1291365 玖、發明說明： L發明所屬^^技術領域;j 發明領域 本發明係有關一種過濾裝置，可配置於例如半導體製 5 造程序或液晶製造程序中，用以去除排氣氣體所含之反應 生成物等微粒子並回收液體中所含之煙霧。 t先前技術]1 發明背景 目前在半導體製造程序中採用的是包含離子注入法、 10 鋁等金屬蝕刻法、CVD法等各種方式，但不論採用上述哪 種方式的半導體製造程序，都會產生氫氟酸、矽烷氣體、 四乙氧基矽烷、氨等有害氣體或反應生成物等雜質，及夾 雜煙霧及粉塵等微粒子之排氣氣體。又，在CVD法半導體 製造程序中，夾雜於排氣氣體中之微粒子的量特別多。 15 因此，在半導體製造程序中，配置有可去除夾雜於排 氣氣體中之微粒子之廢棄物處理設備。 以在的廢棄物處理設傷，係將排氣氣體所含的微粒子 吸附至離子交換樹脂或沸石等吸附材，再利用水滌氣器吸 附至水中，並以燃燒器進行燃燒、分解而去除。 -0 在去除排氣氣體中的微粒子時，在利用吸附材之廢棄 物處理設備中，會發生因所吸附之微粒子而使每單位面積 的吸附材壓力損失變大之問題。在利用水滌氣器之廢棄物 處理設備中’則會造成由於微粒子而使吸附液變成泥狀， 故必須進行污泥處理之問題。在利用燃燒之廢棄物處理設 1291365 儀^中， 曰發生因燃燒器噴嘴堵塞而污染燃燒室之問題。 於半本發明人已開發出一種過濾裝置，該過濾裝置係配置 導體製造程序中設置之廢棄物處理設備的上游側，以 作為前卢 々里裳置’故即使在半導體製造程序的排氣氣體中 ) 含有大量的y 里的微粒子，也可輕易地進行廢棄物處理設備的保 養(例上如，參照專利文 、〃 述過濾裝置，包含：具有入口與出口之殼體；具有 i. 疋4以形成連續之渦旋狀流路，並配置於前述殼體 内之間隔辟· 1〇件 土，及具有至少配置於前述間隔壁一面之過濾構 且，在使導入前述殼體内之排氣氣體沿著前述 流路進 仃之際，可利用配置於前述渦旋狀流路之過濾構件 去除含於排氣氣體中之微粒子，並從出口將業已去除微粒 子之排氧氣體送入廢棄物處理設備。 專利文獻1日本公開公報第200M49723號（第3頁、第3 15圖） 上述過濾裝置，由於其渦旋狀流路的渦旋部流路寬 度，從外端到内端都設定為相同寬度，因而流過前述渦旋 狀流路之排氣氣體，其線速度會在渦旋狀流路外側變快而 在内側會變慢，故無法與排氣氣體速度成比例地由粒徑大 20之粒子至粒控小之粒子依序去除含於排氣氣體之微粒子。 【發^明内容^】 發明概要 本發明係在考量上述缺點而製成者，且本發明之目的 係提供一種過濾裝置，由於可使流過渦旋狀流路之排氣氣 1291365 體的線速度在外側渦旋部慢而在關渦旋部快，故可與排 氣氣體速度成_地由祕大之粒子至_奴粒子依序 去除含於排氣氣體中之微粒子。1291365 玖, 发明发明: L invention belongs to the technical field; j FIELD OF THE INVENTION The present invention relates to a filtering device that can be arranged, for example, in a semiconductor manufacturing process or a liquid crystal manufacturing process for removing the reaction of exhaust gas The particles are generated such as particles and the smoke contained in the liquid is recovered. BACKGROUND OF THE INVENTION 1. In the semiconductor manufacturing process, various methods such as an ion implantation method, a metal etching method such as 10 aluminum, and a CVD method are employed. However, regardless of the semiconductor manufacturing process of any of the above methods, hydrogen fluoride is generated. An impurity such as an acid, a decane gas, a tetraethoxy decane or an ammonia, or an impurity such as a reaction product, and an exhaust gas containing fine particles such as smoke and dust. Further, in the CVD semiconductor manufacturing process, the amount of fine particles contained in the exhaust gas is particularly large. 15 Therefore, in the semiconductor manufacturing process, a waste disposal apparatus capable of removing fine particles contained in the exhaust gas is disposed. In the case of the waste treatment, the fine particles contained in the exhaust gas are adsorbed to an adsorbent such as an ion exchange resin or a zeolite, and then adsorbed to water by a water scrubber, and burned and decomposed by a burner to be removed. -0 When the fine particles in the exhaust gas are removed, in the waste material processing apparatus using the adsorbent, there is a problem that the pressure loss of the adsorbent per unit area is increased due to the adsorbed fine particles. In the waste treatment equipment using a water scrubber, the adsorption liquid becomes muddy due to the fine particles, so sludge treatment must be performed. In the use of the waste disposal facility, there is a problem that the combustion chamber is contaminated by the nozzle of the burner. The present inventors have developed a filter device which is disposed on the upstream side of the waste disposal apparatus provided in the conductor manufacturing process to serve as an exhaust gas in the semiconductor manufacturing process even in the front of the semiconductor manufacturing process. Medium) Containing a large amount of fine particles in y, it is also easy to carry out maintenance of waste treatment equipment (for example, refer to the patent document, the description of the filter device, including: a casing having an inlet and an outlet; having i. 