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TWI486535B - Gas supply collection unit - Google Patents

Gas supply collection unit Download PDF

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Publication number
TWI486535B
TWI486535B TW099130142A TW99130142A TWI486535B TW I486535 B TWI486535 B TW I486535B TW 099130142 A TW099130142 A TW 099130142A TW 99130142 A TW99130142 A TW 99130142A TW I486535 B TWI486535 B TW I486535B
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TW
Taiwan
Prior art keywords
flow path
gas
manual valve
common flow
additional
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TW099130142A
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Chinese (zh)
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TW201043828A (en
Inventor
Osamu Kawakubo
Akihiro Takeichi
Takashi Inoue
Toshikazu Miwa
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Ckd Corp
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Publication of TW201043828A publication Critical patent/TW201043828A/en
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Publication of TWI486535B publication Critical patent/TWI486535B/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17CVESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C7/00Methods or apparatus for discharging liquefied, solidified, or compressed gases from pressure vessels, not covered by another subclass
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17CVESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C13/00Details of vessels or of the filling or discharging of vessels
    • F17C13/04Arrangement or mounting of valves
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17DPIPE-LINE SYSTEMS; PIPE-LINES
    • F17D1/00Pipe-line systems
    • F17D1/02Pipe-line systems for gases or vapours
    • F17D1/04Pipe-line systems for gases or vapours for distribution of gas
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17CVESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2205/00Vessel construction, in particular mounting arrangements, attachments or identifications means
    • F17C2205/01Mounting arrangements
    • F17C2205/0123Mounting arrangements characterised by number of vessels
    • F17C2205/013Two or more vessels
    • F17C2205/0134Two or more vessels characterised by the presence of fluid connection between vessels
    • F17C2205/0146Two or more vessels characterised by the presence of fluid connection between vessels with details of the manifold
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17CVESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2205/00Vessel construction, in particular mounting arrangements, attachments or identifications means
    • F17C2205/03Fluid connections, filters, valves, closure means or other attachments
    • F17C2205/0302Fittings, valves, filters, or components in connection with the gas storage device
    • F17C2205/0323Valves
    • F17C2205/0329Valves manually actuated
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17CVESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2205/00Vessel construction, in particular mounting arrangements, attachments or identifications means
    • F17C2205/03Fluid connections, filters, valves, closure means or other attachments
    • F17C2205/0302Fittings, valves, filters, or components in connection with the gas storage device
    • F17C2205/0382Constructional details of valves, regulators
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17CVESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2223/00Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel
    • F17C2223/01Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel characterised by the phase
    • F17C2223/0107Single phase
    • F17C2223/0123Single phase gaseous, e.g. CNG, GNC
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17CVESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2227/00Transfer of fluids, i.e. method or means for transferring the fluid; Heat exchange with the fluid
    • F17C2227/04Methods for emptying or filling
    • F17C2227/044Methods for emptying or filling by purging
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17CVESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2250/00Accessories; Control means; Indicating, measuring or monitoring of parameters
    • F17C2250/04Indicating or measuring of parameters as input values
    • F17C2250/0404Parameters indicated or measured
    • F17C2250/043Pressure
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17CVESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2250/00Accessories; Control means; Indicating, measuring or monitoring of parameters
    • F17C2250/06Controlling or regulating of parameters as output values
    • F17C2250/0605Parameters
    • F17C2250/0636Flow or movement of content
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17CVESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2260/00Purposes of gas storage and gas handling
    • F17C2260/02Improving properties related to fluid or fluid transfer
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17CVESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2270/00Applications
    • F17C2270/05Applications for industrial use
    • F17C2270/0518Semiconductors

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Valve Housings (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
  • Pipeline Systems (AREA)

Description

氣體供應集合單元Gas supply collection unit

本發明係有關於一種氣體供應集合單元,用以在半導體工程中,供給加工氣體(process gas),且使加工氣體分岔而供給。The present invention relates to a gas supply assembly unit for supplying a process gas in a semiconductor process and supplying a process gas.

在半導體製造工廠中,加工氣體係被配置在被收納在艙(tank)中的清潔室(clean room)之外。又,為了自艙供給相同的加工氣體至清潔室內的複數個場所,使加工氣體分岔而供給的氣體供給裝置係被使用。在這樣的氣體供給裝置中,在產生需要新的加工氣體的場所的情形時,必須進行增設一個線路(line)的作業。In a semiconductor manufacturing plant, the process gas system is disposed outside of a clean room that is housed in a tank. Further, in order to supply the same processing gas from the cabin to a plurality of places in the clean room, a gas supply device that supplies the processing gas to be branched is used. In such a gas supply device, when a place where a new processing gas is required is generated, it is necessary to perform an operation of adding one line.

在第24圖中,係表示進行三個線路的供給的氣體供應集合單元的回路圖;在第25圖中,係表示將此回路作為具體化的機械的設置狀態的平面圖。加工氣體氣動(air operate)閥107係經由加工氣體供給口108與未圖示的加工氣體艙連接。加工氣體氣動閥107係經由加工氣體共通流路105,與第二手動閥103A、103B、103C連接。In Fig. 24, there is shown a circuit diagram of a gas supply collecting unit that performs supply of three lines; and in Fig. 25, a plan view showing an arrangement state of this circuit as an actualized machine. The machining gas air operated valve 107 is connected to a machining gas tank (not shown) via a machining gas supply port 108. The machining gas pneumatic valve 107 is connected to the second manual valves 103A, 103B, and 103C via the machining gas common flow path 105.

第二手動閥103A、103B、103C係與第一手動閥101A、101B、101C連接。第一手動閥101A、101B、101C的出口係與加工氣體出口100A、100B、100C連通。第二手動閥103A、103B、103C和第一手動閥101A、101B、101C之間的流路係與壓力計102A、102B、102C連通。The second manual valves 103A, 103B, and 103C are connected to the first manual valves 101A, 101B, and 101C. The outlets of the first manual valves 101A, 101B, and 101C are in communication with the process gas outlets 100A, 100B, and 100C. The flow path between the second manual valves 103A, 103B, 103C and the first manual valves 101A, 101B, 101C is in communication with the pressure gauges 102A, 102B, 102C.

又,淨化(purge)氣體手動閥110係經由淨化氣體供給口111與未圖示的淨化氣體艙連接。淨化氣體手動閥111係經由逆止閥109、淨化氣體共通流路106與第三手動閥104A、104B、104C連接。第三手動閥104A、104B、104C係與第一手動閥101A、101B、101C連接。Further, the purge gas manual valve 110 is connected to a purge gas tank (not shown) via the purge gas supply port 111. The purge gas manual valve 111 is connected to the third manual valves 104A, 104B, and 104C via the check valve 109 and the purge gas common flow path 106. The third manual valves 104A, 104B, 104C are connected to the first manual valves 101A, 101B, 101C.

加工氣體共通流路105的端部105a係藉由止住栓被封止。淨化氣體共通流路106的端部106a係藉由止住栓被封止。The end portion 105a of the process gas common flow path 105 is sealed by the stopper. The end portion 106a of the purge gas common flow path 106 is sealed by the stopper.

其次,說明有關在第24圖的三個線路的回路中增設一個線路的情形。在第24圖中,將第四線路D記載在右側。在第26圖中,表示增設後的回路圖,在第27圖中,以平面圖表示使此回路作為具體化的機械的設置狀態。Next, a case will be described in which one line is added to the circuit of the three lines in Fig. 24. In Fig. 24, the fourth line D is described on the right side. In Fig. 26, the circuit diagram after the addition is shown, and in Fig. 27, the installation state of the machine in which the circuit is embodied is shown in a plan view.

說明增設第四線路的作業順序。在此作業中,不供給加工氣體,且也有必要停止半導體製造工程。Explain the sequence of operations for adding the fourth line. In this operation, the processing gas is not supplied, and it is also necessary to stop the semiconductor manufacturing process.

首先,將加工氣體氣動閥107作為閉閥狀態,將第三手動閥104A、104B、104C作為開閥狀態,將第一手動閥101A、101B、101C作為開閥狀態。在此狀態下,將淨化氣體手動閥111開閥。藉此,自加工氣體氣動閥107而殘留在第一手動閥101A、101B、101C內的加工氣體係以作為淨化氣體的氮氣置換。之後,第一手動閥101A、101B、101C、第二手動閥103A、103B、103C、第三手動閥104A、104B、104C係為閉閥狀態。First, the machining gas pneumatic valve 107 is in a closed state, and the third manual valves 104A, 104B, and 104C are in an open state, and the first manual valves 101A, 101B, and 101C are in an open state. In this state, the purge gas manual valve 111 is opened. Thereby, the processing gas system remaining in the first manual valves 101A, 101B, and 101C from the machining gas pneumatic valve 107 is replaced with nitrogen as a purge gas. Thereafter, the first manual valves 101A, 101B, and 101C, the second manual valves 103A, 103B, and 103C, and the third manual valves 104A, 104B, and 104C are in a closed state.

其次,取下封止淨化氣體共通流路106的端部106a的止住栓,而藉由配管112與第四線路的淨化氣體共通流路的入口端部106b連接。又,取下封止加工氣體共通流路105的端部105a的止住栓,而藉由配管113與第四線路的淨化氣體共通流路的入口端部105b連接。Next, the stopper pin that seals the end portion 106a of the purge gas common flow path 106 is removed, and the pipe 112 is connected to the inlet end portion 106b of the purge gas common flow path of the fourth line. Further, the stopper pin for sealing the end portion 105a of the processing gas common flow path 105 is removed, and the pipe 113 is connected to the inlet end portion 105b of the purge gas common flow path of the fourth line.

因為第四線路的機器的構成係與第一至第三線路的構成相同,因此省略其說明。第四線路的淨化氣體共通流路106的新的端部106c係藉由止住栓而被封止。又,加工氣體共通流路105的新的端部105c係藉由止住栓而被封止。Since the configuration of the machine of the fourth line is the same as that of the first to third lines, the description thereof will be omitted. The new end portion 106c of the purge gas common flow path 106 of the fourth line is sealed by stopping the plug. Further, the new end portion 105c of the processing gas common flow path 105 is sealed by stopping the plug.

其次,加工氣體出口100D與未圖示的必要場所連接。Next, the processing gas outlet 100D is connected to a necessary place (not shown).

藉此,第四線路的增設終了。Thereby, the addition of the fourth line ends.

然而,習知的氣體供給集合單元係具有以下問題。However, the conventional gas supply assembly unit has the following problems.

(1)在進行新的氣體線路的增設作業的情形,因為必須停止既存的氣體線路,只能在半導體製造工程停止時,進行增設作業。(1) In the case of adding a new gas line, it is necessary to stop the existing gas line, and it is only possible to perform an additional operation when the semiconductor manufacturing process is stopped.

又,即使在增設作業終了之後,在加工氣體共通流路105、以及淨化氣體共通流路106的第26圖,作為大氣暴露部係以斜線所表示的部份,然而由於被暴露在大氣,而存在大氣中的水分附著在流路的內壁的問題。亦即,加工氣體混入水份的話,會有加工氣體的功能不完全的情形,在增設第四線路之後,而自淨化氣體共通流路長時間流入淨化氣體,因為必須除去空氣暴露的流路的水分。實際上,進行數小時到數十小時的淨化。In addition, after the end of the additional operation, the 26th drawing of the processing gas common flow path 105 and the purge gas common flow path 106 is a portion indicated by oblique lines as the exposed portion of the atmosphere, but is exposed to the atmosphere. There is a problem that moisture in the atmosphere adheres to the inner wall of the flow path. In other words, if the processing gas is mixed with water, the function of the processing gas may be incomplete. After the fourth line is added, the common flow path from the purge gas flows into the purge gas for a long time because the flow path exposed by the air must be removed. Moisture. In fact, purification is performed for hours to tens of hours.

(2)由於需要額外的配管112、113,氣體供給集合單元在橫方向變大,違反了藉由集合化以小型化的要求。又,第四線路係藉由螺栓而被安裝至基板120,必須藉由配管112、113調整其位置,而存在因配管作業而浪費時間的問題。(2) Since the additional pipings 112 and 113 are required, the gas supply assembly unit becomes larger in the lateral direction, which is in violation of the requirement of miniaturization by integration. Further, the fourth line is attached to the substrate 120 by bolts, and the position of the fourth line must be adjusted by the pipes 112 and 113, which causes a problem of wasted time due to piping work.

