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TW202305050A - Powder, production method therefor, and resin composition production method - Google Patents

Powder, production method therefor, and resin composition production method Download PDF

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TW202305050A
TW202305050A TW111112560A TW111112560A TW202305050A TW 202305050 A TW202305050 A TW 202305050A TW 111112560 A TW111112560 A TW 111112560A TW 111112560 A TW111112560 A TW 111112560A TW 202305050 A TW202305050 A TW 202305050A
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江上美紀
谷口正展
荒金宏忠
村口良
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日商日揮觸媒化成股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K7/00Use of ingredients characterised by shape
    • C08K7/22Expanded, porous or hollow particles
    • C08K7/24Expanded, porous or hollow particles inorganic
    • C08K7/26Silicon- containing compounds
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/187Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates
    • C01B33/193Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates of aqueous solutions of silicates
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/34Silicon-containing compounds
    • C08K3/36Silica
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00Compositions of unspecified macromolecular compounds

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Abstract

The present invention relates to a powder including hollow particles, each having a cavity inside a non-porous outer shell. The powder has an average particle size (D50) of 1.0-10.0 [mu]m, and contains fine particles of a particle size under 1.0 [mu]m in the amount of 10 vol% or less and coarse particles of a particle size over 8.0 [mu]m in the amount of 20 vol% or less. When the powder is suspended in water, the proportions of floating particles, suspended particles, and settled particles are 0.5-15.0 mass%, 0-4.0 mass%, and 81.0-99.5 mass%, respectively.

Description

粉體及其製造方法、以及樹脂組合物的製造方法Powder, method for producing same, and method for producing resin composition

本發明涉及適於作為半導體絕緣材料的填充物的粉體。特別地,涉及包含無孔外殼的內部具有空腔的空心顆粒的粉體。The present invention relates to powders suitable as fillers for semiconductor insulating materials. In particular, it relates to powders comprising hollow particles with cavities inside a non-porous shell.

近年來,資訊通訊向高速·大容量化發展。因此,用於通訊設備的材料要求低介電常數(低Dk)和低介電耗損正切(誘電正接)(低Df)。例如,在安裝半導體元件的印刷布線板上要求具有低介電常數和低介電耗損正切的絕緣材料。如果絕緣材料的介電常數高,則會產生介電損耗。此外,如果絕緣材料的介電耗損正切高,則不僅會造成介電損耗,還有可能增加發熱量。In recent years, information communication has developed toward high speed and large capacity. Therefore, materials used in communication equipment require low dielectric constant (low Dk) and low dielectric loss tangent (dielectric positive connection) (low Df). For example, insulating materials having a low dielectric constant and a low dielectric loss tangent are required on printed wiring boards on which semiconductor elements are mounted. If the dielectric constant of the insulating material is high, dielectric loss will occur. In addition, if the dielectric loss tangent of the insulating material is high, not only will it cause dielectric loss, but it may also increase the heat generation.

為了實現絕緣材料的低介電常數化和低介電耗損正切化,正在開發作為絕緣材料主體的樹脂材料。作為這樣的樹脂材料,提出了環氧類樹脂、聚苯醚類樹脂、氟類樹脂等(例如參見專利文獻1~專利文獻5)。In order to achieve lower dielectric constant and lower dielectric loss tangent of insulating materials, resin materials are being developed as the main body of insulating materials. As such resin materials, epoxy-based resins, polyphenylene ether-based resins, fluorine-based resins, and the like have been proposed (for example, see Patent Document 1 to Patent Document 5).

對於這樣的樹脂材料,從耐久性(剛性)和耐熱性等觀點來看會添加填充物。作為填充物,已知使用二氧化矽、氮化硼、滑石、高嶺土、黏土、雲母、氧化鋁、氧化鋯、二氧化鈦等金屬氧化物(例如參見專利文獻3)。Fillers are added to such resin materials from the viewpoint of durability (rigidity) and heat resistance. Metal oxides such as silica, boron nitride, talc, kaolin, clay, mica, alumina, zirconia, and titania are known to be used as fillers (for example, see Patent Document 3).

專利文獻 專利文獻1:WO2009/041137號 專利文獻2:日本特表2006-516297號公報 專利文獻3:日本特開2017-057352號公報 專利文獻4:日本特開2001-288227號公報 專利文獻5:日本特開2019-172962號公報 patent documents Patent Document 1: WO2009/041137 Patent Document 2: Japanese PCT Publication No. 2006-516297 Patent Document 3: Japanese Patent Laid-Open No. 2017-057352 Patent Document 4: Japanese Patent Laid-Open No. 2001-288227 Patent Document 5: Japanese Patent Laid-Open No. 2019-172962

在作為填充物使用的材料中,二氧化矽在低介電常數和低介電耗損正切方面優異。然而,由於資料通訊的大容量化和高速處理化在急速發展,因此進一步要求低介電常數化和低介電耗損正切化。此外,對於填充物,還要求在絕緣材料製造過程中不妨礙用於形成絕緣材料的液體的過濾性和注入性。Among materials used as a filler, silicon dioxide is excellent in low dielectric constant and low dielectric loss tangent. However, due to the rapid development of large-capacity and high-speed processing of data communication, low dielectric constant and low dielectric loss tangent are further required. In addition, for the filler, it is also required that the filterability and injectability of the liquid used to form the insulating material are not hindered during the insulating material manufacturing process.

本發明的發明人發現,不含微小顆粒和粗顆粒且滿足規定條件的空心顆粒可以實現絕緣材料的低介電常數化和低介電耗損正切化,並且在絕緣材料製造過程中不妨礙用於形成絕緣材料的液體的過濾性和注入性。The inventors of the present invention have found that hollow particles that do not contain fine particles and coarse particles and satisfy the specified conditions can achieve low dielectric constant and low dielectric loss tangent of insulating materials, and do not hinder the use in the manufacturing process of insulating materials. Filterability and injectability of liquids forming insulating materials.

即,本發明所述的粉體包含無孔外殼的內部具有空腔的空心顆粒,平均粒徑(D50)為1.0μm~10.0μm、粒徑小於1.0μm的微小顆粒的含量在10體積%以下,粒徑大於8.0μm的粗顆粒的含量在20體積%以下。當該粉體懸浮在水中時,漂浮顆粒為0.5質量%~15.0質量%、懸浮顆粒為0~4.0質量%、沉降顆粒為81.0質量%~99.5質量%。That is, the powder according to the present invention includes hollow particles with a cavity inside the non-porous shell, the average particle diameter (D50) is 1.0 μm to 10.0 μm, and the content of fine particles with a particle diameter of less than 1.0 μm is less than 10% by volume , the content of coarse particles with a particle size larger than 8.0 μm is 20% by volume or less. When the powder is suspended in water, the floating particles are 0.5% to 15.0% by mass, the suspended particles are 0% to 4.0% by mass, and the settled particles are 81.0% to 99.5% by mass.

此外,本發明所述的粉體的製造方法具有以下工序:將矽酸鹼水溶液在熱風氣流中進行噴霧乾燥來製備顆粒的第一工序;除去顆粒中所含的鹼的第二工序;以及,對除去鹼的顆粒進行燒製的第三工序,在第一工序和第三工序之間設置有除去粒徑小於1.0μm的微小顆粒和粒徑大於8.0μm的粗顆粒的分級工序。In addition, the manufacturing method of the powder according to the present invention has the following steps: the first step of spray-drying the silicic acid alkali aqueous solution in the hot air flow to prepare particles; the second step of removing the alkali contained in the particles; and, In the third step of firing the alkali-removed particles, a classification step is provided between the first step and the third step to remove fine particles with a particle diameter of less than 1.0 μm and coarse particles with a particle diameter of greater than 8.0 μm.

本發明的粉體能夠實現絕緣材料的低介電常數化和低介電耗損正切化,進而能夠實現半導體傳輸速度的高速化和傳輸損耗的降低。此外,在半導體製造過程中不會妨礙用於形成絕緣材料的液體的過濾性和注入性,可以穩定地製造優異的絕緣材料。The powder of the present invention can achieve low dielectric constant and low dielectric loss tangent of insulating materials, and further can realize high-speed transmission of semiconductors and reduction of transmission loss. In addition, the filterability and injectability of the liquid used to form the insulating material are not hindered during the semiconductor manufacturing process, and an excellent insulating material can be stably produced.

