TWI477627B - Film forming device - Google Patents
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- TWI477627B TWI477627B TW102132351A TW102132351A TWI477627B TW I477627 B TWI477627 B TW I477627B TW 102132351 A TW102132351 A TW 102132351A TW 102132351 A TW102132351 A TW 102132351A TW I477627 B TWI477627 B TW I477627B
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- 239000000463 material Substances 0.000 claims description 69
- 230000002093 peripheral effect Effects 0.000 claims description 38
- 239000002245 particle Substances 0.000 claims description 6
- 239000000919 ceramic Substances 0.000 claims description 4
- 230000000149 penetrating effect Effects 0.000 claims description 2
- 230000007246 mechanism Effects 0.000 description 16
- 230000015572 biosynthetic process Effects 0.000 description 13
- 238000012423 maintenance Methods 0.000 description 10
- 238000007733 ion plating Methods 0.000 description 5
- 239000011553 magnetic fluid Substances 0.000 description 4
- 239000004020 conductor Substances 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- 238000003825 pressing Methods 0.000 description 3
- 230000007723 transport mechanism Effects 0.000 description 3
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 235000014443 Pyrus communis Nutrition 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000010687 lubricating oil Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/20—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Details Of Rigid Or Semi-Rigid Containers (AREA)
Description
本發明係有關於成膜裝置。The present invention relates to a film forming apparatus.
在被成膜物表面形成膜的成膜方法中例如有離子鍍著法。離子鍍著法中,是使蒸發之成膜材料在真空容器內擴散,而使成膜材料附著在被成膜物表面。但用於離子鍍著法之成膜裝置中,存在擴散之成膜材料中的一部份積留在該成膜材料附近,附著並堆積於保持成膜材料之主陽極即主爐缸、或是輔助電極即環爐缸之情況。由於成膜材料的堆積量增多,因而存在主爐缸與環爐缸產生短路之情況。For example, there is an ion plating method in a film forming method of forming a film on the surface of a film formation. In the ion plating method, the film-forming material to be evaporated is diffused in a vacuum container, and the film-forming material adheres to the surface of the film-formed object. However, in the film forming apparatus used for the ion plating method, a part of the film forming material which is diffused remains in the vicinity of the film forming material, adheres to and accumulates in the main furnace which is the main anode for holding the film forming material, or It is the case of the auxiliary electrode, that is, the ring hearth. Since the deposition amount of the film forming material is increased, there is a case where the main hearth and the ring hearth are short-circuited.
作為應對上述必要性之方法,例如如專利文獻1中所記載,已知有如下方法,即在主爐缸與環爐缸之間配置複數個覆蓋環爐缸之外環框(罩),利用操作裝置定期更換堆積有成膜材料之外環框。In order to cope with the above-mentioned necessity, for example, as described in Patent Document 1, a method is known in which a plurality of ring-shaped rings (covers) are placed between the main hearth and the ring hearth, and the ring frame (cover) is used. The operating device periodically replaces the ring frame stacked with the film forming material.
專利文獻1:日本特開2008-348318號公報Patent Document 1: Japanese Laid-Open Patent Publication No. 2008-348318
其中,專利文獻1的成膜裝置,係以板狀被成膜物的板厚方向成為大致鉛直方向之方式,來將被成膜物配置於真空容器內並進行搬運之所謂臥式臥式成膜裝置。因此,在主爐缸的周圍重疊複數個外環框,並不固定外環框而就只是放置,藉此能夠利用操作裝置輕鬆地更換那些外環框。然而,將該結構適用於以被成膜物的板厚方向成為大致水平方向之方式來進行搬運之立式成膜裝置時,存在未被固定之外環框掉落等問題,從而無法適用。In the film forming apparatus of the patent document 1, the film-formed object is placed in a vacuum container so that the thickness direction of the film-formed object is substantially vertical, and the so-called horizontal horizontal type is carried out. Membrane device. Therefore, a plurality of outer ring frames are overlapped around the main hearth, and the outer ring frames are not fixed and are merely placed, whereby the outer ring frames can be easily replaced by the operating device. However, when the structure is applied to a vertical film forming apparatus that is transported so that the thickness direction of the film formation is substantially horizontal, there is a problem that the ring frame is not dropped, and it is not applicable.
因此,本發明的目的在於提供一種在立式成膜裝置中能夠以較佳形態覆蓋主爐缸周邊之成膜裝置。Accordingly, it is an object of the present invention to provide a film forming apparatus which can cover the periphery of a master cylinder in a preferred form in a vertical film forming apparatus.
本發明之成膜裝置係藉由電漿束對成膜材料進行加熱,使成膜材料氣化之粒子附著於被成膜物之成膜裝置,該成膜裝置具備:作為主陽極之主爐缸,其具有用以保持成膜材料而沿水平方向貫穿之孔,並且向成膜材料導入電漿束、或者被導入電漿束;外環框,其包圍主爐缸,且具有齒部;旋轉部,其藉由與外環框的齒部卡合來對外環框賦予繞主爐缸周圍的旋轉力;以及支撐構件,其設置於主爐缸與外環框之間,限制外環框的水平方向上之移動,並且將外環框支撐為能夠旋轉。In the film forming apparatus of the present invention, the film forming material is heated by a plasma beam, and particles which vaporize the film forming material adhere to the film forming apparatus of the film forming material, and the film forming apparatus includes: a main furnace as a main anode a cylinder having a hole for holding a film forming material and penetrating in a horizontal direction, and introducing a plasma beam to the film forming material or being introduced into the plasma beam; an outer ring frame surrounding the main hearth and having a tooth portion; a rotating portion that imparts a rotational force around the main hearth to the outer ring frame by engaging with a tooth portion of the outer ring frame; and a support member disposed between the main hearth and the outer ring frame to limit the outer ring frame The horizontal direction moves and the outer ring frame is supported to be rotatable.
本發明之成膜裝置,由於其係主爐缸具有沿水平方向貫穿之孔之立式成膜裝置,因此包圍主爐缸之外環框成為沿水平方向延伸之配置。對於如此之配置,藉由支撐構件限制外環框在水平方向上之移動。因此,外環框能夠不會掉落地維持由支撐構件所支撐之狀態。並且,外環框是經由齒部被賦予來自旋轉部的旋轉力而能夠繞主爐缸周圍進行旋轉。因此,所蒸發之成膜材料相對於外環框能夠不集中於一處而是遍及整周均勻地附著。因此,能夠提高每一外環框的堆積效率,且能夠大幅降低維護頻率。如以上,在立式成膜裝置中能夠以較佳形態覆蓋主爐缸周邊。In the film forming apparatus of the present invention, since the main furnace has a vertical film forming apparatus that penetrates the hole in the horizontal direction, the outer ring frame surrounding the main hearth is arranged to extend in the horizontal direction. With such a configuration, the movement of the outer ring frame in the horizontal direction is restricted by the support member. Therefore, the outer ring frame can be maintained in a state of being supported by the support member without falling off. Further, the outer ring frame is rotatable around the main hearth by imparting a rotational force from the rotating portion via the tooth portion. Therefore, the evaporated film-forming material can be uniformly attached to the outer ring frame without being concentrated in one place. Therefore, the stacking efficiency of each outer ring frame can be improved, and the maintenance frequency can be greatly reduced. As described above, in the vertical film forming apparatus, the periphery of the main hearth can be covered in a preferred form.
本發明之成膜裝置中,可在外環框安裝有削掉主爐缸的前端部的附著物之刃部。藉此,隨著外環框的旋轉,刃部能夠一邊削掉主爐缸的前端部的附著物一邊旋轉。藉此,能夠防止附著物堆積於主爐缸的前端部。In the film forming apparatus of the present invention, the blade portion of the attached body at the tip end portion of the main hearth can be attached to the outer ring frame. Thereby, with the rotation of the outer ring frame, the blade portion can rotate while cutting off the attachment of the tip end portion of the main hearth. Thereby, it is possible to prevent deposits from accumulating in the front end portion of the main hearth.
本發明之成膜裝置中,外環框的前端部可朝向內周側折回。依如此之結構,即使附著物在外環框內剝離,亦能夠以被折回之前端部進行阻擋。藉此,能夠防止附著物從外環框掉落。In the film forming apparatus of the present invention, the front end portion of the outer ring frame can be folded back toward the inner peripheral side. According to this configuration, even if the attached matter is peeled off in the outer ring frame, it can be blocked at the end portion before being folded back. Thereby, it is possible to prevent the attachment from falling from the outer ring frame.
本發明之成膜裝置中,支撐構件亦可由陶瓷構成。陶瓷的耐熱性較高,且由於當外環框由金屬材料構成時,支撐構件能夠設為與所支撐之外環框為不同之材料,因此能夠防止燒黏等。因此,能夠使外環框順暢地旋轉。In the film forming apparatus of the present invention, the support member may be made of ceramic. The heat resistance of the ceramic is high, and when the outer ring frame is made of a metal material, the support member can be made of a material different from the outer ring frame supported thereby, so that sticking or the like can be prevented. Therefore, the outer ring frame can be smoothly rotated.
依本發明在立式成膜裝置中能夠以較佳形態覆蓋主爐缸周邊。According to the present invention, the periphery of the main hearth can be covered in a preferred form in the vertical film forming apparatus.
