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TWI471525B - Microscopic geometry measuring system - Google Patents

Microscopic geometry measuring system Download PDF

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Publication number
TWI471525B
TWI471525B TW102127548A TW102127548A TWI471525B TW I471525 B TWI471525 B TW I471525B TW 102127548 A TW102127548 A TW 102127548A TW 102127548 A TW102127548 A TW 102127548A TW I471525 B TWI471525 B TW I471525B
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pivotable arm
displacement sensing
scanning
sensing device
probe
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TW102127548A
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Chinese (zh)
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TW201506353A (en
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Chia Yi Li
Shao Gang Hong
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Force Prec Instr Co Ltd
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Description

微觀幾何形貌量測系統Microscopic geometry measurement system

本發明關於一種微觀幾何形貌量測系統(microscopic geometry system),並且特別地,關於採用兩探針的差動式微觀幾何形貌量測系統。The present invention relates to a microscopic geometry system and, in particular, to a differential micro-geometry measurement system employing two probes.

請參閱圖1,先前技術之微觀幾何形貌量測系統1的架構係示意地繪示於圖1中。微觀幾何形貌量測系統1用以量測試片2的微觀幾何形貌。Referring to FIG. 1, the architecture of the prior art micro-geometry measurement system 1 is schematically illustrated in FIG. The microscopic geometry measurement system 1 is used to measure the microscopic geometry of the test piece 2.

微觀幾何形貌量測系統1包含基座10、升降台11、掃描橫移台12、掃描裝置13、平坦基板15、位移感測裝置16以及致動裝置18。The microscopic geometry measurement system 1 includes a susceptor 10, a lifting platform 11, a scanning traverse table 12, a scanning device 13, a flat substrate 15, a displacement sensing device 16, and an actuation device 18.

平坦基板15係固定在基座10上。試片2係安置在掃描橫移台12上。掃描橫移台12係安置在掃描橫移台12。掃描橫移台12的結構係讓其能在平坦基板15上低摩擦地移動。做為平坦基板15的條件,其表面必須被抛光到相當平坦的平坦度,所以,平坦基板15製造成本昂貴。平坦基板15的面積越大,其製造成本越加昂貴。The flat substrate 15 is fixed to the susceptor 10. The test piece 2 is placed on the scanning traverse station 12. The scanning traverse station 12 is placed on the scanning traverse station 12. The structure of the scanning traverse table 12 is such that it can move with low friction on the flat substrate 15. As a condition of the flat substrate 15, the surface thereof must be polished to a relatively flat flatness, so that the flat substrate 15 is expensive to manufacture. The larger the area of the flat substrate 15, the more expensive it is to manufacture.

升降台11係可升降地連接至基座10。掃描裝置13包含可樞轉臂132以及探針134。可樞轉臂132可樞轉地連接至升降台11。例如,如圖1所示,可樞轉臂132係以無摩擦或低摩擦鉸鏈112(例如,寶石軸承、線切割彈性體等)連接至升降台11。如圖1所示,探針134係連接至可樞轉臂132的頭端。藉由調整升降台11的高度,探針134接觸試片2的量測表面20。The lifting platform 11 is detachably connected to the base 10. The scanning device 13 includes a pivotable arm 132 and a probe 134. The pivotable arm 132 is pivotally coupled to the lifting platform 11. For example, as shown in FIG. 1, the pivotable arm 132 is coupled to the lift table 11 with a frictionless or low friction hinge 112 (eg, a jewel bearing, wire cut elastomer, etc.). As shown in FIG. 1, the probe 134 is coupled to the head end of the pivotable arm 132. The probe 134 contacts the measuring surface 20 of the test piece 2 by adjusting the height of the lifting table 11.

致動裝置18係固定在基座10上,且操作性地連接至掃描橫移台12。圖1中所示致動裝置18係藉由傳動機構182連接至掃描橫移台12。致動裝置18致動掃描橫移台12以及安置在掃描橫移台12上的試片2,進而讓探針134在試片2的量測表面20上移動。實際上,掃描裝置13並未被致動。於實際應用中,致動裝置18可以是高解析度馬達。傳動機構182可以是撓性鋼琴線。Actuating device 18 is secured to base 10 and operatively coupled to scanning traverse station 12. The actuator 18 shown in FIG. 1 is coupled to the scanning traverse station 12 by a transmission mechanism 182. The actuating device 18 actuates the scanning traverse table 12 and the test strip 2 disposed on the scanning traverse station 12, thereby moving the probe 134 over the measurement surface 20 of the test strip 2. In fact, the scanning device 13 is not actuated. In practical applications, the actuation device 18 can be a high resolution motor. Transmission mechanism 182 can be a flexible piano wire.

位移感測裝置16係固定在升降台11上。位移感測裝置16用以感測可樞轉臂132的位移。一般,位移感測裝置16感測可樞轉臂132之尾端的位移,如圖1所示。試片2之量測表面20的微觀幾何形貌即藉由感測到可樞轉臂132的位移而被解析。The displacement sensing device 16 is fixed to the lifting table 11. The displacement sensing device 16 is used to sense the displacement of the pivotable arm 132. Generally, the displacement sensing device 16 senses the displacement of the trailing end of the pivotable arm 132, as shown in FIG. The microscopic geometry of the measurement surface 20 of the test strip 2 is resolved by sensing the displacement of the pivotable arm 132.

掃描過程中,位移感測裝置1感測到的位移訊號,實際上是關於量測表面20的表面形貌的訊號與關於橫向運動基底的訊號加成混合而成。由於平坦基板15表面非常光滑,所以關於橫向運動基底的訊號非常平滑,可以被忽略。因此,位移感測裝置1感測到的位移訊號可以視為關於量測表面20的表面形貌之訊號。During the scanning process, the displacement signal sensed by the displacement sensing device 1 is actually a mixture of the signal for measuring the surface topography of the surface 20 and the signal addition for the laterally moving substrate. Since the surface of the flat substrate 15 is very smooth, the signal about the laterally moving substrate is very smooth and can be ignored. Therefore, the displacement signal sensed by the displacement sensing device 1 can be regarded as a signal regarding the surface topography of the measurement surface 20.

