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TWI405615B - A method and a control system for controlling the operation of a last field of an electrostatic precipitator - Google Patents

A method and a control system for controlling the operation of a last field of an electrostatic precipitator Download PDF

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TWI405615B
TWI405615B TW97107538A TW97107538A TWI405615B TW I405615 B TWI405615 B TW I405615B TW 97107538 A TW97107538 A TW 97107538A TW 97107538 A TW97107538 A TW 97107538A TW I405615 B TWI405615 B TW I405615B
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slap
dust
time
previous
amplitude
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TW97107538A
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TW200900153A (en
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Scott A Boyden
Anders Karlsson
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Alstom Technology Ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B03SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03CMAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C3/00Separating dispersed particles from gases or vapour, e.g. air, by electrostatic effect
    • B03C3/34Constructional details or accessories or operation thereof
    • B03C3/74Cleaning the electrodes
    • B03C3/76Cleaning the electrodes by using a mechanical vibrator, e.g. rapping gear ; by using impact
    • B03C3/763Electricity supply or control systems therefor

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  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Mechanical Engineering (AREA)
  • Electrostatic Separation (AREA)

Abstract

An electrostatic precipitator (1) has a last field (14) being provided with discharge electrodes (16), collecting electrodes (18) and a rapping device (22), which is adapted for cleaning the collecting electrodes (18) by means of rapping them. A control system (30) for controlling the dust particle emission from the electrostatic precipitator (1) comprises a control device (38), which is operative for adjusting, based on a relation between a magnitude (H) of a selected dust particle emission peak caused by a selected rapping and the time (t) between said selected rapping and its immediately preceding rapping, at least one parameter chosen from the group of: the time (t) to elapse until a rapping is to be executed in the last field (14), and the type of rapping to be executed in the last field (14).

Description

用以控制靜電集塵器的最後場之運作之方法及控制系統Method and control system for controlling the operation of the last field of an electrostatic precipitator

本發明係關於一種控制來自靜電集塵器之塵粒發射的方法,該靜電集塵器具有一最後場,該最後場係提供放電電極、收集電極、及一拍擊裝置,該拍擊裝置係經調適用以藉由拍擊該等收集電極來為其除塵。The present invention relates to a method of controlling the emission of dust particles from an electrostatic precipitator having a final field, the last field providing a discharge electrode, a collecting electrode, and a slap device, the slap device being The adjustment applies to dusting the collector electrodes by tapping them.

本發明亦關於一種預測靜電集塵器之最後場之至少一收集電極之拍擊期間之塵粒之發射的方法。The invention also relates to a method of predicting the emission of dust particles during the slap of at least one collecting electrode of the last field of the electrostatic precipitator.

本發明亦關於一種用以控制來自上面說明之類型之靜電集塵器之塵粒發射的控制系統。The invention also relates to a control system for controlling the emission of dust particles from an electrostatic precipitator of the type described above.

本發明亦關於一種用以預測來自上面說明之類型之靜電集塵器之塵粒發射的控制系統。The invention also relates to a control system for predicting the emission of dust particles from an electrostatic precipitator of the type described above.

媒、油、工業廢棄物、家庭廢棄物、泥炭、生物體等之燃燒產生包含塵粒之煙道氣(其常常稱為飛灰)。塵粒向環境空氣之發射必須保持處於一低位準,因此,將煙道氣發射至環境空氣之前,常常使用一類型靜電集塵器(ESP)之過濾器來收集來自煙道氣之塵粒。在其他文件中從US 4,502,872所瞭解的ESP係提供放電電極及收集電極板。放電電極使塵粒帶電,之後在收集電極板處收集該等塵粒。當收集電極板載有塵粒時,拍擊收集電極板以便使所收集之塵粒從收集電極板釋放並落下於一漏斗中,可從該漏斗進一步運輸該等塵粒。經由一堆疊將已除塵氣體發射至環境空氣。Combustion of media, oil, industrial waste, household waste, peat, organisms, etc. produces flue gas (which is often referred to as fly ash) containing dust particles. The emission of dust particles to ambient air must be kept at a low level. Therefore, prior to the emission of flue gas to ambient air, a type of electrostatic precipitator (ESP) filter is often used to collect dust particles from the flue gas. The ESP system known from US 4,502,872, in other documents, provides a discharge electrode and a collector electrode plate. The discharge electrode charges the dust particles, and then collects the dust particles at the collecting electrode plates. When the collecting electrode plates are loaded with dust particles, the collecting electrode plates are slapped so that the collected dust particles are released from the collecting electrode plates and dropped into a funnel from which the dust particles can be further transported. The dedusted gas is emitted to the ambient air via a stack.

ESP常常提供數個串聯耦合之獨立單元,其亦稱為場。WO 91/08837(其說明三個串聯耦合之個別場)中可找到此之一範例。第一場收集最大數量之塵粒,因此需要比後續場頻繁得多的拍擊。最後場僅收集進入ESP之塵粒之總量的約0至3%。拍擊(其係在預設規則基礎上進行)一場時,離開ESP並發射至環境空氣的塵粒之數量在一短週期期間增加至相當高的位準,其在煙道氣中的塵粒經由堆疊而發射時甚至可視覺上觀察到。ESPs often provide several independent units coupled in series, also known as fields. An example of this can be found in WO 91/08837, which describes an individual field of three series couplings. The first game collects the largest number of dust particles and therefore requires a much more frequent slap than the subsequent field. The final field collects only about 0 to 3% of the total amount of dust particles entering the ESP. When a slap (which is based on a preset rule), the amount of dust particles leaving the ESP and emitted to the ambient air increases to a fairly high level during a short period of time, its dust particles in the flue gas It can even be visually observed when launched via stacking.

本發明之一目的係提供一種方法,其使得可以控制藉由靜電集塵器中之最後場之拍擊所造成的臨時大塵粒發射峰值。It is an object of the present invention to provide a method which makes it possible to control the temporary large dust emission peak caused by the last field slap in the electrostatic precipitator.

此目的係藉由一種控制來自靜電集塵器之塵粒發射的方法而實現,該靜電集塵器具有一最後場,該最後場係提供放電電極、收集電極、及一拍擊裝置,該拍擊裝置係經調適用以藉由拍擊該等收集電極來為其除塵,該方法係特徵化為以下步驟i)利用藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度與介於該選定拍擊與其緊接先前拍擊間之一時間之間的一關係,及ii)基於該關係,調整選自以下群組之至少一參數:該最後場中將要執行一拍擊之前的欲歷時之時間,及該最後場中欲執行之拍擊類型。This object is achieved by a method of controlling the emission of dust particles from an electrostatic precipitator having a final field, the last field providing a discharge electrode, a collecting electrode, and a slap device, the slap The apparatus is adapted to be dusted by slapping the collecting electrodes, the method being characterized by the following steps: i) utilizing one of the selected dust particle emission peaks caused by a selected slap And ii) adjusting at least one parameter selected from the group consisting of: following the relationship, the at least one parameter selected from the group consisting of: The time that you want to spend, and the type of slap you want to perform in the final game.

此方法之一優點係可以不超過塵粒發射限制的此一方式 準確控制該拍擊。因此,藉由本發明,可以在靜電集塵器中採用較少場、或較小場(與依據一先前技術方法運作時所必需之場相比)。此係由於依據本發明之一具體實施例之該方法運作該靜電集塵器時可減小該靜電集塵器之機械設計中之安全限度的事實。該拍擊之控制可與將要執行一拍擊之前的欲歷時之時間有關,或可與欲執行之拍擊類型有關,或可與欲歷時之時間及拍擊類型兩者有關。One of the advantages of this method is that it can not exceed the dust emission limit. Control the slap accurately. Thus, with the present invention, fewer fields, or smaller fields, can be employed in an electrostatic precipitator (compared to the fields necessary to operate in accordance with a prior art method). This is due to the fact that the electrostatic precipitator can reduce the safety margins in the mechanical design of the electrostatic precipitator when the method is operated in accordance with an embodiment of the present invention. The control of the slap may be related to the time of the slap before the slap is to be performed, or may be related to the type of slap to be performed, or may be related to both the time of the slap and the type of slap.

依據一具體實施例,該步驟ii)進一步包含計算波動平均(rolling average)值,其各對應於一預設週期期間之平均塵粒發射,及基於該關係,相對於一預設波動平均限制值調整該最後場之該等收集電極之該拍擊。此具體實施例有利地提供用以不會因錯誤時間無意中拍擊,或無意中實行錯誤拍擊類型而超過一塵粒發射限制(該限制係一波動平均值)的此一方式控制拍擊。According to a specific embodiment, the step ii) further comprises calculating a rolling average value, each corresponding to an average dust emission during a predetermined period, and based on the relationship, relative to a predetermined fluctuation average limit value The slap of the collection electrodes of the last field is adjusted. This embodiment advantageously provides for controlling the slap in a manner that does not inadvertently slap due to an erroneous time, or inadvertently implements an erroneous slap type that exceeds a dust emission limit (the limit is a volatility average) .

依據一較佳具體實施例,在該步驟i)中識別欲採用拍擊類型,且選擇一拍擊類型特定模型以便在步驟i)中加以利用,此類選定拍擊類型特定模型係藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度與介於該已識別特定拍擊類型之該選定拍擊與其緊接先前拍擊間之時間之間之關係的一模型。拍擊期間所釋放之灰塵量取決於所執行之拍擊類型。藉由利用為拍擊類型特定之模型,可以實施一更準確控制。According to a preferred embodiment, in step i), a type of slap is identified and a slap type specific model is selected for use in step i), such a selected slap type specific model is A model of the relationship between one of the selected dust particle emission peaks and the time between the selected slap of the identified specific slap type and the time immediately following the previous slap. The amount of dust released during a slap depends on the type of slap performed. A more accurate control can be implemented by utilizing a model specific to the type of slap.

較佳地,在該步驟i)中,當利用藉由一選定拍擊所造成 之一選定塵粒發射峰值之一幅度與介於該選定拍擊與其緊接先前拍擊間之一時間之間的該關係時,識別並考量該選定拍擊之前所執行之拍擊類型,該緊接先前拍擊之類型已加以識別。拍擊期間所釋放之灰塵量取決於所述拍擊之前所執行之拍擊類型。藉由考量所述拍擊之前所實行之拍擊類型,可以實施一更準確控制。Preferably, in the step i), when the use is made by a selected slap Identifying and considering the type of slap performed prior to the selected slap when one of the selected dust particle emission peaks has a relationship between the selected slap and a time between the selected slap and the previous slap, The type of previous slap has been identified. The amount of dust released during a slap depends on the type of slap performed prior to the slap. A more accurate control can be implemented by considering the type of slap performed prior to the slap.

較佳藉由下面的式子來表示藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度與介於該選定拍擊與其緊接先前拍擊間之時間之間的該關係:幅度函數(時間),其中從以下函數中選擇該函數:對數函數、及對數函數之近似值,該函數較佳為自然對數函數。自該緊接先前拍擊以來所歷時之時間越長,拍擊期間所釋放之灰塵越多不過,灰塵也會黏聚於收集電極板上,因此一選定塵粒發射峰值之幅度與自其緊接先前拍擊以來所歷時之時間之間的該關係並非線性的,而是最好藉由一對數函數加以說明。Preferably, the relationship between one of the peaks of the selected dust emission and the time between the selected slap and the time immediately following the previous slap caused by a selected slap is represented by the following equation: Amplitude Function (time), where the function is selected from the following functions: a logarithmic function, and an approximation of a logarithmic function, which is preferably a natural logarithmic function. The longer the time since the previous slap, the more dust is released during the slap, but the dust will also stick to the collecting electrode plate, so the peak of the selected dust emission peak is tight. This relationship between the time elapsed since the previous slap is non-linear, but is best illustrated by a one-to-one function.

依據一較佳具體實施例,藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度與介於該選定拍擊與其緊接先前拍擊間之時間之間之一關係的一數學模型可藉由測量塵粒發射峰值之幅度並使其與自該個別緊接先前拍擊以來所歷時之個別時間耦合而獲得。如此獲得之資料記錄可用於製備該數學模型。According to a preferred embodiment, a mathematical relationship between the amplitude of one of the selected dust emission peaks and the time between the selected slap and the time immediately following the previous slap is caused by a selected slap. The model can be obtained by measuring the magnitude of the dust emission peak and coupling it to the individual time since the individual was immediately slammed. The data record thus obtained can be used to prepare the mathematical model.

較佳藉由以下步驟來更新藉由一選定拍擊所造成之一選 定塵粒發射峰值之一幅度與介於該選定拍擊與其緊接先前拍擊間之時間之間之一關係的一數學模型D)測量該最後場之後之塵粒發射以識別與該最後場之至少一收集電極之一拍擊有關的一塵粒發射峰值,E)使該塵粒發射峰值之該測量幅度與自該最後場之該至少一收集電極之該緊接先前拍擊以來所歷時之該對應時間耦合以便形成一資料記錄,此類資料記錄包含該塵粒發射峰值之該幅度及自該緊接先前拍擊以來所歷時之該對應時間,及F)基於該資料記錄,更新藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度與介於該選定拍擊與其緊接先前拍擊間之時間之間之一關係的該數學模型。此具體實施例之一優點係更新該模型,使得該模型可經調適以適於該靜電集塵器之運作之變化條件。此類變化條件可與燃料類型之變化、收集電極板之表面特性之與時間有關之變化等等有關。該模型之該更新係較佳(但並非必須)在各新拍擊之後進行。作為替代,亦可每第二、每第三等等拍擊進行該更新。更佳地,步驟F)期間更新該數學模型的同時利用一資料過濾器。此具體實施例之一優點係以一更準確方式更新該模型,且亦可更快地調適該模型以適於該靜電集塵器之變化條件。Preferably, the following step is used to update one of the selections caused by a selected slap A mathematical model for determining the relationship between one of the peaks of the dust particle emission peak and the time between the selected slap and the time immediately following the previous slap D) measuring the dust particle emission after the last field to identify the last field One of the at least one collecting electrode slaps a relevant dust particle emission peak, E) the measured amplitude of the dust particle emission peak and the time from the last field of the at least one collecting electrode that is immediately after the previous slap The corresponding time is coupled to form a data record, the data record including the amplitude of the dust particle emission peak and the corresponding time since the previous slap, and F) updating based on the data record The mathematical model of one of the selected dust particle emission peaks and a relationship between the selected slap and the time immediately following the previous slap caused by a selected slap. One advantage of this embodiment is to update the model such that the model can be adapted to the changing conditions of operation of the electrostatic precipitator. Such varying conditions may be related to changes in the type of fuel, time-dependent changes in the surface characteristics of the collector plates, and the like. This update of the model is preferably (but not necessarily) performed after each new slap. Alternatively, the update can be made every second, every third, etc. slap. More preferably, a data filter is utilized while updating the mathematical model during step F). One of the advantages of this embodiment is to update the model in a more accurate manner, and the model can be adapted more quickly to suit the changing conditions of the electrostatic precipitator.

