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TWI548435B - The construction of incubator for jaundice - Google Patents

The construction of incubator for jaundice Download PDF

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TWI548435B
TWI548435B TW103109960A TW103109960A TWI548435B TW I548435 B TWI548435 B TW I548435B TW 103109960 A TW103109960 A TW 103109960A TW 103109960 A TW103109960 A TW 103109960A TW I548435 B TWI548435 B TW I548435B
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refractive index
film
index material
stack
film stack
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TW103109960A
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Chinese (zh)
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TW201536371A (en
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Pei Hung Yeh
Tung Ho Shieh
Yen Cheng Li
Chung Kai Hung
Jhih Jyun Jhang
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Univ Kun Shan
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Description

黃疸光療用之保溫箱構造 Insulation box structure for Huangqi phototherapy

本發明係有關於一種黃疸光療用之保溫箱構造,尤指一種在一保溫箱體內各壁面皆設有一反射膜,並使該反射膜能達到高反射率之黃疸光療用之保溫箱構造。 The invention relates to an incubator structure for jaundice phototherapy, in particular to an incubator structure for jaundice phototherapy which has a reflective film on each wall surface of the incubator and enables the reflective film to achieve high reflectivity.

目前,常見之新生兒黃疸是指新生兒體內膽紅素過高而引起的一組疾病,嚴重時可導致新生兒神經系統受損引發膽紅素腦病,影響新生兒智力發育,而研究表明,膽紅素能夠吸收光線,通過光線照射可加速遊離膽紅素氧化分解,促進膽紅素清除和排泄,降低血清未結合膽紅素濃度,防止核黃疸的發生。所以,當足月兒血清膽紅素若高於205微摩爾/升;而超低出生體重兒若高於85微摩爾/升:而極低出生體重兒若高於103微摩爾/升時,即為光療適應症。 At present, the common neonatal jaundice refers to a group of diseases caused by too high bilirubin in neonates. In severe cases, neonatal nervous system damage may cause bilirubin encephalopathy, affecting neonatal mental development, and studies have shown that Bilirubin can absorb light, accelerate the oxidative decomposition of free bilirubin by light irradiation, promote the removal and excretion of bilirubin, reduce the concentration of unconjugated bilirubin in serum, and prevent the occurrence of nuclear jaundice. Therefore, if the serum bilirubin is higher than 205 μmol/L in term, and the ultra-low birth weight is higher than 85 μmol/L: if the very low birth weight is higher than 103 μmol/L, It is the indication for phototherapy.

且,由目前研究指出,藍光LED之波長是最合適用來作為新生兒黃疸治療的光源,而光療時,係將新生兒裸體平放於光療箱中,並用黑布遮蓋雙眼和會陰部位,再用單光或雙光照射該新生兒。而光療的注意事項較多,主要包括:①光療的時間一般定為24~48小時,不宜超過3天。②由於藍光可分解體內的核黃素,即維生素B2,因而當光照持續時間超過24小時時應給新生兒補充維生素B2,以防引起維生素B2的缺乏。③不能單純以黃疸消退為停止光療的依據,而應以血清膽紅素濃度的下降為依據。因為光療主要作用於皮膚淺層組織,故黃疸消退並不代表血清膽紅素也已正常。④光療不影響母乳餵養,可定時將新生兒抱出光療箱進行餵養。為了方便母乳餵養,可將光療箱置於母親床旁,醫護人員應定時進行觀察和護理。⑤光療的副作用相對較少,患兒偶可出現發熱,腹瀉和皮疹等,但多不嚴重,也不會影響繼續治療。⑥由於新生兒裸放於 光療箱中,活動空間大,容易擦傷皮膚,因而在光療結束後須檢查新生兒皮膚有無破損,以便及時處理,防止繼發感染。 Moreover, according to current research, the wavelength of blue LED is the most suitable source for the treatment of neonatal jaundice. In phototherapy, the newborn nude is placed flat in the phototherapy box, and the eyes and the perineum are covered with black cloth. The newborn is then illuminated with single or double light. There are many precautions for phototherapy, including: 1 The time for phototherapy is generally 24 to 48 hours, and should not exceed 3 days. 2 Because blue light can decompose riboflavin in the body, that is, vitamin B2, vitamin B2 should be given to newborns when the duration of light exceeds 24 hours to prevent vitamin B2 deficiency. 3 can not simply rely on the disappearance of jaundice as the basis for stopping phototherapy, but should be based on the decline in serum bilirubin concentration. Because phototherapy mainly acts on the superficial tissues of the skin, the regression of jaundice does not mean that serum bilirubin is normal. 4 phototherapy does not affect breastfeeding, and the newborn can be taken out of the phototherapy box for feeding. In order to facilitate breastfeeding, the phototherapy box can be placed next to the mother's bed, and the medical staff should observe and care regularly. 5 The side effects of phototherapy are relatively small. Children may have fever, diarrhea and rash, but they are not serious and will not affect the treatment. 6 because the newborn is naked In the phototherapy box, the activity space is large, and it is easy to scratch the skin. Therefore, after the phototherapy is finished, the newborn skin should be inspected for damage, so as to be treated in time to prevent secondary infection.

