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TWI482160B - Programming method for nonvolatile semiconductor memory device - Google Patents

Programming method for nonvolatile semiconductor memory device Download PDF

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TWI482160B
TWI482160B TW100123982A TW100123982A TWI482160B TW I482160 B TWI482160 B TW I482160B TW 100123982 A TW100123982 A TW 100123982A TW 100123982 A TW100123982 A TW 100123982A TW I482160 B TWI482160 B TW I482160B
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memory cells
memory
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programmed
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TW201303876A (en
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Chung Shan Kuo
Zi Qiang Ku
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Elite Semiconductor Esmt
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Description

用於非揮發性半導體記憶體元件的程式化方法Stylized method for non-volatile semiconductor memory components

本發明係關於一種程式化一非揮發性半導體記憶體元件中的複數個記憶體晶胞之方法。The present invention relates to a method of stabilizing a plurality of memory cells in a non-volatile semiconductor memory device.

半導體記憶體元件為資料可以被儲存和儲存的資料可以被讀取的元件。半導體記憶體元件可以分類為揮發性記憶體元件和非揮發性記憶體元件。揮發性記憶體元件需要供應電源持續存在以保存資料,而非揮發性記憶體元件在供應電源消失時仍可保存資料。因此,非揮發性記憶體元件被廣泛地使用在電源可能突然被干擾的應用上。A semiconductor memory component is a component in which data from which data can be stored and stored can be read. Semiconductor memory components can be classified into volatile memory components and non-volatile memory components. Volatile memory components require a supply of power to persist to preserve data, while non-volatile memory components retain data when the power supply disappears. Therefore, non-volatile memory components are widely used in applications where the power supply may be suddenly disturbed.

非揮發性記憶體元件包含電子可抹拭唯讀記憶體(Electrically Erasable and Programmable ROM,EEPROM)晶胞,例如flash EEPROM晶胞。圖1顯示一flash EEPROM晶胞10的垂直剖面圖。參照圖1,一N型源極區域13和一N型汲極區域14形成於一P型基底12或一主體區域上。一P型通道區域形成於該源極區域13和該汲極區域14之間。由一絕緣層15所隔離的一浮接閘極16形成在該P型通道區域上方。由另一絕緣層17所隔離的一控制閘極18形成在該浮接閘極16上方。The non-volatile memory component comprises an electrically erasable and programmable mable (EEPROM) cell, such as a flash EEPROM cell. Figure 1 shows a vertical cross-sectional view of a flash EEPROM cell 10. Referring to FIG. 1, an N-type source region 13 and an N-type drain region 14 are formed on a P-type substrate 12 or a body region. A P-type channel region is formed between the source region 13 and the drain region 14. A floating gate 16 isolated by an insulating layer 15 is formed over the P-type channel region. A control gate 18 isolated by another insulating layer 17 is formed over the floating gate 16.

圖2顯示該flash EEPROM晶胞10在程式化運作和抹除運作期間的臨界電壓範圍。參照圖2,該flash EEPROM晶胞10在程式化運作期間具有較高的臨界電壓範圍(大約6至7V),而在抹除運作期間具有較低的臨界電壓範圍(大約1至3V)。Figure 2 shows the threshold voltage range of the flash EEPROM cell 10 during staging and erase operations. Referring to Figure 2, the flash EEPROM cell 10 has a higher threshold voltage range (about 6 to 7 V) during the staging operation and a lower threshold voltage range (about 1 to 3 V) during the erase operation.

參照圖1和圖2,在程式化運作期間,熱電子必須從鄰近該汲極區域14的該通道區域注入至該浮接閘極電極,因此該EEPROM晶胞的臨界電壓範圍會增加。反之,在程式化運作期間注入至該浮接閘極16的熱電子在抹除運作期間必須被移除,因此該EEPROM晶胞的臨界電壓範圍會下降。據此,該EEPROM晶胞的臨界電壓值在程式化和抹除運作後會產生變化。Referring to Figures 1 and 2, during the stylization operation, hot electrons must be injected from the channel region adjacent to the drain region 14 to the floating gate electrode, so that the threshold voltage range of the EEPROM cell increases. Conversely, the hot electrons injected into the floating gate 16 during the staging operation must be removed during the erase operation, so the threshold voltage range of the EEPROM cell will decrease. Accordingly, the threshold voltage value of the EEPROM cell changes after the staging and erasing operations.

