TW525039B - Photoimageable composition containing flexible oligomer - Google Patents
Photoimageable composition containing flexible oligomer Download PDFInfo
- Publication number
- TW525039B TW525039B TW089121557A TW89121557A TW525039B TW 525039 B TW525039 B TW 525039B TW 089121557 A TW089121557 A TW 089121557A TW 89121557 A TW89121557 A TW 89121557A TW 525039 B TW525039 B TW 525039B
- Authority
- TW
- Taiwan
- Prior art keywords
- weight
- component
- oligomer
- group
- photoimageable composition
- Prior art date
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- 239000000203 mixture Substances 0.000 title claims abstract description 50
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 12
- 239000003822 epoxy resin Substances 0.000 claims description 24
- 229920000647 polyepoxide Polymers 0.000 claims description 24
- 229920000642 polymer Polymers 0.000 claims description 22
- 239000002253 acid Substances 0.000 claims description 16
- 239000000178 monomer Substances 0.000 claims description 13
- 239000011230 binding agent Substances 0.000 claims description 12
- 150000002009 diols Chemical class 0.000 claims description 10
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 claims description 6
- 239000007864 aqueous solution Substances 0.000 claims description 5
- 239000004848 polyfunctional curative Substances 0.000 claims description 5
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- 229920000728 polyester Polymers 0.000 claims description 4
- 239000004615 ingredient Substances 0.000 claims description 3
- 229920005989 resin Polymers 0.000 claims description 3
- 239000011347 resin Substances 0.000 claims description 3
- 239000004721 Polyphenylene oxide Substances 0.000 claims description 2
- 125000002947 alkylene group Chemical group 0.000 claims description 2
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 239000001301 oxygen Substances 0.000 claims description 2
- 229920000570 polyether Polymers 0.000 claims description 2
- 229920002554 vinyl polymer Polymers 0.000 claims description 2
- 239000007789 gas Substances 0.000 claims 1
- 229920000151 polyglycol Polymers 0.000 claims 1
- 239000010695 polyglycol Substances 0.000 claims 1
- 229910000679 solder Inorganic materials 0.000 abstract description 29
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 abstract description 24
- 229910052759 nickel Inorganic materials 0.000 abstract description 12
- 229910052737 gold Inorganic materials 0.000 abstract description 11
- 239000010931 gold Substances 0.000 abstract description 11
- 238000007747 plating Methods 0.000 abstract description 8
- 239000004593 Epoxy Substances 0.000 abstract description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-M acrylate group Chemical group C(C=C)(=O)[O-] NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 15
- 125000005442 diisocyanate group Chemical group 0.000 description 11
- 238000000034 method Methods 0.000 description 11
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 10
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 10
- 238000003384 imaging method Methods 0.000 description 10
- 239000000126 substance Substances 0.000 description 10
- -1 alkylene glycol Chemical compound 0.000 description 9
- 239000007788 liquid Substances 0.000 description 9
- 239000007787 solid Substances 0.000 description 9
- 239000002904 solvent Substances 0.000 description 7
- 239000000052 vinegar Substances 0.000 description 7
- 235000021419 vinegar Nutrition 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 5
- 238000011049 filling Methods 0.000 description 5
