TWI322734B - Compression and cold weld sealing methods and devices - Google Patents
Compression and cold weld sealing methods and devices Download PDFInfo
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- TWI322734B TWI322734B TW95113354A TW95113354A TWI322734B TW I322734 B TWI322734 B TW I322734B TW 95113354 A TW95113354 A TW 95113354A TW 95113354 A TW95113354 A TW 95113354A TW I322734 B TWI322734 B TW I322734B
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Description
1322734 九、發明說明: I[考务明所廣技4标領3 ' 本發明一般的涉及將零件封接(seal)在一起的方法和 - 器件’且更具體地涉及器件和/或可植入醫療器件的密封 * (hermetic seal)方法。 - 【先前技術3 . 發明背景 φ 在許多應用中,需要將兩個或多個零件連接(j0in)、結 合(bond),或封接起來。通常,特別是對於醫療植入器件, 這些封接必須是生物相容的和密閉的,以便例如保護存儲 槽内容物的純度或性質。 美國專利No.5,797,898,No.6,527,762,No.6,491,666 • 和N〇.6,551,838中描述了可能需要封接的器件的實例,這裏 通過引用引入這些專利。這些用於存儲槽内容物的受控釋 放或暴露的器件包含其中容納有存儲槽内容物的多個存儲 φ 槽。這些存儲槽可以包括用於釋放的藥物製劑,用於暴露 的感測器,或它們的組合。在構造這些器件中,通常需要 封接兩個或多個的基材或其他部件,它們可能含有存儲槽 * 和存儲槽内容物或者與該器件的工作相關的電子元件。 本領域巾有彡種已知的封接方法。實例包括美國專利 N〇.6,730,072(描述了聚合物襯墊和背板的使用),和美國專 利Νο·6,827,25〇(描述了用於密封微存儲槽的多種技術,包 括高溫鐳射或f阻焊接,贿焊⑽defing),㈣焊接,和 金屬壓力襯塾),和美國專利申請公開N〇 2〇〇5/〇〇5〇859幻 5 中所述的那些方法,這裏通過引Μ入這些專利。這些方 法可能不適合或者不能很好地用於所有的封接應用。 在%^兄條件下,金眉表面在放在—起時通常不能結合, 因爲金屬表面覆蓋有表面氧化物,有機污染物,或它們兩 者匕們會作爲金屬結合形成的障礙。但是,以超過該金 屬屈服應力的壓力壓制兩個平坦金屬表面能夠使表面變 ^移去障礙並暴露出能夠結合的純淨金屬β然而,即使 具有兩個壓在一起的平坦表面的顯著的金屬變形,實際的 結合面積也顯著小於配合表面的面積(Mohamed &1322734 IX. DESCRIPTION OF THE INVENTION: I [Technical method relates to a method of sealing together parts and devices] and more particularly to devices and/or implantable Into the medical device's hermetic seal method. - [Prior Art 3. Background of the Invention φ In many applications, two or more parts need to be connected (j0in), bonded, or sealed. Typically, particularly for medical implant devices, these seals must be biocompatible and sealed to, for example, protect the purity or properties of the contents of the reservoir. Examples of devices that may require sealing are described in U.S. Patent Nos. 5,797,898, 6, 527, 762, 6, 491, 666, and U.S. Pat. These controlled release or exposed means for storing the contents of the tank contain a plurality of storage φ slots in which the contents of the reservoir are housed. These reservoirs may include a pharmaceutical formulation for release, a sensor for exposure, or a combination thereof. In constructing these devices, it is often desirable to seal two or more substrates or other components that may contain storage tanks* and storage tank contents or electronic components associated with the operation of the device. There are various known sealing methods in the field of towels. Examples include U.S. Patent No. 6,730,072 (which describes the use of polymeric liners and backsheets), and U.S. Patent No. 6,827,25, which describes various techniques for sealing micro-storage tanks, including high temperature lasers or f-resistance. Welding, bribing (10)defing, (d) welding, and metal pressure linings), and those described in U.S. Patent Application Publication No. 2〇〇5/〇〇5〇 859 phantom 5, hereby incorporated by reference. . These methods may not be suitable or well suited for all sealing applications. Under the condition of %^ brother, the surface of the gold eyebrows usually cannot be combined when they are placed, because the metal surface is covered with surface oxides, organic pollutants, or both of them as obstacles formed by metal bonding. However, pressing two flat metal surfaces at a pressure exceeding the yield stress of the metal can cause the surface to become obstructed and expose the pure metal that can be bonded. However, even with two flat surfaces pressed together, significant metal deformation The actual bonding area is also significantly smaller than the area of the mating surface (Mohamed &
Washburn, Welding Research Supplement, 1975年9月,第 302s-310s頁 ’ Welding & Joining Processes 3.371J/13.391JWashburn, Welding Research Supplement, September 1975, pp. 302s-310s ’ Welding & Joining Processes 3.371J/13.391J
Fabrication Technology, T. Eagar· MIT)。這種低結合面積的 特性是由於兩種現象。第一,新露出的金屬的表面分數並 不強烈依賴於平坦表面的變形量。第二,粗縫阻礙大部分 表面發生相互作用和結合。由於表面沒有完全結合,可能 存在洩漏通道,從而妨礙密封的形成。Fabrication Technology, T. Eagar· MIT). This low bond area characteristic is due to two phenomena. First, the surface fraction of the newly exposed metal does not strongly depend on the amount of deformation of the flat surface. Second, the coarse seams prevent most surfaces from interacting and bonding. Since the surface is not completely bonded, there may be a leak path that hinders the formation of the seal.
Ferguson等人在“Contact Adhesion of Thin Gold Film on Elastomeric Supports: Cold Welding Under Ambient Condition,,’ Science, New Series, 253(5021): 776-78(1991 年 8月16日)公開了環境條件下通過將薄的金金屬表面接觸在 柔性聚合物之上的金-金結合。然而,結果是結合介面具有 未結合的污染物“島”。這些島可能形成連通的洩漏通道。 希望提供改良的封接方法,該方法可以在低溫下使用 一系列材料形成密封。還希望以相對簡單和成本有效的方 去,单獨密封至少兩個基材之間的多個緊密相隔的存儲 槽’特別適用於具有高可靠性的A規模生産。 【發明内容】 發明概要 —方面,提供了用於將至少兩個基材密封在一起的壓 制冷焊方法和結構。這種方法可以有利地提供密封而無需 向封接工藝中熱輸入,這在許多應用中可能是需要的,其 中這種額外熱量可能損害器件、製劑或結合區域附近的材 料。 ▲在一個優選實施方案中,該方法包括提供第一基材, 錢材具有至少—個第—接頭結構,該接頭結構包含第一 連接表面,該表面包含第一種金屬;提供第二基材,該基 材具有至少—個第二接頭結構,該接頭結構包含第二連接 2面,該表面包含第二種金屬;和將該至少一個第一接頭 構和忒至少一個第二接頭結構壓制在一起以便使連接表 面在一個或多個介面處産生有效量的局部變形和剪切,以 在連接表面的第-種金屬㈣二種金屬之_成金屬金 屬結合。在一個實施方案中,該方法進一纟包括在壓制步 驟之前將該至少一個第一接頭結構對準在該至少一個第二 接頭結構之上,以便在該至少一個第二接頭結構上方賦與 一個或多個該至少一個第一接頭結構的交疊,其中該—個 或多個交疊在壓制步驟期間形成連接表面的一個或多個介 面。在優選的實施方案中,該一個或多個交疊能夠在沒有 熱量輪入的情況下移去(displace)表面污染物並促進連接表 1322734 面之間的密切接觸。在一個具體實施方案中,該至少一個 第一接頭結構包括至少一個凸榫(tongue)結構而該至少一 個第二接頭結構包含至少一個凹槽(groove)結構,並且將至 少一個第一接頭結構與至少一個第二結構壓制在一起的步 驟包括將該至少一個凸榫結構至少部分壓入該至少一個凹 槽結構中。在一個實施方案中,該至少一個凸榫結構的凸 榫高度範圍是1微米至100微米並且凸榫寬度的範圍是1微 米至100微米,而該至少一個凹槽結構的凹槽深度範圍是1 微米至100微米並且凹槽寬度的範圍是1微米至100微米。 可以使用結構材料的各種組合。例如,第一種金屬, 第二種金屬,或者兩者,可以包含金或者鉑。在另外的實 施方案中,第一種金屬,第二種金屬,或它們兩者,包含 選自下列的金屬:金、銦、鋁、銅、鉛、鋅、鎳、銀、鈀、 鎘、鈦、鎢、錫和它們的組合。第一種金屬和第二種金屬 可以是不同的金屬。第一基材,第二基材,或它們兩者, 可以包含矽、玻璃、陶瓷、聚合物、金屬和它們的組合。 第一接頭結構,第二接頭結構,或它們兩者,可以包含選 自下列的材料:金屬,陶瓷,玻璃,矽,和它們的組合。 在一個實施方案中,第一接頭結構,第二接頭結構,或它 們兩者,可以包含姻、紹、金、絡、链、銅、錄、錫、它 們的合金和它們的組合。 在一個實施方案中,該至少一個第一接頭結構是通過 將至少一個預製結構結合到第一基材上形成的。第一連接 表面可以通過例如電鍵工藝、蒸發、化學氣相沈積工藝、 8 1322734 濺射、電子束蒸發、或濕法刻蝕工藝形成。在一個實施方 案中,該第一接頭結構和第一連接表面是覆蓋第一基材的 至少部分表面的金屬層。 在一個實施方案中,該方法可以進一步包括在第一基 材和第二基材之間提供一個或多個預製件(preform),其中 將至少一個第一接頭結構與至少一個第二接頭結構壓制在 一起的步驟進一步包括使該一個或多個預製件在與基材或 連接表面的預製件介面處發生變形和剪切。在一個實施方 案中,該預製件包含金屬、聚合物,或金屬鐘覆的聚合物。 在一個實施方案中,該方法進一步包括加熱一個或多 個介面處的連接表面。該壓制步驟和加熱步驟可以基本上 同時發生。在一個實施方案中,使用微型加熱器進行連接 表面的加熱。 在另一個實施方案中,該封接方法進一步包括向一個 或多個介面處的連接表面施加超聲能。 在又一個實施方案中,該封接方法進一步包括將第一 基材和第二基材夾緊或軟釺焊在一起。 在該方法的一個優選實施方案中,已結合基材包含至 少一個限定在其中的腔體。在一個實施方案中,該至少第 一基材包含多個容納存儲槽内容物的不連續存儲槽,各存 儲槽彼此之間密封並且與外部環境密封。在一個實施例中, 存儲槽内容物包括生物感測器或其他輔助器件。在另一個 實施例中,存儲槽内容物包含藥物製劑。在又一個實施例 中,存儲槽内容物包含香料或香味化合物,染料或其他著 9 1322734 色劑,甜味劑,或調味劑。在一個實施方案中,第一基材 包含腔體,在將第一和第二接頭結構壓制在一起之前在該 腔體中設置第三基材。該第三基材可以包含例如感測器, MEMS器件,或它們的組合。 在一個實施方案中,在真空下或者惰性氣體氣氛中進 行該工藝中的變形步驟以能夠相對於如果在大氣中進行可 能産生的氧化而減少接頭結構的氧化。 在一個實施方案中,提供了將至少兩個基材密封在一 起方法,該方法包括提供具有至少一個第一接頭結構的第 一基材的步驟,該第一接頭結構包含第一連接表面,該表 面包含鍵覆有金屬薄層的第一種柔性聚合物;提供具有至 少一個第二接頭結構的第二基材的步驟,該第二接頭結構 包含第二連接表面,該表面包含鍍覆有金屬薄層的第二種 柔性聚合物;和將該至少一個第一接頭結構與該至少一個 第二接頭結構壓制在一起以便使連接表面在一個或多個介 面處産生有效量的局部變形,以在第一和第二連接表面之 間形成結合。在一個實施方案中,第一種或者第二種金屬 鍍覆聚合物,或者它們兩者的金屬層包含金、鉑或它們的 組合。 另一方面,提供了一種包容器件,該器件包括:具有 正面和背面的第一基材,並且該基材包含至少一個第一接 頭結構,該第一接頭結構包含表面爲第一種金屬的第一連 接表面;具有至少一個第二接頭結構的第二基材,該第二 接頭結構包含表面爲第二種金屬的第二連接表面;在第一 10 1322734 基材和第二基材之間形成的並將它們連接的密封,其中通 過在一個或多個介面處將第一連接表面壓制冷焊至第二連 接表面形成該密封;和該密封之内限定在第一基材和第二 基材之間的至少一個包容空間,從而該包容空間與外部環 境密封。在一個實施方案中,該至少一個包容空間包含在 至少第一基材中的位於正面和背面之間的多個不連續的存 儲槽。在不同實施方案中,該至少一個包容空間包含容納 於所述的包容空間内的感測器、MEMS器件、藥物製劑、 或它們的組合。在一個優選實施方案中,通過無熱量輸入 形成的金屬-金屬結合將該連接表面連接在一起。在一個實 施方案中,該至少一個第一接頭結構和至少一個第二接頭 結構包含凸榫和凹槽接頭。 在不同的實施方案中,第一種金屬,第二種金屬,或 這兩種金屬可以包含金,鉑,或它們的組合,並且該基材 可以包含選自矽、金屬、陶瓷、聚合物、玻璃,及其組合 的材料。在一個實施方案中,使預製件結構在第一和第二 接頭結構之間形變。在另一個實施方案中,該第一接頭結 構或第二接頭結構包含微型加熱器。可選地,可以在該微 型加熱器附近提供中間層。在一個實施方案中,該第一接 頭結構或第二接頭結構可以包含能通過外部感應加熱器加 熱該結構的磁性材料。 該器件可進一步包括其他固定裝置,例如可以包含夾 具將基材連接在一起,或者可以使用釺料材料將第一基材 和第二基材固定在一起。 11 在一個實施方案中,第一基材進一步包含與至少一個 包各空間相連的不連續開口,並且通過多個不連續的疒健 槽蓋封閉所述的開口。在一個實施方案中,該存儲槽蓋包 • 括金屬膜而該器件包括用於選擇性分裂(diSintegrate)# = 槽蓋的裝置(例如控制電路和能量源)。 * —方面,提供了可植入式醫療器件,該器件可用於密 . 封存儲槽中内容物的受控暴露或釋放。在一個實施方案中, % 該器件包括第一基材;位於第一基材中的多個不連續存儲 槽,該存儲槽具有第一開口和遠離第一開口的第二開口; 該存儲槽内部的存儲槽内容物,其中該存儲槽内容物包括 藥物或生物感測器;封閉第一開口的多個不連續存儲槽蓋; 選擇性分裂存儲槽盎的裝置;和第二基材以及封接和封閉 第一開口的密閉接頭,其中通過壓制冷焊形成該密閉接頭。 在一個實施方案中,該密閉接頭包含凸榫和凹槽介面。 另一方面’提供了形成電導通連接的方法:提供具有 φ 貫穿其中的孔的第一不導電基材,其中限定所述孔的所述 第一基材的内表面包含第一種導電材料層;提供第二不導 電基材’該基材具有從所述第二基材表面伸出的凸出# 件,其中所述部件由第二種導電材料形成或用該材料塗 覆;和將所述第二基材的凸出部件壓入所述第一基材的扎 中’使第一和/或第二導電層産生有效量的局部變形和剪 切’以在第一和第二個導電層之間形成結合與電連接。 圖式簡單說明 第1圖是具有凸榫和凹槽接頭結構設計的封接系統的 12 一個實施方案的橫截面視圖,該設計提供了通過壓力冷焊 工藝形成的密封。 7 第2圖是具有凸榫和凹槽接頭結構設計的密封系統的 另一個實施方案的橫截面視圖,該設計提供了密封❶在左 側的圖顯不了 >1制冷焊加工之前的結構,而在右側的圖顯 示了壓制冷焊加工之後形成的封接。 第3圖的掃描電子顯微照片顯示了利用第2圖所示的封 接設計和壓制冷焊工藝形成的密封的橫截面。 第4圖是具有接頭結構設計的密封系統的一個實施方 案的橫截面視圖,該設計在每個接頭結構處具有單一的冷 焊剪切層。 第5圖是具有金屬預製件的密封系統的一個實施方案 的橫截面視圖,該金屬預製件可以被壓制冷焊在接頭結構 之間。 第6圖是具有金屬預製件的密封系統的另一個實施方 案的橫截面視圖,該金屬預製件可以被壓制冷焊在接頭結 構之間。 第7圖是接頭結構底部幾何形狀的五個不同實施方案 的平面圖。 第8圖是可用於壓制冷焊形成密封的接頭結構設計的 六個不同實施方案的平面圖和橫截面視圖。 第9圖是使用第8圖所示接頭結構設計的不同組合形成 的密封系統的四個實施方案的橫戴面視圖。 第10圖是具有凸榫和凹槽接頭結構設計的密封系統的 13 一個實施方案的橫截面視圖和放大橫截面視圖。 第11圖疋具有加熱器和該加熱器上的中間層的密封系 統的一個實施方案的橫截面視圖。 第12圖是接頭結構的核心上具有微型加熱器的密封系 統的一個實施方案的橫截面視圖,該接頭結構包含基材材 料和微型加熱器上的中間層。 第13圖疋具有微型加熱器的密封系統的一個實施方案 的k截面視圖,該微型加熱器與連接表面材料直接接觸。 第14圖疋接頭結構的核心上具有微型加熱器的密封系 統的個貫施方案的橫截面視圖,該接頭結構包含基材材 料並與連接表面材料直接接觸。 第U圖是具有Nitin〇i夾具的密封系統的一個實施方案 的透視圖。 第16A-C圖疋具有釺料夾具的密封系統的一個實施方 案的橫截面視圖,顯示了組裝的步驟。 第17圖是具有冷焊失具和壓制封接材料的密封系統的 一個實施方案的橫截面視圖。 第18圖是包括存儲槽陣列的器件的—個實施方案的橫 截面視圖,湘具有凸榫和凹槽接頭設計的壓制冷焊工藝 將這些存儲槽各自獨立密封。其中限定有存儲槽的器件的 主體包括兩個基材部分,這兩個部分也顧具有凸摔和凹 槽接頭設計的壓制冷烊工藝密封在一起。 第19圖是一個器件的實施方案的透視圖,該器件包括 存儲槽㈣並且具有_壓制冷焊工藝驗單獨密封存儲 14 1322734 槽的接頭設計。 第2 0圖是具有不同聚合物接頭結構的密封系統的三個 實施方案的橫截面視圖,該接頭結構鍍有金屬連接表面。 第21圖是多存儲槽包容器件的實施方案的橫截面視 圖,顯示了通過壓制冷焊工藝對存儲槽的密封。 第22圖是封接結構的一個實施方案的橫截面視圖,該 結構使用結合的“夾層”結構來保護不受壓制結合力的中間 基材。 第23圖是零件的一個實施方案在結合之前的橫截面視 圖,該零件用於通過這裏所述的壓制冷焊形成電導通連接。 第24A-B圖是通過這裏所述的壓制冷焊製成的電子線 路連接的透視圖。第24A圖顯示了連接之前的零件,而第 24B圖顯示了連接的元件。 第25圖是零件的一個實施方案在結合之前的透視橫截 面視圖,該零件通過壓制冷焊形成電導通連接。 第26圖是通過壓制冷焊製成的電導通連接的一個實施 方案的圖。該示圖顯示了開口和凸齒之間的材料交疊。 第27A-B圖是兩個矽基材的掃描電子顯微照片 (SEM),該基材具有用於壓制冷焊的微加工封接部件。 I:實施方式3 較佳實施例之詳細說明 開發了通過壓制冷焊工藝形成密封的方法和器件。該 工藝和封接設計可有利地將器件零件可靠且有效地結合在 一起,同時保護敏感器件元件和内容物不受熱和溶劑的影 15 1322734 曰。…接工蟄包括將具有-個或多個接頭封接表面的兩 個基材壓制並冷焊在-起,該騎表面在壓财驟期間可 局部變形和剪切從而促進分子_㈣和結合。有利的是, 金屬封接表面的剪切和變形基本將表面上存在的任何金疋屬 氧化物或者錢或無機科物料,由此提供原子級潔淨 的金屬表面從而促進連接表面之_金屬金屬結合並因 此促進密雜。也就是說,冷焊産生衫污染物因而自由 結合的連接表面。在-個優選的冷焊卫藝中,超過金屬屈 服應力的壓力使連接結構和連接表面變形。該金屬變形起 到兩個㈣:在連接表面之間産生密切接觸,和移去表面 氧化物和其他污染物以便可以産生金屬·金4的結合。在通 過冷焊形成金金屬結合的實施方案巾,另外的夾具可以 是不必要的。 一方面,提供了將至少兩個基材密封在一起的方法, 該方法包括步驟:提供具有至少一個第一接頭結構的第一 基材,該第-接頭結構包含第—連接表面,該表面包含第 一種金屬;提供具有至少一個第二接頭結構的第二基材, 該第二接頭結構包含第二連接表面,該表面包含第二種金 屬;將該至少一個第一接頭結構與該至少一個第二接頭結 構壓制在一起以便使連接表面在一個或多個介面處産生有 效量的局部變形和剪切’以在連接表面的第—種金屬和第 二種金屬之間形成金屬-金屬的結合.第一種金屬和第二種 金屬可以相同或不同。它們可以是相同基礎金屬的不同合 金。如果疋相同金屬,第一種金屬和第二種金屬可以具有 16 不同的、如晶體結構,難結構等。適合的金屬 表面材料的非限定性實例包括銦、鋁、銅、鉛、鋅、鎳、 銀鈀錢、鈦、鶴、錫和它們的組合。可優選金或细。 第基材第—基材,或者它們兩者,可以由多種材料开; 成’例、喊、聚合物、金屬和它們的組合: 土材材料的非限定性實例包括石英,财酸鹽玻璃,往何 形式的紹乳化物,氮化石夕,和它們的組合。該基材和該至 5個接頭結構可以由相同材料或不同材料組成。可以通 ϋ本j域巾已知的多種卫藝在基材之巾/上駭該接頭結 冓只例L括基材的深度反應離子刻餘,鑽孔(例如鐳射), 銑磨(milling) ’微加工,MEMS工藝,或LIGA工藝。第— 接頭、。構第_接頭結構,或它們兩者,可以包含選自下 列的材料:金屬、陶究、玻璃、石夕、和它們的組合。可能 的接頭結構材料的實例包括上述的金屬表面金屬,例如銦, 鋁’金’鉻’鉑’銅’鎳’錫’它們的合金,和它們的組 以及任何形式的氧化紹,石英,炫㈣^,氧化石夕, 氮化紹’碳切’和金剛;s。該接頭結構可讀基材成一 整體或與其結合。在—個實施方”,通過將至少-個預 製結構與其基底結合形成該接頭結構。可以通過例如電鍵, 化學氣相沈積 賤射’ MEMS工藝,微加工,LIGA工藝, 或陽極結合形成這個預成形結構。可以通·如熱壓,軟 釺焊’或超聲焊接將健結_著縣材±。該接頭結構 極其連接表面可以由相同材料或不同材料組成。 在-個實施方案中,該方法進一步包括在第一基材和 17 1322734 第二基材之間提供一個或多個分離的預製件,其中將至少 一個第一接頭結構和至少一個第二接頭結構壓制在一起的 步驟進一步包括使這一個或多個預製件在與基材或連接表 面的預製件介面處變形和剪切。可以通過LIGA工藝,MEMS 工藝,濕法刻蝕,鐳射微加工,衝壓,切割,或微鑄造形 成該預製件。該預製件可以包含金屬,聚合物,或金屬鍍 覆的聚合物。 在這些方法和封接設計的優選應用中,該密封用於對 微加工的器件部件進行封接,特別是用於封接可植入式醫 療器件。在一個優選實施方案中,在器件中使用本封接方 法和接頭結構以便單獨封接包容存儲槽陣列,和/或封裝與 器件工作相關的電子元件,該存儲槽裝有存儲槽内容物, 例如用於受控釋放的藥物和/或生物感測器。 一方面,提供了包含一個或多個這些密封的器件。在 一個實施方案中,該器件包含具有多個存儲槽的第一基材 (該基材可以包含兩個或多個晶片或基材部分),每個存儲槽 包含感測器或藥物製劑,其中各存儲槽在該器件第一表面 上包含第一開口。該第一開口被存儲槽蓋封閉,該存儲槽 蓋可選擇性和主動地分裂從而控制存儲槽内容物的釋放或 暴露的時間和/或速率。在一個實施方案中,該存儲槽進一 步包括遠離第一開口的第二開口。將存儲槽内容物裝入存 儲槽之後或者其同時將這個開口密封。典型地,這個封接 包括利用這裏所述的一種或多種密封方法和接頭設計將第 一基材與第二基材結合。可選地,該器件進一步包括與第 18 ㈣制存it心閉結合的封裝結構,以便保護同驅動 子元ft裂和任何位於存儲槽的感測器相關的電 不受環境==和密封保護電子元件和存儲槽内容物 的環境,~ ^所用的術語“環境”是指該存儲槽外部 以及該。。括植人位置的生物流體和纟且織’空氣,流體, 件在貯存或在體外或體喊用_存在的顆粒。 於4〇ί㈣的術語“冷焊”是指不施加熱量,利用典型低 、的裱境條件形成的分子間結合。 用喜^裏所用的祕“密封(he〇netie sea1),,是指在11件的使 者防』間防止化學物質進人11件的—彳喊多個隔間,或 將氦止從其中流出,特別是器件存㈣。爲了這裏的目的, 的 ")透過速率小於lxl(y9atm!!:cc/sec的封接稱爲密閉 〇 裏所用的術語“包含,,和“包括”意指職、非限定性 的術語’除非明確指出反例。Ferguson et al., "Contact Adhesion of Thin Gold Film on Elastomeric Supports: Cold Welding Under Ambient Condition,, 'Science, New Series, 253 (5021): 776-78 (August 16, 1991)) The thin gold metal surface is contacted with a gold-gold bond over the flexible polymer. However, the result is that the bonding interface has unbound contaminant "islands." These islands may form a connected leak path. It is desirable to provide improved sealing. Method, which can form a seal using a series of materials at low temperatures. It is also desirable to separately seal a plurality of closely spaced storage tanks between at least two substrates in a relatively simple and cost effective manner, particularly suitable for having High-reliability A-scale production. SUMMARY OF THE INVENTION Summary of the Invention - A pressure-cooled welding method and structure for sealing at least two substrates together is provided. This method can advantageously provide a seal without sealing Heat input in the process, which may be desirable in many applications where such additional heat may damage the device, formulation or bonding zone a nearby material. ▲ In a preferred embodiment, the method includes providing a first substrate, the money material having at least one first joint structure, the joint structure comprising a first joining surface comprising the first metal; a second substrate having at least one second joint structure, the joint structure comprising a second joint 2 surface, the surface comprising a second metal; and the at least one first joint structure and at least one second The joint structure is pressed together such that the joining surface produces an effective amount of local deformation and shear at one or more interfaces to bond the metal of the first metal (four) of the joining surface to the metal. In one embodiment The method further includes aligning the at least one first joint structure over the at least one second joint structure prior to the pressing step to impart one or more of the at least one second joint structure over the at least one second joint structure An overlap of a first joint structure, wherein the one or more overlaps form one or more interfaces of the joining surface during the pressing step. In one embodiment, the one or more overlaps can displace surface contaminants and promote intimate contact between the faces of the connection table 1322734 without heat entry. In a particular embodiment, the at least A first joint structure includes at least one tongue structure and the at least one second joint structure includes at least one groove structure and presses at least one first joint structure with at least one second structure The step includes at least partially pressing the at least one tenon structure into the at least one groove structure. In one embodiment, the tenon height of the at least one tenon structure ranges from 1 micron to 100 microns and a range of tenon widths It is from 1 micron to 100 microns, and the groove depth of the at least one groove structure ranges from 1 micrometer to 100 micrometers and the groove width ranges from 1 micrometer to 100 micrometers. Various combinations of structural materials can be used. For example, the first metal, the second metal, or both, may comprise gold or platinum. In a further embodiment, the first metal, the second metal, or both, comprise a metal selected from the group consisting of gold, indium, aluminum, copper, lead, zinc, nickel, silver, palladium, cadmium, titanium , tungsten, tin and combinations thereof. The first metal and the second metal may be different metals. The first substrate, the second substrate, or both, may comprise ruthenium, glass, ceramic, polymer, metal, and combinations thereof. The first joint structure, the second joint structure, or both, may comprise materials selected from the group consisting of metals, ceramics, glass, tantalum, and combinations thereof. In one embodiment, the first linker structure, the second linker structure, or both, may comprise, alloys, gold, lanthanum, chains, copper, ruthenium, tin, alloys thereof, and combinations thereof. In one embodiment, the at least one first joint structure is formed by bonding at least one preformed structure to the first substrate. The first connection surface may be formed by, for example, an electric key process, evaporation, chemical vapor deposition process, 8 1322734 sputtering, electron beam evaporation, or a wet etching process. In one embodiment, the first joint structure and the first joining surface are metal layers that cover at least a portion of the surface of the first substrate. In one embodiment, the method can further include providing one or more preforms between the first substrate and the second substrate, wherein the at least one first joint structure and the at least one second joint structure are pressed The step of further comprising further deforming and shearing the one or more preforms at a preform interface with the substrate or joining surface. In one embodiment, the preform comprises a metal, polymer, or metal clock coated polymer. In one embodiment, the method further comprises heating the joining surface at one or more of the interfaces. The pressing step and the heating step can occur substantially simultaneously. In one embodiment, the heating of the joining surface is performed using a micro heater. In another embodiment, the sealing method further comprises applying ultrasonic energy to the joining surface at one or more interfaces. In yet another embodiment, the sealing method further comprises clamping or soft-twisting the first substrate and the second substrate together. In a preferred embodiment of the method, the bonded substrate comprises at least one cavity defined therein. In one embodiment, the at least first substrate comprises a plurality of discrete storage tanks that contain the contents of the storage tank, each storage tank being sealed from each other and sealed from the external environment. In one embodiment, the storage tank contents include a biosensor or other auxiliary device. In another embodiment, the contents of the reservoir contain a pharmaceutical formulation. In yet another embodiment, the contents of the reservoir contain a fragrance or aroma compound, a dye or other coloring agent, a sweetener, or a flavoring agent. In one embodiment, the first substrate comprises a cavity in which a third substrate is disposed prior to pressing the first and second joint structures together. The third substrate can comprise, for example, a sensor, a MEMS device, or a combination thereof. In one embodiment, the deformation step in the process is carried out under vacuum or in an inert gas atmosphere to enable reduction of oxidation of the joint structure relative to oxidation that may occur if conducted in the atmosphere. In one embodiment, a method of sealing at least two substrates together is provided, the method comprising the steps of providing a first substrate having at least one first joint structure, the first joint structure comprising a first joining surface, The surface comprises a first flexible polymer bonded to a thin metal layer; a step of providing a second substrate having at least one second joint structure, the second joint structure comprising a second joining surface comprising a metal plated a thin layer of a second flexible polymer; and pressing the at least one first joint structure with the at least one second joint structure to cause the joining surface to produce an effective amount of local deformation at one or more interfaces to A bond is formed between the first and second joining surfaces. In one embodiment, the first or second metal plating polymer, or a metal layer of both, comprises gold, platinum, or a combination thereof. In another aspect, a container member is provided, the device comprising: a first substrate having a front side and a back side, and the substrate comprising at least one first joint structure, the first joint structure comprising a surface having a first metal a joining surface; a second substrate having at least one second joint structure, the second joint structure comprising a second joining surface having a second metal surface; forming between the first 10 1322734 substrate and the second substrate And sealing the joints thereof, wherein the seal is formed by pressure-welding the first joint surface to the second joint surface at one or more interfaces; and the seal is defined within the first substrate and the second substrate At least one containment space between, so that the containment space is sealed from the external environment. In one embodiment, the at least one containment space comprises a plurality of discrete reservoirs in the at least first substrate between the front side and the back side. In various embodiments, the at least one containment space comprises a sensor, MEMS