TWI561687B - An electroplating method - Google Patents
An electroplating methodInfo
- Publication number
- TWI561687B TWI561687B TW101133276A TW101133276A TWI561687B TW I561687 B TWI561687 B TW I561687B TW 101133276 A TW101133276 A TW 101133276A TW 101133276 A TW101133276 A TW 101133276A TW I561687 B TWI561687 B TW I561687B
- Authority
- TW
- Taiwan
- Prior art keywords
- electroplating method
- electroplating
- Prior art date
Links
- 238000009713 electroplating Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210288848.XA CN103590079A (en) | 2012-08-14 | 2012-08-14 | Electroplating method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201407005A TW201407005A (en) | 2014-02-16 |
| TWI561687B true TWI561687B (en) | 2016-12-11 |
Family
ID=50080386
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW101133276A TWI561687B (en) | 2012-08-14 | 2012-09-12 | An electroplating method |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN103590079A (en) |
| TW (1) | TWI561687B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108360047B (en) * | 2018-04-11 | 2020-03-17 | 中国科学院半导体研究所 | Electroplating clamp and using method thereof |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200930845A (en) * | 2007-11-01 | 2009-07-16 | Almex Pe Inc | Tinuous plating treatment device |
| TW201204877A (en) * | 2010-07-02 | 2012-02-01 | Novellus Systems Inc | Control of electrolyte hydrodynamics for efficient mass transfer during electroplating |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5937360B2 (en) * | 1977-01-26 | 1984-09-08 | 凸版印刷株式会社 | Metal surface treatment equipment |
| JP3411103B2 (en) * | 1994-09-14 | 2003-05-26 | イビデン株式会社 | Electroplating method, electroplating equipment, rack for electroplating |
| JP4339980B2 (en) * | 2000-03-14 | 2009-10-07 | 沖プリンテッドサーキット株式会社 | Electrolytic plating equipment |
| US6818115B2 (en) * | 2001-10-19 | 2004-11-16 | Viasystems Group, Inc. | System and method for electrolytic plating |
| DE10153171B4 (en) * | 2001-10-27 | 2004-09-16 | Atotech Deutschland Gmbh | Method and device for the electrolytic treatment of parts in continuous systems |
| JP4177626B2 (en) * | 2002-09-20 | 2008-11-05 | 有限会社 関西エンジニアリング | Electroplating method of wire, electroplating apparatus, and electroplated wire |
| CN201169649Y (en) * | 2008-02-02 | 2008-12-24 | 赵永先 | Transmission mechanism for circuit board electroplating machine |
| JP5569713B2 (en) * | 2009-05-29 | 2014-08-13 | 日立化成株式会社 | Electroless copper plating apparatus for thickening, electroless copper plating method for thickening, and manufacturing method of multilayer printed wiring board |
| CN201447514U (en) * | 2009-09-08 | 2010-05-05 | 陕西昕宇表面工程有限公司 | Shifting device for electroplating workpieces |
-
2012
- 2012-08-14 CN CN201210288848.XA patent/CN103590079A/en active Pending
- 2012-09-12 TW TW101133276A patent/TWI561687B/en not_active IP Right Cessation
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200930845A (en) * | 2007-11-01 | 2009-07-16 | Almex Pe Inc | Tinuous plating treatment device |
| TW201204877A (en) * | 2010-07-02 | 2012-02-01 | Novellus Systems Inc | Control of electrolyte hydrodynamics for efficient mass transfer during electroplating |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201407005A (en) | 2014-02-16 |
| CN103590079A (en) | 2014-02-19 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |