[go: up one dir, main page]

TWI482705B - Curable resin composition for antistatic layer, optical film, polarizing plate and display panel - Google Patents

Curable resin composition for antistatic layer, optical film, polarizing plate and display panel Download PDF

Info

Publication number
TWI482705B
TWI482705B TW100124540A TW100124540A TWI482705B TW I482705 B TWI482705 B TW I482705B TW 100124540 A TW100124540 A TW 100124540A TW 100124540 A TW100124540 A TW 100124540A TW I482705 B TWI482705 B TW I482705B
Authority
TW
Taiwan
Prior art keywords
layer
antistatic layer
antistatic
optical film
adhesion
Prior art date
Application number
TW100124540A
Other languages
Chinese (zh)
Other versions
TW201223758A (en
Inventor
Kana Yamamoto
Tomoyuki Horio
Original Assignee
Dainippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Printing Co Ltd filed Critical Dainippon Printing Co Ltd
Publication of TW201223758A publication Critical patent/TW201223758A/en
Application granted granted Critical
Publication of TWI482705B publication Critical patent/TWI482705B/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06Polymers provided for in subclass C08G
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • G02B5/3025Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3033Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
    • G02B5/3041Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid comprising multiple thin layers, e.g. multilayer stacks
    • G02B5/305Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid comprising multiple thin layers, e.g. multilayer stacks including organic materials, e.g. polymeric layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B23/00Layered products comprising a layer of cellulosic plastic substances, i.e. substances obtained by chemical modification of cellulose, e.g. cellulose ethers, cellulose esters, viscose
    • B32B23/20Layered products comprising a layer of cellulosic plastic substances, i.e. substances obtained by chemical modification of cellulose, e.g. cellulose ethers, cellulose esters, viscose comprising esters
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/18Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/30Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06Polymers provided for in subclass C08G
    • C08F290/067Polyurethanes; Polyureas
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00Compositions of unspecified macromolecular compounds
    • C08L101/12Compositions of unspecified macromolecular compounds characterised by physical features, e.g. anisotropy, viscosity or electrical conductivity
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D151/00Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • C09D151/08Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers grafted on to macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/20Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
    • B32B2307/21Anti-static
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/40Properties of the layers or laminate having particular optical properties
    • B32B2307/418Refractive
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/40Properties of the layers or laminate having particular optical properties
    • B32B2307/42Polarizing, birefringent, filtering
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/70Other properties
    • B32B2307/732Dimensional properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2551/00Optical elements
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2201/00Properties
    • C08L2201/04Antistatic
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B2207/00Coding scheme for general features or characteristics of optical elements and systems of subclass G02B, but not including elements and systems which would be classified in G02B6/00 and subgroups
    • G02B2207/121Antistatic or EM shielding layer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Laminated Bodies (AREA)
  • Polarising Elements (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Liquid Crystal (AREA)

Description

抗靜電層用硬化性樹脂組成物、光學薄膜、偏光板及顯示面板Curable resin composition for antistatic layer, optical film, polarizing plate and display panel

本發明係關於一種設置於液晶顯示器(LCD,Liquid Crystal Display)、陰極管顯示裝置(CRT,Cathode-ray Tube)或電漿顯示器(PDP,Plasma Display Panel)等顯示器(影像顯示裝置)之前面之具有抗靜電層的光學薄膜及該抗靜電層用之組成物,以及使用該光學薄膜之偏光板及顯示面板。The present invention relates to a display (image display device) such as a liquid crystal display (LCD), a cathode tube display device (CRT), or a plasma display panel (PDP). An optical film having an antistatic layer and a composition for the antistatic layer, and a polarizing plate and a display panel using the optical film.

於上述之顯示器中,通常於最表面設置有包含具有抗反射性、硬塗性或抗靜電性等各種功能之層的光學薄膜。另外,於本說明書中,有時將硬塗僅稱為「HC」。In the above display, an optical film including a layer having various functions such as antireflection, hard coat, or antistatic property is usually provided on the outermost surface. Further, in the present specification, the hard coat may be simply referred to as "HC".

作為此種光學薄膜的功能層之一,已知有用於賦予抗靜電性之抗靜電層。該抗靜電層係藉由添加摻雜有銻之氧化錫(ATO,Antimony Tin Oxide)或摻雜有錫之氧化銦(ITO,Indium Tin Oxide)等金屬氧化物系的導電性超微粒子、高分子型導電性組成物或四級銨鹽系導電材料等抗靜電劑而形成(例如專利文獻1)。於使用該等抗靜電劑之情形時,為了使所需之抗靜電性與光學特性(低霧值或高全光線透過率)並存,藉由形成含有抗靜電劑之0.1~1 μm左右的薄膜層來賦予所需之功能。As one of the functional layers of such an optical film, an antistatic layer for imparting antistatic properties is known. The antistatic layer is made of a metal oxide-based conductive ultrafine particle or a polymer doped with antimony tin oxide (ATO, Antimony Tin Oxide) or tin-doped indium oxide (ITO, Indium Tin Oxide). An antistatic agent such as a conductive composition or a quaternary ammonium salt conductive material is formed (for example, Patent Document 1). In the case of using such an antistatic agent, in order to cope with the required antistatic property and optical properties (low haze value or high total light transmittance), a film of about 0.1 to 1 μm containing an antistatic agent is formed. Layers to give the desired functionality.

又,於上述之顯示器中,要求對顯示器之影像顯示面賦予硬度,以使其於處理時不受損傷。對此,於專利文獻1中揭示有如下之光學薄膜之構成:於三醋酸纖維素(以下,有時僅稱為「TAC(Triacetyl Cellulose)」基材上設置薄膜之防靜電層,並於該抗靜電層上設置HC層。Further, in the above display, it is required to impart hardness to the image display surface of the display so as not to be damaged during processing. On the other hand, Patent Document 1 discloses a configuration in which an optical film is provided on a cellulose triacetate (hereinafter, simply referred to as a "TAC (Triacetyl Cellulose)" substrate, and an antistatic layer is provided thereon. An HC layer is disposed on the antistatic layer.

然而,由於抗靜電層係薄膜,因此存在如下之問題:層中所包含之季戊四醇三丙烯酸酯(以下,有時僅稱為「PETA(Pentaerythritol triacrylate)」或二季戊四醇六丙烯酸酯(以下,有時僅稱為「DPHA(Di-Pentaerythritol hexaacrylate)」之類的黏合劑成分及抗靜電劑的量有限,進而容易造成與鄰接於該抗靜電層之HC層之密接性不足。However, the antistatic layer-based film has a problem in that pentaerythritol triacrylate (hereinafter referred to as "PETA (Pentaerythritol triacrylate)" or dipentaerythritol hexaacrylate (hereinafter sometimes referred to as "PETA") The amount of the binder component and the antistatic agent, which are simply referred to as "DPHA (Di-Pentaerythritol hexaacrylate)", is limited, and the adhesion to the HC layer adjacent to the antistatic layer is likely to be insufficient.

於以基材/抗靜電層/HC層為基本構成之光學薄膜中,係有抗靜電層與HC層之間的界面、及抗靜電層與基材之間的界面,在各個界面存在密接性之問題。The optical film having a base material/antistatic layer/HC layer as a basic structure has an interface between the antistatic layer and the HC layer, and an interface between the antistatic layer and the substrate, and has adhesion at each interface. The problem.

於抗靜電層與HC層之間的界面上,抗靜電層與HC層各自之反應性基進行交聯鍵結而密接,但同時要求抗靜電層發揮抗靜電性能。於抗靜電劑為金屬氧化物之情形時,為了抗靜電層發揮抗靜電性能,抗靜電劑之微粒子彼此必需密接,因此添加大量之抗靜電劑,但存在霧值增加、或全光線透過率惡化之情況。然而,若重視光學特性而減少金屬氧化物之量,則抗靜電性能難以發揮。又,若增加抗靜電劑之量,則存在於抗靜電層與鄰接層之界面上黏合劑成分之量不足,抗靜電層與鄰接層之密接性變差之可能性。然而,若重視密接性而減少金屬氧化物之量,則抗靜電性能難以發揮。At the interface between the antistatic layer and the HC layer, the reactive groups of the antistatic layer and the HC layer are crosslinked and bonded to each other, but at the same time, the antistatic layer is required to exhibit antistatic properties. When the antistatic agent is a metal oxide, in order to exhibit antistatic properties for the antistatic layer, the microparticles of the antistatic agent must be in close contact with each other. Therefore, a large amount of the antistatic agent is added, but the fog value increases or the total light transmittance deteriorates. The situation. However, if the optical properties are emphasized and the amount of metal oxide is reduced, the antistatic performance is difficult to exert. Moreover, when the amount of the antistatic agent is increased, the amount of the binder component is insufficient at the interface between the antistatic layer and the adjacent layer, and the adhesion between the antistatic layer and the adjacent layer may be deteriorated. However, if the adhesion is emphasized and the amount of the metal oxide is reduced, the antistatic performance is difficult to exert.

於抗靜電劑為四級銨鹽之情形時,為了抗靜電層發揮抗靜電性能,層內必需存在量比黏合劑更多之四級銨鹽。或者,四級銨鹽必需集中存在於抗靜電層之與HC層鄰接的界面附近。然而,於此種情形時,存在如下之可能性:存在於界面附近之四級銨鹽阻礙抗靜電層與HC層之密接,在抗靜電層與鄰接之HC層的界面上黏合劑成分(具有提高與HC層之交聯密度之反應性基的成分)之量不足,抗靜電層與鄰接之HC層的密接性變差。然而,若重視密接性而減少四級銨鹽之量,則抗靜電性能會惡化。In the case where the antistatic agent is a quaternary ammonium salt, in order to exhibit antistatic properties of the antistatic layer, more quaternary ammonium salts than the binder must be present in the layer. Alternatively, the quaternary ammonium salt must be concentrated in the vicinity of the interface of the antistatic layer adjacent to the HC layer. However, in such a case, there is a possibility that the quaternary ammonium salt present in the vicinity of the interface hinders the adhesion between the antistatic layer and the HC layer, and the binder component at the interface between the antistatic layer and the adjacent HC layer (having The amount of the component which increases the reactivity of the crosslinking layer with the HC layer is insufficient, and the adhesion between the antistatic layer and the adjacent HC layer is deteriorated. However, if the adhesion is emphasized and the amount of the quaternary ammonium salt is reduced, the antistatic property is deteriorated.

為了使抗靜電性與密接性並存,可考慮單純地增多PETA(季戊四醇三丙烯酸酯)或DPHA(二季戊四醇六丙烯酸酯)之類的黏合劑成分之量的方法,但若增多此種黏合劑成分之量,則抗靜電層之膜厚增厚,伴隨於此,存在抗靜電層之捲曲(翹曲)變大之問題,以及分散於抗靜電層中之昂貴之抗靜電劑的使用量亦增加,而導致成本增加之問題。又,為了提高密接性,可考慮增加黏合劑中之具有反應性基之成分的方法,但如上所述,為了顯現抗靜電性能而有必要之抗靜電劑之量,黏合劑之量有限制,因此難以採用該方法。In order to coexist antistatic property and adhesion, a method of simply increasing the amount of the binder component such as PETA (pentaerythritol triacrylate) or DPHA (dipentaerythritol hexaacrylate) may be considered, but if such a binder component is added In this case, the film thickness of the antistatic layer is increased, and accordingly, there is a problem that the curl (warpage) of the antistatic layer becomes large, and the use amount of the expensive antistatic agent dispersed in the antistatic layer is also increased. And the problem of increased costs. Further, in order to improve the adhesion, a method of increasing a component having a reactive group in the binder may be considered. However, as described above, the amount of the binder is limited in order to exhibit an antistatic property, and the amount of the binder is limited. It is therefore difficult to adopt this method.

又,如上所述,因作為薄膜之抗靜電層之層中所包含的黏合劑成分與抗靜電劑之總量有限,故若欲減少抗靜電劑之使用量,相應地增加黏合劑成分之使用量來提高抗靜電層與HC層之密接性,則存在抗靜電劑之使用量減少而導致抗靜電性能降低之問題。Further, as described above, since the total amount of the binder component and the antistatic agent contained in the layer of the antistatic layer as the film is limited, if the amount of the antistatic agent is to be reduced, the use of the binder component is accordingly increased. When the amount of the antistatic layer and the HC layer are improved, the amount of the antistatic agent used is reduced to cause a problem that the antistatic property is lowered.

另一方面,於抗靜電層與基材之間的界面上,為了使抗靜電層密接於基材,需要使抗靜電層之組成物之黏合劑成分滲透至基材內,且在基材與抗靜電層之界面上,滲透至基材內之黏合劑成分與形成抗靜電層之黏合劑成分硬化結合。On the other hand, at the interface between the antistatic layer and the substrate, in order to adhere the antistatic layer to the substrate, it is necessary to infiltrate the binder component of the composition of the antistatic layer into the substrate, and in the substrate and At the interface of the antistatic layer, the binder component that penetrates into the substrate hardens and bonds with the binder component that forms the antistatic layer.

於抗靜電劑為四級銨鹽之情形時,已知先前為了提高耐久性或抗靜電性而使用分子量較大之四級銨鹽。然而,若四級銨鹽之分子量較大,則抗靜電層之組成物之黏合劑成分難以滲透至基材內,因此為了獲得抗靜電層與基材之密接性,必需使用大量之滲透性溶劑、或使用可滲透至基材內之分子量較小之黏合劑。然而,於該情形時,存在抗靜電層與HC層之界面之密接性變差的問題。In the case where the antistatic agent is a quaternary ammonium salt, it is known to use a quaternary ammonium salt having a relatively large molecular weight in order to improve durability or antistatic property. However, if the molecular weight of the quaternary ammonium salt is large, the binder component of the composition of the antistatic layer is difficult to penetrate into the substrate, and therefore, in order to obtain the adhesion between the antistatic layer and the substrate, it is necessary to use a large amount of the permeable solvent. Or use a binder of a lower molecular weight that can penetrate into the substrate. However, in this case, there is a problem that the adhesion between the interface of the antistatic layer and the HC layer is deteriorated.

又,先前已知有藉由使用滲透性溶劑而可防止干擾條紋、且可使外觀變得良好之技術,但若使用滲透性溶劑,則有時於基材內亦會形成新的界面,除上述之密接性惡化以外,亦有產生干擾條紋且外觀變差之問題。Further, it has been known that a barrier resin can be prevented by using a permeable solvent, and the appearance can be improved. However, when a permeable solvent is used, a new interface may be formed in the substrate. In addition to the above-described deterioration in adhesion, there is also a problem that interference fringes are generated and the appearance is deteriorated.

[先前技術文獻][Previous Technical Literature] [專利文獻][Patent Literature]

[專利文獻1]日本專利特開2009-086660號公報[Patent Document 1] Japanese Patent Laid-Open Publication No. 2009-086660

本發明係為了解決上述問題而完成之發明,其第一目的在於提供一種抗靜電層用硬化性樹脂組成物,該抗靜電層用硬化性樹脂組成物可形成光學特性及外觀良好、抗靜電性充分、且與鄰接之HC層及TAC基材之密接性優異的抗靜電層。The present invention has been made to solve the above problems, and a first object thereof is to provide a curable resin composition for an antistatic layer which can form optical characteristics, good appearance, and antistatic property. An antistatic layer which is sufficient and has excellent adhesion to the adjacent HC layer and TAC substrate.

又,本發明之第二目的在於提供一種光學薄膜,其具有使用上述組成物所形成之抗靜電層,且灰塵附著防止性優異。Further, a second object of the present invention is to provide an optical film which has an antistatic layer formed using the above composition and which is excellent in dust adhesion prevention property.

又,本發明之第三目的在於提供一種偏光板,其具有上述光學薄膜。Further, a third object of the present invention is to provide a polarizing plate comprising the above optical film.

又,本發明之第四目的在於提供一種顯示面板,其具有上述光學薄膜。Further, a fourth object of the present invention is to provide a display panel having the above optical film.

本發明者等人進行了努力研究,結果得知,若作為抗靜電層之組成物中所包含之黏合劑成分、且用於提高與鄰接之HC層之交聯密度並獲得密接性的PETA或DPHA之類的分子量為900以下之分子量比較小之黏合劑成分,可大致全部滲透至TAC基材中,或者根據黏合劑成分自TAC基材之屬於與HC層之界面的表面向TAC基材無HC層之背面的深度方向之滲透程度,結果黏合劑成分偏存於基材中,基材上之抗靜電層中所包含之黏合劑成分減少,在HC層與抗靜電層之界面進行反應之成分不足,因此有時無法充分獲得抗靜電層與HC層之密接性。又,亦得知:若滲透至TAC基材內部之部分並非以梯度形式滲透,而是滲透之材料全部一樣地滲透至TAC基材內之相同深度,則於TAC基材內形成黏合劑滲透層,而於基材內產生新的界面,且產生干擾條紋等而導致外觀惡化。As a result of intensive studies, the inventors of the present invention have found that the adhesive component contained in the composition of the antistatic layer is used to increase the crosslinking density with the adjacent HC layer and to obtain adhesion. A binder having a molecular weight of less than 900, such as DPHA, which is relatively small in molecular weight, may be substantially completely infiltrated into the TAC substrate, or may be formed from the surface of the TAC substrate belonging to the interface with the HC layer to the TAC substrate according to the binder component. The degree of penetration of the back side of the HC layer in the depth direction causes the binder component to be deposited in the substrate, and the binder component contained in the antistatic layer on the substrate is reduced, and the interface between the HC layer and the antistatic layer is reacted. Since the composition is insufficient, the adhesion between the antistatic layer and the HC layer may not be sufficiently obtained. Moreover, it is also known that if the portion penetrating into the interior of the TAC substrate does not penetrate in a gradient form, but the infiltrated material all penetrates to the same depth in the TAC substrate, a binder penetration layer is formed in the TAC substrate. On the other hand, a new interface is generated in the substrate, and interference fringes and the like are generated to deteriorate the appearance.

因此,本發明者等人發現:藉由將組成物中所包含之抗靜電劑、屬於難以滲透至TAC基材或不滲透至TAC基材之黏合劑成分之特定分子量的丙烯酸胺基甲酸酯、及滲透至TAC基材之黏合劑成分(多官能單體)設定為特定之比例,可形成具有充分之抗靜電性,並且與HC層及TAC基材之密接性優異的抗靜電層,作為光學薄膜整體,可獲得優異之灰塵附著防止性能,從而完成本發明。Therefore, the present inventors have found that an acrylic urethane having a specific molecular weight which is contained in the composition and which is a binder component which is difficult to penetrate into the TAC substrate or does not penetrate into the TAC substrate is found. And the binder component (polyfunctional monomer) permeating to the TAC substrate is set to a specific ratio, and an antistatic layer having sufficient antistatic property and excellent adhesion to the HC layer and the TAC substrate can be formed as The optical film as a whole can obtain excellent dust adhesion preventing performance, thereby completing the present invention.

即,解決上述問題之本發明之抗靜電層用硬化性樹脂組成物之特徵在於包含:That is, the curable resin composition for an antistatic layer of the present invention which solves the above problems is characterized by comprising:

(A)抗靜電劑,(A) antistatic agent,

(B)於1分子中具有2個以上之光硬化性基、且分子量為900以下之多官能單體,以及(B) a polyfunctional monomer having two or more photocurable groups in one molecule and having a molecular weight of 900 or less, and

(C)於1分子中具有6個以上之丙烯醯基及/或甲基丙烯醯基、且重量平均分子量為1000~11000之丙烯酸胺基甲酸酯,(C) an urethane urethane having 6 or more acryl fluorenyl groups and/or methacryl fluorenyl groups in one molecule and having a weight average molecular weight of 1,000 to 11,000.