疋 4 Forming a continuous spiral flow path, disposing the partition material in the casing, and having a filter structure disposed at least on one side of the partition wall, and exhausting the gas into the casing When the gas is introduced along the flow path, the filter member disposed in the spiral flow path can be used to remove the fine particles contained in the exhaust gas, and the oxygen-exhausted gas from which the fine particles have been removed can be sent to the waste treatment from the outlet. Patent Document 1 Japanese Laid-Open Publication No. 200M49723 (p. 3, p. 3 15) The filter device has a scroll flow path width of the scroll flow path from the outer end to the inner end. Since the ends are all set to the same width, the exhaust gas flowing through the scroll-shaped flow path has a linear velocity which is faster outside the spiral flow path and slower on the inner side, so that it cannot be proportional to the exhaust gas velocity. The particle containing a particle size of 20 to the small particle-controlled particle sequentially removes the fine particles contained in the exhaust gas. [Abstract] The present invention has been made in consideration of the above disadvantages, and the present invention is The object of the invention is to provide a filtering device which can make the linear velocity of the exhaust gas 1291365 flowing through the swirling flow path slow in the outer scroll portion and fast in the closing scroll portion, so that the exhaust gas velocity can be made The particles contained in the exhaust gas are sequentially removed from the particles of the secret to the slave particles.
具有複數渦旋部以形成連續渦旋狀流路，孟 體内之間隔壁；及至少配置於前述間隔壁 並配置於前述殼 壁—面之過濾構 件，並且具有使前述满旋狀流路最外侧渴旋部的流路寬度 較内側渦旋部的流路寬度大之構造。 又 此外，本發明之過渡裝置，由於可在前述間隔壁的内 ⑺^工間配置圓筒狀過渡器，故可成為緊緻之整體構造。 本發明之過濾裝置，由於流過前述渦旋狀流路之排氣 氣體，在外側渦旋部的線速度慢而在内側渦旋部的線速度 快，因而可在前述渦旋狀流路的外側部分收集含於排氣氣 體中粒徑大之粒子，並在前述渦旋狀流路的内側部分收集 15粒徑小之粒子，故可與排氣氣體的速度成比例地由粒徑大 之粒子至粒仏小之粒子依序去除含於排氣氣體中之微粒 子。 圖式簡單說明 第1圖係本發明較佳實施型態之過濾裝置之縱截面圖。 20 苐2圖係沿著第1圖線A-A所截取之截面圖。 第3圖係顯示本發明過濾裝置之另一實施型態之圖。 E：實施方式】 較佳實施例之說明 依據以下圖示，詳細說明本發明之過濾裝置。 1291365 如第1圖及第2圖所示’本發明之過遽裝置1，包含有： 圓筒狀殼體2、配置於圓筒狀殼體2内部之渦旋狀間隔壁3、 配置於圓筒狀殼體2及間隔壁3裡面之過濾構件4,及配置於 間隔壁3中央部之圓筒狀過濾器5。 5 如第1圖所示，上述圓筒狀殼體2，包含有：於側壁7a 上方設置有入口 6且具有上端開口之圓筒狀殼本體7，及在 中央部具有出口 8並固定於圓筒狀殼本體7開口端之蓋體 9。又，在蓋體9下面並對應出口8，藉固定機構1〇安裝有圓 筒狀過濾器5。 10 如第2圖所示，上述渦旋狀間隔壁3係具有3a、3b、3c 等3個渦旋部。又，渦旋狀間隔壁3的高度幾乎與圓筒狀殼 本體7的高度一致。且，渦旋狀間隔壁3配置於圓筒狀殼體2 的内部時，會在前述圓筒狀殼體2的内部形成由外侧向内側 連續延伸之渦旋狀流路11。且，宜將渦旋狀間隔壁3的面作 15 成凹凸面，並在渦旋狀間隔壁3設置擋板。 在上述渦旋狀流路11中之圓筒狀殼體2的内壁2a與位 於最外側之渦旋部3a之間所形成之渦旋狀流路11a，係將其 流路寬度A設定為大於形成於渦旋部3a與位於較渦旋部3& 内側之渦旋部3b之間所形成之流路Hb的流路寬度b。同樣 20地，形成於上述渦旋狀流路11中之渦旋部3a與渦旋部％間 之流路lib的流路寬度B，係設定為大於形成於渦旋部％與 位於渦旋部3b内側之渦旋部3c間之流路11c的流路寬度c。 即’前述渦旋狀流路11，係在排氣氣體前進方向由外側向 内側逐漸縮短流路寬度而形成者。 1291365 上述實施型態中，形成渦旋狀流路11之渦旋狀間隔壁 3，雖利用3個渦旋部形成，但也可視其所需增減前述漏旋 部的數量。當前述渦旋部的數量在6個以上時，亦可使包含 最内部流路之複數流路的流路寬度具有同樣的寬度。 