TW202428816A - Adhesive Sheet - Google Patents
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- TW202428816A TW202428816A TW112144527A TW112144527A TW202428816A TW 202428816 A TW202428816 A TW 202428816A TW 112144527 A TW112144527 A TW 112144527A TW 112144527 A TW112144527 A TW 112144527A TW 202428816 A TW202428816 A TW 202428816A
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
- C09J7/38—Pressure-sensitive adhesives [PSA]
- C09J7/381—Pressure-sensitive adhesives [PSA] based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
- C09J7/385—Acrylic polymers
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
- C09J11/02—Non-macromolecular additives
- C09J11/06—Non-macromolecular additives organic
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
- C09J133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09J133/062—Copolymers with monomers not covered by C09J133/06
- C09J133/066—Copolymers with monomers not covered by C09J133/06 containing -OH groups
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J201/00—Adhesives based on unspecified macromolecular compounds
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
- C09J7/38—Pressure-sensitive adhesives [PSA]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/40—Additional features of adhesives in the form of films or foils characterized by the presence of essential components
- C09J2301/416—Additional features of adhesives in the form of films or foils characterized by the presence of essential components use of irradiation
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
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- Manufacturing & Machinery (AREA)
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- Adhesives Or Adhesive Processes (AREA)
- Adhesive Tapes (AREA)
Abstract
本發明提供一種黏著片材,其具有基於具有碳-碳雙鍵且不利用溶液聚合之聚合物之光硬化性黏著劑層。本發明提供一種具有藉由光照射進行硬化之黏著劑層之黏著片材。上述黏著劑層含有具有碳-碳雙鍵之聚合物、及光起始劑。上述黏著劑層中之上述光起始劑之含量為1.0×10 -4莫耳/100 g以上。上述黏著劑層之偶氮系聚合起始劑及過氧化物系聚合起始劑之合計含量為1.0 μg/g以下。 The present invention provides an adhesive sheet having a photocurable adhesive layer based on a polymer having a carbon-carbon double bond and not utilizing solution polymerization. The present invention provides an adhesive sheet having an adhesive layer that is cured by light irradiation. The adhesive layer contains a polymer having a carbon-carbon double bond and a photoinitiator. The content of the photoinitiator in the adhesive layer is 1.0×10 -4 mol/100 g or more. The total content of the azo-based polymerization initiator and the peroxide-based polymerization initiator in the adhesive layer is 1.0 μg/g or less.
Description
本發明係關於一種黏著片材。 本申請案主張基於在2022年11月18日提出申請之日本專利申請2022-185186號之優先權,該申請之全部內容以參照之方式併入本說明書中。 The present invention relates to an adhesive sheet. This application claims priority based on Japanese Patent Application No. 2022-185186 filed on November 18, 2022, the entire contents of which are incorporated into this specification by reference.
通常,黏著劑(亦稱為壓敏接著劑。以下相同)具有於室溫附近之溫度區域呈柔軟之固體(黏彈性體)狀態,會因壓力而簡單地接著於被接著體上之性質。充分利用此種性質,黏著劑例如以具有黏著劑層之黏著片材之形態廣泛用於各種領域。黏著片材中有具備藉由光照射進行硬化之黏著劑層(光硬化性黏著劑層)者。作為與此種技術相關之先前技術文獻,可例舉專利文獻1。 先前技術文獻 專利文獻 Generally, adhesives (also called pressure-sensitive adhesives. The same applies hereinafter) are in a soft solid (viscoelastic) state in a temperature range near room temperature, and are easily bonded to the adherend due to pressure. Taking full advantage of this property, adhesives are widely used in various fields, for example, in the form of adhesive sheets having an adhesive layer. Some adhesive sheets have an adhesive layer that is cured by light irradiation (photocurable adhesive layer). As a prior art document related to this technology, Patent Document 1 can be cited. Prior Art Document Patent Document
專利文獻1:日本專利申請公開2015-059179號公報Patent document 1: Japanese Patent Application Publication No. 2015-059179
[發明所欲解決之問題][The problem the invention is trying to solve]
作為光硬化性黏著劑層之一例,可例舉以如下方式形成者:含有具有碳-碳雙鍵之聚合物,藉由光照射使上述碳-碳雙鍵形成交聯結構,藉此進行硬化。先前,此種光硬化性黏著劑層係藉由將於有機溶劑中含有上述具有碳-碳雙鍵之聚合物之形態之溶劑型黏著劑組合物塗佈於適當之表面並進行乾燥而形成。一般而言,上述具有碳-碳雙鍵之聚合物係藉由改性而製造,上述改性係向藉由使用偶氮系或過氧化物系聚合起始劑之溶液聚合而獲得之聚合物中,藉由於溶液中之反應導入碳-碳雙鍵。因此,於由含有上述具有碳-碳雙鍵之聚合物之溶劑型黏著劑組合物形成之光硬化性黏著劑層中,通常用於上述溶液聚合之偶氮系或過氧化物系聚合起始劑係以該聚合起始劑之分解物或殘存物之形態存在。As an example of a photocurable adhesive layer, there can be cited one formed in the following manner: containing a polymer having a carbon-carbon double bond, the carbon-carbon double bond is hardened by forming a cross-linked structure by light irradiation. Previously, such a photocurable adhesive layer is formed by applying a solvent-type adhesive composition containing the polymer having a carbon-carbon double bond in an organic solvent to a suitable surface and drying it. Generally speaking, the polymer having a carbon-carbon double bond is manufactured by modification, and the modification is to introduce carbon-carbon double bonds into a polymer obtained by solution polymerization using an azo-based or peroxide-based polymerization initiator by a reaction in a solution. Therefore, in the photocurable adhesive layer formed of the solvent-based adhesive composition containing the polymer having a carbon-carbon double bond, the azo-based or peroxide-based polymerization initiator generally used in the solution polymerization is present in the form of a decomposition product or residue of the polymerization initiator.
另一方面,近年來,出於對環境衛生之考慮等,對減少有機溶劑使用量之要求逐漸加強。因此,本發明之目的在於提供一種具有基於含有碳-碳雙鍵且不利用溶液聚合之聚合物之光硬化性黏著劑層之黏著片材。 [解決問題之技術手段] On the other hand, in recent years, due to environmental hygiene considerations, the demand for reducing the amount of organic solvents used has gradually increased. Therefore, the purpose of the present invention is to provide an adhesive sheet having a photocurable adhesive layer based on a polymer containing carbon-carbon double bonds and not utilizing solution polymerization. [Technical means for solving the problem]
根據該說明書,可提供一種具有藉由光照射進行硬化之黏著劑層(光硬化性黏著劑層)之黏著片材。上述黏著劑層之偶氮系聚合起始劑及過氧化物系聚合起始劑之合計含量為1.0 μg/g以下。如此,藉由限制偶氮系聚合起始劑及過氧化物系聚合起始劑之合計含量,能夠防止或抑制由上述聚合起始劑所致之弊病(例如,由於上述聚合起始劑因熱而裂解,故而引發黏著劑之經時物性變化、貼附有黏著片材之被接著體表面之變質或污染、釋氣產生等之現象)。例如,上述黏著劑層可為不含有偶氮系及過氧化物系聚合起始劑中之任一者之黏著劑層。上述黏著劑層含有具有碳-碳雙鍵之聚合物、及光起始劑。上述黏著劑層中之上述光起始劑之含量為1.0×10 -4莫耳/100 g以上。由於上述黏著劑層不利用使用偶氮系或過氧化物系聚合起始劑之溶液聚合,故而根據具有該黏著劑層之黏著片材可減少有機溶劑之使用量。又,藉由使上述黏著劑層含有具有碳-碳雙鍵之聚合物、及特定量以上之光起始劑,可藉由光照射而適當地進行硬化。 According to the specification, an adhesive sheet having an adhesive layer that is cured by light irradiation (photocurable adhesive layer) can be provided. The total content of azo-based polymerization initiators and peroxide-based polymerization initiators in the adhesive layer is 1.0 μg/g or less. In this way, by limiting the total content of azo-based polymerization initiators and peroxide-based polymerization initiators, it is possible to prevent or inhibit the disadvantages caused by the polymerization initiators (for example, due to the decomposition of the polymerization initiators due to heat, the physical properties of the adhesive change over time, the deterioration or contamination of the surface of the adherend to which the adhesive sheet is attached, the generation of outgassing, etc.). For example, the adhesive layer can be an adhesive layer that does not contain either azo-based or peroxide-based polymerization initiators. The adhesive layer contains a polymer having a carbon-carbon double bond and a photoinitiator. The content of the photoinitiator in the adhesive layer is 1.0×10 -4 mol/100 g or more. Since the adhesive layer does not utilize solution polymerization using an azo or peroxide polymerization initiator, the amount of organic solvent used can be reduced according to the adhesive sheet having the adhesive layer. In addition, by making the adhesive layer contain a polymer having a carbon-carbon double bond and a photoinitiator of a specific amount or more, it can be properly cured by light irradiation.
於一些態樣中,上述黏著劑層中所含有之碳-碳雙鍵之量較佳為1.0×10 -4莫耳/g以上。若黏著劑層中所含有之碳-碳雙鍵之量增多,則存在容易獲得藉由光照射所致之特性及物性之變化之傾向。 In some aspects, the amount of carbon-carbon double bonds contained in the adhesive layer is preferably 1.0×10 -4 mol/g or more. If the amount of carbon-carbon double bonds contained in the adhesive layer increases, it tends to be easier to obtain changes in characteristics and physical properties due to light irradiation.
於一些態樣中,上述具有碳-碳雙鍵之聚合物較佳為藉由於1個分子中具有2個以上乙烯性不飽和基之多官能單體來進行交聯。就向含有該聚合物之光硬化性黏著劑層賦予適度之凝聚性之觀點而言,上述聚合物具有由多官能單體所產生之交聯結構可較有利。In some embodiments, the polymer having a carbon-carbon double bond is preferably crosslinked by a multifunctional monomer having two or more ethylenically unsaturated groups in one molecule. From the perspective of imparting appropriate cohesiveness to the photocurable adhesive layer containing the polymer, it is advantageous for the polymer to have a crosslinked structure generated by the multifunctional monomer.
上述黏著劑層較佳為有機溶劑之含量為1.0 μg/g以下。有機溶劑之含量較少之黏著劑層低異味,就環境衛生之觀點而言較理想。就抑制因該有機溶劑揮發所引起之起泡、或低污染性之觀點而言,黏著劑層中之有機溶劑之含量較少亦可較有利。The adhesive layer preferably has an organic solvent content of 1.0 μg/g or less. An adhesive layer with a lower organic solvent content has a lower odor and is more ideal from the perspective of environmental hygiene. A lower organic solvent content in the adhesive layer is also advantageous from the perspective of suppressing foaming caused by the volatility of the organic solvent or low pollution.
於一些態樣中,上述具有碳-碳雙鍵之聚合物為丙烯酸系聚合物。此處所揭示之技術可以具備含有具有碳-碳雙鍵之丙烯酸系聚合物之光硬化性黏著劑層的黏著片材之形態較佳地實施。In some embodiments, the polymer having a carbon-carbon double bond is an acrylic polymer. The technology disclosed herein can be preferably implemented in the form of an adhesive sheet having a photocurable adhesive layer containing an acrylic polymer having a carbon-carbon double bond.
一些較佳態樣之黏著片材之由下述式所求出之剝離強度下降率為50%以上。 剝離強度下降率[%]=(1-B/A)×100 其中,上述式中之A為於貼附於矽晶圓上後,於拉伸速度300 mm/min、剝離角度180度之條件下所測得之初始剝離強度(單位:[N/20 mm])。上述式中之B為於貼附於矽晶圓上並進行照射累計光量為300 mJ/cm 2之紫外線(UV)之硬化處理後,於拉伸速度300 mm/min、剝離角度180度之條件下所測得之硬化處理後剝離強度(單位:[N/20 mm])。如此,剝離力(剝離強度)因UV照射而大幅下降之黏著片材可用作藉由在貼附於被接著體後於所需之時點進行光照射而可容易剝離之黏著片材。 The peel strength reduction rate of some better adhesive sheets obtained by the following formula is more than 50%. Peel strength reduction rate [%] = (1-B/A) × 100 Wherein, A in the above formula is the initial peel strength measured at a tensile speed of 300 mm/min and a peel angle of 180 degrees after being attached to a silicon wafer (unit: [N/20 mm]). B in the above formula is the peel strength after hardening treatment measured at a tensile speed of 300 mm/min and a peel angle of 180 degrees after being attached to a silicon wafer and irradiated with ultraviolet light (UV) with a cumulative light dose of 300 mJ/ cm2 (unit: [N/20 mm]). In this way, the adhesive sheet whose peeling force (peeling strength) is greatly reduced by UV irradiation can be used as an adhesive sheet that can be easily peeled by irradiating light at a desired time after being attached to an adherend.
再者,將本說明書中所記載之各要素適當組合而成者亦可包含於藉由本案專利申請所要求專利保護之發明之範圍內。Furthermore, an appropriate combination of the elements described in this specification may also be included in the scope of the invention claimed for patent protection by the patent application of this case.
以下,對本發明之適宜之實施方式進行說明。再者,作為於本說明書中所特別提及之事項以外之事情,於本發明之實施中所必要之事情可理解為從業者基於該領域中之先前技術之設計事項。本發明可基於本說明書中所揭示之內容及該領域中之技術常識來實施。 再者,於以下之圖式中,有時會對起相同作用之構件、部位標註相同之元件符號進行說明,重複之說明有時會進行省略或簡化。又,圖式中記載之實施方式為了清楚地說明本發明而進行了模式化,並不一定準確地表示了實際作為製品而提供之黏著片材之尺寸或縮小比例。 The following is a description of the appropriate implementation of the present invention. Furthermore, matters other than those specifically mentioned in this specification and necessary for the implementation of the present invention can be understood as design matters based on the prior art in the field by practitioners. The present invention can be implemented based on the contents disclosed in this specification and the technical common sense in the field. Furthermore, in the following figures, components and parts with the same function are sometimes described with the same component symbols, and repeated descriptions are sometimes omitted or simplified. In addition, the implementation methods recorded in the figures are modeled for the purpose of clearly explaining the present invention, and do not necessarily accurately represent the size or reduction ratio of the adhesive sheet actually provided as a product.
於該說明書中,「丙烯酸系聚合物」係指來自含有多於50重量%(較佳為多於70重量%,例如多於90重量%)之丙烯酸系單體之單體成分之聚合物。上述丙烯酸系單體係指來自於1個分子中具有至少1個(甲基)丙烯醯基之單體之單體。又,於該說明書中,「(甲基)丙烯醯基」係包括性地指代丙烯醯基及甲基丙烯醯基之含義。同樣地,「(甲基)丙烯酸酯」係包括性地指代丙烯酸酯及甲基丙烯酸酯之含義,「(甲基)丙烯酸」係包括性地指代丙烯酸及甲基丙烯酸之含義。In the specification, "acrylic polymer" refers to a polymer derived from a monomer component containing more than 50% by weight (preferably more than 70% by weight, for example more than 90% by weight) of an acrylic monomer. The above-mentioned acrylic monomer refers to a monomer derived from a monomer having at least one (meth)acryl group in one molecule. Furthermore, in the specification, "(meth)acryl" refers to an inclusive meaning of acryl and methacryl. Similarly, "(meth)acrylate" refers to an inclusive meaning of acrylate and methacrylate, and "(meth)acrylic acid" refers to an inclusive meaning of acrylic acid and methacrylic acid.
於該說明書中,「乙烯性不飽和化合物」係指於分子內具有至少1個乙烯性不飽和基之化合物。作為乙烯性不飽和基之例,可例舉(甲基)丙烯醯基、乙烯基、烯丙基等。以下,有時將具有1個乙烯性不飽和基之化合物稱為「單官能單體」,有時將具有2個以上乙烯性不飽和基之化合物稱為「多官能單體」。又,有時將多官能單體中之具有X個乙烯性不飽和基之化合物表述為「X官能單體」。In the specification, "ethylenically unsaturated compound" refers to a compound having at least one ethylenically unsaturated group in the molecule. Examples of ethylenically unsaturated groups include (meth)acryloyl, vinyl, and allyl groups. Hereinafter, a compound having one ethylenically unsaturated group may be referred to as a "monofunctional monomer", and a compound having two or more ethylenically unsaturated groups may be referred to as a "polyfunctional monomer". In addition, a compound having X ethylenically unsaturated groups among polyfunctional monomers may be referred to as an "X-functional monomer".
<黏著片材之構成例> 本文中所揭示之黏著片材具備黏著劑層。典型而言,該黏著劑層構成黏著片材之至少一表面。黏著片材可為於基材(支持體)之單面或雙面具有黏著劑層之形態之附基材之黏著片材,亦可為上述黏著劑層被保持於剝離襯墊(亦可理解為具備剝離面之基材)上之形態等之無基材之黏著片材。於該情形時,黏著片材可為僅包含黏著劑層者。於此處所謂之黏著片材之概念中,可包含稱為黏著帶、黏著標籤、黏著膜等者。又,典型而言,上述黏著劑層係連續地進行形成,但並不限定於該形態,例如亦可為形成為點狀、條狀等有規則或無規則之圖案之黏著劑層。又,根據本說明書所提供之黏著片材可為卷狀,亦可為單片狀。或者,進而亦可為加工成各種形狀之形態之黏著片材。 <Configuration example of adhesive sheet> The adhesive sheet disclosed in this article has an adhesive layer. Typically, the adhesive layer constitutes at least one surface of the adhesive sheet. The adhesive sheet may be an adhesive sheet with a substrate in the form of having an adhesive layer on one or both sides of a substrate (support), or an adhesive sheet without a substrate in the form of the adhesive layer being retained on a peeling pad (which can also be understood as a substrate with a peeling surface). In this case, the adhesive sheet may be one that only includes an adhesive layer. The concept of the adhesive sheet here may include adhesive tapes, adhesive labels, adhesive films, etc. Furthermore, typically, the adhesive layer is formed continuously, but is not limited to this form. For example, it can also be an adhesive layer formed into a regular or irregular pattern such as dots or stripes. Furthermore, the adhesive sheet provided in this specification can be in a roll or a single sheet. Alternatively, it can also be an adhesive sheet processed into various shapes.
於圖1中示出本文中所揭示之具有黏著劑層之黏著片材之一構成例。該黏著片材1係包含黏著劑層10之無基材之雙面黏著片材。關於使用前(貼附於被接著體前)之黏著片材1,例如,如圖1所示,可為黏著劑層10之各表面10A、10B至少受黏著劑層側為剝離性表面(剝離面)之剝離襯墊31、32保護之附剝離襯墊之黏著片材50之形態。或者,亦可為剝離襯墊31之背面(與黏著劑側為相反側之表面)為剝離面,於剝離襯墊31之背面,黏著面10B以抵接之方式進行捲繞或積層,藉此保護黏著面10A、10B之形態。黏著劑層10可為單層,亦可為2層以上之積層構造。FIG1 shows an example of a structure of an adhesive sheet with an adhesive layer disclosed herein. The adhesive sheet 1 is a double-sided adhesive sheet without a substrate and includes an adhesive layer 10. The adhesive sheet 1 before use (before being attached to an adherend) can be, for example, as shown in FIG1 , a form of an adhesive sheet 50 with a peel-off liner, in which each surface 10A, 10B of the adhesive layer 10 is protected by a peel-off liner 31, 32 whose side of the adhesive layer is a peel-off surface (peel-off surface). Alternatively, the back side of the peeling pad 31 (the surface opposite to the adhesive side) may be the peeling surface, and the adhesive surface 10B may be rolled or laminated in a contacting manner on the back side of the peeling pad 31 to protect the adhesive surfaces 10A and 10B. The adhesive layer 10 may be a single layer or a laminated structure of two or more layers.
黏著劑層10以含有具有碳-碳雙鍵之聚合物、及光起始劑,且藉由光照射進行硬化之方式構成。於一些態樣中,黏著劑層10中所含有之光起始劑之量較佳為1.0×10 -4莫耳/100 g以上。藉由該含量,容易獲得良好之光照射硬化性。出於相同之理由,於一些態樣中,黏著劑層10中所含有之碳-碳雙鍵之量較佳為1.0×10 -4莫耳/100 g以上。 The adhesive layer 10 is formed by containing a polymer having a carbon-carbon double bond and a photoinitiator, and is cured by light irradiation. In some embodiments, the amount of the photoinitiator contained in the adhesive layer 10 is preferably 1.0×10 -4 mol/100 g or more. With this content, good light irradiation curability is easily obtained. For the same reason, in some embodiments, the amount of the carbon-carbon double bond contained in the adhesive layer 10 is preferably 1.0×10 -4 mol/100 g or more.
黏著劑層10中之有機溶劑之含量較佳為1.0 μg/g以下。含有具有碳-碳雙鍵之聚合物、及光起始劑,且上述有機溶劑之含量受到限制之黏著劑層例如可藉由以下方式較佳地形成:向活性能量線(例如紫外線)硬化型黏著劑組合物照射活性能量線使其硬化,藉此形成含有一級聚合物(典型而言為藉由活性能量線聚合而獲得之不含碳-碳雙鍵之聚合物)之初級黏著劑層,繼而,藉由不使用或僅少量(於能夠實現上述有機溶劑之含量之限度內)使用有機溶劑之方法進行向上述初級黏著劑層中添加光起始劑及向上述一級聚合物中導入碳-碳雙鍵。於該形成方法中,由於使預先形成之初級黏著劑層新含有光起始劑及碳-碳雙鍵,故而作為用於形成上述初級黏著劑層之黏著劑組合物,可較佳地使用活性能量線硬化型黏著劑組合物。作為上述活性能量線硬化型黏著劑組合物,使用不含有或僅少量(於能夠實現上述有機溶劑之含量之限度內)含有有機溶劑者。The content of the organic solvent in the adhesive layer 10 is preferably 1.0 μg/g or less. An adhesive layer containing a polymer having carbon-carbon double bonds and a photoinitiator, and in which the content of the above-mentioned organic solvent is limited, can be preferably formed, for example, by irradiating an active energy ray (e.g., ultraviolet ray)-curable adhesive composition with active energy rays to cure it, thereby forming a primary adhesive layer containing a primary polymer (typically a polymer without carbon-carbon double bonds obtained by active energy ray polymerization), and then, by not using or using only a small amount (within the limit that the above-mentioned organic solvent content can be achieved) of an organic solvent, adding a photoinitiator to the above-mentioned primary adhesive layer and introducing carbon-carbon double bonds into the above-mentioned primary polymer. In this formation method, since the pre-formed primary adhesive layer newly contains a photoinitiator and a carbon-carbon double bond, an active energy ray-curable adhesive composition can be preferably used as the adhesive composition for forming the primary adhesive layer. As the active energy ray-curable adhesive composition, one containing no organic solvent or only a small amount (within the limit of the content of the organic solvent) is used.
黏著劑層10較佳為偶氮系聚合起始劑及過氧化物系聚合起始劑之合計含量為1.0 μg/g以下。此種黏著劑層10可於如下構成中較佳地實現:例如含有不進行使用偶氮系或過氧化物系聚合起始劑之溶液聚合而獲得之聚合物(例如,藉由活性能量線聚合獲得不含有碳-碳雙鍵之一級聚合物,並向該一級聚合物中導入碳-碳雙鍵而獲得之聚合物)作為具有碳-碳雙鍵之聚合物。The adhesive layer 10 preferably has a total content of azo-based polymerization initiators and peroxide-based polymerization initiators of 1.0 μg/g or less. Such an adhesive layer 10 can be preferably realized in the following configuration: for example, it contains a polymer obtained by solution polymerization without using an azo-based or peroxide-based polymerization initiator (for example, a polymer obtained by introducing a carbon-carbon double bond into a primary polymer obtained by active energy ray polymerization without carbon-carbon double bonds) as a polymer having a carbon-carbon double bond.
於圖2中示出本文中所揭示之具有黏著劑層之黏著片材之另一構成例。該黏著片材2被構成為包含一表面10A成為於被接著體上之貼附面(黏著面)之光硬化性黏著劑層10、及積層於黏著劑層10之另一表面10B之基材(支持體)20的單面接著性之黏著片材(附基材之單面黏著片材)。黏著劑層10與基材20之一表面20A接合。作為基材20,例如可使用聚酯膜等樹脂膜。關於使用前之黏著片材1,例如,如圖2所示,可為黏著面10A至少受該黏著劑層側為剝離性表面(剝離面)之剝離襯墊30保護之附剝離襯墊之黏著片材50之形態。或者,亦可為基材20之第二表面20B(與第一表面20A為相反側之表面,亦稱為背面)為剝離面,於基材20之第二表面20B,黏著面10A以抵接之方式進行捲繞或積層,藉此保護黏著面10A之形態。FIG. 2 shows another example of the adhesive sheet with an adhesive layer disclosed herein. The adhesive sheet 2 is configured as a single-sided adhesive sheet (single-sided adhesive sheet with substrate) including a photocurable adhesive layer 10 having a surface 10A serving as an attachment surface (adhesive surface) on an adherend, and a substrate (support) 20 laminated on the other surface 10B of the adhesive layer 10. The adhesive layer 10 is bonded to one surface 20A of the substrate 20. As the substrate 20, for example, a resin film such as a polyester film can be used. Regarding the adhesive sheet 1 before use, for example, as shown in FIG. 2 , it may be in the form of an adhesive sheet 50 with a peeling liner, in which the adhesive surface 10A is protected by a peeling liner 30 whose adhesive layer side is a peeling surface (peeling surface). Alternatively, it may be in the form of a second surface 20B (the surface opposite to the first surface 20A, also referred to as the back surface) of the substrate 20 as the peeling surface, and the adhesive surface 10A is rolled or laminated in abutting manner on the second surface 20B of the substrate 20, thereby protecting the adhesive surface 10A.
又,本文中所揭示之黏著片材亦可為於片狀之基材之一表面積層有第1黏著劑層,於上述基材之另一表面積層有第2黏著劑層之附基材之雙面黏著片材之形態。於該形態之黏著片材中,可藉由本文中所揭示之光硬化性黏著劑層構成第1黏著劑層及第2黏著劑層中之任一者或兩者。Furthermore, the adhesive sheet disclosed herein may also be in the form of a double-sided adhesive sheet with a substrate, in which a first adhesive layer is formed on one surface of a sheet-shaped substrate, and a second adhesive layer is formed on the other surface of the substrate. In the adhesive sheet in this form, either or both of the first adhesive layer and the second adhesive layer may be formed by the photocurable adhesive layer disclosed herein.
<黏著劑層> 於本文中所揭示之技術中,構成光硬化性黏著劑層之黏著劑之種類並無特別限定。上述黏著劑例如可為含有丙烯酸系聚合物、橡膠系聚合物、聚酯系聚合物、胺基甲酸酯系聚合物、聚醚系聚合物、矽酮系聚合物、聚醯胺系聚合物、氟系聚合物等各種橡膠狀聚合物中之1種或2種以上作為基礎聚合物者。就黏著性能或成本等觀點而言,可較佳地使用含有丙烯酸系聚合物或橡膠系聚合物作為基礎聚合物之黏著劑。於一些較佳之態樣中,構成光硬化性黏著劑層之黏著劑可為含有具有碳-碳雙鍵之聚合物之丙烯酸系黏著劑。其中,較佳為上述丙烯酸系黏著劑之基礎聚合物為具有碳-碳雙鍵之聚合物之黏著劑,即含有具有碳-碳雙鍵之丙烯酸系聚合物作為基礎聚合物之丙烯酸系黏著劑。以下,將主要對丙烯酸系黏著劑進行說明,但並非意欲將本文中所揭示之黏著劑限定為丙烯酸系黏著劑。 <Adhesive layer> In the technology disclosed in this article, the type of adhesive constituting the photocurable adhesive layer is not particularly limited. The above-mentioned adhesive may be, for example, one or more of various rubbery polymers such as acrylic polymers, rubber polymers, polyester polymers, urethane polymers, polyether polymers, silicone polymers, polyamide polymers, and fluorine polymers as a base polymer. From the perspective of adhesive performance or cost, it is preferable to use an adhesive containing an acrylic polymer or a rubber polymer as a base polymer. In some preferred embodiments, the adhesive constituting the photocurable adhesive layer may be an acrylic adhesive containing a polymer having a carbon-carbon double bond. Among them, it is preferred that the base polymer of the acrylic adhesive is a polymer having a carbon-carbon double bond, that is, an acrylic adhesive containing an acrylic polymer having a carbon-carbon double bond as a base polymer. Hereinafter, the acrylic adhesive will be mainly described, but it is not intended to limit the adhesive disclosed in this article to the acrylic adhesive.
再者,於該說明書中,黏著劑層之「基礎聚合物」係指該黏著劑層中所含有之聚合物之主成分。上述聚合物較佳為於室溫附近之溫度區域顯示出橡膠彈性之橡膠狀聚合物。又,於該說明書中,於無特別說明之情形時,「主成分」係指超過50重量%含有之成分。Furthermore, in the specification, the "base polymer" of the adhesive layer refers to the main component of the polymer contained in the adhesive layer. The above polymer is preferably a rubber-like polymer that exhibits rubber elasticity in a temperature range near room temperature. In addition, in the specification, unless otherwise specified, the "main component" refers to a component contained in an amount exceeding 50% by weight.
(具有碳-碳雙鍵之聚合物) 本文中所揭示之黏著片材具有含有具有碳-碳雙鍵之聚合物之黏著劑層。含有具有碳-碳雙鍵之聚合物之黏著劑層可利用包括藉由光照射使上述聚合物中之碳-碳雙鍵發生反應之機制進行硬化,藉由該硬化,黏著劑層之彈性模數升高。於一些態樣中,藉由對貼附於被接著體之黏著劑層進行光照射,上述聚合物中之碳-碳雙鍵發生反應,藉此使上述黏著劑層發生硬化收縮,而能夠有效地使具有該黏著劑層之黏著片材變得容易剝離。其中,較佳為含有具有碳-碳雙鍵之聚合物作為基礎聚合物之黏著劑。 (Polymer with carbon-carbon double bonds) The adhesive sheet disclosed herein has an adhesive layer containing a polymer with carbon-carbon double bonds. The adhesive layer containing a polymer with carbon-carbon double bonds can be hardened by a mechanism including causing the carbon-carbon double bonds in the polymer to react by light irradiation, and the elastic modulus of the adhesive layer is increased by the hardening. In some embodiments, by irradiating the adhesive layer attached to the adherend with light, the carbon-carbon double bonds in the polymer react, thereby causing the adhesive layer to harden and shrink, and the adhesive sheet having the adhesive layer can be effectively made easy to peel off. Among them, the adhesive containing a polymer having a carbon-carbon double bond as the base polymer is preferred.
上述聚合物中之碳-碳雙鍵之存在形態並無特別限定。上述聚合物可為於側鏈具有碳-碳雙鍵之聚合物,亦可為於主鏈具有碳-碳雙鍵之聚合物。此處,所謂於主鏈具有碳-碳雙鍵,包括於聚合物之主鏈骨架中存在碳-碳雙鍵、及於主鏈末端存在碳-碳雙鍵。就碳-碳雙鍵之反應性、或利用碳-碳雙鍵之反應產生之彈性模數升高性等觀點而言,可較佳地使用於側鏈具有碳-碳雙鍵之聚合物。此處,聚合物之主鏈係指形成該聚合物之骨架之鏈狀結構。又,聚合物之側鏈係指與上述主鏈鍵結之基(側鏈基、側基)或可視為側鏈之分子鏈。The existence form of the carbon-carbon double bonds in the above-mentioned polymer is not particularly limited. The above-mentioned polymer may be a polymer having carbon-carbon double bonds in the side chain, or a polymer having carbon-carbon double bonds in the main chain. Here, the so-called carbon-carbon double bonds in the main chain include the presence of carbon-carbon double bonds in the main chain skeleton of the polymer and the presence of carbon-carbon double bonds at the end of the main chain. From the viewpoints of the reactivity of the carbon-carbon double bonds or the increase in elastic modulus produced by the reaction of the carbon-carbon double bonds, the polymer having carbon-carbon double bonds in the side chain can be preferably used. Here, the main chain of the polymer refers to the chain structure forming the skeleton of the polymer. In addition, the side chain of a polymer refers to a group bonded to the main chain (side chain group, pendant group) or a molecular chain that can be regarded as a side chain.
於一些較佳之態樣中,上述具有碳-碳雙鍵之聚合物以乙烯性不飽和基之形態具有碳-碳雙鍵。上述具有碳-碳雙鍵之聚合物例如可為以下述式(1)所表示之反應性基((甲基)丙烯醯基)之形態具有碳-碳雙鍵之聚合物。 [化1] (式中,R為氫原子或甲基) In some preferred embodiments, the polymer having a carbon-carbon double bond has a carbon-carbon double bond in the form of an ethylenically unsaturated group. The polymer having a carbon-carbon double bond may be, for example, a polymer having a carbon-carbon double bond in the form of a reactive group ((meth)acryloyl) represented by the following formula (1). [Chemical 1] (In the formula, R is a hydrogen atom or a methyl group)
作為具有碳-碳雙鍵之聚合物,並無特別限定,可考慮黏著劑層之特性等來選擇適當之聚合物使用。具有碳-碳雙鍵之聚合物例如可為藉由化學修飾等方法向不含有碳-碳雙鍵之一級聚合物中導入碳-碳雙鍵而成者(二級聚合物)。The polymer having carbon-carbon double bonds is not particularly limited, and an appropriate polymer can be selected for use in consideration of the properties of the adhesive layer, etc. The polymer having carbon-carbon double bonds can be, for example, a primary polymer having no carbon-carbon double bonds introduced with carbon-carbon double bonds by chemical modification or the like (secondary polymer).