該(A)相對於該(A)、(B)及(C)之總量之比例為1~30質量%,且該(C)相對於該(B)及(C)之總量之比例為1~40質量%。The ratio of the (A) to the total amount of the (A), (B), and (C) is 1 to 30% by mass, and the ratio of the (C) to the total amount of the (B) and (C) It is 1 to 40% by mass.

藉由將抗靜電劑(A)之比例設為上述範圍,使用上述組成物所形成之膜厚為1~5 μm之抗靜電層具有充分的抗靜電性,即便於在其上積層HC層而形成光學薄膜之情形時,亦確保充分之灰塵附著防止性。By setting the ratio of the antistatic agent (A) to the above range, the antistatic layer having a film thickness of 1 to 5 μm formed using the above composition has sufficient antistatic property, even if a layer of HC is laminated thereon. In the case of forming an optical film, sufficient dust adhesion prevention property is also ensured.

先前,抗靜電層之膜厚係因光學性能及透明性,而按0.1~1 μm左右之薄膜設置,但若為此種薄膜層,為了賦予抗靜電性,必需將層內之組成物之大部分設為抗靜電性材料,因此無法添加足夠量之具有為了顯現與基材或其上方之層之密接性所必需的反應性基之某些黏合劑。因此,於本案中,使膜厚變厚至某種程度,並確保抗靜電層與鄰接層之密接性,故可充分地使抗靜電性材料以外之具有反應性基之黏合劑成分的添加變得可能。In the past, the film thickness of the antistatic layer was set to be about 0.1 to 1 μm due to optical properties and transparency. However, in order to impart antistatic properties, it is necessary to have a large composition in the layer. Some of them are antistatic materials, and therefore it is not possible to add a sufficient amount of some binder having a reactive group necessary for exhibiting adhesion to a substrate or a layer above it. Therefore, in the present invention, the film thickness is increased to a certain extent, and the adhesion between the antistatic layer and the adjacent layer is ensured, so that the addition of the binder component having a reactive group other than the antistatic material can be sufficiently changed. It is possible.

又,藉由將丙烯酸胺基甲酸酯(C)相對於多官能單體(B)與丙烯酸胺基甲酸酯(C)之總量之比例設為上述範圍,即便於TAC基材上自TAC基材側起依序形成抗靜電層及HC層,亦因丙烯酸胺基甲酸酯(C)不滲透至TAC基材內或相較於多官能單體(B)更不易滲透至TAC基材內,故藉由丙烯酸胺基甲酸酯(C)而可獲得抗靜電層與HC層之充分之密接性,且由於多官能單體(B)滲透至TAC基材內,因此亦可獲得抗靜電層與TAC基材之密接性。Further, by setting the ratio of the urethane urethane (C) to the total amount of the polyfunctional monomer (B) and the urethane acrylate (C) to the above range, even on the TAC substrate The antistatic layer and the HC layer are sequentially formed on the TAC substrate side, and the urethane urethane (C) does not penetrate into the TAC substrate or is more difficult to penetrate into the TAC group than the polyfunctional monomer (B). In the material, sufficient adhesion between the antistatic layer and the HC layer can be obtained by the urethane urethane (C), and since the polyfunctional monomer (B) penetrates into the TAC substrate, it can also be obtained. Adhesion between the antistatic layer and the TAC substrate.

於本發明之抗靜電層用硬化性樹脂組成物中,就抑制抗靜電劑朝TAC基材之滲透且塗佈性優異而言,較佳為抗靜電劑(A)係重量平均分子量為1000~50000之四級銨鹽。In the curable resin composition for an antistatic layer of the present invention, it is preferred that the antistatic agent (A) has a weight average molecular weight of 1000 to 100% in terms of inhibiting penetration of the antistatic agent into the TAC substrate and excellent coating properties. Quaternary ammonium salt of 50000.

於本發明之抗靜電層用硬化性樹脂組成物中,就提高多官能單體(B)及丙烯酸胺基甲酸酯(C)之作用之觀點而言,較佳為進一步包含(D)滲透性溶劑及(E)非滲透性溶劑。In the curable resin composition for an antistatic layer of the present invention, it is preferable to further contain (D) permeation from the viewpoint of enhancing the action of the polyfunctional monomer (B) and the urethane acrylate (C). Solvent and (E) non-permeable solvent.

於本發明之抗靜電層用硬化性樹脂組成物中,亦可將上述抗靜電層用硬化性樹脂組成物之膜厚為1~5μm之硬化物的表面電阻值設為未滿1×1012 Ω/□。藉由將抗靜電層用硬化性樹脂組成物之硬化物(亦即抗靜電層)設為此種抗靜電性能,於抗靜電層上積層5~15μm之硬塗層而成之光學薄膜可發揮灰塵附著防止性。In the curable resin composition for an antistatic layer of the present invention, the surface resistivity of the cured product having a thickness of 1 to 5 μm of the curable resin composition for an antistatic layer may be less than 1 × 10 12 . Ω/□. An optical film formed by laminating a hard coat layer of 5 to 15 μm on an antistatic layer by using a cured product (that is, an antistatic layer) of a curable resin composition for an antistatic layer is used as such an antistatic property. Dust adhesion prevention.

再者,表面電阻值係指如下之值:於TAC基材上形成上述抗靜電層用硬化性樹脂組成物之膜厚為1~5μm之硬化物(抗靜電層),然後利用高電阻率計(三菱化學Analytech(股)製造,商品名:Hiresta IP MCP-HT260),於施加電壓1000 V、溫度25℃、濕度40%調濕24小時之條件下,對該硬化物表面進行測定所得之值。In addition, the surface resistance value is a cured product (antistatic layer) having a thickness of 1 to 5 μm in which the curable resin composition for an antistatic layer is formed on a TAC substrate, and then a high resistivity meter is used. (Mitsubishi Chemical Analytech Co., Ltd., trade name: Hiresta IP MCP-HT260), the value obtained by measuring the surface of the cured product under the conditions of a voltage of 1000 V, a temperature of 25 ° C, and a humidity of 40% for 24 hours. .

本發明之光學薄膜係於三醋酸纖維素基材之一面側,自該三醋酸纖維素基材側起鄰接設置膜厚為1~5μm之抗靜電層及硬塗層而成者,其特徵在於,該抗靜電層包含上述抗靜電層用硬化性樹脂組成物之硬化物,上述多官能單體(B)係滲透至該三醋酸纖維素基材之抗靜電層側之界面附近的區域並硬化。The optical film of the present invention is one surface side of a cellulose triacetate substrate, and is formed by providing an antistatic layer and a hard coat layer having a film thickness of 1 to 5 μm from the side of the cellulose triacetate substrate. The antistatic layer contains a cured product of the curable resin composition for an antistatic layer, and the polyfunctional monomer (B) penetrates into a region near the interface of the antistatic layer side of the triacetylcellulose substrate and hardens. .

於TAC基材之一面側,自TAC基材側起設置有膜厚為1~5μm之抗靜電層及HC層的本發明之光學薄膜,因抗靜電層包含上述抗靜電層用硬化性樹脂組成物之硬化物,而具有充分之灰塵附著防止性。進而,HC層與抗靜電層之密接性變得優異。又,藉由多官能單體(B)滲透至TAC基材之抗靜電層側之界面側的區域並硬化,亦可獲得抗靜電層與TAC基材之密接性。作為光學薄膜整體,可獲得優異之灰塵附著防止性能。An optical film of the present invention having an antistatic layer and an HC layer having a film thickness of 1 to 5 μm from the side of the TAC substrate on one side of the TAC substrate, wherein the antistatic layer comprises the curable resin for the antistatic layer. Hardened material with sufficient dust adhesion prevention. Further, the adhesion between the HC layer and the antistatic layer is excellent. Further, the polyfunctional monomer (B) is infiltrated into the region on the interface side of the antistatic layer side of the TAC substrate and cured, and the adhesion between the antistatic layer and the TAC substrate can also be obtained. As the entire optical film, excellent dust adhesion prevention performance can be obtained.

於本發明之光學薄膜之較佳之態樣中,亦可將上述硬塗層、上述抗靜電層及上述三醋酸纖維素基材間之方格密接性試驗的密接率定為90~100%,且將於溫度30℃、濕度40%下,以每小時500 W/m2 之光量照射紫外線192小時後的該密接率定為80~100%。In a preferred aspect of the optical film of the present invention, the adhesion ratio of the hard coat layer, the antistatic layer, and the triacetylcellulose substrate may be determined to be 90 to 100%. The adhesion rate after ultraviolet irradiation for 192 hours at a temperature of 30 ° C and a humidity of 40% at a light amount of 500 W/m 2 per hour was set to be 80 to 100%.

再者,所謂方格密接性試驗(Cross Cut Adhesion Test)之密接率,係指針對於溫度25℃、濕度40%下調濕24小時後的光學薄膜,依據JIS K5400之方格試驗(Cross Cut Test)方法,於硬塗層面上以1 mm間隔橫豎分別切入11條縫隙來製作100個方格,將Nichiban(股)製造之Cellotape(註冊商標)貼附於方格上後,迅速將其於90°之方向拉伸而使其剝離,並根據下述基準所算出之未剝落而殘留之方格的比例。In addition, the close contact rate of the Cross Cut Adhesion Test is an optical film after the humidity is adjusted to a temperature of 25 ° C and a humidity of 40% for 24 hours. According to JIS K5400, the Cross Cut Test In this way, 11 slits were cut into the surface of the hard-coated surface at intervals of 1 mm to make 100 squares. After attaching the Cellotape (registered trademark) manufactured by Nichiban to the square, it was quickly placed at 90. The ratio of the squares which were stretched in the direction of ° and peeled off, and which were not peeled off according to the following criteria.

密接率(%)=(未剝落之方格數/合計方格數100)×100Bonding rate (%) = (number of squares without peeling off / total number of squares 100) × 100

於本發明之光學薄膜之較佳之態樣中,亦可作成於硬塗層之與抗靜電層相反側之面上進一步設置低折射率層的構成。In a preferred aspect of the optical film of the present invention, a low refractive index layer may be further provided on the surface of the hard coat layer opposite to the antistatic layer.

於本發明之光學薄膜之較佳之態樣中,亦可將硬塗層作為含有電離放射線硬化性樹脂之組成物的硬化物。In a preferred aspect of the optical film of the present invention, the hard coat layer may be used as a cured product containing a composition of an ionizing radiation curable resin.

本發明之偏光板之特徵在於,於光學薄膜之三醋酸纖維素基材側設置有偏光片。The polarizing plate of the present invention is characterized in that a polarizer is provided on the side of the cellulose triacetate substrate of the optical film.

本發明之顯示面板之特徵在於,於光學薄膜之三醋酸纖維素基材側配置有顯示器。The display panel of the present invention is characterized in that a display is disposed on the cellulose acetate substrate side of the optical film.

藉由使以上述特定之比例含有抗靜電劑(A)、多官能單體(B)及丙烯酸胺基甲酸酯(C)之組成物硬化而形成為膜厚1~5 μm的抗靜電層,即便為於TAC基材上自TAC基材側起具有抗靜電層及HC層之層構成,亦可獲得充分之灰塵附著防止性,且可獲得抗靜電層與TAC基材及HC層之密接性良好的光學薄膜。又,以上述特定之比例含有該抗靜電劑(A)、多官能單體(B)及丙烯酸胺基甲酸酯(C)之組成物,係可較佳地用於形成具有此種特性之光學薄膜中所使用的抗靜電層。An antistatic layer having a film thickness of 1 to 5 μm is formed by curing a composition containing the antistatic agent (A), the polyfunctional monomer (B), and the urethane acrylate (C) in the specific ratio described above. Even if it is a layer structure having an antistatic layer and an HC layer from the TAC substrate side on the TAC substrate, sufficient dust adhesion prevention property can be obtained, and an antistatic layer can be obtained in close contact with the TAC substrate and the HC layer. A good optical film. Further, the composition containing the antistatic agent (A), the polyfunctional monomer (B) and the urethane acrylate (C) in the above specific ratio can be preferably used for forming such a characteristic. An antistatic layer used in optical films.

以下,對本發明之抗靜電層用硬化性樹脂組成物(以下,有時僅稱為「抗靜電層用組成物」)、光學薄膜以及使用該光學薄膜之偏光板及顯示面板加以說明。Hereinafter, the curable resin composition for an antistatic layer of the present invention (hereinafter sometimes referred to simply as "the composition for an antistatic layer"), an optical film, and a polarizing plate and a display panel using the same will be described.

於本發明中,(甲基)丙烯醯基表示丙烯醯基及/或甲基丙烯醯基,(甲基)丙烯酸酯表示丙烯酸酯及/或甲基丙烯酸酯。In the present invention, (meth)acryl fluorenyl represents an acryl fluorenyl group and/or a methacryl fluorenyl group, and (meth) acrylate means an acrylate and/or a methacrylate.

本發明之光不僅包括可見光以及紫外線及X射線等非可見區域之波長之電磁波,亦包括如電子束之粒子束及統稱為電磁波與粒子束之放射線或電離放射線。The light of the present invention includes not only electromagnetic waves of visible light but also wavelengths of non-visible regions such as ultraviolet rays and X-rays, and also includes particle beams such as electron beams and radiation or ionizing radiation collectively referred to as electromagnetic waves and particle beams.

於本發明中,所謂「硬塗層」,係指於JIS K5600-5-4(1999)中規定之鉛筆硬度試驗(4.9 N負荷)中顯示「H」以上之硬度者。In the present invention, the term "hard coating layer" means a hardness of "H" or more in a pencil hardness test (4.9 N load) prescribed in JIS K5600-5-4 (1999).

再者,關於薄膜及片材,於JIS-K6900中之定義,片材係指較薄且通常其厚度比長度及寬度小之平坦製品,薄膜係指厚度與長度及寬度相比極小、且最大厚度被任意限定之較薄之平坦製品,其通常以捲之形態供給。因此,片材中厚度特別薄者可稱為薄膜,但由於片材與薄膜之邊界並不清楚,難以明確地加以區分,因此於本發明中,包括厚度較厚者及較薄者兩者之含義,均定義為「薄膜」。Further, regarding the film and the sheet, as defined in JIS-K6900, the sheet refers to a flat product which is thin and generally has a thickness smaller than the length and the width, and the film means that the thickness is extremely small and maximum in comparison with the length and the width. A thin, flat article of arbitrarily defined thickness, which is typically supplied in the form of a roll. Therefore, the thickness of the sheet is particularly thin, which may be referred to as a film. However, since the boundary between the sheet and the film is not clear, it is difficult to distinguish clearly. Therefore, in the present invention, both the thicker and the thinner are included. The meaning is defined as "film".

於本發明中,樹脂係除了單體或寡聚物以外,亦包含聚合物之概念,其係指硬化後成為抗靜電層或HC層等其他功能層之基質的成分。In the present invention, the resin includes a polymer in addition to a monomer or an oligomer, and means a component which becomes a matrix of an antistatic layer or another functional layer such as an HC layer after curing.

於本發明中,所謂分子量,於具有分子量分佈之情形時,係指作為於THP(Tetrahydrofuran,四氫呋喃)溶劑中藉由凝膠滲透層析法(GPC,Gel Permeation Chromatograph)所測定之聚苯乙烯換算值的重量平均分子量,於不具有分子量分佈之情形時,係指化合物本身之分子量。In the present invention, the molecular weight as used in the case of having a molecular weight distribution means polystyrene conversion as measured by gel permeation chromatography (GPC, Gel Permeation Chromatograph) in a solvent of THP (Tetrahydrofuran). The weight average molecular weight of the value, when not having a molecular weight distribution, refers to the molecular weight of the compound itself.

於本發明中,所謂微粒子之平均粒徑,於組成物中之微粒之情形時,係指使用日機裝(股)製造之Microtrac粒度分析計所測定的值,於硬化膜中之微粒子之情形時,係指藉由穿透式電子顯微鏡(TEM,Transmission electron microscopy)照片所觀察之硬化膜之剖面的10個粒子之平均值。In the present invention, the average particle diameter of the fine particles in the case of the fine particles in the composition refers to the value measured by the Microtrac particle size analyzer manufactured by the Japanese machine (strand), and the case of the fine particles in the cured film. In the meantime, it means an average value of 10 particles of a cross section of the cured film observed by a transmission electron microscopy (TEM) photograph.

於本發明中,所謂滲透,係指使TAC基材溶解或膨潤。In the present invention, the term "permeation" means that the TAC substrate is dissolved or swollen.

於本發明中,所謂固形份,係指去除溶劑之成分。In the present invention, the solid portion means a component from which a solvent is removed.

(抗靜電層用硬化性樹脂組成物)(curable resin composition for antistatic layer)

本發明之抗靜電層用硬化性樹脂組成物之特徵在於包含:The curable resin composition for an antistatic layer of the present invention is characterized by comprising:

(A)抗靜電劑,(A) antistatic agent,

(B)於1分子中具有2個以上之光硬化性基、且分子量為900以下之多官能單體,以及(B) a polyfunctional monomer having two or more photocurable groups in one molecule and having a molecular weight of 900 or less, and

(C)於1分子中具有6個以上之(甲基)丙烯醯基、且重量平均分子量為1000~11000之丙烯酸胺基甲酸酯,(C) an urethane urethane having 6 or more (meth) acrylonitrile groups in one molecule and having a weight average molecular weight of 1,000 to 11,000.

該(A)相對於該(A)、(B)及(C)之總量之比例為1~30質量%,且該(C)相對於該(B)及(C)之總量之比例為1~40質量%。The ratio of the (A) to the total amount of the (A), (B), and (C) is 1 to 30% by mass, and the ratio of the (C) to the total amount of the (B) and (C) It is 1 to 40% by mass.

藉由將抗靜電劑(A)之比例設為上述範圍,抗靜電層可賦予抗靜電性,且即便於在膜厚為1~5μm之抗靜電層上形成HC層之情形時,亦確保充分之灰塵附著防止性。By setting the ratio of the antistatic agent (A) to the above range, the antistatic layer can impart antistatic properties, and even when the HC layer is formed on the antistatic layer having a film thickness of 1 to 5 μm, sufficient securing is ensured. The dust adhesion prevention.

又,藉由將丙烯酸胺基甲酸酯(C)相對於多官能單體(B)及丙烯酸胺基甲酸酯(C)之總量之比例設為上述範圍,若於TAC基材上自TAC基材側起依序形成抗靜電層、HC層,則因丙烯酸胺基甲酸酯(C)不會滲透至TAC基材內,或相較於多官能單體(B)更不易滲透至TAC基材內,故於抗靜電層與HC層之界面上亦存在丙烯酸胺基甲酸酯(C),丙烯酸胺基甲酸酯(C)所具有之(甲基)丙烯醯基與HC層中之反應性基硬化結合,藉此可獲得抗靜電層與HC層之充分之密接性。Further, the ratio of the urethane urethane (C) to the total amount of the polyfunctional monomer (B) and the urethane acrylate (C) is in the above range, and is self-contained on the TAC substrate. The antistatic layer and the HC layer are sequentially formed on the TAC substrate side, since the urethane urethane (C) does not penetrate into the TAC substrate, or is less permeable to the polyfunctional monomer (B). In the TAC substrate, the urethane urethane (C) and the (meth) acrylonitrile and HC layer of the urethane urethane (C) are also present at the interface between the antistatic layer and the HC layer. The reactive group hardening is combined, whereby sufficient adhesion between the antistatic layer and the HC layer can be obtained.

進而,多官能單體(B)適度滲透至TAC基材內(並非一樣地滲透至相同深度,而是以梯度形式滲透),TAC基材中所存在之已滲透之多官能單體(B)的反應性基(光硬化性基)係與抗靜電層中所存在之多官能單體(B)之反應性基及丙烯酸胺基甲酸酯(C)之反應性基((甲基)丙烯醯基)硬化結合,因此亦可獲得抗靜電層與TAC基材之密接性。Further, the polyfunctional monomer (B) is moderately infiltrated into the TAC substrate (not uniformly penetrated to the same depth, but penetrated in a gradient form), and the infiltrated polyfunctional monomer (B) present in the TAC substrate Reactive group (photocurable group) and reactive group of polyfunctional monomer (B) present in antistatic layer and reactive group of urethane urethane (C) ((meth) propylene The sulfhydryl group is hardened and bonded, so that the adhesion between the antistatic layer and the TAC substrate can also be obtained.