- HCLJOFJIQIJXHS-UHFFFAOYSA-N 2-[2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOCCOC(=O)C=C HCLJOFJIQIJXHS-UHFFFAOYSA-N 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 230000002079 cooperative effect Effects 0.000 description 4
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- KUBDPQJOLOUJRM-UHFFFAOYSA-N 2-(chloromethyl)oxirane;4-[2-(4-hydroxyphenyl)propan-2-yl]phenol Chemical compound ClCC1CO1.C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 KUBDPQJOLOUJRM-UHFFFAOYSA-N 0.000 description 3
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 3
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 3
- 239000002998 adhesive polymer Substances 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 238000007772 electroless plating Methods 0.000 description 3
- 238000009472 formulation Methods 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 239000012948 isocyanate Substances 0.000 description 3
- 150000002513 isocyanates Chemical class 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 239000007858 starting material Substances 0.000 description 3
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 description 2
- HSOOIVBINKDISP-UHFFFAOYSA-N 1-(2-methylprop-2-enoyloxy)butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(CCC)OC(=O)C(C)=C HSOOIVBINKDISP-UHFFFAOYSA-N 0.000 description 2
- NVZWEEGUWXZOKI-UHFFFAOYSA-N 1-ethenyl-2-methylbenzene Chemical compound CC1=CC=CC=C1C=C NVZWEEGUWXZOKI-UHFFFAOYSA-N 0.000 description 2
- INQDDHNZXOAFFD-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOC(=O)C=C INQDDHNZXOAFFD-UHFFFAOYSA-N 0.000 description 2
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 2
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
- JSGVZVOGOQILFM-UHFFFAOYSA-N 3-methoxy-1-butanol Chemical compound COC(C)CCO JSGVZVOGOQILFM-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- 102100026735 Coagulation factor VIII Human genes 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- 101000911390 Homo sapiens Coagulation factor VIII Proteins 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- 239000012965 benzophenone Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000007766 curtain coating Methods 0.000 description 2
- 125000004386 diacrylate group Chemical group 0.000 description 2
- JBKVHLHDHHXQEQ-UHFFFAOYSA-N epsilon-caprolactam Chemical compound O=C1CCCCCN1 JBKVHLHDHHXQEQ-UHFFFAOYSA-N 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- HJOVHMDZYOCNQW-UHFFFAOYSA-N isophorone Chemical compound CC1=CC(=O)CC(C)(C)C1 HJOVHMDZYOCNQW-UHFFFAOYSA-N 0.000 description 2
- 238000013508 migration Methods 0.000 description 2
- 230000005012 migration Effects 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 229920001451 polypropylene glycol Polymers 0.000 description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 239000012085 test solution Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 1
- LGPAKRMZNPYPMG-UHFFFAOYSA-N (3-hydroxy-2-prop-2-enoyloxypropyl) prop-2-enoate Chemical compound C=CC(=O)OC(CO)COC(=O)C=C LGPAKRMZNPYPMG-UHFFFAOYSA-N 0.000 description 1
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 1
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 1
- ZDQNWDNMNKSMHI-UHFFFAOYSA-N 1-[2-(2-prop-2-enoyloxypropoxy)propoxy]propan-2-yl prop-2-enoate Chemical compound C=CC(=O)OC(C)COC(C)COCC(C)OC(=O)C=C ZDQNWDNMNKSMHI-UHFFFAOYSA-N 0.000 description 1
- KFQPRNVTVMCYEH-UHFFFAOYSA-N 1-amino-3-(4-methoxyphenoxy)propan-2-ol Chemical compound COC1=CC=C(OCC(O)CN)C=C1 KFQPRNVTVMCYEH-UHFFFAOYSA-N 0.000 description 1
- PAUHLEIGHAUFAK-UHFFFAOYSA-N 1-isocyanato-1-[(1-isocyanatocyclohexyl)methyl]cyclohexane Chemical compound C1CCCCC1(N=C=O)CC1(N=C=O)CCCCC1 PAUHLEIGHAUFAK-UHFFFAOYSA-N 0.000 description 1
