧‧‧薄片預熱裝置 3‧‧‧Sheet preheating device
4‧‧‧自動半導體條帶貼附裝置 4‧‧‧Automatic semiconductor strip attaching device
5‧‧‧切割裝置 5‧‧‧ Cutting device
6‧‧‧量測裝置 6‧‧‧Measurement device
7‧‧‧UV硬化裝置 7‧‧‧UV hardening device
8‧‧‧分類裝置 8‧‧‧Classification device
10‧‧‧薄薄片本體 10‧‧‧ Thin sheet body
11‧‧‧薄片 11‧‧‧Sheet
11a‧‧‧PET基材 11a‧‧‧PET substrate
11b‧‧‧黏著材料 11b‧‧‧Adhesive material
12‧‧‧環形框架 12‧‧‧ ring frame
12a‧‧‧圓形開孔 12a‧‧‧round opening
13‧‧‧半導體條帶 13‧‧‧Semiconductor strip
14‧‧‧半導體裝置 14‧‧‧Semiconductor device
14c‧‧‧半導體晶片 14c‧‧‧Semiconductor wafer
14m‧‧‧模鑄樹脂 14m‧‧·Mold casting resin
14r‧‧‧導線架 14r‧‧‧ lead frame
17‧‧‧高溫環境爐 17‧‧‧High temperature environment furnace
20‧‧‧切割刀 20‧‧‧Cutting knife
24‧‧‧夾持台 24‧‧‧Clamping table
24a‧‧‧凹室 24a‧‧ ‧ alcove
24b‧‧‧側表面 24b‧‧‧ side surface
24c‧‧‧側表面 24c‧‧‧ side surface
25‧‧‧接觸器 25‧‧‧Contactor
25a‧‧‧主體 25a‧‧‧ Subject
26‧‧‧探針 26‧‧‧Probe
26a‧‧‧前端部份 26a‧‧‧ front end
26b‧‧‧後端部份 26b‧‧‧ Backend section
27‧‧‧測試器 27‧‧‧Tester
27a‧‧‧量測單元 27a‧‧‧Measurement unit
27b‧‧‧診斷單元 27b‧‧‧Diagnostic unit
27c‧‧‧傳輸單元 27c‧‧‧Transmission unit
28‧‧‧黑燈 28‧‧‧Black light
30‧‧‧推針 30‧‧‧ push pin
31‧‧‧接收單元 31‧‧‧ receiving unit
32‧‧‧分類單元 32‧‧‧Classification unit
50‧‧‧熱板 50‧‧‧ hot plate
51‧‧‧加熱器 51‧‧‧heater
52‧‧‧管連接元件 52‧‧‧ pipe connection components
52a‧‧‧貫孔 52a‧‧‧Tongkong
53‧‧‧夾持元件 53‧‧‧Clamping elements
53a‧‧‧放置表面 53a‧‧‧Place surface
54‧‧‧管連接元件 54‧‧‧ pipe connection components
54a‧‧‧貫孔 54a‧‧‧Tongkong
55‧‧‧真空路徑 55‧‧‧vacuum path
56‧‧‧真空路徑 56‧‧‧vacuum path
70‧‧‧熱板 70‧‧‧ hot plate
71‧‧‧夾持台 71‧‧‧Clamping table
71a‧‧‧放置表面 71a‧‧‧Place surface
71b,71c‧‧‧側表面 71b, 71c‧‧‧ side surface
72‧‧‧凹槽 72‧‧‧ Groove
73,74‧‧‧管連接元件 73,74‧‧‧ pipe connection components
73a,74a‧‧‧貫孔 73a, 74a‧‧‧through
75,76‧‧‧真空路徑 75,76‧‧‧vacuum path
101‧‧‧半導體裝置量測系統 101‧‧‧Semiconductor device measurement system
102‧‧‧半導體裝置量測系統 102‧‧‧Semiconductor device measurement system
S1‧‧‧自動薄片貼附步驟 S1‧‧‧Automatic sheet attaching steps
S2‧‧‧薄片預熱步驟 S2‧‧‧Sheet preheating step
S3‧‧‧自動半導體條帶貼附步驟 S3‧‧‧Automatic Semiconductor Strip Attachment Procedure
S4‧‧‧切割步驟 S4‧‧‧ cutting steps
S5‧‧‧放置步驟 S5‧‧‧Placement steps
S6‧‧‧加熱步驟 S6‧‧‧heating step
S7‧‧‧量測步驟 S7‧‧‧Measurement steps
S8‧‧‧UV硬化步驟 S8‧‧‧UV hardening step
S9‧‧‧分類步驟 S9‧‧‧ classification steps
圖1是為一顯示一要被使用於本發明之第一實施例之一半導體裝置量測方法之半導體裝置量測系統之整體結構的方塊圖;圖2是為一用於說明使用一自動薄片貼附裝置之薄片貼附步驟的圖式;圖3是為一用於說明使用一薄片預熱裝置之薄片預熱步驟的圖式;圖4A是為一顯示一半導體條帶被貼附在一薄片上之狀態的立體圖;圖4B是為一以放大比例方式顯示在圖4A中所示之一個部份S的立體圖;圖5A是為一用於說明使用一切割裝置之切割步驟的圖式; 圖5B是為一以放大比例方式顯示圖5A之主部份的圖式;圖6是為一顯示該半導體條帶由該切割裝置切割之狀態的剖面圖;圖7是為一顯示一量測裝置之配置的圖式;圖8是為一顯示該量測裝置之熱板的立體圖;圖9是為一顯示該薄片被放置在該量測裝置之熱板上之狀態的立體圖;圖10是為一顯示該量測裝置之熱板之結構的剖視圖;圖11是為一用於說明使用一UV硬化裝置之UV硬化步驟的立體圖;圖12是一顯示該UV硬化裝置以紫外線照射該薄片之方式的剖視圖;圖13是為一顯示一分類裝置之配置的圖式;圖14是為一顯示本發明之第一實施例之半導體裝置量測方法之步驟的流程圖;圖15是為一顯示在由該切割裝置切割之前與之後之半導體條帶之狀態的剖視圖;圖16是為一顯示一半導體裝置由一推針推起來之狀態的剖視圖;圖17是為一顯示一要在本發明之第二實施例之半導體裝置量測方法中使用之半導體裝置量測系統之整體結構的方塊圖;圖18是為一顯示本發明之第二實施例之半導體裝置量 測方法之步驟的流程圖;圖19是為一顯示一要在本發明之第三實施例之半導體裝置量測方法中使用之半導體裝置量測系統之整體結構的方塊圖;圖20是為一顯示本發明之第三實施例之半導體裝置量測方法之步驟的流程圖;圖21是為一顯示本發明之第四實施例之量測裝置之熱板與一要被放置在該熱板上之薄片的立體圖;及圖22是為一顯示本發明之第四實施例之量測裝置之熱板之結構的剖視圖。 1 is a block diagram showing an overall structure of a semiconductor device measuring system to be used in a semiconductor device measuring method according to a first embodiment of the present invention; FIG. 2 is a view for explaining the use of an automatic sheet Figure 3 is a view for explaining a preheating step of a sheet using a sheet preheating device; Fig. 4A is a view showing a semiconductor strip attached to a semiconductor strip 3B is a perspective view showing a portion S shown in FIG. 4A in an enlarged scale; FIG. 5A is a view for explaining a cutting step using a cutting device; 5B is a view showing a main portion of FIG. 5A in an enlarged scale; FIG. 6 is a cross-sectional view showing a state in which the semiconductor strip is cut by the cutting device; FIG. 7 is a display for measuring Figure 8 is a perspective view showing a hot plate of the measuring device; Figure 9 is a perspective view showing a state in which the sheet is placed on a hot plate of the measuring device; 1 is a cross-sectional view showing the structure of a hot plate of the measuring device; FIG. 11 is a perspective view for explaining a UV hardening step using a UV curing device; and FIG. 12 is a view showing the UV curing device irradiating the sheet with ultraviolet rays. Figure 13 is a view showing a configuration of a sorting device; Figure 14 is a flow chart showing the steps of a semiconductor device measuring method according to a first embodiment of the present invention; Figure 15 is a view A cross-sectional view showing a state of a semiconductor strip before and after being cut by the cutting device; FIG. 16 is a cross-sectional view showing a state in which a semiconductor device is pushed by a push pin; FIG. 17 is a view showing a state in which the present invention is to be used. Half of the second embodiment Block diagram showing the overall configuration of a semiconductor device using the measurement system of the measuring method of the amount of body apparatus; FIG. 18 is a semiconductor device according to an amount of a second embodiment of the present invention as a display FIG. 19 is a block diagram showing the overall structure of a semiconductor device measuring system to be used in the semiconductor device measuring method of the third embodiment of the present invention; FIG. 20 is a A flow chart showing the steps of a semiconductor device measuring method according to a third embodiment of the present invention; and FIG. 21 is a hot plate showing a measuring device according to a fourth embodiment of the present invention and a hot plate to be placed on the hot plate. A perspective view of a sheet; and Fig. 22 is a cross-sectional view showing the structure of a hot plate showing the measuring device of the fourth embodiment of the present invention.