以下,針對作為本發明之抗靜電層用組成物之必需成分的上述抗靜電劑(A)、多官能單體(B)及丙烯酸胺基甲酸酯(C)、以及可視需要而適當含有之其他成分加以說明。In the following, the antistatic agent (A), the polyfunctional monomer (B), and the urethane urethane (C) which are essential components of the composition for an antistatic layer of the present invention, and, if necessary, are appropriately contained. Other ingredients are explained.

(A:抗靜電劑)(A: antistatic agent)

抗靜電劑(A)係對作為抗靜電層用組成物之硬化膜之抗靜電層或光學薄膜賦予導電性來防止帶電,並具有賦予防止灰塵或塵土附著,或因帶電而產生步驟內不良之性質(亦即抗靜電性)之作用的成分。The antistatic agent (A) imparts conductivity to the antistatic layer or the optical film which is a cured film of the composition for an antistatic layer to prevent electrification, and has the effect of preventing dust or dust from adhering or causing malfunction in the step due to charging. A component that acts as a property (ie, antistatic).

作為抗靜電劑(A),可使用先前公知之抗靜電劑,並無特別限定。As the antistatic agent (A), a conventionally known antistatic agent can be used, and it is not particularly limited.

例如可列舉專利文獻1中所記載之四級銨鹽等陽離子性化合物、磺酸鹽等陰離子性化合物、胺基酸系等之兩性化合物、胺基醇系等之非離子性化合物、有機金屬化合物及金屬螯合物化合物、以及將該等化合物高分子量化而成之化合物、聚合性化合物、平均1次粒徑為1~100nm之氧化銦錫(ITO)等導電性超微粒子、以及脂肪族共軛系之聚乙炔等高分子型導電性組成物。For example, a cationic compound such as a quaternary ammonium salt described in Patent Document 1, an anionic compound such as a sulfonate, an amphoteric compound such as an amino acid, a nonionic compound such as an amino alcohol, or an organometallic compound can be given. And a metal chelate compound, a compound obtained by polymerizing the compound, a polymerizable compound, conductive ultrafine particles such as indium tin oxide (ITO) having an average primary particle diameter of 1 to 100 nm, and an aliphatic group. A polymer type conductive composition such as a polyacetylene of a yoke system.

於本發明之抗靜電層用硬化性樹脂組成物中,就抑制抗靜電劑(A)朝TAC基材之滲透、且塗佈性優異而言,較佳為抗靜電劑(A)係重量平均分子量為1000~50000之四級銨鹽。若超過上述上限,則組成物之塗佈性惡化,若低於上述下限,則抗靜電劑容易滲出至抗靜電層之與HC層之界面上,而有抗靜電層與HC層之密接性惡化的可能性。In the curable resin composition for an antistatic layer of the present invention, it is preferable to suppress the penetration of the antistatic agent (A) into the TAC substrate and to improve the coatability, and it is preferable that the antistatic agent (A) is an average weight. A quaternary ammonium salt having a molecular weight of from 1,000 to 50,000. When the above upper limit is exceeded, the coating property of the composition is deteriorated. When the amount is less than the lower limit, the antistatic agent easily bleeds out to the interface between the antistatic layer and the HC layer, and the adhesion between the antistatic layer and the HC layer is deteriorated. The possibility.

先前,抗靜電層之膜厚係因光學性能及透明性,以0.1~1μm左右之薄膜設置,但若為此種薄膜層,則為了賦予抗靜電性,必需將層內之組成物之大部分設為抗靜電性材料,因此難以添加足夠量之具有為了顯現與基材或其上方之層之密接性所必需的反應性基之樹脂組成物。因此,於本發明中,將膜厚設為1~5μm,較先前更厚,並確保抗靜電層與鄰接層之密接性,因此可充分地使抗靜電性材料以外之具有反應性基的樹脂組成物之添加變得可能。因膜厚增加,故較理想的是所添加之抗靜電劑選擇透明性較高之材料。於該方面,較佳為透明性高於無機材料之有機材料,進而,有機材料之中,著色極少之四級銨鹽最合適。當使用四級銨鹽時,於透明性基材為TAC之情形時,可使光學薄膜整體之全光線透過率變成90%以上,就此點而言亦較佳。又,亦可使霧值變成0.5%以下。全光線透過率可依據JIS K7361(1997),藉由村上色彩技術研究所製造之HM150等來測定,霧值可依據JIS K7136(2000),藉由村上色彩技術研究所製造之HM150等來測定。Conventionally, the film thickness of the antistatic layer is set to a film of about 0.1 to 1 μm due to optical properties and transparency. However, in the case of such a film layer, it is necessary to provide most of the composition in the layer in order to impart antistatic properties. Since it is an antistatic material, it is difficult to add a sufficient amount of the resin composition which has a reactive group necessary for the adhesiveness with the board|substrate or the layer above. Therefore, in the present invention, the film thickness is set to 1 to 5 μm, which is thicker than before, and the adhesion between the antistatic layer and the adjacent layer is ensured, so that a resin having a reactive group other than the antistatic material can be sufficiently obtained. The addition of the composition becomes possible. Since the film thickness is increased, it is preferable that the added antistatic agent selects a material having high transparency. In this respect, an organic material having higher transparency than an inorganic material is preferred, and among the organic materials, a quaternary ammonium salt having a very small coloration is most suitable. When a quaternary ammonium salt is used, when the transparent substrate is TAC, the total light transmittance of the entire optical film can be made 90% or more, which is also preferable. Further, the haze value may be made 0.5% or less. The total light transmittance can be measured by HM150 manufactured by Murakami Color Technology Research Institute according to JIS K7361 (1997), and the haze value can be measured by HM150 manufactured by Murakami Color Technology Research Institute according to JIS K7136 (2000).

進而,就藉由HC層與黏合劑成分之交聯反應來提高抗靜電層與HC層之密接性方面而言,較佳為該四級銨鹽具有光硬化性基。光硬化性基較佳為聚合性不飽和基,更佳為電離放射線硬化性不飽和基。作為其具體例,可列舉(甲基)丙烯醯基、(甲基)丙烯醯氧基、乙烯基及烯丙基等具有乙烯性不飽和鍵之基以及環氧基等。Further, in terms of improving the adhesion between the antistatic layer and the HC layer by crosslinking reaction between the HC layer and the binder component, it is preferred that the quaternary ammonium salt has a photocurable group. The photocurable group is preferably a polymerizable unsaturated group, and more preferably an ionizing radiation curable unsaturated group. Specific examples thereof include a group having an ethylenically unsaturated bond such as a (meth)acryl fluorenyl group, a (meth) acryloxy group, a vinyl group, and an allyl group, and an epoxy group.

作為此種重量平均分子量為1000~50000之四級銨鹽之市售品,例如可列舉三菱化學(股)製造之商品名H6100,以及新中村化學工業(股)製造之商品名Uniresin AS-10/M、Uniresin AS-12/M、Uniresin AS-15/M及Uniresin ASH26等。As a commercial item of such a quaternary ammonium salt having a weight average molecular weight of 1,000 to 50,000, for example, the trade name H6100 manufactured by Mitsubishi Chemical Corporation and the trade name Uniresin AS-10 manufactured by Shin-Nakamura Chemical Industry Co., Ltd. /M, Uniresin AS-12/M, Uniresin AS-15/M and Uniresin ASH26, etc.

於抗靜電層用組成物中,相對於抗靜電劑(A)與後述之多官能單體(B)及丙烯酸胺基甲酸酯(C)之總量,含有1~30質量%之抗靜電劑(A)。The antistatic layer composition contains 1 to 30% by mass of antistatic against the total amount of the antistatic agent (A) and the polyfunctional monomer (B) and the urethane acrylate (C) described later. Agent (A).

若抗靜電劑(A)之比例相對於上述總量(A+B+C)未滿1質量%,則無法獲得充分之抗靜電性能。又,若抗靜電劑(A)之比例相對於上述總量(A+B+C)超過30質量%,則抗靜電層用組成物中之多官能單體(B)及丙烯酸胺基甲酸酯(C)之比例減少,無法獲得抗靜電層與鄰接於該層之TAC基材或HC層之充分的密接性。If the ratio of the antistatic agent (A) is less than 1% by mass based on the total amount (A+B+C), sufficient antistatic properties cannot be obtained. In addition, when the ratio of the antistatic agent (A) exceeds 30% by mass based on the total amount (A+B+C), the polyfunctional monomer (B) and the acrylamide carboxylic acid in the composition for an antistatic layer are used. The ratio of the ester (C) is reduced, and sufficient adhesion between the antistatic layer and the TAC substrate or the HC layer adjacent to the layer cannot be obtained.

抗靜電劑(A)之比例相對於上述總量(A+B+C)為1~30質量%,但較佳為5~20質量%。The ratio of the antistatic agent (A) is from 1 to 30% by mass, preferably from 5 to 20% by mass, based on the total amount (A+B+C).

(B:多官能單體)(B: polyfunctional monomer)

多官能單體(B)係硬化後成為抗靜電層基質之黏合劑成分之一,且為1分子中具有2個以上之光硬化性基之分子量為900以下的單體。其係分子量較小且藉由為多官能而有助於提高抗靜電層內或與鄰接於抗靜電層之HC層之交聯密度,俾提昇密接性的成分。又,多官能單體藉由其至少一部分滲透至TAC基材內並硬化,而亦有助於提昇抗靜電層與TAC基材之密接性。The polyfunctional monomer (B) is one of the binder components of the antistatic layer matrix after curing, and is a monomer having a molecular weight of 900 or less having two or more photocurable groups in one molecule. It is a component which has a small molecular weight and contributes to an improvement in the adhesion density in the antistatic layer or the HC layer adjacent to the antistatic layer by the polyfunctionality, and improves the adhesion. Moreover, the polyfunctional monomer penetrates into the TAC substrate by at least a portion thereof and hardens, and also helps to improve the adhesion between the antistatic layer and the TAC substrate.

若多官能單體(B)之分子量超過900,則朝TAC基材之滲透性下降,而有無法獲得抗靜電層與TAC基材之充分密接性的可能性。When the molecular weight of the polyfunctional monomer (B) exceeds 900, the permeability to the TAC substrate is lowered, and there is a possibility that sufficient adhesion between the antistatic layer and the TAC substrate cannot be obtained.

多官能單體(B)之分子量只要為900以下即可,但就使多官能單體(B)適度地朝TAC基材滲透,並使抗靜電層與HC層之密接性及抗靜電性(表面電阻值)高度地並存之觀點而言,多官能單體(B)之分子量較佳為230以上,更佳為290以上。若分子量小於230,則多官能單體(B)朝TAC基材之滲透並不適度,會有全部滲透至一樣之深度而產生新的界面之情況,且有於其界面所反射之光與在抗靜電層與HC層之界面所反射之光、或於HC層表面所反射之光之間產生光干擾,並產生干擾條紋而導致外觀惡化之可能性。The molecular weight of the polyfunctional monomer (B) may be 900 or less, but the polyfunctional monomer (B) is appropriately infiltrated into the TAC substrate, and the antistatic layer and the HC layer are adhered and antistatic ( The molecular weight of the polyfunctional monomer (B) is preferably 230 or more, and more preferably 290 or more, from the viewpoint of high surface resistance. If the molecular weight is less than 230, the polyfunctional monomer (B) penetrates into the TAC substrate and is uncomfortable, and all of them penetrate to the same depth to create a new interface, and the light reflected at the interface thereof The light reflected by the interface between the antistatic layer and the HC layer or the light reflected on the surface of the HC layer generates light interference, and the possibility of disturbing the stripes causes deterioration of appearance.

作為多官能單體(B),可使用一種或兩種以上。As the polyfunctional monomer (B), one type or two or more types can be used.

多官能單體(B)之光硬化性基係為了形成交聯結構而為2個以上,較佳為具有3個以上,更佳為具有5個以上。若為3個以上,則容易獲得抗靜電層與HC層及TAC基材之充分密接性。作為光硬化性基,可列舉與抗靜電劑中所列舉之光硬化性基相同者。The photocurable group of the polyfunctional monomer (B) is two or more in order to form a crosslinked structure, preferably three or more, and more preferably five or more. When it is three or more, it is easy to obtain sufficient adhesiveness of the antistatic layer, the HC layer, and the TAC substrate. The photocurable group is the same as the photocurable group listed in the antistatic agent.

作為多官能單體(B),例如可列舉季戊四醇三(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯及三羥甲基丙烷六(甲基)丙烯酸酯以及該等之改質體。Examples of the polyfunctional monomer (B) include pentaerythritol tri(meth)acrylate, dipentaerythritol hexa(meth)acrylate, dipentaerythritol penta(meth)acrylate, and trimethylolpropane tris(methyl). Acrylates and trimethylolpropane hexa(meth) acrylate and such modified bodies.

再者,作為改質體,可列舉EO(Ethylene oxide,環氧乙烷)改質體、PO(Propylene oxide,環氧丙烷)改質體、CL(Caprolactone,己內酯)改質體及異三聚氰酸改質體等。Further, examples of the modified body include an EO (Ethylene oxide) modified body, a PO (Propylene oxide) modified body, and a CL (Caprolactone, caprolactone) modified body and a modified form. Cyanuric acid modified body, etc.

於上述多官能單體中,就硬化反應性之觀點而言,與甲基丙烯醯相比,光硬化性基為丙烯醯基更佳。Among the above polyfunctional monomers, the photocurable group is more preferably an acrylonitrile group than the methacrylium oxime from the viewpoint of curing reactivity.

作為多官能單體(B),尤其可較佳地使用二季戊四醇五丙烯酸酯(DPPA,Di-Pentaerythritol pentaacrylate)、二季戊四醇六丙烯酸酯(DPHA)。As the polyfunctional monomer (B), dipentaerythritol pentaacrylate (DPPA, dipentaerythritol pentaacrylate) or dipentaerythritol hexaacrylate (DPHA) can be preferably used.

於本發明之抗靜電層用組成物中,多官能單體(B)滿足上述抗靜電劑之含有比例,且相對於多官能單體(B)與後述之丙烯酸胺基甲酸酯(C)之總量為60~99質量%。若未滿60質量%,則無法獲得抗靜電層與HC層及TAC基材之充分之密接性。又,若超過99質量%,則丙烯酸胺基甲酸酯(C)之比例較少,無法獲得抗靜電層與HC層之充分之密接性。In the antistatic layer composition of the present invention, the polyfunctional monomer (B) satisfies the content ratio of the above antistatic agent, and is based on the polyfunctional monomer (B) and an urethane urethane (C) described later. The total amount is 60 to 99% by mass. If it is less than 60% by mass, sufficient adhesion between the antistatic layer and the HC layer and the TAC substrate cannot be obtained. On the other hand, when it exceeds 99% by mass, the ratio of the urethane amide (C) is small, and sufficient adhesion between the antistatic layer and the HC layer cannot be obtained.

(C:丙烯酸胺基甲酸酯)(C: urethane acrylate)

丙烯酸胺基甲酸酯(C)係硬化後成為抗靜電層基質的黏合劑成分之一,其1分子中具有6個以上之(甲基)丙烯醯基,且重量平均分子量為1000~11000,較佳為1000~10000,更佳為1000~5000。The urethane urethane (C) is one of the binder components of the antistatic layer matrix after curing, and has six or more (meth) acrylonitrile groups in one molecule, and the weight average molecular weight is from 1,000 to 11,000. It is preferably from 1,000 to 10,000, more preferably from 1,000 to 5,000.

藉由重量平均分子量為1000~11000,塗佈性良好,不滲透至TAC基材內,或相較於多官能單體(B)更不易滲透至TAC基材內,容易控制滲透,且確實地存在於整個抗靜電層中。By having a weight average molecular weight of 1000 to 11,000, good coatability, impermeability into the TAC substrate, or less penetration into the TAC substrate than the polyfunctional monomer (B), it is easy to control the permeation, and surely Present in the entire antistatic layer.

於抗靜電劑(A)為四級銨鹽之情形時,作為該化合物之性質,與親水性化合物之相容性較佳。因此,若抗靜電層中之黏合劑為具有OH基之化合物(PETA、PETTA(季戊四醇四丙烯酸酯)、DPPA(二季戊四醇五丙烯酸酯)等),則抗靜電劑過度分散於整個層中,而無法獲得抗靜電性。已知DPHA於結構式上不含OH基,但通常於合成上難以形成100%之6官能,因此實際上係與5官能或4官能部分之混合化合物,由於通常所市售之樹脂係殘留有OH基之化合物,故而無法獲得較佳之抗靜電性。When the antistatic agent (A) is a quaternary ammonium salt, the compatibility with the hydrophilic compound is preferred as the properties of the compound. Therefore, if the binder in the antistatic layer is a compound having an OH group (PETA, PETTA (pentaerythritol tetraacrylate), DPPA (dipentaerythritol pentaacrylate), etc.), the antistatic agent is excessively dispersed throughout the layer, and Antistatic properties are not available. It is known that DPHA does not contain an OH group in a structural formula, but it is generally difficult to form a 100% hexafunctional group by synthesis, and thus it is actually a mixed compound of a 5-functional or a tetra-functional moiety, since a resin which is usually commercially available remains. The compound of the OH group cannot provide better antistatic properties.

可控制該分散性者係屬於疏水性樹脂之丙烯酸胺基甲酸酯(C)。藉由使丙烯酸胺基甲酸酯(C)存在於整個層中,於抗靜電劑(A)為四級銨鹽系之情形時,可確實地控制抗靜電劑於層內過度分散、或在與HC之界面方向滲出之情況。容易於HC界面方向滲出之原因在於,如上所述,因四級銨鹽喜歡親水性,故將抗靜電層積層並硬化時,於其表面存在空氣,與該空氣中之水分發生反應而滲出。The dispersible person can be controlled to be an acrylic urethane (C) which is a hydrophobic resin. By allowing the urethane acrylate (C) to be present throughout the layer, when the antistatic agent (A) is a quaternary ammonium salt system, the antistatic agent can be surely controlled to be excessively dispersed in the layer, or The situation in which the interface with the HC oozes out. The reason why it is easy to bleed out in the direction of the HC interface is that, as described above, since the quaternary ammonium salt is hydrophilic, when the antistatic layer is hardened, air is present on the surface thereof, and it reacts with the moisture in the air to ooze out.

而且,藉由具有6個以上之(甲基)丙烯醯基,有助於提高抗靜電層內或與鄰接於抗靜電層之HC層中之反應性基的交聯密度,而提昇抗靜電層與HC層之密接性。又,由於提高滲透至TAC基材之抗靜電層之多官能單體(B)的反應性基、與抗靜電層中所存在之丙烯酸胺基甲酸酯(C)之(甲基)丙烯醯基或多官能單體的反應性基之交聯密度,故而丙烯酸胺基甲酸酯(C)亦有助於提昇抗靜電層與TAC基材之密接性。於自密接性方面來看之情形時,不添加丙烯酸胺基甲酸酯(C),只要除抗靜電劑(A)以外係具有大量反應性基之多官能單體(B)即可,但為了如上述般控制抗靜電劑(A)於抗靜電層內之變動,若僅為多官能單體(B),則難以控制,為了抗靜電劑(A)不分散,需要疏水性且具有大量反應性基之丙烯酸胺基甲酸酯(C)。Moreover, by having 6 or more (meth) acrylonitrile groups, it is possible to increase the crosslinking density in the antistatic layer or the reactive groups in the HC layer adjacent to the antistatic layer, and to enhance the antistatic layer. Adhesion to the HC layer. Further, the reactive group of the polyfunctional monomer (B) which penetrates the antistatic layer of the TAC substrate and the (meth)acrylic acid amide of the urethane amide (C) present in the antistatic layer are increased. The crosslink density of the reactive groups of the base or polyfunctional monomer, so that the urethane acrylate (C) also contributes to the adhesion between the antistatic layer and the TAC substrate. In the case of self-adhesiveness, the urethane (C) is not added, as long as the polyfunctional monomer (B) having a large amount of reactive groups other than the antistatic agent (A) is used, but In order to control the fluctuation of the antistatic agent (A) in the antistatic layer as described above, it is difficult to control only the polyfunctional monomer (B), and it is required to be hydrophobic and has a large amount in order to prevent the antistatic agent (A) from being dispersed. Reactive acrylic amide (C).