一習知用以程式化一flash EEPROM晶胞的方法為施加一高電壓至該EEPROM晶胞電晶體的汲極。舉例而言,如果有八個EEPROM晶胞電晶體需要被程式化,則一高電壓會以循序的方式每次施加至一EEPROM晶胞電晶體的汲極。因此,該高電壓施加至全部的EEPROM晶胞電晶體的汲極的次數為八次。當該八個EEPROM晶胞電晶體全數執行完該程式化運作後,會進行一驗證運作以檢查所有的EEPROM晶胞是否已全部被程式化。如果所有的記憶體晶胞已被程式化,該些晶胞的程式化運作即完成且不需要執行進一步的程式化運作。反之,如果該些記憶體晶胞中有任何一者未被程式化,則該些晶胞必須進行第二次的程式化運作。在第二次程式化時,該高電壓會以循序的方式每次施加至一EEPROM晶胞電晶體的汲極。在該高電壓施加至全部的EEPROM晶胞電晶體達八次後,會繼續該驗證運作。該些程式化和驗證運作會持續地重複,直至全部將被程式化的EEPROM晶胞電晶體的臨界電壓達到一預定值(例如,6V)為止。A conventional method for programming a flash EEPROM cell is to apply a high voltage to the drain of the EEPROM cell transistor. For example, if there are eight EEPROM cell transistors that need to be programmed, a high voltage is applied to the drain of an EEPROM cell transistor each time in a sequential manner. Therefore, the number of times the high voltage is applied to the drains of all the EEPROM cell transistors is eight times. After the eight EEPROM cell transistors have all performed the stylized operation, a verify operation is performed to check if all of the EEPROM cells have been programmed. If all of the memory cells have been programmed, the stylization of the cells is complete and no further stylization is required. Conversely, if any of the memory cells are not programmed, the cells must undergo a second stylization. At the second stylization, the high voltage is applied to the drain of an EEPROM cell transistor each time in a sequential manner. This verification operation continues after the high voltage is applied to all of the EEPROM cell transistors for eight times. These stylization and verification operations are repeated continuously until all of the threshold voltages of the programmed EEPROM cell transistors reach a predetermined value (e.g., 6V).

如上所述,在習知的程式化運作中完成程式化運作所需的總時間會隨所需要重複的程式化步驟之次數而增加。此外,在每次程式化運作後需要執行一驗證運作,以確認將被程式化的EEPROM晶胞電晶體之臨界電壓是否已達到一預定值。因此,整體程式化的時間會因為插入多個驗證運作之步驟而增加。該記憶體元件亦需要多個複雜的電路以執行驗證運作。據此,有必要提出一種改良的程式化方法以解決上述問題。As mentioned above, the total time required to complete a stylized operation in a conventional stylized operation increases with the number of repetitive stylization steps required. In addition, a verification operation is required after each stylization operation to confirm whether the threshold voltage of the EEPROM cell transistor to be programmed has reached a predetermined value. Therefore, the overall stylized time is increased by the steps of inserting multiple verification operations. The memory component also requires multiple complex circuits to perform the verify operation. Accordingly, it is necessary to propose an improved stylized method to solve the above problems.

本發明之目的係提供一種程式化一非揮發性半導體記憶體元件中的複數個記憶體晶胞之方法。藉由本發明所揭示之方法,可大幅減少程式化該些記憶體晶胞的整體時間。It is an object of the present invention to provide a method of stabilizing a plurality of memory cells in a non-volatile semiconductor memory device. By the method disclosed by the present invention, the overall time for staging the memory cells can be greatly reduced.

為達到上述之目的,本發明之方法之一實施例包含以下步驟:在該等記憶體晶胞中依序執行複數次除以2的運作,在該等除以2的運作完成後從該等記憶體晶胞中產生複數個逐步減少的群組,在每次除以2的運作完成後對所產生的該逐步減少的群組中的記憶體晶胞進行程式化,在執行最後一次除以2的運作後產生一最終群組,程式化該最終群組中的複數個記憶體晶胞,以及驗證該最終群組中的該等記憶體晶胞是否已均被程式化。In order to achieve the above object, an embodiment of the method of the present invention comprises the steps of sequentially performing a plurality of divisions by two operations in the memory cells, and from the completion of the operations of dividing by two A plurality of progressively decreasing groups are generated in the memory unit cell, and the memory cell in the step-down group generated is programmed after each operation of dividing by 2, and the last division is performed. After the operation of 2, a final group is generated, a plurality of memory cells in the final group are programmed, and it is verified whether the memory cells in the final group have been programmed.

