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TWI362906B - Molded interconnect device and fabrication method thereof - Google Patents

Molded interconnect device and fabrication method thereof Download PDF

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Publication number
TWI362906B
TWI362906B TW97151374A TW97151374A TWI362906B TW I362906 B TWI362906 B TW I362906B TW 97151374 A TW97151374 A TW 97151374A TW 97151374 A TW97151374 A TW 97151374A TW I362906 B TWI362906 B TW I362906B
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Taiwan
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interconnect device
molded interconnect
resin
transition metal
group
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TW97151374A
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Chinese (zh)
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TW201026182A (en
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Cheng Hung Yu
Chung Tsao
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Unimicron Technology Corp
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Description

1362906 六、發明說明: 【發明所屬之技術領域】 本發明係有關於一種在塑料表面上形成細線路的方法,特別是 有關於-觀塑喊裝置(mQlded interc_eet⑪如,娜)的製7^ 方法。 、 ®【先前技術】 如熟習該項技藝者所知,模塑内連裝置(m〇ldedime_neet device,MID)係於塑膠射出成型後的塑件機構上,製作出有三維立體 佈線之金屬導線的技術,其整合了機械與電子的功能,倾應用於 手機的fe藏式天線、相機模組、led模組以及汽車工業等。 目前已知有细雷職触卿―et strueturing JDS)_ Φ埋入式細線路或模塑内連裝置’其係利用特殊可雷射活化的塑料或 所謂的LDS麵模塑成一預定的本體結構,然後再利用特定波長的 雷射,將摻入塑料内的金屬催化劑活化,同時定義出導線圖案,最 後再進行金屬化製程。 舉例來說,美國公開專利申請案蕭舰7822即提出類似的以 雷射直接形成電路的方法,其利用混合有氮化叙顆粒的基板中,以 雷射照射燒錄板的表面。雷射除了定義出導電線路的圖案化凹槽 1362906 外,同時活化了氮化鋁的顆粒。當氮氣脫離基板的表面時,會在圖 案化凹槽中留下活化的鋁原子。然後再使用化學電鍍法就可以在 形成活化鋁原子之處進行化學電鍍,形成電路結構。 然而,現行雷射直接成型技術通常要使用特殊的LDS塑料,並 且採用特定波長的IR雷射,且針對不同材f的⑽㈣,必須配 合塑材的特性’摻雜不同成分與濃度的金屬催化劑,造成各塑料的 #可雷射活化的條件不同,必須以不同的雷射參數與金屬化參數來因 應’故其必須購置特定波長之雷射設備,以及設置不同條件的金屬 2設備與錄,造成設備與製程成本柯,且其良率低,使得市場 二拓展此外H射直接成型技術㈣—缺點是由於整塊塑 採用特殊混合有金屬觸媒的LDS塑料射出成型,造成塑料 成本”’且其影響原材料的物性,因制了其應用範圍。 【發明内容】 作二===:_之_連裝_ 含有為mr繼—雜糾枝置㈣作方法,包 3有杈供本體結構;於該本體結構的 ^ 該直接成線輕含有至少—觸 ’、雜成線層, 觸媒活化,並定_—導線 _、2直接成線層内的 次進仃-金屬化製程,例如化 1362906 學沈積或電鍍沉積銅、鎳、金、銀、錫、鈀、鋅、鉻等金屬的方法, 直接於该本體結構的表面上形成一導電線路。 根據本發明之一較佳實施例,本發明提供一種模塑内連裝置, 包含有:一本體結構;一直接成線層,披覆在該本體結構的表面; 以及一導線圖案,設於該直接成線層中。該本體結構選自下述材料 之一:介電材料、陶瓷、金屬及玻璃。其中該介電材料包括高分子 • t合物’例如環氧樹脂、改質之環氧樹脂、聚脂(polyester)、丙烯酸 酯、氟素聚合物(fluoro-polymer)、聚亞苯基氧化物(p〇iyphenyiene oxide)、t 酿亞胺(polyimide)、盼酸·樹脂(phenolicresin)、聚石風1362906 VI. Description of the Invention: [Technical Field of the Invention] The present invention relates to a method for forming a fine line on a plastic surface, and more particularly to a method for forming a device (mQlded interc_eet11, 娜) . , ® [Prior Art] As is known to those skilled in the art, a molded interconnect device (mIDldedime_neet device, MID) is attached to a plastic part after plastic injection molding to produce a metal wire having three-dimensional wiring. Technology, which integrates the functions of machinery and electronics, is applied to the mobile phone's hidden antenna, camera module, led module and the automotive industry. At present, it is known that there is a fine-grained touch-up strueturing JDS) _ Φ embedded fine wire or molded interconnect device 'which is molded into a predetermined body structure by using a special laser-activated plastic or so-called LDS surface. Then, using a laser of a specific wavelength, the metal catalyst incorporated into the plastic is activated, and a wire pattern is defined, and finally a metallization process is performed. For example, U.S. Published Patent Application Xiao Shipu 7822 proposes a similar method