又,含有丙烯酸胺基甲酸酯(C)係對於抑制捲曲(翹曲)之產生亦有效。Further, the urethane-containing acrylate (C) is also effective for suppressing the occurrence of curl (warpage).

若丙烯酸胺基甲酸酯(C)之重量平均分子量未滿1000,則存在如下之可能性:丙烯酸胺基甲酸酯(C)容易滲透至TAC基材內,過度滲透至TAC基材內,導致抗靜電層與HC層之界面之丙烯醯基減少,難以獲得抗靜電層與HC層之密接性。If the weight average molecular weight of the urethane acrylate (C) is less than 1,000, there is a possibility that the urethane acrylate (C) easily penetrates into the TAC substrate and excessively penetrates into the TAC substrate. The acrylonitrile group at the interface between the antistatic layer and the HC layer is reduced, and it is difficult to obtain the adhesion between the antistatic layer and the HC layer.

若丙烯酸胺基甲酸酯(C)之重量平均分子量超過11000,則存在塗佈性惡化之可能性。When the weight average molecular weight of the urethane urethane (C) exceeds 11,000, there is a possibility that the coatability is deteriorated.

只要丙烯酸胺基甲酸酯(C)具有6個以上之(甲基)丙烯醯基,則亦可含有電離放射線硬化性不飽和基等其他交聯反應性之官能基。(甲基)丙烯醯基只要合計具有6個以上之丙烯醯基與甲基丙烯醯基即可,可僅具有丙烯醯基,亦可僅具有甲基丙烯醯基。When the urethane urethane (C) has six or more (meth) acrylonitrile groups, it may contain other crosslinking reactive functional groups such as ionizing radiation curable unsaturated groups. The (meth)acrylonyl group may have only 6 or more acrylonitrile groups and a methacrylium group, and may have only an acryloyl group or only a methacryl group.

作為本發明之丙烯酸胺基甲酸酯(C),只要具有胺基甲酸酯鍵(-NH-CO-O-)、具有6個以上之(甲基)丙烯醯基、且為上述重量平均分子量,則並無特別限定。作為丙烯酸胺基甲酸酯(C),較佳為製成塗膜時光透過之透光性者,亦可根據要求性能等而適當採用屬於藉由以紫外線或電子束所代表之電離放射線而硬化之樹脂的電離放射線硬化性丙烯酸胺基甲酸酯、其他公知之丙烯酸胺基甲酸酯等。The urethane urethane (C) of the present invention has a urethane bond (-NH-CO-O-), has 6 or more (meth) acrylonitrile groups, and has the above weight average. The molecular weight is not particularly limited. The urethane acrylate (C) is preferably one which is light-transmitting when it is formed into a coating film, and may be suitably hardened by ionizing radiation represented by ultraviolet rays or electron beams according to required properties and the like. The ionizing radiation-curable urethane urethane of the resin, other known urethane acrylates, and the like.

作為上述丙烯酸胺基甲酸酯之市售品,例如可列舉專利文獻1中所記載之日本合成化學工業(股)製造之商品名UV1700B、根上工業(股)製造之商品名UN3320HS、荒川化學工業(股)製造之商品名BS577以及新中村化學工業(股)製造之商品名U15HA、U15H、U9HA、U9H、U6HA及U6H等。As a commercial item of the said urethane amide, the brand name UV1700B manufactured by the Japan Synthetic Chemical Industry Co., Ltd., and the brand name UN3320HS manufactured by Gyeongsei Industrial Co., Ltd., and Arakawa Chemical Industry are mentioned, for example. The trade name BS577 manufactured by the company and the trade names U15HA, U15H, U9HA, U9H, U6HA and U6H manufactured by Shin-Nakamura Chemical Industry Co., Ltd.

於本發明之抗靜電層用組成物中,丙烯酸胺基甲酸酯(C)係滿足上述抗靜電劑之含有比例,且相對於上述多官能單體(B)與丙烯酸胺基甲酸酯(C)之總量為1~40質量%。若未滿1質量%,則無法獲得抗靜電層與HC層之充分密接性。又,若超過40質量%,則多官能單體(B)之比例較少,無法獲得抗靜電層與TAC基材之充分密接性。In the composition for an antistatic layer of the present invention, the urethane acrylate (C) satisfies the content ratio of the above antistatic agent, and is relative to the above polyfunctional monomer (B) and urethane acrylate ( The total amount of C) is 1 to 40% by mass. If it is less than 1% by mass, sufficient adhesion between the antistatic layer and the HC layer cannot be obtained. On the other hand, when it exceeds 40% by mass, the proportion of the polyfunctional monomer (B) is small, and sufficient adhesion between the antistatic layer and the TAC substrate cannot be obtained.

丙烯酸胺基甲酸酯(C)之比例係相對於上述總量(B+C)為1~40質量%,但較佳為5~30質量%。The ratio of the urethane acrylate (C) is from 1 to 40% by mass, preferably from 5 to 30% by mass, based on the total amount (B+C).

如此,藉由黏合劑中之多官能單體(B)、丙烯酸胺基甲酸酯(C)之比例適當,抗靜電劑(A)既不會於抗靜電層內過度分散,亦不會滲出,可於層內以可發揮抗靜電性之程度集中存在。正因為其為該組成,抗靜電層之表面電阻率才能夠成為未滿1×1012 Ω/□。Thus, by the ratio of the polyfunctional monomer (B) and the urethane acrylate (C) in the binder, the antistatic agent (A) is neither excessively dispersed nor exuded in the antistatic layer. It can be concentrated in the layer to the extent that it can exert antistatic properties. Because of this composition, the surface resistivity of the antistatic layer can be less than 1 × 10 12 Ω / □.

於抗靜電層用組成物中,除上述(A)、(B)及(C)成分以外,視需要亦可含有適當之溶劑及聚合起始劑。以下,對該等其他成分加以說明。The antistatic layer composition may contain, in addition to the above components (A), (B) and (C), a suitable solvent and a polymerization initiator. Hereinafter, these other components will be described.

(溶劑)(solvent)

作為溶劑,可使用專利文獻1中所記載之丙酮等酮系溶劑、乙酸甲酯等酯系溶劑、乙腈等含氮系溶劑、甲基乙二醇等二醇系溶劑、THF等醚系溶劑、二氯甲烷等鹵化烴溶劑及甲基賽路蘇等二醇醚系溶劑等滲透性溶劑。As the solvent, a ketone solvent such as acetone described in Patent Document 1, an ester solvent such as methyl acetate, a nitrogen-containing solvent such as acetonitrile, a glycol solvent such as methyl glycol, or an ether solvent such as THF can be used. A osmotic solvent such as a halogenated hydrocarbon solvent such as dichloromethane or a glycol ether solvent such as methyl sarbuta.

作為滲透性溶劑,較佳為選自由乙酸甲酯、乙酸乙酯、乙酸丁酯、甲基乙基酮、甲基異丁基酮(MIBK,Methyl Isobutyl Ketone)及環己酮所組成之群組中的至少一種。As the osmotic solvent, it is preferably selected from the group consisting of methyl acetate, ethyl acetate, butyl acetate, methyl ethyl ketone, methyl isobutyl ketone (MIBK, Methyl Isobutyl Ketone) and cyclohexanone. At least one of them.

又,亦可使用丙二醇單甲基醚(PGME,Propylene Glycol Monomethyl Ether)、正丙醇、異丙醇、正丁醇、第二丁醇、異丁醇及第三丁醇等非滲透性溶劑。Further, a non-permeable solvent such as propylene glycol monomethyl ether (PGME, Propylene Glycol Monomethyl Ether), n-propanol, isopropanol, n-butanol, second butanol, isobutanol or tert-butanol can also be used.

上述溶劑可單獨地使用一種,亦可將兩種以上混合來使用。These solvents may be used singly or in combination of two or more.

於本發明之抗靜電層用組成物中,就推測藉由使用滲透性溶劑,可促進上述多官能單體(B)朝TAC基材之滲透、提昇抗靜電層與TAC基材之密接性而言,較佳為使用滲透性溶劑。In the composition for an antistatic layer of the present invention, it is presumed that by using a permeable solvent, the penetration of the above polyfunctional monomer (B) into the TAC substrate can be promoted, and the adhesion between the antistatic layer and the TAC substrate can be improved. In other words, it is preferred to use a permeable solvent.

又,於本發明之抗靜電層用組成物中,就推測藉由使用非滲透性溶劑,可抑制上述丙烯酸胺基甲酸酯(C)朝TAC基材之滲透、提昇抗靜電層與HC層之密接性而言,較佳為使用非滲透性溶劑。Further, in the composition for an antistatic layer of the present invention, it is presumed that by using a non-permeable solvent, the penetration of the urethane urethane (C) toward the TAC substrate can be suppressed, and the antistatic layer and the HC layer can be lifted. In terms of adhesion, it is preferred to use a non-permeable solvent.

因此,於本發明之抗靜電層用組成物中,於溶劑為一種之情形時,較佳為使用滲透溶劑,但於兩種以上溶劑之情形時,最佳為將滲透性溶劑與非滲透性溶劑組合使用。其原因在於,雖然即便係一種溶劑(僅滲透溶劑),亦可藉由丙烯酸胺基甲酸酯(C)之分子量來控制滲透,但將滲透性溶劑與非滲透性溶劑組合使用可更容易地控制滲透,而獲得使用組成物之抗靜電層之穩定的性能。Therefore, in the composition for an antistatic layer of the present invention, it is preferred to use a penetrating solvent when the solvent is one, but it is preferable to use a penetrating solvent and a non-permeability in the case of two or more solvents. The solvent is used in combination. The reason for this is that although the permeation can be controlled by the molecular weight of the urethane urethane (C) even if it is a solvent (permeating only the solvent), it is easier to use the osmotic solvent in combination with the non-permeable solvent. The penetration is controlled to obtain stable performance of the antistatic layer using the composition.

於將滲透性溶劑與非滲透性溶劑組合使用之情形時,較佳為其質量比為滲透性溶劑:非滲透性溶劑=100:0~50:50,較佳為90:10~50:50,且相對於抗靜電層用組成物之總固形份100質量份為30~500質量份。When the osmotic solvent is used in combination with the non-permeable solvent, it is preferred that the mass ratio is a permeable solvent: a non-permeable solvent = 100:0 to 50:50, preferably 90:10 to 50:50. Further, it is 30 to 500 parts by mass based on 100 parts by mass of the total solid content of the composition for an antistatic layer.

(聚合起始劑)(polymerization initiator)

聚合起始劑係開始或促進上述黏合劑成分(B)之交聯反應之成分,視需要可適當地選擇使用先前公知之自由基及陽離子聚合起始劑等。作為自由基聚合起始劑,例如可較佳地使用Ciba Japan(股)製造之商品名Irgacure184(1-羥基-環己基-苯基-酮)。於使用聚合起始劑之情形時,其含量相對於抗靜電層用組成物之總固形份之合計質量,較佳為0.4~2.0質量%。藉由如上述般將抗靜電層用組成物中所使用之聚合起始劑之量設為HC層中所使用之聚合起始劑之量的1/10~1/2,可使抗靜電層之反應性基大量殘留。藉此,反應難以進行,故亦防止捲曲之產生。The polymerization initiator is a component which starts or promotes the crosslinking reaction of the above-mentioned binder component (B), and if necessary, a conventionally known radical and cationic polymerization initiator or the like can be appropriately selected and used. As the radical polymerization initiator, for example, Irgacure 184 (1-hydroxy-cyclohexyl-phenyl-ketone) manufactured by Ciba Japan Co., Ltd. can be preferably used. In the case of using a polymerization initiator, the content thereof is preferably from 0.4 to 2.0% by mass based on the total mass of the total solid content of the antistatic layer composition. The antistatic layer can be made by setting the amount of the polymerization initiator used in the composition for an antistatic layer to 1/10 to 1/2 of the amount of the polymerization initiator used in the HC layer as described above. The reactive groups remain in large amounts. Thereby, the reaction is difficult to carry out, so that the occurrence of curling is also prevented.

(抗靜電層用硬化性樹脂組成物之製備)(Preparation of a curable resin composition for an antistatic layer)

上述抗靜電層用硬化性樹脂組成物可藉由使上述(A)、(B)及(C)成分混合分散於溶劑中而獲得。又,即便無溶劑,上述(A)、(B)或(C)成分仍具有充分之流動性之情形時,亦可無溶劑。混合分散可使用塗料振盪機或珠磨機等公知之方法。The curable resin composition for an antistatic layer can be obtained by mixing and dispersing the above components (A), (B) and (C) in a solvent. Further, even if the component (A), (B) or (C) has sufficient fluidity even in the absence of a solvent, it may be solvent free. As the mixed dispersion, a known method such as a paint shaker or a bead mill can be used.

於本發明之抗靜電層用硬化性樹脂組成物中,藉由將抗靜電劑(A)設為上述範圍,亦可使上述抗靜電層用硬化性樹脂組成物之膜厚為1~5μm之硬化物的表面電阻值未滿1×1012 Ω/□。藉由使抗靜電層為此種抗靜電性能,即便積層膜厚比較厚之HC層,亦可於整個光學薄膜中發揮優異之灰塵附著防止性能。In the curable resin composition for an antistatic layer of the present invention, the antistatic agent (A) is in the above range, and the film thickness of the curable resin composition for an antistatic layer may be 1 to 5 μm. The surface resistance of the cured product is less than 1 × 10 12 Ω / □. By making the antistatic layer such an antistatic property, even if the HC layer having a relatively thick film thickness is laminated, excellent dust adhesion preventing performance can be exhibited in the entire optical film.

若抗靜電層之膜厚未滿1μm,則為了維持相同之表面電阻而必需增加作為抗靜電劑之四級銨鹽之量,但於該情形時,存在抗靜電劑之反應性基減少,抗靜電層與HC層之密接惡化之可能性。When the film thickness of the antistatic layer is less than 1 μm, it is necessary to increase the amount of the quaternary ammonium salt as the antistatic agent in order to maintain the same surface resistance. However, in this case, the reactive group of the antistatic agent is reduced and resistant. The possibility that the adhesion between the electrostatic layer and the HC layer deteriorates.

若抗靜電層之膜厚超過5μm,則表面電阻容易表現,但存在產生捲曲、成本升高、處理性惡化之可能性。When the film thickness of the antistatic layer exceeds 5 μm, the surface resistance is likely to be expressed, but there is a possibility that curling occurs, the cost increases, and the handleability deteriorates.

進而,於抗靜電層用組成物中,藉由使抗靜電劑(A)相對於抗靜電劑(A)、多官能單體(B)及丙烯酸胺基甲酸酯(C)之總量為5~20質量%,且使丙烯酸胺基甲酸酯(C)相對於多官能單體(B)及丙烯酸胺基甲酸酯(C)之總量為5~30質量%,除了可獲得充分之抗靜電性以外,亦可獲得光學薄膜之密接性對於紫外線(UV)之優異的耐久性。Further, in the composition for an antistatic layer, the total amount of the antistatic agent (A) relative to the antistatic agent (A), the polyfunctional monomer (B), and the urethane acrylate (C) is 5 to 20% by mass, and the total amount of the urethane urethane (C) relative to the polyfunctional monomer (B) and the urethane acrylate (C) is 5 to 30% by mass, in addition to being sufficiently obtained. In addition to the antistatic property, excellent durability of the optical film to ultraviolet rays (UV) can be obtained.

(光學薄膜)(optical film)

本發明之光學薄膜係於三醋酸纖維素基材之一面側,自該三醋酸纖維素基材側起鄰接地設置膜厚為1~5 μm之抗靜電層及硬塗層而成者,其特徵在於,該抗靜電層包含上述抗靜電層用硬化性樹脂組成物之硬化物,且上述多官能單體(B)滲透至三醋酸纖維素基材之抗靜電層側之界面側的區域並硬化。The optical film of the present invention is one surface side of a cellulose triacetate substrate, and an antistatic layer and a hard coat layer having a film thickness of 1 to 5 μm are provided adjacent to each other from the side of the cellulose triacetate substrate. The antistatic layer includes a cured product of the curable resin composition for an antistatic layer, and the polyfunctional monomer (B) penetrates into a region on the interface side of the antistatic layer side of the triacetylcellulose substrate. hardening.

即便係於TAC基材之一面側自TAC基材側起設置膜厚為1~5μm之抗靜電層、及HC層的光學薄膜,藉由抗靜電層包含上述抗靜電層用硬化性樹脂組成物之硬化物,仍可成為具有充分之灰塵附著防止性,並且HC層與抗靜電層之密接性優異者。又,藉由使多官能單體(B)滲透至TAC基材之抗靜電層側之界面側的區域並硬化,亦可獲得抗靜電層與TAC基材之密接性。作為光學薄膜整體,可獲得優異之灰塵附著防止性能。The antistatic layer having a film thickness of 1 to 5 μm and the optical film of the HC layer are provided on the surface side of the TAC substrate from the side of the TAC substrate, and the curable resin composition for the antistatic layer is contained in the antistatic layer. The cured product can still have sufficient dust adhesion prevention property and is excellent in adhesion between the HC layer and the antistatic layer. Further, by allowing the polyfunctional monomer (B) to permeate into the region on the interface side of the antistatic layer side of the TAC substrate and hardening, adhesion between the antistatic layer and the TAC substrate can be obtained. As the entire optical film, excellent dust adhesion prevention performance can be obtained.

於本發明之光學薄膜之較佳之形態中,藉由使抗靜電層由上述抗靜電層用組成物之硬化物形成,亦可使光學薄膜之上述硬塗層、上述抗靜電層及上述三醋酸纖維素基材間之方格密接性試驗的密接率為90~100%,且使於溫度30℃、濕度40%下以每小時500 W/m2 之光量照射192小時紫外線後(以下,有時僅稱為「耐紫外線(UV,Ultraviolet)試驗後」)之該密接率為80~100%。In a preferred embodiment of the optical film of the present invention, the antistatic layer may be formed of a cured product of the antistatic layer composition, or the hard coat layer of the optical film, the antistatic layer, and the triacetate may be used. The adhesion ratio of the cell adhesion test between the cellulose substrates is 90 to 100%, and after irradiating the ultraviolet rays for 192 hours at a temperature of 30 ° C and a humidity of 40% at an amount of 500 W/m 2 per hour (hereinafter, there are The adhesion rate, which is simply referred to as "after UV (Ultraviolet) test), is 80 to 100%.

該密接率表示HC層、抗靜電層及TAC基材之密接,即抗靜電層與HC層間之密接及抗靜電層與TAC基材間之密接性。The adhesion ratio indicates the adhesion between the HC layer, the antistatic layer, and the TAC substrate, that is, the adhesion between the antistatic layer and the HC layer, and the adhesion between the antistatic layer and the TAC substrate.

