TW399158B - Liquid crystal display device and process of preparing a non-wettable dispersion-preventing pattern for a liquid crystal display device - Google Patents
Liquid crystal display device and process of preparing a non-wettable dispersion-preventing pattern for a liquid crystal display device Download PDFInfo
- Publication number
- TW399158B TW399158B TW085106576A TW85106576A TW399158B TW 399158 B TW399158 B TW 399158B TW 085106576 A TW085106576 A TW 085106576A TW 85106576 A TW85106576 A TW 85106576A TW 399158 B TW399158 B TW 399158B
- Authority
- TW
- Taiwan
- Prior art keywords
- liquid crystal
- crystal display
- display device
- ionic
- surfactant
- Prior art date
Links
- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 20
- 238000000034 method Methods 0.000 title claims description 25
- 239000000758 substrate Substances 0.000 claims abstract description 27
- 239000008199 coating composition Substances 0.000 claims abstract description 19
- 239000004094 surface-active agent Substances 0.000 claims abstract description 19
- 239000011347 resin Substances 0.000 claims abstract description 18
- 229920005989 resin Polymers 0.000 claims abstract description 18
- 239000003431 cross linking reagent Substances 0.000 claims abstract description 12
- 229920006037 cross link polymer Polymers 0.000 claims abstract description 6
- 239000003086 colorant Substances 0.000 claims abstract description 4
- 239000000203 mixture Substances 0.000 claims description 26
- 150000002500 ions Chemical group 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 11
- 239000011248 coating agent Substances 0.000 claims description 10
- 238000000576 coating method Methods 0.000 claims description 10
- 229920000642 polymer Polymers 0.000 claims description 10
- 238000011049 filling Methods 0.000 claims description 9
- 125000003709 fluoroalkyl group Chemical group 0.000 claims description 9
- 239000000178 monomer Substances 0.000 claims description 8
- -1 substituted Chemical class 0.000 claims description 8
- 239000000126 substance Substances 0.000 claims description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical group [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 6
- 229920001577 copolymer Polymers 0.000 claims description 6
- 238000009736 wetting Methods 0.000 claims description 6
- 239000004971 Cross linker Substances 0.000 claims description 5
- 125000005647 linker group Chemical group 0.000 claims description 5
- 150000003839 salts Chemical class 0.000 claims description 5
- 125000002091 cationic group Chemical group 0.000 claims description 4
- 238000006243 chemical reaction Methods 0.000 claims description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 4
- 229910052786 argon Inorganic materials 0.000 claims description 3
- 230000005670 electromagnetic radiation Effects 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- WYNCHZVNFNFDNH-UHFFFAOYSA-N Oxazolidine Chemical compound C1COCN1 WYNCHZVNFNFDNH-UHFFFAOYSA-N 0.000 claims description 2
