TWI420715B - Thermal rectifier and method for enabling thermal rectification - Google Patents
Thermal rectifier and method for enabling thermal rectification Download PDFInfo
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Description
本發明係關於一種熱整流器,特別是關於一種具有一真空層的熱整流器。This invention relates to a thermal rectifier, and more particularly to a thermal rectifier having a vacuum layer.
熱整流的文獻記載始於1935年C. Starr宣稱在銅/氧化銅接面觀測到方向相依之熱流特性。最近(2006年)美國柏克萊大學在奈米碳管接面量測到熱整流的特性。但其效能僅能達到6%,且操作温度低[Science,314,1121(2006)],其熱流是由孤立子(soliton)來傳輸。除上述兩實驗之文獻外,理論構想包括利用聲子及光子來實踐熱整流元件。利用聲子載子在奈米接面的傳導來製作熱整流器,其困難源自接面的邊界條件,在真實的材料中很難達成,因此利用聲子載子來建構熱整流是非常困難地[Physical Review Letters,97,124302(2006)]。光子載子熱整流器是由兩個異質材料,中間隔着真空層所構成[Physical Review Letters,104,154301(2010)]。此兩種材料有不同的放射光子頻率。在順向温差時可以達到光子共振特性而將光子從A材料傳送到B材料使熱流透過光子傳遞。在逆向温差時,系統失去光子共振特性,使得熱流無法從B傳送到A材料。因光子放射不具持定方向,使得多數光子都無法從材料A傳送到B。因此利用光子來建構熱整流器,其熱整流效率低。本發明利用電子為熱能的載子,並利用量子點接面來建構高效率之熱整流器。The literature on thermal rectification began in 1935 when C. Starr declared that the direction of heat flow was observed at the copper/copper oxide junction. Recently (2006), the University of Berkeley in the United States measured the characteristics of thermal rectification at the carbon nanotube junction. However, its performance is only 6%, and the operating temperature is low [Science, 314, 1121 (2006)], and its heat flow is transmitted by soliton. In addition to the literature from the two experiments above, the theoretical concept involves the use of phonons and photons to practice thermal rectification elements. The use of phonon carriers to conduct thermal rectifiers at the junction of the nano-surfaces is difficult to derive from the boundary conditions of the junction, which is difficult to achieve in real materials. Therefore, it is very difficult to construct thermal rectification using phonon carriers. [Physical Review Letters, 97, 124302 (2006)]. The photon carrier thermal rectifier consists of two heterogeneous materials sandwiched by a vacuum layer [Physical Review Letters, 104, 154301 (2010)]. These two materials have different emission photon frequencies. Photon resonance characteristics can be achieved in the forward temperature difference to transfer photons from the A material to the B material to allow heat flow to pass through the photons. In the case of a reverse temperature difference, the system loses photon resonance characteristics, so that heat flow cannot be transferred from B to material A. Since photon emission does not have a fixed orientation, most photons cannot be transferred from material A to B. Therefore, the use of photons to construct a thermal rectifier has low thermal rectification efficiency. The present invention utilizes electrons as carriers of thermal energy and utilizes quantum dot junctions to construct high efficiency thermal rectifiers.
本發明提供一種熱整流器,包含:一第一電極;一第二電極;一絕緣層,設置於該第一電極與該第二電極之間;複數個量子點,設置於該絕緣層內;以及一真空層,設置於該絕緣層與該第一電極之間。The present invention provides a thermal rectifier comprising: a first electrode; a second electrode; an insulating layer disposed between the first electrode and the second electrode; a plurality of quantum dots disposed in the insulating layer; A vacuum layer is disposed between the insulating layer and the first electrode.
較佳地,該真空層的厚度係被選擇使得當該第二電極的溫度比該第一電極的溫度高時一熱流從該第二電極流至該第一電極,且當該第一電極的溫度比該第二電極的溫度高時基本上無熱流從該第一電極流至該第二電極。Preferably, the thickness of the vacuum layer is selected such that when the temperature of the second electrode is higher than the temperature of the first electrode, a heat flow flows from the second electrode to the first electrode, and when the first electrode When the temperature is higher than the temperature of the second electrode, substantially no heat flow flows from the first electrode to the second electrode.
較佳地,該第一電極與該複數個量子點之間的一電子交互作用係以一第一耦合參數表示,且該第二電極與該複數個量子點之間的一電子交互作用係以一第二耦合參數表示。Preferably, an electronic interaction between the first electrode and the plurality of quantum dots is represented by a first coupling parameter, and an electronic interaction between the second electrode and the plurality of quantum dots is A second coupling parameter representation.