為了清楚說明本發明所揭示之程式化一非揮發性半導體記憶體元件中的複數個記憶體晶胞之方法,首先描述本發明中執行該方法的該非揮發性半導體記憶體元件之架構。圖3顯示結合本發明一實施例之一非揮發性半導體記憶體元件30的方塊示意圖。參照圖3,該記憶體元件30包含一記憶體晶胞陣列32。該記憶體晶胞陣列32包含以行和列方式排列的複數個記憶體晶胞MC。在本發明一實施例中,該非揮發性半導體記憶體元件30為一NOR形式的flash EEPROM元件,且複數個NOR形式之flash EEPROM晶胞形成整個記憶體晶胞陣列32。To clearly illustrate the method of stabilizing a plurality of memory cells in a non-volatile semiconductor memory device disclosed herein, the architecture of the non-volatile semiconductor memory device in the present invention for performing the method will first be described. 3 shows a block diagram of a non-volatile semiconductor memory device 30 incorporating one embodiment of the present invention. Referring to FIG. 3, the memory component 30 includes a memory cell array 32. The memory cell array 32 includes a plurality of memory cells MC arranged in rows and columns. In one embodiment of the invention, the non-volatile semiconductor memory device 30 is a NOR-form flash EEPROM device, and a plurality of NOR-formed flash EEPROM cells form the entire memory cell array 32.

參照圖3,複數條字元線WL連接至該些記憶體晶胞MC中的複數個第一端子,而複數條位元線BL連接該些記憶體晶胞MC中的複數個第二端子。一列解碼器36連接至該記憶體晶胞陣列32以提供該記憶體晶胞陣列32多個字元線電壓,而一行解碼器34連接至該記憶體晶胞陣列32以提供該記憶體晶胞陣列32多個位元線電壓。一感測放大器段38包含複數個感測放大器以偵測和放大連接至該記憶體晶胞陣列32中所選擇的列之記憶體晶胞MC中的資料。一寫入驅動器段40包含複數個寫入驅動器以寫入資料至該記憶體晶胞陣列32中所選擇的記憶體晶胞MC中。一高電壓產生器44回應於程式化信號而產生程式化記憶體晶胞所需的一高電壓,並施加該高電壓至該感測放大器段38和該寫入驅動器段40。Referring to FIG. 3, a plurality of word lines WL are connected to a plurality of first terminals in the memory cells MC, and a plurality of bit lines BL are connected to a plurality of second terminals in the memory cells MC. A column of decoders 36 is coupled to the memory cell array 32 to provide a plurality of word line voltages for the memory cell array 32, and a row of decoders 34 is coupled to the memory cell array 32 to provide the memory cell. The array has more than 32 bit line voltages. A sense amplifier section 38 includes a plurality of sense amplifiers for detecting and amplifying data in the memory cell MC connected to the selected column of the memory cell array 32. A write driver segment 40 includes a plurality of write drivers for writing data to selected memory cells MC in the memory cell array 32. A high voltage generator 44 generates a high voltage required to program the memory cell in response to the programmed signal and applies the high voltage to the sense amplifier segment 38 and the write driver segment 40.

圖4顯示結合本發明一實施例之程式化一非揮發性半導體記憶體中的複數個記憶體晶胞之方法的流程圖。該方法包含以下步驟:在複數個記憶體晶胞中依序執行複數次除以2的運作(S10),在該等除以2的運作完成後從該等記憶體晶胞中產生複數個逐步減少的群組(S20),在每次除以2的運作完成後對所產生的該逐步減少的群組中的記憶體晶胞進行程式化(S30),在執行最後一次除以2的運作後產生一最終群組(S40),程式化該最終群組中的複數個記憶體晶胞(S50),以及驗證該最終群組中的該等記憶體晶胞是否已均被程式化(S60)。以下將描述本發明所揭示之程式化方法之細節。4 shows a flow chart of a method of stabilizing a plurality of memory cells in a non-volatile semiconductor memory in accordance with an embodiment of the present invention. The method comprises the steps of sequentially performing a plurality of divisions by two operations in a plurality of memory cells (S10), and generating a plurality of steps from the memory cells after the operation of dividing by two is completed. The reduced group (S20), the memory cell in the step-down group generated is programmed after each operation of dividing by 2 (S30), and the last division by 2 is performed. Then generating a final group (S40), stabilizing a plurality of memory cells in the final group (S50), and verifying whether the memory cells in the final group have been programmed (S60) ). Details of the stylized method disclosed by the present invention will be described below.

參照圖3,在接收一程式化命令PGM_S後,該記憶體元件30進入一可程式化模式,且一解碼控制器42產生解碼信號至該行解碼器34和該列解碼器36中以決定不同時間下該記憶體晶胞陣列32中將被程式化的記憶體晶胞。圖5顯示結合本發明一實施例之程式化運作的時序圖。在本實施例中,將被程式化的記憶體晶胞數目設定為八。然而,本發明不應以此為限。參照圖5,在一第一程式化運作時,程式化信號PGM1在時間間隔T1期間具有一高邏輯位準,程式化信號PGM2在時間間隔T2期間具有一高邏輯位準,程式化信號PGM3在時間間隔T3期間具有一高邏輯位準,而程式化信號PGM4在時間間隔T1期間具有一高邏輯位準。Referring to FIG. 3, after receiving a stylized command PGM_S, the memory element 30 enters a programmable mode, and a decoding controller 42 generates a decoded signal to the row decoder 34 and the column decoder 36 to determine the difference. The memory cell to be programmed in the memory cell array 32 at the time. Figure 5 shows a timing diagram of a stylized operation in conjunction with an embodiment of the present invention. In the present embodiment, the number of memory cells to be programmed is set to eight. However, the invention should not be limited thereto. Referring to FIG. 5, during a first stylized operation, the stylized signal PGM1 has a high logic level during the time interval T1, and the stylized signal PGM2 has a high logic level during the time interval T2, and the stylized signal PGM3 is at The time interval T3 has a high logic level, and the stylized signal PGM4 has a high logic level during the time interval T1.

程式化信號PGM1至PGM4為指出每次將同時被程式化的記憶體晶胞之信號。換言之,當程式化信號PGM1至PGM4的其中一者由低邏輯位準轉態至高邏輯位準時,對應於程式化信號PGM1至PGM4的特定記憶體晶胞會同時被程式化。在本發明一實施例中,在第一次程式化運作時,該些記憶體晶胞0至7會劃分為四組,且該程式化運作會以每組一次的方式執行四次。舉例而言,在該第一次程式化運作時,對應於程式化信號PGM1的記憶體晶胞0和4屬於第一組,且在時間間隔T1期間會同時被程式化;對應於程式化信號PGM2的記憶體晶胞1和5屬於第二組,且在時間間隔T2期間會同時被程式化;對應於程式化信號PGM3的記憶體晶胞2和6屬於第三組,且在時間間隔T3期間會同時被程式化;對應於程式化信號PGM4的記憶體晶胞3和7屬於第四組,且在時間間隔T4期間會同時被程式化。The stylized signals PGM1 through PGM4 are signals indicating the memory cells that will be programmed at the same time each time. In other words, when one of the programmed signals PGM1 to PGM4 transitions from a low logic level to a high logic level, the particular memory cells corresponding to the programmed signals PGM1 through PGM4 are simultaneously programmed. In an embodiment of the invention, during the first stylization operation, the memory cells 0 to 7 are divided into four groups, and the stylized operation is performed four times in a group-by-group manner. For example, during the first stylization operation, the memory cells 0 and 4 corresponding to the stylized signal PGM1 belong to the first group and are simultaneously programmed during the time interval T1; corresponding to the stylized signal The memory cells 1 and 5 of PGM2 belong to the second group and are simultaneously programmed during the time interval T2; the memory cells 2 and 6 corresponding to the stylized signal PGM3 belong to the third group, and at time interval T3 The period is simultaneously stylized; the memory cells 3 and 7 corresponding to the stylized signal PGM4 belong to the fourth group and are simultaneously programmed during the time interval T4.

在第一次程式化運作後,記憶體晶胞0至7會劃分為兩組,且在第二次程式化運作時,該程式化運作會以每組一次的方式執行兩次。參照圖5,在該第二次程式化運作時,程式化信號PGM1和PGM2在時間間隔T5期間會由低邏輯位準轉態為高邏輯位準,而程式化信號PGM3和PGM4在時間間隔T6期間會由低邏輯位準轉態為高邏輯位準。因此,在第二次程式化運作時,對應於程式化信號PGM1和PGM2的記憶體晶胞0,1,4和5屬於第一組,且在時間間隔T5期間會同時被程式化,而對應於程式化信號PGM3和PGM4的記憶體晶胞2,3,6和7屬於第二組,且在時間間隔T6期間會同時被程式化。After the first stylization, the memory cells 0 through 7 are divided into two groups, and in the second stylized operation, the stylized operation is performed twice in a set-by-group manner. Referring to FIG. 5, during the second stylization operation, the stylized signals PGM1 and PGM2 transition from a low logic level to a high logic level during a time interval T5, while the stylized signals PGM3 and PGM4 are at a time interval T6. The period will be changed from a low logic level to a high logic level. Therefore, in the second stylization operation, the memory cells 0, 1, 4, and 5 corresponding to the stylized signals PGM1 and PGM2 belong to the first group, and are simultaneously programmed during the time interval T5, and corresponding The memory cells 2, 3, 6 and 7 of the stylized signals PGM3 and PGM4 belong to the second group and are simultaneously programmed during the time interval T6.

在第二次程式化運作後,該些記憶體晶胞0至7會僅分類為一組,且在第三次程式化運作時,該程式化運作會僅執行一次。亦即,在最後一次分組時,所有需被程式化的記憶體晶胞會歸類為同一組。參照圖5,在該第三次程式化運作時,程式化信號PGM1至PGM4在時間間隔T7期間會具有高邏輯位準。因此,在該第三次程式化運作時,所有的記憶體晶胞0至7會在時間間隔T7期間同時被程式化。在該第三次程式化運作後,會執行一驗證運作以確認所有的記憶體晶胞是否均被可程式化。參照圖5,一信號VERIFY在時間間隔T8期間具有高邏輯位準。因此,在該第三次程式化運作時,一程式化檢查運作會在時間間隔T8期間被執行。After the second stylization operation, the memory cells 0 to 7 will be classified into only one group, and the stylized operation will be performed only once during the third stylization operation. That is, at the last grouping, all memory cells that need to be programmed are classified into the same group. Referring to Figure 5, during the third stylization operation, the stylized signals PGM1 through PGM4 will have a high logic level during time interval T7. Therefore, during this third stylization operation, all of the memory cells 0 to 7 are simultaneously programmed during the time interval T7. After this third stylization operation, a verification operation is performed to confirm that all memory cells are programmable. Referring to Figure 5, a signal VERIFY has a high logic level during time interval T8. Therefore, during this third stylization operation, a stylized check operation will be performed during time interval T8.

以下根據圖3描述程式化運作的細節。參照圖3,該高電壓產生器44連接至該寫入驅動器段40。該高電壓產生器44回應於程式化信號PGM1至PGM4而產生程式化該些記憶體晶胞所需的一高電壓,並施加該高電壓至該寫入驅動器段40。在本發明一實施例中,該寫入驅動器段40施加該高電壓至所選擇的記憶體晶胞電晶體,以在程式化運作時增加臨界電壓。因此,記憶體晶胞0至7的臨界電壓在第一次程式化運作時會增加,並且在第二次和第三次程式化運作時會進一步增加,如圖6所示。記憶體晶胞0至7的臨界電壓之增加振幅可以藉由改變程式化的時間,例如改變時間間隔T1至T7,而調整。此外,記憶體晶胞0至7的臨界電壓之增加振幅亦可藉由改變施加於記憶體晶胞的程式化電壓而調整。The details of the stylized operation are described below with reference to FIG. Referring to FIG. 3, the high voltage generator 44 is coupled to the write driver section 40. The high voltage generator 44 generates a high voltage required to program the memory cells in response to the programmed signals PGM1 through PGM4 and applies the high voltage to the write driver segment 40. In one embodiment of the invention, the write driver section 40 applies the high voltage to the selected memory cell transistor to increase the threshold voltage during the staging operation. Therefore, the threshold voltage of the memory cells 0 to 7 increases during the first stylization operation and further increases during the second and third stylization operations, as shown in FIG. The increased amplitude of the threshold voltage of the memory cells 0 to 7 can be adjusted by changing the programmed time, for example, changing the time interval T1 to T7. In addition, the increased amplitude of the threshold voltage of the memory cells 0 to 7 can also be adjusted by changing the stylized voltage applied to the memory cell.