- NFGXHKASABOEEW-UHFFFAOYSA-N 1-methylethyl 11-methoxy-3,7,11-trimethyl-2,4-dodecadienoate Chemical compound COC(C)(C)CCCC(C)CC=CC(C)=CC(=O)OC(C)C NFGXHKASABOEEW-UHFFFAOYSA-N 0.000 description 1
- HGWZSJBCZYDDHY-UHFFFAOYSA-N 1-prop-2-enoyloxydecyl prop-2-enoate Chemical compound CCCCCCCCCC(OC(=O)C=C)OC(=O)C=C HGWZSJBCZYDDHY-UHFFFAOYSA-N 0.000 description 1
- OYKPJMYWPYIXGG-UHFFFAOYSA-N 2,2-dimethylbutane;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.CCC(C)(C)C OYKPJMYWPYIXGG-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- BSYVFGQQLJNJJG-UHFFFAOYSA-N 2-[2-(2-aminophenyl)sulfanylethylsulfanyl]aniline Chemical compound NC1=CC=CC=C1SCCSC1=CC=CC=C1N BSYVFGQQLJNJJG-UHFFFAOYSA-N 0.000 description 1
- HWSSEYVMGDIFMH-UHFFFAOYSA-N 2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOC(=O)C(C)=C HWSSEYVMGDIFMH-UHFFFAOYSA-N 0.000 description 1
- VUACHMISLJXEHG-UHFFFAOYSA-N 2-aminoacetic acid;2-methylpropanoic acid Chemical compound NCC(O)=O.CC(C)C(O)=O VUACHMISLJXEHG-UHFFFAOYSA-N 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- IXPWKHNDQICVPZ-UHFFFAOYSA-N 2-methylhex-1-en-3-yne Chemical compound CCC#CC(C)=C IXPWKHNDQICVPZ-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- HLCKAPCJELMQHY-UHFFFAOYSA-N 2-methylprop-2-enoic acid prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.CC(=C)C(O)=O HLCKAPCJELMQHY-UHFFFAOYSA-N 0.000 description 1
- AMZYBHJVRAMIKM-UHFFFAOYSA-N 2-methylprop-2-enoic acid;2,2,4-trimethylpentane-1,3-diol Chemical compound CC(=C)C(O)=O.CC(=C)C(O)=O.CC(C)C(O)C(C)(C)CO AMZYBHJVRAMIKM-UHFFFAOYSA-N 0.000 description 1
- KTALPKYXQZGAEG-UHFFFAOYSA-N 2-propan-2-ylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC=C3SC2=C1 KTALPKYXQZGAEG-UHFFFAOYSA-N 0.000 description 1
- HTWRFCRQSLVESJ-UHFFFAOYSA-N 3-(2-methylprop-2-enoyloxy)propyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCOC(=O)C(C)=C HTWRFCRQSLVESJ-UHFFFAOYSA-N 0.000 description 1
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 1
- SXIFAEWFOJETOA-UHFFFAOYSA-N 4-hydroxy-butyl Chemical group [CH2]CCCO SXIFAEWFOJETOA-UHFFFAOYSA-N 0.000 description 1
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- FVCSARBUZVPSQF-UHFFFAOYSA-N 5-(2,4-dioxooxolan-3-yl)-7-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C(C(OC2=O)=O)C2C(C)=CC1C1C(=O)COC1=O FVCSARBUZVPSQF-UHFFFAOYSA-N 0.000 description 1
- NUXLDNTZFXDNBA-UHFFFAOYSA-N 6-bromo-2-methyl-4h-1,4-benzoxazin-3-one Chemical compound C1=C(Br)C=C2NC(=O)C(C)OC2=C1 NUXLDNTZFXDNBA-UHFFFAOYSA-N 0.000 description 1
- AIILCCJVSYYRJJ-UHFFFAOYSA-N CC=C(CCO)OP(O)=O Chemical compound CC=C(CCO)OP(O)=O AIILCCJVSYYRJJ-UHFFFAOYSA-N 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- 235000005979 Citrus limon Nutrition 0.000 description 1
- 244000131522 Citrus pyriformis Species 0.000 description 1
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
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- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 description 1
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- 238000009835 boiling Methods 0.000 description 1
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- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
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- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
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- 125000004122 cyclic group Chemical group 0.000 description 1
- ISAOCJYIOMOJEB-UHFFFAOYSA-N desyl alcohol Natural products C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- KIQKWYUGPPFMBV-UHFFFAOYSA-N diisocyanatomethane Chemical compound O=C=NCN=C=O KIQKWYUGPPFMBV-UHFFFAOYSA-N 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- XTDYIOOONNVFMA-UHFFFAOYSA-N dimethyl pentanedioate Chemical compound COC(=O)CCCC(=O)OC XTDYIOOONNVFMA-UHFFFAOYSA-N 0.000 description 1