本發明的粉體包含無孔外殼的內部具有空腔的空心顆粒,平均粒徑為1.0μm~10.0μm。進一步地,粒徑小於1.0μm的顆粒(以下,微小顆粒)的含量在10體積%以下,粒徑大於8.0μm的顆粒(以下,粗顆粒)的含量在20體積%以下。當該粉體懸浮在水中時,漂浮顆粒為0.5質量%~15.0質量%、懸浮顆粒為0~4.0質量%、沉降顆粒為81.0質量%~99.5質量%。在本發明的粉體中,除空心顆粒之外還可能含有少量的實心顆粒。這是因為在製造空心顆粒時,有可能偶然地製作出實心顆粒。由於內部沒有空腔的實心顆粒的比重大,因此基本上認為是潛在於沉降顆粒中。優選粉體中包含的顆粒的90質量%以上為空心顆粒。The powder of the present invention comprises hollow particles with a cavity inside the non-porous shell, and the average particle diameter is 1.0 μm-10.0 μm. Furthermore, the content of particles with a particle diameter of less than 1.0 μm (hereinafter, fine particles) is less than 10 volume %, and the content of particles with a particle diameter of greater than 8.0 μm (hereinafter, coarse particles) is less than 20 volume %. When the powder is suspended in water, the floating particles are 0.5% to 15.0% by mass, the suspended particles are 0% to 4.0% by mass, and the settled particles are 81.0% to 99.5% by mass. In the powder of the present invention, besides the hollow particles, a small amount of solid particles may also be contained. This is because it is possible to accidentally produce solid particles when hollow particles are produced. Since solid particles without cavities have a large specificity, they are basically considered to be latent in sedimentation particles. Preferably, 90% by mass or more of the particles contained in the powder are hollow particles.

在本文中,將懸浮於水中時在水中分散的顆粒作為懸浮顆粒,將漂浮在上層(水面附近)而存在的比重輕的顆粒作為漂浮顆粒。這樣的漂浮顆粒通常具有高空隙率。因此,如果添加在樹脂材料中的漂浮顆粒增多,則樹脂產品的介電常數和介電耗損正切降低。Herein, particles dispersed in water when suspended in water are referred to as suspended particles, and particles having a light specific gravity floating in the upper layer (near the water surface) are referred to as floating particles. Such floating particles generally have a high porosity. Therefore, if the number of floating particles added to the resin material increases, the dielectric constant and dielectric loss tangent of the resin product decrease.

此外,通過減少微小顆粒的含量(10體積%以下),所有顆粒的總表面積變小。結果,由於SiOH基團的量變少,因此可以降低介電常數、介電損耗正切化。另外,微小顆粒少的粉體的附著性變低,流動性提高。因此,提高了處理性和分散性。微小顆粒的含量優選在8體積%以下、較優選在5體積%以下、進一步優選在3體積%以下、最優選在1體積%以下。Furthermore, by reducing the content of fine particles (less than 10% by volume), the total surface area of all particles becomes smaller. As a result, since the amount of SiOH groups decreases, the dielectric constant can be reduced and the dielectric loss tangent can be reduced. In addition, powders with few fine particles have low adhesiveness and improved fluidity. Therefore, handling and dispersibility are improved. The content of fine particles is preferably 8% by volume or less, more preferably 5% by volume or less, further preferably 3% by volume or less, and most preferably 1% by volume or less.

此外,通過減少粉體中含有的粗顆粒(20體積%以下),添加有粉體的樹脂組合物具有良好的過濾性、注入性。因此,由該樹脂組合物成型的樹脂成型物(樹脂產品)具有良好的表面平滑性。進一步地,將漂浮顆粒的量控制為0.5質量%~15.0質量%。漂浮顆粒通常空隙率高,空隙率高的空心顆粒通常粒徑大。因此,控制(減少)漂浮顆粒的量變為控制(減少)粗顆粒的量。粗顆粒的含量優選在15體積%以下、較優選在10體積%以下、進一步優選在5體積%以下、最優選在1體積%以下。In addition, by reducing the coarse particles (20% by volume or less) contained in the powder, the resin composition added with the powder has good filterability and injectability. Therefore, a resin molded article (resin product) molded from this resin composition has good surface smoothness. Further, the amount of floating particles is controlled to be 0.5% by mass to 15.0% by mass. Floating particles usually have a high porosity, and hollow particles with a high porosity usually have a large particle size. Therefore, controlling (reducing) the amount of floating particles becomes controlling (reducing) the amount of coarse particles. The content of coarse particles is preferably less than 15% by volume, more preferably less than 10% by volume, further preferably less than 5% by volume, and most preferably less than 1% by volume.

由於漂浮顆粒的外殼厚度(t)和粒徑(d)的比值(t/d)小,因此有顆粒強度降低的傾向。因此,從將樹脂材料和顆粒混合的工序到使樹脂產品成型之間(即,製造過程中),顆粒有破裂的可能。破裂的顆粒在妨礙低介電常數化和低介電耗損正切化的同時,也會使樹脂組合物的流動性變差,成為降低樹脂產品(成型物)均勻性、使樹脂產品的內部產生孔隙的原因。然而,通過控制漂浮顆粒的量,能夠抑制顆粒的破裂。Since the ratio (t/d) of the shell thickness (t) to the particle diameter (d) of the floating particles is small, there is a tendency for particle strength to decrease. Therefore, there is a possibility that the pellets are broken between the process of mixing the resin material and the pellets to molding the resin product (ie, during the manufacturing process). Cracked particles hinder the low dielectric constant and low dielectric loss tangent, and also deteriorate the fluidity of the resin composition, which reduces the uniformity of the resin product (molded product) and creates pores inside the resin product. s reason. However, by controlling the amount of floating particles, the breakage of the particles can be suppressed.

此外,通過控制漂浮顆粒的量,可以在確保高空隙率顆粒所具有的優選特性(例如低介電常數化和低介電耗損正切化)的同時,將高空隙率顆粒所具有的非優選特性(例如破裂的產生)抑制至不存在問題的程度。漂浮顆粒中存在即使直徑小、空隙率也高的顆粒,這樣的顆粒與大直徑顆粒相比在製造過程中不容易產生破裂,整體上能夠極力抑制高空隙率顆粒所具有的非優選特性。漂浮顆粒的含量優選為0.5質量%~14.0質量%、較優選為0.5質量%~13.0質量%、進一步優選為0.5質量%~12.0質量%。此外,沉降顆粒的含量優選為82.0質量%~99.5質量%、較優選為83.0質量%~99.5質量%、進一步優選為84.0~99.5質量%。In addition, by controlling the amount of floating particles, it is possible to reduce the non-preferred properties of high-voidity particles while ensuring the preferred properties of high-voidity particles (such as low dielectric constant and low dielectric loss tangent). (such as the generation of cracks) is suppressed to the extent that it is not a problem. Floating particles include particles with a small diameter and high porosity. Compared with large-diameter particles, such particles are less likely to be broken during the manufacturing process, and as a whole, the undesirable characteristics of high-voidity particles can be suppressed as much as possible. The content of the floating particles is preferably 0.5% by mass to 14.0% by mass, more preferably 0.5% by mass to 13.0% by mass, even more preferably 0.5% by mass to 12.0% by mass. In addition, the content of the sedimentation particles is preferably 82.0% by mass to 99.5% by mass, more preferably 83.0% by mass to 99.5% by mass, and even more preferably 84.0% to 99.5% by mass.

此外,粉體的平均粒徑(D50)在1.0μm~10.0μm的範圍內。在平均粒徑小於1.0μm的情況下,由於富含微小顆粒,因此比表面積變高(高的SiOH基團含量),難以獲得優異的介電特性。此外,平均粒徑大於10μm的粉體不適合用於半導體用途。在半導體用途的情況下,平均粒徑優選為1.5μm~10.0μm、較優選為2.0μm~5.0μm。In addition, the average particle diameter (D50) of the powder is in the range of 1.0 μm to 10.0 μm. In the case where the average particle diameter is less than 1.0 μm, since fine particles are abundant, the specific surface area becomes high (high SiOH group content), and it is difficult to obtain excellent dielectric characteristics. In addition, powders with an average particle size larger than 10 μm are not suitable for semiconductor applications. In the case of semiconductor applications, the average particle diameter is preferably 1.5 μm to 10.0 μm, more preferably 2.0 μm to 5.0 μm.

此外,最大粒徑(D100)優選為50μm以下、較優選為40μm以下、進一步優選為30μm以下。最大粒徑(D100)優選為平均粒徑(D50)的10倍以下、較優選為8倍以下。通常為2倍以上,如果滿足本發明的要求,也可以大於5倍。In addition, the maximum particle diameter (D100) is preferably 50 μm or less, more preferably 40 μm or less, further preferably 30 μm or less. The maximum particle diameter (D100) is preferably 10 times or less, more preferably 8 times or less, the average particle diameter (D50). Usually more than 2 times, if the requirements of the present invention are met, it can also be more than 5 times.

進一步地,粉體的粒度變異係數(CV值)合適地在60%以下。由此,在添加到樹脂材料中的情況下,能夠穩定地實現低介電常數化和低介電損耗正切化。此外,能夠實現樹脂產品的表面平滑性的提高。粒度變異係數較優選在55%以下、進一步優選在50%以下。Further, the particle size variation coefficient (CV value) of the powder is suitably below 60%. Accordingly, when added to a resin material, low dielectric constant and low dielectric loss tangent can be stably realized. In addition, improvement of the surface smoothness of the resin product can be achieved. The particle size coefficient of variation is more preferably 55% or less, more preferably 50% or less.

