TWI565546B - A method for micro-electrolytic machining with deionized water - Google Patents
A method for micro-electrolytic machining with deionized water Download PDFInfo
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- TWI565546B TWI565546B TW104144273A TW104144273A TWI565546B TW I565546 B TWI565546 B TW I565546B TW 104144273 A TW104144273 A TW 104144273A TW 104144273 A TW104144273 A TW 104144273A TW I565546 B TWI565546 B TW I565546B
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- 239000008367 deionised water Substances 0.000 title claims description 90
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims description 90
- 229910021641 deionized water Inorganic materials 0.000 title claims description 89
- 238000000034 method Methods 0.000 title claims description 35
- 238000003754 machining Methods 0.000 title claims description 11
- 238000005868 electrolysis reaction Methods 0.000 claims description 39
- 239000006061 abrasive grain Substances 0.000 claims description 35
- 238000003672 processing method Methods 0.000 claims description 34
- 239000002245 particle Substances 0.000 claims description 12
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 8
- 238000003801 milling Methods 0.000 claims description 6
- 229910052582 BN Inorganic materials 0.000 claims description 3
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 3
- 229910003460 diamond Inorganic materials 0.000 claims description 3
- 239000010432 diamond Substances 0.000 claims description 3
- 238000005553 drilling Methods 0.000 claims description 2
- 230000003746 surface roughness Effects 0.000 description 17
- 239000010802 sludge Substances 0.000 description 10
- 230000005684 electric field Effects 0.000 description 8
- 230000002159 abnormal effect Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000012876 topography Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000000227 grinding Methods 0.000 description 3
- 229910052684 Cerium Inorganic materials 0.000 description 2
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 2
- 238000001878 scanning electron micrograph Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000004626 scanning electron microscopy Methods 0.000 description 1
- 239000002893 slag Substances 0.000 description 1
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- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Description
本發明係關於一種電解加工方法,特別是一種去離子水微電解加工方法。 The invention relates to an electrolytic processing method, in particular to a deionized water microelectrolysis processing method.
精微模具加工技術所製作之精微模具常應用於製造精密儀器與微電子產業等之精密零件,且常以微電解加工方法製作該精微模具,該微電解加工方法中一般係使用一電解質調製之電解液,而亦有使用一去離子水之微電解加工方法。其中,習知之去離子水微電解加工方法如第1a圖,係包含將一工件9作為一陽極,將一刀具8作為一陰極,該刀具8具有一加工部81,於流動之去離子水中,並於28V之電壓及2.3A/cm2之電流密度下,使流經該加工部81與該工件9之間的去離子水發生電解,而進行微電解加工。 The fine molds produced by the micro-mold processing technology are often used to manufacture precision parts such as precision instruments and microelectronics industries, and the micro-dies are often produced by micro-electrolysis processing methods, which generally use an electrolyte-modulated electrolysis. Liquid, but also a micro-electrolysis process using a deionized water. The conventional deionized water micro-electrolysis processing method, as shown in FIG. 1a, includes a workpiece 9 as an anode and a cutter 8 as a cathode. The cutter 8 has a processing portion 81 in the flowing deionized water. and at a voltage of 28V and 2.3A / cm 2 of current density, flowing through the electrolytic processing portion 81 with the deionized water between the workpiece 9, the micro electrochemical machining.
然而,該方法中在進行微電解加工之同時,刀具8與工件9之間亦會發生放電現象,進而導致加工所得之凹穴的表面粗度大、外觀形貌不良,不足以作為精密零件使用。 However, in this method, while micro-electrolysis processing is performed, a discharge phenomenon occurs between the cutter 8 and the workpiece 9, which results in a large surface roughness and a poor appearance of the pocket obtained by the processing, which is insufficient for use as a precision part. .
因此,需要一種去離子水微電解加工方法,可以製作表面粗度小且外觀平整之凹穴或任意路徑之銑削加工面。 Therefore, there is a need for a deionized water microelectrolysis machining method which can produce a pocket having a small surface roughness and a flat appearance or a milling surface of an arbitrary path.
本發明係提供一種去離子水微電解加工方法,可以製作表面粗度小且外觀平整之凹穴或任意路徑之銑削加工面。 The invention provides a deionized water micro-electrolysis processing method, which can produce a milling surface with a small surface roughness and a flat appearance or an arbitrary path.
一種去離子水微電解加工方法,係包含:將一工件設置於陽極,將一刀具設置於陰極,並將該工件及該刀具浸入一去離子水中,該刀具具有一加工部,該加工部朝向該工件;及於流動之去離子水中,並於20~50V之電壓及25~200A/cm2之電流密度下,使該刀具以該加工部對該工件進行微電解加工,其中,該流動之去離子水的比電阻值為20~120kΩ-cm。藉此,可降低該去離子水微電解加工中發生放電現象的可能性,得到表面粗度小且外觀平整之凹穴或任意路徑之銑削加工面。 A method for micro-electrolysis of deionized water, comprising: disposing a workpiece on an anode, placing a cutter on a cathode, and immersing the workpiece and the cutter in a deionized water, the cutter having a processing portion, the processing portion is oriented The workpiece; and in the flowing deionized water, and at a current density of 20 to 50 V and a current density of 25 to 200 A/cm 2 , the tool is subjected to microelectrolysis processing of the workpiece by the processing portion, wherein the flow is The specific resistance of deionized water is 20~120kΩ-cm. Thereby, the possibility of occurrence of a discharge phenomenon in the deionized water microelectrolysis process can be reduced, and a milled surface having a small surface roughness and a flat appearance or an arbitrary path can be obtained.
