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TW202033974A - Inspecting device and its socket - Google Patents

Inspecting device and its socket Download PDF

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Publication number
TW202033974A
TW202033974A TW108108084A TW108108084A TW202033974A TW 202033974 A TW202033974 A TW 202033974A TW 108108084 A TW108108084 A TW 108108084A TW 108108084 A TW108108084 A TW 108108084A TW 202033974 A TW202033974 A TW 202033974A
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Taiwan
Prior art keywords
probe
conductive
wiring board
needle body
board
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TW108108084A
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Chinese (zh)
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TWI684772B (en
Inventor
廖致傑
謝宗儒
孫育民
程志豐
Original Assignee
創意電子股份有限公司
台灣積體電路製造股份有限公司
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Priority to TW108108084A priority Critical patent/TWI684772B/en
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Publication of TW202033974A publication Critical patent/TW202033974A/en

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  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Measuring Leads Or Probes (AREA)

Abstract

A socket includes a base body, a wiring board, a capacitive element and two adjacent probe pins. A chip-receiving recess is formed on a top surface of the base body. The wiring board is disposed inside the base body. The two probe pins insert inside the base body and pass through the wiring board, respectively. The capacitor element is soldered on the wiring boards and electrically connected to the probe pins through the wiring board. The probe pins are a power probe and a ground probe, respectively.

Description

檢測裝置及其探針座 Detection device and probe holder

本發明有關於一種檢測裝置,尤指一種能夠改善電容元件與待測元件之間距的檢測裝置。 The present invention relates to a detection device, in particular to a detection device capable of improving the distance between a capacitive element and an element to be measured.

一般而言,半導體晶片在製作完成後,會對半導體晶片進行最終測試(FT,Final Test),以確保半導體晶片在出貨時的品質。在進行電性檢測時,會藉由一測試裝置之多數個探針分別觸壓每個半導體晶片之導電接點,以便將不良的半導體晶片篩選出來。 Generally speaking, after the semiconductor wafer is manufactured, a final test (FT, Final Test) is performed on the semiconductor wafer to ensure the quality of the semiconductor wafer when it is shipped. During electrical testing, a plurality of probes of a testing device are used to individually touch the conductive contacts of each semiconductor chip, so as to screen out defective semiconductor chips.

在上述最終測試中,為了維持電源與訊號之完整性,測試裝置之載板上通常會設置電容元件,例如去耦電容(decoupling capacitor)或旁路電容(bypass capacitor),以補償瞬態壓降且保持電壓水平。 In the above-mentioned final test, in order to maintain the integrity of the power supply and the signal, capacitive elements, such as decoupling capacitors or bypass capacitors, are usually installed on the test device's carrier to compensate for transient voltage drops. And maintain the voltage level.

故,如何讓電容元件能夠表現出最大功效,以確保獲得良好的電源完整性質量,是現在半導體測試技術需要突破的課題。 Therefore, how to make the capacitive element show the maximum efficiency to ensure good power integrity quality is a topic that needs to be broken through in semiconductor testing technology.

本發明之一實施例提供了一種檢測裝置。檢測裝置包含一載板、一晶片容置部、一配線板、多個伸縮探針與多個電容元件。晶片容置部用以固持一半導體晶片。配線板位於載板與晶片容置部之間。這些伸縮探針平行地穿過配線板。每個伸縮探針用以連接半導體晶片與載板。這些電容元件分布於配線板上。每個電容元件透過配線板電連接任二個相鄰之伸縮探針,且此二個伸縮探針分別用以連接半導體晶片之一電源接點與一接地接點。 An embodiment of the present invention provides a detection device. The detection device includes a carrier board, a chip accommodating part, a wiring board, a plurality of retractable probes and a plurality of capacitance elements. The chip accommodating part is used for holding a semiconductor chip. The wiring board is located between the carrier board and the chip accommodating part. These telescopic probes pass through the wiring board in parallel. Each telescopic probe is used to connect the semiconductor chip and the carrier. These capacitive elements are distributed on the wiring board. Each capacitive element is electrically connected to any two adjacent telescopic probes through the wiring board, and the two telescopic probes are respectively used to connect a power contact and a ground contact of the semiconductor chip.

依據本發明一或複數個實施例,在上述之檢測裝置中,檢測裝置更包含一探針座。探針座包含一頂面與一底面。頂面與底面相對配置。底面位於載板上,晶片容置部為頂面上形成之一晶片槽。配線板位於探針座內,較探針座之底面更接近探針座之頂面,且伸縮探針平行地位於探針座內。 According to one or more embodiments of the present invention, in the aforementioned detection device, the detection device further includes a probe holder. The probe base includes a top surface and a bottom surface. The top surface is arranged opposite to the bottom surface. The bottom surface is located on the carrier board, and the wafer accommodating portion is a wafer groove formed on the top surface. The wiring board is located in the probe base, which is closer to the top surface of the probe base than the bottom surface of the probe base, and the telescopic probe is located in the probe base in parallel.

依據本發明一或複數個實施例,在上述之檢測裝置中,配線板包含一板體、多個貫孔與多個導電墊。板體具有相對之第一面與第二面。第一面面向晶片容置部。每個貫孔貫穿板體,且連接第一面與第二面,以容置其中一伸縮探針。這些導電墊位於板體之第一面。每個導電墊圍繞其中之一貫孔,且電連接其中一伸縮探針。 According to one or more embodiments of the present invention, in the above-mentioned detection device, the wiring board includes a board body, a plurality of through holes and a plurality of conductive pads. The board has a first surface and a second surface opposite to each other. The first surface faces the wafer accommodating part. Each through hole penetrates the board body and connects the first surface and the second surface to accommodate one of the telescopic probes. These conductive pads are located on the first side of the board. Each conductive pad surrounds one of the through holes and is electrically connected to one of the telescopic probes.

依據本發明一或複數個實施例,在上述之檢測裝置中,配線板更包含多個導電耐磨層。這些導電耐磨層分別位於這些貫孔內,且每個導電耐磨層圍繞並接觸其中一伸縮探針。 According to one or more embodiments of the present invention, in the above-mentioned detection device, the wiring board further includes a plurality of conductive wear-resistant layers. The conductive wear-resistant layers are respectively located in the through holes, and each conductive wear-resistant layer surrounds and contacts one of the telescopic probes.

依據本發明一或複數個實施例,在上述之檢測裝置中,每個導電耐磨層更伸出對應之貫孔,且覆蓋於對應之導電墊上。 According to one or more embodiments of the present invention, in the above-mentioned detection device, each conductive wear-resistant layer extends beyond the corresponding through hole and covers the corresponding conductive pad.

