1279832 九、發明說明： 【發明所脣之技術領域】 本發明係關於一（例如）其中製造半導體裝置及液晶顯示 = (LCD)之無塵室。更料而言，本發明係關於形成一無塵 室系統之地板之格柵。 【先前技術】 半導體裝置及液晶顯示器(LCD)必須在極精密之處理條1279832 IX. Description of the Invention: [Technical Field of the Invention] The present invention relates to, for example, a clean room in which a semiconductor device and a liquid crystal display (LCD) are fabricated. More generally, the present invention relates to a grille for forming a floor of a clean room system. [Prior Art] Semiconductor devices and liquid crystal displays (LCDs) must be processed in extremely precise processing
件下製造。因此’不像許多普通製品，需在極清潔之環境 中製作半導體裝置及液晶顯示器(LCD)。在此方面，通常係 將數個半導體處理設備設置於其中環境維持得極清潔之單 獨無塵室中。 於一無塵室中，技術人員需穿戴特殊的防塵服工作以減 少異物（例如，灰塵）之產生。同樣，該無塵室之上部維持在 一稍高於該無塵室底部處主導壓力之壓力，以使空氣(清潔 空氣）於該無塵室中向下流動。格柵（具有孔的面板）提供該 無塵室之地板以便經由該地板排放空氣。因此，將該無塵 室内空氣所攜帶的污染物引導至該無塵室之地板並經由該 格柵之該等孔排放至外部。 然而’不像微粒，無塵室空氣中的分子污染物（其被稱作 奈米微粒）及氣載分子污染物（AMC)皆不易於清除。事實 上’無塵室内清除奈米微粒及AMC所需之差壓及氣流速度 必須比清除微粒之壓差及氣流速度至少高18%。不用說， 運行該無塵室系統之空調系統以提供此一高壓差及氣流速 度之運作成本係極高。同樣，製造一能夠產生移除該等奈 102823.doc .1279832 米微粒及AMC所需之壓差及氣流速度之習用無塵室系統係 極昂貴。 同樣，如圖1中所示，當空氣垂直穿過該格栅中的孔時， 會產生渦流。如圖中用虛線所示，該等渦流主要產生在該 ' 等格栅之界定該等孔之入口及出口之邊緣處。 為遵從此等渦流之效應，在一無塵室之習用格柵以上0.2 m之高度處產生微粒（30,000至35,000計數器/Cf)。圖2圖解闡 • 釋在該無塵室内各個高度處對微粒數量計數之結果（3〇,〇〇〇 至35,〇〇〇計數器/cf)。自圖2中所示結果可清楚地看出，微 粒因該等渦流而分佈至一 70公分之高度。 亦即，圍繞該格柵之孔所產生的該等渦流阻止迅速排出 二氣並導致污染物（特定而言，奈米微粒及AMC)到達距該 t柵（地板）南達7〇公分之一尚度。結果，位於無塵室内實施 製程之咼度之空氣受到污染。 【發明内容】 _ 本發明之一目的係提供一便於自一無塵室平穩及/或迅 速地排放空氣之袼栅。 而且，本發明另一目的係提供一無塵室系統，其中可自 ”亥無塵至中平穩及/或迅速地排放空氣，且系統無需一昂貴 之空調系統。 本發明之再一目的係提供一能夠使穿其之空氣中之渦流 最小化以防止污染物被吹向上方之格柵。 根據本發明之一態樣，一無塵室内使用袼柵之地板包括 具有複數個孔的基礎板，該複數個孔擔當經由其排放無 102823.doc .1279832 塵至内空氣之噴嘴。 4據本卷明之另一態樣，一無塵室系統包括I一無塵室; i、矾邠分’其包括位於該無塵室天花板内的一風扇及/或 一過濾器以將清潔空氣供應至該無塵室内；及一排氣部 刀八包括&又置於該無塵室地板内之格柵，該格柵界定經 由其排放該無塵室内空氣之複數個孔，且每一孔的橫截面 積首先沿自該格柵之頂部（一侧）至底部（另一側）之一方向 減小且隨後增加。 該等孔之每一個皆具有一經由其接收空氣之接收部分及 經由其排出空氣之排氣部分。該接收部分之橫截面積沿 一朝向該排氣部分之方向減小。該排氣部分之橫截面積沿 一朝向該接收部分之方向減小。 界定每一孔之接收部分及排氣部分的表面係呈平截頭圓 錐形或彎曲形。同樣，該等孔之截面形狀可呈圓形或細長 形。再進一步，每一孔亦可具有一在該接收部分與該排氣 • 部分之間延伸一有限距離之中間部分。該中間部分具有一 均一之橫截面積。 該袼柵亦可在其頂部處包括一聚氯乙稀瓦片。 【實施方式】 在下文中，將參照圖3至11更詳細地闡述本發明。於該等 圖式中’相同之付號用以表不相同之元件。 首先參照圖3，一無塵室系統l oo包括：一無塵室、一供 氣部分及一排氣部为。遠供氣部分包括一設置於無塵室 天花板内的風扇過;慮器單元1 2 0。風扇過渡器單元1 2 〇包括 102823.doc -1279832 整合為一個單元的一過清哭 、慮斋及一風扇，以將經過濾之空氣 供應至該無塵室内。儘管未顯示，但可在該無塵室天花板 内。又置天化板過滤器(例如，一高效能微粒空氣（HEpA) 過濾器或一超低穿透空氣（ULPA)過濾器）用於自該空氣中 清除雜質微粒，例如其平均直徑約為數個微米之灰塵。Manufactured under the pieces. Therefore, unlike many common products, semiconductor devices and liquid crystal displays (LCDs) need to be fabricated in extremely clean environments. In this regard, a plurality of semiconductor processing equipment are typically placed in a separate clean room in which the environment is maintained extremely clean. In a clean room, technicians are required to wear special dust-proof clothing to reduce the occurrence of foreign matter (such as dust). Also, the upper portion of the clean room is maintained at a pressure slightly above the pressure at the bottom of the clean room to allow air (clean air) to flow downward in the clean room. A grille (panel with holes) provides the floor of the clean room to vent air through the floor. Therefore, the contaminants carried by the clean room air are guided to the floor of the clean room and discharged to the outside through the holes of the grill. However, unlike particulates, molecular