較佳地,該複數個量子點彼此之間的一電子交互作用係以一第三耦合參數表示,且該第三耦合參數係大於該第一耦合參數及該第二耦合參數。Preferably, an electronic interaction between the plurality of quantum dots is represented by a third coupling parameter, and the third coupling parameter is greater than the first coupling parameter and the second coupling parameter.
較佳地,該第一耦合參數、該第二耦合參數及該第二耦合參數係被選擇使得當該第二電極的溫度比該第一電極的溫度高時一熱流從該第二電極流至該第一電極,且當該第一電極的溫度比該第二電極的溫度高時基本上無熱流從該第一電極流至該第二電極。Preferably, the first coupling parameter, the second coupling parameter and the second coupling parameter are selected such that when the temperature of the second electrode is higher than the temperature of the first electrode, a heat flow flows from the second electrode to The first electrode, and when the temperature of the first electrode is higher than the temperature of the second electrode, substantially no heat flow flows from the first electrode to the second electrode.
較佳地,該第一電極的溫度與該第二電極的溫度基本上與室溫相近。Preferably, the temperature of the first electrode and the temperature of the second electrode are substantially close to room temperature.
較佳地,每一該複數個量子點的基態與第一激發態之間的能距係大於該第一電極與該第二電極的熱能。Preferably, the energy distance between the ground state and the first excited state of each of the plurality of quantum dots is greater than the thermal energy of the first electrode and the second electrode.
較佳地,該量子點係由半導體材料或是絕緣材料形成。Preferably, the quantum dots are formed of a semiconductor material or an insulating material.
較佳地,每一該複數個量子點的直徑係大約1奈米。Preferably, each of the plurality of quantum dots has a diameter of about 1 nm.
較佳地,該複數個量子點中量子點間的間距係大約3奈米。Preferably, the spacing between the quantum dots in the plurality of quantum dots is about 3 nm.
本發明另提供一種熱整流方法,包含:提供一絕緣層,該絕緣層具有複數個量子點設置於其中;提供一第一電極,該第一電極與該絕緣層接觸;以及提供一第二電極,該第二電極藉由一真空層與該第二絕緣層分開。The present invention further provides a thermal rectification method comprising: providing an insulating layer having a plurality of quantum dots disposed therein; providing a first electrode, the first electrode is in contact with the insulating layer; and providing a second electrode The second electrode is separated from the second insulating layer by a vacuum layer.
較佳地,本發明之熱整流方法進一步提供該真空層包含選擇該真空層的厚度使得當該第二電極的溫度比該第一電極的溫度高時一熱流從該第二電極流至該第一電極,且當該第一電極的溫度比該第二電極的溫度高時基本上無熱流從該第一電極流至該第二電極。Preferably, the thermal rectification method of the present invention further provides that the vacuum layer comprises selecting a thickness of the vacuum layer such that when the temperature of the second electrode is higher than the temperature of the first electrode, a heat flow flows from the second electrode to the first An electrode, and substantially no heat flow from the first electrode to the second electrode when the temperature of the first electrode is higher than the temperature of the second electrode.
較佳地,本發明之熱整流方法中,該第一電極與該複數個量子點之間的一電子交互作用係以一第一耦合參數表示,且該第二電極與該複數個量子點之間的電子交互作用係以一第二耦合參數表示。Preferably, in the thermal rectification method of the present invention, an electronic interaction between the first electrode and the plurality of quantum dots is represented by a first coupling parameter, and the second electrode and the plurality of quantum dots are The electronic interaction between the two is represented by a second coupling parameter.
較佳地,本發明之熱整流方法中,提供該複數個量子點包含選擇該量子點的平均尺寸及間距,使得該量子點彼此之間的一電子交互作用係以一第三耦合參數表示,且該第三耦合參數係大於該第一耦合參數及該第二耦合參數。Preferably, in the thermal rectification method of the present invention, providing the plurality of quantum dots comprises selecting an average size and a spacing of the quantum dots such that an electronic interaction between the quantum dots is represented by a third coupling parameter. And the third coupling parameter is greater than the first coupling parameter and the second coupling parameter.
較佳地,本發明之熱整流方法中,該複數個量子點進一步包含選擇該第一耦合參數、該第二耦合參數及該第二耦合參數,使得當該第二電極的溫度比該第一電極的溫度高時一熱流從該第二電極流至該第一電極,且當該第一電極的溫度比該第二電極的溫度高時基本上無熱流從該第一電極流至該第二電極。Preferably, in the thermal rectification method of the present invention, the plurality of quantum dots further includes selecting the first coupling parameter, the second coupling parameter, and the second coupling parameter such that when the temperature of the second electrode is greater than the first a heat flow from the second electrode to the first electrode when the temperature of the electrode is high, and substantially no heat flow from the first electrode to the second when the temperature of the first electrode is higher than the temperature of the second electrode electrode.