1‧‧‧成膜裝置1‧‧‧ film forming device
21‧‧‧主爐缸21‧‧‧Main hearth
21a‧‧‧填充部21a‧‧‧Filling Department
21b‧‧‧凸緣部21b‧‧‧Flange
21c‧‧‧貫穿孔21c‧‧‧through holes
21d‧‧‧前端部21d‧‧‧ front end
21e‧‧‧外周面21e‧‧‧ outer perimeter
30‧‧‧罩結構30‧‧‧ cover structure
31‧‧‧外環框31‧‧‧ outer ring frame
32‧‧‧內罩32‧‧‧ inner cover
33‧‧‧支撐構件33‧‧‧Support members
34‧‧‧驅動結構34‧‧‧Drive structure
36‧‧‧側壁部36‧‧‧ Sidewall
36a‧‧‧水平部36a‧‧‧ horizontal department
36b‧‧‧傾斜部36b‧‧‧ inclined section
36c‧‧‧彎曲部36c‧‧‧Bend
36d‧‧‧水平部36d‧‧‧ horizontal department
36e‧‧‧前端部36e‧‧‧ front end
37‧‧‧底部37‧‧‧ bottom
37a‧‧‧端面37a‧‧‧ end face
37b‧‧‧槽部37b‧‧‧Slots
37d‧‧‧端面37d‧‧‧ end face
38‧‧‧蓋體38‧‧‧ cover
38a‧‧‧端面38a‧‧‧ end face
39、91‧‧‧齒輪39, 91‧‧‧ gears
39a‧‧‧端部39a‧‧‧End
40、90‧‧‧齒部40, 90‧‧‧ teeth
42‧‧‧貫穿孔42‧‧‧through holes
48‧‧‧罩部48‧‧‧ Cover
48a‧‧‧前端部48a‧‧‧ front end
48b‧‧‧內周面48b‧‧‧ inner circumference
49‧‧‧凸緣部49‧‧‧Flange
49a‧‧‧端面49a‧‧‧ end face
49b‧‧‧端面49b‧‧‧ end face
49c‧‧‧外周面49c‧‧‧ outer perimeter
49d‧‧‧內周面49d‧‧‧ inner circumference
51‧‧‧貫穿孔51‧‧‧through holes
71‧‧‧旋轉部71‧‧‧Rotating Department
72‧‧‧軸部72‧‧‧Axis
78‧‧‧齒部78‧‧‧ teeth
81‧‧‧刃部81‧‧‧blade
CL1‧‧‧中心軸線CL1‧‧‧ central axis
CL2‧‧‧中心軸線CL2‧‧‧ center axis
D1‧‧‧成膜材料D1‧‧‧ film forming materials
D2‧‧‧成膜材料D2‧‧‧ film forming materials
Ma‧‧‧成膜材料Ma‧‧‧film forming materials
SP‧‧‧空間部SP‧‧‧Space Department
第1圖係表示本發明的第1實施形態之成膜裝置的結構之俯視剖視圖。Fig. 1 is a plan cross-sectional view showing the structure of a film formation apparatus according to a first embodiment of the present invention.
第2圖係放大表示第1圖中的主爐缸機構周邊的結構之側視剖視圖。Fig. 2 is a side elevational cross-sectional view showing the structure around the main hearth mechanism in Fig. 1 in an enlarged manner.
第3圖係放大表示第2圖中的主爐缸及外環框之側視剖視圖。Fig. 3 is a side elevational cross-sectional view showing the main hearth and the outer ring frame in Fig. 2 in an enlarged manner.
第4圖係從X軸負方向觀察第3圖中的齒輪及旋轉部之圖。Fig. 4 is a view of the gear and the rotating portion in Fig. 3 as seen from the negative X-axis direction.
第5圖係支撐構件周邊結構之放大圖。Figure 5 is an enlarged view of the peripheral structure of the support member.
第6圖係放大表示本發明的第2實施形態之成膜裝置的主爐缸及外環框之側視剖視圖。Fig. 6 is a side elevational cross-sectional view showing the main hearth and the outer ring frame of the film forming apparatus of the second embodiment of the present invention.
第7圖係從X軸正方向觀察第6圖所示之外環框之圖。Fig. 7 is a view of the outer ring frame shown in Fig. 6 as seen from the positive X-axis direction.
第8圖係放大表示本發明的第3實施形態之成膜裝置的主爐缸及外環框之側視剖視圖。Fig. 8 is a side elevational cross-sectional view showing the main hearth and the outer ring frame of the film forming apparatus according to the third embodiment of the present invention.
第9圖係從X軸負方向觀察第8圖中的齒輪及旋轉部之圖。Fig. 9 is a view of the gear and the rotating portion in Fig. 8 as seen from the negative X-axis direction.
以下,參閱附圖對本發明之成膜裝置的一實施形態進 行詳細說明。另外,在附圖說明中對相同要件賦予相同元件符號,並省略重複說明。Hereinafter, an embodiment of a film forming apparatus of the present invention will be described with reference to the accompanying drawings. Detailed description of the line. In the description of the drawings, the same elements are denoted by the same reference numerals, and the repeated description is omitted.
第1圖係表示本發明的成膜裝置的一實施形態的結構之俯視剖視圖。第2圖係放大表示第1圖中的主爐缸機構周邊的結構之側視剖視圖。本實施形態的成膜裝置1係離子鍍著法中使用之所謂離子鍍著裝置。另外,為了方便說明,第1圖中示出XYZ座標系。Y軸方向係搬運後述之被成膜物之方向。X軸方向係被成膜物與後述之爐缸機構相向之方向。Z軸方向係與X軸方向和Y軸方向正交之方向。Fig. 1 is a plan cross-sectional view showing a configuration of an embodiment of a film forming apparatus of the present invention. Fig. 2 is a side elevational cross-sectional view showing the structure around the main hearth mechanism in Fig. 1 in an enlarged manner. The film forming apparatus 1 of the present embodiment is a so-called ion plating apparatus used in the ion plating method. In addition, for convenience of explanation, the XYZ coordinate system is shown in FIG. The Y-axis direction is a direction in which the film-formed material described later is conveyed. The X-axis direction is a direction in which the film formation body faces the hearth mechanism described later. The Z-axis direction is a direction orthogonal to the X-axis direction and the Y-axis direction.
如第1圖所示,本實施形態的成膜裝置1係所謂立式成膜裝置,是以板狀被成膜物的板厚方向成為水平方向之方式,使被成膜物在直立狀態或是從直立狀態轉成傾斜之狀態下被配置於真空容器內來進行搬運。此時,X軸方向為水平方向且為被成膜物的板厚方向,Y軸方向為水平方向,Z軸方向為鉛直方向。As shown in Fig. 1, the film forming apparatus 1 of the present embodiment is a so-called vertical film forming apparatus in which the film-formed object is in an upright state or in a state in which the thickness direction of the film-formed object is horizontal. It is placed in a vacuum container and conveyed while being turned from the upright state to the inclined state. At this time, the X-axis direction is the horizontal direction and is the thickness direction of the film formation, the Y-axis direction is the horizontal direction, and the Z-axis direction is the vertical direction.
本實施形態的成膜裝置1具備有:爐缸機構2、搬運機構3、環爐缸6、電漿源7、壓力調整裝置8、以及真空容器10。The film forming apparatus 1 of the present embodiment includes a hearth mechanism 2, a transport mechanism 3, a ring hearth 6, a plasma source 7, a pressure adjusting device 8, and a vacuum container 10.
真空容器10具有:搬運室10a,其用於搬運形成有成膜材料的膜之被成膜物11;成膜室10b,其用於使成膜材料Ma擴散;電漿口10c,其將來自電漿源7所照射之 電漿束P容納於真空容器10內。搬運室10a、成膜室10b及電漿口10c相互連通。搬運室10a沿預定的搬運方向(圖中的箭頭A)(沿Y軸)被設定。並且,真空容器10由導電性材料構成且與接地電位連接。The vacuum container 10 has a transfer chamber 10a for transporting a film formation 11 on which a film forming material is formed, a film forming chamber 10b for diffusing the film forming material Ma, and a plasma port 10c which will come from Irradiated by the plasma source 7 The plasma bundle P is housed in the vacuum vessel 10. The transfer chamber 10a, the film forming chamber 10b, and the plasma port 10c communicate with each other. The transfer chamber 10a is set in a predetermined conveyance direction (arrow A in the drawing) (along the Y axis). Further, the vacuum vessel 10 is made of a conductive material and is connected to a ground potential.
搬運機構3沿搬運方向A搬運以與成膜材料Ma相向之狀態保持被成膜物11之被成膜物保持構件16。搬運機構3由設置於搬運室10a內之複數個搬運輥15構成。搬運輥15沿搬運方向A等間隔配置,支撐被成膜物保持構件16之同時,沿搬運方向A進行搬運。另外,被成膜物11例如使用玻璃基板或塑料基板等板狀構件。The conveyance mechanism 3 conveys the film formation object holding member 16 of the film formation object 11 in a state of being opposed to the film formation material Ma in the conveyance direction A. The transport mechanism 3 is composed of a plurality of transport rollers 15 provided in the transport chamber 10a. The conveyance rollers 15 are arranged at equal intervals in the conveyance direction A, and are supported by the film formation object holding member 16 while being conveyed in the conveyance direction A. Further, as the film formation 11 , for example, a plate member such as a glass substrate or a plastic substrate is used.
電漿源7係壓力梯度型,其主體部份經由設置在成膜室10b的側壁之電漿口10c而連接於成膜室10b。在電漿源7所產生之電漿束P,是從電漿口10c朝向成膜室10b內射出。電漿束P的射出方向是藉由設置於電漿口10c之轉向線圈(未圖示)所控制。The plasma source 7 is of a pressure gradient type, and a main portion thereof is connected to the film forming chamber 10b via a plasma port 10c provided in a side wall of the film forming chamber 10b. The plasma beam P generated in the plasma source 7 is emitted from the plasma port 10c toward the film forming chamber 10b. The direction in which the plasma beam P is emitted is controlled by a steering coil (not shown) provided in the plasma port 10c.
壓力調整裝置8連接於真空容器10,用以調整真空容器10內的壓力。壓力調整裝置8具有例如渦輪分子泵或低溫泵等減壓部、以及測定真空容器10內的壓力之壓力測定部。The pressure adjusting device 8 is connected to the vacuum vessel 10 for adjusting the pressure inside the vacuum vessel 10. The pressure adjusting device 8 includes a pressure reducing unit such as a turbo molecular pump or a cryopump, and a pressure measuring unit that measures the pressure in the vacuum chamber 10.
爐缸機構2係用於保持成膜材料Ma之機構。爐缸機構2設置於真空容器10的成膜室10b內,從輸送機構3觀察時是配置在X軸方向的負方向。爐缸機構2具有主爐缸21,該主爐缸是作為朝向成膜材料Ma導入從電漿源7所射出之電漿束P之主陽極、或作為使從電漿源7所射出 之電漿束P被導入之主陽極。The hearth mechanism 2 is a mechanism for holding the film forming material Ma. The hearth mechanism 2 is disposed in the film forming chamber 10b of the vacuum container 10, and is disposed in the negative direction in the X-axis direction when viewed from the transport mechanism 3. The hearth mechanism 2 has a main hearth 21 which is introduced as a main anode for introducing the plasma beam P emitted from the plasma source 7 toward the film forming material Ma, or as a source from the plasma source 7. The plasma beam P is introduced into the main anode.