作為向一級聚合物中導入碳-碳雙鍵之方法之具體例,可例舉如下方法:準備使具有官能基(以下亦稱為「官能基A」)之單體進行共聚而成之一級聚合物,於該一級聚合物中,使具有可與上述官能基A反應之官能基(以下亦稱為「官能基B」)及碳-碳雙鍵之化合物(例如具有官能基B之乙烯性不飽和化合物)以碳-碳雙鍵不會消失之方式發生反應,藉此獲得導入有碳-碳雙鍵之聚合物(二級聚合物)。官能基A與官能基B之反應例如較佳為縮合反應或加成反應等不伴隨自由基產生之反應。作為官能基A與官能基B之組合之例,可例舉:羧基與環氧基之組合、羧基與氮丙啶基之組合、羥基與異氰酸基之組合等。其中,就追蹤反應性之觀點而言,較佳為羥基與異氰酸基之組合。又,關於上述官能基A、B之組合,只要為可獲得具有碳-碳雙鍵之聚合物之組合即可,可將上述組合中之一官能基設為官能基A,將另一官能基設為官能基B,或者,亦可將上述一官能基設為官能基B,將上述另一官能基設為官能基A。例如,若以羥基與異氰酸基之組合進行說明,則一級聚合物所具有之官能基A可為羥基(於該情形時,官能基B為異氰酸基),亦可為異氰酸基(於該情形時,官能基B為羥基)。其中較佳為一級聚合物具有羥基,上述具有碳-碳雙鍵之含官能基B之化合物(較佳為具有官能基B之乙烯性不飽和化合物)具有異氰酸基之組合。該組合於上述一級聚合物為丙烯酸系聚合物之情形時尤佳。As a specific example of a method for introducing a carbon-carbon double bond into a primary polymer, the following method can be cited: a primary polymer is prepared by copolymerizing a monomer having a functional group (hereinafter also referred to as "functional group A"), and a compound having a functional group (hereinafter also referred to as "functional group B") and a carbon-carbon double bond (for example, an ethylenically unsaturated compound having functional group B) that can react with the functional group A is reacted in the primary polymer in such a manner that the carbon-carbon double bond does not disappear, thereby obtaining a polymer (secondary polymer) having a carbon-carbon double bond introduced. The reaction between the functional group A and the functional group B is preferably a reaction that is not accompanied by the generation of free radicals, such as a condensation reaction or an addition reaction. Examples of the combination of functional groups A and functional groups B include: a combination of a carboxyl group and an epoxy group, a combination of a carboxyl group and an aziridine group, a combination of a hydroxyl group and an isocyanate group, etc. Among them, from the perspective of tracking reactivity, a combination of a hydroxyl group and an isocyanate group is preferred. In addition, regarding the combination of the functional groups A and B, as long as it is a combination that can obtain a polymer having a carbon-carbon double bond, one of the functional groups in the above combination can be set as the functional group A and the other functional group can be set as the functional group B, or one of the functional groups can be set as the functional group B and the other functional group can be set as the functional group A. For example, if the combination of a hydroxyl group and an isocyanate group is used for explanation, the functional group A of the primary polymer may be a hydroxyl group (in which case, the functional group B is an isocyanate group) or an isocyanate group (in which case, the functional group B is a hydroxyl group). Among them, a combination in which the primary polymer has a hydroxyl group and the compound having a carbon-carbon double bond and containing a functional group B (preferably an ethylenically unsaturated compound having a functional group B) has an isocyanate group is preferred. This combination is particularly preferred when the primary polymer is an acrylic polymer.
於使一級聚合物之官能基A與具有碳-碳雙鍵之化合物之官能基B發生反應時,就兩者之反應性之觀點而言,上述官能基A之莫耳(M A)與上述官能基B之莫耳(M B)之莫耳比(M A/M B)通常較適當設為0.2以上,較佳為設為0.5以上(例如0.7以上,典型而言1.0以上),可設為超過1.0(例如1.1以上),亦可設為1.2以上。上述莫耳比(M A/M B)通常較適當設為2000以下(例如,1500以下或1000以下),較有利設為500以下,可為200以下,亦可為100以下,亦可為50以下。於一些態樣中,上述莫耳比(M A/M B)較佳為30以下,可為20以下,亦可為10以下,亦可為5.0以下,亦可為3.0以下,亦可為2.5以下,亦可為2.0以下,亦可為1.5以下。又,就提高官能基A與官能基B之接觸機會之觀點而言,可多使用具有碳-碳雙鍵之含官能基B之化合物,於該情形時,莫耳比(M A/M B)較佳為設為未達1(例如未達0.99、未達0.95)。又,例如於將剩餘之官能基A亦用於其他目的(例如,提昇硬化處理前之光硬化性黏著劑層之接著性等)之情形時,莫耳比(M A/M B)較佳為大於1。 When the functional group A of the primary polymer reacts with the functional group B of the compound having a carbon-carbon double bond, from the viewpoint of the reactivity of both, the molar ratio (MA/ MB ) of the mole of the functional group A ( MA ) to the mole of the functional group B (MB ) is usually preferably set to 0.2 or more, preferably 0.5 or more (e.g. 0.7 or more, typically 1.0 or more), may be set to more than 1.0 (e.g. 1.1 or more), and may also be set to 1.2 or more. The molar ratio ( MA / MB ) is usually preferably set to 2000 or less (e.g. 1500 or less or 1000 or less), preferably 500 or less, may be 200 or less, may be 100 or less, and may be 50 or less. In some aspects, the molar ratio ( MA / MB ) is preferably 30 or less, 20 or less, 10 or less, 5.0 or less, 3.0 or less, 2.5 or less, 2.0 or less, or 1.5 or less. In addition, from the viewpoint of increasing the contact opportunity between the functional group A and the functional group B, more compounds containing the functional group B having a carbon-carbon double bond may be used. In this case, the molar ratio ( MA / MB ) is preferably set to less than 1 (e.g., less than 0.99, less than 0.95). In addition, for example, when the remaining functional group A is also used for other purposes (e.g., improving the adhesion of the photocurable adhesive layer before curing treatment), the molar ratio ( MA / MB ) is preferably greater than 1.
關於上述具有碳-碳雙鍵之含官能基B之化合物(較佳為具有官能基B之乙烯性不飽和化合物)之使用量,相對於具有官能基A之聚合物(典型而言,導入碳-碳雙鍵前之聚合物)100重量份,例如可設為大約0.001重量份以上、大約0.01重量份以上或大約0.1重量份以上,較適當為設為大約0.5重量份以上(例如大約1.0重量份以上),較佳為大約3.0重量份以上,更佳為大約5.0重量份以上,可為大約7.0重量份以上,亦可為大約9.0重量份以上,亦可為大約10重量份以上,亦可為大約12重量份以上。又,關於具有碳-碳雙鍵之含官能基B之化合物之使用量,相對於具有官能基A之聚合物(典型而言,導入碳-碳雙鍵前之聚合物)100重量份,較適當為設為大約40重量份以下,較佳為大約35重量份以下,更佳為大約30重量份以下,可為大約25重量份以下,亦可為大約20重量份以下,亦可為大約17重量份以下。上述使用量較佳為設定為滿足上述莫耳比(M A/M B)。例如,對於使用後述之丙烯酸系聚合物作為聚合物之構成,可較佳地應用上述莫耳比(M A/M B)、或具有碳-碳雙鍵之含官能基B之化合物之使用量。 Regarding the usage amount of the compound containing the functional group B having a carbon-carbon double bond (preferably an ethylenically unsaturated compound having the functional group B), relative to 100 parts by weight of the polymer having the functional group A (typically, the polymer before the introduction of the carbon-carbon double bond), it can be set to, for example, about 0.001 parts by weight or more, about 0.01 parts by weight or more, or about 0.1 parts by weight or more, more appropriately about 0.5 parts by weight or more (for example, about 1.0 parts by weight or more), preferably about 3.0 parts by weight or more, more preferably about 5.0 parts by weight or more, can be about 7.0 parts by weight or more, can also be about 9.0 parts by weight or more, can also be about 10 parts by weight or more, and can also be about 12 parts by weight or more. In addition, the amount of the compound containing the functional group B having a carbon-carbon double bond is preferably set to about 40 parts by weight or less, preferably about 35 parts by weight or less, more preferably about 30 parts by weight or less, about 25 parts by weight or less, about 20 parts by weight or less, or about 17 parts by weight or less, relative to 100 parts by weight of the polymer having the functional group A (typically, the polymer before the carbon-carbon double bond is introduced). The above amount is preferably set to meet the above molar ratio ( MA / MB ). For example, for the use of the acrylic polymer described later as the composition of the polymer, the above molar ratio (MA / MB ) or the amount of the compound containing the functional group B having a carbon-carbon double bond can be preferably applied.
(具有碳-碳雙鍵之丙烯酸系聚合物) 就藉由光照射之硬化容易性等觀點而言,本文中所揭示之光硬化性黏著劑層可以含有丙烯酸系聚合物(即具有碳-碳雙鍵之丙烯酸系聚合物)作為上述具有碳-碳雙鍵之聚合物之態樣較佳地實施。丙烯酸系聚合物就單體原料之選擇自由度較高、物性控制較容易之方面而言亦較有利。就適於如後文所述藉由不利用有機溶劑之方法進行之製造之觀點而言,具有碳-碳雙鍵之丙烯酸系聚合物及含有該丙烯酸系聚合物之黏著劑層亦較佳。 (Acrylic polymer with carbon-carbon double bond) From the viewpoint of ease of curing by light irradiation, the photocurable adhesive layer disclosed in this article can be preferably implemented in the form of containing an acrylic polymer (i.e., an acrylic polymer with carbon-carbon double bond) as the above-mentioned polymer with carbon-carbon double bond. Acrylic polymers are also advantageous in terms of higher freedom in selecting monomer raw materials and easier control of physical properties. From the viewpoint of being suitable for production by a method that does not utilize an organic solvent as described later, acrylic polymers with carbon-carbon double bonds and adhesive layers containing the acrylic polymers are also preferred.
具有碳-碳雙鍵之丙烯酸系聚合物可為藉由對作為一級聚合物之丙烯酸系聚合物(典型而言,不含碳-碳雙鍵之丙烯酸系聚合物)進行化學修飾而導入有碳-碳雙鍵者。向丙烯酸系聚合物中導入碳-碳雙鍵之方法並無特別限定。例如,可較佳地採用如下方法:使藉由共聚而被導入至丙烯酸系聚合物中之官能基(官能基A)與具有可與該官能基A反應之官能基(官能基B)及碳-碳雙鍵之化合物以碳-碳雙鍵不消失之方式發生反應(典型而言,縮合、加成反應)。作為官能基A與官能基B之組合之例,可例舉羧基與環氧基之組合、羧基與氮丙啶基之組合、羥基與異氰酸基之組合等。其中,就追蹤反應性之觀點而言,較佳為羥基與異氰酸基之組合。就聚合物設計等觀點而言,尤佳為丙烯酸系聚合物具有羥基,且上述化合物具有異氰酸基之組合。又,就光硬化性黏著劑層之光硬化性等觀點而言,上述具有官能基B及碳-碳雙鍵之化合物較佳為具有官能基B之乙烯性不飽和化合物。The acrylic polymer having a carbon-carbon double bond may be one in which a carbon-carbon double bond is introduced by chemically modifying an acrylic polymer as a primary polymer (typically, an acrylic polymer not containing a carbon-carbon double bond). The method for introducing a carbon-carbon double bond into an acrylic polymer is not particularly limited. For example, the following method may be preferably adopted: a functional group (functional group A) introduced into an acrylic polymer by copolymerization is reacted with a compound having a functional group (functional group B) that can react with the functional group A and a carbon-carbon double bond in such a manner that the carbon-carbon double bond does not disappear (typically, condensation, addition reaction). Examples of the combination of functional group A and functional group B include a combination of a carboxyl group and an epoxy group, a combination of a carboxyl group and an aziridine group, and a combination of a hydroxyl group and an isocyanate group. Among them, from the perspective of tracking reactivity, a combination of a hydroxyl group and an isocyanate group is preferred. From the perspective of polymer design, a combination in which an acrylic polymer has a hydroxyl group and the above compound has an isocyanate group is particularly preferred. Furthermore, from the perspective of the photocurability of the photocurable adhesive layer, the above compound having a functional group B and a carbon-carbon double bond is preferably an ethylenically unsaturated compound having a functional group B.
作為具有官能基B之乙烯性不飽和化合物之一適宜例,可例舉含異氰酸基之單體(含異氰酸基之化合物)。作為含異氰酸基之單體之具體例,可例舉於後文中記述為可於丙烯酸系聚合物之聚合中使用之副單體者等。其中,更佳為異氰酸2-(甲基)丙烯醯氧基乙酯。藉由使含異氰酸基之單體之異氰酸基(官能基B)與丙烯酸系聚合物之羥基(官能基A)發生反應並鍵結(典型而言,胺基甲酸酯鍵),可適宜地實現具有碳-碳雙鍵之丙烯酸系聚合物。As a suitable example of an ethylenically unsaturated compound having a functional group B, an isocyanate-containing monomer (isocyanate-containing compound) can be cited. As a specific example of an isocyanate-containing monomer, those described later as secondary monomers that can be used in the polymerization of an acrylic polymer can be cited. Among them, 2-(methyl)acryloyloxyethyl isocyanate is more preferred. By reacting and bonding the isocyanate group (functional group B) of the isocyanate-containing monomer with the hydroxyl group (functional group A) of the acrylic polymer (typically, a urethane bond), an acrylic polymer having a carbon-carbon double bond can be suitably realized.
就與作為上述官能基A之羥基之反應性之觀點而言,含異氰酸基之單體之使用量可於滿足上述莫耳比(M A/M B)之範圍內適當設定。例如,相對於具有羥基之丙烯酸系聚合物(一級聚合物)100重量份,含異氰酸基之單體之使用量較適當為設為大約1重量份以上(例如3重量份以上),就容易更好地發揮由硬化處理所產生之效果(例如,降低剝離強度、提高儲存彈性模數等)之觀點而言,較佳為設為5重量份以上(例如7重量份以上),可設為8.5重量份以上,亦可設為10重量份以上,亦可設為12重量份以上。含異氰酸基之單體之使用量之上限並無特別限定,相對於上述具有羥基之丙烯酸系聚合物100重量份,較適當為設為大約40重量份以下,較佳為大約35重量份以下,更佳為大約30重量份以下,例如可為大約25重量份以下。 From the viewpoint of reactivity with the hydroxyl group as the functional group A, the amount of the isocyanate group-containing monomer used can be appropriately set within the range satisfying the above molar ratio ( MA / MB ). For example, the amount of the isocyanate group-containing monomer used is preferably set to about 1 part by weight or more (e.g., 3 parts by weight or more) relative to 100 parts by weight of the acrylic polymer (primary polymer) having a hydroxyl group. From the viewpoint of being able to better exert the effect produced by the curing treatment (e.g., reducing the peel strength, improving the storage elastic modulus, etc.), it is preferably set to 5 parts by weight or more (e.g., 7 parts by weight or more), and can be set to 8.5 parts by weight or more, and can also be set to 10 parts by weight or more, and can also be set to 12 parts by weight or more. The upper limit of the amount of the isocyanate group-containing monomer used is not particularly limited. It is preferably set to about 40 parts by weight or less, preferably about 35 parts by weight or less, more preferably about 30 parts by weight or less, for example, about 25 parts by weight or less, relative to 100 parts by weight of the above-mentioned acrylic polymer having a hydroxyl group.
作為具有官能基B之乙烯性不飽和化合物之另一較佳例,可例舉含羥基之單體。作為含羥基之單體之具體例,可例舉於後文中記述為可於丙烯酸系聚合物之聚合中使用之副單體者。例如,較佳為丙烯酸2-羥乙酯(HEA)、丙烯酸4-羥丁酯(4HBA)等(甲基)丙烯酸羥烷基酯,其中,較佳為4HBA。藉由使含羥基之單體之羥基(官能基B)與丙烯酸系聚合物之異氰酸基(官能基A)發生反應並鍵結(典型而言,胺基甲酸酯鍵),可適宜地實現具有碳-碳雙鍵之丙烯酸系聚合物。就與作為上述官能基A之異氰酸基之反應性之觀點而言,作為具有官能基B之乙烯性不飽和化合物之含羥基之單體之使用量可於滿足上述莫耳比(M A/M B)之範圍內適當地設定。 As another preferred example of an ethylenically unsaturated compound having a functional group B, a hydroxyl-containing monomer can be cited. As a specific example of a hydroxyl-containing monomer, those described later as secondary monomers that can be used in the polymerization of an acrylic polymer can be cited. For example, preferred are (meth) alkyl acrylates such as 2-hydroxyethyl acrylate (HEA) and 4-hydroxybutyl acrylate (4HBA), among which 4HBA is preferred. By reacting and bonding the hydroxyl group (functional group B) of the hydroxyl-containing monomer with the isocyanate group (functional group A) of the acrylic polymer (typically, a urethane bond), an acrylic polymer having a carbon-carbon double bond can be suitably achieved. From the viewpoint of reactivity with the isocyanate group as the functional group A, the amount of the hydroxyl group-containing monomer used as the ethylenically unsaturated compound having the functional group B can be appropriately set within the range satisfying the above molar ratio ( MA / MB ).
作為具有官能基B之乙烯性不飽和化合物之其他例,可例舉含環氧基之單體。作為含環氧基之單體之具體例,可例舉於後文中記述為可於丙烯酸系聚合物之聚合中使用之副單體者。例如,較佳為丙烯酸縮水甘油酯或甲基丙烯酸縮水甘油酯(GMA)。藉由使含環氧基之單體之環氧基(官能基B)與丙烯酸系聚合物之羧基(官能基A)發生反應並鍵結,可適宜地實現具有碳-碳雙鍵之丙烯酸系聚合物。就與作為上述官能基A之羧基之反應性之觀點而言,作為具有官能基B之乙烯性不飽和化合物之含環氧基之單體之使用量可於滿足上述莫耳比(M A/M B)之範圍內適當地設定。於一些態樣中,藉由將莫耳比(M A/M B)設為大於1,可對由剩餘之羧基所產生之效果(例如,提高對光硬化性黏著劑層進行硬化處理前之剝離強度、提高硬化處理前及/或硬化處理後之凝聚性或耐熱性、等)進行利用。於該態樣中,莫耳比(M A/M B)例如可設為1.1以上,亦可設為1.5以上或2.0以上。 As other examples of ethylenically unsaturated compounds having the functional group B, an epoxy group-containing monomer can be cited. As specific examples of epoxy group-containing monomers, those described later as secondary monomers that can be used in the polymerization of acrylic polymers can be cited. For example, glycidyl acrylate or glycidyl methacrylate (GMA) is preferred. By reacting and bonding the epoxy group (functional group B) of the epoxy group-containing monomer with the carboxyl group (functional group A) of the acrylic polymer, an acrylic polymer having a carbon-carbon double bond can be suitably realized. From the viewpoint of reactivity with the carboxyl group as the functional group A, the amount of the epoxy group-containing monomer as the ethylenically unsaturated compound having the functional group B can be appropriately set within the range satisfying the above molar ratio ( MA / MB ). In some aspects, by setting the molar ratio ( MA / MB ) to be greater than 1, the effects of the remaining carboxyl groups (for example, improving the peeling strength before curing the photocurable adhesive layer, improving the cohesion or heat resistance before and/or after curing, etc.) can be utilized. In this aspect, the molar ratio ( MA / MB ) can be set to, for example, 1.1 or more, or 1.5 or more, or 2.0 or more.
作為一級聚合物之丙烯酸系聚合物例如可為如下單體原料之聚合物,即,含有(甲基)丙烯酸烷基酯作為主單體,可進而含有與該主單體具有共聚性之副單體。此處,主單體係指上述單體原料中之占比超過單體組成之50重量%之成分。The acrylic polymer as the primary polymer may be, for example, a polymer of the following monomer raw materials, that is, containing an alkyl (meth)acrylate as a main monomer, and may further contain a secondary monomer copolymerizable with the main monomer. Here, the main monomer refers to a component in the above-mentioned monomer raw materials that accounts for more than 50% by weight of the monomer composition.
作為(甲基)丙烯酸烷基酯,例如可適宜地使用下述式(2)所表示之化合物。 CH 2=C(R 1)COOR 2(2) 其中,上述式(2)中之R 1為氫原子或甲基。又,R 2為碳原子數1~20之鏈狀烷基(以下,有時將此種碳原子數之範圍表示為「C 1-20」)。就黏著劑層之儲存彈性模數等觀點而言,較佳為R 2為C 1-14(例如C 1-12)之鏈狀烷基之(甲基)丙烯酸烷基酯,更佳為R 1為氫原子且R 2為C 1-20(例如C 1-14、典型而言C 1-12)之鏈狀烷基之丙烯酸烷基酯。 As the (meth)acrylic acid alkyl ester, for example, a compound represented by the following formula (2) can be suitably used. CH 2 =C(R 1 )COOR 2 (2) wherein R 1 in the above formula (2) is a hydrogen atom or a methyl group. Also, R 2 is a chain alkyl group having 1 to 20 carbon atoms (hereinafter, such a range of carbon atoms may be represented as "C 1-20 "). From the viewpoint of the storage elastic modulus of the adhesive layer, a (meth)acrylic acid alkyl ester in which R 2 is a chain alkyl group having 1 to 14 carbon atoms (e.g., C 1-12 carbon atoms) is preferred, and an alkyl acrylate in which R 1 is a hydrogen atom and R 2 is a chain alkyl group having 1 to 20 carbon atoms (e.g., C 1-14 carbon atoms, typically C 1-12 carbon atoms) is more preferred.
作為R 2為C 1-20之鏈狀烷基之(甲基)丙烯酸烷基酯,例如可例舉:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第二丁酯、(甲基)丙烯酸戊酯、(甲基)丙烯酸異戊酯、(甲基)丙烯酸己酯、(甲基)丙烯酸庚酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸壬酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸癸酯、(甲基)丙烯酸異癸酯、(甲基)丙烯酸十一烷基酯、(甲基)丙烯酸十二烷基酯、(甲基)丙烯酸十三烷基酯、(甲基)丙烯酸十四烷基酯、(甲基)丙烯酸十五烷基酯、(甲基)丙烯酸十六烷基酯、(甲基)丙烯酸十七烷基酯、(甲基)丙烯酸十八烷基酯、(甲基)丙烯酸十九烷基酯、(甲基)丙烯酸二十烷基酯等。該等(甲基)丙烯酸烷基酯可單獨使用1種或將2種以上組合使用。作為較佳之(甲基)丙烯酸烷基酯,可例舉:丙烯酸乙酯(EA)、丙烯酸正丁酯(BA)、丙烯酸2-乙基己酯(2EHA)、丙烯酸月桂酯(LA)。 Examples of the alkyl (meth)acrylate in which R2 is a C1-20 chain alkyl group include methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, isopropyl (meth)acrylate, n-butyl (meth)acrylate, isobutyl (meth)acrylate, sec-butyl (meth)acrylate, pentyl (meth)acrylate, isopentyl (meth)acrylate, hexyl (meth)acrylate, heptyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, octyl (meth)acrylate, isopropyl (meth)acrylate, n-butyl (meth)acrylate, isobutyl (meth)acrylate, sec-butyl (meth)acrylate, pentyl (meth)acrylate, isopentyl (meth)acrylate, hexyl (meth)acrylate, heptyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, The alkyl (meth)acrylates may be octyl (meth)acrylate, nonyl (meth)acrylate, isononyl (meth)acrylate, decyl (meth)acrylate, isodecyl (meth)acrylate, undecyl (meth)acrylate, dodecyl (meth)acrylate, tridecyl (meth)acrylate, tetradecyl (meth)acrylate, pentadecyl (meth)acrylate, hexadecyl (meth)acrylate, heptadecyl (meth)acrylate, octadecyl (meth)acrylate, nonadecyl (meth)acrylate, eicosyl (meth)acrylate, etc. These alkyl (meth)acrylates may be used alone or in combination of two or more. Preferred alkyl (meth)acrylates include ethyl acrylate (EA), n-butyl acrylate (BA), 2-ethylhexyl acrylate (2EHA), and lauryl acrylate (LA).
於一些較佳之態樣中,上述(甲基)丙烯酸烷基酯含有烷基之碳原子數為9以下之(甲基)丙烯酸烷基酯A1(即,R 2為C 1-9之烷基之(甲基)丙烯酸烷基酯)。如此,藉由限制了側鏈烷基之長度之構成,容易獲得適於藉由光照射來提高彈性模數之光硬化性黏著劑層。例如,於含有側鏈(典型而言,側鏈末端)具有碳-碳雙鍵之丙烯酸系聚合物作為具有碳-碳雙鍵之聚合物的光硬化性黏著劑層中,由於側鏈烷基之長度受限,故而於藉由光照射之硬化處理時可順利地進行碳-碳雙鍵之反應。 In some preferred aspects, the alkyl (meth)acrylate contains an alkyl (meth)acrylate A1 in which the carbon number of the alkyl group is 9 or less (i.e., an alkyl (meth)acrylate in which R2 is a C1-9 alkyl group). In this way, by limiting the length of the side chain alkyl group, a photocurable adhesive layer suitable for improving the elastic modulus by light irradiation can be easily obtained. For example, in a photocurable adhesive layer containing an acrylic polymer having a carbon-carbon double bond in the side chain (typically, at the end of the side chain) as a polymer having a carbon-carbon double bond, since the length of the side chain alkyl group is limited, the carbon-carbon double bond reaction can be smoothly carried out during the curing treatment by light irradiation.
關於構成丙烯酸系聚合物之全部單體成分中之(甲基)丙烯酸烷基酯A1之調配比率,較適當為大約10重量%以上,就較佳地表現(甲基)丙烯酸烷基酯A1之作用之觀點而言,較佳為20重量%以上,更佳為40重量%以上,進而較佳為55重量%以上,可為65重量%以上,亦可為75重量%以上,亦可為80重量%以上,亦可為85重量%以上,亦可為90重量%以上,亦可為95重量%以上。全部單體成分中之(甲基)丙烯酸烷基酯A1之調配比率之上限並無特別限定。於一些態樣中,考慮到與副單體(例如,具有官能基A之單體)之使用量之均衡,全部單體成分中之(甲基)丙烯酸烷基酯A1之調配比率較適當為設為大約99.5重量%以下(例如99重量%以下),較佳為設為95重量%以下,可為92重量%以下,亦可為90重量%以下,亦可為85重量%以下,亦可為80重量%以下,亦可為75重量%以下,亦可為70重量%以下。The proportion of the (meth)acrylic acid alkyl ester A1 in all monomer components constituting the acrylic polymer is preferably about 10% by weight or more. From the viewpoint of better exerting the effect of the (meth)acrylic acid alkyl ester A1, it is preferably 20% by weight or more, more preferably 40% by weight or more, and further preferably 55% by weight or more, and can be 65% by weight or more, 75% by weight or more, 80% by weight or more, 85% by weight or more, 90% by weight or more, and 95% by weight or more. The upper limit of the proportion of the (meth)acrylic acid alkyl ester A1 in all monomer components is not particularly limited. In some embodiments, considering the balance with the usage amount of the side monomer (for example, the monomer having the functional group A), the blending ratio of the (meth)acrylate A1 in all monomer components is preferably set to about 99.5 wt % or less (for example, 99 wt % or less), preferably 95 wt % or less, 92 wt % or less, 90 wt % or less, 85 wt % or less, 80 wt % or less, 75 wt % or less, or 70 wt % or less.
關於(甲基)丙烯酸烷基酯A1在作為主單體之(甲基)丙烯酸烷基酯整體中所占之含有比率,較適當為大約50重量%以上(例如超過50重量%),就較佳地表現(甲基)丙烯酸烷基酯A1之作用之觀點而言,較佳為70重量%以上,更佳為80重量%以上,進而較佳為90重量%以上,可為95重量%以上,亦可為99~100重量%。The content ratio of the alkyl (meth)acrylate A1 in the entire alkyl (meth)acrylate as the main monomer is preferably about 50 wt % or more (e.g., more than 50 wt %). From the viewpoint of better exertion of the effect of the alkyl (meth)acrylate A1, it is preferably 70 wt % or more, more preferably 80 wt % or more, further preferably 90 wt % or more, and can be 95 wt % or more, and can also be 99-100 wt %.
於一些較佳之態樣中,上述(甲基)丙烯酸烷基酯A1含有烷基之碳原子數未達8之(甲基)丙烯酸烷基酯A3。(甲基)丙烯酸烷基酯A3例如可有助於提昇對金屬等極性被接著體之接著性。(甲基)丙烯酸烷基酯A3中之烷基之碳原子數典型而言為7以下,較佳為6以下,更佳為4以下,可為2以下。於一些態樣中,就硬化處理前之光硬化性黏著劑層之柔軟性等觀點而言,(甲基)丙烯酸烷基酯A3中之烷基之碳原子數較佳為2以上。In some preferred embodiments, the alkyl (meth)acrylate A1 contains an alkyl (meth)acrylate A3 in which the carbon number of the alkyl group is less than 8. The alkyl (meth)acrylate A3 can help improve the adhesion to polar adherends such as metals. The carbon number of the alkyl group in the alkyl (meth)acrylate A3 is typically 7 or less, preferably 6 or less, more preferably 4 or less, and can be 2 or less. In some embodiments, from the viewpoint of the softness of the photocurable adhesive layer before the curing treatment, the carbon number of the alkyl group in the alkyl (meth)acrylate A3 is preferably 2 or more.
關於全部單體成分中之(甲基)丙烯酸烷基酯A3之調配比率,較適當為大約10重量%以上,就較佳地表現(甲基)丙烯酸烷基酯A3之作用之觀點而言,較佳為20重量%以上,更佳為30重量%以上,進而較佳為40重量%以上,尤佳為50重量%以上,可為60重量%以上,亦可為70重量%以上,亦可為80重量%以上,亦可為90重量%以上。全部單體成分中之(甲基)丙烯酸烷基酯A3之調配比率之上限並無特別限定。於一些態樣中,考慮到與副單體之使用量之均衡,全部單體成分中之(甲基)丙烯酸烷基酯A3之調配比率較適當為設為大約99.5重量%以下(例如99重量%以下),較佳為設為95重量%以下,可設為90重量%以下或80重量%以下,亦可設為70重量%以下,亦可設為60重量%以下,亦可設為50重量%以下,亦可設為30重量%以下、15重量%以下、10重量%以下或5重量%以下。The proportion of the (meth)acrylic acid alkyl ester A3 in the total monomer components is preferably about 10% by weight or more. From the perspective of better exertion of the effect of the (meth)acrylic acid alkyl ester A3, it is preferably 20% by weight or more, more preferably 30% by weight or more, further preferably 40% by weight or more, particularly preferably 50% by weight or more, and can be 60% by weight or more, 70% by weight or more, 80% by weight or more, or 90% by weight or more. The upper limit of the proportion of the (meth)acrylic acid alkyl ester A3 in the total monomer components is not particularly limited. In some embodiments, considering the balance with the usage amount of the side monomer, the blending ratio of the (meth)acrylate A3 in all monomer components is preferably set to about 99.5 wt % or less (for example, 99 wt % or less), preferably set to 95 wt % or less, can be set to 90 wt % or less or 80 wt % or less, can also be set to 70 wt % or less, can also be set to 60 wt % or less, can also be set to 50 wt % or less, can also be set to 30 wt % or less, can also be set to 15 wt % or less, can also be set to 10 wt % or less, or can also be set to 5 wt % or less.
關於(甲基)丙烯酸烷基酯A3於作為主單體之(甲基)丙烯酸烷基酯整體中所占之含有比率,較適當為大約5重量%以上,就較佳地表現(甲基)丙烯酸烷基酯A3之作用之觀點而言,較佳為20重量%以上,更佳為35重量%以上,進而較佳為45重量%以上,尤佳為55重量%以上,可為65重量%以上,亦可為75重量%以上,亦可為85重量%以上(例如90重量%以上)。(甲基)丙烯酸烷基酯A3於上述(甲基)丙烯酸烷基酯整體中所占之含有比率之上限為100重量%。於一些態樣中,例如就於含有後述之(甲基)丙烯酸烷基酯A2之情形時較佳地表現其作用之觀點而言,(甲基)丙烯酸烷基酯A3於(甲基)丙烯酸烷基酯整體中所占之含有比率例如可為90重量%以下,亦可為75重量%以下,亦可為60重量%以下,亦可為45重量%以下,亦可為30重量%以下,亦可為15重量%以下。The content ratio of the alkyl (meth)acrylate A3 in the total alkyl (meth)acrylate as the main monomer is preferably about 5% by weight or more. From the perspective of better exertion of the effect of the alkyl (meth)acrylate A3, it is preferably 20% by weight or more, more preferably 35% by weight or more, further preferably 45% by weight or more, and particularly preferably 55% by weight or more, and can be 65% by weight or more, 75% by weight or more, and can be 85% by weight or more (for example, 90% by weight or more). The upper limit of the content ratio of the alkyl (meth)acrylate A3 in the total alkyl (meth)acrylate is 100% by weight. In some aspects, for example, from the viewpoint of better exerting its effect when containing the (meth)acrylate alkyl ester A2 described later, the content ratio of the (meth)acrylate alkyl ester A3 in the entire (meth)acrylate alkyl ester may be, for example, 90% by weight or less, 75% by weight or less, 60% by weight or less, 45% by weight or less, 30% by weight or less, or 15% by weight or less.
