TWI398193B - Induktionsheizspule und verfahren zum schmelzen von granulat aus halbleitermaterial - Google Patents
Induktionsheizspule und verfahren zum schmelzen von granulat aus halbleitermaterial Download PDFInfo
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- TWI398193B TWI398193B TW098103837A TW98103837A TWI398193B TW I398193 B TWI398193 B TW I398193B TW 098103837 A TW098103837 A TW 098103837A TW 98103837 A TW98103837 A TW 98103837A TW I398193 B TWI398193 B TW I398193B
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- 238000010438 heat treatment Methods 0.000 claims description 30
- 230000006698 induction Effects 0.000 claims description 25
- 239000000155 melt Substances 0.000 claims description 17
- 239000004065 semiconductor Substances 0.000 claims description 17
- 239000002245 particle Substances 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 15
- 238000001816 cooling Methods 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 9
- 238000002844 melting Methods 0.000 claims description 7
- 230000008018 melting Effects 0.000 claims description 7
- 239000002826 coolant Substances 0.000 claims description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims 1
- 229910052707 ruthenium Inorganic materials 0.000 claims 1
- 239000013078 crystal Substances 0.000 description 15
- 230000005855 radiation Effects 0.000 description 3
- 230000005672 electromagnetic field Effects 0.000 description 2
- 239000008187 granular material Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005476 soldering Methods 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- 229910052747 lanthanoid Inorganic materials 0.000 description 1
- 150000002602 lanthanoids Chemical class 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/02—Induction heating
- H05B6/10—Induction heating apparatus, other than furnaces, for specific applications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/16—Heating of the molten zone
- C30B13/20—Heating of the molten zone by induction, e.g. hot wire technique
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/001—Continuous growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/003—Heating or cooling of the melt or the crystallised material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/02—Induction heating
- H05B6/36—Coil arrangements
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- General Induction Heating (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Silicon Compounds (AREA)
Description
本發明係關於一種感應加熱線圈及一種在一具有出口管道之板上熔化由半導體材料所組成之顆粒之方法。根據DE 102 04 178 A1,為了能夠以顆粒作為原料來生產半導體材料之單晶體,需要此類型之感應加熱線圈。The present invention relates to an induction heating coil and a method of melting particles composed of a semiconductor material on a plate having an outlet conduit. According to DE 102 04 178 A1, an induction heating coil of this type is required in order to be able to produce a single crystal of a semiconductor material from particles.
第4圖所示為在生產單晶體過程之裝置中,一種已知的感應加熱線圈。在感應加熱線圈的幫助下,熔化的顆粒流過板中心之開口,形成變為熔化物的半導體材料之漏斗形薄膜。熔化物形成一熔化池(reservoir),透過一牽引線圈的控制而在一單晶體上結晶且同時增加其體積。對於沒有任何干擾之晶體生長過程而言,尤其是對於薄膜和鄰接之熔化物而言,維持液體狀態是重要的。提供一種輻射加熱系統以避免薄膜和熔化物不受控制地凝固。然而,此種幅射加熱系統既複雜且因為碰撞在薄膜上的大部分輻射均被反射而不是很有效,從而仍是無效的。此外,由於輻射之各自入射角度明顯不同,故無法均勻地加熱薄膜和熔化物。Figure 4 shows a known induction heating coil in a device for producing a single crystal process. With the aid of the induction heating coil, the molten particles flow through the opening in the center of the plate to form a funnel-shaped film of semiconductor material that becomes molten. The melt forms a reservoir that crystallizes on a single crystal and simultaneously increases its volume through the control of a traction coil. Maintaining a liquid state is important for crystal growth processes without any interference, especially for films and adjacent melts. A radiant heating system is provided to avoid uncontrolled solidification of the film and melt. However, such a radiation heating system is both complicated and is not very effective because most of the radiation impinging on the film is reflected, so that it is still ineffective. In addition, since the respective incident angles of the radiation are significantly different, the film and the melt cannot be uniformly heated.