of directly forming a circuit by laser, which irradiates the surface of the burn-in board with a laser by using a substrate mixed with nitrided particles. In addition to defining the patterned grooves 1362906 of the conductive traces, the laser activates the particles of aluminum nitride. When nitrogen is removed from the surface of the substrate, activated aluminum atoms are left in the patterned grooves. Then, by electroless plating, chemical plating can be performed at the place where activated aluminum atoms are formed to form a circuit structure. However, current laser direct structuring techniques usually use special LDS plastics and use IR lasers of a specific wavelength, and for different materials f (10) (four), it is necessary to mix the characteristics of plastic materials to dope with different compositions and concentrations of metal catalysts. The conditions for the laser activation of each plastic are different. It is necessary to respond to different laser parameters and metallization parameters. Therefore, it is necessary to purchase laser equipment of a specific wavelength and set up the metal equipment of different conditions. The equipment and process cost are low, and the yield is low, which makes the market two expand. In addition, the H-beam direct molding technology (4)--the disadvantage is that the plastic cost is caused by the injection molding of the LDS plastic with a special mixed metal catalyst. Influencing the physical properties of the raw materials, the scope of its application is made. [Summary of the invention] The second ===: _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The direct structure of the body structure lightly contains at least a touch-contact, a hetero-line layer, a catalyst activation, and a _-wire _, 2 directly into a secondary 仃-metallization process in the line layer, For example, a method of depositing or electroplating a metal such as copper, nickel, gold, silver, tin, palladium, zinc, chromium, etc., directly forms a conductive line on the surface of the body structure. According to a preferred embodiment of the present invention The present invention provides a molded interconnect device comprising: a body structure; a direct line layer covering the surface of the body structure; and a wire pattern disposed in the direct wire layer. It is selected from one of the following materials: dielectric materials, ceramics, metals, and glass, wherein the dielectric material includes a polymer compound such as an epoxy resin, a modified epoxy resin, a polyester, and an acrylic resin. Ester, fluoro-polymer, p〇iyphenyiene oxide, polyimide, phenolic resin, polychlorite

(polysulfone)、矽素聚合物(silicone p〇iymer)、bt 樹脂(bismaleimide triazine modified epoxy)、氰酸聚酯(cyanate ester)、聚乙烯 (polyethylene)、聚碳酸酯樹脂(p〇lyCarb〇nate,PC)、丙烯-丁二烯-苯乙 稀共聚合物(acrylonitrile-butadiene-styrene copolymer,ABS copolymer)、聚對笨二曱酸乙二酯(polyethylene terephthalate,PET)樹 鲁脂、聚對苯二甲酸丁二酯(polybutylene terephthalate,PBT)樹脂、液 晶高分子(liquid crystal polymers,LCP)、聚醯胺 6(polyamide 6, PA 6)、尼龍(^1〇11)、共聚聚曱酸(卩〇1乂〇\丫11^115^116,?〇]\4)、聚笨硫喊 (polyphenylene sulfide,PPS)及環狀烯烴共聚高分子(cyclic olefin copolymer, COC)等,或其彼此混合的群組。 為讓本發明之上述目的、特徵、和優點能更明顯易懂,下文特 舉較佳實施方式,並配合所附圖式,作詳細說明如下。然而如下之 5 1362906 較佳實知方式與圖式僅供參考與說明用,並非用來對本發明加以限 制者。 【實施方式】 >月 > 閱第1圖至第4圖,其為依據本發明—較佳實施例所緣示 的模塑^連裝置的製作方法的示意圖。首先,如第1圖所示,提供 本體、’’。構1〇,其可以是三維立體結構’或者是二維的平板結構。 有關本體結構10可以選自下述材料之一:介電材料、陶究、金屬、 玻璃或其它適合的材料。 在本發明之—實施例中,上述之介電材料包括高分子聚合物。 若本體結構10係由介電材料或塑膠所構成者呵以利用射出成型法 形成二維立體結構4體結構1Q可以是歸與喊之混合物,並利 用模具塑製成型技術製成。