於一些態樣中,上述(甲基)丙烯酸烷基酯含有烷基之碳原子數為5以上之(甲基)丙烯酸烷基酯A2作為上述(甲基)丙烯酸烷基酯A1或A3,或者作為與(甲基)丙烯酸烷基酯A1或A3不同之單體。藉由使用(甲基)丙烯酸烷基酯A2,例如容易降低硬化處理後之黏著力,而容易獲得更優異之易剝離性或低污染性。(甲基)丙烯酸烷基酯A2中之烷基之碳原子數較佳為7以上(例如8以上),可為9以上。就接著力等黏著特性之觀點而言,(甲基)丙烯酸烷基酯A2中之烷基之碳原子數較佳為14以下,更佳為12以下,可為10以下或9以下。In some embodiments, the above-mentioned alkyl (meth)acrylate contains an alkyl (meth)acrylate A2 having an alkyl group with 5 or more carbon atoms as the above-mentioned alkyl (meth)acrylate A1 or A3, or as a monomer different from the alkyl (meth)acrylate A1 or A3. By using the alkyl (meth)acrylate A2, for example, it is easy to reduce the adhesion after the curing treatment, and it is easy to obtain better peelability or low contamination. The number of carbon atoms of the alkyl group in the alkyl (meth)acrylate A2 is preferably 7 or more (for example, 8 or more), and can be 9 or more. From the viewpoint of adhesion properties such as adhesion, the number of carbon atoms of the alkyl group in the alkyl (meth)acrylate A2 is preferably 14 or less, more preferably 12 or less, and can be 10 or less or 9 or less.
關於構成丙烯酸系聚合物之全部單體成分中之(甲基)丙烯酸烷基酯A2之調配比率,較適當為大約10重量%以上,就較佳地表現(甲基)丙烯酸烷基酯A2之作用之觀點而言,較佳為大約20重量%以上,更佳為大約40重量%以上,進而較佳為大約55重量%以上,尤佳為大約65重量%以上,例如可為大約75重量%以上,亦可為大約80重量%以上,亦可為大約85重量%以上,亦可為大約90重量%以上,亦可為大約95重量%以上。全部單體成分中之(甲基)丙烯酸烷基酯A2之調配比率並無特別限定。於一些態樣中,考慮到與副單體之使用量之均衡,全部單體成分中之(甲基)丙烯酸烷基酯A2之調配比率較適當為設為大約99.5重量%以下(例如99重量%以下),較佳為設為95重量%以下,可設為90重量%以下或80重量%以下,亦可設為70重量%以下,亦可設為60重量%以下,亦可設為50重量%以下,亦可設為30重量%以下、15重量%以下、10重量%以下或5重量%以下。The proportion of the (meth)acrylic acid alkyl ester A2 in all monomer components constituting the acrylic polymer is preferably about 10% by weight or more. From the viewpoint of better exerting the effect of the (meth)acrylic acid alkyl ester A2, it is preferably about 20% by weight or more, more preferably about 40% by weight or more, further preferably about 55% by weight or more, and particularly preferably about 65% by weight or more. For example, it may be about 75% by weight or more, or about 80% by weight or more, or about 85% by weight or more, or about 90% by weight or more, or about 95% by weight or more. The proportion of the (meth)acrylic acid alkyl ester A2 in all monomer components is not particularly limited. In some embodiments, considering the balance with the usage amount of the side monomer, the blending ratio of the (meth)acrylate A2 in all monomer components is preferably set to about 99.5 wt % or less (for example, 99 wt % or less), preferably set to 95 wt % or less, can be set to 90 wt % or less or 80 wt % or less, can also be set to 70 wt % or less, can also be set to 60 wt % or less, can also be set to 50 wt % or less, can also be set to 30 wt % or less, can also be set to 15 wt % or less, can also be set to 10 wt % or less, or can also be set to 5 wt % or less.
關於(甲基)丙烯酸烷基酯A2於作為主單體之(甲基)丙烯酸烷基酯整體中所占之含有比率,例如可為大約1重量%以上,就較佳地表現(甲基)丙烯酸烷基酯A2之作用之觀點而言,較佳為5重量%以上,更佳為15重量%以上,進而較佳為25重量%以上,尤佳為35重量%以上,可為45重量%以上,亦可為60重量%以上,亦可為80重量%以上(例如90重量%以上)。(甲基)丙烯酸烷基酯A2於上述(甲基)丙烯酸烷基酯整體中所占之含有比率之上限為100重量%。於一些態樣中,例如就於含有(甲基)丙烯酸烷基酯A3之情形時較佳地表現其作用之觀點而言,(甲基)丙烯酸烷基酯A2於(甲基)丙烯酸烷基酯整體中所占之含有比率例如可為90重量%以下,亦可為75重量%以下,亦可為60重量%以下,亦可為45重量%以下,亦可為30重量%以下,亦可為15重量%以下。The content ratio of the alkyl (meth)acrylate A2 in the total alkyl (meth)acrylate as the main monomer may be, for example, about 1% by weight or more. From the viewpoint of better expressing the effect of the alkyl (meth)acrylate A2, it is preferably 5% by weight or more, more preferably 15% by weight or more, further preferably 25% by weight or more, particularly preferably 35% by weight or more, and may be 45% by weight or more, 60% by weight or more, or 80% by weight or more (e.g., 90% by weight or more). The upper limit of the content ratio of the alkyl (meth)acrylate A2 in the total alkyl (meth)acrylate is 100% by weight. In some aspects, for example, from the viewpoint of better exerting its effect when containing the (meth)acrylate alkyl ester A3, the content ratio of the (meth)acrylate alkyl ester A2 in the entire (meth)acrylate alkyl ester may be, for example, 90 wt % or less, or 75 wt % or less, or 60 wt % or less, or 45 wt % or less, or 30 wt % or less, or 15 wt % or less.
構成丙烯酸系聚合物之全部單體成分中之主單體之調配比率較佳為55重量%以上,更佳為60重量%以上(例如65重量%以上)。主單體之調配比率之上限並無特別限定。於一些態樣中,考慮到與副單體之使用量之均衡,主單體之調配比率例如較適當為設為99.5重量%以下(例如99重量%以下),可設為95重量%以下,亦可設為90重量%以下、85重量%以下或大約75重量%以下。The blending ratio of the main monomer in all monomer components constituting the acrylic polymer is preferably 55% by weight or more, more preferably 60% by weight or more (e.g., 65% by weight or more). The upper limit of the blending ratio of the main monomer is not particularly limited. In some embodiments, in consideration of the balance with the amount of the secondary monomer used, the blending ratio of the main monomer is, for example, preferably set to 99.5% by weight or less (e.g., 99% by weight or less), can be set to 95% by weight or less, can also be set to 90% by weight or less, 85% by weight or less, or about 75% by weight or less.
與作為主單體之(甲基)丙烯酸烷基酯具有共聚性之副單體例如可有助於提高作為一級聚合物或二級聚合物之丙烯酸系聚合物之凝集力,或向該聚合物中導入交聯點。較佳為使用後述之具有可與具有碳-碳雙鍵之化合物之官能基(官能基B)發生反應之官能基(官能基A)的單體作為副單體之至少一部分。作為副單體,例如如下含官能基之單體成分可單獨地僅使用1種或2種以上組合使用。亦可併用具有官能基A之單體與具有其他官能基之單體。The secondary monomer copolymerizable with the (meth) alkyl acrylate as the main monomer can, for example, help to improve the cohesive force of the acrylic polymer as the primary polymer or the secondary polymer, or introduce crosslinking points into the polymer. It is preferred to use a monomer having a functional group (functional group A) that can react with a functional group (functional group B) of a compound having a carbon-carbon double bond as described later as at least a part of the secondary monomer. As secondary monomers, for example, the following monomer components containing functional groups can be used alone or in combination of two or more. A monomer having a functional group A and a monomer having other functional groups can also be used in combination.
含羥基之單體:例如,(甲基)丙烯酸2-羥乙酯、(甲基)丙烯酸2-羥丙酯、(甲基)丙烯酸3-羥丙酯、(甲基)丙烯酸4-羥丁酯等(甲基)丙烯酸羥烷基酯類;乙烯醇、烯丙醇等不飽和醇類;2-羥乙基乙烯醚、4-羥基丁基乙烯醚、二乙二醇單乙烯醚等醚系化合物。 含異氰酸基之單體:異氰酸(甲基)丙烯醯基酯、異氰酸2-(甲基)丙烯醯氧基乙酯、間異丙烯基-α,α-二甲基苄基異氰酸酯。 含羧基之單體:例如,丙烯酸(AA)、甲基丙烯酸(MAA)、丁烯酸等乙烯性不飽和單羧酸;馬來酸、伊康酸、檸康酸等乙烯性不飽和二羧酸及其酐(馬來酸酐、伊康酸酐等)。 含醯胺基之單體:例如,(甲基)丙烯醯胺、N,N-二甲基(甲基)丙烯醯胺、N-丁基(甲基)丙烯醯胺、N-羥甲基(甲基)丙烯醯胺、N-羥甲基丙烷(甲基)丙烯醯胺、N-甲氧基甲基(甲基)丙烯醯胺、N-丁氧基甲基(甲基)丙烯醯胺。 含胺基之單體:例如,(甲基)丙烯酸胺基乙酯、(甲基)丙烯酸N,N-二甲基胺基乙酯、(甲基)丙烯酸第三丁基胺基乙酯。 含環氧基之單體:例如,(甲基)丙烯酸縮水甘油酯、(甲基)丙烯酸甲基縮水甘油酯、烯丙基縮水甘油醚。 含氰基之單體:例如,丙烯腈、甲基丙烯腈。 含酮基之單體:例如,二丙酮(甲基)丙烯醯胺、二丙酮(甲基)丙烯酸酯、乙烯基甲基酮、乙烯基乙基酮、乙醯乙酸烯丙酯、乙醯乙酸乙烯酯。 具有含氮原子之環之單體:例如,N-乙烯基-2-吡咯啶酮、N-甲基乙烯基吡咯啶酮、N-乙烯基吡啶、N-乙烯基哌啶酮、N-乙烯基嘧啶、N-乙烯基哌𠯤、N-乙烯基吡𠯤、N-乙烯基吡咯、N-乙烯基咪唑、N-乙烯基㗁唑、N-乙烯基𠰌啉、N-乙烯基己內醯胺、N-(甲基)丙烯醯𠰌啉。 含烷氧基矽烷基之單體:例如,3-(甲基)丙烯醯氧基丙基三甲氧基矽烷、3-(甲基)丙烯醯氧基丙基三乙氧基矽烷、3-(甲基)丙烯醯氧基丙基甲基二甲氧基矽烷、3-(甲基)丙烯醯氧基丙基甲基二乙氧基矽烷。 Monomers containing hydroxyl groups: for example, hydroxyalkyl (meth)acrylates such as 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 3-hydroxypropyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate; unsaturated alcohols such as vinyl alcohol and allyl alcohol; ether compounds such as 2-hydroxyethyl vinyl ether, 4-hydroxybutyl vinyl ether, and diethylene glycol monovinyl ether. Monomers containing isocyanate groups: (meth)acryloyl isocyanate, 2-(meth)acryloyloxyethyl isocyanate, and m-isopropenyl-α,α-dimethylbenzyl isocyanate. Carboxyl-containing monomers: for example, ethylenically unsaturated monocarboxylic acids such as acrylic acid (AA), methacrylic acid (MAA), and crotonic acid; ethylenically unsaturated dicarboxylic acids such as maleic acid, itaconic acid, and liconic acid, and their anhydrides (maleic anhydride, itaconic anhydride, etc.). Amide-containing monomers: for example, (meth)acrylamide, N,N-dimethyl(meth)acrylamide, N-butyl(meth)acrylamide, N-hydroxymethyl(meth)acrylamide, N-hydroxymethylpropane(meth)acrylamide, N-methoxymethyl(meth)acrylamide, and N-butoxymethyl(meth)acrylamide. Amide-containing monomers: for example, aminoethyl(meth)acrylate, N,N-dimethylaminoethyl(meth)acrylate, and tert-butylaminoethyl(meth)acrylate. Epoxy-containing monomers: for example, glycidyl (meth)acrylate, methyl glycidyl (meth)acrylate, allyl glycidyl ether. Cyanide-containing monomers: for example, acrylonitrile, methacrylonitrile. Ketone-containing monomers: for example, diacetone (meth)acrylamide, diacetone (meth)acrylate, vinyl methyl ketone, vinyl ethyl ketone, allyl acetylacetate, vinyl acetylacetate. Monomers having a ring containing a nitrogen atom: for example, N-vinyl-2-pyrrolidone, N-methylvinylpyrrolidone, N-vinylpyridine, N-vinylpiperidone, N-vinylpyrimidine, N-vinylpiperidone, N-vinylpyrrolidone, N-vinylpyrrole, N-vinylimidazole, N-vinyloxazole, N-vinylpyrrolidine, N-vinylcaprolactam, N-(methyl)acryloylpyrrolidine. Monomers containing an alkoxysilyl group: for example, 3-(methyl)acryloyloxypropyltrimethoxysilane, 3-(methyl)acryloyloxypropyltriethoxysilane, 3-(methyl)acryloyloxypropylmethyldimethoxysilane, 3-(methyl)acryloyloxypropylmethyldiethoxysilane.
於使用具有可與具有碳-碳雙鍵之化合物之官能基(官能基B)發生反應之官能基(官能基A)的副單體之情形時,該副單體之種類可根據官能基B之種類進行選擇。作為具有官能基A之副單體,例如較佳為含羥基之單體、含異氰酸基之單體、含羧基之單體、含環氧基之單體。When a side monomer having a functional group (functional group A) that can react with a functional group (functional group B) of a compound having a carbon-carbon double bond is used, the type of the side monomer can be selected according to the type of functional group B. As the side monomer having the functional group A, for example, a hydroxyl group-containing monomer, an isocyanate group-containing monomer, a carboxyl group-containing monomer, and an epoxy group-containing monomer are preferred.
於一些態樣中,作為具有官能基A之副單體,就與具有官能基B之化合物之反應性等觀點而言,可較佳地使用含羥基之單體。由於使用含羥基之單體作為副單體,故而所獲得之丙烯酸系聚合物(一級聚合物)具有羥基。與此相對,藉由使用具有異氰酸基之化合物作為具有碳-碳雙鍵之化合物,上述丙烯酸系聚合物之羥基與上述化合物之異氰酸基發生反應,將來自上述化合物之碳-碳雙鍵導入至上述丙烯酸系聚合物中,從而獲得具有碳-碳雙鍵之丙烯酸系聚合物(二級聚合物)。作為含羥基之單體之適宜例,可例舉丙烯酸2-羥乙酯(HEA)或丙烯酸4-羥丁酯(4HBA)等(甲基)丙烯酸羥烷基酯。其中,較佳為4HBA。In some embodiments, as the side monomer having the functional group A, a hydroxyl group-containing monomer may be preferably used from the viewpoint of reactivity with the compound having the functional group B. Since the hydroxyl group-containing monomer is used as the side monomer, the obtained acrylic polymer (primary polymer) has a hydroxyl group. In contrast, by using a compound having an isocyanate group as the compound having a carbon-carbon double bond, the hydroxyl group of the acrylic polymer reacts with the isocyanate group of the compound, and the carbon-carbon double bond from the compound is introduced into the acrylic polymer, thereby obtaining an acrylic polymer having a carbon-carbon double bond (secondary polymer). Preferred examples of the hydroxyl group-containing monomer include hydroxyalkyl (meth)acrylates such as 2-hydroxyethyl acrylate (HEA) and 4-hydroxybutyl acrylate (4HBA). Among them, 4HBA is preferred.
上述副單體之量並無特別限定,只要以可達成所需之使用目的(導入與官能基B之反應點、調節光硬化性黏著劑層之凝聚性或黏著特性等)之方式適當地進行選擇即可。通常,就容易適宜地發揮由對光硬化性黏著劑層進行光照射(硬化處理)所產生之效果(例如,降低剝離力、提高儲存彈性模數等)之觀點而言,上述副單體之量較適當為設為丙烯酸系聚合物之全部單體成分中之0.1重量%以上,較佳為0.3重量%以上(例如1重量%以上)。又,關於副單體之量,較適當為設為全部單體成分中之70重量%以下(例如60重量%以下),於一些態樣中,就光硬化性黏著劑層之柔軟性等觀點而言,較佳為設為50重量%以下,更佳為設為45重量%以下,可設為40重量%以下,亦可設為30重量%以下,亦可設為20重量%以下、10重量%以下或5重量%以下。The amount of the above-mentioned side monomer is not particularly limited, as long as it is appropriately selected in a manner that can achieve the desired purpose of use (introducing a reaction point with the functional group B, adjusting the cohesiveness or adhesive properties of the photocurable adhesive layer, etc.). Generally, from the perspective of easily and appropriately exerting the effect produced by light irradiation (hardening treatment) of the photocurable adhesive layer (for example, reducing the peeling force, improving the storage elastic modulus, etc.), the amount of the above-mentioned side monomer is preferably set to 0.1% by weight or more, preferably 0.3% by weight or more (for example, 1% by weight or more) of the total monomer components of the acrylic polymer. In addition, regarding the amount of the sub-monomer, it is more appropriate to set it to less than 70 weight % (for example, less than 60 weight %) of the total monomer components. In some embodiments, from the perspective of the flexibility of the photocurable adhesive layer, it is preferably set to less than 50 weight %, and more preferably set to less than 45 weight %. It can be set to less than 40 weight %, or less than 30 weight %, or less than 20 weight %, less than 10 weight % or less than 5 weight %.
於為了實現與具有碳-碳雙鍵之化合物(較佳為具有官能基B之乙烯性不飽和化合物)之反應而使用具有官能基A之副單體之情形時,就容易獲得由硬化處理(典型而言,光照射處理)所產生之效果(例如,降低剝離力、提高儲存彈性模數等)之觀點而言,上述具有官能基A之副單體(根據官能基B之種類,例如為含羥基之單體、含羧基之單體、含異氰酸基之單體、含環氧基之單體等)之量較適當為設為丙烯酸系聚合物之全部單體成分中之1重量%以上,較佳為5重量%以上,更佳為10重量%以上,進而較佳為12重量%以上(例如14重量%以上)。又,就於硬化處理前之黏著劑層(光硬化性黏著劑層)中良好地保持接著性等黏著特性之觀點而言,上述具有官能基A之副單體之量較適當為設為全部單體成分中之50重量%以下(例如40重量%以下),較佳為30重量%以下,更佳為25重量%以下,可為20重量%以下,亦可為15重量%以下。In the case where a side monomer having a functional group A is used in order to achieve a reaction with a compound having a carbon-carbon double bond (preferably an ethylenically unsaturated compound having a functional group B), from the viewpoint of easily obtaining the effect produced by a curing treatment (typically, a light irradiation treatment) (for example, reducing the peel force, increasing the storage elastic modulus, etc.), the amount of the side monomer having the functional group A (depending on the type of the functional group B, for example, a hydroxyl group-containing monomer, a carboxyl group-containing monomer, an isocyanate group-containing monomer, an epoxy group-containing monomer, etc.) is preferably set to be 1% by weight or more of the total monomer components of the acrylic polymer, preferably 5% by weight or more, more preferably 10% by weight or more, and further preferably 12% by weight or more (for example, 14% by weight or more). Furthermore, from the perspective of maintaining good adhesion properties such as adhesion in the adhesive layer (photocurable adhesive layer) before curing treatment, the amount of the above-mentioned side monomer having a functional group A is preferably set to be less than 50 weight % (for example, less than 40 weight %) in all monomer components, preferably less than 30 weight %, more preferably less than 25 weight %, can be less than 20 weight %, and can also be less than 15 weight %.
於一些態樣中,可較佳地使用具有含氮原子之環之單體作為上述副單體。具有含氮原子之環之單體可有助於提高光硬化性黏著劑層之於初始狀態下(硬化處理前)之剝離強度。又,就增大藉由對光硬化性黏著劑層進行光照射(硬化處理)所致之剝離強度下降幅度(剝離強度差)之觀點而言,亦可較有利。具有含氮原子之環之單體之具體例如上所述,作為適宜例,可例舉N-乙烯基-2-吡咯啶酮(NVP)及N-丙烯醯基𠰌啉(ACMO)。關於具有含氮原子之環之單體之使用量,於作為丙烯酸系聚合物(一級聚合物)之原料使用之全部單體成分中,例如可設為0.5重量%以上或1重量%以上,就獲得更高之使用效果之觀點而言,較適當為設為3重量%以上,較有利為設為5重量%以上,可設為10重量%以上,亦可設為12重量%以上,亦可設為17重量%以上或20重量%以上。又,關於具有含氮原子之環之單體之使用量,於作為丙烯酸系聚合物(一級聚合物)之原料使用之全部單體成分中,例如可設為40重量%以下,就光硬化性黏著劑層之柔軟性之觀點而言,於一些態樣中,較適當為設為35重量%以下,較佳為設為30重量%以下(例如28重量%以下)。In some embodiments, it is preferable to use a monomer having a ring containing a nitrogen atom as the above-mentioned secondary monomer. The monomer having a ring containing a nitrogen atom can help to improve the peel strength of the photocurable adhesive layer in the initial state (before curing treatment). In addition, it can also be advantageous from the perspective of increasing the decrease in peel strength (peel strength difference) caused by light irradiation (curing treatment) of the photocurable adhesive layer. Specific examples of monomers having a ring containing a nitrogen atom are as described above, and suitable examples include N-vinyl-2-pyrrolidone (NVP) and N-acryloyl pyrrolidone (ACMO). The amount of the monomer having a ring containing a nitrogen atom used may be, for example, 0.5% by weight or more or 1% by weight of the total monomer components used as the raw material of the acrylic polymer (primary polymer). From the viewpoint of obtaining a higher effect of use, it is preferably 3% by weight or more, more preferably 5% by weight or more, and may be 10% by weight or more, or 12% by weight or more, or 17% by weight or more or 20% by weight or more. Furthermore, the amount of the monomer having a ring containing a nitrogen atom used may be, for example, 40% by weight or less of the total monomer components used as the raw material of the acrylic polymer (primary polymer). From the viewpoint of the flexibility of the photocurable adhesive layer, in some embodiments, it is preferably 35% by weight or less, and preferably 30% by weight or less (e.g., 28% by weight or less).
又,出於提高丙烯酸系聚合物之凝集力等目的,可視需要使用除上述副單體以外之其他共聚成分。作為該共聚成分,例如可例舉:乙酸乙烯酯、丙酸乙烯酯等乙烯酯系單體;苯乙烯、經取代之苯乙烯(α-甲基苯乙烯等)、乙烯基甲苯等芳香族乙烯基化合物;(甲基)丙烯酸環己酯、二(甲基)丙烯酸環戊酯等、(甲基)丙烯酸異𦯉酯等(甲基)丙烯酸環烷基酯;(甲基)丙烯酸芳基酯(例如(甲基)丙烯酸苯酯)、(甲基)丙烯酸芳氧基烷基酯(例如(甲基)丙烯酸苯氧基乙酯)、(甲基)丙烯酸芳基烷基酯(例如(甲基)丙烯酸苄酯)等含芳香族性環之(甲基)丙烯酸酯;乙烯、丙烯、異戊二烯、丁二烯、異丁烯等烯烴系單體;氯乙烯、偏二氯乙烯等含氯之單體;(甲基)丙烯酸甲氧基乙酯、(甲基)丙烯酸乙氧基乙酯等含烷氧基之單體;甲基乙烯醚、乙基乙烯醚等乙烯醚系單體;等。該等除副單體以外之其他共聚成分可單獨使用1種或2種以上組合使用。上述其他共聚成分之量並無特別限定,只要視目的及用途適當地進行選擇即可,例如較佳為設為構成丙烯酸系聚合物之全部單體成分中之20重量%以下(例如2~20重量%,典型而言3~10重量%)。In order to improve the cohesive force of the acrylic polymer, other copolymer components other than the above-mentioned secondary monomers may be used as needed. Examples of such copolymer components include: vinyl ester monomers such as vinyl acetate and vinyl propionate; aromatic vinyl compounds such as styrene, substituted styrenes (such as α-methylstyrene), and vinyltoluene; cycloalkyl (meth)acrylates such as cyclohexyl (meth)acrylate, cyclopentyl di(meth)acrylate, and isobutyl (meth)acrylate; aryl (meth)acrylates (such as phenyl (meth)acrylate), and aryloxyalkyl (meth)acrylates. (Meth)acrylates containing aromatic rings such as phenoxyethyl (meth)acrylate, arylalkyl (meth)acrylate (such as benzyl (meth)acrylate); olefin monomers such as ethylene, propylene, isoprene, butadiene, isobutylene; chlorine-containing monomers such as vinyl chloride and vinylidene chloride; alkoxy-containing monomers such as methoxyethyl (meth)acrylate and ethoxyethyl (meth)acrylate; vinyl ether monomers such as methyl vinyl ether and ethyl vinyl ether; etc. The other copolymer components other than the side monomers can be used alone or in combination of two or more. The amount of the above-mentioned other copolymer components is not particularly limited, as long as it is appropriately selected according to the purpose and use. For example, it is preferably set to 20% by weight or less (for example, 2 to 20% by weight, typically 3 to 10% by weight) of all monomer components constituting the acrylic polymer.
亦可使用多官能單體作為上述其他共聚成分。作為多官能單體之例,可例舉:於1個分子內具有2個以上(甲基)丙烯醯基之各種多官能(甲基)丙烯酸酯、二乙烯苯等多官能乙烯基系單體、如(甲基)丙烯酸烯丙酯及(甲基)丙烯酸乙烯酯之類將(甲基)丙烯醯基與其他乙烯性不飽和基組合而具有之多官能性單體等。多官能單體可單獨使用1種或2種以上組合使用。其中,可較佳地使用多官能(甲基)丙烯酸酯。作為多官能(甲基)丙烯酸酯,例如可例舉:1,6-己二醇二(甲基)丙烯酸酯、丁二醇二(甲基)丙烯酸酯、(聚)乙二醇二(甲基)丙烯酸酯、(聚)丙二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、季戊四醇二(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、四羥甲基甲烷三(甲基)丙烯酸酯、(甲基)丙烯酸烯丙酯、及(甲基)丙烯酸乙烯酯。作為用於丙烯酸系聚合物之多官能(甲基)丙烯酸酯,可單獨使用1種多官能(甲基)丙烯酸酯,亦可將2種以上之多官能(甲基)丙烯酸酯組合使用。於一些態樣中,作為用於丙烯酸系聚合物之多官能(甲基)丙烯酸酯,較佳為使用選自由1,6-己二醇二丙烯酸酯、二季戊四醇六丙烯酸酯、及三羥甲基丙烷三丙烯酸酯所組成之群中之至少1種。A multifunctional monomer may also be used as the above-mentioned other copolymerization component. Examples of the multifunctional monomer include: various multifunctional (meth)acrylates having two or more (meth)acrylic groups in one molecule, multifunctional vinyl monomers such as divinylbenzene, and multifunctional monomers having a combination of a (meth)acrylic group and other ethylenically unsaturated groups such as allyl (meth)acrylate and vinyl (meth)acrylate. The multifunctional monomer may be used alone or in combination of two or more. Among them, multifunctional (meth)acrylates are preferably used. Examples of the multifunctional (meth)acrylate include 1,6-hexanediol di(meth)acrylate, butanediol di(meth)acrylate, (poly)ethylene glycol di(meth)acrylate, (poly)propylene glycol di(meth)acrylate, neopentyl glycol di(meth)acrylate, pentaerythritol di(meth)acrylate, pentaerythritol tri(meth)acrylate, dipentaerythritol hexa(meth)acrylate, trihydroxymethylpropane tri(meth)acrylate, tetrahydroxymethylmethane tri(meth)acrylate, allyl (meth)acrylate, and vinyl (meth)acrylate. As the multifunctional (meth)acrylate used for the acrylic polymer, one type of multifunctional (meth)acrylate may be used alone, or two or more types of multifunctional (meth)acrylates may be used in combination. In some aspects, as the multifunctional (meth)acrylate for the acrylic polymer, it is preferred to use at least one selected from the group consisting of 1,6-hexanediol diacrylate, dipentaerythritol hexaacrylate, and trihydroxymethylpropane triacrylate.
藉由使含有多官能單體之單體成分聚合,典型而言,可獲得藉由該多官能單體進行交聯而成之結構之丙烯酸系聚合物(一級聚合物)。即,上述多官能單體可作為共聚性交聯劑而發揮功能。藉由向該結構之丙烯酸系聚合物中導入碳-碳雙鍵,可獲得具有碳-碳雙鍵,且藉由多官能單體進行交聯而成之結構之丙烯酸系聚合物(二級聚合物)。就向含有該聚合物之光硬化性黏著劑層賦予適度之凝聚性之觀點而言,具有碳-碳雙鍵之丙烯酸系聚合物具有交聯結構可較有利。於含有具有碳-碳雙鍵之丙烯酸系聚合物作為基礎聚合物之光硬化性黏著劑層中,上述丙烯酸系聚合物進行了交聯尤其有意義。By polymerizing the monomer components containing a multifunctional monomer, typically, an acrylic polymer (primary polymer) having a structure crosslinked by the multifunctional monomer can be obtained. That is, the multifunctional monomer can function as a copolymerizable crosslinking agent. By introducing a carbon-carbon double bond into the acrylic polymer having the structure, an acrylic polymer (secondary polymer) having a carbon-carbon double bond and crosslinked by the multifunctional monomer can be obtained. From the viewpoint of imparting appropriate cohesiveness to the photocurable adhesive layer containing the polymer, it is advantageous for the acrylic polymer having a carbon-carbon double bond to have a crosslinked structure. In the photocurable adhesive layer containing an acrylic polymer having a carbon-carbon double bond as a base polymer, it is particularly significant that the acrylic polymer is crosslinked.
作為上述其他共聚成分之多官能單體(共聚性交聯劑)之使用量並無特別限定,只要視目的及用途適當地進行選擇即可,例如,於構成丙烯酸系聚合物(一級聚合物)之全部單體成分中,可設為0.001重量%以上,就容易獲得更高之使用效果之觀點而言,較佳為設為0.005重量%以上,更佳為設為0.007重量%以上,可設為0.01重量%以上,亦可設為0.03重量%以上。又,就容易適宜地發揮由對光硬化性黏著劑層進行硬化處理所產生之效果(例如降低剝離強度之效果)之觀點、或光硬化性黏著劑層之柔軟性等觀點而言,於構成丙烯酸系聚合物之全部單體成分中,多官能單體之使用量例如可設為10重量%以下,較有利為設為5重量%以下,較佳為設為未達5重量%,可設為3重量%以下,亦可設為1重量%以下。於一些態樣中,於構成丙烯酸系聚合物(典型而言,作為一級聚合物之丙烯酸系聚合物)之全部單體成分中,多官能單體之使用量較佳為設為未達1重量%(例如0.9重量%以下),更佳為設為0.5重量%以下,可設為0.3重量%以下,亦可設為0.2重量%以下,亦可設為0.1重量%以下(例如未達0.1重量%),亦可設為0.09重量%以下、0.08重量%以下或0.07重量%以下。就容易適宜地發揮由對光硬化性黏著劑層進行硬化處理(例如紫外線照射處理)所產生之效果(例如易剝離效果)之觀點而言,避免作為一級聚合物之共聚成分使用之多官能單體之使用量過多可較有利。The amount of the multifunctional monomer (copolymerizable crosslinking agent) used as the above-mentioned other copolymer components is not particularly limited, and can be appropriately selected according to the purpose and use. For example, it can be set to 0.001 wt % or more in all monomer components constituting the acrylic polymer (primary polymer). From the viewpoint of easily obtaining a higher use effect, it is preferably set to 0.005 wt % or more, and more preferably set to 0.007 wt % or more. It can be set to 0.01 wt % or more, and can also be set to 0.03 wt % or more. Furthermore, from the viewpoint of easily and appropriately exerting the effect produced by the curing treatment of the photocurable adhesive layer (for example, the effect of reducing the peeling strength) or the softness of the photocurable adhesive layer, the amount of the multifunctional monomer used in all the monomer components constituting the acrylic polymer can be set to, for example, 10 wt % or less, more preferably 5 wt % or less, more preferably less than 5 wt %, can be 3 wt % or less, and can also be 1 wt % or less. In some aspects, the amount of the multifunctional monomer used in the total monomer components constituting the acrylic polymer (typically, the acrylic polymer as the primary polymer) is preferably less than 1% by weight (e.g., 0.9% by weight or less), more preferably less than 0.5% by weight, less than 0.3% by weight, less than 0.2% by weight, less than 0.1% by weight (e.g., less than 0.1% by weight), less than 0.09% by weight, less than 0.08% by weight, or less than 0.07% by weight. From the viewpoint of easily and appropriately exerting the effect (e.g., easy peeling effect) produced by the curing treatment (e.g., ultraviolet irradiation treatment) of the photocurable adhesive layer, it is advantageous to avoid using too much of the multifunctional monomer used as the copolymerization component of the primary polymer.