如第2圖所示,主爐缸21具有:填充有成膜材料Ma之沿X軸方向的正方向延伸之筒狀填充部21a、以及從填充部21a突出之凸緣部21b。主爐缸21相對於真空容器10所具有之接地電位保持為正電位,因此可吸引電漿束P。在該電漿束P入射之主爐缸21的填充部21a形成有用以填充成膜材料Ma而沿水平方向(即X軸方向)貫穿之貫穿孔21c。並且,成膜材料Ma的前端部份在該貫穿孔21c的一端朝向成膜室10b露出。As shown in Fig. 2, the main hearth 21 has a cylindrical filling portion 21a that is filled with the film forming material Ma in the positive direction in the X-axis direction, and a flange portion 21b that protrudes from the filling portion 21a. The main hearth 21 is maintained at a positive potential with respect to the ground potential of the vacuum vessel 10, so that the plasma beam P can be attracted. A through hole 21c through which the film forming material Ma is filled and penetrated in the horizontal direction (that is, the X-axis direction) is formed in the filling portion 21a of the main furnace 21 into which the plasma beam P is incident. Further, the tip end portion of the film forming material Ma is exposed to the film forming chamber 10b at one end of the through hole 21c.
環爐缸6為輔助陽極,其具有用於感應電漿束P之電磁鐵。環爐缸6配置在保持成膜材料Ma之主爐缸21的填充部21a周圍。環爐缸6具有線圈6a、永久磁鐵6b、以及環狀容器6c。線圈6a及永久磁鐵6b被容納於環狀容器6c內。環爐缸6依據線圈6a中流動之電流的大小來控制入射到成膜材料Ma之電漿束P的朝向、或入射到主爐缸21之電漿束P的朝向。The ring hearth 6 is an auxiliary anode having an electromagnet for inducing the plasma beam P. The ring hearth 6 is disposed around the filling portion 21a of the main hearth 21 holding the film forming material Ma. The ring hearth 6 has a coil 6a, a permanent magnet 6b, and an annular container 6c. The coil 6a and the permanent magnet 6b are housed in the annular container 6c. The ring hearth 6 controls the orientation of the plasma beam P incident on the film forming material Ma or the direction of the plasma beam P incident on the main hearth 21 in accordance with the magnitude of the current flowing in the coil 6a.
成膜材料Ma可例示出ITO、ZnO等透明導電材料、SiON等絕緣密封材料。成膜材料Ma由絕緣性物質構成時,若對主爐缸21照射電漿束P,則主爐缸21藉由來自電漿束P的電流而被加熱,成膜材料Ma的前端部份蒸發,被電漿束P離子化之成膜材料粒子Mb朝向成膜室10b內擴散。並且,成膜材料Ma由導電性物質構成時,若對主爐缸21照射電漿束P,則電漿束P直接入射到成膜材料Ma,成膜材料Ma的前端部份被加熱而蒸發,被 電漿束P離子化之成膜材料粒子Mb朝向成膜室10b內擴散。擴散至成膜室10b內之成膜材料粒子Mb往成膜室10b的X軸正方向移動,在搬運室10a內附著於被成膜物11的表面。另外,成膜材料Ma係成形為預定長度的圓柱形狀之固體物,複數個成膜材料Ma一次性填充於爐缸機構2內。並且,因應成膜材料Ma的消耗,從爐缸機構2的X軸負方向依次擠出成膜材料Ma,以使最前端側的成膜材料Ma的前端部份與主爐缸21的上端保持預定的位置關系。如第2圖所示,在爐缸機構2的X軸負方向側設置有導入部22,該導入部是從設置於真空容器10的外側之成膜材料供給裝置(未圖示)朝向主爐缸21的填充部21a導入成膜材料Ma。導入部22係貫穿真空容器10的壁部10d而延伸至與主爐缸21的填充部21a的X軸負方向上之前端部相向之位置。導入部22具有沿X軸方向延伸而使成膜材料Ma通過之貫穿孔22a。並且,在導入部22的貫穿孔22a內設置有用以朝向主爐缸21的填充部21a擠出成膜材料Ma之擠壓桿23。The film forming material Ma can be exemplified by a transparent conductive material such as ITO or ZnO, or an insulating sealing material such as SiON. When the film forming material Ma is composed of an insulating material, when the main furnace cylinder 21 is irradiated with the plasma beam P, the main hearth 21 is heated by the current from the plasma beam P, and the front end portion of the film forming material Ma is evaporated. The film-forming material particles Mb ionized by the plasma beam P are diffused toward the film forming chamber 10b. Further, when the film forming material Ma is made of a conductive material, when the main furnace cylinder 21 is irradiated with the plasma beam P, the plasma beam P is directly incident on the film forming material Ma, and the front end portion of the film forming material Ma is heated and evaporated. , was The film-forming material particles Mb ionized by the plasma jet P are diffused toward the inside of the film forming chamber 10b. The film-forming material particles Mb diffused into the film forming chamber 10b move in the positive X-axis direction of the film forming chamber 10b, and adhere to the surface of the film forming object 11 in the transfer chamber 10a. Further, the film forming material Ma is formed into a cylindrical solid material of a predetermined length, and a plurality of film forming materials Ma are once filled in the hearth mechanism 2. In addition, the film forming material Ma is sequentially extruded from the negative X-axis direction of the hearth mechanism 2 in accordance with the consumption of the film forming material Ma, so that the front end portion of the film forming material Ma at the foremost end side and the upper end of the main hearth 21 are held. The predetermined positional relationship. As shown in Fig. 2, the introduction portion 22 is provided on the negative X-axis side of the hearth mechanism 2, and the introduction portion faces the main furnace from a film forming material supply device (not shown) provided outside the vacuum container 10. The filling portion 21a of the cylinder 21 is introduced into the film forming material Ma. The introduction portion 22 extends through the wall portion 10d of the vacuum vessel 10 and extends to a position facing the front end portion of the filling portion 21a of the main hearth 21 in the negative X-axis direction. The introduction portion 22 has a through hole 22a that extends in the X-axis direction and allows the film forming material Ma to pass therethrough. Further, a pressing rod 23 for extruding the film forming material Ma toward the filling portion 21a of the main hearth 21 is provided in the through hole 22a of the introduction portion 22.
本實施形態之成膜裝置1的爐缸機構2具備罩結構30,該罩結構用於防止因在成膜時成膜材料Ma堆積於主爐缸21周圍而引起之主爐缸21與環爐缸6的短路。參照第2圖~第5圖對該罩結構30進行詳細說明。第3圖係第2圖所示之主爐缸21的填充部21a及外環框31周邊的結構的放大圖。第4圖係從X軸負方向觀察齒輪39及旋轉部71之圖。第5圖係支撐構件33周邊結構之放大圖。The hearth mechanism 2 of the film forming apparatus 1 of the present embodiment is provided with a cover structure 30 for preventing the main hearth 21 and the ring furnace caused by the deposition of the film forming material Ma around the main hearth 21 at the time of film formation. Short circuit of the cylinder 6. The cover structure 30 will be described in detail with reference to FIGS. 2 to 5. Fig. 3 is an enlarged view showing the structure of the filling portion 21a of the main hearth 21 and the periphery of the outer ring frame 31 shown in Fig. 2 . Fig. 4 is a view of the gear 39 and the rotating portion 71 as seen from the negative X-axis direction. Fig. 5 is an enlarged view of the peripheral structure of the support member 33.
如第2圖及第3圖所示,罩結構30具備:外環框31,其包圍主爐缸21的填充部21a;內罩32,其在比外環框31更靠內周側並包圍主爐缸21的填充部21a;支撐構件33,其將外環框31支撐為能夠進行旋轉;以及驅動結構34,其用以使外環框31旋轉。另外,本實施形態之成膜裝置1中,外環框31設置為相對於主爐缸21的填充部21a呈偏心,填充部21a的中心軸線CL1與外環框31的中心軸線CL2雖相互平行,但其設置位置相互不一致(請參照第3圖及第4圖)。不過,中心軸線CL1與中心軸線CL2的位置關係並不限定於本實施形態的附圖所示,亦可為相互一致。As shown in FIGS. 2 and 3, the cover structure 30 includes an outer ring frame 31 that surrounds the filling portion 21a of the main hearth 21, and an inner cover 32 that surrounds the inner circumferential side of the outer ring frame 31. A filling portion 21a of the main hearth 21; a support member 33 that supports the outer ring frame 31 to be rotatable; and a drive structure 34 for rotating the outer ring frame 31. Further, in the film forming apparatus 1 of the present embodiment, the outer ring frame 31 is provided eccentric with respect to the filling portion 21a of the main hearth 21, and the central axis CL1 of the filling portion 21a and the central axis CL2 of the outer ring frame 31 are parallel to each other. However, the setting positions are different from each other (please refer to Figures 3 and 4). However, the positional relationship between the central axis CL1 and the central axis CL2 is not limited to the one shown in the drawings of the present embodiment, and may be identical to each other.
如第3圖所示,外環框31係圓筒狀有底容器。外環框31具有:側壁部36,其包圍主爐缸21的填充部21a;底部37,其設置在基端側(X軸負方向)之側壁部36的端部;蓋體38,其設置在底部37;以及齒輪39,其設置有齒部40。並且,外環框31形成有供主爐缸21的填充部21a及內罩32插穿之貫穿孔42。從中心軸線CL2方向觀察,貫穿孔42呈以該中心軸線CL2為中心之圓形。As shown in Fig. 3, the outer ring frame 31 is a cylindrical bottomed container. The outer ring frame 31 has a side wall portion 36 that surrounds the filling portion 21a of the main hearth 21, and a bottom portion 37 that is disposed at an end portion of the side wall portion 36 on the proximal end side (the negative X-axis direction); the cover body 38 is disposed At the bottom 37; and a gear 39, which is provided with a toothing 40. Further, the outer ring frame 31 is formed with a through hole 42 through which the filling portion 21a of the main hearth 21 and the inner cover 32 are inserted. The through hole 42 has a circular shape centered on the central axis CL2 as viewed in the direction of the central axis CL2.