然而,利用先前技術之微觀幾何形貌量測系統1來量測大尺寸試片2,例如,大尺寸晶圓、觸控面板、顯示面板、太陽能面板等,是必須採用更大尺寸的平坦基板。如圖1所示,掃描橫移台12的尺寸需大於試片2的尺寸,平坦基板15的尺寸須讓掃描橫移台12在其上移動。大尺寸的平坦基板15其製造成本相當高。但是,一般量測試片的微觀幾何形貌與量測有關的面積僅約1cm2 而已。在成本考量下,平坦基板的最理想尺寸自然是約大於1cm2 。在先前技術之微觀幾何形貌量測系統1的架構下,此理想不可能達成。However, using the micro-geometry measurement system 1 of the prior art to measure the large-sized test piece 2, for example, a large-sized wafer, a touch panel, a display panel, a solar panel, etc., it is necessary to adopt a flat substrate of a larger size. . As shown in Fig. 1, the size of the scanning traverse table 12 needs to be larger than the size of the test piece 2, and the size of the flat substrate 15 is such that the scanning traverse table 12 moves thereon. The large-sized flat substrate 15 is relatively expensive to manufacture. However, the microscopic geometry of a typical test piece is only about 1 cm 2 in relation to the measurement. Under cost considerations, the optimal size of a flat substrate is naturally greater than about 1 cm 2 . This ideal is not possible with the architecture of the prior art micro-geometry measurement system 1.

顯見地,目前微觀幾何形貌量測系統尚未見到隨 著量測不同尺寸試片,而不需更動平坦基板的架構設計被提出。Obviously, the current microscopic geometry measurement system has not been seen An architectural design that measures different size test pieces without the need to change the flat substrate is proposed.

因此,本發明所欲解決的技術問題在於提供一種微觀幾何形貌量測系統,尤其是採用兩探針的差動式微觀幾何形貌量測系統。藉此,本發明之微觀幾何形貌量測系統可以隨著量測不同尺寸試片,不需更動平坦基板。Therefore, the technical problem to be solved by the present invention is to provide a microscopic geometric shape measurement system, in particular, a differential microscopic geometric shape measurement system using two probes. Thereby, the micro-geometry measurement system of the present invention can measure different size test pieces without changing the flat substrate.

本發明之第一較佳具體實施例之微觀幾何形貌量測系統,用以量測試片的微觀幾何形貌。本發明之第一較佳具體實施例之微觀幾何形貌量測系統包含第一掃描裝置、第二掃描裝置、平坦基板、第一位移感測裝置、第二位移感測裝置以及處理單元。第一掃描裝置包含第一可樞轉臂以及一第一探針。第一探針係連接至第一可樞轉臂,並且接觸試片之量測表面。第一掃描裝置被致動,致使第一探針在量測表面上移動。第二掃描裝置包含第二可樞轉臂以及第二探針。第二探針係連接至第二可樞轉臂。第二探針係接觸平坦基板之平坦表面。第二可樞轉臂係操作性連接至第一可樞轉臂,致使第二掃描裝置與第一掃描裝置被同步致動,讓第二探針在平坦表面上移動。第一位移感測裝置用以感測第一可樞轉臂之第一位移,以輸出第一訊號。第二位移感測裝置用以感測第二可樞轉臂之第二位移,以輸出第二訊號。處理單元係分別電連接至第一位移感測裝置以及第二位移感測裝置。處理單元根據第一訊號以及第二訊號計算試片的微觀幾何形貌。The microscopic geometry measurement system of the first preferred embodiment of the present invention is for measuring the microscopic geometry of the test piece. The microscopic geometry measurement system of the first preferred embodiment of the present invention includes a first scanning device, a second scanning device, a flat substrate, a first displacement sensing device, a second displacement sensing device, and a processing unit. The first scanning device includes a first pivotable arm and a first probe. The first probe is coupled to the first pivotable arm and contacts the measurement surface of the test strip. The first scanning device is actuated to cause the first probe to move over the measurement surface. The second scanning device includes a second pivotable arm and a second probe. The second probe is coupled to the second pivotable arm. The second probe contacts the flat surface of the flat substrate. The second pivotable arm is operatively coupled to the first pivotable arm such that the second scanning device is synchronized with the first scanning device to move the second probe over the flat surface. The first displacement sensing device is configured to sense a first displacement of the first pivotable arm to output the first signal. The second displacement sensing device is configured to sense a second displacement of the second pivotable arm to output a second signal. The processing unit is electrically connected to the first displacement sensing device and the second displacement sensing device, respectively. The processing unit calculates the microscopic geometry of the test piece according to the first signal and the second signal.

本發明之第二較佳具體實施例之微觀幾何形貌量測系統,用以量測試片的微觀幾何形貌。本發明之第二較佳具體實施例之微觀幾何形貌量測系統包含第一掃描裝置、第二掃描裝置、平坦基板、第一位移感測裝置、第二位移感 測裝置以及處理單元。第一掃描裝置包含第一可樞轉臂以及第一探針。第一探針係連接至第一可樞轉臂,並且接觸試片之量測表面。第一掃描裝置被致動,致使第一探針在量測表面上移動。第二掃描裝置包含第二可樞轉臂以及第二探針。第二探針係連接至第二可樞轉臂。第二探針係接觸平坦基板之平坦表面。平坦基板係操作性連接至第一可樞轉臂,致使平坦基板與第一掃描裝置被同步致動,讓第二探針在該平坦表面上移動。第一位移感測裝置用以感測第一可樞轉臂之第一位移,以輸出第一訊號。第二位移感測裝置用以感測第二可樞轉臂之第二位移,以輸出一第二訊號。處理單元係分別電連接至第一位移感測裝置以及第二位移感測裝置。處理單元根據第一訊號以及第二訊號計算關於試片的微觀幾何形貌。A microscopic geometrical appearance measuring system according to a second preferred embodiment of the present invention is for measuring the microscopic geometry of the test piece. A microscopic geometrical appearance measuring system according to a second preferred embodiment of the present invention includes a first scanning device, a second scanning device, a flat substrate, a first displacement sensing device, and a second displacement sense Measuring device and processing unit. The first scanning device includes a first pivotable arm and a first probe. The first probe is coupled to the first pivotable arm and contacts the measurement surface of the test strip. The first scanning device is actuated to cause the first probe to move over the measurement surface. The second scanning device includes a second pivotable arm and a second probe. The second probe is coupled to the second pivotable arm. The second probe contacts the flat surface of the flat substrate. The flat substrate is operatively coupled to the first pivotable arm such that the flat substrate is synchronously actuated with the first scanning device to move the second probe over the flat surface. The first displacement sensing device is configured to sense a first displacement of the first pivotable arm to output the first signal. The second displacement sensing device is configured to sense a second displacement of the second pivotable arm to output a second signal. The processing unit is electrically connected to the first displacement sensing device and the second displacement sensing device, respectively. The processing unit calculates a microscopic geometric shape of the test piece according to the first signal and the second signal.