device, pharmaceutical formulation, or a combination thereof that is contained within the containment space. In a preferred embodiment, the joining surfaces are joined together by a metal-to-metal bond formed by no heat input. In one embodiment, the at least one first joint structure and the at least one second joint structure comprise tenon and groove joints. In various embodiments, the first metal, the second metal, or both metals may comprise gold, platinum, or a combination thereof, and the substrate may comprise a material selected from the group consisting of ruthenium, metals, ceramics, polymers, Glass, and combinations of materials. In one embodiment, the preform structure is deformed between the first and second joint structures. In another embodiment, the first joint structure or the second joint structure comprises a micro-heater. Alternatively, an intermediate layer can be provided adjacent the micro heater. In one embodiment, the first joint structure or the second joint structure may comprise a magnetic material capable of heating the structure by an external induction heater. The device may further comprise other securing means, for example, a clip may be used to join the substrates together, or the first substrate and the second substrate may be secured together using a dip material. In one embodiment, the first substrate further comprises discrete openings associated with at least one of the spaces of the package, and the openings are closed by a plurality of discrete barrier covers. In one embodiment, the reservoir cover includes a metal film and the device includes means for selectively splitting (=Slot cover) (e.g., control circuitry and energy source). * In the aspect, an implantable medical device is provided that can be used to control the controlled exposure or release of contents in a sealed reservoir. In one embodiment, the device comprises a first substrate; a plurality of discrete storage slots in the first substrate, the storage slot having a first opening and a second opening remote from the first opening; the interior of the storage slot a storage tank contents, wherein the storage tank contents comprise a drug or a biosensor; a plurality of discontinuous storage tank covers closing the first opening; a device for selectively splitting the storage tank; and a second substrate and sealing And a hermetic joint closing the first opening, wherein the hermetic joint is formed by pressure cooling welding. In one embodiment, the hermetic joint comprises a tenon and a groove interface. Another aspect provides a method of forming an electrical conduction connection: providing a first electrically non-conductive substrate having a hole φ therethrough, wherein an inner surface of the first substrate defining the hole comprises a first layer of electrically conductive material Providing a second non-conductive substrate' having a protruding member extending from a surface of the second substrate, wherein the member is formed of or coated with a second electrically conductive material; The projecting member of the second substrate is pressed into the tie of the first substrate to cause the first and/or second conductive layer to produce an effective amount of local deformation and shearing to conduct the first and second conductive Bonding and electrical connections are formed between the layers. BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a cross-sectional view of an embodiment of a sealing system having a tenon and groove joint design designed to provide a seal formed by a pressure cold welding process. 7 is a cross-sectional view of another embodiment of a sealing system having a tenon and groove joint structure design that provides a seal ❶ on the left side of the drawing >1 before the cold welding process, and The figure on the right shows the seal formed after the compression welding process. The scanning electron micrograph of Fig. 3 shows a cross section of the seal formed by the sealing design and the pressure cooling welding process shown in Fig. 2. Figure 4 is a cross-sectional view of one embodiment of a sealing system having a joint structure design with a single cold shear layer at each joint structure. Figure 5 is a cross-sectional view of one embodiment of a sealing system having a metal preform that can be compression welded between the joint structures. Figure 6 is a cross-sectional view of another embodiment of a sealing system having a metal preform that can be compression welded between the joint structures. Figure 7 is a plan view of five different embodiments of the bottom geometry of the joint structure. Figure 8 is a plan and cross-sectional view of six different embodiments of a joint structure design that can be used to form a seal by compression and cooling. Figure 9 is a cross-sectional view of four embodiments of a sealing system formed using different combinations of joint construction designs shown in Figure 8. Figure 10 is a cross-sectional and enlarged cross-sectional view of one embodiment of a sealing system having a tenon and groove joint design. Figure 11 is a cross-sectional view of one embodiment of a sealing system having a heater and an intermediate layer on the heater. Figure 12 is a cross-sectional view of one embodiment of a sealing system having a micro-heater on the core of the joint structure, the joint structure comprising an intermediate layer on the substrate material and the micro-heater. Figure 13 is a cross-sectional view of an embodiment of a sealing system with a microheater in direct contact with the joining surface material. Figure 14 is a cross-sectional view of a cross-sectional view of a sealing system having a micro-heater on the core of the joint structure, the joint structure comprising a substrate material and in direct contact with the joining surface material. Figure U is a perspective view of one embodiment of a sealing system with a Nitin〇i clamp. 16A-C is a cross-sectional view of one embodiment of a sealing system with a gripper showing the steps of assembly. Figure 17 is a cross-sectional view of one embodiment of a sealing system having a cold weld slip and a press seal material. Figure 18 is a cross-sectional view of one embodiment of a device including a memory cell array, with a compression and cooling process having a tenon and groove joint design that separately seals the storage cells. The body of the device in which the reservoir is defined includes two substrate portions which are also sealed together by a press-and-bake process having a convex drop and recessed joint design. Figure 19 is a perspective view of an embodiment of a device that includes a reservoir (4) and has a joint design for the 14 1322734 slot with a separate compression storage process. Figure 20 is a cross-sectional view of three embodiments of a sealing system having different polymer joint structures plated with a metal joining surface. Figure 21 is a cross-sectional view of an embodiment of a multiple storage tank container member showing the sealing of the storage tank by a pressure cooling process. Figure 22 is a cross-sectional view of one embodiment of a sealing structure that uses a bonded "sandwich" structure to protect the intermediate substrate from compression bonding. Figure 23 is a cross-sectional view of an embodiment of the part prior to joining for forming an electrical continuity connection by compression welding as described herein. Figures 24A-B are perspective views of the electronic circuit connections made by the compression-cooled welding described herein. Figure 24A shows the parts before the connection, while Figure 24B shows the connected components. Figure 25 is a perspective cross-sectional view of one embodiment of the part prior to joining, the part being electrically connected by pressure to form an electrical connection. Figure 26 is a diagram of one embodiment of an electrical continuity connection made by pressure refrigeration welding. This diagram shows the material overlap between the opening and the convex teeth. Figures 27A-B are scanning electron micrographs (SEM) of two tantalum substrates having micromachined sealing members for pressure refrigeration welding. I: Embodiment 3 Detailed Description of the Preferred Embodiment A method and a device for forming a seal by a pressure cooling welding process have been developed. This process and seal design advantageously combines device parts reliably and efficiently while protecting sensitive device components and contents from heat and solvent. The work includes: pressing and cold-welding two substrates having one or more joint sealing surfaces, which can be locally deformed and sheared during the pressing process to promote molecular _(four) and bonding . Advantageously, the shearing and deformation of the metal sealing surface will substantially be any metal ruthenium oxide or money or inorganic material present on the surface, thereby providing an atomically clean metal surface to promote the metallurgical bonding of the joining surface. And thus promotes the complexity. That is to say, cold welding produces a joint surface where the shirt contaminants are thus freely bonded. In a preferred cold welding technique, the pressure exceeding the metal yield stress deforms the joint structure and the joining surface. The metal deforms from two (four): intimate contact between the joining surfaces, and removal of surface oxides and other contaminants so that a combination of metal gold 4 can be produced. In the case of a gold metal bonded embodiment towel formed by cold welding, an additional jig may be unnecessary. In one aspect, a method of sealing at least two substrates together is provided, the method comprising the steps of: providing a first substrate having at least one first joint structure, the first joint structure comprising a first joining surface, the surface comprising a first metal; providing a second substrate having at least one second joint structure, the second joint structure comprising a second joining surface, the surface comprising a second metal; the at least one first joint structure and the at least one The second joint structure is pressed together such that the joining surface produces an effective amount of local deformation and shear at one or more interfaces to form a metal-metal bond between the first metal of the joining surface and the second metal The first metal and the second metal may be the same or different. They can be different alloys of the same base metal. If the same metal is used, the first metal and the second metal may have 16 different crystal structures, difficult structures, and the like. Non-limiting examples of suitable metal surface materials include indium, aluminum, copper, lead, zinc, nickel, silver palladium, titanium, crane, tin, and combinations thereof. Gold or fine may be preferred. The first substrate - the substrate, or both, may be formed from a variety of materials; in the 'example, shout, polymer, metal, and combinations thereof: Non-limiting examples of soil materials include quartz, acid carbonate glass, In what form is the emulsion, nitrite, and combinations thereof. The substrate and the to five joint structures may be composed of the same material or different materials. A variety of Wei art known in this j domain towel can be used in the substrate towel / on the joint knot. Only the deep reaction ions of the substrate L, the drilling (such as laser), milling (milling) 'Micromachining, MEMS process, or LIGA process. No. - Connector, . The _ joint structure, or both, may comprise a material selected from the group consisting of metal, ceramics, glass, stellite, and combinations thereof. Examples of possible joint structure materials include the above-mentioned metal surface metals such as indium, aluminum 'gold' chrome 'platinum' copper 'nickel' tin' alloys thereof, and their groups and any form of oxidized, quartz, dazzle (four) ^, oxidized stone eve, nitriding Shao 'carbon cut' and King Kong; s. The joint structure readable substrate is integrated or bonded thereto. In one embodiment, the joint structure is formed by combining at least one prefabricated structure with its substrate. This preforming can be formed by, for example, a bond, a chemical vapor deposition, a MEMS process, a micromachining, a LIGA process, or an anodic combination. Structure. It can be passed, such as hot pressing, soft boring welding or ultrasonic welding, and the joint structure can be composed of the same material or different materials. In an embodiment, the method further Included in the step of providing one or more separate preforms between the first substrate and the 17 1322734 second substrate, wherein the step of pressing the at least one first joint structure and the at least one second joint structure together further comprises: Or a plurality of preforms are deformed and sheared at the preform interface with the substrate or the joining surface. The preform can be formed by LIGA process, MEMS process, wet etching, laser micromachining, stamping, cutting, or micro-casting. The preform may comprise a metal, polymer, or metal plated polymer. In preferred applications of these methods and seal designs, The seal is used to seal the micromachined device components, particularly for sealing the implantable medical device. In a preferred embodiment, the present sealing method and joint structure are used in the device to individually encapsulate the containment storage a slot array, and/or an electronic component associated with device operation, the storage slot containing storage tank contents, such as drugs and/or biosensors for controlled release. In one aspect, one or more are provided One such sealed device. In one embodiment, the device comprises a first substrate having a plurality of storage slots (the substrate may comprise two or more wafer or substrate portions), each storage cell comprising a sensing Or a pharmaceutical preparation, wherein each storage tank includes a first opening on the first surface of the device. The first opening is closed by a storage tank cover that selectively and actively splits to control release of the contents of the storage tank Or the time and/or rate of exposure. In one embodiment, the storage tank further includes a second opening remote from the first opening. After loading the contents of the storage tank into the storage tank or The seal is simultaneously sealed. Typically, the seal includes bonding the first substrate to the second substrate using one or more sealing methods and joint designs as described herein. Optionally, the device further includes 18 (4) Storing a closed-loop package structure to protect the environment associated with the driver ft-fracture and any sensors associated with the memory tank from the environment == and sealing the contents of the electronic components and storage tanks. The term "environment" as used herein refers to the exterior of the storage tank as well as the biological fluids contained in the implanted position and the woven 'air, fluid, pieces of the particles stored or in vitro or in the body. The term “cold welding” of 4〇ί (4) refers to the intermolecular bond formed by the use of typical low and dilemma conditions without applying heat. The secret “sealing netie sea1” used in hi is used in 11 The messenger of the piece prevents the entry of chemicals into 11 pieces - screaming multiple compartments, or slamming out of it, especially the device (4). For the purposes of this, the ") transmission rate is less than lxl (y9atm!!: cc/sec is called the term "include," and "including" meaning, non-limiting terminology. Unless the counterexample is clearly stated.
一 °亥密封包含第一基材和第二基材,第一基材具有至少 ("有第一連接表面的第一接頭結構,第二基材具有至 固具有第二連接表面的第二接頭結構,通過冷焊在一 或夕甸介面處使這兩個基材結合。在優選實施方案令, 該封接是生物相容的並且適合於醫療植入物。在一個實施 方素中 藥 ,足兩個基材可選包含一個或多個存儲槽、感測器、 樂物和電子元件。該基材可以包切、朗、pyfex玻璃、 ^ 、鈦、氧化鋁、氛化矽、和其他生物相容性的陶瓷 19 和其他金屬或聚合物。在一個實施方案中,石夕基材允許使 用近紅外(NIR)至紅外(IR)光譜中的光探測器。應理解,通 過適當選擇基材材料,利用可見、紫外或其他波長的光的 光譜=法是可行的。另外,該基材可以包含具妓夠高楊 氏拉里和屈服應力的聚合物以便在冷焊過程巾産生高的剪 切。 ° 各個基材上的接頭結構(也稱爲“封接部件,,)可以包含 與基材相同或材料例如,如果在基材巾微加工出 接頭,構’該接頭便由基材材料組成。或者,該接頭結構 :U是與基材結合的預製件,該預製件由不同與基材的材 料組成,例如金屬,金屬合金或金屬的組合。在另一個實 知方案中,可以對⑽八成形的鎳接頭結構電鍍金層然後利 用軟釺焊,硬釺焊,或減結合將其結合到㈣金屬的基 材上。該LIGA結構可以由與LIGA卫藝相容的任何金屬或金 屬合金組成。在又一個實施方案中,可以利用微機電系統 (MEMS)加工由玻璃或矽形成該接頭結構預製件。 該接頭結構具有優選爲金屬的連接表面(也稱爲“剪切 層”或“結合表面,,)並可選地可以與其他連接表面結合。在下 文進-步詳述的另-個實施方案中’該連接表面可以是柔 性聚合物。使用具有適當的低塑性變形應力的金屬作爲連 接表面。本領域的技術人員可以確定適用性,例如基於具 體的接頭形狀以及形成接頭可合理施加的力的大小。另外, 優選使用不含表面氧化物或具有高的相對的氧化物相對於 母體金屬的硬度的金屬作爲連接表面。參見乃卜⑶化的 20 1322734 “Investigations on Pressure Welding” British Welding J.(1954年3月)和Mohamed等人的“Mechanism of Solid StateThe first sealing comprises a first substrate and a second substrate, the first substrate having at least (" a first joint structure having a first joining surface, the second substrate having a second solidifying surface having a second joining surface a joint structure that joins the two substrates by cold welding at one or a singular interface. In a preferred embodiment, the seal is biocompatible and suitable for medical implants. The two substrates can optionally contain one or more storage slots, sensors, music, and electronic components. The substrate can be cut, lang, pyfex glass, ^, titanium, alumina, sputum, and others. Biocompatible ceramics 19 and other metals or polymers. In one embodiment, the stone substrate allows the use of photodetectors in the near infrared (NIR) to infrared (IR) spectrum. It should be understood that by appropriate selection of bases Material, using a spectrum of visible, ultraviolet or other wavelengths of light = method is acceptable. In addition, the substrate may contain a polymer having a high enough Young's Larry and yield stress to produce a high temperature in the cold welding process. Shearing. ° Connection on each substrate The head structure (also referred to as "sealing member,") may comprise the same material as the substrate or, for example, if the joint is micromachined in the substrate towel, the joint is composed of the substrate material. Alternatively, the joint structure: U is a preform bonded to a substrate, the preform being composed of a material different from the substrate, such as a metal, a metal alloy or a combination of metals. In another embodiment, the (10) eight shaped nickel joint structure can be plated. The gold layer is then bonded to the (4) metal substrate by soft soldering, hard soldering, or subtractive bonding. The LIGA structure can be composed of any metal or metal alloy compatible with LIGA Weiyi. In yet another embodiment The joint structure preform may be formed from glass or tantalum using microelectromechanical systems (MEMS) processing. The joint structure has a metal-bonding surface (also referred to as a "shear layer" or "bonding surface,") The ground may be combined with other joining surfaces. In another embodiment detailed below, the joining surface may be a flexible polymer. A metal having a suitable low plastic deformation stress is used as the metal. Connecting surfaces. Those skilled in the art can determine suitability, for example based on the specific joint shape and the amount of force that can be reasonably applied to form the joint. Additionally, it is preferred to use no surface oxide or have a high relative oxide relative to the parent. The metal of the hardness of the metal serves as the joining surface. See 20 (2) 20 1322734 "Investigations on Pressure Welding" British Welding J. (March 1954) and Mohamed et al. "Mechanism of Solid State"
Pressure Welding”,Welding Research Supplement,第 302-310頁(1975年9月)。適宜金屬(和它們的合金)的代表性 實例包括金(Au)、銦(In)、鋁(A1)、銅(Cu)、鉛(Pb)、鋅(Zn)、 鎳(Ni)、銀(Ag)、鉑(Pt)、鈀(Pd)和鎘(Cd)。對於生物相容性 優選的連接表面金屬的代表性實例包括金和銘。Pressure Welding", Welding Research Supplement, pp. 302-310 (September 1975). Representative examples of suitable metals (and their alloys) include gold (Au), indium (In), aluminum (A1), copper ( Cu), lead (Pb), zinc (Zn), nickel (Ni), silver (Ag), platinum (Pt), palladium (Pd), and cadmium (Cd). Representative of the preferred surface metal for biocompatibility Examples of sex include Jin Heming.
第一連接表面可以或者可以不由與第二連接表面相同 的材料組成,第一連接表面將與第二連接表面形成密封。 例如,連接表面可以由相同母體金屬的異種金屬或不同合 金組成。例如,第一連接表面可以是金而第二連接表面可 以是鉑。在一個實施方案中,該連接表面由具有不同結構 形態的相同材料組成。例如,可以對第一連接表面進行退 火以便通過回復、再結晶和晶粒生長的標準退火機制減小The first attachment surface may or may not be comprised of the same material as the second attachment surface, the first attachment surface will form a seal with the second attachment surface. For example, the joining surface may be composed of a dissimilar metal of the same parent metal or a different alloy. For example, the first attachment surface can be gold and the second attachment surface can be platinum. In one embodiment, the joining surface is comprised of the same material having a different structural morphology. For example, the first joining surface can be annealed to reduce by a standard annealing mechanism for recovery, recrystallization, and grain growth.