- 230000002079 cooperative effect Effects 0.000 claims description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 2
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims description 2
- BCHZICNRHXRCHY-UHFFFAOYSA-N 2h-oxazine Chemical compound N1OC=CC=C1 BCHZICNRHXRCHY-UHFFFAOYSA-N 0.000 claims 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000006303 photolysis reaction Methods 0.000 claims 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical group FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 17
- 239000000975 dye Substances 0.000 description 8
- 238000007639 printing Methods 0.000 description 7
- 239000000976 ink Substances 0.000 description 6
- 239000000049 pigment Substances 0.000 description 6
- 238000002156 mixing Methods 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 125000000129 anionic group Chemical group 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 238000007641 inkjet printing Methods 0.000 description 3
- KQNPFQTWMSNSAP-UHFFFAOYSA-N isobutyric acid Chemical compound CC(C)C(O)=O KQNPFQTWMSNSAP-UHFFFAOYSA-N 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 235000015170 shellfish Nutrition 0.000 description 3
- DVMSVWIURPPRBC-UHFFFAOYSA-N 2,3,3-trifluoroprop-2-enoic acid Chemical compound OC(=O)C(F)=C(F)F DVMSVWIURPPRBC-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- QMMFVYPAHWMCMS-UHFFFAOYSA-N Dimethyl sulfide Chemical compound CSC QMMFVYPAHWMCMS-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 238000001015 X-ray lithography Methods 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 239000000908 ammonium hydroxide Substances 0.000 description 2
- GEMDZKRHHVNHLW-UHFFFAOYSA-N argon;carbonic acid Chemical compound [Ar].OC(O)=O GEMDZKRHHVNHLW-UHFFFAOYSA-N 0.000 description 2
- 238000010017 direct printing Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
- 229920000831 ionic polymer Polymers 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- 239000000779 smoke Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- ZFXYFBGIUFBOJW-UHFFFAOYSA-N theophylline Chemical compound O=C1N(C)C(=O)N(C)C2=C1NC=N2 ZFXYFBGIUFBOJW-UHFFFAOYSA-N 0.000 description 2
- 238000003631 wet chemical etching Methods 0.000 description 2
- SLBOQBILGNEPEB-UHFFFAOYSA-N 1-chloroprop-2-enylbenzene Chemical compound C=CC(Cl)C1=CC=CC=C1 SLBOQBILGNEPEB-UHFFFAOYSA-N 0.000 description 1
- IZXIZTKNFFYFOF-UHFFFAOYSA-N 2-Oxazolidone Chemical compound O=C1NCCO1 IZXIZTKNFFYFOF-UHFFFAOYSA-N 0.000 description 1
- ZPVFWPFBNIEHGJ-UHFFFAOYSA-N 2-octanone Chemical compound CCCCCCC(C)=O ZPVFWPFBNIEHGJ-UHFFFAOYSA-N 0.000 description 1
- CYUZOYPRAQASLN-UHFFFAOYSA-N 3-prop-2-enoyloxypropanoic acid Chemical compound OC(=O)CCOC(=O)C=C CYUZOYPRAQASLN-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 1
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- 102000004190 Enzymes Human genes 0.000 description 1
- 108090000790 Enzymes Proteins 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 239000004909 Moisturizer Substances 0.000 description 1