與先前技術相較,本發明之微觀幾何形貌量測系統採用兩探針的差動式量測方式,藉此,可以隨著量測不同尺寸試片,不需更動平坦基板。Compared with the prior art, the micro-geometry measurement system of the present invention adopts a differential measurement method of two probes, whereby the test pieces of different sizes can be measured, and the flat substrate is not required to be changed.

關於本發明之優點與精神可以藉由以下的發明詳述及所附圖式得到進一步的瞭解。The advantages and spirit of the present invention will be further understood from the following detailed description of the invention.

1‧‧‧微觀幾何形貌量測系統1‧‧‧Microscopic Geometry Measurement System

10‧‧‧基座10‧‧‧ Pedestal

11‧‧‧升降台11‧‧‧ Lifting platform

112‧‧‧無摩擦或低摩擦鉸鏈112‧‧‧No friction or low friction hinge

12‧‧‧掃描橫移台12‧‧‧Scanning traverse station

13‧‧‧掃描裝置13‧‧‧Scanning device

132‧‧‧可樞轉臂132‧‧‧ pivotable arm

134‧‧‧探針134‧‧‧ probe

15‧‧‧平坦基板15‧‧‧flat substrate

16‧‧‧位移感測裝置16‧‧‧Displacement sensing device

18‧‧‧致動裝置18‧‧‧Acoustic device

182‧‧‧傳動機構182‧‧‧Transmission mechanism

2‧‧‧試片2‧‧‧ test strips

20‧‧‧量測表面20‧‧‧Measurement surface

3‧‧‧微觀幾何形貌量測系統3‧‧‧Microscopic Geometry Measurement System

30‧‧‧基座30‧‧‧Base

302‧‧‧載台302‧‧‧ stage

31‧‧‧升降台31‧‧‧ Lifting table

312‧‧‧可調整安置座312‧‧‧Adjustable seating

32‧‧‧掃描橫移台32‧‧‧Scanning traverse station

322‧‧‧無摩擦或低摩擦鉸鏈322‧‧‧No friction or low friction hinge

324‧‧‧無摩擦或低摩擦鉸鏈324‧‧‧No friction or low friction hinges

33‧‧‧第一掃描裝置33‧‧‧First scanning device

332‧‧‧第一可樞轉臂332‧‧‧First pivotable arm

334‧‧‧第一探針334‧‧‧First probe

34‧‧‧第二掃描裝置34‧‧‧Second scanning device

342‧‧‧第二可樞轉臂342‧‧‧Second pivotable arm

344‧‧‧第二探針344‧‧‧Second probe

35‧‧‧平坦基板35‧‧‧flat substrate

350‧‧‧平坦表面350‧‧‧ flat surface

36‧‧‧第一位移感測裝置36‧‧‧First displacement sensing device

37‧‧‧第二位移感測裝置37‧‧‧Second displacement sensing device

38‧‧‧致動裝置38‧‧‧Actuating device

382‧‧‧傳動機構382‧‧‧Transmission mechanism

392‧‧‧滑軌392‧‧‧Slide rails

394‧‧‧滑塊394‧‧‧ Slider

4‧‧‧試片4‧‧‧ test strips

40‧‧‧量測表面40‧‧‧Measurement surface

5‧‧‧微觀幾何形貌量測系統5‧‧‧Microscopic Geometry Measurement System

50‧‧‧基座50‧‧‧ pedestal

502‧‧‧載台502‧‧‧ stage

51‧‧‧升降台51‧‧‧ lifting platform

514‧‧‧無摩擦或低摩擦鉸鏈514‧‧‧No friction or low friction hinge

52‧‧‧掃描橫移台52‧‧‧Scanning traverse station

522‧‧‧無摩擦或低摩擦鉸鏈522‧‧‧No friction or low friction hinge

526‧‧‧可調整安置座526‧‧‧Adjustable seating

53‧‧‧第一掃描裝置53‧‧‧First scanning device

532‧‧‧第一可樞轉臂532‧‧‧First pivotable arm

534‧‧‧第一探針534‧‧‧First probe

54‧‧‧第二掃描裝置54‧‧‧Second scanning device

542‧‧‧第二可樞轉臂542‧‧‧Second pivotable arm

544‧‧‧第二探針544‧‧‧Second probe

55‧‧‧平坦基板55‧‧‧flat substrate

550‧‧‧平坦表面550‧‧‧flat surface

56‧‧‧第一位移感測裝置56‧‧‧First displacement sensing device

57‧‧‧第二位移感測裝置57‧‧‧Second displacement sensing device

58‧‧‧致動裝置58‧‧‧Actuating device

582‧‧‧傳動機構582‧‧‧Transmission mechanism

592‧‧‧滑軌592‧‧‧Slide rails

594‧‧‧滑塊594‧‧‧ Slider

6‧‧‧試片6‧‧‧ test strips

60‧‧‧量測表面60‧‧‧Measurement surface

圖1係先前技術之微觀幾何形貌量測系統的架構係示意圖。1 is a schematic diagram of the architecture of a prior art micro-geometry measurement system.

圖2係本發明之第一較佳具體實施例之微觀幾何形貌量測系統的架構係示意圖。2 is a schematic diagram showing the architecture of a microscopic geometrical appearance measurement system according to a first preferred embodiment of the present invention.

圖3係本發明之第二較佳具體實施例之微觀幾何形貌量測系統的架構係示意圖。3 is a schematic view showing the architecture of a microscopic geometrical appearance measuring system according to a second preferred embodiment of the present invention.

請參閱圖2,本發明之第一較佳具體實施例之微觀幾何形貌量測系統3的架構係示意地繪示於圖2中。本發明之微觀幾何形貌量測系統3用以量測試片4的微觀幾何形貌。Referring to FIG. 2, the architecture of the micro-geometry measurement system 3 of the first preferred embodiment of the present invention is schematically illustrated in FIG. The microscopic geometry measurement system 3 of the present invention is used to measure the microscopic geometry of the test piece 4.