於習知之具有不含丙烯酸胺基甲酸酯(C),主要僅含有多官能單體(B)作為黏合劑之組成物,或即便含有丙烯酸胺基甲酸酯(C)亦未以特定之比例含有抗靜電劑(A)、多官能單體(B)及丙烯酸胺基甲酸酯(C)之組成物的硬化物所構成之抗靜電層之光學薄膜中,抗靜電層與TAC基材間之密接雖良好,但抗靜電層與HC層間之密接並不充分。如此,於抗靜電層與HC層間之密接性並不充分之情形時,若進行密接性試驗,則抗靜電層與TAC基材間雖不產生剝離,但抗靜電層與HC層之間會產生剝離而剝落。於抗靜電層與TAC基材間之密接並不充分之情形時,抗靜電層與TAC基材間會產生剝離而剝落。因此,作為光學薄膜,為了獲得優異之密接性,需要抗靜電層與HC層間之密接及抗靜電層與TAC基材間之密接。It is conventionally known that it does not contain an urethane acrylate (C), mainly contains only a polyfunctional monomer (B) as a binder, or even contains an urethane acrylate (C). An antistatic layer and a TAC substrate in an optical film comprising an antistatic layer composed of a cured product of an antistatic agent (A), a polyfunctional monomer (B), and a composition of an urethane urethane (C) Although the adhesion between the two is good, the adhesion between the antistatic layer and the HC layer is not sufficient. When the adhesion between the antistatic layer and the HC layer is insufficient, if the adhesion test is performed, the antistatic layer and the TAC substrate are not peeled off, but an antistatic layer and the HC layer are generated. Peel off and peel off. When the adhesion between the antistatic layer and the TAC substrate is insufficient, peeling and peeling may occur between the antistatic layer and the TAC substrate. Therefore, in order to obtain excellent adhesion as an optical film, adhesion between the antistatic layer and the HC layer and adhesion between the antistatic layer and the TAC substrate are required.

藉由使上述抗靜電層用組成物硬化而形成抗靜電層,膜厚為1~5μm之抗靜電層與HC層間之密接及抗靜電層與TAC基材間之密接優異,作為光學薄膜整體顯現優異之密接性。尤其,該密接性於耐UV試驗後較顯著。本發明之光學薄膜於耐UV試驗後亦顯現優異之密接性。The antistatic layer is cured to form an antistatic layer, and the antistatic layer having a thickness of 1 to 5 μm is in close contact with the HC layer and the adhesion between the antistatic layer and the TAC substrate is excellent, and the entire optical film is formed. Excellent adhesion. In particular, the adhesion is more remarkable after the UV resistance test. The optical film of the present invention also exhibits excellent adhesion after the UV resistance test.

圖1係表示本發明之光學薄膜之層構成之一例的示意圖。於三醋酸纖維素基材10之一面側,依序鄰接地設置有抗靜電層20及硬塗層30。圖2係表示本發明之光學薄膜之層構成之另一例的示意圖。在與圖1相同之光學薄膜之硬塗層上進而設置有低折射率層40。Fig. 1 is a schematic view showing an example of a layer configuration of an optical film of the present invention. On one side of the triacetylcellulose substrate 10, an antistatic layer 20 and a hard coat layer 30 are provided adjacent to each other in this order. Fig. 2 is a schematic view showing another example of the layer constitution of the optical film of the present invention. A low refractive index layer 40 is further provided on the hard coat layer of the optical film similar to that of FIG.

以下,對作為本發明之光學薄膜之必需構成要素的三醋酸纖維素基材、抗靜電層及硬塗層,暨可視需要而適當設置之高折射率層、中折射率層、低折射率層、防眩層及防污層等其他層加以說明。In the following, a triacetate substrate, an antistatic layer, and a hard coat layer, which are essential components of the optical film of the present invention, and a high refractive index layer, a medium refractive index layer, and a low refractive index layer which are appropriately provided as needed Other layers such as an anti-glare layer and an anti-fouling layer are described.

(三醋酸纖維素基材)(triacetate cellulose substrate)

本發明中所使用之三醋酸纖維素基材係透光性較高之三醋酸纖維素薄膜,且只要為滿足可用作光學薄膜之透光性基材之物性者,則並無特別限定,可適當地選擇使用先前公知之硬塗薄膜或光學薄膜之TAC基材。The cellulose triacetate substrate used in the present invention is a cellulose triacetate film having high light transmittance, and is not particularly limited as long as it satisfies the physical properties of a light-transmitting substrate which can be used as an optical film. A TAC substrate using a previously known hard coat film or optical film can be suitably selected.

可見光區域380~780nm中之TAC基材之平均透光率較佳為80%以上,特佳為90%以上。再者,透光率之測定係採用使用紫外可見分光光度計(例如島津製作所(股)製造之商品名UV-3100PC),於室溫、大氣中所測定之值。The average light transmittance of the TAC substrate in the visible light region of 380 to 780 nm is preferably 80% or more, and particularly preferably 90% or more. Further, the measurement of the light transmittance is a value measured at room temperature or in the atmosphere using an ultraviolet-visible spectrophotometer (for example, trade name UV-3100PC manufactured by Shimadzu Corporation).

可對TAC基材實施皂化處理或設置底塗層等表面處理。又,可添加抗靜電劑等添加劑。The TAC substrate may be subjected to a saponification treatment or a surface treatment such as an undercoat layer. Further, an additive such as an antistatic agent may be added.

TAC基材之厚度並無特別限定,通常為30~200μm,較佳為40~200μm。The thickness of the TAC substrate is not particularly limited, but is usually 30 to 200 μm, preferably 40 to 200 μm.

(抗靜電層)(antistatic layer)

本發明之抗靜電層係由上述抗靜電層用硬化性樹脂組成物之硬化物所構成,膜厚為1~5μm。若膜厚薄於1μm,則無法獲得充分之抗靜電性能,無法充分地添加為了確保與其他層之密接性而必需之黏合劑。若厚於5μm,則由於抗靜電劑若未以某種程度緊密地存在於層內則無法發揮性能,故而抗靜電層之捲曲變大,因此加工性惡化,若膜厚進一步變厚,則所包含之抗靜電劑等之量增加,成本增加。The antistatic layer of the present invention is composed of a cured product of the curable resin composition for an antistatic layer, and has a film thickness of 1 to 5 μm. When the film thickness is thinner than 1 μm, sufficient antistatic performance cannot be obtained, and an adhesive necessary for ensuring adhesion to other layers cannot be sufficiently added. When the thickness is more than 5 μm, the antistatic agent does not exhibit the performance in a layer, and the performance of the antistatic layer is increased. Therefore, the workability is deteriorated, and if the film thickness is further increased, the film thickness is further increased. The amount of the antistatic agent or the like contained therein increases, and the cost increases.

作為抗靜電層之性能,表面電阻較佳為未滿1×1012 Ω/□,更佳為1×1011 Ω/□以下、進而為1×1010 Ω/□以下。只要抗靜電層之表面電阻良好,積層有HC層之光學薄膜的灰塵附著防止性可更良好。As the performance of the antistatic layer, the surface resistance is preferably less than 1 × 10 12 Ω / □, more preferably 1 × 10 11 Ω / □ or less, and further preferably 1 × 10 10 Ω / □ or less. As long as the surface resistance of the antistatic layer is good, the dust adhesion prevention property of the optical film in which the HC layer is laminated can be further improved.

(硬塗層)(hard coating)

硬塗層係於JIS K5600-5-4(1999)中規定之鉛筆硬度試驗(4.9 N負荷)中,顯示「H」以上之硬度的層,且對本發明之光學薄膜賦予硬度。The hard coat layer is a layer having a hardness of "H" or more in a pencil hardness test (4.9 N load) prescribed in JIS K5600-5-4 (1999), and imparts hardness to the optical film of the present invention.

HC層包含硬塗層用組成物之硬化物,可使用先前公知之硬塗層,亦可為包含僅含黏合劑成分之硬塗層用組成物的硬化物者,另外,亦可於組成物中含有上述抗靜電層用組成物中所列舉之聚合起始劑等。為了提高HC層之硬度等,亦可含有先前公知之賦予硬度之成分,例如日本專利特開2008-165040號公報中記載之具有與黏合劑成分之交聯反應性的反應性二氧化矽微粒子。The HC layer contains a cured product of a composition for a hard coat layer, and may be a previously known hard coat layer or a hardened material containing a composition for a hard coat layer containing only a binder component, or may be a composition. The polymerization initiator and the like listed in the composition for an antistatic layer are contained therein. In order to increase the hardness of the HC layer, etc., it is also possible to contain a component which has been previously known to impart hardness. For example, a reactive cerium oxide microparticle having cross-linking reactivity with a binder component described in JP-A-2008-165040.

作為具體例,可藉由將含有電離放射線硬化性樹脂作為透明樹脂之樹脂組成物塗佈於透明基材上,並使該樹脂組成物中所包含之單體、寡聚物及預聚物交聯及/或聚合而形成HC層。As a specific example, a resin composition containing an ionizing radiation curable resin as a transparent resin can be applied onto a transparent substrate, and the monomers, oligomers, and prepolymers contained in the resin composition can be mixed. The HC layer is formed by polymerization and/or polymerization.

作為透明樹脂,較佳為電離放射線硬化性樹脂,作為單體、寡聚物及預聚物之官能基,較佳為電離放射線聚合性之官能基,其中較佳為光聚合性官能基。藉由該官能基與抗靜電層用樹脂組成物中之丙烯酸胺基甲酸酯(C)之反應性基硬化結合,可獲得抗靜電層與HC層之充分之密接性。The transparent resin is preferably an ionizing radiation curable resin, and the functional group of the monomer, the oligomer, and the prepolymer is preferably a functional group for ionizing radiation polymerization, and among them, a photopolymerizable functional group is preferable. By bonding the functional group to the reactive group of the urethane urethane (C) in the resin composition for an antistatic layer, sufficient adhesion between the antistatic layer and the HC layer can be obtained.

作為光聚合性官能基,可列舉(甲基)丙烯醯基、乙烯基、苯乙烯基、烯丙基等不飽和聚合性官能基等。Examples of the photopolymerizable functional group include an unsaturated polymerizable functional group such as a (meth)acryl fluorenyl group, a vinyl group, a styryl group, and an allyl group.

又,作為預聚物及寡聚物,可列舉(甲基)丙烯酸胺基甲酸酯、聚酯(甲基)丙烯酸酯、環氧(甲基)丙烯酸酯等丙烯酸酯、不飽和聚酯、環氧樹脂等。Further, examples of the prepolymer and the oligomer include acrylates such as (meth)acrylic acid urethane, polyester (meth) acrylate, and epoxy (meth) acrylate, and unsaturated polyesters. Epoxy resin, etc.

作為單體,可列舉苯乙烯、α-甲基苯乙烯等苯乙烯系單體,(甲基)丙烯酸甲酯、(甲基)丙烯酸-2-乙基己酯、季戊四醇(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、季戊四醇乙氧基四(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、三羥甲基丙烷乙氧基三(甲基)丙烯酸酯、甘油丙氧基三丙烯酸酯、二-三羥甲基丙烷四丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯、雙酚F之EO改質二(甲基)丙烯酸酯、雙酚A之EO改質二(甲基)丙烯酸酯、異三聚氰酸EO改質二(甲基)丙烯酸酯、異三聚氰酸EO改質三(甲基)丙烯酸酯、聚丙二醇二(甲基)丙烯酸酯、三羥甲基丙烷PO改質三(甲基)丙烯酸酯、三羥甲基丙烷EO改質三(甲基)丙烯酸酯、二-三羥甲基丙烷四(甲基)丙烯酸酯等丙烯酸系單體,三羥甲基丙烷三硫代乙醇酸酯、三羥甲基丙烷三硫代丙醇鹽、季戊四醇四硫甘醇等分子中具有2個以上之硫醇基的多元醇化合物,又,具有2個以上之不飽和鍵之(甲基)丙烯酸胺基甲酸酯或聚酯(甲基)丙烯酸酯等。Examples of the monomer include styrene monomers such as styrene and α-methylstyrene, methyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, and pentaerythritol (meth)acrylate. , pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, pentaerythritol ethoxy tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate, dipentaerythritol penta (meth) acrylate , trimethylolpropane tri(meth)acrylate, trimethylolpropane ethoxy tris(meth)acrylate, glyceryl propoxy triacrylate, di-trimethylolpropane tetraacrylate, poly Ethylene glycol di(meth)acrylate, EO modified di(meth)acrylate of bisphenol F, EO modified di(meth)acrylate of bisphenol A, EO modified by octadecyl cyanate (Meth) acrylate, isomeric cyanuric acid EO modified tri(meth) acrylate, polypropylene glycol di(meth) acrylate, trimethylolpropane PO modified tri(meth) acrylate, three Hydroxymethylpropane EO modified tris(meth)acrylate, di-trimethylolpropane tetra(meth)acrylate, etc., acrylic acid monomer, trishydroxymethylpropane a polyhydric alcohol compound having two or more thiol groups in a molecule such as trithioglycolate, trimethylolpropane trithiopropanolate or pentaerythritol tetrathioethylene, and having two or more unsaturated bonds (meth)acrylic acid urethane or polyester (meth) acrylate or the like.

尤其,就提高交聯密度、獲得抗損傷性之觀點而言,較佳為多官能丙烯酸酯單體,其中,季戊四醇三(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯因與抗靜電層之密接良好、鉛筆硬度亦良好而更佳。又,於該等單體中混合胺基甲酸酯多官能丙烯酸酯等寡聚物成分亦可使硬度變得良好,並且使聚合收縮減少,可良好地形成防止捲曲或裂痕之性能,故較佳。In particular, from the viewpoint of increasing the crosslinking density and obtaining the damage resistance, a polyfunctional acrylate monomer is preferred, wherein pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol The (meth) acrylate and dipentaerythritol penta (meth) acrylate are more excellent in adhesion to the antistatic layer and good in pencil hardness. Further, by mixing an oligomer component such as a urethane polyfunctional acrylate with the monomers, the hardness can be improved, the polymerization shrinkage can be reduced, and the performance of preventing curling or cracking can be favorably formed. good.

於此種樹脂組成物中,亦可為了提昇硬度而含有二氧化矽等無機微粒子等。又,為了使與樹脂組成物之相容性變佳,可進行有機表面處理,亦可具有反應性基。In the resin composition, inorganic fine particles such as cerium oxide may be contained in order to increase the hardness. Further, in order to improve the compatibility with the resin composition, it may be subjected to an organic surface treatment or may have a reactive group.

又,作為黏合劑,亦可將聚合物添加至上述樹脂組成物中來使用。作為聚合物,例如可列舉聚甲基丙烯酸甲酯(PMMA,Polymethyl Methacrylate)、乙酸-丙酸纖維素(CAP,Cellulose Acetate Propionate)等。藉由添加聚合物,可調整塗液之黏度,藉此有使塗佈變得容易之優點。Further, as the binder, a polymer may be added to the above resin composition and used. Examples of the polymer include polymethyl methacrylate (PMMA), and cellulose acylate (CAP, Cellulose Acetate Propionate). By adding a polymer, the viscosity of the coating liquid can be adjusted, thereby having the advantage of facilitating coating.

又,於上述樹脂組成物中,視需要可添加光自由基聚合起始劑。較佳之添加量相對於上述樹脂組成物之總固形份的合計質量為0.8~8.0質量%。作為光自由基聚合起始劑,可使用苯乙酮類、苯偶姻類、二苯基酮類、氧化膦類、縮酮類、蒽醌類、9-氧硫類、偶氮化合物等。Further, a photoradical polymerization initiator may be added to the above resin composition as needed. The total amount of the added amount is preferably 0.8 to 8.0% by mass based on the total mass of the total solid content of the resin composition. As a photoradical polymerization initiator, acetophenones, benzoin, diphenyl ketones, phosphine oxides, ketals, anthracenes, 9-oxosulfuric acid can be used. Classes, azo compounds, and the like.

作為苯乙酮類,可列舉2,2-二甲氧基苯乙酮、2,2-二乙氧基苯乙酮、對二甲基苯乙酮、1-羥基-二甲基苯基酮、1-羥基-二甲基-對異丙基苯基酮、1-羥基環己基苯基酮、2-甲基-4-甲硫基-2-啉基苯丙酮、2-苄基-2-二甲基胺基-1-(4-啉基苯基)-丁酮、4-苯氧基二氯苯乙酮、4-第三丁基-二氯苯乙酮等,作為苯偶姻類,可列舉苯偶姻、苯偶姻甲醚、苯偶姻乙醚、苯偶姻異丙醚、苄基二甲基縮酮、苯偶姻苯磺酸酯、苯偶姻甲苯磺酸酯等。Examples of the acetophenones include 2,2-dimethoxyacetophenone, 2,2-diethoxyacetophenone, p-dimethylacetophenone, and 1-hydroxy-dimethylphenyl ketone. , 1-hydroxy-dimethyl-p-isopropylphenyl ketone, 1-hydroxycyclohexyl phenyl ketone, 2-methyl-4-methylthio-2- phenylpropiophenone, 2-benzyl-2 - dimethylamino-1-(4- phenylphenyl)-butanone, 4-phenoxydichloroacetophenone, 4-tert-butyl-dichloroacetophenone, etc., as benzoin The benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzyl dimethyl ketal, benzoin benzene sulfonate, benzoin tosylate, etc. .

又,作為二苯基酮類,可使用二苯基酮、羥基二苯基酮、4-苯甲醯基-4'-甲基二苯基硫化物、2,4-二氯二苯基酮、4,4-二氯二苯基酮及對氯二苯基酮、4,4'-二甲基胺基二苯基酮(米其勒酮)、3,3',4,4'-四(第三丁基過氧化羰基)二苯基酮等。Further, as the diphenyl ketone, diphenyl ketone, hydroxy diphenyl ketone, 4-benzylidene-4'-methyldiphenyl sulfide, 2,4-dichlorodiphenyl ketone can be used. , 4,4-dichlorodiphenyl ketone and p-chlorodiphenyl ketone, 4,4'-dimethylaminodiphenyl ketone (Michechone), 3,3',4,4'- Tetrakis(t-butylperoxycarbonyl)diphenyl ketone and the like.

又,亦可混合使用光敏劑,作為其具體例,可列舉正丁基胺、三乙胺、聚-正丁基膦等。Further, a photosensitizer may be used in combination, and specific examples thereof include n-butylamine, triethylamine, and poly-n-butylphosphine.

HC層之膜厚只要適當調節即可,例如,只要為1~20μm即可。較佳為5~15μm。若超過15μm則無法獲得優異之灰塵附著防止性能,若未滿5μm,則硬度變得不足、且密接性亦變弱。The film thickness of the HC layer may be appropriately adjusted, and may be, for example, 1 to 20 μm. It is preferably 5 to 15 μm. When it exceeds 15 μm, excellent dust adhesion preventing performance cannot be obtained, and if it is less than 5 μm, the hardness becomes insufficient and the adhesion is also weak.

通常,若積層於抗靜電層上之HC層變厚,則灰塵附著防止性能變差,但若為本案之構成及組成物,則可獲得優異之灰塵附著防止性能。In general, if the HC layer laminated on the antistatic layer is thick, the dust adhesion preventing performance is deteriorated, but if it is the composition and composition of the present invention, excellent dust adhesion preventing performance can be obtained.

於本發明之光學薄膜之較佳之實施形態中,即便如抗靜電層為1~5μm、HC層為5~15μm般於抗靜電層上積層有較厚之HC層,光學薄膜亦可獲得充分之灰塵附著防止性能、及充分之抗靜電層與HC層之密接性。In a preferred embodiment of the optical film of the present invention, even if a thick layer of HC is laminated on the antistatic layer such that the antistatic layer is 1 to 5 μm and the HC layer is 5 to 15 μm, the optical film can be sufficiently obtained. Dust adhesion prevention performance, and sufficient adhesion between the antistatic layer and the HC layer.