若本體結構10為一陶究本體,可利用模 鲁具塑製成型而成。_本體材質例如包括氧化結、氧化紹或添加碳 化鉻之氧化鋁等。 在本發明之-實施例中,上述之高分子聚合物係為選自由環氧 樹脂、改質之環氧樹脂、聚脂(p〇lyester)、丙烯酸酯、氟素聚合物 («〇-1)〇1}^吻、聚亞苯基氧化物(1)〇1_哪1咖收此)、聚醯亞胺 (polyimide) ^ ^^^^l(phenolicresin) > ^^(polysulfone) > 物(silicone polymer)、BT 樹脂(bismaldmide triazine modifled 1362906 epoxy)、氰酸聚酯(cyanate ester)、聚乙稀(polyethylene)、聚碳酸S旨樹 脂(polycarbonate,PC)、丙烯-丁二烯-苯乙烯共聚合物 (acrylonitrile-butadiene-styrene copolymer,ABS copolymer)、聚對苯二 甲酸乙二酯(polyethylene terephthalate, PET)樹脂、聚對苯二曱酸丁二 酯(polybutyleneterephthalate,PBT)樹脂、液晶高分子(liquid crystal polymers, LCP)、聚醯胺 6(polyamide 6, PA 6)、尼龍(Nylon)、共聚聚 甲搭(polyoxymethylene, POM)、聚苯硫醚(polyphenylene sulfide,PPS) 及環狀烯烴共聚高分子(cyclic olefin copolymer,COC)所組成的群 組。根據本發明之較佳實施例,若本體結構10係由介電材料或塑膠 所構成者’則其中不含有金屬或觸媒成分。 如第2圖所示,接著在本體結構10的全部或者部分的表面上彼 覆一直接成線(direct circuit,DC)層12 ’其由一摻雜有觸媒顆粒的可 雷射活化材料所構成。根據本發明之較佳實施例,直接成線層12 的厚度約介於lnm至2mm之間。直接成線層12在經雷射活化之 前,係為一絕緣體。 其中’有關上述之可雷射活化材料,其觸媒顆粒可以包含有配 位化合物’其由中心離子(或原子)和幾個配體分子(或離子)以 配位鍵相結合而形成的複雜分子或離子,通常稱為配位單元。凡是 各有配位單元的化合物都稱作配位化合物’簡稱「配合物」,或稱為 「絡合物」。 7 !3629〇6 在本發明之一實施例中,上述之這些觸媒顆粒包括多個奈米金 屬顆粒。在本發明之一實施例中,上述之這些觸媒顆粒的材質包括 過渡金屬配位化合物。在本發明之一實施例中,上述之這些過渡金 屬配位化合物的材質包括過渡金屬氧化物、過渡金屬氮化物、過渡 金屬錯合物或過渡金屬螯合物。 在本發明之一實施例中,上述之這些過渡金屬錯合物配位化合 鲁物的材質為選自於由鋅(Zn)、銅(Cu)、銀(Ag)、金(Au)、鎳(Ni)、鈀 (Pd)、鈾(Pt)、鈷(Co)、铑(Rh)、銥(Ir)、鐵(Fe)、錳(Μη)、鉻(Cr)、 鎢(W)、釩(V)、鈕(Ta)以及鈦(Ti)所組成的群組。 其中’上述之可雷射活化材料可以是固態或是液態,而其披覆 方式可以是壓印、熱壓印、喷塗、沈浸、旋轉塗佈、網印、轉印、 蒸錢、濺鑛、注塑、植入式射出(insert molding)等塗佈方式。 馨此外,根據本發明之較佳實施例,在進行直接成線層12的塗佈 作業之刖,可以預先對本體結構10的表面進行表面改質的處理,戋 者表面粗化等處理,如模具咬花處理、物理表面粗化、化學表面粗 化、增加SAM(self-assemblymembrane)膜、增加黏著層等等,以捭 加後續塗佈的直接成線層12能夠與本體結構1〇的表面有良好的^ 合特性,而不易剝落或脫層。 如第3圖所示,接著利用波長介於lnm至lmm之間的雷射, ^62906 例如’波長355nm的uv雷射、波長1〇6〇〇nm的 C02雷射或者皮 的IR _,在直接成線層12__ 13,同= 接成線層12 _金屬催化細未示)活化,藉此 :=之凹槽_謝_略等於直接成線層12的^圖如 ^圖中的V^m#13a、13d。當然,前述之凹槽叫剖面不 ^為V字形’前述之凹槽13的深度也可以小於直接成線層η的 旱又,或視需要燒#出不同深度的凹槽,如第5圖中的凹槽既以 及凹槽Ue。值得注意的是,由於t射之能量對直接成線層的作用 不同’較㈣能崎可能無法對直接成_形成簡13 熔融而些微突起。 而口 如第4圖所示,進行一金屬化製程,直接於本體結構1〇的表面 上形成-導電線路14,例如銅導線。前述之金屬化製程可以是化與 銅沈積或是電鍍沉積銅、錄、金、銀、錫,、辞、絡等金屬的: 法或其它適合的金屬化,例如,直接填人導電材料的方式 進行金屬化。根據先前形成在直接成線層12中的不同的凹槽結構, 在金屬化之後也會林同的導線線路結構,如第6圖巾崎^的線 路結構Ma、Mb、MC及⑷,其中線路結構地係嵌入在直接成 線層12中,線路結構14b及14c則是部分嵌入在直接成線廣12中, 部分突出於直接成線層12的表面,線路結構⑷係在凹槽内,並未 突出於直接成線層12的表面。 本發明至少包括以下之優點:⑴可崎用—般塑料作為基材, U62906 僅在表面塗佈可雷射活化材料,故能夠保有原塑料的物性,使得其 應用範圍更廣,·(2)僅表面有可雷射活化的材料,可以降低材料的 成本;⑶此可雷射活化的材料,不再受本體塑材的限制,因此可以 適用於各種波長之㈣’,耐再僅纽於某種特統牌與波長的 雷射活化設備,因此可崎㈣射設備成本;(4)若翻固定的直 接成線層㈣’可使雷射與金屬⑽參數固定料受到本體结構 採用不同塑料材質的影響,因而提高產出與良率。 、’。(polysulfone), silicone p〇iymer, bsaleimide triazine modified epoxy, cyanate ester, polyethylene, polycarbonate resin (p〇lyCarb〇nate, PC), acrylonitrile-butadiene-styrene copolymer (ABS copolymer), polyethylene terephthalate (PET), ruthenium, poly(p-phenylene terephthalate) Polybutylene terephthalate (PBT) resin, liquid crystal polymer (LCP), polyamide 6, PA 6 , nylon (^1〇11), copolymerized polydecanoic acid (卩〇) 1乂〇\丫11^115^116,?〇]\4), polyphenylene sulfide (PPS), cyclic olefin copolymer (COC), etc., or a group thereof group. The above described objects, features, and advantages of the present invention will become more apparent from the following description. However, the following descriptions of the preferred embodiments and the drawings are for the purpose of illustration and description, and are not intended to limit the invention. [Embodiment] >Month> Referring to Figures 1 to 4, there is shown a schematic view of a method of fabricating a molding apparatus according to the present invention. First, as shown in Fig. 1, a body, '' is provided. The structure may be a three-dimensional structure or a two-dimensional