另外,在薄膜光學的理論中,要設計具高反射率鏡片,通常採用低折射率材料及高折射率材料製備成膜層交互堆疊的型態,目前有(HL)m或(LH)m或L(HL)m或H(LH)m之型態,並根據入射光的波長來控制膜層的膜厚,其中L代表低反射率膜,H代表高反射率膜,m則為堆疊的週期數。 In addition, in the theory of thin film optics, it is necessary to design a lens with high reflectivity, usually using a low refractive index material and a high refractive index material to prepare a pattern of mutually stacked layers, currently having (HL) m or (LH) m or L (HL) m or H (LH) m type, and control the film thickness according to the wavelength of the incident light, where L represents a low reflectivity film, H represents a high reflectivity film, and m is the stacking period number.

而目前針對黃疸而須以光療照顧之新生兒所使用之機構是將藍光LED光療儀與保溫箱做結合,且藍光LED光療儀通常直接或內嵌設置在保溫箱之上方或側邊,讓新生兒可以在恆溫的保溫箱中接受照射藍光之治療,然而,新生兒在照射藍光時雖然可以避免失溫,且有比較大面積的照光,但是其照光治療時間需要48~72小時,且住院時間需長達2~5天,在此療程時間很長的情況下,往往會造成新生兒父母心中的焦慮。 At present, the mechanism used by newborns who need to take care of the jaundice is to combine the blue LED phototherapy device with the incubator, and the blue LED phototherapy device is usually placed directly or in the upper or side of the incubator for the newborn. The child can receive blue light treatment in a constant temperature incubator. However, although the newborn can avoid temperature loss when irradiating blue light, and has a relatively large area of illumination, the illumination treatment time needs 48 to 72 hours, and the hospital stay time. It takes 2 to 5 days, and when the treatment is very long, it often causes anxiety in the hearts of newborn parents.

爰此,本發明人不斷創新研發,主要為了改善目前需光療之新生兒其照光時間過長,往往會造成新生兒父母心中的焦慮之問題,進而提出一種黃疸光療用之保溫箱構造,並用以一藍光照射,係包含有:一箱體,包含有一容置空間,在所述箱體內有一躺臥區,及在所述箱體內壁面上係設有一反射膜將所述藍光反射至所述躺臥區。 In view of this, the present inventors continue to innovate and develop, mainly to improve the long-term illumination time of newborns who need phototherapy, which often causes anxiety problems in the hearts of newborn parents, and then proposes an incubator structure for jaundice phototherapy, and A blue light illumination includes: a box body including an accommodating space, a lying area in the box body, and a reflective film on the inner wall surface of the box body to reflect the blue light to the lying Lying area.

其中,所述反射膜係以一運算式呈現,該運算式為a(LH)m1(LH)m2,其中:a為膜厚控制參數,(LH)m1(LH)m2為一第一膜堆與一第二膜堆相互堆疊,所述第一膜堆係為(LH)m1型態,所述第二膜堆係為(LH)m2型態,LH為低折射率材料與高折射率材料相互堆疊,L為低折射率材料,H為高折射率材料,m1為第一膜堆週期數,m2為第二膜堆週期數。 Wherein, the reflective film is represented by an arithmetic expression of a(LH) m1 (LH) m2 , wherein: a is a film thickness control parameter, and (LH) m1 (LH) m2 is a first film stack Stacked with a second film stack, the first film stack is of the (LH) m1 type, the second film stack is of the (LH) m2 type, and the LH is a low refractive index material and a high refractive index material. Stacked on each other, L is a low refractive index material, H is a high refractive index material, m1 is the number of first membrane stack cycles, and m2 is the number of second membrane stack cycles.