contaminants in the clean room air (which are called nanoparticles) and airborne molecular contaminants (AMC) are not easily removed. In fact, the differential pressure and airflow required to clean the nanoparticles and AMC in the clean room must be at least 18% higher than the differential pressure and airflow velocity of the particles. Needless to say, the operating cost of the air conditioning system that operates the clean room system to provide this high pressure differential and gas flow rate is extremely high. Similarly, it is extremely expensive to manufacture a conventional clean room system capable of producing the differential pressure and gas flow rate required to remove the 102823.doc .1279832 meters of particles and AMC. Also, as shown in Figure 1, eddy currents are created as air passes vertically through the holes in the grid. As indicated by the dashed lines in the figure, the eddy currents are mainly produced at the edges of the inlet and outlet defining the holes of the 'the same grid. In order to comply with the effects of these eddy currents, particles (30,000 to 35,000 counters/Cf) are produced at a height of 0.2 m above the conventional grid of the clean room. Figure 2 graphically illustrates the results of counting the number of particles at various heights in the clean room (3〇, 至 to 35, 〇〇〇 counter / cf). As is clear from the results shown in Fig. 2, the microparticles are distributed to a height of 70 cm by the eddy currents. That is, the eddy currents generated around the holes of the grid prevent rapid discharge of the two gases and cause contaminants (specifically, nanoparticles and AMCs) to reach the south of the t-grid (floor) by up to 7 cm. Shangdu. As a result, the air that is located in the clean room to perform the process is contaminated. SUMMARY OF THE INVENTION One object of the present invention is to provide a grid that facilitates smooth and/or rapid discharge of air from a clean room. Moreover, another object of the present invention is to provide a clean room system in which air can be discharged smoothly and/or rapidly from "dust-free to medium-duty", and the system does not require an expensive air-conditioning system. A further object of the present invention is to provide A floor capable of minimizing eddy currents in the air passing therethrough to prevent contaminants from being blown upwards. According to one aspect of the invention, a floor using a grate in a clean room includes a base plate having a plurality of holes, The plurality of holes serve as a nozzle through which no dust of 102823.doc.1279832 is discharged to the inner air. 4 According to another aspect of the present disclosure, a clean room system includes a clean room; i, a minute a fan and/or a filter located in the ceiling of the clean room to supply clean air to the clean room; and an exhaust knives including & a grill placed in the floor of the clean room The grid defines a plurality of apertures through which the clean room air is discharged, and the cross-sectional area of each aperture is first reduced in a direction from one of the top (one side) to the bottom (the other side) of the grid And then increase. Each of these holes has There is a receiving portion through which air