粉體的空隙率優選為10體積%以上、較優選為20體積%以上、進一步優選為30體積%以上。此外,優選為70體積%以下、較優選為60體積%以下、進一步優選為50體積%以下、最優選為40體積%以下。通過這樣的間隙率,能夠在實現低介電常數化和低介電耗損正切化的同時,將顆粒強度保持在規定以上,有效地抑制顆粒的破裂。The porosity of the powder is preferably 10% by volume or more, more preferably 20% by volume or more, and still more preferably 30% by volume or more. In addition, it is preferably 70% by volume or less, more preferably 60% by volume or less, further preferably 50% by volume or less, and most preferably 40% by volume or less. With such a porosity, it is possible to achieve a low dielectric constant and a low dielectric loss tangent, maintain the particle strength at a predetermined level or more, and effectively suppress the cracking of the particles.

在本文中,對於構成粉體的顆粒,以二氧化矽為主成分的二氧化矽類顆粒是適合的。因此,除二氧化矽之外,粉體中所含的空心顆粒(外殼)還可以含有氧化鋁、氧化鋯、二氧化鈦等無機氧化物。顆粒中的二氧化矽的含量優選在70質量%以上、較優選在90質量%以上、進一步優選在95質量%以上、特別優選實質上僅由二氧化矽構成。Herein, silica-based particles containing silica as a main component are suitable for the particles constituting the powder. Therefore, in addition to silica, the hollow particles (shell) contained in the powder may also contain inorganic oxides such as alumina, zirconia, and titania. The content of silicon dioxide in the particles is preferably at least 70% by mass, more preferably at least 90% by mass, further preferably at least 95% by mass, and particularly preferably composed substantially only of silicon dioxide.

[樹脂組合物][resin composition]

通過添加上述粉體和樹脂材料來製備樹脂組合物。這樣的樹脂組合物是半導體等電子材料的絕緣材料等,具體而言,可以用於形成印刷布線板(包括剛性基板和可撓性基板)的覆銅積層板、半固化片(プリプレグ)、堆積膜(ビルドアップフィルム)等。此外,可以用於模壓樹脂(モールド樹脂)、模壓底部填充劑(モールドアンダーフィル)、底部填充劑(アンダーフィル)等半導體封裝相關材料和可撓性基板用黏接劑等。A resin composition is prepared by adding the above powder and resin material. Such a resin composition is an insulating material for electronic materials such as semiconductors, etc. Specifically, it can be used for copper-clad laminates, prepregs, and build-up films that form printed wiring boards (including rigid substrates and flexible substrates). (Birdapp film) and so on. In addition, it can be used in materials related to semiconductor packaging such as mold resins, mold underfills, underfills, and adhesives for flexible substrates.

作為樹脂,可以使用一般用於半導體等電子材料的固化性樹脂。也可以是光固化樹脂,但優選為熱固化樹脂。作為固化性樹脂,可以舉出環氧類樹脂、聚苯醚類樹脂、氟類樹脂、聚醯亞胺類樹脂、雙順丁烯二醯亞胺類樹脂、丙烯酸類樹脂、甲基丙烯酸類樹脂、矽酮類樹脂、BT樹脂、氰酸酯類樹脂等。進一步地,作為環氧類樹脂,可以舉例示出雙酚型環氧樹脂、酚醛清漆型環氧樹脂、三酚基甲烷型環氧樹脂、具有聯苯骨架的環氧樹脂、具有萘骨架的環氧樹脂、雙環戊二烯苯酚酚醛清漆樹脂、苯酚芳烷基型環氧樹脂、縮水甘油酯型環氧樹脂、脂環式環氧樹脂、雜環型環氧樹脂、鹵代環氧樹脂等。這些樹脂可以單獨使用,也可以兩種以上混合使用。As the resin, curable resins generally used in electronic materials such as semiconductors can be used. A photocurable resin may also be used, but a thermally curable resin is preferable. Examples of curable resins include epoxy resins, polyphenylene ether resins, fluororesins, polyimide resins, bismaleimide resins, acrylic resins, and methacrylic resins. , Silicone resin, BT resin, cyanate resin, etc. Furthermore, examples of epoxy resins include bisphenol-type epoxy resins, novolac-type epoxy resins, trisphenol-methane-type epoxy resins, epoxy resins having a biphenyl skeleton, and cyclic epoxy resins having a naphthalene skeleton. Oxygen resin, dicyclopentadiene phenol novolac resin, phenol aralkyl type epoxy resin, glycidyl ester type epoxy resin, alicyclic epoxy resin, heterocyclic type epoxy resin, halogenated epoxy resin, etc. These resins may be used alone or in combination of two or more.

在樹脂組合物中,優選以10/100~95/100的質量比(A/B)包含粉體A和固化性樹脂B。由此,能夠在維持流動性等樹脂組合物的特性的同時,充分發揮作為填充物的功能。質量比(A/B)較優選為30/100~80/100。In the resin composition, the powder A and the curable resin B are preferably contained in a mass ratio (A/B) of 10/100 to 95/100. Thereby, the function as a filler can fully be exhibited, maintaining the characteristic of a resin composition, such as fluidity. The mass ratio (A/B) is more preferably 30/100 to 80/100.

進一步地,樹脂組合物優選含有酚類化合物、胺化合物、酸酐等固化劑。在使用環氧樹脂作為固化性樹脂的情況下,作為固化劑,可以舉出1分子中具有2個以上酚性羥基的樹脂(雙酚型樹脂、酚醛清漆型樹脂、三酚基甲烷型樹脂、甲階型酚醛樹脂、苯酚芳烷基樹脂、聯苯型酚醛樹脂、萘型酚醛樹脂、環戊二烯型酚醛樹脂等酚醛樹脂)和甲基六氫鄰苯二甲酸、甲基四氫鄰苯二甲酸、甲基納迪克酸酐等的酸酐。根據需要,可以在樹脂組合物中添加各種添加劑(著色劑、應力緩和劑、消泡劑、流平劑、偶聯劑、阻燃劑、固化促進劑等)。Furthermore, the resin composition preferably contains curing agents such as phenolic compounds, amine compounds, and acid anhydrides. In the case of using an epoxy resin as the curable resin, examples of the curing agent include resins having two or more phenolic hydroxyl groups in one molecule (bisphenol-type resins, novolac-type resins, trisphenol-methane-type resins, Resole type phenolic resin, phenol aralkyl resin, biphenyl type phenolic resin, naphthalene type phenolic resin, cyclopentadiene type phenolic resin and other phenolic resins) and methyl hexahydrophthalic acid, methyl tetrahydrophthalic acid Anhydrides such as dicarboxylic acid and methylnadic anhydride. Various additives (colorants, stress relieving agents, defoamers, leveling agents, coupling agents, flame retardants, curing accelerators, etc.) can be added to the resin composition as needed.

樹脂組合物的製造方法可以應用以往已知的方法。例如,混合固化性樹脂、粉體、固化劑、添加劑等,用輥壓機等進行混煉。將得到的樹脂組合物塗布在基底上,通過熱、紫外線等使其固化。As a method for producing the resin composition, conventionally known methods can be applied. For example, curable resin, powder, curing agent, additives, etc. are mixed and kneaded with a roller press or the like. The obtained resin composition is coated on a substrate, and cured by heat, ultraviolet rays, or the like.

[粉體的製造方法][Manufacturing method of powder]

本發明的粉體的製造方法具有以下工序:將矽酸鹼水溶液在熱風氣流中進行噴霧乾燥來製備顆粒的第一工序;除去所製備的顆粒中所含的鹼的第二工序;以及,對除去鹼的顆粒進行燒製的第三工序,在第一工序和第三工序之間設置有對顆粒進行分級以除去粒徑小於1.0μm的微小顆粒和粒徑大於8.0μm的粗顆粒的工序(分級工序)。另外,也可以在各工序之間設置乾燥工序等其它工序。通過這樣的工序,能夠得到上述粉體。The manufacturing method of the powder of the present invention has the following steps: the first step of spray-drying the silicic acid alkali aqueous solution in the hot air flow to prepare the particles; the second step of removing the alkali contained in the prepared particles; and, In the third step of firing the particles with alkali removed, there is a step of classifying the particles between the first step and the third step to remove fine particles with a particle size of less than 1.0 μm and coarse particles with a particle size of more than 8.0 μm ( grading process). Moreover, other processes, such as a drying process, may be provided between each process. Through such steps, the above-mentioned powder can be obtained.

一般認為,在通過燒製對顆粒進行製造的情況下,為了調整粒徑,優選在燒製後進行分級處理。然而,在本文中,特意在燒製前進行分級處理。在不進行分級處理而進行燒製工序的情況下,燒製在存在應去除的微小顆粒的狀態下進行,微小顆粒會與其它顆粒一起燒結。因此,之後進行分級處理也不能去除微小顆粒。此外,還存在應去除的高空隙率的粗顆粒。由於該高空隙率的粗顆粒容易破裂,因此有可能會因加熱引起的收縮應力等而破裂。由破裂產生的碎片是沒有空隙的緻密二氧化矽,因此會妨礙低介電常數化·低介電損耗正切化。如果在燒製之前進行分級處理,則可以避免這些不良情況。因此,能夠更可靠地實現顆粒的低介電常數化·低介電耗損正切化,得到與資料通訊高速化相符合的顆粒。另外,也可以在燒製後再次進行分級處理。以下詳細說明各工序。It is generally considered that, in the case of producing pellets by firing, it is preferable to perform a classification treatment after firing in order to adjust the particle size. In this context, however, the classification process is intentionally performed prior to firing. In the case where the firing process is performed without classifying, the firing is carried out in a state where there are fine particles to be removed, and the fine particles are sintered together with other particles. Therefore, the subsequent classification treatment cannot remove fine particles. In addition, there are coarse particles with high void ratio that should be removed. Since the coarse particles with a high porosity are easily broken, they may be broken due to shrinkage stress or the like caused by heating. Fragments generated by cracking are dense silicon dioxide without voids, which prevents low dielectric constant and low dielectric loss tangent. These undesirable conditions can be avoided if grading is done prior to firing. Therefore, the low dielectric constant and low dielectric loss tangent of the particles can be realized more reliably, and the particles corresponding to the high-speed data communication can be obtained. In addition, classification treatment may be performed again after firing. Each step will be described in detail below.