其中,所述膜厚控制參數a係介於0.7732至1.6066之間,而所述第一膜堆週期數m1≧2,所述第二膜堆週期數m2≧2。 Wherein, the film thickness control parameter a is between 0.7732 and 1.6066, and the first film stack cycle number is m1≧2, and the second film stack cycle number is m2≧2.

其中,所述第一膜堆週期數6≧m1≧2,所述第二膜堆週期數6≧m2≧2。 Wherein, the first membrane stack cycle number is 6≧m1≧2, and the second membrane stack cycle number is 6≧m2≧2.

其中,所述高折射率材料的折射率與低折射率材料的折射率的比值係介於1.3125至1.7404之間。 Wherein, the ratio of the refractive index of the high refractive index material to the refractive index of the low refractive index material is between 1.3125 and 1.7404.

其中,所述低折射率材料係為冰晶石(Na3AlF6)、氟化鎂(MgF2)或二氧化矽(SiO2)其中之一。 Wherein, the low refractive index material is one of cryolite (Na3AlF6), magnesium fluoride (MgF2) or cerium oxide (SiO2).

其中,所述高折射率材料係為二氧化鈦(TiO2)、硫化鋅(ZnS)、二氧化鈰(CeO2)或二氧化鋯(ZrO2)其中之一。 Wherein, the high refractive index material is one of titanium dioxide (TiO2), zinc sulfide (ZnS), ceria (CeO2) or zirconium dioxide (ZrO2).

其中,所述反射膜係塗佈或蒸鍍在所述箱體內壁面上。 Wherein, the reflective film is coated or vapor-deposited on the inner wall surface of the casing.

其中,所述箱體內有一發光源,前述藍光由該發光源發出,且該藍光之波長係介於425奈米至475奈米之間。 Wherein, there is a light source in the box, the blue light is emitted by the light source, and the wavelength of the blue light is between 425 nm and 475 nm.

本發明之功效在於: The effect of the invention is:

1.本發明係在箱體內壁面塗佈或蒸鍍上反射膜,因此不論該箱體之形狀為何,或該發光源設置在該箱體之位置皆能有效將該發光源所發出之藍光幾近100%反射至躺臥在該箱體內且有黃疸症狀之新生兒上。 1. The invention coats or vapor-deposits a reflective film on the inner wall surface of the box, so that regardless of the shape of the box, or the position of the light source in the box, the blue light emitted by the light source can be effectively Nearly 100% is reflected to newborns lying in the box and having symptoms of jaundice.

2.本發明因能有效提高照射藍光之效率,故能使具有黃疸症狀之新生兒在照射藍光時之時間大幅減縮,亦即能達到降低成本之功效。 2. The invention can effectively improve the efficiency of blue light irradiation, so that the time for the newborn with the symptoms of jaundice to be greatly reduced when irradiating blue light can achieve the effect of reducing the cost.

3.本發明設計簡單,卻能有效改善目前具有黃疸症狀之新生兒在照射藍光時,其照射時間過長之缺點。 3. The invention has simple design, but can effectively improve the shortcomings of the newborns who currently have symptoms of jaundice when the blue light is irradiated.

(1)‧‧‧箱體 (1) ‧‧‧ cabinet

(11)‧‧‧容置空間 (11) ‧‧‧ accommodating space

(12)‧‧‧躺臥區 (12)‧‧‧ lying area

(13)‧‧‧內壁面 (13) ‧‧‧ inner wall

(131)‧‧‧反射膜 (131)‧‧‧Reflective film

(A)‧‧‧發光源 (A) ‧‧‧Light source

(B)‧‧‧基板 (B) ‧‧‧Substrate

(L)‧‧‧低反射率膜 (L)‧‧‧Low reflectivity film

(H)‧‧‧高反射率膜 (H)‧‧‧High reflectivity film

(a)‧‧‧膜厚控制參數 (a) ‧ ‧ film thickness control parameters

(a1)‧‧‧膜厚控制參數 (a 1 ) ‧ ‧ film thickness control parameters

(a2)‧‧‧膜厚控制參數 (a 2 ) ‧ ‧ film thickness control parameters

[第一圖]係為本發明之構造剖視圖。 [First Figure] is a cross-sectional view showing the structure of the present invention.