較佳地,本發明之熱整流方法中,該複數個量子點包含選擇該量子點的組成及尺寸,使得該每一量子點的基態與第一激發態之間的能距係大於該第一電極與該第二電極的熱能。Preferably, in the thermal rectification method of the present invention, the plurality of quantum dots comprise a composition and a size of the quantum dots, such that an energy distance between the ground state and the first excited state of each quantum dot is greater than the first Thermal energy of the electrode and the second electrode.
綜上所述,本發明熱整流器及熱整流方法利用選擇真空層的厚度及各項耦合參數,達到熱流僅能以單一方向流動的效果。In summary, the thermal rectifier and the thermal rectification method of the present invention utilize the thickness of the selected vacuum layer and various coupling parameters to achieve the effect that the heat flow can only flow in a single direction.
請參考第一圖,係例示說明本發明熱整流器之基本結構。如第一圖所示,熱整流器100包含:一第一電極101、一第二電極102、一絕緣層103、複數個量子點104以及一真空層105。一般而言,第一電極101的溫度與第二電極102的溫度基本上與室溫相近。如圖所示,絕緣層103係設置於第一電極101與第二電極102之間,且第一電極101與絕緣層103接觸。Please refer to the first figure for illustrating the basic structure of the thermal rectifier of the present invention. As shown in the first figure, the thermal rectifier 100 includes a first electrode 101, a second electrode 102, an insulating layer 103, a plurality of quantum dots 104, and a vacuum layer 105. In general, the temperature of the first electrode 101 and the temperature of the second electrode 102 are substantially similar to room temperature. As shown, the insulating layer 103 is disposed between the first electrode 101 and the second electrode 102, and the first electrode 101 is in contact with the insulating layer 103.
量子點104係設置於絕緣層103內。量子點104的組成及尺寸係被選擇,使每一量子點104的基態與第一激發態之間的能距係大於第一電極101與第二電極102的熱能。一般而言,每一量子點104的基態與第一激發態的能距係比kB T大,其中kB 為波滋曼常數,T為熱整流器100之溫度。因此,每一量子點104只具有一個能階,且量子點104係可由半導體材料形成。較佳地,每一量子點104的直徑係大約為1奈米,且量子點104間的間距係大約為3奈米。The quantum dots 104 are disposed in the insulating layer 103. The composition and size of the quantum dots 104 are selected such that the energy distance between the ground state and the first excited state of each quantum dot 104 is greater than the thermal energy of the first electrode 101 and the second electrode 102. In general, the energy state of the ground state of each quantum dot 104 and the first excited state is greater than k B T , where k B is the Boziman constant and T is the temperature of the thermal rectifier 100. Thus, each quantum dot 104 has only one energy level and the quantum dots 104 can be formed from a semiconductor material. Preferably, each quantum dot 104 has a diameter of about 1 nanometer and the quantum dots 104 have a spacing of about 3 nanometers.
真空層105設置於絕緣層103與第一電極101之間,第一電極101藉由真空層105與絕緣層103分開。因為聲子(phonon)在真空中無法傳輸,真空層105阻隔聲子傳遞熱能。此外,真空層105允許電子通過。真空層105的厚度係可被選擇使得當第二電極102的溫度比第一電極101的溫度高時熱流從第二電極102流至第一電極101,且當第一電極101的溫度比第二電極102的溫度高時,基本上無熱流從第一電極101流至第二電極102。The vacuum layer 105 is disposed between the insulating layer 103 and the first electrode 101, and the first electrode 101 is separated from the insulating layer 103 by the vacuum layer 105. Since the phonon cannot be transported in a vacuum, the vacuum layer 105 blocks the phonons from transferring thermal energy. In addition, the vacuum layer 105 allows electrons to pass. The thickness of the vacuum layer 105 may be selected such that when the temperature of the second electrode 102 is higher than the temperature of the first electrode 101, heat flows from the second electrode 102 to the first electrode 101, and when the temperature of the first electrode 101 is lower than the second When the temperature of the electrode 102 is high, substantially no heat flows from the first electrode 101 to the second electrode 102.