5 上述過濾、構件4，係由耐熱性及耐藥品性優異之纖維素 所形成之薄板狀成形品，並沿著渦旋狀間隔壁3的裡面配置 在渦旋狀流路11的方向，又，過濾構件4亦可配置於渦旋狀 間隔壁3的兩面。 上述過濾構件4係以磁性纖維形成，並可有效地回收粉 10 體、液體或液體煙霧。 上述圓筒狀過濾器5，係與上述過濾構件4同樣地以耐 熱性及耐藥品性優異之纖維素所形成者。圓筒狀過渡器5係 配置於間隔壁3的中央部。又，圓筒狀過濾器5可去除在前 述過濾構件4中無法完全去除之粒徑特別細小之微粒子。 圓茼狀過濾器5可以纖維材料與金屬材料之混合物形 成，亦可僅以金屬材料形成。 又，為了在排氣氣體溫度高時冷卻排氣氣體，也可以 將冷部用套管12配置成包圍圓筒狀殼體2的外面。冷卻用套 e 12可保持或循環用以冷卻過濾裝置1的冷媒之機構，又， 七述β媒並無特別限制，但一般使用水。 接著，說明其作用。 本發明之過濾裝置1，係配置於未圖示之半導體製造程 序中廢棄物處理設備的上流側，並用於去除從半導體製造 &序的處理裝置所排出之氣體被處理物之排氣氣體中的反 1291365 應生成物等雜質，及包含煙霧或粉塵等微粒子。 從半導體製造程序所排出的排氣氣體，係通過未圖示 之管線，並從過濾裝置1的入口 6導入配置於圓筒狀殼體2内 部之渦旋狀流路11。該渦旋狀流路11，由於將最外側流路 5 11a的流路寬度A設定為大於鄰接於最外側流路lla之内侧 流路lib的流路寬度B，因而前進至渦旋狀流路丨丨之排氣氣 體，在最外側流路lla的線速度會比最外側流路na内側之 内側流路lib的線速度慢。因此，含於排氣氣體中之微粒子 當中粒徑大的粒子，會藉由與排氣氣體速度成比例之離心 10力作用，碰撞至配置於圓筒狀殼體2裡面之過濾構件4。又， 碰撞至圓筒狀殼體2裡面之過濾構件4之微粒子，會附著於 過濾構件4或因重力作用而落下，並收集於圓筒狀殼體2。 通過渦旋狀流路11之最外側流路lla之排氣氣體，由於 排氣氣體在内側流路1 lb的線速度會比内侧流路丨lb内側之 15内侧t|L路11c的線速度丨艾，因而，同樣地，粒徑大之粒子會 藉由與被處理氣體的速度成比例之離心力作用，碰撞配置 於渦旋狀間隔壁3裡面之過濾構件4，且，碰撞至過濾構件4 之微粒子，會附著於前述過濾構件或落下，並收集於圓筒 狀殼體2。 20 通過渦旋狀流路11内側流路lib之排氣氣體，會藉由離 心力作用，碰撞至配置於渦旋狀間隔壁3裡面之過濾構件 4，且，碰彳里至過濾構件4之微粒子，會附著於前述過濾構 件或落下，並收集於圓筒狀殼體2。 如此一來，含於排氣氣體中之微粒子，在沿著渦旋狀 1291365 流路11前進至半徑方向内側之際，會與排氣氣體的速度成 比例地由粒徑大之粒子至粒徑小之粒子加以去除。在渴旋 狀流路11中未去除之粒徑細小的微粒子，可利用配置於間 隔壁3中央部之圓筒狀過濾器5去除。 5 接著’將在過濾裝置1中業已去除微粒子之排氣氣體， 從過遽裝置1的出口 8通過未圖示之管線，導入廢棄物處理 設備。 第3圖係顯示本發明之另一實施型態。相較於第1圖所 示之過濾裝置1，其不同點在於，第3圖所示之過濾裝置2〇， 10其間隔壁3的高度較圓筒狀殼體21低，且在圓筒狀過濾器5 上方形成空間22，並在該空間22配置以不銹鋼形成之環形 狀元件23。又，通過圓筒狀過濾器5之排氣氣體，在直接碰 撞至環形狀元件23後，通過安裝於蓋體9下面之擋板24與圓 筒狀殼體21間的間隙，導至出口8。藉此，可更有效地去除 15 含於排氣氣體之微粒子。 此外，在上述實施型態中，雖已說明了以過濾裝置i 去除含於排氣氣體之微粒子的情形，但過濾裝置1亦可用於 回收液體及回收含於液體之煙霧。 本發明之過濾裝置，因組合於半導體製造程序等排氣 20氣體線路中，故可減輕廢棄物處理設備的負荷，同時可大 幅改善廢棄物處理設備的清潔次數及設備壽命。 【囷式簡單說明】 第1圖係本發明較佳實施型態之過濾裝置之縱截面圖。 第2圖係沿著第1圖線A-A所截取之截面圖。 11 1291365 第3圖係顯示本發明過濾裝置之另一實施型態之圖。 【圖式之主要元件代表符號表】 1、 20…過濾裝置 2、 21…圓筒狀殼體 2a...内壁 3.. .間隔壁 3a、3b、3c···滿旋部a plurality of scroll portions for forming a continuous spiral flow path, a partition wall in the body of the body; and a filter member disposed at least on the partition wall and disposed on the wall surface of the shell wall, and having the most full flow path The flow path width of the outer thirteen is larger than the flow path width of the inner scroll. Further, in the transition device of the present invention, since the cylindrical transition device can be disposed in the inner wall of the partition wall, the entire structure can be compacted. In the filter device of the present invention, since the exhaust gas flowing through the scroll-shaped flow path is slow in the linear velocity of the outer scroll portion and the linear velocity in the inner scroll portion is fast, the swirling flow path can be formed in the spiral flow path. The outer portion collects particles having a large particle diameter contained in the exhaust gas, and collects 15 particles having a small particle diameter in the inner portion of the spiral flow path, so that the particle diameter is large in proportion to the velocity of the exhaust gas. Particles to small particles of particles are sequentially removed from the particles contained in the exhaust gas. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a longitudinal sectional view of a filtration apparatus according to a preferred embodiment of the present invention. The 20 苐 2 diagram is a cross-sectional view taken along line A-A of Figure 1. Fig. 3 is a view showing another embodiment of the filtering device of the present invention. E: Embodiments DESCRIPTION OF THE PREFERRED EMBODIMENTS A filter device of the present invention will be described in detail based on the following drawings. 1291365 As shown in Figs. 1 and 2, the apparatus 1 of the present invention includes a cylindrical casing 2, a spiral partition wall 3 disposed inside the cylindrical casing 2, and a circle The tubular casing 2 and the filter member 4 on the partition wall 3 and the cylindrical filter 5 disposed at the center of the partition wall 3 are provided. As shown in Fig. 1, the cylindrical casing 2 includes a cylindrical casing body 7 having an inlet 6 above the side wall 7a and having an upper end opening, and an outlet 8 at the center portion and fixed to the circle. The cover 9 of the open end of the cylindrical casing body 7. Further, a cylindrical filter 5 is attached to the lower side of the lid body 9 corresponding to the outlet 8 by a fixing mechanism 1A. As shown in Fig. 2, the scroll-shaped partition wall 3 has three scroll portions such as 3a, 3b, and 3c. Further, the height of the spiral partition wall 3 almost coincides with the height of the cylindrical casing body 7. When the spiral partition wall 3 is disposed inside the cylindrical casing 2, a spiral flow path 11 continuously extending from the outside to the inside is formed inside the cylindrical casing 2. Further, it is preferable that the surface of the spiral partition wall 3 is made into a concave-convex surface, and a baffle plate is provided in the spiral partition wall 3. The spiral flow path 11a formed between the inner wall 2a of the cylindrical casing 2 and the outermost scroll portion 3a in the spiral flow path 11 is set to have a flow path width A larger than The flow path width b of the flow path Hb formed between the scroll portion 3a and the scroll portion 3b located inside the scroll portion 3& Similarly, the flow path width B of the flow path lib between the scroll portion 3a and the scroll portion % formed in the scroll-shaped flow path 11 is set to be larger than that of the scroll portion % and the scroll portion. The flow path width c of the flow path 11c between the inner scroll portions 3c of 3b. In other words, the scroll-shaped flow path 11 is formed by gradually shortening the flow path width from the outer side to the inner side in the direction in which the exhaust gas advances. 1291365 In the above embodiment, the spiral-shaped partition wall 3 forming the spiral flow path 11 is formed by three scroll portions, but the number of the leaky portions may be increased or decreased depending on the necessity. When the number of the scroll portions is six or more, the flow path width of the plurality of flow paths including the innermost flow path may have the same width. (5) The filter and the member 4 are formed into a thin plate-shaped molded article made of cellulose having excellent heat resistance and chemical resistance, and are disposed in the direction of the spiral flow path 11 along the inner surface of the spiral partition wall 3, The filter member 4 may be disposed on both surfaces of the spiral partition wall 3. The above filter member 4 is formed of magnetic fibers, and