[第二圖]係為本發明基板與膜堆之示意圖,說明以(LH)2為例,在一基板上以高、低折射率鍍膜依序堆疊,並包含有4層。 [Second figure] is a schematic view of the substrate and the film stack of the present invention. The (LH) 2 is taken as an example, and the high and low refractive index coatings are sequentially stacked on one substrate, and four layers are included.

[第三圖1係為本發明基板與膜堆之示意圖,說明以(HL)2為例,在一基板上以低、高折射率鍍膜依序堆疊,並包含有4層。 [FIG. 1] FIG. 1 is a schematic view showing a substrate and a film stack of the present invention. Taking (HL) 2 as an example, a low- and high-index coating is sequentially stacked on a substrate, and four layers are included.

[第四圖]係為本發明基板與膜堆之示意圖,說明以1.2(LH)2(LH)2為例,在一基板上以高、低折射率鍍膜依序堆疊,並包含有8層。 [Fourth diagram] is a schematic diagram of the substrate and the film stack of the present invention, illustrating 1.2 (LH) 2 (LH) 2 as an example, sequentially stacking high and low refractive index coatings on a substrate, and comprising 8 layers. .

[第五圖]係為本發明之第一實驗於入射角為0度時之反射率光譜圖。 [Fifth image] is a reflectance spectrum of the first experiment of the present invention at an incident angle of 0 degrees.

[第六圖]係為本發明之第一實驗於入射角為89度時之反射率光譜圖。 [Sixth image] is a reflectance spectrum diagram of the first experiment of the present invention at an incident angle of 89 degrees.

[第七圖]係為本發明之第二實驗於入射角為0度時之反射率光譜圖。 [Seventh image] is a reflectance spectrum diagram of the second experiment of the present invention at an incident angle of 0 degrees.

[第八圖]係為本發明之第二實驗於入射角為89度時之反射率光譜圖。 [Eighth image] is a reflectance spectrum diagram of the second experiment of the present invention at an incident angle of 89 degrees.

本發明係為一種黃疸光療用之保溫箱構造,而主要技術特徵、目的及功效將可於下述實施例清楚呈現。 The present invention is an incubator construction for jaundice phototherapy, and the main technical features, objects and effects will be clearly shown in the following embodiments.

首先,請先參閱第一圖所示,本發明包含有一箱體(1),所述箱體(1)包含有一容置空間(11),而在所述箱體(1)內有一躺臥區(12),所述躺臥區(12)係包含有一軟墊,主要係供一具有黃疸症狀之新生兒能舒適地躺臥其中,而在所述躺臥區(12)之相對處設有至少一發光源(A),在本實施例中,所述發光源(A)係設在所述箱體(1)內之上方處,而所述發光源(A)係藉以發出一波長係介於425奈米至475奈米間之藍光,由目前研究指出,所述藍光之波長係最適合用來作為新生兒黃疸治療的光源,而在所述箱體(1)內之各內壁面(13)上係塗佈或蒸鍍有一反射膜(131),而所述反射膜(131)主要係將前述發光源(A)發出之藍光反射至所述躺臥區(12),使躺臥在該躺臥區(12)且具有黃疸症狀之新生兒能有效接受該藍光之照射。 First, please refer to the first figure, the present invention comprises a box (1), the box (1) comprises an accommodating space (11), and a lie in the box (1) In the area (12), the lying area (12) comprises a cushion, mainly for a newborn having symptoms of jaundice to comfortably lie therein, and opposite to the lying area (12) There is at least one light source (A). In the embodiment, the light source (A) is disposed above the box (1), and the light source (A) emits a wavelength It is a blue light between 425 nm and 475 nm. It is pointed out by current research that the wavelength of the blue light is most suitable as a light source for the treatment of neonatal jaundice, and the inner wall surface in the box (1). (13) coating or vapor-depositing a reflective film (131), and the reflecting film (131) mainly reflects blue light emitted from the light-emitting source (A) to the lying area (12) to lie A newborn lying in the lying area (12) and having symptoms of jaundice can effectively receive the blue light.