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000002679 ablation Methods 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 239000003957 anion exchange resin Substances 0.000 description 1
- 238000010539 anionic addition polymerization reaction Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 125000004069 aziridinyl group Chemical group 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 235000011089 carbon dioxide Nutrition 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000000502 dialysis Methods 0.000 description 1
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 1
- PDPJQWYGJJBYLF-UHFFFAOYSA-J hafnium tetrachloride Chemical compound Cl[Hf](Cl)(Cl)Cl PDPJQWYGJJBYLF-UHFFFAOYSA-J 0.000 description 1
- 239000003317 industrial substance Substances 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- QWTDNUCVQCZILF-UHFFFAOYSA-N isopentane Chemical compound CCC(C)C QWTDNUCVQCZILF-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 230000001333 moisturizer Effects 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 238000004091 panning Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000003495 polar organic solvent Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 230000002285 radioactive effect Effects 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- 229960000278 theophylline Drugs 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/44—Preparation of metal salts or ammonium salts
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
- C09K2323/05—Bonding or intermediate layer characterised by chemical composition, e.g. sealant or spacer
- C09K2323/057—Ester polymer, e.g. polycarbonate, polyacrylate or polyester
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24851—Intermediate layer is discontinuous or differential
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mathematical Physics (AREA)
- Optical Filters (AREA)
- Paints Or Removers (AREA)
- Liquid Crystal (AREA)
Description
經濟部智慧財產局貝工消t合作社印製 A7 B7 五、發明說明(1) 用於液晶顯示器的濾色器係由許多呈紅、綠、及黃三 原色的小像點所組成。這些像點可被形成於在黑色格架内 沈積有色物質於透明基底上’其為像點提供反差及明晰度 。這些有色物質係藉由將染料及/或顏料散佈於一以有機 質為主的結合劑内而被製成。染料或色素微粒(亦即染色 劑)通常係藉由光刻蝕、印刷、或電附著法而被沈積及構 .型。黑色格架通常含有一鉻金屬,其背面被氧化或被塗敷 .以一層氧化鉻吸光軟片,或一有機色素之混合物,俾以形 成一黑色之有機邊界。此邊界可藉由電附著、光刻蝕、或 印刷法(包含喷墨法)而被沈積在基底上》 在日本公開專利公開案第5-224012號中,Matsumura 揭示了一種用於製造高品質液晶顯示器之濾色器的方法, 其可可靠地防止墨溃玷污及色彩混合,特別是當有色部分 以印刷或喷墨法形成時。詳言之,Matsumura揭示了一種 用於製造高品質液晶顯示器之濾色器的方法,其藉著散佈 一光敏樹脂層於透明基底上;暴露及光刻顯現該樹脂層來 形成一所欲之圖案;將一抗墨水的以矽為主之橡朦薄層, 通常為交聯有機聚矽氧烷,層壓在經圖案化的樹脂層上;以 及將經曝露的光敏樹脂層加上其上的橡膠層予以移出,因 而形成供有色物質之用的孔洞。 在日本公開專利公開案第59-75205號中,其揭示了一 種使用喷墨法將三色染色劑散佈於基底上的方法。該公開 案亦揭示,一由濕潤性差的物質所形成的防散圖案(亦即 防止墨溃玷污及色彩混合的圈案)是有效的,但並未有揭 -4- 本紙張尺度適用中國國家標準(CNS)A4規格(210 * 297公釐) ------------ί裝-------.、訂----------線 (請先W讀背面之注意事項再填寫本頁) A7 B7_____ 五、發明說明(2) 不特別的方法β (锖先閲讀背面之注$項再填寫本頁) 已知含矽氧烷的物質是可潤濕的或可為許多有機溶劑 所泡Μ。提供一種基底附著性防散圖案以供用於一不會為 水或有機溶劑所濕潤的液晶顯示裝置,在本技藝上將是— 種突破。 本發明為一種用於液晶顯示裝置的防散圓案的基底, 其包含被圈案於_透明基底上的不濕潤性樹脂,該樹脂為 .一種由一含下列溶液所構成之塗敷組成物的固化物 a) —種可交聯之聚合表面活性劑,其具有 i) 至少一個側鏈的氟代烷基部分,及 ii) 數個可與相對離子反應之側鍵離子性部分, 俾以形成一交聯聚合物,及 b) _種交聯劑’其具有數個可與該表面活性劑之離子 部分反應之離子性或潛在離子性的相對離子部分; 其中該圖案圍出了數個要用以接受一染色劑的孔洞。 