can effectively recover powder, liquid or liquid smoke. The cylindrical filter 5 is formed of cellulose excellent in heat resistance and chemical resistance similarly to the filter member 4 described above. The cylindrical transition device 5 is disposed at the center of the partition wall 3. Further, the cylindrical filter 5 can remove fine particles having a particularly small particle size which cannot be completely removed in the filter member 4 described above. The round braided filter 5 may be formed of a mixture of a fibrous material and a metallic material, or may be formed only of a metallic material. Further, in order to cool the exhaust gas when the exhaust gas temperature is high, the cold portion bushing 12 may be disposed to surround the outer surface of the cylindrical casing 2. The cooling jacket e 12 can hold or circulate a mechanism for cooling the refrigerant of the filter device 1. Further, the beta catalyst is not particularly limited, but water is generally used. Next, the effect will be described. The filter device 1 of the present invention is disposed on the upstream side of the waste processing apparatus in a semiconductor manufacturing process (not shown), and is used to remove the exhaust gas from the gas processed material discharged from the semiconductor manufacturing & Anti-1291365 should produce impurities such as impurities, and contain particles such as smoke or dust. The exhaust gas discharged from the semiconductor manufacturing program is introduced into the spiral flow path 11 disposed inside the cylindrical casing 2 from the inlet 6 of the filter device 1 through a line (not shown). In the spiral flow path 11, since the flow path width A of the outermost flow path 5 11a is set larger than the flow path width B adjacent to the inner flow path lib of the outermost flow path 11a, the spiral flow path 11 is advanced to the spiral flow path. In the exhaust gas of the crucible, the linear velocity of the outermost flow path 11a is slower than the linear velocity of the inner flow path lib inside the outermost flow path na. Therefore, the particles having a large particle diameter among the fine particles contained in the exhaust gas collide with the filter member 4 disposed inside the cylindrical casing 2 by the centrifugal force acting in proportion to the exhaust gas velocity. Further, the fine particles colliding with the filter member 4 inside the cylindrical casing 2 adhere to the filter member 4 or fall by gravity, and are collected in the cylindrical casing 2. The exhaust gas passing through the outermost flow path 11a of the spiral flow path 11 is such that the linear velocity of the exhaust gas in the inner flow path 1 lb is higher than the linear velocity of the inner side t|L path 11c of the inner side flow path 丨1b. In the same manner, the particles having a large particle size collide with the filter member 4 disposed inside the spiral partition wall 3 by the centrifugal force proportional to the speed of the gas to be treated, and collide with the filter member 4 The fine particles are attached to the filter member or dropped, and are collected in the cylindrical casing 2. The exhaust gas passing through the inner flow path lib of the spiral flow path 11 collides with the