依據另一較佳具體實施例,基於該關係,調整選自以下群組之至少一參數:該最後場中將要執行一拍擊之前的欲歷時之時間,及該最後場中欲執行之拍擊類型,的該步驟 係藉由以下步驟來執行:測量藉由該最後場之該等收集電極之至少一收集電極之拍擊所造成之一塵粒發射峰值之幅度,將關於該塵粒發射峰值之該測量幅度的資訊發送至一計算裝置,該計算裝置比較該塵粒發射峰值之該測量幅度與一塵粒發射峰值幅度目標值,及用於最小化該塵粒發射峰值幅度目標值與藉由該最後場之該等收集電極之至少一收集電極之一後續拍擊所造成之一後續塵粒發射峰值之測量幅度間之差的目的,藉由該計算裝置,自動調整選自以下群組之至少一參數:該最後場中將要執行該後續拍擊之前的欲歷時之時間,及該最後場中欲執行之後續拍擊類型。此具體實施例之一優點係可利用一相當簡單的計算裝置,例如PID控制器、PI控制器或無模型適應性控制器。由於不需要一模型,所以不需要與獲得此一模型有關的任何廣泛工作。此外,拍擊之控制將相當快地調適以適於該靜電集塵器之變化條件,因為關於塵粒發射峰值之幅度的測量資料係連續發送至該計算裝置。According to another preferred embodiment, based on the relationship, at least one parameter selected from the group consisting of: the time of the desired duration before the slap in the last field, and the slap to be performed in the last field is adjusted. Type, the step Performing the following steps: measuring a magnitude of a dust emission peak caused by a slap of at least one collecting electrode of the collecting electrodes of the last field, and measuring the amplitude of the peak of the dust particle emission The information is sent to a computing device, the computing device compares the measured amplitude of the dust particle emission peak with a dust particle emission peak amplitude target value, and is used to minimize the dust particle emission peak amplitude target value and the last field For the purpose of the difference between the measured amplitudes of one of the subsequent dust emission peaks caused by one of the at least one collecting electrodes of the collecting electrodes, the computing device automatically adjusts at least one parameter selected from the group consisting of: The time in the last field to be executed before the subsequent slap, and the subsequent slap type to be executed in the last field. One advantage of this embodiment is that a relatively simple computing device can be utilized, such as a PID controller, a PI controller, or a modelless adaptive controller. Since no model is needed, there is no need for any extensive work related to obtaining this model. In addition, the control of the slap will be adapted relatively quickly to suit the changing conditions of the electrostatic precipitator since the measurement data relating to the magnitude of the peak of the dust emission is continuously transmitted to the computing device.

本發明之另一目的係提供一種可靠的預測靜電集塵器之最後場之至少一收集電極之拍擊期間之塵粒之發射的方法。Another object of the present invention is to provide a method for reliably predicting the emission of dust particles during the slap of at least one of the collection electrodes of the last field of the electrostatic precipitator.

此目的係藉由一種預測靜電集塵器之最後場之至少一收集電極之拍擊期間之塵粒之發射的方法而實現,該最後場 係提供放電電極、收集電極、及一拍擊裝置,該拍擊裝置係經調適用以藉由拍擊該等收集電極來為其除塵,該方法係特徵化為以下步驟利用藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度與介於該選定拍擊與其緊接先前拍擊間之時間之間的一關係,及基於藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度與介於該選定拍擊與其緊接先前拍擊間之時間之間的該關係,預測一從以下參數中選擇之參數:1)藉由一選定拍擊所造成之塵粒發射峰值之幅度,其係基於該選定拍擊與其緊接先前拍擊間之一欲歷時之時間,及2)一選定拍擊與其緊接先前拍擊間之欲歷時之時間,其係基於藉由該選定拍擊所造成之一塵粒發射峰值之幅度。This object is achieved by a method for predicting the emission of dust particles during the slap of at least one collecting electrode of the last field of the electrostatic precipitator, the last field Providing a discharge electrode, a collection electrode, and a slap device adapted to be deflated by slapping the collection electrodes, the method being characterized by the following steps utilizing a selected shot The relationship between one of the peaks of the selected dust emission and the time between the selected slap and the time immediately following the previous slap, and the selection of the dust based on one of the selected slaps The relationship between the amplitude of one of the emission peaks and the time between the selected slap and the immediately preceding slap, predicting a parameter selected from the following parameters: 1) dust particles caused by a selected slap The magnitude of the peak of the emission, based on the time between the selected slap and one of the previous slaps, and 2) the time of the selected slap and its immediate slap, which is based on The amplitude of one of the dust emission peaks caused by the selected slap.

此方法之一優點係可以以高準確度預測藉由該最後場之至少一收集電極之拍擊所造成之塵粒發射。因此,可以預測起因於某一拍擊頻率的係哪一塵粒發射,或預測需要哪一拍擊頻率以低於某一塵粒發射,例如某一塵粒發射之最大波動平均。此資訊可用於靜電集塵器之設計中,以及啟用階段期間靜電集塵器之運作之調整中。One of the advantages of this method is that the dust emission caused by the slap of at least one collecting electrode of the last field can be predicted with high accuracy. Therefore, it is possible to predict which dust particle emission is caused by a certain slap frequency, or predict which slap frequency is required to be lower than a certain dust particle emission, for example, the maximum fluctuation average of a certain dust particle emission. This information can be used in the design of electrostatic precipitators and in the adjustment of the operation of electrostatic precipitators during the start-up phase.

本發明之另一目的係提供一種控制系統,其使得可以消除,或至少減少,靜電集塵器之最後場之拍擊期間發生的臨時大塵粒發射之問題。Another object of the present invention is to provide a control system that eliminates, or at least reduces, the problem of temporary large dust emission that occurs during the last field of the electrostatic precipitator.

此目的係藉由一種用以控制來自靜電集塵器之塵粒發射的控制系統而實現,該靜電集塵器具有一最後場,該最後場係提供放電電極、收集電極及一拍擊裝置,該拍擊裝置係經調適用以藉由拍擊該等收集電極來為其除塵,該控制系統之特微為其包含一控制裝置,其係可運作以,基於藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度與介於該選定拍擊與其緊接先前拍擊間之時間之間的一關係,調整選自以下群組之至少一參數:該最後場中將要執行一拍擊之前的欲歷時之時間,及該最後場中欲執行之拍擊類型。This object is achieved by a control system for controlling the emission of dust particles from an electrostatic precipitator having a final field, the last field providing a discharge electrode, a collecting electrode and a slap device, The slap device is adapted to be dusted by slamming the collection electrodes, the control system of which includes a control device operable to be based on a selected slap Adjusting a relationship between a magnitude of a selected dust emission peak and a time between the selected slap and the immediately preceding slap, adjusting at least one parameter selected from the group consisting of: performing a beat in the last field The time of the previous experience and the type of slap to be performed in the final field.

此控制系統之一優點係其提供拍擊之有效控制,使得可最小化來自一靜電集塵器之塵粒發射。One of the advantages of this control system is that it provides effective control of the slap, so that dust emission from an electrostatic precipitator can be minimized.

依據一較佳具體實施例,該控制系統進一步包含一資料接收器,其係可運作以接收與該最後場之後之塵粒發射有關之測量資料,及在該測量資料中識別與該最後場之該至少一收集電極之拍擊有關的一塵粒發射峰值,一資料處理器,其係可運作以使該塵粒發射峰值之該測量幅度與自該最後場之該至少一收集電極之該緊接先前拍擊以來所歷時之該對應時間耦合以便形成一資料記錄,此類資料記錄包含該峰值之該幅度及自該緊接先前拍擊以來所歷時之該對應時間,及一計算裝置,其係可運作以,基於該資料記錄,更新該數學模型,該數學模型係藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度與介於該選定拍擊與其緊接先前拍 擊間之時間之間之該關係的一近似值。此具體實施例之一優點係藉由更新該數學模型(例如,藉由如此更新該數學模型),或藉由更新一偏移因數,控制系統之控制功能將自動調適本身以適於靜電集塵器之變化條件,使得控制更準確,且需要較少隨時間手動校準。According to a preferred embodiment, the control system further includes a data receiver operative to receive measurement data relating to the emission of dust particles after the last field, and identifying and determining the last field in the measurement data a dust emission peak associated with the slap of the at least one collecting electrode, a data processor operable to cause the measured amplitude of the dust particle emission peak and the tightness of the at least one collecting electrode from the last field Corresponding time coupling for the duration of the previous slap to form a data record comprising the amplitude of the peak and the corresponding time since the previous slap, and a computing device The system is operable to update the mathematical model based on the data record, wherein the mathematical model is one of the selected dust particle emission peaks caused by a selected slap and the selected slap is immediately adjacent to the previous pat An approximation of the relationship between the time of the hit. An advantage of this embodiment is that by updating the mathematical model (eg, by updating the mathematical model in this way), or by updating an offset factor, the control function of the control system will automatically adapt itself to electrostatic dust collection. The changing conditions of the device make the control more accurate and require less manual calibration over time.

依據另一較佳具體實施例,一計算裝置係可運作以接收與藉由該最後場之該等收集電極之至少一收集電極之拍擊所造成之一塵粒發射峰值之測量幅度有關的測量資料,該計算裝置係進一步經調適用以比較該塵粒發射峰值之該測量幅度與一塵粒發射峰值幅度目標值,及用於最小化該塵粒發射峰值幅度目標值與藉由該最後場之該等收集電極之該至少一收集電極之一後續拍擊所造成之一後續塵粒發射峰值之測量幅度間之差的目的,藉由該控制裝置,自動誘發選自以下群組之至少一參數之調整:該最後場中將要執行該後續拍擊之前的欲歷時之時間,及該最後場中欲執行之後續拍擊類型。此具體實施例之一優點係其提供拍擊之簡單但有效控制。該計算裝置可為PID控制器(結合比例、積分、及微分參數運作之控制器)、PI控制器(結合比例與積分參數運作之控制器)、或無模型適應性控制器,即不利用實體特性之實際模型之情況下基於(例如)神經網路力爭減小觀察值與目標值間之差的控制器。According to another preferred embodiment, a computing device is operative to receive a measurement relating to a measured amplitude of a dust emission peak caused by a slap of at least one of the collection electrodes of the collection electrodes of the last field Data, the computing device is further adapted to compare the measured amplitude of the dust particle emission peak with a dust particle emission peak amplitude target value, and to minimize the dust particle emission peak amplitude target value and by using the last field For the purpose of the difference between the measured amplitudes of one of the subsequent dust particle emission peaks caused by one of the at least one collecting electrodes of the collecting electrodes, the control device automatically induces at least one selected from the group below Adjustment of the parameter: the time of the last time before the subsequent slap will be executed in the last field, and the subsequent slap type to be executed in the last field. One advantage of this particular embodiment is that it provides simple but effective control of the slap. The computing device can be a PID controller (a controller that combines proportional, integral, and differential parameter operations), a PI controller (a controller that combines proportional and integral parameter operations), or a model-free adaptive controller, ie, does not utilize an entity The actual model of the characteristics is based on, for example, a controller that the neural network strives to reduce the difference between the observed value and the target value.

本發明之另一目的係提供一種致能藉由靜電集塵器之最後場之至少一收集電極之拍擊所造成之塵粒發射之準確預測的控制系統。Another object of the present invention is to provide a control system that enables an accurate prediction of the emission of dust particles caused by the slap of at least one collecting electrode of the last field of the electrostatic precipitator.

此目的係藉由一種用以預測來自靜電集塵器之塵粒發射的控制系統而實現,該靜電集塵器具有一最後場,該最後場係提供放電電極、收集電極、及一拍擊裝置,該拍擊裝置係經調適用以藉由拍擊該等收集電極來為其除塵,特徵為該控制系統包含一資料處理器,其係可運作以利用藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度與介於該選定拍擊與其緊接先前拍擊間之時間之間的一關係,該資料處理器係進一步可運作以,基於藉由一選定拍擊所造成之一塵粒發射峰值之一幅度與介於該選定拍擊與其緊接先前拍擊間之時間之間的該關係,預測一從以下參數中選擇之參數1)藉由一選定拍擊所造成之塵粒發射峰值之幅度,其係基於該選定拍擊與其緊接先前拍擊間之一欲歷時之時間,及2)一選定拍擊與其緊接先前拍擊間之欲歷時之時間,其係基於藉由該選定拍擊所造成之一塵粒發射峰值之一幅度。此控制系統之一優點係其提供靜電集塵器之拍擊之很容易調整。This object is achieved by a control system for predicting the emission of dust particles from an electrostatic precipitator having a final field that provides a discharge electrode, a collection electrode, and a slap device. The slap device is adapted to be dusted by slapping the collection electrodes, characterized in that the control system includes a data processor operable to utilize one selected by a selected slap A relationship between one of the peaks of the dust emission peak and a time between the selected slap and the immediately preceding slap, the data processor is further operable to be based on one of the selected slaps The relationship between one of the peaks of the dust emission peak and the time between the selected slap and the time immediately following the previous slap, predicting a parameter selected from the following parameters: 1) a dust caused by a selected slap The magnitude of the peak of the particle emission is based on the time between the selected slap and the time immediately following the previous slap, and 2) the time between the selected slap and the slap of the previous slap, based on With this choice One of the peaks of the dust emission caused by a fixed shot. One of the advantages of this control system is that it provides easy adjustment of the slap of the electrostatic precipitator.

從說明與申請專利範圍將明白本發明之其他目的及特徵。Other objects and features of the present invention will become apparent from the description and claims.

措詞"模型"在本說明中係指一現象(例如物理現象、化學程序等等)之表示。此外,措詞"數學模型"在本說明中係指一現象之數學表示。The word "model" in this description refers to a representation of a phenomenon (eg, physical phenomena, chemical procedures, etc.). Moreover, the phrase "mathematical model" in this description refers to a mathematical representation of a phenomenon.

圖1示意性解說一靜電集塵器(ESP)1。靜電集塵器1具有 一用於煙道氣4(其包含塵粒)之入口2,及一用於煙道氣8(其中的大多數塵粒已移除)之出口6。集塵器1具有一外殼9,在該外殼9中提供一第一場10、一第二場12、及一最後場14。如此項技術中(例如從美國專利第4,502,872號中,該專利係藉由此引用而併入本文中)本質上所熟知,各場10、12、14係提供放電電極與收集電極(其採用收集電極板之形式)。最後場14係提供放電電極(圖1僅描述其中之一放電電極16)及收集電極板(圖1僅描述其中之一收集電極板18)。電源20在放電電極16與收集電極板18間施加一電流。當煙道氣4穿過放電電極16時,塵粒會帶電。帶電塵粒將朝收集電極板18行進,在收集電極板18處收集塵粒。靜電集塵器1係提供一拍擊裝置22,其係經調適用以從收集電極板18移除所收集之塵粒。拍擊裝置22包含一第一組錘子,其係經調適用以拍擊收集電極板之上游端。一第一錘子24係包含於此第一組錘子中,且係經調適用以拍擊收集電極板18之上游端。拍擊裝置22亦包含一第二組錘子,其係經調適用以拍擊收集電極板之下游端。一第二錘子26係包含於該第二組錘子中,且係經調適用以拍擊收集電極板18之下游端。Figure 1 schematically illustrates an electrostatic precipitator (ESP) 1. Electrostatic precipitator 1 has An inlet 2 for the flue gas 4 (which contains dust particles) and an outlet 6 for the flue gas 8 (most of which have been removed). The dust collector 1 has a casing 9 in which a first field 10, a second field 12, and a last field 14 are provided. As is well known in the art, as is well known in the art, for example, from U.S. Patent No. 4,502,872, the disclosure of which is incorporated herein by reference in its entirety, each of the fields 10, 12, 14 provides a discharge electrode and a collecting electrode (which is collected In the form of an electrode plate). The last field 14 is provided with a discharge electrode (only one of the discharge electrodes 16 is depicted in Fig. 1) and a collector electrode plate (only one of which is shown in Fig. 1). The power source 20 applies a current between the discharge electrode 16 and the collector electrode plate 18. When the flue gas 4 passes through the discharge electrode 16, the dust particles are charged. The charged dust particles will travel toward the collector electrode plate 18 where dust particles are collected. The electrostatic precipitator 1 provides a slap device 22 that is adapted to remove the collected dust particles from the collecting electrode plate 18. The slap device 22 includes a first set of hammers that are adapted to tap the upstream end of the collector electrode plate. A first hammer 24 is included in the first set of hammers and is adapted to tap the upstream end of the collector electrode plate 18. The slap device 22 also includes a second set of hammers that are adapted to slap the downstream end of the collector electrode plate. A second hammer 26 is included in the second set of hammers and adapted to slap the downstream end of the collector electrode plate 18.