本發明之目的在於更簡單且更有效地達到薄膜和鄰接熔化物之均勻加熱。It is an object of the present invention to achieve a uniform heating of the film and adjacent melts more simply and efficiently.
本發明係關於一種用於在一具有出口管道之板上熔化由半導體材料所組成之顆粒的感應加熱線圈,該加熱線圈包含一具有導流槽之線圈主體,該線圈主體具有一上側面及一下側面且在該線圈主體位於其中心外側之區域中具有一顆粒通道開口;以及突出於該線圈主體之下側中心之載流部分,該等載流部分係透過下端之一網狀物而導電性連接。The present invention relates to an induction heating coil for melting particles composed of a semiconductor material on a plate having an outlet pipe, the heating coil comprising a coil body having a flow guiding groove, the coil body having an upper side and a lower a side of the side of the coil body having a particle passage opening in a region outside the center of the coil; and a current-carrying portion projecting from a center of a lower side of the coil body, the current-carrying portions passing through a mesh of the lower end and being electrically conductive connection.
本發明亦關於一種在一具有出口管道之板上藉助於一感應加熱線圈來熔化由半導體材料所組成之顆粒之方法,包含形成一熔融半導體材料之薄膜,該薄膜使該出口管道濕潤;以及形成一被該薄膜圍繞之具有自由表面之半導體材料的熔化物,其中該薄膜和該熔化物係於該自由表面的區域處,藉助於載流部分而被加熱,該等載流部分係突出於該感應加熱線圈之下側中心且透過下端之一網狀物而導電性連接。The invention also relates to a method of melting particles composed of a semiconductor material by means of an induction heating coil on a plate having an outlet conduit, comprising forming a film of molten semiconductor material which wets the outlet conduit; a melt of a semiconductor material having a free surface surrounded by the film, wherein the film and the melt are tied to the region of the free surface, heated by means of a current carrying portion, the current carrying portions protruding from the The center of the lower side of the induction heating coil is electrically connected through a mesh of the lower end.
根據本發明,用於熔化顆粒之感應加熱線圈亦可用於感應加熱該薄膜和該熔化物之鄰接上部區域且維持其處於液體狀態。此可實現確保一連續且可控制之熔化物從該板流向該單晶體之目的。為此目的,該線圈主體具有突出於該線圈主體之下側中心之載流部分(current-carrying segments),該等載流部分伸入一由朝向該側面之半導體材料薄膜和位於底部處之熔化物所界定的通道中。該等載流部分較佳係經設置,以使該薄膜和該熔化物之感應加熱在被該薄膜包圍之熔化物的自由表面區域是特別有效的。以將通道的體積幾乎完全由該等載流部分填滿為基礎之該等載流部分的形狀,尤其較佳。因此,該等載流部分係成型為例如兩個載流部分,該兩載流部分係形成一截錐形狀且透過其下端之一網狀物而互相導電性連接。In accordance with the present invention, an induction heating coil for melting particles can also be used to inductively heat the film and the adjacent upper region of the melt and maintain it in a liquid state. This makes it possible to ensure that a continuous and controllable melt flows from the plate to the single crystal. For this purpose, the coil body has current-carrying segments protruding from the center of the lower side of the coil body, the current-carrying portions projecting into a film of semiconductor material facing the side and melting at the bottom In the channel defined by the object. The current carrying portions are preferably arranged such that induction heating of the film and the melt is particularly effective in the free surface area of the melt surrounded by the film. The shape of the current-carrying portions based on filling the volume of the channel almost completely by the current-carrying portions is particularly preferred. Therefore, the current-carrying portions are formed, for example, into two current-carrying portions which are formed in a truncated cone shape and are electrically connected to each other through a mesh at the lower end thereof.