(3)在增設作業完成之後的氣體線路中,被暴露於大氣的部份係為回路43、回路44,在第9圖中以斜線表示。為了除去此暴露於大氣的部份的水分,藉由淨化氣體共通流路16,在增設氣體單元內流動淨化氣體,進行增設氣體單元內的水分的除去。在此淨化中的淨化氣體的流動和自淨化氣體而被遮斷的大氣殘留部係由下列圖示所表示:表示第9圖的構成的平面圖(第20圖)、表示取下第20圖的機器的下部的流路塊(block)的平面圖(第21圖)、加工氣體共通流路端部手動閥22、24和下部的流路塊的剖面圖(第22圖)、以及表示取下第22圖的機器的下部的流路塊的立體圖(第23圖)。由這些圖可得知,雖然在回路44的一部份流動淨化氣體,因為滯留部大,而有淨化氣體未流動的部份。又,回路43係由淨化氣體所遮斷,而有大氣殘留的問題。因為,淨化成為不完全,加工氣體中混入水分,而有加工氣體的功能不完全的場合。(3) In the gas line after the completion of the additional operation, the portion exposed to the atmosphere is the circuit 43 and the circuit 44, which are indicated by oblique lines in Fig. 9. In order to remove the moisture which is exposed to the atmosphere, the purge gas common flow path 16 is used to flow the purge gas in the additional gas unit to remove the moisture in the additional gas unit. The flow of the purge gas in the purification and the atmospheric residual portion blocked by the purge gas are represented by the following diagrams: a plan view showing the configuration of Fig. 9 (Fig. 20), and a view showing the removal of Fig. 20. A plan view of a flow block in the lower part of the machine (Fig. 21), a cross-sectional view of the flow path end manual valves 22 and 24 and a lower flow path block (Fig. 22), and a removal of the first A perspective view of the flow path block at the lower portion of the machine of Fig. 22 (Fig. 23). As can be seen from these figures, although the purge gas flows in a portion of the circuit 44, since the retention portion is large, there is a portion where the purge gas does not flow. Further, the circuit 43 is blocked by the purge gas, and there is a problem that the atmosphere remains. This is because the purification is incomplete, the process gas is mixed with water, and the function of the process gas is not complete.

在此,本發明的目的係為了解決上述問題而提供氣體供應集合單元,其可使增設線路容易化。又,本發明的目的係提供氣體供應集合單元,其在增設線路而進行淨化之時,可確實地淨化。Here, an object of the present invention is to provide a gas supply assembly unit which can facilitate an additional line in order to solve the above problems. Further, an object of the present invention is to provide a gas supply collecting unit which can be surely purified when a line is added for purification.

關於本發明的氣體供給集合單元係具有如下述般的構成。The gas supply assembly unit of the present invention has a configuration as described below.

(1)氣體供應集合單元包括複數個氣體單元,其藉由流路塊以直列一體的方式連結下列元件:第一手動閥,被設置在出口流路;第二手動閥,被設置在連通上述第一手動閥和加工氣體共通流路的位置;以及第三手動閥,被設置在連通上述第一手動閥和淨化氣體共通流路的位置;其中包括:加工氣體共通流路端部手動閥,與加工氣體共通流路的端部連通;以及淨化氣體共通流路端部手動閥,與淨化氣體共通流路的端部連通。(1) The gas supply assembly unit includes a plurality of gas units that are connected in an in-line manner by the flow path block: the first manual valve is disposed at the outlet flow path; and the second manual valve is disposed to communicate with the above a position of the first manual valve and the processing gas common flow path; and a third manual valve disposed at a position connecting the first manual valve and the common flow path of the purge gas; wherein: the manual valve of the processing gas common flow end end, The end portion of the common flow path of the processing gas is communicated with the end portion of the common flow path of the purge gas, and communicates with the end portion of the common flow path of the purge gas.

(2)在如(1)所記載的氣體供給集合單元中,更包括:固定板,以和上述氣體單元的氣體的流動成直角方向交叉而被設置複數個,且安裝上述氣體單元;另外的加工氣體共通流路端部手動閥,與上述加工氣體共通流路端部手動閥連通;以及另外的淨化氣體共通流路端部手動閥,與上述淨化氣體共通流路的端部連通的淨化氣體共通流路端部手動閥連通。(2) The gas supply assembly unit according to (1), further comprising: a fixing plate that is provided in a plurality of directions intersecting with a flow of the gas of the gas unit in a direction perpendicular thereto, and the gas unit is attached; a machining gas common flow end end manual valve is connected to the machining gas common flow path end manual valve; and another purge gas common flow path end manual valve, the purge gas communicating with the end of the purge gas common flow path The common flow path end manual valve is connected.

(3)在如(2)所記載的氣體供給集合單元中,上述增設的氣體單元係具有用以連接既設的氣體供給集合單元的高度調整裝置。(3) The gas supply unit according to (2), wherein the additional gas unit has a height adjusting device for connecting the gas supply unit provided.

(4)在如(1)所記載的氣體供給集合單元中,更包括:增設的氣體單元,具有與上述加工氣體共通流路端部手動閥連通的另外的加工氣體共通流路端部手動閥、與上述淨化氣體共通流路端部手動閥連通的另外的淨化氣體共通流路端部手動閥、以及與上述加工氣體共通流路端部手動閥連通的另外的第二手動閥;第一連通路,連通上述另外的淨化氣體共通流路端部手動閥的出口流路和上述另外的加工氣體共通流路端部手動閥的出口流路;第二連通路,連通上述另外的加工氣體共通流路端部手動閥的入口流路和上述加工氣體共通流路端部手動閥的出口流路;以及第三連通路,連通上述加工氣體共通流路端部手動閥的出口流路和上述另外的第二手動閥的入口流路。(4) The gas supply assembly unit according to (1), further comprising: an additional gas unit, and another processing gas common flow path end manual valve that communicates with the machining gas common flow path end manual valve a separate purge gas common flow path end manual valve communicating with the purge gas common flow path end manual valve, and another second manual valve communicating with the machining gas common flow path end manual valve; a passage connecting the outlet flow path of the manual valve at the end of the additional purge gas common flow path and the outlet flow path of the manual valve at the end of the additional process gas common flow path; and the second communication path connecting the additional process gas common flow An inlet flow path of the road end manual valve and an outlet flow path of the machining gas common flow end end manual valve; and a third communication path connecting the outlet flow path of the machining gas common flow end end manual valve and the other The inlet flow path of the second manual valve.

(5)在如(1)所記載的氣體供給集合單元中,在上述加工氣體共通流路端部手動閥的內部形成兩個分岔的出口流路,在上述增設的氣體單元的上述另外的加工氣體共通流路端部手動閥的內部形成兩個分岔的出口流路。(5) In the gas supply assembly unit according to (1), two branch outlet flow paths are formed in the inside of the machining gas common flow path end manual valve, and the additional one of the additional gas units is The inside of the manual valve at the end of the processing gas common flow path forms two branch outlet flow paths.

(6)在如(5)所記載的氣體供給集合單元中,使上述第一連通路在上述另外的淨化氣體共通流路端部手動閥的出口流路以及上述另外的加工氣體共通流路端部手動閥的上述兩個分岔的出口流路的兩方連通,使上述第二連通路在上述另外的加工氣體共通流路端部手動閥的入口流路以及上述加工氣體共通流路端部手動閥的上述兩個分岔的出口流路的一方連通,使上述第三連通路在上述加工氣體共通流路端部手動閥的上述兩個分岔的出口流路的另一方以及上述另外的第二手動閥的入口流路連通。(6) The gas supply assembly unit according to (5), wherein the first communication path is at an outlet flow path of the manual valve at the end of the additional purge gas common flow path, and the other processing gas common flow path end Two outlets of the two branch outlets of the manual valve communicate with each other, and the second communication passage is at an inlet flow path of the manual valve at the end of the other processing gas common flow path and the end of the common flow path of the machining gas One of the two branch outlet flow paths of the manual valve communicates with the other of the two bypass outlet flow paths of the manual communication valve end manual valve and the other The inlet flow path of the second manual valve is connected.

其次說明有關具有在上述(1)至(3)記載的構成的發明的作用效果。Next, the effects of the invention having the configuration described in the above (1) to (3) will be described.

通常與加工氣體共通流路的端部連通的加工氣體共通流路端部手動閥、以及與淨化氣體共通流路的端部連通的淨化氣體共通流路端部手動閥係在閉閥狀態。且,即使在增設新線路的場合,至少在淨化終了為止,加工氣體共通流路端部手動閥和淨化氣體共通流路端部手動閥係被閉閥。The machining gas common flow path end manual valve that communicates with the end portion of the machining gas common flow path and the purge gas common flow path end manual valve that communicates with the end portion of the purge gas common flow path are normally closed. Further, even when a new line is added, the machining valve common flow end manual valve and the purge gas common flow path end manual valve are closed at least until the end of the purification.

其次,構成第四線路的第四氣體單元係與氣體的流動以直角方向交叉,且安裝在被定位的複數導軌,使其在導軌上被移動,使第四氣體單元的加工氣體共通流路的入口端部移動在與加工氣體共通流路端部手動閥連接的位置,而使淨化氣體共通流路的入口端部移動在與淨化氣體共通流路端部手動閥的出口連接的位置。Next, the fourth gas unit constituting the fourth line intersects with the flow of the gas at right angles, and is mounted on the plurality of positioned guide rails to be moved on the guide rail to make the processing gas of the fourth gas unit common to the flow path. The inlet end portion is moved at a position connected to the manual valve at the end of the processing gas common flow path, and the inlet end portion of the purge gas common flow path is moved at a position connected to the outlet of the manual valve at the end of the purge gas common flow path.

此時,構成第四氣體單元的加工氣體共通流路的入口端部的塊、以及構成淨化氣體共通流路的入口端部的塊係例如,為了在高度方向變成降低為只有間隔板的厚度,這些塊係不會干涉而可移動到加工氣體共通流路端部手動閥的出口的正下方位置為止,同樣到淨化氣體共通流路端部手動閥的出口的正下方位置為止。其次,藉由在第四氣體單元全體的下面插入間隔板,可使第四單元的加工氣體共通流路的入口端部與加工氣體共通流路端部手動閥的出口連接,可使淨化氣體共通流路的入口端部與淨化氣體共通流路端部手動閥的出口連接。其次,鎖緊連接螺栓、第四氣體單元固定螺栓。In this case, the block at the inlet end portion of the processing gas common flow path constituting the fourth gas unit and the block forming the inlet end portion of the purge gas common flow path are, for example, reduced in thickness in the height direction to have only the thickness of the partition plate. These blocks can be moved to the position immediately below the exit of the manual valve at the end of the processing gas common flow path without interference, and also to the position immediately below the outlet of the manual valve at the end of the common flow path of the purge gas. Next, by inserting a partition plate under the entire fourth gas unit, the inlet end portion of the processing gas common flow path of the fourth unit can be connected to the outlet of the manual valve at the end of the processing gas common flow path, so that the purge gas can be used in common. The inlet end of the flow path is connected to the outlet of the purge gas common flow path end manual valve. Next, the connecting bolt and the fourth gas unit fixing bolt are locked.

其次,將第四氣體單元的新的加工氣體共通流路端部手動閥和淨化氣體共通流路端部手動閥作為閉閥狀態,將第二手動閥作為閉閥狀態,將第一手動閥和第三手動閥作為開閥狀態,將增設氣體單元的淨化氣體共通流路端部手動閥開閥。Next, the new processing gas common flow path end manual valve of the fourth gas unit and the purge gas common flow path end manual valve are used as the closed valve state, and the second manual valve is used as the closed valve state, and the first manual valve and the first manual valve are The third manual valve is opened in the valve state, and the manual valve of the common flow path of the purge gas of the gas unit is opened.

藉此,在第四氣體單元內流動淨化氣體,進行第四氣體單元內的水分的除去。可充分除去水分,半導體製造裝置側的準備齊全之後,藉由關閉第三手動閥,開啟第二手動閥,可在第四氣體線路供給加工氣體。Thereby, the purge gas flows in the fourth gas unit, and the moisture in the fourth gas unit is removed. The water can be sufficiently removed, and after the preparation on the semiconductor manufacturing apparatus side is completed, the processing gas can be supplied to the fourth gas line by closing the third manual valve and opening the second manual valve.