本發明一種實施例中,第一電極101與量子點104之間的電子交互作用以第一耦合參數表示,且第二電極102與量子點104之間的電子交互作用以第二耦合參數表示。量子點104的平均尺寸及間距係被選擇,使量子點104彼此之間的電子交互作用以第三耦合參數表示,且第三耦合參數係大於該第一耦合參數及該第二耦合參數。該第一耦合參數、該第二耦合參數及該第二耦合參數係被選擇使得當第二電極104的溫度比該第一電極101的溫度高時熱流從第二電極102流至第一電極101,且當第一電極101的溫度比第二電極102的溫度高時基本上無熱流從第一電極101流至第二電極102。In one embodiment of the invention, the electronic interaction between the first electrode 101 and the quantum dot 104 is represented by a first coupling parameter, and the electronic interaction between the second electrode 102 and the quantum dot 104 is represented by a second coupling parameter. The average size and spacing of the quantum dots 104 are selected such that the electronic interaction between the quantum dots 104 is represented by a third coupling parameter, and the third coupling parameter is greater than the first coupling parameter and the second coupling parameter. The first coupling parameter, the second coupling parameter, and the second coupling parameter are selected such that heat flow flows from the second electrode 102 to the first electrode 101 when the temperature of the second electrode 104 is higher than the temperature of the first electrode 101 And substantially no heat flow flows from the first electrode 101 to the second electrode 102 when the temperature of the first electrode 101 is higher than the temperature of the second electrode 102.
為進一步說明本發明之熱整流器,通過熱整流器100的電流與熱流分別以下列方程式表示:To further illustrate the thermal rectifier of the present invention, the current through the thermal rectifier 100 and the heat flow are represented by the following equations, respectively:
其中γ l (ε )為傳輸係數,其關係式為 Where γ l ( ε ) is the transmission coefficient and its relation is
f 21 (ε )=f 2 (ε )-f 1 (ε )且f 2(1) (ε )=1(+1)為第一電極101與第二電極102的費米分佈函數(Fermi distribution function)。T1 (T2 )係分別為第一電極101與第二電極102的溫度。EF 為兩電極的平均費米能量(Fermi energy)。 f 21 ( ε )= f 2 ( ε )- f 1 ( ε ) and f 2(1) ( ε )=1( +1) is a Fermi distribution function of the first electrode 101 and the second electrode 102. T 1 (T 2 ) is the temperature of the first electrode 101 and the second electrode 102, respectively. E F is the average Fermi energy of the two electrodes.
第一電極101與第二電極102的化學能差μ 2 -μ 1 係等於第一電極101與第二電極102間的偏壓eΔV,其中第一電極101與第二電極102間的電位勢差eΔV係由第一電極101與第二電極102間的溫度梯度所造成的。Γ l ,1 (ε )及Γ l ,2 (ε )分別代表電子從量子點104到第一電極101與第二電極102的穿遂率。e為電子基本電量,h為普朗克常數。The chemical energy difference μ 2 - μ 1 of the first electrode 101 and the second electrode 102 is equal to the bias voltage eΔV between the first electrode 101 and the second electrode 102, wherein the potential difference between the first electrode 101 and the second electrode 102 The eΔV is caused by a temperature gradient between the first electrode 101 and the second electrode 102. Γ l , 1 ( ε ) and Γ l , 2 ( ε ) represent the transmittance of electrons from the quantum dot 104 to the first electrode 101 and the second electrode 102, respectively. e is the basic electrical quantity of electricity, and h is the Planck constant.
量子點104基態能階與激發態能階的能階分離遠大於量子點104內電子交互作用能階U1 ,和熱擾動能量kB T,T為系統溫度。因為於量子點104間有很高的位障,量子點間彈碰項(interdot hopping term)係被忽略。The energy level separation of the ground state energy level and the excited state energy level of the quantum dot 104 is much larger than the electron interaction energy level U 1 in the quantum dot 104, and the thermal perturbation energy k B T, T is the system temperature. Because of the high barrier between quantum dots 104, the interdot hopping term is ignored.