其中,該加工部係呈球狀或近似於圓球之凸形非球面狀,且該加工部的最大直徑為0.01~1.0mm。藉此,可以使該電流密度分布均勻而避免該工件之形貌不均。 The processed portion has a spherical shape or a convex aspherical shape similar to a sphere, and the processed portion has a maximum diameter of 0.01 to 1.0 mm. Thereby, the current density distribution can be made uniform to avoid the unevenness of the shape of the workpiece.
其中,該刀具之加工部係以60~1000rpm之轉速進行微電解加工。藉此,可以使微電解加工的電場均勻作用於該工件。 Among them, the processing part of the tool performs microelectrolysis processing at a rotation speed of 60 to 1000 rpm. Thereby, the electric field of the microelectrolysis process can be uniformly applied to the workpiece.
其中,該刀具之加工部係以相對於該工件為10~40μm/min之進給速度進行微電解加工。藉此,可供微電解加工以適當之時間進行。 The processing portion of the tool is subjected to microelectrolysis processing at a feed rate of 10 to 40 μm/min with respect to the workpiece. Thereby, microelectrolysis processing can be performed at an appropriate time.
其中,係施加50~100mA之一電流於該工件及該刀具,以使該電流密度達25~200A/cm2。藉此,可以穩定地進行加工,避免電流提供之能量過大而產生放電現象。 Wherein, a current of 50 to 100 mA is applied to the workpiece and the cutter so that the current density reaches 25 to 200 A/cm 2 . Thereby, the processing can be performed stably, and the discharge of the electric current is prevented from being excessively generated.
其中,該電流係為脈寬為0.1~0.5μs之一脈衝直流電流。藉此,可以使用適當之能量進行電解加工而避免過度加工。 The current is a pulsed direct current with a pulse width of 0.1 to 0.5 μs. Thereby, electrolytic processing can be performed using appropriate energy to avoid over-processing.
其中,該流動之去離子水中包含一磨粒。藉此,進行去離子水微電解加工之同時可對該工件進行研磨。 Wherein the flowing deionized water comprises an abrasive grain. Thereby, the workpiece can be polished while performing deionized water microelectrolysis processing.
其中,該磨粒係為一氧化鋁磨粒、一鑽石磨粒、一立方氮化硼磨粒或一碳化矽磨粒。藉此,可增加對於該工件的加工量。 Wherein, the abrasive particles are an alumina abrasive grain, a diamond abrasive grain, a cubic boron nitride abrasive grain or a carbonized cerium abrasive grain. Thereby, the amount of processing for the workpiece can be increased.
其中,該磨粒之粒徑為1.0~5.0μm。藉此,可避免該磨粒阻擋該去離子水導電之通道。 The particle size of the abrasive grains is 1.0 to 5.0 μm. Thereby, the passage of the abrasive particles to block the deionized water conduction can be avoided.
本發明之去離子水微電解加工方法,係藉由適當設定之電壓及電流密度,可以得到表面粗度小且外觀平整之凹穴或任意路徑之銑削加工面,並可以應用於製造精微模具。 In the deionized water micro-electrolysis processing method of the present invention, by appropriately setting the voltage and current density, a milled surface having a small surface roughness and a flat appearance or an arbitrary path can be obtained, and can be applied to manufacture a fine mold.
(本發明) (this invention)
1‧‧‧刀具 1‧‧‧Tools
11‧‧‧加工部 11‧‧‧Processing Department
2‧‧‧工件 2‧‧‧Workpiece
21‧‧‧加工區域 21‧‧‧Processing area
(習知) (known)
8‧‧‧刀具 8‧‧‧Tools
81‧‧‧加工部 81‧‧‧Processing Department
9‧‧‧工件 9‧‧‧Workpiece
91‧‧‧加工區域 91‧‧‧Processing area
第1a圖:習知刀具進行微電解加工之示意圖。 Figure 1a: Schematic diagram of a conventional tool for microelectrolysis machining.
第1b圖:習知刀具之加工部形狀及電場示意圖。 Figure 1b: Schematic diagram of the shape and electric field of the processed part of the conventional tool.
第2a圖:球狀刀具之加工部形狀及電場示意圖。 Figure 2a: Schematic diagram of the shape and electric field of the machining part of the spherical tool.
第2b圖:球狀刀具之加工部的外觀。 Figure 2b: Appearance of the processed part of the spherical cutter.
第3a圖:本發明之去離子水微電解加工方法製作之微凹坑的底部巨觀形貌圖。 Fig. 3a is a diagram showing the macroscopic topography of the micro-pits produced by the deionized water microelectrolysis processing method of the present invention.
第3b圖:本發明之去離子水微電解加工方法中添加氧化鋁製作之微凹坑的底部巨觀形貌圖。 Fig. 3b is a top view of the bottom view of the micro-pits made of alumina added to the deionized water microelectrolysis processing method of the present invention.