依據本發明一或複數個實施例,在上述之檢測裝置中,配線板更包含多個導電膠。每個導電膠將其中一導電耐磨層附著於板體上,且電連接其中一導電墊以及其中一導電耐磨層。 According to one or more embodiments of the present invention, in the above-mentioned detection device, the wiring board further includes a plurality of conductive adhesives. Each conductive adhesive attaches one of the conductive wear-resistant layers to the board, and is electrically connected to one of the conductive pads and one of the conductive wear-resistant layers.

依據本發明一或複數個實施例,在上述之檢測裝置中,每個伸縮探針包含一靜止針體、一活動針體及一彈簧。靜止針體之一端伸至載板,另端具有一凹槽。活動針體可伸縮地位於凹槽以及其中一貫孔內,且接觸其中一導電耐磨層。彈簧位於凹槽內,連接靜止針體與活動針體。其中一電容元件位於任二相鄰之活動針體之間。 According to one or more embodiments of the present invention, in the aforementioned detection device, each telescopic probe includes a stationary needle body, a movable needle body and a spring. One end of the stationary needle body extends to the carrier board, and the other end has a groove. The movable needle body is telescopically located in the groove and one of the through holes, and contacts one of the conductive wear-resistant layers. The spring is located in the groove and connects the stationary needle body and the movable needle body. One of the capacitor elements is located between any two adjacent movable needle bodies.

依據本發明一或複數個實施例,在上述之檢測裝置中,每個電容元件介於上述二個伸縮探針之間。 According to one or more embodiments of the present invention, in the aforementioned detection device, each capacitive element is interposed between the aforementioned two retractable probes.

本發明之另一實施例提供了一種探針座。探針座包含一承座、一配線板、一電容元件、一電源探針與一接地探針。承座包含相對配置之一頂面與一底面。頂面具有一晶片容置部。配線板位於承座內部。電源探針位於承座內部,且穿過配線板。接地探針位於承座內部,穿過配線板,且為最鄰近電源探針之探針。電容元件焊設於配線板上,位於電源探針與接地探針之一側,且透過配線板電連接電源探針與接地探針。 Another embodiment of the present invention provides a probe holder. The probe holder includes a bearing seat, a wiring board, a capacitive element, a power probe and a ground probe. The bearing includes a top surface and a bottom surface which are arranged oppositely. The top face has a chip accommodating part. The distribution board is located inside the socket. The power probe is located inside the socket and passes through the wiring board. The ground probe is located inside the socket, passes through the wiring board, and is the probe closest to the power probe. The capacitive element is welded on the wiring board, located on one side of the power probe and the ground probe, and is electrically connected to the power probe and the ground probe through the wiring board.

依據本發明一或複數個實施例,在上述之探針座中,配線板包含一板體、一第一貫孔、一第二貫孔、一第一導 電墊與一第二導電墊。板體具有相對之第一面與第二面。第一面面向容置部。第一貫孔貫穿板體,且連接第一面與第二面,以容置電源探針。第一導電墊位於第一面,圍繞第一貫孔,且電連接電源探針。第二貫孔貫穿板體,且連接第一面與第二面,以容置接地探針。第二導電墊位於第一面,圍繞第二貫孔,且電連接接地探針。 According to one or more embodiments of the present invention, in the above-mentioned probe holder, the wiring board includes a board, a first through hole, a second through hole, and a first guide The electric pad and a second conductive pad. The board has a first surface and a second surface opposite to each other. The first side faces the accommodating part. The first through hole penetrates the board body and connects the first surface and the second surface to accommodate the power probe. The first conductive pad is located on the first surface, surrounds the first through hole, and is electrically connected to the power probe. The second through hole penetrates the board body and connects the first surface and the second surface to accommodate the ground probe. The second conductive pad is located on the first surface, surrounds the second through hole, and is electrically connected to the ground probe.

依據本發明一或複數個實施例,在上述之探針座中,配線板更包含一第一導電耐磨層與一第二導電耐磨層。第一導電耐磨層位於第一貫孔內,圍繞且接觸電源探針。第二導電耐磨層位於第二貫孔內,圍繞且接觸接地探針。 According to one or more embodiments of the present invention, in the above-mentioned probe holder, the wiring board further includes a first conductive wear-resistant layer and a second conductive wear-resistant layer. The first conductive wear-resistant layer is located in the first through hole, surrounds and contacts the power probe. The second conductive wear-resistant layer is located in the second through hole, surrounds and contacts the ground probe.

依據本發明一或複數個實施例,在上述之探針座中,第一導電耐磨層位於第一導電墊及第一貫孔之內壁上,第二導電耐磨層位於第二導電墊及第二貫孔之內壁上。 According to one or more embodiments of the present invention, in the above-mentioned probe holder, the first conductive wear-resistant layer is located on the inner wall of the first conductive pad and the first through hole, and the second conductive wear-resistant layer is located on the second conductive pad And on the inner wall of the second through hole.

依據本發明一或複數個實施例,在上述之探針座中,配線板更包含一第一導電膠及一第二導電膠。第一導電膠將第一導電耐磨層附著於板體上,且電連接第一導電墊及第一導電耐磨層。第二導電膠將第二導電耐磨層附著於板體上,且電連接第二導電墊及第二導電耐磨層。 According to one or more embodiments of the present invention, in the above-mentioned probe holder, the wiring board further includes a first conductive adhesive and a second conductive adhesive. The first conductive adhesive attaches the first conductive wear-resistant layer to the board and electrically connects the first conductive pad and the first conductive wear-resistant layer. The second conductive adhesive attaches the second conductive wear-resistant layer to the board and electrically connects the second conductive pad and the second conductive wear-resistant layer.

依據本發明一或複數個實施例,在上述之探針座中,電源探針包含一第一靜止針體、一第一活動針體及一第一彈簧。第一靜止針體之一端具有一第一凹槽。第一活動針體可伸縮地位於第一凹槽及第一貫孔內,且接觸第一導電耐磨層。第一彈簧位於第一凹槽內,連接第一靜止針體與第一活動針體。 According to one or more embodiments of the present invention, in the above-mentioned probe holder, the power probe includes a first stationary needle body, a first movable needle body and a first spring. One end of the first stationary needle body has a first groove. The first movable needle body is telescopically located in the first groove and the first through hole, and contacts the first conductive wear-resistant layer. The first spring is located in the first groove and connects the first stationary needle body and the first movable needle body.