屈服應力,同時可以沈積第二連接表面使得晶粒尺寸小, 由此提高屈服應力。 連接表面可以包含與接頭結構相同或不同的材料。這 在接頭製造方法中提供了更大的自由度,也對塑性變形的 程度和位置提供了更好的設計控制。例如,可以在矽基材 上微加工精確的接頭結構,並且可以利用確定的工 蟄步驟在這些結構上沈積接頭表面材料。然而,在氧化鋁 基材上形成精確的接頭結構經證實可能是困難的而且可能 需要另外的材料和加X方法。作爲_個實例,對於氧化= 基材,該接頭結構可以是機械性能與連接表面不同的(例如 21 1322734 更高的彈性和更高的屈服應力)沈積金屬或合金。在一個實 施方案中,該接頭結構可以是電鍍鎳,電鍍金合金,電鍍 鉻結構,或電鍍鉑結構。因此應當清楚,接頭結構可無需 進一步加工並且具有包括與接頭結構相同材料的連接表 面,或者該接頭結構可以具有沈積、電鍍、或形成在接頭 結構表面的至少一種其他材料,以便以産生包含不同於接 頭結構的材料的連接表面。該接頭結構可以由單一材料組 成或者由材料的組合組成。 製造密封的方法 通過壓制和冷焊製成該密封。在一個實施方案中,通 過如下方法將兩個基材密封在一起:提供具有至少一個第 一接頭結構的第一基材,該第一接頭結構包含金屬的第一 連接表面;提供具有至少一個第二接頭結構的第二基材, 該第二接頭結構包含金屬的第二連接表面;將至少一個第 一接頭結構和至少一個第二接頭結構壓制在一起以便使金 屬表面在一個或多個介面處發生有效量的局部變形和剪 切,以在一個或多個介面處的連接表面之間形成連續的金 屬-金屬結合。 在一些實施方案中,可以在結合工藝中向密封接頭引 入超聲能。雖然不受任何具體作用機制的限制,但是認爲 通過從連接表面上除去污染物並使表面粗糙度變形因此結 合介面處存在密切接觸而引起金屬-金屬内部擴散,該超聲 能可以促進密封。 在結合機制並非純粹冷焊的其他實施方案中,熱脈衝 22 1322734The yield stress, while depositing the second joining surface, results in a small grain size, thereby increasing the yield stress. The joining surface may comprise the same or a different material than the joint structure. This provides greater freedom in the joint manufacturing process and also provides better design control over the degree and location of plastic deformation. For example, precise joint structures can be micromachined on a tantalum substrate and joint surface materials can be deposited on these structures using defined process steps. However, the formation of precise joint structures on alumina substrates has proven to be difficult and may require additional materials and addition of X methods. As an example, for oxidation = substrate, the joint structure may be a deposited metal or alloy having mechanical properties different from the joining surface (e.g., 21 1322734 higher elasticity and higher yield stress). In one embodiment, the joint structure can be electroplated nickel, electroplated gold alloy, chrome plated structure, or plated platinum structure. It should therefore be clear that the joint structure may not require further processing and have a joining surface comprising the same material as the joint structure, or the joint structure may have at least one other material deposited, plated, or formed on the surface of the joint structure to produce a different The joining surface of the material of the joint structure. The joint structure may consist of a single material or a combination of materials. Method of making a seal The seal is made by pressing and cold welding. In one embodiment, the two substrates are sealed together by providing a first substrate having at least one first joint structure, the first joint structure comprising a first joining surface of the metal; providing at least one a second substrate of a two-joint structure, the second joint structure comprising a second joining surface of the metal; pressing the at least one first joint structure and the at least one second joint structure together such that the metal surface is at one or more interfaces An effective amount of local deformation and shear occurs to form a continuous metal-to-metal bond between the joining surfaces at one or more interfaces. In some embodiments, ultrasonic energy can be introduced into the sealing joint during the bonding process. While not being bound by any particular mechanism of action, it is believed that by removing contaminants from the joining surface and deforming the surface roughness such that there is intimate contact at the bonding interface causing metal-metal internal diffusion, the ultrasonic energy can promote sealing. In other embodiments where the bonding mechanism is not purely cold welding, the heat pulse 22 1322734
或溫度的少量提高可通過增強擴散和降低金屬的屈服應力 促進金屬結合。例如,可以使用感應加熱來局部加熱連接 表面金屬。如果器件中存在非磁性的其他金屬,可以通過 在連接表面下加入磁性材料來選擇性加熱連接金屬。磁性 材料的代表性實例包括錄、鐵、鈷、和它們的組合。或者’ 可以設計接頭結構的幾何形狀以便選擇性耦合給定頻率的 磁場。(參見Cao等人的 “Selective and localized bonding using induction heating”,Solid-State Sensor,Actuator and Microsystems Workshop,Hilton Headlsland,SC, 2002年 6 月 2-6 日)〇 通常’可以用合成氣體(forming gas)、氮、真空、或形 成密閉結合時可將氧化速率以及連接表面污染減至最小的 一些其他條件代替周圍環境。 密封器件和系統的示例眚祐古竿 設計接頭結構以便對於給定的載荷在連接表面處有效Or a small increase in temperature can promote metal bonding by enhancing diffusion and lowering the yield stress of the metal. For example, induction heating can be used to locally heat the joining surface metal. If non-magnetic other metals are present in the device, the connecting metal can be selectively heated by adding a magnetic material under the joining surface. Representative examples of magnetic materials include magnet, iron, cobalt, and combinations thereof. Alternatively, the geometry of the joint structure can be designed to selectively couple a magnetic field of a given frequency. (See Cao et al., "Selective and localized bonding using induction heating", Solid-State Sensor, Actuator and Microsystems Workshop, Hilton Headlsland, SC, June 2-6, 2002). ), nitrogen, vacuum, or some other condition that minimizes oxidation rate and joint surface contamination to minimize the surrounding environment. Example of sealing device and system 眚 竿 竿 Design joint structure to be effective at the joint surface for a given load
地産生大的局部壓力和變形。第〗_6圖解顯示了具有接頭結 構的密封线的實㈣案的㈣面視圖,職頭結構將基 底上的壓力有效轉變成連接表面上的剪切力以便將接賴 構冷焊在一起。該剪切力由接頭結構之間的過盈 (i_f⑽ce)或交疊產生,以致當將接頭結構放在一起時, 存在金屬連接表_交科分,其由㈣力^變形。兩 個交疊結構的相對f切可消除姆並使表面相互作用並处 合。在-些實施方案中’只有各個接頭結構的過盈部料 生顯者變I在其他實施方案中,由於形成接頭每一半的 23 1322734 材料和相關性質不同,形成㈣的—對接頭結構中只有一 個接頭結構顯著變形。 可以使用例如常規的MEMS工藝製造第i_6圖所示的接 頭結構,儘管減構在魏尺度上也應_㈣作用。第 1-6圖僅在每個密㈣統上顯示了—組接頭結構,但是其他 只把方案可以包含多組接頭結構。另外,以矩形橫截面表 現第1-6財的接頭結構’但是也可以使用其他橫截面例如 三角形、菱形、或半球形的接頭結構,這取決於例如幾何 限定的微加工極限。例如,可以通過不存在電鍍模的情況 下將接頭結構的材料電鍍到光刻成形限定的籽晶層上産生 半球形接頭結構。在另一個實施方案中,可以使用反應離 子刻蝕(RIE)由矩形矽結構形成倒角的(r〇unded)或圓形的 (circular)接頭結構。在又一個實施方案中,可以使光刻膠 曝光過度從而在顯影中產生底切以致形成菱形,然後使用 其作爲電鍍接頭結構的模子。可以使用多層光刻膠産生更 複雜的部件形狀。 第1圖顯示了密封系統10的一個實施方案的橫截面視 圖,5亥密封系統具有可通過冷焊封接的“凸榫和凹槽,’接頭 結構設計❶密封系統10具有第一基材12,該基材具有第一 捿頭結構16。每個第一接頭結構具有第一連接表面18 ◊第 —基材14具有包含兩個接頭結構部件2〇a和2〇b的第二接頭 結構。每個第二接頭結構20a/20b具有第二連接表面22。第 —接頭結構16産生與第二接頭結構2〇a/2〇b所産生的“凹槽,, 至少部分配合的“凸榫”。跨封接表面18相對兩側所測得的The ground produces large local pressures and deformations. The Fig. 6 shows a (four) face view of the actual (4) case of the seal line having the joint structure, and the head structure effectively converts the pressure on the base to the shear force on the joint surface to cold weld the joints together. This shearing force is generated by the interference (i_f(10)ce) or overlap between the joint structures, so that when the joint structures are put together, there is a metal joint table, which is deformed by (iv) force. The relative f-cut of the two overlapping structures eliminates the m and causes the surfaces to interact and mate. In some embodiments, 'only the interference portion of each joint structure is changed. In other embodiments, due to the different materials and related properties of each of the 23 1322734 forming the joint, the formation of the (four)-to-joint structure is only A joint structure is significantly deformed. The joint structure shown in Fig. 1-6 can be fabricated using, for example, a conventional MEMS process, although the subtractive structure should also have a _(four) effect on the Wei scale. Figures 1-6 show the joint structure only on each of the dense (four) systems, but the other schemes can include multiple sets of joint structures. In addition, the joint structure of the first to sixth dimensions is shown in a rectangular cross section. However, other cross sections such as triangular, rhombic, or hemispherical joint structures may also be used depending on, for example, geometrically defined micromachining limits. For example, a hemispherical joint structure can be produced by electroplating a material of the joint structure to a seed layer defined by photolithography without the presence of a plating mold. In another embodiment, a chamfered (circular) or circular joint structure can be formed from a rectangular tantalum structure using reactive ion etching (RIE). In yet another embodiment, the photoresist can be overexposed to create an undercut in development to form a diamond and then used as a mold for the plated joint structure. Multiple layers of photoresist can be used to create more complex part shapes. 1 shows a cross-sectional view of one embodiment of a sealing system 10 having a "bump and groove" sealable by cold welding, a joint structure design having a first substrate 12 The substrate has a first ram structure 16. Each of the first joint structures has a first joining surface 18 ◊ the first substrate 14 has a second joint structure comprising two joint structural members 2〇a and 2〇b. Each of the second joint structures 20a/20b has a second joint surface 22. The first joint structure 16 produces a "groove," which is at least partially mated with the second joint structure 2〇a/2〇b. . Measured across opposite sides of the sealing surface 18
V 24 1322734 凸榫見度大於第二接頭結構連接層22的凹槽中提供的間 隔。因此,在冷焊過程中將連接結構壓在一起時,第一接 頭、·。構連接層18和/或第一接頭結構連接表面22産生變形, 在連接表面18和22處沿每個接頭結構的頂角和側壁産生剪 切。 第一連接表面18和第二連接表面22可以由相同或不同 的材料組成。第1圖顯示了形成連接表面18和22的一層材 料’和形成各連接結構16和20a/20b的不同材料。在另一個 實施方案中,該連接表面和/或連接結構可以包括多層材料 以便對力學性能或冷焊結合性能進行細微調整。 第2圖顯示了使用冷焊形成密封之前和之後密封系統 30的另一個實施方案的橫截面視圖。密封系統3〇具有第一 基材32和第二基材34。第一基材32具有第一接頭結構4〇, 其具有金屬連接表面38a/38b。第一接頭結構4〇是在第一基 材32内形成的凹槽結構形式。第二基材从具有第二個接頭 結構36,該接頭結構包含不同於第二基材的材料。第二接 頭結構36具有金屬連接表面42a/42b,該表面包含與第二接 頭結構相同的材料。這個第二接頭結構36是凸榫結構的形 式,该凸榫結構可以部分配合進入第一接頭結構4〇的凹槽 結構。 向第一基材32施加壓縮結合力以便將兩個基材冷焊在 —起。當施加壓力時,第二接頭結構36的凸榫變形進入第 —接頭結構40的凹槽中。當施加到第一接頭結構4〇和第二 接頭結構36之間的過盈區域上的力産生的壓力超過%的屈 25 1322734 服應力時,産生變形。制盈或交疊還錢接表㈣a/m, 42a/42b會合的介面處産生剪切力。變形和剪切力的組合在 連接表面38a與42a以及連接表面38b與42b之間形成金屬-金 屬結合。因此,通過使用冷焊形成有效的密封。參見第3圖V 24 1322734 has a greater visibility than the gap provided in the recess of the second joint structure connecting layer 22. Therefore, when the joint structure is pressed together during the cold welding process, the first joint, . The connecting layer 18 and/or the first joint structure joining surface 22 are deformed to produce shear at the joining surfaces 18 and 22 along the apex and side walls of each joint structure. The first attachment surface 18 and the second attachment surface 22 may be composed of the same or different materials. Figure 1 shows a layer of material ' forming the joining surfaces 18 and 22' and different materials forming the respective connecting structures 16 and 20a/20b. In another embodiment, the joining surface and/or joining structure may comprise a plurality of layers of material to finely adjust mechanical properties or cold weld bonding properties. Figure 2 shows a cross-sectional view of another embodiment of the sealing system 30 before and after forming a seal using cold welding. The sealing system 3 has a first substrate 32 and a second substrate 34. The first substrate 32 has a first joint structure 4〇 having a metal joint surface 38a/38b. The first joint structure 4A is in the form of a groove structure formed in the first substrate 32. The second substrate has a second joint structure 36 comprising a material different from the second substrate. The second joint structure 36 has a metal attachment surface 42a/42b that contains the same material as the second joint structure. This second joint structure 36 is in the form of a tenon structure that can partially fit into the groove structure of the first joint structure 4〇. A compressive bonding force is applied to the first substrate 32 to cold weld the two substrates together. When pressure is applied, the tenon of the second joint structure 36 deforms into the groove of the first joint structure 40. When the force exerted on the interference region between the first joint structure 4〇 and the second joint structure 36 produces a pressure exceeding the % 25 1322734 service stress, deformation occurs. The profit or overlap is also shown in the table (4) a/m, 42a/42b meets the interface to produce shear force. The combination of deformation and shear forces forms a metal-metal bond between the joining surfaces 38a and 42a and the joining surfaces 38b and 42b. Therefore, an effective seal is formed by using cold welding. See Figure 3
應當明白顯示第2圖中接頭結構之間的交疊是爲了圖 解說明的目的,並可能小於或大於圖示。交疊越大,使連 接層變形從而形成密閉結合所需的壓力越大。 夕應當明白’連接表面處的局部變形是接頭結構盘 接頭表面兩相機械性㈣函數L在__個實施方案 中’包含IU體金凸榫的整個接頭結構可以在壓制下變形進 入㈣_頭結構中。在另_個實施方案中,如果凸禪接 軟構疋碎而連接表面是金,則變形局限於 的側面和角部。 千伐頌衣囟 ^ I 田 I UUsiIt should be understood that the overlap between the joint structures shown in Figure 2 is for illustrative purposes and may be smaller or larger than the illustration. The greater the overlap, the greater the pressure required to deform the joint layer to form a hermetic bond. It should be understood that the local deformation at the joint surface is the two-phase mechanical property of the joint structure disc joint surface. (IV) Function L In the __ embodiment, the entire joint structure containing the IU body gold tenon can be deformed under compression into (four) _ head In the structure. In another embodiment, if the embossing is smashed and the joining surface is gold, the deformation is limited to the sides and corners.千伐颂衣囟 ^ I Field I UUsi
R _ …明的,[她万荼的橫截面視 二’。讀系統在每個接頭結構處具有—個冷焊剪切声。 岔封系統50具有第一基材 曰 案中 2和弟-基材54。在這個實施方 頭声而 58_二接頭表㈣在—财疊。接 碩表面58與62的一側而非 晶 接 要的上# 側父豐可以減少形成密封所需 力’因爲使用較小的 =广成_需的壓 方案中,該接頭結射、在-個另外的實施 、° 0以是三角形或梯形接頭妹構;& 的形式以便進—步減 ^頭、·。料載面 設計的-個缺點是只能2㈣所需的㈣力。這個接頭 個封接周邊,然而使用對稱 26 設計(例如第2圖)則有機會産生兩個封接周邊。通常認爲這 裏所述的單一接頭結構例如凸榫和凹槽組合具有兩個周 邊。多重封接周邊可以在器件中有利地提供需要的冗餘度, 提供失效保護’’的密封,其中一個或多個但並非所有的封 接周邊可以不完備,或者可以失效,而整個封接保持密閉。 第5圖顯示了利用冷焊的密封系統7〇的另一個實施方 案。顯示了施加壓力之間的第一基材72和第二基材74。第 一基材72具有第一接頭結構76a/76b,該接頭結構具有金屬 連接表面78。使第一接頭結構76a/76b與具有金屬連接表面 82的第二接頭結構8〇a/8〇b對齊。接頭結構7如/7讣與接頭結 構8〇a/8〇b兩者形成凹槽,將金屬預製件84置入該凹槽中。 在冷焊期間將第一基材72與第二基材74壓在一起時,預製 件84相對連接表面78和82變形和剪切從而在預製件和連接 表面之間形成金屬-金屬結合。 可以使用LIGA工藝、濕法刻蝕或鐳射微加工形成預製 件84。應當清楚的是預製件料的加工依賴於該加工與預製 件=料的相谷性。還應清楚是預製件橫截面的幾何形狀可 月匕又所用力方法的限制。例如,LIGA技術不能製造第5 圖所不的1]形橫截面’但是微靖造卫藝可以製造這樣的橫 截面。 第6圖顯不了具有金屬預製件的密封系統90的另一個 實施方案㈣❹視圖’該預製件可以被冷焊在㈣接頭 結構之間。密封系統9〇具有第一基材92和第二基材94。第 -基材92具有第—接騎祕,該接頭結構包含形成於第 27 1322734 一基材内的凹槽結構。第一接頭結構96具有第一金屬連接 表面98。第二基材94具有第二接頭結構100,該接頭結構包 含形成於基材中的凹槽結構和第二金屬連接表面102。在第 一接頭結構96和第二接頭結構100之間置入金屬預製件 104。可以使用上文關於第5圖中預製件84所述的類似方法 形成預製件104。將第一基材92和第二基材94壓制在一起 時,預製件104相對連接表面98和102變形和剪切從而在預 製件和連接表面之間形成金屬-金屬結合以完成密封。 在壓制冷焊工藝中可以使用預製件,陽性部件(例如 “凸榫”或“凸齒”)和凹槽的多種組合。在一個實施方案中, 一個基材上具有凸榫接頭結構而另一個基材上具有凹槽接 頭結構,該凹槽結構的凹槽寬度大於凸榫接頭結構的寬度, 可以通過在它們之間壓制預製件將它們冷焊在一起。 該預製件橫截面的幾何形狀可以是圓形,環形,矩形 或其他適合的橫截面。 在所有上述實施方案中,希望將結合的基材之間的距 離減至最小。可以通過最小化交疊以便使變形進入基材間 的空間的金屬量減至最小,從而實現這種調整。另外,可 以在凸榫接頭結構附近形成凹槽以便在基材表面以下提供 可供變形金屬佔據的體積。或者,該凹槽結構可以具有兩 個不同寬度,較寬的開口和較窄的末端以便較窄凹槽剪切 的金屬流入開口處的較寬凹槽。 第7圖顯示了可利用冷焊形成密封的接頭結構基礎幾 何形狀的不同實施方案的頂視圖。接頭結構基礎形狀的適 28 且幾何形狀包括圓形11(),橢圓形m,與直側壁相連的半 球升y 114 ’具有®角的正方形U6,和六邊形118。接頭結構 幾何形狀的其他實施衫可以包括任何乡邊形或産生閉合 外形的任‘&路線。優賴免沿接頭結構周邊的尖銳轉角, 因爲可能難於在這_肖落形成密封。 第8圖顯不了可以利用MEMS工藝製造的接頭結構設 °十的不同貫施方案的頂視圖和橫截面視圖。這些實施方案 在母個基材上只有—個接頭結構組,但是其他實施方案可 以包括用作多重接頭結構組的週邊凸齒或凹槽的陣列。第8 圖中以矩形橫截面表現‘‘凸榫”和“凹槽”的幾何形狀,但是 也可以使用其他橫截面,例如三角形或半球形,取決於橫 戴面幾何限定的微加工極限。在其他實施方案中,該基材 可以包括藥物内容物或感測器的存儲槽陣列,其中每個存 儲槽需要與其他存儲槽以及外部環境密封。 可以分別利用一步或兩步深度反應離子刻蝕(DRIE), 隨後是金屬連接表面的沈積步驟,可以分別在矽基材122和 130中加工出接頭結構設計120和128的接頭結構124a/l 24b 和132。接頭結構132和i24a/124b分別是凸榫和凹槽接頭的 MEMS等同物。在將基材122冷焊至基材130的過程中,接 頭結構部件124a和124b之間的凹槽拐角在接頭結構〗32(凸 齒)邊緣和凹槽部件124a和124b的拐角處産生高的局部應 力。高應力在金屬介面處産生塑性變形和剪切,在連接表 面126和134之間形成密切接觸和結合。 可以通過利用銑磨和切入(plunge)電子放電加工(EDM) 29 1322734 步驟的組合形成該接頭結構,而且如果需要可利用電鑛步 驟對該接頭結構進行金屬鍍覆’來産生接頭結構設計的其 他實施方案。 接頭結構設計136包含凸榫接頭結構140,該接頭結構 由低塑性變形應力金屬製成,例如銦、鋁、金或銅。接頭 結構設計136具有透明基材138。Pyrex或類似的透明基材如 藍寶石,其他玻璃成分允許對密封器件的内容物進行光學 探測而且在冷焊加工中提供改進的對準工藝。由不同於基 材138的材料形成接頭結構140避免了在基材自身中形成部 件的需要。另外,通過使用具有低塑性變形應力的金屬, 接頭結構設計136産生比接頭結構設計128更可變形的接頭 結構140。因此,具有更大變形能力的接頭結構14〇可以改 善冷焊所形成的密封。 接頭結構设si" 142顯示了可以分別冷焊到類似於接頭 結構設計128,136,148和156的接頭結構132,140,152, 和160a/160b的接頭結構上的軟的可變形金屬連接表面146。 接頭結構設計142允許來自從基材突出的接頭結構上的高 局部應力在冷焊壓制期間在金屬鍍覆連接表面146中産生 凹槽。適合用作連接表面146的金屬的一個非限定實例是 金。接頭結構設計142的優點是極大減少了對準的問題。然 而,接頭結構設計142可能相當較難冷焊,因爲平坦的連接 表面146不能將壓力有效轉變成剪剪切形。 接頭結構設計148具有接頭結構152,該接頭結構是由 一種以上材料組成的混和接頭結構,這些材料都不是基材 30 150材料。由於接頭結構152不是由基材15〇材料形成,因此 可以在無需對基材150進行微加工的情況下實現對接頭結 構152變形特性的調整。另外,接頭結構152可以包括鎳其 合金’或其他高楊氏模量和屈服應力的材料以便提高接頭 結構的剛度。隨後對接頭結構丨5 2濺射塗覆籽晶層以便鍍覆 連接表面154,該連接表面可以是例如銦或金。 或者’接頭結構152可以包括連接表面154材料的不同 合金。在一個實施方案中,通過在電鍍過程中改變電鍍液 的組成’也可以使用向基材150上沈積接頭結構152的電鑛 沈積工藝來沈積不同於連接表面154的合金。例如,可以在 開始時電鍍硬質金合金作爲接頭結構152,隨後電鍍較軟的 純金作爲連接表面154。 在基材158中微加工凹陷部件不方便的情況下,接頭結 構設計156允許産生凹槽接頭結構。用兩個同心的凸出的接 頭結構部件160a/160b限定凹槽,並且可以利用與上述關於 接頭結構設計148和接頭結構152類似的工藝製造該凹槽。 第9圖顯示了密封系統的不同實施方案的橫截面視圖, 該密封系統包含第8圖中所示的接頭結構設計的多種組合。 密封系統17 0包含與接頭結構設計丨2 8结合的接頭結構設計 120。密封系統Π2包含與接頭結構設計136結合的接頭結構 設計120。密封系統174包含與接頭結構設計128結合的接頭 結構設計142。密封系統176包含與接頭結構設計136結合的 接頭結構設計142。 1322734R _ ... clearly, [she has a cross-section of two.] The read system has a cold weld shear at each joint structure. The tamping system 50 has a first substrate 2 2 and a mate-substrate 54. In this implementation, the head of the 58_two joint table (four) is in the stack. The upper side of the surface 58 and 62 and the amorphous upper side of the upper side can reduce the force required to form a seal 'because of the smaller = wide into the required pressure scheme, the joint is ejected, in- Another implementation, ° 0 is a triangle or trapezoidal joint structure; & form in order to further reduce the head, ·. The disadvantage of the design of the material surface is that it can only be 2 (four) required (four) force. This joint seals the perimeter, but the use of a symmetrical 26 design (such as Figure 2) gives the opportunity to create two sealed perimeters. A single joint structure such as the tenon and groove combination described herein is generally considered to have two perimeters. Multiple sealing perimeters can advantageously provide the required redundancy in the device, providing a fail-safe seal, wherein one or more but not all of the sealing perimeters may be incomplete or may fail, while the entire seal remains Closed. Figure 5 shows another embodiment of a sealed system using cold welding. The first substrate 72 and the second substrate 74 between the applied pressures are shown. The first substrate 72 has a first joint structure 76a/76b having a metal attachment surface 78. The first joint structure 76a/76b is aligned with the second joint structure 8〇a/8〇b having the metal joint surface 82. The joint structure 7 such as /7讣 and the joint structure 8〇a/8〇b form a groove into which the metal preform 84 is placed. When the first substrate 72 and the second substrate 74 are pressed together during cold welding, the preform 84 is deformed and sheared relative to the joining surfaces 78 and 82 to form a metal-to-metal bond between the preform and the joining surface. The preform 84 can be formed using a LIGA process, wet etching, or laser micromachining. It should be clear that the processing of the preform material depends on the phase of the processing with the preform = material. It should also be clear that the geometry of the cross-section of the preform can be limited by the method used by the new moon. For example, LIGA technology cannot produce a 1] cross-section that is not shown in Figure 5, but Wei Jingwei can make such a cross section. Figure 6 shows another embodiment of a sealing system 90 having a metal preform. (IV) ❹ View 'The preform can be cold welded between the (4) joint structures. The sealing system 9 has a first substrate 92 and a second substrate 94. The first substrate 92 has a first pick-up structure comprising a groove structure formed in a substrate of the 271222734. The first joint structure 96 has a first metal joint surface 98. The second substrate 94 has a second joint structure 100 comprising a groove structure formed in the substrate and a second metal joining surface 102. A metal preform 104 is placed between the first joint structure 96 and the second joint structure 100. The preform 104 can be formed using a similar method as described above with respect to the preform 84 in FIG. When the first substrate 92 and the second substrate 94 are pressed together, the preform 104 is deformed and sheared relative to the joining surfaces 98 and 102 to form a metal-to-metal bond between the preform and the joining surface to complete