參照圖5,如果該些記憶體晶胞中任何一者未被程式化,則該程式化和該驗證運作會重複。該驗證運作可藉由將每一已程式化的記憶體晶胞之臨界電壓和一預設值進行比較。如果該些記憶體晶胞中任何一者的臨界電壓未到達該預設值,則所有的記憶體晶胞0至7會進行再程式化。反之,如果已程式化的記憶體晶胞的所有臨界電壓已到達該預設值,則不會進行驗證步驟且完成該些記憶體晶胞MC之程式化運作。Referring to Figure 5, if any of the memory cells are not programmed, the stylization and verification operations are repeated. The verification operation can be performed by comparing the threshold voltage of each of the programmed memory cells with a predetermined value. If the threshold voltage of any of the memory cells does not reach the preset value, all of the memory cells 0 to 7 are reprogrammed. Conversely, if all of the threshold voltages of the programmed memory cells have reached the preset value, the verification step is not performed and the stylized operation of the memory cells MC is completed.

相較於習知的程式化運作,由於在第二次程式化運作時同時將被程式化的記憶體晶胞之數目會減少一半,且在隨後的(第三次、第四次、...)程式化運作時同時將被程式化的記憶體晶胞之數目會減少更多,因此使用本發明所揭示的程式化方法可大幅減少程式化的整體時間。此外,在本發明的方法中驗證步驟只在所有的記憶體晶胞被分類為同一組且同時被程式化後執行。因此,在本發明中整體的程式化時間可以減少且記憶體元件的電路可以簡化。Compared to the conventional stylized operation, the number of memory cells that will be programmed at the same time in the second stylization operation will be reduced by half, and in the subsequent (third, fourth, .. .) The number of memory cells that will be programmed at the same time is reduced more during stylization, so the stylized overall time can be greatly reduced using the stylized method disclosed by the present invention. Furthermore, in the method of the present invention, the verification step is performed only after all of the memory cells are classified into the same group and simultaneously programmed. Therefore, the overall programming time can be reduced and the circuit of the memory element can be simplified in the present invention.

本發明之技術內容及技術特點已揭示如上,然而熟悉本項技術之人士仍可能基於本發明之教示及揭示而作種種不背離本發明精神之替換及修飾。因此,本發明之保護範圍應不限於實施例所揭示者,而應包括各種不背離本發明之替換及修飾,並為隨後之申請專利範圍所涵蓋。The technical and technical features of the present invention have been disclosed as above, and those skilled in the art can still make various substitutions and modifications without departing from the spirit and scope of the invention. Therefore, the scope of the invention should be construed as not limited by the scope of the invention, and the invention is intended to be

10...flash EEPROM晶胞10. . . Flash EEPROM cell

12...P型基底12. . . P-type substrate

13...N型源極區域13. . . N-type source region

14...N型汲極區域14. . . N-type bungee area

15...絕緣層15. . . Insulation

16...浮接閘極16. . . Floating gate

17...絕緣層17. . . Insulation

18...控制閘極18. . . Control gate

30...非揮發性半導體記憶體元件30. . . Non-volatile semiconductor memory component

32...記憶體晶胞陣列32. . . Memory cell array

34...行解碼器34. . . Row decoder

36...列解碼器36. . . Column decoder

38...感測放大器段38. . . Sense amplifier section

40...寫入驅動器段40. . . Write to drive segment

42...解碼控制器42. . . Decoding controller

44...高電壓產生器44. . . High voltage generator

S10~S60...步驟S10~S60. . . step

圖1顯示一flash EEPROM晶胞的垂直剖面圖;Figure 1 shows a vertical sectional view of a flash EEPROM cell;

圖2顯示該flash EEPROM晶胞在程式化運作和抹除運作期間的臨界電壓範圍;Figure 2 shows the threshold voltage range of the flash EEPROM cell during stylized operation and erase operation;

圖3顯示結合本發明一實施例之一非揮發性半導體記憶體元件的方塊示意圖;3 is a block diagram showing a nonvolatile semiconductor memory device incorporating an embodiment of the present invention;

圖4顯示結合本發明一實施例之程式化一非揮發性半導體記憶體中的複數個記憶體晶胞之方法的流程圖;4 is a flow chart showing a method of stabilizing a plurality of memory cells in a non-volatile semiconductor memory in accordance with an embodiment of the present invention;

圖5顯示結合本發明一實施例之程式化運作的時序圖;及Figure 5 shows a timing diagram of a stylized operation in connection with an embodiment of the present invention;

圖6顯示該些記憶體晶胞的臨界電壓在多次程式化運作後的變化。Figure 6 shows the variation of the threshold voltage of the memory cells after multiple stylized operations.