plate structure. The body structure 10 can be selected from one of the following materials: dielectric materials, ceramics, metals, glass, or other suitable materials. In an embodiment of the invention, the dielectric material described above comprises a high molecular polymer. If the body structure 10 is composed of a dielectric material or a plastic, a two-dimensional structure can be formed by injection molding. The body structure 1Q can be a mixture of shouting and shouting, and is formed by a mold molding technique. If the body structure 10 is a ceramic body, it can be molded by using a mold. The material of the body includes, for example, an oxide oxide, an oxide or an alumina to which chromium carbide is added. In the embodiment of the present invention, the above polymer is selected from the group consisting of epoxy resins, modified epoxy resins, polyesters, acrylates, and fluoropolymers («〇-1). )〇1}^ kiss, polyphenylene oxide (1)〇1_ which 1 coffee), polyimide (^)^^^^^(phenolicresin) > ^^(polysulfone) &gt (silicone polymer), BT resin (bismaldmide triazine modifled 1362906 epoxy), cyanate ester, polyethylene, polyethylene carbonate (PC), propylene-butadiene- Acrylonitrile-butadiene-styrene copolymer (ABS copolymer), polyethylene terephthalate (PET) resin, polybutylene terephthalate (PBT) resin, liquid crystal Liquid crystal polymers (LPP), polyamide 6, PA 6 , nylon (Nylon), polyoxymethylene (POM), polyphenylene sulfide (PPS) and ring A group consisting of cyclic olefin copolymers (COCs). According to a preferred embodiment of the present invention, if the body structure 10 is made of a dielectric material or plastic, then no metal or catalyst component is contained therein. As shown in FIG. 2, a direct direct current (DC) layer 12' is then applied over the surface of all or part of the body structure 10 by a laser activatable material doped with catalyst particles. Composition. In accordance with a preferred embodiment of the present invention, the thickness of the direct line layer 12 is between about 1 nm and 2 mm. The direct wire layer 12 is an insulator prior to laser activation. Wherein, in relation to the above-mentioned laser activating material, the catalyst particles may comprise a complex compound which is formed by a combination of a central ion (or atom) and several ligand molecules (or ions) with coordinate bonds. A molecule or ion, often referred to as a coordination unit. Any compound having a coordination unit is referred to as a complex compound ‘abbreviated as a "complex," or a "complex." 7!3629〇6 In one embodiment of the invention, the catalyst particles described above comprise a plurality of nano-particles. In an embodiment of the invention, the material of the catalyst particles is a transition metal complex. In one embodiment of the invention, the materials of the transition metal complex compounds described above include transition metal oxides, transition metal nitrides, transition metal complexes or transition metal chelates. In one embodiment of the present invention, the material of the transition metal complex coordination compound is selected from the group consisting of zinc (Zn), copper (Cu), silver (Ag), gold (Au), and nickel. (Ni), palladium (Pd), uranium (Pt), cobalt (Co), rhenium (Rh), iridium (Ir), iron (Fe), manganese (Mn), chromium (Cr), tungsten (W), vanadium A group consisting of (V), button (Ta), and titanium (Ti). The above-mentioned laser activating material may be solid or liquid, and the coating