第4a圖:本發明之去離子水微電解加工方法製作之微凹坑的底部SEM影像。 Figure 4a: Bottom SEM image of micro-pits made by the deionized water microelectrolysis process of the present invention.
第4b圖:本發明之去離子水微電解加工方法中添加氧化鋁所製作之微凹坑的底部SEM影像。 Figure 4b: Bottom SEM image of micro-pits made by adding alumina to the deionized water microelectrolysis process of the present invention.
第5a圖:本發明之去離子水微電解加工方法製作之深槽的外觀。 Figure 5a: Appearance of the deep trench made by the deionized water microelectrolysis processing method of the present invention.
第5b圖:本發明之去離子水微電解加工方法製作之深槽的表面形貌圖。 Figure 5b: Surface topography of a deep trench made by the deionized water microelectrolysis processing method of the present invention.
第5c圖:本發明之去離子水微電解加工方法製作之深槽的底部輪廓圖。 Figure 5c is a bottom profile view of a deep trench made by the deionized water microelectrolysis process of the present invention.
第6a圖:本發明之去離子水微電解加工方法製作之半徑0.5mm之微流道的外觀。 Fig. 6a is a view showing the appearance of a microchannel having a radius of 0.5 mm produced by the deionized water microelectrolysis processing method of the present invention.
第6b圖:本發明之去離子水微電解加工方法製作之半徑1.0mm之微 流道的中段表面形貌圖。 Figure 6b: The micro-electrolysis processing method of the deionized water of the present invention has a radius of 1.0 mm The middle surface topography of the flow channel.
第7a圖:本發明之去離子水微電解加工方法製作之方槽的外觀。 Fig. 7a is a view showing the appearance of a square groove produced by the deionized water microelectrolysis processing method of the present invention.
第7b圖:本發明之去離子水微電解加工方法製作之方槽的表面形貌圖。 Figure 7b: Surface topography of the square groove produced by the deionized water microelectrolysis processing method of the present invention.
為讓本發明之上述及其他目的、特徵及優點能更明顯易懂,下文特舉本發明之實施例,並配合所附圖式,作詳細說明如下:如第2a圖所示,本發明之去離子水微電解加工方法,係包含:將一工件2作為一陽極,將一刀具1作為一陰極,該刀具1具有一加工部11,該工件2具有一加工區域21,該刀具1之該加工部11係可以朝向該加工區域21,且可以使該加工部11及該加工區域21相對移動,例如,該加工部11可以依據一預定移動路徑進行移動,進而使該加工部11於該加工區域21加工形成一預計形狀。 The above and other objects, features and advantages of the present invention will become more <RTIgt; The deionized water micro-electrolysis processing method comprises: using a workpiece 2 as an anode and a cutter 1 as a cathode, the cutter 1 having a processing portion 11 having a processing region 21, the cutter 1 The processing portion 11 can face the processing region 21, and the processing portion 11 and the processing region 21 can be relatively moved. For example, the processing portion 11 can be moved according to a predetermined movement path, and the processing portion 11 can be processed. Area 21 is machined to form a projected shape.
本發明之去離子水微電解加工方法另包含:於流動之去離子水中,並於規定之電壓及電流密度下,使該刀具1以該加工部11對該工件2進行微電解加工。詳而言之,使該去離子水流動係可以沖走加工產生之泥渣,避免該泥渣累積於該加工區域21內而妨礙微電解加工,並更新該加工區域21內經微電解加工後比電阻值發生改變之該去離子水。又,可以裝設一循環槽,使該去離子水循環流動,並設定該去離子水於特定時間循環流動後更換該去離子水,可減少該去離子水的用量。 The method for microelectrolysis of deionized water according to the present invention further comprises: subjecting the tool 1 to microelectrolysis processing of the workpiece 2 by the processing portion 11 in flowing deionized water at a predetermined voltage and current density. In detail, the deionized water flow system can wash away the sludge generated by the processing, prevent the sludge from accumulating in the processing region 21, hinder the micro-electrolysis processing, and update the ratio of the micro-electrolysis processing in the processing region 21 The deionized water whose resistance value changes. Moreover, a circulation tank can be installed to circulate the deionized water, and the deionized water is set to be circulated for a specific time to replace the deionized water, thereby reducing the amount of the deionized water.
又,該電壓係可以為20~50V,該電流密度係可以為25~200A/cm2,若該電壓大於50V則容易導致該去離子水發生介電崩潰而造成放電現象,並耗損該刀具1,無法進行該去離子水的微電解加工,另一方面,若該電壓小於20V,則因產生之微電解加工之該電流密度過低,易導致異常退刀而無法順利加工。又,若該電流密度大於200A/cm2,則該去離子水 容易發生放電現象,導致於該加工區域21底部造成孔蝕痕跡,另一方面,若該電流密度小於25A/cm2,則因該電流密度過低,易導致異常退刀而無法順利加工。 Further, the line voltage may be 20 ~ 50V, the current density is based may be 25 ~ 200A / cm 2, if the voltage is greater than 50V can easily lead to the occurrence of the deionized water dielectric discharge phenomenon caused by the collapse, and the tool wear 1 On the other hand, if the voltage is less than 20 V, the current density due to the microelectrolysis process generated is too low, and the abnormal retraction is likely to occur, and the smooth processing cannot be performed smoothly. Moreover, if the current density is greater than 200 A/cm 2 , the deionized water is prone to discharge, resulting in a pitting mark at the bottom of the processing region 21, and if the current density is less than 25 A/cm 2 , The current density is too low, which may cause abnormal retraction and cannot be processed smoothly.