以下將藉助於圖式來更詳細闡述本發明之此特徵及其他特徵。感應加熱線圈係透過以下方式而形成的:射頻電流係實質上流經線圈主體1和載流部分2(第2圖和第3圖)。該些載流部分2係透過其下端之一薄的網狀物3而彼此導電性連接。線圈主體1具有徑向導流槽4,徑向導流槽4可抑制電流從曲向路徑上流經線圈主體1。路徑係從位於線圈主體1之邊緣處的線圈連接件5,通向位於線圈中心的載流部分2,通過該些載流部分2並通過線圈主體1,再回到線圈連接件5。以此方式可確保板9表面的所有區域皆被電磁場均勻地覆蓋,電磁場在該些區域所感應產生的電流可將顆粒13熔化並維持該熔融狀態。This and other features of the present invention will be described in more detail below with the aid of the drawings. The induction heating coil is formed by the fact that the RF current flows substantially through the coil body 1 and the current carrying portion 2 (Figs. 2 and 3). The current-carrying portions 2 are electrically connected to each other through a thin mesh 3 at the lower end thereof. The coil main body 1 has a radial flow guiding groove 4 that suppresses a current from flowing through the coil main body 1 from the meandering path. The path is from the coil connector 5 at the edge of the coil body 1 to the current-carrying portion 2 at the center of the coil, passes through the carrier portion 2 and passes through the coil body 1, and returns to the coil connector 5. In this way it is ensured that all areas of the surface of the panel 9 are uniformly covered by an electromagnetic field in which the electromagnetic field induced current can melt the particles 13 and maintain the molten state.
線圈主體1在其外部區域中具有至少一個通道開口6,以將由半導體材料所組成之顆粒輸送到旋轉板9上。通道開口6較佳係由一個導流槽4所形成,該導流槽4係為此目的而部分地被加寬。感應加熱線圈還進一步配備有冷卻系統,該冷卻系統包含一位於線圈主體1內之冷卻通道7,冷卻劑(例如水)在其中流動。 再者,為了加強冷卻載流部分2,係使冷卻通道7通向該些載流部分2且透過管橋8而互相連接。管橋8延伸到達線圈主體1上側面之中心以及遠至該些載流部分2,且透過例如焊料焊接或直接焊接而連接於其上。管橋8是單纏繞或多重纏繞的,以使其具有足夠高的感應。射頻電流因此而實質上流經連接該些載流部分2的網狀物3,而非流經管橋8。藉助於電流流動,在網狀物3的區域內之場線強度特別高,且在生產單晶體10的過程中與網狀物3直接相對之熔化物的感應加熱是特別有效的。熔化物和網狀物3較佳係處於相同的電位,尤其較佳係接地電位。The coil body 1 has at least one passage opening 6 in its outer region to convey particles composed of a semiconductor material onto the rotating plate 9. The passage opening 6 is preferably formed by a flow guiding groove 4 which is partially widened for this purpose. The induction heating coil is further equipped with a cooling system comprising a cooling passage 7 in the coil body 1 in which a coolant (e.g., water) flows . Further, in order to strengthen the cooling current-carrying portion 2, the cooling passages 7 are led to the current-carrying portions 2 and are connected to each other through the tube bridge 8. The tube bridge 8 extends to the center of the upper side of the coil body 1 and as far as the current carrying portions 2, and is connected thereto by, for example, soldering or direct soldering. The tube bridge 8 is single-wound or multi-wound so that it has a sufficiently high induction. The RF current thus flows substantially through the mesh 3 connecting the current carrying portions 2, rather than through the tube bridge 8. By means of the current flow, the intensity of the field lines in the region of the mesh 3 is particularly high, and the induction heating of the melt directly opposite the mesh 3 during the production of the single crystal 10 is particularly effective. The melt and the web 3 are preferably at the same potential, particularly preferably at ground potential.