收集電極板18之除塵可以不同方式進行。可變化的一參數係電流情況,即電源20在拍擊期間是否在電極16、18間施加一電流。亦可使拍擊期間之電流減至(例如)正常電流之5%,而並非使電流一直減為零。依據其他替代執行拍擊之方式,拍擊期間可使電流增加或減小(與正常運作期 間所採用之電流相比)。若施加電流的同時收集電極板1188經受拍擊,則粒子黏著於收集電極板18之能力將高於拍擊期間不施加電流之條件下粒子黏著於收集電極板18之能力。可變化的另一參數係是否在相同場合下採用第一錘子24與第二錘子26兩者進行該拍擊,或是否僅採用錘子24、26之一來執行該拍擊。此外,使得錘子24、26拍擊收集電極板18之場合數將影響所收集塵粒中得以從收集電極板1188移除之數量。因此,存在若干不同的拍擊收集電極板18之方式。每一拍擊收集電極板18之方式將具有一關於從收集電極板18所移除之塵粒量,且亦關於分散於煙道氣中並與已除塵煙道氣8一起離開靜電集塵器1之塵粒量(下文中加以說明)的特定特性。The dust removal of the collecting electrode plates 18 can be carried out in different ways. A variable parameter is the current condition, i.e., whether the power source 20 applies a current between the electrodes 16, 18 during the slap. It is also possible to reduce the current during the slap to, for example, 5% of the normal current, rather than reducing the current to zero. According to other alternatives to the slap method, the current can be increased or decreased during the slap (with normal operation period) Compared to the current used in the room). If the collecting electrode plate 1188 is subjected to a slap while current is being applied, the ability of the particles to adhere to the collecting electrode plate 18 will be higher than the ability of the particles to adhere to the collecting electrode plate 18 under the condition that no current is applied during the slap. Another parameter that can be varied is whether the first hammer 24 and the second hammer 26 are used for the slap in the same situation, or whether the slap is performed using only one of the hammers 24, 26. Moreover, the number of occasions that cause the hammers 24, 26 to slap the collector electrode plate 18 will affect the amount of dust collected in the collected dust particles that are removed from the collector electrode plate 1188. Therefore, there are several different ways of tapping the collector electrode plate 18. The manner in which each of the slap collecting electrode plates 18 will have a quantity of dust particles removed from the collecting electrode plate 18, and also about being dispersed in the flue gas and leaving the electrostatic precipitator together with the dust-removing flue gas 8 The specific characteristics of the amount of dust particles (described below).

藉由拍擊而從收集電極板18移除的塵粒係收集於漏斗28中並運走。The dust particles removed from the collecting electrode plate 18 by the slap are collected in the funnel 28 and transported away.

圖2解說一控制系統30,其包含資料接收器32、資料處理器34、計算裝置36、及拍擊控制裝置38。為(例如)一不透明度計的塵粒濃度分析器40在連續或週期性基礎上分析已穿過最後場14之已除塵煙道氣8中之塵粒之濃度。資料接收器32從分析器40接收關於塵粒發射之資訊。在資料接收器32已從分析器40接收到之資料中,資料接收器32識別與一拍擊事件有關之塵粒發射峰值。針對每一塵粒發射峰值的關於幅度、及出現該塵粒發射峰值之時間點的資訊係轉遞至資料處理器34。資料處理器34亦接收來自拍擊控制裝置38之資訊。來自拍擊控制裝置38之資訊與執行個別拍 擊之時間點有關。基於此資訊,資料處理器34使一塵粒發射峰值(其係由一拍擊造成)之幅度與自執行一緊接先前拍擊以來已歷時的一對應時間耦合。資料處理器34接著針對每一此類峰值形成一資料記錄,下文中將對此加以說明。將該資料記錄中所包含之資訊從資料處理器34轉遞至計算裝置36。計算裝置36製備及/或更新一數學模型。該數學模型係經調適用以,基於一選定拍擊與其緊接先前拍擊間之欲歷時之時間,預測藉由該選定拍擊所造成之一選定塵粒發射峰值(例如,藉由一將來拍擊所造成之一將來塵粒發射峰值)之一幅度。將該數學模型轉遞至控制裝置38。基於該數學模型,控制裝置38決定一用於該將來拍擊之合適時間,及一合適的欲執行拍擊類型。控制裝置38接著自動且在一所需時間點將信號發送至拍擊裝置22,且在欲執行電流(其係施加於放電電極16與收集電極板18間)變化之條件下亦發送至電源20,以便執行一所需類型之拍擊。因此,藉由控制裝置38所發送之該等信號可包括關於拍擊期間應藉由電源20施加哪一電流、以及關於是否應運作及應如何運作第一馬達42(其運作第一組錘子24)、及是否應運作及應如何運作第二馬達44(其運作第二組錘子26)的資訊。每當獲得一新資料記錄時,結合下一塵粒發射峰值,可更新數學模型。因此,控制系統30提供最後場14中應執行拍擊之時間、及方式的自動控制以便獲得一所需低塵粒發射峰值。2 illustrates a control system 30 that includes a data receiver 32, a data processor 34, a computing device 36, and a slam control device 38. The dust particle concentration analyzer 40, for example an opacity meter, analyzes the concentration of dust particles in the dust-removed flue gas 8 that has passed through the last field 14 on a continuous or periodic basis. The data receiver 32 receives information about the dust emission from the analyzer 40. In the data that the data receiver 32 has received from the analyzer 40, the data receiver 32 identifies the dust emission peak associated with a slamming event. Information regarding the magnitude of each dust particle emission peak and the point in time at which the dust particle emission peak occurs is transmitted to the data processor 34. Data processor 34 also receives information from tap control device 38. Information from the slap control device 38 and execution of individual shots The time point of the hit is related. Based on this information, data processor 34 couples the amplitude of a dust emission peak (which is caused by a slap) to a corresponding time that has elapsed since the previous slap was performed. Data processor 34 then forms a data record for each such peak, as will be explained below. The information contained in the data record is forwarded from the data processor 34 to the computing device 36. Computing device 36 prepares and/or updates a mathematical model. The mathematical model is adapted to predict a selected dust particle emission peak by one of the selected slaps based on the time of a selected slap followed by the previous slap (eg, by a future One of the amplitudes of one of the dust particles emitted by the slap. The mathematical model is forwarded to the control device 38. Based on the mathematical model, control device 38 determines an appropriate time for the future slap and a suitable type of slap to perform. The control device 38 then automatically transmits the signal to the slap device 22 at a desired point in time and also to the power source 20 under conditions that the current is to be applied, which is applied between the discharge electrode 16 and the collector electrode plate 18, In order to perform a desired type of slap. Thus, the signals transmitted by control device 38 may include which current should be applied by power source 20 during a slap, and as to whether it should operate and how the first motor 42 should be operated (which operates the first set of hammers 24) ), and whether it should operate and how the second motor 44 (which operates the second set of hammers 26) should be operated. Whenever a new data record is obtained, the mathematical model can be updated in conjunction with the next dust emission peak. Thus, control system 30 provides automatic control of the time, and manner in which the slap should be performed in the final field 14 in order to obtain a desired low dust emission peak.

圖3描述藉由分析器40所提供之測量資料之一範例。Y軸 上描述不透明度信號E(不透明度計上之最大讀數之%),而X軸上描述時間T(分鐘)。已發現塵粒發射峰值(其在圖3中係以塵粒發射峰值P1及P2之形式描述)對應於最後場14之收集電極板18之拍擊。因此,一旦在最後場14中執行拍擊,塵粒發射便增加以形成塵粒發射峰值P1、P2,其持續通常約3至5分鐘。第一場10之拍擊及第二場12之拍擊通常對塵粒發射具有較低影響。此事實之原因係,第一場10中之拍擊或第二場12中之拍擊造成一來自該特定場10、12之已增加塵粒發射。不過,第一場10或第二場12之拍擊期間所發射之塵粒會藉由最後場14之收集電極板18進行有效收集。因此,拍擊第一場10或拍擊第二場12之效應常常藉由最後場14(其係位於第一場10及第二場12之下游)所吸收。不過,在最後場14中執行一拍擊時,不存在可收集拍擊期間所釋放之塵粒的下游場。FIG. 3 depicts an example of measurement data provided by analyzer 40. Y axis The opacity signal E (% of the maximum reading on the opacity meter) is described above, while the time T (minutes) is described on the X-axis. It has been found that the dust emission peaks (which are described in the form of dust emission peaks P1 and P2 in Fig. 3) correspond to the slap of the collecting electrode plate 18 of the last field 14. Therefore, once the slap is performed in the last field 14, the dust emission is increased to form the dust emission peaks P1, P2, which lasts for about 3 to 5 minutes. The first 10 slap and the second 12 slap usually have a lower impact on the dust emission. The reason for this is that the slap in the first field 10 or the slap in the second field 12 results in an increased dust emission from the particular field 10, 12. However, the dust particles emitted during the first field 10 or the second field 12 are effectively collected by the collecting electrode plate 18 of the last field 14. Thus, the effect of slap the first field 10 or slap the second field 12 is often absorbed by the last field 14, which is located downstream of the first field 10 and the second field 12. However, when a slap is performed in the last field 14, there is no downstream field that collects the dust particles released during the slap.

塵粒發射峰值P1、P2期間所發射的塵粒量對來自靜電集塵器1之塵粒發射之波動平均具有大影響。因此,拍擊期間從最後場14之收集電極板18所釋放之塵粒量係與當局所設定之塵粒發射波動平均限制值有關。視安裝靜電集塵器1所在之國家而定,該限制值可為(例如)6分鐘波動平均值或1天波動平均值。藉由圖3所描述之塵粒發射峰值P1、P2所造成之塵粒發射之該部分對來自靜電集塵器1之塵粒發射具有重大影響,尤其對於塵粒發射之短期波動平均,例如參考30分鐘及更短時間週期的波動平均。例如,取自塵粒發射峰值P1附近的一6分鐘波動平均值將引起無法滿足 當局之發射限制值的風險。The amount of dust particles emitted during the dust emission peaks P1, P2 has a large influence on the fluctuation of the dust emission from the electrostatic precipitator 1. Therefore, the amount of dust particles released from the collecting electrode plate 18 of the last field 14 during the slap is related to the average fluctuation limit of the dust emission emitted by the authority. Depending on the country in which the electrostatic precipitator 1 is installed, the limit value may be, for example, a 6 minute fluctuation average or a 1 day fluctuation average. This portion of the dust emission caused by the dust particle emission peaks P1, P2 described in Fig. 3 has a significant influence on the dust emission from the electrostatic precipitator 1, especially for the short-term fluctuation average of dust emission, for example, reference The average of fluctuations in 30 minutes and shorter time periods. For example, a 6-minute fluctuation average value taken from the dust particle emission peak P1 will cause unsatisfaction. The risk of the launch limit of the authorities.

已發現,塵粒發射峰值P1、P2之幅度M在很大程度上取決於自緊接在造成所述塵粒發射峰值P1、P2之拍擊之前的該拍擊以來已歷時之時間。圖3所描述之塵粒發射峰值P2之幅度M因此取決於自造成塵粒發射峰值P1之拍擊R'以來已歷時之時間t。因此,藉由拍擊R"所造成之塵粒發射峰值P2之幅度M取決於自緊接在拍擊R"之前之拍擊R'以來已歷時之時間t。"幅度"應理解為定義塵粒發射峰值P1、P2之大小的測量。理論上,塵粒發射峰值P2之幅度M係藉由峰值P2所覆蓋之區域。關於拍擊期間塵粒發射上升及下降所採用之方式,每一拍擊類型具有其自己的塵粒發射峰值"指紋"。藉由拍擊裝置22之機械特性、拍擊期間是否施加電流等等來決定該"指紋"。實際上,藉由塵粒發射峰值P2在一基線塵粒發射B上方延伸之高度H來近似塵粒發射峰值P2之幅度M常常足夠準確。基線塵粒發射B係附近位於峰值P1、P2間(即,最後場14中無拍擊時)之塵粒發射。It has been found that the amplitude M of the dust particle emission peaks P1, P2 is largely dependent on the time that has elapsed since the slap immediately before the slap of the dust particle emission peaks P1, P2. The amplitude M of the dust particle emission peak P2 described in Fig. 3 therefore depends on the time t elapsed since the slap R' of the dust particle emission peak P1. Therefore, the amplitude M of the dust particle emission peak P2 caused by the slap R" depends on the time t that has elapsed since the slap R' immediately before the slap R". "Amplitude" is understood to mean a measure that defines the magnitude of the dust emission peaks P1, P2. Theoretically, the amplitude M of the dust emission peak P2 is the area covered by the peak P2. Regarding the way in which the dust emission rises and falls during the slap, each slap type has its own dust emission peak "fingerprint". The "fingerprint" is determined by the mechanical characteristics of the slap device 22, whether current is applied during the slap, and the like. In fact, it is often sufficiently accurate to approximate the amplitude M of the dust emission peak P2 by the height H of the dust emission peak P2 extending above the baseline dust emission B. The dust particle emission near the B-line of the baseline dust emission is located between the peaks P1 and P2 (that is, when there is no slap in the last field 14).

圖4示意性描述藉由一拍擊所造成之一塵粒發射峰值P1、P2、P3、P4及P5之幅度H1、H2與自緊接先前拍擊以來已歷時之對應時間t1、t2之間的關係。最初執行拍擊事件使得一時間t1歷時在各拍擊事件R1、R2、R3間。拍擊事件R1、R2、R3分別造成塵粒發射峰值P1、P2、P3,該等塵粒發射峰值P1、P2、P3各具有對應於一高度H1之一幅度。不久,各拍擊事件間之欲歷時之時間係增加至時間t2。因此,拍擊事件R4及拍擊事件R5各在自緊接先前拍擊 事件以來已歷時時間t2之後加以執行。拍擊事件R4與R5分別導致塵粒發射峰值P4與塵粒發射峰值P5。塵粒發射峰值P4與P5各具有高度H2,其比塵粒發射峰值P1至P3之高度H1高得多。因此,已發現表示為塵粒發射峰值P1至P5之高度H1、H2的幅度取決於自緊接在造成所述塵粒發射峰值之該拍擊事件之前的拍擊事件以來已歷時之時間t1、t2。因此,藉由拍擊事件R4所造成之塵粒發射峰值P4之高度H2取決於自緊接先前拍擊事件R3以來已歷時之時間t2。Figure 4 is a schematic illustration of the amplitudes H1, H2 of one of the dust particle emission peaks P1, P2, P3, P4 and P5 caused by a slap and the corresponding time t1, t2 since the previous slap Relationship. The slap event is initially performed such that a time t1 spans between slap events R1, R2, R3. The slap events R1, R2, and R3 respectively cause dust particle emission peaks P1, P2, and P3, and the dust particle emission peaks P1, P2, and P3 each have an amplitude corresponding to a height H1. Soon, the time between the slaps of each slap event increased to time t2. Therefore, the slap event R4 and the slap event R5 are each self-aligned with the previous slap The event has been executed since time t2. The slap events R4 and R5 result in a dust particle emission peak P4 and a dust particle emission peak P5, respectively. The dust particle emission peaks P4 and P5 each have a height H2 which is much higher than the height H1 of the dust particle emission peaks P1 to P3. Therefore, it has been found that the magnitudes of the heights H1, H2 expressed as the dust particle emission peaks P1 to P5 depend on the time t1 that has elapsed since the slap event immediately before the slap event that caused the dust particle emission peak. T2. Therefore, the height H2 of the dust particle emission peak P4 caused by the slamming event R4 depends on the time t2 that has elapsed since the previous slamming event R3.

圖5描述一數學模型之一範例,其係基於塵粒發射峰值高度H、以及自緊接在造成所述塵粒發射峰值之該拍擊事件之前的拍擊事件以來已歷時之對應時間t的測量。已進行三個測量,其係描述在圖5中。各測量已導致一資料記錄,其包括塵粒發射峰值之高度H、及自緊接先前拍擊事件以來所歷時之時間t。此外,已添加一虛構資料記錄0,其係位於零點附近(實際上係1分鐘處之1%峰值)。藉由對於收集電極板18之連續拍擊不會出現峰值(因為在此類條件下不會收集塵粒)之事實激發虛構資料記錄0。Figure 5 depicts an example of a mathematical model based on the dust particle emission peak height H and the corresponding time t that has elapsed since the slap event immediately prior to the slap event that caused the dust particle emission peak. measuring. Three measurements have been taken, which are depicted in Figure 5. Each measurement has resulted in a data record that includes the height H of the peak of the dust emission and the time t elapsed since the previous slam event. In addition, a fictitious data record of 0 has been added, which is located near the zero point (actually 1% peak at 1 minute). The fictitious data record 0 is excited by the fact that the continuous slap of the collecting electrode plate 18 does not show a peak (because dust particles are not collected under such conditions).