第一電極101之溫度T1 以T0 -ΔT/2表示,且第二電極102之溫度T2 以T0 +ΔT/2表示。T0 為第一電極101與第二電極102達平衡的溫度,ΔT為第一電極101與第二電極102的溫度差。因為電化能差的關係,由第一電極101與第二電極102間的溫度梯度所造成的eΔV將會非常明顯,並維持每一量子點104能階的偏移。本發明之熱整流器100在第二電極102溫度大於第一電極101時具有良好的熱傳導,而在第二電極102溫度小於第二電極101時不具良好的熱傳導。參考第(1)式及第(2)式,可知影響熱流的不對稱之因素不只有量子點104與電極101、102間耦合的不對稱,還有量子點104間電子的庫倫交互作用。一般而言,可假設並無任何外加迴路施加於於兩端金屬電極101、102,因此對電子而言,熱整流器100視同開路。同時,藉由計算第(1)式及第(2)式,可取得所需的ΔV及熱流。The temperature T 1 of the first electrode 101 is represented by T 0 -ΔT/2, and the temperature T 2 of the second electrode 102 is represented by T 0 +ΔT/2. T 0 is a temperature at which the first electrode 101 and the second electrode 102 are in equilibrium, and ΔT is a temperature difference between the first electrode 101 and the second electrode 102. Because of the difference in electrochemical energy, the eΔV caused by the temperature gradient between the first electrode 101 and the second electrode 102 will be very significant and maintain the energy level shift of each quantum dot 104. The thermal rectifier 100 of the present invention has good heat conduction when the temperature of the second electrode 102 is greater than that of the first electrode 101, and does not have good heat conduction when the temperature of the second electrode 102 is smaller than that of the second electrode 101. Referring to equations (1) and (2), it can be seen that the factors affecting the asymmetry of heat flow are not only the asymmetry of coupling between quantum dots 104 and electrodes 101, 102, but also the coulomb interaction of electrons between quantum dots 104. In general, it can be assumed that no additional loop is applied to the metal electrodes 101, 102 at both ends, so that for the electrons, the thermal rectifier 100 is considered to be open. At the same time, by calculating the equations (1) and (2), the required ΔV and heat flow can be obtained.
第二圖係說明本發明熱整流器包含兩個量子點狀況下,熱流、平均佔據率及微分熱導。量子點A及量子點B的基態能階係分別以EA 及EB 表示。EA =EF -ΔE/5,且EB =EF +αB ΔE,其中αB 係介於0至1。熱流的表示係以基本單位Q0 表示,其中Q0 =Γ2 /(2h)。量子點內部的庫倫交互作用為U1 =30kB T0 ,且量子點間的庫倫交互作用為UAB =15kB T0 。量子點A至第一電極101的穿遂率為ΓA1 =0,量子點A至第二電極102的穿遂率為ΓA2 =2Γ。量子點B至第一電極101的穿遂率為ΓB1 =Γ,量子點B至第二電極102的穿遂率為ΓB2 =Γ。kB T0 等於25Γ。Γ為每一單元的平均穿遂率,以Γ=(ΓA2 +ΓA1 )/2表示。一般而言Γ係介於0.1至0.5meV。The second figure illustrates the heat flow, average occupancy, and differential thermal conductance of the thermal rectifier of the present invention comprising two quantum dots. The ground state energy systems of quantum dot A and quantum dot B are represented by E A and E B , respectively. E A = E F - ΔE/5, and E B = E F + α B ΔE, where α B is between 0 and 1. The representation of the heat flow is expressed in terms of the basic unit Q 0 , where Q 0 = Γ 2 / (2h). The Coulomb interaction inside the quantum dot is U 1 =30k B T 0 , and the Coulomb interaction between the quantum dots is U AB =15k B T 0 . The piercing rate of the quantum dot A to the first electrode 101 is Γ A1 =0, and the piercing rate of the quantum dot A to the second electrode 102 is Γ A2 = 2 Γ. The penetration rate of the quantum dot B to the first electrode 101 is Γ B1 = Γ, and the transmittance of the quantum dot B to the second electrode 102 is Γ B2 = Γ. k B T 0 is equal to 25 Γ. Γ is the average wear rate of each unit, expressed as Γ=(Γ A2 +Γ A1 )/2. In general, the lanthanide is between 0.1 and 0.5 meV.
當假設量子點內的庫倫交互作用力很大,量子點A及B中的平均佔據率將為0時,可得出下式:When it is assumed that the Coulomb interaction in a quantum dot is large, and the average occupancy in quantum dots A and B will be zero, the following formula can be derived:
Q/γB =π(1-NB )[(1-2NA )(EB -EF )f21 (EB )+2NA (EB +UAB -EF )f21 (EB +UAB )] (3)Q/γ B = π(1-N B )[(1-2N A )(E B -E F )f 21 (E B )+2N A (E B +U AB -E F )f 21 (E B +U AB )] (3)
其中,NA 及NB 分別係量子點A及B的平均佔據率,γB 為為量子點B的傳導因子(transmission factor),f21 為第一電極費米分布函數減去第二電極的費米分布函數。Wherein, N A and N B are the average occupancy of quantum dots A and B, respectively, γ B is the transmission factor of quantum dot B, and f 21 is the first electrode Fermi distribution function minus the second electrode Fermi distribution function.