依據本發明一或複數個實施例,接地探針包含一第二靜止針體、一第二活動針體及一第二彈簧。第二靜止針體之一端具有一第二凹槽。第二活動針體可伸縮地位於第二凹槽及第二貫孔內,且接觸第二導電耐磨層。第二彈簧位於第二凹槽內,連接第二靜止針體與第二活動針體。電容元件位於第一活動針體與第二活動針體之間。 According to one or more embodiments of the present invention, the ground probe includes a second stationary needle body, a second movable needle body and a second spring. One end of the second stationary needle body has a second groove. The second movable needle body is telescopically located in the second groove and the second through hole, and contacts the second conductive wear-resistant layer. The second spring is located in the second groove and connects the second stationary needle body and the second movable needle body. The capacitance element is located between the first movable needle body and the second movable needle body.

依據本發明一或複數個實施例,電容元件較承座之底面更接近承座之頂面。 According to one or more embodiments of the present invention, the capacitive element is closer to the top surface of the socket than the bottom surface of the socket.

如此,藉由上述將電容元件整合至探針層內之架構,縮短了電容元件與半導體晶片之間距,不僅提供可靠的訊號完整性,更能夠降低電容元件之維修困難度。 In this way, through the above-mentioned structure of integrating the capacitor element into the probe layer, the distance between the capacitor element and the semiconductor chip is shortened, which not only provides reliable signal integrity, but also reduces the maintenance difficulty of the capacitor element.

以上所述僅係用以闡述本發明所欲解決的問題、解決問題的技術手段、及其產生的功效等等,本發明之具體細節將在下文的實施例及相關圖式中詳細介紹。 The above description is only used to illustrate the problem to be solved by the present invention, the technical means to solve the problem, and the effects produced by it, etc. The specific details of the present invention will be described in detail in the following embodiments and related drawings.

10‧‧‧檢測裝置 10‧‧‧Detection device

100‧‧‧載板 100‧‧‧Carrier Board

110‧‧‧接點 110‧‧‧Contact

200‧‧‧探針座 200‧‧‧Probe holder

210‧‧‧承座 210‧‧‧Seat

211‧‧‧頂面 211‧‧‧Top surface

212‧‧‧底面 212‧‧‧Bottom

220‧‧‧內部空間 220‧‧‧Internal space

230‧‧‧柱狀槽 230‧‧‧Cylindrical slot

240‧‧‧晶片容置部 240‧‧‧Chip accommodating part

241‧‧‧晶片槽 241‧‧‧chip slot

300‧‧‧配線板 300‧‧‧Wiring board

310‧‧‧板體 310‧‧‧Board

311‧‧‧第一面 311‧‧‧The first side

312‧‧‧第二面 312‧‧‧Second side

321‧‧‧第一貫孔 321‧‧‧First through hole

322‧‧‧第一導電墊 322‧‧‧First conductive pad

323‧‧‧第一導電耐磨層 323‧‧‧First conductive wear-resistant layer

324‧‧‧第一導電膠 324‧‧‧The first conductive adhesive

325‧‧‧第一走線 325‧‧‧First trace

331‧‧‧第二貫孔 331‧‧‧Second through hole

332‧‧‧第二導電墊 332‧‧‧Second conductive pad

333‧‧‧第二導電耐磨層 333‧‧‧Second conductive wear-resistant layer

334‧‧‧第二導電膠 334‧‧‧Second conductive adhesive

335‧‧‧第二走線 335‧‧‧Second trace

400‧‧‧伸縮探針 400‧‧‧Retractable Probe

400A‧‧‧電源探針 400A‧‧‧Power Probe

410‧‧‧第一靜止針體 410‧‧‧The first stationary needle

411‧‧‧第一凹槽 411‧‧‧First groove

412‧‧‧第一下針端 412‧‧‧First lower needle end

420‧‧‧第一活動針體 420‧‧‧The first movable needle

421‧‧‧第一上針端 421‧‧‧First upper needle end

430‧‧‧第一彈簧 430‧‧‧First spring

400B‧‧‧接地探針 400B‧‧‧Ground probe

440‧‧‧第二靜止針體 440‧‧‧Second stationary needle

441‧‧‧第二凹槽 441‧‧‧Second groove

442‧‧‧第二下針端 442‧‧‧Second lower needle end

450‧‧‧第二活動針體 450‧‧‧Second movable needle

451‧‧‧第二上針端 451‧‧‧Second upper needle end

460‧‧‧第二彈簧 460‧‧‧Second spring

500‧‧‧電容元件 500‧‧‧Capacitor element

600‧‧‧半導體晶片 600‧‧‧Semiconductor chip

610‧‧‧接點 610‧‧‧Contact

610A‧‧‧電源接點 610A‧‧‧Power contact

610B‧‧‧接地接點 610B‧‧‧Ground contact

AA‧‧‧線段 AA‧‧‧line segment

Z‧‧‧間隔區 Z‧‧‧Interval

為讓本發明之上述和其他目的、特徵、優點與實施例能更明顯易懂,所附圖式之說明如下:第1圖為本發明一實施例之檢測裝置之示意圖;第2圖為本發明一實施例之配線板之上視圖;第3圖為第2圖沿線段AA所製成之剖視圖;以及第4圖為第3圖之使用操作圖。 In order to make the above and other objects, features, advantages and embodiments of the present invention more obvious and understandable, the description of the accompanying drawings is as follows: Figure 1 is a schematic diagram of a detection device according to an embodiment of the present invention; Figure 2 is A top view of a wiring board according to an embodiment of the invention; Fig. 3 is a cross-sectional view taken along line AA in Fig. 2; and Fig. 4 is a use operation diagram of Fig. 3.

以下將以圖式揭露本發明之複數個實施例,為明確說明起見,許多實務上的細節將在以下敘述中一併說明。然而,應瞭解到,這些實務上的細節不應用以限制本發明。也就是說,在本發明實施例中,這些實務上的細節是非必要的。此外,為簡化圖式起見,一些習知慣用的結構與元件在圖式中將以簡單示意的方式繪示之。 Hereinafter, a plurality of embodiments of the present invention will be disclosed in drawings. For clear description, many practical details will be described in the following description. However, it should be understood that these practical details should not be used to limit the present invention. That is to say, in the embodiment of the present invention, these practical details are unnecessary. In addition, in order to simplify the drawings, some conventionally used structures and elements will be shown in a simple schematic manner in the drawings.