如上所述之由單體成分獲得丙烯酸系聚合物(一級聚合物)之方法可自作為丙烯酸系聚合物之合成方法而公知之各種聚合方法中進行選擇。就避免使用有機溶劑之觀點而言,較佳為採用除溶液聚合(例如使用偶氮系聚合起始劑或過氧化物系聚合起始劑進行之溶液聚合)以外之聚合方法。於一些態樣中,上述丙烯酸系聚合物(一級聚合物)可使將構成該聚合物之單體成分之一部分以聚合物之形態包含,並將剩餘部分以未聚合物(未反應之單體)之形態包含之活性能量線硬化型黏著劑組合物進行硬化而獲得。例如,藉由將上述活性能量線硬化型黏著劑組合物塗佈於適當之表面,照射活性能量線(例如紫外線)使其硬化,可獲得含有由上述單體成分形成之丙烯酸系聚合物之黏著劑層(初級黏著劑層)。上述丙烯酸系聚合物係上述單體成分之活性能量線聚合物。一般而言,活性能量線硬化型黏著劑組合物中所含有之碳-碳雙鍵(例如乙烯性不飽和鍵)會因使該黏著劑組合物硬化而形成黏著劑層時之活性能量線照射而發生反應,從而消失。因此,藉由上述方法,典型而言,形成不含有碳-碳雙鍵之黏著劑層(初級黏著劑層)。The method for obtaining an acrylic polymer (primary polymer) from the monomer components as described above can be selected from various polymerization methods known as methods for synthesizing acrylic polymers. From the viewpoint of avoiding the use of an organic solvent, it is preferred to adopt a polymerization method other than solution polymerization (e.g., solution polymerization using an azo-based polymerization initiator or a peroxide-based polymerization initiator). In some embodiments, the acrylic polymer (primary polymer) can be obtained by hardening an active energy ray-curable adhesive composition in which a portion of the monomer components constituting the polymer are included in the form of a polymer and the remaining portion is included in the form of an unpolymerized (unreacted monomer) component. For example, by applying the above-mentioned active energy ray-curing adhesive composition to an appropriate surface and irradiating it with active energy rays (such as ultraviolet rays) to cure it, an adhesive layer (primary adhesive layer) containing an acrylic polymer formed by the above-mentioned monomer components can be obtained. The above-mentioned acrylic polymer is an active energy ray polymer of the above-mentioned monomer components. Generally speaking, the carbon-carbon double bonds (such as ethylenic unsaturated bonds) contained in the active energy ray-curing adhesive composition will react due to the irradiation of active energy rays when the adhesive composition is cured to form an adhesive layer, thereby disappearing. Therefore, by the above-mentioned method, typically, an adhesive layer (primary adhesive layer) that does not contain carbon-carbon double bonds is formed.
於一些態樣中,對於該初級黏著劑層,向該黏著劑層中之丙烯酸系聚合物(不含有碳-碳雙鍵之丙烯酸系聚合物)中導入碳-碳雙鍵,並視需要添加適量之光起始劑。藉此,可向上述初級黏著劑層賦予光硬化性,而獲得含有具有碳-碳雙鍵之丙烯酸系聚合物及特定量以上之光起始劑之光硬化性黏著劑層(次級黏著劑層)。上述具有碳-碳雙鍵之丙烯酸系聚合物係藉由化學修飾向上述單體成分之活性能量線聚合物中導入碳-碳雙鍵而成之丙烯酸系聚合物,屬於上述活性能量線聚合物之改性物。關於由初級黏著劑層獲得次級黏著劑層之方法之一些適宜例,於後文進行敍述。In some embodiments, for the primary adhesive layer, carbon-carbon double bonds are introduced into the acrylic polymer (acrylic polymer without carbon-carbon double bonds) in the adhesive layer, and an appropriate amount of photoinitiator is added as needed. In this way, the primary adhesive layer can be given photocurability, and a photocurable adhesive layer (secondary adhesive layer) containing an acrylic polymer with carbon-carbon double bonds and a specific amount of photoinitiator or more is obtained. The acrylic polymer with carbon-carbon double bonds is an acrylic polymer obtained by chemically modifying the active energy ray polymer of the monomer component to introduce carbon-carbon double bonds, and is a modified product of the active energy ray polymer. Some suitable examples of methods for obtaining a secondary adhesive layer from a primary adhesive layer are described below.
於一些較佳之態樣中,用於形成初級黏著劑層之活性能量線硬化型黏著劑組合物含有單體混合物之部分聚合物,該單體混合物含有至少一部分構成丙烯酸系聚合物之單體成分(原料單體)。此種部分聚合物係來自上述單體混合物之聚合物與未反應之單體之混合物,典型而言,呈糖漿狀(有黏性之液態)。以下,有時將該性狀之部分聚合物稱為「單體糖漿」或簡稱為「糖漿」。In some preferred embodiments, the active energy ray-curable adhesive composition used to form the primary adhesive layer contains a partial polymer of a monomer mixture, and the monomer mixture contains at least a portion of monomer components (raw monomers) constituting an acrylic polymer. This partial polymer is a mixture of a polymer from the above-mentioned monomer mixture and unreacted monomers, and is typically in a syrupy state (viscous liquid state). Hereinafter, the partial polymer of this nature is sometimes referred to as "monomer syrup" or simply "syrup".
獲得上述聚合反應物時之聚合方法並無特別限制,可適當地選擇公知之各種聚合方法使用。就避免使用有機溶劑之觀點而言,較佳為採用除溶液聚合(例如使用偶氮系聚合起始劑或過氧化物系聚合起始劑進行之溶液聚合)以外之方法。其中,就效率及簡便性之觀點而言,可較佳地採用光聚合法。若採用光聚合,則可根據光之照射量(光量)等聚合條件,而容易地控制上述單體混合物之聚合轉化率。The polymerization method for obtaining the above-mentioned polymerized reactant is not particularly limited, and various known polymerization methods can be appropriately selected for use. From the perspective of avoiding the use of organic solvents, it is preferred to use a method other than solution polymerization (for example, solution polymerization using an azo-based polymerization initiator or a peroxide-based polymerization initiator). Among them, from the perspective of efficiency and simplicity, photopolymerization can be preferably used. If photopolymerization is used, the polymerization conversion rate of the above-mentioned monomer mixture can be easily controlled according to polymerization conditions such as the amount of light irradiation (light intensity).
上述部分聚合物中之單體混合物之聚合轉化率(單體轉化率)並無特別限定。上述聚合轉化率例如可設為大約70重量%以下,較佳為設為大約60重量%以下。就含有上述部分聚合物之黏著劑組合物之易製備性及塗佈性等觀點而言,通常,上述聚合轉化率較適當為大約50重量%以下,較佳為大約40重量%以下(例如大約35重量%以下)。聚合轉化率之下限並無特別限制,典型而言為大約1重量%以上,通常較適當為設為大約5重量%以上。The polymerization conversion rate (monomer conversion rate) of the monomer mixture in the above-mentioned partial polymer is not particularly limited. The above-mentioned polymerization conversion rate can be set to, for example, about 70 weight % or less, preferably about 60 weight % or less. From the viewpoint of the ease of preparation and coating of the adhesive composition containing the above-mentioned partial polymer, the above-mentioned polymerization conversion rate is usually more appropriately about 50 weight % or less, preferably about 40 weight % or less (for example, about 35 weight % or less). The lower limit of the polymerization conversion rate is not particularly limited, and is typically about 1 weight % or more, and is usually more appropriately about 5 weight % or more.
含有上述單體混合物之部分聚合物之黏著劑組合物例如可藉由如下方式獲得:利用適當之聚合方法(例如光聚合法)使含有原料單體中之單官能單體之一部分或全部之單體混合物進行部分聚合。可向含有上述部分聚合物之黏著劑組合物中調配視需要使用之其他成分(例如,光起始劑、作為共聚性交聯劑之多官能單體等)。調配此種其他成分之方法並無特別限定,例如可使上述單體混合物中預先含有,亦可向上述部分聚合物中進行添加。The adhesive composition containing the partial polymer of the above-mentioned monomer mixture can be obtained, for example, by the following method: using an appropriate polymerization method (e.g., photopolymerization) to partially polymerize a monomer mixture containing a part or all of the monofunctional monomers in the raw monomers. Other components (e.g., photoinitiators, multifunctional monomers as copolymerizable crosslinking agents, etc.) that are used as needed can be mixed into the adhesive composition containing the above-mentioned partial polymer. The method of mixing such other components is not particularly limited, for example, the above-mentioned monomer mixture can be pre-containing, or it can be added to the above-mentioned partial polymer.
本文中所揭示之黏著劑組合物可為如下形態:含有單體成分(原料單體)中之一部分種類之單體的單體混合物之部分聚合物或完全聚合物溶解於剩餘種類之單體或其部分聚合物中。此種形態之黏著劑組合物亦包含在含有單體成分之聚合物及未聚合物之黏著劑組合物之例中。再者,於本說明書中,「完全聚合物」係指聚合轉化率超過95重量%。The adhesive composition disclosed herein may be in the form of a partially polymerized or fully polymerized monomer mixture containing a portion of the monomers of the monomer components (raw monomers) dissolved in the remaining monomers or their partially polymerized monomers. Such adhesive compositions are also included in the examples of polymerized and unpolymerized adhesive compositions containing monomer components. Furthermore, in this specification, "fully polymerized" refers to a polymerization conversion rate exceeding 95% by weight.
(第1光起始劑) 出於促進硬化等目的,亦可使用於形成初級黏著劑層之活性能量線硬化型黏著劑組合物中含有光起始劑。於利用紫外線等光作為活性能量線之情形時,尤佳為向黏著劑組合物中調配光起始劑。作為使黏著劑組合物中含有之光起始劑,可使用選自可作為本文中所揭示之黏著片材之黏著劑層(光硬化性黏著劑層)中所含有之光起始劑使用之材料之例示中之1種或2種以上。再者,被調配於黏著劑組合物中之上述光起始劑係作為用於進行上述單體成分或交聯劑之聚合、交聯反應以形成丙烯酸系聚合物之觸媒而發揮功能者。因此,上述光起始劑會因由上述黏著劑組合物形成黏著劑層(初級黏著劑層)時之活性能量線照射(典型而言,紫外線照射)而失活、分解,從而不會殘留於本文中所揭示之黏著片材之黏著劑層中,或者即便殘留,亦認為係留有痕跡之量之程度。另一方面,本文中所揭示之黏著片材之黏著劑層(光硬化性黏著劑層)中所含有之光起始劑係與具有碳-碳雙鍵之聚合物一同包含於上述黏著劑中者,且係促進藉由上述碳-碳雙鍵之交聯反應者。以下,有時將於黏著劑組合物中含有且用以由該黏著劑組合物形成黏著劑層之光起始劑稱為「第1光起始劑」。又,有時將於本文中所揭示之黏著片材所具有之黏著劑層(光硬化性黏著劑層)中含有且可於該黏著劑層之光硬化中使用之光起始劑稱為「第2光起始劑」。第1光起始劑與第2光起始劑可為同類之材料,亦可為不同之材料。 (First photoinitiator) For the purpose of accelerating curing, the active energy ray-curing adhesive composition used to form the primary adhesive layer may contain a photoinitiator. When ultraviolet light or other light is used as the active energy ray, it is particularly preferred to mix the photoinitiator into the adhesive composition. As the photoinitiator to be included in the adhesive composition, one or more of the materials selected from the examples of the photoinitiator contained in the adhesive layer (photocurable adhesive layer) of the adhesive sheet disclosed in this article can be used. Furthermore, the above-mentioned photoinitiator mixed in the adhesive composition functions as a catalyst for the polymerization and crosslinking reaction of the above-mentioned monomer components or crosslinking agents to form an acrylic polymer. Therefore, the photoinitiator is inactivated and decomposed by irradiation with active energy rays (typically, ultraviolet irradiation) when the adhesive layer (primary adhesive layer) is formed from the adhesive composition, and thus does not remain in the adhesive layer of the adhesive sheet disclosed herein, or even if it remains, it is considered to be an amount that leaves traces. On the other hand, the photoinitiator contained in the adhesive layer (photocurable adhesive layer) of the adhesive sheet disclosed herein is contained in the adhesive together with the polymer having a carbon-carbon double bond, and promotes the crosslinking reaction through the carbon-carbon double bond. Hereinafter, the photoinitiator contained in the adhesive composition and used to form the adhesive layer from the adhesive composition is sometimes referred to as the "first photoinitiator". In addition, the photoinitiator contained in the adhesive layer (photocurable adhesive layer) of the adhesive sheet disclosed herein and used in the photocuring of the adhesive layer is sometimes referred to as the "second photoinitiator". The first photoinitiator and the second photoinitiator may be the same material or different materials.
(觸媒) 於一些態樣中,可使初級黏著劑層中含有促進官能基A與官能基B之反應之觸媒。例如,作為可用於促進異氰酸基與羥基之加成反應之觸媒,可例示鈦酸四正丁酯、鈦酸四異丙酯、三乙醯丙酮鐵、氧化丁基錫、二月桂酸二辛基錫等金屬系觸媒等。又,例如作為可用於促進羧基與環氧基之加成反應之觸媒,可例示:四丁基溴化銨(TBAB)、四苄基溴化銨等四級銨化合物及其衍生物;三苯基膦(TPP)等磷系化合物及其衍生物;二甲苄胺等胺系化合物及其衍生物;2-乙基-4-甲基-咪唑等咪唑系化合物及其衍生物;等。上述觸媒之使用量並無特別限制,可以能夠適當地促進官能基A與官能基B之反應之方式進行設定。於一些態樣中,於每100 g初級黏著劑層中,上述觸媒之使用量例如可設為0.05~15 g左右,亦可設為0.1~10 g左右,亦可設為0.5~5 g左右。 (Catalyst) In some embodiments, the primary adhesive layer may contain a catalyst that promotes the reaction between the functional group A and the functional group B. For example, as a catalyst that can be used to promote the addition reaction between an isocyanate group and a hydroxyl group, examples include metal catalysts such as tetra-n-butyl titanium, tetra-isopropyl titanium, triacetylacetonate iron, butyltin oxide, and dioctyltin dilaurate. In addition, as a catalyst that can be used to promote the addition reaction between a carboxyl group and an epoxy group, examples include: quaternary ammonium compounds such as tetrabutylammonium bromide (TBAB) and tetrabenzylammonium bromide and their derivatives; phosphorus compounds such as triphenylphosphine (TPP) and their derivatives; amine compounds such as dimethylbenzylamine and their derivatives; imidazole compounds such as 2-ethyl-4-methyl-imidazole and their derivatives; etc. The amount of the catalyst used is not particularly limited and can be set in a manner that can appropriately promote the reaction between functional group A and functional group B. In some embodiments, the amount of the catalyst used in every 100 g of the primary adhesive layer can be set to about 0.05 to 15 g, or about 0.1 to 10 g, or about 0.5 to 5 g.
藉由使用於形成初級黏著劑層之黏著劑組合物(例如,活性能量線硬化型黏著劑組合物)預先含有上述觸媒,能夠容易地獲得含有該觸媒之初級黏著劑層。例如,藉由使具有官能基B之乙烯性不飽和化合物滲透至含有具有官能基A之一級聚合物(較佳為丙烯酸系聚合物)及上述觸媒之初級黏著劑層中,繼而,於上述觸媒存在下使上述官能基A與上述官能基B發生反應,藉此,可高效率地獲得具有碳-碳雙鍵之聚合物(上述一級聚合物經化學修飾所成之改性物)。作為於上述觸媒存在下進行上述官能基A與上述官能基B之反應之其他方法,例如可例舉使後述之後續塗佈液含有上述觸媒之方法。就官能基A與官能基B之反應之控制性等觀點而言,較佳為使用於形成初級黏著劑層之黏著劑組合物預先含有上述觸媒之方法。By using an adhesive composition (e.g., an active energy ray-curable adhesive composition) for forming a primary adhesive layer that contains the above-mentioned catalyst in advance, a primary adhesive layer containing the catalyst can be easily obtained. For example, by allowing an ethylenically unsaturated compound having a functional group B to permeate into a primary polymer (preferably an acrylic polymer) having a functional group A and the above-mentioned catalyst, and then allowing the above-mentioned functional group A to react with the above-mentioned functional group B in the presence of the above-mentioned catalyst, a polymer having a carbon-carbon double bond (a modified product of the above-mentioned primary polymer after chemical modification) can be efficiently obtained. As another method for reacting the functional group A with the functional group B in the presence of the catalyst, for example, a method in which the subsequent coating liquid described below contains the catalyst can be cited. From the viewpoint of controllability of the reaction between the functional group A and the functional group B, a method in which the adhesive composition used to form the primary adhesive layer contains the catalyst in advance is preferred.
(第2光起始劑) 構成本文中所揭示之黏著片材之黏著劑層(光硬化性黏著劑層)除含有具有碳-碳雙鍵之聚合物以外,還含有光起始劑。藉由含有光起始劑,於硬化處理時由光起始劑產生自由基,其與存在於黏著劑層中之碳-碳雙鍵發生反應,使得黏著劑層之光硬化快速進行。作為光起始劑,例如可例舉:縮酮系光起始劑、苯乙酮系光起始劑、安息香醚系光起始劑、醯基氧化膦系光起始劑、α-酮醇系光起始劑、芳香族磺醯氯系光起始劑、光活性肟系光起始劑、安息香系光起始劑、苄基系光起始劑、二苯甲酮系光起始劑、9-氧硫𠮿系光起始劑等。光起始劑可單獨使用1種或將2種以上適當地組合使用。 (Second photoinitiator) The adhesive layer (photocurable adhesive layer) constituting the adhesive sheet disclosed in this article contains a photoinitiator in addition to a polymer having a carbon-carbon double bond. By containing the photoinitiator, free radicals are generated by the photoinitiator during the curing process, which react with the carbon-carbon double bonds in the adhesive layer, so that the photocuring of the adhesive layer proceeds rapidly. Examples of the photoinitiator include ketal photoinitiators, acetophenone photoinitiators, benzoin ether photoinitiators, acylphosphine oxide photoinitiators, α-keto alcohol photoinitiators, aromatic sulfonyl chloride photoinitiators, photoactive oxime photoinitiators, benzoin photoinitiators, benzyl photoinitiators, benzophenone photoinitiators, 9-oxosulfuron photoinitiators, The photoinitiator is a photoinitiator, etc. The photoinitiator can be used alone or in combination of two or more.
縮酮系光起始劑之具體例中包括2,2-二甲氧基-1,2-二苯乙烷-1-酮(例如,商品名「Omnirad 651」,IGM Resins B.V.公司製造)等。 苯乙酮系光起始劑之具體例中包括1-羥基環己基-苯基-酮(例如商品名「Omnirad 184」,IGM Resins B.V.公司製造)、4-苯氧基二氯苯乙酮、4-第三丁基-二氯苯乙酮、1-[4-(2-羥基乙氧基)-苯基]-2-羥基-2-甲基-1-丙烷-1-酮、2-羥基-2-甲基-1-苯基-丙烷-1-酮、甲氧基苯乙酮等。安息香醚系光起始劑之具體例中包括安息香甲醚、安息香乙醚、安息香丙醚、安息香異丙醚、安息香異丁醚等安息香醚及大茴香醚甲醚等經取代之安息香醚。醯基氧化膦系光起始劑之具體例中包括雙(2,4,6-三甲基苯甲醯基)苯基氧化膦、雙(2,4,6-三甲基苯甲醯基)-2,4-二-正丁氧基苯基氧化膦、2,4,6-三甲基苯甲醯基二苯基氧化膦、雙(2,6-二甲氧基苯甲醯基)-2,4,4-三甲基戊基氧化膦等。α-酮醇系光起始劑之具體例中包括2-甲基-2-羥基苯丙酮、1-[4-(2-羥乙基)苯基]-2-甲基丙烷-1-酮等。芳香族磺醯氯系光起始劑之具體例中包括2-萘磺醯氯等。光活性肟系光起始劑之具體例中包括1-苯基-1,1-丙二酮-2-(鄰乙氧羰基)-肟等。安息香系光起始劑之具體例中包括安息香等。苄基系光起始劑之具體例中包括苄基等。二苯甲酮系光起始劑之具體例中包括二苯甲酮、苯甲醯苯甲酸、3,3'-二甲基-4-甲氧基二苯甲酮、聚乙烯基二苯甲酮、α-羥基環己基苯基酮等。9-氧硫𠮿系光起始劑之具體例中包括9-氧硫𠮿、2-氯9-氧硫𠮿、2-甲基9-氧硫𠮿、2,4-二甲基9-氧硫𠮿、異丙基9-氧硫𠮿、2,4-二氯9-氧硫𠮿、2,4-二乙基9-氧硫𠮿、異丙基9-氧硫𠮿、2,4-二異丙基9-氧硫𠮿、十二烷基9-氧硫𠮿等。 Specific examples of ketal photoinitiators include 2,2-dimethoxy-1,2-diphenylethane-1-one (e.g., trade name "Omnirad 651", manufactured by IGM Resins BV), etc. Specific examples of acetophenone photoinitiators include 1-hydroxycyclohexyl-phenyl-ketone (e.g., trade name "Omnirad 184", manufactured by IGM Resins BV), 4-phenoxydichloroacetophenone, 4-tert-butyl-dichloroacetophenone, 1-[4-(2-hydroxyethoxy)-phenyl]-2-hydroxy-2-methyl-1-propane-1-one, 2-hydroxy-2-methyl-1-phenyl-propane-1-one, methoxyacetophenone, etc. Specific examples of benzoin ether-based photoinitiators include benzoin methyl ether, benzoin ethyl ether, benzoin propyl ether, benzoin isopropyl ether, benzoin isobutyl ether and other benzoin ethers, and substituted benzoin ethers such as anisole methyl ether. Specific examples of acylphosphine oxide-based photoinitiators include bis(2,4,6-trimethylbenzyl)phenylphosphine oxide, bis(2,4,6-trimethylbenzyl)-2,4-di-n-butoxyphenylphosphine oxide, 2,4,6-trimethylbenzyldiphenylphosphine oxide, bis(2,6-dimethoxybenzyl)-2,4,4-trimethylpentylphosphine oxide, and the like. Specific examples of α-ketoalcohol photoinitiators include 2-methyl-2-hydroxypropiophenone, 1-[4-(2-hydroxyethyl)phenyl]-2-methylpropane-1-one, and the like. Specific examples of aromatic sulfonyl chloride photoinitiators include 2-naphthalenesulfonyl chloride, and the like. Specific examples of photoactive oxime photoinitiators include 1-phenyl-1,1-propanedione-2-(o-ethoxycarbonyl)-oxime, and the like. Specific examples of benzoin photoinitiators include benzoin, and the like. Specific examples of benzyl photoinitiators include benzyl, and the like. Specific examples of benzophenone photoinitiators include benzophenone, benzoylbenzoic acid, 3,3'-dimethyl-4-methoxybenzophenone, polyvinylbenzophenone, α-hydroxycyclohexylphenylketone, and the like. 9-Oxysulfuron Specific examples of the photoinitiator include 9-oxosulfuron , 2-chloro-9-oxysulfuron , 2-methyl 9-oxosulfuron , 2,4-dimethyl 9-oxosulfuron 、Isopropyl 9-oxysulfide , 2,4-dichloro-9-oxysulfuron , 2,4-diethyl 9-oxysulfide 、Isopropyl 9-oxysulfide 、2,4-Diisopropyl 9-oxysulfide , dodecyl 9-oxysulfide wait.
關於本文中所揭示之光硬化性黏著劑層中之光起始劑之含量,較適當為1.0×10 -4莫耳/100 g以上(即,每100 g黏著劑層中為1.0×10 -4莫耳以上),就高精度地進行硬化反應之觀點而言,較有利為3.0×10 -4莫耳/100 g以上,較佳為5.0×10 -4莫耳/100 g以上,可為7.0×10 -4莫耳/100 g以上,亦可為1.0×10 -3莫耳/100 g以上,亦可為2.0×10 -3莫耳/100 g以上或3.0×10 -3莫耳/100 g以上。光起始劑之含量之上限並無特別限制。於一些態樣中,就黏著片材之保存穩定性之觀點而言,例如可為1.0×10 -1莫耳/100 g以下,亦可為5.0×10 -2莫耳/100 g以下,亦可為1.0×10 -2莫耳/100 g以下,亦可為5.0×10 -3莫耳/100 g以下。 The content of the photoinitiator in the photocurable adhesive layer disclosed herein is preferably 1.0×10 -4 mol/100 g or more (i.e., 1.0×10 -4 mol or more per 100 g of the adhesive layer). From the perspective of performing the curing reaction with high precision, it is preferably 3.0×10 -4 mol /100 g or more, preferably 5.0×10 -4 mol/100 g or more, and may be 7.0×10 -4 mol/100 g or more, 1.0×10 -3 mol/100 g or more, 2.0×10 -3 mol/100 g or more, or 3.0×10 -3 mol/100 g or more. The upper limit of the content of the photoinitiator is not particularly limited. In some aspects, from the perspective of storage stability of the adhesive sheet, for example, it may be 1.0×10 -1 mol/100 g or less, 5.0×10 -2 mol/100 g or less, 1.0×10 -2 mol/100 g or less, or 5.0×10 -3 mol/100 g or less.
光硬化性黏著劑層中之光起始劑之含量可基於用作該黏著劑層之製造原料之材料之合計重量份數、或以殘留於所獲得之黏著劑層中之方式使用之光起始劑之重量份數及該光起始劑之分子量,藉由計算而求出。例如,於在使用含有光起始劑之黏著劑組合物而形成之初級黏著劑層上後塗佈追加之光起始劑並使其滲透而獲得之光硬化性黏著劑層中,於其後不進行使上述光起始劑之分解積極地進行之處理(紫外線照射處理等)之情形時,可以說至少藉由後塗佈所供給之光起始劑係以殘留於所獲得之光硬化性黏著劑層中之方式使用之光起始劑。因此,上述光硬化性黏著劑層中之光起始劑之含量可視為與基於藉由後塗佈所供給之光起始劑而算出之含量為同等以上。若為在藉由對含有光起始劑之黏著劑組合物進行光照射使其硬化(一次硬化)而獲得之初級黏著劑層上後塗佈光起始劑並使其滲透而獲得之光硬化性黏著劑層,則該光硬化性黏著劑層中之光起始劑之含量可視為與基於藉由後塗佈所供給之光起始劑而算出之含量大致相同之程度。The content of the photoinitiator in the photocurable adhesive layer can be calculated based on the total weight fraction of the materials used as raw materials for manufacturing the adhesive layer, or the weight fraction of the photoinitiator used in a manner remaining in the obtained adhesive layer and the molecular weight of the photoinitiator. For example, in the case where an additional photoinitiator is post-coated on a primary adhesive layer formed using an adhesive composition containing a photoinitiator and allowed to penetrate to obtain a photocurable adhesive layer, if no treatment (ultraviolet irradiation treatment, etc.) is subsequently performed to actively decompose the photoinitiator, it can be said that at least the photoinitiator supplied by post-coating is a photoinitiator used in a manner that remains in the obtained photocurable adhesive layer. Therefore, the content of the photoinitiator in the photocurable adhesive layer can be regarded as being equal to or greater than the content calculated based on the photoinitiator supplied by post-coating. If a photocurable adhesive layer is obtained by post-coating a photoinitiator on a primary adhesive layer obtained by curing an adhesive composition containing a photoinitiator by light irradiation (primary curing) and allowing the photoinitiator to penetrate, the content of the photoinitiator in the photocurable adhesive layer can be considered to be approximately the same as the content calculated based on the photoinitiator supplied by post-coating.
於該等資訊不明之情形時,作為光硬化性黏著劑層中之光起始劑之含量,可使用藉由基於HPLC(high performance liquid chromatography,高效液相層析法)之分析而獲得之值。藉由與層析圖中所出現之峰中之光起始劑之峰對應的溶出物之成分分析來鑑定上述光起始劑,並將該鑑定物或具有與鑑定物類似之分子結構之化合物用作標準品來製作校準曲線,藉此可求出測定試樣中之上述光起始劑之含量。基於其含量及上述光起始劑之分子量,能夠算出黏著劑層中之上述光起始劑之含量[莫耳/100 g]。When such information is unclear, the value obtained by analysis based on HPLC (high performance liquid chromatography) can be used as the content of the photoinitiator in the photocurable adhesive layer. The photoinitiator is identified by analyzing the components of the eluted product corresponding to the peak of the photoinitiator among the peaks appearing in the chromatogram, and the identification substance or a compound having a molecular structure similar to the identification substance is used as a standard to prepare a calibration curve, thereby determining the content of the photoinitiator in the measurement sample. Based on the content and the molecular weight of the photoinitiator, the content of the photoinitiator in the adhesive layer [mole/100 g] can be calculated.
HPLC用之測定試樣可以如下方式進行製備。即,自黏著劑層中採取適當量(例如,約0.1 g)之黏著劑,放入螺旋管中進行稱量。向上述螺旋管中加入氯仿3 mL,於陰冷處振盪一晩(約16小時),藉此使上述試樣中之光起始劑溶出至氯仿中。繼而,加入乙腈10 mL使黏著成分再沉澱,將溶解有光起始劑之上清液用膜濾器(孔徑0.20 μm)進行過濾。將其作為HPLC用之測定試樣。作為分析裝置,可使用Thermo Fisher Scientific公司之「UltiMate 3000」或其同等品。作為測定條件,可使用下述條件。 [測定條件] 柱:ZORBAX Eclipse Plus C18(3.0 mm ×100 mm,載體之平均粒徑1.8 μm) 柱溫度:40℃ 柱流量:0.5 mL/min 溶離液組成:純水/乙腈之梯度條件 注入量:10 μL 檢測器:DAD(Diode Array Detector,二極體陣列檢測器)(190 nm~800 nm、210 nm及245 nm提取) The test sample for HPLC can be prepared as follows. That is, take an appropriate amount (for example, about 0.1 g) of adhesive from the adhesive layer, put it in a spiral tube and weigh it. Add 3 mL of chloroform to the above spiral tube, shake it in a cool place overnight (about 16 hours), so that the photoinitiator in the above sample is dissolved into the chloroform. Then, add 10 mL of acetonitrile to reprecipitate the adhesive component, and filter the supernatant containing the photoinitiator with a membrane filter (pore size 0.20 μm). Use it as a test sample for HPLC. As an analytical device, "UltiMate 3000" or its equivalent from Thermo Fisher Scientific can be used. As measurement conditions, the following conditions can be used. [Measurement conditions] Column: ZORBAX Eclipse Plus C18 (3.0 mm ×100 mm, average particle size of the carrier 1.8 μm) Column temperature: 40℃ Column flow rate: 0.5 mL/min Solvent composition: pure water/acetonitrile gradient conditions Injection volume: 10 μL Detector: DAD (Diode Array Detector) (190 nm~800 nm, 210 nm and 245 nm extraction)
(其他聚合物) 於本文中所揭示之光硬化性黏著劑層含有具有碳-碳雙鍵之丙烯酸系聚合物之情形時,除含有上述具有碳-碳雙鍵之丙烯酸系聚合物以外,該光硬化性黏著劑層中亦可含有其他聚合物。上述其他聚合物可為不具有碳-碳雙鍵之丙烯酸系聚合物,亦可為除丙烯酸系聚合物以外之聚合物。作為上述除丙烯酸系聚合物以外之聚合物,可例舉作為可於黏著劑層中含有之聚合物而例示之各種聚合物中之除丙烯酸系聚合物以外者作為適宜例。此種聚合物可為具有碳-碳雙鍵之聚合物。作為上述不具有碳-碳雙鍵之丙烯酸系聚合物,可例舉上述作為一級聚合物之丙烯酸系聚合物(即,未進行導入碳-碳雙鍵之化學修飾之丙烯酸系聚合物)作為適宜例。於本文中所揭示之黏著劑層中除含有具有碳-碳雙鍵之丙烯酸系聚合物以外,還含有上述其他聚合物之情形時,該其他聚合物之含量相對於具有碳-碳雙鍵之丙烯酸系聚合物100重量份,較適當為設為100重量份以下,較佳為50重量份以下,更佳為30重量份以下,進而較佳為10重量份以下。上述其他聚合物之含量相對於具有碳-碳雙鍵之丙烯酸系聚合物100重量份,可為5重量份以下,亦可為1重量份以下。本文中所揭示之技術例如可以黏著劑層中所含有之聚合物之99.5~100重量%為具有碳-碳雙鍵之丙烯酸系聚合物之態樣較佳地實施。 (Other polymers) In the case where the photocurable adhesive layer disclosed in this article contains an acrylic polymer having a carbon-carbon double bond, the photocurable adhesive layer may contain other polymers in addition to the above-mentioned acrylic polymer having a carbon-carbon double bond. The above-mentioned other polymers may be acrylic polymers without carbon-carbon double bonds, or polymers other than acrylic polymers. As the above-mentioned polymers other than acrylic polymers, various polymers exemplified as polymers that can be contained in the adhesive layer, other than acrylic polymers, can be cited as appropriate examples. Such a polymer may be a polymer having a carbon-carbon double bond. As the acrylic polymer without carbon-carbon double bonds, the acrylic polymer as the primary polymer (i.e., the acrylic polymer without chemical modification for introducing carbon-carbon double bonds) can be cited as a suitable example. When the adhesive layer disclosed herein contains other polymers in addition to the acrylic polymer with carbon-carbon double bonds, the content of the other polymer is preferably set to 100 parts by weight or less, preferably 50 parts by weight or less, more preferably 30 parts by weight or less, and further preferably 10 parts by weight or less relative to 100 parts by weight of the acrylic polymer with carbon-carbon double bonds. The content of the other polymer can be 5 parts by weight or less, or 1 part by weight or less relative to 100 parts by weight of the acrylic polymer with carbon-carbon double bonds. The technology disclosed herein can be preferably implemented, for example, in a state where 99.5 to 100 weight % of the polymer contained in the adhesive layer is an acrylic polymer having a carbon-carbon double bond.
(除聚合物以外之含碳-碳雙鍵之化合物) 本文中所揭示之光硬化性黏著劑層亦可含有除含碳-碳雙鍵之聚合物以外之含碳-碳雙鍵之化合物。作為此種含碳-碳雙鍵之化合物之例,可例舉:多官能單體、單官能單體、具有碳-碳雙鍵之多官能或多官能低聚物等。光硬化性黏著劑層含有上述含碳-碳雙鍵之化合物係指該含碳-碳雙鍵之化合物所具有之碳-碳雙鍵以未反應之形態含有。 (Compounds containing carbon-carbon double bonds other than polymers) The photocurable adhesive layer disclosed herein may also contain compounds containing carbon-carbon double bonds other than polymers containing carbon-carbon double bonds. Examples of such compounds containing carbon-carbon double bonds include: multifunctional monomers, monofunctional monomers, multifunctional or multifunctional oligomers having carbon-carbon double bonds, etc. The photocurable adhesive layer contains the above-mentioned compounds containing carbon-carbon double bonds, which means that the carbon-carbon double bonds of the compounds containing carbon-carbon double bonds are contained in an unreacted form.