第1圖所示為在生產單晶體10的過程中,感應加熱線圈和板9的較佳相關設置。載流部分2形成一截錐體且幾乎延伸到達網狀物3區域中之熔化物。從板9的出口管道11流出之熔融半導體材料之薄膜12係包圍住一通道,該通道的體積幾乎完全被該等載流部分2填滿。較佳地,該等載流部分2之外表面的傾斜角度和出口管道11之內表面的傾斜角度相同。從板9到熔化物之熔融半導體材料的連續流動,可透過截錐體而額外地改善,將該截錐體以稍微不對稱之方式放置於通道內且因此使一側面被更好地加熱。因此,當只需要小的熔化物流(melt flow)時,可在生長過程一開始便形成一特定的(defined)封閉熔化物路徑。Figure 1 shows a preferred arrangement of the induction heating coil and plate 9 during the production of the single crystal 10. The current-carrying portion 2 forms a frustum and extends almost to the melt in the region of the mesh 3. The film 12 of molten semiconducting material flowing out of the outlet duct 11 of the plate 9 encloses a passage whose volume is almost completely filled by the current-carrying portions 2. Preferably, the inclination angle of the outer surface of the current-carrying portion 2 is the same as the inclination angle of the inner surface of the outlet duct 11. The continuous flow of molten semiconductor material from the plate 9 to the melt can be additionally improved by the truncated cone, which is placed in the channel in a slightly asymmetrical manner and thus a side is better heated. Thus, when only a small melt flow is required, a defined closed melt path can be formed at the beginning of the growth process.
板9較佳係由與顆粒13相同之半導體材料所組成,並較佳係以與DE 102 04 178 A1中描述之容器類似的方式予以體現,該專利內容特別併於本文以供參考。然而,尤其是如果是用於熔化顆粒以生成具有相對較小直徑之單晶體時,亦可以具有一中心出口管道之簡單平板予以體現。元件符號14係代表一漏斗狀物,顆粒13係傳送到該漏斗狀物14中。The plate 9 is preferably composed of the same semiconductor material as the particles 13, and is preferably embodied in a similar manner to the container described in DE 102 04 178 A1, the disclosure of which is incorporated herein by reference. However, especially if it is used to melt particles to form a single crystal having a relatively small diameter, it can also be embodied as a simple plate having a central outlet pipe. The component symbol 14 represents a funnel into which the particles 13 are transferred.
本發明較佳係用於製造由矽所組成之單晶體。從單晶體所切割出之半導體晶圓係適於製造例如太陽能電池或電子元件,例如功率電晶體和閘流體(thyristor)。The invention is preferably used to make a single crystal composed of tantalum. Semiconductor wafers cut from a single crystal are suitable for fabricating, for example, solar cells or electronic components such as power transistors and thyristors.
使用根據第1圖安置中之根據本發明的感應加熱線圈,可製造由矽所組成之單晶體且毋須對通道和鄰接的熔化物提供輻射加熱系統。由於矽係在薄膜內或熔化物的鄰接區域內結晶,受拉生長之單晶體是無位錯(free of dislocation)且無產量損失。Using the induction heating coil according to the invention as set forth in Figure 1, a single crystal of tantalum can be fabricated without the need to provide a radiant heating system for the channel and adjacent melt. Since the lanthanide crystallizes within the film or in the contiguous region of the melt, the single crystal grown by the pull is free of dislocation and has no yield loss.
1...線圈主體1. . . Coil body
2...載流部分2. . . Current carrying part
3...網狀物3. . . Mesh
4...導流槽4. . . Guide groove
5...線圈連接件5. . . Coil connector
6...通道開口6. . . Channel opening
7...冷卻通道7. . . Cooling channel
8...管橋8. . . Pipe bridge
9...板9. . . board
10...單晶體10. . . Single crystal
11...出口管道11. . . Export pipeline
12...薄膜12. . . film
13...顆粒13. . . Granule
14...漏斗狀物14. . . Funnel
第1圖所示為在生產單晶體過程之裝置中,根據本發明之一較佳實施態樣之感應加熱線圈,其係一概要性之縱向剖面圖;1 is a schematic longitudinal cross-sectional view of an induction heating coil in accordance with a preferred embodiment of the present invention in a device for producing a single crystal process;
第2圖和第3圖所示為感應加熱線圈之平面圖和剖面圖;以及Figures 2 and 3 show a plan view and a cross-sectional view of the induction heating coil;
第4圖所示為對應於第1圖之既有技術的剖面圖。Fig. 4 is a cross-sectional view showing the prior art corresponding to Fig. 1.