如以上說明般,根據本發明的氣體供給集合單元,包括複數個氣體單元,其藉由流路塊以串聯一體的方式連結下列元件:第一手動閥,被設置在出口流路;第二手動閥,被設置在連通上述第一手動閥和加工氣體共通流路的位置;以及第三手動閥,被設置在連通上述第一手動閥和淨化氣體共通流路的位置;又,因為氣體供應集合單元更包括與加工氣體共通流路的端部連通的加工氣體共通流路端部手動閥、以及與淨化氣體共通流路的端部連通的淨化氣體共通流路端部手動閥,並不會對既存的氣體線路造成影響,亦即,可在進行半導體製造作業的情形下,進行新的氣體線路的增設作業。As described above, the gas supply assembly unit according to the present invention includes a plurality of gas units which are connected in series by means of a flow path block: the first manual valve is disposed at the outlet flow path; the second manual a valve disposed at a position communicating the first manual valve and the processing gas common flow path; and a third manual valve disposed at a position communicating the first manual valve and the purge gas common flow path; and, because of the gas supply set The unit further includes a machining gas common flow path end manual valve that communicates with an end portion of the processing gas common flow path, and a purge gas common flow path end manual valve that communicates with an end portion of the purge gas common flow path, and does not The existing gas line has an influence, that is, a new gas line can be added in the case of performing semiconductor manufacturing operations.

又,即使在增設作業終了後,因為既設的加工氣體共通流路和淨化氣體共通流路不會暴露於大氣,而可安裝新的氣體單元,可以短時間完成增設作業。Further, even after the completion of the additional operation, since the existing processing gas common flow path and the purge gas common flow path are not exposed to the atmosphere, a new gas unit can be installed, and the additional work can be completed in a short time.

又,因為氣體供給集合單元包括:導軌,以和上述氣體單元的氣體的流動成直角方向交叉而被設置複數個,且安裝氣體單元;另外的加工氣體共通流路端部手動閥,使增設的氣體單元與上述加工氣體共通流路端部手動閥連通;以及另外的淨化氣體共通流路端部手動閥,使增設的氣體單元與淨化氣體共通流路的端部連通的淨化氣體共通流路端部手動閥連通;所以,例如,即使在發生必須增設第五線路用的第五氣體單元的情形時,也可進行同樣的作業。Further, the gas supply assembly unit includes: a guide rail that is disposed at a right angle to the flow of the gas of the gas unit, and is provided with a plurality of gas units; and the other processing gas common flow path end manual valve is provided for additional The gas unit is in communication with the manual valve at the end of the processing gas common flow path; and the other purge gas common flow path end manual valve, the common gas flow channel end of the purge gas communicating with the end of the purge gas common flow path The manual valve is connected; therefore, for example, even when a fifth gas unit for the fifth line is required to be added, the same operation can be performed.

又,因為上述增設的氣體單元係具有用以連接既設的氣體供給集合單元的高度調整裝置,容易決定增設氣體單元的位置,增設作業的作業效率良好。Moreover, since the above-mentioned additional gas unit has a height adjusting device for connecting the existing gas supply collecting unit, it is easy to determine the position of the additional gas unit, and the work efficiency of the additional work is good.

其次說明有關具有在上述(4)至(6)所記載的構成的發明的作用效果。Next, the effects of the invention having the configuration described in the above (4) to (6) will be described.

通常與加工氣體共通流路的端部連通的加工氣體共通流路端部手動閥、以及與淨化氣體共通流路的端部連通的淨化氣體共通流路端部手動閥係在閉閥狀態。在增設新線路的時候,將增設的氣體單元與氣體的流動以直角方向交叉,安裝在被複數配置的導軌,使其在導軌上移動,而如下述般連接回路。The machining gas common flow path end manual valve that communicates with the end portion of the machining gas common flow path and the purge gas common flow path end manual valve that communicates with the end portion of the purge gas common flow path are normally closed. When a new line is added, the flow of the added gas unit and the gas intersects at right angles, and is mounted on the plurality of guide rails to move on the guide rail, and the loop is connected as follows.

首先,使既設線路的加工氣體共通流路端部手動閥的出口流路和增設線路的第二手動閥的入口流路藉由流路塊內的連通路連通,設置第三連通路。使既設線路的淨化氣體共通流路端部手動閥的出口流路和增設線路的第三手動閥的入口流路藉由流路塊內的連通路連通。既設線路的加工氣體共通流路端部手動閥的出口流路和增設線路的加工氣體共通流路端部手動閥的入口流路藉由管路連接,設置第二連通路。又,在增設作業前,增設線路的加工氣體共通流路端部手動閥的出口流路和增設線路的淨化氣體共通流路端部手動閥的出口流路藉由管路的第一連通路連接。如上述般連接回路之後,鎖緊連接螺栓、增設氣體單元的固定螺栓。First, the outlet flow path of the manual valve at the end of the processing gas common flow path of the existing line and the inlet flow path of the second manual valve of the additional line are communicated by the communication path in the flow path block, and the third communication path is provided. The outlet flow path of the manual valve at the end of the purge gas common flow path of the existing line and the inlet flow path of the third manual valve of the additional line are communicated by the communication path in the flow path block. The outlet flow path of the manual valve at the end of the processing gas common flow path of the existing line and the inlet flow path of the manual valve of the processing gas common flow end of the additional line are connected by a pipe, and a second communication path is provided. Further, before the additional operation, the outlet flow path of the manual valve at the end of the processing gas common flow path of the additional line and the outlet flow path of the purge gas common flow path end manual valve of the additional line are connected by the first communication path of the pipeline . After connecting the circuit as described above, lock the connecting bolt and add the fixing bolt of the gas unit.

藉此,將增設線路連接在既設線路之後,將增設線路的加工氣體共通流路端部手動閥、淨化氣體共通流路端部手動閥、第一手動閥、第二手動閥、以及第三手動閥作為開閥狀態,將既設線路的淨化氣體共通流路端部手動閥開閥。Thereby, after the additional line is connected to the existing line, the machining gas common flow path end manual valve, the purge gas common flow path end manual valve, the first manual valve, the second manual valve, and the third manual are added to the line. As a valve opening state, the valve will open the manual valve at the end of the common flow path of the purge gas of the line.

其次,將既設線路的淨化氣體手動閥開閥,在增設線路內,淨化氣體係自第三手動閥和第一手動閥的一方朝加工氣體出口流動。又,淨化氣體的另一方係自淨化氣體共通流路端部手動閥、加工氣體共通流路端部手動閥、第二手動閥、第一手動閥朝加工氣體出口流動。據此,在具有在上述(1)至(3)記載的構成的發明中,在淨化氣體不流動的回路也可充滿淨化氣體。雖然淨化氣體滯留的部份係在一部份發生,只需必要時間淨化,增設線路內的水分除去可大致完全地被進行。可充分除去水分,半導體製造裝置側的準備齊全後,藉由關閉增設線路的加工氣體共通流路端部手動閥、淨化氣體共通流路端部手動閥、以及第三手動閥,開啟既設線路的加工氣體共通流路端部手動閥,可在增設線路供給加工氣體。Next, the purge gas manual valve of the existing line is opened, and in the additional line, the purge gas system flows from the third manual valve and the first manual valve toward the processing gas outlet. Further, the other side of the purge gas flows from the purge gas common flow path end manual valve, the machining gas common flow path end manual valve, the second manual valve, and the first manual valve toward the machining gas outlet. According to this, in the invention having the configuration described in the above (1) to (3), the purge gas may be filled in the circuit in which the purge gas does not flow. Although the trapped portion of the purge gas occurs in a part, it takes only necessary time to purify, and the removal of moisture in the additional line can be performed substantially completely. The water can be sufficiently removed, and after the preparation of the semiconductor manufacturing apparatus side is completed, the processing gas common flow end end manual valve, the purge gas common flow path end manual valve, and the third manual valve are closed by opening the additional line, and the existing line is opened. The machining gas common flow end end manual valve can supply machining gas in the additional line.

又,藉由在既設線路的加工氣體共通流路端部手動閥、以及增設線路的加工氣體共通流路端部手動閥的內部分別形成兩個分岔的出口流路,淨化氣體也可分別在既設線路的加工氣體共通流路端部手動閥、以及增設線路的加工氣體共通流路端部手動閥的內部流動,淨化氣體的滯留部成為一點點。因而,增設線路內的水分除去可大致完全地被進行。Further, two separate outlet flow paths are formed in the manual valve at the end of the machining gas common flow path of the existing line and the manual valve at the end of the processing gas common flow path of the additional line, and the purge gas can also be respectively The manual valve of the processing gas common flow path end of the line and the internal flow of the machining gas common flow end end manual valve of the additional line are provided, and the retained portion of the purge gas becomes a little. Therefore, the removal of moisture in the additional line can be performed substantially completely.

如以上說明般,本發明的氣體供給集合單元包括複數個氣體單元,其藉由流路塊以一體連結下列元件:第一手動閥,被設置在出口流路;第二手動閥,被設置在連通上述第一手動閥和加工氣體共通流路的位置;以及第三手動閥,被設置在連通上述第一手動閥和淨化氣體共通流路的位置;又,因為氣體供給集合單元更包括:增設的氣體單元,具有與上述加工氣體共通流路端部手動閥連通的加工氣體共通流路端部手動閥、與上述淨化氣體共通流路端部連通的淨化氣體共通流路端部手動閥、與上述加工氣體共通流路端部手動閥連通的另外的加工氣體共通流路手動閥、與上述淨化氣體共通流路端部連通的另外的淨化氣體共通流路端部手動閥、以及與上述加工氣體共通流路端部手動閥連通的另外的第二手動閥;第一連通路,連通上述另外的淨化氣體共通流路端部手動閥的出口流路和上述另外的加工氣體共通流路端部手動閥的出口流路;第二連通路,連通上述另外的加工氣體共通流路端部手動閥的入口流路和上述加工氣體共通流路端部手動閥的出口流路;以及第三連通路,連通上述加工氣體共通流路端部手動閥的出口流路和上述另外的第二手動閥的入口流路;所以在增設線路而進行增設線路的淨化時,可在全部的回路充滿淨化氣體,以必要的時間進行淨化,增設氣體單元內的水分可大致被除去。As described above, the gas supply assembly unit of the present invention includes a plurality of gas units integrally connected to the following elements by a flow path block: a first manual valve is disposed at the outlet flow path; and a second manual valve is disposed at a position connecting the first manual valve and the processing gas common flow path; and a third manual valve disposed at a position connecting the first manual valve and the purge gas common flow path; and, because the gas supply assembly unit further includes: adding The gas unit includes a machining gas common flow end end manual valve that communicates with the machining gas common flow path end manual valve, and a purge gas common flow end end manual valve that communicates with the purge gas common flow path end portion, and a different processing gas common flow path manual valve that communicates with the manual valve at the end of the processing gas common flow path, another purge gas common flow path end manual valve that communicates with the purge gas common flow path end, and the processing gas a second second manual valve connected to the common flow end end manual valve; the first communication path communicating with the other common purge gas common flow path An outlet flow path of the manual valve and an outlet flow path of the manual valve at the end of the additional processing gas common flow path; a second communication path connecting the inlet flow path of the manual valve at the end of the additional processing gas common flow path and the above processing An outlet flow path of the manual valve at the end of the gas common flow path; and a third communication path connecting the outlet flow path of the manual valve end of the processing gas common flow path and the inlet flow path of the other second manual valve; When the line is cleaned by the additional line, the entire circuit can be filled with the purge gas, and the purge can be performed for a necessary period of time, and the moisture in the additional gas unit can be substantially removed.

又,因為本發明的氣體供給集合單元係藉由在上述加工氣體共通流路端部手動閥的內部形成兩個分岔的出口流路,且在上述增設氣體單元的上述另外的加工氣體共通流路端部手動閥的內部形成兩個分岔的出口流路,所以在增設線路而進行增設線路的淨化時,淨化氣體可分別流通至既設線路的加工氣體共通流路端部手動閥、以及增設線路的加工氣體共通流路端部手動閥的內部,不需花費時間,而可幾乎將增設氣體單元內的水分完全地除去。Further, the gas supply assembly unit of the present invention forms two branch outlet flow paths inside the manual valve at the end of the processing gas common flow path, and the above-mentioned additional processing gas common flow in the additional gas unit The inside of the road end manual valve forms two branching outlet flow paths. Therefore, when the additional line is added to purify the additional line, the purge gas can be separately distributed to the end of the common flow path of the processing gas of the existing line, and the additional valve is added. The inside of the manual valve of the processing gas common flow path of the line does not take time, and the moisture in the additional gas unit can be almost completely removed.