第1圖為本發明一實施例之檢測裝置10之示意圖。如第1圖所示,檢測裝置10用以對一待測物進行檢測,且待測物例如為半導體晶片600。檢測裝置10包含一載板100、一晶片容置部240、一配線板300、多個伸縮探針400與多個電容元件500。晶片容置部240用以固持一半導體晶片600。配線板300位於載板100與晶片容置部240之間。這些伸縮探針400平行地穿過配線板300。每個伸縮探針400之一端連接載板100之一接點110,另端連接晶片容置部240,用以抵接半導體晶片600之一接點610(如焊球或焊墊)。這些電容元件500分布於配線板300上,且每個電容元件500透過配線板300之走線電連接任二個相鄰之伸縮探針400。例如,電容元件500位於任二個相鄰之伸縮探針400之間。 Figure 1 is a schematic diagram of a detection device 10 according to an embodiment of the present invention. As shown in FIG. 1, the detection device 10 is used to detect an object to be tested, and the object to be tested is, for example, a semiconductor chip 600. The detection device 10 includes a carrier board 100, a wafer accommodating part 240, a wiring board 300, a plurality of retractable probes 400 and a plurality of capacitive elements 500. The wafer accommodating portion 240 is used to hold a semiconductor wafer 600. The wiring board 300 is located between the carrier board 100 and the chip accommodating part 240. These telescopic probes 400 pass through the wiring board 300 in parallel. One end of each telescopic probe 400 is connected to a contact 110 of the carrier board 100, and the other end is connected to the chip accommodating portion 240 for abutting against a contact 610 (such as a solder ball or a bonding pad) of the semiconductor chip 600. The capacitive elements 500 are distributed on the wiring board 300, and each capacitive element 500 is electrically connected to any two adjacent telescopic probes 400 through the wiring of the wiring board 300. For example, the capacitive element 500 is located between any two adjacent telescopic probes 400.

須了解到,上述此二相鄰之伸縮探針400分別用以抵接半導體晶片600之其中一電源接點610A與其中一接地接點610B,以分別傳輸電源訊號與接地訊號。故,以下將此些相鄰之伸縮探針400分別稱為電源探針400A與接地探針400B。 It should be understood that the two adjacent telescopic probes 400 are respectively used to abut one of the power contacts 610A and one of the ground contacts 610B of the semiconductor chip 600 to respectively transmit the power signal and the ground signal. Therefore, the adjacent telescopic probes 400 are referred to as power probe 400A and ground probe 400B in the following.

如此,由於本實施例將作為去耦合電容 (Decoupling Capacitor)之電容元件500整合至探針層(即探針位置處),藉此縮短了電容元件500與半導體晶片600之間距,從而減小電源干擾的現象,不僅提供更可靠的訊號完整性,更能夠降低電容元件500之維修困難度。 So, because this embodiment will be used as a decoupling capacitor (Decoupling Capacitor) The capacitive element 500 is integrated into the probe layer (that is, the probe position), thereby shortening the distance between the capacitive element 500 and the semiconductor chip 600, thereby reducing the phenomenon of power interference, not only providing more reliable signal integrity It can reduce the maintenance difficulty of the capacitor element 500.

更具體地,在本實施例中,檢測裝置10更包含一探針座200。探針座200包含一承座210。承座210具有相對配置之一頂面211與一底面212。底面212位於載板100上,且晶片容置部240例如為頂面211上所凹設之晶片槽241,用以放置上述之半導體晶片600。配線板300位於探針座200內,且位於承座210內部。相較於探針座200之底面212,配線板300(即電容元件500)之位置更接近探針座200之頂面211。此些伸縮探針400並排地位於承座210內部,且彼此平行地穿過配線板300。然而,本發明不限於配線板300與之伸縮探針400位置。舉例來說,探針座200內具有一內部空間220以及多個柱狀槽230。柱狀槽230彼此平行,且連接內部空間220。配線板300固定於內部空間220內,且此些伸縮探針400分別固定於柱狀槽230內。 More specifically, in this embodiment, the detection device 10 further includes a probe holder 200. The probe holder 200 includes a holder 210. The socket 210 has a top surface 211 and a bottom surface 212 opposite to each other. The bottom surface 212 is located on the carrier board 100, and the wafer accommodating portion 240 is, for example, a wafer groove 241 recessed on the top surface 211 for placing the aforementioned semiconductor wafer 600. The wiring board 300 is located in the probe holder 200 and inside the socket 210. Compared with the bottom surface 212 of the probe holder 200, the position of the wiring board 300 (ie, the capacitive element 500) is closer to the top surface 211 of the probe holder 200. These telescopic probes 400 are located side by side inside the socket 210 and pass through the wiring board 300 parallel to each other. However, the present invention is not limited to the position of the wiring board 300 and the retractable probe 400. For example, the probe base 200 has an internal space 220 and a plurality of cylindrical grooves 230 therein. The columnar grooves 230 are parallel to each other and connect to the internal space 220. The wiring board 300 is fixed in the internal space 220, and the telescopic probes 400 are fixed in the cylindrical groove 230 respectively.

然而,本發明不限於此,在其他實施例中,檢測裝置10亦可能省略探針座200,使得任意框架作為承載半導體晶片600之晶片容置部240;或者,配線板300也可以在射出成型程序時埋設於探針座200內。 However, the present invention is not limited to this. In other embodiments, the detection device 10 may omit the probe holder 200, so that any frame is used as the wafer accommodating portion 240 for carrying the semiconductor wafer 600; alternatively, the wiring board 300 may also be injection molded It is buried in the probe holder 200 during the procedure.

第2圖為本發明一實施例之配線板300之上視圖。第3圖為第2圖沿線段AA所製成之剖視圖。如第2圖所示,電容元件500不位於上述電源探針400A與接地探針400B之間,而 是位於上述電源探針400A與接地探針400B之同側。具體來說,如第2圖之四個伸縮探針400可以圍繞且定義出一間隔區Z時,電容元件500至少位於鄰近上述電源探針400A與接地探針400B之間隔區Z內。 FIG. 2 is a top view of a wiring board 300 according to an embodiment of the invention. Figure 3 is a cross-sectional view of Figure 2 taken along line AA. As shown in Figure 2, the capacitive element 500 is not located between the power probe 400A and the ground probe 400B, and It is located on the same side of the power probe 400A and the ground probe 400B. Specifically, when the four retractable probes 400 in FIG. 2 can surround and define a compartment Z, the capacitive element 500 is at least located in the compartment Z adjacent to the power probe 400A and the ground probe 400B.