又,本發明之去離子水微電解加工方法中,係可以施加50~100mA之電流,並適當搭配後述之該刀具1的設計及尺寸,以達到25~200A/cm2之電流密度,藉此,可以穩定地進行加工,避免該電流提供之能量過大而產生放電現象,若該電流大於100mA,則該去離子水容易發生放電現象,而無法進行該去離子水的微電解加工,另一方面,若該電流小於50mA,則因提供之能量過低而難以發生該去離子水的微電解加工。 Further, in the deionized water microelectrolysis processing method of the present invention, a current of 50 to 100 mA can be applied, and the design and size of the tool 1 described later can be appropriately matched to achieve a current density of 25 to 200 A/cm 2 . The processing can be stably performed to avoid the excessive energy generated by the current to generate a discharge phenomenon. If the current is greater than 100 mA, the deionized water is prone to discharge, and the micro-electrolysis processing of the deionized water cannot be performed. If the current is less than 50 mA, the microelectrolysis processing of the deionized water is difficult to occur because the energy supplied is too low.
又,該電流係可以為一脈衝直流電流,藉由使用該脈衝直流電流,電路呈現通路時可進行加工,而於斷路時可清除該加工區域21內沉積的泥渣,以避免過多的該泥渣沉積而妨礙該去離子水微電解加工之進行,且該去離子水緩慢流動之情況,亦可藉由斷路之時間充分清除該泥渣。又,該脈衝直流電流較佳係使脈寬為0.1~0.5μs,由於該脈寬係與該電流提供之微電解加工之能量成正比,藉由將該脈寬設定為該範圍內,可以使用適當之能量進行微電解加工,若該脈寬大於0.5μs,則容易導致對該工件2過度加工,另一方面,若該脈寬小於0.1μs,則容易導致異常退刀,使該刀具1的進給深度無法達到0.01mm,且異常退刀會造成該加工區域21的表面發生點蝕現象。又,脈衝斷路時間較佳為0.2~1.0μs,藉此,可供流動之該去離子水適度地清除該泥渣,若該脈衝斷路時間大於1.0μs,則會使微電解加工效率降低,另一方面,若該脈衝斷路時間小於0.2μs,則該泥渣的清除效果不足,經過長時間加工後可能導致該泥渣沉積而妨礙微電解加工之進行。 Moreover, the current system can be a pulsed direct current. By using the pulsed direct current, the circuit can be processed when the circuit is in the path, and the sludge deposited in the processing region 21 can be removed during the disconnection to avoid excessive mud. When the slag is deposited to hinder the progress of the deionized water microelectrolysis process, and the deionized water flows slowly, the sludge can be sufficiently removed by the time of the disconnection. Moreover, the pulsed direct current preferably has a pulse width of 0.1 to 0.5 μs, and since the pulse width is proportional to the energy of the microelectrolysis process provided by the current, by setting the pulse width to be within the range, the pulse width can be used. If the pulse width is greater than 0.5 μs, the workpiece 2 is excessively processed. On the other hand, if the pulse width is less than 0.1 μs, the abnormal retraction is likely to occur, and the tool 1 is easily removed. The feed depth cannot reach 0.01 mm, and abnormal retraction causes pitting on the surface of the processing region 21. Moreover, the pulse breaking time is preferably 0.2 to 1.0 μs, whereby the deionized water for flowing can appropriately remove the sludge, and if the pulse breaking time is more than 1.0 μs, the microelectrolysis processing efficiency is lowered, and On the one hand, if the pulse breaking time is less than 0.2 μs, the removal effect of the sludge is insufficient, and after a long time of processing, the sludge may be deposited to hinder the progress of the micro-electrolysis process.
又,該去離子水的比電阻值係可以為20~120kΩ-cm,藉此,可降低該去離子水於微電解加工時發生放電現象的可能性,若該比電阻值 大於120kΩ-cm,則容易發生放電現象,而難以進行該去離子水的微電解加工,另一方面,若該比電阻值小於20kΩ-cm,則隨著該泥渣累積,使該去離子水中的導電離子濃度過高而難以進行微電解加工。 Moreover, the specific resistance value of the deionized water may be 20 to 120 kΩ-cm, thereby reducing the possibility of discharge of the deionized water during microelectrolysis processing, if the specific resistance value When it is larger than 120 kΩ-cm, discharge phenomenon is likely to occur, and it is difficult to perform microelectrolysis processing of the deionized water. On the other hand, if the specific resistance value is less than 20 kΩ-cm, the deionized water is made as the sludge accumulates. The concentration of the conductive ions is too high to perform microelectrolysis processing.