(第一工序)(first process)

在該工序中,將矽酸鹼水溶液在熱風氣流中進行噴霧乾燥,造粒得到二氧化矽類顆粒。另外,該工序是為了得到空心顆粒而進行的,但很難將所有顆粒變成空心顆粒,因此在造粒得到的二氧化矽類顆粒中,有可能最終也含有實心顆粒。在這種情況下,經過後述的工序得到的粉體中也包含實心顆粒。然而,如果粉體具有上述特性,則即使包含實心顆粒,也能得到期待的效果。In this process, the silicic acid alkali aqueous solution is spray-dried in a hot air flow, and granulated to obtain silica-based particles. In addition, this step is performed to obtain hollow particles, but it is difficult to turn all the particles into hollow particles, so the silica-based particles obtained by granulation may eventually contain solid particles. In this case, solid particles are also included in the powder obtained through the steps described later. However, if the powder has the above characteristics, even if it contains solid particles, the desired effect can be obtained.

矽酸鹼的SiO 2和M 2O(M為鹼金屬)的莫耳比(SiO 2/M 2O)優選為1~5,較優選為2~4。當該莫耳比小於1時,由於鹼量過多,即使在鹼除去工序中進行酸清洗,也很難完全將其除去。進一步地,由於噴霧乾燥品的潮解性變大,難以得到所期望的空心顆粒。當該莫耳比大於5時,矽酸鹼的可溶性降低,難以製備水溶液。即使能夠製備水溶液,也有通過噴霧乾燥不能形成空心顆粒的情況。 The molar ratio (SiO 2 /M 2 O) of SiO 2 and M 2 O (M is an alkali metal) of the silicic acid base is preferably 1-5, more preferably 2-4. When the molar ratio is less than 1, since the amount of alkali is too large, it is difficult to completely remove it even if acid cleaning is performed in the alkali removal step. Furthermore, since the deliquescent property of the spray-dried product becomes large, it is difficult to obtain the desired hollow particles. When the molar ratio is greater than 5, the solubility of the silicate base decreases, making it difficult to prepare an aqueous solution. Even if an aqueous solution can be prepared, there are cases where hollow particles cannot be formed by spray drying.

作為矽酸鹼水溶液的SiO 2的濃度優選為1質量%~30質量%、較優選為5質量%~28質量%。即使小於1質量%也可以製造,但生產性顯著降低。如果大於30質量%,則作為矽酸鹼水溶液的穩定性會顯著降低,變為高黏性,有時不能噴霧乾燥。即使可以噴霧乾燥,也有粒徑分布、外殼厚度等變得極不均勻、得到的顆粒的用途受到限制的情況。作為矽酸鹼,可以使用在水中可溶的矽酸鈉、矽酸鉀。優選矽酸鈉。 The concentration of SiO 2 as the silicic acid alkali aqueous solution is preferably 1% by mass to 30% by mass, more preferably 5% by mass to 28% by mass. Even if it is less than 1% by mass, it can be produced, but the productivity is remarkably lowered. If it is more than 30% by mass, the stability as a silicic acid alkali aqueous solution will be remarkably reduced, and it will become highly viscous, and spray drying may not be possible. Even if spray drying is possible, there are cases where the particle size distribution, shell thickness, etc. become extremely non-uniform, and the use of the obtained particles is limited. As the silicate base, sodium silicate and potassium silicate which are soluble in water can be used. Sodium silicate is preferred.

作為噴霧乾燥方法,例如,可以採用旋轉盤法、加壓噴嘴法、雙流體噴嘴法等以往已知的方法。在本文中,雙流體噴嘴法是合適的。As the spray drying method, conventionally known methods such as a rotating disk method, a pressurized nozzle method, and a two-fluid nozzle method can be used, for example. In this context, the two-fluid nozzle method is suitable.

在噴霧乾燥中,噴霧乾燥器的入口溫度優選為300℃~600℃,較優選為350℃~550℃。此外,出口溫度優選為120℃~300℃,較優選為130℃~250℃。通過這樣的溫度設定,可以穩定地獲得空心顆粒。In spray drying, the inlet temperature of the spray dryer is preferably 300°C to 600°C, more preferably 350°C to 550°C. In addition, the outlet temperature is preferably 120°C to 300°C, more preferably 130°C to 250°C. Through such temperature setting, hollow particles can be stably obtained.

(第二工序)(second process)

接著,除去在第一工序中造粒得到的顆粒中所含的鹼。通過加入酸中和來除去的方法是適合的。優選將顆粒浸漬在酸溶液中進行處理。此時,酸的莫耳數(Ma)和顆粒中的M 2O莫耳數(Msp)的莫耳比(Ma/Msp)優選為0.6~4.7、進一步優選為1~4.5。在該莫耳比小於0.6的情況下,酸的量相對於M 2O過少。因此,不會進行認為在除去鹼的同時會發生的矽酸的二氧化矽骨架化,顆粒會部分溶解,存在溶解的矽酸鹼會凝膠化的情況。即使莫耳比大於4.7,二氧化矽骨架化也不會進一步進行,過量酸並不經濟。 Next, the alkali contained in the granules obtained by granulating in the first step is removed. A method of neutralization by addition of acid is suitable. The treatment is preferably carried out by immersing the particles in an acid solution. In this case, the molar ratio (Ma/Msp) of the molar number (Ma) of the acid to the molar number (Msp) of M 2 O in the particles is preferably 0.6 to 4.7, more preferably 1 to 4.5. When the molar ratio is less than 0.6, the amount of acid is too small relative to M 2 O. Therefore, the silica skeletonization of silicic acid, which is thought to occur simultaneously with the alkali removal, does not proceed, the particles are partially dissolved, and the dissolved silicic acid alkali may be gelled. Even if the molar ratio exceeds 4.7, the skeletonization of silica will not proceed further, and excess acid is not economical.

此外,優選使顆粒的濃度(以SiO 2計)為1質量%~30質量%而浸漬在酸水溶液中。在小於1質量%的情況下,鹼除去和清洗性雖沒有問題,但製造效率降低。如果大於30質量%則濃度過濃,鹼除去、清洗效率會降低。進一步優選為5質量%~25質量%。 In addition, it is preferable to immerse the particles in an aqueous acid solution so that the concentration (calculated as SiO 2 ) of the particles is 1% by mass to 30% by mass. When it is less than 1% by mass, there is no problem in alkali removal and cleaning properties, but production efficiency decreases. If it exceeds 30% by mass, the concentration will be too thick, and the alkali removal and cleaning efficiency will decrease. More preferably, it is 5 mass % - 25 mass %.

向酸水溶液中浸漬的條件只要能將鹼除去到所期望的量就不受到特別限制,通常處理溫度為5℃~100℃,處理時間為0.5小時~24小時。浸漬處理後,優選用以往已知的方法進行清洗。例如,用純水過濾清洗。另外,也可以根據需要反復進行上述酸處理和清洗。The conditions for immersion in the aqueous acid solution are not particularly limited as long as the alkali can be removed to a desired amount, but usually the treatment temperature is 5°C to 100°C, and the treatment time is 0.5 hours to 24 hours. After the immersion treatment, washing is preferably performed by a conventionally known method. For example, filter and wash with pure water. In addition, the above-mentioned acid treatment and cleaning may be repeated as necessary.

鹼除去後鹼(M)的殘留量(質量比例)優選為300ppm以下、較優選為200ppm以下、進一步優選為100ppm以下。通過在該工序中充分除去鹼,能夠防止在後續工序中顆粒黏著,並防止燒製工序中燒結顆粒的產生。此外,已知鹼的殘留量(含量)影響介電特性。在該工序中通過充分除去鹼,即使在原料中使用矽酸鹼水溶液的情況下,也能夠得到可以低介電常數化和低介電耗損正切化的顆粒。The residual amount (mass ratio) of the base (M) after the base is removed is preferably 300 ppm or less, more preferably 200 ppm or less, further preferably 100 ppm or less. By sufficiently removing the alkali in this step, it is possible to prevent particles from sticking in the subsequent step, and to prevent generation of sintered particles in the firing step. In addition, it is known that the residual amount (content) of the base affects the dielectric properties. By sufficiently removing the alkali in this step, particles capable of lowering the dielectric constant and lowering the dielectric loss tangent can be obtained even when an aqueous alkali solution of silicic acid is used as the raw material.