外環框31的側壁部36是朝向側方逐漸翹曲並在成膜室10b側呈開口。即,側壁部36隨著朝向前端側(X軸正方向)而向外周側擴大。本實施形態中,側壁部36,是從底部37側朝向前端側依次具有:水平部36a,其從底部37沿水平方向延伸;傾斜部36b,其以朝向前端側擴大之方式相對於中心軸線CL2呈傾斜;彎曲部36c,其 以從傾斜部36b的前端側更進一步擴大之方式呈彎曲;水平部36d,其從彎曲部36c的前端沿水平方向延伸;以及前端部36e,其以與中心軸線CL2大致垂直之方式朝向內周側折回。如此由於前端部36e向內周側折回,而在由該前端部36e、彎曲部36c、以及水平部36d所包圍之區域內形成剖面為U字狀的空間部SP(於第3圖中標示以梨皮圖案之部份)。附著於外環框31之成膜材料D2或附著於主爐缸21之成膜材料D1有剝落時,能夠以折回的前端部36e來阻擋所剝落之成膜材料D1,並且能夠先積存於空間部SP以免從外環框31掉落。另外,外環框31的側壁部36的形狀並不限定於本實施形態的形狀,而是可以採用各種形狀。例如,亦可以以朝向前端側逐漸彎曲之方式擴大。並且,雖然為了確保較大空間部SP而設置水平部36d從而使剖面呈U字狀,但空間部SP的形狀並沒有限定。例如,亦可以不設置水平部36d而直接從彎曲部36c或傾斜部36b折回。並且,還可以不在前端部折回。The side wall portion 36 of the outer ring frame 31 is gradually warped toward the side and is open on the side of the film forming chamber 10b. In other words, the side wall portion 36 expands toward the outer peripheral side as it goes toward the distal end side (the positive X-axis direction). In the present embodiment, the side wall portion 36 has, in order from the bottom portion 37 side toward the front end side, a horizontal portion 36a extending in the horizontal direction from the bottom portion 37, and an inclined portion 36b which is enlarged toward the front end side with respect to the central axis CL2. Tilted; curved portion 36c, The front portion side of the inclined portion 36b is further enlarged to be curved; the horizontal portion 36d extends in the horizontal direction from the front end of the curved portion 36c; and the front end portion 36e is oriented toward the inner circumference in a manner substantially perpendicular to the central axis CL2 Side fold back. In this manner, the front end portion 36e is folded back toward the inner peripheral side, and a space portion SP having a U-shaped cross section is formed in a region surrounded by the front end portion 36e, the curved portion 36c, and the horizontal portion 36d (indicated in FIG. 3 Part of the pear skin pattern). When the film forming material D2 attached to the outer ring frame 31 or the film forming material D1 adhering to the main hearth 21 is peeled off, the peeled film forming material D1 can be blocked by the folded front end portion 36e, and can be accumulated in the space first. The portion SP is prevented from falling from the outer ring frame 31. Further, the shape of the side wall portion 36 of the outer ring frame 31 is not limited to the shape of the embodiment, but may be various shapes. For example, it may be enlarged so as to gradually bend toward the front end side. Further, although the horizontal portion 36d is provided to secure the large space portion SP, and the cross section is U-shaped, the shape of the space portion SP is not limited. For example, the horizontal portion 36d may be directly folded back from the curved portion 36c or the inclined portion 36b. Also, it is not possible to fold back at the front end.
底部37,是從側壁部36的基端側(X軸負方向)的端部以與中心軸線CL2成為大致垂直之方式朝向內周側擴大。底部37呈其中心軸線與中心軸線CL2一致之圓環狀。並且,底部37具有構成貫穿孔42的一部份之內周面37c(請參照第5圖)。另外,對於該貫穿孔42的詳細結構,將與支撐構件33的說明一同後述之。於底部37的基端側的端面37a(X軸負方向的端面)形成有圓形槽部37b,用以安裝蓋體38。於該槽部37b安裝有圓環狀的蓋 體38。蓋體38的中心軸線是與外環框31的中心軸線CL2一致。蓋體38,是在組裝支撐構件33後安裝於底部37,藉此,作為用於防止該支撐構件33脫落之蓋而發揮作用。蓋體38具有構成貫穿孔42的一部份之內周面38c。The bottom portion 37 is expanded toward the inner peripheral side from the end portion of the proximal end side (the negative X-axis direction) of the side wall portion 36 so as to be substantially perpendicular to the central axis CL2. The bottom portion 37 has an annular shape whose center axis coincides with the center axis CL2. Further, the bottom portion 37 has an inner peripheral surface 37c constituting a part of the through hole 42 (please refer to FIG. 5). The detailed structure of the through hole 42 will be described later together with the description of the support member 33. A circular groove portion 37b is formed in the end surface 37a on the proximal end side of the bottom portion 37 (the end surface in the negative X-axis direction) for attaching the lid body 38. An annular cover is attached to the groove portion 37b. Body 38. The central axis of the cover 38 coincides with the central axis CL2 of the outer ring frame 31. The lid body 38 is attached to the bottom portion 37 after the support member 33 is assembled, and functions as a cover for preventing the support member 33 from falling off. The lid body 38 has an inner peripheral surface 38c constituting a part of the through hole 42.
齒輪39呈圓環狀,係在外周面形成有齒部40之環狀外齒輪。齒輪39的中心軸線是與外環框31的中心軸線CL2一致。齒輪39安裝於蓋體38的基端側的端面38a(X軸負方向的端面)。另外,齒輪39的基端側的端部39a從非旋轉之凸緣部21b稍微分開。齒部40以包圍主爐缸21的填充部21a之方式按一定間隔設置有複數個(請參照第4圖)。齒輪39具有構成貫穿孔42的一部份之內周面39c。The gear 39 has an annular shape and is formed with an annular external gear having a tooth portion 40 formed on the outer peripheral surface thereof. The central axis of the gear 39 coincides with the central axis CL2 of the outer ring frame 31. The gear 39 is attached to the end surface 38a (the end surface in the negative X-axis direction) on the proximal end side of the lid body 38. Further, the end portion 39a on the proximal end side of the gear 39 is slightly separated from the non-rotating flange portion 21b. The tooth portion 40 is provided at a predetermined interval so as to surround the filling portion 21a of the main hearth 21 (please refer to FIG. 4). The gear 39 has an inner peripheral surface 39c constituting a part of the through hole 42.
底部37、蓋體38、以及齒輪39藉由螺絲46相互固定(請參照第4圖及第5圖)。底部37、蓋體38、以及齒輪39在中心軸線CL2周圍的複數個部位由該螺絲46所固定。依如此之結構,齒輪39的齒部40被賦予來自驅動結構34的旋轉力,藉此使齒輪39進行旋轉,隨此使包括齒輪39、蓋體38、底部37、以及側壁部36之外環框31整體進行旋轉。另外,本實施形態中,側壁部36及底部37為一體構成,相對於底部37,蓋體38作為獨立的組件而構成。其中,外環框31的結構並不限定於如此之結構,亦可以為蓋體38部份與齒輪39成一體。The bottom portion 37, the lid body 38, and the gear 39 are fixed to each other by screws 46 (please refer to Figs. 4 and 5). The bottom portion 37, the cover 38, and the gear 39 are fixed by the screw 46 at a plurality of portions around the center axis CL2. According to this configuration, the tooth portion 40 of the gear 39 is given a rotational force from the drive structure 34, whereby the gear 39 is rotated, and the outer ring including the gear 39, the cover 38, the bottom portion 37, and the side wall portion 36 is thereby included. The frame 31 is rotated as a whole. Further, in the present embodiment, the side wall portion 36 and the bottom portion 37 are integrally formed, and the lid body 38 is configured as an independent component with respect to the bottom portion 37. The structure of the outer ring frame 31 is not limited to such a structure, and the cover 38 portion may be integral with the gear 39.
內罩32具備:罩部48,其覆蓋主爐缸21的填充部 21a;以及凸緣部49,其設置於主爐缸21的基端側之罩部48的端部。於內罩32形成有使主爐缸21的填充部21a插穿之貫穿孔51。貫穿孔51,係沿水平方向貫穿罩部48及凸緣部49,且是其中心軸線與主爐缸21的中心軸線CL1呈一致之圓形貫穿孔。The inner cover 32 includes a cover portion 48 that covers the filling portion of the main hearth 21 21a; and a flange portion 49 provided at an end portion of the cover portion 48 on the proximal end side of the main hearth 21. A through hole 51 through which the filling portion 21a of the main hearth 21 is inserted is formed in the inner cover 32. The through hole 51 penetrates the cover portion 48 and the flange portion 49 in the horizontal direction, and is a circular through hole whose center axis coincides with the central axis CL1 of the main hearth 21.
罩部48是以包圍主爐缸21的填充部21a之方式構成為沿該填充部21a延伸之大致圓筒狀。罩部48的中心軸線是與主爐缸21的中心軸線CL1一致。罩部48的前端部48a延伸至填充部21a的前端側,且覆蓋該填充部21a的外周面21e的一部份。本實施形態中,罩部48的前端部48a雖未達到前端部21d而露出填充部21a的前端部21d附近的一部份區域,但前端部48a的位置並沒有特別限定,亦可以達到前端部21d。罩部48的內周面48b構成內罩32的貫穿孔51的一部份,且在內周面48b與填充部21a的外周面21e之間形成有間隙。另外,亦可以不設置罩部48而只設置用以支撐支撐構件33之凸緣部49。The cover portion 48 is formed in a substantially cylindrical shape extending along the filling portion 21a so as to surround the filling portion 21a of the main hearth 21. The central axis of the cover portion 48 coincides with the central axis CL1 of the main hearth 21. The front end portion 48a of the cover portion 48 extends to the front end side of the filling portion 21a and covers a portion of the outer peripheral surface 21e of the filling portion 21a. In the present embodiment, the distal end portion 48a of the cover portion 48 does not reach the distal end portion 21d and exposes a portion of the vicinity of the distal end portion 21d of the filling portion 21a. However, the position of the distal end portion 48a is not particularly limited, and the distal end portion can be reached. 21d. The inner circumferential surface 48b of the cover portion 48 constitutes a part of the through hole 51 of the inner cover 32, and a gap is formed between the inner circumferential surface 48b and the outer circumferential surface 21e of the filling portion 21a. Further, it is also possible to provide only the flange portion 49 for supporting the support member 33 without providing the cover portion 48.