又,因為本發明的氣體供給集合單元係被設置為,使上述第一連通路在上述另外的淨化氣體共通流路端部手動閥的出口流路以及上述另外的加工氣體共通流路端部手動閥的上述兩個分岔的出口流路的兩方連通,使上述第二連通路在上述另外的加工氣體共通流路端部手動閥的入口流路以及上述加工氣體共通流路端部手動閥的上述兩個分岔的出口流路的一方連通,使上述第三連通路在上述加工氣體共通流路端部手動閥的上述兩個分岔的出口流路的另一方以及上述另外的第二手動閥的入口流路連通,所以可將淨化氣體分別流動至既設線路的加工氣體共通流路端部手動閥、增設線路的加工氣體共通流路端部手動閥的內部為止、以及全部的流路。因而,淨化不需花費時間,而可將增設氣體單元內的水分幾乎完全地除去。Further, the gas supply collecting unit of the present invention is provided such that the first communication passage is manually connected to the outlet flow path of the manual valve at the end of the additional purge gas common flow path and the end of the common processing gas common flow path Two outlets of the two branch outlets of the valve are communicated such that the second communication passage is at the inlet flow path of the manual valve at the end of the additional processing gas common flow path and the manual valve of the machining gas common flow end One of the two branch outlet flow paths communicates with the third communication passage at the other of the two branch outlet flow paths of the machining gas common flow path end manual valve and the other second Since the inlet flow path of the manual valve is connected, the purge gas can be separately flown to the end of the machining gas common flow end manual valve of the existing line, the inside of the machining gas common flow end end manual valve of the additional line, and all the flow paths. . Therefore, it takes no time to purify, and the moisture in the additional gas unit can be almost completely removed.

以下說明有關本發明的氣體供應集合單元的實施例。Embodiments of the gas supply assembly unit relating to the present invention are explained below.

[第一實施例][First Embodiment]

以下參考圖面說明有關本發明的氣體供應集合單元的第一實施例。在第1圖中,表示由進行加工氣體的供給至既設的兩線路的第一氣體單元A、第二氣體單元B所構成的氣體供給集合單元的回路圖、以及用以另外增設的增設氣體單元C的回路圖。如第1圖所示,自靠近加工氣體供給口18依序配置第一氣體單元A、第二氣體單元B、增設氣體單元C。A first embodiment of the gas supply assembly unit relating to the present invention will be described below with reference to the drawings. In the first drawing, a circuit diagram of a gas supply assembly unit including a first gas unit A and a second gas unit B for supplying a machining gas to two existing lines, and an additional gas unit for additional addition are shown. Circuit diagram of C. As shown in FIG. 1, the first gas unit A, the second gas unit B, and the additional gas unit C are disposed in order from the processing gas supply port 18.

加工氣體氣動閥17係經由加工氣體供給口18與未圖示的加工氣體艙連接。加工氣體氣動閥17係經由加工氣體共通流路15與第二手動閥13A、13B的一方的口(port)連接。The machining gas pneumatic valve 17 is connected to a machining gas tank (not shown) via a machining gas supply port 18. The machining gas pneumatic valve 17 is connected to one port of the second manual valves 13A and 13B via the machining gas common flow path 15.

第二手動閥13A、13B的另一口係連接在第一手動閥11A、11B。第一手動閥11A、11B的出口係與加工氣體出口10A、10B連通。在使第二手動閥13A、13B和第一手動閥11A、11B連通的流路,壓力計12A、12B被連接。The other port of the second manual valves 13A, 13B is connected to the first manual valves 11A, 11B. The outlets of the first manual valves 11A, 11B are in communication with the process gas outlets 10A, 10B. The pressure gauges 12A, 12B are connected to the flow path that connects the second manual valves 13A, 13B and the first manual valves 11A, 11B.

又,淨化氣體手動閥20係經由淨化氣體供給口21與未圖示的淨化氣體艙連接。淨化氣體手動閥20係經由逆止閥19、淨化氣體共通流路16與第三手動閥14A、14B的一方的口(port)連接。第三手動閥14A、14B的另一口係連接在第一手動閥11A、11B。Further, the purge gas manual valve 20 is connected to a purge gas tank (not shown) via the purge gas supply port 21. The purge gas manual valve 20 is connected to one port of the third manual valves 14A and 14B via the check valve 19 and the purge gas common flow path 16. The other port of the third manual valves 14A, 14B is connected to the first manual valves 11A, 11B.

加工氣體共通流路15的端部係藉由加工氣體共通流路端部手動閥22而被封止。又,淨化氣體共通流路16的端部係藉由淨化氣體共通流路端部手動閥23而被封止。The end of the machining gas common flow path 15 is sealed by the machining gas common flow path end manual valve 22. Further, the end portion of the purge gas common flow path 16 is sealed by the purge gas common flow path end manual valve 23.

第2圖係以平面圖表示將此回路作為具體化的機器的設置狀態。兩個導軌26、27係兩端藉由導軌固定棒41、29而被平行地固定。沿著導軌26、27,單元固定板28、29、30係以可在橫方向平行移動的方式被安裝。在加工氣體用單元固定板28,加工氣體氣動閥17係被固定。在淨化氣體用單元固定板29,淨化氣體手動閥20和逆止閥19係被固定。Fig. 2 is a plan view showing the arrangement state of this circuit as an actualized machine. Both ends of the two guide rails 26, 27 are fixed in parallel by the rail fixing bars 41, 29. The unit fixing plates 28, 29, 30 are mounted along the guide rails 26, 27 so as to be movable in parallel in the lateral direction. The machining gas pneumatic valve 17 is fixed to the machining gas unit fixing plate 28. In the purge gas unit fixing plate 29, the purge gas manual valve 20 and the check valve 19 are fixed.

在第一氣體單元A中的第一氣體單元固定板30A,自上連結第一手動閥11A、壓力計12A、管路38A,固定第三手動閥14A、第二手動閥13A。相同地,在第二氣體單元B中的第二氣體單元固定板30B,從上連結第一手動閥11B、壓力計12B、管路38B,固定第三手動閥14B、第二手動閥13B,且在稍微偏向右側的位置固定既設的加工氣體共通流路端部手動閥22。又,避開管路38B而在稍微偏向右側的位置固定既設的淨化氣體共通流路端部手動閥23。The first gas unit fixing plate 30A in the first gas unit A is connected to the first manual valve 11A, the pressure gauge 12A, and the line 38A from above, and fixes the third manual valve 14A and the second manual valve 13A. Similarly, the second gas unit fixing plate 30B in the second gas unit B connects the first manual valve 11B, the pressure gauge 12B, and the line 38B from above, and fixes the third manual valve 14B and the second manual valve 13B, and The existing machining gas common flow path end manual valve 22 is fixed at a position slightly offset to the right side. Further, the purge gas common flow path end manual valve 23 is fixed at a position slightly offset to the right side away from the line 38B.

從自這些既設的氣體單元稍微分離,增設的增設氣體單元C係被固定在增設氣體單元固定板30C上。亦即,在增設氣體單元固定板30C,從上連結第一手動閥11C、壓力計12C、管路38C,固定第三手動閥14C、第二手動閥13C,且在稍微偏向右側的位置固定既設的加工氣體共通流路端部手動閥24。又,避開管路38C而在稍微偏向右側的位置固定淨化氣體共通流路端部手動閥25。The additional gas unit C is slightly fixed from the existing gas unit, and is attached to the additional gas unit fixing plate 30C. In other words, the gas unit fixing plate 30C is additionally provided, and the first manual valve 11C, the pressure gauge 12C, and the line 38C are connected from above, and the third manual valve 14C and the second manual valve 13C are fixed, and are fixed at positions slightly shifted to the right side. The machining gas shares the flow path end manual valve 24. Further, the purge gas common flow path end manual valve 25 is fixed at a position slightly offset to the right side away from the line 38C.

又,在增設氣體單元固定板30C的加工氣體共通流路端部手動閥24的位置,缺口部34係被形成,在淨化氣體共通流路端部手動閥25的位置,缺口部35係被形成。Further, the notch portion 34 is formed at the position of the machining gas common flow path end manual valve 24 of the gas unit fixing plate 30C, and the notch portion 35 is formed at the position of the purge gas common flow path end manual valve 25. .

第3圖表示第2圖的AA剖面圖。管路形狀的加工氣體共通流路15係經由中繼塊42而與在V流路塊32A被形成的V流路321A連通。V流路321A係通到手動閥入口流路131A,且經由手動閥的閥室與藉由手動閥連通路133A與在V流路塊32B被形成的V流路321B連通。因此,不論第二手動閥13A的開閉,手動閥入口流路131A和手動閥連通路133A係經常連通。Fig. 3 is a cross-sectional view taken along line AA of Fig. 2; The process gas common flow path 15 of the pipe shape communicates with the V flow path 321A formed in the V flow path block 32A via the relay block 42. The V flow path 321A is connected to the manual valve inlet flow path 131A, and the valve chamber via the manual valve communicates with the V flow path 321B formed in the V flow path block 32B via the manual valve communication path 133A. Therefore, regardless of the opening and closing of the second manual valve 13A, the manual valve inlet flow path 131A and the manual valve communication path 133A are constantly in communication.

第三手動閥的出口流路132A係與在流路塊33A被形成的加工氣體出口流路331A連通。The outlet flow path 132A of the third manual valve communicates with the machining gas outlet flow path 331A formed in the flow path block 33A.

因為第二氣體單元B的流路構成係與第一氣體單元A的流路構成大致相同,省略其說明。僅說明不同點。Since the flow path configuration of the second gas unit B is substantially the same as the flow path configuration of the first gas unit A, the description thereof will be omitted. Only explain the differences.

第4圖係表示第2圖的BB剖面圖。第二手動閥13B的手動閥連通路133B係經由在流路塊36B被形成的流路361B,與加工氣體共通流路端部手動閥22的入口流路22a連通。又,加工氣體共通流路端部手動閥22的出口流路22b係經由在流路塊37B被形成的流路371B,與在第2圖所示的中繼孔37a連通。Fig. 4 is a cross-sectional view taken along line BB of Fig. 2; The manual valve communication passage 133B of the second manual valve 13B communicates with the inlet flow passage 22a of the machining gas common flow passage end manual valve 22 via the flow passage 361B formed in the flow passage block 36B. Further, the outlet flow path 22b of the machining gas common flow path end manual valve 22 communicates with the relay hole 37a shown in Fig. 2 via the flow path 371B formed in the flow path block 37B.

另一方面,在固定增設的增設氣體單元C的增設氣體單元固定板30C的下側、導軌26的上側挾持高度調整板31。因為增設氣體單元固定板30C的凹陷部34的圖係不易看,僅記載缺口部34,應可在對面側所見的部份則省略記載。On the other hand, the height adjustment plate 31 is held on the lower side of the additional gas unit fixing plate 30C to which the additional gas unit C is added and the upper side of the guide rail 26. Since the drawing of the recessed portion 34 of the gas unit fixing plate 30C is not easily seen, only the notch portion 34 is described, and the portion that can be seen on the opposite side is omitted.

因為淨化氣體共通流路端部手動閥、增設氣體單元C的淨化氣體共通流路端部手動閥25的構造係與如第4圖所示的構造大致相同,省略說明。不同點係為被形成與淨化氣體共通流路端部手動閥23的出口流路連通的流路的流路塊39係在第2圖的下側方向延設,在其上面,用以與第三手動閥14C的入口流路連通的中繼孔39a係被形成。The structure of the purge gas common flow end end manual valve and the purge gas common flow path end manual valve 25 of the additional gas unit C is substantially the same as the structure shown in FIG. 4, and the description thereof is omitted. The flow path block 39 which is formed in a flow path which is formed to communicate with the outlet flow path of the purge gas common flow path end manual valve 23 is extended in the lower direction of the second drawing, and is used for the A relay hole 39a that communicates with the inlet flow path of the three manual valve 14C is formed.

其次,增設氣體單元固定板30C靠近在第二氣體單元固定板30B,使中繼孔37a和增設氣體單元C的第二手動閥13C的手動閥入口流路131C的孔位置在第2圖的平面方向一致。在此狀態中,與第3圖對應的剖面圖係在第5圖表示。中繼孔37a和手動閥入口流路131C在高度方向,僅以高度調整板31的厚度分離。又,與第4圖對應的剖面圖係在第6圖表示。流路塊37B係藉由進入缺口部34的空間,第5圖的位置關係被實現。Next, the additional gas unit fixing plate 30C is placed close to the second gas unit fixing plate 30B, and the hole position of the manual valve inlet flow path 131C of the relay hole 37a and the second manual valve 13C of the additional gas unit C is in the plane of Fig. 2 The direction is the same. In this state, the cross-sectional view corresponding to Fig. 3 is shown in Fig. 5. The relay hole 37a and the manual valve inlet flow path 131C are separated by the thickness of the height adjustment plate 31 in the height direction. Further, a cross-sectional view corresponding to Fig. 4 is shown in Fig. 6. The flow path block 37B is realized by entering the space of the notch portion 34, and the positional relationship of Fig. 5 is realized.