再者,請參閱第二圖及第三圖所示,首先,在薄膜光學的理論中,通常採用低折射率材料及高折射率材料分別製備成膜層交互堆疊的型態,目前有(HL)m或(LH)m或L(HL)m或H(LH)m之型態,再根據一入射光的波長來控制一低折射率鍍膜(L)與一高折射率鍍膜(H)的一膜厚控制參數(a),其中m則為堆疊的週期數。本發明實施例的反射膜係以一運算式呈現,該運算式為a(LH)m1(LH)m2,其中:a為膜厚控制參數,(LH)m1(LH)m2為一第一膜堆與一第二膜堆相互堆疊,所述第一膜堆係為(LH)m1型態,所述第二膜堆係為(LH)m2型態,LH為低折射率材料與高折射率材料相互堆疊,其中,L為採用低折射率材料,H為採用高折射率材料,其中,在本實施例中,所述低折射率材料係為冰晶石(Na3AlF6)、氟化鎂(MgF2)或二氧化矽(SiO2)其中之一,而所述高折射率材料係為二氧化鈦(TiO2)、硫化鋅(ZnS)、二氧化鈰(CeO2)或二氧化鋯(ZrO2)其中之一,而m1為第一膜堆週期數,m2為第二膜堆週期數,本發明在操作時係利用一基板(B)並藉由上述運算式依序將低反射率膜(L)與所述高反射率膜(H)塗佈或蒸鍍在所述基板(B)上,其中,所述基板(B)係為石英或玻璃或塑膠材質,而最後一層所塗佈或蒸鍍上之低反射率膜(L)或者高反射率膜(H)係與空氣接觸,其在操作時之運算式可為:空氣折射率| a(LH)m1(LH)m2 |基板折射率,其中,以(LH)2為例,係由該基板(B)往上依序塗佈或蒸鍍上高反射率膜(H)與低反射率膜(L),並且依序為:高反射率膜(H)、低反射率膜(L)、高反射率膜(H)、低反射率膜(L),共四層,並如第二圖所示;以此類推,若以(HL)2為例,則由該基板(B)往上依序塗佈或蒸鍍上低反射率膜(L)與高反射率膜(H),並且依序為:低反射率膜(L)、高反射率膜(H)、低反射率膜(L)、高反射率膜(H),共四層,並如第三圖所示,而在本實施例中,所述膜厚控制參數(a)係介於0.7732至1.6066之間,而所述第一膜堆週 期數m1≧2,所述第二膜堆週期數m2≧2,而所述高折射率材料的折射率與低折射率材料的折射率的比值係介於1.3125至1.7407之間。 Furthermore, please refer to the second and third figures. First, in the theory of thin film optics, low-refractive-index materials and high-refractive-index materials are usually used to prepare the layers of the film-layer alternately stacked. Currently, there are (HL). m or (LH) m or L (HL) m or H (LH) m , and then control a low refractive index coating (L) and a high refractive index coating (H) according to the wavelength of an incident light A film thickness control parameter (a), where m is the number of cycles of the stack. The reflective film of the embodiment of the present invention is represented by an arithmetic expression of a(LH) m1 (LH) m2 , wherein: a is a film thickness control parameter, and (LH) m1 (LH) m2 is a first film. The stack is stacked on top of a second stack, the first stack is of the (LH) m1 type, the second stack is of the (LH) m2 type, and the LH is a low refractive index material and a high refractive index The materials are stacked on each other, wherein L is a low refractive index material and H is a high refractive index material. In the embodiment, the low refractive index material is cryolite (Na3AlF6), magnesium fluoride (MgF2). Or one of cerium oxide (SiO2), and the high refractive index material is one of titanium dioxide (TiO2), zinc sulfide (ZnS), cerium oxide (CeO2) or zirconium dioxide (ZrO2), and m1 For the first stack cycle number, m2 is the number of second stack cycles, the present invention utilizes a substrate (B) during operation and sequentially injects the low reflectivity film (L) with the high reflectance by the above equation. The film (H) is coated or evaporated on the substrate (B), wherein the substrate (B) is made of quartz or glass or plastic, and the low reflectance of the last layer is coated or evaporated. Membrane (L) By high reflectivity film (H) lines in contact with air, which during operation of the expression may be: refractive index of air | a (LH) m1 (LH ) m2 | refractive index of the substrate, wherein, in (LH) 2 Example The substrate (B) is sequentially coated or vapor-deposited with a high reflectance film (H) and a low reflectance film (L), and in order: high reflectance film (H), low reflectance Film (L), high reflectivity film (H), low reflectivity film (L), a total of four layers, and as shown in the second figure; and so on, if (HL) 2 is taken as an example, the substrate (B) sequentially coating or vapor-depositing the low reflectance film (L) and the high reflectance film (H), and sequentially: low reflectance film (L), high reflectance film (H), Low reflectivity film (L), high reflectivity film (H), a total of four layers, and as shown in the third figure, and in the present embodiment, the film thickness control parameter (a) is between 0.7732 and 1.6066 Between the first film stack cycle number m1≧2, the second film stack cycle number m2≧2, and the ratio of the refractive index of the high refractive index material to the refractive index of the low refractive index material is It is between 1.3125 and 1.7407.