凸緣部49,是從罩部48的基端側(X軸負方向)的端部以與中心軸線CL2成為大致垂直之方式朝向外周側擴大。凸緣部49是呈其中心軸線與中心軸線CL2一致之圓環狀。另外,第3圖中,由於填充部21a及罩部48向圖中上方偏心,因此相對於中心軸線CL2,於紙面上側所示之凸緣部49的剖面較窄。凸緣部49,是以其基端側(X軸負方向)的端面49a與主爐缸21的凸緣部21b相接之方式被支撐,且藉由螺栓53與該凸緣部21b進行固 定(請參照第5圖)。另外,凸緣部49的前端側(X軸正方向)的端面49b是設置為與外環框31的底部37的前端側(X軸正方向)的端面37d成為大致同一平面。凸緣部49的外周面49c是以與外環框31的貫穿孔42形成間隙之方式相向。並且,於外周面49c形成有被支撐構件33所支撐之面,對於其詳細結構,將與支撐構件33的說明一同後述之。凸緣部49的內周面49d構成內罩32的貫穿孔51的一部份,且在內周側的一部份具有孔徑縮窄的部份,藉此,內周面49d的一部份與填充部21a的外周面21e接觸。如此地,內罩32由於在貫穿孔51的一部份可與填充部21a的外周面21e接觸,因此易於對填充部21a覆蓋內罩32,並且還能夠防止內罩32的鬆動。The flange portion 49 is expanded toward the outer peripheral side from the end portion of the base end side (the negative X-axis direction) of the cover portion 48 so as to be substantially perpendicular to the central axis CL2. The flange portion 49 has an annular shape whose center axis coincides with the central axis CL2. In addition, in the third drawing, since the filling portion 21a and the cover portion 48 are eccentric toward the upper side in the drawing, the cross section of the flange portion 49 shown on the upper side of the paper is narrower than the central axis CL2. The flange portion 49 is supported so that the end surface 49a on the proximal end side (the X-axis negative direction) is in contact with the flange portion 21b of the main hearth 21, and is fixed by the bolt 53 and the flange portion 21b. Set (please refer to Figure 5). In addition, the end surface 49b of the front end side (the positive X-axis direction) of the flange portion 49 is provided so as to be substantially flush with the end surface 37d of the front end side (the positive X-axis direction) of the bottom portion 37 of the outer ring frame 31. The outer peripheral surface 49c of the flange portion 49 faces the gap between the through holes 42 of the outer ring frame 31. Further, a surface supported by the support member 33 is formed on the outer peripheral surface 49c, and the detailed structure thereof will be described later together with the description of the support member 33. The inner peripheral surface 49d of the flange portion 49 constitutes a part of the through hole 51 of the inner cover 32, and a portion of the inner peripheral side has a narrowed portion, whereby a part of the inner peripheral surface 49d It is in contact with the outer peripheral surface 21e of the filling portion 21a. In this manner, since the inner cover 32 can be in contact with the outer peripheral surface 21e of the filling portion 21a at a portion of the through hole 51, it is easy to cover the inner cover 32 with the filling portion 21a, and it is also possible to prevent the inner cover 32 from being loosened.
支撐構件33,係設置於主爐缸21與外環框31之間且用於限制外環框31在水平方向(X軸方向)及鉛直方向(Z軸方向)上的移動,並且是用來支撐外環框31的旋轉之構件。本實施形態中,支撐構件33,是在外環框31與內罩32之間,繞中心軸線CL2周圍設置有複數個。支撐構件33係能夠使外環框31旋轉之球體為佳。不過,只要是能夠使外環框31旋轉之形狀,支撐構件33的形狀就沒有特別限定,例如亦可以為圓柱體等。並且,支撐構件33的材料亦沒有特別限定,但適合採用陶瓷或碳為佳。採用該材料時,利用耐熱性較高,且實施成與構成外環框31或內罩32之金屬材料(例如,銅或不銹鋼)為不同之材料而可以防止燒黏,因此無需使用潤滑油就能夠使 外環框31順暢地旋轉。不過在此,作為支撐構件33的材料亦可採用金屬材料。The support member 33 is disposed between the main hearth 21 and the outer ring frame 31 and is for restricting movement of the outer ring frame 31 in the horizontal direction (X-axis direction) and the vertical direction (Z-axis direction), and is used for A member that supports the rotation of the outer ring frame 31. In the present embodiment, the support member 33 is provided between the outer ring frame 31 and the inner cover 32, and is provided around the central axis CL2. The support member 33 is preferably a sphere that can rotate the outer ring frame 31. However, the shape of the support member 33 is not particularly limited as long as it can rotate the outer ring frame 31, and may be, for example, a cylinder or the like. Further, the material of the support member 33 is also not particularly limited, but ceramic or carbon is preferably used. When the material is used, the heat resistance is high, and the material which is different from the metal material (for example, copper or stainless steel) constituting the outer ring frame 31 or the inner cover 32 can be prevented from being burnt, so that it is not necessary to use lubricating oil. Able to make The outer ring frame 31 smoothly rotates. Here, however, a metal material may be used as the material of the support member 33.
在此,使用第5圖對支撐構件33周邊的結構詳細進行說明。如第5圖所示,在外環框31的貫穿孔42的表面,形成有用於容納支撐構件33之槽部54。並且,在內罩32的凸緣部49的外周面49c,形成有向外周側突出之圓環狀突出部56,在該突出部56的外周面,形成有用於容納支撐構件33之槽部57。外環框31側的槽部54與內罩32側的槽部57是形成於相互相向之位置上,由該槽部54及槽部57所包圍之空間內裝填有複數個支撐構件33。Here, the structure around the support member 33 will be described in detail using FIG. As shown in Fig. 5, a groove portion 54 for accommodating the support member 33 is formed on the surface of the through hole 42 of the outer ring frame 31. Further, an annular projection 56 projecting toward the outer peripheral side is formed on the outer peripheral surface 49c of the flange portion 49 of the inner cover 32, and a groove portion 57 for accommodating the support member 33 is formed on the outer peripheral surface of the projection 56. . The groove portion 54 on the outer ring frame 31 side and the groove portion 57 on the inner cover 32 side are formed at positions facing each other, and a plurality of support members 33 are filled in the space surrounded by the groove portion 54 and the groove portion 57.
槽部54,其剖面呈V字狀,並由形成於底部37的內周面37c之傾斜面58與形成於蓋體38的內周面38c之傾斜面59所構成。傾斜面58是形成為從基端側朝向前端側(朝向X軸正方向)地向內周側傾斜,在繞中心軸線CL2(請參照第3圖)周圍,以及於貫穿孔42整周而形成。傾斜面59是形成為從基端側朝向前端側(朝向X軸正方向)地向外周側傾斜,在繞中心軸線CL2(請參照第3圖)周圍,以及於貫穿孔42整周而形成。槽部57,其剖面呈V字狀,並由形成於突出部56之傾斜面61及傾斜面62所構成。傾斜面61,是形成為從基端側朝向前端側(朝向X軸正方向)向外周側傾斜,在繞中心軸線CL2(請參照第3圖)周圍,以及於突出部56整周而形成。傾斜面62,是形成為從基端側朝向前端側(朝向X軸正方向)向內周側傾斜,在繞中心軸線CL2(請參照第3 圖)周圍,以及於突出部56整周而形成。The groove portion 54 has a V-shaped cross section and is composed of an inclined surface 58 formed on the inner circumferential surface 37c of the bottom portion 37 and an inclined surface 59 formed on the inner circumferential surface 38c of the lid body 38. The inclined surface 58 is formed so as to be inclined toward the inner peripheral side from the proximal end side toward the distal end side (toward the positive X-axis direction), and is formed around the central axis CL2 (see FIG. 3) and over the entire circumference of the through hole 42. . The inclined surface 59 is formed so as to be inclined toward the outer peripheral side from the proximal end side toward the distal end side (toward the positive X-axis direction), and is formed around the central axis CL2 (see FIG. 3) and over the entire circumference of the through hole 42. The groove portion 57 has a V-shaped cross section and is composed of an inclined surface 61 formed on the protruding portion 56 and an inclined surface 62. The inclined surface 61 is formed to be inclined toward the outer peripheral side from the proximal end side toward the distal end side (toward the positive X-axis direction), and is formed around the central axis CL2 (see FIG. 3) and over the entire circumference of the protruding portion 56. The inclined surface 62 is formed so as to be inclined toward the inner peripheral side from the proximal end side toward the distal end side (toward the positive X-axis direction), and is around the central axis CL2 (please refer to the third Fig.) is formed around the entire circumference of the projection 56.
傾斜面58、59、61、62分別藉由與支撐構件33接觸(容許稍微鬆動)而被支撐。依如此之結構,相對於被固定之主爐缸21及內罩32,外環框31能夠順暢地旋轉,並且限制外環框31的鉛直方向(Z軸方向)上的移動,亦同時限制水平方向(X軸方向)上的移動。另外,槽部54、57的剖面形狀不限定於如上述之V字狀,只要能夠限制外環框31的水平方向及鉛直方向上的移動者,是能夠採用各種形狀。例如,亦可以為U字狀或矩形形狀。The inclined faces 58, 59, 61, 62 are respectively supported by contact with the support member 33 (allowing a slight looseness). According to this configuration, the outer ring frame 31 can smoothly rotate with respect to the fixed main furnace 21 and the inner cover 32, and the movement of the outer ring frame 31 in the vertical direction (Z-axis direction) is restricted, and the level is also restricted. Movement in the direction (X-axis direction). In addition, the cross-sectional shape of the groove portions 54 and 57 is not limited to the above-described V-shape, and various shapes can be adopted as long as the horizontal direction and the vertical direction of the outer ring frame 31 can be restricted. For example, it may be U-shaped or rectangular.