本發明的第一實施例將會配合該等附圖在下面作說明。 The first embodiment of the present invention will be described below in conjunction with the drawings.
如在圖1中所示,一半導體裝置量測系統1包括一自動薄片貼附裝置2、一薄片預熱裝置3、自動半導體條帶貼附裝置4、切割裝置5、量測裝置6、UV硬化裝置7、及分類裝置8。 As shown in FIG. 1, a semiconductor device measuring system 1 includes an automatic sheet attaching device 2, a sheet preheating device 3, an automatic semiconductor strip attaching device 4, a cutting device 5, a measuring device 6, and a UV. The curing device 7 and the sorting device 8.
該自動薄片貼附裝置2是為一用於自動地把一薄片11貼附到一環形框架12上的裝置。如在圖2中所示,該環形框架12是為一在平面圖中具有一圓形環形形狀的薄板- 狀框架,而且具有一圓形開孔12a。該自動薄片貼附裝置2從一被捲成輥形的薄薄片本體10切割出該在平面圖中具有一圓形形狀的薄片11,並且把該薄片11之黏著材料11b(圖6)的邊緣貼附到該環形框架12上。 The automatic sheet attaching device 2 is a device for automatically attaching a sheet 11 to an annular frame 12. As shown in Fig. 2, the annular frame 12 is a thin plate having a circular annular shape in plan view - The frame has a circular opening 12a. The automatic sheet attaching device 2 cuts the sheet 11 having a circular shape in a plan view from a thin sheet body 10 wound into a roll shape, and sticks the edge of the adhesive material 11b (Fig. 6) of the sheet 11 Attached to the annular frame 12.
注意的是該環形框架12不必一定是圓形環,而也能夠是為長方形環等等。如果是這種情況,該薄片11是被切割成一個對應於該環形框架12之形狀的形狀,例如,長方形形狀。而且,該自動薄片貼附裝置2不必一定是被使用,在執行簡單的定位之後手動地把該薄片11貼附到該環形框架12上也是有可能的。 It is to be noted that the annular frame 12 does not have to be a circular ring, but can also be a rectangular ring or the like. If this is the case, the sheet 11 is cut into a shape corresponding to the shape of the annular frame 12, for example, a rectangular shape. Moreover, the automatic sheet attaching device 2 does not have to be used, and it is also possible to manually attach the sheet 11 to the ring frame 12 after performing simple positioning.
該薄片11具有一稍微比該環形框架12之開孔12a大的直徑。如在圖6中所示,該薄片11是為一藉由把UV-硬化黏著材料11b堆疊在一PET(聚乙二醇對苯二甲酸酯)基材11a上來被得到的UV(紫外線)薄片。當該薄片11以紫外線外部地照射時,該黏著材料11b的黏著力下降。 The sheet 11 has a diameter slightly larger than the opening 12a of the annular frame 12. As shown in Fig. 6, the sheet 11 is a UV (ultraviolet light) obtained by stacking the UV-hardening adhesive 11b on a PET (polyethylene terephthalate) substrate 11a. Sheet. When the sheet 11 is irradiated with ultraviolet rays externally, the adhesive force of the adhesive material 11b is lowered.
該薄片11具有的擴張/收縮特性為該薄片11當被加熱到一個比室溫(第一溫度)高的溫度(第二溫度)時擴張,例如,100℃,而如果它是在那個之後被冷卻到室溫的話則收縮比在加熱之前更大的程度。該薄片11的這擴張/收縮特性也能夠被界定為在冷卻時的收縮係數是比在加熱時的擴張係數大。要注意的是"室溫"是為一個由空氣調節所控制的溫度,而且是大約20℃至25℃。 The sheet 11 has an expansion/contraction characteristic such that the sheet 11 expands when heated to a temperature higher than room temperature (first temperature) (second temperature), for example, 100 ° C, and if it is after that When cooled to room temperature, the shrinkage is greater than before heating. This expansion/contraction characteristic of the sheet 11 can also be defined as a contraction coefficient at the time of cooling which is larger than a coefficient of expansion at the time of heating. It should be noted that "room temperature" is a temperature controlled by air conditioning and is about 20 ° C to 25 ° C.
以上所述的擴張/收縮特性是為在結晶性塑膠上 發現的特性。例如,把包括由PBT(聚對苯二酸丁二酯)形成之基材11a的薄片11使用作為結晶性塑膠也是有可能的。 The expansion/contraction properties described above are for crystalline plastics. Characteristics found. For example, it is also possible to use the sheet 11 including the substrate 11a formed of PBT (polybutylene terephthalate) as a crystalline plastic.
如在圖3中所示,該薄片預熱裝置3包括一能夠產生比室溫高之溫度,例如,100℃或更高,之高溫環境的高溫環境爐17。在由該高溫環境爐17所產生的這高溫環境中,貼附在該環形框架12上的薄片11是與該環形框架12置放在一起並且被預熱。這製程於此後將會被稱為"預熱"。 As shown in FIG. 3, the sheet preheating device 3 includes a high temperature environment furnace 17 capable of generating a high temperature environment higher than room temperature, for example, 100 ° C or higher. In the high temperature environment generated by the high temperature environment furnace 17, the sheet 11 attached to the annular frame 12 is placed with the annular frame 12 and preheated. This process will be referred to as "preheating" after this.
該自動半導體條帶貼附裝置4是為一個用於自動地把一半導體條帶13(將於稍後作描述)貼附到該由該薄片預熱裝置3預熱之薄片11之黏著材料11b上的裝置。注意的是該自動半導體條帶貼附裝置4不必一定被使用,而在執行簡單定位之後手動地把該半導體條帶13貼附到該薄片11上也是有可能的。 The automatic semiconductor tape attaching device 4 is an adhesive material 11b for automatically attaching a semiconductor strip 13 (which will be described later) to the sheet 11 preheated by the sheet preheating device 3. The device on it. It is noted that the automatic semiconductor strip attaching device 4 does not have to be used, and it is also possible to manually attach the semiconductor strip 13 to the sheet 11 after performing simple positioning.