在此狀態下,取下高度調整板31。然後,藉由未圖示的螺栓固定。藉此,中繼孔37a和增設氣體單元C的第二手動閥13C的手動閥入口流路131C係被連通。In this state, the height adjustment plate 31 is removed. Then, it is fixed by a bolt (not shown). Thereby, the relay hole 37a and the manual valve inlet flow path 131C of the second manual valve 13C to which the gas unit C is added are communicated.

如上述,增設氣體單元C的安裝作業完成。其次,將增設氣體單元C的新的加工氣體共通流路端部手動閥24和淨化氣體共通流路端部手動閥25作為閉閥狀態,將第二手動閥13C作為閉閥狀態,將第一手動閥11C和第三手動閥14C作為開閥狀態,將第二氣體單元B的淨化氣體共通流路端部手動閥23作為開閥。As described above, the installation work of the additional gas unit C is completed. Next, the new machining gas common flow path end manual valve 24 and the purge gas common flow path end manual valve 25 in which the gas unit C is added are in a closed state, and the second manual valve 13C is in a closed state, and the first The manual valve 11C and the third manual valve 14C are in an open state, and the purge gas common flow path end manual valve 23 of the second gas unit B is opened.

藉此,在增設氣體單元C內流動淨化氣體,進行增設氣體單元C內的水分的除去。水分可充分除去,半導體製造裝置側的準備齊全後,藉由關閉第三手動閥14C,開啟第二手動閥13C,可在第三氣體線路供給加工氣體。Thereby, the purge gas flows in the additional gas unit C, and the moisture in the additional gas unit C is removed. The moisture can be sufficiently removed, and after the semiconductor manufacturing apparatus side is completely prepared, the third manual valve 14C is closed, and the second manual valve 13C is opened to supply the machining gas to the third gas line.

如以上說明般,根據本發明的氣體供給集合單元,包括複數個氣體單元,其藉由流路塊以串聯一體的方式連結下列元件:第一手動閥11A、11B,被設置在出口流路;第二手動閥13A、13B,被設置在連通第一手動閥11A、11B和加工氣體共通流路15的位置;以及第三手動閥14A、14B,被設置在連通第一手動閥11A、11B和淨化氣體共通流路16的位置;又,因為氣體供應集合單元更包括與加工氣體共通流路15的端部連通的加工氣體共通流路端部手動閥22、以及與淨化氣體共通流路16的端部連通的淨化氣體共通流路端部手動閥23,並不會對既存的氣體線路造成影響,亦即,可在進行半導體製造作業的情況下,進行新的氣體線路的增設作業。As described above, the gas supply assembly unit according to the present invention includes a plurality of gas units which are connected in series by means of a flow path block to integrally connect the following elements: the first manual valves 11A, 11B are disposed in the outlet flow path; The second manual valves 13A, 13B are disposed at positions that communicate the first manual valves 11A, 11B and the process gas common flow path 15; and the third manual valves 14A, 14B are disposed to communicate with the first manual valves 11A, 11B and The position of the purge gas common flow path 16; further, because the gas supply assembly unit further includes a machining gas common flow path end manual valve 22 communicating with the end of the process gas common flow path 15, and a common flow path 16 with the purge gas The purge gas common flow path end manual valve 23 that is connected to the end portion does not affect the existing gas line, that is, a new gas line can be added to the semiconductor manufacturing operation.

又,根據本發明的氣體供給集合單元,因為被暴露於大氣的配管係只有在第9圖中以斜線顯示的部份,既設的加工氣體共通流路15和淨化氣體共通流路16不會暴露於大氣,而可安裝新的氣體單元C,可以短時間完成增設作業。Further, according to the gas supply assembly unit of the present invention, since the piping system exposed to the atmosphere is only the portion shown by oblique lines in Fig. 9, the existing processing gas common flow path 15 and the purge gas common flow path 16 are not exposed. In the atmosphere, a new gas unit C can be installed, and the additional work can be completed in a short time.

又,因為氣體供給集合單元包括:導軌26、27,以和氣體單元的氣體的流動成直角方向交叉而被設置複數個,且安裝氣體單元:另外的加工氣體共通流路端部手動閥24,使增設的氣體單元C與上述加工氣體共通流路端部手動閥22連通;以及另外的淨化氣體共通流路端部手動閥25,使增設的氣體單元C與淨化氣體共通流路的端部連通的淨化氣體共通流路端部手動閥23連通;所以,例如,即使在發生必須增設第四線路用的第四氣體單元的場合,亦可進行同樣的作業。Further, since the gas supply assembly unit includes the guide rails 26 and 27, a plurality of the gas guide units are disposed at right angles to the flow of the gas of the gas unit, and the gas unit is mounted: another processing gas common flow path end manual valve 24, The additional gas unit C is connected to the processing gas common flow path end manual valve 22; and the additional purge gas common flow path end manual valve 25 connects the additional gas unit C to the end of the purge gas common flow path The purge gas common flow path end manual valve 23 is in communication; therefore, for example, even when a fourth gas unit for the fourth line needs to be added, the same operation can be performed.

又,因為增設的增設氣體單元C係具有用以連接既設的氣體供給集合單元的高度調整板31,容易決定增設氣體單元的位置,增設作業的作業效率良好。Further, since the additional gas unit C to be installed has the height adjusting plate 31 for connecting the gas supply unit to be provided, it is easy to determine the position at which the gas unit is added, and the work efficiency of the additional work is good.

[第二實施例][Second embodiment]

其次,說明本發明的第二實施例。因為第二實施例的氣體供應集合單元的構成及作用效果係與第一實施例大致相同,僅說明不同點,而其他部份則省略。Next, a second embodiment of the present invention will be described. Since the configuration and operational effects of the gas supply assembly unit of the second embodiment are substantially the same as those of the first embodiment, only differences will be described, and other portions will be omitted.

與第5圖對應的圖面在第7圖表示,與第6圖對應的圖面在第8圖表示。The drawing corresponding to Fig. 5 is shown in Fig. 7, and the drawing corresponding to Fig. 6 is shown in Fig. 8.

在第7和8圖中,在單元固定板28、29、第一氣體單元固定板30A、第二氣體單元固定板30B的下方分別安裝高度調整板40、40A、40B。在增設氣體單元固定板30C的下方,原先高度調整板係不被安裝。In the seventh and eighth drawings, the height adjustment plates 40, 40A, 40B are attached to the lower portions of the unit fixing plates 28, 29, the first gas unit fixing plate 30A, and the second gas unit fixing plate 30B, respectively. Below the additional gas unit fixing plate 30C, the original height adjusting plate is not mounted.

又,在第7和8圖中,流路塊37B並非被安裝在第二氣體單元固定板30B,而被安裝在增設氣體單元固定板30C。Further, in the seventh and eighth figures, the flow path block 37B is not attached to the second gas unit fixing plate 30B, but is attached to the additional gas unit fixing plate 30C.

在第7和8圖的狀態決定位置後,藉由在增設氣體單元固定板30C的下面挾持未圖示的高度調整板40C,使形成在流路塊37B的開口與加工氣體共通流路端部手動閥22的輸出口連通。After the state of the seventh and eighth states is determined, the height adjustment plate 40C (not shown) is held under the additional gas cell fixing plate 30C, so that the opening formed in the flow path block 37B and the end of the processing gas common flow path are formed. The output port of the manual valve 22 is connected.

又,雖然已說明關於本發明的實施型態,但本發明並不限定於上述實施型態,可能有各種應用。Further, although the embodiment of the present invention has been described, the present invention is not limited to the above embodiment, and various applications are possible.

例如,安裝可得知至少開啟過一次加工氣體共通流路手動閥22的機構即可。通常為了藉由加工氣體共通流路手動閥22封止且安全,也在中繼孔16a作中止栓。在此場合,即使不小心打開加工氣體共通流路端部手動閥22,因為中繼孔16a被封止,加工氣體不會漏至外部。然而,在增設作業時,作業之時自加工氣體共通流路端部手動閥22的輸出口至中繼孔16a的空間中存在著殘存的加工氣體漏至外部的危險性。為了防止此種情形,即使安裝加工氣體共通流路端部手動閥22被開啟過一次、其後被關閉、只要裝有自外部可加以確認的機構,即可提高安全性。For example, it is sufficient to install a mechanism that knows that the machining gas common flow path manual valve 22 is opened at least once. Usually, in order to be sealed and safe by the machining gas common flow path manual valve 22, the relay hole 16a is also used as a stop bolt. In this case, even if the machining gas common flow path end manual valve 22 is accidentally opened, since the relay hole 16a is sealed, the machining gas does not leak to the outside. However, at the time of the additional work, there is a risk that the remaining machining gas leaks to the outside from the output port of the machining gas common flow end end manual valve 22 to the space of the relay hole 16a at the time of the operation. In order to prevent such a situation, even if the machining gas common flow path end manual valve 22 is opened once and then closed, as long as a mechanism that can be confirmed from the outside is installed, safety can be improved.

[第三實施例][Third embodiment]

其次,關於本發明的氣體供給集合單元的第三實施例參照圖面進行說明。在第10圖中,表示由進行供給加工氣體至既設的線路的氣體單元A構成的氣體供給集合單元的回路圖、以及為了在此增設的增設氣體單元C的回路圖。Next, a third embodiment of the gas supply assembly unit of the present invention will be described with reference to the drawings. In the tenth diagram, a circuit diagram of a gas supply assembly unit including a gas unit A for supplying a machining gas to an existing line, and a circuit diagram for an additional gas unit C added thereto are shown.

加工氣體氣動閥17係經由加工氣體供給口18與未圖示的加工氣體艙連接。加工氣體氣動閥17係經由加工氣體共通流路15與第二手動閥13A的一方的口連接。第二手動閥13A的另一口係在第一手動閥11A連接。第一手動閥11A的出口係與加工氣體出口10A連通。在第二手動閥13A和第一手動閥11A被連通的流路,壓力計12A係被連通。The machining gas pneumatic valve 17 is connected to a machining gas tank (not shown) via a machining gas supply port 18. The machining gas pneumatic valve 17 is connected to one port of the second manual valve 13A via the machining gas common flow path 15. The other port of the second manual valve 13A is connected to the first manual valve 11A. The outlet of the first manual valve 11A is in communication with the process gas outlet 10A. The pressure gauge 12A is connected to the flow path in which the second manual valve 13A and the first manual valve 11A are communicated.

又,淨化氣體手動閥20係經由淨化氣體供給口21與未圖示的淨化氣體艙連接。淨化氣體手動閥20係經由逆止閥19、淨化氣體共通流路16與第三手動閥14A的一方的口(port)連接。第三手動閥14A的另一口係連接在第一手動閥11A。加工氣體共通流路15的端部係藉由加工氣體共通流路端部手動閥22而被封止。又,淨化氣體共通流路16的端部係藉由淨化氣體共通流路端部手動閥23而被封止。Further, the purge gas manual valve 20 is connected to a purge gas tank (not shown) via the purge gas supply port 21. The purge gas manual valve 20 is connected to one port of the third manual valve 14A via the check valve 19 and the purge gas common flow path 16. The other port of the third manual valve 14A is connected to the first manual valve 11A. The end of the machining gas common flow path 15 is sealed by the machining gas common flow path end manual valve 22. Further, the end portion of the purge gas common flow path 16 is sealed by the purge gas common flow path end manual valve 23.

第11圖係以平面圖表示將此回路作為具體化的機器的設置狀態。兩個導軌26、27係兩端藉由導軌固定棒41、45而被平行地固定。沿著導軌26、27,單元固定板28、29、30A係以可在橫方向平行移動的方式被安裝。在加工氣體用單元固定板28,加工氣體氣動閥17係被固定。在淨化氣體用單元固定板29,淨化氣體手動閥20和逆止閥19係被固定。Fig. 11 is a plan view showing the arrangement state of this circuit as an actualized machine. Both ends of the two guide rails 26, 27 are fixed in parallel by the rail fixing bars 41, 45. The unit fixing plates 28, 29, 30A are mounted along the guide rails 26, 27 so as to be movable in parallel in the lateral direction. The machining gas pneumatic valve 17 is fixed to the machining gas unit fixing plate 28. In the purge gas unit fixing plate 29, the purge gas manual valve 20 and the check valve 19 are fixed.