S10~S60...步驟S10~S60. . . step

Claims (7)

一種程式化一非揮發性半導體記憶體元件中的複數個記憶體晶胞之方法,包含以下步驟:在該等記憶體晶胞中依序執行複數次除以2的運作;在該等除以2的運作完成後從該等記憶體晶胞中產生複數個逐步減少的群組;在每次除以2的運作完成後對所產生的該逐步減少的群組中的記憶體晶胞進行程式化;在執行最後一次除以2的運作後產生一最終群組;程式化該最終群組中的複數個記憶體晶胞;以及驗證該最終群組中的該等記憶體晶胞是否已均被程式化;其中,該最終群組中的該等記憶體晶胞由該非揮發性半導體記憶體中的所有記憶體晶胞所組成,且該驗證步驟僅在該程式化該最終群組中的該等記憶體晶胞之步驟後執行;其中在該等記憶體晶胞中依序執行複數次除以2的運作和在該等除以2的運作完成後從該等記憶體晶胞中產生複數個逐步減少的群組之步驟更包含:在m個記憶體晶胞中執行第一次除以2的運作以劃分m個記憶體晶胞為n個群組,其中每一群組由m/n個記憶體晶胞所組成;以及在執行第一次除以2的運作後,在m個記憶體晶胞中執行第二次除以2的運作以劃分m個記憶體晶胞為n/2個群組,其中每一群組由2m/n個記憶體晶胞所組成。 A method of stabilizing a plurality of memory cells in a non-volatile semiconductor memory device, comprising the steps of sequentially performing a plurality of divisions by two operations in the memory cells; After the operation of 2 is completed, a plurality of gradually decreasing groups are generated from the memory cells; after each operation of dividing by 2 is completed, the memory cell in the step-down group generated is programmed. Generating a final group after performing the last divide by 2 operation; stylizing a plurality of memory cells in the final group; and verifying whether the memory cells in the final group have been averaged Stylized; wherein the memory cells in the final group are composed of all memory cells in the non-volatile semiconductor memory, and the verifying step is only in the stylized final group Performing the steps of the memory cells: wherein the plurality of divisions by 2 are performed sequentially in the memory cells and generated from the memory cells after the operations of dividing by 2 are completed Multiple step by step group Furthermore, the first division by 2 is performed in m memory cells to divide m memory cells into n groups, each group consisting of m/n memory cells. And performing the second divide by 2 operation in m memory cells to divide n memory cells into n/2 groups after performing the first divide by 2 operation, each of which The group consists of 2m/n memory cells. 根據請求項1之方法,其中該非揮發性半導體記憶體為一NOR型flash EEPROM。 The method of claim 1, wherein the non-volatile semiconductor memory is a NOR type flash EEPROM. 根據請求項1之方法,更包含:如果在該最終群組中的該等記憶體晶胞之任一者程式化失敗時,再次程式化該最終群組中的該等記憶體晶胞。 The method of claim 1, further comprising: if the programming of any of the memory cells in the final group fails, reprogramming the memory cells in the final group. 根據請求項1之方法,其中該驗證步驟係藉由比較每一已程式化的記憶體晶胞之臨界電壓和一預設電壓值而執行。 The method of claim 1, wherein the verifying step is performed by comparing a threshold voltage of each of the programmed memory cells with a predetermined voltage value. 根據請求項1之方法,其中該程式化步驟係藉由提高該等記憶體晶胞的臨界電壓而執行。 The method of claim 1, wherein the stylizing step is performed by increasing a threshold voltage of the memory cells. 根據請求項4之方法,其中該等記憶體晶胞的臨界電壓係藉由施加不同的程式化時間間隔至該等記憶體晶胞而控制。 According to the method of claim 4, wherein the threshold voltages of the memory cells are controlled by applying different stylized time intervals to the memory cells. 根據請求項4之方法,其中該等記憶體晶胞的臨界電壓係藉由施加不同的電壓至該等記憶體晶胞而控制。According to the method of claim 4, wherein the threshold voltages of the memory cells are controlled by applying different voltages to the memory cells.
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