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- FFYWKOUKJFCBAM-UHFFFAOYSA-N ethenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC=C FFYWKOUKJFCBAM-UHFFFAOYSA-N 0.000 description 1
- BLCTWBJQROOONQ-UHFFFAOYSA-N ethenyl prop-2-enoate Chemical compound C=COC(=O)C=C BLCTWBJQROOONQ-UHFFFAOYSA-N 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 239000003517 fume Substances 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- MSNOMDLPLDYDME-UHFFFAOYSA-N gold nickel Chemical compound [Ni].[Au] MSNOMDLPLDYDME-UHFFFAOYSA-N 0.000 description 1
- 239000001056 green pigment Substances 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- ACCCMOQWYVYDOT-UHFFFAOYSA-N hexane-1,1-diol Chemical compound CCCCCC(O)O ACCCMOQWYVYDOT-UHFFFAOYSA-N 0.000 description 1
- LNMQRPPRQDGUDR-UHFFFAOYSA-N hexyl prop-2-enoate Chemical compound CCCCCCOC(=O)C=C LNMQRPPRQDGUDR-UHFFFAOYSA-N 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
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- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
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- 239000011976 maleic acid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical group O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
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- 230000002028 premature Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- JFCUWDUNXUZOQZ-UHFFFAOYSA-N propane-1,2,3-triol prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(O)CO JFCUWDUNXUZOQZ-UHFFFAOYSA-N 0.000 description 1
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- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
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- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
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- C08F220/365—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate containing further carboxylic moieties
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
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- C—CHEMISTRY; METALLURGY
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
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- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
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Description
525039 A7 B7 五、發明說明(i ) [發明領域] 本發明係有關形成電子電路之光阻劑有用的光可成像 組成物。尤其本發明之有利特徵係有關用作焊料遮罩之光 阻劑,該焊料遮罩尤指歷經諸如鎳/金無電電鍍的嚴酷加工 條件者。 [發明背景]
依據本發明之新穎寡聚物可使光成像後之光阻劑具有 撓性。此種撓性係所有光阻劑組成物之所需,包括主要成 像光阻劑。 然而,目前該新穎寡聚物之最主要功效為形成焊料遮 罩之光可成像組成物。此類光阻劑在印刷電路板上形成堅 硬之永久層。焊料遮罩必須為堅硬、耐久 '且對化學物(如 有機溶劑及強酸與強鹼)。此焊料遮罩須符合IPC/ANSI SM-840B Tablel2 tests, Summary of Criteria for Qualification/Conformance(Institute for Interconnecting Circuits)之標準。本發明中,焊料遮罩係定義為符合這些 測試標準之層狀物。在鹼性水溶液中可顯像之形成焊料遮 罩的組成物實例可見於美國專利第5,229,252號及第 5,364,736號,茲引用其揭示内容作為參考。 先前’焊料係直接施用於銅電子電路跡線的外露焊塾 上,使其表面構裝元件等之電連結。直接焊接電路跡線的 問題包含焊料耗費,焊料毒性,銅往焊料遷移,及焊料失 去光澤。一種改善之製程涉及以鎳/金電鍍焊墊製作電連 結。首先將外露焊墊用鎳以無電製程電鍍出厚度約1〇〇微 Ϊ紙張尺度適用中國國家標準(CNS)?Vi規格⑵“视公爱) 91670 525039 A7 --------— B7 ______ 五、發明說明(2 ) 对至300微忖之間。然後以無電製程在鎳上電鍍成例如6 微吋之薄金層。鎳/金電鍍之優點在於鍍層平坦,鎳金層也 有助於防止鋼之遷移。並且,金層也不會失去光澤。 然而’這些無電電鍍製程條件嚴酷,焊料遮罩須能承 文該電鍍條件。特別是,鎳之無電電鍍通常係於約9(rc進 行15分鐘。如此,經常在焊墊周圍區域觀察到焊料遮罩之 剝離。 形成焊料遮罩的光可成像組成物之較低分子量黏結劑 聚合物通常在製程中較少收縮,因而焊料遮罩之剝離較少 發生。然而’較低分子量黏結劑聚合物傾向發黏,此乃不 利特徵,因為,必須作接觸成像需要極大解析度,亦即, 原圖與光可成像組成物必須直接接觸。 較高分子量黏結劑聚合物固可減少發黏,但卻較易收 縮,在鎳/金電鍍中可能導致較大量的悍料遮罩之剝離。 本發明係針對可減少特性上妥協犧牲之可撓性光可聚 合寡聚物,例如,曝露在鎳/金電鍍中焊料遮罩組成物的發 黏對剝離。 經濟部智慧財產局員工消費合作社印製 [發明概要] 本發明提供一種具有四個丙烯酸酯官能度以利充分光 聚合及撓性之寡聚物。該丙烯酸酯官能基寡聚物可有利地 應用於主要成像阻劑。該募聚物之最重要優點,目前卻用 於形成焊料遮罩之光可成像組成物,特別是用於形成隨後 將會曝露於鎳/金電鍍或類似嚴酷製程條件之焊料遮罩的 組成物。 