本發明之第一較佳具體實施例之微觀幾何形貌量測系統3包含第一掃描裝置33、第二掃描裝置34、平坦基板35、第一位移感測裝置36、第二位移感測裝置37以及處理單元(未繪示圖2中)。同樣地,平坦基板35的條件為其表面粗糙度必須低於次毫米。The micro-geometric measurement system 3 of the first preferred embodiment of the present invention includes a first scanning device 33, a second scanning device 34, a flat substrate 35, a first displacement sensing device 36, and a second displacement sensing device. 37 and processing unit (not shown in Figure 2). Likewise, the condition of the flat substrate 35 is such that the surface roughness must be less than a few millimeters.

第一掃描裝置33包含第一可樞轉臂332以及一第一探針334。第一探針334係連接至第一可樞轉臂332,並且接觸試片4之量測表面40。如圖2所示,第一探針334係連接至第一可樞轉臂332的頭端。第一掃描裝置33被致動,致使第一探針334在量測表面40上移動。The first scanning device 33 includes a first pivotable arm 332 and a first probe 334. The first probe 334 is coupled to the first pivotable arm 332 and contacts the metrology surface 40 of the test strip 4. As shown in FIG. 2, the first probe 334 is coupled to the head end of the first pivotable arm 332. The first scanning device 33 is actuated to cause the first probe 334 to move over the measurement surface 40.

第二掃描裝置34包含第二可樞轉臂342以及第二探針344。第二探針344係連接至第二可樞轉臂342。如圖2所示,第二探針344係連接至第二可樞轉臂342的頭端。第二探針344係接觸平坦基板35之平坦表面350。第二可樞轉臂342係操作性連接至第一可樞轉臂332,致使第二掃描裝置34與第一掃描裝置33被同步致動,讓第二探針342在平坦表面350上移動。The second scanning device 34 includes a second pivotable arm 342 and a second probe 344. The second probe 344 is coupled to the second pivotable arm 342. As shown in FIG. 2, the second probe 344 is coupled to the head end of the second pivotable arm 342. The second probe 344 contacts the flat surface 350 of the flat substrate 35. The second pivotable arm 342 is operatively coupled to the first pivotable arm 332, causing the second scanning device 34 to be actuated in synchronization with the first scanning device 33 to move the second probe 342 over the flat surface 350.

第一位移感測裝置36用以感測第一可樞轉臂332之第一位移,以輸出第一訊號。如圖2所示,第一位移感測裝置36感測第一可樞轉臂332之尾端的第一位移。第二位移感測裝置37用以感測第二可樞轉臂342之第二位移,以輸出第二訊號。如圖2所示,第二位移感測裝置37感測第二可樞轉臂342之尾端的第二位移。處理單元係分別電連接至第一位移感測裝置36以及第二位移感測裝置37。處理單元根據 第一訊號以及第二訊號計算試片4的微觀幾何形貌。第二訊號代表第二探針342與第一探針332同步移動時所量測到的橫向運動基底。因此,基本上處理單元將第一訊號扣除第二訊號,即可計算出代表試片4的微觀幾何形貌之訊號。The first displacement sensing device 36 is configured to sense a first displacement of the first pivotable arm 332 to output a first signal. As shown in FIG. 2, the first displacement sensing device 36 senses a first displacement of the trailing end of the first pivotable arm 332. The second displacement sensing device 37 is configured to sense a second displacement of the second pivotable arm 342 to output a second signal. As shown in FIG. 2, the second displacement sensing device 37 senses a second displacement of the trailing end of the second pivotable arm 342. The processing units are electrically connected to the first displacement sensing device 36 and the second displacement sensing device 37, respectively. Processing unit based The first signal and the second signal calculate the microscopic geometry of the test strip 4. The second signal represents the laterally moving substrate measured when the second probe 342 moves in synchronism with the first probe 332. Therefore, basically, the processing unit deducts the second signal from the first signal to calculate a signal representing the microscopic geometry of the test strip 4.

於一具體實施例中,第一位移感測裝置36與第二位移感測裝置37分別可以是光學式位移感測裝置、電容式位移感測裝置、線性可變差分變壓器(LVDT),或其他非接觸式移感測裝置。In one embodiment, the first displacement sensing device 36 and the second displacement sensing device 37 may respectively be an optical displacement sensing device, a capacitive displacement sensing device, a linear variable differential transformer (LVDT), or the like. Non-contact type displacement sensing device.

請再參閱圖2,於一具體實施例中,本發明之微觀幾何形貌量測系統3還包含基座30、升降台31以及掃描橫移台32。試片4係安置在載台302上,再一併安置在基座30上。Referring to FIG. 2 again, in a specific embodiment, the micro-geometric measurement system 3 of the present invention further includes a base 30, a lifting platform 31, and a scanning traverse platform 32. The test piece 4 is placed on the stage 302 and then placed on the base 30.

升降台31係可升降地連接至基座30。特別地,與先前技術不同,平坦基板35係固定在升降台31上。掃描橫移台32係可滑動地連接至升降台31。例如,如圖2所示,滑軌392安裝升降台31上。滑塊394係可滑動地安裝在滑軌392上。掃描橫移台32即固定在滑塊394上。The lifting platform 31 is detachably connected to the base 30. In particular, unlike the prior art, the flat substrate 35 is fixed to the elevating table 31. The scanning traverse table 32 is slidably coupled to the lifting platform 31. For example, as shown in FIG. 2, the slide rail 392 is mounted on the lift table 31. A slider 394 is slidably mounted on the slide rail 392. The scanning traverse station 32 is fixed to the slider 394.

第一可樞轉臂332與第二可樞轉臂342係可樞轉地連接至掃描橫移台32。例如,如圖2所示,第一可樞轉臂332係以無摩擦或低摩擦鉸鏈322(例如,寶石軸承、線切割彈性體等)連接至掃描橫移台32。第二可樞轉臂342係以無摩擦或低摩擦鉸鏈324(例如,寶石軸承、線切割彈性體等)連接至掃描橫移台32。第一位移感測裝置36與第二位移感測裝置37係固定在掃描橫移台32上。藉由調整升降台31的高度,第一探針334適當地接觸試片4的量測表面40。The first pivotable arm 332 and the second pivotable arm 342 are pivotally coupled to the scanning traverse station 32. For example, as shown in FIG. 2, the first pivotable arm 332 is coupled to the scanning traverse station 32 with a frictionless or low friction hinge 322 (eg, a jewel bearing, wire cut elastomer, etc.). The second pivotable arm 342 is coupled to the scanning traverse station 32 with a frictionless or low friction hinge 324 (eg, a jewel bearing, wire cut elastomer, etc.). The first displacement sensing device 36 and the second displacement sensing device 37 are fixed to the scanning traverse station 32. The first probe 334 appropriately contacts the measurement surface 40 of the test strip 4 by adjusting the height of the lift table 31.