如在圖4A和4B中所示,該半導體條帶13是為一骨料,在其中,數個半導體裝置14是以矩陣形式佈置及整合。該半導體條帶13的尺寸是比該環形框架12的開孔12a小。形成該半導體條帶13的每一半導體裝置14具有一結構,在其中,一半導體晶片14c和一電氣連接至該半導體晶片14c的導線架14r是以一模鑄樹脂14m一體地密封。每一半導體裝置14的導線架14r是物理地和電氣地連接至相鄰之半導體裝置14的導線架14r並且以模鑄樹脂14m密封。 As shown in Figures 4A and 4B, the semiconductor strip 13 is an aggregate in which a plurality of semiconductor devices 14 are arranged and integrated in a matrix. The size of the semiconductor strip 13 is smaller than the opening 12a of the annular frame 12. Each of the semiconductor devices 14 forming the semiconductor strip 13 has a structure in which a semiconductor wafer 14c and a lead frame 14r electrically connected to the semiconductor wafer 14c are integrally sealed by a molding resin 14m. The lead frame 14r of each semiconductor device 14 is physically and electrically connected to the lead frame 14r of the adjacent semiconductor device 14 and sealed with a molding resin 14m.
如在圖5A、5B、和6中所示,該切割裝置5是為一裝置,其固持與該在它上面是貼附有該半導體條帶13之薄片11整合在一起的環形框架12,並且以切割刀片20切割該半導體條帶13,藉此把該半導體條帶13分割成個別的半導體裝置14。 As shown in FIGS. 5A, 5B, and 6, the cutting device 5 is a device that holds the annular frame 12 integrated with the sheet 11 on which the semiconductor strip 13 is attached, and The semiconductor strip 13 is diced by a dicing blade 20, whereby the semiconductor strip 13 is divided into individual semiconductor devices 14.
該量測裝置6是為一個用於同時地量測該數個半導體裝置14的裝置。在這實施例中,貼附在該薄片11上之該數個分割的半導體裝置14是為量測對象。該量測裝置6根據該等半導體裝置14的實際使用環境產生一處於一個比室溫高之溫度(第三溫度),例如,125℃,的高溫量測環境,並且在這高溫量測環境下執行量測。在這情況中,該高溫量測環境的下限是為室溫,而其之上限是為125℃。 The measuring device 6 is a device for simultaneously measuring the plurality of semiconductor devices 14. In this embodiment, the plurality of divided semiconductor devices 14 attached to the sheet 11 are measurement targets. The measuring device 6 generates a high temperature measuring environment at a temperature higher than room temperature (third temperature), for example, 125 ° C, according to the actual use environment of the semiconductor devices 14, and in the high temperature measuring environment. Perform measurement. In this case, the lower limit of the high temperature measurement environment is room temperature, and the upper limit is 125 °C.
如在圖7中所示,該量測裝置6包括一作為一用於加熱該數個半導體裝置14之加熱裝置的熱板50、一包括數個探針26的接觸器25、及一連接至該數個探針26並且量測該等半導體裝置14之電氣特性的測試器27。 As shown in FIG. 7, the measuring device 6 includes a hot plate 50 as a heating device for heating the plurality of semiconductor devices 14, a contactor 25 including a plurality of probes 26, and a connection to The plurality of probes 26 and a tester 27 that measures the electrical characteristics of the semiconductor devices 14.
如在圖8至10中所示,該熱板50包括一加熱器51,和一個被固定在該加熱器51上的夾持台24。該夾持台24是由金屬製成,而且具有一個在平面圖中幾乎長方形形狀。一具有一個在平面圖中幾乎長方形形狀的凹室24a(圖10)是形成在該夾持台24的上表面。一具有一個在平面圖中幾乎長方形形狀的板狀夾持元件53是被裝配在該夾持台24的 凹室24a內。該夾持元件53是由一種包含大量氣隙與孔洞的多孔材料(陶瓷)製成。該夾持元件53具有一個能夠夾持該薄片11的非粗糙平放置表面53a。 As shown in Figs. 8 to 10, the hot plate 50 includes a heater 51, and a holding table 24 fixed to the heater 51. The holding table 24 is made of metal and has an almost rectangular shape in plan view. An alcove 24a (Fig. 10) having an almost rectangular shape in plan view is formed on the upper surface of the holding table 24. A plate-shaped holding member 53 having an almost rectangular shape in plan view is fitted to the holding table 24 Inside the recess 24a. The holding member 53 is made of a porous material (ceramic) containing a large amount of air gaps and holes. The clamping member 53 has a non-rough flat placement surface 53a capable of holding the sheet 11.
各具有在側視圖中L形狀的兩個真空路徑55和兩個真空路徑56是形成在該夾持台24內部。該等真空路徑55和56中之每一者的末端是通向該夾持台24的凹室24a,而該等真空路徑55和56的另一末端是通向該夾持台24的側表面24b和24c。兩個管連接元件52和兩個管連接元件54是連接到該夾持台24的側表面24b和24c。貫孔52a和54a是形成在該等管連接元件52和54。該等管連接元件52和54的貫孔52a和54a是連接到該夾持台24的真空路徑55和56。一真空幫浦(圖中未示)是連接到該等管連接元件52和55。 Two vacuum paths 55 each having an L shape in a side view and two vacuum paths 56 are formed inside the holding table 24. The end of each of the vacuum paths 55 and 56 is an alcove 24a leading to the clamping table 24, and the other end of the vacuum paths 55 and 56 is a side surface leading to the clamping table 24. 24b and 24c. Two tube connection elements 52 and two tube connection elements 54 are side surfaces 24b and 24c that are connected to the clamping table 24. The through holes 52a and 54a are formed in the tube connecting members 52 and 54. The through holes 52a and 54a of the tube connecting members 52 and 54 are vacuum paths 55 and 56 connected to the holding table 24. A vacuum pump (not shown) is connected to the tube connecting members 52 and 55.
該熱板50是被安裝在一能夠在一箭頭A-B方向(寬度方向)、一與該箭頭A-B方向垂直之箭頭C-D方向(深度方向)、和一箭頭E-F方向(高度方向)移動的X-Y台(圖中未示)上。 The hot plate 50 is mounted on an XY stage capable of moving in an arrow AB direction (width direction), an arrow CD direction (depth direction) perpendicular to the arrow AB direction, and an arrow EF direction (height direction) ( Not shown in the figure).
該接觸器25與該夾持台24的夾持元件53相對。該接觸器25包括一具有一幾乎平行六面體形狀的主體25a,及數個被固定到該主體25a的探針26。該等探針26是為要電氣連接至該等半導蒂裝置14之導線架14r的接觸元件。該等探針26延伸通過該主體25a。每一探針26的前端部份26a以該箭頭F的方向從該主體25a的下端向下突伸。每一探針26的後端部份26b以該箭頭E的方向從該主體25a的上端向上突伸,並且被連接到該測試器27。該數個探針26是被如此配 置以致於是與一個半導體裝置14的數個導線架14r相對。 The contactor 25 is opposite the clamping element 53 of the clamping table 24. The contactor 25 includes a body 25a having an almost parallelepiped shape, and a plurality of probes 26 fixed to the body 25a. The probes 26 are contact elements that are to be electrically connected to the leadframe 14r of the semi-conductive pedestal 14. The probes 26 extend through the body 25a. The front end portion 26a of each probe 26 projects downward from the lower end of the main body 25a in the direction of the arrow F. The rear end portion 26b of each probe 26 projects upward from the upper end of the main body 25a in the direction of the arrow E, and is connected to the tester 27. The plurality of probes 26 are thus matched So that it is opposite to the plurality of lead frames 14r of one semiconductor device 14.
該測試器27包括一用於當該等探針26之前端部份26a是電氣連接至該半導體裝置14的導線架14r時量測該半導體裝置14之導通狀態的量測單元27a、一用於依據由該量測單元27a所得到之量測結果來診斷該半導體裝置14之電氣特性的診斷單元27b、及一用於傳輸由該診斷單元27b所得到之診斷結果到該分類裝置8的傳輸單元27c。 The tester 27 includes a measuring unit 27a for measuring the conduction state of the semiconductor device 14 when the front end portion 26a of the probe 26 is electrically connected to the lead frame 14r of the semiconductor device 14, a diagnostic unit 27b for diagnosing the electrical characteristics of the semiconductor device 14 based on the measurement result obtained by the measuring unit 27a, and a transmission unit for transmitting the diagnosis result obtained by the diagnostic unit 27b to the classification device 8 27c.
該UV硬化裝置7是為一用於以紫外線從該薄片11之基材11a的側面照射該薄片11的裝置。即,該薄片11是以紫外線從未貼附有半導體裝置14的表面照射。如在圖11和12中所示,該UV硬化裝置7包括數個平行配置於貼附在環形框架12上之薄片11之基材11a之側的黑燈28。 The UV curing device 7 is a device for irradiating the sheet 11 from the side surface of the substrate 11a of the sheet 11 with ultraviolet rays. That is, the sheet 11 is irradiated with a surface on which the ultraviolet ray is not attached to the semiconductor device 14. As shown in Figs. 11 and 12, the UV hardening device 7 includes a plurality of black lamps 28 arranged in parallel on the side of the substrate 11a of the sheet 11 attached to the annular frame 12.
該分類裝置8是為一個依據由該量測裝置6之測試器27所作用之該數個半導體裝置14之電氣特性之診斷結果來把該數個半導體裝置14中之每一者分類成非缺陷產品或缺陷產品、把被分類為非缺陷產品之半導體裝置14從該薄片11移去、及以檢拾器把被移去之半導體裝置14檢拾的裝置。 The sorting device 8 classifies each of the plurality of semiconductor devices 14 as non-defectively based on a diagnosis result of electrical characteristics of the plurality of semiconductor devices 14 acting by the tester 27 of the measuring device 6. A product or defective product, a device that removes the semiconductor device 14 classified as a non-defective product from the sheet 11 and picks up the removed semiconductor device 14 with a picker.
如在圖13中所示,該分類裝置8包括一用於接收由該量測裝置6之測試器27所得到之半導體裝置14之診斷結果的接收單元31、一用於根據診斷結果來把該等半導體裝置14分類成非缺陷產品和缺陷產品的分類單元32、及一 用於從該薄片11下方僅推起由分類單元32分類為非缺陷產品之半導體裝置14的推針30。 As shown in FIG. 13, the sorting device 8 includes a receiving unit 31 for receiving a diagnosis result of the semiconductor device 14 obtained by the tester 27 of the measuring device 6, and a method for a sorting unit 32, such as a semiconductor device 14 classified into a non-defective product and a defective product, and a A push pin 30 for pushing up only the semiconductor device 14 classified as a non-defective product by the sorting unit 32 from below the sheet 11.
由具有如上所述之結構之該半導體裝置量測系統1所作用的一量測半導體裝置14之電氣特性的運作將會配合圖14來作說明。 The operation of the electrical characteristics of a measuring semiconductor device 14 functioning by the semiconductor device measuring system 1 having the above-described configuration will be described with reference to FIG.
如在圖2中所示,該自動薄片貼附裝置2從該薄片本體10切割出比該環形框架12之開孔12a大的圓形薄片11,並且把該薄片11的外周緣貼附在該環形框架12上。在它上面被貼附有該薄片11的該環形框架12是從該自動薄片貼附裝置2傳輸到該薄片預熱裝置3。 As shown in FIG. 2, the automatic sheet attaching device 2 cuts a circular sheet 11 larger than the opening 12a of the annular frame 12 from the sheet body 10, and attaches the outer periphery of the sheet 11 thereto. On the annular frame 12. The annular frame 12 to which the sheet 11 is attached is transported from the automatic sheet attaching device 2 to the sheet preheating device 3.
該薄片預熱裝置3把貼附在該環形框架12上的薄片11容納在該高溫環境爐17內,並且在一處於100℃的高溫環境中把該薄片11加熱2分鐘(預熱時間)或更久。在那之後,該薄片預熱裝置3從該高溫環境爐17把該薄片11卸載,並且在室溫環境下自然冷卻該薄片11。 The sheet preheating device 3 accommodates the sheet 11 attached to the annular frame 12 in the high temperature environment furnace 17, and heats the sheet 11 for 2 minutes (preheating time) in a high temperature environment at 100 ° C or longer. After that, the sheet preheating device 3 unloads the sheet 11 from the high temperature environment furnace 17, and naturally cools the sheet 11 in a room temperature environment.
在這製程中,該薄片11在該高溫環境爐17中於高溫環境下擴張,並且在那之後於室溫環境下收縮。由於該薄片11之收縮係數是比擴張係數大的特性,張力是給予被貼附在該環形框架12上的薄片11,而且這樣能移除當該薄片11被貼附到該環形框架12上時所產生的鬆弛與起皺。這是該薄片11之透過由該薄片預熱裝置3所作用之預熱與冷 卻所得到的狀態。 In this process, the sheet 11 is expanded in the high temperature environment furnace 17 in a high temperature environment, and thereafter shrinks in a room temperature environment. Since the contraction coefficient of the sheet 11 is a characteristic larger than the expansion coefficient, the tension is given to the sheet 11 attached to the annular frame 12, and this can be removed when the sheet 11 is attached to the annular frame 12 The resulting slack and wrinkles. This is the preheating and cooling of the sheet 11 through the action of the sheet preheating device 3. But the state that is obtained.
為了得到該不具有上述之鬆弛與起皺的薄片11,僅需要把該高溫環境爐17的下限溫度設定在90℃作為形成該薄片11之PET的玻璃化轉變溫度Tg,及把該高溫環境爐17的上限溫度設定在260℃作為PET的溶點Tm(這熔點不是材料熔化的溫度而是聚合物熔點)。該薄片11的預熱時間是被設定在2分鐘或以上因為即使當一處於100℃的高溫環境是被設定在該高溫環境爐17中時,如果該預熱時間是小於2分鐘的話該薄片11的預熱/冷卻效果無法被得到。 In order to obtain the sheet 11 which does not have the above-described slack and wrinkles, it is only necessary to set the lower limit temperature of the high temperature environment furnace 17 at 90 ° C as the glass transition temperature Tg of the PET forming the sheet 11, and to apply the high temperature environment furnace The upper limit temperature of 17 is set at 260 ° C as the melting point Tm of PET (this melting point is not the temperature at which the material melts but the melting point of the polymer). The preheating time of the sheet 11 is set to 2 minutes or more because even when a high temperature environment at 100 ° C is set in the high temperature environment furnace 17, if the preheating time is less than 2 minutes, the sheet 11 The preheat/cooling effect cannot be obtained.
然後,該自動半導體條帶貼附裝置4把該半導體條帶13貼附到該被塗佈有該透過上述預熱與冷卻來移除掉鬆弛與起皺之薄片11之黏著材料11b的表面上。在那之後,該在它上面被貼附有該半導體條帶13的薄片11是與該環形框架12一起被轉移到該切割裝置5。 Then, the automatic semiconductor tape attaching device 4 attaches the semiconductor strip 13 to the surface of the adhesive material 11b coated with the preheating and cooling to remove the slack and wrinkle sheet 11. . After that, the sheet 11 on which the semiconductor strip 13 is attached is transferred to the cutting device 5 together with the annular frame 12.
該切割裝置5,經由該環形框架12,固持從該自動半導體條帶貼附裝置4轉移的薄片11,並且以切割刀20切割被貼附在該薄片11上的該半導體條帶13,藉此把該半導體條帶13分割成個別的半導體裝置14。在這步驟中,如在圖15中所示,該切割刀20切割該在它上面被貼附有該半導體條帶13之薄片11的黏著材料11b,但不切割該薄片11的基材11a。該切割裝置5因此執行半切。 The cutting device 5, by means of the annular frame 12, holds the sheet 11 transferred from the automatic semiconductor tape attaching device 4, and cuts the semiconductor strip 13 attached to the sheet 11 by a cutting blade 20, whereby the cutting device 5 The semiconductor strip 13 is divided into individual semiconductor devices 14. In this step, as shown in Fig. 15, the cutter 20 cuts the adhesive material 11b on which the sheet 11 of the semiconductor strip 13 is attached, but does not cut the substrate 11a of the sheet 11. The cutting device 5 thus performs a half cut.