第二A圖顯示出熱流與溫差的關係圖,當量子點的基態能階分別為EF +2ΔE/5及4ΔE/5,可以發現到當EB 越接近EF 的時候,利用第(3)式與實際計算出來的熱流差距越大,簡化算出來的效果越不好,但它所呈現的熱流行為仍有一定程度上的準確性。因此,使用第(3)式對於了解熱整流行為相當方便。如第二圖B所示,量子點A的電子占據率NA 對於ΔT產生不對稱的行為,這是由於量子點左右穿隧率ΓA1 =0及ΓA2 =2Γ非常不對稱。The second graph A shows the relationship between the heat flow and the temperature difference. The ground state energy levels of the equivalence sub-points are E F +2 ΔE/5 and 4 ΔE/5, respectively. It can be found that when E B is closer to E F , the third (3) is utilized. The larger the difference between the heat flow and the actual calculated heat flow, the worse the effect of simplifying the calculation, but the heat popularity it presents is still somewhat accurate. Therefore, using equation (3) is quite convenient for understanding the thermal rectification behavior. As shown in the second graph B, the electron occupancy rate N A of the quantum dot A produces an asymmetrical behavior for ΔT, which is due to the fact that the quantum dot left and right tunneling rates Γ A1 =0 and Γ A2 = 2 Γ are very asymmetrical.
第二C圖說明微分熱導,其基本單位為Q0 kB /Γ。由圖中可看出,EB 之變化對於熱整流器100之整流效果的改變並不明顯。微分熱導在-20Γ<kB ΔT<20Γ間係大約正比於ΔT。The second C diagram illustrates the differential thermal conductance, the basic unit of which is Q 0 k B /Γ. As can be seen from the figure, the change in E B is not significant for the rectification effect of the thermal rectifier 100. The differential thermal conductance is approximately proportional to ΔT between -20 Γ < k B ΔT < 20 Γ.
熱整流的機制與電整流類似,然而熱流是靠溫度差以及化學位勢所產生。比較特別的是,當在線性區域中,由於兩端電極溫差沒那麼大,熱流對於所產生化學電位勢差造成的影響為一線性函數,反之在非線性區域下,由於兩端電極溫差比較大,熱流對於兩端電極化學位勢差的影響就不是線性關係而是一個非線性的函數。The mechanism of thermal rectification is similar to that of electrical rectification, however heat flow is generated by temperature difference and chemical potential. More specifically, when in the linear region, because the temperature difference between the electrodes at both ends is not so large, the influence of heat flow on the potential difference of the generated chemical potential is a linear function, whereas in the nonlinear region, the temperature difference between the electrodes at both ends is relatively large. The effect of heat flow on the chemical potential difference between the electrodes at both ends is not a linear relationship but a nonlinear function.
需特別注意的是,因為能量為EB +UAB 的共振通道其能量相較EF 係太高的,因此係能量為EB 共振通道產生熱流。熱流Q的正負號係由f21 (EB )決定,其中f21 (EB )與庫倫交互作用、穿遂率及量子點能階有關。熱流Q的整流效果主要由1-2NA 決定,因此說明了量子點A的能階需小於EF 以及量子點間庫倫交互作用的重要性。當ΔT<0時,熱流Q的負號說明熱流係由第一電極101流向第二電極102。整流效率以下式表示:It is important to note that because the energy of the resonant channel of E B +U AB is too high compared to the E F system, the energy is the heat flow of the E B resonant channel. The sign of heat flow Q is determined by f 21 (E B ), where f 21 (E B ) is related to Coulomb interaction, penetration rate and quantum dot energy level. The rectification effect of heat flow Q is mainly determined by 1-2N A , thus indicating that the energy level of quantum dot A needs to be smaller than E F and the importance of Coulomb interaction between quantum dots. When ΔT < 0, the negative sign of the heat flow Q indicates that the heat flow system flows from the first electrode 101 to the second electrode 102. The rectification efficiency is expressed by the following formula:
ηQ =(Q(ΔT=30T)-|Q(ΔT=-30Γ)|)/Q(ΔT=-30Γ)η Q =(Q(ΔT=30T)-|Q(ΔT=-30Γ)|)/Q(ΔT=-30Γ)
當EB =EF +2ΔE/5時整流效率ηQ 為0.86,當EB =EF +4ΔE/5時整流效率ηQ 為0.88。When E B = E F + when 2ΔE / 5 rectification efficiency η Q is 0.86, when the E B = E F + when 4ΔE / 5 rectification efficiency η Q 0.88.