進一步,本發明之微觀幾何形貌量測系統3還包含致動裝置38。致動裝置38係固定在升降台31上,並且操作性地連接至掃描橫移台32。例如,如圖2所示,致動裝置 38係藉由傳動機構382連接至掃描橫移台32。致動裝置38致動掃描橫移台32、第一位移感測裝置36與第二位移感測裝置37。於實際應用中,致動裝置38可以是高解析度馬達。傳動機構382可以是撓性鋼琴線、齒輪齒條、螺桿等。Further, the microscopic geometry measurement system 3 of the present invention further includes an actuation device 38. Actuating device 38 is secured to lift platform 31 and is operatively coupled to scan traverse station 32. For example, as shown in Figure 2, the actuation device The 38 is coupled to the scanning traverse station 32 by a transmission mechanism 382. Actuating device 38 actuates scanning traverse table 32, first displacement sensing device 36 and second displacement sensing device 37. In practical applications, the actuation device 38 can be a high resolution motor. The transmission mechanism 382 can be a flexible piano wire, a rack and pinion, a screw, or the like.

致動裝置38致動掃描橫移台32橫向運動,滑軌392與滑塊394間的上下變動量可以由第二探針344量測獲得,即為橫向運動基底。處理單元將藉由第一探針332所量測獲得的訊號扣除關於橫向運動基底的訊號,即可得到代表試片4的微觀幾何形貌之訊號。The actuating device 38 actuates the lateral movement of the scanning traverse table 32. The amount of up and down variation between the slide rail 392 and the slider 394 can be measured by the second probe 344, that is, the laterally moving base. The processing unit subtracts the signal about the laterally moving substrate by the signal obtained by the first probe 332 to obtain a signal representing the microscopic geometric shape of the test strip 4.

進一步,本發明之微觀幾何形貌量測系統3還包含可調整安置座312。可調整安置座312係固定在升降台31上。平坦基板35係固定在可調整安置座312上。平坦基板35可以藉由可調整安置座312的微調螺絲調整其與第二探針344之間的接觸力。Further, the micro-geometric measurement system 3 of the present invention further includes an adjustable seating 312. The adjustable seating 312 is fixed to the lifting platform 31. The flat substrate 35 is fixed to the adjustable seating seat 312. The flat substrate 35 can be adjusted in contact with the second probe 344 by the fine adjustment screw of the adjustable seating 312.

本發明之第一較佳具體實施例之微觀幾何形貌量測系統3的各個元件安置位置,並不以圖2所揭露的為限。The respective component placement positions of the micro-geometry measurement system 3 of the first preferred embodiment of the present invention are not limited to those disclosed in FIG.

請參閱圖3,本發明之第二較佳具體實施例之微觀幾何形貌量測系統5的架構係示意地繪示於圖3中。本發明之微觀幾何形貌量測系統5用以量測試片6的微觀幾何形貌。Referring to FIG. 3, the architecture of the micro-geometry measurement system 5 of the second preferred embodiment of the present invention is schematically illustrated in FIG. The microscopic geometry measurement system 5 of the present invention is used to measure the microscopic geometry of the test piece 6.

本發明之第二較佳具體實施例之微觀幾何形貌量測系統5包含第一掃描裝置53、第二掃描裝置54、平坦基板55、第一位移感測裝置56、第二位移感測裝置57以及處理單元(未繪示圖3中)。同樣地,平坦基板55的條件為其表面粗糙度必須低於次毫米。The micro-geometric measurement system 5 of the second preferred embodiment of the present invention includes a first scanning device 53, a second scanning device 54, a flat substrate 55, a first displacement sensing device 56, and a second displacement sensing device. 57 and processing unit (not shown in Figure 3). Likewise, the condition of the flat substrate 55 is such that its surface roughness must be less than a few millimeters.

第一掃描裝置53包含第一可樞轉臂532以及一第一探針534。第一探針534係連接至第一可樞轉臂532,並且接觸試片6之量測表面60。如圖3所示,第一探針534係 連接至第一可樞轉臂532的頭端。第一掃描裝置53被致動,致使第一探針534在量測表面60上移動。The first scanning device 53 includes a first pivotable arm 532 and a first probe 534. The first probe 534 is coupled to the first pivotable arm 532 and contacts the measurement surface 60 of the test strip 6. As shown in Figure 3, the first probe 534 is Connected to the head end of the first pivotable arm 532. The first scanning device 53 is actuated to cause the first probe 534 to move over the metrology surface 60.

第二掃描裝置54包含第二可樞轉臂542以及第二探針544。第二探針544係連接至第二可樞轉臂542。如圖3所示,第二探針544係連接至第二可樞轉臂542的頭端。第二探針544係接觸平坦基板55之平坦表面550。與本發明之第一較佳具體實施例不同,平坦基板55係操作性連接至第一可樞轉臂532,致使平坦基板55與第一掃描裝置53被同步致動,讓第二探針544在平坦表面550上移動。The second scanning device 54 includes a second pivotable arm 542 and a second probe 544. The second probe 544 is coupled to the second pivotable arm 542. As shown in FIG. 3, the second probe 544 is coupled to the head end of the second pivotable arm 542. The second probe 544 contacts the flat surface 550 of the flat substrate 55. Unlike the first preferred embodiment of the present invention, the flat substrate 55 is operatively coupled to the first pivotable arm 532 such that the flat substrate 55 is synchronously actuated with the first scanning device 53 for the second probe 544 Moving on the flat surface 550.