method may be embossing, hot stamping, spraying, immersion, spin coating, screen printing, transfer, steaming, splashing , injection molding, insert molding and other coating methods. In addition, according to a preferred embodiment of the present invention, after the coating operation of the direct line layer 12 is performed, the surface of the body structure 10 may be subjected to surface modification treatment in advance, and the surface of the surface is roughened, such as Mold biting treatment, physical surface roughening, chemical surface roughening, addition of SAM (self-assembly membrane) film, addition of adhesive layer, etc., to directly apply the subsequently coated direct line layer 12 to the surface of the body structure It has good properties and is not easily peeled off or delaminated. As shown in Figure 3, a laser with a wavelength between 1 nm and 1 mm is used, ^62906 such as a uv laser with a wavelength of 355 nm, a C02 laser with a wavelength of 1 〇 6 〇〇 nm or an IR _ of the skin. The direct line layer 12__ 13, the same = connected to the line layer 12 _ metal catalyst fine not shown) activation, whereby: = groove _ _ _ slightly equal to the direct line layer 12 ^ ^ ^ ^ ^ ^ ^ m#13a, 13d. Of course, the aforementioned groove is not a V-shaped section. The depth of the groove 13 may be smaller than that of the direct line layer η, or the groove of different depth may be burned as needed, as shown in FIG. The groove is both the groove Ue. It is worth noting that the effect of the energy of the t-ray on the direct line-forming layer is different from that of the (four) energy, and it may not be able to form the micro-protrusion. As shown in Fig. 4, a metallization process is performed to form a conductive line 14, such as a copper wire, directly on the surface of the body structure. The foregoing metallization process may be metal deposition or copper deposition of copper, gold, silver, tin, rhodium, or the like: a method or other suitable metallization, for example, a method of directly filling a conductive material. Metallization is carried out. According to the different groove structures previously formed in the direct wire layer 12, the metal wire structure after the metallization, such as the wiring structure Ma, Mb, MC and (4) of Fig. 6, wherein the line The structural ground system is embedded in the direct line forming layer 12, and the line structures 14b and 14c are partially embedded in the direct line width 12, partially protruding from the surface of the direct line forming layer 12, and the line structure (4) is embedded in the groove, and It does not protrude from the surface of the direct line layer 12. The invention at least includes the following advantages: (1) the utility model can be used as a substrate, and the U62906 can only apply the laser-activated material on the surface, so that the physical properties of the original plastic can be preserved, so that the application range is wider, and (2) Only the surface of the laser-activated material can reduce the cost of the material; (3) the laser-activated material is no longer limited by the bulk plastic material, so it can be applied to various wavelengths (four)' A special laser activation device with wavelength and wavelength, so it can cost the equipment (4) if it is fixed, the direct line layer (4) can make the laser and metal (10) parameter fixed material adopt different plastic materials for the body structure. The impact, thus increasing output and yield. , '.