於另一實施例中,本發明為一種製備用於液晶顯示裝 置的防散圖案的方法’其包含如下之步驟: 經濟部智慧財產局貝工消费合作社印製 a) 對一受質塗敷以一如下之混合物〇一可交聯之聚合 界面活性劑,其具有至少一個側鏈氟代烷基部分, 及數個側鏈離子性部分,及一具有數個相對離子 性部分之交聯劑,其中該等側鏈離子性部分可與該 等相對離子部分產生光解反應以形成一交聯聚合物; b) 遮蓋該塗層之一部分以曝露出一所欲之围案; c )以高於波長20〇ηπι並具足夠能量之電磁輻射來照射 本紙張尺度中困國家標準(CNSM4規格⑵ο x 297公爱) R1 經濟部智慧財產局貝工消费合作社印製 A7 _____B7 ___ 五、發明說明(3 ) 該所欲之圈案,俾促成該離子部分舆相對離子之間 有足夠的反應’而將曝露出之圖案予以固化;及 d)移除塗層上未被照射的部分。 用上述方法塗敷之基底提供了_一種較簡單且更可靠之 製造濾色器的方法。 適用於在基底上$成不濕潤性防散圖案之樹脂的實施 例被揭示於美國專利第4, 929, 666及5, 006, 624號。 用於製造本發明經圈案化之基底的組成物最好是,但不 必要是水性的’而氟代烷基聚合界面活性劑最好是水溶性 或可散佈於水的》本案組成物可散佈或完全溶於水、一由 水及一有機溶劑所構成之混合物、或一適合之極性有機溶 劑(例如醇、二元酵、或吡咯貌酮)。 該可交聯之氟代烴基聚合界面活性刺含有至少_個 側鏈氟代烷基部分及數個可與相對離子反應之側鏈離子性 部分’以形成一交聯聚合物。其較佳係以如下之結構來表 不 :
Ri —(CH2-C-)—(CH2~C-)—- I x I y Gi 其中(^為一個活性離子官能基;l為一個化學鍵或連結基 ;T為一個二償烴基團,或一個被惰性地取代的 二價烴基團’其中該等取代基不會嚴重地影宰該活 性離子官能基之功能;X為一大於1的整數,y為一正整數 ’·各個R1分別為氫或甲基;以及心為一個最好帶有CF3末 本紙張尺度遍用中困國家標準(CNS)A4規格(210 X 297公釐) ------------(M-------.1 --------- (請先《讀背面之注意事項再填寫本頁) A7 五、發明說明(4) 端基團之氟代烷基部份。更佳地,為一個過氟代烷基 部份。 該聚合物的骨架最好為一個衍生自以下列表示之第一 單體與第二單體之共聚物 第一單體 Rp-T-L-CR^CH 第二單艏 G1-CR,=CH2 T最好為 -S02-NR2(CH2)b- .、-(ch2)·-、-( ί锖先閱讀背面之ίίϋ項再填寫本mo 經濟部智慧財產局貝工消费合作社印製 -(CH2).-CR(0H)-(CH2)b- 其中R為氫或G-C!2烷基;R2為氩或烷基,尤以甲 基或乙基為佳,m則為自1至1〇的整數,尤以1至4為佳。 該聚合物的骨架任擇地含有非干擾性重複單元,如 那些衍生自苯乙稀、丙稀酸酯或異丁稀酸醋單艎。 連結基困的實例述於美國專利第4,929, 666號。芳香 族連結基的實例有:-?]1-〇112-〇-、-?11-〇112-〇-、-?11-〇12- C(0)0-、-Ph-CH2-0C(0)、-Ph-CH2-NHC(0)-及-Ph-CH2-〇C(〇)、 ,其中-Ph為一個被接至聚合物骨架的苯基。一較佳之非芳 香族連結基為-C(0)0-。較佳之第一單體係為以下式結構表示 者: RF_ (CH2)B-0-C(0) - CRfCI^ 或 Rf-S02-NR2(CH2)b-0-C(0)-CR1=CH2 一更佳之第一單體為2-甲基2-(十七氟代烷基)乙基 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公爱) 裝! —訂·ϊ!·線 經濟部智慧財產局員工消費合作社印製 A7 B7_______ 五、發明說明(5 ) 薛;一更佳之第二單體為冷-羧乙基丙烯酸酯(CH2= chco2 CH2CH2C02H)或異丁 稀酸》 該交聯劑含有數個可舆界面活性劑之離子性或潛在離 子性部分起反應之離子性或潛在離子性的相對離子部分。 該交聯劑可為一個衍生自一具有下列結構之單艘的聚合物: g2-cr,=ch2 .其中R!為氩或甲基,G2含有一個可與G!反應而形成一共價 键之活性離子官能基。因此,Gi及&被選定以共反應而形 成一共償鍵。此聚合物可為周聚物的或共聚物的。 任擇地’該交聯劑亦可為低分子量之多離子化合物, 其能舆氣化之聚合界面活性劑交聯〃此種多離子化合物的 實施例為雙陽離子化合物,結構如下:
其中Q+為一错鹽之陽離子部分。 適用作為交聯劑之陽離子部分的實例包括銨基、吡咬 鎩基、鵠鍛基、錄基'苯甲基鉸舖基、吖丙啶鏺基或芳香 族之環狀鏟基。當其被質子化後可產生陽離子性官能性之 以官能環氧基或三聚氛胺為主之組成物,也是適合的。 典型的陰離子部分包括羧基、酚基、碳酸根、氩氧基
本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公H -------------(M-----------------Μ <請先《讀背面之注意事項再填寫本I) Α7 Β7 五、發明說明(6) 或碳酸氩根。該交聯劑亦可含有氟化脂肪族部分。許多含 鏘鹽之氟化聚合表面活性劑_交聯劑組成物(Fps_CL)! 易於先解的(參見前述之美國專利第4 929 666號、美國 專利第5, 238, 747號、及美國專利第5, 310, 581號)。G!或 其中之一者可含有一鑕基,且其中一者可含一潛在性離 子部分(諸如多功能之噁唑或噁啳;^例如,2_異丙烯 .2-嘴嗅烷之聚合物可與一羧酸根陰離子性聚合界面活性劑 .之銨鹽配製以形成醢胺-酯交聯。 轸基底上搛形不潘濶性層 上述之可交聯的塗敷組成物,可以許多方法將之圖案化 或於透明基底上。例如’一光敏樹脂可被塗敷於基底上,之 後以光刻法予以暴露及顯形,俾形成所欲之圖案。而後, 該可交聯的塗敷組成物可以任一合適的技術(如旋轉塗敷) ’將之塗敷於經圖案化的樹脂之上,接而通常於一在5〇。c 至12 0 C的溫度範圍下予以固化《最後,經圖案化的樹脂層 加上其上的可交聯塗敷組成物一起被移出,而留下一出可交 聯塗敷組成物所構成之所欲的圓案。該圓案通常係呈一出 平行或十字狀條棒所構成骨架(亦即格架)的形態,該等 條棒通常具一寬度為1〇仁历,較佳為2〇 μ历至loo#历,更佳 為30仁历。 當該氟化聚合表面活性劑/交聯劑組成物(Fps-CL) 含有一諸如揭示於美國專利第4, 929, 666及5,310,581號中 之易光解的鑕盤時’該FPS-CL可在無另一光敏樹脂之存在 下被圖案化於基底上。該易光解之FPS-CL可被塗敷於透明基 -9- 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先«讀背面之注$項再填寫本頁) 訂— --線-'! 經濟部智慧財產局員工消费合作社印製 A7 B7 五、發明說明(7 ) 底上。