第一位移感測裝置56用以感測第一可樞轉臂532之第一位移,以輸出第一訊號。如圖3所示,第一位移感測裝置56感測第一可樞轉臂532之尾端的第一位移。第二位移感測裝置57用以感測第二可樞轉臂542之第二位移,以輸出第二訊號。如圖3所示,第二位移感測裝置57感測第二可樞轉臂542之尾端的第二位移。處理單元係分別電連接至第一位移感測裝置56以及第二位移感測裝置57。處理單元根據第一訊號以及第二訊號計算試片6的微觀幾何形貌。第二訊號代表第二探針542與第一探針532同步移動時所量測到的橫向運動基底。因此,基本上處理單元將第一訊號扣除第二訊號,即可計算出代表試片6的微觀幾何形貌之訊號。The first displacement sensing device 56 is configured to sense a first displacement of the first pivotable arm 532 to output a first signal. As shown in FIG. 3, the first displacement sensing device 56 senses a first displacement of the trailing end of the first pivotable arm 532. The second displacement sensing device 57 is configured to sense a second displacement of the second pivotable arm 542 to output a second signal. As shown in FIG. 3, the second displacement sensing device 57 senses a second displacement of the trailing end of the second pivotable arm 542. The processing units are electrically connected to the first displacement sensing device 56 and the second displacement sensing device 57, respectively. The processing unit calculates the microscopic geometry of the test strip 6 based on the first signal and the second signal. The second signal represents the laterally moving substrate as measured by the second probe 542 moving synchronously with the first probe 532. Therefore, basically, the processing unit deducts the second signal from the first signal to calculate a signal representing the microscopic geometry of the test strip 6.

於一具體實施例中,第一位移感測裝置56與第二位移感測裝置57分別可以是光學式位移感測裝置、電容式位移感測裝置、線性可變差分變壓器(LVDT),或其他非接觸式移感測裝置。In one embodiment, the first displacement sensing device 56 and the second displacement sensing device 57 may respectively be an optical displacement sensing device, a capacitive displacement sensing device, a linear variable differential transformer (LVDT), or the like. Non-contact type displacement sensing device.

請再參閱圖3,於一具體實施例中,本發明之微觀幾何形貌量測系統5還包含基座50、升降台51以及掃描橫移台52。試片6係安置在載台502上,再一併安置在基座50上。Referring to FIG. 3 again, in a specific embodiment, the micro-geometric measurement system 5 of the present invention further includes a base 50, a lifting platform 51, and a scanning traverse platform 52. The test piece 6 is placed on the stage 502 and then placed on the base 50.

升降台51係可升降地連接至基座50。掃描橫移台52係可滑動地連接至升降台51。例如,如圖3所示,滑軌592安裝升降台51上。滑塊594係可滑動地安裝在滑軌592上。掃描橫移台52即固定在滑塊594上。The lifting platform 51 is detachably connected to the base 50. The scanning traverse table 52 is slidably coupled to the lifting platform 51. For example, as shown in FIG. 3, the slide rail 592 is mounted on the lift table 51. A slider 594 is slidably mounted on the slide rail 592. The scanning traverse table 52 is fixed to the slider 594.

第一可樞轉臂532係可樞轉地連接至掃描橫移台52。第二可樞轉臂542係可樞轉地連接至升降台51。例如,如圖3所示,第一可樞轉臂532係以無摩擦或低摩擦鉸鏈522連接至掃描橫移台52。第二可樞轉臂542係以無摩擦或低摩擦鉸鏈514連接至升降台51。The first pivotable arm 532 is pivotally coupled to the scanning traverse station 52. The second pivotable arm 542 is pivotally coupled to the lift platform 51. For example, as shown in FIG. 3, the first pivotable arm 532 is coupled to the scanning traverse station 52 with a frictionless or low friction hinge 522. The second pivotable arm 542 is coupled to the lift table 51 with a frictionless or low friction hinge 514.

第一位移感測裝置56係固定在掃描橫移台52上。第二位移感測裝置57係固定在升降台51上。藉由調整升降台51的高度,第一探針534適當地接觸試片6的量測表面60。與本發明之第一較佳具體實施例不同,平坦基板55係固定在掃描橫移台52上。The first displacement sensing device 56 is fixed to the scanning traverse station 52. The second displacement sensing device 57 is fixed to the lifting platform 51. The first probe 534 appropriately contacts the measurement surface 60 of the test strip 6 by adjusting the height of the lift table 51. Unlike the first preferred embodiment of the present invention, the flat substrate 55 is fixed to the scanning traverse station 52.

進一步,本發明之微觀幾何形貌量測系統5還包含致動裝置58。致動裝置58係固定在升降台51上,並且操作性地連接至掃描橫移台52。例如,如圖3所示,致動裝置58係藉由傳動機構582連接至掃描橫移台52。致動裝置58致動掃描橫移台52、第一位移感測裝置56與平坦基板55。於實際應用中,致動裝置58可以是高解析度馬達。傳動機構582可以是撓性鋼琴線、齒輪齒條、螺桿等。Further, the microscopic geometry measurement system 5 of the present invention further includes an actuation device 58. Actuating device 58 is secured to lift platform 51 and is operatively coupled to scan traverse station 52. For example, as shown in FIG. 3, the actuator 58 is coupled to the scanning traverse station 52 by a transmission mechanism 582. Actuating device 58 actuates scanning traverse table 52, first displacement sensing device 56 and flat substrate 55. In a practical application, the actuator 58 can be a high resolution motor. The transmission mechanism 582 can be a flexible piano wire, a rack and pinion, a screw, or the like.

致動裝置58致動掃描橫移台52橫向運動,滑軌592與滑塊594間的上下變動量可以由第二探針544量測獲得,即為橫向運動基底。處理單元將藉由第一探針532所量測獲得的訊號扣除關於橫向運動基底的訊號,即可得到代表試片6的微觀幾何形貌之訊號。The actuating device 58 actuates the lateral movement of the scanning traverse table 52. The amount of up and down variation between the slide rail 592 and the slider 594 can be measured by the second probe 544, that is, the laterally moving base. The processing unit subtracts the signal about the laterally moving substrate by the signal obtained by the first probe 532 to obtain a signal representing the microscopic geometric shape of the test strip 6.

進一步,本發明之微觀幾何形貌量測系統5還包含可調整安置座526。可調整安置座526係掃描橫移台52上。 平坦基板55係固定在可調整安置座526上。平坦基板55可以藉由可調整安置座526的微調螺絲調整其與第二探針544之間的接觸力。Further, the microscopic geometry measurement system 5 of the present invention further includes an adjustable mount 526. The adjustable seating 526 is on the scanning traverse station 52. The flat substrate 55 is fixed to the adjustable mount 526. The flat substrate 55 can be adjusted in contact with the second probe 544 by the fine adjustment screw of the adjustable seating 526.