已發現,藉由一選定拍擊所造成之一選定塵粒發射峰值之幅度係與自緊接在造成該選定塵粒發射峰值之該選定拍擊之前之拍擊以來已歷時之時間的對數(特定言之自然對數)成正比。因此,在峰值之高度(H)之表1之值與時間(t)之自然對數間進行一曲線擬合。所獲得之等式係:H(t)=7.2*1n(t[min])-5.6[%] (等式1.1)It has been found that the amplitude of the selected dust emission peak caused by a selected slap is the logarithm of the time elapsed since the slap immediately prior to the selected slap causing the selected dust emission peak ( The natural logarithm of a particular statement is proportional. Therefore, a curve fit is performed between the value of Table 1 of the height (H) of the peak and the natural logarithm of time (t). The obtained equation is: H(t)=7.2*1n(t[min])-5.6[%] (Equation 1.1)

等式1.1用作數學模型,其說明藉由一選定拍擊(例如,一將來拍擊)將造成之一選定塵粒發射峰值(例如,一將來塵粒發射峰值)之高度H,可基於該選定拍擊與緊接在該選定拍擊之前之拍擊間將歷時之時間t來預期該選定拍擊。Equation 1.1 is used as a mathematical model that illustrates the height H of one of the selected dust particle emission peaks (eg, a future dust particle emission peak) by a selected slap (eg, a future slap), based on The selected slap is expected to be the time t between the slap and the slap immediately prior to the selected slap to anticipate the selected slap.

基於此數學模型以及合適條件(例如最大許可塵粒發射峰值高度),控制裝置38可決定何時係執行一拍擊之時間。若(例如)環境規則係使得塵粒發射峰值必須不超過50%之高度H(因為此時6分鐘波動平均值之限制係處於被超過之風險中),則可針對t求解等式1.1:t=e(H[%]+5.6)/7.2 [分鐘] (等式2.1)Based on this mathematical model and suitable conditions (e.g., maximum allowable dust emission peak height), control device 38 can determine when to perform a slap time. If, for example, the environmental rule is such that the dust emission peak must not exceed 50% of the height H (because the limit of the 6-minute fluctuation average is at risk of being exceeded), then Equation 1.1 can be solved for t: =e (H[%]+5.6)/7.2 [minutes] (Equation 2.1)

藉由將H=50%引入等式2.1中,可計算以下時間t:t=e(50[%]+5.6)/7.2 [分鐘]=2350[分鐘] (等式2.2)By introducing H = 50% into Equation 2.1, the following time t can be calculated: t = e (50 [%] + 5.6) / 7.2 [minutes] = 2350 [minutes] (Equation 2.2)

自緊接先前拍擊以來已歷時一2350分鐘之時間t(其已藉由數學模型而決定)時,控制裝置38可指示拍擊裝置22執行一拍擊。The control device 38 may instruct the slap device 22 to perform a slap when the time t1 (which has been determined by the mathematical model) has elapsed since the previous slap.

自然對數函數係適於藉由一具有以下形式之表達式來模擬藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度H與介於該選定拍擊與其緊接先前拍擊間之時間t之間的該 關係之事實幅度H與1n(時間t)成正比The natural logarithmic function is adapted to simulate an amplitude H of one of the selected dust emission peaks caused by a selected slap by an expression having the following form and between the selected slap and the previous slap Between time t The factal magnitude H of the relationship is proportional to 1n (time t)

係藉由以下實體背景而激發:自緊接先前拍擊以來之時間t越長,累積於收集電極板18上之塵粒就越多。累積於收集電極板18上之塵粒越多,拍擊期間將釋放之塵粒就越多。不過,隨著自緊接先前拍擊以來之時間增加,塵粒將在位於收集電極板18上的同時經受已增加黏聚。該黏聚在一定程度上抵消塵粒發射峰值之幅度之增加。總效應係自緊接先前拍擊以來所歷時之較長時間t將導致塵粒發射峰值之幅度增加,但該增加將小於藉由一線性函數所說明的由於塵粒在收集電極板上之黏聚而引起之增加。作為自然對數函數之替代,亦可(儘管有時欠佳)利用其他對數函數、及對數函數之近似值。藉由對數函數之近似值意指(例如)與對數函數類似之數學函數、三角函數、分段線性曲線擬合等等。It is excited by the following physical background: the longer the time t since the previous slap, the more dust particles accumulated on the collecting electrode plate 18. The more dust particles accumulated on the collecting electrode plate 18, the more dust particles will be released during the slap. However, as the time since the previous slap is increased, the dust particles will experience increased cohesion while being on the collecting electrode plate 18. This cohesion offsets the increase in the amplitude of the dust emission peak to some extent. The total effect of the longer time t since the previous slap will result in an increase in the amplitude of the dust emission peak, but the increase will be less than the viscosity of the dust particles on the collecting electrode plate as illustrated by a linear function The increase caused by the gathering. As an alternative to the natural logarithmic function, it is also possible (although sometimes poor) to take advantage of other logarithmic functions and approximations of logarithmic functions. An approximation by a logarithmic function means, for example, a mathematical function similar to a logarithmic function, a trigonometric function, a piecewise linear curve fitting, and the like.

圖6a解說如何基於一自緊接先前拍擊事件R1以來已歷時之給定時間t由等式1.1預測一將來拍擊事件RF所造成之一將來塵粒發射峰值PF之高度HF的一範例。Figure 6a illustrates an example of how to predict the height HF of one of the future dust particle emission peaks PF caused by a future slap event RF from a given time t that has elapsed since the previous slam event R1.

圖6b解說如何基於一將來塵粒發射峰值PF之一給定高度H由等式2.1預測將要執行一將來拍擊事件RF之前自一拍擊事件R1欲歷時之時間tF的一範例。Figure 6b illustrates an example of how to predict a time tF from a slam event R1 before a future slap event RF is predicted based on a given height H of a future dust emission peak PF.

依據等式1.1之數學模型係僅基於三個資料記錄加上一虛構資料記錄。亦可僅由一或兩個資料記錄加上該虛構資料記錄來獲得一數學模型。基於此等若干資料記錄之數學 模型可視為一"開始模型"。不過,靜電集塵器1中之條件變化,因此,若不更新該數學模型,則該數學模型可能變得不適於拍擊之控制。為了考量變化條件(例如所燃燒之燃料的不同類型等等),且亦用於當運作條件穩定時改善數學模型之準確度的目的,較佳在測量新資料記錄時以新資料記錄更新數學模型。The mathematical model according to Equation 1.1 is based on only three data records plus a fictitious data record. A mathematical model can also be obtained from only one or two data records plus the fictitious data record. Mathematics based on these data records The model can be thought of as a "starting model." However, the conditions in the electrostatic precipitator 1 vary, and therefore, if the mathematical model is not updated, the mathematical model may become unsuitable for the control of the slap. In order to consider changing conditions (such as different types of fuels burned, etc.), and also for the purpose of improving the accuracy of the mathematical model when the operating conditions are stable, it is preferable to update the mathematical model with new data records when measuring new data records. .

圖7係一流程圖,其描述控制系統30工作所依據之方法。在步驟A中,測量最後場14之後之塵粒發射。識別一峰值PN ,其係與最後場14之拍擊事件RN 有關。忽略與灰塵分析器之校準等等有關的任何"峰值"。Figure 7 is a flow diagram depicting the method by which control system 30 operates. In step A, the dust particle emission after the last field 14 is measured. A peak P N is identified which is related to the slap event R N of the last field 14. Any "peaks" related to the calibration of the dust analyzer, etc., are ignored.

在步驟B中,將峰值PN 之高度HN 耦合至自最後場14之緊接先前拍擊事件(即,拍擊事件RN-1 )以來已歷時之時間tN 。時間tN 說明執行拍擊事件RN 時最後場14之收集電極板18已為收集塵粒而在拍擊事件RN-1 之後運作多長時間。時間tN 與對應高度HN 形成一資料記錄。In step B, the height H N of the peak P N is coupled to the time t N that has elapsed since the last field 14 immediately following the previous slam event (ie, the slap event R N-1 ). DESCRIPTION final time t N farm collector 14 of the electrode plate 18 to collect the dust particles have been launched after the event slap R N-1 event execution slap R N long. The time t N forms a data record with the corresponding height H N .

在步驟C中,為資料記錄適配一數學模型。若第一次執行步驟C,則為自靜電集塵器1之運作之啟動以來所獲得之一、兩或更多資料記錄適配一數學模型。若,另一方面,已經存在一可用數學模型,則以包含tN 與HN 之新資料記錄更新該數學模型。In step C, a mathematical model is adapted for the data record. If step C is performed for the first time, one, two or more data records obtained from the start of the operation of the electrostatic precipitator 1 are adapted to a mathematical model. If, on the other hand, an available mathematical model already exists, the mathematical model is updated with a new data record containing t N and H N .

在步驟D中,基於該數學模型控制將要執行下一拍擊事件RN+1 之前欲歷時之時間tN+1 。通常針對該控制使用某一種類的條件。此一條件之一範例係,塵粒發射峰值之高度H必須不超過某一值Hmax。高度HN+1 係設定為Hmax,並 將其引入數學模型中。接著,如上文參考圖5及等式2.1所說明,計算時間tN+1In step D, based on the mathematical model, the time tN +1 to be elapsed before the next slap event RN +1 is to be executed is controlled. A certain kind of condition is usually used for this control. An example of this condition is that the height H of the peak of the dust emission must not exceed a certain value Hmax. The height H N+1 is set to Hmax and is introduced into the mathematical model. Next, as explained above with reference to FIG. 5 and Equation 2.1, the time t N+1 is calculated.

序列A、B、C、及D具有一迴路,使得步驟D結束時,將N設定為N+1,並開始步驟A,其係描述在圖7中。以此方式,每當已執行一拍擊事件時,便獲得一新資料記錄,其包含最近塵粒發射峰值之測量高度HN 及對應時間tN 。新資料記錄可用以更新數學模型,以便使得數學模型更佳於預測與時間t成函數關係之塵粒發射峰值高度H。由於該迴路,因此可連續更新該數學模型,使得該數學模型更佳於預測塵粒發射峰值高度。Sequences A, B, C, and D have a loop such that at the end of step D, N is set to N+1 and step A begins, which is depicted in FIG. In this way, whenever a slap event has been performed, a new data record is obtained which contains the measured height H N of the most recent dust emission peak and the corresponding time t N . New data records can be used to update the mathematical model to make the mathematical model better predict the peak height H of the dust emission as a function of time t. Due to the loop, the mathematical model can be continuously updated, making the mathematical model better predicting the peak height of the dust emission.

應明白,靜電集塵器1運作所處之條件在運作期間可能會經受變化。此類變化包括:收集電極板18上所收集之塵粒之特性之變化、煙道氣4之特性之變化、靜電集塵器1內部之實體變化等等。鑑於此等可能變化,當步驟C中更新數學模型時適合使用一資料過濾器。可(例如)以更新數學模型時賦予新資料記錄一較高權重(與舊資料記錄相比)的此一方式設定該資料過濾器。一非常簡單的獲得資料過濾器功能之方法係執行曲線擬合(其形成數學模型之基礎)時兩次包括新資料記錄。執行該曲線擬合之前可丟棄最舊的資料記錄。表2解說如何在丟棄最舊資料記錄(資料記錄I)的同時兩次(作為IV'與IV")包括新資料記錄IV的一範例(與表1所描述情況相比較)。接著在表2之值上執行曲線擬合。It should be understood that the conditions under which the electrostatic precipitator 1 operates may undergo changes during operation. Such variations include changes in the characteristics of the collected dust particles on the electrode plate 18, changes in the characteristics of the flue gas 4, physical changes in the interior of the electrostatic precipitator 1, and the like. In view of such possible changes, a data filter is suitable when updating the mathematical model in step C. The data filter can be set, for example, in such a manner that a new data record is given a higher weight (compared to the old data record) when the mathematical model is updated. A very simple method of obtaining the data filter function involves performing a curve fit (which forms the basis of the mathematical model) twice to include a new data record. The oldest data record can be discarded before the curve fit is performed. Table 2 illustrates how to include an example of a new data record IV (as compared to the situation described in Table 1) twice (as IV' and IV") while discarding the oldest data record (data record I). Then in Table 2 Perform a curve fit on the value.

基於表2之值,可執行一新曲線擬合,且可獲得以下已更新數學模型:H(t)=6.9*1n(t)-2.2 (等式1.2)Based on the values in Table 2, a new curve fit can be performed and the following updated mathematical model can be obtained: H(t)=6.9*1n(t)-2.2 (Equation 1.2)

當另一資料記錄V係可用時,將該資料記錄兩次用作V’與V",同時僅採用資料記錄IV一次,並在執行曲線擬合等等之前丟棄資料記錄II。雖然表2解說一非常簡單的過濾資料記錄之方法,使得賦予新資料記錄對已更新數學模型之較大影響(與舊資料記錄相比),但應明白,可使用許多不同類型的本質上熟知的資料過濾器。熟習此項技術者藉由常規實驗可發現針對某一靜電集塵器1提供適於新運作條件之快速更新的資料過濾器之設定。應明白,可利用許多替代資料過濾器。較佳地,進行一品質評估以便賦予可靠資料記錄對數學模型更新之較高影響(與較不可靠資料相比)。該品質評估可(例如)賦予已偵測程序擾亂期間已獲得之資料記錄一較低權重。When another data record V system is available, record the data twice for V' and V", and only use the data record IV once, and discard the data record II before performing curve fitting, etc. Although the table 2 commentary A very simple method of filtering data records, giving new data records a greater impact on updated mathematical models (compared to old data records), but it should be understood that many different types of data filters that are well known in nature can be used. Those skilled in the art will be able to find a setting of a data filter for a certain electrostatic precipitator 1 that is suitable for rapid updating of new operating conditions by routine experimentation. It will be appreciated that many alternative data filters may be utilized. Conducting a quality assessment to give a high impact of the reliable data record on the mathematical model update (compared to less reliable data). This quality assessment can, for example, give a lower score of the data obtained during the disturbance of the detected procedure. Weights.