另外,由於內罩32側的突出部56,是形成在從凸緣部49的端面49b向基端側分開之位置上,因此在該端面49b與突出部56之間形成有階段差。朝向如此之階段差部份,在外環框31上形成有從該外環框31的底部37的內周面37c向內周側突出之突出部63。藉由將外環框31側的突出部63與內罩32側的突出部56以相互交錯之方式配置,藉此外環框31與內罩32之間的間隙的剖面形狀,在比支撐構件33更靠前端側的區域成為折彎成曲柄狀之形狀。藉此,能夠抑制已蒸發之成膜材料的粒子向支撐構件33附近進入。Further, since the protruding portion 56 on the inner cover 32 side is formed at a position separated from the end surface 49b of the flange portion 49 toward the proximal end side, a step difference is formed between the end surface 49b and the protruding portion 56. The outer ring frame 31 is formed with a protruding portion 63 that protrudes from the inner peripheral surface 37c of the bottom portion 37 of the outer ring frame 31 toward the inner peripheral side. The protruding portion 63 on the side of the outer ring frame 31 and the protruding portion 56 on the side of the inner cover 32 are disposed so as to be interlaced with each other, whereby the cross-sectional shape of the gap between the outer ring frame 31 and the inner cover 32 is greater than that of the supporting member 33. The region on the front end side is shaped to be bent into a crank shape. Thereby, it is possible to suppress the particles of the film-forming material that has evaporated from entering the vicinity of the support member 33.
返回第2圖及第3圖,對驅動結構34的結構進行說明。如第2圖及第3圖所示,驅動結構具有:旋轉部71,其對外環框31賦予旋轉力;軸部72,其軸支撐該旋轉部71;以及驅動部73,其使軸部72旋轉。軸部72是從真空容器10的外側貫穿壁部10d而沿X軸方向延伸至 外環框31的齒部40的位置。驅動部73設置於真空容器10的外側,且具有沿Z軸方向延伸之旋轉軸73a。為了對軸部72傳遞驅動部73的旋轉力,於旋轉軸73a上設置有錐齒輪74,並在軸部72的端部設置有與該錐齒輪74卡合之錐齒輪76。其中,驅動部73與軸部72之間的旋轉力的傳遞機構不限定於該結構,能夠採用各種機構。並且,在真空容器10的壁部10d的外側設置有磁性流體軸承77,軸部72是插穿該磁性流體軸承77而向真空容器10內延伸。真空容器10藉由磁性流體軸承77被真空密封。另外,在軸部72的中途位置亦可設置絕緣連軸器或機械連軸器等,但圖中省略圖示。Returning to Fig. 2 and Fig. 3, the structure of the drive structure 34 will be described. As shown in FIGS. 2 and 3, the drive structure has a rotating portion 71 that imparts a rotational force to the outer ring frame 31, a shaft portion 72 whose shaft supports the rotating portion 71, and a driving portion 73 that causes the shaft portion 72 Rotate. The shaft portion 72 extends from the outside of the vacuum vessel 10 through the wall portion 10d and extends in the X-axis direction to The position of the tooth portion 40 of the outer ring frame 31. The driving portion 73 is provided outside the vacuum vessel 10 and has a rotating shaft 73a extending in the Z-axis direction. In order to transmit the rotational force of the driving portion 73 to the shaft portion 72, a bevel gear 74 is provided on the rotating shaft 73a, and a bevel gear 76 that engages with the bevel gear 74 is provided at an end portion of the shaft portion 72. However, the transmission mechanism of the rotational force between the drive unit 73 and the shaft portion 72 is not limited to this configuration, and various mechanisms can be employed. Further, a magnetic fluid bearing 77 is provided outside the wall portion 10d of the vacuum vessel 10, and the shaft portion 72 is inserted through the magnetic fluid bearing 77 to extend into the vacuum vessel 10. The vacuum vessel 10 is vacuum sealed by a magnetic fluid bearing 77. Further, an insulating coupling, a mechanical coupling, or the like may be provided at a position in the middle of the shaft portion 72, but the illustration is omitted.
如第3圖及第4圖所示,旋轉部71是由具有與外環框31的齒輪39的齒部40卡合之齒部78之齒輪所構成。旋轉部71的齒部78,是在繞軸部72周圍等間距設置成可與外環框31的齒輪39的齒部40嚙合。並且,旋轉部71,是配置在外環框31的齒部40的外周側,也就是能夠與該齒部40嚙合之位置。另外,只要能夠與齒部40嚙合,則旋轉部71亦可配置在任何位置,繞中心軸線CL2周圍的位置亦不限定於第4圖所示之位置,亦可配置在任何位置。藉由如此之驅動結構34,外環框31以進行毎1小時旋轉1~10圈左右的連續低速旋轉為佳。As shown in FIGS. 3 and 4, the rotating portion 71 is constituted by a gear having a tooth portion 78 that engages with the tooth portion 40 of the gear 39 of the outer ring frame 31. The tooth portions 78 of the rotating portion 71 are equally spaced around the shaft portion 72 so as to be engageable with the tooth portion 40 of the gear 39 of the outer ring frame 31. Further, the rotating portion 71 is disposed on the outer peripheral side of the tooth portion 40 of the outer ring frame 31, that is, a position engageable with the tooth portion 40. Further, as long as it can mesh with the tooth portion 40, the rotating portion 71 can be disposed at any position, and the position around the central axis CL2 is not limited to the position shown in FIG. 4, and can be disposed at any position. With such a drive structure 34, the outer ring frame 31 is preferably rotated at a low speed of about 1 to 10 turns for 1 hour.
接著,對本實施形態之成膜裝置1的作用、效果進行說明。Next, the action and effect of the film forming apparatus 1 of the present embodiment will be described.
首先,為了與本實施形態之成膜裝置1進行比較,對 習知之臥式成膜裝置的外環框的結構進行說明。臥式成膜裝置中,在主爐缸的周圍重疊複數個外環框,但不固定外環框而就只是配置,若成膜材料已堆積,則從內層側依次取出外環框進行更換。其中,當更換外環框時,作業人員藉由手動操作專用操作裝置而進行外環框的更換。操作裝置可舉出例如作業人員從真空容器的外側對推壓、拉引、旋轉、外環框的吊出及吊入自如之桿進行操作來對外環框勾掛而進行更換者。或者,可舉出從主爐缸的上方以手動操作伸縮式操作裝置而更換外環框者。但要將如此之習知之外環框結構適用於立式成膜裝置中時,由於須使外環框從習知之配置(外環框的底部配置在鉛直方向的下方)轉為對垂直傾斜之配置,因此存在有外環框倒下於水平方向而從主爐缸脫落而掉落等問題。如此,在習知之外環框的結構中,存在有無法良好地適用於立式成膜裝置之問題。First, in order to compare with the film forming apparatus 1 of the present embodiment, The structure of the outer ring frame of the conventional horizontal film forming apparatus will be described. In the horizontal film forming apparatus, a plurality of outer ring frames are stacked around the main hearth, but the outer ring frame is not fixed and is disposed. If the film forming material is stacked, the outer ring frame is sequentially taken out from the inner layer side for replacement. . Wherein, when the outer ring frame is replaced, the operator replaces the outer ring frame by manually operating the special operation device. The operating device may be replaced by, for example, an operator who presses, pulls, rotates, lifts the outer ring frame, and hangs a lever from the outside of the vacuum container to hook the outer ring frame. Alternatively, the outer ring frame may be replaced by manually operating the telescopic operation device from above the main hearth. However, when such a conventional ring frame structure is applied to a vertical film forming apparatus, the outer ring frame must be turned from a conventional configuration (the bottom of the outer ring frame is disposed below the vertical direction) to be vertically inclined. Since it is disposed, there is a problem that the outer ring frame falls down in the horizontal direction and falls off from the main hearth. As described above, in the structure of the ring frame other than the conventional one, there is a problem that it cannot be suitably applied to the vertical film forming apparatus.
相對於此,在本實施形態之成膜裝置1中,是藉由支撐構件33來限制外環框31在水平方向上之移動。因此,外環框31不會掉落而能夠維持由支撐構件33所支撐之狀態。On the other hand, in the film forming apparatus 1 of the present embodiment, the movement of the outer ring frame 31 in the horizontal direction is restricted by the support member 33. Therefore, the outer ring frame 31 does not fall and can maintain the state supported by the support member 33.
在此,對於立式成膜裝置,為了防止外環框的掉落而設為僅固定支撐外環框的底部之結構時,由於不得不解除該固定支撐來取出裝置,因此無法使用如習知之操作裝置來進行外環框的更換,故維護費時,維護頻率有可能變高。然而,在本實施形態中,外環框31,是經由齒部40被賦予來自旋轉部71的旋轉力而能夠繞主爐缸21的填充 部21a周圍進行旋轉。藉此,已蒸發之成膜材料相對於外環框31不會集中於一處而附著,而是能夠遍及整周均勻地附著。例如,如第3圖所示之成膜材料D2的附著物並非只在圖中所示之部份集中生長,能夠使其遍及整周而附著。因此,能夠提高每一外環框31的堆積效率。亦即,採用僅固定支撐外環框之結構時,若在外環框的一部份附著物已生成時,則即使在其他部份附著物尚未生成多少亦必須進行維護。而在本實施形態中,藉由使外環框31旋轉而能夠遍及整周使附著物的厚度大致均勻。因此,能夠大幅降低維護頻率。並且,本實施形態中,將外環框31大型化時,能夠更進一步降低維護頻率。例如,將外環框31的直徑設置為A倍時,外環框31的表面積成為A2 倍,因此亦有可能使維護頻率成為(1/A的乘方)。相對於此,在習知方法中,維護間隔可由主爐缸與外環框之間的距離來決定,因此只能設為1/A左右。並且,依本實施形態無需重疊複數個外環框,因而能夠減少外環框。依據以上,在立式成膜裝置中能夠以較佳形態覆蓋爐缸周邊。Here, in the case of the vertical film forming apparatus, in order to prevent the outer ring frame from falling, the structure for supporting the bottom of the outer ring frame is fixed only, since the fixing support has to be released to take out the device, it is impossible to use the conventional device. The operating device is used to replace the outer ring frame, so maintenance is time consuming and the maintenance frequency may become high. However, in the present embodiment, the outer ring frame 31 is rotated around the filling portion 21a of the main hearth 21 by the rotational force from the rotating portion 71 via the tooth portion 40. Thereby, the vaporized film-forming material is adhered to the outer ring frame 31 without being concentrated in one place, and can be uniformly attached over the entire circumference. For example, the deposit of the film-forming material D2 as shown in Fig. 3 is not concentrated only in the portion shown in the drawing, and can be attached over the entire circumference. Therefore, the stacking efficiency of each outer ring frame 31 can be improved. That is, when the structure that only supports the outer ring frame is fixed, if a part of the attachment of the outer ring frame has been formed, maintenance must be performed even if the attachment of the other part has not been generated. In the present embodiment, by rotating the outer ring frame 31, the thickness of the deposit can be made substantially uniform throughout the entire circumference. Therefore, the maintenance frequency can be greatly reduced. Further, in the present embodiment, when the outer ring frame 31 is increased in size, the maintenance frequency can be further reduced. For example, when the diameter of the outer ring frame 31 is set to A times, the surface area of the outer ring frame 31 is A 2 times, and therefore the maintenance frequency may be (1/A power). On the other hand, in the conventional method, the maintenance interval can be determined by the distance between the main hearth and the outer ring frame, and therefore can only be set to about 1/A. Further, according to the present embodiment, it is not necessary to overlap a plurality of outer ring frames, so that the outer ring frame can be reduced. According to the above, in the vertical film forming apparatus, the periphery of the hearth can be covered in a preferred form.