然後,一遮蓋物可被覆蓋於該塗層上以曝露出一所 欲的圖案。按著,被嗓露出之區域可以高於波長2〇〇nm( 較佳為200nm至310nm之具足夠能量的電磁輻射於以照 射’俾促成離子部分舆相對離子之間有足夠的反麾,而將 曝露出之區域予以固化。未曝露出的區域可以水沖洗塗層 前予以丟塗之,而留下之光圖化之圖案可進一步以熱處理 之。 另一圖案可交聯塗敷組成物的方法是藉由印刷,尤其 是凹版印刷、網版膠印、橡膠版或喷墨印刷。在此,該 所欲之圈案是藉由將組成物直接印於基底上,接而固化該 組成物。諸如活性離子蝕刻、濕化學蝕刻、電射燒蝕、或 X射線光刻之減除圖案法亦可用於將組成物圏案於基底上 〇 一黑化材料有利地以一特定方式被使用而可防止光線 穿透由該樹脂所形成之圖案。例如,一足量之黑化材料可 與該可交聯塗敷組合物混合,以提供所欲之由反差明晰 度及不濕潤性所構成之組合。適合之黑化材料包括用於 黑墨水,且不需要在舆水性組合物混合前之製備的分散顏 料;以及燈煙,其有利地要先以一適當之濕劑(如異丙醇) 予以濕潤,然後予以物理性地散佈於塗敷組成物中。 該塗敷組成物也可被“化,接㈣化在__案化在 基底上的黑色邊界上。此種黑化材料包括_氧化之鉻金屬, 或衍生自一出顏料或染料所構成之混合物的黑色有機邊界 。該塗敷組成物可以任何適合的方法被圓案化於該黑色模型 • 10. 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公嫠) (請先閱讀背面之注意事項再填寫本頁) !-—訂-- ---!線 經 濟 部 智 慧 財 產 局 貝 工 消 費 合 作 社 印 製 A7 B7 五、發明說明(8) 上’這包括一種會專一地將一薄層塗覆於黑色模型材料上 之滾筒塗敷技術》 雖然該塗敷组成物是不濕潤性的,其可藉由任—適合 的方法(如氣漿)而被變為可漁性的。此種處理可容許專 色邊界塗敷在該組成物上之圖案。 藉由各種方法,如直接印刷或喷墨印刷,可將染色劑 更容易地施加至為本發明之防散圈案所圍出的孔润内。事 .實上’由於墨溃站污及色彩混合被不漁满性格架大致地排 所欲之圖案是藉由將組成物直接印於基底上,接而固化該 組成物。諸如活性離子蝕刻、濕化學蝕刻、電射燒姓、或 X射線光刻之減除圈案法亦可用於將組成物圖案於基底上 0 經濟部智慧財產局貝工消费合作社印製 -------------裝------.--訂· /{ (請先Μ讀背面之注意事項再填寫本I) 一黑化材料有利地以一特定方式被使用而可防止光線 穿透由該樹脂所形成之圈案。例如,一足量之黑化材料可 與該可交聯塗敷組合物混合,以提供所欲之由反差、明晰 度及不濕潤性所構成之組合。適合之黑化材料包括用於 黑墨水,且不需要在與水性組合物混合前之製僙的分散顏 料;以及燈煙,其有利地要先以一適當之濕劑(如異丙醉) 予以濕潤,然後予以物理性地散佈於塗敷組成物中。 該塗敷組成物也可被圖案化,接而固化在一被圖案化在 基底上的黑色邊界上。此種黑化材料包括一氧化之鉻金屬, 或衍生自一出顏料或染料所構成之混合物的黑色有機邊界 。該塗敷組成物可以任何適合的方法被圖案化於該黑色棋型 上,這包括一種會專-地將一薄層塗覆於黑色模型材料上 -11- 本紙張尺度翻a Η家標準<CNS)A4規格⑵Q χ挪公爱) 經濟部智慧財產局貝工消費合作社印製 A7 B7 五、發明說明(9) 之滾简塗敷技術。 雄然該塗敷组成物是不漁潤性的,.其可藉由任一適合 的方法(如氧漿)而被.變為可漁性的。此種處理可容許黑 色邊界塗敷在該组成物上之圈案。 藉由各種方法,如直接印刷或喷墨印刷,可將染色劑 更容易地施加至為本發明之防散圖案所圍出的孔洞内。事 .實上,由於墨溃玷污及色彩混合被非可濕性格架大致地排 .除择’通常以高解析印刷法被施加的染色劑可有利地以一 解析度較低之印刷機來施加之。一低解析度印刷機較諸高 解析印刷機所具有的優點在於明顯地降低成本以及操作時 間。 以下詳細描述為一適用於圖案化一供液晶顯示裝置之用 的基底之樹脂的製備。除非另有指明,所有的百分比皆為 重量百分比。 (步騄一)一種陰離子性聚合表面活性劑之製備 在氣氣環境下,以過氧化物起始之聚合反應來製備一 出2-[乙基{(十七氟化烷基)磺醢基}胺基]乙基2-丙 烯酸酯(C8F)7S02N(C2H5)CH2CH20C(0)CH=CH2,商品名為 FX-13 ’ 得自於 3M Industrial Chemical Products Division, St. Paul, MN) 及β-羧 乙基丙 烯酸酯 (p_CEA,# 自於Rhone-Poulenc, Cranbury,NJ)的水性共聚物溶液 ’之後以氫氧化銨予以中合,並藉由透析予以純化之。 製備三種溶液:(1)配於l〇g的甲乙嗣(MEK)中之30. Og 的不含抑制劑的FX-13 ; (2)配於l〇g MEK中的20· Og -12- 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -I! — — — — — — — — — — · _ I zltx.8< (請先《讀背面之注f項再填寫本頁) 訂· --線 S99156 Α7 Β7 五、發明說明(10) β-CEA ;以及(3)配於MEK 16ml中的l.〇4g之2-甲基丁燒 蓊(商品名 VAZ0-67,得自於 DupontCom-pany,Wilminton, DE)及0.03g之酼基乙酵。 此三溶液於攪拌中被持續地加入至位於一 25〇ml圓底 錐形瓶内由35g的MEK及20g的丙二醇所構成之溶液中, 該瓶配置有攪拌子、冷凝管、及調定壓力之氮氣進口。該 • FX-13溶液在13.3g/hr之速率下,使用一為50ml之注射 .筒予以加入。該β-CEA溶液在1 〇. 〇g/hr之速率下,使用 一為50ml之注射筒予以加入。該VAZ0_67及酼基乙醇溶液 在6.0g/hr之速率下,使用一為10ml之注射筒予以加入 。經3小時後,該持續的加入步驟被完成,將該溶液置於 8Γ C下歷時再1小時。冷卻後,於真空抽氣下以除去65g 的MEK’並加入50重量百分比的氫氧化銨溶液以調整邱值 至10。於莫空下除去多餘的2〇g液赌,並使用_個Spec- tra/P0R膜管(分子量截留值為6000至8000)於水中透 析該溶液歷時72小時。 (步称二)含噁唑烷交聯劑之陰離子性聚合表面活性劑的 製儀 將藉由步驟一過之製程中製備之聚合表面活性劑之一 樣品(3.000g之1〇%固態溶液)加入至丨156叾之一由重 量比為80:20的2-異丙烯2-噁唑烷及曱基異丁烯酸所構成 之共聚物的10%水溶液中,其含〇33g的乙二酵。 (步称三)活性可光固化的陰離子性聚合表面活性劑的製 備 -13- 茶隠人度則干困困家標準(CNS)A4規格(21() χ 297公爱 (請先Η讀背面之注$項再填寫本頁> '裝------I— 訂·ΓΙ----1·線 經濟部智慧財產局貝工消贄合作社印製 399158 A7 —__B7 五、發明說明(11) 本製備係依步驟一所述之相同狀況來進行者。在85。c 下於氣氣排氣下將過氟丙烯酸(3〇g,fx-189, 3-M .
