TWI346836B - Photoresist composition - Google Patents

Photoresist composition

Info

Publication number: TWI346836B
Authority: TW; Taiwan
Prior art keywords: photoresist composition; photoresist; composition
Prior art date: 2003-10-14

Application number

TW093130888A

Other languages

Chinese (zh)

Other versions

TW200517779A (en

Inventor

Masaki Hosaka

Masatoshi Homma

Original Assignee

Adeka Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2003-10-14

Filing date

2004-10-12

Publication date

2011-08-11

2004-10-12 Application filed by Adeka Corp filed Critical Adeka Corp

2005-06-01 Publication of TW200517779A publication Critical patent/TW200517779A/en

2011-08-11 Application granted granted Critical

2011-08-11 Publication of TWI346836B publication Critical patent/TWI346836B/en

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition

Landscapes

Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
General Physics & Mathematics (AREA)
Materials For Photolithography (AREA)
Polyethers (AREA)

TW093130888A 2003-10-14 2004-10-12 Photoresist composition TWI346836B (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP2003353720		2003-10-14

Publications (2)

Publication Number	Publication Date
TW200517779A TW200517779A (en)	2005-06-01
TWI346836B true TWI346836B (en)	2011-08-11

Family

ID=34431168

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
TW093130888A TWI346836B (en)	2003-10-14	2004-10-12	Photoresist composition

Country Status (5)

Country	Link
JP (1)	JP4673222B2 (en)
KR (1)	KR101073417B1 (en)
CN (1)	CN1853138B (en)
TW (1)	TWI346836B (en)
WO (1)	WO2005036268A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US7601482B2 (en) *	2006-03-28	2009-10-13	Az Electronic Materials Usa Corp.	Negative photoresist compositions
JP5801798B2 (en) *	2009-06-04	2015-10-28	メルクパテントゲゼルシャフトミットベシュレンクテルハフツングＭｅｒｃｋＰａｔｅｎｔＧｅｓｅｌｌｓｃｈａｆｔｍｉｔｂｅｓｃｈｒａｅｎｋｔｅｒＨａｆｔｕｎｇ	Two component etching
TWI752906B (en) *	2015-04-22	2022-01-21	日商日產化學工業有限公司	Photosensitive fiber and method for forming fiber pattern
JP6702251B2 (en)	2017-04-17	2020-05-27	信越化学工業株式会社	Positive resist film laminate and pattern forming method
KR102146095B1 (en)	2017-09-15	2020-08-19	주식회사 엘지화학	Photoacid generator and photoresist composition for thick layer comprising the same
CN112292637A (en) *	2018-06-22	2021-01-29	默克专利有限公司	Photoresist composition, methods for producing photoresist coating, etched photoresist coating, and etched silicon-containing layer, and method for producing device using the same

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH0743501B2 (en)	1986-04-24	1995-05-15	富士写真フイルム株式会社	Positive photosensitive lithographic printing plate
JP2539664B2 (en) *	1988-05-31	1996-10-02	コニカ株式会社	Photosensitive lithographic printing plate
JP2739382B2 (en) *	1990-12-06	1998-04-15	富士写真フイルム株式会社	Lithographic printing plate manufacturing method
GB9722862D0 (en) *	1997-10-29	1997-12-24	Horsell Graphic Ind Ltd	Pattern formation
JP2000275830A (en) *	1999-03-25	2000-10-06	Mitsubishi Chemicals Corp	Photopolymerizable composition, image forming material and photosensitive lithographic printing plate
JP3802732B2 (en) *	2000-05-12	2006-07-26	信越化学工業株式会社	Resist material and pattern forming method
JP3458096B2 (en) *	2000-08-11	2003-10-20	株式会社半導体先端テクノロジーズ	Resist composition and method for manufacturing semiconductor device
KR100903153B1 (en) *	2001-10-10	2009-06-17	닛산 가가쿠 고교 가부시키 가이샤	Composition for Forming Antireflection Film for Lithography
JP3933459B2 (en) *	2001-12-14	2007-06-20	旭化成エレクトロニクス株式会社	Photosensitive resin composition and laminate

2004
- 2004-10-07 WO PCT/JP2004/014832 patent/WO2005036268A1/en not_active Ceased
- 2004-10-07 KR KR1020067007065A patent/KR101073417B1/en not_active Expired - Fee Related
- 2004-10-07 CN CN2004800267290A patent/CN1853138B/en not_active Expired - Fee Related
- 2004-10-07 JP JP2005514594A patent/JP4673222B2/en not_active Expired - Fee Related
- 2004-10-12 TW TW093130888A patent/TWI346836B/en not_active IP Right Cessation

Also Published As

Publication number	Publication date
WO2005036268A1 (en)	2005-04-21
CN1853138A (en)	2006-10-25
CN1853138B (en)	2011-06-15
KR101073417B1 (en)	2011-10-17
JP4673222B2 (en)	2011-04-20
KR20070017962A (en)	2007-02-13
JPWO2005036268A1 (en)	2007-11-22
TW200517779A (en)	2005-06-01

Publication	Publication Date	Title
GB0305941D0 (en)	2003-04-23	Composition
GB0302738D0 (en)	2003-03-12	Composition
GB0324918D0 (en)	2003-11-26	Composition
EP1613352A4 (en)	2009-04-29	Micro-cluster compositions
GB0324897D0 (en)	2003-11-26	Composition
GB0322033D0 (en)	2003-10-22	Composition
EP1630606A4 (en)	2006-11-02	Positive photosensitive composition
MY145151A (en)	2011-12-30	Composition
TWI346836B (en)	2011-08-11	Photoresist composition
GB2415790C (en)	2007-09-14	Negative photoresist composition
GB0300602D0 (en)	2003-02-12	Compositions
GB0309317D0 (en)	2003-06-04	Composition
GB0316857D0 (en)	2003-08-20	Compositions
GB0306312D0 (en)	2003-04-23	Composition
GB0326815D0 (en)	2003-12-24	Composition
GB0404470D0 (en)	2004-03-31	Composition
GB0301869D0 (en)	2003-02-26	Composition
GB0311465D0 (en)	2003-06-25	Composition
GB0328131D0 (en)	2004-01-07	Developer composition
GB0303643D0 (en)	2003-03-19	Composition
GB0304747D0 (en)	2003-04-02	Composition
GB0318533D0 (en)	2003-09-10	Composition
GB0320018D0 (en)	2003-10-01	Composition
GB0320562D0 (en)	2003-10-01	Composition
GB0320863D0 (en)	2003-10-08	Composition

Legal Events

Date	Code	Title	Description
2015-05-11	MM4A	Annulment or lapse of patent due to non-payment of fees