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TWI372867B - Methods and apparatus for insitu analysis of gases in electronic device fabrication systems - Google Patents

Methods and apparatus for insitu analysis of gases in electronic device fabrication systems

Info

Publication number
TWI372867B
TWI372867B TW096128087A TW96128087A TWI372867B TW I372867 B TWI372867 B TW I372867B TW 096128087 A TW096128087 A TW 096128087A TW 96128087 A TW96128087 A TW 96128087A TW I372867 B TWI372867 B TW I372867B
Authority
TW
Taiwan
Prior art keywords
gases
methods
electronic device
device fabrication
fabrication systems
Prior art date
Application number
TW096128087A
Other languages
English (en)
Other versions
TW200821580A (en
Inventor
David K Carlson
Satheesh Kuppurao
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of TW200821580A publication Critical patent/TW200821580A/zh
Application granted granted Critical
Publication of TWI372867B publication Critical patent/TWI372867B/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N33/0004—Gaseous mixtures, e.g. polluted air
    • G01N33/0009—General constructional details of gas analysers, e.g. portable test equipment
    • G01N33/0011—Sample conditioning
    • G01N33/0016—Sample conditioning by regulating a physical variable, e.g. pressure or temperature
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N7/00—Analysing materials by measuring the pressure or volume of a gas or vapour
    • G01N7/14—Analysing materials by measuring the pressure or volume of a gas or vapour by allowing the material to emit a gas or vapour, e.g. water vapour, and measuring a pressure or volume difference
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00—Sampling; Preparing specimens for investigation
    • G01N1/02—Devices for withdrawing samples
    • G01N1/22—Devices for withdrawing samples in the gaseous state
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00—Sampling; Preparing specimens for investigation
    • G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G01N1/38—Diluting, dispersing or mixing samples
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/85978—With pump

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Immunology (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Food Science & Technology (AREA)
  • Combustion & Propulsion (AREA)
  • Medicinal Chemistry (AREA)
  • Molecular Biology (AREA)
  • Biomedical Technology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Sampling And Sample Adjustment (AREA)
TW096128087A 2006-07-31 2007-07-31 Methods and apparatus for insitu analysis of gases in electronic device fabrication systems TWI372867B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US82095806P 2006-07-31 2006-07-31

Publications (2)

Publication Number Publication Date
TW200821580A TW200821580A (en) 2008-05-16
TWI372867B true TWI372867B (en) 2012-09-21

Family

ID=38997660

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096128087A TWI372867B (en) 2006-07-31 2007-07-31 Methods and apparatus for insitu analysis of gases in electronic device fabrication systems

Country Status (7)

Country Link
US (3) US7770431B2 (zh)
JP (2) JP5323699B2 (zh)
KR (1) KR101143080B1 (zh)
CN (1) CN101495849B (zh)
DE (1) DE112007001812T5 (zh)
TW (1) TWI372867B (zh)
WO (1) WO2008016569A2 (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7770431B2 (en) * 2006-07-31 2010-08-10 Applied Materials, Inc. Methods and apparatus for insitu analysis of gases in electronic device fabrication systems
JP5562539B2 (ja) * 2008-08-21 2014-07-30 矢崎総業株式会社 濃度測定装置
US8272248B2 (en) * 2010-04-09 2012-09-25 Guenther Mark T Emissions test system and method
CN106896080A (zh) * 2015-12-18 2017-06-27 有研国晶辉新材料有限公司 一种适用于高纯光纤用原材料的红外光谱在线取样检测系统及检测方法

