TWI424263B - Metal mask - Google Patents
Metal maskInfo
- Publication number
- TWI424263B TWI424263B TW101113636A TW101113636A TWI424263B TW I424263 B TWI424263 B TW I424263B TW 101113636 A TW101113636 A TW 101113636A TW 101113636 A TW101113636 A TW 101113636A TW I424263 B TWI424263 B TW I424263B
- Authority
- TW
- Taiwan
- Prior art keywords
- metal mask
- mask
- metal
- Prior art date
Links
- 239000002184 metal Substances 0.000 title 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW101113636A TWI424263B (en) | 2012-04-17 | 2012-04-17 | Metal mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW101113636A TWI424263B (en) | 2012-04-17 | 2012-04-17 | Metal mask |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201344341A TW201344341A (en) | 2013-11-01 |
| TWI424263B true TWI424263B (en) | 2014-01-21 |
Family
ID=49990195
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW101113636A TWI424263B (en) | 2012-04-17 | 2012-04-17 | Metal mask |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TWI424263B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112526820A (en) * | 2020-12-21 | 2021-03-19 | 泉芯集成电路制造(济南)有限公司 | Photomask defect repairing method, photomask preparation method and photomask |
| CN113093944A (en) * | 2021-04-19 | 2021-07-09 | 江西展耀微电子有限公司 | Circuit, preparation method thereof and touch screen |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW573033B (en) * | 1999-11-24 | 2004-01-21 | Dainippon Printing Co Ltd | A sputtering mask, a color filter obtained by using the sputtering mask, and a sputtering method |
| US6893709B2 (en) * | 2000-08-25 | 2005-05-17 | Samsung Sdi Co., Ltd. | Metal mask structure and method for manufacturing thereof |
| JP2008098456A (en) * | 2006-10-13 | 2008-04-24 | Eudyna Devices Inc | Manufacturing method of semiconductor device |
-
2012
- 2012-04-17 TW TW101113636A patent/TWI424263B/en active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW573033B (en) * | 1999-11-24 | 2004-01-21 | Dainippon Printing Co Ltd | A sputtering mask, a color filter obtained by using the sputtering mask, and a sputtering method |
| US6893709B2 (en) * | 2000-08-25 | 2005-05-17 | Samsung Sdi Co., Ltd. | Metal mask structure and method for manufacturing thereof |
| JP2008098456A (en) * | 2006-10-13 | 2008-04-24 | Eudyna Devices Inc | Manufacturing method of semiconductor device |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201344341A (en) | 2013-11-01 |
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