1...線圈主體1. . . Coil body
2...載流部分2. . . Current carrying part
3...網狀物3. . . Mesh
5...線圈連接件5. . . Coil connector
6...通道開口6. . . Channel opening
7...冷卻通道7. . . Cooling channel
8...管橋8. . . Pipe bridge
9...板9. . . board
10...單晶體10. . . Single crystal
11...出口管道11. . . Export pipeline
12...薄膜12. . . film
13...顆粒13. . . Granule
14...漏斗狀物14. . . Funnel
Claims (9)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102008013326A DE102008013326B4 (en) | 2008-03-10 | 2008-03-10 | Induction heating coil and method for melting granules of semiconductor material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200939891A TW200939891A (en) | 2009-09-16 |
| TWI398193B true TWI398193B (en) | 2013-06-01 |
Family
ID=40952876
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW098103837A TWI398193B (en) | 2008-03-10 | 2009-02-06 | Induktionsheizspule und verfahren zum schmelzen von granulat aus halbleitermaterial |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US9084296B2 (en) |
| JP (1) | JP5227854B2 (en) |
| KR (1) | KR100999476B1 (en) |
| CN (1) | CN101532171B (en) |
| DE (1) | DE102008013326B4 (en) |
| DK (1) | DK176877B1 (en) |
| SG (1) | SG155827A1 (en) |
| TW (1) | TWI398193B (en) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102009051010B4 (en) | 2009-10-28 | 2012-02-23 | Siltronic Ag | Device for producing a single crystal of silicon by remelting of granules |
| DE102009052745A1 (en) | 2009-11-11 | 2011-05-12 | Siltronic Ag | Process for producing a single crystal of silicon by remelting granules |
| DE102010006724B4 (en) * | 2010-02-03 | 2012-05-16 | Siltronic Ag | A method of producing a single crystal of silicon using molten granules |
| JP5886831B2 (en) * | 2010-04-13 | 2016-03-16 | シュミット シリコン テクノロジー ゲゼルシャフト ミット ベシュレンクテル ハフツング | Generation of single crystal semiconductor materials |
| JP2012046381A (en) * | 2010-08-27 | 2012-03-08 | Sumitomo Chemical Co Ltd | Method for producing resin-coated granular fertilizer |
| DE102014207149A1 (en) * | 2014-04-14 | 2015-10-29 | Siltronic Ag | Apparatus and method for producing a single crystal of silicon |
| DE102014210936B3 (en) * | 2014-06-06 | 2015-10-22 | Siltronic Ag | Apparatus and method for producing a crystal of semiconductor material |
| DE102014226419A1 (en) * | 2014-12-18 | 2016-06-23 | Siltronic Ag | A method of growing a single crystal by crystallizing the single crystal from a flow zone |
| CN116288650B (en) * | 2023-05-24 | 2023-08-29 | 苏州晨晖智能设备有限公司 | Silicon single crystal growth apparatus and growth method using granular silicon as raw material |
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| US20030145781A1 (en) * | 2002-02-01 | 2003-08-07 | Wacker Siltronic Ag | Process and apparatus for producing a single crystal of semiconductor material |
| CN101006205A (en) * | 2004-06-18 | 2007-07-25 | Memc电子材料有限公司 | Melter assembly and method for charging a crystal forming apparatus with molten source material |
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| US4157373A (en) * | 1972-04-26 | 1979-06-05 | Rca Corporation | Apparatus for the production of ribbon shaped crystals |
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| DE3625669A1 (en) * | 1986-07-29 | 1988-02-04 | Siemens Ag | INDUCTION HEATER FOR POT-FREE ZONE MELTING |