is received and an exhaust portion through which air is discharged. The cross-sectional area of the receiving portion decreases in a direction toward the exhaust portion. The cross-sectional area of the exhaust portion is oriented toward the receiving The direction of the portion is reduced. The surface defining the receiving portion and the exhaust portion of each hole is frustoconical or curved. Similarly, the cross-sectional shape of the holes may be circular or elongated. Further, each A hole may also have an intermediate portion extending a limited distance between the receiving portion and the exhaust portion. The intermediate portion has a uniform cross-sectional area. The grid may also include a polychlorination at the top thereof. [Embodiment] Hereinafter, the present invention will be explained in more detail with reference to Figs. 3 to 11. In the drawings, the same symbols are used to denote different elements. Referring first to Fig. 3, The clean room system l oo includes: a clean room, a gas supply part and an exhaust part. The far air supply part comprises a fan disposed in the clean room ceiling; the filter unit 1 220. Unit 1 2 102823.doc -1279832 is integrated into a unit of crying, worrying and a fan to supply filtered air to the clean room. Although not shown, it can be in the clean room ceiling. A naturalized plate filter (eg, a high performance particulate air (HEpA) filter or an ultra low penetrating air (ULPA) filter) is used to remove foreign particles from the air, for example, having an average diameter of a few microns Dust.
空氣穿過風扇過濾器單元12〇並進入無塵室11〇，其中該 空氣形成一垂直流。此一垂直流迫使無塵室ιι〇内產生的污 染物下落至地板以防止污染物保持在實施製造製程之高 度。特定而言，藉由該排氣部分之一格栅13〇將此等污染物 與空氣一起排出。格柵130係藉由一支撐結構114而支撐於 該排氣部分之一副地板112上面。同樣，格柵13〇具有數個 貫通孔以便可將空氣自該無塵室排放至格栅13〇與副地板 112之間的一區域内。經由格柵13〇排放之空氣由風扇過濾 器單元120抽至天花板並藉由風扇過濾器單元12〇在該無塵 室内再循環。因此，該無麈室内之環境得以維持在極清潔 狀態。 現在，將參照圖3及4更詳細地闞述格柵130。 格柵130包括一由鋼、不銹鋼或鋁製成的基礎板132。亦 可使用諸如一複合材料之其它材料。格栅13 0可附裝至支撑 結構114或可自由地依靠在支撐結構114上。在任何狀況 下，可容易地自該支撐結構拆除格栅130，以允許夠及格柵 13 0與副地板112之間區域内的佈線、導管或其它基礎設施 116 〇 格柵130亦包括一由聚氯乙稀製成的瓦片133，瓦片133 102823.doc -1279832 係附裝至基礎板132之頂部表面以提供一保護表面。同樣， 格柵130可經處理以提供任何數量的所期望表面特徵。例 如，出於裝飾及功能性緣由，可用地毯或其它地板材料覆 蓋基礎板132以（例如）提供聲音衰減及導電率控制人同樣， 可給基礎板132塗佈樹脂或鍍金以提供所期望之特徵，例 如’靜電控制、耐磨性及防化學品保護。 參照圖4,格栅130之大小通常為6〇〇 mmx6〇〇mm。然而， φ 由於至少可藉由一模鑄製程容易地形成該基礎板，故該等 格栅可具有其它大小，例如75〇mmx75〇mm或5〇〇mmx5〇〇 mm。在任何狀況下，需根據該無塵室系統之支撐結構η# 確定格栅130之大小。 格柵130亦具有複數個經由其延伸的孔134。孔134構成該 無塵至内部空氣經由其排放至外部之通道（該區域剛好在 剎地板上面）。孔134係佈置成一圖案，該圖案既吸引亦便 於空氣流過該袼柵。根據本發明之一實施例，該格栅頂部 • 處之孔134之開口總面積約佔該頂部總面積的18%。 現在參照圖5A及5B，孔134之每一個皆包括··一在該格 柵一側處開口且經由其接收空氣之接收部分136、及一在該 格柵另一側處開口且經由其排出空氣之排氣部分138。接收 邛刀136呈錐形以使其橫截面積沿一朝向排氣部分138之方 向變小。類似地，排氣部分138呈錐形以使其橫截面積沿一 朝向接收部分136之方向變小。孔134之最窄部分L2之直徑 約為8.5 mm(等於習用袼栅中的孔直徑）。該孔之最寬部分 Ll之直徑約為10 mm。儘管圖5A中將孔134顯示為呈圓形， 102823.doc -10- 1279832 但孔134可係圖7中所示之細長形（呈狹縫形式）。 圖5中用虛線圖示穿過孔134之空氣流。如自圖5中所能看 見’形成孔134以使一平截頭錐形表面136a界定接收部分 136以使表面136&相對於空氣流過該無塵室之方向傾斜。因 此’可將與傾斜表面136a碰撞之空氣沿表面13如引導至排 氣部分138以使空氣平穩地流入該孔之接收部分136内。類 似地’一平截頭錐形表面13 8a界定排氣部分138以使排氣部 _ 分138a之寬度沿空氣流方向增大。因此，可將自接收部分 136流動至排氣部分138之空氣迅速地排出。 圖ό顯示一其地板係由習用格柵形成之無塵室qi内之差 壓與其地板係由本發明格柵形成之無塵室q2内之差壓之比 對。如自圖6中所能看見，無塵室(^之内部壓力降比無塵室 Q1之内部壓力降大2.379 Pa(42%之改良）。本發明所提供的 此一改良係因孔134所提供的一喷嘴（文丘裏）效應所致，其 中可使雨流及壓力增加減至最小。特定而言，在界定孔13 4 . 之入口及出口的格栅邊緣處幾乎不產生渦流。因此，可藉 由格柵130自該無塵室迅速地清除污染物（特定而言，奈米 微粒及AMC), 同樣，湍流之缺少可防止污染物被上吹至該無塵室内一 臨限高度。