如先前所述,在該半導體條帶13中之相鄰之半導 體裝置14的導線架14r是物理地與電氣地連接。當該半導體條帶13的個別半導體裝置14被分開時,在相鄰之半導體裝置14之間的這電氣連接消失。據此,該量測裝置6能夠獨立地量測形成該半導體條帶13之該數個半導體裝置14的電氣特性。 Adjacent semi-conductors in the semiconductor strip 13 as previously described The lead frame 14r of the body device 14 is physically and electrically connected. When the individual semiconductor devices 14 of the semiconductor strip 13 are separated, this electrical connection between adjacent semiconductor devices 14 disappears. Accordingly, the measuring device 6 is capable of independently measuring the electrical characteristics of the plurality of semiconductor devices 14 forming the semiconductor strip 13.
由該切割裝置5所分割之該數個半導體裝置14全部依然由該黏著材料11b貼附在該薄片11上(圖7)。該量測裝置6把該在它上面被貼附有該數個分開之半導體裝置14的薄片11放置在該熱板50之夾持元件53的放置表面53a上。然後,該薄片11是經由該熱板50的管連接部份52和54以及該夾持台24的真空路徑55和56藉由以真空泵吸該薄片11來被夾持在該夾持元件53的放置表面53a。在這狀態下,至少該薄片11之在它上面被貼附有該數個半導體裝置14的部份必須被夾持在該放置表面53a。 All of the plurality of semiconductor devices 14 divided by the cutting device 5 are still attached to the sheet 11 by the adhesive material 11b (Fig. 7). The measuring device 6 places the sheet 11 on which the plurality of divided semiconductor devices 14 are attached, on the placement surface 53a of the holding member 53 of the hot plate 50. Then, the sheet 11 is held by the tube connecting portions 52 and 54 of the hot plate 50 and the vacuum paths 55 and 56 of the holding table 24 by vacuum pumping the sheet 11 at the holding member 53. The surface 53a is placed. In this state, at least the portion of the sheet 11 on which the plurality of semiconductor devices 14 are attached must be clamped to the placement surface 53a.
隨後,該量測裝置6以在它下面的加熱器51加熱該夾持台24,藉此把被貼附在該被夾持於夾持元件53之放置表面53a之薄片11上的數個分開半導體裝置14設定在一處於125℃的高溫量測環境。 Subsequently, the measuring device 6 heats the holding table 24 with the heater 51 under it, thereby separating the plurality of sheets attached to the sheet 11 held by the placing surface 53a of the holding member 53. The semiconductor device 14 is set in a high temperature measurement environment at 125 °C.
於一個在該高溫量測環境是以該加熱器51加熱來被產生之前的浸泡時間中,位置調整是被執行以致於該數個半導體裝置14中之一者的導線架14r相對於該接觸器25的探針26。更特別地,一攝影機個別地捕捉該半導體裝 置14之導線架14r的影像和該接觸器25之探針26的影像,而且該X-Y台根據它們的捕捉影像來移動該熱板50以致於該等導線架14r相對於該等探針26。 In a immersion time before the high temperature measurement environment is heated by the heater 51, the position adjustment is performed such that the lead frame 14r of one of the plurality of semiconductor devices 14 is opposite to the contactor 25 probes 26. More specifically, a camera individually captures the semiconductor package The image of the lead frame 14r of 14 and the image of the probe 26 of the contactor 25 are placed, and the X-Y stage moves the hot plate 50 according to their captured images such that the lead frames 14r are relative to the probes 26.
被放置在該夾持元件53之放置表面53a的薄片11是藉加熱在無鬆弛之下擴張。即使處於高溫量測環境,因此,該薄片11是難以擴張而且無鬆弛或起皺。因此,被貼附在該薄片11上之該數個半導體裝置14相對於該等探針26的位置與角度維持與在由該加熱器51加熱之前的位置與角度不變。據此,在該等半導體裝置14之該數個導線架14r與該接觸器25之該數個探針26之間的位置關係縱使藉由以加熱器51加熱是不被改變,而是被維持。要防止該薄片11由於該薄片11之鬆弛與起皺而不易於被夾持在該夾持元件53之放置表面53a的不便也是有可能的。 The sheet 11 placed on the placement surface 53a of the holding member 53 is expanded by heating without slack. Even in a high temperature measurement environment, the sheet 11 is difficult to expand and free from slack or wrinkles. Therefore, the positions and angles of the plurality of semiconductor devices 14 attached to the sheet 11 with respect to the probes 26 are maintained and the positions and angles before being heated by the heater 51 are unchanged. Accordingly, the positional relationship between the plurality of lead frames 14r of the semiconductor devices 14 and the plurality of probes 26 of the contactor 25 is maintained without being changed by heating with the heater 51, but is maintained . It is also possible to prevent the inconvenience that the sheet 11 is not easily caught by the placing surface 53a of the holding member 53 due to the slack and wrinkles of the sheet 11.
在該有該數個半導體裝置14被加熱的高溫量測環境中,該接觸器25的主體25a在該箭頭F的方向向下移動,所以該等探針26的前端部份26a變成與該等半導體裝置14的該數個導線架14r接觸。該測試器27的量測單元27a經由該數個探針26量測該等半導體裝置14之該數個導線架14r的導通狀態。根據量測結果,該測試器27的診斷單元27b診斷每一半導體裝置14的電氣特性。該測試器27的傳輸單元27c把診斷結果(非缺陷產品或缺陷產品)傳輸到該分類裝置8。 In the high-temperature measurement environment in which the plurality of semiconductor devices 14 are heated, the main body 25a of the contactor 25 moves downward in the direction of the arrow F, so that the front end portion 26a of the probes 26 becomes The plurality of lead frames 14r of the semiconductor device 14 are in contact. The measuring unit 27a of the tester 27 measures the conduction states of the plurality of lead frames 14r of the semiconductor devices 14 via the plurality of probes 26. Based on the measurement results, the diagnostic unit 27b of the tester 27 diagnoses the electrical characteristics of each semiconductor device 14. The transmission unit 27c of the tester 27 transmits the diagnosis result (non-defective product or defective product) to the sorting device 8.
當該測試器27完整地診斷在該高溫量測環境中 之貼附在薄片11上之所有該數個分開半導體裝置14的電氣特性時,該在它上面是貼附有該數個半導體裝置14的薄片11是被轉移到該UV硬化裝置7。 When the tester 27 is completely diagnosed in the high temperature measurement environment When the electrical characteristics of all of the plurality of divided semiconductor devices 14 attached to the sheet 11 are attached, the sheet 11 on which the plurality of semiconductor devices 14 are attached is transferred to the UV curing device 7.
該UV硬化裝置7的該數個黑燈28從該薄片11的基材11a側發射紫外線。因此,該薄片11之黏著材料11b的黏著力降低,而這樣不便於把該數個半導體裝置14自該薄片11移去。在這狀態下,該薄片11是被傳送到該分類裝置8。 The plurality of black lamps 28 of the UV curing device 7 emit ultraviolet rays from the side of the substrate 11a of the sheet 11. Therefore, the adhesive force of the adhesive material 11b of the sheet 11 is lowered, which makes it difficult to remove the plurality of semiconductor devices 14 from the sheet 11. In this state, the sheet 11 is conveyed to the sorting device 8.