the sealing. Prefabricated parts, various combinations of male components (such as "claw" or "girdle") and grooves can be used in the pressure-cooled welding process. In one embodiment, one substrate has a tenon joint structure and the other substrate has a groove joint structure, the groove structure having a groove width greater than the width of the tenon joint structure, which can be pressed between them The preforms are cold welded together. The cross-section geometry of the preform may be circular, circular, rectangular or other suitable cross-section. In all of the above embodiments, it is desirable to minimize the distance between the bonded substrates. This adjustment can be achieved by minimizing the overlap to minimize the amount of metal that deforms into the space between the substrates. Alternatively, a recess can be formed adjacent the tenon joint structure to provide a volume that can be occupied by the deformed metal below the surface of the substrate. Alternatively, the groove structure can have two different widths, a wider opening and a narrower end such that the metal cut by the narrower groove flows into the wider groove at the opening. Figure 7 shows a top view of a different embodiment of the geometry of the joint structure that can be formed by cold welding to form a seal. The base structure of the joint structure is 28 and the geometry comprises a circle 11 (), an elliptical shape m, a hemispherical rise y 114 ' with a straight side wall, a square U6 with a ® angle, and a hexagon 118. Other implementations of the joint structure geometry may include any ridge shape or any ‘& route that produces a closed profile. It is advantageous to avoid sharp corners around the joint structure, as it may be difficult to form a seal at this angle. Figure 8 shows a top view and a cross-sectional view of different configurations of a joint structure that can be fabricated using a MEMS process. These embodiments have only one set of joint structures on the parent substrate, but other embodiments may include an array of peripheral teeth or grooves that serve as a set of multiple joint structures. Figure 8 shows the geometry of ''bumps' and 'grooves' in a rectangular cross section, but other cross sections, such as triangles or hemispheres, may also be used, depending on the micromachining limits defined by the geometry of the transverse wear. In other embodiments, the substrate may comprise a reservoir array of drug contents or sensors, wherein each reservoir needs to be sealed from other reservoirs and the external environment. One or two steps of deep reactive ion etching may be utilized, respectively ( DRIE), followed by a deposition step of the metal joining surface, joint structures 124a/l 24b and 132 of joint structure designs 120 and 128 can be machined in the tantalum substrates 122 and 130, respectively. The joint structures 132 and i24a/124b are convex, respectively. The MEMS equivalent of the 榫 and groove joints. During the cold welding of the substrate 122 to the substrate 130, the groove corners between the joint structural members 124a and 124b are at the edge of the joint structure 〖32 (girdle) and the groove High local stresses are created at the corners of the members 124a and 124b. High stresses cause plastic deformation and shear at the metal interface, forming intimate contact and bonding between the joining surfaces 126 and 134. The joint structure is formed by a combination of milling and plunge electrical discharge machining (EDM) 29 1322734 steps, and if desired, metallization of the joint structure can be performed using an electric ore step to create other implementations of the joint structure design. The joint structure design 136 includes a tenon joint structure 140 made of a low plastic deformation stress metal such as indium, aluminum, gold or copper. The joint structure design 136 has a transparent substrate 138. Pyrex or similar transparent base. Materials such as sapphire, other glass components allow for optical detection of the contents of the sealing device and provide an improved alignment process in cold welding. The formation of the joint structure 140 from a material other than the substrate 138 avoids formation in the substrate itself. In addition, by using a metal having a low plastic deformation stress, the joint structure design 136 produces a joint structure 140 that is more deformable than the joint structure design 128. Therefore, the joint structure 14 having a greater deformability can improve cold welding. The resulting seal. The joint structure is set si" 142 shows that it can be cold welded to the class separately A soft deformable metal attachment surface 146 on the joint structure of joint structures 132, 136, 148 and 156 of joint structures 128, 140, 152, and 156. Joint structure design 142 allows for joints protruding from the substrate The high local stress on the structure creates a groove in the metal plated joint surface 146 during cold weld pressing. One non-limiting example of a metal suitable for use as the joint surface 146 is gold. The advantage of the joint structure design 142 is that it greatly reduces the A problem with the standard. However, the joint design 142 may be quite difficult to cold weld because the flat joint surface 146 does not effectively convert the pressure into a shear-shear shape. The joint structure design 148 has a joint structure 152 which is a hybrid joint structure composed of more than one material, none of which are substrates 30 150 material. Since the joint structure 152 is not formed of the base material 15 material, the adjustment of the deformation characteristics of the joint structure 152 can be achieved without micromachining the base material 150. Additionally, the joint structure 152 may comprise nickel alloys or other high Young's modulus and yield stress materials to increase the stiffness of the joint structure. The seed layer is then sputter coated onto the joint structure 丨52 to plate the joint surface 154, which may be, for example, indium or gold. Alternatively, the joint structure 152 can comprise a different alloy of the material of the joining surface 154. In one embodiment, the alloy different from the joining surface 154 can also be deposited using an electrodeposition process that deposits the joint structure 152 onto the substrate 150 by changing the composition of the plating bath during the plating process. For example, a hard gold alloy can be initially plated as the joint structure 152, followed by electroplating the softer pure gold as the joint surface 154. In the case where it is inconvenient to micromachine the recessed features in the substrate 158, the joint design 156 allows for the creation of a grooved joint structure. The recess is defined by two concentric raised joint structural members 160a/160b, and the recess can be fabricated using a process similar to that described above with respect to joint design 148 and joint structure 152. Figure 9 shows a cross-sectional view of various embodiments of a sealing system comprising various combinations of joint structure designs shown in Figure 8. Sealing system 17 0 includes a joint structure design 120 that is coupled to joint design 丨28. The sealing system Π 2 includes a joint structure design 120 that is combined with the joint structure design 136. Sealing system 174 includes a joint structure design 142 that is combined with joint structure design 128. Sealing system 176 includes a joint structure design 142 that is combined with joint structure design 136. 1322734
第10圖顯示了密封系統180的一個實施方案的橫截面 視圖和放大橫截面視圖,該密封系統18 0具有凸榫和凹槽接 頭結構設計。通過深度反應離子刻蝕(DRIE)在矽基材中形 成接頭結構182a/182b和184。接頭結構182aA82b,184的幾 何尺寸包括凹槽深度186,凹槽寬度187,凸榫寬度188,和 凸榫高度190。優選地,這些幾何尺寸優選在約1微米至約 100微米的範圍内。對凸榫接頭結構和凹槽接頭結構184和 182a/182b分別進行加工以便産生超過接頭結構製造公差和 裝配設備精度公差的交疊(也稱爲“過盈”),以確保接頭表面 在所有沿密封周邊的點上交疊。在優選實施方案中,該交 疊的範圍是與約1微米至約20微米並且小於凸榫寬度188的 四分之一° 在連接表面包含不同於接頭結構材料的材料並且使用 金屬鍍覆産生該連接表面的實施方案中,鍍金屬連接表面 的厚度是約Ο.ΐμϊη至約50μηι。可以通過例如氣相沈積産生Figure 10 shows a cross-sectional view and an enlarged cross-sectional view of one embodiment of a sealing system 180 having a tenon and grooved joint design. Joint structures 182a/182b and 184 are formed in the tantalum substrate by deep reactive ion etching (DRIE). The geometric dimensions of the joint structures 182aA82b, 184 include groove depth 186, groove width 187, tenon width 188, and tenon height 190. Preferably, these geometries are preferably in the range of from about 1 micron to about 100 microns. The male and female joint structures 184 and 182a/182b are separately machined to produce an overlap (also referred to as "interference") that exceeds the joint manufacturing tolerances and assembly equipment tolerances to ensure that the joint surface is at all edges. The points around the seal overlap. In a preferred embodiment, the overlap is in the range of from about 1 micron to about 20 microns and less than a quarter of the width 188 of the tenon. The material comprising the material different from the joint structure at the joining surface and produced using metal plating In an embodiment of the joining surface, the thickness of the metallized joining surface is from about ΐ.ΐμϊη to about 50μηι. Can be produced by, for example, vapor deposition
約Ιμηι的金屬厚度。可以通過例如電鍍工藝產生更大的金 屬厚度。 加執的埶懕钴公 在本發明的-些實施方案中,可以在熱壓結合中使用 選擇性脈衝加熱來職㈣。該響性脈衝加熱可以由微 電阻加熱器提供。Lin等人的美國專利Nq 6436相中描述 了微電阻加熱器的實例。可以將加熱器加人這裏所述密封 系統的任何實施方案巾。適合的加熱^以分爲兩組具 有中間層的加熱器和沒有中間層的加熱器。 \ 32 1322734 由於下列三個原因的任意組合,加熱器可能需要在兮 加熱器與另外的表面之間存在中間層:⑴輯所_自 電阻率和需要的加熱量,加熱器材料可能需要與連接表面 和/或基材電絕緣。⑵在加熱器與相鄰材料之_熱膨服係 數(CTE)差異足夠大㈣可能在㈣巾“無法接受的應 力的情況下,在這樣的實施方案中可能需要中間層。在加 熱過程中’如果該應力超過加熱器與相鄰材料的結合強度 或者如果該應力超過㈣處任何材料的極限拉伸強度,= 些應力可能通過在多個介面處引起分層、破裂、或=裂而 顯現。⑶可能需要中間層作爲擴散阻擋層防止加熱器的電 特性隨反複的加熱迴圈而發生改變,或者減緩附著層的擴 散。因此,爲了電絕緣,CTE不匹配,擴散阻擋層,或取 決於具體使用材料的三個原因的任何組合,可能需要使用 中間層。 爲簡便起見,第11-14圖中未顯示出加熱器與基材之間 的中間層或材料介面處的任何附著層。只顯示出加熱器與 連接表面之間的中間層。 第11圖顯示了具有加熱器218的密封系統2_ 一個實 施方案的橫截面視圖。加熱器218位於第二基材212上。中 間層220位於加熱器218之上。從中間層220的下方通過加熱 器218加熱連接表面材料222。當第一基材21〇與第二基材 212連接在一起並且材料在加熱器218的脈衝加熱下變形, 在連接表面216與連接表面材料222之間形成金屬金屬結 合,這時形成密封。 33 1322734 第12圖顯示了具有加熱器234的密封系統230的另一個 實施方案。第12圖中,第二基材232材料是接頭結構的結構 核心233 ’ §玄接頭結構包含結構核心233,加熱器234,中間 層236,和連接表面材料238。相比之下,第I〗圖說明了其 中加熱器218與中間層220形成接頭結構核心的實施方案。 因此第12圖中第二基材232上的接頭結構的剛性可能大於 第11圖中第二基材212上的接頭結構。因此,在熱壓結合過 程中搶封系統230申的連接表面上可能産生更大的局部變 形。應當清楚的是,接頭結構的剛度的提高同樣取決於所 選具體材料。 第13圖顯示了密封系統24〇的一個實施方案,該密封系 統具有與連接表面材料246接觸的加熱器244。糾圖顯示 了密封系統250的另—個實施方案,該密封系統具有與連接 表面材料256接觸的加熱器254。在第14圖中,第二基材252 接頭構核〜包含基材材料*且該接頭結構的剛性可 以大於第13圖中第二基材242上的不包含基材材料的接頭 結構。可以主要從下部的加熱器244和254加熱連接表面材 料246和256。在另外的實施方案中,可以在連接表面通過 電流騎接表面材料進行直接加熱。 〜田/月邊的疋’第1M4圖中所示的實施方案可以具有 包含不同材料的第—基材和第二基材。另外,第一基材的 接頭’。構可以包含與第一基材的連接表面和第二基材的連 接表面相同或不同的材料。此外,第一基材上的連接表面 和第-基材上的連接表面可以包含相同材料或不同材料。 34About 金属μηι metal thickness. A larger metal thickness can be produced by, for example, an electroplating process. Addition of Samarium Cobalt In some embodiments of the invention, selective pulse heating can be used in thermocompression bonding (4). The loud pulse heating can be provided by a micro resistance heater. An example of a micro-resistance heater is described in U.S. Patent No. 6,436, to Lin et al. The heater can be added to any of the embodiments of the sealing system described herein. Suitable heating is divided into two groups of heaters with an intermediate layer and heaters without an intermediate layer. \ 32 1322734 For any combination of the following three reasons, the heater may need to have an intermediate layer between the crucible heater and the other surface: (1) the self-resistivity and the amount of heating required, the heater material may need to be connected The surface and/or substrate are electrically insulated. (2) The difference in the coefficient of thermal expansion (CTE) between the heater and the adjacent material is sufficiently large (4) that in the case of (four) towel "unacceptable stress, an intermediate layer may be required in such an embodiment. During heating" If the stress exceeds the bond strength of the heater to the adjacent material or if the stress exceeds the ultimate tensile strength of any material at (4), these stresses may be manifested by causing delamination, cracking, or = cracking at the plurality of interfaces. (3) The intermediate layer may be required as a diffusion barrier to prevent the electrical characteristics of the heater from changing with repeated heating loops, or to slow the diffusion of the adhesion layer. Therefore, for electrical insulation, CTE mismatch, diffusion barrier, or depending on the specific Any combination of the three reasons for using the material may require the use of an intermediate layer. For the sake of simplicity, any adhesion layer at the intermediate layer or material interface between the heater and the substrate is not shown in Figures 11-14. An intermediate layer between the heater and the joining surface is shown. Figure 11 shows a cross-sectional view of an embodiment of a sealing system 2 with a heater 218. 218 is located on the second substrate 212. The intermediate layer 220 is located above the heater 218. The connection surface material 222 is heated from below the intermediate layer 220 by the heater 218. When the first substrate 21 is connected to the second substrate 212 Together and the material is deformed by the pulsed heating of the heater 218, a metallic metal bond is formed between the joining surface 216 and the joining surface material 222, at which point a seal is formed. 33 1322734 Figure 12 shows another seal system 230 with heater 234 In one embodiment, in Fig. 12, the second substrate 232 material is the structural core of the joint structure 233'. The sinuous joint structure comprises a structural core 233, a heater 234, an intermediate layer 236, and a joining surface material 238. The Fig. 1 illustrates an embodiment in which the heater 218 and the intermediate layer 220 form a core of the joint structure. Therefore, the joint structure on the second substrate 232 in Fig. 12 may be more rigid than the second substrate 212 in Fig. 11. The joint structure on the top. Therefore, during the thermocompression bonding process, a larger local deformation may occur on the joint surface of the seal system 230. It should be clear that the joint structure is rigid. The height also depends on the particular material selected. Figure 13 shows an embodiment of a sealing system 24A having a heater 244 in contact with the joining surface material 246. The illustration shows another implementation of the sealing system 250. The sealing system has a heater 254 in contact with the joining surface material 256. In Fig. 14, the second substrate 252 joint nucleation ~ comprises a substrate material * and the joint structure may have a greater rigidity than the first drawing A joint structure on the second substrate 242 that does not comprise a substrate material. The surface materials 246 and 256 can be heated primarily from the lower heaters 244 and 254. In other embodiments, the surface material can be drawn by current at the joint surface. Direct heating is performed. The embodiment shown in Figure 1M4 of the field/moon side may have a first substrate and a second substrate comprising different materials. In addition, the joint ' of the first substrate'. The structure may comprise a material that is the same or different from the joining surface of the first substrate and the joining surface of the second substrate. Further, the joining surface on the first substrate and the joining surface on the first substrate may comprise the same material or different materials. 34
V 1322734 第二基材的連接表面和加熱器可以包含相同材料或不同材 料。另外,脈衝加熱期間結合表面可以熔化,正如釺焊加 工中的情形。 最小化冷焊所需的機械力 最小化結合基材所需的機械力可以減小損壞基材或基 材塗層的危險。可以通過多種方法實現所需的機械力的最 小化。這些方法包括多種接頭結構設計,連接表面材料選 擇,連接表面材料處理工藝,和冷焊加工參數。 例如,封接部件之間的過盈或交疊的總量由接頭結構 設計決定。較大的配合接頭結構之間的交疊或過疊需要較 大的力來進行冷焊,因爲在冷焊加工過程中變形金屬的體 積更大。因此爲了最小化所需的力,應將變形金屬的總量 減至最小。這可以通過最小化連接表面的剪切層或介面並 同時最小化接頭結構之間的過盈量來實現。該交疊優選僅 略大於接頭結構的公差,表面粗糙度,和裝配設備的精度 公差《另外,通過只形成一個剪切層(如第2圖所示),可以 顯著減小所需的力。 另外,使用接頭結構橫截面幾何形狀的不同組合可以 優化特定應用的密封。例如,與梯形凹槽接頭結構連接在 一起的矩形凸榫接頭結構的組合可減少連接表面的接觸面 積。在這個實施方案中,僅有矩形接頭結構的角初始發生 剪切。該局部剪切的初始面積遠小於具有矩形凸榫接頭結 構和矩形凹槽接頭結構的實施方案中的情形。由此,減小 了冷焊所需的力。 35 1322734 在另-個實施方案中,如果矩形凸禪接頭結構只有— 個角與傾斜矩形凹槽接頭結構引起剪切力則可谁一 、浥一步減小 所需的力。在矩形凸榫一個角上引發塑性變形所需的力g 在矩形凸榫兩個角上産生相同壓力所需力的—半。 疋V 1322734 The joining surface of the second substrate and the heater may comprise the same material or different materials. In addition, the bonding surface can be melted during pulse heating, as is the case in butadiene welding. Minimizing the mechanical force required for cold welding Minimizing the mechanical forces required to bond the substrate reduces the risk of damage to the substrate or substrate coating. The required mechanical force can be minimized in a number of ways. These methods include a variety of joint structure designs, joint surface material selection, joint surface material processing, and cold weld processing parameters. For example, the total amount of interference or overlap between the seal components is determined by the joint design. Overlap or overlap between the larger mating joint structures requires a relatively large force for cold welding because the volume of deformed metal is greater during the cold welding process. Therefore, in order to minimize the required force, the total amount of deformed metal should be minimized. This can be achieved by minimizing the shear layer or interface of the joint surface while minimizing the amount of interference between the joint structures. The overlap is preferably only slightly greater than the tolerance of the joint structure, the surface roughness, and the tolerance of the assembly equipment. Additionally, by forming only one shear layer (as shown in Figure 2), the required force can be significantly reduced. In addition, different combinations of cross-sectional geometries of the joint structure can be used to optimize the seal for a particular application. For example, a combination of rectangular tenon joint structures joined to a trapezoidal groove joint structure can reduce the contact area of the joint surface. In this embodiment, only the corners of the rectangular joint structure are initially sheared. The initial area of the partial shear is much smaller than in the embodiment with a rectangular tenon joint structure and a rectangular groove joint structure. Thereby, the force required for cold welding is reduced. 35 1322734 In another embodiment, if the rectangular embossed joint structure has only a corner and a slanted rectangular groove joint structure causing shear forces, the force required can be further reduced. The force g required to induce plastic deformation at one corner of the rectangular tenon produces a half of the force required for the same pressure at both corners of the rectangular tenon.疋
除接頭設計之外,連接表面材料的組成和相關的 性質可能影響形成密封所需的力。例如,連接結構材料^ 具有低的屈服應力,這因此使得該材料更容易變形並且° 其更容易露出潔淨的可結合表面。具有低屈服應力的適宜 連接表面材料包括但不限於銦、鋁、金和錫。相反地^且 質將通過增加晶體結構的應變能或影響位錯的移動性,= 到提高基礎金_服應力的作用。因此,提高材料的純^ 可以降低屈服應力。可能存在的例外是,當第二種材料= 加入可以降娜點時’由於魏溫度與雜更爲接近從而 可降低總的屈服應力。In addition to the joint design, the composition of the joining surface material and associated properties may affect the force required to form the seal. For example, the joining structure material ^ has a low yield stress, which thus makes the material more susceptible to deformation and which more easily exposes a clean bondable surface. Suitable joining surface materials with low yield stress include, but are not limited to, indium, aluminum, gold, and tin. Conversely, the quality will increase the strain energy of the crystal structure or affect the mobility of the dislocations, and the effect of increasing the base gold stress. Therefore, increasing the purity of the material can reduce the yield stress. The possible exception is that when the second material = join can drop the point, the total yield stress can be reduced because the Wei temperature is closer to the impurity.