關於此方面，圖8顯示一穿過習用格柵之空氣之 湍流動能κι與穿過本發明格柵之空氣之端流動能κ2之間 的比較。如自圖8中所能看見，端流動能Κ2比端流動能κι 小37%。因此，其地板係由本發明格柵形成之無塵室内之 差塵大於其地板係由習用格柵形成之可比無塵室内之差 102823.doc 1279832 壓。而且，其地板係由本發明格柵形成之無塵室内空氣之 質量流量亦大於其地板係由習用格柵形成之可比無塵室内 空氣之質量流量。 圖9圖解闡釋一其地板係由本發明格栅形成之無塵室内 與一其地板係由習用格柵形成之可比無塵室内各個高度處 被粒數量之比較。出於提供此比較之目的，在該格栅以上 0.2 m之一高度處產生30,000至35,〇〇〇計數器/cf之微粒。此 外，風扇過濾器單元120内之空氣速度係〇·4 m/s。如自圖9 中所能看見，使用本發明之格栅時之臨限高度小於當使用 該習用格柵時的臨限高度40公分。 圖10圖解闡释一除孔134之形狀外其它類似於上述格栅 130之格柵130a。格柵130a之孔134a各具有：一接收部分 136、一排氣部分138、及一置於接收部分136與排氣部分 之間的中間部分140。中間部分14〇之橫截面直線延伸（平行 於該無塵室内空氣流動方向）且均一地位於接收部分136與 排氣部分138之間。孔134a内之空氣流動類似於結合圖从 及5B所述之孔134内之空氣流動。 圖11亦圖解闡釋一除孔134之形狀外其它類似於上述格 栅130之格柵面板130b。於此情形下’格㈣⑽之孔】^ 呈彎曲狀。更特定而言，每一 以 母孔134b皆包括一經由其接收 空氣之接收部分136b及一經由1祕山 丄由其排出空氣之排氣部分 138b。界定接收部分136b之基礎板表面呈彎曲狀以使接收 部分之橫截面積沿一朝向排氣部分膽之方向減小。而 且’界定排氣部分⑽之基礎板表面呈彎曲狀以使排氣部 102823.doc -12- 1279832 分138b之横截面積沿一朝向接收部分13讣之方向減小。如 同孔134,此等彎曲孔亦便於空氣之平穩流動（用虛線所示 如上所述，流過本發明袼柵之空氣之湍流動能可減至最 低且因此使空氣流率最大化並使壓力降損失最小化。因 此，該等微粒位於該袼柵以上之臨限高度相對低，例如， 當與先前技術比較時，低约40公分。因此，本發明在控制 無塵至内奈米被粒及AMC方面甚為有效。 最後，儘管上文已參照本發明數個較佳實施例闡述了使 用本發明格柵之格栅無塵室系統之結構及功能，但熟悉此 項技術者將明瞭本發明形式及細節之各種改變。因此，可 對該等較佳實施例做各種改變，而此並不背離隨附申請專 利範圍所界定的本發明之真實精神及範圍。 【圖式簡單說明】 現在’上文已參照附圖進一步詳細闡述了本發明。於該 等圖式中； 圖1係一开〉成一無塵室地板之習用格柵之剖視圖； 圖2係一圖解闡釋某些微粒在一無塵室之整個高度上分 佈之圖形，其中該無塵室係由習用格柵形成； 圖3係一根據本發明之無塵室系統之示意圖； 圖4係一根據本發明用於無塵室地板中之袼柵（面板）之 實施例之透視圖； 圖5A係一本發明袼栅之一部分之平面圖； 圖5B係一沿圖5中線B_B，截取之格柵之剖視圖； 圖6係一具有一藉由習用格柵形成之地板之無塵室中之 102823.doc -13· .1279832 差遷及一具有一藉由本發明柵格形成之地板之無塵室中之 差壓之圖形； 圖7係一本發明隔板（面板）之另一實施例之透視圖； 圖8係一圖解聞釋穿過習用格柵板之空氣湍流動能K1及 穿過本發明之格柵之空氣湍流動能尺2之圖形； 圖9係-圖解闡釋_其地板係藉由本發明格柵形成之益 塵f之整個高度上某些微粒之分佈與圖3中所示分佈之： 圖1 0係一本發明袼栅之另一 圖1 1像一本發明格柵之再一 【主要元件符號說明】 實施例之部分剖視圖； 實施例之剖視圖。 100 無塵室系統 110 無塵室 112 副地板 114 支撐結構 116 基礎設施 120 風扇過濾器單元 130 格拇 130a 格樹 13 0b 格撕 132 基礎板 133 瓦片 134 孔 134a 孔 102823.doc 1279832 134b 孔 136 接收部分 136a 表面 136b 接收部分 138 排氣部分 138a 平截頭表面 138b 排氣部分 140 中間部分 102823.doc -15-Air passes through the fan filter unit 12 and enters the clean room 11 , where the air forms a vertical flow. This vertical flow forces the contaminants produced in the clean room to fall to the floor to prevent contaminants from remaining at the height of the manufacturing process. In particular, the contaminants are discharged together with the air by a grid 13 of the exhaust portion. The grid 130 is supported on the sub-floor 112 of one of the exhaust portions by a support structure 114. Similarly, the grill 13 has a plurality of through holes for discharging air from the clean room to an area between the grill 13 〇 and the sub floor 112. The air discharged through the grill 13 is drawn by the fan filter unit 120 to the ceiling and recirculated in the clean room by the fan filter unit 12. Therefore, the environment in the flawless room is maintained in an extremely clean state. Now, the grid 130 will be described in more detail with reference to FIGS. 3 and 4. The grill 130 includes a base plate 132 made of steel, stainless steel or aluminum. Other materials such as a composite material can also be used. The grill 130 can be attached to the support structure 114 or can be freely supported on the support structure 114. In any event, the grille 130 can be easily removed from the support structure to allow access to wiring, conduits or other infrastructure 116 in the area between the grille 