(其他層)(other layers)

於本發明之光學薄膜中,在不脫離本發明之主旨之範圍內,於上述HC層之與抗靜電層相反側的面上,亦可為了提昇光學薄膜之抗反射性、防眩性及防污性等而設置高折射率層、中折射率層、低折射率層、防眩層及防污層等其他層。In the optical film of the present invention, in the range of the opposite side of the HC layer from the antistatic layer, the antireflection, anti-glare and anti-reflection of the optical film may be improved in the range of the present invention. Other layers such as a high refractive index layer, a medium refractive index layer, a low refractive index layer, an antiglare layer, and an antifouling layer are provided for staining or the like.

(高折射率層及中折射率層)(high refractive index layer and medium refractive index layer)

高折射率層及中折射率層係為了調整本發明之光學薄膜之反射率而設置的層。於設置高折射率層之情形時,雖未圖示,但通常鄰接於低折射率層之TAC基材側而設置。又,於設置中折射率層之情形時,雖未圖示,但通常自TAC基材側起依序設置中折射率層、高折射率層及低折射率層。The high refractive index layer and the medium refractive index layer are layers provided to adjust the reflectance of the optical film of the present invention. In the case where the high refractive index layer is provided, although not shown, it is usually provided adjacent to the TAC substrate side of the low refractive index layer. Further, in the case where the medium refractive index layer is provided, although not shown, the medium refractive index layer, the high refractive index layer, and the low refractive index layer are usually provided in this order from the TAC substrate side.

高折射率層及中折射率層包含主要含有黏合劑成分及折射率調整用粒子之組成物的硬化物。作為黏合劑成分,可使用抗靜電層用組成物中所列舉之多官能單體等。作為折射率調整用粒子,例如可列舉粒徑為100nm以下之微粒子。作為此種微粒子,可列舉選自由氧化鋅(折射率:1.90)、二氧化鈦(折射率:2.3~2.7)、二氧化鈰(折射率:1.95)、摻錫氧化銦(折射率:1.95)、摻銻氧化錫(折射率:1.80)、氧化釔(折射率:1.87)、氧化鋯(折射率:2.0)所組成之群組中之一種以上。The high refractive index layer and the medium refractive index layer include a cured product mainly containing a binder component and a composition for refractive index adjusting particles. As the binder component, a polyfunctional monomer or the like exemplified as the composition for an antistatic layer can be used. Examples of the particles for adjusting the refractive index include fine particles having a particle diameter of 100 nm or less. Examples of such fine particles include zinc oxide (refractive index: 1.90), titanium dioxide (refractive index: 2.3 to 2.7), cerium oxide (refractive index: 1.95), tin-doped indium oxide (refractive index: 1.95), and doping. One or more of the group consisting of antimony tin oxide (refractive index: 1.80), cerium oxide (refractive index: 1.87), and zirconia (refractive index: 2.0).

具體而言,高折射率層之折射率較佳為1.50~2.80。中折射率層之折射率低於高折射率層之折射率,較佳為1.50~2.00。Specifically, the refractive index of the high refractive index layer is preferably from 1.50 to 2.80. The refractive index of the medium refractive index layer is lower than the refractive index of the high refractive index layer, preferably 1.50 to 2.00.

高折射率層及中折射率層之膜厚只要適當調節即可,較佳為50~300 nm。The film thickness of the high refractive index layer and the medium refractive index layer may be appropriately adjusted, and is preferably 50 to 300 nm.

(低折射率層)(low refractive index layer)

低折射率層包含含有二氧化矽或氟化鎂等折射率較低之成分及黏合劑成分之組成物、或者含有偏二氟乙烯共聚物等含氟樹脂之低折射率層用組成物的硬化物,可形成先前公知之低折射率層。The low refractive index layer contains a composition containing a component having a low refractive index such as cerium oxide or magnesium fluoride and a binder component, or a composition for a low refractive index layer containing a fluorine-containing resin such as a vinylidene fluoride copolymer. A previously known low refractive index layer can be formed.

於用於形成低折射率層的組成物中,為了降低低折射率層之折射率,亦可含有中空粒子。中空粒子係指具有外殼層且被外殼層所包圍之內部為多孔質組織或空洞之粒子。該多孔質組織或空洞中含有空氣(折射率:1),藉由使低折射率層含有折射率為1.20~1.45之中空粒子中,可降低低折射率層之折射率。中空粒子之平均粒徑較佳為1~100nm。中空粒子可使用先前公知之低折射率層中所使用者,例如可例舉日本專利特開2008-165040號公報中所記載之具有空隙的微粒子。In the composition for forming the low refractive index layer, hollow particles may be contained in order to lower the refractive index of the low refractive index layer. Hollow particles refer to particles having an outer shell layer and surrounded by an outer shell layer, which are porous structures or voids. The porous structure or cavity contains air (refractive index: 1), and by making the low refractive index layer contain hollow particles having a refractive index of 1.20 to 1.45, the refractive index of the low refractive index layer can be lowered. The average particle diameter of the hollow particles is preferably from 1 to 100 nm. As the hollow particles, those of the conventionally known low refractive index layer can be used, and for example, fine particles having voids as described in JP-A-2008-165040 can be used.

當上述脂肪酸金屬鹽粒子之個數平均一次粒徑未滿上述下限時,存在如下之情形:容易產生脂肪酸金屬鹽粒子彼此之凝聚、或脂肪酸金屬鹽粒子對於著色樹脂粒子之掩埋等不良情況,對碳粉之印字性能造成不良影響。When the number average primary particle diameter of the fatty acid metal salt particles is less than the lower limit, there are cases in which aggregation of fatty acid metal salt particles or aggregation of the fatty acid metal salt particles with the colored resin particles is likely to occur. The printing performance of toner has an adverse effect.

另一方面,當上述脂肪酸金屬鹽粒子之個數平均一次粒徑超過上述上限時,存在如下之情形:脂肪酸金屬鹽粒子易於自著色樹脂粒子游離(脫離),無法將所需之外添劑之功能(對碳粉賦予帶電穩定性、及流動性等之功能)充分地賦予至碳粉粒子,對碳粉之印字性能造成不良影響。On the other hand, when the number average primary particle diameter of the above-mentioned fatty acid metal salt particles exceeds the above upper limit, there is a case where the fatty acid metal salt particles are easily released (disengaged) from the colored resin particles, and it is impossible to add the desired additives. The function (the function of imparting charge stability and fluidity to the toner) is sufficiently imparted to the toner particles, which adversely affects the printing performance of the toner.

(防眩層)(anti-glare layer)

防眩層包含含有黏合劑成分及防眩劑之防眩層用組成物之硬化物,黏合劑成分可使用上述抗靜電層用組成物中所列舉之多官能單體等。The antiglare layer contains a cured product of a composition for an antiglare layer containing a binder component and an antiglare agent, and the binder component may be a polyfunctional monomer or the like exemplified for the composition for an antistatic layer.

作為防眩劑,可列舉微粒子,例如可列舉苯乙烯顆粒(折射率為1.59)、三聚氰胺顆粒(折射率為1.57)及丙烯酸顆粒(折射率為1.49)等。此種賦予防眩性之微粒子之平均粒徑較佳為100~500nm。賦予防眩性之微粒子之含量相對於防眩層用組成物中所包含之黏合劑成分的總質量,較佳為2~30質量%。Examples of the antiglare agent include fine particles, and examples thereof include styrene particles (refractive index: 1.59), melamine particles (refractive index: 1.57), and acrylic particles (refractive index: 1.49). The average particle diameter of such fine particles imparting anti-glare property is preferably from 100 to 500 nm. The content of the fine particles to which the anti-glare property is applied is preferably 2 to 30% by mass based on the total mass of the binder component contained in the composition for an anti-glare layer.

(防污層)(anti-fouling layer)

根據本發明之較佳之態樣,為了防止光學薄膜最表面之污漬,可於光學薄膜之與TAC基材相反側的最表面設置防污層。藉由防污層,可對光學薄膜謀求防污性及耐擦傷性之進一步的改善。防污層包含含有防污劑及黏合劑成分之防污層用組成物之硬化物。According to a preferred aspect of the present invention, in order to prevent stains on the outermost surface of the optical film, an antifouling layer may be provided on the outermost surface of the optical film opposite to the TAC substrate. By the antifouling layer, the optical film can be further improved in antifouling properties and scratch resistance. The antifouling layer contains a cured product of an antifouling layer composition containing an antifouling agent and a binder component.

防污層用組成物之黏合劑成分可使用先前公知者,例如可使用上述抗靜電層用組成物中列舉之多官能單體。As the binder component of the composition for an antifouling layer, a conventionally known one can be used. For example, a polyfunctional monomer exemplified as the composition for an antistatic layer can be used.

防污層用組成物中所包含之防污劑可自公知之均化劑等防污劑中適當選擇一種或兩種以上來使用。防污劑之含量相對於防污層用組成物中所包含之黏合劑成分的總質量,較佳為0.1~5質量%。The antifouling agent to be contained in the antifouling layer composition can be appropriately selected from one or two or more kinds selected from the known antifouling agents such as a leveling agent. The content of the antifouling agent is preferably from 0.1 to 5% by mass based on the total mass of the binder component contained in the antifouling layer composition.

(光學薄膜之製造方法)(Method of manufacturing optical film)

作為本發明之光學薄膜的製造方法,若為可獲得上述光學薄膜之層構成之方法,則並無特別限定,可使用先前公知之方法。The method for producing the optical film of the present invention is not particularly limited as long as it is a layer forming the optical film, and a conventionally known method can be used.

作為其一例,包括如下步驟:(i)準備三醋酸纖維素基材;(ii)準備上述抗靜電層用組成物及硬塗層用組成物;(iii)於該TAC基材之一面側塗佈該抗靜電層用組成物來製成塗膜;(iv)對該抗靜電層用組成物之塗膜進行光照射,使其硬化而形成抗靜電層;(v)於抗靜電層上塗佈該硬塗層用組成物來製成塗膜;(vi)對該HC層用組成物之塗膜進行光照射,使其硬化而形成HC層。As an example, the method includes the steps of: (i) preparing a cellulose triacetate substrate; (ii) preparing the composition for an antistatic layer and a composition for a hard coat layer; and (iii) coating the surface of the TAC substrate The antistatic layer composition is used to form a coating film; (iv) the coating film of the antistatic layer composition is irradiated with light to be hardened to form an antistatic layer; (v) coated on the antistatic layer. The hard coat layer is formed into a coating film by the composition; (vi) the coating film of the composition for the HC layer is irradiated with light to be hardened to form an HC layer.

此外,亦可於上述(iv)步驟中不使抗靜電層用組成物之塗膜完全硬化(full cure),而使其半硬化(half cure),並於該半硬化之塗膜上塗佈HC層用組成物來製成塗膜,使該半硬化之塗膜與HC層用組成物之塗膜合併後進行光照射,然後使其完全硬化而獲得光學薄膜。藉由如上述般使用半硬化法,有抗靜電層與HC層之密接性提高之優點。Further, in the above step (iv), the coating film of the composition for an antistatic layer may not be completely cured, but half cured, and coated on the semi-hardened coating film. The HC layer was coated with a composition to form a coating film, and the semi-cured coating film was combined with the coating film of the HC layer composition, and then subjected to light irradiation, and then completely cured to obtain an optical film. By using the semi-hardening method as described above, there is an advantage that the adhesion between the antistatic layer and the HC layer is improved.

塗佈方法只要使用先前公知之方法即可,並無特別限定,可使用凹版塗佈法、旋塗法、浸漬法、噴霧法、斜板式塗佈法、棒塗法、輥塗法、彎月面塗佈法、快乾印刷法、網版印刷法及液滴塗佈法等各種方法。The coating method is not particularly limited as long as it is a conventionally known method, and a gravure coating method, a spin coating method, a dipping method, a spray method, a swash plate coating method, a bar coating method, a roll coating method, and a meniscus can be used. Various methods such as a face coating method, a quick-drying printing method, a screen printing method, and a droplet coating method.

光照射主要使用紫外線、可見光、電子束或電離放射線等。於紫外線硬化之情形時,使用自超高壓水銀燈、高壓水銀燈、低壓水銀燈、碳弧燈、氙弧燈、金屬鹵化物燈等之光線發出的紫外線等。能量射線源之照射量以紫外線波長365nm下之累計曝光量計為50~500mJ/cm2 。半硬化之情形時之照射量為5~50mJ/cm2 。於除光照射亦進行加熱之情形時,通常於40℃~120℃之溫度下進行處理。Light irradiation mainly uses ultraviolet rays, visible light, electron beams or ionizing radiation. In the case of ultraviolet curing, ultraviolet rays emitted from light such as an ultrahigh pressure mercury lamp, a high pressure mercury lamp, a low pressure mercury lamp, a carbon arc lamp, a xenon arc lamp, a metal halide lamp, or the like are used. The amount of irradiation of the energy ray source is 50 to 500 mJ/cm 2 in terms of the cumulative exposure amount at an ultraviolet wavelength of 365 nm. In the case of semi-hardening, the irradiation amount is 5 to 50 mJ/cm 2 . In the case of heating in addition to light irradiation, it is usually treated at a temperature of 40 ° C to 120 ° C.

於塗佈抗靜電層用組成物後、且進行光照射前,亦可進行乾燥。作為乾燥方法,例如可列舉減壓乾燥或加熱乾燥、進而將該等乾燥加以組合之方法等。又,於以常壓進行乾燥之情形時,較佳為於30~110℃下進行乾燥。例如,於使用甲基乙基酮作為抗靜電層用組成物之溶劑之情形時,可於室溫~80℃、較佳為40℃~70℃之範圍內的溫度下,進行20秒~3分鐘、較佳為30秒~1分鐘之乾燥步驟。After the composition for the antistatic layer is applied and before the light irradiation, it may be dried. Examples of the drying method include a method of drying under reduced pressure, heating and drying, and further drying. Further, in the case of drying at normal pressure, drying is preferably carried out at 30 to 110 °C. For example, when methyl ethyl ketone is used as a solvent for the composition for an antistatic layer, it can be carried out at a temperature of from room temperature to 80 ° C, preferably from 40 ° C to 70 ° C for 20 seconds to 3 seconds. A drying step of from minute to minute, preferably from 30 seconds to 1 minute.

HC層或低折射率層等之組成物只要以與上述抗靜電層相同之方法製備即可。又,於在HC層上設置低折射率層等之情形時,可使用上述抗靜電層之塗佈方法或硬化方法。The composition of the HC layer or the low refractive index layer or the like may be prepared in the same manner as the above antistatic layer. Further, when a low refractive index layer or the like is provided on the HC layer, the above-described antistatic layer coating method or curing method can be used.

(偏光板)(polarizer)

本發明之偏光板之特徵在於:於上述光學薄膜之三醋酸纖維素基材側設置有偏光片。圖3係表示本發明之偏光板之層構成之一例的示意圖。圖3中所示之偏光板80具有光學薄膜1、及積層有保護薄膜50與偏光層60之偏光片70,且偏光片70設置於光學薄膜1之三醋酸纖維素基材10側。The polarizing plate of the present invention is characterized in that a polarizer is provided on the side of the cellulose triacetate substrate of the optical film. Fig. 3 is a schematic view showing an example of a layer configuration of a polarizing plate of the present invention. The polarizing plate 80 shown in FIG. 3 has an optical film 1 and a polarizing plate 70 in which a protective film 50 and a polarizing layer 60 are laminated, and the polarizing plate 70 is provided on the side of the cellulose acetate substrate 10 of the optical film 1.

再者,所謂於光學薄膜之三醋酸纖維素基材側配置有偏光片,不僅包括獨立地形成光學薄膜及偏光片之情形,亦包括構成光學薄膜之構件兼作構成偏光片之構件之情形。Further, a polarizing plate is disposed on the triacetate substrate side of the optical film, and includes not only the case where the optical film and the polarizer are independently formed, but also the member constituting the optical film as a member constituting the polarizer.

又,於將本發明之偏光板用於顯示面板之情形時,通常於偏光片側配置顯示面板。Further, when the polarizing plate of the present invention is used for a display panel, the display panel is usually disposed on the side of the polarizer.

再者,關於光學薄膜,由於只要使用上述光學薄膜即可,故而省略此處之說明。以下,對本發明之偏光板中之其他構成加以說明。In addition, as for the optical film, the above-mentioned optical film can be used, and the description herein is omitted. Hereinafter, other configurations of the polarizing plate of the present invention will be described.

(偏光片)(polarizer)

作為本發明中所使用之偏光片,若為具備既定之偏光特性者,則並無特別限定,可使用液晶顯示裝置中通常所使用之偏光片。The polarizer used in the present invention is not particularly limited as long as it has a predetermined polarizing property, and a polarizer generally used in a liquid crystal display device can be used.

關於偏光片之形態,若為可長時間保持既定之偏光特性之形態,則並無特別限定,例如可僅由偏光層構成,亦可為將保護薄膜與偏光層貼合而成者。於將保護薄膜與偏光層貼合之情形時,可僅於偏光層之單面上形成保護薄膜,亦可於偏光層之兩面上形成保護薄膜。The form of the polarizer is not particularly limited as long as it can maintain a predetermined polarizing characteristic for a long period of time. For example, it may be composed only of a polarizing layer, or may be a film or a polarizing layer. When the protective film is bonded to the polarizing layer, the protective film may be formed only on one surface of the polarizing layer, or the protective film may be formed on both surfaces of the polarizing layer.

作為偏光層,通常使用藉由使碘含浸於包含聚乙烯醇之薄膜中,並將其單軸延伸而形成有聚乙烯醇與碘之錯合物者。As the polarizing layer, a compound in which a mixture of polyvinyl alcohol and iodine is formed by impregnating iodine with a film containing polyvinyl alcohol and uniaxially stretching it is usually used.

又,作為保護薄膜,若為可保護上述偏光層、且具有所需之透光性者,則並無特別限定。作為保護薄膜之透光性,於可見光區域中之透過率較佳為80%以上,更佳為90%以上。再者,上述保護薄膜之透過率可藉由JIS K7361-1(塑膠-透明材料之全光透過率的試驗方法)進行測定。Further, the protective film is not particularly limited as long as it can protect the polarizing layer and has a desired light transmittance. The light transmittance in the visible light region is preferably 80% or more, and more preferably 90% or more, as the light transmittance of the protective film. Further, the transmittance of the protective film can be measured by JIS K7361-1 (Testing Method for Total Light Transmittance of Plastic-Transparent Material).

作為構成保護薄膜之樹脂,例如可列舉纖維素衍生物、環烯烴系樹脂、聚甲基丙烯酸甲酯、聚乙烯醇、聚醯亞胺、聚芳酯、聚對苯二甲酸乙二酯等。其中,較佳為使用纖維素衍生物或環烯烴系樹脂。Examples of the resin constituting the protective film include a cellulose derivative, a cycloolefin resin, polymethyl methacrylate, polyvinyl alcohol, polyimide, polyarylate, and polyethylene terephthalate. Among them, a cellulose derivative or a cycloolefin resin is preferably used.

保護薄膜可為包含單一層者,亦可為積層有複數層者。又,於保護薄膜為積層有複數層者之情形時,可積層有同一組成之複數層,又,亦可積層有具有不同組成之複數層。The protective film may be a single layer or a plurality of layers. Further, in the case where the protective film is a laminate having a plurality of layers, a plurality of layers having the same composition may be laminated, or a plurality of layers having different compositions may be laminated.