另外,最終產品(構成粉體的顆粒)的鹼量也優選上述範圍,通常,與鹼除去工序後的鹼量相同。In addition, the alkali amount of the final product (particles constituting the powder) is also preferably within the above-mentioned range, and is usually the same as the alkali amount after the alkali removal step.

鹼殘留量以粉體被酸溶解後的物質為樣品,能夠使用原子吸收分光光度計進行測量。使用矽酸鈉時測量Na,使用矽酸鉀時測量K。具體在實施例中說明。The residual amount of alkali can be measured with an atomic absorption spectrophotometer using the powder dissolved by acid as a sample. Measure Na when using sodium silicate and measure K when using potassium silicate. Specifically described in the embodiment.

作為該工序中使用的酸,可以使用無機酸(鹽酸、硝酸、硫酸等)和有機酸(乙酸、酒石酸、蘋果酸等)。適合使用無機酸,特別優選價數大的硫酸。As the acid used in this step, inorganic acids (hydrochloric acid, nitric acid, sulfuric acid, etc.) and organic acids (acetic acid, tartaric acid, malic acid, etc.) can be used. Inorganic acids are suitably used, and sulfuric acid having a large valency is particularly preferable.

(第三工序)(third process)

接著,對鹼除去處理後的顆粒進行燒製。燒製溫度優選為600℃~1200℃,較優選為900℃~1100℃。在燒製溫度小於600℃的情況下,SiOH基團的殘留量較多,顆粒的介電耗損角正切變高。由此,即使在樹脂中添加也難以得到降低介電耗損正切的效果。在燒製溫度大於1200℃的情況下,顆粒彼此容易燒結在一起,因此容易產生異形顆粒和粗顆粒。這成為樹脂組合物的過濾性和注入性降低的原因。Next, the alkali-removing-treated pellets are fired. The firing temperature is preferably 600°C to 1200°C, more preferably 900°C to 1100°C. When the firing temperature is lower than 600° C., the residual amount of SiOH groups is large, and the dielectric loss tangent of the particles becomes high. Therefore, even if it is added to the resin, it is difficult to obtain the effect of reducing the dielectric loss tangent. When the firing temperature is greater than 1200°C, the particles are easily sintered with each other, so irregular-shaped particles and coarse particles are easily produced. This causes the filterability and injectability of a resin composition to fall.

(分級工序)(grading process)

通過在第一工序和第三工序之間進行分級處理,可以除去微小顆粒和粗顆粒。在鹼除去之前進行分級處理的情況下,為了防止空心顆粒吸濕(潮解)而聚集·黏著,需要在造粒後立即進行分級處理。此外,在燒製前進行分級處理的情況下,也可以在鹼除去處理後繼續進行分級處理。By performing classification treatment between the first step and the third step, fine particles and coarse particles can be removed. When classification treatment is performed before alkali removal, it is necessary to perform classification treatment immediately after granulation in order to prevent hollow particles from agglomerating and sticking due to moisture absorption (deliquescence). In addition, when classification treatment is performed before firing, classification treatment may be continued after the alkali removal treatment.

通過分級工序,使微小顆粒的量減少為10體積%以下。優選為8體積%以下、較優選為5體積%以下、進一步優選為3體積%以下、最優選為1體積%以下。此外,使粗顆粒的量減少為20體積%以下。優選為15體積%以下、較優選為10體積%以下、進一步優選為5體積%以下、最好優選為1體積%以下。通過該分級工序,可以將粉體中存在的漂浮顆粒比例控制在規定範圍內。另外,通常最終產品的微小顆粒和粗顆粒的含量與分級工序後的含量相比沒有太大的變化。Through the classification process, the amount of fine particles is reduced to 10% by volume or less. Preferably it is 8 volume % or less, More preferably, it is 5 volume % or less, More preferably, it is 3 volume % or less, Most preferably, it is 1 volume % or less. In addition, the amount of coarse particles is reduced to 20% by volume or less. It is preferably 15 volume % or less, more preferably 10 volume % or less, further preferably 5 volume % or less, most preferably 1 volume % or less. Through this classification process, the proportion of floating particles present in the powder can be controlled within a predetermined range. In addition, usually the content of fine particles and coarse particles of the final product does not change much compared to the content after the classification process.

該分級工序中分級處理是指以使粉體的粒度一致為目的,根據粒徑將粉體分開的粒度分級。作為該粒度分級的操作,可以舉出流體分級,流體分級可以分為乾式分級和濕式分級。The classification treatment in the classification step refers to particle size classification in which the powder is separated according to the particle size for the purpose of making the particle size of the powder uniform. As the operation of this particle size classification, fluid classification can be mentioned, and fluid classification can be divided into dry classification and wet classification.

乾式分級使用的分級機在原理上可以大致分為重力分級機、慣性分級機、離心分級機。利用慣性分級機和離心分級機可以進行更精密的分級。作為即使對難以施加離心力的輕顆粒也能精密分級的分級機,可以舉出日鐵礦業公司製造的Elbow-Jet(エルボージェット)、日本3M(スリーエム)公司製造的SGセパレーター、日清エンジニアリング公司製造的Aerofine Classifier(エアロファインクラシファイア)、日本PNEUMATIC(ニューマチック)工業公司製造的マイクロスピン。在這些之中,優選Elbow-Jet、Aerofine Classifier。The classifiers used in dry classification can be roughly divided into gravity classifiers, inertial classifiers, and centrifugal classifiers in principle. More precise classification can be carried out using inertial classifiers and centrifugal classifiers. Examples of classifiers that can precisely classify light particles that are difficult to apply centrifugal force include Elbow-Jet manufactured by Nippon Steel Mining Co., Ltd., SG Separator manufactured by 3M Corporation, and Nissin Engineering Co., Ltd. Aerofine Classifier (エアロファインクラシファイア), manufactured by Japan PNEUMATIC (ニューマチック) Industry Co., Ltd., Microspin. Among these, Elbow-Jet and Aerofine Classifier are preferable.

濕式分級中使用的分級機在原理上可大致分為重力分級機、離心分級機。通過使用離心分級機,可以進行更精密的分級。作為即使對難以施加離心力的輕顆粒也能精密分級的分級機,可以舉出日本化學機械工業公司製造的ハイドロサイクロン、村田工業公司製造的スーパークロン、佐竹化學機械工業公司製造的アイクラシファイア。在這些之中,優選アイクラシファイア。根據濕式分級,在進行微小顆粒的除去時,可以一起除去比重小的粗顆粒,可以提高分級效率。Classifiers used in wet classification can be roughly divided into gravity classifiers and centrifugal classifiers in principle. By using a centrifugal classifier, more precise classification can be performed. Examples of classifiers that can precisely classify even light particles that are difficult to apply centrifugal force include Hidro Cyclon manufactured by Nippon Chemical Machinery Co., Ltd., Superclon manufactured by Murata Industries, Ltd., and Aikra Sifia manufactured by Satake Chemical Machinery Co., Ltd. Among these, AIKRASIFIA is preferable. According to wet classification, when removing fine particles, coarse particles with small specific gravity can be removed together, and classification efficiency can be improved.

微小顆粒和粗顆粒的除去可以同時進行,也可以各自分開進行。在各自分開進行時,可以先進行微小顆粒的除去和粗顆粒的除去中的任一者。此外,微小顆粒的除去和粗顆粒的除去的各處理也可以各自分多次進行。The removal of fine particles and coarse particles can be carried out simultaneously or separately. When each is performed separately, either the removal of fine particles or the removal of coarse particles may be performed first. In addition, each treatment of the removal of fine particles and the removal of coarse particles may be divided into multiple times.

此外,也可以在製造工序中適當地設置乾燥處理工序。乾燥處理可以設置在鹼除去處理和分級處理之間、分級處理和燒製之間、同時設置在上述兩處,或者設置在鹼除去處理和燒製之間。可以根據需要設置多次。此外,也可以在燒製前進行乾燥處理,在乾燥處理和燒製之間進行分級處理。為了更好地享受本發明的效果,優選在乾燥處理後進行分級處理並燒製。作為乾燥處理,加熱乾燥是適合的。乾燥溫度優選為50℃~400℃、較優選為50℃~200℃。具體而言,可以舉例示出在50℃~200℃左右的低溫下花費時間使之乾燥的方法、逐漸使溫度上升使之乾燥的方法、把溫度分成幾個階段變化使之乾燥的方法。In addition, a drying treatment step may be appropriately provided in the manufacturing process. The drying treatment may be provided between the alkali removal treatment and the classification treatment, between the classification treatment and firing, at both places, or between the alkali removal treatment and firing. Can be set as many times as needed. In addition, drying treatment may be performed before firing, and classification treatment may be performed between drying treatment and firing. In order to better enjoy the effect of the present invention, it is preferable to carry out classification treatment and firing after drying treatment. As the drying treatment, heat drying is suitable. The drying temperature is preferably 50°C to 400°C, more preferably 50°C to 200°C. Specifically, a method of drying at a low temperature of about 50°C to 200°C over a long period of time, a method of gradually increasing the temperature and drying, and a method of drying by changing the temperature in several steps can be exemplified.