110 and the sub-floor 112. A tile 133 made of polyvinyl chloride, tile 133 102823.doc -1279832 is attached to the top surface of the base plate 132 to provide a protective surface. Likewise, the grid 130 can be treated to provide any number of desired surface features. For example, for reasons of decoration and functionality, the base panel 132 may be covered with carpet or other flooring material to, for example, provide sound attenuation and conductivity control. Similarly, the base panel 132 may be coated with resin or gold to provide the desired characteristics. For example, 'static control, wear resistance and chemical protection. Referring to Figure 4, the size of the grid 130 is typically 6 mm x 6 mm. However, since the base plate can be easily formed at least by a molding process, the grids can have other sizes, such as 75 mm x 75 mm or 5 mm x 5 mm. In any case, the size of the grid 130 is determined according to the support structure η# of the clean room system. The grid 130 also has a plurality of apertures 134 extending therethrough. The aperture 134 constitutes a passage through which it is dust-free to the outside air (which is just above the brake floor). The apertures 134 are arranged in a pattern that attracts and facilitates the flow of air through the grid. According to one embodiment of the invention, the total area of the opening of the aperture 134 at the top of the grid is approximately 18% of the total area of the top. Referring now to Figures 5A and 5B, each of the apertures 134 includes a receiving portion 136 that is open at one side of the grille and receives air therethrough, and an opening at the other side of the grill and is discharged therethrough. The exhaust portion 138 of the air. The receiving trowel 136 is tapered such that its cross-sectional area becomes smaller in a direction toward the exhaust portion 138. Similarly, the exhaust portion 138 is tapered such that its cross-sectional area becomes smaller in a direction toward the receiving portion 136. The narrowest portion L2 of the aperture 134 has a diameter of about 8.5 mm (equal to the diameter of the aperture in the conventional grid). The widest portion L1 of the hole has a diameter of about 10 mm. Although aperture 134 is shown as being circular in Figure 5A, 102823.doc -10- 1279832, aperture 134 may be elongated (in the form of a slit) as shown in FIG. The flow of air through the aperture 134 is illustrated in dashed lines in FIG. As can be seen from Figure 5, the aperture 134 is formed such that a frustum tapered surface 136a defines the receiving portion 136 such that the surface 136 & is inclined relative to the direction in which air flows through the clean room. Therefore, the air colliding with the inclined surface 136a can be guided along the surface 13 to the exhaust portion 138 to smoothly flow the air into the receiving portion 136 of the hole. Similarly, a frustum-conical surface 13 8a defines an exhaust portion 138 to increase the width of the exhaust portion 138a in the direction of air flow. Therefore, the air flowing from the receiving portion 136 to the exhaust portion 138 can be quickly discharged. The figure shows a comparison between the difference between the pressure in the clean room