此外,本發明之去離子水微電解加工方法中,更可以藉由該刀具1之外型設計以改善微電解加工中的電場設計。如第1b圖所示之習知刀具8對該工件9加工之面係一平面狀,微電解加工過程中該刀具8於該加工區域91中形成之電場(以複數個由該工件9朝向該刀具8之箭頭表示)係於該刀具8之邊緣特別集中,導致該邊緣相對於其他部位之該電流密度較大,則因該電流密度不均導致加工完成之該工件9的外觀不均勻,甚至於該邊緣特別容易發生放電現象而損害微電解加工之效果。在此,使該刀具1的加工部11係呈如第2a圖及第2b圖所示之球狀,或近似於圓球之凸形非球面狀,則如第2a圖所示,該刀具1於該工件2的該加工區域21所形成之電場(以複數個由該工件2朝向該刀具1之箭頭表示)係均勻分布,可以使各處之電流密度均勻而避免加工完成之該工件2的外觀發生上述不良現象。又,該加工部之最大直徑係可以為0.01~1.0mm,藉此可以適度調整該電流密度以確保微電解加工可以順利進行,若該直徑大於1.0mm,則會使該電流密度降低,此時欲提高該電流密度則需要施加高電流,則可進行微電解加工之加工機僅限於可輸出高能量之機種,且增加所消耗之能量而不符合經濟效益,另一方面,若該直徑小於0.01mm,則使該加工區域21過小而使微電解加工效率降低。 In addition, in the deionized water micro-electrolysis processing method of the present invention, the tool 1 can be designed to improve the electric field design in the micro-electrolysis process. The surface of the workpiece 9 processed by the conventional tool 8 shown in FIG. 1b is a planar shape, and the electric field formed by the tool 8 in the processing region 91 during the microelectrolysis process (the plurality of workpieces 9 are oriented toward the workpiece 9) The arrow of the tool 8 is particularly concentrated on the edge of the tool 8, resulting in a large current density of the edge relative to other parts, and the unevenness of the current density causes the appearance of the workpiece 9 to be uneven, even A discharge phenomenon is particularly likely to occur at the edge to impair the effect of microelectrolysis processing. Here, the processed portion 11 of the cutter 1 is formed into a spherical shape as shown in FIGS. 2a and 2b, or a convex aspherical shape similar to the spherical shape, as shown in FIG. 2a, the cutter 1 The electric field formed by the processing region 21 of the workpiece 2 (indicated by a plurality of arrows from the workpiece 2 toward the cutter 1) is evenly distributed, so that the current density of each part can be made uniform to avoid the finished workpiece 2 The above-mentioned undesirable phenomenon occurs in appearance. Moreover, the maximum diameter of the processed portion may be 0.01 to 1.0 mm, whereby the current density can be appropriately adjusted to ensure smooth progress of the micro-electrolysis process, and if the diameter is larger than 1.0 mm, the current density is lowered. In order to increase the current density, it is necessary to apply a high current, and the processing machine capable of performing micro-electrolysis processing is limited to a machine capable of outputting high energy, and the energy consumed is increased without economic efficiency. On the other hand, if the diameter is less than 0.01 In the case of mm, the processing region 21 is made too small to reduce the efficiency of microelectrolysis processing.
又,該刀具1之加工部11相對於該工件2的進給速度係可以為10~40μm/min,藉此,可供微電解加工以適當之時間進行,若該進給速度大於40μm/min,則使加工完成之該工件2的外觀形貌不均勻,另一方面,若該進給速度小於10μm/min,則因該刀具1的停留時間過長導致表面侵蝕現象嚴重,無法適用於該去離子水的微電解加工。另外,該刀 具1可以依照所需之工件2的外觀而設定進給方向,例如,使該加工部11保持朝向該工件2之方向進給,可以加深該刀具1於該工件2加工之凹穴深度,或者,對該加工部11設定預定之路徑,如S型路徑或如方形槽之幾何圖案,可以於該工件2加工出相對應之外觀形狀。 Further, the processing speed of the processing portion 11 of the tool 1 with respect to the workpiece 2 may be 10 to 40 μm/min, whereby microelectrolysis processing may be performed at an appropriate time, if the feed speed is greater than 40 μm/min. , the appearance of the workpiece 2 is not uniform, and if the feed speed is less than 10 μm/min, the surface erosion is too long due to the excessive residence time of the cutter 1 and cannot be applied to the Microelectrolysis processing of deionized water. In addition, the knife The tool 1 can set the feeding direction according to the appearance of the desired workpiece 2, for example, the processing portion 11 is held in the direction of the workpiece 2, and the depth of the pocket in which the tool 1 is machined can be deepened, or A predetermined path is set to the processing portion 11, such as an S-shaped path or a geometric pattern such as a square groove, and the corresponding appearance shape can be processed on the workpiece 2.