在第一氣體單元固定板30A,自上連結第一手動閥11A、壓力計12A、管路38A,固定第三手動閥14A、第二手動閥13A,且在稍微偏向右側的位置固定既設的加工氣體共通流路端部手動閥22。又,避開管路38A而在稍微偏向右側的位置固定既設的淨化氣體共通流路端部手動閥23。In the first gas unit fixing plate 30A, the first manual valve 11A, the pressure gauge 12A, and the line 38A are connected from above, and the third manual valve 14A and the second manual valve 13A are fixed, and the existing machining is fixed at a position slightly biased to the right. The gas common flow path end manual valve 22. Further, the purge gas common flow path end manual valve 23 is fixed at a position slightly offset to the right side away from the line 38A.

自這些既設的氣體單元稍微分離,增設的增設氣體單元C係被固定在增設氣體單元固定板30C上。亦即,在增設氣體單元固定板30C,自上連結第一手動閥11C、壓力計12C、管路38C,固定第三手動閥14C、第二手動閥13C,且在稍微偏向右側的位置固定既設的加工氣體共通流路端部手動閥24。又,避開管路38C而在稍微偏向右側的位置固定淨化氣體共通流路端部手動閥25。加工氣體共通流路端部手動閥24和淨化氣體共通流路端部手動閥25係以管路的第一連通路52被連結。Since the existing gas units are slightly separated, the additional gas unit C to be added is fixed to the additional gas unit fixing plate 30C. In other words, the gas unit fixing plate 30C is additionally provided, and the first manual valve 11C, the pressure gauge 12C, and the line 38C are connected from above, and the third manual valve 14C and the second manual valve 13C are fixed, and are fixed at positions slightly shifted to the right side. The machining gas shares the flow path end manual valve 24. Further, the purge gas common flow path end manual valve 25 is fixed at a position slightly offset to the right side away from the line 38C. The machining gas common flow path end manual valve 24 and the purge gas common flow path end manual valve 25 are connected by the first communication passage 52 of the pipeline.

如上述般,自既設氣體單元稍微分離、而自配置增設的增設氣體單元C的狀態,如下述般進行增設氣體單元C的安裝作業。首先,將增設氣體單元固定板30C靠近在第一氣體單元A的固定板30A,如第14和15圖所示,加工氣體共通流路端部手動閥22的出口流路22b和增設氣體單元C的第二手動閥13C的入口流路51(參考第12圖)藉由流路塊37A連通。亦即,加工氣體共通流路端部手動閥22的出口流路22b係在流路塊37A內,使其由U字流路的流路371A、流路373A連通在流路372A,流路372A係與第二手動閥13C的入口流路51連通。同樣地,如第12和13圖所示,使淨化氣體共通流路端部手動閥23的未圖示的出口流路和增設氣體單元C的第三手動閥14C的未圖示的入口流路藉由流路塊58的流路56、流路55、以及流路57連通。其次,如第14和15圖所示,和加工氣體共通流路端部手動閥22的出口流路22b連通的流路371A、以及和增設氣體單元C的加工氣體共通流路端部手動閥24的入口流路24a連通的流路361C係藉由管路的第二連通路59被連結。又,在增設氣體單元C的安裝作業前,加工氣體共通流路端部手動閥24的出口流路24b係在流路塊37C內與出口流路24b連通的流路371C、以及水平方向的流路373C連通、自流路373C被連結在管路的第一連通路52。同樣地,如第12和13圖所示,淨化氣體共通流路端部手動閥25的出口流路54係由流路塊47內的流路53而被連結在管路52。As described above, the installation operation of the additional gas unit C is performed as follows, from the state in which the gas unit C is slightly separated and the additional gas unit C is added. First, the additional gas unit fixing plate 30C is brought close to the fixing plate 30A of the first gas unit A, as shown in Figs. 14 and 15, the outlet flow path 22b of the machining gas common flow path end manual valve 22 and the additional gas unit C The inlet flow path 51 (refer to Fig. 12) of the second manual valve 13C is connected by the flow path block 37A. In other words, the outlet flow path 22b of the machining gas common flow path end manual valve 22 is connected to the flow path block 37A so that the flow path 371A of the U-shaped flow path and the flow path 373A communicate with each other in the flow path 372A, and the flow path 372A It is in communication with the inlet flow path 51 of the second manual valve 13C. Similarly, as shown in Figs. 12 and 13, an outlet flow path (not shown) of the purge gas common flow path end manual valve 23 and a third manual valve 14C of the additional gas unit C are provided. The flow path 56, the flow path 55, and the flow path 57 of the flow path block 58 communicate with each other. Next, as shown in Figs. 14 and 15, the flow path 371A communicating with the outlet flow path 22b of the machining gas common flow path end manual valve 22, and the machining gas common flow path end manual valve 24 of the additional gas unit C are provided. The flow path 361C that the inlet flow path 24a communicates with is connected by the second communication path 59 of the pipe. Further, before the installation operation of the additional gas unit C, the outlet flow path 24b of the machining gas common flow path end manual valve 24 is a flow path 371C that communicates with the outlet flow path 24b in the flow path block 37C, and a flow in the horizontal direction. The path 373C is connected and the self-flow path 373C is connected to the first communication path 52 of the pipeline. Similarly, as shown in Figs. 12 and 13, the outlet flow path 54 of the purge gas common flow path end manual valve 25 is connected to the flow line 52 by the flow path 53 in the flow path block 47.

藉由上述,增設氣體單元C的安裝作業完成。其次,將增設氣體單元C的新的加工氣體共通流路端部手動閥24、淨化氣體共通流路端部手動閥25、第二手動閥13C、第一手動閥11C、以及第三手動閥14C作為開閥狀態,將既設氣體單元的淨化氣體共通流路端部手動閥23和淨化氣體手動閥20開閥。By the above, the installation work of the additional gas unit C is completed. Next, a new processing gas common flow path end manual valve 24, a purge gas common flow path end manual valve 25, a second manual valve 13C, a first manual valve 11C, and a third manual valve 14C of the gas unit C are added. In the valve opening state, the purge gas common flow path end manual valve 23 and the purge gas manual valve 20 of the gas unit are opened.

藉此,在增設氣體單元C內流動淨化氣體,進行增設氣體單元C內的水分的除去。淨化氣體的流動和淨化氣體的滯留部在以下的圖面中表示。亦即,表示第12圖的構成的平面圖、表示取下第13圖的機器的下部的流路塊的平面圖、表示第14圖的加工氣體共通流路端部手動閥22、24和流路塊36、37剖面圖、以及表示取下第15圖的機器的下部的流路塊的立體圖。Thereby, the purge gas flows in the additional gas unit C, and the moisture in the additional gas unit C is removed. The flow of the purge gas and the retention portion of the purge gas are shown in the following figures. That is, a plan view showing the configuration of Fig. 12, a plan view showing a flow path block in which the lower portion of the apparatus of Fig. 13 is removed, and a machining gas common flow path end manual valve 22, 24 and a flow path block shown in Fig. 14. 36 and 37 are cross-sectional views and perspective views showing the flow path blocks of the lower portion of the machine in Fig. 15 .

以下說明淨化氣體的流動。將淨化氣體手動閥20開閥,在增設氣體單元C內,流動淨化氣體時,自未圖示的淨化氣體艙經由淨化氣體供給口21、淨化氣體手動閥20、逆止閥19、淨化氣體共通流路16,自淨化氣體共通流路端部手動閥23而在第三手動閥14C和淨化氣體共通流路端部手動閥25分岔而流動。在第三手動閥14C流動的淨化氣體係自第一手動閥11C流動至加工氣體出口10C。The flow of the purge gas will be described below. When the purge gas manual valve 20 is opened, in the additional gas unit C, when the purge gas flows, the purge gas tank (not shown) is passed through the purge gas supply port 21, the purge gas manual valve 20, the check valve 19, and the purge gas. The flow path 16 flows from the purge gas common flow path end manual valve 23 to the third manual valve 14C and the purge gas common flow path end manual valve 25. The purge gas system flowing at the third manual valve 14C flows from the first manual valve 11C to the process gas outlet 10C.

又,在淨化氣體共通流路端部手動閥25流動的淨化氣體係在管路的第一連通路52、加工氣體共通流路端部手動閥24、管路的第二連通路59、流路塊37A內的U字流路的水平方向的第三連通路373A、以及垂直方向的流路372A流動。在流路372A流動的淨化氣體係經由第二手動閥13C的入口流路51、第二手動閥13C、第一手動閥11C,而流至加工氣體出口10C。Further, the purified gas system flowing through the manual valve 25 at the end portion of the purge gas common flow path is in the first communication path 52 of the line, the manual valve 24 at the end of the processing gas common flow path, the second communication path 59 of the line, and the flow path. The third communication path 373A in the horizontal direction and the flow path 372A in the vertical direction of the U-shaped flow path in the block 37A flow. The purge gas system flowing through the flow path 372A flows to the process gas outlet 10C via the inlet flow path 51 of the second manual valve 13C, the second manual valve 13C, and the first manual valve 11C.

藉此,在增設氣體單元C內流動淨化氣體,如第14和15圖所示,淨化氣體滯留的部份係在一部份的流路發生。然而,即使淨化氣體滯留,因為和淨化氣體的流動連通,只需必要時間流動淨化氣體,可進行增設氣體單元C內的水分除去。可充分除去水分,半導體製造裝置側的準備齊全之後,藉由關閉加工氣體共通流路端部手動閥24、淨化氣體共通流路端部手動閥25、以及第三手動閥14C,開啟加工氣體共通流路端部手動閥22,可在第二線路供給加工氣體。Thereby, the purge gas flows in the additional gas unit C. As shown in Figs. 14 and 15, the portion in which the purge gas is retained is generated in a part of the flow path. However, even if the purge gas is retained, since it is in communication with the flow of the purge gas, it is only necessary to flow the purge gas for a necessary time, and the moisture in the additional gas unit C can be removed. The water can be sufficiently removed, and after the semiconductor manufacturing apparatus side is completely prepared, the processing gas common flow end end manual valve 24, the purge gas common flow path end manual valve 25, and the third manual valve 14C are closed to open the common processing gas. The flow path end manual valve 22 can supply the machining gas on the second line.

如以上詳細說明般,根據第三實施例的氣體供給集合單元,其中包括複數個氣體單元,其藉由流路塊以一體連結下列元件:第一手動閥11A、11B,被設置在出口流路;第二手動閥13A、13B,被設置在連通第一手動閥11A、11B和加工氣體共通流路15的位置;以及第三手動閥14A、14B,被設置在連通第一手動閥11A、11B和淨化氣體共通流路16的位置;又,因為氣體供給集合單元更包括:增設的增設氣體單元C,具有與加工氣體共通流路15的端部連通的加工氣體共通流路端部手動閥22、與淨化氣體共通流路16的端部的淨化氣體共通流路端部手動閥23、與加工氣體共通流路端部手動閥22連通的另外的加工氣體共通流路手動閥24、與淨化氣體共通流路端部手動閥23連通的另外的淨化氣體共通流路端部手動閥25、以及與加工氣體共通流路端部手動閥22連通的另外的第二手動閥13C;第一連通路52,連通另外的淨化氣體共通流路端部手動閥25的出口流路54和另外的加工氣體共通流路端部手動閥24的出口流路24b;第二連通路59,連通另外的加工氣體共通流路端部手動閥24的入口流路24a和加工氣體共通流路端部手動閥22的出口流路22b;以及第三連通路373A,連通加工氣體共通流路端部手動閥22的出口流路22b和另外的第二手動閥13C的入口流路51;所以在增設線路而進行增設線路的淨化時,可在增設氣體單元內的全部的流路充滿淨化氣體。雖然沒有淨化氣體流動的滯留部在一部份發生,因為滯留部係與淨化氣體的流動連通,以必要的時間流動淨化氣體的話,增設氣體單元C內的水分可大致完全地被除去。As described in detail above, the gas supply assembly unit according to the third embodiment includes a plurality of gas units integrally connected to the following elements by the flow path block: the first manual valves 11A, 11B are disposed at the outlet flow path The second manual valves 13A, 13B are disposed at positions that communicate the first manual valves 11A, 11B and the process gas common flow path 15; and the third manual valves 14A, 14B are disposed to communicate with the first manual valves 11A, 11B And the position of the purge gas common flow path 16; further, the gas supply assembly unit further includes: an additional gas unit C added, and a processing gas common flow path end manual valve 22 having an end portion communicating with the processing gas common flow path 15. a purge gas common flow path end manual valve 23 at the end of the purge gas common flow path 16 and another process gas common flow path manual valve 24 and the purge gas that communicate with the process gas common flow path end manual valve 22 a common purge gas common flow path end manual valve 25 communicating with the common flow path end manual valve 23, and another second manual valve 13C communicating with the machining gas common flow path end manual valve 22; a communication path 52 connecting the outlet flow path 54 of the additional purge gas common flow path end manual valve 25 and the outlet flow path 24b of the additional machining gas common flow path end manual valve 24; the second communication path 59 is connected to the other An inlet flow path 24a of the machining gas common flow path end manual valve 24 and an outlet flow path 22b of the machining gas common flow path end manual valve 22; and a third communication path 373A that communicates with the machining gas common flow path end manual valve 22 The outlet flow path 22b and the inlet flow path 51 of the other second manual valve 13C; therefore, when the additional line is added to purify the additional line, all the flow paths in the additional gas unit can be filled with the purge gas. Although the retention portion in which no purge gas flows does not occur in part, since the retention portion communicates with the flow of the purge gas, and the purge gas flows for the necessary time, the moisture in the additional gas unit C can be substantially completely removed.