如第2圖與第3圖所示,配線板300包含一板體310、多個貫孔(例如第一貫孔321與第二貫孔331,第3圖)與多個導電墊(例如第一導電墊322與第二導電墊332,第2圖與第3圖)。板體310具有相對之第一面311與第二面312。第一面311面向晶片容置部240(第1圖)。舉例來說,板體310為薄型板,其厚度例如為0.15至0.25毫米之範圍內。第一貫孔321貫穿板體310,且連接第一面311與第二面312,以容置電源探針400A。第一導電墊322位於第一面311,圍繞第一貫孔321,且電連接電源探針400A。第二貫孔331貫穿板體310,且連接第一面311與第二面312,以容置接地探針400B。第二導電墊332位於第一面311,圍繞第二貫孔331,且電連接接地探針400B。舉例來說,第一導電墊322與第二導電墊332分別呈環狀,且包含銀、銅或其合金,或者,銅、鎳或金等常見高導電材料。 As shown in FIGS. 2 and 3, the wiring board 300 includes a board 310, a plurality of through holes (such as the first through holes 321 and the second through holes 331, FIG. 3) and a plurality of conductive pads (such as the A conductive pad 322 and a second conductive pad 332, Figs. 2 and 3). The board 310 has a first surface 311 and a second surface 312 opposite to each other. The first surface 311 faces the wafer receiving portion 240 (FIG. 1). For example, the plate body 310 is a thin plate with a thickness in the range of 0.15 to 0.25 mm, for example. The first through hole 321 penetrates the board 310 and connects the first surface 311 and the second surface 312 to accommodate the power probe 400A. The first conductive pad 322 is located on the first surface 311, surrounds the first through hole 321, and is electrically connected to the power probe 400A. The second through hole 331 penetrates the board 310 and connects the first surface 311 and the second surface 312 to receive the ground probe 400B. The second conductive pad 332 is located on the first surface 311, surrounds the second through hole 331, and is electrically connected to the ground probe 400B. For example, the first conductive pad 322 and the second conductive pad 332 are ring-shaped, and include silver, copper or alloys thereof, or common highly conductive materials such as copper, nickel, or gold.

如第3圖所示,電源探針400A位於第一貫孔321內,且電連接第一導電墊322。電源探針400A例如為一可伸縮同軸彈性針。接地探針400B位於第二貫孔331內,且電連接第二導電墊332。接地探針400B例如為一可伸縮同軸彈性針。故,其中一電容元件500透過對應之第一導電墊322、第二導電墊332、第一走線325與第二走線335分別電連接電源探針 400A與接地探針400B。 As shown in FIG. 3, the power probe 400A is located in the first through hole 321 and is electrically connected to the first conductive pad 322. The power probe 400A is, for example, a retractable coaxial elastic needle. The ground probe 400B is located in the second through hole 331 and is electrically connected to the second conductive pad 332. The ground probe 400B is, for example, a retractable coaxial elastic needle. Therefore, one of the capacitive elements 500 is electrically connected to the power probe through the corresponding first conductive pad 322, second conductive pad 332, first trace 325, and second trace 335, respectively 400A and ground probe 400B.

更具體地,電源探針400A包含一第一靜止針體410、一第一活動針體420及一第一彈簧430。第一靜止針體410之一端具有一第一凹槽411,其另端具有一第一下針端412。第一活動針體420之一端可伸縮地位於第一凹槽411及第一貫孔321內,且電連接第一導電墊322,其另端具有一第一上針端421。第一上針端421用以抵接半導體晶片600之所述電源接點610A。第一彈簧430位於第一凹槽411內,且連接第一靜止針體410與第一活動針體420。接地探針400B包含一第二靜止針體440、一第二活動針體450及一第二彈簧460。第二靜止針體440之一端具有一第二凹槽441,其另端具有一第二下針端442。第二活動針體450之一端可伸縮地位於第二凹槽441及第二貫孔331內,且電連接第二導電墊332,其另端具有一第二上針端451。第二上針端451用以抵接半導體晶片600之所述接地接點610B。第二彈簧460位於第二凹槽441內,且連接第二靜止針體440與第二活動針體450。 More specifically, the power probe 400A includes a first stationary needle body 410, a first movable needle body 420 and a first spring 430. One end of the first stationary needle body 410 has a first groove 411, and the other end has a first lower needle end 412. One end of the first movable needle body 420 is telescopically located in the first groove 411 and the first through hole 321 and is electrically connected to the first conductive pad 322, and the other end has a first upper needle end 421. The first upper pin end 421 is used to abut the power contact 610A of the semiconductor chip 600. The first spring 430 is located in the first groove 411 and connects the first stationary needle body 410 and the first movable needle body 420. The ground probe 400B includes a second stationary needle 440, a second movable needle 450 and a second spring 460. One end of the second stationary needle body 440 has a second groove 441, and the other end has a second lower needle end 442. One end of the second movable needle 450 is telescopically located in the second groove 441 and the second through hole 331 and is electrically connected to the second conductive pad 332, and the other end has a second upper needle end 451. The second upper pin end 451 is used to abut the ground contact 610B of the semiconductor chip 600. The second spring 460 is located in the second groove 441 and connects the second stationary needle 440 and the second movable needle 450.

第4圖為第3圖之使用操作圖。如此,如第4圖所示,當半導體晶片600放入晶片容置部240,且朝下壓迫所述電源探針400A與接地探針400B時,半導體晶片600之所述電源接點610A與接地接點610B分別壓下所述第一活動針體420與第二活動針體450,使得所述第一活動針體420能夠於第一貫孔321內朝下方縮入第一凹槽411內、所述第二活動針體450能夠於第二貫孔331內朝下方縮入第二凹槽441內,以便進行對應之測試行為。反之,待半導體晶片600離開晶片容置部240 時,第一彈簧430將所述第一活動針體420於第一貫孔321內朝上方推回原位,且第二彈簧460將所述第二活動針體450於第二貫孔331內朝上方推回原位。 Figure 4 is the operation diagram of Figure 3. Thus, as shown in FIG. 4, when the semiconductor chip 600 is placed in the chip accommodating portion 240 and the power probe 400A and the ground probe 400B are pressed downward, the power contact 610A of the semiconductor chip 600 is connected to the ground The contact 610B respectively presses down the first movable needle body 420 and the second movable needle body 450, so that the first movable needle body 420 can be retracted downwardly into the first groove 411 in the first through hole 321, The second movable needle 450 can be retracted downwardly into the second groove 441 in the second through hole 331 to perform a corresponding test action. On the contrary, when the semiconductor wafer 600 leaves the wafer accommodating part 240 At this time, the first spring 430 pushes the first movable needle body 420 upward in the first through hole 321 back to the original position, and the second spring 460 pushes the second movable needle body 450 into the second through hole 331 Push it back up to its original position.