此外,該刀具1之加工部11係可以設定於加工時旋轉,該加工部11的轉速係可以為60~1000rpm,藉此,可以使微電解加工的電場均勻作用於該工件2,以得到較均勻的加工外觀,若該轉速大於1000rpm,則導致該加工區域21中形成渦漩,使微電解加工產生之泥渣滯留於該加工區域21而不易排除,進而阻礙微電解加工之進行,另一方面,若該轉速小於60rpm,則該加工區域21中該去離子水的更新速度過慢,難以充分地排除該泥渣,進而阻礙微電解加工之進行。 Further, the processing portion 11 of the tool 1 can be set to rotate during processing, and the rotational speed of the processing portion 11 can be 60 to 1000 rpm, whereby the electric field of the micro-electrolysis machining can be uniformly applied to the workpiece 2 to obtain a comparison. The uniform processing appearance, if the rotation speed is greater than 1000 rpm, causes vortex formation in the processing region 21, so that the sludge generated by the micro-electrolysis processing is retained in the processing region 21 and is not easily removed, thereby hindering the progress of the micro-electrolysis process, and the other On the other hand, if the number of revolutions is less than 60 rpm, the rate of renewal of the deionized water in the processing region 21 is too slow, and it is difficult to sufficiently remove the sludge, thereby hindering the progress of the microelectrolysis process.
此外,本發明之去離子水微電解加工方法中,可以另添加一磨粒,則進行去離子水微電解加工之同時可對該工件2進行研磨,該磨粒可選用一般研磨常用之研磨顆粒製作,例如可選擇一氧化鋁磨粒、一鑽石磨粒、一立方氮化硼磨粒或一碳化矽磨粒製成。該磨粒之粒徑係可以為1.0~5.0μm,藉此,可於微電解加工時配合該磨粒之研磨效果,增加對於該工件2的加工量及提高加工效率,若該粒徑大於5.0μm,則該磨粒阻擋該去離子水導電之通道,而難以發生微電解加工,另一方面,若該粒徑小於1.0μm,則該磨粒沉積之高度不足,無法充分發揮研磨作用。又,本發明之去離子水微電解加工方法中,裝設該循環槽並添加該磨粒之情況,可以裝設一超音波震盪器結合於該循環槽,用以震盪該磨粒以避免該磨粒沉澱於循環槽而無法流動至該加工區域21。 In addition, in the deionized water micro-electrolysis processing method of the present invention, an additional abrasive grain may be added, and the workpiece 2 may be ground while performing deionized water micro-electrolysis processing, and the abrasive grain may be selected from general abrasive particles commonly used for grinding. The preparation may be made, for example, by selecting an alumina abrasive grain, a diamond abrasive grain, a cubic boron nitride abrasive grain or a carbonized cerium abrasive grain. The particle size of the abrasive grains may be 1.0 to 5.0 μm, whereby the grinding effect of the abrasive grains can be matched during microelectrolysis processing, and the processing amount for the workpiece 2 can be increased and the processing efficiency can be improved, if the particle diameter is greater than 5.0. In the case of μm, the abrasive grains block the conductive path of the deionized water, and it is difficult to cause microelectrolysis processing. On the other hand, if the particle diameter is less than 1.0 μm, the height of the abrasive grain deposition is insufficient, and the polishing effect cannot be sufficiently exhibited. Moreover, in the deionized water micro-electrolysis processing method of the present invention, in the case where the circulation tank is installed and the abrasive grains are added, an ultrasonic oscillator may be coupled to the circulation tank for oscillating the abrasive grains to avoid the The abrasive grains are deposited in the circulation tank and cannot flow to the processing region 21.
又,由於該磨粒為非導體,則該磨粒進入電場內時會導致該電流密度不足而發生異常退刀,進而發生該刀具1在同一局部往復加工,而使該工件2產生侵蝕孔洞,故導致表面粗度較大。因此,本發明之去離 子水微電解加工方法於製程設計上,可依照該工件2之加工需求選擇添加該磨粒,例如,欲使該工件2達到低表面粗度時,以未添加該磨粒之去離子水微電解加工方法為主,欲增加對於該工件2之加工量或欲提高加工效率時,以添加該磨粒之去離子水微電解加工方法為主。或者,可選擇於粗加工階段進行添加該磨粒之本發明之去離子水微電解加工方法,並於細加工階段進行未添加該磨粒之本發明之去離子水微電解加工方法,以兼顧該工件2的加工深度及外觀形貌的完整性。 Moreover, since the abrasive grains are non-conducting, when the abrasive grains enter the electric field, the current density is insufficient to cause an abnormal retraction, and the tool 1 is reciprocally processed in the same portion, thereby causing the workpiece 2 to erode holes. As a result, the surface roughness is large. Therefore, the departure of the present invention The sub-water micro-electrolysis processing method is selected in the process design, and the abrasive particles can be selected according to the processing requirements of the workpiece 2. For example, when the workpiece 2 is to have a low surface roughness, the deionized water is not added with the abrasive particles. The electrolytic processing method is mainly used. When it is desired to increase the processing amount of the workpiece 2 or to increase the processing efficiency, the deionized water microelectrolysis processing method in which the abrasive grains are added is mainly used. Alternatively, the deionized water microelectrolysis processing method of the present invention in which the abrasive grains are added may be selected in a rough processing stage, and the deionized water microelectrolysis processing method of the present invention to which the abrasive grains are not added may be subjected to a fine processing stage to take into consideration The depth of the workpiece 2 and the integrity of the appearance.