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US4633083A (en) * 1985-04-08 1986-12-30 Washington State University Research Foundation, Inc. Chemical analysis by time dispersive ion spectrometry
EP0579952B2 (de) * 1992-07-09 2000-08-30 Elpatronic Ag Verfahren und Vorrichtung zur Prüfung von Flaschen auf Verunreinigungen
US5703365A (en) 1994-03-25 1997-12-30 Nippon Sanso Corporation Infrared spectroscopic analysis method for gases and device employing the method therein
FR2733319B1 (fr) * 1995-04-21 1997-05-23 Air Liquide Procede et dispositif d'analyse de traces d'impuretes dans un echantillon de gaz au moyen d'une diode laser
US5552600A (en) * 1995-06-07 1996-09-03 Barringer Research Limited Pressure stabilized ion mobility spectrometer
JPH09178656A (ja) * 1995-12-26 1997-07-11 Shimadzu Corp 赤外線ガス分析計
US5880850A (en) 1996-04-18 1999-03-09 American Air Liquide Inc Method and system for sensitive detection of molecular species in a vacuum by harmonic detection spectroscopy
DK173073B1 (da) * 1996-11-01 1999-12-20 Foss Electric As Fremgangsmåde og flowsystem til spektrometri og en kuvette til flowsystemet
JPH10281988A (ja) 1997-04-09 1998-10-23 Nippon Sanso Kk ガス分析方法及びガス分析装置
GB2324906B (en) 1997-04-29 2002-01-09 Masslab Ltd Ion source for a mass analyser and method of providing a source of ions for analysis
US6076392A (en) * 1997-08-18 2000-06-20 Metasensors, Inc. Method and apparatus for real time gas analysis
JP3459564B2 (ja) * 1998-03-11 2003-10-20 日本酸素株式会社 ガスの分光分析装置および分光分析方法
JP3929185B2 (ja) 1998-05-20 2007-06-13 株式会社荏原製作所 真空排気装置及び方法
JPH11350147A (ja) * 1998-06-03 1999-12-21 Canon Inc 堆積膜形成方法及び装置
JP2000009639A (ja) * 1998-06-23 2000-01-14 Horiba Ltd 赤外線ガス分析装置
JP3137953B2 (ja) * 1999-03-30 2001-02-26 科学技術振興事業団 エレクトロスプレー質量分析方法及びその装置
US6351983B1 (en) * 1999-04-12 2002-03-05 The Regents Of The University Of California Portable gas chromatograph mass spectrometer for on-site chemical analyses
US6865926B2 (en) 2000-01-25 2005-03-15 State Of Oregon Acting By And Through The State Board Of Higher Education On Behalf Of Portland State University Method and apparatus for sample analysis
EP1257813A4 (en) * 2000-01-25 2007-05-02 Oregon State METHOD AND APPARATUS FOR CONCENTRATING SAMPLES TO BE ANALYZED
US6604051B1 (en) 2000-04-17 2003-08-05 Southwest Research Institute System and method to determine thermophysical properties of a multi-component gas
JP2002323442A (ja) * 2001-04-25 2002-11-08 Jasco Corp ガスセル
AU2003220019A1 (en) * 2002-03-20 2003-10-08 Tokyo Electron Limited Process monitoring using infrared optical diagnostics
SE524900C2 (sv) * 2002-07-22 2004-10-19 Senseair Ab Gasanalyserande arrangemang
JP2004184409A (ja) * 2002-11-20 2004-07-02 Seiko Epson Corp 半導体装置の製造装置及びガス濃度分析方法
JP3705270B2 (ja) * 2003-01-20 2005-10-12 セイコーエプソン株式会社 赤外吸収測定方法および赤外吸収測定装置、ならびに半導体装置の製造方法
JP3744903B2 (ja) * 2003-01-20 2006-02-15 セイコーエプソン株式会社 赤外吸収測定方法および赤外吸収測定装置、ならびに半導体装置の製造方法
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US7629177B2 (en) 2004-01-21 2009-12-08 Siemens Industry, Inc. Method and apparatus for introduction of high boiling point streams at low temperature
KR20060042741A (ko) * 2004-11-10 2006-05-15 삼성전자주식회사 상압 공정에 이용되는 가스 반응 분석 장치를 위한 샘플가스 공급 시스템
US7770431B2 (en) * 2006-07-31 2010-08-10 Applied Materials, Inc. Methods and apparatus for insitu analysis of gases in electronic device fabrication systems

Also Published As

Publication number Publication date
US7770431B2 (en) 2010-08-10
TW200821580A (en) 2008-05-16
DE112007001812T5 (de) 2009-06-04
CN101495849A (zh) 2009-07-29
JP2013174597A (ja) 2013-09-05
KR20090046850A (ko) 2009-05-11
WO2008016569A2 (en) 2008-02-07
US20080022751A1 (en) 2008-01-31
US8813538B2 (en) 2014-08-26
JP2009545744A (ja) 2009-12-24
US8020427B2 (en) 2011-09-20
CN101495849B (zh) 2013-01-30
JP5323699B2 (ja) 2013-10-23
WO2008016569A3 (en) 2008-03-27
US20120006092A1 (en) 2012-01-12
KR101143080B1 (ko) 2012-05-08
US20100275674A1 (en) 2010-11-04
JP5954739B2 (ja) 2016-07-20

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Legal Events

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MM4A Annulment or lapse of patent due to non-payment of fees