Company所製造者)以及一由2〇g的乙烯基苄基氣和“的 MEK所構成之溶液’以16m 1 /hr之速率順著添加漏斗加入 至一授拌過之MEK溶液(15ml)内。配於12ml MEK中一 包含有1.2g之啟始劑溶液(VAZ0-64),被冷卻至〇。c並 .以4ml/hr的速率被加至反應容器中。添加完成後,反應 混合物再予以攪拌3小時,其間再加入1 〇g的MEK。該反應 混合物被冷卻至室溫,並將所生成之含聚合物的溶液傾倒 出而與微量之固態聚合物殘渣分開。 - 該過氟丙烯酸/乙烯基苄基氯共聚產物進一步與二甲 基硫反應之。將該共聚物(11. 3g,位於MEK中之45. 4¾共 聚物)及二甲基硫加入至配置有磁攪拌子、冷凝管、乾冰 冷凝器、及氮氣進口的50ml圓底椎形瓶中。該混合物進 一步以1:1的THF/MEK混合溶劑(l〇g)予以稀釋,並將之 加熱至50°C歷時24小時。在這時間中,間歇性地加入少量 的水(總共3ml)。將反應混合物冷卻至室溫,並以真空 抽氣除去過多的溶液_。將一由1: 2(v/v)之丙明與水所構 成之混合物加入該產物中,並授拌該混合物1小時以形成 含過氟碳化物之聚合物的氣化鎳鹽所形成之褐色澄清溶液 〇 將該氯化鎞鹽置入一充填有碳酸氩根陰離子性交換樹 脂的管柱内,以形成一碳酸氫錄鹽來供引入相對離子交聯 劑。 •14- 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) {請先H讀背面之注項再填寫本頁) 訂·- 線-· 經濟部智慧財產局貝工消費合作杜印製
Claims (1)
- Is 經濟部智慧財產局員工消費合作社印製 六、申請專利範圍 第85106576號專利申請案申請專利範圍修正本 修正曰期:88年12月 1· 一種液晶顧示裳置’其包含一透明基底及一種被圖案化於 該基底上的防止光線穿透的組成物,其中該防止光線穿透 的組成物包含一黑化材料及一種不濕潤性樹脂,該樹脂為 一種由一包含如下之溶液所構成之塗敷組合物的固化物: a) 一種可交聯之聚合表面活性劑,其具有 i)至少一個側鏈氟代烷基部分,及 11)數個可與相對離子反應之側鏈離子性部分,俾以形 成交聯聚合物;及 b) —種具有數個可與該表面活性劑之離子部分反應之離子 性或潛在離子性的相對離子部分之交聯劑 其中該圖案圍出了數個要用以接受一染色劑的孔洞。 2_如申請專利範圍第丨項之液晶顯示裝置,其中該可交聯塗 敷組成物係為水性的,且該可交聯之聚合氟代烷基表面活 性劑係為水洛性的或水可分散的。 3.如申請專利範圍第丨項之液晶顯示裝置’其中該可交聯之 聚合氟代烷基表面活性劑係為一共聚物,該共聚物衍生自 一具如下結構之第一單體以及一具如下結構之第二單體: 第一單體 rf-t-l-cr,=ch2 第一單艘 G, -CR2=CH2 其中G,為-活性離子官能基;L為—化學鍵或連接基團 為-具一 CF3基末端基團之氟代垸基部分;各個心分別為 氫或甲基;τ為-個Cii。二價烴基或—被惰性地取代 --------111—^---I----Γ 訂· 一 I ---I-- (請先闉讀背面之注意事項再填寫本買>399158、申請專利範圍 二償烴基。 4. 如申請專利範圍第!項之液晶顧示裝置,其中該第一單想 具有下列結構:RF-S02-NR2(CH2)m-〇-C(0)-CR1=CH2 其中R2為氩或C】·,。燒基,而—―由⑴㈣整數。 5. 如申請專利範圍第3項之液晶顯示裝置,其包含一光固化 的鏘鹽。 6. 如申請專利範圍第1項之液晶顧示裝置 一多功能之噁唑烷或噁嗪》 7. 如申請專利範圍第6項之液晶顯示裝置 一由2-異丙稀2-。惡》圭院所構成之聚合物 8. 如申請專利範圍第丨項之液晶顯示裝置 下式表示之: 其中該交聯劑為 其中該交聯劑為 其中該交聯劑以 (锖先閲讀背面之注意事項再填寫本ΐ) -I 裝-------•一訂----------線 或 經濟部智慧財產局員工消費合作社印製 0H q+-ch2-c-ch2-〇 —--— och2-c~ch2-q+ 其中Q+為一錯鹽之陽離子部分。 9·如申請專利範圍第〗至8項中任一項之液晶顯示裝置,其進 一步含有一位在該經圖案化的樹脂之邊界内的染色劑。 10. —種用以製備一用於一液晶顯示裝置的不濕潤性防散圈案 -2- 表紙張尺度適用中國國家標準(CNS〉A4規格(210 X 297公釐 399158 A8 B8 C8 D8 六、申請專利範圍 化的方法’其包含如下之步棘 a) 對一基底塗敷以一由下列所構成之混合物:丨)一可交聯 之聚合過氟代烷基表面活性劑,其具有至少一個側鏈氟代 烷基部分以及數個側鏈離子性部分,及⑴一具有數個相對 離子之交聯劑,其中該等側鏈離子性部分可與該等抗衡離 子部分產生光解反應以形成一交聯聚合物圖案; b) 遮蓋該塗層之一部分以曝露出一所欲之圖案; c) 以高於波長200nm並具足夠能量之電磁輻射來照射該所 欲之圖案’俾促成該離子部分與該相對離子間有足夠的反 應,而將暴露出之圈案予以固化及 d) 移除塗層上被遮蓋的部分。 n It n nt J I · .1 n n n 一OJ· n n I s / I, (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局貝工消費合作社印製 本紙張尺度適用中國國家標準(CNS)A4規格(?l〇 x 297公釐)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/460,159 US5609943A (en) | 1995-06-02 | 1995-06-02 | Non-wettable layer for color filters in flat panel display devices |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW399158B true TW399158B (en) | 2000-07-21 |
Family
ID=23827596
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW085106576A TW399158B (en) | 1995-06-02 | 1996-06-01 | Liquid crystal display device and process of preparing a non-wettable dispersion-preventing pattern for a liquid crystal display device |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US5609943A (zh) |
| EP (1) | EP0829031A1 (zh) |