進一步地,優選在乾燥後和燒製後的至少一處設置篩分顆粒塊的篩分處理。另外,顆粒塊例如是指粒徑大於50μm的顆粒塊,適當地使用能夠去除此類顆粒塊的孔徑(目數)的篩子。Further, it is preferable to provide a sieving treatment for sieving the particle lumps at least one of after drying and after firing. In addition, the particle agglomerate refers to, for example, a particle agglomerate having a particle diameter greater than 50 μm, and a sieve having a pore size (mesh number) capable of removing such a particle agglomerate is suitably used.

實施例Example

以下,具體說明本發明的實施例。Hereinafter, examples of the present invention will be specifically described.

[實施例1][Example 1]

用水玻璃水溶液(SiO 2/Na 2O莫耳比3.2、SiO 2濃度24質量%)30000g在入口溫度400℃的熱風中進行噴霧來造粒得到空心顆粒,其中,從兩個流體噴嘴之一以0.62kg/hr的流量供應水玻璃水溶液,從另一個噴嘴以31800L/hr(空/液體積比63600)的流量供應空氣。此時,出口溫度為150℃(第一工序)。在第一工序中,也有造粒得到少量實心顆粒的可能性,但並不需要除去實心顆粒再進入下一工序。 Hollow particles are obtained by spraying 30,000 g of water glass aqueous solution (SiO 2 /Na 2 O molar ratio 3.2, SiO 2 concentration 24% by mass) in hot air at an inlet temperature of 400°C to obtain hollow particles. Water glass aqueous solution is supplied at a flow rate of 0.62kg/hr, and air is supplied at a flow rate of 31800L/hr (air/liquid volume ratio 63600) from another nozzle. At this time, the outlet temperature was 150° C. (first step). In the first process, there is also the possibility of granulating to obtain a small amount of solid particles, but it is not necessary to remove the solid particles before entering the next process.

接著,將該空心顆粒(即,第一工序中造粒得到的顆粒)5000g浸漬到濃度為10質量%的硫酸水溶液32000g中,攪拌15小時。固體成分(SiO 2)濃度為10.2質量%。此外,由於硫酸為二價酸,酸的莫耳數(Ma)和鹼(Na 2O)的莫耳數(Msp)的比值(Ma/Msp)為3.3。分散液的溫度為35℃、pH為3.0。該浸漬處理後,用純水進行過濾清洗(第二工序)。 Next, 5,000 g of the hollow particles (that is, particles obtained by granulation in the first step) were immersed in 32,000 g of a sulfuric acid aqueous solution having a concentration of 10% by mass, and stirred for 15 hours. The solid content (SiO 2 ) concentration was 10.2% by mass. In addition, since sulfuric acid is a divalent acid, the ratio (Ma/Msp) of the number of moles of acid (Ma) to the number of moles of base (Na 2 O) (Msp) is 3.3. The temperature of the dispersion liquid was 35° C., and the pH was 3.0. After this immersion treatment, filter washing is performed with pure water (second step).

接著,用乾燥機在120℃下進行24小時乾燥處理。乾燥後,粉碎並通過孔徑75μm篩子篩分以除去顆粒塊。Next, drying treatment was performed at 120° C. for 24 hours using a drier. After drying, crush and sieve through a 75 μm sieve to remove particle lumps.

接著,使用本公司製造的旋風器(サイクロン),將粉體輸送線的流速設為5m/s,進行乾式離心分級處理(第一分級工序)。用袋式過濾器回收未被旋風器捕獲而通過的顆粒(即,去除了粗顆粒的顆粒)。然後,使用日鐵礦業公司製造的Elbow-Jet(EJ-15)進行乾式慣性分級處理(第二分級工序)。如果採用該裝置進行分級,可分為F粉(微粉)、M粉(細粉)、G粉(粗粉)三種顆粒。此時,調整F邊緣距離,以使F粉(微粉)中所含的微小顆粒在1體積%以下。回收F粉,在以後的工序中使用。Next, dry-type centrifugal classification treatment was performed using a cyclone manufactured by our company at a flow rate of 5 m/s in the powder conveying line (the first classification step). Particles that pass through without being captured by the cyclone (ie, particles with coarse particles removed) are recovered with a bag filter. Then, dry-type inertial classification treatment (second classification process) was performed using Elbow-Jet (EJ-15) manufactured by Nippon Steel Mining Co., Ltd. If this device is used for grading, it can be divided into three kinds of particles: F powder (fine powder), M powder (fine powder) and G powder (coarse powder). At this time, the F edge distance is adjusted so that the fine particles contained in the F powder (fine powder) are 1% by volume or less. Recover F powder for use in subsequent processes.

通過將回收的顆粒在1000℃下加熱處理10小時,得到包含空心顆粒的粉體(第三工序)。另外,燒製後,用孔徑150μm的篩子去除顆粒塊。By heating the recovered particles at 1000° C. for 10 hours, a powder containing hollow particles was obtained (third step). In addition, after firing, lumps of particles were removed with a sieve having a hole diameter of 150 μm.

將得到的粉體與液態酸酐“新日本理化公司製造的リカシッドMH700”、咪唑類環氧樹脂固化劑“四國化成公司製造的2PHZ-PW”一起添加至液態環氧樹脂“日鐵Chemical & Material公司(日鉄ケミカル&マテリアル社)製造的ZX-1059”中。在此,“ZX-1059”以100質量份、“リカシッドMH700”以86質量份、“2PHZ-PW”以1質量份的比例添加,以使添加物的粉體的比例為35體積%。將該添加物用行星研磨機預混煉後,用三根輥進行混練,得到糊劑(樹脂組合物)。將該糊劑在170℃下加熱2小時使其固化,得到了50mm×50mm×1mm的板狀樹脂成型物(樹脂產品)。Add the obtained powder to the liquid epoxy resin "Nippon Steel Chemical & Material Co., Ltd." In the ZX-1059 manufactured by the company (Nippon Tetsu Chemical & Material Co., Ltd.). Here, 100 parts by mass of "ZX-1059", 86 parts by mass of "Rikasid MH700", and 1 part by mass of "2PHZ-PW" were added so that the proportion of the powder of the additives was 35% by volume. This additive was pre-kneaded with a planetary mill, and then kneaded with three rolls to obtain a paste (resin composition). This paste was cured by heating at 170° C. for 2 hours to obtain a plate-shaped resin molded product (resin product) of 50 mm×50 mm×1 mm.

測量和評估如上所述得到的粉體和樹脂成型物的物理性質。其結果與製備條件一起示於表1中。在其它實施例和比較例中也同樣進行。The physical properties of the powders and resin moldings obtained as described above were measured and evaluated. The results are shown in Table 1 together with the preparation conditions. The same was done in other Examples and Comparative Examples.

(1)粒徑、顆粒量以及粒度變異係數(CV值)(1) Particle size, particle amount and particle size variation coefficient (CV value)

使用粒度分析儀(SEISHIN企業公司(セイシン企業社)製造的Laser MicroSizer LMS-3000(レーザーマイクロンサイザーLMS-3000))以乾式測量粉體的粒度分布。根據測量結果,得到體積平均粒徑(D43)、平均粒徑(D50)、最大粒徑(D100)。進一步地,分析該粒度分布,分別計算出大於8.0μm的粗顆粒和小於1.0μm的微小顆粒的體積比例,以作為粗顆粒量和微小顆粒量。The particle size distribution of the powder was measured dry-type using a particle size analyzer (Laser MicroSizer LMS-3000 manufactured by Seishin Corporation). According to the measurement results, the volume average particle diameter (D43), the average particle diameter (D50), and the maximum particle diameter (D100) are obtained. Further, the particle size distribution is analyzed, and the volume ratios of coarse particles larger than 8.0 μm and fine particles smaller than 1.0 μm are calculated as the amount of coarse particles and the amount of fine particles.

粒度變異係數(CV值)由下式求出。用乾式雷射繞射·散射法測量各個顆粒的粒徑(Di)。 CV值(%)=(標准偏差(τ)/體積平均粒徑(D43))×100 標准偏差(τ)=(ΣXi(Di-D43)^2/ΣXi)^(1/2) The particle size variation coefficient (CV value) was obtained from the following formula. The particle diameter (Di) of each particle was measured by a dry laser diffraction-scattering method. CV value (%) = (standard deviation (τ) / volume average particle size (D43)) × 100 Standard deviation (τ) = (ΣXi(Di-D43)^2/ΣXi)^(1/2)

(2)鹼殘留量(2) Residual amount of alkali

用硫酸·氫氟酸預處理粉體後,使其溶解於鹽酸,使用原子吸收分光光度計(日立製造的Z-2310)通過原子吸收分光分析法測量鹼量。在實施例1中,測量Na量。After the powder was pretreated with sulfuric acid and hydrofluoric acid, it was dissolved in hydrochloric acid, and the amount of alkali was measured by atomic absorption spectrometry using an atomic absorption spectrophotometer (Z-2310 manufactured by Hitachi). In Example 1, the amount of Na was measured.

(3)顆粒密度和空隙率(3) Particle density and porosity

使用Quantachrome Instruments公司製造的Ultrapyc1200e,通過氣體比重法(ガスピクノメーター法)測量粉體中所含的顆粒的平均密度(顆粒密度)。氣體使用氮氣。The average density (particle density) of the particles contained in the powder was measured by the gas pycnometer method using Ultrapyc 1200e manufactured by Quantachrome Instruments. As the gas, nitrogen gas was used.