[第四實施例][Fourth embodiment]

其次,說明本發明的第四實施例。因為第四實施例的氣體供應集合單元的構成及作用效果係與第三實施例大致相同,僅說明不同點,而其他部份則省略。不同點係自既設線路的加工氣體共通流路端部手動閥到增設線路的第二連通路、加工氣體共通流路端部手動閥、以及第一連通路的連結之間的流路構造。Next, a fourth embodiment of the present invention will be described. Since the configuration and operational effects of the gas supply assembly unit of the fourth embodiment are substantially the same as those of the third embodiment, only differences will be described, and other portions will be omitted. The difference is the flow path structure between the manual valve of the processing gas common flow path end of the existing line to the second communication path of the additional line, the manual valve of the processing gas common flow path end, and the connection of the first communication path.

將增設氣體單元C安裝在既設氣體單元的作業係與第一實施例同樣地被實施。安裝增設氣體單元C的氣體供給集合單元係在以下圖面中表示。與第12圖對應的圖面在第16圖表示,與第13圖對應的圖面在第17圖表示,與第14和15圖對應的圖面在第18和19圖分別表示。如第18和19圖所示,使加工氣體共通流路端部手動閥22’的出口流路向下方被分岔為兩個,使一方的流路222b和增設氣體單元C的第二手動閥13C的入口流路51藉由流路塊37A’的U字型的流路連通。亦即,使加工氣體共通流路端部手動閥22’的出口流路222b在流路塊37A’內,與垂直方向的流路371A’、水平方向的第三連通路373A’、以及垂直方向的流路372A’連通,使流路372A’與第二手動閥13C的入口流路51連通。The operation system in which the additional gas unit C is attached to the existing gas unit is carried out in the same manner as in the first embodiment. The gas supply assembly unit in which the additional gas unit C is installed is shown in the following drawings. The drawing corresponding to Fig. 12 is shown in Fig. 16, the drawing corresponding to Fig. 13 is shown in Fig. 17, and the drawing corresponding to Figs. 14 and 15 is shown in Figs. 18 and 19, respectively. As shown in Figs. 18 and 19, the outlet flow path of the machining gas common flow path end manual valve 22' is branched downward into two, so that one flow path 222b and the second manual valve 13C to which the gas unit C is added are provided. The inlet flow path 51 is connected by the U-shaped flow path of the flow path block 37A'. That is, the outlet flow path 222b of the machining gas common flow path end manual valve 22' is in the flow path block 37A', the vertical flow path 371A', the horizontal third communication path 373A', and the vertical direction. The flow path 372A' communicates, and the flow path 372A' communicates with the inlet flow path 51 of the second manual valve 13C.

其次,使加工氣體共通流路端部手動閥22’的出口流路的另一方的流路221b和增設氣體單元C的加工氣體共通流路端部手動閥24’的入口流路24a’藉由流路塊36C’的V字流路的第二連通路361C’連通。使加工氣體共通流路端部手動閥24’的出口流路與加工氣體共通流路端部手動閥22’同樣,向下方分岔為兩個,使一方的流路241b以及另一方的流路242b分別與流路塊37C’的V字流路371C’的左邊的口375以及右邊的口376連通。使流路塊37C’內的V字流路371C’在V字的最下點與流路373C’連通,使流路373C’和管路的第一連通路52’連通。Next, the other flow path 221b of the outlet flow path of the machining gas common flow path end manual valve 22' and the inlet flow path 24a' of the machining gas common flow path end manual valve 24' of the additional gas unit C are used. The second communication path 361C' of the V-shaped flow path of the flow path block 36C' is in communication. Similarly to the machining gas common flow path end manual valve 22', the outlet flow path of the machining gas common flow path end manual valve 24' is divided into two, and one flow path 241b and the other flow path are branched. 242b is in communication with the port 375 on the left side and the port 376 on the right side of the V-shaped stream path 371C' of the flow path block 37C', respectively. The V-shaped flow path 371C' in the flow path block 37C' is communicated with the flow path 373C' at the lowest point of the V-shape, and the flow path 373C' is communicated with the first communication path 52' of the flow path.

說明關於以此設置的第四實施例的作動及其作用效果。在增設氣體單元C內,流動淨化氣體,進行增設氣體單元C內的水分的除去。將淨化氣體的流動和淨化氣體的滯留部係以第16、17、18、19圖表示。The operation of the fourth embodiment with this setting and its effect will be explained. In the additional gas unit C, the purge gas flows to remove the moisture in the additional gas unit C. The flow of the purge gas and the retention portion of the purge gas are shown in Figures 16, 17, 18, and 19.

以下說明淨化氣體的流動。與第三實施例比較,自淨化氣體共通流路端部手動閥25至管路的第一連通路52’的流動為止係相同,而自第一連通路52’至第三連通路373A’為止的流動係不同,僅說明此間的流動。在管路的第一連通路52’流動的淨化氣體係自流路塊37C’的流路373C’流動至V字流路371C’的V字的最下點,自V字的一方的流路經由左邊的口375流動至加工氣體共通流路端部手動閥24’的出口流路的一方的流路241b,或自V字的另一方的流路經由右邊的口376流動至加工氣體共通流路端部手動閥24’的出口流路的另一方的流路242b。自流路241b和流路242b流動在加工氣體共通流路端部手動閥24’的淨化氣體係自入口流路24a’、流路塊36C’的V字流路的第二連通路361C’、加工氣體共通流路端部手動閥22’的出口流路的另一方的流路221b’流動至一方的出口流路222b。流動在加工氣體共通流路端部手動閥22’的一方的出口流路222b的淨化氣體係自流路塊37A’內的U字流路的流路371A’、第三連通路的流路373A’而流動至流路372A’。流動在流路372A’的淨化氣體係流動在第二手動閥13C的入口流路51,其以下則與第三實施例同樣。The flow of the purge gas will be described below. Compared with the third embodiment, the flow from the purge gas common flow path end manual valve 25 to the first communication passage 52' of the pipeline is the same, and from the first communication passage 52' to the third communication passage 373A'. The flow system is different and only describes the flow between them. The purge gas system flowing through the first communication passage 52' of the pipe flows from the flow path 373C' of the flow path block 37C' to the lowest point of the V-shape of the V-shaped flow path 371C', and passes through one of the V-shaped flow paths. The left port 375 flows to one of the flow paths 241b of the outlet flow path of the machining gas common flow path end manual valve 24', or flows from the other V-shaped flow path to the processing gas common flow path via the right port 376. The other flow path 242b of the outlet flow path of the end manual valve 24'. The self-flow path 241b and the flow path 242b flow in the purge gas system of the machining gas common flow path end manual valve 24' from the inlet flow path 24a', the second communication path 361C' of the V-shaped flow path of the flow path block 36C', and the processing The other flow path 221b' of the outlet flow path of the gas common flow path end manual valve 22' flows to one of the outlet flow paths 222b. The flow path 371A' of the U-shaped flow path in the purge gas system self-flow path block 37A' flowing through one of the outlet flow paths 222b of the machining gas common flow path end manual valve 22', and the flow path 373A' of the third communication passage It flows to the flow path 372A'. The purge gas system flowing through the flow path 372A' flows in the inlet flow path 51 of the second manual valve 13C, which is the same as that of the third embodiment.

如上所述,在增設氣體單元C內流動淨化氣體時,如第18和19圖所示,在加工氣體共通流路端部手動閥22’的出口流路的一部份發生不流動淨化氣體的滯留部。然而,因為滯留部係位在淨化氣體的流動變化為銳角的彎曲點旁邊,所以只有外觀上,實際上被捲入流動幾乎不滯留,且體積也極少,所以不需花費時間,而可大致完全地進行增設氣體單元C內的水分的除去。As described above, when the purge gas flows in the additional gas unit C, as shown in FIGS. 18 and 19, a portion of the outlet flow path of the manual valve 22' at the end of the processing gas common flow path is subjected to the flow of the purge gas. Retention department. However, since the retention portion is located beside the bending point at which the flow of the purge gas changes to an acute angle, the appearance is actually almost unretained and the volume is extremely small, so that it does not take time, but can be substantially completely The removal of moisture in the gas unit C is additionally performed.

水分可充分地除去,半導體製造裝置側的準備齊全後,藉由關閉加工氣體共通流路端部手動閥24’、淨化氣體共通流路端部手動閥25、以及第三手動閥14C,開啟加工氣體共通流路端部手動閥22’,可在第二線路供給加工氣體。The moisture can be sufficiently removed, and after the preparation of the semiconductor manufacturing apparatus side is completed, the machining gas common flow path end manual valve 24', the purge gas common flow path end manual valve 25, and the third manual valve 14C are closed to open the processing. The gas common flow path end manual valve 22' can supply the machining gas on the second line.

根據以上詳細說明的第二實施例的氣體供給集合單元,因為在加工氣體共通流路端部手動閥22’的內部形成兩個分岔的出口流路221b、出口流路222b,且在增設氣體單元C的另外的加工氣體共通流路端部手動閥24的內部形成兩個分岔的出口流路241b、出口流路242b,所以在增設線路而進行增設線路的淨化時,可在加工氣體共通流路端部手動閥22’和另外的加工氣體共通流路端部手動閥24’的個別內部流動淨化氣體,不必花費時間,增設的氣體單元內的水分可大致完全地被除去。According to the gas supply assembly unit of the second embodiment described in detail above, since the two branch outlet flow paths 221b and the outlet flow paths 222b are formed inside the machining gas common flow path end manual valve 22', and the gas is added In the inside of the other processing gas common flow path end manual valve 24 of the unit C, two branch outlet flow paths 241b and 242b are formed. Therefore, when the additional line is added and the additional line is cleaned, the processing gas can be used in common. The flow path end manual valve 22' and the additional process gas common flow path end manual valve 24' of the individual internal flow purge gas do not take time, and the moisture in the added gas unit can be substantially completely removed.

又,根據第四實施例的氣體供給集合單元,因為使第一連通路52’在另外的淨化氣體共通流路端部手動閥25的出口流路54以及另外的加工氣體共通流路端部手動閥24’的上述兩個分岔的出口流路241b和242b的兩方連通,使第二連通路361C’在另外的加工氣體共通流路端部手動閥24’的入口流路24a’以及加工氣體共通流路端部手動閥22’的兩個分岔的出口流路的一方221b連通,使第三連通路373A’在加工氣體共通流路端部手動閥22的兩個分岔的出口流路的另一方222b以及另外的第二手動閥的入口流路51連通的方式來設置,所以在增設線路而進行增設線路的淨化時,淨化氣體可流動在加工氣體共通流路端部手動閥22’、另外的加工氣體共通流路端部手動閥24’的個別內部、以及全部的流路。因而,淨化不需花費時間,增設的增設氣體單元C內的水分可大致完全地被除去。Further, according to the gas supply assembly unit of the fourth embodiment, the first communication path 52' is manually operated at the outlet flow path 54 of the other purge gas common flow path end manual valve 25 and the other processing gas common flow path end portion. The two outlet ports 241b and 242b of the two branch ports of the valve 24' communicate with each other, so that the second communication path 361C' is at the inlet flow path 24a' of the manual valve 24' at the end of the additional process gas common flow path and processing One side 221b of the two branch outlet flow paths of the gas common flow path end manual valve 22' communicates, and the third communication path 373A' flows at the two branch outlets of the manual valve 22 at the end of the machining gas common flow path. The other side 222b of the road and the inlet flow path 51 of the other second manual valve are connected to each other. Therefore, when the additional line is added to purify the additional line, the purge gas can flow at the end of the processing gas common flow path manual valve 22 'Individual processing gas common flow end end manual valve 24' individual interior, and all flow paths. Therefore, it takes no time to purify, and the moisture in the additional gas unit C to be added can be removed substantially completely.