並且,如習知之臥式成膜裝置,重疊複數個外環框並藉由操作裝置以手動操作進行更換時,需要在作業過程中暫時停止電漿束的照射,另外由於是手動作業,因此存在成膜裝置的運轉率下降之問題。然而,在本實施形態中,藉由外環框31的自動性的旋轉動作,能夠防止主爐缸21與環爐缸6的短路。並且,外環框31的防止堆積效率較高,因此在長時間內無需進行維護,直至下一次維護期間 無需停止電漿束的照射而能夠使成膜裝置連續運轉。因此,與習知之外環框的結構相比,能夠提高成膜裝置1的運轉率。Moreover, as in the conventional horizontal film forming apparatus, when a plurality of outer ring frames are overlapped and replaced by a manual operation by an operation device, it is necessary to temporarily stop the irradiation of the plasma beam during the operation, and since it is a manual operation, there is The problem of the operation rate of the film forming apparatus is lowered. However, in the present embodiment, the short rotation of the main hearth 21 and the ring hearth 6 can be prevented by the automatic rotation operation of the outer ring frame 31. Moreover, the outer ring frame 31 has a high stacking prevention efficiency, so maintenance is not required for a long period of time until the next maintenance period. The film forming apparatus can be continuously operated without stopping the irradiation of the plasma beam. Therefore, the operation rate of the film forming apparatus 1 can be improved as compared with the structure of the outer ring frame.
並且,於本實施形態之成膜裝置1中,外環框31的前端部36e朝向內周側折回。依如此之結構,能夠以被折回之前端部36e阻擋欲從外環框31內掉落之成膜材料的附著物。藉此,能夠防止成膜材料的附著物從外環框31掉落。Further, in the film forming apparatus 1 of the present embodiment, the front end portion 36e of the outer ring frame 31 is folded back toward the inner peripheral side. According to this configuration, it is possible to block the deposit of the film-forming material to be dropped from the outer ring frame 31 with the end portion 36e folded back. Thereby, it is possible to prevent the deposit of the film forming material from falling from the outer ring frame 31.
第6圖及第7圖所示之第2實施形態之成膜裝置的罩結構130中,設置有:具有削掉主爐缸21的前端部21d附近的成膜材料的附著物之刃部81之去除結構80,主要在該點上,與第1實施形態之成膜裝置1的罩結構30相異。In the cover structure 130 of the film forming apparatus of the second embodiment shown in FIG. 6 and FIG. 7, the blade portion 81 having the adhering material of the film forming material in the vicinity of the tip end portion 21d of the main hearth 21 is provided. The removal structure 80 is mainly different from the cover structure 30 of the film formation apparatus 1 of the first embodiment.
如第6圖及第7圖所示,罩結構130的去除結構80是藉由在外環框31上設置一對刮刀85所構成。各刮刀85是設置在相對於中心軸線CL2相互成180°的位置上。其中,刮刀85的個數或配置並沒有特別限定,可以是1個,亦可以是3個以上。As shown in FIGS. 6 and 7, the removal structure 80 of the cover structure 130 is constituted by providing a pair of doctor blades 85 on the outer ring frame 31. Each of the doctor blades 85 is disposed at a position 180 degrees from each other with respect to the center axis CL2. However, the number or arrangement of the doctor blades 85 is not particularly limited, and may be one or three or more.
刮刀85具有相對於主爐缸21的填充部21a能夠進行伸縮之結構,且具備有:去除構件82,其具有刃部81;支撐體83,其支撐該去除構件82;彈簧84,其填裝於支撐體83內。去除構件82係從外環框31的側壁部36側朝 向主爐缸21的填充部21a向徑向內側延伸之柱狀構件,在其前端形成有刃部81。刃部81具有與填充部21a的前端部21d及該前端部21d附近的外周面21e對應之形狀。支撐體83係具備容納去除構件82之圓筒狀鞘部83a、以及藉由螺鎖等與外環框31的側壁部36固定之固定部83b。在鞘部83a內,彈簧84的前端側與設置於去除構件82之凹部82a的底面連結,且基端側與固定部83b連結。因此,相對於主爐缸21的填充部21a,能夠產生壓緊去除構件82的刃部81之按壓力。The scraper 85 has a structure capable of expanding and contracting with respect to the filling portion 21a of the main hearth 21, and includes a removing member 82 having a blade portion 81, a supporting body 83 supporting the removing member 82, and a spring 84 filling the same In the support body 83. The removing member 82 is directed from the side wall portion 36 of the outer ring frame 31 The columnar member that extends radially inward toward the filling portion 21a of the main hearth 21 has a blade portion 81 formed at the tip end thereof. The blade portion 81 has a shape corresponding to the front end portion 21d of the filling portion 21a and the outer peripheral surface 21e in the vicinity of the front end portion 21d. The support body 83 includes a cylindrical sheath portion 83a that houses the removal member 82, and a fixing portion 83b that is fixed to the side wall portion 36 of the outer ring frame 31 by a screw or the like. In the sheath portion 83a, the distal end side of the spring 84 is coupled to the bottom surface of the concave portion 82a provided in the removal member 82, and the proximal end side is coupled to the fixed portion 83b. Therefore, the pressing force of the blade portion 81 of the pressing and removing member 82 can be generated with respect to the filling portion 21a of the main hearth 21.
依上述結構,隨著外環框31的旋轉,刮刀85的刃部81亦沿主爐缸21的填充部21a旋轉,因此能夠刮掉附著於該填充部21a的前端部21d及外周面21e之附著物。並且,藉由使外環框31相對於主爐缸21的填充部21a偏心,由此即使刮刀85的固定部83b與填充部21a的距離發生變化,由於刮刀85係能夠利用彈簧84進行伸縮之結構,因此刃部81不受該距離的變化影響而能夠刮掉前端部21d附近的附著物。依據以上,能夠防止附著物在主爐缸21的前端部21d附近堆積。According to the above configuration, the blade portion 81 of the blade 85 is also rotated along the filling portion 21a of the main hearth 21 in accordance with the rotation of the outer ring frame 31, so that the front end portion 21d and the outer peripheral surface 21e adhering to the filling portion 21a can be scraped off. Attachment. Further, since the outer ring frame 31 is eccentric with respect to the filling portion 21a of the main hearth 21, even if the distance between the fixing portion 83b of the blade 85 and the filling portion 21a is changed, the blade 85 can be expanded and contracted by the spring 84. Since the blade portion 81 is not affected by the change in the distance, the attachment portion in the vicinity of the tip end portion 21d can be scraped off. According to the above, it is possible to prevent the deposit from accumulating in the vicinity of the front end portion 21d of the main hearth 21.
第8圖及第9圖所示之第3實施形態之成膜裝置的罩結構230中,應用環狀內齒輪之齒輪91來代替環狀外齒輪之齒輪39,主要在該點上,與第1實施形態之成膜裝置1的罩結構30相異。In the cover structure 230 of the film forming apparatus of the third embodiment shown in Figs. 8 and 9, the gear 91 of the ring-shaped internal gear is used instead of the gear 39 of the ring-shaped external gear, mainly at this point, and The cover structure 30 of the film forming apparatus 1 of the first embodiment differs.
如第6圖及第7圖所示,外環框31具備在內周側具有齒部90的齒輪91。並且,驅動結構134設置為:旋轉部71被配置於齒輪91的內周側。亦即,驅動結構134的旋轉部71及軸部72,是配置在徑向上與主爐缸21的填充部21a接近之位置。並且,隨此,在內罩32的凸緣部49或是主爐缸21的凸緣部21b,形成有用以配置旋轉部71或軸部72之貫穿孔或凹部。另外,向內周側配置旋轉部71及軸部72時,由於會導致磁性流體軸承77或傘齒輪76等與導入部22產生干涉(參照第2圖),因此有時無法採用使軸部72直接向真空容器10的外部延伸之結構。在該情況下,可藉由設置未圖示之旋轉力傳遞機構,向軸部72傳遞旋轉力。As shown in FIGS. 6 and 7, the outer ring frame 31 is provided with a gear 91 having a tooth portion 90 on the inner peripheral side. Further, the drive structure 134 is provided such that the rotating portion 71 is disposed on the inner peripheral side of the gear 91. That is, the rotating portion 71 and the shaft portion 72 of the drive structure 134 are disposed at positions close to the filling portion 21a of the main hearth 21 in the radial direction. Then, the flange portion 49 of the inner cover 32 or the flange portion 21b of the main hearth 21 is formed with a through hole or a recess for arranging the rotating portion 71 or the shaft portion 72. In addition, when the rotating portion 71 and the shaft portion 72 are disposed on the inner peripheral side, the magnetic fluid bearing 77, the bevel gear 76, and the like interfere with the introduction portion 22 (see FIG. 2). Therefore, the shaft portion 72 may not be used. A structure that extends directly to the outside of the vacuum vessel 10. In this case, a rotational force can be transmitted to the shaft portion 72 by providing a rotational force transmitting mechanism (not shown).