該分類裝置8的接收單元31接收從該量測裝置6之測試器27傳輸之每一半導體裝置14的診斷結果。該分類裝置8的分類單元32依據該診斷結果把該數個半導體裝置14中之每一者分類成非缺陷產品或缺陷產品,並且控制該推針30俾可把被歸類為非缺陷產品的半導體裝置14推起。如在圖16中所示,被歸類為非缺陷產品的該半導體裝置14是由該推針30的前端部份30a從該薄片11下面推起。因此,該半導體裝置14是自該薄片11的黏著材料11b被移去,並且由該拾取器(圖中未示)檢拾起來。 The receiving unit 31 of the sorting device 8 receives the diagnostic result of each of the semiconductor devices 14 transmitted from the tester 27 of the measuring device 6. The classifying unit 32 of the sorting device 8 classifies each of the plurality of semiconductor devices 14 into a non-defective product or a defective product according to the diagnosis result, and controls the push pin 30 to classify the product as a non-defective product. The semiconductor device 14 is pushed up. As shown in Fig. 16, the semiconductor device 14 classified as a non-defective product is pushed up from the lower end of the sheet 11 by the front end portion 30a of the push pin 30. Therefore, the semiconductor device 14 is removed from the adhesive material 11b of the sheet 11, and is picked up by the pickup (not shown).
注意的是被歸類為缺陷產品的半玄體裝置14未由該推針30的前端部份30a從該薄片11下面推起,而是被保持貼附在該薄片11上且最後被丟棄。 Note that the semi-mystery device 14 classified as a defective product is not pushed up from the lower end portion 30a of the push pin 30 from below the sheet 11, but is kept attached to the sheet 11 and finally discarded.
被貼附在該環形框架12上之薄片11的鬆弛與起 皺是透過預熱和冷卻來被移除。在這狀態下,該薄片11是被放置在該量測裝置6之熱板50的放置表面53a上。縱使在由加熱器51加熱到125℃時,因此,該薄片11是難以擴張及鬆弛或起皺。據此,在該接觸器25之該數個探針26與該等半導體裝置14之該數個導線架14r之間的位置關係被調整之後,在它們之間的這位置關係不因由該加熱器51所作用的加熱而改變。 The slack and rise of the sheet 11 attached to the annular frame 12 Wrinkles are removed by preheating and cooling. In this state, the sheet 11 is placed on the placement surface 53a of the hot plate 50 of the measuring device 6. Even when heated by the heater 51 to 125 ° C, the sheet 11 is difficult to expand and relax or wrinkle. Accordingly, after the positional relationship between the plurality of probes 26 of the contactor 25 and the plurality of lead frames 14r of the semiconductor devices 14 are adjusted, the positional relationship between them is not caused by the heater. 51 is changed by heating.
在這實施例中,該熱板50包括該夾持元件53。如上所述,該夾持元件53可靠地把該薄片11夾持在該放置表面53a上因為已經歷過預熱與冷卻的薄片11不會鬆弛或起皺。縱使在由該加熱器51加熱時,該薄片11既不鬆弛也不起皺而且是由該夾持元件53夾持在該放置表面53a上。藉由在由該加熱器51加熱之前與之後這樣夾持該薄片11在該放置表面53a上,在該接觸器25之該數個探針26與該等半導體裝置14之該數個導線架14r之間的位置關係是被更穩定地維持。 In this embodiment, the hot plate 50 includes the clamping element 53. As described above, the holding member 53 securely holds the sheet 11 on the placement surface 53a because the sheet 11 which has undergone preheating and cooling does not slack or wrinkle. Even when heated by the heater 51, the sheet 11 is neither slack nor wrinkled and is held by the holding member 53 on the placement surface 53a. The plurality of probes 26 at the contactor 25 and the plurality of lead frames 14r of the semiconductor devices 14 are held on the placement surface 53a before and after being heated by the heater 51. The positional relationship between them is maintained more stably.
據此,該接觸器25之該數個探針26的前端部份26可靠地變成與該半導體裝置14的該數個導線架14r接觸,而該半導體裝置14的電氣特性是被量測。因此,貼附在該薄片11上之該數個半導體裝置14的電氣特性是被依序地量測。在這實施例中,因此,該數個半導體裝置14的電氣特性即使處於一高溫量測環境中依然能夠立刻被有效地量測。 Accordingly, the front end portion 26 of the plurality of probes 26 of the contactor 25 reliably becomes in contact with the plurality of lead frames 14r of the semiconductor device 14, and the electrical characteristics of the semiconductor device 14 are measured. Therefore, the electrical characteristics of the plurality of semiconductor devices 14 attached to the sheet 11 are sequentially measured. In this embodiment, therefore, the electrical characteristics of the plurality of semiconductor devices 14 can be effectively measured immediately even in a high temperature measurement environment.
注意的是一習知量測裝置包括一個大預熱結構俾可在高溫下量測半導體裝置。在該量測裝置6中,然而, 預熱能夠由該被安裝於該熱板50之夾持台24下面的加熱器51執行。由於這避免了在習知裝置中之大預熱結構的需求,因此,要簡化該裝置的結構並且縮減該裝置的尺寸與重量是有可能的。 It is noted that a conventional measuring device includes a large preheating structure that can measure semiconductor devices at high temperatures. In the measuring device 6, however, The preheating can be performed by the heater 51 mounted under the holding table 24 of the hot plate 50. Since this avoids the need for a large preheating structure in conventional devices, it is possible to simplify the structure of the device and to reduce the size and weight of the device.
接著,本發明的第二實施例將會被說明。如在圖17中所示,一半導體裝置量測系統101包括一自動薄片貼附裝置2、自動半導體條帶貼附裝置4、切割裝置5、薄片預熱裝置3、量測裝置6、UV硬化裝置7、及分類裝置8。該半導體裝置量測系統101的構成元件是與第一實施例之半導體裝置量測系統1的那些相同,但前者的佈局是與後者的佈局不同。即,這實施例與該第一實施例的不同為製程步驟的順序。 Next, a second embodiment of the present invention will be explained. As shown in FIG. 17, a semiconductor device measuring system 101 includes an automatic sheet attaching device 2, an automatic semiconductor strip attaching device 4, a cutting device 5, a sheet preheating device 3, a measuring device 6, and UV hardening. Device 7, and sorting device 8. The constituent elements of the semiconductor device measuring system 101 are the same as those of the semiconductor device measuring system 1 of the first embodiment, but the layout of the former is different from the layout of the latter. That is, the difference between this embodiment and the first embodiment is the order of the process steps.
更具體地,在該半導體裝置量測系統101中,該薄片預熱裝置3是被配置在該切割裝置5之後與在該量測裝置6之前。即,如在圖18中所示,由該薄片預熱裝置3所作用的薄片預熱步驟S2是在由該切割裝置5所作用的切割步驟S4之後,與在由該量測裝置6所作用的放置步驟S5之前被執行。 More specifically, in the semiconductor device measuring system 101, the sheet preheating device 3 is disposed after the cutting device 5 and before the measuring device 6. That is, as shown in Fig. 18, the sheet preheating step S2 by the sheet preheating device 3 is after the cutting step S4 by the cutting device 5, and is operated by the measuring device 6. The placement step S5 is performed before.
縱使在該切割裝置5把一半導體條帶13分成數個半導體裝置14之後,該薄片預熱裝置3能夠藉由給予該薄片11張力來把鬆弛和起皺從一在它上面貼附有該數個分開半導體裝置14的薄片11移除,如果該時序是在該量測裝置6調整該數個半導體裝置14與一接觸器25之探針26的位置之前 的話。如在該第一實施例中,因此,即使在一高溫量測環境下該量測裝置6能夠有效地立刻量測該數個半導體裝置14的電氣特性。 Even after the cutting device 5 divides a semiconductor strip 13 into a plurality of semiconductor devices 14, the sheet preheating device 3 can attach the slack and wrinkles from a sheet by applying tension to the sheet 11 The sheets 11 of the separate semiconductor device 14 are removed, if the timing is before the measuring device 6 adjusts the positions of the plurality of semiconductor devices 14 and the probe 26 of a contactor 25. if. As in the first embodiment, therefore, even in a high temperature measurement environment, the measuring device 6 can effectively measure the electrical characteristics of the plurality of semiconductor devices 14 at once.