雖然本發明已以較佳實施例揭露如上,然其並非用以限定本發明,任何熟習此技藝者,在不脫離本發明之精神和範圍內,當可作些許之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。While the present invention has been described in its preferred embodiments, the present invention is not intended to limit the invention, and the present invention may be modified and modified without departing from the spirit and scope of the invention. The scope of protection is subject to the definition of the scope of the patent application.

11A、11B、11C...第一手動閥11A, 11B, 11C. . . First manual valve

13A、13B、13C...第二手動閥13A, 13B, 13C. . . Second manual valve

14A、14B、14C...第三手動閥14A, 14B, 14C. . . Third manual valve

15...加工氣體共通流路15. . . Process gas common flow path

16...淨化氣體共通流路16. . . Purified gas common flow path

17...加工氣體氣動閥17. . . Process gas pneumatic valve

20...淨化氣體手動閥20. . . Purified gas manual valve

22、24...加工氣體共通流路端部手動閥22, 24. . . Process gas common flow end end manual valve

23、25...淨化氣體共通流路端部手動閥23, 25. . . Purified gas common flow path end manual valve

22b...出口流路22b. . . Export flow path

24a...入口流路24a. . . Inlet flow path

24b...出口流路24b. . . Export flow path

51...入口流路51. . . Inlet flow path

52...第一連通路52. . . First connected road

54...出口流路54. . . Export flow path

59...第二連通路59. . . Second connected road

373A...第三連通路373A. . . Third connected road

221b、222b...出口流路221b, 222b. . . Export flow path

241b、242b...出口流路241b, 242b. . . Export flow path

361C’...第二連通路361C’. . . Second connected road

第1圖係表示本發明的第一實施例的氣體供給集合單元的構成的回路圖;Fig. 1 is a circuit diagram showing the configuration of a gas supply assembly unit according to a first embodiment of the present invention;

第2圖係表示第一實施例的構成的平面圖;Figure 2 is a plan view showing the configuration of the first embodiment;

第3圖係為第2圖的AA剖面圖;Figure 3 is a cross-sectional view taken along line AA of Figure 2;

第4圖係為第2圖的BB剖面圖;Figure 4 is a BB cross-sectional view of Figure 2;

第5圖係為在第3圖中,使增設氣體單元固定板30C移動之後的剖面圖;Figure 5 is a cross-sectional view showing the movement of the additional gas unit fixing plate 30C in Fig. 3;

第6圖係為在第4圖中,使增設氣體單元固定板30C移動之後的剖面圖;Figure 6 is a cross-sectional view showing the movement of the additional gas unit fixing plate 30C in Fig. 4;

第7圖係為對應第二實施例的第5圖的圖面;Figure 7 is a drawing corresponding to Figure 5 of the second embodiment;

第8圖係為對應第二實施例的第6圖的圖面;Figure 8 is a drawing corresponding to Figure 6 of the second embodiment;

第9圖係表示使用本發明的氣體供給集合單元時的大氣暴露部的回路圖;Figure 9 is a circuit diagram showing an atmospheric exposed portion when the gas supply assembly unit of the present invention is used;

第10圖係表示本發明的第三實施例的氣體供給集合單元的構成的回路圖;Figure 10 is a circuit diagram showing the configuration of a gas supply assembly unit of a third embodiment of the present invention;

第11圖係表示第10圖的構成的平面圖;Figure 11 is a plan view showing the configuration of Figure 10;

第12圖係表示第三實施例的構成的平面圖,表示使在第11圖中的增設氣體單元固定板30C移動之後;Figure 12 is a plan view showing the configuration of the third embodiment, showing the movement of the additional gas unit fixing plate 30C in Fig. 11;

第13圖係為取下第12圖的機器的下部的流路塊的平面圖;Figure 13 is a plan view showing the flow path block of the lower portion of the machine of Figure 12;

第14圖係表示第12圖的A-A剖面圖;Figure 14 is a cross-sectional view taken along line A-A of Figure 12;

第15圖係表示取下第14圖的機器的下部的流路塊的立體圖;Figure 15 is a perspective view showing the flow path block of the lower portion of the machine of Figure 14;

第16圖係為第四實施例的構成的平面圖;Figure 16 is a plan view showing the configuration of the fourth embodiment;

第17圖係表示取下第16圖的機器的下部的流路塊的平面圖;Figure 17 is a plan view showing the flow path block of the lower portion of the machine of Figure 16;

第18圖係表示第16圖的B-B剖面圖;Figure 18 is a cross-sectional view taken along line B-B of Figure 16;

第19圖係表示取下第18圖的機器的下部的流路塊的立體圖;Figure 19 is a perspective view showing the flow path block of the lower portion of the machine of Figure 18;

第20圖係表示第9圖的構成的平面圖;Figure 20 is a plan view showing the configuration of Figure 9;

第21圖係表示取下第20圖的機器的下部的流路塊的平面圖;Figure 21 is a plan view showing the flow path block of the lower portion of the machine of Figure 20;

第22圖係表示第20圖的C-C剖面圖;Figure 22 is a cross-sectional view taken along line C-C of Figure 20;

第23圖係表示取下第22圖的機器的下部的流路塊的立體圖;Figure 23 is a perspective view showing the flow path block of the lower portion of the machine of Figure 22;

第24圖係表示習知氣體供給單元的構成的回路圖;Figure 24 is a circuit diagram showing the configuration of a conventional gas supply unit;

第25圖係表示將第24圖作為具體化的構成的平面圖;Figure 25 is a plan view showing a configuration of Fig. 24 as an embodiment;

第26圖係表示習知的增設後氣體供給單元的回路圖;以及Figure 26 is a circuit diagram showing a conventional post-addition gas supply unit;

第27圖係表示將第26圖作為具體化的構成的平面圖。Fig. 27 is a plan view showing a configuration of Fig. 26 as an embodiment.

10A、10B...處理氣體出口10A, 10B. . . Process gas outlet

11A、11B、11C...第一手動閥11A, 11B, 11C. . . First manual valve

12A、12B、12C...壓力計12A, 12B, 12C. . . pressure gauge

13A、13B、13C...第二手動閥13A, 13B, 13C. . . Second manual valve

14A、14B、14C...第三手動閥14A, 14B, 14C. . . Third manual valve

15...加工氣體共通流路15. . . Process gas common flow path

16...淨化氣體共通流路16. . . Purified gas common flow path

17...加工氣體氣動閥17. . . Process gas pneumatic valve

18...加工氣體供給口18. . . Processing gas supply port

19...逆止閥19. . . Check valve

20...淨化氣體手動閥20. . . Purified gas manual valve

22、24...加工氣體共通流路端部手動閥22, 24. . . Process gas common flow end end manual valve

23、25...淨化氣體共通流路端部手動閥23, 25. . . Purified gas common flow path end manual valve

Claims (4)

一種氣體供應集合單元,包括:複數個氣體單元,藉由流路塊以一體的方式連結下列元件:第一手動閥,被設置在出口流路;第二手動閥,被設置在連通上述第一手動閥和加工氣體共通流路的位置;以及第三手動問,被設置在連通上述第一手動閥和淨化氣體共通流路的位置,上述複數個氣體單元包括:既設的氣體單元、以及透過增設的方式連接至上述既設的氣體單元的增設的氣體單元,其中上述既設的氣體單元包括:加工氣體共通流路端部手動閥,與上述加工氣體共通流路的端部連通;以及淨化氣體共通流路端部手動閥,與上述淨化氣體共通流路的端部連通,其中上述增設的氣體單元包括:另外的加工氣體共通流路端部手動閥,透過增設的方式與上述加工氣體共通流路端部手動閥連通;另外的淨化氣體共通流路端部手動閥,透過增設的方式與上述淨化氣體共通流路端部手動閥連通;另外的第二手動閥,透過增設的方式與上述加工氣體共通流路端部手動閥連通;第一連通路,連通上述另外的淨化氣體共通流路端部手動閥的出口流路和上述另外的加工氣體共通流路端部手 動閥的出口流路;第二連通路,連通上述另外的加工氣體共通流路端部手動閥的入口流路和上述加工氣體共通流路端部手動閥的出口流路;以及第三連通路,連通上述加工氣體共通流路端部手動閥的出口流路和上述另外的第二手動閥的入口流路。 A gas supply assembly unit comprising: a plurality of gas units, wherein the following components are connected in an integrated manner by a flow path block: a first manual valve is disposed at an outlet flow path; and a second manual valve is disposed to communicate with the first a position of the common valve and the processing gas common flow path; and a third manual request, which is disposed at a position connecting the first manual valve and the common flow path of the purge gas, wherein the plurality of gas units include: an existing gas unit, and a transmission The method is connected to the additional gas unit of the above-mentioned existing gas unit, wherein the existing gas unit comprises: a processing gas common flow end end manual valve, communicating with an end portion of the processing gas common flow path; and purifying gas common flow a road end manual valve communicating with an end of the purge gas common flow path, wherein the additional gas unit comprises: another processing gas common flow path end manual valve, and a common flow path end with the processing gas through an additional manner The manual valve is connected; the other purge gas common flow end end manual valve, through the addition method and the above The gas flow common flow end is connected by a manual valve; the other second manual valve is connected to the machining valve common flow end manual valve through an additional manner; the first communication path is connected to the other common purge gas common flow end The outlet flow path of the manual valve and the above-mentioned additional processing gas common flow path end hand An outlet flow path of the movable valve; a second communication path connecting the inlet flow path of the manual valve at the end of the common processing gas common flow path; and an outlet flow path of the manual valve at the end of the processing gas common flow path; and the third communication path And an inlet flow path that communicates with the machining valve common end end manual valve and the other second manual valve inlet flow path. 如申請專利範圍第1項所述之氣體供應集合單元,其中在上述加工氣體共通流路端部手動問的內部形成兩個分岔的出口流路,在上述增設的氣體單元的上述另外的加工氣體共通流路端部手動閥的內部形成兩個分岔的出口流路。 The gas supply assembly unit according to claim 1, wherein two branch outlet flow paths are formed inside the end of the processing gas common flow path end, and the additional processing of the additional gas unit is performed. The inside of the manual valve at the end of the gas common flow path forms two branch outlet flow paths. 如申請專利範圍第2項所述之氣體供應集合單元,其中上述第一連通路係在上述另外的淨化氣體共通流路端部手動閥的出口流路以及上述另外的加工氣體共通流路端部手動閥的上述兩個分岔的出口流路的兩方連通;上述第二連通路係在上述另外的加工氣體共通流路端部手動閥的入口流路以及上述加工氣體共通流路端部手動閥的上述兩個分岔的出口流路的一方連通;上述第三連通路係在上述加工氣體共通流路端部手動閥的上述兩個分岔的出口流路的另一方以及上述另外的第二手動閥的入口流路連通。 The gas supply assembly unit according to claim 2, wherein the first communication path is an outlet flow path of the manual valve at the end of the additional purge gas common flow path and the end of the additional processing gas common flow path The two outlets of the manual valve are connected to each other; the second communication path is an inlet flow path of the manual valve at the end of the additional processing gas common flow path and the end of the processing gas common flow path One of the two branch outlet flow paths of the valve is in communication; the third communication path is the other of the two branch outlet flow paths of the machining gas common flow path end manual valve and the other The inlet flow path of the two manual valves is connected. 如申請專利範圍第1項所述之氣體供應集合單元,其中上述第三連通路係為以將上述加工氣體共通流路端部手動問的出口流路以及上述另外的第二手動閥的入口流路 連通的方式被形成於流路塊的U字流路,上述U字流路係連接至上述第二連通路。The gas supply assembly unit of claim 1, wherein the third communication path is an outlet flow path manually asked by the end of the processing gas common flow path and an inlet flow of the additional second manual valve road The connected mode is formed in the U-shaped flow path of the flow path block, and the U-shaped flow path is connected to the second communication path.
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US9296697B2 (en) 2005-08-24 2016-03-29 Abbott Laboratories Hetaryl-substituted guanidine compounds and use thereof as binding partners for 5-HT5-receptors
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