qi formed by the conventional grille and the floor space in the clean room q2 formed by the grid of the present invention. As can be seen from Fig. 6, the internal pressure drop of the clean room (^ is greater than the internal pressure drop of the clean room Q1 by 2.379 Pa (42% improvement). The improvement provided by the present invention is due to the hole 134. Provided by a nozzle (venturi) effect in which rain flow and pressure increase are minimized. In particular, eddy currents are hardly generated at the edge of the grid defining the entrance and exit of the aperture 13 . The contaminants (specifically, nanoparticles and AMC) can be quickly removed from the clean room by the grid 130. Similarly, the lack of turbulence prevents the contaminants from being blown up to a threshold height within the clean room. In this regard, Figure 8 shows a comparison between the flow energy of a gas passing through a conventional grid and the flow energy κ2 of the air passing through the grid of the present invention. As can be seen from Figure 8, the end flow energy Κ2 is 37% smaller than the end flow energy κι. Therefore, the difference in the dust in the clean room formed by the grid of the present invention is greater than the difference between the floor and the clean room formed by the conventional grid 102822.doc 1279832. , the floor is a clean indoor space formed by the grid of the invention The mass flow rate of the gas is also greater than the mass flow rate of the comparable clean room air formed by the conventional grille. Figure 9 illustrates a clean room in which the floor is formed by the grille of the present invention and a floor is used by the conventional grille. A comparison of the number of granules formed at each height in the clean room. For the purpose of providing this comparison, 30,000 to 35 〇〇〇 counter/cf particles are produced at a height of 0.2 m above the grid. The air velocity in the fan filter unit 120 is 44 m/s. As can be seen from Figure 9, the threshold height when using the grid of the present invention is less than the threshold height 40 when using the conventional grid. Figure 10 illustrates a grid 130a similar to the shape of the apertures 134 except for the shape of the apertures 134. The apertures 134a of the grid 130a each have a receiving portion 136, an exhaust portion 138, and a The intermediate portion 140 between the receiving portion 136 and the exhaust portion. The cross section of the intermediate portion 14A extends linearly (parallel to the direction of flow of the clean room air) and is uniformly located between the receiving portion 136 and the exhaust portion 138. Within 134a The air flow is similar to the air flow in the holes 134 as described in connection with Figures 5B. Figure 11 also illustrates a grille panel 130b similar to the shape of the apertures 134 described above except for the shape of the apertures 134. (4) The hole of (10) is curved. More specifically, each of the parent holes 134b includes a receiving portion 136b through which air is received and an exhaust portion 138b through which air is exhausted via a secret mountain. The surface of the base plate of the portion 136b is curved such that the cross-sectional area of the receiving