本發明之去離子水微電解加工方法可以製作微細的凹坑,且可以使該凹坑的外觀形貌平整並具有低表面粗度,足以用於製造精微模具。為了證實本發明之去離子水微電解加工方法確實可以應用於精微模具加工,遂進行以下實驗:首先,比較(a)未添加該磨粒之本發明之去離子水微電解加工方法及(b)添加該磨粒之本發明之去離子水微電解加工方法分別進行鑽孔加工的結果,其中,該磨粒係選用氧化鋁磨粒,且該氧化鋁磨粒之粒徑為3μm。以共軛焦雷射干涉儀分別實測該等方法製作之微凹坑的底部巨觀形貌,將第(a)組之結果以第3a圖表示,將第(b)組之結果以第3b圖表示,可以得知第3b圖相較於第3a圖,係具有較為完整之巨觀形貌,且加工深度可達到20μm以上,故,可以確認添加該氧化鋁磨粒可以增加研磨效果。惟,以掃描式電子顯微鏡(SEM)分別觀察該等方法製作之微凹坑的微觀影像,將觀察結果分別以第4a圖及第4b圖表示,可以得知第4b圖相較於第4a圖,係發生較明顯之點蝕現象,導致表面粗度較大,其中,第4a圖的表面粗度為0.169μm,第4b圖的表面粗度為1.085μm。 The deionized water microelectrolysis processing method of the present invention can produce fine pits, and can make the pits have a flat appearance and a low surface roughness, which is sufficient for manufacturing a fine mold. In order to confirm that the deionized water microelectrolysis processing method of the present invention can be applied to fine mold processing, the following experiment is carried out: First, (a) the deionized water microelectrolysis processing method of the present invention without adding the abrasive grains and (b) The results of the drilling process of the deionized water microelectrolysis processing method of the present invention to which the abrasive grains are added, wherein the abrasive grains are alumina abrasive grains, and the alumina abrasive grains have a particle diameter of 3 μm. The bottom macroscopic morphology of the micro-pits produced by the methods is measured by a conjugate focal-focus laser interferometer, and the result of the (a) group is represented by a 3a graph, and the result of the (b) group is represented by a 3b graph. It can be seen that the 3b image has a relatively complete macroscopic morphology compared to the 3a image, and the processing depth can reach 20 μm or more. Therefore, it can be confirmed that the addition of the alumina abrasive grains can increase the grinding effect. However, the microscopic images of the micro-pits produced by these methods were observed by scanning electron microscopy (SEM), and the observation results were shown in Fig. 4a and Fig. 4b, respectively. It can be seen that the 4b map is compared with the 4a map. The pitting phenomenon occurs more obviously, resulting in a larger surface roughness. Among them, the surface roughness of Fig. 4a is 0.169 μm, and the surface roughness of Fig. 4b is 1.085 μm.
去離子水微電解加工銑削深槽實驗:設定該電壓為50V、該電流為50mA之脈衝直流電流、該脈衝直流電流之脈寬為0.2μs、該脈衝斷路時間為0.8μs、該去離子水比電阻值為110kΩ-cm、該加工部11的球 形直徑為0.35mm、該加工部11的轉速為500rpm、該加工部11的進給速度為30μm/min、深槽加工面積為0.2×0.1mm2,並將深槽分為10層加工,每層係0.01mm。加工結果如第5a圖、第5b圖及第5c圖所示,其中,加工深度約為0.12mm,該深槽之深寬比達到1.2倍,表面粗度Ra為0.227μm,可以得知藉由本發明之去離子水微電解加工方法,可以得到良好的表面形貌及低表面粗度,且若於加工時設定適當層數之分層加工,則可以達到0.12mm以上之深度。 Deionized water micro-electrolysis machining milling deep groove experiment: set the voltage to 50V, the current is 50mA pulse DC current, the pulse DC current pulse width is 0.2μs, the pulse breaking time is 0.8μs, the deionized water ratio The resistance value was 110 kΩ-cm, the spherical diameter of the processed portion 11 was 0.35 mm, the rotational speed of the processed portion 11 was 500 rpm, the feed speed of the processed portion 11 was 30 μm/min, and the deep groove processing area was 0.2 × 0.1 mm 2 . And the deep groove is divided into 10 layers of processing, each layer is 0.01mm. The processing results are as shown in Fig. 5a, Fig. 5b and Fig. 5c, wherein the processing depth is about 0.12 mm, the aspect ratio of the deep groove is 1.2 times, and the surface roughness Ra is 0.227 μm. The deionized water micro-electrolysis processing method of the invention can obtain a good surface topography and a low surface roughness, and can achieve a depth of 0.12 mm or more if a layered processing of an appropriate number of layers is set during processing.