以上所述料本發批難實_,職树日种請專利範 所做之均等變倾修飾,皆應屬本發明之涵蓋範圍。 【圖式簡單說明】 第1圖至第4圖為依據本發明—較佳實施例所繪示的模塑内 的製作方法的示意圖。 第^騎示的是以雷射在直接成線層熱出的不同祕的凹槽剖面 不意圖。 第6圖、會示的金屬化後的不同態樣的線路結構。 【主要元件符號說明】 10本體結構 12直接成線層 1362906 13凹槽 13a凹槽 13b凹槽 13c凹槽 13d凹槽 14導電線路 14a線路結構 14b線路結構 14c線路結構 14d線路結構The above-mentioned materials are difficult to be issued _, and the equalization of the application of the patent tree is the scope of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS Figs. 1 to 4 are schematic views showing a manufacturing method in a molding according to the preferred embodiment of the present invention. The second ride shows the different secret groove profiles that the laser fires on the direct line layer. Fig. 6 shows the circuit structure of different aspects after metallization. [Main component symbol description] 10 body structure 12 direct wire layer 1362906 13 groove 13a groove 13b groove 13c groove 13d groove 14 conductive line 14a line structure 14b line structure 14c line structure 14d line structure

Claims (1)

1362906 七、申請專利範圍: 叫正替換頁 —種模塑内連裝置的製作方法,包含有: 提供〜本體結構; 層 _的直接成線 於该本體結構的表面上披覆—含有雷射活化材 線層上燒蝕出一 。夕利用雷射活化該直接成線層,並在該直接成 或多條凹槽以定義出一導線圖案;及 進仃一金屬化製程,直接於該本體处 導電線路。 。構的表面、槽上形成- 的製作方法,其中該 金屬、玻璃或上述 2.如申請專利範圍第1項所述之模塑内連裝置 本體結構選自下述材料之—:介電材料、陶究、 材料所組成的群組。 3·如申請專利範㈣2項所述之模塑内連裝置的製作方法,其中該 介電材料包括高分子聚合物。 z 〃 〇X 4.如申請專利範圍第3項所述之模塑内連裝置的製作方法,其中該 南刀子^^合物係為選自由壤氧樹脂、改質之環氧樹脂、聚脂 (polyester)、丙烯酸g旨、敗素聚合物(flu〇r〇_p〇lymer)、聚亞苯基氧化 物(polyphenylene oxide)、聚醯亞胺(polyimide)、酚醛樹脂 (phenolicresini、聚颯(p〇lysulfone)、矽素聚合物(siiicone p〇iymer)、 12 1362906 __ 100年10月14日修正替換頁 BT 樹脂(bismaleimide triazine modified epoxy)、氰酸聚醋(cyanate ester)、聚乙烯(polyethylene)、聚碳酸酯樹脂(polycarbonate,PC)、丙 稀-丁二稀_苯乙稀共聚合物(acrylonitrile-butadiene-styrene copolymer,ABS copolymer)、聚對苯二曱酸乙二酯(polyethylene terephthalate,PET)樹脂、聚對苯二曱酸丁二酷(p〇iybutylene terephthalate, PBT)樹月旨、液晶高分子(liquid crystal polymers,LCP)、 聚醯胺6(polyamide 6, PA 6)、尼龍(Nylon)、共聚聚甲酸 (polyoxymethylene,POM)、聚苯硫&|(p〇lyphenylene sulfide PPS)及環 狀烯烴共聚高分子(cyclic olefin copolymer,COC)所組成的群組。 5. 如申請專利範圍第2項所述之模塑内連裝置的製作方法,其中該 陶瓷包括氧化錘、氧化鋁或添加碳化鉻之氧化鋁。 6. 如申請專利範圍第丨項所述之模塑内連裝置的製作方法,其中該 可雷射活化材料摻雜有觸媒顆粒。 7·如申請專利範圍第6項所述之模塑内連|置的製作方法,其中該 觸媒顆粒包括多個奈米金屬顆粒。 〃 8.如申請專利範_ 6項所述之模動連裝置㈣作方法,其中該 觸媒顆粒包括過渡金屬配位化合物。 4 ’、 〇Λ 13 1362906 100年10月1 替掻百 9.如申請專利範圍第8項所述之模塑内連裝置的製作方法,其中該 過渡金屬配位化合物包括過渡金屬氧化物、過渡金屬氮化物、過渡 金屬錯合物或過渡金屬螯合物。 1 〇·如申請專利範圍第9項所述之模塑内連裝置的製作方法,其中該 過渡金屬選自於由鋅(Zn)、銅(Cu)、.銀(Ag)、金(Au)、鎳、鈀(pd)、 鉑(Pt)、鈷(Co)、铑(Rh)、銥(Ir)、鐵(Fe)、錳(Mn)、鉻(Cr)、鎢(^^)、 鈒(V)、姐(Ta)以及鈦(丁丨)所組成的群組。 11.如申gf專利細第1項所述之難内連裝置的製作方法,其中該 直接成線層的异度介於Inm至2mm之間。 1Z如申請專纖圍第丨項所述之難魄裝置的製作方法,其中於 該本體結構的絲上披覆該直接親層之前,另包含有以下步雜: 對該本體結構的表面進行一表面改質處理。 14 ’其中該 、鋅、 I5.如申請專纖圍第丨項職之模_妓置的製作方法, 100年10月〗4日土正替拖百 曰修正替換頁1362906 VII. Scope of application for patents: Calling a replacement page - a method of making a molded interconnect device, comprising: providing a ~ body structure; direct structuring of the layer _ overlying the surface of the body structure - containing laser activation A layer is ablated on the layer of material. The direct line layer is activated by laser, and the wire pattern is defined by directly forming a plurality of grooves; and a metallization process is performed to directly conduct the conductive line at the body. . The surface of the structure, the method of forming the groove, wherein the metal, the glass or the above-mentioned body structure of the molded interconnect device according to claim 1 is selected from the group consisting of: a dielectric material, A group of ceramics and materials. 