本發明之第二較佳具體實施例之微觀幾何形貌量測系統5的各個元件安置位置,並不以圖3所揭露的為限。The respective component placement positions of the micro-geometry measurement system 5 of the second preferred embodiment of the present invention are not limited to those disclosed in FIG.

藉由以上對本發明的詳細說明,可以清楚了解本發明之微觀幾何形貌量測系統採用兩探針的差動式量測方式扣除關於橫向運動基底的訊號,進而得到試片的真實微觀幾何形。並且,藉此,本發明之微觀幾何形貌量測系統可以隨著量測不同尺寸試片,不需更動平坦基板。From the above detailed description of the present invention, it can be clearly understood that the micro-geometry measurement system of the present invention uses a two-probe differential measurement method to subtract the signal about the laterally moving substrate, thereby obtaining the true micro geometry of the test piece. . Moreover, by this, the micro-geometry measurement system of the present invention can measure different size test pieces without changing the flat substrate.

藉由以上較佳具體實施例之詳述,係希望能更加清楚描述本發明之特徵與精神,而並非以上述所揭露的較佳具體實施例來對本發明之面向加以限制。相反地,其目的是希望能涵蓋各種改變及具相等性的安排於本發明所欲申請之專利範圍的面向內。因此,本發明所申請之專利範圍的面向應該根據上述的說明作最寬廣的解釋,以致使其涵蓋所有可能的改變以及具相等性的安排。The features and spirit of the present invention are intended to be more apparent from the detailed description of the preferred embodiments. On the contrary, the intention is to cover various modifications and equivalents that are within the scope of the invention as claimed. Therefore, the scope of the patent application of the present invention should be construed broadly in the light of the above description, so that it covers all possible changes and arrangements.

3‧‧‧微觀幾何形貌量測系統3‧‧‧Microscopic Geometry Measurement System

30‧‧‧基座30‧‧‧Base

302‧‧‧載台302‧‧‧ stage

31‧‧‧升降台31‧‧‧ Lifting table

312‧‧‧可調整安置座312‧‧‧Adjustable seating

32‧‧‧掃描橫移台32‧‧‧Scanning traverse station

322‧‧‧無摩擦或低摩擦鉸鏈322‧‧‧No friction or low friction hinge

324‧‧‧無摩擦或低摩擦鉸鏈324‧‧‧No friction or low friction hinges

33‧‧‧第一掃描裝置33‧‧‧First scanning device

332‧‧‧第一可樞轉臂332‧‧‧First pivotable arm

334‧‧‧第一探針334‧‧‧First probe

34‧‧‧第二掃描裝置34‧‧‧Second scanning device

342‧‧‧第二可樞轉臂342‧‧‧Second pivotable arm

344‧‧‧第二探針344‧‧‧Second probe

35‧‧‧平坦基板35‧‧‧flat substrate

350‧‧‧平坦表面350‧‧‧ flat surface

36‧‧‧第一位移感測裝置36‧‧‧First displacement sensing device

37‧‧‧第二位移感測裝置37‧‧‧Second displacement sensing device

38‧‧‧致動裝置38‧‧‧Actuating device

382‧‧‧傳動機構382‧‧‧Transmission mechanism

392‧‧‧滑軌392‧‧‧Slide rails

394‧‧‧滑塊394‧‧‧ Slider

4‧‧‧試片4‧‧‧ test strips

40‧‧‧量測表面40‧‧‧Measurement surface

Claims (10)