上面已說明每當一新資料記錄變為可用時如何更新數學 模型。依據一替代具體實施例,為數學模型添加偏項以允許連續運作期間自動調整所利用的藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度與介於該選定拍擊與其緊接先前拍擊間之一時間之間的關係。基於各新資料記錄更新該偏項,而非如此更新數學模型之核心。因此,經由該偏項更新數學模型,且藉此在不改變基本關係之情況下對其加以調整以適於實際運作條件。該偏項使數學模型在一系列曲線間移動,但並不如此重新定義曲線之形狀。可藉由利用以下形式之等式來實施該控制:Hpredicted (t)=1n(t)+biasN (等式3.1)How to update the mathematical model whenever a new data record becomes available is explained above. According to an alternative embodiment, a bias term is added to the mathematical model to allow automatic adjustment during continuous operation to utilize one of the selected dust blast peaks caused by a selected slap and the amplitude of the selected slap is tight The relationship between one of the previous slaps. Update the partial term based on each new data record instead of updating the core of the mathematical model. Therefore, the mathematical model is updated via the bias term, and thereby it is adjusted to suit the actual operating conditions without changing the basic relationship. This partial term moves the mathematical model between a series of curves, but does not redefine the shape of the curve. This control can be implemented by using an equation of the form: H predicted (t) = 1n(t) + bias N (Equation 3.1)

藉由一調整項(其係作為一塵粒發射峰值之測量與預測幅度間之差加以計算)來更新該偏項:biasadjust =Hmeasured (t)-Hpredicted (t) (等式3.2)The partial term is updated by an adjustment term (which is calculated as the difference between the measured and predicted amplitude of the dust emission peak): bias adjust =H measured (t)-H predicted (t) (Equation 3.2)

現在可藉由以下等式來更新該偏項:biasN+1 =biasN +biasadjust (等式3.3)This partial term can now be updated by the following equation: bias N+1 =bias N +bias adjust (Equation 3.3)

在實際運作中,如上所說明藉由利用偏項的拍擊裝置22之控制可在一控制區塊(其採用上述數學模型之微分)中加以實施。在該控制區塊中,使用擬合曲線之斜率作為開始偏移。由等式1.1可導出7.2之斜率,且可將其用作開始偏移。控制區塊將執行以下運作:首先,基於選定峰值及緊接先前峰值,針對塵粒發射峰值高度H及已歷時時間t計算差△:△H=HN -HN-1 (等式3.4) △t=tN -tN-1 (等式3.5)In actual operation, the control by the slap device 22 using the partial term as described above can be implemented in a control block (which employs the differentiation of the mathematical model described above). In this control block, the slope of the fitted curve is used as the starting offset. The slope of 7.2 can be derived from Equation 1.1 and can be used as the starting offset. The control block will perform the following operations: First, based on the selected peak and immediately before the peak, the difference Δ is calculated for the peak height H of the dust emission and the elapsed time t: ΔH = H N - H N-1 (Equation 3.4) Δt=t N -t N-1 (Equation 3.5)

接著計算所需峰值高度變化,以便達到所需峰值高度Hdesired :△Hrequired =Hdesired -HN (等式3.6)The desired peak height variation is then calculated to achieve the desired peak height H desired : ΔH required =H desired -H N (Equation 3.6)

之後,若△t不為零,則計算biasnew :biasnew =△H/△t (等式3.7)Then, if Δt is not zero, calculate bias new :bias new =△H/Δt (Equation 3.7)

現在可更新偏移:biasN+1 =biasN * biasfilter+biasnew *(1-biasfilter) (等式3.8)The offset can now be updated: bias N+1 =bias N *biasfilter+biasnew *(1-biasfilter) (Equation 3.8)

接著可計算已歷時時間之所需變化:△trequired =△Hrequired /biasN+1 (等式3.9)The desired change in the elapsed time can then be calculated: Δt required = ΔH required /bias N+1 (Equation 3.9)

接著可從數學模型將下一已排程拍擊事件之時間點tN+1 計算為:tN+1 =tN +e(△trequired ) (等式3.10)The time point t N+1 of the next scheduled slap event can then be calculated from the mathematical model as: t N+1 =t N +e(Δt required ) (Equation 3.10)

最後,N=N+1,且再次以新資料記錄開始該程序。Finally, N=N+1, and the program is started again with the new data record.

biasfilter係一因數,視適於變化條件之較佳快速調適之快速程度,通常將該因數設定為一在0.2至0.8之範圍內之值。該biasfilter因數考量測量誤差、測量值之意外失常等等。The biasfilter is a factor that is preferably adapted to a rapid degree of rapid adaptation to varying conditions, typically set to a value in the range of 0.2 to 0.8. The biasfilter factor takes into account measurement errors, accidental aberrations of measured values, and the like.

圖8解說不同類型之拍擊的效應。上文已說明,可以不同方式執行拍擊。例如,可藉由同時運作第一錘子24與第二錘子26,或藉由僅運作錘子24、26之一來執行拍擊。在圖8中,RA表示僅採用第一錘子24之拍擊。各拍擊RA導致一具有高度H1之塵粒發射峰值P1、P2及P3。不過,僅採用錘子24之拍擊可能導致未對收集電極板18進行充分除塵。因此,採用某些間隔執行運作兩錘子24、26之拍擊 RB。當執行第一RB類型之拍擊時,該拍擊RB導致一非常高的塵粒發射峰值P4(其具有高度H4),其係由於RA類型之拍擊期間已累積於收集電極板18上之某些塵粒得以釋放的事實。當執行一第二RB類型之拍擊時,在其上無累積灰塵之收集電極板18上執行該拍擊,因此塵粒發射峰值P5之高度H5係低於塵粒發射峰值P4之高度H4。從圖8中會明白,各拍擊間所歷時之時間係恆定的,為時間t1。藉由採用RA拍擊類型之拍擊所獲得之峰值P1、P2、P3與藉由採用RB拍擊類型之拍擊所獲得之峰值P4、P5不同。此外,一RA拍擊類型之拍擊之後直接執行一RB拍擊類型之拍擊時所獲得之塵粒發射峰值P4係比另一RB拍擊類型之拍擊之後直接執行一RB拍擊類型之拍擊時所獲得之塵粒發射峰值P5高。為了考量此特性,較佳針對各拍擊類型採用一特定數學模型,使得可針對各拍擊類型準確預測塵粒發射峰值高度。因此,藉由圖8所描述之範例,可較佳地針對RA拍擊類型之各拍擊採用一數學模型,並針對RB拍擊類型之各拍擊採用另一數學模型。若一靜電集塵器1係經設計用以採用一個以上類型之拍擊(例如,來自收集電極板18之兩側之拍擊及僅來自收集電極板18之一側之拍擊),則較佳地,該方法及該控制系統30係經調適用以相對於欲執行拍擊類型選擇適當數學模型,及在計算執行下一該特定類型之拍擊之前的欲歷時時間時應用該數學模型。各資料記錄(其包含關於塵粒發射峰值高度H及已歷時時間t之資訊)可額外提供一第一標籤R,其指示所執行之拍擊係何 種類型。採用此第一標籤R以便確保更新相關數學模型,即對應於該特定拍擊類型之數學模型。因此,一說明塵粒發射峰值P4之資料記錄較佳包含高度H4、時間t1、及作為第一標籤之拍擊類型RB。此資料記錄係用以更新對應於RB拍擊類型之該數學模型。Figure 8 illustrates the effects of different types of slaps. As explained above, the slap can be performed in different ways. For example, the slap can be performed by simultaneously operating the first hammer 24 and the second hammer 26, or by operating only one of the hammers 24, 26. In Fig. 8, RA indicates that only the first hammer 24 is used for the slap. Each slap RA causes a dust particle emission peaks P1, P2, and P3 having a height H1. However, the slap only with the hammer 24 may result in insufficient dust removal of the collecting electrode plate 18. Therefore, using some intervals to perform the operation of two hammers 24, 26 RB. When the first RB type slap is performed, the slap RB results in a very high dust emission peak P4 (having a height H4) which has accumulated on the collecting electrode plate 18 during the RA type slap. The fact that some dust particles are released. When a second RB type slap is performed, the slap is performed on the collecting electrode plate 18 on which no dust is accumulated, so that the height H5 of the dust particle emission peak P5 is lower than the height H4 of the dust particle emission peak P4. As will be understood from Fig. 8, the time elapsed between the slaps is constant, which is time t1. The peaks P1, P2, P3 obtained by the slap of the RA slap type are different from the peaks P4, P5 obtained by the slap of the RB slap type. In addition, the dust particle emission peak P4 obtained when directly performing an RB slap type slap after a RA slap type slap is directly performed after an RB slap type type after another RB slap type slap. The dust particle emission peak P5 obtained when slamming is high. In order to consider this characteristic, it is preferable to adopt a specific mathematical model for each type of slap, so that the peak height of the dust emission can be accurately predicted for each slap type. Thus, with the example depicted in FIG. 8, a mathematical model can be preferably employed for each slap of the RA slap type, and another mathematical model is employed for each slap of the RB slap type. If an electrostatic precipitator 1 is designed to employ more than one type of slap (eg, slap from both sides of the collector electrode plate 18 and slap from only one side of the collector electrode plate 18), then Preferably, the method and control system 30 are adapted to select an appropriate mathematical model relative to the type of slap to be performed, and to apply the mathematical model when calculating the desired elapsed time before the next slap of the particular type is performed. Each data record (which contains information about the peak height H of the dust emission and the time t that has elapsed) may additionally provide a first label R indicating which slap is performed. Types. This first label R is employed to ensure that the relevant mathematical model is updated, ie a mathematical model corresponding to the particular type of slap. Therefore, a data record indicating the dust emission peak value P4 preferably includes a height H4, a time t1, and a tap type RB as the first label. This data record is used to update the mathematical model corresponding to the RB slap type.

此外,較佳亦調整各數學模型以考量拍擊歷史,即已在所述拍擊之前的拍擊類型。較佳以該數學模型考量以下事實的此一方式進行此一調整:藉由一RA拍擊類型之拍擊在導致塵粒發射峰值P4之第一RB拍擊類型之拍擊之前,而藉由一RB拍擊類型之拍擊在導致塵粒發射峰值P5之第二RB拍擊類型之拍擊之前。為了使得可以考量歷史資訊,各資料記錄較佳提供一第二標籤。第二標籤指示在緊接先前拍擊事件下,或視需要在數個先前拍擊事件下,執行何種類型的拍擊。有數個不同的可考量關於拍擊類型之歷史資訊的方法。一方法係針對一欲執行拍擊類型與該欲執行拍擊之前已執行的一拍擊類型之各組合採用一特定數學模型。在此一情況下,參考圖8,在之前為一RA拍擊類型之拍擊時將針對一RB拍擊類型之拍擊利用一數學模型,且在之前為另一RB拍擊類型之拍擊時將針對一RB拍擊類型之拍擊利用另一數學模型。Moreover, it is preferred to also adjust each mathematical model to account for the slap history, i.e., the type of slap that has been taken before the slap. Preferably, the adjustment is made in such a manner that the mathematical model considers the fact that the slap of an RA slap type is preceded by the slap of the first RB slap type that causes the dust particle emission peak P4. An RB slap type slap is before the slap of the second RB slap type that causes the dust particle emission peak P5. In order to make it possible to consider historical information, each data record preferably provides a second label. The second tag indicates what type of slap is performed immediately following a previous slap event, or as needed, under a number of previous slamming events. There are several different ways to consider historical information about the type of slap. One method employs a particular mathematical model for each combination of a type of slap to be performed and a type of slap that has been performed prior to the slap. In this case, referring to FIG. 8, when a slap of a RA slap type is used, a slap for one RB slap type will be utilized for a slap, and before the slap of another RB slap type Another mathematical model will be utilized for the slap of an RB slap type.

亦可使用某一種類的補償因數,其考量先前拍擊中所執行之拍擊類型。例如,藉由對應於一RB拍擊類型之數學模型所計算之塵粒發射峰值高度在先前拍擊事件為一RA拍擊類型之拍擊的情況下可增加(例如)5%,且在先前拍擊 為一RB拍擊類型之拍擊的情況下可減少(例如)5%。因此,一說明塵粒發射峰值P4之資料記錄將較佳包含塵粒發射峰值高度H4、已歷時時間t1、作為第一標籤的RB拍擊類型之拍擊、及作為第二標籤的一RA拍擊類型之拍擊在造成峰值P4之該拍擊之前之事實。此資料記錄係用以更新對應於一RB拍擊類型之拍擊之數學模型,及補償一RA拍擊類型之拍擊在該RB拍擊類型之拍擊之前的事實。A certain type of compensation factor can also be used, which takes into account the type of slap performed in the previous slap. For example, the dust particle emission peak height calculated by a mathematical model corresponding to an RB slap type may be increased by, for example, 5% if the previous slap event is a RA slap type slap, and previously slap In the case of a slap of an RB slap type, it is reduced by, for example, 5%. Therefore, a data record indicating the dust emission peak value P4 will preferably include the dust particle emission peak height H4, the elapsed time t1, the slap type of the RB slap type as the first label, and a RA shot as the second label. The fact that the slap of the hit type precedes the slap that caused the peak P4. This data record is used to update the mathematical model of the slap corresponding to an RB slap type, and to compensate for the fact that a RA slap type slap is before the slap of the RB slap type.

可依據所述國家中在使用之發射標準來設定控制裝置38控制拍擊所處之條件。最後場14之後之塵粒之發射限制可(例如)為10 mg/Nm3 乾氣(其係作為6分鐘波動平均,或作為一天波動平均)。因此,通常存在一預設波動平均限制值,需要相對於該預設波動平均限制值來控制拍擊。例如,採用一不透明度計時的實際波動平均值可計算為: The control device 38 can be set to control the conditions under which the slap is based in accordance with the emission criteria used in the country. The emission limit of the dust particles after the last field 14 can be, for example, 10 mg/Nm 3 dry gas (which is a 6-minute fluctuation average, or as a one-day fluctuation average). Therefore, there is usually a preset fluctuation average limit value, and it is necessary to control the tap with respect to the preset fluctuation average limit value. For example, the actual fluctuation average using an opacity timer can be calculated as:

其中n係波動平均週期期間(例如,6分鐘期間,或一天期間)之取樣點數。基於已測量基線塵粒發射(即,兩個拍擊事件間之塵粒發射)之知識,在藉由一拍擊所造成之一塵粒發射峰值將在6分鐘或一天之週期期間出現的條件下,可以模擬將產生哪一波動平均。基於此模擬,可決定最大許可塵粒發射峰值幅度,例如最大塵粒發射峰值高度。將此類最大塵粒發射峰值高度作為一輸入輸入至控制裝置38,以便控制裝置38可基於數學模型以避免超過最大塵粒發射峰值高度之塵粒發射峰值的此一方式控制靜電集 塵器1之最後場14之拍擊。因此,意指控制裝置38藉由控制一拍擊與一將來拍擊間之欲歷時之時間、及/或應執行之拍擊類型來控制拍擊。Where n is the number of sampling points during the fluctuation averaging period (for example, during a 6 minute period, or during a day). Based on knowledge of measured baseline dust emission (ie, dust emission between two slamming events), one of the dust emission peaks caused by a slap will occur during a 6 minute or one day period Next, you can simulate which volatility average will be generated. Based on this simulation, the maximum allowable dust emission peak amplitude, such as the maximum dust emission peak height, can be determined. Such a maximum dust particle emission peak height is input as an input to the control device 38 so that the control device 38 can control the static electricity set based on the mathematical model to avoid the dust particle emission peak exceeding the maximum dust particle emission peak height. The last field 14 of the duster 1 is tapped. Thus, it is meant that the control device 38 controls the slap by controlling the time between the slap and a future slap, and/or the type of slap to be performed.

圖9解說依據一替代具體實施例的一靜電集塵器101。靜電集塵器101之設計係類似於上文已說明之靜電集塵器1之設計。控制系統130包含一計算裝置136、及一拍擊控制裝置138(其係可運作以起始靜電集塵器101之最後場114中之拍擊)。拍擊控制裝置138控制拍擊期間最後場114之電流情況,即電源120是否在電極(圖9未顯示)間施加一電流。此外,拍擊控制裝置138亦控制一拍擊裝置122進而控制是否應運作及應如何運作第一馬達142(其運作第一組錘子(圖9未顯示))、及是否應運作及應如何運作第二馬達144(其運作第二組錘子(圖9未顯示))。Figure 9 illustrates an electrostatic precipitator 101 in accordance with an alternate embodiment. The design of the electrostatic precipitator 101 is similar to the design of the electrostatic precipitator 1 described above. Control system 130 includes a computing device 136 and a slam control device 138 (which is operable to initiate a slap in the last field 114 of electrostatic precipitator 101). The slap control device 138 controls the current condition of the last field 114 during the slap, i.e., whether the power source 120 applies a current between the electrodes (not shown in Figure 9). In addition, the slamming control device 138 also controls a slamming device 122 to control whether it should operate and how the first motor 142 (which operates the first group of hammers (not shown in FIG. 9)), and whether it should operate and how it should operate. A second motor 144 (which operates a second set of hammers (not shown in Figure 9)).

