TWI562373B - Semiconductor device and method for manufacturing the same - Google Patents
Semiconductor device and method for manufacturing the sameInfo
- Publication number
- TWI562373B TWI562373B TW103105428A TW103105428A TWI562373B TW I562373 B TWI562373 B TW I562373B TW 103105428 A TW103105428 A TW 103105428A TW 103105428 A TW103105428 A TW 103105428A TW I562373 B TWI562373 B TW I562373B
- Authority
- TW
- Taiwan
- Prior art keywords
- manufacturing
- same
- semiconductor device
- semiconductor
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW103105428A TWI562373B (en) | 2014-02-19 | 2014-02-19 | Semiconductor device and method for manufacturing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW103105428A TWI562373B (en) | 2014-02-19 | 2014-02-19 | Semiconductor device and method for manufacturing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201533905A TW201533905A (en) | 2015-09-01 |
| TWI562373B true TWI562373B (en) | 2016-12-11 |
Family
ID=54694874
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW103105428A TWI562373B (en) | 2014-02-19 | 2014-02-19 | Semiconductor device and method for manufacturing the same |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TWI562373B (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10115626B1 (en) | 2017-07-17 | 2018-10-30 | Vanguard International Semiconductor Corporation | Methods for forming isolation blocks of semiconductor devices, semiconductor devices and methods for manufacturing the same |
| US10388758B2 (en) | 2018-01-22 | 2019-08-20 | Vanguard International Semiconductor Corporation | Semiconductor structure having a high voltage well region |
| TWI684209B (en) * | 2018-06-20 | 2020-02-01 | 世界先進積體電路股份有限公司 | Semiconductor structure and method for fabricating the same |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200744218A (en) * | 2006-05-18 | 2007-12-01 | Samsung Electronics Co Ltd | Semiconductor device and method of manufacturing the same |
| TW200814141A (en) * | 2006-09-08 | 2008-03-16 | Hynix Semiconductor Inc | Semiconductor device with a bulb-type recess gate |
| TW201005874A (en) * | 2008-07-30 | 2010-02-01 | Freescale Semiconductor Inc | Semiconductor devices with extended active regions |
-
2014
- 2014-02-19 TW TW103105428A patent/TWI562373B/en active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200744218A (en) * | 2006-05-18 | 2007-12-01 | Samsung Electronics Co Ltd | Semiconductor device and method of manufacturing the same |
| TW200814141A (en) * | 2006-09-08 | 2008-03-16 | Hynix Semiconductor Inc | Semiconductor device with a bulb-type recess gate |
| TW201005874A (en) * | 2008-07-30 | 2010-02-01 | Freescale Semiconductor Inc | Semiconductor devices with extended active regions |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201533905A (en) | 2015-09-01 |
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