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公.¾ ) 2 91670 525039 五、發明說明(3 ) 本發明之寡聚物具有一般式(I) ·· (ch2=ch(h 或 ch3)-co-x-r-ch(oz)_ch2-o-4>)2_C(CH3)2 其中R係碳原子數1至40之伸烷基; X係無,或選自伸烷二醇,聚酯二醇及聚醚二醇所構 成之群組而分子量在50至2,800間的二醇;而 z具有下式: -C0-NH-Y-NH-C0-0(-X,-0-C0-NH-Y_NH-C0-0)d 0-C0-CH(H 或 CH3) = CH2 ; 其中Y係伸烷基或芳香族烴基,· η = 1至4,以1為佳; X’係選自伸烷二醇,聚酯二醇及聚醚二醇所構成之群 組的二醇;而 Q係碳原子數2至6之伸燒基。 根據本發明之主要成像光阻劑包含,相對於成份(Α) 加成份(Β)之重量: (Α)在約30至約80重量%間的黏結劑聚合物,具有 足夠之叛酸官能度而使光阻劑得以用鹼性水溶液顯像; (Β)約20至約70重量%間的光可聚合成份,包括“, 点-乙烯型之不飽和寡聚物,及另外視需要添加之α,^_’ 乙浠型之不飽和單體,相對於成份(α)μ包括式(1)寡聚物 之成份(Β)的總重量,至少約2重量% ,而較佳者至少約 35重量% ;以及 (C)約0.1至約10重量%間的光啟始劑化學品。 用來形成永久層(諸如焊料遮罩)之光可成像组成物進 ^纸張尺度適用t關家鮮(CNS)A找格(210 X 297公f )— 91670 525039
而包括與成份(A)隔離之(D)環氧樹脂,其含量相對於成份 (A)加成份(B)之總重量係在約5至約4〇重量%間。含有成 份(D)之組成物較佳亦含有(E)環氧樹脂交聯劑及/或環氧 樹脂硬化觸媒,其含量相對於成份(A)加成份之總重量 係在約1至約10重量%間。 [發明之較佳實施形態] 本發明之新穎募聚物可以簡便地利用市售具有一般式 (II) ·· (CH2=CH(H 或 CH3)-C0HCH(0H)-CH2-0,2- C(C Η3)2(其中X及r係如上述)之雙紛a環氧丙烯酸醋製 備。此類雙酚A環氧丙烯酸酯之分子量係在約500至約 1500之範圍。此種市售化合物之實例包含
Novacure®3701,Ebecryl®600 及 ECIST⑧ 117。這些市售化合 經濟部智慧財產局員工消費合作社印製 物雖具有二丙烯酸酯官能度,但卻不採用於近日之光可成 像組成物’主要係由於其相對於每一丙烯酸酯官能度之分 子量比較大’以致於若用在光可成像組成物則其光反應速 率不足。根據本發明,這些雙酚A環氧丙烯酸酯係經改質 成在券聚物分子内具有另外的丙烯酸酯官能度,以使丙烯 酸酯官能度不受立體障礙而參與光聚合反應,可提供適當 之光反應速率。同時,本發明之寡聚物因具可撓性,可提 供光成像後之組成物撓性。該撓性特別有助於在嚴酷製程 條件下’諸如在鎳/金電鍍中,減少焊料遮罩的剝離。因此, 可以採用較高分子量之黏結劑聚合物,因而可以減少發 黏。是故,依據本發明,較佳之焊料遮罩組成物可以作接 觸成像’具適當之光反應速率,並能承受鎳/金電鍍條件。 本纸張尺度適用中國國家標準(CNS)A4規格(21〇 297公釐) 4 91670 經濟部智慧財產局員工消費合作社印製 525039 A7 '------ B7_____ 五、發明說明(5 ) 須指出在式(Π)中,除雙酚A環氧丙烯酸酯之二個丙 稀酸酿官能度之外,這些化合物並具有二個羥基官能度, 可用以連結式(1)之Z基團,附加二個額外的丙烯酸酯官能 度。 在目刚之較佳合成途徑中,該雙酚A環氧丙烯酸酯係 與一異氰酸酯反應,二莫耳二異氰酸酯以其一端連結於各 經基官能度,以提供可作進一步反應之二個異氰酸酯基 ►團。該二異氰酸酯可為任何常用之二異氰酸酯,諸如六伸 甲基二異氰酸酯(HDI),異佛爾酮二異氰酸酯(IPDI),伸甲 基二異氰酸酯(MDI),伸甲基雙環己基異氰酸酯,三甲基 六甲基二異氰酸酯,己烷二異氰酸酯,六甲胺二異氰酸酯, 甲苯二異氰酸酯,12-二苯基乙烷二異氰酸酯,1,3-二苯基 丙烧二異氰酸酯,二苯基甲烷二異氰酸酯,二環己基甲基 二異氰酸酯等。較佳者,為達寡聚物之極大撓性,二異氰 酸醋係諸如HDI之脂肪族二異氰酸酯。此時,該分子具有 二異氰酸酯官能度。 然後該分子鏈再藉由與二莫耳二醇(諸如己二醇),聚 伸烷基二醇(諸如聚乙二醇或聚丙二醇),或具有羥基官能 基之聚醋寡聚物反應加以延伸。在合成中之此階段’分子 又再度具有二羥基官能度。 然後,分子鏈再度與二莫耳二異氰酸酯反應而進一步 延伸,再度使分子具有二異氰酸酯官能度。 此階段,分子鏈可以反覆與二醇及二異氰酸醋反應而 進一步延伸。然而,由於會傾向降低光反應速率而無法相 本紙張尺度適用中國國家標準(CNSM4規格(210 x 297公釐) 5 91670 ^--------^---------^ (請先閱讀背面之注咅?事項再填寫本頁) 525039 A7 B7 經 濟 部 智 慧 財 產 局 員 工 消 費 合 作 社 印 製 五、發明說明(6 ) 當提升寡聚物之撓性,通常已無須進一步提高分子量。 反而’此階段該具二異氰酸醋官能基之寡聚物係與二 莫耳具羥基官能基之(甲基)丙烯酸酯反應,例如甲基丙烯 酸羥乙酯或丙烯酸4-羥丁酯(4HBA),形成丙烯酸酯末端 基。如此合成之寡聚物具有四個丙烯酸酯官能度,其相互 之間相距夠遠而在光聚合反應中可以自由反應。完成後之 募聚物分子量介於約5 00至約2,000間。 黏結劑聚合物一般係由〇J,沒-乙浠型不飽和單體製 成。部份適用的酸官能性單體之特定實例為丙烯酸,曱基 丙烯酸,馬來酸,富馬酸,檸康酸,2 -羥乙基丙烯醯基磷 酸酯,2-羥丙基丙烯醯基磷酸酯,2_羥基—α—丙烯醯基磷 酸醋等。這些酸官能性單體可以一種或一種以上用於製造 黏結劑聚合物。這些酸官能性單體可與非酸官能性單體共 聚合,例如丙烯酸酯,諸如丙烯酸甲酯,甲基丙烯酸甲酯, 丙烯酸羥乙酯,甲基丙烯酸丁酯,丙烯酸辛酯,甲基丙烯 酸2-乙氧基乙酯,丙烯酸第三丁酯,丨,5—戊二醇二丙烯酸 酯,丙烯酸Ν,Ν-二乙胺基乙酯,乙二醇二丙烯酸酯,υ一 丙二醇二丙烯酸酯,癸二醇二丙烯酸酯, 稀酸醋,一烧二醇二丙稀酸醋,2,2-二 二丙烯酸酯,甘油二丙烯酸酯’三丙二醇二丙烯酸酯,甘 油三丙稀酸醋,2,2-二(對經苯基)丙院二甲基丙稀酸醋, 三乙二醇二丙烯酸醋,聚氧乙基_2,2_二(對經笨基)丙烧二 甲基丙缔酸醋,三乙二醇二甲基丙稀酸醋,聚氧丙基三經 甲基丙燒三丙稀酸醋’乙二醇二甲基丙稀酸醋,丁二醇二 本紙張尺度適Μ國縣鮮(CNS) A4規格(21〇 297公釐) 91670 (請先閱讀背面之注意事項再填寫本頁) 11---J I ^ ---------' 525039 " A7 ^ __B7
經濟部智慧財產局員工消費合作社印製 五、發明說明(7) 甲基丙烯酸酯,1,3-丙二醇二甲基丙烯酸酯,丁二醇二甲 基丙烯酸酯,1,2, 4-丁三醇三甲基丙烯酸酯,2, 2, 4-三甲 基-1,3 -戊二醇二甲基丙烯酸g旨,異戊四醇三甲基丙稀酸 醋,1-苯基伸乙基_1,2-二甲基丙稀酸醋,異戊四醇四甲基 丙烯酸酯,三羥甲基丙烷三甲基丙烯酸酯,1,5-戊二醇二 甲基丙烯酸酯,及1,4-苯二酚二甲基丙烯酸酯;苯乙烯及 有取代基之苯乙烯,諸如2-甲基苯乙烯及乙烯甲笨;及乙 |烯酯類,諸如丙烯酸乙烯酯及甲基丙烯酸乙烯酯,以提供 所需之酸值。 光成像後之組成物若需具較高之交聯密度,可以如美 國專利5, 698, 370號所揭示,於黏結劑聚合物(A)内導入丙 烯酸酯官能度。於該專利中,聚合物主鏈上之馬來酐基團 係以具羥基官能基之丙烯酸酯作半酯化反應,該具羥基之 丙烯酸酯有’例如,(甲基)丙烯酸羥乙酯或(甲基)丙烯酸 4-羥丁酯。 _ 該黏結劑聚合物之重量平均分子量可分佈在約 20, 000至約200, 〇〇〇之範圍。對主要成像阻劑而言,較佳 之重量平均分子量係在約80, 000至約150, 000間。對形成 焊料遮罩之組成物而言,則較佳之重量平均分子量係在約 2, 000至約1〇〇, 〇〇〇間。為使該組成物得以用鹼性水溶液 顯像,則酸值須在約120至約300間,較佳者在約150至 約250間。 為能成像,本負作用型光可成像組成物含有光可聚合 成份(B),其中包含上述式(丨)之寡聚物。式(1)之寡聚物可 本紙張尺度適用中國國家標準(CNS)A4規格 (210 x 297 公釐) 91670 -------------裝--- (請先閱讀背面之注意事項再填寫本頁) · _線< 經濟部智慧財產局員工消費合作社印製 525039