| JPS6448391A (en) * | 1987-04-27 | 1989-02-22 | Shinetsu Handotai Kk | Single winding induction heating coil used in floating zone melting method |
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| JP2759604B2 (en) * | 1993-10-21 | 1998-05-28 | 信越半導体株式会社 | Induction heating coil |
| JP2754163B2 (en) * | 1994-05-31 | 1998-05-20 | 信越半導体株式会社 | High frequency induction heating coil |
| RU2191228C1 (en) * | 2001-04-20 | 2002-10-20 | Федеральное государственное унитарное предприятие "Конструкторское бюро общего машиностроения им. В.П.Бармина" | Apparatus for melting and crystallizing materials |
| KR100588425B1 (en) * | 2003-03-27 | 2006-06-12 | 실트로닉 아게 | Method for the Production of a Silicon Single Crystal, Silicon Single Crystal and Silicon Semiconductor Wafers with determined Defect Distributions |
| US7465351B2 (en) * | 2004-06-18 | 2008-12-16 | Memc Electronic Materials, Inc. | Melter assembly and method for charging a crystal forming apparatus with molten source material |
| US7691199B2 (en) * | 2004-06-18 | 2010-04-06 | Memc Electronic Materials, Inc. | Melter assembly and method for charging a crystal forming apparatus with molten source material |
-
2008
- 2008-03-10 DE DE102008013326A patent/DE102008013326B4/en not_active Expired - Fee Related
- 2008-12-17 SG SG200809306-4A patent/SG155827A1/en unknown
- 2008-12-31 KR KR1020080138737A patent/KR100999476B1/en not_active Expired - Fee Related
-
2009
- 2009-01-13 CN CN2009100022404A patent/CN101532171B/en not_active Expired - Fee Related
- 2009-02-06 TW TW098103837A patent/TWI398193B/en not_active IP Right Cessation
- 2009-02-26 US US12/393,154 patent/US9084296B2/en not_active Expired - Fee Related
- 2009-03-10 JP JP2009055941A patent/JP5227854B2/en not_active Expired - Fee Related
- 2009-03-10 DK DKPA200900325A patent/DK176877B1/en not_active IP Right Cessation
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| US4538279A (en) * | 1982-07-16 | 1985-08-27 | Siemens Aktiengesellschaft | Induction coil in the form of a pancake coil for crucible-free zone melting |
| JPH08268792A (en) * | 1995-01-31 | 1996-10-15 | Shin Etsu Handotai Co Ltd | High-frequency induction heater |
| US20030145781A1 (en) * | 2002-02-01 | 2003-08-07 | Wacker Siltronic Ag | Process and apparatus for producing a single crystal of semiconductor material |
| CN101006205A (en) * | 2004-06-18 | 2007-07-25 | Memc电子材料有限公司 | Melter assembly and method for charging a crystal forming apparatus with molten source material |
Also Published As
| Publication number | Publication date |
|---|---|
| US20090223949A1 (en) | 2009-09-10 |
| JP5227854B2 (en) | 2013-07-03 |
| DE102008013326A1 (en) | 2009-09-17 |
| KR20090097097A (en) | 2009-09-15 |
| DK176877B1 (en) | 2010-02-08 |
| CN101532171A (en) | 2009-09-16 |
| KR100999476B1 (en) | 2010-12-09 |
| US9084296B2 (en) | 2015-07-14 |
| CN101532171B (en) | 2012-06-27 |
| DE102008013326B4 (en) | 2013-03-28 |
| SG155827A1 (en) | 2009-10-29 |
| TW200939891A (en) | 2009-09-16 |
| JP2009215159A (en) | 2009-09-24 |
| DK200900325A (en) | 2009-09-11 |
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