再者,請參閱第四圖所示,所述第一膜堆係為(LH)m1型態,且在該(LH)m1型態中,每一高反射率膜(H)或低反射率膜(L)有一膜厚控制參數(a1),且所述膜厚控制參數(a1)以1為例;而所述第二膜堆係為(LH)m2型態,且在該(LH)m2型態中,每一高反射率膜(H)或低反射率膜(L)有一膜厚控制參數(a2),且所述膜厚控制參數(a2)以1.2為例,根據上述,在本實施例中,係以1.2(LH)2(LH)2之運算式為例,首先,由該基板(B)往上依序塗佈或蒸鍍上高反射率膜(H)、低反射率膜(L)、高反射率膜(H)、低反射率膜(L),且所述膜厚控制參數(a1)為1,共四層後,再進一步採用膜厚控制參數(a2)為1.2,並接續前述低反射率膜(L)再次往上依序塗佈或蒸鍍上高反射率膜(H)、低反射率膜(L)、高反射率膜(H)、低反射率膜(L),共四層,最後係包含有八層,而該基板(B)上之四層,即第一膜堆之膜厚控制參數(a1)為1,而另四層,即第二膜堆之膜厚控制參數(a2)為1.2。 Furthermore, referring to the fourth figure, the first film stack is of the (LH) m1 type, and in the (LH) m1 type, each high reflectance film (H) or low reflectance The film (L) has a film thickness control parameter (a 1 ), and the film thickness control parameter (a 1 ) is exemplified by 1; and the second film stack is of the (LH) m 2 type, and In the LH) m2 type, each high reflectance film (H) or low reflectance film (L) has a film thickness control parameter (a 2 ), and the film thickness control parameter (a 2 ) is 1.2, According to the above, in the present embodiment, the calculation formula of 1.2 (LH) 2 (LH) 2 is taken as an example. First, the substrate (B) is sequentially coated or vapor-deposited with a high reflectance film (H). a low reflectance film (L), a high reflectance film (H), a low reflectance film (L), and the film thickness control parameter (a 1 ) is 1, after a total of four layers, further using a film thickness The control parameter (a 2 ) is 1.2, and the low-reflectivity film (L) is successively coated or vapor-deposited onto the high-reflectance film (H), the low-reflectance film (L), and the high-reflectance film. (H), low reflectivity film (L), a total of four layers, and finally contains eight layers, and the four layers on the substrate (B), that is, the film thickness control of the first film stack The parameter (a 1 ) is 1, while the other four layers, that is, the film thickness control parameter (a 2 ) of the second film stack is 1.2.

再者,請參閱第五圖及第六圖所示,針對所述藍光波長介於425奈米至475奈米之間,本發明在模擬實驗時,分別選擇低折射率材料係為氟化鎂(MgF2),其折射率為nL=1.38,而高折射率材料係為二氧化鈦(TiO2),其折射率為nH=2.35,並設計一中心波長λo=460奈米,而膜堆型態為(LH)m,並以上述在操作時之運算式模擬實驗,其中,空氣折射率為1,而石英基板折射率為1.46,而膜層長波長區域由靠近空氣端的膜堆以1.2(LH)6型態掌控,而短波長區域則由靠近石英基板的膜堆以(LH)6型態掌控,進一步,在前述發光源(A)[如第一圖所示]發出之藍光以入射角=0度時的反射率光譜圖如第五圖所示,全區域425奈米至475奈米範圍內的反射率平均高達99%;而在前述發光源(A)[如第一圖所示]發出之藍光以入射角=89度時的反射率光譜圖如第六圖所示,全區域425奈米至475奈 米範圍內的反射率平均亦高達99.4%~100%,且此高反射率涵蓋了散光型LED之發光角度約為75度時之要求,並由上述可知本發明係能有效達到具高反射率之功效。 Furthermore, referring to the fifth and sixth figures, for the blue light wavelength between 425 nm and 475 nm, in the simulation experiment, the low refractive index material is selected as magnesium fluoride. (MgF2), its refractive index is n L = 1.38, and the high refractive index material is titanium dioxide (TiO2), its refractive index is n H = 2.35, and a central wavelength λo = 460 nm is designed, and the film type is (LH) m , and the above-mentioned operational simulation experiment, in which the refractive index of air is 1, and the refractive index of the quartz substrate is 1.46, while the long wavelength region of the film is 1.2 (LH) from the film stack near the air end. The 6- state is controlled, and the short-wavelength region is controlled by the (LH) 6 type of the film stack close to the quartz substrate. Further, the blue light emitted by the aforementioned light source (A) [as shown in the first figure] is incident angle. The reflectance spectrum at =0 degrees is shown in the fifth figure, and the reflectance in the range of 425 nm to 475 nm in the whole region is on average 99%; and in the aforementioned light source (A) [as shown in the first figure) The reflectance spectrum of the emitted blue light at an incident angle = 89 degrees is shown in the sixth figure, and the reflection in the whole region is in the range of 425 nm to 475 nm. The average rate is also as high as 99.4%~100%, and the high reflectivity covers the requirement that the illuminating angle of the astigmatic LED is about 75 degrees, and it can be seen from the above that the present invention can effectively achieve the effect of high reflectivity.