構成光可聚合成份(B)之全部,或成份(B)也可另外含有L 点〜乙烯型不飽和寡聚物及單體。 …可與式(I)之寡聚物併用之有用光可聚合單體包含上 述用以製成黏結劑聚合物之具有多官能基的單體。尤為適 當之多官能基丙烯酸系單體有四乙二醇二丙烯酸醋 (TEGDA),三羥甲基丙烷三丙烯酸酯(TMpTA),丁二醇二甲 基丙烯酸酯(BDDMA)及異戊四醇三丙烯酸酯(pETA)。 並且,光可聚合成份(B)亦可另外含有多官能基寡聚 物,諸如上述環氧丙烯酸酯寡聚物。這些已見記載於,例 如,美國專利第5, 229, 252號中,其揭示引用於此以作參 考。在此,「寡聚物」一詞係指分子量介於5〇〇至約5, 〇〇〇 間的短鏈聚合物。為敘述光可聚合成份(β)之目的,成份(β) 並不包含南分子量黏結劑聚合物(Α ),雖然這些黏結劑聚合 物具有α,β-乙烯型不飽和基團並且可參與光成像之聚合反 應。 為在曝露於光化輻射時啟始該單體及/或寡聚物之聚 合反應,該光可成像組成物含有(c)適當之光啟始劑或光啟 始化學品。適用之光啟始劑包含苯偶因醚類,苯偶醯縮酮, 苯乙酮,二苯甲酮,及相關具胺類之化合物。較佳之啟始 劑有硫雜蒽酮,例如,2-異丙基硫雜蒽酮,尤其係與胺類 併用' 依據本發明主要成像光阻劑之成份通常係稀釋於例如 甲基乙基_之溶劑中。類似地,通常以二部份系統(two part system)供應之焊料遮罩組成物中,含有黏結劑(A);光可 本纸張尺度適用中國國家標準(CNS)A4規格(210 X 297公髮 91670
525039 A7 __B7 五、發明說明(9 ) 聚合成份(B)及光啟始劑化學品(c)之部份係溶解於有機々 劑中。對形成焊料遮罩之組成物而言,環氧樹脂通常為液 態且具有夠低之黏度而無須稀釋於有機溶劑中;然而,為 調整黏度,當然也可以使該環氧樹脂與溶劑併用。 對形成焊料遮罩之組成物而言,該組成物進而包含⑴) 一種或多種環氧樹脂。環氧樹脂在含一種環氧樹脂或多種 環氧樹脂混合物顯像及最終硬化後,可以導入塗声 硬度及耐久性。 θ 之 依據本發明,可適用之環氧樹脂種類繁多。通常,係 使用雙酚Α型,清漆型及酚甲酚型環氧樹脂。其它適用之 環氧樹脂可見於例如美國專利第4,〇92,443號,其揭示在 此引用作為參考。也可以使用環狀脂肪族環氧化物,例如 以 Union Carbide,Danbury,Conn.的商品名 Cyanacure⑧ UVR_6100及UVR-6110出售者。依據本發明所用之環氧樹 脂’較佳之環氧當量係在100至約7〇〇間。 當本發明之光可成像組成物經曝露於光化輻射並以例 如1%碳酸鈉的鹼性水溶液顯像後,將該環氧樹脂硬化以 使光可成像層堅硬耐久。雖然環氧樹脂會自相交聯,但為 在實際應用上能獲致足夠快速之加熱硬化,一般須再包含 (E)環氧樹脂硬化劑,亦即,參與交聯反應之化合物,及/ 或環氧樹脂硬化觸媒。 環氧樹脂硬化劑之實例有多官能羧酸之酐類及封端基 異氰酸酯,諸如ε-己内醯胺封端基異佛爾酮。環氧樹脂硬 化觸媒之實例包含胺類,例如三乙胺及氰脈 91670 訂 線 本紙張尺度適用中國國家標準(CNS)A4規格(2l〇^f^y 525039 五、發明說明(10) 為避免環氧樹脂過早硬化,本發明之組成物在一般情 況下係以二部份組成(tw〇_part c〇mp〇siti⑽)供應。具有酸 官能基之黏結劑聚合物與環氧樹脂硬化劑及/或硬化觸 媒,直至即將使用之前,係於其中一部份保持與環氧樹脂 隔離。目前做法係將環氧樹脂以外之所有成份置於第一部 份’而環乳樹脂係在第二部份供應。 該組成物亦可另外含有其它物質,諸如顏料及共溶 劑,如見於習知技藝者。此類組成物多係有顏料者,通常 相對於成份(A)加成份(B)之總重量,至多含有約3 〇重量 %之分散染料。 本發明之組成物係利用習知方式以液態組成物直接施 用於印刷電路板。塗佈後,該組成物經乾燥以去除水且亦 去除揮發性物質,諸如用作聚結劑之共溶劑。在該光可成 像組成物之乾燥過程中,該系統聚結而成連續膜。乾燥於 稱微加熱下進行為佳,兼以快速去除水及其它揮發性物 質。較佳者,乾燥係在介於約65至約8(rc間的溫度下進 行。 、,製程可如習知方式。典型程序中,將液態組成物形成 之光可成像組成物層施用於印刷電路板上。透過適當之原 圖’將該光可成像組成物層暴露於光化輻射。i露於光化 輕射使曝光區域之單體或寡聚物聚合,形成可财顯像液之 交聯結構。然後,將該組成物於稀薄驗性水溶液中顯像, 例如1%碳酸鈉溶液。該驗性溶液使黏結劑聚合物中之酸 基形成鹽,使黏結劑聚合物成為可溶而可被去除。 本紙張尺度適用t國國家標準(CNSM4規格(210 X ‘)97公祭— 10 91670 頁 訂 525039 A7
經濟部智慧財產局員工消費合作社印製 五、發明說明(11) 若該組成物係焊料遮罩形成之組成物,則在顯像後將 該印刷電路板加熱,通常係於約14〇至約16〇艺間的溫度 加熱一段足夠長之時間,以達成環氧樹脂之硬化而使該組 成物層堅硬且耐久。 本配方特別適合喷霧施用。其它施用方法,例如惟幕 塗佈法’則須要較高黏度。為此目的,可以添加增稱劑, 例如聚胺甲酸酯增稠劑,可見於美國專利第5,364,737號, 其揭示於茲引用以作參考。 以下,利用特定實施例更詳細說明本發明。 f施例1 (寡聚物之製成) 以市售之環氧丙稀酸g旨Ebecryl®-600(用以製備寡聚 物R-M942)及ECN、117(用以製備募聚物R-M93 8)起始, 該分子依序與2莫耳HDI; 2莫耳聚丙二醇(分子量1〇〇〇); 2莫耳HDI ;及2莫耳HEMA反應,製備具有四丙烯酸酿 官能度之募聚物。 玄f施例2 依下表所示調配成二種焊料遮罩配方# 2415-25及# ’ 2415-31。該焊料遮罩配方係液態,可以作帷幕塗佈施用。 ^--------^---------^ (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 11 91670 525039 A7 B7 五、發明說明(U) # 2415-25 A部份(公克) 300.00 合計A+B(公克) 400.00 %固體含量 60.00 混合比率A:B 3.00 化學品 固體含量!化學品 合計液態% 液態0Α 溶劑 用量(A+B) %固體含量(A部分+B部分)(A部分)(公克)(公克) 經濟部智慧財產局員工消費合作社印製 A部份 R-1713-17 28.08 60.06 28.05 37.40 44.82 112.21 R-M945 8.89 41.40 12.88 17.18 30.20 51.54 R-M942 5.00 41.40 7.25 9.66 16.99 28.99 SR-454 1.90 41.40 2.75 3.67 6.45 11.01 BB-3056 0.48 100.00 0.29 0.38 0.00 1.15 Modafl 〇 w 2.85 100.00 1.71 2.28 0.00 6.84 1-907 3.80 100.00 2.28 3.04 0.00 9.12 ITX 1.22 100.00 0.73 0.98 0.00 2.93 Sun Green 1.88 100.00 1.13 1.50 0.00 4.51 Huber 90C 17.40 100.00 10.44 13.92 0.00 41.76 MY24 0.21 100.00 0.13 0.17 0.00 0.50 CG1400 1.04 100.00 0.62 0.83 0.00 2.50 HP-270 4.75 100.00 2.85 3.80 0.00 1 1.40 3-MB 0.00 0.00 3.89 5.18 15.54 15.54 75.00 100.00 300.00
本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 12 91670 525039 A7 B7
經濟部智慧財產局員工消費合作社印製 五、發明說明(13) B部份 DER331 11.25 100.00 6.75 27.00 〇.〇〇 27.00 ECN-1299 11.25 50.00 13.50 54.00 27.00 54.00 DBE 0.00 0.00 4.75 19.00 1 9.00 19.00 TOTAL 100.00 25.00 """----一 100.00 ------- 1 6〇.〇〇 100.00 1713-17 Morton International 公司 有機合成部門生產之 黏結劑,兼具酸及丙烯酸酯官能度。R_1713係 RacUcure®之Ebecryl^OO環氧二丙烯酯寡聚物與 EPicl〇n®B-4400二針以1·0:0.6莫耳比進行縮合 反應之產物。該黏結劑係PMA溶液,固體含量 約60% ,平均Mw在3300(「_17」代表於第17 批次製備)。 R-M945 甲基丙烯酸甲酯50莫耳% ,甲基丙烯酸5〇莫耳 % ,以HEMA丙烯酸羥乙酯酯化之甲基丙烯酸 25% ;酸值 125 至 150。 SR-4 54 甲基丙烯酸酯化之三Μ甲基丙烧三丙烯酸 酯。 ΒΒ-3056 消泡劑