| JP (1) | JPH11510916A (zh) |
| KR (1) | KR19990022155A (zh) |
| TW (1) | TW399158B (zh) |
| WO (1) | WO1996038754A1 (zh) |
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| US5972545A (en) * | 1993-11-03 | 1999-10-26 | Corning Incorporated | Method of printing a color filter |
| JP3927654B2 (ja) * | 1996-08-07 | 2007-06-13 | キヤノン株式会社 | カラーフィルタおよび液晶表示装置の製造方法 |
| US5888679A (en) * | 1997-03-27 | 1999-03-30 | Canon Kabushiki Kaisha | Production process of color filter, color filter produced thereby and liquid crystal display device using such color filter |
| WO1999038897A1 (fr) * | 1998-01-30 | 1999-08-05 | Hydro-Quebec | Polymeres sulfones reticules et leur procede de preparation |
| US7090890B1 (en) | 1998-04-13 | 2006-08-15 | The Trustees Of Princeton University | Modification of polymer optoelectronic properties after film formation by impurity addition or removal |
| JP4477726B2 (ja) * | 1999-12-09 | 2010-06-09 | シャープ株式会社 | 有機led素子の製造方法 |
| ATE276332T1 (de) * | 2001-05-08 | 2004-10-15 | Merck Patent Gmbh | Polymerisierbares flüssigkristallmaterial |
| US20040202799A1 (en) * | 2003-04-10 | 2004-10-14 | Eastman Kodak Company | Optical compensator with crosslinked surfactant addenda and process |
| US7476290B2 (en) * | 2003-10-30 | 2009-01-13 | Ebara Corporation | Substrate processing apparatus and substrate processing method |
| EP1555549A3 (en) * | 2004-01-19 | 2006-08-02 | Dainichiseika Color & Chemicals Mfg. Co., Ltd. | Fabrication process of color filters, inks, color filters, and image displays using the color filters |
| US20050253917A1 (en) * | 2004-05-13 | 2005-11-17 | Quanyuan Shang | Method for forming color filters in flat panel displays by inkjetting |
| US7195813B2 (en) * | 2004-05-21 | 2007-03-27 | Eastman Kodak Company | Mixed absorber layer for displays |
| US7625063B2 (en) * | 2004-11-04 | 2009-12-01 | Applied Materials, Inc. | Apparatus and methods for an inkjet head support having an inkjet head capable of independent lateral movement |
| US20060092218A1 (en) * | 2004-11-04 | 2006-05-04 | Applied Materials, Inc. | Methods and apparatus for inkjet printing |
| TWI328518B (en) * | 2006-03-24 | 2010-08-11 | Applied Materials Inc | Methods and apparatus for inkjet printing using multiple sets of print heads |
| US20080259101A1 (en) * | 2007-03-23 | 2008-10-23 | Applied Materials, Inc. | Methods and apparatus for minimizing the number of print passes in flat panel display manufacturing |
| WO2013052931A2 (en) | 2011-10-07 | 2013-04-11 | Svaya Nanotechnologies, Inc. | Synthesis of metal oxide and mixed metal oxide solutions |
| WO2013052927A2 (en) | 2011-10-07 | 2013-04-11 | Svaya Nanotechnologies, Inc. | Broadband solar control film |
| US9891347B2 (en) | 2014-12-15 | 2018-02-13 | Eastman Chemical Company | Electromagnetic energy-absorbing optical product and method for making |