計算裝置具有PID控制器136之形式且係可運作以決定拍擊控制裝置138何時應起始最後場114中之拍擊。PID控制器136從塵粒濃度分析器140接收資訊。可(例如)為一不透明度計的塵粒濃度分析器140在連續或週期性基礎上分析已穿過最後場114之已除塵煙道氣8中之塵粒之濃度。關於已測量不透明度(即,藉由最後場114中之一拍擊所造成之一塵粒發射峰值之測量幅度)的資訊係從塵粒濃度分析器140發送至PID控制器136(其比較該測量幅度與一塵粒發射峰值幅度目標值)。PID控制器136必要時相應地調整指示拍擊控制裝置138執行最後場114之收集電極板之另一拍擊之前的欲歷時之時間。因此PID控制器136用於自動追蹤該已歷時時 間t之目的(其將導致一儘可能接近塵粒發射峰值幅度目標值的塵粒發射峰值之幅度),利用藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度與介於該選定拍擊與其緊接先前拍擊間之一時間之間存在一關係的事實。因此,PID控制器136提供何時應執行拍擊之自動控制以便獲得一所需塵粒發射峰值之幅度。應明白,該PID控制器136利用藉由一選定拍擊所造成之一選定塵粒發射峰值之幅度與介於該選定拍擊與其緊接先前拍擊間之一時間(t)之間存在一關係的事實,而不利用表示該關係之實際數學模型。因此,該PID控制器可以說成係依據一無模型演算法運作。替代控制器類型(包括PI控制器、及無模型適應性控制器)亦可用以控制最後場之拍擊,且亦依據一無模型演算法運作。更高級控制器可具有與控制執行拍擊之前之時間組合、或代替控制執行拍擊之前之時間,控制拍擊控制裝置138應執行哪一類型之拍擊的其他功能。The computing device is in the form of a PID controller 136 and is operable to determine when the slam control device 138 should initiate a slap in the last field 114. The PID controller 136 receives information from the dust concentration analyzer 140. The dust particle concentration analyzer 140, which may be, for example, an opacity meter, analyzes the concentration of dust particles in the dust-removed flue gas 8 that has passed through the last field 114 on a continuous or periodic basis. Information about the measured opacity (i.e., the measured amplitude of one of the dust emission peaks caused by one of the last fields 114) is sent from the dust concentration analyzer 140 to the PID controller 136 (which compares The measured amplitude is the target value of the peak emission amplitude of a dust particle. The PID controller 136 adjusts, as necessary, the time elapsed prior to indicating that the slap control device 138 performs another slap of the collector electrode plate of the last field 114. Therefore, the PID controller 136 is used to automatically track the elapsed time. The purpose of t (which will result in a peak of the dust emission peak as close as possible to the target value of the peak amplitude of the dust emission), using one of the peaks of the selected dust emission caused by a selected slap The fact that there is a relationship between the selected slap and the time immediately following the previous slap. Thus, the PID controller 136 provides when the automatic control of the slap should be performed in order to obtain the magnitude of a desired dust emission peak. It should be understood that the PID controller 136 utilizes a range of selected dust particle emission peaks caused by a selected slap and a time (t) between the selected slap and the immediately preceding slap. The fact of the relationship, without using the actual mathematical model that represents the relationship. Therefore, the PID controller can be said to operate according to a modelless algorithm. Alternative controller types (including PI controllers and model-free adaptive controllers) can also be used to control the final field slap and also operate according to a no-model algorithm. The more advanced controller may have other functions that control which type of slap the slap control device 138 should perform in combination with the time prior to controlling the execution of the slap, or the time prior to the execution of the slap in place of the control.

應明白,在所附申請專利範圍之範疇內可以有上面說明之具體實施例之許多變化。It will be appreciated that many variations of the specific embodiments described above are possible within the scope of the appended claims.

例如,上面已說明控制系統30可利用數學模型來決定自緊接先前拍擊以來已歷時某一時間之後的預期峰值高度,或決定為了獲得某一高度之塵粒發射峰值欲歷時之時間。應明白,亦可採用其他控制策略。例如,可以調適控制裝置38以進行迭代計算而獲得一欲歷時之時間與欲採用拍擊類型之序列,該序列提供低塵粒發射。該序列可作為範例類似於圖8所描述之序列。For example, it has been explained above that the control system 30 can utilize a mathematical model to determine the expected peak height after a certain time since the previous slap, or to determine the time to obtain a peak of the dust emission for a certain height. It should be understood that other control strategies may also be employed. For example, control device 38 can be adapted to perform an iterative calculation to obtain a sequence of desired durations and a sequence of slap types that are desired to provide low dust emission. This sequence can be used as an example similar to the sequence depicted in FIG.

上文已說明,藉由錘子24、26執行拍擊。亦可採用其他類型之拍擊器,例如採用所謂磁脈衝重力撞擊拍擊器(亦稱為MIGI拍擊器),來執行拍擊。另一可能性係僅採用一組錘子,例如僅採用錘子24,藉此僅拍擊收集電極板18之一側。As explained above, the slap is performed by the hammers 24, 26. Other types of slaps can also be used, such as a so-called magnetic pulsed gravity impact slapper (also known as a MIGI slapper) to perform a slap. Another possibility is to use only one set of hammers, for example only the hammer 24, whereby only one side of the collecting electrode plate 18 is tapped.

上文已說明,數學模型採用一關係,在該關係中塵粒發射峰值之高度係與自緊接先前拍擊以來所歷時之時間之對數(特定言之自然對數)成正比。應明白可採用其他數學模型類型。例如,在某些情況下為資料記錄適配一線性模型、或一指數模型可能會足夠準確,尤其在資料記錄與相關運作範圍關於自緊接先前拍擊以來所歷時之時間係指一相當窄範圍的條件下。As explained above, the mathematical model employs a relationship in which the height of the peak of the dust emission is proportional to the logarithm of the time (in particular, the natural logarithm) of the time since the previous slap. It should be understood that other mathematical model types may be employed. For example, in some cases it may be sufficiently accurate to adapt a linear model, or an exponential model, to the data record, especially when the data record and the relevant operational scope are relatively narrow since the time immediately following the previous slap. Under the conditions of the range.

上文已說明,塵粒發射峰值之高度H常常係塵粒發射峰值之幅度的良好近似值。作為峰值高度H之替代,亦可藉由其他數量(例如塵粒發射峰值之面積等等)來表示塵粒發射峰值之幅度。As explained above, the height H of the peak of the dust emission is often a good approximation of the magnitude of the peak of the dust emission. As an alternative to the peak height H, the magnitude of the dust emission peak can also be represented by other quantities (e.g., the area of the dust emission peak, etc.).

上文已說明,較佳採用一獨立數學模型來預測各拍擊類型之峰值高度。應明白,若發現某些拍擊類型之峰值高度係類似的,則此等拍擊類型可使用相同數學模型。例如,若發現僅採用第一組錘子24之拍擊提供與僅採用第二組錘子26之拍擊類似的峰值高度,則此等兩個拍擊類型可利用相同數學模型。As explained above, an independent mathematical model is preferably used to predict the peak height of each slap type. It should be understood that if the peak heights of certain types of slaps are found to be similar, then the same mathematical model can be used for these types of slaps. For example, if it is found that only the slap of the first set of hammers 24 provides a peak height similar to that of the second set of hammers 26, then the two slap types may utilize the same mathematical model.

如上所說明,常常較佳地控制最後場14中將要執行一拍擊之前的欲歷時之時間。不過,亦可運作固定次數以執行 拍擊,例如每天在固定鐘點執行拍擊一次或兩次。在此一情況下,控制系統30可基於用於不同拍擊類型之數學模型控制欲執行之哪種拍擊類型以便避免大塵粒發射峰值,且仍管理以避免灰塵隨時間累積於收集電極板18上。如上所說明,常常較佳地使控制系統30控制將要執行一拍擊之前欲歷時之時間、及欲執行之拍擊類型。As explained above, it is often better to control the time in the last field 14 before the execution of a slap. However, it can also be operated a fixed number of times to execute Slap, such as performing a slap once or twice at a fixed hour every day. In this case, the control system 30 can control which type of slap to perform based on a mathematical model for different types of slaps in order to avoid large dust emission peaks, and still manage to avoid accumulation of dust over the collection electrode plates over time. 18 on. As explained above, it is often preferred to have control system 30 control the time it takes to perform a slap and the type of slap to be performed.

雖然上文已說明該控制系統30及該方法係用以控制何時及/或如何執行一拍擊,但亦可利用該控制系統30及/或該方法來預測某一已歷時時間之塵粒發射峰值之幅度,或預測獲得某一幅度之塵粒發射峰值之前之時間。此類資訊可用於靜電集塵器之開發與設計中,及靜電集塵器之啟用中。Although the control system 30 and the method have been described above for controlling when and/or how a slap is performed, the control system 30 and/or the method can also be utilized to predict a dust emission over a certain period of time. The magnitude of the peak, or the time before the peak of the dust emission of a certain magnitude is predicted. This information can be used in the development and design of electrostatic precipitators and in the activation of electrostatic precipitators.

上文已說明一更新數學模型之選項係以新的已測量資料記錄更新模型,及賦予更近的資料記錄一較大權重(與較舊資料記錄相比)。應明白,存在其他更新模型之方法。一可能方法係在一或多個"桶"中收集資料記錄。從此一"桶"中拾取資料記錄以更新數學模型。例如可以針對全負載條件利用一"桶",一"桶"係用於半負載條件,而一"桶"係用於低負載條件。若(例如)欲更新模型以與半負載條件適配,則與半負載條件(或接近半負載條件之條件)有關之資料記錄可從包含此類資料之"桶"中收集且可用以更新數學模型,以便其將提供一用以在半負載條件下控制拍擊的相關基礎。因此,該"桶"包含資料記錄之一來源、或"記憶庫",以便可拾取合適資料記錄以相對於本運作條件製 備或更新一相關數學模型。新資料記錄係放置於相關"桶"中,且可取代該相同"桶"之舊資料記錄。"桶"(其當然可與剛剛載入之運作條件不同的其他運作條件有關)之使用增加模型之準確度,因為使用來自相關"桶"之資料記錄更新模型,因此並不藉由與另一運作條件類型有關的大量資料記錄來偏移該模型。An option to update the mathematical model has been described above to update the model with new measured data records and to give a closer weight to the data record (compared to older data records). It should be understood that there are other ways to update the model. One possible method is to collect data records in one or more "buckets". A data record is picked up from this "bucket" to update the mathematical model. For example, a "bucket" can be utilized for full load conditions, one "barrel" for half load conditions and one "bucket" for low load conditions. If, for example, the model is to be updated to match the half load condition, data records relating to the half load condition (or conditions close to the half load condition) may be collected from the "bucket" containing such data and may be used to update the mathematics. The model so that it will provide a relevant basis for controlling the slap under semi-load conditions. Therefore, the "bucket" contains one source of the data record, or a "memory" so that the appropriate data record can be picked up to be relative to the operating conditions. Prepare or update a related mathematical model. The new data record is placed in the relevant "bucket" and can replace the old data record of the same "bucket". The use of "barrels" (which of course can be related to other operating conditions that are different from the operating conditions just loaded) increases the accuracy of the model, since the model is updated using data from the relevant "bucket" and therefore does not A large amount of data records related to the type of operating conditions to offset the model.

上文已說明,控制系統30可用以控制靜電集塵器1之最後場14之拍擊,及/或用以預測來自靜電集塵器1之塵粒發射。此一控制系統30可為一獨立控制系統,或可整合於控制整個燃燒設備之運作的總體程序電腦中。另一可能非常有吸引力(尤其當預測塵粒之發射時)的選項係使用袖珍計算器、膝上型電腦、或個人數位助理(PDA)作為控制系統。在此一情況下,只是將該數學模型程式化於所述裝置中,因而使用該裝置之微處理器作為資料處理器34,該裝置可接著用作一用以進行來自靜電集塵器之塵粒發射之預測的手持工具。As explained above, the control system 30 can be used to control the slap of the last field 14 of the electrostatic precipitator 1 and/or to predict the emission of dust particles from the electrostatic precipitator 1. This control system 30 can be an independent control system or can be integrated into an overall program computer that controls the operation of the entire combustion apparatus. Another option that may be very attractive (especially when predicting the emission of dust particles) is the use of a pocket calculator, laptop, or personal digital assistant (PDA) as the control system. In this case, the mathematical model is only programmed into the device, so that the microprocessor of the device is used as the data processor 34, which can then be used as a dust for electrostatic precipitator. Handheld tool for predicting grain emissions.

1‧‧‧靜電集塵器1‧‧‧Electrostatic dust collector

2‧‧‧入口2‧‧‧ entrance

4‧‧‧煙道氣4‧‧‧flue gas

6‧‧‧出口6‧‧‧Export

8‧‧‧煙道氣8‧‧‧flue gas

9‧‧‧外殼9‧‧‧ Shell

10‧‧‧第一場10‧‧‧ first game

12‧‧‧第二場12‧‧‧ Second

14‧‧‧最後場14‧‧‧ final field

16‧‧‧放電電極16‧‧‧Discharge electrode

18‧‧‧收集電極/收集電極板18‧‧‧Collecting electrode/collecting electrode plate

20‧‧‧電源20‧‧‧Power supply

22‧‧‧拍擊裝置22‧‧‧Slap device

24‧‧‧第一錘子24‧‧‧First Hammer

26‧‧‧第二錘子26‧‧‧Second hammer

28‧‧‧漏斗28‧‧‧ funnel

30‧‧‧控制系統30‧‧‧Control system

32‧‧‧資料接收器32‧‧‧ data receiver

34‧‧‧資料處理器34‧‧‧ Data Processor

36‧‧‧計算裝置36‧‧‧ Computing device

38‧‧‧拍擊控制裝置38‧‧‧Slap control device

40‧‧‧塵粒濃度分析器40‧‧‧dust particle concentration analyzer

42‧‧‧第一馬達42‧‧‧First motor

44‧‧‧第二馬達44‧‧‧second motor

101‧‧‧靜電集塵器101‧‧‧Electrostatic dust collector

114‧‧‧最後場114‧‧‧ final field

120‧‧‧電源120‧‧‧Power supply

122‧‧‧拍擊裝置122‧‧‧Slap device

130‧‧‧控制系統130‧‧‧Control system

136‧‧‧計算裝置/PID控制器136‧‧‧Computing device/PID controller

138‧‧‧拍擊控制裝置138‧‧‧Slap control device

140‧‧‧塵粒濃度分析器140‧‧‧dust concentration analyzer

142‧‧‧第一馬達142‧‧‧First motor

144‧‧‧第二馬達144‧‧‧second motor

已參考附圖更詳細地說明本發明,其中:圖1係一斷面圖,且解說一靜電集塵器。The invention has been described in more detail with reference to the accompanying drawings in which: FIG. 1 is a cross-sectional view and illustrates an electrostatic precipitator.

圖2係一側視圖,且解說該靜電集塵器及一控制系統。Figure 2 is a side view and illustrates the electrostatic precipitator and a control system.

圖3解說所測量之塵粒發射峰值的圖式。Figure 3 illustrates a plot of measured dust particle emission peaks.

圖4解說塵粒發射峰值之示意圖。Figure 4 illustrates a schematic diagram of dust emission peaks.

圖5解說一模型之一範例,其說明藉由一選定拍擊所造成之塵粒發射峰值高度對自緊接先前拍擊以來所歷時之時 間。Figure 5 illustrates an example of a model illustrating the peak height of the dust particle emission caused by a selected slap as it has been since the previous slap between.

圖6a係解說如何決定一將來塵粒發射峰值之一高度。Figure 6a illustrates how to determine the height of one of the peaks of future dust emission.

圖6b係解說執行一將來拍擊之前之欲歷時之時間的決定。Figure 6b illustrates the decision of the time required to perform a future slap.

圖7解說控制最後場之拍擊之方法的流程圖。Figure 7 illustrates a flow chart of a method of controlling the slap of the last field.

圖8係一示意圖,且解說藉由不同拍擊類型所獲得之塵粒發射峰值。Figure 8 is a schematic diagram and illustrates the dust emission peaks obtained by different types of slaps.

圖9係一側視圖,且解說依據一替代具體實施例的一靜電集塵器及一控制系統。Figure 9 is a side elevational view and illustrates an electrostatic precipitator and a control system in accordance with an alternate embodiment.