Modaflow 流動控制劑
Irgacure-907光啟始劑 ITX 光啟始劑
Sun Green 顏料
Huber 90C 填充料 ^-----------------線 (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國豕標準(CNS)A4規格(21〇 X 297公璧) 13 91670 525039 A7 B7
CG1400 HP-270 3-MB DER331 DBE 五、發明說明(l4) MY24 硬化劑 氰脈,硬化劑 煙霧二氧化矽,填充料 3-甲氧基丁醇,溶劑 雙酚A環氧樹脂(液態)
二元酸酯類溶劑,沸點196至225°C Ίί------0. (請先閱讀背面之注意事項再 tmat ϋ n I n n I—-、a I— n 1 1 I ·ϋ n 頁) 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 14 91670 525039 A7B7 五、發明說明(15) 2415-31 A部份(公克) 300.00 合計A+B(公克) 400.00 %固體含量 60.00 混合比率A:B 3.00 化學品 固體含量% 化學品 (A+B) %固體含量 合計液態% 液態% 溶劑 用量 A部分+B部分)(A部分)(公克)(公克)
4 經濟部智慧財產局員工消費合作社印製 A部份 LSF-60 3 1.60 45.30 RM938 10.00 53.95 TMPTA 6.00 100.00 Modaflow 1.00 100.00 Phenyl Acri 3.25 100.00 Sun Green 2.50 100.00 M i n e x 10 20.04 100.00 MY24 0.20 100.00 CG1400 1.00 100.00 HP-270 4.00 100.00 PMA 0.00 0.00 B部份 DER-331 15.41 100.00 DER-337 5.00 100.00 PMA 0.00 0.00 43.60 54.50 89.43 163.49 11.58 14.48 20.01 43.44 3.75 4.69 ’ 0.00 14.06 0.63 0.78 0.00 2.34 2.03 2.54 0.00 7.62 1.56 1.95 0.00 5.86 12.53 15.66 0.00 46.97 0.13 0.16 0.00 0.47 0.63 0.78 0.00 2.34 2.50 3.13 0.00 9.38 1.07 1.34 4.02 4.02 80.00 100.00 300.00 9.63 48.16 0.00 36.12 3.13 15.63 0.00 11.72 7.24 36.22 27.16 27.16 --------訂.-------- (請先閱讀背面之注意事項再填寫本頁) TOTAL 100.00 20.00 1 00.00 140.63 75.00 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 15 91670 525039 _B7 _ 五、發明說明(16 ) LSF60 酸值125至150,由55重量%苯乙烯,35重量°/〇 甲基丙烯酸,及10重量%甲基丙烯酸正己酯反應 製得之聚合物。LSF-60係以固體含量約4W製成 3_甲氧基丁醇溶液,且具有1^^約23,000 Minex 10填充料 PMA 丙二醇單甲醚醋酸酯(溶劑) (請先閱讀背面之注意事項再填寫本頁) 裝 n i n g- · an 一口V ^ ϋ ϋ n n 彰· 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 16 91670
Claims (1)
- 物039公告本 第89 1 2 1 557號專利申請案 申請專利範圍修正本 ------------------------------------------------------------ 祕 (91年7月18曰) ~種寡聚物,具有一般式: (CH2二CH(H 或 CH3)-C〇HCH(〇z>CH2-〇4^ c(ch3)2 其中R係碳原子數1至4 〇之伸烧基; X係無,或選自伸烧二醇,聚酯二醇,及聚醚二醇 所構成之群組而分子量介於50至2,800間的二醇;並 且 z具有一般式: -CO-NH-Y-NH-CO-0(-X5-〇.c〇-NH-Y-NH-CO- 〇)n-Q-〇-C〇-CH(H 或 CH3) = CH2 ; 其中各Y係伸烧基或芳香族烴基; η=1 至 4 ; X係選自伸烧二龄’聚酯二醇,及聚趟二醇所構 成之群組的二醇;並且 Q係碳原子數2至6之伸烷基。 經濟部中央標準局員工福利委員會印製 2·如申請專利範圍第1項之募聚物,其中n二1。 3· —種光可成像組成物,包括: (Α)介於30至80重量%間具有充分叛酸官能度而 能使光阻劑可以利用鹼性水溶液顯像之黏結劑聚合 物; (Β)介於20至70重量%間的光可聚合成份,包括 «,-乙烯型不飽和寡聚物,及相對於成份(Α)加包括 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐) 1 91670 525039 ^ ...................................... ..... 麵丨丨丨丨·丨丨丨剛· 、明專利範圍第1項之寡聚物α)的成份(b)之總重量 、'、2重視需要添加之a,yS -乙稀型不飽和單 體;以及 )1於0 · 1至1 〇重量%間的光啟始劑化學$。 申明專利範圍第3項之光可成像組成物,其中該寡聚 物⑴相對於成份(Α)加成份(Β)之總重量係占至 量%。 m 5·如申請專利範圍第3項之光可成像組成物,進 斜认★八/ 這而包括相 :成伤(Α)加成份(Β)之總重量,介於5至 曰 ΛΑ ίΤΛ\^ ^ υ 堇 1 % 的(D)%氧樹脂。 6·如申請專利範圍第5項之光可成像組成物,進而勺括才 對於成份(Α)加成份(Β)之總重量,介於1至lA G目 ^ ^ ^ i〇重量間 的氣树脂硬化劑及/或環氧樹脂硬化觸 經濟部中央標準局員工福利委員會印製 本紙張尺度適用中國國家標準(CNS) A4規格(210 x 297公釐) 91670
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW089121557A TW525039B (en) | 1999-10-20 | 2000-10-16 | Photoimageable composition containing flexible oligomer |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US6265132B1 (zh) |
| EP (1) | EP1094365B1 (zh) |
| JP (1) | JP2001163948A (zh) |
| KR (1) | KR20010051082A (zh) |
| CN (1) | CN1159624C (zh) |
| AT (1) | ATE287551T1 (zh) |
| DE (1) | DE60017524T2 (zh) |
| SG (1) | SG97955A1 (zh) |
| TW (1) | TW525039B (zh) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2002094904A1 (en) * | 2001-05-17 | 2002-11-28 | Nippon Kayaku Kabushiki Kaisha | Photosensitive resin, photosensitive resin compositions containing the same and cured articles of the compositions |
| JP4875834B2 (ja) * | 2003-12-24 | 2012-02-15 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | マスク |