再者,請參閱第七圖及第八圖所示,在本實施例中,所述高折射率材料係為鍺(Ge),其折射率nH=4.1,而低折射率材料係為氟化鎂(MgF2),其折射率為nL=1.38,並經實驗模擬測試,調整其運算式之各參數a、m1、m2,得知膜堆層數僅需為8層,且前述發光源(A)[如第一圖所示]發出之藍光以入射角=0至89度時的反射率光譜圖如第七圖及第八圖所示,由圖式可知全區域425奈米至475奈米範圍內的反射率平均高達99.9%,以充分達到高反射率之功效。 Furthermore, referring to the seventh and eighth figures, in the embodiment, the high refractive index material is germanium (Ge), the refractive index n H = 4.1, and the low refractive index material is fluorine. Magnesium (MgF2), its refractive index is n L = 1.38, and after experimental simulation test, adjust the parameters a, m1, m2 of the formula, and know that the number of layers is only 8 layers, and the above-mentioned light source (A) [As shown in the first figure] The reflectance spectrum of the blue light emitted at an incident angle of 0 to 89 degrees is shown in the seventh and eighth figures. The figure shows that the whole area is 425 nm to 475. The reflectance in the nanometer range is as high as 99.9% on average to fully achieve high reflectivity.

進一步要說明的是,進行實驗模擬時,所述發光源(A)[如第一圖所示]發出之藍光之入射角為0至89度,而當高折射率材料的折射率與低折射率材料的折射率的比值為0.7404,a為1.2,m1為6,m2為6時,其膜堆係為24層;而當高折射率材料的折射率與低折射率材料的折射率的比值係為2.971,a為1.2,m1為2,m2為2時,其膜堆係為8層,並皆能達到藍光幾近100%高反射率之光譜要求,由上述可知,當高折射率材料的折射率與低折射率材料的折射率的比值越高時,所需膜堆的層數越少。 It should be further noted that, when performing experimental simulation, the incident angle of the blue light emitted by the light source (A) [as shown in the first figure] is 0 to 89 degrees, and when the refractive index and low refractive index of the high refractive index material are The ratio of the refractive index of the rate material is 0.7404, a is 1.2, m1 is 6, and when m2 is 6, the film stack is 24 layers; and when the ratio of the refractive index of the high refractive index material to the refractive index of the low refractive index material The system is 2.971, a is 1.2, m1 is 2, and when m2 is 2, the film stack is 8 layers, and both can achieve the spectral requirements of nearly 100% high reflectance of blue light. From the above, when high refractive index material is known The higher the ratio of the refractive index to the refractive index of the low refractive index material, the less the number of layers required for the film stack.

綜合上述實施例之說明,當可充分瞭解本發明之操作、使用及本發明產生之功效,惟以上所述實施例僅係為本發明之較佳實施例,當不能以此限定本發明實施之範圍,即依本發明申請專利範圍及發明說明內容所作簡單的等效變化與修飾,皆屬本發明涵蓋之範圍內。 In view of the foregoing description of the embodiments, the operation and the use of the present invention and the effects of the present invention are fully understood, but the above described embodiments are merely preferred embodiments of the present invention, and the invention may not be limited thereto. Included within the scope of the present invention are the scope of the present invention.