衫s冷知所需力的另-個物理性質是連接表面金屬的 氧化物的硬度。氧化物硬度與母體金屬硬度之比較高的金 屬其冷焊需要的_較小H軟的金屬氧化物隨母體 金屬發生變形而不會輕易斷裂,從而保持爲氧化物阻礙冷 焊結合。具有高的氧化物相對母體金屬硬度比的金屬包括 4不限於銦和㉝。Φ於金和麵在環境條件下沒有氧化物, 氧化物硬度與母體金屬硬度之比不會顯著影響冷焊這些金 屬所而力的大小。然而,金和鈕確實具有吸收有機污染物 的層’該層會起到阻礙冷焊結合的作用。 、接表面金屬的晶粒結構和内在應變會影響屈 36 1322734 服強度。在多晶金屬中,通常用屈服應力用Hall-Petch關係 描述,其中屈服應力與晶粒尺寸的平方根成比例。該關係 的存在是因爲相鄰晶粒中的晶體學滑移面通常不排成線 (line up),因此需要額外的應力來啟動相鄰晶粒中的新滑移 面。因此,通過降低晶粒的數目(即增大晶粒尺寸)可以降低 屈服應力。對金屬進行退火可以通過增加晶粒尺寸和降低 金屬中的内在應變從而降低屈服應力。退火還可能具有其 他有益影響例如使夾帶的氫從電鍍層上解吸附。 最後,結合工藝可能影響形成密封所需的力。另外, 最小化變形的總量將減少連接表面材料産生的應變硬化的 量。例如,由於總的變形量減小’較短的接頭結構可以産 生較小的應變硬化。另外,冷焊加工的時間或應變速率可 能影響應變硬化。結合時間還可以影響金屬相互擴散的量。 參見 Takahashi& Matsusaka,“Adhesional bonding of fine gold wires to metal substrates,55 J. Adhesion Sci. Technol., 17(3):435-51(2003). 在使用壓力的封接中,可能需要將支撐力與壓力對準, 以避免作用在基材之一上的懸臂型力,這可能導致一些基 材材料的破裂。在一個實施方案中,這可以通過將有待保 護不受壓力的第一基材插入到至少兩個其他基材結構之 間,然後通過例如上述的冷焊將其封接在一起來實現。在 一個優選實施方案中,兩個其他基材至少結構其t之一包 括適於放置或谷納第一基材的空腔或凹陷。這至少兩個其 他的基材結構具有接頭結構,該接頭結構可以被壓在一起 37 將第一基材容納在至少兩個其他基材結構之間限定的空腔 内。第22圖顯示了這種封接方法的—個實施方案。封接器 件500包括其上製造有生物感測器5〇8的感測器基材鄕。該 感測器基材位於下基材5〇2中的空腔5〇5内。包括存儲槽蓋/ 開口 512的上基材504通過壓力冷焊工藝與下基材5〇2在接 頭結構510處結合。在另—個實施方案中,該第三或“感測 裔基材其上具有不同的輔助器件而非感測器。例如,第三 基材可以包括MEMS器件,例如陀螺儀,諧振器等。可以 在真空下封接該器件。 壓制襯熱方法 另方面,在不存在金屬-金屬結合的情況下形成壓力 封接。在這種情形中,該零件可能需要永久的連接力以便 保持密閉。可以通過多種炎緊機構施加該連接力。在一個 只施方案中,可以利用Nitin〇1或其他形狀記憶合金的夾具 以便提供在基材周圍提供松配合直到將它們對準,隨後可 以加熱Nitinol超過其相轉變點使其將基材夾緊,如第15圖 所示。可以控制這個相轉變溫度(通過改變形狀記憶合金的 組成)。因此’可以在相轉變溫度以下形成器件元件,然後 將該元件加溫到相轉變溫度從而引髮夹緊機制。 在另一個實施方案中,金屬或塑膠的夾具可以發生彈 性變形從而允許將密封系統的基材裝載,其中夾具的零應 力構造顯著小於連接基材。一旦將連接基材在夾具之間對 準’可以卸去夹具上的所有力允許其壓緊連接基材。可以 利用其他緊固件來夾緊基材,包括螺絲釘,鉚釘,釺料, 38 1322734 熱收縮聚合物’對置磁體等等。該夹具應能夠永久地施加 力同時將連接對的額外尺寸減至最小。 第16A-C圖中顯# 了具有釺才枝具的密封系統27〇的— 個實施方案。第16A圖中,密封系統27〇包含第二基材274 上的附著、電鍍或微加工的柱276。在柱276之上形成釺料 278。將第二基材上的第二接頭結構28〇對準以與第—基材 272上的凹槽接頭結構282交疊。在第一基材272之上沈積包 含金屬的墊284。將包含加熱器288的加熱器板286與桎276 之上的釺料278對準,並與第一基材272上的金屬墊284交 疊。 如第16B圖所示,加熱器板286將第一基材272與第二基 材274壓在一起,在第一接頭結構28〇與交疊凹槽接頭結構 282之間形成封接。當加熱器板286壓下時,對加熱器2別施 以脈衝使釺料278回流,以致釺料回流到第一基材272上的 金屬墊上。一旦釺料278凝固,便然後可以將加熱器板286 移去。第16C圖顯示了除去加熱器板286之後以及形成釺料 夾緊和密封之後的密封系統270。 在另一個實施方案(未示出)中,根據所用的釺料,可以 使用能夠耐受所用加熱器溫度並作爲釺料278的不良表面 材料鍍覆加熱器板286。在這個實施方案中,一旦釺料278 凝固便可移去加熱器板286 ’而!f料不會與加熱器288結合。 另外,可以根據釺料夾具的需要強度調整回流到金屬墊片 284上的釺料278的厚度。 還可以使用本發明的冷焊封接部件來形成壓力密封的 39 1322734 夹具。第17圖顯示了密封系統290的一個實施方案,該密封 系統中使用&榫和凹槽接頭結構設計將壓制封接材料3〇6 夾在兩個基材292與294之間並形成壓制密封。第一接頭結 構296a/296b包含接頭結構設計的凹槽部分。該接頭結構設 計的凸榫部分包含第二基材294上的加熱器3〇〇,加熱器上 的中間層302,和中間層上的連接表面材料3〇4。壓制封接Another physical property of the shirt to cool the required force is the hardness of the oxide connecting the surface metal. A metal with a high oxide hardness and a hardness of the parent metal is required for cold soldering. The smaller H soft metal oxide deforms with the parent metal and does not easily break, thereby remaining as an oxide hindering the cold bond. Metals having a high oxide to parent metal hardness ratio include 4 and are not limited to indium and 33. Φ in gold and no surface under the environmental conditions, there is no oxide, the ratio of oxide hardness to maternal metal hardness does not significantly affect the size of the force of cold welding these metals. However, the gold and button do have a layer that absorbs organic contaminants. This layer acts to hinder the cold welding bond. The grain structure and internal strain of the surface metal will affect the strength of the bend 36 1322734. In polycrystalline metals, the yield stress is usually described by the Hall-Petch relationship, where the yield stress is proportional to the square root of the grain size. This relationship exists because the crystallographic slip planes in adjacent grains are typically not line up, thus requiring additional stress to initiate new slip planes in adjacent grains. Therefore, the yield stress can be lowered by reducing the number of crystal grains (i.e., increasing the grain size). Annealing the metal reduces the yield stress by increasing the grain size and reducing the intrinsic strain in the metal. Annealing may also have other beneficial effects such as desorbing entrained hydrogen from the plating layer. Finally, the bonding process can affect the force required to form the seal. In addition, minimizing the total amount of deformation will reduce the amount of strain hardening produced by the joining surface material. For example, a smaller joint structure can result in less strain hardening due to a reduced total amount of deformation. In addition, the time or strain rate of cold welding may affect strain hardening. The bonding time can also affect the amount of metal interdiffusion. See Takahashi & Matsusaka, "Adhesional bonding of fine gold wires to metal substrates, 55 J. Adhesion Sci. Technol., 17(3): 435-51 (2003). In the use of pressure sealing, support forces may be required Align with the pressure to avoid cantilever-type forces acting on one of the substrates, which may result in cracking of some of the substrate material. In one embodiment, this can be achieved by inserting the first substrate to be protected from pressure. Between at least two other substrate structures, which are then sealed together by cold welding, such as described above. In a preferred embodiment, at least one of the two other substrates has a structure t suitable for placement or a cavity or depression of the first substrate of the valley. The at least two other substrate structures have a joint structure that can be pressed together 37 to accommodate the first substrate between at least two other substrate structures Within a defined cavity, an embodiment of such a sealing method is shown in Figure 22. The sealing device 500 includes a sensor substrate 鄕 on which a biosensor 5〇8 is fabricated. The substrate is under The cavity 5〇5 in the material 5〇2. The upper substrate 504 including the storage tank cover/opening 512 is joined to the lower substrate 5〇2 at the joint structure 510 by a pressure cold welding process. In another embodiment The third or "sensing substrate" has different auxiliary devices thereon instead of sensors. For example, the third substrate can include MEMS devices such as gyroscopes, resonators, and the like. The device can be sealed under vacuum. Pressing the heat lining method On the other hand, a pressure seal is formed in the absence of metal-metal bonding. In this case, the part may require a permanent connection force to maintain a tight seal. This connection force can be applied by a variety of inflammatory mechanisms. In a single solution, Nitin〇1 or other shape memory alloy fixtures can be utilized to provide a loose fit around the substrate until they are aligned, which can then be heated by Nitinol beyond its phase transition point to clamp the substrate. As shown in Figure 15. This phase transition temperature can be controlled (by changing the composition of the shape memory alloy). Thus, the device component can be formed below the phase transition temperature and then warmed to the phase transition temperature to initiate the clamping mechanism. In another embodiment, the metal or plastic clamp can be elastically deformed to allow loading of the substrate of the sealing system, wherein the zero stress configuration of the clamp is significantly less than the joining substrate. Once the connecting substrate is aligned between the clamps, all of the force on the clamp can be removed to allow it to be pressed into the substrate. Other fasteners can be used to clamp the substrate, including screws, rivets, dip, 38 1322734 heat shrinkable polymer 'opposite magnets, and so on. The clamp should be able to apply force permanently while minimizing the extra size of the pair. In Figures 16A-C, there is shown an embodiment of a sealing system 27A having a branch. In Fig. 16A, the sealing system 27A includes a post 276 attached, plated or micromachined on the second substrate 274. A dip 278 is formed over the column 276. The second joint structure 28'' on the second substrate is aligned to overlap the groove joint structure 282 on the first substrate 272. A metal-containing pad 284 is deposited over the first substrate 272. The heater plate 286 containing the heater 288 is aligned with the material 278 above the crucible 276 and overlaps the metal pad 284 on the first substrate 272. As shown in Fig. 16B, the heater plate 286 presses the first substrate 272 and the second substrate 274 together to form a seal between the first joint structure 28'' and the overlapping groove joint structure 282. When the heater plate 286 is depressed, the heater 2 is pulsed to cause the dip 278 to reflow so that the dip is returned to the metal pad on the first substrate 272. Once the dip 278 solidifies, the heater plate 286 can then be removed. Figure 16C shows the sealing system 270 after removal of the heater plate 286 and after the formation of the material clamping and sealing. In another embodiment (not shown), the heater plate 286 can be plated using a poor surface material that is resistant to the heater temperature used and used as the dip 278, depending on the dip used. In this embodiment, the heater plate 286' can be removed once the dip 278 solidifies! The material f does not combine with the heater 288. Alternatively, the thickness of the dip 278 that is reflowed onto the metal shim 284 can be adjusted according to the required strength of the dip clamp. It is also possible to use the cold welded sealing component of the present invention to form a pressure sealed 39 1322734 clamp. Figure 17 shows an embodiment of a sealing system 290 in which a press seal material 3〇6 is sandwiched between two substrates 292 and 294 using a & . The first joint structure 296a/296b includes a groove portion of the joint structure design. The tab portion of the joint structure design includes a heater 3 on the second substrate 294, an intermediate layer 302 on the heater, and a joint surface material 3〇4 on the intermediate layer. Press seal
材料306具有圓形的橫截面並且位於第二基材294上、凸榫 和凹槽夾具之間,基材的邊緣。然後利用熱壓結合將第— 基材292的凹槽接頭結構與第二基材294的凸榫接頭結構連 接’炎f基材之間的壓制封接才才料從而形成密封。應當清 楚的是可以使_述的任何冷料縣形成冷焊夹具而無 需加熱。冷焊夾具無需具有封閉的幾何形狀的要求,因爲、 它的主要作肢將兩個基材夾在_起,而只形成封接: 在另-個貝施方案中(未顯示),可以將壓力封接材料置 於第二基材上,第二基材的邊緣處,凸榫和凹Material 306 has a circular cross section and is located on the second substrate 294, between the tenon and the groove clamp, at the edge of the substrate. The crimp joint between the groove joint structure of the first substrate 292 and the tenon joint structure of the second substrate 294 is then joined by thermocompression bonding to form a seal. It should be clear that any cold material county can be formed into a cold welding fixture without heating. The cold welding fixture does not need to have a closed geometry because its main limbs sandwich the two substrates and only form a seal: in another Besch scheme (not shown), The pressure sealing material is placed on the second substrate, at the edge of the second substrate, the crown and the concave
側。然而應當清楚較,基材材料上的應力將根據壓力封 接材料的放置而不同。 根據應用,可以用錄聚合物代替上述實施方案中的 任何金屬接頭結構和連接表面。儘管封接柔性聚合物 接機制不定義爲冷焊’但是利用封接隔離存储槽或介腔盜 相鄰空腔或外部污染的作用是相同。相比冷烤加工中產I 塑性變形所需的壓力’柔絲合物可能需要顯著更小^ 力來産生封接。傳統上講’柔性聚合物在透水性苛刻^ 用中是較差的封接選擇H聚合物化學中的 : 40 1322734 過添加金屬,或陶瓷顆粒已生産出經改性可顯著降低透水 性的聚合物。例如,通過添加碳納米顆粒改性的環氧樹脂, 其報道的透水率比常規環氧樹脂低一個數量級。柔性聚合 物封接要求選擇低楊氏模量的聚合物和最小化表面接觸面 積以便使用低的壓力提供封接。另外,增加週邊接頭結構 的數目可以産生顯著減緩水透過該封接的穴(p〇cket)。side. However, it should be clear that the stress on the substrate material will vary depending on the placement of the pressure seal material. Depending on the application, any of the metal joint structures and joining surfaces of the above embodiments may be replaced with recorded polymers. Although the sealing flexible polymer bonding mechanism is not defined as cold welding, the effect of using a sealed isolation storage tank or a dielectric cavity to steal adjacent cavities or external contamination is the same. The pressure of the soft-spinning required for plastic deformation in the cold-baked processing may require significantly less force to create the seal. Traditionally, 'flexible polymers are poorly sealed in H polymer chemistry in water permeable harshness: 40 1322734 Over-added metals, or ceramic particles have produced polymers that have been modified to significantly reduce water permeability. . For example, by adding carbon nanoparticle-modified epoxy resins, the reported water permeability is an order of magnitude lower than conventional epoxy resins. Flexible polymer sealing requires the selection of a low Young's modulus polymer and minimizing the surface contact area to provide a seal using low pressure. In addition, increasing the number of perimeter joint structures can result in a significant reduction in the passage of water through the seal.
可以使用單-接頭結構設計或多重冗餘接頭結構來實 施上述的實施方案和實施例,該多重冗餘接頭結構可減少 引起冗餘接頭結構中的—個或多個發生$漏的潛在製造缺 陷。另外’多重連接表面會起到增加封接職長度的作用 從而提高了形朗接所需的力。冗餘接頭結構的數目需要 與基材材料的強度,對它們進行冷焊所需的力,以及冷焊 加工後基材巾存在的任何殘餘應力,包括通過任何甜夹部 件所施加的應力相平衡。 益封器件和方法的廄The above-described embodiments and embodiments may be implemented using a single-joint structural design or a multiple redundant joint structure that reduces potential manufacturing defects that cause one or more of the redundant joint structures to have a $ leak . In addition, the 'multiple attachment surface' serves to increase the length of the seal to increase the force required for the shape. The number of redundant joint structures requires strength with the substrate material, the force required to cold weld them, and any residual stresses present in the substrate towel after cold welding, including the stress balance applied by any of the sweet clip components. .封 器件 器件 器件 器件 器件
料焊技術在加工和可製造性方面具有許多優點。首 X '于接。p件適於標準MEMs工藝處理並且可以整體的Weld technology has many advantages in terms of processing and manufacturability. The first X' is connected. p piece is suitable for standard MEMs process and can be integrated
引入到MEMS器件中。甘A τ τ °其次,可以同時封接緊密間隔的存 儲槽陣列》實際上, d。 可以在晶片-晶片結合工藝中同時封接 $ Hi可以將多個晶片—個在另—個上依次或同 __ X便在内部晶片的各個表面上形成冷焊。另外, 可以通過在封接部 ^ °干下穿過連線(feedthrough)將有源器件 ,、…、源器件聯結起來 3. 技π ώ 水。最後,由於該工藝不涉及熱,可以 將溫度敏感材料封梦 存儲槽體積内。溫度敏感材料可以 41 包括揮發性液體’有機化學物質’藥物,爆炸性氣體,化 +感測器,和敏感電子元件。 第18圖顯示了冷焊在一起形成密封器件陣列⑽的有 源和無源晶片的實施方案。密封器件陣列31〇代表—個晶片 ㈣’該晶片是同-晶片上同時冷焊的晶片陣列的一部分。 第-有源層312包含感測器32〇,金電子迹線層322,介電層 318 ’和凸榫接頭結構324。爲簡便起見忽略有源層基材與 任何電子迹線層之間的電介質。這些凸榫接頭結構324包含 金並且冷焊至具有凹槽接頭結構的無源層叫上,該凹槽接 頭結構中壓入第一凸榫接頭結構。無源層314包含具有第二 凸榫接頭結構326的金屬鍍覆層和與第一有源層312上的感 測320對準的開口。將第二凸榫接頭結構326冷焊到第二 有源層316中的凹槽接頭結構上n源層包含與第一有 源層上的感測器320對準的開口。另外,第二有源層包含具 有存儲槽蓋328的金屬鍍層。因此第18圖中所示密封器件 310的陣列個密封將感測器細相互關並與環境隔開。 」而’存儲槽蓋328可能在以後被打開以便使感測器32〇暴 路於%境。根據基材材料和加工限制,使用導通實現與有 源元件320的電連接。 第19圖顯不了多存儲槽藥物遞送晶片的一個實施方案 的透視圖’該晶片具有第-有源層332,無源層334,和第 —個有源層336 °顯示爲隔開的層幻2和334用來說明層332 上的接頭結構’這兩個層(將)通過壓力冷焊結合。(層334 和336無需通過任何特殊技術結合) 42 1322734 在植入醫療感測器應用中,可以在各個基材上形成柔 性聚合物。可以使用常規的MEMS技術對該聚合物進行成 形’例如模制(如PDMS軟光刻),光刻(如可光成形的(聚)矽 氧烷)’立體光刻’選擇性鐳射燒結,喷墨印刷,沈積和回 流,或刻蝕(例如〇2等離子刻蝕)。或者,可以將聚合物置於 相對基材之間以前對其進行成形並鍍覆金屬。Introduced into MEMS devices. Gan A τ τ ° Secondly, it is possible to simultaneously seal closely spaced storage tank arrays. Actually, d. At the same time, the chip can be sealed in the wafer-wafer bonding process. The plurality of wafers can be cold-welded on each surface of the internal wafer in sequence or in the same manner. In addition, the active device, ..., source device can be connected by a feedthrough under the sealing portion. Finally, because the process does not involve heat, temperature sensitive materials can be sealed within the storage tank volume. Temperature sensitive materials can include volatile liquids 'organic chemicals' drugs, explosive gases, chemical sensors, and sensitive electronic components. Figure 18 shows an embodiment of the active and passive wafers cold welded together to form an array of sealed devices (10). The array of sealed devices 31 represents a wafer (four)' which is part of a wafer array that is simultaneously cold soldered on the same wafer. The first active layer 312 includes a sensor 32A, a gold electronic trace layer 322, a dielectric layer 318', and a tenon joint structure 324. The dielectric between the active layer substrate and any of the electronic trace layers is ignored for simplicity. These tenon joint structures 324 contain gold and are cold welded to a passive layer having a grooved joint structure into which the first tenon joint structure is pressed. Passive layer 314 includes a metallization layer having a second tenon joint structure 326 and an opening aligned with sense 320 on first active layer 312. The second tenon joint structure 326 is cold welded to the recessed joint structure in the second active layer 316. The n source layer includes an opening that is aligned with the sensor 320 on the first active layer. Additionally, the second active layer includes a metal plating layer having a memory tank cover 328. Thus, the array of seals of the sealing device 310 shown in Fig. 18 separates the sensors from each other and from the environment. And the 'storage cover 328 may be opened later to cause the sensor 32 to smash the road. Electrical connection to active component 320 is achieved using conduction in accordance with substrate material and processing constraints. Figure 19 shows a perspective view of one embodiment of a multi-storage drug delivery wafer having a first active layer 332, a passive layer 334, and a first active layer 336° shown as separated layers. 2 and 334 are used to illustrate the joint structure on layer 332 'the two layers (will be joined by pressure cold welding). (Layeres 334 and 336 do not need to be combined by any special technique) 42 1322734 In implanted medical sensor applications, a flexible polymer can be formed on each substrate. The polymer can be shaped using conventional MEMS techniques such as molding (such as PDMS soft lithography), lithography (such as photoformable (poly) decane) 'stereolithography' selective laser sintering, spraying Ink printing, deposition and reflow, or etching (eg 〇2 plasma etching). Alternatively, the polymer can be shaped and plated with metal prior to being placed between the opposing substrates.
第20圖顯示了具有不同聚合物接頭結構346、35〇、366、 370、382的禮封系統的不同實施方案,這些接頭結構具有 368、372、383、388、392。 沈積金屬連接表面348、352、 在該情形巾’金屬金屬結合並非通過剪切變形形成,而是 通過等人所詳述的機制形成。密封系統340使接觸 面積和料路I長度最大。輯系統綱使接觸面積最小以 二冷焊期間移去表面污染物時提高局部應力。密封系統 m非在基树上加工出的聚合物預製件如。該預製 件包括金屬鍍覆的表面^ 83。密封系統380可以描述爲鍍金Figure 20 shows different embodiments of a ritual system having different polymer joint structures 346, 35, 366, 370, 382 having 368, 372, 383, 388, 392. The metal joining surfaces 348, 352 are deposited, in which case the metallurgical bond is not formed by shear deformation, but is formed by a mechanism as detailed by the person. Sealing system 340 maximizes the contact area and length of the material path I. The system outline minimizes the contact area and increases the local stress when removing surface contaminants during the second cold welding. The sealing system m is not a polymer preform that is machined on the base tree. The preform includes a metal plated surface ^83. Sealing system 380 can be described as gold plated
屬襯塾封接系統。 ^乂在加工中使用聲能(如超聲) 或鈿射能來結合金屬盥臂 合金屬層/覆層或者向金;可以在向聚合物基材上結 法中應用聲能或録射能才上結合聚合物覆層/層的方 容 廷些實施方案中的聚合物材料的 戶、例包括含氟聚合物如路 ml—發讀乙稀(ePTFE),或者液晶 @只施方案令,將液晶聚合物基材(如某些密 旨)與另i液晶聚合物基㈣合,或者對1進錄 屬鍍覆然後將鍍覆金屬 ,、丁金 ,表面與另一個液晶聚合物基材結 43 1322734 合或與另一鐘覆金屬的表面結合。 在又一個或另外的實施方案中,Cohn的美國專利申請 公開No.2002/0179921 A1中所描述的封接概念能夠適用於 本文和專利No.5,797,898,Νο·6,527,762,Νο·6,491,666,和 No.6,551,838 ’ 和美國專利申請公開Ν〇.2004/0121486 A1, 2004/0127942 A1,和2004/0106953 A1中所述的可植入式藥 物遞送或分析物傳感應用中的密封。 這裏所述的器件可以與多種器件一起使用或者引入到 其中,這些器件包括可植入式醫療器件和其他器件。實例 包括藥物遞送器件’診斷和感測器件,美國專利 Νο.5,797,898 ’ Νο·6,551’838 ’ Νο·6,527,762 ’ 以及美國專利 申請公開 No.2002/0099359 ,No.2003/0010808 , Ν〇·2004/0121486公開了 一些這種器件,這裏通過引用引入 這些專利。 第21圖顯示了利用冷焊封接敞口存儲槽之前和之後的 微ββ片器件的一個貫知•方案的橫截面視圖。器件基材402具 有存儲槽404,該存儲槽裝有存儲槽内容物4〇6。存儲槽4〇4 通過存儲槽蓋408在基材402的正面401上關閉。基材4〇2的 背面表面在各個存儲槽4〇4的每一侧上具有一個凸榫接頭 結構414。將封接基材410置於器件基材4〇2的背面4〇3上方, 敞口存儲槽404之上。封接基材41〇具有與凸榫接頭結構414 對準的凹槽接頭結構412a/412b。通過選擇合適的材料,該 封接基材可以對可見至紅外波長的光透明。以這種方式可 以對存儲槽内容物進行光學探測。然後將兩個基材連接在 44 1322734 一起並在凸榫和凹槽接頭結構414/412a和412b處冷焊産生 密封’將各個存儲槽4〇4與另外的存儲槽並與環境隔開。 在一些實施方案中,這裏所述的密封器件是另外的器 件的子元件。例如,它可以是可植入藥物遞送器件的一部 刀 Λ 00件還包含指不病人生理狀癌的感測器,向病人身 體提供電刺激的電極,泵,導管’或它們的組合。美國專 利申請公開Νο.2004/0127942 和No. 2004/0106953 Α1,和美 國專利No. 6,491,666描述了若干這些元件的實例,這裏通 過引用引入這些專利。 通遒壓制冷焊製造雷導通和引線遠接 另一方面’這裏所述的壓制冷焊技術適用於形成高度 可靠’低電阻的電連接而無需加熱。在一個實施方案中, 由壓制冷焊形成的該結合結構可同時提供機械固定裝置和 連續的導電路徑。 第23圖中顯示了電導通連接600的一個實施方案。第一 基材618的第一表面604上的第一金屬層602將與第二基材 609表面608上的第二金屬層606電連接。沈積在第一基材上 的封接部件610内側的金屬在第一金屬層602與第一連接表 面612之間産生電接觸。可以通過在第二金屬層606上電鍍 凸齒605形成第二連接表面614。凸齒的寬度比鍍金屬孔的 寬度大1-50μπι。穿過基材604的封接結構610的橫截面顯示 爲矩形,但是它可以是能夠利用微加工或MEMS工藝製成 的任何形狀,以便最大程度地提高沈積材料的覆蓋和減小 接頭中的殘餘應力。當連接表面612與614對準並將基材618 45 1322734 與609壓财—起時’連接介面上的料使兩個連接表面上 的潔淨金屬暴露,產生冷焊結合。所得結合在第—金屬層 602與第二金屬層6〇6之間産生低電阻的電連接。 曰 應當理解的是,這種技術不限於特定金屬或合金或妒 狀的電鍍凸脊(ridge)。電鍍方向的凸脊撗截面可以是矩升^ (如圖所示),半球形,三角形,梯形—任何適合於産=這^It is a lining sealing system. ^乂In the processing, the use of acoustic energy (such as ultrasound) or 钿 能 energy can be combined with the metal 盥 arm metal layer / coating or gold; can apply acoustic energy or recording energy in the method of bonding to the polymer substrate The combination of the polymer material in the embodiments of the polymer coating/layer comprising the polymer coating/layer includes a fluoropolymer such as a road ML-e-e-e (ePTFE), or a liquid crystal. The substrate (such as some secrets) is combined with the other liquid crystal polymer base (4), or the plating is applied to the substrate, and then the plated metal, butyl gold, and the surface of the other liquid crystal polymer substrate are combined with 43 1322734. Or combined with another metal-coated surface. In yet another or additional embodiment, the sealing concept described in U.S. Patent Application Publication No. 2002/0179921 A1 to Cohn, which is incorporated herein by reference. The seals in implantable drug delivery or analyte sensing applications described in U.S. Patent Application Publication Nos. 2004/0121486 A1, 2004/0127942 A1, and 2004/0106953 A1. The devices described herein can be used with or incorporated into a variety of devices, including implantable medical devices and other devices. Examples include drug delivery devices 'diagnostic and sensing devices, U.S. Patent No. 5,797,898 ' Νο. 6, 551 '838 ' Ν ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο Some such devices are disclosed in U.S. Pat. Figure 21 shows a cross-sectional view of a known embodiment of a micro beta beta device before and after sealing the open storage slot with cold soldering. The device substrate 402 has a reservoir 404 that houses the contents of the reservoir 4〇6. The storage tank 4〇4 is closed on the front side 401 of the substrate 402 by the storage tank cover 408. The back surface of the substrate 4〇2 has a tenon joint structure 414 on each side of each of the storage grooves 4〇4. The sealing substrate 410 is placed over the back surface 4〇3 of the device substrate 4〇2 over the open storage tank 404. The sealing substrate 41A has a groove joint structure 412a/412b that is aligned with the tenon joint structure 414. The sealing substrate can be transparent to light visible to the infrared wavelength by selecting a suitable material. In this way, the contents of the storage tank can be optically detected. The two substrates are then joined together at 44 1322734 and cold welded at the tenon and groove joint structures 414/412a and 412b to create a seal' separate the respective storage slots 4〇4 from the additional storage slots and from the environment. In some embodiments, the sealing device described herein is a sub-element of an additional device. For example, it can be a knife of an implantable drug delivery device. The device also includes a sensor that refers to a patient's physiological cancer, an electrode that provides electrical stimulation to the patient's body, a pump, a catheter, or a combination thereof. Examples of several of these elements are described in U.S. Patent Application Publication No. 2004/0127942 and No. 2004/0106953, the disclosure of which is incorporated herein by reference. Manufacture of Thunder Conductors and Leads Through Welded Cooling Welding On the other hand, the compression and cooling technology described here is suitable for forming highly reliable 'low resistance electrical connections without heating. In one embodiment, the bonded structure formed by compression welding can provide both mechanical fixtures and continuous conductive paths. One embodiment of an electrical continuity connection 600 is shown in FIG. The first metal layer 602 on the first surface 604 of the first substrate 618 will be electrically coupled to the second metal layer 606 on the surface 608 of the second substrate 609. The metal inside the sealing member 610 deposited on the first substrate makes electrical contact between the first metal layer 602 and the first connection surface 612. The second attachment surface 614 can be formed by plating a raised tooth 605 on the second metal layer 606. The width of the convex teeth is 1-50 μm larger than the width of the metal plated holes. The cross-section of the sealing structure 610 through the substrate 604 is shown as a rectangle, but it can be any shape that can be fabricated using micromachining or MEMS processes to maximize coverage of the deposited material and reduce residue in the joint. stress. When the joining surfaces 612 and 614 are aligned and the substrates 618 45 1322734 and 609 are pressed together, the material on the joining interface exposes the clean metal on the two joining surfaces, creating a cold weld bond. The resulting bond produces a low resistance electrical connection between the first metal layer 602 and the second metal layer 6A6.曰 It should be understood that this technique is not limited to a particular metal or alloy or braided plated ridge. The ridge section of the plating direction can be a moment rise ^ (as shown), hemispherical, triangular, trapezoidal - any suitable for production = this ^
所述的冷焊接頭的形狀。可財慮使用這裏所述的任何導 電材料作爲連接材料’包括金屬或具有適#機械性質和電 學性質的導電聚合物,以便通過彈性壓制而非冷焊形成電 連接。第二連接結構的核心可以不同於連接表面材料或者 與其相同。這裏所述的用於形成冷焊接頭的所有封接部件 也可以用於形成電連接。 利用常規的MEMS工藝和/或微加工來沈積金屬和圖案 化金屬和産生穿過基材的導通可以在微小區域内形成多重 電連接。這裏所述的電連接部件可以包含在具有封接部件The shape of the cold welded joint. Any of the electrically conductive materials described herein can be used as a joining material 'including metal or a conductive polymer having suitable mechanical and electrical properties to form an electrical connection by elastic pressing rather than cold welding. The core of the second connecting structure may be different from or identical to the joining surface material. All of the sealing members described herein for forming the cold welded joint can also be used to form electrical connections. The deposition of metal and patterned metal and the creation of conduction through the substrate using conventional MEMS processes and/or micromachining can create multiple electrical connections in a small area. The electrical connection component described herein may be included in a sealing component
基材上’因此當將兩個相對基材壓在一起時可以同密封一 起産生電連接。 在另一個實施方案中,第一連接表面612上具有傾斜侧 壁較爲有利以便更容易容納第一接頭表面612的沈積。此 外,材料沈積可能發生在第一基材604的兩個側面616和618 上。這是一種可確保導通孔607遍佈合適材料沈積的方法。 第25和26圖進一步說明了通過壓制冷焊製造電導通的 可能實施方案。 第24A-B圖中顯示了電線連接700的一個實施方案。導 46 1322734 電引線702a、702b將分別與基材706上的迹線(trace)7〇4a、 704b電連接。每個導電引線7〇2a、7〇2b的直徑大於連接表 面的寬度708a、708b並且與封接部件71〇a、71〇b對準並壓 入其中。可以通過在基材706中刻蝕溝槽並然後在其中沈積 金屬層704a、704b形成封接部件71〇a、71〇b。該溝槽在— 端較寬,這可以提供空間以利用環氧樹脂、(聚)矽氧烷、釺 料,或其他聚合物材料適當緩和導電引線7〇2a、7〇沘中的 應變。該空間還允許引線與基材观的上表面平行地設置, 儘管使隸小面積的溝槽來纽與導電引線的冷焊。 710a、710b的封接結構71〇a、 710b的橫戴面顯示爲矩形,The substrate can thus be electrically connected to the seal when the two opposing substrates are pressed together. In another embodiment, having a sloped side wall on the first attachment surface 612 is advantageous to more easily accommodate deposition of the first joint surface 612. In addition, material deposition may occur on both sides 616 and 618 of the first substrate 604. This is a method of ensuring that vias 607 are deposited throughout a suitable material. Figures 25 and 26 further illustrate possible embodiments for making electrical conduction by pressure refrigeration welding. One embodiment of a wire connection 700 is shown in Figures 24A-B. Conductor 46 1322734 Electrical leads 702a, 702b will be electrically coupled to traces 7A, 4a, 704b on substrate 706, respectively. Each of the conductive leads 7?2a, 7?2b has a diameter larger than the width 708a, 708b of the connection surface and is aligned with and pressed into the sealing members 71?a, 71?b. The sealing members 71a, 71b can be formed by etching the grooves in the substrate 706 and then depositing the metal layers 704a, 704b therein. The trench is wider at the end, which provides space to moderate strain in the conductive leads 7?2a, 7? using epoxy, (poly) alkane, tantalum, or other polymeric materials. This space also allows the leads to be placed in parallel with the upper surface of the substrate, although the trenches of the small area are cold welded to the conductive leads. The transverse surfaces of the sealing structures 71〇a, 710b of 710a, 710b are shown as rectangles.