於一些態樣中,光硬化性黏著劑層亦可含有多官能單體作為上述含碳-碳雙鍵之化合物。作為使光硬化性黏著劑層中含有之多官能單體,可自與可作為一級聚合物之共聚成分使用之多官能單體(共聚性交聯劑)相同者中選擇1種或2種以上。於光硬化性黏著劑層含有多官能單體之情形時,該光硬化性黏著劑層較佳為組合含有具有碳-碳鍵之聚合物(較佳為具有碳-碳鍵之丙烯酸系聚合物)及上述多官能單體。光硬化性黏著劑層中所含有之多官能單體可有助於提昇光硬化性黏著劑層之柔軟性或提高硬化處理後之彈性模數。例如,作為使光硬化性黏著劑層中含有多官能單體之方法,例如可採用於初級黏著劑層(可為對活性能量線硬化型黏著劑組合物照射活性能量線而形成之初級黏著劑層)上塗佈多官能單體並使其滲透之方法。In some embodiments, the photocurable adhesive layer may also contain a multifunctional monomer as the above-mentioned compound containing a carbon-carbon double bond. As the multifunctional monomer contained in the photocurable adhesive layer, one or more types can be selected from the same multifunctional monomers (copolymerizable crosslinking agents) that can be used as copolymer components of the primary polymer. In the case where the photocurable adhesive layer contains a multifunctional monomer, the photocurable adhesive layer is preferably a combination of a polymer having a carbon-carbon bond (preferably an acrylic polymer having a carbon-carbon bond) and the above-mentioned multifunctional monomer. The multifunctional monomer contained in the photocurable adhesive layer can help improve the flexibility of the photocurable adhesive layer or increase the elastic modulus after curing. For example, as a method for making the photocurable adhesive layer contain a multifunctional monomer, a method can be adopted in which the multifunctional monomer is applied to a primary adhesive layer (which may be a primary adhesive layer formed by irradiating an active energy ray-curable adhesive composition with active energy rays) and allowed to permeate.
於本文中所揭示之光硬化性黏著劑層中,除含碳-碳雙鍵之聚合物以外之含碳-碳雙鍵之化合物(例如,多官能單體)之含量可以能夠適當地發揮所需之使用效果之方式進行設定,例如,相對於上述光硬化性黏著劑層之基礎聚合物(例如,具有碳-碳鍵之丙烯酸系聚合物)100重量份,可設為0.01重量份以上,亦可設為0.1重量份以上,亦可設為0.5重量份以上。又,就光硬化性黏著劑層之凝聚性或自剝離襯墊之剝離性等觀點而言,於一些態樣中,含碳-碳雙鍵之化合物之含量相對於光硬化性黏著劑層之基礎聚合物100重量份,較適當為設為10重量份以下,較佳為設為5重量份以下,可設為1重量份以下,亦可設為未達1重量份。本文中所揭示之技術可以光硬化性黏著劑層不含有除含碳-碳雙鍵之聚合物以外之含碳-碳雙鍵之化合物之態樣較佳地實施。In the photocurable adhesive layer disclosed herein, the content of the compound containing a carbon-carbon double bond (e.g., a multifunctional monomer) other than the polymer containing a carbon-carbon double bond can be set in a manner that can appropriately exert the desired effect of use. For example, it can be set to 0.01 parts by weight or more, or 0.1 parts by weight or more, or 0.5 parts by weight or more, relative to 100 parts by weight of the base polymer (e.g., an acrylic polymer having a carbon-carbon bond) of the above-mentioned photocurable adhesive layer. Furthermore, from the viewpoint of the cohesiveness of the photocurable adhesive layer or the releasability of the self-peeling pad, in some aspects, the content of the compound containing a carbon-carbon double bond is preferably set to 10 parts by weight or less, preferably 5 parts by weight or less, and can be set to 1 part by weight or less, or can be set to less than 1 part by weight, relative to 100 parts by weight of the base polymer of the photocurable adhesive layer. The technology disclosed herein can be preferably implemented in an aspect in which the photocurable adhesive layer does not contain a compound containing a carbon-carbon double bond other than the polymer containing a carbon-carbon double bond.
(其他任意成分) 可使本文中所揭示之黏著劑層視需要含有整平劑、交聯助劑、塑化劑、軟化劑、填充劑、著色劑(顏料、染料等)、抗靜電劑、紫外線吸收劑、光穩定劑等在黏著劑之領域中常見之各種添加劑作為其他任意成分。關於該等各種添加劑,由於可藉由常規方法使用先前公知者,並且非特別用於表徵本發明者,故而省略詳細之說明。 (Other optional components) The adhesive layer disclosed in this article may contain various additives commonly used in the field of adhesives, such as leveling agents, crosslinking aids, plasticizers, softeners, fillers, colorants (pigments, dyes, etc.), antistatic agents, ultraviolet absorbers, and light stabilizers, as other optional components as needed. Regarding these various additives, since previously known ones can be used by conventional methods and are not specifically used to characterize the present invention, detailed descriptions are omitted.
於一些較佳之態樣中,本文中所揭示之黏著劑層可為聚合物(典型而言,基礎聚合物)之含量占該黏著劑(黏著劑組合物之固形物成分)之總重量(即,含有該黏著劑之黏著劑層之重量)之大約90重量%以上之組成。藉此,可較佳地實現由硬化處理所產生之效果(黏著劑層之易剝離化、提高彈性模數等)。就此種觀點而言,上述聚合物之含量較佳為黏著劑層之總重量之大約95重量%以上,更佳為大約97重量%以上,進而較佳為大約98重量%以上,可為大約99重量%以上(例如99~100重量%)。換言之,聚合物以外之成分(添加劑等)於上述黏著劑組合物之固形物成分(黏著劑層)中所占之含量較適當為大約10重量%以下,較佳為大約5重量%以下,更佳為大約3重量%以下,進而較佳為大約2重量%以下,可為大約1重量%以下。In some preferred aspects, the adhesive layer disclosed herein may be composed of a polymer (typically, a base polymer) that accounts for about 90% by weight or more of the total weight of the adhesive (solid component of the adhesive composition) (i.e., the weight of the adhesive layer containing the adhesive). In this way, the effects produced by the hardening treatment (easy peeling of the adhesive layer, increased elastic modulus, etc.) can be better achieved. From this point of view, the content of the above-mentioned polymer is preferably about 95% by weight or more of the total weight of the adhesive layer, more preferably about 97% by weight or more, and further preferably about 98% by weight or more, and can be about 99% by weight or more (e.g., 99-100% by weight). In other words, the content of components other than polymers (additives, etc.) in the solid components (adhesive layer) of the above-mentioned adhesive composition is preferably less than about 10 weight %, preferably less than about 5 weight %, more preferably less than about 3 weight %, further preferably less than about 2 weight %, and can be less than about 1 weight %.
本文中所揭示之黏著劑層中所含有之碳-碳雙鍵之量例如可為1.0×10 -6莫耳/100 g以上,亦可為1.0×10 -5莫耳/100 g以上。於一些態樣中,就容易獲得藉由光照射所致之特性或物性變化之觀點而言,上述碳-碳雙鍵之量較適當為5.0×10 -5莫耳/100 g以上,較有利為1.0×10 -4莫耳/100 g以上,較佳為5.0×10 -4莫耳/100 g以上或1.0×10 -3莫耳/100 g以上,可為5.0×10 -3莫耳/100 g以上,亦可為1.0×10 -2莫耳/100 g以上,亦可為3.0×10 -2莫耳/100 g以上,亦可為4.0×10 -2莫耳/100 g以上,亦可為5.0×10 -2莫耳/100 g以上。又,黏著劑層中所含有之碳-碳雙鍵之量例如可為1.0莫耳/100 g以下,亦可為5.0×10 -1莫耳/100 g以下,亦可為1.0×10 -1莫耳/100 g以下,亦可為8.0×10 -2莫耳/100 g以下,亦可為7.0×10 -2莫耳/100 g以下。就黏著劑層或具有該黏著劑層之黏著片材之保存穩定性之觀點、或容易取得與其他特性之平衡之觀點而言,避免碳-碳雙鍵之含量過多可較有利。再者,於本說明書中,黏著劑層中所含有之碳-碳雙鍵之量之單位「莫耳/100 g」意指每100 g該黏著劑層中之碳-碳雙鍵之莫耳量。 The amount of carbon-carbon double bonds contained in the adhesive layer disclosed herein may be, for example, 1.0×10 -6 mol/100 g or more, or 1.0×10 -5 mol/100 g or more. In some aspects, from the viewpoint of easily obtaining changes in characteristics or physical properties caused by light irradiation, the amount of the above-mentioned carbon-carbon double bonds is preferably 5.0× 10-5 mol/100 g or more, more preferably 1.0× 10-4 mol/100 g or more, more preferably 5.0× 10-4 mol/100 g or more or 1.0× 10-3 mol/100 g or more, and can be 5.0× 10-3 mol/100 g or more, or 1.0× 10-2 mol/100 g or more, or 3.0× 10-2 mol/100 g or more, or 4.0× 10-2 mol/100 g or more, or 5.0× 10-2 mol/100 g or more. Furthermore, the amount of carbon-carbon double bonds contained in the adhesive layer may be, for example, 1.0 mol/100 g or less, 5.0×10 -1 mol/100 g or less, 1.0×10 -1 mol/100 g or less, 8.0×10 -2 mol/100 g or less, or 7.0×10 -2 mol/100 g or less. From the perspective of storage stability of the adhesive layer or an adhesive sheet having the adhesive layer, or from the perspective of easily achieving a balance with other properties, it is advantageous to avoid excessive carbon-carbon double bond content. Furthermore, in this specification, the unit "mole/100 g" of the amount of carbon-carbon double bonds contained in the adhesive layer means the molar amount of carbon-carbon double bonds per 100 g of the adhesive layer.
本文中所揭示之黏著劑層中所含有之碳-碳雙鍵可以具有碳-碳雙鍵之聚合物之形態含有,亦可以具有碳-碳雙鍵之除聚合物以外之形態(例如,具有碳-碳雙鍵之多官能單體、單官能單體、低聚物等形態)含有。黏著劑層中所含有之碳-碳雙鍵中之至少一部分較佳為以具有碳-碳雙鍵之聚合物之形態含有。於一些態樣中,以具有碳-碳雙鍵之聚合物之形態包含於黏著劑層中之碳-碳雙鍵之量例如可為1.0×10 -6莫耳/100 g或1.0×10 -5莫耳/100 g以上,就容易獲得藉由光照射所致之特性或物性變化之觀點而言,較適當為5.0×10 -5莫耳/100 g以上,較有利為1.0×10 -4莫耳/100 g以上,較佳為5.0×10 -4莫耳/100 g以上或1.0×10 -3莫耳/100 g以上,可為5.0×10 -3莫耳/100 g以上,亦可為1.0×10 -2莫耳/100 g以上,亦可為3.0×10 -2莫耳/100 g以上,亦可為4.0×10 -2莫耳/100 g以上,亦可為5.0×10 -2莫耳/100 g以上,又,例如可為1.0莫耳/100 g以下,亦可為5.0×10 -1莫耳/100 g以下,亦可為1.0×10 -1莫耳/100 g以下,亦可為8.0×10 -2莫耳/100 g以下,亦可為7.0×10 -2莫耳/100 g以下。 The carbon-carbon double bonds contained in the adhesive layer disclosed herein may be contained in the form of a polymer having carbon-carbon double bonds, or in a form other than a polymer having carbon-carbon double bonds (e.g., a multifunctional monomer, a monofunctional monomer, an oligomer, etc. having carbon-carbon double bonds). At least a portion of the carbon-carbon double bonds contained in the adhesive layer is preferably contained in the form of a polymer having carbon-carbon double bonds. In some embodiments, the amount of carbon-carbon double bonds contained in the adhesive layer in the form of a polymer having carbon-carbon double bonds may be, for example, 1.0×10 -6 mol/100 g or 1.0×10 -5 mol/100 g or more. From the viewpoint of easily obtaining the characteristics or physical property changes caused by light irradiation, it is preferably 5.0×10 -5 mol/100 g or more, more preferably 1.0×10 -4 mol/100 g or more, more preferably 5.0×10 -4 mol/100 g or more or 1.0×10 -3 mol/100 g or more, and may be 5.0×10 -3 mol/100 g or more, may be 1.0×10 -2 mol/100 g or more, and may be 3.0×10 -2 mol/100 g or more. The molecular weight may be greater than or equal to 1.0 mol/100 g, may be greater than or equal to 5.0× 10-2 mol/100 g, and may be, for example, less than or equal to 1.0 mol/100 g, may be less than or equal to 5.0× 10-1 mol/100 g, may be less than or equal to 1.0× 10-1 mol/100 g, may be less than or equal to 8.0× 10-2 mol/100 g, or may be less than or equal to 7.0× 10-2 mol/100 g.
黏著劑層中所含有之碳-碳雙鍵(典型而言,乙烯性不飽和基)之量可基於用作該黏著劑層之製造原料之材料之合計重量份數、或其中之以碳-碳雙鍵殘留於黏著劑層中之方式使用之材料之重量份數及分子量,藉由計算而求出。 於該等資訊不明之情形時,作為黏著劑層中之碳-碳雙鍵之含量,可使用基於NMR(nuclear magnetic resonance,核磁共振)法所得之測定值。具體而言,自黏著劑層中採取適當量之試樣,對於添加有特定量之內部標準物質之測定溶劑中溶解有上述試樣者進行測定,藉此求出碳-碳雙鍵之存在量。作為分析裝置,可使用傅立葉變換NMR裝置(BrukerBiospin公司製造,「AVANCE III-600」)或其同等品。作為測定條件,可使用下述條件。 [測定條件] 觀測頻率: 1H 600 MHz 測定溶劑:CDCl 3測定溫度:300 K 化學位移基準:測定溶劑 1H;7.25 ppm The amount of carbon-carbon double bonds (typically, ethylenically unsaturated groups) contained in the adhesive layer can be calculated based on the total weight fraction of the materials used as raw materials for manufacturing the adhesive layer, or the weight fraction and molecular weight of the materials used in such a way that carbon-carbon double bonds remain in the adhesive layer. When such information is unclear, the content of carbon-carbon double bonds in the adhesive layer can be determined by using a value determined based on the NMR (nuclear magnetic resonance) method. Specifically, an appropriate amount of sample is taken from the adhesive layer, and the sample is dissolved in a measuring solvent to which a specific amount of an internal standard substance is added, and the amount of carbon-carbon double bonds present is determined. As an analytical device, a Fourier transform NMR device (manufactured by Bruker Biospin, "AVANCE III-600") or its equivalent can be used. As measurement conditions, the following conditions can be used. [Measurement conditions] Observation frequency: 1 H 600 MHz Measurement solvent: CDCl 3 Measurement temperature: 300 K Chemical shift standard: Measurement solvent 1 H; 7.25 ppm
於本文中所揭示之黏著劑層之一些態樣中,該黏著劑層之有機溶劑之含量較佳為1.0 μg/g以下(即,每1 g該黏著劑層中之有機溶劑含量為1.0 μg以下),例如較佳為未達1.0 μg/g,更佳為未達0.5 μg/g,可為未達0.2 μg/g,亦可為0 μg/g。作為上述有機溶劑之具體例,可例舉乙酸乙酯及甲苯。有機溶劑之含量較少之黏著劑層低異味,就環境衛生之觀點而言較理想。黏著劑層之有機溶劑含量可藉由後述之實施例中記載之方法進行測定。In some aspects of the adhesive layer disclosed herein, the content of the organic solvent in the adhesive layer is preferably less than 1.0 μg/g (i.e., the content of the organic solvent in every 1 g of the adhesive layer is less than 1.0 μg), for example, preferably less than 1.0 μg/g, more preferably less than 0.5 μg/g, less than 0.2 μg/g, and 0 μg/g. Specific examples of the above-mentioned organic solvents include ethyl acetate and toluene. An adhesive layer with a lower content of organic solvent has a lower odor, which is more ideal from the perspective of environmental hygiene. The organic solvent content of the adhesive layer can be measured by the method described in the embodiments described below.
本文中所揭示之黏著劑層較適宜的是偶氮系聚合起始劑及過氧化物系聚合起始劑(可為以分解物或殘存物之形態含有之聚合起始劑)之合計含量被限制為1.0 μg/g以下。即,每1 g上述黏著劑層中之偶氮系聚合起始劑及過氧化物系聚合起始劑之合計含量為1.0 μg以下。藉此,能夠防止或抑制由上述聚合起始劑所致之弊病。作為上述弊病之例,可例舉:由於作為熱聚合起始劑之偶氮系聚合起始劑或過氧化物系聚合起始劑因熱或經時而裂解並產生自由基,導致黏著劑之物性發生非刻意之變化(例如硬化);或使貼附有黏著片材之被接著體表面發生變質(例如,伴隨過氧化物系聚合起始劑之裂解之氧化)或污染(例如,由低分子量之分解產物或反應物所致之污染);或產生釋氣(例如,因偶氮系聚合起始劑之分解所產生之N 2氣體)等。就更好地抑制該弊病之觀點而言,於一些態樣中,該黏著劑層之偶氮系聚合起始劑及過氧化物系聚合起始劑之合計含量較佳為未達1.0 μg/g,更佳為未達0.5 μg/g,可為未達0.2 μg/g,亦可為0 μg/g(即,不含)。黏著劑層之偶氮系及過氧化物系聚合起始劑之合計含量可藉由後述之實施例之方法進行測定。 The adhesive layer disclosed herein preferably has a total content of azo polymerization initiators and peroxide polymerization initiators (which may be polymerization initiators contained in the form of decomposition products or residues) limited to 1.0 μg/g or less. That is, the total content of azo polymerization initiators and peroxide polymerization initiators in each 1 g of the above-mentioned adhesive layer is 1.0 μg or less. In this way, the disadvantages caused by the above-mentioned polymerization initiators can be prevented or suppressed. As examples of the above-mentioned disadvantages, there can be cited: due to the decomposition of azo-based polymerization initiators or peroxide-based polymerization initiators as thermal polymerization initiators due to heat or time and the generation of free radicals, the physical properties of the adhesive may undergo unintentional changes (such as hardening); or the surface of the adherend to which the adhesive sheet is attached may be deteriorated (for example, oxidation accompanied by the decomposition of peroxide-based polymerization initiators) or contaminated (for example, contamination caused by low molecular weight decomposition products or reactants); or outgassing may be generated (for example, N2 gas generated by the decomposition of azo-based polymerization initiators), etc. From the perspective of better suppressing the drawback, in some aspects, the total content of the azo-based polymerization initiator and the peroxide-based polymerization initiator in the adhesive layer is preferably less than 1.0 μg/g, more preferably less than 0.5 μg/g, less than 0.2 μg/g, or 0 μg/g (i.e., no azo-based polymerization initiator). The total content of the azo-based and peroxide-based polymerization initiators in the adhesive layer can be measured by the method of the embodiment described below.
(黏著劑層之厚度) 本文中所揭示之黏著片材所具有之黏著劑層(光硬化性黏著劑層)之厚度並無特別限定,可視目的適當地進行選擇。上述黏著劑層之厚度例如可自2 μm以上2000 μm左右之範圍中選擇。於一些態樣中,就黏著片材之薄型化等觀點而言,上述黏著劑層之厚度例如可為1000 μm以下,亦可為500 μm以下,亦可為200 μm以下,亦可為150 μm以下,亦可為100 μm以下。就降低光照射後之剝離強度之觀點而言,於一些態樣中,黏著劑層之厚度例如可為未達100 μm,亦可為80 μm以下,亦可為60 μm以下,亦可為40 μm以下,亦可為30 μm以下。藉由避免光硬化性黏著劑層之厚度過大,存在容易獲得藉由對該黏著劑層之光照射所致之易剝離化效果之傾向。例如,於藉由包括形成具有官能基A之初級黏著劑層,將含有具有官能基B之乙烯性不飽和化合物之後續塗佈液塗佈於上述初級黏著劑層上並使其滲透後,使上述初級黏著劑層中之官能基A與上述具有官能基B之乙烯性不飽和化合物發生反應之方法形成光硬化性黏著劑層之情形時,就使官能基A與官能基B之反應在黏著劑層之整個厚度上均質地進行之觀點而言,避免光硬化性黏著劑層之厚度過大亦較有利。又,就對硬化處理前之被接著體之密接性等觀點而言,黏著劑層之厚度較佳為10 μm以上,更佳為15 μm以上,可為20 μm以上。於本文中所揭示之黏著片材為於基材之雙面具備黏著劑層之雙面黏著片材之情形時,各黏著劑層之厚度可相同,亦可不同。 (Thickness of adhesive layer) The thickness of the adhesive layer (photocurable adhesive layer) of the adhesive sheet disclosed herein is not particularly limited and can be appropriately selected according to the purpose. The thickness of the adhesive layer can be selected, for example, from a range of 2 μm to about 2000 μm. In some embodiments, from the perspective of thinning the adhesive sheet, the thickness of the adhesive layer can be, for example, less than 1000 μm, less than 500 μm, less than 200 μm, less than 150 μm, or less than 100 μm. From the perspective of reducing the peeling strength after light irradiation, in some embodiments, the thickness of the adhesive layer may be, for example, less than 100 μm, less than 80 μm, less than 60 μm, less than 40 μm, or less than 30 μm. By preventing the thickness of the photocurable adhesive layer from being too large, there is a tendency to easily obtain the easy peeling effect caused by light irradiation of the adhesive layer. For example, in the case of forming a photocurable adhesive layer by a method including forming a primary adhesive layer having a functional group A, applying a subsequent coating liquid containing an ethylenically unsaturated compound having a functional group B on the primary adhesive layer and allowing it to penetrate, and then reacting the functional group A in the primary adhesive layer with the ethylenically unsaturated compound having a functional group B, it is also advantageous to avoid making the photocurable adhesive layer too thick from the viewpoint of allowing the reaction between the functional group A and the functional group B to proceed uniformly over the entire thickness of the adhesive layer. In addition, from the perspective of adhesion to the adherend before curing treatment, the thickness of the adhesive layer is preferably 10 μm or more, more preferably 15 μm or more, and can be 20 μm or more. When the adhesive sheet disclosed in this article is a double-sided adhesive sheet with adhesive layers on both sides of the substrate, the thickness of each adhesive layer can be the same or different.
<黏著劑層之製作> 本文中所揭示之黏著劑層例如可藉由包括如下之方法適當地進行製作。 (a)形成含有具有官能基A之一級聚合物之初級黏著劑層(初級黏著劑層形成步驟); (b)準備含有具有碳-碳雙鍵之含官能基B之化合物(例如,具有官能基B之乙烯性不飽和化合物)及光起始劑之後續塗佈液,將該後續塗佈液塗佈於上述初級黏著劑層之至少一表面(後續塗佈液塗佈步驟); (c)使上述後續塗佈液中所含有之具有碳-碳雙鍵之含官能基B之化合物及光起始劑滲透至上述初級黏著劑層中(後續塗佈液滲透步驟); (d)對滲透有上述後續塗佈液之初級黏著劑層進行加熱以使上述官能基A與上述官能基B之反應進行(反應步驟)。 <Preparation of Adhesive Layer> The adhesive layer disclosed herein can be suitably prepared, for example, by a method including the following. (a) forming a primary adhesive layer containing a primary polymer having a functional group A (primary adhesive layer forming step); (b) preparing a subsequent coating liquid containing a compound containing a functional group B having a carbon-carbon double bond (for example, an ethylenically unsaturated compound having a functional group B) and a photoinitiator, and applying the subsequent coating liquid to at least one surface of the primary adhesive layer (subsequent coating liquid applying step); (c) allowing the compound containing the functional group B having a carbon-carbon double bond and the photoinitiator contained in the above-mentioned subsequent coating liquid to penetrate into the above-mentioned primary adhesive layer (subsequent coating liquid penetration step); (d) heating the primary adhesive layer permeated with the above-mentioned subsequent coating liquid to allow the above-mentioned functional group A to react with the above-mentioned functional group B (reaction step).
上述初級黏著劑層形成步驟可包括:將初級黏著劑層形成用之黏著劑組合物塗佈於支持體上;使該經塗佈之黏著劑組合物進行硬化以形成含有具有官能基A之一級聚合物之初級黏著劑層。作為支持體,可使用可作為後述之基材層使用之塑膠膜、或後述之剝離襯墊。上述黏著劑組合物之塗佈(塗敷)可利用公知之塗佈法,例如可使用凹版輥式塗佈機、逆輥塗佈機、接觸輥塗佈機、浸漬輥塗佈機、棒式塗佈機、刮刀塗佈機、噴霧塗佈機、缺角輪塗佈機、直接塗佈機等塗佈機。The primary adhesive layer forming step may include: applying an adhesive composition for forming the primary adhesive layer on a support; and curing the applied adhesive composition to form a primary adhesive layer containing a primary polymer having a functional group A. As the support, a plastic film that can be used as a base layer described later, or a peeling pad described later can be used. The adhesive composition can be applied by a known coating method, for example, a gravure roll coater, reverse roll coater, contact roll coater, dip roll coater, rod coater, scraper coater, spray coater, notch wheel coater, direct coater, or the like.
於上述初級黏著劑層形成步驟中,作為使所塗佈之黏著劑組合物硬化之方法,並無特別限定,例如可例舉對所塗佈之黏著劑組合物進行加熱、或對該黏著劑組合物照射活性能量線以使其硬化。視需要,亦可進一步進行加熱乾燥。於一些態樣中,可較佳地採用如下方法:使用活性能量線硬化型黏著劑組合物(較佳為無有機溶劑之活性能量線硬化型黏著劑組合物)作為上述黏著劑組合物,對該組合物照射活性能量線以使其硬化。作為活性能量線,例如可例舉α射線、β射線、γ射線、中子射線、電子束等游離輻射或紫外線等,尤佳為紫外線。In the above-mentioned primary adhesive layer forming step, the method for hardening the applied adhesive composition is not particularly limited, and for example, the applied adhesive composition can be heated or the adhesive composition can be irradiated with active energy rays to harden it. If necessary, heating and drying can be further performed. In some embodiments, the following method can be preferably adopted: using an active energy ray-hardening adhesive composition (preferably an active energy ray-hardening adhesive composition without organic solvent) as the above-mentioned adhesive composition, and irradiating the composition with active energy rays to harden it. As active energy rays, for example, ionizing radiation such as α rays, β rays, γ rays, neutron rays, electron beams, or ultraviolet rays can be cited, and ultraviolet rays are particularly preferred.
紫外線雖可直接照射於所塗佈之黏著劑組合物上,但為了阻隔會阻礙基於紫外線照射之硬化之氧氣,較佳為介隔支持體(可為剝離膜)進行照射。例如,將塗佈於支持體上之黏著劑組合物之表面用另一支持體覆蓋,介隔該另一支持體照射紫外線。紫外線照射之照度、時間可根據初級黏著劑層之組成或黏著劑層之厚度等來適當地設定。紫外線照射可使用高壓水銀燈、低壓水銀燈、金屬鹵化物燈等。Although ultraviolet rays can be directly irradiated onto the applied adhesive composition, in order to block oxygen that would hinder the curing based on ultraviolet irradiation, it is better to irradiate through a support (which may be a peeling film). For example, the surface of the adhesive composition applied on the support is covered with another support, and ultraviolet rays are irradiated through the other support. The illumination and time of ultraviolet irradiation can be appropriately set according to the composition of the primary adhesive layer or the thickness of the adhesive layer. Ultraviolet irradiation can be performed using a high-pressure mercury lamp, a low-pressure mercury lamp, a metal halide lamp, etc.
接著,自初級黏著劑層之一表面將支持體剝離去除,準備含有具有碳-碳雙鍵之含官能基B之化合物及光起始劑(第2光聚合起始劑)之後續塗佈液,將該後續塗佈液塗佈於上述初級黏著劑層之一表面(後續塗佈液塗佈步驟)。後續塗佈液並無特別限定,只要為液態且可塗佈並滲透至黏著劑層中者即可。例如,於具有碳-碳雙鍵之含官能基B之化合物及/或光起始劑為液態之情形時,可分別單獨地以任意之順序進行塗佈,亦可為具有碳-碳雙鍵之含官能基B之化合物與光起始劑之混合液。又,亦可為於具有碳-碳雙鍵之含官能基B之化合物中溶解有光起始劑之後續塗佈液,反之亦可。Next, the support is peeled off from one surface of the primary adhesive layer, and a subsequent coating liquid containing a compound having a carbon-carbon double bond and a photoinitiator (second photopolymerization initiator) is prepared, and the subsequent coating liquid is applied to one surface of the primary adhesive layer (subsequent coating liquid application step). The subsequent coating liquid is not particularly limited as long as it is liquid and can be applied and permeated into the adhesive layer. For example, when the compound containing a functional group B having a carbon-carbon double bond and/or the photoinitiator are in liquid form, they can be applied separately in any order, or a mixed liquid of the compound containing a functional group B having a carbon-carbon double bond and the photoinitiator can be applied. In addition, a subsequent coating liquid in which the photoinitiator is dissolved in the compound containing a functional group B having a carbon-carbon double bond can be applied, or vice versa.
若將後續塗佈液塗佈於初級黏著劑層之表面,則該後續塗佈液中所含有之成分將滲透至上述黏著劑層中。將後續塗佈液塗佈於初級黏著劑層後,於進入下一反應步驟之前,視需要,亦可設置進行靜置之時間以使上述滲透充分進行。作為靜置時間,並無特別限定,例如,可自15分鐘以內適當地進行選擇,於一些態樣中,可自1秒~10分鐘(例如10秒~10分鐘)、較佳為5秒~5分鐘(例如10秒~5分鐘)之範圍內選擇。靜置溫度可設為大概室溫左右(例如,10~30℃左右)。藉由於上述條件下進行靜置,可使後續塗佈液充分滲透至初級黏著劑層中。If the subsequent coating liquid is applied to the surface of the primary adhesive layer, the components contained in the subsequent coating liquid will penetrate into the above-mentioned adhesive layer. After the subsequent coating liquid is applied to the primary adhesive layer, before entering the next reaction step, a static time can be set as needed to allow the above-mentioned penetration to proceed fully. The static time is not particularly limited, for example, it can be appropriately selected from within 15 minutes. In some embodiments, it can be selected from the range of 1 second to 10 minutes (for example, 10 seconds to 10 minutes), preferably 5 seconds to 5 minutes (for example, 10 seconds to 5 minutes). The static temperature can be set to about room temperature (for example, about 10 to 30°C). By statically standing under the above conditions, the subsequent coating liquid can fully penetrate into the primary adhesive layer.
其後,對滲透有上述後續塗佈液之初級黏著劑層進行加熱,而使上述官能基A與上述官能基B進行反應(反應步驟)。反應步驟中之加熱溫度較佳為40~200℃,更佳為50~180℃,進而較佳為60~170℃(例如100~150℃)。加熱時間可採用適當、合適之時間,例如5秒~20分鐘,較佳為5秒~10分鐘,更佳為10秒~5分鐘。Thereafter, the primary adhesive layer infiltrated with the subsequent coating liquid is heated to react the functional group A with the functional group B (reaction step). The heating temperature in the reaction step is preferably 40 to 200°C, more preferably 50 to 180°C, and further preferably 60 to 170°C (e.g. 100 to 150°C). The heating time can be an appropriate and suitable time, for example, 5 seconds to 20 minutes, preferably 5 seconds to 10 minutes, and more preferably 10 seconds to 5 minutes.
<基材層> 於單面黏著型或雙面黏著型之附基材之黏著片材中,作為支持(襯底)黏著劑層之基材(層),可使用各種片狀基材。作為上述基材,可使用樹脂膜、紙、布、橡膠片材、發泡體片材、金屬箔、其等之複合體等。作為樹脂膜之例,可例舉:聚乙烯(PE)、聚丙烯(PP)、乙烯-丙烯共聚物等聚烯烴製膜;聚對苯二甲酸乙二酯(PET)、聚萘二甲酸乙二酯(PEN)等聚酯膜;氯乙烯樹脂膜;乙酸乙烯酯樹脂膜;聚醯胺樹脂膜;氟樹脂膜;塞璐芬等。作為樹脂膜之其他例,可例舉由聚苯硫醚系樹脂、聚碸系樹脂、聚醚碸系樹脂、聚醚醚酮系樹脂、聚芳酯系樹脂、聚醯胺醯亞胺系樹脂、聚醯亞胺系樹脂等中之1種或2種以上之工程塑膠(可為超級工程塑膠)形成之樹脂膜。就耐熱性之觀點而言,較佳為使用工程塑膠。作為紙之例,可例舉:日本紙、牛皮紙、玻璃紙、高級紙、合成紙、面漆紙等。作為布之例,可例舉由各種纖維狀物質之單獨使用或混紡等製成之織布或不織布等。作為上述纖維狀物質,可例示:棉、人造短纖維、馬尼拉麻、紙漿、嫘縈、乙酸纖維、聚酯纖維、聚乙烯醇纖維、聚醯胺纖維、聚烯烴纖維等。作為橡膠片材之例,可例舉天然橡膠片材、丁基橡膠片材等。作為發泡體片材之例,可例舉發泡聚胺基甲酸酯片材、發泡聚氯丁二烯橡膠片材等。作為金屬箔之例,可例舉鋁箔、銅箔等。 <Base layer> In single-sided adhesive or double-sided adhesive sheets with base materials, various sheet-like base materials can be used as the base material (layer) supporting the adhesive layer. As the above-mentioned base material, resin film, paper, cloth, rubber sheet, foam sheet, metal foil, and composites thereof can be used. Examples of resin films include: polyolefin films such as polyethylene (PE), polypropylene (PP), and ethylene-propylene copolymer; polyester films such as polyethylene terephthalate (PET) and polyethylene naphthalate (PEN); vinyl chloride resin films; vinyl acetate resin films; polyamide resin films; fluororesin films; and celuphine. As other examples of resin films, there can be cited resin films formed from one or more engineering plastics (which may be super engineering plastics) selected from polyphenylene sulfide resins, polysulfide resins, polyethersulfide resins, polyetheretherketone resins, polyarylate resins, polyamide imide resins, and polyimide resins. From the viewpoint of heat resistance, it is preferred to use engineering plastics. As examples of paper, there can be cited Japanese paper, kraft paper, glassine paper, high-grade paper, synthetic paper, and coated paper. As examples of cloth, there can be cited woven or non-woven fabrics made from various fiber-like materials used alone or in a blend. Examples of the above-mentioned fibrous material include cotton, staple fiber, Manila hemp, pulp, rayon, acetate fiber, polyester fiber, polyvinyl alcohol fiber, polyamide fiber, polyolefin fiber, etc. Examples of rubber sheets include natural rubber sheets, butyl rubber sheets, etc. Examples of foam sheets include foamed polyurethane sheets, foamed polychloroprene rubber sheets, etc. Examples of metal foils include aluminum foil, copper foil, etc.