根據該顆粒密度,通過式“[2.2- (顆粒密度) ] / 2.2 × 100”計算出空隙率(%)。假如粉體由二氧化矽顆粒構成,在該式中,使用2.2g/cm 3的二氧化矽密度。 From this particle density, the porosity (%) was calculated by the formula "[2.2- (particle density) ]/2.2 × 100". If the powder consists of silica particles, in this formula a silica density of 2.2 g/cm 3 is used.

(4)粉體的介電常數(Dk)和介電耗損正切(Df)(4) Dielectric constant (Dk) and dielectric loss tangent (Df) of the powder

使用網路分析儀(ANRITSU公司制造,MS46122B)和空腔諧振器(1GHz)通過空腔諧振器攝動法測量介電常數(Dk)和介電耗損正切(Df)。根據ASTMD2520(JIS C2565)進行測量。The dielectric constant (Dk) and dielectric loss tangent (Df) were measured by a cavity resonator perturbation method using a network analyzer (manufactured by ANRITSU Corporation, MS46122B) and a cavity resonator (1 GHz). Measured according to ASTM D2520 (JIS C2565).

(5)懸浮在水中時漂浮顆粒、懸浮顆粒及沉降顆粒的比例(5) Proportion of floating particles, suspended particles and settled particles when suspended in water

首先,將粉體和水混合以達到5質量%,進行10分鐘的超聲波處理。得到的分散液在25℃下靜置24小時後,分別回收漂浮顆粒、懸浮顆粒和沉降顆粒。接著,將各顆粒在105℃下乾燥24小時後進行測量,計算出其比例。First, the powder and water were mixed so as to be 5% by mass, and ultrasonic treatment was performed for 10 minutes. After the obtained dispersion was left to stand at 25° C. for 24 hours, floating particles, suspended particles and settled particles were recovered respectively. Next, each particle was dried at 105° C. for 24 hours, then measured, and the ratio thereof was calculated.

(6)樹脂組合物的過濾性(6) Filterability of the resin composition

使用ROKI TECHNO公司(ロキテクノ社)製造的過濾器(SHP型:30μm),根據每單位面積的通液量進行評價,直到過濾器堵塞為止。Using a filter (SHP type: 30 μm) manufactured by ROKI TECHNO Corporation (ロキテクノ Corporation), the evaluation was performed in terms of the amount of liquid per unit area until the filter was clogged.

評價標準如下。 ◎:≧1g/cm 2〇:0.5g/cm 2以上且小於1.0g/cm 2△:0.3g/cm 2以上且小於0.5g/cm 2×:<0.3g/cm 2 The evaluation criteria are as follows. ◎: ≧1 g/cm 2 〇: 0.5 g/cm 2 to less than 1.0 g/cm 2 △: 0.3 g/cm 2 to less than 0.5 g/cm 2 ×: <0.3 g/cm 2

(7)樹脂組合物的注入性(7) Injectability of resin composition

在具有20μm間隙的玻璃板之間注入樹脂組合物,用填充25mm所需的時間進行評價。The resin composition was injected between glass plates having a gap of 20 μm, and the time required for filling 25 mm was evaluated.

評價標準如下。 ◎:在200秒以內 〇:大於200秒且在400秒以內 △:大於400秒且在600秒以內 ×:大於600秒 The evaluation criteria are as follows. ◎: Within 200 seconds 〇: More than 200 seconds and within 400 seconds △: More than 400 seconds and within 600 seconds ×: more than 600 seconds

(8)樹脂成型物的介電常數(Dk)及介電耗損正切(Df)(8) Dielectric constant (Dk) and dielectric loss tangent (Df) of resin moldings

使用網路分析儀(ANRITSU公司製造,MS46122B)和同軸諧振器,在9.4GHz下測量50mm×50mm×1mm的板狀成型體(樹脂成型物)的介電常數(Dk)和介電耗損正切(Df)。與未添加粉體(填充物)的樹脂成型物的比較用下式進行,並按以下標準進行評價。The dielectric constant (Dk) and dielectric loss tangent ( Df). The comparison with the resin molded product without powder (filler) was carried out by the following formula, and the evaluation was performed according to the following criteria.

介電常數(Dk)的降低率(%)=(未添加粉體的介電常數 — 添加有粉體的介電常數) / 未添加粉體的介電常數 × 100 〇:降低率>0 △:降低率=0 ×:降低率<0 Decrease rate (%) of dielectric constant (Dk) = (dielectric constant without powder addition - dielectric constant with powder addition) / dielectric constant without powder addition × 100 〇: Reduction rate > 0 △: Reduction rate = 0 ×: reduction rate <0

介電耗損正切(Df)的降低率(%)=(未添加粉體的介電耗損正切 — 添加有粉體的介電耗損正切) / 未添加粉體的介電耗損正切 × 100 ◎:降低率50%以上 〇:降低率30%以上且小於50% △:降低率20%以上且小於30% ×:降低率小於20% Reduction rate (%) of dielectric loss tangent (Df) = (dielectric loss tangent without powder addition - dielectric loss tangent with powder addition) / dielectric loss tangent without powder addition × 100 ◎: The reduction rate is more than 50% 〇: Reduction rate of 30% or more and less than 50% △: The reduction rate is more than 20% and less than 30% ×: The reduction rate is less than 20%

[實施例2][Example 2]

在第二分級工序中,使用日清エンジニアリング公司製造的Aerofine Classifier進行乾式離心(半自由旋渦)進行分級處理。調整葉片角度等,以使通過分級回收的顆粒中所含的微小顆粒在1體積%以下。除此以外與實施例1相同。In the second classification step, classification was performed by dry centrifugation (semi-free vortex) using Aerofine Classifier manufactured by Nissin Engineering Co., Ltd. The blade angle and the like are adjusted so that the fine particles contained in the particles recovered by classification are 1% by volume or less. Other than that, it is the same as in Example 1.

[實施例3][Example 3]

在第二分級工序中,使用佐竹化學機械工業公司製造的アイクラシファイア進行濕式離心分級處理。進行分級以使回收的顆粒中所含的微小顆粒在1體積%以下、粗顆粒在1體積%以下。除此以外與實施例1相同。In the second classification step, a wet centrifugal classification treatment was carried out using AIKRA SIFIA manufactured by Satake Chemical Machinery Industry Co., Ltd. The classification is carried out so that the fine particles contained in the recovered particles are 1% by volume or less, and the coarse particles are 1% by volume or less. Other than that, it is the same as in Example 1.

[實施例4][Example 4]

第一分級工序、第二分級工序都使用日清エンジニアリング公司製造的Aerofine Classifier進行乾式離心(半自由旋渦)進行分級處理。首先,調整葉片角度等進行分級,以使回收的顆粒中所含的微小顆粒在10體積%以下,然後,進行分級以將粗顆粒調整在1體積%以下。除此以外與實施例1相同。Both the first classification step and the second classification step were classified by dry centrifugation (semi-free vortex) using Aerofine Classifier manufactured by Nissin Engineering Co., Ltd. First, classification is performed by adjusting blade angles, etc. so that fine particles contained in recovered particles are 10% by volume or less, and then, classification is performed so that coarse particles are 1% by volume or less. Other than that, it is the same as in Example 1.

[實施例5][Example 5]

第一分級工序、第二分級工序都使用佐竹化學機械工業公司製造的アイクラシファイア進行濕式離心分級處理。首先,進行分級以使回收的顆粒中所含的微小顆粒在5體積%以下,然後,進行分級以使粗顆粒在1體積%以下。除此以外與實施例1同樣的方式進行。Both the first classification step and the second classification step were subjected to wet centrifugal classification treatment using Aircraft made by Satake Chemical Machinery Industry Co., Ltd. First, classification is performed so that fine particles contained in recovered particles are 5% by volume or less, and then, classification is performed so that coarse particles are 1% by volume or less. Except for this, it carried out similarly to Example 1.

[比較例1][Comparative example 1]

將鹼除去處理的浸漬攪拌時間變更為1.5小時,不設置分級工序。除此以外與實施例1相同。The dipping and stirring time of the alkali removal treatment was changed to 1.5 hours, and the classification step was not provided. Other than that, it is the same as in Example 1.

[比較例2][Comparative example 2]

在第一工序中,將噴霧乾燥器的入口溫度設為250℃,鹼除去處理的浸漬攪拌時間設為1.5小時,不設置分級工序。除此以外與實施例1相同。In the first step, the inlet temperature of the spray dryer was set to 250° C., the immersion stirring time of the alkali removal treatment was set to 1.5 hours, and the classification step was not provided. Other than that, it is the same as in Example 1.

[比較例3][Comparative example 3]

在分級工序中,使用本公司製造的旋風器,使粉體輸送線的流速以5m/s進行,回收被旋風器捕獲的顆粒。除此以外與實施例1相同。In the classification process, the cyclone manufactured by our company is used, and the flow velocity of the powder conveying line is set to 5m/s, and the particles captured by the cyclone are recovered. Other than that, it is the same as in Example 1.