1‧‧‧靜電集塵器1‧‧‧Electrostatic dust collector

4‧‧‧煙道氣4‧‧‧flue gas

8‧‧‧煙道氣8‧‧‧flue gas

20‧‧‧電源20‧‧‧Power supply

22‧‧‧拍擊裝置22‧‧‧Slap device

30‧‧‧控制系統30‧‧‧Control system

32‧‧‧資料接收器32‧‧‧ data receiver

34‧‧‧資料處理器34‧‧‧ Data Processor

36‧‧‧計算裝置36‧‧‧ Computing device

38‧‧‧拍擊控制裝置38‧‧‧Slap control device

40‧‧‧塵粒濃度分析器40‧‧‧dust particle concentration analyzer

42‧‧‧第一馬達42‧‧‧First motor

44‧‧‧第二馬達44‧‧‧second motor

Claims (28)

一種控制來自一靜電集塵器(1)之塵粒發射的方法,該靜電集塵器(1)具有一最後場(14),該最後場(14)係提供放電電極(16)、收集電極(18)、及一拍擊裝置(22),該拍擊裝置(22)係經調適用以藉由拍擊該等收集電極(18)來為其除塵,其係特徵化為以下步驟i)利用藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度(H)與介於該選定拍擊與其緊接先前拍擊間之一時間(t)之間的一關係,及ii)基於該關係,調整選自以下群組之至少一參數:該最後場(14)中將要執行一拍擊之前的該欲歷時之時間(t),及該最後場(14)中欲執行之拍擊類型。A method for controlling the emission of dust particles from an electrostatic precipitator (1), the electrostatic precipitator (1) having a final field (14), the discharge field (16) providing a discharge electrode (16) (18), and a slap device (22) adapted to smear the collector electrode (18) for dust removal, which is characterized by the following steps i) Using a relationship between one of the peaks of the dust emission (H) selected by one of the selected slaps and a time (t) between the selected slap and the immediately preceding slap, and ii Based on the relationship, adjusting at least one parameter selected from the group consisting of: the time (t) of the desired duration before the slap in the last field (14), and the execution of the last field (14) The type of slap. 如請求項1之方法,該步驟ii)進一步包含計算波動平均值,其各對應於一預設週期期間之平均塵粒發射,及基於該關係,相對於一預設波動平均限制值調整該最後場(14)之該等收集電極(18)之該拍擊。In the method of claim 1, the step ii) further comprises calculating a fluctuation average value, each corresponding to an average dust emission during a predetermined period period, and adjusting the last value relative to a predetermined fluctuation average limit value based on the relationship The tapping of the collecting electrodes (18) of the field (14). 如請求項1至2中任一項之方法,其中,在該步驟i)中,識別欲採用該拍擊類型,且選擇一拍擊類型特定模型以便在步驟i)中加以利用,此類選定拍擊類型特定模型係藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度(H)與介於已識別特定拍擊類型之該選定拍擊與其緊接先前拍擊間之該時間(t)之間之該關係的一模型。The method of any one of claims 1 to 2, wherein in the step i), identifying the type of slap to be used, and selecting a slap type specific model for use in step i), such selection The slap type specific model is one of the selected dust blasting peak amplitudes (H) caused by a selected slap and the selected slap between the identified specific slap types and the previous slap. A model of this relationship between times (t). 如請求項1至2中任一項之方法,其中,在該步驟i)中,當利用藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度(H)與介於該選定拍擊與其緊接先前拍擊間之一時間(t)之間的該關係時,識別並考量該選定拍擊之前所執行之拍擊類型,該緊接先前拍擊之類型已加以識別。The method of any one of claims 1 to 2, wherein in the step i), when one of the peaks of the dust emission peak (H) is selected and selected by a selected slap, When the relationship between the slap and one of the time (t) between the previous slaps is identified, the type of slap performed prior to the selected slap is identified and considered, the type of the previous slap being identified. 如請求項1至2中任一項之方法,其中藉由下面的式子來表示藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度(H)與介於該選定拍擊與其緊接先前拍擊間之該時間(t)之間的該關係:幅度(H)函數(時間(t)),其中從以下函數中選擇該函數:對數函數,及對數函數之近似值,該函數較佳為一自然對數函數。The method of any one of claims 1 to 2, wherein the amplitude (H) of one of the selected dust particle emission peaks caused by a selected slap is represented by the following formula This relationship between the time (t) immediately before the previous slap: amplitude (H) Function (time (t)), where the function is selected from the following functions: a logarithmic function, and an approximation of a logarithmic function, which is preferably a natural logarithmic function. 如請求項1至2中任一項之方法,其中藉由以下步驟來獲得藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度(H)與介於該選定拍擊與其緊接先前拍擊間之該時間(t)之間之一關係的一數學模型A)測量該最後場(14)之後之該塵粒發射以識別與該最後場(14)之至少一收集電極(18)之拍擊(R2;R4)有關的塵粒發射峰值(P2;P4),B)使該等塵粒發射峰值(P2;P4)之每一者之測量幅度(H1;H2)與自該最後場(14)之該至少一收集電極(18)之緊接先前拍擊(R1;R3)以來所歷時之對應時間(t1;t2)耦 合以便形成資料記錄,各此類資料記錄包含該塵粒發射峰值(P2;P4)之該幅度(H1;H2)及自該緊接先前拍擊(R1;R3)以來所歷時之該對應時間(t1;t2),及C)基於該等資料記錄,製備藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度(H)與介於該選定拍擊與其緊接先前拍擊間之該時間(t)之間之一關係的該模型。The method of any one of claims 1 to 2, wherein the amplitude (H) of one of the selected dust particle emission peaks caused by a selected slap is obtained by the following step a mathematical model A of the relationship between the time (t) between previous taps A) measuring the dust emission after the last field (14) to identify at least one collecting electrode with the last field (14) ( 18) The peak of the dust emission (P2; P4) related to the slap (R2; R4), and B) the measurement range (H1; H2) of each of the dust emission peaks (P2; P4) and Coupling time (t1; t2) of the at least one collecting electrode (18) of the last field (14) immediately after the previous slap (R1; R3) Combining to form a data record, each such data record including the amplitude (H1; H2) of the dust particle emission peak (P2; P4) and the corresponding time since the previous slap (R1; R3) (t1; t2), and C) based on the data records, preparing one of the selected dust particle emission peaks (H) caused by a selected slap and the selected slap immediately following the previous slap The model of the relationship between this time (t). 如請求項6之方法,該步驟B)進一步包含在各資料記錄中包括一第一標籤,其指示獲得該所述塵粒發射峰值(P4)時所採用之該拍擊類型,該步驟C)進一步包含依據該第一標籤針對各拍擊類型製備一拍擊類型特定模型。In the method of claim 6, the step B) further includes including, in each data record, a first label indicating the type of the shot used to obtain the peak of the dust emission (P4), the step C) Further comprising preparing a slap type specific model for each slap type based on the first label. 如請求項7之方法,該步驟B)進一步包含在各資料記錄中包括一第二標籤,其包含與該資料記錄之該幅度、時間及第一標籤有關之該拍擊之前所執行之該特定拍擊類型的有關歷史資訊,該步驟C)進一步包含在各該拍擊類型特定模型中考量該歷史資訊。In the method of claim 7, the step B) further includes including, in each data record, a second label, the specific label being executed before the tap related to the amplitude, time and the first label of the data record. Regarding the historical information of the slap type, the step C) further includes considering the historical information in each of the slap type specific models. 如請求項1至2中任一項之方法,其中藉由以下步驟來更新藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度(H)與介於該選定拍擊與其緊接先前拍擊間之該時間(t)之間之一關係的一數學模型D)測量該最後場(14)之後之塵粒發射以識別與該最後場(14)之至少一收集電極(18)之一拍擊(R5)有關的一塵粒發射峰值(P5),E)使該塵粒發射峰值(P5)之測量幅度(H2)與自該最後場(14)之該至少一收集電極(18)之緊接先前拍擊(R4)以來 所歷時之對應時間(t2)耦合以便形成一資料記錄,此類資料記錄包含該塵粒發射峰值(P5)之該幅度(H2)及自該緊接先前拍擊(R4)以來所歷時之該對應時間(t2),及F)基於該資料記錄,更新藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度(H)與介於該選定拍擊與其緊接先前拍擊間之該時間(t)之間之一關係的該數學模型。The method of any one of claims 1 to 2, wherein the amplitude (H) of one of the selected dust particle emission peaks caused by one of the selected slaps is updated by the following step A mathematical model D of the relationship between the times (t) between previous taps is measured by the dust particle emission after the last field (14) to identify at least one collecting electrode with the last field (14) (18) a slap (R5) related dust emission peak (P5), E) a measured amplitude (H2) of the dust emission peak (P5) and the at least one collecting electrode from the last field (14) (18) Since the previous slap (R4) The corresponding time (t2) of the duration is coupled to form a data record comprising the amplitude (H2) of the dust particle emission peak (P5) and the time since the previous slap (R4) Corresponding time (t2), and F) based on the data record, updating one of the selected dust particle emission peaks (H) caused by a selected slap and between the selected slap and the previous slap The mathematical model of the relationship between one of the times (t). 如請求項9之方法,該步驟E)進一步包含在各資料記錄中包括一第一標籤,其指示獲得該所述塵粒發射峰值時所採用之該拍擊類型,該步驟F)進一步包含更新對應於藉由該第一標籤所表示之該拍擊類型的一拍擊類型特定數學模型。In the method of claim 9, the step E) further includes including, in each data record, a first label indicating the type of the shot used to obtain the peak of the dust emission, and the step F) further includes updating A specific mathematical model corresponding to a slap type of the slap type represented by the first label. 如請求項10之方法,該步驟E)進一步包含在各資料記錄中包括一第二標籤,其包含與該資料記錄之該幅度、時間及第一標籤有關之拍擊之前所執行之該特定拍擊類型的有關歷史資訊,該步驟F)進一步包含更新藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度(H)與介於該選定拍擊與其緊接先前拍擊間之該時間(t)之間之一關係的該數學模型時考量該歷史資訊。In the method of claim 10, the step E) further includes including, in each data record, a second label including the specific shot performed prior to the slap associated with the amplitude, time, and first label of the data record. The historical information about the type of the hit, the step F) further comprising updating one of the selected dust particle emission peaks (H) caused by a selected slap and the selected slap and the immediately following slap The mathematical model of the relationship between the times (t) takes into account the historical information. 如請求項9之方法,其中步驟F)期間更新該數學模型時使用一資料過濾器。The method of claim 9, wherein a data filter is used when updating the mathematical model during step F). 如請求項1之方法,其中基於該關係,調整選自以下群組之至少一參數:該最後場(14)中將要執行一拍擊之前的該欲歷時之時間(t),及該最後場(14)中欲執行之該拍 擊類型,的該步驟係藉由以下步驟來執行:測量藉由該最後場(14)之該等收集電極(18)之至少一收集電極之拍擊所造成之一塵粒發射峰值之該幅度,將關於該塵粒發射峰值之該測量幅度的資訊發送至一計算裝置(136),該計算裝置(136)比較該塵粒發射峰值之該測量幅度與一塵粒發射峰值幅度目標值,及用於最小化該塵粒發射峰值幅度目標值與藉由該最後場(14)之該等收集電極(18)之至少一收集電極之一後續拍擊所造成之一後續塵粒發射峰值之該測量幅度間之差的目的,藉由該計算裝置(136),自動調整選自以下群組之至少一參數:該最後場(14)中將要執行該後續拍擊之前的該欲歷時之時間(t),及該最後場(14)中欲執行之後續拍擊類型。The method of claim 1, wherein based on the relationship, adjusting at least one parameter selected from the group consisting of: a time (t) of the desired duration before a tap is performed in the last field (14), and the last field (14) The shot to be executed The step of the hit type is performed by measuring the amplitude of one of the dust emission peaks caused by the slap of the at least one collecting electrode of the collecting electrodes (18) of the last field (14) Sending information about the measured amplitude of the dust particle emission peak to a computing device (136), the computing device (136) comparing the measured amplitude of the dust particle emission peak with a dust particle emission peak amplitude target value, and The target for minimizing the peak value of the dust particle emission and the subsequent dust particle emission peak caused by one of the at least one collecting electrode of the collecting electrode (18) of the last field (14) For the purpose of measuring the difference between the amplitudes, the computing device (136) automatically adjusts at least one parameter selected from the group consisting of: the time in the last field (14) before the subsequent slap is to be performed ( t), and the type of subsequent slaps to be performed in the last field (14). 如請求項13之方法,其中該計算裝置(136)包含依據一無模型演算法運作的一控制器,例如一PI控制器、一PID控制器、或一無模型適應性控制器。The method of claim 13, wherein the computing device (136) comprises a controller operating in accordance with a modelless algorithm, such as a PI controller, a PID controller, or a modelless adaptive controller. 一種預測一靜電集塵器(1)之一最後場(14)之至少一收集電極(18)之該拍擊期間之塵粒之發射的方法,該最後場(14)係提供放電電極(16)、收集電極(18)、及一拍擊裝置(22),該拍擊裝置(22)係經調適用以藉由拍擊該等收集電極(18)來為其除塵,該方法係特徵化為以下步驟:利用藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度(H)與介於該選定拍擊與其緊接先前拍擊間之該時 間(t)之間的一關係,及基於藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度(H)與介於該選定拍擊與其緊接先前拍擊間之該時間(t)之間的該關係,預測一從以下參數中選擇之參數:1)藉由一選定拍擊所造成之塵粒發射峰值(PF)之幅度(HF),其係基於該選定拍擊與其緊接先前拍擊間之一欲歷時時間(t),及2)一選定拍擊與其緊接先前拍擊間之欲歷時之時間(tF),其係基於藉由該選定拍擊所造成之一塵粒發射峰值(PF)之該幅度(H)。A method for predicting emission of dust particles during the slap of at least one collection electrode (18) of one of the last fields (14) of an electrostatic precipitator (1), the last field (14) providing a discharge electrode (16) a collecting electrode (18), and a slamming device (22) adapted to smear the collecting electrodes (18) for dusting thereof, the method being characterized The following steps: using one of the peaks of the dust emission peak (H) selected by one of the selected slaps and the time between the selected slap and the previous slap a relationship between (t) and based on one of the selected dust particle emission peaks (H) caused by a selected slap and the time between the selected slap and the previous slap The relationship between (t) predicts a parameter selected from the following parameters: 1) the magnitude (HF) of the dust particle emission peak (PF) caused by a selected slap, based on the selected slap It is the time (t) of the previous slap, and 2) the time (tF) of the selected slap and its immediate slap, which is based on the selected slap. The amplitude (H) of one of the dust emission peaks (PF). 如請求項15之方法,其中藉由下面的式子來表示藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度(H)與介於該選定拍擊與其緊接先前拍擊間之該時間(t)之間的該關係:幅度(H)函數(時間(t)),其中從以下函數中選擇該函數:對數函數,及對數函數之近似值,該函數較佳為一自然對數函數。The method of claim 15, wherein the amplitude (H) of one of the selected dust emission peaks caused by one of the selected slaps is represented by the following formula, and the selected slap is immediately followed by the previous slap The relationship between this time (t): amplitude (H) Function (time (t)), where the function is selected from the following functions: a logarithmic function, and an approximation of a logarithmic function, which is preferably a natural logarithmic function. 如請求項15或16之方法,其中預測該參數時利用一數學模型,其係藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度(H)與介於該選定拍擊與其緊接先前拍擊間之該時間(t)之間之該關係的一近似值。The method of claim 15 or 16, wherein the parameter is predicted to utilize a mathematical model which is selected by a selected slap to cause one of the peaks of the dust emission peak (H) and the selected slap An approximation of the relationship between the times (t) between previous snappings. 如請求項15或16之方法,其中藉由以下步驟獲得一數學 模型A)測量該最後場(14)之後之塵粒發射以識別與該最後場(14)之該至少一收集電極(18)之拍擊(R2;R4)有關的塵粒發射峰值(P2;P4),B)使該等塵粒發射峰值(P2;P4)之每一者之該測量幅度(H1;H2)與自該最後場(14)之該至少一收集電極(188))之該緊接先前拍擊(R1;R3)以來所歷時之該對應時間(t1;t2)耦合以便形成資料記錄,各此類資料記錄包含該峰值(P2;P4)之該幅度(H1;H2)及自該緊接先前拍擊(R1;R3)以來所歷時之該對應時間(t1;t2),及C)基於該等資料記錄,製備藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度(H)與介於該選定拍擊與其緊接先前拍擊間之該時間(t)之間之一關係的該數學模型。The method of claim 15 or 16, wherein the obtaining a mathematics is obtained by the following steps Model A) measuring the dust particle emission after the last field (14) to identify a dust emission peak associated with the slap (R2; R4) of the at least one collecting electrode (18) of the last field (14) (P2; P4), B) the measurement amplitude (H1; H2) of each of the dust particle emission peaks (P2; P4) and the at least one collection electrode (188) from the last field (14) The corresponding time (t1; t2) elapsed immediately after the previous slap (R1; R3) is coupled to form a data record, each such data record including the amplitude (H1; H2) of the peak (P2; P4) and The corresponding time (t1; t2) from the time immediately following the previous slap (R1; R3), and C) based on the data records, preparing a peak of selected dust emission caused by a selected slap One of the magnitude (H) and the mathematical model between the selected slap and the time (t) between the previous slaps. 如請求項15或16之方法,其中藉由以下步驟來更新藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度(H)與介於該選定拍擊與其緊接先前拍擊間之該時間(t)之間之該關係的一數學模型D)測量該最後場(14)之後之該塵粒發射以識別與該最後場(14)之該等收集電極(18)之一拍擊(R5)有關的一塵粒發射峰值(P5),E)使該塵粒發射峰值(P5)之該測量幅度(H2)與自該最後場(14)之該至少一收集電極(18)之該緊接先前拍擊(R4)以來所歷時之該對應時間(t2)耦合以便形成一資料記 錄,此類資料記錄包含該峰值(P5)之該幅度(H2)及自該緊接先前拍擊(R4)以來所歷時之該對應時間(t2),及F)基於該資料記錄,更新藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度(H)與介於該選定拍擊與其緊接先前拍擊間之該時間(t)之間之一關係的該數學模型。The method of claim 15 or 16, wherein the one of the selected dust particle emission peaks (H) caused by one of the selected slaps is updated by the following step, and the selected slap is immediately followed by the previous slap a mathematical model of the relationship between the times (t) between the measurements D) measuring the dust emission after the last field (14) to identify one of the collecting electrodes (18) with the last field (14) a dust particle emission peak (P5) related to the slap (R5), E) the measured amplitude (H2) of the dust particle emission peak (P5) and the at least one collecting electrode (18) from the last field (14) The corresponding time (t2) of the time immediately preceding the previous slap (R4) is coupled to form a data record Recorded, such data record includes the amplitude (H2) of the peak (P5) and the corresponding time (t2) since the previous slap (R4), and F) based on the data record, updated borrowing The mathematical model of the relationship between one of the selected dust particle emission peaks (H) and one of the time (t) between the selected slap and the immediately preceding slap caused by a selected slap. 一種控制系統,其用以控制來自一靜電集塵器(1)之該塵粒發射,該靜電集塵器(1)具有一最後場(14),該最後場(14)係提供放電電極(16)、收集電極(18)及一拍擊裝置(22),該拍擊裝置(22)係經調適用以藉由拍擊該等收集電極(18)來為其除塵,其特徵為該控制系統(30)包含一控制裝置(38;138),其係可運作以,基於藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度(H)與介於該選定拍擊與其緊接先前拍擊間之該時間(t)之間的一關係,調整選自以下群組之至少一參數:該最後場(14)中將要執行一拍擊之前的該欲歷時之時間(t),及該最後場(14)中欲執行之該拍擊類型。A control system for controlling the emission of dust particles from an electrostatic precipitator (1) having a final field (14) that provides a discharge electrode ( 16) a collecting electrode (18) and a slamming device (22) adapted to be dusted by slamming the collecting electrodes (18), characterized by the control The system (30) includes a control device (38; 138) operable to select one of the peaks of the dust emission peak (H) based on one of the selected slaps and the selected slap Immediately following a relationship between the times (t) between previous snappings, at least one parameter selected from the group consisting of: the time of the desired duration before a tap is to be performed in the last field (14) (t ), and the type of slap to be performed in the last field (14). 如請求項20之控制系統,其中該控制裝置(38)係可運作以在控制該參數時利用一數學模型,其係藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度(H)與介於該緊接先前拍擊與該選定拍擊間之該時間(t)之間之該關係的一近似值。The control system of claim 20, wherein the control device (38) is operative to utilize a mathematical model for controlling the parameter, wherein one of the peaks of the dust emission is selected by one of the selected slaps ( H) An approximation of the relationship between the time (t) between the immediately preceding slap and the selected slap. 如請求項21之控制系統,其中該控制系統(30)進一步包含 一資料接收器(32),其係可運作以接收與該最後場(14)之後之該塵粒發射有關之測量資料,及在該測量資料中識別與該最後場(14)之該至少一收集電極(18)之拍擊(R5)有關的一塵粒發射峰值(P5),一資料處理器(34),其係可運作以使該塵粒發射峰值(P5)之該測量幅度(H2)與自該最後場(14)之該至少一收集電極(18)之該緊接先前拍擊(R4)以來所歷時之該對應時間(t2)耦合以便形成一資料記錄,此類資料記錄包含該峰值(P5)之該幅度(H2)及自該緊接先前拍擊(R4)以來所歷時之該對應時間(t2),及一計算裝置(36),其係可運作以,基於該資料記錄,更新該數學模型,該數學模型係藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度(H)與介於該選定拍擊與其緊接先前拍擊間之該時間(t)之間之該關係的一近似值。The control system of claim 21, wherein the control system (30) further comprises a data receiver (32) operative to receive measurement data relating to the emission of the dust particles after the last field (14), and identifying at least one of the last field (14) in the measurement data Collecting a dust particle emission peak (P5) related to the slap (R5) of the electrode (18), a data processor (34) operable to make the measurement range of the dust particle emission peak (P5) (H2) Coupling with the corresponding time (t2) of the at least one collecting electrode (18) of the last field (14) from the previous tap (R4) to form a data record, the data record comprising The amplitude (H2) of the peak (P5) and the corresponding time (t2) since the previous slap (R4), and a computing device (36) operable to be based on the data Recording, updating, the mathematical model by one of the selected slaps, one of the peaks of the selected dust emission peak (H) and the time between the selected slap and the previous slap ( An approximation of this relationship between t). 如請求項20至22中任一項之控制系統,其中藉由下面的式子來表示藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度(H)與介於該選定拍擊與其緊接先前拍擊間之該時間(t)之間的該關係:幅度(H)函數(時間(t)),其中從以下函數中選擇該函數:對數函數,及對數函數之近似值,該函數較佳為一自然對數函數。The control system according to any one of claims 20 to 22, wherein the amplitude (H) of one of the selected dust emission peaks caused by a selected slap is represented by the following formula The relationship between the time (t) followed by the previous slap: amplitude (H) Function (time (t)), where the function is selected from the following functions: a logarithmic function, and an approximation of a logarithmic function, which is preferably a natural logarithmic function. 如請求項20至22中任一項之控制系統,其中該控制裝置(38)係可用於調整欲執行之該拍擊類型及將要執行一拍擊之前之該欲歷時之時間之目的而運作。The control system of any one of claims 20 to 22, wherein the control device (38) is operable to adjust the type of the slap to be performed and the time of the desired lapse before the slap is performed. 如請求項20之控制系統,其中一計算裝置(136)係可運作以接收與藉由該最後場(14)之該等收集電極(18)之至少一收集電極之拍擊所造成之一塵粒發射峰值之該測量幅度有關的測量資料,該計算裝置(136)係進一步經調適用以比較該塵粒發射峰值之該測量幅度與一塵粒發射峰值幅度目標值,及用於最小化該塵粒發射峰值幅度目標值與藉由該最後場(14)之該等收集電極(18)之該至少一收集電極之一後續拍擊所造成之一後續塵粒發射峰值之該測量幅度間之該差的目的,藉由該控制裝置(138),自動誘發選自以下群組之至少一參數之調整:該最後場(14)中將要執行該後續拍擊之前的該欲歷時之時間(t),及該最後場(14)中欲執行之該後續拍擊類型。In the control system of claim 20, wherein a computing device (136) is operable to receive a dust caused by a tapping of at least one of the collecting electrodes of the collecting electrodes (18) of the last field (14) Measuring data relating to the measured amplitude of the particle emission peak, the computing device (136) is further adapted to compare the measured amplitude of the dust particle emission peak with a dust particle emission peak amplitude target value, and for minimizing the The dust particle emission peak amplitude target value is between the measured amplitude of one of the subsequent dust particle emission peaks caused by the subsequent slap of one of the at least one collecting electrode of the collecting electrode (18) of the last field (14) For the purpose of the difference, the control device (138) automatically induces an adjustment of at least one parameter selected from the group consisting of: the time in the last field (14) before the subsequent slap is to be performed (t ), and the subsequent slap type to be executed in the last field (14). 一種控制系統,其用以預測來自一靜電集塵器(1)之該塵粒發射,該靜電集塵器(1)具有一最後場(14),該最後場(14)係提供放電電極(16)、收集電極(18)及一拍擊裝置(22),該拍擊裝置(22)係經調適用以藉由拍擊該等收集電極(18)來為其除塵,其特徵為該控制系統(30)包含一資料處理器(34),其係可運作以利用藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度(H)與介於該選定拍擊與其緊接先前拍擊間之該時間(t)之間的一關係, 該資料處理器(34)係進一步可運作以,基於藉由一選定拍擊所造成之一塵粒發射峰值之一幅度(H)與介於該選定拍擊與其緊接先前拍擊間之該時間(t)之間的該關係,預測一從以下參數中選擇之參數1)藉由一選定拍擊所造成之該塵粒發射峰值(PF)之該幅度(HF),其係基於該選定拍擊與其緊接先前拍擊間之一欲歷時之時間(t),及2)一選定拍擊與其緊接先前拍擊間之該欲歷時之時間(tF),其係基於藉由該選定拍擊所造成之一塵粒發射峰值(PF)之該幅度(H)。A control system for predicting the emission of dust particles from an electrostatic precipitator (1) having a final field (14) that provides a discharge electrode ( 16) a collecting electrode (18) and a slamming device (22) adapted to be dusted by slamming the collecting electrodes (18), characterized by the control The system (30) includes a data processor (34) operative to utilize one of the selected dust particle emission peaks (H) caused by a selected slap and immediately adjacent to the selected slap a relationship between the time (t) of the previous slap, The data processor (34) is further operable to be based on a magnitude (H) of one of the dust emission peaks caused by a selected slap and between the selected slap and the previous slap The relationship between times (t) predicts a parameter selected from the following parameters: 1) the amplitude (HF) of the dust emission peak (PF) caused by a selected slap based on the selection The time (t) of the slap followed by one of the previous slaps, and 2) the time (tF) of the selected slap followed by the previous slap, based on the selection The amplitude (H) of one of the dust emission peaks (PF) caused by the slap. 如請求項26之控制系統,其中該控制裝置(38)係可運作以在預測該參數時利用一數學模型,其係藉由一選定拍擊所造成之一選定塵粒發射峰值之一幅度(H)與介於該選定拍擊與其緊接先前拍擊間之該時間(t)之間之該關係的一近似值。The control system of claim 26, wherein the control device (38) is operative to utilize a mathematical model for predicting the parameter, wherein one of the peaks of the dust emission is selected by one of the selected slaps ( H) An approximation of the relationship between the selected slap and the time (t) between the previous slaps and the previous slap. 如請求項27之控制系統,其中該控制系統進一步包含一資料接收器(32),其係可運作以識別與該最後場(14)之該等收集電極(18)之至少一收集電極之拍擊(R5)有關的塵粒發射峰值(P5)及使該等塵粒發射峰值(P5)之每一者之該測量幅度(H2)與自該最後場(14)之該等收集電極(18)之該至少一收集電極之該緊接先前拍擊(R4)以來所歷時之該對應時間(t2)耦合以便形成一資料記錄,各此類資料記錄包含該峰值(P5)之該幅度(H2)及自該緊接先前拍擊(R4)以來所歷時之該對應時間(t2), 該資料處理器(34)係進一步可運作以,基於該資料記錄,更新該數學模型。The control system of claim 27, wherein the control system further comprises a data receiver (32) operative to identify at least one of the collection electrodes of the collection electrodes (18) of the last field (14) The peak of the dust emission (P5) associated with (R5) and the measured amplitude (H2) of each of the dust emission peaks (P5) and the collecting electrodes from the last field (14) (18) The corresponding time (t2) of the at least one collecting electrode immediately after the previous tap (R4) is coupled to form a data record, each such data record including the amplitude of the peak (P5) (H2) And the corresponding time (t2) since the previous slap (R4), The data processor (34) is further operable to update the mathematical model based on the data record.
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Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101829632B (en) * 2010-03-19 2013-01-23 重庆大学 Top and bottom composite rapping electric dust collector with variable rapping strength
EP2599556B1 (en) 2011-11-29 2021-06-30 General Electric Technology GmbH A method for cleaning an electrostatic precipitator
EP2620221A1 (en) 2012-01-26 2013-07-31 Alstom Technology Ltd Rapping an electrostatic precipitator
CN108889452B (en) * 2018-07-10 2023-08-04 浙江菲达环保科技股份有限公司 Type selection method of electrostatic precipitator for deep cooling of flue gas
CN112099343B (en) * 2020-07-29 2022-06-17 福建龙净环保股份有限公司 Intelligent energy-saving optimization method and medium for electric precipitation system based on neural network