第三圖係說明本發明熱整流器包含三個量子點狀況下,不同ΓA1 之熱流、微分熱導及熱功率(Thermal power)與ΔT之間的關係。本實施例中,三個量子點分別為量子點A、量子點B及量子點C,且量子點A位於子點B及量子點C中間。量子點A的裸能階修正係數ηA 為|ΓA2 -ΓA1 )/(2Γ)|,用以反應量子點位置在不對稱穿遂率下的交互作用。穿隧率分別為ΓB(C),1 =ΓB(C),2 =Γ。量子點A、量子點B及量子點C的基態能階分別為EA =EF -ΔE/5、EB =EF +2ΔE/5及EB =EC +4ΔE/5。量子間彼此的庫倫交互作用為UAC =UBA =15kB T0 、UBC =8kB T0 。UC =30kB T0 ,其餘參數與兩量子點的狀況相同。請參考第四A圖,當ΓA1 為0時,熱整流效應較為顯著。熱流Q在ΔT=-30Γ時為0.068Q0 係較小的,但在ΔT=30Γ時為0.33 Q0 係大的,並可得出整流係數ηQ 為0.79。然而,ΓA1 為0時的熱流太小。當當ΓA1 為0.1Γ時,熱流Q在ΔT=-30Γ時為1.69Q0 ,在ΔT=30Γ時為5.69 Q0 ,可得出整流係數ηQ 為0.69。由此可知,當ΔT<0時,ΓA1 愈小則熱流愈小。進一步言之,量子點A的阻擋效果對於整流效應係相當重要的。如第三B圖所示,可以非常明顯地發現在ΓA1 =0.1Γ、ΓA2 =1.9Γ的情況下,看到負微分熱導的產生。而當ΓA1 =ΓA2 =Γ時,微分熱導係對稱的。The third figure illustrates the relationship between the heat flow, the differential thermal conductivity, and the thermal power and ΔT of the different Γ A1 in the case where the thermal rectifier of the present invention comprises three quantum dots. In this embodiment, the three quantum dots are quantum dot A, quantum dot B, and quantum dot C, respectively, and quantum dot A is located between sub-point B and quantum dot C. The bare-order correction coefficient η A of quantum dot A is |Γ A2 -Γ A1 )/(2Γ)|, which is used to reflect the interaction of quantum dot positions at asymmetric cross-ratio. The tunneling rates are Γ B(C), 1 = Γ B(C), 2 = Γ. The ground state energy levels of quantum dot A, quantum dot B, and quantum dot C are E A =E F -ΔE/5, E B =E F +2ΔE/5, and E B =E C +4ΔE/5, respectively. The Coulomb interaction between the quantums is U AC =U BA =15k B T 0 , U BC =8k B T 0 . U C = 30k B T 0 , and the remaining parameters are the same as those of the two quantum dots. Please refer to the fourth A picture. When Γ A1 is 0, the thermal rectification effect is more significant. The heat flow Q is 0.068Q 0 when ΔT=-30Γ, but is 0.33 Q 0 when ΔT=30Γ, and the rectification coefficient η Q is 0.79. However, the heat flow when Γ A1 is 0 is too small. Coupons Γ A1 is 0.1Γ, the heat flow Q when ΔT = -30Γ 1.69Q 0, at ΔT = time 30Γ is 5.69 Q 0, Q [eta] can be derived rectification coefficient is 0.69. From this, it can be seen that when ΔT < 0, the smaller the Γ A1 is, the smaller the heat flow is. Furthermore, the blocking effect of quantum dot A is quite important for the rectification effect system. As shown in the third panel B, it can be very clearly found that in the case of Γ A1 = 0.1 Γ and Γ A2 = 1.9 ,, the generation of negative differential thermal conductance is seen. When Γ A1 = Γ A2 = Γ, the differential thermal conductance is symmetrical.