該引線顯示具有圓形的橫戴面;然而,可以使用適於 形成這裏所述的冷焊或壓制封接的任何_面。穿過基材The lead shows a cross-face with a round shape; however, any surface suitable for forming the cold or press seal described herein can be used. Through the substrate
47 定的。 基材和存儲槽_ 在個貫知方案中,該包容器件包含 該基材包含一個戈多伽 P 邛刀即基材, 閉的方式包封^ 健槽用於容納以不透流體的或密 $ 子儲槽内容物。這裏所用的術語“密閉” β 才日隔離乱氣、水蒸氣和其他氣體的封接/包容效果二疋 用的術S吾“不透流體的,,β 冱裏所 相中的溶解物質(如葡::非氣體密閉但是可有效隔離液 =形成存簡料構与(如时的― ^ 刻钱、加工、或模制的存儲槽。 匕包含 在優選貫知方案中,該存儲槽是不連續、 並以陣列位於器件主7 夂t的, 個表面(或其區域}。料 確數量_壯_== 含㈣放/暴露精 件,或子元件二Γ:、空腔或孔"’或輔助器 — 材枓的互連孔洞不是存儲槽。在一個 只知方案中’心件包含位於該主體部分至少—個表面上 的不連續位置的多個存㈣。在另—個實施方案中,每個 存儲槽基材部分具有—個存㈣;可選的在_個器㈣可 以—起使用兩個或多個這些部分。 可以利用本邊域中已知的任何適宜加工技術在結構主 刀中加工存儲槽。代表性的加卫技術包括mems製造 工蟄’微製造工# ’或其他微加卫卫藝,各種鑽孔技術(例 如録射,機械,和超聲鑽孔),和堆疊(build up)或疊層技術, 48 ★ LTCC(低/皿共㈣D。可選對該存儲槽的表面進行處理 或包後以便改交該表面的—種或多種性質。這些性質的實 例包括親水性m潤祕(表面能,制㈣,表面 粗縫度,電荷’釋放特性料。可以使用本領域中已知的 MEMS方法,微;^制,微加工和微製造技術由多種材料製 造該基材/存儲槽。本領域中許多其他已知方法也可以用於 形成存儲槽。參見例如美國專利N。· 6,123,861和美國專利 Ν〇·6’808,522。也可以使用本領域中已知的許多聚合物成形 技術,例如注模成形,熱壓成形,擠出等等。 在多個實施方案中,該包容器件的主體部分包含矽、 金屬、陶瓷、聚合物,或它們的組合。適合的基材材料的 實例包括金屬(例如鈦,不銹鋼),陶瓷(例如氧化鋁,氮化 矽)’半導體(例如矽),玻璃(例如pyrexTM,BpSG),和可降 解及不可降解的聚合物。只要求不透流體時,該基材可以 由聚合物材料形成而非氣體密閉性典型所要求的金屬或陶 瓷。 在一個實施方案中,各個存儲槽由密閉材料(例如金 屬,矽,玻璃’陶瓷)形成(即限定於其中)並且用存儲槽蓋 密封。理想地,該基材材料生物相容並且適於長期植入病 人體内。在一個優選實施方案中,該基材由一種或多種密 閉材料形成。在使用之前該基材或其部分可以被包覆、封 裝,或包含在密閉生物相容材料内(例如惰性陶瓷,鈦等)。 町以用密閉材料層完全包覆非密閉材料《例如,聚合物基 材可以具有薄的金屬覆層。如果基材材料不是生物相容性 49 以在使用之前_相容性材料 封裝或者包含在生物相容性材料内,·t _進订包覆、 四氟乙烯材料,類金剛石碳,碳化矽 乙:醇’類聚 鈦等等。在一個實施方案中,該基 瓷,氧化鋁, 遞送的分子和周賊體或流體(例如水1=的’即對於待 他溶液)是不可滲透性的(至少在該存儲二’=或其 間)。 件的使用期 可以使該基材形成多種形狀或成形表面。例 具有平坦較絲面,可崎絲_行成如便 2一致。在多個實施方案中,該基材或包容器件i如下 :式:平坦晶[圓形或卵形碟片,長管,球,或線。該 基材可以是柔性或剛性的。在多個實施方案中,該存儲槽 是不連續,不可變形的,並且位於可植人醫療器件的一^ 或多個表面(或其區域)上。 該基材可以僅由-種材料組成,或者可以是複合材料 或多層、疊層材料’即由結合在—起的多層相同或:同基 材材料組成。基材部分可以是例如矽或另一種微加工基二 或微加工基材的組合,例如矽與玻璃,例如美國專利申請 公開2〇〇5/〇 149000或美國專利6,527,762中所述的。在另一 個貫施方案中,該基材包含結合在一起的多個矽片。在又 一個實施方案中,該基材包含低溫共燒陶瓷(LTCC)或其他 陶究如氧化紹。在一個實施方案中,主體部分是微晶片器 件的載體。在一個實施例中,該基材由矽形成。 在一個實施方案t,待結合的任一個或兩個基材可以 50 1322734 由-種…玻璃形成’這在希望 ::::材,空腔或存储槽中包含的物芯 ㈣的貫轭方案中可能特别有用。即 戍 體窗口的仙。«的代表性實例包^酸玻=透流 石夕酸鹽玻璃,晶體玻璃等。 ,47 fixed. Substrate and storage tank _ In a known solution, the container member comprises a substrate comprising a Godoga P trowel or a substrate, which is enclosed in a closed manner for containing a fluid-tight or dense container $ sub-slot contents. As used herein, the term "closed" β is used to isolate the sealing/inclusive effects of chaos, water vapor and other gases. S. I am "liquid-tight, dissolved in the phase of beta." Portuguese:: Non-gas tightly sealed but effective barrier liquid = Forming a storage material and (as in the case of - engraved, processed, or molded storage tanks. 匕 Included in the preferred scheme, the storage tank is not Continuous, and the array is located on the surface of the device's main 7 夂t (or its area). The quantity of the material is _strong_== contains (four) release / exposure of the fine parts, or sub-components of two:: cavity or hole " 'Or an auxiliary device—the interconnecting holes of the material are not storage slots. In a known scheme, the core member contains a plurality of locations (four) located at discrete locations on at least one surface of the body portion. In another embodiment Wherein, each storage tank substrate portion has one (four); optionally, two or more of these portions can be used in the same (four). Any suitable processing technique known in the art can be utilized in the structure. Processing the storage slot in the main knives. Representative defensive techniques include MEMS manufacturing蛰 'Micro-manufacturing workers' or other micro-weiwei art, various drilling techniques (such as recording, mechanical, and ultrasonic drilling), and build up or lamination technology, 48 ★ LTCC (low / dish) Common (4) D. Optionally, the surface of the storage tank may be treated or packaged to modify the surface or properties of the surface. Examples of these properties include hydrophilicity m (surface energy, system (4), surface roughness, The charge's release characteristic. The substrate/storage cell can be fabricated from a variety of materials using MEMS methods, microfabrication, micromachining, and microfabrication techniques known in the art. Many other known methods in the art can also be used. For example, U.S. Patent No. 6,123,861 and U.S. Patent No. 6'808,522. It is also possible to use a number of polymer forming techniques known in the art, such as injection molding, hot press forming, extrusion. In various embodiments, the body portion of the container member comprises tantalum, metal, ceramic, polymer, or a combination thereof. Examples of suitable substrate materials include metals (eg, titanium, stainless steel), ceramics ( example Alumina, tantalum nitride) 'semiconductor (eg germanium), glass (eg pyrexTM, BpSG), and degradable and non-degradable polymers. When only fluid tight is required, the substrate can be formed from a polymeric material rather than The gas tightness is typically required for the metal or ceramic. In one embodiment, each storage tank is formed (i.e., defined therein) from a containment material (e.g., metal, tantalum, glass 'ceramic) and sealed with a storage tank cap. Ideally, The substrate material is biocompatible and suitable for long-term implantation into a patient. In a preferred embodiment, the substrate is formed from one or more enclosed materials. The substrate or portion thereof can be coated, packaged prior to use. Or contained in a closed biocompatible material (eg inert ceramics, titanium, etc.). The town completely coats the non-hermetic material with a layer of a sealing material. For example, the polymer substrate may have a thin metal coating. If the substrate material is not biocompatible 49 to be packaged or contained in a biocompatible material prior to use, ·t _binding coating, tetrafluoroethylene material, diamond-like carbon, tantalum carbide : Alcohol's class of titanium and so on. In one embodiment, the base porcelain, alumina, the delivered molecule and the thief or fluid (eg, water 1 = 'that is for the solution to be treated by him) are impermeable (at least in the storage two '= or ). The life of the piece can be such that the substrate forms a variety of shapes or shaped surfaces. For example, it has a flat and silky surface, and it can be satisfactorily. In various embodiments, the substrate or container member i is as follows: Formula: Flat crystal [circular or oval disc, long tube, ball, or wire. The substrate can be flexible or rigid. In various embodiments, the reservoir is discontinuous, non-deformable, and located on one or more surfaces (or regions thereof) of the implantable medical device. The substrate may be composed of only one type of material, or may be a composite material or a plurality of layers, a laminate material 'that is composed of a plurality of layers of the same or the same base material. The substrate portion can be, for example, a combination of a crucible or another micro-machined substrate or a micro-machined substrate, such as a crucible and a glass, such as those described in U.S. Patent Application Publication No. 5/5,949, or U.S. Patent No. 6,527,762. In another embodiment, the substrate comprises a plurality of haptics bonded together. In yet another embodiment, the substrate comprises a low temperature co-fired ceramic (LTCC) or other ceramics such as oxidized. In one embodiment, the body portion is a carrier for the microchip device. In one embodiment, the substrate is formed from tantalum. In one embodiment t, either or both of the substrates to be bonded may be formed by a glass of 50 1322734. This is a yoke scheme of the core (four) contained in a desired material, cavity or storage tank. May be especially useful. That is, the fairy of the body window. A representative example of «package acid glass = permeate, crystal glass, crystal glass, and the like. ,
可以通過將基材材料的晶片或層結合或附著在 增加總的基材厚度和存储槽容積。起來 儲槽的容積和/或可能影響基材 a a 響各個存 數目。可以對基材與存輯;含的存儲槽的最大 日的尺寸和數目進行選擇以便办 麟^特疋應用,加工限制,和/或總的器件尺寸限制 要的存儲槽㈣㈣數量㈣積,以適合植人病人體内而 優選使用最低限度的侵入程式。 ’ 在-個使用平面感測器的可植入感測器_的優⑭ 施方案中,如上文所提到的,該基材優選㈣^ 1The total substrate thickness and storage tank volume can be increased by bonding or attaching a wafer or layer of substrate material. The volume of the tank and/or may affect the substrate a a loud number of deposits. The size and number of the largest day of the storage tank can be selected for the substrate and the storage; for the application, the processing limit, and/or the total device size limit the number of storage slots (4) (four), It is suitable for implanting a patient's body and preferably using a minimum invasive procedure. In a preferred embodiment of an implantable sensor using a planar sensor, as mentioned above, the substrate is preferably (four) ^ 1
該基材可以含有一個、兩個、三個或多個存㈣。在 多個實施方案中,可以將幾十個、幾百個或幾千個存儲槽 排列在基材上。例如,可植人藥物遞送器件的—個實施方 案包括2慨75〇個存儲槽’其中各存儲槽包含祕釋放的 單劑量藥物。在-個傳感實施方案中,器件中的存儲槽數 目由單個Μ㈣讀壽命蚊。例如,具有暴露於身體 後可持續作用30天的單個感·的—年期可植人葡萄糖監 測器件將包含至少12個存儲槽(假定每個存儲槽包含一: 感測器)。在另-個感測器實施方案中,將感測器表面與存 儲槽開口裝置之間的距離最小化,優選接近於幾個微米。 51 2情形中,存儲槽的容積主要由該感測器的表面積決定。 1 典型的酶促制糖感測㈣極可 _μπι的空間。 佔據見400μιη長 二::貫施方案中,該存儲槽是微存儲槽。“微存儲槽” 於存儲和釋放/暴露微量材料如藥物製劑的存儲槽。 在-個貫施方案中,該微存儲槽具有小於或等於鄕㈣例 2細此,小於專,小瑪L,小於咖,小瑪l )和大於約lnL(例如大於5 nL,大於1G此,大於約Μ此, 大於.··勺50 nL,大於約叫等)的容積。術語“微量,,是指— 至最高5·的容積。在一個實施方案中,該微量介於g 矛Ιμί之間。在另—個實施方案中,該微量介於⑺此和 5〇〇nL之間。在又一個實施方案中,該微量介於約叫和 (%L之間。可以對微存儲槽的形狀和尺寸進行選擇以便最 大化或取小化藥物材料(或感測器或其他存儲槽内容物消 該微存儲槽周圍表面之間的接觸面積。 在一個實施方案中,在200微米厚的基材中形成存儲 槽且4存儲槽的尺寸爲i 5mm長0.83mm寬,容積約25〇nL·, 未汁入約20至約50微米厚的支撐結構所佔據的容積。 在另一個實施方案中,該存儲槽是大存儲槽。“大存儲 槽疋適於存儲和釋放/暴露數量大於微量的材料的存儲槽。 在一個貫施方案中,該大存儲槽具有大於5〇〇卜1(例如大於 60(VL ’大於750μΙ^,大於9〇〇μί,大於lmL等)和小於5mL(例 如小於4mL,小於3mL,小於2mL,小於lmL等)的容積。 如果不明確指出局限於微尺度或大尺度的容積/數量, 52 1322734 術語“存儲槽”意指包含這兩者。 在一個實施方案中,該器件包含微晶片化學遞送器件。 在另一個實施方案中,該器件包括由非矽基材料組成的聚 合物晶片或器件,該晶片或器件可能不能被稱爲“微晶片,’。 在一個實施方案中,該器件包含滲透泵,例如商品器件如 VIADURTM 植入物(Bayer Healthcare Pharmaceuticals andThe substrate may contain one, two, three or more stores (d). In various embodiments, tens, hundreds, or thousands of storage slots can be arranged on a substrate. For example, one embodiment of a implantable drug delivery device includes two 75 liter storage tanks, wherein each storage tank contains a single dose of the drug that is secretly released. In a sensing embodiment, the number of slots in the device is determined by a single 四(d) read life mosquito. For example, a single-age implantable glucose monitoring device with a single sense of 30 days of exposure to the body will contain at least 12 reservoirs (assuming each reservoir contains one: sensor). In another sensor embodiment, the distance between the sensor surface and the reservoir opening device is minimized, preferably close to a few microns. In the case of 51 2, the volume of the storage tank is mainly determined by the surface area of the sensor. 1 Typical enzymatic sugar sensing (4) _μπι space. Occupy see 400μιηη 2:: In the solution, the storage slot is a micro storage slot. A "micro-storage tank" is a storage tank for storing and releasing/exposing trace materials such as pharmaceutical preparations. In a solution, the micro-storage slot has less than or equal to 鄕(4), and is less than, exclusively, Xiaoma, less than coffee, Xiaoma, and greater than about lnL (eg, greater than 5 nL, greater than 1G) , greater than about Μ this, greater than the volume of .··spoon 50 nL, greater than about call, etc.). The term "micro," means a volume up to a maximum of 5. In one embodiment, the trace is between g and μ. In another embodiment, the trace is between (7) and 5〇〇nL. In yet another embodiment, the trace is between about Å and (% L. The shape and size of the microslot can be selected to maximize or minimize the medicinal material (or sensor or other) The storage tank contents eliminate the contact area between the surfaces of the micro-storage tank. In one embodiment, the storage tank is formed in a 200 micron thick substrate and the size of the 4 storage tank is i 5 mm long and 0.83 mm wide, and the volume is about 25〇nL·, the volume occupied by the support structure of about 20 to about 50 microns thick. In another embodiment, the storage tank is a large storage tank. “The large storage tank is suitable for storage and release/exposure. a storage tank having a quantity greater than a trace amount of material. In one embodiment, the large storage tank has a size greater than 5 〇〇 1 (eg, greater than 60 (VL ' greater than 750 μΙ^, greater than 9 〇〇μί, greater than 1 mL, etc.) and less than 5mL (eg less than 4mL, less than 3mL, less than 2mL, small Volume in lmL, etc. If not explicitly stated to be limited to microscale or large scale volume/number, 52 1322734 the term "storage tank" is meant to encompass both. In one embodiment, the device comprises microchip chemical delivery In another embodiment, the device comprises a polymer wafer or device composed of a non-ruthenium based material, which wafer or device may not be referred to as a "microchip,". In one embodiment, the device comprises an infiltration Pumps such as commercial devices such as VIADURTM implants (Bayer Healthcare Pharmaceuticals and
Alza Corporation)中所包含的DUROS™滲透泵技術(Alza corporation) ° 存儲槽蓋盤體 存儲槽蓋載體可以包含基材材料,結構材料或塗覆材 料,或它們的組合。包含基材##的存儲槽蓋載體可以按 照與存儲槽相同的步驟形成。可以❹上述賴廳方法, 微製造,微模制,和微加工技術由各種基材材料製造基材/ 存儲槽’以及存儲槽蓋舰^也可以通過在基材上的沈積DUROSTM osmotic pump technology (Alza corporation) included in Alza Corporation) Storage tank cover tray The storage tank cover carrier may comprise a substrate material, a structural material or a coating material, or a combination thereof. The storage tank cover carrier containing the substrate ## can be formed in the same steps as the storage tank. The substrate/storage tanks and the storage tanks can be fabricated from various substrate materials by the above-mentioned method, microfabrication, micromolding, and micromachining techniques, and can also be deposited on the substrate.