portion decreases in a direction toward the exhaust portion of the exhaust portion, and the surface of the base plate defining the exhaust portion (10) is curved to allow the exhaust portion 102823. The cross-sectional area of the doc -12- 1279832 sub-138b decreases in a direction toward the receiving portion 13讣. Like the holes 134, these curved holes also facilitate the smooth flow of air (as indicated by the dashed lines, as described above, the flow energy of the air flowing through the yoke of the present invention can be minimized and thus the air flow rate is maximized and the pressure is lowered. The loss is minimized. Therefore, the particles are located at a relatively low threshold height above the grid, for example, about 40 centimeters lower when compared to the prior art. Thus, the present invention controls dust-free to endogenous granules and The AMC aspect is very effective. Finally, although the structure and function of the grid clean room system using the grid of the present invention have been described above with reference to several preferred embodiments of the present invention, those skilled in the art will appreciate the present invention. Various changes in form and detail are made. Therefore, various changes may be made to the preferred embodiments without departing from the true spirit and scope of the invention as defined by the appended claims. The invention has been described in detail above with reference to the accompanying drawings in which: Fig. 1 is a cross-sectional view of a conventional grille for a clean room floor; Fig. 2 is a schematic illustration of some micro a pattern distributed over the entire height of a clean room, wherein the clean room is formed by a conventional grid; FIG. 3 is a schematic view of a clean room system according to the present invention; FIG. 4 is a Figure 5A is a plan view of a portion of a grid of the present invention; Figure 5B is a cross-sectional view of the grid taken along line B_B of Figure 5; Figure 6 A pattern of 102823.doc -13· .1279832 in a clean room having a floor formed by a conventional grid and a differential pressure in a clean room having a floor formed by the grid of the present invention Figure 7 is a perspective view of another embodiment of a spacer (panel) of the present invention; Figure 8 is a diagram illustrating the air turbulent flow energy K1 passing through a conventional grid plate and the air turbulence passing through the grid of the present invention. Figure 9 is a graphical representation of the distribution of certain particles over the entire height of the dust f formed by the grid of the present invention and the distribution shown in Figure 3: Figure 1 0 Another Figure 1 1 of the invention is like a grid of the invention. A partial cross-sectional view of the embodiment; a cross-sectional view of the embodiment. 100 Clean room system 110 Clean room 112 Sub floor 114 Support structure 116 Infrastructure 120 Fan filter unit 130 Block thumb 103a Grid 13 0b Grid tear 132 Base plate 133 Tile 134 hole 134a hole 102823.doc 1279832 134b hole 136 receiving portion 136a surface 136b receiving portion 138 exhaust portion 138a frustum surface 138b exhaust portion 140 intermediate portion 102823.doc -15-