於較佳之一態樣中,使用具有特定之剛性(強度),且加工性、操作性優異之樹脂膜作為基材(層)。藉由使用剛性較高之樹脂膜基材,於被接著體為薄壁之情形時,能夠適當地防止搬送時等之被接著體之撓曲或損傷。就相同之觀點而言,較佳為使用聚酯膜作為樹脂膜基材。再者,於該說明書中,「樹脂膜」典型而言係非多孔質之膜,係區別於所謂之不織布或織布之概念。可用作基材之樹脂膜之密度可為大約0.85~1.50 g/cm 3(例如0.90 g/cm 3~1.20 g/cm 3,典型而言為0.92 g/cm 3~1.05 g/cm 3)。 In a preferred embodiment, a resin film having a specific rigidity (strength) and excellent processability and operability is used as a substrate (layer). By using a resin film substrate with high rigidity, when the adherend is thin-walled, it is possible to properly prevent the adherend from being bent or damaged during transportation. From the same point of view, it is preferred to use a polyester film as the resin film substrate. Furthermore, in this specification, "resin film" is typically a non-porous film, which is different from the concept of so-called non-woven fabric or woven fabric. The density of the resin film that can be used as the substrate can be about 0.85 to 1.50 g/cm 3 (eg, 0.90 to 1.20 g/cm 3 , typically 0.92 to 1.05 g/cm 3 ).
再者,亦可向上述基材(例如樹脂膜基材)中視需要調配填充劑(無機填充劑、有機填充劑等)、抗老化劑、抗氧化劑、紫外線吸收劑、抗靜電劑、潤滑劑、塑化劑、著色劑(顏料、染料等)等各種添加劑。Furthermore, various additives such as fillers (inorganic fillers, organic fillers, etc.), anti-aging agents, antioxidants, ultraviolet absorbers, antistatic agents, lubricants, plasticizers, colorants (pigments, dyes, etc.) can also be added to the above-mentioned substrate (such as a resin film substrate) as needed.
亦可對上述基材層(例如樹脂膜基材或橡膠片材基材、發泡體片材基材等)之配置有黏著劑層之表面(黏著劑層側表面)實施電暈放電處理、電漿處理、紫外線照射處理、酸處理、鹼處理、塗佈底塗劑等公知或慣用之表面處理。此種表面處理可為用於提昇基材與黏著劑層之密接性,換言之黏著劑層對基材之抓固力之處理。The surface of the substrate layer (such as a resin film substrate, a rubber sheet substrate, a foam sheet substrate, etc.) on which the adhesive layer is disposed (the adhesive layer side surface) may be subjected to a known or commonly used surface treatment such as a corona discharge treatment, a plasma treatment, an ultraviolet irradiation treatment, an acid treatment, an alkali treatment, or application of a primer. Such a surface treatment may be used to improve the adhesion between the substrate and the adhesive layer, in other words, to improve the grip of the adhesive layer on the substrate.
於一些較佳之態樣中,於基材層之黏著劑層側表面設置有底塗層。換言之,可於基材層與黏著劑層之間配置底塗層。作為底塗層形成材料,並無特別限定,可使用聚胺酯(多異氰酸酯)系樹脂、聚酯系樹脂、丙烯酸系樹脂、聚醯胺系樹脂、三聚氰胺系樹脂、烯烴系樹脂、聚苯乙烯系樹脂、環氧系樹脂、酚系樹脂、異氰尿酸酯系樹脂、聚乙酸乙烯酯系樹脂等中之1種或2種以上。於在樹脂膜基材上設置丙烯酸系等黏著劑層之情形時,較佳為聚酯系或胺基甲酸酯系、丙烯酸系之底塗層,於在PET膜等聚酯系基材層上設置丙烯酸系黏著劑層之情形時,尤佳為聚酯系底塗層。底塗層之厚度並無特別限定,通常,可在大約0.1 μm~10 μm(例如0.1 μm~3 μm,典型而言為0.1 μm~1 μm)之範圍內。底塗層可使用凹版輥式塗佈機、逆輥塗佈機等公知或慣用之塗佈機來形成。In some preferred embodiments, a primer layer is provided on the adhesive layer side surface of the substrate layer. In other words, the primer layer can be arranged between the substrate layer and the adhesive layer. The primer layer forming material is not particularly limited, and one or more of polyurethane (polyisocyanate) resins, polyester resins, acrylic resins, polyamide resins, melamine resins, olefin resins, polystyrene resins, epoxy resins, phenolic resins, isocyanurate resins, polyvinyl acetate resins, etc. can be used. When an acrylic adhesive layer is provided on a resin film substrate, a polyester, urethane or acrylic primer layer is preferred. When an acrylic adhesive layer is provided on a polyester substrate layer such as a PET film, a polyester primer layer is particularly preferred. The thickness of the primer layer is not particularly limited, and generally, it can be in the range of about 0.1 μm to 10 μm (e.g., 0.1 μm to 3 μm, typically 0.1 μm to 1 μm). The primer layer can be formed using a known or commonly used coating machine such as a gravure roll coater or a reverse roll coater.
又,於本文中所揭示之黏著片材為於基材層之單面設置有黏著劑層之單面接著性之黏著片材之情形時,可利用剝離處理劑(背面處理劑)對基材層之黏著劑層非形成面(背面)實施剝離處理。作為可於背面處理層之形成中使用之背面處理劑,並無特別限定,可視目的或用途使用矽酮系背面處理劑、氟系背面處理劑、長鏈烷基系背面處理劑及其他公知或慣用之處理劑。In addition, when the adhesive sheet disclosed in this article is a single-sided adhesive sheet having an adhesive layer disposed on one side of a substrate layer, a stripping treatment agent (back surface treatment agent) can be used to perform a stripping treatment on the non-adhesive layer-forming side (back surface) of the substrate layer. The back surface treatment agent that can be used in forming the back surface treatment layer is not particularly limited, and silicone-based back surface treatment agents, fluorine-based back surface treatment agents, long-chain alkyl-based back surface treatment agents, and other known or commonly used treatment agents can be used depending on the purpose or use.
基材層之厚度並無特別限定,可視目的適當地進行選擇,一般而言可為1~800 μm。就加工性、操作性、作業性等觀點而言,基材層之厚度較適當為2 μm以上(例如3 μm以上,典型而言5 μm以上),較佳為大約10 μm以上,更佳為大約25 μm以上(例如30 μm以上),又,較適當為大約700 μm以下(例如500 μm以下,典型而言200 μm以下),較佳為大約100 μm以下,更佳為大約80 μm以下(例如大約70 μm以下)。The thickness of the substrate layer is not particularly limited and can be appropriately selected according to the purpose. Generally, it can be 1 to 800 μm. From the perspective of processability, operability, and workability, the thickness of the substrate layer is preferably 2 μm or more (e.g., 3 μm or more, typically, 5 μm or more), preferably about 10 μm or more, more preferably about 25 μm or more (e.g., 30 μm or more), and more preferably about 700 μm or less (e.g., 500 μm or less, typically, 200 μm or less), preferably about 100 μm or less, and more preferably about 80 μm or less (e.g., about 70 μm or less).
<剝離襯墊> 作為剝離襯墊,並無特別限定,可使用慣用之剝離紙等。例如,可使用於樹脂膜或紙等襯墊基材之表面具有剝離處理層之剝離襯墊、或包含氟系聚合物(聚四氟乙烯等)或聚烯烴系樹脂(聚乙烯、聚丙烯等)之低接著性材料之剝離襯墊等。上述剝離處理層例如可為利用矽酮系、長鏈烷基系、氟系、硫化鉬等剝離處理劑對上述襯墊基材進行表面處理而形成者。 <Peel-off pad> There is no particular limitation on the peel-off pad, and conventional peel-off paper etc. can be used. For example, a peel-off pad having a peel-off treatment layer on the surface of a pad substrate such as a resin film or paper, or a peel-off pad made of a low-adhesion material including a fluorine-based polymer (polytetrafluoroethylene, etc.) or a polyolefin-based resin (polyethylene, polypropylene, etc.) can be used. The peel-off treatment layer can be formed by surface treating the pad substrate using a peel-off treatment agent such as a silicone-based, long-chain alkyl-based, fluorine-based, or molybdenum sulfide-based.
本文中所揭示之黏著片材(可含有黏著劑層及基材層,但不含有剝離襯墊)之總厚度並無特別限定,較適當為設為大約5~1000 μm之範圍。考慮到黏著特性等,黏著片材之總厚度較佳為設為10~500 μm(例如15~300 μm,典型而言20~200 μm)左右。又,就操作性等觀點而言,黏著片材之總厚度更佳為30 μm以上(例如50 μm以上,典型而言70 μm以上)。The total thickness of the adhesive sheet disclosed herein (which may contain an adhesive layer and a substrate layer but does not contain a release pad) is not particularly limited, and is preferably set to a range of about 5 to 1000 μm. Considering the adhesive properties, etc., the total thickness of the adhesive sheet is preferably set to about 10 to 500 μm (e.g., 15 to 300 μm, typically 20 to 200 μm). In addition, from the perspective of operability, the total thickness of the adhesive sheet is more preferably 30 μm or more (e.g., 50 μm or more, typically 70 μm or more).
<黏著片材之特性> 關於本文中所揭示之黏著片材之黏著劑層(即,藉由光照射進行硬化處理前之黏著劑層),利用後述之實施例中記載之方法測得之於25℃下之儲存彈性模數G'(以下亦稱為「初始彈性模數G'」)並無特別限定,例如可為未達5.0×10 6Pa,較適當為未達3.0×10 6Pa,較有利為未達1.0×10 6Pa,可為未達5.0×10 5Pa,亦可為未達1.0×10 5Pa,亦可為未達8.0×10 4Pa,亦可為未達6.0×10 4Pa,亦可為未達5.0×10 4Pa。關於黏著劑層之初始彈性模數G'較低這一點,就容易藉由光照射獲得較大之彈性模數變化之觀點而言較有利,就提高對被接著體之表面形狀之追隨性之觀點而言亦較佳。初始彈性模數G'之下限並無特別限定,例如可為1.0×10 3Pa以上。於一些態樣中,就於硬化處理前之黏著劑層中之適度之凝聚性、或具有該黏著劑層之黏著片材之加工性及操作性等觀點而言,黏著劑層之初始彈性模數G'較適當為5.0×10 3Pa以上,較有利為8.0×10 3Pa以上,較佳為1.0×10 4Pa以上,可為3.0×10 4Pa以上,亦可為5.0×10 4Pa以上。 <Characteristics of Adhesive Sheet> Regarding the adhesive layer of the adhesive sheet disclosed in this article (i.e., the adhesive layer before curing treatment by light irradiation), the storage elastic modulus G' (hereinafter also referred to as "initial elastic modulus G'") at 25°C measured by the method described in the embodiments described later is not particularly limited, and may be, for example, less than 5.0×10 6 Pa, more preferably less than 3.0×10 6 Pa, more advantageously less than 1.0×10 6 Pa, less than 5.0×10 5 Pa, less than 1.0×10 5 Pa, less than 8.0×10 4 Pa, less than 6.0×10 4 Pa, or less than 5.0×10 4 Pa. The lower initial elastic modulus G' of the adhesive layer is advantageous in that a larger elastic modulus change can be easily obtained by light irradiation and is also preferred in terms of improving the ability to follow the surface shape of the adherend. The lower limit of the initial elastic modulus G' is not particularly limited and may be, for example, 1.0×10 3 Pa or more. In some embodiments, from the viewpoint of the appropriate cohesion in the adhesive layer before the curing treatment, or the processability and operability of the adhesive sheet having the adhesive layer, the initial elastic modulus G' of the adhesive layer is preferably 5.0×10 3 Pa or more, more advantageously 8.0×10 3 Pa or more, more preferably 1.0×10 4 Pa or more, and can be 3.0×10 4 Pa or more, and can also be 5.0×10 4 Pa or more.
關於本文中所揭示之黏著片材之黏著劑層,於利用後述之實施例中記載之方法進行硬化處理後所測得之於25℃下之儲存彈性模數G'(以下亦稱為「硬化處理後彈性模數G'」)並無特別限定,較佳為高於該黏著劑層之初始彈性模數G'。上述硬化處理後彈性模數G'係高於初始彈性模數G'之值,並且例如可為1.0×10 4Pa以上或超過1.0×10 4Pa,亦可為3.0×10 4Pa以上或超過3.0×10 4Pa,亦可為5.0×10 4Pa以上或超過5.0×10 4Pa,亦可為1.0×10 5Pa以上或超過1.0×10 5Pa。於一些態樣中,硬化處理後彈性模數G'係高於初始彈性模數G'之值,並且較適當為2.0×10 5Pa以上,較佳為4.0×10 5Pa以上,更佳為6.0×10 5Pa以上(例如8.0×10 5Pa以上、1.0×10 6Pa以上、1.3×10 6Pa以上或1.5×10 6Pa以上)。就藉由光照射而變得易剝離之觀點而言,較有利的是硬化處理後彈性模數G'較高。硬化處理後彈性模數G'之上限並無特別限制,例如可為1.0×10 8Pa以下,亦可為1.0×10 7Pa以下,亦可為5.0×10 6Pa以下或3.0×10 6Pa以下。 Regarding the adhesive layer of the adhesive sheet disclosed in this article, the storage elastic modulus G' at 25°C (hereinafter also referred to as "elastic modulus G' after curing treatment") measured after curing treatment using the method described in the embodiment described later is not particularly limited, and is preferably higher than the initial elastic modulus G' of the adhesive layer. The elastic modulus G' after hardening treatment is higher than the initial elastic modulus G' and may be, for example, 1.0×10 4 Pa or more, 3.0× 10 4 Pa or more, 5.0× 10 4 Pa or more, or 1.0×10 5 Pa or more. In some embodiments, the elastic modulus G' after the hardening treatment is higher than the initial elastic modulus G', and is preferably 2.0×10 5 Pa or more, preferably 4.0×10 5 Pa or more, and more preferably 6.0×10 5 Pa or more (e.g., 8.0×10 5 Pa or more, 1.0×10 6 Pa or more, 1.3×10 6 Pa or more, or 1.5×10 6 Pa or more). From the perspective of being easy to peel off by light irradiation, it is more advantageous that the elastic modulus G' after the hardening treatment is higher. The upper limit of the elastic modulus G' after the hardening treatment is not particularly limited, and may be, for example, 1.0×10 8 Pa or less, 1.0×10 7 Pa or less, 5.0×10 6 Pa or less, or 3.0×10 6 Pa or less.
根據上述初始彈性模數G'及上述硬化處理後彈性模數G',藉由下述式算出黏著劑層之儲存彈性模數增加率。 儲存彈性模數增加率[%]=(R/Q-1)×100 其中,上述式中之Q為初始彈性模數G'[Pa],上述式中之R為硬化處理後彈性模數G'[Pa]。儲存彈性模數增加率典型而言為超過0%(例如超過2.5×10 2%),較佳為3.0×10 2%以上,更佳為5.0×10 2%以上(例如7.0×10 2%以上),可為1.0×10 3%以上,亦可為1.5×10 3%以上,亦可為2.0×10 3%以上,亦可為2.5×10 3%以上,亦可為3.0×10 3%以上。儲存彈性模數增加率之上限並無特別限制。就容易於硬化處理前發揮適度之凝聚性之觀點而言,於一些態樣中,上述儲存彈性模數增加率例如可為1.0×10 5%以下,亦可為1.0×10 4%以下,亦可為5.0×10 3%以下。 Based on the initial elastic modulus G' and the elastic modulus G' after the curing treatment, the storage elastic modulus increase rate of the adhesive layer is calculated by the following formula. Storage elastic modulus increase rate [%] = (R/Q-1) × 100 Wherein, Q in the above formula is the initial elastic modulus G' [Pa], and R in the above formula is the elastic modulus G' [Pa] after the curing treatment. The storage elastic modulus increase rate is typically more than 0% (e.g., more than 2.5×10 2 %), preferably more than 3.0×10 2 %, more preferably more than 5.0×10 2 % (e.g., more than 7.0×10 2 %), and may be more than 1.0×10 3 %, more than 1.5×10 3 %, more than 2.0×10 3 %, more than 2.5×10 3 %, or more than 3.0×10 3 %. There is no particular upper limit to the storage elastic modulus increase rate. From the viewpoint of being able to easily exert appropriate cohesion before hardening treatment, in some aspects, the storage elastic modulus increase rate may be, for example, 1.0×10 5 % or less, 1.0×10 4 % or less, or 5.0×10 3 % or less.
關於本文中所揭示之黏著片材之黏著劑層,利用後述之實施例中記載之方法測得之於25℃下之損失彈性模數G''並無特別限定。於一些態樣中,例如就容易於硬化處理前之黏著劑層中發揮適度之黏著性之觀點而言,上述損失彈性模數G''較適當為大約1.0×10 6Pa以下,較有利為未達5.0×10 5Pa(例如未達3.0×10 5Pa),較佳為未達1.5×10 5Pa(例如未達1.0×10 5Pa),可為未達5.0×10 4Pa,亦可為未達1.0×10 4Pa,亦可為未達7.0×10 3Pa。又,黏著劑層之損失彈性模數G''例如可為1.0×10 2Pa以上,就容易更好地使可施加於黏著劑層上之外力耗散以維持對被接著體之密接之觀點而言,較有利為5.0×10 2Pa以上,較佳為1.0×10 3Pa以上。具有該損失彈性模數G''之黏著劑層存在即便受到外力(例如,朝向剪切方向之外力)亦不易自被接著體剝離之傾向。於一些態樣中,上述損失彈性模數G''可為3.0×10 3Pa以上,亦可為5.0×10 3Pa以上,亦可為7.0×10 3Pa以上,亦可為1.0×10 4Pa以上。 Regarding the adhesive layer of the adhesive sheet disclosed herein, the loss elastic modulus G'' measured at 25°C by the method described in the embodiments described later is not particularly limited. In some aspects, for example, from the perspective of easily exerting appropriate adhesiveness in the adhesive layer before curing treatment, the loss elastic modulus G'' is preferably about 1.0×10 6 Pa or less, more preferably less than 5.0×10 5 Pa (for example, less than 3.0×10 5 Pa), more preferably less than 1.5×10 5 Pa (for example, less than 1.0×10 5 Pa), less than 5.0×10 4 Pa, less than 1.0×10 4 Pa, or less than 7.0×10 3 Pa. Furthermore, the loss modulus G'' of the adhesive layer may be, for example, 1.0×10 2 Pa or more. From the viewpoint of being able to dissipate external forces that may be applied to the adhesive layer to maintain close contact with the adherend, it is preferably 5.0×10 2 Pa or more, and preferably 1.0×10 3 Pa or more. The adhesive layer having the loss modulus G'' tends not to be easily peeled off from the adherend even when subjected to external forces (for example, external forces in the shear direction). In some embodiments, the above-mentioned loss modulus G'' may be 3.0×10 3 Pa or more, 5.0×10 3 Pa or more, 7.0×10 3 Pa or more, or 1.0×10 4 Pa or more.
關於本文中所揭示之黏著片材之黏著劑層,利用後述之實施例中記載之方法測得之藉由光照射進行硬化處理後之楊氏模數(硬化處理後楊氏模數)並無特別限定,例如可為超過0.05 MPa。於一些態樣中,例如就於對貼附於被接著體上之黏著片材應用硬化處理後將該黏著片材自被接著體上剝離之使用態樣中之低污染性之觀點而言,上述硬化處理後楊氏模數較適當為超過0.1 MPa,較有利為超過0.5 MPa,較佳為1.0 MPa以上。若黏著劑層之硬化處理後楊氏模數升高,則存在於光照射後容易獲得自被接著體之良好之剝離性之傾向。例如,於自被接著體剝離時,容易防止或抑制發生黏著劑層之一部分破碎而殘留於該被接著體上之現象(糊劑殘留)。就更容易發揮該效果之觀點而言,於一些態樣中,上述硬化處理後楊氏模數例如可為1.2 MPa以上,亦可為1.5 MPa以上,亦可為2.0 MPa以上,亦可為2.5 MPa以上,亦可為3.5 MPa以上,亦可為4.0 MPa以上或4.5 MPa以上。又,上述硬化處理後楊氏模數例如可為10 MPa以下,就使兼顧硬化處理前之良好之柔軟性變得容易之觀點而言,較佳為7.0 MPa以下,更佳為5.0 MPa以下。Regarding the adhesive layer of the adhesive sheet disclosed herein, the Young's modulus (Young's modulus after curing treatment) after curing treatment by light irradiation measured by the method described in the embodiments described later is not particularly limited, and can be, for example, more than 0.05 MPa. In some aspects, for example, from the perspective of low contamination in the use aspect of applying a curing treatment to the adhesive sheet attached to the adherend and then peeling the adhesive sheet from the adherend, the Young's modulus after curing treatment is preferably more than 0.1 MPa, more preferably more than 0.5 MPa, and more preferably more than 1.0 MPa. If the Young's modulus of the adhesive layer increases after the curing treatment, it tends to be easy to obtain good peeling properties from the adherend after light irradiation. For example, when peeling from the adherend, it is easy to prevent or suppress the phenomenon that a part of the adhesive layer is broken and remains on the adherend (paste residue). From the perspective of more easily exerting this effect, in some embodiments, the Young's modulus after the curing treatment can be, for example, 1.2 MPa or more, 1.5 MPa or more, 2.0 MPa or more, 2.5 MPa or more, 3.5 MPa or more, 4.0 MPa or more, or 4.5 MPa or more. The Young's modulus after the hardening treatment may be, for example, 10 MPa or less, but is preferably 7.0 MPa or less, and more preferably 5.0 MPa or less, from the viewpoint of making it easier to maintain the good flexibility before the hardening treatment.
關於本文中所揭示之黏著片材之黏著劑層,利用後述之實施例中記載之方法測得之藉由光照射進行硬化處理後之凝膠分率並無特別限定,例如可為50%以上,亦可為60%以上或70%以上。就容易適當地發揮藉由光照射所致之易剝離化效果之觀點而言,於一些態樣中,上述凝膠分率較佳為80%以上,更佳為82%以上,進而較佳為84%以上,可為86%以上,亦可為88%以上,亦可為90%以上。又,就使兼顧硬化處理前之良好之柔軟性及黏著性變得容易之觀點而言,於一些態樣中,上述凝膠分率例如可為99.5%以下,亦可為99%以下,亦可為97%以下或95%以下。Regarding the adhesive layer of the adhesive sheet disclosed herein, the gel fraction after curing by light irradiation measured by the method described in the embodiments described later is not particularly limited, and can be, for example, 50% or more, 60% or more, or 70% or more. From the perspective of easily and appropriately exerting the easy-peeling effect caused by light irradiation, in some aspects, the gel fraction is preferably 80% or more, more preferably 82% or more, and further preferably 84% or more, and can be 86% or more, and can also be 88% or more, and can also be 90% or more. Furthermore, from the perspective of making it easier to achieve both good softness and adhesion before hardening, in some aspects, the gel fraction may be, for example, 99.5% or less, 99% or less, 97% or less, or 95% or less.
關於本文中所揭示之黏著片材,基於JIS Z 0237:2000,於23℃、50%RH之環境下,將矽晶圓作為被接著體於剝離角度180度、拉伸速度300 mm/min之條件下所測得之初始剝離強度(初始黏著力)並無特別限定,可視目的或用途調節至適當之範圍內。上述初始黏著力例如可為0.5 N/20 mm以上,亦可為0.8 N/20 mm以上。表現出特定值以上之初始黏著力之黏著片材可良好地接著於被接著體上。就此種觀點而言,於一些態樣中,上述初始黏著力較佳為1.0 N/20 mm以上(例如超過1.0 N/20 mm),更佳為1.5 N/20 mm以上,進而較佳為2.0 N/20 mm以上,可為2.5 N/20 mm以上,亦可為3.0 N/20 mm以上,亦可為3.5 N/20 mm以上,亦可為4.0 N/20 mm以上或4.5 N/20 mm以上。上述初始黏著力之上限並無特別限定,例如可為未達30 N/20 mm,就容易取得與其他特性之平衡等觀點而言,可為25 N/20 mm以下,亦可為20 N/20 mm以下,亦可為15 N/20 mm以下。再者,上述初始黏著力係於硬化處理前所測得之剝離強度。具體而言,初始黏著力可利用後述之實施例中記載之方法進行測定。Regarding the adhesive sheet disclosed in this article, based on JIS Z 0237:2000, the initial peel strength (initial adhesion) measured at a peeling angle of 180 degrees and a tensile speed of 300 mm/min with a silicon wafer as the adherend in an environment of 23°C and 50%RH is not particularly limited and can be adjusted to an appropriate range depending on the purpose or use. The above initial adhesion can be, for example, 0.5 N/20 mm or more, or 0.8 N/20 mm or more. An adhesive sheet showing an initial adhesion above a specific value can be well adhered to the adherend. From this point of view, in some embodiments, the initial adhesion is preferably 1.0 N/20 mm or more (e.g., more than 1.0 N/20 mm), more preferably 1.5 N/20 mm or more, and further preferably 2.0 N/20 mm or more, and may be 2.5 N/20 mm or more, or 3.0 N/20 mm or more, or 3.5 N/20 mm or more, or 4.0 N/20 mm or more, or 4.5 N/20 mm or more. The upper limit of the initial adhesion is not particularly limited, for example, it may be less than 30 N/20 mm, and from the perspective of easy balance with other characteristics, it may be less than 25 N/20 mm, or less than 20 N/20 mm, or less than 15 N/20 mm. Furthermore, the initial adhesion is the peel strength measured before the curing treatment. Specifically, the initial adhesion can be measured using the method described in the embodiments described below.
關於本文中所揭示之黏著片材,於將黏著劑層貼附於矽晶圓上,並實施藉由光照射之硬化處理後所測得之硬化處理後剝離強度(硬化處理後黏著力)較佳為2.0 N/20 mm以下,更佳為1.0 N/20 mm以下。如此,硬化處理後剝離力受到限制之黏著片材於硬化處理後自被接著體上剝離之使用態樣中,可發揮良好之剝離容易性(易剝離性)。就該觀點而言,於一些態樣中,上述硬化處理後黏著力較佳為未達1.0 N/20 mm,更佳為0.7 N/20 mm以下,進而較佳為0.5 N/20 mm以下,可為0.3 N/20 mm以下,亦可為0.2 N/20 mm以下,亦可為0.1 N/20 mm以下,亦可為未達0.1 N/20 mm(例如,0.08 N/20 mm以下或0.05 N/20 mm以下)。硬化處理後黏著力之下限並無特別限制,例如可為0 N/20 mm,亦可為超過0 N/20 mm(例如,0.005 N/20 mm以上)。具體而言,硬化處理後黏著力可利用後述之實施例中記載之方法進行測定。Regarding the adhesive sheet disclosed herein, after the adhesive layer is attached to a silicon wafer and subjected to a curing treatment by light irradiation, the peeling strength after curing treatment (adhesion after curing treatment) measured is preferably 2.0 N/20 mm or less, and more preferably 1.0 N/20 mm or less. In this way, the adhesive sheet with limited peeling force after curing treatment can exhibit good peeling ease (easy peeling property) in the usage mode of peeling from the adherend after curing treatment. From this point of view, in some aspects, the above-mentioned adhesion after hardening treatment is preferably less than 1.0 N/20 mm, more preferably less than 0.7 N/20 mm, and further preferably less than 0.5 N/20 mm, and can be less than 0.3 N/20 mm, or less than 0.2 N/20 mm, or less than 0.1 N/20 mm, or less than 0.1 N/20 mm (for example, less than 0.08 N/20 mm or less than 0.05 N/20 mm). There is no particular limitation on the lower limit of the adhesion after hardening treatment, for example, it can be 0 N/20 mm, or it can be more than 0 N/20 mm (for example, more than 0.005 N/20 mm). Specifically, the adhesion after hardening treatment can be measured by the method described in the embodiments described below.
於本文中所揭示之黏著片材中,根據下述式求出之剝離強度下降率例如可為10%以上、20%以上或30%以上。 剝離強度下降率[%]=(1-B/A)×100 其中,式中之A為上述初始剝離強度[N/20 mm],式中之B為上述硬化處理後剝離強度[N/20 mm]。於一些態樣中,上述剝離強度下降率較佳為50%以上,更佳為65%以上,進而較佳為75%以上,尤佳為85%以上,可為90%以上,亦可為94%以上,亦可為96%以上,亦可為97%以上或98%以上。如此,剝離力因UV照射而大幅下降之黏著片材可用作藉由在貼附於被接著體後於所需之時點進行光照射而可容易剝離之黏著片材。上述剝離強度下降率典型而言為100%以下,可為未達100%,例如亦可為99.8%以下或99.5%以下。例如,就防止硬化處理後之黏著片材非刻意地自被接著體上分離之觀點而言,剝離強度下降率未達100%可較有利。 In the adhesive sheet disclosed in this article, the peel strength reduction rate obtained according to the following formula can be, for example, 10% or more, 20% or more, or 30% or more. Peel strength reduction rate [%] = (1-B/A) × 100 Wherein, A in the formula is the above-mentioned initial peel strength [N/20 mm], and B in the formula is the above-mentioned peel strength after hardening treatment [N/20 mm]. In some embodiments, the above-mentioned peel strength reduction rate is preferably 50% or more, more preferably 65% or more, further preferably 75% or more, particularly preferably 85% or more, and can be 90% or more, 94% or more, 96% or more, 97% or more, or 98% or more. Thus, the adhesive sheet whose peeling force is greatly reduced by UV irradiation can be used as an adhesive sheet that can be easily peeled off by irradiating light at a desired time after being attached to the adherend. The above-mentioned peeling strength reduction rate is typically less than 100%, and may be less than 100%, for example, less than 99.8% or less than 99.5%. For example, from the perspective of preventing the adhesive sheet after the hardening treatment from being unintentionally separated from the adherend, it is more advantageous if the peeling strength reduction rate is less than 100%.
於本文中所揭示之黏著片材中,上述初始剝離強度[N/20 mm]與上述硬化處理後剝離強度[N/20 mm]之差(剝離強度差)例如可為0 N/20 mm以上,典型而言為超過0 N/20 mm,較佳為0.5 N/20 mm以上,更佳為1.0 N/20 mm以上,進而較佳為1.5 N/20 mm以上或2.0 N/20 mm以上,可為3.0 N/20 mm以上,亦可為4.0 N/20 mm以上。如此,剝離力因UV照射而大幅下降之黏著片材可用作藉由在貼附於被接著體後於所需之時點進行光照射而可容易剝離之黏著片材。上述剝離強度差例如可為未達30 N/20 mm,就容易取得與其他特性之平衡等觀點而言,可為未達25 N/20 mm,亦可為未達20 N/20 mm,亦可為未達15 N/20 mm或未達10 N/20 mm。In the adhesive sheet disclosed herein, the difference between the initial peel strength [N/20 mm] and the peel strength [N/20 mm] after the curing treatment (peel strength difference) may be, for example, 0 N/20 mm or more, typically more than 0 N/20 mm, preferably 0.5 N/20 mm or more, more preferably 1.0 N/20 mm or more, further preferably 1.5 N/20 mm or more or 2.0 N/20 mm or more, and may be 3.0 N/20 mm or more, and may be 4.0 N/20 mm or more. In this way, the adhesive sheet whose peeling force is greatly reduced by UV irradiation can be used as an adhesive sheet that can be easily peeled by light irradiation at a desired time after being attached to the adherend. The above-mentioned peel strength difference may be, for example, less than 30 N/20 mm. From the perspective of easy balance with other characteristics, it may be less than 25 N/20 mm, less than 20 N/20 mm, less than 15 N/20 mm, or less than 10 N/20 mm.
<用途> 本文中所揭示之黏著片材之用途並無特別限定,可利用於硬化處理後自被接著體分離時能夠高度防止糊劑殘留之性能,而較佳地用於貼附於被接著體後需剝離之用途中。作為此種用途,可例舉暫時固定用片材及保護片材。又,例如,可較佳地用作在電子機器、電子零件之製造工藝中被固定於被接著體上並進行剝離之工藝材料。 <Application> The application of the adhesive sheet disclosed in this article is not particularly limited. It can be used to highly prevent the paste residue when separating from the adherend after hardening treatment, and is preferably used in applications that need to be peeled off after being attached to the adherend. Examples of such applications include temporary fixing sheets and protective sheets. In addition, for example, it can be preferably used as a process material that is fixed to the adherend and peeled off in the manufacturing process of electronic equipment and electronic parts.