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6461405B2 (en) * 1998-09-18 2002-10-08 F.L. Smidth Airtech A/S Method of operating an electrostatic precipitator
US6540812B2 (en) * 2001-07-06 2003-04-01 Bha Group Holdings, Inc. Method and system for improved rapper control

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH413974A (en) * 1964-04-14 1966-05-31 Battelle Memorial Institute Method of adjustment by oscillations of an industrial installation and apparatus for implementing this method
US3754379A (en) * 1971-02-11 1973-08-28 Koppers Co Inc Apparatus for electrode rapper control
DE2436043C3 (en) * 1974-07-26 1980-11-13 Saarbergwerke Ag, 6600 Saarbruecken Electrostatic precipitator
DE3001595A1 (en) * 1980-01-17 1981-07-23 Metallgesellschaft Ag, 6000 Frankfurt METHOD FOR OPTIMIZING THE KNOCKING FREQUENCY OF AN ELECTROFILTER SYSTEM
IN158842B (en) * 1981-11-13 1987-01-31 Blue Circle Ind Plc
US4502872A (en) * 1983-03-31 1985-03-05 Combustion Engineering, Inc. Discharge electrode wire assembly for electrostatic precipitator
DE3326040A1 (en) * 1983-07-20 1985-01-31 Siemens AG, 1000 Berlin und 8000 München METHOD FOR OPERATINGLY DETERMINING THE PRESENCE OF A KNOCKING CLOCK OPTIMUM FOR THE ELECTRODE KNOCKING OF AN ELECTROFILTER
US4624685A (en) * 1985-01-04 1986-11-25 Burns & McDonnell Engineering Co., Inc. Method and apparatus for optimizing power consumption in an electrostatic precipitator
SE466581B (en) 1989-12-11 1992-03-09 Flaekt Ab SET TO REDUCE RISK BEFORE ETERNAL RADIATION IN AN ELECTROSTATIC DUST DISPENSER
SE506423C2 (en) * 1996-05-09 1997-12-15 Flaekt Ab Method for controlling the length of the stroke intervals and other stroke parameters at an electrostatic dust separator

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6461405B2 (en) * 1998-09-18 2002-10-08 F.L. Smidth Airtech A/S Method of operating an electrostatic precipitator
US6540812B2 (en) * 2001-07-06 2003-04-01 Bha Group Holdings, Inc. Method and system for improved rapper control

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