去離子水微電解加工銑削微流道實驗:設定該電壓為50V、該電流為50mA之脈衝直流電流、該脈衝直流電流之脈寬為0.2μs、該脈衝斷路時間為0.8μs、該去離子水比電阻值為110kΩ-cm、該加工部11的球形直徑為0.35mm、該加工部11的轉速為500rpm、該加工部11的進給速度為30μm/min,該微流道係S型,其中,彎曲部分之半徑設為(a)0.5mm及(b)1.0mm,並將微流道分為2層加工,每層係0.01mm。第(a)組之加工結果如第6a圖所示,其中,該S型微流道的表面粗度Ra約為0.36μm,第(b)組之加工結果如第6b圖所示,其中,該S型微流道的表面粗度Ra約為0.36μm,可以得知藉由本發明之去離子水微電解加工方法,於加工時適當設定該加工部11的進給路徑,則可製作精微尺度之微流道。 Deionized water micro-electrolysis machining milling micro-channel experiment: set the voltage to 50V, the current is 50mA pulse DC current, the pulse DC current pulse width is 0.2μs, the pulse breaking time is 0.8μs, the deionized water The specific resistance value is 110 kΩ-cm, the spherical diameter of the processed portion 11 is 0.35 mm, the rotational speed of the processed portion 11 is 500 rpm, and the feed speed of the processed portion 11 is 30 μm/min, and the microchannel is S-type, wherein The radius of the curved portion is set to (a) 0.5 mm and (b) 1.0 mm, and the micro flow path is divided into two layers, each layer being 0.01 mm. The processing result of the group (a) is as shown in Fig. 6a, wherein the surface roughness Ra of the S-type microchannel is about 0.36 μm, and the processing result of the group (b) is as shown in Fig. 6b, wherein The surface roughness Ra of the S-type microchannel is about 0.36 μm, and it can be known that the micro-scale processing of the processing portion 11 can be appropriately set by the deionized water micro-electrolysis processing method of the present invention. The micro flow channel.
去離子水微電解加工銑削方槽實驗:設定該電壓為50V、該電流為50mA之脈衝直流電流、該脈衝直流電流之脈寬為0.2μs、該脈衝斷路時間為0.8μs、該去離子水比電阻值為110kΩ-cm、該加工部11的球形直徑為0.35mm、該加工部11的轉速為500rpm、該加工部11的進給速度為30μm/min、方槽加工面積為0.6×0.6mm2,並將方槽分為2層加工,每層係0.01mm。加工結果如第7a圖及第7b圖所示,其中,加工深度約為50μm,表面粗度Ra為1.8~2.0μm,可以得知藉由本發明之去離子水微電解加工方法,於加工時適當設定該加工部11的進給路徑,則可製作如 方槽等底部非球形之凹穴,且於加工時設定2層加工即可以達到50μm之深度。 Deionized water micro-electrolysis machining milling square groove experiment: set the voltage to 50V, the current is 50mA pulse DC current, the pulse DC current pulse width is 0.2μs, the pulse breaking time is 0.8μs, the deionized water ratio The resistance value is 110 kΩ-cm, the spherical diameter of the processed portion 11 is 0.35 mm, the rotational speed of the processed portion 11 is 500 rpm, the feed speed of the processed portion 11 is 30 μm/min, and the square groove processing area is 0.6 × 0.6 mm 2 And the square groove is divided into two layers of processing, each layer is 0.01mm. The processing results are as shown in Fig. 7a and Fig. 7b, wherein the processing depth is about 50 μm and the surface roughness Ra is 1.8 to 2.0 μm. It can be known that the deionized water microelectrolysis processing method of the present invention is suitable for processing. By setting the feed path of the processed portion 11, it is possible to produce a bottom non-spherical recess such as a square groove, and it is possible to achieve a depth of 50 μm by setting two layers of processing during processing.
綜上所述,本發明係藉由適當設定之電壓及電流密度,可降低該去離子水微電解加工中發生放電現象的可能性,使該工件2的底部因放電現象造成之孔蝕痕跡減少,得到表面粗度小且外觀平整之凹穴或任意路徑之銑削加工面,故,本發明之去離子水微電解加工方法可以應用於製造精微模具。 In summary, the present invention can reduce the possibility of occurrence of a discharge phenomenon in the deionized water micro-electrolysis process by appropriately setting the voltage and current density, so that the bottom of the workpiece 2 is reduced in pitting corrosion caused by the discharge phenomenon. The milled surface of the pit having a small surface roughness and a flat appearance or an arbitrary path is obtained. Therefore, the deionized water microelectrolysis processing method of the present invention can be applied to the manufacture of a micro mold.
此外,本發明之去離子水微電解加工方法所需之能量,係一般放電加工機即可供應,藉由適當設定之電壓及電流密度即可減低放電現象而達成微電解加工,可節省購置電解加工機之成本,提升經濟效益。 In addition, the energy required for the deionized water microelectrolysis processing method of the present invention can be supplied by a general electric discharge machine, and the microelectrolysis process can be achieved by reducing the discharge phenomenon by appropriately setting the voltage and current density, thereby saving the purchase of electrolysis. The cost of processing machines increases economic efficiency.
雖然本發明已利用上述實施例揭示,然其並非用以限定本發明,任何熟習此技藝者在不脫離本發明之精神和範圍之內,相對上述實施例進行各種更動與修改仍屬本發明所保護之技術範疇,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。 While the present invention has been disclosed in the above embodiments, it is not intended to limit the scope of the present invention. The scope of protection of the invention is therefore defined by the scope of the appended claims.
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| TW201033410A (en) * | 2009-03-06 | 2010-09-16 | Advanced Semiconductor Eng | Electro-thinning apparatus for removing excess metal on surface of substrate and removing method using the same |
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