本發明並不限定於上述實施形態。The present invention is not limited to the above embodiment.
例如,上述實施形態中,雖是在主爐缸21與外環框31之間設置有內罩32,在外環框31與內罩32之間設置有支撐構件33,但亦可省略內罩32。在此情況下,可在主爐缸21設置支撐構件33的安裝槽,在主爐缸21與外環框31之間設置支撐構件33。For example, in the above embodiment, the inner cover 32 is provided between the main hearth 21 and the outer ring frame 31, and the support member 33 is provided between the outer ring frame 31 and the inner cover 32. However, the inner cover may be omitted. 32. In this case, the mounting groove of the support member 33 may be provided in the main hearth 21, and the support member 33 may be provided between the main hearth 21 and the outer ring frame 31.
並且,在上述實施形態中,為了在外環框31上設置齒部40、90,而使用了與底部37為不同個體的齒輪39、91,但亦可不使用該齒輪39、91,而採用在底部37的外周面或內周面本身形成齒部40、90之結構。Further, in the above-described embodiment, in order to provide the teeth 40 and 90 in the outer ring frame 31, the gears 39 and 91 which are different from the bottom 37 are used, but the gears 39 and 91 may not be used. The outer peripheral surface or the inner peripheral surface of the bottom portion 37 itself forms the structure of the tooth portions 40, 90.
本申請主張依據2012年11月9日所申請之日本發明專利第2012-247563號申請案之優先權,並參照其申請之 所有內容援用於本說明書中。The present application claims priority from the Japanese Patent Application No. 2012-247563, filed on Nov. 9, 2012, the disclosure of All content is used in this specification.
21‧‧‧主爐缸21‧‧‧Main hearth
21a‧‧‧填充部21a‧‧‧Filling Department
21b‧‧‧凸緣部21b‧‧‧Flange
21c‧‧‧貫穿孔21c‧‧‧through holes
21d‧‧‧前端部21d‧‧‧ front end
21e‧‧‧外周面21e‧‧‧ outer perimeter
30‧‧‧罩結構30‧‧‧ cover structure
31‧‧‧外環框31‧‧‧ outer ring frame
32‧‧‧內罩32‧‧‧ inner cover
33‧‧‧支撐構件33‧‧‧Support members
34‧‧‧驅動結構34‧‧‧Drive structure
36‧‧‧側壁部36‧‧‧ Sidewall
36a‧‧‧水平部36a‧‧‧ horizontal department
36b‧‧‧傾斜部36b‧‧‧ inclined section
36c‧‧‧彎曲部36c‧‧‧Bend
36d‧‧‧水平部36d‧‧‧ horizontal department
36e‧‧‧前端部36e‧‧‧ front end
37‧‧‧底部37‧‧‧ bottom
37a‧‧‧端面37a‧‧‧ end face
37b‧‧‧槽部37b‧‧‧Slots
37d‧‧‧端面37d‧‧‧ end face
38‧‧‧蓋體38‧‧‧ cover
38a‧‧‧端面38a‧‧‧ end face
39‧‧‧齒輪39‧‧‧ Gears
39a‧‧‧端部39a‧‧‧End
40‧‧‧齒部40‧‧‧ teeth
42‧‧‧貫穿孔42‧‧‧through holes
48‧‧‧罩部48‧‧‧ Cover
48a‧‧‧前端部48a‧‧‧ front end
48b‧‧‧內周面48b‧‧‧ inner circumference
49‧‧‧凸緣部49‧‧‧Flange
49a‧‧‧端面49a‧‧‧ end face
49b‧‧‧端面49b‧‧‧ end face
49c‧‧‧外周面49c‧‧‧ outer perimeter
49d‧‧‧內周面49d‧‧‧ inner circumference
51‧‧‧貫穿孔51‧‧‧through holes
71‧‧‧旋轉部71‧‧‧Rotating Department
72‧‧‧軸部72‧‧‧Axis
78‧‧‧齒部78‧‧‧ teeth
CL1‧‧‧中心軸線CL1‧‧‧ central axis
CL2‧‧‧中心軸線CL2‧‧‧ center axis
D1‧‧‧成膜材料D1‧‧‧ film forming materials
D2‧‧‧成膜材料D2‧‧‧ film forming materials
Ma‧‧‧成膜材料Ma‧‧‧film forming materials
SP‧‧‧空間部SP‧‧‧Space Department
Claims (4)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012247563A JP5832985B2 (en) | 2012-11-09 | 2012-11-09 | Deposition equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201418492A TW201418492A (en) | 2014-05-16 |
| TWI477627B true TWI477627B (en) | 2015-03-21 |
Family
ID=50703332
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW102132351A TWI477627B (en) | 2012-11-09 | 2013-09-09 | Film forming device |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP5832985B2 (en) |
| KR (1) | KR101513192B1 (en) |
| CN (1) | CN103805963B (en) |
| TW (1) | TWI477627B (en) |
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| US5490912A (en) * | 1994-05-31 | 1996-02-13 | The Regents Of The University Of California | Apparatus for laser assisted thin film deposition |
| US6872260B2 (en) * | 2000-03-23 | 2005-03-29 | Neomax Co., Ltd. | Deposited-film forming apparatus |
| US6966952B2 (en) * | 2004-01-08 | 2005-11-22 | Samsung Electronics Co., Ltd. | Apparatus of depositing thin film with high uniformity |
| TW201035371A (en) * | 2008-11-28 | 2010-10-01 | Tokyo Electron Ltd | Film deposition apparatus, film deposition method, semiconductor device fabrication apparatus, susceptor for use in the same, and computer readable storage medium |
| TW201037098A (en) * | 2008-12-01 | 2010-10-16 | Tokyo Electron Ltd | Film deposition apparatus |
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| TW201229305A (en) * | 2010-09-03 | 2012-07-16 | Tokyo Electron Ltd | Film deposition apparatus |
| US8235002B2 (en) * | 2007-11-23 | 2012-08-07 | Industrial Technology Research Institute | Plasma assisted apparatus for organic film deposition |
| TW201241206A (en) * | 2010-12-28 | 2012-10-16 | Tokki Kk | Film-forming apparatus |
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|---|---|---|---|---|
| JP2001000854A (en) * | 1999-06-23 | 2001-01-09 | Sumitomo Heavy Ind Ltd | Device for removing deposit and vapor deposition system |
| JP3732074B2 (en) | 2000-07-11 | 2006-01-05 | 住友重機械工業株式会社 | Deposition equipment |
| JP2002180240A (en) | 2000-12-20 | 2002-06-26 | Sumitomo Heavy Ind Ltd | Film forming apparatus |
| JP2006348318A (en) * | 2005-06-13 | 2006-12-28 | Sumitomo Heavy Ind Ltd | Hearth mechanism, handling mechanism and film-forming apparatus |
| JP2006346765A (en) * | 2005-06-13 | 2006-12-28 | Sumitomo Heavy Ind Ltd | Handling device |
| JP2006348334A (en) | 2005-06-14 | 2006-12-28 | Sumitomo Heavy Ind Ltd | Hearth mechanism and hearth-replacing device |
| JP2010013701A (en) * | 2008-07-03 | 2010-01-21 | Sanyo Shinku Kogyo Kk | Plasma generator and film deposition apparatus |
| SG185413A1 (en) * | 2010-05-06 | 2012-12-28 | Univ Virginia Patent Found | Spotless arc directed vapor deposition (sa-dvd) and related method thereof |
| JP5456716B2 (en) * | 2011-03-30 | 2014-04-02 | 住友重機械工業株式会社 | Deposition equipment |
-
2012
- 2012-11-09 JP JP2012247563A patent/JP5832985B2/en active Active
-
2013
- 2013-09-09 TW TW102132351A patent/TWI477627B/en active
- 2013-09-12 KR KR1020130109625A patent/KR101513192B1/en active Active
- 2013-09-17 CN CN201310424602.5A patent/CN103805963B/en active Active
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| US5490912A (en) * | 1994-05-31 | 1996-02-13 | The Regents Of The University Of California | Apparatus for laser assisted thin film deposition |
| US6872260B2 (en) * | 2000-03-23 | 2005-03-29 | Neomax Co., Ltd. | Deposited-film forming apparatus |
| US6960368B2 (en) * | 2000-03-23 | 2005-11-01 | Neomax Co., Ltd | Deposited-film forming apparatus |
| US6966952B2 (en) * | 2004-01-08 | 2005-11-22 | Samsung Electronics Co., Ltd. | Apparatus of depositing thin film with high uniformity |
| US8235002B2 (en) * | 2007-11-23 | 2012-08-07 | Industrial Technology Research Institute | Plasma assisted apparatus for organic film deposition |
| TW201035371A (en) * | 2008-11-28 | 2010-10-01 | Tokyo Electron Ltd | Film deposition apparatus, film deposition method, semiconductor device fabrication apparatus, susceptor for use in the same, and computer readable storage medium |
| TW201037098A (en) * | 2008-12-01 | 2010-10-16 | Tokyo Electron Ltd | Film deposition apparatus |
| TW201207138A (en) * | 2010-04-28 | 2012-02-16 | Ulvac Inc | Deposition apparatus |
| TW201229305A (en) * | 2010-09-03 | 2012-07-16 | Tokyo Electron Ltd | Film deposition apparatus |
| TW201241206A (en) * | 2010-12-28 | 2012-10-16 | Tokki Kk | Film-forming apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103805963A (en) | 2014-05-21 |
| JP2014095125A (en) | 2014-05-22 |
| KR101513192B1 (en) | 2015-04-17 |
| TW201418492A (en) | 2014-05-16 |
| JP5832985B2 (en) | 2015-12-16 |
| KR20140060221A (en) | 2014-05-19 |
| CN103805963B (en) | 2017-01-04 |
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