又,關於保護薄膜之厚度,若為可使本發明之偏光板之可撓性處於所需的範圍內、且藉由與偏光層貼合而可使偏光片之尺寸變化處於既定之範圍內的範圍,則並無特別限定,但較佳為5~200μm之範圍內,特佳為15~150μm之範圍內,更佳為30~100μm之範圍內。若上述厚度薄於5μm,則存在本發明之偏光板之尺寸變化變大的可能性。又,若上述厚度厚於200μm,則例如於對本發明之偏光板進行裁剪加工時,存在加工屑增加、或裁剪刀之磨損變快的可能性。Further, the thickness of the protective film can be such that the flexibility of the polarizing plate of the present invention is within a desired range and the size of the polarizer can be changed within a predetermined range by bonding to the polarizing layer. The range is not particularly limited, but is preferably in the range of 5 to 200 μm, particularly preferably in the range of 15 to 150 μm, and more preferably in the range of 30 to 100 μm. When the thickness is thinner than 5 μm, there is a possibility that the dimensional change of the polarizing plate of the present invention becomes large. Moreover, when the thickness is thicker than 200 μm, for example, when the polarizing plate of the present invention is cut, there is a possibility that the machining scrap increases or the wear of the cutting scissors becomes faster.

保護薄膜可為具有相位差性者。藉由使用具有相位差性之保護薄膜,存在可使本發明之偏光板成為具有顯示面板之視角補償功能者的優點。The protective film may be of phase difference. By using a protective film having phase difference, there is an advantage that the polarizing plate of the present invention can be made to have a viewing angle compensation function of a display panel.

作為保護薄膜具有相位差性之態樣,若為可顯現所需之相位差性之態樣,則並無特別限定。作為此種態樣,例如可列舉:保護薄膜具有包含單一層之構成,並含有顯現相位差性之光學特性顯現劑,藉此具有相位差性之態樣;以及藉由具有於包含上述樹脂之保護薄膜上積層有包含具有折射率各向異性之化合物之位相差層的構成,而具有相位差性之態樣。於本發明中,該等之任一態樣均可較佳地使用。The protective film has a phase difference, and is not particularly limited as long as it exhibits a desired phase difference. As such an aspect, for example, the protective film has a configuration including a single layer, and includes an optical property developing agent exhibiting phase difference, thereby having a phase difference property; and having a resin containing the above-mentioned resin The protective film is laminated with a phase difference layer containing a compound having refractive index anisotropy, and has a phase difference. In the present invention, any of these aspects can be preferably used.

(顯示面板)(display panel)

本發明之顯示面板之特徵在於,於上述光學薄膜之三醋酸纖維素基材側配置有顯示器。The display panel of the present invention is characterized in that a display is disposed on the cellulose acetate substrate side of the optical film.

作為顯示器,可列舉LCD、PDP、ELD(Electroluminescent Display,電場發光顯示器)(有機EL、無機EL)、CRT、觸控面板、電子紙、平板電腦(Tablet Personal Computer)等。Examples of the display include an LCD, a PDP, an ELD (Electroluminescent Display) (organic EL, inorganic EL), a CRT, a touch panel, an electronic paper, and a tablet personal computer.

本發明之顯示面板亦可用於觸控面板、電子紙、平板PC等。The display panel of the present invention can also be used for a touch panel, an electronic paper, a tablet PC, and the like.

作為上述顯示器之代表例之LCD係透過型,且係具備透過性顯示體及自背面照射其之光源裝置而成者。於上述顯示器為LCD之情形時,其係於該透過性顯示體之表面上配置本發明之光學薄膜或具備該光學薄膜之上述偏光板而成者。An LCD-based transmission type, which is a representative example of the display, is provided with a transmissive display body and a light source device that is irradiated from the back surface. In the case where the display is an LCD, the optical film of the present invention or the polarizing plate including the optical film is disposed on the surface of the transparent display.

作為上述顯示器之另一例之PDP係具備表面玻璃基板、及與該表面玻璃基板對向配置且兩者間填充有放電氣體之背面玻璃基板而成者。於上述顯示器為PDP之情形時,其亦為於表面玻璃基板之表面或其前面板(玻璃基板或薄膜基板)上具備上述光學薄膜者。A PDP which is another example of the above display includes a front glass substrate and a back glass substrate which is disposed to face the front glass substrate and is filled with a discharge gas therebetween. When the display is a PDP, the optical film is provided on the surface of the surface glass substrate or the front panel (glass substrate or film substrate).

上述顯示器亦可為將若施加電壓則發光之硫化鋅、二胺類物質等發光體蒸鍍於玻璃基板上,並控制施加於基板之電壓來進行顯示的ELD裝置,或者將電訊號轉換為光,產生人眼可見之像的CRT等顯示器。於此情形時,其係於ELD裝置或CRT之最表面或其前面板之表面上具備上述光學薄膜而成者。The display may be an ELD device that vapor-deposits an illuminant such as zinc sulfide or a diamine substance that emits light when a voltage is applied to a glass substrate, controls the voltage applied to the substrate, or converts the electric signal into light. A display such as a CRT that produces an image visible to the human eye. In this case, the optical film is provided on the surface of the ELD device or the CRT or the front surface of the front panel.

[實施例][Examples]

以下,列舉實施例更具體地說明本發明。本發明並不受該等記載限制。Hereinafter, the present invention will be more specifically described by way of examples. The invention is not limited by the description.

製備具有以下之組成之抗靜電層用組成物1及HC層用組成物1。The composition 1 for an antistatic layer and the composition 1 for an HC layer having the following composition were prepared.

(抗靜電層用組成物1)(Antistatic layer composition 1)

抗靜電劑(A):日本化成(股)製造之商品名UV-ASHC-01(重量平均分子量為20000,固形份為70%,固形份中四級銨鹽成分為15%):固形份換算1質量份Antistatic agent (A): The product name UV-ASHC-01 manufactured by Nippon Kasei Co., Ltd. (weight average molecular weight is 20000, solid content is 70%, and quaternary ammonium salt component is 15% in solid content): solid content conversion 1 part by mass

多官能單體(B):二季戊四醇六丙烯酸酯(DPHA)(商品名:KAYARAD DPHA,日本化藥(股)製造,6官能,分子量為578):64質量份Polyfunctional monomer (B): dipentaerythritol hexaacrylate (DPHA) (trade name: KAYARAD DPHA, manufactured by Nippon Kayaku Co., Ltd., 6-functional, molecular weight 578): 64 parts by mass

丙烯酸胺基甲酸酯(C):荒川化學工業(股)製造之商品名BS577(6官能,重量平均分子量為1000):35質量份Amino acrylate (C): Trade name BS577 (6-functional, weight average molecular weight: 1000) manufactured by Arakawa Chemical Industry Co., Ltd.: 35 parts by mass

聚合起始劑:Ciba Specialty Chemicals(股)製造之商品名Irgacure184(1-羥基環己基苯基酮):1質量份Polymerization initiator: trade name Irgacure 184 (1-hydroxycyclohexyl phenyl ketone) manufactured by Ciba Specialty Chemicals Co., Ltd.: 1 part by mass

甲基乙基酮:100質量份Methyl ethyl ketone: 100 parts by mass

(HC層用組成物1)(Composition for HC layer 1)

二季戊四醇六丙烯酸酯(商品名:KAYARAD DPHA,日本化藥(股)製造,6官能,分子量為578):98質量份Dipentaerythritol hexaacrylate (trade name: KAYARAD DPHA, manufactured by Nippon Kayaku Co., Ltd., 6-functional, molecular weight 578): 98 parts by mass

聚合起始劑:Ciba Specialty Chemicals(股)製造之商品名Irgacure184(1-羥基環己基苯基酮):4質量份Polymerization initiator: trade name Irgacure 184 (1-hydroxycyclohexyl phenyl ketone) manufactured by Ciba Specialty Chemicals Co., Ltd.: 4 parts by mass

甲基乙基酮:100質量份Methyl ethyl ketone: 100 parts by mass

(實施例1)(Example 1)

準備厚度為80μm之TAC基材(Fuji Film(股)製造之商品名TF80UL),於TAC基材之單面上塗佈所製備之上述抗靜電層用組成物1,並於溫度為70℃之熱烘箱中乾燥60秒鐘而使塗膜中之溶劑蒸發,然後以使累計光量達到50mJ之方式照射紫外線而使塗膜硬化,藉此形成乾燥時之厚度為2.5 μm的抗靜電層。A TAC substrate (trade name: TF80UL, manufactured by Fuji Film Co., Ltd.) having a thickness of 80 μm was prepared, and the prepared antistatic layer composition 1 was applied to one surface of the TAC substrate at a temperature of 70 ° C. The film was dried in a hot oven for 60 seconds to evaporate the solvent in the coating film, and then the coating film was cured by irradiating ultraviolet rays so as to have an integrated light amount of 50 mJ, thereby forming an antistatic layer having a thickness of 2.5 μm at the time of drying.

繼而,於所獲得之抗靜電層上塗佈所製備之上述硬塗層用組成物1,與抗靜電層同樣地進行乾燥,然後以使累計光量達到150mJ之方式照射紫外線而使塗膜硬化,形成乾燥時之厚度為12 μm的硬塗層,藉此製成於TAC基材之一面側自TAC基材側起依序具有抗靜電層及硬塗層之光學薄膜。Then, the composition 1 for the hard coat layer prepared by applying the obtained antistatic layer is dried in the same manner as the antistatic layer, and then the ultraviolet light is irradiated so that the cumulative amount of light reaches 150 mJ to cure the coating film. A hard coat layer having a thickness of 12 μm at the time of drying was formed, whereby an optical film having an antistatic layer and a hard coat layer in this order from the side of the TAC substrate on one side of the TAC substrate was prepared.

又,為了測定抗靜電層之表面電阻值,與上述光學薄膜同樣地於TAC基材(TF80UL)上進行至形成抗靜電層之步驟為止,而亦製成於TAC基材之一面側僅具有抗靜電層之積層體。Further, in order to measure the surface resistance value of the antistatic layer, the step of forming the antistatic layer on the TAC substrate (TF80UL) was carried out in the same manner as the above optical film, and it was also made to have only one side on the side of the TAC substrate. A layered body of an electrostatic layer.

(實施例2~7)(Examples 2 to 7)

於實施例1中,將抗靜電層用組成物1中所包含之抗靜電劑(A)、多官能單體(B)及丙烯酸胺基甲酸酯(C)之量或種類分別如表1所示般加以替換,除此以外,以與實施例1相同之方式製作光學薄膜及積層體。再者,實施例7中所使用之丙烯酸胺基甲酸酯(C)為商品名UV-7610B(日本合成製造)。In the first embodiment, the amounts or types of the antistatic agent (A), the polyfunctional monomer (B), and the urethane acrylate (C) contained in the composition 1 for an antistatic layer are as shown in Table 1. An optical film and a laminate were produced in the same manner as in Example 1 except that the above was replaced. Further, the urethane urethane (C) used in Example 7 is a trade name of UV-7610B (manufactured by Nippon Synthetic Co., Ltd.).

(比較例1、2)(Comparative Examples 1, 2)

於實施例1中,將抗靜電層用組成物1中所包含之抗靜電劑(A)、多官能單體(B)及丙烯酸胺基甲酸酯(C)之量分別如表1所示般加以替換,除此以外,以與實施例1相同之方式製作光學薄膜及積層體。In the first embodiment, the amounts of the antistatic agent (A), the polyfunctional monomer (B), and the urethane acrylate (C) contained in the composition 1 for an antistatic layer are as shown in Table 1. An optical film and a laminate were produced in the same manner as in Example 1 except that the procedure was replaced.

(比較例3)(Comparative Example 3)

於實施例1中,作為抗靜電層用組成物1中所包含之多官能單體(B),使用日本化藥(股)製造之R128H(單官能,分子量為222)來代替DPHA,並將抗靜電劑(A)、多官能單體(B)及丙烯酸胺基甲酸酯(C)之量分別如表1所示般加以替換,除此以外,以與實施例1相同之方式製作光學薄膜及積層體。In the first embodiment, R128H (monofunctional, molecular weight 222) manufactured by Nippon Kayaku Co., Ltd. is used as the polyfunctional monomer (B) contained in the composition 1 for the antistatic layer, and Opticals were produced in the same manner as in Example 1 except that the amounts of the antistatic agent (A), the polyfunctional monomer (B), and the urethane acrylate (C) were replaced as shown in Table 1, respectively. Film and laminate.

(比較例4)(Comparative Example 4)

於實施例1中,作為抗靜電層用組成物1中所包含之多官能單體(B),使用日本化藥(股)製造之DPCA60(6官能,分子量為1263)來代替DPHA,並將抗靜電劑(A)、多官能單體(B)及丙烯酸胺基甲酸酯(C)之量分別如表1所示般加以替換,除此以外,以與實施例1相同之方式製作光學薄膜及積層體。In the first embodiment, as the polyfunctional monomer (B) contained in the composition 1 for an antistatic layer, DPCA60 (6-functional, molecular weight 1263) manufactured by Nippon Kayaku Co., Ltd. is used instead of DPHA, and Opticals were produced in the same manner as in Example 1 except that the amounts of the antistatic agent (A), the polyfunctional monomer (B), and the urethane acrylate (C) were replaced as shown in Table 1, respectively. Film and laminate.

(比較例5)(Comparative Example 5)

於實施例1中,作為抗靜電層用組成物1中所包含之丙烯酸胺基甲酸酯(C),使用Daicel-Cytec(股)製造之EBECRYL270(2官能,分子量為1500)來代替BS577,並將抗靜電劑(A)、多官能單體(B)及丙烯酸胺基甲酸酯(C)之量分別如表1所示般加以替換,除此以外,以與實施例1相同之方式製作光學薄膜及積層體。In Example 1, as the urethane urethane (C) contained in the composition 1 for an antistatic layer, EBECRYL 270 (bifunctional, molecular weight 1500) manufactured by Daicel-Cytec Co., Ltd. was used instead of BS577. The amounts of the antistatic agent (A), the polyfunctional monomer (B), and the urethane acrylate (C) were replaced as shown in Table 1, except that the same manner as in Example 1 was carried out. Production of optical films and laminates.

(比較例6)(Comparative Example 6)

於實施例1中,作為抗靜電層用組成物1中所包含之丙烯酸胺基甲酸酯(C),使用Daicel-Cytec(股)製造之EBECRYL5129(6官能,分子量為800)來代替BS577,並將抗靜電劑(A)、多官能單體(B)及丙烯酸胺基甲酸酯(C)之量分別如表1所示般加以替換,除此以外,以與實施例1相同之方式製作光學薄膜及積層體。In Example 1, as the urethane urethane (C) contained in the composition 1 for an antistatic layer, EBECRYL 5129 (6-functional, molecular weight: 800) manufactured by Daicel-Cytec Co., Ltd. was used instead of BS577. The amounts of the antistatic agent (A), the polyfunctional monomer (B), and the urethane acrylate (C) were replaced as shown in Table 1, except that the same manner as in Example 1 was carried out. Production of optical films and laminates.

(比較例7)(Comparative Example 7)

於實施例1中,作為抗靜電層用組成物1中所包含之丙烯酸胺基甲酸酯(C),使用荒川化學工業(股)製造之BS371MLV(50官能,分子量為20000)來代替BS577,並將抗靜電劑(A)、多官能單體(B)及丙烯酸胺基甲酸酯(C)之量分別如表1所示般加以替換,除此以外,以與實施例1相同之方式製作光學薄膜及積層體。In the first embodiment, as the urethane urethane (C) contained in the composition 1 for the antistatic layer, BS371MLV (50-functional, molecular weight: 20000) manufactured by Arakawa Chemical Industry Co., Ltd. was used instead of BS577. The amounts of the antistatic agent (A), the polyfunctional monomer (B), and the urethane acrylate (C) were replaced as shown in Table 1, except that the same manner as in Example 1 was carried out. Production of optical films and laminates.

(比較例8~11)(Comparative Examples 8 to 11)

於實施例1中,將抗靜電層用組成物1中所包含之抗靜電劑(A)、多官能單體(B)及丙烯酸胺基甲酸酯(C)之量分別如表1所示般加以替換,除此以外,以與實施例1相同之方式製作光學薄膜及積層體。In the first embodiment, the amounts of the antistatic agent (A), the polyfunctional monomer (B), and the urethane acrylate (C) contained in the composition 1 for an antistatic layer are as shown in Table 1. An optical film and a laminate were produced in the same manner as in Example 1 except that the procedure was replaced.

(參考例1)(Reference example 1)

於實施例6中,將抗靜電層用組成物1中所包含之溶劑替換為僅為非滲透溶劑,除此以外,以與實施例6相同之方式製作光學薄膜及積層體。An optical film and a laminate were produced in the same manner as in Example 6 except that the solvent contained in the composition for the antistatic layer 1 was replaced with a solvent other than the non-permeable solvent.

(比較例12)(Comparative Example 12)

於實施例3中,將抗靜電層用組成物1中所包含之丙烯酸胺基甲酸酯(C)替換為己內酯改質二季戊四醇六丙烯酸酯(商品名:KAYARAD DPCA-60,日本化藥(股)製造),除此以外,以與實施例3相同之方式製作光學薄膜及積層體。該化合物因與DPHA相同之理由而存在親水性傾向。In Example 3, the urethane urethane (C) contained in the composition 1 for an antistatic layer was replaced with caprolactone-modified dipentaerythritol hexaacrylate (trade name: KAYARAD DPCA-60, Nippon Kasei) An optical film and a laminate were produced in the same manner as in Example 3 except for the production of a drug. This compound tends to be hydrophilic for the same reason as DPHA.

(參考例2)(Reference example 2)

於實施例3中,將抗靜電層用組成物1中所包含之抗靜電劑(A)替換為抗靜電劑(B)(金屬微粒子:ATO,商品名:ELCOM V3560,日揮觸媒化成製造),除此以外,以與實施例3相同之方式製作光學薄膜及積層體。In the third embodiment, the antistatic agent (A) contained in the composition 1 for an antistatic layer is replaced with an antistatic agent (B) (metal microparticles: ATO, trade name: ELCOM V3560, manufactured by a daily wave catalyst) An optical film and a laminate were produced in the same manner as in Example 3 except for the above.

(參考例3)(Reference Example 3)

於參考例2中,將抗靜電層用組成物1中所包含之抗靜電劑(B)的量如表1所示般增多,除此以外,以與參考例2相同之方式製作光學薄膜及積層體。In the same manner as in Reference Example 2, an optical film was produced in the same manner as in Reference Example 2, except that the amount of the antistatic agent (B) contained in the composition for antistatic layer 1 was increased as shown in Table 1. Laminated body.

(抗靜電層之表面電阻值之評價)(Evaluation of surface resistance value of antistatic layer)

針對實施例1~7、比較例1~12、及參考例1~3之基材上積層有抗靜電層之積層體,利用高電阻率計(Mitsubishi Chemical Analytech(股)製造之商品名Hiresta IP MCP-HT260)以施加電壓1000V測定表面電阻值。將其結果示於表1。再者,本案中所記載之表面電阻值的單位Ω/□係指Ω/sq.(每單位面積之電阻)。The laminate of the antistatic layer was laminated on the substrates of Examples 1 to 7, Comparative Examples 1 to 12, and Reference Examples 1 to 3, and a high resistivity meter (trade name Hiresta IP manufactured by Mitsubishi Chemical Analytech Co., Ltd.) was used. MCP-HT260) The surface resistance value was measured at an applied voltage of 1000V. The results are shown in Table 1. In addition, the unit Ω/□ of the surface resistance value described in the present invention means Ω/sq. (resistance per unit area).

(光學薄膜之灰塵附著防止性之評價)(Evaluation of dust adhesion prevention of optical film)

利用聚酯布將實施例及比較例中所製作之包含基材/抗靜電層/硬塗層之光學積層體的HC層面往返擦拭20次,然後使該擦拭面接近香煙灰並以下述基準評價塵埃附著防止性。The HC layer of the optical layered product comprising the substrate/antistatic layer/hard coat layer produced in the examples and the comparative examples was rubbed back and forth 20 times with a polyester cloth, and then the wiping surface was brought close to the cigarette ash and evaluated on the following basis. Dust adhesion prevention.