3. A method of fabricating a molded interconnect device as described in claim 4, wherein the dielectric material comprises a high molecular polymer. The method for producing a molded interconnect device according to claim 3, wherein the south knife compound is selected from the group consisting of a lyophilized resin, a modified epoxy resin, and a polyester resin. (polyester), acrylic acid, flu〇r〇_p〇lymer, polyphenylene oxide, polyimide, phenolic resin (phenolicresini, polyfluorene (polyphenol) P〇lysulfone), sinicinone p〇iymer, 12 1362906 __ October 14, 100 revised BT resin (bismaleimide triazine modified epoxy), cyanate ester, polyethylene (polyethylene) ), polycarbonate resin (PC), acrylonitrile-butadiene-styrene copolymer (ABS copolymer), polyethylene terephthalate (polyethylene terephthalate, PET) resin, p〇iybutylene terephthalate (PBT) tree, liquid crystal polymers (LCP), polyamide 6, PA 6 , nylon ( Nylon), polyoxymethylene (POM), poly a group consisting of phenyl sulfonate & (p〇lyphenylene sulfide PPS) and a cyclic olefin copolymer (COC). 5. The molded interconnect device of claim 2 The manufacturing method, wherein the ceramic comprises an oxidizing hammer, an alumina or an alumina to which chromium carbide is added. 6. The method for manufacturing a molded interconnect device according to the invention, wherein the laser activating material is doped There is a catalyst particle. 7. The method for manufacturing a molded interconnect according to claim 6, wherein the catalyst particle comprises a plurality of nano metal particles. 〃 8. If the patent application is -6 The mold linkage device (4) is a method, wherein the catalyst particles comprise a transition metal coordination compound. 4 ', 〇Λ 13 1362906 100 October 100 掻 掻 9 9. 9. As described in claim 8 A method of fabricating a molding interconnect device, wherein the transition metal complex compound comprises a transition metal oxide, a transition metal nitride, a transition metal complex or a transition metal chelate. The method for producing a molded interconnect device according to claim 9, wherein the transition metal is selected from the group consisting of zinc (Zn), copper (Cu), silver (Ag), and gold (Au). , nickel, palladium (pd), platinum (Pt), cobalt (Co), rhodium (Rh), iridium (Ir), iron (Fe), manganese (Mn), chromium (Cr), tungsten (^^), 鈒A group consisting of (V), sister (Ta), and titanium (Ding). 11. The method for fabricating a difficult interconnect device according to the above-mentioned item, wherein the direct line layer has an irregularity of between Inm and 2 mm. 1Z. The method for manufacturing a difficult device according to the above-mentioned item, wherein before the direct affinity layer is coated on the wire of the body structure, the following steps are further included: Surface modification treatment. 14 ‘Where, Zinc, I5. If you apply for the special 纤 围 丨 丨 丨 妓 妓 妓 的 的 100 100 100 100 100 100 100 100 100 100 100 100 100 100 100 100 100 100 100 100 100 100 16. —種模塑内連裝置,包含有: 一本體結構; -直接成線層’其坡覆在該本體結構的表面,並形成有—或多條 凹槽,該直接成線層含有可雷射活化材料;以及 ' 一導電圖案,設於各該直接成線層之凹槽中。 Π.如申請專利範圍第16項所述之模塑内連褒置,其中該本體結構 選自下述材料之-:介電材料、喊、金屬、玻璃壯述材料所技 成的群組。 18. 如申請專利範圍第17項所述之模塑内連裝置,其中該介電材料 包括高分子聚合物。 19. 