此外,上述之配線板300更包含多個導電耐磨層(例如第一導電耐磨層323與第二導電耐磨層333,第3圖)。第一導電耐磨層323位於第一貫孔321之內壁上,且第一導電耐磨層323圍繞及接觸電源探針400A。更具體地,第一導電耐磨層323接觸電源探針400A之第一活動針體420。第一導電耐磨層323位於第一導電墊322及第一貫孔321之內壁上,意即,第一導電耐磨層323不只位於第一導電墊322,且第一導電耐磨層323從第一貫孔321內延伸至第一導電墊322,且覆蓋於第一導電墊322上。舉例來說,第一導電膠324將第一導電耐磨層323附著於板體310上,且電連接第一導電墊322及第一導電耐磨層323,使得第一導電耐磨層323透過第一導電膠324形成於第一貫孔321之內壁與第一導電墊322上。第一導電膠324例如為導電銀膠。 In addition, the aforementioned wiring board 300 further includes a plurality of conductive wear resistant layers (for example, the first conductive wear resistant layer 323 and the second conductive wear resistant layer 333, FIG. 3). The first conductive wear-resistant layer 323 is located on the inner wall of the first through hole 321, and the first conductive wear-resistant layer 323 surrounds and contacts the power probe 400A. More specifically, the first conductive wear-resistant layer 323 contacts the first movable needle body 420 of the power probe 400A. The first conductive wear-resistant layer 323 is located on the inner walls of the first conductive pad 322 and the first through hole 321, which means that the first conductive wear-resistant layer 323 is not only located on the first conductive pad 322, but also the first conductive wear-resistant layer 323 It extends from the first through hole 321 to the first conductive pad 322 and covers the first conductive pad 322. For example, the first conductive adhesive 324 attaches the first conductive wear-resistant layer 323 to the board 310, and electrically connects the first conductive pad 322 and the first conductive wear-resistant layer 323, so that the first conductive wear-resistant layer 323 penetrates The first conductive glue 324 is formed on the inner wall of the first through hole 321 and the first conductive pad 322. The first conductive glue 324 is, for example, conductive silver glue.

第二導電耐磨層333位於第二貫孔331之內壁上,且第二導電耐磨層333圍繞及接觸接地探針400B。更具體地,第二導電耐磨層333接觸接地探針400B之第二活動針體450。第二導電耐磨層333位於第二導電墊332及第二貫孔331之內壁上,意即,第二導電耐磨層333不只位於第二導電墊332,且第二導電耐磨層333從第二貫孔331內延伸至第二導電墊332,且覆蓋於第二導電墊332上。舉例來說,第二導電膠334將第二導電耐磨層333附著於板體310上,且電連接第二導 電墊332及第二導電耐磨層333,使得第二導電耐磨層333透過第二導電膠334形成於第二貫孔331之內壁與第二導電墊332上。第二導電膠334例如為導電銀膠。 The second conductive wear-resistant layer 333 is located on the inner wall of the second through hole 331, and the second conductive wear-resistant layer 333 surrounds and contacts the ground probe 400B. More specifically, the second conductive wear-resistant layer 333 contacts the second movable needle body 450 of the ground probe 400B. The second conductive wear-resistant layer 333 is located on the inner walls of the second conductive pad 332 and the second through hole 331, which means that the second conductive wear-resistant layer 333 is not only located on the second conductive pad 332, but also the second conductive wear-resistant layer 333 It extends from the second through hole 331 to the second conductive pad 332 and covers the second conductive pad 332. For example, the second conductive adhesive 334 attaches the second conductive wear-resistant layer 333 to the board 310 and is electrically connected to the second conductive The electrical pad 332 and the second conductive wear-resistant layer 333 make the second conductive wear-resistant layer 333 formed on the inner wall of the second through hole 331 and the second conductive pad 332 through the second conductive adhesive 334. The second conductive glue 334 is, for example, a conductive silver glue.

舉例來說,第一導電耐磨層323與第二導電耐磨層333分別呈環狀,且第一導電耐磨層323與第二導電耐磨層333分別包含例如銀石墨合金。銀石墨合金為銀基含有石墨成分的二元合金,具有良好的導電性、優良的耐磨性和自潤滑性、接觸電阻低且高穩定性。銀石墨合金例如是由銀粉和石墨粉均勻混合後,經壓制成型和燒結而成。 For example, the first conductive wear-resistant layer 323 and the second conductive wear-resistant layer 333 are ring-shaped respectively, and the first conductive wear-resistant layer 323 and the second conductive wear-resistant layer 333 respectively include, for example, silver graphite alloy. Silver graphite alloy is a silver-based binary alloy containing graphite components. It has good electrical conductivity, excellent wear resistance and self-lubricity, low contact resistance and high stability. The silver-graphite alloy is, for example, formed by uniformly mixing silver powder and graphite powder, then pressing and sintering.

如此,如第4圖所示,由於第一貫孔321與第二貫孔331內分別設置有第一導電耐磨層323與第二導電耐磨層333,即便多次壓放第一活動針體420與第二活動針體450,仍不致損害配線板300,進而必避免縮短配線板300之使用壽命。 Thus, as shown in Figure 4, since the first through hole 321 and the second through hole 331 are respectively provided with a first conductive wear-resistant layer 323 and a second conductive wear-resistant layer 333, even if the first movable needle is pressed and released multiple times The body 420 and the second movable needle body 450 still do not damage the wiring board 300, and thus avoid shortening the service life of the wiring board 300.

此外,上述各實施例中,這些電容元件500分別為多層陶瓷電容(Multilayer Ceramic Capacitor,MLCC),且其體積為0.25 x 0.125 x 0.125毫米,或是,0.4x0.2x0.2毫米,且其額定電壓為6.3至25伏(V)之範圍內。電容值為0.2至10000皮法拉之範圍內。然而,本發明不限於此,在其他實施例中,電容元件500也可以為寄生電容、具有交叉指形(interdigitated)電極之電容或是任何其他以具圖案化之至少一導電電極形成之電容。 In addition, in the foregoing embodiments, the capacitor elements 500 are multilayer ceramic capacitors (Multilayer Ceramic Capacitor, MLCC), and their volume is 0.25 x 0.125 x 0.125 mm, or 0.4 x 0.2 x 0.2 mm, and their rated The voltage is in the range of 6.3 to 25 volts (V). The capacitance value is in the range of 0.2 to 10,000 picofarads. However, the present invention is not limited to this. In other embodiments, the capacitive element 500 may also be a parasitic capacitor, a capacitor with interdigitated electrodes, or any other capacitor formed with at least one patterned conductive electrode.