作為本文中所揭示之黏著片材之適宜用途,可例舉半導體元件製造用途。例如,可較佳地用作在半導體晶圓加工(典型而言,矽晶圓加工)中將該晶圓固定於固定板(例如玻璃板或丙烯酸板等硬質基板)上之晶圓固定用片材(典型而言,雷射切晶用片材)。又,本文中所揭示之黏著片材亦可較佳地用作在上述晶圓加工中保護該晶圓(例如電路形成面)之保護片材。可要求上述片材具有在上述製造之加工時或搬送時不會自被接著體(典型而言,半導體元件或硬質基板)上剝離之程度之適度之密接性、及達成目的後自該被接著體上良好地再剝離之性質。本文中所揭示之黏著片材可較佳地用作滿足上述用途所需之性能者。As a suitable use of the adhesive sheet disclosed in this article, the use in semiconductor device manufacturing can be cited. For example, it can be preferably used as a wafer fixing sheet (typically, a sheet for laser cutting) for fixing the wafer on a fixing plate (such as a hard substrate such as a glass plate or an acrylic plate) during semiconductor wafer processing (typically, silicon wafer processing). In addition, the adhesive sheet disclosed in this article can also be preferably used as a protective sheet for protecting the wafer (such as the circuit forming surface) during the above-mentioned wafer processing. The above-mentioned sheet can be required to have a suitable degree of adhesion to the extent that it will not peel off from the adherend (typically, a semiconductor device or a hard substrate) during the above-mentioned manufacturing process or during transportation, and the property of being well peeled off from the adherend after achieving the purpose. The adhesive sheet disclosed herein can be preferably used as one that satisfies the properties required for the above-mentioned purposes.
又,例如,將經小型化之複數個半導體晶片(LED晶片等)固定於一張黏著片材之黏著面上,並於該黏著片材上進行用樹脂密封半導體晶片等加工,於加工處理結束後自黏著片材上將半導體晶片分離之用途亦可為本文中所揭示之黏著片材之適宜用途。本文中所揭示之黏著片材於上述加工期間可良好地固定半導體晶片,並且於自被接著體(半導體晶片)上剝離時可藉由光照射而輕鬆剝離。藉由此種黏著片材,能夠於剝離時防止被接著體表面之損傷。上述黏著片材適宜作為FOWLP(Fan Out Wafer Level Package,扇出型晶圓級封裝)及CSP(Chip Scale Package,晶片尺寸封裝)中使用之黏著片材,藉由用於上述用途,可有助於各種半導體製品之高容量化、高性能化。In addition, for example, a plurality of miniaturized semiconductor chips (LED chips, etc.) are fixed on the adhesive surface of an adhesive sheet, and the semiconductor chips are processed by resin sealing on the adhesive sheet, and the semiconductor chips are separated from the adhesive sheet after the processing is completed. The adhesive sheet disclosed in this article can well fix the semiconductor chip during the above-mentioned processing, and can be easily peeled off from the attached body (semiconductor chip) by light irradiation. With this adhesive sheet, it is possible to prevent the surface of the attached body from being damaged during peeling. The adhesive sheet is suitable as an adhesive sheet used in FOWLP (Fan Out Wafer Level Package) and CSP (Chip Scale Package). By being used for the above purposes, it can contribute to the high capacity and high performance of various semiconductor products.
如上所述,本文中所揭示之黏著片材可較佳地應用於半導體元件之製造用途中。因此,根據該說明書,可提供一種使用本文中所揭示之黏著片材之半導體元件之製造方法。於一較佳態樣中,該製造方法包括:將半導體固定於黏著片材上之步驟(固定步驟);及對該半導體進行加工之步驟(加工步驟)。上述加工步驟例如可為背面研磨步驟、切晶步驟、半導體晶片之樹脂密封步驟等。As described above, the adhesive sheet disclosed herein can be preferably used in the manufacture of semiconductor components. Therefore, according to the specification, a method for manufacturing a semiconductor component using the adhesive sheet disclosed herein can be provided. In a preferred embodiment, the manufacturing method includes: a step of fixing a semiconductor on the adhesive sheet (fixing step); and a step of processing the semiconductor (processing step). The above-mentioned processing step can be, for example, a back grinding step, a crystal cutting step, a resin sealing step of a semiconductor chip, etc.
又,上述製造方法可包括於上述加工步驟後,將黏著片材與半導體(典型而言,半導體晶片)分離之步驟(去除步驟。典型而言,剝離步驟)。上述分離可藉由於半導體之表面(與黏著片材接著面為相反側之表面)貼附轉印膠帶來實施。於上述製造方法中,典型而言,於上述加工步驟後、上述分離步驟前,對黏著片材實施硬化處理。硬化處理較佳為可為活性能量線(例如UV)照射步驟。再者,關於在半導體元件之製造中所需之其他技術性事項,由於業者可基於該領域之技術常識實施,故而此處並未特別說明。Furthermore, the manufacturing method may include a step of separating the adhesive sheet from the semiconductor (typically, the semiconductor chip) after the processing step (a removal step. Typically, a peeling step). The separation may be performed by attaching a transfer tape to the surface of the semiconductor (the surface opposite to the surface contacting the adhesive sheet). In the manufacturing method, the adhesive sheet is typically hardened after the processing step and before the separation step. The hardening treatment may preferably be an active energy ray (e.g., UV) irradiation step. Furthermore, other technical matters required in the manufacture of semiconductor elements are not specifically described here because the industry can implement them based on the technical common sense in this field.
又,本文中所揭示之黏著片材適宜作為於電路基板(例如印刷配線板(PCB)、軟性電路基板(FPC))、有機EL(Electrolu minescence,電致發光)面板、彩色濾光片、電子紙、軟性顯示器等薄壁基板之製造中所用之暫時固定用片材。例如,於PCB之晶片固定中,可使用本文中所揭示之黏著片材將被接著體良好地接著固定,並於所需之時點實施硬化處理,藉此於高度防止糊劑殘留之同時自被接著體上將黏著片材良好地分離。進而,本文中所揭示之黏著片材可較佳地用作薄層晶圓之支持膠帶。於該用途中,例如於向薄層晶圓上印刷焊錫膏時,將本文中所揭示之黏著片材貼附於作為被接著體之薄層晶圓上並作為支持膠帶使用後,於適當之時點實施硬化處理,藉此可於自被接著體分離時高度防止糊劑殘留,同時將黏著片材自被接著體上良好地分離。Furthermore, the adhesive sheet disclosed herein is suitable as a temporary fixing sheet used in the manufacture of thin-walled substrates such as circuit substrates (e.g., printed wiring boards (PCBs), flexible circuit substrates (FPCs)), organic EL (Electroluminescence) panels, color filters, electronic paper, and flexible displays. For example, in the fixation of chips on PCBs, the adhesive sheet disclosed herein can be used to fix the attached body well, and harden it at the required time, thereby highly preventing the residue of the paste and separating the adhesive sheet well from the attached body. Furthermore, the adhesive sheet disclosed herein can be preferably used as a supporting tape for thin wafers. In this application, for example, when printing solder paste on a thin wafer, the adhesive sheet disclosed in this article is attached to the thin wafer as the adherend and used as a supporting tape, and then hardening treatment is performed at an appropriate time. This can highly prevent paste residue from remaining when separating from the adherend, and at the same time, the adhesive sheet can be well separated from the adherend.
如上所述,本文中所揭示之黏著片材可較佳地應用於電路基板(典型而言PCB)等薄壁基板之製造用途中。因此,根據該說明書,可提供一種使用上述黏著片材之薄壁基板(例如電路基板、有機EL面板、彩色濾光片、電子紙、軟性顯示器)之製造方法。於一較佳態樣中,該製造方法包括:將薄壁基板固定於黏著片材(典型而言,該基板之背面)上之步驟(固定步驟);及對該薄壁基板進行加工之步驟。As described above, the adhesive sheet disclosed herein can be preferably used in the manufacture of thin-walled substrates such as circuit substrates (typically PCBs). Therefore, according to the specification, a method for manufacturing a thin-walled substrate (such as a circuit substrate, an organic EL panel, a color filter, an electronic paper, a flexible display) using the adhesive sheet can be provided. In a preferred embodiment, the manufacturing method includes: a step of fixing the thin-walled substrate on the adhesive sheet (typically, the back side of the substrate) (fixing step); and a step of processing the thin-walled substrate.
一些態樣之加工步驟包括黏晶步驟及打線接合步驟,進而可包括成型步驟、封裝切晶步驟。上述黏晶典型而言係於PCB等薄壁基板上配置複數個晶片之步驟,上述打線接合步驟係將打線接合於上述晶片上之步驟,上述成型步驟例如可為用環氧樹脂等樹脂密封PCB上之晶片之步驟。又,上述製造方法可包括於上述加工步驟後,將黏著片材與薄壁基板分離之步驟(去除步驟。典型而言剝離步驟)。於上述製造方法中,典型而言,於上述加工步驟後、上述分離步驟前,對黏著片材實施硬化處理。硬化處理較佳為可為活性能量線(例如UV)照射步驟。再者,關於在PCB等薄壁基板之製造中所需之其他技術性事項,由於業者可基於該領域之技術常識實施,故而此處並未特別說明。Some aspects of the processing steps include a die bonding step and a wire bonding step, and may further include a molding step and a packaging and cutting step. The above-mentioned die bonding is typically a step of configuring a plurality of chips on a thin-walled substrate such as a PCB, the above-mentioned wire bonding step is a step of bonding wires to the above-mentioned chips, and the above-mentioned molding step may be, for example, a step of sealing the chips on the PCB with resins such as epoxy resins. In addition, the above-mentioned manufacturing method may include a step of separating the adhesive sheet from the thin-walled substrate after the above-mentioned processing step (removal step. Typically a peeling step). In the above-mentioned manufacturing method, typically, the adhesive sheet is hardened after the above-mentioned processing step and before the above-mentioned separation step. The curing treatment is preferably an active energy ray (eg UV) irradiation step. In addition, other technical matters required in the manufacture of thin-walled substrates such as PCBs are not specifically described here because the industry can implement them based on the technical common sense in this field.
其他一些態樣之電路基板(典型而言,FPC:Flexible Print Circuit,柔性印刷電路板)之製造方法包括:於固定有薄層晶圓之固定膠帶之背面貼合本文中所揭示之黏著片材作為支持膠帶之步驟;及對該薄層晶圓進行加工之步驟。上述製造方法可包括於上述加工步驟後,將黏著片材與固定膠帶分離之步驟(去除步驟。典型而言剝離步驟)。於上述製造方法中,典型而言,於上述加工步驟後、上述分離步驟前,對黏著片材實施硬化處理。硬化處理較佳為可為活性能量線(例如UV)照射步驟。再者,關於在FPC等薄壁基板之製造中所需之其他技術性事項,由於業者可基於該領域之技術常識實施,故而此處並未特別說明。The manufacturing method of some other aspects of circuit substrates (typically, FPC: Flexible Print Circuit) includes: a step of laminating the adhesive sheet disclosed in this article as a supporting tape on the back side of the fixing tape on which the thin wafer is fixed; and a step of processing the thin wafer. The above-mentioned manufacturing method may include a step of separating the adhesive sheet from the fixing tape after the above-mentioned processing step (a removal step, typically a peeling step). In the above-mentioned manufacturing method, typically, the adhesive sheet is hardened after the above-mentioned processing step and before the above-mentioned separation step. The hardening treatment is preferably a step of irradiating the thin wafer with active energy rays (such as UV). Furthermore, regarding other technical matters required in the manufacture of thin-walled substrates such as FPC, since the industry can implement them based on the technical common sense in this field, they are not specifically explained here.
根據該說明書所揭示之事項包括以下。 [1]一種黏著片材,其係具有藉由光照射進行硬化之黏著劑層者, 上述黏著劑層之偶氮系聚合起始劑及過氧化物系聚合起始劑之合計含量為1.0 μg/g以下, 上述黏著劑層含有具有碳-碳雙鍵之聚合物、及光起始劑, 上述黏著劑層中之上述光起始劑之含量為1.0×10 -4莫耳/100 g以上。 [2]如上述[1]所記載之黏著片材,其中上述黏著劑層含有1.0×10 -4莫耳/100 g以上之碳-碳雙鍵。 [3]如上述[1]或[2]所記載之黏著片材,其中上述具有碳-碳雙鍵之聚合物藉由於1個分子中具有2個以上乙烯性不飽和基之多官能單體來進行交聯。 [4]如上述[1]至[3]中任一項所記載之黏著片材,其中上述黏著劑層之有機溶劑之含量為1.0 μg/g以下。 [5]如上述[1]至[4]中任一項所記載之黏著片材,其中上述具有碳-碳雙鍵之聚合物為丙烯酸系聚合物。 [6]如上述[1]至[5]中任一項所記載之黏著片材,其由下述式所求出之剝離強度下降率為50%以上。 剝離強度下降率[%]=(1-B/A)×100 (式中之A為於貼附於矽晶圓上後,於拉伸速度300 mm/min、剝離角度180度之條件下所測得之初始剝離強度(單位:[N/20 mm]),式中之B為於貼附於矽晶圓上並進行照射累計光量為300 mJ/cm 2之紫外線之硬化處理後,於拉伸速度300 mm/min、剝離角度180度之條件下所測得之硬化處理後剝離強度(單位:[N/20 mm]))。 The matters disclosed in the specification include the following. [1] An adhesive sheet having an adhesive layer that is cured by light irradiation, wherein the total content of an azo-based polymerization initiator and a peroxide-based polymerization initiator in the adhesive layer is 1.0 μg/g or less, the adhesive layer contains a polymer having a carbon-carbon double bond and a photoinitiator, and the content of the photoinitiator in the adhesive layer is 1.0×10 -4 mol/100 g or more. [2] An adhesive sheet as described in [1] above, wherein the adhesive layer contains 1.0×10 -4 mol/100 g or more of carbon-carbon double bonds. [3] An adhesive sheet as described in [1] or [2] above, wherein the polymer having a carbon-carbon double bond is cross-linked by a multifunctional monomer having two or more ethylenically unsaturated groups in one molecule. [4] An adhesive sheet as described in any one of [1] to [3] above, wherein the content of the organic solvent in the adhesive layer is 1.0 μg/g or less. [5] An adhesive sheet as described in any one of [1] to [4] above, wherein the polymer having a carbon-carbon double bond is an acrylic polymer. [6] An adhesive sheet as described in any one of [1] to [5] above, wherein the peel strength reduction rate calculated from the following formula is 50% or more. Peel strength reduction rate [%] = (1-B/A) × 100 (where A is the initial peel strength measured at a pull rate of 300 mm/min and a peel angle of 180 degrees after being attached to a silicon wafer (unit: [N/20 mm]), and B is the peel strength after hardening treatment measured at a pull rate of 300 mm/min and a peel angle of 180 degrees after being attached to a silicon wafer and irradiated with UV light with a cumulative light dose of 300 mJ/ cm2 (unit: [N/20 mm])).
又,根據該說明書所揭示之黏著片材包含對於該黏著片材所具有之黏著劑層,不限制上述偶氮系聚合起始劑及過氧化物系聚合起始劑之合計含量之態樣,於此種態樣中,上述合計含量不加以限制。例如,以下事項亦包含於根據本說明書所揭示之事項中。 [7]一種黏著片材,其係具有藉由光照射進行硬化之黏著劑層者, 上述黏著劑層滿足以下條件中之至少1者: (A)偶氮系聚合起始劑及過氧化物系聚合起始劑之合計含量為1.0 μg/g以下; (B)有機溶劑之含量為1.0 μg/g以下; (C)為光硬化型黏著劑組合物之光硬化物或其改性物;及 (D)含有作為光聚合物或其改性物之聚合物作為基礎聚合物; 上述黏著劑層含有具有碳-碳雙鍵之聚合物、及光起始劑,且 上述黏著劑層中之上述光起始劑之含量為1.0×10 -4莫耳/100 g以上。 [8]如上述[7]所記載之黏著片材,其中上述黏著劑層含有1.0×10 -4莫耳/100 g以上之碳-碳雙鍵。 [9]如上述[7]或[8]所記載之黏著片材,其中上述具有碳-碳雙鍵之聚合物藉由於1個分子中具有2個以上乙烯性不飽和基之多官能單體來進行交聯。 [10]如上述[7]至[9]中任一項所記載之黏著片材,其中上述黏著劑層至少滿足上述條件(B)。 [11]如上述[7]至[10]中任一項所記載之黏著片材,其中上述具有碳-碳雙鍵之聚合物為丙烯酸系聚合物。 [12]如上述[7]至[11]中任一項所記載之黏著片材,其由下述式所求出之剝離強度下降率為50%以上。 剝離強度下降率[%]=(1-B/A)×100 (式中之A為於貼附於矽晶圓上後,於拉伸速度300 mm/min、剝離角度180度之條件下所測得之初始剝離強度(單位:[N/20 mm]),式中之B為於貼附於矽晶圓上並進行照射累計光量為300 mJ/cm 2之紫外線之硬化處理後,於拉伸速度300 mm/min、剝離角度180度之條件下所測得之硬化處理後剝離強度(單位:[N/20 mm]))。 [13]如上述[1]至[12]中任一項所記載之黏著片材,其中上述具有碳-碳雙鍵之聚合物為光聚合物或其改性物。 [14]如上述[1]至[13]中任一項所記載之黏著片材,其中上述具有碳-碳雙鍵之聚合物為丙烯酸系聚合物,且構成該丙烯酸系聚合物之全部單體成分中之50重量%以上係烷基之碳原子數為5以上之(甲基)丙烯酸鏈狀烷基酯。 [15]如上述[1]至[14]中任一項所記載之黏著片材,其中上述黏著劑層含有上述具有碳-碳雙鍵之聚合物作為基礎聚合物。 [16]如上述[1]至[15]中任一項所記載之黏著片材,其中上述黏著劑層之厚度為10 μm以上且未達100 μm。 Furthermore, the adhesive sheet disclosed in the specification includes an aspect that the adhesive layer of the adhesive sheet does not limit the total content of the azo polymerization initiator and the peroxide polymerization initiator, and in this aspect, the total content is not limited. For example, the following items are also included in the items disclosed in the specification. [7] An adhesive sheet having an adhesive layer that is cured by light irradiation, wherein the adhesive layer satisfies at least one of the following conditions: (A) the total content of azo-based polymerization initiators and peroxide-based polymerization initiators is 1.0 μg/g or less; (B) the content of organic solvent is 1.0 μg/g or less; (C) it is a photocurable product of a photocurable adhesive composition or a modified product thereof; and (D) it contains a polymer that is a photopolymer or a modified product thereof as a base polymer; the adhesive layer contains a polymer having a carbon-carbon double bond and a photoinitiator, and the content of the photoinitiator in the adhesive layer is 1.0×10 -4 mol/100 g or more. [8] The adhesive sheet as described in [7] above, wherein the adhesive layer contains 1.0×10 -4 mol/100 g or more of carbon-carbon double bonds. [9] The adhesive sheet as described in [7] or [8] above, wherein the polymer having carbon-carbon double bonds is crosslinked by a multifunctional monomer having two or more ethylenically unsaturated groups in one molecule. [10] The adhesive sheet as described in any one of [7] to [9] above, wherein the adhesive layer satisfies at least the condition (B). [11] The adhesive sheet as described in any one of [7] to [10] above, wherein the polymer having carbon-carbon double bonds is an acrylic polymer. [12] The adhesive sheet as described in any one of the above [7] to [11] has a peel strength reduction rate calculated by the following formula of 50% or more. Peel strength reduction rate [%] = (1-B/A) × 100 (where A is the initial peel strength measured at a tensile speed of 300 mm/ min and a peel angle of 180 degrees after being attached to a silicon wafer (unit: [N/20 mm]), and B is the peel strength after hardening treatment measured at a tensile speed of 300 mm/min and a peel angle of 180 degrees after being attached to a silicon wafer and irradiated with ultraviolet light with a cumulative light intensity of 300 mJ/cm2 (unit: [N/20 mm])). [13] The adhesive sheet as described in any one of [1] to [12] above, wherein the polymer having a carbon-carbon double bond is a photopolymer or a modified product thereof. [14] The adhesive sheet as described in any one of [1] to [13] above, wherein the polymer having a carbon-carbon double bond is an acrylic polymer, and 50% by weight or more of all monomer components constituting the acrylic polymer are (meth) acrylic acid chain alkyl esters having an alkyl group with 5 or more carbon atoms. [15] The adhesive sheet as described in any one of [1] to [14] above, wherein the adhesive layer contains the polymer having a carbon-carbon double bond as a base polymer. [16] The adhesive sheet as described in any one of [1] to [15] above, wherein the thickness of the adhesive layer is 10 μm or more and less than 100 μm.
[17]如上述[1]至[16]中任一項所記載之黏著片材,其於貼附於矽晶圓上後,於拉伸速度300 mm/min、剝離角度180度之條件下所測得之初始剝離強度為1.0 N/20 mm以上(例如2.0 N/20 mm以上)。 [18]如上述[1]至[17]中任一項所記載之黏著片材,其於貼附於矽晶圓上並進行照射累計光量為300 mJ/cm 2之紫外線之硬化處理之後,於拉伸速度300 mm/min、剝離角度180度之條件下所測得之硬化處理後剝離強度未達1.0 N/20 mm。 [19]如上述[1]至[18]中任一項所記載之黏著片材,其於對上述黏著劑層進行累計光量為300 mJ/cm 2之紫外線照射處理後,藉由拉伸試驗所測得之楊氏模數為1.0 MPa以上。 [20]如上述[1]至[19]中任一項所記載之黏著片材,其由下述式所求出之儲存彈性模數增加率為300%以上。 儲存彈性模數增加率[%]=(R/Q-1)×100 (式中之Q及R為基於動態黏彈性測定之於25℃下之儲存彈性模數G'(單位:[Pa]),Q為使用含有上述黏著劑層之測定用樣品測得之儲存彈性模數G'(初始彈性模數G'),R為於對上述測定用樣品進行照射紫外線之硬化處理後所測得之儲存彈性模數G'(硬化處理後彈性模數G')) [21]如上述[1]至[20]中任一項所記載之黏著片材,其中上述黏著劑層之使用含有該黏著劑層之測定用樣品測得之儲存彈性模數G'(初始彈性模數G')未達1.0×10 6Pa,且 於對上述測定用樣品進行照射紫外線之硬化處理後所測得之儲存彈性模數G'(硬化處理後彈性模數G')為1.0×10 6Pa以上。 [22]如上述[1]至[21]中任一項所記載之黏著片材,其中上述黏著劑層之於25℃下之損失彈性模數為1.0×10 3Pa以上1.0×10 6Pa以下。 [23]如上述[1]至[22]中任一項所記載之黏著片材,其中上述黏著劑層之於進行照射累計光量為300 mJ/cm 2之紫外線之硬化處理後所測得之凝膠分率為70%以上。 [17] The adhesive sheet as described in any one of the above [1] to [16], after being attached to a silicon wafer, has an initial peel strength of 1.0 N/20 mm or more (e.g., 2.0 N/20 mm or more) measured at a tensile speed of 300 mm/min and a peel angle of 180 degrees. [18] The adhesive sheet as described in any one of the above [1] to [17], after being attached to a silicon wafer and subjected to a curing treatment by irradiating ultraviolet light with a cumulative light dose of 300 mJ/ cm2 , has a post-curing peel strength of less than 1.0 N/20 mm measured at a tensile speed of 300 mm/min and a peel angle of 180 degrees. [19] The adhesive sheet as described in any one of the above [1] to [18], wherein after the adhesive layer is subjected to ultraviolet irradiation treatment with a cumulative light dose of 300 mJ/ cm2 , the Young's modulus measured by a tensile test is 1.0 MPa or more. [20] The adhesive sheet as described in any one of the above [1] to [19], wherein the storage elastic modulus increase rate calculated by the following formula is 300% or more. Storage modulus increase rate [%] = (R/Q-1) × 100 (where Q and R are the storage modulus G' (unit: [Pa]) at 25°C based on dynamic viscoelasticity measurement, Q is the storage modulus G' (initial modulus G') measured using the test sample containing the above adhesive layer, and R is the storage modulus G' (post-hardening modulus G') measured after the test sample is hardened by ultraviolet irradiation)) [21] The adhesive sheet as described in any one of [1] to [20] above, wherein the storage elastic modulus G' (initial elastic modulus G') of the adhesive layer measured using a test sample containing the adhesive layer is less than 1.0×10 6 Pa, and the storage elastic modulus G' (elastic modulus after curing treatment G') measured after the test sample is subjected to a curing treatment by irradiating ultraviolet rays is greater than or equal to 1.0×10 6 Pa. [22] The adhesive sheet as described in any one of [1] to [21] above, wherein the loss elastic modulus of the adhesive layer at 25°C is greater than or equal to 1.0×10 3 Pa and less than or equal to 1.0×10 6 Pa. [23] An adhesive sheet as described in any one of [1] to [22] above, wherein the adhesive layer has a gel fraction of 70% or more after being cured by irradiating ultraviolet light with a cumulative light dose of 300 mJ/ cm2 .
[24]一種黏著劑層製造方法,其係藉由光照射進行硬化之黏著劑層(光硬化性黏著劑層)之製造方法,該黏著劑層係藉由包括如下步驟之方法進行製作: 形成含有具有官能基A之一級聚合物之初級黏著劑層; 準備含有具有碳-碳雙鍵之含官能基B之化合物及光起始劑之後續塗佈液,將該後續塗佈液塗佈於上述初級黏著劑層之至少一表面; 使上述後續塗佈液中所含有之具有碳-碳雙鍵之含官能基B之化合物及光起始劑滲透至上述初級黏著劑層中;及 對滲透有上述後續塗佈液之初級黏著劑層進行加熱以使上述官能基A與上述官能基B之反應進行。 [25]如上述[24]所記載之黏著劑層製造方法,其可應用於如上述[1]至[23]中任一項所記載之黏著片材所具有之黏著劑層之製造中。 [26]一種黏著片材,其具有藉由如上述[24]或[25]所記載之黏著劑層製造方法而獲得之黏著劑層。 [實施例] [24] A method for producing an adhesive layer, which is a method for producing an adhesive layer that is cured by light irradiation (photocurable adhesive layer), wherein the adhesive layer is produced by a method comprising the following steps: forming a primary adhesive layer containing a primary polymer having a functional group A; preparing a subsequent coating liquid containing a compound containing a functional group B having a carbon-carbon double bond and a photoinitiator, and applying the subsequent coating liquid to at least one surface of the primary adhesive layer; allowing the compound containing a functional group B having a carbon-carbon double bond and the photoinitiator contained in the subsequent coating liquid to penetrate into the primary adhesive layer; and The primary adhesive layer permeated with the subsequent coating liquid is heated to allow the functional group A to react with the functional group B. [25] The adhesive layer manufacturing method described in [24] can be applied to the manufacturing of an adhesive layer possessed by an adhesive sheet described in any one of [1] to [23]. [26] An adhesive sheet having an adhesive layer obtained by the adhesive layer manufacturing method described in [24] or [25]. [Example]
以下,對與本發明相關之一些實施例進行說明,但並非意欲將本發明限定為該實施例中所示者。再者,於以下之說明中,除非另有說明,否則「份」及「%」為重量基準。Hereinafter, some embodiments related to the present invention are described, but it is not intended to limit the present invention to those shown in the embodiments. Furthermore, in the following description, unless otherwise specified, "parts" and "%" are weight basis.
<例1> (預聚物組合物之製備) 向作為單體成分之丙烯酸2-乙基己酯(2EHA)100份及丙烯酸4-羥丁酯(4HBA)13份之混合物中調配光起始劑(商品名「Omnirad 184」,IGM Resins B.V.公司製造;以下表述為「Omni.184」)0.05份後,於氮氣氛圍下照射紫外線直至黏度(BH黏度計,No.5轉子,10 rpm,測定溫度30℃)達到約20 Pa・s,而獲得上述單體成分之一部分經聚合之預聚物組合物。 <Example 1> (Preparation of prepolymer composition) After adding 0.05 parts of a photoinitiator (trade name "Omnirad 184", manufactured by IGM Resins B.V.; hereinafter referred to as "Omni.184") to a mixture of 100 parts of 2-ethylhexyl acrylate (2EHA) and 13 parts of 4-hydroxybutyl acrylate (4HBA) as monomer components, the mixture was irradiated with ultraviolet light in a nitrogen atmosphere until the viscosity (BH viscometer, No. 5 rotor, 10 rpm, measuring temperature 30°C) reached about 20 Pa・s, thereby obtaining a prepolymer composition in which a part of the above monomer components was polymerized.
(紫外線硬化型黏著劑組合物之製備) 向上述預聚物組合物中添加作為交聯劑之多官能丙烯酸酯(己二醇二丙烯酸酯(HDDA))0.05份、光起始劑(Omni.184)0.05份及二月桂酸二辛基錫(商品名「Enbilizer OL-1」,Tokyo Fine Chemical公司製造;以下表述為「OL-1」)1份並混合,獲得紫外線硬化型之黏著劑組合物C1。 (Preparation of UV-curable adhesive composition) 0.05 parts of multifunctional acrylate (hexanediol diacrylate (HDDA)) as a crosslinking agent, 0.05 parts of photoinitiator (Omni.184) and 1 part of dioctyltin dilaurate (trade name "Enbilizer OL-1", manufactured by Tokyo Fine Chemical Co., Ltd.; hereinafter referred to as "OL-1") were added to the above prepolymer composition and mixed to obtain a UV-curable adhesive composition C1.
(初級黏著劑層之形成) 將上述黏著劑組合物C1塗佈於剝離膜(商品名「MRF#38」,Mitsubishi Chemical公司製造)之經剝離處理之表面上,形成黏著劑組合物層。於上述黏著劑組合物層之表面覆蓋剝離膜(商品名「MRE#38」,Mitsubishi Chemical公司製造)以阻隔空氣,於照度:5 mW/cm 2、累計光量:2400 mJ/cm 2之條件下進行紫外線照射,使上述黏著劑組合物層進行光硬化而形成初級黏著劑層(未改性黏著劑層)D1。該初級黏著劑層D1含有上述單體成分之聚合物即藉由上述多官能丙烯酸酯進行交聯而成之丙烯酸系聚合物作為基礎聚合物(一級聚合物)。 (Formation of primary adhesive layer) The adhesive composition C1 was applied on the peeling-treated surface of a release film (trade name "MRF#38", manufactured by Mitsubishi Chemical Co., Ltd.) to form an adhesive composition layer. The surface of the adhesive composition layer was covered with a release film (trade name "MRE#38", manufactured by Mitsubishi Chemical Co., Ltd.) to block air, and ultraviolet light was irradiated under the conditions of illumination: 5 mW/cm 2 and cumulative light amount: 2400 mJ/cm 2 to photoharden the adhesive composition layer to form a primary adhesive layer (unmodified adhesive layer) D1. The primary adhesive layer D1 contains the polymer of the above-mentioned monomer components, namely, an acrylic polymer cross-linked by the above-mentioned multifunctional acrylate as a base polymer (primary polymer).
(後續塗佈液之製備及塗佈) 將異氰酸甲基丙烯醯氧基乙酯(MOI)11份與光起始劑(商品名「Omnirad 651」,IGM Resins B.V.公司製造;以下表述為「Omni.651」)1份混合以製備後續塗佈液E1。自上述初級黏著劑層D1之一表面將上述剝離膜剝下,於露出之表面,利用RD Specialties公司製造之Wire Wound Rod型棒式塗佈機塗佈上述後續塗佈液E1。塗佈後,靜置10秒~10分鐘左右,使上述後續塗佈液E1滲透至初級黏著劑層D1中。 (Preparation and application of subsequent coating liquid) 11 parts of methacryloyl ethyl isocyanate (MOI) and 1 part of a photoinitiator (trade name "Omnirad 651", manufactured by IGM Resins B.V.; hereinafter referred to as "Omni.651") were mixed to prepare the subsequent coating liquid E1. The above-mentioned peeling film was peeled off from one surface of the above-mentioned primary adhesive layer D1, and the above-mentioned subsequent coating liquid E1 was applied to the exposed surface using a wire wound rod type rod coating machine manufactured by RD Specialties. After coating, let it stand for about 10 seconds to 10 minutes to allow the subsequent coating liquid E1 to penetrate into the primary adhesive layer D1.
(碳-碳雙鍵之導入) 繼而,將滲透有後續塗佈液E1之初級黏著劑層D1於130℃之烘箱中加熱3分鐘,使MOI發生加成反應,藉此將碳-碳雙鍵導入至上述基礎聚合物之側鏈。如此,獲得含有具有碳-碳雙鍵之基礎聚合物及光起始劑之光硬化性黏著劑層(無基材黏著片材)S1。將剝離膜之剝離處理面貼合於所獲得之黏著劑層S1之上述一表面來進行保護。再者,上述黏著劑組合物C1之塗佈量及上述後續塗佈液E1之塗佈量係調整至上述黏著劑層S1中之各成分之含量達到如下述表中所示,且該黏著劑層S1之厚度達到25 μm。 (Introduction of carbon-carbon double bonds) Then, the primary adhesive layer D1 infiltrated with the subsequent coating liquid E1 is heated in an oven at 130°C for 3 minutes to cause an addition reaction of MOI, thereby introducing carbon-carbon double bonds into the side chains of the above-mentioned base polymer. In this way, a photocurable adhesive layer (substrate-free adhesive sheet) S1 containing a base polymer with carbon-carbon double bonds and a photoinitiator is obtained. The release-treated surface of the release film is attached to the above-mentioned surface of the obtained adhesive layer S1 for protection. Furthermore, the coating amount of the above-mentioned adhesive composition C1 and the coating amount of the above-mentioned subsequent coating liquid E1 are adjusted so that the content of each component in the above-mentioned adhesive layer S1 reaches as shown in the following table, and the thickness of the adhesive layer S1 reaches 25 μm.