如申請專利範圍第18項所述之模塑内連裝置,其中該高分子聚 合物係為選自由%氧樹脂、改質之壤氧樹脂、聚脂〇5〇lyeSter) '丙稀 酸酯、氟素聚合物(fluoro-polymer) '聚亞笨基氧化物(p〇iyphenylene oxide)、聚醯亞胺(polyimide)、酚醛樹脂(phenolicresin)、聚颯 (polysulfone)、矽素聚合物(silicone polymer)、BT 樹脂(bismaleimide triazine modified epoxy)、氰酸聚酯(cyanate ester) ' 聚乙烯 15 1362906 100年10月14日修正替換頁 (polyethylene)、聚碳酸酯樹脂(polycarbonate,PC)、丙稀-丁二稀-苯乙 烯共聚合物(acrylonitrile-butadiene-styrene copolymer,ABS copolymer)、聚對苯二曱酸乙二g旨(polyethylene terephthalate, PET)樹 脂、聚對苯二曱酸丁二酯(polybutylene terephthalate,PBT)樹脂、液 晶高分子(liquid crystal po丨ymers, LCP)、聚醯胺 6(polyamide 6, PA 6)、尼龍〇%1〇11)、共聚聚甲醛(?〇卜(^11^%卜1^,?01^)、聚苯硫醚 (polyphenylene sulfide,PPS)及環狀烯烴共聚高分子(CyCiic 〇iefm copolymer, COC)所組成的君_組〇 20.如申請專利範圍第π項所述之模塑内連裝置,其中該陶瓷包括 氧化鍅、氧化鋁或添加碳化鉻之氧化鋁。 21. 如申請專利範圍第16項所述之模塑内連裝置,其中該可雷射活 化材料摻雜有觸媒顆粒。 22. 如申請專利範圍第21項所述之模塑内連裝置,其中該觸媒顆粒 包括過渡金屬配位化合物。 23. 如申請專利制第22項所述之模塑内連裝置,其中該過渡金屬 配位化合物包括舰金純化物、過渡金魏化物、過渡金屬錯合 物或過渡金屬螯合物。 24·如申請專鄕圍第Μ顿狀模軸縣置,其找過渡金屬 1362906 100年10月14日修正替換頁 選自於由鋅(Zn)、銅(Cu)、銀(Ag)、金(All)、鎳(Ni)、鈀(Pd)、鉑(Pt)、 鈷(Co)、铑(Rh)、銥(Ir)、鐵(Fe)、錳(Μη)、鉻(Cr)、鎢(W)、釩(V)、 鈕(Ta)以及鈦(Ti)所組成的群組。 、圖式· 1716. A molded interconnect device comprising: a body structure; - a direct wire layer having a slope overlying a surface of the body structure and having - or a plurality of grooves, the direct wire layer containing a laser activating material; and 'a conductive pattern disposed in the recess of each of the direct line layers. The molded interconnect device of claim 16, wherein the body structure is selected from the group consisting of: a dielectric material, a shout, a metal, and a glass matrix material. 18. The molded interconnect device of claim 17, wherein the dielectric material comprises a high molecular polymer. 19. The molded interconnect device of claim 18, wherein the high molecular polymer is selected from the group consisting of a oxy-resin, a modified oxy-alkaline resin, and a polyester 〇 5〇lyeSter) Ester, fluoro-polymer 'p〇iyphenylene oxide, polyimide, phenolic resin, polysulfone, alizarin polymer Silicone polymer), BT resin (bismaleimide triazine modified epoxy), cyanate ester 'polyethylene 15 1362906 October 14, 2014 revised replacement page (polyethylene), polycarbonate resin (polycarbonate, PC), C Acrylonitrile-butadiene-styrene copolymer (ABS copolymer), polyethylene terephthalate (PET) resin, polybutylene terephthalate (polybutylene terephthalate, PBT) resin, liquid crystal polymer (liquid crystal po丨ymers, LCP), polyamide 6 (polyamide 6, PA 6), nylon 〇%1〇11), copolymerized polyoxymethylene (?〇卜(^ 11^% Bu 1^,?01^), polyphenylene sulfi De-PPS) and a cyclic olefin copolymer copolymer (CyCiic 〇iefm copolymer, COC). The molded interconnect device of claim π, wherein the ceramic comprises cerium oxide. Alumina or a chromium oxide-added alumina. 21. The molded interconnect device of claim 16, wherein the laser activatable material is doped with catalyst particles. The molded interconnect device of claim 21, wherein the catalyst particles comprise a transition metal complex compound. The molded interconnect device of claim 22, wherein the transition metal complex compound comprises a ship Gold purified, transitional gold-based compound, transition metal complex or transition metal chelate. 24·If you apply for the special 鄕 状 状 状 县 县 , , , , , , 136 136 136 136 136 136 136 136 136 136 136 136 The page is selected from the group consisting of zinc (Zn), copper (Cu), silver (Ag), gold (All), nickel (Ni), palladium (Pd), platinum (Pt), cobalt (Co), rhodium (Rh), A group consisting of iridium (Ir), iron (Fe), manganese (Mn), chromium (Cr), tungsten (W), vanadium (V), button (Ta), and titanium (Ti). , schema · 17
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