技術和然後的MEMS方法,微製造,微模制和微加工技術 =包含結卿料的存儲槽錄體。可以制已知的塗覆 =和帶式掩模(tape masking),陰罩掩模帥一 選擇健射去除技術,或其他選擇性方法由塗覆 討元成存儲槽蓋載體。 干個存畔蓋載體 容物之上的多種構造的若 槽的ι/ 】如,—個存儲槽蓋細可以從存儲 以^伸(Spa刺相反的—側;另外的存儲槽蓋載體可 在 這個實延伸到該存儲槽的其他兩側 例中’存儲槽上可以支細個存健槽蓋。 53 在感測11應用(例如葡萄糖感測請—個實施方荦中 二子儲槽(屬於—個器件’該器件可能只包含—個存儲样’ 可此包含兩個或多個存儲槽)具有三個或 ^ 口和相應的存儲槽蓋。 情槽開 可以根據具體應用的特殊要求改變载體結構 幾何形狀。你丨备π 〜了和 升載體結構的厚度,寬度和橫截面 狀(如正方形’矩形,三角形)進行調整以針對對於某 物製劑或植入位置等的特殊的 藥物釋放動力學β ; Λ \ 槽内交 卜2儲槽内谷物基本上是,直到在希望其釋放或暴露的 、疋時間點之前需要與該存儲槽外部的環境_(如 2任或材料。在多個實施方案巾,存儲槽内容物包 3(些里的)化學分子,輔助器件,或它們的組合。 某一存儲槽内容物如催化劑或感測器的正常功能通常 不需要從存儲槽釋放,“它們的鼓功能(例如催化或傳 :立在存储槽蓋打開之後存儲槽内容物暴露於存儲槽 外°叫兄之時。因此,催化劑分子或㈣元件可以被釋放 ,者^敵開的射讀巾保財動。其他存㈣内容物例如 藥物刀子通吊可能需要從存儲槽釋放以便通過該器件並被 遞制體内的位置’以便對病人産生治療效果。然而,可 、將藥^子保留在存儲槽之内以便用於某些體外應用。 在右干κ施方案中,對封接存儲槽的密閉性具有要求, 該在^㈣於特定的應用典敎義麟定分子(例如氣或 水)的取大允許輸达率。即在器件的不同應用中是否認爲 54 存儲槽爲m取決於該應用的具體要求。 存儲槽内容物可以包括基本上任何天然或合成分子, =機或無機分子,或者它們的混合物。該分子基本上可以 B可形式,例如純淨的固體或液體,凝膠或水凝膠,溶 I乳狀液’衆體’ ’東乾粉體,或懸浮體。可以將有用分 、〃 /、他材料混和以便控制或增加從敞開存儲槽中的釋放 速率和/或時間。 在優k貫;^方案中,該存儲槽内容物包含藥物製劑。 :藥物製劑是包含藥物的組合物。這裏所用的術語“藥物” 包括任何治療或肋試㈣雜藥學成分或API)。在一 個實施方案中,以固體形式提供該藥物,特別是爲了在商 品t醫學上有效的時間内保持或延續藥物的穩定性,例如 —藥物遞送n件巾存儲期間直到需要使用藥物時。該固體 二土體可以疋純淨形式或者是其他材料的固體顆粒的形 “藥物包3、懸浮或分散在該顆粒中。在—個實施方 案’該藥物是蛋白質或肽。實例包括糖蛋白酶(例如蛋白 解酶)激素或其他類似物,抗體(例如抗VEGF抗體,通 瘤壞死_抑制劑),細胞因數(例如,々·,或厂干擾素), ,田胞)ι素(例如IL_2,IL-1()),和糖尿病/肥胖症相關的治 射勿(”例如胰島素’ Exenatide ’ ργγ,GLp i及其類似物)。 個盗件中的存儲槽可以包含單—藥物製劑或兩種或多種 藥物製劑的組合物。可以將不同製劑存儲在―起然後由同 一或多個存儲槽中釋放,或者可以將它們各自存儲在不同 55 1322734 的存儲槽然後從中釋放。 對於體外應用,該化學分子可以是大量分子中的任一 種’其中需要-種或多種分子的少量(微克或納克)受控釋 =例如在分析化學或醫療診斷領域中。分子可以作爲 緩衝劑’診斷試劑’和複雜反應如聚合酶鏈式反應或其他 核酸擴增過程中的·。在其他實施方案中,待釋放的分 子可以是香料(frag眶e)或香味劑(scent),染料或其他著色 劑甜味劑或其他濃縮調味劑,或多種其他化合物 。在又 一個實施方案中,該存儲槽包含固定的分子。實例包括反 應中可能涉及_任何化學物類,包括觸、催化劑(例如 辦’金屬和沸石),蛋白質(如抗體),核酸,多糖,細胞, 和聚合物,以及能夠起到診斷試劑仙的有機或無機分子。 以便::將用於釋放的藥物或其他分子分散到母體材料中 =制釋放的速率。這種母體材料可以是如美國專利N〇 可以:中所述的“釋放體系,,,其降解、溶解或擴散性質 :,供控制化學分子釋放速率的方法。在_個實施方幸 中,存儲槽内的藥物製劑包含藥物和非藥物材料的層。在 主動釋放機制暴露存儲槽内容物之後,由於非藥物中間層 的存在5玄多重層可提供多個藥物釋放的脈衝。可以使用這 種策略來獲得複雜的釋放曲線。參見美國專财請公開 N〇··偷儒1A1,這裏通過引用引入該專利。 輔助器株 如果不另外明確說明,這裏所用的術語“輔助器件,,包 括可置於存儲射的任_件或其元件。在—個實施方案 56 1322734 中,輔助器件是感測器或其傳感元件。如這裏所用的,“傳 感元件”包括用於測量或分析一定位置處化學或離子物質 的存在,不存在或者變化,能量或一種或多種物理性質(如 pH,壓力)的元件。感測器的類型包括生物感測器,化學感 測器,物理感測器或光學感測器。美國專利No.6,551,838 中進一步描述了輔助器件。在一個實施方案中,該感測器 是壓力感測器。參見例如美國專利N〇.6,221,024,和 No.6,237,398,和美國專利申請公開No.2004/0073137。傳 感元件的實例包括用於測量或分析一定位置處藥物,化學 或離子物質的存在,不存在或者變化,能量(或光),或一種 或多種物理性質(如pH,壓力)的元件。在又一個實施方案 中,該感測器包括懸臂梁型感測器,例如用於化學檢測的 那些。例如參見美國專利申請公開No.2005/0005676,這裏 通過引用引入。 在一個優選實施方案中,提供了用於植入病人(如人體 或其他哺乳動物)的器件並且該存儲槽内容物包含至少一 個可指示該病人體内的生理狀態的感測器。例如,該感測 器可以監測病人的血液、血漿、組織液、玻璃體液、或其 他體液中存在的葡萄糖、尿素、飼、或激素的濃度。 在一個實施方案中,兩個結合基材包括至少一個空腔, 該空腔可以限定在一個基材或兩個基材部分内並且包含 MEMS器件。該MEMS器件可以在第三基材上。封接腔體内 的空間可以被抽空或者可以包含惰性氣體或氣體混合物 (例如氮,氦)。該MEMS器件可以是本領域内熟知的器件, 57 例如壓力感測器,加速度計,陀螺儀,譜振器。在另一個 貫施方案中,該結合基材中的至少-個是由破璃形成,並 且腔體包含先料測n或可以絲查詢的化學化合物。 對位於主器件中的輔助器件所獲資料進行接收和分析 2在多種選擇,該主器件可以是微晶片器件或其他器件。 1 亥主器件可以通過本地微處判或者遠端㈣器進朴 制。可以提供生物感測器資訊輪入到控制器,以便自動或 利用人爲干預,或兩者的組合地確定啟動的時間和類型。 可以通過板載(即位於封裝⑴微處則或狀態機控制 4件的㈣。通過適當電路調節(如果需要)之後销件 産生的輸出信號將被微處理器獲取。分析和處理之後,核 輸出信號將被存儲到可寫的電腦記憶晶片中,和/或被送到 (例如無線方式)遠離微“的遠端位置。可以在本地通過電 池或者遠料過錄傳輸向额晶以統提供能量 例如美國專利申請公開ΝΟ·2002/0072784。 在-個實施方案中’提供了具有存儲槽内容物的 Γ容物包㈣於釋放的藥物分子和感測器/傳感元件。例 。’該感測錢«元件可位於存儲射或者可附著在談 ^件的基材上。該感測器可以通過例如微處理器與器件= ^作1±通信’以便控制或調整藥物釋放的變數,包括气量 :頻率,釋放時間,有效釋放速率,藥物或藥物組合二 =質:性質並且可以向用於控制該器件釋放的微: 遞種信號可以精細控制藥物的釋放和/或對其 58 1322734 提供反饋。在另一個實施方案中’該器件包括—個或多個 生物感測器(該生物感測器可以被封接在存儲槽中直到需 要使用),該生物感測器能夠檢測和/或測量病人體内的信 號。在一個變體中,可植入醫療器件包括含有感測器的存 儲槽,該感測器以上文所述方式封接,並且將感測器産生 的信號傳送(通過許多方式,包括硬連線或遙測)到獨立的藥Technology and then MEMS methods, microfabrication, micromolding and micromachining technology = storage tank recordings containing sizing materials. Known coatings and tape masking can be made, the mask mask is selected to be a shot removal technique, or other selective methods are applied to the storage tank cover carrier. Drying the cover of the carrier material on a variety of structures, such as the groove ι / 】 If a storage tank cover can be from the storage extension (Spa thorn opposite side; additional storage slot cover carrier can be This actually extends to the other side of the storage tank. In the storage tank, a fine tank cover can be supported. 53 In the sensing 11 application (for example, glucose sensing, an implementation of the two sub-storage tanks (belongs to - The device 'The device may only contain one storage sample' may contain two or more storage slots.) It has three or two ports and corresponding storage slot cover. The slot can be changed according to the specific requirements of the specific application. Structural geometry. You have prepared π ~ and liter carrier structures for thickness, width and cross-section (such as square 'rectangle, triangle) to adjust for specific drug release kinetics for a certain formulation or implant location, etc. ; Λ 交 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 Solution towel, storage slot The chemical molecules, auxiliary devices, or a combination thereof of the contents of the package 3. The normal function of a storage tank contents such as a catalyst or a sensor usually does not need to be released from the storage tank, "their drum function (for example) Catalytic or transfer: Standing after the storage tank cover is opened, the contents of the storage tank are exposed to the outside of the storage tank. Therefore, the catalyst molecules or (4) components can be released, and the enemy's open reading glasses can be used for protection. Storage (4) contents such as drug knives may need to be released from the storage tank to pass through the device and be delivered to a location in the body to provide a therapeutic effect to the patient. However, the drug can be retained in the storage tank so that For some in vitro applications. In the right dry κ regimen, there is a requirement for the tightness of the sealed storage tank, which is allowed in the specific application of the formula (such as gas or water). Transmittance rate, ie whether the storage tank is m in different applications of the device depends on the specific requirements of the application. The contents of the storage tank may comprise substantially any natural or synthetic molecule, = organic or inorganic molecules, or a mixture of these molecules. The molecule can be substantially in the form of B, such as a neat solid or liquid, a gel or a hydrogel, a solution of the emulsion I 'body', a dry powder, or a suspension. , 〃 /, his material is mixed to control or increase the release rate and/or time from the open storage tank. In the preferred embodiment, the storage tank contents contain a pharmaceutical preparation. The pharmaceutical preparation is a combination comprising a drug. The term "drug" as used herein includes any therapeutic or rib test (4) a pharmaceutical ingredient or API). In one embodiment, the drug is provided in a solid form, particularly for the purpose of maintaining or Continuing the stability of the drug, for example, during the storage of the n-piece of the drug until the need to use the drug. The solid two-body can be in the form of pure particles or in the form of solid particles of other materials "drug package 3, suspended or dispersed in the particle in. In one embodiment, the drug is a protein or peptide. Examples include glycoproteinase (eg, proteolytic enzyme) hormones or other analogs, antibodies (eg, anti-VEGF antibodies, tumor necrosis-inhibitors), cytokines (eg, 々·, or plant interferon), , (eg IL_2, IL-1()), and diabetes/obesity-related treatments (such as insulin 'Exenatide ' ργγ, GLp i and its analogues). The storage slots in the pirate can contain a single A pharmaceutical preparation or a combination of two or more pharmaceutical preparations. The different preparations may be stored in and then released from the same or a plurality of storage tanks, or they may each be stored in a different 55 1322734 storage tank and then released therefrom. For in vitro applications, the chemical molecule can be any of a large number of molecules 'where a small amount (micrograms or nanograms) of controlled release of one or more molecules is required = for example in the field of analytical chemistry or medical diagnostics. Molecules can act as buffers' Diagnostic reagents' and complex reactions such as polymerase chain reaction or other nucleic acid amplification processes. In other embodiments, the molecule to be released may be a fragrance (frag眶e) Scent, dye or other colorant sweetener or other concentrated flavoring agent, or a variety of other compounds. In yet another embodiment, the storage tank contains immobilized molecules. Examples include reactions that may involve any chemical Classes, including touches, catalysts (such as 'metals and zeolites'), proteins (such as antibodies), nucleic acids, polysaccharides, cells, and polymers, and organic or inorganic molecules that can function as diagnostic reagents. The rate at which the released drug or other molecule is dispersed into the parent material = the release rate. The parent material may be a "release system" as described in U.S. Patent No.:, its degradation, dissolution or diffusion properties: A method of controlling the release rate of chemical molecules. In one implementation, the pharmaceutical formulation in the reservoir contains a layer of drug and non-pharmaceutical material. After the active release mechanism exposes the contents of the reservoir, the five meta-layers provide multiple pulses of drug release due to the presence of the non-pharmaceutical intermediate layer. This strategy can be used to obtain complex release profiles. See US Treasury for details. N〇··················· The auxiliary device, as used herein, the term "auxiliary device", includes any device or element that can be placed in a storage device. In an embodiment 56 1322734, the auxiliary device is a sensor or its transmission. Sense element. As used herein, "sensing element" includes elements for measuring or analyzing the presence of a chemical or ionic species at a location, without the presence or variation, energy or one or more physical properties (e.g., pH, pressure). The type of sensor includes a biosensor, a chemical sensor, a physical sensor, or an optical sensor. The auxiliary device is further described in U.S. Patent No. 6,551,838. In one embodiment, the sensor is pressure Sensors. See, for example, U.S. Patent Nos. 6,221,024, and 6,237,398, and U.S. Patent Application Publication No. 2004/0073137. Examples of sensing elements include measuring or analyzing a drug, chemical or ion at a certain location. The presence of a substance, an element that does not exist or change, energy (or light), or one or more physical properties (such as pH, pressure). In yet another embodiment, The sensor includes a cantilever beam type sensor, such as those used for chemical detection. See, for example, U.S. Patent Application Publication No. 2005/0005676, which is incorporated herein by reference. a device of a patient (such as a human or other mammal) and the contents of the reservoir containing at least one sensor that can indicate a physiological state within the patient. For example, the sensor can monitor a patient's blood, plasma, tissue fluid, The concentration of glucose, urea, feed, or hormone present in the vitreous humor, or other body fluids. In one embodiment, the two bonded substrates comprise at least one cavity, which may be defined on one substrate or two bases The MEMS device is contained within the material portion. The MEMS device can be on the third substrate. The space inside the sealing cavity can be evacuated or can contain an inert gas or a gas mixture (eg, nitrogen, helium). The MEMS device can be in the field. Well-known devices, such as pressure sensors, accelerometers, gyroscopes, and spectral oscillators. In another implementation, the combination At least one of the substrates is formed of a glass, and the cavity contains a chemical compound that can be inquired or can be inquired. The data obtained by the auxiliary device located in the main device is received and analyzed 2 in a variety of options, The master device can be a microchip device or other device. 1 The main device can be localized or remotely located. It can provide biosensor information to the controller for automatic or user intervention. , or a combination of the two to determine the time and type of start-up. It can be output on the board (ie, at the micro-section of the package (1) or the state machine controls 4 (4). The output signal generated by the pin after adjustment by appropriate circuitry (if needed) It will be acquired by the microprocessor. After analysis and processing, the core output signal will be stored in a writable computer memory chip and/or sent (eg, wirelessly) away from the micro" remote location. Energy can be supplied locally to the frontal crystal by means of a battery or a remote recording transmission, for example, U.S. Patent Application Publication No. 2002/0072784. In one embodiment, a capsule (s) containing the contents of the reservoir is provided for drug molecules and sensor/sensing elements that are released. example . The sensory money component can be located on a substrate that is stored or attached to the article. The sensor can be controlled or adjusted for variables of drug release by, for example, a microprocessor and device = ^, including volume: frequency, release time, effective release rate, drug or drug combination, quality, and properties. The micro: seeding signal that can be used to control the release of the device can finely control the release of the drug and/or provide feedback to its 58 1322734. In another embodiment, the device includes one or more biosensors that can be sealed in a storage tank until needed for use, the biosensor capable of detecting and/or measuring a patient The signal in the body. In one variation, the implantable medical device includes a memory slot containing a sensor that is sealed as described above and that transmits signals generated by the sensor (by many means, including hardwired Or telemetry) to an independent drug
物遞送器件中’該器件可以是可攜帶(即外部)或内部的泵, 該信號用於控制藥物計量。 迫長所用的術語“生物感測 ---------- 町岍關注的分析物In the delivery device, the device can be a portable (i.e., external) or internal pump that is used to control drug metering. The term "biological sensing" used by the forced-long ----------
的化學勢轉換成電信號(例如通過將機械能或減轉換成 電化號)的感測器件,以及直接或間接測量 例如,該生物感測器可以測量不同體内位置== 就(EKG,EEG ’或其他神經信號),壓力,溫度,ρΗ,或 ^織=構上的機械載荷。缝可以通過例如微處理器/控制 =*來自該生物感測器的電信號,隨後該微處理器/控制 二Γ將育訊傳送到遠端控制器,其他本地控制器,或它 咬植入該系統可以用於傳遞或記錄病人生命體症 植入如 兄方面的資訊,例如藥物濃度。 在一個優選實施方牵中, 累中忒盗件包含-個或多個用於 可以用於1=島素控制的感測器。來自該感測器的資訊 ;主動控制從同一器件或獨立胰 如常規的胰島素泵,外 ,、②盗件(例 放。可以以―卜礼帶贱者植人型)巾的騰島素釋 件,該哭件多存儲槽器件的形式提供密封存餘槽器 子儲了葡萄糖感測器的陣列並且能夠將葡萄糖 59 凟數傳遞(有線或無線)到手提或攜帶式葡萄糖計量型儀器, 該儀器允許病人手動爲自身注入胰島素(例如通過注射)。其 他實施方案可以以類似方式感應其他分析物和供給其他類 型的藥物》 查儲槽1 這裏所用的術語“存儲槽蓋,,是指適於將存儲槽内容物 與存儲槽的外部環境隔開的隔膜,薄膜,或其他結構,但 2其預定在選定的時除去或分裂以肋開存儲槽並暴 路出其内容物。在-個優選實施方案中,*連續的存儲槽 蓋將存儲槽開口中的—個完全覆蓋。在另—個實施方案中曰, =連續存儲槽蓋將兩個或多個但少於全部的存儲槽開口覆 蓋。在優選的主動控制器件中,該存儲槽蓋包含可以回應 外加刺激(例如電場或電流,磁場,PH改變,或通過熱、化 學、電化學或機械方式)分裂或可渗透化(permea磁zed)的 任何材料。適合的存儲槽蓋材料的實例包括金,鈇,始, 。。=銅辞,合金,和共晶材料例如金矽和金錫共晶。 早—器件中可以存在無源或有源隔離層的任何組合。 在一個實施方案中,該存儲槽蓋導電並且非多孔的。 在—個優選實施方”,該存儲槽蓋是薄的金屬膜的形式。 在另-個實施方案中’該存儲槽蓋由多個金屬層製成例 _鈦,麵的多層/疊層結構。例如,可以爲存儲槽蓋上(典 型只在於一部分之上)的附著層選擇頂層和底層以確保該 ,槽蓋與存儲槽開σ,存儲槽蓋錢周_基材區域和 電上層附著/結合。在-種情形中,該結構是欽/鋪大衝 60 鈦’其中頂層和底層用作附著;I,而始層提供額外的穩定 性/生物穩定性並保護主要的中間鈦層。這些層的厚度可以 是,例如中間鈦層約3〇〇nm,每個鉑層約4〇nm,而附著鈦 層約10nm至I5nm。 査盤槽蓋分裂或可淥读化的控制奘i 。亥包谷器件包括促進和控制存儲槽打開的控制裝置, 例如在這裏所述的存儲槽封接之後的選定時間分裂或可滲 透化該存儲槽蓋。該控制裝置包含(—個或多個)結構元件以 及用於供能和控制存儲槽内容物釋放和暴露的啓動時間的 電子設備(例如電路和電源)。 該控制裝置可以採用多種形式。在一個實施方案中, 該存儲槽蓋包含通過美國專利申請公開N〇 2〇〇4/〇121486 A1所描述的電熱燒蝕分裂的金屬膜,並且該控制裝置包括 控制和由電源(例如電池,儲能電容器)向選定的存儲槽蓋傳 遞電能用於刺激(例如存儲槽開口)而需要的硬體、電子元 件、和軟體。例如,該器件可以包括電源和連接在下述引 線間的存儲槽蓋,該電源通過電子輸入引線,電子輸出引 線施加一定量的電流以便有效分裂該存儲槽蓋。可以通過 電池’電容器’(生物)燃料電池在本地或者通過例如美國專 利申請公開No.2002/0072784中所述的無線傳輸遠端向多 蓋存儲槽系統的控制裝置提供電能。可以通過板載電池對 電容器進行本地充電,或者通過例如射頻信號和超聲波進 行遠端充電。 在一個實施方案中’該控制裝置包括輸入源,微處理 61 器。十時s #路分配器(和多工器)。可以對計時器和多路 刀配器工$)電路進行設計並在製S過程巾將其直接引 入到基材表面上。在另—個實施方案中,以獨立元件提供 控制裝置的若干元件,該元件可以與ϋ件的存儲槽部分系 聯(tether)或者不與其系聯。例如,該控制器和/或電源可以 物理上遠_多蓋存儲槽H件’但是與其可操作相連和/或 與之可通信。在—個實施方案中,可以通過板載(例如可植 入!§件内)微處理器控制多蓋存儲槽系統的操作。在另一個 實施方案中,使用簡單狀態機,因爲它典型較爲簡單,較 小’並且/或者使用的功率小於微處理器。 美國專利Νο.5,797,898,Νο·6,527,762,和No.6,491,666, 美國專利申請公開 No.2004/0121486,2002/0107470 A1, 2002/ 0072784 A1,2002/0138067 A1,2002/0151776 A1, 2002/ 0099359 A1,2002/0187260 A1 和 2003/0010808 A1 ; PCT WO 2004/022033 A2 ; PCT WO 2004/026281 ;和美國 專利No.5,797,898 ;No.6,123,861 ;和No.6,527,762中描述了 其他的存儲槽開放和釋放控制方法,這裏通過引用而引入。 :^J_多蓋存儲楢条統/器件 這裏所述的多蓋存儲槽釋放/暴露器件和系統可以用 於各種各樣的應用中。優選的應用包括藥物的受控遞送, 生物傳感,或它們的組合。在一個優選實施方案中,該多 蓋存儲槽系統是可植入醫療器件的一部分《該可植入醫療 器件可以是各種各樣的形式並且可用於各種治療和/或診 斷應用。在一個實施方案中,該存儲槽在一持續時間段内 62 1322734 儲存和釋放藥物製劑。在另一個實施方案中,該存儲槽存 儲並包含用於選擇性暴露的感測器,其中可以在需要時(取 • 決於例如感測器的故障)或者在預定安排的指令下打開該 - 存儲槽。例如,該存儲槽可以包含壓力感剛器,化學感測 • 器,或生物感測器。在特定的實施方案中,該存儲槽包含 葡萄糖感測器,該感測器可以包含固定在存儲槽中的電極 . 上並被一種或多種可滲透/半滲透膜所包覆的葡萄糖氧化 φ 酶。當該酶在期望的使用時間之前暴露於環境(例如身體) 時,可能喪失其活性,因此封接的存儲槽用於保護該酶直 到需要的時候。 在又一個實施方案中,可以這裏所述的多蓋存儲槽系 統和器件包含到許多其他器件中。例如可以將密封存儲槽 • 集成到其他類型和設計的可植入醫療器件中,例如美國專 . 利申請公開N〇.2〇〇2/〇111601所述的導管和電極。在另一個 實施例中,可以將其結合到其他醫療器件中,該醫療器件 鲁巾本H件和♦、財以將藥物釋放到載液巾,該载液然後流 到預疋的施用位置,如美國專利N〇.6,491,666中的實施例所 述。還可以將該密封存儲槽結合到藥物泵,吸入器或其他 ’肺部藥物遞送器件中。 這裏所述的封接器件還可以具有許多體外應用和商業 ^斷應用。該器件能夠遞送精確計量的分子,從而可用於 體外應用,例如分析化學和醫學診斷,以及生物應用例如 爲細胞培養遞送因數。在又一個#醫學應用中,該器件用 於控制香料,染料,或其他有用化學物質的釋放。 63 1322734 美國專利No.5,797,898 ; 6,527,762 ; 6,491,666 ;和 6,551,838,和美國專利申請公開2002/0183721, 2003/0100865 >2002/0099359 >2004/0082937 >2004/0127942 > 2004/0121486,2004/0106914,和2004/0106953中描述了其 他的應用,這裏通過引用而引入。 參照下列非限制性實施例可以進一步理解本發明的實 施方案。The chemical potential is converted into an electrical signal (for example by converting mechanical energy or subtraction into an electrochemical number), and direct or indirect measurements, for example, the biosensor can measure different in vivo positions == (EKG, EEG) 'or other neural signals', pressure, temperature, ρΗ, or ^ woven = mechanical load on the structure. The slit can be passed, for example, by a microprocessor/control = * an electrical signal from the biosensor, and then the microprocessor/controler transmits the communication to the remote controller, other local controller, or it bites the implant The system can be used to transmit or record information about the patient's vitality implants, such as the brother, such as drug concentration. In a preferred embodiment, the smashing smash contains one or more sensors for use in 1 = island control. Information from the sensor; active control from the same device or independent pancreas, such as the conventional insulin pump, outside, 2 thieves (for example, can be used to - 礼 贱 贱 植 植 )) The cryoplem multi-storage device is provided in the form of a sealed residual tanker that stores an array of glucose sensors and is capable of transferring glucose 59 turns (wired or wireless) to a portable or portable glucose metering instrument, The instrument allows the patient to manually inject insulin into itself (eg, by injection). Other embodiments may induce other analytes and supply other types of drugs in a similar manner. Storage Tank 1 The term "storage tank cover" as used herein, is meant to be adapted to separate the contents of the storage tank from the external environment of the storage tank. Membrane, membrane, or other structure, but 2 which is intended to be removed or split at selected times to ribbed the reservoir and blasts out its contents. In a preferred embodiment, the *continuous storage slot cover will open the storage slot In a further embodiment, the continuous storage tank cover covers two or more but less than all of the storage slot openings. In a preferred active control device, the storage slot cover comprises Any material that can respond to additional stimuli (such as electric fields or currents, magnetic fields, pH changes, or by thermal, chemical, electrochemical, or mechanical means) to split or permeate (permea magnetically zed). Examples of suitable storage tank cover materials include Gold, 鈇, 、, _ = copper, alloy, and eutectic materials such as gold iridium and gold tin eutectic. Early - any combination of passive or active isolation layers can exist in the device. Embodiment, the storage tank and non-porous electrically conductive cover in - preferred embodiment, "the memory slot cover is in the form of a thin metal film. In another embodiment, the storage tank cover is formed from a plurality of metal layers - titanium, a multilayered/laminated structure. For example, the top layer and the bottom layer can be selected for the adhesion layer on the storage tank cover (typically only on a portion) to ensure that the groove cover and the storage tank are opened, and the storage tank cover and the electrical upper layer are attached/bonded. . In the case, the structure is a perovskite 60 Titanium where the top and bottom layers are used for attachment; I, while the initial layer provides additional stability/biostability and protects the primary intermediate titanium layer. The thickness of these layers may be, for example, about 3 Å nm for the intermediate titanium layer, about 4 Å for each of the platinum layers, and about 10 nm to 1 5 nm for the attached titanium layer. Check the slot cover split or readable control 奘i. The holster device includes control means for facilitating and controlling the opening of the storage tank, for example, splitting or permeable to the storage tank cover at a selected time after the storage tank is sealed as described herein. The control device includes (or one or more) structural components and electronics (e.g., circuitry and power) for energizing and controlling the startup time of the storage tank contents to be released and exposed. The control device can take a variety of forms. In one embodiment, the storage tank cover comprises a metal film that is electrothermally ablated by the electrothermal ablation described in U.S. Patent Application Publication No. 4/4,112,486, the disclosure of which is incorporated herein by reference. The energy storage capacitor) is a hardware, electronic component, and software that is required to transfer electrical energy to a selected storage tank cover for stimulating (eg, a storage slot opening). For example, the device can include a power supply and a memory slot cover connected between the leads through an electronic input lead that applies a quantity of current to effectively split the storage slot cover. The power can be supplied to the control device of the multi-capacity storage tank system by a battery 'capacitor' (bio) fuel cell either locally or by a wireless transmission remote end as described in, for example, U.S. Patent Application Publication No. 2002/0072784. The capacitor can be locally charged via the onboard battery or remotely charged, for example by radio frequency signals and ultrasound. In one embodiment the control device includes an input source, a microprocessor 61. Ten o'clock s #road distributor (and multiplexer). The timer and multi-tool aligner $) circuits can be designed and introduced directly onto the substrate surface in a S-process wipe. In another embodiment, several elements of the control device are provided as separate elements that may or may not be associated with the storage slot portion of the element. For example, the controller and/or power source can be physically remotely multiplexed with the storage unit H' but operatively coupled to and/or communicable therewith. In one embodiment, the operation of the multi-cap storage tank system can be controlled by an onboard (e.g., implantable) component microprocessor. In another embodiment, a simple state machine is used because it is typically simpler, smaller' and/or uses less power than a microprocessor. U.S. Patent Nos. 5,797,898, Νο. 6, 527, 762, and 6, 491, 666, U.S. Patent Application Publication No. 2004/0121486, 2002/0107470 A1, 2002/0072784 A1, 2002/0138067 A1, 2002/0151776 A1, 2002/ 0099359 Other storage slots are described in A1, 2002/0187260 A1 and 2003/0010808 A1; PCT WO 2004/022033 A2; PCT WO 2004/026281; and U.S. Patent Nos. 5,797,898; 6,123,861; and 6,527,762. And release control methods, which are hereby incorporated by reference. :^J_Multiple Cover Storage System/Device The multi-cover storage slot release/exposure devices and systems described herein can be used in a wide variety of applications. Preferred applications include controlled delivery of the drug, biosensing, or a combination thereof. In a preferred embodiment, the multi-capacity storage tank system is part of an implantable medical device. The implantable medical device can be in a wide variety of forms and can be used in a variety of therapeutic and/or diagnostic applications. In one embodiment, the reservoir stores and releases the pharmaceutical formulation over a sustained period of time 62 1322734. In another embodiment, the storage slot stores and includes a sensor for selective exposure, wherein the device can be turned on when needed (depending, for example, from a sensor failure) or under a predetermined schedule of instructions - Storage slot. For example, the reservoir can include a pressure sensor, a chemical sensor, or a biosensor. In a particular embodiment, the storage tank comprises a glucose sensor, the sensor may comprise an electrode oxidized φ enzyme coated on one or more permeable/semi-permeable membranes. . When the enzyme is exposed to the environment (e. g., the body) prior to the desired period of use, its activity may be lost, so the sealed storage tank is used to protect the enzyme until needed. In yet another embodiment, the multi-cap storage cell systems and devices described herein can be incorporated into many other devices. For example, sealed storage tanks can be integrated into other types and designs of implantable medical devices, such as the catheters and electrodes described in U.S. Patent Application Serial No. 2,2,112,601. In another embodiment, it can be incorporated into other medical devices that release the drug to the carrier towel, which then flows to the pre-applied application site. As described in the examples in U.S. Patent No. 6,491,666. The sealed reservoir can also be incorporated into a drug pump, inhaler or other 'pulmonary drug delivery device. The sealing devices described herein can also have many in vitro and commercial applications. The device is capable of delivering precisely metered molecules for in vitro applications such as analytical chemistry and medical diagnostics, as well as biological applications such as cell culture delivery factors. In yet another #medical application, the device is used to control the release of fragrances, dyes, or other useful chemicals. 63 1322734 U.S. Patent Nos. 5,797,898; 6,527,762; 6,491,666; and 6,551,838, and U.S. Patent Application Publication No. 2002/0183721, 2003/0100865 <2002/0099359 >2004/0082937 >2004/0127942 >2004/0121486,2004/ Other applications are described in 0106914, and 2004/0106953, which is incorporated herein by reference. Embodiments of the invention may be further understood by reference to the following non-limiting examples.