最後,上述所揭露之各實施例中,並非用以限定本發明,任何熟習此技藝者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾,皆可被保護於本發明中。因此 本發明之保護範圍當視後附之申請專利範圍所界定者為準。 Finally, the various embodiments disclosed above are not intended to limit the present invention. Anyone who is familiar with this technique can make various changes and modifications without departing from the spirit and scope of the present invention, and can be protected in this invention. Inventing. therefore The scope of protection of the present invention shall be subject to those defined by the attached patent scope.

10‧‧‧檢測裝置 10‧‧‧Detection device

100‧‧‧載板 100‧‧‧Carrier Board

110‧‧‧接點 110‧‧‧Contact

200‧‧‧探針座 200‧‧‧Probe holder

210‧‧‧承座 210‧‧‧Seat

211‧‧‧頂面 211‧‧‧Top surface

212‧‧‧底面 212‧‧‧Bottom

220‧‧‧內部空間 220‧‧‧Internal space

230‧‧‧柱狀槽 230‧‧‧Cylindrical slot

240‧‧‧晶片容置部 240‧‧‧Chip accommodating part

241‧‧‧晶片槽 241‧‧‧chip slot

300‧‧‧配線板 300‧‧‧Wiring board

400‧‧‧伸縮探針 400‧‧‧Retractable Probe

500‧‧‧電容元件 500‧‧‧Capacitor element

600‧‧‧半導體晶片 600‧‧‧Semiconductor chip

610‧‧‧接點 610‧‧‧Contact

610A‧‧‧電源接點 610A‧‧‧Power contact

610B‧‧‧接地接點 610B‧‧‧Ground contact

Claims (16)