(1)‧‧‧箱體 (1) ‧‧‧ cabinet

(11)‧‧‧容置空間 (11) ‧‧‧ accommodating space

(12)‧‧‧躺臥區 (12)‧‧‧ lying area

(13)‧‧‧內壁面 (13) ‧‧‧ inner wall

(131)‧‧‧反射膜 (131)‧‧‧Reflective film

(A)‧‧‧發光源 (A) ‧‧‧Light source

Claims (7)

一種黃疸光療用之保溫箱構造,用以一藍光照射,係包含有:一箱體,包含有一容置空間,在所述箱體內有一躺臥區,及在所述箱體內壁面上係設有一反射膜將所述藍光反射至所述躺臥區;所述反射膜係以一運算式呈現,該運算式為a(LH)m1(LH)m2,其中:a為膜厚控制參數,(LH)m1(LH)m2為一第一膜堆與一第二膜堆相互堆疊,所述第一膜堆係為(LH)m1型態,所述第二膜堆係為(LH)m2型態,LH為低折射率材料與高折射率材料相互堆疊,L為低折射率材料,H為高折射率材料,m1為第一膜堆週期數,m2為第二膜堆週期數;所述膜厚控制參數a係介於0.7732至1.6066之間,而所述第一膜堆週期數m1≧2,所述第二膜堆週期數m2≧2。 The invention relates to an incubator structure for jaundice phototherapy, which is used for illuminating a blue light, and comprises: a box body, an accommodating space, a lying area in the box body, and a lie on the inner wall surface of the box body a reflective film reflects the blue light to the lying area; the reflective film is represented by an arithmetic expression of a(LH) m1 (LH) m2 , wherein: a is a film thickness control parameter, (LH M1 (LH) m2 is a first film stack and a second film stack stacked on each other, the first film stack is (LH) m1 type, and the second film stack is (LH) m2 type LH is a low refractive index material and a high refractive index material stacked on each other, L is a low refractive index material, H is a high refractive index material, m1 is the number of first film stack cycles, and m2 is the number of second film stack cycles; The thickness control parameter a is between 0.7732 and 1.6066, and the first membrane stack number is m1≧2, and the second membrane stack number is m2≧2. 如申請專利範圍第1項所述之黃疸光療用之保溫箱構造,其中,所述第一膜堆週期數6≧m1,所述第二膜堆週期數6≧m2。 The incubator structure for jaundice phototherapy according to claim 1, wherein the first film stack cycle number is 6 ≧ m1 and the second film stack cycle number is 6 ≧ m 2 . 如申請專利範圍第1項所述之黃疸光療用之保溫箱構造,其中,所述高折射率材料的折射率與低折射率材料的折射率的比值係介於1.3125至1.7404之間。 The incubator structure for xanthine phototherapy according to claim 1, wherein a ratio of a refractive index of the high refractive index material to a refractive index of the low refractive index material is between 1.3125 and 1.7404. 如申請專利範圍第1項所述之黃疸光療用之保溫箱構造,其中,所述低折射率材料係為冰晶石(Na3AlF6)、氟化鎂(MgF2)或二氧化矽(SiO2)其中之一。 The incubator structure for jaundice phototherapy according to claim 1, wherein the low refractive index material is one of cryolite (Na3AlF6), magnesium fluoride (MgF2) or cerium oxide (SiO2). . 如申請專利範圍第1項所述之黃疸光療用之保溫箱構造,其中,所述高折射率材料係為二氧化鈦(TiO2)、硫化鋅(ZnS)、二氧化鈰(CeO2)或二氧化鋯(ZrO2)其中之一。 The incubator structure for jaundice phototherapy according to claim 1, wherein the high refractive index material is titanium dioxide (TiO2), zinc sulfide (ZnS), ceria (CeO2) or zirconium dioxide ( One of ZrO2). 如申請專利範圍第1項所述之黃疸光療用之保溫箱構造,其中,所述反射膜係塗佈或蒸鍍在所述箱體內壁面上。 The incubator structure for jaundice phototherapy according to claim 1, wherein the reflective film is coated or vapor-deposited on the inner wall surface of the casing. 如申請專利範圍第1項所述之黃疸光療用之保溫箱構造,其中,所述箱體內有一發光源,前述藍光由該發光源發出,且該藍光之波長係介於425奈米至475奈米之間。 The incubator structure for jaundice phototherapy according to claim 1, wherein the box body has a light source, the blue light is emitted by the light source, and the wavelength of the blue light is between 425 nm and 475 nm. Between meters.
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