本發明的第三實施例將會在下面作說明。如在圖19中所示,一半導體裝置量測系統102包括一自動薄片貼附裝置2、自動半導體條帶貼附裝置4、薄片預熱裝置3、切割裝置5、量測裝置6、UV硬化裝置7、及分類裝置8。該半導體裝置量測系統102的構成元件是與第一實施例之半導體裝置量測系統1的那些相同,但前者的佈局是與後者的佈局不同。即,這實施例與該第一實施例的不同為製程步驟的順序。 A third embodiment of the present invention will be described below. As shown in FIG. 19, a semiconductor device measuring system 102 includes an automatic sheet attaching device 2, an automatic semiconductor strip attaching device 4, a sheet preheating device 3, a cutting device 5, a measuring device 6, and UV hardening. Device 7, and sorting device 8. The constituent elements of the semiconductor device measuring system 102 are the same as those of the semiconductor device measuring system 1 of the first embodiment, but the layout of the former is different from the layout of the latter. That is, the difference between this embodiment and the first embodiment is the order of the process steps.
更具體地,在該半導體裝置量測系統102中,該薄片預熱裝置3是被配置在該自動半導體條帶貼附裝置4之後與該切割裝置5之前。即,如在圖20中所示,由該薄片預熱裝置3所作用的薄片預熱步驟S2是在由該自動半導體條帶貼附裝置4所作的自動半導體條帶貼附步驟S3之後與在由該切割裝置5所作用的切割步驟S4之前被執行。 More specifically, in the semiconductor device measuring system 102, the sheet preheating device 3 is disposed before the automatic semiconductor strip attaching device 4 and before the cutting device 5. That is, as shown in Fig. 20, the sheet preheating step S2 by the sheet preheating device 3 is after the automatic semiconductor strip attaching step S3 by the automatic semiconductor strip attaching device 4 The cutting step S4, which is acted upon by the cutting device 5, is executed before.
縱使在一半導體條帶13被貼附於一薄片11上之後及在該切割裝置5把該半導體條帶13分成數個半導體裝置14之前,該薄片預熱裝置3能夠藉由給予該薄片11張力來把鬆弛和起皺從一在它上面貼附有該半導體條帶13的薄片11移除,如果該時序是在該量測裝置6調整該數個半導體裝置14與一接觸器25之探針26的位置之前的話。如在該第一 實施例中,因此,即使在一高溫量測環境下該量測裝置6能夠有效地立刻量測該數個半導體裝置14的電氣特性。 The sheet preheating device 3 can impart tension to the sheet 11 even after the semiconductor strip 13 is attached to a sheet 11 and before the cutting device 5 divides the semiconductor strip 13 into a plurality of semiconductor devices 14. To remove slack and wrinkles from a sheet 11 to which the semiconductor strip 13 is attached, if the timing is to adjust the probes of the plurality of semiconductor devices 14 and a contactor 25 at the measuring device 6. 26 positions before the words. As in the first In the embodiment, therefore, even in a high temperature measurement environment, the measuring device 6 can effectively measure the electrical characteristics of the plurality of semiconductor devices 14 at once.
本發明的第四實施例將會在下面作說明。在該第四實施例中,於圖21中所示的一熱板70替換該第一至第三實施例中之每一者之量測裝置6的熱板50。據此,一自動薄片貼附裝置2、薄片預熱裝置3、自動半導體條帶貼附裝置4、切割裝置5、量測裝置6、UV硬化裝置7、及分類裝置8,除了該熱板70之外,是與該第一、第二、和第三實施例之半導體裝置量測系統1,101,和102的構成元件相同。 A fourth embodiment of the present invention will be described below. In the fourth embodiment, a hot plate 70 shown in Fig. 21 replaces the hot plate 50 of the measuring device 6 of each of the first to third embodiments. Accordingly, an automatic sheet attaching device 2, a sheet preheating device 3, an automatic semiconductor strip attaching device 4, a cutting device 5, a measuring device 6, a UV hardening device 7, and a sorting device 8 are provided, except for the hot plate 70. It is the same as the constituent elements of the semiconductor device measuring systems 1, 101, and 102 of the first, second, and third embodiments.
如在圖21和22中所示,該熱板70包括一加熱器51,像該熱板50一樣。在平面圖中具有一長方形形狀的一夾持台71是被固定在該加熱器51上。數個彼此連接的凹槽72是形成在該夾持台71的放置表面71a。該夾持台71是由鋁製成。因此,該夾持台71當它是由加熱器51加熱時的溫度是均稱的。注意的是該夾持台71不必是由鋁製成而也可以是由其他具有高導熱性的金屬材料形成。 As shown in Figs. 21 and 22, the hot plate 70 includes a heater 51 like the hot plate 50. A holding table 71 having a rectangular shape in plan view is fixed to the heater 51. A plurality of grooves 72 connected to each other are formed on the placement surface 71a of the holding table 71. The holding table 71 is made of aluminum. Therefore, the temperature of the holding table 71 when it is heated by the heater 51 is uniform. It is to be noted that the holding table 71 does not have to be made of aluminum or may be formed of other metal materials having high thermal conductivity.
在側視圖中各具有一L形狀的兩真空路徑75和兩真空路徑76是形成在該夾持台71內部。該等真空路徑75和76中之每一者的一端與該數個凹槽72中之一者連通,而該等真空路徑75和76的另一端是通向該夾持台71的側表面71b和71c。兩個管連接元件73和兩個管連接元件74被固定到該夾持台71的側表面71b和71c。貫孔73a和74a是形成在該等管連接元件73和74。該等管連接元件73和74的貫孔73a 和74a是連接到該夾持台71的真空路徑75和76。一真空幫浦(圖中未示)是連接到該等管連接元件73和74。 Two vacuum paths 75 each having an L shape and two vacuum paths 76 in the side view are formed inside the holding table 71. One end of each of the vacuum paths 75 and 76 is in communication with one of the plurality of grooves 72, and the other ends of the vacuum paths 75 and 76 are side surfaces 71b leading to the clamping table 71. And 71c. Two tube connecting members 73 and two tube connecting members 74 are fixed to the side surfaces 71b and 71c of the holding table 71. Through holes 73a and 74a are formed in the pipe connecting members 73 and 74. Through holes 73a of the pipe connecting members 73 and 74 And 74a are vacuum paths 75 and 76 that are connected to the holding stage 71. A vacuum pump (not shown) is connected to the tube connecting members 73 and 74.
一放置在該夾持台71之放置表面71a上的薄片11是透過被曝露於該放置表面71a的該數個凹槽72由該真空幫浦抽吸,並且被夾持在該放置表面71a上。 A sheet 11 placed on the placement surface 71a of the holding table 71 is sucked by the vacuum pump through the plurality of grooves 72 exposed to the placement surface 71a, and is clamped on the placement surface 71a. .
如在圖7中所示之一用於偵測數個半導體裝置14之電氣狀態的接觸器25是被配置在該夾持台71之上,而一測試器27是連接到該接觸器25。 A contactor 25 for detecting the electrical state of a plurality of semiconductor devices 14 as shown in FIG. 7 is disposed above the clamping table 71, and a tester 27 is connected to the contactor 25.
如在該第一實施例中一樣,縱使在由該加熱器51加熱到125℃時該已經歷預熱與冷卻的薄片11是難以擴張,且無鬆弛或起皺。即使處於高溫量測環境中,因此,該薄片11是被夾持在該夾持台71的放置表面71a上。這避免當該接觸器25之探針26變成與被貼附於該薄片11上之半導體裝置14之導線架14r接觸時所產生之碰撞改變該半導體裝置14和薄片11之位置,而貼附在該薄片11上之另一半導體裝置14無法再被量測的不便。 As in the first embodiment, even when heated by the heater 51 to 125 ° C, the sheet 11 which has undergone preheating and cooling is difficult to expand, and there is no slack or wrinkle. Even in a high temperature measurement environment, the sheet 11 is held on the placement surface 71a of the holding table 71. This prevents the collision of the probe 26 of the contactor 25 when it comes into contact with the lead frame 14r of the semiconductor device 14 attached to the sheet 11 to change the position of the semiconductor device 14 and the sheet 11, and is attached thereto. The inconvenience of the other semiconductor device 14 on the sheet 11 can no longer be measured.
在該第一至第四實施例中之每一者,藉由切割半導體條帶13來被得到之半導體裝置14是為高溫量測之目標的範例業已作描述。然而,藉由切割一半導體晶圓來被得到之半導體晶片也可以如同半導體裝置一樣是為高溫量測的目標。 In each of the first to fourth embodiments, the semiconductor device 14 obtained by cutting the semiconductor strip 13 is an example of a target for high temperature measurement. However, a semiconductor wafer obtained by cutting a semiconductor wafer can also be a target for high temperature measurement like a semiconductor device.
在該第一至第四實施例中之每一者中,薄片11被貼附於該環形框架12上而然後半導體條帶13被貼附於該 薄片11上的範例業已作描述。然後,把該半導體條帶13貼附於7薄片11上,而然後把該薄片11貼附於該環形框架12上也是有可能的。在這情況中,自動半導體條帶貼附步驟S3是首先被執行,而然後自動薄片貼附步驟S1被執行。 In each of the first to fourth embodiments, the sheet 11 is attached to the annular frame 12 and then the semiconductor strip 13 is attached thereto. An example on the sheet 11 has been described. Then, it is also possible to attach the semiconductor strip 13 to the 7 sheet 11, and then attach the sheet 11 to the annular frame 12. In this case, the automatic semiconductor strip attaching step S3 is performed first, and then the automatic sheet attaching step S1 is performed.
在該第一至第四實施例中之每一者中,被貼附於該薄片11上之半導體裝置14之電氣特性是在該薄片11被夾持於該夾持元件53之放置表面53a或該夾持台71之放置表面71a之下被量測的範例業已作描述。然而,預熱薄片11的使用使得在沒有把該薄片11夾持在該放置表面53a或71a之下,要抑制在接觸器25之該數個探針26與該等半導體裝置14之該數個導線架14r之間的位置關係不因由加熱器51加熱而改變是有可能的。 In each of the first to fourth embodiments, the electrical characteristics of the semiconductor device 14 attached to the sheet 11 are such that the sheet 11 is clamped to the placement surface 53a of the holding member 53 or An example in which the placement surface 71a of the holding table 71 is measured is described. However, the use of the preheating sheet 11 is such that the plurality of probes 26 of the contactor 25 and the plurality of semiconductor devices 14 are suppressed without holding the sheet 11 under the placement surface 53a or 71a. It is possible that the positional relationship between the lead frames 14r is not changed by heating by the heater 51.
在該第一至第四實施例中之每一者中,處於最高125℃之高溫量測環境是由該熱板50或70產生且半導體裝置14之電氣特性是在這高溫量測環境下被量測的範例業已作描述。然而,高溫量測環境的溫度不被限定為125℃而也可以是85℃至150℃。 In each of the first to fourth embodiments, the high temperature measurement environment at a maximum of 125 ° C is generated by the hot plate 50 or 70 and the electrical characteristics of the semiconductor device 14 are in this high temperature measurement environment. Measurement examples have been described. However, the temperature of the high temperature measuring environment is not limited to 125 ° C but may be 85 ° C to 150 ° C.
在該第一至第四實施例中之每一者中,預熱是藉由在一處於一比室溫高之溫度(第二溫度),例如,100或更高,之高溫環境中加熱該薄片11一預定預熱時間(例如,2分鐘或更多)來被執行。在這步驟中,用於把殘留水份從半導體裝置14移去的烘烤能夠藉由把該預熱時間設定到適足長的時間來被執行。習知的薄片無法抵抗烘烤的這種高溫環境。因此,烘烤無法藉由把數個半導體裝置貼附於該薄 片上來被執行。相對地,由PET製成的該薄片11能夠抵抗長時間加熱。據此,數個半導體裝置14藉由把它們貼附在該PET薄片11上而能夠有效地烘烤。此外,由於該等半導體裝置14是藉由使用預熱來被烘烤,不必獨立地執行任何烘烤步驟。注意的是當執行烘烤時的預熱時間是被設定為一個在它期間半導體裝置14之殘留水份是被移去的時間,例如,8小時。 In each of the first to fourth embodiments, the preheating is performed by heating in a high temperature environment at a temperature higher than room temperature (second temperature), for example, 100 or higher. The sheet 11 is executed for a predetermined warm-up time (for example, 2 minutes or more). In this step, the baking for removing the residual moisture from the semiconductor device 14 can be performed by setting the warm-up time to a sufficiently long time. Conventional flakes are not resistant to this high temperature environment of baking. Therefore, baking cannot be attached to the thin by attaching a plurality of semiconductor devices The film is executed. In contrast, the sheet 11 made of PET is resistant to prolonged heating. Accordingly, a plurality of semiconductor devices 14 can be efficiently baked by attaching them to the PET sheet 11. Furthermore, since the semiconductor devices 14 are baked by using preheating, it is not necessary to perform any baking step independently. Note that the warm-up time when baking is performed is set to a time during which the residual moisture of the semiconductor device 14 is removed, for example, 8 hours.
在該第一至第四實施例中之每一者中,黑燈28被使用於UV硬化裝置7的範例業已作描述。然而,要使用金屬鹵化物燈、水銀燈等等取代黑燈28也是有可能的。 In each of the first to fourth embodiments, the black lamp 28 has been described using the example of the UV hardening device 7. However, it is also possible to replace the black lamp 28 with a metal halide lamp, a mercury lamp, or the like.
在該第一至第四實施例中之每一者中,分類裝置8在由UV硬化裝置7所作用的UV硬化之後把該等半導體裝置14分類的範例業已作描述。然而,要在該等半導體裝置14之由該分類裝置8所作用的分類之後執行由該UV硬化裝置7所作用的UV硬化,而然後卸載該等半導體裝置14也是有可能的。 In each of the first to fourth embodiments, an example in which the sorting means 8 classifies the semiconductor devices 14 after UV hardening by the action of the UV hardening means 7 has been described. However, it is also possible to perform UV hardening by the UV curing device 7 after the classification of the semiconductor devices 14 by the classification device 8, and then unload the semiconductor devices 14.
1‧‧‧半導體裝置量測系統 1‧‧‧Semiconductor device measurement system
2‧‧‧自動薄片貼附裝置 2‧‧‧Automatic sheet attachment device
3‧‧‧薄片預熱裝置 3‧‧‧Sheet preheating device
4‧‧‧自動半導體仔帶貼附裝置 4‧‧‧Automatic semiconductor tape attachment device
5‧‧‧切割裝置 5‧‧‧ Cutting device
6‧‧‧量測裝置 6‧‧‧Measurement device
7‧‧‧UV硬化裝置 7‧‧‧UV hardening device
8‧‧‧分類裝置 8‧‧‧Classification device
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| JP2015019112A JP6626254B2 (en) | 2015-02-03 | 2015-02-03 | Semiconductor device measurement method |
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| TWI754065B (en) | 2017-06-23 | 2022-02-01 | 日商三井化學東賽璐股份有限公司 | Parts manufacturing apparatus and parts manufacturing method |
| US11573266B2 (en) * | 2019-12-30 | 2023-02-07 | Texas Instruments Incorporated | Electronic device temperature test on strip film frames |
| JP7759759B2 (en) * | 2021-10-11 | 2025-10-24 | 三井化学Ictマテリア株式会社 | Electronic component manufacturing apparatus and electronic component manufacturing method |
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| MY173457A (en) | 2020-01-26 |
| PH12016000039B1 (en) | 2018-12-21 |
| JP2016142649A (en) | 2016-08-08 |
| JP6626254B2 (en) | 2019-12-25 |
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