○:灰不附著,具有灰塵附著防止效果而良好。○: The ash does not adhere, and has a dust adhesion preventing effect and is good.

×:灰大量附著,無灰塵附著防止效果。×: A large amount of ash adheres, and there is no dust adhesion preventing effect.

(光學薄膜之密接性之評價)(Evaluation of the adhesion of optical films)

針對實施例1~7、比較例1~12、及參考例1~3之光學薄膜,於溫度25℃、濕度40%下調濕24小時後,依據JIS K5400之方格試驗之方法,於硬塗層面上以1mm間隔橫豎分別切入11條縫隙來製作100個方格,將Nichiban(股)製造之Cellotape(註冊商標)貼附於方格上後,迅速將其於90°之方向上拉伸而使其剝離,並根據下述基準來算出密接率。The optical films of Examples 1 to 7, Comparative Examples 1 to 12, and Reference Examples 1 to 3 were conditioned at a temperature of 25 ° C and a humidity of 40% for 24 hours, and then hard coated according to the method of the grid test of JIS K5400. On the level, 11 slits were cut into and out at intervals of 1 mm to make 100 squares. After attaching the Cellotape (registered trademark) manufactured by Nichiban to the square, it was quickly stretched in the direction of 90°. This was peeled off, and the adhesion ratio was calculated based on the following criteria.

密接率(%)=(未剝落之方格數/合計方格數100)×100Bonding rate (%) = (number of squares without peeling off / total number of squares 100) × 100

又,針對實施例1~7、比較例1~12、及參考例1~3的光學薄膜,亦求出於溫度25℃、濕度40%下調濕24小時後,於溫度30℃、濕度40%下以每小時500 W/m2 之光量照射紫外線192小時後的密接率。將耐UV試驗前後之光學薄膜的密接率之測定結果一併示於表1中。Further, the optical films of Examples 1 to 7, Comparative Examples 1 to 12, and Reference Examples 1 to 3 were also subjected to humidity control at a temperature of 25 ° C and a humidity of 40% for 24 hours, at a temperature of 30 ° C and a humidity of 40%. The adhesion rate after irradiating ultraviolet rays for 192 hours at an amount of light of 500 W/m 2 per hour. The measurement results of the adhesion ratio of the optical film before and after the UV resistance test are shown in Table 1.

(結果之總結)(summary of results)

根據表1,實施例1~7中均獲得良好之積層體(抗靜電層)的表面電阻值,且光學薄膜之密接性亦良好。又,光學特性及外觀亦良好。According to Table 1, in Examples 1 to 7, the surface resistivity of a good laminate (antistatic layer) was obtained, and the adhesion of the optical film was also good. Moreover, the optical characteristics and appearance are also good.

然而,於比較例1、2中,由於抗靜電層用組成物中未包含多官能單體(B)或丙烯酸胺基甲酸酯(C),故雖然耐UV試驗前之密接率良好,但耐UV試驗後之密接率較差。However, in Comparative Examples 1 and 2, since the polyfunctional monomer (B) or the urethane acrylate (C) was not contained in the composition for an antistatic layer, although the adhesion rate before the UV test was good, The adhesion rate after UV resistance test is poor.

於比較例3中,由於多官能單體(B)為單官能,故而未獲得充分之密接率。In Comparative Example 3, since the polyfunctional monomer (B) was monofunctional, a sufficient adhesion ratio was not obtained.

於比較例4中,多官能單體(B)之分子量超過1000,且密接率較低,尤其耐UV試驗後之密接率較低。可認為其原因在於:多官能單體(B)朝TAC基材之滲透不充分,TAC基材與抗靜電層之密接性變得不充分。In Comparative Example 4, the molecular weight of the polyfunctional monomer (B) exceeded 1,000, and the adhesion rate was low, and the adhesion ratio after the UV resistance test was low. This is considered to be because the penetration of the polyfunctional monomer (B) into the TAC substrate is insufficient, and the adhesion between the TAC substrate and the antistatic layer is insufficient.

於比較例5中,丙烯酸胺基甲酸酯(C)之官能基數為2而較少,且密接率較低,尤其耐UV試驗後之密接率較低。可認為其原因在於:由丙烯酸胺基甲酸酯(C)所引起之交聯較少,抗靜電層與HC層之密接性變得不充分。In Comparative Example 5, the number of functional groups of the urethane acrylate (C) was 2 and less, and the adhesion rate was low, and the adhesion ratio after the UV test was particularly low. The reason for this is considered to be that the crosslinking caused by the urethane acrylate (C) is small, and the adhesion between the antistatic layer and the HC layer is insufficient.

於比較例6中,丙烯酸胺基甲酸酯(C)之分子量未滿1000,尤其耐UV試驗後之密接率較低。可認為其原因在於:由於丙烯酸胺基甲酸酯(C)過度滲透至TAC基材內,故而抗靜電層與HC層之密接性變得不充分。In Comparative Example 6, the molecular weight of the urethane acrylate (C) was less than 1,000, and the adhesion ratio after the UV resistance test was low. This is considered to be because the urethane urethane (C) excessively penetrates into the TAC substrate, so that the adhesion between the antistatic layer and the HC layer is insufficient.

於比較例7中,丙烯酸胺基甲酸酯(C)之分子量超過10000,且密接率較低,尤其耐UV試驗後之密接率較低。表面電阻值亦較高,可認為其原因在於:丙烯酸胺基甲酸酯(C)未完全滲透至TAC基材內,抗靜電層中之抗靜電劑(A)之相對量變少。In Comparative Example 7, the molecular weight of the urethane acrylate (C) exceeded 10,000, and the adhesion rate was low, and the adhesion rate after the UV resistance test was low. The surface resistance value is also high, and it is considered that the reason is that the urethane urethane (C) is not completely penetrated into the TAC substrate, and the relative amount of the antistatic agent (A) in the antistatic layer is small.

於比較例8中,抗靜電劑(A)之含有比例較少,表面電阻值變高。In Comparative Example 8, the content ratio of the antistatic agent (A) was small, and the surface resistance value was high.

於比較例9中,抗靜電劑(A)之含有比例較多,抗靜電性良好,但由於成為黏合劑之多官能單體(B)及丙烯酸胺基甲酸酯(C)之量變少,故而於耐UV試驗前後密接率較低。In Comparative Example 9, the antistatic agent (A) has a large content ratio and is excellent in antistatic property, but the amount of the polyfunctional monomer (B) and the urethane acrylate (C) which are binders is small. Therefore, the adhesion rate is low before and after the UV test.

於比較例10中,由於多官能單體(B)之含有比例較多,丙烯酸胺基甲酸酯(C)之含有比例較少,故而密接率較低,尤其耐UV試驗後之密接率較低。In Comparative Example 10, since the content ratio of the polyfunctional monomer (B) was large, the content ratio of the urethane amide (C) was small, so that the adhesion ratio was low, and the adhesion ratio after the UV test was particularly high. low.

於比較例11中,由於丙烯酸胺基甲酸酯(C)之含有比例較多,多官能單體(B)之含有比例較少,故而耐UV試驗前密接率良好,但耐UV試驗後之密接率較低。In Comparative Example 11, since the content ratio of the urethane amide (C) was large and the content of the polyfunctional monomer (B) was small, the adhesion rate before the UV test was good, but after the UV test. The bonding rate is low.

於參考例1中,密接率較低,表面電阻值較高。可認為其原因在於:由於將抗靜電層用組成物中之溶劑僅設為被滲透溶劑,故而丙烯酸胺基甲酸酯(C)未充分滲透至TAC基材內,抗靜電層中之抗靜電劑(A)之相對量變少。In Reference Example 1, the adhesion rate was low and the surface resistance value was high. The reason for this is considered to be that since the solvent in the composition for an antistatic layer is only made to be a permeation solvent, the urethane acrylate (C) is not sufficiently penetrated into the TAC substrate, and the antistatic layer in the antistatic layer is antistatic. The relative amount of the agent (A) is small.

於比較例12中,由於未使用作為疏水性樹脂之丙烯酸胺基甲酸酯(C),故而四級銨鹽過度分散,表面電阻值較高。因此,亦未獲得灰塵附著防止性。In Comparative Example 12, since the urethane urethane (C) which is a hydrophobic resin was not used, the quaternary ammonium salt was excessively dispersed, and the surface resistance value was high. Therefore, dust adhesion prevention property is also not obtained.

於參考例2中,使用金屬微粒子作為抗靜電劑。由於設為可獲得與四級銨鹽之情形相同之全光線透過率之水程度的添加量(相當少),故而表面電阻值較差。In Reference Example 2, metal fine particles were used as an antistatic agent. Since the amount of addition of water (relatively small) which is the same as the case of the quaternary ammonium salt is obtained, the surface resistance value is inferior.

於參考例3中,為了不考慮全光線透過率而獲得必需之抗靜電性,調配有比參考例2更多之作為抗靜電劑之金屬微粒子,因此密接性較差。因添加量較多而存在著色,全光線透過率低於四級銨鹽之情形(88%)、霧值(0.8%)變高。In Reference Example 3, in order to obtain the necessary antistatic property regardless of the total light transmittance, more metal fine particles as an antistatic agent than the reference example 2 were prepared, and thus the adhesion was inferior. When the amount of addition was large, coloring occurred, and the total light transmittance was lower than that of the quaternary ammonium salt (88%), and the haze value (0.8%) was high.

對實施例、比較例及參考例之光學薄膜之灰塵附著防止性進行評價的結果,於積層體之表面電阻值未滿1×1012 Ω/□之情形時均良好,但於除此以外之情形時,灰大量附著。即,若為具有較佳之表面電阻值的抗靜電層,則即便於其上積層有HC層,亦可對光學薄膜賦予灰塵附著防止性。As a result of evaluating the dust adhesion preventing property of the optical films of the examples, the comparative examples, and the reference examples, the surface resistivity of the laminate was not more than 1 × 10 12 Ω/□, but it was good. In the case, the ash is heavily attached. In other words, in the case of an antistatic layer having a preferable surface resistance value, even if an HC layer is laminated thereon, dust adhesion prevention property can be imparted to the optical film.

1、2...光學薄膜1, 2. . . Optical film

10...三醋酸纖維素基材10. . . Triacetyl cellulose substrate

20...抗靜電層20. . . Antistatic layer

30...硬塗層30. . . Hard coating

40...低折射率層40. . . Low refractive index layer

50...保護薄膜50. . . Protective film

60...偏光層60. . . Polarizing layer

70...偏光片70. . . Polarizer

80...偏光板80. . . Polarizer

圖1係表示本發明之光學薄膜之層構成之一例的示意圖。Fig. 1 is a schematic view showing an example of a layer configuration of an optical film of the present invention.

圖2係表示本發明之光學薄膜之層構成之另一例的示意圖。Fig. 2 is a schematic view showing another example of the layer constitution of the optical film of the present invention.

圖3係表示本發明之偏光板的層構成之一例的示意圖。Fig. 3 is a schematic view showing an example of a layer configuration of a polarizing plate of the present invention.

1...光學薄膜1. . . Optical film

10...三醋酸纖維素基材10. . . Triacetyl cellulose substrate

20...抗靜電層20. . . Antistatic layer

30...硬塗層30. . . Hard coating

Claims (8)

一種抗靜電層用硬化性樹脂組成物,其特徵在於包含:(A)抗靜電劑;(B)於1分子中具有2個以上之光硬化性基,且分子量為900以下之多官能單體;以及(C)於1分子中具有6個以上之丙烯醯基及/或甲基丙烯醯基,且重量平均分子量為1000~11000之丙烯酸胺基甲酸酯;該(A)相對於該(A)、(B)及(C)之總量之比例為1~30質量%,且,該(C)相對於該(B)及(C)之總量之比例為1~40質量%;上述抗靜電層用硬化性樹脂組成物之膜厚為1~5μm之硬化物的表面電阻值係未滿1×1012 Ω/□。A curable resin composition for an antistatic layer, comprising: (A) an antistatic agent; (B) a polyfunctional monomer having two or more photocurable groups in one molecule and having a molecular weight of 900 or less And (C) an urethane urethane having 6 or more acryl fluorenyl groups and/or methacryl fluorenyl groups in one molecule and having a weight average molecular weight of 1000 to 11,000; the (A) relative to the The ratio of the total amount of A), (B), and (C) is 1 to 30% by mass, and the ratio of the total amount of (C) to the total of (B) and (C) is 1 to 40% by mass; The surface resistivity of the cured product having a thickness of 1 to 5 μm in the curable resin composition for an antistatic layer is less than 1 × 10 12 Ω/□. 如申請專利範圍第1項之抗靜電層用硬化性樹脂組成物,其中,上述(A)係重量平均分子量為1000~50000之四級銨鹽。 The curable resin composition for an antistatic layer according to the first aspect of the invention, wherein the (A) is a quaternary ammonium salt having a weight average molecular weight of from 1,000 to 50,000. 如申請專利範圍第1項之抗靜電層用硬化性樹脂組成物,其中,進一步包含(D)滲透性溶劑及(E)非滲透性溶劑。 The curable resin composition for an antistatic layer according to the first aspect of the invention, further comprising (D) a permeable solvent and (E) a non-permeable solvent. 一種光學薄膜,其係於三醋酸纖維素基材之一面側,自該三醋酸纖維素基材側起鄰接地設置膜厚為1~5μm之抗靜電層及硬塗層者,其特徵在於,該抗靜電層包含申請專利範圍第1至3項中任一項之抗靜電層用硬化性樹脂組成物之硬化物,上述多官能單體(B)滲透至該三醋酸纖維素基材之抗靜電層 側之界面附近的區域並硬化。 An optical film which is provided on one surface side of a cellulose triacetate substrate, and an antistatic layer and a hard coat layer having a film thickness of 1 to 5 μm are provided adjacent to each other from the side of the cellulose triacetate substrate, wherein The antistatic layer contains the cured product of the curable resin composition for an antistatic layer according to any one of claims 1 to 3, wherein the polyfunctional monomer (B) penetrates to the cellulose acetate substrate. Electrostatic layer The area near the side interface is hardened. 如申請專利範圍第4項之光學薄膜,其中,上述硬塗層、該抗靜電層及上述三醋酸纖維素基材間之方格密接性試驗之密接率為90~100%,且於溫度30℃、濕度40%下,以每小時500W/m2 之光量照射紫外線192小時後之該密接率為80~100%。The optical film of claim 4, wherein the adhesion between the hard coat layer, the antistatic layer and the cellulose triacetate substrate is 90 to 100%, and the temperature is 30. At °C and humidity of 40%, the adhesion rate after irradiation with ultraviolet light for 192 hours at a light amount of 500 W/m 2 per hour was 80 to 100%. 如申請專利範圍第4項之光學薄膜,其中,於上述硬塗層之與抗靜電層相反側之面,進而設置有低折射率層。 The optical film of claim 4, wherein a low refractive index layer is further provided on a surface of the hard coat layer opposite to the antistatic layer. 一種偏光板,其特徵為於上述申請專利範圍第4項之光學薄膜之三醋酸纖維素基材側設置偏光片。 A polarizing plate characterized in that a polarizer is provided on a side of a cellulose triacetate substrate of an optical film of the fourth aspect of the above patent application. 一種顯示面板,其特徵為於上述申請專利範圍第4項之光學薄膜之三醋酸纖維素基材側配置顯示器。 A display panel characterized in that a display is disposed on a cellulose triacetate substrate side of an optical film of the fourth aspect of the above patent application.
TW100124540A 2010-07-12 2011-07-12 Curable resin composition for antistatic layer, optical film, polarizing plate and display panel TWI482705B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010157808 2010-07-12

Publications (2)

Publication Number Publication Date
TW201223758A TW201223758A (en) 2012-06-16
TWI482705B true TWI482705B (en) 2015-05-01

Family

ID=45469442

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100124540A TWI482705B (en) 2010-07-12 2011-07-12 Curable resin composition for antistatic layer, optical film, polarizing plate and display panel

Country Status (5)

Country Link
JP (1) JP5811090B2 (en)
KR (1) KR101466520B1 (en)
CN (2) CN104530331B (en)
TW (1) TWI482705B (en)
WO (1) WO2012008444A1 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6235287B2 (en) * 2013-09-30 2017-11-22 日東電工株式会社 Optical laminate
CN107791632B (en) * 2017-11-24 2024-08-23 深圳市摩码科技有限公司 Low-reflectivity rainbow-line-free hardening protective film of TAC (TAC) substrate and preparation method thereof
KR102406865B1 (en) * 2017-12-18 2022-06-10 디아이씨 가부시끼가이샤 Active energy ray-curable composition, and film using same
CN108802885A (en) * 2018-04-23 2018-11-13 深圳市运宝莱光电科技有限公司 A kind of electromagnetic shielding polaroid and preparation method
JP7257165B2 (en) * 2019-02-12 2023-04-13 日東電工株式会社 Device with reinforcing film, manufacturing method thereof, and reinforcing method
WO2024101232A1 (en) * 2022-11-07 2024-05-16 Agc株式会社 Film and method for producing semiconductor package
CN116640524A (en) * 2023-05-10 2023-08-25 太湖金张科技股份有限公司 A die-cut PU adhesive protective film that does not drop powder
CN117087268B (en) * 2023-08-21 2025-09-19 湖南拓步电子科技有限公司 Enhanced antistatic touch screen glass panel

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200736654A (en) * 2006-03-31 2007-10-01 Dainippon Printing Co Ltd Optical laminated body

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006306008A (en) 2005-03-31 2006-11-09 Jsr Corp Antistatic laminate
JP4670745B2 (en) * 2006-06-12 2011-04-13 日本化成株式会社 Antistatic composition, antistatic layer and antistatic film
JP5359137B2 (en) * 2007-09-12 2013-12-04 大日本印刷株式会社 OPTICAL LAMINATE, ITS MANUFACTURING METHOD, POLARIZING PLATE, AND IMAGE DISPLAY DEVICE
KR101574351B1 (en) * 2008-09-16 2015-12-03 닛본 페인트 홀딩스 가부시키가이샤 A photocurable composition and a coating material provided with a translucent coating layer

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200736654A (en) * 2006-03-31 2007-10-01 Dainippon Printing Co Ltd Optical laminated body

Also Published As

Publication number Publication date
CN102958963B (en) 2014-11-05
TW201223758A (en) 2012-06-16
JP5811090B2 (en) 2015-11-11
KR20130054314A (en) 2013-05-24
CN104530331A (en) 2015-04-22
WO2012008444A1 (en) 2012-01-19
CN104530331B (en) 2017-01-11
JPWO2012008444A1 (en) 2013-09-09
CN102958963A (en) 2013-03-06
KR101466520B1 (en) 2014-11-27

Similar Documents

Publication Publication Date Title
TWI522642B (en) Optical film, polarizer, display panel and display
JP5779863B2 (en) Manufacturing method of optical film, optical film, polarizing plate and display
TWI482705B (en) Curable resin composition for antistatic layer, optical film, polarizing plate and display panel
KR101870473B1 (en) Anti-reflective film, anti-reflective film production method, polarization plate and image display device
TWI541534B (en) Optical film, polarizing plate and image display device
CN102985498B (en) Curable resin composition for hardcoat layer, process for production of hardcoat film, hardcoat film, polarizing plate, and display panel
JP5262032B2 (en) Optical laminate manufacturing method, optical laminate, polarizing plate, and image display device
KR101994489B1 (en) Hard coat film, polarizer, front panel and image display device
US7709084B2 (en) Anti-newton ring sheet and touch panel using the same
KR101949558B1 (en) Optical laminate and method for manufacturing thereof
EP3974183A1 (en) Cover window for flexible display device and flexible display device
KR101809757B1 (en) Hard coat film, method of producing hard coat film, polarizer, display front panel and image display device
KR101467999B1 (en) Anti-glare film
KR20140017618A (en) Optical laminate, polarising plate, and image display device