| US9453949B2 (en) * | 2014-12-15 | 2016-09-27 | Eastman Chemical Company | Electromagnetic energy-absorbing optical product and method for making |
| US9891357B2 (en) | 2014-12-15 | 2018-02-13 | Eastman Chemical Company | Electromagnetic energy-absorbing optical product and method for making |
| US9817166B2 (en) | 2014-12-15 | 2017-11-14 | Eastman Chemical Company | Electromagnetic energy-absorbing optical product and method for making |
| WO2017095468A1 (en) * | 2015-12-01 | 2017-06-08 | Eastman Chemical Company | Electromagnetic energy-absorbing optical product and method for making |
| TWI691409B (zh) * | 2016-04-21 | 2020-04-21 | 美商伊士曼化學公司 | 吸收電磁能之光學製品 |
| US10338287B2 (en) | 2017-08-29 | 2019-07-02 | Southwall Technologies Inc. | Infrared-rejecting optical products having pigmented coatings |
| US11747532B2 (en) | 2017-09-15 | 2023-09-05 | Southwall Technologies Inc. | Laminated optical products and methods of making them |
| US10613261B2 (en) | 2018-04-09 | 2020-04-07 | Southwall Technologies Inc. | Selective light-blocking optical products having a neutral reflection |
| US10627555B2 (en) | 2018-04-09 | 2020-04-21 | Southwall Technologies Inc. | Selective light-blocking optical products having a neutral reflection |
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| JPS5975205A (ja) * | 1982-10-25 | 1984-04-27 | Seiko Epson Corp | カラ−フイルタの製造方法 |
| AU575243B2 (en) * | 1985-02-05 | 1988-07-21 | Kyodo Printing Co., Ltd. | Color filter for tv |
| US5006624A (en) * | 1987-05-14 | 1991-04-09 | The Dow Chemical Company | Fluorocarbon containing, reactive polymeric surfactants and coating compositions therefrom |
| US4929666A (en) * | 1987-05-14 | 1990-05-29 | The Dow Chemical Company | Fluorocarbon containing, reactive polymeric surfactants and coating compositions therefrom |
| JPH0721562B2 (ja) * | 1987-05-14 | 1995-03-08 | 凸版印刷株式会社 | カラ−フイルタ |
| CH673623A5 (zh) * | 1987-06-19 | 1990-03-30 | Grapha Holding Ag | |
| US5310581A (en) * | 1989-12-29 | 1994-05-10 | The Dow Chemical Company | Photocurable compositions |
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| JP3470352B2 (ja) * | 1993-07-23 | 2003-11-25 | 東レ株式会社 | カラーフィルタ |
| JPH0749416A (ja) * | 1993-08-05 | 1995-02-21 | Toray Ind Inc | カラーフィルタの製造方法 |
-
1995
- 1995-06-02 US US08/460,159 patent/US5609943A/en not_active Expired - Fee Related
-
1996
- 1996-05-24 EP EP96921622A patent/EP0829031A1/en not_active Withdrawn
- 1996-05-24 KR KR1019970708634A patent/KR19990022155A/ko not_active Ceased
- 1996-05-24 WO PCT/US1996/010359 patent/WO1996038754A1/en not_active Ceased
- 1996-05-24 JP JP8536826A patent/JPH11510916A/ja active Pending
- 1996-06-01 TW TW085106576A patent/TW399158B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| JPH11510916A (ja) | 1999-09-21 |
| WO1996038754A1 (en) | 1996-12-05 |
| US5609943A (en) | 1997-03-11 |
| KR19990022155A (ko) | 1999-03-25 |
| EP0829031A1 (en) | 1998-03-18 |
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