filter member 4 disposed inside the spiral partition wall 3 by the centrifugal force, and the fine particles of the filter member 4 are touched. It may adhere to the aforementioned filter member or fall and collect in the cylindrical casing 2. As a result, the fine particles contained in the exhaust gas advance from the swirling 1291365 flow path 11 to the inner side in the radial direction, and the particles having a large particle diameter to the particle diameter in proportion to the velocity of the exhaust gas. Small particles are removed. The fine particles having a small particle diameter which are not removed in the thirsty swirling flow path 11 can be removed by the cylindrical filter 5 disposed at the central portion of the partition wall 3. 5 Next, the exhaust gas from which the fine particles have been removed in the filter device 1 is introduced into the waste treatment facility from the outlet 8 of the filter device 1 through a line (not shown). Figure 3 is a view showing another embodiment of the present invention. Compared with the filter device 1 shown in Fig. 1, the difference is that the filter device 2, 10 shown in Fig. 3 has a partition wall 3 having a lower height than the cylindrical casing 21 and is cylindrically filtered. A space 22 is formed above the device 5, and a ring-shaped element 23 formed of stainless steel is disposed in the space 22. Further, after the exhaust gas passing through the cylindrical filter 5 directly collides with the ring-shaped element 23, it is guided to the outlet 8 through a gap between the baffle plate 24 attached to the lower surface of the lid body 9 and the cylindrical casing 21. . Thereby, the fine particles contained in the exhaust gas can be removed more effectively. Further, in the above embodiment, the case where the particulate matter contained in the exhaust gas is removed by the filter device i has been described, but the filter device 1 can also be used for recovering the liquid and recovering the smoke contained in the liquid. Since the filter device of the present invention is incorporated in the gas line of the exhaust gas 20 such as a semiconductor manufacturing process, the load of the waste disposal equipment can be reduced, and the number of times of cleaning of the waste disposal equipment and the life of the equipment can be greatly improved. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a longitudinal sectional view showing a filter device of a preferred embodiment of the present invention. Fig. 2 is a cross-sectional view taken along line A-A of Fig. 1. 11 1291365 Fig. 3 is a view showing another embodiment of the filter device of the present invention. [The main components of the figure represent the symbol table] 1, 20... Filter device 2, 21... cylindrical casing 2a... inner wall 3.. partition wall 3a, 3b, 3c··· full rotation
4.. .過濾構件 5.. .圓筒狀過濾器 6"•入口 7.. .圓筒狀殼本體 7a...側壁 8···出口 9.. .蓋體 10.. .固定機構4.. Filter element 5.. . Cylindrical filter 6"•Inlet 7.. . Cylindrical shell body 7a...Side wall 8···Exit 9.. .Cap 10.. Fixing mechanism
11a、lib、11c...渦旋狀流路 12.. .冷卻用套管 22.. .空間 23…環形狀元件 24…播板 A、B、C…流路寬度 1211a, lib, 11c... vortex flow path 12.. cooling casing 22.. space 23... ring shape element 24... broadcast board A, B, C... flow path width 12