熱功率與ΔT的如第三圖C所示,圖中除了在穿隧率對稱條件的曲線以外,熱功率都表現出一個高度不對稱的行為。根據熱功率的值,電化能eΔV可以是非常大的。因此,由電化能eΔV造成的量子點能階之改變係非常重要的。為了進一步說明,請參考第四圖。第四圖係說明具有不同能階之量子點C的熱流、微分熱導及熱功率與ΔT之間的關係。第四圖所中,ΓA1 =0、、UBC =8kB T0 、ηA =0.3。其他參數與第三圖之實施例相同。實線代表所產生的化學電位勢eΔV造成量子點A能階的偏移,而虛線則代表沒將此效率考慮進去的情況,其中能量偏移的大小為ηA ΔV/2。可明顯得知,因為ΔV造成的量子點能階偏移造成熱流的減少。雖然在EC =EF +ΔE/5及EC =EF +3ΔE/5的狀況下,熱流皆顯示出整流效應,但熱功率卻顯示出不同的結果。請同時參考第三圖C及第四圖C,可得知熱流與電化能ΔV並非成一線性函數。由上述說明可知,三量子點系統的整流效率,其效率隨著溫差越高而整流效率越好。然而,整流效率ηQ 與量子點C的基態能階的影響差異並不大。The thermal power and ΔT are shown in Figure C. In the figure, except for the curve of the tunneling rate symmetry condition, the thermal power exhibits a highly asymmetric behavior. The electrochemical energy eΔV can be very large depending on the value of the thermal power. Therefore, the change of the quantum dot energy level caused by the electrochemical energy eΔV is very important. For further explanation, please refer to the fourth picture. The fourth graph illustrates the relationship between heat flow, differential thermal conductivity, and thermal power and ΔT for quantum dots C having different energy levels. In the fourth figure, Γ A1 =0, U BC = 8k B T 0 , η A = 0.3. Other parameters are the same as in the embodiment of the third figure. The solid line represents the chemical potential potential eΔV generated to cause the shift of the quantum dot A energy level, and the broken line represents the case where the efficiency is not taken into account, wherein the magnitude of the energy offset is η A ΔV/2. It is apparent that the quantum dot energy level shift caused by ΔV causes a decrease in heat flow. Although the heat flow shows a rectifying effect under the condition of E C =E F +ΔE/5 and E C =E F +3ΔE/5, the thermal power shows different results. Please refer to the third figure C and the fourth figure C at the same time, it can be seen that the heat flow and the electrochemical energy ΔV are not a linear function. As can be seen from the above description, the rectification efficiency of the three-quantum dot system has a higher rectification efficiency as the temperature difference is higher. However, the difference between the rectification efficiency η Q and the ground state energy level of the quantum dot C is not large.
綜上討論,比較具有兩量子點與三量子點之熱整流器,可得知熱整流效率在兩種狀況下係幾乎相同的。然而,在具有三量子點之熱整流器中,熱流的強度係明顯增加的。同時,可得知本發明熱整流器之整流效應係與量子點及電極間的耦合、電子庫倫交互作用及不同量子點能階的差異有關。In summary, comparing a thermal rectifier with two quantum dots and three quantum dots, it can be seen that the thermal rectification efficiency is almost the same under two conditions. However, in a thermal rectifier with three quantum dots, the intensity of the heat flow is significantly increased. At the same time, it can be known that the rectifying effect system of the thermal rectifier of the present invention is related to the coupling between quantum dots and electrodes, the interaction of electron coulombs and the difference of energy levels of different quantum dots.
由上述敘述可知,本發明實為一新穎、進步且具產業實用性之發明。雖然本發明已以較佳實施例揭露如上,然其並非用以限定本發明,任何熟悉此技藝者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾。As apparent from the above description, the present invention is a novel, advanced and industrially useful invention. While the invention has been described above in terms of the preferred embodiments thereof, it is not intended to limit the invention, and various modifications and changes can be made without departing from the spirit and scope of the invention.
100...熱整流器100. . . Thermal rectifier
101...第一電極板101. . . First electrode plate
102...第二電極板102. . . Second electrode plate
103...絕緣層103. . . Insulation
104...量子點104. . . Quantum dot
105...真空層105. . . Vacuum layer
第一圖係例示說明本發明熱整流器之基本結構。The first figure illustrates the basic structure of the thermal rectifier of the present invention.
第二圖係說明本發明熱整流器包含兩個量子點狀況下,熱流、平均佔據率及微分熱導。The second figure illustrates the heat flow, average occupancy, and differential thermal conductance of the thermal rectifier of the present invention comprising two quantum dots.
第三圖係說明本發明熱整流器包含三個量子點狀況下,不同ΓA1 之熱流、微分熱導及熱功率與ΔT之間的關係。The third figure illustrates the relationship between the heat flow, the differential thermal conductivity, and the thermal power and ΔT of the different Γ A1 in the case where the thermal rectifier of the present invention comprises three quantum dots.
第四圖係說明具有不同能階之量子點的熱流、微分熱導及熱功率與ΔT之間的關係。The fourth graph illustrates the relationship between heat flow, differential thermal conductivity, and thermal power and ΔT for quantum dots with different energy levels.
100...熱整流器100. . . Thermal rectifier
101...第一電極板101. . . First electrode plate
102...第二電極板102. . . Second electrode plate
103...絕緣層103. . . Insulation
104...量子點104. . . Quantum dot
105...真空層105. . . Vacuum layer
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