實施例1 :凸榫和凹槽密封 使用凸榫和凹槽接頭結構設計製作密封。通過壓制冷 焊工藝製造該封接。第3圖顯示了該封接的SEM。基材是矽 (上)和氧化鋁(下)。金屬是金(濺射在矽上,濺射然後電鍍在 氧化鋁上)。將該部件結合到pC_15〇倒裝片對準儀上該儀 器是在X,y,z方向提供精確對準並且可以縱搖,橫搖和偏 轉(pitch,inland yaw)的儀器。一旦將部件對準,fci5〇便 將部件壓在一起並形成冷焊結合。Example 1: Tenon and groove seals Seals were designed using a tenon and groove joint structure. The seal is made by a pressure cooling process. Figure 3 shows the SEM of the seal. The substrates are 矽 (top) and alumina (bottom). The metal is gold (sputtered on a crucible, sputtered and then electroplated onto alumina). This component is incorporated into the pC_15 flip-chip aligner. The instrument is an instrument that provides precise alignment in the X, y, and z directions and can be pitched, pitched, and pitched (inland yaw). Once the parts are aligned, the fci5 will press the parts together and form a cold weld bond.
實施例2 :部件尺寸變化和金屬厚度對密閉性的影響。 使用不同的部件尺寸和金屬層厚度製造幾個不θ同的接 頭設計。將接頭壓制冷焊,然後根據部件喊何形狀使用 染料滲透賴或㈣漏檢測儀測朗接接頭㈣漏。如下 表1所示’發現賴完纽與所麟範圍_部件 金 金屬層厚度無關。可能料低於心檢測儀下限或小於 5e-llatm*cc/sec的不可檢測茂漏速率。 64 脊寬 (188) 脊高 (190) μηι μιτι 145 50 50 50 60 50 60 50 60 50 不同接頭封接-洩漏測試的比較Example 2: Effect of component size change and metal thickness on airtightness. Several different joint designs were made using different part sizes and metal layer thicknesses. The joint is pressure-cooled and welded, and then the dye is used according to the shape of the part, or the (four) leak detector is used to measure the joint (4). As shown in Table 1 below, it is found that the Lai Wan New Zealand has nothing to do with the thickness of the metal layer. It may be less than the lower limit of the heart tester or an undetectable leak rate of less than 5e-llatm*cc/sec. 64 Ridge width (188) Ridge height (190) μηι μιτι 145 50 50 50 60 50 60 50 60 50 Comparison of different joint sealing-leak tests
貝她例3 .具有單獨封接部件的微製造腔的陣列 提供兩個♦基材,該基材製造有互補的空腔和用於壓 力冷焊的封接部件。該封接部件包括微製造至-個基材上/ 内的凸脊,和微製造至另—個基材上/内的配合凹槽◦在每 個凹槽内部和每個凸脊的内部形H寬的空腔。第27A B 圖顯示了所得基材和封接部件。 將這裏引用的公開通過弓丨用並入。根據上文詳細的描 述’ ^裏所述方法和器件的改進和變化對於本領域的技術 這些改進和變化應當在附屬的權利要 求的範圍之内。 【圖式簡單說曰月】 fi圖是具有凸榫和凹槽接頭結構設計的封接系統的 個貝把方案的彳讀面視圖,該設計提供了通過壓力冷焊 工藝形成的密封。 第2圖是具有凸榫和凹槽接頭結構設計的密封系統的 另-個實施方案的職面視圖,該設計提供了密封。在左 側的圖顯示了壓制冷焊加卫之前的結構,而在右侧的圖顯 示了壓制冷焊加工之後形成的封接。 一第3圖的掃描電子顯微照片顯示了利用第2圖所示的封 接/矛壓制冷焊工藝形成的密封的橫截面。 =圖是具有接頭結構設計的密封系統的—個實施方 =的截面視圖,該設計在每個接頭結構處具有單一的冷 ’該金屬預製件可⑽壓制冷焊在接頭結構 第圖疋具有金屬預製件的密封系統的一個實施方 的橫截面視圖 Μ 之間。 第6圖是具有金屬預製件的密封系統的另一個實施方 案的橫截面視圖,該金屬預製件可以觀制冷焊在接頭結 構之間。 第7圖疋接頭結構底部幾何形狀的五個不同實施方 的平面圖。 丄第8圖是可用於壓制冷焊形成密封的接頭結構設計的 六個不同實施方案的平面圖和橫截面視圖。 第9圖是使用第8圖所示接頭結構設計的不同組合形成 的密封系統的四個實施方案的橫截面視圖。 第1〇圖是具有凸榫和凹槽接頭結構設計的密封系統的 —個實施方案的橫截面視圖和放大橫截面視圓。 第11圖是具有加熱器和該加熱器上的中間層的密封系 统的一個實施方案的橫截面視圖。 、 第12圖是接頭結構的核心上具有微型加熱器的密封系 统的-個實施方案的橫截面視圖’該接頭結構包含基材材 料和微型加熱器上的中間層。 66 1322734 第13圖是具有微型加熱器的密封系統的一個實施方案 的橫截面視圖,該微型加熱器與連接表面材料直接接觸。 第14圖是接頭結構的核心上具有微型加熱器的密封系 統的一個實施方案的橫截面視圖,該接頭結構包含基材材 料並與連接表面材料直接接觸。 第15圖是具有Nitinol夾具的密封系統的一個實施方案 的透視圖。 第16 A - C圖是具有釺料夾具的密封系統的一個實施方 案的橫截面視圖,顯示了組裝的步驟。 第17圖是具有冷焊夾具和壓制封接材料的密封系統的 一個實施方案的橫截面視圖。 第18圖是包括存儲槽陣列的器件的一個實施方案的橫 截面視圖,利用具有凸榫和凹槽接頭設計的壓制冷焊工藝 將這些存儲槽各自獨立密封。其中限定有存儲槽的器件的 主體包括兩個基材部分,這兩個部分也利用具有凸榫和凹 槽接頭設計的壓制冷焊工藝密封在一起。 第19圖是一個器件的實施方案的透視圖,該器件包括 存儲槽陣列並且具有利用壓制冷焊工藝用於單獨密封存儲 槽的接頭設計。 第20圖是具有不同聚合物接頭結構的密封系統的三個 實施方案的橫裁面視圖,該接頭結構鍍有金屬連接表面。 第21圖是多存儲槽包容器件的實施方案的橫截面視 圖,顯示了通過壓制冷焊工藝對存儲槽的密封。 第22圖是封接結構的一個實施方案的橫截面視圖,該 67 1322734 結構使用結合的“夾層”結構來保護不受壓制結合力的中間 基材。 第23圖是零件的一個實施方案在結合之前的橫截面視 圖,該零件用於通過這裏所述的壓制冷焊形成電導通連接。 第24A-B圖是通過這裏所述的壓制冷焊製成的電子線 路連接的透視圖。第24A圖顯示了連接之前的零件,而第 24B圖顯示了連接的元件。 第25圖是零件的一個實施方案在結合之前的透視橫截 面視圖,該零件通過壓制冷焊形成電導通連接。 第26圖是通過壓制冷焊製成的電導通連接的一個實施 方案的圖。該示圖顯示了開口和凸齒之間的材料交疊。 第27A-B圖是兩個矽基材的掃描電子顯微照片 (SEM),該基材具有用於壓制冷焊的微加工封接部件。 【主要元件符號說明】 10…密封系統 36…第二接頭結構 12…第一基材 38a,38b…金屬連接表面 14…第二基材 40…第一接頭結構 16…第一接頭結構 42a, 42b…金屬連接表面 18…第一連接表面 50…密封系統 20a,20b…第二接頭結構 52···第一基材 22…第二連接表面 54…第二基材 30…密封系統 58…第一接頭表面 32…第一基材 62…第二接頭表面 34…第二基材 70…密封系統 68 1322734Example 3: An array of microfabricated cavities with separate sealing members provides two ♦ substrates that are fabricated with complementary cavities and sealing features for pressure cold welding. The sealing member includes ridges that are microfabricated on/in a substrate, and mating grooves that are microfabricated onto/in another substrate ◦ inside each groove and inside the ridges H wide cavity. Figure 27A B shows the resulting substrate and sealing member. The disclosure cited herein is incorporated by reference. The improvements and variations of the methods and devices described in the Detailed Description of the Invention are intended to be within the scope of the appended claims. [figure is simple] The fi map is a side view of the sealing system of a sealing system designed with a tenon and groove joint structure, which provides a seal formed by a pressure cold welding process. Figure 2 is a front elevational view of another embodiment of a sealing system having a tenon and groove joint design that provides a seal. The figure on the left shows the structure before the press-cooling welding is applied, and the figure on the right shows the seal formed after the press-welding process. A scanning electron micrograph of Fig. 3 shows a cross section of the seal formed by the sealing/shear pressure welding process shown in Fig. 2. = Figure is a cross-sectional view of a sealing system with a joint design designed to have a single cold at each joint structure. The metal preform can be (10) pressure cooled and welded in the joint structure. A cross-sectional view of one embodiment of the sealing system of the preform. Figure 6 is a cross-sectional view of another embodiment of a sealing system having a metal preform that can be cooled and welded between the joint structures. Figure 7 is a plan view of five different embodiments of the bottom geometry of the joint structure. Figure 8 is a plan view and cross-sectional view of six different embodiments of a joint structure design that can be used to form a seal by compression and cooling. Figure 9 is a cross-sectional view of four embodiments of a sealing system formed using different combinations of joint construction designs shown in Figure 8. Figure 1 is a cross-sectional view and an enlarged cross-sectional view of an embodiment of a sealing system having a tenon and groove joint design. Figure 11 is a cross-sectional view of one embodiment of a sealing system having a heater and an intermediate layer on the heater. Figure 12 is a cross-sectional view of an embodiment of a sealing system having a micro-heater on the core of the joint structure. The joint structure comprises an intermediate layer on the substrate material and the micro-heater. 66 1322734 Figure 13 is a cross-sectional view of one embodiment of a sealing system with a micro-heater in direct contact with the joining surface material. Figure 14 is a cross-sectional view of one embodiment of a sealing system having a micro-heater on the core of the joint structure, the joint structure comprising a substrate material and in direct contact with the joining surface material. Figure 15 is a perspective view of one embodiment of a sealing system with a Nitinol clamp. Figures 16A-C are cross-sectional views of one embodiment of a sealing system with a gripper showing the steps of assembly. Figure 17 is a cross-sectional view of one embodiment of a sealing system having a cold weld jig and a press seal material. Figure 18 is a cross-sectional view of one embodiment of a device including a memory cell array that is individually sealed by a pressure-cooled soldering process with a male and female joint design. The body of the device in which the reservoir is defined includes two substrate portions which are also sealed together by a pressure-cooled welding process having a male and female joint design. Figure 19 is a perspective view of an embodiment of a device that includes an array of memory cells and has a joint design that utilizes a pressure-cooled soldering process to separately seal the storage slots. Figure 20 is a cross-sectional view of three embodiments of a sealing system having different polymer joint structures plated with a metal joining surface. Figure 21 is a cross-sectional view of an embodiment of a multiple storage tank container member showing the sealing of the storage tank by a pressure cooling process. Figure 22 is a cross-sectional view of one embodiment of a sealing structure that uses a bonded "sandwich" structure to protect the intermediate substrate from compression bonding. Figure 23 is a cross-sectional view of an embodiment of the part prior to joining for forming an electrical continuity connection by compression welding as described herein. Figures 24A-B are perspective views of the electronic circuit connections made by the compression-cooled welding described herein. Figure 24A shows the parts before the connection, while Figure 24B shows the connected components. Figure 25 is a perspective cross-sectional view of one embodiment of the part prior to joining, the part being electrically connected by pressure to form an electrical connection. Figure 26 is a diagram of one embodiment of an electrical continuity connection made by pressure refrigeration welding. This diagram shows the material overlap between the opening and the convex teeth. Figures 27A-B are scanning electron micrographs (SEM) of two tantalum substrates having micromachined sealing members for pressure refrigeration welding. [Main component symbol description] 10...sealing system 36...second joint structure 12...first base material 38a,38b...metal joint surface 14...second base material 40...first joint structure 16...first joint structure 42a, 42b ...metal connection surface 18...first connection surface 50...seal system 20a,20b...second joint structure 52···first substrate 22...second connection surface 54...second substrate 30...sealing system 58...first Joint surface 32...first substrate 62...second joint surface 34...second substrate 70...sealing system 68 1322734
72…第一基材 74···第二基材 76a,76b…第一接頭結構 78,82···連接表面 80a, 80b…接頭結構 84…金屬預制件 90…密封系統 92···第一基材 94…第二基材 96…第一接頭結構 98…第一金屬連接表面 100…第二接頭結構 102…第二金屬連接表面 104…金屬預制件 110…圓形 112…橢圓形 114···半球形 116…正方形 118···六邊形 120…接頭結構設計 122,130.··基材 124a,124b,132…接頭結構 126,134…連接表面 128,136,148,156···接頭結構設 計 138…透明基材 140···凸榫接頭結構 142…接頭結構設計 146…連接表面 150…基材 152…接頭結構 154…連接表面 158…基材 160a,160b…接頭結構部件 170···密封系統 172···密封系統 174···密封系統 176···密封系統 180…密封系統 182a,182b,184…接頭結構 186···凹槽深度 187···凹槽寬度 188…凸榫寬度 190···凹榫高度 200··.密封系統 210…第一基材 212···第二基材 216···連接表面 69 1322734 218…加熱器 286…加熱器板 220…中間層 288…加熱器 222…連接表面材料 290…密封系統 230…密封系統 292,294…基材 232···第二基材 296a,296b…第一接頭結構 233…結構核心 300…加熱器 234…加熱器 302…中間層 236···中間層 304…連接表面材料 238···連接表面材料 306…壓制封接材料 240…密封系統 310…密封器件陣列 242,··第二基材 312…有源層 244,254…加熱器 314…無源層 246···連接表面材料 316…有源層 250···密封系統 318…介電層 252··.第二基材 320…感測器 256…連接表面材料 322…金電子迹線層 270···密封系統 324…凸榫接頭結構 272···第一基材 326…第二凸榫接頭結構 274···第二基材 328…存儲槽蓋 276…柱 332…有源層 278…釺料 334…無源層 280···第二接頭結構 336…有源層 282···凹槽接頭結構 340…密封系統 284…塾 346,350,366,370,382 …接頭結 70 132273472...first substrate 74···second substrate 76a, 76b...first joint structure 78,82···connection surface 80a, 80b...joint structure 84...metal preform 90...sealing system 92··· a substrate 94...a second substrate 96...a first joint structure 98...a first metal joint surface 100...a second joint structure 102...a second metal joint surface 104...a metal preform 110...a circular 112...elliptical 114· · Hemispherical 116... Square 118···hexagon 120... Joint structure design 122, 130.················· ··· 榫 榫 结构 142 接头 接头 接头 接头 接头 连接 连接 连接 连接 连接 连接 连接 连接 连接 连接 连接 连接 连接 连接 连接 连接 连接 连接 连接 连接 连接 连接 连接 连接 连接 连接 连接 ... ... ... ... ... ... ... ... ... ... ... ... ... ... ... ... ... ... ... ... ... ... ... ... ... System 174··· Sealing system 176··· Sealing system 180... Sealing system 182a, 182b, 184... Joint structure 186··· Groove depth 187··· Groove width 188... Convex width 190··· Height 200··. Sealing system 210...first substrate 2 12···Second substrate 216···Connection surface 69 1322734 218...Heater 286...Heater plate 220...intermediate layer 288...heater 222...connection surface material 290...sealing system 230...sealing system 292,294...substrate 232···second substrate 296a,296b...first joint structure 233...structure core 300...heater 234...heater 302...intermediate layer 236···intermediate layer 304...joining surface material 238···connection surface material 306...pressing sealing material 240...sealing system 310...sealing device array 242,·second substrate 312...active layer 244,254...heater 314...passive layer 246···connection surface material 316...active layer 250 Sealing System 318... Dielectric Layer 252··. Second Substrate 320... Detector 256... Connection Surface Material 322... Gold Electronic Trace Layer 270··· Sealing System 324... Convex Joint Structure 272·· First substrate 326...second ridge joint structure 274···second substrate 328...storage cover 276...column 332...active layer 278...dip 334...passive layer 280···second joint Structure 336...Active Layer 282···Groove Joint Structure 340 Sook 346,350,366,370,382 sealing system 284 ... 701,322,734 ... joint junction
構 508…感測器 348,352,368,372,383,388,392 … 510…接頭結構 金屬連接表面 512…存儲槽蓋/開口 360···密封系統 600…電導通連接 380…密封系統 602…第一金屬層 382···聚合物預制件 604…第一表面 383…表面 605…凸齒 401···正面 606…第二金屬層 402···器件基材 607…導通孔 403…背面 608…表面 404…存儲槽 609,618…基材 406···内容物 610…封接結構 408…存儲槽蓋 612…連接表面 410···封接基材 614…第二連接表面 412a, 412b…凹槽接頭結構 616,618…基材 414…凸榫接頭結構 700…電線連接 500…封接器件 702a,702b…導電引線 502···下基材 704a,704b…迹線 504…上基材 706…基材 505…空腔 708a,708b···寬度 506···感測器基材 710a,710b…封接部件 71508...sensor 348,352,368,372,383,388,392 ... 510... joint structure metal connection surface 512... storage slot cover/opening 360... sealing system 600... electrical conduction connection 380... sealing system 602... first metal layer 382···polymer prefabrication 604...first surface 383...surface 605...protrusion 401···front surface 606...second metal layer 402··device substrate 607...via 403...back surface 608...surface 404...storage groove 609,618...substrate 406 The contents 610...the sealing structure 408...the storage slot cover 612...the connection surface 410···the sealing substrate 614...the second connection surface 412a, 412b...the groove joint structure 616,618...the substrate 414...the tongue joint Structure 700...wire connection 500...sealing device 702a,702b...conductive lead 502···lower substrate 704a,704b...trace 504...upper substrate 706...substrate 505...cavity 708a,708b···width 506 ··· sensor substrate 710a, 710b... sealing member 71
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|---|---|---|---|
| US11/267,541 US8191756B2 (en) | 2004-11-04 | 2005-11-04 | Hermetically sealing using a cold welded tongue and groove structure |
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