<例2> 向作為單體成分之2EHA 100份中調配光起始劑(Omni.184)0.05份,以與例1相同之方式照射紫外線,獲得上述單體成分之一部份經聚合之預聚物組合物。 向上述預聚物組合物中添加作為單體成分之4HBA 13份、作為交聯劑之HDDA 0.05份、光起始劑(Omni.184)0.05份、及OL-1 1份並混合,獲得紫外線硬化型之黏著劑組合物C2。 使用黏著劑組合物C2代替黏著劑組合物C1,除此以外,與例1同樣地進行操作,製作本例之黏著劑層(無基材黏著片材)S2。 <Example 2> 0.05 parts of photoinitiator (Omni.184) were mixed into 100 parts of 2EHA as a monomer component, and ultraviolet rays were irradiated in the same manner as in Example 1 to obtain a prepolymer composition in which part of the above monomer component was polymerized. 13 parts of 4HBA as a monomer component, 0.05 parts of HDDA as a crosslinking agent, 0.05 parts of photoinitiator (Omni.184), and 1 part of OL-1 were added to the above prepolymer composition and mixed to obtain a UV-curable adhesive composition C2. The adhesive layer (substrate-free adhesive sheet) S2 of this example was prepared in the same manner as in Example 1 except that adhesive composition C2 was used instead of adhesive composition C1.
<例3> 向作為單體成分之2EHA 100份中調配光起始劑(Omni.184)0.05份,以與例1相同之方式照射紫外線,獲得上述單體成分之一部分經聚合之預聚物組合物。 向上述預聚物組合物中添加作為單體成分之MOI 12份、作為交聯劑之HDDA 0.05份、光起始劑(Omni.184)0.05份、及OL-1 1份並混合,獲得紫外線硬化型之黏著劑組合物C3。 將4HBA 11份與光起始劑(Omni.651)1份混合以製備後續塗佈液E3。使用黏著劑組合物C3代替黏著劑組合物C1,並使用後續塗佈液E3代替後續塗佈液E1,除此以外,與例1同樣地進行操作,製作本例之黏著劑層(無基材黏著片材)S3。 <Example 3> 0.05 parts of photoinitiator (Omni.184) were mixed into 100 parts of 2EHA as a monomer component, and ultraviolet rays were irradiated in the same manner as in Example 1 to obtain a prepolymer composition in which a part of the above monomer component was polymerized. 12 parts of MOI as a monomer component, 0.05 parts of HDDA as a crosslinking agent, 0.05 parts of photoinitiator (Omni.184), and 1 part of OL-1 were added to the above prepolymer composition and mixed to obtain a UV-curable adhesive composition C3. 11 parts of 4HBA were mixed with 1 part of photoinitiator (Omni.651) to prepare a subsequent coating liquid E3. The adhesive layer (substrate-free adhesive sheet) S3 of this example was prepared in the same manner as in Example 1 except that the adhesive composition C3 was used instead of the adhesive composition C1, and the subsequent coating liquid E3 was used instead of the subsequent coating liquid E1.
<例4> 向作為單體成分之2EHA 100份及丙烯酸(AA)13份之混合物中調配光起始劑(Omni.184)0.05份,以與例1相同之方式照射紫外線,獲得上述單體成分之一部分經聚合之預聚物組合物。 向上述預聚物組合物中添加作為交聯劑之HDDA 0.05份、光起始劑(Omni.184)0.05份、及四丁基溴化銨(TBAB)4份並混合,獲得紫外線硬化型之黏著劑組合物C4。 將甲基丙烯酸縮水甘油酯(GMA)11份與光起始劑(Omni.651)1份混合以製備塗佈液E4。使用黏著劑組合物C4代替黏著劑組合物C1,並使用後續塗佈液E4代替後續塗佈液E1,除此以外,與例1同樣地進行操作,製作本例之黏著劑層(無基材黏著片材)S4。 <Example 4> 0.05 part of photoinitiator (Omni.184) was added to a mixture of 100 parts of 2EHA and 13 parts of acrylic acid (AA) as monomer components, and ultraviolet rays were irradiated in the same manner as in Example 1 to obtain a prepolymer composition in which a part of the above monomer components was polymerized. 0.05 part of HDDA as a crosslinking agent, 0.05 part of photoinitiator (Omni.184), and 4 parts of tetrabutylammonium bromide (TBAB) were added to the above prepolymer composition and mixed to obtain a UV-curable adhesive composition C4. 11 parts of glycidyl methacrylate (GMA) and 1 part of photoinitiator (Omni.651) were mixed to prepare a coating liquid E4. The adhesive layer (adhesive sheet without substrate) S4 of this example was prepared in the same manner as in Example 1 except that adhesive composition C4 was used instead of adhesive composition C1 and subsequent coating liquid E4 was used instead of subsequent coating liquid E1.
<例5~7> 如表1所示般變更後續塗佈液之組成,除此以外,與例2同樣地進行操作,製作各例之黏著劑層(無基材黏著片材)S5~S7。 <Examples 5 to 7> Except for changing the composition of the subsequent coating liquid as shown in Table 1, the same operation as Example 2 was performed to prepare the adhesive layer (substrate-free adhesive sheet) S5 to S7 of each example.
<例8> 於具備溫度計、攪拌機、氮氣導入管等之反應容器中,按照2EHA 85份、丙烯酸羥乙酯(HEA)15份之調配比準備單體混合物,向該單體混合物100份中投入作為偶氮系聚合起始劑之N,N'-偶氮二異丁腈(AIBN)0.2份、及作為聚合溶劑之乙酸乙酯,於氮氣氣流下,於約60℃下進行溶液聚合,獲得丙烯酸系聚合物之乙酸乙酯溶液。向該溶液中加入0.02份OL-1及12份MOI進行加成反應,製備具有碳-碳雙鍵之丙烯酸系聚合物。向上述具有碳-碳雙鍵之丙烯酸系聚合物之乙酸乙酯溶液中,相對於該丙烯酸聚合物之固形物成分100份,以固形物成分之形式添加1份異氰酸酯系交聯劑(三井化學股份有限公司製造之商品名「Takenate D-101E」),並以1份之比率添加光起始劑(Omni.651)。如此,製備溶劑型之黏著劑組合物C8(固形物成分50%)。 於經剝離處理之聚酯膜之剝離處理面上塗佈上述黏著劑組合物C8,並於120℃下乾燥3分鐘,進而於50℃下進行24小時之老化,藉此製作本例之黏著劑層(無基材黏著片材)S8。 <Example 8> In a reaction container equipped with a thermometer, a stirrer, a nitrogen inlet tube, etc., a monomer mixture is prepared according to a mixing ratio of 85 parts of 2EHA and 15 parts of hydroxyethyl acrylate (HEA), 0.2 parts of N,N'-azobisisobutyronitrile (AIBN) as an azo polymerization initiator and ethyl acetate as a polymerization solvent are added to 100 parts of the monomer mixture, and solution polymerization is carried out at about 60°C under a nitrogen flow to obtain an ethyl acetate solution of an acrylic polymer. 0.02 parts of OL-1 and 12 parts of MOI are added to the solution for addition reaction to prepare an acrylic polymer having a carbon-carbon double bond. To the ethyl acetate solution of the acrylic polymer having carbon-carbon double bonds, 1 part of an isocyanate crosslinking agent (trade name "Takenate D-101E" manufactured by Mitsui Chemicals Co., Ltd.) was added as a solid component relative to 100 parts of the solid content of the acrylic polymer, and 1 part of a photoinitiator (Omni.651) was added. In this way, a solvent-type adhesive composition C8 (solid content 50%) was prepared. The adhesive composition C8 was applied to the peeling surface of the polyester film that had been peeled, and dried at 120°C for 3 minutes, and then aged at 50°C for 24 hours to prepare the adhesive layer (substrate-free adhesive sheet) S8 of this example.
<例9> 於上述溶液聚合中,使用作為過氧化物系聚合起始劑之苯甲醯基過氧化物(日油公司製造之商品名「Nyper BMT-40SV」)0.2份代替AIBN 0.2份。關於其他方面,與例8同樣地進行操作,製作本例之黏著劑層(無基材黏著片材)S9。 <Example 9> In the above solution polymerization, 0.2 parts of benzoyl peroxide (trade name "Nyper BMT-40SV" manufactured by NOF Corporation) was used as a peroxide polymerization initiator instead of 0.2 parts of AIBN. With regard to other aspects, the same operation as in Example 8 was carried out to prepare the adhesive layer (substrate-free adhesive sheet) S9 of this example.
<例10、11> 將表2所示之種類及量之單體進一步添加於預聚物組合物中,除此以外,與例1相同地進行操作,製作各例之黏著劑層(無基材黏著片材)S10、S11。再者,於表2中,「ACMO」表示N-丙烯醯𠰌啉,「NVP」表示N-乙烯基-2-吡咯啶酮。 <Examples 10 and 11> Except that the monomers of the types and amounts shown in Table 2 were further added to the prepolymer composition, the same operation as in Example 1 was performed to prepare adhesive layers (substrate-free adhesive sheets) S10 and S11 of each example. In Table 2, "ACMO" represents N-acryloylpyrrolidone, and "NVP" represents N-vinyl-2-pyrrolidone.
<例12> 向作為單體成分之丙烯酸正丁酯(BA)100份及4HBA 22份之混合物中調配光起始劑(Omni.184)0.05份,以與例1相同之方式照射紫外線,獲得上述單體成分之一部分經聚合之預聚物組合物。 向上述預聚物組合物中添加作為交聯劑之HDDA 0.05份、光起始劑(Omni.184)0.05份、及OL-1 1份並混合,獲得紫外線硬化型之黏著劑組合物C12。 將MOI 18份與光起始劑(Omni.651)1份混合以製備後續塗佈液E12。使用黏著劑組合物C12代替黏著劑組合物C1,並使用後續塗佈液E12代替後續塗佈液E1,除此以外,與例1同樣地進行操作,製作本例之黏著劑層(無基材黏著片材)S12。 <Example 12> 0.05 parts of photoinitiator (Omni.184) was added to a mixture of 100 parts of n-butyl acrylate (BA) and 22 parts of 4HBA as monomer components, and ultraviolet rays were irradiated in the same manner as in Example 1 to obtain a prepolymer composition in which part of the above monomer components were polymerized. 0.05 parts of HDDA as a crosslinking agent, 0.05 parts of photoinitiator (Omni.184), and 1 part of OL-1 were added to the above prepolymer composition and mixed to obtain a UV-curable adhesive composition C12. 18 parts of MOI were mixed with 1 part of photoinitiator (Omni.651) to prepare a subsequent coating liquid E12. The adhesive layer (substrate-free adhesive sheet) S12 of this example was prepared in the same manner as in Example 1 except that adhesive composition C12 was used instead of adhesive composition C1, and subsequent coating liquid E12 was used instead of subsequent coating liquid E1.
<例13> 將表2所示之種類及量之單體進一步添加於預聚物組合物中,除此以外,與例12同樣地進行操作,製作本例之黏著劑層(無基材黏著片材)S13。 <Example 13> Except that the monomers of the types and amounts shown in Table 2 are further added to the prepolymer composition, the same operation as in Example 12 is performed to prepare the adhesive layer (substrate-free adhesive sheet) S13 of this example.
<測定及評估> [碳-碳雙鍵量] 由下述式算出藉由各例所獲得之黏著劑層(黏著劑層S1~S13)中所含有之碳-碳雙鍵之量(未反應雙鍵量)。 碳-碳雙鍵含量[莫耳/100 g]=((後續塗佈液中所含有之含碳-碳雙鍵之化合物之份數[份]×該含碳-碳雙鍵之化合物1個分子中所含有之碳-碳雙鍵之個數)/黏著劑調配份數合計[份])×100[g]/該含碳-碳雙鍵之化合物之分子量[g/莫耳] <Measurement and evaluation> [Carbon-carbon double bond content] The amount of carbon-carbon double bonds (unreacted double bond content) contained in the adhesive layer (adhesive layers S1 to S13) obtained in each example was calculated by the following formula. Carbon-carbon double bond content [mole/100 g] = ((the number of carbon-carbon double bond-containing compounds contained in the subsequent coating liquid [parts] × the number of carbon-carbon double bonds contained in one molecule of the carbon-carbon double bond-containing compound) / the total number of adhesive formulations [parts]) × 100 [g] / molecular weight of the carbon-carbon double bond-containing compound [g/mole]
[光起始劑量] 由下述式算出藉由各例所獲得之黏著劑層中所含有之光起始劑之量(未反應光起始劑量)。 光起始劑量[莫耳/100 g]=(後續塗佈液中所含有之光起始劑之份數[份]/黏著劑調配份數合計[份])×100[g]/該光起始劑之分子量[g/莫耳] [Photoinitiator amount] The amount of photoinitiator contained in the adhesive layer obtained in each example (unreacted photoinitiator amount) is calculated by the following formula. Photoinitiator amount [mole/100 g] = (number of photoinitiators contained in the subsequent coating liquid [parts] / total number of adhesive preparation parts [parts]) × 100 [g] / molecular weight of the photoinitiator [g/mole]
[偶氮系及過氧化物系聚合起始劑量] 自藉由各例所獲得之黏著劑層中採取約3 mg之試樣,利用氣相層析質譜分析(GC/MS)法進行於180℃下保持1小時時之釋氣分析,藉此進行測定。具體之測定條件如下。基於測定結果,求出上述黏著劑層中之偶氮系聚合起始劑量與過氧化物系聚合起始劑之合計含量(包括以分解物或殘存物之形態所含有之分量)。 (分析裝置) 加熱裝置:GERSTEL, TDU2 GC/MS:Agilent Technologies, 8890/5977B (測定條件) TDU條件(試樣):30℃(1 min)→720℃/min→180℃(60 min) TDU條件(標準品):30℃(1 min)→720℃/min→300℃(5 min) CIS條件:-150℃(2.5 min)→12℃/sec→300℃(10 min) GC/MS條件 柱:HP-Ultra1(0.20 mm ×25 m,df=0.33 μm) 柱溫度:40℃(5 min)→10℃/min→100℃→20℃/min→300℃(9 min) 柱壓力:定流量模式(113 kPa,Vac) 柱流量:1 mL/min(He) 注入方法:CIS,Split(20:1) 檢測器:MS 離子源溫度:230℃ 離子化方法:EI(70 eV) 掃描範圍:m/z10~800 [Azo and peroxide polymerization initiators] About 3 mg of the sample was taken from the adhesive layer obtained in each example, and the outgassing analysis was performed by gas chromatography-mass spectrometry (GC/MS) at 180°C for 1 hour. The specific measurement conditions are as follows. Based on the measurement results, the total content of the azo polymerization initiator and the peroxide polymerization initiator in the above adhesive layer (including the amount contained in the form of decomposition products or residues) was calculated. (Analysis equipment) Heating device: GERSTEL, TDU2 GC/MS: Agilent Technologies, 8890/5977B (Measurement conditions) TDU conditions (sample): 30℃ (1 min) → 720℃/min → 180℃ (60 min) TDU conditions (standard): 30℃ (1 min) → 720℃/min → 300℃ (5 min) CIS conditions: -150℃ (2.5 min) → 12℃/sec → 300℃ (10 min) GC/MS conditions Column: HP-Ultra1 (0.20 mm ×25 m, df=0.33 μm) Column temperature: 40℃(5 min)→10℃/min→100℃→20℃/min→300℃(9 min) Column pressure: Constant flow mode (113 kPa, Vac) Column flow rate: 1 mL/min(He) Injection method: CIS, Split(20:1) Detector: MS Ion source temperature: 230℃ Ionization method: EI(70 eV) Scanning range: m/z10~800
[有機溶劑含量] 自藉由各例所獲得之黏著劑層中採取約3 mg之試樣,利用氣相層析質譜分析(GC/MS)法進行於180℃下保持1小時時之釋氣分析,藉此測定黏著劑層中之有機溶劑含量。具體之測定條件如上。 [Organic solvent content] About 3 mg of sample was taken from the adhesive layer obtained in each example, and the outgassing analysis was performed by gas chromatography-mass spectrometry (GC/MS) at 180°C for 1 hour to determine the organic solvent content in the adhesive layer. The specific measurement conditions are as above.
[動態黏彈性測定] 將對藉由各例所獲得之黏著劑層(無基材黏著片材)進行積層,使厚度為約2 mm,將沖裁為直徑7.9 mm之圓盤狀者作為測定用樣品。使用Rheometric Scientific公司製造之「Advanced Rheometric Expansion System(ARES)」,基於以下條件進行動態黏彈性測定,藉此求出於25℃下之初始彈性模數G'及損失彈性模數G''。 (測定條件) 變形模式:扭轉 測定頻率:1 Hz 升溫速度:5℃/分鐘 形狀:平行板 7.9 mm [Dynamic viscoelasticity measurement] The adhesive layer (adhesive sheet without substrate) obtained in each example is laminated to a thickness of about 2 mm, and a disc with a diameter of 7.9 mm is punched out as a measurement sample. Dynamic viscoelasticity measurement is performed under the following conditions using the "Advanced Rheometric Expansion System (ARES)" manufactured by Rheometric Scientific, and the initial elastic modulus G' and loss elastic modulus G'' at 25°C are obtained. (Measurement conditions) Deformation mode: Torsion Measurement frequency: 1 Hz Heating rate: 5°C/min Shape: Parallel plate 7.9 mm
繼而,對上述測定用樣品進行照射照度300 mW/cm、累計光量3000 mJ/cm 2之紫外線之硬化處理。使用處理後之樣品藉由上述方法進行動態黏彈性測定,藉此求出於25℃下之硬化處理後彈性模數G'。 Then, the above-mentioned measurement sample was subjected to a curing treatment by irradiating ultraviolet light with an illuminance of 300 mW/cm2 and a cumulative light quantity of 3000 mJ/ cm2 . The treated sample was used to perform a dynamic viscoelasticity measurement using the above-mentioned method to determine the elastic modulus G' after curing treatment at 25°C.
根據所獲得之初始彈性模數G'[Pa]及硬化處理後彈性模數G'[Pa]之值,由下述式算出儲存彈性模數G'之增加率。 儲存彈性模數G'之增加率[%]=(R/Q-1)×100 (式中,Q為初始彈性模數G',R為硬化處理後彈性模數G') Based on the obtained initial elastic modulus G'[Pa] and the elastic modulus G'[Pa] after hardening treatment, the increase rate of storage elastic modulus G' is calculated by the following formula. Increase rate of storage elastic modulus G'[%]=(R/Q-1)×100 (where Q is the initial elastic modulus G' and R is the elastic modulus G' after hardening treatment)
[楊氏模數(硬化處理後楊氏模數)] 對於藉由各例所獲得之黏著劑層(無基材黏著片材),以該黏著劑層被夾於2張剝離膜之間之形態,於下述條件下進行照射紫外線之硬化處理。繼而,將上述黏著劑層連同上述剝離膜切割成寬度80 mm、長度30 mm之尺寸。該寬度80 mm係以在沿該寬度方向之截面中黏著劑層之截面面積為約2 mm 2之方式,根據上述黏著劑層之厚度所設定之寬度。繼而,自上述黏著劑層上將一剝離膜去除,於另一剝離膜上,將上述黏著劑層以其長度方向為軸以避免氣泡進入之方式進行捲取,藉此製作長度30 mm之棒狀試樣。 將上述棒狀試樣安放於拉伸試驗機(ORIENTEC公司製造,商品名「RTC-1150A」)上,於測定溫度23℃、夾頭間距離10 mm、拉伸速度300 mm/min之條件下測定SS(stress-strain,應力-應變)曲線。根據上述SS曲線之上升情況求出初始彈性模數,並將其設為硬化處理後之黏著劑層之拉伸彈性模數(硬化處理後楊氏模數)。 (UV照射條件) UV照射機:日東精機公司製造,商品名「NEL SYSTEM UM810」,高壓水銀燈光源(特性波長365 nm) 照射量:照度60 mW/cm 2、累計光量300 mJ/cm 2 [Young's modulus (Young's modulus after curing treatment)] The adhesive layer (substrate-free adhesive sheet) obtained by each example was subjected to curing treatment by irradiation with ultraviolet light under the following conditions in a state where the adhesive layer was sandwiched between two peeling films. Then, the adhesive layer and the peeling film were cut into a size of 80 mm in width and 30 mm in length. The width of 80 mm was set according to the thickness of the adhesive layer in such a way that the cross-sectional area of the adhesive layer in the cross section along the width direction was about 2 mm2 . Next, a peeling film was removed from the adhesive layer, and the adhesive layer was rolled up on another peeling film with its length as the axis to avoid air bubbles from entering, thereby making a rod-shaped specimen with a length of 30 mm. The rod-shaped specimen was placed on a tensile testing machine (manufactured by ORIENTEC, trade name "RTC-1150A"), and the SS (stress-strain) curve was measured under the conditions of a measuring temperature of 23°C, a chuck distance of 10 mm, and a tensile speed of 300 mm/min. The initial elastic modulus was obtained based on the rise of the SS curve, and it was set as the tensile elastic modulus of the adhesive layer after hardening treatment (Young's modulus after hardening treatment). (UV irradiation conditions) UV irradiator: manufactured by Nitto Seiki Co., Ltd., trade name "NEL SYSTEM UM810", high-pressure mercury lamp light source (characteristic wavelength 365 nm) Irradiation: Illuminance 60 mW/ cm2 , cumulative light intensity 300 mJ/ cm2
[凝膠分率] 對於藉由各例所獲得之黏著劑層(無基材黏著片材),以該黏著劑層被夾於2張剝離膜之間之形態,於下述條件下進行照射紫外線之硬化處理。繼而,自上述黏著劑層上採取約0.5 g之測定樣品並進行準確稱量(重量W1)。將該測定樣品包裹於多孔質PTFE(聚四氟乙烯)片材中,於室溫下浸漬於乙酸乙酯中1週後使其乾燥,測量乙酸乙酯不溶解成分之重量(重量W2)。將上述重量W1及W2代入下式: 凝膠分率[%]=W2/W1×100; 算出硬化處理後之黏著劑層之凝膠分率。作為上述多孔質PTFE片材,使用日東電工公司製造之商品名「NITOFLON NTF1122」。 (UV照射條件) UV照射機:日東精機公司製造,商品名「NEL SYSTEM UM810」,高壓水銀燈光源(特性波長365 nm) 照射量:照度60 mW/cm 2、累計光量300 mJ/cm 2 [Gel fraction] The adhesive layer (adhesive sheet without substrate) obtained in each example is subjected to a curing treatment by irradiating ultraviolet rays under the following conditions in a state where the adhesive layer is sandwiched between two peeling films. Then, a measurement sample of about 0.5 g is taken from the above-mentioned adhesive layer and accurately weighed (weight W1). The measurement sample is wrapped in a porous PTFE (polytetrafluoroethylene) sheet, immersed in ethyl acetate at room temperature for 1 week and then dried, and the weight of the insoluble component in ethyl acetate is measured (weight W2). The above-mentioned weights W1 and W2 are substituted into the following formula: Gel fraction [%] = W2/W1×100; The gel fraction of the adhesive layer after the curing treatment is calculated. As the porous PTFE sheet, the product name "NITOFLON NTF1122" manufactured by Nitto Denko Co., Ltd. was used. (UV irradiation conditions) UV irradiator: manufactured by Nitto Seiki Co., Ltd., product name "NEL SYSTEM UM810", high-pressure mercury lamp light source (characteristic wavelength 365 nm) Irradiation amount: illuminance 60 mW/ cm2 , cumulative light amount 300 mJ/ cm2
[180度剝離強度] 自藉由各例所獲得之黏著劑層(無基材黏著片材)上將一剝離襯墊剝下,貼合厚度50 μm之透明PET膜作為襯底後,切割成寬20 mm、長度80 mm之短條狀製成試驗片。於23℃、50%RH之環境下,自上述試驗片上將另一剝離襯墊剝下,並用手壓輥貼合於作為被接著體之矽晶圓(信越化學公司製造,6英吋,N<100>-100)之鏡面上。對其進行高壓釜處理(50℃、5 atm、15分鐘)後,於23℃、50%RH之環境下,使用拉伸試驗機(Minebea公司製造,萬能拉伸壓縮試驗機,裝置名「拉伸壓縮試驗機,TCM-1kNB」),於拉伸速度300 mm/min、剝離角度180度之條件下,將上述試驗片自上述矽晶圓上剝離,測定此時之剝離強度。測定進行3次,將其等之算數平均值作為初始剝離強度之值。 [180 degree peel strength] A peeling pad was peeled off from the adhesive layer (substrate-free adhesive sheet) obtained in each example, and a transparent PET film with a thickness of 50 μm was attached as a backing, and then cut into short strips with a width of 20 mm and a length of 80 mm to prepare a test piece. In an environment of 23°C and 50% RH, another peeling pad was peeled off from the above test piece and attached to the mirror surface of a silicon wafer (manufactured by Shin-Etsu Chemical Co., Ltd., 6 inches, N<100>-100) as the adherend using a hand roller. After autoclaving (50°C, 5 atm, 15 minutes), the test piece was peeled off from the silicon wafer using a tensile tester (manufactured by Minebea, universal tensile compression tester, device name "tensile compression tester, TCM-1kNB") at a tensile speed of 300 mm/min and a peeling angle of 180 degrees in an environment of 23°C and 50% RH, and the peeling strength at this time was measured. The measurement was performed 3 times, and the arithmetic average of the values was taken as the value of the initial peeling strength.
又,上述高壓釜處理後,自上述PET膜側開始於下述條件下進行照射紫外線(UV)之硬化處理後,將上述試驗片自上述矽晶圓上剝離,除此以外,與上述初始剝離強度之測定同樣地進行操作,測定硬化處理後剝離強度。 (UV照射條件) UV照射機:日東精機公司製造,商品名「NEL SYSTEM UM810」,高壓水銀燈光源(特性波長365 nm) 照射量:照度60 mW/cm 2、累計光量300 mJ/cm 2 After the autoclave treatment, the PET film side was subjected to UV curing treatment under the following conditions, and then the test piece was peeled off from the silicon wafer. The peeling strength after curing treatment was measured in the same manner as the initial peeling strength measurement. (UV irradiation conditions) UV irradiator: manufactured by Nitto Seiki Co., Ltd., trade name "NEL SYSTEM UM810", high-pressure mercury lamp light source (characteristic wavelength 365 nm) Irradiation: illuminance 60 mW/ cm2 , cumulative light quantity 300 mJ/ cm2
根據所獲得之初始剝離強度[N/20 mm]及硬化處理後剝離強度[N/20 mm]之值,由下述式算出剝離強度下降率。 剝離強度下降率[%]=(1-B/A)×100 (式中之A為初始剝離強度,B為硬化處理後剝離強度) Based on the obtained initial peel strength [N/20 mm] and the peel strength [N/20 mm] after hardening treatment, the peel strength reduction rate is calculated by the following formula. Peel strength reduction rate [%] = (1-B/A) × 100 (A is the initial peel strength, B is the peel strength after hardening treatment)
將所獲得之結果與各例之黏著劑層之概要一同示於表1、2中。表2中之例1係再次揭示表1中之例1者。The obtained results are shown in Tables 1 and 2 together with the summary of the adhesive layer of each example. Example 1 in Table 2 is a re-disclosure of Example 1 in Table 1.
[表1]
[表2]
如表1、2所示,例1~6、10~13之黏著劑層含有具有碳-碳雙鍵之聚合物、及1.0×10 -4莫耳/100 g以上之光起始劑。該等黏著劑層之儲存彈性模數G'因紫外線照射而大幅上升,從而表現出良好之光硬化性。又,例1~6、10~13之黏著劑層之剝離強度因紫外線照射而大幅下降,從而易剝離性優異。例1~6、10~13之黏著劑層表現出如此優異之性能,並且可使用不進行使用偶氮系或過氧化物系聚合起始劑之溶液聚合而獲得之無溶劑之黏著劑組合物,利用於由該黏著劑組合物獲得各例之黏著劑層之過程中亦不使用有機溶劑之方法來進行製造,故而就環境衛生之觀點而言較理想。 As shown in Tables 1 and 2, the adhesive layers of Examples 1 to 6 and 10 to 13 contain a polymer having a carbon-carbon double bond and a photoinitiator of 1.0×10 -4 mol/100 g or more. The storage elastic modulus G' of the adhesive layers increases significantly due to ultraviolet irradiation, thereby showing good photocurability. In addition, the peel strength of the adhesive layers of Examples 1 to 6 and 10 to 13 decreases significantly due to ultraviolet irradiation, thereby showing excellent easy peelability. The adhesive layers of Examples 1 to 6 and 10 to 13 exhibit such excellent performance, and can be manufactured using a solvent-free adhesive composition obtained by solution polymerization without using an azo-based or peroxide-based polymerization initiator, and a method that does not use an organic solvent in the process of obtaining the adhesive layers of each example from the adhesive composition, so it is more ideal from the perspective of environmental hygiene.
另一方面,例7之黏著劑層不含有具有碳-碳雙鍵之聚合物,對於光照射未表現出如例1~6、例10~13般之硬化性(特性變化)。再者,表1所示之例8、例9之黏著劑層係對溶劑系黏著劑組合物進行塗佈、乾燥而獲得者,該溶劑系黏著劑組合物含有向藉由例8中使用偶氮系聚合起始劑、例9中使用有過氧化物系聚合起始劑之溶液聚合而獲得之丙烯酸系聚合物中藉由溶液中之反應導入碳-碳雙鍵,從而獲得之丙烯酸系聚合物(具有碳-碳雙鍵之丙烯酸系聚合物)作為基礎聚合物。例8、9之黏著劑層反映了此種製造過程,偶氮系及過氧化物系聚合起始劑量之值高達13~96 μg/100 g,可知殘存溶劑量(有機溶劑含量)亦明顯較多。On the other hand, the adhesive layer of Example 7 does not contain a polymer having a carbon-carbon double bond, and does not show the same curability (characteristic change) as Examples 1 to 6 and Examples 10 to 13 when exposed to light. Furthermore, the adhesive layers of Examples 8 and 9 shown in Table 1 are obtained by coating and drying a solvent-based adhesive composition containing an acrylic polymer (acrylic polymer having a carbon-carbon double bond) obtained by introducing a carbon-carbon double bond into an acrylic polymer obtained by solution polymerization using an azo-based polymerization initiator in Example 8 and a peroxide-based polymerization initiator in Example 9 as a base polymer. The adhesive layers of Examples 8 and 9 reflect this manufacturing process. The values of the azo and peroxide polymerization initiators are as high as 13 to 96 μg/100 g. It can be seen that the residual solvent amount (organic solvent content) is also significantly higher.
以上,對本發明之具體例詳細地進行了說明,但其等僅為例示,並非限定申請專利範圍。申請專利範圍中記載之技術包括對以上所例示之具體例進行了各種變化、變更者。The specific examples of the present invention have been described in detail above, but these are only examples and do not limit the scope of the patent application. The technology described in the scope of the patent application includes various changes and modifications of the specific examples described above.
1:黏著片材 2:黏著片材 10:黏著劑層 10A:一表面(黏著面) 10B:另一表面 20:基材 20A:第一表面 20B:第二表面(背面) 30:剝離襯墊 31,32:剝離襯墊 50:附剝離襯墊之黏著片材 1: Adhesive sheet 2: Adhesive sheet 10: Adhesive layer 10A: One surface (adhesive surface) 10B: The other surface 20: Substrate 20A: First surface 20B: Second surface (back surface) 30: Peel-off pad 31,32: Peel-off pad 50: Adhesive sheet with peel-off pad
圖1係模式性地示出一實施方式之黏著片材之構成之剖視圖。 圖2係模式性地示出另一實施方式之黏著片材之構成之剖視圖。 FIG1 is a cross-sectional view schematically showing the structure of an adhesive sheet in one embodiment. FIG2 is a cross-sectional view schematically showing the structure of an adhesive sheet in another embodiment.
1:黏著片材 1: Adhesive sheet
10:黏著劑層 10: Adhesive layer
10A:一表面(黏著面) 10A: One surface (adhesive surface)
10B:另一表面 10B: Another surface
31,32:剝離襯墊 31,32: Peel off the liner
50:附剝離襯墊之黏著片材 50: Adhesive sheet with peel-off liner
Claims (6)
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| JP (1) | JPWO2024106385A1 (en) |
| KR (1) | KR20250109749A (en) |
| CN (1) | CN120202267A (en) |
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| TW221061B (en) * | 1991-12-31 | 1994-02-11 | Minnesota Mining & Mfg | |
| JPH07193032A (en) * | 1993-12-27 | 1995-07-28 | Mitsui Toatsu Chem Inc | Method for manufacturing film for backside grinding of semiconductor wafer |
| JPH1017827A (en) * | 1996-07-04 | 1998-01-20 | Sekisui Chem Co Ltd | Press bonding type, pressure-sensitive adhesive double coated sheet |
| JP4066394B2 (en) * | 1998-04-10 | 2008-03-26 | 日本合成化学工業株式会社 | Removable adhesive |
| JP5201768B2 (en) * | 1999-06-14 | 2013-06-05 | 日東電工株式会社 | Re-peelable pressure-sensitive adhesive and re-peelable pressure-sensitive adhesive sheet |
| JP2001240842A (en) * | 2000-02-28 | 2001-09-04 | Nitto Denko Corp | UV-curable pressure-sensitive adhesive composition and pressure-sensitive adhesive sheets |
| JP2003183596A (en) * | 2001-12-25 | 2003-07-03 | Nitto Denko Corp | Method for producing adhesive tape and adhesive tape |
| JP6261115B2 (en) | 2013-09-19 | 2018-01-17 | 日東電工株式会社 | Adhesive sheet |
| KR102573795B1 (en) * | 2017-08-08 | 2023-09-01 | 미쯔비시 케미컬 주식회사 | Photocurable PSA Sheet, Photocurable PSA Sheet Laminate, Method for Manufacturing Photocurable PSA Sheet Laminate, and Method for Manufacturing Image Display Panel Laminate |
| JP6927114B2 (en) * | 2018-03-27 | 2021-08-25 | 三菱ケミカル株式会社 | Adhesive composition and adhesive sheet |
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