一種微觀幾何形貌量測系統,用以量測一試片之一微觀幾何形貌,該微觀幾何形貌量測系統包含:一第一掃描裝置,包含一第一可樞轉臂以及一第一探針,該第一探針係連接至該第一可樞轉臂且接觸該試片之一量測表面,其中該第一掃描裝置被致動,致使該第一探針在該量測表面上移動;一第二掃描裝置,包含一第二可樞轉臂以及一第二探針,該第二探針係連接至該第二可樞轉臂;一平坦基板,該第二探針係接觸該平坦基板之一平坦表面,其中該第二可樞轉臂係操作性連接至該第一可樞轉臂,致使該第二掃描裝置與該第一掃描裝置被同步致動,讓該第二探針在該平坦表面上移動;一第一位移感測裝置,用以感測該第一可樞轉臂之一第一位移,以輸出一第一訊號;一第二位移感測裝置,用以感測該第二可樞轉臂之一第二位移,以輸出一第二訊號;以及一處理單元,分別電連接至該第一位移感測裝置以及該第二位移感測裝置,根據該第一訊號以及該第二訊號計算該試片之該微觀幾何形貌。A micro-geometric measurement system for measuring a micro-geometry of a test piece, the micro-geometry measurement system comprising: a first scanning device comprising a first pivotable arm and a first a probe coupled to the first pivotable arm and contacting a measurement surface of the test strip, wherein the first scanning device is actuated such that the first probe is in the measurement Moving on the surface; a second scanning device comprising a second pivotable arm and a second probe connected to the second pivotable arm; a flat substrate, the second probe Contacting a flat surface of the flat substrate, wherein the second pivotable arm is operatively coupled to the first pivotable arm, causing the second scanning device to be actuated in synchronization with the first scanning device, The second probe moves on the flat surface; a first displacement sensing device is configured to sense a first displacement of the first pivotable arm to output a first signal; and a second displacement sensing device Sensing a second displacement of the second pivotable arm to output a second signal; A processing unit electrically connected to the first displacement sensing means and second displacement sensing means, calculates the microscopic geometries of the test strip according to the first signal and the second signal. 如請求項1所述之微觀幾何形貌量測系統,進一步包含:一基座,該試片係安置在該基座上;一升降台,係可升降地連接至該基座,該平坦基板係固定在該升降台上;以及 一掃描橫移台,係可滑動地連接至該升降台,該第一可樞轉臂與該第二可樞轉臂係可樞轉地連接至該掃描橫移台,該第一位移感測裝置與該第二位移感測裝置係固定在該掃描橫移台上。The micro-geometric measurement system of claim 1, further comprising: a base disposed on the base; and a lifting platform connected to the base in a liftable manner, the flat substrate Fastened to the lifting platform; a scanning traverse station slidably coupled to the lifting platform, the first pivotable arm and the second pivotable arm pivotally coupled to the scanning traverse station, the first displacement sensing The device and the second displacement sensing device are attached to the scanning traverse. 如請求項2所述之微觀幾何形貌量測系統,進一步包含:一致動裝置,係固定在該升降台上,且操作性地連接至該掃描橫移台,以致動該掃描橫移台、該第一位移感測裝置與該第二位移感測裝置。The microscopic geometric shape measuring system of claim 2, further comprising: an actuating device fixed to the lifting platform and operatively connected to the scanning traverse station to actuate the scanning traverse station, The first displacement sensing device and the second displacement sensing device. 如請求項3所述之微觀幾何形貌量測系統,其中該第一位移感測裝置與該第二位移感測裝置分別係一光學式位移感測裝置、一電容式位移感測裝置或一線性可變差分變壓器。The microscopic geometrical shape measuring system of claim 3, wherein the first displacement sensing device and the second displacement sensing device are respectively an optical displacement sensing device, a capacitive displacement sensing device or a line Variable differential transformer. 如請求項4所述之微觀幾何形貌量測系統,進一步包含:一可調整安置座,係固定在該升降台上,該平坦基板係固定在該可調整安置座上。The micro-geometric measurement system of claim 4, further comprising: an adjustable seating base fixed to the lifting platform, the flat substrate being fixed on the adjustable mounting seat. 一種微觀幾何形貌量測系統,用以量測一試片,該微觀幾何形貌量測系統包含:一第一掃描裝置,包含一第一可樞轉臂以及一第一探針,該第一探針係連接至該第一可樞轉臂且接觸該試片之一量測表面,其中該第一掃描裝置被致動,致使該第一探針在該量測表面上移動;一第二掃描裝置,包含一第二可樞轉臂以及一第二探針,該第二探針係連接至該第二可樞轉臂; 一平坦基板,該第二探針係接觸該平坦基板之一平坦表面,該平坦基板係操作性連接至該第一可樞轉臂,致使該平坦基板與該第一掃描裝置被同步致動,讓該第二探針在該平坦表面上移動;一第一位移感測裝置,用以感測該第一可樞轉臂之一第一位移,以輸出一第一訊號;一第二位移感測裝置,用以感測該第二可樞轉臂之一第二位移,以輸出一第二訊號;以及一處理單元,分別電連接至該第一位移感測裝置以及該第二位移感測裝置,根據該第一訊號以及該第二訊號計算關於該試片之微觀幾何形貌。A micro-geometric measurement system for measuring a test piece, the micro-geometric measurement system comprising: a first scanning device comprising a first pivotable arm and a first probe, the first a probe system coupled to the first pivotable arm and contacting a measurement surface of the test strip, wherein the first scanning device is actuated to cause the first probe to move over the measurement surface; a second scanning device comprising a second pivotable arm and a second probe, the second probe is connected to the second pivotable arm; a flat substrate, the second probe contacting a flat surface of the flat substrate, the flat substrate being operatively coupled to the first pivotable arm, such that the flat substrate is synchronously actuated with the first scanning device, Moving the second probe on the flat surface; a first displacement sensing device for sensing a first displacement of the first pivotable arm to output a first signal; a second sense of displacement Measuring device for sensing a second displacement of the second pivotable arm to output a second signal; and a processing unit electrically connected to the first displacement sensing device and the second displacement sensing The device calculates a microscopic geometric shape of the test piece according to the first signal and the second signal. 如請求項6所述之微觀幾何形貌量測系統,進一步包含:一基座,該試片係安置在該基座上;一升降台,係可升降地連接至該基座,該第二可樞轉臂係可樞轉地連接至該升降台,該第二位移感測裝置係固定在該升降台上;以及一掃描橫移台,係可滑動地連接至該升降台,該第一可樞轉臂係可樞轉地連接至該掃描橫移台,該第一位移感測裝置與該平坦基板係固定在該掃描橫移台上。The micro-geometry measurement system of claim 6, further comprising: a base disposed on the base; a lifting platform coupled to the base, the second a pivotable arming system pivotally coupled to the lifting platform, the second displacement sensing device secured to the lifting platform; and a scanning traverse station slidably coupled to the lifting platform, the first A pivotable arm is pivotally coupled to the scanning traverse station, the first displacement sensing device being secured to the scanning traverse table with the flat substrate. 如請求項7所述之微觀幾何形貌量測系統,進一步包含:一致動裝置,係固定在該升降台上,且操作性地連接至該掃描橫移台,以致動該掃描橫移台、該第一位移感測裝置與該平坦基板。The micro-geometry measurement system of claim 7, further comprising: an actuating device fixed to the lifting platform and operatively coupled to the scanning traverse station to actuate the scanning traverse station, The first displacement sensing device and the flat substrate. 如請求項8所述之微觀幾何形貌量測系統,其中該第一位 移感測裝置與該第二位移感測裝置分別係一光學式位移感測裝置、一電容式位移感測裝置或一線性可變差分變壓器。The micro-geometric measurement system according to claim 8, wherein the first bit The shift sensing device and the second displacement sensing device are respectively an optical displacement sensing device, a capacitive displacement sensing device or a linear variable differential transformer. 如請求項9所述之微觀幾何形貌量測系統,進一步包含:一可調整安置座,係固定在該掃描橫移台上,該平坦基板係固定在該可調整安置座上。The micro-geometric measurement system of claim 9, further comprising: an adjustable mounting seat fixed to the scanning traverse, the flat substrate being fixed on the adjustable mounting seat.
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EP1574815B1 (en) * 1996-02-09 2008-11-19 KLA-Tencor Corporation A dual stage instrument for scanning a specimen
CN201449249U (en) * 2009-05-15 2010-05-05 淮阴工学院 Parallel 3D microscopic shape tester
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US8438661B2 (en) * 2006-10-23 2013-05-07 Universiteit Twente Scanning probe microscope

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1574815B1 (en) * 1996-02-09 2008-11-19 KLA-Tencor Corporation A dual stage instrument for scanning a specimen
US8438661B2 (en) * 2006-10-23 2013-05-07 Universiteit Twente Scanning probe microscope
CN201449249U (en) * 2009-05-15 2010-05-05 淮阴工学院 Parallel 3D microscopic shape tester
WO2012110602A1 (en) * 2011-02-16 2012-08-23 Carl Zeiss Sms Gmbh Apparatus and method for analyzing and modifying a specimen surface

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