一種檢測裝置,包含:一載板;一晶片容置部,用以固持一半導體晶片;一配線板,位於該載板與該晶片容置部之間;複數個伸縮探針,平行地穿過該配線板,每一該些伸縮探針用以連接該半導體晶片與該載板;以及複數個電容元件,分布於該配線板上,其中每一該些電容元件透過該配線板電連接任二個相鄰之該些伸縮探針,且該二個相鄰之伸縮探針分別用以連接該半導體晶片之一電源接點與一接地接點。 A detection device comprising: a carrier board; a wafer accommodating part for holding a semiconductor chip; a wiring board located between the carrier board and the wafer accommodating part; a plurality of telescopic probes passing through in parallel The wiring board, each of the telescopic probes is used to connect the semiconductor chip and the carrier board; and a plurality of capacitive elements are distributed on the wiring board, wherein each of the capacitive elements is electrically connected to any two through the wiring board The two adjacent telescopic probes are respectively used for connecting a power contact and a ground contact of the semiconductor chip. 如請求項1所述之檢測裝置,更包含:一探針座,包含一頂面與一底面,該頂面與該底面相對配置,該底面位於該載板上,該晶片容置部為該頂面上形成之一晶片槽,其中該配線板位於該探針座內,較該探針座之該底面更接近該探針座之該頂面,且該些伸縮探針平行地位於該探針座內。 The inspection device according to claim 1, further comprising: a probe holder including a top surface and a bottom surface, the top surface and the bottom surface are disposed oppositely, the bottom surface is located on the carrier board, and the chip accommodating portion is the A chip groove is formed on the top surface, wherein the wiring board is located in the probe base, and is closer to the top surface of the probe base than the bottom surface of the probe base, and the telescopic probes are located in parallel on the probe base. Inside the needle seat. 如請求項1所述之檢測裝置,其中該配線板包含:一板體,具有相對之一第一面與一第二面,該第一面面向該晶片容置部;複數個貫孔,每一該些貫孔貫穿該板體,且連接該第一 面與該第二面,以容置該些伸縮探針其中之一;以及複數個導電墊,位於該板體之該第一面,每一該些導電墊圍繞該些貫孔其中之一,且電連接該些伸縮探針其中之一。 The inspection device according to claim 1, wherein the wiring board comprises: a board body having a first surface and a second surface opposed to each other, the first surface facing the chip accommodating part; a plurality of through holes, each One of the through holes penetrates the plate body and connects the first Surface and the second surface to accommodate one of the telescopic probes; and a plurality of conductive pads located on the first surface of the board, each of the conductive pads surrounds one of the through holes, And electrically connected to one of the telescopic probes. 如請求項3所述之檢測裝置,其中該配線板更包含:複數個導電耐磨層,分別位於該些貫孔內,且圍繞並接觸該些伸縮探針。 The detection device according to claim 3, wherein the wiring board further comprises: a plurality of conductive wear-resistant layers respectively located in the through holes and surrounding and contacting the telescopic probes. 如請求項4所述之檢測裝置,其中每一該些導電耐磨層更伸出對應之該貫孔,且覆蓋於對應之該導電墊上。 The detection device according to claim 4, wherein each of the conductive wear-resistant layers further extends out of the corresponding through hole, and covers the corresponding conductive pad. 如請求項4所述之檢測裝置,其中該配線板更包含:複數個導電膠,每一該些導電膠將該些導電耐磨層其中之一附著於該板體上,且電連接該些導電墊其中之一以及該些導電耐磨層其中之一。 The detection device according to claim 4, wherein the wiring board further comprises: a plurality of conductive adhesives, each of the conductive adhesives attaches one of the conductive wear resistant layers to the board, and electrically connects the conductive adhesives One of the conductive pads and one of the conductive wear-resistant layers. 如請求項4所述之檢測裝置,其中每一該些伸縮探針包含:一靜止針體,該靜止針體之一端伸至該載板,其另端具有一凹槽;一活動針體,可伸縮地位於該凹槽以及該些貫孔其中之一內,且接觸該些導電耐磨層其中之一;以及 一彈簧,位於該凹槽內,連接該靜止針體與該活動針體,其中該些電容元件其中之一位於任二相鄰之該些活動針體之間。 The detection device according to claim 4, wherein each of the telescopic probes includes: a stationary needle body, one end of the stationary needle body extends to the carrier plate, and the other end of the stationary needle body has a groove; and a movable needle body, Telescopically located in the groove and one of the through holes, and contacting one of the conductive wear-resistant layers; and A spring is located in the groove and connects the stationary needle body and the movable needle body, wherein one of the capacitive elements is located between any two adjacent movable needle bodies. 如請求項1所述之檢測裝置,其中每一該些電容元件介於該二個相鄰之伸縮探針之間。 The detection device according to claim 1, wherein each of the capacitive elements is between the two adjacent telescopic probes. 一種探針座,包含:一承座,包含相對配置之一頂面與一底面,該頂面具有一晶片容置部;一配線板,位於該承座內部;一電源探針,位於該承座內部,且穿過該配線板;一接地探針,位於該承座內部,穿過該配線板,且為最鄰近該電源探針之探針;以及一電容元件,焊設於該配線板上,位於該電源探針與該接地探針之一側,且透過該配線板電連接該電源探針與該接地探針。 A probe holder includes: a holder, including a top surface and a bottom surface that are arranged oppositely, the top surface has a chip accommodating part; a wiring board located inside the holder; a power probe located inside the holder Inside the socket and pass through the wiring board; a grounding probe located inside the socket, passing through the wiring board, and being the probe closest to the power probe; and a capacitive element soldered to the wiring board The upper part is located on one side of the power probe and the ground probe, and is electrically connected to the power probe and the ground probe through the wiring board. 如請求項9所述之探針座,其中該配線板包含:一板體,具有相對之一第一面與一第二面,該第一面面向該晶片容置部;一第一貫孔,貫穿該板體,且連接該第一面與該第二面,以容置該電源探針;一第二貫孔,貫穿該板體,且連接該第一面與該第二面, 以容置該接地探針;一第一導電墊,位於該第一面,圍繞該第一貫孔,且電連接該電源探針;以及一第二導電墊,位於該第一面,圍繞該第二貫孔,且電連接該接地探針。 The probe holder according to claim 9, wherein the wiring board comprises: a board body having a first surface and a second surface opposed to each other, the first surface facing the chip accommodating portion; and a first through hole , Penetrate the board body and connect the first surface and the second surface to accommodate the power probe; a second through hole penetrates the board body and connects the first surface and the second surface, To accommodate the ground probe; a first conductive pad located on the first surface, surrounding the first through hole, and electrically connected to the power probe; and a second conductive pad located on the first surface, surrounding the The second through hole is electrically connected to the ground probe. 如請求項10所述之探針座,其中該配線板更包含:一第一導電耐磨層,位於該第一貫孔內,圍繞且接觸該電源探針;以及一第二導電耐磨層,位於該第二貫孔內,圍繞且接觸該接地探針。 The probe holder according to claim 10, wherein the wiring board further comprises: a first conductive wear-resistant layer located in the first through hole, surrounding and in contact with the power probe; and a second conductive wear-resistant layer , Located in the second through hole, surrounding and contacting the ground probe. 如請求項11所述之探針座,其中該第一導電耐磨層位於該第一導電墊及該第一貫孔之內壁上,該第二導電耐磨層位於該第二導電墊及該第二貫孔之內壁上。 The probe holder according to claim 11, wherein the first conductive wear-resistant layer is located on the inner wall of the first conductive pad and the first through hole, and the second conductive wear-resistant layer is located on the second conductive pad and On the inner wall of the second through hole. 如請求項11所述之探針座,其中該配線板更包含:一第一導電膠,將該第一導電耐磨層附著於該板體上,且電連接該第一導電墊及該第一導電耐磨層;以及一第二導電膠,將該第二導電耐磨層附著於該板體上,且電連接該第二導電墊及該第二導電耐磨層。 The probe holder according to claim 11, wherein the wiring board further comprises: a first conductive adhesive, attaching the first conductive wear-resistant layer to the board, and electrically connecting the first conductive pad and the first conductive pad A conductive wear-resistant layer; and a second conductive adhesive. The second conductive wear-resistant layer is attached to the board and electrically connected to the second conductive pad and the second conductive wear-resistant layer. 如請求項11所述之探針座,其中該電源探 針包含:一第一靜止針體,該第一靜止針體之一端具有一第一凹槽;一第一活動針體,可伸縮地位於該第一凹槽及該第一貫孔內,且接觸該第一導電耐磨層;以及一第一彈簧,位於該第一凹槽內,連接該第一靜止針體與該第一活動針體。 The probe holder according to claim 11, wherein the power probe The needle includes: a first stationary needle body with a first groove at one end of the first stationary needle body; a first movable needle body telescopically located in the first groove and the first through hole, and Contacting the first conductive wear-resistant layer; and a first spring, located in the first groove, connecting the first stationary needle body and the first movable needle body. 如請求項14所述之探針座,其中該接地探針包含:一第二靜止針體,該第二靜止針體之一端具有一第二凹槽;一第二活動針體,可伸縮地位於該第二凹槽及該第二貫孔內,且接觸該第二導電耐磨層;以及一第二彈簧,位於該第二凹槽內,連接該第二靜止針體與該第二活動針體,其中該電容元件位於該第一活動針體與該第二活動針體之間。 The probe holder according to claim 14, wherein the ground probe comprises: a second stationary needle body, one end of the second stationary needle body has a second groove; a second movable needle body, telescopically Located in the second groove and the second through hole, and in contact with the second conductive wear-resistant layer; and a second spring, located in the second groove, connecting the second stationary needle body and the second movable The needle body, wherein the capacitance element is located between the first movable needle body and the second movable needle body. 如請求項9所述之探針座,其中該電容元件較該承座之該底面更接近該承座之該頂面。 The probe holder according to claim 9, wherein the capacitive element is closer to the top surface of the holder than the bottom surface of the holder.
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Publication number Priority date Publication date Assignee Title
TWI852847B (en) * 2023-11-24 2024-08-11 欣興電子股份有限公司 Probe card

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TW456074B (en) * 1998-02-17 2001-09-21 Advantest Corp IC socket
US7102367B2 (en) * 2002-07-23 2006-09-05 Fujitsu Limited Probe card and testing method of semiconductor chip, capacitor and manufacturing method thereof
US7663387B2 (en) * 2007-09-27 2010-02-16 Yokowo Co., Ltd. Test socket
US8912812B2 (en) * 2009-06-02 2014-12-16 Hsio Technologies, Llc Compliant printed circuit wafer probe diagnostic tool
EP3304110A4 (en) * 2015-05-29 2019-01-23 R&D Circuits Inc. Improved power supply transient performance (power integrity) for a probe card assembly in an integrated circuit test environment

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* Cited by examiner, † Cited by third party
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TWI852847B (en) * 2023-11-24 2024-08-11 欣興電子股份有限公司 Probe card

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