| US7423073B2 (en) * | 2004-11-23 | 2008-09-09 | Lexmark International, Inc. | Radiation curable compositions having improved flexibility |
| US7375144B2 (en) * | 2005-06-16 | 2008-05-20 | Eastman Chemical Company | Abrasion resistant coatings |
| JP6420634B2 (ja) * | 2014-03-26 | 2018-11-07 | 株式会社Adeka | レジスト組成物、カラーレジスト組成物及び該組成物を用いたカラーフィルタ |
| CN109776756A (zh) * | 2019-01-21 | 2019-05-21 | 深圳市道尔顿电子材料有限公司 | 一种双重改性环氧丙烯酸酯及其光刻胶 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1231178A (fr) | 1959-04-09 | 1960-09-27 | Mft Fr Pneumatiques Michelin | Nouveau procédé de préparation d'élastomères du type polyuréthane |
| US4202950A (en) | 1976-01-02 | 1980-05-13 | Atlantic Richfield Company | Process for preparing polyurethane elastomers |
| US4092443A (en) | 1976-02-19 | 1978-05-30 | Ciba-Geigy Corporation | Method for making reinforced composites |
| DE3036694A1 (de) * | 1980-09-29 | 1982-06-03 | Hoechst Ag, 6000 Frankfurt | Gummielastische, ethylenisch ungesaettigte polyurethane und dieselben enthaltendes durch strahlung polymerisierbares gemisch |
| DE3131766A1 (de) | 1981-08-11 | 1983-02-24 | Basf Ag, 6700 Ludwigshafen | Photopolymerisierbares aufzeichnungsmaterial und verfahren zur herstellung von reliefformen mittels dieses aufzeichnungsmaterials |
| US5364736A (en) | 1987-12-07 | 1994-11-15 | Morton International, Inc. | Photoimageable compositions |
| JP2573661B2 (ja) * | 1988-07-09 | 1997-01-22 | キヤノン株式会社 | 感光感熱型接着剤 |
| US5229252A (en) | 1989-06-09 | 1993-07-20 | Morton International, Inc. | Photoimageable compositions |
| US5187044A (en) | 1991-05-14 | 1993-02-16 | Minnesota Mining And Manufacturing Company | Flexographic printing plate |
| US5328805A (en) | 1992-08-28 | 1994-07-12 | W. R. Grace & Co.-Conn. | Aqueous developable photosensitive polyurethane-(meth)acrylate |
| TW418346B (en) * | 1993-03-05 | 2001-01-11 | Ciba Sc Holding Ag | Photopolymerisable compositions containing tetraacrylates |
| EP0823070B1 (en) * | 1995-04-27 | 1999-12-29 | Minnesota Mining And Manufacturing Company | Negative-acting no-process printing plates |
| US6207346B1 (en) * | 1997-04-09 | 2001-03-27 | Advanced Coatings International | Waterborne photoresists made from urethane acrylates |
-
1999
- 1999-10-20 US US09/420,906 patent/US6265132B1/en not_active Expired - Fee Related
-
2000
- 2000-10-16 TW TW089121557A patent/TW525039B/zh not_active IP Right Cessation
- 2000-10-17 AT AT00309152T patent/ATE287551T1/de not_active IP Right Cessation
- 2000-10-17 EP EP00309152A patent/EP1094365B1/en not_active Expired - Lifetime
- 2000-10-17 KR KR1020000061088A patent/KR20010051082A/ko not_active Ceased
- 2000-10-17 DE DE60017524T patent/DE60017524T2/de not_active Expired - Fee Related
- 2000-10-17 SG SG200005971A patent/SG97955A1/en unknown
- 2000-10-20 CN CNB00135311XA patent/CN1159624C/zh not_active Expired - Fee Related
- 2000-10-20 JP JP2000320654A patent/JP2001163948A/ja not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| EP1094365A1 (en) | 2001-04-25 |
| EP1094365B1 (en) | 2005-01-19 |
| JP2001163948A (ja) | 2001-06-19 |
| CN1294318A (zh) | 2001-05-09 |
| SG97955A1 (en) | 2003-08-20 |
| ATE287551T1 (de) | 2005-02-15 |
| CN1159624C (zh) | 2004-07-28 |
| DE60017524D1 (de) | 2005-02-24 |
| KR20010051082A (ko) | 2001-06-25 |
| US6265132B1 (en) | 2001-07-24 |
| DE60017524T2 (de) | 2005-12-29 |
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Legal Events
| Date | Code | Title | Description |
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| GD4A | Issue of patent certificate for granted invention patent | ||
| MM4A | Annulment or lapse of patent due to non-payment of fees |