[表1] 實施例1 實施例2 實施例3 實施例4 實施例5 比較例1 比較例2 比較例3 有分級 有分級 有分級 有分級 有分級 無分級 無分級 有分級 乾燥工序後 乾燥工序後 乾燥工序後 乾燥工序後 乾燥工序後 乾燥工序後 一階段 離心分級 (自由旋渦) 離心分級 (自由旋渦) 離心分級 (自由旋渦) 離心分級 (半自由旋渦) 離心分級 (濕式) 慣性分級 二階段 慣性分級 離心分級 (半自由旋渦) 離心分級 (濕式) 離心分級 (半自由旋渦) 離心分級 (濕式) 噴霧造粒工序 SiO 2/Na 2O 莫耳比 3.2 SiO 2濃度 質量% 24 入口溫度 400 250 400 出口溫度 150 50 150 中和・清洗工序 酸的種類 硫酸 Ma/Msp 莫耳比 3.3 濃度 質量% 10 時間 Hr 15 15 15 15 15 1.5 1.5 15 乾燥工序 溫度 120 時間 Hr 24 燒製工序(篩) 篩上殘留成分 粉體物理性質 平均粒徑(D50) μm 5.9 4.2 3.3 2.2 2.5 6.8 6.6 9.7 最大粒徑(D100) μm 18.6 16.4 11.1 7.5 7.6 58.7 51.7 35.1 CV值 % 41 51 44 41 37 99 92 48 微小顆粒量 (小於1.0μm) 體積% 0.0 0.8 1.0 9.4 3.1 12.2 14.4 0.6 粗顆粒量 (大於8.0μm) 體積% 10.5 3.8 0.1 0.0 0.0 34.8 31.6 48.2 Na殘留量 ppm 74 74 74 74 74 371 371 74 顆粒密度 g/cm 3 1.3 1.5 1.6 1.9 1.8 1.3 2.2 1.1 空隙率 % 41 32 27 14 18 41 0 50 介電常數(Dk) 2.2 2.2 2.3 2.5 2.5 2.2 3.5 2.0 介電耗損正切(Df) 3.0E-04 3.0E-04 4.0E-04 5.0E-04 5.0E-04 1.0E-03 2.0E-03 1.0E-04 顆粒比例 漂浮顆粒 質量% 10.3 8.6 2.7 1.0 2.2 11.6 0.0 22.0 懸浮顆粒 質量% 0.6 1.0 0.9 0.5 0.4 0.2 1.5 0.6 沉降顆粒 質量% 89.1 90.4 96.4 98.5 97.4 88.2 98.5 77.4 樹脂組合物的物理性質 過濾性 × × × 注入性 × × × 樹脂成型物的物理性質 介電常數(Dk) × × (實心) × (破裂) 介電耗損正切(Df) × × (實心) × (破裂) [Table 1] Example 1 Example 2 Example 3 Example 4 Example 5 Comparative example 1 Comparative example 2 Comparative example 3 graded graded graded graded graded No rating No rating graded After drying process After drying process After drying process After drying process After drying process - - After drying process first stage Centrifugal fractionation (free vortex) Centrifugal fractionation (free vortex) Centrifugal fractionation (free vortex) Centrifugal fractionation (semi-free vortex) Centrifugal classification (wet) - - inertia classification second stage inertia classification Centrifugal fractionation (semi-free vortex) Centrifugal classification (wet) Centrifugal fractionation (semi-free vortex) Centrifugal classification (wet) - - - Spray granulation process SiO 2 /Na 2 O Morby 3.2 SiO2 concentration quality% twenty four Inlet temperature 400 250 400 output temperature 150 50 150 Neutralization and cleaning process acid type - sulfuric acid Ma/Msp Morby 3.3 concentration quality% 10 time HR 15 15 15 15 15 1.5 1.5 15 drying process temperature 120 time HR twenty four Firing process (sieve) Residual ingredients on the sieve few few few few few many many many Powder Physical Properties Average particle size (D50) μm 5.9 4.2 3.3 2.2 2.5 6.8 6.6 9.7 Maximum particle size (D100) μm 18.6 16.4 11.1 7.5 7.6 58.7 51.7 35.1 CV value % 41 51 44 41 37 99 92 48 Tiny particles (less than 1.0μm) volume% 0.0 0.8 1.0 9.4 3.1 12.2 14.4 0.6 Coarse particles (greater than 8.0μm) volume% 10.5 3.8 0.1 0.0 0.0 34.8 31.6 48.2 Na residue ppm 74 74 74 74 74 371 371 74 particle density g/ cm3 1.3 1.5 1.6 1.9 1.8 1.3 2.2 1.1 porosity % 41 32 27 14 18 41 0 50 Dielectric constant (Dk) - 2.2 2.2 2.3 2.5 2.5 2.2 3.5 2.0 Dielectric loss tangent (Df) - 3.0E-04 3.0E-04 4.0E-04 5.0E-04 5.0E-04 1.0E-03 2.0E-03 1.0E-04 Particle ratio floating particles quality% 10.3 8.6 2.7 1.0 2.2 11.6 0.0 22.0 Suspended particles quality% 0.6 1.0 0.9 0.5 0.4 0.2 1.5 0.6 Fallout quality% 89.1 90.4 96.4 98.5 97.4 88.2 98.5 77.4 Physical Properties of Resin Composition Filterability - x x x injection - x x x Physical properties of resin moldings Dielectric constant (Dk) - x × (solid) × (broken) Dielectric loss tangent (Df) - x × (solid) × (broken)

如表1所示,實施例所述的粉體以及添加有該粉體的樹脂成型物的介電常數和介電耗損正切低。此外,添加有實施例所述的粉體的樹脂組合物的過濾性和注入性優異。As shown in Table 1, the dielectric constant and dielectric loss tangent of the powder described in the examples and the resin molded article added with the powder were low. In addition, the resin composition to which the powder described in the examples was added was excellent in filterability and injectability.

none

無。none.

無。none.

Claims (7)

一種粉體,其特徵在於,所述粉體包含無孔外殼的內部具有空腔的空心顆粒,所述粉體的平均粒徑(D50)為1.0μm~10.0μm,粒徑小於1.0μm的微小顆粒的含量在10體積%以下,粒徑大於8.0μm的粗顆粒的含量在20體積%以下,當所述粉體懸浮在水中時,漂浮顆粒為0.5質量%~15.0質量%、懸浮顆粒為0~4.0質量%、沉降顆粒為81.0質量%~99.5質量%。A powder, characterized in that the powder contains hollow particles with a cavity inside a non-porous shell, the average particle size (D50) of the powder is 1.0 μm to 10.0 μm, and the particle size is smaller than 1.0 μm. The content of particles is less than 10% by volume, and the content of coarse particles with a particle size greater than 8.0μm is less than 20% by volume. When the powder is suspended in water, the floating particles are 0.5% by mass to 15.0% by mass, and the suspended particles are 0% by mass. ~4.0% by mass, sedimentation particles are 81.0% by mass to 99.5% by mass. 如請求項1所述的粉體,所述粉體的粒度變異係數(CV值)在60%以下。The powder as claimed in item 1, the particle size variation coefficient (CV value) of the powder is below 60%. 一種樹脂組合物的製造方法,其特徵在於,在樹脂材料中添加如請求項1或2所述的粉體。A method for producing a resin composition, characterized in that the powder as claimed in claim 1 or 2 is added to the resin material. 一種粉體的製造方法,其特徵在於,所述製造方法具有以下工序:將矽酸鹼水溶液在熱風氣流中進行噴霧乾燥來製備顆粒的第一工序;除去所述顆粒中所含的鹼的第二工序;以及對除去所述鹼的顆粒進行燒製的第三工序,在所述第一工序和所述第三工序之間設置有除去粒徑小於1.0μm的微小顆粒和粒徑大於8.0μm的粗顆粒的分級工序。A method for producing a powder, characterized in that the production method has the following steps: a first step of spray-drying an aqueous solution of alkali silicic acid in a hot air flow to prepare granules; a second step of removing the alkali contained in the granules The second process; and the third process of firing the particles from which the alkali has been removed, wherein fine particles with a particle diameter of less than 1.0 μm and particles with a particle diameter greater than 8.0 μm are disposed between the first process and the third process. Classification process of coarse particles. 如請求項4所述的粉體的製造方法,其中,在所述第二工序中,將所述顆粒中所含的鹼量降低至300ppm以下。The method for producing powder according to claim 4, wherein, in the second step, the amount of alkali contained in the particles is reduced to 300 ppm or less. 如請求項4或5所述的粉體的製造方法,其中,在所述第三工序之前,設置有對所述顆粒進行乾燥的乾燥工序,並且,在所述乾燥工序和所述第三工序之間,設置有所述分級工序。The method for producing powder according to Claim 4 or 5, wherein, before the third step, a drying step of drying the particles is provided, and between the drying step and the third step In between, the classification process is provided. 如請求項4~6中任一項所述的粉體的製造方法,其中,在所述分級工序中,通過濕式分級處理除去所述微小顆粒和所述粗顆粒。The method for producing powder according to any one of Claims 4 to 6, wherein, in the classification step, the fine particles and the coarse particles are removed by wet classification treatment.
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